TW201404482A - Method for removing foreign matter of web and apparatus for removing foreign matter of web - Google Patents

Method for removing foreign matter of web and apparatus for removing foreign matter of web Download PDF

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Publication number
TW201404482A
TW201404482A TW102126943A TW102126943A TW201404482A TW 201404482 A TW201404482 A TW 201404482A TW 102126943 A TW102126943 A TW 102126943A TW 102126943 A TW102126943 A TW 102126943A TW 201404482 A TW201404482 A TW 201404482A
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TW
Taiwan
Prior art keywords
roller
thin strip
foreign matter
peripheral speed
cleaning
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TW102126943A
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Chinese (zh)
Inventor
Masumi Sakamoto
Daisuke Tasaki
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Fujifilm Corp
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Publication of TW201404482A publication Critical patent/TW201404482A/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65HHANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H23/00Registering, tensioning, smoothing or guiding webs
    • B65H23/04Registering, tensioning, smoothing or guiding webs longitudinally
    • B65H23/26Registering, tensioning, smoothing or guiding webs longitudinally by transverse stationary or adjustable bars or rollers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0028Cleaning by methods not provided for in a single other subclass or a single group in this subclass by adhesive surfaces
    • B08B1/10
    • B08B1/20
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65HHANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H27/00Special constructions, e.g. surface features, of feed or guide rollers for webs
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65HHANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2301/00Handling processes for sheets or webs
    • B65H2301/40Type of handling process
    • B65H2301/44Moving, forwarding, guiding material
    • B65H2301/443Moving, forwarding, guiding material by acting on surface of handled material
    • B65H2301/4431Moving, forwarding, guiding material by acting on surface of handled material by means with operating surfaces contacting opposite faces of material
    • B65H2301/44318Moving, forwarding, guiding material by acting on surface of handled material by means with operating surfaces contacting opposite faces of material between rollers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65HHANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2301/00Handling processes for sheets or webs
    • B65H2301/50Auxiliary process performed during handling process
    • B65H2301/51Modifying a characteristic of handled material
    • B65H2301/511Processing surface of handled material upon transport or guiding thereof, e.g. cleaning
    • B65H2301/5115Cleaning
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65HHANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2404/00Parts for transporting or guiding the handled material
    • B65H2404/10Rollers
    • B65H2404/19Other features of rollers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65HHANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2701/00Handled material; Storage means
    • B65H2701/10Handled articles or webs
    • B65H2701/17Nature of material
    • B65H2701/175Plastic
    • B65H2701/1752Polymer film

Abstract

An apparatus for removing a foreign matter of a web is provided, which includes: a backup roller around which a traveling web is wrapped and which supports the traveling web and which driven-rotates by a conveyance of the web; a cleaning roller which transfers the foreign matter attached to the surface of the web to the peripheral surface of the cleaning roller by nipping the web between the backup roller and the cleaning roller and which driven-rotates by a conveyance of the web; an adhesion roller which transfers the foreign matter transferred on the cleaning roller to the peripheral surface of the adhesion roller having an adhesion layer by pressing the adhesion roller to the cleaning roller to remove the foreign matter and which driven-rotates by rotation of the cleaning roller; a roller-center circumferential velocity measuring unit for measuring a rotation circumferential velocity (V1) at a roller-center of the cleaning roller; a roller-edge circumferential velocity measuring unit for measuring a rotation circumferential velocity (V2) at a roller-edge of the backup roller; and a circumferential velocity difference ratio adjusting unit for adjusting a circumferential velocity difference ratio which is indicated by [(V2-V1)/V1] x 100 base on the measured value at roller center and roller edge.

Description

薄板條的異物去除方法及異物去除裝置 Foreign matter removing method for thin slat strip and foreign matter removing device

本發明涉及一種薄板條的異物去除方法及異物去除裝置,特別是涉及一種去除在製造光學膜的各製程中附著於基底膜(base film)、中間製品膜、製品膜等薄板條(web)上的塵埃等異物的薄板條的異物去除方法及異物去除裝置。 The present invention relates to a method for removing foreign matter of a thin strip and a foreign matter removing device, and more particularly to a method for removing a web attached to a base film, an intermediate product film, a product film or the like in each process of manufacturing an optical film. A method for removing foreign matter of a thin strip of foreign matter such as dust and a foreign matter removing device.

例如,光學補償膜是一面搬送透明的樹脂製的薄板條(基底膜),一面經過皂化處理製程、配向膜形成製程(中間製品膜)、光學各向異性層的形成製程(製品膜)等來製造。 For example, the optical compensation film is a thin film strip (base film) made of a transparent resin, and is subjected to a saponification process, an alignment film forming process (intermediate film), and an optical anisotropic layer forming process (product film). Manufacturing.

但是,在各製程中搬送薄板條時,有時在製程內懸浮著的塵土或灰塵等異物會藉由靜電等之力而附著於薄板條的表面上。當在薄板條的表面上附著有異物的狀態下進行塗布時會發生塗布不均,或產生配向不均。此外,使用具有配向不均的配向膜而製造的光學補償膜容易產生光學上的點狀缺陷。 However, when the thin strip is conveyed in each process, foreign matter such as dust or dust suspended in the process may adhere to the surface of the thin strip by the force of static electricity or the like. When coating is performed in a state where foreign matter adheres to the surface of the thin strip, coating unevenness may occur or uneven alignment may occur. Further, an optical compensation film produced by using an alignment film having an uneven alignment is liable to cause optical dot defects.

在光學補償膜等光學膜中,附著於薄板條的表面上的異 物成為產生各種缺陷的主要因素,因此確實地加以去除變得重要。 In an optical film such as an optical compensation film, adhesion to a surface of a thin strip Things become the main cause of various defects, so it is important to remove them.

作為薄板條的表面的異物去除方法,已知的是利用水等清洗液對薄板條的表面進行清洗的方法,但是具有清洗液的選定、由清洗液所導致的薄板條表面的物性變化、設備的大型化、清洗廢液的處理等缺點。 As a method of removing foreign matter on the surface of the thin strip, a method of cleaning the surface of the thin strip by a cleaning liquid such as water is known, but the selection of the cleaning liquid, the physical property change of the surface of the thin strip caused by the cleaning liquid, and the apparatus are known. Disadvantages such as large-scale processing and cleaning of waste liquid.

作為其它方法,還有對薄板條的表面吹附空氣來去除異物的方法,但是具有在光學膜上成為問題的微米級(micron order)的微細塵埃等異物去除的效果小的缺點。 As another method, there is a method in which air is blown to the surface of the thin strip to remove foreign matter, but there is a disadvantage that the effect of removing foreign matter such as micron-order fine dust which is a problem on the optical film is small.

由於這樣的背景,業界廣泛採用黏著橡膠輥方式的異物去除裝置,所述異物去除裝置是通過薄板條的面而使具有黏著性的橡膠輥夾持著,從而將薄板條表面的異物轉印至橡膠輥側來去除,所述薄板條是捲繞並支撐於支持輥(back up roller)上而搬送(例如專利文獻1)。 Due to such a background, the foreign matter removing device of the rubber roller type is widely used in the industry, and the foreign matter removing device holds the adhesive rubber roller by the surface of the thin strip to transfer the foreign matter on the surface of the thin strip to The rubber roll side is removed, and the thin strip is wound and supported on a back up roller and transported (for example, Patent Document 1).

[先前技術文獻] [Previous Technical Literature]

[專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2000-288483號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2000-288483

但是,黏著橡膠輥方式的異物去除裝置存在如下問題:根據輥的剛性的大小、所搬送的薄板條的薄板條張力(web tension)的大小、夾持壓力的大小等,異物的去除效率變差。此外,還存在如下問題:在薄板條的背面(沒有光學層的面)上沿 薄板條行走方向產生條紋狀的擦痕、或產生灰塵。 However, the foreign matter removing device of the adhesive rubber roller method has a problem that the removal efficiency of the foreign matter is deteriorated depending on the rigidity of the roller, the thickness of the web tension of the conveyed thin strip, the magnitude of the clamping pressure, and the like. . In addition, there is the following problem: on the back side of the thin strip (the surface without the optical layer) The strip travels in the direction of the strip to produce streaky scratches or dust.

本發明是鑒於這種情況而完成的,目的在於提供一種薄板條的異物去除方法及異物去除裝置,其是以黏著橡膠輥方式去除薄板條異物,且異物的去除效率好,並且可以有效抑制在薄板條背面上沿薄板條行走方向產生條紋狀的擦痕或產生灰塵。 The present invention has been made in view of the above circumstances, and an object thereof is to provide a foreign matter removing method for a thin slat strip and a foreign matter removing device which removes a foreign matter of a thin slat strip by an adhesive rubber roller, and the removal efficiency of the foreign matter is good, and can be effectively suppressed. Stripe-like scratches or dust are generated on the back side of the slats along the direction in which the slats travel.

為了達到所述目的,本發明的一實施方式的薄板條的異 物去除方法是使用支持輥及清潔輥(cleaning roller)來去除附著於所述薄板條的表面上的異物的異物去除方法,所述支持輥捲繞有並支撐所搬送的薄板條,並且藉由所述薄板條的搬送而從動旋轉,所述清潔輥包含具有黏著性橡膠的輥周面,所述薄板條的異物去除方法包括如下步驟:轉印去除步驟,在所述支持輥與所述清潔輥之間夾持所述薄板條,由此使附著於所述薄板條的表面上的異物轉印至所述清潔輥;周速測定步驟,測定所述清潔輥的輥中央部的旋轉周速V1(m/min)及所述支持輥的輥端部的旋轉周速V2(m/min);及周速差率調整步驟,調整所述周速差率,以使以[(V2-V1)/V1]×100表示的周速差率滿足0.5%以下。 In order to achieve the object, the thin strip of one embodiment of the present invention is different The object removing method is a foreign matter removing method of removing foreign matter adhering to the surface of the thin strip by using a supporting roller and a cleaning roller, and the supporting roller winds and supports the conveyed thin strip by The thin strip is driven to rotate, the cleaning roller includes a roller circumferential surface having an adhesive rubber, and the foreign matter removing method of the thin strip includes the following steps: a transfer removing step, the support roller and the The thin strips are sandwiched between the cleaning rollers, thereby transferring foreign matter adhering to the surface of the thin strip to the cleaning roller; a peripheral speed measuring step of measuring a rotation circumference of a central portion of the roller of the cleaning roller a speed V1 (m/min) and a rotational peripheral speed V2 (m/min) of the roller end portion of the support roller; and a peripheral speed difference rate adjusting step of adjusting the peripheral speed difference rate so that [(V2- The peripheral speed difference ratio represented by V1)/V1]×100 satisfies 0.5% or less.

再者,在本發明中,是將支持輥的輥兩端部的旋轉周速 設為相同來進行說明,然而假使在所述旋轉周速不同的情形時,則將旋轉周速較大的輥端部的旋轉周速設為V2。以下相同。 Furthermore, in the present invention, the rotational peripheral speed of both ends of the roller supporting the roller is The description will be made in the same manner. However, in the case where the rotation peripheral speed is different, the rotation peripheral speed of the roller end portion having a large rotation peripheral speed is V2. The same is true below.

