TW201420332A - A metal foil with a carrier - Google Patents

A metal foil with a carrier Download PDF

Info

Publication number
TW201420332A
TW201420332A TW102134014A TW102134014A TW201420332A TW 201420332 A TW201420332 A TW 201420332A TW 102134014 A TW102134014 A TW 102134014A TW 102134014 A TW102134014 A TW 102134014A TW 201420332 A TW201420332 A TW 201420332A
Authority
TW
Taiwan
Prior art keywords
metal foil
resin
carrier
coating film
resin coating
Prior art date
Application number
TW102134014A
Other languages
Chinese (zh)
Other versions
TWI615271B (en
Inventor
Terumasa Moriyama
Original Assignee
Jx Nippon Mining & Metals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jx Nippon Mining & Metals Corp filed Critical Jx Nippon Mining & Metals Corp
Publication of TW201420332A publication Critical patent/TW201420332A/en
Application granted granted Critical
Publication of TWI615271B publication Critical patent/TWI615271B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/06Interconnection of layers permitting easy separation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/022Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
    • H05K3/025Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates by transfer of thin metal foil formed on a temporary carrier, e.g. peel-apart copper
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4644Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4652Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/08PCBs, i.e. printed circuit boards
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01Dielectrics
    • H05K2201/0137Materials
    • H05K2201/0162Silicon containing polymer, e.g. silicone
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0097Processing two or more printed circuits simultaneously, e.g. made from a common substrate, or temporarily stacked circuit boards

Abstract

Provided is a metallic foil having a carrier, wherein the peel strength of a resin sheet-shaped carrier and a metallic foil has been controlled. This metallic foil having a carrier, which comprises a sheet-shaped resin carrier and a metallic foil that has been detachably adhered to at least one surface of the carrier, is characterised in that the sheet-shaped carrier and the metallic foil are bonded using a resin coating comprising silicone and at least one resin selected from epoxy resin, melamine resin and fluororesin.

Description

附載體金屬箔 With carrier metal foil

本發明係關於一種附載體金屬箔。更詳細而言,係關於一種用於製造印刷配線板所使用之單面或者2層以上之多層積層板或極薄之無芯式基板的附載體金屬箔。 The present invention relates to a metal foil with a carrier. More specifically, it relates to a carrier-attached metal foil for use in manufacturing a single-sided or two-layer multilayer laminated board or an extremely thin coreless substrate used for a printed wiring board.

一般而言,印刷配線板係將使合成樹脂板、玻璃板、玻璃不織布、紙等基材中含浸合成樹脂而獲得之稱為「預浸體(Prepreg)」之介電材料作為基本構成材料。又,與預浸體相對之側接合有具有導電性之銅或銅合金箔等片材。一般將如此組裝而成之積層物稱為CCL(Copper Clad Laminate,覆銅箔層壓板)材料。對於銅箔之與預浸體接觸之面,為了提高接合強度,通常製成糙面。有時亦使用鋁、鎳、鋅等之箔代替銅或銅合金箔。該等之厚度為5~200μm左右。將該通常使用之CCL(Copper Clad Laminate)材料示於圖1。 In general, a printed wiring board is a dielectric material called a "prepreg" obtained by impregnating a base material such as a synthetic resin sheet, a glass plate, a glass nonwoven fabric, or a paper with a synthetic resin as a basic constituent material. Further, a sheet such as copper or a copper alloy foil having conductivity is joined to the side opposite to the prepreg. The laminate thus assembled is generally referred to as a CCL (Copper Clad Laminate) material. For the surface of the copper foil which is in contact with the prepreg, in order to improve the joint strength, a rough surface is usually formed. A foil of aluminum, nickel, zinc or the like is sometimes used instead of copper or copper alloy foil. These thicknesses are about 5 to 200 μm. The commonly used CCL (Copper Clad Laminate) material is shown in Fig. 1.

專利文獻1中提出有由合成樹脂製之板狀載體、與於該載體之至少一面可機械性地剝離地密接之金屬箔所構成之附載體金屬箔,並且記載有該附載體金屬箔可供於印刷配線板之組裝之主旨。而且,揭示有板狀載體與金屬箔之剝離強度較理想為1gf/cm~1kgf/cm。根據該附載體金屬箔,由於利用合成樹脂遍及銅箔整個面進行支撐,故而可防止於積層中在 銅箔上產生皺褶。又,該附載體金屬箔由於將金屬箔與合成樹脂無間隙地密接,故而於對金屬箔表面進行鍍金或蝕刻時,可將其投入至鍍金或蝕刻用之藥液中。進而,合成樹脂之線膨脹係數由於處於與作為基板之構成材料之銅箔及聚合後之預浸體同等之水準,故而不會引起電路之位置偏移,因此具有不良品之產生減少,可使良率提昇之優異效果。 Patent Document 1 proposes a plate-shaped carrier made of a synthetic resin and a metal foil with a metal foil which is mechanically adhered to at least one surface of the carrier, and the carrier-attached metal foil is described. The main purpose of assembly of printed wiring boards. Further, it is disclosed that the peel strength of the plate-shaped carrier and the metal foil is preferably from 1 gf/cm to 1 kgf/cm. According to the metal foil with a carrier, since the synthetic resin is supported over the entire surface of the copper foil, it can be prevented from being deposited in the laminate. Wrinkles are formed on the copper foil. Further, since the metal foil with the carrier is adhered to the synthetic resin without a gap, when the surface of the metal foil is subjected to gold plating or etching, it can be put into a chemical solution for gold plating or etching. Further, since the coefficient of linear expansion of the synthetic resin is at the same level as the copper foil as a constituent material of the substrate and the prepreg after polymerization, the positional deviation of the circuit is not caused, so that the occurrence of defective products can be reduced. Excellent results in yield improvement.

[先前技術文獻] [Previous Technical Literature]

[專利文獻] [Patent Literature]

[專利文獻1]日本特開2009-272589號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2009-272589

專利文獻1中所記載之附載體金屬箔係藉由簡化印刷電路板之製造步驟及提高良率而對削減製造成本作出較大貢獻之劃時代的發明,但關於板狀載體與金屬箔之剝離強度之最佳化及其手段,尚存研究之餘地。尤其是,作為對本發明者而言顯見之問題,可列舉板狀載體與金屬箔之剝離強度因板狀載體之材質而變得過高之方面,理想為提供一種可簡便地調節該剝離強度之機構。因此,本發明之課題在於提供一種樹脂製之板狀載體與金屬箔之剝離強度經調節之附載體金屬箔。 The carrier-attached metal foil described in Patent Document 1 is an epoch-making invention that contributes greatly to the reduction of the manufacturing cost by simplifying the manufacturing steps of the printed circuit board and improving the yield, but the peel strength of the plate-shaped carrier and the metal foil There is still room for research on the optimization and its means. In particular, as a problem apparent to the inventors, the peeling strength of the plate-shaped carrier and the metal foil is excessively high due to the material of the plate-shaped carrier, and it is preferable to provide a peel strength which can be easily adjusted. mechanism. Accordingly, an object of the present invention is to provide a metal foil with a carrier having a peel strength of a resin-made plate-shaped carrier and a metal foil.

本發明者等人對於樹脂板與金屬箔之間之剝離強度的調節方法進行努力研究,結果發現:於將樹脂板與金屬箔貼合之前,藉由使用組合有特定樹脂之樹脂塗膜對至少一者之表面進行被覆處理,可實現與所需之用途對應之剝離強度,從而完成本發明。 The inventors of the present invention have conducted an effort to adjust the peel strength between the resin sheet and the metal foil, and as a result, found that at least the resin coating film combined with the specific resin is used before the resin sheet is bonded to the metal foil. The surface of one of the layers is subjected to a coating treatment to achieve a peeling strength corresponding to the intended use, thereby completing the present invention.

即,本發明如下。 That is, the present invention is as follows.

(1)一種附載體金屬箔,其係由樹脂製之板狀載體、與可剝離地密接 於該載體之至少一面之金屬箔所構成者,且係使用由聚矽氧與選自環氧系樹脂、三聚氰胺系樹脂及氟樹脂中之任一種或複數種樹脂所構成之樹脂塗膜將板狀載體與金屬箔貼合而成。 (1) A carrier-attached metal foil which is made of a resin-made plate-shaped carrier and which is detachably adhered A metal foil which is formed on at least one side of the carrier, and a resin coating film made of polyoxymethylene and any one or a plurality of resins selected from the group consisting of an epoxy resin, a melamine resin, and a fluororesin is used. The carrier is bonded to a metal foil.

(2)如(1)之附載體金屬箔,其中於上述樹脂塗膜中,相對於聚矽氧100質量份,以合計為10~1500質量份之量含有環氧系樹脂、三聚氰胺系樹脂。 (2) The carrier-coated metal foil according to (1), wherein the resin coating film contains an epoxy resin or a melamine resin in an amount of 10 to 1500 parts by mass based on 100 parts by mass of the polyfluorene oxide.

(3)如(1)或(2)之附載體金屬箔,其中於上述樹脂塗膜中,相對於聚矽氧100質量份,以0~50質量份之量含有氟樹脂。 (3) The carrier-attached metal foil according to (1) or (2), wherein the resin coating film contains a fluororesin in an amount of from 0 to 50 parts by mass based on 100 parts by mass of the polyfluorene oxide.

(4)如(1)至(3)中任一項之附載體金屬箔,其中上述樹脂塗膜之厚度為0.1~10μm。 (4) The carrier-attached metal foil according to any one of (1) to (3), wherein the resin coating film has a thickness of 0.1 to 10 μm.

(5)如(1)至(4)中任一項之附載體金屬箔,其中板狀載體與金屬箔之剝離強度為10gf/cm以上200gf/cm以下。 (5) The carrier-attached metal foil according to any one of (1) to (4), wherein the peeling strength of the plate-shaped carrier and the metal foil is 10 gf/cm or more and 200 gf/cm or less.

(6)如(1)至(5)中任一項之附載體金屬箔,其中樹脂製之板狀載體包含熱硬化性樹脂。 (6) The carrier-attached metal foil according to any one of (1) to (5) wherein the resin-made plate-shaped carrier contains a thermosetting resin.

(7)如(1)至(6)中任一項之附載體金屬箔,其中樹脂製之板狀載體為預浸體。 (7) The carrier-attached metal foil according to any one of (1) to (6), wherein the resin-made plate-shaped carrier is a prepreg.

(8)如(6)或(7)之附載體金屬箔,其中上述樹脂製之板狀載體具有120~320℃之玻璃轉移溫度Tg。 (8) A carrier metal foil according to (6) or (7), wherein the plate-shaped carrier made of the above resin has a glass transition temperature Tg of from 120 to 320 °C.

(9)如(1)至(8)中任一項之附載體金屬箔,其中上述金屬箔之與上述載體接觸之側之表面之十點平均粗糙度(Rz jis)為3.5μm以下。 (9) The carrier-attached metal foil according to any one of (1) to (8), wherein a surface of the metal foil on the side in contact with the carrier has a ten-point average roughness (Rz jis) of 3.5 μm or less.

(10)如(1)至(9)中任一項之附載體金屬箔,其中上述金屬箔之未與上述載體接觸之側之表面之十點平均粗糙度(Rz jis)為0.4μm以上10.0μm以下。 (10) The carrier-attached metal foil according to any one of (1) to (9), wherein a ten-point average roughness (Rz jis) of a surface of the metal foil which is not in contact with the carrier is 0.4 μm or more and 10.0 Below μm.

(11)如(1)至(10)中任一項之附載體金屬箔,其中上述金屬箔之厚度為1μm以上400μm以下。 The carrier-attached metal foil according to any one of (1) to (10), wherein the metal foil has a thickness of from 1 μm to 400 μm.

(12)如(1)至(11)中任一項之附載體金屬箔,其中於220℃下進行3小時、6小時或9小時中之至少一種加熱後之金屬箔與板狀載體之剝離強度為10gf/cm以上200gf/cm以下。 (12) The carrier-attached metal foil according to any one of (1) to (11), wherein the stripping of the metal foil and the plate-shaped carrier after heating at 220 ° C for at least one of 3 hours, 6 hours or 9 hours The strength is 10 gf/cm or more and 200 gf/cm or less.

(13)如(1)至(12)中任一項之附載體金屬箔,其中上述金屬箔為銅箔。 (13) The carrier-attached metal foil according to any one of (1) to (12) wherein the metal foil is a copper foil.

(14)一種印刷配線板用金屬箔,其於金屬箔之表面具有由聚矽氧與選自環氧系樹脂、三聚氰胺系樹脂及氟樹脂中之任一種或複數種樹脂所構成之樹脂塗膜。 (14) A metal foil for a printed wiring board having a resin coating film comprising a polyfluorene oxide and any one or a plurality of resins selected from the group consisting of an epoxy resin, a melamine resin, and a fluororesin on the surface of the metal foil. .

(15)如(14)之印刷配線板用金屬箔,其中於上述樹脂塗膜中,相對於聚矽氧100質量份,以合計為10~1500質量份之量含有環氧系樹脂、三聚氰胺系樹脂。 (15) The metal foil for a printed wiring board according to (14), wherein the resin coating film contains an epoxy resin or a melamine in an amount of 10 to 1500 parts by mass based on 100 parts by mass of the polyfluorene oxide. Resin.

(16)如(14)或(15)之印刷配線板用金屬箔,其中於上述樹脂塗膜中,相對於聚矽氧100質量份,以0~50質量份之量含有氟樹脂。 (16) The metal foil for a printed wiring board according to the above aspect, wherein the resin coating film contains a fluororesin in an amount of from 0 to 50 parts by mass based on 100 parts by mass of the polyfluorene oxide.

(17)如(14)至(16)中任一項之印刷配線板用金屬箔,其中上述樹脂塗膜之厚度為0.1~10μm。 (17) The metal foil for a printed wiring board according to any one of (14) to (16), wherein the resin coating film has a thickness of 0.1 to 10 μm.

(18)如(14)至(17)中任一項之印刷配線板用金屬箔,其中對於使由上述聚矽氧、與選自環氧系樹脂、三聚氰胺系樹脂及氟樹脂中之任一種或複數種樹脂所構成之樹脂塗膜發揮作用之側之表面,於使該樹脂塗膜發揮作用之前,進行鉻酸鹽處理。 The metal foil for a printed wiring board according to any one of (14) to (17), wherein the polyfluorene and the epoxy resin, the melamine resin, and the fluororesin are selected from the group consisting of The surface on the side where the resin coating film composed of the plurality of resins functions is applied, and the chromate treatment is performed before the resin coating film acts.

(19)如(14)至(18)中任一項之印刷配線板用金屬箔,其中上述金屬箔之與上述樹脂塗膜接觸之側之表面之十點平均粗糙度(Rz jis)為3.5μm以下。 (19) The metal foil for a printed wiring board according to any one of (14) to (18), wherein a ten-point average roughness (Rz jis) of a surface of the metal foil on the side in contact with the resin coating film is 3.5 Below μm.

(20)如(14)至(19)中任一項之印刷配線板用金屬箔,其中上述金屬箔之未與上述樹脂塗膜接觸之側之表面之十點平均粗糙度(Rz jis)為0.4μm以上10.0μm以下。 (20) The metal foil for a printed wiring board according to any one of (14) to (19), wherein a ten-point average roughness (Rz jis) of a surface of the metal foil which is not in contact with the resin coating film is 0.4 μm or more and 10.0 μm or less.

(21)一種金屬箔,其係於至少一個表面具有由聚矽氧、與選自環氧系樹脂、三聚氰胺系樹脂及氟樹脂中之任一種或複數種樹脂所構成之樹脂塗膜者,並利用該表面而用於可剝離地密接樹脂製之板狀載體之用途。 (21) A metal foil having a resin coating film comprising at least one surface of polyoxynium oxide and any one or a plurality of resins selected from the group consisting of epoxy resins, melamine resins, and fluororesins, and The surface is used for the purpose of peelably adhering a resin-made plate-shaped carrier.

