TW201407295A - Illuminating apparatus, processing apparatus and device manufacturing method - Google Patents

Abstract

An illuminating apparatus includes a light integrator that has a first surface which is rectangle, an inside surface and a second surface which is rectangle and that emits an incident light on the first surface from the second surface through a multiple reflection on the inside surface; a light guide which guides a light from a light source to the light integrator and supplies a plurality of a light flux, which are arranged at a predetermined interval along a longitudinal direction of the first surface, to the light integrator; and an imaging optical system which forms a coupled surface coupled to the second surface with respect to a traverse direction of the second surface and in which a refractive power with respect to a longitudinal direction of the second surface is lower than a refractive power with respect to the traverse direction of the second surface.

Description

Lighting device, processing device, and component manufacturing method

The present invention relates to a lighting device, a processing device, and a component manufacturing method.

Priority is claimed on US Provisional Application No. 61/662,571, filed on Jun.

In recent years, as a display device such as a television, an element such as an organic EL display panel or a liquid crystal display panel is often used. The various elements described above are produced by forming various film patterns such as transparent thin film electrodes on a substrate such as a glass plate by exposure processing and etching. A method of manufacturing a roll-to-roll method in which various processes such as exposure processing of a substrate on a transport path are carried out while transporting a film-form substrate is proposed (for example, see Patent Document 1).

Patent Document 1: International Publication No. 2008/129819

A processing device such as an exposure device is expected to expand the processing range from the viewpoint of efficiently manufacturing components. In the illumination device used in the above-described processing apparatus, it is expected that the irradiation range of light in the direction perpendicular to the moving direction of the object to be processed can be enlarged.

An object of the present invention is to provide a lighting device and a processing device that can expand the processing range. Placement and component manufacturing methods.

An illumination device according to an aspect of the present invention includes: an optical integrator having a first surface of a rectangle, an inner surface, and a second surface of a rectangle, wherein light incident on the first surface transmits multiple reflections from the inner surface a light guide portion that guides light from a light source to the light integrator, and supplies a plurality of light beams arranged at a predetermined interval along a longitudinal direction of the first surface to the optical integrator; and an imaging optical system, A conjugate plane conjugated to the second surface is formed in the short side direction of the second surface, and a refractive power in a longitudinal direction of the second surface is smaller than a refractive power in a short side direction of the second surface.

An illumination device according to an aspect of the present invention includes: an optical integrator having a first surface, an inner surface, and a second surface of a rectangle; and the light incident on the first surface is reflected by the multiple reflection on the inner surface The second surface is emitted; the light guiding unit guides the light from the light source to the optical integrator, and supplies a plurality of light beams arranged at predetermined intervals along the longitudinal direction of the first surface and having a predetermined angular characteristic to the optical integrator. And an imaging optical system in which a conjugate plane conjugated to the second surface is formed in a short side direction of the second surface, and a refractive power in a longitudinal direction of the second surface is smaller than a short side direction of the second surface The refractive power has a predetermined magnification other than the multiple of the short side direction of the second surface.

A processing apparatus according to an aspect of the present invention is a substrate that is formed into a mask pattern and transferred to a substrate having a sensing layer, comprising: an illumination device that illuminates the mask pattern; and a moving device that makes the mask pattern The substrate is relatively moved in a direction perpendicular to the longitudinal direction of the second surface.

A method of manufacturing a device according to an aspect of the present invention includes: an operation of continuously transferring the pattern to the substrate while moving the mask pattern relative to the substrate by a processing device; and using the substrate to which the pattern is transferred The change of the sensing layer performs the action of subsequent processing.

An illumination device according to an aspect of the present invention includes: a rectangular parallelepiped optical integrator; a rectangular incident end, an inner surface, and a rectangular exit end, such that the light from the light source incident from the incident end is directed to the exit end by multiple reflections on the inner surface; the light source side optical system is incident on the light source side The light of the incident end of the optical integrator is formed as a plurality of concentrated light beams arranged at a predetermined interval along the longitudinal direction of the incident end; and the imaging optical system is formed in the short side direction of the exit end of the optical integrator The conjugate surface of the conjugate end of the exit end has a refractive power in the longitudinal direction of the exit end that is smaller than the refractive power in the short side direction of the exit end.

According to the aspect of the invention, it is possible to provide an illumination device, a processing device, and a device manufacturing method which can expand the processing range.

EX‧‧‧Exposure device

IU‧‧‧Lighting device

L1‧‧‧ illumination light

L2‧‧‧Exposure light

M‧‧‧mask pattern

P‧‧‧Substrate

U3‧‧‧Processing device

10‧‧‧Mobile devices

11‧‧‧Control device

20‧‧‧Light source department

21‧‧‧Amplified optical system

22‧‧‧Light integrator

23‧‧‧Image Optics

23a‧‧‧ Conjugate

24‧‧‧Solid light source

25‧‧‧Fiber

32~34‧‧‧ lens array

35‧‧‧Injected end

36, 37‧‧‧ inside

38‧‧‧Outlet

Fig. 1 is a view showing an example of a component manufacturing system.

Fig. 2 is a side view showing the exposure apparatus of the first embodiment.

Fig. 3 is a front view showing the exposure apparatus of the first embodiment.

Fig. 4 is a perspective view showing the lighting device of the first embodiment.

5(A) and 5(B) are a side view and a front view showing the lighting device of the first embodiment.

Fig. 6 is a plan view showing a light source unit according to the first embodiment.

Fig. 7 is a plan view showing the diaphragm member of the first embodiment.

8(A) and (B) are diagrams for explaining the illumination method.

Fig. 9 is a view for explaining a lighting method.

10(A) and (B) are diagrams for explaining the illuminance distribution.

Fig. 11 is a side view showing the exposure apparatus of the second embodiment.

12(A) and 12(B) are a side view and a front view showing the illumination device of the second embodiment.

Fig. 13 is a plan view showing the diaphragm member of the second embodiment.

Fig. 14 is a side view showing the exposure apparatus of the third embodiment.

Fig. 15 is a plan view showing the lighting device of the third embodiment.

16(A) to (C) are diagrams for explaining the illumination method.

17(A) and (B) are graphs showing an example of an illuminance distribution.

Fig. 18 is a side view showing the exposure apparatus of the fourth embodiment.

19(A) to (C) are diagrams for explaining the illumination method.

20(A) and (B) are graphs showing an example of an illuminance distribution.

Fig. 21 is a flow chart showing an example of a method of manufacturing an element.

(First embodiment)

Fig. 1 is a view showing a configuration example of a component manufacturing system SYS (flexible display production line). Here, the flexible substrate P (sheet, film, etc.) pulled out from the supply roller FR1 is sequentially drawn to the recovery roller FR2 via the n processing apparatuses U1, U2, U3, U4, U5, ... Un.

In FIG. 1, the XYZ orthogonal coordinate is set such that the surface (or the back surface) of the substrate P is perpendicular to the XZ plane, and the direction (width direction) orthogonal to the transport direction (longitudinal direction) of the substrate P is the Y-axis direction. The Z-axis direction is set such that the vertical direction, the X-axis direction, and the Y-axis direction are set to be horizontal. In addition, for convenience of explanation, the view viewed from the X-axis direction (downstream of the transport direction) is a front view, and the view viewed from the Y-axis direction (the direction of the rotation center axis) is a side view, and will be from the Z-axis direction. (The top of the vertical direction) The view is a top view.

The substrate P wound around the supply roller FR1 is pulled by the nip drive roller, and is sent to the processing device U1 while being positioned in the Y direction by the edge position controller.

The processing apparatus U1 is, for example, a coating apparatus, and the photosensitive functional liquid (photoresist, photosensitive coupling material, UV curable resin, etc.) is continuously or selectively applied to the substrate P in the transport direction (longitudinal direction) by printing. The surface of the substrate P. The processing apparatus U2 is, for example, a heating apparatus, and the substrate P conveyed from the processing apparatus U1 is heated to a predetermined temperature (for example, about several tens of degrees Celsius to 120 degrees C), and the photosensitive functional layer applied to the surface is stably fixed.

The processing device U3 includes an exposure device, and for example, irradiates the photosensitive functional layer of the substrate P transferred from the processing device U2 with the patterned light of ultraviolet rays corresponding to the circuit pattern for the display or the wiring pattern. In the processing apparatus U3, the edge position controller EPC controls the center of the Y direction (width direction) of the substrate P at a predetermined position, and the nip drive roller DR1 carries the substrate P into the exposure area (processing area) of the exposure apparatus. The driving rollers DR2 and DR3 carry out the substrate P while applying a predetermined slack (void) DL to the substrate P.

Further, in the processing apparatus U3, the rotating cylinder DM holds the sheet-shaped mask pattern M (mask substrate), and the rotating cylinder DP supports the substrate P at a position facing the rotating cylinder DM. In the processing device U3, the illumination device IU irradiates the substrate P with light through a portion of the mask pattern M held by the rotary cylinder DM, thereby transferring the pattern formed on the mask pattern M to the substrate P supported by the rotary cylinder DM. . In the processing apparatus U3, the alignment microscope AM detects an alignment mark or the like formed in advance on the substrate P in order to align the exposure (transfer) pattern with the substrate P.

The processing apparatus U3 of FIG. 1 includes an exposure apparatus of a bonding type, and the rotating cylinder DM around which the mask pattern M is wound is used as a mask body, and the mask body and the substrate P have a predetermined gap (for example, within several tens of μm). Approaching, the pattern on the mask body is transferred to the substrate P. The pattern transfer method by the processing device U3 is not limited to the bonding method, and the substrate P may be wound around the outer circumference of the cylindrical mask body, and the image of the mask pattern M may be projected by the projection optical system. To the substrate P The way is also possible. Further, the mask body may be a releasable rotating cylinder DM and a mask pattern M, and may not be released. For example, the mask body may have a mask pattern M formed on the surface of the rotating cylinder DM of the transparent cylindrical quartz tube.

The processing apparatus U4 is, for example, a wet processing apparatus, and performs at least one of various wet processing such as wet development processing and electroless plating processing on the photosensitive functional layer of the substrate P transferred from the processing apparatus U3. The processing apparatus U5 is, for example, a heating and drying apparatus, and heats the substrate P transferred from the processing apparatus U4, and adjusts the moisture content of the wet substrate P to a predetermined value by a wet program.

The substrate P to which the processing devices U1 to U5 have been applied is wound around the recovery roller FR2 through the nip driving roller and the edge position controller after passing through the processing device Un at the end of the series of processes.

The upper control unit CONT collectively controls the operations of the processing units U1 to Un constituting the production line, and also monitors the processing status or processing status of each processing unit U1 to Un, and monitors the transport status of the substrate P between the processing units. Feedback corrections or feedforward corrections based on the results of the pre/post inspection/measurement.

The substrate P used in the present embodiment is, for example, a resin film, a foil made of a metal or an alloy such as stainless steel, or the like. The material of the resin film includes, for example, a polyethylene resin, a polypropylene resin, a polyester resin, an ethylene-vinyl copolymer resin, a polyvinyl chloride resin, a cellulose resin, a polyamide resin, a polyimide resin, a polycarbonate resin. One or more of polystyrene resin and vinyl acetate resin.

As the substrate P, it is possible to use a thermal expansion coefficient which is substantially negligible due to the amount of deformation due to heat in various processing steps, which is not significantly large. The coefficient of thermal expansion can be set to be smaller than a threshold corresponding to the process temperature or the like by, for example, mixing an inorganic filler with the resin film. Inorganic filler can be an example Such as titanium oxide, zinc oxide, aluminum oxide, cerium oxide and the like. In addition, the substrate P may be a single layer of extremely thin glass having a thickness of about 100 μm, which is produced by a floating method or the like, or a laminate of the above resin film, foil, or the like may be bonded to the ultrathin glass. Further, the substrate P may be one in which the surface is previously activated by a predetermined pretreatment, or a fine partition wall structure (concave-convex structure) for precise patterning is formed on the surface.

