TW201336961A - Adhesive sheet with separating film - Google Patents

Adhesive sheet with separating film Download PDF

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TW201336961A
TW201336961A TW101137832A TW101137832A TW201336961A TW 201336961 A TW201336961 A TW 201336961A TW 101137832 A TW101137832 A TW 101137832A TW 101137832 A TW101137832 A TW 101137832A TW 201336961 A TW201336961 A TW 201336961A
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adhesive sheet
spacer
layer
adhesive
adhesive layer
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TW101137832A
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Chinese (zh)
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TWI561606B (en
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Katsutoshi Kamei
Shinsuke Ikishima
Takashi Habu
Fumiteru Asai
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Nitto Denko Corp
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Abstract

The invention provides an adhesive sheet with a separating film. Excellent processing is provided, after stripping of the separating film, proper adhesive force can be maintained. The adhesive sheet with the separating film is successively provided with a base layer, an adhesive layer, and a separating film, and is obtained by co-extrusion of a material forming the adhesive layer and a material forming the base layer, and attachment of at least the material forming the adhesive layer in co-extrusion to the separating film, wherein the separating film comprises a stripping agent layer, and the content ratio of poly-functional organosilicone in organosilicone contained in the stripping agent layer is greater than 10%.

Description

附隔件之黏著片 Adhesive piece with spacer

本發明係關於一種附隔件之黏著片。 The present invention relates to an adhesive sheet for a spacer.

半導體晶圓係以大直徑狀態製造,並於正面形成圖案後藉由研磨背面而使晶圓之厚度通常變薄至100 μm~600 μm左右,進而切割分離(dicing)為元件小片,進而移至安裝步驟。 The semiconductor wafer is manufactured in a large-diameter state, and after the front surface is patterned, the thickness of the wafer is usually thinned to about 100 μm to 600 μm by polishing the back surface, and then dicing into small pieces and then moved to installation steps.

於研磨半導體晶圓背面之步驟(背面研磨步驟)中,為了保護半導體晶圓之圖案面而使用黏著片。先前,作為此種黏著片,使用有於基材上塗佈有黏著劑之黏著片,例如提出有於包含聚乙烯系樹脂之基材上設置塗佈有丙烯酸系黏著劑之黏著劑層的黏著片。(例如專利文獻1)。 In the step of polishing the back surface of the semiconductor wafer (back grinding step), an adhesive sheet is used to protect the pattern surface of the semiconductor wafer. Conventionally, as such an adhesive sheet, an adhesive sheet having an adhesive coated on a substrate is used, and for example, an adhesive layer coated with an acrylic adhesive on a substrate containing a polyethylene resin is proposed. sheet. (for example, Patent Document 1).

通常,直至使用前之期間中,黏著片上配置有隔件作為黏著劑層之保護材料,而以附隔件之黏著片之形態保管。附隔件之黏著片由於可抑制異物混入黏著劑層與隔件之間,並且可獲得黏著劑層與隔件相接之面平滑之黏著片,因此研究有藉由共擠壓而形成基材層與黏著劑層,並至少使經共擠壓之黏著劑層形成材料以熔融之狀態與隔件貼合之製造方法。然而,以此種方式獲得之附隔件之黏著片有由於隔件與黏著劑層熔接而難以剝離、處理性降低之情況。又,針對此種問題,若使用輕剝離之隔件,則雖然可提高處理性,但有黏著劑層之黏著力降低之情況。如此,於至少使形成黏著劑層之材料熔融之狀態下貼合黏著片與 隔件而獲得之附隔件之黏著片中,難以兼顧良好之處理性與適度之黏著力。 Usually, the spacer is placed on the adhesive sheet as a protective material for the adhesive layer, and is stored in the form of an adhesive sheet of the spacer. The adhesive sheet with the spacer is formed by co-extrusion because it can suppress the foreign matter from being mixed between the adhesive layer and the spacer, and the adhesive sheet having the smooth contact surface of the adhesive layer and the spacer can be obtained. A method of manufacturing a layer and an adhesive layer, and at least bonding the coextruded adhesive layer forming material to the separator in a molten state. However, the adhesive sheet of the spacer obtained in this manner is difficult to peel off due to welding of the spacer and the adhesive layer, and the handleability is lowered. Further, in the case of using such a problem that the separator is lightly peeled off, the handleability can be improved, but the adhesive force of the adhesive layer may be lowered. Thus, the adhesive sheet is bonded to at least the state in which the material forming the adhesive layer is melted. In the adhesive sheet of the spacer obtained by the spacer, it is difficult to balance the rationality and the moderate adhesion.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]國際公開第2007/116856號說明書 [Patent Document 1] International Publication No. 2007/116856

本發明係為了解決上述先前之課題而成者,其目的在於提供一種具有優異之處理性,於隔件剝離後亦保持適度之黏著力的附隔件之黏著片。 The present invention has been made in order to solve the above-mentioned problems, and an object of the present invention is to provide an adhesive sheet having a spacer which is excellent in rationality and which maintains an appropriate adhesive force after the separator is peeled off.

本發明之附隔件之黏著片依序具備基材層、黏著劑層及隔件。本發明之附隔件之黏著片係將形成該黏著劑層之材料與形成該基材層之材料共擠壓、並於至少使該經共擠壓之形成黏著劑層之材料熔融之狀態下與該隔件貼合而獲得。該隔件包含剝離劑層,該剝離劑層所包含之矽酮中之多官能性矽酮之含有比率為10%以上。 The adhesive sheet of the accessory of the present invention is provided with a substrate layer, an adhesive layer and a spacer in sequence. The adhesive sheet of the spacer of the present invention is formed by coextruding a material forming the adhesive layer with a material forming the substrate layer, and melting at least the co-extruded material forming the adhesive layer. Obtained by fitting the spacer. The separator includes a release agent layer, and the content ratio of the polyfunctional fluorenone in the fluorenone contained in the release agent layer is 10% or more.

於較佳之實施形態中,上述隔件之140℃熱壓後之剝離力為4.0 N/50 mm以下。 In a preferred embodiment, the peeling force of the separator after hot pressing at 140 ° C is 4.0 N / 50 mm or less.

於較佳之實施形態中,上述黏著劑層包含聚烯烴系樹脂。 In a preferred embodiment, the adhesive layer comprises a polyolefin resin.

於較佳之實施形態中,上述聚烯烴系樹脂包含使用二茂金屬觸媒聚合而成之非晶質丙烯-(1-丁烯)共聚物。 In a preferred embodiment, the polyolefin-based resin comprises an amorphous propylene-(1-butene) copolymer polymerized using a metallocene catalyst.

於較佳之實施形態中,本發明之附隔件之黏著片係半導 體晶圓加工用。 In a preferred embodiment, the adhesive sheet of the attachment of the present invention is semi-conductive. For wafer processing.

根據本發明,可提供即便於至少使形成黏著劑層之材料熔融之狀態下貼合黏著片與隔件,亦具有優異之處理性,且於隔件剝離後亦保持適度之黏著力的附隔件之黏著片。 此種附隔件之黏著片尤其是適合作為半導體晶圓加工用黏著片。 According to the present invention, it is possible to provide a spacer which adheres to the adhesive sheet and the spacer even in a state in which at least the material forming the adhesive layer is melted, and which maintains a moderate adhesive force after the spacer is peeled off. Adhesive piece of pieces. The adhesive sheet of such a spacer is particularly suitable as an adhesive sheet for semiconductor wafer processing.

A.附隔件之黏著片之整體構成A. The overall composition of the adhesive sheet with the spacer

圖1係本發明之較佳之實施形態之附隔件之黏著片的概略剖面圖。附隔件之黏著片100依序具備基材層10、黏著劑層20及隔件30。附隔件之黏著片100中,剝離隔件30後,將基材層10與黏著劑層20用作黏著片。 BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic cross-sectional view showing an adhesive sheet of a spacer according to a preferred embodiment of the present invention. The adhesive sheet 100 with a spacer is provided with a base material layer 10, an adhesive layer 20, and a spacer 30 in this order. In the adhesive sheet 100 with a spacer, after the spacer 30 is peeled off, the base material layer 10 and the adhesive layer 20 are used as an adhesive sheet.

附隔件之黏著片100之厚度並無特別限制,可設定為任意適當之厚度。隔件剝離後之黏著片之厚度較佳為90 μm~285 μm,更佳為105 μm~225 μm,進而較佳為130 μm~210 μm。 The thickness of the adhesive sheet 100 with a spacer is not particularly limited and can be set to any appropriate thickness. The thickness of the adhesive sheet after peeling off the spacer is preferably from 90 μm to 285 μm, more preferably from 105 μm to 225 μm, and still more preferably from 130 μm to 210 μm.

黏著劑層20之厚度較佳為20 μm~100 μm,更佳為30 μm~65 μm。 The thickness of the adhesive layer 20 is preferably from 20 μm to 100 μm, more preferably from 30 μm to 65 μm.

基材層10之厚度較佳為30 μm~185 μm,更佳為65 μm~175 μm。 The thickness of the substrate layer 10 is preferably from 30 μm to 185 μm, more preferably from 65 μm to 175 μm.

隔件30之厚度並無特別限制,可設定為任意適當之厚度。隔件30之厚度例如可設定為25 μm~250 μm. The thickness of the spacer 30 is not particularly limited and can be set to any appropriate thickness. The thickness of the spacer 30 can be set, for example, from 25 μm to 250 μm.