(22)如(21)之金屬箔,其中於上述樹脂塗膜中,相對於聚矽氧100質量份,以合計為10~1500質量份之量含有環氧系樹脂、三聚氰胺系樹脂。 (22) The metal foil of (21), wherein the resin coating film contains an epoxy resin or a melamine resin in an amount of 10 to 1500 parts by mass based on 100 parts by mass of the polyoxymethylene.

(23)如(20)或(21)之金屬箔,其中於上述樹脂塗膜中,相對於聚矽氧100質量份,以0~50質量份之量含有氟樹脂。 (23) The metal foil of (20) or (21), wherein the resin coating film contains a fluororesin in an amount of from 0 to 50 parts by mass based on 100 parts by mass of the polyfluorene oxide.

(24)如(21)至(23)中任一項之金屬箔,其中上述樹脂塗膜之厚度為0.1~10μm。 The metal foil according to any one of (21) to (23), wherein the resin coating film has a thickness of 0.1 to 10 μm.

(25)如(21)至(24)中任一項之金屬箔,其中對於使由上述聚矽氧與選自環氧系樹脂、三聚氰胺系樹脂及氟樹脂中之任一種或複數種樹脂所構成之樹脂塗膜發揮作用之側之表面,於使該樹脂塗膜發揮作用之前,進行鉻酸鹽處理。 (25) The metal foil according to any one of (21) to (24), wherein the polyfluorene oxide and any one or more resins selected from the group consisting of epoxy resins, melamine resins, and fluororesins are used. The surface on the side on which the resin coating film is formed is subjected to chromate treatment before the resin coating film acts.

(26)如(21)至(25)中任一項之金屬箔,其中上述金屬箔之與上述樹脂塗膜接觸之側之表面之十點平均粗糙度(Rz jis)為3.5μm以下。 (26) The metal foil according to any one of (21) to (25), wherein a surface of the metal foil on the side in contact with the resin coating film has a ten-point average roughness (Rz jis) of 3.5 μm or less.

(27)一種樹脂製之板狀載體,其於至少一個表面具有由聚矽氧與選自環氧系樹脂、三聚氰胺系樹脂及氟樹脂中之任一種或複數種樹脂所構成之樹脂塗膜。 (27) A resin-made plate-shaped carrier having a resin coating film comprising at least one surface of polyoxymethylene and any one or a plurality of resins selected from the group consisting of an epoxy resin, a melamine resin, and a fluororesin.

(28)如(27)之板狀載體,其中於上述樹脂塗膜中,相對於聚矽氧100質量份,以合計為10~1500質量份之量含有環氧系樹脂、三聚氰胺系樹脂。 (28) The plate-shaped carrier of (27), wherein the resin coating film contains an epoxy resin or a melamine resin in an amount of 10 to 1500 parts by mass based on 100 parts by mass of the polyfluorene oxide.

(29)如(27)或(28)之板狀載體,其中於上述樹脂塗膜中,相對於聚矽氧100質量份,以0~50質量份之量含有氟樹脂。 (29) The plate-shaped carrier of (27) or (28), wherein the resin coating film contains a fluororesin in an amount of from 0 to 50 parts by mass based on 100 parts by mass of the polyfluorene oxide.

(30)如(27)至(29)中任一項之板狀載體,其中上述樹脂塗膜之厚度為0.1~10μm。 The plate-shaped carrier according to any one of (27) to (29), wherein the resin coating film has a thickness of 0.1 to 10 μm.

(31)一種板狀載體,其係於至少一個表面具有由聚矽氧與選自環氧系 樹脂、三聚氰胺系樹脂及氟樹脂中之任一種或複數種樹脂所構成之樹脂塗膜的樹脂製之板狀載體,並利用該表面而用於可剝離地密接金屬箔之用途。 (31) A plate-shaped carrier having at least one surface having a polysiloxane and an epoxy group A resin-made plate-shaped carrier of a resin coating film composed of any one of a resin, a melamine resin, and a fluororesin or a plurality of resins, and the surface is used for the purpose of peelably adhering the metal foil.

(32)如(31)之板狀載體,其中於上述樹脂塗膜中,相對於聚矽氧100質量份,以合計為10~1500質量份之量含有環氧系樹脂、三聚氰胺系樹脂。 (32) The plate-shaped carrier of (31), wherein the resin coating film contains an epoxy resin or a melamine resin in an amount of 10 to 1500 parts by mass based on 100 parts by mass of the polyoxymethylene.

(33)如(31)或(32)之板狀載體,其中於上述樹脂塗膜中,相對於聚矽氧100質量份,以0~50質量份之量含有氟樹脂。 (33) The plate-shaped carrier of (31) or (32), wherein the resin coating film contains a fluororesin in an amount of from 0 to 50 parts by mass based on 100 parts by mass of the polyfluorene oxide.

(34)如(31)至(33)中任一項之板狀載體,其中上述樹脂塗膜之厚度為0.1~10μm。 The plate-shaped carrier according to any one of (31) to (33), wherein the resin coating film has a thickness of 0.1 to 10 μm.

(35)一種多層覆金屬積層板之製造方法,其包括:對(1)至(13)中任一項之附載體金屬箔之至少一個金屬箔側積層樹脂,繼而重複積層樹脂或金屬箔1次以上。 (35) A method of producing a multilayer metal-clad laminate comprising: at least one metal foil side build-up resin of the carrier-attached metal foil of any one of (1) to (13), and then repeating the laminated resin or metal foil 1 More than once.

(36)一種多層覆金屬積層板之製造方法,其包括:於(1)至(13)中任一項之附載體金屬箔之金屬箔側積層樹脂,繼而重複積層樹脂、單面或兩面覆金屬積層板、或申請專利範圍第1至13項中任一項之附載體金屬箔、或金屬箔1次以上。 (36) A method for producing a multilayer metal-clad laminate comprising: the metal foil side-layer resin of the carrier-attached metal foil according to any one of (1) to (13), and then repeating the laminated resin, one-sided or two-sided coating A metal laminated plate, or a metal foil with a carrier or a metal foil of any one of claims 1 to 13 or more.

(37)如(35)或(36)之多層覆金屬積層板之製造方法,其進而包括:將上述附載體金屬箔之板狀載體與金屬箔剝離而分離之步驟。 (37) The method for producing a multilayer metal-clad laminate according to (35) or (36), further comprising the step of separating and separating the plate-shaped carrier of the carrier-attached metal foil from the metal foil.

(38)如(37)之製造方法,其包括:藉由對進行剝離而分離之金屬箔之一部分或全部進行蝕刻而將其除去之步驟。 (38) The method according to (37), comprising the step of removing one or all of the metal foil separated by peeling and etching.

(39)一種多層覆金屬積層板,其可藉由(35)至(38)中任一項之製造方法而獲得。 (39) A multilayer metal-clad laminate which can be obtained by the production method of any one of (35) to (38).

(40)一種增層基板之製造方法,其包括:於(1)至(13)中任一項之積層體之金屬箔側形成一層以上之增層配線層之步驟。 (40) A method of producing a build-up substrate, comprising the step of forming one or more build-up wiring layers on the metal foil side of the laminate of any one of (1) to (13).

(41)如(40)之增層基板之製造方法,其中增層配線層係使用減成法或全加成法或半加成法之至少一種方法而形成。 (41) The method for producing a build-up substrate according to (40), wherein the build-up wiring layer is formed by at least one of a subtractive method or a full additive method or a semi-additive method.

(42)一種增層基板之製造方法,其包括:於(1)至(13)中任一項之附載體金屬箔之至少一個金屬箔側積層樹脂,其次重複積層樹脂、單面或兩面配線基板、單面或兩面覆金屬積層板、(1)至(13)中任一項之附載體金屬箔或金屬箔1次以上。 (42) A method of producing a build-up substrate, comprising: at least one metal foil side build-up resin of the carrier-attached metal foil according to any one of (1) to (13), and secondly repeating the laminated resin, single-sided or double-sided wiring A substrate, a single-sided or double-sided metal-clad laminate, or a carrier-attached metal foil or metal foil according to any one of (1) to (13).

(43)如(42)之增層基板之製造方法,其進而包括:對單面或兩面配線基板、單面或兩面覆金屬積層板、附載體金屬箔之金屬箔、附載體金屬箔之板狀載體、金屬箔、或樹脂進行開孔,並於該孔之側面及底面進行導通鍍敷之步驟。 (43) The method for producing a build-up substrate according to (42), further comprising: a single-sided or double-sided wiring substrate, a single-sided or double-sided metal-clad laminate, a metal foil with a carrier metal foil, and a metal foil-attached sheet The carrier, the metal foil, or the resin is opened, and the step of conducting plating is performed on the side and the bottom surface of the hole.

(44)如(42)或(43)之增層基板之製造方法,其進而包括:於構成上述單面或兩面配線基板之金屬箔、構成單面或兩面覆金屬積層板之金屬箔、構成附載體金屬箔之金屬箔、及金屬箔之至少一者上形成配線之步驟。 (44) The method for producing a build-up substrate according to (42) or (43), further comprising: a metal foil constituting the single-sided or double-sided wiring substrate; a metal foil constituting a single-sided or double-sided metal-clad laminate; A step of forming a wiring on at least one of a metal foil with a carrier metal foil and a metal foil.

(45)如(42)至(44)中任一項之增層基板之製造方法,其進而包括:於形成有配線之表面上,使單面密接有金屬箔之(1)至(13)中任一項之附載體金屬箔之樹脂板側接觸並進行積層之步驟。 (45) The method for producing a build-up substrate according to any one of (42) to (44), further comprising: (1) to (13) in which a single surface is adhered to the metal foil on the surface on which the wiring is formed A step of contacting and laminating the side of the resin sheet with the carrier metal foil according to any one of them.

(46)如(42)至(44)中任一項之增層基板之製造方法,其進而包括:於形成有配線之表面上積層樹脂,並於該樹脂上使兩面密接有金屬箔之(1)至(13)中任一項之附載體金屬箔之一個金屬箔接觸並進行積層之步驟。 The method for producing a build-up substrate according to any one of (42) to (44), further comprising: laminating a resin on a surface on which the wiring is formed, and adhering the metal foil to both surfaces of the resin ( 1) A step of contacting and laminating a metal foil of a carrier metal foil according to any one of (13).

(47)如(42)至(46)中任一項之增層基板之製造方法,其中上述樹脂之至少一個為預浸體。 The method for producing a build-up substrate according to any one of (42) to (46), wherein at least one of the above resins is a prepreg.

(48)如(40)至(47)中任一項之增層基板之製造方法,其進而包括:將上述附載體金屬箔之板狀載體與金屬箔剝離而分離之步驟。 The method for producing a build-up substrate according to any one of (40) to (47), further comprising the step of separating the plate-shaped carrier of the metal foil with a carrier and the metal foil.

(49)如(48)之增層配線板之製造方法,其進而包括:藉由對未與板狀載體密接之金屬箔之一部分或全部進行蝕刻而將其除去之步驟。 (49) The method for producing a build-up wiring board according to (48), further comprising the step of removing a part or all of the metal foil which is not in close contact with the plate-shaped carrier by etching.

(50)一種增層配線板,其係藉由(48)或(49)之製造方法而獲得。 (50) A build-up wiring board obtained by the manufacturing method of (48) or (49).

(51)一種印刷電路板之製造方法,其包括:藉由(40)至(47)中任 一項之製造方法而製造增層基板之步驟。 (51) A method of manufacturing a printed circuit board, comprising: by any of (40) to (47) A step of manufacturing a build-up substrate by a manufacturing method.

(52)一種印刷電路板之製造方法,其包括:藉由(49)或(50)之製造方法而製造增層配線板之步驟。 (52) A method of manufacturing a printed circuit board, comprising the step of manufacturing a build-up wiring board by the manufacturing method of (49) or (50).

根據本發明,可簡便地調節板狀載體與金屬箔之剝離強度。因此,例如可將先前顯示出過高剝離強度之附載體金屬箔調節為較佳之剝離強度,因而可獲得提高利用附載體金屬箔之印刷配線板之生產性的優點。 According to the present invention, the peel strength of the plate-shaped carrier and the metal foil can be easily adjusted. Therefore, for example, the carrier metal foil which has previously exhibited an excessively high peel strength can be adjusted to have a preferable peel strength, and thus the advantage of improving the productivity of the printed wiring board using the carrier-attached metal foil can be obtained.

10‧‧‧積層模具 10‧‧‧Laminated mold

11‧‧‧附載體金屬箔 11‧‧‧With carrier metal foil

11a‧‧‧金屬箔 11a‧‧‧metal foil

11b‧‧‧樹脂塗膜 11b‧‧‧Resin coating

11c‧‧‧板狀載體 11c‧‧‧plate carrier

12‧‧‧預浸體 12‧‧‧Prepreg

13‧‧‧內層核 13‧‧‧ Inner nuclear

14‧‧‧頁 Page 14‧‧‧

15‧‧‧冊 15‧‧ ‧

16‧‧‧增層 16‧‧‧Additional

圖1係表示CCL之一構成例。 Fig. 1 shows an example of the configuration of a CCL.

圖2係表示本發明之附載體金屬箔之一構成例。 Fig. 2 is a view showing an example of the structure of a metal foil with a carrier of the present invention.

圖3係表示利用本發明之附載體銅箔(於樹脂板之單面接合有銅箔之形態)之多層CCL之組裝例。 Fig. 3 is a view showing an example of assembly of a multilayer CCL using the copper foil with a carrier of the present invention (a form in which a copper foil is bonded to one side of a resin sheet).

圖4係表示利用本發明之附載體銅箔(於樹脂板之兩面接合有銅箔之形態)之多層CCL之組裝例。 Fig. 4 is a view showing an example of assembly of a multilayer CCL using the copper foil with a carrier of the present invention (a form in which a copper foil is bonded to both surfaces of a resin sheet).

於本發明之附載體金屬箔之一實施形態中,準備由樹脂製之板狀載體、與可剝離地密接於該載體之單面或兩面、較佳為兩面之金屬箔所構成之附載體金屬箔。將本發明之附載體金屬箔之一構成例示於圖2及圖3。尤其於圖3之最初之情形,揭示有於樹脂製之板狀載體11c之兩面可剝離地密接有金屬箔11a之附載體金屬箔11。板狀載體11c與金屬箔11a之間係使用具有下述特定結構之樹脂塗膜11b進行貼合。 In one embodiment of the metal foil with a carrier of the present invention, a plate-shaped carrier made of a resin and a carrier metal which is peelably adhered to one or both sides of the carrier, preferably two-sided metal foil, is prepared. Foil. One of the structures of the metal foil with a carrier of the present invention is shown in Figs. 2 and 3. In particular, in the first case of Fig. 3, the carrier-attached metal foil 11 in which the metal foil 11a is adhered to both surfaces of the resin-made plate-shaped carrier 11c is disclosed. The plate-shaped carrier 11c and the metal foil 11a are bonded together using the resin coating film 11b having the specific structure described below.

於結構方面,與圖1所示之CCL類似,本發明之附載體金 屬箔由於金屬箔與樹脂最終會被分離,故而具有可容易地剝離之結構。於該方面,CCL由於不被剝離,故而結構與功能完全不同。 In terms of structure, similar to the CCL shown in FIG. 1, the carrier gold of the present invention Since the metal foil and the resin are finally separated, the foil has a structure that can be easily peeled off. In this respect, since CCL is not peeled off, the structure and function are completely different.

本發明中所使用之附載體金屬箔由於終究必須被剝離,故而密接性過高則不適宜,但板狀載體與金屬箔需要有於製作印刷電路板之過程中進行之鍍敷等藥液處理步驟中不會剝離之程度之密接性。 Since the metal foil with a carrier used in the present invention must be peeled off after all, the adhesion is too high, which is not preferable, but the plate-shaped carrier and the metal foil need to be treated with a chemical solution such as plating in the process of manufacturing a printed circuit board. The degree of adhesion that does not peel off in the step.

