TW201410484A - Controlling adhesives between substrates and carriers - Google Patents
Controlling adhesives between substrates and carriers Download PDFInfo
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- TW201410484A TW201410484A TW102121340A TW102121340A TW201410484A TW 201410484 A TW201410484 A TW 201410484A TW 102121340 A TW102121340 A TW 102121340A TW 102121340 A TW102121340 A TW 102121340A TW 201410484 A TW201410484 A TW 201410484A
- Authority
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- Taiwan
- Prior art keywords
- ink supply
- ink
- substrate
- recess
- adhesive
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 98
- 239000000853 adhesive Substances 0.000 title claims abstract description 78
- 230000001070 adhesive effect Effects 0.000 title claims abstract description 78
- 239000000969 carrier Substances 0.000 title abstract 2
- 238000000034 method Methods 0.000 claims description 28
- 238000005530 etching Methods 0.000 claims description 13
- 238000003698 laser cutting Methods 0.000 claims description 11
- 238000010304 firing Methods 0.000 claims description 5
- 239000000976 ink Substances 0.000 description 190
- 239000000463 material Substances 0.000 description 17
- 238000010586 diagram Methods 0.000 description 11
- 238000007639 printing Methods 0.000 description 8
- 239000011159 matrix material Substances 0.000 description 7
- 230000007246 mechanism Effects 0.000 description 7
- 238000001312 dry etching Methods 0.000 description 6
- 239000010408 film Substances 0.000 description 6
- 238000001039 wet etching Methods 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- 229910018503 SF6 Inorganic materials 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 description 3
- 229960000909 sulfur hexafluoride Drugs 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 2
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium dioxide Chemical compound O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 2
- 230000012447 hatching Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 230000000717 retained effect Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- ZVJOQYFQSQJDDX-UHFFFAOYSA-N 1,1,2,3,3,4,4,4-octafluorobut-1-ene Chemical compound FC(F)=C(F)C(F)(F)C(F)(F)F ZVJOQYFQSQJDDX-UHFFFAOYSA-N 0.000 description 1
- QIZOJXQFQBSPKU-UHFFFAOYSA-N 2,2,3,3-tetraethyloxane Chemical compound C(C)C1(C(OCCC1)(CC)CC)CC QIZOJXQFQBSPKU-UHFFFAOYSA-N 0.000 description 1
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 229910005540 GaP Inorganic materials 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 102000045595 Phosphoprotein Phosphatases Human genes 0.000 description 1
- 108700019535 Phosphoprotein Phosphatases Proteins 0.000 description 1
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- UQZIWOQVLUASCR-UHFFFAOYSA-N alumane;titanium Chemical compound [AlH3].[Ti] UQZIWOQVLUASCR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- WPPDFTBPZNZZRP-UHFFFAOYSA-N aluminum copper Chemical compound [Al].[Cu] WPPDFTBPZNZZRP-UHFFFAOYSA-N 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- HZXMRANICFIONG-UHFFFAOYSA-N gallium phosphide Chemical compound [Ga]#P HZXMRANICFIONG-UHFFFAOYSA-N 0.000 description 1
- 229940119177 germanium dioxide Drugs 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/1433—Structure of nozzle plates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/12—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by using adhesives
- B32B37/1284—Application of adhesive
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/14—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
- B32B37/16—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with all layers existing as coherent layers before laminating
- B32B37/18—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with all layers existing as coherent layers before laminating involving the assembly of discrete sheets or panels only
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
- B32B38/0004—Cutting, tearing or severing, e.g. bursting; Cutter details
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
- B32B38/0008—Electrical discharge treatment, e.g. corona, plasma treatment; wave energy or particle radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14016—Structure of bubble jet print heads
- B41J2/14024—Assembling head parts
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1603—Production of bubble jet print heads of the front shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1623—Manufacturing processes bonding and adhesion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/17—Ink jet characterised by ink handling
- B41J2/175—Ink supply systems ; Circuit parts therefor
- B41J2/17503—Ink cartridges
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/17—Ink jet characterised by ink handling
- B41J2/175—Ink supply systems ; Circuit parts therefor
- B41J2/17503—Ink cartridges
- B41J2/17526—Electrical contacts to the cartridge
- B41J2/1753—Details of contacts on the cartridge, e.g. protection of contacts
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
- Y10T156/1052—Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
- Y10T156/1062—Prior to assembly
- Y10T156/1064—Partial cutting [e.g., grooving or incising]
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Thermal Sciences (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Abstract
Description
本發明係有關於一種用以控制基體與載體間之黏著劑的技術。 The present invention relates to a technique for controlling an adhesive between a substrate and a carrier.
在噴墨列印領域中,墨水液滴係由位於一列印頭中之一噴嘴陣列釋出到一諸如紙張的列印媒體上。墨水結合到該列印媒體之一表面,並形成圖案、文字,或是其他影像。該墨水液滴係準確地釋出,以確保精確地形成影像。一般而言,該媒體在液滴選擇性釋出之同時係在列印頭下方輸送。媒體之輸送速度係列入液滴釋出時機的參數中。 In the field of ink jet printing, ink droplets are discharged from a nozzle array located in a row of printheads onto a print medium such as paper. The ink is bonded to one of the surface of the printing medium and forms a pattern, text, or other image. The ink droplets are accurately released to ensure accurate image formation. In general, the media is delivered beneath the printhead while the droplets are selectively released. The media transport speed series is included in the parameters of the droplet release timing.
列印頭典型包括一些墨水腔室,亦稱之為擊發腔室。各個墨水腔室係與其中一個位於陣列中之噴嘴流體連接,並且提供藉由該個別列印頭噴嘴所配發的墨水。在液滴釋出之前,位於墨水腔室中之墨水係由於作用在位於噴嘴通道中的墨水上之毛細力且或背壓而保持不會漏出噴嘴。 The print head typically includes a number of ink chambers, also referred to as firing chambers. Each of the ink chambers is fluidly coupled to one of the nozzles in the array and provides ink dispensed by the individual printhead nozzles. Prior to the release of the droplets, the ink located in the ink chamber remains from leaking out of the nozzle due to the capillary forces acting on the ink located in the nozzle passage and or back pressure.
在液滴釋出期間,位於墨水腔室中之墨水係藉由主動地增加該腔室中之壓力而使其離開噴嘴。某些列印頭 使用一個佈置在該腔式中之阻抗式加熱器,用以蒸發該液態墨水其中小量的至少一種成分。在許多案例中,該液態墨水之一主要成份為水,且該阻抗式加熱器使水蒸發。經過蒸發之成分或是多種成分會膨脹,以便在墨水腔室中形成一氣態驅動氣泡。此膨脹超過保持力,足以將一單獨液滴排出噴嘴外。其他墨水腔室使用壓電材料薄膜噴出墨水液滴。當一電壓施加到壓電材料時,該壓電材料便會膨脹,其會增加墨水腔室之內部壓力,並且克服保持力,以排出液滴。 During release of the droplets, the ink located in the ink chamber exits the nozzle by actively increasing the pressure in the chamber. Some print heads An impedance heater disposed in the chamber is used to evaporate a small amount of at least one component of the liquid ink. In many cases, one of the liquid inks is primarily composed of water and the resistive heater evaporates water. The evaporated component or components are expanded to form a gaseous driving bubble in the ink chamber. This expansion exceeds the holding force enough to expel a single drop out of the nozzle. Other ink chambers use a thin film of piezoelectric material to eject ink droplets. When a voltage is applied to the piezoelectric material, the piezoelectric material expands, which increases the internal pressure of the ink chamber and overcomes the holding force to discharge the droplets.
一墨水貯存器能夠供應墨水到墨水腔室。該墨水貯存器能夠以至少一個連接墨水腔室以及墨水貯存器之墨水供料槽與該腔室流體連接。通常而言,該墨水供料槽係形成於一個結合到該墨水貯存器之本體的矽基體中。 An ink reservoir is capable of supplying ink to the ink chamber. The ink reservoir can be fluidly coupled to the chamber with at least one ink supply slot that connects the ink chamber to the ink reservoir. Generally, the ink supply tank is formed in a crucible base bonded to the body of the ink reservoir.
