TW201422366A - Method of manufacturing substrate - Google Patents

Method of manufacturing substrate Download PDF

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Publication number
TW201422366A
TW201422366A TW102133520A TW102133520A TW201422366A TW 201422366 A TW201422366 A TW 201422366A TW 102133520 A TW102133520 A TW 102133520A TW 102133520 A TW102133520 A TW 102133520A TW 201422366 A TW201422366 A TW 201422366A
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Taiwan
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metal wire
movement
cutting
wire
block
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TW102133520A
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Chinese (zh)
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TWI581903B (en
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Satoshi Kawamura
Tomohiro Hayakawa
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Kyocera Corp
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Abstract

The present invention provides a substrate manufacturing method which is not easy to produce flaws and cracks on the substrate. The substrate manufacturing method includes: a step of preparing a block body having a first surface and a second surface configured on its backside and fixed to the holding member; and a cutting step, which moves a metal wire along a first direction of the length of the metal wire and a second direction, while cutting the block body from the first surface toward the second surface by using the metal wire. Here, the cutting step further includes: an initial step for making the metal wire contacting the block body from the first surface, and cutting a first region on the first side of the block body through the use of the metal wire; an interim step, which uses the metal wire to cut the middle region of the block body between the first region and the second region on the second side; and a final step, which uses the metal wire to cut the second region of the block body. Moreover, the movement of the metal wire is controlled in such a way that it moves continuously in single direction by a greater distance during at least one of the initial step and the final step than during the interim step.

Description

基板之製造方法 Substrate manufacturing method

本發明係關於一種基板之製造方法。 The present invention relates to a method of manufacturing a substrate.

晶系太陽電池元件等中所使用之半導體之基板係例如藉由將切割半導體材料之鑄錠而形成之塊體切成薄片而製作。作為將塊體切成薄片之切割方法,例如有藉由將塊體壓抵於往復移動之金屬線而將該塊體切成薄片之切割方法(例如參照下述專利文獻1等)。 A substrate of a semiconductor used in a crystal solar cell element or the like is produced, for example, by cutting a block formed by cutting an ingot of a semiconductor material into a sheet. As a cutting method for cutting a block into a sheet, for example, there is a method of cutting a block into a sheet by pressing a block against a reciprocating metal wire (see, for example, Patent Document 1 below).

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2000-42896號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2000-42896

於使用有往復移動之金屬線之塊體之切割方法中,於開始及結束塊體之切割時、以及於將金屬線之移動方向反轉時,金屬線之移動容易變得不穩定。因此,易於塊體產生裂紋及龜裂,於利用塊體之切薄而進行之基板之製造時良率可能會降低。 In the cutting method using a block having a reciprocating metal wire, the movement of the metal wire tends to become unstable at the time of starting and ending the cutting of the block and when the moving direction of the metal wire is reversed. Therefore, it is easy to cause cracks and cracks in the block, and the yield may be lowered when the substrate is manufactured by thinning of the block.

此種問題並不限於藉由將半導體材料之塊體切成薄片而製造基板之情形,就藉由切割對象物之切割而製造基板之技術而言一般共通。 Such a problem is not limited to the case where a substrate is manufactured by cutting a block of a semiconductor material into a sheet, and the technique of manufacturing a substrate by cutting the object to be cut is generally common.

因此,期望不易於基板產生裂紋及龜裂之基板之製造方法。 Therefore, a method of manufacturing a substrate in which cracks and cracks are not easily generated on a substrate is desired.

為了解決上述問題,一態樣之基板之製造方法包括準備步驟及切割步驟。於該基板之製造方法中,於上述準備步驟中,準備包括第1面及配置於該第1面之背側且固定於保持構件之第2面之塊體。又,於上述切割步驟中,一面交替地進行沿金屬線之長度方向之第1方向上之該金屬線之移動、及與上述第1方向相反之第2方向上之上述金屬線之移動,一面藉由上述金屬線自上述第1面側朝向上述第2面側切割上述塊體。進而,上述切割步驟包含初期步驟、中期步驟及終期步驟。此處,於上述初期步驟中,使上述金屬線自上述第1面側接觸於上述塊體,並藉由上述金屬線切割上述塊體內之位於上述第1面側之第1區域。於上述中期步驟中,藉由上述金屬線切割上述塊體內之位於上述第1區域與位於上述第2面側之第2區域之間之中間區域。於上述終期步驟中,藉由上述金屬線切割上述塊體內之上述第2區域。而且,以如下方式控制上述金屬線之移動,即,於上述初期步驟及上述終期步驟中之至少一步驟中上述金屬線朝單向持續地移動之移動距離大於在上述中期步驟中上述金屬線朝上述單向持續地移動之移動距離。 In order to solve the above problems, a method of manufacturing a substrate according to an aspect includes a preparation step and a cutting step. In the method of manufacturing the substrate, in the preparation step, a block including the first surface and the second surface disposed on the back side of the first surface and fixed to the second surface of the holding member is prepared. Further, in the dicing step, the movement of the metal wire in the first direction along the longitudinal direction of the metal wire and the movement of the metal wire in the second direction opposite to the first direction are alternately performed. The block is cut from the first surface side toward the second surface side by the metal wire. Further, the cutting step includes an initial step, an intermediate step, and a final step. Here, in the initial step, the metal wire is brought into contact with the block from the first surface side, and the first region on the first surface side in the block is cut by the metal wire. In the intermediate step, the intermediate portion between the first region and the second region on the second surface side is cut by the metal wire. In the final step, the second region in the block is cut by the wire. Moreover, the movement of the metal wire is controlled in such a manner that the moving distance of the metal wire continuously moving in a unidirectional direction in at least one of the initial step and the final step is greater than the above-mentioned metal line in the intermediate step The moving distance in which the above one-way continuously moves.

另一態樣之基板之製造方法包括準備步驟及切割步驟。於該基板之製造方法中,於上述準備步驟中,準備包括第1面及配置於該第1面之背側且固定於保持構件之第2面之塊體。又,於上述切割步驟中,一面交替地進行沿金屬線之長度方向之第1方向上之該金屬線之移動、及與上述第1方向相反之第2方向上之上述金屬線之移動,一面藉由上述金屬線自上述第1面側朝向上述第2面側切割上述塊體。進而,上述切割步驟包含初期步驟、中期步驟及終期步驟。此處,於上述初期步驟中,使上述金屬線自上述第1面側接觸於上述塊體,並藉由上述金屬線切割上述塊體內之位於上述第1面側之第1區域。於上述 中期步驟中,藉由上述金屬線切割上述塊體內之位於上述第1區域與位於上述第2面側之第2區域之間之中間區域。於上述終期步驟中,藉由上述金屬線切割上述塊體內之上述第2區域。又,於上述初期步驟及上述終期步驟中之至少一步驟以及上述中期步驟中,分別進行使上述金屬線移動之方向於上述第1方向與上述第2方向之間進行切換之切換動作。而且,以如下方式控制上述金屬線之移動,即,於上述初期步驟及上述終期步驟中之至少一步驟中進行之上述切換動作中之上述金屬線之加速度之絕對值小於在上述中期步驟中進行之上述切換動作中之上述金屬線之加速度之絕對值。 Another method of manufacturing a substrate includes a preparation step and a cutting step. In the method of manufacturing the substrate, in the preparation step, a block including the first surface and the second surface disposed on the back side of the first surface and fixed to the second surface of the holding member is prepared. Further, in the dicing step, the movement of the metal wire in the first direction along the longitudinal direction of the metal wire and the movement of the metal wire in the second direction opposite to the first direction are alternately performed. The block is cut from the first surface side toward the second surface side by the metal wire. Further, the cutting step includes an initial step, an intermediate step, and a final step. Here, in the initial step, the metal wire is brought into contact with the block from the first surface side, and the first region on the first surface side in the block is cut by the metal wire. Above In the intermediate step, the intermediate portion between the first region and the second region on the second surface side is cut by the metal wire. In the final step, the second region in the block is cut by the wire. Further, in at least one of the initial step and the final step, and the intermediate step, switching operations for switching the direction in which the metal wire is moved between the first direction and the second direction are respectively performed. Further, the movement of the metal wire is controlled in such a manner that the absolute value of the acceleration of the metal wire in the switching operation performed in at least one of the initial step and the final step is less than that in the intermediate step The absolute value of the acceleration of the metal wire in the switching operation.

根據一態樣之基板之製造方法,初期步驟及終期步驟中之至少一步驟中之切換動作之頻度低於中期步驟中之切換動作之頻度,故而於初期步驟及終期步驟中,金屬線之移動不易變得不穩定。其結果,不易使藉由塊體之切割而製造之基板產生裂紋及龜裂。 According to the manufacturing method of the substrate, the frequency of the switching operation in at least one of the initial step and the final step is lower than the frequency of the switching operation in the intermediate step, so the movement of the metal line in the initial step and the final step Not easy to become unstable. As a result, it is difficult to cause cracks and cracks in the substrate produced by the cutting of the block.

又,根據另一態樣之基板之製造方法,於初期步驟及終期步驟中之至少一步驟中,金屬線之移動不易變得不穩定,故而不易使藉由塊體之切割而製造之基板產生裂紋及龜裂。 Moreover, according to another method of manufacturing a substrate, in at least one of the initial step and the final step, the movement of the metal wire is less likely to become unstable, so that the substrate produced by the cutting of the block is not easily produced. Cracks and cracks.

1‧‧‧基板切割裝置 1‧‧‧Substrate cutting device

10‧‧‧控制部 10‧‧‧Control Department

11~13‧‧‧第1~3驅動部 11~13‧‧‧1~3 drive department

20‧‧‧操作部 20‧‧‧Operation Department

Ac1、Ac2、Ac3‧‧‧加速度之絕對值 Absolute values of acceleration for Ac1, Ac2, Ac3‧‧

AP1a、AP2a、AP3a‧‧‧第1移動期間 AP1a, AP2a, AP3a‧‧‧1st moving period

AP1b、AP2b、AP3b‧‧‧第2移動期間 AP1b, AP2b, AP3b‧‧‧2nd mobile period

AR1‧‧‧第1區域 AR1‧‧‧1st area

AR2‧‧‧第2區域 AR2‧‧‧2nd area

AR3‧‧‧中間區域 AR3‧‧‧ intermediate area

BL1‧‧‧塊體 BL1‧‧‧ block

BX1‧‧‧碎屑接收箱 BX1‧‧‧ Debris Receiving Box

E1a、E1b‧‧‧第1面之X方向上之兩端部 E1a, E1b‧‧‧ Both ends of the first side in the X direction

E2a、E2b‧‧‧第2面之X方向上之兩端部 E2a, E2b‧‧‧ Both ends of the second side in the X direction

GR1~GR4‧‧‧第1~4導引輥 GR1~GR4‧‧‧1~4 guide rolls

HM1‧‧‧升降部 HM1‧‧‧ Lifting Department

HP1‧‧‧保持部 HP1‧‧‧ Keeping Department

Lt1、Lt2、Lt3‧‧‧單向移動距離 Lt1, Lt2, Lt3‧‧‧ one-way moving distance

L1、L2、L3‧‧‧厚度 L1, L2, L3‧‧‧ thickness

M1、M2‧‧‧中央部 M1, M2‧‧‧ Central Department

MR1~MR3‧‧‧第1~3主輥 MR1~MR3‧‧‧1~3 main roller

OB1‧‧‧保持對象物 OB1‧‧‧ Keep objects

P1、P2、P3‧‧‧旋轉軸 P1, P2, P3‧‧‧ rotating shaft

S1‧‧‧第1面 S1‧‧‧ first side

S2‧‧‧第2面 S2‧‧‧2nd

SB1‧‧‧基礎構件 SB1‧‧‧ basic components

T1~T7‧‧‧時刻 T1~T7‧‧‧ moments

+ V1、- V1‧‧‧值 + V1, - V1‧‧‧ value

W1(W1f、W1s)‧‧‧金屬線 W1 (W1f, W1s) ‧ ‧ metal wire

WR1‧‧‧第1捲盤 WR1‧‧‧Volume 1

WR2‧‧‧第2捲盤 WR2‧‧‧ Volume 2

X、Y、Z‧‧‧方向 X, Y, Z‧‧ Direction

圖1係模式性地表示一實施形態之基板切割裝置之概略構成之立體圖。 Fig. 1 is a perspective view schematically showing a schematic configuration of a substrate cutting device according to an embodiment.

圖2係模式性地表示一實施形態之基板切割裝置之一部分之構成的圖。 Fig. 2 is a view schematically showing the configuration of a part of a substrate cutting device according to an embodiment.

圖3係表示一實施形態之基板切割裝置之功能性構成之方塊圖。 Fig. 3 is a block diagram showing a functional configuration of a substrate cutting device according to an embodiment.

