TW201319158A - Resin composition, resin sheet, resin sheet with metal foil, cured resin sheet, structure, and semiconductor device for power or luminous source - Google Patents

Resin composition, resin sheet, resin sheet with metal foil, cured resin sheet, structure, and semiconductor device for power or luminous source Download PDF

Info

Publication number
TW201319158A
TW201319158A TW101131781A TW101131781A TW201319158A TW 201319158 A TW201319158 A TW 201319158A TW 101131781 A TW101131781 A TW 101131781A TW 101131781 A TW101131781 A TW 101131781A TW 201319158 A TW201319158 A TW 201319158A
Authority
TW
Taiwan
Prior art keywords
resin
epoxy resin
resin composition
sheet
cured
Prior art date
Application number
TW101131781A
Other languages
Chinese (zh)
Other versions
TWI548692B (en
Inventor
Hiroyuki Takahashi
Tomoo Nishiyama
Toshiaki Shirasaka
Atsushi Kuwano
Yoshitaka Takezawa
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Publication of TW201319158A publication Critical patent/TW201319158A/en
Application granted granted Critical
Publication of TWI548692B publication Critical patent/TWI548692B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/62Alcohols or phenols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/28Nitrogen-containing compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/33Structure, shape, material or disposition of the layer connectors after the connecting process of a plurality of layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1305Bipolar Junction Transistor [BJT]
    • H01L2924/13055Insulated gate bipolar transistor [IGBT]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1306Field-effect transistor [FET]
    • H01L2924/13091Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Laminated Bodies (AREA)

Abstract

A resin composition according to the invention contains: an epoxy resin including a multifunctional epoxy resin; a curing agent including a novolac resin having a structural unit represented by the following general formula (I); and an inorganic filler including a nitride particle. In the general formula (I), R1 and R2 respectively and independently represents a hydrogen atom or a methyl group, m represents from 1.5 to 2.5 at the average, and n represents from 1 to 15 at the average.

Description

樹脂組成物、樹脂片、附有金屬箔的樹脂片、樹脂硬化物片、結構體以及動力用或光源用半導體元件 Resin composition, resin sheet, resin sheet with metal foil, resin cured sheet, structure, and semiconductor element for power or light source

本發明是有關於一種樹脂組成物、樹脂片、附有金屬箔的樹脂片、樹脂硬化物片、結構體以及動力用或光源用半導體元件。 The present invention relates to a resin composition, a resin sheet, a resin sheet with a metal foil, a cured resin sheet, a structure, and a semiconductor element for power or light source.

隨著使用半導體的電子設備的小型化、大容量化、高性能化等的進展,來自經高密度封裝的半導體的發熱量越來越大。例如電腦的中央運算裝置或電動汽車的馬達的控制所使用的半導體裝置的穩定動作中,為了散熱而不可或缺的是散熱片或散熱翼,並要求能同時具有絕緣性與熱導率的原材料作為將半導體裝置與散熱片等結合的構件。 With the progress of miniaturization, large capacity, high performance, and the like of electronic devices using semiconductors, the amount of heat generated from semiconductors that have been subjected to high-density packaging is increasing. For example, in the stable operation of the semiconductor device used for the control of the central processing unit of the computer or the motor of the electric vehicle, the heat sink or the heat dissipating fin is indispensable for heat dissipation, and a material capable of having both insulation and thermal conductivity is required. As a member that bonds a semiconductor device to a heat sink or the like.

並且通常於用於對半導體裝置等進行封裝的印刷基板等絕緣材料中廣泛使用有機材料。這些有機材料雖然絕緣性高,但熱導率低,且對半導體裝置等的散熱的幫助不大。另一方面,為了半導體裝置等的散熱,有時使用無機陶瓷等無機材料。這些無機材料雖然熱導率高,但絕緣性與有機材料相比難說充分,從而要求能同時具有高絕緣性與熱導率的材料。 Further, an organic material is generally widely used for an insulating material such as a printed circuit board for packaging a semiconductor device or the like. Although these organic materials have high insulating properties, they have low thermal conductivity and contribute little to heat dissipation of semiconductor devices and the like. On the other hand, an inorganic material such as an inorganic ceramic may be used for heat dissipation of a semiconductor device or the like. Although these inorganic materials have high thermal conductivity, insulating properties are difficult to say as compared with organic materials, and materials requiring high insulating properties and thermal conductivity are required.

關於以上所述,國際公開第02/094905號說明書中記載有:提供熱導性優異的熱硬化性樹脂硬化物作為能同時具有絕緣性與熱導性的材料的方法。藉由在樹脂內形成各向異性結構體而實現高熱導化。藉由液晶基元(mesogen)骨架形成各向異性結構體的環氧樹脂硬化物的熱導率,藉 由平板比較法(固定法)測定而為0.68 W/m.K~1.05 W/m.K。 In the above description, the method of providing a thermosetting resin cured product having excellent thermal conductivity as a material capable of simultaneously providing insulation and thermal conductivity is described in the specification of the International Publication No. 02/094905. High thermal conductivity is achieved by forming an anisotropic structure in the resin. The thermal conductivity of the cured epoxy resin forming the anisotropic structure by the mesogen skeleton It was determined by the plate comparison method (fixed method) and was 0.68 W/m. K~1.05 W/m. K.

另外,日本專利特開2008-13759號公報中有研究:將包含液晶基元骨架的環氧樹脂與熱導率高的作為無機填充材的氧化鋁混合而得的複合材料。例如已知,包含通常的雙酚A型環氧樹脂與氧化鋁填料的複合系的硬化物,所得的熱導率在氙閃光燈(xenon flash)法中可達成3.8 W/m.K,在溫度波熱分析法中可達成4.5 W/m.K(參照日本專利特開2008-13759號公報)。同樣已知,包含含有液晶基元的環氧樹脂與胺系硬化劑、氧化鋁的複合系的硬化物,熱導率在氙閃光燈法中可達成9.4 W/m.K,在溫度波熱分析法中可達成10.4 W/m.K。 Further, JP-A-2008-13759 discloses a composite material obtained by mixing an epoxy resin containing a liquid crystal skeleton and an alumina having an inorganic conductivity as a high inorganic filler. For example, it is known that a cured product comprising a combination of a usual bisphenol A type epoxy resin and an alumina filler has a thermal conductivity of 3.8 W/m in a xenon flash method. K, 4.5 W/m can be achieved in the temperature wave thermal analysis method. K (refer to Japanese Patent Laid-Open Publication No. 2008-13759). It is also known that a cured product comprising a combination of an epoxy resin containing a liquid crystal cell and an amine hardener or alumina has a thermal conductivity of 9.4 W/m in a xenon flash lamp method. K, in the temperature wave thermal analysis method can reach 10.4 W / m. K.

然而,國際公開第02/094905號說明書所記載的硬化物,實際應用時無法獲得充分的熱導率。另外日本專利特開2008-13759號公報所記載的硬化物,由於使用胺系硬化劑,因此具有柔軟性差,半硬化片容易破裂的問題。 However, the cured product described in the specification of International Publication No. 02/094905 cannot obtain sufficient thermal conductivity in practical use. In the cured product described in Japanese Laid-Open Patent Publication No. 2008-13759, since an amine-based curing agent is used, the cured product is inferior in flexibility and the semi-cured sheet is easily broken.

本發明的課題是提供硬化前具有柔軟性且硬化後可達成高熱導率的樹脂組成物、使用該樹脂組成物構成的樹脂片、附有金屬箔的樹脂片、樹脂硬化物片、結構體及動力用或光源用半導體元件。 An object of the present invention is to provide a resin composition which is flexible before curing and which can achieve high thermal conductivity after curing, a resin sheet comprising the resin composition, a resin sheet with a metal foil, a cured resin sheet, and a structure. A semiconductor component for power or light source.

本發明的第1形態含有:包含多官能環氧樹脂的環氧樹脂、包含具有下述通式(I)所示的結構單元的酚醛清漆樹脂的硬化劑、以及包含氮化物粒子的無機填充材。另外, 本發明中所謂多官能,表示一分子中的官能基數為3以上。 The first aspect of the present invention includes an epoxy resin containing a polyfunctional epoxy resin, a curing agent containing a novolac resin having a structural unit represented by the following general formula (I), and an inorganic filler containing nitride particles. . In addition, The polyfunctionality in the present invention means that the number of functional groups in one molecule is 3 or more.

通式(I)中,R1及R2分別獨立表示氫原子或甲基,m以平均值表示1.5~2.5,n以平均值表示1~15。 In the formula (I), R 1 and R 2 each independently represent a hydrogen atom or a methyl group, m represents an average value of 1.5 to 2.5, and n represents an average value of 1 to 15.

較佳為上述多官能環氧樹脂實質上不具有液晶基元骨架。並且,較佳為上述多官能環氧樹脂具有分支結構,並在側鏈具有反應性環氧基。 It is preferred that the above polyfunctional epoxy resin does not substantially have a liquid crystal skeleton. Further, it is preferred that the polyfunctional epoxy resin has a branched structure and a reactive epoxy group in a side chain.

較佳為對自上述樹脂組成物除去上述無機填充材的樹脂組成物進行硬化時的樹脂硬化物的交聯密度為5 mmol/cm3以上。 The resin cured product obtained by curing the resin composition from which the above-mentioned inorganic filler is removed is preferably a crosslinking density of 5 mmol/cm 3 or more.

較佳為上述樹脂組成物含有50體積%~85體積%的上述無機填充材。 It is preferable that the resin composition contains 50% by volume to 85% by volume of the above inorganic filler.

並且,上述樹脂組成物較佳為在全部環氧樹脂中含有20質量%以上的上述多官能環氧樹脂。並且,上述多官能環氧樹脂就樹脂硬化物的交聯密度及玻璃轉移溫度的觀點而言,較佳為具有分支結構,具體而言,較佳為選自三苯基甲烷型環氧樹脂、四苯基乙烷型環氧樹脂、二羥基苯酚醛清漆型環氧樹脂、及縮水甘油胺型環氧樹脂的至少一種。特別是,更佳為選自重複單元包含分支結構的三苯基 甲烷型環氧樹脂及二羥基苯酚醛清漆型環氧樹脂的至少一種。 Further, the resin composition preferably contains 20% by mass or more of the above polyfunctional epoxy resin in all the epoxy resins. Further, the polyfunctional epoxy resin preferably has a branched structure from the viewpoint of the crosslinking density of the cured resin and the glass transition temperature, and specifically, is preferably selected from a triphenylmethane type epoxy resin. At least one of a tetraphenylethane type epoxy resin, a dihydroxy novolac type epoxy resin, and a glycidylamine type epoxy resin. In particular, it is more preferably a triphenyl group selected from a repeating unit containing a branched structure. At least one of a methane type epoxy resin and a dihydroxy novolac type epoxy resin.

上述多官能環氧樹脂就降低樹脂組成物的軟化點的觀點而言,較佳為進一步含有液狀或半固體形狀環氧樹脂,上述液狀或半固體形狀環氧樹脂較佳為選自雙酚A型環氧樹脂、雙酚F型環氧樹脂、雙酚A型及F型混合環氧樹脂、雙酚F型酚醛清漆環氧樹脂、萘二醇型環氧樹脂以及縮水甘油胺型環氧樹脂的至少一種。另外,本發明中所謂液狀,表示熔點或軟化點小於室溫(25℃),另外,所謂半固體形狀,表示熔點或軟化點為40℃以下。 The polyfunctional epoxy resin preferably further contains a liquid or semi-solid epoxy resin from the viewpoint of lowering the softening point of the resin composition, and the liquid or semi-solid epoxy resin is preferably selected from the group consisting of Phenolic A type epoxy resin, bisphenol F type epoxy resin, bisphenol A type and F type mixed epoxy resin, bisphenol F type novolak epoxy resin, naphthalene glycol type epoxy resin and glycidylamine type ring At least one of oxygen resins. Further, in the present invention, the liquid state means that the melting point or the softening point is less than room temperature (25 ° C), and the semi-solid shape means that the melting point or the softening point is 40 ° C or less.