本發明之附隔件之黏著片可於黏著片側進而具備任意適 當之其他層。作為其他層,例如可列舉設置於基材層之與黏著劑層相反側並且可賦予黏著片耐熱性之表面層。 The adhesive sheet of the accessory of the invention can be disposed on the side of the adhesive sheet As other layers. As the other layer, for example, a surface layer provided on the opposite side of the base material layer from the adhesive layer and capable of imparting heat resistance to the adhesive sheet can be cited.

本發明之附隔件之黏著片之接著指數較佳為85以上,更佳為90以上。若接著指數為此種範圍內,則充分具有黏著片所要求之黏著力,例如在用於半導體晶圓之背面研磨步驟之情形時,可於研磨加工中充分固定半導體晶圓。黏著劑層之構成成分之詳情於下文敍述。 The adhesive sheet of the spacer of the present invention preferably has an index of 85 or more, more preferably 90 or more. If the index is within such a range, the adhesive force required for the adhesive sheet is sufficiently obtained, for example, when used in the back grinding step of the semiconductor wafer, the semiconductor wafer can be sufficiently fixed in the polishing process. Details of the constituents of the adhesive layer are described below.

再者,於本說明書中,接著指數係指將使用先前所使用之隔件MRF38(三菱樹脂公司製造)的附隔件之黏著片熟化後之黏著力設為100之情形時各黏著片熟化後之黏著力。又,附隔件之黏著片之熟化後之黏著力係指將附隔件之黏著片於50℃下熟化2天後,剝離隔件,將半導體鏡面晶圓(矽製)作為試驗板,藉由依據JIS Z 0237(2000)之方法(貼合條件:2 kg輥往返一次,剝離速度:300 mm/min,剝離角度180°)測定之黏著力。 In addition, in the present specification, the index refers to the case where the adhesive sheet is aged after the adhesive sheet of the spacer of the spacer MRF38 (manufactured by Mitsubishi Plastics Co., Ltd.) which has been used previously is used, and the adhesive sheet is cured. Adhesion. Moreover, the adhesive force after curing of the adhesive sheet of the spacer means that the adhesive sheet of the spacer is cured at 50 ° C for 2 days, the separator is peeled off, and the semiconductor mirror wafer (manufactured by tantalum) is used as a test board. The adhesion was measured by the method according to JIS Z 0237 (2000) (adhesion conditions: 2 kg roller reciprocating once, peeling speed: 300 mm/min, peeling angle 180°).

B.隔件B. spacer

上述隔件具有剝離劑層,該剝離劑層所包含之矽酮中之多官能性矽酮之含有比率為10%以上。藉由使用此種隔件,可獲得即便藉由共擠壓成形而形成黏著片之黏著劑層及基材層、並於至少使形成該黏著劑層之材料熔融之狀態下貼合黏著片與隔件,隔件之剝離力亦未增加而具有優異之處理性的黏著片。又,由於在至少使形成黏著劑層之材料熔融之狀態下與隔件貼合,故而可使黏著劑層與隔件進一步密接,可抑制異物混入黏著劑層與隔件之間。 The separator has a release agent layer, and the content ratio of the polyfunctional fluorenone in the fluorenone contained in the release agent layer is 10% or more. By using such a spacer, it is possible to obtain an adhesive layer and a base material layer which are formed by co-extrusion, and to bond the adhesive sheet with at least the material forming the adhesive layer. The spacer, the peeling force of the spacer is not increased, and has an excellent adhesive sheet. Moreover, since the adhesive layer and the spacer are further adhered to each other in a state in which at least the material forming the adhesive layer is melted, the foreign matter can be prevented from entering between the adhesive layer and the spacer.

上述隔件之剝離劑層中可使用任意適當之剝離劑,剝離劑層所包含之矽酮中之多官能性矽酮之含有比率為10%以上即可。作為上述剝離劑,較佳為使用矽酮系剝離劑。剝離劑所包含之矽酮包含單官能性矽酮(具有3個有機取代基之結構單元)、二官能性矽酮(具有2個有機取代基之結構單元)、三官能性矽酮(具有1個有機取代基之結構單元)及四官能性矽酮(不具有有機取代基之結構單元)。本說明書中,多官能性矽酮係指三官能性以上之矽酮。 Any appropriate release agent may be used for the release agent layer of the separator, and the content ratio of the polyfunctional fluorenone in the fluorenone contained in the release agent layer may be 10% or more. As the release agent, an anthrone-based release agent is preferably used. The anthrone contained in the release agent comprises a monofunctional anthrone (structural unit having 3 organic substituents), a difunctional anthrone (structural unit having 2 organic substituents), and a trifunctional anthrone (having 1) a structural unit of an organic substituent) and a tetrafunctional anthrone (a structural unit having no organic substituent). In the present specification, the polyfunctional fluorenone means a trifunctional or higher fluorenone.

上述隔件之剝離劑層所包含之矽酮中之多官能性矽酮之含有比率較佳為10%~60%,更佳為15%~50%。若剝離劑層所包含之矽酮中之多官能性矽酮之含有比率為上述範圍內,則可獲得即便於至少使形成黏著劑層之材料熔融之狀態下貼合黏著片與隔件,亦具有優異之處理性、隔件剝離後亦保持適度之黏著力的附隔件之黏著片。隔件之剝離劑層所包含之矽酮中之多官能性矽酮之含有比率可使用ESCA(Electron Spectroscopy for Chemical Analysis,X射線光電子光譜分析裝置)分析隔件之剝離劑層而求得。 The content ratio of the polyfunctional fluorenone in the fluorenone contained in the release agent layer of the separator is preferably from 10% to 60%, more preferably from 15% to 50%. When the content ratio of the polyfunctional fluorenone in the fluorenone contained in the release agent layer is within the above range, it is possible to obtain the adhesive sheet and the spacer even in a state in which at least the material forming the adhesive layer is melted. An adhesive sheet having a superiority and a spacer which maintains a moderate adhesion after the separator is peeled off. The content ratio of the polyfunctional fluorenone in the fluorenone contained in the release agent layer of the separator can be determined by analyzing the release agent layer of the separator using an ESCA (Electron Spectroscopy for Chemical Analysis).

認為剝離劑層中之矽酮中之多官能性矽酮之含有比率為10%以上之情形時,多官能性矽酮阻礙二官能性矽酮與形成黏著劑層之材料(樹脂)之鍵結,發揮作為易剝離層之作用。因此,認為本發明中可抑制隔件之剝離力之增加。認為本發明之附隔件之黏著片中,多官能性矽酮雖然轉印至黏著劑層上,但由於所轉印之矽酮之量微少,故而亦可抑制黏著劑層之黏著力之降低。再者,認為本發明之效果受 矽酮各結構單元之官能性之影響較大,由矽酮具有特定之取代基所產生之效果較小。 When the content ratio of the polyfunctional fluorenone in the fluorenone in the release agent layer is 10% or more, the polyfunctional fluorenone hinders the bonding of the difunctional fluorenone with the material (resin) forming the adhesive layer. It functions as an easy peeling layer. Therefore, it is considered that the increase in the peeling force of the spacer can be suppressed in the present invention. It is considered that in the adhesive sheet of the spacer of the present invention, although the polyfunctional fluorenone is transferred onto the adhesive layer, since the amount of the fluorenone transferred is small, the adhesion of the adhesive layer can be suppressed from being lowered. . Furthermore, it is considered that the effects of the present invention are affected by The functional groups of the fluorenone have a large influence on the functionality, and the effect of the fluorenone having a specific substituent is small.

上述剝離劑層中之矽酮中之多官能性矽酮之含有比率可藉由任意適當之方法加以調整,例如可藉由使用矽酮中之多官能性矽酮之含有比率為上述範圍內之剝離劑、或於任意之剝離劑中添加包含多官能性矽酮之剝離調整劑而加以調整。 The content ratio of the polyfunctional fluorenone in the fluorenone in the release agent layer can be adjusted by any appropriate method, for example, by using the content ratio of the polyfunctional fluorenone in the fluorenone to be within the above range. The release agent or a release modifier containing a polyfunctional fluorenone is added to any release agent to adjust it.

上述剝離劑層亦可包含除上述剝離調整劑以外之任意之其他添加劑,例如可列舉抗氧化劑、紫外線吸收劑、黏度調整劑等。 The release agent layer may contain any other additives other than the above-mentioned release modifier, and examples thereof include an antioxidant, an ultraviolet absorber, and a viscosity modifier.

作為隔件之基材,可使用任意適當之基材,例如可列舉塑膠膜(例如聚對苯二甲酸乙二酯(PET,polyethylene terephthalate)、聚乙烯、聚丙烯)、不織布或紙等。 As the substrate of the separator, any appropriate substrate can be used, and examples thereof include a plastic film (for example, polyethylene terephthalate (PET), polyethylene, polypropylene), non-woven fabric, or paper.

上述隔件之基材較佳為經實施底塗處理之基材。藉由使用經實施底塗處理之基材,可獲得處理性更優異之黏著片。上述底塗處理可藉由任意適當之手段進行。具體而言,作為經底塗處理之基材,可使用經矽烷偶合劑處理之基材。 The substrate of the spacer is preferably a substrate subjected to primer treatment. By using the substrate subjected to the primer treatment, an adhesive sheet having more excellent handleability can be obtained. The above primer treatment can be carried out by any appropriate means. Specifically, as the substrate to be subjected to the primer treatment, a substrate treated with a decane coupling agent can be used.