圖4係模式性地表示切割步驟之初期步驟中之基板切割裝置之狀態的圖。 Fig. 4 is a view schematically showing the state of the substrate cutting device in the initial step of the cutting step.

圖5係模式性地表示切割步驟之中期步驟中之基板切割裝置之狀 態的圖。 Figure 5 is a view schematically showing the shape of the substrate cutting device in the intermediate step of the cutting step State diagram.

圖6係模式性地表示切割步驟之終期步驟中之基板切割裝置之狀態的圖。 Fig. 6 is a view schematically showing the state of the substrate cutting device in the final step of the cutting step.

圖7係用以說明第1區域、中間區域及第2區域之範圍之設定之圖。 Fig. 7 is a view for explaining setting of ranges of the first region, the intermediate region, and the second region.

圖8係例示切割步驟之初期步驟中之金屬線之移動動作的圖。 Fig. 8 is a view exemplifying a movement operation of a wire in an initial step of the cutting step.

圖9係例示切割步驟之中期步驟中之金屬線之移動動作的圖。 Fig. 9 is a view exemplifying a movement action of a metal wire in a middle step of the cutting step.

圖10係例示切割步驟之終期步驟中之金屬線之移動動作的圖。 Fig. 10 is a view exemplifying a movement action of a metal wire in a final step of the cutting step.

圖11係例示金屬線之單向移動距離之變化之圖。 Fig. 11 is a view showing a change in the unidirectional moving distance of the metal wire.

圖12係表示第1變化例之單向移動距離之階段性變化之圖。 Fig. 12 is a view showing a stepwise change of the one-way moving distance in the first modification.

圖13係表示第2變化例之初期步驟中之金屬線之移動動作的圖。 Fig. 13 is a view showing the movement operation of the metal wire in the initial step of the second modification.

圖14係表示第2變化例之中期步驟中之金屬線之移動動作的圖。 Fig. 14 is a view showing the movement operation of the metal wire in the intermediate step of the second modification.

圖15係表示第2變化例之終期步驟中之金屬線之移動動作的圖。 Fig. 15 is a view showing the movement operation of the metal wire in the final step of the second modification.

圖16係表示第2變化例之金屬線之加速度之絕對值之變化的圖。 Fig. 16 is a view showing a change in the absolute value of the acceleration of the metal wire in the second modification.

圖17係表示第3變化例之金屬線之加速度之絕對值之變化的圖。 Fig. 17 is a view showing a change in the absolute value of the acceleration of the metal wire of the third modification.

圖18係表示另一變化例之初期步驟中之金屬線之移動動作的圖。 Fig. 18 is a view showing the movement operation of the metal wire in the initial step of another modification.

圖19係表示另一變化例之中期步驟中之金屬線之移動動作的圖。 Fig. 19 is a view showing the movement operation of the metal wire in the intermediate step of another modification.

圖20係表示另一變化例之終期步驟中之金屬線之移動動作的圖。 Fig. 20 is a view showing the movement operation of the metal wire in the final step of another modification.

以下,基於圖式來說明本發明之一實施形態及各種變化例。再者,於圖1、圖2及圖4至圖7中,標附有以金屬線W1之一移動方向(圖2之自圖式觀察而言之右方向)為X方向之右手系XYZ座標系統。 Hereinafter, an embodiment and various modifications of the present invention will be described based on the drawings. Furthermore, in FIGS. 1, 2, and 4 to 7, the right-handed XYZ coordinate in the X direction is attached with one of the moving directions of the metal wire W1 (the right direction from the view of FIG. 2). system.

<(1)一實施形態> <(1) One embodiment> <(1-1)基板切割裝置之概略構成> <(1-1) Schematic Configuration of Substrate Cutting Device>

如由圖1所示,一實施形態之基板切割裝置1係藉由金屬線W1對作為切割對象物之塊體BL1進行切割之線鋸(wire-saw)。基板切割裝置1主要包括金屬線W1、第1及第2捲盤WR1、WR2、第1~4導引輥GR1~GR4、第1~3主輥MR1~MR3、升降部HM1及碎屑接收箱BX1。 As shown in Fig. 1, a substrate cutting device 1 according to an embodiment is a wire-saw for cutting a block BL1 as a cutting object by a wire W1. The substrate cutting apparatus 1 mainly includes a metal wire W1, first and second reels WR1, WR2, first to fourth guide rollers GR1 to GR4, first to third main rollers MR1 to MR3, a lifting portion HM1, and a debris receiving box. BX1.

金屬線W1例如只要為固著有研磨粒之金屬線(研磨粒固著金屬線)即可。金屬線W1之粗度例如只要為60μm以上且150μm以下即可。又,固著於金屬線W1之研磨粒之直徑例如只要為5μm以上且30μm以下即可。 The metal wire W1 may be, for example, a metal wire (abrasive grain fixing metal wire) to which the abrasive grains are fixed. The thickness of the metal wire W1 may be, for example, 60 μm or more and 150 μm or less. Moreover, the diameter of the abrasive grains fixed to the metal wire W1 may be, for example, 5 μm or more and 30 μm or less.

第1捲盤WR1及第2捲盤WR2係分別捲取金屬線W1之部分。具體而言,第1捲盤WR1係自一端側捲取1根金屬線W1,第2捲盤WR2係自另一端側捲取該1根金屬線W1。第1捲盤WR1包括藉由第1驅動部11(參照圖3)而旋轉之圓筒狀之部分(捲取部)。第2捲盤WR2包括藉由第2驅動部12(參照圖3)而旋轉之圓筒狀之部分(捲取部)。第1驅動部11及第2驅動部12例如只要包括馬達等即可。而且,就第1捲盤WR1及第2捲盤WR2而言,例如藉由使金屬線W1捲繞於進行旋轉之捲取部之外周部而可捲取金屬線W1。具體而言,藉由第1捲盤WR1捲取自第2捲盤WR2陸續送出之金屬線W1。又,藉由第2捲盤WR2捲取自第1捲盤WR1陸續送出之金屬線W1。再者,適當調整利用第1捲盤WR1拉伸金屬線W1之力、及利用第2捲盤WR2拉伸金屬線W1之力,藉此,可對金屬線W1於長度方向上賦予適當之張力。 The first reel WR1 and the second reel WR2 are respectively wound up portions of the metal wire W1. Specifically, the first reel WR1 winds one metal wire W1 from one end side, and the second reel WR2 winds the one metal wire W1 from the other end side. The first reel WR1 includes a cylindrical portion (winding portion) that is rotated by the first driving portion 11 (see FIG. 3). The second reel WR2 includes a cylindrical portion (winding portion) that is rotated by the second driving portion 12 (see FIG. 3). The first drive unit 11 and the second drive unit 12 may be, for example, a motor or the like. Further, in the first reel WR1 and the second reel WR2, the metal wire W1 can be wound up by, for example, winding the metal wire W1 around the outer peripheral portion of the winding portion that is rotated. Specifically, the metal wire W1 that is successively sent out from the second reel WR2 is taken up by the first reel WR1. Further, the metal wire W1 which is successively fed from the first reel WR1 is taken up by the second reel WR2. Further, by appropriately adjusting the force of stretching the wire W1 by the first reel WR1 and the force of stretching the wire W1 by the second reel WR2, the wire W1 can be appropriately tensioned in the longitudinal direction. .

第1及第2導引輥GR1、GR2係將自第1捲盤WR1陸續送出之金屬線W1引導至第3主輥MR3為止,且將自第3主輥MR3陸續送出之金屬線W1引導至第1捲盤WR1為止。又,第3及第4導引輥GR3、GR4係將自第2捲盤WR2陸續送出之金屬線W1引導至第3主輥MR3為止,且將 自第3主輥MR3陸續送出之金屬線W1引導至第2捲盤WR2為止。 The first and second guide rollers GR1 and GR2 guide the metal wire W1 that has been successively fed from the first reel WR1 to the third main roller MR3, and guide the metal wire W1 that has been sequentially sent out from the third main roller MR3 to The first reel is WR1. Further, the third and fourth guide rollers GR3 and GR4 guide the metal wire W1 that has been successively sent out from the second reel WR2 to the third main roller MR3, and will The wire W1 which is successively sent out from the third main roll MR3 is guided to the second reel WR2.

第1~3主輥MR1~MR3係於使金屬線W1以預先設定之間隔排列之狀態下,使金屬線W1沿該金屬線W1之長度方向移動。此處,第1主輥MR1之旋轉軸P1與第2主輥MR2之旋轉軸P2係相互大致平行且相隔預先設定之距離。又,第3主輥MR3之旋轉軸P3係位於較包含旋轉軸P1及旋轉軸P2之平面更靠- Z側,且相對於旋轉軸P1及旋轉軸P2為大致平行。亦即,於自- Y側觀察之情形時,若將旋轉軸P1、旋轉軸P2及旋轉軸P3連結,則可形成向下凸之三角形。又,於該等第1~3主輥MR1~MR3之各自之外周部,以預先設定之間隔設置有多個槽。而且,藉由將金屬線W1依序捲繞於第1~3主輥MR1~MR3之多個槽,而形成相互平行之預先設定之間隔之金屬線W1之行。 The first to third main rolls MR1 to MR3 move the metal wire W1 in the longitudinal direction of the metal wire W1 in a state where the metal wires W1 are arranged at a predetermined interval. Here, the rotation axis P1 of the first main roll MR1 and the rotation axis P2 of the second main roll MR2 are substantially parallel to each other and are spaced apart from each other by a predetermined distance. Further, the rotation axis P3 of the third main roll MR3 is located on the -Z side of the plane including the rotation axis P1 and the rotation axis P2, and is substantially parallel to the rotation axis P1 and the rotation axis P2. That is, when viewed from the Y-side, when the rotation axis P1, the rotation axis P2, and the rotation axis P3 are coupled, a downwardly convex triangle can be formed. Further, a plurality of grooves are provided at predetermined intervals on the outer peripheral portions of the first to third main rolls MR1 to MR3. Then, the metal wire W1 is sequentially wound around the plurality of grooves of the first to third main rolls MR1 to MR3 to form a line of the wire W1 which is parallel to each other at a predetermined interval.

例如自第1捲盤WR1陸續送出之金屬線W1係依序經由第1導引輥GR1及第2導引輥GR2而到達第3主輥MR3,並依序卡於第1~3主輥MR1~MR3之外周部之槽。於使金屬線W1卡於第3主輥MR3之外周部之槽後,使其依序卡於第1主輥MR1、第2主輥MR2及第3主輥MR3,藉此,使金屬線W1繞第1~3主輥MR1~MR3捲繞1周。繼而,金屬線W1於被多次捲繞於第1~3主輥MR1~MR3後,自第3主輥MR3經由第3導引輥GR3及第4導引輥GR4被捲取至第2捲盤WR2。 For example, the metal wire W1 which is successively fed from the first reel WR1 sequentially passes through the first guide roller GR1 and the second guide roller GR2 to reach the third main roller MR3, and is sequentially stuck to the first to third main rollers MR1. ~Slots outside the MR3. After the metal wire W1 is caught in the groove of the outer peripheral portion of the third main roll MR3, the wire W1 is sequentially stuck to the first main roll MR1, the second main roll MR2, and the third main roll MR3, thereby making the wire W1 Winding around the first to third main rolls MR1 to MR3 for one week. Then, after being wound around the first to third main rolls MR1 to MR3 a plurality of times, the wire W1 is taken up from the third main roll MR3 to the second roll via the third guide roll GR3 and the fourth guide roll GR4. Disk WR2.

於第1主輥MR1與第2主輥MR2之間,金屬線W1係架設於平行且具有預先設定之間隔之複數條路徑。金屬線W1係朝沿其長度方向之第1方向(+ X方向)移動。換言之,金屬線W1係自第1主輥MR1朝第2主輥MR2移動。進而換言之,藉由利用第2捲盤WR2捲取自第1捲盤WR1陸續送出之金屬線W1,而於第1主輥MR1與第2主輥MR2之間進行第1方向上之金屬線W1之移動(第1移動)。 Between the first main roll MR1 and the second main roll MR2, the wire W1 is stretched over a plurality of paths that are parallel and have a predetermined interval. The wire W1 moves in the first direction (+X direction) along the longitudinal direction thereof. In other words, the wire W1 moves from the first main roll MR1 toward the second main roll MR2. In other words, by winding the wire W1 successively fed from the first reel WR1 by the second reel WR2, the wire W1 in the first direction is performed between the first main roll MR1 and the second main roll MR2. Move (first move).

