TW201410622A - Method for producing glass plate, and glass plate - Google Patents

Method for producing glass plate, and glass plate Download PDF

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Publication number
TW201410622A
TW201410622A TW102125633A TW102125633A TW201410622A TW 201410622 A TW201410622 A TW 201410622A TW 102125633 A TW102125633 A TW 102125633A TW 102125633 A TW102125633 A TW 102125633A TW 201410622 A TW201410622 A TW 201410622A
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glass
molten
glass plate
less
mass
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TW102125633A
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Chinese (zh)
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Shiro Tanii
Ryuma Ichikawa
Yasuo Hayashi
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Asahi Glass Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B18/00Shaping glass in contact with the surface of a liquid
    • C03B18/02Forming sheets
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • C03C3/093Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Glass Compositions (AREA)

Abstract

The present invention provides a method for producing a glass plate wherein a main surface, which has been in contact with a reducing atmosphere within a bath, has good quality. The present invention relates to a method for producing a glass plate which comprises a step wherein molten glass continuously supplied on molten tin within a float bath is molded by being flowed on the molten tin. This method for producing a glass plate is characterized in that molten glass right before being supplied into the float bath has a total content of Au, Cu and Ag, which are impurities, of 0.5 ppm or less.

Description

玻璃板之製造方法及玻璃板 Glass plate manufacturing method and glass plate

本發明係關於一種玻璃板之製造方法及玻璃板。 The present invention relates to a method of producing a glass sheet and a glass sheet.

作為玻璃板之成形方法,廣泛使用有浮式法。浮式法中,使連續地供給至浮拋窯(以下亦簡稱為「窯」)內之熔融錫上之熔融玻璃於熔融錫上流動而成形為帶板狀(例如參照專利文獻1)。為了防止熔融錫之氧化,將窯內之環境設為含有氫氣之還原環境。氫氣藉由與自外部混入之氧氣進行反應而防止熔融錫之氧化。 As a method of forming a glass sheet, a floating method is widely used. In the floating method, the molten glass which is continuously supplied to the molten tin in the floating kiln (hereinafter also referred to as "kiln") is flowed on the molten tin to form a strip shape (for example, see Patent Document 1). In order to prevent oxidation of the molten tin, the environment in the kiln is set to a reducing environment containing hydrogen. Hydrogen prevents oxidation of molten tin by reacting with oxygen mixed from the outside.

先前技術文獻Prior technical literature 專利文獻Patent literature

專利文獻1:日本專利特開2010-053032公報 Patent Document 1: Japanese Patent Laid-Open Publication No. 2010-053032

於在窯內使熔融玻璃成形時,有還原環境中之粒子凝聚而落至熔融玻璃之上表面並附著而成為缺陷的情況。 When the molten glass is molded in the kiln, the particles in the reducing environment are aggregated and fall on the upper surface of the molten glass to adhere to the defect.

本發明係鑒於上述課題而成者,其目的在於提供一種於窯內與還原環境接觸之主面之品質良好之玻璃板之製造方法及玻璃板。 The present invention has been made in view of the above problems, and an object thereof is to provide a method for producing a glass sheet having a good quality in a main surface in contact with a reducing environment in a kiln, and a glass sheet.

為了解決上述目的,本發明之態樣(1)之玻璃板之製造方法係具有使連續地供給至浮拋窯內之熔融錫上之熔融玻璃於上述熔融錫上流動而成形之步驟者;且其特徵在於: 即將供給至上述浮拋窯內前之上述熔融玻璃中,作為雜質之Au、Cu、及Ag之合計之含量為0.5質量ppm以下。 In order to achieve the above object, a method for producing a glass sheet according to aspect (1) of the present invention includes a step of forming a molten glass continuously supplied to molten tin in a float bath on the molten tin to form a step; It is characterized by: The content of the total amount of Au, Cu, and Ag as impurities in the molten glass to be supplied to the floating kiln is 0.5 mass ppm or less.

又,本發明之態樣(2)之玻璃板之製造方法係具有使連續地供給至浮拋窯內之熔融錫上之熔融玻璃於上述熔融錫上流動而成形之步驟者;且其特徵在於:即將供給至上述浮拋窯內前之上述熔融玻璃中,作為雜質之F、Cl、Br及I之合計之含量為200質量ppm以下。 Further, the method for producing a glass sheet according to aspect (2) of the present invention includes a step of forming a molten glass continuously supplied to molten tin in a float bath on the molten tin to form a step; and The content of the total of F, Cl, Br, and I as impurities is 200 ppm by mass or less in the molten glass immediately before the inside of the floating kiln.

又,本發明之態樣(3)之玻璃板係使連續地供給至浮拋窯內之熔融錫上之熔融玻璃於上述熔融錫上流動而成形者;且其特徵在於:作為雜質之Au、Cu、及Ag之合計之含量為0.5質量ppm以下。 Further, in the glass plate of the aspect (3) of the present invention, the molten glass continuously supplied to the molten tin in the float bath is formed by flowing on the molten tin; and characterized in that Au as an impurity The total content of Cu and Ag is 0.5 ppm by mass or less.

又,本發明之態樣(4)之玻璃板係使連續地供給至浮拋窯內之熔融錫上之熔融玻璃於上述熔融錫上流動而成形者;且其特徵在於:作為雜質之F、Cl、Br及I之合計之含量為200質量ppm以下。 Further, in the glass plate of the aspect (4) of the present invention, the molten glass continuously supplied to the molten tin in the float bath is formed by flowing on the molten tin; and it is characterized in that F as an impurity The total content of Cl, Br, and I is 200 ppm by mass or less.

根據本發明,可提供一種於窯內與還原環境接觸之主面之品質良好之玻璃板之製造方法及玻璃板。 According to the present invention, it is possible to provide a method for producing a glass sheet having good quality in a main surface in contact with a reducing environment in a kiln, and a glass sheet.

