TW201400562A - Process for producing article having fluorine-containing silane-based coating - Google Patents

Process for producing article having fluorine-containing silane-based coating Download PDF

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TW201400562A
TW201400562A TW102112053A TW102112053A TW201400562A TW 201400562 A TW201400562 A TW 201400562A TW 102112053 A TW102112053 A TW 102112053A TW 102112053 A TW102112053 A TW 102112053A TW 201400562 A TW201400562 A TW 201400562A
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fluorine
coating layer
group
compound
base material
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TW102112053A
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Chinese (zh)
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Eiji Sakamoto
Kakeru Hanabusa
Teruyuki Fukuda
Takayuki Araki
Kaori Ozawa
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Daikin Ind Ltd
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/043Improving the adhesiveness of the coatings per se, e.g. forming primers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/044Forming conductive coatings; Forming coatings having anti-static properties
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/046Forming abrasion-resistant coatings; Forming surface-hardening coatings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2401/00Characterised by the use of cellulose, modified cellulose or cellulose derivatives
    • C08J2401/08Cellulose derivatives
    • C08J2401/10Esters of organic acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2427/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
    • C08J2427/02Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
    • C08J2427/12Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms

Abstract

The present invention provides a process for producing an article comprising a fluorine-containing silane-based coating on a coating surface of an organic base material, wherein the process comprises the steps of: (a) forming a precursor coating on a surface of the organic base material by using a composition comprising an unsaturated silane compound, a photocatalyst and a photocurable organic material; (b) forming a cured coating derived from the precursor coating on the surface of the organic base material by photo-irradiation to the precursor coating; and (c) forming a fluorine-containing silane-based coating on the cured coating directly or via an inorganic material layer by using a surface treatment agent comprising a fluorine-containing silane compound. The process can form the fluorine-containing silane-based coating having high friction durability is provided.

Description

具有含氟矽烷系塗覆層之物品的製造方法 Method for producing article having fluorine-containing decane-based coating layer 相關申請案之交叉參考文獻 Cross-references to related applications

本申請案主張2012年4月5日申請之美國臨時申請案案號61/620,690之優先權與權益,其完整揭示內容係以引用之方式併入本文中。 The present application claims priority to and the benefit of U.S. Provisional Application Serial No. 61/620,690, filed on Apr. 5, 2012, the entire disclosure of which is incorporated herein by reference.

本發明係有關一種具有含氟矽烷系塗覆層之物品之製造方法,更明確言之,一種在有機基底材料之塗覆層表面上具有含氟矽烷系塗覆層之物品之製造方法。本發明亦有關一種可由該製造方法製造之物品。 The present invention relates to a method for producing an article having a fluorine-containing decane-based coating layer, and more particularly to a method for producing an article having a fluorine-containing decane-based coating layer on the surface of a coating layer of an organic base material. The invention also relates to an article that can be manufactured by the method of manufacture.

由於透明塑膠(如:丙烯酸酯樹脂與聚碳酸酯)之重量輕而且容易加工,因此已逐漸擴大其應用作為替代性無機玻璃之材料。透明塑膠可依據其用途進行各種不同表面處理。例如:由於透明塑膠相較於無機玻璃具有較低之表面硬度,而且較容易刮傷,因此可能需要接受硬塗覆處理,以防止此等問題。 Since transparent plastics (such as acrylate resins and polycarbonates) are lightweight and easy to process, their use as alternative inorganic glass materials has gradually expanded. Transparent plastics can be treated with a variety of different finishes depending on their application. For example, since transparent plastics have lower surface hardness than inorganic glass and are more susceptible to scratching, it may be necessary to undergo a hard coating treatment to prevent such problems.

通常,在光學組件之用途中,在由無機玻璃組成之基底材料上形成防污塗覆層,作為表面處理層,以防止如:指印之污漬附著。已知一種作為防污塗覆劑之表面處理劑,其包含具 有全氟聚醚基及與Si鍵結之羥基或可水解基團之含氟矽烷化合物作為活性成分(參見專利案文獻1與2)。 Generally, in the use of an optical component, an antifouling coating layer is formed on a base material composed of inorganic glass as a surface treatment layer to prevent adhesion of, for example, fingerprints. A surface treatment agent as an antifouling coating agent is known, which comprises As the active ingredient, a perfluoropolyether group and a fluorine-containing decane compound having a hydroxyl group or a hydrolyzable group bonded to Si are used as an active ingredient (see Patent Documents 1 and 2).

當上述透明塑膠應用在光學組件時,期望進行表面處理,以提供防污性質。由透明塑膠等等組成之有機基底材料之常用表面處理法中,利用包含紫外光固化式丙烯酸系硬塗覆劑與具有碳-碳雙鍵之含全氟聚醚之化合物作為防污添加劑之表面處理劑形成具有防污性質之硬塗覆層作為表面處理層(參見專利案文獻3),並以此表面處理劑施用在有機基底材料上,並利用紫外光固化。 When the above transparent plastic is applied to an optical component, it is desirable to perform a surface treatment to provide antifouling properties. In a common surface treatment method of an organic base material composed of a transparent plastic or the like, a surface containing an ultraviolet curable acrylic hard coater and a perfluoropolyether-containing compound having a carbon-carbon double bond as an antifouling additive is used. The treating agent forms a hard coat layer having antifouling properties as a surface treatment layer (see Patent Document 3), and is applied to the organic base material by this surface treatment agent, and cured by ultraviolet light.

摘錄文獻列表 Excerpt list

專利案文獻 Patent document

專利案文獻1:WO 97/07155 Patent Document 1: WO 97/07155

專利案文獻2:JP 2008-534696 A Patent Document 2: JP 2008-534696 A

專利案文獻3:WO 03/002628 Patent Document 3: WO 03/002628

專利案文獻4:JP 2004-250474 A Patent Document 4: JP 2004-250474 A

專利案文獻5:JP 2007-332262 A Patent Document 5: JP 2007-332262 A

專利案文獻6:JP 2003-137944 A Patent Document 6: JP 2003-137944 A

表面處理層(或塗覆層)需要具有高耐久性,以提供長期具有所需功能之基底材料。特定言之,當用在需要透光性或透明度之光學組件(如:眼鏡)與觸控面板時,會要求表面處理層具有高防污性質與高耐摩擦性(換言之,維持初始性質,如:防污性質,等等,對抗重覆摩擦)。 The surface treatment layer (or coating layer) is required to have high durability to provide a base material having a desired function for a long period of time. In particular, when used in optical components (such as glasses) and touch panels that require light transmission or transparency, the surface treatment layer is required to have high antifouling properties and high abrasion resistance (in other words, to maintain initial properties, such as : anti-fouling properties, etc., against repeated friction).

然而,有機基底材料之常用表面處理法不足以符合高防污性質與高耐摩擦性之要求。特定言之,其問題在於藉由常用表面處理法(其中在硬塗覆劑中添加防污添加劑)所產生之防污性質(初始防污性質)低於使用包含含氟矽烷化合物之表面處理劑所形成含氟矽烷系塗覆層之防污性質。 However, conventional surface treatment methods for organic substrate materials are not sufficient to meet the requirements of high antifouling properties and high abrasion resistance. In particular, the problem is that the antifouling property (initial antifouling property) produced by a common surface treatment method in which an antifouling additive is added to a hard coating agent is lower than using a surface treatment agent containing a fluorine-containing decane compound. The antifouling property of the formed fluorine-containing decane-based coating layer.

含氟矽烷系塗覆層對無機基底材料(如:無機玻璃,等等)具有高附著強度,亦即具有高耐摩擦性。然而,含氟矽烷系塗覆層對有機基底材料之附著強度低,因此無法具有高耐摩擦性。 The fluorine-containing decane-based coating layer has high adhesion strength to an inorganic base material (e.g., inorganic glass, etc.), that is, has high abrasion resistance. However, the fluorine-containing decane-based coating layer has low adhesion strength to the organic base material, and thus cannot have high abrasion resistance.

因此,建議在有機基底材料上形成具有親水性基團之硬塗覆層,然後在上面形成一層含氟矽烷系塗覆層(參見專利案文獻4)。然而,此等製造方法所提供之耐摩擦性不總是充足。 Therefore, it is proposed to form a hard coat layer having a hydrophilic group on the organic base material, and then to form a fluorine-containing decane-based coat layer thereon (see Patent Document 4). However, the friction resistance provided by such manufacturing methods is not always sufficient.

或者,計畫在有機基底材料上形成二氧化矽塗覆層,然後於上面形成含氟矽烷系塗覆層。藉由此製造方法,在含氟矽烷系塗覆層與二氧化矽塗覆層之間達成高附著強度,但二氧化矽塗覆層與有機基底材料之間之附著強度仍不足,以致無法達成高耐摩擦性。 Alternatively, it is planned to form a ceria coating layer on the organic base material, and then form a fluorine-containing decane-based coating layer thereon. By this manufacturing method, high adhesion strength is achieved between the fluorine-containing decane-based coating layer and the cerium oxide coating layer, but the adhesion strength between the cerium oxide coating layer and the organic base material is still insufficient, so that it cannot be achieved. High abrasion resistance.

另一方面,已知對基底材料具有優異附著度之有機-無機複合物(參見專利案文獻4)。然而,該有機-無機複合物包含功能性材料,因此該複合物本身即可提供所需功能,並無意在有機-無機複合物上形成表面處理層,如:含氟矽烷系塗覆層,等等。 On the other hand, an organic-inorganic composite having excellent adhesion to a base material is known (see Patent Document 4). However, the organic-inorganic composite contains a functional material, so that the composite itself can provide a desired function, and it is not intended to form a surface treatment layer on the organic-inorganic composite, such as a fluorine-containing decane-based coating layer, etc. Wait.

本發明目的在於提供一種在有機基底材料之塗覆層表面上包含含氟矽烷系塗覆層之物品之製造方法,其中該製造方法可形成具有高耐摩擦性之含氟矽烷系塗覆層。 An object of the present invention is to provide a method for producing an article comprising a fluorine-containing decane-based coating layer on a surface of a coating layer of an organic base material, wherein the production method can form a fluorine-containing decane-based coating layer having high abrasion resistance.

根據本發明一項態樣,提供一種在有機基底材料之 塗覆層表面上包含含氟矽烷系塗覆層(最外層)之物品之製造方法,其中該製造方法包括下列步驟:(a)利用包含不飽和矽烷化合物、光觸媒與光固化有機材料之組成物在有機基底材料表面上形成前驅物塗覆層;(b)對前驅物塗覆層進行光照射,藉此在有機基底材料表面上形成衍生自前驅物塗覆層的固化之塗覆層;以及(c)利用包含含氟矽烷化合物之表面處理劑,在固化之塗覆層上直接形成或隔著無機材料層形成含氟矽烷系塗覆層。 According to an aspect of the present invention, there is provided an organic substrate material A method for producing an article comprising a fluorine-containing decane-based coating layer (outermost layer) on a surface of a coating layer, wherein the method comprises the steps of: (a) using a composition comprising an unsaturated decane compound, a photocatalyst, and a photocurable organic material; Forming a precursor coating layer on the surface of the organic base material; (b) subjecting the precursor coating layer to light irradiation, thereby forming a cured coating layer derived from the precursor coating layer on the surface of the organic base material; (c) forming a fluorine-containing decane-based coating layer directly on the cured coating layer or via an inorganic material layer by using a surface treatment agent containing a fluorine-containing decane compound.

本發明製造方法中,進行步驟(a)至(c)之順序沒有特別限制。特定言之,步驟(b)與(c)可在任何合適時間點進行,只要最後可形成固化之塗覆層,並在固化之塗覆層上形成含氟矽烷系塗覆層(直接或透過無機材料層)即可。 In the production method of the present invention, the order in which the steps (a) to (c) are carried out is not particularly limited. In particular, steps (b) and (c) can be carried out at any suitable point in time as long as a cured coating layer is formed and a fluorine-containing decane-based coating layer is formed on the cured coating layer (directly or through The inorganic material layer can be used.

根據上述製造本發明物品之方法,可在有機基底材料之塗覆層表面上形成具有高耐摩擦性之含氟矽烷系塗覆層。雖然本發明不受限於任何理論,但可考量下列因素。根據上述製造本發明物品之方法,在步驟(b)期間,在前驅物塗覆層上照光時會激發光觸媒,並作用在有機基底材料之表面上,使表面與不飽和矽烷化合物反應,藉以在其中間形成鍵結。同時,與不飽和矽烷化合物進行加成反應,使光固化有機材料固化。所得之固化之塗覆層因此等鍵結形成及加成反應,而對有機基底材料具有高附著強度。此外,在步驟(c)期間,該含氟矽烷化合物會彼此相互反應,而在此等化合物之間形成鍵結,並會與固化之塗覆層(或底層)表面反應以在其中間形成鍵結。所得之含氟矽烷系塗覆層本身即具有高塗覆層強度,且對固化之塗覆層具有高附著強度。結果可利 用固化之塗覆層在有機基底材料之表面上形成具有高耐摩擦性之含氟矽烷系塗覆層。 According to the above method for producing the article of the present invention, a fluorine-containing decane-based coating layer having high abrasion resistance can be formed on the surface of the coating layer of the organic base material. Although the invention is not limited by any theory, the following factors can be considered. According to the above method for producing the article of the present invention, during the step (b), the photocatalyst is excited upon irradiation on the precursor coating layer, and acts on the surface of the organic substrate material to react the surface with the unsaturated decane compound, thereby A bond is formed therebetween. At the same time, an addition reaction with an unsaturated decane compound is carried out to cure the photocurable organic material. The resulting cured coating layer thus has a bond formation and addition reaction with high adhesion strength to the organic substrate material. Further, during the step (c), the fluorine-containing decane compounds react with each other to form a bond between the compounds, and react with the surface of the cured coating layer (or the underlayer) to form a bond therebetween. Knot. The obtained fluorine-containing decane-based coating layer itself has high coating layer strength and high adhesion strength to the cured coating layer. Resultable A fluorine-containing decane-based coating layer having high abrasion resistance is formed on the surface of the organic base material with the cured coating layer.

該不飽和矽烷化合物可為例如:如下通式之化合物:CH2=CH-(R12)y-SiTxR11 3-x其中:T為羥基或可水解之基團;R11為氫原子或具有1至22個碳原子之烷基;x為1至3之整數;R12為二價有機基團;及y為0或1。 The unsaturated decane compound may be, for example, a compound of the formula: CH 2 =CH-(R 12 ) y -SiT x R 11 3-x wherein: T is a hydroxyl group or a hydrolyzable group; R 11 is a hydrogen atom Or an alkyl group having 1 to 22 carbon atoms; x is an integer from 1 to 3; R 12 is a divalent organic group; and y is 0 or 1.

本發明所採用之光觸媒較佳係由金屬化合物組成,但不一定受此特別限制。 The photocatalyst used in the present invention is preferably composed of a metal compound, but is not necessarily limited thereto.