此處,藉由樹脂塗膜而被賦予之金屬箔與板狀載體之剝離強度較佳為10gf/cm以上,更佳為30gf/cm以上,進而較佳為50gf/cm以上,另一方面,較佳為200gf/cm以下,更佳為150gf/cm以下,進而較佳為80gf/cm以下。藉由將金屬箔與板狀載體之剝離強度設為此種範圍,可容易地調節為於搬送時或加工時不會發生剝離,另一方面,可手工剝離、即可機械地剝離之剝離強度。 Here, the peeling strength of the metal foil and the plate-shaped carrier to be provided by the resin coating film is preferably 10 gf/cm or more, more preferably 30 gf/cm or more, and still more preferably 50 gf/cm or more. It is preferably 200 gf/cm or less, more preferably 150 gf/cm or less, still more preferably 80 gf/cm or less. By setting the peeling strength of the metal foil and the plate-shaped carrier to such a range, it can be easily adjusted so that peeling does not occur during transportation or processing, and peeling strength can be mechanically peeled off by hand. .

為了實現此種密接性之剝離強度之調節係藉由使用由如下所述之聚矽氧、與選自環氧系樹脂、三聚氰胺系樹脂及氟樹脂中之任一種或複數種樹脂所構成之樹脂塗膜而進行。其原因在於:藉由對此種樹脂塗膜進行如下所述之特定條件之燒附處理,並用於板狀載體與金屬箔之間進行貼合,可適度地降低密接性,而將剝離強度調節為上述範圍。 The adjustment of the peel strength for achieving such adhesion is by using a resin composed of polyoxynium as described below and any one or a plurality of resins selected from the group consisting of epoxy resins, melamine resins, and fluororesins. The film is applied. The reason for this is that the resin coating film is subjected to a sintering treatment under the specific conditions described below, and is used for bonding between the plate-shaped carrier and the metal foil, thereby appropriately reducing the adhesion and adjusting the peel strength. For the above range.

作為環氧系樹脂,可列舉:雙酚A型環氧樹脂、雙酚F型環氧樹脂、酚醛清漆型環氧樹脂、溴化環氧樹脂、胺型環氧樹脂、可撓性環氧樹脂、氫化雙酚A型環氧樹脂、苯氧基樹脂、溴化苯氧基樹脂等。 Examples of the epoxy resin include bisphenol A epoxy resin, bisphenol F epoxy resin, novolak epoxy resin, brominated epoxy resin, amine epoxy resin, and flexible epoxy resin. , hydrogenated bisphenol A type epoxy resin, phenoxy resin, brominated phenoxy resin, and the like.

作為三聚氰胺系樹脂,可列舉:甲醚化三聚氰胺樹脂、丁基化脲三聚氰胺樹脂、丁基化三聚氰胺樹脂、甲基化三聚氰胺樹脂、丁醇改質三聚氰胺樹脂等。又,三聚氰胺系樹脂亦可為上述樹脂與丁基化脲樹脂、丁基化苯代三聚氰胺樹脂等之混合樹脂。 Examples of the melamine-based resin include a methyl etherified melamine resin, a butylated urea melamine resin, a butylated melamine resin, a methylated melamine resin, and a butanol-modified melamine resin. Further, the melamine-based resin may be a mixed resin of the above resin, a butylated urea resin, or a butylated benzene melamine resin.

再者,較佳為環氧系樹脂之數量平均分子量為2000~3000,三聚氰胺系樹脂之數量平均分子量為500~1000。藉由具有此種數量平均分 子量,變得可實現樹脂之塗料化,並且變得容易將樹脂塗膜之接著強度調整為特定範圍。 Further, it is preferred that the epoxy resin has a number average molecular weight of from 2,000 to 3,000, and the melamine resin has a number average molecular weight of from 500 to 1,000. By having such an average number of points The amount of the resin becomes paintable, and it becomes easy to adjust the adhesive strength of the resin coating film to a specific range.

又,作為氟樹脂,可列舉:聚四氟乙烯、聚氯三氟乙烯、聚偏二氟乙烯、聚氟乙烯等。 Further, examples of the fluororesin include polytetrafluoroethylene, polychlorotrifluoroethylene, polyvinylidene fluoride, and polyvinyl fluoride.

作為聚矽氧,可列舉:甲基苯基聚矽氧烷、甲基氫聚矽氧烷、二甲基聚矽氧烷、改質二甲基聚矽氧烷、其等之混合物等。此處,所謂改質,例如可列舉:環氧基改質、烷基改質、胺基改質、羧基改質、醇改質、氟改質、烷基芳烷基聚醚改質、環氧聚醚改質、聚醚改質、烷基高級醇酯改質、聚酯改質、醯氧基烷基改質、鹵化烷基醯氧基烷基改質、鹵化烷基改質、胺基乙二醇改質、巰基改質、含羥基之聚酯改質等。 Examples of the polyoxymethane include methylphenyl polyoxyalkylene, methyl hydrogen polyoxyalkylene oxide, dimethyl polyoxyalkylene oxide, modified dimethyl polyoxyalkylene oxide, and the like. Here, the modification includes, for example, epoxy modification, alkyl modification, amine modification, carboxyl modification, alcohol modification, fluorine modification, alkyl aralkyl polyether modification, and ring formation. Oxypolyether modification, polyether modification, alkyl higher alcohol ester modification, polyester modification, decyloxyalkyl modification, halogenated alkyl decyloxy alkyl modification, halogenated alkyl modification, amine Ethylene glycol modification, sulfhydryl modification, hydroxyl-containing polyester modification, etc.

於樹脂塗膜中,若膜厚過小,則樹脂塗膜過薄而難以形成,因此生產性容易降低。又,膜厚即便超過一定厚度,亦未見樹脂塗膜之剝離性之進一步提高,而樹脂塗膜之製造成本容易升高。就此種觀點而言,樹脂塗膜之膜厚較佳為0.1~10μm,進而較佳為0.5~5μm。又,樹脂塗膜之膜厚可藉由於下述程序中以特定塗佈量塗佈樹脂塗料而實現。 In the resin coating film, when the film thickness is too small, the resin coating film is too thin to be formed, and thus productivity is liable to lower. Further, even if the film thickness exceeds a certain thickness, the peeling property of the resin coating film is not further improved, and the production cost of the resin coating film is likely to increase. From this point of view, the film thickness of the resin coating film is preferably from 0.1 to 10 μm, more preferably from 0.5 to 5 μm. Further, the film thickness of the resin coating film can be achieved by applying a resin coating material at a specific coating amount in the following procedure.

於樹脂塗膜中,聚矽氧係作為樹脂塗膜之剝離劑而發揮功能。因此,若環氧系樹脂、三聚氰胺系樹脂之合計量與聚矽氧相比過多,則於板狀載體與金屬箔之間,樹脂塗膜所賦予之剝離強度增大,因而樹脂塗膜之剝離性降低,有變得不再容易手工剝離之情形。另一方面,若環氧系樹脂、三聚氰胺系樹脂之合計量過少,則上述剝離強度減小,因而有附載體金屬箔於搬送時或加工時發生剝離之情形。就此觀點而言,較佳為相對於聚矽氧100質量份,較佳為以1500質量份之量含有環氧系樹脂、三聚氰胺系樹脂,進而較佳為以20~800重量份之量含有。 In the resin coating film, the polyfluorene oxide functions as a release agent for the resin coating film. Therefore, when the total amount of the epoxy resin or the melamine resin is too large compared with the polyfluorene oxide, the peeling strength imparted by the resin coating film is increased between the plate-shaped carrier and the metal foil, and thus the peeling of the resin coating film is performed. The sex is reduced, and there is a case where it is no longer easy to manually peel off. On the other hand, when the total amount of the epoxy resin or the melamine resin is too small, the peel strength is reduced, and thus the carrier-attached metal foil may be peeled off during transportation or processing. In this regard, the epoxy resin or the melamine resin is preferably contained in an amount of 1,500 parts by mass, more preferably in an amount of 20 to 800 parts by weight, based on 100 parts by mass of the polyfluorene oxide.

又,氟樹脂與聚矽氧同樣地作為剝離劑而發揮功能,且具有提高樹脂塗膜之耐熱性之效果。若氟樹脂與聚矽氧相比過多,則上述剝離 強度減小,因而除了附載體金屬箔於搬送時或加工時發生剝離以外,下述燒附步驟中所需之溫度亦上升,因此變得不經濟。就此觀點而言,較佳為氟樹脂相對於聚矽氧100質量份,較佳為0~50質量份,進而較佳為0~40質量份。 Further, the fluororesin functions as a release agent in the same manner as the polyfluorene oxide, and has an effect of improving the heat resistance of the resin coating film. If the fluororesin is excessively compared with polyfluorene oxide, the above peeling Since the strength is reduced, the temperature required in the following baking step is also increased in addition to the peeling of the metal foil with the carrier during transportation or processing, and thus it becomes uneconomical. From this point of view, the fluororesin is preferably 0 to 50 parts by mass, more preferably 0 to 40 parts by mass, per 100 parts by mass of the polyfluorene oxide.

樹脂塗膜中,除了聚矽氧、及環氧樹脂及/或三聚氰胺樹脂、及視需要之氟樹脂以外,亦可進而含有選自SiO2、MgO、Al2O3、BaSO4及Mg(OH)2中之1種以上之表面粗化粒子。藉由使樹脂塗膜含有表面粗化粒子,樹脂塗膜之表面變得凹凸。藉由該凹凸,塗佈有樹脂塗膜之板狀載體或金屬箔之表面變得凹凸,而成為消光表面。關於表面粗化粒子之含量,只要樹脂塗膜被凹凸化則無特別限定,相對於聚矽氧100質量份,較佳為1~10質量份。 The resin coating film may further contain, in addition to polyfluorene oxide, epoxy resin and/or melamine resin, and optionally a fluororesin, SiO 2 , MgO, Al 2 O 3 , BaSO 4 , and Mg (OH). ) of 2 or more kinds of surface roughening particles. When the resin coating film contains surface roughening particles, the surface of the resin coating film becomes uneven. By the unevenness, the surface of the plate-shaped carrier or the metal foil coated with the resin coating film becomes uneven, and becomes a matte surface. The content of the surface roughening particles is not particularly limited as long as the resin coating film is roughened, and is preferably 1 to 10 parts by mass based on 100 parts by mass of the polyfluorene oxide.

表面粗化粒子之粒徑較佳為15nm~4μm。此處,粒徑係指由掃描電子顯微鏡(Scanning Electron Microscope,SEM)照片等測得之平均粒徑(最大粒徑與最小粒徑之平均值)。藉由使表面粗化粒子之粒徑為上述範圍,樹脂塗膜之表面之凹凸量變得容易調整,結果板狀載體或金屬箔之表面之凹凸量變得容易調整。具體而言,板狀載體或金屬箔之表面之凹凸量以JIS規定之最大高度粗糙度Ry計成為4.0μm左右。 The particle diameter of the surface roughened particles is preferably 15 nm to 4 μm. Here, the particle diameter refers to an average particle diameter (an average value of the maximum particle diameter and the minimum particle diameter) measured by a scanning electron microscope (SEM) photograph or the like. By setting the particle diameter of the surface roughening particles to the above range, the amount of unevenness on the surface of the resin coating film can be easily adjusted, and as a result, the amount of unevenness on the surface of the plate-shaped carrier or the metal foil can be easily adjusted. Specifically, the amount of unevenness on the surface of the plate-shaped carrier or the metal foil is about 4.0 μm in terms of the maximum height roughness Ry prescribed by JIS.

此處,對附載體金屬箔之製造方法進行說明。 Here, a method of producing a metal foil with a carrier will be described.

該附載體金屬箔可經過具有如下步驟之程序而獲得:於板狀載體或金屬箔之至少一個表面塗佈上述樹脂塗膜之步驟;及使該所塗佈之樹脂塗膜硬化之燒附步驟。以下,對各步驟進行說明。 The carrier-attached metal foil can be obtained by a procedure of the steps of: coating the resin coating film on at least one surface of the plate-shaped carrier or the metal foil; and baking step of hardening the applied resin coating film . Hereinafter, each step will be described.

(塗佈步驟) (coating step)

塗佈步驟係於板狀載體之單面或兩面塗佈由作為主劑之聚矽氧、作為硬化劑之環氧系樹脂、三聚氰胺系樹脂、以及視需要之作為剝離劑之氟樹脂所構成之樹脂塗料而形成樹脂塗膜的步驟。樹脂塗料係於醇等有機溶劑 中溶解有環氧系樹脂、三聚氰胺系樹脂、氟樹脂及聚矽氧者。又,關於樹脂塗料中之調配量(添加量),較佳為相對於聚矽氧100質量份,環氧系樹脂、三聚氰胺系樹脂之合計為10~1500質量份。又,氟樹脂,相對於聚矽氧100質量份,較佳為0~50質量份。 The coating step is performed by coating a single surface or both surfaces of the plate-shaped carrier with a polyfluorene oxide as a main component, an epoxy resin as a curing agent, a melamine resin, and optionally a fluororesin as a release agent. A step of forming a resin coating film by a resin coating. Resin coating is based on organic solvents such as alcohol An epoxy resin, a melamine resin, a fluororesin, and a polyoxyxide are dissolved therein. In addition, the total amount (addition amount) of the resin coating material is preferably from 10 to 1,500 parts by mass based on 100 parts by mass of the polyoxymethylene oxide, and the total of the epoxy resin and the melamine resin. Further, the fluororesin is preferably 0 to 50 parts by mass based on 100 parts by mass of the polyfluorene oxide.

作為塗佈步驟中之塗佈方法,只要可形成樹脂塗膜則無特別限定,可使用:凹版塗佈法、棒式塗佈法、輥式塗佈法、淋幕式流塗法、使用靜電塗裝機之方法等,就樹脂塗膜之均勻性、及作業之簡便性方面而言,較佳為凹版塗佈法。又,作為塗佈量,以樹脂塗膜3成為較佳之膜厚0.5~5μm之方式,樹脂量較佳為1.0~2.0g/m2The coating method in the coating step is not particularly limited as long as the resin coating film can be formed, and a gravure coating method, a bar coating method, a roll coating method, a curtain flow coating method, and static electricity can be used. The method of the coating machine or the like is preferably a gravure coating method in terms of uniformity of the resin coating film and ease of work. Further, the coating amount is preferably such that the resin coating film 3 has a film thickness of 0.5 to 5 μm, and the resin amount is preferably 1.0 to 2.0 g/m 2 .

凹版塗佈法係藉由將充滿在輥表面所設置之凹部(槽)中之樹脂塗料轉印至板狀載體上,而於板狀載體之表面形成樹脂塗膜之方法。具體而言,將表面設置有槽之下側輥之下部浸漬於樹脂塗料中,藉由下側輥之旋轉而將樹脂塗料汲取至槽內。然後,於下側輥、與配置於下側輥之上側之上側輥之間配置板狀載體,藉由一面以上側輥將板狀載體壓抵於下側輥,一面使下側輥及上側輥旋轉,而搬送板狀載體,並且將汲取至槽內之樹脂塗料轉印(塗佈)至板狀載體之單面。 The gravure coating method is a method of forming a resin coating film on the surface of a plate-shaped carrier by transferring a resin coating filled in a concave portion (groove) provided on the surface of the roller onto a plate-shaped carrier. Specifically, the lower portion of the surface under the groove is immersed in the resin coating, and the resin coating is drawn into the groove by the rotation of the lower roller. Then, a plate-shaped carrier is disposed between the lower roll and the upper side roller disposed on the upper side of the lower roll, and the plate-shaped carrier is pressed against the lower roll by one side or more side rolls, and the lower side roll and the upper side roll are pressed. The plate-shaped carrier is transferred while being rotated, and the resin coating drawn into the groove is transferred (coated) to one side of the plate-shaped carrier.

又,於板狀載體之搬入側,藉由以接觸下側輥之表面之方式配置刮刀,可將汲取至槽以外之輥表面的過量樹脂塗料除去,而可於板狀載體之表面塗佈特定量之樹脂塗料。再者,於槽之尺寸(大小及深度)為較大之情形,或樹脂塗料之黏度過高之情形時,形成於板狀載體之單面之樹脂塗膜難以變得平滑。因此,亦可於板狀載體之搬出側配置平滑化輥,而維持樹脂塗膜之平滑度。 Further, by arranging the doctor blade on the loading side of the plate-shaped carrier so as to contact the surface of the lower roller, excess resin paint drawn onto the surface of the roller other than the groove can be removed, and the surface of the plate carrier can be coated with a specific coating. Amount of resin coating. Further, when the size (size and depth) of the groove is large or the viscosity of the resin coating is too high, the resin coating film formed on one side of the plate-shaped carrier is difficult to be smooth. Therefore, the smoothing roller can be disposed on the carrying-out side of the plate-shaped carrier to maintain the smoothness of the resin coating film.