另一方面,例如自第2捲盤WR2陸續送出之金屬線W1係依序經由第4導引輥GR4及第3導引輥GR3而到達第3主輥MR3,並依序卡於第1 ~3主輥MR1~MR3之外周部之槽。於使金屬線W1卡於第3主輥MR3之外周部之槽後,使其依序卡於第2主輥MR2、第1主輥MR1及第3主輥MR3,藉此,使金屬線W1繞第1~3主輥MR1~MR3捲繞1周。繼而,金屬線W1於被多次捲繞於第1~3主輥MR1~MR3後,自第3主輥MR3經由第2導引輥GR2及第1導引輥GR1被捲取至第1捲盤WR1。 On the other hand, for example, the metal wire W1 which is successively fed from the second reel WR2 sequentially reaches the third main roll MR3 via the fourth guide roller GR4 and the third guide roller GR3, and is sequentially stuck to the first one. ~3 The groove of the outer circumference of the main rolls MR1 to MR3. After the metal wire W1 is caught in the groove of the outer peripheral portion of the third main roll MR3, the wire W1 is sequentially stuck to the second main roll MR2, the first main roll MR1, and the third main roll MR3, thereby making the wire W1 Winding around the first to third main rolls MR1 to MR3 for one week. Then, after being wound around the first to third main rolls MR1 to MR3 a plurality of times, the wire W1 is taken up from the third main roll MR3 to the first roll via the second guide roll GR2 and the first guide roll GR1. Disk WR1.

此時,於第1主輥MR1與第2主輥MR2之間,金屬線W1係朝與沿其長度方向之第1方向相反之第2方向(- X方向)移動。換言之,金屬線W1係自第2主輥MR2朝第1主輥MR1移動。進而換言之,藉由利用第1捲盤WR1捲取自第2捲盤WR2陸續送出之金屬線W1,而於第1主輥MR1與第2主輥MR2之間,進行第2方向上之金屬線W1之移動(第2移動)。 At this time, between the first main roll MR1 and the second main roll MR2, the wire W1 moves in the second direction (-X direction) opposite to the first direction in the longitudinal direction thereof. In other words, the wire W1 moves from the second main roll MR2 toward the first main roll MR1. In other words, by winding the wire W1 successively fed from the second reel WR2 by the first reel WR1, the wire in the second direction is formed between the first main roll MR1 and the second main roll MR2. W1 movement (2nd move).

升降部HM1係使作為切割對象物之塊體BL1升降之部分。升降部HM1係藉由第3驅動部13(參照圖3)而可於上下方向(±Z方向)進行升降。第3驅動部13例如只要藉由馬達等使升降部HM1升降即可。 The lifting portion HM1 is a portion that elevates and lowers the block BL1 as the object to be cut. The elevation unit HM1 is movable up and down (±Z direction) by the third drive unit 13 (see FIG. 3). For example, the third driving unit 13 may be configured to elevate and lower the lifting portion HM1 by a motor or the like.

又,升降部HM1包括於下部保持保持對象物OB1之保持部HP1。於保持對象物OB1中包含作為切割對象物之塊體BL1、及作為保持該塊體BL1之保持構件之基礎構件SB1。塊體BL1例如只要為具有大致長方體之形狀之半導體材料之塊體BL1即可。半導體材料例如只要為矽等即可。 Further, the lifting portion HM1 includes a holding portion HP1 that holds the object OB1 at a lower portion. The holding object OB1 includes a block BL1 as a cutting object and a base member SB1 as a holding member for holding the block BL1. The block BL1 may be, for example, a block BL1 of a semiconductor material having a substantially rectangular parallelepiped shape. The semiconductor material may be, for example, ruthenium or the like.

如圖2所示,塊體BL1包括朝向下方(- Z方向)之第1面S1、及朝向上方(+ Z方向)之第2面S2。第2面S2係配置於第1面S1之背側且藉由接著等而固定於基礎構件SB1。基礎構件SB1之形狀例如只要為板狀即可。又,作為基礎構件SB1之材料,例如可採用碳、玻璃及樹脂等。而且,保持部HP1係例如藉由夾持基礎構件SB1之態樣、或與基礎構件SB1接著之態樣,而可將保持對象物OB1保持。藉此,可將基礎構件SB1安裝於升降部HM1。 As shown in FIG. 2, the block BL1 includes a first surface S1 facing downward (-Z direction) and a second surface S2 facing upward (+Z direction). The second surface S2 is disposed on the back side of the first surface S1 and is fixed to the base member SB1 by the following or the like. The shape of the base member SB1 may be, for example, a plate shape. Further, as the material of the base member SB1, for example, carbon, glass, resin, or the like can be used. Further, the holding portion HP1 can hold the holding object OB1 by, for example, clamping the base member SB1 or following the base member SB1. Thereby, the base member SB1 can be attached to the elevation part HM1.

此處,一面進行第1方向上之第1移動與第2方向上之第2移動交替地重複進行之金屬線W1之移動(往復移動),一面使塊體BL1下降,藉此,利用金屬線W1將塊體BL1切成薄片。其結果,自塊體BL1製造出複數個基板。 Here, the movement of the metal wire W1 (reciprocating movement) in which the first movement in the first direction and the second movement in the second direction are alternately repeated is performed, and the block BL1 is lowered, whereby the metal wire is used. W1 cuts the block BL1 into thin slices. As a result, a plurality of substrates are manufactured from the bulk BL1.

於藉由朝單向移動之金屬線W1將塊體BL1切成薄片之切割方法中,與藉由往復移動之金屬線W1將塊體BL1切成薄片之切割方法相比,所使用之金屬線W1之長度變長。因此,於用以供給金屬線W1之第1及第2捲盤WR1、WR2中,金屬線W1之捲繞數變多。由此,相對地容易對捲繞於內側之金屬線W1施加過度之壓力。於此情形時,若金屬線W1為研磨粒固著金屬線,則於第1及第2捲盤WR1、WR2中在金屬線W1之重合之部分,研磨粒以較強之力壓抵於該金屬線W1之本體。因此,容易使金屬線W1產生龜裂,且容易導致金屬線W1之斷線。因此,與使金屬線W1朝單向移動之態樣相比,使金屬線W1往復移動之態樣能夠增加可重複使用金屬線W1之次數。 In the cutting method of cutting the block BL1 into a sheet by the metal wire W1 moving in one direction, the metal wire used is cut compared to the cutting method in which the block BL1 is sliced by the reciprocating metal wire W1. The length of W1 becomes longer. Therefore, in the first and second reels WR1 and WR2 for supplying the wire W1, the number of windings of the wire W1 increases. Thereby, it is relatively easy to apply excessive pressure to the metal wire W1 wound inside. In this case, when the metal wire W1 is an abrasive grain fixing metal wire, the abrasive grain is pressed against the wire in the first and second reels WR1 and WR2 where the metal wire W1 overlaps. The body of the metal wire W1. Therefore, it is easy to cause the metal wire W1 to be cracked, and it is easy to cause the wire W1 to be broken. Therefore, the state in which the metal wire W1 reciprocates can increase the number of times the metal wire W1 can be re-used as compared with the state in which the metal wire W1 is moved in one direction.

碎屑接收箱BX1係於上方具有開口之箱狀之構件。於碎屑接收箱BX1中,例如回收於藉由金屬線W1切割塊體BL1時產生之切割碎屑等。 The chip receiving box BX1 is a box-shaped member having an opening at the top. In the chip receiving box BX1, for example, cutting chips and the like which are generated when the block BL1 is cut by the wire W1 are recovered.

再者,自供給噴嘴之複數個開口部將發揮冷卻金屬線W1及塊體BL1之冷卻液之作用之加工液供給至塊體BL1之切割部分及其附近。加工液例如包含乙二醇等水溶性溶劑或油性溶劑,亦可利用水將上述溶劑稀釋。加工液之供給流量係根據塊體BL1之大小而適當設定。又,加工液亦可被循環使用,其時將加工液中所含之自金屬線W1脫落之研磨粒及切割碎屑等去除。 Further, the machining liquid that functions as the coolant for cooling the metal wire W1 and the block BL1 is supplied to the cut portion of the block BL1 and its vicinity from a plurality of openings of the supply nozzle. The working fluid contains, for example, a water-soluble solvent such as ethylene glycol or an oily solvent, and the solvent may be diluted with water. The supply flow rate of the machining liquid is appropriately set in accordance with the size of the block BL1. Further, the working fluid can be recycled, and the abrasive grains and cutting chips which are detached from the metal wire W1 contained in the working fluid are removed.

<(1-2)基板切割裝置之功能性構成> <(1-2) Functional Configuration of Substrate Cutting Device>

如由圖3所示,基板切割裝置1包括控制部10、第1驅動部11、第2驅動部12、第3驅動部13及操作部20。 As shown in FIG. 3, the substrate cutting apparatus 1 includes a control unit 10, a first driving unit 11, a second driving unit 12, a third driving unit 13, and an operation unit 20.

控制部10係控制基板切割裝置1之動作之部分。控制部10之功能例如只要藉由於作為硬體之處理器中執行記憶於作為記憶媒體之RAM(Random Access Memory,隨機存取記憶體)等中之程式實現即可。再者,控制部10之功能之一部分或全部例如亦可藉由專用之電子電路等而實現。 The control unit 10 controls a part of the operation of the substrate cutting device 1. The function of the control unit 10 may be realized by, for example, executing a program stored in a RAM (Random Access Memory) or the like as a memory medium by a processor as a hardware. Furthermore, part or all of the functions of the control unit 10 can be realized, for example, by a dedicated electronic circuit or the like.

控制部10係根據由操作員進行之自操作部20之輸入,而控制基板切割裝置1中之動作。操作部20例如只要為配置有各種按鈕等者即可。而且,藉由控制部10控制第1驅動部11、第2驅動部12及第3驅動部13之動作。亦即,藉由利用控制部10控制第1驅動部11及第2驅動部12之動作,而控制利用第1捲盤WR1及第2捲盤WR2之金屬線W1之往復移動。又,藉由利用控制部10控制第3驅動部13之動作,而控制利用升降部HM1之塊體BL1之下降。 The control unit 10 controls the operation in the substrate cutting device 1 based on the input from the operation unit 20 by the operator. The operation unit 20 may be, for example, a variety of buttons or the like. Further, the control unit 10 controls the operations of the first drive unit 11, the second drive unit 12, and the third drive unit 13. In other words, by the control unit 10 controlling the operations of the first drive unit 11 and the second drive unit 12, the reciprocating movement of the wire W1 by the first reel WR1 and the second reel WR2 is controlled. Moreover, the control unit 10 controls the operation of the third drive unit 13 to control the lowering of the block BL1 by the lift unit HM1.

<(1-3)基板之製造步驟> <(1-3) Manufacturing Step of Substrate>

於製造基板之步驟中,依序進行準備塊體BL1之步驟(準備步驟)、及藉由基板切割裝置1切割塊體BL1之步驟(切割步驟)。 In the step of manufacturing the substrate, the step of preparing the block BL1 (preparation step) and the step of cutting the block BL1 by the substrate cutting device 1 (cutting step) are sequentially performed.

<(1-3-1)準備步驟> <(1-3-1) Preparation Step>

首先,例如自矽之鑄錠切下預先設定之尺寸之塊體BL1。塊體BL1例如只要具有長方體之形狀即可。 First, for example, the block BL1 of a predetermined size is cut out from the ingot. The block BL1 may have a rectangular parallelepiped shape, for example.

其次,藉由接著等方法將基礎構件SB1固定於塊體BL1之一主要面。藉此,準備包括第1面S1及配置於第1面S1之背側且固定於作為保持構件之基礎構件SB1之第2面S2的塊體BL1。 Next, the base member SB1 is fixed to one of the main faces of the block BL1 by the following method. Thereby, the block body BL1 including the first surface S1 and the second surface S2 disposed on the back side of the first surface S1 and fixed to the base member SB1 as the holding member is prepared.

<(1-3-2)切割步驟> <(1-3-2) Cutting step>

首先,將固定有基礎構件SB1之塊體BL1安裝於基板切割裝置1之升降部HM1。藉由升降部HM1之保持部HP1保持基礎構件SB1。藉此,藉由升降部HM1保持固定有基礎構件SB1之塊體BL1。 First, the block BL1 to which the base member SB1 is fixed is attached to the lifting portion HM1 of the substrate cutting device 1. The base member SB1 is held by the holding portion HP1 of the lifting portion HM1. Thereby, the block BL1 to which the base member SB1 is fixed is held by the elevation portion HM1.

其次,開始金屬線W1之往復移動。往復移動係交替地進行沿金 屬線W1之長度方向之第1方向(+ X方向)上之該金屬線W1之移動、及與該第1方向相反之第2方向(- X方向)上之該金屬線W1之移動。 Next, the reciprocating movement of the wire W1 is started. Reciprocating movement alternately along the gold The movement of the metal wire W1 in the first direction (+X direction) in the longitudinal direction of the line W1 and the movement of the metal wire W1 in the second direction (-X direction) opposite to the first direction.

