TW201413002A - Microsphere-filled-metal components for wireless-communication towers - Google Patents

Microsphere-filled-metal components for wireless-communication towers Download PDF

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TW201413002A
TW201413002A TW102135133A TW102135133A TW201413002A TW 201413002 A TW201413002 A TW 201413002A TW 102135133 A TW102135133 A TW 102135133A TW 102135133 A TW102135133 A TW 102135133A TW 201413002 A TW201413002 A TW 201413002A
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metal
microspheres
microsphere
filled
filled metal
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TW102135133A
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TWI607094B (en
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Mohamed Esseghir
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Dow Global Technologies Llc
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    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C1/00Making non-ferrous alloys
    • C22C1/08Alloys with open or closed pores
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/10Sintering only
    • B22F3/11Making porous workpieces or articles
    • B22F3/1103Making porous workpieces or articles with particular physical characteristics
    • B22F3/1112Making porous workpieces or articles with particular physical characteristics comprising hollow spheres or hollow fibres
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C21/00Alloys based on aluminium
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C23/00Alloys based on magnesium
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01PWAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P1/00Auxiliary devices
    • H01P1/20Frequency-selective devices, e.g. filters
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/10Sintering only
    • B22F3/11Making porous workpieces or articles
    • B22F3/1103Making porous workpieces or articles with particular physical characteristics
    • B22F2003/1106Product comprising closed porosity
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/10Sintering only
    • B22F3/11Making porous workpieces or articles
    • B22F3/1103Making porous workpieces or articles with particular physical characteristics
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04WWIRELESS COMMUNICATION NETWORKS
    • H04W88/00Devices specially adapted for wireless communication networks, e.g. terminals, base stations or access point devices
    • H04W88/08Access point devices

Abstract

A wireless-communications-tower component being at least partially formed from a microsphere-filled metal. The microsphere-filled metal has a density of less than 2.7 g/cm<SP>3</SP>, a thermal conductivity greater than 1 W/m.K, and a coefficient of thermal expansion of less than 30 μ m/m.K. Microspheres suitable for use in such microsphere-filled metal include, for example, glass microspheres, mullite microspheres, alumina microspheres, alumino-silicate microspheres, ceramic microspheres, silica-carbon microspheres, carbon microspheres, and mixtures of two or more thereof.

Description

用於無線通訊塔的經微球填充之金屬組件 Microsphere filled metal component for wireless communication tower 相關申請案之參照Reference to relevant application

本發明主張2012年9月28日提申之U.S.臨時申請案No.61/707,085之優先權。 The present invention claims priority to U.S. Provisional Application No. 61/707,085, filed on Sep. 28, 2012.

領域field

本發明之各個實施例係有關於用於無線通訊塔之以金屬為主之組件。 Various embodiments of the present invention are directed to metal-based components for wireless communication towers.

序論Preface

於通訊系統之領域中,被預期的是全球頻寬需求將逐年增加以支持新服務及增加的使用者數量,因此將無線系統轉移至更高頻的頻寬。在工業中有趨勢去將基站電子裝置自該塔基移動至無線通訊塔之較高區域(即,塔頂電子裝置);這是為了減少將該塔頂連接至底部裝置的通訊電纜之信號損失。隨著被移動至塔頂之組件數量的增加,該等組件的重量成為一個問題。 In the field of communication systems, it is expected that global bandwidth demand will increase year by year to support new services and increase the number of users, thus shifting wireless systems to higher frequency bandwidth. There is a trend in the industry to move base station electronics from the tower base to a higher area of the wireless communication tower (ie, the tower top electronics); this is to reduce the signal loss of the communication cable connecting the tower top to the bottom unit. . As the number of components moved to the top of the tower increases, the weight of such components becomes a problem.

概要summary

一實施例為一種裝置,包含: 一無線通訊塔組件,其係至少部分由經微球填充之金屬所形成,其中該經微球填充之金屬於25℃下測量,具有少於每立方公分2.7克(“g/cm3”)之密度。 An embodiment is an apparatus comprising: a wireless communication tower assembly formed at least in part by a metal filled with microspheres, wherein the microsphere filled metal is measured at 25 ° C, having less than 2.7 per cubic centimeter The density of grams ("g/cm 3 ").

詳細說明Detailed description

本發明之各個實施例有關於至少部分由一以金屬為主之材料形成的無線通訊塔組件。此種以金屬為主之材料可具有某些性質,該等性質使其適於塔頂應用,包括某些範圍之密度、熱導性,及熱膨脹係數等。此等無線通訊塔組件可包括射頻(“RF”)孔腔濾波器、散熱器、外殼、塔頂支撐配件,及其等之組合等。 Various embodiments of the present invention are directed to a wireless communication tower assembly formed at least in part from a metal-based material. Such metal-based materials may have certain properties that make them suitable for use in overhead applications, including certain ranges of density, thermal conductivity, and coefficient of thermal expansion. Such wireless communication tower assemblies may include radio frequency ("RF") cavity filters, heat sinks, housings, tower top support assemblies, combinations thereof, and the like.

以金屬為主之材料Metal-based material

正如剛才提到的,該無線通訊塔組件可為至少部分由以金屬為主之材料形成。如這裡所使用的,“以金屬為主”之材料為包含金屬做為一主要(即,大於25重量百分比(“wt%”))組分的材料。於各個實施例中,該以金屬為主之材料可包含以至少50、至少60、至少70、至少80、至少90,或至少95wt%之總量組合的一或多種金屬。於一些實施例中,一或多種金屬構成該以金屬為主之材料的全部或實質上全部。如此處所使用的,該“實質上全部”一詞代表未被敘述之組分獨自地小於百萬分之10份(“ppm”)的存在。於另 外的實施例中,該以金屬為主之材料可為金屬與一或多種填料的複合物,如以下更為詳細的敘述,以及因此可包含於較低比例之一或多種金屬(例如,自低至5wt%高至99wt%)。 As just mentioned, the wireless communication tower assembly can be formed at least in part from a metal based material. As used herein, a "metal-based" material is a material that comprises a metal as a major (i.e., greater than 25 weight percent ("wt%")) component. In various embodiments, the metal-based material can comprise one or more metals combined in a total amount of at least 50, at least 60, at least 70, at least 80, at least 90, or at least 95 wt%. In some embodiments, one or more metals constitute all or substantially all of the metal-based material. As used herein, the term "substantially all" refers to the presence of less than 10 parts per million ("ppm") of the undescribed component alone. Another In other embodiments, the metal-based material can be a composite of a metal and one or more fillers, as described in more detail below, and thus can be included in a lower ratio of one or more metals (eg, from As low as 5 wt% up to 99 wt%).