作為隔件,可使用市售品,具體而言可較佳地使用Higashiyama Film公司製造之Clean Separator HY系列(更具體而言為HY-S30、HY-S15、HY-TS11、HY-TS15)等。 As the separator, a commercially available product can be used. Specifically, a Clean Separator HY series (more specifically, HY-S30, HY-S15, HY-TS11, HY-TS15) manufactured by Higashiyama Film Co., Ltd., or the like can be preferably used. .

上述隔件之140℃壓製後之剝離力較佳為4.0 N/50 mm以下,更佳為3.0 N/50 mm以下,進而較佳為2.0 N/50 mm以下。若隔件之140℃壓製後之剝離力為上述範圍內,則可 獲得具有優異之剝離力、隔件剝離後亦可保持適度之黏著力之黏著片。再者,於本說明書中,140℃壓製後之剝離力係指對附隔件之黏著片於140℃下進行壓製後,放置至室溫為止而測定之隔件之剝離力(剝離速度:300 mm/分鐘、剝離角度:180°)。關於140℃下之壓製條件如下所述。 The peeling force of the separator after pressing at 140 ° C is preferably 4.0 N / 50 mm or less, more preferably 3.0 N / 50 mm or less, further preferably 2.0 N / 50 mm or less. If the peeling force of the separator after pressing at 140 ° C is within the above range, An adhesive sheet having excellent peeling force and maintaining a moderate adhesive force after the separator is peeled off is obtained. Furthermore, in the present specification, the peeling force after pressing at 140 ° C refers to the peeling force of the separator measured after the adhesive sheet of the spacer is pressed at 140 ° C and placed at room temperature (peeling speed: 300) Mm/min, peeling angle: 180°). The pressing conditions at 140 ° C are as follows.

<140℃下之壓製條件> <Pressure conditions at 140 ° C>

將形成黏著片之基材之材料與形成黏著劑層之材料共擠壓,於至少使形成黏著劑層之材料熔融之狀態下與製造用隔件(三菱樹脂公司製造,MRF38,厚度為38 μm)貼合,製作附隔件之黏著片。自所獲得之黏著片剝離製造用隔件,將該黏著片之黏著劑層與試驗用隔件貼合,製作試驗用黏著片。 The material of the substrate on which the adhesive sheet is formed is co-extruded with the material forming the adhesive layer, and at least the material for forming the adhesive layer is melted and the spacer for manufacturing (Mitsubishi Resin, MRF38, thickness 38 μm) ) Fit and make the adhesive sheet with the spacer. The adhesive sheet for the adhesive sheet was peeled off from the obtained adhesive sheet, and the adhesive layer of the adhesive sheet was bonded to the test spacer to prepare a test adhesive sheet.

將獲得之試驗用黏著片以不鏽鋼板(SUS板)/樹脂片/緩衝材料/樹脂片/試驗用黏著片/樹脂片/緩衝材料/樹脂片/不鏽鋼板之順序積層後,用壓製板夾持,並使用壓製機(東洋精機公司製造,MINI TEST PRESS-10,板面面積:250 mm×250 mm),於壓製板面溫度為140℃、壓製壓力為5 MPa下保持1分鐘。 The test adhesive sheet obtained was laminated in the order of stainless steel plate (SUS plate) / resin sheet / cushioning material / resin sheet / test adhesive sheet / resin sheet / cushioning material / resin sheet / stainless steel sheet, and then sandwiched by a press plate And using a press (manufactured by Toyo Seiki Co., Ltd., MINI TEST PRESS-10, board area: 250 mm × 250 mm), and holding it for 1 minute at a press surface temperature of 140 ° C and a press pressure of 5 MPa.

再者,使用三菱樹脂公司製造之MRN38作為樹脂片(隔件),使用橡膠板(厚度:1 mm、130 mm×160 mm)作為緩衝材料。 Further, MRN38 manufactured by Mitsubishi Plastics Co., Ltd. was used as a resin sheet (separator), and a rubber sheet (thickness: 1 mm, 130 mm × 160 mm) was used as a cushioning material.

C.黏著劑層C. Adhesive layer

上述黏著劑層可由任意適當之黏著劑構成,例如可列舉 包含聚烯烴系樹脂、丙烯酸系樹脂、苯乙烯系樹脂等熱塑性樹脂之黏著劑等。該黏著劑層較佳為包含聚烯烴系樹脂,具體而言,可列舉低密度聚乙烯、超低密度聚乙烯、低結晶聚丙烯、非晶質丙烯-(1-丁烯)共聚物、離聚物樹脂、乙烯-乙酸乙烯酯共聚物、乙烯-(甲基)丙烯酸共聚物、乙烯-(甲基)丙烯酸酯-順丁烯二酸酐共聚物、乙烯-甲基丙烯酸縮水甘油酯共聚物等乙烯共聚物或聚烯烴改性聚合物等。該黏著劑層更佳為包含非晶質丙烯-(1-丁烯)共聚物。藉由組合此種黏著劑層與上述隔件製成黏著片,可獲得具有優異之處理性,且隔件剝離後亦保持適度之黏著力的附隔件之黏著片。進而,若為此種黏著劑層,則可藉由與基材層進行共擠壓成形而製造黏著片,並可以較少之步驟數且不使用有機溶劑而獲得黏著片。再者,於本說明書中,所謂「非晶質」係指不具有如結晶質般明確之熔點之性質。 The above adhesive layer may be composed of any suitable adhesive, for example, An adhesive containing a thermoplastic resin such as a polyolefin resin, an acrylic resin or a styrene resin. The pressure-sensitive adhesive layer preferably contains a polyolefin-based resin, and specific examples thereof include low-density polyethylene, ultra-low-density polyethylene, low-crystalline polypropylene, and amorphous propylene-(1-butene) copolymer. Polymer resin, ethylene-vinyl acetate copolymer, ethylene-(meth)acrylic acid copolymer, ethylene-(meth)acrylate-maleic anhydride copolymer, ethylene-glycidyl methacrylate copolymer, etc. Ethylene copolymer or polyolefin modified polymer, and the like. The adhesive layer more preferably contains an amorphous propylene-(1-butene) copolymer. By combining such an adhesive layer with the above-mentioned spacer to form an adhesive sheet, an adhesive sheet of a spacer having excellent practicability and maintaining a moderate adhesive force after the spacer is peeled off can be obtained. Further, in the case of such an adhesive layer, an adhesive sheet can be produced by co-extrusion with a base material layer, and an adhesive sheet can be obtained in a small number of steps without using an organic solvent. In the present specification, the term "amorphous" means a property which does not have a melting point as defined by crystallinity.

上述非晶質丙烯-(1-丁烯)共聚物可較佳地藉由使用二茂金屬觸媒使丙烯與1-丁烯聚合而獲得。更詳細而言,非晶質丙烯-(1-丁烯)共聚物例如可藉由進行使用二茂金屬觸媒使丙烯與1-丁烯聚合之聚合步驟,並於該聚合步驟後進行觸媒殘渣去除步驟、異物去除步驟等後續處理步驟而獲得。非晶質丙烯-(1-丁烯)共聚物經由此種步驟後,可以粉末狀、顆粒狀等形狀獲得。作為二茂金屬觸媒,例如可列舉包含二茂金屬化合物與鋁氧烷之二茂金屬均勻混合觸媒、微粒子狀載體上擔載有二茂金屬化合物之二茂金屬擔 載型觸媒等。 The above amorphous propylene-(1-butene) copolymer can be preferably obtained by polymerizing propylene with 1-butene using a metallocene catalyst. More specifically, the amorphous propylene-(1-butene) copolymer can be subjected to a polymerization step of polymerizing propylene and 1-butene using a metallocene catalyst, and a catalyst is used after the polymerization step. It is obtained by a subsequent processing step such as a residue removal step and a foreign matter removal step. The amorphous propylene-(1-butene) copolymer can be obtained in the form of a powder or a pellet after such a step. Examples of the metallocene catalyst include a homogeneous mixed catalyst containing a metallocene compound and an aluminoxane, and a metallocene supported on a fine particle carrier. Loading catalyst, etc.

如上所述使用二茂金屬觸媒聚合而成之非晶質丙烯-(1-丁烯)共聚物顯示出較窄之分子量分佈。上述非晶質丙烯-(1-丁烯)共聚物之分子量分佈(Mw/Mn)較佳為3以下,更佳為2以下,進而較佳為1.1~2,尤佳為1.2~1.9。分子量分佈較窄之非晶質丙烯-(1-丁烯)共聚物之低分子量成分少,因此若使用此種非晶質丙烯-(1-丁烯)共聚物,則可獲得能夠防止因低分子量成分滲出而導致之被黏著物之污染的附隔件之黏著片。 The amorphous propylene-(1-butene) copolymer polymerized using a metallocene catalyst as described above exhibits a narrow molecular weight distribution. The molecular weight distribution (Mw/Mn) of the amorphous propylene-(1-butene) copolymer is preferably 3 or less, more preferably 2 or less, still more preferably 1.1 to 2, and particularly preferably 1.2 to 1.9. Since the amorphous propylene-(1-butene) copolymer having a narrow molecular weight distribution has a small amount of low molecular weight components, if such an amorphous propylene-(1-butene) copolymer is used, it can be prevented from being low. An adhesive sheet of a spacer which is oozing out of a molecular weight component and contaminated by an adhesive.

上述非晶質丙烯-(1-丁烯)共聚物中之源自丙烯之結構單元之含有比率較佳為80莫耳%~99莫耳%,更佳為85莫耳%~99莫耳%,進而較佳為90莫耳%~99莫耳%。 The content ratio of the structural unit derived from propylene in the amorphous propylene-(1-butene) copolymer is preferably from 80 mol% to 99 mol%, more preferably from 85 mol% to 99 mol%. Further preferably, it is 90% by mole to 99% by mole.