關於以黏著橡膠輥方式去除薄板條異物時異物去除效率 下降、薄板條背面產生擦痕、產生灰塵的原因,發明者獲得以下見解。 About foreign matter removal efficiency when removing thin strips of foreign matter by means of adhesive rubber roller The inventors obtained the following findings by dropping, causing scratches on the back side of the thin strip, and causing dust.

即,根據支持輥及清潔輥的剛性的程度、捲繞並支撐於支持輥上的薄板條的張力的大小、利用支持輥及清潔輥夾持薄板條的夾持力的大小,支持輥或清潔輥發生撓曲時,在作為橡膠製輥的清潔輥的輥中央部及輥端部,旋轉周速會產生周速差。藉由所述清潔輥的周速差,支持輥的周速加快,從而使薄板條的搬送速度產生偏差,其成為異物的去除效率變差、產生條紋狀的擦痕、灰塵產生的原因。 That is, depending on the degree of rigidity of the support roller and the cleaning roller, the magnitude of the tension of the thin strip wound and supported on the support roller, and the holding force of the support strip and the cleaning roller for holding the thin strip, the support roller or the cleaning When the roller is deflected, the circumferential speed difference occurs at the center portion of the roller and the end portion of the roller as the cleaning roller of the rubber roller. By the difference in the peripheral speed of the cleaning roller, the peripheral speed of the backup roller is increased, and the conveying speed of the thin slats is deviated, which causes deterioration of the removal efficiency of foreign matter, generation of streaky scratches, and generation of dust.

再者,關於藉由在清潔輥的輥中央部及輥端部旋轉周速 產生周速差而使得支持輥的周速與薄板條的搬送速度產生偏差的機制,將在後文描述。 Furthermore, about rotating the peripheral speed by the center of the roller and the end of the roller at the cleaning roller A mechanism for generating a circumferential speed difference to cause a deviation between the peripheral speed of the support roller and the conveying speed of the thin slats will be described later.

並且,當將清潔輥的輥中央部的旋轉周速設為V1(m/min),將支持輥的輥端部的旋轉周速設為V2(m/min)時,使以[(V2-V1)/V1]×100表示的周速差率滿足0.5%以下,由此可改善異物的去除效率,並且抑制條紋狀的擦痕、灰塵產生。 In addition, when the rotational peripheral speed of the center portion of the roller of the cleaning roller is V1 (m/min) and the rotational peripheral speed of the roller end portion of the backup roller is V2 (m/min), [(V2-) The peripheral speed difference ratio represented by V1)/V1]×100 satisfies 0.5% or less, whereby the removal efficiency of foreign matter can be improved, and streaky scratches and dust generation can be suppressed.

本發明的薄板條的異物去除方法是基於所述見解而完成的,當將清潔輥的輥中央部的旋轉周速設為V1(m/min),將支持輥的輥端部的旋轉周速設為V2(m/min)時,使以[(V2-V1)/V1]×100表示的周速差率滿足0.5%以下。由此,可改善異物的去除效率,並且抑制條紋狀的擦痕、灰塵產生。 The foreign matter removing method of the thin slat of the present invention is completed based on the above-described knowledge. When the rotational peripheral speed of the central portion of the roller of the cleaning roller is set to V1 (m/min), the rotational peripheral speed of the roller end portion of the supporting roller is set. When V2 (m/min) is set, the circumferential speed difference ratio represented by [(V2-V1)/V1]×100 is made 0.5% or less. Thereby, the removal efficiency of foreign matter can be improved, and streaky scratches and dust generation can be suppressed.

再者,關於一面將清潔輥的輥中央部與輥端部的周速差作為問題,一面求出支持輥的輥端部的旋轉周速V2的理由,將在後文描述。 In addition, the reason why the circumferential speed difference V2 of the roller end portion of the support roller is obtained as a problem in the circumferential speed difference between the center portion of the roller of the cleaning roller and the roller end portion will be described later.

所述薄板條的異物去除方法優選的是更包括如下步驟: 將黏著輥按壓至清潔輥而使轉印至清潔輥的異物轉印至黏著輥,所述黏著輥包含具有黏著劑層的輥周面。 The method for removing foreign matter of the thin strip preferably further comprises the following steps: The adhesive roller is pressed to the cleaning roller to transfer the foreign matter transferred to the cleaning roller to the adhesive roller, and the adhesive roller includes a roller circumferential surface having an adhesive layer.

為了達到所述目的,本發明的另一實施方式的異物去除 裝置包括:金屬製或樹脂製的支持輥,捲繞有並支撐所搬送的薄板條,並且藉由薄板條的搬送而從動旋轉;清潔輥,與支持輥之間夾持薄板條,將附著於薄板條的表面的異物轉印至具有黏著性橡膠的輥周面而去除,並且藉由薄板條的搬送而從動旋轉;中央部周速測定單元,測定清潔輥的輥中央部的旋轉周速V1;端部周速測定單元,測定支持輥的輥端部的旋轉周速V2;及周速差率調整單元,根據輥中央部與所述輥端部的測定值,調整以[(V2-V1)/V1]×100表示的周速差率。 In order to achieve the object, the foreign matter removal of another embodiment of the present invention The device includes: a support roller made of metal or resin, wound and supported by the conveyed thin strip, and driven to rotate by the conveyance of the thin strip; the cleaning roller and the support roller sandwich the thin strip to be attached The foreign matter on the surface of the thin strip is transferred to the circumferential surface of the roller having the adhesive rubber, and is removed by the conveyance of the thin strip; the central peripheral speed measuring unit measures the rotation circumference of the central portion of the roller of the cleaning roller. The speed V1; the end peripheral speed measuring unit measures the rotational peripheral speed V2 of the roller end portion of the support roller; and the peripheral speed difference adjusting unit adjusts the [[V2] according to the measured value of the center portion of the roller and the end portion of the roller. -V1) / V1] × 100 indicates the peripheral speed difference.

根據所述薄板條的異物去除裝置,包括:中央部周速測 定單元,測定清潔輥的輥中央部的旋轉周速V1;端部周速測定單元,測定支持輥的輥端部的旋轉周速V2;及周速差率調整單元,根據輥中央部及輥端部的測定值,調整以[(V2-V1)/V1]×100表示的周速差率;因此可以改善異物的去除效率,並且有效抑制條紋狀的擦痕、灰塵產生。 a foreign matter removing device according to the thin strip, comprising: a central peripheral speed test The fixed unit measures the rotational peripheral speed V1 of the center portion of the roller of the cleaning roller; the end peripheral speed measuring unit measures the rotational peripheral speed V2 of the roller end portion of the support roller; and the peripheral speed difference adjusting unit according to the center portion of the roller and the roller The measured value of the end portion is adjusted to the peripheral speed difference ratio expressed by [(V2 - V1) / V1] × 100; therefore, the removal efficiency of foreign matter can be improved, and streaky scratches and dust generation can be effectively suppressed.

在本發明中,優選的是包括黏著輥,所述黏著輥是按壓 至清潔輥,將轉印至清潔輥的異物轉印至具有黏著劑層的輥周面而去除。並且,優選的是支持輥及清潔輥使用軸芯方向的撓曲量為50μm以下的輥。 In the present invention, it is preferred to include an adhesive roller which is pressed To the cleaning roller, the foreign matter transferred to the cleaning roller is transferred to the peripheral surface of the roller having the adhesive layer to be removed. Further, it is preferable that the support roller and the cleaning roller use a roller having a deflection amount in the axial direction of 50 μm or less.

各輥的撓曲量的測定方法並沒有特別限定,但是可優選 使用在輥中央部及輥兩端部分別配置雷射位移計(laser displacement meter)的方法。 The method for measuring the amount of deflection of each roller is not particularly limited, but may be preferably A method of arranging a laser displacement meter at each of the center portion of the roller and both ends of the roller is used.

這樣,藉由至少就支持輥及清潔輥而言使用剛性大的 輥、即低撓曲性的輥(roller having low flexibility),可以縮小支持輥的輥中央部與輥端部的周速差。 Thus, by using at least the support roller and the cleaning roller, the rigidity is large. The roller, that is, the roller having low flexibility, can reduce the circumferential speed difference between the center portion of the roller of the support roller and the end portion of the roller.

並且,在本發明中,周速差率調整單元優選的是包角調 整單元與夾持壓力調整單元中的至少一個,所述包角調整單元調整捲繞於支持輥上的薄板條的包角度,所述夾持壓力調整單元調整將薄板條夾持於支持輥與清潔輥之間的夾持壓力。 Further, in the present invention, the peripheral speed difference adjustment unit preferably has a wrap angle adjustment At least one of an integral unit and a clamping pressure adjusting unit that adjusts a package angle of the thin strip wound on the support roller, the clamping pressure adjusting unit adjusting the clamping of the thin strip to the supporting roller and The clamping pressure between the cleaning rollers.

其原因在於,藉由利用包角調整單元來改變纏繞於支持 輥上的薄板條的包角,可以縮小清潔輥的輥中央部與輥端部的周速差。優選的是將包角度設為20°以下。 The reason is that the winding is supported by the use of the wrap angle adjustment unit. The wrap angle of the thin strip on the roll can reduce the peripheral speed difference between the center portion of the roll of the cleaning roller and the end portion of the roll. It is preferable to set the package angle to 20 or less.

並且,其原因在於,藉由利用夾持壓力調整單元來調整 支持輥與清潔輥之間的夾持壓力,可以縮小清潔輥的輥中央部與輥端部的周速差。優選的是將夾持壓力調整為0.5N/cm以上、1.0N/cm以下。藉由如上所述將夾持壓力調整為0.5N/cm以上、1.0N/cm以下,支持輥的輥中央部與輥端部的周速差進一步縮小,從而可以提高異物去除性能,另一方面,可以更有效地防止在薄板條背面產生擦痕。 And, the reason is that it is adjusted by using the clamping pressure adjusting unit The nip pressure between the support roller and the cleaning roller can reduce the circumferential speed difference between the center portion of the roller of the cleaning roller and the end portion of the roller. It is preferable to adjust the nip pressure to 0.5 N/cm or more and 1.0 N/cm or less. By adjusting the nip pressure to 0.5 N/cm or more and 1.0 N/cm or less as described above, the circumferential speed difference between the center portion of the roll of the backup roll and the end portion of the roll is further reduced, thereby improving the foreign matter removal performance. It can prevent scratches on the back of the thin strip more effectively.

並且,在本發明中,優選的是清潔輥的輥主體部為橡膠 製,並且橡膠硬度為20°~60°。 Further, in the invention, it is preferable that the roller main body portion of the cleaning roller is rubber Made, and the rubber hardness is 20 ° ~ 60 °.