10‧‧‧窯 10‧‧‧ Kiln

12‧‧‧窯之入口 12‧‧‧The entrance to the kiln

14‧‧‧窯之出口 14‧‧‧Export of the kiln

20‧‧‧熔融錫 20‧‧‧Fused tin

30‧‧‧熔融玻璃 30‧‧‧Solid glass

40‧‧‧還原環境 40‧‧‧Return environment

50‧‧‧流道出口唇板 50‧‧‧Flower exit lip

60‧‧‧加熱器 60‧‧‧heater

70‧‧‧給氣通路 70‧‧‧ gas supply pathway

80‧‧‧排氣通路 80‧‧‧Exhaust passage

圖1係本發明之一實施形態之玻璃板之製造裝置之說明圖(1)。 Fig. 1 is an explanatory view (1) of a manufacturing apparatus for a glass sheet according to an embodiment of the present invention.

圖2係本發明之一實施形態之玻璃板之製造裝置之說明圖(2)。 Fig. 2 is an explanatory view (2) of a manufacturing apparatus for a glass sheet according to an embodiment of the present invention.

以下,對用以實施本發明之形態參照圖式進行說明。再者,於以下之圖式中,對同一或對應之構成附以同一或對應之符號,並省略說明。 Hereinafter, the form for carrying out the invention will be described with reference to the drawings. In the following drawings, the same or corresponding components are designated by the same or corresponding characters, and the description is omitted.

本實施形態之玻璃板之製造方法例如具有熔解步驟、成形步驟、緩冷步驟、及切割步驟,視需要進而具有研磨步驟。研磨步驟係視玻璃板之用途而進行。 The method for producing a glass sheet according to the present embodiment includes, for example, a melting step, a molding step, a slow cooling step, and a cutting step, and further has a polishing step as needed. The grinding step is carried out depending on the use of the glass plate.

熔解步驟係將混合複數種原料而製備之玻璃原料熔解而獲得熔融玻璃。玻璃原料於投入至熔解爐內後,藉由自噴燃器噴射之火焰之輻射熱而熔解,成為熔融玻璃。 The melting step melts a glass raw material prepared by mixing a plurality of raw materials to obtain molten glass. After the glass raw material is put into the melting furnace, it is melted by the radiant heat of the flame sprayed from the burner to become molten glass.

成形步驟係將熔解步驟中獲得之熔融玻璃連續地供給至窯內之熔融錫上,使熔融玻璃於熔融錫上流動而成形,獲得板狀玻璃(所謂玻璃帶)。該成形方法被稱為浮式法。為了防止熔融錫之氧化,將窯內之環境設為含有氫氣之還原環境。板狀玻璃一面於特定方向流動一面被冷卻,於窯之出口附近自熔融錫被拉起。 In the molding step, the molten glass obtained in the melting step is continuously supplied to the molten tin in the kiln, and the molten glass is flowed on the molten tin to form a sheet glass (so-called glass ribbon). This forming method is called a floating method. In order to prevent oxidation of the molten tin, the environment in the kiln is set to a reducing environment containing hydrogen. The plate glass is cooled while flowing in a specific direction, and is pulled up from the molten tin near the exit of the kiln.

緩冷步驟係將成形步驟中獲得之板狀玻璃於緩冷爐內進行緩冷。板狀玻璃一面自緩冷爐之入口朝向出口於輥上水平地搬送一面進行緩冷。於緩冷爐之入口之內側附近對板狀玻璃之表面吹送亞硫酸(SO2)氣體而於板狀玻璃之表層形成防損傷膜。由於緩冷爐之出口對大氣開放,因此緩冷爐內之環境為大氣環境。 The slow cooling step is to slowly cool the sheet glass obtained in the forming step in a slow cooling furnace. The sheet glass is gently cooled while being horizontally conveyed from the inlet of the slow cooling furnace toward the outlet on the roller. The surface of the plate glass is blown with sulfurous acid (SO 2 ) gas near the inner side of the inlet of the slow cooling furnace to form a damage prevention film on the surface of the plate glass. Since the outlet of the slow cooling furnace is open to the atmosphere, the environment inside the slow cooling furnace is an atmospheric environment.

切割步驟係將緩冷步驟中緩冷之板狀玻璃利用切割機切割成特定尺寸。於切割步驟中,板狀玻璃之寬度方向兩端部(所謂耳部)被切除。其原因在於,板狀玻璃之寬度方向兩端部因表面張力等之影響而變厚。 The cutting step is to cut the slow-cooled sheet glass in the slow cooling step into a specific size by a cutter. In the cutting step, both end portions (so-called ears) in the width direction of the sheet glass are cut. This is because both ends in the width direction of the sheet glass become thick due to the influence of surface tension or the like.

研磨步驟係研磨切割步驟中獲得之玻璃板之主面。於研磨步驟中,視玻璃板之用途而研磨在窯內與熔融錫接觸之主面(以下稱為「底面」)。不研磨與底面為相反側之在窯內與還原環境接觸之主面(以下稱為「頂面」)。 The grinding step is the main surface of the glass sheet obtained in the grinding step. In the polishing step, the main surface (hereinafter referred to as "bottom surface") in contact with the molten tin in the kiln is polished depending on the use of the glass plate. The main surface (hereinafter referred to as "top surface") which is in contact with the reducing environment in the kiln on the opposite side to the bottom surface is not polished.

如此,可獲得作為製品之玻璃板。玻璃板例如可用作車輛用之窗玻璃、建築物用之窗玻璃、顯示器用之基板、顯示器用之覆蓋玻璃、或光罩用之基板。「顯示器」包含液晶顯示器(LCD,Liquid Crystal Display)、電漿顯示器(PDP,Plasma Display Panel)、有機EL(Electroluminescence,電致發光)顯示器等平板顯示器(FPD,Flat Panel Display)。作為顯示器用之基板之厚度,例示有1mm以下。又,平板終端等之軟性液晶面板所使用之玻璃板之厚度較佳為0.3mm以下。 Thus, a glass plate as a product can be obtained. The glass plate can be used, for example, as a window glass for a vehicle, a window glass for a building, a substrate for a display, a cover glass for a display, or a substrate for a photomask. "Display" includes flat panel displays (FPD, Flat) such as liquid crystal display (LCD), plasma display (PDP), organic EL (electroluminescence) display Panel Display). The thickness of the substrate for the display is exemplified by 1 mm or less. Moreover, the thickness of the glass plate used for the flexible liquid crystal panel, such as a tablet terminal, is preferably 0.3 mm or less.