較佳為上述硬化劑包含20質量%~70質量%的選自單核二羥基苯的至少一種。 It is preferable that the hardener contains at least one selected from the group consisting of mononuclear dihydroxybenzenes in an amount of 20% by mass to 70% by mass.

上述無機填充材中,更佳為含有50體積%~95體積%的上述氮化物粒子。並且較佳為,上述氮化物粒子是六方晶氮化硼的凝聚物或粉碎物,長徑與短徑的比率為2以下。 More preferably, the inorganic filler contains 50% by volume to 95% by volume of the above nitride particles. Further, it is preferable that the nitride particles are aggregates or pulverized materials of hexagonal boron nitride, and the ratio of the major axis to the minor axis is 2 or less.

較佳為上述樹脂組成物進一步含有偶合劑。並且亦較佳為進一步含有分散劑。 It is preferred that the above resin composition further contains a coupling agent. It is also preferred to further contain a dispersing agent.

本發明的第2形態是一種樹脂片,其是上述樹脂組成物的未硬化物或半硬化物。 A second aspect of the present invention is a resin sheet which is an uncured or semi-cured material of the resin composition.

本發明的第3形態是一種附有金屬箔的樹脂片,其包括:上述樹脂片、以及金屬箔。 According to a third aspect of the invention, there is provided a metal foil-attached resin sheet comprising the resin sheet and a metal foil.

本發明的第4形態是一種樹脂硬化物片,其是上述樹脂組成物的硬化物。上述樹脂硬化物片較佳為厚度方向的熱導率為10 W/m.K以上。 According to a fourth aspect of the invention, there is provided a cured resin sheet which is a cured product of the resin composition. Preferably, the cured resin sheet has a thermal conductivity of 10 W/m in the thickness direction. K or more.

本發明的第5形態是一種結構體,其包括:上述樹脂片或上述樹脂硬化物片、及與上述樹脂片或上述樹脂硬化物片的單面或兩面接觸而設置的金屬板。 According to a fifth aspect of the invention, there is provided a structure comprising: the resin sheet or the cured resin sheet; and a metal plate provided in contact with one surface or both surfaces of the resin sheet or the resin cured sheet.

本發明的第6形態是一種動力用或光源用半導體元件,其包括:上述樹脂片、上述附有金屬箔的樹脂片、上述樹脂硬化物片、或上述結構體。 According to a sixth aspect of the invention, there is provided a semiconductor element for power or light source, comprising: the resin sheet, the metal foil-attached resin sheet, the resin cured sheet, or the structure.

根據本發明,可提供一種硬化前具有柔軟性且硬化後可達成高熱導率的樹脂組成物、使用該樹脂組成物而構成的樹脂片、附有金屬箔的樹脂片、樹脂硬化物片、結構體及動力用或光源用半導體元件。 According to the present invention, it is possible to provide a resin composition which is flexible before curing and which can achieve high thermal conductivity after curing, a resin sheet which is formed using the resin composition, a resin sheet with a metal foil, a cured resin sheet, and a structure. Semiconductor components for body and power or light source.

本說明書中,「~」表示包含其前後所記載的數值分別作為最小值及最大值的範圍。 In the present specification, "~" indicates a range including the numerical values described before and after the minimum value and the maximum value.

另外,本說明書中「步驟」這一用語,不僅是獨立的步驟,而且在無法與其他步驟明確區別時,若可達成該步驟的所期望的作用,則亦包括在本用語中。 In addition, the term "step" in this specification is not only an independent step, but also can be included in the present term if the desired effect of the step can be achieved when it is not clearly distinguishable from other steps.

而且,本說明書中組成物中的各成分的量,在組成物中適合各成分的物質存在多種時,只要無特別說明,是指組成物中所存在的該多種物質的合計量。 Further, the amount of each component in the composition in the present specification is a plurality of substances suitable for each component in the composition, and unless otherwise specified, means the total amount of the plurality of substances present in the composition.

<樹脂組成物> <Resin composition>

本發明的樹脂組成物含有:包含多官能環氧樹脂的環氧樹脂、包含具有下述通式(I)所示的結構單元的酚醛清漆樹脂的硬化劑、以及包含氮化物粒子的無機填充材。藉 由為該構成,而可形成硬化前具有柔軟性、硬化後熱導性優異的絕緣性樹脂硬化物。 The resin composition of the present invention contains an epoxy resin containing a polyfunctional epoxy resin, a hardener containing a novolak resin having a structural unit represented by the following general formula (I), and an inorganic filler containing nitride particles. . borrow According to this configuration, it is possible to form an insulating resin cured product which is soft before curing and excellent in thermal conductivity after curing.

通式(I)中,R1及R2分別獨立表示氫原子或甲基,m以平均值表示1.5~2.5,n以平均值表示1~15。 In the formula (I), R 1 and R 2 each independently represent a hydrogen atom or a methyl group, m represents an average value of 1.5 to 2.5, and n represents an average value of 1 to 15.

通常,由環氧樹脂與硬化劑獲得的環氧樹脂硬化物中的熱導由聲子(phonon)支配,熱導率為0.15 W/m.K~0.22 W/m.K左右。其原因是,環氧樹脂硬化物為非晶且不存在稱為有序結構的結構;及使晶格振動具有協調性的共價鍵比金屬或陶瓷少。因此,環氧樹脂硬化物中聲子的散射大,聲子的平均自由徑例如與結晶性二氧化矽的100 nm相比,環氧樹脂硬化物為0.1 nm左右而短,而導致低熱導率。 Generally, the thermal conductivity in the cured epoxy resin obtained from epoxy resin and hardener is dominated by phonons with a thermal conductivity of 0.15 W/m. K~0.22 W/m. K or so. The reason for this is that the cured epoxy resin is amorphous and does not have a structure called an ordered structure; and the covalent bond which makes the lattice vibration have coordination is less than that of metal or ceramic. Therefore, the scattering of phonons in the hardened epoxy resin is large, and the average free path of the phonons is, for example, shorter than 0.1 nm of the crystalline erbium oxide, and the cured epoxy resin is about 0.1 nm and short, resulting in low thermal conductivity. .

一般認為,藉由如前述的國際公開第02/094905號說明書所示的液晶基元所造成的各向異性結構體的形成,會使環氧樹脂分子的結晶性排列抑制聲子的靜態散射,而提高熱導率。但是,含有液晶基元的環氧樹脂單體大多結晶性強且在溶劑中的溶解性低,以樹脂組成物的形態進行操作時有時需要特別的條件。因此,需要不含液晶基元而容易溶解於溶劑的環氧樹脂單體。 It is considered that the formation of an anisotropic structure by a liquid crystal cell as shown in the above-mentioned International Publication No. 02/094905 causes the crystal alignment of epoxy resin molecules to suppress static scattering of phonons. And improve the thermal conductivity. However, the epoxy resin monomer containing a liquid crystal cell is often highly crystalline and has low solubility in a solvent, and special conditions are sometimes required when operating in the form of a resin composition. Therefore, there is a need for an epoxy resin monomer which does not contain a liquid crystal cell and is easily dissolved in a solvent.

本發明者等人發現,為了提高熱導率,而增加使晶格振動具有協調性的共價鍵數並降低動態聲子散射,這對於熱導率的提高有效,從而完成了本發明。使晶格振動具有協調性的共價鍵數多的結構,可藉由縮短樹脂骨架的分支點間的距離,構成細的網眼而獲得。即在熱硬化性樹脂中,較佳為交聯點間的分子量小的結構。藉由此種構成,交聯密度會變高,即便是實質上不含液晶基元骨架的環氧樹脂硬化物中未形成各向異性結構體的情況下,亦對熱導率的提高有效。 The present inventors have found that in order to increase the thermal conductivity, the number of covalent bonds which coordinate the lattice vibration is increased and the dynamic phonon scattering is reduced, which is effective for improving the thermal conductivity, and completed the present invention. A structure having a large number of covalent bonds that makes the lattice vibration coordinated can be obtained by shortening the distance between the branch points of the resin skeleton to form a fine mesh. That is, in the thermosetting resin, a structure having a small molecular weight between crosslinking points is preferred. According to this configuration, the crosslinking density is increased, and even when the anisotropic structure is not formed in the cured epoxy resin substantially containing no liquid crystal skeleton, the thermal conductivity is improved.

硬化後的樹脂組成物中,為了縮短樹脂骨架的分支點間的距離,構成細的網眼,在本發明中具體而言,使用多官能環氧樹脂作為環氧樹脂,使用具有上述通式(I)所示的結構單元的酚醛清漆樹脂作為硬化劑,使用氮化物粒子作為無機填充材。 In the resin composition after hardening, in order to shorten the distance between the branching points of the resin skeleton, a fine mesh is formed. In the present invention, specifically, a polyfunctional epoxy resin is used as the epoxy resin, and the above formula ( The novolak resin of the structural unit shown in I) is used as a hardener, and nitride particles are used as an inorganic filler.

將不含無機填充材的樹脂組成物硬化而得的樹脂硬化物的交聯密度,較佳為5 mmol/cm3以上,更佳為7 mmol/cm3以上,尤佳為10 mmol/cm3以上。 The crosslinking density of the cured resin obtained by curing the resin composition containing no inorganic filler is preferably 5 mmol/cm 3 or more, more preferably 7 mmol/cm 3 or more, and particularly preferably 10 mmol/cm 3 . the above.

上述交聯密度的上限值並無特別限制,就樹脂硬化物的脆性的觀點而言,較佳為100 mmol/cm3以下,更佳為70 mmol/cm3以下,尤佳為50 mmol/cm3以下。 The upper limit of the crosslinking density is not particularly limited, and is preferably 100 mmol/cm 3 or less, more preferably 70 mmol/cm 3 or less, and particularly preferably 50 mmol/% from the viewpoint of brittleness of the cured resin. Below cm 3 .

(環氧樹脂) (epoxy resin)

本發明的樹脂組成物包含多官能環氧樹脂作為環氧樹脂。藉由包含多官能環氧樹脂而可提高交聯密度。多官能環氧樹脂可由多官能型環氧樹脂單體製備。 The resin composition of the present invention contains a polyfunctional epoxy resin as an epoxy resin. The crosslinking density can be increased by including a polyfunctional epoxy resin. The multifunctional epoxy resin can be prepared from a polyfunctional epoxy resin monomer.

上述多官能環氧樹脂可為直鏈結構亦可具有分支結構,具有分支結構且側鏈或末端具有反應性環氧基的骨架的多官能環氧樹脂,藉由分支部成為交聯點而交聯點間的分子量降低而交聯密度提高,因此較佳,特佳為多聚物的重複單元含有分支結構。 The polyfunctional epoxy resin may be a linear structure or a branched structure, and a polyfunctional epoxy resin having a branched structure and a side chain or a terminal having a reactive epoxy group may be crosslinked by the branch portion. Since the molecular weight between the joints is lowered and the crosslinking density is increased, it is preferred that the repeating unit particularly preferably a polymer contains a branched structure.

將具有下述式(II)所示的重複單元的環氧樹脂與具有下述式(III)所示的重複單元的環氧樹脂進行比較,對如上所述的形態進行說明。 The epoxy resin having a repeating unit represented by the following formula (II) is compared with an epoxy resin having a repeating unit represented by the following formula (III), and the above-described form will be described.

具有下述式(II)所示的重複單元的環氧樹脂(環氧當量165 g/eq)成為直鏈結構。相對於此推測,進一步包含分支結構(2)及在分支所造成的側鏈部分包含反應性環氧末端基(1),並具有與上述式(II)大致同等的環氧當量的下述式(III)所示的重複單元的環氧樹脂(環氧當量168 g/eq)中,交聯的網眼會變得更細,而可期待交聯密度進一步變高。 The epoxy resin (epoxy equivalent 165 g/eq) having a repeating unit represented by the following formula (II) has a linear structure. In contrast, it is presumed that the branched structure (2) and the side chain portion derived from the branch include the reactive epoxy terminal group (1), and have the following formula equivalent to the epoxy equivalent of the above formula (II). In the epoxy resin (epoxy equivalent: 168 g/eq) of the repeating unit shown in (III), the crosslinked network becomes finer, and the crosslinking density can be expected to further increase.