繼而,一面進行金屬線W1之往復移動,一面藉由升降部HM1使塊體BL1朝下方向(- Z方向)下降。藉此,自第1面S1側朝向第2面S2側,利用金屬線W1切割塊體BL1,繼而切割基礎構件SB1之一部分。此時,首先,如由圖4所示,進行如下步驟(初期步驟):使金屬線W1自第1面S1側接觸於塊體BL1,利用金屬線W1切割該塊體BL1內之位於第1面S1側之區域(第1區域)AR1。 Then, while the reciprocating movement of the wire W1 is performed, the block BL1 is lowered in the downward direction (-Z direction) by the elevating portion HM1. Thereby, the block body BL1 is cut by the metal wire W1 from the first surface S1 side toward the second surface S2 side, and then one of the base members SB1 is cut. At this time, first, as shown in FIG. 4, the following step (initial step) is performed: the metal wire W1 is brought into contact with the block BL1 from the first surface S1 side, and the inside of the block BL1 is cut by the metal wire W1. The area (first area) AR1 on the side of the surface S1.

繼而,如由圖5所示,進行如下步驟(中期步驟):藉由金屬線W1切割塊體BL1內之位於第1區域AR1與位於第2面S2側之區域(第2區域)AR2之間之區域(中間區域)AR3。 Then, as shown in FIG. 5, the following step (intermediate step) is performed: the metal line W1 cuts between the first region AR1 and the region (the second region) AR2 located on the second surface S2 side in the block BL1. Area (middle area) AR3.

進而,如由圖6所示,進行藉由金屬線W1切割塊體BL1內之第2區域AR2之步驟(終期步驟)。亦即,於塊體BL1中,自第1面S1至第2面S2依序配置有第1區域AR1、中間區域AR3及第2區域AR2。而且,於切割步驟中包括初期步驟、中期步驟及終期步驟。 Further, as shown in FIG. 6, the step (final step) of cutting the second region AR2 in the block BL1 by the metal wire W1 is performed. In other words, in the block BL1, the first area AR1, the intermediate area AR3, and the second area AR2 are sequentially arranged from the first surface S1 to the second surface S2. Moreover, the initial step, the intermediate step, and the final step are included in the cutting step.

而且,藉由控制部10以如下方式控制金屬線W1之移:於初期步驟及終期步驟中金屬線W1朝單向持續地移動之距離(移動距離)大於在中期步驟中金屬線W1朝單向持續地移動之移動距離。此處,金屬線W1朝單向持續地移動之移動距離(單向移動距離)包含在第1主輥MR1與第2主輥MR2之間金屬線W1朝+ X方向持續移動之距離及金屬線W1朝- X方向持續移動之距離。 Moreover, the movement of the metal wire W1 is controlled by the control unit 10 in such a manner that the distance (moving distance) of the metal wire W1 continuously moving in one direction in the initial step and the final step is greater than that in the intermediate step, the metal wire W1 is oriented in one direction. The moving distance that moves continuously. Here, the moving distance (unidirectional moving distance) in which the metal wire W1 continuously moves in one direction includes the distance in which the metal wire W1 continuously moves in the +X direction between the first main roller MR1 and the second main roller MR2, and the metal wire The distance W1 continues to move in the -X direction.

第1區域AR1、中間區域AR3及第2區域AR2之+ Z方向上之厚度即L1~L3例如只要設定為考慮到切割步驟中之金屬線W1之彎曲之範圍即可。於圖7中,表示於利用金屬線W1對塊體BL1之切割剛開始後、以及利用金屬線W1對塊體BL1之切割即將結束之前的塊體BL1與金屬線W1之配置關係。而且,對切割剛開始後之金屬線W1標附符號 W1s,對切割即將結束之前之金屬線W1標附符號W1f。 The thicknesses L1 to L3 in the +Z direction of the first region AR1, the intermediate region AR3, and the second region AR2 may be set, for example, in consideration of the range of the bending of the metal wire W1 in the dicing step. FIG. 7 shows the arrangement relationship between the block BL1 and the metal wire W1 immediately after the cutting of the block BL1 by the metal wire W1 and immediately before the cutting of the block BL1 by the metal wire W1. Moreover, the metal wire W1 immediately after the start of the cutting is marked with a symbol W1s, the wire W1 before the end of the cutting is marked with the symbol W1f.

如由圖7所示,於切割剛開始後,因由與塊體BL1之抵接而引起之金屬線W1(W1s)之彎曲而自第1面S1之X方向上之兩端部E1a、E1b開始切割塊體BL1。因此,於塊體BL1內之第1面S1之附近,於X方向上之兩端部E1a、E1b與中央部M1之間,切成薄片之狀況有所不同。又,於切割即將結束之前,因由與塊體BL1之抵接而引起之金屬線W1(W1f)之彎曲而於第2面S2之X方向上之兩端部E2a、E2b先切割完塊體BL1。然後,於兩端部E2a、E2b附近,一面切割基礎構件SB1,一面切割塊體BL1內之第2面S2之X方向上之中央部M2附近之部分。因此,於塊體BL1內之第2面S2之附近,於X方向上之兩端部E2a、E2b與中央部M2之間,切成薄片之狀況有所不同。 As shown in Fig. 7, immediately after the start of the dicing, the metal wires W1 (W1s) caused by the contact with the block BL1 start from the both end portions E1a and E1b in the X direction of the first surface S1. The block BL1 is cut. Therefore, in the vicinity of the first surface S1 in the block BL1, the state in which the thin portions are cut between the both end portions E1a and E1b in the X direction and the central portion M1 is different. Further, before the end of the cutting, the two ends E2a and E2b in the X direction of the second surface S2 are first cut by the bending of the metal wire W1 (W1f) due to the contact with the block BL1. . Then, the base member SB1 is cut in the vicinity of the both end portions E2a and E2b, and the portion in the vicinity of the central portion M2 in the X direction of the second surface S2 in the block BL1 is cut. Therefore, in the vicinity of the second surface S2 in the block BL1, the state in which the thin portions are cut between the both end portions E2a and E2b in the X direction and the central portion M2 is different.

因此,只要根據於切割步驟中將金屬線W1壓抵於塊體BL1時產生之金屬線W1之彎曲,設定第1區域AR1、中間區域AR3及第2區域AR2之厚度L1~L3即可。作為一例,於自塊體BL1之第1面S1至第2面S2之厚度為156mm之情形時,將第1區域AR1之厚度L1設定為5mm,將中間區域AR3之厚度L2設定為145mm,將第2區域AR2之厚度L3設定為6mm。又,考慮到在切割步驟中可能會產生之偏差,亦可將第1區域AR1之厚度L1及第2區域AR2之厚度L3分別設定為自塊體BL1之第1面S1至第2面S2之厚度之10%以下之厚度。 Therefore, the thicknesses L1 to L3 of the first region AR1, the intermediate region AR3, and the second region AR2 may be set in accordance with the bending of the metal wire W1 generated when the metal wire W1 is pressed against the block BL1 in the dicing step. As an example, when the thickness of the first surface S1 to the second surface S2 of the block BL1 is 156 mm, the thickness L1 of the first region AR1 is set to 5 mm, and the thickness L2 of the intermediate region AR3 is set to 145 mm. The thickness L3 of the second region AR2 is set to 6 mm. Further, in consideration of variations that may occur in the dicing step, the thickness L1 of the first region AR1 and the thickness L3 of the second region AR2 may be set to be from the first surface S1 to the second surface S2 of the block BL1, respectively. A thickness of 10% or less of the thickness.

於圖8至圖10中,於橫方向表示時刻,於縱方向表示金屬線W1之速度。表示如下例:於圖8所示之初期步驟、圖9所示之中期步驟及圖10所示之終期步驟之各步驟中,第1移動中之金屬線W1於+ X方向上之移動速度之最大值為+ V1,第2移動中之金屬線W1於+ X方向上之移動速度之最大值為- V1。 In FIGS. 8 to 10, the time is shown in the horizontal direction, and the speed of the metal wire W1 is shown in the vertical direction. The following example is shown: in each of the initial steps shown in FIG. 8, the intermediate step shown in FIG. 9, and the final step shown in FIG. 10, the moving speed of the metal wire W1 in the first movement in the +X direction The maximum value is +V1, and the maximum value of the moving speed of the metal wire W1 in the second movement in the +X direction is -V1.

具體而言,自時刻T1至時刻T2,第2移動中之金屬線W1於- X方向上之移動速度減小。於時刻T2,自第2移動轉變為第1移動。自時刻 T2至時刻T3,第1移動中之金屬線W1於+ X方向上之移動速度增加。自時刻T3至時刻T4,將第1移動中之金屬線W1於+ X方向上之移動速度維持為作為固定值之+ V1。自時刻T4至時刻T5,第1移動中之金屬線W1於+ X方向上之移動速度減小。於時刻T5,自第1移動轉變為第2移動。自時刻T5至時刻T6,第2移動中之金屬線W1於- X方向上之移動速度增加。自時刻T6至時刻T7,將第2移動中之金屬線W1於- X方向上之移動速度維持為作為固定值之- V1。藉由重複與此種自時刻T1至時刻T7之金屬線W1之移動速度之變化相同之金屬線W1之移動速度之變化,而實現往復移動。 Specifically, from time T1 to time T2, the moving speed of the metal wire W1 in the second movement in the -X direction is decreased. At time T2, the second movement is changed to the first movement. Self time From T2 to time T3, the moving speed of the metal wire W1 in the first movement in the +X direction increases. From time T3 to time T4, the moving speed of the metal wire W1 in the first movement in the +X direction is maintained at +V1 which is a fixed value. From time T4 to time T5, the moving speed of the metal wire W1 in the first movement in the +X direction is decreased. At time T5, the first movement is shifted to the second movement. From time T5 to time T6, the moving speed of the metal wire W1 in the second movement in the -X direction increases. From time T6 to time T7, the moving speed of the metal wire W1 in the second movement in the -X direction is maintained at -V1 which is a fixed value. The reciprocating movement is achieved by repeating the change in the moving speed of the metal wire W1 which is the same as the change in the moving speed of the metal wire W1 from the time T1 to the time T7.

而且,如由圖8至圖10所示,初期步驟中之單向移動距離Lt1及終期步驟中之單向移動距離Lt3大於中期步驟中之單向移動距離Lt2。再者,於圖11中例示自作為開始切割之面(切割開始面)之第1面S1至金屬線W1移動之位置(金屬線移動位置)為止之距離、與單向移動距離之關係。如由圖11所示,例如於自第1面S1至金屬線移動位置為止之距離為0~L1之初期步驟中,將單向移動距離Lt1設定為3000m。又,例如於自第1面S1至金屬線移動位置為止之距離為L1~(L1+L2)之中期步驟中,將單向移動距離Lt2設定為500m。又,例如於自第1面S1至金屬線移動位置為止之距離為(L1+L2)~(L1+L2+L3)之終期步驟中,將單向移動距離Lt3設定為3000m。 Further, as shown in Figs. 8 to 10, the one-way moving distance Lt1 in the initial step and the one-way moving distance Lt3 in the final step are larger than the one-way moving distance Lt2 in the intermediate step. In addition, FIG. 11 exemplifies the relationship between the distance from the first surface S1 of the surface to be cut (cutting start surface) to the position where the metal wire W1 moves (the metal wire moving position), and the unidirectional moving distance. As shown in FIG. 11, for example, in the initial step of the distance from the first surface S1 to the metal wire moving position of 0 to L1, the one-way moving distance Lt1 is set to 3000 m. Further, for example, in the intermediate step of the distance from the first surface S1 to the metal wire moving position to L1 to (L1+L2), the one-way moving distance Lt2 is set to 500 m. Further, for example, in the final step of the distance from the first surface S1 to the metal wire moving position to (L1+L2) to (L1+L2+L3), the one-way moving distance Lt3 is set to 3000 m.

藉由此種單向移動距離之控制,與中期步驟相比,於初期步驟及終期步驟中,可減少進行使金屬線W1移動之方向在第1方向與第2方向之間切換之動作(切換動作)之頻度。頻度只要為每單位時間之次數即可。再者,初期步驟及終期步驟中之切換動作之頻度例如亦可成為0次。藉由此種切換動作之頻度之減少,於初期步驟及終期步驟中,金屬線W1不易向與第1方向及第2方向正交之方向晃動,金屬線W1之移動不易變得不穩定。其結果,不易於作為切割對象物之塊體 BL1產生裂紋及龜裂,可提高利用塊體BL1之切薄之基板製造時之良率。即,不易於基板產生裂紋及龜裂。又,藉由初期步驟中之金屬線W1之穩定之移動,可提高基板之厚度之精度,並且藉由終期步驟中之金屬線W1之穩定之移動,可減少基板之缺陷之產生。 By the control of the one-way moving distance, in the initial step and the final step, the action of switching the direction in which the metal wire W1 moves between the first direction and the second direction can be reduced (switching) The frequency of the action). The frequency can be as long as the number of times per unit time. Further, the frequency of the switching operation in the initial step and the final step may be, for example, 0 times. Due to the reduction in the frequency of such switching operations, the metal wires W1 are less likely to sway in the direction orthogonal to the first direction and the second direction in the initial step and the final step, and the movement of the metal wires W1 is less likely to become unstable. As a result, it is not easy to be a block of the object to be cut. The crack and crack of the BL1 can improve the yield of the substrate which is thinned by the bulk BL1. That is, it is not easy to cause cracks and cracks in the substrate. Further, by the stable movement of the metal wire W1 in the initial step, the accuracy of the thickness of the substrate can be improved, and the occurrence of defects of the substrate can be reduced by the stable movement of the metal wire W1 in the final step.