依據本發明之一實施例,係特地提出一種用以控制基體與載體間之黏著劑的方法,該方法包含:使一凹處形成於一列印頭之一基體的背側表面之一黏合區域中,該黏合區域係鄰近一個從該背側表面形成到一前側表面而貫穿該基體的厚度之墨水供料通道所形成,該背側表面係鄰接一墨水貯存器,且該前側表面係鄰接一墨水擊發腔室;將一黏著劑佈置在該黏合區域以及一基體載體之間;一起移動該基體以及該基體載體,以至於使該黏著劑流入該凹處中。 According to an embodiment of the present invention, a method for controlling an adhesive between a substrate and a carrier is specifically proposed, the method comprising: forming a recess in an adhesive region of a back side surface of a substrate of one of the print heads The adhesive region is formed adjacent to an ink supply passage formed from the back side surface to a front side surface and extending through the thickness of the base body, the back side surface being adjacent to an ink reservoir, and the front side surface is adjacent to an ink The firing chamber; an adhesive is disposed between the bonding region and a substrate carrier; the substrate and the substrate carrier are moved together such that the adhesive flows into the recess.
100‧‧‧列印系統 100‧‧‧Printing system
101‧‧‧控制器 101‧‧‧ Controller
102‧‧‧列印媒體 102‧‧‧Printing media
103‧‧‧列印媒體輸送機構 103‧‧‧Printing media transport agency
104‧‧‧帶有具溝槽基體之列印頭 104‧‧‧Print head with grooved base
105‧‧‧墨水貯存器 105‧‧‧Ink reservoir
200‧‧‧匣件 200‧‧‧ pieces
201‧‧‧列印頭 201‧‧‧Print head
202‧‧‧墨水貯存器 202‧‧‧Ink reservoir
203‧‧‧電子接點 203‧‧‧Electronic contacts
204‧‧‧剖面線 204‧‧‧ hatching
205‧‧‧噴嘴 205‧‧‧ nozzle
206‧‧‧噴嘴層 206‧‧‧Nozzle layer
300‧‧‧列印頭 300‧‧‧Print head
301‧‧‧墨水腔室 301‧‧‧Ink chamber
302‧‧‧噴嘴層 302‧‧‧Nozzle layer
303‧‧‧基體 303‧‧‧ base
304‧‧‧噴嘴 304‧‧‧ nozzle
305‧‧‧液滴釋放機構 305‧‧‧Drop release mechanism
306‧‧‧墨水貯存器 306‧‧‧Ink reservoir
307‧‧‧墨水供料槽 307‧‧‧Ink feed trough
308‧‧‧背側表面 308‧‧‧ Back side surface
309‧‧‧前側表面 309‧‧‧ front side surface
310‧‧‧基體載體 310‧‧‧Base carrier
311‧‧‧墨水貯存器本體 311‧‧‧Ink reservoir body
312‧‧‧黏合區域 312‧‧‧bonding area
313‧‧‧凹處 313‧‧‧ recess
314‧‧‧黏著劑 314‧‧‧Adhesive
315‧‧‧間隙高度 315‧‧ ‧ gap height
316‧‧‧凹處深度 316‧‧‧ recess depth
317‧‧‧凹處寬度 317‧‧‧ recess width
318‧‧‧外部接頭 318‧‧‧External joints
319‧‧‧外部接頭 319‧‧‧External joints
320‧‧‧內部接頭 320‧‧‧Internal joints
321‧‧‧內部接頭 321‧‧‧Internal joints
322‧‧‧黏著劑凸起物 322‧‧‧Adhesive protrusions
323‧‧‧壁件 323‧‧‧ wall pieces
325‧‧‧墨水供料槽 325‧‧‧Ink feed trough
326‧‧‧墨水供料槽 326‧‧‧Ink feed trough
400‧‧‧背側表面 400‧‧‧ Back side surface
401‧‧‧基體 401‧‧‧ base
402‧‧‧第一黏合區域 402‧‧‧First bonding area
403‧‧‧第一墨水供料槽 403‧‧‧First ink supply tank
404‧‧‧第二墨水供料槽 404‧‧‧Second ink supply tank
405‧‧‧第二黏合區域 405‧‧‧Second bonding area
407‧‧‧第三墨水供料槽 407‧‧‧third ink supply tank
408‧‧‧多重溝槽 408‧‧‧Multiple trenches
411‧‧‧多重溝槽 411‧‧‧Multiple trenches
412‧‧‧多重溝槽 412‧‧‧Multiple trenches
413‧‧‧多重溝槽 413‧‧‧Multiple trenches
414‧‧‧第一長度 414‧‧‧First length
415‧‧‧第二長度 415‧‧‧second length
500‧‧‧列印頭 500‧‧‧Print head
501‧‧‧內部接點 501‧‧‧Internal contacts
502‧‧‧內部接點 502‧‧‧Internal contacts
503‧‧‧溝槽 503‧‧‧ trench
504‧‧‧溝槽 504‧‧‧ trench
505‧‧‧黏合區域 505‧‧‧bonding area
506‧‧‧黏合區域 506‧‧‧bonding area
507‧‧‧溝槽壁部 507‧‧‧ Groove wall
508‧‧‧黏著劑 508‧‧‧Adhesive
509‧‧‧基體 509‧‧‧ base
510‧‧‧基體載體 510‧‧‧Base carrier
511‧‧‧表面 511‧‧‧ surface
600‧‧‧背側表面 600‧‧‧ Back side surface
601‧‧‧基體 601‧‧‧ base
602‧‧‧溝槽 602‧‧‧ trench
603‧‧‧溝槽 603‧‧‧ trench
604‧‧‧墨水供料槽 604‧‧‧Ink feed trough
605‧‧‧寬度 605‧‧‧Width
606‧‧‧黏合區域 606‧‧‧bonding area
607‧‧‧黏合區域 607‧‧‧bonding area
608‧‧‧墨水供料槽 608‧‧‧Ink feed trough
609‧‧‧墨水供料槽 609‧‧‧Ink feed trough
700‧‧‧列印頭 700‧‧‧Print head
701‧‧‧黏合區域 701‧‧‧bonding area
702‧‧‧黏合區域 702‧‧‧ Bonding area
703‧‧‧內側接頭 703‧‧‧Inside joint
704‧‧‧內側接頭 704‧‧‧Inside joint
705‧‧‧凹處 705‧‧‧ recess
706‧‧‧墨水供料槽 706‧‧‧Ink feed trough
707‧‧‧內壁 707‧‧‧ inner wall
708‧‧‧黏著劑 708‧‧‧Adhesive
709‧‧‧基體 709‧‧‧ base
710‧‧‧基體載體 710‧‧‧Base carrier
800‧‧‧背側表面 800‧‧‧ Back side surface
801‧‧‧基體 801‧‧‧ base
802‧‧‧凹處 802‧‧‧ recess
803‧‧‧黏合區域 803‧‧‧bonding area
804‧‧‧黏合區域 804‧‧‧bonding area
805‧‧‧墨水供料槽 805‧‧‧Ink feed trough
900‧‧‧列印頭 900‧‧‧Print head
901‧‧‧外側接頭 901‧‧‧Outer joint
902‧‧‧基體 902‧‧‧ base
903‧‧‧基體載體 903‧‧‧Base carrier
904‧‧‧黏合區域 904‧‧‧ Bonding area
905‧‧‧溝槽 905‧‧‧ trench
906‧‧‧保持唇片 906‧‧‧ Keep lip
908‧‧‧墨水供料槽 908‧‧‧Ink feed trough
1000‧‧‧第一階段 1000‧‧‧ first stage
1001‧‧‧抗蝕刻層 1001‧‧‧Anti-etching layer
1002‧‧‧背側表面 1002‧‧‧ Back side surface
1003‧‧‧基體 1003‧‧‧ base
1004‧‧‧第二階段 1004‧‧‧ second stage
1005‧‧‧暴露區域 1005‧‧‧Exposed areas
1006‧‧‧第三階段 1006‧‧‧ third stage
1007‧‧‧凹溝 1007‧‧‧ groove
1008‧‧‧前側表面 1008‧‧‧ front side surface
1009‧‧‧基體薄膜 1009‧‧‧ base film
1010‧‧‧第四階段 1010‧‧‧ fourth stage
1011‧‧‧墨水供料槽 1011‧‧‧Ink feed trough
1012‧‧‧凹處 1012‧‧‧ recess
1100‧‧‧示範性方法 1100‧‧‧ exemplary method
1101、1102、1103‧‧‧步驟 Steps 1101, 1102, 1103‧‧
1200‧‧‧標繪圖 1200‧‧‧Plotting
1201‧‧‧y軸 1201‧‧‧y axis
1202‧‧‧x軸 1202‧‧‧x axis
1203‧‧‧標繪線 1203‧‧‧plotting line
1204‧‧‧標繪線 1204‧‧‧plotting line
1205‧‧‧標繪線 1205‧‧‧plotting line
1206‧‧‧標繪線 1206‧‧‧plotting line
1207‧‧‧標示圖例 1207‧‧‧ Signature legend
所附圖式顯示本文中所揭露之原理的不同範例。並且成為本說明書之一部分。所顯示之範例僅作為範例用途,且並非作為申請專利範圍之限制。 The drawings show different examples of the principles disclosed herein. And become part of this manual. The examples shown are for illustrative purposes only and are not intended to be limiting of the scope of the application.