The component manufacturing system SYS of Fig. 1 performs various processes for manufacturing the substrate (display panel or the like) repeatedly or continuously on the substrate P. The substrate P subjected to various treatments is divided (cut) for each element to form a plurality of elements. The size of the substrate P, for example, the dimension in the width direction (the Y-axis direction of the short side) is about 10 cm to 2 m, and the dimension in the longitudinal direction (the X-axis direction of the long side) is 10 m or more. Further, at least one of the plurality of processing devices provided in the component manufacturing system SYS may be omitted.

Next, the processing device U3 (exposure device EX) will be described in more detail. Fig. 2 is a side view showing the exposure apparatus EX of the embodiment, and Fig. 3 is a front view showing the exposure apparatus EX. The exposure apparatus EX of FIG. 2 includes an illumination device IU that is one of the illumination mask patterns M, a mobile device 10 that moves the substrate P and the mask pattern M, and a control device 11 that controls each of the exposure devices EX.

The exposure apparatus EX of FIG. 2 is a so-called scanning exposure apparatus. The substrate P is scanned by the exposure light L2 generated by the mask pattern M illuminated by the illumination light L1, and the pattern formed on the mask pattern M is transferred to the substrate P.

As shown in FIGS. 2 and 3, the illumination device IU is formed in the illumination region IR on the long side in the Y-axis direction, and the illumination light L1 is emitted so that the illumination distribution of the illumination region IR is uniform. The mobile device 10 causes the reticle pattern to pass through the illumination area IR in a part of the reticle pattern M. M moves in a direction (short side direction, short axis direction, short axis, and X-axis direction) substantially perpendicular to the longitudinal direction (long axis direction, long axis, and Y-axis direction) of the illumination region IR. In the above-described manner, the exposure device EX generates the exposure light L2 corresponding to the pattern of the region in the region of the illumination region IR in the mask pattern M.

Moreover, the moving device 10 moves the substrate P in the short-side direction (X-axis direction) of the illumination region IR so that the region (exposure region PR) in which the exposure light L2 is incident from the mask pattern M passes through the substrate P. In the above-described manner, the exposure apparatus EX scans the substrate P in the direction (X-axis direction) perpendicular to the longitudinal direction (Y-axis direction) of the illumination region IR by the exposure light L2.

Next, the mobile device 10 will be described in more detail. The moving device 10 of FIG. 2 includes a rotating cylinder DM that holds the mask pattern M, a driving unit 12 that drives the rotating cylinder DM, a rotating cylinder DP that supports the substrate P, and a driving unit 13 that drives the rotating cylinder DP.

The rotating cylinder DM is a reticle holding member that holds the reticle pattern M. The rotating cylinder DM has a cylindrical outer peripheral surface (hereinafter referred to as a cylindrical surface DMa), and the mask pattern M is bent in a cylindrical shape along the cylindrical surface DMa. The cylindrical surface is a surface that is curved at a predetermined radius around a predetermined center line, for example, at least a portion of a circumferential surface other than a cylinder or a cylinder.

The mask pattern M is, for example, a transmissive mask pattern formed in a sheet shape, and includes a pattern formed of a light shielding member such as chrome. The rotating cylinder DM holds the reticle pattern M in a releasable (replaceable) manner by winding the reticle pattern M on its cylindrical surface DMa, but the reticle pattern M is kept unreleased. For example, the mask pattern M is formed on the cylindrical surface DMa of the rotating cylinder DM such as a quartz tube or a glass tube, and may be integrated with the rotating cylinder DM.

The rotary cylinder DM is configured to be rotatable about a rotation central axis AX1 and rotated by a torque supplied from the drive unit 12. The rotational position of the rotary cylinder DM is detected by an encoder or the like 14 The detection is controlled based on the detection result of the detecting unit 14. The detecting unit 14 may be a part of the mobile device 10, and may be different from the mobile device 10.

The rotating drum DP is a substrate holding member that holds the substrate P. The rotating drum DP has a cylindrical outer peripheral surface DPa, and the outer peripheral surface DPa supports the substrate P. The rotary cylinder DP is provided to be rotatable about a rotation central axis AX2 and rotated by a torque supplied from the drive unit 13. The rotation center axis AX2 of the rotary drum DP is set to be substantially parallel to the rotation center axis AX1 of the rotary cylinder DM, for example. The substrate P is rotated by the rotating drum DP and conveyed so as to be wound around the rotating drum DP.

The rotational position of the rotary cylinder DP is detected by the detecting unit 15 such as an encoder, and is controlled based on the detection result of the detecting unit 15. The detecting unit 15 may be part of the mobile device 10, and may be different from the mobile device 10.

The control device 11 controls the drive unit 12 based on the detection result acquired from the detection unit 14, thereby controlling the rotational position of the rotary cylinder DM. As described above, the control device 11 can control the rotational position of the reticle pattern M held by the rotary cylinder DM. Moreover, the control device 11 controls the drive unit 13 based on the detection result acquired from the detection unit 15, thereby controlling the rotational position of the rotary drum DP. As described above, the control device 11 can control the position of the substrate P that moves as the rotary drum DP rotates.

The control device 11 controls the driving portion 12 and the driving portion 13 to control the relative position of the mask pattern M and the substrate P, and scans the substrate P by the exposure light L2 generated in the portion of the mask pattern M overlapping the illumination region IR. . In the exposure apparatus EX, the scanning direction of the substrate P by the exposure light EL2 is a direction (X-axis direction) substantially perpendicular to the rotation central axis AX1 (Y-axis direction).

Further, the drive unit 12 may move the rotary cylinder DM in at least one of the X-axis direction and the Y-axis direction and the Z-axis direction. In this case, the detecting unit 14 rotates at the driving unit 12. The direction in which the cylinder DM moves may detect the position of the rotary cylinder DM, and the control device 11 may control the drive unit 12 based on the detection result of the detection unit 14, thereby controlling the position of the rotary cylinder DM in an arbitrary direction.

The position adjustment of the rotating drum DM may be one or both of a rotation direction about the X-axis and a rotation direction about the Z-axis. Further, the position adjustment of the rotary cylinder DM is also applicable to the rotary drum DP. The exposure device EX can control the relative position of the rotary cylinder DM and the rotary cylinder DP by controlling the position of one or both of the rotary cylinder DM and the rotary cylinder DP. Thereby, the exposure device EX can also adjust the relative position of the illumination region IR and the substrate P in a direction other than the scanning direction.

Next, the illumination device IU will be described in more detail. Fig. 4 is a perspective view showing the illumination device IU of the embodiment, Fig. 5(A) showing a side view of the illumination device IU, and Fig. 5(B) showing a front view of the illumination device IU. Fig. 6 is a plan view showing an example of a light source unit (light guiding unit, light source side optical system) 20, and Fig. 7 is a plan view showing the diaphragm member.

The illumination device IU of Fig. 4 forms an illumination region IR having a long side in a predetermined direction (Y-axis direction). In the illumination device IU, in the exposure device EX (see FIG. 2), the longitudinal direction of the illumination region IR is arranged to be substantially perpendicular to the scanning direction (X-axis direction).

The illumination device IU includes a light source unit 20, an amplification optical system 21, an optical integrator 22, and an imaging optical system 23. The illumination light L1 emitted from the light source unit 20 is incident on the optical integrator 22 through the amplification optical system 21, is emitted from the optical integrator 22, and is incident on the illumination region IR through the imaging optical system 23.

Further, for the illumination light L1 for exposure, for example, light having a wavelength of 300 nm or more and 400 nm or less, or light having a wavelength of 400 nm or more and 500 nm or less, for example, ultraviolet light, is used. Therefore, the nitrate material constituting the optical elements of the light source unit 20, the amplification optical system 21, the optical integrator 22, and the imaging optical system 23 may be quartz.

The light source unit 20 of FIG. 6 includes a solid-state light source 24 (light source) and is connected to solid light. A plurality of optical fibers 25 of source 24. Here, a plurality of solid-state light sources 24 are provided in the light source unit 20, and the optical fibers 25 are provided in a one-to-one correspondence with the solid-state light source 24. The solid state light source 24 is, for example, a laser diode (LD) or a light emitting diode (LED). The light source unit 20 directs light from the solid-state light source 24 to the optical integrator 22.

The optical fiber 25 (see FIGS. 4 and 5) transmits the illumination light L1 from the solid-state light source 24 of FIG. 6 to the optical integrator 22 through the amplification optical system 21. Each of the plurality of optical fibers 25 has an end 26 from which the illumination light L1 is emitted, and the end 26 of the optical fiber 25 is along a longitudinal direction (long axis direction, long axis) of the incident end 35 of the optical integrator 22 at a predetermined interval (established interval, center) Between distances). A light source image Im1 is formed at each end 26 of the plurality of optical fibers 25. The light source unit 20 forms a plurality of light source images Im1 to be arranged at a predetermined pitch in a direction corresponding to the longitudinal direction of the illumination region IR, and is supplied to the optical integrator 22.

The end 26 of the optical fiber 25 has a substantially circular shape, and the diffusion angle of the illumination light L1 when emitted from the light source unit 20 converges the angular characteristic (numerical aperture) of the light incident on the incident end of the optical fiber 25 or the diameter of the optical fiber 25 ( 1) Wait for the decision. The magnification optical system 21 adjusts the diffusion angle of the illumination light L1 when entering the optical integrator 22. The magnifying optical system 21 is disposed between the light source unit 20 and the optical integrator 22, and the light source image Im1 formed by the enlarged light source unit 20 adjusts the diffusion angle of the illumination light L1.

The magnifying optical system 21 of FIG. 5(B) includes a plurality of modules 27 arranged in the longitudinal direction of the illumination region IR. Each of the plurality of modules 27 is provided in a one-to-one correspondence with the optical fibers 25 of the light source unit 20, and is formed as an image of the end 26 of the light-emitting side of the optical fiber 25 corresponding to the relationship. That is, the magnifying optical system 21 forms a secondary light source image Im2 that amplifies the light source image Im1. Further, in each of the drawings for reference, in order to facilitate the observation of the image, the number of the light source unit 20 and the module 27 is appropriately reduced and displayed.

Each of the plurality of modules 27 includes a lens 28, a lens 29, and a lens 30 that form a secondary light source image Im2. The lens 30 converges the illumination light L1 passing through the lens 29 to converge on the optical integrator The incident end 35 of the 22 is concentrated. Each of the lens 28, the lens 29, and the lens 30 is formed of, for example, a spherical lens, but may include an aspherical lens or a free-form lens.

The lens 28 and the lens 29 are, for example, telecentric optical systems. The front focus position of the lens 28 is set at the light exit side end 26 of the optical fiber 25, and the front side focus position of the lens 29 is set at the rear focus position of the lens 28. An image of the end 26 of the optical fiber 25 (secondary light source image Im2) is formed at the rear focus position of the lens 29. The lens 30 is disposed in an optical path between the lens 29 and the incident end 35 of the optical integrator 22, for example, with its rear focus position set at the incident end 35 of the optical integrator 22.

In the above setting, at the position of the incident end 35 of the optical integrator 22, the image (source image) of the end 26 of the optical fiber 25 is imaged (converged), but this is not a requirement, so that the incident end 35 of the optical integrator 22 The position where the position and the light source image are formed may be shifted in the optical axis direction of the lenses 28 to 30. For example, the position of the rear focus of the lens 30 can be offset from the position of the incident end 35 of the optical integrator 22 in the normal direction of the incident end 35.

The module 27 of FIG. 5 includes a diaphragm member 31 for defining the diffusion angle of the illumination light L1 when entering the optical integrator 22. The diaphragm member 31 is a so-called aperture stop, and is disposed, for example, at or near the position of the pupil plane (secondary light source image Im2) of the optical system 21. Here, the diaphragm member 31 is disposed at a position optically conjugate with the end of the optical fiber 25 on the light emitting side (the solid-state light source 24 side).