玻璃板之玻璃之種類係視玻璃板之用途而選擇。例如於LCD用之玻璃基板之情形時,使用無鹼玻璃。又,於車輛用之窗玻璃、建築物用之窗玻璃、及PDP用之玻璃基板之情形時,使用鈉鈣玻璃。於顯示器用之覆蓋玻璃之情形時,主要使用可化學強化之鈉鈣玻璃。於光罩用之基板之情形時,主要使用熱膨脹係數較低之石英玻璃。 The type of glass of the glass plate is selected depending on the use of the glass plate. For example, in the case of a glass substrate for LCD, an alkali-free glass is used. Further, in the case of a window glass for a vehicle, a window glass for a building, and a glass substrate for a PDP, soda lime glass is used. For the case of covering glass for displays, chemically strengthened soda lime glass is mainly used. In the case of a substrate for a photomask, quartz glass having a low coefficient of thermal expansion is mainly used.

無鹼玻璃例如可以氧化物基準之質量%表示,含有SiO2:50~66%、Al2O3:10.5~24%、B2O3:0~12%、MgO:0~8%、CaO:0~14.5%、SrO:0~24%、BaO:0~13.5%、ZrO2:0~5%、SnO:0~3%,MgO+CaO+SrO+BaO:9~29.5%,且鹼金屬氧化物之含量之合量為0.1%以下。 The alkali-free glass can be expressed, for example, by mass% of the oxide, and contains SiO 2 : 50 to 66%, Al 2 O 3 : 10.5 to 24%, B 2 O 3 : 0 to 12%, MgO: 0 to 8%, and CaO. : 0~14.5%, SrO: 0~24%, BaO: 0~13.5%, ZrO 2 : 0~5%, SnO: 0~3%, MgO+CaO+SrO+BaO: 9~29.5%, and alkali The combined amount of the metal oxide is 0.1% or less.

無鹼玻璃較佳為以氧化物基準之質量%表示,含有SiO2:58~66%、Al2O3:15~22%、B2O3:5~12%、MgO:0~8%、CaO:0~9%、SrO:3~12.5%、BaO:0~2%、SnO:0~1%,MgO+CaO+SrO+BaO:9~18%,且鹼金屬氧化物之含量之合量為0.1%以下。 The alkali-free glass is preferably expressed by mass% based on oxides, and contains SiO 2 : 58 to 66%, Al 2 O 3 : 15 to 22%, B 2 O 3 : 5 to 12%, and MgO: 0 to 8%. , CaO: 0~9%, SrO: 3~12.5%, BaO: 0~2%, SnO: 0~1%, MgO+CaO+SrO+BaO: 9~18%, and the content of alkali metal oxide The combined amount is 0.1% or less.

鈉鈣玻璃例如以氧化物基準之質量%表示,含有SiO2:65~75%、Al2O3:0~3%、CaO:5~15%、MgO:0~15%、Na2O:10~20%、K2O:0~3%、Li2O:0~5%、Fe2O3:0~3%、TiO2:0~5%、CeO2:0~3%、BaO:0~5%、SrO:0~5%、B2O3:0~5%、ZnO:0~5%、ZrO2:0~5%、SnO2:0~3%、SO3:0~0.5%。 The soda lime glass is represented, for example, by mass % of oxide, and contains SiO 2 : 65 to 75%, Al 2 O 3 : 0 to 3%, CaO: 5 to 15%, MgO: 0 to 15%, and Na 2 O: 10~20%, K 2 O: 0~3%, Li 2 O: 0~5%, Fe 2 O 3 : 0~3%, TiO 2 : 0~5%, CeO 2 : 0~3%, BaO : 0 to 5%, SrO: 0 to 5%, B 2 O 3 : 0 to 5%, ZnO: 0 to 5%, ZrO 2 : 0 to 5%, SnO 2 : 0 to 3%, SO 3 : 0 ~0.5%.

繼而,基於圖1及圖2對上述玻璃板之成形步驟之詳情進行說明。 Next, details of the forming steps of the above glass sheet will be described based on FIGS. 1 and 2.

圖1及圖2係本發明之一實施形態之玻璃板之製造裝置之說明圖。圖1係窯之俯視剖面圖,圖2係窯之側視剖面圖。 Fig. 1 and Fig. 2 are explanatory views of a manufacturing apparatus of a glass sheet according to an embodiment of the present invention. Figure 1 is a top cross-sectional view of the kiln, and Figure 2 is a side cross-sectional view of the kiln.

於成形步驟中,使熔融玻璃30一面於窯10內之熔融錫20上流動一面冷卻而成形為帶板狀。為了防止熔融錫20之氧化,以包含氫氣之還原環境40充滿窯10內之上部空間。為了防止外部氣體之侵入,將窯10內之上部空間保持為高於大氣壓之正壓。窯10中設有流道出口唇板(Spout Lip)50、加熱器60、給氣通路70、及排氣通路80等。 In the molding step, the molten glass 30 is cooled while flowing on the molten tin 20 in the kiln 10 to be formed into a strip shape. In order to prevent oxidation of the molten tin 20, the upper space in the kiln 10 is filled with a reducing environment 40 containing hydrogen. In order to prevent intrusion of external air, the upper space in the kiln 10 is maintained at a positive pressure higher than atmospheric pressure. The kiln 10 is provided with a flow outlet lip (Spout Lip) 50, a heater 60, an air supply passage 70, an exhaust passage 80, and the like.

流道出口唇板50係將熔融玻璃30供給至窯10內之供給通路,設置於窯10之入口12。流道出口唇板50連接於製作熔融玻璃30之熔解爐。 The flow path exit lip 50 supplies the molten glass 30 to the supply passage in the kiln 10, and is provided at the inlet 12 of the kiln 10. The flow path exit lip 50 is connected to a melting furnace for making the molten glass 30.

