TW201414018A - Phosphor layer attaching kit, optical semiconductor element-phosphor layer attaching body, and optical semiconductor device - Google Patents

Phosphor layer attaching kit, optical semiconductor element-phosphor layer attaching body, and optical semiconductor device Download PDF

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TW201414018A
TW201414018A TW102134356A TW102134356A TW201414018A TW 201414018 A TW201414018 A TW 201414018A TW 102134356 A TW102134356 A TW 102134356A TW 102134356 A TW102134356 A TW 102134356A TW 201414018 A TW201414018 A TW 201414018A
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phosphor layer
layer
adhesive
group
adhesive composition
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TW102134356A
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Masahiro Shirakawa
Hironaka Fujii
Hisataka Ito
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Nitto Denko Corp
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    • C09J183/00Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Adhesives based on derivatives of such polymers
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    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/77Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals
    • C09K11/7766Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals containing two or more rare earth metals
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    • C09J183/00Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Adhesives based on derivatives of such polymers
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    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
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    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
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    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/50Wavelength conversion elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/50Wavelength conversion elements
    • H01L33/505Wavelength conversion elements characterised by the shape, e.g. plate or foil
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/22Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/26Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen nitrogen-containing groups
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    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/312Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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    • C09J2483/00Presence of polysiloxane
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2933/00Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
    • H01L2933/0008Processes
    • H01L2933/0033Processes relating to semiconductor body packages
    • H01L2933/0041Processes relating to semiconductor body packages relating to wavelength conversion elements
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/28Web or sheet containing structurally defined element or component and having an adhesive outermost layer
    • Y10T428/2852Adhesive compositions

Abstract

A phosphor layer attaching kit includes a phosphor layer and a silicone pressure-sensitive adhesion composition for attaching the phosphor layer to an optical semiconductor element or an optical semiconductor element package. A percentage of the peel strength of the silicone pressure-sensitive adhesion composition is 30 % or more.

Description

螢光體層黏貼套組、光半導體元件-螢光體層黏貼體及光半導體裝置 Phosphor layer adhesive set, optical semiconductor element-phosphor layer adhesive and optical semiconductor device

本發明係關於一種螢光體層黏貼套組、光半導體元件-螢光體層黏貼體及光半導體裝置,詳細而言係關於一種用以將螢光體層黏貼於光半導體元件或光半導體元件封裝體上之螢光體層黏貼套組、光半導體元件-螢光體層黏貼體及光半導體裝置。 The present invention relates to a phosphor layer adhesive set, an optical semiconductor element-phosphor layer adhesive body, and an optical semiconductor device, and more particularly to a method for bonding a phosphor layer to an optical semiconductor element or an optical semiconductor element package. The phosphor layer adhesive set, the optical semiconductor element-the phosphor layer adhesive body, and the optical semiconductor device.

發光二極體裝置(以下簡稱為LED裝置)或雷射二極體照射裝置(以下簡稱為LD照射裝置)等光半導體裝置例如包括發光二極體元件(LED,Light Emitting Diode)或雷射二極體(LD,Laser Diode)等光半導體元件、及配置於光半導體元件上之螢光體層。該光半導體裝置係自光半導體元件發出光並藉由例如透過螢光體層之藍色光、及螢光體層中一部分藍色光經波長轉換而成之黃色光之混色而發出白色光。 An optical semiconductor device such as a light-emitting diode device (hereinafter simply referred to as an LED device) or a laser diode irradiation device (hereinafter simply referred to as an LD irradiation device) includes, for example, a light emitting diode (LED) or a laser diode An optical semiconductor element such as a polar body (LD) or a phosphor layer disposed on the optical semiconductor element. The optical semiconductor device emits white light from the optical semiconductor element and emits light by, for example, blue light transmitted through the phosphor layer and yellow light mixed by wavelength conversion of a part of the blue light in the phosphor layer.

作為此種光半導體裝置,提出有包含利用透明密封材料密封有LED之LED封裝體、及積層於其上表面之螢光膠帶的LED裝置(例如參照美國專利第7、294、861號說明書)。 As such an optical semiconductor device, an LED package including an LED package in which an LED is sealed with a transparent sealing material and a fluorescent tape laminated on the upper surface thereof has been proposed (for example, refer to the specification of U.S. Patent No. 7,294,861).

美國專利第7、294、861號說明書之螢光膠帶包括螢光層、及積層於其背面之包含(甲基)丙烯酸酯系感壓接著劑之丙烯酸系感壓接著層,且螢光層係經由丙烯酸系感壓接著層而黏貼於LED封裝體之表面。 The fluorescent tape of the specification of U.S. Patent No. 7,294,861 includes a phosphor layer and an acrylic pressure-sensitive adhesive layer comprising a (meth)acrylate-based pressure-sensitive adhesive laminated on the back surface thereof, and a phosphor layer Adhered to the surface of the LED package via an acrylic pressure-sensitive adhesive layer.

然而,螢光膠帶易隨著LED之發光而成為高溫,結果美國專利第7、294、861號說明書之螢光膠帶存在高溫(例如包括75℃在內之高溫)下之接著力與常溫(25℃)下之接著力相比明顯降低之不良情況。 However, the fluorescent tape is liable to become high temperature with the light emission of the LED. As a result, the fluorescent tape of the specification of the U.S. Patent No. 7,294,861 has a high temperature (for example, a high temperature including 75 ° C) and a normal temperature (25). °C) The adhesion is significantly lower than the adverse conditions.

進而,亦存在若高溫下長時間使用美國專利第7、294、861號說明書之螢光膠帶則會產生劣化,因此LED裝置之亮度降低之不良情況。 Further, if the fluorescent tape of the specification of U.S. Patent No. 7,294,861 is used for a long period of time at a high temperature, deterioration occurs, and thus the brightness of the LED device is lowered.

本發明之目的在於提供一種耐熱性及耐久性優異之螢光體層黏貼套組、光半導體元件-螢光體層黏貼體及光半導體裝置。 An object of the present invention is to provide a phosphor layer adhesive set, an optical semiconductor element-phosphor layer adhesive, and an optical semiconductor device which are excellent in heat resistance and durability.

本發明之螢光體層黏貼套組之特徵在於含有螢光體層、及用以將上述螢光體層黏貼於光半導體元件或光半導體元件封裝體上之聚矽氧黏接著劑組合物,且上述聚矽氧黏接著劑組合物之下述剝離強度之百分率為30%以上。 The phosphor layer adhesive set of the present invention is characterized by comprising a phosphor layer and a polyoxygen adhesive composition for adhering the phosphor layer to an optical semiconductor element or an optical semiconductor element package, and the above-mentioned poly The percentage of the following peel strength of the silicone adhesive composition is 30% or more.

剝離強度之百分率=[(75℃環境下之剝離強度PS75℃)/(25℃環境下之剝離強度PS25℃)]×100 The percentage of peel strength = [(peel strength under the environment of 75 deg.] C PS 75 ℃) / (peel strength under the environment of 25 deg.] C PS 25 ℃)] × 100

75℃環境下之剝離強度PS75℃係將由上述聚矽氧黏接著劑組合物形成且積層於支持體上之上述黏接著劑層黏貼於上述螢光體層上,其後,於溫度75℃下以剝離角度180度、速度300mm/min將上述支持體及上述黏接著劑層自上述螢光體層剝離時的剝離強度。 Peel strength at 75 ° C. PS 75 ° C is a layer of the adhesive layer formed of the above polyadox adhesive composition and laminated on a support, and then adhered to the above-mentioned phosphor layer, and then at a temperature of 75 ° C The peeling strength of the support and the adhesive layer from the phosphor layer was peeled at a peeling angle of 180 degrees and a speed of 300 mm/min.

25℃環境下之剝離強度PS25℃係將由上述聚矽氧黏接著劑組合物形成且積層於支持體上之上述黏接著劑層黏貼於上述螢光體層上,其後,於溫度25℃下以剝離角度180度、速度300mm/min將上述支持體及上述黏接著劑層自上述螢光體層剝離時的剝離強度。 Peel strength at 25 ° C. PS 25 ° C is a layer of the adhesive layer formed of the above polyadox adhesive composition and laminated on a support, and then adhered to the above phosphor layer, and then at a temperature of 25 ° C The peeling strength of the support and the adhesive layer from the phosphor layer was peeled at a peeling angle of 180 degrees and a speed of 300 mm/min.

又,於本發明之螢光體層黏貼套組中,上述聚矽氧黏接著劑組合物適宜為聚矽氧感壓接著劑組合物。 Further, in the phosphor layer adhesive kit of the present invention, the polyoxyxylene adhesive composition is preferably a polyfluorene pressure-sensitive adhesive composition.

又,於本發明之螢光體層黏貼套組中,上述聚矽氧黏接著劑組合物適宜為兼具熱塑性及熱硬化性之聚矽氧熱塑性-熱硬化性接著劑 組合物。 Further, in the phosphor layer adhesive set of the present invention, the polyoxyxylene adhesive composition is suitably a thermoplastic and thermosetting adhesive which is both thermoplastic and thermosetting. combination.

又,本發明之光半導體元件-螢光體層黏貼體之特徵在於包括:光半導體元件;以及螢光黏貼片,其係由含有螢光體層、及用以將上述螢光體層黏貼於上述光半導體元件上之聚矽氧黏接著劑組合物的螢光體層黏貼套組製作,且上述螢光體層係經由上述聚矽氧黏接著劑組合物而黏貼於上述光半導體元件上;並且上述聚矽氧黏接著劑組合物之下述剝離強度之百分率為30%以上。 Further, the optical semiconductor element-phosphor layer adhesive of the present invention is characterized by comprising: an optical semiconductor element; and a fluorescent adhesive sheet comprising a phosphor layer and a layer for bonding the phosphor layer to the optical semiconductor a phosphor layer adhesive set of the polyoxo adhesive composition on the device, wherein the phosphor layer is adhered to the optical semiconductor element via the polyoxygen adhesive composition; and the polyoxygen The percentage of the following peel strength of the adhesive composition is 30% or more.

剝離強度之百分率=[(75℃環境下之剝離強度PS75℃)/(25℃環境下之剝離強度PS25℃)]×100 Percentage of peel strength = [(peel strength PS 75 ° C in 75 ° C environment) / (peel strength PS 25 ° C in 25 ° C environment)] × 100

75℃環境下之剝離強度PS75℃係將由上述聚矽氧黏接著劑組合物形成且積層於支持體上之上述黏接著劑層黏貼於上述螢光體層上,其後,於溫度75℃下以剝離角度180度、速度300mm/min將上述支持體及上述黏接著劑層自上述螢光體層剝離時的剝離強度。 Peel strength at 75 ° C. PS 75 ° C is a layer of the adhesive layer formed of the above polyadox adhesive composition and laminated on a support, and then adhered to the above-mentioned phosphor layer, and then at a temperature of 75 ° C The peeling strength of the support and the adhesive layer from the phosphor layer was peeled at a peeling angle of 180 degrees and a speed of 300 mm/min.

25℃環境下之剝離強度PS25℃係將由上述聚矽氧黏接著劑組合物形成且積層於支持體上之上述黏接著劑層黏貼於上述螢光體層上,其後,於溫度25℃下以剝離角度180度、速度300mm/min將上述支持體及上述黏接著劑層自上述螢光體層剝離時的剝離強度。 Peel strength at 25 ° C. PS 25 ° C is a layer of the adhesive layer formed of the above polyadox adhesive composition and laminated on a support, and then adhered to the above phosphor layer, and then at a temperature of 25 ° C The peeling strength of the support and the adhesive layer from the phosphor layer was peeled at a peeling angle of 180 degrees and a speed of 300 mm/min.

又,本發明之光半導體裝置之特徵在於包括:基板;安裝於上述基板上之光半導體元件;以及螢光黏貼片,其係由含有螢光體層、及用以將上述螢光體層黏貼於上述光半導體元件上之聚矽氧黏接著劑組合物的螢光體層黏貼套組製作,且上述螢光體層係經由上述聚矽氧黏接著劑組合物而黏貼於上述光半導體元件上;並且上述聚矽氧黏接著劑組合物之下述剝離強度之百分率為30%以上。 Moreover, the optical semiconductor device of the present invention includes: a substrate; an optical semiconductor element mounted on the substrate; and a fluorescent adhesive sheet comprising a phosphor layer and a layer for bonding the phosphor layer to the a phosphor layer adhesive set of the polyoxynitride adhesive composition on the optical semiconductor element, wherein the phosphor layer is adhered to the optical semiconductor element via the polyoxygen adhesive composition; and the above-mentioned poly The percentage of the following peel strength of the silicone adhesive composition is 30% or more.

剝離強度之百分率=[(75℃環境下之剝離強度PS75℃)/(25℃環境下之剝離強度PS25℃)]×100 Percentage of peel strength = [(peel strength PS 75 ° C in 75 ° C environment) / (peel strength PS 25 ° C in 25 ° C environment)] × 100

75℃環境下之剝離強度PS75℃係將由上述聚矽氧黏接著劑組合物 形成且積層於支持體上之上述黏接著劑層黏貼於上述螢光體層上,其後,於溫度75℃下以剝離角度180度、速度300mm/min將上述支持體及上述黏接著劑層自上述螢光體層剝離時的剝離強度。 Peel strength at 75 ° C. PS 75 ° C is a layer of the adhesive layer formed of the above polyadox adhesive composition and laminated on a support, and then adhered to the above-mentioned phosphor layer, and then at a temperature of 75 ° C The peeling strength of the support and the adhesive layer from the phosphor layer was peeled at a peeling angle of 180 degrees and a speed of 300 mm/min.

25℃環境下之剝離強度PS25℃係將由上述聚矽氧黏接著劑組合物形成且積層於支持體上之上述黏接著劑層黏貼於上述螢光體層上,其後,於溫度25℃下以剝離角度180度、速度300mm/min將上述支持體及上述黏接著劑層自上述螢光體層剝離時的剝離強度。 Peel strength at 25 ° C. PS 25 ° C is a layer of the adhesive layer formed of the above polyadox adhesive composition and laminated on a support, and then adhered to the above phosphor layer, and then at a temperature of 25 ° C The peeling strength of the support and the adhesive layer from the phosphor layer was peeled at a peeling angle of 180 degrees and a speed of 300 mm/min.

又,本發明之光半導體裝置之特徵在於包括:光半導體封裝體,其包含基板、安裝於上述基板上之光半導體元件、形成於上述基板之厚度方向一側且以於上述厚度方向上進行投影時包圍上述光半導體元件之方式配置之反射器、及填充於上述反射器內而密封上述光半導體元件之密封層;以及螢光黏貼片,其係由含有螢光體層、及用以將上述螢光體層黏貼於上述光半導體元件封裝體上之聚矽氧黏接著劑組合物的螢光體層黏貼套組製作,且上述螢光體層係經由上述聚矽氧黏接著劑組合物而黏貼於上述光半導體封裝體之上述厚度方向一側;並且上述聚矽氧黏接著劑組合物之下述剝離強度之百分率為30%以上。 Moreover, the optical semiconductor device of the present invention includes an optical semiconductor package including a substrate, an optical semiconductor element mounted on the substrate, and a thickness direction of the substrate and projection in the thickness direction. a reflector disposed to surround the optical semiconductor element, and a sealing layer filled in the reflector to seal the optical semiconductor element; and a fluorescent adhesive sheet comprising a phosphor layer and a fluorescent layer The phosphor layer is adhered to the phosphor layer adhesive set of the polyoxygen adhesive composition on the optical semiconductor device package, and the phosphor layer is adhered to the light via the polyoxygen adhesive composition. The semiconductor package has one side in the thickness direction; and the polyether oxide adhesive composition has a percentage of the following peel strength of 30% or more.

剝離強度之百分率=[(75℃環境下之剝離強度PS75℃)/(25℃環境下之剝離強度PS25℃)]×100 Percentage of peel strength = [(peel strength PS 75 ° C in 75 ° C environment) / (peel strength PS 25 ° C in 25 ° C environment)] × 100

75℃環境下之剝離強度PS75℃係將由上述聚矽氧黏接著劑組合物形成且積層於支持體上之上述黏接著劑層黏貼於上述螢光體層上,其後,於溫度75℃下以剝離角度180度、速度300mm/min將上述支持體及上述黏接著劑層自上述螢光體層剝離時的剝離強度。 Peel strength at 75 ° C. PS 75 ° C is a layer of the adhesive layer formed of the above polyadox adhesive composition and laminated on a support, and then adhered to the above-mentioned phosphor layer, and then at a temperature of 75 ° C The peeling strength of the support and the adhesive layer from the phosphor layer was peeled at a peeling angle of 180 degrees and a speed of 300 mm/min.

25℃環境下之剝離強度PS25℃係將由上述聚矽氧黏接著劑組合物形成且積層於支持體上之上述黏接著劑層黏貼於上述螢光體層上,其後,於溫度25℃下以剝離角度180度、速度300mm/min將上述支持體 及上述黏接著劑層自上述螢光體層剝離時的剝離強度。 Peel strength at 25 ° C. PS 25 ° C is a layer of the adhesive layer formed of the above polyadox adhesive composition and laminated on a support, and then adhered to the above phosphor layer, and then at a temperature of 25 ° C The peeling strength of the support and the adhesive layer from the phosphor layer was peeled at a peeling angle of 180 degrees and a speed of 300 mm/min.

於本發明之螢光體層黏貼套組中,由於用以將螢光體層黏貼於光半導體元件或光半導體元件封裝體上之聚矽氧黏接著劑組合物之剝離強度之百分率為30%以上,故而耐熱性及耐久性優異。 In the phosphor layer adhesive set of the present invention, the percentage of peeling strength of the polyoxygen adhesive composition for adhering the phosphor layer to the optical semiconductor element or the optical semiconductor element package is 30% or more, Therefore, it is excellent in heat resistance and durability.

因此,本發明之光半導體元件-螢光體層黏貼體及光半導體裝置可長時間確保優異之發光可靠性。 Therefore, the optical semiconductor element-phosphor layer adhesive and the optical semiconductor device of the present invention can ensure excellent light-emitting reliability for a long period of time.

1‧‧‧LED-螢光體層黏貼體 1‧‧‧LED-phosphor layer adhesion

2‧‧‧LED 2‧‧‧LED

3‧‧‧螢光體層 3‧‧‧Fluorescent layer

4‧‧‧聚矽氧黏接著劑層 4‧‧‧Polyoxygen adhesive layer

4'‧‧‧聚矽氧感壓接著劑組合物之皮膜 4'‧‧‧Polyoxide-sensitive adhesive composition film

5‧‧‧基板 5‧‧‧Substrate

6‧‧‧螢光黏貼片 6‧‧‧Fluorescent patch

7‧‧‧LED裝置 7‧‧‧LED device

8‧‧‧第1密封層 8‧‧‧1st sealing layer

9‧‧‧聚矽氧成形體 9‧‧‧Polyoxygenated body

10‧‧‧LED封裝體 10‧‧‧LED package

11‧‧‧反射器 11‧‧‧ reflector

12‧‧‧第2密封層 12‧‧‧2nd sealing layer

15‧‧‧熱板 15‧‧‧Hot board

圖1表示使用本發明之螢光體層黏貼套組之一實施形態而獲得之LED-螢光體層黏貼體的剖面圖。 Fig. 1 is a cross-sectional view showing an LED-phosphor layer adhesive obtained by using one embodiment of the phosphor layer adhesive set of the present invention.

圖2係製造圖1所示之LED-螢光體層黏貼體之方法之步驟圖,圖2(a)表示準備螢光體層之步驟,圖2(b)表示於螢光體層上積層聚矽氧黏接著劑層之步驟,圖2(c)表示將螢光體層與LED貼合之步驟。 2 is a step view showing a method of manufacturing the LED-phosphor layer adhesive body shown in FIG. 1. FIG. 2(a) shows a step of preparing a phosphor layer, and FIG. 2(b) shows a layer of polyoxygen on a phosphor layer. The step of adhering the adhesive layer, and FIG. 2(c) shows the step of bonding the phosphor layer to the LED.

圖3係製造圖1所示之LED-螢光體層黏貼體之方法之步驟圖,圖3(a)表示準備LED之步驟,圖3(b)表示於LED上積層聚矽氧黏接著劑層之步驟,圖3(c)表示將LED與螢光體層貼合之步驟。 3 is a step diagram of a method of manufacturing the LED-phosphor layer adhesive body shown in FIG. 1, FIG. 3(a) shows a step of preparing an LED, and FIG. 3(b) shows a layer of a polysilicon oxide adhesive layer laminated on the LED. The step of Fig. 3(c) shows the step of bonding the LED to the phosphor layer.

圖4係使用圖1所示之LED-螢光體層黏貼體製造LED裝置之方法之步驟圖,圖4(a)表示分別準備基板及LED-螢光體層黏貼體之步驟,圖4(b)表示於基板上安裝LED-螢光體層黏貼體之LED之步驟。 4 is a step diagram of a method of manufacturing an LED device using the LED-phosphor layer adhesive shown in FIG. 1, and FIG. 4(a) shows a step of separately preparing a substrate and an LED-phosphor layer adhesive, FIG. 4(b) The step of mounting the LED of the LED-phosphor layer paste on the substrate.

圖5係使用另一實施形態之LED-螢光體層黏貼體製造LED裝置之方法之步驟圖,圖5(a)表示分別準備基板及LED-螢光體層黏貼體之步驟,圖5(b)表示於基板上安裝LED-螢光體層黏貼體之LED之步驟。 5 is a step diagram of a method of manufacturing an LED device using an LED-phosphor layer adhesive of another embodiment, and FIG. 5(a) shows a step of separately preparing a substrate and an LED-phosphor layer adhesive, FIG. 5(b) The step of mounting the LED of the LED-phosphor layer paste on the substrate.

圖6係LED裝置之製造方法之另一實施形態之步驟圖, 圖6(a)表示準備安裝有LED之基板與螢光黏貼片之步驟,圖6(b)表示將螢光黏貼片黏貼於LED上,製作LED-螢光體層黏貼體之步驟。 6 is a process diagram of another embodiment of a method of manufacturing an LED device, Fig. 6(a) shows the steps of preparing the LED substrate and the fluorescent adhesive sheet, and Fig. 6(b) shows the step of bonding the fluorescent adhesive sheet to the LED to form the LED-phosphor layer adhesive.

圖7係LED裝置之製造方法之另一實施形態之步驟圖,圖7(a)表示準備安裝有LED之基板與螢光黏貼片之步驟,圖7(b)表示將螢光黏貼片黏貼於LED上,製作LED-螢光體層黏貼體之步驟。 7 is a step diagram showing another embodiment of a method of manufacturing an LED device, wherein FIG. 7(a) shows a step of preparing a substrate on which an LED is mounted and a fluorescent adhesive sheet, and FIG. 7(b) shows a step of attaching a fluorescent adhesive sheet to the fluorescent adhesive sheet. On the LED, the steps of making the LED-phosphor layer paste.

圖8係LED裝置之製造方法之另一實施形態之步驟圖,圖8(a)表示準備LED封裝體與螢光黏貼片之步驟,圖8(b)表示將螢光黏貼片黏貼於LED封裝體上之步驟。 8 is a step diagram of another embodiment of a method of manufacturing an LED device, wherein FIG. 8(a) shows a step of preparing an LED package and a fluorescent adhesive sheet, and FIG. 8(b) shows a step of attaching a fluorescent adhesive sheet to an LED package. Physical steps.

圖9係LED裝置之製造方法之另一實施形態之步驟圖,圖9(a)表示準備積層有聚矽氧黏接著劑層之LED封裝體與螢光體層之步驟,圖9(b)表示經由聚矽氧黏接著劑層將螢光體層黏貼於LED封裝體上之步驟。 Fig. 9 is a view showing a step of another embodiment of a method of manufacturing an LED device, and Fig. 9(a) shows a step of preparing an LED package and a phosphor layer in which a polyoxygen adhesive layer is laminated, and Fig. 9(b) shows The step of adhering the phosphor layer to the LED package via the polyoxycarbide adhesive layer.

<螢光體層黏貼套組> <Silver Body Adhesive Set>

本發明之螢光體層黏貼套組含有螢光體層(參照下述圖2中之符號3)、及用以將螢光體層黏貼於作為光半導體元件之LED(參照下述圖2中之符號2)或作為光半導體元件封裝體之LED封裝體(參照下述圖8中之符號10)上之聚矽氧黏接著劑組合物。該螢光體層黏貼套組之螢光體層與聚矽氧黏接著劑組合物係同時或分別地流通、銷售,並同時地使用。於使用該螢光體層黏貼套組時,例如於螢光體層上積層聚矽氧黏接著劑組合物,並經由聚矽氧黏接著劑組合物將螢光體層黏貼於LED或LED封裝體上,或者於LED或LED封裝體上積層聚矽氧黏接著劑組合物,其後,經由聚矽氧黏接著劑組合物將螢光體層黏貼於LED 或LED封裝體上。 The phosphor layer adhesive set of the present invention comprises a phosphor layer (refer to symbol 3 in FIG. 2 below) and an LED for adhering the phosphor layer to the optical semiconductor element (refer to symbol 2 in FIG. 2 below). Or a polyoxygen oxide adhesive composition on an LED package (see reference numeral 10 in FIG. 8 below) as an optical semiconductor element package. The phosphor layer of the phosphor layer adhesive set and the polyoxygen oxide adhesive composition are simultaneously or separately distributed, sold, and used simultaneously. When the phosphor layer is used to adhere the set, for example, a polysilicon adhesive composition is laminated on the phosphor layer, and the phosphor layer is adhered to the LED or the LED package via the polyoxygen adhesive composition. Or layering a polyoxymethylene adhesive composition on the LED or LED package, and thereafter, adhering the phosphor layer to the LED via the polyoxygen adhesive composition Or on the LED package.

螢光體層例如係將自LED發出之藍色光之一部分轉換為黃色光之波長轉換層(螢光體片)。又,根據用途及目的,螢光體層除上述之波長轉換以外,亦可將一部分藍色光轉換為紅色光。螢光體層係形成為板狀或片狀。螢光體層例如係由螢光體之陶瓷形成為螢光體陶瓷板,或者由含有螢光體及樹脂之螢光體樹脂組合物形成為螢光體樹脂片。 The phosphor layer is, for example, a wavelength conversion layer (phosphor sheet) that converts a portion of the blue light emitted from the LED into yellow light. Further, depending on the application and purpose, the phosphor layer may convert a part of blue light into red light in addition to the above-described wavelength conversion. The phosphor layer is formed into a plate shape or a sheet shape. The phosphor layer is formed, for example, as a phosphor ceramic plate from a ceramic of a phosphor, or as a phosphor resin sheet from a phosphor resin composition containing a phosphor and a resin.

螢光體吸收波長350~480nm之光之一部分或全部作為激發光並激發,而發出波長比激發光長之例如500~650nm之螢光。具體而言,作為螢光體,例如可列舉黃色螢光體。作為此種螢光體,例如可列舉於複合金屬氧化物或金屬硫化物等中摻雜有例如鈰(Ce)或銪(Eu)等金屬原子之螢光體。 The phosphor absorbs part or all of the light having a wavelength of 350 to 480 nm as excitation light and excites it, and emits fluorescence having a wavelength longer than the excitation light, for example, 500 to 650 nm. Specifically, examples of the phosphor include a yellow phosphor. Examples of such a phosphor include a phosphor doped with a metal atom such as cerium (Ce) or europium (Eu) in a composite metal oxide or a metal sulfide.

具體而言,作為螢光體,可列舉:例如Y3Al5O12:Ce(YAG(Yttrium Aluminum Garnet,釔-鋁-石榴石):Ce)、(Y,Gd)3(Al,Ga)5O12:Ce、Tb3Al3O12:Ce、Lu3Al3O12:Ce、Ca3Sc2Si3O12:Ce、Lu2CaMg2(Si,Ge)3O12:Ce等具有石榴石型晶體結構之石榴石型螢光體;例如(Sr,Ba)2SiO4:Eu、Ca3SiO4Cl2:Eu、Sr3SiO5:Eu、Li2SrSiO4:Eu、Ca3Si2O7:Eu等矽酸鹽螢光體;例如CaAl12O19:Mn、SrAl2O4:Eu等鋁酸鹽螢光體;例如ZnS:Cu,Al、CaS:Eu、CaGa2S4:Eu、SrGa2S4:Eu等硫化物螢光體;例如CaSi2O2N2:Eu、SrSi2O2N2:Eu、BaSi2O2N2:Eu、Ca-α-SiAlON等氮氧化物螢光體;例如CaAlSiN3:Eu、CaSi5N8:Eu等氮化物螢光體;例如K2SiF6:Mn、K2TiF6:Mn等氟化物系螢光體等。較佳為列舉石榴石型螢光體,進而較佳為列舉Y3Al5O12:Ce(YAG)。 Specifically, examples of the phosphor include Y 3 Al 5 O 12 :Ce (YAG (Yttrium Aluminum Garnet): Ce), and (Y, Gd) 3 (Al, Ga). 5 O 12 :Ce, Tb 3 Al 3 O 12 :Ce, Lu 3 Al 3 O 12 :Ce, Ca 3 Sc 2 Si 3 O 12 :Ce, Lu 2 CaMg 2 (Si,Ge) 3 O 12 :Ce, etc. a garnet-type phosphor having a garnet-type crystal structure; for example, (Sr, Ba) 2 SiO 4 : Eu, Ca 3 SiO 4 Cl 2 : Eu, Sr 3 SiO 5 : Eu, Li 2 SrSiO 4 : Eu, Ca 3 Si 2 O 7 : Eu silicate phosphor; for example, aluminate phosphor such as CaAl 12 O 19 :Mn, SrAl 2 O 4 :Eu; for example, ZnS: Cu, Al, CaS: Eu, CaGa 2 S 4 : sulfide phosphor such as Eu, SrGa 2 S 4 :Eu; for example, CaSi 2 O 2 N 2 :Eu, SrSi 2 O 2 N 2 :Eu, BaSi 2 O 2 N 2 :Eu, Ca-α- An oxynitride phosphor such as SiAlON; a nitride phosphor such as CaAlSiN 3 :Eu or CaSi 5 N 8 :Eu; a fluoride-based phosphor such as K 2 SiF 6 :Mn or K 2 TiF 6 :Mn; . Preferably, a garnet type phosphor is used, and further preferably, Y 3 Al 5 O 12 :Ce(YAG) is used.

螢光體可單獨使用或併用2種以上。 The phosphors may be used alone or in combination of two or more.

將螢光體層形成為螢光體陶瓷板時,以上述螢光體作為陶瓷材料,並燒結該陶瓷材料,藉此獲得螢光體層(螢光體陶瓷)。或者亦可 對上述螢光體之原材料進行燒結,並利用由此所產生之化學反應而獲得螢光體層(螢光體陶瓷)。 When the phosphor layer is formed into a phosphor ceramic plate, the phosphor layer is used as a ceramic material, and the ceramic material is sintered to obtain a phosphor layer (fluorescent ceramic). Or may The raw material of the above phosphor is sintered, and a phosphor layer (fluorescent ceramic) is obtained by the chemical reaction generated thereby.

再者,於獲得螢光體陶瓷時,亦可於燒結前以適當之比率添加例如黏合劑樹脂、分散劑、塑化劑、燒結助劑等添加劑。 Further, when the phosphor ceramic is obtained, an additive such as a binder resin, a dispersant, a plasticizer, or a sintering aid may be added at an appropriate ratio before sintering.

另一方面,由螢光體樹脂組合物形成螢光體層時,例如首先藉由調配上述螢光體與樹脂而製備螢光體樹脂組合物。 On the other hand, when the phosphor layer is formed of the phosphor resin composition, for example, the phosphor resin composition is prepared by first blending the phosphor and the resin.

樹脂係分散有螢光體之基質,例如可列舉:聚矽氧樹脂組合物、環氧樹脂、丙烯酸系樹脂等透明樹脂等。就耐久性之觀點而言,較佳為列舉聚矽氧樹脂組合物。 The resin is a matrix in which a phosphor is dispersed, and examples thereof include a transparent resin such as a polyoxyxylene resin composition, an epoxy resin, and an acrylic resin. From the viewpoint of durability, a polyoxyxylene resin composition is preferred.

聚矽氧樹脂組合物主要係在分子內具有包含矽氧烷鍵(-Si-O-Si-)之主鏈、及與主鏈之矽原子(Si)鍵結之包含烷基(例如甲基等)、芳基(例如苯基等)或烷氧基(例如甲氧基)等有機基之側鏈。 The polyoxyxylene resin composition mainly has a main chain having a siloxane chain (-Si-O-Si-) in a molecule, and an alkyl group (for example, a methyl group) bonded to a ruthenium atom (Si) of the main chain. A side chain of an organic group such as an aryl group (e.g., phenyl or the like) or an alkoxy group (e.g., methoxy group).

具體而言,作為聚矽氧樹脂組合物,例如可列舉:脫水縮合硬化型聚矽氧樹脂、加成反應硬化型聚矽氧樹脂、過氧化物硬化型聚矽氧樹脂、濕氣硬化型聚矽氧樹脂等硬化型聚矽氧樹脂等。 Specifically, examples of the polyoxyxylene resin composition include a dehydration condensation-curable polyphthalocyanine resin, an addition reaction-curable polyfluorene oxide resin, a peroxide-curable polyfluorene oxide resin, and a moisture-curing type polymerization. A hardening type polyoxyn resin such as a silicone resin.

聚矽氧樹脂組合物於25℃下之動黏度例如為10~30mm2/s。 The dynamic viscosity of the polyoxyxene resin composition at 25 ° C is, for example, 10 to 30 mm 2 /s.

樹脂可單獨使用或併用2種以上。 The resin may be used singly or in combination of two or more.

各成分之調配比率如下所述:螢光體之調配比率相對於螢光體樹脂組合物,例如為1質量%以上,較佳為5質量%以上,又,例如亦為50質量%以下,較佳為30質量%以下。又,螢光體相對於樹脂100質量份之調配比率,例如為1質量份以上,較佳為5質量份以上,又,例如亦為100質量份以下,較佳為40質量份以下。 The blending ratio of each component is as follows: the blending ratio of the phosphor is, for example, 1% by mass or more, preferably 5% by mass or more, and, for example, 50% by mass or less, relative to the phosphor resin composition. Preferably, it is 30% by mass or less. In addition, the blending ratio of the phosphor to 100 parts by mass of the resin is, for example, 1 part by mass or more, preferably 5 parts by mass or more, and further, for example, 100 parts by mass or less, preferably 40 parts by mass or less.

又,樹脂之調配比率相對於螢光體樹脂組合物,例如為50質量%以上,較佳為70質量%以上,例如亦為99質量%以下,較佳為95質量%以下。 In addition, the blending ratio of the resin is, for example, 50% by mass or more, preferably 70% by mass or more, and for example, 99% by mass or less, and preferably 95% by mass or less.

螢光體樹脂組合物係藉由以上述調配比率調配螢光體及樹脂並 進行攪拌混合而製備。所製備之螢光體樹脂組合物成形為片狀,具體而言形成為螢光體樹脂片。 The phosphor resin composition is prepared by blending the phosphor and the resin at the above-mentioned blending ratio Prepared by stirring and mixing. The prepared phosphor resin composition is formed into a sheet shape, specifically, a phosphor resin sheet.

於樹脂含有硬化型聚矽氧樹脂之情形時,螢光體樹脂片係以B階段或C階段形成。進而,於螢光體樹脂片係以B階段形成之情形時,亦可藉由其後之加熱而製成C階段。 In the case where the resin contains a hardening type polyoxyxylene resin, the phosphor resin sheet is formed in a B-stage or a C-stage. Further, in the case where the phosphor resin sheet is formed in the B-stage, it is also possible to form the C stage by heating thereafter.

就由LED及螢光體層所產生之發熱之熱傳導之觀點而言,螢光體層較佳為由螢光體陶瓷板形成。 The phosphor layer is preferably formed of a phosphor ceramic plate from the viewpoint of heat conduction from heat generated by the LED and the phosphor layer.

於螢光體層形成為螢光體陶瓷板之情形時,厚度例如為50μm以上,較佳為100μm以上,又,例如為1000μm以下,較佳為500μm以下。又,於由螢光體樹脂片形成之情形時,就成膜性及裝置外觀之觀點而言,厚度例如為25μm以上,較佳為50μm以上,又,例如亦為1000μm以下,較佳為200μm以下。 When the phosphor layer is formed of a phosphor ceramic plate, the thickness is, for example, 50 μm or more, preferably 100 μm or more, and is, for example, 1000 μm or less, or preferably 500 μm or less. Further, in the case of forming a phosphor resin sheet, the thickness is, for example, 25 μm or more, preferably 50 μm or more, and is also, for example, 1000 μm or less, preferably 200 μm, from the viewpoint of film formability and device appearance. the following.

作為聚矽氧黏接著劑組合物,例如可列舉:聚矽氧感壓接著劑組合物、聚矽氧熱塑性-熱硬化性接著劑組合物等。 Examples of the polyoxyxylene adhesive composition include a polyfluorene pressure-sensitive adhesive composition, a polyoxyxene thermoplastic-thermosetting adhesive composition, and the like.

聚矽氧感壓接著劑組合物例如係由含有第1聚矽氧烷、第2聚矽氧烷及觸媒等之原料而製備。 The polyoxygen-sensitive pressure-sensitive adhesive composition is prepared, for example, from a raw material containing a first polyoxyalkylene oxide, a second polyoxyalkylene oxide, and a catalyst.