上述非晶質丙烯-(1-丁烯)共聚物中之源自1-丁烯之結構單元之含有比率較佳為1莫耳%~15莫耳%,更佳為1莫耳%~10莫耳%。若為此種範圍內,則可獲得韌性與柔軟性之平衡優異之附隔件之黏著片。 The content ratio of the structural unit derived from 1-butene in the amorphous propylene-(1-butene) copolymer is preferably from 1 mol% to 15 mol%, more preferably from 1 mol% to 10 Moer%. If it is in this range, the adhesive sheet of the attachment which is excellent in the balance of toughness and softness is acquired.

上述非晶質丙烯-(1-丁烯)共聚物可為嵌段共聚物,亦可為無規共聚物。 The above amorphous propylene-(1-butene) copolymer may be a block copolymer or a random copolymer.

上述非晶質丙烯-(1-丁烯)共聚物之重量平均分子量(Mw)較佳為200,000以上,更佳為200,000~500,000,進而較佳為200,000~300,000。若非晶質丙烯-(1-丁烯)共聚物之重量均分子量(Mw)為此種範圍內,則可獲得與通常之苯乙烯系熱塑性樹脂、丙烯酸系熱塑性樹脂(Mw為100,000以下)相比低分子量成分較少、可防止被黏著物之污染之黏著片。 又,共擠壓成形時,可無加工不良地形成之黏著劑層,並且可獲得適度之黏著力。 The weight average molecular weight (Mw) of the amorphous propylene-(1-butene) copolymer is preferably 200,000 or more, more preferably 200,000 to 500,000, still more preferably 200,000 to 300,000. When the weight average molecular weight (Mw) of the amorphous propylene-(1-butene) copolymer is within such a range, it can be obtained as compared with a usual styrene-based thermoplastic resin or acrylic thermoplastic resin (Mw is 100,000 or less). An adhesive sheet having a low molecular weight component and preventing contamination by adherends. Further, at the time of co-extrusion molding, the adhesive layer formed without processing can be obtained, and a moderate adhesive force can be obtained.

上述非晶質丙烯-(1-丁烯)共聚物之230℃、2.16 kgf下之熔融流動速率較佳為1 g/10 min~50 g/10 min,更佳為5 g/10 min~30 g/10 min,進而較佳為5 g/10 min~20 g/10 min。若非晶質丙烯-(1-丁烯)共聚物之熔融流動速率為此種範圍內,則可藉由共擠壓成形而無加工不良地形成厚度均勻之黏著劑層。熔融流動速率可藉由依據JIS K 7210之方法測定。 The melt flow rate of the amorphous propylene-(1-butene) copolymer at 230 ° C and 2.16 kgf is preferably from 1 g/10 min to 50 g/10 min, more preferably from 5 g/10 min to 30 g/10 min, further preferably 5 g/10 min to 20 g/10 min. When the melt flow rate of the amorphous propylene-(1-butene) copolymer is within such a range, an adhesive layer having a uniform thickness can be formed by co-extrusion without processing. The melt flow rate can be determined by a method in accordance with JIS K 7210.

上述非晶質丙烯-(1-丁烯)共聚物亦可於無損本發明之效果之範圍內進而包含源自其他單體之結構單元。作為其他單體,例如可以列舉乙烯、1-戊烯、1-己烯、1-辛烯、1-癸烯、4-甲基-1-戊烯、3-甲基-1-戊烯等α-烯烴等。 The above amorphous propylene-(1-butene) copolymer may further contain structural units derived from other monomers within the range which does not impair the effects of the present invention. Examples of the other monomer include ethylene, 1-pentene, 1-hexene, 1-octene, 1-decene, 4-methyl-1-pentene, 3-methyl-1-pentene, and the like. Α-olefins and the like.

較佳為上述黏著劑層實質上不含F-、Cl-、Br-、NO2 -、NO3 -、SO4 2-、Li+、Na+、K+、Mg2+、Ca2+、NH4 +。其原因在於可防止由該離子污染被黏著物。於將具備此種黏著劑層之黏著片例如用於半導體晶圓加工用之情形時,不會產生電路之斷線或短路等。不含上述離子之黏著劑層例如可藉由如上所述使用二茂金屬觸媒溶液聚合出該黏著劑層所包含之非晶質丙烯-(1-丁烯)共聚物而獲得。於該使用二茂金屬觸媒之溶液聚合中,非晶質丙烯-(1-丁烯)共聚物可使用與聚合溶劑不同之不良溶劑反覆進行析出單離(再沈澱法)而純化,因此可獲得不含上述離子之黏著劑層。再者,於本說明書中,所謂「實質上不含F-、Cl-、Br-、 NO2 -、NO3 -、SO4 2-、Li+、Na+、K+、Mg2+、Ca2+、NH4 +」係指於標準之離子層析分析(例如使用Dionex公司製造之商品名「DX-320」、「DX-500」之離子層析分析)中未達檢測極限。具體而言,係指相對於1 g黏著劑層,F-、Cl-、Br-、NO2 -、NO3 -、SO4 2-及K+分別為0.49 μg以下,Li+及Na+分別為0.20 μg以下,Mg2+及Ca2+分別為0.97 μg以下,NH4 +為0.5 μg以下之情況。 Preferably, the adhesive layer contains substantially no F - , Cl - , Br - , NO 2 - , NO 3 - , SO 4 2- , Li + , Na + , K + , Mg 2+ , Ca 2+ , NH 4 + . The reason for this is that contamination of the adherend by the ions can be prevented. When an adhesive sheet having such an adhesive layer is used for, for example, semiconductor wafer processing, disconnection or short circuit of the circuit does not occur. The adhesive layer containing no such ions can be obtained, for example, by polymerizing an amorphous propylene-(1-butene) copolymer contained in the adhesive layer using a metallocene catalyst solution as described above. In the solution polymerization using the metallocene catalyst, the amorphous propylene-(1-butene) copolymer can be purified by using a poor solvent different from the polymerization solvent to carry out precipitation separation (reprecipitation). An adhesive layer containing no such ions is obtained. In addition, in the present specification, "substantially free of F - , Cl - , Br - , NO 2 - , NO 3 - , SO 4 2- , Li + , Na + , K + , Mg 2+ , Ca 2+ , NH 4 + " means that the detection limit is not reached in standard ion chromatography analysis (for example, ion chromatography analysis using the trade name "DX-320" manufactured by Dionex Corporation, "DX-500"). Specifically, it means that F - , Cl - , Br - , NO 2 - , NO 3 - , SO 4 2- and K + are respectively 0.49 μg or less with respect to 1 g of the adhesive layer, respectively, and Li + and Na + are respectively It is 0.20 μg or less, and Mg 2+ and Ca 2+ are respectively 0.97 μg or less, and NH 4 + is 0.5 μg or less.

上述黏著劑層之儲存模數(G')較佳為0.5×106 Pa~1.0×108 Pa,更佳為0.8×106 Pa~3.0×107 Pa。若上述黏著劑層之儲存模數(G')為此種範圍內,則可獲得具有優異之處理性、於隔件剝離後亦保持適度之黏著力的附隔件之黏著片。又,若儲存模數(G')為此種範圍內,則可獲得能夠兼具對表面具有凹凸之被黏著物充分之黏著力及適度之剝離性的黏著片。又,於將具備此種儲存模數(G')之上述黏著劑層之黏著片用於半導體晶圓加工用之情形時,可有助於在晶圓之背面研磨時達成優異之研磨精度。再者,本發明中之儲存模數(G')可藉由動態黏彈性圖譜測定而測定。 The storage modulus (G') of the above adhesive layer is preferably from 0.5 × 10 6 Pa to 1.0 × 10 8 Pa, more preferably from 0.8 × 10 6 Pa to 3.0 × 10 7 Pa. If the storage modulus (G') of the above-mentioned adhesive layer is within such a range, an adhesive sheet having a spacer which is excellent in rationality and which maintains a moderate adhesive force after peeling of the spacer can be obtained. Further, when the storage modulus (G') is within such a range, an adhesive sheet which can have sufficient adhesion to the adherend having irregularities on the surface and moderate peelability can be obtained. Moreover, when the adhesive sheet having the above-described adhesive layer having the storage modulus (G') is used for semiconductor wafer processing, it is possible to contribute to excellent polishing precision when polishing the back surface of the wafer. Furthermore, the storage modulus (G') in the present invention can be determined by dynamic viscoelasticity mapping.

為了提供具有優異之處理性、於隔件剝離後亦保持適度之黏著力的附隔件之黏著片,上述黏著劑層亦可進而包含結晶性聚丙烯系樹脂。結晶性聚丙烯系樹脂之含有比率可根據所需之黏著力及上述儲存模數而設定為任意適當之比率。結晶性聚丙烯系樹脂之含有比率較佳為相對於上述非晶質丙烯-(1-丁烯)共聚物與該結晶性聚丙烯系樹脂之合計重量,較佳為0重量%-50重量%,更佳為0重量%-40重量 %,進而較佳為0重量%~30重量%。 In order to provide an adhesive sheet having a superiority and a spacer which maintains a moderate adhesive force after the separator is peeled off, the adhesive layer may further contain a crystalline polypropylene resin. The content ratio of the crystalline polypropylene-based resin can be set to any appropriate ratio depending on the desired adhesive force and the above-mentioned storage modulus. The content ratio of the crystalline polypropylene-based resin is preferably from 0% by weight to 50% by weight based on the total weight of the amorphous propylene-(1-butene) copolymer and the crystalline polypropylene-based resin. More preferably 0% by weight to 40% by weight %, further preferably 0% by weight to 30% by weight.