The aperture member 31 of Fig. 7 has an opening 31a through which the illumination light L1 passes. The opening 31a corresponds to the arrangement of the plurality of modules 27 of FIG. 5, and is arranged in plural in the longitudinal direction (Y-axis direction) of the illumination region IR. The opening 31a has a substantially circular shape, and the diffusion angle of the illumination light L1 passing through the aperture member 31 in the XZ plane is substantially the same as the diffusion angle in the YZ plane. Further, the diaphragm member 31 can be omitted as appropriate.

In FIG. 5(B), a plurality of modules 27 of the magnifying optical system 21 are arranged in the Y-axis direction. The lens array 32 in which the lenses 28 are arranged, the lens array 33 in which the lenses 29 are arranged in the Y-axis direction, and the lens array 34 in which the lenses 30 are arranged in the Y-axis direction are formed. As described above, at least one type of lens of the magnifying optical system 21 is configured by a lens array, and the number of parts can be reduced. However, at least one type of lens of the magnifying optical system 21 is not in the form of a lens array, and a plurality of modules 27 are independent parts. can.

The optical integrator 22 (see FIG. 4) is an optical member having a rectangular parallelepiped shape such as a lenticular lens. The optical integrator 22 has a rectangular incident end (a rectangular incident surface, a first surface) 35, an inner surface 36 including a long side of the incident end 35, an inner surface 37 including a short side of the incident end 35, and a rectangular exit end. (Rectangle exit surface, second surface) 38. The incident end 35 includes an incident region from which the illumination light L1 of the light source unit 20 is incident, and the emission end 38 includes an emission region that is emitted by the illumination light L1 that has passed through the inside of the optical integrator 22. The light integrator 22 directs the illumination light L1 incident on the incident end 35 to the exit end 38 by multiple reflections on the inner surface 36.

The illumination light L1 diffused by the optical integrator 22 in the short-side direction (short-axis direction, short-axis direction) of the incident end 35, as shown in FIG. 8(A), is included in the inner surface 36 at the end in the short-side direction. A plurality of beams having different numbers of reflections. The illumination light L1 of the optical integrator 22 is overlapped by the plurality of light beams having different numbers of reflections at the exit end 38, and the illuminance distribution in the short-side direction of the output end 38 is uniform. Here, the illumination light L1 includes the light beam reflected from the inner surface 36 even if the illumination light L1 emitted from any one of the plurality of modules 27 is used.

The illumination light L1 diffused by the optical integrator 22 in the longitudinal direction of the incident end 35, as shown in FIG. 8(B), corresponds to the position of the module 27 of the emission source in the Y-axis direction, and is located in the longitudinal direction. The inner surface 37 of the end reflects a portion of the beam, and the other beams do not enter the inner surface 37. For example, the illumination light L1 from the module 27 disposed at the end portion of the longitudinal direction of the incident end 35 includes a light beam incident on the inner surface 37, but from a mode disposed at the central portion of the longitudinal direction of the incident end 35. group The illumination light L1 of 27 does not substantially contain the light beam incident on the inner surface 37. Here, most of the illumination light L1 from the module 27 disposed at the central portion in the longitudinal direction of the incident end 35 is not reflected on the inner surface 37, and is emitted from the emission end 38 through the inside of the optical integrator 22.

The light integrator 22 hardly changes the diffusion angle of the illumination light L1 in the X-axis direction (in the XZ plane) corresponding to the short-side direction and the Y-axis direction (in the YZ plane) corresponding to the longitudinal direction. That is, the diffusion angle of the illumination light L1 of the optical integrator 22 in the X-axis direction is almost the same as when it is incident on the incident end 35 and when it is emitted from the exit end 38. Further, the diffusion angle of the illumination light L1 of the optical integrator 22 in the Y-axis direction is almost the same as that when it is incident on the incident end 35 and when it is emitted from the emission end 38. The illumination light L1 emitted from the optical integrator 22 is incident on the imaging optical system 23.

The imaging optical system 23 has a large refractive power in the short side direction of the exit end 38 as compared with the refractive power in the longitudinal direction of the exit end 38. The imaging optical system 23 is constituted by, for example, a pair of cylindrical lenses (cylindrical lenses). The bus bar of the cylindrical lens of the imaging optical system 23 is set, for example, substantially parallel to the longitudinal direction of the exit end 38.

The imaging optical system 23 has an imaging effect on a light beam which is parallel to the short side direction of the exit end 38 of the optical integrator 22 and which is perpendicular to the longitudinal direction. The imaging optical system 23 forms a conjugate plane 23a (illumination area IR) conjugated with the exit end 38 in the short side direction of the exit end 38 of the optical integrator 22. For example, when the illumination device IU is viewed from the Y-axis direction, a light beam emitted from one of the exit ends 38 (a line parallel to the Y-axis direction) is substantially at a point on the conjugate plane 23a (a line parallel to the Y-axis direction). convergence.

The illumination device IU having the above configuration is disposed such that the conjugate surface 23a (illumination region IR) and the mask pattern M (the cylindrical surface DMa of the rotary cylinder DM) are substantially at the same position. At the exit end 38 of the optical integrator 22, the illumination distribution in the short side direction is uniform by multiple reflections on the inner surface 36. The imaging optical system 23 optically conjugates the emission end 38 to the illumination region IR in the short-side direction. Therefore, in the illumination region IR, the illuminance distribution in the short-side direction becomes uniform. Further, in the illumination region IR, the illuminance distribution in the longitudinal direction is uniformized by the illuminance distribution from each of the plurality of light source units 20 being shifted in the longitudinal direction. Therefore, the illumination device IU can illuminate the illumination area IR with a uniform brightness.

Next, the illumination method of the illumination device IU will be described in more detail. Here, the values of the size, the focal length, and the like of the various members will be described, but the values of these are examples, and can be appropriately changed.

The solid-state light source 24 of the light source unit 20 of Fig. 6 is, for example, a laser diode, and emits laser light having a wavelength of about 403 nm as the illumination light L1, and the output is about 0.25 W. The light source unit 20 is provided with, for example, 83 solid light sources 24, and the total output of the 83 solid light sources 24 is about 20.075 W. The optical fiber 25, for example, is provided with the same number (83) as the solid-state light source 24, and its diameter ( 1) is about 0.3 mm. In this example, the diffusion angle (angle characteristic) of the illumination light L1 emitted from the optical fiber 25 of the light source unit 20 is converted into a value of NA (numerical aperture) of about 0.2.

In the following description, the diffusion angle of light (for example, illumination light L1) is converted into a value of NA, and is appropriately referred to as an NA conversion value of light (for example, illumination light L1). In addition, the NA conversion value of the light (light beam) diffused in the X-axis direction in the X-axis direction is referred to as the NA conversion value in the X-axis direction, and the NA conversion value of the light (light beam) diffused in the YZ plane in the Y-axis direction is referred to. It is called the NA conversion value in the Y-axis direction.

The diffusion angle of the illumination light L1 when being emitted from the illumination device IU, that is, the diffusion angle of the illumination light L1 when entering the illumination region IR is set according to the use of the illumination device IU or the like. For example, in the exposure apparatus EX, the diffusion angle of the illumination light L1 when it is emitted from the illumination device IU is selected in accordance with the resolution of the exposure apparatus EX (the line width of the projection pattern) or the like. Here, the resolution of the exposure apparatus EX is about several μm, and the NA conversion value of the illumination light L1 when it is emitted from the illumination device IU is set to 0.04.

The light source 20 is formed by each module 27 of the magnifying optical system 21 of FIG. Magnify N1 like Im1 (for example, 5 times). As a result, the NA converted value of the illumination light L1 when being emitted from the magnifying optical system 21 is 1/N times the NA converted value (for example, 0.2) of the illumination light L1 when it is incident on the magnifying optical system 21 (here, 0.2/5) =0.04). The module 27 can be realized, for example, by setting the focal length (f1) of the lens 28 to about 3 mm, the focal length (f2) of the lens 29 to be about 15 mm, and the focal length (f3) of the lens 30 to be about 18.75 mm.

8 and 9 are diagrams for explaining a lighting method. Specifically, FIG. 8(A) is a side view of the light beam from the light source image (secondary light source image Im2) viewed from the Y-axis direction, and FIG. 8(B) is a view of the light source image (secondary light source image) viewed from the X-axis direction. The front view of the beam of Im2), and Fig. 9 is a view of the light source image Im1 (secondary light source image Im2) viewed from the illumination area IR.

In the optical integrator 22 of FIG. 8, for example, the dimension in the short-side direction (X-axis direction) is about 2.5 mm, and the dimension in the longitudinal direction (Y-axis direction) is about 250 mm, which is perpendicular to the short-side direction and the long-side direction. The dimension (in the Z-axis direction) is about 125 mm. The diffusion angle (angle characteristic) of the illumination light L1 when entering the optical integrator 22 is substantially the same as the diffusion angle of the illumination light L1 when it is emitted from the magnification optical system 21, and is, for example, about 0.014 in terms of NA conversion value.

Under this condition, the illumination light L1, as viewed from the Y-axis direction as shown in FIG. 8(A), includes the light beam having the number of reflections of the inner surface 36 of the light integrator 22 of 0 times, the beam of the first order, and the second time. The beams, which are superposed at the exit end 38.

The NA conversion value (the NA conversion value in the X-axis direction) of the illumination light L1 in the short-side direction of the emission end 38 is substantially the same as that when it is incident on the incident end 35 from the emission end 38, and is, for example, about 0.04. In addition, the NA conversion value (the NA conversion value in the Y-axis direction) of the illumination light L1 in the longitudinal direction of the emission end 38 is substantially the same as that when it is incident on the incident end 35 from the emission end 38, and is, for example, about 0.04. As described above, in the example of FIG. 8, the illumination light L1 when being emitted from the optical integrator 22 The diffusion angle is isotropic in the longitudinal direction and the short-side direction, and the diffusion angle of the illumination light L1 when entering the imaging optical system 23 is isotropic in the longitudinal direction and the short-side direction.

The diffusion angle of the illumination light L1 when entering the imaging optical system 23 is anisotropy around the Z-axis, and the magnification of the imaging optical system 23 in the X-axis direction (short-side direction) is set to, for example, equal magnification. The imaging optical system 23 described above can be realized by, for example, making the focal lengths of a pair of cylindrical lenses substantially the same in the XZ plane (for example, about 15 mm).

The diffusion angle (the NA conversion value in the X-axis direction) of the illumination light L1 when emitted from the imaging optical system 23 is equal to the magnification of the imaging optical system 23, and therefore the illumination when entering the imaging optical system 23 The diffusion angle of the short side of the light L1 (the NA conversion value in the X-axis direction) is substantially the same.

Since the diffusion angle (the NA conversion value in the Y-axis direction) of the illumination light L1 emitted from the imaging optical system 23 in the longitudinal direction is small, the imaging optical system 23 has no refractive index in the YZ plane, and thus enters the imaging optical system. At 23 o'clock, the diffusion angle of the illumination light L1 in the longitudinal direction (the NA conversion value in the Y-axis direction) is substantially the same.

As described above, by making the diffusion angle of the illumination light L1 emitted from the imaging optical system 23 isotropic, the diffusion angle of the illumination light L1 when entering the illumination region IR can be made isotropic. Therefore, in the exposure apparatus EX, it is easy to make the line width of the exposure pattern coincide with the longitudinal direction (X-axis direction) and the longitudinal direction (Y-axis direction).

Next, the illuminance distribution of the illumination area IR will be described. In the following description, the incident region into which the illumination light L1 of one of the plurality of light source images Im1 formed from the light source unit 20 in the illumination region IR is incident is appropriately referred to as a partial illumination region. As shown in FIG. 8(B), the partial illumination area IRa is defined as illumination light L1 from one of a plurality of secondary light source images Im2 in the magnification optical system 21. The incident area of the incident can also be. Here, the partial illumination region IRa corresponds to a partial region on the conjugate surface 23a (illumination region IR) into which the illumination light L1 emitted from the end 26 of the one optical fiber 25 shown in FIG. 5 is incident.