第1聚矽氧烷係聚矽氧感壓接著劑組合物之主原料,例如可列舉含矽烷醇基之聚矽氧烷等反應性聚矽氧烷。 The main raw material of the first polyoxyalkylene-based polyfluorene pressure-sensitive adhesive composition may, for example, be a reactive polyoxyalkylene such as a polyoxyalkylene group containing a decyl alcohol group.

作為含矽烷醇基之聚矽氧烷,例如可列舉兩末端為矽烷醇基之聚矽氧烷。 Examples of the polyoxyalkylene group having a stanol group include polyoxyalkylene having a decyl alcohol group at both ends.

兩末端為矽烷醇基之聚矽氧烷係於分子之兩末端含有矽烷醇基(SiOH基)之有機矽氧烷,具體而言由下述通式(A)所表示。 The polyoxyalkylene group having a decyl alcohol group at both ends is an organic siloxane having a stanol group (SiOH group) at both ends of the molecule, and is specifically represented by the following formula (A).

通式(A): General formula (A):

(通式(A)中,Ra表示選自飽和烴基及芳香族烴基中之一價烴基;又,n表示1以上之整數) (In the formula (A), R a represents a monovalent hydrocarbon group selected from a saturated hydrocarbon group and an aromatic hydrocarbon group; and n represents an integer of 1 or more)

上述通式(A)中,於Ra所表示之一價烴基中,作為飽和烴基,可列舉:例如碳數1~6之直鏈狀或支鏈狀之烷基(甲基、乙基、丙基、異丙基、丁基、異丁基、戊基、己基等),例如碳數3~6之環烷基(環戊基、環己基等)等。 In the above-mentioned general formula (A), among the monovalent hydrocarbon groups represented by R a , the saturated hydrocarbon group may, for example, be a linear or branched alkyl group having 1 to 6 carbon atoms (methyl or ethyl group). A propyl group, an isopropyl group, a butyl group, an isobutyl group, a pentyl group, a hexyl group or the like), for example, a cycloalkyl group having 3 to 6 carbon atoms (cyclopentyl group, cyclohexyl group or the like).

又,上述通式(A)中,於Ra所表示之一價烴基中,作為芳香族烴基,例如可列舉:碳數6~10之芳基(苯基、萘基)等。 In the above-mentioned general formula (A), among the monovalent hydrocarbon groups represented by R a , examples of the aromatic hydrocarbon group include an aryl group (phenyl group, naphthyl group) having 6 to 10 carbon atoms.

上述通式(A)中,Ra可相同或亦可彼此不同,較佳為相同。 In the above formula (A), R a may be the same or different from each other, and is preferably the same.

作為一價烴基,較佳為列舉碳數1~6之烷基、及碳數6~10之芳基,進而較佳為列舉甲基、苯基。 The monovalent hydrocarbon group is preferably an alkyl group having 1 to 6 carbon atoms and an aryl group having 6 to 10 carbon atoms, and more preferably a methyl group or a phenyl group.

上述通式(A)中,n較佳為10,000以下之整數,進而較佳為1,000以下之整數。 In the above formula (A), n is preferably an integer of 10,000 or less, and more preferably an integer of 1,000 or less.

再者,上述通式(A)中之n係作為平均值而算出。 Further, n in the above formula (A) is calculated as an average value.

作為兩末端為矽烷醇基之聚矽氧烷,具體而言可列舉:兩末端為矽烷醇基之聚二甲基矽氧烷、兩末端為矽烷醇基之聚甲基苯基矽氧烷、兩末端為矽烷醇基之聚二苯基矽氧烷等。 Specific examples of the polyoxyalkylene group having a decyl alcohol group at both ends include polydimethyl methoxy oxane having a decyl alcohol group at both ends, and polymethyl phenyl siloxane having a decyl alcohol group at both ends. A polydiphenyl fluorene or the like having a decyl alcohol group at both ends.

此種第1聚矽氧烷可單獨使用或併用不同之複數種。 Such a first polyoxyalkylene oxide may be used singly or in combination of plural kinds.

於第1聚矽氧烷中,較佳為列舉兩末端為矽烷醇基之聚二甲基矽氧烷。 Among the first polyoxyalkylenes, polydimethyloxane having a decyl alcohol group at both ends is preferably used.

第1聚矽氧烷可使用市售品,又,亦可使用依據公知之方法所合 成者。 A commercial product may be used as the first polyoxyalkylene, or may be used according to a known method. Adult.

第1聚矽氧烷之數量平均分子量例如為100以上,較佳為200以上,又,例如亦為1,000,000以下,較佳為100,000以下。數量平均分子量係藉由凝膠滲透層析法,以標準聚苯乙烯換算而算出。 The number average molecular weight of the first polyoxyalkylene is, for example, 100 or more, preferably 200 or more, and is, for example, also 1,000,000 or less, preferably 100,000 or less. The number average molecular weight is calculated by gel permeation chromatography in terms of standard polystyrene.

第1聚矽氧烷之調配比率係於聚矽氧感壓接著劑組合物中,例如為60質量%以上,較佳為80質量%以上,又,例如亦為99.5質量%以下,較佳為98質量%以下。 The blending ratio of the first polyoxyalkylene oxide is, for example, 60% by mass or more, preferably 80% by mass or more, and, for example, 99.5% by mass or less, preferably in the polyoxymethylene pressure-sensitive adhesive composition. 98% by mass or less.

第2聚矽氧烷係聚矽氧感壓接著劑組合物之副原料,例如其係為了獲得接著劑層4之硬度之提高、接著力之提高、耐熱性之提高等特性而視需要添加。作為第2聚矽氧烷,例如可列舉鏈狀聚矽氧烷、環狀聚矽氧烷等。較佳為列舉環狀聚矽氧烷。 The auxiliary material of the second polyoxyalkylene-based polyoxo pressure-sensitive adhesive composition is added as needed, for example, in order to obtain characteristics such as improvement in hardness of the adhesive layer 4, improvement in adhesion, and improvement in heat resistance. Examples of the second polyoxyalkylene oxide include a chain polyoxyalkylene oxide and a cyclic polyoxyalkylene oxide. Preferable examples are cyclic polyoxoxanes.

環狀聚矽氧烷係以下述式(B)表示。 The cyclic polyoxyalkylene is represented by the following formula (B).

(通式(B)中,Ra與通式(A)中之Ra含義相同。m表示2以上之整數) (In the general formula (B), R a has the same meaning as R a in the general formula (A). m represents an integer of 2 or more)

m較佳為表示3以上之整數,又,例如亦為10以下之整數,較佳為6以下之整數。 m is preferably an integer of 3 or more, and is, for example, an integer of 10 or less, preferably an integer of 6 or less.

作為環狀聚矽氧烷,具體可列舉:六甲基環三矽氧烷(通式(B)中,Ra為甲基,m為3)、八甲基環四矽氧烷(通式(B)中,Ra為甲基,m為4)、十甲基環五矽氧烷(通式(B)中,Ra為甲基,m為5)等。 Specific examples of the cyclic polysiloxane are hexamethylcyclotrioxane (in the formula (B), R a is a methyl group, m is 3), and octamethylcyclotetraoxane (general formula) In (B), R a is a methyl group, m is 4), decamethylcyclopentaoxane (in the formula (B), R a is a methyl group, m is 5), and the like.

此種第2聚矽氧烷可單獨使用或亦可併用不同之複數種。 Such a second polyoxyalkylene oxide may be used singly or in combination of plural kinds.

於第2聚矽氧烷中,較佳為列舉八甲基環四矽氧烷。 Among the second polyoxyalkylenes, octamethylcyclotetraoxane is preferred.

第2聚矽氧烷之調配比率係相對於第1聚矽氧烷100質量份,例如為20質量份以下,較佳為10質量份以下。 The blending ratio of the second polyoxyalkylene is, for example, 20 parts by mass or less, preferably 10 parts by mass or less, based on 100 parts by mass of the first polyoxyalkylene.

作為觸媒,例如可列舉過氧化物,作為此種過氧化物,例如可列舉:過氧化二苯甲醯、過氧化苯甲醯基間甲基苯甲醯、過氧化間甲苯甲醯等苯甲醯基系過氧化物等有機過氧化物。 Examples of the catalyst include a peroxide, and examples of such a peroxide include benzoic acid benzoate, benzammonium peroxide, methylbenzhydrazide, and benzoic acid toluene. Formyl peroxide is an organic peroxide such as a peroxide.

觸媒可單獨使用或可併用。 The catalyst can be used alone or in combination.

作為觸媒,較佳為列舉將過氧化二苯甲醯、過氧化苯甲醯基間甲基苯甲醯及過氧化間甲苯甲醯併用(混合物)。 As the catalyst, it is preferred to use (mixture) of benzamidine peroxide, benzammonium peroxide, m-methylbenzonitrile, and toluene toluene.

就控制接著劑層4之硬度之觀點而言,觸媒之調配比率相對於第1聚矽氧烷100質量份,例如為0.5質量份以上,較佳為1質量份以上,又,亦為10質量份以下,較佳為5質量份以下。 In view of controlling the hardness of the adhesive layer 4, the blending ratio of the catalyst is, for example, 0.5 parts by mass or more, preferably 1 part by mass or more, and also 10 parts, per 100 parts by mass of the first polyoxyalkylene oxide. The amount by mass or less is preferably 5 parts by mass or less.

並且,聚矽氧感壓接著劑組合物係將上述原料視需要調配於溶劑中而製備清漆,繼而,視需要使該等進行反應而製備。作為溶劑,可列舉甲苯等芳香族烴等。 Further, the polyfluorene pressure-sensitive adhesive composition is prepared by disposing the above-mentioned raw materials in a solvent as needed to prepare a varnish, and then, if necessary, reacting them. Examples of the solvent include aromatic hydrocarbons such as toluene.

再者,於形成接著劑層4之皮膜後,視需要可蒸餾去除上述溶劑。 Further, after the film of the adhesive layer 4 is formed, the above solvent may be distilled off as needed.

上述聚矽氧感壓接著劑組合物可使用市售品,可使用:例如Dow Corning公司製造之280A、282、7355、7358、7502、7657、Q2-7406、Q2-7566、Q2-7735,例如Momentive公司製造之PSA 590、PSA 600、PSA 595、PSA 610、PSA 518、PSA 6574、PSA 529、PSA 750-D1、PSA 825-D1、PSA 800-C等。 Commercially available products can be used as the above-mentioned polyoxygen peroxide pressure-sensitive adhesive composition, and for example, 280A, 282, 7355, 7358, 7502, 7657, Q2-7406, Q2-7566, Q2-7735 manufactured by Dow Corning Co., Ltd. can be used, for example. PIA 590, PSA 600, PSA 595, PSA 610, PSA 518, PSA 6574, PSA 529, PSA 750-D1, PSA 825-D1, PSA 800-C, etc. manufactured by Momentive.

此種聚矽氧感壓接著劑組合物例如製備為液狀或半固形狀。 Such a polyoxygen-sensitive pressure-sensitive adhesive composition is prepared, for example, in a liquid or semi-solid shape.

聚矽氧熱塑性-熱硬化性接著劑組合物兼具熱塑性及熱硬化性。作為此種聚矽氧熱塑性-熱硬化性接著劑組合物,例如可列舉:第1聚矽氧熱塑性-熱硬化性接著劑組合物、第2聚矽氧熱塑性-熱硬化性接著劑組合物、第3聚矽氧熱塑性-熱硬化性接著劑組合物、第4聚矽氧 熱塑性-熱硬化性接著劑組合物、第5聚矽氧熱塑性-熱硬化性接著劑組合物及第6聚矽氧熱塑性-熱硬化性接著劑組合物。 The polyoxyxene thermoplastic-thermosetting adhesive composition has both thermoplasticity and thermosetting properties. Examples of such a polyoxyxene thermoplastic-thermosetting adhesive composition include a first polyfluorinated thermoplastic-thermosetting adhesive composition and a second polyoxy-thermoplastic thermosetting adhesive composition. Third polyoxyl thermoplastic-thermosetting adhesive composition, fourth polyoxyl A thermoplastic-thermosetting adhesive composition, a fifth polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition, and a sixth polyoxy-thermoplastic thermosetting adhesive composition.

第1聚矽氧熱塑性-熱硬化性接著劑組合物例如含有兩末端胺基型聚矽氧樹脂組合物、二異氰酸酯及自由基產生劑。 The first polyoxyl thermoplastic-thermosetting adhesive composition contains, for example, a two-terminal amine-based polyoxyxylene resin composition, a diisocyanate, and a radical generator.

就透明性或高耐熱性之觀點而言,兩末端胺基型聚矽氧樹脂組合物較佳為下述式(1)所表示之化合物。 The both-end amine-based polyoxyxylene resin composition is preferably a compound represented by the following formula (1) from the viewpoint of transparency or high heat resistance.

(式中,A~D為結構單元,A及D表示末端單元,B及C表示重複單元,R1表示一價烴基,R2表示烯基、R3表示伸烷基,a表示0以上之整數,b表示0以上之整數。a+b滿足至少為1以上之整數之關係。全部R1可相同亦可不同,b個R2可相同亦可不同) (wherein A to D are structural units, A and D are terminal units, B and C are repeating units, R 1 represents a monovalent hydrocarbon group, R 2 represents an alkenyl group, R 3 represents an alkylene group, and a represents 0 or more. An integer, b represents an integer of 0 or more. a+b satisfies the relationship of an integer of at least 1 or more. All R 1 may be the same or different, and b R 2 may be the same or different)

式(1)所表示之化合物係由結構單元A、B、C及D構成,且末端單元中含有胺基(-NH2)之化合物。 The compound represented by the formula (1) is a compound composed of the structural units A, B, C and D, and the terminal unit contains an amine group (-NH 2 ).

式(1)中之以R1所表示之烴基例如為飽和烴基或芳香族烴基。就獲得性之觀點而言,烴基之碳數例如為1~20,較佳為1~10。 Formula (1), the hydrocarbon group represented by R 1, for example, of a saturated or aromatic hydrocarbon group. The carbon number of the hydrocarbon group is, for example, from 1 to 20, preferably from 1 to 10, from the viewpoint of availability.

作為飽和烴基,例如可列舉:甲基、乙基、丙基、丁基、戊基、己基、環己基、環戊基等烷基。作為芳香族烴基,例如可列舉:苯基、苄基、甲苯基等芳基等。 Examples of the saturated hydrocarbon group include an alkyl group such as a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a cyclohexyl group or a cyclopentyl group. Examples of the aromatic hydrocarbon group include an aryl group such as a phenyl group, a benzyl group or a tolyl group.

於R1所表示烴基中,就所獲得之第1聚矽氧熱塑性-熱硬化性接著劑組合物之透明性及耐光性之觀點而言,較佳為列舉甲基、苯基,進 而較佳為列舉甲基。再者,式(1)中,全部R1較佳為與結構單元無關,分別獨立表示上述烴基。 The hydrocarbon group represented by R 1 is preferably a methyl group or a phenyl group from the viewpoint of transparency and light resistance of the first polyfluorene oxide thermoplastic-thermosetting adhesive composition obtained. To list the methyl groups. Further, in the formula (1), all of R 1 are preferably independently a structural unit, and each independently represents the above hydrocarbon group.

作為式(1)中之R2,可列舉經取代或未經取代之烯基。具體而言,只要為骨架中含有烯基之有機基即可,可列舉:乙烯基、烯丙基、丁炔基、戊炔基、己炔基等。其中,就所獲得之第1聚矽氧熱塑性-熱硬化性接著劑組合物之透明性及耐熱性之觀點而言,較佳為列舉乙烯基。 The formula R (1) in the 2, include the substituted or unsubstituted alkenyl group. Specifically, the organic group having an alkenyl group in the skeleton may be a vinyl group, an allyl group, a butynyl group, a pentynyl group or a hexynyl group. Among these, a vinyl group is preferred from the viewpoint of transparency and heat resistance of the first polyfluorene thermoplastic-thermosetting adhesive composition obtained.

作為式(1)中之R3,例如可列舉經取代或未經取代之伸烷基。R3只要為骨架中含有伸烷基之有機基即可,就所獲得之第1聚矽氧熱塑性-熱硬化性接著劑組合物之透明性及耐熱性之觀點而言,此種有機基之碳數例如為1~10。具體可列舉:亞甲基、伸乙基、伸丙基、伸丁基、伸戊基、伸己基、伸庚基等。其中,就所獲得之第1聚矽氧熱塑性-熱硬化性接著劑組合物之透明性及耐熱性之觀點而言,較佳為列舉伸丙基。再者,式(1)中,全部R3、即2個R3可相同亦可不同。 As R 3 in the formula (1), for example, a substituted or unsubstituted alkylene group can be mentioned. R 3 is not particularly limited as long as it is an organic group having an alkylene group in the skeleton, and the organic group is used in view of transparency and heat resistance of the first polyfluorene-thermoplastic thermosetting adhesive composition obtained. The carbon number is, for example, 1 to 10. Specific examples thereof include a methylene group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, and a heptyl group. Among them, from the viewpoint of transparency and heat resistance of the first polyoxyxene thermoplastic thermosetting adhesive composition obtained, a propyl group is preferred. Further, in the formula (1), all of R 3 , that is, two R 3 's may be the same or different.

結構單元A為末端單元,具體而言,其含有於分子一端。即,式(1)中含有1個結構單元A。 The structural unit A is an end unit, specifically, it is contained at one end of the molecule. That is, the formula (1) contains one structural unit A.

結構單元D為末端單元,具體而言,其含有於與結構單元A相反側之分子之另一端。即,式(1)中含有1個結構單元D。 The structural unit D is an end unit, specifically, it is contained at the other end of the molecule on the opposite side to the structural unit A. That is, the formula (1) contains one structural unit D.

結構單元B之重複單元數即式(1)中之a表示0以上之整數,就所獲得之第1聚矽氧熱塑性-熱硬化性接著劑組合物之透明性之觀點而言,例如為1~10,000,較佳為10~10,000之整數。 The number of repeating units of the structural unit B, that is, a in the formula (1) represents an integer of 0 or more, and is, for example, 1 in view of transparency of the first polyfluorene-thermoplastic thermoplastic-thermosetting adhesive composition obtained. ~10,000, preferably an integer from 10 to 10,000.

就所獲得之第1聚矽氧熱塑性-熱硬化性接著劑組合物之透明性之觀點而言,結構單元C之重複單元數即式(1)中之b例如為0~10,000,較佳為0~1,000之整數。 The b of the structural unit C, that is, the b in the formula (1) is, for example, 0 to 10,000, preferably from 0 to 10,000, from the viewpoint of the transparency of the first polyoxyxene thermoplastic-thermosetting adhesive composition obtained. An integer from 0 to 1,000.

a與b之和較佳為1~10,000,進而較佳為10~10,000。再者,由於a與b之和至少為1以上之整數,故而a或b中之任一者可為0。 The sum of a and b is preferably from 1 to 10,000, and more preferably from 10 to 10,000. Furthermore, since the sum of a and b is at least an integer of 1 or more, either one of a or b may be 0.

式(1)所表示之兩末端胺基型聚矽氧樹脂組合物可使用市售品,又,亦可依據公知之方法進行合成。 A commercially available product can be used as the two-terminal amine-based polyoxyxylene resin composition represented by the formula (1), or can be synthesized according to a known method.

就穩定性或操作性之觀點而言,式(1)所表示之兩末端胺基型聚矽氧樹脂組合物之重量平均分子量例如為100~1,000,000,較佳為1000~100,000。重量平均分子量係利用凝膠滲透層析法(GPC(Gel Permeation Chromatography):標準聚苯乙烯換算值)進行測定,以下相同。 The weight average molecular weight of the both terminal amine-based polyoxyxyl resin composition represented by the formula (1) is, for example, from 100 to 1,000,000, preferably from 1,000 to 100,000, from the viewpoint of stability or workability. The weight average molecular weight is measured by gel permeation chromatography (GPC (Gel Permeation Chromatography): standard polystyrene equivalent), and the same applies hereinafter.

兩末端胺基型聚矽氧樹脂組合物之含量於第1聚矽氧熱塑性-熱硬化性接著劑組合物中,例如為1質量%以上,較佳為80質量%以上,又,例如亦為99.9質量%以下。 The content of the both-end amine-based polyoxyxylene resin composition is, for example, 1% by mass or more, preferably 80% by mass or more, in the first polyoxyxene thermoplastic-thermosetting adhesive composition, and is also, for example, 99.9 mass% or less.

就與各成分之相溶性之觀點而言,二異氰酸酯例如係以下述式(2)表示。 The diisocyanate is represented, for example, by the following formula (2) from the viewpoint of compatibility with each component.

式(2):O=C=N-Y-N=C=O (2) Equation (2): O=C=N-Y-N=C=O (2)

(式中,Y表示二價烴基) (wherein Y represents a divalent hydrocarbon group)

作為式(2)中之Y,例如可列舉飽和或不飽和之直鏈、支鏈或環狀之烴基。就獲得性及所獲得之第1聚矽氧熱塑性-熱硬化性接著劑組合物之耐熱性之觀點而言,烴基之碳數例如為1~50,較佳為1~30。 As Y in the formula (2), for example, a saturated or unsaturated linear, branched or cyclic hydrocarbon group can be mentioned. The carbon number of the hydrocarbon group is, for example, from 1 to 50, preferably from 1 to 30, from the viewpoint of availability and heat resistance of the obtained first polyoxyxene thermoplastic-thermosetting adhesive composition.

作為二異氰酸酯,例如可列舉:脂肪族二異氰酸酯、芳香族二異氰酸酯、脂環族二異氰酸酯、及該等之改性體等。具體可列舉:六亞甲基二異氰酸酯、4,4'-亞甲基二環己二異氰酸酯、4,4'-亞甲基二苯二異氰酸酯、1,3-二吖丁啶基-2,4-二酮-雙(4,4'-亞甲基二環己基)二異氰酸酯、1,3-二吖丁啶基-2,4-二酮-雙(4,4'-亞甲基二苯基)二異氰酸酯、四亞甲基苯二亞甲基二異氰酸酯、異佛爾酮二異氰酸酯、甲苯2,4-二異氰酸酯、二環己基亞甲基二異氰酸酯等,該等可單獨使用或 組合使用2種以上。該等中,就透明性、耐熱性及獲得性之觀點而言,較佳為列舉甲苯2,4-二異氰酸酯、異佛爾酮二異氰酸酯、六亞甲基二異氰酸酯。 Examples of the diisocyanate include aliphatic diisocyanate, aromatic diisocyanate, alicyclic diisocyanate, and the like. Specific examples thereof include hexamethylene diisocyanate, 4,4'-methylene dicyclohexylene diisocyanate, 4,4'-methylene diphenyl diisocyanate, and 1,3-diazetidinyl-2,4- Diketo-bis(4,4'-methylenedicyclohexyl)diisocyanate, 1,3-diazetidinyl-2,4-dione-bis(4,4'-methylenediphenyl)di Isocyanate, tetramethylene benzene dimethylene diisocyanate, isophorone diisocyanate, toluene 2,4-diisocyanate, dicyclohexylmethylene diisocyanate, etc., which may be used alone or Two or more types can be used in combination. Among these, from the viewpoints of transparency, heat resistance, and availability, toluene 2,4-diisocyanate, isophorone diisocyanate, and hexamethylene diisocyanate are preferred.

作為二異氰酸酯,可使用市售品,又,亦可依據公知之方法進行合成。 As the diisocyanate, a commercially available product can be used, or it can be synthesized according to a known method.

二異氰酸酯之含量於第1聚矽氧熱塑性-熱硬化性接著劑組合物中,例如為1.0×10-5質量%以上,又,例如亦為20質量%以下,較佳為10質量%以下。 The content of the diisocyanate is, for example, 1.0 × 10 -5 mass% or more, and is, for example, 20 mass% or less, preferably 10 mass% or less, in the first polyoxyl thermoplastic-thermosetting adhesive composition.

又,就使兩末端胺基型聚矽氧樹脂組合物之胺基與二異氰酸酯之異氰酸酯基恰如其分地進行反應之觀點而言,兩末端胺基型聚矽氧樹脂組合物與二異氰酸酯之質量比係該等官能基之莫耳比(胺基/異氰酸酯基)例如為0.1/1~1/0.1,較佳為實質上等量(1/1)。 Further, in terms of the mass ratio of the amine group of the both terminal amine-based polyoxyxylene resin composition to the isocyanate group of the diisocyanate, the mass ratio of the terminal amino group-type polyoxyxyl resin composition to the diisocyanate The molar ratio (amine/isocyanate group) of the functional groups is, for example, 0.1/1 to 1/0.1, preferably substantially equal (1/1).

自由基產生劑係產生自由基而促進兩末端胺基型聚矽氧樹脂組合物彼此之交聯反應之化合物,可列舉光自由基產生劑或有機過氧化物等,由於第1聚矽氧熱塑性-熱硬化性接著劑組合物會根據溫度而顯示出熱塑性/熱硬化性,故而較佳為列舉藉由加熱而產生自由基之有機過氧化物。 The radical generating agent is a compound which generates a radical and promotes crosslinking reaction between the two terminal amino group-type polyoxyxyl resin compositions, and examples thereof include a photoradical generating agent or an organic peroxide, etc., due to the first polyfluorene thermoplastic Since the thermosetting adhesive composition exhibits thermoplasticity/thermosetting property depending on the temperature, an organic peroxide which generates a radical by heating is preferably used.

具體可列舉:過氧化甲基乙基酮、過氧化環己酮、過氧化甲基環己酮、過氧化乙醯丙酮、1,1-二(過氧化第三己基)-3,3,5-三甲基環己烷、1,1-二(過氧化第三己基)環己烷、1,1-二(過氧化第三丁基)-2-甲基環己烷、1,1-二(過氧化第三丁基)環己烷、2,2-二(過氧化第三丁基)丁烷、2,2-二(4,4-二-(過氧化丁基)環己基)丙烷、氫過氧化對薄荷烷、氫過氧化二異丙基苯、氫過氧化1,1,3,3-四甲基丁基、氫過氧化異丙基苯、氫過氧化第三丁基、過氧化二異丙苯、2,5-二甲基-2,5-二(過氧化第三丁基)己烷、過氧化第三丁基異丙苯基、過氧化二-第三己基、過氧化二-第三丁基、過氧化二異丁醯、過氧化二-正辛醯、過氧化二苯 甲醯、過氧化二碳酸二正丙酯、過氧化二碳酸二異丙酯、過氧化碳酸二(4-第三丁基環己基)酯、過氧化新癸酸第三己酯、過氧化新癸酸第三丁酯、過氧化二異丁酸第三丁酯、過氧化烯丙基單碳酸第三丁酯、過氧化第三丁基苯等。該等可單獨使用或組合使用2種以上。該等中,就透明性、耐熱性及獲得性之觀點而言,較佳為過氧化二-第三丁基、2,5-二甲基-2,5-二(過氧化第三丁基)己烷、過氧化第三丁基苯。 Specific examples thereof include methyl ethyl ketone peroxide, cyclohexanone peroxide, methylcyclohexanone peroxide, acetamidine peroxide, 1,1-di(perylene peroxide)-3,3,5. -trimethylcyclohexane, 1,1-di(dihexyl peroxide)cyclohexane, 1,1-di(t-butylperoxy)-2-methylcyclohexane, 1,1- Di(t-butylperoxide)cyclohexane, 2,2-di(t-butylperoxy)butane, 2,2-bis(4,4-di-(peroxybutyl)cyclohexyl) Propane, hydroperoxide p-menthane, diisopropylbenzene hydroperoxide, 1,1,3,3-tetramethylbutyl hydroperoxide, cumene hydroperoxide, tert-butyl hydroperoxide , dicumyl peroxide, 2,5-dimethyl-2,5-di(t-butylperoxy)hexane, tributyl cumyl peroxide, di-tertiary hexyl peroxide , di-tert-butyl peroxide, diisobutylphosphonium peroxide, di-n-octyl peroxide, diphenyl peroxide Formamidine, di-n-propyl peroxydicarbonate, diisopropyl peroxydicarbonate, di(4-tert-butylcyclohexyl)peroxycarbonate, third hexyl peroxy neodecanoate, new peroxidation Tert-butyl citrate, tert-butyl peroxybutyrate, tert-butyl peroxypropylene monocarbonate, tert-butylbenzene peroxide, and the like. These may be used alone or in combination of two or more. Among these, from the viewpoints of transparency, heat resistance and availability, di-tert-butyl peroxide and 2,5-dimethyl-2,5-di(peroxybutylene peroxide) are preferred. Hexane, tributylbenzene peroxide.

雖無法一概地決定該等自由基產生劑產生自由基之溫度,但例如可為100℃以上。 Although it is not possible to determine the temperature at which the radical generating agent generates radicals, it may be, for example, 100 ° C or higher.

自由基產生劑可使用市售品,又,亦可依據公知之方法進行合成。 A commercially available product can be used as the radical generating agent, and it can also be synthesized according to a known method.

自由基產生劑之含量於第1聚矽氧熱塑性-熱硬化性接著劑組合物中,例如為1.0×10-6質量%以上,又,例如亦為20質量%以下,較佳為10質量%以下。 The content of the radical generating agent is, for example, 1.0 × 10 -6 % by mass or more, and for example, 20% by mass or less, preferably 10% by mass, based on the first polyfluorene-thermoplastic thermoplastic-thermosetting adhesive composition. the following.

又,於將兩末端胺基型聚矽氧樹脂組合物之R1基量設為100mol%之情形時,就維持所獲得之第1聚矽氧熱塑性-熱硬化性接著劑組合物之柔軟性之觀點而言,自由基產生劑之含量例如為0.001mol%以上,較佳為0.01mol%以上,又,例如亦為50mol%以下,較佳為10mol%以下。 Further, when the amount of the R 1 group of the both terminal amine-based polyoxyxene resin composition is 100 mol%, the flexibility of the obtained first polyfluorene thermoplastic-thermosetting adhesive composition is maintained. In view of the above, the content of the radical generating agent is, for example, 0.001 mol% or more, preferably 0.01 mol% or more, and further, for example, 50 mol% or less, preferably 10 mol% or less.

第1聚矽氧熱塑性-熱硬化性接著劑組合物只要含有兩末端胺基型聚矽氧樹脂組合物、二異氰酸酯及自由基產生劑,則並無特別限定地製備。 The first polyoxyl thermoplastic-thermosetting adhesive composition is not particularly limited as long as it contains a terminal amino group-type polyoxyxylene resin composition, a diisocyanate, and a radical generator.

就根據異氰酸酯基之反應與利用自由基產生劑的交聯反應之各反應機制而適當選擇反應溫度及時間,使反應進行、結束之觀點而言,第1聚矽氧熱塑性-熱硬化性接著劑組合物較佳為預先將與異氰酸酯基之反應相關之成分、即兩末端胺基型聚矽氧樹脂組合物及二異氰 酸酯進行混合,其後調配自由基產生劑。 The first polyfluorene-thermoplastic thermoplastic-thermosetting adhesive is selected from the viewpoints of the reaction mechanism of the reaction between the isocyanate group and the crosslinking reaction using a radical generator, and the reaction temperature and time are appropriately selected to complete and complete the reaction. The composition is preferably a component which is previously associated with the reaction of an isocyanate group, that is, a two-terminal amine-based polyoxyxylene resin composition and diisocyanate. The acid ester is mixed, and then the radical generating agent is formulated.

與異氰酸酯基之反應相關之成分之調配係藉由例如於0℃以上、較佳為10℃以上,又,例如為100℃以下、較佳為60℃以下,將兩末端胺基型聚矽氧樹脂組合物及二異氰酸酯、以及視需要之有機溶劑等添加劑例如攪拌0.1~40小時而實施。 The compounding of the component related to the reaction of the isocyanate group is carried out by, for example, at 0 ° C or higher, preferably 10 ° C or higher, and further, for example, 100 ° C or lower, preferably 60 ° C or lower. The resin composition, the diisocyanate, and an optional organic solvent are stirred, for example, for 0.1 to 40 hours.

作為有機溶劑,並無特別限定,就提高各成分之相溶性之觀點而言,較佳為列舉甲基乙基酮等酮。 The organic solvent is not particularly limited, and from the viewpoint of improving the compatibility of the respective components, a ketone such as methyl ethyl ketone is preferred.

再者,可藉由上述混合而開始進行兩末端胺基型聚矽氧樹脂組合物之胺基與二異氰酸酯之異氰酸酯基之反應之一部分,反應之進度可利用1H-NMR(Nuclear Magnetic Resonance,核磁共振)測定,藉由源自胺基之波峰之消失程度進行確認。 Further, one part of the reaction between the amine group of the two-terminal amine-based polyoxyxylene resin composition and the isocyanate group of the diisocyanate can be started by the above-mentioned mixing, and the progress of the reaction can be performed by 1 H-NMR (Nuclear Magnetic Resonance, The nuclear magnetic resonance measurement was confirmed by the degree of disappearance of the peak derived from the amine group.

其次,作為與交聯反應相關之成分,係將自由基產生劑混合於與上述異氰酸酯基之反應相關之成分之混合物中。於第1聚矽氧熱塑性-熱硬化性接著劑組合物係進行異氰酸酯基之反應與利用自由基產生劑的交聯反應之2種反應而獲得硬化物時,可藉由產生交聯反應而獲得硬化物(成形物),因此,只要將自由基產生劑均勻混合於與上述異氰酸酯基之反應相關之成分之混合物中,則混合方法並無特別限定。 Next, as a component related to the crosslinking reaction, a radical generating agent is mixed in a mixture of components related to the reaction of the above isocyanate group. When the first polyfluorene-thermoplastic thermoplastic-thermosetting adhesive composition is subjected to two kinds of reactions of a reaction between an isocyanate group and a crosslinking reaction using a radical generator to obtain a cured product, it can be obtained by generating a crosslinking reaction. The cured product (molded product) is not particularly limited as long as the radical generating agent is uniformly mixed in a mixture of the components related to the reaction of the above isocyanate group.

具體而言,於兩末端胺基型聚矽氧樹脂組合物及二異氰酸酯之混合物中,調配自由基產生劑並進行攪拌混合。混合時間係根據反應溫度或供於反應之成分之種類、量而定無法一概決定,但例如可為0.1~40小時。再者,所獲得之混合物(反應物)可依據公知之方法去除溶劑等。 Specifically, a radical generator is prepared and stirred and mixed in a mixture of a two-terminal amine-based polyoxyxyl resin composition and a diisocyanate. The mixing time cannot be determined depending on the reaction temperature or the kind and amount of the components to be reacted, but may be, for example, 0.1 to 40 hours. Further, the obtained mixture (reactant) can be subjected to removal of a solvent or the like according to a known method.

如此所獲得之第1聚矽氧熱塑性-熱硬化性接著劑組合物於常溫下為固體,且於40℃以上顯示出熱塑性行為,進而於50℃以上表現出熱硬化性。 The first polyoxyxene thermoplastic-thermosetting adhesive composition thus obtained is solid at normal temperature, exhibits a thermoplastic behavior at 40° C. or higher, and exhibits thermosetting properties at 50° C. or higher.

具體而言,第1聚矽氧熱塑性-熱硬化性接著劑組合物之熱塑溫度較佳為40℃以上,進而較佳為80℃以上,又,亦較佳為200℃以下,進而較佳為150℃℃以下。再者,熱塑溫度係第1聚矽氧熱塑性-熱硬化性接著劑組合物顯示出熱塑性之溫度,具體而言,其係固體狀之第1聚矽氧熱塑性-熱硬化性接著劑組合物藉由加熱而軟化,並完全成為液體狀之溫度,實質上與軟化溫度相同。 Specifically, the thermoplastic temperature of the first polyoxyxene thermoplastic-thermosetting adhesive composition is preferably 40 ° C or higher, more preferably 80 ° C or higher, and still more preferably 200 ° C or lower, and further preferably. It is below 150 ° C ° C. Further, the thermoplastic temperature-based first polyoxyxene thermoplastic-thermosetting adhesive composition exhibits a thermoplastic temperature, specifically, a solid polyoxyx thermoplastic-thermosetting adhesive composition. The temperature which softens by heating and becomes completely liquid, is substantially the same as the softening temperature.

又,第1聚矽氧熱塑性-熱硬化性接著劑組合物之熱硬化溫度較佳為100℃以上,進而較佳為130℃以上,又,亦較佳為200℃以下。熱硬化溫度係第1聚矽氧熱塑性-熱硬化性接著劑組合物顯示出熱硬化性之溫度,具體而言,其係液體狀之第1聚矽氧熱塑性-熱硬化性接著劑組合物藉由加熱而硬化,並完全成為固體狀之溫度。 Further, the thermosetting temperature of the first polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition is preferably 100 ° C or higher, more preferably 130 ° C or higher, and still more preferably 200 ° C or lower. The thermosetting temperature is a temperature at which the first polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition exhibits thermosetting properties, and specifically, it is a liquid-like first polyfluorinated thermoplastic-thermosetting adhesive composition. It is hardened by heating and completely becomes a solid temperature.

第2聚矽氧熱塑性-熱硬化性接著劑組合物例如含有兩末端胺基型聚矽氧樹脂組合物、有機氫聚矽氧烷、二異氰酸酯、及矽氫化觸媒。 The second polyoxyl thermoplastic-thermosetting adhesive composition contains, for example, a two-terminal amine-based polyoxyxylene resin composition, an organic hydrogen polyoxyalkylene oxide, a diisocyanate, and a hydrazine hydrogenation catalyst.