此處,金屬線W1朝單向持續地移動之單向移動距離係例如藉由利用控制部10控制於1次第1移動中自第1捲盤WR1陸續送出並捲取至第2捲盤WR2之金屬線W1之長度而可變更。又,該單向移動距離係例如藉由控制部10控制於1次第2移動中自第2捲盤WR2陸續送出並捲取至第1捲盤WR1之金屬線W1之長度而可變更。再者,例如於在第1捲盤WR1設置有未使用之金屬線W1之情形時,只要將金屬線W1朝第1方向持續地移動之移動距離設定得大於金屬線W1朝第2方向持續地移動之移動距離即可,於切割步驟中係隨時供給新金屬線。 Here, the one-way moving distance in which the metal wire W1 continuously moves in one direction is controlled by the control unit 10, for example, from the first reel WR1 to the first reel and the second reel WR2. The length of the metal wire W1 can be changed. Further, the one-way moving distance can be changed by, for example, the control unit 10 controlling the length of the metal wire W1 that is successively fed from the second reel WR2 and wound up to the first reel WR1 in the second movement. Further, for example, when the unused reel W1 is provided in the first reel WR1, the moving distance of the metal wire W1 continuously moving in the first direction is set to be larger than the metal wire W1 continuously in the second direction. The moving distance can be moved, and a new metal wire is supplied at any time during the cutting step.

再者,此處,只要初期步驟及終期步驟中之單向移動距離例如於900m以上且未達5000m之範圍內設定,中期步驟中之單向移動距離於100m以上且未達900m之範圍內設定即可。往復移動中之金屬線W1之移動速度之絕對值之最大值例如只要於500m/min以上且1500m/min以下之範圍內設定即可。於切換動作中,例如只要幾乎不空出間隙地切換第1方向上之金屬線W1之第1移動與第2方向上之金屬線W1之第2移動,則不易產生金屬線W1之斷線。再者,於在第1移動與第2移動之間設置有使金屬線W1停止之時間(停止時間)之情形時,該停止時間例如只要為0.1秒以上且1秒以內即可。又,切換動作中之金屬線W1之加速度之絕對值例如只要於2m/sec2以上且16m/sec2以下之範圍內設定即可。於切割步驟中藉由升降部HM1使塊體BL1下降之速度(進料速度)例如只要於100μm/min以上且1100μm/min以下之範圍內設定即可。再者,若根據切換動作中之金屬線W1之移動速度之增減而增減進料速度,則可減少對金屬線W1施加之負荷,且不易產生金 屬線W1之斷線。 In addition, here, as long as the one-way moving distance in the initial step and the final step is set, for example, in the range of 900 m or more and less than 5000 m, the one-way moving distance in the intermediate step is set within a range of 100 m or more and less than 900 m. Just fine. The maximum value of the absolute value of the moving speed of the metal wire W1 during the reciprocating movement may be set, for example, within a range of 500 m/min or more and 1500 m/min or less. In the switching operation, for example, as long as the first movement of the metal wire W1 in the first direction and the second movement of the metal wire W1 in the second direction are switched with little gap, the disconnection of the metal wire W1 is less likely to occur. In the case where the metal wire W1 is stopped (stop time) between the first movement and the second movement, the stop time may be, for example, 0.1 second or longer and 1 second or shorter. In addition, the absolute value of the acceleration of the metal wire W1 in the switching operation may be set, for example, within a range of 2 m/sec 2 or more and 16 m/sec 2 or less. The speed (feeding speed) at which the block BL1 is lowered by the lifting portion HM1 in the cutting step may be set, for example, in a range of 100 μm/min or more and 1100 μm/min or less. Further, when the feed rate is increased or decreased according to the increase or decrease of the moving speed of the metal wire W1 in the switching operation, the load applied to the metal wire W1 can be reduced, and the disconnection of the metal wire W1 is less likely to occur.

<(1-4)一實施形態之總結> <(1-4) Summary of an embodiment>

如上所述,於一實施形態之基板之製造方法中,以於初期步驟及終期步驟中金屬線W1朝單向持續地移動之單向移動距離大於中期步驟中之單向移動距離之方式,控制金屬線W1之移動。藉此,於初期步驟及終期步驟中進行切換動作之頻度變得低於在中期步驟中進行切換動作之頻度。因此,於初期步驟及終期步驟中,金屬線W1之移動不易晃動,金屬線W1之移動不易變得不穩定。其結果,不易於藉由塊體BL1之切薄而製造之基板產生裂紋及龜裂。 As described above, in the method of manufacturing a substrate according to the embodiment, the one-way moving distance in which the metal wire W1 is continuously moved in one direction in the initial step and the final step is larger than the one-way moving distance in the intermediate step, and is controlled. The movement of the wire W1. Thereby, the frequency of performing the switching operation in the initial step and the final step becomes lower than the frequency of performing the switching operation in the intermediate step. Therefore, in the initial step and the final step, the movement of the wire W1 is less likely to be shaken, and the movement of the wire W1 is less likely to become unstable. As a result, it is not easy to cause cracks and cracks in the substrate produced by thinning of the bulk BL1.

<(2)變化例> <(2) Change example> <(2-1)第1變化例> <(2-1) First Modification>

於上述一實施形態中,以初期步驟及終期步驟兩者之步驟中之單向移動距離成為固定值之方式控制金屬線W1之移動,但並不限於此。例如亦可使初期步驟中之單向移動距離Lt1階段性地減小。又,例如亦可使終期步驟中之單向移動距離Lt3階段性地增加。進而,亦可使初期步驟中之單向移動距離Lt1階段性地減小且使終期步驟中之單向移動距離Lt3階段性地增加。藉由此種單向移動距離之階段性變更,可減少對金屬線W1施加之負荷之急遽之變化量,故而可減少金屬線W1之斷線之產生以及基板之表面之起伏之產生。 In the above-described embodiment, the movement of the wire W1 is controlled such that the one-way moving distance in the steps of the initial step and the final step becomes a fixed value, but the invention is not limited thereto. For example, the one-way moving distance Lt1 in the initial step can also be reduced stepwise. Further, for example, the one-way moving distance Lt3 in the final step may be increased stepwise. Further, the one-way moving distance Lt1 in the initial step may be gradually reduced and the one-way moving distance Lt3 in the final step may be increased stepwise. By the gradual change of the unidirectional moving distance, the amount of change in the load applied to the wire W1 can be reduced, so that the occurrence of the wire breakage of the wire W1 and the occurrence of the undulation of the surface of the substrate can be reduced.

作為採用此種態樣之情形之具體例,可列舉如由圖12所示之例。具體而言,於將初期步驟中之單向移動距離Lt1依序階段性地變更為3000m、2000m、1500m及1000m之後,將單向移動距離變更為中期步驟中之單向移動距離Lt2即500m。進而,其後,將終期步驟中之單向移動距離Lt3階段性地變更為1000m、1500m、2000m及3000m。 As a specific example of the case where such a state is employed, an example as shown in Fig. 12 can be cited. Specifically, after the unidirectional moving distance Lt1 in the initial step is sequentially changed to 3000 m, 2000 m, 1500 m, and 1000 m, the unidirectional moving distance is changed to the unidirectional moving distance Lt2 in the intermediate step, that is, 500 m. Further, thereafter, the one-way moving distance Lt3 in the final step is changed stepwise to 1000 m, 1500 m, 2000 m, and 3000 m.

<(2-2)第2變化例> <(2-2) Second Modification>

於上述一實施形態中,以初期步驟及終期步驟中之單向移動距離大於中期步驟中之單向移動距離之方式控制金屬線W1之移動,但並不限於此。例如假定如下情形:於初期步驟及終期步驟中之至少一步驟、以及中期步驟中,進行使金屬線W1移動之方向在第1方向與第2方向之間切換之切換動作。於此情形時,考慮以如下方式控制金屬線W1之移動之態樣:於在初期步驟及終期步驟中之至少一步驟中進行之切換動作中之金屬線W1之加速度之絕對值小於中期步驟之切換動作中之金屬線W1之加速度之絕對值。根據此種態樣,於初期步驟及終期步驟中之至少一步驟中之切換動作時,金屬線W1之移動不易變得不穩定。其結果,不易於藉由塊體BL1之切薄而製造之基板產生裂紋及龜裂。 In the above embodiment, the movement of the wire W1 is controlled such that the one-way moving distance in the initial step and the final step is greater than the one-way moving distance in the intermediate step, but is not limited thereto. For example, it is assumed that in at least one of the initial step and the final step, and the intermediate step, a switching operation of switching the direction in which the metal wire W1 moves between the first direction and the second direction is performed. In this case, it is considered to control the movement of the wire W1 in such a manner that the absolute value of the acceleration of the wire W1 in the switching operation performed in at least one of the initial step and the final step is smaller than the intermediate step. The absolute value of the acceleration of the wire W1 in the switching action. According to this aspect, the movement of the wire W1 does not easily become unstable during the switching operation in at least one of the initial step and the final step. As a result, it is not easy to cause cracks and cracks in the substrate produced by thinning of the bulk BL1.

作為採用此種態樣之具體例,可列舉如由圖13至圖16所示之例。於圖13至圖15中,與圖8至圖10同樣地,例示有金屬線W1之移動速度相對於時間經過之變化,於橫方向及縱方向分別表示時刻及金屬線W1之速度。又,於圖16中,例示有自作為切割開始面之第1面S1至金屬線W1移動之金屬線移動位置為止之距離、與金屬線W1之加速度之絕對值之關係。 Specific examples of such a form include the examples shown in Figs. 13 to 16 . In FIGS. 13 to 10, similarly to FIGS. 8 to 10, the change in the moving speed of the metal wire W1 with respect to the passage of time is illustrated, and the time and the speed of the wire W1 are respectively indicated in the lateral direction and the vertical direction. In addition, FIG. 16 exemplifies the relationship between the distance from the first surface S1 of the cutting start surface to the movement position of the metal wire W1 and the absolute value of the acceleration of the metal wire W1.

具體而言,如由圖13及圖16所示,例如於初期步驟中,於第1移動期間AP1a及第2移動期間AP1b,將金屬線W1之加速度之絕對值Ac1設定為3m/sec2。又,如由圖14及圖16所示,例如於中期步驟中,於第1移動期間AP2a及第2移動期間AP2b,將金屬線W1之加速度之絕對值Ac2設定為15m/sec2。又,如由圖15及圖16所示,例如於終期步驟中,於第1移動期間AP3a及第2移動期間AP3b,將金屬線W1之加速度之絕對值Ac3設定為3m/sec2Specifically, as shown in FIG. 13 and FIG. 16, for example, in the initial step, the absolute value Ac1 of the acceleration of the wire W1 is set to 3 m/sec 2 in the first movement period AP1a and the second movement period AP1b. Further, as shown in FIG. 14 and FIG. 16, for example, in the intermediate step, the absolute value Ac2 of the acceleration of the wire W1 is set to 15 m/sec 2 in the first movement period AP2a and the second movement period AP2b. Further, as shown in FIG. 15 and FIG. 16, for example, in the final step, the absolute value Ac3 of the acceleration of the wire W1 is set to 3 m/sec 2 in the first movement period AP3a and the second movement period AP3b.

此處,假定於初期步驟中進行切換動作且於終期步驟中不進行切換動作之情形。於此情形時,只要以如下方式控制金屬線W1之移 動即可:初期步驟之切換動作中之金屬線W1之加速度之絕對值Ac1小於中期步驟之切換動作中之金屬線W1之加速度之絕對值Ac2。又,假定於終期步驟中進行切換動作且於初期步驟中不進行切換動作之情形。於此情形時,只要以如下方式控制金屬線W1之移動即可:終期步驟之切換動作中之金屬線W1之加速度之絕對值Ac3小於中期步驟之切換動作中之金屬線W1之加速度之絕對值Ac2。 Here, it is assumed that the switching operation is performed in the initial step and the switching operation is not performed in the final step. In this case, it is only necessary to control the movement of the wire W1 in the following manner. The absolute value Ac1 of the acceleration of the metal wire W1 in the switching operation of the initial step is smaller than the absolute value Ac2 of the acceleration of the metal wire W1 in the switching operation of the intermediate step. Further, it is assumed that the switching operation is performed in the final step and the switching operation is not performed in the initial step. In this case, the movement of the wire W1 can be controlled in such a manner that the absolute value Ac3 of the acceleration of the wire W1 in the switching operation of the final step is smaller than the absolute value of the acceleration of the wire W1 in the switching operation of the intermediate step. Ac2.