並且,在本發明中,優選的是薄板條為製造光學膜時的基底膜、中間製品膜、製品膜中的任一者。其原因在於,就光學膜而言,附著於薄板條的表面上的微細異物會導致光學特性的缺陷,並且異物去除時的擦痕或灰塵產生也會造成光學特性的下降。 Further, in the invention, it is preferable that the thin strip is any one of a base film, an intermediate product film, and a product film when the optical film is produced. The reason for this is that in the case of an optical film, fine foreign matter adhering to the surface of the thin strip causes defects in optical characteristics, and scratches or dust generation at the time of removal of foreign matter also cause a decrease in optical characteristics.

根據本發明的薄板條的異物去除方法及異物去除裝置,以黏著橡膠輥方式去除薄板條異物時,異物的去除效率好,並且可有效抑制在薄板條的背面上沿薄板條行走方向產生條紋狀的擦痕或產生灰塵。 According to the foreign matter removing method and the foreign matter removing device of the thin strip of the present invention, when the thin strip of foreign matter is removed by the adhesive rubber roller, the removal efficiency of the foreign matter is good, and the streaking of the thin strip in the traveling direction of the thin strip can be effectively suppressed. Scratches or produces dust.

10‧‧‧異物去除裝置 10‧‧‧ Foreign object removal device

12‧‧‧支持輥 12‧‧‧Support roll

14‧‧‧清潔輥 14‧‧‧cleaning roller

16‧‧‧黏著輥 16‧‧‧Adhesive roller

18‧‧‧第1移動平臺 18‧‧‧1st mobile platform

20‧‧‧輥支撐台 20‧‧‧Roll support table

22‧‧‧軸承 22‧‧‧ Bearing

24‧‧‧基座 24‧‧‧Base

26‧‧‧第1軌道 26‧‧‧1 track

28‧‧‧線性導向件 28‧‧‧Linear guides

30‧‧‧第1氣缸裝置 30‧‧‧1st cylinder device

30A‧‧‧活塞桿 30A‧‧‧Piston rod

32‧‧‧第2移動平臺 32‧‧‧2nd mobile platform

34‧‧‧輥支撐台 34‧‧‧Roll support table

36‧‧‧軸承 36‧‧‧ Bearing

38‧‧‧第2軌道 38‧‧‧2nd track

40‧‧‧線性導向件 40‧‧‧Linear guides

42‧‧‧第2氣缸裝置 42‧‧‧2nd cylinder device

42A‧‧‧活塞桿 42A‧‧‧Piston rod

44‧‧‧第3移動平臺 44‧‧‧3rd mobile platform

46‧‧‧輥支撐台 46‧‧‧Roll support table

48‧‧‧軸承 48‧‧‧ bearing

50‧‧‧第3軌道 50‧‧‧3rd track

52‧‧‧線性導向件 52‧‧‧Linear guides

54‧‧‧第3氣缸裝置 54‧‧‧3rd cylinder device

54A‧‧‧活塞桿 54A‧‧‧Piston rod

56A‧‧‧中央部周速測定單元 56A‧‧‧Central Speed Measurement Unit

56B‧‧‧端部周速測定單元 56B‧‧‧End peripheral speed measuring unit

58‧‧‧周速差率調整單元 58‧‧‧Week speed difference adjustment unit

58A‧‧‧包角調整單元 58A‧‧‧Wrap angle adjustment unit

58B‧‧‧夾持壓力調整單元 58B‧‧‧Clamping pressure adjustment unit

60‧‧‧控制器 60‧‧‧ Controller

61‧‧‧導輥 61‧‧‧guide roller

62‧‧‧接合輥 62‧‧‧Joint roller

63‧‧‧氣缸裝置 63‧‧‧Cylinder unit

64‧‧‧桿 64‧‧‧ rod

P‧‧‧擦痕 P‧‧‧Scratch

W‧‧‧薄板條 W‧‧‧thin slats

X‧‧‧開始接觸的接點 Contact points that began to contact X‧‧‧

Y‧‧‧接觸結束的接點 Y‧‧‧Contacts at the end of contact

圖1是本發明的異物去除裝置的實施方式的側視圖。 Fig. 1 is a side view showing an embodiment of a foreign matter removing device of the present invention.

圖2是本發明的異物去除裝置的實施方式的俯視圖。 Fig. 2 is a plan view showing an embodiment of the foreign matter removing device of the present invention.

圖3是包角的說明圖。 Fig. 3 is an explanatory diagram of a wrap angle.

圖4是產生於薄板條背面的擦痕的說明圖。 Fig. 4 is an explanatory view of a scratch generated on the back surface of the thin strip.

圖5是說明清潔輥的周速差的產生機制的說明圖。 Fig. 5 is an explanatory view for explaining a mechanism of generating a circumferential speed difference of the cleaning roller.

圖6是說明圖5的機制中的輥中央部的狀態的說明圖。 Fig. 6 is an explanatory view for explaining a state of a central portion of a roller in the mechanism of Fig. 5;

圖7是說明圖5的機制中的輥端部的狀態的說明圖。 Fig. 7 is an explanatory view for explaining a state of a roller end portion in the mechanism of Fig. 5;

圖8是說明薄板條的包角度及薄板條張力與支持輥的輥撓曲量的關係的說明圖。 Fig. 8 is an explanatory view for explaining the relationship between the package angle of the thin strip and the tension of the web and the amount of deflection of the roll of the backup roll.

圖9是說明夾持壓力與支持輥的旋轉周速的關係的說明圖。 Fig. 9 is an explanatory view for explaining the relationship between the nip pressure and the rotational peripheral speed of the backup roller.

以下,一面參照附圖,一面詳細說明本發明的薄板條的異物去除方法及異物去除裝置的優選實施方式。 Hereinafter, a preferred embodiment of the foreign matter removing method and the foreign matter removing device of the thin strip of the present invention will be described in detail with reference to the accompanying drawings.

此處,圖中,以相同符號表示的部分是具有相同功能的相同的要素。並且,在本說明書中,當使用“~”表示數值範圍時,以“~”表示的上限的數值、下限的數值也包含於數值範圍內。 Here, the parts denoted by the same symbols in the drawings are the same elements having the same function. Further, in the present specification, when "~" is used to indicate a numerical range, the numerical value of the upper limit indicated by "~" and the numerical value of the lower limit are also included in the numerical range.

[異物去除裝置的構成] [Composition of foreign matter removal device]

圖1是自側面觀察本發明的實施方式的薄板條的異物去除裝置10的側視圖,圖2是自上表面觀察的俯視圖。並且,本發明的實施方式的薄板條的異物去除裝置10並不限定使用用途,但是特別適用於去除在製造光學膜的各製程中附著於基底膜、中間製品膜、製品膜等薄板條上的塵埃等異物的裝置。 Fig. 1 is a side view of the foreign matter removing device 10 of the thin strip of the embodiment of the present invention viewed from the side, and Fig. 2 is a plan view as seen from the upper surface. Further, the foreign matter removing device 10 of the thin strip of the embodiment of the present invention is not limited to the use, but is particularly suitable for removing the thin strips attached to the base film, the intermediate product film, the product film, and the like in the respective processes for manufacturing the optical film. A device for foreign matter such as dust.

如圖1及圖2所示,支持輥12、清潔輥14及黏著輥16三根輥是將輥的軸芯高度位置設成相同而被平行配置。 As shown in FIGS. 1 and 2, the support roller 12, the cleaning roller 14, and the adhesive roller 16 are arranged in parallel by setting the axial height positions of the rollers to be the same.

支持輥12旋轉自如地支撐於一對軸承22、22上,所述一對軸承22、22對向配置於輥支撐台20上,所述輥支撐台20固定於第1移動平臺18上。第1移動平臺18通過線性導向件(linear guide)28、28而滑動自如地支撐於平行的一對第1軌道26、26上,所述一對第1軌道26、26鋪設於基座24上。並且,在基座24上設置有使第1移動平臺18在第1軌道26上移動的一對第1氣缸裝置30、30,並且各個活塞桿(piston rod)30A、30A前端 固著於第1移動平臺18上。 The support roller 12 is rotatably supported by a pair of bearings 22 and 22 which are opposed to each other and disposed on the roller support table 20, and the roller support table 20 is fixed to the first moving platform 18. The first moving platform 18 is slidably supported by a pair of parallel first rails 26 and 26 by linear guides 28 and 28, and the pair of first rails 26 and 26 are laid on the base 24 . Further, the base 24 is provided with a pair of first cylinder devices 30 and 30 for moving the first moving platform 18 on the first rail 26, and the front ends of the piston rods 30A and 30A are provided. It is fixed to the first mobile platform 18.

支持輥12形成為將金屬製或樹脂製的輥主體部設置於由金屬形成的輥芯上的輥。當輥主體部為金屬製時,優選的是在輥表面上實施例如鎳鉻合金鍍敷等硬質化處理。並且,當輥主體部為樹脂製時,優選的是使用硬質性樹脂。再者,支持輥12並不限定於金屬製或樹脂製,可使用輥主體部由硬質材料形成的輥。 The support roller 12 is formed as a roller in which a metal main body or a resin roller main body portion is provided on a roll core made of metal. When the roller main body portion is made of metal, it is preferable to carry out a hardening treatment such as nickel-chromium alloy plating on the surface of the roller. Further, when the roller main body portion is made of a resin, it is preferable to use a hard resin. Further, the support roller 12 is not limited to a metal or resin, and a roller whose main body portion is made of a hard material can be used.

清潔輥14旋轉自如地支撐於一對軸承36、36上,所述 一對軸承36、36對向配置於輥支撐台34上,所述輥支撐台34固定於第2移動平臺32上。第2移動平臺32通過線性導向件40、40而滑動自如地支撐於平行的一對第2軌道38、38上,所述一對第2軌道38、38鋪設於基座24上。並且,在基座24上設置有使第2移動平臺32在第2軌道38上移動的一對第2氣缸裝置42、42,各個活塞桿42A、42A前端固著於第2移動平臺32上。並且,第2氣缸裝置42、42與第1氣缸裝置30、30相對向而配置。 The cleaning roller 14 is rotatably supported on a pair of bearings 36, 36, The pair of bearings 36 and 36 are disposed opposite to each other on the roller support table 34, and the roller support table 34 is fixed to the second moving platform 32. The second moving platform 32 is slidably supported by the pair of parallel second rails 38 and 38 by the linear guides 40 and 40, and the pair of second rails 38 and 38 are laid on the susceptor 24. Further, the base 24 is provided with a pair of second cylinder devices 42 and 42 for moving the second moving platform 32 on the second rail 38, and the distal ends of the respective piston rods 42A and 42A are fixed to the second moving platform 32. Further, the second cylinder devices 42 and 42 are disposed to face the first cylinder devices 30 and 30.

清潔輥14形成為橡膠輥,其將具有黏著性的橡膠製的輥 主體部設置於由金屬形成的輥芯上。作為清潔輥14的輥表面的黏著力優選的是1(hPa)~60(hPa)的範圍。並且,作為輥主體部的橡膠硬度,優選的是20°~60°的範圍。 The cleaning roller 14 is formed as a rubber roller which will have an adhesive rubber roller The body portion is disposed on a roll core formed of metal. The adhesive force as the surface of the roller of the cleaning roller 14 is preferably in the range of 1 (hPa) to 60 (hPa). Further, the rubber hardness of the roller main body portion is preferably in the range of 20 to 60.