作為第2聚矽氧熱塑性-熱硬化性接著劑組合物中之兩末端胺基型聚矽氧樹脂組合物,可列舉與以第1聚矽氧熱塑性-熱硬化性接著劑組合物所例示之兩末端胺基型聚矽氧樹脂組合物相同者。 The two-terminal amine-based polyoxyxene resin composition in the second polyoxyxene thermoplastic-thermosetting adhesive composition is exemplified as the first polyfluorinated thermoplastic-thermosetting adhesive composition. The both terminal amine-based polyoxyxylene resin compositions are the same.

兩末端胺基型聚矽氧樹脂組合物之含量於第2聚矽氧熱塑性-熱硬化性接著劑組合物中,例如為1~99.5質量%,較佳為80~99.5質量%。 The content of the both-end amine-based polyoxyxylene resin composition is, for example, 1 to 99.5% by mass, preferably 80 to 99.5% by mass, based on the second polyfluorinated thermoplastic-thermosetting adhesive composition.

有機氫聚矽氧烷係含有氫矽烷基(-SiH)之聚矽氧烷。更具體而言,有機氫聚矽氧烷係直鏈狀且鍵結於主鏈上之側鏈含有氫矽烷基之側鏈型有機氫聚矽氧烷、及/或於分子之兩末端含有氫矽烷基之兩末端型有機氫聚矽氧烷。 The organohydrogen polyoxyalkylene is a polyoxyalkylene containing a hydroquinonealkyl group (-SiH). More specifically, the organohydrogenpolyoxyalkylene is a side chain type organohydrogenpolyoxyalkylene having a linear chain and bonded to the main chain and having a hydroquinone group, and/or hydrogen at both ends of the molecule. A two-terminal organohydrogenpolyoxyalkylene group of a decyl group.

側鏈型有機氫聚矽氧烷例如係以下述式(3)表示。 The side chain type organic hydrogen polyoxyalkylene is represented, for example, by the following formula (3).

式(3): Equation (3):

(式中,E~H表示結構單元,E及H表示末端單元,F及G表示重複單元。R4表示一價烴基。又,e表示0以上之整數,f表示1以上之整數) (wherein E to H represent a structural unit, E and H represent a terminal unit, F and G represent a repeating unit, and R 4 represents a monovalent hydrocarbon group. Further, e represents an integer of 0 or more, and f represents an integer of 1 or more)

E~H構成側鏈型有機氫聚矽氧烷。 E~H constitutes a side chain type organic hydrogen polyoxyalkylene.

式(3)中,R4所表示之一價烴基可相同亦可不同,較佳為相同。 In the formula (3), the one-valent hydrocarbon group represented by R 4 may be the same or different, and is preferably the same.

作為R4所表示之一價烴基,可列舉與上述式(1)及(2)中以R1所表示之一價烴基相同者,較佳為列舉甲基、苯基,進而較佳為列舉甲基。 Examples of the monovalent hydrocarbon group represented by R 4 include the same ones as the ones represented by R 1 in the above formulas (1) and (2), and a methyl group and a phenyl group are preferred, and more preferably listed. methyl.

就反應性及穩定性之觀點而言,e較佳為表示1~10000之整數,進而較佳為表示1~5000之整數。 From the viewpoint of reactivity and stability, e preferably represents an integer of from 1 to 10,000, and more preferably represents an integer of from 1 to 5,000.

f較佳為2以上,又,就反應性及穩定性之觀點而言,較佳為表示1~10000之整數,進而較佳為表示1~1000之整數,就一面於室溫下以固體狀獲得聚矽氧樹脂組合物一面賦予柔軟性之觀點而言,尤佳為表示比e大之整數,最佳為表示100~1000之整數。 f is preferably 2 or more, and preferably represents an integer of 1 to 10000 from the viewpoint of reactivity and stability, and more preferably represents an integer of 1 to 1000, and is solid at room temperature. From the viewpoint of imparting flexibility to the polyoxyxene resin composition, it is particularly preferable to represent an integer larger than e, and it is preferably an integer of from 100 to 1,000.

作為側鏈型有機氫聚矽氧烷,例如可列舉:甲基氫矽氧烷、二甲基矽氧烷-共聚-甲基氫矽氧烷、乙基氫矽氧烷、甲基氫矽氧烷-共聚-甲基苯基矽氧烷等。 Examples of the side chain type organohydrogenpolyoxane include methylhydroquinoxane, dimethyloxane-co-methylhydroquinone, ethylhydroquinone, and methylhydroquinone. Alkane-co-methylphenyl fluorene and the like.

就穩定性及操作性之觀點而言,側鏈型有機氫聚矽氧烷之數量平均分子量例如為200~100000,較佳為200~80000。 The number average molecular weight of the side chain type organohydrogenpolysiloxane is, for example, from 200 to 100,000, preferably from 200 to 80,000, from the viewpoint of stability and workability.

側鏈型有機氫聚矽氧烷例如可依據公知之方法進行合成,或亦 可使用市售品(例如Gelest公司、信越化學工業公司製造)。 The side chain type organic hydrogen polyoxyalkylene can be synthesized, for example, according to a known method, or A commercially available product (for example, manufactured by Gelest Corporation, Shin-Etsu Chemical Co., Ltd.) can be used.

兩末端型有機氫聚矽氧烷例如係以下述式(4)表示。 The two-terminal type organic hydrogen polyoxyalkylene is represented, for example, by the following formula (4).

(式中,R~U表示結構單元,R及U表示末端單元,S及T表示重複單元。R5表示選自飽和烴基及芳香族烴基中之一價烴基。又,g表示0以上之整數,t表示0以上之整數) (wherein R to U represent a structural unit, R and U represent a terminal unit, and S and T represent a repeating unit. R 5 represents a monovalent hydrocarbon group selected from a saturated hydrocarbon group and an aromatic hydrocarbon group. Further, g represents an integer of 0 or more. , t represents an integer greater than 0)

R~U構成兩末端型有機氫聚矽氧烷。 R~U constitutes a two-terminal organic hydrogen polyoxyalkylene.

式(4)中,R5所表示之一價烴基可相同亦可不同,較佳為相同。 In the formula (4), the one-valent hydrocarbon group represented by R 5 may be the same or different, and is preferably the same.

作為R5所表示之一價烴基,可列舉與上述式(1)中以R1所表示之一價烴基相同者,作為一價烴基,較佳為列舉甲基、苯基,進而較佳為列舉甲基。 As one of the monovalent hydrocarbon group represented by R 5 include the same as the above-described formula (1) represented by R 1 to one of those monovalent hydrocarbon, monovalent hydrocarbon group, preferably a methyl group, a phenyl group, and further preferably List the methyl groups.

就反應性及穩定性之觀點而言,g較佳為表示0以上之整數,進而較佳為表示1~10000之整數,尤佳為表示1~5000之整數。 From the viewpoint of reactivity and stability, g is preferably an integer of 0 or more, more preferably an integer of 1 to 10,000, and particularly preferably an integer of 1 to 5,000.

就反應性及穩定性之觀點而言,t較佳為表示0以上之整數,進而較佳為表示1~10000之整數,尤佳為表示1~5000之整數。 From the viewpoint of reactivity and stability, t is preferably an integer of 0 or more, more preferably an integer of 1 to 10,000, and particularly preferably an integer of 1 to 5,000.

例如於t為1以上之情形時,兩末端型有機氫聚矽氧烷係於自主鏈分支之側鏈、及主鏈之兩末端均含有氫原子的側鏈-兩末端同時具有氫之有機聚矽氧烷,具體可列舉:兩末端為氫矽烷基之甲基氫聚矽氧烷、兩末端為氫矽烷基之(二甲基聚矽氧烷-共聚-甲基氫聚矽氧烷)、兩末端為氫矽烷基之乙基氫聚矽氧烷、兩末端為氫矽烷基之(甲基氫 聚矽氧烷-共聚-甲基苯基聚矽氧烷)等。又,於例如t為0之情形時,兩末端型有機氫聚矽氧烷係於自主鏈分支之側鏈不含氫原子而於主鏈之兩末端含有氫原子的側鏈不含氫/兩末端含有氫之有機聚矽氧烷,具體可列舉:兩末端為氫矽烷基之聚二甲基矽氧烷、兩末端為氫矽烷基之聚甲基苯基矽氧烷、兩末端為氫矽烷基之聚二苯基矽氧烷等。作為兩末端型有機氫聚矽氧烷,較佳為列舉式(5)所表示之側鏈不含氫/兩末端含有氫之有機聚矽氧烷。 For example, when t is 1 or more, the two-terminal organohydrogenpolyoxyalkylene is a side chain of an autonomous chain branch and a side chain containing a hydrogen atom at both ends of the main chain - both ends have an organic polymerization of hydrogen Specific examples of the oxane include a methylhydrogenpolyoxyalkylene having a hydroquinone at both ends and a hydroxanyl group at both ends (dimethylpolyoxane-co-methylhydropolysiloxane). Ethylhydropolysiloxane having a hydroquinone at both ends and hydroquinone at both ends (methyl hydrogen) Polyoxyalkylene-co-methylphenyl polyoxyalkylene) and the like. Further, for example, when t is 0, the two-terminal organohydrogenpolysiloxane is such that the side chain of the autonomous chain branch does not contain a hydrogen atom, and the side chain containing a hydrogen atom at both ends of the main chain does not contain hydrogen/two. The organic polyoxosiloxane containing a hydrogen at the end may specifically be a polydimethyl methoxy alkane having a hydroquinone at both ends, a polymethylphenyl siloxane having a hydroxanyl group at both ends, and a hydroxane at both ends. Polydiphenyl sulfoxane and the like. As the two-terminal organohydrogenpolysiloxane, it is preferred that the side chain represented by the formula (5) contains no hydrogen/organopolyoxyalkylene having hydrogen at both terminals.

(式中,R5表示選自飽和烴基及芳香族烴基中之一價烴基。又,g表示1以上之整數) (wherein R 5 represents a monovalent hydrocarbon group selected from the group consisting of a saturated hydrocarbon group and an aromatic hydrocarbon group. Further, g represents an integer of 1 or more)

式(5)中,R5所表示之一價烴基可相同亦可不同,較佳為相同。 In the formula (5), the one-valent hydrocarbon group represented by R 5 may be the same or different, and is preferably the same.

式(5)中,R5表示與上述相同含義,又,g表示與上述相同含義。 In the formula (5), R 5 represents the same meaning as described above, and g represents the same meaning as described above.

就穩定性及操作性之觀點而言,兩末端型有機氫聚矽氧烷之數量平均分子量例如為100~30000,較佳為100~10000。 The number average molecular weight of the two-terminal organohydrogenpolysiloxane is, for example, from 100 to 30,000, preferably from 100 to 10,000, from the viewpoint of stability and workability.

兩末端型有機氫聚矽氧烷例如可依據公知之方法進行合成,或亦可使用市售品。 The two-terminal type organic hydrogen polyoxyalkylene can be synthesized, for example, according to a known method, or a commercially available product can also be used.

於有機氫聚矽氧烷中,氫矽烷基之含量具體而言例如為0.01mmol/g以上,較佳為0.05mmol/g以上,又,例如亦為20mmol/g以下,較佳為15mmol/g以下。該氫矽烷基含量係利用1H-NMR由氫矽烷基與甲基之積分值而算出。 The content of the hydroquinone group in the organohydrogen polyoxyalkylene is, for example, specifically 0.01 mmol/g or more, preferably 0.05 mmol/g or more, and further, for example, 20 mmol/g or less, preferably 15 mmol/g. the following. The hydroquinone content was calculated from the integral value of the hydroquinone group and the methyl group by 1 H-NMR.

有機氫聚矽氧烷例如可依據公知之方法進行合成,或亦可使用市售品(例如Gelest公司、信越化學工業公司製造)。 The organic hydrogen polyoxyalkylene can be synthesized, for example, according to a known method, or a commercially available product (for example, manufactured by Gelest Corporation, Shin-Etsu Chemical Co., Ltd.) can also be used.

有機氫聚矽氧烷之含量於第2聚矽氧熱塑性-熱硬化性接著劑組合物中,例如為0.0001質量%以上,較佳為0.001質量%以上,又,例如亦為90質量%以下,較佳為50質量%以下。 The content of the organic hydrogen polyoxyalkylene oxide is, for example, 0.0001% by mass or more, preferably 0.001% by mass or more, and, for example, 90% by mass or less, in the second polyfluorinated thermoplastic-thermosetting adhesive composition. It is preferably 50% by mass or less.

又,就使兩末端胺基型聚矽氧樹脂組合物之烯基與有機氫聚矽氧烷之SiH基(氫矽烷基)恰如其分地進行反應之觀點而言,兩末端胺基型聚矽氧樹脂組合物與有機氫聚矽氧烷之質量比,官能基之莫耳比(烯基/SiH基)例如為1/1~0.1/1,較佳為1/1~0.2/1,進而較佳為1/1~0.5/1,尤佳為實質上等量(1/1)。 Further, from the viewpoint of reacting the alkenyl group of the both terminal amine-based polyoxyxylene resin composition with the SiH group (hydroindolyl group) of the organic hydrogen polyoxyalkylene, the two-terminal amine-based polyoxyl The mass ratio of the resin composition to the organohydrogenpolyoxane, and the molar ratio (alkenyl/SiH group) of the functional group is, for example, 1/1 to 0.1/1, preferably 1/1 to 0.2/1, and further Good is 1/1~0.5/1, especially preferably equal (1/1).

作為二異氰酸酯,可列舉與以第1聚矽氧熱塑性-熱硬化性接著劑組合物所例示之二異氰酸酯相同者。 The diisocyanate may be the same as the diisocyanate exemplified as the first polyfluorinated thermoplastic-thermosetting adhesive composition.

二異氰酸酯之含量於第2聚矽氧熱塑性-熱硬化性接著劑組合物中,例如為1.0×10-5質量%以上,又,例如為20質量%以下,較佳為10質量%以下。 The content of the diisocyanate is, for example, 1.0 × 10 -5 mass% or more, and is, for example, 20 mass% or less, preferably 10 mass% or less, in the second polyoxyl thermoplastic-thermosetting adhesive composition.

又,就使兩末端胺基型聚矽氧樹脂組合物之胺基與二異氰酸酯之異氰酸酯基恰如其分地進行反應之觀點而言,兩末端胺基型聚矽氧樹脂組合物與二異氰酸酯之質量比,官能基之莫耳比(胺基/異氰酸酯基)例如為1/1~0.1/1,較佳為1/1~0.2/1,進而較佳為1/1~0.5/1,尤佳為實質上等量(1/1)。 Further, in terms of the mass ratio of the amine group of the both terminal amine-based polyoxyxylene resin composition to the isocyanate group of the diisocyanate, the mass ratio of the terminal amino group-type polyoxyxyl resin composition to the diisocyanate The molar ratio of the functional group (amino/isocyanate group) is, for example, 1/1 to 0.1/1, preferably 1/1 to 0.2/1, more preferably 1/1 to 0.5/1, and particularly preferably Essentially equal (1/1).

作為矽氫化觸媒,只要為可催化兩末端胺基型聚矽氧樹脂組合物之烯基與有機氫聚矽氧烷之氫矽烷基之矽氫化反應之化合物,則並無特別限定,可列舉:例如鉑黑、氯化鉑、氯鉑酸、鉑-烯烴錯合物、鉑-羰基錯合物、鉑-乙酸乙醯酯等鉑觸媒,例如鈀觸媒,例如銠觸媒等。 The ruthenium hydrogenation catalyst is not particularly limited as long as it is a compound which can catalyze the hydrogenation reaction of an alkenyl group of a two-terminal amine-based polyoxyxylene resin composition with a hydrofluorenyl group of an organic hydrogen polyoxyalkylene oxide, and is not particularly limited. For example, a platinum catalyst such as platinum black, platinum chloride, chloroplatinic acid, a platinum-olefin complex, a platinum-carbonyl complex, or a platinum-acetic acid acetate such as a palladium catalyst such as a rhodium catalyst.

於第2聚矽氧熱塑性-熱硬化性接著劑組合物中之矽氫化觸媒之含 量,例如於使用鉑觸媒之情形時,就反應速度之觀點而言,相對於有機氫聚矽氧烷100質量份,鉑含量例如為1.0×10-10質量份以上,較佳為1.0×10-8質量份以上,又,例如亦為0.5質量份以下,較佳為1.0×10-3質量份以下。 The content of the ruthenium hydrogenation catalyst in the second polyoxyxene thermoplastic-thermosetting adhesive composition, for example, in the case of using a platinum catalyst, relative to the organic hydrogen polyoxymethane from the viewpoint of the reaction rate 100 parts by mass, the platinum content is, for example, 1.0 × 10 -10 parts by mass or more, preferably 1.0 × 10 -8 parts by mass or more, and further, for example, 0.5 parts by mass or less, preferably 1.0 × 10 -3 parts by mass or less. .

並且,若第2聚矽氧熱塑性-熱硬化性接著劑組合物係含有兩末端胺基型聚矽氧樹脂組合物、有機氫聚矽氧烷、二異氰酸酯、及矽氫化觸媒之各成分者,則並無特別限定地製備。 Further, the second polyoxy-thermoplastic thermosetting adhesive composition contains a component of a two-terminal amine-based polyoxyxylene resin composition, an organic hydrogen polyoxyalkylene oxide, a diisocyanate, and a hydrogenation catalyst. It is prepared without particular limitation.

就根據異氰酸酯基之反應與矽氫化反應之各反應機制而適當選擇反應溫度及時間,使反應進行及結束之觀點而言,第2聚矽氧熱塑性-熱硬化性接著劑組合物亦可預先混合與異氰酸酯基之反應相關之成分再混合與矽氫化反應相關之成分。 The second polyoxyxene thermoplastic-thermosetting adhesive composition may be premixed in view of the reaction temperature and time depending on the respective reaction mechanisms of the reaction between the isocyanate group and the hydrogenation reaction, and the reaction proceeds and ends. The components associated with the reaction of the isocyanate groups are remixed with the components associated with the rhodium hydrogenation reaction.

與異氰酸酯基之反應相關之成分之混合可藉由例如於0℃以上、較佳為10℃以上,又,例如為100℃以下、較佳為60℃以下,將兩末端胺基型聚矽氧樹脂組合物及二異氰酸酯、視需要之有機溶劑等添加劑例如攪拌0.1~40小時而實施。 The mixing of the components related to the reaction of the isocyanate group can be carried out by, for example, 0 ° C or higher, preferably 10 ° C or higher, and, for example, 100 ° C or lower, preferably 60 ° C or lower. The resin composition, the diisocyanate, and an optional organic solvent are stirred, for example, for 0.1 to 40 hours.

作為有機溶劑,並無特別限定,就提高各成分之相溶性之觀點而言,較佳為列舉甲基乙基酮等酮。 The organic solvent is not particularly limited, and from the viewpoint of improving the compatibility of the respective components, a ketone such as methyl ethyl ketone is preferred.

再者,亦可藉由上述混合開始進行兩末端胺基型聚矽氧樹脂組合物之胺基與二異氰酸酯之異氰酸酯基之反應之一部分,反應之進度可藉由1H-NMR測定,根據源自胺基之波峰之消失程度進行確認。 Further, a part of the reaction between the amine group of the two-terminal amine-based polyoxyxylene resin composition and the isocyanate group of the diisocyanate may be started by the above mixing, and the progress of the reaction may be determined by 1 H-NMR, according to the source. The degree of disappearance of the peak of the amine group was confirmed.

其後,作為與矽氫化反應相關之成分,係將有機氫聚矽氧烷及矽氫化觸媒調配於與上述異氰酸酯基之反應相關之成分之混合物中。 Thereafter, as a component related to the hydrogenation reaction of the hydrazine, an organic hydrogen polyoxyalkylene oxide and a hydrazine hydrogenation catalyst are blended in a mixture of components related to the reaction of the above isocyanate group.

由於第2聚矽氧熱塑性-熱硬化性接著劑組合物可藉由利用其後之加熱而產生上述矽氫化反應,獲得硬化物(成形物),故而只要將與矽氫化反應相關之成分均勻混合於與上述異氰酸酯基之反應相關之成分之混合物中即可,則混合方法並無特別限定。 Since the second polyoxyl thermoplastic-thermosetting adhesive composition can produce the above-mentioned hydrogenation reaction by using the subsequent heating to obtain a cured product (shaped product), the components related to the hydrogenation reaction of the hydrogen are uniformly mixed. The mixing method is not particularly limited as long as it is a mixture of the components related to the reaction of the above isocyanate groups.

具體而言,於兩末端胺基型聚矽氧樹脂組合物及二異氰酸酯之混合物中調配有機氫聚矽氧烷及矽氫化觸媒並進行攪拌混合。混合時間係根據反應溫度或供於反應之成分之種類、量而定無法一概決定,但例如可為0.1~40小時。作為混合方法,只要將各成分均勻混合則並無特別限定。再者,所獲得之混合物可依據公知之方法去除溶劑等。 Specifically, an organic hydrogen polyoxyalkylene oxide and a ruthenium hydrogenation catalyst are blended in a mixture of a two-terminal amine-based polyoxyxylene resin composition and a diisocyanate, followed by stirring and mixing. The mixing time cannot be determined depending on the reaction temperature or the kind and amount of the components to be reacted, but may be, for example, 0.1 to 40 hours. The mixing method is not particularly limited as long as the components are uniformly mixed. Further, the obtained mixture can be subjected to removal of a solvent or the like according to a known method.

如此所獲得之第2聚矽氧熱塑性-熱硬化性接著劑組合物於常溫下為固體,於40℃以上顯示出熱塑性行為,進而於50℃以上表現出熱硬化性。 The second polyoxyxene thermoplastic-thermosetting adhesive composition thus obtained is solid at normal temperature, exhibits a thermoplastic behavior at 40° C. or higher, and exhibits thermosetting properties at 50° C. or higher.

具體而言,第2聚矽氧熱塑性-熱硬化性接著劑組合物之熱塑溫度例如為40~200℃,較佳為40~150℃。 Specifically, the thermoplastic temperature of the second polyoxyxene thermoplastic-thermosetting adhesive composition is, for example, 40 to 200 ° C, preferably 40 to 150 ° C.

又,於接下來之熱硬化溫度下,第2聚矽氧熱塑性-熱硬化性接著劑組合物進行矽氫化反應,而使第2聚矽氧熱塑性-熱硬化性接著劑組合物熱硬化。 Further, at the next thermal curing temperature, the second polyfluorene-thermoplastic thermosetting adhesive composition is subjected to a hydrazine hydrogenation reaction to thermally cure the second polyfluorene oxide thermoplastic-thermosetting adhesive composition.

熱硬化溫度例如為100~200℃,較佳為130~200℃。再者,矽氫化反應之進度可藉由1H-NMR測定,根據源自兩末端胺基型聚矽氧樹脂組合物之胺基之訊號強度進行確認,於訊號消失之階段視為反應結束。 The heat curing temperature is, for example, 100 to 200 ° C, preferably 130 to 200 ° C. Further, the progress of the hydrogenation reaction of hydrazine can be confirmed by 1 H-NMR, and the signal intensity derived from the amine group derived from the amine-based polyoxyxylene resin composition at both ends is confirmed, and the reaction is regarded as the end of the reaction at the stage where the signal disappears.

第3聚矽氧熱塑性-熱硬化性接著劑組合物可藉由於矽氫化觸媒之存在下使籠型八倍半矽氧烷與含有烯基之聚矽氧烷進行反應而獲得。 The third polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition can be obtained by reacting a cage sesquioxaxane with an alkenyl group-containing polyoxyalkylene in the presence of a rhodium hydrogenation catalyst.

籠型八倍半矽氧烷係3官能聚矽氧單體之八聚物,具體而言,具有8個下述式(6)所表示之基,式(6): The octamer of a cage-type sesqui-sesquioxanes-based trifunctional polyoxyl monomer, specifically, has 8 groups represented by the following formula (6), and the formula (6):

(式中,R6表示一價烴基,R7表示氫或一價烴基。其中,以籠型八倍半矽氧烷整體之平均值計,R7之一價烴基:氫之莫耳比在6.5:1.5~5.5:2.5之範圍內) (wherein R 6 represents a monovalent hydrocarbon group, and R 7 represents a hydrogen or a monovalent hydrocarbon group. Among them, the average value of the R 7 one-valent hydrocarbon group: hydrogen molar ratio is based on the average of the cage-type sesquioxane as a whole. 6.5: within the range of 1.5~5.5:2.5)

更具體而言,其係以下述式(7)表示。 More specifically, it is represented by the following formula (7).

(式中,R6及R7表示與上述相同含義。又,R7之一價烴基:氫之莫耳比與上述相同) (wherein R 6 and R 7 have the same meanings as defined above. Further, the molar ratio of the one-valent hydrocarbon group of R 7 : hydrogen is the same as above)

上述式(6)及(7)中,R6所表示之一價烴基例如為飽和烴基或芳香族烴基。 In the above formulae (6) and (7), the monovalent hydrocarbon group represented by R 6 is, for example, a saturated hydrocarbon group or an aromatic hydrocarbon group.

作為飽和烴基,例如可列舉:直鏈狀飽和烴基(例如甲基、乙 基、丙基、丁基、戊基、己基等碳數1~6之烷基)、支鏈狀飽和烴基(例如異丙基、異丁基等碳數3~6之烷基)、環狀飽和烴基(例如環己基等碳數3~6之環烷基)等。 Examples of the saturated hydrocarbon group include a linear saturated hydrocarbon group (for example, methyl group, ethyl group B). a base having a carbon number of 1 to 6 such as a propyl group, a butyl group, a pentyl group or a hexyl group, or a branched saturated hydrocarbon group (for example, an alkyl group having 3 to 6 carbon atoms such as an isopropyl group or an isobutyl group) or a cyclic group A saturated hydrocarbon group (for example, a cycloalkyl group having 3 to 6 carbon atoms such as a cyclohexyl group).

作為芳香族烴基,例如可列舉:苯基、苄基、甲苯基等碳數6~8之芳基等。 Examples of the aromatic hydrocarbon group include an aryl group having 6 to 8 carbon atoms such as a phenyl group, a benzyl group and a tolyl group.

一價烴基之碳數例如為1~8,較佳為1~6。 The carbon number of the monovalent hydrocarbon group is, for example, 1 to 8, preferably 1 to 6.

R6可相同亦可不同,較佳為相同。 R 6 may be identical or different, preferably the same.

作為一價烴基,就製備之容易性及熱穩定性之觀點而言,較佳為列舉飽和之直鏈狀烴基,進而較佳為列舉碳數1~6之烷基,尤佳為列舉甲基。 The monovalent hydrocarbon group is preferably a saturated linear hydrocarbon group from the viewpoint of easiness of preparation and thermal stability, and more preferably an alkyl group having 1 to 6 carbon atoms, particularly preferably a methyl group. .

上述式(6)及(7)中,作為R7所表示之一價烴基,可列舉與上述R1所表示之一價烴基相同者。較佳為列舉甲基。 In the above formulae (6) and (7), the one-valent hydrocarbon group represented by R 7 may be the same as the one-valent hydrocarbon group represented by the above R 1 . Preferably, a methyl group is exemplified.

式(7)中之R7之一價烴基:氫之莫耳比以籠型八倍半矽氧烷整體之平均值計,在6.5:1.5~5.5:2.5之範圍內,較佳在6.0:2.0~5.5:2.5之範圍內。 The one-valent hydrocarbon group of R 7 in the formula (7): the molar ratio of hydrogen is in the range of 6.5:1.5 to 5.5:2.5, preferably 6.0, based on the average value of the cage-type sesquioxane. Within the range of 2.0~5.5:2.5.

即,於1分子籠型八倍半矽氧烷中,形成1.5~2.5個(具體為2個)上述式(6)所表示之基,較佳為形成2~2.5個(具體為2個)氫矽烷基(-SiH)。 That is, 1.5 to 2.5 (specifically 2) groups represented by the above formula (6) are formed in one molecule of the cage octapestane, and preferably 2 to 2.5 (specifically 2) are formed. Hydroquinone (-SiH).

於上述R7之一價烴基:氫之莫耳比超過6.5/1.5(=6.5:1.5)之情形時(例如7/1(=7:1)),氫矽烷基之莫耳數過少,因此,存在籠型八倍半矽氧烷對於含有烯基之聚矽氧烷之反應程度過度降低,所獲得之第3聚矽氧熱塑性-熱硬化性接著劑組合物之分子量降低,無法獲得固體狀之聚矽氧熱塑性-熱硬化性接著劑組合物之情形。 In the case where the above-mentioned R 7 one-valent hydrocarbon group: hydrogen molar ratio exceeds 6.5/1.5 (= 6.5: 1.5) (for example, 7/1 (=7:1)), the number of moles of hydroquinone is too small, so The degree of reaction of the cage-type sesquioxaxane with the alkenyl group-containing polyoxyalkylene is excessively lowered, and the molecular weight of the obtained third polyoxyxa thermoplastic-thermosetting adhesive composition is lowered, and a solid state cannot be obtained. The case of a polyoxyl thermoplastic-thermosetting adhesive composition.

另一方面,於上述R7之一價烴基:氫之莫耳比未達5.5/2.5(=5.5:2.5)之情形(例如5/3(=5:3))時,籠型八倍半矽氧烷之氫矽烷基之莫耳數過多,因此,存在因籠型八倍半矽氧烷對於含有烯基之聚矽 氧烷之反應程度過度增大而導致第3聚矽氧熱塑性-熱硬化性接著劑組合物不會顯示出熱塑性之情形。 On the other hand, to one of the divalent hydrocarbon group having 7 R: hydrogen molar ratio of less than 5.5 / 2.5 (= 5.5: 2.5) of the case (e.g., 5/3 (= 5: 3)), the cage octasilsesquioxane The hydrohaloalkyl group of the decane has an excessive number of moles, and therefore, the third polyfluorene thermoplastic-heat is caused by an excessive increase in the degree of reaction of the cage sesquioxane to the alkenyl group-containing polyoxyalkylene. The hardenable adhesive composition does not exhibit thermoplasticity.

作為上述籠型八倍半矽氧烷,具體而言,例如可列舉:上述式(6)及(7)中,R6為甲基、R7為甲基或氫且以籠型八倍半矽氧烷總體之平均值計,R7之甲基:氫之莫耳比為5.5:2.5、6:2或6.5:1.5的籠型八倍半矽氧烷等。 Specific examples of the above-mentioned cage-type sesquioxaxane include, in the above formulae (6) and (7), R 6 is a methyl group, R 7 is a methyl group or hydrogen, and the cage type is eight and a half times. The average of the total amount of the decane, the methyl group of R 7 : a cage type octapestane having a molar ratio of hydrogen of 5.5:2.5, 6:2 or 6.5:1.5.

上述式(7)所表示之籠型八倍半矽氧烷例如可根據公知之方法(例如依據日本專利特開2007-246880號公報等之記載)進行合成。 The cage type sesquisestasiloxane represented by the above formula (7) can be synthesized, for example, according to a known method (for example, according to JP-A-2007-246880).

具體而言,於甲醇等醇及/或水與觸媒之存在下使四烷氧基矽烷(四乙氧基矽烷等)進行反應,合成八(倍半矽氧烷)骨架(式(7)中,除式(6)之基以外之部分),其後,以與上述R7之一價烴基:氫之莫耳比對應之調配比率調配二烷基氯矽烷(二甲基氯矽烷等)及三烷基氯矽烷(三甲基氯矽烷等),使與八(倍半矽氧烷)骨架之矽原子鍵結之烷氧基(乙氧基等)與二烷基氯矽烷及三烷基氯矽烷進行反應。反應後,視需要純化反應物。藉此,可獲得籠型八倍半矽氧烷。 Specifically, a tetraalkoxy decane (such as tetraethoxy decane) is reacted in the presence of an alcohol such as methanol and/or water and a catalyst to synthesize an octa (sesquioxane) skeleton (formula (7) a portion other than the group of the formula (6), and thereafter, a dialkyl chlorodecane (dimethyl chlorodecane, etc.) is blended at a ratio corresponding to the above-mentioned R 7 one-valent hydrocarbon group: hydrogen molar ratio. And a trialkyl chlorodecane (trimethylchloromethane, etc.), an alkoxy group (ethoxy group, etc.) bonded to a ruthenium atom of an octa sesquioxane skeleton, and a dialkyl chlorodecane and a triane The chloropurane is reacted. After the reaction, the reactants were purified as needed. Thereby, cage type sesquioxaxane can be obtained.

再者,籠型八倍半矽氧烷亦可使用市售品。 Further, a commercially available product can also be used as the cage type sesquioxane.

含有烯基之聚矽氧烷係於分子之兩末端含有烯基的兩末端含有烯基之聚矽氧烷,具體係以下述式(8)表示。 The alkenyl group-containing polyoxyalkylene is a polyoxyalkylene group having an alkenyl group at both ends of the molecule and having an alkenyl group, and is specifically represented by the following formula (8).

(式中,R8表示一價烴基,R9表示烯基。又,i表示1以上之整數) (wherein R 8 represents a monovalent hydrocarbon group, and R 9 represents an alkenyl group. Further, i represents an integer of 1 or more)

式(8)中,R8所表示之一價烴基可相同或亦可不同,較佳為相同。 In the formula (8), the one-valent hydrocarbon group represented by R 8 may be the same or different, and is preferably the same.

作為R8所表示之一價烴基,可列舉與上述式(6)及(7)中以R6所表示之一價烴基相同者,較佳為列舉甲基、苯基,進而較佳為列舉甲基。 Examples of the monovalent hydrocarbon group represented by R 8 include the same ones as the ones represented by R 6 in the above formulae (6) and (7), and a methyl group or a phenyl group is preferred, and more preferably methyl.

式(8)中,作為R9所表示之烯基,例如可列舉經取代或未經取代之烯基,較佳為列舉未經取代之烯基。 In the formula (8), examples of the alkenyl group represented by R 9 include a substituted or unsubstituted alkenyl group, and preferably an unsubstituted alkenyl group.

作為此種烯基,例如可列舉:乙烯基、烯丙基、丙烯基、丁烯基、戊烯基等碳數2~10之烯基。 Examples of such an alkenyl group include an alkenyl group having 2 to 10 carbon atoms such as a vinyl group, an allyl group, a propenyl group, a butenyl group or a pentenyl group.

烯基之碳數例如為2~10,較佳為2~5。 The number of carbon atoms of the alkenyl group is, for example, 2 to 10, preferably 2 to 5.

R9可相同亦可不同,較佳為相同。 R 9 may be the same or different, preferably the same.

作為烯基,就與籠型八倍半矽氧烷之氫矽烷基之反應性之觀點而言,較佳為列舉碳數2~5之烯基,進而較佳為列舉乙烯基。 The alkenyl group is preferably an alkyl group having 2 to 5 carbon atoms, and more preferably a vinyl group, from the viewpoint of reactivity with the hydroalkylene group of the cage sesquioxaxane.

就反應性及穩定性之觀點而言,i較佳為表示1~5000之整數,進而較佳為表示1~1000之整數。 From the viewpoint of reactivity and stability, i preferably represents an integer of from 1 to 5,000, and more preferably represents an integer of from 1 to 1,000.

就安全性及操作性之觀點而言,上述式(8)所表示之含有烯基之聚矽氧烷之數量平均分子量例如為100以上,較佳為300以上,又,例如亦為10000以下,較佳為5000以下。 The number average molecular weight of the alkenyl group-containing polyoxyalkylene represented by the above formula (8) is, for example, 100 or more, preferably 300 or more, and, for example, 10,000 or less, from the viewpoint of safety and handling. It is preferably 5,000 or less.

上述式(8)所表示之含有烯基之聚矽氧烷例如可依據公知之方法進行合成,或亦可使用市售品(例如Gelest公司製造)。 The alkenyl group-containing polyoxyalkylene represented by the above formula (8) can be synthesized, for example, according to a known method, or a commercially available product (for example, manufactured by Gelest Co., Ltd.) can also be used.

作為矽氫化觸媒,可列舉與第2聚矽氧熱塑性-熱硬化性接著劑組合物中所例示之矽氫化觸媒相同者,就相溶性及透明性之觀點而言,較佳為列舉鉑觸媒,進而較佳為列舉鉑-烯烴錯合物,具體可列舉:鉑-1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷錯合物等鉑-二乙烯基矽氧烷錯合物等。 The rhodium hydrogenation catalyst is the same as the rhodium hydrogenation catalyst exemplified in the second polyfluorinated thermoplastic thermosetting adhesive composition, and from the viewpoint of compatibility and transparency, platinum is preferably used. Further, the catalyst is preferably a platinum-olefin complex, and specific examples thereof include platinum such as platinum-1,3-divinyl-1,1,3,3-tetramethyldioxane complex. Divinyl oxime complex and the like.

再者,亦可將矽氫化觸媒製備為公知之溶劑(甲苯等)溶液。 Further, a ruthenium hydrogenation catalyst can also be prepared as a known solvent (toluene or the like) solution.

矽氫化觸媒(固體成分)之調配比率係相對於籠型八倍半矽氧烷及含有烯基之聚矽氧烷之總量100質量份,例如為1.0×10-10質量份以上,較佳為1.0×10-8質量份以上,又,例如為3質量份以下,較佳為1質量份以下。 The blending ratio of the rhodium hydrogenation catalyst (solid content) is 100 parts by mass based on the total amount of the cage sesquioxane and the alkenyl group-containing polyoxane, and is, for example, 1.0 × 10 -10 parts by mass or more. It is preferably 1.0 × 10 -8 parts by mass or more, and is, for example, 3 parts by mass or less, preferably 1 part by mass or less.