進而,假定於初期步驟及終期步驟兩者之步驟中進行切換動作之情形。於此情形時,只要以如下方式控制金屬線W1之移動即可:初期步驟及終期步驟中之至少一步驟之切換動作中之金屬線W1之加速度之絕對值小於中期步驟之切換動作中之金屬線W1之加速度之絕對值Ac2。而且,只要以如下方式控制金屬線W1之移動即可:初期步驟及終期步驟中之金屬線W1之加速度之絕對值Ac1、Ac3小於中期步驟中之金屬線W1之加速度之絕對值Ac2。於此情形時,更不易於基板產生裂紋及龜裂。 Further, it is assumed that the switching operation is performed in the steps of both the initial step and the final step. In this case, the movement of the metal wire W1 may be controlled in such a manner that the absolute value of the acceleration of the metal wire W1 in the switching operation of at least one of the initial step and the final step is smaller than the metal in the switching operation of the intermediate step. The absolute value of the acceleration of line W1 is Ac2. Further, it is only necessary to control the movement of the metal wire W1 in such a manner that the absolute values Ac1 and Ac3 of the acceleration of the metal wire W1 in the initial step and the final step are smaller than the absolute value Ac2 of the acceleration of the metal wire W1 in the intermediate step. In this case, cracks and cracks are less likely to occur on the substrate.

<(2-3)第3變化例> <(2-3) Third variation>

於上述第2變化例中,以初期步驟及終期步驟兩者之步驟中之金屬線W1之加速度之絕對值Ac1、Ac3成為固定值之方式控制金屬線W1之移動,但並不限於此。例如亦可使初期步驟中之金屬線W1之加速度之絕對值Ac1階段性地增加。又,例如亦可使終期步驟中之金屬線W1之加速度之絕對值Ac3階段性地減小。進而,亦可使初期步驟中之金屬線W1之加速度之絕對值Ac1階段性地增加且使終期步驟中之金屬線W1之加速度之絕對值Ac3階段性地減小。 In the second modification described above, the movement of the metal wire W1 is controlled so that the absolute values Ac1 and Ac3 of the acceleration of the metal wire W1 in the steps of the initial step and the final step are fixed. However, the present invention is not limited thereto. For example, the absolute value Ac1 of the acceleration of the wire W1 in the initial step may be increased stepwise. Further, for example, the absolute value Ac3 of the acceleration of the wire W1 in the final step may be gradually reduced. Further, the absolute value Ac1 of the acceleration of the metal wire W1 in the initial step may be increased stepwise, and the absolute value Ac3 of the acceleration of the metal wire W1 in the final step may be gradually reduced.

作為採用此種態樣之具體例,可列舉如由圖17所示之例。具體而言,於使初期步驟中之金屬線W1之加速度之絕對值Ac1依序階段性地增加為3m/sec2、6m/sec2、9m/sec2及12m/sec2後,將金屬線W1之加速度之絕對值變更為中期步驟中之金屬線W1之加速度之絕對值Ac2 即15m/sec2。其後,將終期步驟中之金屬線W1之加速度之絕對值Ac3階段性地減小為12m/sec2、9m/sec2、6m/sec2及3m/sec2As a specific example which employs such an aspect, the example shown in FIG. 17 is mentioned. Specifically, after the absolute value Ac1 of the acceleration of the metal wire W1 in the initial step is sequentially increased to 3 m/sec 2 , 6 m/sec 2 , 9 m/sec 2 , and 12 m/sec 2 , the metal wire is placed. The absolute value of the acceleration of W1 is changed to the absolute value Ac2 of the acceleration of the wire W1 in the intermediate step, that is, 15 m/sec 2 . Thereafter, the absolute value Ac3 of the acceleration of the metal wire W1 in the final step is stepwise reduced to 12 m/sec 2 , 9 m/sec 2 , 6 m/sec 2 and 3 m/sec 2 .

<(2-4)其他變化例> <(2-4) Other variations>

例如於上述一實施形態及第1變化例中,以初期步驟及終期步驟兩者之步驟中之單向移動距離大於中期步驟中之單向移動距離之方式控制金屬線W1之移動,但並不限於此。例如亦能夠以於初期步驟及終期步驟中之至少一步驟中金屬線W1朝單向持續地移動之單向移動距離大於中期步驟中之單向移動距離之方式控制金屬線W1之移動。 For example, in the above-described one embodiment and the first variation, the movement of the wire W1 is controlled in such a manner that the one-way moving distance in the steps of the initial step and the final step is greater than the one-way moving distance in the intermediate step, but Limited to this. For example, the movement of the metal wire W1 can also be controlled in such a manner that the one-way moving distance of the metal wire W1 continuously moving in one direction is greater than the one-way moving distance in the intermediate step in at least one of the initial step and the final step.

又,於上述一實施形態以及第1變化例中,以初期步驟及終期步驟兩者之步驟中之單向移動距離成為大致相同之方式控制金屬線W1之移動,但並不限於此。例如於初期步驟中,於金屬線W1開始接觸第1面S1時及剛接觸後,尤其處於金屬線W1之移動容易變得不穩定之傾向。對此,只要以初期步驟中之單向移動距離Lt1大於終期步驟中之單向移動距離Lt3之方式控制金屬線W1之移動,則初期步驟中之金屬線W1之移動不易變得不穩定。藉此,不易於藉由塊體BL1之切薄而製造之基板產生裂紋及龜裂。 Further, in the above-described first embodiment and the first modification, the movement of the wire W1 is controlled such that the one-way moving distance in the steps of the initial step and the final step is substantially the same, but the invention is not limited thereto. For example, in the initial step, when the metal wire W1 starts to contact the first surface S1 and immediately after the contact, the movement of the metal wire W1 tends to be unstable. On the other hand, as long as the movement of the wire W1 is controlled such that the one-way moving distance Lt1 in the initial step is larger than the one-way moving distance Lt3 in the final step, the movement of the wire W1 in the initial step is less likely to become unstable. Thereby, it is not easy to generate cracks and cracks in the substrate manufactured by the thinning of the block BL1.

又,於上述第2及第3變化例中,以初期步驟及終期步驟兩者之步驟中之金屬線W1之加速度之絕對值小於中期步驟中之金屬線W1之加速度之絕對值之方式控制金屬線W1之移動,但並不限於此。如上所述,例如於初期步驟中,於金屬線W1開始接觸第1面S1時及剛接觸後,尤其處於金屬線W1之移動容易變得不穩定之傾向。對此,只要以初期步驟中之金屬線W1之加速度之絕對值Ac1小於終期步驟中之金屬線W1之加速度之絕對值Ac3之方式控制金屬線W1之移動,則初期步驟中之金屬線W1之移動不易變得不穩定。藉此,不易於藉由塊體BL1之切薄而製造之基板產生裂紋及龜裂。 Further, in the second and third modifications described above, the metal is controlled in such a manner that the absolute value of the acceleration of the metal wire W1 in the steps of the initial step and the final step is smaller than the absolute value of the acceleration of the metal wire W1 in the intermediate step. The movement of the line W1 is not limited to this. As described above, for example, in the initial step, when the metal wire W1 starts to contact the first surface S1 and immediately after the contact, the movement of the metal wire W1 tends to be unstable. In this regard, as long as the absolute value Ac1 of the acceleration of the metal wire W1 in the initial step is smaller than the absolute value Ac3 of the acceleration of the metal wire W1 in the final step, the movement of the metal wire W1 is controlled, and the metal wire W1 in the initial step is used. Movement does not easily become unstable. Thereby, it is not easy to generate cracks and cracks in the substrate manufactured by the thinning of the block BL1.

又,於上述第2及第3變化例中,於第1移動及第2移動兩者之移 動中,初期步驟及終期步驟中之金屬線W1之加速度之絕對值較中期步驟中之金屬線W1之加速度之絕對值減小。然而,並不限於此。例如於第1移動及第2移動中之至少一移動中,亦可使初期步驟及終期步驟中之至少一步驟中之金屬線W1之加速度之絕對值減小。 Further, in the second and third modifications described above, the shift between the first movement and the second movement In the middle of the movement, the absolute value of the acceleration of the wire W1 in the initial step and the final step is smaller than the absolute value of the acceleration of the wire W1 in the intermediate step. However, it is not limited to this. For example, in at least one of the first movement and the second movement, the absolute value of the acceleration of the metal wire W1 in at least one of the initial step and the final step may be reduced.

又,於上述一實施形態以及各種變化例中,於初期步驟及終期步驟中之至少一步驟與中期步驟之間,單向移動距離及金屬線W1之加速度之絕對值中之其中一者不同,但並不限於此。例如亦可於初期步驟及終期步驟中之至少一步驟與中期步驟之間,單向移動距離及金屬線W1之加速度之絕對值兩者均不同。亦即,亦能夠以滿足下述條件1及條件2兩者之條件之方式控制金屬線W1之移動。條件1係於初期步驟及終期步驟中之至少一步驟中金屬線W1朝單向持續地移動之單向移動距離大於中期步驟中之單向移動距離之條件。又,條件2係於初期步驟及終期步驟中之至少一步驟中進行之切換動作中之金屬線W1之加速度之絕對值小於中期步驟之切換動作中之金屬線W1之加速度之絕對值之條件。藉此,更不易於藉由塊體BL1之切薄而製造之基板產生裂紋及龜裂。 Further, in the above-described one embodiment and various modifications, one of the absolute values of the one-way moving distance and the acceleration of the wire W1 is different between at least one of the initial step and the final step, and the intermediate step. But it is not limited to this. For example, the absolute value of the one-way moving distance and the acceleration of the wire W1 may be different between at least one of the initial step and the final step and the intermediate step. That is, the movement of the metal wire W1 can also be controlled so as to satisfy the conditions of both the conditions 1 and 2 below. Condition 1 is a condition in which the one-way moving distance of the metal wire W1 continuously moving in one direction is greater than the one-way moving distance in the intermediate step in at least one of the initial step and the final step. Further, the condition 2 is a condition that the absolute value of the acceleration of the metal wire W1 in the switching operation performed in at least one of the initial step and the final step is smaller than the absolute value of the acceleration of the metal wire W1 in the switching operation of the intermediate step. Thereby, cracks and cracks are less likely to occur in the substrate produced by thinning of the bulk BL1.

作為採用此種態樣之具體例,可列舉如由圖18至圖20所示之例。於圖18至圖20中,與圖8至圖10同樣地,例示有金屬線W1之移動速度相對於時間經過之變化,於橫方向及縱方向分別表示時刻及金屬線W1之速度。 Specific examples of such an aspect include the examples shown in Figs. 18 to 20 . In FIGS. 18 to 20, similarly to FIGS. 8 to 10, the change in the moving speed of the metal wire W1 with respect to the passage of time is exemplified, and the time and the speed of the wire W1 are respectively indicated in the lateral direction and the vertical direction.

具體而言,如由圖18所示,於初期步驟中,於第1移動期間AP1a及第2移動期間AP1b,使金屬線W1以加速度之絕對值Ac1進行加速。又,如由圖19所示,於中期步驟中,於第1移動期間AP2a及第2移動期間AP2b,使金屬線W1以較初期步驟之加速度之絕對值Ac1更大之加速度之絕對值Ac2進行加速。進而,如由圖20所示,於終期步驟中,於第1移動期間AP3a及第2移動期間AP3b,使金屬線W1以 較中期步驟之加速度之絕對值Ac2更小之加速度之絕對值Ac3進行加速。而且,如由圖18至圖20所示,初期步驟中之單向移動距離Lt1及終期步驟中之單向移動距離Lt3大於中期步驟中之單向移動距離Lt2。 Specifically, as shown in FIG. 18, in the initial step, the metal wire W1 is accelerated by the absolute value Ac1 of the acceleration in the first movement period AP1a and the second movement period AP1b. Further, as shown in FIG. 19, in the intermediate step, in the first movement period AP2a and the second movement period AP2b, the metal wire W1 is made to have an absolute value Ac2 of acceleration which is larger than the absolute value Ac1 of the acceleration of the initial step. accelerate. Further, as shown in FIG. 20, in the final step, the metal line W1 is made in the first moving period AP3a and the second moving period AP3b. The absolute value Ac3 of the acceleration smaller than the absolute value Ac2 of the acceleration of the intermediate step is accelerated. Further, as shown in Figs. 18 to 20, the one-way moving distance Lt1 in the initial step and the one-way moving distance Lt3 in the final step are larger than the one-way moving distance Lt2 in the intermediate step.