加熱器60係加熱窯10內者,例如如圖2所示,自窯10之頂部垂下。加熱器60例如於熔融玻璃30之流動方向(X方向)及寬度方向(Y方向)隔開間隔而設置有複數個,且配置為矩陣狀。X方向及Y方向係相互正交之水平方向。 The heater 60 is heated in the kiln 10, for example, as shown in Fig. 2, hanging from the top of the kiln 10. The heater 60 is provided in plural, for example, in a flow direction (X direction) and a width direction (Y direction) of the molten glass 30, and is arranged in a matrix. The X direction and the Y direction are horizontal directions orthogonal to each other.

以自窯10之入口12朝向出口14,熔融玻璃30之溫度逐漸變低之方式控制加熱器60之輸出。又,以熔融玻璃30之厚度於寬度方向(Y方向)變均勻之方式控制加熱器60之輸出。 The output of the heater 60 is controlled in such a manner that the temperature of the molten glass 30 gradually becomes lower from the inlet 12 of the kiln 10 toward the outlet 14. Further, the output of the heater 60 is controlled such that the thickness of the molten glass 30 becomes uniform in the width direction (Y direction).

給氣通路70係對窯10內供給還原性氣體之通路,例如如圖2所示,設置於窯10之頂部。給氣通路70於特定方向(X方向)隔開間隔而設置有複數個。 The gas supply passage 70 is a passage for supplying a reducing gas into the kiln 10, and is provided at the top of the kiln 10, for example, as shown in Fig. 2 . The plurality of supply passages 70 are provided at intervals in a specific direction (X direction).

還原性氣體可為氫氣與氮氣之混合氣體。還原性氣體中氫氣所占之比率例如為0.1~15體積%。 The reducing gas may be a mixed gas of hydrogen and nitrogen. The ratio of hydrogen in the reducing gas is, for example, 0.1 to 15% by volume.

排氣通路80係對還原環境40進行排氣之通路,例如如圖2所示,設置於窯10之側壁。排氣通路80於特定方向(X方向)隔開間隔而設置有複數個。 The exhaust passage 80 is a passage for exhausting the reducing environment 40, and is provided on the side wall of the kiln 10, for example, as shown in Fig. 2 . The exhaust passages 80 are provided in plural in a specific direction (X direction).

如圖2所示,熔融玻璃30成形為帶板狀而成之板狀玻璃(所謂玻璃帶)於窯10之出口14附近自熔融錫20被拉起。其後,板狀玻璃經由緩冷步驟、切割步驟等而成為製品之玻璃板。 As shown in Fig. 2, the molten glass 30 is formed into a plate-like plate glass (so-called glass ribbon) which is pulled up from the molten tin 20 in the vicinity of the outlet 14 of the kiln 10. Thereafter, the plate glass becomes a glass plate of the product via a slow cooling step, a cutting step, or the like.

然而,窯10內之還原環境40除自給氣通路70供給之還原性氣體以外,亦含有自熔融錫20或熔融玻璃30揮散之成分。自熔融錫20或熔融玻璃30揮散至還原環境40之成分(包含單質、化合物)中,蒸氣壓較低之成分原本就不易揮散且為少量,故而不成問題。另一方面,蒸氣壓較高之成分會作為氣體而排出至窯10外,故而通常不成問題。然而,蒸氣壓較低之成分若成為特定之化合物(例如鹵化物),則蒸氣壓變高而可能揮散,但有暫時揮散後,因還原環境40中之氫氣而立刻還原,其結果,於環境中恢復成原先之蒸氣壓較低之成分的情況。若如此,則由於蒸氣壓較低之成分不易作為氣體存在,故而有於還原環境40中成為凝聚物,落至熔融玻璃30上而成為缺陷之情況。關於作為單質之蒸氣壓較低,且容易成為鹵化物之元素,例如可列舉Au、Cu、Ag等第11族元素。第11族元素具有與鹼金屬元素相同之價電子之構成,容易成為1價離子,容易成為鹵化物,因此容易作為鹵化物自熔融錫20或熔融玻璃30揮散至還原環境40。又,Au、Cu、Ag若成為1價離子,則容易於熔融錫20中或熔融玻璃30中擴散,容易轉移至該等與還原環境40之界面,故而容易擴散至還原環境40中。若還原環境40中之鹵化金、鹵化銅、鹵化銀因氫氣而被還原,則產生原先之蒸氣壓較低之Au、Cu、Ag。並且,Au、Cu、Ag作為單質而言,不易作為氣體而存在,故而於還原環境40中成為凝聚物。該凝聚物亦可包含Au、Cu、及Ag中之至少一種元素,且進而包含Au、Cu、及Ag以外之元素。 However, the reducing environment 40 in the kiln 10 contains components derived from the molten tin 20 or the molten glass 30 in addition to the reducing gas supplied from the gas supply passage 70. Among the components (including elemental substances and compounds) which are volatilized from the molten tin 20 or the molten glass 30 to the reducing environment 40, the component having a low vapor pressure is not easily volatilized and is small, so that it is not a problem. On the other hand, since the component having a high vapor pressure is discharged as a gas to the outside of the kiln 10, it is usually not a problem. However, if a component having a low vapor pressure is a specific compound (for example, a halide), the vapor pressure becomes high and may be volatilized, but after being temporarily volatilized, it is immediately reduced by hydrogen in the reducing environment 40, and as a result, it is in the environment. The case is restored to the original component with a lower vapor pressure. In this case, since the component having a low vapor pressure is less likely to be present as a gas, it may become agglomerated in the reducing environment 40 and may fall on the molten glass 30 to become a defect. The element which is low in vapor pressure as a simple substance and which is likely to be a halide is, for example, a group 11 element such as Au, Cu or Ag. The Group 11 element has a structure of the same valence electrons as the alkali metal element, is likely to be a monovalent ion, and is likely to be a halide. Therefore, it is easily volatilized from the molten tin 20 or the molten glass 30 to the reducing atmosphere 40 as a halide. Further, when Au, Cu, and Ag are monovalent ions, they are easily diffused in the molten tin 20 or the molten glass 30, and are easily transferred to the interface with the reducing environment 40, so that they are easily diffused into the reducing atmosphere 40. When the gold halide, the copper halide, and the silver halide in the reducing atmosphere 40 are reduced by hydrogen, Au, Cu, and Ag having a low vapor pressure are generated. Further, since Au, Cu, and Ag are not easily present as a gas as a simple substance, they become aggregates in the reducing environment 40. The aggregate may further contain at least one of Au, Cu, and Ag, and further contains elements other than Au, Cu, and Ag.