並且,於矽氫化觸媒之存在下,以籠型八倍半矽氧烷之氫矽烷基之莫耳數變得比含有烯基之聚矽氧烷之烯基之莫耳數多(過量)之方式使籠型八倍半矽氧烷與含有烯基之聚矽氧烷進行反應。 Further, in the presence of a rhodium hydrogenation catalyst, the molar number of the hydrofluorenyl group of the cage-type sesquioxaxane becomes more (excess) than the number of moles of the alkenyl group of the alkenyl group-containing polyoxyalkylene. The method comprises reacting a cage of sesquioxaxane with an alkenyl group-containing polyoxyalkylene.

烯基與氫矽烷基之莫耳比(烯基之莫耳數/氫矽烷基之莫耳數)未達1,例如為0.10~0.99,較佳為0.20~0.99,進而較佳為0.50~0.99。 The molar ratio of the alkenyl group to the hydrofluorenyl group (the molar number of the alkenyl group/the molar number of the hydrofluorenyl group) is less than 1, and is, for example, 0.10 to 0.99, preferably 0.20 to 0.99, and more preferably 0.50 to 0.99. .

另一方面,於上述莫耳比超過上述範圍之情形時,氫矽烷基變得比烯基少,於該情形時,存在反應後未殘存過量之氫矽烷基而並未對第3聚矽氧熱塑性-熱硬化性接著劑組合物賦予熱硬化性之情形。 On the other hand, when the above molar ratio exceeds the above range, the hydrofluorenyl group becomes less than the alkenyl group, and in this case, there is no excess hydroquinone group remaining after the reaction and no third polyfluorene oxide is present. The thermoplastic-thermosetting adhesive composition imparts thermosetting properties.

並且,為了使上述籠型八倍半矽氧烷與含有烯基之聚矽氧烷進行反應,以上述調配比率將該等與矽氫化觸媒及溶劑一併進行調配,其後視需要對該等進行加熱。 Further, in order to react the above-mentioned cage sesquioxane with a polyoxyalkylene group containing an alkenyl group, the above-mentioned compounding ratio is used together with the hydrazine hydrogenation catalyst and the solvent, and then it is necessary to Wait for heating.

作為溶劑,可列舉:例如甲苯等芳香族烴,例如己烷等脂肪族烴,例如乙酸乙酯等酯等。就提高各成分之相溶性之觀點而言,較佳為列舉芳香族烴,進而較佳為列舉甲苯。 The solvent may, for example, be an aromatic hydrocarbon such as toluene, or an aliphatic hydrocarbon such as hexane, or an ester such as ethyl acetate. From the viewpoint of improving the compatibility of the respective components, an aromatic hydrocarbon is preferred, and toluene is more preferred.

反應溫度例如為0℃以上,較佳為20℃以上,又,例如為100℃以下,較佳為80℃以下,反應時間例如為0.5~96小時。 The reaction temperature is, for example, 0 ° C or higher, preferably 20 ° C or higher, and further, for example, 100 ° C or lower, preferably 80 ° C or lower, and the reaction time is, for example, 0.5 to 96 hours.

藉此,使籠型八倍半矽氧烷之氫矽烷基與含有烯基之聚矽氧烷之烯基進行矽氫化反應。 Thereby, the hydroquinone alkyl group of the cage sesquioxanes and the alkenyl group of the alkenyl group-containing polyoxyalkylene are subjected to a hydrazine hydrogenation reaction.

再者,矽氫化反應之程度可藉由1H-NMR測定,根據源自含有烯基之聚矽氧烷之烯基之訊號強度進行確認,將該訊號消失時視為矽氫化反應結束。 Further, the degree of the hydrogenation reaction of hydrazine can be confirmed by 1 H-NMR, and the signal intensity derived from the alkenyl group derived from the alkenyl group-containing polyoxyalkylene can be confirmed, and when the signal disappears, it is regarded as the end of the hydrogenation reaction.

於上述矽氫化反應中,以氫矽烷基之莫耳數與烯基之莫耳數相比成為過量之方式使籠型八倍半矽氧烷與含有烯基之聚矽氧烷進行反應,故而於其反應後會殘存過量之氫矽烷基,該過量之氫矽烷基藉由其後之加熱(例如為100~200℃之加熱)而與空氣中之水分進行水解及縮合反應而彼此鍵結(三維交聯),藉此,對第3聚矽氧熱塑性-熱硬化性接著劑組合物賦予熱硬化性。 In the above hydrogenation reaction, the caged sesquioxanes are reacted with the alkenyl group-containing polyoxane in such a manner that the mole number of the hydroquinone group is excessive compared with the mole number of the alkenyl group. After the reaction, an excess of hydroquinone is left, and the excess hydroquinone is bonded to each other by hydrolysis and condensation reaction with water in the air by heating (for example, heating at 100 to 200 ° C) ( By three-dimensional cross-linking, the third polyfluorene-thermoplastic thermoplastic-thermosetting adhesive composition is given thermosetting property.

藉此,可獲得第3聚矽氧熱塑性-熱硬化性接著劑組合物。 Thereby, a third polyoxyl thermoplastic-thermosetting adhesive composition can be obtained.

所獲得之第3聚矽氧熱塑性-熱硬化性接著劑組合物為固體狀。因籠型八倍半矽氧烷之位阻而導致含有烯基之聚矽氧烷之運動性降低,因此,以固體狀之形式獲得第3聚矽氧熱塑性-熱硬化性接著劑組合物。 The obtained third polyoxyxene thermoplastic-thermosetting adhesive composition was a solid. The occlusion resistance of the alkenyl group-containing polyoxyalkylene is lowered by the steric hindrance of the cage sesquioxane, and therefore, the third polyoxyl thermoplastic-thermosetting adhesive composition is obtained as a solid.

第3聚矽氧熱塑性-熱硬化性接著劑組合物之熱塑溫度例如為40℃以上,較佳為50℃以上,又,例如亦為100℃以下,較佳為90℃以下。 The thermoplastic temperature of the third polyoxyl thermoplastic-thermosetting adhesive composition is, for example, 40 ° C or higher, preferably 50 ° C or higher, and is also, for example, 100 ° C or lower, preferably 90 ° C or lower.

經暫時塑化之第3聚矽氧熱塑性-熱硬化性接著劑組合物之熱硬化性係根據藉由其後之加熱,使過量之氫矽烷基進行水解及縮合反應而彼此鍵結(三維交聯)來表現。 The thermosetting property of the temporarily plasticized third polyoxyl thermoplastic-thermosetting adhesive composition is bonded to each other by hydrolysis and condensation reaction of excess hydroquinone by heating by subsequent heating (three-dimensional intersection) Union) to performance.

又,第3聚矽氧熱塑性-熱硬化性接著劑組合物之熱硬化溫度例如為150℃以上,較佳為180℃以上,又,例如亦為300℃以下,較佳為250℃以下。 Further, the thermosetting temperature of the third polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition is, for example, 150 ° C or higher, preferably 180 ° C or higher, and is, for example, 300 ° C or lower, preferably 250 ° C or lower.

第4聚矽氧熱塑性-熱硬化性接著劑組合物含有籠型八倍半矽氧烷、含有烯基之聚矽氧烷、矽氫化觸媒及含有羥基之聚矽氧烷。 The fourth polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition contains a cage-type sesquioxane alkane, an alkenyl group-containing polyoxane, a hydrazine hydrogenation catalyst, and a hydroxyl group-containing polyoxyalkylene.

於第4聚矽氧熱塑性-熱硬化性接著劑組合物中之籠型八倍半矽氧烷、含有烯基之聚矽氧烷及矽氫化觸媒可分別列舉與第3聚矽氧熱塑性-熱硬化性接著劑組合物中所例示之籠型八倍半矽氧烷、第3聚矽氧熱塑性-熱硬化性接著劑組合物中所例示之含有烯基之聚矽氧烷、及 第2聚矽氧熱塑性-熱硬化性接著劑組合物中所例示之矽氫化觸媒相同者。 The cage type sesquioxaxane, the alkenyl group-containing polyoxane and the hydrazine hydrogenation catalyst in the fourth polyoxy-thermoplastic thermosetting adhesive composition may be exemplified by the third polyoxyl thermoplastic- The alkenyl-containing polyoxyalkylene exemplified in the cage-type sesquioxaxane and the third polyfluorene thermoplastic-thermosetting adhesive composition exemplified in the thermosetting adhesive composition, and The ruthenium hydrogenation catalyst exemplified in the second polyoxyl thermoplastic-thermosetting adhesive composition is the same.

含有羥基之聚矽氧烷例如為含有複數個(例如2個)羥基之聚矽氧烷,更具體而言係於分子之兩末端含有羥基之兩末端型聚矽氧烷。詳細而言,含有羥基之聚矽氧烷係以下述式(9)表示。 The polyoxyalkylene group having a hydroxyl group is, for example, a polyoxyalkylene group containing a plurality of (for example, two) hydroxyl groups, and more specifically, a terminal polysiloxane having a hydroxyl group at both terminals of the molecule. Specifically, the polyoxyalkylene containing a hydroxyl group is represented by the following formula (9).

(式中,R10表示一價烴基。又,j表示1以上之整數) (wherein R 10 represents a monovalent hydrocarbon group. Further, j represents an integer of 1 or more)

式(9)中,R10所表示之一價烴基可相同亦可不同,較佳為相同。 In the formula (9), the one-valent hydrocarbon group represented by R 10 may be the same or different, and is preferably the same.

作為R10所表示之一價烴基,可列舉與上述式(5)及(6)中以R6所表示之一價烴基相同者,較佳為列舉甲基、苯基,進而較佳為列舉甲基。 Examples of the monovalent hydrocarbon group represented by R 10 include the same ones as the ones represented by R 6 in the above formulae (5) and (6), and a methyl group and a phenyl group are preferred, and more preferably listed. methyl.

就反應性及穩定性之觀點而言,j較佳為表示1~10000之整數,進而較佳為表示1~5000之整數。 From the viewpoint of reactivity and stability, j preferably represents an integer of from 1 to 10,000, and more preferably represents an integer of from 1 to 5,000.

就安全性及操作性之觀點而言,上述式(9)所表示之含有羥基之聚矽氧烷之數量平均分子量例如為100以上,較佳為500以上,又,例如亦為100000以下,較佳為50000以下。 The number average molecular weight of the hydroxyl group-containing polyoxosiloxane represented by the above formula (9) is, for example, 100 or more, preferably 500 or more, and, for example, also 100,000 or less, from the viewpoint of safety and handling. Good for 50,000 or less.

上述式(9)所表示之含有羥基之聚矽氧烷例如可依據公知之方法進行合成,或亦可使用市售品(例如Gelest公司製造)。 The polyoxyalkylene group having a hydroxyl group represented by the above formula (9) can be synthesized, for example, according to a known method, or a commercially available product (for example, manufactured by Gelest Co., Ltd.) can also be used.

並且,第4聚矽氧熱塑性-熱硬化性接著劑組合物係藉由將籠型八倍半矽氧烷、含有烯基之聚矽氧烷、矽氫化觸媒及含有羥基之聚矽氧 烷進行調配而製備。 Further, the fourth polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition is obtained by using a cage of sesquioxaxane, an alkenyl group-containing polyoxane, a ruthenium hydrogenation catalyst, and a hydroxyl group-containing polyoxyl The alkane is prepared by blending.

籠型八倍半矽氧烷之調配比率係相對於第4聚矽氧熱塑性-熱硬化性接著劑組合物,例如為1質量%以上,較佳為5質量%以上,又,例如亦為50質量%以下,較佳為40質量%以下。 The blending ratio of the cage-type sesquioxaxane is, for example, 1% by mass or more, preferably 5% by mass or more, and, for example, 50%, based on the fourth polyoxy-thermo-thermosetting thermosetting adhesive composition. The mass% or less is preferably 40% by mass or less.

含有烯基之聚矽氧烷之調配比率係以含有烯基之聚矽氧烷之烯基之莫耳數變得比籠型八倍半矽氧烷之氫矽烷基之莫耳數少之方式進行調整。 The ratio of the alkenyl group-containing polyoxane is such that the number of moles of the alkenyl group of the alkenyl group-containing polyoxyalkylene becomes less than the number of moles of the hydroquinone of the cage sesquioxanes. Make adjustments.

即,烯基與氫矽烷基之莫耳比(烯基之莫耳數/氫矽烷基之莫耳數)未達1,例如為0.10~0.99,較佳為0.20~0.99,進而較佳為0.50~0.99。 That is, the molar ratio of the alkenyl group to the hydrofluorenyl group (the molar number of the alkenyl group/the molar number of the hydroalkylene group) is less than 1, and is, for example, 0.10 to 0.99, preferably 0.20 to 0.99, and more preferably 0.50. ~0.99.

於上述莫耳比超過上述範圍之情形時,氫矽烷基變得比烯基少,於該情形時,存在反應後未殘存過量之氫矽烷基而並未對第4聚矽氧熱塑性-熱硬化性接著劑組合物賦予熱硬化性之情形。 When the above molar ratio exceeds the above range, the hydrofluorenyl group becomes less than the alkenyl group. In this case, there is no excess hydroquinone alkyl group remaining after the reaction, and the fourth polyfluorene oxide thermoplastic-thermosetting layer is not present. The case where the adhesive composition imparts thermosetting properties.

另一方面,於上述莫耳比未達上述範圍之情形時,存在過量地殘存氫矽烷基,使籠型八倍半矽氧烷彼此因空氣中之水分造成之水解及自縮合而硬化,無法獲得柔軟性之情形。 On the other hand, when the molar ratio is less than the above range, the hydroquinone group remains excessively, and the cage sesquioxanes are hardened by hydrolysis and self-condensation due to moisture in the air. Get the softness situation.

矽氫化觸媒(固體成分)之調配比率係相對於籠型八倍半矽氧烷及含有烯基之聚矽氧烷之總量100質量份,例如為1.0×10-10質量份以上,較佳為1.0×10-8質量份以上,又,例如為3質量份以下,較佳為1質量份以下。 The blending ratio of the rhodium hydrogenation catalyst (solid content) is 100 parts by mass based on the total amount of the cage sesquioxane and the alkenyl group-containing polyoxane, and is, for example, 1.0 × 10 -10 parts by mass or more. It is preferably 1.0 × 10 -8 parts by mass or more, and is, for example, 3 parts by mass or less, preferably 1 part by mass or less.

含有羥基之聚矽氧烷之調配比率係以該羥基之莫耳數(X)相對於自籠型八倍半矽氧烷之氫矽烷基之莫耳數中減去含有烯基之聚矽氧烷之烯基之莫耳數的莫耳數(Y),以莫耳比(X/Y)計例如成為0.001以上、較佳為成為0.01以上,又,例如成為1000以下、較佳為成為100以下之方式進行調整。換言之,含有羥基之聚矽氧烷之調配比率係相對於籠型八倍半矽氧烷及含有烯基之聚矽氧烷之總量100質量份,例如為 0.1質量份以上,較佳為1質量份以上,又,例如亦為50質量份以下,較佳為30質量份以下。 The compounding ratio of the hydroxyl group-containing polyoxyalkylene is obtained by subtracting the alkenyl group-containing polyoxane from the molar number of the hydroxyl group (X) relative to the molar number of the hydrofluorenyl group of the cage-type sesquioxaxane. The molar number (Y) of the molar number of the alkenyl group of the alkane is, for example, 0.001 or more, preferably 0.01 or more, in terms of the molar ratio (X/Y), and is, for example, 1000 or less, preferably 100. Adjust in the following ways. In other words, the compounding ratio of the hydroxyl group-containing polyoxyalkylene is 100 parts by mass relative to the total amount of the cage sesquioxanes and the alkenyl group-containing polyoxyalkylene, for example, 0.1 parts by mass or more, preferably 1 part by mass or more, and further, for example, 50 parts by mass or less, preferably 30 parts by mass or less.

製備第4聚矽氧熱塑性-熱硬化性接著劑組合物時,較佳為將於矽氫化觸媒之存在下使籠型八倍半矽氧烷與含有烯基之聚矽氧烷進行反應所獲得之聚矽氧樹脂組合物前驅物與含有羥基之聚矽氧烷進行調配。 When preparing the fourth polyfluorene thermoplastic-thermosetting adhesive composition, it is preferred to react the cage sesquioxanes with the alkenyl group-containing polyoxane in the presence of a rhodium hydrogenation catalyst. The obtained polyoxyxylene resin composition precursor was formulated with a hydroxyl group-containing polyoxane.

即,首先於矽氫化觸媒之存在下,以籠型八倍半矽氧烷之氫矽烷基之莫耳數變得比含有烯基之聚矽氧烷之烯基之莫耳數多(過量)之方式使籠型八倍半矽氧烷與含有烯基之聚矽氧烷進行反應,獲得聚矽氧樹脂組合物前驅物。 That is, first, in the presence of a rhodium hydrogenation catalyst, the molar number of the hydrofluorenyl group of the cage-type sesquiterpene oxide becomes more than the number of moles of the alkenyl group of the alkenyl group-containing polyoxane. In a manner, a cage type sesquioxane is reacted with an alkenyl group-containing polyoxyalkylene to obtain a polyoxyxylene resin composition precursor.

為了獲得聚矽氧樹脂組合物前驅物,更具體而言,以上述調配比率將上述籠型八倍半矽氧烷與含有烯基之聚矽氧烷、矽氫化觸媒、及視需要之溶劑一併進行調配,其後,視需要對該等進行加熱。 In order to obtain a polyoxyxylene resin composition precursor, more specifically, the above-mentioned cage type sesquioxaxane and an alkenyl group-containing polyoxane, a hydrogenation catalyst, and an optional solvent are used in the above ratio. The preparation is carried out together, after which the heating is carried out as needed.

作為溶劑,可列舉:例如甲苯等芳香族烴,例如己烷等脂肪族烴,例如乙酸乙酯等酯等。就提高各成分之相溶性之觀點而言,較佳為列舉芳香族烴,進而較佳為列舉甲苯。 The solvent may, for example, be an aromatic hydrocarbon such as toluene, or an aliphatic hydrocarbon such as hexane, or an ester such as ethyl acetate. From the viewpoint of improving the compatibility of the respective components, an aromatic hydrocarbon is preferred, and toluene is more preferred.

反應溫度例如為0℃以上,較佳為20℃以上,又,例如為100℃以下,較佳為80℃以下,反應時間例如為0.5~96小時。 The reaction temperature is, for example, 0 ° C or higher, preferably 20 ° C or higher, and further, for example, 100 ° C or lower, preferably 80 ° C or lower, and the reaction time is, for example, 0.5 to 96 hours.

藉此,使籠型八倍半矽氧烷與含有烯基之聚矽氧烷進行反應。即,籠型八倍半矽氧烷之氫矽烷基與含有烯基之聚矽氧烷之烯基進行矽氫化反應。 Thereby, the cage sesquioxanes are reacted with an alkenyl group-containing polyoxyalkylene. That is, the hydroquinone alkyl group of the cage sesquioxanes and the alkenyl group of the polyoxyalkylene group having an alkenyl group are subjected to a hydrazine hydrogenation reaction.

再者,籠型八倍半矽氧烷之氫矽烷基與含有烯基之聚矽氧烷之烯基之矽氫化反應之程度可藉由1H-NMR測定,根據源自含有烯基之聚矽氧烷之烯基之訊號強度進行確認,將該訊號消失時視為矽氫化反應結束。 Further, the degree of hydrogenation of the hydroquinone alkyl group of the cage sesquioxanes with the alkenyl group of the alkenyl group-containing polyoxyalkylene can be determined by 1 H-NMR, based on the aggregation derived from the alkenyl group. The signal intensity of the alkenyl group of the decane is confirmed, and when the signal disappears, it is regarded as the end of the hydrogenation reaction.

於上述矽氫化反應中,以氫矽烷基之莫耳數與烯基之莫耳數相 比成為過量之方式使籠型八倍半矽氧烷與含有烯基之聚矽氧烷進行反應,於該反應後會殘存過量之氫矽烷基。 In the above hydrogenation reaction, the molar number of the hydroquinone alkyl group and the molar number of the alkenyl group The caged sesquioxaxane is reacted with an alkenyl group-containing polyoxyalkylene in such a manner as to be excessive, and an excess of hydroquinone is left after the reaction.

藉此,獲得聚矽氧樹脂組合物前驅物。 Thereby, a polyoxyxylene resin composition precursor was obtained.

再者,聚矽氧樹脂組合物前驅物為液體狀或半固體狀。 Further, the precursor of the polyoxymethylene resin composition is liquid or semi-solid.

繼而,以上述比率調配所獲得之聚矽氧樹脂組合物前驅物與含有羥基之聚矽氧烷。藉由其後之加熱,使聚矽氧樹脂組合物前驅物與含有羥基之聚矽氧烷進行反應。再者,視需要蒸餾去除溶劑。 Then, the obtained polyoxyxylene resin composition precursor and the hydroxyl group-containing polyoxyalkylene are blended at the above ratio. The polyoxyxylene resin composition precursor is reacted with a hydroxyl group-containing polyoxyalkylene by heating thereafter. Further, the solvent is distilled off as needed.

藉此,可獲得第4聚矽氧熱塑性-熱硬化性接著劑組合物。 Thereby, a fourth polyoxyl thermoplastic-thermosetting adhesive composition can be obtained.

所獲得之第4聚矽氧熱塑性-熱硬化性接著劑組合物為固體狀。因籠型八倍半矽氧烷之位阻而導致含有烯基之聚矽氧烷之運動性降低,故而以固體狀之形式獲得第4聚矽氧熱塑性-熱硬化性接著劑組合物。 The obtained fourth polyoxyxene thermoplastic-thermosetting adhesive composition was a solid. The occlusion resistance of the alkenyl group-containing polyoxyalkylene is lowered by the steric hindrance of the cage sesquioxaxane, so that the fourth polyfluorene thermoplastic-thermosetting adhesive composition is obtained as a solid.

第4聚矽氧熱塑性-熱硬化性接著劑組合物之熱塑性係根據藉由加熱而使籠型八倍半矽氧烷及含有烯基之聚矽氧烷之運動性提昇來表現。 The thermoplasticity of the fourth polyoxyl thermoplastic-thermosetting adhesive composition is expressed by the improvement of the mobility of the cage sesquioxane and the alkenyl group-containing polyoxyalkylene by heating.

第4聚矽氧熱塑性-熱硬化性接著劑組合物之熱塑溫度例如為40℃以上,較佳為50℃以上,又,例如亦為150℃以下,較佳為100℃以下。 The thermoplastic temperature of the fourth polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition is, for example, 40 ° C or higher, preferably 50 ° C or higher, and is, for example, 150 ° C or lower, preferably 100 ° C or lower.

經暫時塑化之第4聚矽氧熱塑性-熱硬化性接著劑組合物之熱硬化性,具體而言係藉由第4聚矽氧熱塑性-熱硬化性接著劑組合物前驅物中所殘存之氫矽烷基與含有羥基之聚矽氧烷之羥基進行反應而表現。 The thermosetting property of the temporarily plasticized fourth polyoxyl thermoplastic-thermosetting adhesive composition is specifically retained by the precursor of the fourth polyoxyl thermoplastic-thermosetting adhesive composition. The hydroquinone is represented by a reaction with a hydroxyl group of a hydroxyl group-containing polyoxyalkylene.

更具體而言,第4聚矽氧熱塑性-熱硬化性接著劑組合物前驅物中之籠型八倍半矽氧烷之氫矽烷基與含有羥基之聚矽氧烷之羥基進行縮合反應。 More specifically, the hydroquinone alkyl group of the cage type sesquioxanes in the precursor of the fourth polyoxy-thermo-thermosetting adhesive composition is subjected to a condensation reaction with a hydroxyl group of a polyoxyalkylene group containing a hydroxyl group.

又,第4聚矽氧熱塑性-熱硬化性接著劑組合物之熱硬化溫度相對較低,例如為100℃以上,較佳為120℃以上,又,例如為250℃以下。熱硬化溫度係第4聚矽氧熱塑性-熱硬化性接著劑組合物顯示出熱 硬化性之溫度,具體而言,其係經塑化之第4聚矽氧熱塑性-熱硬化性接著劑組合物藉由加熱而硬化並完全成為固體狀之溫度。 Further, the fourth polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition has a relatively low heat curing temperature, and is, for example, 100 ° C or higher, preferably 120 ° C or higher, and, for example, 250 ° C or lower. The thermosetting temperature is a 4th polyoxyl thermoplastic-thermosetting adhesive composition showing heat The temperature of the hardenability, specifically, the temperature at which the plasticized fourth polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition is hardened by heating and completely becomes a solid.

由於該第4聚矽氧熱塑性-熱硬化性接著劑組合物包含含有羥基之聚矽氧烷,故而含有羥基之聚矽氧烷之羥基與籠型八倍半矽氧烷之殘餘之氫矽烷基進行反應,藉此,可交聯籠型八倍半矽氧烷。因此,可使第4聚矽氧熱塑性-熱硬化性接著劑組合物之柔軟性提高。 Since the fourth polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition contains a polyoxyalkylene containing a hydroxyl group, the hydroxyl group of the polyoxyalkylene group having a hydroxyl group and the residual hydroalkylalkyl group of the cage-type sesquioxaxane The reaction is carried out whereby cross-linking sesquioxaxane can be crosslinked. Therefore, the flexibility of the fourth polyoxyethylene thermoplastic-thermosetting adhesive composition can be improved.

又,可降低第4聚矽氧熱塑性-熱硬化性接著劑組合物之熱硬化溫度(例如為100~250℃)。 Further, the heat hardening temperature (for example, 100 to 250 ° C) of the fourth polyoxyethylene thermoplastic-thermosetting adhesive composition can be lowered.

第5聚矽氧熱塑性-熱硬化性接著劑組合物含有籠型八倍半矽氧烷、含有烯基之聚矽氧烷、矽氫化觸媒、及有機氫聚矽氧烷。 The fifth polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition contains a cage-type sesquioxaxane, an alkenyl group-containing polyoxane, a hydrazine hydrogenation catalyst, and an organic hydrogen polyoxyalkylene.

於第5聚矽氧熱塑性-熱硬化性接著劑組合物中,籠型八倍半矽氧烷、含有烯基之聚矽氧烷及矽氫化觸媒可分別列舉與第4聚矽氧熱塑性-熱硬化性接著劑組合物中所例示之籠型八倍半矽氧烷、含有烯基之聚矽氧烷及矽氫化觸媒相同者。於第5聚矽氧熱塑性-熱硬化性接著劑組合物中,氫矽烷基含量例如為0.01mmol/g以上,較佳為0.05mmol/g以上,又,例如亦為20mmol/g以下,較佳為15mmol/g以下。 In the fifth polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition, the cage sesquioxanes, the alkenyl-containing polyoxyalkylene and the hydrazine hydrogenation catalyst may be respectively exemplified with the fourth polyoxyl thermoplastic- The cage type sesquioxaxane, the alkenyl group-containing polyoxane, and the hydrazine hydrogenation catalyst exemplified in the thermosetting adhesive composition are the same. The hydroquinone content in the fifth polyoxyl thermoplastic-thermosetting adhesive composition is, for example, 0.01 mmol/g or more, preferably 0.05 mmol/g or more, and further preferably 20 mmol/g or less, preferably. It is 15 mmol/g or less.

於第5聚矽氧熱塑性-熱硬化性接著劑組合物中,有機氫聚矽氧烷可列舉與第2聚矽氧熱塑性-熱硬化性接著劑組合物中所例示之有機氫聚矽氧烷相同者。 In the fifth polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition, the organohydrogenpolyoxyalkylene may be exemplified as the organic hydrogen polyoxyalkylene exemplified in the second polyoxyxene thermoplastic-thermosetting adhesive composition. The same.

並且,第5聚矽氧熱塑性-熱硬化性接著劑組合物係藉由將籠型八倍半矽氧烷、含有烯基之聚矽氧烷、矽氫化觸媒、及有機氫聚矽氧烷進行調配而製備。 Further, the fifth polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition is obtained by using cage-type sesquioxaxane, alkenyl group-containing polyoxyalkylene oxide, hydrazine hydrogenation catalyst, and organic hydrogen polyoxyalkylene oxide. Prepared by blending.

籠型八倍半矽氧烷之調配比率係相對於第5聚矽氧熱塑性-熱硬化性接著劑組合物,例如為10~80質量%,較佳為10~70質量%。 The blending ratio of the cage sesquioxaxane is, for example, 10 to 80% by mass, preferably 10 to 70% by mass, based on the fifth polyfluorene thermoplastic-thermosetting adhesive composition.

含有烯基之聚矽氧烷之調配比率係以含有烯基之聚矽氧烷之烯基之莫耳數變得比籠型八倍半矽氧烷之氫矽烷基之莫耳數少之方式進 行調整。 The ratio of the alkenyl group-containing polyoxane is such that the number of moles of the alkenyl group of the alkenyl group-containing polyoxyalkylene becomes less than the number of moles of the hydroquinone of the cage sesquioxanes. Enter Line adjustment.

即,烯基相對於氫矽烷基之莫耳比(烯基之莫耳數/氫矽烷基之莫耳數)未達1,例如為0.10~0.99,較佳為0.20~0.99,進而較佳為0.50~0.99。 That is, the molar ratio of the alkenyl group to the hydrofluorenyl group (the molar number of the alkenyl group/the molar number of the hydrofluorenyl group) is less than 1, and is, for example, 0.10 to 0.99, preferably 0.20 to 0.99, more preferably 0.50~0.99.

於上述莫耳比超過上述範圍之情形時,氫矽烷基變得比烯基少,於該情形時,存在反應後未充分殘存過量之氫矽烷基而並未對第5聚矽氧熱塑性-熱硬化性接著劑組合物賦予熱硬化性之情形。 When the above molar ratio exceeds the above range, the hydrofluorenyl group becomes less than the alkenyl group. In this case, the excess hydroquinone group is not sufficiently retained after the reaction, and the fifth polyfluorene oxide thermoplastic-heat is not present. The case where the curable adhesive composition imparts thermosetting property.

另一方面,於上述莫耳比未達上述範圍之情形時,存在過量地殘存氫矽烷基,使籠型八倍半矽氧烷彼此因空氣中之水分造成之水解及自縮合而硬化,無法獲得柔軟性之情形。 On the other hand, when the molar ratio is less than the above range, the hydroquinone group remains excessively, and the cage sesquioxanes are hardened by hydrolysis and self-condensation due to moisture in the air. Get the softness situation.

矽氫化觸媒(固體成分)之調配比率係相對於籠型八倍半矽氧烷及含有烯基之聚矽氧烷之總量100質量份,例如為1.0×10-10質量份以上,較佳為1.0×10-8質量份以上,又,例如亦為3質量份以下,較佳為1質量份以下。 The blending ratio of the rhodium hydrogenation catalyst (solid content) is 100 parts by mass based on the total amount of the cage sesquioxane and the alkenyl group-containing polyoxane, and is, for example, 1.0 × 10 -10 parts by mass or more. It is preferably 1.0 × 10 -8 parts by mass or more, and is also, for example, 3 parts by mass or less, preferably 1 part by mass or less.

有機氫聚矽氧烷之調配比率係以該氫矽烷基之莫耳數(X)相對於自籠型八倍半矽氧烷之氫矽烷基之莫耳數中減去含有烯基之聚矽氧烷之烯基之莫耳數的莫耳數(Y),以莫耳比(X/Y)計例如成為0.001以上、較佳為成為0.01以上,又,例如為1000以下、較佳為成為100以下之方式進行調整。換言之,有機氫聚矽氧烷之調配比率係相對於籠型八倍半矽氧烷及含有烯基之聚矽氧烷之總量100質量份,例如為0.01~100質量份,較佳為0.01~50質量份。 The compounding ratio of the organohydrogen polyoxyalkylene is obtained by subtracting the alkenyl group-containing polyfluorene from the molar number (X) of the hydroquinone group relative to the molar number of the hydroquinone group of the cage-type sesquioxaxane. The molar number (Y) of the number of moles of the alkenyl group of the oxyalkylene is, for example, 0.001 or more, preferably 0.01 or more, in terms of the molar ratio (X/Y), and is, for example, 1,000 or less, preferably Adjust by 100 or less. In other words, the compounding ratio of the organohydrogenpolysiloxane is 100 parts by mass, for example, 0.01 to 100 parts by mass, preferably 0.01, based on 100 parts by mass of the total of the cage type sesquioxane and the alkenyl group-containing polysiloxane. ~50 parts by mass.

又,有機氫聚矽氧烷相對於第5聚矽氧熱塑性-熱硬化性接著劑組合物總體之調配比率例如為0.01~50質量%,較佳為0.01~30質量%。 Further, the compounding ratio of the organohydrogenpolyoxyalkylene to the fifth polyfluorene-oxygen thermoplastic-thermosetting adhesive composition is, for example, 0.01 to 50% by mass, preferably 0.01 to 30% by mass.

製備第5聚矽氧熱塑性-熱硬化性接著劑組合物時,較佳為將於矽氫化觸媒之存在下使籠型八倍半矽氧烷與含有烯基之聚矽氧烷進行反 應所獲得之聚矽氧樹脂組合物前驅物與有機氫聚矽氧烷進行調配。 When preparing the fifth polyfluorene thermoplastic-thermosetting adhesive composition, it is preferred to reverse the cage sesquioxanes with the alkenyl group-containing polyoxane in the presence of a rhodium hydrogenation catalyst. The obtained polyoxymethylene resin composition precursor is formulated with an organic hydrogen polyoxyalkylene oxide.

即,首先於矽氫化觸媒之存在下,以籠型八倍半矽氧烷之氫矽烷基之莫耳數變得比含有烯基之聚矽氧烷之烯基之莫耳數多(過量)之調配比率使籠型八倍半矽氧烷與含有烯基之聚矽氧烷進行反應,藉此獲得聚矽氧樹脂組合物前驅物。 That is, first, in the presence of a rhodium hydrogenation catalyst, the molar number of the hydrofluorenyl group of the cage-type sesquiterpene oxide becomes more than the number of moles of the alkenyl group of the alkenyl group-containing polyoxane. The blending ratio allows the cage sesquioxane to react with the alkenyl group-containing polyoxyalkylene, thereby obtaining a polyoxyxylene resin composition precursor.

為了獲得聚矽氧樹脂組合物前驅物,更具體而言,以上述調配比率將上述籠型八倍半矽氧烷與含有烯基之聚矽氧烷、矽氫化觸媒、及視需要之溶劑一併進行調配,其後,視需要對該等進行加熱。 In order to obtain a polyoxyxylene resin composition precursor, more specifically, the above-mentioned cage type sesquioxaxane and an alkenyl group-containing polyoxane, a hydrogenation catalyst, and an optional solvent are used in the above ratio. The preparation is carried out together, after which the heating is carried out as needed.

作為溶劑,可列舉:例如甲苯等芳香族烴,例如己烷等脂肪族烴,例如乙酸乙酯等酯等。就提高各成分之相溶性之觀點而言,較佳為列舉芳香族烴,進而較佳為列舉甲苯。 The solvent may, for example, be an aromatic hydrocarbon such as toluene, or an aliphatic hydrocarbon such as hexane, or an ester such as ethyl acetate. From the viewpoint of improving the compatibility of the respective components, an aromatic hydrocarbon is preferred, and toluene is more preferred.

反應溫度例如為0℃以上,較佳為20℃以上,又,例如為100℃以下,較佳為80℃以下,反應時間例如為0.5~96小時。 The reaction temperature is, for example, 0 ° C or higher, preferably 20 ° C or higher, and further, for example, 100 ° C or lower, preferably 80 ° C or lower, and the reaction time is, for example, 0.5 to 96 hours.

藉此,使籠型八倍半矽氧烷與含有烯基之聚矽氧烷進行反應。即,籠型八倍半矽氧烷之氫矽烷基與含有烯基之聚矽氧烷之烯基進行矽氫化反應。 Thereby, the cage sesquioxanes are reacted with an alkenyl group-containing polyoxyalkylene. That is, the hydroquinone alkyl group of the cage sesquioxanes and the alkenyl group of the polyoxyalkylene group having an alkenyl group are subjected to a hydrazine hydrogenation reaction.

再者,籠型八倍半矽氧烷之氫矽烷基與含有烯基之聚矽氧烷之烯基之矽氫化反應之程度可藉由1H-NMR測定,根據源自含有烯基之聚矽氧烷之烯基之訊號強度進行確認,將該訊號消失時視為矽氫化反應結束。 Further, the degree of hydrogenation of the hydroquinone alkyl group of the cage sesquioxanes with the alkenyl group of the alkenyl group-containing polyoxyalkylene can be determined by 1 H-NMR, based on the aggregation derived from the alkenyl group. The signal intensity of the alkenyl group of the decane is confirmed, and when the signal disappears, it is regarded as the end of the hydrogenation reaction.

於上述矽氫化反應中,以氫矽烷基之莫耳數與烯基之莫耳數相比成為過量之方式使籠型八倍半矽氧烷與含有烯基之聚矽氧烷進行反應,於該反應後會殘存過量之氫矽烷基。 In the above hydrogenation reaction, the caged sesquioxaxane is reacted with an alkenyl group-containing polyoxyalkylene in such a manner that the mole number of the hydroquinone alkyl group is excessive compared with the molar number of the alkenyl group. Excess hydroquinone will remain after this reaction.