清潔輥14的橡膠硬度的測定方法是依據彈簧(spring) 式A型(JIS K 6301A,JIS是日本工業標準(Japan Industrial Standards的略寫))的方法,與利用橡膠硬度計(durometer)A進行的測定數值相同。 The method for measuring the rubber hardness of the cleaning roller 14 is based on a spring. The method of the type A (JIS K 6301A, JIS is a Japanese industrial standard (abbreviation of Japan Industrial Standards)) is the same as the measurement value by the rubber Durometer A.

並且,清潔輥14的輥表面的黏著力的測定方法是依據JIS K 6256。 Further, the method of measuring the adhesion of the surface of the roller of the cleaning roller 14 is based on JIS. K 6256.

黏著輥16旋轉自如地支撐於一對軸承48、48上,所述 一對軸承48、48對向配置於輥支撐台46上,所述輥支撐台46固定於第3移動平臺44上。第3移動平臺44通過線性導向件52、52而滑動自如地支撐於平行的一對第3軌道50、50上,所述一對第3軌道50、50鋪設於第2移動平臺32上。並且,在第2移動平臺32上,設置有使第3移動平臺44在第3軌道50上移動的一對第3氣缸裝置54、54,各個活塞桿54A、54A前端固著於第3移動平臺44上。並且,第3氣缸裝置54、54朝向與第2氣缸裝置42、42相同的方向而配置。 The adhesive roller 16 is rotatably supported on a pair of bearings 48, 48, The pair of bearings 48, 48 are disposed opposite to the roller support table 46, and the roller support table 46 is fixed to the third moving platform 44. The third moving platform 44 is slidably supported by the pair of parallel third rails 50, 50 by the linear guides 52, 52, and the pair of third rails 50, 50 are laid on the second moving platform 32. Further, on the second moving platform 32, a pair of third cylinder devices 54 and 54 that move the third moving platform 44 on the third rail 50 are provided, and the ends of the respective piston rods 54A and 54A are fixed to the third moving platform. 44. Further, the third cylinder devices 54 and 54 are arranged in the same direction as the second cylinder devices 42 and 42.

黏著輥16形成為在金屬製的輥芯上具有黏著劑層的輥, 所述黏著劑層的黏著性大於清潔輥的橡膠製的輥主體部。黏著劑層可以由黏著性大於清潔輥的橡膠所形成,或者也可以為在金屬製的輥芯上捲繞有黏著膠帶的黏著膠帶輥。作為黏著劑層的黏著力,優選的是在JIS K 6256的測定方法中處於50(hPa)~400(hPa)的範圍。 The adhesive roller 16 is formed as a roller having an adhesive layer on a metal roll core. The adhesive layer has an adhesiveness greater than that of the rubber roller body portion of the cleaning roller. The adhesive layer may be formed of rubber having a higher adhesion than the cleaning roller, or may be an adhesive tape roller having an adhesive tape wound around a metal roll core. The adhesive force of the adhesive layer is preferably in the range of 50 (hPa) to 400 (hPa) in the measurement method of JIS K 6256.

支持輥12、清潔輥14及黏著輥16的輥面長形成為長於 薄板條W的寬度。例如,輥面長優選的是比薄板條W的寬度長100mm~200mm左右。並且,優選的是支持輥12、清潔輥14及黏著輥16中,至少支持輥12及清潔輥14使用軸芯方向的撓曲量為100μm以下的低撓曲輥,優選的是使用軸芯方向的撓曲量為 50μm以下的低撓曲輥。 The roll faces of the support roller 12, the cleaning roller 14, and the adhesive roller 16 are formed longer than The width of the thin strip W. For example, the roll face length is preferably about 100 mm to 200 mm longer than the width of the thin strip W. Further, it is preferable that at least the support roller 12, the cleaning roller 14, and the adhesive roller 16 use a low deflection roller having a deflection amount in the axial direction of 100 μm or less, preferably using a core direction. The amount of deflection is Low deflection rolls below 50 μm.

作為低撓曲輥,只要撓曲量為100μm以下便沒有特別限定,例如,可使用三菱樹脂股份有限公司製的“雙重管低撓曲輥”或“碳質輥(carbon roll)”。當使用“雙重管低撓曲輥”及“碳質輥”時,優選的是將“碳質輥”用於支持輥12,將“雙重管低撓曲輥”用於清潔輥14。 The low deflection roller is not particularly limited as long as the amount of deflection is 100 μm or less. For example, a "double tube low deflection roller" or a "carbon roll" manufactured by Mitsubishi Plastics Co., Ltd. can be used. When "double tube low deflection rolls" and "carbonaceous rolls" are used, it is preferred to use "carbonaceous rolls" for the support rolls 12 and "double tube low deflection rolls" for the cleaning rolls 14.

並且,在異物去除裝置10中,設置有:中央部周速測定 單元56A,測定清潔輥14的輥中央部的旋轉周速V1;端部周速測定單元56B,測定支持輥12的輥端部的旋轉周速V2;及周速差率調整單元58(58A、58B),根據輥中央部及輥端部的測定值,調整以[(V2-V1)/V1]×100表示的周速差率。 Further, in the foreign matter removing device 10, a central portion peripheral speed measurement is provided. The unit 56A measures the rotational peripheral speed V1 of the center portion of the roller of the cleaning roller 14, the end peripheral speed measuring unit 56B, measures the rotational peripheral speed V2 of the roller end portion of the backup roller 12, and the peripheral speed difference adjusting unit 58 (58A, 58B), the peripheral speed difference ratio represented by [(V2-V1)/V1]×100 is adjusted according to the measured values of the center portion of the roll and the end portion of the roll.

此處,本發明將清潔輥14的輥中央部與輥端部的周速差 作為問題,並且說明測定支持輥12的輥端部的旋轉周速V2的理由。 Here, the present invention sets the circumferential speed difference between the center portion of the roller of the cleaning roller 14 and the end portion of the roller. The reason for measuring the rotational peripheral speed V2 of the roller end portion of the support roller 12 is explained as a problem.

即,當清潔輥14發生了撓曲時橡膠製的清潔輥14的兩 端部被強力按壓至支持輥12的兩端部而發生變形,因此無法測定準確的旋轉周速。此外,其原因在於,可將支持輥12的輥兩端部的旋轉周速視作清潔輥14的輥兩端部的旋轉周速V2。 That is, when the cleaning roller 14 is deflected, two of the rubber cleaning rollers 14 are formed. Since the end portion is strongly pressed to both end portions of the backup roller 12 and deformed, it is impossible to measure an accurate rotational peripheral speed. Further, the reason for this is that the rotational peripheral speed of both ends of the roller of the backup roller 12 can be regarded as the rotational peripheral speed V2 of both ends of the roller of the cleaning roller 14.

因此,如圖2所示,輥中央部的旋轉周速V1是在清潔輥 14的中央部設置中央部周速測定單元56A來進行測定,另一方面,關於輥端部的旋轉周速V2,是在支持輥12的兩端部設置端部周速測定單元56B來進行測定。 Therefore, as shown in FIG. 2, the rotational peripheral speed V1 of the central portion of the roller is at the cleaning roller. In the center portion of the support roller 12, the center peripheral speed measuring unit 56A is provided for measurement. On the other hand, the end peripheral speed measuring unit 56B is provided at both end portions of the support roller 12 for the measurement of the rotational peripheral speed V2 of the roller end portion. .

關於支持輥12的輥端部的旋轉周速可被視作清潔輥14的輥兩端部的旋轉周速V2,請參照下述的機制。 The rotational peripheral speed of the roller end portion of the backup roller 12 can be regarded as the rotational peripheral speed V2 of both ends of the roller of the cleaning roller 14, and the following mechanism can be referred to.

中央部周速測定單元56A及端部周速測定單元56B優選 的是使用非接觸的測定單元。作為非接觸的測定單元,例如可優選採用利用雷射多普勒速度計(laser Doppler velocimeter)來測定輥周速的單元。圖2中,雖然將端部周速測定單元56B分別設置於支持輥12的兩端部,但是可以將端部周速測定單元56B僅設置於支持輥12的一端側。將支持輥12的輥兩端部的旋轉周速設為相同來進行說明,但假設在所述旋轉周速不同的情形時,則將端部周速測定單元56B分別設置於支持輥12的兩端部,將旋轉周速較大的輥端部的旋轉周速設為V2。 The central portion peripheral speed measuring unit 56A and the end peripheral speed measuring unit 56B are preferably It is the use of a non-contact measuring unit. As the non-contact measuring unit, for example, a unit that measures the peripheral speed of the roll by a laser Doppler velocimeter can be preferably used. In FIG. 2, the end peripheral speed measuring means 56B are respectively provided at both end portions of the support roller 12, but the end peripheral speed measuring means 56B may be provided only on one end side of the support roller 12. The rotation peripheral speeds of the both ends of the roller of the support roller 12 are set to be the same. However, when the rotation peripheral speeds are different, the end peripheral speed measuring units 56B are respectively disposed on the support roller 12 At the end, the rotational peripheral speed of the end portion of the roller having a large rotating peripheral speed is set to V2.

利用中央部周速測定單元56A及端部周速測定單元56B 所測定的旋轉周速V1、旋轉周速V2通過信號電纜(signal cable)而發送至控制器60。 The central portion peripheral speed measuring unit 56A and the end peripheral speed measuring unit 56B The measured rotational peripheral speed V1 and the rotational peripheral speed V2 are transmitted to the controller 60 via a signal cable.

並且,作為周速差率調整單元58,可優選採用包角(wrap angle)調整單元58A及夾持壓力(nip pressure)調整單元58B。 Further, as the peripheral speed difference adjustment unit 58, a wrap angle (wrap The adjustment unit 58A and the nip pressure adjustment unit 58B.

包角調整單元58A調整捲繞並支撐於支持輥12上的薄板 條W的包角(捲繞角度),可以設置於薄板條搬送方向上的支持輥12的入口側、出口側中的任一者,但更優選的是出口側。 The wrap angle adjusting unit 58A adjusts the thin plate wound and supported on the support roller 12 The wrap angle (winding angle) of the strip W may be provided in any one of the inlet side and the outlet side of the support roller 12 in the sheet conveying direction, but is more preferably the outlet side.

如圖3所示,包角(θ)是指薄板條W與支持輥12開 始接觸的接點X與接觸結束的接點Y所成的中心角。 As shown in FIG. 3, the wrap angle (θ) means that the thin strip W and the support roller 12 are opened. The central angle formed by the contact X at the beginning of contact and the contact Y at the end of contact.