於本實施形態中,即將供給至窯10內前之熔融玻璃30中,作為雜質之Au、Cu、及Ag(以下統稱為「Au等」)之合計之含量為0.5質量ppm以下。若Au等之合計之含量為0.5質量ppm以下,則熔融玻璃30中,自熔融玻璃30揮散至還原環境40中而成為凝聚物之成分較少。因此,凝聚物不易於還原環境40中成長,凝聚物變得不易落至熔融玻璃 30之上表面。因此,玻璃板之頂面之品質變良好。更佳之範圍為0.3質量ppm以下,進而較佳之範圍為0.1質量ppm以下。 In the present embodiment, the total amount of Au, Cu, and Ag (hereinafter collectively referred to as "Au or the like") as impurities is 0.5 ppm by mass or less in the molten glass 30 before being supplied to the kiln 10. When the total content of Au or the like is 0.5 ppm by mass or less, the molten glass 30 is volatilized from the molten glass 30 into the reducing atmosphere 40, and the components which become aggregates are less. Therefore, the aggregates are not easily grown in the reducing environment 40, and the aggregates become less likely to fall into the molten glass. 30 above the surface. Therefore, the quality of the top surface of the glass sheet becomes good. More preferably, the range is 0.3 ppm by mass or less, and further preferably 0.1 ppm by mass or less.

即將供給至窯10內前之熔融玻璃30中之Au等之合計之含量略少於投入至熔解爐之玻璃原料中之Au等之合計之含量。其原因在於,Au等於熔解步驟中緩緩地自玻璃揮散至外部。 The total amount of Au or the like in the molten glass 30 immediately before being supplied into the kiln 10 is slightly smaller than the total amount of Au or the like which is supplied to the glass raw material of the melting furnace. The reason is that Au is equal to the volatilization from the glass to the outside in the melting step.

因此,為了使即將供給至窯10內前之熔融玻璃30中之Au等之合計之含量成為0.5質量ppm以下,玻璃原料中之Au等之合計之含量較佳為1.0質量ppm以下。更佳之範圍為0.5質量ppm以下,進而較佳之範圍為0.3質量ppm以下。 Therefore, the total content of Au or the like in the glass raw material is preferably 1.0 ppm by mass or less in order to make the total amount of Au or the like in the molten glass 30 immediately before the kiln 10 to be 0.5 ppm by mass or less. More preferably, the range is 0.5 ppm by mass or less, and further preferably 0.3 ppm by mass or less.

又,於本實施形態中,即將供給至窯10內前之熔融玻璃30中,作為雜質之F、Cl、Br及I(以下統稱為「F等」)之合計之含量為200質量ppm以下。F等作為單質而言,沸點比玻璃之成形溫度低,會促進Au等之揮散。 In the present embodiment, the total amount of F, Cl, Br, and I (hereinafter collectively referred to as "F or the like") as impurities is 200 ppm by mass or less in the molten glass 30 before being supplied to the kiln 10. As a simple substance, F or the like has a boiling point lower than the forming temperature of the glass, and promotes the volatilization of Au or the like.

若即將供給至窯10內前之熔融玻璃30中之F等之合計之含量為200質量ppm以下,則熔融玻璃30中之Au等不易揮散至還原環境40中,故而凝聚物不易於還原環境40中成長,凝聚物變得不易落下。因此,玻璃板之頂面之品質變良好。更佳之範圍為100質量ppm以下,進而較佳之範圍為50質量ppm以下。 When the total content of F or the like in the molten glass 30 before being supplied to the kiln 10 is 200 ppm by mass or less, Au or the like in the molten glass 30 is less likely to be volatilized into the reducing environment 40, so that the aggregate is not easily reduced to the environment 40. Growing up, the agglomerates become less likely to fall. Therefore, the quality of the top surface of the glass sheet becomes good. More preferably, the range is 100 ppm by mass or less, and further preferably 50 ppm by mass or less.

即將供給至窯10內前之熔融玻璃30中之F等之合計之含量略少於投入至熔解爐之玻璃原料中之F等之合計之含量。其原因在於,F等於熔解步驟中緩緩地自玻璃擴散至外部。 The total amount of F or the like in the molten glass 30 immediately before being supplied into the kiln 10 is slightly smaller than the total content of F or the like which is supplied to the glass raw material of the melting furnace. The reason for this is that F is equal to diffusing from the glass to the outside in the melting step.

因此,為了使即將供給至窯10內前之熔融玻璃30中之F等之合計之含量成為200質量ppm以下,玻璃原料中之F等之合計之含量較佳為500質量ppm以下。更佳之範圍為300質量ppm以下,進而較佳之範圍為200質量ppm以下。 Therefore, the total content of F or the like in the glass raw material is preferably 500 ppm by mass or less in order to make the total content of F or the like in the molten glass 30 immediately before being supplied into the kiln 10 to be 200 ppm by mass or less. A more preferable range is 300 ppm by mass or less, and a further preferred range is 200 ppm by mass or less.

為了頂面之高品質化,窯10內之熔融錫20中作為雜質之Au等之 合計之含量可為10質量ppm以下,F等之合計之含量可為100質量ppm以下。作為窯10內之熔融錫20之原料,例如使用錫。 In order to improve the quality of the top surface, Au or the like as an impurity in the molten tin 20 in the kiln 10 The total content may be 10 ppm by mass or less, and the total content of F or the like may be 100 ppm by mass or less. As a raw material of the molten tin 20 in the kiln 10, for example, tin is used.

繼而,對上述製造方法中獲得之玻璃板進行說明。 Next, the glass plate obtained in the above production method will be described.