再者,於板狀載體之兩面形成樹脂塗膜之情形時,於板狀載體之單面形成樹脂塗膜後,將板狀載體翻轉,再次配置於下側輥與上側輥之間。然後,與上述同樣地將下側輥之槽內之樹脂塗料轉印(塗佈)至板 狀載體之背面。 Further, when a resin coating film is formed on both surfaces of the plate-shaped carrier, after forming a resin coating film on one surface of the plate-shaped carrier, the plate-shaped carrier is inverted and placed between the lower roller and the upper roller. Then, the resin coating in the groove of the lower roll is transferred (coated) to the plate in the same manner as described above. The back side of the carrier.

(燒附步驟) (burning step)

燒附步驟係對塗佈步驟中所形成之樹脂塗膜於125~320℃(燒附溫度)下實施0.5~60秒鐘(燒附時間)之燒附處理的步驟。如此,藉由對由特定調配量之樹脂塗料形成之樹脂塗膜實施特定條件之燒附處理,可將藉由樹脂塗膜所賦予之板狀載體與金屬箔之間的剝離強度控制為特定範圍。於本發明中,燒附溫度為板狀載體之到達溫度。又,燒附處理中所使用之加熱方法係使用先前公知之裝置。 The baking step is a step of subjecting the resin coating film formed in the coating step to a baking treatment at a temperature of 125 to 320 ° C (baking temperature) for 0.5 to 60 seconds (baking time). By performing the sintering treatment under specific conditions on the resin coating film formed of the resin coating material of a specific blending amount, the peeling strength between the plate-shaped carrier and the metal foil imparted by the resin coating film can be controlled to a specific range. . In the present invention, the baking temperature is the reaching temperature of the plate-shaped carrier. Further, the heating method used in the baking treatment uses a previously known device.

於燒附變得不充分之條件、例如燒附溫度未達125℃、或燒附時間未達0.5秒之情形時,樹脂塗膜變得硬化不足,上述剝離強度超過200g/cm,剝離性降低。又,於燒附過度之條件、例如燒附溫度超過320℃之情形時,樹脂塗膜劣化,上述剝離強度超過200g/cm,剝離時之作業性變差。或者,有板狀載體因高溫而變質之情形。又,於燒附時間超過60秒之情形時,生產性會變差。 When the baking is insufficient, for example, when the baking temperature is less than 125 ° C or the baking time is less than 0.5 second, the resin coating film becomes insufficiently hardened, and the peeling strength exceeds 200 g/cm, and the peeling property is lowered. . In addition, when the baking temperature exceeds 320 ° C, the resin coating film is deteriorated, and the peel strength exceeds 200 g/cm, and the workability at the time of peeling is deteriorated. Alternatively, there is a case where the plate-shaped carrier is deteriorated due to high temperature. Moreover, when the baking time exceeds 60 seconds, productivity is deteriorated.

於附載體金屬箔之製造方法中,上述塗佈步驟之樹脂塗料亦可為由作為主劑之聚矽氧、作為硬化劑之環氧樹脂、三聚氰胺系樹脂、作為剝離劑之氟樹脂、以及選自SiO2、MgO、Al2O3、BaSO4及Mg(OH)2中之1種以上之表面粗化粒子所構成者。 In the method for producing a carrier-attached metal foil, the resin coating material of the coating step may be a polyfluorene oxide as a main component, an epoxy resin as a curing agent, a melamine resin, a fluororesin as a release agent, and an optional It is composed of one or more kinds of surface roughened particles of SiO 2 , MgO, Al 2 O 3 , BaSO 4 and Mg(OH) 2 .

具體而言,樹脂塗料係於上述之添加有聚矽氧之樹脂溶液中進而添加表面粗化粒子而成者。藉由將此種表面粗化粒子進而添加於樹脂塗料中,樹脂塗膜之表面變得凹凸,藉由該凹凸使板狀載體或金屬箔變得凹凸,成為消光表面。而且,為了獲得具有此種消光表面之板狀載體或金屬箔,樹脂塗料中之表面粗化粒子之調配量(添加量)相對於聚矽氧100質量份,較佳為1~10質量份。又,表面粗化粒子之粒徑進而較佳為15nm~4μm。 Specifically, the resin coating material is obtained by adding the surface roughening particles to the above-mentioned resin solution to which polyoxymethylene is added. By adding such surface roughening particles to the resin coating material, the surface of the resin coating film becomes uneven, and the unevenness causes the plate-shaped carrier or the metal foil to become uneven, thereby becoming a matte surface. Moreover, in order to obtain a plate-shaped carrier or a metal foil having such a matte surface, the amount (addition amount) of the surface roughening particles in the resin coating material is preferably from 1 to 10 parts by mass based on 100 parts by mass of the polyoxymethylene. Further, the particle diameter of the surface roughened particles is more preferably 15 nm to 4 μm.

本發明之製造方法如上所說明,但於實施本發明時,在不對上述各步驟產生不良影響之範圍內,於上述各步驟之間或前後亦可包括其他步驟。例如,亦可於塗佈步驟之前進行清洗板狀載體之表面的清洗步驟。 The production method of the present invention is as described above, but in the practice of the present invention, other steps may be included between or before and after the above steps within a range that does not adversely affect the above steps. For example, the step of washing the surface of the plate-shaped carrier may also be carried out before the coating step.

又,於多層印刷配線板之製造過程中,於積層壓製步驟或除膠渣步驟中進行加熱處理之情況較多。因此,附載體金屬箔所承受之熱歷程於積層數越多時越嚴重。因此,在考慮尤其是應用於多層印刷配線板之基礎上,較理想為於經過所需之熱歷程後,藉由樹脂塗膜所賦予的金屬箔與板狀載體之剝離強度亦為上述範圍內。 Further, in the manufacturing process of the multilayer printed wiring board, heat treatment is often performed in the lamination pressing step or the desmear step. Therefore, the thermal history of the metal foil with the carrier is more severe as the number of layers is increased. Therefore, in consideration of the application to a multilayer printed wiring board in particular, it is preferable that the peeling strength of the metal foil and the plate-shaped carrier imparted by the resin coating film after the required heat history is within the above range .

因此,於本發明之進而較佳之一實施形態中,假定多層印刷配線板之製造過程中之加熱條件的例如於220℃下進行3小時、6小時或9小時中之至少一種加熱後,藉由樹脂塗膜所賦予的金屬箔與板狀載體之剝離強度較佳為30gf/cm以上,更佳為50gf/cm以上。又,該剝離強度較佳為200gf/cm以下,更佳為150gf/cm以下,進而更佳為80gf/cm以下。 Therefore, in a further preferred embodiment of the present invention, it is assumed that the heating condition in the manufacturing process of the multilayer printed wiring board is performed, for example, at 220 ° C for at least one of heating for 3 hours, 6 hours or 9 hours, by The peeling strength of the metal foil and the plate-shaped carrier to be applied to the resin coating film is preferably 30 gf/cm or more, and more preferably 50 gf/cm or more. Further, the peel strength is preferably 200 gf/cm or less, more preferably 150 gf/cm or less, still more preferably 80 gf/cm or less.

關於220℃下之加熱後之剝離強度,就可對應多種積層數之觀點而言,較佳為於3小時後及6小時後兩者、或6小時及9小時後兩者之剝離強度均滿足上述範圍,進而較佳為3小時、6小時及9小時後之全部之剝離強度均滿足上述範圍。 Regarding the peel strength after heating at 220 ° C, it is preferable that the peel strengths of both of them are satisfied after 3 hours and 6 hours, or after 6 hours and 9 hours, from the viewpoint of a plurality of layers. In the above range, it is further preferred that all of the peel strengths after 3 hours, 6 hours, and 9 hours satisfy the above range.

於本發明中,剝離強度係依據JIS C6481所規定之90度剝離強度測定方法而測定。 In the present invention, the peel strength is measured in accordance with the 90-degree peel strength measuring method specified in JIS C6481.

以下,對用以實現此種剝離強度之各材料之具體之構成要件進行說明。 Hereinafter, specific constituent elements of each material for realizing such peel strength will be described.

作為成為板狀載體之樹脂,並無特別限制,可使用:酚樹脂、聚醯亞胺樹脂、環氧樹脂、天然橡膠、松脂等,較佳為熱硬化性樹脂。又,亦可使用預浸體。與金屬箔貼合前之預浸體處於B階狀態即可。由於預浸體(C階)之線膨脹係數為12~18(×10-6/℃),與作為基板之構成材料之銅 箔之16.5(×10-6/℃)、或SUS(Steel Use Stainless,日本不鏽鋼標準)壓製板之17.3(×10-6/℃)大致相等,故而就不易產生由壓製前後之基板尺寸與設計時之基板尺寸不同之現象(縮放變化)所導致之電路之位置偏移之方面而言有利。進而,作為該等優點之協同效果,多層之極薄無芯式基板之生產亦成為可能。此處使用之預浸體可為與構成電路基板之預浸體相同者,亦可為不同者。再者,先前係使用金屬板作為附載體金屬箔之板狀載體。於該情形時,藉由焊接或接著板狀載體與金屬箔而使其等密接。於使用接著劑之情形時,就耐熱性之觀點而言,通常難言適合於增層者較多,於藉由焊接使其等密接之情形時,若採用整面焊接則剝離強度過高,而於後階段變得難以用手剝離,又,若使用部分焊接,則變得難以防止板狀載體與金屬箔之間之藥液滲入,任意情形均難言適宜於增層。因此,藉由使用樹脂製之板狀載體,可於與金屬箔之間發揮出適度之剝離強度,且可藉由使用耐熱性樹脂,而充分地耐受增層時之熱歷程。 The resin to be a plate-shaped carrier is not particularly limited, and a phenol resin, a polyimide resin, an epoxy resin, a natural rubber, a rosin or the like can be used, and a thermosetting resin is preferable. Also, a prepreg can be used. The prepreg before bonding with the metal foil may be in the B-stage state. Since the linear expansion coefficient of the prepreg (C-stage) is 12 to 18 (×10 -6 /°C), 16.5 (×10 -6 /°C) or SUS (Steel Use) of the copper foil as a constituent material of the substrate. Stainless, Japanese stainless steel standard) 17.3 (×10 -6 / °C) of the press plate is roughly equal, so it is not easy to produce the position of the circuit caused by the difference between the substrate size before and after pressing and the substrate size at the time of design (scale change) It is advantageous in terms of offset. Further, as a synergistic effect of these advantages, the production of a multilayer ultra-thin coreless substrate is also possible. The prepreg used herein may be the same as or different from the prepreg constituting the circuit board. Further, a metal plate was previously used as a plate-shaped carrier with a carrier metal foil. In this case, it is bonded to the metal foil by soldering or by subsequent bonding. In the case of using an adhesive, from the viewpoint of heat resistance, it is generally difficult to apply a large number of layers, and when it is bonded by welding, if the whole surface is welded, the peel strength is too high. In the latter stage, it becomes difficult to peel off by hand, and if partial welding is used, it becomes difficult to prevent the penetration of the chemical solution between the plate-shaped carrier and the metal foil, and it is difficult to apply the layering in any case. Therefore, by using a plate-shaped carrier made of a resin, it is possible to exhibit an appropriate peel strength with the metal foil, and it is possible to sufficiently withstand the heat history at the time of layer formation by using a heat-resistant resin.

因此,該板狀載體具有較高之玻璃轉移溫度Tg之情況就將加熱後之剝離強度維持於最佳範圍之觀點而言較佳,例如為120~320℃,較佳為170~240℃之玻璃轉移溫度Tg。再者,玻璃轉移溫度Tg係藉由DSC(示差掃描熱量測定法)所測得之值。 Therefore, it is preferable that the plate-shaped carrier has a high glass transition temperature Tg from the viewpoint of maintaining the peel strength after heating to an optimum range, for example, 120 to 320 ° C, preferably 170 to 240 ° C. Glass transfer temperature Tg. Further, the glass transition temperature Tg is a value measured by DSC (differential scanning calorimetry).

又,較理想為樹脂之熱膨脹率為金屬箔之熱膨脹率之+10%、-30%以內。藉此,可有效地防止因金屬箔與樹脂之熱膨脹差異所導致之電路之位置偏移,而減少不良品產生,提高良率。 Further, it is preferable that the thermal expansion coefficient of the resin is within +10% or -30% of the thermal expansion coefficient of the metal foil. Thereby, the positional deviation of the circuit due to the difference in thermal expansion between the metal foil and the resin can be effectively prevented, and the generation of defective products can be reduced, and the yield can be improved.

板狀載體之厚度並無特別限制,可為剛性亦可為軟性,若過厚,則會對熱壓中之熱分佈產生不良影響,另一方面,若過薄,則會彎曲而使印刷配線板之製造步驟無法進行下去,因此通常為5μm以上1000μm以下,較佳為50μm以上900μm以下,更佳為100μm以上400μm以下。 The thickness of the plate-shaped carrier is not particularly limited, and may be rigid or soft. If it is too thick, it may adversely affect the heat distribution in hot pressing. On the other hand, if it is too thin, it may bend to make printed wiring. Since the manufacturing step of the sheet cannot be carried out, it is usually 5 μm or more and 1000 μm or less, preferably 50 μm or more and 900 μm or less, and more preferably 100 μm or more and 400 μm or less.

作為金屬箔,具代表性者為銅箔或銅合金箔,亦可使用鋁、鎳、鋅等之箔。於為銅箔或銅合金箔之情形時,可使用電解箔或壓延箔。金屬箔並無特別限定,若考慮用作印刷電路基板之配線,則厚度一般為1μm以上、較佳為5μm以上,及400μm以下、較佳為120μm以下。於板狀載體之兩面貼附金屬箔之情形時,可使用相同厚度之金屬箔,亦可使用不同厚度之金屬箔。 As the metal foil, a representative one is a copper foil or a copper alloy foil, and a foil of aluminum, nickel, zinc or the like can also be used. In the case of a copper foil or a copper alloy foil, an electrolytic foil or a calendered foil can be used. The metal foil is not particularly limited. When it is considered as a wiring for a printed circuit board, the thickness is generally 1 μm or more, preferably 5 μm or more, and 400 μm or less, preferably 120 μm or less. When a metal foil is attached to both sides of the plate-shaped carrier, a metal foil of the same thickness may be used, or a metal foil of a different thickness may be used.

亦可對所使用之金屬箔實施各種表面處理。例如可列舉:以賦予耐熱性為目的之金屬鍍敷(Ni鍍敷、Ni-Zn合金鍍敷、Cu-Ni合金鍍敷、Cu-Zn合金鍍敷、Zn鍍敷、Cu-Ni-Zn合金鍍敷、Co-Ni合金鍍敷等)、用以賦予防銹性或耐變色性之鉻酸鹽處理(包括使鉻酸鹽處理液中含有1種以上之Zn、P、Ni、Mo、Zr、Ti等合金元素之情形)、用以調整表面粗糙度之粗化處理(例如鍍銅粒或藉由Cu-Ni-Co合金鍍敷、Cu-Ni-P合金鍍敷、Cu-Co合金鍍敷、Cu-Ni合金鍍敷、Cu-Co合金鍍敷、Cu-As合金鍍敷、Cu-As-W合金鍍敷等銅合金鍍敷而獲得者)。當然,粗化處理會對金屬箔與板狀載體之剝離強度產生影響,亦會對鉻酸鹽處理產生較大影響。鉻酸鹽處理就防銹性或耐變色性之觀點而言較為重要,由於可見顯著提高剝離強度之傾向,故而作為剝離強度之調整方法亦有意義。 Various surface treatments can also be applied to the metal foil used. For example, metal plating for imparting heat resistance (Ni plating, Ni-Zn alloy plating, Cu-Ni alloy plating, Cu-Zn alloy plating, Zn plating, Cu-Ni-Zn alloy) Chromate treatment for imparting rust resistance or discoloration resistance by plating, Co-Ni alloy plating, etc. (including including one or more kinds of Zn, P, Ni, Mo, Zr in the chromate treatment liquid) , Ti and other alloying elements), roughening treatment to adjust the surface roughness (such as copper plating or by Cu-Ni-Co alloy plating, Cu-Ni-P alloy plating, Cu-Co alloy plating Obtained by copper alloy plating such as coating, Cu-Ni alloy plating, Cu-Co alloy plating, Cu-As alloy plating, Cu-As-W alloy plating, etc.). Of course, the roughening treatment has an effect on the peel strength of the metal foil and the plate-shaped carrier, and also has a large influence on the chromate treatment. The chromate treatment is important from the viewpoint of rust prevention property and discoloration resistance, and since it is seen that the peel strength is remarkably improved, it is also meaningful as a method of adjusting the peel strength.