[化4] [Chemical 4]

將具有上述式(II)或式(III)(反應性環氧末端基(1):對位)所示的重複單元的環氧樹脂、與作為硬化劑的具有本發明的通式(I)所示的結構單元的酚醛清漆樹脂(m=2.0、n=2、OH基的鍵結位置:間位、R1及R2=氫原子)發生理想的反應時的反應物的結構式,分別示於式(IV)及式(V)。並且明白:與通式(I)與通式(II)的反應物即下述式(IV)的網眼的大小相比,通式(I)與具有分支結構的式(III)的反應物即下述式(V)的網眼變得更小。因此,上述多官能環氧樹脂較佳為具有上述式(III)所示的重複單元的環氧樹脂。 An epoxy resin having a repeating unit represented by the above formula (II) or (III) (reactive epoxy terminal group (1): para), and a general formula (I) having the present invention as a curing agent The structural formula of the reactants in the case where the novolak resin (m=2.0, n=2, bonding position of OH group: meta position, R 1 and R 2 = hydrogen atom) of the structural unit shown is ideally reacted, respectively Shown in formula (IV) and formula (V). It is also understood that the reactant of the formula (I) and the formula (III) having a branched structure are compared with the size of the mesh of the formula (I) and the formula (II), that is, the mesh of the following formula (IV). That is, the mesh of the following formula (V) becomes smaller. Therefore, the above polyfunctional epoxy resin is preferably an epoxy resin having a repeating unit represented by the above formula (III).

另外,包含重複單元的環氧樹脂骨架例如在上述式(III)中,假定在兩末端結合氫原子與環氧化酚,則亦可包含n=1所示的下述式(VI)的骨架。 Further, in the epoxy resin skeleton containing a repeating unit, for example, in the above formula (III), assuming that a hydrogen atom and an epoxidized phenol are bonded to both ends, a skeleton of the following formula (VI) represented by n=1 may be contained.

另外,上述多官能環氧樹脂較佳為環氧當量小。環氧當量小是表示交聯密度變高。具體而言,環氧當量較佳為200 g/eq以下,更佳為190 g/eq以下,尤佳為170 g/eq以下。 Further, the above polyfunctional epoxy resin preferably has a small epoxy equivalent. A small epoxy equivalent means that the crosslinking density becomes high. Specifically, the epoxy equivalent is preferably 200 g/eq or less, more preferably 190 g/eq or less, and still more preferably 170 g/eq or less.

另外,上述多官能環氧樹脂較佳為不具有不參與交聯的烷基或苯基等殘基。一般認為,不參與反應的殘基在聲子傳導中導致聲子的反射或轉變為殘基的熱運動而導致聲子散射。 Further, the above polyfunctional epoxy resin preferably does not have a residue such as an alkyl group or a phenyl group which does not participate in crosslinking. It is generally believed that residues that do not participate in the reaction cause phonon reflection or conversion into thermal motion of the residue in phonon conduction resulting in phonon scattering.

上述多官能環氧樹脂例如可列舉:苯酚酚醛清漆環氧樹脂、三苯基甲烷型環氧樹脂、四苯基乙烷型環氧樹脂、二羥基苯酚醛清漆環氧樹脂、及縮水甘油胺型環氧樹脂,較佳為選自三苯基甲烷型環氧樹脂、四苯基乙烷型環氧樹脂、二羥基苯酚醛清漆型環氧樹脂及縮水甘油胺型環氧樹脂的至少一種。就分支結構的觀點而言,更佳為選自三苯基甲烷型環氧樹脂、四苯基乙烷型環氧樹脂及縮水甘油胺型環氧樹脂的至少一種,就交聯密度的觀點而言,尤佳為具有重複單元中具有反應性末端的分支結構的三苯基甲烷型環氧樹脂。另外,直鏈型結構的硬化劑中,就交聯密度的觀點而言,較佳為重複單元中具有大於1的反應性末端的二羥基苯酚醛清漆型環氧樹脂。 Examples of the polyfunctional epoxy resin include a phenol novolak epoxy resin, a triphenylmethane epoxy resin, a tetraphenylethane epoxy resin, a dihydroxy novolac epoxy resin, and a glycidylamine type. The epoxy resin is preferably at least one selected from the group consisting of a triphenylmethane type epoxy resin, a tetraphenylethane type epoxy resin, a dihydroxy novolac type epoxy resin, and a glycidylamine type epoxy resin. From the viewpoint of the branched structure, it is more preferably at least one selected from the group consisting of a triphenylmethane type epoxy resin, a tetraphenylethane type epoxy resin, and a glycidylamine type epoxy resin, from the viewpoint of crosslinking density. In particular, a triphenylmethane type epoxy resin having a branched structure having a reactive terminal in a repeating unit is preferred. Further, in the hardener having a linear structure, from the viewpoint of crosslinking density, a dihydroxy novolac type epoxy resin having a reactive terminal of more than 1 in the repeating unit is preferred.

上述多官能環氧樹脂在全部環氧樹脂中較佳為含有20質量%以上,更佳為含有30質量%以上,尤佳為含有50質量%以上。 The polyfunctional epoxy resin is preferably contained in an amount of 20% by mass or more, more preferably 30% by mass or more, and particularly preferably 50% by mass or more based on the total epoxy resin.

本發明中的環氧樹脂較佳為進一步包含液狀或半固體形狀環氧樹脂。液狀及半固體形狀環氧樹脂有賦予降低樹脂組成物的軟化點的效果的情況。液狀及半固體形狀環氧樹脂中,就降低軟化點的效果的觀點而言,較佳為液狀環氧樹脂。 The epoxy resin in the present invention preferably further comprises a liquid or semi-solid epoxy resin. The liquid and semi-solid epoxy resins have the effect of lowering the softening point of the resin composition. Among the liquid and semi-solid epoxy resins, a liquid epoxy resin is preferred from the viewpoint of lowering the effect of softening point.

此種液狀或半固體形狀環氧樹脂例如較佳為使用選自雙酚A型環氧樹脂、雙酚F型環氧樹脂、雙酚A型及F型混合環氧樹脂、雙酚F酚醛清漆型環氧樹脂、萘二醇型環氧樹脂、以及縮水甘油胺型環氧樹脂的至少一種。 Such a liquid or semi-solid epoxy resin is preferably, for example, selected from the group consisting of bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol A type and F type mixed epoxy resin, and bisphenol F phenol aldehyde. At least one of a varnish type epoxy resin, a naphthalene glycol type epoxy resin, and a glycidylamine type epoxy resin.

就軟化點的降低效果的觀點而言,液狀或半固體形狀環氧樹脂較佳為使用選自雙酚F型環氧樹脂、雙酚A型及F型混合環氧樹脂、雙酚F型酚醛清漆環氧樹脂、以及縮水甘油胺型環氧樹脂的至少一種。 From the viewpoint of the effect of lowering the softening point, the liquid or semi-solid epoxy resin is preferably selected from the group consisting of bisphenol F type epoxy resins, bisphenol A type and F type mixed epoxy resins, and bisphenol F type. At least one of a novolak epoxy resin and a glycidylamine type epoxy resin.

液狀或半固體形狀環氧樹脂多為二官能環氧樹脂,為二官能環氧樹脂單體時,由於不具有分支結構而延長交聯點間,因此會降低交聯密度,因而不應大量添加。因此,二官能液狀或半固體形狀環氧樹脂較佳為含有全部環氧樹脂的50質量%以下,更佳為含有30質量%以下,尤佳為含有20質量%以下。 The liquid or semi-solid shape epoxy resin is mostly a difunctional epoxy resin. When it is a difunctional epoxy resin monomer, since it does not have a branched structure, the crosslinking point is prolonged, so the crosslinking density is lowered, so that it should not be large. Add to. Therefore, the difunctional liquid or semi-solid epoxy resin preferably contains 50% by mass or less, more preferably 30% by mass or less, and particularly preferably 20% by mass or less.

就上述觀點而言,為了抑制交聯密度的降低,較佳為使用作為多官能液狀或半固體形狀環氧樹脂的雙酚F型酚醛清漆環氧樹脂或縮水甘油胺型環氧樹脂。多官能液狀或半固體形狀環氧樹脂較佳為含有全部環氧樹脂的50質量%以下,更佳為含有30質量%以下,尤佳為含有20質量%以下。 From the above viewpoints, in order to suppress the decrease in the crosslinking density, it is preferred to use a bisphenol F type novolak epoxy resin or a glycidylamine type epoxy resin as a polyfunctional liquid or semi-solid epoxy resin. The polyfunctional liquid or semi-solid epoxy resin preferably contains 50% by mass or less, more preferably 30% by mass or less, and particularly preferably 20% by mass or less based on the total epoxy resin.

但是,此處列舉的改質的機制或骨架是一例,並非進行限定。 However, the mechanism or skeleton of the modification listed here is an example and is not intended to be limiting.

(硬化劑) (hardener)

本發明的樹脂組成物包含具有下述通式(I)所示的結構單元的酚醛清漆樹脂作為硬化劑。 The resin composition of the present invention contains a novolac resin having a structural unit represented by the following formula (I) as a curing agent.

就上述分子設計的思考方法而言,用作本發明的硬化劑的酚醛清漆樹脂較佳為,與環氧樹脂同樣地選擇羥基當量較小的結構。藉此,作為反應基的羥基的濃度變高。另 外較佳為,與環氧樹脂同樣地酚醛清漆樹脂亦儘可能不含不參與交聯的殘基。 In the method for thinking about the molecular design, the novolac resin used as the curing agent of the present invention preferably has a structure in which the hydroxyl group equivalent is small as in the case of the epoxy resin. Thereby, the concentration of the hydroxyl group as a reaction group becomes high. another Further, it is preferable that the novolak resin is as receptive as possible to the residue which does not participate in crosslinking as much as the epoxy resin.

就以上的觀點而言,用作硬化劑的酚醛清漆樹脂具有下述通式(I)所示的結構單元。 From the above viewpoints, the novolak resin used as the curing agent has a structural unit represented by the following formula (I).

通式(I)中,R1及R2分別獨立表示氫原子或甲基,m以平均值表示1.5~2.5,n以平均值表示1~15。 In the formula (I), R 1 and R 2 each independently represent a hydrogen atom or a methyl group, m represents an average value of 1.5 to 2.5, and n represents an average value of 1 to 15.

較佳為上述酚醛清漆樹脂的羥基當量小,具有通式(I)所示的結構單元的酚醛清漆樹脂中,由於m以平均值為1.5以上,因此羥基當量適當變小。另一方面,若羥基當量過度變小則所得的硬化物容易變脆,因此m以平均值設為2.5以下。因此,上述通式(I)中的m以平均值為1.5~2.5,更佳為1.7~2.2。 In the novolak resin having a small hydroxyl group equivalent of the above-mentioned novolac resin and having a structural unit represented by the formula (I), since m has an average value of 1.5 or more, the hydroxyl group equivalent is appropriately small. On the other hand, when the hydroxyl equivalent is excessively small, the obtained cured product is liable to become brittle, so m is set to have an average value of 2.5 or less. Therefore, m in the above formula (I) has an average value of 1.5 to 2.5, more preferably 1.7 to 2.2.

另外,作為羥基的價數的m為平均值即可,例如併用等莫耳的一元的苯酚與二元的間苯二酚作為原料,而可將平均價數調整為1.5~2.5。 Further, m which is a valence of a hydroxyl group may be an average value. For example, a monovalent phenol of a molar amount and a binary resorcinol may be used together as a raw material, and the average valence may be adjusted to 1.5 to 2.5.

具有通式(I)所示的結構單元的酚醛清漆樹脂中,由於R1及R2分別獨立為氫原子或甲基,因此成為儘可能不含不參與交聯的殘基的結構。 In the novolak resin having the structural unit represented by the general formula (I), since R 1 and R 2 each independently represent a hydrogen atom or a methyl group, they have a structure which does not contain a residue which does not participate in crosslinking as much as possible.