該以金屬為主之材料的金屬組分可為任何已知或此後發現之金屬或金屬的組合(即,合金)。於各個實施例中,該以金屬為主汁材料可包含一低密度金屬,諸如鋁或鎂,或其他金屬諸如鎳、鐵、青銅、銅或其等之合金。於一或多個實施例中,該以金屬為主之材料可包含一金屬合金,諸如鋁或鎂及其等之合金。於某些實施例中,該以金屬為主之材料包含鋁。於各個實施例中,鋁構成該以金屬為主之材料的至少50、至少60、至少70、至少80、至少90、至少95wt%、實質上全部或全部的金屬組分。因此,於各個實施例中,該以金屬為主之材料可為一以鋁為主之材料。另外,被使用之該鋁可為鋁合金,諸如AA 6061。合金6061通常包含97.9wt%之鋁、0.6wt%之矽、0.28wt%之銅、1.0wt%之鎂,及0.2wt%之鉻。 The metal component of the metal-based material can be any metal or combination of metals (i.e., alloys) known or later discovered. In various embodiments, the metal-based juice material may comprise a low density metal such as aluminum or magnesium, or an alloy of other metals such as nickel, iron, bronze, copper or the like. In one or more embodiments, the metal-based material may comprise a metal alloy such as aluminum or magnesium and alloys thereof. In certain embodiments, the metal-based material comprises aluminum. In various embodiments, the aluminum constitutes at least 50, at least 60, at least 70, at least 80, at least 90, at least 95 wt%, substantially all or all of the metal component of the metal-based material. Therefore, in various embodiments, the metal-based material may be an aluminum-based material. In addition, the aluminum used may be an aluminum alloy such as AA 6061. Alloy 6061 typically comprises 97.9 wt% aluminum, 0.6 wt% rhodium, 0.28 wt% copper, 1.0 wt% magnesium, and 0.2 wt% chromium.

如上所述,該以金屬為主之材料可具有某些特性。於各個實施例中,該以金屬為主之材料具有每立方公分少於2.7、少於2.6、少於2.5、少於2.4、少於2.3、少於2.2、少於2.1,或少於2.0克(“g/cm3”)的密度。於該等實施例中,該以金屬為主之材料可具有至少0.1g/cm3之密度。因該以金屬為主之材料可包括聚合物-金屬複合物,如下所述,此處所提供之密度值可根據ASTM D792於25℃下測量。對於 非聚合物/金屬複合物材料,密度可根據ASTM D1505藉由密度梯度法而測量。 As noted above, the metal based material can have certain characteristics. In various embodiments, the metal-based material has less than 2.7, less than 2.6, less than 2.5, less than 2.4, less than 2.3, less than 2.2, less than 2.1, or less than 2.0 grams per cubic centimeter. The density of ("g/cm 3 "). In such embodiments, the metal-based material can have a density of at least 0.1 g/cm 3 . Since the metal-based material may comprise a polymer-metal composite, the density values provided herein may be measured at 25 ° C according to ASTM D792, as described below. For non-polymer/metal composite materials, the density can be measured by density gradient method according to ASTM D1505.

於各個實施例中,該以金屬為主之材料具有每米凱氏溫度大於1、大於2、大於3、大於4、大於5,或大於6瓦特(“W/m.K”)之熱導性。於該等實施例中,該以金屬為主之材料可具有不大於50,或不大於100、不大於180,或不大於250W/m.K之熱導性。所有此處所提供之熱導性值為根據ISO 22007-2(瞬時平面熱源[熱盤]法)於25℃測量。於各個實施例中,該以金屬為主之材料具有每米凱氏溫度小於50、小於45、小於40、小於35、小於30,或小於26微米(“μm/m.K,”其等於ppm/℃)之線性等向性熱膨脹係數(“CTE”)。於該等實施例中,該以金屬為主之材料可具有至少10μm/m.K之CTE。此處所提供之所有CTE值為具提供於下列測試方法章節中之程序所測量。 In various embodiments, the metal-based material has a thermal conductivity of Kelvin temperature greater than 1, greater than 2, greater than 3, greater than 4, greater than 5, or greater than 6 watts ("W/m.K") per meter. Sex. In these embodiments, the metal-based material may have no more than 50, or no more than 100, no more than 180, or no more than 250 W/m. The thermal conductivity of K. All of the thermal conductivity values provided herein are measured at 25 ° C according to ISO 22007-2 (Instantaneous Planar Heat Source [Hot Disc] Method). In various embodiments, the metal-based material has a Kjeldahl temperature of less than 50, less than 45, less than 40, less than 35, less than 30, or less than 26 microns per meter ("μm/m.K," which is equal to ppm /°C) Linear isotropic thermal expansion coefficient ("CTE"). In these embodiments, the metal-based material may have a size of at least 10 μm/m. K's CTE. All CTE values provided herein are measured by the procedures provided in the Test Methods section below.

於各個實施例中,該以金屬為主之材料具有至少5.0百萬帕斯卡(“MPa”)之抗拉強度(tensile strength)。於該等實施例中,該以金屬為主之材料可具有通常不大於500MPa之極限抗拉強度。因該此處所數之以金屬為主之材料亦有關於聚合物-金屬複合物,此處所提供之所有抗拉強度為根據ASTM D638所測量。對於僅為金屬之樣品,根據ASTM B557M測量抗拉特性。 In various embodiments, the metal based material has a tensile strength of at least 5.0 megapascals ("MPa"). In such embodiments, the metal-based material can have an ultimate tensile strength of typically no greater than 500 MPa. Since the metal-based materials referred to herein are also related to polymer-metal composites, all tensile strengths provided herein are measured in accordance with ASTM D638. For samples of only metals, the tensile properties were measured according to ASTM B557M.

於各個實施例中,該以金屬為主之材料可為發泡金屬(foamed metal)。如此處所使用的,該“發泡金屬”一詞表示具有含空隙孔洞之體積部分的多孔結構之金屬。該發 泡金屬之金屬可為現今技術已知或往後發現之任何適合用於製備發泡金屬的金屬。例如,該發泡金屬之金屬可選自於鋁、鎂,及銅等,及其等之合金。於某些實施例中,該發泡金屬可為發泡鋁。 In various embodiments, the metal-based material can be a foamed metal. As used herein, the term "foamed metal" means a metal having a porous structure having a volumetric portion of a voided void. The hair The metal of the metal foam can be any metal suitable for the preparation of foamed metal known or later discovered in the art. For example, the metal of the foamed metal may be selected from the group consisting of aluminum, magnesium, copper, and the like, and the like. In certain embodiments, the foamed metal can be expanded aluminum.