該含氟矽烷系塗覆層由於包含氟原子,因此除了上述耐摩擦性外,還具有潑水性、潑油性、防污性質,等等。特定言之,該含氟矽烷化合物較佳具有全氟聚醚基團及與Si鍵結之羥基或可水解基團。使用本化合物得到之含氟矽烷系塗覆層具有高耐摩擦性、潑水性、潑油性、防污性質(例如:防止附著污漬,如:指印)、表面滑溜性質(或潤滑性,例如:擦拭污漬(如:指印)之性質),等等。 Since the fluorine-containing decane-based coating layer contains a fluorine atom, it has water repellency, oil repellency, antifouling property, and the like in addition to the above-mentioned rubbing resistance. In particular, the fluorine-containing decane compound preferably has a perfluoropolyether group and a hydroxyl group or a hydrolyzable group bonded to Si. The fluorine-containing decane-based coating layer obtained by using the present compound has high abrasion resistance, water repellency, oil repellency, antifouling property (for example, prevention of adhesion stains such as fingerprints), surface slip properties (or lubricity, for example, wiping Stains (such as the nature of fingerprints), and so on.

具有與Si鍵結之羥基或可水解基團及全氟聚醚基團之含氟矽烷化合物實例包括一或多種如下述任一通式(1a)與(1b)之化合物: 其中:Rf1為具有1至16個碳原子之烷基,其可經或可不經一個或多個氟原子取代;a、b、c與s分別獨立為整數0至200,其中該a、b、c與s之總數為至少1,且該式中下標為a、b、c或s之括號中各重複單位之出現順序沒有限制;d與f分別獨立為0或1;e與g分別獨立為整數0至2;m與l分別獨立為整數1至10;X為氫原子或鹵原子;Y為氫原子或低碳數烷基;Z為氟原子或低碳數氟烷基;T為羥基或可水解之基團;R1為氫原子或具有1至22個碳原子之烷基;以及n為1至3之整數。 Examples of the fluorine-containing decane compound having a hydroxyl group or a hydrolyzable group bonded to Si and a perfluoropolyether group include one or more compounds of any one of the following formulas (1a) and (1b): Wherein: Rf 1 is an alkyl group having 1 to 16 carbon atoms which may or may not be substituted by one or more fluorine atoms; a, b, c and s are each independently an integer from 0 to 200, wherein the a, b The total number of c and s is at least 1, and the order of occurrence of each repeating unit in the brackets of the formula a, b, c or s is not limited; d and f are respectively 0 or 1; e and g respectively Independently an integer from 0 to 2; m and l are independently an integer from 1 to 10; X is a hydrogen atom or a halogen atom; Y is a hydrogen atom or a lower alkyl group; Z is a fluorine atom or a lower fluoroalkyl group; a hydroxyl group or a hydrolyzable group; R 1 is a hydrogen atom or an alkyl group having 1 to 22 carbon atoms; and n is an integer of 1 to 3.

其他具有與Si鍵結之羥基或可水解基團及全氟聚醚基團之含氟矽烷化合物實例包括一或多種如下述任一通式(2a)與(2b)之化合物: 其中:Rf2為具有1至16個碳原子之烷基,其可經或可不經一個或多個氟原子取代;a、b、c與s分別獨立為整數0至200,其中該a、b、c與s之總數為至少1,且該式中下標為a、b、c或s之括號中各重複單位之出現順序沒有限制;d與f分別獨立為0或1;h與j為1或2;i與k分別獨立為整數2至20;Z為氟原子或低碳數氟烷基;T為羥基或可水解之基團;R2為氫原子或具有1至22個碳原子之烷基;及n為1至3之整數。 Examples of other fluorine-containing decane compounds having a hydroxyl group or a hydrolyzable group bonded to Si and a perfluoropolyether group include one or more compounds of any one of the following formulas (2a) and (2b): Wherein: Rf 2 is an alkyl group having 1 to 16 carbon atoms which may or may not be substituted by one or more fluorine atoms; a, b, c and s are each independently an integer from 0 to 200, wherein the a, b The total number of c and s is at least 1, and the order of occurrence of each repeating unit in the brackets of the formula a, b, c or s is not limited; d and f are independently 0 or 1; h and j are 1 or 2; i and k are each independently an integer 2 to 20; Z is a fluorine atom or a lower fluoroalkyl group; T is a hydroxyl group or a hydrolyzable group; R 2 is a hydrogen atom or has 1 to 22 carbon atoms An alkyl group; and n is an integer from 1 to 3.

根據本發明另一態樣,亦提供一種物品,其包含有機基底材料,在有機基底材料之表面上形成之塗覆層,其包含不飽和矽烷化合物與光固化有機材料之固化材料、及光觸媒,與在塗覆層上形成之含氟矽烷系塗覆層。 According to another aspect of the present invention, there is also provided an article comprising an organic base material, a coating layer formed on a surface of the organic base material, comprising a cured material of an unsaturated decane compound and a photocurable organic material, and a photocatalyst, And a fluorine-containing decane-based coating layer formed on the coating layer.

該物品可由本發明製造方法製造。該物品中,即使使用有機 基底材料,仍可在有機基底材料之塗覆層表面(或最外層)上形成具有高防污性質之含氟矽烷系塗覆層。 This article can be made by the manufacturing method of the present invention. In this item, even if organic As the base material, a fluorine-containing decane-based coating layer having high antifouling properties can be formed on the surface (or outermost layer) of the coating layer of the organic base material.

該有機基底材料可呈透明。根據本發明之物品實質上可維持有機基底材料之透明度。 The organic substrate material can be transparent. The article according to the invention substantially maintains the transparency of the organic substrate material.

該含氟矽烷系塗覆層可藉由包含氟原子而提供防污性質(初始防污性質),因此適用為防污塗覆層。 The fluorine-containing decane-based coating layer can provide antifouling properties (initial antifouling properties) by containing a fluorine atom, and thus is suitable as an antifouling coating layer.

本發明製造之物品可為例如:光學組件,但不受此特別限制。本發明適用於塗覆光學組件,因為其高度要求具有改良之耐摩擦性。 The article made by the present invention may be, for example, an optical component, but is not particularly limited. The present invention is suitable for coating optical components because of its high degree of requirement for improved abrasion resistance.

根據本發明,具有高耐摩擦性之含氟矽烷系塗覆層之形成法為由包含不飽和矽烷化合物、光觸媒與光固化有機材料之組成物在有機基底材料與含氟矽烷系塗覆層之間形成一層固化之塗覆層。 According to the present invention, a fluorine-containing decane-based coating layer having high abrasion resistance is formed by a composition comprising an unsaturated decane compound, a photocatalyst, and a photocurable organic material in an organic base material and a fluorine-containing decane-based coating layer. A layer of cured coating is formed between them.

第1圖為說明實例1至3與對照實例1至4所製造防污層之耐摩擦性之圖。 Fig. 1 is a graph showing the rub resistance of the antifouling layers produced in Examples 1 to 3 and Comparative Examples 1 to 4.

下文透過本發明具體實施例詳細說明製造本發明物品之方法及由該製造方法製造之物品,但本發明並不受此限制。 Hereinafter, a method of manufacturing the article of the present invention and an article manufactured by the manufacturing method will be described in detail through specific embodiments of the present invention, but the present invention is not limited thereto.

首先,提供一種有機基底材料。適用於本發明之有機基底材料可為至少表面係由有機材料組成之基底材料。本發明所採用"有機材料"可為包含有機物質之材料,典型係由一種或多種有機物質組成之材料,但可為包含一或多種有機物質與無機物 質之複合物(混合物)或混合材料。 First, an organic base material is provided. The organic base material suitable for use in the present invention may be a base material in which at least the surface is composed of an organic material. The "organic material" used in the present invention may be a material containing an organic substance, typically a material composed of one or more organic substances, but may contain one or more organic substances and inorganic substances. A complex (mixture) or a mixture of materials.

該有機材料可為任何合適之有機材料。可使用例如:一般塑膠材料,如:丙烯酸酯樹脂((甲基)丙烯酸酯聚合物)、聚碳酸酯、聚對酞酸伸乙酯、聚苯乙烯、聚乙烯、聚丙烯、聚乙烯氯、AS樹脂、與ABS樹脂。此外,可使用聚矽氧樹脂、氟樹脂、環烯烴樹脂、環氧樹脂、TAC樹脂、氟樹脂、MS樹脂、聚乙烯醇、酞酸二烯丙酯、聚亞胺、苯酚樹脂、蜜胺樹脂、尿素樹脂、不飽和聚酯樹脂、聚胺基甲酸酯、酞酸二烯丙酯樹脂、醇酸樹脂,等等。此外,亦可使用有機-無機雜合物樹脂。 The organic material can be any suitable organic material. For example, general plastic materials such as acrylate resin ((meth) acrylate polymer), polycarbonate, polyethylene terephthalate, polystyrene, polyethylene, polypropylene, polyvinyl chloride, AS resin, and ABS resin. Further, a polyoxyxylene resin, a fluororesin, a cycloolefin resin, an epoxy resin, a TAC resin, a fluororesin, an MS resin, a polyvinyl alcohol, a diallyl citrate, a polyimine, a phenol resin, or a melamine resin can be used. , urea resin, unsaturated polyester resin, polyurethane, diallyl citrate resin, alkyd resin, and the like. Further, an organic-inorganic hybrid resin can also be used.

當有機基底材料為透明時適用本發明。透明之有機基底材料係由例如:透明之丙烯酸酯樹脂、聚碳酸酯、聚對酞酸乙烯酯、聚矽氧樹脂(例如:參見專利案文獻6),等等,或可替代無機玻璃之市售商品材料,如:"SILPLUS"(註冊商標;製造商Nippon Steel Chemical Co.,Ltd.)與"ORGA"(註冊商標;製造商Nippon Synthetic Chemical Industry Co.,ltd.)。本發明中,"透明"係一般所認定之透明,例如:代表霧值為5%或以下。 The invention is applicable when the organic substrate material is transparent. The transparent organic base material is, for example, a transparent acrylate resin, a polycarbonate, a polyethylene terephthalate, a polyoxyl resin (for example, see Patent Document 6), or the like, or an alternative to inorganic glass. Commercial materials such as "SILPLUS" (registered trademark; manufacturer Nippon Steel Chemical Co., Ltd.) and "ORGA" (registered trademark; manufacturer Nippon Synthetic Chemical Industry Co., Ltd.) are sold. In the present invention, the "transparent" system is generally considered to be transparent, for example, representing a haze value of 5% or less.

例如:當待製成之物品係光學組件時,可在基底材料表面(最外層)形成由有機材料組成之任何一層(或塗覆層),如:硬塗覆層或抗反射層。抗反射層可使用單一抗反射層或多重抗反射層。當待製成之物品為觸控面板用之光學組件時,其可能具有透明電極,例如:在有機基底材料(玻璃)之部分表面上具有包含氧化銦錫(ITO)、氧化銦鋅或類似物之薄層。此外,該有機基底材料根據其明確說明,可能具有抗靜電層、絕緣層、黏著層、保護層、邊框裝飾層(I-CON)、噴霧層、硬塗覆層、極化膜、相差膜、 液晶顯示器模組,等等。 For example, when the article to be manufactured is an optical component, any layer (or coating layer) composed of an organic material such as a hard coat layer or an antireflection layer may be formed on the surface (outermost layer) of the base material. The antireflection layer may use a single antireflection layer or a multiple antireflection layer. When the article to be manufactured is an optical component for a touch panel, it may have a transparent electrode, for example, having indium tin oxide (ITO), indium zinc oxide or the like on a part of the surface of the organic base material (glass) Thin layer. In addition, the organic base material may have an antistatic layer, an insulating layer, an adhesive layer, a protective layer, a bezel decorative layer (I-CON), a spray layer, a hard coating layer, a polarizing film, a phase difference film, LCD module, and more.

有機基底材料之形狀沒有明確限制,但可呈平板、膜、壓縮體,等等形式。應該形成固化之塗覆層與含氟矽烷系塗覆層(最外層)之基底材料表面區域可為至少部分基底材料表面,且可依據所製造物品之用途、明確規格,等等適當決定。 The shape of the organic base material is not specifically limited, but may be in the form of a flat plate, a film, a compression body, or the like. The surface area of the base material which should form the cured coating layer and the fluorine-containing decane-based coating layer (outermost layer) may be at least a part of the surface of the base material, and may be appropriately determined depending on the use of the article to be manufactured, the specification, and the like.

有機基底材料可接受任何前處理。前處理實例包括電漿處理(例如:電暈放電)或離子束照射。電漿處理法適合用於將羥基引進或加至基底材料表面上,此外可清潔基底材料表面(移除外來材料,等等)。或者,其他前處理實例包括利用LB法(Langmuir-Blodgett方法),在基底材料表面上形成單層具有碳-碳不飽和鍵基團之表面吸附劑,或先進行化學吸附法,然後在氧與氮氛圍下裂解不飽和鍵。 The organic substrate material can accept any pretreatment. Examples of pretreatment include plasma treatment (e.g., corona discharge) or ion beam irradiation. The plasma treatment method is suitable for introducing or adding a hydroxyl group to the surface of the base material, and further cleaning the surface of the base material (removing foreign materials, etc.). Alternatively, other pretreatment examples include forming a single surface adsorbent having a carbon-carbon unsaturated bond group on the surface of the base material by the LB method (Langmuir-Blodgett method), or performing a chemical adsorption method first, followed by oxygen and The unsaturated bond is cleaved under a nitrogen atmosphere.

另一方面,提供一種包含不飽和矽烷化合物、光觸媒與光固化有機材料之組成物(下文稱為"形成底層之組成物")。本文所採用"底層"代表接受表面處理劑塗覆之層(或當固化之塗覆層與含氟矽烷系塗覆層之間有無機材料層時,其代表在上面形成無機材料層之層)。此具體實施例中,該底層為由形成底層之組成物所衍生之固化之塗覆層。 On the other hand, a composition comprising an unsaturated decane compound, a photocatalyst and a photocurable organic material (hereinafter referred to as "the composition forming the underlayer") is provided. As used herein, "underlayer" means a layer that is coated with a surface treatment agent (or a layer of an inorganic material layer formed thereon when there is an inorganic material layer between the cured coating layer and the fluorine-containing decane-based coating layer) . In this embodiment, the bottom layer is a cured coating layer derived from the composition forming the underlayer.

該不飽和矽烷化合物可明確具有碳-碳雙鍵及與Si鍵結之羥基或可水解基團。不飽和矽烷化合物實例包括如下通式化合物(可為一種化合物或兩種或更多種化合物之混合物)。 The unsaturated decane compound may have a carbon-carbon double bond and a hydroxyl group or a hydrolyzable group bonded to Si. Examples of the unsaturated decane compound include a compound of the following formula (which may be one compound or a mixture of two or more compounds).

CH2=CH-(R12)y-SiTxR11 3-x該式中:T與R11為與Si鍵結之基團,且R12若存在時,為乙烯基與矽 烷基之間之間隔基。 CH 2 =CH-(R 12 ) y -SiT x R 11 3-x wherein: T and R 11 are groups bonded to Si, and if R 12 is present, it is between vinyl and decyl The spacer.