而且,就上述酚醛清漆樹脂的軟化點的觀點而言,上述通式(I)中的n以平均值為1~15,就加工成片狀的樹脂組成物的壓接等加熱時的流動黏度的觀點而言,較佳為n以平均值為1~10。 In the viewpoint of the softening point of the novolak resin, the flow viscosity at the time of heating such as pressure bonding of the resin composition processed into a sheet form by the average value of n in the above formula (I) is from 1 to 15. From the viewpoint of viewpoint, it is preferable that n has an average value of 1 to 10.

另外,n為平均值即可,即,含有重複單元的硬化劑骨架例如包括:通式(I)中,在兩末端結合氫原子與m元酚(-Ph-(OH)m)時所得的n=1所示的下述式(VII)的化合物、或n超過15的化合物,而n以平均值可為1~15。 Further, n is an average value, that is, a hardener skeleton containing a repeating unit includes, for example, a compound obtained by combining a hydrogen atom and a m-phenol (-Ph-(OH)m) at both ends in the formula (I). The compound of the following formula (VII) represented by n=1 or the compound of n exceeding 15 and n may have an average value of 1 to 15.

另外,可為藉由合成而酚醛清漆樹脂成為分子量不同的混合物而n以平均值為1~15所得的情形,亦可為將分子量不同的酚醛清漆樹脂混合而將n調整為以平均值為1~15的情形。 Further, it may be a case where the novolac resin is a mixture having a different molecular weight by synthesis, and n is obtained by an average value of 1 to 15, or a novolak resin having a different molecular weight may be mixed to adjust n to an average value of 1 ~15 situation.

酚醛清漆樹脂的合成所用的醛以及酮,就羥基當量的觀點而言,較佳為甲醛,但考慮到耐熱性,亦可選擇乙醛,或就合成的容易性的方面而言,可選擇丙酮。而且,為了同時具有羥基當量與耐熱性,亦可併用甲醛、乙醛、及丙酮中的至少2種以上。 The aldehyde and the ketone used for the synthesis of the novolak resin are preferably formaldehyde in view of the hydroxyl group equivalent, but acetaldehyde may be selected in consideration of heat resistance, or acetone may be selected in terms of easiness of synthesis. . Further, in order to have both a hydroxyl group equivalent and heat resistance, at least two or more of formaldehyde, acetaldehyde, and acetone may be used in combination.

根據以上所述,上述酚醛清漆樹脂較佳為,將在作為 單體的單核上具有二元的酚性羥基的酚化合物,與作為醛的甲醛、乙醛或丙酮縮合而成的酚醛清漆樹脂。 According to the above, the above novolak resin is preferably used as A phenolic resin having a phenolic hydroxyl group having a binary phenolic hydroxyl group and a phenol varnish resin obtained by condensing formaldehyde, acetaldehyde or acetone as an aldehyde.

另外,具有上述通式(I)所示的結構單元的酚醛清漆樹脂,若在分子內具有通式(I)所示的結構單元,則可進一步具有其他結構。為了改質,例如可在分子內存在烷基酚或芳烷基骨架、二苯并哌喃(xanthene)骨架等酚化合物的縮合環結構等,作為源自酚化合物的骨架。另外,具有上述通式(I)所示的結構單元的酚醛清漆樹脂可為無規聚合物,亦可為嵌段共聚物。 In addition, the novolak resin having the structural unit represented by the above formula (I) may further have another structure if it has a structural unit represented by the formula (I) in the molecule. For the purpose of the modification, for example, a condensed ring structure of a phenol compound such as an alkylphenol or an aralkyl skeleton or a xanthene skeleton may be present in the molecule as a skeleton derived from a phenol compound. Further, the novolak resin having the structural unit represented by the above formula (I) may be a random polymer or a block copolymer.

具有上述通式(I)所示的結構單元的酚醛清漆樹脂,分子內的通式(I)所示的結構單元的含有率,較佳為50質量%以上,更佳為70質量%以上,尤佳為80質量%以上。 The content of the structural unit represented by the formula (I) in the molecular group of the novolak resin having the structural unit represented by the above formula (I) is preferably 50% by mass or more, and more preferably 70% by mass or more. More preferably, it is 80% by mass or more.

具有上述通式(I)所示的結構單元的酚醛清漆樹脂的羥基當量,較佳為100 g/eq以下,更佳為80 g/eq以下,就交聯密度的觀點而言,更佳為70 g/eq以下。 The hydroxyl equivalent of the novolak resin having the structural unit represented by the above formula (I) is preferably 100 g/eq or less, more preferably 80 g/eq or less, and more preferably from the viewpoint of crosslinking density. Below 70 g/eq.

上述硬化劑為了改質,可進一步含有其他酚醛清漆樹脂、或在單核上具有二元以上的羥基的酚化合物(單體)、或芳烷基樹脂等。酚性羥基的價數越高,則羥基當量越小,但有交聯密度變得過高而樹脂硬化物容易變脆的傾向。相對於此,若上述硬化劑含有上述單體,則可抑制樹脂硬化物變脆。含有上述單體的硬化劑可藉由在上述硬化劑中添加單體、或在合成時使未反應單體殘留而獲得。 The curing agent may further contain another novolak resin or a phenol compound (monomer) having a divalent or higher hydroxyl group on a mononuclear or an aralkyl resin. The higher the valence of the phenolic hydroxyl group, the smaller the hydroxyl group equivalent, but the crosslinking density tends to be too high, and the cured resin tends to become brittle. On the other hand, when the said hardening agent contains the said monomer, it can suppress that a cured resin is becoming brittle. The hardener containing the above monomer can be obtained by adding a monomer to the above-mentioned hardener or by leaving an unreacted monomer at the time of synthesis.

該單體較佳為,合成具有上述通式(I)所示的結構單元的酚醛清漆樹脂時所用的原料的酚化合物,可進一步包 含其他單核酚化合物。此種單核酚化合物中,較佳為單核二元酚化合物(單核二羥基苯)。單核二羥基苯可單獨使用1種,亦可併用2種以上。若添加單核二羥基苯,則可獲得降低樹脂組成物的軟化點,且將交聯密度的降低抑制在低水準的效果,因此較佳。 The monomer is preferably a phenol compound of a raw material used for synthesizing a novolak resin having a structural unit represented by the above formula (I), which may further comprise Contains other mononuclear phenolic compounds. Among such mononuclear phenol compounds, a mononuclear dihydric phenol compound (mononuclear dihydroxybenzene) is preferred. The mononuclear dihydroxybenzene may be used alone or in combination of two or more. When mononuclear dihydroxybenzene is added, it is preferable to reduce the softening point of the resin composition and to suppress the decrease in the crosslinking density to a low level.

上述單核二羥基苯可列舉:鄰苯二酚、間苯二酚、對苯二酚,該3種中較佳為難以氧化的間苯二酚。此處列舉的骨架是一例,並非進行限定。 The mononuclear dihydroxybenzene may, for example, be catechol, resorcin or hydroquinone, and among these three, resorcin which is difficult to oxidize is preferred. The skeletons listed here are examples and are not intended to be limiting.

選自上述單核二羥基苯化合物的至少一種的總含有率,就熱導率與軟化點的觀點而言,較理想為在全部硬化劑中為20質量%~70質量%,特別是就半硬化片的柔軟性與硬化物的交聯密度的觀點而言,較佳為30質量%~50質量%。若總含有率為上述範圍內,則由於不參與交聯的官能基數受到抑制而抑制聲子的動態散射,從而抑制樹脂硬化物的熱導率降低。 The total content of at least one selected from the above-mentioned mononuclear dihydroxybenzene compounds is preferably from 20% by mass to 70% by mass, particularly in terms of thermal conductivity and softening point, in all the hardeners. The softness of the cured sheet and the crosslink density of the cured product are preferably from 30% by mass to 50% by mass. When the total content is within the above range, the number of functional groups that do not participate in crosslinking is suppressed, and dynamic scattering of phonons is suppressed, thereby suppressing a decrease in thermal conductivity of the cured resin.

上述硬化劑整體的羥基當量較佳為80 g/eq以下,更佳為70 g/eq以下。 The hydroxyl group equivalent of the entire curing agent is preferably 80 g/eq or less, more preferably 70 g/eq or less.

本發明的樹脂組成物中的硬化劑的含量較佳為,以硬化劑中的羥基當量相對於上述環氧樹脂的環氧當量之比接近1的方式進行調整。上述當量之比越接近1,則交聯密度越高而越可期待聲子的動態散射的降低效果。具體而言,上述當量比(羥基當量/環氧當量)較佳為0.8~1.2,更佳為0.9~1.1,尤佳為0.95~1.05。 The content of the curing agent in the resin composition of the present invention is preferably adjusted such that the ratio of the hydroxyl group equivalent of the curing agent to the epoxy equivalent of the epoxy resin is close to 1. The closer the ratio of the above equivalents is to 1, the higher the crosslinking density is, and the more the effect of reducing the dynamic scattering of phonons is expected. Specifically, the above equivalent ratio (hydroxyl equivalent/epoxy equivalent) is preferably from 0.8 to 1.2, more preferably from 0.9 to 1.1, still more preferably from 0.95 to 1.05.

但是,在使用引起環氧基的連鎖聚合的咪唑系硬化促 進劑或胺系硬化促進劑作為硬化促進劑時,由於未反應的環氧基難以殘留,因此相對於上述硬化劑而可過量添加上述環氧樹脂。 However, the imidazole hardening promotes the use of a chain polymerization which causes an epoxy group. When the agent or the amine-based hardening accelerator is used as the curing accelerator, since the unreacted epoxy group is hard to remain, the epoxy resin may be added in excess to the above-mentioned curing agent.

(無機填充材) (inorganic filler)

本發明的樹脂組成物就熱導率的觀點而言,包含氮化物粒子作為無機填充材。氮化物粒子例如可列舉:氮化硼、氮化矽、氮化鋁等粒子,較佳為氮化硼。若樹脂組成物中使用上述氮化硼作為無機填充材,則可抑制玻璃轉移溫度的降低。其理由認為如以下所述。 The resin composition of the present invention contains nitride particles as an inorganic filler from the viewpoint of thermal conductivity. Examples of the nitride particles include particles of boron nitride, tantalum nitride, and aluminum nitride, and boron nitride is preferable. When the above-described boron nitride is used as the inorganic filler in the resin composition, the decrease in the glass transition temperature can be suppressed. The reason is considered as follows.

通常已知,用作無機填充材的氧化鋁、氫氧化鋁或氧化矽等在粒子的表面具有羥基,且吸附有極微量的水,吸附水阻礙硬化反應而使交聯密度降低。因此,包含以這些氧化鋁、氫氧化鋁或氧化矽等為主成分的無機填充材的環氧樹脂硬化物,與不含無機填充材的環氧樹脂硬化物相比,玻璃轉移溫度低。特別是本發明的成為高交聯密度的環氧樹脂系中,認為其影響會明顯顯現。 It is generally known that alumina, aluminum hydroxide or cerium oxide used as an inorganic filler has a hydroxyl group on the surface of the particles, and adsorbs a very small amount of water, and the adsorbed water hinders the hardening reaction to lower the crosslinking density. Therefore, an epoxy resin cured product containing an inorganic filler mainly composed of such alumina, aluminum hydroxide or cerium oxide has a glass transition temperature lower than that of an epoxy resin cured product containing no inorganic filler. In particular, in the epoxy resin system of the present invention which has a high crosslinking density, the influence is considered to be apparent.