上述結晶性聚丙烯系樹脂可為均聚丙烯,亦可為由丙烯及可與丙烯共聚之單體獲得之共聚物。作為可與丙烯共聚之單體,例如可列舉乙烯、1-戊烯、1-己烯、1-辛烯、1-癸烯、4-甲基-1-戊烯、3-甲基-1-戊烯等α-烯烴等。 The crystalline polypropylene-based resin may be a homopolypropylene or a copolymer obtained from propylene and a monomer copolymerizable with propylene. Examples of the monomer copolymerizable with propylene include ethylene, 1-pentene, 1-hexene, 1-octene, 1-decene, 4-methyl-1-pentene, and 3-methyl-1. - an α-olefin such as pentene or the like.

上述結晶性聚丙烯系樹脂較佳為與上述非晶質丙烯-(1-丁烯)共聚物同樣可藉由使用二茂金屬觸媒聚合而獲得。若使用以上述方式獲得之結晶性聚丙烯系樹脂,則可防止因低分子量成分之滲出所導致之被黏著物之污染。 The crystalline polypropylene-based resin is preferably obtained by polymerization using a metallocene catalyst similarly to the above amorphous propylene-(1-butene) copolymer. When the crystalline polypropylene-based resin obtained in the above manner is used, contamination of the adherend due to bleeding of the low molecular weight component can be prevented.

上述結晶性聚丙烯系樹脂之結晶度較佳為10%以上,更佳為20%以上。結晶度代表性而言可藉由差示掃描量熱分析(DSC,Differential Scanning Calorimetry)或X射線繞射而求出。 The crystallinity of the crystalline polypropylene-based resin is preferably 10% or more, and more preferably 20% or more. The degree of crystallinity can be determined by differential scanning calorimetry (DSC, differential scanning calorimetry) or X-ray diffraction.

上述黏著劑層可於無損本發明之效果之範圍內進而包含其他成分。作為該其他成分,例如可以列舉抗氧化劑、紫外線吸收劑、光穩定劑、耐熱穩定劑、抗靜電劑等。其他成分之種類及使用量可以根據目的適當選擇。 The above-mentioned adhesive layer may further contain other components within the range which does not impair the effects of the present invention. Examples of the other component include an antioxidant, an ultraviolet absorber, a light stabilizer, a heat stabilizer, an antistatic agent, and the like. The types and amounts of other ingredients may be appropriately selected depending on the purpose.

D.基材層D. substrate layer

上述基材層可使用任意適當之材料構成,例如可列舉聚酯(聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯、聚對苯二甲酸丁二酯、聚萘二甲酸丁二酯等)、聚烯烴(聚乙烯、聚丙烯、乙烯-丙烯共聚物等)、聚乙烯醇、聚偏二氯乙烯、聚氯乙烯、氯乙烯-乙酸乙烯酯共聚物、乙烯-乙酸乙烯酯共聚物、聚乙酸乙烯酯、聚醯胺、聚醯亞胺、纖維素類、 氟系樹脂、聚醚、聚苯乙烯系樹脂(聚苯乙烯等)、聚碳酸酯、聚醚碸等。上述基材層較佳為包含乙烯-乙酸乙烯酯共聚物。 The base material layer may be formed of any suitable material, and examples thereof include polyester (polyethylene terephthalate, polyethylene naphthalate, polybutylene terephthalate, and polybutylene naphthalate). Ester, etc., polyolefin (polyethylene, polypropylene, ethylene-propylene copolymer, etc.), polyvinyl alcohol, polyvinylidene chloride, polyvinyl chloride, vinyl chloride-vinyl acetate copolymer, ethylene-vinyl acetate copolymerization , polyvinyl acetate, polyamine, polyimine, cellulose, A fluorine resin, a polyether, a polystyrene resin (polystyrene or the like), a polycarbonate, a polyether oxime or the like. The base material layer preferably contains an ethylene-vinyl acetate copolymer.

上述乙烯-乙酸乙烯酯共聚物之重量平均分子量(Mw)較佳為10,000~200,000,更佳為30,000~190,000。若乙烯-乙酸乙烯酯共聚物之重量平均分子量(Mw)為此種範圍內,則可於共擠壓成形時無加工不良地形成基材層。 The weight average molecular weight (Mw) of the above ethylene-vinyl acetate copolymer is preferably from 10,000 to 200,000, more preferably from 30,000 to 190,000. When the weight average molecular weight (Mw) of the ethylene-vinyl acetate copolymer is within such a range, the base material layer can be formed without processing at the time of co-extrusion molding.

上述乙烯-乙酸乙烯酯共聚物之190℃、2.16 kgf下之熔融流動速率較佳為2 g/10 min~20 g/10 min,更佳為5 g/10 min~15 g/10 min,進而較佳為7 g/10 min~12 g/10 min。若乙烯-乙酸乙烯酯共聚物之熔融流動速率為此種範圍內,則可藉由共擠壓成形而無加工不良地形成基材層。 The melt flow rate of the above ethylene-vinyl acetate copolymer at 190 ° C and 2.16 kgf is preferably 2 g/10 min to 20 g/10 min, more preferably 5 g/10 min to 15 g/10 min, and further It is preferably 7 g/10 min to 12 g/10 min. When the melt flow rate of the ethylene-vinyl acetate copolymer is within such a range, the base material layer can be formed by co-extrusion without processing.

上述基材層可於無損本發明之效果之範圍內進而包含其他成分。作為該其他成分,例如可使用與上述C項所說明之可包含於黏著劑層中之其他成分相同之成分。 The base material layer may further contain other components within the range which does not impair the effects of the present invention. As the other component, for example, the same components as those of the other components which can be included in the adhesive layer described in the above item C can be used.

E.其他層E. Other layers

作為本發明之附隔件之黏著片所包含之其他層,例如可列舉可賦予黏著片耐熱性之表面層。藉由具有該表面層,亦可較佳地用作供於加熱步驟之半導體晶圓加工用黏著片。該表面層可使用具有耐熱性之任意適當之樹脂,較佳為包含聚丙烯系樹脂。上述聚丙烯系樹脂較佳為藉由使用二茂金屬觸媒之聚合而獲得。更詳細而言,聚丙烯系樹脂例如可藉由進行使用二茂金屬觸媒使包含丙烯之單體組合物聚合之聚合步驟,並於該聚合步驟後進行觸媒殘渣去除 步驟、異物去除步驟等後續處理步驟而獲得。聚丙烯系樹脂經由此種步驟後,可以例如粉末狀、顆粒狀等形狀而獲得。作為二茂金屬觸媒,例如可列舉上述C項中例示者。 Examples of the other layer included in the adhesive sheet of the spacer of the present invention include a surface layer which can impart heat resistance to the adhesive sheet. By having this surface layer, it can also be preferably used as an adhesive sheet for semiconductor wafer processing for the heating step. As the surface layer, any suitable resin having heat resistance can be used, and a polypropylene resin is preferable. The above polypropylene-based resin is preferably obtained by polymerization using a metallocene catalyst. More specifically, the polypropylene-based resin can be subjected to a polymerization step in which a monomer composition containing propylene is polymerized by using a metallocene catalyst, and catalyst residue removal is carried out after the polymerization step. Obtained by a subsequent processing step such as a step, a foreign matter removing step, and the like. After the polypropylene resin is subjected to such a step, it can be obtained, for example, in the form of a powder or a pellet. Examples of the metallocene catalyst include those exemplified in the above item C.

以上述方式使用二茂金屬觸媒聚合而成之聚丙烯系樹脂顯示出較窄之分子量分佈。具體而言,上述聚丙烯系樹脂之分子量分佈(Mw/Mn)較佳為3以下,更佳為1.1~3,進而較佳為1.2~2.9。分子量分佈較窄之聚丙烯系樹脂之低分子量成分較少,因此若使用此種聚丙烯系樹脂,則可防止低分子量成分之滲出,獲得清潔性優異之黏著片。此種黏著片例如可較佳地用作半導體晶圓加工用。 The polypropylene-based resin polymerized using the metallocene catalyst in the above manner exhibits a narrow molecular weight distribution. Specifically, the molecular weight distribution (Mw/Mn) of the polypropylene resin is preferably 3 or less, more preferably 1.1 to 3, still more preferably 1.2 to 2.9. Since the polypropylene resin having a narrow molecular weight distribution has a small amount of a low molecular weight component, when such a polypropylene resin is used, it is possible to prevent bleeding of a low molecular weight component and obtain an adhesive sheet excellent in cleanability. Such an adhesive sheet can be preferably used, for example, for semiconductor wafer processing.

上述聚丙烯系樹脂之重量平均分子量(Mw)較佳為50,000以上,更佳為50,000~500,000,進而較佳為50,000~400,000。若聚丙烯系樹脂之重量平均分子量(Mw)為此種範圍內,則可防止低分子量成分之滲出,獲得清潔性優異之黏著片。此種黏著片例如可較佳地用作半導體晶圓加工用之黏著片。 The weight average molecular weight (Mw) of the polypropylene resin is preferably 50,000 or more, more preferably 50,000 to 500,000, still more preferably 50,000 to 400,000. When the weight average molecular weight (Mw) of the polypropylene resin is within such a range, bleeding of the low molecular weight component can be prevented, and an adhesive sheet excellent in cleanability can be obtained. Such an adhesive sheet can be preferably used, for example, as an adhesive sheet for semiconductor wafer processing.