於各個實施例中,該發泡金屬可具有於自0.1至2.0g/cm3、自0.1至1.0g/cm3,或自0.25至0.5g/cm3範圍內的密度。於一些實施例中,該發泡金屬可具有自0.03至0.9、自0.1至0.7,或自0.14至0.5之相對密度,其中該相對密度(無尺度)係定義為該發泡金屬之密度對該基本金屬(即,其他相同金屬之非發泡樣品)之密度的比例。另外,該發泡金屬可具有於自5至150W/m.K、自8至125W/m.K,或自15至80W/m.K範圍內之熱導性。再者,該發泡金屬可具有於自15至25μm/m.K,或自19至23μm/m.K範圍內的CTE。於各個實施例中,該發泡金屬可具有於自5至500MPa,自20至400MPa、自50至300MPa、自60至200MPa,或自80至200MPa之範圍內的抗拉強度。 In various embodiments, the foamed metal can have a density ranging from 0.1 to 2.0 g/cm 3 , from 0.1 to 1.0 g/cm 3 , or from 0.25 to 0.5 g/cm 3 . In some embodiments, the foamed metal may have a relative density from 0.03 to 0.9, from 0.1 to 0.7, or from 0.14 to 0.5, wherein the relative density (no scale) is defined as the density of the foamed metal. The ratio of the density of the base metal (ie, non-foamed samples of other identical metals). In addition, the foamed metal may have from 5 to 150 W/m. K, from 8 to 125W/m. K, or from 15 to 80 W/m. Thermal conductivity in the K range. Furthermore, the foamed metal may have a thickness of from 15 to 25 μm/m. K, or from 19 to 23 μm/m. CTE within the K range. In various embodiments, the foamed metal may have a tensile strength in the range of from 5 to 500 MPa, from 20 to 400 MPa, from 50 to 300 MPa, from 60 to 200 MPa, or from 80 to 200 MPa.

於各個實施例中,該發泡金屬可為一封閉(closed-cell)發泡金屬。如習知技藝所知的,該“封閉”一詞表示一結構,其中該以金屬為主之材料中的空隙孔洞之主要部分為隔離之孔洞(即,不與其他空隙孔洞相連接)。封閉發泡金屬可通常具有於自1至8毫米(“mm”)範圍內的單元尺寸。 In various embodiments, the foamed metal can be a closed-cell foamed metal. As is known in the art, the term "closed" means a structure in which the major portion of the voided void in the metal-based material is an isolated void (i.e., not joined to other voided voids). The closed foamed metal can generally have a cell size ranging from 1 to 8 millimeters ("mm").

於各個實施例中,該發泡金屬可為一開放(open-cell)發泡金屬。如習知技藝所知的,該“開放”一詞表 示一結構,其中該以金屬為主之材料中的空隙孔洞之主要部分為互連孔洞(即,與一或多個相鄰孔洞開放接觸)。開放發泡金屬可通常具有於自0.5至10mm範圍內的單元尺寸。 In various embodiments, the foamed metal can be an open-cell foamed metal. As known in the art, the term "open" is used. A structure is shown in which a major portion of the voids in the metal-based material is interconnected (i.e., in open contact with one or more adjacent holes). The open foamed metal can generally have a cell size ranging from 0.5 to 10 mm.

商業上可取得之發泡金屬可被用於此處所述之各個實施例中。例如,合適之發泡鋁材料可自Isotech Inc獲得,無論是片狀或3維鑄型。此等材料亦可自FoamtechTM公司、RacematTM BV,及ReadeTM國際公司獲得,皆為片狀。 Commercially available foamed metal can be used in the various embodiments described herein. For example, suitable expanded aluminum materials are available from Isotech Inc., whether in sheet or 3 dimensional molds. Such materials may also be self Foamtech TM Corporation, Racemat TM BV, is obtained and Reade TM International, are all sheet-like.

於各個實施例中,特別是使用開放發泡金屬時,該發泡金屬可存在有一表面區域或表面區域之一部分,該位置為(a)非發泡金屬,抑或(b)經以聚合物為主之材料所塗覆。於該等實施例中,該發泡金屬可因此存在於沒有或實質上沒有缺陷(即,平滑)之表面上。該等表面可促進金屬電鍍並允許需要平滑表面之組件,諸如散熱片的形成,其中該所欲之強度可能無法單獨以之發泡結構所達成。另外,因為該等候度,散熱片(fins)不通常於建構中添加大量重量,因此希望保留一非發泡結構或以一以聚合物為主之材料填充該發泡結構之空隙孔洞以增加力量。當一表面區域為非發泡,該非發泡部分可具有於自0.05至5mm之範圍的自該表面之平均深度。具有非發泡表面部分之合適發泡金屬的實例為穩定化鋁泡體,商業上可自AlusionTM,Cymat科技公司之分公司,多倫多,加拿大取得。 In various embodiments, particularly when an open foamed metal is used, the foamed metal may have a surface region or a portion of the surface region that is (a) a non-foamed metal or (b) a polymer The main material is coated. In such embodiments, the foamed metal may thus be present on a surface that is free or substantially free of defects (i.e., smooth). Such surfaces may facilitate metal plating and allow for the formation of components that require a smooth surface, such as the formation of heat sinks, where the desired strength may not be achieved by the foamed structure alone. In addition, because of the waiting degree, the fins are not usually added with a large amount of weight in the construction, so it is desirable to retain a non-foamed structure or to fill the void hole of the foamed structure with a polymer-based material to increase the strength. . When a surface area is non-foamed, the non-foamed portion may have an average depth from the surface ranging from 0.05 to 5 mm. Examples of suitable foam having a non-foamed surface portion of the metal is an aluminum stabilized bubbles, self branch Alusion TM, Cymat commercially Technology Company, Toronto, Canada achieved.

改良該發泡金屬之熱散逸之另外途徑可為,例如,經由該發泡核心使用風道促進空氣循環而不影響該物 件之整體效能,諸如保留一封閉外殼以保護被包圍之組件。此途徑在使用非發泡外部層時為特別有用的,即其中該循環僅藉由審慎設置之通道中發生於核心中。 Another way to improve the heat dissipation of the foamed metal may be, for example, using a duct to promote air circulation via the foam core without affecting the object The overall performance of the piece, such as retaining a closed outer casing to protect the enclosed component. This approach is particularly useful when using a non-foamed outer layer, ie where the cycle occurs only in the core by a carefully set channel.