相對於此,氮化硼的極性較小,並且在表面不具有羥基,因此難以吸附水,不會引起因這些羥基或吸附水導致的對環氧樹脂的硬化阻礙,因此可進行環氧樹脂單體與硬化劑的硬化反應而賦予高交聯密度。藉此認為,包含以氮化硼為主成分的無機填充材的環氧樹脂硬化物的玻璃轉移溫度,與不含無機填充材的環氧樹脂硬化物為同等。 On the other hand, boron nitride has a small polarity and does not have a hydroxyl group on the surface, so that it is difficult to adsorb water, and it does not cause hardening inhibition of the epoxy resin due to these hydroxyl groups or adsorbed water, so that an epoxy resin can be obtained. The body reacts with the hardening agent to impart a high crosslinking density. From this, it is considered that the glass transition temperature of the cured epoxy resin containing the inorganic filler containing boron nitride as the main component is equivalent to the cured epoxy resin containing no inorganic filler.

另外,樹脂組成物中是否含有氮化硼,例如可藉由能量分散型X射線分析法(energy dispersive X-ray analysis, EDX)來確認,特別是藉由與掃描型電子顯微鏡(scanning electron microscope,SEM)組合,而亦可確認樹脂組成物剖面的氮化硼的分布狀態。 Further, whether or not the resin composition contains boron nitride can be, for example, energy dispersive X-ray analysis (energy dispersive X-ray analysis). It was confirmed by EDX) that, in particular, by combining with a scanning electron microscope (SEM), the distribution state of boron nitride in the cross section of the resin composition can be confirmed.

上述氮化硼的結晶形可為六方晶(hexagonal)、立方晶(cubic)、斜方六面體(rhombohedral)的任一種,就可容易控制粒徑的方面而言,較佳為六方晶。另外,亦可併用結晶形不同的2種以上氮化硼。 The crystal form of the boron nitride may be any of a hexagonal crystal, a cubic crystal, and a rhombohedral, and is preferably hexagonal in terms of easy control of the particle diameter. Further, two or more kinds of boron nitrides having different crystal forms may be used in combination.

就熱導率與清漆黏度的觀點而言,上述六方晶氮化硼粒子較佳為經粉碎或凝聚加工的六方晶氮化硼粒子。上述六方晶氮化硼的粒子形狀可列舉:圓形狀或球形、鱗片狀或凝聚粒子等,填充性高的粒子的形狀較佳為長徑與短徑之比為3以下、更佳為2以下的圓形狀或球形,更佳為球形。特別是經凝聚加工的上述六方晶氮化硼,由於具有大量的間隙,藉由施加壓力而崩潰而容易變形,因此考慮到樹脂組成物的清漆的塗佈性,即便降低無機填充材的填充率,亦可在塗佈後藉由壓製等進行壓縮,而提高實質的填充率。粒子形狀就藉由熱導率高的無機填充材彼此的接觸形成導熱通道的容易性的觀點來看,認為圓形狀或鱗片狀的接觸點多於球形的接觸點,但就兼顧前述的填充性與樹脂組成物的觸變性黏度的方面而言,較佳為球形粒子。另外,粒子形狀不同的上述氮化硼粒子可單獨使用1種,亦可併用2種以上。 The hexagonal boron nitride particles are preferably pulverized or agglomerated hexagonal boron nitride particles from the viewpoint of thermal conductivity and varnish viscosity. The particle shape of the hexagonal boron nitride may be a circular shape, a spherical shape, a scaly shape, or agglomerated particles. The shape of the high-filling particles is preferably a ratio of a long diameter to a short diameter of 3 or less, more preferably 2 or less. The shape of the circle or the sphere is more preferably spherical. In particular, the above-described hexagonal boron nitride which has been subjected to agglomeration processing has a large amount of gap and is easily deformed by the application of pressure, so that the filling rate of the inorganic filler is lowered even in consideration of the coating property of the varnish of the resin composition. It is also possible to increase the substantial filling ratio by compression after pressing or the like after coating. From the viewpoint of the ease of forming a heat-conducting passage by the contact of the inorganic filler having a high thermal conductivity, the shape of the particles is considered to be more round or scaly than the spherical contact point, but the above-mentioned filling property is taken into consideration. From the viewpoint of the thixotropic viscosity of the resin composition, spherical particles are preferred. In addition, the boron nitride particles having different particle shapes may be used alone or in combination of two or more.

另外,鑒於無機填充材的填充性,為了填充間隙,亦可併用氮化硼以外的無機填充材。若無機填充材為具有絕 緣性的無機化合物,則並無特別限制,較佳為具有高熱導率的無機填充材。氮化硼以外的無機填充材的具體例可列舉:氧化鈹、氧化鋁、氧化鎂、氧化矽、氮化鋁、氮化矽、滑石、雲母、氫氧化鋁、硫酸鋇等。其中,就熱導率的觀點而言,較佳為氧化鋁、氮化鋁、氮化矽。 Further, in view of the filling property of the inorganic filler, an inorganic filler other than boron nitride may be used in combination in order to fill the gap. If the inorganic filler is absolutely The inorganic compound of the rim is not particularly limited, and is preferably an inorganic filler having a high thermal conductivity. Specific examples of the inorganic filler other than boron nitride include cerium oxide, aluminum oxide, magnesium oxide, cerium oxide, aluminum nitride, cerium nitride, talc, mica, aluminum hydroxide, barium sulfate, and the like. Among them, from the viewpoint of thermal conductivity, alumina, aluminum nitride, and tantalum nitride are preferable.

上述無機填充材的體積平均粒徑並無特別限制,就成形性的觀點而言,較佳為100 μm以下,就熱導性及清漆的觸變性的觀點而言,更佳為20 μm~100 μm,而且就絕緣性的觀點而言,尤佳為20 μm~60 μm。 The volume average particle diameter of the inorganic filler is not particularly limited, and is preferably 100 μm or less from the viewpoint of moldability, and more preferably 20 μm to 100 from the viewpoint of thermal conductivity and thixotropy of varnish. Μm, and in terms of insulation, it is preferably from 20 μm to 60 μm.

上述無機填充材既可為表現具有單一峰值的粒徑分布的無機填充材,亦可為表現具有2個以上峰值的粒徑分布的無機填充材。本發明中,就填充率的觀點而言,較佳為表現具有2個以上峰值的粒徑分布的無機填充材。 The inorganic filler may be an inorganic filler exhibiting a particle size distribution having a single peak, or an inorganic filler exhibiting a particle size distribution having two or more peaks. In the present invention, from the viewpoint of the filling ratio, an inorganic filler having a particle size distribution of two or more peaks is preferable.

上述表現具有2個以上峰值的粒徑分布的無機填充材的粒徑分布,例如在表現具有3個峰值的粒徑分布時,小粒徑粒子較佳為具有0.1 μm~0.8 μm的平均粒徑,中粒徑粒子較佳為具有1 μm~8 μm的平均粒徑,大粒徑粒子較佳為具有20 μm~60 μm的平均粒徑。藉由為該無機填充材,而無機填充材的填充率進一步提高,並且熱導率進一步提高。就填充性的觀點而言,大粒徑粒子較佳為30 μm~50 μm的平均粒徑,中粒徑粒子較佳為大粒徑粒子的平均粒徑的1/4~1/10,小粒徑粒子較佳為中粒徑粒子的平均粒徑的1/4~1/10。 In the above-described particle size distribution of the inorganic filler having a particle size distribution of two or more peaks, for example, when a particle size distribution having three peaks is exhibited, the small particle diameter preferably has an average particle diameter of 0.1 μm to 0.8 μm. The medium particle size particles preferably have an average particle diameter of from 1 μm to 8 μm, and the large particle size particles preferably have an average particle diameter of from 20 μm to 60 μm. By using this inorganic filler, the filling rate of the inorganic filler is further improved, and the thermal conductivity is further improved. From the viewpoint of the filling property, the large particle diameter is preferably an average particle diameter of 30 μm to 50 μm, and the medium particle diameter is preferably 1/4 to 1/10 of the average particle diameter of the large particle diameter, which is small. The particle diameter particles are preferably 1/4 to 1/10 of the average particle diameter of the medium particle diameter particles.

上述氮化物粒子較佳為用作上述大粒徑粒子。上述中 粒徑粒子或上述小粒徑粒子可為氮化物粒子,亦可為其他粒子,就熱導率與清漆的觸變性的觀點而言,較佳為氧化鋁粒子。 The above nitride particles are preferably used as the above-mentioned large-sized particles. Above The particle diameter particles or the small particle diameter particles may be nitride particles or other particles, and from the viewpoint of thermal conductivity and thixotropy of the varnish, alumina particles are preferred.

上述無機填充材的總量中的上述氮化物粒子的含有率,就成形性的觀點而言,較佳為50體積%~95體積%,就填充性的觀點而言,更佳為60體積%~95體積%,就熱導性的觀點而言,尤佳為65體積%~92體積%。 The content of the nitride particles in the total amount of the inorganic filler is preferably 50% by volume to 95% by volume from the viewpoint of moldability, and more preferably 60% by volume from the viewpoint of filling property. From the viewpoint of thermal conductivity, it is preferably from 65% by volume to 92% by volume.

另外,本發明的樹脂組成物中的無機填充材的含量,就成形性的觀點而言,較佳為50體積%~85體積%,就熱導性的觀點而言,更佳為60體積%~85體積%,就清漆的觸變性的觀點而言,尤佳為65體積%~75體積%。若以體積基準的無機填充材的含量為上述範圍內,則可形成硬化前具有柔軟性、硬化後熱導性優異的絕緣性樹脂硬化物。 In addition, the content of the inorganic filler in the resin composition of the present invention is preferably 50% by volume to 85% by volume from the viewpoint of moldability, and more preferably 60% by volume from the viewpoint of thermal conductivity. From 8% by volume, it is particularly preferably from 65% by volume to 75% by volume from the viewpoint of thixotropy of the varnish. When the content of the volume-based inorganic filler is within the above range, an insulating resin cured product having flexibility before curing and excellent thermal conductivity after curing can be formed.

另外,樹脂組成物中的無機填充材的體積基準的含量按以下方式測定。首先,測定25℃時的樹脂組成物的質量(Wc),將該樹脂組成物在空氣中以400℃煅燒2小時,接著以700℃煅燒3小時,將樹脂成分分解、燃燒而除去後,測定25℃時殘存的無機填充材的質量(Wf)。接著,使用電子比重計或比重瓶求出25℃的無機填充材的密度(df)。接著,以同樣方法測定25℃的樹脂組成物的密度(dc)。接著,求出樹脂組成物的體積(Vc)及殘存的無機填充材的體積(Vf),如(式1)所示般,將殘存的無機填充材的體積除以樹脂組成物體積,從而求出無機填充材的體積比率(Vr)。 Further, the volume-based content of the inorganic filler in the resin composition was measured in the following manner. First, the mass (Wc) of the resin composition at 25 ° C was measured, and the resin composition was calcined in air at 400 ° C for 2 hours, then calcined at 700 ° C for 3 hours, and the resin component was decomposed, burned, and removed. The mass (Wf) of the inorganic filler remaining at 25 °C. Next, the density (df) of the inorganic filler at 25 ° C was determined using an electronic hydrometer or a pycnometer. Next, the density (dc) of the resin composition at 25 ° C was measured in the same manner. Next, the volume (Vc) of the resin composition and the volume (Vf) of the remaining inorganic filler are determined, and the volume of the remaining inorganic filler is divided by the volume of the resin composition as shown in (Formula 1). The volume ratio (Vr) of the inorganic filler is taken out.

(式1)Vc=Wc/dc Vf=Wf/df Vr=Vf/Vc (Formula 1) Vc=Wc/dc Vf=Wf/df Vr=Vf/Vc

Vc:樹脂組成物的體積(cm3)、Wc:樹脂組成物的質量(g) Vc: volume of resin composition (cm 3 ), Wc: mass of resin composition (g)

dc:樹脂組成物的密度(g/cm3) Dc: density of resin composition (g/cm 3 )

Vf:無機填充材的體積(cm3)、Wf:無機填充材的質量(g) Vf: volume of inorganic filler (cm 3 ), Wf: mass of inorganic filler (g)

df:無機填充材的密度(g/cm3) Df: density of inorganic filler (g/cm 3 )

Vr:無機填充材的體積比率 Vr: volume ratio of inorganic filler

另外,上述無機填充材若在上述體積比率的範圍內含有,則質量比率並無特別限定。具體而言,將上述樹脂組成物設為100質量份時,上述無機填充材可在1質量份~99質量份的範圍內含有,較佳為在50質量份~97質量份的範圍內含有,更佳為80質量份~95質量份。藉由上述無機填充材的含量為上述範圍內,則可達成更高的熱導率。 Further, when the inorganic filler is contained in the range of the volume ratio, the mass ratio is not particularly limited. Specifically, when the resin composition is 100 parts by mass, the inorganic filler may be contained in an amount of from 1 part by mass to 99 parts by mass, preferably from 50 parts by mass to 97 parts by mass, More preferably, it is 80 mass parts - 95 mass parts. When the content of the inorganic filler is within the above range, a higher thermal conductivity can be achieved.