T代表羥基或可水解之基團。該可水解基團實例包括-OA、-OCOA、-O-N=C(A)2、-N(A)2、-NHA、鹵素(其中,A為經取代或未經取代之具有1至3個碳原子之直鏈或分支鏈烷基),等等,較佳為-OA(烷氧基)。A之實例包括未經取代之烷基,如:甲基、乙基、丙基、異丙基;與經取代之烷基,如:氯甲基。其中以烷基(特定言之未經取代之烷基)較佳。羥基可能由可水解之基團水解後產生,但沒有明確限制。 T represents a hydroxyl group or a hydrolyzable group. Examples of the hydrolyzable group include -OA, -OCOA, -ON=C(A) 2 , -N(A) 2 , -NHA, halogen (wherein A is substituted or unsubstituted and has 1 to 3 A linear or branched alkyl group of a carbon atom, and the like, preferably -OA (alkoxy). Examples of A include unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl; and substituted alkyl groups such as chloromethyl. Among them, an alkyl group (specifically, an unsubstituted alkyl group) is preferred. The hydroxyl group may be produced by hydrolysis of a hydrolyzable group, but is not specifically limited.

R11代表氫原子或具有1至22個碳原子之烷基,較佳為具有1至22個碳原子之烷基,更佳為具有1至3個碳原子之烷基。 R 11 represents a hydrogen atom or an alkyl group having 1 to 22 carbon atoms, preferably an alkyl group having 1 to 22 carbon atoms, more preferably an alkyl group having 1 to 3 carbon atoms.

x為1至3之整數。 x is an integer from 1 to 3.

R12代表二價有機基團。該二價有機基團可為具有1至10個碳原子之經取代或未經取代之直鏈、分支鏈或環狀烴基,其可具有酯鍵、醚鍵、醯胺鍵、硫化物鍵、或類似物。 R 12 represents a divalent organic group. The divalent organic group may be a substituted or unsubstituted linear, branched or cyclic hydrocarbon group having 1 to 10 carbon atoms, which may have an ester bond, an ether bond, a guanamine bond, a sulfide bond, Or similar.

y為0或1。當y為0時,R12不存在,且乙烯基與矽烷基係直接相互鍵結。 y is 0 or 1. When y is 0, R 12 is absent, and the vinyl group and the decyl group are directly bonded to each other.

本文所採用術語"光觸媒"係指該材料暴露到具能量高於結晶之導電帶與價電帶之間之能階間隙之能量(亦即波長較短)之光(激發光)時,會激發(光激發)價電帶中之電子,產生導電電子與電洞。光觸媒可為例如:包含如:鈦、鋅、錫、鐵、鉍、鎢,等等金屬之金屬化合物。更特定言之,金屬化合物實例包括氧化鈦、氧化鋅、氧化錫、氧化鐵、三氧化二鉍、三氧化鎢、與鈦酸鍶。已知一般光觸媒為氧化鈦,更特定言之呈銳鈦礦型或金紅石型之氧化鈦。氧化鈦可呈平均初級粒徑為0.1μm或以下之超 細粒子型式。 As used herein, the term "photocatalyst" means that the material is excited when exposed to light (excitation light) having an energy higher than the energy gap between the crystalline conductive band and the valence band (ie, shorter wavelength). (Photoexcited) electrons in the valence band that produce conductive electrons and holes. The photocatalyst may be, for example, a metal compound containing a metal such as titanium, zinc, tin, iron, ruthenium, tungsten, or the like. More specifically, examples of the metal compound include titanium oxide, zinc oxide, tin oxide, iron oxide, antimony trioxide, tungsten trioxide, and barium titanate. It is known that a general photocatalyst is titanium oxide, more specifically an anatase or rutile type titanium oxide. Titanium oxide can have an average primary particle size of 0.1 μm or less. Fine particle type.

該光觸媒較佳為對波長為400nm或以下之光敏感之感光性化合物(特定言之金屬化合物)與/或其衍生物。感光性化合物可為選自下列之至少一種:金屬螯合化合物、金屬有機酸鹽化合物、具有兩個或多個羥基或可水解基團之金屬化合物、其水解物、與其縮合產物,較佳為其水解物與/或其縮合產物,更佳為金屬螯合化合物之水解物與/或縮合產物。感光性化合物之衍生物可為例如:由金屬螯合化合物之縮合產物或類似物進一步縮合得到之衍生物。感光性化合物及/或其衍生物可與不飽和矽烷化合物進行化學鍵結、呈非鍵結態分散或呈其混合態。 The photocatalyst is preferably a photosensitive compound (specifically, a metal compound) and/or a derivative thereof which is sensitive to light having a wavelength of 400 nm or less. The photosensitive compound may be at least one selected from the group consisting of a metal chelate compound, a metal organic acid salt compound, a metal compound having two or more hydroxyl groups or hydrolyzable groups, a hydrolyzate thereof, and a condensation product therewith, preferably The hydrolyzate and/or its condensation product is more preferably a hydrolyzate and/or a condensation product of the metal chelate compound. The derivative of the photosensitive compound may be, for example, a derivative obtained by further condensing a condensation product or the like of a metal chelate compound. The photosensitive compound and/or its derivative may be chemically bonded to the unsaturated decane compound, dispersed in a non-bonded state, or in a mixed state thereof.

光固化有機材料可為任何材料,只要其可接受光照射後硬化。光固化有機材料可為光固化樹脂,特定言之以紫外光固化性樹脂較佳。可使用例如:紫外光固化性丙烯酸酯與甲基丙烯酸酯(胺基甲酸酯系、環氧系、聚酯系、聚丁二烯系、聚矽氧系、胺基樹脂系、聚醚系、多元醇系、氟系、矽烷系)或類似物,且可使用自商品取得之紫外光固化性硬塗覆劑或類似物。光固化有機材料可為單官能性,但以多官能性較佳。 The photocurable organic material may be any material as long as it can be hardened after being irradiated with light. The photocurable organic material may be a photocurable resin, and particularly preferably an ultraviolet curable resin. For example, ultraviolet curable acrylate and methacrylate (urethane type, epoxy type, polyester type, polybutadiene type, polyfluorene type, amine type resin type, polyether type) can be used. A polyhydric alcohol type, a fluorine type, a decane type) or the like, and a commercially available ultraviolet curable hard coater or the like can be used. The photocurable organic material may be monofunctional, but is preferably polyfunctional.

不飽和矽烷化合物可含在用於形成底層之組成物中,例如:相對於100重量份數之光固化有機材料,佔約0.1至90重量份數,較佳約1至50重量份數,及相對於100重量份數之光固化有機材料,光觸媒可佔例如:約0.01至20重量份數,較佳約0.1至2.0重量份數。 The unsaturated decane compound may be contained in the composition for forming the underlayer, for example, from about 0.1 to 90 parts by weight, preferably from about 1 to 50 parts by weight, per 100 parts by weight of the photocurable organic material, and The photocatalyst may be, for example, about 0.01 to 20 parts by weight, preferably about 0.1 to 2.0 parts by weight, per 100 parts by weight of the photocurable organic material.

形成底層之組成物中除了此等組份外,尚可包含任何合適添加劑。添加劑實例包括聚合引發劑、光敏劑、聚合抑制 劑、溶劑、硬化劑、交聯劑、紫外光遮蔽劑、紫外光吸收劑、表面調理劑(整平劑)、消泡劑,等等。 The composition forming the bottom layer may contain any suitable additives in addition to these components. Examples of the additive include a polymerization initiator, a photosensitizer, and polymerization inhibition Agents, solvents, hardeners, crosslinkers, ultraviolet light shielding agents, ultraviolet light absorbers, surface conditioning agents (leveling agents), defoamers, and the like.

利用形成底層之組成物在有機基底材料之表面上形成前驅物塗覆層。形成前驅物塗覆層之方式係將形成底層之組成物塗覆在有機基底材料之表面上,因此塗覆在表面上。該塗覆法沒有特別限制。塗覆法實例包括浸塗法、旋塗法、流塗法、噴塗法、滾塗法、凹板式塗法、與類似方法。 A precursor coating layer is formed on the surface of the organic base material by the composition forming the underlayer. The method of forming the precursor coating layer is to apply the composition forming the underlayer on the surface of the organic base material, thus being coated on the surface. The coating method is not particularly limited. Examples of the coating method include dip coating, spin coating, flow coating, spray coating, roll coating, gravure coating, and the like.

形成底層之組成物可在經過溶劑稀釋後才施用在基底材料之表面上。可依據形成底層之組成物之安定性及溶劑之揮發性質適當選擇溶劑,但較佳係使用下列溶劑:酮類(例如:甲基乙基酮、丙酮、甲基異丁基酮,等等)、醇類(例如:單價醇,如:乙醇與丙醇、多價醇,如:乙二醇、二乙二醇、丙二醇(特定言之二-四價醇))、酯(例如:乙酸乙酯)、醚(例如:二乙二醇單甲基醚、二乙二醇單甲基醚乙酸酯)、含氟醇、含氟醚,等等。此等溶劑可單獨使用或使用其中兩種或多種之混合物。 The composition forming the underlayer may be applied to the surface of the substrate material after being diluted with a solvent. The solvent may be appropriately selected depending on the stability of the composition forming the underlayer and the volatile matter of the solvent, but it is preferred to use the following solvents: ketones (for example, methyl ethyl ketone, acetone, methyl isobutyl ketone, etc.) Alcohols (for example: monovalent alcohols such as: ethanol and propanol, polyvalent alcohols such as ethylene glycol, diethylene glycol, propylene glycol (specifically, di-tetravalent alcohols)), esters (eg, acetic acid B) Ester), ether (for example: diethylene glycol monomethyl ether, diethylene glycol monomethyl ether acetate), fluorine-containing alcohol, fluorine-containing ether, and the like. These solvents may be used singly or as a mixture of two or more of them.

然後,若使用溶劑稀釋組成物時,在適當進行乾燥步驟以排除溶劑後,使用光照射前驅物塗覆層,由前驅物塗覆層在有機基底材料之表面上衍生形成固化之塗覆層。固化之塗覆層為包含不飽和矽烷化合物與光固化有機材料之固化材料及光觸媒之塗覆層。所得之固化之塗覆層因此對有機基底材料具有高附著強度,且在固化之塗覆層之表面上具有反應性部分。 Then, if the composition is diluted with a solvent, after a drying step is appropriately performed to remove the solvent, the precursor coating layer is irradiated with light, and a precursor coating layer is derivatized on the surface of the organic base material to form a cured coating layer. The cured coating layer is a coating layer comprising a cured material of an unsaturated decane compound and a photocurable organic material and a photocatalyst. The resulting cured coating layer thus has a high adhesion strength to the organic substrate material and a reactive portion on the surface of the cured coating layer.

雖然本發明不受任何理論限制,但認為其在受到光照射時發生下列現象。光觸媒會受到光照射激發,有機基底材料之表面受到光觸媒之作用而水解,在有機基底材料之表面上產生 羥基與/或自由基。此外,可存在於不飽和矽烷化合物中之可水解基團可受到光觸媒之作用水解產生羥基與/或自由基。不飽和矽烷化合物之羥基與/或自由基與有機基底材料表面上之羥基與/或自由基之間發生脫水-縮合及/或自由基反應,在其之間形成鍵結。同時,該光固化有機材料受到光照射而硬化,此固化期間,不飽和矽烷化合物之碳-碳雙鍵在不飽和矽烷化合物之間發生加成反應及/或與光固化有機材料同時固化。所得固化之塗覆層因形成鍵結與加成反應而對有機基底材料具有高附著強度。此外,固化之塗覆層之表面成為具有反應性部分。反應性部分可為不飽和矽烷化合物原本具有之羥基或可水解基團、由不飽和矽烷化合物受到光觸媒作用後產生之羥基與/或自由基、或由固化之塗覆層表面受到光觸媒作用後水解產生之羥基與/或自由基。 Although the present invention is not limited by any theory, it is considered that the following phenomenon occurs when it is irradiated with light. The photocatalyst is excited by light irradiation, and the surface of the organic base material is hydrolyzed by the action of the photocatalyst to be generated on the surface of the organic base material. Hydroxyl and / or free radicals. Further, the hydrolyzable group which may be present in the unsaturated decane compound may be hydrolyzed by a photocatalyst to produce a hydroxyl group and/or a radical. The dehydration-condensation and/or radical reaction between the hydroxyl group and/or the radical of the unsaturated decane compound and the hydroxyl group and/or the radical on the surface of the organic base material forms a bond therebetween. At the same time, the photocurable organic material is hardened by light irradiation, during which the carbon-carbon double bond of the unsaturated decane compound undergoes an addition reaction between the unsaturated decane compounds and/or simultaneously with the photocurable organic material. The resulting cured coating layer has high adhesion strength to the organic base material due to the formation of bonding and addition reactions. Further, the surface of the cured coating layer becomes a reactive portion. The reactive moiety may be a hydroxyl group or a hydrolyzable group originally possessed by the unsaturated decane compound, a hydroxyl group and/or a radical generated by the photocatalytic action of the unsaturated decane compound, or hydrolyzed by the photocatalyst on the surface of the cured coating layer. Hydroxyl groups and/or free radicals produced.

可對著前驅物塗覆層之暴露表面側(接觸有機基底材料之表面之相反面)進行光照射。照射光之波長可為任何波長,只要可讓光固化有機材料固化並激發光觸媒即可。通常,其可為紫外光(波長:約10至400nm),但不受此限制。光照射量可依據所採用光固化有機材料之型態及類似者及與所採用之光觸媒適當選擇,例如:累積光量可為200至2,000mJ/cm2,但不受此限制。 Light irradiation may be performed on the exposed surface side of the precursor coating layer (opposite to the surface contacting the surface of the organic substrate material). The wavelength of the illuminating light can be any wavelength as long as the photocurable organic material can be cured and the photocatalyst is excited. Generally, it may be ultraviolet light (wavelength: about 10 to 400 nm), but is not limited thereto. The amount of light irradiation may be appropriately selected depending on the type of the photocurable organic material to be used and the like and the photocatalyst to be used, for example, the cumulative amount of light may be 200 to 2,000 mJ/cm 2 , but is not limited thereto.

固化之塗覆層之厚度沒有明確限制。用於光學組件時,基於光學性能與附著強度,固化之塗覆層之厚度較佳在1至30nm之範圍內。 The thickness of the cured coating layer is not specifically limited. When used for an optical component, the thickness of the cured coating layer is preferably in the range of 1 to 30 nm based on optical properties and adhesion strength.

然後,固化之塗覆層係作為底層使用,並利用包含含氟矽烷化合物之表面處理劑在上面形成含氟矽烷系塗覆層。含氟矽烷化合物明確具有與Si鍵結之羥基或可水解基團。因而所得 含氟矽烷系塗覆層本身具有高塗覆強度,且對固化之塗覆層(底層)具有高附著強度。 Then, the cured coating layer is used as a primer layer, and a fluorine-containing decane-based coating layer is formed thereon by using a surface treatment agent containing a fluorine-containing decane compound. The fluorine-containing decane compound clearly has a hydroxyl group or a hydrolyzable group bonded to Si. Thus income The fluorine-containing decane-based coating layer itself has high coating strength and high adhesion strength to the cured coating layer (underlayer).