圖1係為根據本文中所描述之原理的一示範列印系統之圖式。 1 is a diagram of an exemplary printing system in accordance with the principles described herein.
圖2係為根據本文中所描述之原理的一示範墨水匣之圖式。 2 is a diagram of an exemplary ink cartridge in accordance with the principles described herein.
圖3係為根據本文中所描述之原理的一示範列印頭的橫剖面圖。 3 is a cross-sectional view of an exemplary printhead in accordance with the principles described herein.
圖4係為根據本文中所描述之原理的一基體之一示範性背側表面的圖式。 4 is a diagram of an exemplary backside surface of one of the substrates in accordance with the principles described herein.
圖5係為根據本文中所描述之原理的一示範列印頭的一橫剖面圖。 Figure 5 is a cross-sectional view of an exemplary printhead in accordance with the principles described herein.
圖6係為根據本文中所描述之原理的一基體之一示範性背側表面的圖式。 6 is a diagram of an exemplary backside surface of one of the substrates in accordance with the principles described herein.
圖7係為根據本文中所描述之原理的一示範列印頭的一橫剖面圖。 Figure 7 is a cross-sectional view of an exemplary printhead in accordance with the principles described herein.
圖8係為根據本文中所描述之原理的一基體之一示範性背側表面的圖式。 Figure 8 is a diagram of an exemplary backside surface of one of the substrates in accordance with the principles described herein.
圖9係為根據本文中所描述之原理的一列印頭的示範性剖面之一橫剖面圖。 9 is a cross-sectional view of an exemplary cross section of a row of printheads in accordance with the principles described herein.
圖10係為根據本文中所描述之原理的一示範性製造階段的圖式。 10 is a diagram of an exemplary stage of fabrication in accordance with the principles described herein.
圖11係為根據本文中所描述之原理的一種用以 控制基體與載體間之黏著劑的示範性方法的圖式。 Figure 11 is a diagram for use in accordance with the principles described herein. A diagram of an exemplary method of controlling an adhesive between a substrate and a carrier.
圖12係為根據本文中所描述之原理的一示範性標繪圖,其顯示間隙高度對於距離墨水供料槽的凹處之關係。 Figure 12 is an exemplary plot showing the relationship of the gap height to the recess from the ink supply slot in accordance with the principles described herein.
墨水供料槽之寬度可能為微米規格等級。因此,微小的阻礙物便可能對於墨水從墨水貯存器流動到墨水腔室造成不利影響。此外,阻礙物可能將空氣或其他氣體困在該墨水腔室中。如果一種將基體黏合到墨水貯存器本體之黏著劑凸出夠遠而塞入該墨水供料槽之寬度,則該黏著劑便可能阻礙列印頭之墨水流動以及空氣管控。 The width of the ink feed slot may be on the micrometer scale. Therefore, tiny obstructions may adversely affect the flow of ink from the ink reservoir to the ink chamber. In addition, the obstruction may trap air or other gases in the ink chamber. If an adhesive that bonds the substrate to the body of the ink reservoir protrudes far enough to fit into the width of the ink supply slot, the adhesive may impede ink flow and air management of the printhead.
一種用以控制位於一基體以及諸如該墨水貯存器之一本體的一基體載體間之黏著劑的方法能夠包括在一列印頭之該基體的一背側表面的一黏合區域中形成一凹處。該黏合區域能夠鄰接一諸如槽之墨水供料通道所形成,並且能夠從該背側表面穿透該基體之厚度而形成到一前側表面。此外,該方法亦能夠包括在該黏合區域與一基體載體之間配置一黏著劑,並使該基體與基體載體一起移動,以便使黏著劑流入該凹處。 A method for controlling an adhesive between a substrate and a substrate carrier such as a body of the ink reservoir can include forming a recess in an adhesive region of a backside surface of the substrate of a row of printheads. The adhesive region can be formed adjacent to an ink supply passage such as a groove, and can be formed from the back side surface through the thickness of the base to a front side surface. In addition, the method can also include disposing an adhesive between the bonding region and a substrate carrier and moving the substrate together with the substrate carrier to allow the adhesive to flow into the recess.
在以下說明中,為求解說之故,因而提出許多不同的特定詳細說明,以便對於本系統與方法提供透徹的理解。然而,對於熟諳此技藝之人士而言,其能夠實行本發明之設備、系統以及方法,而無需使用這些特定詳細說明。 本發明說明書中所稱”一範例”或類似字眼係表示所描述之一特殊的特性、構造或是特徵係包括在至少一個範例中,但並非一定在其他範例中。 In the following description, for the sake of solution, a number of different specific details are set forth to provide a thorough understanding of the present system and method. However, it will be apparent to those skilled in the art that the device, system, and method of the present invention can be practiced without the specific details. The word "an example" or similar words in the specification of the present invention means that one of the specific features, configurations, or characteristics described is included in at least one example, but not necessarily in other examples.
圖1係為一種根據文中所述之原理的示範性列印系統100。在此範例中,該列印系統100可為一種家用、商用或工業用印表機。該列印系統之一控制器101能夠接收來自於近端或遠端來源的列印指令,將一影像列印於一列印媒體102上。該列印媒體能夠包括任何類型之適當片狀或卷狀材料,諸如紙張、卡片、投影片、美拉、聚酯、木夾板、發泡板、纖維、帆布、其他媒體或是其組合物。控制器101能夠控制一輸送機構103,其在一列印頭104下方移動印刷媒體。該控制器101能夠使列印頭以形成在該印刷頭中之一噴嘴陣列將墨水液滴釋放到該列印媒體上。該控制器101能夠透過壓電材料薄膜或是熱阻器依照指令使得該墨水腔室的內部壓力增加到足以排出墨水液滴的方式控制液滴釋放。 1 is an exemplary printing system 100 in accordance with the principles described herein. In this example, the printing system 100 can be a domestic, commercial, or industrial printer. A controller 101 of the printing system is capable of receiving a print command from a near or far source to print an image onto a print medium 102. The print medium can include any type of suitable sheet or roll material such as paper, card, transparencies, mela, polyester, wood splint, foam board, fiber, canvas, other media, or combinations thereof. The controller 101 is capable of controlling a transport mechanism 103 that moves the print media beneath a stack of print heads 104. The controller 101 is capable of causing a print head to release ink droplets onto the print medium from a nozzle array formed in the print head. The controller 101 is capable of controlling droplet release by means of a piezoelectric material film or a thermal resistor in accordance with instructions to increase the internal pressure of the ink chamber to a level sufficient to discharge ink droplets.
一墨水貯存器105能夠與該列印頭104之墨水腔室流體連接。該墨水貯存器105能夠透過至少一個形成在該墨水貯存器105以及墨水腔室間的墨水供料通道,將墨水供應到該墨水腔室。在某些範例中,該墨水供料通道可為一槽、其他通道、多個槽或其他通道,或者是其組合。在圖1之範例中,一個基材隔開該墨水腔室與墨水貯存器105,且該基材在其背側表面之一黏合區域上係設置溝槽。 An ink reservoir 105 is fluidly connectable to the ink chamber of the printhead 104. The ink reservoir 105 is capable of supplying ink to the ink chamber through at least one ink supply passage formed between the ink reservoir 105 and the ink chamber. In some examples, the ink feed channel can be a slot, other channels, multiple slots or other channels, or a combination thereof. In the example of FIG. 1, a substrate separates the ink chamber from the ink reservoir 105, and the substrate is provided with a groove on one of the adhesive surfaces of the back side surface thereof.