(其他成分) (other ingredients)

本發明的樹脂組成物除了上述成分外,根據需要可包含其他成分。其他成分可列舉:硬化促進劑、偶合劑、分散劑、有機溶劑、硬化促進劑。 The resin composition of the present invention may contain other components as needed in addition to the above components. Examples of other components include a curing accelerator, a coupling agent, a dispersing agent, an organic solvent, and a curing accelerator.

特別是在上述環氧樹脂或上述硬化劑不是具有氮原子 且具有鹼性的成分時,就使樹脂組成物的硬化反應充分進行的觀點而言,較佳為添加上述硬化促進劑。另外,在上述環氧樹脂的分子中或樹脂組成物中含有氮原子時,可期待與胺系硬化促進劑同樣的效果,因此亦可不添加硬化促進劑。 Especially in the above epoxy resin or the above hardener does not have a nitrogen atom In the case of having a basic component, it is preferred to add the above-mentioned curing accelerator from the viewpoint of sufficiently proceeding the curing reaction of the resin composition. In addition, when a nitrogen atom is contained in the molecule of the epoxy resin or the resin composition, the same effect as the amine-based curing accelerator can be expected. Therefore, the curing accelerator may not be added.

上述硬化促進劑可使用:三苯基膦(北興化學製造的TPP)或PPQ(北興化學製造)等磷系硬化促進劑;TPP-MK(北興化學製造)等鏻鹽系硬化促進劑;EMZ-K(北興化學製造)等有機硼系硬化促進劑;2E4MZ(四國化成工業製造)、2E4MZ-CN(四國化成工業製造)、2PZ-CN(四國化成工業製造)、2PHZ(四國化成工業製造)等咪唑系硬化促進劑;三乙基胺、N,N-二甲基苯胺、4-(N,N-二甲基胺基)吡啶、六亞甲基四胺等胺系硬化促進劑等。特別是磷系硬化促進劑或鏻鹽系硬化促進劑可抑制環氧樹脂單體的均聚,因此容易使硬化劑與環氧樹脂的反應進行而較佳。在調配設計方面,在環氧當量/羥基當量大於1、特別是1.2以上時,會產生未反應的環氧基,如前述般會成為使熱導率降低的聲子散射的原因,因此,此種情況下較佳為添加可進行環氧基的均聚的咪唑系硬化促進劑或胺系硬化促進劑。 As the hardening accelerator, a phosphorus-based hardening accelerator such as triphenylphosphine (TPP manufactured by Behind Chemical Co., Ltd.) or PPQ (manufactured by Kitajhin Chemical Co., Ltd.) or a barium salt-based hardening accelerator such as TPP-MK (manufactured by Kitagawa Chemical Co., Ltd.); EMZ- can be used. Organic boron-based hardening accelerators such as K (Beixing Chemical Manufacturing Co., Ltd.); 2E4MZ (manufactured by Shikoku Chemical Industries, Ltd.), 2E4MZ-CN (manufactured by Shikoku Chemical Industries, Ltd.), 2PZ-CN (manufactured by Shikoku Chemical Industries, Ltd.), 2PHZ (Four Nations) Industrial manufacturing), such as imidazole-based hardening accelerator; amine-based hardening promotion such as triethylamine, N,N-dimethylaniline, 4-(N,N-dimethylamino)pyridine, and hexamethylenetetramine Agents, etc. In particular, since the phosphorus-based hardening accelerator or the onium-based hardening accelerator suppresses the homopolymerization of the epoxy resin monomer, it is preferred to carry out the reaction between the curing agent and the epoxy resin. In terms of blending design, when the epoxy equivalent/hydroxyl equivalent is more than 1, particularly 1.2 or more, an unreacted epoxy group is generated, which causes scattering of phonons which lowers the thermal conductivity as described above, and therefore, In this case, it is preferred to add an imidazole-based hardening accelerator or an amine-based hardening accelerator which can perform homopolymerization of an epoxy group.

另外,藉由樹脂組成物包含偶合劑,而包含環氧樹脂及酚醛清漆樹脂的樹脂成分與無機填充材的結合性會進一步提高,並可達成更高的熱導率與更強的黏接性。 Further, since the resin composition contains a coupling agent, the resin component containing the epoxy resin and the novolak resin is further improved in the bonding property with the inorganic filler, and a higher thermal conductivity and stronger adhesion can be achieved. .

上述偶合劑只要是具有與樹脂成分結合的官能基、及 與無機填充材結合的官能基的化合物,則並無特別限制,可使用通常所用的偶合劑。 The coupling agent is a functional group having a bond with a resin component, and The compound of the functional group bonded to the inorganic filler is not particularly limited, and a commonly used coupling agent can be used.

與上述樹脂成分結合的官能基可列舉:環氧基、胺基、巰基、脲基、N-苯基胺基等。就保存穩定性的觀點而言,上述偶合劑較佳為具有反應速度慢的環氧基或N-苯基胺基的官能基。 The functional group bonded to the above resin component may, for example, be an epoxy group, an amine group, a thiol group, a ureido group or an N-phenylamino group. From the viewpoint of storage stability, the above coupling agent is preferably a functional group having an epoxy group having a slow reaction rate or an N-phenylamino group.

另外,與上述無機填充材結合的官能基可列舉:烷氧基、羥基等,具有此種官能基的偶合劑,可列舉:具有二烷氧基矽烷或三烷氧基矽烷的矽烷系偶合劑、具有烷氧基鈦酸酯的鈦酸酯系偶合劑。 Further, examples of the functional group to be bonded to the inorganic filler include an alkoxy group and a hydroxyl group. Examples of the coupling agent having such a functional group include a decane coupling agent having a dialkoxy decane or a trialkoxy decane. A titanate coupling agent having an alkoxy titanate.

矽烷偶合劑具體而言,例如可列舉:3-縮水甘油氧基丙基三甲氧基矽烷、3-縮水甘油氧基丙基三乙氧基矽烷、3-縮水甘油氧基丙基甲基二甲氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、3-(2-胺基乙基)胺基丙基三乙氧基矽烷、3-胺基丙基三甲氧基矽烷、3-(2-胺基乙基)胺基丙基三甲氧基矽烷、N-苯基-3-胺基丙基三甲氧基矽烷、3-巰基三乙氧基矽烷、3-脲基丙基三乙氧基矽烷等。 Specific examples of the decane coupling agent include 3-glycidoxypropyltrimethoxydecane, 3-glycidoxypropyltriethoxydecane, and 3-glycidoxypropylmethyldimethacrylate. Oxydecane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, 3-aminopropyltriethoxydecane, 3-(2-aminoethyl)aminopropyltri Ethoxy decane, 3-aminopropyltrimethoxydecane, 3-(2-aminoethyl)aminopropyltrimethoxydecane, N-phenyl-3-aminopropyltrimethoxydecane , 3-mercaptotriethoxydecane, 3-ureidopropyltriethoxydecane, and the like.

另外,亦可使用以SC-6000KS2為代表的矽烷偶合劑寡聚物(日立化成塗砂(Hitachi Chemical Coated Sand)公司製造)。 Further, a decane coupling agent oligomer represented by SC-6000KS2 (manufactured by Hitachi Chemical Coated Sand Co., Ltd.) can also be used.

鈦酸酯系偶合劑可使用末端具有胺基的鈦酸酯偶合劑(味之素精細化學(Ajinomoto Fine-Techno)製造的PLENACT KR44)。 As the titanate coupling agent, a titanate coupling agent having an amine group at the end (PLENACT KR44 manufactured by Ajinomoto Fine-Techno) can be used.

這些偶合劑可單獨使用1種,或者亦可併用2種以上。 These coupling agents may be used alone or in combination of two or more.

上述樹脂組成物中的偶合劑的含量並無特別限制,就熱導性的觀點而言,相對於樹脂組成物的總質量,較佳為0.02質量%~0.83質量%,更佳為0.04質量%~0.42質量%。 The content of the coupling agent in the resin composition is not particularly limited, and from the viewpoint of thermal conductivity, it is preferably 0.02% by mass to 0.83% by mass, and more preferably 0.04% by mass based on the total mass of the resin composition. ~0.42% by mass.

另外,偶合劑的含量就熱導性、絕緣性的觀點而言,相對於無機填充材,較佳為0.02質量%~1質量%,更佳為0.05質量%~0.5質量%。 In addition, the content of the coupling agent is preferably 0.02% by mass to 1% by mass, and more preferably 0.05% by mass to 0.5% by mass, from the viewpoint of thermal conductivity and insulating properties with respect to the inorganic filler.

另外,藉由樹脂組成物包含分散劑,而包含環氧樹脂及酚醛清漆樹脂的樹脂成分中的無機填充材的分散性進一步提高,藉由均勻地分散無機填充材,而可達成更高的熱導率與更強的黏接性。 Further, when the resin composition contains a dispersant, the dispersibility of the inorganic filler in the resin component containing the epoxy resin and the novolak resin is further improved, and higher heat can be achieved by uniformly dispersing the inorganic filler. Conductivity and stronger adhesion.

上述分散劑可自通常所使用的分散劑中適當選擇。例如可列舉:ED-113(楠本化成股份有限公司製造)、DISPERBYK-106(德國畢克化學股份有限公司(BYK-Chemie GmbH)製造)、DISPERBYK-111(德國畢克化學股份有限公司(BYK-Chemie GmbH)製造)、Ajisper PN-411(味之素精細化學製造)、REB122-4(日立化成工業製造)等。並且這些分散劑可單獨使用或者亦可併用2種以上。 The above dispersant can be appropriately selected from the dispersants which are usually used. For example, ED-113 (manufactured by Nanben Chemical Co., Ltd.), DISPERBYK-106 (manufactured by BYK-Chemie GmbH), and DISPERBYK-111 (BYK-Chemical Co., Ltd. (BYK-) Manufactured by Chemie GmbH), Ajisper PN-411 (manufactured by Ajinomoto Fine Chemicals), REB122-4 (manufactured by Hitachi Chemical Co., Ltd.), etc. Further, these dispersants may be used singly or in combination of two or more.

上述樹脂組成物中的分散劑的含量並無特別限制,就熱導性的觀點而言,相對於無機填充劑較佳為0.01質量%~2質量%,更佳為0.1質量%~1質量%。 The content of the dispersant in the resin composition is not particularly limited, and is preferably from 0.01% by mass to 2% by mass, more preferably from 0.1% by mass to 1% by mass, based on the inorganic filler from the viewpoint of thermal conductivity. .

(樹脂組成物的製造方法) (Method for Producing Resin Composition)

本發明的樹脂組成物的製造方法可無特別限制地使用通常所進行的樹脂組成物的製造方法。例如可藉由以下方式獲得:將無機填充材根據需要與偶合劑混合,使環氧樹脂與硬化劑溶解或分散於適當的有機溶劑中,此外,混合根據需要所添加的硬化促進劑等其他成分。 The method for producing the resin composition of the present invention can be carried out by a usual method for producing a resin composition without any particular limitation. For example, it can be obtained by mixing an inorganic filler with a coupling agent as needed, dissolving or dispersing the epoxy resin and the curing agent in a suitable organic solvent, and further mixing other components such as a hardening accelerator added as needed. .