The aperture member 31 (see FIGS. 5 and 7) of the magnification optical system 21 is disposed at a position optically conjugate with the end 26 of the exit side of the optical fiber 25, and the opening 31a of the aperture member 31 is substantially circular, and thus the illumination light L1 The light intensity distribution is considered to be a Gaussian distribution at a diffusion angle corresponding to an NA conversion value of 0.04. Therefore, a light beam from a point of the aperture member 31 (opening 31a) forms a Gaussian distribution illuminance distribution at the focal plane of the lens 30, for example, a spot diameter ( 2) Diffusion in the range of about 1.5 mm. Further, the focal plane of the lens 30 is at the same position as the incident end 35 of the optical integrator 22, and the size of the short side direction of the incident end 35 (here, about 2.5 mm) is a spot diameter ( 2 = 1.5 mm or more, the "halo" at the incident end 35 can be suppressed.

The illumination light L1 that has passed through one of the modules 27 is emitted from the light source unit 20, and as shown in FIG. 8(a), the illuminance distribution in the short side direction of the exit end 38 is reflected by multiple reflections on the inner surface 36 of the optical integrator 22. Become uniform. Here, the illumination light L1 diffused in the short-side direction of the exit end 38 includes the number of reflections of the light beam having the number of times of reflection on the inner surface 36, the inner surface 36 on the +X side, or the inner surface 36 on the -X side. The first-order beam, the inner surface 36 on the +X side, or the inner surface 36 on the -X side has a beam of light of two times, and the five beams overlap at the exit end 38.

The light beam reflected on the inner surface 36 corresponds to the light beam from the virtual image Im3 of the light source image Im1, and the light beam incident on each point of the exit end 38 corresponds to the light beam from the real image of the light source image Im1 and the four virtual images Im3 formed from the inner surface 36. The beam after the beam is overlapped. Therefore, as shown in FIG. 9, the light source unit 20 side is observed from one point of the illumination area IR, and five light source images Im1 (real image or virtual image) are arranged in the X-axis direction.

Further, in the example of Fig. 9, the light source image Im1 on the Y-axis is a real image, and the other light source image Im1 is a virtual image Im3. Further, in Fig. 8(A), the virtual image Im3 is shown in a schematic manner, but the virtual image Im3 is disposed, for example, on the same plane as the secondary light source image Im2 or on the side opposite to the secondary light source image Im2 (to the end side of the exit side of the optical fiber 25). 26 identical faces).

Further, the illumination light L1 that has passed through one module 27 from the light source unit 20 passes through the inside of the optical integrator 22 while being diffused in the longitudinal direction of the incident end 35 as shown in FIG. 8(b), and is partially illuminated. Regional IRA. The partial illumination region IRa is, for example, a substantially short rectangular region having a long side in the Y-axis direction, and is formed in a one-to-one correspondence with the real image of the light source image Im1 formed by the light source portion 20. That is, the partial illumination area IRa is formed in a one-to-one correspondence with the secondary light source image Im2 formed by each of the modules 27 of the magnifying optical system 21.

Fig. 10 is a diagram for explaining the illuminance distribution. Specifically, FIG. 10(A) is a graph showing the illuminance distribution B1 of the illumination area IR (partial illumination area IRa) of each module 27, the horizontal axis shows the position in the short side direction, and the vertical axis shows the relative value of the illuminance. . Fig. 10(B) is a graph showing the illuminance distribution B2 of the illumination region IR of the plurality of partial illumination regions IRa, the horizontal axis showing the position in the longitudinal direction, and the vertical axis showing the short side direction at each position in the longitudinal direction. The relative value of the illuminance averaged value.

As shown in FIG. 10(A), the illuminance distribution B1 of each partial illumination area IRa is a Gaussian distribution. In the illumination area IR, the partial illumination areas IRa are arranged in the Y-axis direction so as to overlap the adjacent partial illumination areas IRa. As shown in FIG. 10(B), the illuminance distribution B2 of the illumination area IR is a distribution in which the illuminance distribution B1 of the partial illumination area IRa is shifted in the Y-axis direction. Therefore, the illuminance distribution B2 of the illumination region IR is a so-called top-heart type distribution by arranging the partial illumination regions IRa at a predetermined pitch, and is substantially uniform except for the end portions in the Y-axis direction. Illumination.

The distance between the Y-axis directions of the partial illumination regions IRa corresponds to the distance between the Y-axis directions (the distance between the centers of the ends 26) of the light source image Im1 (the end 26 on the emission side of the optical fiber 25) formed by the light source portion 20. The distance between the Y-axis directions of the partial illumination regions IRa is the distance from the center position of the partial illumination region IRa to the center position of the adjacent partial illumination region IRa (inter-center distance), and the distance between other elements can be similarly defined.

The distance between the Y-axis directions of the plurality of light source images Im1 formed by the light source unit 20 is set such that the illuminance distribution in the Y-axis direction of the conjugate plane 23a (illumination region IR) becomes uniform. The distance between the Y-axis directions of the end 26 of the exit side of the optical fiber 25, the lens 28, the lens 29, and the lens 30 is, for example, 3 mm.

Further, in order to form the illumination region IR of a desired size, the module 27 of the optical fiber 25 and the magnifying optical system 21 may be arranged at a predetermined pitch in the Y-axis direction in a number corresponding to the size of the illumination region IR in the Y-axis direction.

In the illuminating device IU, since the cylindrical lens of the imaging optical system 23 has almost no refractive power on the YZ plane, the illumination light L1 is diffused outward from the end of the optical integrator 22 in the Y-axis direction by, for example, about 14 mm. The area irradiated by the illumination light L1 diffused to the outside of the optical integrator 22 may be uneven in illumination distribution with other areas, and may not be used as the illumination area IR.

In the example of Fig. 8(B), the light beam incident on one of the illumination regions IR is a light beam from which the light beams of the five modules 27 arranged in the Y-axis direction overlap. Therefore, as shown in FIG. 9, when the light source unit 20 side is viewed from one of the illumination areas IR, the five light source images Im1 are arranged in the Y-axis direction. Each point in the region other than the end portion in the Y-axis direction in the illumination region IR corresponds to the X-axis side A beam of light beams of five light sources arranged in five rows in the five rows and the Y-axis direction, like Im1, is incident.

In the present embodiment, the illuminance distribution in the short-side direction of the illumination region IR is uniformized by multiple reflections on the inner surface 36 of the optical integrator 22, and the illuminance distribution in the longitudinal direction of the illumination region IR is obtained from a plurality of light sources. The beam like Im1 is evenly overlapped and overlapped. In the illumination device IU, by appropriately adjusting the number of partial illumination regions IRa arranged in a predetermined direction, the illumination region IR can be made to have a desired length in a predetermined direction while illuminating the illumination region IR with uniform brightness.

In the present embodiment, since the exposure device EX can make the illumination region IR in the direction orthogonal to the scanning direction a desired length, the processing range of the exposure processing can be expanded. As a result, the exposure apparatus EX can efficiently process a large substrate or the like for manufacturing a large component.

(Second embodiment)

Next, a second embodiment will be described. In the embodiment, the same components as those in the above-described embodiments are denoted by the same reference numerals, and the description thereof will be simplified or omitted.

Fig. 11 is a side view showing the exposure apparatus EX of the embodiment. The exposure apparatus EX of Fig. 11 is provided with a substrate stage ST instead of the rotary cylinder DP shown in Fig. 2 . The substrate stage ST is a substrate supporting member that supports the substrate P, and supports the substrate P in a planar shape in the exposure region PR. The substrate stage ST supports, for example, the back surface of the substrate P in a non-contact manner by a layer of the air bearing.

In the exposure apparatus EX, the diaphragm member 40 is provided in the optical path between the rotating cylinder DM (mask pattern M) and the substrate stage ST (substrate P). The aperture member 40 is a so-called field-of-view aperture, and defines an incident range of light on the substrate P by specifying a range in which light passing through the mask pattern M (exposure light) is emitted from the illumination device IU. The exposure apparatus EX can specify the range of the exposure region PR with high precision by the diaphragm member 40, but the diaphragm member 40 may not be provided.

Figure 12 (A) shows a side view of the illumination device IU, Figure 12 (B) shows a lighting device The IU front view, Fig. 13 shows a top view of the diaphragm member 31.

In the illumination device IU of FIG. 12, the amplification optical system 21 enlarges the illumination light L1 in the short-side direction (X-axis direction) by a magnification larger than the magnification of the illumination optical system 21 in the longitudinal direction (Y-axis direction). In the amplifying optical system 21, for example, the lens 28 is constituted by a spherical lens, and the lens 29 is constituted by a cylindrical lens and a spherical lens. However, the lens 29 may be constituted by a toric lens.

Since the magnification of the magnifying optical system 21 is different from the Y-axis direction in the X-axis direction, the end 26 of the optical fiber 25 is substantially circular, and the image formed by the magnifying optical system 21 (the secondary light source image Im2 of FIG. 13) has The short axis parallel to the X-axis direction and the long axis parallel to the Y-axis direction are elliptical. If the diameter of the end 26 of the optical fiber 25 is 1. The magnifying optical system 21 magnifies the illumination light L1 in the X-axis direction by the magnification M1x, and the magnification optical system 21 enlarges the illumination light L1 in the Y-axis direction by the magnification M1y, and the minor axis of the secondary light source image Im2 becomes M1x× 1, the secondary light source like the long axis of Im2 becomes M1y × 1. For example, the diameter of the end 26 of the fiber 25 ( 1) is 0.3 mm, M1x is 3 times, and M1y is 5 times. The short axis of the secondary light source like Im2 is 0.9 mm, and the long axis of the secondary light source like Im2 is 1.5 mm.

The aperture member 31 shown in FIG. 13 is provided at a position where the surface of the secondary light source image Im2 (the pupil plane 41) is formed by the magnification optical system 21 or in the vicinity thereof. The aperture member 31 is a so-called aperture stop and has, for example, an elliptical opening 31a substantially similar to the secondary light source image Im2. For example, the direction of the short axis is set to be substantially the same as the secondary light source image Im2, and the direction of the long axis is set to be substantially the same as the secondary light source image Im2. Here, the opening 31a is formed to have substantially the same size as the secondary light source image Im2. Further, in the aperture member 31, the opening 31a may be smaller than the secondary light source image Im2, and may be omitted.

The illumination light L1 from the secondary light source image Im2 passes through the lens of the amplifying optical system 21 30 is incident on the incident end 35 of the optical integrator 22. The diffusion angle (angle characteristic) of the illumination light L1 when incident on the incident end 35 depends on the shape of the secondary light source image Im2 or the shape of the aperture member 31. Since the dimension (short axis) of the secondary light source image in the X-axis direction of Im2 is smaller than the dimension (long axis) of the Y-axis direction, the diffusion angle of the illumination light L1 of the light integrator 22 becomes the X-axis diffusion angle smaller than the Y-axis. The angle of spread of the direction. That is, the magnifying optical system 21 (also referred to as a collecting optics) is set such that the angle of light toward the incident end 35 of the optical integrator 22 in the longitudinal direction (Y direction) of the incident end 35 is on the short side. The angular characteristics of the direction (X direction) are different. For example, in the optical integrator 22, the NA conversion value of the illumination light L1 in the X-axis direction is about 0.024, and the NA conversion value of the illumination light L1 in the Y-axis direction is about 0.04.

In the optical integrator 22, the illumination light L1 (see FIG. 12(A)) diffused in the short side direction of the incident end 35 is reflected by the inner surface 36 and guided to the exit end 38 by the multiple reflection of the inner surface 36. The illumination at the exit end 38 is uniformized. The diffusion angle of the illumination light L1 when emitted from the exit end 38 is substantially the same as that when incident on the incident end 35, and the NA conversion value is, for example, 0.024.