以聚合物為主之材料被使用以提供一無缺陷或實質上無缺陷之表面時,或用以填充或至少部分填充該發泡結構用於加強強度時,該以聚合物為主之材料可被於自0.05mm至完全滲透該發泡金屬(以形成一貫穿聚合物-金屬網路)的厚度。用於此等實施例中之以聚合物為主之材料的實例包括熱固環氧樹脂,或熱塑非晶質或結晶性聚合物。於一實施例中,該以聚合物為主之材料為一熱固環氧樹脂。以聚合物為主之材料可被施用至一表面區域,或使用任何領域中習知或往後發現之方法滲透至該發泡金屬之結構內。例如,此應用可藉由真空鑄造或加壓浸漬,或於壓力下以熱塑材料插入成型。該聚合物材料可自己被以適當填料填充以降低密度、熱強度,及/或熱導性增強。該等填料可包括二氧化矽、石英、氧化鋁、氮化硼、氮化鋁、石墨、炭黑、奈米碳管、鋁薄片、纖維、玻璃纖維、玻璃或陶瓷微球,及其等之二或多者的組合。 When a polymer-based material is used to provide a defect-free or substantially defect-free surface, or to fill or at least partially fill the foamed structure for strength, the polymer-based material may It is from 0.05 mm to completely penetrate the thickness of the foamed metal (to form a through polymer-metal network). Examples of polymer-based materials for use in such embodiments include thermoset epoxy resins, or thermoplastic amorphous or crystalline polymers. In one embodiment, the polymer-based material is a thermoset epoxy resin. The polymer based material can be applied to a surface area or into the structure of the foamed metal using methods known or later discovered in any field. For example, the application can be formed by vacuum casting or pressure impregnation, or by compression molding with a thermoplastic material under pressure. The polymeric material can itself be filled with a suitable filler to reduce density, thermal strength, and/or thermal conductivity. The fillers may include ceria, quartz, alumina, boron nitride, aluminum nitride, graphite, carbon black, carbon nanotubes, aluminum flakes, fibers, glass fibers, glass or ceramic microspheres, and the like. A combination of two or more.

於各個實施例中,該以金屬為主之材料可為一經微球填充之金屬。如此處所使用的,該“微球”一詞表示具有少於500微米(“μm”)之質量中值直徑(“D50”)的填充材料。適合用於此處之微球填料通常可具有球狀或實質上球狀的型狀。該經微球填充之金屬的金屬可為上述之任何金屬。如上述所指出的,該以金屬為主之材料的金屬可為鋁。 因此,於某些實施例中,該經微球填充之金屬可為經微球填充之鋁。 In various embodiments, the metal-based material can be a microsphere-filled metal. As used herein, the term "microspheres" means a filler material having a mass median diameter ("D50") of less than 500 microns ("μm"). Microsphere fillers suitable for use herein may generally have a spherical or substantially spherical shape. The metal of the microsphere-filled metal may be any of the metals described above. As indicated above, the metal-based material of the metal may be aluminum. Thus, in certain embodiments, the microsphere filled metal can be microsphere filled aluminum.

於各個實施例中,該經微球填充之金屬可具有於自0.6至2g/cm3之範圍的密度。另外,該經微球填充之金屬可具有於自5至150W/m.K之範圍的熱導性。再者,該經微球填充之金屬可具有於自8至25μm/m.K之範圍的線性等向CTE。於各個實施例中,該經微球填充之金屬可具有於自0.8至60Kpsi(~5.5至413.7MPa)之範圍的抗拉強度。 In various embodiments, the microsphere-filled metal can have a density ranging from 0.6 to 2 g/cm 3 . In addition, the microsphere-filled metal may have a thickness of from 5 to 150 W/m. The thermal conductivity of the range of K. Furthermore, the microsphere-filled metal may have a thickness of from 8 to 25 μm/m. The linear isotropic CTE of the range of K. In various embodiments, the microsphere filled metal can have a tensile strength ranging from 0.8 to 60 Kpsi (~5.5 to 413.7 MPa).

各種類型之微球填料可被使用於適合用於此處之該經微球填充之金屬中。於各個實施例中,該等微球填料為空心者。另外,於某些實施例中,該等微球可選自於由玻璃微球、富鋁紅柱石(mullite)微球、氧化鋁微球、鋁-矽酸鹽微球(亦稱空心微珠(cenospheres))、陶瓷微球、二氧化矽-碳微球、碳微球,及其等之二或多者之混合物。 Various types of microsphere fillers can be used in the microsphere filled metal suitable for use herein. In various embodiments, the microsphere fillers are hollow. In addition, in some embodiments, the microspheres may be selected from the group consisting of glass microspheres, mullite microspheres, alumina microspheres, and aluminum-germanate microspheres (also known as hollow microspheres). (cenospheres), ceramic microspheres, ceria-carbon microspheres, carbon microspheres, and mixtures of two or more thereof.

於各個實施例中,適合用於此處之微球可具有自8至30μm之顆粒尺寸分布D10。另外,該等微球可具有自10至70μm之D50。次又,該等微球可具有自25至125μm之D90。再者,該等微球可具有自0.1至0.7g/cm3之範圍的真密度。如該領域中所熟知者,“真”密度為不考慮顆粒間間隙空間所測量之密度(與“體密度”(bulk density)相反)。該等微球之真密度可以如敘述於歐洲專利申請案No.EP 1 156 021 A1中之氦氣取代型乾燥自動化密度計(例如,Shimadzu公司之Acupic 1330)所測量。另外,適合用於此處之微球可具有自0.1至8μm/m.K之範圍的CTE。再者,適用之微球可 具有自0.5至5W/m.K之範圍的熱導性。該等微球亦可為經金屬塗覆者。 In various embodiments, the microspheres suitable for use herein may have a particle size distribution D10 from 8 to 30 [mu]m. Additionally, the microspheres can have a D50 from 10 to 70 [mu]m. Again, the microspheres can have a D90 from 25 to 125 [mu]m. Further, the microspheres may have a true density ranging from 0.1 to 0.7 g/cm 3 . As is well known in the art, the "true" density is the density measured relative to the inter-particle gap space (as opposed to "bulk density"). The true density of the microspheres can be measured by a helium-substituted dry automated densitometer (e.g., Acupic 1330 from Shimadzu Corporation) as described in European Patent Application No. EP 1 156 021 A1. In addition, the microspheres suitable for use herein may have from 0.1 to 8 μm/m. The CTE of the range of K. Furthermore, suitable microspheres can have from 0.5 to 5 W/m. The thermal conductivity of the range of K. The microspheres can also be metal coated.

於各個實施例中,該等微球可於構成,以該經微球填充之金屬之總體積為基準,自1至95體積百分比(“vol%”)、一10至80vol%,或自30至70vol%之範圍。 In various embodiments, the microspheres can be constructed from 1 to 95 volume percent ("vol%"), from 10 to 80 vol%, or from 30, based on the total volume of the microsphere-filled metal. To the range of 70 vol%.

於一或多個實施例中,該等微球可可擇地與一或多種類型的習知填充材料相組合。習知填充材料之實例包括二氧化矽及氧化鋁。 In one or more embodiments, the microspheres are optionally combined with one or more types of conventional filler materials. Examples of conventional filler materials include ceria and alumina.

商業上可取得知經微球填充之金屬可被使用於此處所述之各個實施例中。此等商業上可取得之一者的實例為來自Powdermet Inc.,Euclid,OH,USA之SComPTMCommercially available microsphere-filled metals can be used in the various embodiments described herein. Examples of such commercially available one person to get from Powdermet Inc., Euclid, OH, USA of SComP TM.