玻璃板中Au等之合計之含量為0.5質量ppm以下。Au等雖於成形步驟及緩冷步驟中自玻璃揮散至外部,但揮散量與整體量相比為微量。玻璃板之玻璃組成與成形步驟中之熔融玻璃30之玻璃組成大致相同。若玻璃板中之Au等之合計之含量為0.5質量ppm以下,則成形步驟中之熔融玻璃30中之Au等之合計之含量較少,於熔融玻璃30中,自熔融玻璃30揮散至還原環境40中而成為凝聚物之核之成分較少。因此,凝聚物不易成長,凝聚物變得不易落至熔融玻璃30之上表面。因此,玻璃板之頂面之品質變良好。 The total content of Au or the like in the glass plate is 0.5 mass ppm or less. Although Au or the like is volatilized from the glass to the outside in the forming step and the slow cooling step, the amount of volatilization is a trace amount as compared with the entire amount. The glass composition of the glass plate is substantially the same as the glass composition of the molten glass 30 in the forming step. When the total content of Au or the like in the glass plate is 0.5 ppm by mass or less, the total content of Au or the like in the molten glass 30 in the molding step is small, and the molten glass 30 is volatilized from the molten glass 30 to the reducing environment. In 40, there are fewer components that become the core of the condensate. Therefore, the aggregate does not easily grow, and the aggregate becomes less likely to fall on the upper surface of the molten glass 30. Therefore, the quality of the top surface of the glass sheet becomes good.

又,玻璃板中F等之合計之含量為200質量ppm以下。F等雖於成形步驟及緩冷步驟中自玻璃揮散至外部,但揮散量與整體量相比為微量。玻璃板之玻璃組成與成形步驟中之熔融玻璃30之玻璃組成大致相同。若玻璃板中之F等之含量為200質量ppm以下,則成形步驟中之熔融玻璃30中之F等之含量較少,熔融玻璃30中之Au等不易揮散至還原環境40,故而凝聚物不易於還原環境40中成長,凝聚物變得不易落下。因此,玻璃板之頂面之品質變良好。 Moreover, the total content of F or the like in the glass plate is 200 ppm by mass or less. Although F or the like is volatilized from the glass to the outside in the forming step and the slow cooling step, the amount of volatilization is a trace amount as compared with the entire amount. The glass composition of the glass plate is substantially the same as the glass composition of the molten glass 30 in the forming step. When the content of F or the like in the glass plate is 200 ppm by mass or less, the content of F or the like in the molten glass 30 in the molding step is small, and Au or the like in the molten glass 30 is not easily volatilized to the reducing atmosphere 40, so that the agglomerates are not easily formed. Growing in the reducing environment 40, the agglomerates become less likely to fall. Therefore, the quality of the top surface of the glass sheet becomes good.

以上,對本發明之一實施形態進行了說明,但本發明並不限於上述實施形態。可不脫離本發明之範圍而對上述實施形態施加各種變形及置換。 Although an embodiment of the present invention has been described above, the present invention is not limited to the above embodiment. Various modifications and substitutions may be made to the above embodiments without departing from the scope of the invention.

例如,上述實施形態之熔融玻璃30於即將供給至窯10內前,(1)Au等之合計之含量為0.5質量ppm以下,且(2)F等之合計之含量為200質量ppm以下,但亦可僅滿足(1)或(2)。其原因在於,頂面之附著物係於Au等雜質與F等雜質兩者過多之情況下產生。關於窯10內之熔融錫20之雜質亦相同。 For example, before the molten glass 30 of the above-described embodiment is supplied to the kiln 10, the total content of (1) Au or the like is 0.5 ppm by mass or less, and the total content of (2) F or the like is 200 ppm by mass or less. It can also only satisfy (1) or (2). The reason for this is that the deposit on the top surface is generated when there are too many impurities such as Au and impurities such as F. The impurities of the molten tin 20 in the kiln 10 are also the same.

又,上述實施形態之玻璃板中,(1)Au等之合計之含量為0.5質量ppm以下,且(2)F等之合計之含量為200質量ppm以下,但亦可僅滿足(1)或(2)。 Further, in the glass plate of the above-described embodiment, the total content of (1) Au or the like is 0.5 ppm by mass or less, and the total content of (2) F or the like is 200 ppm by mass or less, but may satisfy only (1) or (2).

實施例Example

以下,藉由實施例等而具體地說明本發明,但本發明並不由該等例限定。 Hereinafter, the present invention will be specifically described by way of examples, but the present invention is not limited by the examples.

[例1] [example 1]

於例1中,以圖1及圖2所示之方法製造包含無鹼玻璃之玻璃板。使用錫作為窯內之熔融錫之原料。無鹼玻璃以氧化物基準之質量%表示,含有SiO2:59.5%、Al2O3:17%、B2O3:8%、MgO:3.3%、CaO:4%、SrO:7.6%、BaO:0.1%、ZrO2:0.1%,MgO+CaO+SrO+BaO:15%,剩餘部分為不可避免之雜質,且鹼金屬氧化物之含量之合量為0.1%以下。 In Example 1, a glass plate containing an alkali-free glass was produced by the method shown in Figs. 1 and 2. Tin is used as a raw material for molten tin in the kiln. The alkali-free glass is represented by mass % of oxide, and contains SiO 2 : 59.5%, Al 2 O 3 : 17%, B 2 O 3 : 8%, MgO: 3.3%, CaO: 4%, and SrO: 7.6%. BaO: 0.1%, ZrO 2 : 0.1%, MgO + CaO + SrO + BaO: 15%, the remainder is an unavoidable impurity, and the total amount of the alkali metal oxide is 0.1% or less.