藉此,獲得聚矽氧樹脂組合物前驅物。 Thereby, a polyoxyxylene resin composition precursor was obtained.

再者,聚矽氧樹脂組合物前驅物為液體狀或半固體狀。 Further, the precursor of the polyoxymethylene resin composition is liquid or semi-solid.

繼而,以上述比率調配所獲得之聚矽氧樹脂組合物前驅物與有 機氫聚矽氧烷。藉由其後之加熱(下述),使聚矽氧樹脂組合物前驅物與有機氫聚矽氧烷進行反應。再者,視需要蒸餾去除溶劑。 Then, the precursor of the polyoxyxene resin composition obtained by the above ratio is blended with Machine hydrogen polyoxane. The polyoxyxylene resin composition precursor is reacted with an organic hydrogen polyoxyalkylene by heating thereafter (described below). Further, the solvent is distilled off as needed.

藉此,可獲得第5聚矽氧熱塑性-熱硬化性接著劑組合物。 Thereby, the fifth polyoxyl thermoplastic-thermosetting adhesive composition can be obtained.

所獲得之第5聚矽氧熱塑性-熱硬化性接著劑組合物為固體狀。因籠型八倍半矽氧烷之位阻而導致含有烯基之聚矽氧烷之運動性降低,故而以固體狀之形式獲得第5聚矽氧熱塑性-熱硬化性接著劑組合物。 The obtained fifth polyoxyxene thermoplastic-thermosetting adhesive composition was a solid. The occlusion resistance of the alkenyl group-containing polyoxyalkylene is lowered by the steric hindrance of the cage sesquioxane, so that the fifth polyoxyl thermoplastic-thermosetting adhesive composition is obtained as a solid.

並且,由於第5聚矽氧熱塑性-熱硬化性接著劑組合物之R7之一價烴基:氫之莫耳比在特定範圍內,故而於籠型八倍半矽氧烷中,對與含有烯基之聚矽氧烷之烯基進行反應之氫矽烷基之比率進行調整。並且,使含有烯基之聚矽氧烷以其烯基之莫耳數變得比籠型八倍半矽氧烷之氫矽烷基之莫耳數少之方式與籠型八倍半矽氧烷進行反應。因此,所獲得之第5聚矽氧熱塑性-熱硬化性接著劑組合物之透明性及耐熱性優異並且可兼具熱塑性及熱硬化性。 Further, since the molar ratio of the one-valent hydrocarbon group:hydrogen of R 7 of the fifth polyfluorene thermoplastic-thermosetting adhesive composition is within a specific range, in the cage type sesquioxane, the pair contains The ratio of the hydroxanyl group in which the alkenyl group of the alkenyl polyoxyalkylene is reacted is adjusted. Further, the alkenyl group-containing polyoxyalkylene is formed in such a manner that the molar number of the alkenyl group becomes smaller than the molar number of the hydroquinone of the cage sesquioxanes and the cage sesquioxaxane Carry out the reaction. Therefore, the obtained fifth polyoxyxene thermoplastic-thermosetting adhesive composition is excellent in transparency and heat resistance, and can have both thermoplasticity and thermosetting property.

即,第5聚矽氧熱塑性-熱硬化性接著劑組合物藉由上述加熱而暫時塑化(或液狀化),其後進行熱硬化。 That is, the fifth polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition is temporarily plasticized (or liquidized) by the above heating, and then thermally cured.

第5聚矽氧熱塑性-熱硬化性接著劑組合物之熱塑性係根據藉由加熱而使籠型八倍半矽氧烷及含有烯基之聚矽氧烷之運動性提昇來表現。 The thermoplasticity of the fifth polyoxyl thermoplastic-thermosetting adhesive composition is expressed by the motility of the cage-type sesquioxane and the alkenyl group-containing polyoxyalkylene by heating.

再者,第5聚矽氧熱塑性-熱硬化性接著劑組合物之熱塑溫度例如為40℃以上,較佳為50℃以上,又,例如亦為150℃以下,較佳為100℃以下。再者,熱塑溫度係第5聚矽氧熱塑性-熱硬化性接著劑組合物顯示出熱塑性之溫度,具體而言,其係固體狀之第5聚矽氧熱塑性-熱硬化性接著劑組合物藉由加熱而軟化並完全成為液體狀之溫度,且實質上與軟化溫度相同。 Further, the thermoplastic temperature of the fifth polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition is, for example, 40 ° C or higher, preferably 50 ° C or higher, and further preferably 150 ° C or lower, preferably 100 ° C or lower. Further, the thermoplastic temperature-based fifth polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition exhibits a thermoplastic temperature, specifically, a solid fifth-polyoxy-thermoplastic-thermosetting adhesive composition. The temperature which softens by heating and becomes completely liquid, and is substantially the same as the softening temperature.

經暫時塑化之第5聚矽氧熱塑性-熱硬化性接著劑組合物之熱硬化性,具體而言係藉由使聚矽氧樹脂組合物前驅物中所殘存之氫矽烷基 與有機氫聚矽氧烷之氫矽烷基進行反應而表現。 The thermosetting property of the temporarily plasticized fifth polyoxyxene thermoplastic-thermosetting adhesive composition, specifically, the hydroquinone remaining in the precursor of the polyoxyalkylene resin composition It is represented by a reaction with a hydroalkylene group of an organic hydrogen polyoxyalkylene.

更具體而言,聚矽氧樹脂組合物前驅物中之籠型八倍半矽氧烷之氫矽烷基與有機氫聚矽氧烷之氫矽烷基會與空氣中之水反應(水解),進行脫水(分子間脫水)縮合反應。 More specifically, the hydroquinone alkyl group of the cage sesquioxaxane and the hydroquinone alkyl group of the organic hydrogen polyoxyalkylene in the precursor of the polyoxyxylene resin composition are reacted (hydrolyzed) with water in the air to carry out Dehydration (intermolecular dehydration) condensation reaction.

又,第5聚矽氧熱塑性-熱硬化性接著劑組合物之熱硬化溫度相對較低,例如為100℃以上,較佳為120℃以上,又,例如亦為250℃以下。熱硬化溫度係第5聚矽氧熱塑性-熱硬化性接著劑組合物顯示出熱硬化性之溫度,具體而言,其係經塑化之第5聚矽氧熱塑性-熱硬化性接著劑組合物藉由加熱而硬化並完全成為固體狀之溫度。 Further, the fifth polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition has a relatively low heat curing temperature, and is, for example, 100 ° C or higher, preferably 120 ° C or higher, and, for example, 250 ° C or lower. The thermosetting temperature is a temperature at which the fifth polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition exhibits thermosetting properties, specifically, a plasticized fifth polyfluorene-oxygen thermoplastic-thermosetting adhesive composition. The temperature which hardens by heating and becomes completely solid.

於該第5聚矽氧熱塑性-熱硬化性接著劑組合物中,有機氫聚矽氧烷之氫矽烷基與籠型八倍半矽氧烷之殘餘之氫矽烷基進行反應。即,可藉由脫水(分子間脫水)縮合反應而交聯籠型八倍半矽氧烷。因此,可使第5聚矽氧熱塑性-熱硬化性接著劑組合物之柔軟性提高。 In the fifth polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition, the hydroalkylene group of the organohydrogenpolyoxyalkylene is reacted with the residual hydroalkylene group of the cage sesquioxanes. That is, the cage type sesquioxane can be crosslinked by a dehydration (intermolecular dehydration) condensation reaction. Therefore, the flexibility of the fifth polyfluorene thermoplastic-thermosetting adhesive composition can be improved.

又,可降低第5聚矽氧熱塑性-熱硬化性接著劑組合物之熱硬化溫度(例如為100~250℃)。 Further, the heat hardening temperature (for example, 100 to 250 ° C) of the fifth polyfluorene thermoplastic-thermosetting adhesive composition can be lowered.

第6聚矽氧熱塑性-熱硬化性接著劑組合物含有籠型八倍半矽氧烷、兩末端含有烯基之聚矽氧烷、矽氫化觸媒、及側鏈含有烯基之聚矽氧烷。 The sixth polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition contains a caged sesquioxaxane, a polyoxyalkylene having an alkenyl group at both terminals, a hydrazine hydrogenation catalyst, and a polyoxyl group having an alkenyl group in a side chain. alkyl.

於第6聚矽氧熱塑性-熱硬化性接著劑組合物中,籠型八倍半矽氧烷、兩末端含有烯基之聚矽氧烷及矽氫化觸媒可列舉與第3聚矽氧熱塑性-熱硬化性接著劑組合物中所例示之籠型八倍半矽氧烷、第3聚矽氧熱塑性-熱硬化性接著劑組合物中所例示之兩末端含有烯基之聚矽氧烷、第2聚矽氧熱塑性-熱硬化性接著劑組合物中所例示之矽氫化觸媒相同者。 In the sixth polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition, the cage sesquioxaxane, the polyoxyalkylene group having an alkenyl group at both terminals, and the rhodium hydrogenation catalyst are exemplified by the third polyfluorene oxide thermoplastic. - a cage-type sesquioxaxane exemplified in the thermosetting adhesive composition, and a polyoxyalkylene group having an alkenyl group at both terminals exemplified in the third polyfluorinated thermoplastic-thermosetting adhesive composition, The ruthenium hydrogenation catalyst exemplified in the second polyoxyl thermoplastic-thermosetting adhesive composition is the same.

側鏈含有烯基之聚矽氧烷係側鏈上含有2個烯基之聚矽氧烷。作為此種側鏈含有烯基之聚矽氧烷,例如可列舉:以鍵結於含有直鏈狀 之矽氧烷部分(-Si-O-)之主鏈(之矽原子)上之側鏈之形式含有烯基的含有直鏈狀矽氧烷之聚矽氧烷、及/或含有與分枝狀之矽氧烷部分之矽原子鍵結之烯基的含有分枝狀矽氧烷之聚矽氧烷。 The side chain contains a polyoxyalkylene having 2 alkenyl groups on the side chain of the polyoxyalkylene group having an alkenyl group. Examples of the polyoxyalkylene group having an alkenyl group in such a side chain include bonding to a linear chain. a side chain of a main chain (the ruthenium atom) of the oxirane moiety (-Si-O-) having an alkenyl group containing a linear azide, and/or containing and branching A branched azepine-containing polyoxyalkylene having an alkene-bonded alkenyl group in the form of a heptane.

含有直鏈狀矽氧烷之聚矽氧烷,具體而言係以下述式(10)表示。 The polyoxyalkylene containing a linear alkane is specifically represented by the following formula (10).

(式中,I~L為結構單元,I及L表示末端單元,J及K表示重複單元。R11表示一價烴基,R12表示烯基。又,k表示0以上之整數,m表示2以上之整數) (wherein, I to L are structural units, I and L are terminal units, and J and K are repeating units. R 11 represents a monovalent hydrocarbon group, and R 12 represents an alkenyl group. Further, k represents an integer of 0 or more, and m represents 2 The above integer)

I~L構成含有直鏈狀矽氧烷之聚矽氧烷。 I~L constitutes a polyoxyalkylene containing a linear alkane.

式(10)中,R11所表示之一價烴基可相同亦可不同,較佳為相同。 In the formula (10), the one-valent hydrocarbon group represented by R 11 may be the same or different, and is preferably the same.

作為R11所表示之一價烴基,可列舉與上述式(1)中以R1所表示之一價烴基相同者,較佳為列舉甲基、苯基,進而較佳為列舉甲基。 The monovalent hydrocarbon group represented by R 11 may be the same as the one of the valent hydrocarbon groups represented by R 1 in the above formula (1), and a methyl group or a phenyl group is preferred, and a methyl group is more preferred.

就反應性及穩定性之觀點而言,k較佳為表示1~10000之整數,進而較佳為表示1~5000之整數。 From the viewpoint of reactivity and stability, k is preferably an integer of from 1 to 10,000, and more preferably an integer of from 1 to 5,000.

就反應性及穩定性之觀點而言,m較佳為表示2~500之整數,進而較佳為表示2~100之整數。 From the viewpoint of reactivity and stability, m preferably represents an integer of 2 to 500, and more preferably represents an integer of 2 to 100.

就穩定性及操作性之觀點而言,含有直鏈狀矽氧烷之聚矽氧烷之數量平均分子量例如為200~1000000,較佳為200~80000。 The number average molecular weight of the polyoxane containing a linear alkane is, for example, from 200 to 1,000,000, preferably from 200 to 80,000, from the viewpoint of stability and workability.

含有直鏈狀矽氧烷之聚矽氧烷之乙烯基含量例如為0.01mmol/g 以上,較佳為0.1mmol/g以上,又,例如為10mmol/g以下,較佳為5mmol/g以下。含有直鏈狀矽氧烷之聚矽氧烷之乙烯基含量係利用1H-NMR由乙烯基與甲基之面積比進行測定。 The vinyl content of the polyoxyalkylene containing a linear alkane is, for example, 0.01 mmol/g or more, preferably 0.1 mmol/g or more, and is, for example, 10 mmol/g or less, preferably 5 mmol/g or less. The vinyl content of the polyoxyalkylene containing a linear alkane was measured by 1 H-NMR from the area ratio of the vinyl group to the methyl group.

含有直鏈狀矽氧烷之聚矽氧烷例如可依據公知之方法進行合成,或亦可使用市售品(例如Gelest公司製造)。 The polyoxyalkylene containing a linear alkane can be synthesized, for example, according to a known method, or a commercially available product (for example, manufactured by Gelest Co., Ltd.) can also be used.

含有分枝狀矽氧烷之聚矽氧烷,具體而言係以下述式(11)表示。 The polyoxyalkylene containing a branched alkane is specifically represented by the following formula (11).

(式中,M、N、P及Q為結構單元,M、N及P表示重複單元,Q表示末端單元。R13表示一價烴基。又,n表示1以上之整數,p及q表示0以上之整數,r表示4以上之整數。進而,每1分子中至少2個R13為烯基) (Wherein, M, N, P, and Q structural units, M, N and P represent repeating units, Q represents a terminal unit .R 13 represents a monovalent hydrocarbon group and, n represents an integer of 1, p and q represents 0 The above integer, r represents an integer of 4 or more. Further, at least two R 13 per molecule are alkenyl groups)

M、N、P及Q構成含有分枝狀矽氧烷之聚矽氧烷。 M, N, P and Q constitute a polyoxyalkylene containing a branched alkane.

R13所表示之一價烴基例如為飽和烴基、芳香族烴基、或不飽和烴基(芳香族烴基除外)。 The monovalent hydrocarbon group represented by R 13 is, for example, a saturated hydrocarbon group, an aromatic hydrocarbon group, or an unsaturated hydrocarbon group (excluding an aromatic hydrocarbon group).

作為飽和烴基及芳香族烴基,可列舉與上述式(1)中以R1所表示之一價烴基相同者,較佳為列舉甲基、苯基,進而較佳為列舉甲基。 Examples of the saturated hydrocarbon group and the aromatic hydrocarbon group include the same ones as the ones represented by R 1 in the above formula (1), and a methyl group and a phenyl group are preferred, and a methyl group is more preferred.

作為不飽和烴基(芳香族烴基除外),可列舉與上述式(1)中,R2所表示之烯基相同者,較佳為列舉乙烯基。 The unsaturated hydrocarbon group (excluding the aromatic hydrocarbon group) is the same as the alkenyl group represented by R 2 in the above formula (1), and preferably a vinyl group.

式(11)中,R13所表示之一價烴基至少包含烯基,較佳為包含烷基及/或苯基、及烯基,進而較佳為包含甲基與乙烯基。 In the formula (11), the monovalent hydrocarbon group represented by R 13 contains at least an alkenyl group, preferably an alkyl group and/or a phenyl group and an alkenyl group, and more preferably a methyl group and a vinyl group.

於含有分枝狀矽氧烷之聚矽氧烷中之烯基數為2以上,較佳為3以上,通常為30以下。 The number of alkenyl groups in the polyoxyalkylene containing a branched alkane is 2 or more, preferably 3 or more, and usually 30 or less.

n較佳為表示1~100之整數,進而較佳為表示1~50之整數。 n preferably represents an integer from 1 to 100, and more preferably represents an integer from 1 to 50.

p較佳為表示1~100之整數,進而較佳為表示1~50之整數。 p preferably represents an integer from 1 to 100, and more preferably represents an integer from 1 to 50.

q較佳為表示1~100之整數,進而較佳為表示1~50之整數。 q preferably represents an integer from 1 to 100, and more preferably represents an integer from 1 to 50.

r較佳為表示4~100之整數,進而較佳為表示4~30之整數。 r preferably represents an integer from 4 to 100, and more preferably represents an integer from 4 to 30.

就穩定性及操作性之觀點而言,含有分枝狀矽氧烷之聚矽氧烷之數量平均分子量例如為100以上,較佳為200以上,又,例如亦為10000以下,較佳為8000以下。 The number average molecular weight of the polyoxyalkylene containing a branched aluminoxane is, for example, 100 or more, preferably 200 or more, and is also, for example, 10,000 or less, preferably 8,000, from the viewpoint of stability and workability. the following.

含有分枝狀矽氧烷之聚矽氧烷之乙烯基含量例如為0.01mmol/g以上,較佳為0.1mmol/g以上,又,例如亦為100mmol/g以下,亦為10mmol/g以下。含有分枝狀矽氧烷之聚矽氧烷之乙烯基含量係利用1H-NMR由乙烯基與甲基之面積比進行測定。 The vinyl content of the polyoxyalkylene containing a branched alkane is, for example, 0.01 mmol/g or more, preferably 0.1 mmol/g or more, and is also, for example, 100 mmol/g or less, and is also 10 mmol/g or less. The vinyl content of the polyoxyalkylene containing a branched alkane was measured by 1 H-NMR from the area ratio of the vinyl group to the methyl group.

含有分枝狀矽氧烷之聚矽氧烷例如可依據公知之方法進行合成,或亦可使用市售品(例如Gelest公司製造)。 The polyoxyalkylene containing a branched alkane can be synthesized, for example, according to a known method, or a commercially available product (for example, manufactured by Gelest Corporation) can also be used.

並且,第6聚矽氧熱塑性-熱硬化性接著劑組合物係藉由將籠型八倍半矽氧烷、兩末端含有烯基之聚矽氧烷、矽氫化觸媒、及側鏈含有烯基之聚矽氧烷進行調配而製備。 Further, the sixth polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition is obtained by using a cage-type sesquioxaxane, a polyoxyalkylene having an alkenyl group at both terminals, a hydrogenation catalyst, and a side chain containing an alkene. The polyoxyalkylene is prepared by compounding.

籠型八倍半矽氧烷之調配比率係相對於第6聚矽氧熱塑性-熱硬化性接著劑組合物例如為10~80質量%,較佳為10~70質量%。 The blending ratio of the cage octapoxane is, for example, 10 to 80% by mass, preferably 10 to 70% by mass based on the sixth polyoxyl thermoplastic-thermosetting adhesive composition.

兩末端含有烯基之聚矽氧烷之調配比率係以兩末端含有烯基之聚矽氧烷之烯基之莫耳數變得比籠型八倍半矽氧烷之氫矽烷基之莫耳數少之方式進行調整。 The ratio of the polyoxyalkylene containing alkenyl groups at both ends is such that the number of moles of the alkenyl group having a polyoxyalkylene group having an alkenyl group at both ends becomes more than that of the hydroquinone alkyl group of the cage sesquioxane. Adjust in a few ways.

即,烯基相對於氫矽烷基之莫耳比(烯基之莫耳數/氫矽烷基之莫耳數)未達1,例如為0.10~0.99,較佳為0.20~0.99,進而較佳為0.50~0.99。換言之,兩末端含有烯基之聚矽氧烷之調配比率係相對於籠型八倍半矽氧烷及兩末端含有烯基之聚矽氧烷之總量100質量份,例如為0.001質量份以上,較佳為0.01質量份以上,例如亦為30質量份以下,較佳為20質量份以下。又,亦可以相對於籠型八倍半矽氧烷及兩 末端含有烯基之聚矽氧烷之總量100質量份,將兩末端含有烯基之聚矽氧烷之調配比率例如設定為0.01質量份以上,較佳為設定為0.1質量份以上,又,例如設定為100質量份以下,較佳為設定為50質量份以下。 That is, the molar ratio of the alkenyl group to the hydrofluorenyl group (the molar number of the alkenyl group/the molar number of the hydrofluorenyl group) is less than 1, and is, for example, 0.10 to 0.99, preferably 0.20 to 0.99, more preferably 0.50~0.99. In other words, the blending ratio of the polyoxyalkylene group having an alkenyl group at both ends is 100 parts by mass or more, for example, 0.001 part by mass or more based on the total amount of the cage sesquioxane and the polyoxyalkylene having alkenyl groups at both terminals. It is preferably 0.01 parts by mass or more, for example, 30 parts by mass or less, preferably 20 parts by mass or less. Also, it can be used with respect to cage type octadequioxanes and two 100 parts by mass of the total amount of the polyoxyalkylene group having an alkenyl group at the end, and the blending ratio of the polyoxyalkylene group having an alkenyl group at both terminals is, for example, 0.01 parts by mass or more, preferably 0.1 part by mass or more, and further, For example, it is set to 100 parts by mass or less, and preferably set to 50 parts by mass or less.

於上述莫耳比超過上述範圍之情形時,氫矽烷基變得比烯基少,於該情形時,存在反應後未充分殘存過量之氫矽烷基而並未對第6聚矽氧熱塑性-熱硬化性接著劑組合物賦予熱硬化性之情形。 When the above molar ratio exceeds the above range, the hydrofluorenyl group becomes less than the alkenyl group. In this case, the excess hydroquinone group is not sufficiently retained after the reaction, and the sixth polyfluorene oxide thermoplastic-heat is not present. The case where the curable adhesive composition imparts thermosetting property.

另一方面,於上述莫耳比未達上述範圍之情形時,存在過量地殘存氫矽烷基,使籠型八倍半矽氧烷彼此因空氣中之水分造成之水解及自縮合而硬化,無法獲得柔軟性之情形。 On the other hand, when the molar ratio is less than the above range, the hydroquinone group remains excessively, and the cage sesquioxanes are hardened by hydrolysis and self-condensation due to moisture in the air. Get the softness situation.

矽氫化觸媒(固體成分)之調配比率係相對於籠型八倍半矽氧烷及兩末端含有烯基之聚矽氧烷之總量100質量份,例如為1.0×10-10質量份以上,較佳為1.0×10-8質量份以上,又,例如亦為3質量份以下,較佳為1質量份以下。 The blending ratio of the rhodium hydrogenation catalyst (solid content) is 100 parts by mass based on the total amount of the cage sesquioxane and the polyoxyalkylene having alkenyl groups at both ends, and is, for example, 1.0 × 10 -10 parts by mass or more. It is preferably 1.0 × 10 -8 parts by mass or more, and is also, for example, 3 parts by mass or less, preferably 1 part by mass or less.

側鏈含有烯基之聚矽氧烷之調配比率係以其烯基之莫耳數(X)相對於自籠型八倍半矽氧烷之氫矽烷基之莫耳數中減去兩末端含有烯基之聚矽氧烷之烯基之莫耳數的莫耳數(Y),以莫耳比(X/Y)計例如成為0.001以上、較佳為成為0.01,又,例如成為1000以下、較佳為成為100以下之方式進行調整。 The ratio of the alkenyl group-containing polyoxyalkylene in the side chain is calculated by subtracting the two end groups from the molar number of the alkenyl group (X) relative to the molar number of the hydroquinone group of the cage-type sesquioxaxane. The molar number (Y) of the number of moles of the alkenyl group of the alkenyl polyoxyalkylene is, for example, 0.001 or more, preferably 0.01 in terms of the molar ratio (X/Y), and is, for example, 1000 or less. It is preferable to adjust to 100 or less.

製備第6聚矽氧熱塑性-熱硬化性接著劑組合物時,較佳為將藉由於矽氫化觸媒之存在下使籠型八倍半矽氧烷與兩末端含有烯基之聚矽氧烷進行反應所獲得之第6聚矽氧熱塑性-熱硬化性接著劑組合物前驅物與側鏈含有烯基之聚矽氧烷進行調配。 When preparing the sixth polyoxyl thermoplastic-thermosetting adhesive composition, it is preferred to use a octadecyl sulfoxide and an alkenyl group containing an alkenyl group at both ends by the presence of a ruthenium hydrogenation catalyst. The precursor of the sixth polyfluorene thermoplastic-thermosetting adhesive composition obtained by the reaction is blended with a polyoxyalkylene group having an alkenyl group in a side chain.

即,首先於矽氫化觸媒之存在下,以籠型八倍半矽氧烷之氫矽烷基之莫耳數變得比兩末端含有烯基之聚矽氧烷之烯基之莫耳數多(過量)之調配比率下,使籠型八倍半矽氧烷與兩末端含有烯基之聚矽 氧烷進行反應,藉此,獲得第6聚矽氧熱塑性-熱硬化性接著劑組合物前驅物。 That is, first, in the presence of a ruthenium hydrogenation catalyst, the number of moles of the hydroquinone group of the cage-type sesquioxaxane becomes larger than the number of moles of the alkenyl group of the polyoxyalkylene group having an alkenyl group at both terminals. (Over) the ratio of the mixture, the cage octapedance and the alkenyl group at both ends The oxane is reacted, whereby a sixth polyfluorene thermoplastic-thermosetting adhesive composition precursor is obtained.

為了獲得第6聚矽氧熱塑性-熱硬化性接著劑組合物前驅物,更具體而言,以上述調配比率使上述籠型八倍半矽氧烷與兩末端含有烯基之聚矽氧烷、矽氫化觸媒、及視需要之溶劑一併進行調配,其後,視需要對該等進行加熱。 In order to obtain a precursor of the sixth polyoxyl thermoplastic-thermosetting adhesive composition, more specifically, the above-mentioned cage-type sesquioxane and the polyoxyalkylene having alkenyl groups at both ends, The hydrogenation catalyst and the solvent as needed are blended together, and then heated as needed.

作為溶劑,可列舉:例如甲苯等芳香族烴,例如己烷等脂肪族烴,例如乙酸乙酯等酯等。就提高各成分之相溶性之觀點而言,較佳為列舉芳香族烴,進而較佳為列舉甲苯。 The solvent may, for example, be an aromatic hydrocarbon such as toluene, or an aliphatic hydrocarbon such as hexane, or an ester such as ethyl acetate. From the viewpoint of improving the compatibility of the respective components, an aromatic hydrocarbon is preferred, and toluene is more preferred.

反應溫度例如為0℃以上,較佳為20℃以上,又,例如為100℃以下,較佳為80℃以下,反應時間例如為0.5~96小時。 The reaction temperature is, for example, 0 ° C or higher, preferably 20 ° C or higher, and further, for example, 100 ° C or lower, preferably 80 ° C or lower, and the reaction time is, for example, 0.5 to 96 hours.

藉此,使籠型八倍半矽氧烷與兩末端含有烯基之聚矽氧烷進行反應。即,籠型八倍半矽氧烷之氫矽烷基與兩末端含有烯基之聚矽氧烷之烯基進行矽氫化反應。 Thereby, the cage sesquioxane is reacted with a polyoxyalkylene having alkenyl groups at both terminals. That is, the hydroquinone group of the cage sesquioxanes and the alkenyl group of the polyoxyalkylene having alkenyl groups at both terminals are subjected to a hydrazine hydrogenation reaction.

再者,籠型八倍半矽氧烷之氫矽烷基與兩末端含有烯基之聚矽氧烷之烯基之矽氫化反應之程度可藉由1H-NMR測定,根據兩末端含有烯基之聚矽氧烷之烯基之訊號強度進行確認,將該訊號消失時視為矽氫化反應結束。 Further, the degree of hydrogenation of the hydroquinone group of the cage sesquioxanes with the alkenyl group of the polyoxyalkylene having alkenyl groups at both terminals can be determined by 1 H-NMR, and the alkenyl group is contained at both ends. The signal intensity of the alkenyl group of the polyoxyalkylene is confirmed, and when the signal disappears, it is regarded as the end of the hydrogenation reaction.

於上述矽氫化反應中,以氫矽烷基之莫耳數與烯基之莫耳數相比成為過量之方式使籠型八倍半矽氧烷與兩末端含有烯基之聚矽氧烷進行反應,於該反應後會殘存過量之氫矽烷基。 In the above hydrogenation reaction, the caged sesquioxane is reacted with the polyoxyalkylene having alkenyl groups at both ends in such a manner that the mole number of the hydroquinone alkyl group is excessive compared with the molar number of the alkenyl group. Excess hydroquinone will remain after the reaction.

藉此,獲得第6聚矽氧熱塑性-熱硬化性接著劑組合物前驅物。 Thereby, a precursor of the sixth polyoxyl thermoplastic-thermosetting adhesive composition was obtained.

再者,第6聚矽氧熱塑性-熱硬化性接著劑組合物前驅物為液體狀或半固體狀。 Further, the precursor of the sixth polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition is liquid or semi-solid.

繼而,以上述比率調配所獲得之第6聚矽氧熱塑性-熱硬化性接著劑組合物前驅物與側鏈含有烯基之聚矽氧烷。藉由其後之加熱(下 述),使第6聚矽氧熱塑性-熱硬化性接著劑組合物前驅物與側鏈含有烯基之聚矽氧烷進行反應。再者,視需要蒸餾去除溶劑。 Then, the precursor of the sixth polyfluorene thermoplastic-thermosetting adhesive composition obtained by the above ratio and the polyoxyalkylene group having an alkenyl group in the side chain were prepared at the above ratio. By subsequent heating (below The precursor of the sixth polyfluorene thermoplastic-thermosetting adhesive composition is reacted with a polyoxyalkylene group having an alkenyl group in a side chain. Further, the solvent is distilled off as needed.

藉此,可獲得第6聚矽氧熱塑性-熱硬化性接著劑組合物。 Thereby, a sixth polyoxyl thermoplastic-thermosetting adhesive composition can be obtained.

所獲得之第6聚矽氧熱塑性-熱硬化性接著劑組合物為固體狀。因籠型八倍半矽氧烷之位阻而導致兩末端含有烯基之聚矽氧烷之運動性降低,故而以固體狀之形式獲得第6聚矽氧熱塑性-熱硬化性接著劑組合物。 The obtained sixth polyoxyxene thermoplastic-thermosetting adhesive composition was a solid. The sixth polyfluorene thermoplastic-thermosetting adhesive composition is obtained in the form of a solid due to the steric hindrance of the alkenyl group-containing polyoxane at the two ends due to the steric hindrance of the cage sesquioxane. .

並且,由於第6聚矽氧熱塑性-熱硬化性接著劑組合物之籠型八倍半矽氧烷中之一價烴基:氫之莫耳比在特定範圍內,故而於籠型八倍半矽氧烷中,對與兩末端含有烯基之聚矽氧烷之烯基進行反應之氫矽烷基之比率進行調整。並且,兩末端含有烯基之聚矽氧烷係以該烯基之莫耳數成為比籠型八倍半矽氧烷之氫矽烷基之莫耳數少之方式與籠型八倍半矽氧烷進行反應。因此,所獲得之第6聚矽氧熱塑性-熱硬化性接著劑組合物之透明性及耐熱性優異並且可兼具熱塑性及熱硬化性。 Further, since the molar hydrocarbon group of one of the cage-type sesquioxanes of the sixth polyoxy-thermo-thermosetting adhesive composition is in a specific range, it is in the cage type of sesquiterpene. In the oxane, the ratio of the hydroquinone group which reacts with the alkenyl group of the polyoxyalkylene group having an alkenyl group at both terminals is adjusted. Further, the polyoxyalkylene group having an alkenyl group at both ends is such that the molar number of the alkenyl group is less than the molar number of the hydroquinone alkyl group of the cage type sesquioxane and the cage type octadequivalent oxygen The alkane is reacted. Therefore, the obtained sixth polyoxyxene thermoplastic-thermosetting adhesive composition is excellent in transparency and heat resistance and can have both thermoplasticity and thermosetting property.

即,第6聚矽氧熱塑性-熱硬化性接著劑組合物藉由上述加熱而暫時塑化(或液狀化),其後進行熱硬化。 That is, the sixth polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition is temporarily plasticized (or liquidized) by the above heating, and then thermally cured.

第6聚矽氧熱塑性-熱硬化性接著劑組合物之熱塑性係根據藉由加熱而使籠型八倍半矽氧烷及兩末端含有烯基之聚矽氧烷之運動性提昇來表現。 The thermoplasticity of the sixth polyoxyl thermoplastic-thermosetting adhesive composition is expressed by the improvement of the mobility of the cage sesquioxane and the polyoxyalkylene having alkenyl groups at both ends by heating.

再者,第6聚矽氧熱塑性-熱硬化性接著劑組合物之熱塑溫度例如為40℃以上,較佳為50℃以上,又,例如為150℃以下,較佳為100℃以下。再者,熱塑溫度係第6聚矽氧熱塑性-熱硬化性接著劑組合物顯示出熱塑性之溫度,具體而言,其係固體狀之第6聚矽氧熱塑性-熱硬化性接著劑組合物藉由加熱而軟化並完全成為液體狀之溫度,且實質上與軟化溫度相同。 Further, the thermoplastic temperature of the sixth polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition is, for example, 40 ° C or higher, preferably 50 ° C or higher, and further preferably 150 ° C or lower, preferably 100 ° C or lower. Further, the thermoplastic temperature-based sixth polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition exhibits a thermoplastic temperature, specifically, a solid 6-polyoxy-thermoplastic-thermosetting adhesive composition. The temperature which softens by heating and becomes completely liquid, and is substantially the same as the softening temperature.

經暫時塑化之第6聚矽氧熱塑性-熱硬化性接著劑組合物之熱硬化性,具體而言係藉由使第6聚矽氧熱塑性-熱硬化性接著劑組合物前驅物中所殘存之氫矽烷基與側鏈含有烯基之聚矽氧烷之烯基進行反應而表現。 The thermosetting property of the temporarily plasticized sixth polyoxyxene thermoplastic-thermosetting adhesive composition is specifically retained by the precursor of the sixth polyfluorene thermoplastic-thermosetting adhesive composition. The hydroquinone group is represented by a reaction with an alkenyl group of a polyoxyalkylene group having an alkenyl group in a side chain.

更具體而言,使第6聚矽氧熱塑性-熱硬化性接著劑組合物前驅物中之籠型八倍半矽氧烷之氫矽烷基與側鏈含有烯基之聚矽氧烷之烯基進行矽氫化反應。 More specifically, the hydrofluorenyl group of the cage-type sesquioxaxane in the precursor of the sixth polyfluorene thermoplastic-thermosetting adhesive composition and the alkenyl group-containing polyoxyalkylene alkoxy group in the side chain A hydrazine hydrogenation reaction is carried out.

又,第6聚矽氧熱塑性-熱硬化性接著劑組合物之熱硬化溫度相對較低,例如為100~250℃,較佳為120~250℃。熱硬化溫度係第6聚矽氧熱塑性-熱硬化性接著劑組合物顯示出熱硬化性之溫度,具體而言,其係經塑化之第6聚矽氧熱塑性-熱硬化性接著劑組合物藉由加熱而硬化並完全成為固體狀之溫度。 Further, the thermosetting temperature of the sixth polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition is relatively low, and is, for example, 100 to 250 ° C, preferably 120 to 250 ° C. The thermosetting temperature is a temperature at which the sixth polyoxy-thermoplastic thermoplastic-thermosetting adhesive composition exhibits thermosetting properties, specifically, a plasticized sixth polyoxyxene thermoplastic-thermosetting adhesive composition. The temperature which hardens by heating and becomes completely solid.

於該第6聚矽氧熱塑性-熱硬化性接著劑組合物中,藉由使側鏈含有烯基之聚矽氧烷之烯基與籠型八倍半矽氧烷之殘餘之氫矽烷基進行反應,而可使籠型八倍半矽氧烷交聯。因此,可使第6聚矽氧熱塑性-熱硬化性接著劑組合物之柔軟性提高。 In the sixth polyoxyl thermoplastic-thermosetting adhesive composition, the alkenyl group of the polyoxyalkylene group having an alkenyl group in the side chain and the residual hydroalkylalkyl group of the cage sesquioxaxane are carried out. The reaction can be used to crosslink the cage sesquioxaxane. Therefore, the flexibility of the sixth polyoxyxene thermoplastic-thermosetting adhesive composition can be improved.

又,可降低第6聚矽氧熱塑性-熱硬化性接著劑組合物之熱硬化溫度(例如為100~250℃)。 Further, the heat hardening temperature (for example, 100 to 250 ° C) of the sixth polyoxyn thermoplastic/thermosetting adhesive composition can be lowered.

上述聚矽氧熱塑性-熱硬化性接著劑組合物例如形成為片狀、塊狀(block)、粒狀(粉狀)等之聚矽氧成形體(參照如下述圖2之假想線所表示之符號9)。較佳成形為塊狀之聚矽氧成形體。 The polyoxyxene thermoplastic-thermosetting adhesive composition is formed, for example, in the form of a sheet, a block, or a granular (powder) polymer (see the imaginary line shown in FIG. 2 below). Symbol 9). It is preferably formed into a block-shaped polyoxynitride molded body.