於各個實施例中,該經微球填充之金屬可存在有一表面區域或表面區域之一部分,其為(a)非經微球填充之金屬,抑或(b)經以聚合物為主之材料塗覆。於該等實施例中,該經微球填充之金屬可因此存在於沒有或實質上沒有缺陷(即,平滑)之表面上,其可促進金屬電鍍並允許需要平滑表面之組件(例如,散熱片)的形成。當表面區域為非經微球填充者,該非經微球填充之部分可具有於自0.2至5mm之範圍內之自表面的平均深度。 In various embodiments, the microsphere-filled metal may have a surface region or a portion of the surface region that is (a) a metal that is not filled with microspheres, or (b) that is coated with a polymer-based material. cover. In such embodiments, the microsphere-filled metal may thus be present on a surface that is free or substantially free of defects (ie, smooth) that promotes metal plating and allows components that require a smooth surface (eg, heat sink) )Formation. When the surface area is non-microsphere filled, the non-microsphere filled portion may have an average depth from the surface in the range of 0.2 to 5 mm.

當以聚合物為主之材料被使用以提供無缺陷之表面,該以聚合物為主之材料可於自50至1,000μm之範圍的厚度被施用。將以聚合物為主之材料用於此等實施例中的實例及方法與如上所述對於發泡金屬者相同。 When a polymer-based material is used to provide a defect-free surface, the polymer-based material can be applied at a thickness ranging from 50 to 1,000 μm. The examples and methods in which the polymer-based materials are used in these embodiments are the same as those for the foamed metal as described above.

無線通訊塔組件Wireless tower assembly

如上所指出的,上述以金屬為主之材料之任何一或多者可被使用以製造,至少部份製造一無線通訊塔組件。如此處所使用的,“無線通訊塔組件”表示任何電信裝置、全球定位系統(“GPS”)、或相似設備,或其等之零件或部分。雖然使用該“塔”一詞,須注意的是該裝置並非實際上需被安裝或設計成安裝於塔上;而是,其它挑高位置諸如無線電住、建築、紀念物,或樹亦可被考慮。該等組件之實例包括但不限於,天線、發射器、接收器、收發器、數位信號處理器、控制電子裝置、GPS接收器、電力源,及用於電子組件機殼之外殼。另外,常出現於該等電子裝置之中的組件,諸如RF濾波器及散熱器,亦被考量。再者,塔頂支撐配件,諸如平台及安裝硬體,亦被包括。 As noted above, any one or more of the above-described metal-based materials can be used to fabricate, at least in part, a wireless communication tower assembly. As used herein, "wireless communication tower assembly" means any telecommunications device, global positioning system ("GPS"), or similar device, or parts or portions thereof. Although the term "tower" is used, it should be noted that the device does not actually need to be installed or designed to be mounted on the tower; rather, other elevated positions such as radio, buildings, monuments, or trees may also be consider. Examples of such components include, but are not limited to, antennas, transmitters, receivers, transceivers, digital signal processors, control electronics, GPS receivers, power sources, and housings for electronic component housings. In addition, components commonly found in such electronic devices, such as RF filters and heat sinks, are also contemplated. Furthermore, tower top support fittings, such as platforms and mounting hardware, are also included.

如上所述,該無線通訊塔組件可為一RF濾波器。一RF濾波器為一遠程射源頭之關鍵元件。RF濾波器被用於消除某些頻率之訊號並通常用作用於雙工器及雙訊器之建構塊(building block)以組合或分離複數種頻寬。RF濾波器亦在最小化於不同頻寬中操作之系統間的干擾扮演重要角色。 As mentioned above, the wireless communication tower assembly can be an RF filter. An RF filter is a key component of a remote source. RF filters are used to eliminate signals at certain frequencies and are commonly used as building blocks for duplexers and diplexers to combine or separate a plurality of bandwidths. RF filters also play an important role in minimizing interference between systems operating in different bandwidths.

RF空腔濾波器為常被使用的RF濾波器。製造此等濾波器之各個設計及物理幾何的常見實務為將鋁模鑄成所欲結構或是自一模鑄預形體製造一最終幾何構型。RF濾波器、其等之特徵、其等之製程、其等之機械加工,及其等之整體生產係敘述於,例如,於美國專利Nos.7,847,658及8,072,298中。 The RF cavity filter is an RF filter that is often used. A common practice in fabricating the various designs and physical geometries of such filters is to cast the aluminum mold into a desired structure or to create a final geometric configuration from a molded preform. The RF filter, its features, its processes, its machining, and the like, are described in, for example, U.S. Patent Nos. 7,847,658 and 8,072,298.

如上所述,以聚合物為主之材料可被使用以於該以金屬為主之材料上提供平滑表面及/或作為用於以金屬為主之材料的填料。例如,環氧樹脂複合物材料可被使用以塗覆該以金屬為主之材料之表面的至少一部分。例示性的環氧樹脂複合物敘述於美國臨時專利申請案編號第61/557,918號(“該’918申請案”)中。另外,該以金屬為主之材料及/或該以聚合物為主之材料的表面可被金屬化,如’918申請案中所述。 As noted above, polymer based materials can be used to provide a smooth surface on the metal based material and/or as a filler for metal based materials. For example, an epoxy composite material can be used to coat at least a portion of the surface of the metal-based material. Illustrative epoxy resin composites are described in U.S. Provisional Patent Application Serial No. 61/557,918 (the &apos; 918 Application). Alternatively, the metal-based material and/or the surface of the polymer-based material can be metallized as described in the '918 application.

於各個實施例中,上述以金屬為主之材料之至少一部分可為經金屬電鍍者,如典型地對於RF空腔濾波器所為者。例如,一金屬層諸如銅、銀或金可藉由各個電鍍技術被沉積於該以金屬為主之材料上,或介入以聚合物為主之材料層。合適之電鍍技術之實例可於例如該’918申請案中找到。 In various embodiments, at least a portion of the metal-based material described above can be metal plated, as is typically the case with RF cavity filters. For example, a metal layer such as copper, silver or gold may be deposited on the metal-based material by various plating techniques, or interposed with a polymer-based material layer. Examples of suitable plating techniques can be found, for example, in the '918 application.

於一實施例中,該無線通訊塔組件可為一散熱器。如習知技藝中所熟知的,散熱器,其可為使用於遠程射頻頭之組件,典型地包含一基底元件及一熱分散元件(貨“散熱片”)。該熱分散元件典型地由一高傳導性材料,諸如銅所形成。於一實施例中,根據本發明製造之散熱器可包含一由上述以金屬為主之材料之任一者所形成之基底元件,而使用一習知熱分散元件。於各個實施例中,使用一發泡金屬時(特別是一開放發泡金屬),該基底元件可具有如上所述之非發泡表面。 In an embodiment, the wireless communication tower assembly can be a heat sink. As is well known in the art, a heat sink, which can be a component for use with a remote radio head, typically includes a base member and a heat dissipating member (a "heat sink"). The heat dispersing element is typically formed from a highly conductive material such as copper. In one embodiment, a heat sink made in accordance with the present invention may comprise a base member formed from any of the above-described metal-based materials, using a conventional heat dissipating component. In various embodiments, when a foamed metal (especially an open foamed metal) is used, the base member can have a non-foamed surface as described above.

於各個實施例中,該無線通訊塔組件可為一包含 及/或保護電子裝置之外殼。該等外殼之實例可為,例如,來自MTI公司之MRH-24605 LTE遠程射頻頭。 In various embodiments, the wireless communication tower component can be an included And/or protecting the outer casing of the electronic device. Examples of such enclosures may be, for example, the MRH-24605 LTE remote radio head from MTI Corporation.

於一或多個實施例中,該無線通訊塔組件可為一支撐元件,諸如固定支架或用以製造平台之組件。特定組件包括但不限於,天線座、支撐支架、協同定位平台、夾持系統、扇區框架組件、冰橋套件、三扇區的T安裝組件、光(light)套件安裝系統,及波導橋。 In one or more embodiments, the wireless communication tower assembly can be a support member such as a mounting bracket or an assembly for manufacturing a platform. Specific components include, but are not limited to, antenna mounts, support brackets, co-location platforms, clamping systems, sector frame assemblies, ice bridge kits, three-sector T-mount components, light kit mounting systems, and waveguide bridges.

自此處所述之該等以金屬為主之材料製造上述無線通訊塔組件可根據任何習知或往後發現之金屬加工技術,諸如成型、摻合、模鑄、機械加工,及其等之組合而進行。 The above-described wireless communication tower assembly can be fabricated from such metal-based materials as described herein, according to any conventional or later discovered metalworking techniques, such as forming, blending, molding, machining, and the like. Combine and proceed.

測試方法testing method

密度density

複合物樣品之密度係根據ASTM D792於25℃下測量。對於僅為金屬之樣品,根據ASTM D1505藉由密度梯度法測量密度。 The density of the composite samples was measured at 25 ° C according to ASTM D792. For samples of only metals, the density is measured by the density gradient method according to ASTM D1505.

熱導性Thermal conductivity

熱導性係根據ISO 22007-2(瞬時平面熱源(熱盤)法)測量。 Thermal conductivity is measured according to ISO 22007-2 (Instantaneous Planar Heat Source (Hot Disc) Method).

熱膨脹係數Thermal expansion coefficient

CTE係使用熱機械分析儀(來自TA儀器之TMA 2940)測量。一膨脹輪廓圖使用5℃/分鐘之加熱速率而產生,而該CTE係計算為該膨脹輪廓曲線之斜率,根據以下:CTE=△L/(△T x L)其中△L為樣品長度(μm)之變化,L為該 樣品之原始長度(m),及△T為溫度(℃)之變化。測量斜率之溫度範圍在第二加熱上為20℃至60℃。 CTE was measured using a thermomechanical analyzer (TMA 2940 from TA Instruments). An expansion profile is generated using a heating rate of 5 ° C / min, and the CTE is calculated as the slope of the expansion profile according to the following: CTE = ΔL / (ΔT x L) where ΔL is the length of the sample (μm Change, L is the The original length (m) of the sample, and ΔT is the change in temperature (°C). The temperature range in which the slope is measured is 20 ° C to 60 ° C on the second heating.

抗拉強度tensile strength

抗拉特性測量為根據ASTM D638,使用一類型1拉伸棒及0.2吋/分鐘之應變率於該經硬化之環氧樹脂調配物上進行。對於鋁金屬樣品,根據ASTM B557M測量抗拉特性。 Tensile properties were measured according to ASTM D638 using a Type 1 stretch bar and a strain rate of 0.2 Torr/min on the cured epoxy resin formulation. For aluminum metal samples, tensile properties were measured according to ASTM B557M.

玻璃轉化溫度(Tg)Glass transition temperature (Tg)

藉由將樣品設置於一差式掃描量熱計(“DSC”),於自0至250℃之第一加熱掃描至自0至250℃之第二加熱掃描,以10℃/分鐘加熱及冷卻測量Tg。Tg被報告為自0至250℃之第二加熱掃描上之2階轉換的半高值。 By heating the first heating scan from 0 to 250 ° C to a second heating scan from 0 to 250 ° C by heating the sample at a temperature of 10 ° C / min by placing the sample on a differential scanning calorimeter ("DSC"). Measure Tg. The Tg is reported as the half-height of the second-order transition on the second heating scan from 0 to 250 °C.

實例Instance 實例1-材料比較Example 1 - Material Comparison

發泡鋁之樣品(S1)被與習知鋁(Comp.A)、三個環氧樹脂複合物組成物(Comp.B-D),及一經玻璃填充之聚醚醯亞胺(Comp.E)於下表1中相比較。該發泡鋁為25.4mm厚樣品,具有0.41g/cm3之密度及主要開放結構,得自Cymat科技有限公司。該習知鋁為鋁合金6061。該等用於該等環氧樹脂複合物組成物(Comp.B-D)之混合、鑄造及固化程序係如下所述通常地進行。該經玻璃填充之聚醚醯亞胺為ULTEMTM 3452,具有45%玻璃纖維填料之聚醚醯亞胺,可自GE塑膠購得。 The foamed aluminum sample (S1) is combined with a conventional aluminum (Comp. A), three epoxy resin composite compositions (Comp. BD), and a glass-filled polyether phthalimide (Comp. E). Compare in Table 1 below. The foamed aluminum was a 25.4 mm thick sample having a density of 0.41 g/cm 3 and a predominantly open structure available from Cymat Technology Co., Ltd. The conventional aluminum is an aluminum alloy 6061. The mixing, casting and curing procedures for these epoxy resin composite compositions (Comp. BD) are generally carried out as follows. The warp filling of the glass is polyetherimide ULTEM TM 3452, polyetherimide having a glass fiber filler of 45%, commercially available from GE Plastics.

比較例B-D製造程序 Comparative Example B-D Manufacturing Procedure

下列說明中所使用之詞語及名稱包括:D.E.N.425為具有172之EEW之環氧樹脂且係購自陶氏化學公司;D.E.R.383為具有171之EEW之環氧樹脂且係購自於陶氏化學公司;“NMA”表示降冰片烯甲基酐(nadic methyl anhydride),且係購自Polysciences;“ECA100”表示環氧樹脂固化劑100,係購自Dixie Chemical,而ECA100通常包含大於80%之甲基四氫鄰苯二甲酸酐及大於10%之四氫鄰苯二甲酸酐;“1MI”表示1-甲基咪唑,且係購自Aldrich Chemical;SILBOND® W12EST為具有16μm D50粒度之經環氧矽烷處理之石英,且係購自Quarzwerke。 The words and names used in the following descriptions include: DEN425 is an epoxy resin having an EEW of 172 and is commercially available from The Dow Chemical Company; DER383 is an epoxy resin having an EEW of 171 and is commercially available from The Dow Chemical Company; "NMA" means nadic methyl anhydride and is available from Polysciences; "ECA100" means epoxy resin curing agent 100, purchased from Dixie Chemical, and ECA 100 typically contains greater than 80% methyl four. Hydrogen phthalic anhydride and greater than 10% tetrahydrophthalic anhydride; "1MI" means 1-methylimidazole and is available from Aldrich Chemical; SILBOND ® W12EST is treated with epoxy decane having a D50 particle size of 16 μm Quartz, and is purchased from Quarzwerke.