對於先前之CCL,由於期待樹脂與銅箔之剝離強度較高,故而例如將電解銅箔之糙面(M面)設為與樹脂之接著面,藉由實施粗化處理等表面處理,而謀求由化學及物理之投錨效應引起之接著力提昇。又,於樹脂側,亦為了提高與金屬箔之接著力,而進行添加各種黏合劑等處理。如上所述,本發明不同於CCL,金屬箔與樹脂最終需要剝離,因此剝離強度過高則不利。 In the conventional CCL, since the peeling strength of the resin and the copper foil is expected to be high, for example, the rough surface (M surface) of the electrolytic copper foil is set to the surface of the resin, and surface treatment such as roughening treatment is performed. The adhesion caused by the chemical and physical anchoring effect is enhanced. Further, on the resin side, in order to increase the adhesion to the metal foil, various kinds of adhesives and the like are added. As described above, the present invention is different from CCL, and the metal foil and the resin eventually need to be peeled off, so that the peel strength is too high, which is disadvantageous.

因此,於本發明之附載體金屬箔之較佳之一實施形態中,為了將金屬箔與板狀載體之剝離強度調節至上述較佳之範圍,而將貼合面之 表面粗糙度以依據JIS B 0601:2001所測得之金屬箔表面之十點平均粗糙度(Rz jis)表示,較佳為設為3.5μm以下,進而較佳為設為3.0μm以下。但是,無限制地減小表面粗糙度費時費力而會導致成本上升,因此較佳為設為0.1μm以上,更佳為設為0.3μm以上。於使用電解銅箔作為金屬箔之情形時,若調整為此種表面粗糙度,則光澤面(光澤面、S面)及粗面(糙面、M面)均可使用,使用S面時容易調整至上述表面粗糙度。另一方面,上述金屬箔之未與上述載體接觸之側之表面之十點平均粗糙度(Rz jis)較佳為0.4μm以上10.0μm以下。 Therefore, in a preferred embodiment of the metal foil with a carrier of the present invention, in order to adjust the peel strength of the metal foil and the plate-shaped carrier to the above preferred range, the bonding surface is The surface roughness is expressed by a ten-point average roughness (Rz jis) of the surface of the metal foil measured in accordance with JIS B 0601:2001, and is preferably 3.5 μm or less, and more preferably 3.0 μm or less. However, since it is time-consuming and laborious to reduce the surface roughness without limitation, the cost is increased. Therefore, it is preferably 0.1 μm or more, and more preferably 0.3 μm or more. When the electrolytic copper foil is used as the metal foil, the gloss surface (gloss surface, S surface) and rough surface (gland surface, M surface) can be used when the surface roughness is adjusted, and it is easy to use the S surface. Adjust to the above surface roughness. On the other hand, the ten-point average roughness (Rz jis) of the surface of the metal foil which is not in contact with the carrier is preferably 0.4 μm or more and 10.0 μm or less.

又,於本發明之附載體金屬箔之較佳之一實施形態中,對於金屬箔之與樹脂之貼合之面,不進行粗化處理等用以提高剝離強度之表面處理。又,於本發明之附載體金屬箔之較佳之一實施形態中,於樹脂中,不添加用以提高與金屬箔之接著力之黏合劑。 Further, in a preferred embodiment of the metal foil with a carrier of the present invention, the surface of the metal foil to which the resin is bonded is not subjected to a surface treatment for improving the peel strength such as a roughening treatment. Further, in a preferred embodiment of the metal foil with a carrier of the present invention, an adhesive for increasing the adhesion to the metal foil is not added to the resin.

作為用以製造附載體金屬箔的熱壓之條件,於使用預浸體作為板狀載體之情形時,較佳為於壓力30~40k g/cm2、高於預浸體之玻璃轉移溫度的溫度之條件下進行熱壓。 As a condition for producing hot pressing of the metal foil with a carrier, in the case of using a prepreg as a plate-shaped carrier, it is preferably at a pressure of 30 to 40 kg/cm 2 , which is higher than the glass transition temperature of the prepreg. Hot pressing is carried out under temperature conditions.

就以上之觀點而言,本發明提供一種金屬箔,其為了使樹脂製之板狀載體可剝離地密接,而於成為該密接面之如上所述之金屬箔之至少一個表面塗佈有上述偶合劑。又,對於該金屬箔之表面,於塗佈偶合劑之前,亦可進行如上所述之鉻酸鹽處理等。 In view of the above, the present invention provides a metal foil which is coated with at least one surface of the metal foil as described above for the adhesive surface in order to make the resin-made plate-shaped carrier peelably adhered to each other. mixture. Further, the surface of the metal foil may be subjected to chromate treatment or the like as described above before the application of the coupling agent.

就另一觀點而言,本發明提供一種板狀載體,其於成為金屬箔之密接面的板狀載體之至少一個表面具有上述偶合劑。該板狀載體可適宜地用於使如上所述之金屬箔可剝離地密接之用途。 In another aspect, the present invention provides a plate-shaped carrier having the above-mentioned coupling agent on at least one surface of a plate-shaped carrier which becomes a close contact surface of a metal foil. The plate-shaped carrier can be suitably used for the purpose of releasably bonding the metal foil as described above.

進而,就另一觀點而言,本發明提供一種無芯式多層印刷配線板用金屬箔,其於如上所述之金屬箔之表面塗佈有上述偶合劑。又,對於該金屬箔之表面,於以偶合劑進行被覆之前,亦可進行如上所述之鉻酸 鹽處理等。 Further, in another aspect, the present invention provides a metal foil for a coreless multilayer printed wiring board, which is coated with the above-mentioned coupling agent on the surface of the metal foil as described above. Further, the surface of the metal foil may be subjected to chromic acid as described above before being coated with a coupling agent. Salt treatment, etc.

再者,利用具備XPS(X射線光電子能譜儀)、EPMA(電子微探儀)、EDX(能量色散型X射線分析)之掃描電子顯微鏡等機器對金屬箔或樹脂之表面進行測定,若檢測出Al、Ti、Zr,則可推測出金屬箔或樹脂之表面存在上述偶合劑。 Furthermore, the surface of the metal foil or resin is measured by a scanning electron microscope including an XPS (X-ray photoelectron spectrometer), an EPMA (electron micro-detector), or an EDX (energy dispersive X-ray analysis). When Al, Ti, and Zr are formed, it is estimated that the above-mentioned coupling agent exists on the surface of the metal foil or the resin.

進而,基於另一觀點,本發明提供一種上述附載體金屬箔之用途。 Further, based on another aspect, the present invention provides the use of the above-described carrier-attached metal foil.

第一,提供一種多層覆金屬積層板之製造方法,其包括:對上述附載體金屬箔之至少一個金屬箔側積層樹脂,繼而重複積層樹脂或金屬箔1次以上、例如1~10次。 First, there is provided a method for producing a multilayer metal-clad laminate comprising: laminating at least one metal foil side laminated resin of the carrier-attached metal foil, and then repeatedly laminating the resin or the metal foil once or more, for example, 1 to 10 times.

第二,提供一種多層覆金屬積層板之製造方法,其包括:於上述附載體金屬箔之金屬箔側積層樹脂,其次重複積層樹脂、單面或兩面覆金屬積層板、或本發明之附載體金屬箔、或金屬箔1次以上、例如1~10次。再者,積層於最初之附載體金屬箔上之樹脂以後之積層可僅進行所需次數,每次積層時,均可任意地選自由樹脂、單面或兩面覆金屬積層板、最初之附載體金屬箔以外之另一本發明之附載體金屬箔、及金屬箔所組成之群之中。 Secondly, there is provided a method for producing a multilayer metal-clad laminate comprising: laminating a resin on a metal foil side of the metal foil with a carrier, and secondarily repeating a laminated resin, a single-sided or double-sided metal-clad laminate, or a carrier of the present invention The metal foil or the metal foil is once or more, for example, 1 to 10 times. Further, the laminate after laminating the resin on the first carrier-attached metal foil can be carried out only for the required number of times, and each time the laminate is laminated, it can be arbitrarily selected from a resin, a single-sided or double-sided metal-clad laminate, and an initial carrier. Another group of the metal foil with a carrier of the present invention and a metal foil other than the metal foil.

於上述多層覆金屬積層板之製造方法中,可進而包括將上述附載體金屬箔之板狀載體與金屬箔剝離而分離之步驟。 In the method for producing a multilayer metal-clad laminate, the step of separating and separating the plate-shaped carrier with the carrier-attached metal foil from the metal foil may be further included.

進而,將上述板狀載體與金屬箔剝離而分離後,可進而包括藉由蝕刻金屬箔之一部分或全部而將其除去之步驟。 Further, after separating the plate-shaped carrier from the metal foil and separating it, it may further include a step of removing one or all of the metal foil by etching it.

第三,提供一種增層基板之製造方法,其包括:於上述附載體金屬箔之金屬箔側積層樹脂,繼而重複積層樹脂、單面或兩面配線基板、單面或兩面覆金屬積層板、或本發明之附載體金屬箔、或金屬箔1次以上、例如1~10次。再者,積層於最初之附載體金屬箔上之樹脂以後之積層可 僅進行所需次數,每次積層時均可任意地選自由樹脂、單面或兩面配線基板、單面或兩面覆金屬積層板、最初之附載體金屬箔以外之另一本發明之附載體金屬箔、及金屬箔所組成之群之中。 Thirdly, there is provided a method for producing a build-up substrate comprising: laminating a resin on a metal foil side of the metal foil with a carrier, and then repeating a laminated resin, a single-sided or double-sided wiring substrate, a single-sided or double-sided metal-clad laminate, or The metal foil or metal foil of the present invention is provided once or more, for example, 1 to 10 times. Furthermore, the laminate which is laminated on the resin on the initial carrier metal foil can be laminated. Only the required number of times can be arbitrarily selected from the resin, the single-sided or double-sided wiring substrate, the single-sided or double-sided metal-clad laminate, and the first carrier-attached metal foil. Among the groups of foils and metal foils.

第四,提供一種增層基板之製造方法,其包括:於上述附載體金屬箔之金屬箔側積層一層以上之增層配線層之步驟。此時,增層配線層可使用減成法或全加成法或半加成法中之至少一種方法而形成。 Fourthly, there is provided a method for producing a build-up substrate comprising the step of laminating one or more build-up wiring layers on the metal foil side of the metal foil with a carrier. At this time, the build-up wiring layer can be formed by a subtractive method or at least one of a full additive method or a semi-additive method.

所謂減成法,係指藉由蝕刻等將覆金屬積層板或配線基板(包括印刷配線板、印刷電路板)上之金屬箔之不需要之部分選擇性地除去,而形成導體圖案之方法。所謂全加成法,係指不使用金屬箔作為導體層,而藉由無電解鍍敷或/及電解鍍敷形成導體圖案之方法,半加成法係於例如由金屬箔所構成之晶種層上進行無電解金屬析出、與電解鍍敷、蝕刻、或併用其兩者而形成導體圖案後,藉由蝕刻除去不需要之晶種層,而獲得導體圖案之方法。 The subtractive method refers to a method of forming a conductor pattern by selectively removing unnecessary portions of a metal foil on a metal-clad laminate or a wiring board (including a printed wiring board or a printed circuit board) by etching or the like. The full addition method refers to a method of forming a conductor pattern by electroless plating or/and electrolytic plating without using a metal foil as a conductor layer, and the semi-additive method is a seed crystal composed of, for example, a metal foil. A method of obtaining a conductor pattern by performing electroless metal deposition, electrolytic plating, etching, or both, to form a conductor pattern on the layer, and then removing the unnecessary seed layer by etching.

於上述增層基板之製造方法中,可進而包括:對單面或兩面配線基板、單面或兩面覆金屬積層板、附載體金屬箔之金屬箔、附載體金屬箔之板狀載體、金屬箔、或樹脂開孔,並於該孔之側面及底面進行導通鍍敷之步驟。又,可進而包括:進行1次以上於構成上述單面或兩面配線基板之金屬箔、構成單面或兩面覆金屬積層板之金屬箔、及構成附載體金屬箔之金屬箔之至少一者上形成配線之步驟。 In the method for producing a build-up substrate, the method further includes: a single-sided or double-sided wiring substrate, a single-sided or double-sided metal-clad laminate, a metal foil with a carrier metal foil, a plate-shaped carrier with a carrier metal foil, and a metal foil Or the resin is opened, and the step of conducting plating is performed on the side and the bottom surface of the hole. Furthermore, the method further includes: performing one or more times on at least one of a metal foil constituting the single-sided or double-sided wiring board, a metal foil constituting a single-sided or double-sided metal-clad laminate, and a metal foil constituting the metal foil with a carrier The step of forming wiring.

於上述增層基板之製造方法中,可進而包括:於形成有配線之表面上,使金屬箔密接於單面,進而積層本發明之附載體金屬箔之載體側的步驟。又,亦可進而包括:於形成有配線之表面上積層樹脂,並於該樹脂上積層兩面密接有金屬箔的本發明之附載體金屬箔的步驟。 In the method for producing a build-up substrate, the method further includes the step of adhering the metal foil to one surface on the surface on which the wiring is formed, and further laminating the carrier side of the metal foil with a carrier of the present invention. Furthermore, the method further includes the step of laminating a resin on the surface on which the wiring is formed, and laminating the metal foil with a carrier of the present invention in which the metal foil is adhered to both surfaces of the resin.

再者,所謂「形成有配線之表面」,係指於進行增層之過程中每次出現之表面形成有配線之部分,作為增層基板,包括最終製品,亦包括半成品。 In addition, the "surface formed with wiring" means a portion where wiring is formed on each surface which is formed during the layering process, and includes a final product as a build-up substrate, and also includes a semi-finished product.

於上述增層基板之製造方法中,亦可進而包括:將上述附載體金屬箔之板狀載體與金屬箔剝離而分離之步驟。 In the method for producing a build-up substrate, the method further includes the step of separating and separating the plate-shaped carrier of the metal foil with a carrier and the metal foil.

進而,將上述板狀載體與金屬箔剝離而分離後,亦可進而包括:藉由蝕刻將金屬箔之一部分或整個面除去之步驟。 Further, after the plate-shaped carrier and the metal foil are separated and separated, the film may further include a step of removing one or the entire surface of the metal foil by etching.

再者,於上述多層覆金屬積層板之製造方法及增層基板之製造方法中,各層彼此可藉由進行熱壓接而積層。該熱壓接可於逐層積層之每次進行,亦可於積層某程度後集中進行,亦可最後一次性集中進行。 Further, in the method for producing a multilayer metal-clad laminate and the method for producing a build-up substrate, the layers may be laminated by thermocompression bonding. The thermocompression bonding can be carried out one by one layer by layer, or can be concentrated after a certain degree of lamination, or can be concentrated at one time.

尤其是,本發明提供一種增層基板之製造方法,其係上述增層基板之製造方法,其進行至少1次以上之如下步驟:對單面或兩面配線基板、單面或兩面覆銅積層板、金屬箔或樹脂開孔,並於該孔之側面及底面進行導通鍍敷,進而於構成上述單面或兩面配線基板之金屬箔及電路部分、構成單面或兩面覆銅積層板之金屬箔、金屬箔上形成電路之步驟。 In particular, the present invention provides a method for producing a build-up substrate, which is a method for producing a build-up substrate, which is performed at least once or more as follows: a single-sided or double-sided wiring substrate, a single-sided or two-sided copper-clad laminate a metal foil or a resin opening, and conducting plating on the side surface and the bottom surface of the hole, and further forming a metal foil and a circuit portion of the single-sided or double-sided wiring substrate, and a metal foil constituting a single-sided or double-sided copper-clad laminate And the step of forming a circuit on the metal foil.