In addition, the position of the incident end 35 of the optical integrator 22 may not coincide with the position at which the image of the end 26 of the optical fiber 25 is imaged. For example, it may be shifted in a predetermined range in a direction parallel to the optical axis of the lens 30 of the magnifying optical system 21. .

Further, at least a part of the illumination light L1 (see FIG. 12(B)) diffused in the longitudinal direction of the incident end 35 is not incident on the inner surface 37, and is emitted from the emission end 38 through the inside of the optical integrator 22. The diffusion angle of the illumination light L1 when emitted from the exit end 38 is substantially the same as that when incident on the incident end 35, and the NA conversion value is, for example, 0.04.

The imaging optical system 23 of Fig. 12 reduces the image of the exit end 38 of the optical integrator 22 in the short-side direction (X-axis direction) to form a conjugate plane 23a (illumination area IR). Magnification M2x of the imaging optical system 23 in the X-axis direction, if the magnification optical system 21 is used to amplify the illumination light L1 in the X-axis direction When the magnification of the illumination light L1 in the Y-axis direction by the M1x and the magnification optical system 21 is M1y, it is M1x/M1y times. For example, when M1x is 3 times and M1y is 5 times, the magnification of the imaging optical system 23 in the X-axis direction is set to 0.6 times. Therefore, the NA conversion value of the short-side direction of the light beam incident on each point of the illumination area IR is 1/(M1x/M1y) times larger than when it is emitted from the optical integrator 22. For example, the NA conversion value of the short-side direction of the light beam incident on each point of the illumination area IR is 0.024/0.6, which is approximately the same as the NA conversion value of the long-side direction of the light beam incident on each point of the illumination area IR (0.04). ).

In the present embodiment, the imaging optical system 23 reduces the image of the exit end 38 of the optical integrator 22 in the short-side direction. Therefore, the width of the conjugate surface 23a is narrowed with respect to the width (the size in the X-axis direction) of the optical integrator 22. . For example, when the exposure device EX of the reticle pattern M that is bent into a cylindrical shape is used, if the width of the conjugate surface 23a is reduced, the variation between the shape of the reticle pattern M and the shape of the conjugate surface 23a can be reduced, and the variation can be reduced. The amount of defocus of the reticle pattern M. Further, the width of the optical integrator 22 can be increased as compared with the width of the illumination region IR, and the intensity of the optical integrator 22 can be easily ensured. Therefore, for example, it is easy to extend the optical integrator 22 in the Y-axis direction, and it is easy to extend the illumination region IR in the Y-axis direction.

Further, in the illuminating device IU of the present embodiment, as described in the first embodiment, the illuminance distribution of the illumination region IR is uniformized in each of the longitudinal direction and the short-side direction, and the illumination region IR can be set to a desired length in a predetermined direction while Illuminate with uniform brightness.

(Third embodiment)

Next, a third embodiment will be described. In the embodiment, the same components as those in the above-described embodiments are denoted by the same reference numerals, and the description thereof will be simplified or omitted.

Figure 14 is a side view showing the exposure apparatus EX of the present embodiment, Figure 15 A top view of the illumination device IU is displayed. The illumination device IU of FIG. 14 includes a first optical system 45, a second optical system 46, and an imaging optical system 23. The first optical system 45 and the second optical system 46 respectively emit the illumination light L1, and the illumination light L1 from the first optical system 45 and the second optical system 46 is incident on the illumination region IR through the imaging optical system 23.

The first optical system 45 includes a light source unit 20a (first light guide unit), an amplification optical system 21a, and an optical integrator 22a (first optical integrator). The light source unit 20a and the magnifying optical system 21a may have the same configuration as that of the first embodiment, for example. The illumination light L1 emitted from the light source unit 20a is transmitted through the amplification optical system 21a to the incident end 35a of the optical integrator 22. The nitrate material constituting each of the optical elements of the light source unit 20a, the amplification optical system 21a, and the optical integrator 22a may be, for example, quartz.

The optical integrator 22a of Fig. 14 is a frustum-shaped member, and the side surface viewed from the Y-axis direction is substantially trapezoidal. The optical integrator 22 has a first surface 47a substantially parallel to the YZ plane, a second surface 47b that is non-perpendicular (for example, about 45°) with respect to the first surface 47a, and a third surface 47c that is substantially parallel to the first surface 47a, And a fourth surface 47d that is substantially perpendicular to the first surface 47a.

The optical integrator 22a is arranged such that the illumination light L1 from the light source unit 20a enters one of the first surfaces 47a, and at least a part of the incident region of the illumination light L1 from the light source unit 20a includes the incident end 35a. The incident end 35a includes at least a part of a portion overlapping the second surface 47b as viewed from the normal direction of the first surface 47a. In the optical integrator 22a of Fig. 14, the longitudinal direction of the incident end 35a is substantially parallel to the Y-axis direction, and the short-side direction of the incident end 35a is substantially parallel to the Z-axis direction.

The illumination light L1 incident on the incident end 35a is reflected by the second surface 47b and then bent in the traveling direction, and is reflected by the inner surface corresponding to the first surface 47a and the third surface 47c, and guided to the fourth surface 47d. The fourth surface 47d includes an exit end 38, and the illumination light L1 that has passed through the inside of the optical integrator 22a is emitted from the exit end 38a. In the optical integrator 22a of Fig. 14, the longitudinal direction of the exit end 38a is substantially flat with the Y-axis direction. In the row, the short side direction of the exit end 38a is substantially parallel to the X-axis direction.

The second optical system 46 has the same configuration as the first optical system 45, and is disposed symmetrically with the first optical system 45 on the YZ plane when viewed in the Y-axis direction. The second optical system 46 includes the light source unit 20b (second light guide unit), the magnifying optical system 21b, and the optical integrator 22b (second optical integrator). However, the description common to the first optical system 45 is simplified or omitted.

The optical integrator 22a and the optical integrator 22b are arranged adjacent to each other in the short-side direction (X-axis direction) of the exit end 38a (exit end 38b), and the third surface 47c is joined to each other. The optical integrator 22a and the optical integrator 22b are bonded by, for example, an adhesive having a refractive index of 1.46 or less, and the illumination light L1 is substantially totally reflected on the inner surface corresponding to each of the third surfaces 47c.

As shown in Fig. 15, in the light source unit 20a of the first optical system 45, the end 26a on the exit side of the optical fiber 25a is arranged at a substantially constant distance Py in the longitudinal direction (Y-axis direction) of the incident end 35a. Further, in the light source unit 20b of the second optical system 46, the end 26b on the exit side of the optical fiber 25b is arranged at a substantially constant distance Py in the longitudinal direction (Y-axis direction) of the incident end 35b.

When the end 26a of the optical fiber 25a of the first optical system 45 is viewed from the normal direction (X-axis direction) of the incident end 35a (incident end 35b), it is disposed so as to be adjacent to the end 26b of the optical fiber 25b of the second optical system 46. The positions in the Y-axis direction do not overlap. The end 26a of the optical fiber 25a of the first optical system 45 and the end 26b of the optical fiber 25b of the second optical system 46 are arranged to be aligned with each other as viewed in the Y-axis direction, and one end of the end 26a is displaced from the adjacent end 26b in the Y-axis direction. One half of Py (the distance between ends 26b is Py) is 26a. That is, the offset Δy of the position of one of the ends 26a adjacent to the end 26b in the Y-axis direction is substantially the same as one half (Py/2) of the pitch Py.

In the light source unit 20a, a light source image Im1a is formed in each of the ends 26a of the plurality of optical fibers 25a, and a light source image Im1b is formed in each of the ends 26b of the plurality of optical fibers 25b in the light source unit 20b. Therefore, the plurality of light source images Im1a of the light source unit 20a are formed so as not to overlap the positions of the plurality of light source images Im1b of the light source unit 20b in the longitudinal direction (Y-axis direction) of the incident end 35a (incident end 35b).

The illumination light L1 from the light source unit 20a shown in Fig. 14 is uniformly distributed on the emission end 38a in the short-side direction of the emission end 38a by multiple reflection on the inner surface of the optical integrator 22. Further, the illumination light L1 from the light source unit 20b is uniformized in the short-side direction of the emission end 38b by the multiple reflection on the inner surface of the optical integrator 22, and is equalized at the emission end 38b. The imaging optical system 23 forms a conjugate surface 23a conjugated with the surface including the exit end 38a of the optical integrator 22a and the exit end 38b of the optical integrator 22b in the short side direction of the exit end 38a (the output end 38b). Therefore, in the conjugate surface 23a (illumination region IR), the illuminance distribution of the illumination light L1 is uniform in the direction corresponding to the short side direction of the emission end 38a (the emission end 38b).

Further, as illustrated in Fig. 8, the light beam from each of the light source images Im1a formed by the light source unit 20a is transmitted while being diffused in the Y-axis direction inside the optical integrator 22a, and is incident on the partial illumination region IRa. The partial illumination area IRa is arranged in the Y-axis direction such that one of the Y-axis directions overlaps with the adjacent partial illumination area IRa. As described above, the plurality of light beams from the plurality of light source images Im1a are shifted in the Y-axis direction in the illumination region IR, whereby the illuminance distribution in the Y-axis direction of the illumination region IR is uniform. The illumination light L1 from the second optical system 46 is also transmitted in the same manner, and the illuminance distribution in the Y-axis direction of the illumination region IR is uniform.

Next, the diffusion angle of the light beam incident on each point of the illumination area IR will be described. As described with reference to Fig. 9 (Fig. 8), the light beam incident on each point of the illumination region IR corresponds to a light beam obtained by superimposing a light beam from a real image or a virtual image of the light source image arranged in the X-axis direction and the Y-axis direction. Therefore, the diffusion angle of the light beam incident on each point of the illumination area IR is determined by the distribution of the real image and the virtual image of the light source image Im1 when the light source unit 20 side is observed from each point.

Fig. 16 is a view for explaining the illumination method of the embodiment. Fig. 16(A) is a view showing the positional relationship between the point Q1 of the illumination region IR and the position of the point Q2 and the position of the light source image Im1 in the Y-axis direction when viewed from the normal direction of the illumination region IR. The point Q1 and the point Q2 are points arranged in the short side direction (X-axis direction) of the exit end 38a of the optical integrator 22a. Here, the position (coordinate) in the Y-axis direction is substantially the center of the light source image Im1a of the light source unit 20a. the same.

The diffusion angle of the illumination light L1 when emitted from the optical fiber 25a of the light source unit 20a, for example, at the diameter of the optical fiber 25a ( 1) In the case of about 0.3 mm, the NA conversion value is 0.2. For example, when the magnification (M1x) of the magnification optical system 21 in the X-axis direction is five times, and the magnification (M1y) of the amplification optical system 21 in the Y-axis direction is five times, the secondary light source image Im2 formed by the amplification optical system 21 becomes Point diameter 2) A round shape of about 1.5 mm. The illumination light L1 from the secondary light source image Im2 enters the optical integrator 22a in the X-axis direction (in the XZ plane) with an NA conversion value of 0.04, and the Y-axis direction (in the YZ plane) has an NA conversion value of 0.04. degree.

Fig. 16(B) is a view showing the distribution of the real image and the virtual image of the light source image Im1a when the light source unit 20a is observed from the point Q1 on the illumination area IR, and Fig. 16(C) shows the light source viewed from the point Q2 on the illumination area IR. The distribution of the real image and the virtual image of the light source image Im1b at the portion 20b.

The distribution of the real image and the virtual image of the light source image Im1 in the X-axis direction when viewed from the illumination region IR is determined by the number of reflections of the illumination light L1 on the inner surface 36 of the optical integrator 22 (see FIG. 8). The number of reflections of the illumination light L1 on the inner surface 36 depends on the diffusion angle of the illumination light L1 in the X-axis direction when entering the light integrator 22, the interval between the two inner surfaces 36 in the X-axis direction, and the Z of the optical integrator 22. The size of the axis direction, etc.