包角調整單元58A如圖1所示,在支持輥12與導輥61 之間的薄板條搬送線上,設置有接合於薄板條W的接合輥62。薄板條W呈S字狀地架設於支持輥12、接合輥62、導輥61之間而被搬送。接合輥62的旋轉軸兩端旋轉自如地支撐於一對氣缸裝置63、63的桿64、64上,所述一對氣缸裝置63、63沿薄板條W的寬度方向配設。由此,藉由氣缸裝置63、63使桿64、64伸縮,而可以使薄板條W的包角(θ)可變化。 The wrap angle adjusting unit 58A is as shown in FIG. 1 at the support roller 12 and the guide roller 61. An engagement roller 62 joined to the thin strip W is provided on the thin slat transfer line. The thin strip W is placed in an S shape and is carried between the support roller 12, the joining roller 62, and the guide roller 61. Both ends of the rotating shaft of the joining roller 62 are rotatably supported by the rods 64 and 64 of the pair of cylinder devices 63 and 63, and the pair of cylinder devices 63 and 63 are disposed along the width direction of the thin strip W. Thereby, the rods 64 and 64 are expanded and contracted by the cylinder devices 63 and 63, and the wrap angle (θ) of the thin strip W can be changed.

夾持壓力調整單元58B調整在支持輥12與清潔輥14之 間夾持薄板條W的夾持壓力,並藉由通過信號電纜將第2氣缸裝置42與控制器60相連接而構成。即,藉由來自控制器60的指令,來控制第2氣缸裝置42中的活塞桿的伸長量,由此調整夾持壓力。再者,第1氣缸裝置30進行支持輥12的裝卸。第3氣缸裝置54調整清潔輥14與黏著輥16之間的夾持壓力。所述第1氣缸裝置30及第3氣缸裝置54的控制既可以由控制器60來兼任,也可以設置其它控制器。 The clamping pressure adjusting unit 58B is adjusted between the support roller 12 and the cleaning roller 14 The nip pressure of the thin strip W is sandwiched between the second cylinder device 42 and the controller 60 by a signal cable. That is, the amount of elongation of the piston rod in the second cylinder device 42 is controlled by an instruction from the controller 60, thereby adjusting the nip pressure. Further, the first cylinder device 30 performs attachment and detachment of the backup roller 12. The third cylinder device 54 adjusts the nip pressure between the cleaning roller 14 and the adhesive roller 16. The control of the first cylinder device 30 and the third cylinder device 54 may be performed by the controller 60, or another controller may be provided.

其次,說明使用如上所述構成的異物去除裝置10去除附 著於薄板條W的面上的異物的異物去除方法。 Next, the removal of the attachment using the foreign matter removing device 10 constructed as described above will be described. A method of removing foreign matter from foreign matter on the surface of the thin strip W.

藉由使第1氣缸裝置30與第2氣缸裝置42的活塞桿 30A、活塞桿42A進行伸長動作,來夾持薄板條W,所述薄板條W捲繞並支撐於支持輥12上而被搬送。由此,將附著於薄板條W的面上的塵埃等異物轉印至清潔輥14來去除。 By the piston rods of the first cylinder device 30 and the second cylinder device 42 30A. The piston rod 42A is extended to hold the thin strip W, and the thin strip W is wound and supported on the support roller 12 to be conveyed. Thereby, foreign matter such as dust adhering to the surface of the thin strip W is transferred to the cleaning roller 14 and removed.

並且,藉由使第3氣缸裝置54的活塞桿54A進行伸長動 作,而使黏著輥16按壓至清潔輥14,因此將轉印至清潔輥14的 異物進而轉印至黏著輥16而去除。由此,可連續地去除所搬送的薄板條W的面的異物。 Further, the piston rod 54A of the third cylinder device 54 is extended. The adhesive roller 16 is pressed to the cleaning roller 14, and thus will be transferred to the cleaning roller 14. The foreign matter is further transferred to the adhesive roller 16 to be removed. Thereby, the foreign material on the surface of the conveyed thin strip W can be continuously removed.

在所述異物去除時,利用中央部周速測定單元56A及端 部周速測定單元56B來依次測定清潔輥14的輥中央部的旋轉周速V1及支持輥12的輥端部的旋轉周速V2,並將測定值依次發送至控制器60。控制器60根據所測定的旋轉周速V1、旋轉周速V2,運算出以[(V2-V1)/V1]×100表示的周速差率,判斷周速差率是否為0.5%以下。 When the foreign matter is removed, the central portion peripheral speed measuring unit 56A and the end are utilized. The partial peripheral speed measuring unit 56B sequentially measures the rotational circumferential speed V1 of the roller center portion of the cleaning roller 14 and the rotational circumferential speed V2 of the roller end portion of the backup roller 12, and sequentially transmits the measured values to the controller 60. The controller 60 calculates a circumferential speed difference ratio expressed by [(V2 - V1) / V1] × 100 based on the measured rotational circumferential speed V1 and the rotational circumferential speed V2, and determines whether or not the circumferential speed difference ratio is 0.5% or less.

接著,若周速差率為0.5%以下,則控制器60使異物去除 裝置10仍舊運轉。並且,當周速差率超過0.5%時,控制器60控制包角調整單元58A及夾持壓力調整單元58B中的至少一個,使周速差率達到0.5%以下。即,藉由包角調整單元58A,而縮小捲繞在支持輥12上的薄板條W的包角(θ),以使所述包角(θ)例如達到20°以下。並且,調整夾持壓力調整單元58B,以使夾持壓力例如達到0.5N/cm以上、1.0N/cm以下的方式進行調整。 Next, if the circumferential speed difference is 0.5% or less, the controller 60 removes the foreign matter. Device 10 is still operating. Further, when the weekly speed difference ratio exceeds 0.5%, the controller 60 controls at least one of the wrap angle adjusting unit 58A and the nip pressure adjusting unit 58B so that the circumferential speed difference ratio is 0.5% or less. That is, the wrap angle (θ) of the thin strip W wound around the support roller 12 is reduced by the wrap angle adjusting unit 58A so that the wrap angle (θ) is, for example, 20° or less. Then, the nip pressure adjusting unit 58B is adjusted so that the nip pressure is, for example, 0.5 N/cm or more and 1.0 N/cm or less.

由此,周速差率達到0.5%以下,因此在以黏著橡膠輥方 式去除薄板條異物時,異物的去除效率好,並且可有效抑制在薄板條W的背面(沒有塗布膜的面)上沿薄板條行走方向產生條紋狀的擦痕P(參照圖4)或產生灰塵。 Therefore, the circumferential speed difference rate is less than 0.5%, so the adhesive rubber roller is used. When the thin strip of foreign matter is removed, the removal efficiency of the foreign matter is good, and the stripe-like scratches P (refer to FIG. 4) or generated along the traveling direction of the thin strips on the back surface of the thin strip W (the surface without the coated film) can be effectively suppressed. dust.

此處,說明根據薄板條W的張力的大小或夾持壓力的大 小,而在清潔輥14的中央部周速與端部周速之間產生周速差的機制。 Here, the magnitude of the tension or the clamping pressure according to the thin strip W is explained. Small, and a mechanism for generating a peripheral speed difference between the peripheral speed of the central portion of the cleaning roller 14 and the peripheral speed of the end portion.

圖5是誇大表現支持輥12因薄板條W的張力而撓曲成 弓狀的狀態的圖。並且,圖6是沿a-a線切斷圖5所示的支持輥12的輥中央部的剖面圖,圖7的(A)是沿b-b線切斷輥端部的剖面圖。 Figure 5 is an exaggeration showing that the support roller 12 is deflected by the tension of the thin strip W. A diagram of the state of the bow. 6 is a cross-sectional view of the center portion of the roller of the support roller 12 shown in FIG. 5 taken along line a-a, and FIG. 7(A) is a cross-sectional view of the end portion of the cutting roller taken along line b-b.

當如圖5所示支持輥12因薄板條W的張力而撓曲時, 清潔輥14的輥中央部向夾持壓力減弱的方向起作用。因此,如圖6所示,清潔輥14的輥中央部的變形少。並且,清潔輥14的輥中央部與薄板條W相接觸,具有黏著性而對薄板條W的夾緊(grip)力大,因此以與薄板條W的搬送速度相同的速度進行旋轉。 When the support roller 12 is deflected by the tension of the thin strip W as shown in FIG. 5, The center portion of the roller of the cleaning roller 14 acts in a direction in which the clamping pressure is weakened. Therefore, as shown in FIG. 6, the deformation of the center portion of the roller of the cleaning roller 14 is small. Further, the center portion of the roller of the cleaning roller 14 is in contact with the thin strip W, and has adhesiveness and a large grip force to the thin strip W. Therefore, the cleaning roller 14 rotates at the same speed as the transport speed of the thin strip W.

另一方面,清潔輥14的兩端部不經由薄板條W而與支 持輥12直接接觸,所述清潔輥14的輥面長大於薄板條W的寬度。 並且,藉由經撓曲的支持輥12而向夾持壓力增強的方向起作用,因此清潔輥14的輥兩端部的變形增大。 On the other hand, both ends of the cleaning roller 14 are not supported by the thin strips W The holding roller 12 is in direct contact, and the roll surface length of the cleaning roller 14 is larger than the width of the thin strip W. Further, since the deflecting support roller 12 acts in the direction in which the nip pressure is increased, the deformation of both ends of the roller of the cleaning roller 14 is increased.

圖7的(B)是清潔輥14的輥端部與支持輥12的接觸部 分的放大圖。如圖7的(B)所示,橡膠製的清潔輥14(以斜線表示)的輥端部在以B1-B2表示的部分呈凹狀地變形,所述橡膠製的清潔輥14比支持輥12更軟。此外,凹狀的兩端被支持輥12稍微覆蓋,因此結果為,清潔輥14的輥端部在A1-A2的部分呈凹狀地與支持輥12相接觸。並且,以A1-A2表示的凹狀的曲線的長度大於以B1-B2表示的凹狀的曲線的長度,因此清潔輥14的輥端部的旋轉周速大於輥中央部的旋轉周速。 (B) of FIG. 7 is a contact portion of the roller end portion of the cleaning roller 14 and the support roller 12 A magnified view of the points. As shown in (B) of FIG. 7, the roller end portion of the rubber-made cleaning roller 14 (indicated by oblique lines) is concavely deformed at a portion indicated by B1-B2, and the rubber-made cleaning roller 14 is more than the support roller. 12 is softer. Further, both ends of the concave shape are slightly covered by the support roller 12, and as a result, the roller end portion of the cleaning roller 14 is in concave contact with the support roller 12 at the portion of A1-A2. Further, the length of the concave curve indicated by A1-A2 is larger than the length of the concave curve indicated by B1-B2, and therefore the rotational peripheral speed of the roller end portion of the cleaning roller 14 is larger than the rotational peripheral speed of the central portion of the roller.

並且,清潔輥14的輥兩端部與支持輥12的輥兩端部直 接接觸而夾緊,因此使支持輥12以與清潔輥14的兩端部的旋轉周速相同的旋轉周速進行旋轉。即,如上所述,支持輥12的輥端部的旋轉周速V2可視作清潔輥14的輥端部的旋轉周速。 Further, both ends of the roller of the cleaning roller 14 and the both ends of the roller of the backup roller 12 are straight Since the contact is clamped, the support roller 12 is rotated at the same rotational peripheral speed as the rotational peripheral speed of both end portions of the cleaning roller 14. That is, as described above, the rotational peripheral speed V2 of the roller end portion of the backup roller 12 can be regarded as the rotational peripheral speed of the roller end portion of the cleaning roller 14.