玻璃原料、即將供給至窯內前之熔融玻璃、及玻璃板中所分別含有之各元素(包含Au等、F等)之含量(質量%)係藉由濕式分析而測定。於濕式分析中,將玻璃原料等之樣品溶解於酸中而進行分析。再者,即將供給至窯內前之熔融玻璃之樣品係利用充分冷卻之鐵製之長柄勺舀出窯之入口附近之熔融玻璃後急冷而製作。 The content (% by mass) of each element (including Au, F, etc.) contained in the glass raw material, the molten glass immediately before being supplied to the kiln, and the glass plate is measured by wet analysis. In the wet analysis, a sample such as a glass raw material was dissolved in an acid to be analyzed. Further, a sample of the molten glass to be supplied to the kiln was produced by rapidly cooling the molten glass near the inlet of the kiln by a well-cooled iron ladle.

玻璃板之頂面之附著物之平均密度(個/m2)係以目視觀察40片頂面為1.0m×1.0m之玻璃板而測定。 The average density (number/m 2 ) of the adhering matter on the top surface of the glass plate was measured by visually observing 40 glass plates having a top surface of 1.0 m × 1.0 m.

將Au等之合計之含量、F等之合計之含量、及附著物之平均密度之測定結果示於表1。 The measurement results of the total content of Au and the like, the total content of F, and the average density of the attached matter are shown in Table 1.

[例2~例6] [Example 2 to Example 6]

於例2~例6中,於玻璃原料中添加等莫耳量微量之CuO、Ag2S,除此以外,以與例1相同之方式製造玻璃板。例1~例4為實施例,例5~例6為比較例。 A glass plate was produced in the same manner as in Example 1 except that a molar amount of CuO or Ag 2 S was added to the glass raw material in Examples 2 to 6. Examples 1 to 4 are examples, and examples 5 to 6 are comparative examples.

Au等之合計之含量、F等之合計之含量、及附著物之平均密度係以與例1相同之方式測定。將測定結果示於表1。 The total content of Au or the like, the total content of F and the like, and the average density of the attached matter were measured in the same manner as in Example 1. The measurement results are shown in Table 1.

根據表1可知,於即將供給至窯內前之熔融玻璃或玻璃板中,若Au等之合計之含量為0.5質量ppm以下,則可明顯減少附著物之缺陷。 As can be seen from Table 1, when the total content of Au or the like is 0.5 mass ppm or less in the molten glass or the glass plate immediately before being supplied to the kiln, the defects of the deposits can be remarkably reduced.

[例7] [Example 7]

於例7中,改變玻璃原料,除此以外,以與例1相同之方式製造包含無鹼玻璃之玻璃板。無鹼玻璃以氧化物基準之質量%表示,含有SiO2:59.5%、Al2O3:17%、B2O3:8%、MgO:3.3%、CaO:4%、SrO:7.6%、BaO:0.1%、ZrO2:0.1%,MgO+CaO+SrO+BaO:15%,剩餘部分為不可避免之雜質,鹼金屬氧化物之含量之合量為0.1%以下。 A glass plate containing an alkali-free glass was produced in the same manner as in Example 1 except that the glass raw material was changed in Example 7. The alkali-free glass is represented by mass % of oxide, and contains SiO 2 : 59.5%, Al 2 O 3 : 17%, B 2 O 3 : 8%, MgO: 3.3%, CaO: 4%, and SrO: 7.6%. BaO: 0.1%, ZrO 2 : 0.1%, MgO + CaO + SrO + BaO: 15%, the remainder is an unavoidable impurity, and the total amount of the alkali metal oxide is 0.1% or less.

以與例1相同之方式測定Au等之合計之含量、F等之合計之含量、及附著物之平均密度。將測定結果示於表2。 The total content of Au or the like, the total content of F and the like, and the average density of the adherends were measured in the same manner as in Example 1. The measurement results are shown in Table 2.

[例8~例12] [Example 8 to Example 12]

於例8~例12中,於玻璃原料中添加微量之CaF2,除此以外,以與例7相同之方式製造玻璃板。例7~例10為實施例、例11~例12為比較例。 A glass plate was produced in the same manner as in Example 7 except that a small amount of CaF 2 was added to the glass raw material in Examples 8 to 12. Examples 7 to 10 are examples, and examples 11 to 12 are comparative examples.

以與例1相同之方式測定Au等之合計之含量、F等之合計之含量、及附著物之平均密度。將測定結果示於表2。 The total content of Au or the like, the total content of F and the like, and the average density of the adherends were measured in the same manner as in Example 1. The measurement results are shown in Table 2.

根據表2可知,於即將供給至窯內前之熔融玻璃或玻璃板中,若F等之合計之含量為200質量ppm以下,則可明顯減少附著物之缺陷。 As can be seen from Table 2, when the total content of F or the like is 200 ppm by mass or less in the molten glass or the glass plate immediately before being supplied to the kiln, the defects of the deposits can be remarkably reduced.

根據表1及表2可知,於即將供給至窯內前之熔融玻璃或玻璃板中,若Au等之合計之含量為0.5質量ppm以下,且F等之合計之含量為200質量ppm以下,則附著物之缺陷充分變少。 According to Tables 1 and 2, when the total content of Au or the like is 0.5 ppm by mass or less, and the total content of F or the like is 200 ppm by mass or less, in the molten glass or the glass plate immediately before being supplied to the kiln, The defects of the attached matter are sufficiently reduced.

本申請案係基於2012年7月17日提出申請之日本專利申請2012-159048者,其內容係作為參照而併入於此。 The present application is based on Japanese Patent Application No. 2012-159048, filed on Jan.