以下,作為上述用途之具體例,對利用本發明之附載體金屬箔之4層CCL之製法進行說明。此處使用之附載體金屬箔係使金屬箔11a密接於板狀載體11c之單面的附載體金屬箔11。於該附載體金屬箔11上,藉由依序重疊所需片數之預浸體12、繼而稱為內層核13之2層印刷電路基板或2層覆金屬積層板、繼而預浸體12、進而附載體金屬箔11,而完成1組之4層CCL之組裝單元。其次,重複10次左右該單元14(通稱為「頁」),而構成壓製組裝物15(通稱為「冊」)(圖3)。其後,利用積層模具10夾持該冊15並設置於熱壓機中,以特定之溫度及壓力進行加壓成型,而可同時製造大量之4層CCL。作為積層模具10,例如可使用不鏽鋼製板。板並無限制,例如可使用1~10mm左右之厚板。對於4層以上之CCL,一般而言亦可藉由增加內層核之層數,而藉由相同之步驟進行生產。 Hereinafter, as a specific example of the above-described use, a method of producing a four-layer CCL using the metal foil with a carrier of the present invention will be described. The carrier-attached metal foil used here is such that the metal foil 11a is in close contact with the carrier-attached metal foil 11 on one side of the plate-shaped carrier 11c. On the carrier-attached metal foil 11, a prepreg 12 of a desired number of sheets, a two-layer printed circuit board, which is referred to as an inner core 13 or a two-layer metal-clad laminate, followed by a prepreg 12, are sequentially stacked. Further, the carrier metal foil 11 is attached, and a unit of four layers of CCL is completed. Next, the unit 14 (generally referred to as "page") is repeated about 10 times to form a press assembly 15 (generally referred to as "book") (Fig. 3). Thereafter, the booklet 15 is held by the build-up mold 10 and placed in a hot press, and pressure-molded at a specific temperature and pressure to simultaneously produce a large number of four layers of CCL. As the laminated mold 10, for example, a stainless steel plate can be used. The plate is not limited, for example, a thick plate of about 1 to 10 mm can be used. For CCL of 4 or more layers, it is generally possible to produce by the same steps by increasing the number of layers of the inner core.

以下,作為上述用途之具體例,例示性地對利用本發明之於樹脂板之板狀載體11c之兩面密接有金屬箔的附載體金屬箔11的無芯式增 層基板之製法進行說明。於該方法中,於附載體金屬箔11之兩側積層所需數量之增層16後,自附載體金屬箔11將兩面之金屬箔剝離(參照圖4)。 In the following, as a specific example of the above-described use, the coreless addition of the carrier-attached metal foil 11 in which the metal foil is adhered to both surfaces of the plate-shaped carrier 11c of the resin sheet of the present invention is exemplarily exemplified. The method of manufacturing the layer substrate will be described. In this method, after a desired number of build-up layers 16 are laminated on both sides of the carrier-attached metal foil 11, the metal foils 11 are peeled off from the metal foils on both sides (see Fig. 4).

例如可藉由於本發明之附載體金屬箔之金屬箔側,依序重疊作為絕緣層之樹脂、2層電路基板、作為絕緣層之樹脂,並於其上以金屬箔側與樹脂板接觸之方式進而依序重疊本發明之附載體金屬箔之金屬箔,而製造增層基板。 For example, by the metal foil side of the metal foil with a carrier of the present invention, a resin as an insulating layer, a two-layer circuit substrate, a resin as an insulating layer, and a metal foil side in contact with the resin sheet are sequentially laminated thereon. Further, the metal foil of the metal foil with a carrier of the present invention is sequentially laminated to produce a build-up substrate.

又,作為另一方法,對在樹脂製之板狀載體11c之兩面或單面密接有金屬箔的附載體金屬箔之至少一個金屬箔側,依序積層作為絕緣層之樹脂、作為導體層之金屬箔。其次,亦可包括視需要對金屬箔之整個面進行半蝕刻而調整厚度之步驟。其次,針對所積層之金屬箔之特定位置實施雷射加工而形成貫通金屬箔與樹脂之導孔,於實施除去導孔之中之膠渣之除膠渣處理後,對導孔底部、側面及金屬箔之整個面或一部分實施無電解鍍敷而形成層間連接,視需要進而進行電解鍍敷。對於金屬箔上之不需要無電解鍍敷或電解鍍敷之部分,亦可在進行各自之鍍敷之前預先形成鍍敷阻劑。又,於無電解鍍敷、電解鍍敷、鍍敷阻劑與金屬箔之密接性不充分之情形時,亦可預先對金屬箔之表面進行化學粗化。於使用鍍敷阻劑之情形時,於鍍敷後除去鍍敷阻劑。其次,藉由蝕刻將金屬箔及、不需要無電解鍍敷部、電解鍍敷部之部分除去,而形成電路。藉此,可獲得增層基板。亦可重複進行複數次自積層樹脂、金屬箔至形成電路為止之步驟,進而製作多層之增層基板。 Further, as another method, a resin as an insulating layer and a conductor layer are sequentially laminated on at least one metal foil side of a carrier-attached metal foil in which both sides of the resin-made plate-shaped carrier 11c or a single surface are in contact with a metal foil. Metal foil. Secondly, the step of adjusting the thickness by half etching the entire surface of the metal foil as needed may be included. Next, laser processing is performed on a specific position of the metal foil of the laminated layer to form a via hole penetrating the metal foil and the resin, and after performing the desmear treatment of removing the glue in the via hole, the bottom and side surfaces of the via hole and The entire surface or part of the metal foil is subjected to electroless plating to form an interlayer connection, and further electrolytic plating is performed as needed. For the portion of the metal foil that does not require electroless plating or electrolytic plating, a plating resist may be formed in advance before the respective plating is performed. Further, when electroless plating, electrolytic plating, or adhesion between the plating resist and the metal foil is insufficient, the surface of the metal foil may be chemically roughened in advance. In the case of using a plating resist, the plating resist is removed after plating. Next, a metal foil and a portion which does not require an electroless plating portion and an electrolytic plating portion are removed by etching to form a circuit. Thereby, a build-up substrate can be obtained. The steps of self-assembling the resin and the metal foil to form an electric circuit may be repeated, and a multilayer build-up substrate may be produced.

進而,於該增層基板之最表面,亦可接觸本發明之單面密接有金屬箔的附載體金屬箔之金屬箔之樹脂側並積層,一旦積層樹脂板後,亦可接觸本發明之兩面密接有金屬箔的附載體金屬箔之一個金屬箔並積層。 Further, on the outermost surface of the build-up substrate, the resin side of the metal foil with the metal foil adhered to the metal foil on one side of the present invention may be contacted and laminated. Once the resin sheet is laminated, the two sides of the present invention may be contacted. A metal foil of a metal foil with a carrier foil is adhered to the metal foil and laminated.

此處,作為製作增層基板所使用之樹脂板,可適宜地使用含有熱硬化性樹脂之預浸體。 Here, as the resin sheet used for producing the build-up substrate, a prepreg containing a thermosetting resin can be suitably used.

又,作為另一方法,於本發明之板狀載體之單面或兩面貼合金屬箔、例如銅箔而獲得之積層體之金屬箔之露出表面,積層作為絕緣層之樹脂、例如預浸體或感光性樹脂。其後,於樹脂之特定位置形成導孔。例如於使用預浸體作為樹脂之情形時,導孔可藉由雷射加工而進行。雷射加工後,可實施除去該導孔中之膠渣之除膠渣處理。又,於使用感光性樹脂作為樹脂之情形時,可藉由光微影法將導孔形成部之樹脂除去。其次,對導孔底部、側面及樹脂之整個面或一部分實施無電解鍍敷而形成層間連接,並視需要進而進行電解鍍敷。對於樹脂上之不需要無電解鍍敷或電解鍍敷之部分,亦可於進行各自之鍍敷之前預先形成鍍敷阻劑。又,於無電解鍍敷、電解鍍敷、鍍敷阻劑與樹脂之密接性不充分之情形時,亦可預先對樹脂之表面進行化學粗化。於使用鍍敷阻劑之情形時,於鍍敷後除去鍍敷阻劑。其次,藉由蝕刻將不需要無電解鍍敷部或電解鍍敷部之部分除去,而形成電路。藉此,可獲得增層基板。亦可重複進行複數次自積層樹脂至形成電路為止之步驟,進而製作多層之增層基板。 Further, as another method, the exposed surface of the metal foil of the laminate obtained by laminating a metal foil such as a copper foil on one side or both sides of the plate-shaped carrier of the present invention, a resin as an insulating layer, for example, a prepreg Or a photosensitive resin. Thereafter, a via hole is formed at a specific position of the resin. For example, when a prepreg is used as the resin, the via holes can be processed by laser processing. After the laser processing, the desmear treatment for removing the dross in the via hole can be performed. Further, when a photosensitive resin is used as the resin, the resin of the via hole forming portion can be removed by photolithography. Next, electroless plating is applied to the bottom surface of the via hole, the side surface, and the entire surface or part of the resin to form an interlayer connection, and further electrolytic plating is performed as needed. For the portion of the resin that does not require electroless plating or electrolytic plating, a plating resist may be formed in advance before the respective plating is performed. Further, when electroless plating, electrolytic plating, or adhesion between the plating resist and the resin is insufficient, the surface of the resin may be chemically roughened in advance. In the case of using a plating resist, the plating resist is removed after plating. Next, an electroless plating portion or a portion of the electrolytic plating portion is removed by etching to form an electric circuit. Thereby, a build-up substrate can be obtained. It is also possible to repeat the steps of multi-layering the resin until the circuit is formed, thereby producing a multilayer build-up substrate.

進而,於該增層基板之最表面,亦可接觸本發明之單面密接有金屬箔的積層體之樹脂側、或單面密接有金屬箔的附載體金屬箔之樹脂側並進行積層,一旦積層樹脂後,亦可接觸本發明之兩面密接有金屬箔的積層體之一個金屬箔、或兩面密接有金屬箔的附載體金屬箔之一個金屬箔並積層。 Further, on the outermost surface of the build-up substrate, the resin side of the laminated body in which the metal foil is adhered to one side of the present invention or the resin side of the metal foil with the metal foil adhered to the single surface may be contacted and laminated. After laminating the resin, one metal foil of the laminated body in which the metal foil is adhered to both sides of the present invention or one metal foil of the carrier-attached metal foil which is adhered to the metal foil on both sides may be contacted and laminated.

針對如此製作之無芯式增層基板,經過鍍敷步驟及/或蝕刻步驟而於表面形成配線,進而於載體樹脂與金屬箔之間,藉由使其等剝離分離而完成增層配線板。於剝離分離後,針對金屬箔之剝離面,可形成配線,亦可藉由蝕刻金屬箔整個面將其除去,而製作增層配線板。進而,藉由於增層配線板上搭載電子零件類,而完成印刷電路板。又,即便於剝離樹脂前之無芯式增層基板上直接搭載電子零件,亦可獲得印刷電路板。 With respect to the coreless build-up substrate thus produced, wiring is formed on the surface through a plating step and/or an etching step, and the build-up wiring board is completed by peeling and separating the carrier resin and the metal foil. After the separation and separation, a wiring can be formed on the peeled surface of the metal foil, and the entire surface of the metal foil can be removed by etching the entire surface of the metal foil to form a build-up wiring board. Further, the printed circuit board is completed by mounting electronic components on the build-up wiring board. Further, a printed circuit board can be obtained even if an electronic component is directly mounted on the coreless build-up substrate before the resin is peeled off.

[實施例] [Examples]

以下,揭示實驗例作為本發明之實施例及比較例,但該等實施例係為了更好地理解本發明及其優點而提供者,並非意在限制本發明。 In the following, the experimental examples are disclosed as examples and comparative examples of the present invention, but they are provided to better understand the present invention and its advantages, and are not intended to limit the present invention.

(附載體金屬箔) (with carrier metal foil)

<實驗例1~10> <Experimental Examples 1 to 10>

準備複數片電解銅箔(厚度為12μm,粗面表面粗糙度Rz jis為3.7μm),針對各電解銅箔之光澤(shiny)面,實施下述條件下之鎳-鋅(Ni-Zn)合金鍍敷處理及鉻酸鹽(Cr-Zn鉻酸鹽)處理,而將貼合面(此處為S面)之十點平均粗糙度(Rz jis:依據JIS B 0601:2001進行測定)設為1.5μm後,將作為樹脂之南亞塑膠公司製造之預浸體(FR-4樹脂:玻璃轉移溫度Tg=140℃;厚度為200μm)貼合於該電解銅箔之S面,並於170℃下實施100分鐘熱壓加工,而製作附載體銅箔。 A plurality of electrolytic copper foils (having a thickness of 12 μm and a rough surface roughness Rz jis of 3.7 μm) were prepared, and a nickel-zinc (Ni-Zn) alloy under the following conditions was applied to the shiny surface of each of the electrolytic copper foils. The plating treatment and the chromate (Cr-Zn chromate) treatment, and the ten-point average roughness (Rz jis: measured according to JIS B 0601: 2001) of the bonding surface (here, the S surface) is set to After 1.5 μm, a prepreg (FR-4 resin: glass transition temperature Tg=140° C.; thickness: 200 μm) manufactured by Nanya Plastics Co., Ltd. as a resin was attached to the S surface of the electrolytic copper foil at 170 ° C. A hot-pressing process was performed for 100 minutes to prepare a copper foil with a carrier.

(鎳-鋅合金鍍敷) (nickel-zinc alloy plating)

Ni濃度 17g/L(以NiSO4之形式添加) Ni concentration 17g / L (added in the form of NiSO 4 )

Zn濃度 4g/L(以ZnSO4之形式添加) Zn concentration 4g / L (added as ZnSO 4 )

pH值 3.1 pH 3.1

液溫 40℃ Liquid temperature 40 ° C

電流密度 0.1~10A/dm2 Current density 0.1~10A/dm 2

鍍敷時間 0.1~10秒鐘 Plating time 0.1~10 seconds

(鉻酸鹽處理) (chromate treatment)

Cr濃度 1.4g/L(以CrO3或K2CrO7之形式添加) Cr concentration 1.4g / L (added as CrO 3 or K 2 CrO 7 )

Zn濃度 0.01~1.0g/L(以ZnSO4之形式添加) Zn concentration 0.01~1.0g/L (added as ZnSO 4 )

Na2SO4濃度 10g/L Na 2 SO 4 concentration 10g / L

pH值 4.8 pH 4.8

液溫 55℃ Liquid temperature 55 ° C

電流密度 0.1~10A/dm2 Current density 0.1~10A/dm 2

鍍敷時間 0.1~10秒鐘 Plating time 0.1~10 seconds

再者,於實驗例1~10中,於該光澤面或上述板狀載體(預浸體)上塗佈表1所示之構成之樹脂塗膜,並燒附後,進行預浸體與銅箔之貼合。 Further, in Experimental Examples 1 to 10, a resin coating film having the composition shown in Table 1 was applied onto the shiny surface or the plate-shaped carrier (prepreg), and after baking, prepreg and copper were applied. Foil fit.

樹脂塗膜之塗佈係於使用凹版塗佈法進行塗佈後,使用刮刀將樹脂塗膜之厚度調節為2~4μm。再者,使用雙酚A型環氧樹脂作為表1所示之環氧系樹脂,使用甲醚化三聚氰胺樹脂作為三聚氰胺系樹脂,使用聚四氟乙烯作為氟樹脂,使用二甲基聚矽氧烷作為二甲基聚矽氧樹脂。 The coating of the resin coating film was carried out by coating using a gravure coating method, and the thickness of the resin coating film was adjusted to 2 to 4 μm using a doctor blade. Further, a bisphenol A type epoxy resin was used as the epoxy resin shown in Table 1, a methyl etherified melamine resin was used as the melamine resin, and polytetrafluoroethylene was used as the fluororesin, and dimethyl polyoxyalkylene was used. As a dimethyl polyfluorene resin.