其結果為,支持輥12的旋轉周速大於薄板條W的搬送 速度,支持輥12與薄板條W產生滑動(slip)。 As a result, the rotation peripheral speed of the support roller 12 is larger than the conveyance of the thin strip W At the speed, the support roller 12 and the thin strip W generate a slip.

由此,如圖4所示,因附著於薄板條W的背面上的塵埃 等異物而在薄板條W的背面上沿薄板條搬送方向產生擦痕P。例如,因1%的滑動而產生約200μm的擦痕。並且,容易因滑動而產生灰塵。 Thereby, as shown in FIG. 4, the dust adhered to the back surface of the thin strip W The foreign matter is caused to generate the scratches P on the back surface of the thin strip W in the direction in which the thin strips are conveyed. For example, a scratch of about 200 μm is produced due to 1% sliding. Moreover, it is easy to generate dust due to sliding.

並且,因支持輥12的撓曲導致清潔輥14的輥中央部上 的夾持壓力減弱,由此異物去除效率也下降。 And, due to the deflection of the support roller 12, the center portion of the roller of the cleaning roller 14 is The clamping pressure is weakened, whereby the foreign matter removal efficiency is also lowered.

再者,以上所說明的機制是如下情況,即,支持輥12因 薄板條W的張力而發生撓曲,由此在清潔輥14的輥中央部與輥端部產生周速差。但是,當支持輥12或清潔輥14因夾持壓力而發生撓曲時也是因同樣的機制,而在清潔輥14的輥中央部與輥端部產生周速差。 Furthermore, the mechanism described above is a case where the support roller 12 is The tension of the thin strip W is deflected, whereby a peripheral speed difference is generated at the center portion of the roller of the cleaning roller 14 and the end portion of the roller. However, when the support roller 12 or the cleaning roller 14 is deflected by the nip pressure, the same mechanism is employed, and a peripheral speed difference is generated at the center portion of the roller of the cleaning roller 14 and the roller end portion.

因此,本發明者努力研究了清潔輥14的輥中央部的旋轉 周速V1與支持輥12的輥兩端部的旋轉周速V2的差、換而言之、清潔輥14的輥中央部的旋轉周速V1與清潔輥14的輥兩端部的旋轉周速的差可容許到何種程度的結果,得知只要以[(V2-V1)/V1]×100表示的周速差率為0.5%以下,則在異物去除性能、擦痕及灰塵產生的抑制方面不存在實際應用上的問題。 Therefore, the inventors have made an effort to study the rotation of the center portion of the roller of the cleaning roller 14. The difference between the peripheral speed V1 and the rotational peripheral speed V2 of the both ends of the roller of the backup roller 12, in other words, the rotational peripheral speed V1 of the roller central portion of the cleaning roller 14 and the rotational peripheral speed of the both ends of the roller of the cleaning roller 14 The degree of the difference can be tolerated, and it is found that as long as the circumferential speed difference expressed by [(V2-V1)/V1]×100 is 0.5% or less, the foreign matter removal performance, scratches, and dust generation are suppressed. There are no practical problems in the aspect.

並且,藉由實施以下三種方法中的至少一種,周速差率可以達到0.5%以下。 Further, the peripheral speed difference can be made 0.5% or less by performing at least one of the following three methods.

(1)使用支持輥12、清潔輥14及黏著輥16中至少支持輥12及清潔輥14的軸芯方向的撓曲量為50μm以下的低撓曲輥。 (1) A low deflection roller having a deflection amount of at least 50 μm in the axial direction of at least the support roller 12, the cleaning roller 14, and the cleaning roller 16 is used.

(2)藉由包角調整單元58A而調整捲繞並支撐於支持輥12上的薄板條W的包角(θ)。 (2) The wrap angle (θ) of the thin strip W wound and supported on the support roller 12 is adjusted by the wrap angle adjusting unit 58A.

圖8是表示捲繞在支持輥12上的薄板條W的包角(θ)及薄板條張力與支持輥12的輥撓曲量(μm)的關係的圖。如自圖8所知,在相同的薄板條張力下,包角(θ)越大,支持輥12的輥撓曲量越大。因此,藉由利用包角調整單元58A來縮小捲繞並支撐於支持輥12上的薄板條W的包角(θ),可縮小支持輥12的輥撓曲量。由此,根據以上所說明的機制,可縮小清潔輥14的周速差率。作為包角(θ),優選的是設為20°以下。 8 is a view showing a relationship between a wrap angle (θ) of the thin strip W wound around the backup roll 12 and a sheet tension of the sheet and a roll deflection amount (μm) of the backup roll 12. As is known from Fig. 8, under the same sheet tension, the larger the wrap angle (θ), the larger the amount of roll deflection of the support roller 12. Therefore, by reducing the wrap angle (θ) of the thin strip W wound and supported on the support roller 12 by the wrap angle adjusting unit 58A, the amount of roll deflection of the support roller 12 can be reduced. Thereby, according to the mechanism described above, the peripheral speed difference rate of the cleaning roller 14 can be reduced. The wrap angle (θ) is preferably set to 20° or less.

(3)藉由夾持壓力調整單元58B,而調整支持輥12與清潔輥14之間的夾持壓力。 (3) The nip pressure between the support roller 12 and the cleaning roller 14 is adjusted by the nip pressure adjusting unit 58B.

圖9是表示夾持壓力(N/cm)與支持輥12的旋轉周速的關係的圖。圖9的以三角形表示的點所連成的線為支持輥12的旋轉周速(m/min)。並且,以四邊形表示的點所連成的線為搬送薄板條W的搬送輥(pass roller)的旋轉周速(m/min),相當於薄板條W的搬送速度。 FIG. 9 is a view showing the relationship between the nip pressure (N/cm) and the rotational peripheral speed of the backup roller 12. The line formed by the dots indicated by the triangle in Fig. 9 is the rotational peripheral speed (m/min) of the support roller 12. Further, the line formed by the dots indicated by the quadrilateral is the rotational peripheral speed (m/min) of the transport roller that transports the thin strip W, and corresponds to the transport speed of the thin strip W.

若將夾持壓力增大下去,則根據以上所說明的機制,清潔輥14的輥端部的旋轉周速增大,隨之支持輥12的旋轉周速增 大。 If the nip pressure is increased, the rotational peripheral speed of the roller end portion of the cleaning roller 14 is increased in accordance with the mechanism described above, and the rotational peripheral speed of the support roller 12 is increased accordingly. Big.

因此,藉由利用夾持壓力調整單元58B來縮小支持輥12與清潔輥14的夾持壓力,根據以上所說明的機制,可縮小清潔輥14的周速差率。作為夾持壓力,優選的是設為0.5N/cm以上、1.0N/cm以下。 Therefore, by reducing the nip pressure of the support roller 12 and the cleaning roller 14 by the nip pressure adjusting unit 58B, the peripheral speed difference of the cleaning roller 14 can be reduced according to the mechanism described above. The nip pressure is preferably 0.5 N/cm or more and 1.0 N/cm or less.

[實施例] [Examples]

關於本發明的實施方式中所說明的薄板條的異物去除方法及異物去除裝置,具體說明進行試驗的結果。 The foreign matter removing method and the foreign matter removing device of the thin strip described in the embodiment of the present invention will be specifically described as a result of the test.

[異物去除裝置的條件] [Conditions of foreign matter removal device]

<薄板條> <thin slats>

.種類……三醋酸纖維素膜(TAC,triacetate cellulose) . Type... TAC, triacetate cellulose

.寬度……1490mm . Width...1490mm

.搬送速度……100m/分 . Transfer speed...100m/min

.搬送張力……350N . Transfer tension...350N

<支持輥> <Support Roller>

.輥面長……1650mm . Roll surface length...1650mm

.輥徑……110mm . Roller diameter...110mm

.種類……金屬製輥 . Type... metal roll

.使用了撓曲量約為600μm的鋁管式的支持輥、及撓曲量約為50μm的低撓曲式的支持輥兩種。 . An aluminum tube type support roll having a deflection amount of about 600 μm and a low deflection type support roll having a deflection amount of about 50 μm were used.

<清潔輥> <cleaning roller>

.輥面長……1650mm . Roll surface length...1650mm

.輥徑……110mm . Roller diameter...110mm

.種類……黏著性橡膠輥 . Type... adhesive rubber roller

.橡膠硬度……35° . Rubber hardness...35°

.黏著力……10hPa . Adhesion...10hPa

.使用了撓曲量約為600μm的鋁管式的清潔輥、及撓曲量約為50μm的低撓曲式的清潔輥兩種。 . An aluminum tube type cleaning roller having a deflection amount of about 600 μm and a low deflection type cleaning roller having a deflection amount of about 50 μm were used.

<黏著輥> <adhesive roller>

.輥面長……1650mm . Roll surface length...1650mm

.輥徑……100mm . Roller diameter...100mm

.種類……黏著性橡膠輥 . Type... adhesive rubber roller

.黏著力……90hPa . Adhesion...90hPa

.使用了撓曲量約為600μm的鋁管式的黏著輥、及撓曲量約為50μm的低撓曲式的黏著輥兩種。 . An aluminum tube type adhesive roller having a deflection amount of about 600 μm and a low deflection type adhesive roller having a deflection amount of about 50 μm were used.

<備註> <Remarks>

.在表1中,將支持輥顯示為“BUR”,將清潔輥顯示為“CLR”,將黏著輥顯示為“黏著R”。 . In Table 1, the support roller is shown as "BUR", the cleaning roller is shown as "CLR", and the adhesive roller is shown as "adhesive R".

.在表1的“輥撓曲量”中,支持輥與清潔輥及黏著輥的撓曲方向為相反,因此對支持輥的撓曲量標附“-”。 . In the "roller deflection amount" of Table 1, the deflection directions of the support roller and the cleaning roller and the adhesive roller are opposite, and therefore the amount of deflection of the support roller is marked "-".

.表1的“中央部周速”是利用清潔輥(CLR)來測定的周速(V1),“端部周速”是利用支持輥(BUR)來測定的周速(V2)。 . The "central peripheral speed" in Table 1 is the peripheral speed (V1) measured by the cleaning roller (CLR), and the "end peripheral speed" is the peripheral speed (V2) measured by the support roller (BUR).

.表1的“輥撓曲量”是在輥中央部、輥兩端部分別配置雷射位移計來測定。 . The "roller deflection amount" in Table 1 was measured by disposing a laser displacement meter at the center portion of the roller and both ends of the roller.