雖然本發明不受任何理論限制,仍應考量下列因素。含氟矽烷化合物中與Si鍵結之羥基或可水解之基團可交互反應,在此等化合物之間形成鍵結。此外,含氟矽烷化合物中與Si鍵結之羥基或可水解基團會與上述固化之塗覆層表面上存在之反應性基團反應,在含氟矽烷化合物與底層之間形成鍵結。 While the invention is not limited by theory, the following factors should be considered. The Si-bonded hydroxyl group or hydrolyzable group in the fluorine-containing decane compound can be interactively reacted to form a bond between the compounds. Further, a hydroxyl group or a hydrolyzable group bonded to Si in the fluorine-containing decane compound reacts with a reactive group present on the surface of the cured coating layer to form a bond between the fluorine-containing decane compound and the underlayer.

該含氟矽烷化合物可具有全氟聚醚基團及與Si鍵結之羥基或可水解基團。該全氟聚醚基團造成含氟矽烷系塗覆層之潑水性、潑油性、防污性質。 The fluorine-containing decane compound may have a perfluoropolyether group and a hydroxyl group or a hydrolyzable group bonded to Si. The perfluoropolyether group causes water repellency, oil repellency, and antifouling properties of the fluorine-containing decane-based coating layer.

具有全氟聚醚基團及與Si鍵結之羥基或可水解基團之含氟矽烷化合物實例包括如下任一通式(1a)與(1b)之化合物(可為一種化合物或兩種或更多種化合物之混合物)。 Examples of the fluorine-containing decane compound having a perfluoropolyether group and a Si-bonded hydroxyl group or a hydrolyzable group include any of the following compounds of the formulae (1a) and (1b) (may be one compound or two or more a mixture of compounds).

此等式中:Rf1為具有1至16個碳原子之烷基,其可經或可不經一個或多個氟原子取代,較佳為可經或可不經一個或多個氟原子取代之具有1至3個碳原子之烷基。上述可經或可不經一個或多個氟原子取代之烷基較佳為全氟烷基。 In the formula: Rf 1 is an alkyl group having 1 to 16 carbon atoms which may or may not be substituted by one or more fluorine atoms, preferably with or without one or more fluorine atoms. An alkyl group of 1 to 3 carbon atoms. The above alkyl group which may or may not be substituted by one or more fluorine atoms is preferably a perfluoroalkyl group.

下標a、b、c與s代表構成聚合物主幹之四個全氟聚醚重覆 單位之重覆數,且分別代表整數0至200,其中a、b、c與s之總數為至少1,較佳為整數1至100。該式中下標為a、b、c或s之括號中各重複單位之出現順序沒有限制。此等重覆單位中,-(OC4F8)-基團可為下列任一者:-(OCF2CF2CF2CF2)-、-(OCF(CF3)CF2CF2)-、-(OCF2CF(CF3)CF2)-、-(OCF2CF2CF(CF3))-、-(OC(CF3)2CF2)-、-(OCF2C(CF3)2)-、-(OCF(CF3)CF(CF3))-、-(OCF(C2F5)CF2)-與-(OCF2CF(C2F5))-,較佳為-(OCF2CF2CF2CF2)。-(OC3F6)-基團可為下列任一者:-(OCF2CF2CF2)-、-(OCF(CF3)CF2)-與-(OCF2CF(CF3))-,較佳為-(OCF2CF2CF2)-。-(OC2F4)-基團可為下列任一者:-(OCF2CF2)-與-(OCF(CF3))-,較佳為-(OCF2CF2)-。 The subscripts a, b, c and s represent the number of repetitions of the four perfluoropolyether repeating units constituting the polymer backbone, and represent integers 0 to 200, respectively, wherein the total number of a, b, c and s is at least 1 Preferably, it is an integer from 1 to 100. There is no limitation on the order in which the repeating units in the parentheses in the formula are a, b, c or s. In these repeating units, the -(OC 4 F 8 )- group may be any of the following: -(OCF 2 CF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 CF 2 )- , -(OCF 2 CF(CF 3 )CF 2 )-, -(OCF 2 CF 2 CF(CF 3 ))-, -(OC(CF 3 ) 2 CF 2 )-, -(OCF 2 C(CF 3 2 )-, -(OCF(CF 3 )CF(CF 3 ))-, -(OCF(C 2 F 5 )CF 2 )- and -(OCF 2 CF(C 2 F 5 ))-, preferably Is -(OCF 2 CF 2 CF 2 CF 2 ). The -(OC 3 F 6 )- group can be any of the following: -(OCF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 )- and -(OCF 2 CF(CF 3 )) -, preferably -(OCF 2 CF 2 CF 2 )-. The -(OC 2 F 4 )- group may be any of the following: -(OCF 2 CF 2 )- and -(OCF(CF 3 ))-, preferably -(OCF 2 CF 2 )-.

下標d與f分別獨立為0或1。 The subscripts d and f are independently 0 or 1.

下標e與g分別獨立為整數0至2。 The subscripts e and g are independent of integers 0 to 2, respectively.

下標m與l分別獨立為整數1至10。 The subscripts m and l are independent of integers 1 to 10, respectively.

X為氫原子或鹵原子。鹵原子較佳為碘原子、氯原子或氟原子。 X is a hydrogen atom or a halogen atom. The halogen atom is preferably an iodine atom, a chlorine atom or a fluorine atom.

Y為氫原子或低碳數烷基。低碳數烷基較佳為具有1至20個碳原子之烷基。 Y is a hydrogen atom or a lower alkyl group. The lower alkyl group is preferably an alkyl group having 1 to 20 carbon atoms.

Z為氟原子或低碳數氟烷基。低碳數氟烷基為例如:具有1至3個碳原子之氟烷基,較佳為具有1至3個碳原子之全氟烷基,更佳為三氟甲基或五氟乙基,亦較佳為三氟甲基。代表性地,Z為氟原子,及d與f為1。 Z is a fluorine atom or a low carbon number fluoroalkyl group. The lower carbon number fluoroalkyl group is, for example, a fluoroalkyl group having 1 to 3 carbon atoms, preferably a perfluoroalkyl group having 1 to 3 carbon atoms, more preferably a trifluoromethyl group or a pentafluoroethyl group. Also preferred is trifluoromethyl. Typically, Z is a fluorine atom, and d and f are 1.

T與R1為與Si鍵結之基團。 T and R 1 are groups bonded to Si.

T為羥基或可水解之基團。可水解基團實例包括-OA、-OCOA、-O-N=C(A)2、-N(A)2、-NHA、鹵素(其中A為具有1至3個碳原子之經取代或未經取代之烷基),等等。羥基可為由可水解 之基團經過水解產生之基團,但沒有明確限制。 T is a hydroxyl group or a hydrolyzable group. Examples of hydrolyzable groups include -OA, -OCOA, -ON=C(A) 2 , -N(A) 2 , -NHA, halogen (wherein A is substituted or unsubstituted having 1 to 3 carbon atoms Alkyl), and so on. The hydroxyl group may be a group produced by hydrolysis of a hydrolyzable group, but is not specifically limited.

R1為氫原子或具有1至22個碳原子之烷基,較佳為具有1至22個碳原子之烷基,更佳為具有1至3個碳原子之烷基。 R 1 is a hydrogen atom or an alkyl group having 1 to 22 carbon atoms, preferably an alkyl group having 1 to 22 carbon atoms, more preferably an alkyl group having 1 to 3 carbon atoms.

下標n為1至3之整數。 The subscript n is an integer from 1 to 3.

具有全氟聚醚基團及與Si鍵結之羥基或可水解基團之其他含氟矽烷化合物實例包括如下任一通式(2a)與(2b)之化合物(可為一種化合物或兩種或更多種化合物之混合物)。 Examples of other fluorine-containing decane compounds having a perfluoropolyether group and a Si-bonded hydroxyl group or a hydrolyzable group include any of the following compounds of the formulae (2a) and (2b) which may be one compound or two or more. a mixture of various compounds).

此等式中:Rf2為具有1至16個碳原子之烷基,其可經或可不經一個或多個氟原子取代,較佳為可經或可不經一個或多個氟原子取代之具有1至3個碳原子之烷基。上述可經或可不經一個或多個氟原子取代之烷基較佳為全氟烷基。 In the formula: Rf 2 is an alkyl group having 1 to 16 carbon atoms which may or may not be substituted by one or more fluorine atoms, preferably with or without one or more fluorine atoms. An alkyl group of 1 to 3 carbon atoms. The above alkyl group which may or may not be substituted by one or more fluorine atoms is preferably a perfluoroalkyl group.

下標a、b、c與s代表構成聚合物主幹之四個全氟聚醚重覆單位之重覆數,其分別為整數0至200,其中a、b、c與s之總數為至少1,較佳為整數1至100。該式中下標為a、b、c或s之括號中各重複單位之出現順序沒有限制。此等重覆單位中,-(OC4F8)-基團可為下列任一者:-(OCF2CF2CF2CF2)-、-(OCF(CF3)CF2CF2)-、-(OCF2CF(CF3)CF2)-、-(OCF2CF2CF(CF3))-、-(OC(CF3)2CF2)-、-(OCF2C(CF3)2)-、-(OCF(CF3)CF(CF3))-、-(OCF(C2F5)CF2)-與 -(OCF2CF(C2F5))-,較佳為-(OCF2CF2CF2CF2)。-(OC3F6)-基團可為下列任一者:-(OCF2CF2CF2)-、-(OCF(CF3)CF2)-與-(OCF2CF(CF3))-,較佳為-(OCF2CF2CF2)-。-(OC2F4)-基團可為下列任一者:-(OCF2CF2)-與-(OCF(CF3))-,較佳為-(OCF2CF2)-。 The subscripts a, b, c and s represent the number of repetitions of the four perfluoropolyether repeating units constituting the polymer backbone, which are integers from 0 to 200, respectively, wherein the total number of a, b, c and s is at least 1 Preferably, it is an integer from 1 to 100. There is no limitation on the order in which the repeating units in the parentheses in the formula are a, b, c or s. In these repeating units, the -(OC 4 F 8 )- group may be any of the following: -(OCF 2 CF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 CF 2 )- , -(OCF 2 CF(CF 3 )CF 2 )-, -(OCF 2 CF 2 CF(CF 3 ))-, -(OC(CF 3 ) 2 CF 2 )-, -(OCF 2 C(CF 3 2 )-, -(OCF(CF 3 )CF(CF 3 ))-, -(OCF(C 2 F 5 )CF 2 )- and -(OCF 2 CF(C 2 F 5 ))-, preferably Is -(OCF 2 CF 2 CF 2 CF 2 ). The -(OC 3 F 6 )- group can be any of the following: -(OCF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 )- and -(OCF 2 CF(CF 3 )) -, preferably -(OCF 2 CF 2 CF 2 )-. The -(OC 2 F 4 )- group may be any of the following: -(OCF 2 CF 2 )- and -(OCF(CF 3 ))-, preferably -(OCF 2 CF 2 )-.

下標d與f分別獨立為0或1。 The subscripts d and f are independently 0 or 1.

下標h與j分別獨立為1或2。 The subscripts h and j are independently 1 or 2.

下標i與k分別獨立為整數2至20。 The subscripts i and k are independent of integers 2 to 20, respectively.

Z為氟原子或低碳數氟烷基。低碳數氟烷基為例如:具有1至3個碳原子之氟烷基,較佳為具有1至3個碳原子之全氟烷基,更佳為三氟甲基或五氟乙基,亦較佳為三氟甲基代表性地Z為氟原子,及d與f為1。 Z is a fluorine atom or a low carbon number fluoroalkyl group. The lower carbon number fluoroalkyl group is, for example, a fluoroalkyl group having 1 to 3 carbon atoms, preferably a perfluoroalkyl group having 1 to 3 carbon atoms, more preferably a trifluoromethyl group or a pentafluoroethyl group. It is also preferred that the trifluoromethyl group represents Z as a fluorine atom, and d and f are 1.

T與R2為與Si鍵結之基團。 T and R 2 are groups bonded to Si.

T為羥基或可水解之基團。可水解基團實例包括-OA、-OCOA、-O-N=C(A)2、-N(A)2、-NHA、鹵素(其中,A為具有1至3個碳原子之經取代或未經取代之烷基),等等。羥基可為由可水解之基團經過水解產生之基團,但沒有明確限制。 T is a hydroxyl group or a hydrolyzable group. Examples of hydrolyzable groups include -OA, -OCOA, -ON=C(A) 2 , -N(A) 2 , -NHA, halogen (wherein A is substituted or unsubstituted having 1 to 3 carbon atoms Substituted alkyl), and so on. The hydroxyl group may be a group produced by hydrolysis of a hydrolyzable group, but is not specifically limited.

R2為氫原子或具有1至22個碳原子之烷基,較佳為具有1至22個碳原子之烷基,更佳為具有1至3個碳原子之烷基。 R 2 is a hydrogen atom or an alkyl group having 1 to 22 carbon atoms, preferably an alkyl group having 1 to 22 carbon atoms, more preferably an alkyl group having 1 to 3 carbon atoms.

下標n為1至3之整數。 The subscript n is an integer from 1 to 3.

此等含氟矽烷化合物實例可具有例如:1,000至12,000之平均分子量。在此範圍內,化合物基於耐摩擦性較佳具有2,000至10,000之平均分子量。本文所採用"平均分子量"係指數量平均分子量。 Examples of such fluorine-containing decane compounds may have an average molecular weight of, for example, 1,000 to 12,000. Within this range, the compound preferably has an average molecular weight of from 2,000 to 10,000 based on the abrasion resistance. As used herein, "average molecular weight" refers to the number average molecular weight.

包含所例舉含氟矽烷化合物之表面處理劑(或表面 處理化合物)可提供潑水性、潑油性、防污性質、表面滑溜性質(或潤滑性)、或類似性質。 Surface treatment agent (or surface) containing the fluorine-containing decane compound The treatment compound) can provide water repellency, oil repellency, antifouling properties, surface slip properties (or lubricity), or the like.

有用於本發明之表面處理劑之組成物可依據含氟矽烷系塗覆層所需要之功能適當選擇。 The composition having the surface treating agent used in the present invention can be appropriately selected depending on the function required for the fluorine-containing decane-based coating layer.

例如:表面處理劑可包含氟聚醚化合物,亦咸了解,其可作為含氟油(為了與含氟矽烷化合物區分,下文稱為"含氟油"),除了例舉之含氟矽烷化合物之外,較佳為全氟聚醚化合物。該含氟油可提高含氟矽烷系塗覆層之表面滑溜性質。 For example, the surface treatment agent may contain a fluoropolyether compound, which is also known as a fluorine-containing oil (for distinction from a fluorine-containing decane compound, hereinafter referred to as "fluorine-containing oil"), except for the fluorine-containing decane compound exemplified. Further, a perfluoropolyether compound is preferred. The fluorine-containing oil can improve the surface slip properties of the fluorine-containing decane-based coating layer.