又,所塗佈之樹脂塗膜係於150℃下加熱30秒鐘而進行燒附處理。 Further, the applied resin coating film was heated at 150 ° C for 30 seconds to carry out a baking treatment.

又,假定針對附載體銅箔中之若干,使該附載體銅箔進行電路形成等進一步加熱處理時經歷熱歷程,並進行表1中記載之條件(此處為於220℃下3小時、6小時、9小時)之熱處理。 Further, it is assumed that the copper foil with which the carrier is subjected to further heat treatment such as circuit formation or the like is subjected to a heat history, and the conditions described in Table 1 are carried out (here, at 220 ° C for 3 hours, 6). Heat treatment at hours, 9 hours).

對於藉由熱壓所獲得之附載體銅箔、及其後分別進行3小時、6小時、9小時之熱處理後之附載體銅箔的銅箔與板狀載體(加熱後之樹脂)之剝離強度進行測定。將各結果示於表1。 Peel strength of copper foil with carrier copper foil and copper plated carrier (heated resin) after heat treatment for 3 hours, 6 hours, and 9 hours, respectively, obtained by hot pressing The measurement was carried out. The results are shown in Table 1.

又,為了對剝離作業性進行評估,而分別對藉由每單位個數之手工作業時間(時間/個)進行評估。將結果示於表2。 Further, in order to evaluate the peeling workability, the manual work time (time/number) per unit number is evaluated. The results are shown in Table 2.

<實驗例11> <Experimental Example 11>

於實驗例1中,使銅箔與預浸體貼合時,除了對該銅箔之光澤面、預浸體均不進行樹脂塗膜處理以外,以與實驗例1相同之條件,製作附載體銅箔,並對各段階之剝離強度、與作業時間進行評估。將各結果示於表1及表2。 In the experimental example 1, when the copper foil and the prepreg were bonded together, the carrier copper was produced under the same conditions as in Experimental Example 1 except that the shiny surface of the copper foil and the prepreg were not subjected to the resin coating treatment. Foil, and the peel strength and working time of each step were evaluated. The results are shown in Tables 1 and 2.

根據表得知,對於樹脂塗膜,即便對銅箔之表面進行處理,或對板狀載體(預浸體)之表面進行處理,於其後之積層體之剝離強度、加熱後之剝離強度、剝離作業性方面亦獲得同等之結果。 According to the table, even if the surface of the copper foil is treated, or the surface of the plate-shaped carrier (prepreg) is treated on the resin coating film, the peeling strength of the laminated body after that, the peeling strength after heating, The same results were obtained in terms of peeling workability.

(增層配線板) (Additional wiring board)

於如此製作之附載體銅箔之兩側,依序重疊FR-4預浸體(南亞塑膠公司製造)、銅箔(JX日礦日石金屬(股份)製造、JTC 12μm(製品名)),並以3MPa之壓力於各表所示之加熱條件下進行熱壓,而製作4層覆銅積層板。 FR-4 prepreg (made by Nanya Plastics Co., Ltd.) and copper foil (JX Nippon Mining & Metal Co., Ltd., JTC 12μm (product name)) are sequentially superposed on both sides of the carrier-attached copper foil thus produced. Further, hot pressing was carried out under the heating conditions shown in the respective tables under a pressure of 3 MPa to prepare a four-layer copper clad laminate.

其次,使用雷射加工機,開出貫通上述4層覆銅積層板表面之銅箔與其下之絕緣層(經硬化之預浸體)的直徑100μm之孔。繼而,對上述孔之底部所露出之附載體銅箔上之銅箔表面、以及上述孔之側面、上述4層覆銅積層板表面之銅箔上藉由無電解鍍銅、電鍍銅而進行鍍銅,而於附載體銅箔上之銅箔、與4層覆銅積層板表面之銅箔之間形成電性連接。其次,使用氯化鐵系之蝕刻液將4層覆銅積層板表面之銅箔之一部分蝕刻,而形成電路。如此,獲得4層增層基板。 Next, using a laser processing machine, a copper foil having a diameter of 100 μm penetrating through the copper foil on the surface of the above-mentioned four-layer copper clad laminate and the insulating layer (hardened prepreg) thereunder was opened. Then, the surface of the copper foil on the copper foil of the carrier exposed on the bottom of the hole, and the side surface of the hole and the copper foil on the surface of the four-layer copper-clad laminate are plated by electroless copper plating or copper plating. Copper is electrically connected between the copper foil on the copper foil with the carrier and the copper foil on the surface of the four-layer copper clad laminate. Next, one of the copper foils on the surface of the four-layer copper clad laminate was partially etched using an iron chloride-based etching solution to form an electric circuit. In this way, four layers of build-up substrates were obtained.

繼而,於上述4層增層基板中,藉由將上述附載體銅箔之板狀載體與銅箔剝離而分離,而獲得2組之2層增層配線板。 Then, in the above-mentioned four-layer build-up substrate, the plate-shaped carrier with the carrier copper foil was peeled off from the copper foil to separate, and two sets of two build-up wiring boards were obtained.

繼而,蝕刻上述2組之2層增層配線板上之未與板狀載體密接者之銅箔而形成配線,從而獲得2組之2層增層配線板。 Then, the copper foil of the two sets of the two-layer build-up wiring boards which are not in contact with the plate-shaped carrier is etched to form wiring, thereby obtaining two sets of two-layer build-up wiring boards.

各實驗例中均製作複數片4層增層基板,針對各增層基板,藉由目視確認增層基板製作步驟中之構成附載體銅箔之預浸體與銅箔之密接情況,結果關於使用有以表1、表3中剝離強度及加熱後之剝離強度被評估為「G」之條件製作之附載體銅箔的增層配線板,於增層時附載體銅箔之樹脂(板狀載體)未被破壞而成功剝離。 In each of the experimental examples, a plurality of four-layer build-up substrates were produced, and the adhesion between the prepreg and the copper foil constituting the copper foil with the carrier in the step of producing the build-up substrate was visually confirmed for each of the build-up substrates. A build-up wiring board with a carrier copper foil prepared under the conditions of the peel strength of Tables 1 and 3 and the peel strength after heating is evaluated as "G", and the resin of the carrier copper foil (plate-shaped carrier) is added at the time of layer formation. ) successfully stripped without being destroyed.

又,關於被評估為「N」之條件,於增層時,於進行附載體銅箔之銅箔之剝離操作時,樹脂被破壞,或未被剝離而於銅箔表面殘留有樹脂。 Further, regarding the condition evaluated as "N", at the time of layering, the resin was broken during the peeling operation of the copper foil with the carrier copper foil, or the resin remained on the surface of the copper foil without being peeled off.

又,關於評估為「-」之條件,於增層時,於進行附載體銅箔中之銅箔之剝離操作時,雖然樹脂未被破壞而剝離,但其中有未進行剝離操作便發 生銅箔剝離之情形。 Further, in the case of the evaluation of the condition of "-", in the peeling operation of the copper foil in the copper foil with a carrier, the resin is peeled off without being broken, but the peeling operation is not performed. The case where the raw copper foil is peeled off.

Claims (52)