上述聚丙烯系樹脂亦可於無損本發明之效果之範圍內進而包含源自其他單體之結構單元。作為其他單體,例如可列舉乙烯、1-戊烯、1-己烯、1-辛烯、1-癸烯、4-甲基-1-戊烯、3-甲基-1-戊烯等α-烯烴等。於包含源自其他單體之結構單元之情形時,可為嵌段共聚物,亦可為無規共聚物。 The above-mentioned polypropylene-based resin may further contain a structural unit derived from another monomer within the range which does not impair the effects of the present invention. Examples of the other monomer include ethylene, 1-pentene, 1-hexene, 1-octene, 1-decene, 4-methyl-1-pentene, 3-methyl-1-pentene, and the like. Α-olefins and the like. In the case of including a structural unit derived from another monomer, it may be a block copolymer or a random copolymer.

上述聚丙烯系樹脂可使用市售品。作為市售品之聚丙烯系樹脂之具體例,可列舉Japan Polypropylene公司製造之 商品名為「WINTEC」、「WELNEX」系列等。 A commercially available product can be used for the above polypropylene resin. Specific examples of the polypropylene-based resin which is commercially available are exemplified by Japan Polypropylene Co., Ltd. The product names are "WINTEC" and "WELNEX" series.

上述表面層可於無損本發明之範圍內進而包含其他成分。作為該其他成分,可列舉與上述C項中例示之其他成分相同者。其他成分之種類及使用量可根據目的適當選擇。 The above surface layer may contain other components without departing from the scope of the invention. The other components may be the same as the other components exemplified in the above item C. The types and amounts of other ingredients may be appropriately selected depending on the purpose.

F.附隔件之黏著片之製造方法F. Method for manufacturing adhesive sheet with spacer

本發明之附隔件之黏著片之製造方法包含以下步驟:將形成上述黏著劑層之材料與形成上述基材層之材料共擠壓之步驟,以及於至少使該經共擠壓之形成黏著劑層之材料熔融之狀態下貼合黏著片與上述隔件之步驟。藉由共擠壓成形,可以較少之步驟數且不使用有機溶劑而製造層間接著性良好之黏著片。進而,藉由於至少使經共擠壓之形成黏著劑層之材料熔融之狀態下貼合黏著片與隔件,可抑制異物混入黏著劑層中,並且使黏著劑層與隔件相接之面平滑。 The method for manufacturing an adhesive sheet for a spacer of the present invention comprises the steps of: coextruding a material forming the above adhesive layer with a material forming the substrate layer, and at least causing the co-extruded to form an adhesive The step of bonding the adhesive sheet and the above-mentioned spacer in a state in which the material of the layer is melted. By co-extrusion molding, an adhesive sheet having good interlayer adhesion can be produced with a small number of steps and without using an organic solvent. Further, by adhering the adhesive sheet and the spacer in a state in which at least the co-extruded material forming the adhesive layer is melted, it is possible to suppress foreign matter from being mixed into the adhesive layer, and the adhesive layer is in contact with the spacer. smooth.

上述共擠壓成形中,形成上述黏著劑層及上述基材層之材料可使用以任意適當之方法混合上述各層之成分而成之材料。 In the co-extrusion molding, a material obtained by mixing the components of the respective layers by any appropriate method may be used as the material for forming the pressure-sensitive adhesive layer and the base material layer.

作為上述共擠壓成形之具體方法,例如可以列舉出如下方法:分別將形成黏著劑層之材料供給至連接於模具之至少2台擠壓機中之1台,將形成基材層之材料供給至另1台,並熔融後擠壓,於至少使形成黏著劑層之材料熔融之狀態下與隔件接觸,利用接觸輥成形法取出,成形積層體。於黏著片進而具有可賦予耐熱性之表面層之情形時, 可藉由進而追加擠壓機,並自該擠壓機供給形成表面層之材料而成形積層體。擠壓時,各形成材料合流之部分越接近模具出口(模唇)越佳。其原因在不易於模具內產生各形成材料之合流不良。因此,作為上述模具,較佳為使用多歧管形式之模具。再者,於產生合流不良之情形時,會產生合流不均等外觀不良,具體而言會於經擠壓之黏著劑層與基材層之間產生波狀之外觀不均,故不佳。又,合流不良係由於例如不同種類之形成材料於模具內之流動性(熔融黏度)之差較大、及各層之形成材料之剪切速度之差較大而產生,故而若使用多歧管形式之模具,則與其他形式(例如進料模組形式)相比,對於有流動性差之不同種類之形成材料,材料選擇之範圍擴大。用於各形成材料之熔融之擠壓機之螺桿類型可為單軸或雙軸。擠壓機亦可為3台以上。又,於使用3台以上之擠壓機製造雙層結構(基材層+黏著劑層)之黏著片之情形時,只要將同一形成材料供給至相鄰之2台以上之擠壓機即可,例如,於使用3台擠壓機之情形時,可將同一形成材料供給至相鄰之2台擠壓機。 Specific examples of the co-extrusion molding include a method of supplying a material for forming an adhesive layer to at least one of at least two extruders connected to a mold, and supplying a material for forming a substrate layer. The other layer is melted and extruded, and at least the material forming the pressure-sensitive adhesive layer is melted in contact with the separator, and taken out by a contact roll forming method to form a laminate. When the adhesive sheet further has a surface layer capable of imparting heat resistance, The laminate can be formed by further adding an extruder and supplying a material forming the surface layer from the extruder. When squeezing, the closer the portion where the forming materials are joined, the closer to the die exit (mould lip). The reason for this is that it is not easy to cause a poor joining of the respective forming materials in the mold. Therefore, as the above mold, it is preferable to use a mold in the form of a multi-manifold. Further, in the case where the merging failure occurs, an appearance defect such as merging unevenness occurs, and specifically, a wavy appearance unevenness is generated between the extruded adhesive layer and the substrate layer, which is not preferable. Further, the merging failure is caused by, for example, a large difference in fluidity (melt viscosity) between the different types of forming materials in the mold, and a large difference in the shear rate of the material forming the layers, so that a multi-manifold form is used. The mold is expanded in scope for different types of forming materials having poor fluidity compared to other forms (for example, in the form of a feed module). The type of screw used for the melt of each of the formed materials may be uniaxial or biaxial. There are also more than 3 extruders. Further, when an adhesive sheet having a two-layer structure (base material layer + adhesive layer) is produced by using three or more extruders, the same forming material can be supplied to two or more adjacent extruders. For example, in the case of using three extruders, the same forming material can be supplied to two adjacent extruders.

可藉由利用任意適當之機構使經共擠壓之形成基材層之材料與形成黏著劑層之材料接觸隔件而進行貼合。作為該接觸機構,例如可列舉接觸輥等。 The bonding can be carried out by contacting the coextruded material forming the substrate layer with the material forming the adhesive layer by means of any suitable mechanism. As the contact mechanism, for example, a contact roller or the like can be mentioned.

上述共擠壓成形中之成形溫度較佳為160℃~220℃,更佳為170℃~200℃。若為此種範圍內,則可使擠壓後之黏著劑層形成材料為熔融狀態,可抑制向獲得之黏著片之黏著劑層中混入異物,並且使黏著劑層與隔件接觸之面平 滑。又,若為此種範圍內,則成形穩定性優異。 The forming temperature in the above co-extrusion molding is preferably from 160 ° C to 220 ° C, more preferably from 170 ° C to 200 ° C. If it is in this range, the adhesive layer forming material after extrusion can be in a molten state, and it is possible to suppress the foreign matter from being mixed into the adhesive layer of the obtained adhesive sheet, and to make the surface of the adhesive layer in contact with the spacer flat. slip. Moreover, when it is such a range, it is excellent in shaping|molding stability.

形成上述黏著劑層之材料與形成上述基材層之材料於溫度180℃、剪切速度100 sec-1時之剪切黏度之差(形成黏著劑層之材料-形成基材層之材料)較佳為-150 Pa‧s~600 Pa‧s,更佳為-100 Pa‧s~550 Pa‧s,進而較佳為-50 Pa‧s~500 Pa‧s。若為此種範圍內,則上述形成黏著劑層之材料及形成基材層之材料於模具內之流動性相近,可防止合流不良之產生。再者,剪切黏度可使用雙毛細管(twin capillary)型之伸長黏度計測定。 The difference between the material forming the adhesive layer and the material forming the substrate layer at a temperature of 180 ° C and a shear rate of 100 sec -1 (the material forming the adhesive layer - the material forming the substrate layer) Preferably, it is -150 Pa‧s~600 Pa‧s, more preferably -100 Pa‧s~550 Pa‧s, and further preferably -50 Pa‧s~500 Pa‧s. If it is in such a range, the material which forms the adhesive layer and the material which forms the base material layer are similar in fluidity in a mold, and can prevent the occurrence of a merge defect. Further, the shear viscosity can be measured using a twin capillary type elongational viscometer.

[實施例] [Examples]

以下,藉由實施例具體說明本發明,但本發明不受該等實施例任何限定。再者,實施例等中之試驗及評價方法如以下所述。又,份意指重量份。 Hereinafter, the present invention will be specifically described by way of examples, but the present invention is not limited by the examples. Further, the test and evaluation methods in the examples and the like are as follows. Also, parts mean parts by weight.