填料之必要量被於一真空烘箱中於~70℃之溫度下隔夜乾燥。包含酸酐硬化劑之環氧樹脂被分離預加熱至~60℃。將該經設計之量的溫熱環氧樹脂、溫熱酸酐硬化劑,及於添加至溫熱填料前手工旋攪之1-甲基咪唑裝載至一廣口塑膠容器中。該容器之內容物接著於FlackTek SpeedMixerTM上,以自約800至約2000rpm之~1-2分鐘期間複數循環而混合。 The necessary amount of filler was dried overnight in a vacuum oven at a temperature of ~70 °C. The epoxy resin containing the anhydride hardener was pre-heated to ~60 °C. The designed amount of warm epoxy resin, warm anhydride hardener, and 1-methylimidazole, which was manually stirred by adding to the warm filler, was loaded into a wide-mouth plastic container. Then the contents of the container on a FlackTek SpeedMixer TM, during plural cycles from about 800 to about 2000rpm ~ 1-2 minutes of mixing.

該經混合之調配物被裝配置一溫度控制於~500之100-mL具有使用玻璃攪拌軸之頂部攪拌器的樹脂壺中,其附有Teflon®刀片,連接用於脫氣之真空幫浦及真空控制器。一典型的脫氣輪廓係介於約55℃及約75℃進行,以下列階段所表示:5分鐘,80rpm,100Torr;5分鐘,80rpm,50Torr;5分鐘,80rpm,20Torr,以N2中斷至~760Torr;5分鐘,80rpm,20Torr,以N2中斷至~760Torr;3分鐘, 80rpm,20Torr;5分鐘,120rpm,10Torr;5分鐘,180rpm,10Torr;2分鐘,80rpm,20Torr;及5分鐘,80rpm,30Torr。依據被脫氣之調配物的尺寸,於較高真空之時間及5Torr之較高真空的使用可依所需要而可擇地被增加。 The blended formulation is configured to a temperature-controlled 100-mL to 100-mL resin kettle with a top stirrer using a glass stirrer shaft with a Teflon® blade attached to the vacuum pump for degassing and Vacuum controller. A typical degassing profile is carried out at about 55 ° C and about 75 ° C, expressed as follows: 5 minutes, 80 rpm, 100 Torr; 5 minutes, 80 rpm, 50 Torr; 5 minutes, 80 rpm, 20 Torr, interrupted by N 2 ~ 760Torr; 5 minutes and 80 rpm, 20 Torr, to N 2 interrupt to ~ 760Torr; 3 minutes and 80 rpm, 20 Torr; for 5 minutes at 120 rpm, of 10 Torr; 5 minutes, 180rpm, 10Torr; 2 minutes 80 rpm, 20 Torr; and five minutes, 80 rpm, 30 Torr. Depending on the size of the degassed formulation, the use of a higher vacuum and a higher vacuum of 5 Torr can be optionally increased as needed.

溫熱、脫氣之混合物被帶到大氣壓力並傾倒至下述之該溫熱模裝配件中。對於以下敘述之特定模,一些介於約350克及450克之間的量典型地被傾到至該模的開放側中。該經填充之模被放置垂直站立於80℃之烘箱中約16小時,溫度隨後升高並保持於140℃總共10小時;接著隨後升高並保持於225℃總共4小時;及接著緩慢冷卻至環境溫度(約25℃)。 The warm, degassed mixture is brought to atmospheric pressure and poured into the warm molded fitting described below. For the particular modes described below, some amounts between about 350 grams and 450 grams are typically poured into the open side of the mold. The filled mold was placed vertically in an oven at 80 ° C for about 16 hours, then the temperature was subsequently raised and maintained at 140 ° C for a total of 10 hours; then subsequently raised and maintained at 225 ° C for a total of 4 hours; and then slowly cooled to Ambient temperature (about 25 ° C).

模裝配件 Molded parts

於兩個~355mm、於一邊具有角剪切之方型金屬板上DUOFOILTM(~330mm x 355mm x~0.38mm)各自被固定於其上。一3.05mm厚之U型墊片及具有~3.175mm ID x~4.75mm OD之橡皮管(作為墊圈)被設置於該等板子之間,而該模被保持緊鄰於C型鉗。模在使用前被於約65℃之烘箱中預熱。該相同模方法可伴隨較厚U型墊之使用,適當調整該矽氧橡膠管做為墊圈而適用於以較小金屬板鑄造。 Two ~ 355mm, while having a corner in the square metal plate cut DUOFOIL TM (~ 330mm x 355mm x ~ 0.38mm) are each secured thereon. A 3.05 mm thick U-shaped gasket and a rubber tube having a ~3.175 mm ID x~4.75 mm OD (as a gasket) are placed between the plates while the mold is held in close proximity to the C-clamp. The mold was preheated in an oven at approximately 65 °C prior to use. The same mold method can be used with a thicker U-shaped pad, and the silicone rubber tube is suitably adjusted as a gasket for casting with a smaller metal plate.

如表1中所示,相較於熱固,該發泡鋁提供較低之熱膨脹係數,而相較習知鋁,在大幅降低密度下維持適當熱導性。 As shown in Table 1, the expanded aluminum provides a lower coefficient of thermal expansion than the thermoset, while maintaining proper thermal conductivity at a substantially reduced density compared to conventional aluminum.