該含氟油可含在表面處理劑中,例如:佔100重量份數所例舉含氟矽烷化合物之0至80重量份數,較佳為0至40重量份數。 The fluorine-containing oil may be contained in the surface treatment agent, for example, from 0 to 80 parts by weight, preferably from 0 to 40 parts by weight, per 100 parts by weight of the fluorine-containing decane compound.

含氟油實例包括如下通式(3)化合物(全氟聚醚化合物)。 Examples of the fluorine-containing oil include a compound of the following formula (3) (perfluoropolyether compound).

R21-(OC4F8)s'-(OC3F6)a'-(OC2F4)b'-(OCF2)c'-R22...(3)該式中:R21為可經或可不經一個或多個氟原子取代之具有1至16個碳原子之烷基,較佳為可經或可不經一個或多個氟原子取代之具有1至3個碳原子之烷基。上述可經或可不經一個或多個氟原子取代之烷基較佳為全氟烷基。 R 21 -(OC 4 F 8 ) s' -(OC 3 F 6 ) a' -(OC 2 F 4 ) b' -(OCF 2 ) c' -R 22 . . . (3) In the formula: R 21 is an alkyl group having 1 to 16 carbon atoms which may or may not be substituted by one or more fluorine atoms, preferably with or without one or more fluorine atoms. An alkyl group having 1 to 3 carbon atoms. The above alkyl group which may or may not be substituted by one or more fluorine atoms is preferably a perfluoroalkyl group.

R22為氫原子、氟原子或可經或可不經一個或多個氟原子取代之具有1至16個碳原子之烷基,較佳為氟原子或可經或可不經一個或多個氟原子取代之具有1至3個碳原子之烷基。上述可經或可不經一個或多個氟原子取代之烷基較佳為全氟烷基。 R 22 is a hydrogen atom, a fluorine atom or an alkyl group having 1 to 16 carbon atoms which may or may not be substituted by one or more fluorine atoms, preferably a fluorine atom or may or may not have one or more fluorine atoms Substituting an alkyl group having 1 to 3 carbon atoms. The above alkyl group which may or may not be substituted by one or more fluorine atoms is preferably a perfluoroalkyl group.

下標a'、b'、c'與s'代表構成聚合物主幹之四個全氟聚醚重覆 單位之重覆數,其分別為整數0至300,其中a'、b'、c'與s'之總和為至少1,較佳為整數1至100。該式中下標為a'、b'、c'或s'之括號中重覆單位之出現順序沒有限制。此等重覆單位中,-(OC4F8)-基團可為下列任一者:-(OCF2CF2CF2CF2)-、-(OCF(CF3)CF2CF2)-、-(OCF2CF(CF3)CF2)-、-(OCF2CF2CF(CF3))-、-(OC(CF3)2CF2)-、-(OCF2C(CF3)2)-、-(OCF(CF3)CF(CF3))-、-(OCF(C2F5)CF2)-與-(OCF2CF(C2F5))-,較佳為-(OCF2CF2CF2CF2)。-(OC3F6)-基團可為下列任一者:-(OCF2CF2CF2)-、-(OCF(CF3)CF2)-與-(OCF2CF(CF3))-,較佳為-(OCF2CF2CF2)-。-(OC2F4)-基團可為下列任一者:-(OCF2CF2)-與-(OCF(CF3))-,較佳為-(OCF2CF2)-。 The subscripts a', b', c' and s' represent the number of repetitions of the four perfluoropolyether repeating units constituting the polymer backbone, which are integers from 0 to 300, respectively, where a', b', c' The sum with s' is at least 1, preferably an integer from 1 to 100. There is no restriction on the order in which the subscripts in the parentheses in the formula are a', b', c' or s'. In these repeating units, the -(OC 4 F 8 )- group may be any of the following: -(OCF 2 CF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 CF 2 )- , -(OCF 2 CF(CF 3 )CF 2 )-, -(OCF 2 CF 2 CF(CF 3 ))-, -(OC(CF 3 ) 2 CF 2 )-, -(OCF 2 C(CF 3 2 )-, -(OCF(CF 3 )CF(CF 3 ))-, -(OCF(C 2 F 5 )CF 2 )- and -(OCF 2 CF(C 2 F 5 ))-, preferably Is -(OCF 2 CF 2 CF 2 CF 2 ). The -(OC 3 F 6 )- group can be any of the following: -(OCF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 )- and -(OCF 2 CF(CF 3 )) -, preferably -(OCF 2 CF 2 CF 2 )-. The -(OC 2 F 4 )- group may be any of the following: -(OCF 2 CF 2 )- and -(OCF(CF 3 ))-, preferably -(OCF 2 CF 2 )-.

如上通式(3)之全氟聚醚化合物實例包括如下任一通式(3a)與(3b)之化合物(可為一種化合物或為兩種或更多種化合物之混合物)。 Examples of the perfluoropolyether compound of the above formula (3) include any of the following compounds of the formulae (3a) and (3b) which may be one compound or a mixture of two or more compounds.

R21-(OCF2CF2CF2)a" -R22...(3a) R 21 -(OCF 2 CF 2 CF 2 ) a " -R 22 (3a)

R21-(OCF2CF2CF2CF2)s" -(OCF2CF2CF2)a" -(OCF2CF2)b" -(OCF2)c" -R22...(3b)此等式中:R21與R22如上述定義;式(3a)中,a"為整數1至100;且式(3b)中,s"與a"分別獨立為1至30之整數,及b"與c"分別獨立為1至300之整數。該式中下標為a"、b"、c"或s"之括號中重覆單位之出現順序沒有限制。 R 21 -(OCF 2 CF 2 CF 2 CF 2 ) s " -(OCF 2 CF 2 CF 2 ) a " -(OCF 2 CF 2 ) b " - ( OCF 2 ) c " -R 22 . . . (3b) In the equation: R 21 and R 22 are as defined above; in the formula (3a), a" is an integer from 1 to 100; and in the formula (3b), s" and a" are independently from 1 to 30, respectively. The integers, and b" and c" are each independently an integer from 1 to 300. The order in which the subscripts in the brackets of the a", b", c", or s" are in the formula is not limited.

通式(3a)化合物與通式(3b)化合物可單獨使用或組合使用。當其組合使用時,較佳係由通式(3a)化合物與通式(3b)化 合物依1:1至1:30之重量比組合。採用此等比例,可得到在表面滑溜性質與耐摩擦性之間具有良好平衡性之表面處理劑。 The compound of the formula (3a) and the compound of the formula (3b) may be used singly or in combination. When used in combination, it is preferred to use a compound of the formula (3a) and a formula (3b). The compounds are combined in a weight ratio of 1:1 to 1:30. With such ratios, a surface treatment agent having a good balance between surface slip properties and abrasion resistance can be obtained.

從其他觀點而言,該含氟油可為如下通式化合物:Rf1-F(其中,Rf1如上述定義)。化合物Rf1-F較佳係對上述任一通式(1a)與(1b)化合物及對上述任一通式(2a)與(2b)化合物具有高親和性之化合物。 From other viewpoints, the fluorine-containing oil may be a compound of the formula: Rf 1 -F (wherein Rf 1 is as defined above). The compound Rf 1 -F is preferably a compound having a high affinity for any of the above compounds of the formulae (1a) and (1b) and for the compound of any of the above formulas (2a) and (2b).

該含氟油可具有1,000至30,000之平均分子量。在此平均分子量下可得到高表面滑溜性質。代表性地,通式(3a)化合物之平均分子量較佳為2,000至6,000。通式(3b)化合物之平均分子量較佳為8,000至30,000。在此平均分子量範圍內,可得到高表面滑溜性質。 The fluorine-containing oil may have an average molecular weight of 1,000 to 30,000. High surface slip properties are obtained at this average molecular weight. Typically, the compound of the formula (3a) preferably has an average molecular weight of from 2,000 to 6,000. The average molecular weight of the compound of the formula (3b) is preferably from 8,000 to 30,000. Within this average molecular weight range, high surface slip properties are obtained.

此外,除了所例舉含氟矽烷化合物外,該表面處理劑尚可包含聚矽氧化合物,亦咸了解,其係作為聚矽氧油(下文簡稱為"聚矽氧油")。聚矽氧油可以提高含氟矽烷系塗覆層之表面滑溜性質。 Further, in addition to the fluorine-containing decane compound exemplified, the surface treatment agent may further contain a polyoxonium compound, which is also known as a polysiloxane oil (hereinafter simply referred to as "polyoxygenated oil"). The polyoxygenated oil can improve the surface slip properties of the fluorine-containing decane-based coating layer.

該聚矽氧油可含在表面處理劑中,例如:佔100重量份數所例舉含氟矽烷化合物之0至80重量份數,較佳為0至40重量份數。 The polyoxyxylene oil may be contained in the surface treatment agent, for example, in an amount of from 0 to 80 parts by weight, preferably from 0 to 40 parts by weight, per 100 parts by weight of the fluorine-containing decane compound.

聚矽氧油實例包括例如:具有2,000或更少之矽氧烷鍵之直鏈或環狀聚矽氧油。直鏈聚矽氧油可為所謂之直餾聚矽氧油與改質之矽油。直餾聚矽氧油實例包括二甲基聚矽氧油、甲基苯基聚矽氧油、與甲基氫聚矽氧油。經改質聚矽氧油實例包括由直餾聚矽氧油經烷基、芳烷基、聚醚、較高碳數脂肪酸酯、氟烷基、胺基、環氧基、羧基、醇或類似物改質者。環狀聚矽氧油 實例包括例如:環狀二甲基矽氧烷油。 Examples of the polyoxygenated oil include, for example, a linear or cyclic polyoxyxene oil having a oxane bond of 2,000 or less. The linear polyoxygenated oil may be a so-called straight-run polyoxyl oil and a modified eucalyptus oil. Examples of straight-run polyoxyxene oils include dimethyl polyphthalide oil, methyl phenyl polyoxyxene oil, and methyl hydrogen polyoxyxene oil. Examples of modified polyoxyxides include alkyl ethers, aralkyl groups, polyethers, higher carbon number fatty acid esters, fluoroalkyl groups, amine groups, epoxy groups, carboxyl groups, alcohols, or the like. Analogs are modified. Cyclic polyoxylized oil Examples include, for example, cyclic dimethyl siloxane oil.

含氟矽烷系塗覆層中,聚矽氧油與/或含氟油係利用對含氟矽烷化合物之親和力固定或捕捉。 In the fluorine-containing decane-based coating layer, the polyoxygenated oil and/or the fluorine-containing oil are fixed or captured by affinity with a fluorine-containing decane compound.

含氟矽烷系塗覆層之形成法為在底層表面上形成表面處理劑之塗覆層,若必要時後處理該塗覆層,但本發明不受此限制。 The fluorine-containing decane-based coating layer is formed by forming a coating layer of a surface treating agent on the surface of the underlayer, and if necessary, post-treating the coating layer, but the present invention is not limited thereto.

表面處理劑塗覆層之形成法為在底層表面上塗覆表面處理劑,因此塗覆該表面。塗覆方法沒有明確限制。可採用例如:濕塗法或乾塗法。 The surface treatment agent coating layer is formed by coating a surface treatment agent on the surface of the underlayer, thus coating the surface. The coating method is not specifically limited. For example, a wet coating method or a dry coating method can be employed.

濕塗法實例包括浸塗法、旋塗法、流塗法、噴塗法、滾塗法、凹板式塗法、與類似方法。 Examples of the wet coating method include dip coating, spin coating, flow coating, spray coating, roll coating, gravure coating, and the like.

乾塗法實例包括真空沉積法、濺鍍法、CVD與類似方法。真空沉積法之明確實例包括電阻加熱法、電子束法、高頻率加熱法、離子束法、與類似方法。CVD法之明確實例包括電漿-CVD、光學CVD、熱CVD與類似方法。 Examples of dry coating methods include vacuum deposition, sputtering, CVD, and the like. Clear examples of the vacuum deposition method include a resistance heating method, an electron beam method, a high frequency heating method, an ion beam method, and the like. Clear examples of CVD methods include plasma-CVD, optical CVD, thermal CVD, and the like.

此外,可採用常壓電漿法進行塗覆。 Further, the coating can be carried out by a normal piezoelectric slurry method.

當採用濕塗法時,使用溶液稀釋表面處理劑,然後施用在底層表面。基於表面處理劑之安定性及溶劑之揮發性質,較佳係使用下列溶劑:具有5至12個碳原子之脂族全氟烴(例如:全氟己烷、全氟甲基環己烷與全氟-1,3-二甲基環己烷);芳香族聚氟烴(例如:雙(三氟甲基)苯);脂系聚氟烴;氫氟醚(HFE)(例如:烷基全氟烷基醚,如:全氟丙基甲基醚(C3F7OCH3)、全氟丁基甲基醚(C4F9OCH3)、全氟丁基乙基醚(C4F9OC2H5)與全氟己基甲基醚(C2F5CF(OCH3)C3F7)(全氟烷基與烷基可為直鏈或分支鏈)),等等。 此等溶劑可單獨使用或使用兩種或更多種之混合物。其中,以氫氟醚較佳,以全氟丁基甲基醚(C4F9OCH3)與/或全氟丁基乙基醚(C4F9OC2H5)特別佳。 When the wet coating method is employed, the surface treatment agent is diluted with a solution and then applied to the surface of the underlayer. Based on the stability of the surface treatment agent and the volatile nature of the solvent, it is preferred to use the following solvents: aliphatic perfluorocarbons having 5 to 12 carbon atoms (for example, perfluorohexane, perfluoromethylcyclohexane, and Fluorine-1,3-dimethylcyclohexane); aromatic polyfluorocarbons (eg bis(trifluoromethyl)benzene); aliphatic polyfluorocarbons; hydrofluoroethers (HFE) (eg alkyl groups) Fluoroalkyl ethers such as perfluoropropyl methyl ether (C 3 F 7 OCH 3 ), perfluorobutyl methyl ether (C 4 F 9 OCH 3 ), perfluorobutyl ethyl ether (C 4 F 9 OC 2 H 5 ) with perfluorohexyl methyl ether (C 2 F 5 CF(OCH 3 ) C 3 F 7 ) (perfluoroalkyl and alkyl groups may be straight or branched), and the like. These solvents may be used singly or as a mixture of two or more. Among them, hydrofluoroether is preferred, and perfluorobutyl methyl ether (C 4 F 9 OCH 3 ) and/or perfluorobutyl ethyl ether (C 4 F 9 OC 2 H 5 ) are particularly preferred.

較佳係進行表面處理劑之塗覆層形成法,使表面處理劑能與用於水解與脫水-縮合之觸媒共同存在於塗覆層中。簡言之,當採用濕塗法時,在使用溶劑稀釋表面處理劑後,在即將施用至底層表面之前,可添加觸媒至表面處理劑之稀釋液中。當採用乾塗法時,可在真空沉積法中使用本身已添加觸媒之表面處理劑,或可在真空沉積法使用由已添加觸媒之表面處理劑浸漬在多孔性金屬(如:鐵或銅)上所得之粒劑。 It is preferred to carry out a coating layer forming method of the surface treating agent so that the surface treating agent can be present in the coating layer together with the catalyst for hydrolysis and dehydration-condensation. In short, when the wet coating method is employed, after the surface treatment agent is diluted with a solvent, a catalyst may be added to the dilution of the surface treatment agent just before application to the surface of the underlayer. When the dry coating method is used, a surface treatment agent to which a catalyst has been added may be used in a vacuum deposition method, or a porous metal (for example, iron or the like may be used in a vacuum deposition method using a surface treatment agent to which a catalyst has been added. Granules obtained on copper).

可使用任何合適酸或鹼作為觸媒。可使用例如:乙酸、甲酸、三氟乙酸或類似物作為酸觸媒。可使用例如:氨、有機胺、或類似物作為鹼觸媒。 Any suitable acid or base can be used as the catalyst. For example, acetic acid, formic acid, trifluoroacetic acid or the like can be used as the acid catalyst. For example, ammonia, an organic amine, or the like can be used as the base catalyst.

然後,若必要時,表面處理劑之塗覆層可進行後處理。這種後處理沒有明確限制,但例如:當表面處理劑包含所例舉含氟矽烷化合物時,可依續進行供應水與乾加熱之方法。特定言之,其作法如下。當所例舉含氟矽烷化合物不包含可水解基團(當式中所有T均為羥基)時,不一定需要加水。 Then, if necessary, the coating layer of the surface treatment agent can be post-treated. This post-treatment is not specifically limited, but for example, when the surface treatment agent contains the fluorine-containing decane compound exemplified, the method of supplying water and dry heating can be continued. In particular, the approach is as follows. When it is exemplified that the fluorine-containing decane compound does not contain a hydrolyzable group (when all T in the formula are hydroxyl groups), it is not necessary to add water.

如上述在底層表面上形成表面處理劑之塗覆層後,在此塗覆層上加水(為了與上述底層之前驅物塗覆層區分,下文稱為"第二前驅物塗覆層")。加水之方法可為例如:利用第二前驅物塗覆層(及基底材料與底層)與周圍之間溫度差異造成結露之方法或噴灑水蒸氣(蒸汽)之方法,但沒有明確限制。 After the coating layer of the surface treating agent is formed on the surface of the underlayer as described above, water is added to the coating layer (to be distinguished from the above-mentioned underlying precursor coating layer, hereinafter referred to as "second precursor coating layer"). The method of adding water may be, for example, a method of causing condensation or a method of spraying water vapor (steam) by using a difference in temperature between the second precursor coating layer (and the base material and the bottom layer) and the surroundings, but is not specifically limited.

咸認為,當在第二前驅物塗覆層上加水時,水會作 用在含氟矽烷化合物中與Si鍵結之可水解基團,藉以快速水解含氟矽烷化合物。 Salt believes that when water is added to the second precursor coating, the water will A hydrolyzable fluorine-containing decane compound is rapidly hydrolyzed by a hydrolyzable group bonded to Si in a fluorine-containing decane compound.

加水過程可在大氣下,例如:在0與500℃之溫度間,較佳為100℃與300℃之溫度間進行。在此等溫度範圍下加水即可進行水解作用。此時之壓力沒有明確限制,但周圍壓力壓即可進行。 The water addition process can be carried out under atmospheric conditions, for example, between 0 and 500 ° C, preferably between 100 ° C and 300 ° C. Hydrolysis can be carried out by adding water at these temperature ranges. The pressure at this time is not clearly limited, but the surrounding pressure can be carried out.

然後,讓第二前驅物塗覆層在底層表面上,於超過60℃之乾燥大氣下加熱。該乾熱法可以讓第二前驅物塗覆層與基底材料及底層一起置入超過60℃,較佳為超過100℃,例如:500℃或以下,較佳為300℃或以下之溫度,及不飽和水蒸汽壓之氛圍下,但沒有明確限制。此時之壓力沒有明確限制,但周圍大氣即可進行。 Then, the second precursor coating layer was heated on the surface of the underlayer in a dry atmosphere at over 60 °C. The dry heat method allows the second precursor coating layer to be placed with the base material and the bottom layer at a temperature of more than 60 ° C, preferably more than 100 ° C, for example, 500 ° C or below, preferably 300 ° C or less, and Unsaturated water vapor pressure in the atmosphere, but there is no clear limit. The pressure at this time is not clearly limited, but the surrounding atmosphere can be carried out.

在此等大氣下,在含氟矽烷化合物之間,與Si鍵結之基團在水解後(通式中所有T為羥基時,該基團即指羥基;此點同樣適用於下文)會快速脫水-彼此縮合。結果,在含氟矽烷化合物之間形成鍵結。 Under such atmospheres, between the fluorine-containing decane compounds, the group bonded to the Si after hydrolysis (when all T in the formula is a hydroxyl group, the group refers to a hydroxyl group; this also applies to the following) is rapid Dehydration - condensation with each other. As a result, a bond is formed between the fluorine-containing decane compounds.

雖然本發明不受任何理論限制,但在含氟矽烷化合物與底層之間,與Si鍵結之基團會在化合物水解之後與底層表面上存在之反應性部分快速反應。結果在化合物與底層之間形成鍵結。 While the invention is not limited by any theory, between the fluorine-containing decane compound and the underlayer, the group bonded to the Si will rapidly react with the reactive moiety present on the surface of the underlayer after hydrolysis of the compound. As a result, a bond is formed between the compound and the underlayer.

上述加水與乾熱過程可使用超熱水蒸汽連續進行。 The above water addition and dry heat processes can be carried out continuously using super hot water steam.

超熱水蒸汽為由飽和水蒸汽加熱至超過沸點之溫度後所得到之氣體,其中該氣體在周圍壓力下加熱至超過100℃之溫度,通常為500℃或以下,例如:300℃或以下,及超過沸點時, 會轉成具有不飽和水蒸汽壓。當已在底層上形成第二前驅物塗覆層之基底材料暴露到超熱水蒸汽時,首先由於超熱水蒸汽與相對低溫之第二前驅物塗覆層之間出現溫度差異,因此在第二前驅物塗覆層表面上出現結露,藉此提供水給第二前驅物塗覆層。目前,當超熱水蒸汽與第二前驅物塗覆層之間溫度差異縮小時,第二前驅物塗覆層表面上的水會因超熱水蒸汽而在乾燥大氣下蒸發,而第二前驅物塗覆層表面上的水量即會慢慢減少。在第二前驅物塗覆層表面上的水減少之期間,亦即當第二前驅物塗覆層處於乾燥大氣下之期間,第二前驅物塗覆層會與超熱水蒸汽接觸,結果使第二前驅物塗覆層受到超熱水蒸汽之溫度加熱(周圍壓力下超過100℃之溫度)。因此,藉由使用超熱水蒸汽,讓已在底層上形成前驅物塗覆層之基底材料暴露到超熱水蒸汽,即可連續提供水與乾熱。 The super hot water steam is a gas obtained by heating the saturated steam to a temperature exceeding a boiling point, wherein the gas is heated to a temperature exceeding 100 ° C under ambient pressure, usually 500 ° C or below, for example, 300 ° C or below. And when the boiling point is exceeded, Will turn into an unsaturated water vapor pressure. When the base material on which the second precursor coating layer has been formed on the underlayer is exposed to the super hot water vapor, firstly due to a temperature difference between the super hot water vapor and the relatively low temperature second precursor coating layer, Condensation occurs on the surface of the second precursor coating layer, thereby providing water to the second precursor coating layer. At present, when the temperature difference between the super hot water vapor and the second precursor coating layer is reduced, the water on the surface of the second precursor coating layer evaporates in a dry atmosphere due to the super hot water vapor, and the second precursor The amount of water on the surface of the coating layer is gradually reduced. During the reduction of water on the surface of the second precursor coating layer, that is, while the second precursor coating layer is in a dry atmosphere, the second precursor coating layer is in contact with the super hot water vapor, resulting in The second precursor coating layer is heated by the temperature of the super hot water vapor (temperature exceeding 100 ° C under ambient pressure). Therefore, water and dry heat can be continuously supplied by exposing the base material which has formed the precursor coating layer on the underlayer to the super hot water vapor by using super hot water vapor.

可如上述進行後處理。進行後處理法係為了進一步提高耐摩擦性,但應注意,此後處理法並非製造本發明物品之必要條件。例如:在底層表面上塗覆表面處理劑後,可以單純地靜置。 Post treatment can be carried out as described above. The post-treatment method is carried out in order to further improve the rubbing resistance, but it should be noted that the post-treatment method is not a necessary condition for the manufacture of the article of the present invention. For example, after applying a surface treatment agent on the surface of the bottom layer, it can be simply left to stand.

如上述,底層係在有機基底材料之表面上形成,且含氟矽烷系塗覆層係在底層上形成以產生本發明物品。所得物品中,含氟矽烷系塗覆層具有高防污性質與高耐摩擦性,因此含氟矽烷系塗覆層適用為防污塗覆層。特定言之,藉由使用包含所例舉含氟矽烷化合物之表面處理劑,形成具有潑水性、潑油性、防污性質(例如:防止如:指印之污漬附著)、表面滑溜性質(或潤滑性,例如:擦拭如:指印污漬之性質),等等之含氟矽烷系塗覆層 且適用為功能性薄塗覆層。 As described above, the underlayer is formed on the surface of the organic base material, and the fluorine-containing decane-based coating layer is formed on the underlayer to produce the article of the present invention. Among the obtained articles, the fluorine-containing decane-based coating layer has high antifouling properties and high abrasion resistance, and thus the fluorine-containing decane-based coating layer is suitably used as an antifouling coating layer. Specifically, by using a surface treatment agent containing the fluorine-containing decane compound, it is formed to have water repellency, oil repellency, antifouling properties (for example, prevention of adhesion such as fingerprints), surface slip properties (or lubricity). , for example: wiping such as: the nature of fingerprints), etc., fluorine-containing decane coating Also suitable for functional thin coatings.

本發明物品沒有明確限制,但可能為光學組件。光學組件實例包括下列:玻璃鏡片、或類似物;前表面保護板、抗反射板、極化板或顯示器(如:PDP與LCD)上之防眩板;儀器(如:手機或個人數位助理器(PDA))之觸控面板;光碟(如:藍光影碟、DVD影碟、CD-R或MO)之碟面;光纖,等等。 The articles of the invention are not specifically limited, but may be optical components. Examples of optical components include the following: glass lenses, or the like; front surface protection panels, anti-reflection panels, polarizing panels or anti-glare panels on displays (eg, PDPs and LCDs); instruments (eg, cell phones or personal digital assistants) (PDA)) touch panel; disc (such as Blu-ray Disc, DVD, CD-R or MO); optical fiber, and so on.

含氟矽烷系塗覆層之厚度沒有明確限制。基於光學性能、耐摩擦性與防污性質,光學組件之含氟矽烷系塗覆層厚度在1至30nm之範圍內,較佳為1至15nm。 The thickness of the fluorine-containing decane-based coating layer is not specifically limited. The fluorine-containing decane-based coating layer of the optical component has a thickness in the range of 1 to 30 nm, preferably 1 to 15 nm, based on optical properties, abrasion resistance and antifouling properties.

上文中,製造本發明物品之方法及由該製造方法產生之物品已透過本發明具體實施例詳細說明,但該等具體實施例可以經過各種不同修飾。 In the above, the method of producing the article of the present invention and the articles produced by the method of the present invention have been described in detail through the specific embodiments of the present invention, but the specific embodiments may be variously modified.

例如:雖然在上述具體實施例中,含氟矽烷系塗覆層係直接塗在底層上,但其亦可利用無機材料層形成在底層上。在經修飾之具體實施例中,亦由於底層(固化之塗覆層)表面上存在反應性部分,因此該無機材料層對底層具有高附著強度,且藉由在無機材料層施用包含含氟矽烷化合物之表面處理劑,而可形成對無機材料層具有高附著強度之含氟矽烷系塗覆層。結果,可形成具有耐摩擦性之含氟矽烷系塗覆層。無機材料層可為單層或多重層。此外,若必要時,可使用具有抗反射功能之無機材料層作為無機材料層,可使用單一抗反射層或多重抗反射層。無機材料層沒有明確限制,但可為包含例如:、SiO2、SiO、ZrO2、TiO2、TiO、Ti2O3、Ti2O5、Al2O3、Ta2O5、CeO2、MgO、Y2O3、SnO2、MgF2,等等之層。此等無機材料可單獨使用或組合使用兩種或更多種 (例如:呈混合物)。當使用多重抗反射層時,較佳係在最外層中使用SiO2與/或SiO。可採用周知方法形成此等層,如:蒸汽沉積法、溶膠凝膠法或類似方法。無機材料層之厚度沒有明確限制,但可為例如:在1至300nm之範圍內。 For example, although in the above specific embodiment, the fluorine-containing decane-based coating layer is directly coated on the underlayer, it may be formed on the underlayer by using an inorganic material layer. In the modified specific embodiment, also because of the presence of a reactive moiety on the surface of the underlying layer (cured coating layer), the inorganic material layer has a high adhesion strength to the underlayer, and by applying a fluorine-containing decane in the inorganic material layer The surface treatment agent of the compound forms a fluorine-containing decane-based coating layer having high adhesion strength to the inorganic material layer. As a result, a fluorine-containing decane-based coating layer having abrasion resistance can be formed. The inorganic material layer may be a single layer or multiple layers. Further, if necessary, an inorganic material layer having an antireflection function may be used as the inorganic material layer, and a single antireflection layer or a multiple antireflection layer may be used. The inorganic material layer is not specifically limited, but may include, for example, SiO 2 , SiO, ZrO 2 , TiO 2 , TiO, Ti 2 O 3 , Ti 2 O 5 , Al 2 O 3 , Ta 2 O 5 , CeO 2 , A layer of MgO, Y 2 O 3 , SnO 2 , MgF 2 , and the like. These inorganic materials may be used singly or in combination of two or more kinds (for example, in a mixture). When a multiple antireflection layer is used, it is preferred to use SiO 2 and/or SiO in the outermost layer. These layers may be formed by a known method such as a vapor deposition method, a sol-gel method or the like. The thickness of the inorganic material layer is not specifically limited, but may be, for example, in the range of 1 to 300 nm.

此外,例如:上述具體實施例中,在有機基底材料表面上施用用於形成底層之組成物,形成前驅物塗覆層;(當該用於形成底層之組成物使用溶劑稀釋時,則在移除溶劑後)讓前驅物塗覆層接受光照射,使其完全固化,得到作為底層之固化材料;然後在上面塗覆包含含氟矽烷化合物之表面處理劑,形成含氟矽烷系塗覆層,但形成固化之塗覆層與形成含氟矽烷系塗覆層之時間不受此限制。更明確言之,在有機基底材料表面上施用用於形成底層之組成物,形成前驅物塗覆層;該前驅物塗覆層(以前例而言應在移除溶劑後)可作為底層使用,然後在其上施用包含含氟矽烷化合物之表面處理劑;該前驅物塗覆層透過表面處理劑層接受光照射,形成固化之塗覆層;藉此由包含含氟矽烷化合物之表面處理劑在固化之塗覆層上形成含氟矽烷系塗覆層。或者,將用於形成底層之組成物塗覆在有機基底材料之表面上,形成前驅物塗覆層;該前驅物塗覆層(以前例而言應在移除溶劑後)接受光照射,得到半固化之塗覆層,其中係進行部分固化;該半固化之塗覆層則用為底層,再於上面施用包含含氟矽烷化合物之表面處理劑;該半固化之塗覆層透過表面處理劑層接受光照射,得到完全固化之塗覆層;藉此在由包含含氟矽烷化合物之表面處理劑形成之固化之塗覆層上再形成含氟矽烷系塗覆層。根據此等經修飾之具體實施例,由於該前驅物塗覆層或半固化之塗覆層透過表面處 理劑層接受光照射而得到固化之塗覆層,因此塗覆層表面(包括前驅物塗覆層或從半固化之塗覆層到固化之塗覆層之狀態)在此期間受到光觸媒之作用而在塗覆層表面上水解產生羥基與/或自由基,且表面處理劑中含氟矽烷化合物中與Si鍵結之羥基或可水解基團與此等塗覆層接觸時,即很容易與塗覆層表面上所產生羥基與/或自由基反應,因此可在完全固化之塗覆層與含氟矽烷化合物(上述經修飾具體實施例中之無機材料層)之間產生高附著強度,結果可形成具有高耐摩擦性之含氟矽烷系塗覆層。 Further, for example, in the above specific embodiment, a composition for forming an underlayer is applied on the surface of the organic base material to form a precursor coating layer; (when the composition for forming the underlayer is diluted with a solvent, it is moving After removing the solvent, the precursor coating layer is subjected to light irradiation to completely cure to obtain a cured material as a primer layer; then a surface treatment agent containing a fluorine-containing decane compound is applied thereon to form a fluorine-containing decane-based coating layer. However, the time for forming the cured coating layer and forming the fluorine-containing decane-based coating layer is not limited thereto. More specifically, the composition for forming the underlayer is applied on the surface of the organic base material to form a precursor coating layer; the precursor coating layer (which should be removed after solvent removal in the previous example) can be used as the bottom layer. And then applying a surface treatment agent containing a fluorine-containing decane compound thereon; the precursor coating layer is irradiated with light through the surface treatment agent layer to form a cured coating layer; thereby, the surface treatment agent containing the fluorine-containing decane compound is A fluorine-containing decane-based coating layer is formed on the cured coating layer. Alternatively, the composition for forming the underlayer is coated on the surface of the organic base material to form a precursor coating layer; the precursor coating layer (previously, after removing the solvent) is subjected to light irradiation to obtain a semi-cured coating layer in which partial curing is performed; the semi-cured coating layer is used as a primer layer, and a surface treatment agent containing a fluorine-containing decane compound is applied thereon; the semi-cured coating layer is permeable to the surface treatment agent The layer is irradiated with light to obtain a fully cured coating layer; thereby, a fluorine-containing decane-based coating layer is further formed on the cured coating layer formed of a surface treatment agent containing a fluorine-containing decane compound. According to such modified specific embodiments, the precursor coating layer or the semi-cured coating layer is transmitted through the surface The layer of the agent is irradiated with light to obtain a cured coating layer, and thus the surface of the coating layer (including the precursor coating layer or the state from the semi-cured coating layer to the cured coating layer) is subjected to the photocatalyst during this period. While hydrolyzing on the surface of the coating layer to generate hydroxyl groups and/or radicals, and in the surface treatment agent, the Si-bonded hydroxyl group or hydrolyzable group in the fluorine-containing decane compound is easily contacted with the coating layer. The hydroxyl group and/or the radical generated on the surface of the coating layer reacts, so that a high adhesion strength can be produced between the fully cured coating layer and the fluorine-containing decane compound (the inorganic material layer in the above modified specific embodiment), and as a result A fluorine-containing decane-based coating layer having high abrasion resistance can be formed.

下文中,利用實施例詳細說明製造本發明物品之方法,但本發明不受此等實施例限制。 Hereinafter, the method of producing the article of the present invention will be described in detail using the examples, but the present invention is not limited by the examples.

實施例1 Example 1

.TiO2奈米粒子溶液之製造方法(A-1) . Method for producing TiO 2 nanoparticle solution (A-1)

首先,取二異丙醇雙(乙醯基丙酮酸)鈦(製造商為Nippon Soda Co.,Ltd.;T-50,氧化鈦-當量固形物含量=16.5%重量比)(70g)溶於變性酒精(134.9g),然後慢慢攪拌滴加離子交換水(26.0g)(TiO2之10倍莫耳/莫耳),水解二異丙醇雙(乙醯基丙酮酸)鈦。一天後,過濾溶液,得到5.0wt%(氧化鈦-當量固形物含量)之黃褐色透明TiO2奈米粒子溶液(A-1)。其係鈦之螯合化合物之水解產物。 First, diisopropanol bis(acetylthiopyruvate) titanium (manufacturer Nippon Soda Co., Ltd.; T-50, titanium oxide-equivalent solid content = 16.5% by weight) (70 g) was dissolved. The alcohol (134.9 g) was denatured, and then ion-exchanged water (26.0 g) (10 times mol/mol of TiO 2 ) was slowly added dropwise to hydrolyze diisopropanol bis(acetylthiopyruvate) titanium. After one day, the solution was filtered to obtain 5.0 wt% (titanium oxide-equivalent solid content) of a yellow-brown transparent TiO 2 nanoparticle solution (A-1). It is a hydrolysis product of a chelate compound of titanium.

.用於形成底層(S-1)之組成物之製造方法 . Manufacturing method for forming a composition of the underlayer (S-1)

用於形成底層(S-1)之組成物之製造方法係添加如上述製備之TiO2奈米粒子溶液(A-1)(74.0g)(作為光觸媒)至多官能基丙烯酸胺基甲酸酯(製造商為Arakawa Chemical Industries,Ltd.;Beam Set 575 CB)(37.0g)(作為光固化有機材料)、乙烯基三甲氧基矽烷(製造商為Dow Corning Torav Co.,Ltd.;DOW CORNING TORAY SZ6300 SILANE)(18.5g)與γ-甲基丙烯醯氧基丙基三甲氧矽烷(製造商為Dow Corning Toray Co.,Ltd.;DOW CORNING TORAY SZ6030 SILANE)(18.5g)(作為光固化有機材料與不飽和矽烷化合物)、及甲基異丁基酮(46.3g)(作為溶劑),製備用於形成底層(S-1)之組成物。 The manufacturing method for forming the composition of the underlayer (S-1) is to add the TiO 2 nanoparticle solution (A-1) (74.0 g) prepared as described above (as a photocatalyst) to the polyfunctional urethane urethane ( The manufacturer is Arakawa Chemical Industries, Ltd.; Beam Set 575 CB) (37.0 g) (as photocurable organic material), vinyl trimethoxy decane (manufacturer is Dow Corning Torav Co., Ltd.; DOW CORNING TORAY SZ6300) SILANE) (18.5g) and γ-methacryloxypropyltrimethoxysilane (manufacturer of Dow Corning Toray Co., Ltd.; DOW CORNING TORAY SZ6030 SILANE) (18.5g) (as a photocurable organic material and A composition for forming the underlayer (S-1) was prepared by using an unsaturated decane compound) and methyl isobutyl ketone (46.3 g) as a solvent.

.底層之形成法 . Bottom layer formation

採用壓克力板(製造商為Mitsubishi Rayon Co.,Ltd.;Acrylite,厚度:1.0mm)作為有機基底材料。使用用於形成底層(S-1)之組成物,採用浸塗機(Dip Coater)(製造商為SDI Company)處理壓克力板(拉出速率:15mm/sec)。使因此塗覆在壓克力板上之形成底層之組成物於60℃之乾燥機中乾燥30分鐘,然後接受紫外光照射(波長:200至400nm;累積光量:600mJ/cm2),形成底層(P-1),作為其固化之塗覆層。 As the organic base material, an acrylic plate (manufacturer: Mitsubishi Rayon Co., Ltd.; Acrylite, thickness: 1.0 mm) was used. The acrylic sheet (pull-out rate: 15 mm/sec) was treated with a Dip Coater (manufacturer SDI Company) using the composition for forming the underlayer (S-1). The composition forming the underlayer thus coated on the acrylic plate was dried in a dryer at 60 ° C for 30 minutes, and then subjected to ultraviolet light irradiation (wavelength: 200 to 400 nm; cumulative light amount: 600 mJ/cm 2 ) to form an underlayer. (P-1) as its cured coating layer.

.防污層(含氟矽烷系塗覆層)之形成法 . Formation method of antifouling layer (fluorine-containing decane-based coating layer)

取主要包含如下式化合物(分子量:約4,000)之組成物(80mg)加至銅杯中,然後藉由電阻加熱法,使用沉積裝置(製造商為Shincron Co.,Ltd.),讓化合物沉積在如上述形成之底層(P-1)表面上,形成含氟矽烷系塗覆層。因此產生物品樣本。 A composition (80 mg) mainly containing a compound of the following formula (molecular weight: about 4,000) was added to a copper cup, and then a compound was deposited by a resistance heating method using a deposition apparatus (manufactured by Shincron Co., Ltd.). On the surface of the underlayer (P-1) formed as described above, a fluorine-containing decane-based coating layer was formed. This produces a sample of the item.

其中:n為整數20至30,及m為整數1至5。 Wherein: n is an integer from 20 to 30, and m is an integer from 1 to 5.

實施例2 Example 2

.用於形成底層(S-2)之組成物之製造方法 . Manufacturing method for forming a composition of the underlayer (S-2)

用於形成底層(S-2)之組成物之製造方法為取實施例1製備之TiO2奈米粒子溶液(A-1)(75.0g)(作為光觸媒)加至多官能基之丙烯 酸胺基甲酸酯(製造商為Arakawa Chemical Industries,Ltd.;Beam Set 575 CB)(50.0g)(作為光固化有機材料)、乙烯基三甲氧基矽烷(製造商為Dow Corning Toray Co.,Ltd.;DOW CORNING TORAY SZ6300 SILANE)(12.5g)與γ-甲基丙烯醯氧基丙基三甲氧基矽烷(製造商為Dow Corning Toray Co.,Ltd.;DOW CORNING TORAY SZ6030 SILANE)(12.5g)(作為光固化有機材料與不飽和矽烷化合物)、及甲基異丁基酮(46.9g)(作為溶劑)中。 The manufacturing method for forming the composition of the underlayer (S-2) is to add the TiO 2 nanoparticle solution (A-1) (75.0 g) prepared in Example 1 (as a photocatalyst) to the polyfunctional amide group. Acid ester (manufactured by Arakawa Chemical Industries, Ltd.; Beam Set 575 CB) (50.0 g) (as a photocurable organic material), vinyl trimethoxy decane (manufacturer of Dow Corning Toray Co., Ltd.; DOW) CORNING TORAY SZ6300 SILANE) (12.5g) and γ-methacryloxypropyltrimethoxydecane (manufacturer Dow Corning Toray Co., Ltd.; DOW CORNING TORAY SZ6030 SILANE) (12.5g) (as light) The organic material and the unsaturated decane compound were cured, and methyl isobutyl ketone (46.9 g) was used as a solvent.

.底層之形成法 . Bottom layer formation

類似實施例1之方法,在壓克力板表面上形成底層(P-2),但其中改用形成底層(S-2)之組成物替代形成底層(S-1)之組成物。 In the same manner as in Example 1, the underlayer (P-2) was formed on the surface of the acrylic sheet, but the composition forming the underlayer (S-2) was used instead of the composition forming the underlayer (S-1).

.防污層(含氟矽烷系塗覆層)之形成法 . Formation method of antifouling layer (fluorine-containing decane-based coating layer)

類似實施例1之方法,形成含氟矽烷系塗覆層(作為防污層),但其中化合物改沉積在底層(P-2)之表面上而非底層(P-1)之表面。 A method similar to that of Example 1 was carried out to form a fluorine-containing decane-based coating layer (as an antifouling layer), but in which a compound was deposited on the surface of the underlayer (P-2) instead of the surface of the underlayer (P-1).

實施例3 Example 3

.底層之形成法 . Bottom layer formation

類似實施例1之方法,在壓克力板表面上形成底層(P-1)。 Similar to the method of Example 1, the underlayer (P-1) was formed on the surface of the acrylic plate.

.無機材料層(二氧化矽塗覆層)之形成法 . Formation method of inorganic material layer (cerium oxide coating layer)

利用沉積裝置(製造商為Shincron Co.,Ltd.)之電子束法,讓二氧化矽沉積在底層(P-1)之表面上,形成二氧化矽塗覆層,厚度為7mm。 Using a electron beam method of a deposition apparatus (manufactured by Shincron Co., Ltd.), cerium oxide was deposited on the surface of the underlayer (P-1) to form a cerium oxide coating layer having a thickness of 7 mm.

.防污層(含氟矽烷系塗覆層)之形成法 . Formation method of antifouling layer (fluorine-containing decane-based coating layer)

類似實施例1之方法形成含氟矽烷系塗覆層作為防污層,但其中化合物改沉積在二氧化矽塗覆層之表面上,而非底層(P-1)之表面。 A method similar to that of Example 1 was carried out to form a fluorine-containing decane-based coating layer as an antifouling layer, but in which a compound was deposited on the surface of the ceria coating layer instead of the surface of the underlayer (P-1).

比較例1 Comparative example 1

.防污層(含氟矽烷系塗覆層)之形成法 . Formation method of antifouling layer (fluorine-containing decane-based coating layer)

類似實施例1之方法形成含氟矽烷系塗覆層作為防污層,但其中改用壓克力板(製造商為Mitsubishi Rayon Co.,Ltd.;Acrylite;厚度:1.0mm)作為有機基底材料,且不形成底層即讓化合物沉積在壓克力板表面上。 A method similar to that of Example 1 was carried out to form a fluorine-containing decane-based coating layer as an antifouling layer, but in which an acrylic plate (manufactured by Mitsubishi Rayon Co., Ltd.; Acrylite; thickness: 1.0 mm) was used as an organic base material. And without forming a bottom layer, the compound is deposited on the surface of the acrylic sheet.

比較例2 Comparative example 2

.無機材料層(二氧化矽塗覆層)之形成法 . Formation method of inorganic material layer (cerium oxide coating layer)

採用壓克力板(製造商為Mitsubishi Rayon Co.,Ltd.;Acrylite;厚度:1.0mm)作為有機基底材料。採用電子束法及使用沉積裝置(製造商為Shincron Co.,Ltd.),讓二氧化矽沉積在壓克力板表面上,厚度為7mm,形成二氧化矽塗覆層。 As the organic base material, an acrylic plate (manufacturer: Mitsubishi Rayon Co., Ltd.; Acrylite; thickness: 1.0 mm) was used. The cerium oxide coating layer was formed by depositing cerium oxide on the surface of the acryl plate by a electron beam method and using a deposition apparatus (manufactured by Shincron Co., Ltd.) to a thickness of 7 mm.