[實施例1] [Example 1]

作為形成可賦予耐熱性之表面層之材料,使用藉由二茂金屬觸媒聚合而成之聚丙烯系樹脂(Japan Polypropylene公司製造,商品名「WELNEX:RFGV4A」;熔點為130℃,軟化點為120℃,Mw/Mn=2.9)。 As a material for forming a surface layer capable of imparting heat resistance, a polypropylene resin obtained by polymerizing a metallocene catalyst (manufactured by Japan Polypropylene Co., Ltd., trade name "WELNEX: RFGV4A"; melting point: 130 ° C, softening point is used. 120 ° C, Mw / Mn = 2.9).

作為形成基材層之材料,使用乙烯-乙酸乙烯酯共聚物(DU PONT-MITSUI公司製造,商品名「EVAFLEX P-1007」)。 As a material for forming the base material layer, an ethylene-vinyl acetate copolymer (manufactured by DU PONT-MITSUI Co., Ltd., trade name "EVAFLEX P-1007") was used.

作為形成黏著劑層之材料,使用藉由二茂金屬觸媒聚合而成之非晶質丙烯-(1-丁烯)共聚物(住友化學公司製造,商品名「Tafthren H5002」,源自丙烯之結構單元為90莫耳 %/源自1-丁烯之結構單元為10莫耳%,Mw=230,000,Mw/Mn=1.8)。 As a material for forming the adhesive layer, an amorphous propylene-(1-butene) copolymer polymerized by a metallocene catalyst (manufactured by Sumitomo Chemical Co., Ltd., trade name "Tafthren H5002", derived from propylene is used. The structural unit is 90 m %/ structural unit derived from 1-butene is 10 mol%, Mw = 230,000, Mw/Mn = 1.8).

將100份上述形成表面層之材料,100份上述形成基材層之材料以及100份上述形成黏著劑層之材料投入各擠壓機,進行T模熔融共擠壓(模具溫度:180℃)。藉由接觸輥將隔件1(Higashiyama Film公司製造,HY-S30,厚度38 μm)贴合於自模具共擠壓之表面層/基材層/黏著劑層之積層體之黏著劑層,獲得表面層(厚度30 μm)/基材層(厚度130 μm)/黏著劑層(厚度45 μm)/隔件之附隔件之黏著片。再者,表面層、基材層及黏著劑層之厚度係藉由T模出口之形狀而控制。 100 parts of the material for forming the surface layer, 100 parts of the material for forming the substrate layer, and 100 parts of the above-mentioned material for forming the adhesive layer were placed in each extruder to perform T-die melt co-extrusion (mold temperature: 180 ° C). The spacer 1 (manufactured by Higashiyama Film Co., Ltd., HY-S30, thickness: 38 μm) was attached to the adhesive layer of the laminate of the surface layer/substrate layer/adhesive layer which was co-extruded from the mold by a contact roll. Adhesive sheet of surface layer (thickness 30 μm) / substrate layer (thickness 130 μm) / adhesive layer (thickness 45 μm) / spacer spacer. Furthermore, the thickness of the surface layer, the substrate layer and the adhesive layer is controlled by the shape of the T-die outlet.

[實施例2] [Embodiment 2]

使用隔件2(Higashiyama Film公司製造,HY-TS11,厚度75 μm)代替隔件1,除此之外,以與實施例1相同之方式獲得附隔件之黏著片。 An adhesive sheet of a spacer was obtained in the same manner as in Example 1 except that the spacer 2 (manufactured by Higashiyama Film Co., Ltd., HY-TS11, thickness: 75 μm) was used instead of the spacer 1.

[實施例3] [Example 3]

使用隔件3(Higashiyama Film公司製造,HY-TS15,厚度75 μm)代替隔件1,除此之外,以與實施例1相同之方式獲得附隔件之黏著片。 An adhesive sheet of a spacer was obtained in the same manner as in Example 1 except that the spacer 3 (manufactured by Higashiyama Film Co., Ltd., HY-TS15, thickness: 75 μm) was used instead of the spacer 1.

(比較例1) (Comparative Example 1)

使用隔件C1(三菱樹脂公司製造,MRF38,厚度38 μm)代替隔件1,除此之外,以與實施例1相同之方式獲得附隔件之黏著片。 An adhesive sheet of a spacer was obtained in the same manner as in Example 1 except that the spacer C1 (manufactured by Mitsubishi Plastics Co., Ltd., MRF38, thickness: 38 μm) was used instead of the spacer 1.

(比較例2) (Comparative Example 2)

使用隔件C2(三菱樹脂公司製造,MRE38,厚度38 μm)代替隔件1,除此之外,以與實施例1相同之方式獲得附隔件之黏著片。 An adhesive sheet of a spacer was obtained in the same manner as in Example 1 except that the spacer C2 (manufactured by Mitsubishi Plastics Co., Ltd., MRE 38, thickness: 38 μm) was used instead of the spacer 1.

(比較例3) (Comparative Example 3)

使用隔件C3(三菱樹脂公司製造,MRN38,厚度38 μm)代替隔件1,除此之外,以與實施例1相同之方式獲得附隔件之黏著片。 An adhesive sheet of a spacer was obtained in the same manner as in Example 1 except that the spacer C3 (manufactured by Mitsubishi Plastics Co., Ltd., MRN 38, thickness: 38 μm) was used instead of the spacer 1.

[隔件之評價] [Evaluation of the partition]

測定實施例1~3及比較例1中所使用之隔件1~3及C1之剝離劑層中之矽酮之含量。又,以如下方法評價實施例1~3及比較例1~3之附隔件之黏著片之140℃壓製後之剝離力。 The content of the fluorenone in the release agent layers of the separators 1 to 3 and C1 used in Examples 1 to 3 and Comparative Example 1 was measured. Further, the peeling force after pressing at 140 ° C of the adhesive sheets of the spacers of Examples 1 to 3 and Comparative Examples 1 to 3 was evaluated by the following method.

(1)剝離劑層之矽酮含量 (1) Anthrone content of the release agent layer

利用ESCA(X射線光電子光譜分析裝置)分析各隔件之剝離劑層,測定剝離劑層中之矽酮含量、二官能性矽酮及多官能性矽酮(三官能性以上之矽酮)佔剝離劑層中之矽酮之含有比率。根據測定之矽酮含量及多官能性矽酮之含有比率算出剝離劑層中之多官能性矽酮含量。將剝離劑層中之矽酮含量、多官能性矽酮含量、二官能性矽酮及多官能性矽酮之含有比率示於表1。 The release agent layer of each spacer was analyzed by ESCA (X-ray photoelectron spectroscopy apparatus), and the content of anthrone in the release agent layer, difunctional fluorenone, and polyfunctional fluorenone (trione of trifunctional or higher) were measured. The content ratio of anthrone in the release agent layer. The polyfunctional fluorenone content in the release agent layer was calculated from the measured fluorenone content and the content ratio of the polyfunctional fluorenone. The content of anthrone in the release agent layer, the content of the polyfunctional fluorenone, the content of the difunctional fluorenone, and the polyfunctional fluorenone are shown in Table 1.

(2)140℃熱壓後之剝離試驗 (2) Peel test after hot pressing at 140 °C

自比較例1所獲得之黏著片剝離隔件C1,並將該黏著片之黏著劑層與隔件1~3或隔件C1~C3貼合,製作140℃熱壓後之剝離力試驗用黏著片。 The adhesive sheet obtained from Comparative Example 1 was peeled off from the spacer C1, and the adhesive layer of the adhesive sheet was bonded to the spacers 1 to 3 or the spacers C1 to C3 to prepare a peeling force test for bonding at 140 ° C. sheet.

將獲得之試驗用黏著片以不鏽鋼板(SUS板)/樹脂片/緩衝 材料/樹脂片/評價用黏著片/樹脂片/緩衝材料/樹脂片/不鏽鋼板之順序積層後,利用壓製板夾持,並使用壓製機(東洋精機公司製造,MINI TEST PRESS-10,板面面積:250 mm×250 mm)進行壓製。使用三菱樹脂公司製造之MRN38作為樹脂片(隔件),使用橡膠板(厚度:1 mm,130 mm×160 mm)作為緩衝材料。將試驗用黏著片於壓製板面溫度140℃、壓製壓力5 MPa下保持1分鐘。接著,將黏著片放置至室溫為止,測定黏著片之隔件之剝離力(剝離速度:300 mm/分鐘,剝離角度:180°)。將測定之剝離力示於表1。 The test adhesive sheet to be obtained is a stainless steel plate (SUS plate) / resin sheet / buffer After the material/resin sheet/evaluation adhesive sheet/resin sheet/cushion material/resin sheet/stainless steel sheet is laminated, it is sandwiched by a press plate, and a press machine (manufactured by Toyo Seiki Co., Ltd., MINI TEST PRESS-10, board surface) is used. Area: 250 mm × 250 mm) for pressing. MRN38 manufactured by Mitsubishi Plastics Co., Ltd. was used as a resin sheet (separator), and a rubber sheet (thickness: 1 mm, 130 mm × 160 mm) was used as a cushioning material. The test adhesive sheet was kept at a pressing plate surface temperature of 140 ° C and a pressing pressure of 5 MPa for 1 minute. Next, the adhesive sheet was allowed to stand at room temperature, and the peeling force of the spacer of the adhesive sheet (peeling speed: 300 mm/min, peeling angle: 180°) was measured. The measured peeling force is shown in Table 1.

[評價] [Evaluation]

將實施例及比較例所獲得之黏著片供於以下之評價。將結果示於表1。 The adhesive sheets obtained in the examples and the comparative examples were subjected to the following evaluations. The results are shown in Table 1.