圖2係為根據文中所描述之原理的一示範性匣件 200之一圖式。在此範例中,該匣件200係為一種可抽換型整合式墨水匣,其結合一列印頭201。一墨水貯存器202能夠佔據該匣件的絕大部分體積,且能夠專門用以供應墨水到該列印頭201。電子接點203能夠與該墨水腔室電氣連接,並能夠接受來自於該列印頭控制器的指令。反應一指令發射一墨水腔室中之墨水,列印頭201之液滴釋放機構能夠使該墨水腔室中之內部壓力增加到足以釋放出墨水液滴。 2 is an exemplary component in accordance with the principles described herein. One of the patterns of 200. In this example, the element 200 is a removable, integrated ink cartridge that incorporates a row of printheads 201. An ink reservoir 202 can occupy a substantial portion of the volume of the cartridge and can be dedicated to supply ink to the printhead 201. Electronic contacts 203 are electrically connectable to the ink chamber and are capable of accepting commands from the printhead controller. The reaction-instruction emits ink in an ink chamber, and the droplet discharge mechanism of the print head 201 is capable of increasing the internal pressure in the ink chamber sufficiently to release the ink droplets.
在圖2之範例中,剖面線204指出圖3係為列印頭201之一橫剖面視圖。該列印頭201具有一些噴嘴205形成在一噴嘴層206中。 In the example of FIG. 2, hatching 204 indicates that FIG. 3 is a cross-sectional view of one of printheads 201. The print head 201 has a plurality of nozzles 205 formed in a nozzle layer 206.
圖3係為圖2中所示之該範例由剖面線204所觀視的一示範性列印頭300的一橫剖面圖式。在此範例中,墨水腔室301係形成在一噴嘴層302以及一基體303之間。一些噴嘴304係形成在該噴嘴層302中。一液滴釋放機構305能夠佈置在各個噴嘴304下方,以便依照指令產生液滴釋放。在某些範例中,該液滴釋放機構305係為一阻抗式加熱器、一壓電材料薄膜、其他的墨水液滴釋放機構,或是其組合。該墨水釋放機構能夠藉著自身膨脹或是形成一氣泡膨脹的方式增加該墨水腔室301中的內部壓力。此等膨脹能夠經由噴嘴從墨水腔室排出一液滴。 3 is a cross-sectional view of an exemplary printhead 300 as viewed from section line 204 of the example shown in FIG. 2. In this example, the ink chamber 301 is formed between a nozzle layer 302 and a substrate 303. Some nozzles 304 are formed in the nozzle layer 302. A drop release mechanism 305 can be disposed beneath each of the nozzles 304 to produce a drop release in accordance with the instructions. In some examples, the drop release mechanism 305 is an impedance heater, a film of piezoelectric material, other ink droplet release mechanisms, or a combination thereof. The ink release mechanism can increase the internal pressure in the ink chamber 301 by expanding itself or forming a bubble expansion. These expansions are capable of discharging a droplet from the ink chamber via the nozzle.
來自於一墨水貯存器306之墨水能夠流過形成在該基體303之中的墨水供料槽307,以便補充由於液滴釋放所損失的墨水體積。儘管圖3之範例包括三個墨水供料槽 307、325、326,在基體303中能夠形成任何數量的墨水供料槽。該等墨水供料槽307、325、326能夠從該基體303之一背側表面308延伸穿過該基體303的整個厚度而到達該基體303的一前側表面309。在某些範例中,該墨水腔室301能夠以至少一個墨水供料孔或是其他形成在該基體中的通道連接到該墨水貯存器306。 The ink from an ink reservoir 306 can flow through the ink supply tank 307 formed in the substrate 303 to replenish the volume of ink lost due to droplet discharge. Although the example of Figure 3 includes three ink feed slots 307, 325, 326, any number of ink supply slots can be formed in the substrate 303. The ink supply slots 307, 325, 326 can extend from the back side surface 308 of the base 303 through the entire thickness of the base 303 to a front side surface 309 of the base 303. In some examples, the ink chamber 301 can be coupled to the ink reservoir 306 with at least one ink supply aperture or other channel formed in the substrate.
基體303之背側表面308能夠在形成於該背側表面308中的黏合區域312處黏合到該墨水貯存器本體311的基體載體。至少一個凹處313能夠形成在該黏合區域312中,以便在該基體303以及基體載體310一起移動時容納黏著劑314之流動。在圖3之範例中,凹處313係為一溝槽,其鄰近一墨水供料槽326,並且沿著該墨水供料槽326之長度形成。 The back side surface 308 of the base 303 can be bonded to the base carrier of the ink reservoir body 311 at the adhesive region 312 formed in the back side surface 308. At least one recess 313 can be formed in the adhesive region 312 to accommodate the flow of the adhesive 314 as the substrate 303 and the substrate carrier 310 move together. In the example of FIG. 3, the recess 313 is a groove adjacent to an ink supply slot 326 and formed along the length of the ink supply slot 326.
凹處313能夠在基體載體310與基體303一起移動時防止黏著劑塞入墨水供料槽326。黏著劑314能夠將該基體載體310與基體303黏合在一起,同時能夠避免從一墨水供料槽洩漏到其他供料槽。基體303能夠由矽所形成。在某些範例中,該基體係為一種晶體基體,諸如經摻雜晶體基體、未經摻雜晶體基體、單晶矽基體、多晶矽基體,或是其組合。其他適當的基體範例包括:鎵、砷化鎵、磷化鎵、磷化裀、玻璃、二氧化矽、陶瓷、半導體材料、其他材料或是其組合。基體之厚度能夠在100到2000微米之間。在某些範例中。該基體之厚度約為675微米。 The recess 313 prevents the adhesive from being inserted into the ink supply slot 326 as the base carrier 310 moves with the base 303. Adhesive 314 is capable of bonding the substrate carrier 310 to the substrate 303 while avoiding leakage from an ink supply tank to other supply tanks. The base 303 can be formed of tantalum. In some examples, the base system is a crystalline matrix, such as a doped crystal matrix, an undoped crystal matrix, a single crystal germanium matrix, a polycrystalline germanium matrix, or a combination thereof. Other suitable examples of substrates include: gallium, gallium arsenide, gallium phosphide, phosphatase, glass, germanium dioxide, ceramics, semiconductor materials, other materials, or combinations thereof. The thickness of the substrate can be between 100 and 2000 microns. In some examples. The substrate has a thickness of about 675 microns.
基體303與基體載體310間之間隙高度315可為10 微米到250微米之間。在某些實施例中,該間隙高度係在125與175微米之間。在某些實施例中,該凹處所具有之凹處深度316大致上等於該間隙高度315。在某些實施例中,該凹處深度316係在10微米到250微米之間。在某些實施例中,該凹處深度316係在80與160微米之間。 The gap height 315 between the base 303 and the base carrier 310 can be 10 Micron to 250 microns. In certain embodiments, the gap height is between 125 and 175 microns. In some embodiments, the recess has a recess depth 316 that is substantially equal to the gap height 315. In certain embodiments, the recess depth 316 is between 10 microns and 250 microns. In some embodiments, the recess depth 316 is between 80 and 160 microns.
在某些實施例中,該凹處313係與墨水供料槽326隔開一段距離。在某些實施例中,該距離係少於250微米、少於150微米、少於75微米、少於40微米、少於15微米、其他距離或是其組合。在某些實施例中,該凹處所具有之凹處寬度317係少於250微米、少於150微米、少於75微米、少於40微米、少於15微米、其他距離或是其組合。 In some embodiments, the recess 313 is spaced a distance from the ink supply slot 326. In certain embodiments, the distance is less than 250 microns, less than 150 microns, less than 75 microns, less than 40 microns, less than 15 microns, other distances, or a combination thereof. In certain embodiments, the recess has a recess width 317 of less than 250 microns, less than 150 microns, less than 75 microns, less than 40 microns, less than 15 microns, other distances, or a combination thereof.
在圖3之範例中,該外部接頭318、319具有無凹處黏合區域,而內部接頭320、321則具有溝槽黏合區域。在圖3中,外部接頭318、319之黏著劑係顯示成凸起超過該墨水供料槽之壁件323,並且進入墨水供料槽307之空間。另一方面,內部接頭320、321之黏著則保持在該墨水供料槽之空間的外部。在顯示之範例中,該黏著劑凸起物322可能干擾墨水從該墨水貯存器306到墨水腔室301之流動且/或該凸起物322可能將空氣或是其他碎屑困在該墨水供料槽307中。 In the example of FIG. 3, the outer joints 318, 319 have no recessed areas of adhesion, while the inner joints 320, 321 have grooved areas of adhesion. In FIG. 3, the adhesive of the outer joints 318, 319 is shown to protrude beyond the wall member 323 of the ink supply tank and into the space of the ink supply tank 307. On the other hand, the adhesion of the inner joints 320, 321 is maintained outside the space of the ink supply tank. In the example shown, the adhesive protrusions 322 may interfere with the flow of ink from the ink reservoir 306 to the ink chamber 301 and/or the protrusions 322 may trap air or other debris in the ink. In the trough 307.