Here, if the diameter of the optical fiber 25 is set to 1. The magnification of the XZ plane from the end 26 of the optical fiber 25 to the surface (the pupil plane) of the secondary light source image Im2 in the magnifying optical system 21 is β 1 , and the focal length of the XZ plane of the lens 30 of the magnifying optical system 21 is f3 When the magnification of the XZ plane of the imaging optical system 23 is β 2 , the diffusion angle of the light beam entering the illumination region IR (for example, the point Q1 and the point Q2) in the X-axis direction is converted to NA (NAx) as follows The formula (1) is shown.

In formula (1), for example, if the diameter of the fiber 25 ( 1) is 0.3 mm, the magnification (β 1) in the X-axis direction of the magnifying optical system 21 is 5 times, the focal length (f3) of the lens 30 of the magnifying optical system 21 is 18.75 mm, and the magnification of the X-axis direction of the imaging optical system 23 is 5 When (β 2) is 1 time, NAx becomes 0.04.

Further, the distribution of the real image and the virtual image of the light source image Im1 in the Y-axis direction when viewed from the illumination region IR is the position of the light source image Im1 (the end 26 of the optical fiber 25) formed by the light source unit 20 in the Y-axis direction, and the incident light integral. The divergence angle of the illumination light L1 at the time of the device 22, the size of the optical integrator 22 in the Z-axis direction, and the like are determined. Here, when the distance between the Y-axis directions of the light source image Im1 formed by the light source unit 20 is Py, the NA conversion value of the illumination light L1 when emitted from the optical fiber 25 in the Y-axis direction is NAy0, and from the end 26 of the optical fiber 25 to The magnification of the YZ plane of the surface (the pupil plane) of the secondary optical source image forming the secondary light source image 21 is β 3 , the focal length of the YZ plane of the lens 30 of the amplification optical system 21 is f4, and the incident end 35 of the optical integrator 22 When the optical path length to the illumination region IR is Lz, the NA conversion value (NAy1) in the Y-axis direction of the light beam entering the point Q1 on the illumination region IR from the first optical system 45 (light source portion 20a) is expressed by the following formula (2). Shown.

NAy1=(Py×2+NAy0/β 3×f4)/Lz...(2)

In the formula (2), when the distance (Py) between the ends 26 of the optical fibers 25 is 3 mm, the NA converted value (NAy0) of the illumination light L1 when emitted from the end 26 of the optical fiber is 0.2, and the Y-axis direction of the optical system 21 is enlarged. The magnification (β 3 ) is 5 times, the focal length (f4) of the lens 30 of the magnifying optical system 21 is 18.75 mm, and the optical path length (Lz) from the incident end 35 of the optical integrator 22 to the illumination region IR is 187.5 mm, then NAy1 It becomes 0.036 and has a different value from NAx (0.04).

As described above, since the light beam entering each point on the illumination region IR has a predetermined diffusion angle which is different from the Y-axis direction in the X-axis direction, the diffusion angle can be different from the Y-axis direction in the X-axis direction. The anisotropy of the diffusion angle can be appropriately allowed depending on the use of the illumination device IU, etc. However, in the present embodiment, as shown in Fig. 15, the light source unit 20a and the light source unit 20b position the light source image Im1a and the light source image Im1b in the Y-axis direction. The light is shifted so that the spread angle of the light beam incident on each point on the illumination region IR is isotropic in the X-axis direction and the Y-axis direction.

Specifically, as shown in FIGS. 16(B) and 16(C), the real image and the virtual image of the light source image when the light source unit 20b is viewed from the point Q2 and the real image and the virtual image of the light source image when the light source unit 20a is viewed from the point Q1 are observed. The position in the Y-axis direction is staggered. Here, since the light source image Im1a of the light source unit 20a and the light source image Im1b of the light source unit 20b are shifted by one-half of the pitch Py in the Y-axis direction, the positions of the real image and the virtual image of the light source image Im1 observed from the illumination area IR are also on the Y-axis. The direction is staggered by one half of the distance (Py) between the sources of Im1 in the Y-axis direction. Therefore, the NA conversion value (NAy2) in the Y-axis direction of the light beam incident from the point Q2 on the illumination region IR from the second optical system 46 (light source portion 20b) is as shown in the following formula (3).

NAy2=(Py×2+Py×0.5)/Lz...(3)

In the equation (3), if the pitch (Py) is 3 mm and the optical path length (Lz) from the incident end 35 of the optical integrator 22 to the illumination region IR is 187.5 mm, NAy2 becomes 0.04. Here, the point on the substrate P is illuminated by the light beam from the first optical system 45 at the position of the point Q1, and the NAy of the light beam is 0.036. Further, at this point on the substrate P, the substrate P is moved in the X-axis direction, and the light beam from the second optical system 46 is illuminated at the position of the point Q2, and the NAy1 of the light beam is 0.04. Therefore, the maximum value of the diffusion angle of the light beam incident on the substrate P at the Y-axis direction is NA of 0.04. It is approximately the same as the NA conversion value (NAx=0.04) in the X-axis direction.

Further, as the point Q2, the position (coordinate) in the Y-axis direction is substantially the same as the center of the light source image Im1b of the light source unit 20b, and the point where the position in the X-axis direction is shifted from the point Q2 is Q1. In this case, the point on the substrate P is 0.04 in the Y-axis direction when the light beam from the first optical system 45 is illuminated at the point Q1, and is Y when the light beam from the second optical system 46 is illuminated at the point Q2. The NA conversion value in the axial direction is 0.036. Therefore, the maximum value of the diffusion angle of the light beam incident on the substrate P in the Y-axis direction is substantially equal to the NA conversion value (NAx=0.04) in the X-axis direction.

As described above, the shift amount (Δy) of the position of the plurality of light source images Im1a in the longitudinal direction of the light source unit 20a and the position of the plurality of light source images Im1b in the light source unit 20b in the longitudinal direction is set to be transmitted through the imaging optical system. The diffusion angle of the light beam incident on each point on the conjugate surface 23a is isotropic in the longitudinal direction and the short-side direction.

Fig. 17 is a graph showing an example of an illuminance distribution obtained by simulation based on the configuration of the illumination device IU of the present embodiment. Fig. 17(A) shows the illuminance distribution in the short-side direction, the vertical axis is the illuminance (the number of rays per unit area), and the horizontal axis is the position in the short-side direction (the X-axis direction). Fig. 17(B) shows the illuminance distribution in the longitudinal direction, and the vertical axis represents the integrated value of the illuminance in the short side direction at each position in the longitudinal direction, and the horizontal axis represents the position in the longitudinal direction (the Y-axis direction). As shown in Fig. 17, uniform illuminance is obtained in each of the short side direction and the long side direction.

Further, in the exposure apparatus EX, the exposure amount at each position on the substrate P in the Y-axis direction is an amount corresponding to the integrated value of the illuminance in the X-axis direction (scanning direction). Therefore, the illuminance distribution in the X-axis direction may be lower than the uniformity in the illuminance distribution in the Y-axis direction. Further, the illuminance distribution in the Y-axis direction is made uniform, and the deviation of the outputs of the plurality of solid-state light sources 24 may be reduced. For example, for The deviation of the illuminance distribution is stored within ±3%, and the deviation of the output of the plurality of solid-state light sources 24 may be stored within ±3%.

In order to make the output of the plurality of solid-state light sources 24 uniform, the power supplied to each of the solid-state light sources 24 may be adjusted. For example, the driving unit (drive circuit) of the solid-state light source 24 may be configured such that the solid-state light source 24 having a smaller output than the average output of the plurality of solid-state light sources 24 is supplied with power larger than the predetermined power.

Further, in order to make the output of the plurality of solid-state light sources 24 uniform, a filter for adjusting the amount of light from the solid-state light sources 24 may be used. For example, an optical filter that absorbs a portion of the light emitted from the solid-state light source 24 may be provided to the solid-state light source 24 of the plurality of solid-state light sources 24 that has an output greater than the average output. This filter can also be used to suppress variations in optical characteristics in a plurality of modules 27. With such a filter, the transmittance can be fixed or variable.

Next, the parallelism of the chief ray in the illumination region IR will be described. Further, with respect to the X-axis direction, even if the inclination of the chief ray with respect to the illumination area IR changes, it can be averaged by scanning exposure, so that the influence of the inclination change of the chief ray is small. The deviation of the inclination of the chief ray caused by the difference in image height in the Y-axis direction can be controlled to ±4 milliradians in the above numerical example. Further, when the NA conversion value of the light beam incident on each point of the illumination area IR is 0.03, and the line width of the exposure pattern is 10 μm, in order to control the line width error to be ±4% (±0.4 μm), it is only necessary to control the defocus amount at The range of ±13 μm is sufficient. Under this condition, the deviation of the inclination of the chief ray causes the positional shift amount in the Y-axis direction of the transfer pattern of the substrate P to be estimated to be about 0.05 μm. If the amount of positional shift is to this extent, an error of about 0.5% with respect to the line width of 10 μm has little effect on the exposure accuracy.

Further, the elements of the illumination device IU described in the present embodiment are used, and the illumination region IR of the illumination device IU is set to 5 mm in the X-axis direction (scanning direction) and 250 mm in the Y-axis direction (non-scanning direction). After the L1 is emitted from the solid-state light source 24 and the amount of light incident on the magnifying optical system 21 is 20%, and the illumination light L1 is incident on the magnifying optical system 21, and the amount of light emitted from the imaging optical system 23 is 20%, the illumination region IR is The illuminance is estimated to be 2112 mW/cm ² .

In the illuminating device IU, since the position of the light source image formed by the light source unit 20a and the light source unit 20b does not overlap in the Y-axis direction, the diffusion angle of the light beam incident on each point of the illumination area IR can be made to be equal. Sex. Further, in the case where the light source portion is one, the distance between the light source images when viewed from the short side direction of the exit end 38 of the optical integrator 22 can be narrowed, and the uniformity of the distribution of the exposure amount in the Y-axis direction can be improved. . Further, for example, it is possible to maintain the distance between the light source images when viewed from the short side direction of the exit end 38 of the optical integrator 22 and simultaneously enlarge the distance between the light source images formed by the respective light source sections. Thereby, for example, the miniaturization of the configuration of the light source portion and the like can be avoided.

Further, in the illumination device IU of FIG. 14, since the optical paths of the first optical system 45 and the second optical system 46 are bent in the direction intersecting (orthogonal) with the normal direction (Z-axis direction) of the illumination region IR, it is possible to The size of the device is reduced, for example, it is easily accommodated inside the rotary cylinder DM. In the illuminating device IU of Fig. 14, since the optical path is bent by the second surface 47b of the optical integrator 22, the number of components can be reduced, but a bending optical path such as a bending mirror different from the optical integrator 22 can be used.

(Fourth embodiment)

Next, a fourth embodiment will be described. In the embodiment, the same components as those in the above-described embodiments are denoted by the same reference numerals, and the description thereof will be simplified or omitted.

Fig. 18 is a side view showing the exposure apparatus EX of the embodiment. In the exposure apparatus EX of FIG. 18, the illumination apparatus IU irradiates the illumination light L1 of the optical system of the two systems of the first optical system 45 and the second optical system 46 described in the third embodiment through the imaging optical system 23 to Illumination area IR.

The first optical system 45 includes a light source unit 20a, an amplification optical system 21a that amplifies the illumination light L1 from the light source unit 20a, and an optical integrator 49a (optical integrator 22). The magnification of the magnifying optical system 21a is as described in the second embodiment, and the magnification in the longitudinal direction (Y-axis direction) of the incident end 35a of the optical integrator 49a is larger than the short-side direction (X-axis direction) perpendicular to the longitudinal direction. The rate of magnification. The illumination light L1 from the magnifying optical system 21a enters the incident end 35a of the optical integrator 49a and passes through the inside of the optical integrator 49a, and the illuminance distribution in the short-side direction of the exit end 38a is uniformized at the exit end 38a.