一種附載體金屬箔,其係由樹脂製之板狀載體、與可剝離地密接於該載體之至少一面之金屬箔所構成者,且係使用由聚矽氧與選自環氧系樹脂、三聚氰胺系樹脂及氟樹脂中之任一種或複數種樹脂所構成之樹脂塗膜將板狀載體與金屬箔貼合而成。 A carrier-attached metal foil comprising a plate-shaped carrier made of resin and a metal foil which is peelably adhered to at least one side of the carrier, and is made of polyfluorene oxide and selected from the group consisting of epoxy resin and melamine. A resin coating film comprising any one of a resin and a fluororesin or a plurality of resins is obtained by laminating a plate-shaped carrier and a metal foil. 如申請專利範圍第1項之附載體金屬箔,其中於上述樹脂塗膜中,相對於聚矽氧100質量份,以合計為10~1500質量份之量含有環氧系樹脂、三聚氰胺系樹脂。 The carrier-coated metal foil according to the first aspect of the invention, wherein the resin coating film contains an epoxy resin or a melamine resin in an amount of 10 to 1500 parts by mass based on 100 parts by mass of the polyoxymethylene. 如申請專利範圍第1或2項之附載體金屬箔,其中於上述樹脂塗膜中,相對於聚矽氧100質量份,以0~50質量份之量含有氟樹脂。 The carrier-attached metal foil according to claim 1 or 2, wherein the resin coating film contains a fluororesin in an amount of from 0 to 50 parts by mass based on 100 parts by mass of the polyfluorene oxide. 如申請專利範圍第1至3項中任一項之附載體金屬箔,其中上述樹脂塗膜之厚度為0.1~10μm。 The carrier-attached metal foil according to any one of claims 1 to 3, wherein the resin coating film has a thickness of 0.1 to 10 μm. 如申請專利範圍第1至4項中任一項之附載體金屬箔,其中板狀載體與金屬箔之剝離強度為10gf/cm以上200gf/cm以下。 The carrier-attached metal foil according to any one of claims 1 to 4, wherein the peeling strength of the plate-shaped carrier and the metal foil is 10 gf/cm or more and 200 gf/cm or less. 如申請專利範圍第1至5項中任一項之附載體金屬箔,其中樹脂製之板狀載體包含熱硬化性樹脂。 The carrier-attached metal foil according to any one of claims 1 to 5, wherein the resin-made plate-shaped carrier comprises a thermosetting resin. 如申請專利範圍第1至6項中任一項之附載體金屬箔,其中樹脂製之板狀載體為預浸體。 The carrier-attached metal foil according to any one of claims 1 to 6, wherein the resin-made plate-shaped carrier is a prepreg. 如申請專利範圍第6或7項之附載體金屬箔,其中上述樹脂製之板狀載體具有120~320℃之玻璃轉移溫度Tg。 The carrier-attached metal foil according to claim 6 or 7, wherein the above-mentioned resin-made plate-shaped carrier has a glass transition temperature Tg of 120 to 320 °C. 如申請專利範圍第1至8項中任一項之附載體金屬箔,其中上述金屬箔之與上述載體接觸之側之表面之十點平均粗糙度(Rz jis)為3.5μm以下。 The carrier-attached metal foil according to any one of claims 1 to 8, wherein the surface of the metal foil on the side in contact with the carrier has a ten-point average roughness (Rz jis) of 3.5 μm or less. 如申請專利範圍第1至9項中任一項之附載體金屬箔,其中上述金屬箔之未與上述載體接觸之側之表面之十點平均粗糙度(Rz jis)為0.4μm 以上10.0μm以下。 The carrier-attached metal foil according to any one of claims 1 to 9, wherein a surface of the metal foil which is not in contact with the carrier has a ten-point average roughness (Rz jis) of 0.4 μm. Above 10.0 μm. 如申請專利範圍第1至9項中任一項之附載體金屬箔,其中上述金屬箔之厚度為1μm以上400μm以下。 The carrier-attached metal foil according to any one of claims 1 to 9, wherein the metal foil has a thickness of from 1 μm to 400 μm. 如申請專利範圍第1至10項中任一項之附載體金屬箔,其中於220℃下進行3小時、6小時或9小時中之至少一種加熱後之金屬箔與板狀載體之剝離強度為10gf/cm以上200gf/cm以下。 The metal foil with a carrier according to any one of claims 1 to 10, wherein the peeling strength of the metal foil and the plate-shaped carrier after heating at 220 ° C for at least one of 3 hours, 6 hours or 9 hours is 10 gf / cm or more and 200 gf / cm or less. 如申請專利範圍第1至12項中任一項之附載體金屬箔,其中上述金屬箔為銅箔。 The carrier-attached metal foil according to any one of claims 1 to 12, wherein the metal foil is a copper foil. 一種印刷配線板用金屬箔,其於金屬箔之表面具有由聚矽氧與選自環氧系樹脂、三聚氰胺系樹脂及氟樹脂中之任一種或複數種樹脂所構成之樹脂塗膜。 A metal foil for a printed wiring board having a resin coating film made of polyfluorene oxide and any one or a plurality of resins selected from the group consisting of an epoxy resin, a melamine resin, and a fluororesin on the surface of the metal foil. 如申請專利範圍第14項之印刷配線板用金屬箔,其中於上述樹脂塗膜中,相對於聚矽氧100質量份,以合計為10~1500質量份之量含有環氧系樹脂、三聚氰胺系樹脂。 The metal foil for a printed wiring board according to the invention of claim 14, wherein the resin coating film contains an epoxy resin or a melamine in an amount of 10 to 1500 parts by mass based on 100 parts by mass of the polyfluorene oxide. Resin. 如申請專利範圍第14或15項之印刷配線板用金屬箔,其中於上述樹脂塗膜中,相對於聚矽氧100質量份,以0~50質量份之量含有氟樹脂。 The metal foil for a printed wiring board according to claim 14 or 15, wherein the resin coating film contains a fluororesin in an amount of from 0 to 50 parts by mass based on 100 parts by mass of the polyfluorene oxide. 如申請專利範圍第14至16項中任一項之印刷配線板用金屬箔,其中上述樹脂塗膜之厚度為0.1~10μm。 The metal foil for a printed wiring board according to any one of claims 14 to 16, wherein the resin coating film has a thickness of 0.1 to 10 μm. 如申請專利範圍第14至17項中任一項之印刷配線板用金屬箔,其中對於使由上述聚矽氧與選自環氧系樹脂、三聚氰胺系樹脂及氟樹脂中之任一種或複數種樹脂所構成之樹脂塗膜發揮作用之側之表面,於使該樹脂塗膜發揮作用之前,進行鉻酸鹽處理。 The metal foil for a printed wiring board according to any one of claims 14 to 17, wherein any one or more of the above-mentioned polyfluorene oxide and an epoxy resin, a melamine resin, and a fluororesin are used. The surface on the side on which the resin coating film made of the resin acts is subjected to chromate treatment before the resin coating film acts. 如申請專利範圍第14至18項中任一項之印刷配線板用金屬箔,其中上述金屬箔之與上述樹脂塗膜接觸之側之表面之十點平均粗糙度(Rz jis)為3.5μm以下。 The metal foil for a printed wiring board according to any one of the present invention, wherein the surface of the metal foil on the side in contact with the resin coating film has a ten-point average roughness (Rz jis) of 3.5 μm or less. . 如申請專利範圍第14至19項中任一項之印刷配線板用金屬箔,其中上述金屬箔之未與上述樹脂塗膜接觸之側之表面之十點平均粗糙度(Rz jis)為0.4μm以上10.0μm以下。 The metal foil for a printed wiring board according to any one of the present invention, wherein the surface of the metal foil which is not in contact with the resin coating film has a ten-point average roughness (Rz jis) of 0.4 μm. Above 10.0 μm. 一種金屬箔,其係於至少一個表面具有由聚矽氧與選自環氧系樹脂、三聚氰胺系樹脂及氟樹脂中之任一種或複數種樹脂所構成之樹脂塗膜者,並利用該表面而用於可剝離地密接樹脂製之板狀載體之用途。 A metal foil having a resin coating film comprising at least one surface and comprising any one or a plurality of resins selected from the group consisting of epoxy resins, melamine resins, and fluororesins on at least one surface, and using the surface It is used for the peelable adhesion of a resin-made plate-shaped carrier. 如申請專利範圍第21項之金屬箔,其中於上述樹脂塗膜中,相對於聚矽氧100質量份,以合計為10~1500質量份之量含有環氧系樹脂、三聚氰胺系樹脂。 The metal foil according to claim 21, wherein the resin coating film contains an epoxy resin or a melamine resin in an amount of 10 to 1500 parts by mass based on 100 parts by mass of the polyoxymethylene. 如申請專利範圍第20或21項之金屬箔,其中於上述樹脂塗膜中,相對於聚矽氧100質量份,以0~50質量份之量含有氟樹脂。 The metal foil according to claim 20, wherein the resin coating film contains a fluororesin in an amount of from 0 to 50 parts by mass based on 100 parts by mass of the polyfluorene oxide. 如申請專利範圍第21至23項中任一項之金屬箔,其中上述樹脂塗膜之厚度為0.1~10μm。 The metal foil according to any one of claims 21 to 23, wherein the resin coating film has a thickness of 0.1 to 10 μm. 如申請專利範圍第21至24項中任一項之金屬箔,其中對於使由上述聚矽氧與選自環氧系樹脂、三聚氰胺系樹脂及氟樹脂中之任一種或複數種樹脂所構成之樹脂塗膜發揮作用之側之表面,於使該樹脂塗膜發揮作用之前,進行鉻酸鹽處理。 The metal foil according to any one of claims 21 to 24, wherein the polyfluorene oxide and any one or more resins selected from the group consisting of epoxy resins, melamine resins, and fluororesins are used. The surface on the side where the resin coating film functions is subjected to chromate treatment before the resin coating film acts. 如申請專利範圍第21至25項中任一項之金屬箔,其中上述金屬箔之與上述樹脂塗膜接觸之側之表面之十點平均粗糙度(Rz jis)為3.5μm以下。 The metal foil according to any one of claims 21 to 25, wherein a surface of the metal foil on the side in contact with the resin coating film has a ten-point average roughness (Rz jis) of 3.5 μm or less. 一種樹脂製之板狀載體,其於至少一個表面具有由聚矽氧與選自環氧系樹脂、三聚氰胺系樹脂及氟樹脂中之任一種或複數種樹脂所構成之樹脂塗膜。 A resin-made plate-shaped carrier having a resin coating film composed of polyoxymethylene and any one or a plurality of resins selected from the group consisting of an epoxy resin, a melamine resin, and a fluororesin on at least one surface. 如申請專利範圍第27項之板狀載體,其中於上述樹脂塗膜中,相對於聚矽氧100質量份,以合計為10~1500質量份之量含有環氧系樹脂、三 聚氰胺系樹脂。 The plate-shaped carrier according to the 27th aspect of the invention, wherein the resin coating film contains an epoxy resin in an amount of 10 to 1500 parts by mass based on 100 parts by mass of the polyfluorene oxide. A melamine resin. 如申請專利範圍第27或28項之板狀載體,其中於上述樹脂塗膜中,相對於聚矽氧100質量份,以0~50質量份之量含有氟樹脂。 The plate-shaped carrier according to the invention of claim 27, wherein the resin coating film contains a fluororesin in an amount of from 0 to 50 parts by mass based on 100 parts by mass of the polyfluorene oxide. 如申請專利範圍第27至29項中任一項之板狀載體,其中上述樹脂塗膜之厚度為0.1~10μm。 The plate-shaped carrier according to any one of claims 27 to 29, wherein the resin coating film has a thickness of 0.1 to 10 μm. 一種板狀載體,其係於至少一個表面具有由聚矽氧、與選自環氧系樹脂、三聚氰胺系樹脂及氟樹脂中之任一種或複數種樹脂所構成之樹脂塗膜的樹脂製之板狀載體,並利用該表面而用於可剝離地密接金屬箔之用途。 A plate-shaped carrier which is a resin plate having a resin coating film composed of polyoxymethylene and any one or a plurality of resins selected from the group consisting of epoxy resins, melamine resins, and fluororesins on at least one surface thereof The carrier is used for the purpose of releasably adhering the metal foil. 如申請專利範圍第31項之板狀載體,其中於上述樹脂塗膜中,相對於聚矽氧100質量份,以合計為10~1500質量份之量含有環氧系樹脂、三聚氰胺系樹脂。 In the above-mentioned resin coating film, the resin coating film contains an epoxy resin or a melamine resin in an amount of 10 to 1500 parts by mass based on 100 parts by mass of the polyoxymethylene. 如申請專利範圍第31或32項之板狀載體,其中於上述樹脂塗膜中,相對於聚矽氧100質量份,以0~50質量份之量含有氟樹脂。 The plate-shaped carrier according to claim 31, wherein the resin coating film contains a fluororesin in an amount of from 0 to 50 parts by mass based on 100 parts by mass of the polyfluorene oxide. 如申請專利範圍第31至33項中任一項之板狀載體,其中上述樹脂塗膜之厚度為0.1~10μm。 The plate-shaped carrier according to any one of claims 31 to 33, wherein the resin coating film has a thickness of 0.1 to 10 μm. 一種多層覆金屬積層板之製造方法,其包括:對申請專利範圍第1至13項中任一項之附載體金屬箔之至少一個金屬箔側積層樹脂,繼而重複積層樹脂或金屬箔1次以上。 A method for producing a multi-layer metal-clad laminate comprising: at least one metal foil side-layer resin of a carrier-attached metal foil according to any one of claims 1 to 13, and then repeating laminating resin or metal foil for one or more times . 一種多層覆金屬積層板之製造方法,其包括:於申請專利範圍第1至13項中任一項之附載體金屬箔之金屬箔側積層樹脂,繼而重複積層樹脂、單面或兩面覆金屬積層板、或申請專利範圍第1至13項中任一項之附載體金屬箔、或金屬箔1次以上。 A method for manufacturing a multi-layer metal-clad laminate comprising: a metal foil side-layer resin with a carrier metal foil according to any one of claims 1 to 13, and then repeating a laminated resin, a single-sided or two-sided metal-clad laminate A plate, or a metal foil with a carrier or a metal foil of any one of the above claims 1 to 13 or more. 如申請專利範圍第35或36項之多層覆金屬積層板之製造方法,其進而包括:將上述附載體金屬箔之板狀載體與金屬箔剝離而分離之步驟。 The method for producing a multi-layer metal-clad laminate according to claim 35 or 36, further comprising the step of separating and separating the plate-shaped carrier of the carrier-attached metal foil from the metal foil. 如申請專利範圍第37項之製造方法,其包括:藉由對進行剝離而分 離之金屬箔之一部分或全部進行蝕刻而將其除去之步驟。 The manufacturing method of claim 37, which comprises: by peeling off The step of removing one or all of the metal foil from it to remove it. 一種多層覆金屬積層板,其係藉由申請專利範圍第35至38項中任一項之製造方法而獲得。 A multi-layer metallized laminate obtained by the manufacturing method of any one of claims 35 to 38. 一種增層基板之製造方法,其包括:於申請專利範圍第1至13項中任一項之積層體之金屬箔側形成一層以上之增層配線層之步驟。 A method for producing a build-up substrate, comprising the step of forming one or more build-up wiring layers on the metal foil side of the laminate of any one of claims 1 to 13. 如申請專利範圍第40項之增層基板之製造方法,其中增層配線層係使用減成法或全加成法或半加成法之至少一種方法而形成。 The method for producing a build-up substrate according to claim 40, wherein the build-up wiring layer is formed by at least one of a subtractive method or a full additive method or a semi-additive method. 一種增層基板之製造方法,其包括:於申請專利範圍第1至13項中任一項之附載體金屬箔之至少一個金屬箔側積層樹脂,繼而重複積層樹脂、單面或兩面配線基板、單面或兩面覆金屬積層板、申請專利範圍第1至13項中任一項之附載體金屬箔或金屬箔1次以上。 A method for producing a build-up substrate, comprising: at least one metal foil side build-up resin of a carrier metal foil according to any one of claims 1 to 13, and then repeating a laminated resin, a single-sided or double-sided wiring substrate, A single-sided or double-sided metal-clad laminate, the carrier-attached metal foil or metal foil of any one of claims 1 to 13 may be used more than once. 如申請專利範圍第42項之增層基板之製造方法,其進而包括:對單面或兩面配線基板、單面或兩面覆金屬積層板、附載體金屬箔之金屬箔、附載體金屬箔之板狀載體、金屬箔、或樹脂進行開孔,並於該孔之側面及底面進行導通鍍敷之步驟。 The method for manufacturing a build-up substrate according to claim 42, further comprising: a single-sided or double-sided wiring substrate, a single-sided or double-sided metal-clad laminate, a metal foil with a carrier metal foil, and a metal foil with a carrier The carrier, the metal foil, or the resin is opened, and the step of conducting plating is performed on the side and the bottom surface of the hole. 如申請專利範圍第42或43項之增層基板之製造方法,其進而包括:於構成上述單面或兩面配線基板之金屬箔、構成單面或兩面覆金屬積層板之金屬箔、構成附載體金屬箔之金屬箔、及金屬箔之至少一者上形成配線之步驟。 The method for producing a build-up substrate according to the 42nd or 43rd aspect of the invention, further comprising: a metal foil constituting the single-sided or double-sided wiring substrate, a metal foil constituting a single-sided or double-sided metal-clad laminate, and a carrier A step of forming a wiring on at least one of a metal foil of a metal foil and a metal foil. 如申請專利範圍第42至44項中任一項之增層基板之製造方法,其進而包括:於形成有配線之表面上,使單面密接有金屬箔之申請專利範圍第1至13項中任一項之附載體金屬箔之樹脂板側接觸並進行積層之步驟。 The method for producing a build-up substrate according to any one of claims 42 to 44, further comprising: in the first to third aspects of the patent application scope in which the metal foil is adhered to one surface on the surface on which the wiring is formed A step of contacting and laminating the side of the resin sheet with the carrier metal foil. 如申請專利範圍第42至44項中任一項之增層基板之製造方法,其進而包括:於形成有配線之表面上積層樹脂,並於該樹脂上使兩面密接有金屬箔之申請專利範圍第1至13項中任一項之附載體金屬箔之一個金屬箔 接觸並進行積層之步驟。 The method for producing a build-up substrate according to any one of claims 42 to 44, further comprising: applying a resin on a surface on which the wiring is formed, and applying a metal foil on both sides of the resin a metal foil of a carrier metal foil according to any one of items 1 to 13 The steps of contacting and carrying out the lamination. 如申請專利範圍第42至46項中任一項之增層基板之製造方法,其中上述樹脂之至少一個為預浸體。 The method for producing a build-up substrate according to any one of claims 42 to 46, wherein at least one of the above resins is a prepreg. 如申請專利範圍第40至47項中任一項之增層基板之製造方法,其進而包括:將上述附載體金屬箔之板狀載體與金屬箔剝離而分離之步驟。 The method for producing a build-up substrate according to any one of claims 40 to 47, further comprising the step of separating the plate-shaped carrier of the metal foil with a carrier and the metal foil. 如申請專利範圍第48項之增層配線板之製造方法,其進而包括:藉由對未與板狀載體密接之金屬箔之一部分或全部進行蝕刻而將其除去之步驟。 The method for producing a build-up wiring board according to claim 48, further comprising the step of removing a part or all of the metal foil which is not in close contact with the plate-shaped carrier by etching. 一種增層配線板,其係藉由申請專利範圍第48或49項之製造方法而獲得。 A build-up wiring board obtained by the manufacturing method of claim 48 or 49. 一種印刷電路板之製造方法,其包括:藉由申請專利範圍第40至47項中任一項之製造方法而製造增層基板之步驟。 A method of manufacturing a printed circuit board, comprising the step of manufacturing a build-up substrate by the manufacturing method of any one of claims 40 to 47. 一種印刷電路板之製造方法,其包括:藉由申請專利範圍第49或50項之製造方法而製造增層配線板之步驟。 A method of manufacturing a printed circuit board comprising the steps of manufacturing a build-up wiring board by the manufacturing method of claim 49 or 50.
TW102134014A 2012-09-20 2013-09-18 A metal foil with a carrier TWI615271B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP2012-207431 2012-09-20
JP2012207431 2012-09-20

Publications (2)

Publication Number Publication Date
TW201420332A true TW201420332A (en) 2014-06-01
TWI615271B TWI615271B (en) 2018-02-21

Family

ID=50341555

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102134014A TWI615271B (en) 2012-09-20 2013-09-18 A metal foil with a carrier

Country Status (3)

Country Link
JP (1) JP6104260B2 (en)
TW (1) TWI615271B (en)
WO (1) WO2014046256A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106232350A (en) * 2014-06-03 2016-12-14 三井金属矿业株式会社 Metal forming and the printed circuit board (PCB) of resin bed peeled off by band

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113825316A (en) * 2015-12-07 2021-12-21 三井金属矿业株式会社 Method for producing laminate and metal foil with resin layer
CN113631376A (en) * 2019-03-26 2021-11-09 琳得科株式会社 Release sheet
JP6730503B1 (en) * 2019-11-06 2020-07-29 日本タングステン株式会社 Copper clad laminate

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3649892A (en) * 1970-07-13 1972-03-14 Mallory & Co Inc P R Capacitors utilizing bonded discrete polymeric film dielectrics
JPS63145022A (en) * 1986-12-10 1988-06-17 三菱瓦斯化学株式会社 Manufacture of multilayer printed wiring board
JPH0590740A (en) * 1991-04-26 1993-04-09 Nitto Boseki Co Ltd Sheet for transferring conductor circuit, its manufacture, printed wiring body utilizing it, and its manufacture
JP2002033581A (en) * 2000-07-13 2002-01-31 Mitsui Mining & Smelting Co Ltd Manufacturing method for copper-clad laminate
JP2004249641A (en) * 2003-02-21 2004-09-09 Sumitomo Bakelite Co Ltd Manufacturing method for laminate
SG171589A1 (en) * 2006-04-25 2011-06-29 Asahi Glass Co Ltd Release film for semiconductor resin molds
TW200804626A (en) * 2006-05-19 2008-01-16 Mitsui Mining & Smelting Co Copper foil provided with carrier sheet, method for fabricating copper foil provided with carrier sheet, surface-treated copper foil provided with carrier sheet, and copper-clad laminate using the surface-treated copper foil provided with carrier she
JP4805304B2 (en) * 2008-05-12 2011-11-02 Jx日鉱日石金属株式会社 Metal foil with carrier and method for producing multilayer coreless circuit board
JP5165773B2 (en) * 2011-02-10 2013-03-21 フリージア・マクロス株式会社 Metal foil with carrier and method for producing laminated substrate using the same

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106232350A (en) * 2014-06-03 2016-12-14 三井金属矿业株式会社 Metal forming and the printed circuit board (PCB) of resin bed peeled off by band
TWI583263B (en) * 2014-06-03 2017-05-11 Mitsui Mining & Smelting Co A metal foil with a release resin layer and a printed wiring board
CN106232350B (en) * 2014-06-03 2017-09-22 三井金属矿业株式会社 With the metal foil and printed circuit board (PCB) for peeling off resin bed
US10863621B2 (en) 2014-06-03 2020-12-08 Mitsui Mining & Smelting Co., Ltd. Metal foil with releasing resin layer, and printed wiring board

Also Published As

Publication number Publication date
WO2014046256A1 (en) 2014-03-27
JPWO2014046256A1 (en) 2016-08-18
TWI615271B (en) 2018-02-21
JP6104260B2 (en) 2017-03-29

Similar Documents

Publication Publication Date Title
KR101975086B1 (en) Copper foil with carrier, laminate, method for manufacturing printed wiring board, and method for manufacturing electronic device
TWI606772B (en) Multilayer printed wiring board manufacturing method
JP6687765B2 (en) Metal foil with carrier
TWI565371B (en) Attached metal foil
KR102067859B1 (en) Copper foil with carrier, laminate, method for manufacturing printed wiring board and method for manufacturing electronic device
TWI569953B (en) Attached metal foil
TWI627876B (en) Metal foil with carrier
TWI519413B (en) Attached metal foil
KR20150063471A (en) Metallic foil having carrier, layered product comprising resin sheet-shaped carrier and metallic foil, and uses for same
TW201822597A (en) Surface Treated Copper Foil, Copper Foil With Carrier, Laminate, Method for Manufacturing Printed Wiring Board, and Method for Manufacturing Electronic Device
KR20150123184A (en) Copper foil with carrier, printed circuit board, laminate, electronic device and method of manufacturing printed circuit board
TWI615271B (en) A metal foil with a carrier
TW201540493A (en) Laminate comprising resin plate-shaped carrier and metal layer
JP6104261B2 (en) Metal foil with carrier
JP6306865B2 (en) Laminate with resin substrates in close contact with each other in a peelable manner

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees