TW201402226A - Methods and apparatuses for roll-on coating - Google Patents

Methods and apparatuses for roll-on coating Download PDF

Info

Publication number
TW201402226A
TW201402226A TW101121265A TW101121265A TW201402226A TW 201402226 A TW201402226 A TW 201402226A TW 101121265 A TW101121265 A TW 101121265A TW 101121265 A TW101121265 A TW 101121265A TW 201402226 A TW201402226 A TW 201402226A
Authority
TW
Taiwan
Prior art keywords
substrate
coating
fluid
drum body
liquid
Prior art date
Application number
TW101121265A
Other languages
Chinese (zh)
Inventor
Lutz Rebstock
Klaus Wolke
Original Assignee
Dynamic Micro Systems
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dynamic Micro Systems filed Critical Dynamic Micro Systems
Priority to TW101121265A priority Critical patent/TW201402226A/en
Publication of TW201402226A publication Critical patent/TW201402226A/en

Links

Landscapes

  • Coating Apparatus (AREA)

Abstract

Coating rollers accepting liquid media provide liquid chemicals to substrates for depositing a thin coating layer on the flat substrates, such as semiconductors or panels. The liquid delivery system can control the flow and the pressure of the liquid to achieve optimum process condition with minimum excess waste. Rollers with non-uniform distribution of liquid media can provide a non-uniform thickness profile on the substrates, which can be used to compensate for the non-uniformity of subsequent processes. The liquid media is cooled to a life-preserving temperature while shielded from the thermal energy heating the substrates to prevent degrading the liquid media. Physical barrier or temperature barrier can be established in vicinities of the rollers to further limit exposing the liquid media to high temperature.

Description

用於滾動式塗佈之設備與方法 Apparatus and method for rolling coating

本案為一種用於滾動式塗佈之設備與方法,尤指有關於塗佈基板之用於滾動式塗佈之設備與方法。 The present invention is an apparatus and method for roll coating, and more particularly to an apparatus and method for rolling coating of a coated substrate.

在光電裝置中,光經由光電效應轉換成電能,並經由半導體基板的PN接面收集所產生之電荷,藉以形成電流。PN接面可以透過擴散摻雜至大量半導體材料之方式形成。擴散製程可以在摻雜蒸氣環境中進行,例如:磷化氫(phosphine)或三氯氧磷(POCl3),或者透過固態源釋放摻雜蒸氣。另一個製程方式是可以將摻雜層塗佈於基板上,經過加熱或火烤後,促使摻雜物從摻雜層擴散至基板。而太陽能電池的另一個重要製程是為薄膜沉積,如鈍化塗層或吸收層塗佈。 In an optoelectronic device, light is converted to electrical energy via a photoelectric effect and the generated charge is collected via a PN junction of the semiconductor substrate to form a current. The PN junction can be formed by diffusion doping to a large amount of semiconductor material. The diffusion process can be carried out in a doped vapor environment, such as phosphine or phosphorus oxychloride (POCl3), or the doping vapor is released through a solid source. Another process is to apply a doped layer to the substrate and, after heating or igniting, promote diffusion of dopants from the doped layer to the substrate. Another important process for solar cells is film deposition, such as passivation coating or absorber coating.

線上製程中,如線上摻雜擴散或線上薄膜沉積,是降低成本和毒性的首選製程。例如,在一個典型的線上擴散製程中,基板上係塗佈了含有摻雜物的塗層,接著,在爐中摻雜物將從摻雜層擴散至基板。摻雜源的塗佈可為液態或氣態的形式,可包含或不包含溶劑,以及可包含或不包含載氣,並經由噴塗、浸塗、旋塗或是含摻雜的化學凝結方式來實現。這種系統的均勻性和摻雜層級難以控制,尤其針對織狀結構表面。此外,這些製程往往需要 超量的化學物質,導致生產成本上升。 In-line processes such as on-line doping diffusion or on-line film deposition are the preferred processes for reducing cost and toxicity. For example, in a typical in-line diffusion process, a coating containing dopants is applied to the substrate, and then dopants are diffused from the doped layer to the substrate in the furnace. The doping source may be in a liquid or gaseous form, may or may not contain a solvent, and may or may not contain a carrier gas, and is sprayed, dip coated, spin coated or doped chemically coagulated. . The uniformity and doping levels of such systems are difficult to control, especially for textured surfaces. In addition, these processes often require Excessive amounts of chemicals lead to increased production costs.

本發明係有關於塗佈基板的方法及裝置,如在單晶或多晶矽基板上塗佈薄膜或摻雜層。在一些實施例中,本發明揭露了一種滾塗式塗佈製程,係用於基板表面塗層之塗佈,例如,鈍化塗層或吸收層,或是在高溫退火後摻雜物會擴散至基板的摻雜層,藉以形成太陽能電池的PN接面。 The present invention relates to a method and apparatus for coating a substrate, such as coating a thin film or doped layer on a single crystal or polycrystalline germanium substrate. In some embodiments, the present invention discloses a roll coating process for coating a substrate surface coating, such as a passivation coating or an absorber layer, or after the high temperature annealing, the dopant diffuses to A doped layer of the substrate to form a PN junction of the solar cell.

在一些實施例中,本發明揭露了一種滾塗式基板塗佈之系統,包括至少一塗佈滾筒體,係能接受一流體,並將流體遷移至滾筒體之表面。在接觸一基板之表面後,塗佈滾筒體表面上的流體將轉移至基板之表面,並形成塗層。流體可以包括具有活性化學物質的溶液混合物,於乾燥後即於該基板上形成一固態薄膜層。流體可以包括摻雜化學物質,並持續供應至塗佈滾筒體,藉以透過滾動接觸形成多個基板表面塗層。摻雜化學物質可以包括溶液或混合物形式的硼、砷或是磷化學物質。 In some embodiments, the present invention discloses a roll-on substrate coating system comprising at least one coating drum body capable of receiving a fluid and migrating fluid to the surface of the drum body. After contacting the surface of a substrate, the fluid on the surface of the coating cylinder will be transferred to the surface of the substrate and a coating formed. The fluid may comprise a solution mixture having an active chemical which forms a solid film layer on the substrate upon drying. The fluid may include a doping chemistry and is continuously supplied to the coating drum body to form a plurality of substrate surface coatings through rolling contact. The dopant chemistry can include boron, arsenic or phosphorous chemicals in the form of a solution or mixture.

在一個實施例中,本發明揭露了一種流體供應式滾筒體,包括一圓柱形結構,其係橫跨一大型基板或一些較小的基板。基板可以設置在滾筒體的上方、下方,或是夾於二個滾筒體之間,並隨著滾筒體轉動而移動。流體供應式滾筒體可以設定為於一端接受流體流,並將流體供應至滾筒體之表面。滾筒體可以是空心的,或者具有內部渠道,藉以導引流體順沿滾筒體流動。滾筒體的表 面可以具有多個沿著滾筒體核心長度分佈的連接孔,其係與內部渠道連通,促使流體能轉移至滾筒體的外部表面。在一個實施例中,滾筒體可以進一步包括軟性多孔層,其係覆蓋在滾筒體的外部表面,並受到滾筒體表面的流體濕潤,例如:透過沿著滾筒體核心長度分佈的孔流出的流體濕潤。於接觸一基板後,濕潤的多孔層可將流體帶至基板的表面,有效在基板表面上塗佈流體層。在一個實施例中,流體供應式滾筒體是配置來形成遍及基板表面的均勻塗層,例如:透過沿著滾筒體核心長度均勻分佈的孔,或是透過沿著滾筒體長度孔隙密度均勻的多孔層實現。在另一個實施例中,滾筒體的配置是量身定做來傳遞流體,有效在基板不同部位提供不同的塗層厚度,例如:透過非均勻分佈的孔,或者是孔隙密度非均勻的多孔層。這種厚度非均勻性可以用於彌補後續製程之不均勻情況,例如:在推入摻雜過程中,擴散爐中退火溫度之非均勻性。 In one embodiment, the present invention discloses a fluid supply roller body that includes a cylindrical structure that spans a large substrate or some smaller substrate. The substrate may be disposed above and below the drum body or sandwiched between the two drum bodies and moved as the drum body rotates. The fluid supply drum body can be configured to receive fluid flow at one end and supply fluid to the surface of the drum body. The drum body can be hollow or have internal channels to direct fluid flow along the drum body. Table of the drum body The face may have a plurality of attachment holes distributed along the length of the core of the drum body that communicate with the internal channels to promote fluid transfer to the exterior surface of the drum body. In one embodiment, the drum body may further comprise a soft porous layer covering the outer surface of the drum body and being wetted by the fluid on the surface of the drum body, for example, by fluid flowing out through the holes distributed along the length of the core of the drum body. . After contacting a substrate, the wet porous layer can bring the fluid to the surface of the substrate, effectively coating the fluid layer on the surface of the substrate. In one embodiment, the fluid supply roller body is configured to form a uniform coating throughout the surface of the substrate, for example, through a hole uniformly distributed along the length of the core of the roller body, or through a porous body having a uniform pore density along the length of the roller body. Layer implementation. In another embodiment, the configuration of the drum body is tailored to deliver fluid, effectively providing different coating thicknesses at different locations of the substrate, such as through non-uniformly distributed pores or porous layers having a non-uniform pore density. This thickness non-uniformity can be used to compensate for non-uniformities in subsequent processes, such as non-uniformity of the annealing temperature in the diffusion furnace during push doping.

在一個實施例中,溫度控制裝置,如加熱器或冷卻器,可以用於加熱或冷卻流體,無論是在流體儲藏處、流體輸送路線,以及/或是在滾筒體內部的流體。此外,加熱器/冷卻器可以用來加熱/冷卻滾筒體,以及/或是加熱/冷卻基板,例如在塗層製程中。 In one embodiment, a temperature control device, such as a heater or cooler, can be used to heat or cool the fluid, whether at the fluid reservoir, the fluid delivery route, and/or the fluid inside the drum body. In addition, the heater/cooler can be used to heat/cool the drum body and/or to heat/cool the substrate, such as in a coating process.

在一些實施例中,本發明揭露了用於以高敏感度化學物質進行表面塗層的系統及方法,如在高加工溫度下很容易衰退的化學物質。因此,在一些實施例中,本發明在基板上提供了熱區,例 如:促使化學物質發生反應,以及在稍微遠一點的位置提供冷卻區,例如:以維持化學物質的生命周期,或防止化學物質因暴露在高溫中而退化。 In some embodiments, the present invention discloses systems and methods for surface coating with highly sensitive chemicals, such as chemicals that are susceptible to degradation at high processing temperatures. Thus, in some embodiments, the present invention provides a hot zone on a substrate, such as Such as: to promote the reaction of chemical substances, and to provide a cooling zone at a slightly distant location, for example: to maintain the life cycle of chemicals, or to prevent chemical substances from degrading due to exposure to high temperatures.

在一些實施例中,熱區是由一個或多個加熱器建立而成,如紅外線加熱器或電阻加熱器,並設置在基板鄰近區域,藉以加熱沒有加熱液態化學物質的基板。冷卻區是由一個或多個溫度控制裝置建立而成,如冷卻裝置、珀爾帖裝置(Peltiers devices),或是製冷裝置,並設置在液體儲藏處,或是塗佈滾筒體鄰近的區域,藉以減少暴露在高溫環境中之機會。 In some embodiments, the hot zone is created by one or more heaters, such as an infrared heater or a resistive heater, and is disposed adjacent the substrate to heat the substrate without heating the liquid chemical. The cooling zone is formed by one or more temperature control devices, such as a cooling device, a Peltiers device, or a refrigeration device, and is disposed in a liquid storage area or in an area adjacent to the coating drum body. To reduce the chance of exposure to high temperatures.

在一些實施例中,本發明揭露了多種系統,包括一加熱基板機制;一個或多個塗佈滾筒體,係接觸基板,並接受一液體,同時透過滾動接觸促使液體轉移至該基板表面;一溫度控制裝置,係對應於該液體,藉以令該液體之溫度低於室內溫度,最好是低於10℃,如7℃。塗佈滾筒體可以包括一圓柱形結構,橫跨一大型基板或一些較小的基板。基板可以設置在滾筒體的上方、下方,或是夾於二個滾筒體之間,並隨著滾筒體轉動而移動。塗佈滾筒體可以配置成能接受從流體儲藏處、從其它滾筒體,或是從一導引機制而來的流體,並將其帶往塗佈滾筒體表面。塗佈滾筒體的表面可以包括軟性多孔層,覆蓋在滾筒體的外部表面,並受到滾筒體表面的流體濕潤,例如:從連結的流體儲藏處而來的流體。於接觸一基板後,濕潤的多孔層可將流體帶至基板的表面, 有效地在該基板表面塗佈流體層。在一個實施例中,流體供應式滾筒體是配置來形成遍及基板表面的均勻塗層,例如:透過沿著滾筒體核心長度均勻分佈之多孔層上的孔。在另一個實施例中,滾筒體的配置是量身定做來傳遞流體,有效地在基板不同部位提供不同的塗層厚度,例如:透過非均勻分佈的孔,或者是孔隙密度非均勻的多孔層。這種厚度非均勻性可以用於彌補後續製程之不均勻情況,例如:在推入摻雜過程中,擴散爐中退火溫度的非均勻性。 In some embodiments, the present invention discloses a plurality of systems including a heating substrate mechanism; one or more coating roller bodies that contact the substrate and receive a liquid while permitting transfer of liquid to the surface of the substrate through rolling contact; The temperature control device corresponds to the liquid so that the temperature of the liquid is lower than the indoor temperature, preferably below 10 ° C, such as 7 ° C. The coating drum body can include a cylindrical structure that spans a large substrate or some smaller substrate. The substrate may be disposed above and below the drum body or sandwiched between the two drum bodies and moved as the drum body rotates. The coating drum body can be configured to accept fluid from the fluid reservoir, from other drum bodies, or from a guiding mechanism and carry it to the surface of the coating drum body. The surface of the coating drum body may comprise a soft porous layer covering the outer surface of the drum body and being wetted by fluid from the surface of the drum body, for example, fluid from the associated fluid reservoir. After contacting a substrate, the wet porous layer can bring the fluid to the surface of the substrate. The fluid layer is effectively applied to the surface of the substrate. In one embodiment, the fluid supply roller body is configured to form a uniform coating throughout the surface of the substrate, such as through a hole in the porous layer that is evenly distributed along the length of the core of the roller body. In another embodiment, the configuration of the drum body is tailored to deliver fluid, effectively providing different coating thicknesses at different portions of the substrate, such as through non-uniformly distributed pores or porous layers having non-uniform pore density. . This thickness non-uniformity can be used to compensate for non-uniformities in subsequent processes, such as non-uniformity of the annealing temperature in the diffusion furnace during push-doping.

在一些實施例中,加熱裝置,如加熱器,可用於加熱基板。最好是採用局部加熱方式,例如,避免熱量轉移至液體儲藏處。此外,可利用加熱器/冷卻器來加熱/冷卻塗佈滾筒體。例如,可以提供一個額外的加熱器或冷卻器來加熱或冷卻塗佈滾筒體,以確保流體到達基板時能具備適當的溫度。該溫度最好是低於基板的溫度,以防止塗佈滾筒體退化(如多孔層),或是高敏感度的化學物質退化,這些物質在某些情況下,可能無法長時間暴露於高溫環境中。為了不影響塗佈製程之進行,最好是採用中間溫度。 In some embodiments, a heating device, such as a heater, can be used to heat the substrate. It is best to use local heating, for example, to avoid heat transfer to the liquid reservoir. In addition, a heater/cooler can be utilized to heat/cool the coated drum body. For example, an additional heater or cooler can be provided to heat or cool the coating drum body to ensure that the fluid has the proper temperature when it reaches the substrate. The temperature is preferably lower than the temperature of the substrate to prevent degradation of the coating drum body (such as a porous layer) or degradation of highly sensitive chemicals, which in some cases may not be exposed to high temperatures for extended periods of time. in. In order not to affect the progress of the coating process, it is preferred to use an intermediate temperature.

在一些實施例中,溫度控制裝置,如冷卻器,可用於冷卻流體,無論是在流體儲藏處、流體輸送路線,以及/或是在塗佈滾筒體。冷卻器最好是配置在塗佈滾筒體的鄰近區域,藉以阻止流體暴露至加熱區。例如,冷卻器與塗佈滾筒體的距離可以小於10公分,最好小於5公分,藉此有效防止流體儲藏處之流體受到加熱。 In some embodiments, a temperature control device, such as a cooler, can be used to cool the fluid, whether at the fluid reservoir, the fluid delivery route, and/or at the coating drum body. Preferably, the cooler is disposed adjacent the coating drum body to prevent fluid from being exposed to the heating zone. For example, the distance between the cooler and the coating drum body can be less than 10 centimeters, preferably less than 5 centimeters, thereby effectively preventing fluid in the fluid reservoir from being heated.

在一些實施例中,包括了攪拌機制,藉以均衡流體儲藏處的溫度。該攪拌機制可以包括一個或多個攪拌槳,並配合上旋轉機制來達到攪拌流體的效果。攪拌機制可以包括一循環機制,令流體循環通過冷卻裝置。並且,可以增設過濾器,例如,過濾受到加熱之影響。 In some embodiments, a stirring mechanism is included to balance the temperature at the fluid reservoir. The agitation mechanism may include one or more agitating paddles in conjunction with a rotating mechanism to achieve the effect of agitating the fluid. The agitation mechanism can include a circulation mechanism that circulates fluid through the cooling device. Also, a filter may be added, for example, the filtration is affected by heating.

在一些實施例中,本發明揭露了一種線上塗層系統,包括多個旋轉塗佈滾筒體,藉以塗佈一基板。塗佈滾筒體可以設置在基板的上方,藉以塗佈基板的頂部表面。塗佈滾筒體可以設置在基板的下方,藉以塗佈基板的底部表面。基板可以夾在兩個滾筒體之間,藉以同時塗佈基板的頂部和底部表面。塗佈滾筒體可以同時作為輸送機制,持續將多個基板從線上塗層系統的輸入端移動至輸出端。線上塗層系統可以進一步包括控制減少基板表面上摻雜和承運流體數量的方法,如增設本質具液體吸收之乾燥滾筒體。 In some embodiments, the present invention discloses an in-line coating system comprising a plurality of spin coating drum bodies for coating a substrate. A coating drum body may be disposed above the substrate to coat the top surface of the substrate. The coating drum body may be disposed under the substrate to coat the bottom surface of the substrate. The substrate can be sandwiched between the two roller bodies to simultaneously coat the top and bottom surfaces of the substrate. The coating cylinder body can simultaneously act as a transport mechanism to continuously move a plurality of substrates from the input end of the in-line coating system to the output end. The in-line coating system can further include a method of controlling the amount of doping and carrier fluid on the surface of the substrate, such as the addition of a drying drum body that is inherently liquid absorbing.

在一些實施例中,線上塗層系統更包含額外的塗層機制,如噴塗噴嘴,以提供額外的流體至基板表面。線上塗層系統可以進一步包括額外的滾筒濕潤機制,如提供外部傳送帶,藉以將流體傳送至滾筒體之外部表面,或是在滾筒體上架設盛滿流體的盆體。 In some embodiments, the in-line coating system further includes additional coating mechanisms, such as spray nozzles, to provide additional fluid to the substrate surface. The in-line coating system may further include an additional drum wetting mechanism, such as providing an external conveyor belt to transfer fluid to the exterior surface of the drum body, or a basin filled with fluid on the drum body.

在一些實施例中,本發明揭露了一種整合式線上製程系統,其中包括了用於在基板上塗佈摻雜層的線上塗層系統,並提供線上爐退火系統,藉以驅使摻雜物從表面塗層移入基板。塗層系統和爐退火系統的配置可為彼此相鄰,或是分離,例如:透過輸送 線。系統在程序之前可能還包括一個預先處理步驟,如臭氧處理或是化學氧化處理。 In some embodiments, the present invention discloses an integrated in-line process system including an in-line coating system for coating a doped layer on a substrate and an in-line furnace annealing system to drive dopants from the surface The coating is moved into the substrate. The configuration of the coating system and the furnace annealing system may be adjacent to each other or separated, for example: through transport line. The system may also include a pre-processing step such as ozone treatment or chemical oxidation before the program.

本案係關於平面基板上材料均勻沉積的方法與系統,如光電基板,並透過滾塗式技術形成薄層。薄層可以是任何液體物質的沉積層。例如,薄層可以包括磷或硼,並沉積在半導體層上,藉以在後續處理後形成射極。在薄膜光電製程中,薄層也可以為吸收層,例如硫化鎘或硫化鋅。 The present invention relates to a method and system for uniformly depositing materials on a planar substrate, such as a photovoltaic substrate, and forming a thin layer by a roll-on technique. The thin layer can be a deposited layer of any liquid material. For example, the thin layer may include phosphorus or boron and is deposited on the semiconductor layer to form an emitter after subsequent processing. In a thin film photovoltaic process, the thin layer can also be an absorbing layer such as cadmium sulfide or zinc sulfide.

本發明更關於太陽能電池之製造,如晶體太陽能電池的製造,包括改良摻雜塗層的製程流程與系統,並以摻雜擴散方式生產製造光電射極接面。其中,基板最好為單晶或多晶矽(multicrystalline or polycrystalline)基板,當然也可以採用其它類型的半導體基板。本發明能夠提供高性能的接面,有效降低成本並改良光電電池及相關設備之效能。在一些實施例中,基板先暴露接觸至包括摻雜物質,如磷,砷,或是硼的化合物,如磷酸(H3PO4)的含流體表面。暴露後將在基板表面形成一摻雜塗層。隨後,摻雜塗層可能置於高溫環境中,促使摻雜物擴散進入基板或是在爐中高溫退火,例如:介於600℃和1000℃。 The invention further relates to the manufacture of solar cells, such as the fabrication of crystalline solar cells, including the process and system for improving doped coatings, and the fabrication of photo-emitter junctions by doping diffusion. Preferably, the substrate is a single crystal or polycrystalline or polycrystalline substrate, although other types of semiconductor substrates may be used. The invention can provide high performance joints, effectively reduce costs and improve the performance of photovoltaic cells and related equipment. In some embodiments, the substrate is first exposed to a fluid-containing surface of a compound comprising a dopant such as phosphorus, arsenic, or boron, such as phosphoric acid (H3PO4). A doped coating will be formed on the surface of the substrate after exposure. Subsequently, the doped coating may be placed in a high temperature environment to cause the dopant to diffuse into the substrate or to anneal at high temperatures in the furnace, for example, between 600 ° C and 1000 ° C.

在另一個實施例中,本發明揭露了一種採用液體滾塗式技術的沉積製程,如薄膜光電中的吸收層,包括形成塗佈流體層的沉積作業之基板加熱控制,例如透過結晶化。 In another embodiment, the present invention discloses a deposition process employing a liquid roll-on technique, such as an absorber layer in a thin film photovoltaic, including substrate heating control of a deposition operation to form a coating fluid layer, such as by crystallization.

圖1A為本案較佳實施例之用於滾動式塗佈之設備與方法製程流程示意圖。提供了基板10,其係可包括多種層,如半導體層。接著,基板10通過液體塗層製程15後,將於基板10上形成無液滴之液體塗層11。層11可以透過接觸一流體表面實現於基板上產生液體塗層,隨後置於,如乾燥或退火之高溫環境中,以形成塗層17。例如,可以利用含有氯化鎘(CdCl2)或碘化鎘(CdI2)的溶劑形成塗層,接著置於含硫(S)的環境中以形成硫化鎘(CdS)。此外,可以進行多種塗層製程,形成塗層18A和18B。層18A/18B可以在高溫環境中退火14,進而形成複合塗層19。 1A is a schematic view showing a process flow of an apparatus and method for rolling coating according to a preferred embodiment of the present invention. A substrate 10 is provided that can include a variety of layers, such as a semiconductor layer. Next, after the substrate 10 passes through the liquid coating process 15, a droplet-free liquid coating 11 is formed on the substrate 10. Layer 11 can effect a liquid coating on the substrate by contacting a fluid surface, followed by placement in a high temperature environment such as drying or annealing to form coating 17. For example, a coating may be formed using a solvent containing cadmium chloride (CdCl 2 ) or cadmium iodide (CdI 2 ) followed by a sulfur (S)-containing environment to form cadmium sulfide (CdS). In addition, a variety of coating processes can be performed to form coatings 18A and 18B. Layers 18A/18B can be annealed 14 in a high temperature environment to form composite coating 19.

圖1B為本案較佳實施例之用於滾動式塗佈之設備與方法之另一種製程流程示意圖。提供了基板10,其最好是為半導體基板,如單晶或多晶矽基板。此外,基板10可以包括於承載基板上設置半導體材料層。承載基板也可以是非半導體,如W、ITO或金屬鏡面材質。此外,在基板10置入摻雜環境前可以先進行其它的製程。例如:矽基板上可以透過形成氧化物鈍化層達到保護基板的效果,或者,親水層可以塗佈在基板10的表面上,藉以提升基板表面的濕潤性。鈍化層更能防止摻雜物在半導體基板的表面上發生過於集中之現象。例如:高溫擴散製程後,在摻雜層的介面中可能會形成摻雜物過於集中之情況,這可能會對PN接面的品質與功能造成影響。因此,鈍化層可以避免半導體基板發生表面高度集中之問題。緩衝層也可以作為摻雜物與基板之間的介面層,為摻 雜層的塗佈提供附著以及表面準備。 1B is a schematic view showing another process flow of the apparatus and method for rolling coating according to a preferred embodiment of the present invention. A substrate 10 is provided, which is preferably a semiconductor substrate such as a single crystal or polycrystalline germanium substrate. Further, the substrate 10 may include a layer of a semiconductor material disposed on the carrier substrate. The carrier substrate can also be non-semiconductor, such as W, ITO or metal mirror material. In addition, other processes may be performed before the substrate 10 is placed in the doping environment. For example, the effect of protecting the substrate can be achieved by forming an oxide passivation layer on the germanium substrate, or the hydrophilic layer can be coated on the surface of the substrate 10, thereby improving the wettability of the surface of the substrate. The passivation layer is more resistant to the phenomenon that the dopant is excessively concentrated on the surface of the semiconductor substrate. For example, after the high-temperature diffusion process, dopants may be excessively concentrated in the interface of the doped layer, which may affect the quality and function of the PN junction. Therefore, the passivation layer can avoid the problem that the surface of the semiconductor substrate is highly concentrated. The buffer layer can also serve as an interface layer between the dopant and the substrate. The coating of the hybrid layer provides adhesion as well as surface preparation.

接著,將基板10置於摻雜塗佈製程15,藉以於基板10上形成摻雜層11。摻雜層11最好採用固態摻雜源,包含用以形成半導體基板10之PN接面之適當的摻雜物。摻雜層11可以透過接觸流體表面而形成,藉以於基板上產生液體塗層,隨後再於高溫環境中進行乾燥。塗佈製程包含摻雜前導物,如含磷化學物(磷酸、磷化氫)、含硼化學物或是含砷化學物。摻雜前導物可以液態或半液態形式流動,包含或不包含溶劑或承載氣體。也可以採用其它液態形式的摻雜源,包括溶液及混合物。 Next, the substrate 10 is placed in a doping coating process 15 whereby a doped layer 11 is formed on the substrate 10. The doped layer 11 is preferably a solid doped source comprising suitable dopants for forming the PN junction of the semiconductor substrate 10. The doped layer 11 can be formed by contacting the surface of the fluid, whereby a liquid coating is produced on the substrate, followed by drying in a high temperature environment. The coating process includes doped precursors such as phosphorus-containing chemicals (phosphoric acid, phosphine), boron-containing chemicals, or arsenic-containing chemicals. The doped precursor can flow in a liquid or semi-liquid form, with or without a solvent or carrier gas. Other sources of doping in liquid form, including solutions and mixtures, may also be employed.

在一些實施例中是以磷作為摻雜材料,如磷酸溶液。例如:將磷酸溶液設置在滾筒體的核心部份,促使滾筒體在滾動塗佈基板時能形成磷酸塗層。此外,可以利用排氣裝置、罩體以及捕捉盒捕捉任何未附著在基板的磷酸。 In some embodiments, phosphorus is used as a dopant material, such as a phosphoric acid solution. For example, a phosphoric acid solution is placed in the core portion of the drum body to cause the roller body to form a phosphoric acid coating when the substrate is rolled. In addition, any of the phosphoric acid that is not attached to the substrate can be captured using an exhaust device, a cover, and a capture box.

接著,基板可能在擴散爐中乾燥11*及退火16,或者基板也可能不進行乾燥步驟直接退火。退火溫度可能大約在800至900°C,促使磷進入基板形成摻雜層12。 Next, the substrate may be dried 11* and annealed 16 in a diffusion furnace, or the substrate may be directly annealed without a drying step. The annealing temperature may be approximately 800 to 900 ° C, causing phosphorus to enter the substrate to form doped layer 12.

在一些實施例中,本發明揭露了一種用於塗佈基板的系統,包含一旋轉式滾筒體,其係經由內部核心提供流體來溼潤外部表面。在一些實施例中,本發明系統包含了複數個旋轉式軟性多孔滾筒體,係用於液體介質的沉積,其中,滾筒體係由滾筒體一端所提供的液體介質溼潤。旋轉式軟性多孔滾筒體可以同時用來搬 運基板,例如:以線上搬運機制。 In some embodiments, the present invention discloses a system for coating a substrate comprising a rotating drum body that provides fluid through the inner core to wet the outer surface. In some embodiments, the system of the present invention comprises a plurality of rotating flexible porous drum bodies for deposition of a liquid medium wherein the drum system is wetted by a liquid medium provided at one end of the drum body. Rotary soft porous drum body can be used simultaneously The substrate is transported, for example, by an on-line handling mechanism.

本案的優點包括在含有沉積過程的線上製程中結合搬運基板的能力。基板是經由單線或多個並行線的系統,透過接連的旋轉式滾筒體進料,其中,滾筒體可以設置在基板的頂部及/或底部。旋轉基板時將同時帶動基板從線上製程系統的輸入端直線地朝向輸出端移動。液體介質係提供至滾筒體的一端,並通過滾筒體的內部渠道濕潤外部表面。因此,當基板移動通過設備時,厚度超薄的液體層將配置至基板上。 Advantages of the present invention include the ability to combine substrate handling in an in-line process that includes a deposition process. The substrate is fed through a continuous rotary drum body via a single wire or a plurality of parallel wire systems, wherein the roller body can be disposed on the top and/or bottom of the substrate. When the substrate is rotated, the substrate is simultaneously driven to move linearly from the input end of the on-line process system toward the output end. A liquid medium is provided to one end of the drum body and wets the outer surface through the internal passage of the drum body. Thus, as the substrate moves through the device, an ultra-thin liquid layer will be placed onto the substrate.

圖2A及2B為本案較佳實施例之用於滾動式塗佈之設備與方法之基本設備的概念原理示意圖。介質24係提供至容器25。滾筒體21及22係具軟性多孔層,並與介質24接觸,藉以經由它們的材料特性獲得均勻濕潤。基板26上介質的分配可以透過頂部滾筒體21與底部滾筒體22之間間距不同所產生的接觸壓力進行控制,藉以於基板26的頂部及底部表面沉積均勻薄膜。當然,也可以僅具滾筒體22,並且只塗佈基板26的底部表面。在旋轉滾筒體21及22的時候,除了能從滾筒體的濕潤表面獲得液體塗層之外,更能同時將基板從設備的一端搬運至另一端。 2A and 2B are conceptual schematic diagrams of the basic apparatus for a rolling coating apparatus and method according to a preferred embodiment of the present invention. A medium 24 is provided to the container 25. The drum bodies 21 and 22 are provided with a soft porous layer and are in contact with the medium 24, whereby uniform wetting is obtained via their material properties. The distribution of the medium on the substrate 26 can be controlled by the contact pressure generated by the difference in the spacing between the top drum body 21 and the bottom drum body 22, whereby a uniform film is deposited on the top and bottom surfaces of the substrate 26. Of course, it is also possible to have only the drum body 22 and coat only the bottom surface of the substrate 26. When the drum bodies 21 and 22 are rotated, in addition to obtaining a liquid coating from the wetted surface of the drum body, the substrate can be simultaneously transported from one end of the apparatus to the other end.

在一些實施例中,多孔滾筒體係包括一剛性核心,並經由多孔材料層包覆,如海綿材料。剛性核心橫跨基板的沉積部位最好具有足夠的剛度及水平平坦度,以確保塗層能均勻沉積。核心材料可以為金屬、合金、碳、玻璃、陶瓷或塑料,如PVC、PP或碳 氟化合物。 In some embodiments, the porous drum system includes a rigid core and is coated with a layer of porous material, such as a sponge material. The deposition of the rigid core across the substrate preferably has sufficient stiffness and horizontal flatness to ensure uniform deposition of the coating. The core material can be metal, alloy, carbon, glass, ceramic or plastic such as PVC, PP or carbon Fluorine compound.

多孔材料可以是聚合物或聚合物泡沫材料或海綿,如PVA、聚氨基甲酸乙酯(poly urethane)和聚烯烴(poly olefin),或者可為任何具孔隙的材料,以允許液體介質通過。此外,多孔材料可以是軟質材料,以寬鬆對於剛性核心的水平平坦度要求限制。 The porous material may be a polymer or polymer foam or sponge, such as PVA, polyurethane, and polyolefin, or may be any porous material to allow passage of the liquid medium. In addition, the porous material may be a soft material to loosen the horizontal flatness requirements for the rigid core.

在一些實施例中,本系統包括一個或多個溫度控制裝置,如加熱器或冷卻器,藉以提供基板或化學物質熱能。一些化學物質可能需要較高的溫度(例如:高於室溫)才能成功塗層,因此,可以透過加熱器加熱化學物質至所需的溫度。一些化學物質可能需要較低的溫度(例如:低於室溫),藉以進行塗層或保存其化學特性,因此,可以透過冷卻器冷卻化學物質至所需的溫度。例如:加熱器/冷卻器可以設置在化學物質儲藏處,液體輸送線上,或是在滾筒體上,藉以直接加熱或冷卻化學物質。此外,也可以選擇將加熱器/冷卻器配置在滾筒體或相鄰處,藉以加熱/冷卻滾筒體的表面,從而於化學物質到達滾筒體表面時,加熱或冷卻的它們的表面。 In some embodiments, the system includes one or more temperature control devices, such as heaters or coolers, to provide substrate or chemical thermal energy. Some chemicals may require higher temperatures (eg, above room temperature) to successfully coat the coating, so the chemical can be heated through the heater to the desired temperature. Some chemicals may require lower temperatures (eg, below room temperature) to coat or preserve their chemical properties so that the chemistry can be cooled through the chiller to the desired temperature. For example, the heater/cooler can be placed in a chemical storage, on a liquid transfer line, or on a drum body to directly heat or cool the chemical. In addition, it is also possible to arrange the heater/cooler at or adjacent to the drum body to heat/cool the surface of the drum body to heat or cool their surfaces as they reach the surface of the drum body.

也可以直接加熱或冷卻基板。例如用於仿固體鹽的沉積,藉以形成類似在薄膜太陽能電池製造中的硫化鎘和硫化鋅的吸收層,沉積後的化學物質會透過加熱加速化學物質反應、乾燥液態化學物質,或是退火塗佈層。加熱器可以配置在基板或相鄰處,藉以加熱基板的表面,包括將IR或UV燈配置在基板的頂部和/或 底部,或是介於滾筒體之間。此外,可以同時使用加熱器和冷卻器。例如:在吸收層的沉積中,化學物質最好是冷卻的,例如透過配置在化學物質儲藏處或輸送線或相鄰處的冷卻器來維持低於或大約室溫的溫度,以維持化學物質的生命週期。隨後再加熱化學物質,例如:沉積至基板上形成吸收層之後,再透過IR加熱基板。 It is also possible to directly heat or cool the substrate. For example, it is used for the deposition of solid salt to form an absorption layer similar to cadmium sulfide and zinc sulfide in the manufacture of thin film solar cells. The deposited chemical can accelerate the chemical reaction, dry the liquid chemical, or anneal through heating. Cloth layer. The heater may be disposed on or adjacent to the substrate to heat the surface of the substrate, including disposing the IR or UV lamp on top of the substrate and/or The bottom, or between the drum bodies. In addition, heaters and coolers can be used simultaneously. For example, in the deposition of the absorber layer, the chemical is preferably cooled, for example, by a cooler disposed at a chemical storage or transport line or adjacent to maintain a temperature below or about room temperature to maintain the chemical. Life cycle. The chemical is then heated, for example, after deposition onto the substrate to form an absorber layer, followed by IR heating of the substrate.

在一些實施例中,本發明揭露了用於以高敏感度化學物質塗佈基板的方法及系統,例如:暴露於高溫下衰退的化學物質,如結晶。在一些實施例中,化學物質會被冷卻至低溫,例如:低於15℃,然而最好是低於10℃,如約7℃。冷卻的溫度取決於化學物質。冷卻裝置27,如製冷裝置,係配置在液體介質24中,提供介質24固定的低溫。另外,可以增設攪拌機制,如槳28,藉以平均液體容器25內的溫度,防止熱點產生。 In some embodiments, the present invention discloses methods and systems for coating substrates with high sensitivity chemicals, such as: exposure to chemicals that decay at elevated temperatures, such as crystallization. In some embodiments, the chemical will be cooled to a low temperature, such as below 15 °C, but preferably below 10 °C, such as about 7 °C. The temperature of the cooling depends on the chemical. A cooling device 27, such as a refrigeration device, is disposed in the liquid medium 24 to provide a low temperature at which the medium 24 is fixed. Alternatively, a stirring mechanism, such as paddle 28, may be added to thereby average the temperature within the liquid container 25 to prevent hot spots from occurring.

在一些實施例中,介質24的塗佈是在高溫下進行。加熱器29A可用以加熱基板26。另一方面,可以透過加入屏蔽23導引熱能至基板26,防止熱能侵入液體介質24。也可以增設其它的加熱器29B來進行後續的製程,如乾燥或退火。加熱器可以設置在靠近滾筒體處,並經由屏蔽將熱能導向基板,藉此加熱基板。加熱器也可以設置在接連的滾筒體之間,並設於基板的頂部、基板的底部,或者兩邊皆有。 In some embodiments, the application of the media 24 is performed at elevated temperatures. The heater 29A can be used to heat the substrate 26. On the other hand, thermal energy can be directed to the substrate 26 by the addition of the shield 23 to prevent thermal energy from entering the liquid medium 24. Other heaters 29B may also be added for subsequent processes such as drying or annealing. The heater may be disposed adjacent to the drum body and direct thermal energy to the substrate via the shield, thereby heating the substrate. The heater may also be disposed between successive drum bodies and disposed at the top of the substrate, at the bottom of the substrate, or on both sides.

圖3A~3B為本案較佳實施例之用於滾動式塗佈之設備與方 法之塗層系統之各種加熱器配置示意圖。圖3A顯示了滾筒體32接觸流體介質34之示意圖,流體介質係分佈至滾筒體的外部表面。當接觸基板36時,流體介質將轉移至接觸的表面,並形成液體層。透過旋轉滾筒體將可令流體更容易分佈至基板的表面。冷卻裝置37是用來維持介質34至所需之溫度,最好是維持在能防止介質34衰退之溫度。 3A-3B are diagrams of a device and a method for rolling coating according to a preferred embodiment of the present invention Schematic diagram of various heater configurations for the coating system. Figure 3A shows a schematic view of the roller body 32 contacting the fluid medium 34, the fluid medium being distributed to the outer surface of the drum body. When contacting substrate 36, the fluid medium will transfer to the surface of the contact and form a liquid layer. Rotating the drum body will make it easier to distribute the fluid to the surface of the substrate. Cooling device 37 is used to maintain medium 34 to the desired temperature, preferably at a temperature that prevents media 34 from decaying.

在滾筒體32前方可以設置一個或多個加熱器39A,藉以加熱基板36的塗層表面。屏蔽33可用於幫助液體介質34避開熱能。此外,可以包括一個或多個加熱器39C來加熱基板36,例如:從背面。也可以包括用於感應基板的感應器30,藉以在基板進入時啟動加熱器39C。如此可以防止加熱器39C在沒有基板的時候,對液體介質加熱。另外,也可以包括加熱器39B,藉以於塗層後進行調節。 One or more heaters 39A may be disposed in front of the drum body 32 to heat the coated surface of the substrate 36. Shield 33 can be used to help liquid medium 34 avoid thermal energy. Additionally, one or more heaters 39C may be included to heat the substrate 36, for example, from the back. A sensor 30 for sensing the substrate may also be included to activate the heater 39C when the substrate enters. This prevents the heater 39C from heating the liquid medium when there is no substrate. In addition, a heater 39B may also be included for adjustment after coating.

如圖3B所示,可以包含一個或多個加熱器39E,藉以加熱基板36與滾筒體32之間的接面。加熱器39E可以在工作點提供熱能,也就是塗佈時需要熱能的位置。加熱器可以是燈光加熱器。或者,可以使用電阻加熱器,如加熱器39D,並沿著基板36的背面設置,且感應器33可以用來在基板36進入時啟動加熱器39D。 As shown in FIG. 3B, one or more heaters 39E may be included to heat the junction between the substrate 36 and the drum body 32. Heater 39E can provide thermal energy at the point of operation, i.e., where thermal energy is required for coating. The heater can be a light heater. Alternatively, a resistive heater, such as heater 39D, can be used and disposed along the back side of substrate 36, and inductor 33 can be used to activate heater 39D as substrate 36 enters.

圖4A~4C為本案較佳實施例之用於滾動式塗佈之設備與方法之溫度控制裝置配置示意圖。圖4A顯示了在外部表面大部份區域包覆著泡沫材料或固化泡沫材料71的滾筒體77。如加熱器或冷 卻器82的溫度控制裝置可以配置在化學物質輸送線之周圍處,如圍繞管線,藉以加熱/冷卻化學物質至所需之溫度。加熱器/冷卻器81可以配置在滾筒體外部表面的周圍處,如裝在滾筒體露出的端部上,或是沿著滾筒體77設置在泡沫層71的下方。加熱器/冷卻器83也可以配置在滾筒體77的內部,藉以加熱/冷卻滾筒體,或是加熱/冷卻抵達滾筒體的化學物質。任何加熱器與冷卻器的組合都可以採用。 4A-4C are schematic diagrams showing the configuration of a temperature control device for a rolling coating apparatus and method according to a preferred embodiment of the present invention. Figure 4A shows a drum body 77 that is coated with a foam material or cured foam material 71 over a substantial portion of the exterior surface. Such as a heater or cold The temperature control device of the damper 82 can be disposed around the chemical delivery line, such as around the pipeline, to heat/cool the chemistry to the desired temperature. The heater/cooler 81 may be disposed at the periphery of the outer surface of the drum body, such as at the exposed end of the drum body, or under the foam layer 71 along the drum body 77. The heater/cooler 83 may also be disposed inside the drum body 77 to heat/cool the drum body or to heat/cool the chemicals that reach the drum body. Any combination of heater and cooler can be used.

圖4B顯示了設置在滾筒體77內部的加熱器/冷卻器84,如裝設在中空滾筒體的內部表面。圖4C顯示了設置在滾筒體77中間的加熱器/冷卻器85,藉以加熱/冷卻滾筒體及化學物質袋86中的化學物質。 Fig. 4B shows a heater/cooler 84 disposed inside the drum body 77, such as mounted on the inner surface of the hollow drum body. Figure 4C shows a heater/cooler 85 disposed intermediate the drum body 77 to heat/cool the chemicals in the drum body and chemical bag 86.

圖5A~5C為本案較佳實施例之用於滾動式塗佈之設備與方法之塗佈製程示意圖。圖5A顯示了取得液體介質64並分佈至多孔層65的滾筒體61。於直接接觸基板66期間,液體介質係轉移至基板的表面,並形成層64*。滾筒體61係經由轉動提供均勻的塗層,並且在同時促使基板向前移動。圖5B和5C顯示了以間接方式接觸基板66的滾筒體61,其係透過居中的滾筒體62、62A及62B協助。 5A-5C are schematic views of a coating process for a roll coating apparatus and method according to a preferred embodiment of the present invention. FIG. 5A shows the drum body 61 that takes the liquid medium 64 and distributes it to the porous layer 65. During direct contact with the substrate 66, the liquid medium is transferred to the surface of the substrate and a layer 64* is formed. The drum body 61 provides a uniform coating via rotation and simultaneously urges the substrate to move forward. Figures 5B and 5C show the drum body 61 that contacts the substrate 66 in an indirect manner, assisted by the centered drum bodies 62, 62A and 62B.

塗層的均勻性可以透過調整滾筒體表面的液體介質進行控制。在一般情況下,沿著滾筒體長度均勻分佈的液體介質可以在基板上垂直於行進路徑的方向產生均勻的塗層。使用多個滾筒體 將能進一步提升順沿行進方向之均勻性。 The uniformity of the coating can be controlled by adjusting the liquid medium on the surface of the drum body. In general, a liquid medium uniformly distributed along the length of the drum body can produce a uniform coating on the substrate perpendicular to the direction of the path of travel. Use multiple drum bodies It will further improve the uniformity of the direction of travel along the path.

圖6A~6D為本案較佳實施例之用於滾動式塗佈之設備與方法之用於均勻沉積之滾筒體示意圖。圖6A顯示了具有沿著滾筒體長度均勻分佈的穿孔73之滾筒體71A。當液體介質74進入滾筒體71A的一端時(例如:末端,或是末端附近),均勻分佈的穿孔可以促使液體介質均勻分佈在基板的表面上。所示的穿孔同時也沿著滾筒體的圓周均勻分佈,其它的配置型式同樣也可以獲得相同的效果,如多穿孔管。圖6B顯示了包括多孔層77的滾筒體71B,多孔層77在沿其長度上的孔徑大小或是孔隙密度78係呈均勻分佈。多孔層77可以是泡沫或海綿材料,其孔洞78的特徵在於孔徑大小或孔隙密度大小。多孔層77可以是具液體滲透性層,其滲透性係沿著滾筒體長度均勻分佈。透過均勻分佈的液體介質,在大型基板76上的塗層70可以均勻分佈於基板的整個寬度上(圖6C),或者,塗層70*可以均勻分佈在多個基板76*上,並且同樣沿著滾筒體的長度配置。 6A-6D are schematic views of a drum body for uniform deposition of the apparatus and method for roll coating according to a preferred embodiment of the present invention. Figure 6A shows a drum body 71A having perforations 73 evenly distributed along the length of the drum body. When the liquid medium 74 enters one end of the drum body 71A (for example, the end, or near the end), the uniformly distributed perforations can promote uniform distribution of the liquid medium on the surface of the substrate. The perforations shown are also evenly distributed along the circumference of the drum body, and other configurations can also achieve the same effect, such as multiple perforated tubes. Fig. 6B shows a roller body 71B including a porous layer 77 which is uniformly distributed in a pore size or a pore density 78 along its length. The porous layer 77 can be a foam or sponge material, the pores 78 of which are characterized by pore size or pore density. The porous layer 77 may be a liquid permeable layer whose permeability is evenly distributed along the length of the drum body. Through the evenly distributed liquid medium, the coating 70 on the large substrate 76 can be evenly distributed over the entire width of the substrate (Fig. 6C), or the coating 70* can be evenly distributed over the plurality of substrates 76*, and also along The length of the drum body is configured.

圖7A~7I為本案較佳實施例之用於滾動式塗佈之設備與方法之用於非均勻沉積之滾筒體示意圖。圖7A顯示了具有沿著滾筒體長度不同分佈的穿孔72和73A/73B之滾筒體71C。相較於中間部份較小的孔72,更多的液體可以經由滾筒體邊緣處較大的孔73A/73B轉移至基板的邊緣處,藉此在邊緣處形成較厚的塗層。事實上,任何所需的塗層厚度分佈都可以經由適當分佈穿孔 72/73A/73B而實現。在另一種配置中,圖7B顯示了包括多孔層77D的滾筒體71D,並且沿著多孔層77D長度之孔徑大小或孔隙密度79/78A/78B係呈非均勻分佈。同樣地,孔洞77D可以產生任何所需的塗層厚度分佈,如基板76上的分佈75(圖7C),或者是相較於內部基板76*上較薄的塗層75*,在外部邊緣處的基板76**具有較厚的塗層75**(圖7D)。 7A-7I are schematic views of a drum body for non-uniform deposition of the apparatus and method for roll coating according to a preferred embodiment of the present invention. Figure 7A shows a drum body 71C having perforations 72 and 73A/73B distributed along the length of the drum body. More liquid can be transferred to the edge of the substrate via the larger holes 73A/73B at the edge of the drum body than the smaller hole 72 in the middle portion, thereby forming a thicker coating at the edges. In fact, any desired coating thickness distribution can be perforated via proper distribution Realized by 72/73A/73B. In another configuration, FIG. 7B shows the drum body 71D including the porous layer 77D, and the pore size or pore density 79/78A/78B along the length of the porous layer 77D is non-uniformly distributed. Likewise, the holes 77D can produce any desired coating thickness profile, such as the distribution 75 on the substrate 76 (Fig. 7C), or at the outer edge compared to the thinner coating 75* on the inner substrate 76*. The substrate 76** has a thicker coating 75** (Fig. 7D).

圖7E~7I為本案較佳實施例之用於滾動式塗佈之設備與方法之滾筒體的設定示意圖。在圖7E中,滾筒體包括圓筒狀核心161A以及包覆核心161A外部表面的多孔層167A。核心161A以及多孔層167A具有均勻分佈的基本設定,例如核心161A為直圓筒體,多孔層167A具有均等的厚度。液體的分佈設定可以經由核心161A中的穿孔分佈或是沿著滾筒體長度多孔層167A的孔隙密度而實現。 7E-7I are schematic diagrams showing the setting of the drum body for the rolling coating apparatus and method of the preferred embodiment of the present invention. In FIG. 7E, the drum body includes a cylindrical core 161A and a porous layer 167A covering the outer surface of the core 161A. The core 161A and the porous layer 167A have a basic arrangement of uniform distribution, for example, the core 161A is a straight cylinder, and the porous layer 167A has an equal thickness. The distribution of the liquid can be set via the perforation distribution in the core 161A or along the pore density of the barrel body length porous layer 167A.

在圖7F中,滾筒體包括了具內凹表面的的圓筒狀核心161B,以及中間厚度較端部厚之對應的多孔層167B。滾筒體的完整結構(例如:包括核心171B和多孔層176B)最好能形成筆直的圓柱形表面,以利於滾動接觸基板。如此的配置將能促使塗層厚度沿著滾筒體長度變化。例如:在高壓縮的情況下,端部被擠壓的程度將比中間部份多出許多,從而致使較多的液體塗佈於端部。在低壓縮的情況,更多的流體將蓄於中間部份(由於較厚的多孔層),從而致使較多的流體處於中間部份。在圖7G中,滾筒體包括具有 外凹(或凸)表面的圓筒狀核心161C,以及中間厚度較端部薄之對應的多孔層167C。 In Fig. 7F, the drum body includes a cylindrical core 161B having a concave surface, and a corresponding porous layer 167B having a thickness intermediate to the end portion. The complete structure of the drum body (e.g., including core 171B and porous layer 176B) preferably forms a straight cylindrical surface to facilitate rolling contact with the substrate. Such a configuration will cause the coating thickness to vary along the length of the drum body. For example, in the case of high compression, the ends will be squeezed to a greater extent than the intermediate portion, causing more liquid to be applied to the ends. In the case of low compression, more fluid will be stored in the middle (due to the thicker porous layer), causing more fluid to be in the middle. In FIG. 7G, the drum body includes A cylindrical core 161C having a concave (or convex) surface, and a corresponding porous layer 167C having a thinner intermediate portion than the end portion.

在圖7H中,滾筒體包括具有筆直表面的圓筒狀核心161D,以及中間厚度較端部薄之內凹多孔層167D。如此的配置,在平面基板的情況下,端部將比中間部份受到更多的擠壓,從而致使更多的流體塗佈於端部。在圖7I中,滾筒體包括具有筆直表面的圓筒狀核心161E,以及中間厚度較端部厚之外凹多孔層167E。這些結構配置皆為示範。當然,也可以採用其它的結構配置來實現沿滾筒體長度所需之(均勻或非均勻的)塗層厚度設定。例如:滾筒體的直徑可能具有變化。 In Fig. 7H, the drum body includes a cylindrical core 161D having a straight surface, and a concave porous layer 167D having a thinner intermediate portion than the end portion. With such a configuration, in the case of a planar substrate, the ends will be more squeezed than the intermediate portions, causing more fluid to be applied to the ends. In Fig. 7I, the drum body includes a cylindrical core 161E having a straight surface, and a concave porous layer 167E having an intermediate thickness thicker than the end portion. These structural configurations are all exemplary. Of course, other structural configurations can be used to achieve the desired (uniform or non-uniform) coating thickness setting along the length of the drum body. For example, the diameter of the drum body may vary.

在一些實施例中,橫跨摻雜非均勻厚度設定的設計是用來補償後續製程的非均勻性。摻雜擴散過程即為一個例子。於基板塗佈摻雜層後,基板將置於爐中退火,藉以驅使摻雜物進入基板。對於線上製程而言,在摻雜塗佈後,基板將以和在摻雜時一樣的排列方式(橫列)進入線上爐中。想要讓爐中溫度在垂直於基板行進路徑的方向上能夠完全均勻必需付出不少的代價。例如,邊緣處的溫度會因為邊界熱損失現象而低於中心部份。這樣的溫度差可能導致爐內位置不同的基板具有不同的品質,例如,相較於邊緣處,更多的摻雜物將擴散至位於爐內中心位置的基板。 In some embodiments, the design across the doped non-uniform thickness setting is used to compensate for non-uniformities in subsequent processes. The doping diffusion process is an example. After the doped layer is applied to the substrate, the substrate will be annealed in a furnace to drive the dopant into the substrate. For the in-line process, after doping is applied, the substrate will enter the in-line furnace in the same arrangement (horizontal) as when doping. It is necessary to pay a high price in order to make the temperature in the furnace completely uniform in the direction perpendicular to the traveling path of the substrate. For example, the temperature at the edge will be lower than the center portion due to boundary heat loss. Such temperature differences may result in substrates having different locations within the furnace having different qualities, for example, more dopants will diffuse to the substrate at the center of the furnace than at the edges.

本案所提出的滾筒體具有多種穿孔類型之核心設計,塗佈非均勻塗層於基板上時將能補償這種溫度差異現象,藉以在爐火後 產生一致的品質。例如:更多的化學物質可以施加在基板摻雜的邊緣處,使其相較於基板摻雜中心位置能具有較厚的塗層。較厚的塗層含有較多的摻雜,可用來補償退火爐中較低的溫度。因此,不論退火爐內的溫度設定為何,位於線上輸送裝置(其係用以將基板從一地點搬運至另一地點)邊緣及中心處的基板皆可具有相似的摻雜濃度。此外,在退火製程後可以將塗層移除,促使基板保持均勻的表面拓撲結構。 The roller body proposed in the present case has a core design of various perforation types, and the uneven temperature coating on the substrate can compensate for this temperature difference phenomenon, thereby after the fire Produce consistent quality. For example, more chemicals can be applied at the edge of the substrate doping to provide a thicker coating than the substrate doping center position. Thicker coatings contain more doping and can be used to compensate for lower temperatures in the annealing furnace. Thus, regardless of the temperature setting in the annealing furnace, the substrates at the edges and at the center of the in-line transport device (which is used to transport the substrate from one location to another) can have similar doping concentrations. In addition, the coating can be removed after the annealing process to promote a uniform surface topology of the substrate.

在一些實施例中,本發明揭露了一種線上沉積系統,包括接觸冷液體並令液體分佈至外部表面的滾筒體。透過該滾筒體塗佈的沉積可以施行於基板的二面,或是僅應用於其中一面。當然,也可以包括其它類型的塗層。基板可透過線上運輸裝置,例如:任何類型的輸送裝置或陶瓷滾筒體,運輸至液體滾筒體進行塗佈,接著經由出口端線上運輸輸送至後續製程處,如退火爐。也可以增設其它功能元件,例如:排氣和隔離,以防止有害氣體漏出;溫度隔離,以提供安全壁;載氣氣體和氣簾氣體,以隔離及淨化大氣;於製程室中取出前之基板調節,如乾燥環境和用於系統清理之噴灑清洗系統。 In some embodiments, the present invention discloses an in-line deposition system that includes a drum body that contacts a cold liquid and distributes the liquid to an exterior surface. The deposition applied through the drum body can be applied to both sides of the substrate or to only one of the sides. Of course, other types of coatings can also be included. The substrate can be transported to the liquid drum body for coating through an in-line transport device, such as any type of transport device or ceramic drum body, and then transported via an outlet end line to a subsequent process, such as an annealing furnace. Other functional components can also be added, such as: exhaust and isolation to prevent harmful gases from leaking out; temperature isolation to provide a safe wall; carrier gas and curtain gas to isolate and purify the atmosphere; substrate conditioning before removal in the process chamber Such as dry environments and spray cleaning systems for system cleaning.

圖8A~8C為本案較佳實施例之用於滾動式塗佈之設備與方法之液體塗佈配置示意圖。圖8A顯示了夾於二個滾筒體91A和91B之間的基板96。滾筒體接收液體介質,例如:由儲藏處99所提供,並將其分佈至滾筒體的表面。泡沫或固化泡沫層95A和95B 係包覆在滾筒體的外部表面,並從滾筒體表面接收即將轉移至基板96的液體介質。在基板的頂部和底部設置滾筒體將能同時塗佈基板的正反面。此外,滾筒體可以移動基板前進,從而作為輸送滾輪。 8A-8C are schematic diagrams showing the liquid coating configuration of the apparatus and method for rolling coating according to a preferred embodiment of the present invention. Fig. 8A shows the substrate 96 sandwiched between the two roller bodies 91A and 91B. The drum body receives the liquid medium, for example, provided by the reservoir 99 and distributed to the surface of the drum body. Foam or cured foam layers 95A and 95B The outer surface of the drum body is wrapped and the liquid medium to be transferred to the substrate 96 is received from the surface of the drum body. Providing a roller body at the top and bottom of the substrate will simultaneously coat the front and back sides of the substrate. Further, the drum body can move the substrate to advance as a conveying roller.

流過滾筒體91A/91B的液體介質可以經由控制達到以最小化過量浪費方式完成基板96上所需之塗佈作業。此外,可以透過控制滾筒體之間的間隔來施加適當的接觸壓力於基板96,藉以最小化液體的浪費。例如,彈簧可以設置在頂部滾筒體91A上,藉以提供所需壓力至基板96。多個獨立控制機制可用來消除或最小化基板表面上多餘的流體,例如在沒有任何液滴的情況下提供均勻的塗層。底部滾筒體91B旋轉軸線的周圍可以固定,並透過旋轉來塗佈基板的底部表面,同時促使基板向前移動。 The liquid medium flowing through the drum bodies 91A/91B can be controlled to achieve the desired coating operation on the substrate 96 in a manner that minimizes excessive waste. In addition, proper contact pressure can be applied to the substrate 96 by controlling the spacing between the drum bodies, thereby minimizing waste of liquid. For example, a spring can be disposed on the top drum body 91A to provide the desired pressure to the substrate 96. Multiple independent control mechanisms can be used to eliminate or minimize excess fluid on the substrate surface, such as providing a uniform coating without any droplets. The periphery of the rotation axis of the bottom drum body 91B can be fixed and coated to rotate the bottom surface of the substrate while causing the substrate to move forward.

圖8B顯示了設置在基板96頂部的滾筒體91A,藉以於頂部表面上沉積塗層。底部表面可以不具塗層,或是經由其它的塗佈製程97A來產生塗層。其它的塗佈製程可以是液體噴塗,包括以氣膠或液體形式傳送化學介質的噴嘴,並且含有或者不含載氣或溶劑,或是浸泡液態化學介質的海綿滾筒體。此外,底部表面可由滾筒體97B支撐,同時可作為輸送滾輪或為非液體供應式滾筒體。滾筒體97B可以用於輸送基板前進,或是在液體供應式滾筒體91A和基板96之間施加接觸壓力。 Figure 8B shows the roller body 91A disposed on top of the substrate 96, whereby a coating is deposited on the top surface. The bottom surface may be uncoated or may be applied via other coating process 97A. Other coating processes may be liquid spraying, including nozzles that transfer chemical media in the form of a gas gel or liquid, with or without carrier gas or solvent, or a sponge drum body that soaks the liquid chemical medium. Further, the bottom surface may be supported by the drum body 97B, and may serve as a conveying roller or a non-liquid supply drum body. The drum body 97B can be used to transport the substrate forward or to apply a contact pressure between the liquid supply roller body 91A and the substrate 96.

圖8C顯示了設置在基板96底部的滾筒體91B,藉以於底部表 面上沉積塗層。頂部表面可以不具塗層,或是經由其它的塗佈製程98A來產生塗層。底部的液體滾筒體91A可以作為移動基板的傳送滾輪。此外,滾筒體98B可以設置在基板的頂部,且可為非液體供應式滾筒體,並且可以在液體供應式滾筒體91B和基板96之間提供接觸壓力。 Figure 8C shows the drum body 91B disposed at the bottom of the substrate 96, whereby the bottom table is shown. A coating is deposited on the surface. The top surface may be uncoated or otherwise applied via a coating process 98A. The liquid roller body 91A at the bottom can serve as a conveying roller for moving the substrate. Further, the drum body 98B may be disposed at the top of the substrate, and may be a non-liquid supply drum body, and may provide a contact pressure between the liquid supply drum body 91B and the substrate 96.

在一些實施例中,所有的滾筒體可以從單一的儲藏處接受相同的液體介質。或者,不同的滾筒體可以經由不同的儲藏處接受不同的液體介質。在頂部和底部的表面上可以沉積不同的化學物質。不同的化學物質也可以沉積在同一個表面上,形成塗佈混合物。填滿的滾筒體,例如,無法接受液體流的滾筒體,可以用於其它的用途,如增進介質的分佈。所有的液體介質可以從單一的儲藏處散佈,或者可以由多個儲藏處個別提供。可以包括流動分佈機制,例如,應用於儲藏處,如泵送機制,壓力控制器,流量控制器以及分配歧管。也可以包括再循環機制以及自動重填機制。 In some embodiments, all of the drum bodies can receive the same liquid medium from a single reservoir. Alternatively, different drum bodies can accept different liquid media via different reservoirs. Different chemicals can be deposited on the top and bottom surfaces. Different chemicals can also be deposited on the same surface to form a coating mixture. The filled drum body, for example, a drum body that cannot accept liquid flow, can be used for other purposes, such as enhancing the distribution of the medium. All liquid media can be dispensed from a single reservoir or can be provided individually from multiple reservoirs. Flow distribution mechanisms may be included, for example, applied to storage locations such as pumping mechanisms, pressure controllers, flow controllers, and distribution manifolds. Recycling mechanisms as well as automatic refill mechanisms can also be included.

在一些實施例中,本發明揭露了令用於塗佈基板的流體介質維持在低的溫度之方法,如低於室溫,最好是低於10℃,如大約7℃。具體的溫度取決於流體介質,以避免迅速衰退為主要設計考量。例如,在塗佈硫化鎘的時候,將於高溫下利用含鎘及可能含硫的液體介質塗佈基板。在室溫及室溫以上的溫度,液體介質可能迅速重新結晶,致使介質衰退而需要清理和更換介質。低的溫度可以經由設置在液體介質儲藏處的冷卻裝置形成,藉以將介 質維持在低溫,直到抵達滾筒體為止。 In some embodiments, the present invention discloses a method of maintaining a fluid medium for coating a substrate at a low temperature, such as below room temperature, preferably below 10 °C, such as about 7 °C. The specific temperature depends on the fluid medium to avoid rapid decay as a major design consideration. For example, when cadmium sulfide is applied, the substrate is coated with a liquid medium containing cadmium and possibly sulfur at a high temperature. At temperatures above room temperature and above, the liquid medium may recrystallize rapidly, causing the media to decay and requiring cleaning and replacement of the media. The low temperature can be formed by a cooling device disposed at the liquid medium storage, thereby The quality is maintained at a low temperature until it reaches the drum body.

在一些實施例中,本發明揭露了用於滾筒體周圍液體介質的溫度屏障或梯度之建立方式。遠離滾筒體時,液體介質將維持在低的溫度,藉以避免衰退。靠近滾筒體時,液體介質將維持在適合製程的溫度,如高溫(接近塗佈的溫度,或是基板的溫度),以幫助塗佈製程之進行;或是中等溫度(介於基板的高溫與遠離滾筒體處液體介質的低溫之間的某個溫度),藉以提供低溫至高溫間的過渡轉換。溫度梯度區域最好是小的,如小於10公分,最好小於5公分,或是小於1~2公分。溫度梯度區域可以透過溫度裝置建立,如設置在滾筒體附近的冷卻裝置,以確保離開滾筒體的液體能保持在低的溫度。溫度裝置還可以包括設置在滾筒體附近的加熱器,以確保進入滾筒體的液體能保持在所需的溫度,例如,高溫或中等溫度。也可以使用珀爾帖裝置(Peltiers devices),為液體容器提供冷卻側,以及為滾筒體表面提供加熱側。如果有更多的冷卻或是加熱需求,也可以個別增加額外的冷卻裝置或加熱裝置。 In some embodiments, the present invention discloses a manner in which a temperature barrier or gradient for a liquid medium surrounding a drum body is established. When away from the drum body, the liquid medium will be maintained at a low temperature to avoid degradation. When close to the drum body, the liquid medium will be maintained at a temperature suitable for the process, such as high temperature (close to the coating temperature, or the temperature of the substrate) to help the coating process; or moderate temperature (between the substrate and the high temperature A temperature transition between the low temperature and the high temperature is provided away from a certain temperature between the low temperatures of the liquid medium at the drum body. The temperature gradient region is preferably small, such as less than 10 cm, preferably less than 5 cm, or less than 1 to 2 cm. The temperature gradient zone can be established by a temperature device such as a cooling device disposed adjacent the drum body to ensure that the liquid leaving the drum body can be maintained at a low temperature. The temperature device may also include a heater disposed adjacent the drum body to ensure that liquid entering the drum body can be maintained at a desired temperature, such as a high or medium temperature. It is also possible to use Peltiers devices to provide a cooling side for the liquid container and a heating side for the surface of the drum body. Additional cooling or heating units can be added individually if there is more cooling or heating requirements.

在一些實施例中,溫度梯度區域包括能量屏障,允許流體介質自由移動跨越邊界。當流體進入滾筒體附近的溫度梯度區域時,將提供加熱能量使其達到高或中等之溫度。當流體離開溫度梯度區域時,將提供冷卻能量(例如:散熱裝置)使其回到液體儲藏處之低溫。在一些實施例中,溫度梯度區域包括局部物理屏障, 例如:由溫度控制裝置所建立的局部物理屏障。 In some embodiments, the temperature gradient region includes an energy barrier that allows the fluid medium to move freely across the boundary. When the fluid enters the temperature gradient region near the drum body, it will provide heating energy to reach a high or medium temperature. When the fluid leaves the temperature gradient zone, it will provide cooling energy (eg, a heat sink) to return it to the low temperature of the liquid reservoir. In some embodiments, the temperature gradient region comprises a local physical barrier, For example: a local physical barrier established by a temperature control device.

在一些實施例中,本發明揭露了在滾筒體周圍建立小容器空間之方式,例如:藉以限制較小容量之液體介質暴露於高溫或中等溫度之環境中。小容器中的液體可以保持在高溫或中等溫度,以適應於塗佈製程之進行,容器中其餘部分將保持在低溫,以保存媒體介質。小容器可以圍繞滾筒體浸泡在水中的表面,並且小於10公分,小於5公分更好,小於1或2公分最好。可以在小容器與液體儲藏處之間的流體流動增加限制,例如:藉以維持溫度梯度。例如,在小體積容器上可以增設單向入口。或者,在入口處可以建立能量屏障,以確保溫度梯度。或者,可以將膜應用在流體與小體積容器之間的流動上。 In some embodiments, the present invention discloses a manner of establishing a small container space around the drum body, for example, by limiting exposure of a smaller volume liquid medium to a high or medium temperature environment. The liquid in the small container can be maintained at a high or medium temperature to accommodate the coating process and the remainder of the container will be kept at a low temperature to hold the media. The small container can be immersed in the surface of the water around the drum body and is less than 10 cm, more preferably less than 5 cm, and most preferably less than 1 or 2 cm. The fluid flow between the small container and the liquid reservoir can be increased, for example, by maintaining a temperature gradient. For example, a one-way inlet can be added to a small volume container. Alternatively, an energy barrier can be established at the inlet to ensure a temperature gradient. Alternatively, the membrane can be applied to the flow between the fluid and the small volume container.

在一些實施例中將促使儲藏處中液體介質的溫度均等,例如:移除任何可能衰退化學物質的熱點。溫度均化器可以包括攪拌器,如與滾筒體旋轉機制結合的槳輪,進而與滾筒體共同旋轉達到攪拌儲藏處中液體介質之效果。其它的攪拌裝置,諸如磁耦合攪拌器,皆可用來攪拌液體。另一方面,可以提供液體循環功能來建立液體流,促使溫度混合。液體循環功能也可以包括過濾器,以過濾粒子,如液體介質重新結晶的顆粒。 In some embodiments, the temperature of the liquid medium in the reservoir will be equalized, for example, by removing any hot spots that may degrade the chemical. The temperature homogenizer may include an agitator, such as a paddle wheel coupled to the drum body rotation mechanism, and thereby co-rotating with the drum body to achieve the effect of agitating the liquid medium in the reservoir. Other agitation devices, such as magnetically coupled agitators, can be used to agitate the liquid. On the other hand, a liquid circulation function can be provided to establish a liquid flow to promote temperature mixing. The liquid circulation function may also include a filter to filter particles, such as particles recrystallized from a liquid medium.

圖9A~9C為本案較佳實施例之用於滾動式塗佈之設備與方法之溫度屏障配置示意圖。屏障208是設置在滾筒體201周圍處,尤其是位於多孔層202的附近,例如:藉以維持遠離滾筒體表面 的液體介質與緊鄰滾筒體表面周圍區域的液體介質之間的溫度梯度。屏障208可為溫度屏障,例如:允許液體自由通過的屏障。例如:屏障208可以包括圍繞滾筒體201的網格或彎曲管陣列。屏障208可以和溫度控制裝置結合,如加熱/冷卻裝置207,藉以在滾筒體周圍處維持低溫的屏障。 9A-9C are schematic diagrams showing the temperature barrier arrangement of the apparatus and method for rolling coating according to a preferred embodiment of the present invention. The barrier 208 is disposed around the drum body 201, particularly in the vicinity of the porous layer 202, for example, to maintain a distance from the drum body surface. The temperature gradient between the liquid medium and the liquid medium in the immediate vicinity of the surface of the drum body. Barrier 208 can be a temperature barrier, such as a barrier that allows liquid to pass freely. For example, the barrier 208 can include a grid or array of curved tubes surrounding the drum body 201. The barrier 208 can be combined with a temperature control device, such as a heating/cooling device 207, to maintain a low temperature barrier around the drum body.

如圖9A所示,液體介質204設置在儲藏處或容器205中,並經由多孔層202提供液體至滾筒體201。接著,滾筒體201接觸基板206,並將介質塗層塗佈於基板的表面。屏障208與溫度控制裝置207連結,如冷卻裝置,藉以在滾筒體周圍維持低溫屏障。例如:冷卻裝置207可為製冷裝置,並提供屏障208冷卻劑。或者,溫度控制裝置207可為加熱裝置,藉以在滾筒體周圍處維持高溫或中等溫度之屏障。在這種情況下,可以提供額外的冷卻裝置(未顯示於圖中)來將液體介質其餘之部分維持在低溫。屏障208最好是能允許液體進入和離開滾筒體表面附近的空間,例如:透過建立網格或管件陣列。管件網格的間隔能讓液體易於流通,同時受到網格或管的能量管控,例如:經由網格或管控制進入或離開該區域之液體溫度。攪拌機制,如磁力攪拌系統209,可以與液體配合形成流動,有效均勻化儲藏處205內的溫度。 As shown in FIG. 9A, the liquid medium 204 is disposed in a reservoir or container 205 and supplies liquid to the drum body 201 via the porous layer 202. Next, the roller body 201 contacts the substrate 206 and applies a dielectric coating to the surface of the substrate. The barrier 208 is coupled to a temperature control device 207, such as a cooling device, to maintain a low temperature barrier around the drum body. For example, the cooling device 207 can be a refrigeration device and provide a barrier 208 coolant. Alternatively, the temperature control device 207 can be a heating device whereby a high or medium temperature barrier is maintained around the drum body. In this case, an additional cooling device (not shown) may be provided to maintain the remainder of the liquid medium at a low temperature. Barrier 208 is preferably a space that allows liquid to enter and exit the surface of the drum body, for example, by creating a grid or array of tubes. The spacing of the tube meshes allows the liquid to be easily circulated while being controlled by the energy of the mesh or tube, for example, by controlling the temperature of the liquid entering or leaving the area via a grid or tube. A stirring mechanism, such as magnetic stirring system 209, can cooperate with the liquid to form a flow that effectively homogenizes the temperature within reservoir 205.

在一些實施例中,基板206會加熱至製程溫度,促使滾筒體201接觸基板206時,塗層即能形成於接觸表面上。在一些實施例中,熱介質最好是在基板206和滾筒體之間的接觸表面,例如: 熱介質將由滾筒體201的多孔層202所吸收。在某些情況下,延長暴露於高溫環境將對介質產生不利影響,例如,在高溫下硫化鎘膜溶劑可能進行重新結晶,降低它們在塗佈製程時之效能。因此,本發明於介質的主體區域提供冷卻裝置207,有效幫助介質維持在能保存它們的生命週期及效能之溫度。此外,在一些實施例中,本發明更揭露了溫度屏障208,係用以減少介質高溫之部分,進而限制介質潛在損壞之可能性。 In some embodiments, the substrate 206 is heated to a process temperature that causes the coating to be formed on the contact surface when the roller body 201 contacts the substrate 206. In some embodiments, the heat medium is preferably a contact surface between the substrate 206 and the drum body, such as: The heat medium will be absorbed by the porous layer 202 of the drum body 201. In some cases, prolonged exposure to high temperatures can adversely affect the media. For example, cadmium sulfide film solvents may recrystallize at elevated temperatures, reducing their effectiveness during the coating process. Accordingly, the present invention provides a cooling device 207 in the body region of the media that effectively assists the media in maintaining a temperature that preserves their life cycle and performance. Moreover, in some embodiments, the present invention further discloses a temperature barrier 208 that is used to reduce the high temperature portion of the medium, thereby limiting the potential for potential damage to the medium.

在一些實施例中,溫度屏障內的液體介質將維持在適合塗佈製程之溫度。而溫度屏障可以處於製程溫度,例如:基板206的溫度。因此,高溫度梯度將建立於屏障208,藉以將介質從鄰近滾筒體表面的高製程溫度轉變成遠離屏障能保存介質的冷卻溫度。屏障208最好設置在滾筒體表面附近,以限制暴露在高製程溫度之介質容量。可以透過加熱滾筒體201獲得高溫,例如,加熱滾筒體核心的端部或是中空之中心。可以透過加熱緊鄰滾筒體外部表面周圍處的介質來獲得高溫。 In some embodiments, the liquid medium within the temperature barrier will be maintained at a temperature suitable for the coating process. The temperature barrier can be at a process temperature, such as the temperature of the substrate 206. Thus, a high temperature gradient will build up at the barrier 208, thereby converting the medium from a high process temperature adjacent the surface of the drum body to a cooling temperature away from the barrier energy storage medium. Barrier 208 is preferably disposed adjacent the surface of the drum body to limit the volume of media exposed to high process temperatures. The high temperature can be obtained by heating the drum body 201, for example, heating the end of the core of the drum body or the center of the hollow. The high temperature can be obtained by heating the medium immediately adjacent the outer surface of the drum body.

在一些實施例中,溫度屏障可為低於製程溫度的中間溫度,例如:介於製程溫度和室溫之間的溫度,或者介於製程溫度和大部份介質的低介質保存溫度之間的溫度。例如:包含在溫度屏障內的介質可以保持在室溫、高於或者低於室溫之溫度。將滾筒體多孔層202的介質維持在中間溫度,不僅塗佈製程仍然可以保持其有效性,同時更可以大為改善介質生命週期的保存。同樣地,可 以透過加熱滾筒體或是加熱緊鄰滾筒體外部表面周圍空間介質的方式提供中間溫度,或者,中間溫度可以經由加熱器加熱基板206或是滾筒體201接觸熱基板206而傳導至液體介質的殘餘熱能所提供。 In some embodiments, the temperature barrier can be an intermediate temperature below the process temperature, such as a temperature between the process temperature and room temperature, or a temperature between the process temperature and the low media storage temperature of most of the media. . For example, the medium contained within the temperature barrier can be maintained at room temperature, above or below room temperature. By maintaining the medium of the porous layer 202 of the drum body at an intermediate temperature, not only the coating process can maintain its effectiveness, but also greatly improve the preservation of the life cycle of the medium. Similarly, The intermediate temperature is provided by heating the drum body or heating the space medium adjacent to the outer surface of the drum body, or the intermediate temperature may be heated by the heater to heat the substrate 206 or the drum body 201 contacts the hot substrate 206 to conduct residual heat energy to the liquid medium. Provided.

在圖9B中,溫度控制裝置210係裝設在溫度屏障上。溫度控制裝置210可為冷卻裝置,提供離開滾筒體鄰近區域的介質冷卻屏障,確保大部份的介質維持在低的介質保存溫度。位於滾筒體表面附近的介質可以透過滾筒體加熱,或是透過加熱器加熱基板206或是透過滾筒體201接觸熱基板206而傳導至液體介質的殘餘熱能來進行加熱。溫度控制裝置210可為加熱裝置,並加熱提供至滾筒體層202的介質。在一些實施例中,可以提供額外的冷卻裝置(未顯示於圖中)來冷卻大部份的介質。可以使用溫度均化裝置,如介質循環器或再循環器,其特徵在於包括一介質槽與泵,並泵送介質至入口211,同時令其返回介質槽之前流動至出口212。過濾器可以設置在流動路徑上。 In Fig. 9B, the temperature control device 210 is mounted on the temperature barrier. The temperature control device 210 can be a cooling device that provides a media cooling barrier away from the vicinity of the drum body, ensuring that most of the media is maintained at a low media storage temperature. The medium located near the surface of the drum body can be heated by the drum body, or heated by the heater to heat the substrate 206 or by the residual heat energy transmitted to the liquid medium through the roller body 201 contacting the hot substrate 206. The temperature control device 210 can be a heating device and heat the medium provided to the drum body layer 202. In some embodiments, additional cooling devices (not shown) may be provided to cool most of the media. A temperature homogenizing device, such as a media circulator or recirculator, can be used, including a media tank and pump, and pumping the medium to the inlet 211 while flowing back to the outlet 212 before returning it to the tank. The filter can be placed on the flow path.

在圖9C中,溫度控制裝置225A~225C係為裝設在溫度屏障的珀爾帖裝置(Peltiers devices)。珀爾帖裝置可以一側為熱一側為冷。熱側可以面向滾筒體,冷側面向主體介質。珀爾帖裝置可以作為加熱器,以加熱緊鄰滾筒體表面的周圍區域,並且也可以作為冷卻裝置,以冷卻遠離滾筒體的液體介質主體。珀爾帖可以被封裝,使之避免受到介質環境影響。槳228可以用於均衡介 質溫度,例如:促使容器205內的液體移動。 In Fig. 9C, the temperature control devices 225A to 225C are Peltiers devices installed in the temperature barrier. The Peltier device can be cold on one side of the hot side. The hot side can face the drum body and the cold side faces the body medium. The Peltier device can act as a heater to heat the surrounding area proximate the surface of the drum body and can also act as a cooling device to cool the liquid medium body remote from the drum body. Peltier can be packaged to protect it from the media environment. Paddle 228 can be used for equalization The mass temperature, for example, causes the liquid within the container 205 to move.

在珀爾帖裝置或周圍處可以增設加熱器或冷卻器,藉以控制加熱或冷卻能量。例如:如果需要更多的冷卻能量,可以增設額外的冷卻器(元件225A)。如果需要更多的熱能,可以增設額外的加熱器(元件225B)。類似的冷熱側功能同樣可以採用(元件225C)。 A heater or cooler can be added to or around the Peltier device to control heating or cooling energy. For example, if more cooling energy is needed, an additional cooler (element 225A) can be added. Additional heaters (element 225B) can be added if more thermal energy is required. A similar hot and cold side function can also be used (element 225C).

圖10A~10B為本案較佳實施例之用於滾動式塗佈之設備與方法之物理屏障配置示意圖。如圖10A所示,物理屏障308係設置在滾筒體201的周圍處,並形成介質204A的隔離空間。此外,可以提供有限的開口301。例如:可以讓介質204進入屏障308的隔膜301。隔膜308可以限制液體介質交流,並容許靠近滾筒體表面的介質204A與介質主體204之間的溫度梯度。可以增設冷卻裝置,如裝置207。也可以增設其它的溫度控制裝置,以協助物理屏障308建立溫度梯度。也可以增設溫度均化裝置209。 10A-10B are schematic diagrams showing the physical barrier configuration of the apparatus and method for rolling coating according to a preferred embodiment of the present invention. As shown in FIG. 10A, a physical barrier 308 is disposed around the drum body 201 and forms an isolated space for the medium 204A. In addition, a limited opening 301 can be provided. For example, media 204 can be allowed to enter diaphragm 301 of barrier 308. The diaphragm 308 can restrict the communication of the liquid medium and allow for a temperature gradient between the medium 204A and the medium body 204 near the surface of the drum body. A cooling device such as device 207 may be added. Other temperature control devices can also be added to assist the physical barrier 308 in establishing a temperature gradient. A temperature equalizing device 209 can also be added.

如圖10B所示,狹窄的縫隙402可以用於控制跨屏障308的介質交換。有限的開口403可以採用面向主體介質204一端較大且面向滾筒體一端較小的結構。此外,可以使用可控制式的開口401,並透過靜態或動態方式改變開口大小。 As shown in FIG. 10B, a narrow gap 402 can be used to control media exchange across the barrier 308. The limited opening 403 may employ a structure that faces the body medium 204 at one end and is smaller toward the end of the drum body. In addition, a controllable opening 401 can be used and the opening size can be changed statically or dynamically.

圖11A~11B為本案較佳實施例之用於滾動式塗佈之設備與方法之其它物理屏障配置示意圖。溫度控制裝置304和306可以連接至屏障308,以控制溫度梯度。例如:將珀爾帖裝置304連接至屏障308。額外的加熱器或冷卻器可以與珀爾帖裝置結合,以確 保所需的溫度梯度。例如:若跨屏障二端分別需要更多的熱量或更多的冷能,可以增設加熱器或冷卻器。另外,溫度控制裝置可以與屏障308結合,如嵌入屏障308壁內的珀爾帖裝置306。 11A-11B are schematic diagrams showing other physical barrier configurations of the apparatus and method for roll coating according to a preferred embodiment of the present invention. Temperature control devices 304 and 306 can be coupled to barrier 308 to control the temperature gradient. For example, the Peltier device 304 is coupled to the barrier 308. Additional heaters or coolers can be combined with the Peltier device to ensure Maintain the required temperature gradient. For example, if you need more heat or more cold energy at each end of the barrier, you can add a heater or cooler. Additionally, the temperature control device can be combined with a barrier 308, such as a Peltier device 306 embedded within the wall of the barrier 308.

圖12為本案較佳實施例之用於滾動式塗佈之設備與方法之線上沉積系統之液體介質分佈配置示意圖。基板103透過滾動輸送滾輪101移動。底部的液體滾筒體106可以取代輸送滾輪101繼續移動基板前進,同時將液態塗料提供至底部表面。設置在頂部的滾筒體具有適當的壓力,藉此以最小化多餘殘液方式沉積頂部塗層。 Figure 12 is a schematic view showing the distribution of a liquid medium in an in-line deposition system for a roll coating apparatus and method according to a preferred embodiment of the present invention. The substrate 103 is moved by the rolling conveyance roller 101. The bottom liquid drum body 106 can continue to move the substrate forward instead of the transport roller 101 while providing liquid paint to the bottom surface. The drum body disposed at the top has appropriate pressure to deposit the top coating in a manner that minimizes excess residue.

液體介質可以經由一個或更多個儲藏處提供至滾筒體。例如:含有化學液體的儲藏處104A可以提供液體介質至泵104B,以經由泵將液體介質推送至容器。可以增設流體控制器104D來調節送往容器的壓力和流量。也可以透過溫度控制器104F對加熱或冷卻液體介質和/或基板進行控制。 The liquid medium can be provided to the drum body via one or more reservoirs. For example, a reservoir 104A containing a chemical liquid can provide a liquid medium to pump 104B to push the liquid medium to the container via a pump. A fluid controller 104D can be added to regulate the pressure and flow to the vessel. Heating or cooling of the liquid medium and/or substrate can also be controlled by temperature controller 104F.

頂部和底部滾筒體可以接受不同的液體介質,以獲取不同的塗佈材料。頂部和底部滾筒體可以相同速度或不同的速度旋轉。例如:在頂部及底部滾筒體上具有相同液體介質的情況下,頂部及底部滾筒體可以相同的速度旋動,藉以在基板的頂部及底部表面上沉積相同的塗層。對於不同的液體介質,頂部和底部滾筒體可以適當的速度旋動,可為相同或不同之速度。 The top and bottom drum bodies can accept different liquid media to obtain different coating materials. The top and bottom drum bodies can be rotated at the same speed or at different speeds. For example, with the same liquid medium on the top and bottom drum bodies, the top and bottom drum bodies can be rotated at the same speed to deposit the same coating on the top and bottom surfaces of the substrate. For different liquid media, the top and bottom drum bodies can be rotated at the appropriate speed, either at the same or different speeds.

可以增設額外的滾筒體。例如:可以提供一個或多個乾燥滾 筒體,以獲得更好的液體介質分佈。乾燥滾筒體可以設置來替換液體滾筒體,或者可以設置在選定的位置。乾燥滾筒體可為沒有任何濕潤液體的滾筒體,無法從內部接受液體的滾筒體,或是具有用以乾燥多孔層之真空吸力(取代液體流動)的滾筒體,或是刷狀滾筒體。 Additional drum bodies can be added. For example: one or more drying rolls can be provided Cylinder for better liquid media distribution. The drying drum body can be arranged to replace the liquid drum body or can be placed in a selected position. The drying drum body may be a drum body without any moist liquid, a drum body that cannot receive liquid from the inside, or a drum body having a vacuum suction (instead of liquid flow) for drying the porous layer, or a brush drum body.

在一些實施例中,本發明揭露了使用液體介質塗佈的沉積製程。圖13A~13C為本案較佳實施例之用於滾動式塗佈之設備與方法之沉積製程示意圖。在圖13A中,基板110透過塗佈滾筒體塗佈110液體塗層,隨後可選擇性地進行層的調節製程111。層的調節製程是非必要的,意即只有在需要的時候用來調節沉積層。例如:一些製程需要液體層作為沉積,因此不需要調節製程。調節製程可以是乾燥製程,例如:經由加熱器或乾燥滾筒體實現。乾燥製程是非必要的,意即主動式的乾燥製程不是必要的,例如:沉積過程可以是在空氣中乾燥,或者乾燥製程可以嵌入在隨後的製程中,例如:在隨後的退火製程。調節可以是退火製程,促使塗層易受非作用或作用區周圍影響而修改塗層的特性。例如:在硫周圍退火可以促使硫與塗層結合,形成硫化鎘薄膜。 In some embodiments, the present invention discloses a deposition process using a liquid medium coating. 13A-13C are schematic views showing a deposition process of the apparatus and method for roll coating according to a preferred embodiment of the present invention. In FIG. 13A, the substrate 110 is coated with a 110 liquid coating through a coating cylinder body, and then the layer conditioning process 111 is selectively performed. The layer adjustment process is not necessary, meaning that it is used to adjust the deposited layer only when needed. For example, some processes require a liquid layer for deposition, so there is no need to adjust the process. The conditioning process can be a drying process, for example, via a heater or a drying drum body. The drying process is not necessary, meaning that an active drying process is not necessary, for example, the deposition process may be drying in air, or the drying process may be embedded in a subsequent process, for example, in a subsequent annealing process. The conditioning can be an annealing process that promotes the coating's ability to modify the properties of the coating by being affected by inactive or around the active area. For example, annealing around sulfur can promote the bonding of sulfur to the coating to form a cadmium sulfide film.

圖13B顯示了分離塗佈與乾燥結構實施例,其特徵在於包括具液體滾筒體116的獨立塗層站,以及包含加熱器114的調節/乾燥站。當輸送滾輪將基板103傳送至塗層站時,液體滾筒體116將於基板上沉積液體塗層。如圖所示,液體滾筒體係同時沉積塗 層於頂部及底部上,當然,同樣類似的滾筒體也可以採用其它的配置形式。完成塗佈層後,基板將透過相同的底部液體滾筒體116運送至乾燥站,並透過加熱器114所提供的熱能進行乾燥。如圖所示,加熱器114包括設置在平行於滾筒體的紅外線加熱器,藉以在基板通過時加熱基板,當然,也可以採用其它的加熱配置形式,例如:不同方位或是不同類型的加熱器。 Figure 13B shows an embodiment of a separate coating and drying structure characterized by comprising a separate coating station with a liquid drum body 116, and an conditioning/drying station comprising a heater 114. When the transport roller transports the substrate 103 to the coating station, the liquid roller body 116 deposits a liquid coating on the substrate. As shown in the figure, the liquid roller system is simultaneously deposited and coated. The layers are on the top and bottom, and of course, similarly similar drum bodies can be used in other configurations. Upon completion of the coating, the substrate will be transported through the same bottom liquid drum body 116 to the drying station and dried by the thermal energy provided by the heater 114. As shown, the heater 114 includes an infrared heater disposed parallel to the drum body to heat the substrate as the substrate passes. Of course, other heating configurations may be employed, such as heaters of different orientations or different types. .

圖13C顯示了整合沉積與乾燥的結構配置實施例。塗層站和乾燥站係共同整合至沉積站中,於其中加熱器114和液體滾筒體116是設置在彼此旁邊,因此從每個滾筒體116而來的液體塗層將可立即被下一個加熱器114加熱烘乾。可以使用其它的結構配置,如在一個液體滾筒體116之後具有多個加熱器114,或者是在多個液體滾筒體116之後具有一個加熱器114。 Figure 13C shows an embodiment of a structural arrangement for integrated deposition and drying. The coating station and the drying station are integrated into the deposition station, wherein the heater 114 and the liquid drum body 116 are disposed next to each other, so that the liquid coating from each of the drum bodies 116 will be immediately heated by the next one. The device 114 is heated and dried. Other structural configurations may be used, such as having a plurality of heaters 114 behind a liquid drum body 116 or having a heater 114 behind the plurality of liquid drum bodies 116.

圖14A~14C為本案較佳實施例之用於滾動式塗佈之設備與方法之另一種沉積製程示意圖。在圖14A中,基板透過塗佈滾筒體塗佈120摻雜液體層,乾燥121後形成固體層,接著在於爐中退火以驅動基板表面下的摻雜物。可以省略乾燥製程,或者可以嵌入至退火製程中。圖14B顯示了塗層、乾燥和退火的配置實施例,包括具塗佈滾筒體126的獨立塗層站以及具加熱器124的乾燥站。當輸送滾輪127將基板103傳送至塗層站時,塗佈滾筒體126將在基板上沉積液體塗層。完成塗層後,基板將透過相同的底部塗佈滾筒體126傳送至乾燥站,並透過加熱器124所提供的熱 能進行乾燥。隨後,基板將傳送至採用加熱器125的退火爐。 14A-14C are schematic views showing another deposition process of the apparatus and method for roll coating according to a preferred embodiment of the present invention. In FIG. 14A, the substrate is coated with a 120 doped liquid layer through a coating cylinder, dried 121 to form a solid layer, and then annealed in a furnace to drive dopants under the surface of the substrate. The drying process can be omitted or can be embedded in the annealing process. Figure 14B shows a configuration example of coating, drying, and annealing, including a separate coating station with a coated drum body 126 and a drying station with a heater 124. When the transport roller 127 transports the substrate 103 to the coating station, the coating cylinder body 126 will deposit a liquid coating on the substrate. After the coating is completed, the substrate will be transferred to the drying station through the same bottom coating drum body 126 and passed through the heat provided by the heater 124. Can be dried. Subsequently, the substrate will be transferred to an annealing furnace using a heater 125.

圖14C顯示了整合塗層與乾燥的結構配置實施例。塗層站和乾燥站係共同整合至沉積站中,於其中加熱器124和塗佈滾筒體126是設置在彼此旁邊,因此從每個滾筒體126而來的液體塗層將可立即被下一個加熱器124加熱烘乾。在乾燥後,基板係透過加熱器125進行退火。乾燥步驟是選擇性的,可以略過,或者可與退火製程結合。例如,在退火製程的主要退火步驟之前可以加入一個預退火步驟,乾燥製程即可包括在預退火步驟中。 Figure 14C shows an embodiment of an integrated coating and dry structural configuration. The coating station and the drying station are integrated into the deposition station, wherein the heater 124 and the coating drum body 126 are disposed next to each other, so that the liquid coating from each of the drum bodies 126 will be immediately next The heater 124 is heated and dried. After drying, the substrate is annealed by a heater 125. The drying step is optional, can be skipped, or can be combined with an annealing process. For example, a pre-annealing step can be added prior to the main annealing step of the annealing process, and the drying process can be included in the pre-annealing step.

在一些實施例中,本發明揭露了用於基板上沉積液體的方法,包括使用接受從容器提供的冷液體介質的滾筒體,並將液體轉移至基板的外部表面形成接觸塗層。液體介質是保持在室溫以下的低溫,最好是低於15~10℃,如7℃。另外,可以加入溫度均化器以防止熱點產生。也可以增設溫度屏障或物理屏障,藉以限制液體介質暴露在高溫環境的機會。 In some embodiments, the present invention discloses a method for depositing a liquid on a substrate comprising using a cylinder body that receives a cold liquid medium provided from a container and transferring the liquid to an exterior surface of the substrate to form a contact coating. The liquid medium is kept at a low temperature below room temperature, preferably below 15 to 10 ° C, such as 7 ° C. Additionally, a temperature homogenizer can be added to prevent hot spots from occurring. A temperature barrier or physical barrier can also be added to limit the chance of exposure of the liquid medium to a high temperature environment.

圖15為本案較佳實施例之用於滾動式塗佈之設備與方法之液體沉積流程圖。操作步驟130將一個或多個基板提供至移動平台上,例如,一個大型平面基板或是多個排列成橫列的半導體基板。所述的移動平台可為線上輸送機,包括如滾筒體的工具,用以將基板從一個處理站移動至另一個處理站。移動平台可為線上塗層站的輸入站,可接受基板並將基板傳送至塗佈區。基板在進入塗層站前可以先作準備,例如:透過表面清理製程去除雜質或 顆粒,或是透過氧化製程形成氧化層。在某些情況下,基板上原生的氧化層可能不是最好的,因此,可能進行HF溶劑清洗以令表面潔淨。此外,可將基板運送至一個殼體中,例如:透過基板移動機構,或著基板可以接連移動通過殼體,例如:透過線上輸送機構。 Figure 15 is a flow chart showing the liquid deposition of the apparatus and method for roll coating in accordance with a preferred embodiment of the present invention. Operation 130 provides one or more substrates to the mobile platform, such as a large planar substrate or a plurality of semiconductor substrates arranged in a row. The mobile platform can be an in-line conveyor, including a tool such as a drum body for moving substrates from one processing station to another. The mobile platform can be an input station for the on-line coating station, accepting the substrate and transferring the substrate to the coating zone. The substrate can be prepared before entering the coating station, for example: removing impurities by surface cleaning process or The particles are either formed through an oxidation process to form an oxide layer. In some cases, the native oxide layer on the substrate may not be optimal, so HF solvent cleaning may be performed to clean the surface. In addition, the substrate can be transported into a housing, such as through a substrate moving mechanism, or the substrate can be moved through the housing in succession, for example, through an in-line transport mechanism.

在操作步驟131中加熱基板至所需的溫度,如能加速於其上化學物質沉積反應速度的溫度,藉以蒸發化學物質中的液體載體,或是退火沉積層。在操作步驟132中,基板係送入具多個塗佈滾筒體的塗佈區域,部份滾筒體將同時作為移動基板前進的傳送滾輪。液體介質係轉移至滾筒體的外部表面。覆蓋在滾筒體上非必要的泡沫材料可用於改善塗佈製程,如減少基板損傷,並可促進基板上液體介質的分佈。液體介質係冷卻至低於室溫的溫度,最好是低於液體介質保存生命週期的溫度。例如:液體層可為太陽能電池裝置結構中的吸收層,具有吸收體的化學物質,包括在液體介質中的吸收體元素的小型球狀懸浮體。吸收體的化學物質可以在室溫或分室溫度下保存及傳遞,以防止反應並延長化學物質的生命週期。然後,冷卻後的化學物質將沉積在熱基板上,並透過熱能觸發反應,進而在基板上形成薄膜層。 In operation 131, the substrate is heated to a desired temperature, such as a temperature at which the rate of chemical deposition reaction can be accelerated, thereby evaporating the liquid carrier in the chemical or annealing the deposited layer. In operation 132, the substrate is fed into a coating zone having a plurality of coating drum bodies, and a portion of the roller body will simultaneously serve as a conveying roller for moving the substrate. The liquid medium is transferred to the outer surface of the drum body. Non-essential foam covering the drum body can be used to improve the coating process, such as reducing substrate damage and promoting the distribution of liquid media on the substrate. The liquid medium is cooled to a temperature below room temperature, preferably below the temperature at which the liquid medium retains its life cycle. For example, the liquid layer can be an absorbent layer in a solar cell device structure, a chemical having an absorber, including a small spherical suspension of absorber elements in a liquid medium. The sorbent chemicals can be stored and transferred at room temperature or at room temperature to prevent reaction and extend the life cycle of the chemical. The cooled chemical will then deposit on the hot substrate and trigger the reaction through thermal energy to form a thin film layer on the substrate.

在操作步驟133中,透過旋轉滾筒體促使液體介質經由接觸而從滾筒體的表面塗佈至基板的表面上。此外,旋轉輸送滾筒體係能同時將基板移動至塗層區的端部。另一方面,可以包括改善 塗佈層的工具,例如:為了獲得更好的介質分佈,可在液體滾筒體之後設置乾燥滾筒體。 In operation 133, the liquid medium is caused to be applied from the surface of the drum body to the surface of the substrate via contact by rotating the drum body. In addition, the rotating conveyor roller system can simultaneously move the substrate to the end of the coating zone. On the other hand, it can include improvements A tool for coating a layer, for example, to obtain a better distribution of the medium, a drying drum body can be provided after the liquid cylinder body.

在操作步驟135中,基板上塗佈了一層具有均勻或非均勻厚度設定的塗層。例如:基板表面上具非均勻厚度設定的塗層是用來補償後續製程中的非均勻性,如在後續退火爐中的非均勻溫度設定。在非必要的操作步驟136中,塗層係經由調節,例如:透過如紅外線燈或是其它形式作用在液體塗層的能量所產生的熱能進行乾燥,或是透過一個或多個乾燥滾筒體進行乾燥。乾燥區可以設置在塗層區之後,例如:將紅外線加熱器設置在液體滾筒體之後。或者,乾燥區可以和塗層區整合,例如:將紅外線加熱器與液體滾筒體交錯設置。 In operation 135, a coating having a uniform or non-uniform thickness setting is applied to the substrate. For example, a coating with a non-uniform thickness setting on the surface of the substrate is used to compensate for non-uniformities in subsequent processes, such as non-uniform temperature settings in subsequent annealing furnaces. In an optional operation step 136, the coating is dried by conditioning, for example, by thermal energy generated by the energy of the liquid coating, such as an infrared lamp or other means, or by one or more drying drum bodies. dry. The drying zone can be placed after the coating zone, for example by placing the infrared heater behind the liquid roller body. Alternatively, the drying zone can be integrated with the coating zone, for example by interlacing the infrared heater with the liquid roller body.

在操作步驟137中對基板進行的後續處理具有均勻特性相同的塗層厚度設定。例如:將基板送入擴散爐以驅動摻雜物進入基板。該爐可以包括多個加熱器,藉以加熱塗層至很高的溫度,如介於600和1000℃之間。該爐可以包括一個預熱區,用以在熱爐區與室溫環境之間形成溫度轉換區域。預熱區可以同時作為乾燥液體塗層的乾燥區。退火爐中的溫度可以是非均勻的,基板的厚度可以用來補償此非均勻性,因此可以實現均勻的摻雜分佈。 Subsequent processing of the substrate in operation 137 has a coating thickness setting of uniform uniformity. For example, the substrate is fed into a diffusion furnace to drive dopants into the substrate. The furnace may include a plurality of heaters to heat the coating to a very high temperature, such as between 600 and 1000 °C. The furnace may include a preheating zone for forming a temperature transition zone between the hot furnace zone and the room temperature environment. The preheating zone can simultaneously serve as a drying zone for the dry liquid coating. The temperature in the annealing furnace can be non-uniform, and the thickness of the substrate can be used to compensate for this non-uniformity, so that a uniform doping profile can be achieved.

在一些實施例中,本發明揭露了利用塗佈滾筒體進行滾動塗佈製程的改良。例如:將液體介質保持在低溫,藉以保存其反應特性。此外,可以使用溫度屏障或物理屏障來限制液體介質暴露 於高溫環境。 In some embodiments, the present invention discloses an improvement in the roll coating process using a coating drum body. For example, the liquid medium is kept at a low temperature to preserve its reaction characteristics. In addition, a temperature barrier or physical barrier can be used to limit exposure of the liquid medium In high temperature environment.

圖16A~16B為本案較佳實施例之用於滾動式塗佈之設備與方法之液體沉積控制流程圖。在圖16A中,傳送至基板的液體介質係經由控制而達到避免快速衰退的期望目標,同時促使塗層最佳化,操作成本最小化。操作步驟140提供一個或多個用以接觸容器中流體介質的塗佈滾筒體。在操作步驟141中,液體介質係冷卻至低於室溫的溫度,最好是低於10℃,如7℃。在操作步驟142中,容器中液體介質的溫度會被均勻化,以防止熱點產生,同時進一步預防暴露於高溫。 16A-16B are flow diagrams showing the liquid deposition control of the apparatus and method for roll coating according to a preferred embodiment of the present invention. In Figure 16A, the liquid medium delivered to the substrate is controlled to achieve the desired goal of avoiding rapid decay while optimizing coating optimization and minimizing operating costs. Operation 140 provides one or more coating drum bodies for contacting the fluid medium in the container. In operation 141, the liquid medium is cooled to a temperature below room temperature, preferably below 10 °C, such as 7 °C. In operation 142, the temperature of the liquid medium in the container is homogenized to prevent hot spots from occurring while further preventing exposure to high temperatures.

在圖16B中,在塗佈滾筒體附近建立了溫度梯度,藉以限制液體介質暴露於高溫。操作步驟144提供一個或多個用以接觸容器中流體介質的塗佈滾筒體。操作步驟144在接觸流體的滾筒體周圍建立了溫度梯度。操作步驟145均勻化容器中遠離溫度梯度的流體溫度。 In Figure 16B, a temperature gradient is established adjacent the coating drum body to limit exposure of the liquid medium to high temperatures. Operation 144 provides one or more coating drum bodies for contacting the fluid medium in the container. Operation 144 establishes a temperature gradient around the drum body that is in contact with the fluid. Operation 145 homogenizes the temperature of the fluid in the vessel away from the temperature gradient.

在一些實施例中,本發明揭露了用於實現期望的液體介質優化之不同的製程控制方式。圖17為本案較佳實施例之用於滾動式塗佈之設備與方法之不同的液體沉積控制處理流程圖。在滾筒體周圍處可以透過建立物理屏障限制液體介質暴露於高溫環境。操作步驟150提供一個或多個用以接觸容器中流體介質的塗佈滾筒體。操作步驟151在滾筒體與流體之間的接觸區域周圍隔離出一個區域,有效地在容器中兩部份的液體介質之間建立起物理屏 障。可以在兩部份間的交互流動提供限制。操作步驟152加熱位於此部份中的流體介質,例如:加熱至介於製程溫度與液體介質之低溫之間的中等溫度。該中等溫度可為室溫。操作步驟153冷卻位於此部份外的流體,例如:冷卻至液體介質的生命週期保存溫度。另外,可以選擇性地增設溫度均化器,以防止熱點產生。操作步驟154限制了兩部份之間的流體流動。例如,在這兩部份之間設置最小的流體流通,以防止外側部份暴露至內部的高溫。 In some embodiments, the present invention discloses different process control modes for achieving desired liquid media optimization. Figure 17 is a flow chart showing the different liquid deposition control processes for the roll coating apparatus and method of the preferred embodiment of the present invention. Exposure of the liquid medium to a high temperature environment can be achieved by establishing a physical barrier around the drum body. Operation 150 provides one or more coating drum bodies for contacting the fluid medium in the container. Operation step 151 isolates an area around the contact area between the drum body and the fluid, effectively establishing a physical screen between the two portions of the liquid medium in the container. barrier. Limitations can be provided by the interaction between the two parts. Operation 152 heats the fluid medium located in this portion, for example, to a moderate temperature between the process temperature and the low temperature of the liquid medium. The medium temperature can be room temperature. Operation 153 cools the fluid outside of this portion, for example, to the life cycle storage temperature of the liquid medium. In addition, a temperature homogenizer can be selectively added to prevent hot spots from being generated. Operation 154 limits the flow of fluid between the two parts. For example, a minimum fluid flow is provided between the two portions to prevent exposure of the outer portion to the internal high temperature.

圖18A~18B為本案較佳實施例之用於滾動式塗佈之設備與方法之基本設備概念示意圖。介質是經由軟性多孔滾筒體1021及1022的內部核心所提供1024,軟性多孔滾筒體係基於自身材料特性而能均勻濕潤。基板1026上介質的分配是透過液體流動與液體集中以及因頂部滾筒體1021與底部滾筒體1022之間間距所產生的接觸壓力進行獨立控制,藉以用最小化過量的介質,在基板1026的頂部及底部表面上沉積均勻薄膜。旋轉滾筒體1021及1022時,除了能將基板從設備的一端搬運至設備的另一端,同時更能從滾筒體的濕潤表面獲得液體塗層。 18A-18B are schematic diagrams showing the basic device concept of the apparatus and method for rolling coating according to a preferred embodiment of the present invention. The medium is provided 1024 through the inner core of the flexible porous drum bodies 1021 and 1022, and the flexible porous drum system is uniformly wetted based on its own material properties. The distribution of the medium on the substrate 1026 is independently controlled by the flow of liquid and the concentration of the liquid and the contact pressure generated by the spacing between the top drum body 1021 and the bottom drum body 1022, thereby minimizing excess medium at the top of the substrate 1026 and A uniform film is deposited on the bottom surface. When the drum bodies 1021 and 1022 are rotated, the substrate can be transported from one end of the apparatus to the other end of the apparatus, and a liquid coating can be obtained from the wetted surface of the drum body.

在一些實施例中,多孔滾筒體包括剛性中空核心,並由多孔材料層包覆,如海綿材料。剛性核心橫跨基板沉積部位最好具有足夠的剛度及水平平坦度,以確保塗層能均勻沉積。核心的材料可以為金屬、合金、碳、玻璃、陶瓷或塑料,如PVC、PP或碳氟化合物。 In some embodiments, the porous drum body comprises a rigid hollow core and is covered by a layer of porous material, such as a sponge material. The rigid core preferably has sufficient stiffness and horizontal flatness across the substrate deposition site to ensure uniform deposition of the coating. The core material can be metal, alloy, carbon, glass, ceramic or plastic such as PVC, PP or fluorocarbon.

多孔材料可以是聚合物或聚合物泡沫材料或海綿,如PVA、聚氨基甲酸乙酯(poly urethane)和聚烯烴(poly olefin),或者可為任何具孔隙的材料,以允許液體介質通過。此外,多孔材料可以是軟質材料,藉此寬鬆對於剛性核心的水平平坦度要求。 The porous material may be a polymer or polymer foam or sponge, such as PVA, polyurethane, and polyolefin, or may be any porous material to allow passage of the liquid medium. In addition, the porous material can be a soft material, thereby loosening the horizontal flatness requirement for the rigid core.

圖19A~19E為本案較佳實施例之用於滾動式塗佈之設備與方法之滾筒體的各種配置示意圖。圖19A顯示了在一端具有入口1034的滾筒體1031,藉以接受將分佈1035至滾筒體外部表面的流體介質。當接觸基板1036時,流體介質將轉移至接觸的表面,並形成液體層1034*。可以透過旋轉滾筒體1031讓流體更容易分佈至基板表面。耦合器1039可以結合在旋轉滾筒體1031(或入口1034)與靜止的流體入口1038之間。此外,耦合器1039可包括可旋轉的密封件,或是可扭轉的連接器,以適用於旋轉滾筒體。 19A-19E are various schematic views of the configuration of a drum body for a roll coating apparatus and method in accordance with a preferred embodiment of the present invention. Figure 19A shows a drum body 1031 having an inlet 1034 at one end to receive a fluid medium that will distribute 1035 to the outer surface of the drum body. When contacting substrate 1036, the fluid medium will transfer to the surface of the contact and form a liquid layer 1034*. The fluid can be more easily distributed to the surface of the substrate by rotating the drum body 1031. Coupler 1039 can be coupled between rotating drum body 1031 (or inlet 1034) and stationary fluid inlet 1038. Additionally, the coupler 1039 can include a rotatable seal or a twistable connector for use in rotating the drum body.

滾筒體1031B可以在滾筒體的外部表面包括軟性多孔層1035B,以利於流體在滾筒體與基板之間的轉移(圖19B)。在滾筒體1031C的外部表面上可以覆蓋固體層1035C,不過最好是軟質層,以增進接觸容許度。接著,流體可以透過接觸基板的表面進行轉移(圖19C),並在滾筒體的外部表面上形成一個層。 The drum body 1031B may include a soft porous layer 1035B on the outer surface of the drum body to facilitate transfer of fluid between the drum body and the substrate (Fig. 19B). The solid layer 1035C may be covered on the outer surface of the drum body 1031C, but is preferably a soft layer to enhance contact tolerance. Then, the fluid can be transferred through the surface contacting the substrate (Fig. 19C), and a layer is formed on the outer surface of the drum body.

圖19D~19E顯示了在旋轉滾筒體與固定的液體輸送線之間的可轉動耦合器之各種配置實施例。在圖19D中,O形環或液態軸承1039D是設置在滾筒體1031D的末端,並將旋轉滾筒體1031D結合至固定線1038D。在圖19E中,O形環或液態軸承1039E是設 置在靠近滾筒體1031E端部的圓柱形表面上,並將旋轉滾筒體1031E結合至固定線1038E。可以使用其它可旋轉的耦合器來將旋轉滾筒體連接至固定的液體輸送線。 19D-19E show various configurations of a rotatable coupler between a rotating drum body and a stationary liquid transport line. In Fig. 19D, an O-ring or liquid bearing 1039D is provided at the end of the drum body 1031D, and the rotating drum body 1031D is coupled to the fixed wire 1038D. In Fig. 19E, the O-ring or the liquid bearing 1039E is provided. The cylindrical surface is placed close to the end of the drum body 1031E, and the rotating drum body 1031E is coupled to the fixed wire 1038E. Other rotatable couplers can be used to connect the rotating drum body to a fixed liquid delivery line.

圖20A~20D為本案較佳實施例之用於滾動式塗佈之設備與方法之其它類型的滾筒體配置示意圖。圖20A顯示了滾筒體1041,其係包括包覆具有溝槽1042能容納小徑管(PFA,PVDF,PP)1043的固體核心的多孔層1045。液體介質1044係進入小管1043,並經由管1043中的穿孔轉移至多孔層1045。可以透過變化管1043穿孔的直徑與間距,以及多孔層1045的細孔密度,優化均勻性和介質流。圖20B顯示了擁有具溝槽1047之外覆蓋層1046的滾筒體1041。液體介質1044進入溝槽1047後係通過溝槽1047中的穿孔傳輸至多孔層1045。圖20C顯示了擁有具溝槽1049之內層1048的中空滾筒體1041。液體介質1044進入溝槽1049後係通過溝槽1049中的穿孔傳輸至多孔層1045。圖20D顯示了在滾筒體壁面1051上具有穿孔1051的中空滾筒體1041。液體介質1044進入中空滾筒體後係通過穿孔1052傳輸至多孔層1045。 20A-20D are schematic views showing other types of drum body configurations for the apparatus and method for roll coating according to a preferred embodiment of the present invention. Figure 20A shows a drum body 1041 that includes a porous layer 1045 that encloses a solid core having a groove 1042 that can accommodate a small diameter pipe (PFA, PVDF, PP) 1043. The liquid medium 1044 enters the small tube 1043 and is transferred to the porous layer 1045 via perforations in the tube 1043. The uniformity and media flow can be optimized by varying the diameter and spacing of the perforations of the tube 1043 and the pore density of the porous layer 1045. Figure 20B shows the drum body 1041 possessing a cover layer 1046 with a groove 1047. After entering the trench 1047, the liquid medium 1044 is transported through the perforations in the trench 1047 to the porous layer 1045. Figure 20C shows a hollow cylinder body 1041 having an inner layer 1048 with grooves 1049. The liquid medium 1044 enters the trench 1049 and is transported through the perforations in the trench 1049 to the porous layer 1045. Figure 20D shows a hollow cylinder body 1041 having perforations 1051 on the drum body wall surface 1051. The liquid medium 1044 enters the hollow cylinder body and is transported through the perforations 1052 to the porous layer 1045.

圖21A~21C為本案較佳實施例之用於滾動式塗佈之設備與方法之塗佈製程示意圖。圖21A顯示了滾筒體1061接受液體介質1064,並分佈至多孔層1065。在與基板1066直接接觸時,液體介質將被轉移至基板的表面,形成層1064*。滾筒體1061係透過旋轉提供均勻的塗層,並同時移動基板前進。圖21B和21C顯示了 滾筒體1061透過居中的滾筒體1062,1062A和1062B間接接觸基板1066。 21A-21C are schematic views of a coating process for an apparatus and method for roll coating according to a preferred embodiment of the present invention. Figure 21A shows roller body 1061 receiving liquid medium 1064 and distributed to porous layer 1065. Upon direct contact with the substrate 1066, the liquid medium will be transferred to the surface of the substrate to form a layer 1064*. The drum body 1061 is rotated to provide a uniform coating while moving the substrate forward. Figures 21B and 21C show The drum body 1061 indirectly contacts the substrate 1066 through the centered drum bodies 1062, 1062A and 1062B.

塗佈層的均勻性可以透過調整滾筒體表面處的液體介質進行控制。在一般情況下,沿著滾筒體長度均勻分佈的液體介質可以在基板上垂直於行進路徑的方向產生均勻的塗層。使用多個滾筒體將能進一步提升順沿行進方向的均勻性。 The uniformity of the coating layer can be controlled by adjusting the liquid medium at the surface of the drum body. In general, a liquid medium uniformly distributed along the length of the drum body can produce a uniform coating on the substrate perpendicular to the direction of the path of travel. The use of multiple drum bodies will further improve the uniformity of the forward travel direction.

在一些實施例中,本系統包括一個或多個溫度控制裝置,如加熱器或冷卻器,藉以提供基板或化學物質熱能。一些化學物質可能需要較高的溫度(例如:高於室溫)才能成功塗層,因此,可以透過加熱器加熱化學物質至所需的溫度。一些化學物質可能需要較低的溫度(例如:低於室溫),藉以進行塗層或保存化學特性,因此,可以透過冷卻器冷卻化學物質至所需的溫度。例如:加熱器/冷卻器可以設置在化學物質儲藏處、液體輸送線上,或是在滾筒體上,藉以直接加熱或冷卻化學物質。此外,也可以選擇將加熱器/冷卻器配置在滾筒體或相鄰處,藉以加熱/冷卻滾筒體的表面,從而於化學物質抵達滾筒體表面時,加熱或冷卻它們的表面。 In some embodiments, the system includes one or more temperature control devices, such as heaters or coolers, to provide substrate or chemical thermal energy. Some chemicals may require higher temperatures (eg, above room temperature) to successfully coat the coating, so the chemical can be heated through the heater to the desired temperature. Some chemicals may require lower temperatures (eg, below room temperature) to coat or preserve chemical characteristics so that the chemistry can be cooled through the chiller to the desired temperature. For example, the heater/cooler can be placed in a chemical storage, liquid delivery line, or on a drum body to directly heat or cool the chemical. In addition, it is also possible to arrange the heater/cooler at or adjacent to the drum body to heat/cool the surface of the drum body to heat or cool the surfaces of the drum body as it reaches the surface of the drum body.

當然,也可以直接加熱或冷卻基板。例如用於仿固體鹽的沉積,藉以形成類似在薄膜太陽能電池製造中的硫化鎘和硫化鋅的吸收層,沉積後的化學物質會透過加熱加速化學物質反應、乾燥液態化學物質,或是退火塗佈層。加熱器可以配置在基板或相鄰 處,藉以加熱基板的表面,包括將IR或UV燈配置在基板的頂部和/或底部,或是介於滾筒體之間。此外,可以同時使用加熱器和冷卻器。例如:在吸收層的沉積中,化學物質最好是冷卻的,例如透過配置在化學物質儲藏處或輸送線或相鄰處的冷卻器來維持低於或大約室溫的溫度,以維持化學物質的生命週期。隨後再加熱化學物質,例如:沉積至基板上形成吸收層之後,透過IR加熱基板。 Of course, it is also possible to directly heat or cool the substrate. For example, it is used for the deposition of solid salt to form an absorption layer similar to cadmium sulfide and zinc sulfide in the manufacture of thin film solar cells. The deposited chemical can accelerate the chemical reaction, dry the liquid chemical, or anneal through heating. Cloth layer. The heater can be placed on the substrate or adjacent Wherein, the surface of the substrate is heated, including placing the IR or UV lamps on the top and/or bottom of the substrate, or between the drum bodies. In addition, heaters and coolers can be used simultaneously. For example, in the deposition of the absorber layer, the chemical is preferably cooled, for example, by a cooler disposed at a chemical storage or transport line or adjacent to maintain a temperature below or about room temperature to maintain the chemical. Life cycle. The chemical is then heated, for example, after deposition onto the substrate to form an absorber layer, and the substrate is heated by IR.

圖22A~22D為本案較佳實施例之用於滾動式塗佈之設備與方法之溫度控制裝置配置示意圖。圖22A顯示了在外部表面大部份區域包覆著泡沫材料或固化泡沫材料1071的滾筒體1077。液體介質1074係傳送至滾筒體1077的內部,藉以轉移至泡沫材料1071。如加熱器或冷卻器1082的溫度控制裝置可以配置在化學物質輸送線之周圍處,如圍繞管線,藉以加熱/冷卻化學物質至所需之溫度。加熱器/冷卻器1081可以配置在滾筒體外部表面的周圍處,如裝設在滾筒體露出的端部上,或是沿著滾筒體1077設置在泡沫層1071的下方。加熱器/冷卻器1083也可以配置在滾筒體1077的內部,藉以加熱/冷卻滾筒體,或是加熱/冷卻抵達滾筒體的化學物質。當然,任何加熱器與冷卻器的組合都是可以採用的。 22A-22D are schematic diagrams showing the configuration of a temperature control device for a rolling coating apparatus and method according to a preferred embodiment of the present invention. Figure 22A shows a drum body 1077 that is coated with a foam or cured foam material 1071 over a substantial portion of the exterior surface. The liquid medium 1074 is transferred to the inside of the drum body 1077 to be transferred to the foam material 1071. A temperature control device such as a heater or cooler 1082 can be placed around the chemical delivery line, such as around the line, to heat/cool the chemical to the desired temperature. The heater/cooler 1081 may be disposed at the periphery of the outer surface of the drum body, such as at the exposed end of the drum body, or under the foam layer 1071 along the drum body 1077. The heater/cooler 1083 may also be disposed inside the drum body 1077 to heat/cool the drum body or to heat/cool the chemicals that reach the drum body. Of course, any combination of heater and cooler can be used.

圖22B顯示了設置在滾筒體1077內部的加熱器/冷卻器1084,如裝設在中空滾筒體的內部表面。圖22C顯示了設置在滾筒體1077中間的加熱器/冷卻器1085,藉以加熱/冷卻滾筒體及化 學物質袋1086中的化學物質。圖22D顯示了設置在滾筒體附近的加熱器1087,並經由屏蔽1088將熱能導向基板1096,藉此加熱基板1096。加熱器1087可以設置在接連的滾筒體之間,並設於基板的頂部、基板的底部,或者兩邊皆有。 Figure 22B shows a heater/cooler 1084 disposed inside the drum body 1077, such as mounted on the interior surface of the hollow drum body. Figure 22C shows a heater/cooler 1085 disposed in the middle of the drum body 1077 for heating/cooling the drum body and Learn the chemicals in the material bag 1086. 22D shows the heater 1087 disposed adjacent the drum body and directing thermal energy to the substrate 1096 via the shield 1088, thereby heating the substrate 1096. The heater 1087 may be disposed between successive roller bodies and disposed at the top of the substrate, at the bottom of the substrate, or on both sides.

在一些實施例中,本發明揭露了一種線上沉積系統,包括能接收液體流流至滾筒體內部,並將液體分佈至外部表面的滾筒體。液體介質會受到輸送管線的保護,並且唯一會暴露在環境中的液體只有黏附至滾筒體表面的液體。將暴露機會最小化可以有效提升沉積系統的安全性,特別是對於有害的液體,如亞磷酸或三氟化硼。 In some embodiments, the present invention discloses an in-line deposition system comprising a drum body that receives a flow of liquid to the interior of the drum body and distributes the liquid to the exterior surface. The liquid medium is protected by the transfer line and the only liquid that is exposed to the environment is the liquid that adheres to the surface of the drum body. Minimizing exposure opportunities can effectively increase the safety of deposition systems, especially for hazardous liquids such as phosphorous acid or boron trifluoride.

透過所提之滾筒體塗佈的沉積可以施行在基板的二面,或是僅應用於其中一面。此外,也可以包括其它類型的塗層。基板可以透過線上運輸裝置,例如:任何類型的輸送裝置或陶瓷滾筒體,運輸至液體滾筒體進行塗佈,接著經由出口端線上運輸輸送至後續製程處,如退火爐。也可以加入其它的功能元件,例如,排氣和隔離,以防止有害氣體漏出;溫度隔離,以提供安全壁;載氣氣體和氣簾氣體,以隔離及淨化大氣;於製程室中取出前之基板調節,如乾燥環境和用於系統清理之噴灑清洗系統。 The deposition by the coated roller body coating can be performed on both sides of the substrate or only on one side. In addition, other types of coatings may also be included. The substrate can be transported to the liquid drum body for coating through an in-line transport device, such as any type of transport device or ceramic drum body, and then transported via an outlet end line to a subsequent process, such as an annealing furnace. Other functional components can also be added, such as exhaust and isolation to prevent harmful gases from leaking out; temperature isolation to provide a safety wall; carrier gas and curtain gas to isolate and purify the atmosphere; and removal of the substrate before processing in the process chamber Adjustments such as dry environments and spray cleaning systems for system cleaning.

圖23A~23C為本案較佳實施例之用於滾動式塗佈之設備與方法之液體塗佈配置示意圖。圖23A顯示了夾於二個滾筒體1091A和1091B之間的基板1096。滾筒體接收液體介質1094A及1094B, 並從一端進入滾筒體,分佈至滾筒體的表面。泡沫或固化泡沫層1095A和1095B包覆在滾筒體的外部表面,並從滾筒體表面接收將轉移至基板1096的液體介質。將滾筒體設置在基板的頂部和底部係能同時塗佈基板的正反面。此外,滾筒體可以移動基板前進,從而作為輸送滾輪。 23A-23C are schematic views showing the liquid coating configuration of the apparatus and method for roll coating according to a preferred embodiment of the present invention. Figure 23A shows a substrate 1096 sandwiched between two roller bodies 1091A and 1091B. The drum body receives the liquid medium 1094A and 1094B, And from one end into the drum body, distributed to the surface of the drum body. Foam or cured foam layers 1095A and 1095B overlie the outer surface of the drum body and receive a liquid medium that will be transferred to substrate 1096 from the drum body surface. The drum body is disposed on the top and bottom of the substrate to simultaneously coat the front and back surfaces of the substrate. Further, the drum body can move the substrate to advance as a conveying roller.

流過滾筒體1091A/1091B的液體介質可以經由控制達到以最小化過量浪費方式完成在基板1096上所需之塗佈作業。此外,可以透過控制滾筒體之間的間隔來施加適當的接觸壓力於基板1096,藉以最小化液體的浪費。例如,彈簧可以設置在頂部滾筒體1091A上,藉以提供所需壓力至基板1096。多個獨立控制機制可用來消除或最小化基板表面上多餘的流體,例如在沒有任何液滴的情況下提供均勻的塗層。底部滾筒體1091B旋轉軸線的周圍可以固定,並透過旋轉來塗佈基板底部表面,同時促使基板向前移動。此外,可以選擇性地利用盆體1099來捕捉殘餘的液體。 The liquid medium flowing through the drum bodies 1091A/1091B can be controlled to achieve the desired coating operation on the substrate 1096 in a manner that minimizes excessive waste. In addition, proper contact pressure can be applied to the substrate 1096 by controlling the spacing between the drum bodies, thereby minimizing waste of liquid. For example, a spring can be disposed on the top roller body 1091A to provide the desired pressure to the substrate 1096. Multiple independent control mechanisms can be used to eliminate or minimize excess fluid on the substrate surface, such as providing a uniform coating without any droplets. The periphery of the rotation axis of the bottom drum body 1091B can be fixed and coated to rotate the bottom surface of the substrate while causing the substrate to move forward. Additionally, the basin 1099 can be selectively utilized to capture residual liquid.

圖23B顯示了設置在基板1096頂部的滾筒體1091A,藉以於頂部表面上沉積塗層。底部表面可以沒有塗層,或是經由其它的塗佈製程1097A來產生塗層。其它的塗佈製程可為液體噴塗,包括以氣膠或液體形式傳送化學介質的噴嘴,並且含有或者不含載氣或溶劑,或是浸泡液態化學介質的海綿滾筒體。此外,底部表面可由滾筒體1097B支撐,它可作為輸送滾輪或為非液體供應式滾筒體。滾筒體1097B可以用於輸送基板前進,或是在液體供應 式滾筒體1091A和基板1096之間施加接觸壓力。 Figure 23B shows the roller body 1091A disposed on top of the substrate 1096, whereby a coating is deposited on the top surface. The bottom surface may be uncoated or may be coated via another coating process 1097A. Other coating processes can be liquid spray, including nozzles that transfer chemical media in the form of a gas gel or liquid, with or without carrier gas or solvent, or a sponge drum body that soaks the liquid chemical medium. Further, the bottom surface may be supported by the drum body 1097B, which may serve as a conveying roller or a non-liquid supply drum body. The drum body 1097B can be used to transport the substrate forward, or in the liquid supply A contact pressure is applied between the drum body 1091A and the substrate 1096.

圖23C顯示了設置在基板1096底部的滾筒體1091B,藉以於底部表面上沉積塗層。頂部表面上可以不具塗層,或是經由其它的塗佈製程1098A來產生塗層。底部的液體滾筒體1091A可以作為搬移基板的傳送滾輪。此外,滾筒體1098B可以設置在基板的頂部,且可為非液體供應式滾筒體,並且可以在液體供應式滾筒體1091B和基板1096之間提供施加接觸壓力。 Figure 23C shows the roller body 1091B disposed at the bottom of the substrate 1096, whereby a coating is deposited on the bottom surface. The top surface may be uncoated or otherwise coated by another coating process 1098A. The liquid drum body 1091A at the bottom can serve as a conveying roller for moving the substrate. Further, the drum body 1098B may be disposed at the top of the substrate, and may be a non-liquid supply type drum body, and may apply an application contact pressure between the liquid supply type drum body 1091B and the substrate 1096.

在一些實施例中,所有的滾筒體可以從單一的儲藏處及泵送系統接受相同的液體介質。或者,不同的滾筒體可以經由不同的儲藏處接受不同的液體介質。在頂部和底部的表面上可以沉積不同的化學物質。不同的化學物質也可以沉積在同一個表面上,形成塗佈混合物。填滿的滾筒體,例如,無法接受液體流的滾筒體,可以用於其它的用途,如增進介質的分佈。所有的液體介質可以從單一的儲藏處散佈,或者可以由多個儲藏處個別提供。此外,可以包括流動分佈機制,如泵送機制、壓力控制器、流量控制器以及分配歧管。也可以包括再循環機制以及自動重填機制。 In some embodiments, all of the drum bodies can receive the same liquid medium from a single storage and pumping system. Alternatively, different drum bodies can accept different liquid media via different reservoirs. Different chemicals can be deposited on the top and bottom surfaces. Different chemicals can also be deposited on the same surface to form a coating mixture. The filled drum body, for example, a drum body that cannot accept liquid flow, can be used for other purposes, such as enhancing the distribution of the medium. All liquid media can be dispensed from a single reservoir or can be provided individually from multiple reservoirs. In addition, flow distribution mechanisms such as pumping mechanisms, pressure controllers, flow controllers, and distribution manifolds can be included. Recycling mechanisms as well as automatic refill mechanisms can also be included.

圖24A~24C為本案較佳實施例之用於滾動式塗佈之設備與方法之線上沉積系統中的液體介質分佈配置示意圖。圖24A顯示了基板10103透過旋轉輸送滾輪10101而移動。底部的液體滾筒體10106可以取代輸送滾輪10101繼續移動基板前進,同時將液態塗料提供至底部表面。設置在頂部的滾筒體具有適當的壓力, 藉此以最小化多餘殘液方式沉積頂部塗層。 24A-24C are schematic diagrams showing the distribution of liquid medium in an in-line deposition system for a roll coating apparatus and method in accordance with a preferred embodiment of the present invention. FIG. 24A shows that the substrate 10103 is moved by rotating the conveying roller 10101. The bottom liquid drum body 10106 can continue to move the substrate forward instead of the transport roller 10101 while providing liquid paint to the bottom surface. The drum body placed at the top has appropriate pressure, Thereby the top coating is deposited in a manner that minimizes excess residue.

液體介質可以經由一個或多個儲藏處提供至滾筒體。例如:含有化學液體的儲藏處10104A可以提供液體介質至泵10104B,以經由泵將液體介質推送至滾筒體10106。可以增設壓力控制器10104C及流體控制器10104D來調節送往滾筒體的壓力與流量。歧管10104E係用以將液體介質分佈至滾筒體。溫度控制器10104F可以加熱或冷卻液體介質和/或基板。為了簡明起見,顯示的歧管以相同的壓力和流動分配相同的液體介質至底部滾筒體10106,不過本發明並沒有這樣的限制。當然,可以使用不同的配置,如分配液體介質至所有滾筒體的歧管,或是加入不同的輸送系統,並以不同的壓力和不同的流量將不同的化學物質傳送至不同的滾筒體。 The liquid medium can be supplied to the drum body via one or more reservoirs. For example, a reservoir 10104A containing a chemical liquid can provide a liquid medium to the pump 10104B to push the liquid medium to the drum body 10106 via a pump. A pressure controller 10104C and a fluid controller 10104D may be added to regulate the pressure and flow to the drum body. Manifold 10104E is used to distribute the liquid medium to the drum body. Temperature controller 10104F can heat or cool the liquid medium and/or substrate. For the sake of brevity, the manifold shown is assigned the same liquid medium to the bottom drum body 10106 at the same pressure and flow, although the invention is not so limited. Of course, different configurations can be used, such as dispensing a liquid medium to the manifold of all drum bodies, or adding different delivery systems, and delivering different chemicals to different drum bodies at different pressures and different flows.

流量和壓力控制器可以調節提供至基板表面的液體介質,用以最佳化塗佈製程,如最小化塗佈至基板上多餘的液體,或是將塗佈至基板的液體介質調整至具有期望之特性,如與基板之較高或較低的粘度,或者較高或較低的反應速率。本發明的液體輸送系統可以進一步防止在輸送管線中反應,如在滾筒體或是在液體源。例如,對於太陽能電池裝置,可以利用本發明的液體滾筒體來沉積吸收層,並且在基板表面上結晶,而不是在滾筒體表面。多個獨立的流動速率、流動壓力、滾筒壓力、化學溫度與基板溫度控制器可以在基板表面上提供最佳化的塗層,例如:完全沒有 液滴或多餘液體浪費,或者是最小化液滴或多餘液體浪費的均勻塗層。 The flow and pressure controller can adjust the liquid medium supplied to the surface of the substrate to optimize the coating process, such as minimizing excess liquid applied to the substrate, or adjusting the liquid medium applied to the substrate to have desired Characteristics such as higher or lower viscosity with the substrate, or higher or lower reaction rates. The liquid delivery system of the present invention can further prevent reactions in the transfer line, such as in the drum body or in a liquid source. For example, for a solar cell device, the liquid roller body of the present invention can be used to deposit an absorbing layer and crystallize on the surface of the substrate instead of the surface of the drum body. Multiple independent flow rates, flow pressures, roller pressures, chemical temperatures, and substrate temperature controllers can provide optimized coatings on the substrate surface, for example: no Drops of droplets or excess liquid, or a uniform coating that minimizes the waste of droplets or excess liquid.

頂部和底部滾筒體可以接受不同的液體介質,以獲取不同的塗佈材料。圖24B顯示了接受化學溶液的頂部滾筒體10106以及接受另一種化學溶液的底部滾筒體10102。頂部和底部滾筒體可以相同速度或不同的速度旋轉。例如:在頂部及底部滾筒體上具有相同的液體介質情況下,頂部及底部滾筒體可以相同的速度旋轉,藉以在基板的頂部及底部表面上沉積相同的塗層。對於不同的液體介質,頂部和底部滾筒體可以適當的速度旋轉,可為相同或不同之速度。 The top and bottom drum bodies can accept different liquid media to obtain different coating materials. Figure 24B shows the top drum body 10106 receiving the chemical solution and the bottom drum body 10102 receiving another chemical solution. The top and bottom drum bodies can be rotated at the same speed or at different speeds. For example, with the same liquid medium on the top and bottom drum bodies, the top and bottom drum bodies can be rotated at the same speed to deposit the same coating on the top and bottom surfaces of the substrate. For different liquid media, the top and bottom drum bodies can be rotated at the appropriate speed, either at the same or different speeds.

可以增設額外的滾筒體。例如:可以提供一個或多個乾燥滾筒體,以獲得更好的液體介質分佈。乾燥滾筒體可以設置來替換液體滾筒體,或者可以設置在選定的位置。乾燥滾筒體可為沒有任何濕潤液體的滾筒體,無法從內部接受液體的滾筒體,或是具有用以乾燥多孔層之真空吸力(取代液體流動)的滾筒體,或是刷狀滾筒體。 Additional drum bodies can be added. For example, one or more drying drum bodies can be provided for better liquid media distribution. The drying drum body can be arranged to replace the liquid drum body or can be placed in a selected position. The drying drum body may be a drum body without any moist liquid, a drum body that cannot receive liquid from the inside, or a drum body having a vacuum suction (instead of liquid flow) for drying the porous layer, or a brush drum body.

不同的滾筒體可以用於相同的表面。圖24C顯示了和頂部滾筒體10106間隔交替的滾筒體10108,以及和底部滾筒體10102間隔交替的滾筒體10109。間隔交替的滾筒體可以提供不同的化學液體形成混合塗層。此外,間隔交替的滾筒體可為乾燥滾筒體。 Different drum bodies can be used for the same surface. Figure 24C shows the drum body 10108 alternately spaced from the top drum body 10106 and the drum body 10109 alternately spaced from the bottom drum body 10102. The alternately spaced drum bodies can provide different chemical liquids to form a hybrid coating. Further, the alternately spaced drum bodies can be dry drum bodies.

在一個實施例中,本發明揭露了使用連續液體介質供給的沉 積製程。圖25A~25C為本案較佳實施例之用於滾動式塗佈之設備與方法之沉積製程示意圖。在圖25A中,基板10110透過液體滾筒體塗佈10110液體塗層,隨後可選擇性地進行層的調節製程10111。層的調節製程是非必要的,意即只有在需要的時候用來調節沉積層。例如:一些製程需要液體層作為沉積,因此不需要調節製程。調節製程可以是乾燥製程,例如:經由加熱器或乾燥滾筒體實現。乾燥製程是非必要的,意即主動式的乾燥製程不是必要的,例如:沉積過程可以是在空氣中乾燥,或者乾燥製程可以嵌入在隨後的製程中,例如:在後續的退火製程。 In one embodiment, the present invention discloses a sink using a continuous liquid medium supply Process. 25A-25C are schematic views showing a deposition process of the apparatus and method for roll coating according to a preferred embodiment of the present invention. In FIG. 25A, the substrate 10110 is coated with a 10110 liquid coating through a liquid cylinder body, and then a layer conditioning process 10111 is selectively performed. The layer adjustment process is not necessary, meaning that it is used to adjust the deposited layer only when needed. For example, some processes require a liquid layer for deposition, so there is no need to adjust the process. The conditioning process can be a drying process, for example, via a heater or a drying drum body. The drying process is not necessary, meaning that an active drying process is not necessary, for example, the deposition process may be drying in air, or the drying process may be embedded in a subsequent process, for example, in a subsequent annealing process.

圖25B顯示了分離塗佈與乾燥的結構實施例,其特徵在於包括具液體滾筒體10116的獨立塗層站,以及包含加熱器10114的調節/乾燥站。當輸送滾輪將基板10103傳送至塗層站時,液體滾筒體10116將於基板上沉積液體塗層。如圖所示,液體滾筒體同時沉積塗層於頂部及底部上,當然,同樣類似的滾筒體也可以採用其它的配置形式。完成塗層後,基板將透過相同的底部液體滾筒體10116運送至乾燥站,並透過加熱器10114所提供的熱能進行乾燥。如圖所示,加熱器10114包括設置在平行於滾筒體的紅外線加熱器,藉以在基板通過時加熱基板,當然,也可以採用其它的加熱配置形式,例如:不同方位或是不同類型的加熱器。 Figure 25B shows an embodiment of a separate coated and dried structure comprising a separate coating station having a liquid cylinder body 10116 and an conditioning/drying station comprising a heater 10114. When the transport roller transports the substrate 10103 to the coating station, the liquid roller body 10116 deposits a liquid coating on the substrate. As shown, the liquid cylinder body simultaneously deposits a coating on the top and bottom. Of course, similarly similar drum bodies can be used in other configurations. After the coating is completed, the substrate will be transported through the same bottom liquid drum body 10116 to the drying station and dried by the thermal energy provided by the heater 10114. As shown, the heater 10114 includes an infrared heater disposed parallel to the drum body to heat the substrate as the substrate passes. Of course, other heating configurations may be employed, such as different orientations or different types of heaters. .

圖25C顯示了整合沉積與乾燥的結構配置實施例。塗層站和乾燥站係共同整合至沉積站中,於其中加熱器10114和液體滾筒 體10116是設置在彼此旁邊,因此從每個滾筒體10116而來的液體塗層將可立即被下一個加熱器10114加熱烘乾。可以使用其它的結構配置,如在一個液體滾筒體10116之後具有多個加熱器10114,或者是在多個液體滾筒體10116之後具有一個加熱器10114。 Figure 25C shows an embodiment of a structural arrangement for integrated deposition and drying. The coating station and the drying station are integrated into the deposition station, in which the heater 10114 and the liquid roller The bodies 10116 are disposed next to each other so that the liquid coating from each of the drum bodies 10116 will be immediately dried by the next heater 10114. Other structural configurations may be used, such as having a plurality of heaters 10114 behind a liquid drum body 10116 or having a heater 10114 behind the plurality of liquid drum bodies 10116.

圖26A~26C為本案較佳實施例之用於滾動式塗佈之設備與方法之沉積製程示意圖。在圖26A中,基板透過液體滾筒體塗佈10120摻雜液體層,乾燥10121後形成固體層,接著在於爐中退火以驅動基板表面下的摻雜物。乾燥製程可以省略,或者可以嵌入至退火製程中。圖26B顯示了塗層、乾燥和退火的配置實施例,包括具液體滾筒體10126的獨立塗層站以及具加熱器10124的乾燥站。當輸送滾輪10127將基板10103傳送至塗層站時,液體滾6筒體10126將在基板上沉積液體塗層。完成塗層後,基板將透過相同的底部液體滾筒體10126傳送至乾燥站,並透過加熱器10124所提供的熱能進行乾燥。隨後,基板將傳送至採用加熱器10125的退火爐。 26A-26C are schematic views showing a deposition process of the apparatus and method for roll coating according to a preferred embodiment of the present invention. In FIG. 26A, the substrate is coated with a 10120 doped liquid layer through a liquid cylinder body, dried 10121 to form a solid layer, and then annealed in a furnace to drive dopants under the surface of the substrate. The drying process can be omitted or can be embedded in the annealing process. Figure 26B shows a configuration example of coating, drying, and annealing, including a separate coating station with a liquid drum body 10126 and a drying station with a heater 10124. When the transport roller 10127 transports the substrate 10103 to the coating station, the liquid roller 6 cylinder 10126 will deposit a liquid coating on the substrate. After the coating is completed, the substrate will be transferred to the drying station through the same bottom liquid drum body 10126 and dried by the thermal energy provided by the heater 10124. Subsequently, the substrate will be transferred to an annealing furnace employing a heater 10125.

圖26C顯示了整合塗層與乾燥的結構配置實施例。塗層站和乾燥站係共同整合至沉積站中,於其中加熱器10124和液體滾筒體10126是設置在彼此旁邊,因此從每個滾筒體10126而來的液體塗層將可立即被下一個加熱器10124加熱烘乾。在乾燥後,基板係透過加熱器10125進行退火。乾燥步驟是選擇性的,可以略 過,或者與退火製程結合。例如,在退火製程的主要退火步驟之前可以加入一個預退火步驟,乾燥製程即可包括在預退火步驟中。 Figure 26C shows an embodiment of a structural arrangement of integrated coating and drying. The coating station and the drying station are integrated into the deposition station, wherein the heater 10124 and the liquid drum body 10126 are disposed next to each other, so that the liquid coating from each of the drum bodies 10126 will be immediately heated by the next one. The device 10124 is heated and dried. After drying, the substrate is annealed by a heater 10125. The drying step is optional and can be omitted Over, or combined with the annealing process. For example, a pre-annealing step can be added prior to the main annealing step of the annealing process, and the drying process can be included in the pre-annealing step.

在一個實施例中,本發明揭露了用於在基板上沉積液體的方法,包括使用至少一端接受液體介質的滾筒體,並將液體遷移至用於接觸塗佈的外部表面。滾筒體接收液體介質的端部可為末端,如圓柱形滾筒體的端部表面,或者可以靠近末端,如滾筒體外部表面接近端面的地方。滾筒體具有通道,能將液體介質帶往滾筒體的外部表面,如圓柱形滾筒體的圓周表面。 In one embodiment, the present invention discloses a method for depositing a liquid on a substrate comprising using a cylinder body that receives the liquid medium at least one end and migrating the liquid to an exterior surface for contact coating. The end of the drum body receiving the liquid medium may be an end, such as an end surface of a cylindrical drum body, or may be near the end, such as where the outer surface of the drum body is near the end surface. The drum body has a passage for carrying the liquid medium to the outer surface of the drum body, such as the circumferential surface of the cylindrical drum body.

圖27A~27B為本案較佳實施例之用於滾動式塗佈之設備與方法之液體沉積流程圖。在圖27A中,操作步驟10130將一個或多個基板提供至移動平台上,例如,一個大型平面基板或是多個排列成橫列的半導體基板。所述的移動平台可為線上輸送機,包括如滾筒體的工具,用以將基板從一個處理站移動至另一個處理站。移動平台可為線上塗層站的輸入站,可接受基板並將基板傳送至塗佈區。基板在進入塗層站前可以先作準備,例如:透過表面清理製程去除雜質或顆粒,或是透過氧化製程形成氧化層。在某些情況下,基板上原生的氧化層可能不是最好的,因此,可能進行HF溶劑清洗以令表面潔淨。可將基板運送至一個殼體中,例如:透過基板移動機構,或著基板可以接連移動通過殼體,例如:透過線上輸送機構。 27A-27B are flow diagrams of liquid deposition for apparatus and methods for roll coating in accordance with a preferred embodiment of the present invention. In FIG. 27A, operation 10130 provides one or more substrates to a mobile platform, such as a large planar substrate or a plurality of semiconductor substrates arranged in a row. The mobile platform can be an in-line conveyor, including a tool such as a drum body for moving substrates from one processing station to another. The mobile platform can be an input station for the on-line coating station, accepting the substrate and transferring the substrate to the coating zone. The substrate can be prepared before entering the coating station, for example, removing impurities or particles through a surface cleaning process, or forming an oxide layer through an oxidation process. In some cases, the native oxide layer on the substrate may not be optimal, so HF solvent cleaning may be performed to clean the surface. The substrate can be transported into a housing, for example, through a substrate moving mechanism, or the substrate can be moved through the housing in succession, for example, through an in-line transport mechanism.

在操作步驟10131中,基板係送入具多個塗佈滾筒體的塗佈 區域,部份滾筒體係同時作為移動基板前進的傳送滾輪。另一方面,液體介質至少流動至液體滾筒體的一端,於其中液體介質將轉移至滾筒體的外部表面。覆蓋滾筒體非必要的泡沫材料可用於改善塗佈製程,如減少基板損傷,並可促進基板上液體介質的分佈。此外,滾筒體可以具有通道,如中空圓柱形管,或是沿著滾筒體長度延伸的溝槽,藉以導引液體介質。 In operation 10131, the substrate is fed into a coating having a plurality of coating drum bodies. In the area, part of the roller system acts as a transfer roller for moving the substrate. In another aspect, the liquid medium flows at least to one end of the liquid drum body where the liquid medium will transfer to the outer surface of the drum body. Non-essential foam covering the drum body can be used to improve the coating process, such as reducing substrate damage and promoting the distribution of liquid media on the substrate. Further, the drum body may have a passage, such as a hollow cylindrical tube, or a groove extending along the length of the drum body to guide the liquid medium.

在操作步驟10132中,透過旋轉滾筒體係能促使液體介質經由接觸而從滾筒體的表面塗佈至基板的表面上。此外,旋轉輸送滾筒體係能將基板移動至塗層區的端部。也可以包括改善塗層的工具,例如:為了獲得更好的介質分佈,可在液體滾筒體之後設置乾燥滾筒體。 In operation 10132, the rotating drum system can cause the liquid medium to be applied from the surface of the drum body to the surface of the substrate via contact. In addition, the rotating conveyor roller system can move the substrate to the end of the coating zone. Tools for improving the coating may also be included, for example, to obtain a better media distribution, a drying drum body may be provided after the liquid cylinder body.

在非必要的操作步驟136中,塗層係經由調節,例如:透過如紅外線燈或是其它形式作用在液體塗層的能量所產生的熱能進行乾燥,或是透過一個或多個乾燥滾筒體進行乾燥。乾燥區可以設置在塗層區之後,例如:將紅外線加熱器設置在液體滾筒體之後。或者,乾燥區可以和塗層區整合,例如:將紅外線加熱器與液體滾筒體交錯設置。 In an optional operation step 136, the coating is dried by conditioning, for example, by thermal energy generated by the energy of the liquid coating, such as an infrared lamp or other means, or by one or more drying drum bodies. dry. The drying zone can be placed after the coating zone, for example by placing the infrared heater behind the liquid roller body. Alternatively, the drying zone can be integrated with the coating zone, for example by interlacing the infrared heater with the liquid roller body.

在沉積過程中,可以使用額外的元件。例如,對於需要熱化學物質的沉積製程,在送達基板之前,加熱器可用於加熱液體供應源。對於需要高溫基板活化化學反應的沉積製程,加熱器可用於加熱基板。另外,溫度控制裝置可用於將化學物質保持在適當 的溫度下,如冷卻或加熱。 Additional components can be used during the deposition process. For example, for a deposition process that requires a thermal chemistry, the heater can be used to heat the liquid supply source prior to delivery to the substrate. For deposition processes that require a high temperature substrate to activate a chemical reaction, a heater can be used to heat the substrate. In addition, temperature control devices can be used to keep chemicals in place The temperature, such as cooling or heating.

圖27B顯示了用於沉積塗層之製程實施例。操作步驟10130將一個或多個基板提供至移動平台上。在操作步驟10135中係加熱基板至所需的溫度,如能加速於其上化學物質沉積反應速度的溫度,藉以蒸發化學物質中的液體載體,或是退火沉積層。在操作步驟10136中,被加熱的基板係透過多個滾筒體進行液體層的滾塗式沉積,其中滾筒體皆從至少滾筒體的一端接收液體介質。例如:液體層可為太陽能電池裝置結構中的吸收層,具有吸收體的化學物質,包括在液體介質中的吸收體元素的小型球狀懸浮體。吸收體的化學物質可以在室溫或分室溫度下保存及傳遞,以防止反應並延長化學物質的生命週期。接著,冷卻後的化學物質將沉積在熱基板上,並透過熱能觸發反應,進而在基板上形成薄膜層。 Figure 27B shows a process embodiment for depositing a coating. Operation 10130 provides one or more substrates to the mobile platform. In operation 10135, the substrate is heated to a desired temperature, such as a temperature at which the chemical deposition reaction rate can be accelerated, thereby evaporating the liquid carrier in the chemical or annealing the deposited layer. In operation 10136, the heated substrate is subjected to roll-to-roll deposition of the liquid layer through a plurality of roller bodies, wherein the roller body receives the liquid medium from at least one end of the roller body. For example, the liquid layer can be an absorbent layer in a solar cell device structure, a chemical having an absorber, including a small spherical suspension of absorber elements in a liquid medium. The sorbent chemicals can be stored and transferred at room temperature or at room temperature to prevent reaction and extend the life cycle of the chemical. Then, the cooled chemical will be deposited on the hot substrate and the reaction will be triggered by thermal energy to form a thin film layer on the substrate.

圖27C顯示了用於沉積摻雜層之製程實施例。操作步驟10130將一個或多個基板提供至移動平台上。在操作步驟10137中,基板透過多個液體滾筒體進行摻雜塗層的滾塗式沉積,其中滾筒體皆從至少滾筒體的一端接收液體介質。摻雜層包含摻雜元素,其係與基板作用反應形成PN接面。 Figure 27C shows a process embodiment for depositing a doped layer. Operation 10130 provides one or more substrates to the mobile platform. In operation 10137, the substrate is subjected to roll coating deposition of a doped coating through a plurality of liquid cylinder bodies, wherein the roller bodies each receive a liquid medium from at least one end of the drum body. The doped layer contains a doping element that reacts with the substrate to form a PN junction.

在操作步驟10138中,基板係送入擴散爐以驅使摻雜物進入基板。該爐可以包括多個加熱器,藉以加熱塗層至很高的溫度,如介於600和1000℃之間。該爐可以包括一個預熱區,用以在 熱爐區與室溫環境之間形成溫度轉換區域。預熱區可以同時作為乾燥液體塗層的乾燥區。 In operation 10138, the substrate is fed into a diffusion furnace to drive dopants into the substrate. The furnace may include a plurality of heaters to heat the coating to a very high temperature, such as between 600 and 1000 °C. The furnace may include a preheating zone for A temperature conversion zone is formed between the hot furnace zone and the room temperature environment. The preheating zone can simultaneously serve as a drying zone for the dry liquid coating.

在一個實施例中,本發明揭露了利用液態供應式滾筒體進行滾動塗佈製程的改良。例如,可以增設壓力機構來施加所需壓力至液體滾筒體,並能於基板上以含有或不含最小化過量液體之方式進行濕式塗佈。可使用如泵和控制器的主動機構調節液體介質,以補償不同液體的性質,例如粘度、蒸發特性、密度或是反應性。 In one embodiment, the present invention discloses an improvement in the roll coating process using a liquid supply roller body. For example, a pressure mechanism can be added to apply the desired pressure to the liquid cylinder body and wet coating can be performed on the substrate in a manner that does or does not minimize excess liquid. The active medium, such as a pump and controller, can be used to condition the liquid medium to compensate for the properties of the different liquids, such as viscosity, evaporation characteristics, density, or reactivity.

圖28A~28B為本案較佳實施例之用於滾動式塗佈之設備與方法之液體沉積控制流程圖。在圖28A中,傳送至基板的液體介質係經由控制而達到所需之目標,例如:促使塗層最佳化與操作成本最小化。操作步驟10140將一個或多個基板提供至移動平台上。在操作步驟10141中,液體介質至少流動至液體滾筒體的一端,於其中液體介質將轉移至滾筒體的外部表面,藉以透過旋轉滾筒體塗佈基板,並在基板表面上形成均勻的塗層。 28A-28B are flow diagrams of liquid deposition control for apparatus and methods for roll coating in accordance with a preferred embodiment of the present invention. In Figure 28A, the liquid medium delivered to the substrate is controlled to achieve the desired objectives, such as to promote coating optimization and minimize operating costs. Operation 10140 provides one or more substrates to the mobile platform. In operation 10141, the liquid medium flows to at least one end of the liquid cylinder body, wherein the liquid medium is transferred to the outer surface of the drum body, whereby the substrate is coated through the rotating drum body and a uniform coating is formed on the surface of the substrate.

在操作步驟10142中,至少調節液體溫度、液體流速、流體濃度、流體溫度,以及液體壓力之其一,藉以在基板表面上實現所需之塗層。此外,在使用頂部和底部滾筒體塗佈的情況下,頂部和底部滾筒體之間的接觸壓力可經由控制獲得最佳的塗佈狀況,如取得所需的塗層、最小化多餘流體浪費,或是補償液體介質屬性之差異。多個控制機制可以提供顯著的優點,例如:促使 沉積製程完全沒有或具有最小化的液滴或多餘流體介質,允許降低均勻塗層的化學物質消耗。流體的一致性以及其它流體特性,如濃度或溫度,可以經由控制以確保一致性及所需之沉積層性能。 In operation 10142, at least one of liquid temperature, liquid flow rate, fluid concentration, fluid temperature, and liquid pressure is adjusted to achieve the desired coating on the surface of the substrate. In addition, in the case of top and bottom drum body coating, the contact pressure between the top and bottom drum bodies can be controlled to achieve optimum coating conditions, such as obtaining the desired coating and minimizing waste of excess fluid. Or compensate for differences in the properties of the liquid medium. Multiple control mechanisms can provide significant advantages, such as: The deposition process has no or minimal droplets or excess fluid medium, allowing for reduced chemical consumption of the uniform coating. Fluid consistency and other fluid characteristics, such as concentration or temperature, can be controlled to ensure consistency and desired deposition performance.

在圖28B中,透過控制基板表面上的塗層係能補償隨後製程的非均勻性。操作步驟10140將一個或多個基板提供至移動平台上。基板係與多個液體供給式滾筒體接觸,藉以在基板表面上滾動沉積塗層。操作步驟10145控制基板上塗層厚度的均勻性,實現非均勻的厚度設定。該塗層可以包括即將進行後續退火製程的摻雜層。可以使用非均勻的厚度設定補償後續製程的非均勻性,如在後續退火爐中非均勻的溫度分佈。在操作步驟10146中,非均勻的基板可以經由非均勻之厚度補償後續製程之非均勻性。例如:退火爐中的溫度可以是非均勻的,基板的厚度可以用來補償此非均勻性,因此可以實現均勻的摻雜分佈。 In Fig. 28B, the coating system on the surface of the control substrate can compensate for the non-uniformity of the subsequent process. Operation 10140 provides one or more substrates to the mobile platform. The substrate is in contact with a plurality of liquid supply roller bodies to deposit a coating on the surface of the substrate. Operation 10145 controls the uniformity of the coating thickness on the substrate to achieve a non-uniform thickness setting. The coating may include a doped layer that is about to undergo a subsequent annealing process. Non-uniform thickness settings can be used to compensate for non-uniformities in subsequent processes, such as non-uniform temperature distribution in subsequent annealing furnaces. In operation 10146, the non-uniform substrate can compensate for non-uniformities in subsequent processes via non-uniform thicknesses. For example, the temperature in the annealing furnace can be non-uniform, and the thickness of the substrate can be used to compensate for this non-uniformity, so that a uniform doping profile can be achieved.

在一個實施例中,本發明揭露了用於透過液體滾筒體實現所需塗層之不同製程條件。例如,頂部和底部滾筒體可以接受不同的液體介質,藉以在基板的頂部和底部上塗佈不同的層。交替間隔的滾筒體上可以施加不同的液體介質,以形成混合層或層壓層(laminate layers)。 In one embodiment, the present invention discloses different process conditions for achieving a desired coating through a liquid cylinder body. For example, the top and bottom drum bodies can accept different liquid media to coat different layers on the top and bottom of the substrate. Different liquid media can be applied to the alternately spaced drum bodies to form a mixed layer or laminate layers.

圖29A~29B為本案較佳實施例之用於滾動式塗佈之設備與方法之不同的液體沉積處理流程圖。在圖29A中,可以在基板的頂部和底部表面上施加不同的塗層。操作步驟10150將一個或多 個基板提供至移動平台上。在操作步驟10151中,第一種液體介質塗佈至頂部滾筒體,第二種液體介質塗佈至底部滾筒體。在操作步驟10152中,滾筒體透過旋轉在基板的頂部和底部上沉積不同的塗層。 29A-29B are flow diagrams of different liquid deposition processes for apparatus and methods for roll coating in accordance with a preferred embodiment of the present invention. In Figure 29A, different coatings can be applied on the top and bottom surfaces of the substrate. Operation 10150 will be one or more The substrates are provided to the mobile platform. In operation 10151, a first liquid medium is applied to the top drum body and a second liquid medium is applied to the bottom drum body. In operation 10152, the drum body is deposited by rotation to deposit different coatings on the top and bottom of the substrate.

在圖29B中,可以將混合塗層或層壓塗層施加於基板上。操作步驟10150將一個或多個基板提供至移動平台上。在操作步驟10155中,第一種和第二種液體介質係施加至交替間隔的滾筒體。此外,頂部和底部滾筒體可以接受相似或不同的液體介質。在操作步驟10156中,滾筒體係透過旋轉在基板上沉積塗層。 In Figure 29B, a hybrid or laminate coating can be applied to the substrate. Operation 10150 provides one or more substrates to the mobile platform. In operation 10155, the first and second liquid media are applied to the alternately spaced drum bodies. In addition, the top and bottom drum bodies can accept similar or different liquid media. In operation 10156, the roller system deposits a coating on the substrate by rotation.

本案所揭露之技術,得由熟習本技術人士據以實施,而其前所未有之作法亦具備專利性,爰依法提出專利之申請。惟上述之實施例尚不足以涵蓋本案所欲保護之專利範圍,因此,提出申請專利範圍如附。 The technology disclosed in this case can be implemented by a person familiar with the technology, and its unprecedented practice is also patentable, and the application for patent is filed according to law. However, the above embodiments are not sufficient to cover the scope of patents to be protected in this case. Therefore, the scope of the patent application is attached.

10‧‧‧基板 10‧‧‧Substrate

101‧‧‧輸送滾輪 101‧‧‧Transport roller

10101‧‧‧輸送滾輪 10101‧‧‧Transport roller

10102‧‧‧滾筒體 10102‧‧‧Drum body

10103‧‧‧基板 10103‧‧‧Substrate

10104A‧‧‧含有化學液體的儲藏處 10104A‧‧‧Storage containing chemical liquids

10104B‧‧‧泵 10104B‧‧‧ pump

10104C‧‧‧壓力控制器 10104C‧‧‧ Pressure Controller

10104D‧‧‧流體控制器 10104D‧‧‧ Fluid Controller

10104E‧‧‧歧管 10104E‧‧‧Management

10104F‧‧‧溫度控制器 10104F‧‧‧ Temperature Controller

10106‧‧‧滾筒體 10106‧‧‧Drum body

10108‧‧‧滾筒體 10108‧‧‧Drum body

10109‧‧‧滾筒體 10109‧‧‧Drum body

10110‧‧‧塗層塗佈 10110‧‧‧Coating coating

10111‧‧‧非必要的塗層調節 10111‧‧‧Unnecessary coating adjustment

10114‧‧‧加熱器 10114‧‧‧heater

10116‧‧‧滾筒體 10116‧‧‧Drum body

10120‧‧‧摻雜塗佈 10120‧‧‧Doping coating

10121‧‧‧乾燥 10121‧‧‧Drying

10122‧‧‧擴散退火 10122‧‧‧Diffusion annealing

10124‧‧‧加熱器 10124‧‧‧heater

10125‧‧‧加熱器 10125‧‧‧heater

10126‧‧‧滾筒體 10126‧‧‧The drum body

10127‧‧‧輸送滾輪 10127‧‧‧Transport roller

1021‧‧‧滾筒體 1021‧‧‧Drum body

1022‧‧‧滾筒體 1022‧‧‧Drum body

1024‧‧‧介質 1024‧‧‧Media

1026‧‧‧基板 1026‧‧‧Substrate

103‧‧‧基板 103‧‧‧Substrate

1031‧‧‧滾筒體 1031‧‧‧Drum body

1031B‧‧‧滾筒體 1031B‧‧‧Drum body

1031C‧‧‧滾筒體 1031C‧‧‧Drum body

1031D‧‧‧滾筒體 1031D‧‧‧Drum body

1031E‧‧‧滾筒體 1031E‧‧‧Drum body

1034‧‧‧入口 1034‧‧‧ Entrance

1034*‧‧‧液體層 1034*‧‧‧Liquid layer

1035‧‧‧分佈至外部表面 1035‧‧‧Distributed to the external surface

1035B‧‧‧多孔層 1035B‧‧‧Porous layer

1035C‧‧‧固體層 1035C‧‧‧Solid layer

1036‧‧‧基板 1036‧‧‧Substrate

1038‧‧‧入口 1038‧‧‧ Entrance

1038D‧‧‧固定線 1038D‧‧‧ fixed line

1038E‧‧‧固定線 1038E‧‧‧ fixed line

1039‧‧‧耦合器 1039‧‧‧ Coupler

1039D‧‧‧O形環或液態軸承 1039D‧‧‧O-ring or liquid bearing

1039E‧‧‧O形環或液態軸承 1039E‧‧‧O-ring or liquid bearing

1041‧‧‧滾筒體 1041‧‧‧Drum body

1042‧‧‧溝槽 1042‧‧‧ trench

1043‧‧‧管 1043‧‧‧ tube

1044‧‧‧液體介質 1044‧‧‧Liquid medium

1045‧‧‧多孔層 1045‧‧‧Porous layer

1046‧‧‧外覆蓋層 1046‧‧‧ outer cover

1047‧‧‧溝槽 1047‧‧‧ trench

1048‧‧‧內層 1048‧‧‧ inner layer

1049‧‧‧溝槽 1049‧‧‧ trench

104A‧‧‧儲藏處 104A‧‧‧Storage

104B‧‧‧泵 104B‧‧‧ pump

104D‧‧‧流體控制器 104D‧‧‧ fluid controller

104F‧‧‧溫度控制器 104F‧‧‧temperature controller

1051‧‧‧穿孔 1051‧‧‧Perforation

1052‧‧‧穿孔 1052‧‧‧Perforation

106‧‧‧滾筒體 106‧‧‧Drum body

1061‧‧‧滾筒體 1061‧‧‧Drum body

1062‧‧‧滾筒體 1062‧‧‧The drum body

1062A‧‧‧滾筒體 1062A‧‧‧Drum body

1062B‧‧‧滾筒體 1062B‧‧‧Drum body

1064‧‧‧液體介質 1064‧‧‧Liquid medium

1064*‧‧‧塗層 1064*‧‧‧ coating

1065‧‧‧多孔層 1065‧‧‧Porous layer

1066‧‧‧基板 1066‧‧‧Substrate

1067‧‧‧多孔層 1067‧‧‧Porous layer

1071‧‧‧泡沫材料 1071‧‧‧ foam

1074‧‧‧液體介質 1074‧‧‧Liquid medium

1077‧‧‧滾筒體 1077‧‧‧Drum body

1081‧‧‧加熱器/冷卻器 1081‧‧‧heater/cooler

1082‧‧‧加熱器/冷卻器 1082‧‧‧heater/cooler

1083‧‧‧加熱器/冷卻器 1083‧‧‧heater/cooler

1084‧‧‧加熱器/冷卻器 1084‧‧‧heater/cooler

1085‧‧‧加熱器/冷卻器 1085‧‧‧heater/cooler

1086‧‧‧化學物質袋 1086‧‧‧chemical bag

1087‧‧‧加熱器/冷卻器 1087‧‧‧heater/cooler

1088‧‧‧屏蔽 1088‧‧‧Shield

1091A‧‧‧滾筒體 1091A‧‧‧Drum body

1091B‧‧‧滾筒體 1091B‧‧‧Drum body

1094A‧‧‧液體介質 1094A‧‧‧Liquid medium

1094B‧‧‧液體介質 1094B‧‧‧Liquid medium

1095A‧‧‧泡沫層 1095A‧‧‧Foam layer

1095B‧‧‧泡沫層 1095B‧‧‧Foam layer

1096‧‧‧基板 1096‧‧‧Substrate

1097A‧‧‧塗佈製程 1097A‧‧‧ Coating Process

1097B‧‧‧滾筒體 1097B‧‧‧Drum body

1098A‧‧‧塗佈製程 1098A‧‧‧ Coating Process

1098B‧‧‧滾筒體 1098B‧‧‧Drum body

1099‧‧‧盆體 1099‧‧‧ basin

11‧‧‧液體塗層 11‧‧‧Liquid coating

11*‧‧‧乾燥 11*‧‧‧Drying

110‧‧‧塗層塗佈 110‧‧‧Coating coating

111‧‧‧非必要的塗層調節 111‧‧‧Unnecessary coating adjustment

114‧‧‧加熱器 114‧‧‧heater

116‧‧‧滾筒體 116‧‧‧Drum body

12‧‧‧摻雜層 12‧‧‧Doped layer

120‧‧‧摻雜塗佈 120‧‧‧Doped coating

121‧‧‧乾燥 121‧‧‧Drying

122‧‧‧擴散退火 122‧‧‧Diffusion annealing

124‧‧‧加熱器 124‧‧‧heater

125‧‧‧加熱器 125‧‧‧heater

126‧‧‧滾筒體 126‧‧‧The drum body

127‧‧‧輸送滾輪 127‧‧‧ conveying roller

14‧‧‧退火 14‧‧‧ Annealing

15‧‧‧液體塗層製程 15‧‧‧Liquid coating process

16‧‧‧退火 16‧‧‧ Annealing

161A‧‧‧核心 161A‧‧‧ core

161B‧‧‧核心 161B‧‧‧ core

161C‧‧‧核心 161C‧‧‧ core

161D‧‧‧核心 161D‧‧‧ core

161E‧‧‧核心 161E‧‧‧ core

167A‧‧‧多孔層 167A‧‧‧Porous layer

167B‧‧‧多孔層 167B‧‧‧Porous layer

167C‧‧‧多孔層 167C‧‧‧Porous layer

167D‧‧‧多孔層 167D‧‧‧Porous layer

167E‧‧‧多孔層 167E‧‧‧Porous layer

17‧‧‧塗層 17‧‧‧ Coating

18A‧‧‧塗層 18A‧‧‧ coating

18B‧‧‧塗層 18B‧‧‧ coating

19‧‧‧複合塗層 19‧‧‧Composite coating

201‧‧‧滾筒體 201‧‧‧Drum body

202‧‧‧多孔層 202‧‧‧Porous layer

204‧‧‧液體介質 204‧‧‧Liquid medium

204A‧‧‧介質 204A‧‧‧Media

205‧‧‧容器 205‧‧‧ container

206‧‧‧基板 206‧‧‧Substrate

207‧‧‧加熱/冷卻裝置 207‧‧‧heating/cooling unit

208‧‧‧屏障 208‧‧‧ barrier

209‧‧‧溫度均化裝置 209‧‧‧ Temperature homogenization device

21‧‧‧滾筒體 21‧‧‧The drum body

210‧‧‧溫度控制裝置 210‧‧‧ Temperature control device

211‧‧‧入口 211‧‧‧ entrance

212‧‧‧出口 212‧‧‧Export

22‧‧‧滾筒體 22‧‧‧Drum body

225A‧‧‧元件 225A‧‧‧ components

225B‧‧‧元件 225B‧‧‧ components

225C‧‧‧元件 225C‧‧‧ components

228‧‧‧槳 228‧‧‧Oars

23‧‧‧屏蔽 23‧‧‧Shield

24‧‧‧介質 24‧‧‧Media

25‧‧‧容器 25‧‧‧ Container

26‧‧‧基板 26‧‧‧Substrate

27‧‧‧冷卻裝置 27‧‧‧Cooling device

28‧‧‧槳 28‧‧‧Oars

29A‧‧‧加熱器 29A‧‧‧heater

29B‧‧‧加熱器 29B‧‧‧heater

30‧‧‧感應器 30‧‧‧ sensor

301‧‧‧開口 301‧‧‧ openings

304‧‧‧溫度控制裝置 304‧‧‧temperature control device

306‧‧‧溫度控制裝置 306‧‧‧ Temperature control device

308‧‧‧屏障 308‧‧‧ barrier

32‧‧‧滾筒體 32‧‧‧Drum body

33‧‧‧屏蔽 33‧‧‧Shield

34‧‧‧流體介質 34‧‧‧ Fluid media

36‧‧‧基板 36‧‧‧Substrate

37‧‧‧冷卻裝置 37‧‧‧Cooling device

39A‧‧‧加熱器 39A‧‧‧heater

39B‧‧‧加熱器 39B‧‧‧heater

39C‧‧‧加熱器 39C‧‧‧heater

39D‧‧‧加熱器 39D‧‧‧heater

39E‧‧‧加熱器 39E‧‧‧heater

401‧‧‧可控制式開口 401‧‧‧Controllable opening

402‧‧‧縫隙 402‧‧‧ gap

403‧‧‧開口 403‧‧‧ openings

61‧‧‧滾筒體 61‧‧‧The drum body

62‧‧‧滾筒體 62‧‧‧Drum body

62A‧‧‧滾筒體 62A‧‧‧Drum body

62B‧‧‧滾筒體 62B‧‧‧Drum body

64‧‧‧液體介質 64‧‧‧Liquid medium

64*‧‧‧塗層 64*‧‧‧ coating

65‧‧‧多孔層 65‧‧‧Porous layer

66‧‧‧基板 66‧‧‧Substrate

67‧‧‧多孔層 67‧‧‧Porous layer

70‧‧‧塗層 70‧‧‧ coating

71‧‧‧泡沫層 71‧‧‧Foam layer

71A‧‧‧滾筒體 71A‧‧‧Drum body

71B‧‧‧滾筒體 71B‧‧‧Drum body

71C‧‧‧滾筒體 71C‧‧‧Drum body

71D‧‧‧滾筒體 71D‧‧‧Drum body

72‧‧‧穿孔 72‧‧‧Perforation

73‧‧‧穿孔 73‧‧‧Perforation

73A‧‧‧穿孔 73A‧‧‧Perforation

73B‧‧‧穿孔 73B‧‧‧Perforation

74‧‧‧液體介質 74‧‧‧Liquid medium

75‧‧‧塗層 75‧‧‧Coating

75*‧‧‧塗層 75*‧‧‧ coating

75**‧‧‧塗層 75**‧‧‧Coating

76‧‧‧基板 76‧‧‧Substrate

76*‧‧‧基板 76*‧‧‧Substrate

76**‧‧‧基板 76**‧‧‧Substrate

77‧‧‧滾筒體 77‧‧‧Drum body

77D‧‧‧多孔層 77D‧‧‧Porous layer

78‧‧‧孔洞 78‧‧‧ hole

78A‧‧‧孔洞 78A‧‧‧ Hole

78B‧‧‧孔洞 78B‧‧‧ Hole

79‧‧‧孔洞 79‧‧‧ hole

81‧‧‧加熱器/冷卻器 81‧‧‧heater/cooler

83‧‧‧加熱器/冷卻器 83‧‧‧heater/cooler

84‧‧‧加熱器/冷卻器 84‧‧‧heater/cooler

85‧‧‧加熱器/冷卻器 85‧‧‧heater/cooler

91A‧‧‧滾筒體 91A‧‧‧Drum body

91B‧‧‧滾筒體 91B‧‧‧Drum body

95A‧‧‧泡沫層 95A‧‧‧Foam layer

95B‧‧‧泡沫層 95B‧‧‧Foam layer

96‧‧‧基板 96‧‧‧Substrate

97A‧‧‧塗佈製程 97A‧‧‧ Coating Process

97B‧‧‧滾筒體 97B‧‧‧Drum body

98A‧‧‧塗佈製程 98A‧‧‧ Coating Process

98B‧‧‧滾筒體 98B‧‧‧Drum body

99‧‧‧儲藏處 99‧‧‧ Storage

圖1A~1B為本案較佳實施例之用於滾動式塗佈之設備與方法製程流程示意圖;圖2A~2B為本案較佳實施例之用於滾動式塗佈之設備與方法之基本塗層方法和設備概念示意圖;圖3A~3B為本案較佳實施例之用於滾動式塗佈之設備與方法之塗層系統之各種加熱器配置示意圖;圖4A~4C為本案較佳實施例之用於滾動式塗佈之設備與方法之溫度控制裝置配置示意圖;圖5A~5C為本案較佳實施例之用於滾動式塗佈之設備與方法之塗佈製程示意圖;圖6A~6D為本案較佳實施例之用於滾動式塗佈之設備與方法之用於均勻沉積之滾筒體示意圖;圖7A~7I為本案較佳實施例之用於滾動式塗佈之設備與方法之用於非均勻沉積之滾筒體示意圖;圖8A~8C為本案較佳實施例之用於滾動式塗佈之設備與方法之液體塗佈配置示意圖;圖9A~9C為本案較佳實施例之用於滾動式塗佈之設備與方法之溫度屏障配置示意圖;圖10A~10B為本案較佳實施例之用於滾動式塗佈之設備與方法之物理屏障配置示意圖; 圖11A~11B為本案較佳實施例之用於滾動式塗佈之設備與方法之其它物理屏障配置示意圖;圖12為本案較佳實施例之用於滾動式塗佈之設備與方法之線上沉積系統之液體介質分佈配置示意圖;圖13A~13C為本案較佳實施例之用於滾動式塗佈之設備與方法之沉積製程示意圖;圖14A~14C為本案較佳實施例之用於滾動式塗佈之設備與方法之另一種沉積製程示意圖;圖15為本案較佳實施例之用於滾動式塗佈之設備與方法之液體沉積流程圖;圖16A~16B為本案較佳實施例之用於滾動式塗佈之設備與方法之液體沉積控制流程圖;圖17為本案較佳實施例之用於滾動式塗佈之設備與方法之不同的液體沉積控制處理流程圖;圖18A~18B為本案較佳實施例之用於滾動式塗佈之設備與方法之基本塗層方法和設備概念示意圖;圖19A~19E為本案較佳實施例之用於滾動式塗佈之設備與方法之滾筒體的各種配置示意圖;圖20A~20D為本案較佳實施例之用於滾動式塗佈之設備與方法之其它類型的滾筒體配置示意圖;圖21A~21C為本案較佳實施例之用於滾動式塗佈之設備與 方法之塗佈製程示意圖;圖22A~22D為本案較佳實施例之用於滾動式塗佈之設備與方法之加熱器配置示意圖;圖23A~23C為本案較佳實施例之用於滾動式塗佈之設備與方法之液體塗佈配置示意圖;圖24A~24C為本案較佳實施例之用於滾動式塗佈之設備與方法之線上沉積系統中的液體介質分佈配置示意圖;圖25A~25C為本案較佳實施例之用於滾動式塗佈之設備與方法之塗佈製程示意圖;圖26A~26C為本案較佳實施例之用於滾動式塗佈之設備與方法之摻雜製程示意圖;圖27A~27C為本案較佳實施例之用於滾動式塗佈之設備與方法之液體沉積流程圖;圖28A~28B為本案較佳實施例之用於滾動式塗佈之設備與方法之液體沉積控制流程圖;圖29A~29B為本案較佳實施例之用於滾動式塗佈之設備與方法之不同的液體沉積處理流程圖。 1A-1B are schematic diagrams showing a process flow of a device and method for rolling coating according to a preferred embodiment of the present invention; and FIGS. 2A-2B are basic coatings for a roll coating apparatus and method according to a preferred embodiment of the present invention; FIG. 3A to FIG. 3B are schematic diagrams showing various heater configurations of a coating system for a roll coating apparatus and method according to a preferred embodiment of the present invention; FIGS. 4A to 4C are diagrams of a preferred embodiment of the present invention; FIG. 5A to FIG. 5C are schematic diagrams showing a coating process for a rolling coating apparatus and method according to a preferred embodiment of the present invention; FIG. 6A to FIG. Schematic diagram of a roller body for uniform deposition of a device and method for roll coating according to a preferred embodiment; FIGS. 7A to 7I are used for non-uniformity of a device and method for roll coating according to a preferred embodiment of the present invention. FIG. 8A to FIG. 8C are schematic diagrams showing the liquid coating configuration of the apparatus and method for rolling coating according to a preferred embodiment of the present invention; and FIGS. 9A to 9C are used for rolling coating of the preferred embodiment of the present invention. Temperature barrier for equipment and methods A schematic diagram; FIG. 10A ~ 10B is the case of the preferred embodiment of a physical barrier for the rolling apparatus and method of coating a schematic view of the configuration; 11A-11B are schematic views showing other physical barrier configurations of the apparatus and method for roll coating according to a preferred embodiment of the present invention; and FIG. 12 is a line deposition of the apparatus and method for rolling coating according to a preferred embodiment of the present invention. FIG. 13A to FIG. 13C are schematic diagrams showing a deposition process of a device and method for roll coating according to a preferred embodiment of the present invention; and FIGS. 14A to 14C are used for rolling coating according to a preferred embodiment of the present invention; A schematic diagram of another deposition process of the apparatus and method of the present invention; FIG. 15 is a flow chart of liquid deposition of the apparatus and method for rolling coating of the preferred embodiment of the present invention; FIGS. 16A-16B are used for the preferred embodiment of the present invention Flow chart of liquid deposition control of apparatus and method for rolling coating; Fig. 17 is a flow chart of liquid deposition control process for different apparatus and method for rolling coating according to a preferred embodiment of the present invention; Figs. 18A to 18B are A schematic diagram of a basic coating method and apparatus for a roll coating apparatus and method of the preferred embodiment; FIGS. 19A-19E illustrate a drum body for a roll coating apparatus and method according to a preferred embodiment of the present invention FIG. 20A to FIG. 20D are schematic diagrams showing other types of drum bodies for the apparatus and method for rolling coating according to a preferred embodiment of the present invention; and FIGS. 21A to 21C are used for rolling coating according to a preferred embodiment of the present invention. Cloth equipment and FIG. 22A to FIG. 22D are schematic diagrams showing the arrangement of heaters for the apparatus and method for rolling coating according to a preferred embodiment of the present invention; FIGS. 23A to 23C are diagrams for rolling coating of the preferred embodiment of the present invention; FIG. 24A to FIG. 24C are schematic diagrams showing the distribution of liquid medium in an in-line deposition system for a roll coating apparatus and method according to a preferred embodiment of the present invention; FIGS. 25A-25C are diagrams A schematic diagram of a coating process for a roll coating apparatus and a preferred embodiment of the present invention; and FIGS. 26A to 26C are schematic diagrams of a doping process for a roll coating apparatus and method according to a preferred embodiment of the present invention; 27A-27C is a liquid deposition flow chart of a device and method for rolling coating according to a preferred embodiment of the present invention; and FIGS. 28A-28B are liquid deposition of an apparatus and method for roll coating according to a preferred embodiment of the present invention; Control Flowchart; Figures 29A-29B are flow diagrams of different liquid deposition processes for apparatus and methods for roll coating in accordance with a preferred embodiment of the present invention.