(1)隔件之剝離力 (1) Peel force of the spacer

測定所獲得之黏著片中之隔件之剝離力(剝離速度:300 mm/min,剝離角度:180°)。若剝離力為2.0 N/50 mm以下,則具有優異之處理性。 The peeling force of the separator in the obtained adhesive sheet was measured (peeling speed: 300 mm/min, peeling angle: 180°). If the peeling force is 2.0 N/50 mm or less, it is excellent in rationality.

(2)Si晶圓黏著力 (2) Si wafer adhesion

將所獲得之黏著片於50℃下熟化2天後,剝離貼合於黏著劑層之隔件,藉由依據JIS Z 0237(2000)之方法(貼合條件:2 kg輥往返一次,剝離速度:300 mm/min,剝離角度180°)測定該黏著劑層對4吋半導體晶圓之鏡面(矽製)之黏著力。 After the obtained adhesive sheet was aged at 50 ° C for 2 days, the separator attached to the adhesive layer was peeled off by a method in accordance with JIS Z 0237 (2000) (adhesion conditions: 2 kg roller reciprocating once, peeling speed) : 300 mm/min, peeling angle 180°) The adhesion of the adhesive layer to the mirror surface of the 4 Å semiconductor wafer was measured.

(3)接著指數 (3) followed by the index

將比較例1之Si晶圓黏著力設為100,求出實施例1~3及比較例1~3之黏著片之接著指數。若接著指數為85以上,則具有亦可用作例如半導體晶圓之背面研磨步驟用之黏著片的充分之黏著力。 The Si wafer adhesion force of Comparative Example 1 was set to 100, and the adhesion indexes of the adhesive sheets of Examples 1 to 3 and Comparative Examples 1 to 3 were obtained. If the index is subsequently 85 or more, it has sufficient adhesion to be used as, for example, an adhesive sheet for a back grinding step of a semiconductor wafer.

即便於使黏著劑層形成材料熔融之狀態下與隔件貼合而獲得實施例1~3之黏著片後,隔件亦具有優異之處理性。又,實施例1~3之黏著片之隔件剝離後之黏著劑層保持優異之黏著力。 That is, after the adhesive sheets of Examples 1 to 3 were obtained by bonding the spacers in a state in which the adhesive layer forming material was melted, the spacers were excellent in rationality. Further, the adhesive layer after peeling of the spacer of the adhesive sheets of Examples 1 to 3 maintained excellent adhesion.

將自實施例1之黏著片剝離之隔件之TEM(Transmission Electron Microscopy,穿透式電子顯微鏡)圖像示於圖2。實施例1之黏著片中,未確認到黏著劑層與隔件之剝離劑層凝結而成之層。又,自附隔件之黏著片剝離隔件後,觀察隔件與黏著片各自之接觸面,結果未確認到黏著劑層之破損。 A TEM (Transmission Electron Microscopy) image of the separator peeled off from the adhesive sheet of Example 1 is shown in Fig. 2 . In the adhesive sheet of Example 1, the layer in which the adhesive layer and the release agent layer of the separator were condensed was not confirmed. Further, after the adhesive sheet of the self-attached spacer was peeled off from the spacer, the contact faces of the spacer and the adhesive sheet were observed, and as a result, the damage of the adhesive layer was not confirmed.

另一方面,比較例1之黏著片之隔件之剝離力較低,處理性較差。將隔件剝離後之比較例1之附隔件之黏著片之隔件側的TEM圖像示於圖3,將黏著劑層側之TEM圖像示於圖4。如圖3所示,於比較例1之黏著片之隔件側確認到黏著劑層與剝離劑層之矽酮凝結而成之層。於比較例1之附隔件之黏著片上確認到以上述黏著劑層與剝離劑層之矽酮凝結而成之層為界面,黏著劑層內聚失效,而以該形式使隔件與黏著片剝離。認為於比較例1之黏著片中,因黏著劑層與剝離劑層之Si凝結而使處理性降低。另一方面,如圖4所示,於比較例1之黏著片之黏著劑層側未殘留黏著劑層與矽酮凝結而成之層,僅確認到黏著劑層。因此,認為比較例1之黏著片保持了黏著力。 On the other hand, the separator of the adhesive sheet of Comparative Example 1 had a low peeling force and was inferior in handleability. The TEM image of the spacer side of the adhesive sheet of the spacer of Comparative Example 1 after peeling off the spacer is shown in Fig. 3, and the TEM image on the side of the adhesive layer is shown in Fig. 4. As shown in Fig. 3, on the side of the separator of the adhesive sheet of Comparative Example 1, a layer in which the ketone of the adhesive layer and the release agent layer was condensed was confirmed. It was confirmed on the adhesive sheet of the spacer of Comparative Example 1 that the layer formed by the condensation of the above-mentioned adhesive layer and the release agent layer as an interface, the cohesive layer cohesive failure, and the spacer and the adhesive sheet were formed in this form. Stripped. It is considered that in the adhesive sheet of Comparative Example 1, the handleability is lowered due to the coagulation of Si between the adhesive layer and the release agent layer. On the other hand, as shown in FIG. 4, the adhesive layer of the adhesive sheet of Comparative Example 1 did not leave a layer in which the adhesive layer and the fluorenone were condensed, and only the adhesive layer was confirmed. Therefore, the adhesive sheet of Comparative Example 1 was considered to maintain the adhesive force.

使用輕剝離性之隔件之比較例2及3具有優異之處理性。雖然具有可用作黏著片之黏著力,但黏著力降低。 Comparative Examples 2 and 3 using a lightly peelable spacer have superiority. Although it has an adhesive force that can be used as an adhesive sheet, the adhesive force is lowered.

[產業上之可利用性] [Industrial availability]

本發明之附隔件之黏著片例如可較佳地用於半導體裝置製造時之工件(半導體晶圓等)之保護。 The adhesive sheet of the spacer of the present invention can be preferably used, for example, for the protection of a workpiece (semiconductor wafer or the like) at the time of manufacture of a semiconductor device.

10‧‧‧基材層 10‧‧‧Substrate layer

20‧‧‧黏著劑層 20‧‧‧Adhesive layer

30‧‧‧隔件 30‧‧‧Parts

100‧‧‧附隔件之黏著片 100‧‧‧Adhesive sheets with spacers

圖1係本發明之較佳之實施形態之附隔件之黏著片之概略剖面圖。 BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic cross-sectional view showing an adhesive sheet of a spacer according to a preferred embodiment of the present invention.

圖2係自實施例1之附隔件之黏著片剝離之隔件的TEM圖像。 Figure 2 is a TEM image of the spacer peeled from the adhesive of the septum of Example 1.

圖3係隔件剝離後之比較例1之附隔件之黏著片之隔件側剖面的TEM圖像。 Fig. 3 is a TEM image of a cross-sectional side section of the adhesive sheet of the spacer of Comparative Example 1 after the separator was peeled off.

圖4係隔件剝離後之比較例1之附隔件之黏著片之黏著片側剖面的TEM圖像。 Fig. 4 is a TEM image of an adhesive sheet side cross section of the adhesive sheet of the spacer of Comparative Example 1 after the separator was peeled off.

10‧‧‧基材層 10‧‧‧Substrate layer

20‧‧‧黏著劑層 20‧‧‧Adhesive layer

30‧‧‧隔件 30‧‧‧Parts

100‧‧‧附隔件之黏著片 100‧‧‧Adhesive sheets with spacers

Claims (7)

一種附隔件之黏著片,其依序具備基材層、黏著劑層及隔件,且其係將形成該黏著劑層之材料與形成該基材層之材料共擠壓,並於至少使該經共擠壓之形成黏著劑層之材料熔融之狀態下與該隔件貼合而獲得,並且該隔件包含剝離劑層,該剝離劑層所含之矽酮中之多官能性矽酮之含有比率為10%以上。 An adhesive sheet with a spacer, which is provided with a substrate layer, an adhesive layer and a spacer in sequence, and which is formed by coextruding a material forming the adhesive layer with a material forming the substrate layer, and at least The co-extruded material forming the adhesive layer is obtained by laminating with the spacer, and the spacer comprises a release agent layer, and the polyfunctional fluorenone in the fluorenone contained in the release agent layer The content ratio is 10% or more. 如請求項1之附隔件之黏著片,其中上述隔件之140℃熱壓後之剝離力為4.0 N/50 mm以下。 The adhesive sheet of the appendage of claim 1, wherein the peeling force of the spacer after hot pressing at 140 ° C is 4.0 N / 50 mm or less. 如請求項1或2之附隔件之黏著片,其中上述黏著劑層包含聚烯烴系樹脂。 An adhesive sheet according to the appendage of claim 1 or 2, wherein the adhesive layer comprises a polyolefin resin. 如請求項3之附隔件之黏著片,其中上述聚烯烴系樹脂包含使用二茂金屬觸媒聚合而成之非晶質丙烯-(1-丁烯)共聚物。 The adhesive sheet of the appendage of claim 3, wherein the polyolefin-based resin comprises an amorphous propylene-(1-butene) copolymer polymerized using a metallocene catalyst. 如請求項1或2之附隔件之黏著片,其係半導體晶圓加工用。 An adhesive sheet according to the appendage of claim 1 or 2, which is used for semiconductor wafer processing. 如請求項3之附隔件之黏著片,其係半導體晶圓加工用。 An adhesive sheet according to the appendage of claim 3, which is used for processing semiconductor wafers. 如請求項4之附隔件之黏著片,其係半導體晶圓加工用。 The adhesive sheet of the appendage of claim 4 is for semiconductor wafer processing.
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