The optical integrator 22a shown in Fig. 14 is configured to bend the optical path of the illumination light L1 from the magnifying optical system 21a once, but the optical integrator 249a of Fig. 18 is configured to illuminate the illumination light L1 from the magnifying optical system 21a. The light path is bent twice. The optical integrator 22a of Fig. 18 is constructed using two optical integrators 22a of Fig. 14 and the optical integrators 22a are orthogonally connected to each other. As described above, the optical integrator 22 may bend the optical path of the illumination light L1 once, twice, or more times, and may not bend the optical path of the illumination light L1 as in the optical integrator 22 of FIG.

The second optical system 46 is configured similarly to the first optical system 45, and includes a light source unit 20b, an amplification optical system 21b, and an optical integrator 49b (optical integrator 22). The illumination light L1 from the light source unit 20b is amplified by the amplification optical system 21b, and is incident on the incident end 35b of the optical integrator 49b, and the illuminance distribution in the short-side direction of the emission end 38b is equalized at the emission end 38b.

The imaging optical system 23 includes the short side of the image including the exit end 38a of the optical integrator 49a and the exit end 38b of the optical integrator 49b to the longitudinal direction (Y-axis direction) of the exit end 38a (the exit end 38b). The direction (X-axis direction) is reduced to form a conjugate surface 23a (illumination area IR). The magnification of the magnification optical system 21a in the X-axis direction and the magnification in the Y-axis direction and the magnification of the imaging optical system 23 in the X-axis direction are set as illumination light emitted from the imaging optical system 23 as described in the second embodiment. The diffusion angle of L1 becomes isotropic.

Figure 19 is a diagram for explaining a lighting method. Fig. 19(A) is a view showing the positional relationship between the position of the point Q1 and the point Q2 of the illumination region IR to be referred to and the Y-axis direction of the light source image Im1 when viewed from the normal direction of the illumination region IR. The point Q1 and the point Q2 are points arranged in the short side direction (X-axis direction) of the exit end 38 of the optical integrator 22. Here, the position (coordinate) in the Y-axis direction is substantially the center of the light source image Im1a of the light source unit 20a. the same. Further, the amount of shift (Δy) between the position of the light source image of the light source unit 20a in the Y-axis direction and the position of the light source image Im1b of the light source unit 20b in the Y-axis direction is the distance Py between the light source image Im1b (light source image Im1a). About half (Py/2).

Fig. 19(B) is a view showing the distribution of the real image and the virtual image of the light source image Im1a when the light source unit 20a is observed from the point Q1 on the illumination area IR, and Fig. 19(C) shows the light source viewed from the point Q2 on the illumination area IR. The distribution of the real image and the virtual image of the light source image Im1b at the portion 20b. In the example of Fig. 19(B), the optical path length (described later) of the optical integrator 49a from the incident end 35a to the output end 38a is different from that of the example of Fig. 9, and the light source image Im1a is seven rows in the X-axis direction and seven columns in the Y-axis direction. arrangement. Further, as shown in Fig. 19(C), the distribution of the light source image Im1b of the light source unit 20b is such that the distribution of the light source image Im1a of the light source unit 20a is shifted by one-half of the pitch Py in the Y-axis direction.

The NA conversion value (NAx) in the X-axis direction of the light beam incident on each point of the illumination region IR (for example, the point Q1 and the point Q2) is as shown in the formula (1) described in the third embodiment. In formula (1), for example, if the diameter of the fiber 25 ( 1) is 0.3 mm, the magnification (β 1) in the X-axis direction of the magnifying optical system 21 is 3 times, the focal length (f3) of the lens 30 of the magnifying optical system 21 is 18.75 mm, and the magnification of the X-axis direction of the imaging optical system 23 is 3 When (β 2 ) is 0.6 times, NAx becomes 0.04.

In the first optical system 45, when the distance between the Y-axis directions of the light source image Im1 formed by the light source unit 20a is Py and the Y-axis direction of the illumination light L1 is emitted from the optical fiber 25a, The converted value is NAy0, the magnification of the YZ plane from the end 26a of the optical fiber 25a to the surface (the pupil plane) where the secondary light source image Im2 is formed in the magnifying optical system 21a is β 3 , and the YZ plane of the lens 30 of the optical system 21a is enlarged. When the focal length is f4 and the optical path length from the incident end 35a of the optical integrator 49a to the illumination region IR is Lz, the first optical system 45 (light source portion 20a) enters the Y-axis direction of the light beam at the point Q1 on the illumination region IR. The NA conversion value (NAy1) is as shown in the following formula (4).

NAy1=(Py×3+NAy0/β 3×f4)/Lz...(4)

In the equation (4), when the distance (Py) between the ends 26 of the optical fibers 25 is 3 mm, the NA converted value (NAy0) of the illumination light L1 when emitted from the end 26 of the optical fiber is 0.2, and the Y-axis direction of the optical system 21 is enlarged. The magnification (β 3 ) is 5 times, the focal length (f4) of the lens 30 of the magnifying optical system 21 is 18.75 mm, and the optical path length (Lz) from the incident end 35 of the optical integrator 22 to the illumination region IR is 262.5 mm, then NAy1 Become about 0.037.

The NA converted value (NAy2) in the Y-axis direction of the light beam incident from the second optical system 46 (light source portion 20b) at the point Q2 on the illumination region IR, and the distribution of the light source image Im1b and the light source image observed from the illumination region IR The distribution of Im1a is shifted in the Y-axis direction as shown in the following formula (5).

NAy2=(Py×3+Py×0.5)/Lz=0.04...(5)

Further, in the equation (3), since the number of light source images arranged in the Y-axis direction is five from the illumination region IR, the coefficient multiplied by the pitch Py is 5/2 (that is, 2.5). In the equation (5), the number of light source images arranged in the Y-axis direction is seven, and therefore the coefficient multiplied by the pitch Py is 7/2 (that is, 3.5).

In the equation (5), if the pitch (Py) is 3 mm and the optical path length (Lz) from the incident end 35a of the optical integrator 49a to the illumination region IR is 262.5 mm, NAy2 becomes 0.04. Here, the point on the substrate P is illuminated by the light beam from the first optical system 45 at the position of the point Q1, and the NAy of this light beam is 0.037. Moreover, this point on the substrate P is moved by the substrate P in the X-axis direction at the point. The position of Q2 is illuminated by a beam from the second optical system 46, and the NAy1 of this beam is 0.04. Therefore, the maximum value of the diffusion angle of the light beam incident on the substrate P in the Y-axis direction is substantially equal to the NA conversion value (NAx=0.04) in the X-axis direction.

As described above, the shift amount of the position of the plurality of light source images Im1a in the longitudinal direction of the light source unit 20a and the position of the plurality of light source images Im1b in the light source unit 20b in the longitudinal direction is set to be transmitted through the imaging optical system 23 in total. The divergence angle of the light beam at each point on the yoke surface 23a becomes isotropic in the longitudinal direction and the short side direction.

Fig. 20 is a graph showing an example of an illuminance distribution obtained by simulation based on the configuration of the illumination device IU of the present embodiment. Fig. 20(A) shows the illuminance distribution in the short-side direction, the vertical axis is the illuminance (the number of rays per unit area), and the horizontal axis is the position in the short-side direction (the X-axis direction). Fig. 20(B) shows the illuminance distribution in the longitudinal direction, and the vertical axis represents the integrated value of the illuminance in the short side direction at each position in the longitudinal direction, and the horizontal axis represents the position in the longitudinal direction (Y-axis direction). As shown in Fig. 20, uniform illumination is obtained in each of the short side direction and the long side direction.

Here, the parallelism of the chief rays in the illumination area IR will be described. Further, with respect to the X-axis direction, even if the inclination of the chief ray with respect to the illumination area IR is changed, it is averaged by scanning exposure, so that the influence of the inclination change of the chief ray is small. The deviation of the inclination of the chief ray caused by the difference in image height in the Y-axis direction is estimated to be accommodated at ±3 milliradians in the above numerical examples. Moreover, the diffusion angle of the light beam incident on each point of the illumination area IR is 0.03 in terms of NA, and the line width of the exposure pattern is 10 μm. In order to accommodate the line width error within ±4% (±0.4 μm), The defocus amount may be stored in a range of about ±13 μm. Under this condition, the deviation of the inclination of the chief ray causes the positional shift amount in the Y-axis direction of the transfer pattern of the substrate P to be estimated to be about 0.04 μm. If the positional offset is to this extent, the error is 0.4% relative to the line width of 10 μm. The effect of accuracy is small.

Further, the elements of the illumination device IU described in the present embodiment are used, and the illumination region IR of the illumination device IU is set to 5 mm in the X-axis direction (scanning direction) and 250 mm in the Y-axis direction (non-scanning direction). After the L1 is emitted from the solid-state light source 24 and the amount of light incident on the magnifying optical system 21 is 20%, and the illumination light L1 is incident on the magnifying optical system 21, and the amount of light emitted from the imaging optical system 23 is 20%, the illumination region IR is The illuminance is estimated to be 3520 mW/cm ² .

In the illuminating device IU, since the position of the light source image formed by the light source unit 20a and the light source unit 20b does not overlap in the Y-axis direction, the diffusion angle of the light beam incident on each point of the illumination area IR can be made to be equal. Sex.

However, the illumination region IR is elongated in the Y-axis direction, and the optical integrator has a shape that is elongated in the Y-axis direction, and the strength may be insufficient. In the present embodiment, since the optical integrator 49a and the optical integrator 49b are bonded together, it is easy to ensure the strength, and the imaging optical system 23 reduces the image of the emission end 38a (the emission end 38b) in the short-side direction, so that it is easy to illuminate The area IR is elongated in the Y-axis direction.

Further, the technical scope of the present invention is not limited to the above embodiment. For example, one or more of the elements described in the above embodiments may be omitted. Further, the elements described in the above embodiments can be combined as appropriate.

Further, in the above embodiments, the cylindrical mask pattern M is used. For example, a mask pattern M may be used, and a planar mask pattern M may be used. The mask holding member may be used. The form can be appropriately changed depending on the form of the mask pattern M.

Further, in any of the above-described embodiments, the substrate supporting member for supporting the substrate P may be the rotating cylinder DP described in the first embodiment, and the substrate supporting table described in the second embodiment may be used. ST is also available.

Further, in each of the above embodiments, the light source unit 20 may include a collimator mirror that parallels the illumination light L1 from the solid-state light source 24. This collimating mirror is disposed, for example, between the solid-state light source 24 and the optical fiber 25, and its front-side focus position is set at the solid-state light source 24.

Further, the light source unit 20 may include an input lens that condenses (converges) the illumination light L1 from the solid-state light source 24 on the light incident side of the optical fiber 25 between the solid-state light source 24 and the optical fiber 25. This input lens is for example arranged between the collimating mirror and the optical fiber 25. The front side focus position of the input lens is set, for example, at the rear focus position of the collimator lens, and the rear side focus position of the input lens is set at, for example, the end of the light incident side of the optical fiber 25. Such an input lens can be utilized to adjust the diffusion angle (NA) of the illumination light L1 according to the ratio of its focal length to the focal length of the collimating mirror.

However, if the laser diode is observed in the far field, the light diffusion angle (orientation characteristic) sometimes has an anisotropy. In this case, one or both of the collimator lens and the input lens can be used to correct the diffusion angle of the illumination light L1 when entering the optical fiber 25 by making the focal length anisotropic.

Further, the illumination device IU may not include the amplification optical system 21. In this case, the light source unit 20 may be configured by, for example, a plurality of LEDs arranged at the incident end 35 of the optical integrator 22. Further, the light source unit 20 may include a light source instead of the solid light source 24, or may split light from one light source into a plurality of optical fibers 25 and guide the light integrator 22.

Further, the optical integrator 22 may not be a dense quartz columnar (flat plate) column, and may be, for example, an optical member (kale tube) in which four mirrors are combined into a frame shape. In the optical member, a dielectric may be disposed on at least a portion of the optical path surrounded by the mirror, and the dielectric may not be disposed in the optical path. That is, a portion of the interior of the optical integrator 22 can be a void.