又,於上述一實施形態及各種變化例中,表示金屬線W1為研磨粒固著金屬線之例,但並不限於此。例如作為使用有金屬線W1之切割作為切割對象物之塊體BL1之方式,亦可採用一面使切削液流動一面藉由金屬線W1對切割對象物進行切割之方式。此處,於切削液中例如可包含碳化矽、氧化鋁、金剛石等研磨粒、礦物油、界面活性劑及分散劑等。 Moreover, in the above-described one embodiment and various modifications, the metal wire W1 is an example of the abrasive grain fixing metal wire, but the invention is not limited thereto. For example, as the block BL1 in which the cutting of the metal wire W1 is used as the object to be cut, the cutting object may be cut by the metal wire W1 while flowing the cutting fluid. Here, the cutting fluid may include, for example, abrasive grains such as tantalum carbide, alumina, or diamond, mineral oil, a surfactant, a dispersant, and the like.

再者,於上述一實施形態及各種變化例中,若將塊體BL1之硬度與基礎構件SB1之硬度設定為大致相同,則終期步驟中之金屬線W1之移動不易變得不穩定。其結果,不易於藉由塊體BL1之切薄而製造之基板產生裂紋及龜裂。再者,於將塊體BL1之硬度與基礎構件SB1之硬度設定為大致相同之方法中,例如可包含使用相同材料生成塊體BL1與基礎構件SB1之方法。 Further, in the above-described one embodiment and various modifications, when the hardness of the block BL1 and the hardness of the base member SB1 are set to be substantially the same, the movement of the wire W1 in the final step is less likely to become unstable. As a result, it is not easy to cause cracks and cracks in the substrate produced by thinning of the bulk BL1. Further, in the method of setting the hardness of the block BL1 to be substantially the same as the hardness of the base member SB1, for example, a method of producing the block BL1 and the base member SB1 using the same material may be included.

又,於上述一實施形態及各種變化例中,亦可根據於切割步驟中對金屬線W1施加之張力,調整金屬線W1之單向移動距離及加速度之絕對值。又,亦可根據於終期步驟中金屬線W1抵接於塊體BL1之長度及金屬線W1抵接於基礎構件SB1之長度中之至少一長度,而調整金屬線W1之單向移動距離及加速度之絕對值。 Further, in the above-described one embodiment and various modifications, the absolute value of the unidirectional moving distance and the acceleration of the wire W1 may be adjusted according to the tension applied to the wire W1 in the cutting step. Moreover, the one-way moving distance and acceleration of the metal wire W1 may be adjusted according to at least one length of the length of the metal wire W1 contacting the block BL1 and the length of the metal wire W1 contacting the base member SB1 in the final step. The absolute value.

再者,當然可將分別構成上述一實施形態及各種變化例之全部或一部分於適當且不矛盾之範圍內組合。 Furthermore, it is a matter of course that all or a part of the above-described one embodiment and various modifications can be combined in an appropriate and non-contradictory range.

[實施例] [Examples]

以下,對關於上述一實施形態及各種變化例之具體實施例進行說明。 Hereinafter, specific embodiments of the above-described one embodiment and various modifications will be described.

<(A)塊體之準備步驟> <(A) Preparation steps for the block>

自多晶矽之鑄錠切下長方體之塊體BL1。該塊體BL1中之縱、橫及進深之長度分別為約156mm、約156mm及約468mm。繼而,藉由接著劑將基礎構件SB1固定於塊體BL1之一側面。基礎構件SB1之材料為碳。又,該基礎構件SB1中之縱、橫及進深之長度分別為約40mm、約156mm及約468mm。 The block BL1 of the rectangular parallelepiped is cut from the ingot of the polycrystalline crucible. The lengths of the longitudinal, lateral and depth in the block BL1 are about 156 mm, about 156 mm and about 468 mm, respectively. Then, the base member SB1 is fixed to one side of the block BL1 by an adhesive. The material of the base member SB1 is carbon. Further, the lengths of the longitudinal direction, the lateral direction, and the depth of the base member SB1 are about 40 mm, about 156 mm, and about 468 mm, respectively.

<(B)塊體之切割步驟> <(B) Cutting step of the block>

藉由具有與上述一實施形態之基板切割裝置1相同之構成之基板切割裝置進行塊體BL1之切割步驟。 The cutting step of the block BL1 is performed by a substrate cutting device having the same configuration as that of the substrate cutting device 1 of the above-described embodiment.

具體而言,藉由基板切割裝置1之升降部HM1之保持部HP1而夾持固定於塊體BL1之基礎構件SB1。藉此,藉由升降部HM1保持塊體BL1。 Specifically, the base member SB1 of the block BL1 is sandwiched and held by the holding portion HP1 of the lifting portion HM1 of the substrate cutting device 1. Thereby, the block BL1 is held by the lifting portion HM1.

繼而,使基板切割裝置1中之金屬線W1開始往復移動。 Then, the metal wire W1 in the substrate cutting device 1 starts to reciprocate.

繼而,一面進行金屬線W1之往復移動,一面藉由升降部HM1使塊體BL1下降,藉此,藉由金屬線W1自第1面S1側朝向第2面S2側切割塊體BL1。此處,藉由升降部HM1使塊體BL1下降之進料速度係設定為平均400μm/min。而且,如由表1所示,進行初期步驟、中期步驟及終期步驟中之如單向移動距離Lt1、Lt2、Lt3及加速度之絕對值Ac1、Ac2、Ac3之類的切割條件互不相同之12種切割步驟。藉此,分別製造出具有一邊為156mm之大致正方形之主要面且厚度為約200μm之試樣1~12之多個矽基板。 Then, while the metal wire W1 is reciprocating, the block BL1 is lowered by the elevating portion HM1, whereby the block BL1 is cut from the first surface S1 side toward the second surface S2 side by the metal wire W1. Here, the feed rate at which the block BL1 is lowered by the lift portion HM1 is set to an average of 400 μm/min. Further, as shown in Table 1, the cutting conditions such as the one-way moving distances Lt1, Lt2, Lt3 and the absolute values of the accelerations Ac1, Ac2, Ac3 in the initial step, the intermediate step, and the final step are different from each other. a cutting step. As a result, a plurality of tantalum substrates having samples 1 to 12 having a thickness of about 200 μm and having a substantially square main surface of 156 mm were produced.

試樣1之切割條件係如下條件:將初期步驟、中期步驟及終期步驟中之單向移動距離Lt1、Lt2、Lt3設定為450m,將初期步驟、中期步驟及終期步驟中之金屬線W1之加速度之絕對值設定為5.0m/sec2。試樣2~7之切割條件係如下條件:以試樣1之切割條件為基礎,將初期步驟及終期步驟中之單向移動距離Lt1、Lt3依序增加為800m、900m、1500m、3000m、4500m及5000m。試樣8之切割條件係如下條件:以試樣3之切割條件為基礎,將終期步驟中之單向移動距離Lt1增加為3000m。試樣9之切割條件係如下條件:以試樣3之切割條件為基礎,將初期步驟中之單向移動距離Lt3增加為3000m。 The cutting conditions of the sample 1 are as follows: the one-way moving distances Lt1, Lt2, and Lt3 in the initial step, the intermediate step, and the final step are set to 450 m, and the acceleration of the wire W1 in the initial step, the intermediate step, and the final step is set. The absolute value is set to 5.0 m/sec 2 . The cutting conditions of the samples 2 to 7 are as follows: based on the cutting conditions of the sample 1, the one-way moving distances Lt1 and Lt3 in the initial step and the final step are sequentially increased to 800 m, 900 m, 1500 m, 3000 m, 4500 m. And 5000m. The cutting condition of the sample 8 was based on the condition that the one-way moving distance Lt1 in the final step was increased to 3000 m based on the cutting condition of the sample 3. The cutting condition of the sample 9 was based on the condition that the one-way moving distance Lt3 in the initial step was increased to 3000 m based on the cutting condition of the sample 3.

又,試樣10之切割條件係如下條件:以試樣9之切割條件為基礎,將初期步驟中之金屬線W1之加速度之絕對值Ac1減少為3.5m/sec2。試樣11之切割條件係如下條件:以試樣9之切割條件為基礎,將終期步驟中之金屬線W1之加速度之絕對值Ac3減少為3.5m/sec2。試樣12之切割條件係如下條件:以試樣9之切割條件為基礎,將初期步驟及終期步驟中之金屬線W1之加速度之絕對值Ac1、Ac3減少為3.5m/sec2Further, the cutting condition of the sample 10 is based on the condition that the absolute value Ac1 of the acceleration of the metal wire W1 in the initial step is reduced to 3.5 m/sec 2 based on the cutting condition of the sample 9. The cutting condition of the sample 11 was based on the condition that the absolute value Ac3 of the acceleration of the metal wire W1 in the final step was reduced to 3.5 m/sec 2 based on the cutting condition of the sample 9. The cutting conditions of the sample 12 were based on the conditions of the cutting conditions of the sample 9, and the absolute values Ac1 and Ac3 of the acceleration of the metal wire W1 in the initial step and the final step were reduced to 3.5 m/sec 2 .

再者,於表1中,關於各試樣,表示出將初期步驟之單向移動距離Lt1除以中期步驟之單向移動距離Lt2所得之值(Lt1/Lt2)、及將終期步驟之單向移動距離Lt3除以中期步驟之單向移動距離Lt2所得之值(Lt3/Lt2)。此處,關於值(Lt1/Lt2)及值(Lt3/Lt2),表示將小數點後第2位之值四捨五入所得之值。 Further, in Table 1, for each sample, the value obtained by dividing the one-way moving distance Lt1 of the initial step by the one-way moving distance Lt2 of the intermediate step (Lt1/Lt2), and the one-way step of the final step are shown. The moving distance Lt3 is divided by the value obtained by the one-way moving distance Lt2 of the intermediate step (Lt3/Lt2). Here, the value (Lt1/Lt2) and the value (Lt3/Lt2) indicate values obtained by rounding off the value of the second digit after the decimal point.

<(C)基板之評價方法> <(C) Evaluation method of substrate>

以試樣1~12之各試樣之多個基板為對象,藉由目視及檢查裝置而確認基板之表面有無產生微裂及缺損。繼而,針對試樣1~12之各試樣之多個基板,將確認到微裂及缺損中之至少一者之基板之片數除以全部基板之片數,並乘以100,藉此而算出不良之產生率(不良產生率)。此處,針對試樣1~12之各試樣算出之不良產生率係記入表1之右端之欄中。具體而言,試樣1~12之不良產生率分別為12.4%、10.9%、8.1%、6.9%、5.3%、6.4%、10.0%、8.7%、4.0%、3.3%、3.8%及3.1%。 For the plurality of substrates of each of the samples 1 to 12, it was confirmed by visual inspection and inspection equipment whether or not micro-cracks and defects were generated on the surface of the substrate. Then, for the plurality of substrates of each of the samples 1 to 12, the number of substrates on which at least one of the microcracks and the defects is confirmed is divided by the number of the entire substrates, and multiplied by 100. The rate of occurrence of defects (bad rate of occurrence) was calculated. Here, the defect occurrence rate calculated for each of the samples 1 to 12 is shown in the column at the right end of Table 1. Specifically, the defective yields of Samples 1 to 12 were 12.4%, 10.9%, 8.1%, 6.9%, 5.3%, 6.4%, 10.0%, 8.7%, 4.0%, 3.3%, 3.8%, and 3.1%, respectively. .

<(D)基板之評價結果> <(D) Evaluation result of substrate>

如由表1所示,與試樣1之不良產生率相比,試樣2~7之不良產生率較低。藉此,可知藉由以初期步驟及終期步驟中之單向移動距離Lt1、Lt3大於中期步驟中之單向移動距離Lt2之方式控制金屬線W1之移動,不良產生率降低。可推斷出,藉由切換金屬線W1移動之方向之切換動作之頻度於初期步驟及終期步驟中較中期步驟變低,而使金屬線W1之移動變得更穩定,且不易於基板產生裂紋及龜裂。再者,亦發現如下傾向:隨著初期步驟及終期步驟中之單向移動距離Lt1、Lt3之增加,不良產生率減少。 As shown in Table 1, the defect occurrence rates of the samples 2 to 7 were lower than those of the sample 1. Thereby, it is understood that the movement of the metal wire W1 is controlled such that the unidirectional moving distances Lt1 and Lt3 in the initial step and the final step are larger than the one-way moving distance Lt2 in the intermediate step, and the defective generation rate is lowered. It can be inferred that the frequency of the switching operation by switching the direction in which the metal wire W1 moves is lower in the intermediate step and the lower-end step in the initial step and the final step, so that the movement of the metal wire W1 becomes more stable, and cracking of the substrate is less likely to occur. Cracked. Further, a tendency has been found that the rate of occurrence of defects decreases as the one-way moving distances Lt1 and Lt3 in the initial step and the final step increase.