37‧‧‧冷卻裝置 37‧‧‧Cooling device

61‧‧‧滾筒體 61‧‧‧The drum body

64‧‧‧液體介質 64‧‧‧Liquid medium

64*‧‧‧塗層 64*‧‧‧ coating

65‧‧‧多孔層 65‧‧‧Porous layer

66‧‧‧基板 66‧‧‧Substrate

Claims (67)

一種流體供應式滾筒體,包括:一細長桿,係包括一耦合器,藉以於該細長桿之一端上接收一流體;該細長桿係配置為將該流體從該細長桿之該端轉移至該細長桿細長外部表面之一部份;一多孔層,係覆蓋該細長桿細長外部表面之一部份,藉以於該細長桿之外部表面接收該流體。 A fluid supply drum body comprising: an elongated rod comprising a coupler for receiving a fluid on one end of the elongated rod; the elongated rod configured to transfer the fluid from the end of the elongated rod to the A portion of the elongate outer surface of the elongate shaft; a porous layer covering a portion of the elongate outer surface of the elongate shaft for receiving the fluid from an outer surface of the elongate shaft. 如申請專利範圍第1項所述之流體供應式滾筒體,其係經由配置以沿細長方向傳遞均勻數量的流體。 The fluid supply drum body of claim 1, wherein the fluid supply drum body is configured to deliver a uniform amount of fluid in an elongated direction. 如申請專利範圍第1項所述之流體供應式滾筒體,其係經由配置以沿細長方向傳遞非均勻數量的流體。 The fluid supply drum body of claim 1, wherein the fluid supply drum body is configured to deliver a non-uniform amount of fluid in the elongate direction. 如申請專利範圍第1項所述之流體供應式滾筒體,其中該細長桿係包含一中空圓柱形狀,並於一部份圓柱表面上具有穿孔。 The fluid supply type drum body of claim 1, wherein the elongated rod comprises a hollow cylindrical shape and has a perforation on a portion of the cylindrical surface. 如申請專利範圍第1項所述之流體供應式滾筒體,其中更包含一個或多個管件,係具穿孔,該管件係沿著該細長桿細長方向嵌入至該細長桿中。。 The fluid supply type drum body of claim 1, further comprising one or more tubular members, the fittings being perforated, the tubular members being embedded in the elongated rod along an elongated direction of the elongated rod. . 如申請專利範圍第1項所述之流體供應式滾筒體,其中該耦合器係設置在該細長桿的末端表面上。 The fluid supply type drum body of claim 1, wherein the coupler is disposed on an end surface of the elongated rod. 如申請專利範圍第1項所述之流體供應式滾筒體,其中該耦合器係設置在該細長桿末端表面附近的外部表面上。。 The fluid supply type drum body of claim 1, wherein the coupler is disposed on an outer surface adjacent the end surface of the elongated rod. . 如申請專利範圍第1項所述之流體供應式滾筒體,其中該耦合器係以可旋轉方式與該細長桿連接,促使一旋轉桿能與一固定式的流體傳輸線耦合。 The fluid supply type drum body of claim 1, wherein the coupler is rotatably coupled to the elongated rod to cause a rotating rod to be coupled to a stationary fluid transmission line. 如申請專利範圍第1項所述之流體供應式滾筒體,其中該多孔層係具有沿著該細長桿細長方向均勻分佈的孔徑大小或孔隙密度。 The fluid supply type drum body of claim 1, wherein the porous layer has a pore size or a pore density uniformly distributed along an elongated direction of the elongated rod. 如申請專利範圍第1項所述之流體供應式滾筒體,其中該多孔層具有沿著該細長桿細長方向非均勻分佈的孔徑大小或孔隙密度。 The fluid supply type drum body of claim 1, wherein the porous layer has a pore size or a pore density that is non-uniformly distributed along an elongated direction of the elongated rod. 如申請專利範圍第1項所述之流體供應式滾筒體,其中該細長桿或該多孔層沿該細長方向係呈凹面。 The fluid supply type drum body of claim 1, wherein the elongated rod or the porous layer is concave along the elongated direction. 一種用以在基板上沉積塗層之沉積系統,包括:複數個流體供應式滾筒體,每一滾筒體係包括一細長桿,該細長桿係包括一耦合器,藉以於該細長桿之一端上接收一流體;該細長桿係配置為將該流體從該細長桿之該端轉移至該細長桿細長外部表面之一部份;一多孔層,係覆蓋該細長桿細長外部表面之一部份,於其中該多孔層係於該細長桿之外部表面接收該流體;一流體輸送系統,藉以將該流體輸送至該滾筒體。 A deposition system for depositing a coating on a substrate, comprising: a plurality of fluid supply roller bodies, each roller system comprising an elongated rod, the elongated rod comprising a coupler for receiving on one end of the elongated rod a fluid; the elongate shaft configured to transfer the fluid from the end of the elongate shaft to a portion of the elongate outer surface of the elongate shaft; a porous layer covering a portion of the elongate outer surface of the elongate shaft The porous layer receives the fluid on an outer surface of the elongated rod; a fluid delivery system whereby the fluid is delivered to the drum body. 一種用以在基板上沉積塗層之沉積系統,包括:複數個可旋轉之流體供應式滾筒體,每一滾筒體係包括一細長桿,該細長桿係包括一耦合器,藉以於該細長桿之一端上接收一流體;該細長桿係配置為將該流體從該細長桿之該端轉移至該細長桿細長外部表面之一部份;一多孔層,係覆蓋該細長桿細長外部表面之一部份,於其中該多孔層係於該細長桿之外部表面接收該流體;一固定式流體輸送線,係耦合至該耦合器,藉以將該流體輸送至該滾筒體;其中,該耦合器係包含可旋轉之元件,藉以將該可旋轉之滾筒體結合至該固定式流體輸送線;一旋轉裝置,用以旋轉該流體供應式滾筒體。 A deposition system for depositing a coating on a substrate, comprising: a plurality of rotatable fluid supply roller bodies, each roller system comprising an elongated rod, the elongated rod comprising a coupler, whereby the elongated rod Receiving a fluid on one end; the elongate shaft is configured to transfer the fluid from the end of the elongate shaft to a portion of the elongate outer surface of the elongate shaft; a porous layer covering one of the elongated outer surfaces of the elongate shaft a portion of the porous layer receiving the fluid on an outer surface of the elongated rod; a stationary fluid delivery line coupled to the coupler for delivering the fluid to the drum body; wherein the coupler is A rotatable element is included to couple the rotatable drum body to the stationary fluid transfer line; a rotating device for rotating the fluid supply drum body. 如申請專利範圍第13項所述之用以在基板上沉積塗層之沉積系統,其中該旋轉裝置係包括一馬達。 A deposition system for depositing a coating on a substrate as described in claim 13 wherein the rotating device comprises a motor. 如申請專利範圍第13項所述之用以在基板上沉積塗層之沉積系統,其中該複數個滾筒體係以相同速率旋轉。 A deposition system for depositing a coating on a substrate as described in claim 13 wherein the plurality of roller systems rotate at the same rate. 如申請專利範圍第13項所述之用以在基板上沉積塗層之沉積系統,其中該複數個滾筒體係以不同速率旋轉。 A deposition system for depositing a coating on a substrate as described in claim 13 wherein the plurality of roller systems rotate at different rates. 如申請專利範圍第13項所述之用以在基板上沉積塗層之沉積系統,其中該複數個滾筒體之每一滾筒體係可個別調整旋轉速率。 A deposition system for depositing a coating on a substrate as described in claim 13 wherein each of the plurality of roller bodies individually adjusts the rate of rotation. 如申請專利範圍第13項所述之用以在基板上沉積塗層之沉積系統,其中該複數個流體供應式滾筒體係設置在基板的頂部及底部。 A deposition system for depositing a coating on a substrate as described in claim 13 wherein the plurality of fluid supply roller systems are disposed at the top and bottom of the substrate. 如申請專利範圍第18項所述之用以在基板上沉積塗層之沉積系統,其中該固定式流體輸送線係輸送相同的流體至頂部及底部之流體供應式滾筒體。 A deposition system for depositing a coating on a substrate as described in claim 18, wherein the stationary fluid delivery line delivers the same fluid to the top and bottom fluid supply drum bodies. 如申請專利範圍第18項所述之用以在基板上沉積塗層之沉積系統,其中該固定式流體輸送線係輸送不同的流體至頂部及底部之流體供應式滾筒體。 A deposition system for depositing a coating on a substrate as described in claim 18, wherein the fixed fluid delivery line transports different fluids to the top and bottom fluid supply drum bodies. 如申請專利範圍第13項所述之用以在基板上沉積塗層之沉積系統,其中該複數個流體供應式滾筒體係設置在基板的底部,並且同時作為傳送滾輪輸送基板。 A deposition system for depositing a coating on a substrate as described in claim 13 wherein the plurality of fluid supply roller systems are disposed at the bottom of the substrate and simultaneously transport the substrate as a transfer roller. 如申請專利範圍第13項所述之用以在基板上沉積塗層之沉積系統,其中該複數個流體供應式滾筒體係設置在基板的頂部。 A deposition system for depositing a coating on a substrate as described in claim 13 wherein the plurality of fluid supply roller systems are disposed on top of the substrate. 如申請專利範圍第13項所述之用以在基板上沉積塗層之沉積系統,其中該固定式流體輸送線係輸送不同的流體至交替間隔的流體供應式滾筒體。 A deposition system for depositing a coating on a substrate as described in claim 13 wherein the fixed fluid delivery line delivers different fluids to the alternately spaced fluid supply drum bodies. 如申請專利範圍第13項所述之用以在基板上沉積塗層之沉積系統,其中該固定式流體輸送線係與一流體系統連接,該流體系統至少包括一儲藏處、一泵、一壓力控制器、一流動控制器以及一溫度控制器之其一。 A deposition system for depositing a coating on a substrate according to claim 13 wherein the fixed fluid delivery line is coupled to a fluid system, the fluid system comprising at least a reservoir, a pump, a pressure One of a controller, a flow controller, and a temperature controller. 如申請專利範圍第13項所述之用以在基板上沉積塗層之沉積 Deposition for depositing a coating on a substrate as described in claim 13 系統,其中更包含一個或複數個非流體供應式滾筒體,其係與該複數個流體供應式滾筒體平行設置。 The system further includes one or a plurality of non-fluid supply drum bodies disposed in parallel with the plurality of fluid supply drum bodies. 如申請專利範圍第13項所述之用以在基板上沉積塗層之沉積系統,其中更包含一個或複數個加熱器,其係設置在該複數個流體供應式滾筒體附近,藉以調節沉積塗層。 The deposition system for depositing a coating on a substrate according to claim 13 , further comprising one or more heaters disposed adjacent to the plurality of fluid supply roller bodies to adjust deposition coating Floor. 如申請專利範圍第13項所述之用以在基板上沉積塗層之沉積系統,其中更包括用以調整及控制流體供應式滾筒體與基板之間之接觸壓力之工具。 A deposition system for depositing a coating on a substrate as described in claim 13 further comprising means for adjusting and controlling the contact pressure between the fluid supply roller body and the substrate. 一種用於在基板上沉積塗層之方法,包括下列步驟:促使一流體流動至一個或複數個流體供應式滾筒體之一端,於其中該流體係轉移至該滾筒體之一部份外部表面;促使該滾筒體接觸該基板之表面;旋轉該滾筒體,藉以在該基板表面上形成一塗層。 A method for depositing a coating on a substrate, comprising the steps of: causing a fluid to flow to one end of one or more fluid supply drum bodies, wherein the flow system is transferred to a portion of an exterior surface of the drum body; The roller body is caused to contact the surface of the substrate; the roller body is rotated to form a coating on the surface of the substrate. 如申請專利範圍第28項所述之用於在基板上沉積塗層之方法,其中該流體供應式滾筒體更能輸送基板前進。 A method for depositing a coating on a substrate as described in claim 28, wherein the fluid supply roller body is more capable of transporting the substrate to advance. 如申請專利範圍第28項所述之用於在基板上沉積塗層之方 法,其中更包括下列步驟:旋轉一個或複數個設置在該基板下方的輸送滾筒體,藉以移動該基板前進。 The method for depositing a coating on a substrate as described in claim 28 of the patent application. The method further includes the step of rotating one or more of the transport roller bodies disposed under the substrate to move the substrate forward. 如申請專利範圍第28項所述之用於在基板上沉積塗層之方法,其中該基板係夾於頂部及底部流體供應式滾筒體之間。 A method for depositing a coating on a substrate as described in claim 28, wherein the substrate is sandwiched between the top and bottom fluid supply drum bodies. 如申請專利範圍第31項所述之用於在基板上沉積塗層之方法,其中更包括下列步驟:促使不同的流體流動至頂部及底部之流體供應式滾筒體;如申請專利範圍第28項所述之用於在基板上沉積塗層之方法,其中該基板係夾於流體供應式滾筒體與非流體供應式滾筒體之間。 The method for depositing a coating on a substrate according to claim 31, further comprising the steps of: causing different fluids to flow to the top and bottom fluid supply drum bodies; The method for depositing a coating on a substrate, wherein the substrate is sandwiched between a fluid supply roller body and a non-fluid supply roller body. 如申請專利範圍第28項所述之用於在基板上沉積塗層之方法,其中更包括下列步驟:促使不同的流體流動至交替間隔的流體供應式滾筒體。 A method for depositing a coating on a substrate as described in claim 28, further comprising the step of causing different fluids to flow to the alternately spaced fluid supply drum bodies. 如申請專利範圍第28項所述之用於在基板上沉積塗層之方法,其中更包括下列步驟:調節該塗層。 A method for depositing a coating on a substrate as described in claim 28, further comprising the step of: adjusting the coating. 如申請專利範圍第28項所述之用於在基板上沉積塗層之方法,其中更包括下列步驟:透過至少一個乾燥滾筒體或紅外線燈加熱器令該塗層乾燥。 The method for depositing a coating on a substrate according to claim 28, further comprising the step of drying the coating through at least one drying drum body or an infrared lamp heater. 如申請專利範圍第28項所述之用於在基板上沉積塗層之方法,其中更包括下列步驟:透過一紅外線燈加熱器加熱該基板。 A method for depositing a coating on a substrate as described in claim 28, further comprising the step of: heating the substrate through an infrared lamp heater. 如申請專利範圍第28項所述之用於在基板上沉積塗層之方法,其中更包括下列步驟:控制流動至流體供應式滾筒體之流體之流動速率與流體壓力。 A method for depositing a coating on a substrate as described in claim 28, further comprising the step of controlling a flow rate of the fluid flowing to the fluid supply drum body and a fluid pressure. 如申請專利範圍第28項所述之用於在基板上沉積塗層之方法,其中更包括下列步驟:控制介於流體供應式滾筒體與基板之間之接觸壓力,藉以最小化過量浪費。 The method for depositing a coating on a substrate according to claim 28, further comprising the step of controlling a contact pressure between the fluid supply roller body and the substrate, thereby minimizing excessive waste. 如申請專利範圍第28項所述之用於在基板上沉積塗層之方法,其中更包括下列步驟:控制流動速率、流體濃度、流體溫度、流體壓力,以及介於流體供應式滾筒體與基板之間之接觸壓力之中至少一項,藉以最小化基板上之液滴。 The method for depositing a coating on a substrate according to claim 28, further comprising the steps of: controlling a flow rate, a fluid concentration, a fluid temperature, a fluid pressure, and a fluid supply roller body and a substrate At least one of the contact pressures between them to minimize droplets on the substrate. 如申請專利範圍第28項所述之用於在基板上沉積塗層之方 法,其中該塗層係具均勻之厚度。 The method for depositing a coating on a substrate as described in claim 28 of the patent application. The method wherein the coating has a uniform thickness. 如申請專利範圍第28項所述之用於在基板上沉積塗層之方法,其中該塗層係具非均勻之厚度,其中該厚度之非均勻性係用於後續製程之補償。 A method for depositing a coating on a substrate as described in claim 28, wherein the coating has a non-uniform thickness, wherein the non-uniformity of the thickness is used for compensation of subsequent processes. 一種用於在基板上沉積摻雜層之方法,包括下列步驟:促使一含有摻雜物之化學物質之一流體流動至一個或複數個流體供應式滾筒體之一端,於其中該流體係轉移至該滾筒體之一部份外部表面;提供該基板至該流體供應式滾筒體;促使該滾筒體接觸該基板之表面;旋轉該滾筒體,藉以在該基板表面上形成一塗層。 A method for depositing a doped layer on a substrate, comprising the steps of: causing a fluid of one of the dopant-containing chemicals to flow to one or more of the fluid supply drum bodies, wherein the flow system is transferred to a portion of the outer surface of the roller body; providing the substrate to the fluid supply roller body; causing the roller body to contact the surface of the substrate; rotating the roller body to form a coating on the surface of the substrate. 如申請專利範圍第43項所述之用於在基板上沉積摻雜層之方法,其中更包括下列步驟:退火該基板,藉以驅使該摻雜物進入該基板。 A method for depositing a doped layer on a substrate as described in claim 43 further comprising the step of annealing the substrate to drive the dopant into the substrate. 如申請專利範圍第43項所述之用於在基板上沉積摻雜層之方法,其中該塗層係具非均勻之厚度,其中該厚度之非均勻性係用於後續退火製程之補償。 A method for depositing a doped layer on a substrate as described in claim 43 wherein the coating has a non-uniform thickness, wherein the non-uniformity of the thickness is used for compensation of a subsequent annealing process. 一種用於在基板上沉積塗層之方法,包括下列步驟:促使一仿流體流動至一個或複數個流體供應式滾筒體之一端,於其中該仿流體係轉移至該滾筒體之一部份外部表面;加熱該基板;促使該滾筒體接觸該基板之表面;旋轉該滾筒體,藉以在該基板表面上形成塗層。 A method for depositing a coating on a substrate, comprising the steps of: causing a flow of imitation fluid to flow to one end of one or more fluid supply drum bodies, wherein the flow stream system is transferred to a portion of the drum body Surface; heating the substrate; causing the roller body to contact the surface of the substrate; rotating the roller body to form a coating on the surface of the substrate. 如申請專利範圍第46項所述之用於在基板上沉積摻雜層之方法,其中該仿流體係維持在等於或小於室溫之溫度。 A method for depositing a doped layer on a substrate as described in claim 46, wherein the flow-through system is maintained at a temperature equal to or less than room temperature. 一種用於塗佈一基板之沉積系統,包括:一加熱裝置,用以加熱該基板;一個或複數個塗佈滾筒體,每一塗佈滾筒體係包含一多孔層,藉以接收並保留一液體,該液體係透過滾動接觸轉移至基板;一溫度控制裝置,係與該液體連結,藉以將該液體之溫度控制在室溫之下。 A deposition system for coating a substrate, comprising: a heating device for heating the substrate; one or a plurality of coating roller bodies, each coating roller system comprising a porous layer for receiving and retaining a liquid The liquid system is transferred to the substrate by rolling contact; a temperature control device is coupled to the liquid to control the temperature of the liquid below room temperature. 如申請專利範圍第48項所述之用於塗佈一基板之沉積系統,其中更包括:一液體儲藏處,藉以將該液體提供至該塗佈滾筒體;其中,該塗佈滾筒體係於該液體儲藏處接觸取得該液體;該 溫度控制裝置係與該液體儲藏處內之該液體連結。 The deposition system for coating a substrate according to claim 48, further comprising: a liquid storage portion for supplying the liquid to the coating drum body; wherein the coating roller system is Contacting the liquid reservoir to obtain the liquid; The temperature control device is coupled to the liquid in the liquid reservoir. 如申請專利範圍第49項所述之用於塗佈一基板之沉積系統,其中更包括一攪拌機制,藉以均勻該液體儲藏處中之液體溫度。 The deposition system for coating a substrate according to claim 49, further comprising a stirring mechanism for uniformly heating the temperature of the liquid in the liquid storage. 如申請專利範圍第49項所述之用於塗佈一基板之沉積系統,其中該加熱裝置係與該液體儲藏處隔離。 A deposition system for coating a substrate as described in claim 49, wherein the heating device is isolated from the liquid reservoir. 如申請專利範圍第49項所述之用於塗佈一基板之沉積系統,其中該液體之溫度係低於10℃。 A deposition system for coating a substrate as described in claim 49, wherein the temperature of the liquid is less than 10 °C. 如申請專利範圍第49項所述之用於塗佈一基板之沉積系統,其中更包括一物理屏障,係設於該塗佈滾筒體周圍處,該物理屏障係包括被該物理屏障隔離之二部份區域之間受限制的流體流通。 The deposition system for coating a substrate according to claim 49, further comprising a physical barrier disposed around the coating drum body, the physical barrier comprising two isolated by the physical barrier Limited fluid circulation between parts. 如申請專利範圍第49項所述之用於塗佈一基板之沉積系統,其中更包括一溫度控制裝置,係與該物理屏障連結,藉以在該二部份區域之間建立溫度梯度。 A deposition system for coating a substrate according to claim 49, further comprising a temperature control device coupled to the physical barrier to establish a temperature gradient between the two portions. 如申請專利範圍第49項所述之用於塗佈一基板之沉積系統, 其中更包括一溫度屏障,係設於該塗佈滾筒體周圍處,該溫度屏障係於被該溫度屏障隔離之二部份區域之間建立溫度梯度。 a deposition system for coating a substrate as described in claim 49 of the patent application, There is further included a temperature barrier disposed around the coating drum body, the temperature barrier establishing a temperature gradient between the two regions separated by the temperature barrier. 一種用於塗佈基板之線上沉積系統,包括:一個或複數個傳送滾筒體,藉以沿著該線上沉積系統運送該基板;一基板加熱器,藉以加熱該基板;一液體儲藏處,係包括一液體;一冷卻裝置,係與該液體儲藏處連結,藉以將該液體冷卻至室溫以下之溫度;一個或複數個塗佈滾筒體,每一塗佈滾筒體係包含一多孔層,該多孔層係接觸從該液體儲藏處而來的液體,並透過滾動接觸方式將該液體轉移至該基板。 An in-line deposition system for coating a substrate, comprising: one or a plurality of transfer roller bodies for transporting the substrate along the line deposition system; a substrate heater for heating the substrate; and a liquid storage portion comprising a liquid; a cooling device coupled to the liquid reservoir to thereby cool the liquid to a temperature below room temperature; one or a plurality of coating drum bodies, each coating drum system comprising a porous layer, the porous layer The liquid is contacted from the liquid reservoir and transferred to the substrate by rolling contact. 如申請專利範圍第56項所述之用於塗佈基板之線上沉積系統,其中更包括一攪拌機制,藉以均衡該液體儲藏處中之液體溫度。 An on-line deposition system for coating a substrate as described in claim 56, further comprising an agitation mechanism for equalizing the temperature of the liquid in the liquid reservoir. 如申請專利範圍第56項所述之用於塗佈基板之線上沉積系統,其中更包括一循環系統,用以過濾循環該液體儲藏處之該液體。 An in-line deposition system for coating a substrate as described in claim 56, further comprising a circulation system for filtering the liquid circulating the liquid reservoir. 如申請專利範圍第56項所述之用於塗佈基板之線上沉積系統,其中該冷卻裝置係設置在該一個或複數個塗佈滾筒體之周圍,藉以限制該液體儲藏處之該液體暴露於高溫。 An in-line deposition system for coating a substrate according to claim 56, wherein the cooling device is disposed around the one or more coating drum bodies to limit exposure of the liquid to the liquid reservoir. high temperature. 如申請專利範圍第56項所述之用於塗佈基板之線上沉積系統,其中該冷卻裝置係包括一珀爾帖裝置(Peltiers devices),該珀爾帖裝置之熱區係朝向該塗佈滾筒體,冷區係朝向該液體儲藏處之該液體。 An on-line deposition system for coating a substrate according to claim 56, wherein the cooling device comprises a Peltiers device, the hot zone of the Peltier device facing the coating roller The body, the cold zone is the liquid facing the liquid reservoir. 如申請專利範圍第56項所述之用於塗佈基板之線上沉積系統,其中該加熱裝置係與該液體儲藏處隔離。 An in-line deposition system for coating a substrate as described in claim 56, wherein the heating device is isolated from the liquid reservoir. 如申請專利範圍第56項所述之用於塗佈基板之線上沉積系統,其中該液體係包括在室溫以上環境具有衰退特性之化學物質。 An on-line deposition system for coating a substrate as described in claim 56, wherein the liquid system comprises a chemical having a decaying property in an environment above room temperature. 如申請專利範圍第56項所述之用於塗佈基板之線上沉積系統,其中更包括一物理屏障,係設於該塗佈滾筒體周圍處,該物理屏障係包括被該物理屏障隔離之二部份區域之間受限制的液體流通。 An on-line deposition system for coating a substrate according to claim 56, further comprising a physical barrier disposed around the coating drum body, the physical barrier comprising two isolated by the physical barrier Limited liquid circulation between parts. 如申請專利範圍第56項所述之用於塗佈基板之線上沉積系統,其中更包括一溫度控制裝置,係與該物理屏障連結,藉以在該二部份區域之間建立溫度梯度。 An in-line deposition system for coating a substrate according to claim 56, further comprising a temperature control device coupled to the physical barrier to establish a temperature gradient between the two portions. 如申請專利範圍第56項所述之用於塗佈基板之線上沉積系統,其中更包括一溫度屏障,係設於該塗佈滾筒體周圍處,該溫度屏障係於被該溫度屏障隔離之二部份區域之間建立溫度梯度。 An on-line deposition system for coating a substrate according to claim 56, further comprising a temperature barrier disposed around the coating drum body, the temperature barrier being separated by the temperature barrier A temperature gradient is established between the partial regions. 一種方法,包括下列步驟:提供複數個旋轉滾筒體,表面係具多孔層;提供一容器,用以裝盛一流體,該複數個旋轉滾筒體係接觸該流體,藉以將該流體轉移至該多孔層;在該滾筒體與該流體之間的接觸區域周圍隔離出一隔離區;加熱該隔離區內的流體至室溫或室溫以上的溫度;冷卻該隔離區外的流體至室溫以下的溫度;限制進入該隔離區的流體流。 A method comprising the steps of: providing a plurality of rotating drum bodies having a porous layer on a surface thereof; providing a container for holding a fluid, the plurality of rotating drum systems contacting the fluid to transfer the fluid to the porous layer Separating an isolation region around the contact area between the drum body and the fluid; heating the fluid in the isolation zone to a temperature above room temperature or above; cooling the fluid outside the isolation zone to a temperature below room temperature ; restrict the flow of fluid into the isolation zone. 如申請專利範圍第66項所述之方法,其中更包括下列步驟:攪拌該隔離區外的流體至均勻的溫度;以及循環該液體儲藏處之該流體。 The method of claim 66, further comprising the steps of: agitating the fluid outside the isolation zone to a uniform temperature; and circulating the fluid at the liquid reservoir.
TW101121265A 2012-07-09 2012-07-09 Methods and apparatuses for roll-on coating TW201402226A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW101121265A TW201402226A (en) 2012-07-09 2012-07-09 Methods and apparatuses for roll-on coating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW101121265A TW201402226A (en) 2012-07-09 2012-07-09 Methods and apparatuses for roll-on coating

Publications (1)

Publication Number Publication Date
TW201402226A true TW201402226A (en) 2014-01-16

Family

ID=50345345

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101121265A TW201402226A (en) 2012-07-09 2012-07-09 Methods and apparatuses for roll-on coating

Country Status (1)

Country Link
TW (1) TW201402226A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106460174A (en) * 2014-06-17 2017-02-22 纽升股份有限公司 Chemical bath deposition system and method
TWI574821B (en) * 2014-10-31 2017-03-21 Mechanism and Method of Film Heating Process

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106460174A (en) * 2014-06-17 2017-02-22 纽升股份有限公司 Chemical bath deposition system and method
TWI574821B (en) * 2014-10-31 2017-03-21 Mechanism and Method of Film Heating Process

Similar Documents

Publication Publication Date Title
US8720370B2 (en) Methods and apparatuses for roll-on coating
US8739728B2 (en) Methods and apparatuses for roll-on coating
US9673348B2 (en) Buffer layer deposition for thin-film solar cells
WO2012137063A2 (en) Methods and apparatuses for roll-on coating
US7700161B2 (en) Film growth system and method
US20120171632A1 (en) Device and treatment chamber for thermally treating substrates
US20130284367A1 (en) Substrate processing apparatus and method of supplying processing solution
US20060037858A1 (en) Electroless plating apparatus and electroless plating method
US20140356546A1 (en) Methods and apparatuses for roll-on coating
CN104798184A (en) Apparatus and method for improving efficiency of thin-film photovoltaic devices
KR101093677B1 (en) Method and apparatus for the surface modification of flat substrates
US20130220221A1 (en) Method and apparatus for precursor delivery
TW201402226A (en) Methods and apparatuses for roll-on coating
KR101120948B1 (en) A substrate processing apparatus
CN205177786U (en) A transposition formula sprayer and base plate handling implement that is arranged in handling cavity at base plate to be used
JP2009259938A (en) Method of manufacturing chalcopyrite thin film solar cell, and apparatus therefor
CN103008168B (en) Device and method for depositing film
KR20100088139A (en) Method and device for coating a carrier for thin-film solar cells
JP3465872B2 (en) Method and apparatus for treating cadmium telluride film for solar cell
KR20110131394A (en) System for fabricating large area zno nanowire
KR20110137997A (en) Roll-to-roll chemical bath deposition apparatus
KR20100123308A (en) Diffusion apparatus for forming the selective emitter
CN115957938A (en) Coating system and coating method for wet film layer of solar cell
WO2012101155A1 (en) Methods and apparatuses for single sided wet processing
KR20120140077A (en) Roll to roll cds deposition method and system