Further, the exposure apparatus EX may be a multi-lens type or a microlens array type projection type exposure apparatus. In this case, at least one of the plurality of illumination optical systems may be applied to the illumination apparatus IU. Further, in the above embodiment, the illumination device IU is applied to the exposure device EX, but the illumination device IU may be applied to, for example, an annealing device.

For example, a large-sized glass substrate for manufacturing a liquid crystal display element or a long-band flexible substrate for manufacturing a solar cell panel is used to illuminate a slit which is elongated in the width direction orthogonal to the transport direction while continuously irradiating the ultraviolet ray annealing apparatus. In the form of ultraviolet ray illumination, a device for curing the ultraviolet ray cured resin layer and crystallization (alignment) of the semiconductor layer is performed. The illuminating device according to each of the above embodiments can be applied to, for example, the annealing device to improve the illuminance uniformity of the slit-shaped illumination light irradiated onto the substrate, and can adjust the irradiation angle characteristic to a desired state (isotropic or non- Isotropic NA).

Further, it is also possible to increase the size (width) of the short-side direction of the slit-shaped illumination region formed on the substrate. In this case, the imaging optical system 23 shown in FIGS. 2 to 5, 11, 14, and 18 is set to an amplification system in which the imaging magnification in the short-side direction of the emission end of the optical integrator 22 is equal to or larger than the magnification. In this case, in order to make the angular characteristic (NA) of the light irradiated onto the substrate become isotropic, the plurality of secondary light source images formed on the pupil plane 41 (the position of the pupil member 31) shown in FIG. 13 described above are caused. Each of Im2 may have an elliptical shape having a short axis parallel to the Y-axis direction and a long axis parallel to the X-axis direction.

In addition, one or both of the incident end 35 and the exit end 38 of the optical integrator 22 may be in a non-rectangular configuration. For example, one or both of the incident end 35 and the exit end 38 of the optical integrator 22 have a pair of first sides that are parallel to each other, and a line connecting the ends of the pair of first sides may be non-perpendicular to the first side. This line can also be a straight line, including a bend line, and can also include a curve. that is, One or both of the incident end 35 and the exit end 38 may have a shape (rectangular shape) in which at least one corner of the rectangle is rounded, or may have a trapezoidal shape or a shape (ladder shape) in which at least one corner of the trapezoid is rounded. In a case where one or both of the incident end 35 and the exit end 38 have a shape other than a rectangle, the pair of first sides may be set to be substantially parallel to the longitudinal direction of the illumination region IR. In this case, the longitudinal direction of the incident end 35 and the longitudinal direction of the exit end 38 are set to be parallel to the first side.

Further, at least a part of the illumination light L1 from the plurality of modules may enter the inner surface 37 of the optical integrator 22, and may not be incident on the inner surface 37. For example, in order to prevent the illumination light L1 from the magnifying optical system 21 (the plurality of modules 27) from entering the inner surface 37, the plurality of modules 27 avoid the end portion in the longitudinal direction of the incident end 35 of the optical integrator 22. Configuration is also possible. The illumination light L1 reflected on the inner surface 37 may be used for illumination, and may not be used for illumination.

Further, as shown in FIG. 11 and FIG. 14, the image of the exit end 38 of the optical integrator 22 is reduced in the short-side direction (X-axis direction), and the magnification of the light source image Im1 by the magnifying optical system 21 is anisotropy. Also, it can be used for imagery. For example, as shown in FIG. 2, the magnifying optical system 21 amplifies the light source image ImI in an isotropic manner, and as shown in FIG. 13, the diaphragm member 31 having the elliptical opening 31a may make the diffusion angle of the illumination light L1 anisotropic. Thereby, the diffusion angle of the illumination light L1 when entering the illumination area IR can be adjusted to beotropic or intentional.

(Component manufacturing method)

Next, a method of manufacturing a component will be described. Fig. 21 is a flow chart showing the method of manufacturing the device of the embodiment.

In the device manufacturing method shown in Fig. 21, first, a function/performance design of an element such as a liquid crystal display element or an organic EL display panel is performed (step 201). Next, the reticle pattern M is created in accordance with the design of the component (step 202). Also, the substrate of the component is a transparent film or sheet, or The substrate such as an extremely thin metal foil is purchased or manufactured, and prepared in advance (step 203).

Then, the prepared substrate is placed in a roll type or batch type production line, and a TFT bottom layer of an electrode or a wiring, an insulating film, a semiconductor film or the like constituting the element or an organic EL light-emitting layer as a pixel portion is formed on the substrate (Step 204) ). In step 204, the step of forming a photoresist pattern on the film on the substrate and the step of etching the film with the photoresist pattern as a mask are typically performed. In order to form a photoresist pattern, a step of forming a photoresist film on the surface of the substrate is performed, and a step of exposing the photoresist film of the substrate by exposure light patterned by the mask pattern M according to each embodiment described above is performed. This exposure steps the development of the photoresist film on which the latent image of the mask pattern is formed.

In the case of manufacturing a flexible element such as a printing technique, a step of forming a functional photosensitive layer (photosensitive decane coupling material or the like) on the surface of the substrate by a coating method, and passing through the mask pattern M according to each embodiment described above is performed. The patterned exposure light is irradiated to the functional photosensitive layer, and the functional photosensitive layer forms a portion which is hydrophilized according to the pattern shape and the water-repellent portion, and the underlying plating solution is applied to the hydrophilic portion of the functional photosensitive layer. And the step of forming a metallic pattern by chemical plating or the like.

Then, depending on the element to be manufactured, for example, a substrate is cut or cut, a substrate produced in another step, for example, a sheet-like filter having a sealing function, or a thin glass substrate is bonded, and the components are assembled ( Step 205). Next, the component is subjected to subsequent processing such as inspection (step 206). In the above manner, components can be manufactured.

Im1‧‧‧Light source image

IR‧‧‧Lighting area

IU‧‧‧Lighting device

L1‧‧‧ illumination light

20‧‧‧Light source department

21‧‧‧Amplified optical system

22‧‧‧Light integrator

23‧‧‧Image Optics

25‧‧‧Fiber

26‧‧‧

35‧‧‧Injected end

36, 37‧‧‧ inside

38‧‧‧Outlet

Claims (19)

An illumination device comprising: a light integrator having a first surface of a rectangle, an inner surface, and a second surface of a rectangle; and light incident on the first surface is transmitted through the second surface from multiple reflections on the inner surface; a light guiding unit that guides light from the light source to the optical integrator, supplies a plurality of light beams arranged at a predetermined interval along a longitudinal direction of the first surface to the optical integrator; and an imaging optical system, in the second The conjugate surface conjugated to the second surface is formed in the short side direction of the surface, and the refractive power in the longitudinal direction of the second surface is smaller than the refractive power in the short side direction of the second surface. The illuminating device of claim 1, wherein a plurality of regions corresponding to the plurality of light beams on the conjugate surface are arranged in a longitudinal direction of the second surface; the predetermined interval is set to be in the total The illuminance distribution in the longitudinal direction of the second surface of the yoke is partially overlapped by the plurality of regions to be uniform. The illuminating device of claim 1 or 2, wherein the light guiding portion comprises a plurality of optical fibers for guiding light from a solid light source as the light source to the optical integrator; the plurality of exiting ends of the plurality of optical fibers are The first surface is arranged in the longitudinal direction. The illuminating device according to any one of claims 1 to 3, further comprising an amplifying optical system disposed between the light guiding portion and the optical integrator. The illuminating device of claim 4, wherein the magnifying optical system includes a lens array having a plurality of lens elements arranged in a longitudinal direction of the first surface. The illumination device of claim 4, wherein the magnification of the magnifying optical system is set such that the light emitted from the imaging optical system is isotropically amplified. The illuminating device of claim 6, wherein the magnification of the magnifying optical system in the short side direction of the first surface is set to be smaller than a magnification in a longitudinal direction of the first surface; The optical system forms an image of the second surface that is reduced in the short side direction of the second surface on the conjugate surface. The illuminating device according to any one of claims 1 to 7, wherein the optical integrator has a first optical integrator and a second optical integrator; the light guiding unit has the first optical integrator and the optical integrator The second optical integrator supplies the first light guiding portion and the second light guiding portion of the plurality of light beams, respectively, and the plurality of light beams from the first light guiding portion do not overlap each other in a longitudinal direction of the first surface; The plurality of light beams of the second light guiding portion do not overlap each other in a longitudinal direction of the first surface; and the conjugate surface formed by the imaging optical system includes the first surface in a short side direction of the second surface The exit surface of the optical integrator and the surface of the exit surface of the second optical integrator are conjugate. The illuminating device of claim 8, wherein the plurality of light beams from the first light guiding portion in the longitudinal direction of the first surface and the plurality of light beams from the second light guiding portion The offset amount of the position is set to a diffusion angle of light incident on each of the conjugate planes through the imaging optical system, and the longitudinal direction of the second surface and the short side direction of the second surface are Isotropic. The illuminating device according to claim 8 or 9, wherein the first optical integrator and the second optical integrator are disposed adjacent to each other in the short side direction of the second surface and joined to each other. The illumination device of claim 10, wherein the imaging optical system includes an image of an exit surface of the first optical integrator and an exit surface of the second optical integrator on a short side of the second surface The direction is reduced to form on the conjugate surface. The illumination device of claim 11, further comprising: a first amplification optical system disposed between the first light guiding unit and the first optical integrator; and a second amplification optical system disposed in the second amplification optical system The second light guiding unit and the second optical integrator are set such that the magnification of the first amplifying optical system and the magnification of the second amplifying optical system are set such that the light emitted from the imaging optical system is isotropically amplified. An illumination device comprising: a light integrator having a first surface of a rectangle, an inner surface, and a second surface of a rectangle; and light incident on the first surface is emitted from the second surface by multiple reflection on the inner surface a light guiding portion that directs light from the light source to the optical integrator, supplies a plurality of light beams arranged at predetermined intervals along a longitudinal direction of the first surface and having a predetermined angular characteristic to the optical integrator; and imaging optics Forming a conjugate plane conjugated with the second surface in the short side direction of the second surface, and refracting in the longitudinal direction of the second surface compared with the refractive power in the short side direction of the second surface The force is small and has a predetermined magnification other than the multiple of the short side direction of the second surface. The illumination device of claim 13, further comprising an optical system for causing an angle characteristic of the plurality of light beams from the plurality of light guiding portions toward the optical integrator in a longitudinal direction of the first surface The angular characteristics in the direction of the short side of the first surface are different from each other. The illuminating device of claim 14, wherein the ratio of the angular characteristic in the longitudinal direction of the first surface to the angular characteristic in the short side direction of the first surface and the predetermined magnification of the imaging optical system The optical system is set in a corresponding manner. A processing device for transferring a pattern formed into a mask pattern to a base having a sensing layer The illuminating device according to any one of claims 1 to 15, wherein the reticle pattern and the substrate are perpendicular to a longitudinal direction of the second surface; A mobile device that moves in a relative direction. The processing apparatus of claim 16, wherein the moving device includes a mask holding member that holds the mask pattern rotatable about a center line parallel to a longitudinal direction of the second surface. A device manufacturing method comprising: a process of continuously transferring a pattern to a substrate while moving the mask pattern relative to the substrate by the processing device of claim 16 or 17; and using the transfer The change of the sensing layer of the substrate of the pattern performs the subsequent processing. An illumination device comprising: a rectangular parallelepiped light integrator having a rectangular incident end, an inner surface, and a rectangular exit end, such that light from the light source incident from the incident end is guided by multiple reflections on the inner surface The exit end; the light source side optical system, the light incident on the incident end of the optical integrator is formed as a plurality of concentrated light beams arranged at a predetermined interval along the longitudinal direction of the incident end; and an imaging optical system The short side direction of the exit end of the optical integrator forms a conjugate plane conjugate with the exit end, and the refractive power in the longitudinal direction of the exit end is smaller than the refractive power in the short side direction of the exit end.