.防污層(含氟矽烷系塗覆層)之形成法 . Formation method of antifouling layer (fluorine-containing decane-based coating layer)

類似實施例1之方法形成含氟矽烷系塗覆層(作為防污層),但其中化合物改沉積在二氧化矽塗覆層之表面上,而非底層(P-1)之表面。 A method similar to that of Example 1 was carried out to form a fluorine-containing decane-based coating layer (as an antifouling layer), but in which a compound was deposited on the surface of the ceria coating layer instead of the surface of the underlayer (P-1).

比較例3 Comparative example 3

.用於形成底層(S-3)之組成物之製造方法 . Manufacturing method for forming a composition of the underlayer (S-3)

用於形成底層(S-3)之組成物之製造方法為添加IRGACURE 907(製造商為Ciba Specialty Chemicals Inc.)(2.4g)(作為紫外光固化引發劑)至乙烯基三甲氧基矽烷(製造商為Dow Corning Toray Co.,Ltd.;DOW CORNING TORAY SZ6300 SILANE)(40.0g)與γ-甲基丙烯醯氧基丙基三甲氧基矽烷(製造商為Dow Corning Toray Co.,Ltd.;DOW CORNING TORAY SZ6030 SILANE)(40.0g)(作為光 固化有機材料與不飽和矽烷化合物)、及甲基異丁基酮(120.0g)(作為溶劑)中。 The manufacturing method for forming the composition of the underlayer (S-3) is to add IRGACURE 907 (manufactured by Ciba Specialty Chemicals Inc.) (2.4 g) (as an ultraviolet curing initiator) to vinyltrimethoxydecane (manufacture) Dow Corning Toray Co., Ltd.; DOW CORNING TORAY SZ6300 SILANE) (40.0 g) and γ-methacryloxypropyltrimethoxydecane (manufacturer Dow Corning Toray Co., Ltd.; DOW) CORNING TORAY SZ6030 SILANE) (40.0g) (as light The organic material was cured with an unsaturated decane compound) and methyl isobutyl ketone (120.0 g) as a solvent.

.底層之形成法 . Bottom layer formation

類似實施例1之方法形成底層(P-3),但其中改用形成底層(S-3)之組成物替代形成底層(S-1)之組成物。 The bottom layer (P-3) was formed in a manner similar to that of Example 1, except that the composition forming the underlayer (S-3) was used instead of the composition forming the underlayer (S-1).

.防污層(含氟矽烷系塗覆層)之形成法 . Formation method of antifouling layer (fluorine-containing decane-based coating layer)

類似實施例1之方法形成含氟矽烷系塗覆層(作為防污層),但其中化合物改沉積在底層(P-3)表面上,而非底層(P-1)表面。 A method similar to that of Example 1 was carried out to form a fluorine-containing decane-based coating layer (as an antifouling layer), but in which a compound was deposited on the surface of the underlayer (P-3) instead of the underlayer (P-1) surface.

比較例4 Comparative example 4

.用於形成底層(S-4)之組成物製造方法 . Method for producing a composition for forming a bottom layer (S-4)

用於形成底層(S-4)之組成物製造方法為添加實施例1所製備TiO2奈米粒子溶液(A-1)(58.0g)(作為光觸媒)至多官能基丙烯酸胺基甲酸酯(製造商為Arakawa Chemical Industries,Ltd.;Beam Set 575CB)(59.0g)(作為光固化有機材料)與甲基異丁基酮(37.8g)(作為溶劑)中。 The composition for forming the underlayer (S-4) was prepared by adding the TiO 2 nanoparticle solution (A-1) (58.0 g) prepared in Example 1 (as a photocatalyst) to a polyfunctional urethane urethane ( The manufacturer was Arakawa Chemical Industries, Ltd.; Beam Set 575CB) (59.0 g) (as a photocurable organic material) and methyl isobutyl ketone (37.8 g) (as a solvent).

.底層之形成法 . Bottom layer formation

類似實例1之方法形成底層(P-4),但其中改用形成底層(S-4)之組成物替代形成底層(S-1)之組成物。 The bottom layer (P-4) was formed in a manner similar to that of Example 1, except that the composition forming the underlayer (S-4) was used instead of the composition forming the underlayer (S-1).

.防污層(含氟矽烷系塗覆層)之形成法 . Formation method of antifouling layer (fluorine-containing decane-based coating layer)

類似實施例1之方法形成含氟矽烷系塗覆層(作為防污層),但其中化合物改沉積在底層(P-4)表面上,而非底層(P-1)表面。 A method similar to that of Example 1 was carried out to form a fluorine-containing decane-based coating layer (as an antifouling layer), but in which a compound was deposited on the surface of the underlayer (P-4) instead of the underlayer (P-1) surface.

評估法 Evaluation method

測量上述實施例與比較例所形成防污層(含氟矽烷系塗覆層)之靜態水接觸角。利用自動化接觸角測定儀(製造商為KYOWA INTERFACE SCIENCE Co.,LTD.)測量1μL水之靜態水接觸角。 The static water contact angle of the antifouling layer (fluorine-containing decane-based coating layer) formed in the above examples and comparative examples was measured. Use automated contact angle meter (manufacturer is KYOWA) INTERFACE SCIENCE Co., LTD.) measured the static water contact angle of 1 μL of water.

分析法1. 初始評估法 Analytical method 1. Initial evaluation method

首先,在形成防污層後,測量其尚未接觸過任何物質之表面之靜態水接觸角(摩擦次數為零)。 First, after the antifouling layer is formed, the static water contact angle (zero number of rubbing) of the surface on which the substance has not been contacted is measured.

分析法2. 耐摩擦性評估法 Analytical method 2. Friction resistance evaluation method

然後評估橡皮擦耐摩擦性。明確言之,將已在上面形成防污層之物品樣本水平排列,然後將橡皮擦(製造商為Kokuyo Co.,Ltd.;KESHI-70;平面尺寸:1cm x 1.6cm)與之防污層之暴露表面接觸,並施加500gf載重。然後讓橡皮擦在施加載重下,依20mm/秒之速率來回移動。在來回移動50、100、250、500、750與1,000次後測量靜態水接觸角(度)。當接觸角之測量值小於100時,即停止該評估法。 The eraser is then evaluated for abrasion resistance. Specifically, the sample of the article on which the antifouling layer has been formed is horizontally arranged, and then the eraser (manufacturer is Kokuyo Co., Ltd.; KESHI-70; plane size: 1 cm x 1.6 cm) and the antifouling layer The exposed surface was exposed and a load of 500 gf was applied. Then let the eraser move back and forth at a rate of 20 mm/sec under the applied load. The static water contact angle (degrees) was measured after moving 50, 100, 250, 500, 750 and 1,000 times back and forth. When the measured value of the contact angle is less than 100, the evaluation method is stopped.

試驗例1與2之結果示於表1與第1圖。符號"-"代表"未測量"。 The results of Test Examples 1 and 2 are shown in Table 1 and Figure 1. The symbol "-" stands for "not measured".

由表1與第1圖可見,相較於比較例1(其中未形成底層)、比較例2(其中改形成二氧化矽塗覆層替代底層)、比較例3(其中改用無光觸媒之組成物形成底層)與比較例4(其中利用不含 不飽和矽烷化合物之組成物形成底層)之含氟矽烷系塗覆層,本發明實施例1至3之含氟矽烷系塗覆層具有較高之耐摩擦性。 As can be seen from Table 1 and Figure 1, compared to Comparative Example 1 in which the underlayer was not formed, Comparative Example 2 (in which the ruthenium dioxide coating layer was replaced by the underlayer), Comparative Example 3 (in which the composition of the photocatalyst was changed) The substance forms the bottom layer) and Comparative Example 4 (where the use does not contain The fluorine-containing decane-based coating layer of the composition of the unsaturated decane compound forms the underlayer), and the fluorine-containing decane-based coating layer of Examples 1 to 3 of the present invention has high abrasion resistance.

產業利用性 Industrial utilization

本發明係用於有機基底材料之表面處理,特定言之適用於獲得需要高防污性質與高耐摩擦性之光學組件。 The present invention is applied to the surface treatment of organic substrate materials, and is particularly suitable for obtaining optical components requiring high antifouling properties and high abrasion resistance.

Claims (11)

一種在有機基底材料之塗覆層表面上包含含氟矽烷系塗覆層之物品之製造方法,其中該製造方法包括下列步驟:(a)利用包含不飽和矽烷化合物、光觸媒與光固化有機材料之組成物,在該有機基底材料之表面上形成前驅物塗覆層;(b)對該前驅物塗覆層進行光照射,藉此在該有機基底材料之該表面上形成衍生有該前驅物塗覆層的固化之塗覆層;及(c)利用包含含氟矽烷化合物之表面處理劑,在該固化之塗覆層上直接形成或隔著無機材料層形成含氟矽烷系塗覆層。 A method for producing an article comprising a fluorine-containing decane-based coating layer on a surface of a coating layer of an organic base material, wherein the manufacturing method comprises the steps of: (a) using an unsaturated decane-containing compound, a photocatalyst, and a photocurable organic material. a composition, a precursor coating layer is formed on a surface of the organic base material; (b) the precursor coating layer is irradiated with light, whereby the precursor coating is formed on the surface of the organic base material a cured coating layer of the coating; and (c) forming a fluorine-containing decane-based coating layer directly on the cured coating layer or via an inorganic material layer by using a surface treatment agent containing a fluorine-containing decane compound. 如申請專利範圍第1項所述之物品之製造方法,其中,該不飽和矽烷化合物為下述通式之化合物:CH2=CH-(R12)y-SiTxR11 3-x其中:T為羥基或可水解之基團;R11為氫原子或具有1至22個碳原子之烷基;x為1至3之整數;R12為二價有機基團;及y為0或1。 The method for producing an article according to claim 1, wherein the unsaturated decane compound is a compound of the formula: CH 2 =CH-(R 12 ) y -SiT x R 11 3-x wherein: T is a hydroxyl group or a hydrolyzable group; R 11 is a hydrogen atom or an alkyl group having 1 to 22 carbon atoms; x is an integer of 1 to 3; R 12 is a divalent organic group; and y is 0 or 1 . 如申請專利範圍第1或2項所述之物品之製造方法,其中,該光觸媒係由金屬化合物組成。 The method of producing an article according to claim 1 or 2, wherein the photocatalyst is composed of a metal compound. 如申請專利範圍第1至3項中任一項所述之物品之製造方法,其中,該含氟矽烷化合物具有全氟聚醚基團及與Si鍵結之羥基或可水解基團。 The method for producing an article according to any one of claims 1 to 3, wherein the fluorine-containing decane compound has a perfluoropolyether group and a hydroxyl group or a hydrolyzable group bonded to Si. 如申請專利範圍第4項所述之物品之製造方法,其中,該含氟 矽烷化合物包含一或多種如下述任一通式(1a)與(1b)之化合物: 其中:Rf1為具有1至16個碳原子之烷基,其可經或可不經一個或多個氟原子取代;a、b、c與s分別獨立為整數0至200,其中該a、b、c與s之總數為至少1,及該式中下標為a、b、c或s之括號中的各重複單位之出現順序沒有限制;d與f分別獨立為0或1;e與g分別獨立為整數0至2;m與l分別獨立為整數1至10;X為氫原子或鹵原子;Y為氫原子或低碳數烷基;Z為氟原子或低碳數氟烷基;T為羥基或可水解之基團;R1為氫原子或具有1至22個碳原子之烷基;及n為1至3之整數。 The method for producing an article according to claim 4, wherein the fluorine-containing decane compound comprises one or more compounds of any one of the following formulas (1a) and (1b): Wherein: Rf 1 is an alkyl group having 1 to 16 carbon atoms which may or may not be substituted by one or more fluorine atoms; a, b, c and s are each independently an integer from 0 to 200, wherein the a, b The total number of c and s is at least 1, and the order of occurrence of each repeating unit in parentheses in which a subscript is a, b, c or s is not limited; d and f are independently 0 or 1; e and g, respectively Separately, the integers are 0 to 2; m and l are each independently an integer of 1 to 10; X is a hydrogen atom or a halogen atom; Y is a hydrogen atom or a lower alkyl group; and Z is a fluorine atom or a lower fluoroalkyl group; T is a hydroxyl group or a hydrolyzable group; R 1 is a hydrogen atom or an alkyl group having 1 to 22 carbon atoms; and n is an integer of 1 to 3. 如申請專利範圍第4項所述之物品之製造方法,其中,該含氟矽烷化合物包含一或多種如下述任一通式(2a)與(2b)之化合 物: 其中:Rf2為具有1至16個碳原子之烷基,其可經或可不經一個或多個氟原子取代;a、b、c與s分別獨立為整數0至200,其中該a、b、c與s之總數為至少1,及該式中下標為a、b、c或s之括號中的各重複單位之出現順序沒有限制;d與f分別獨立為0或1;h與j為1或2;i與k分別獨立為整數2至20;Z為氟原子或低碳數氟烷基;T為羥基或可水解之基團;R2為氫原子或具有1至22個碳原子之烷基;及n為1至3之整數。 The method for producing an article according to claim 4, wherein the fluorine-containing decane compound comprises one or more compounds of any one of the following formulas (2a) and (2b): Wherein: Rf 2 is an alkyl group having 1 to 16 carbon atoms which may or may not be substituted by one or more fluorine atoms; a, b, c and s are each independently an integer from 0 to 200, wherein the a, b The total number of c and s is at least 1, and the order of occurrence of each repeating unit in parentheses in which a subscript is a, b, c or s is not limited; d and f are independently 0 or 1; h and j, respectively Is 1 or 2; i and k are each independently an integer 2 to 20; Z is a fluorine atom or a lower fluoroalkyl group; T is a hydroxyl group or a hydrolyzable group; R 2 is a hydrogen atom or has 1 to 22 carbons An alkyl group of atoms; and n is an integer from 1 to 3. 一種物品,其包含:有機基底材料;塗覆層,其係在該有機基底材料之表面上形成者,且包含不飽和矽烷化合物與光固化有機材料之固化材料、及光觸媒;及 含氟矽烷系塗覆層,其係在該塗覆層上形成。 An article comprising: an organic base material; a coating layer formed on a surface of the organic base material, and comprising a cured material of an unsaturated decane compound and a photocurable organic material, and a photocatalyst; A fluorine-containing decane-based coating layer formed on the coating layer. 一種物品,其係由如申請專利範圍第1至6項中任一項所述之製造方法所製造者。 An article manufactured by the manufacturing method according to any one of claims 1 to 6. 如申請專利範圍第7或8項所述之物品,其中該有機基底材料為透明者。 The article of claim 7 or 8, wherein the organic base material is transparent. 如申請專利範圍第7至9項中任一項所述之物品,其中該含氟矽烷系塗覆層為防污塗覆層。 The article of any one of claims 7 to 9, wherein the fluorine-containing decane-based coating layer is an anti-fouling coating layer. 如申請專利範圍第7至10項中任一項所述之物品,其中該物品為光學組件。 The article of any one of claims 7 to 10, wherein the article is an optical component.
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