墨水供料槽307、325、326能夠隨著該等墨水供料槽307、325、326之璧部從前側表面309接近到背側表面308而具有一逐漸增加的橫剖面面積。當液滴釋放時,空氣或氣泡可能經由列印頭中之洩漏或是其他原因而進入墨水 腔室。墨水腔室中之氣泡會干擾墨水釋放,而墨水供料槽之逐漸變大的直徑能夠提供一路徑,使得氣泡能夠輕易地移動離開該墨水腔室301。然而,碎屑或是黏著劑凸起物則可能將氣泡困在墨水供料槽307、325、326中。結果,位於黏合區域312中之凹處313能夠避免空氣困在墨水供料槽307、325、326中。 The ink supply tanks 307, 325, 326 can have a gradually increasing cross-sectional area as the crotch portions of the ink supply tanks 307, 325, 326 approach the back side surface 308 from the front side surface 309. When the droplet is released, air or bubbles may enter the ink through a leak in the printhead or other reason. Chamber. Air bubbles in the ink chamber can interfere with ink release, and the progressively larger diameter of the ink supply slot can provide a path for the air bubbles to move away from the ink chamber 301. However, debris or adhesive projections may trap air bubbles in the ink supply slots 307, 325, 326. As a result, the recess 313 in the adhesive region 312 can prevent air from trapping in the ink supply slots 307, 325, 326.
圖4係為根據本文中所描述之原理的一基體401之一示範性背側表面400。在此範例中,一第一黏合區域402係位於一第一墨水供料槽403以及一第二墨水供料槽404之間。該第一墨水供料槽403能夠具有一第一長度414,且該第二墨水供料槽404則能夠具有一第二長度415。一第二黏合區域405能夠位於該第二墨水供料槽404以及一第三墨水供料槽407之間。在黏合區域402、405中,凹處能夠採用多重溝槽408、411、412、413之形式,其沿著墨水供料槽403、404、407之長度延伸。在圖4之範例中,該等溝槽408、411、412、413大致上係與墨水供料槽403、404、407平行。然而,在另則實施例中,該等溝槽408、411、412、413至少其中一者可能與該等墨水供料槽403、404、407至少其中一者不平行。溝槽408、411、412、413能夠與墨水供料槽403、404、407隔開一段距離,且溝槽408、411、412、413能夠延伸超過墨水供料槽403、404、407之長度。在某些範例中,諸如一溝槽之凹處係沿著該等墨水供料槽403、404、407至少其中一者之寬度所形成。 4 is an exemplary backside surface 400 of one of the substrates 401 in accordance with the principles described herein. In this example, a first bonding region 402 is located between a first ink supply slot 403 and a second ink supply slot 404. The first ink supply slot 403 can have a first length 414 and the second ink supply slot 404 can have a second length 415. A second bonding region 405 can be located between the second ink supply tank 404 and a third ink supply tank 407. In the bonded regions 402, 405, the recesses can take the form of multiple grooves 408, 411, 412, 413 that extend along the length of the ink supply slots 403, 404, 407. In the example of FIG. 4, the grooves 408, 411, 412, 413 are substantially parallel to the ink supply slots 403, 404, 407. However, in other embodiments, at least one of the grooves 408, 411, 412, 413 may not be parallel with at least one of the ink supply slots 403, 404, 407. The grooves 408, 411, 412, 413 can be spaced apart from the ink supply slots 403, 404, 407 and the grooves 408, 411, 412, 413 can extend beyond the length of the ink supply slots 403, 404, 407. In some examples, a recess such as a groove is formed along the width of at least one of the ink feed slots 403, 404, 407.
圖5係為根據本文中所描述之原理的一示範性列 印頭500的一橫剖面圖式。在此範例中,內部接點501、502具備帶有單獨溝槽503、504之凹處,該等溝槽跨距超過個別黏合區域505、506之寬度的百分之五十。在某些範例中,該等溝槽跨過該等黏合區域之寬度的百分之九十五或更低。在某些範例中,該等溝槽跨過少於該黏合區域之寬度的百分之九十、少於該黏合區域之寬度的百分之七十五、少於該黏合區域之寬度的百分之六十、少於其他百分比,或是其組合。 Figure 5 is an exemplary column in accordance with the principles described herein. A cross-sectional view of the printhead 500. In this example, the inner contacts 501, 502 are provided with recesses with individual grooves 503, 504 that span more than fifty percent of the width of the individual bonded regions 505, 506. In some examples, the grooves span ninety-five percent or less of the width of the bonded regions. In some examples, the grooves span less than ninety percent of the width of the bonded region, less than seventy-five percent of the width of the bonded region, and less than the width of the bonded region. Sixty, less than the other percentages, or a combination thereof.
一溝槽壁部507能夠有助於維持少許黏著劑508凸起進入墨水供料槽508。在某些範例中,該溝槽璧部507所具有之強度足以承受當基體509以及基體載體510靠在一起時的黏著劑膨脹力。在某些範例中,該溝槽璧部507係佈置成對於該基體載體510之一表面511形成一角度。在某些範例中,藉由該基體載體之表面以及溝槽璧部所形成之角度係為九十度。在其他範例中,該角度係在130度到20度之間。在某些範例中,能夠使用任何適當的角度,只要該角度足以避免黏著劑凸起進入墨水供料槽508即可。 A grooved wall portion 507 can help maintain a slight amount of adhesive 508 from projecting into the ink supply slot 508. In some examples, the grooved crotch portion 507 has a strength sufficient to withstand the adhesive expansion force when the base 509 and the base carrier 510 are brought together. In some examples, the grooved crotch portion 507 is arranged to form an angle with respect to one of the surfaces 511 of the base carrier 510. In some examples, the angle formed by the surface of the substrate carrier and the grooved crotch is ninety degrees. In other examples, the angle is between 130 degrees and 20 degrees. In some examples, any suitable angle can be used as long as the angle is sufficient to prevent the adhesive protrusion from entering the ink supply slot 508.
圖6係為根據本文中所描述之原理的一基體601的示範性背側表面600。在此範例中,凹處係位於墨水供料槽604、608、609之間的單獨溝槽602、603。該等溝槽602、603能夠跨過超過位於墨水供料槽604、608、609間之黏合區域606、607的寬度605的百分之五十。 FIG. 6 is an exemplary backside surface 600 of a substrate 601 in accordance with the principles described herein. In this example, the recess is a separate groove 602, 603 between the ink supply slots 604, 608, 609. The grooves 602, 603 can span more than fifty percent of the width 605 of the bonded regions 606, 607 located between the ink supply slots 604, 608, 609.
圖7係為根據本文所描述之原理的一示範性列印頭700之一橫剖面圖式。在此範例中,內側接頭703、704之 黏合區域701、702具有凹處705,其與墨水供料槽706流體連接。例如,至少一個凹處705能夠將黏合區域701接合到一墨水供料槽706之內壁707。當基體709與基體載體710移動靠在一起時,黏著劑708便能夠隨著黏著劑之移動而流入該凹處705。在某些範例中,黏著劑708會稍微凸起進入墨水供料槽706之空間,但其會少於沒有設置凹處705時之黏著劑的凸起狀況。在其他範例中,黏著劑708會稍微凸起進入墨水供料槽706之空間,但並不會深入到顯著影響墨水流動或是將空氣困在墨水供料槽705中。在其他範例中,與墨水供料槽706流體連接之該凹處705保持住黏著劑708,以至於使該黏著劑708不會進入墨水供料槽706之空間中。 7 is a cross-sectional view of an exemplary printhead 700 in accordance with the principles described herein. In this example, the inner joints 703, 704 Bonding regions 701, 702 have recesses 705 that are in fluid connection with ink supply slots 706. For example, at least one recess 705 can bond the adhesive region 701 to the inner wall 707 of an ink supply tank 706. When the substrate 709 and the base carrier 710 are moved together, the adhesive 708 can flow into the recess 705 as the adhesive moves. In some examples, the adhesive 708 will slightly bulge into the space of the ink supply trough 706, but it will be less than the bulging condition of the adhesive when the recess 705 is not provided. In other examples, the adhesive 708 will slightly bulge into the space of the ink supply slot 706, but will not penetrate deep into the ink flow or trap the air in the ink supply slot 705. In other examples, the recess 705 that is fluidly coupled to the ink supply slot 706 retains the adhesive 708 such that the adhesive 708 does not enter the space of the ink supply slot 706.