並且,於該螢光體層黏貼套組中,聚矽氧黏接著劑組合物之下述剝離強度之百分率為30%以上,較佳為35%以上,更佳為40%以上,又,例如亦為200%以下,較佳為150%以下。 Further, in the phosphor layer adhesive set, the polyether oxide adhesive composition has a percentage of the following peel strength of 30% or more, preferably 35% or more, more preferably 40% or more, and, for example, It is 200% or less, preferably 150% or less.

剝離強度之百分率=[(75℃環境下之剝離強度PS75℃)/(25℃環境下之剝離強度PS25℃)]×100 Percentage of peel strength = [(peel strength PS 75 ° C in 75 ° C environment) / (peel strength PS 25 ° C in 25 ° C environment)] × 100

75℃環境下之剝離強度PS75℃係將由聚矽氧黏接著劑組合物形成且積層於支持體上之黏接著劑層黏貼於螢光體層上,其後,於溫度75℃下以剝離角度180度、速度300mm/min將支持體及黏接著劑層自螢光體層剝離時的剝離強度。即,其係於75℃環境下之黏接著劑層對於螢光體層之剝離強度。再者,於剝離強度之評價中之黏接著劑層之厚度為40μm。 Peel strength at 75 ° C. PS 75 ° C is a layer of adhesive formed by a poly-xylene adhesive composition and laminated on a support, adhered to the phosphor layer, and then at a temperature of 75 ° C at a peel angle The peel strength at the time when the support and the adhesive layer were peeled off from the phosphor layer at 180 degrees and at a speed of 300 mm/min. That is, it is the peel strength of the adhesive layer to the phosphor layer in an environment of 75 ° C. Further, the thickness of the adhesive layer in the evaluation of the peel strength was 40 μm.

25℃環境下之剝離強度PS25℃係將由聚矽氧黏接著劑組合物形成且積層於支持體上之黏接著劑層黏貼於螢光體層上,其後,於溫度75℃下以剝離角度180度、速度300mm/min將支持體及黏接著劑層自螢光體層剝離時的剝離強度。即,其係於25℃環境下之黏接著劑層對於螢光體層之剝離強度。再者,於剝離強度之評價中之黏接著劑層之厚度為40μm。 Peel strength at 25 ° C environment PS 25 ° C is a layer of adhesive formed by a poly-xylene adhesive composition and laminated on a support, adhered to the phosphor layer, and then at a temperature of 75 ° C at a peel angle The peel strength at the time when the support and the adhesive layer were peeled off from the phosphor layer at 180 degrees and at a speed of 300 mm/min. That is, it is the peel strength of the adhesive layer to the phosphor layer at 25 ° C. Further, the thickness of the adhesive layer in the evaluation of the peel strength was 40 μm.

若剝離強度之百分率未達30%,則存在由聚矽氧黏接著劑組合物所形成之接著劑層自螢光體層界面剝離之不良情況。 If the percentage of the peel strength is less than 30%, there is a problem that the adhesive layer formed of the polyxylene adhesive composition is peeled off from the interface of the phosphor layer.

另一方面,若聚矽氧黏接著劑組合物之接著力為上述上限以下,則於黏貼對象即LED2(參照圖1~圖9)或LED封裝體10(參照圖8及圖9)上有損傷,於該情形時,可自該等上暫時剝離下述螢光黏貼片6(參照圖2(b)),而易實施對該等進行維修之修復。 On the other hand, when the adhesive force of the polyoxymethylene adhesive composition is not more than the above upper limit, the LED 2 (see FIGS. 1 to 9 ) or the LED package 10 (see FIGS. 8 and 9 ) which is the target of adhesion is provided. In this case, the fluorescent adhesive sheet 6 (see Fig. 2(b)) can be temporarily peeled off from the above, and the repair for the maintenance can be easily performed.

其次,針對於使用上述本發明之螢光體層黏貼套組之一實施形態所獲得之LED-螢光體層黏貼體1,參照圖1進行說明。 Next, the LED-phosphor layer adhesive 1 obtained by using one embodiment of the above-described phosphor layer adhesive set of the present invention will be described with reference to Fig. 1 .

圖1中,作為本發明之一實施形態之LED-螢光體層黏貼體1包括:LED2、於LED2之上側相對向配置之螢光體層3、及介於LED2及螢光體層3之間之聚矽氧黏接著劑層4。 In Fig. 1, an LED-phosphor layer adhesive 1 according to an embodiment of the present invention includes an LED 2, a phosphor layer 3 disposed opposite to the upper side of the LED 2, and a cluster between the LED 2 and the phosphor layer 3. The epoxy adhesive layer 4 is.

LED2係剖面大致矩形之大致平板形狀,並由公知之半導體材料形成。又,雖未圖示,但LED2上設置有用以與下述基板5(參照圖4)之基板側端子電性連接之LED側端子。 The LED 2 has a substantially rectangular plate shape having a substantially rectangular cross section and is formed of a known semiconductor material. Further, although not shown, the LED 2 is provided with an LED-side terminal electrically connected to the substrate-side terminal of the substrate 5 (see FIG. 4) described below.

又,聚矽氧黏接著劑層4黏貼了LED2及螢光體層3。再者,所謂黏貼,包括基於包含聚矽氧感壓接著劑組合物之聚矽氧黏接著劑層4之黏性的感壓接著(黏著)、及基於對包含聚矽氧熱塑性-熱硬化性接著劑組合物之聚矽氧黏接著劑層4進行熱塑後之熱硬化的接著等黏接著。 Further, the polyadox adhesive layer 4 is adhered to the LED 2 and the phosphor layer 3. Further, the adhesive includes a pressure-sensitive adhesive (adhesive) based on the adhesive layer of the polyoxynoxy adhesive layer 4 containing the polyoxygen-containing pressure-sensitive adhesive composition, and a thermoplastic-thermosetting property based on the inclusion of polyfluorene oxide. The polyoxycarbide adhesive layer 4 of the subsequent composition is subjected to thermal hardening followed by thermal hardening followed by adhesion.

就黏接著性(黏貼性)之觀點而言,聚矽氧黏接著劑層4之厚度例如5μm以上,又,例如亦為200μm以下,就傳導由LED2及螢光體層3所發出之熱之觀點而言,較佳為100μm以下,更佳為50μm以下。 From the viewpoint of adhesion (adhesiveness), the thickness of the polyoxygen adhesive layer 4 is, for example, 5 μm or more, and, for example, 200 μm or less, the viewpoint of the heat emitted by the LED 2 and the phosphor layer 3 is transmitted. It is preferably 100 μm or less, more preferably 50 μm or less.

<螢光體層黏貼套組之第1使用方法> <The first use method of the phosphor layer adhesive set>

其次,作為螢光體層黏貼套組之第1使用方法,係製造LED-螢光體層黏貼體1之方法,參照圖2之實線,對LED-螢光體層黏貼體1中之聚矽氧黏接著劑層4包含聚矽氧感壓接著劑組合物之態樣進行說明。 Next, as a first method of using the phosphor layer adhesive set, the method of manufacturing the LED-phosphor layer adhesive body 1 is described. Referring to the solid line of FIG. 2, the polyfluorene oxide in the LED-phosphor layer adhesive body 1 is adhered. The following description will be made on the aspect in which the agent layer 4 contains a polyfluorene pressure-sensitive adhesive composition.

於該方法中,如圖2(a)所示,首先準備螢光體層3。 In this method, as shown in Fig. 2(a), the phosphor layer 3 is first prepared.

繼而,於該方法中,如圖2(b)所示,於螢光體層3之上表面積層包含聚矽氧感壓接著劑組合物之聚矽氧黏接著劑層4。 Then, in this method, as shown in Fig. 2(b), the surface layer on the surface of the phosphor layer 3 comprises a polyoxyoxygen adhesive layer 4 of a polyfluorene pressure-sensitive adhesive composition.

具體而言,於將聚矽氧感壓接著劑組合物製備為清漆之情形時,於螢光體層3之整個上表面塗佈或滴下清漆。藉此,形成聚矽氧感壓接著劑組合物之皮膜4'。繼而,視需要蒸餾去除溶劑。 Specifically, when the polyfluorene pressure-sensitive adhesive composition is prepared as a varnish, the varnish is applied or dropped on the entire upper surface of the phosphor layer 3. Thereby, the film 4' of the polyfluorene pressure-sensitive adhesive composition is formed. Then, the solvent is distilled off as needed.

藉此,於螢光體層3之表面形成包含聚矽氧感壓接著劑組合物之聚矽氧黏接著劑層4(即聚矽氧感壓接著劑層)。 Thereby, a polyoxygen oxide adhesive layer 4 (that is, a polyfluorene pressure-sensitive adhesive layer) containing a polyfluorene pressure-sensitive adhesive composition is formed on the surface of the phosphor layer 3.

藉此,獲得於螢光體層3上積層有聚矽氧黏接著劑層4之螢光黏貼片6。 Thereby, the fluorescent adhesive sheet 6 in which the polyoxygen adhesive layer 4 is laminated on the phosphor layer 3 is obtained.

其後,於該方法中,如圖2(c)所示,將螢光黏貼片6與LED2貼合。具體而言,經由聚矽氧黏接著劑層4感壓接著LED2與螢光體層3。即,使LED2之下表面與聚矽氧黏接著劑層4之上表面接觸。 Thereafter, in this method, as shown in FIG. 2(c), the fluorescent adhesive sheet 6 is bonded to the LED 2. Specifically, the LED 2 and the phosphor layer 3 are pressed by the polyoxygen adhesive layer 4 . That is, the lower surface of the LED 2 is brought into contact with the upper surface of the polyadox adhesive layer 4.

螢光黏貼片6與LED2之貼合係於常溫(具體而言為20~25℃)下實 施。或者視需要亦可將螢光黏貼片6加熱至例如30~50℃而實施。 The bonding of the fluorescent adhesive sheet 6 and the LED 2 is performed at a normal temperature (specifically, 20 to 25 ° C). Shi. Alternatively, the fluorescent adhesive sheet 6 may be heated to, for example, 30 to 50 ° C.

再者,視需要亦可對螢光體層3以適當之壓力推壓LED2。又,視情況,可藉由該推壓來控制聚矽氧黏接著劑層4之厚度。 Further, the phosphor layer 3 may be pressed against the phosphor layer 3 with an appropriate pressure as needed. Further, depending on the case, the thickness of the polyoxygen adhesive layer 4 can be controlled by the pressing.

藉此,製造藉由聚矽氧黏接著劑層4而感壓接著(黏著)有LED2與螢光體層3的LED-螢光體層黏貼體1。 Thereby, the LED-phosphor layer adhesive 1 in which the LED 2 and the phosphor layer 3 are pressure-sensitive (adhered) by the polyoxygen adhesive layer 4 is manufactured.

其次,參照圖4,對於基板5上安裝圖2(c)之LED-螢光體層黏貼體1之LED2而製造LED裝置7之方法進行說明。 Next, a method of manufacturing the LED device 7 by mounting the LED 2 of the LED-phosphor layer adhesive 1 of Fig. 2(c) on the substrate 5 will be described with reference to Fig. 4 .

該方法中,首先,如圖4(a)所示,分別準備基板5與LED-螢光體層黏貼體1。 In this method, first, as shown in FIG. 4(a), the substrate 5 and the LED-phosphor layer adhesive 1 are prepared separately.

基板5係形成為俯視下比LED-螢光體層黏貼體1稍大之平板狀。基板5例如包括矽基板、陶瓷基板、聚醯亞胺樹脂基板、金屬基板上積層有絕緣層之積層基板等絕緣基板。 The substrate 5 is formed in a flat shape slightly larger than the LED-phosphor layer adherend 1 in plan view. The substrate 5 includes, for example, an insulating substrate such as a tantalum substrate, a ceramic substrate, a polyimide substrate, or a laminated substrate in which an insulating layer is laminated on a metal substrate.

又,於基板5之上表面形成有具備用以與LED2之LED側端子(未圖示)電性連接之基板側端子(未圖示)、及與其連接之配線的導體圖案(未圖示)。導體圖案例如係由金、銅、銀、鎳等導體形成。 Further, a conductor pattern (not shown) including a substrate-side terminal (not shown) electrically connected to an LED-side terminal (not shown) of the LED 2 and a wiring connected thereto is formed on the upper surface of the substrate 5. . The conductor pattern is formed, for example, of a conductor such as gold, copper, silver, or nickel.

又,以LED2朝下之方式將LED-螢光體層黏貼體1配置於基板5之上側。 Further, the LED-phosphor layer adhesive 1 is placed on the upper side of the substrate 5 with the LEDs 2 facing downward.

繼而,如圖4(b)所示,將LED-螢光體層黏貼體1之LED2安裝於基板5上。具體而言,於基板5之基板側端子(未圖示)上覆晶安裝或焊線接合連接LED2之LED側端子(未圖示)。再者,於基板5上焊線接合連接LED2之情形時,將黏貼於LED2上之螢光黏貼片6形成為避開焊線(迂迴)之形狀。 Then, as shown in FIG. 4(b), the LED 2 of the LED-phosphor layer adhesive body 1 is mounted on the substrate 5. Specifically, an LED-side terminal (not shown) of the LED 2 is flip-chip mounted or wire bonded to a substrate-side terminal (not shown) of the substrate 5. Further, when the LEDs 2 are bonded to the substrate 5 by bonding wires, the fluorescent adhesive sheets 6 adhered to the LEDs 2 are formed to avoid the shape of the bonding wires.

藉此,獲得包含基板5與LED-螢光體層黏貼體1,且於基板5上安裝有LED-螢光體層黏貼體1之LED2的LED裝置7。 Thereby, the LED device 7 including the substrate 5 and the LED-phosphor layer adhesive 1 and the LED 2 of the LED-phosphor layer adhesive 1 attached to the substrate 5 is obtained.

再者,其後,視需要亦可如圖4(b)之假想線所示,於LED裝置7上設置第1密封層8。第1密封層8係於基板5上以被覆LED2及螢光黏貼 片6之方式由透明樹脂形成。於將第1密封層8設置在LED裝置7上之後,視需要例如藉由切割等調整尺寸。 Further, thereafter, the first sealing layer 8 may be provided on the LED device 7 as shown by the imaginary line in FIG. 4(b) as needed. The first sealing layer 8 is attached to the substrate 5 to cover the LED 2 and the fluorescent paste. The form of the sheet 6 is formed of a transparent resin. After the first sealing layer 8 is placed on the LED device 7, it is adjusted in size, for example, by cutting or the like.

並且,於該螢光體層黏貼套組中,用以將螢光體層3黏貼於LED2上之聚矽氧黏接著劑組合物之剝離強度之百分率為30%以上,故而耐熱性及耐久性優異。 Further, in the phosphor layer adhesive set, the polyether oxide adhesive composition for adhering the phosphor layer 3 to the LED 2 has a peel strength of 30% or more, and is excellent in heat resistance and durability.

詳細而言,由於可防止聚矽氧黏接著劑組合物於高溫(例如包括75℃在內之高溫)下之接著力與聚矽氧黏接著劑組合物於常溫(25℃)下之接著力相比明顯降低,故而可確保優異之耐熱性。 In detail, since the adhesion of the polyoxyxylene adhesive composition at a high temperature (for example, a high temperature including 75 ° C) and the adhesion of the polyoxygen adhesive composition to a normal temperature (25 ° C) can be prevented. Compared with the significant reduction, excellent heat resistance can be ensured.

因此,包含LED2、及螢光黏貼片6之LED裝置7可長時間確保優異之發光可靠性,該螢光黏貼片6係由螢光體層黏貼套組製作者,且螢光體層3係經由包含聚矽氧黏接著劑組合物之聚矽氧系黏接著劑層4而黏貼於LED2上。 Therefore, the LED device 7 including the LED 2 and the fluorescent adhesive sheet 6 can ensure excellent light-emitting reliability for a long period of time. The fluorescent adhesive sheet 6 is made of a phosphor layer adhesive set manufacturer, and the phosphor layer 3 is included. The polyoxynoxy adhesive layer 4 of the polyoxygen adhesive composition is adhered to the LED 2.

<螢光體層黏貼套組之第2使用方法> <Second use method of phosphor layer adhesive set>

其次,作為螢光體層黏貼套組之第2使用方法,係製造LED-螢光體層黏貼體1之方法,參照圖2之假想線,對LED-螢光體層黏貼體中之聚矽氧黏接著劑層4包含聚矽氧熱塑性-熱硬化性接著劑組合物之態樣進行說明。 Next, as a second method of using the phosphor layer adhesive set, the method of manufacturing the LED-phosphor layer adhesive 1 is carried out. Referring to the imaginary line of FIG. 2, the polyoxygen in the LED-phosphor layer adhesive is adhered. The agent layer 4 is described by including a polyoxyxene thermoplastic-thermosetting adhesive composition.

該方法中,如圖2(a)所示,首先準備螢光體層3。 In this method, as shown in FIG. 2(a), the phosphor layer 3 is first prepared.

其後,對螢光體層3進行加熱。具體而言,使螢光體層3與熱板15(假想線)接觸。詳細而言,於熱板15(假想線)之上表面載置螢光體層3。 Thereafter, the phosphor layer 3 is heated. Specifically, the phosphor layer 3 is brought into contact with the hot plate 15 (imaginary line). Specifically, the phosphor layer 3 is placed on the upper surface of the hot plate 15 (hypothetical line).

熱板5之溫度例如係調整為上述聚矽氧熱塑性-熱硬化性接著劑組合物之熱塑溫度,具體而言,例如40℃以上,較佳為50℃以上,更佳為80℃以上,例如為200℃以下,較佳為150℃以下,更佳為100℃以下。 The temperature of the hot plate 5 is adjusted, for example, to the thermoplastic temperature of the polyfluorene thermoplastic-thermosetting adhesive composition, and specifically, for example, 40 ° C or higher, preferably 50 ° C or higher, more preferably 80 ° C or higher. For example, it is 200 ° C or less, preferably 150 ° C or less, more preferably 100 ° C or less.

繼而,於該方法中,如圖2(b)所示,於螢光體層3之上表面積層 聚矽氧黏接著劑層4。 Then, in the method, as shown in FIG. 2(b), the surface layer is above the phosphor layer 3. Polyoxygen adhesive layer 4.

具體而言,於螢光體層3之上表面載置上述形狀之聚矽氧成形體9(假想線)、較佳為塊狀之聚矽氧成形體9。 Specifically, a polyoxynitride molded body 9 (imaginary line) of the above shape, preferably a block-shaped polyoxynitride molded body 9, is placed on the upper surface of the phosphor layer 3.

例如聚矽氧成形體9之底面積S1比螢光體層3之上表面之面積S2小(S1<S2),具體而言,該等之比(=S1/S2)例如為0.1以上,較佳為0.6以上,又,例如未達1,較佳為0.95以下。 For example, the bottom area S1 of the polyoxynitride molded body 9 is smaller than the area S2 of the upper surface of the phosphor layer 3 (S1 < S2), and specifically, the ratio (= S1/S2) is, for example, 0.1 or more, preferably. It is 0.6 or more, and, for example, it is less than 1, preferably 0.95 or less.

於聚矽氧成形體9之底面積S1比螢光體層3之上表面之面積S2小之情形(S1<S2)時,例如將聚矽氧成形體9載置於螢光體層3之上表面之中央部。 When the bottom area S1 of the polyoxynitride molded body 9 is smaller than the area S2 of the upper surface of the phosphor layer 3 (S1 < S2), for example, the polyoxynitride molded body 9 is placed on the upper surface of the phosphor layer 3. Central part.

並且,由於在熱板15(假想線)上載置有螢光體層3,故而進行加熱,藉此使聚矽氧成形體9塑化。 Further, since the phosphor layer 3 is placed on the hot plate 15 (hypothetical line), heating is performed to plasticize the polyoxynitride molded body 9.

藉由上述塑化,聚矽氧成形體9流動於螢光體層3之上表面。例如於將聚矽氧成形體9載置於螢光體層3之上表面之中央部之情形時,如圖2(a)之假想線箭頭所示,螢光體層3沿面方向(沿螢光體層3之上表面之方向)外側、具體係自螢光體層3之中央部向周端部擴散。 By the above plasticization, the polyoxynitride molded body 9 flows on the upper surface of the phosphor layer 3. For example, when the polyoxynitride molded body 9 is placed on the central portion of the upper surface of the phosphor layer 3, as shown by the imaginary line arrow in Fig. 2(a), the phosphor layer 3 is in the plane direction (along the phosphor layer). The outer side of the direction of the upper surface of the upper surface 3 is specifically diffused from the central portion of the phosphor layer 3 toward the peripheral end portion.

再者,聚矽氧成形體9例如在不會自螢光體層3之上表面濺落之情況下流動。 Further, the polyoxynitride molded body 9 flows, for example, without splashing from the upper surface of the phosphor layer 3.

藉此,如圖2(b)所示,使所擴散之聚矽氧熱塑性-熱硬化性接著劑組合物於面方向上以均勻之厚度積層於螢光體層3之上表面。藉此,聚矽氧熱塑性-熱硬化性接著劑組合物之皮膜4'形成於螢光體層3之整個上表面。 Thereby, as shown in FIG. 2(b), the diffused polyoxyl thermoplastic-thermosetting adhesive composition is laminated on the upper surface of the phosphor layer 3 in a uniform thickness in the plane direction. Thereby, the film 4' of the polyoxyxene thermoplastic-thermosetting adhesive composition is formed on the entire upper surface of the phosphor layer 3.

繼而,於螢光體層3上經由聚矽氧熱塑性-熱硬化性接著劑組合物之皮膜4'積層LED2。即,使LED2與皮膜4'接觸。 Then, the LED 2 is laminated on the phosphor layer 3 via the film 4' of the polyoxyxene thermoplastic-thermosetting adhesive composition. That is, the LED 2 is brought into contact with the film 4'.

其後,自熱板15(假想線)取出(取下)經由皮膜4'積層有LED2之螢光體層3,並將該螢光體層3載置於室溫(20~25℃)下之台(未圖示)之上表面。 Thereafter, the phosphor layer 3 in which the LED 2 is laminated via the film 4' is taken out (taken off) from the hot plate 15 (imaginary line), and the phosphor layer 3 is placed on the table at room temperature (20 to 25 ° C). (not shown) the upper surface.

藉此,冷卻聚矽氧熱塑性-熱硬化性接著劑組合物之皮膜4'而使其固體化。 Thereby, the film 4' of the polyfluorene thermoplastic-thermosetting adhesive composition is cooled and solidified.

藉此,如圖2(b)所示,包含固體狀之聚矽氧熱塑性-熱硬化性接著劑組合物之聚矽氧黏接著劑層4(即聚矽氧熱塑性-熱硬化性接著劑層)將螢光體層3及LED2接著。即,聚矽氧黏接著劑層4密接於螢光體層3之整個上表面及LED2之整個下表面。 Thereby, as shown in FIG. 2(b), the polyoxyxylene adhesive layer 4 comprising a solid polyoxyxene thermoplastic-thermosetting adhesive composition (ie, a polyoxyl thermoplastic-thermosetting adhesive layer) The phosphor layer 3 and the LED 2 are next. That is, the polyoxygen adhesive layer 4 is in close contact with the entire upper surface of the phosphor layer 3 and the entire lower surface of the LED 2.

藉此,製造藉由聚矽氧黏接著劑層4並基於該熱硬化而接著有LED2與螢光體層3的LED-螢光體層黏貼體1。 Thereby, the LED-phosphor layer adherend 1 in which the LED 2 and the phosphor layer 3 are followed by the thermal curing by the polyoxygen adhesive layer 4 is produced.

繼而,使用該LED-螢光體層黏貼體1,製造LED裝置7。 Then, the LED device 7 is manufactured using the LED-phosphor layer adhesive 1.

於第2使用方法中,作為使用LED-螢光體層黏貼體1製造LED裝置7之方法,採用與圖4(a)及圖4(b)所示之第1使用方法相同之方式。 In the second method of use, the method of manufacturing the LED device 7 using the LED-phosphor layer adhesive 1 is the same as the first method of use shown in FIGS. 4(a) and 4(b).

並且,根據第2使用方法,可發揮與第1使用方法相同之作用效果,進而,使用固體狀之聚矽氧熱塑性-熱硬化性接著劑組合物形成聚矽氧黏接著劑層4,因此,可提高螢光體層黏貼套組之操作性。 Further, according to the second method of use, the same effects as those of the first method of use can be exhibited, and further, the polymerized polyoxyxide thermoplastic-thermosetting adhesive composition can be used to form the polyoxygen adhesive layer 4, and therefore, Improves the operability of the phosphor layer adhesive set.

<其他實施形態> <Other Embodiments>

於圖3及圖5~圖9之各圖式中,對與上述各部對應之構件及工程賦予相同之參照符號,省略其詳細說明。 In the drawings of FIG. 3 and FIG. 5 to FIG. 9 , the same reference numerals are given to the members and the components corresponding to the above-described respective portions, and the detailed description thereof will be omitted.

於上述第1及第2使用方法中,作為螢光體層黏貼套組之使用方法,如圖2(b)所示,於螢光體層3上積層聚矽氧黏接著劑層4,形成螢光黏貼片6,其後,如圖2(c)所示,將聚矽氧黏接著劑層4與LED2貼合。另一方面,亦可例如圖3(b)所示,首先,於LED2上積層聚矽氧黏接著劑層4,其後,如圖3(c)所示,將聚矽氧黏接著劑層4與螢光體層3貼合。 In the first and second methods of use, as a method of using the phosphor layer adhesive package, as shown in FIG. 2(b), a polysilicon adhesive layer 4 is laminated on the phosphor layer 3 to form a fluorescent layer. After the adhesive sheet 6 is adhered, as shown in Fig. 2(c), the polyoxygen adhesive layer 4 is bonded to the LED 2. On the other hand, for example, as shown in FIG. 3(b), first, a polysilicon adhesive layer 4 is laminated on the LED 2, and thereafter, as shown in FIG. 3(c), a polyoxygen adhesive layer is laminated. 4 is bonded to the phosphor layer 3.

於該方法中,如圖3(a)所示,首先準備LED2。 In this method, as shown in FIG. 3(a), the LED 2 is first prepared.

繼而,於該方法中,如圖3(b)所示,於LED2之上表面積層聚矽氧黏接著劑層4。 Then, in this method, as shown in FIG. 3(b), the surface of the LED 2 is laminated on the surface of the epoxy adhesive layer 4.

其後,如圖3(c)所示,將聚矽氧黏接著劑層4與螢光體層3貼合。具體而言,使螢光體層3之下表面與聚矽氧黏接著劑層4之上表面接觸。 Thereafter, as shown in FIG. 3(c), the polyoxygen adhesive layer 4 is bonded to the phosphor layer 3. Specifically, the lower surface of the phosphor layer 3 is brought into contact with the upper surface of the polyadox adhesive layer 4.

進而,於圖2及圖3之實施形態中,於LED2及螢光體層3之任一者上積層聚矽氧黏接著劑層4,其後,將聚矽氧黏接著劑層4與另一者貼合,但亦可例如圖2(b)及圖3(b)所示,於LED2及螢光體層3之兩者上積層,其後,經由2個聚矽氧黏接著劑層4貼合LED2及螢光體層3。 Further, in the embodiment of FIGS. 2 and 3, a polysilicon adhesive layer 4 is laminated on either of the LED 2 and the phosphor layer 3, and thereafter, the polyoxygen adhesive layer 4 is bonded to the other. For example, as shown in FIG. 2(b) and FIG. 3(b), a layer is laminated on both the LED 2 and the phosphor layer 3, and then pasted through two layers of the polyoxygen adhesive layer 4. LED2 and phosphor layer 3 are combined.

於圖1之實施形態之LED-螢光體層黏貼體1中,僅3於LED2之上表面經由聚矽氧黏接著劑層4接著有螢光體層,但亦可例如圖5(a)之上側圖所示,於LED2之上表面及側面經由聚矽氧黏接著劑層4進行接著。 In the LED-phosphor layer adhesive 1 of the embodiment of FIG. 1, only the upper surface of the LED 2 is followed by a phosphor layer via the polyoxygen adhesive layer 4, but may be, for example, the upper side of FIG. 5(a). As shown in the figure, the upper surface and the side surface of the LED 2 are adhered via the polysilicon adhesive layer 4.

如圖5(a)之上側圖所示,於LED2之上表面及側面連續積層有聚矽氧黏接著劑層4。 As shown in the upper side view of Fig. 5(a), a polyoxygen adhesive layer 4 is continuously laminated on the upper surface and the side surface of the LED 2.

又,於聚矽氧黏接著劑層4之表面(上表面及側面)積層有螢光體層3。 Further, a phosphor layer 3 is laminated on the surface (upper surface and side surface) of the polyoxygen adhesive layer 4.

將螢光體層3及聚矽氧系感壓接著劑層4形成為下方打開之剖面大致字形狀。 The phosphor layer 3 and the polyfluorinated pressure-sensitive adhesive layer 4 are formed to have a cross section that is opened downward. Word shape.

藉此,經由聚矽氧黏接著劑層4,對LED2之上表面及側面之兩面接著螢光體層3。 Thereby, the phosphor layer 3 is adhered to both surfaces of the upper surface and the side surface of the LED 2 via the polyoxygen adhesive layer 4.

為了獲得圖5(a)所示之LED-螢光體層黏貼體1,參照圖2(a),以比LED2大之尺寸形成螢光體層3,繼而,參照圖2(b),於螢光體層3之整個上表面積層聚矽氧黏接著劑層4,獲得尺寸比LED2大之螢光黏貼片6。 In order to obtain the LED-phosphor layer adhesive 1 shown in FIG. 5(a), referring to FIG. 2(a), the phosphor layer 3 is formed in a larger size than the LED 2, and then, referring to FIG. 2(b), in the fluorescent light The entire upper surface area of the bulk layer 3 is layered on the epoxy adhesive layer 4 to obtain a fluorescent adhesive sheet 6 having a size larger than that of the LED 2.

繼而,如圖5(a)所示,以於LED2之上表面及側面積層聚矽氧黏接著劑層4之方式將螢光黏貼片6與LED2貼合。 Then, as shown in FIG. 5(a), the fluorescent adhesive sheet 6 is bonded to the LED 2 so that the upper surface of the LED 2 and the side area layer are bonded to the epoxy adhesive layer 4.

藉此,獲得LED-螢光體層黏貼體1。 Thereby, the LED-phosphor layer adhesive body 1 is obtained.

其後,如圖5(b)所示,藉由於基板5上安裝所獲得之LED-螢光體層黏貼體1之LED2,獲得LED裝置7。 Thereafter, as shown in FIG. 5(b), the LED device 7 is obtained by mounting the LED 2 of the obtained LED-phosphor layer adhesive 1 on the substrate 5.

其後,如圖5(b)之假想線所示,視需要於LED裝置7上設置第1密封層8。 Thereafter, as shown by the imaginary line in FIG. 5(b), the first sealing layer 8 is provided on the LED device 7 as needed.

並且,圖5(a)所示之LED-螢光體層黏貼體1與圖5(b)所示之LED裝置7發揮與上述相同之作用效果。 Further, the LED-phosphor layer adherend 1 shown in FIG. 5(a) and the LED device 7 shown in FIG. 5(b) exhibit the same operational effects as described above.

又,於圖4之實施形態中,首先,如圖4(a)所示,分別製作LED-螢光體層黏貼體1與基板5,其後,如圖4(b)所示,於基板5上安裝LED-螢光體層黏貼體1之LED2。但是,如圖6所示,亦可預先於基板5上安裝LED2,並另外準備螢光黏貼片6,其後於基板5上製作LED-螢光體層黏貼體1。 Moreover, in the embodiment of FIG. 4, first, as shown in FIG. 4(a), the LED-phosphor layer adhesive 1 and the substrate 5 are separately formed, and then, as shown in FIG. 4(b), the substrate 5 is formed. The LED2 of the LED-phosphor layer adhesive body 1 is mounted thereon. However, as shown in FIG. 6, the LED 2 may be mounted on the substrate 5 in advance, and the fluorescent adhesive sheet 6 may be separately prepared, and then the LED-phosphor layer adhesive 1 may be formed on the substrate 5.

於圖6之實施形態中,如圖6(b)所示,於基板5上製作LED-螢光體層黏貼體1。 In the embodiment of Fig. 6, as shown in Fig. 6(b), the LED-phosphor layer adhesive 1 is formed on the substrate 5.

於基板5上製作LED-螢光體層黏貼體1時,首先,如圖6(a)所示,準備預先安裝於基板5上之LED2,並且預先另外準備螢光黏貼片6。 When the LED-phosphor layer adhesive 1 is produced on the substrate 5, first, as shown in FIG. 6(a), the LED 2 previously mounted on the substrate 5 is prepared, and the fluorescent adhesive sheet 6 is separately prepared in advance.

其後,如圖6(b)所示,經由聚矽氧黏接著劑層4將螢光體層3黏貼於LED2上。 Thereafter, as shown in FIG. 6(b), the phosphor layer 3 is adhered to the LED 2 via the polyoxygen adhesive layer 4.

藉此,獲得LED裝置7。 Thereby, the LED device 7 is obtained.

再者,如圖6(b)之假想線所示,視需要於LED裝置7上設置第1密封層8。 Further, as shown by the imaginary line in FIG. 6(b), the first sealing layer 8 is provided on the LED device 7 as needed.

根據圖6之實施形態,亦可發揮與圖4之實施形態相同之作用效果。 According to the embodiment of Fig. 6, the same operational effects as those of the embodiment of Fig. 4 can be exhibited.

又,如圖7(b)所示,亦可於基板5上,在LED2之上表面及側面黏貼尺寸比LED2大之螢光黏貼片6,而於基板5上形成LED-螢光體層黏貼體1。 Further, as shown in FIG. 7(b), a fluorescent adhesive sheet 6 having a larger size than the LED 2 may be adhered to the upper surface and the side surface of the LED 2 on the substrate 5, and an LED-phosphor layer adhesive layer may be formed on the substrate 5. 1.

於圖7之實施形態中,如圖7(a)所示,分別準備螢光黏貼片6、及 預先安裝於基板5上之LED2,其後,如圖7(b)所示,將螢光黏貼片6接著於LED2之上表面及側面。 In the embodiment of FIG. 7, as shown in FIG. 7(a), the fluorescent adhesive sheet 6 is prepared, and The LED 2 is mounted on the substrate 5 in advance, and thereafter, as shown in Fig. 7(b), the fluorescent adhesive sheet 6 is attached to the upper surface and the side surface of the LED 2.

其後,如圖7(b)之假想線所示,視需要設置第1密封層8。 Thereafter, as shown by the imaginary line in Fig. 7(b), the first sealing layer 8 is provided as needed.

根據圖7之實施形態,亦可發揮與圖6之實施形態相同之作用效果。 According to the embodiment of Fig. 7, the same operational effects as those of the embodiment of Fig. 6 can be exhibited.

又,於圖4~圖7之實施形態中,在LED2上黏貼有螢光黏貼片6,但例如圖8所示,亦可黏貼於LED封裝體10上。 Further, in the embodiment of FIGS. 4 to 7, the fluorescent adhesive sheet 6 is adhered to the LED 2, but it may be adhered to the LED package 10 as shown, for example, in FIG.

圖8(a)中,LED封裝體10包含:基板5、安裝於基板5上之LED2、形成於基板5上且以於厚度方向上進行投影時包圍LED2之方式所配置的反射器11、及填充於反射器11內且密封LED2之第2密封層12。 In FIG. 8(a), the LED package 10 includes a substrate 5, an LED 2 mounted on the substrate 5, a reflector 11 formed on the substrate 5 and surrounding the LED 2 when projected in the thickness direction, and The second sealing layer 12 of the LED 2 is sealed in the reflector 11.

預先將LED2安裝於基板5上。 The LED 2 is mounted on the substrate 5 in advance.

反射器11係形成為俯視下中央開口之大致矩形框狀或大致環狀(圓環形狀或橢圓環形狀)。又,反射器11係形成為剖面觀察下寬度向上逐漸變窄之大致梯形狀。反射器11係以包圍LED2之方式與LED2隔開間隔地配置。即,LED2配置於反射器11內。 The reflector 11 is formed in a substantially rectangular frame shape or a substantially annular shape (a circular ring shape or an elliptical ring shape) having a central opening in a plan view. Further, the reflector 11 is formed into a substantially trapezoidal shape in which the width is gradually narrowed in the cross section. The reflector 11 is disposed at a distance from the LED 2 so as to surround the LED 2 . That is, the LED 2 is disposed in the reflector 11.

反射器11例如係由含有光反射成分(例如氧化鈦等)之陶瓷材料之燒結體或含有光反射成分之反射樹脂組合物等形成,並反射自LED2所發出之光。 The reflector 11 is formed, for example, of a sintered body of a ceramic material containing a light-reflecting component (for example, titanium oxide or the like) or a reflective resin composition containing a light-reflecting component, and is reflected from the light emitted from the LED 2.

第2密封層12填充於反射器11內,具體而言,其係以被覆反射器11之內側面、自LED2露出之基板5之上表面、LED2之上表面及外側面之方式形成。 The second sealing layer 12 is filled in the reflector 11, and is specifically formed to cover the inner surface of the reflector 11, the upper surface of the substrate 5 exposed from the LED 2, and the upper surface and the outer surface of the LED 2.