[評價項目] [evaluation project]

<除塵性能的評價方法> <Evaluation method of dust removal performance>

自光源對薄板條的一個面照射光,並且對另一個面使用 配置有電荷耦合器件(charge coupled device,CCD)相機的透射型面檢裝置。並且,以除塵率進行評價,所述除塵率是將利用清潔輥進行除塵前的薄板條每單位m的異物個數(10μm以上的異物)設為A,將利用清潔輥進行除塵後的薄板條每單位m的異物個數(10μm以上的異物)設為B時以下式來表示。 Light from one side of the thin strip from the light source and used on the other side A transmissive surface inspection device equipped with a charge coupled device (CCD) camera. In addition, the dust removal rate is a number of foreign matter per unit m (foreign matter of 10 μm or more) of the thin strip before dust removal by the cleaning roller, and the thin strip is removed by the cleaning roller. When the number of foreign matters per unit m (foreign matter of 10 μm or more) is B, it is represented by the following formula.

除塵率(%)=[1-(B/A)]×100 Dust removal rate (%) = [1-(B/A)] × 100

<薄板條背面的擦痕的評價方法> <Evaluation method of scratches on the back side of thin slats>

自光源對薄板條的一個面照射光,並且對與光源相同的一個面使用配置有CCD相機的反射型面檢裝置。 One surface of the thin strip is irradiated with light from the light source, and a reflective surface inspection device equipped with a CCD camera is used for the same surface as the light source.

接著,以擦痕產生個數進行評價,所述擦痕產生個數是將利用清潔輥進行除塵前的薄板條每單位m的擦痕個數(50μm以上的擦痕)設為C,將利用清潔輥進行除塵後的薄板條每單位面積的擦痕個數(50μm以上的擦痕)設為D時以下式來表示。 Next, the number of the scratches is evaluated, and the number of the scratches is set to C (the scratch of 50 μm or more) per unit m of the thin strip before dust removal by the cleaning roller, and is used as C. When the number of scratches per unit area (scratch of 50 μm or more) of the thin strip after dust removal by the cleaning roller is set to D, it is expressed by the following formula.

擦痕產生個數=D-C(個/m) Number of scratches = D-C (pieces / m)

<評價的方法> <Method of evaluation>

*A……在表示除塵性能的除塵率為60%以上,薄板條背面的擦痕產生個數未達0.001個/m時指“非常好”。 *A... When the dust removal rate indicating the dust removal performance is 60% or more, the number of scratches on the back side of the thin strip is less than 0.001/m, which means "very good".

*B……在表示除塵性能的除塵率為40%以上~未達60%,薄板條背面的擦痕產生個數為0.001個/m以上~未達0.01個/m時指“好”。 *B... The dust removal rate indicating dust removal performance is 40% or more to less than 60%, and the number of scratches on the back side of the thin strip is 0.001/m or more ~ less than 0.01/m means "good".

*C……在表示除塵性能的除塵率未達40%,薄板條背面的擦痕產生個數為0.01個/m以上時指“差”。 *C... When the dust removal rate indicating dust removal performance is less than 40%, and the number of scratches on the back side of the thin strip is 0.01/m or more, it means "poor".

[試驗結果] [test results]

如自表1的試驗1~試驗4的比較所知,當支持輥、清潔 輥、黏著輥均使用鋁管式的輥,並且將夾持壓力固定在2.0N/cm時,藉由改變對支持輥的薄板條的包角,支持輥的撓曲量發生變化。 As known from the comparison of Test 1 to Test 4 in Table 1, when supporting rolls, cleaning When the roll and the adhesive roll were both aluminum-rolled rolls, and the holding pressure was fixed at 2.0 N/cm, the amount of deflection of the support roll was changed by changing the wrap angle of the thin strip of the support roll.

並且,如自試驗5~試驗8的比較所知,藉由將支持輥變 為低撓曲的輥,而與試驗1~試驗4相比,支持輥的撓曲量減少至100μm以下。 And, as known from the comparison of Test 5 to Test 8, by supporting the support roller For the low-flex roller, the amount of deflection of the support roller was reduced to 100 μm or less as compared with Test 1 to Test 4.

但是,試驗1~試驗8中,夾持壓力大,為2.0N/cm,並 且清潔輥的撓曲量大,為100μm,因此清潔輥的周速差率高達1%~2%。即,周速差率沒有達到滿足本發明的0.5%以下。其結果,異物去除性能評價為“C”~“B”,並且薄板條背面的擦痕均評價為“C”,綜合評價也為“C”。 However, in Tests 1 to 8, the clamping pressure was large, 2.0 N/cm, and Moreover, the amount of deflection of the cleaning roller is as large as 100 μm, so the peripheral speed difference of the cleaning roller is as high as 1% to 2%. That is, the circumferential speed difference does not reach 0.5% or less which satisfies the present invention. As a result, the foreign matter removal performance was evaluated as "C" to "B", and the scratches on the back surface of the thin strip were evaluated as "C", and the overall evaluation was also "C".

與此相對,試驗9是將試驗8的夾持壓力減小至1.0N/cm 為止的情況,清潔輥的撓曲量減小至50μm為止。由此,清潔輥的周速差率達到0.5%,從而滿足本發明。其結果,試驗9的異物去除性能評價為“A”,並且薄板條背面的擦痕均評價為“B”,綜合評價為“B”。 In contrast, Test 9 was to reduce the clamping pressure of Test 8 to 1.0 N/cm. In the case of this, the amount of deflection of the cleaning roller was reduced to 50 μm. Thereby, the peripheral speed difference rate of the cleaning roller reaches 0.5%, thereby satisfying the present invention. As a result, the foreign matter removal performance of Test 9 was evaluated as "A", and the scratches on the back surface of the thin strip were evaluated as "B", and the overall evaluation was "B".

此外,試驗10、試驗11是將支持輥及清潔輥兩根輥設為 低撓曲輥,並且將包角固定在20°,將夾持壓力設為2.0N/cm及1.0N/cm兩個方面來進行的情況。其結果為,支持輥及清潔輥的撓曲量均縮小,清潔輥的周速差率也縮小,在試驗10中為0.1%, 在試驗11中為0.0%。由此,試驗10的異物去除性能為“A”,薄板條背面的擦痕為“B”,綜合評價也為“B”。此外,試驗11的異物去除性能、薄板條背面的擦痕、綜合評價均評價為“A”。 In addition, in Test 10 and Test 11, the support roller and the cleaning roller were set to two rollers. The low deflection roller was fixed at 20° and the clamping pressure was set to 2.0 N/cm and 1.0 N/cm. As a result, the amount of deflection of the support roller and the cleaning roller was reduced, and the peripheral speed difference of the cleaning roller was also reduced, which was 0.1% in Test 10. In Test 11, it was 0.0%. Thus, the foreign matter removal performance of Test 10 was "A", the scratch on the back side of the thin strip was "B", and the overall evaluation was also "B". Further, the foreign matter removal performance of the test 11, the scratch on the back side of the thin strip, and the overall evaluation were all evaluated as "A".

並且,試驗12、試驗13是將支持輥、清潔輥、黏著輥三根輥設為低撓曲輥,並且將包角固定在20°,將夾持壓力設為2.0N/cm及1.0N/cm兩個水平來進行的情況。其結果為,支持輥、清潔輥、黏著輥的撓曲量均縮小,清潔輥的周速差率也縮小,在試驗12中為0.1%,在試驗13中為0.0%。由此,試驗12的異物去除性能為“A”,薄板條背面的擦痕為“B”,綜合評價也為“B”。此外,試驗13的異物去除性能、薄板條背面的擦痕、綜合評價均評價為“B”。 Further, in Test 12 and Test 13, the support roller, the cleaning roller, and the adhesive roller were set as low deflection rollers, and the wrap angle was fixed at 20°, and the nip pressure was set to 2.0 N/cm and 1.0 N/cm. Two levels to carry out the situation. As a result, the amount of deflection of the support roller, the cleaning roller, and the adhesive roller was reduced, and the peripheral speed difference of the cleaning roller was also reduced, which was 0.1% in Test 12 and 0.0% in Test 13. Thus, the foreign matter removal performance of the test 12 was "A", the scratch on the back side of the thin strip was "B", and the overall evaluation was also "B". Further, the foreign matter removal performance of the test 13, the scratch on the back side of the thin strip, and the overall evaluation were all evaluated as "B".

並且,試驗14、試驗15是將支持輥、清潔輥、黏著輥三根輥設為低撓曲輥,並且將包角固定在20°,將夾持壓力設為0.5N/cm及0.3N/cm兩個水平來進行的情況。其結果,當將夾持壓力設為0.5N/cm時,支持輥、清潔輥、黏著輥的撓曲量均縮小,清潔輥的周速差率在試驗14中也達到0.0%。由此,試驗14中,異物去除性能為“A”,薄板條背面的擦痕為“A”,綜合評價也為“A”。 Further, in Test 14 and Test 15, the support roller, the cleaning roller, and the adhesive roller were set as low deflection rollers, and the wrap angle was fixed at 20°, and the nip pressure was set to 0.5 N/cm and 0.3 N/cm. Two levels to carry out the situation. As a result, when the nip pressure was set to 0.5 N/cm, the amount of deflection of the support roller, the cleaning roller, and the adhesive roller was reduced, and the peripheral speed difference of the cleaning roller also reached 0.0% in Test 14. Thus, in Test 14, the foreign matter removal performance was "A", the scratch on the back side of the thin strip was "A", and the overall evaluation was also "A".

相對於此,在如試驗15般將夾持壓力設為0.3N/cm時,雖然支持輥、清潔輥、黏著輥三根輥的撓曲量縮小,但是支持輥的端部周速變得小於清潔輥的中央部周速。由此,雖然試驗15的異物去除性能為“B”,但是薄板條背面的擦痕為“C”,綜合評 價也為“C”。 On the other hand, when the nip pressure was set to 0.3 N/cm as in Test 15, the deflection amount of the support roller, the cleaning roller, and the adhesive roller was reduced, but the peripheral speed of the support roller became smaller than the cleaning. The center of the roller is at a peripheral speed. Thus, although the foreign matter removal performance of the test 15 is "B", the scratch on the back side of the thin strip is "C", comprehensive evaluation The price is also "C".

由此可知,藉由將夾持壓力調整為0.5N/cm以上、1.0 N/cm以下,支持輥的輥中央部與輥端部的周速差進一步縮小,從而可提高異物去除性能,另一方面可更有效地防止在薄板條背面上產生擦痕。 It can be seen that the clamping pressure is adjusted to 0.5 N/cm or more and 1.0. Below N/cm, the circumferential speed difference between the center portion of the roller of the support roller and the end portion of the roller is further reduced, so that the foreign matter removing performance can be improved, and on the other hand, the occurrence of scratches on the back surface of the thin strip can be more effectively prevented.

並且,作為評價項目,並沒有“灰塵產生”的記載,但 是藉由將清潔輥的周速差率設為0.5%以下,也可以有效抑制“灰塵產生”。 Moreover, as an evaluation item, there is no description of "dust generation", but It is also possible to effectively suppress "dust generation" by setting the circumferential speed difference of the cleaning roller to 0.5% or less.

根據所述實施例的結果,藉由調整捲繞並支撐於支持輥 上的薄板條的包角度及支持輥與清潔輥的夾持壓力,可使清潔輥的周速差率為0.5%以下。 According to the result of the embodiment, the winding is supported and supported on the support roller The package angle of the upper slats and the nip pressure of the support roller and the cleaning roller can make the cleaning roller have a peripheral speed difference of 0.5% or less.