凹處705能夠具有任何適當的形狀。例如,與墨水供料槽706流體連接之凹處705能夠具有一平坦表面、一凸起表面、一凹陷表面、一曲面、一連續表面、一不連續表面、波紋表面。彎角表面、其他表面,或是其組合。 The recess 705 can have any suitable shape. For example, the recess 705 fluidly coupled to the ink supply slot 706 can have a flat surface, a raised surface, a recessed surface, a curved surface, a continuous surface, a discontinuous surface, a corrugated surface. Angled surface, other surfaces, or a combination thereof.
圖8係為根據本文中所描述之原理的一基體801之一示範性背側表面800的圖式。在此範例中,凹處802係部分地形成在該基體801之背側表面800的黏合區域803、804中。該凹處802能夠將黏合區域803、804連接到墨水供料槽805之璧部。當基體801以及基體載體移動靠在一起時,位於其間之黏著劑便能夠擠壓進入藉由該凹處802所造成的開放空間中。 FIG. 8 is a diagram of an exemplary backside surface 800 of one of the substrates 801 in accordance with the principles described herein. In this example, the recess 802 is partially formed in the adhesive regions 803, 804 of the back side surface 800 of the base 801. The recess 802 is capable of connecting the adhesive regions 803, 804 to the crotch portion of the ink supply slot 805. When the base 801 and the base carrier are moved together, the adhesive therebetween can be squeezed into the open space created by the recess 802.
圖9係為根據本文中所描述之原理的一列印頭900之一示範性剖面的橫剖面圖式。在此範例中,黏合到基 體載體903之基體902的外側接頭901具備帶有一凹處的黏合區域904。在此範例中,該凹處係為一溝槽905,其形成一保持唇片906,以便擋住黏著劑,避免其進入墨水供料槽908之空間。在其他範例中,該溝槽跨距超過黏合區域904之寬度的百分之五十。在另一範例中,該凹處係與墨水供料槽908流體連接,以至於使該凹處將黏合區域904連接到該墨水供料槽908之壁部。 9 is a cross-sectional view of an exemplary cross-section of a row of printheads 900 in accordance with the principles described herein. In this example, bonding to the base The outer joint 901 of the base 902 of the body carrier 903 is provided with an adhesive region 904 with a recess. In this example, the recess is a groove 905 that forms a retaining lip 906 to block the adhesive from entering the space of the ink supply slot 908. In other examples, the trench span exceeds fifty percent of the width of the bonded region 904. In another example, the recess is fluidly coupled to the ink supply slot 908 such that the recess connects the adhesive region 904 to the wall of the ink supply slot 908.
圖10係為根據本文中所描述之原理的示範性製造階段的圖式。在此範例中,於第一階段1000期間,一抗蝕刻層1001係沈積在該基體1003之一背側表面1002上。該抗蝕刻層1001可為由任何能夠抵抗蝕刻環境之適當材料所製成的遮罩層。例如,抗蝕刻層1001可為一生長熱氧化物、一生長或沈積電介質材料,諸如化學蒸汽沈積(CVD)氧化物、由四乙基氧矽烷(TEOS)預燒結物所形成之氧化矽、碳化矽、氮化矽、鋁、鈦、銅、鋁銅合金、鋁鈦合金、金、其他材料或是其組合。 10 is a diagram of an exemplary stage of fabrication in accordance with the principles described herein. In this example, during the first stage 1000, an anti-etching layer 1001 is deposited on one of the backside surfaces 1002 of the substrate 1003. The anti-etching layer 1001 can be a mask layer made of any suitable material that is resistant to the etching environment. For example, the anti-etching layer 1001 can be a grown thermal oxide, a grown or deposited dielectric material such as a chemical vapor deposition (CVD) oxide, yttrium oxide formed by tetraethyl oxane (TEOS) pre-sinter, carbonization. Niobium, tantalum nitride, aluminum, titanium, copper, aluminum-copper alloy, aluminum-titanium alloy, gold, other materials or combinations thereof.
在第二階段1004期間,該抗蝕刻層1001能夠形成圖案,以便產生基體1003之背側表面1002的暴露區域1005。在某些範例中,該抗蝕刻層1001係使用一雷射切削程序予以去除。然而,亦能夠使用其他適當的形成圖案程序,諸如光微影程序結合氣體或液體化學蝕刻。某些暴露區域1005能夠較其他部分寬。例如,某些暴露區域能夠預計用以做為墨水供料槽,而其他暴露區域則能夠預計用以成為凹處,以便在基體黏合到基體載體時用以控制黏著劑 流動。在此一範例中,該等預計作為墨水供料槽之區域以及預計成為凹處的區域能夠具有不同的寬度。 During the second phase 1004, the anti-etching layer 1001 can be patterned to create an exposed region 1005 of the backside surface 1002 of the substrate 1003. In some examples, the anti-etching layer 1001 is removed using a laser cutting process. However, other suitable patterning procedures can also be used, such as photolithography procedures in conjunction with gas or liquid chemical etching. Certain exposed areas 1005 can be wider than others. For example, some exposed areas can be expected to be used as ink feed slots, while other exposed areas can be expected to be recessed to control the adhesive when the substrate is bonded to the substrate carrier. flow. In this example, the areas expected to be the ink supply trough and the areas expected to be recesses can have different widths.
在一第三階段1006期間,某些基體材料係由預計成為墨水供料槽之暴露區域去除。在某些範例中,該材料係使用一雷射切削程序進行去除。其他適合用以去除材料之技術能包括以電漿增強反應離子蝕刻(RIE)進行矽乾式蝕刻,交替六氟化硫(SF6)蝕刻與八氟丁烯(C4F8)沉積、沙鑽、以鋸子或是研磨物機械地接觸該基體材料,或是其組合。材料去除能夠產生一凹溝1007,該形成之凹溝係穿過小於基體1003之整個厚度。在一薄的膜層係沉積在該基體之前側表面1008上的範例中,能夠留住一薄的基體薄膜1009,以便保護該薄的膜層免於受到雷射光束或是其他材料去除技術的任何可能產生損害的影響。 During a third stage 1006, certain matrix materials are removed from the exposed areas that are expected to be ink supply tanks. In some examples, the material is removed using a laser cutting program. Other techniques suitable for removing materials can include dry etching with plasma enhanced reactive ion etching (RIE), alternating sulfur hexafluoride (SF6) etching with octafluorobutene (C4F8) deposition, sand drilling, sawing or It is the abrasive that mechanically contacts the matrix material, or a combination thereof. Material removal can create a groove 1007 that passes through less than the entire thickness of the substrate 1003. In the example where a thin film layer is deposited on the front side surface 1008 of the substrate, a thin base film 1009 can be retained to protect the thin film layer from laser beam or other material removal techniques. Any impact that may cause damage.
在第四階段1010期間,能夠以濕式蝕刻程序從基體1003去除額外的材料。在某些範例中,濕式蝕刻係藉由將該基體1003沉浸於一各向異性蝕刻劑中經過足以完成形成墨水供料槽1011以及形成凹處1012的一段時間所達成。在某些範例中,該基體1003係沉浸於諸如氫氧化四甲銨(TMAH)或是氫氧化鉀(KOH)之一蝕刻劑中經過一段一小時到三小時的時間。該蝕刻劑可為任何的各向異性濕式蝕刻劑,其對於在進行濕式蝕刻之後欲保留的蝕刻阻抗層、任何其他薄膜、任何其他層具有選擇性。 During the fourth stage 1010, additional material can be removed from the substrate 1003 by a wet etch process. In some examples, wet etching is achieved by immersing the substrate 1003 in an anisotropic etchant for a period of time sufficient to complete the formation of the ink supply channel 1011 and the formation of the recess 1012. In some examples, the substrate 1003 is immersed in an etchant such as tetramethylammonium hydroxide (TMAH) or potassium hydroxide (KOH) for a period of one hour to three hours. The etchant can be any anisotropic wet etchant that is selective for the etch resist layer, any other film, any other layer that is to be retained after the wet etch is performed.