又,第2密封層12之上表面係以與反射器11之上表面形成沿面方向(與厚度方向正交之方向)之同一平面之方式形成。再者,雖未圖示,但亦可於第2密封層12之上表面形成有自周端部向中央部逐漸朝下凹陷之凹部(未圖示)。 Further, the upper surface of the second sealing layer 12 is formed to form the same plane as the surface of the reflector 11 in the plane direction (the direction orthogonal to the thickness direction). Further, although not shown, a concave portion (not shown) that is gradually recessed from the peripheral end portion toward the central portion may be formed on the upper surface of the second sealing layer 12.

將螢光黏貼片6黏貼於LED封裝體10上時,如圖8(a)所示,分別 準備螢光黏貼片6及LED封裝體10。 When the fluorescent adhesive sheet 6 is adhered to the LED package 10, as shown in FIG. 8(a), respectively The fluorescent adhesive sheet 6 and the LED package 10 are prepared.

繼而,於聚矽氧黏接著劑層4係由聚矽氧感壓接著劑組合物形成之情形時,如圖8(b)所示,於常溫(具體為20~25℃)下實施將螢光黏貼片6黏貼於LED封裝體10之上表面。或者視需要亦可將螢光黏貼片6加熱至例如30~50℃而實施黏貼。 Then, when the polyoxygen adhesive layer 4 is formed of a polyfluorene pressure-sensitive adhesive composition, as shown in FIG. 8(b), the fire is carried out at normal temperature (specifically, 20 to 25 ° C). The optical adhesive sheet 6 is adhered to the upper surface of the LED package 10. Alternatively, the fluorescent adhesive sheet 6 may be heated to, for example, 30 to 50 ° C for adhesion.

另一方面,於聚矽氧黏接著劑層4係由聚矽氧熱塑性-熱硬化性接著劑組合物形成之情形時,預先加熱LED封裝體10,繼而,將聚矽氧黏接著劑層4載置於LED封裝體10之上表面。藉此,於LED封裝體10之整個上表面形成有聚矽氧熱塑性-熱硬化性接著劑組合物之皮膜4'。 On the other hand, when the polyoxygen adhesive layer 4 is formed of a polyoxyxene thermoplastic-thermosetting adhesive composition, the LED package 10 is previously heated, and then the polyoxygen adhesive layer 4 is formed. It is placed on the upper surface of the LED package 10. Thereby, a film 4' of a polyoxyxene thermoplastic-thermosetting adhesive composition is formed on the entire upper surface of the LED package 10.

其後,將LED封裝體10載置於室溫(20~25℃)下之台(未圖示)之上表面,冷卻聚矽氧熱塑性-熱硬化性接著劑組合物而固體化。 Thereafter, the LED package 10 is placed on the upper surface of a stage (not shown) at room temperature (20 to 25 ° C), and the polyoxyxene thermoplastic thermosetting adhesive composition is cooled and solidified.

藉此,可製造包含於上表面經由聚矽氧黏接著劑層4接著有螢光體層3之LED封裝體10的LED裝置7。 Thereby, the LED device 7 including the LED package 10 on the upper surface via the polyoxygen adhesive layer 4 followed by the phosphor layer 3 can be manufactured.

並且,於該LED裝置7中,用以將螢光體層3黏貼於LED封裝體10上之聚矽氧黏接著劑組合物之剝離強度之百分率為30%以上,因此,耐熱性及耐久性優異。其結果,LED裝置7可長時間確保優異之發光可靠性。 Further, in the LED device 7, the polyether oxide adhesive composition for adhering the phosphor layer 3 to the LED package 10 has a peel strength of 30% or more, and therefore has excellent heat resistance and durability. . As a result, the LED device 7 can ensure excellent light-emitting reliability for a long period of time.

又,於圖8之實施形態中,如圖8(a)所示,首先於螢光體層3上積層聚矽氧黏接著劑層4,形成螢光黏貼片6,其後,如圖8(b)所示,經由聚矽氧黏接著劑層4使螢光黏貼片6之螢光體層3與LED封裝體10貼合。另一方面,例如圖9(a)所示,首先於LED封裝體10之上表面積層聚矽氧黏接著劑層4,其後,如圖9(b)所示,經由聚矽氧黏接著劑層4使螢光體層3與LED封裝體10貼合。 Further, in the embodiment of Fig. 8, as shown in Fig. 8(a), first, a polyoxygen adhesive layer 4 is laminated on the phosphor layer 3 to form a fluorescent adhesive sheet 6, and thereafter, as shown in Fig. 8 ( As shown in b), the phosphor layer 3 of the fluorescent adhesive sheet 6 is bonded to the LED package 10 via the polyoxygen adhesive layer 4. On the other hand, for example, as shown in FIG. 9(a), first, the surface of the LED package 10 is layered on the surface of the epoxy resin adhesive layer 4, and thereafter, as shown in FIG. 9(b), adhered via polyoxymethylene. The agent layer 4 bonds the phosphor layer 3 to the LED package 10.

於該方法中,首先準備LED封裝體10。 In this method, the LED package 10 is first prepared.

繼而,於該方法中,如圖9(a)之下側圖所示,於LED封裝體10之上表面積層聚矽氧黏接著劑層4。 Then, in this method, as shown in the lower side view of FIG. 9(a), the surface of the LED package 10 is layered on the surface of the LED package 10.

具體而言,於將聚矽氧感壓接著劑組合物製備為清漆之情形時,於LED2之整個上表面塗佈或滴下清漆。藉此,形成聚矽氧感壓接著劑組合物之皮膜。繼而,視需要蒸餾去除清漆中之溶劑。 Specifically, when the polyfluorene pressure-sensitive adhesive composition is prepared as a varnish, the varnish is applied or dropped on the entire upper surface of the LED 2. Thereby, a film of the polyfluorene pressure-sensitive adhesive composition is formed. The solvent in the varnish is then distilled off as needed.

另一方面,於聚矽氧黏接著劑組合物係由聚矽氧熱塑性-熱硬化性接著劑組合物形成之情形時,預先加熱LED封裝體10,繼而,將聚矽氧成形體9(參照圖2(a)之假想線)載置於LED封裝體10之上表面。藉此,於LED封裝體10之整個上表面形成有聚矽氧熱塑性-熱硬化性接著劑組合物之皮膜4'。 On the other hand, when the polyoxyxylene adhesive composition is formed of a polyoxyxene thermoplastic-thermosetting adhesive composition, the LED package 10 is heated in advance, and then the polyoxynitride molded body 9 is used (refer to The imaginary line of FIG. 2(a) is placed on the upper surface of the LED package 10. Thereby, a film 4' of a polyoxyxene thermoplastic-thermosetting adhesive composition is formed on the entire upper surface of the LED package 10.

其後,如圖9(b)所示,經由聚矽氧黏接著劑層4將螢光體層3與LED封裝體10貼合。具體而言,使螢光體層3之下表面與聚矽氧黏接著劑層4之上表面接觸。 Thereafter, as shown in FIG. 9(b), the phosphor layer 3 is bonded to the LED package 10 via the polyoxygen adhesive layer 4. Specifically, the lower surface of the phosphor layer 3 is brought into contact with the upper surface of the polyadox adhesive layer 4.

根據圖9之實施形態,亦可發揮與圖8之實施形態相同之作用效果。 According to the embodiment of Fig. 9, the same operational effects as those of the embodiment of Fig. 8 can be exhibited.

又,於圖1~圖9之實施形態中,列舉LED2作為本發明之光半導體元件進行說明,但亦可採用例如LD(雷射二極體)2。 Further, in the embodiment of FIGS. 1 to 9, the LED 2 is described as the optical semiconductor device of the present invention, but for example, an LD (Laser Diode) 2 may be employed.

於該情形時,將LED裝置7設為雷射二極體照射裝置7,又,將LED-螢光體層貼著體1設為LD-螢光體層貼著體1,並將LED封裝體10設為LD封裝體。 In this case, the LED device 7 is set as the laser diode irradiation device 7, and the LED-phosphor layer contact body 1 is used as the LD-phosphor layer bonding body 1, and the LED package 10 is provided. Set to LD package.

[實施例] [Examples]

以下,列舉製作例、準備例、比較準備例、合成例、實施例及比較例進一步詳細說明本發明,但本發明並不受該等任何限定。 Hereinafter, the present invention will be described in more detail by way of Production Examples, Preparation Examples, Comparative Preparation Examples, Synthesis Examples, Examples and Comparative Examples, but the present invention is not limited thereto.

(螢光體陶瓷板之製作) (production of phosphor ceramic plate) 製作例1 Production example 1

製備包含氧化釔粒子(純度99.99%,lot(批次):N-YT4CP,Nippon Yttrium公司製造)11.34g、氧化鋁粒子(純度99.99%,商品編號「AKP-30」,住友化學公司製造)8.577g、及氧化鈰粒子0.087g之 螢光體之原料粉末。 Preparation of cerium oxide particles (purity: 99.99%, lot (batch): N-YT4CP, manufactured by Nippon Yttrium Co., Ltd.) 11.34 g, alumina particles (purity: 99.99%, product number "AKP-30", manufactured by Sumitomo Chemical Co., Ltd.) 8.577 g, and cerium oxide particles 0.087g Raw material powder of phosphor.

以固體成分之體積比率成為60:40之方式將所製備之螢光體之原料粉末20g與水溶性黏合劑樹脂(「WB4101」,Polymer Inovations,Inc公司製造)進行混合,進而添加蒸餾水並放入氧化鋁製容器中,添加直徑3mm之釔穩定化氧化鋯球,藉由球磨機進行濕式混合24小時,藉此,製備螢光體之原料粒子之漿料溶液。 20 g of the raw material powder of the prepared phosphor was mixed with a water-soluble binder resin ("WB4101", manufactured by Polymer Inovations, Inc.) so that the volume ratio of the solid content was 60:40, and distilled water was added thereto. In a container made of alumina, a yttria-stabilized zirconia ball having a diameter of 3 mm was added, and wet-mixing was carried out for 24 hours by a ball mill to prepare a slurry solution of raw material particles of the phosphor.

繼而,藉由刮刀法將所製備之漿料溶液於PET(polyethylene terephthalate,聚對苯二甲酸乙二酯)膜上進行帶式澆鑄,於70℃下進行乾燥,形成陶瓷生胚片材,其後,自PET膜剝離陶瓷生胚片材,獲得厚度90μm之陶瓷生胚片材。 Then, the prepared slurry solution is subjected to belt casting on a PET (polyethylene terephthalate) film by a doctor blade method, and dried at 70 ° C to form a ceramic green sheet. Thereafter, the ceramic green sheet was peeled off from the PET film to obtain a ceramic green sheet having a thickness of 90 μm.

其後,將所獲得之生胚片材切割為20mm×20mm之尺寸,將其製作2片並將該等重疊,使用雙軸熱壓機進行熱層壓,藉此,製作陶瓷生胚片材積層體。 Thereafter, the obtained green sheet was cut into a size of 20 mm × 20 mm, and two sheets were produced and superposed, and heat-laminated using a biaxial hot press, thereby producing a ceramic green sheet. Laminated body.

其後,實施利用電灼爐(Electric Muffle Furnace)於大氣中以1℃/min之升溫速度將所製作之陶瓷生胚片材積層體加熱至1200℃而分解去除黏合劑樹脂等有機成分的脫黏合劑處理。其後,將積層體移至高溫真空爐中,於約10-3Torr(133×10-3N/m2)之減壓下,以5℃/min之升溫速度加熱至1750℃,並在該溫度下煅燒5小時,藉此,製作厚度150μm之螢光體陶瓷板(螢光體層)。 Thereafter, the produced ceramic green sheet laminate was heated to 1,200 ° C at a temperature elevation rate of 1 ° C/min in an atmosphere by an electric oven (Electric Muffle Furnace) to decompose and remove an organic component such as a binder resin. Adhesive treatment. Thereafter, the laminate is transferred to a high-temperature vacuum furnace, heated to a temperature of 5 ° C / min at a temperature increase rate of about 10 -3 Torr (133 × 10 -3 N / m 2 ) to 1750 ° C, and After calcination at this temperature for 5 hours, a phosphor ceramic plate (phosphor layer) having a thickness of 150 μm was produced.

(螢光體樹脂片之製作) (Production of phosphor resin sheet) 製作例2 Production example 2

使用敷料器,於玻璃板上塗佈使YAG螢光體粉末(商品編號BYW01A,平均粒徑9μm,Phosphor Tech公司製造)以YAG螢光體粉末之濃度成為25質量%之方式分散於二液混合型之熱硬化性聚矽氧彈性體(Shin-Etsu Silicones公司製造,商品編號KER2500)中而成之溶液,形成厚度150μm之螢光體皮膜,將螢光體皮膜於100℃下加熱1小 時,繼而,於150℃下加熱1小時,藉此,製作厚度150μm之C階段之螢光體樹脂片(螢光體層)。 By using an applicator, the YAG phosphor powder (commercial number BYW01A, average particle diameter: 9 μm, manufactured by Phosphor Tech Co., Ltd.) was dispersed on the glass plate so that the concentration of the YAG phosphor powder was 25% by mass. A solution of a thermosetting polyxanthene elastomer (manufactured by Shin-Etsu Silicones Co., Ltd., product number KER2500) to form a phosphor film having a thickness of 150 μm, and heating the phosphor film at 100 ° C for 1 hour. Then, it was heated at 150 ° C for 1 hour to prepare a C-stage phosphor resin sheet (phosphor layer) having a thickness of 150 μm.

(聚矽氧感壓接著劑組合物之準備) (Preparation of polyfluorene pressure-sensitive adhesive composition) 準備例1 Preparation example 1

準備聚矽氧感壓接著劑組合物(商品名:PSA 600,General Electronics公司製造)。 A polyoxygen pressure-sensitive adhesive composition (trade name: PSA 600, manufactured by General Electronics Co., Ltd.) was prepared.

再者,聚矽氧感壓接著劑組合物之原料如下所述。 Further, the raw materials of the polyoxygen peroxide pressure-sensitive adhesive composition are as follows.

.兩末端為矽烷醇基之聚二甲基矽氧烷 . Polydimethyloxane with decyl alcohol groups at both ends

.八甲基環四矽氧烷(式(B)中,Ra均為甲基,m為3) 1~5質量%(相對於固體成分總量) . Octamethylcyclotetraoxane (in the formula (B), R a is a methyl group, m is 3) 1 to 5 mass% (relative to the total solid content)

.苯甲醯基系過氧化物之混合物(過氧化二苯甲醯、過氧化苯甲醯基間甲基苯甲醯及過氧化間甲苯甲醯之混合物) 少量 . a mixture of benzamidine-based peroxides (mixtures of benzamidine peroxide, benzammonium peroxide, methylene benzamidine, and toluene toluene)

.甲苯 相對於固體成分為45質量% . Toluene is 45 mass% relative to solid content

(籠型八倍半矽氧烷之合成) (Synthesis of cage-type sesquioxaxane) 合成例1 Synthesis Example 1

向氫化四甲基銨(25%甲醇溶液)66.8mL(158.6mol)、甲醇32.8mL及蒸餾水24.6mL之混合液中緩慢滴加四乙氧基矽烷35.8mL(160.6mol),並攪拌一晝夜,藉此,使該等進行反應。 To a mixture of 66.8 mL (158.6 mol) of hydrogen tetramethylammonium (25% methanol solution), 32.8 mL of methanol and 24.6 mL of distilled water, 35.8 mL (160.6 mol) of tetraethoxy decane was slowly added dropwise, and stirred for a day and night. Thereby, the reaction is carried out.

繼而,過濾反應液,並將濾液滴加至己烷428mL、二甲基氯矽烷7.1g(75mmol)及三甲基氯矽烷24.4g(225mmol)之混合液中,並攪拌一晝夜。其後,利用己烷萃取反應物,向萃取液中添加硫酸鎂並進行乾燥。其後,暫時去除己烷後,進而添加己烷而使其再結晶,藉此,獲得白色固體之籠型八倍半矽氧烷。 Then, the reaction liquid was filtered, and the filtrate was added to a mixture of 428 mL of hexane, 7.1 g (75 mmol) of dimethylchloromethane and 24.4 g (225 mmol) of trimethylchloromethane, and stirred for a day and night. Thereafter, the reactant was extracted with hexane, and magnesium sulfate was added to the extract and dried. Thereafter, after hexane was temporarily removed, hexane was further added thereto to recrystallize, thereby obtaining a cage-type sesquioxaxane having a white solid.

利用1H-NMR確認出所獲得之籠型八倍半矽氧烷為式(7)之結構,並且確認式(7)中之R6為甲基、R7為氫及甲基,算出R7之甲基與氫之莫耳比(籠型八倍半矽氧烷整體之平均值),結果甲基:氫=6:2。 Using 1 H-NMR confirmed that the structure of cage octasilsesquioxane silicon alumoxane is obtained by the formula (7), the acknowledgment of the formula and (7) R 6 is methyl, R 7 is hydrogen and methyl, R 7 is calculated The molar ratio of methyl group to hydrogen (the average of the cage-type sesquioxaxane as a whole), and the result is methyl: hydrogen = 6:2.

(聚矽氧熱塑性-熱硬化性接著劑組合物之準備) (Preparation of polyoxyl thermoplastic-thermosetting adhesive composition) 準備例2 Preparation example 2

將合成例1之籠型八倍半矽氧烷(式(7)之R7/甲基:氫(莫耳比)=6:2)0.3g、兩末端含有烯基之聚矽氧烷(式(8)中,R8為甲基,R9為乙烯基,i為8,且數量平均分子量為800,Gelest公司製造)0.24g、甲苯1g、及鉑-二乙烯基矽氧烷錯合物溶液(矽氫化觸媒,甲苯溶液,鉑濃度2質量%)0.5μL進行調配,於50℃下攪拌15小時。兩末端含有烯基之聚矽氧烷之乙烯基與籠型八倍半矽氧烷之氫矽烷基之莫耳比(=乙烯基/氫矽烷基)為0.91。 The cage type sesquioxaxane of Synthesis Example 1 (R 7 /methyl group of the formula (7): hydrogen (mole ratio) = 6:2) 0.3 g, and polyoxyalkylene containing alkenyl groups at both terminals ( In the formula (8), R 8 is a methyl group, R 9 is a vinyl group, i is 8, and the number average molecular weight is 800, manufactured by Gelest Corporation, 0.24 g, toluene 1 g, and platinum-divinyl decane are misaligned. The solution (hydrogenated catalyst, toluene solution, platinum concentration: 2% by mass) was mixed at 0.5 μL, and stirred at 50 ° C for 15 hours. The molar ratio (=vinyl/hydroalkylene) of the vinyl group of the alkenyl group-containing polyoxyalkylene to the hydrocarbyl group of the cage octadequioxane was 0.91.

其後蒸餾去除甲苯,藉此,獲得透明固體狀之第3聚矽氧熱塑性-熱硬化性接著劑組合物。 Thereafter, toluene was distilled off, whereby a third polyfluorene-oxygen thermoplastic-thermosetting adhesive composition in the form of a transparent solid was obtained.

準備例3 Preparation Example 3

於氮氣下、室溫(25℃)下將兩末端胺基型聚矽氧樹脂組合物(以式(1)中之R1全部為甲基、R3為伸丙基且a=150、b=0所表示之化合物,重量平均分子量11,400,信越化學工業公司製造)5g(0.43mmol)、甲苯2,4-二異氰酸酯0.074g(0.43mmol)、及甲基乙基酮10mL攪拌混合1小時。其後,加入過氧化二-第三丁基(0.1mol/L苯溶液,日本油脂公司製造)1315μL(相對於兩末端胺基型聚矽氧樹脂組合物之R1基100mol%,自由基產生劑為0.1mol%),於室溫(25℃)下攪拌混合1小時。其後,於減壓下、室溫(25℃)下去除溶劑,藉此,獲得透明固體狀之第1聚矽氧熱塑性-熱硬化性接著劑組合物。 The two-terminal amine-based polyoxyxylene resin composition under nitrogen (at 25 ° C) (wherein R 1 in the formula (1) is all methyl, R 3 is a propyl group and a = 150, b 5 g (0.43 mmol) of a compound represented by =0, a weight average molecular weight of 11,400, manufactured by Shin-Etsu Chemical Co., Ltd., 0.074 g (0.43 mmol) of toluene 2,4-diisocyanate, and 10 mL of methyl ethyl ketone were stirred and mixed for 1 hour. Thereafter, 1315 μL of di-t-butylperoxide (0.1 mol/L benzene solution, manufactured by Nippon Oil & Fats Co., Ltd.) was added (100 mol% based on R 1 groups of the both-end amine-based polyoxyxylene resin composition, free radical generation) The agent was 0.1 mol%), and the mixture was stirred and stirred at room temperature (25 ° C) for 1 hour. Thereafter, the solvent was removed under reduced pressure at room temperature (25 ° C) to obtain a first polyfluorinated thermoplastic-thermosetting adhesive composition in the form of a transparent solid.

(聚矽氧硬化型接著劑組合物之準備) (Preparation of polyoxygenated adhesive composition) 比較準備例1 Comparison preparation example 1

準備聚矽氧感壓接著劑組合物(商品名,SD 4580 PSA,Toray Dow Corning公司製造)。 A polyoxygen pressure-sensitive adhesive composition (trade name, SD 4580 PSA, manufactured by Toray Dow Corning Co., Ltd.) was prepared.

再者,聚矽氧感壓接著劑組合物之原料如下所述。 Further, the raw materials of the polyoxygen peroxide pressure-sensitive adhesive composition are as follows.

.兩末端為矽烷醇基之聚二甲基矽氧烷 . Polydimethyloxane with decyl alcohol groups at both ends

.苯甲醯基系過氧化物之混合物(過氧化二苯甲醯、過氧化苯甲醯基間甲基苯甲醯及過氧化間甲苯甲醯之混合物) 少量 . a mixture of benzamidine-based peroxides (mixtures of benzamidine peroxide, benzammonium peroxide, methylene benzamidine, and toluene toluene)

.甲苯 相對於固體成分為70質量% . Toluene is 70% by mass relative to solid content

(丙烯酸系感壓接著劑組合物之準備) (Preparation of acrylic pressure-sensitive adhesive composition) 比較準備例2 Comparison preparation example 2

以日本專利特開平6-172729號公報之實施例2之配方作為參考,準備丙烯酸系感壓接著劑。 An acrylic pressure-sensitive adhesive was prepared in accordance with the formulation of Example 2 of JP-A-6-172729.

(光半導體封裝體之製作) (Production of optical semiconductor package) 製作例3 Production example 3

準備於金屬基板上積層有絕緣層之積層基板上形成有導體圖案的金屬芯基板。繼而,於金屬芯基板上焊線接合連接並安裝光半導體元件(藍色LED,商品編號C450EZ1000-0123,Cree公司製造)(參照圖6(a)之下側圖)。 A metal core substrate on which a conductor pattern is formed on a laminated substrate in which an insulating layer is laminated on a metal substrate. Then, an optical semiconductor element (blue LED, product number C450EZ1000-0123, manufactured by Cree Co., Ltd.) was attached to the metal core substrate by wire bonding (see the lower side view of FIG. 6(a)).

製作例4 Production example 4

準備如下基板:將間隔有大致橢圓狀之凹部(模穴)之反射器積層於基板上,且於凹部內之基板上形成有導體圖案之多層陶瓷基板(商品編號207806,Sumitomo Metal Electronics Devices公司製造)。 A substrate is prepared in which a reflector having a substantially elliptical recess (cavity) is laminated on a substrate, and a multilayer ceramic substrate having a conductor pattern formed on a substrate in the recess (Product No. 207806, manufactured by Sumitomo Metal Electronics Devices Co., Ltd.) ).

繼而,於多層陶瓷基板上焊線接合連接光半導體元件(藍色LED,商品編號C450EZ1000-0123,Cree公司製造)。 Then, an optical semiconductor element (blue LED, product number C450EZ1000-0123, manufactured by Cree Co., Ltd.) was bonded to the multilayer ceramic substrate by wire bonding.

繼而,於模穴內灌注二液混合型之熱硬化性聚矽氧彈性體(商品編號KER2500,Shin-Etsu Silicones公司製造),其後,於100℃下加熱1小時,於150℃下加熱1小時,藉此使其硬化。 Then, a two-liquid mixing type thermosetting polyxanthene elastomer (product number KER2500, manufactured by Shin-Etsu Silicones Co., Ltd.) was poured into the cavity, and then heated at 100 ° C for 1 hour and heated at 150 ° C. Hours, thereby hardening it.

藉此,形成密封層(參照圖8(a)之下側圖)。 Thereby, a sealing layer is formed (refer to the lower side view of FIG. 8 (a)).

藉此,製作光半導體封裝體。 Thereby, an optical semiconductor package is produced.

(螢光黏貼片之製作) (production of fluorescent paste) 實施例1-a Example 1-a

將製作例1之螢光體陶瓷板切割為特定尺寸(3.5mm×2.8mm或1mm×1mm。再者,在應用於製作例3之光半導體封裝體中之情形時,亦對準焊線接合之位置製作切口)(參照圖2(a)),其後,於該螢光體陶瓷板之整個上表面塗佈準備例1之聚矽氧感壓接著劑組合物,形成皮膜。繼而,蒸餾去除溶劑。 The phosphor ceramic plate of Production Example 1 was cut into a specific size (3.5 mm × 2.8 mm or 1 mm × 1 mm. Further, in the case of application to the optical semiconductor package of Production Example 3, the bonding wire bonding was also performed. The slit was formed at the position (see Fig. 2 (a)), and thereafter, the polyfluorene pressure-sensitive adhesive composition of Preparation Example 1 was applied to the entire upper surface of the phosphor ceramic plate to form a film. Then, the solvent was distilled off.

藉此,於螢光體陶瓷板之上表面形成有厚度40μm之聚矽氧感壓接著劑層(參照圖2(b))。即,製作包含螢光體陶瓷板及聚矽氧感壓接著劑層之螢光黏貼片。 Thereby, a polyfluorene pressure-sensitive adhesive layer having a thickness of 40 μm was formed on the upper surface of the phosphor ceramic plate (see FIG. 2(b)). That is, a fluorescent adhesive sheet comprising a phosphor ceramic plate and a polyfluorene pressure-sensitive adhesive layer was produced.

(光半導體裝置之製造/無模穴) (Manufacture of optical semiconductor device / no cavity) 實施例1-b Example 1-b

於25℃下,將實施例1-a之尺寸1mm×1mm之螢光黏貼片中之螢光體層經由聚矽氧感壓接著劑層貼合於安裝在製作例3之基板上之光半導體元件之上表面。 The phosphor layer in the 1 mm × 1 mm fluorescent adhesive sheet of Example 1-a was bonded to the optical semiconductor element mounted on the substrate of Production Example 3 via a polysilicon oxide pressure-sensitive adhesive layer at 25 ° C. Above the surface.

藉此,製造光半導體裝置(參照圖6(b))。 Thereby, an optical semiconductor device is manufactured (refer FIG. 6 (b)).

(光半導體裝置之製造/有模穴) (Manufacture of optical semiconductor device / cavity) 實施例1-c Example 1-c

於25℃下,將實施例1-a之尺寸3.5mm×2.8mm之螢光黏貼片中之螢光體層經由聚矽氧感壓接著劑層貼合於製作例4之光半導體封裝體之上表面。 The phosphor layer in the 3.5 mm × 2.8 mm fluorescent adhesive sheet of Example 1-a was bonded to the optical semiconductor package of Production Example 4 via a polysilicon oxide pressure-sensitive adhesive layer at 25 ° C. surface.

藉此,製造光半導體裝置(參照圖8(b))。 Thereby, an optical semiconductor device is manufactured (refer FIG. 8 (b)).

(螢光黏貼片之製作) (production of fluorescent paste) 實施例2-a Example 2-a

使用製作例2之螢光體樹脂片(參照圖2(a))代替製作例1之螢光體陶瓷板,除此以外,以與實施例1-a相同之方式進行處理,製作螢光黏貼片(參照圖2(b))。 In the same manner as in Example 1-a, a phosphor paste sheet of Production Example 2 (see FIG. 2(a)) was used instead of the phosphor ceramic sheet of Production Example 1 to prepare a fluorescent paste. Sheet (refer to Figure 2 (b)).

(光半導體裝置之製造/無模穴) (Manufacture of optical semiconductor device / no cavity) 實施例2-b Example 2-b

使用實施例2-a之螢光黏貼片(參照圖2(b))代替實施例1-a之螢光黏貼片,除此以外,以與實施例1-b相同之方式進行處理,製造光半導體裝置(參照圖6(b))。 The same procedure as in Example 1-b was carried out to produce light by using the fluorescent adhesive sheet of Example 2-a (see FIG. 2(b)) instead of the fluorescent adhesive sheet of Example 1-a. Semiconductor device (see Fig. 6(b)).

(光半導體裝置之製造/有模穴) (Manufacture of optical semiconductor device / cavity) 實施例2-c Example 2-c

使用實施例2-a之螢光黏貼片(參照圖2(b))代替實施例1-a之螢光黏貼片,除此以外,以與實施例1-c相同之方式進行處理,製造光半導體裝置(參照圖8(b))。 The same procedure as in Example 1-c was carried out except that the fluorescent adhesive sheet of Example 2-a (see FIG. 2(b)) was used instead of the fluorescent adhesive sheet of Example 1-a to produce light. Semiconductor device (see Fig. 8(b)).

(螢光黏貼片之製造) (Manufacture of fluorescent adhesive sheets) 實施例3-a Example 3-a

將製作例1之螢光體陶瓷板切割為特定尺寸(尺寸3.5mm×2.8mm或1mm×1mm。再者,在應用於製作例3之光半導體封裝體中之情形時,亦對準焊線接合之位置製作切口),將其載置於加熱至100℃之熱板上(參照圖2(a)之實線)。 The phosphor ceramic plate of Production Example 1 was cut into a specific size (size: 3.5 mm × 2.8 mm or 1 mm × 1 mm. Further, in the case of application to the optical semiconductor package of Production Example 3, the bonding wire was also aligned. A slit is formed at the joint position, and it is placed on a hot plate heated to 100 ° C (refer to the solid line of Fig. 2 (a)).

繼而,於螢光體陶瓷板之上表面之中央載置包含準備例2之第3聚矽氧熱塑性-熱硬化性接著劑組合物之聚矽氧成形體1mg(參照圖2(a)之假想線)。 Then, 1 mg of the polyoxymethylene molded article containing the third polyoxyxene thermoplastic thermosetting adhesive composition of Preparation Example 2 was placed on the center of the upper surface of the phosphor ceramic plate (see Fig. 2 (a) line).

如此,於剛載置後,聚矽氧成形體塑(液狀)化而均勻擴散於螢光體陶瓷板之整個上表面,形成聚矽氧熱塑性-熱硬化性接著劑組合物之皮膜(參照圖2(a)之假想線箭頭及圖2(b))。 In this manner, immediately after the mounting, the polysiloxane molded body is plasticized (liquid) and uniformly diffused on the entire upper surface of the phosphor ceramic plate to form a film of the polyoxyxene thermoplastic-thermosetting adhesive composition (see The imaginary line arrow of Fig. 2(a) and Fig. 2(b)).

其後,自熱板取出螢光體陶瓷板,並冷卻至室溫。藉此,將第3聚矽氧熱塑性-熱硬化性接著劑組合物固形化。 Thereafter, the phosphor ceramic plate was taken out from the hot plate and cooled to room temperature. Thereby, the third polyoxyl thermoplastic-thermosetting adhesive composition is solidified.

藉此,獲得於包含螢光體陶瓷板之螢光體層上形成有厚度約100μm之聚矽氧熱塑性-熱硬化性接著劑層的螢光黏貼片(參照圖2(b))。 Thereby, a fluorescent adhesive sheet having a polyoxyxene thermoplastic thermosetting adhesive layer having a thickness of about 100 μm formed on the phosphor layer containing the phosphor ceramic plate was obtained (see FIG. 2(b)).

(光半導體裝置之製造/無模穴) (Manufacture of optical semiconductor device / no cavity) 實施例3-b Example 3-b

於實施例3-a中,準備如下者:一面利用熱板加熱一面對聚矽氧成形體塑化之螢光體陶瓷板(冷卻前之陶瓷板,尺寸1mm×1mm)、利用熱板所加熱之製作例3之基板及安裝於其上之光半導體元件(參照圖6(a)下側圖),並確認兩者成為相同溫度,經由所塑化之聚矽氧成形體於光半導體元件之上表面貼合螢光體陶瓷板。其後,自熱板將其取出,並冷卻至室溫。藉此,製造光半導體裝置(參照圖6(b))。 In the embodiment 3-a, the following is prepared by heating a phosphor ceramic plate (ceramic plate before cooling, size 1 mm × 1 mm) which is plasticized with a polycrystalline oxide molded body by using a hot plate, and using a hot plate. The substrate of Production Example 3 and the optical semiconductor element mounted thereon (see FIG. 6(a) lower side view) were heated, and it was confirmed that both of them were at the same temperature, and the plasticized polyoxynitride molded body was used for the optical semiconductor element. The upper surface is attached to the phosphor ceramic plate. Thereafter, it was taken out from the hot plate and cooled to room temperature. Thereby, an optical semiconductor device is manufactured (refer FIG. 6 (b)).

(光半導體裝置之製造/有模穴) (Manufacture of optical semiconductor device / cavity) 實施例3-c Example 3-c

使用實施例3-b之基板及光半導體元件代替製作例4之光半導體封裝體(參照圖8(a)之下側圖),進而,使用聚矽氧成形體經塑化之尺寸3.5mm×2.8mm之螢光體陶瓷板,除此以外,以與實施例3-b相同之方式進行處理,製作光半導體裝置(參照圖8(b))。 The substrate and the optical semiconductor element of Example 3-b were used instead of the optical semiconductor package of Production Example 4 (see the lower side view of Fig. 8(a)), and further, the plasticized size of the polyoxynitride molded body was 3.5 mm × A photo-semiconductor device was fabricated in the same manner as in Example 3-b except that a 2.8 mm phosphor ceramic plate was used (see FIG. 8(b)).

(螢光黏貼片之製作) (production of fluorescent paste) 實施例4-a Example 4-a

使用製作例2之螢光體樹脂片代替製作例1之螢光體陶瓷板,除此以外,以與實施例3-a相同之方式進行處理,獲得螢光黏貼片(參照圖2(b))。 A phosphor paste sheet was obtained in the same manner as in Example 3-a except that the phosphor resin sheet of Production Example 2 was used instead of the phosphor ceramic sheet of Production Example 1 (see FIG. 2(b). ).

(光半導體裝置之製造/無模穴) (Manufacture of optical semiconductor device / no cavity) 實施例4-b Example 4-b

使用實施例4-a之螢光黏貼片代替實施例3-a之螢光黏貼片,除此以外,以與實施例3-b相同之方式進行處理,製造光半導體裝置(參照圖6(b))。 An optical semiconductor device was fabricated in the same manner as in Example 3-b except that the fluorescent adhesive sheet of Example 4-a was used instead of the fluorescent adhesive sheet of Example 3-a (see FIG. 6(b). )).

(光半導體裝置之製造/有模穴) (Manufacture of optical semiconductor device / cavity) 實施例4-c Example 4-c

使用實施例4-a之螢光黏貼片代替實施例3-a之螢光黏貼片,除此以外,以與實施例3-c相同之方式進行處理,製造光半導體裝置(參照圖8(b))。 An optical semiconductor device was manufactured in the same manner as in Example 3-c except that the fluorescent adhesive sheet of Example 4-a was used instead of the fluorescent adhesive sheet of Example 3-a (see FIG. 8(b). )).

(螢光黏貼片之製造) (Manufacture of fluorescent adhesive sheets) 實施例5-a Example 5-a

將製作例1之螢光體陶瓷板切割為特定尺寸(3.5mm×2.8mm或1mm×1mm。再者,在應用於製作例3之光半導體封裝體中之情形時,亦對準焊線接合之位置製作切口),將其載置於加熱至100℃之熱板上(參照圖2(a)之實線)。 The phosphor ceramic plate of Production Example 1 was cut into a specific size (3.5 mm × 2.8 mm or 1 mm × 1 mm. Further, in the case of application to the optical semiconductor package of Production Example 3, the bonding wire bonding was also performed. The slit was made at the position, and it was placed on a hot plate heated to 100 ° C (refer to the solid line of Fig. 2 (a)).

繼而,將包含準備例3之第1聚矽氧熱塑性-熱硬化性接著劑組合物之聚矽氧成形體1mg載置於螢光體陶瓷板之上表面之中央(參照圖2(a)之假想線)。 Then, 1 mg of the polyoxynitride molded body containing the first polyoxyxene thermoplastic thermosetting adhesive composition of Preparation Example 3 was placed on the center of the upper surface of the phosphor ceramic plate (refer to FIG. 2(a)). Imaginary line).

如此,於剛載置後,聚矽氧成形體塑(液狀)化而均勻擴散於螢光體陶瓷板之整個上表面,形成聚矽氧熱塑性-熱硬化性接著劑組合物之皮膜(參照圖2(a)之假想線箭頭及圖2(b))。 In this manner, immediately after the mounting, the polysiloxane molded body is plasticized (liquid) and uniformly diffused on the entire upper surface of the phosphor ceramic plate to form a film of the polyoxyxene thermoplastic-thermosetting adhesive composition (see The imaginary line arrow of Fig. 2(a) and Fig. 2(b)).

其後,自熱板取出螢光體陶瓷板,並冷卻至室溫。藉此,將第1聚矽氧熱塑性-熱硬化性接著劑組合物固形化。 Thereafter, the phosphor ceramic plate was taken out from the hot plate and cooled to room temperature. Thereby, the first polyoxyl thermoplastic-thermosetting adhesive composition is solidified.