實例2-經熱固環氧樹脂填充之發泡鋁Example 2 - Foamed Aluminum Filled with Thermosetting Epoxy Resin

根據下列程序,將於一經填充之環氧樹脂調配物 中鑄造具有2"x2"x0.5"之尺寸的發泡鋁塊並固化。該所使用之環氧樹脂調配物為具有65wt% SILBOND 126EST之DER 332+50/50降冰片烯甲基酐/環氧固化劑100(即,MTHPA)。該發泡鋁泡體為上述實例1中相同者。將該環氧樹脂組成物如上述而混合及脫氣後,將該發泡鋁導入至於該樹脂壺中之該液態環氧樹脂混合物中,並使用一攪拌刀片維持位置防止其漂浮。關閉容器並如下述施加真空32分鐘以自該鋁泡體移除空氣並驅使該液態環氧樹脂進入該等金屬孔洞:10torr 10min.,5torr 5min.,10torr 5min.,20torr 5min.,及30torr 5min。接著將該容器帶回大氣壓力下。將一550-mil厚U形墊片放置於該模中,並傾到約1/2之該脫氣混合物至該模裝配件中(如上所述),該吸脹環氧樹脂之鋁泡體件接著被定位而該剩餘之環氧樹脂被傾到在上部。於80℃進行固化16小時,接著140℃ 10小時,及最終於200℃ 4小時而完成。 The epoxy resin formulation will be filled once according to the following procedure A foamed aluminum block having a size of 2" x 2" x 0.5" was cast and cured. The epoxy resin formulation used was DER 332+50/50 norbornene methyl anhydride with 65 wt% SILBOND 126 EST / Epoxy curing agent 100 (ie, MTHPA). The foamed aluminum foam body is the same as in the above Example 1. After the epoxy resin composition is mixed and degassed as described above, the foamed aluminum is introduced into the resin. The liquid epoxy resin mixture in the kettle is maintained in a position to prevent it from floating by using a stirring blade. The vessel is closed and a vacuum is applied for 32 minutes as described below to remove air from the aluminum foam and drive the liquid epoxy into the liquid. Metal hole: 10torr 10min., 5torr 5min., 10torr 5min., 20torr 5min., and 30torr 5min. The container is then brought back to atmospheric pressure. A 550-mil thick U-shaped gasket is placed in the mold and Approximately 1/2 of the degassed mixture is poured into the mold assembly (as described above), the aluminum foam body of the inflation epoxy is then positioned and the remaining epoxy is poured onto the upper portion. Curing at 80 ° C for 16 hours, followed by 140 ° C for 10 hours, and finally at 200 ° C for 4 hours .

該所得之複合物具有1.65g/cm3之平均密度、於自23.6至29.4μm/m.K之範圍的平均CTE,及5.1W/m.K之線性等向熱導性。 The obtained composite has an average density of 1.65 g/cm 3 and is from 23.6 to 29.4 μm/m. The average CTE of the range of K, and 5.1W/m. The linear isotropic thermal conductivity of K.

Claims (10)

一種裝置,包含:一無線通訊塔組件,其係至少部分由經微球填充之金屬所形成,其中該經微球填充之金屬於25℃下測量,具有少於每立方公分2.7克(“g/cm3”)之密度。 A device comprising: a wireless communication tower assembly formed at least in part by a metal filled with microspheres, wherein the microsphere filled metal is measured at 25 ° C and has less than 2.7 grams per cubic centimeter ("g /cm 3 ") density. 如請求項1之裝置,其中該經微球填充之金屬的金屬係選自於由鋁、鎂,及其等之合金所組成之群組。 The device of claim 1, wherein the metal of the microsphere-filled metal is selected from the group consisting of aluminum, magnesium, and alloys thereof. 如請求項1或2之裝置,其中該經微球填充之金屬於25℃下測量,具有大於每米凱氏溫度1瓦特(“W/m.K”)之熱導性,其中該經微球填充之金屬在-35至120℃之範圍的溫度內,具有少於每米凱氏溫度30微米(“μm/m.K”)之線性等向熱膨脹係數(“CTE”)。 The apparatus of claim 1 or 2, wherein the microsphere-filled metal has a thermal conductivity greater than 1 watt per metre ("W/m.K") as measured at 25 ° C, wherein the micro-transistor The ball-filled metal has a linear isotropic thermal expansion coefficient ("CTE") of less than 30 microns (" μm /m.K") per metre Kelvin temperature in the temperature range of -35 to 120 °C. 如前述請求項之任一項的裝置,其中該經微球填充之金屬於25℃下測量,具有於自0.6至2g/cm3之範圍的密度,其中該經微球填充之金屬於25℃下測量,具有於自5至150W/m.K W/m.K之熱導性,其中該發泡金屬在-35至120℃之範圍的溫度內,具有於自8至25μm/m.K之範圍的線性等向CTE。 A device according to any of the preceding claims, wherein the microsphere-filled metal is measured at 25 ° C and has a density in the range from 0.6 to 2 g/cm 3 , wherein the microsphere-filled metal is at 25 ° C. The measurement is from 5 to 150 W/m. KW/m. The thermal conductivity of K, wherein the foamed metal has a temperature ranging from -35 to 120 ° C, from 8 to 25 μ m / m. The linear isotropic CTE of the range of K. 如前述請求項之任一項的裝置,其中該經微球填充之金屬具有於自0.8至60Kpsi之範圍的抗拉強度。 A device according to any of the preceding claims, wherein the microsphere filled metal has a tensile strength in the range from 0.8 to 60 Kpsi. 如前述請求項之任一項的裝置,其中該微球填充之金屬包含選自於由玻璃微球、富鋁紅柱石(mullite)微球、氧 化鋁微球、鋁-矽酸鹽微球、陶瓷微球、二氧化矽-碳微球、碳微球,及其等之二或多者之混合物所組成之群組的微球。 The device of any of the preceding claims, wherein the microsphere-filled metal comprises a glass microsphere, mullite microspheres, oxygen selected from the group consisting of A group of microspheres composed of a mixture of aluminum microspheres, aluminum-niobate microspheres, ceramic microspheres, cerium oxide-carbon microspheres, carbon microspheres, and a mixture of two or more thereof. 如請求項6之裝置,其中該等微球具有於自8至30μm之範圍的顆粒尺寸分布D10,自10至70μm之範圍內的D50,及自25-120μm之範圍的D90,其中該等微球具有自0.1至0.7g/cm3之範圍的真密度。 The device of claim 6, wherein the microspheres have a particle size distribution D10 ranging from 8 to 30 μm, a D50 ranging from 10 to 70 μm, and a D90 ranging from 25 to 120 μm, wherein the microspheres The ball has a true density ranging from 0.1 to 0.7 g/cm 3 . 如請求項6之裝置,其中該等微球以該經微球填充之金屬之總體積為基準,構成於自1至95體積百分比之範圍。 The device of claim 6, wherein the microspheres are comprised in a range from 1 to 95 volume percent based on the total volume of the microsphere-filled metal. 如前述請求項之任一項的裝置,其中該無線通訊塔組件係選自於由射頻(“RF”)孔腔濾波器、散熱器、外殼、塔頂支撐配件,及其等之二或多者之組合所組成之群組。 The device of any of the preceding claims, wherein the wireless communication tower assembly is selected from the group consisting of a radio frequency ("RF") cavity filter, a heat sink, a housing, a tower support assembly, and the like. A group of combinations of people. 如前述請求項之任一項的裝置,其中該無線通訊塔組件為RF孔腔濾波器,其中該經微球填充之金屬的至少一部分為經銅及/或銀電鍍。 The device of any of the preceding claims, wherein the wireless communication tower assembly is an RF cavity filter, wherein at least a portion of the microsphere filled metal is plated with copper and/or silver.
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