在某些範例中,一單次的濕式蝕刻便足以形成墨水供料槽1011以及凹處1012,而在其他範例中則使用多次 濕式蝕刻程序。例如,能夠在不同的時段使用不同的蝕刻劑,以便使該等墨水供料槽1011或是凹處1012形成一預定的形狀。尤其是,不同的蝕刻劑能具有不同的蝕刻率。在其他範例中,該蝕刻劑係為各向異性,且因此僅在特定的方向蝕刻該基體。能夠使用一各向異性蝕刻劑,以便在墨水供料槽中形成一筆直剖面,而能夠使用一快速蝕刻之蝕刻劑,用以去除較暴露區域更為寬廣的材料。在某些範例中,則使用一慢速蝕刻之蝕刻劑,用以蝕刻墨水供料槽與凹處之較為狹窄的剖面。 In some examples, a single wet etch is sufficient to form ink supply trough 1011 and recess 1012, and in other examples multiple uses. Wet etching procedure. For example, different etchants can be used at different times to form the ink supply tank 1011 or the recess 1012 into a predetermined shape. In particular, different etchants can have different etch rates. In other examples, the etchant is anisotropic, and thus the substrate is etched only in a particular direction. An anisotropic etchant can be used to form a straight cross-section in the ink feed slot, and a fast etch etchant can be used to remove a wider material than the exposed regions. In some examples, a slow etch etchant is used to etch a narrower profile of the ink feed slot and recess.
在某些範例中,則使用不同的階段與程序。此外,該等階段能夠以不同順序加以實行。例如,能夠僅在欲成為墨水供料槽1011之區域產生暴露區域,且接著僅在那些區域進行蝕刻。在墨水供料槽1011形成以後,接著能夠將一蝕刻遮罩沉積到該等墨水供料槽1011之表面上。接著欲成為凹處1012之區域能夠進行切削,以去除蝕刻阻抗層,接著蝕刻那些區域而形成凹處1012。 In some cases, different stages and procedures are used. Moreover, the stages can be implemented in a different order. For example, it is possible to produce exposed areas only in the area where the ink supply tank 1011 is to be made, and then perform etching only in those areas. After the ink supply tank 1011 is formed, an etch mask can then be deposited onto the surface of the ink supply tanks 1011. The area to be recess 1012 can then be cut to remove the etched resist layer, and then those areas are etched to form recess 1012.
圖11係為根據文中所描述之原理的一種用以控制一基體以及一基體載體間的黏著劑之示範性方法1100。在此範例中,該方法1100包括使一凹處形成於一列印頭之一基體的一背側表面之黏合區域中1101,其中該黏合區域係鄰接一墨水供料槽形成,該墨水供料槽從該背側表面形成穿過該基體的厚度而到達一前側表面、將一黏著劑佈置在該黏合區域與一基體載體之間1102、以及使該基體與基體載體一起移動,以至於使黏著劑流入該凹處中1103。 11 is an exemplary method 1100 for controlling an adhesive between a substrate and a substrate carrier in accordance with the principles described herein. In this example, the method 1100 includes forming a recess in an adhesive region 1101 of a backside surface of a substrate of a printhead, wherein the adhesive region is formed adjacent to an ink supply slot, the ink supply slot Forming a thickness from the back side surface through the substrate to a front side surface, disposing an adhesive between the bonding area and a substrate carrier 1102, and moving the substrate together with the substrate carrier, so that the adhesive is applied Flow into the recess 1103.
在某些範例中,使凹處形成於一黏合區域中包括以雷射切削去除形成於該背側表面上的蝕刻阻抗層。凹處能夠以在該背側表面藉由去除蝕刻阻抗層而暴露出的區域進行濕式蝕刻的方式所形成。 In some examples, forming the recess in an adhesive region includes removing the etched resistive layer formed on the backside surface by laser cutting. The recess can be formed by wet etching the region exposed on the back side surface by removing the etching resist layer.
在某些範例中,該黏合區域係位於一墨水供料槽以及其他形成於該基體之背側表面中的墨水供料槽之間。形成凹處能夠包括形成一第一溝槽以及一第二溝槽,其中該第一溝槽沿著一第一墨水供料槽運行一段第一長度,且該第二溝槽則沿著該第二墨水供料槽運行一段第二長度。在其他範例中,形成凹處包括形成一溝槽,其沿著其中一個墨水供料槽運行一段長度,且其中該溝槽具有一寬度,該寬度至少跨過從該第一墨水供料槽到第二墨水供料槽之距離的百分之五十。 In some examples, the bond area is between an ink feed slot and other ink feed channels formed in the backside surface of the substrate. Forming the recess can include forming a first trench and a second trench, wherein the first trench runs along a first ink supply slot for a first length, and the second trench follows the first The two ink supply tanks are operated for a second length. In other examples, forming the recess includes forming a groove that runs along one of the ink supply slots for a length, and wherein the groove has a width that spans at least from the first ink supply slot to Fifty percent of the distance of the second ink supply tank.
在某些範例中,使基體之背側表面產生輪廓,以便形成墨水供料槽以及凹處包括雷射切削一形成於該背側表面中之蝕刻阻抗層,以形成用於墨水供料槽之開口、雷射切削該蝕刻阻抗層,以形成用於凹處之開口、進行深度雷射切割,以便在基體中形成一槽溝、以及進行矽濕式蝕刻,以便形成墨水供料槽以及凹處。在某些範例中,該槽溝大約為600微米,且該基體之總厚度大約為675微米。在此範例中,濕式蝕刻能夠持續進行九十分鐘。 In some examples, the backside surface of the substrate is contoured to form an ink supply slot and the recess includes laser cutting a etched resist layer formed in the backside surface to form an ink supply slot Opening, laser cutting the etch resist layer to form an opening for the recess, performing deep laser cutting to form a groove in the substrate, and performing wet etching to form an ink supply groove and a recess . In some examples, the trench is approximately 600 microns and the total thickness of the substrate is approximately 675 microns. In this example, the wet etch can last for ninety minutes.
在其他範例中,使該基體之背側表面形成輪廓,以便形成墨水供料槽以及凹處包括雷射切削形成於該基體之背側表面上的蝕刻阻抗層,以便形成用於墨水供料槽以 及凹處之開口、清潔該基體之背側表面由於該雷射切削所產生的任何碎屑、將一金屬乾式蝕刻遮罩沈積到該基體的背側表面上、雷射切削一深度雷射槽溝到達大約500微米的深度、以乾式蝕刻程序(諸如輪流進行SF6蝕刻以及C4F8沈積)去除由於該雷射槽溝切削所產生的薄基體層膜、以及進行矽濕式蝕刻,以便完成墨水供料槽與凹處之成形。在此範例中,該濕式蝕刻能夠持續進行五十分鐘。 In other examples, the backside surface of the substrate is contoured to form an ink supply slot and the recess includes an etch resist layer formed by laser cutting on the backside surface of the substrate to form an ink supply slot Take And the opening of the recess, cleaning the back side surface of the substrate due to any debris generated by the laser cutting, depositing a metal dry etching mask onto the back side surface of the substrate, and laser cutting a deep laser groove The trench reaches a depth of about 500 microns, and a dry etching process (such as SF6 etching and C4F8 deposition in turn) removes the thin substrate film produced by the laser trench cutting, and performs wet etching to complete the ink supply. Forming of grooves and recesses. In this example, the wet etch can last for fifty minutes.
在另一範例中,使基體之背側表面產生輪廓,以便形成墨水供料槽以及凹處包括以一蝕刻阻抗層塗佈在一基體的背側表面上,並使其形成圖案、進行乾式蝕刻以去除該蝕刻阻抗層,以便暴露出欲成為墨水供料槽以及凹處之區域、去除任何殘留物(該基體蝕刻時預計作為暫時性遮罩選擇部分的材料)、沈積一金屬乾式蝕刻遮罩、形成用於乾式蝕刻之槽溝區域的圖案、乾式蝕刻一深溝槽,以便初步貫穿該基體之前側表面、以及進行矽濕式蝕刻,以便完成墨水供料槽與凹處之形成。在此一範例中,該濕式蝕刻能夠持續進行大約五十分鐘。 In another example, contouring the backside surface of the substrate to form the ink supply slot and the recess includes coating an etched resist layer on the backside surface of the substrate and patterning it for dry etching To remove the etch resist layer to expose areas of the ink supply bath and recesses, remove any residue (materials expected to be selected as temporary masks when the substrate is etched), deposit a metal dry etch mask Forming a pattern for the trench region of the dry etching, dry etching a deep trench to initially penetrate the front side surface of the substrate, and performing a wet etching to complete the formation of the ink supply groove and the recess. In this example, the wet etch can last for about fifty minutes.