藉此,獲得於包含螢光體陶瓷板之螢光體層上形成有厚度約100μm之聚矽氧熱塑性-熱硬化性接著劑層的螢光黏貼片(參照圖2(b))。 Thereby, a fluorescent adhesive sheet having a polyoxyxene thermoplastic thermosetting adhesive layer having a thickness of about 100 μm formed on the phosphor layer containing the phosphor ceramic plate was obtained (see FIG. 2(b)).

(光半導體裝置之製造/無模穴) (Manufacture of optical semiconductor device / no cavity) 實施例5-b Example 5-b

於實施例5-a中,準備如下者:一面利用熱板加熱一面將聚矽氧成形體塑化之螢光體陶瓷板(冷卻前之陶瓷板,尺寸1mm×1mm)、利用熱板所加熱之製作例3之基板及安裝於其上之光半導體元件(參照圖6(a)下側圖),並確認兩者成為相同溫度,經由所塑化之聚矽氧成形體於光半導體元件之上表面貼合螢光體陶瓷板。其後,自熱板將其取 出,並冷卻至室溫。藉此,製造光半導體裝置(參照圖6(b))。 In the embodiment 5-a, a phosphor ceramic plate (ceramic plate before cooling, size 1 mm × 1 mm) which is plasticized by a hot plate while being heated by a hot plate is used, and is heated by a hot plate. The substrate of Production Example 3 and the optical semiconductor element mounted thereon (see the lower side view of FIG. 6(a)), and it was confirmed that both of them were at the same temperature, and the plasticized polyoxynitride molded body was used in the optical semiconductor element. The upper surface is attached to the phosphor ceramic plate. Thereafter, take it from the hot plate Out and cool to room temperature. Thereby, an optical semiconductor device is manufactured (refer FIG. 6 (b)).

(光半導體裝置之製造/有模穴) (Manufacture of optical semiconductor device / cavity) 實施例5-c Example 5-c

使用實施例5-b之基板及光半導體元件代替製作例4之光半導體封裝體(參照圖8(a)之下側圖),進而,使用聚矽氧成形體經塑化之尺寸3.5mm×2.8mm之螢光體陶瓷板,除此以外,以與實施例5-b相同之方式進行處理,製作光半導體裝置(參照圖8(b))。 The substrate and the optical semiconductor element of Example 5-b were used instead of the optical semiconductor package of Production Example 4 (see the lower side view of Fig. 8(a)), and further, the plasticized size of the polyoxynitride molded body was 3.5 mm × A photo-semiconductor device was fabricated in the same manner as in Example 5-b except that a 2.8 mm phosphor ceramic plate was used (see FIG. 8(b)).

(螢光黏貼片之製作) (production of fluorescent paste) 實施例6-a Example 6-a

使用製作例2之螢光體樹脂片代替製作例1之螢光體陶瓷板,除此以外,以與實施例5-a相同之方式進行處理,獲得螢光黏貼片(參照圖2(b))。 A phosphor paste sheet was obtained in the same manner as in Example 5-a except that the phosphor resin sheet of Production Example 2 was used instead of the phosphor ceramic sheet of Production Example 1 (see FIG. 2(b). ).

(光半導體裝置之製造/無模穴) (Manufacture of optical semiconductor device / no cavity) 實施例6-b Example 6-b

使用實施例6-a之螢光黏貼片代替實施例5-a之螢光黏貼片,除此以外,以與實施例5-b相同之方式進行處理,製造光半導體裝置(參照圖6(b))。 An optical semiconductor device was produced in the same manner as in Example 5-b except that the fluorescent adhesive sheet of Example 6-a was used instead of the fluorescent adhesive sheet of Example 5-a (see FIG. 6(b). )).

(光半導體裝置之製造/有模穴) (Manufacture of optical semiconductor device / cavity) 實施例6-c Example 6-c

使用實施例6-a之螢光黏貼片代替實施例5-a之螢光黏貼片,除此以外,以與實施例5-c相同之方式進行處理,製造光半導體裝置(參照圖8(b))。 An optical semiconductor device was produced in the same manner as in Example 5-c except that the fluorescent adhesive sheet of Example 6-a was used instead of the fluorescent adhesive sheet of Example 5-a (see FIG. 8(b). )).

(螢光黏貼片之製作) (production of fluorescent paste) 比較例1-a Comparative Example 1-a

將製作例1之螢光體陶瓷板切割為特定尺寸(3.5mm×2.8mm或1mm×1mm。再者,在應用於製作例3之光半導體封裝體中之情形時, 亦對準焊線接合之位置製作切口)(參照圖2(a)),其後,於該螢光體陶瓷板之整個上表面塗佈比較準備例1之聚矽氧感壓接著劑組合物,形成皮膜。繼而,蒸餾去除溶劑。 The phosphor ceramic plate of Production Example 1 was cut into a specific size (3.5 mm × 2.8 mm or 1 mm × 1 mm. Further, when applied to the optical semiconductor package of Production Example 3, A slit is also formed at a position where the bonding wire is bonded (see FIG. 2(a)), and thereafter, the polyfluorene pressure-sensitive adhesive composition of Comparative Preparation Example 1 is applied to the entire upper surface of the phosphor ceramic plate. Form a film. Then, the solvent was distilled off.

藉此,於螢光體陶瓷板之上表面形成有厚度40μm之聚矽氧感壓接著劑層(參照圖2(b))。即,製作包含螢光體陶瓷板及聚矽氧感壓接著劑層之螢光黏貼片。 Thereby, a polyfluorene pressure-sensitive adhesive layer having a thickness of 40 μm was formed on the upper surface of the phosphor ceramic plate (see FIG. 2(b)). That is, a fluorescent adhesive sheet comprising a phosphor ceramic plate and a polyfluorene pressure-sensitive adhesive layer was produced.

(光半導體裝置之製造/無模穴) (Manufacture of optical semiconductor device / no cavity) 比較例1-b Comparative Example 1-b

於25℃下,將比較例1-a之尺寸1mm×1mm之螢光黏貼片中之螢光體層經由聚矽氧感壓接著劑層貼合於安裝在製作例3之基板上之光半導體元件之上表面。 The phosphor layer in the phosphor paste of the size of 1 mm × 1 mm of Comparative Example 1-a was bonded to the optical semiconductor element mounted on the substrate of Production Example 3 via a polysilicon oxide pressure-sensitive adhesive layer at 25 ° C. Above the surface.

藉此,製造光半導體裝置(參照圖6(b))。 Thereby, an optical semiconductor device is manufactured (refer FIG. 6 (b)).

(光半導體裝置之製造/有模穴) (Manufacture of optical semiconductor device / cavity) 比較例1-c Comparative Example 1-c

於25℃下,將比較例1-a之尺寸3.5mm×2.8mm之螢光黏貼片中之螢光體層經由聚矽氧感壓接著劑層貼合於製作例4之光半導體封裝體之上表面。 The phosphor layer in the 3.5 mm × 2.8 mm fluorescent adhesive sheet of Comparative Example 1-a was bonded to the optical semiconductor package of Production Example 4 via a polysilicon oxide pressure-sensitive adhesive layer at 25 ° C. surface.

藉此,製造光半導體裝置(參照圖8(b))。 Thereby, an optical semiconductor device is manufactured (refer FIG. 8 (b)).

(螢光黏貼片之製作) (production of fluorescent paste) 比較例2-a Comparative Example 2-a

使用製作例2之螢光體樹脂片(參照圖2(a))代替製作例1之螢光體陶瓷板,除此以外,以與比較例1-a相同之方式進行處理,製作螢光黏貼片(參照圖2(b))。 In the same manner as in Comparative Example 1-a, a phosphor paste sheet of Production Example 2 (see FIG. 2(a)) was used instead of the phosphor ceramic plate of Production Example 1 to prepare a fluorescent paste. Sheet (refer to Figure 2 (b)).

(光半導體裝置之製造/無模穴) (Manufacture of optical semiconductor device / no cavity) 比較例2-b Comparative Example 2-b

使用比較例2-a之螢光黏貼片(參照圖2(b))代替比較例1-a之螢光 黏貼片,除此以外,以與比較例1-b相同之方式進行處理,製造光半導體裝置(參照圖6(b))。 The fluorescent patch of Comparative Example 2-a (refer to FIG. 2(b)) was used instead of the fluorescent light of Comparative Example 1-a. Other than the above, the film was processed in the same manner as in Comparative Example 1-b to produce an optical semiconductor device (see FIG. 6(b)).

(光半導體裝置之製造/有模穴) (Manufacture of optical semiconductor device / cavity) 比較例2-c Comparative Example 2-c

使用比較例2-a之螢光黏貼片(參照圖2(b))代替比較例1-a之螢光黏貼片,除此以外,以與比較例1-c相同之方式進行處理,製造光半導體裝置(參照圖8(b))。 The same procedure as in Comparative Example 1-c was used to produce light, except that the fluorescent adhesive sheet of Comparative Example 2-a (see FIG. 2(b)) was used instead of the fluorescent adhesive sheet of Comparative Example 1-a. Semiconductor device (see Fig. 8(b)).

(螢光黏貼片之製作) (production of fluorescent paste) 比較例3-a Comparative Example 3-a

將製作例1之螢光體陶瓷板切割為特定尺寸(3.5mm×2.8mm或1mm×1mm。再者,在應用於製作例3之光半導體封裝體中之情形時,亦對準焊線接合之位置製作切口)(參照圖2(a)),其後,於該螢光體陶瓷板之整個上表面塗佈比較準備例2之丙烯酸系感壓接著劑組合物,形成皮膜。繼而,蒸餾去除溶劑。 The phosphor ceramic plate of Production Example 1 was cut into a specific size (3.5 mm × 2.8 mm or 1 mm × 1 mm. Further, in the case of application to the optical semiconductor package of Production Example 3, the bonding wire bonding was also performed. The slit was formed at the position (see Fig. 2 (a)), and thereafter, the acrylic pressure-sensitive adhesive composition of Comparative Preparation Example 2 was applied to the entire upper surface of the phosphor ceramic plate to form a film. Then, the solvent was distilled off.

藉此,於螢光體陶瓷板之上表面形成有厚度40μm之丙烯酸系感壓接著劑層(參照圖2(b))。即,製作包含螢光體陶瓷板及丙烯酸系感壓接著劑層之螢光黏貼片。 Thereby, an acrylic pressure-sensitive adhesive layer having a thickness of 40 μm was formed on the upper surface of the phosphor ceramic plate (see FIG. 2(b)). That is, a fluorescent adhesive sheet containing a phosphor ceramic plate and an acrylic pressure-sensitive adhesive layer was produced.

(光半導體裝置之製造/無模穴) (Manufacture of optical semiconductor device / no cavity) 比較例3-b Comparative Example 3-b

於25℃下,將比較例3-a之尺寸1mm×1mm之螢光黏貼片中之螢光體層經由丙烯酸系感壓接著劑層貼合於安裝在製作例3之基板上之光半導體元件之上表面。 The phosphor layer in the phosphor paste of the size of 1 mm × 1 mm of Comparative Example 3-a was bonded to the optical semiconductor element mounted on the substrate of Production Example 3 via an acrylic pressure-sensitive adhesive layer at 25 ° C. Upper surface.

藉此,製造光半導體裝置(參照圖6(b))。 Thereby, an optical semiconductor device is manufactured (refer FIG. 6 (b)).

(光半導體裝置之製造/有模穴) (Manufacture of optical semiconductor device / cavity) 比較例1-c Comparative Example 1-c

於25℃下,將比較例1-a之尺寸3.5mm×2.8mm之螢光黏貼片中之 螢光體層經由丙烯酸系感壓接著劑層貼合於製作例4之光半導體封裝體之上表面。 In the fluorescent adhesive sheet of Comparative Example 1-a having a size of 3.5 mm × 2.8 mm at 25 ° C The phosphor layer was bonded to the upper surface of the optical semiconductor package of Production Example 4 via an acrylic pressure-sensitive adhesive layer.

藉此,製造光半導體裝置(參照圖8(b))。 Thereby, an optical semiconductor device is manufactured (refer FIG. 8 (b)).

(螢光黏貼片之製作) (production of fluorescent paste) 比較例4-a Comparative Example 4-a

使用製作例2之螢光體樹脂片(參照圖2(a))代替比較例3之螢光體陶瓷板,除此以外,以與比較例3-a相同之方式進行處理,製作螢光黏貼片(參照圖2(b))。 A phosphor paste was prepared in the same manner as in Comparative Example 3-a except that the phosphor resin sheet of Production Example 2 (see FIG. 2(a)) was used instead of the phosphor ceramic plate of Comparative Example 3 to prepare a fluorescent paste. Sheet (refer to Figure 2 (b)).

(光半導體裝置之製造/無模穴) (Manufacture of optical semiconductor device / no cavity) 比較例4-b Comparative Example 4-b

使用比較例4-a之螢光黏貼片(參照圖2(b))代替比較例3-a之螢光黏貼片,除此以外,以與比較例3-b相同之方式進行處理,製造光半導體裝置(參照圖6(b))。 The light-sensitive adhesive sheet of Comparative Example 4-a (see FIG. 2(b)) was used in the same manner as in Comparative Example 3-b except that the fluorescent adhesive sheet of Comparative Example 3-a was used instead of the above. Semiconductor device (see Fig. 6(b)).

(光半導體裝置之製造/有模穴) (Manufacture of optical semiconductor device / cavity) 比較例4-c Comparative Example 4-c

使用比較例4-a之螢光黏貼片(參照圖2(b))代替比較例3-a之螢光黏貼片,除此以外,以與比較例3-c相同之方式進行處理,製造光半導體裝置(參照圖8(b))。 The same procedure as in Comparative Example 3-c was carried out to produce light using the fluorescent adhesive sheet of Comparative Example 4-a (see FIG. 2(b)) instead of the fluorescent adhesive sheet of Comparative Example 3-a. Semiconductor device (see Fig. 8(b)).

將各實施例及各比較例中之螢光體層及黏接著劑組合物所使用之材料之組合及評價結果示於表1。 The combination and evaluation results of the materials used for the phosphor layer and the adhesive composition in each of the examples and the comparative examples are shown in Table 1.

(評價) (Evaluation)

針對於實施例及比較例之各黏接著劑層(黏接著劑組合物),藉由下述方法評價對於螢光體層之剝離強度。 With respect to each of the adhesive layers (adhesive composition) of the examples and the comparative examples, the peel strength to the phosphor layer was evaluated by the following method.

又,亦對點亮實施例及比較例之各光半導體裝置時之經時之發光可靠性進行評價。將該等結果示於表1。 Moreover, the light-emitting reliability over time of each of the optical semiconductor devices of the examples and the comparative examples was also evaluated. These results are shown in Table 1.

1.剝離強度 Peel strength

藉由以寬度19mm之剝離接著力[N/19mm],算出於25℃與75℃之各環境下之黏接著劑層對於螢光體陶瓷板之剝離強度。 The peel strength of the adhesive layer to the phosphor ceramic plate in each of the environments of 25 ° C and 75 ° C was calculated by a peeling adhesion force [N/19 mm] having a width of 19 mm.

詳細而言,於作為支持體之厚度25μm之聚醯亞胺膜之表面以寬度成為19mm並且厚度成為40μm之方式塗佈黏接著劑組合物。藉此,形成積層於支持體上之黏接著劑層。繼而,藉由自聚醯亞胺膜之上方利用2kg之滾筒往返1次而將附有黏接著劑層之聚醯亞胺膜壓接於尺寸20mm×20mm之螢光體陶瓷板上。壓接後放置約30分鐘。其後,安裝在內置於設定為特定溫度之恆溫槽內之拉伸試驗裝置內(裝置名:島津製作所公司製造,恆溫槽內拉伸試驗機AUTOGRAPH AG-10kNX),於下述溫度環境下保持5分鐘,其後,於下述條件下將聚醯亞胺膜與黏接著劑層一併自螢光體陶瓷板剝離(剝離),測定此時之剝離接著力作為剝離強度。 Specifically, the adhesive composition was applied to the surface of the polyimide film having a thickness of 25 μm as a support so as to have a width of 19 mm and a thickness of 40 μm. Thereby, an adhesive layer laminated on the support is formed. Then, the polyimide film having the adhesive layer was pressure-bonded to a phosphor ceramic plate having a size of 20 mm × 20 mm by reciprocating from the upper side of the polyimide film by a 2 kg roller. Leave it for about 30 minutes after crimping. Then, it is installed in a tensile tester (the name of the device: manufactured by Shimadzu Corporation, and the tensile tester AUTOGRAPH AG-10kNX), which is placed in a thermostat set to a specific temperature, and is kept at the following temperature. After 5 minutes, the polyimide film and the adhesive layer were peeled off (peeled off) from the phosphor ceramic plate under the following conditions, and the peeling adhesion force at this time was measured as the peel strength.

恆溫槽內之溫度:25℃或75℃ Temperature in the thermostat: 25 ° C or 75 ° C

剝離(剝離)條件:剝離角度180度 Peeling (peeling) conditions: peeling angle of 180 degrees

拉伸速度300mm/min Stretching speed 300mm/min

測定後,算出於75℃環境下之剝離強度PS75℃[N/19mm]相對於25℃環境下之剝離強度PS25℃[N/19mm]之百分率([PS75℃/PS25℃]×100)。 After the measurement, the peel strength PS 75 ° C [N/19 mm] at 75 ° C was calculated as a percentage of the peel strength PS 25 ° C [N/19 mm] at 25 ° C ([PS 75 ° C / PS 25 ° C ] × 100).

2.點亮光半導體裝置時之螢光體層之表面溫度 2. Surface temperature of the phosphor layer when the optical semiconductor device is lit

利用充分尺寸之散熱片與導熱滑脂,連接實施例及比較例之各 光半導體裝置,又,與電源電性連接。繼而,分別對自電源施加350mA之電流而使光半導體裝置初始發光時之發光亮度(初始亮度)與連續發光30天時之亮度(30天後亮度)進行測定。 Using a sufficiently sized heat sink and a thermally conductive grease to connect the examples and comparative examples The optical semiconductor device is further electrically connected to the power source. Then, the luminance (initial luminance) at the time of initial light emission of the optical semiconductor device and the luminance at 30 days of continuous light emission (luminance after 30 days) were measured by applying a current of 350 mA from the power source.

並且,算出30天後亮度相對於初始亮度之百分率([30天後亮度/初始亮度]×100)。 Then, the percentage of the luminance with respect to the initial luminance after 30 days ([luminescence after 30 days/initial luminance] × 100) was calculated.

再者,關於比較例1-b~比較例2-c,由於自螢光體陶瓷板已剝離聚矽氧感壓接著劑層,故而無法測定30天後亮度,而無法算出上述百分率。 Further, in Comparative Example 1-b to Comparative Example 2-c, since the polyfluorene pressure-sensitive adhesive layer was peeled off from the phosphor ceramic plate, the luminance after 30 days could not be measured, and the above percentage could not be calculated.

再者,上述說明係作為本發明之例示之實施形態而提供,但其僅不過為例示,不作限定性地解釋。對於該技術領域之從業人員明瞭之本發明之變化例包含於下述申請專利範圍內。 In addition, the above description is provided as an exemplified embodiment of the present invention, but it is merely illustrative and not to be construed as limiting. Variations of the invention that are apparent to those skilled in the art are included in the scope of the following claims.

1‧‧‧LED-螢光體層黏貼體 1‧‧‧LED-phosphor layer adhesion

2‧‧‧LED 2‧‧‧LED

3‧‧‧螢光體層 3‧‧‧Fluorescent layer

4‧‧‧聚矽氧黏接著劑層 4‧‧‧Polyoxygen adhesive layer

Claims (6)

一種螢光體層黏貼套組,其特徵在於含有螢光體層、及用以將上述螢光體層黏貼於光半導體元件或光半導體元件封裝體上之聚矽氧黏接著劑組合物,且上述聚矽氧黏接著劑組合物之下述剝離強度之百分率為30%以上,剝離強度之百分率=[(75℃環境下之剝離強度PS75℃)/(25℃環境下之剝離強度PS25℃)]×100 75℃環境下之剝離強度PS75℃係將由上述聚矽氧黏接著劑組合物形成且積層於支持體上之上述黏接著劑層黏貼於上述螢光體層上,其後,於溫度75℃下以剝離角度180度、速度300mm/min將上述支持體及上述黏接著劑層自上述螢光體層剝離時的剝離強度,25℃環境下之剝離強度PS25℃係將由上述聚矽氧黏接著劑組合物形成且積層於支持體上之上述黏接著劑層黏貼於上述螢光體層上,其後,於溫度25℃下以剝離角度180度、速度300mm/min將上述支持體及上述黏接著劑層自上述螢光體層剝離時的剝離強度。 A phosphor layer adhesive kit, comprising: a phosphor layer; and a polyoxygen adhesive composition for adhering the phosphor layer to an optical semiconductor element or an optical semiconductor device package, and the polyfluorene composition The percentage of the following peel strength of the oxygen adhesive composition is 30% or more, and the percentage of peel strength = [(peel strength at 75 ° C , PS 75 ° C ) / (peel strength at 25 ° C , PS 25 ° C )] peeling under the × 100 75 ℃ environment strength PS 75 ℃ lines by the above-described poly silicon oxide adhesion adhesive composition is formed and laminated on the support of the above stick on the body adhesive layer is adhered to said phosphor layer, and thereafter, at a temperature of 75 The peel strength when the support and the adhesive layer are peeled off from the phosphor layer at a peeling angle of 180 degrees and a speed of 300 mm/min at ° C, and the peel strength PS 25 ° C in an environment of 25 ° C will be adhered by the above polyoxyl The adhesive layer formed on the support and laminated on the support is adhered to the phosphor layer, and then the support and the adhesive are adhered at a peeling angle of 180 degrees and a speed of 300 mm/min at a temperature of 25 ° C. Subsequent layer Said peel strength of the phosphor layer peeled. 如請求項1之螢光體層黏貼套組,其中上述聚矽氧黏接著劑組合物為聚矽氧感壓接著劑組合物。 The phosphor layer adhesive kit of claim 1, wherein the polyoxygen oxide adhesive composition is a polyoxygen peroxide pressure adhesive composition. 如請求項1之螢光體層黏貼套組,其中上述聚矽氧黏接著劑組合物為兼具熱塑性及熱硬化性之聚矽氧熱塑性-熱硬化性接著劑組合物。 The phosphor layer adhesive kit of claim 1, wherein the polyoxyxylene adhesive composition is a thermoplastic and thermosetting thermoplastic composition having both thermoplasticity and thermosetting properties. 一種光半導體元件-螢光體層黏貼體,其特徵在於包括:光半導體元件;以及螢光黏貼片,其係由含有螢光體層、及用以將上 述螢光體層黏貼於上述光半導體元件上之聚矽氧黏接著劑組合物的螢光體層黏貼套組製作,且上述螢光體層係經由上述聚矽氧黏接著劑組合物而黏貼於上述光半導體元件上;並且上述聚矽氧黏接著劑組合物之下述剝離強度之百分率為30%以上,剝離強度之百分率=[(75℃環境下之剝離強度PS75℃)/(25℃環境下之剝離強度PS25℃)]×100 75℃環境下之剝離強度PS75℃係將由上述聚矽氧黏接著劑組合物形成且積層於支持體上之上述黏接著劑層黏貼於上述螢光體層上,其後,於溫度75℃下以剝離角度180度、速度300mm/min將上述支持體及上述黏接著劑層自上述螢光體層剝離時的剝離強度,25℃環境下之剝離強度PS25℃係將由上述聚矽氧黏接著劑組合物形成且積層於支持體上之上述黏接著劑層黏貼於上述螢光體層上,其後,於溫度25℃下以剝離角度180度、速度300mm/min將上述支持體及上述黏接著劑層自上述螢光體層剝離時的剝離強度。 An optical semiconductor element-phosphor layer adhesive body, comprising: an optical semiconductor element; and a fluorescent adhesive layer comprising a phosphor layer and a layer for bonding the phosphor layer to the optical semiconductor element a phosphor layer adhesive set of the polyoxygen adhesive composition, wherein the phosphor layer is adhered to the optical semiconductor element via the polyoxygen adhesive composition; and the polyoxygen adhesive The percentage of the following peel strength of the composition is 30% or more, and the percentage of peel strength = [(peel strength at 75 ° C environment PS 75 ° C ) / (peel strength at 25 ° C environment PS 25 ° C )] × 100 75 ° C Peeling strength in the environment PS 75 ° C is obtained by adhering the above-mentioned adhesive layer formed of the above polyfluorene adhesive composition and laminated on the support to the above-mentioned phosphor layer, and then peeling off at a temperature of 75 ° C angle of 180 degrees, the speed of 300mm / min to the supporting member and said stick is then peeled from the release agent layer strength when said phosphor layer is peeled off, the intensity of the environment 25 deg.] C PS 25 ℃ silicon oxide-based adhesion by the above adhesive polyethylene compositions The adhesive layer formed on the support and adhered to the phosphor layer is adhered to the phosphor layer, and then the support and the adhesive layer are formed at a peeling angle of 180 degrees and a speed of 300 mm/min at a temperature of 25 ° C. The peel strength at the time of peeling of the above-mentioned phosphor layer. 一種光半導體裝置,其特徵在於包括:基板;安裝於上述基板上之光半導體元件;以及螢光黏貼片,其係由含有螢光體層、及用以將上述螢光體層黏貼於上述光半導體元件上之聚矽氧黏接著劑組合物的螢光體層黏貼套組製作,且上述螢光體層係經由上述聚矽氧黏接著劑組合物而黏貼於上述光半導體元件上;並且上述聚矽氧黏接著劑組合物之下述剝離強度之百分率為30%以上,剝離強度之百分率=[(75℃環境下之剝離強度PS75℃)/(25℃環 境下之剝離強度PS25℃)]×100 75℃環境下之剝離強度PS75℃係將由上述聚矽氧黏接著劑組合物形成且積層於支持體上之上述黏接著劑層黏貼於上述螢光體層上,其後,於溫度75℃下以剝離角度180度、速度300mm/min將上述支持體及上述黏接著劑層自上述螢光體層剝離時的剝離強度,25℃環境下之剝離強度PS25℃係將由上述聚矽氧黏接著劑組合物形成且積層於支持體上之上述黏接著劑層黏貼於上述螢光體層上,其後,於溫度25℃下以剝離角度180度、速度300mm/min將上述支持體及上述黏接著劑層自上述螢光體層剝離時的剝離強度。 An optical semiconductor device, comprising: a substrate; an optical semiconductor component mounted on the substrate; and a fluorescent adhesive layer comprising a phosphor layer and bonding the phosphor layer to the optical semiconductor component a phosphor layer adhesive set of the above polyoxygen adhesive composition, wherein the phosphor layer is adhered to the optical semiconductor element via the polyoxygen adhesive composition; and the polyoxygen oxide is adhered The percentage of the following peel strength of the subsequent composition is 30% or more, and the percentage of peel strength = [(peel strength at 75 ° C , PS 75 ° C ) / (peel strength at 25 ° C , PS 25 ° C )] × 100 Peel strength at 75 ° C. PS 75 ° C is a layer of the adhesive layer formed of the above polyadox adhesive composition and laminated on a support, and then adhered to the above-mentioned phosphor layer, and then at a temperature of 75 ° C The peeling strength when the support and the adhesive layer are peeled off from the phosphor layer at a peeling angle of 180 degrees and a speed of 300 mm/min, and the peel strength PS 25 ° C in an environment of 25 ° C will be bonded by the above-mentioned polyfluorene oxide. The adhesive layer formed on the support composition and laminated on the support is adhered to the phosphor layer, and then the support and the adhesive are adhered at a peeling angle of 180 degrees and a speed of 300 mm/min at a temperature of 25 ° C. The peel strength of the subsequent layer when peeling off from the above phosphor layer. 一種光半導體裝置,其特徵在於包括:光半導體封裝體,其包含基板、安裝於上述基板上之光半導體元件、形成於上述基板之厚度方向一側且以於上述厚度方向上進行投影時包圍上述光半導體元件之方式配置之反射器、及填充於上述反射器內而密封上述光半導體元件之密封層;以及螢光黏貼片,其係由含有螢光體層、及用以將上述螢光體層黏貼於上述光半導體元件封裝體上之聚矽氧黏接著劑組合物的螢光體層黏貼套組製作,且上述螢光體層係經由上述聚矽氧黏接著劑組合物而黏貼於上述光半導體封裝體之上述厚度方向一側;並且上述聚矽氧黏接著劑組合物之下述剝離強度之百分率為30%以上,剝離強度之百分率=[(75℃環境下之剝離強度PS75℃)/(25℃環境下之剝離強度PS25℃)]×100 75℃環境下之剝離強度PS75℃係將由上述聚矽氧黏接著劑組合物形成且積層於支持體上之上述黏接著劑層黏貼於上述螢光體 層上,其後,於溫度75℃下以剝離角度180度、速度300mm/min將上述支持體及上述黏接著劑層自上述螢光體層剝離時的剝離強度,25℃環境下之剝離強度PS25℃係將由上述聚矽氧黏接著劑組合物形成且積層於支持體上之上述黏接著劑層黏貼於上述螢光體層上,其後,於溫度25℃下以剝離角度180度、速度300mm/min將上述支持體及上述黏接著劑層自上述螢光體層剝離時的剝離強度。 An optical semiconductor device comprising: a substrate; an optical semiconductor element mounted on the substrate; and an optical semiconductor element formed on the substrate in a thickness direction thereof and surrounding the substrate in a thickness direction a reflector disposed in the form of an optical semiconductor element; and a sealing layer filled in the reflector to seal the optical semiconductor element; and a fluorescent adhesive layer comprising a phosphor layer and a layer for bonding the phosphor layer a phosphor layer adhesive set of the polyoxynitride adhesive composition on the optical semiconductor device package, wherein the phosphor layer is adhered to the optical semiconductor package via the polyoxygen adhesive composition The thickness direction side is the same; and the polyether oxide adhesive composition has a percentage of the following peel strength of 30% or more, and the percentage of peel strength = [(peel strength at 75 ° C environment PS 75 ° C ) / (25 Peel strength under °C environment PS 25°C )]×100 Peel strength at 75°C environment PS 75°C will be formed from the above polyfluorene adhesive composition and laminated The adhesive layer on the support is adhered to the phosphor layer, and then the support and the adhesive layer are irradiated from the fluorescent layer at a peeling angle of 180 degrees and a speed of 300 mm/min at a temperature of 75 ° C. Peel strength at the time of peeling of the body layer, peel strength in an environment of 25 ° C , PS 25 ° C , the above-mentioned adhesive layer formed of the above-mentioned polyoxynoxy adhesive composition and laminated on the support is adhered to the above-mentioned phosphor layer. Thereafter, the peel strength of the support and the adhesive layer from the phosphor layer was peeled at a peeling angle of 180 degrees and a speed of 300 mm/min at a temperature of 25 °C.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10734543B2 (en) 2015-03-06 2020-08-04 Lumileds Llc Method for attaching ceramic phosphor plates on light-emitting device (LED) dies using a dicing tape, method to form a dicing tape, and dicing tape
TWI739351B (en) * 2015-06-09 2021-09-11 荷蘭商露明控股公司 Led fabrication using high-refractive-index adhesives

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5960014B2 (en) * 2012-09-28 2016-08-02 日東電工株式会社 Fluorescent adhesive sheet, optical semiconductor element-phosphor layer pressure sensitive adhesive, and optical semiconductor device
JP6331710B2 (en) * 2014-05-30 2018-05-30 日亜化学工業株式会社 Light emitting device manufacturing method and light emitting device
JP6519133B2 (en) * 2014-09-25 2019-05-29 三菱ケミカル株式会社 Laminated structure and light emitting device
CN107710426A (en) * 2014-10-09 2018-02-16 夏普株式会社 Light-emitting device
WO2016060677A1 (en) 2014-10-17 2016-04-21 Intel Corporation Micro pick and bond assembly
CN105990496B (en) * 2015-03-04 2018-11-16 光宝光电(常州)有限公司 LED encapsulation structure and its manufacturing method
CN104793275A (en) * 2015-04-29 2015-07-22 宁波江北激智新材料有限公司 Chromaticity coordinate and color gamut range adjustable fluorescent film
TWI579589B (en) 2015-08-31 2017-04-21 中強光電股份有限公司 Wavelength conversion device and projector
DE102015120775A1 (en) 2015-11-30 2017-06-01 Osram Opto Semiconductors Gmbh Opto-electronic component and backlight for a display
KR102010892B1 (en) * 2015-12-07 2019-08-14 주식회사 엘지화학 Color conversion film and method for preparing the same
JP6561815B2 (en) * 2015-12-14 2019-08-21 豊田合成株式会社 Manufacturing method of semiconductor light emitting device
CN107203088B (en) 2016-03-18 2019-10-22 中强光电股份有限公司 Wavelength transformational structure and projection arrangement
JP2017227772A (en) * 2016-06-22 2017-12-28 日東電工株式会社 Phosphor layer sheet, and method of manufacturing optical semiconductor element with phosphor layer
CN109782516B (en) 2017-11-15 2021-10-22 中强光电股份有限公司 Projector and wavelength conversion element
WO2020044999A1 (en) 2018-08-27 2020-03-05 ソニー株式会社 Wavelength conversion element and light source module, and projection type display device
US10600937B1 (en) * 2018-09-17 2020-03-24 Lumileds Holding B.V. Precise bondline control between LED components
US11545597B2 (en) 2018-09-28 2023-01-03 Lumileds Llc Fabrication for precise line-bond control and gas diffusion between LED components
JP6669292B2 (en) * 2019-02-28 2020-03-18 日亜化学工業株式会社 Light emitting device and method of manufacturing the same
JP7022285B2 (en) * 2019-07-02 2022-02-18 日亜化学工業株式会社 Light emitting device and its manufacturing method
JP7111993B2 (en) * 2019-12-20 2022-08-03 日亜化学工業株式会社 Method for manufacturing light-emitting module
US11322665B2 (en) * 2020-05-14 2022-05-03 Lumileds Llc Adhesive film transfer coating and use in the manufacture of light emitting devices
CN115668520A (en) * 2020-05-14 2023-01-31 亮锐有限责任公司 Adhesive film transfer coating and its use in the manufacture of light emitting devices

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0819393B2 (en) 1992-12-09 1996-02-28 日東電工株式会社 Pressure-sensitive adhesives and their adhesive sheets
JP2002338934A (en) * 2001-05-17 2002-11-27 Three M Innovative Properties Co Adhesive composition and adherent article
US7294861B2 (en) * 2005-06-30 2007-11-13 3M Innovative Properties Company Phosphor tape article
JP2007246880A (en) 2006-02-20 2007-09-27 Matsushita Electric Works Ltd Semiconductor light device and transparent optical member
US20080121911A1 (en) * 2006-11-28 2008-05-29 Cree, Inc. Optical preforms for solid state light emitting dice, and methods and systems for fabricating and assembling same
US8334037B2 (en) * 2007-05-11 2012-12-18 3M Innovative Properties Company Multi-layer assembly, multi-layer stretch releasing pressure-sensitive adhesive assembly, and methods of making and using the same
WO2009063847A1 (en) * 2007-11-16 2009-05-22 Taica Coporation Transparent pressure-sensitive adhesive product for optical use, transparent pressure-sensitive adhesive laminates for optical use and process for production of the same
JP2009277705A (en) * 2008-05-12 2009-11-26 Koa Corp Package light-emitting component and method of manufacturing the same
JP4923165B2 (en) * 2009-05-18 2012-04-25 株式会社タイカ Optical transparent adhesive, optical transparent adhesive laminate, and method for producing the same
JP5744386B2 (en) * 2009-10-07 2015-07-08 日東電工株式会社 Optical semiconductor encapsulant
JP2011148883A (en) * 2010-01-20 2011-08-04 Nitto Denko Corp Composition for silicone resin
JP5328705B2 (en) * 2010-03-26 2013-10-30 日東電工株式会社 Composition for silicone resin
JP5511524B2 (en) * 2010-06-07 2014-06-04 日東電工株式会社 Sealing sheet for optical semiconductor
JP2012160664A (en) * 2011-02-02 2012-08-23 Bridgestone Kbg Co Ltd White light obtained from blue led, and silicone tape used for the same
JP6230233B2 (en) * 2012-04-23 2017-11-15 日東電工株式会社 Surface protection film
JP5960014B2 (en) * 2012-09-28 2016-08-02 日東電工株式会社 Fluorescent adhesive sheet, optical semiconductor element-phosphor layer pressure sensitive adhesive, and optical semiconductor device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10734543B2 (en) 2015-03-06 2020-08-04 Lumileds Llc Method for attaching ceramic phosphor plates on light-emitting device (LED) dies using a dicing tape, method to form a dicing tape, and dicing tape
TWI787147B (en) * 2015-03-06 2022-12-21 荷蘭商露明控股公司 Methods for providing ceramic phosphor plates to light-emitting device (led) dies, tapes for dicing or transferring of ceramic phosphor plates, methods for placing a ceramic phosphor plate onto a tape, and methods for using a tape
US11563141B2 (en) 2015-03-06 2023-01-24 Lumileds Llc Method for attaching ceramic phosphor plates on light-emitting device (LED) dies using a dicing tape, method to form a dicing tape, and dicing tape
TWI739351B (en) * 2015-06-09 2021-09-11 荷蘭商露明控股公司 Led fabrication using high-refractive-index adhesives

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