又,與試樣8之不良產生率相比,試樣9之不良產生率較低。藉此,可知藉由以初期步驟之單向移動距離Lt1大於終期步驟之單向移動距離Lt3之方式控制金屬線W1之移動,不良產生率降低。可推斷 出,於在金屬線W1開始接觸塊體BL1時及剛接觸後處於金屬線W1之移動容易變得不穩定之傾向之初期步驟中,使金屬線W1之移動更穩定化,藉此不易於基板產生裂紋及龜裂。 Moreover, the defect generation rate of the sample 9 was lower than the defect generation rate of the sample 8. Thereby, it is understood that the movement of the metal wire W1 is controlled such that the unidirectional movement distance Lt1 in the initial step is larger than the unidirectional movement distance Lt3 of the final step, and the defect occurrence rate is lowered. Inferred In the initial step when the metal wire W1 starts to contact the bulk BL1 and immediately after the contact, the movement of the metal wire W1 tends to be unstable, the movement of the metal wire W1 is stabilized, whereby the substrate is not easily formed. Cracks and cracks are generated.

又,與試樣9之不良產生率相比,試樣10~12之不良產生率較低。藉此,可知藉由以初期步驟及終期步驟中之金屬線W1之加速度之絕對值Ac1、Ac3中之至少一者小於中期步驟中之金屬線W1之加速度之絕對值Ac2之方式進行控制,不良產生率降低。可推斷出,藉由於在切換金屬線W1之移動方向之切換動作中使金屬線W1之移動狀態穩定化,而不易於基板產生裂紋及龜裂。 Moreover, the defect generation rate of the sample 10-12 was lower than the defect generation rate of the sample 9. Therefore, it is understood that at least one of the absolute values Ac1 and Ac3 of the acceleration of the metal wire W1 in the initial step and the final step is controlled to be smaller than the absolute value Ac2 of the acceleration of the metal wire W1 in the intermediate step, and the defect is poor. The rate of production is reduced. It can be inferred that the movement state of the metal wire W1 is stabilized in the switching operation of the switching direction of the switching metal wire W1, and cracking and cracking of the substrate are not easily caused.

又,試樣10之不良產生率較試樣11之不良產生率更低。藉此,可知藉由以初期步驟中之金屬線W1之加速度之絕對值Ac1小於終期步驟中之金屬線W1之加速度之絕對值Ac3之方式控制金屬線W1之移動,不良產生率降低。可推斷出,於在金屬線W1開始接觸塊體BL1時及剛接觸後處於金屬線W1之移動容易變得不穩定之傾向之初期步驟中,使金屬線W1之移動更穩定化,藉此不易於基板產生裂紋及龜裂。 Further, the defect occurrence rate of the sample 10 was lower than that of the sample 11. Thereby, it is understood that the movement rate of the metal wire W1 is controlled such that the absolute value Ac1 of the acceleration of the metal wire W1 in the initial step is smaller than the absolute value Ac3 of the acceleration of the metal wire W1 in the final step, and the defect occurrence rate is lowered. It can be inferred that the movement of the metal wire W1 is stabilized in the initial step when the metal wire W1 starts to contact the bulk BL1 and immediately after the contact, and the movement of the metal wire W1 tends to be unstable. Cracks and cracks are generated on the substrate.

又,與試樣10及試樣11之不良產生率相比,試樣12之不良產生率較低。藉此,可知藉由以初期步驟及終期步驟中之金屬線W1之加速度之絕對值Ac1、Ac3兩者小於中期步驟中之金屬線W1之加速度之絕對值Ac2之方式控制金屬線W1之移動,不良產生率降低。此處,亦可推斷出,藉由於在切換金屬線W1之移動方向之切換動作中使金屬線W1之移動狀態穩定化,而不易於基板產生裂紋及龜裂。 Moreover, the defect generation rate of the sample 12 was lower than the defect occurrence rate of the sample 10 and the sample 11. Therefore, it can be seen that the movement of the metal wire W1 is controlled such that the absolute values Ac1 and Ac3 of the acceleration of the metal wire W1 in the initial step and the final step are smaller than the absolute value Ac2 of the acceleration of the metal wire W1 in the intermediate step. The rate of adverse effects is reduced. Here, it can be inferred that the movement state of the metal wire W1 is stabilized in the switching operation of switching the moving direction of the metal wire W1, and cracking and cracking of the substrate are not easily caused.

1‧‧‧基板切割裝置 1‧‧‧Substrate cutting device

BL1‧‧‧塊體 BL1‧‧‧ block

BX1‧‧‧碎屑接收箱 BX1‧‧‧ Debris Receiving Box

GR1~GR4‧‧‧第1~4導引輥 GR1~GR4‧‧‧1~4 guide rolls

HM1‧‧‧升降部 HM1‧‧‧ Lifting Department

HP1‧‧‧保持部 HP1‧‧‧ Keeping Department

MR1~MR3‧‧‧第1~3主輥 MR1~MR3‧‧‧1~3 main roller

OB1‧‧‧保持對象物 OB1‧‧‧ Keep objects

P1、P2、P3‧‧‧旋轉軸 P1, P2, P3‧‧‧ rotating shaft

SB1‧‧‧基礎構件 SB1‧‧‧ basic components

W1‧‧‧金屬線 W1‧‧‧ metal wire

WR1‧‧‧第1捲盤 WR1‧‧‧Volume 1

WR2‧‧‧第2捲盤 WR2‧‧‧ Volume 2

X、Y、Z‧‧‧方向 X, Y, Z‧‧ Direction

Claims (8)

一種基板之製造方法,其包括:準備步驟,其準備包括第1面及配置於該第1面之背側且固定於保持構件之第2面之塊體;以及切割步驟,其一面交替地進行沿金屬線之長度方向之第1方向上之該金屬線之移動、及與上述第1方向相反之第2方向上之上述金屬線之移動,一面藉由上述金屬線自上述第1面側朝向上述第2面側切割上述塊體;且上述切割步驟包括:初期步驟,其使上述金屬線自上述第1面側接觸於上述塊體,並藉由上述金屬線切割上述塊體內之位於上述第1面側之第1區域;中期步驟,其藉由上述金屬線切割上述塊體內之位於上述第1區域與位於上述第2面側之第2區域之間之中間區域;以及終期步驟,其藉由上述金屬線切割上述塊體內之上述第2區域;且以如下方式控制上述金屬線之移動,即,於上述初期步驟及上述終期步驟中之至少一步驟中上述金屬線朝單向持續地移動之移動距離大於在上述中期步驟中上述金屬線朝上述單向持續地移動之移動距離。 A method of manufacturing a substrate, comprising: a preparation step of preparing a block including a first surface and a second surface disposed on a back side of the first surface and fixed to the holding member; and a cutting step of alternately performing one side The movement of the metal line in the first direction along the longitudinal direction of the metal line and the movement of the metal line in the second direction opposite to the first direction are directed from the first surface side by the metal line The second surface side cuts the block; and the cutting step includes an initial step of contacting the metal wire from the first surface side to the block body, and cutting the inside of the block by the metal wire a first region on the one side; an intermediate step of cutting an intermediate portion between the first region and the second region on the second surface side by the metal wire; and a final step of borrowing Cutting the second region in the block by the metal wire; and controlling the movement of the wire in such a manner that the metal is in at least one of the initial step and the final step The way toward the moving distance is greater than the continuously moving distance of the above intermediate steps in the metal wire is continuously toward the check. 如請求項1之基板之製造方法,其係以上述初期步驟中之上述移動距離大於上述終期步驟中之上述移動距離之方式控制上述金屬線之移動。 A method of manufacturing a substrate according to claim 1, wherein the movement of the metal wire is controlled such that the moving distance in the initial step is greater than the moving distance in the final step. 如請求項1之基板之製造方法,其係於上述初期步驟中階段性地減小上述移動距離。 A method of manufacturing a substrate according to claim 1, wherein the moving distance is reduced stepwise in the initial step. 如請求項1之基板之製造方法,其係於上述終期步驟中階段性地增加上述移動距離。 A method of manufacturing a substrate according to claim 1, wherein the moving distance is increased stepwise in the final step. 如請求項1至4中任一項之基板之製造方法,其係於上述初期步 驟及上述終期步驟中之至少一步驟以及上述中期步驟中,分別進行使上述金屬線移動之方向在上述第1方向與上述第2方向之間進行切換之切換動作;且以如下方式控制上述金屬線之移動:於上述初期步驟及上述終期步驟中之至少一步驟中進行之上述切換動作中之上述金屬線之加速度之絕對值小於在上述中期步驟中進行之上述切換動作中之上述金屬線之加速度之絕對值。 A method of manufacturing a substrate according to any one of claims 1 to 4, which is in the initial step And at least one of the step of the final step and the intermediate step, respectively performing a switching operation of switching a direction in which the metal wire moves between the first direction and the second direction; and controlling the metal in the following manner The movement of the wire: the absolute value of the acceleration of the metal wire in the switching operation performed in at least one of the initial step and the final step is smaller than the metal wire in the switching operation performed in the intermediate step The absolute value of the acceleration. 如請求項5之基板之製造方法,其係以如下方式控制上述金屬線之移動:於上述初期步驟中進行之上述切換動作中之上述金屬線之上述加速度之絕對值小於在上述終期步驟中進行之上述切換動作中之上述金屬線之上述加速度之絕對值。 The method of manufacturing a substrate according to claim 5, wherein the movement of the metal wire is controlled in such a manner that an absolute value of the acceleration of the metal wire in the switching operation performed in the initial step is smaller than that in the final step The absolute value of the acceleration of the metal line in the switching operation. 一種基板之製造方法,其包括:準備步驟,其準備包括第1面及配置於該第1面之背側且固定於保持構件之第2面之塊體;以及切割步驟,其一面交替地進行沿金屬線之長度方向之第1方向上之該金屬線之移動、及與上述第1方向相反之第2方向上之上述金屬線之移動,一面藉由上述金屬線自上述第1面側朝向上述第2面側切割上述塊體;且上述切割步驟包括:初期步驟,其使上述金屬線自上述第1面側接觸於上述塊體,並藉由上述金屬線切割上述塊體內之位於上述第1面側之第1區域;中期步驟,其藉由上述金屬線切割上述塊體內之位於上述第1區域與位於上述第2面側之第2區域之間之中間區域;以及終期步驟,其藉由上述金屬線切割上述塊體內之上述第2區域;且於上述初期步驟及上述終期步驟中之至少一步驟以及上述中期步驟中,分別進行使上述金屬線移動之方向在上述第1方向與上述第2方向之間進行切換之切換動作; 以如下方式控制上述金屬線之移動:於上述初期步驟及上述終期步驟中之至少一步驟中進行之上述切換動作中之上述金屬線之加速度之絕對值小於在上述中期步驟中進行之上述切換動作中之上述金屬線之加速度之絕對值。 A method of manufacturing a substrate, comprising: a preparation step of preparing a block including a first surface and a second surface disposed on a back side of the first surface and fixed to the holding member; and a cutting step of alternately performing one side The movement of the metal line in the first direction along the longitudinal direction of the metal line and the movement of the metal line in the second direction opposite to the first direction are directed from the first surface side by the metal line The second surface side cuts the block; and the cutting step includes an initial step of contacting the metal wire from the first surface side to the block body, and cutting the inside of the block by the metal wire a first region on the one side; an intermediate step of cutting an intermediate portion between the first region and the second region on the second surface side by the metal wire; and a final step of borrowing Cutting the second region in the block by the metal wire; and performing the moving of the metal wire in at least one of the initial step and the final step and the intermediate step The switching operation of switching between the first direction and the second direction; Controlling the movement of the metal wire in such a manner that the absolute value of the acceleration of the metal line in the switching operation performed in at least one of the initial step and the final step is smaller than the switching operation performed in the intermediate step The absolute value of the acceleration of the above metal wire. 如請求項7之基板之製造方法,其係以如下方式控制上述金屬線之移動:於上述初期步驟中進行之上述切換動作中之上述金屬線之上述加速度之絕對值小於在上述終期步驟中進行之上述切換動作中之上述金屬線之上述加速度之絕對值。 The method of manufacturing a substrate according to claim 7, wherein the movement of the metal wire is controlled in such a manner that an absolute value of the acceleration of the metal wire in the switching operation performed in the initial step is smaller than that in the final step The absolute value of the acceleration of the metal line in the switching operation.
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