在某些案例中,該凹處之深度係藉由雷射切削程序期間所形成的初始深度加以控制。在某些範例中,該初始深度大約係為6微米。凹處之其餘深度能夠藉由蝕刻劑之類型以及蝕刻時間加以控制。在某些範例中,該最終深度大約係為90到150微米。 In some cases, the depth of the recess is controlled by the initial depth formed during the laser cutting process. In some examples, the initial depth is approximately 6 microns. The remaining depth of the recess can be controlled by the type of etchant and the etching time. In some examples, the final depth is approximately 90 to 150 microns.
圖12係為根據文中所描述之原理的一示範性標繪圖1200的圖式,其顯示間隙高度對凹處距墨水供料槽的 距離之間的關係。在此範例中,該標繪圖1200具有一y軸1201,其概略地代表基體與基體載體間的間隙高度、以及一x軸1202,其概略地代表當基體載體與基體一起移動時,黏著劑會移動的距離。該移動距離係量測黏著劑之邊緣對於該黏著劑的中心軸移動的遠近而得。標繪圖1200中所描述之各個情況係使用相同體積的黏著劑。一標示圖例1207顯示對應到不同情況的不同標繪線1203、1204、1205。 Figure 12 is a diagram of an exemplary plot 1200 showing the gap height versus the recess from the ink supply slot, in accordance with the principles described herein. The relationship between distances. In this example, the plot 1200 has a y-axis 1201 that roughly represents the gap height between the substrate and the substrate carrier, and an x-axis 1202 that roughly represents the adhesive when the substrate carrier moves with the substrate. The distance moved. The moving distance is measured by measuring the distance of the edge of the adhesive from the central axis of the adhesive. The same volume of adhesive is used in each of the cases described in plot 1200. A designation legend 1207 displays different plot lines 1203, 1204, 1205 corresponding to different situations.
如大略以實心標繪線1203所代表,在本案例之此範例中,於黏合區域無凹處時所產生的移動大致上係平齊。在此一案例中,間隙高度與黏著劑移動間的關係係為線性關係。然而,如大略以標繪線1204所代表,在黏合區域距有兩個溝槽的案例中,則該關係便會開始偏離線性關係。然而,在特定的間隙高度1205,則移動大致上會降低。在大略以標繪線1206所表示,使用一單獨寬溝槽的案例中,該關係同樣呈現非線性關係。 As outlined by the solid plot line 1203, in this example of the case, the movement produced when there is no recess in the bonded area is substantially flush. In this case, the relationship between the gap height and the movement of the adhesive is linear. However, as roughly represented by the plot line 1204, in the case where the bond area is from two grooves, the relationship begins to deviate from the linear relationship. However, at a particular gap height of 1205, the movement will generally decrease. In the case where a single wide trench is used, as represented by plot line 1206, the relationship also exhibits a non-linear relationship.
儘管以上已經將凹處特別描述形成在基體之背側表面上的黏合區域,該凹處能夠形成於基體載體之一表面中。在某些範例中,該等凹處係以一種方式進行佈置,以致於使黏著劑能夠在基體與基體載體移動在一起時流入該凹處中。 Although the recess has been specifically described above as an adhesive region formed on the back side surface of the substrate, the recess can be formed in one surface of the base carrier. In some examples, the recesses are arranged in a manner such that the adhesive can flow into the recess as the substrate and the substrate carrier move together.
儘管以上已經將凹處描述成具有特定的組態與幾何形狀,能夠使用任何能夠防止黏著劑凸起進入墨水供料槽之組態或幾何形狀。例如,凹處可為溝槽、凹坑、凹口、凹孔、坑口、其他類型之凹處,或是其組合。在某些 範例中,該凹處包括多個溝槽、多個凹坑、多個凹處、多個凹孔、多個坑口、其他類型之多個凹處,或是其組合。在某些案例中,該凹處沿著墨水供料槽之長度運行、垂直於墨水供料槽之長度運行、對於墨水供料槽成一角度運行以其他方位運行,或使以其組合方式運行。在凹處係為至少一個溝槽的範例中,該溝槽能夠大致上為筆直、彎曲、連續、非連續、彎角、彎曲、採取其他型式,或是其組合。在凹處係為至少一個溝槽的範例中,該溝槽能夠具有一U形橫剖面、一V形橫剖面、一正方形橫剖面、一矩形橫剖面、其他形狀之橫剖面,或是其組合。 Although the recesses have been described above as having a particular configuration and geometry, any configuration or geometry that prevents the adhesive projections from entering the ink supply slot can be used. For example, the recess can be a groove, a dimple, a recess, a recess, a pocket, other types of recesses, or a combination thereof. In some In an example, the recess includes a plurality of grooves, a plurality of dimples, a plurality of dimples, a plurality of dimples, a plurality of dimples, a plurality of recesses of other types, or a combination thereof. In some cases, the recess runs along the length of the ink feed slot, runs perpendicular to the length of the ink feed slot, runs at an angle to the ink feed slot, or otherwise operates in a combination. In the example where the recess is at least one groove, the groove can be substantially straight, curved, continuous, non-continuous, angled, curved, take other forms, or a combination thereof. In the example where the recess is at least one groove, the groove can have a U-shaped cross section, a V-shaped cross-section, a square cross-section, a rectangular cross-section, a cross-section of other shapes, or a combination thereof. .
儘管以上範例已經描述具有一特定數量的墨水供料槽,文中所描述之原理能夠使用任何數量的墨水供料槽。例如,一基體能夠具有一到五個之間的墨水供料槽。 Although the above examples have been described with a particular number of ink supply slots, the principles described herein enable the use of any number of ink supply slots. For example, a substrate can have between one and five ink feed slots.
展示出先前描述僅作為解說與說明本文中所描述的原理。此描述並非預計用以將這些原理限制成任何確切精準的揭露內容,熟諳本技藝之人士由於上述解說而能夠進行許多修正與變化。 The previous description is presented merely to illustrate and explain the principles described herein. This description is not intended to limit the invention to any precise and precise disclosure, and many modifications and changes can be made by those skilled in the art.
300‧‧‧列印頭 300‧‧‧Print head
301‧‧‧墨水腔室 301‧‧‧Ink chamber
302‧‧‧噴嘴層 302‧‧‧Nozzle layer
303‧‧‧基體 303‧‧‧ base
304‧‧‧噴嘴 304‧‧‧ nozzle
305‧‧‧液滴釋放機構 305‧‧‧Drop release mechanism
306‧‧‧墨水貯存器 306‧‧‧Ink reservoir
307‧‧‧墨水供料槽 307‧‧‧Ink feed trough
308‧‧‧背側表面 308‧‧‧ Back side surface
309‧‧‧前側表面 309‧‧‧ front side surface
310‧‧‧基體載體 310‧‧‧Base carrier
311‧‧‧墨水貯存器本體 311‧‧‧Ink reservoir body
312‧‧‧黏合區域 312‧‧‧bonding area
313‧‧‧凹處 313‧‧‧ recess
314‧‧‧黏著劑 314‧‧‧Adhesive
315‧‧‧間隙高度 315‧‧ ‧ gap height
316‧‧‧凹處深度 316‧‧‧ recess depth
317‧‧‧凹處寬度 317‧‧‧ recess width
318‧‧‧外部接頭 318‧‧‧External joints
319‧‧‧外部接頭 319‧‧‧External joints
320‧‧‧內部接頭 320‧‧‧Internal joints
321‧‧‧內部接頭 321‧‧‧Internal joints
322‧‧‧黏著劑凸起物 322‧‧‧Adhesive protrusions
323‧‧‧壁件 323‧‧‧ wall pieces
325‧‧‧墨水供料槽 325‧‧‧Ink feed trough
326‧‧‧墨水供料槽 326‧‧‧Ink feed trough
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-
2012
- 2012-06-18 CN CN201280072865.8A patent/CN104245328B/en active Active
- 2012-06-18 WO PCT/US2012/042943 patent/WO2013191677A1/en active Application Filing
- 2012-06-18 US US14/394,696 patent/US9475278B2/en active Active
- 2012-06-18 EP EP12879251.2A patent/EP2828087B1/en active Active
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Also Published As
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EP2828087A1 (en) | 2015-01-28 |
US20160368267A1 (en) | 2016-12-22 |
CN104245328A (en) | 2014-12-24 |
CN104245328B (en) | 2016-10-05 |
TWI561395B (en) | 2016-12-11 |
US9579893B2 (en) | 2017-02-28 |
EP2828087B1 (en) | 2019-03-13 |
US9475278B2 (en) | 2016-10-25 |
WO2013191677A1 (en) | 2013-12-27 |
EP2828087A4 (en) | 2016-10-26 |
US20150145908A1 (en) | 2015-05-28 |
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