10‧‧‧窯 10‧‧‧ Kiln

12‧‧‧窯之入口 12‧‧‧The entrance to the kiln

14‧‧‧窯之出口 14‧‧‧Export of the kiln

20‧‧‧熔融錫 20‧‧‧Fused tin

30‧‧‧熔融玻璃 30‧‧‧Solid glass

50‧‧‧流道出口唇板 50‧‧‧Flower exit lip

Claims (11)

一種玻璃板之製造方法,其係具有使連續地供給至浮拋窯內之熔融錫上之熔融玻璃於上述熔融錫上流動而成形之步驟者;且其特徵在於:即將供給至上述浮拋窯內前之上述熔融玻璃中,作為雜質之Au、Cu、及Ag之合計之含量為0.5質量ppm以下。 A method for producing a glass sheet, which comprises a step of forming a molten glass continuously supplied to molten tin in a float bath to be formed by flowing on the molten tin; and is characterized in that it is supplied to the float bath In the molten glass in the front, the total content of Au, Cu, and Ag as impurities is 0.5 ppm by mass or less. 如請求項1之玻璃板之製造方法,其中即將供給至上述浮拋窯內前之上述熔融玻璃中,作為雜質之F、Cl、Br及I之合計之含量為200質量ppm以下。 The method for producing a glass sheet according to claim 1, wherein the content of the F, Cl, Br, and I as impurities is 200 ppm by mass or less in the molten glass immediately before the inside of the floating kiln. 一種玻璃板之製造方法,其係具有使連續地供給至浮拋窯內之熔融錫上之熔融玻璃於上述熔融錫上流動而成形之步驟者;且其特徵在於:即將供給至上述浮拋窯內前之上述熔融玻璃中,作為雜質之F、Cl、Br及I之合計之含量為200質量ppm以下。 A method for producing a glass sheet, which comprises a step of forming a molten glass continuously supplied to molten tin in a float bath to be formed by flowing on the molten tin; and is characterized in that it is supplied to the float bath In the molten glass in the front, the total content of F, Cl, Br, and I as impurities is 200 ppm by mass or less. 一種玻璃板,其係使連續地供給至浮拋窯內之熔融錫上之熔融玻璃於上述熔融錫上流動而成形者;且其特徵在於:作為雜質之Au、Cu、及Ag合計之含量為0.5質量ppm以下。 A glass plate in which molten glass continuously supplied to molten tin in a float bath is formed by flowing on the molten tin; and characterized in that the total content of Au, Cu, and Ag as impurities is 0.5 mass ppm or less. 如請求項4之玻璃板,其中作為雜質之F、Cl、Br及I之合計之含量為200質量ppm以下。 The glass plate of claim 4, wherein the total content of F, Cl, Br, and I as impurities is 200 ppm by mass or less. 一種玻璃板,其係使連續地供給至浮拋窯內之熔融錫上之熔融玻璃於上述熔融錫上流動而成形者;且其特徵在於:作為雜質之F、Cl、Br及I之合計之含量為200質量ppm以下。 A glass plate which is formed by continuously flowing molten glass which is supplied onto molten tin in a float bath to the molten tin; and is characterized by a total of F, Cl, Br and I as impurities The content is 200 ppm by mass or less. 如請求項4至6中任一項之玻璃板,其中上述玻璃板係以氧化物基準之質量%表示,含有SiO2:65~75%、Al2O3:0~3%、CaO:5~15%、MgO:0~15%、Na2O:10~20%、K2O:0~ 3%、Li2O:0~5%、Fe2O3:0~3%、TiO2:0~5%、CeO2:0~3%、BaO:0~5%、SrO:0~5%、B2O3:0~5%、ZnO:0~5%、ZrO2:0~5%、SnO2:0~3%、SO3:0~0.5%之鈉鈣玻璃。 The glass plate according to any one of claims 4 to 6, wherein the glass plate is represented by mass % of oxide, containing SiO 2 : 65 to 75%, Al 2 O 3 : 0 to 3%, CaO: 5 ~15%, MgO: 0~15%, Na 2 O: 10~20%, K 2 O: 0~ 3%, Li 2 O: 0~5%, Fe 2 O 3 : 0~3%, TiO 2 :0~5%, CeO 2 :0~3%, BaO:0~5%, SrO:0~5%, B 2 O 3 :0~5%, ZnO:0~5%, ZrO 2 :0~ 5%, SnO 2 : 0 to 3%, SO 3 : 0 to 0.5% soda lime glass. 如請求項4至6中任一項之玻璃板,其中上述玻璃板為顯示器用玻璃基板。 The glass plate according to any one of claims 4 to 6, wherein the glass plate is a glass substrate for a display. 如請求項8之玻璃板,其中上述玻璃板之厚度為1mm以下。 The glass plate of claim 8, wherein the glass plate has a thickness of 1 mm or less. 如請求項4至6中任一項之玻璃板,其中上述玻璃板係以氧化物基準之質量%表示,含有SiO2:50~66%、Al2O3:10.5~24%、B2O3:0~12%、MgO:0~8%、CaO:0~14.5%、SrO:0~24%、BaO:0~13.5%、ZrO2:0~5%、SnO:0~3%,MgO+CaO+SrO+BaO:9~29.5%,且鹼金屬氧化物之含量之合量為0.1%以下的無鹼玻璃。 The glass plate according to any one of claims 4 to 6, wherein the glass plate is represented by mass % of oxide, containing SiO 2 : 50 to 66%, Al 2 O 3 : 10.5 to 24%, B 2 O 3 : 0~12%, MgO: 0~8%, CaO: 0~14.5%, SrO: 0~24%, BaO: 0~13.5%, ZrO 2 : 0~5%, SnO: 0~3%, MgO+CaO+SrO+BaO: 9 to 29.5%, and the total amount of the alkali metal oxide is 0.1% or less of alkali-free glass. 如請求項4至6中任一項之玻璃板,其中上述玻璃板係以氧化物基準之質量%表示,含有SiO2:58~66%、Al2O3:15~22%、B2O3:5~12%、MgO:0~8%、CaO:0~9%、SrO:3~12.5%、BaO:0~2%、SnO:0~1%,MgO+CaO+SrO+BaO:9~18%,且鹼金屬氧化物之含量之合量為0.1%以下的無鹼玻璃。 The glass plate according to any one of claims 4 to 6, wherein the glass plate is represented by mass % of oxide, containing SiO 2 : 58 to 66%, Al 2 O 3 : 15 to 22%, B 2 O 3 : 5~12%, MgO: 0~8%, CaO: 0~9%, SrO: 3~12.5%, BaO: 0~2%, SnO: 0~1%, MgO+CaO+SrO+BaO: An alkali-free glass having a total amount of the alkali metal oxide of 9 to 18% and an amount of 0.1% or less.
TW102125633A 2012-07-17 2013-07-17 Method for producing glass plate, and glass plate TW201410622A (en)

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