溶解或分散硬化劑的有機溶劑可根據所用的酚醛清漆樹脂等適當選擇。例如可較佳地使用:甲醇、乙醇、1-丙醇、2-丙醇、1-丁醇、2-丙醇、溶纖劑、甲基溶纖劑等醇類;或甲基乙基酮、甲基異丁基酮、環己酮、環戊酮等酮系溶劑;或乙酸丁酯、乳酸乙酯等酯系溶劑;或二丁醚、四氫呋喃、甲基四氫呋喃等醚系;或二甲基甲醯胺或二甲基乙醯胺等氮系溶劑。 The organic solvent in which the hardener is dissolved or dispersed can be appropriately selected depending on the novolak resin or the like to be used. For example, an alcohol such as methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, 2-propanol, cellosolve or methyl cellosolve may be preferably used; or methyl ethyl ketone a ketone solvent such as methyl isobutyl ketone, cyclohexanone or cyclopentanone; or an ester solvent such as butyl acetate or ethyl lactate; or an ether such as dibutyl ether, tetrahydrofuran or methyltetrahydrofuran; A nitrogen-based solvent such as carbamide or dimethylacetamide.

另外,將環氧樹脂、硬化劑、及無機填充材等混合的方法,可將通常的攪拌機、擂潰機、三輥、球磨機等分散機加以適當組合來進行。 Further, a method of mixing an epoxy resin, a curing agent, an inorganic filler, or the like can be carried out by appropriately combining a disperser such as a usual agitator, a kneader, a three-roller, or a ball mill.

<樹脂片> <Resin sheet>

本發明的樹脂片可藉由將上述樹脂組成物成形為片狀而獲得。藉由上述樹脂片包含上述樹脂組成物而構成,而使硬化前的柔軟性與硬化後的熱導性優異。另外,本發明的樹脂片可為未硬化物,亦可為半硬化物。此處,半硬化是指通常被稱為B階段狀態的狀態,是指相對於常溫(25℃)的黏度為104 Pa.s~105 Pa.s,而100℃的黏度降低為102 Pa.s~103 Pa.s的狀態。另外,黏度可藉由扭轉型動態黏彈性測定裝置等進行測定。 The resin sheet of the present invention can be obtained by forming the above resin composition into a sheet shape. The resin sheet is composed of the resin composition described above, and is excellent in flexibility before curing and thermal conductivity after curing. Further, the resin sheet of the present invention may be an uncured material or a semi-cured material. Here, semi-hardening refers to a state generally referred to as a B-stage state, and means a viscosity of 10 4 Pa with respect to a normal temperature (25 ° C.). s~10 5 Pa. s, and the viscosity at 100 ° C is reduced to 10 2 Pa. s~10 3 Pa. The state of s. Further, the viscosity can be measured by a torsional dynamic viscoelasticity measuring device or the like.

另外,本發明的樹脂片可為在支撐體上設置包含上述樹脂組成物的樹脂層的樹脂片。上述樹脂層的膜厚可根據目的而適當選擇,例如為50 μm~500 μm,就熱阻的觀點而言,較薄者較佳,並且就絕緣性的觀點而言,較厚者較佳,可同時具有熱阻與絕緣性的厚度,較佳為70 μm~300 μm,更佳為100 μm~250 μm。 Further, the resin sheet of the present invention may be a resin sheet in which a resin layer containing the above resin composition is provided on a support. The film thickness of the above-mentioned resin layer can be appropriately selected depending on the purpose, for example, 50 μm to 500 μm, and is preferably thinner from the viewpoint of thermal resistance, and thicker is preferable from the viewpoint of insulation. The thickness can be both thermally and insulative, preferably from 70 μm to 300 μm, more preferably from 100 μm to 250 μm.

上述支撐體可列舉絕緣性支撐體及導電性支撐體。絕緣性支撐體可列舉:聚四氟乙烯膜、聚對苯二甲酸乙二酯膜、聚對苯二甲酸丁二酯、聚萘二甲酸乙二酯、聚乙烯膜、聚丙烯膜、聚甲基戊烯膜、聚醯胺膜、聚醯亞胺膜等塑膠膜等。導電性支撐體亦可使用:銅箔或鋁箔等金屬或金屬蒸鍍塑膠膜。 Examples of the support include an insulating support and a conductive support. Examples of the insulating support include a polytetrafluoroethylene film, a polyethylene terephthalate film, polybutylene terephthalate, polyethylene naphthalate, polyethylene film, polypropylene film, and polymethylation. A plastic film such as a pentene film, a polyamide film, or a polyimide film. As the conductive support, a metal or metal vapor-deposited plastic film such as copper foil or aluminum foil can also be used.

根據需要可對上述絕緣性支撐體進行底塗劑(primer)塗佈、紫外線(ultraviolet,UV)處理、電暈放電處理、研磨處理、蝕刻處理、脫模處理等表面處理。亦可對上述導電性支撐體進行底塗劑塗佈、偶合處理、UV處理、蝕刻處理、脫模處理等表面處理。特別是要求金屬箔與包含上述樹脂組成物的樹脂層的密接性時,較佳為在藉由研磨處理或電解箔的粗化面上設置樹脂層。 The insulating support may be subjected to surface treatment such as primer coating, ultraviolet (UV) treatment, corona discharge treatment, polishing treatment, etching treatment, and release treatment as needed. The conductive support may be subjected to a surface treatment such as primer coating, coupling treatment, UV treatment, etching treatment, or mold release treatment. In particular, when the adhesion between the metal foil and the resin layer containing the resin composition is required, it is preferred to provide a resin layer on the roughened surface of the polishing treatment or the electrolytic foil.

另外,上述支撐體可僅配置於樹脂片的一個面上,亦可配置於兩個面上。 Further, the support may be disposed only on one surface of the resin sheet or on both surfaces.

上述支撐體的膜厚並無特別限制,根據樹脂組成物層的膜厚或樹脂片的用途、製造設備,根據業者的知識而適當確定,就經濟性及樹脂片的操作性優異的方面而言,較 佳為10 μm~150 μm,更佳為40 μm~110 μm。 The film thickness of the above-mentioned support is not particularly limited, and it is appropriately determined according to the knowledge of the manufacturer, based on the thickness of the resin composition layer, the use of the resin sheet, and the production equipment, and is excellent in economical efficiency and handleability of the resin sheet. Compared Preferably, it is from 10 μm to 150 μm, more preferably from 40 μm to 110 μm.

本發明的樹脂片例如可藉由在上述支撐體上塗佈上述樹脂組成物並乾燥而製造。樹脂組成物的塗佈方法及乾燥方法並無特別限制,可適當選擇通常所用的方法。例如塗敷方法可列舉:刮刀塗佈或模塗、浸塗等。 The resin sheet of the present invention can be produced, for example, by applying the above resin composition to the support and drying it. The coating method and drying method of the resin composition are not particularly limited, and a method generally used can be appropriately selected. For example, coating methods include blade coating, die coating, dip coating, and the like.

上述乾燥方法在批次處理時可使用箱型溫風乾燥機,在與塗敷機的連續處理時,可使用多段式溫風乾燥機等。另外,用以乾燥的加熱條件亦無特別限制,在使用溫風乾燥機時,就防止樹脂組成物的塗敷物的膨脹的觀點而言,較佳為包括在乾燥機的溫風為低於溶劑的沸點的溫度範圍內進行加熱處理的步驟。 In the above drying method, a box-type warm air dryer can be used for batch processing, and a multi-stage warm air dryer or the like can be used for continuous treatment with the coating machine. Further, the heating conditions for drying are not particularly limited, and in the case of using a warm air dryer, from the viewpoint of preventing swelling of the coating of the resin composition, it is preferred that the warm air included in the dryer is lower than the solvent. The step of heat treatment in the temperature range of the boiling point.

在上述樹脂片為半硬化物時,半硬化的方法並無特別限制,可適當選擇通常所用的方法,例如藉由加熱處理而將上述樹脂組成物半硬化。用以半硬化的加熱處理方法並無特別限制。 When the resin sheet is a semi-cured material, the method of semi-curing is not particularly limited, and a method generally used can be appropriately selected, for example, the resin composition is semi-cured by heat treatment. The heat treatment method for semi-hardening is not particularly limited.

上述用以半硬化的溫度範圍可根據構成樹脂組成物的環氧樹脂而適當選擇。就B-階段片的強度的觀點而言,較佳為藉由熱處理而稍微進行硬化反應,熱處理的溫度範圍較佳為80℃~150℃,更佳為100℃~120℃。另外,用以半硬化的加熱處理的時間並無特別限制,就B-階段片的樹脂的硬化速度及樹脂的流動性或黏接性的觀點而言,可適當選擇,較佳為加熱1分鐘以上30分鐘以內,更佳為3分鐘~10分鐘。 The above temperature range for semi-hardening can be appropriately selected depending on the epoxy resin constituting the resin composition. From the viewpoint of the strength of the B-stage sheet, it is preferred to carry out a hardening reaction by heat treatment, and the temperature range of the heat treatment is preferably from 80 ° C to 150 ° C, more preferably from 100 ° C to 120 ° C. Further, the time for the heat treatment for the semi-hardening is not particularly limited, and may be appropriately selected from the viewpoints of the curing speed of the resin of the B-stage sheet and the fluidity or adhesiveness of the resin, and it is preferred to heat for 1 minute. Within 30 minutes, more preferably 3 minutes to 10 minutes.

將上述樹脂片半硬化後,重合2片以上的樹脂片,一 邊加熱一邊加壓,而可使樹脂片熱壓接。熱壓接時的加熱溫度可根據樹脂的軟化點或熔點而選擇,較佳為80℃~180℃,更佳為100℃~150℃。另外,熱壓接時的加壓較佳為在真空下進行,更佳為在真空下以4 MPa~20 MPa進行加壓,尤佳為以5 MPa~15 MPa進行加壓。 After the resin sheet is semi-hardened, two or more resin sheets are superposed, one The resin sheet is thermocompression bonded while being heated while being heated. The heating temperature at the time of thermocompression bonding can be selected according to the softening point or melting point of the resin, preferably 80 ° C to 180 ° C, more preferably 100 ° C to 150 ° C. Further, the pressurization at the time of thermocompression bonding is preferably carried out under vacuum, more preferably at 4 MPa to 20 MPa under vacuum, and particularly preferably at 5 MPa to 15 MPa.

<樹脂硬化物片及其製造方法> <Resin cured sheet and method for producing the same>

本發明的樹脂硬化物片可藉由使上述樹脂組成物硬化而獲得。藉此可構成熱導性優異的樹脂硬化物。將樹脂組成物硬化的方法並無特別限制,可適當選擇通常所用的方法,例如藉由加熱處理而將上述樹脂組成物硬化。 The cured resin sheet of the present invention can be obtained by curing the above resin composition. Thereby, a cured resin having excellent thermal conductivity can be formed. The method of curing the resin composition is not particularly limited, and a method generally used can be appropriately selected, for example, the resin composition is cured by heat treatment.

上述將樹脂組成物加熱處理的方法並無特別限制,並且加熱條件亦無特別限制。 The method of heat-treating the resin composition described above is not particularly limited, and the heating conditions are not particularly limited.

但是,通常多官能型環氧樹脂由於硬化速度快,因此高溫下的硬化有容易殘留未反應的環氧基或羥基等官能基,而難以獲得熱導率的提高效果的傾向。因此,就達成更高的熱導率的觀點而言,較佳為包括在硬化反應的活性溫度附近的溫度範圍(以下有時稱為「特定溫度範圍」)進行加熱處理的步驟。此處,硬化反應的活性溫度附近,是指示差熱分析中自環氧樹脂發生硬化發熱的溫度起至反應熱的峰值溫度為止。 However, since the polyfunctional epoxy resin generally has a high curing rate, the curing at a high temperature tends to leave a functional group such as an unreacted epoxy group or a hydroxyl group, and it is difficult to obtain an effect of improving the thermal conductivity. Therefore, from the viewpoint of achieving a higher thermal conductivity, it is preferred to include a step of performing heat treatment in a temperature range (hereinafter sometimes referred to as "specific temperature range") in the vicinity of the activation temperature of the curing reaction. Here, the vicinity of the activation temperature of the hardening reaction indicates the temperature from the temperature at which the epoxy resin hardens and heats up to the peak temperature of the reaction heat in the differential thermal analysis.