並且,根據試驗1~試驗15的結果,異物去除性能、薄 板條背面的擦痕及綜合評價均評價為“A”是周速差率為0.0%的情況,周速差率0.0%可以說是最佳模式(best mode)。 And, according to the results of Test 1 to Test 15, foreign matter removal performance, thin The scratches on the back side of the slats and the overall evaluation were evaluated as "A" in which the circumferential speed difference rate was 0.0%, and the circumferential speed difference rate of 0.0% was said to be the best mode.

在這種情況下,藉由將低撓曲輥用於支持輥、清潔輥、 黏性輥中的至少支持輥及清潔輥,可獲得更好的結果。 In this case, by using a low deflection roller for the support roller, the cleaning roller, Better results can be obtained with at least the support roller and the cleaning roller in the viscous roller.

但是,為了應用於大尺寸的液晶顯示裝置或者提高良 率,光學膜的寬度具有放大化的傾向,所使用的支持輥、清潔輥、黏著輥的輥面長均加長,變得容易撓曲。而且,有時根據光學膜的生產線配置,捲繞於支持輥上的包角度也不得不增大。 However, in order to be applied to a large-sized liquid crystal display device or to improve the quality At the rate, the width of the optical film tends to be enlarged, and the lengths of the roll surfaces of the support roll, the cleaning roll, and the adhesive roll used are all lengthened, and it becomes easy to bend. Moreover, depending on the production line configuration of the optical film, the angle of the package wound on the support roller may have to be increased.

因此,優選的是使用支持輥、清潔輥及黏著輥中至少支 持輥及清潔輥的軸芯方向的撓曲量為50μm以下的低撓曲輥,並 且利用包角調整單元及夾持壓力調整單元來調整包角或夾持壓力,由此使清潔輥的周速差率為0.5%以下。 Therefore, it is preferred to use at least a support roller, a cleaning roller, and an adhesive roller. a low deflection roller having a deflection amount of 50 μm or less in the axial direction of the holding roller and the cleaning roller, and Further, the wrap angle adjustment unit and the nip pressure adjusting unit adjust the wrap angle or the nip pressure, thereby making the cleaning roll have a circumferential speed difference of 0.5% or less.

12‧‧‧支持輥 12‧‧‧Support roll

14‧‧‧清潔輥 14‧‧‧cleaning roller

16‧‧‧黏著輥 16‧‧‧Adhesive roller

18‧‧‧第1移動平臺 18‧‧‧1st mobile platform

20‧‧‧輥支撐台 20‧‧‧Roll support table

22‧‧‧軸承 22‧‧‧ Bearing

24‧‧‧基座 24‧‧‧Base

26‧‧‧第1軌道 26‧‧‧1 track

28‧‧‧線性導向件 28‧‧‧Linear guides

30‧‧‧第1氣缸裝置 30‧‧‧1st cylinder device

30A‧‧‧活塞桿 30A‧‧‧Piston rod

32‧‧‧第2移動平臺 32‧‧‧2nd mobile platform

34‧‧‧輥支撐台 34‧‧‧Roll support table

36‧‧‧軸承 36‧‧‧ Bearing

38‧‧‧第2軌道 38‧‧‧2nd track

40‧‧‧線性導向件 40‧‧‧Linear guides

42‧‧‧第2氣缸裝置 42‧‧‧2nd cylinder device

42A‧‧‧活塞桿 42A‧‧‧Piston rod

44‧‧‧第3移動平臺 44‧‧‧3rd mobile platform

46‧‧‧輥支撐台 46‧‧‧Roll support table

48‧‧‧軸承 48‧‧‧ bearing

50‧‧‧第3軌道 50‧‧‧3rd track

52‧‧‧線性導向件 52‧‧‧Linear guides

54‧‧‧第3氣缸裝置 54‧‧‧3rd cylinder device

54A‧‧‧活塞桿 54A‧‧‧Piston rod

56A‧‧‧中央部周速測定單元 56A‧‧‧Central Speed Measurement Unit

56B‧‧‧端部周速測定單元 56B‧‧‧End peripheral speed measuring unit

58B‧‧‧夾持壓力調整單元 58B‧‧‧Clamping pressure adjustment unit

60‧‧‧控制器 60‧‧‧ Controller

61‧‧‧導輥 61‧‧‧guide roller

62‧‧‧接合輥 62‧‧‧Joint roller

63‧‧‧氣缸裝置 63‧‧‧Cylinder unit

64‧‧‧桿 64‧‧‧ rod

W‧‧‧薄板條 W‧‧‧thin slats

Claims (9)

一種薄板條的異物去除方法,使用支持輥及清潔輥來去除附著於所述薄板條的表面上的異物,所述支持輥捲繞有並支撐所搬送的薄板條,並且藉由所述薄板條的搬送而從動旋轉,所述清潔輥包含具有黏著性橡膠的輥周面,所述薄板條的異物去除方法的特徵在於包括如下步驟:轉印去除步驟,在所述支持輥與所述清潔輥之間夾持所述薄板條,藉此使附著於所述薄板條的表面上的異物轉印至所述清潔輥;周速測定步驟,測定所述清潔輥的輥中央部的旋轉周速V1(m/min)及所述支持輥的輥端部的旋轉周速V2(m/min);及周速差率調整步驟,調整所述周速差率,以使由[(V2-V1)/V1]×100表示的周速差率滿足0.5%以下。 A foreign matter removing method for a thin strip, which uses a support roller and a cleaning roller to remove foreign matter adhering to a surface of the thin strip, the support roller winding and supporting the conveyed thin strip, and by the thin strip The transport roller is driven to rotate, the cleaning roller includes a roller circumferential surface having an adhesive rubber, and the foreign matter removing method of the thin strip is characterized by comprising the steps of: a transfer removing step, the support roller and the cleaning The thin strips are sandwiched between the rollers, whereby foreign matter adhering to the surface of the thin strip is transferred to the cleaning roller; the peripheral speed measuring step determines the rotational peripheral speed of the central portion of the roller of the cleaning roller V1 (m/min) and a rotation peripheral speed V2 (m/min) of the roller end portion of the support roller; and a circumferential speed difference rate adjustment step of adjusting the circumferential speed difference rate so that [(V2-V1) The circumferential speed difference ratio expressed by /V1]×100 satisfies 0.5% or less. 如申請專利範圍第1項所述的薄板條的異物去除方法,其中更包括如下步驟:將黏著輥按壓至所述清潔輥而使轉印至所述清潔輥的所述異物轉印至所述黏著輥,所述黏著輥包含具有黏著劑層的輥周面。 The method of removing foreign matter of a thin strip according to claim 1, further comprising the steps of: pressing an adhesive roller to the cleaning roller to transfer the foreign matter transferred to the cleaning roller to the An adhesive roller comprising a roller circumferential surface having an adhesive layer. 一種薄板條的異物去除裝置,其特徵在於包括:支持輥,捲繞有並支撐所搬送的薄板條,並且藉由所述薄板條的搬送而從動旋轉;清潔輥,藉由所述薄板條的搬送而從動旋轉,並包含具有黏著性橡膠的輥周面,並且在與所述支持輥之間夾持所述薄板條, 將附著於所述薄板條的表面上的異物轉印至所述輥周面上;中央部周速測定單元,測定所述清潔輥的輥中央部的旋轉周速V1;端部周速測定單元,測定所述支持輥的輥端部的旋轉周速V2;及周速差率調整單元,根據所述輥中央部及所述輥兩端部的測定值,調整由[(V2-V1)/V1]×100表示的周速差率。 A foreign matter removing device for a thin strip, comprising: a supporting roller that winds and supports the conveyed thin strip, and is driven to rotate by the conveying of the thin strip; the cleaning roller, by the thin strip Rotating and moving, and including a circumferential surface of the roller having adhesive rubber, and sandwiching the thin strip between the support roller and the support roller Transferring the foreign matter adhering to the surface of the thin strip to the circumferential surface of the roller; the central portion peripheral speed measuring unit measures the rotational peripheral speed V1 of the central portion of the roller of the cleaning roller; and the end peripheral speed measuring unit And measuring a rotational peripheral speed V2 of the roller end portion of the support roller; and a circumferential speed difference adjustment unit that is adjusted by [(V2-V1)/ according to the measured values of the central portion of the roller and the both ends of the roller The peripheral speed difference ratio represented by V1]×100. 如申請專利範圍第3項所述的薄板條的異物去除裝置,其中包括:黏著輥,按壓至所述清潔輥而將轉印至所述清潔輥的所述異物轉印至具有黏著劑層的輥周面而去除。 A foreign matter removing device for a thin strip according to claim 3, comprising: an adhesive roller that presses the cleaning roller to transfer the foreign matter transferred to the cleaning roller to an adhesive layer The circumference of the roll is removed. 如申請專利範圍第3項或第4項所述的薄板條的異物去除裝置,其中,所述支持輥及所述清潔輥是使用軸芯方向的撓曲量為50μm以下的輥。 The foreign matter removing device for a thin strip according to the third aspect of the invention, wherein the support roller and the cleaning roller are rollers having a deflection amount of 50 μm or less in the axial direction. 如申請專利範圍第3項或第4項所述的薄板條的異物去除裝置,其中,所述周速差率調整單元是如下單元中的至少一個:包角調整單元,調整捲繞在所述支持輥上的所述薄板條的包角度;及夾持壓力調整單元,調整將所述薄板條夾持於所述支持輥與所述清潔輥之間的夾持壓力。 The foreign matter removing device of the thin strip according to claim 3, wherein the peripheral speed difference adjusting unit is at least one of: a wrap angle adjusting unit, and the winding is adjusted in the Supporting a package angle of the thin strip on the roller; and clamping a pressure adjusting unit to adjust a clamping pressure for clamping the thin strip between the support roller and the cleaning roller. 如申請專利範圍第6項所述的薄板條的異物去除裝置,其 中,所述包角調整單元將所述包角度設為20°以下。 a foreign matter removing device for a thin strip as described in claim 6 of the patent application, The wrap angle adjusting unit sets the wrap angle to 20° or less. 如申請專利範圍第6項所述的薄板條的異物去除裝置,其中,所述夾持壓力調整單元將所述夾持壓力調整為0.5N/cm以上、1.0N/cm以下。 The foreign matter removing device for a thin strip according to claim 6, wherein the nip pressure adjusting unit adjusts the nip pressure to 0.5 N/cm or more and 1.0 N/cm or less. 如申請專利範圍第3項所述的薄板條的異物去除裝置,其中,所述薄板條為製造光學膜時的基底膜、中間製品膜、製品膜中的任一者。 The foreign matter removing device for a thin strip according to claim 3, wherein the thin strip is any one of a base film, an intermediate product film, and a product film when the optical film is produced.
TW102126943A 2012-07-27 2013-07-26 Method for removing foreign matter of web and apparatus for removing foreign matter of web TW201404482A (en)

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