上述特定溫度範圍可根據構成樹脂組成物的環氧樹脂而適當選擇,較佳為80℃~180℃,更佳為100℃~150℃。藉由在該溫度範圍內進行加熱處理,而可達成更高的熱導率。上述特定溫度範圍為150℃以下時,會抑制硬化快速 地過度進行,為80℃以上時,樹脂會熔融而進行硬化。 The specific temperature range described above can be appropriately selected depending on the epoxy resin constituting the resin composition, and is preferably from 80 ° C to 180 ° C, more preferably from 100 ° C to 150 ° C. Higher heat conductivity can be achieved by heat treatment in this temperature range. When the above specific temperature range is below 150 ° C, it will inhibit hardening quickly. When the ground is excessively carried out, when it is 80 ° C or more, the resin is melted and hardened.

另外,特定溫度範圍的加熱處理的時間並無特別限制,較佳為加熱30秒以上15分鐘以內。 Further, the time of the heat treatment in a specific temperature range is not particularly limited, and it is preferably heated for 30 seconds or more and 15 minutes or less.

本發明中,除了特定溫度範圍的加熱處理外,較佳為設置在進一步高溫度下進行加熱處理的步驟的至少1個步驟。藉此可進一步提高硬化物的彈性模數、熱導率、黏接力。在進一步高溫度下的加熱處理較佳為在120℃~250℃下進行,更佳為在120℃~200℃下進行。若溫度過高,則樹脂氧化而容易導致著色。另外,該加熱處理的時間較佳為30分鐘~8小時,更佳為1小時~5小時。而且,該加熱處理較佳為在上述溫度範圍內自低溫至高溫分多個階段進行處理。 In the present invention, in addition to the heat treatment in a specific temperature range, at least one step of the step of performing heat treatment at a further high temperature is preferred. Thereby, the elastic modulus, thermal conductivity, and adhesion of the cured product can be further improved. The heat treatment at a further high temperature is preferably carried out at 120 ° C to 250 ° C, more preferably at 120 ° C to 200 ° C. If the temperature is too high, the resin is oxidized and easily causes coloration. Further, the heat treatment time is preferably from 30 minutes to 8 hours, more preferably from 1 hour to 5 hours. Further, the heat treatment is preferably carried out in a plurality of stages from a low temperature to a high temperature in the above temperature range.

另外,將上述樹脂組成物的硬化物片化的方法可列舉:將上述樹脂片成形後進行硬化的方法;或將樹脂組成物硬化後,進行切片而片化的方法等。 In addition, a method of forming the cured product of the resin composition may be a method of curing the resin sheet after molding, or a method of curing the resin composition, and then slicing and slicing.

本發明的樹脂硬化物片的厚度方向的熱導率較佳為10 W/m.K以上,更佳為12 W/m.K以上。此種熱導率可藉由使用本發明的樹脂組成物而達成。 The thermal conductivity of the cured resin sheet of the present invention in the thickness direction is preferably 10 W/m. K or more, more preferably 12 W/m. K or more. Such thermal conductivity can be achieved by using the resin composition of the present invention.

<結構體、附有金屬箔的樹脂片> <Structure, resin sheet with metal foil attached>

本發明的結構體包括:上述樹脂片或上述樹脂硬化物片(以下有時總稱為「本發明的片」)、及與本發明的片的單面或兩面接觸而設置的金屬板。 The structure of the present invention includes the resin sheet or the resin cured sheet (hereinafter collectively referred to as "the sheet of the present invention"), and a metal sheet provided in contact with one or both sides of the sheet of the present invention.

上述金屬板可列舉銅板、鋁板、鐵板等。另外,金屬板或散熱板的厚度並無特別限定。並且,金屬板可使用銅 箔或鋁箔、錫箔等金屬箔。另外,本發明中,將在上述樹脂片的單面或兩面具有上述金屬箔的片稱為附有金屬箔的樹脂片。 Examples of the metal plate include a copper plate, an aluminum plate, and an iron plate. Further, the thickness of the metal plate or the heat dissipation plate is not particularly limited. And, the metal plate can use copper. Metal foil such as foil or aluminum foil or tin foil. Further, in the present invention, the sheet having the metal foil on one side or both sides of the resin sheet is referred to as a metal foil-attached resin sheet.

上述金屬板的厚度較佳為根據使用形態或金屬板的熱導性等而適當設定,具體而言,平均厚度較佳為5 μm~300 μm,更佳為15 μm~200 μm,尤佳為30 μm~150 μm。 The thickness of the metal plate is preferably set according to the use form or the thermal conductivity of the metal plate. Specifically, the average thickness is preferably 5 μm to 300 μm, more preferably 15 μm to 200 μm, and particularly preferably 30 μm to 150 μm.

上述結構體可藉由包括在本發明的片的至少一個面上配置金屬板而獲得積層體的步驟的製造方法而製造。在本發明的片上配置金屬板的方法可無特別限制地使用通常所用的方法。例如可列舉:在本發明的片的至少一個面上貼合金屬板的方法等。貼合的方法可列舉壓製法及層壓法等。壓製法及層壓法的條件可根據樹脂片的構成而適當選擇。 The above structure can be produced by a production method including a step of disposing a metal plate on at least one surface of the sheet of the present invention to obtain a laminate. The method of arranging the metal plate on the sheet of the present invention can be carried out without any particular limitation. For example, a method of bonding a metal plate to at least one surface of the sheet of the present invention may be mentioned. Examples of the bonding method include a pressing method, a lamination method, and the like. The conditions of the pressing method and the lamination method can be appropriately selected depending on the constitution of the resin sheet.

另外,上述結構體可在本發明的片的一個面上具有金屬板,在另一個面上具有被黏接體。在該形態中,由於在被黏接體與金屬板之間夾持上述樹脂片或上述樹脂硬化物片,因此硬化後,被黏接體與金屬板的熱導性優異。上述被黏接體並無特別限制,被黏接體的材質例如可列舉:金屬、樹脂、陶瓷及這些的混合物即複合材料等。 Further, the above structure may have a metal plate on one surface of the sheet of the present invention and a bonded body on the other surface. In this aspect, since the resin sheet or the resin cured sheet is sandwiched between the adherend and the metal plate, the bonded body and the metal plate are excellent in thermal conductivity after curing. The material to be bonded is not particularly limited, and examples of the material of the adherend include a metal, a resin, a ceramic, and a composite material of a mixture thereof.

上述結構體可用於動力用或光源用半導體元件。圖1~圖7表示使用本發明的片而構成的功率半導體裝置、發光二極體(light emitting diode,LED)燈條及LED燈泡的構成例,作為上述結構體的例子。 The above structure can be used for a semiconductor element for power or light source. 1 to 7 show examples of the configuration of the power semiconductor device, the light emitting diode (LED) light bar, and the LED light bulb which are formed using the sheet of the present invention.

圖1中,使用將半硬化樹脂片112、作為半硬化樹脂 片112的保護層的金屬支撐體114積層而成的附有金屬箔的樹脂片110。詳細而言,圖1是表示功率半導體裝置100的構成例的概略剖面圖,在功率半導體裝置100中,功率半導體晶片102經由焊料層104而配置於銅或銅合金的導線架106上,藉由密封樹脂108進行密封並固定化,將本發明的附有金屬箔的樹脂片110中的半硬化樹脂片112與導線架106壓接並硬化,將金屬支撐體114作為半硬化樹脂片112的保護層而構成,經由散熱油膏等熱導材122而配置於散熱片120上。 In Fig. 1, a semi-hardened resin sheet 112 is used as a semi-hardened resin. A metal foil-attached resin sheet 110 is laminated with a metal support 114 of a protective layer of the sheet 112. More specifically, FIG. 1 is a schematic cross-sectional view showing a configuration example of a power semiconductor device 100 in which a power semiconductor wafer 102 is placed on a lead frame 106 of copper or a copper alloy via a solder layer 104. The sealing resin 108 is sealed and fixed, and the semi-hardened resin sheet 112 in the metal foil-attached resin sheet 110 of the present invention is pressed and hardened with the lead frame 106, and the metal support 114 is protected as the semi-hardened resin sheet 112. The layer is configured to be disposed on the heat sink 120 via the heat conductive material 122 such as a heat-dissipating grease.

藉由經由本發明的附有金屬箔的樹脂片110,而在導線架106與散熱片120之間進行電絕緣,並且可將功率半導體晶片102中所產生的熱高效地散熱至散熱片120。另外,上述導線架106為了提高散熱性,亦可使用厚金屬板。上述散熱片120可使用具有熱導性的銅或鋁而構成,而且可藉由進一步形成冷卻用翼或水路,而高效地熱傳遞至空氣中或水等流體。另外,功率半導體晶片可列舉:絕緣閘雙極電晶體(Insulated Gate Bipolar Transistor,IGBT)、金屬氧化物半導體場效電晶體(Metal-Oxide-Semiconductor Field-Effect Transistor,MOS-FET)、二極體、積體電路等。 The electrical insulation between the lead frame 106 and the heat sink 120 is electrically insulated by the metal foil-attached resin sheet 110 of the present invention, and heat generated in the power semiconductor wafer 102 can be efficiently dissipated to the heat sink 120. Further, the lead frame 106 may be a thick metal plate in order to improve heat dissipation. The heat sink 120 can be formed using copper or aluminum having thermal conductivity, and can be efficiently transferred to air or a fluid such as water by further forming a cooling wing or a water path. In addition, examples of the power semiconductor wafer include an insulated gate bipolar transistor (IGBT), a metal-oxide-semiconductor field-effect transistor (MOS-FET), and a diode. , integrated circuits, etc.

另外,以下的圖2~圖7中,對圖1中所說明的構件賦予相同的符號,並省略其說明。 In the following FIGS. 2 to 7 , members denoted by FIG. 1 are denoted by the same reference numerals, and their description will be omitted.

圖2中,使用半硬化樹脂片112。詳細而言,圖2是表示功率半導體裝置150的構成例的概略剖面圖,在功率半導體裝置150中,功率半導體晶片102經由焊料層104 而配置於銅製導線架106上,藉由密封樹脂108進行密封並固定化,將所得的所謂分離式半導體零件、與本發明的半硬化樹脂片112於散熱片120上壓接並熱硬化,並介隔熱導材122而配置。藉由經由本發明的樹脂片112,而與圖1同樣可同時具有絕緣性與散熱性。 In Fig. 2, a semi-hardened resin sheet 112 is used. More specifically, FIG. 2 is a schematic cross-sectional view showing a configuration example of the power semiconductor device 150 in which the power semiconductor wafer 102 passes through the solder layer 104. The copper lead frame 106 is placed on the copper lead frame 106, sealed and fixed by the sealing resin 108, and the obtained so-called split semiconductor component and the semi-hardened resin sheet 112 of the present invention are pressure-bonded to the heat sink 120 and thermally cured. The heat shield member 122 is disposed. By the resin sheet 112 of the present invention, it is possible to have both insulation and heat dissipation properties as in the case of FIG.

圖3是表示功率半導體裝置160的構成例的概略剖面圖,在功率半導體裝置160中,功率半導體晶片102經由焊料層104而配置於銅或銅合金製導線架106上,銅或銅合金製導線架106經由本發明的樹脂片112而壓接於散熱片120上,藉由密封樹脂108進行密封而構成。與圖1同樣可同時具有絕緣性與散熱性。 3 is a schematic cross-sectional view showing a configuration example of the power semiconductor device 160. In the power semiconductor device 160, the power semiconductor wafer 102 is placed on a copper or copper alloy lead frame 106 via a solder layer 104, and a copper or copper alloy wire is used. The holder 106 is crimped to the heat sink 120 via the resin sheet 112 of the present invention, and is sealed by a sealing resin 108. As in Fig. 1, it can have both insulation and heat dissipation.

圖4是表示在功率半導體晶片102的兩面配置散熱片120而構成的功率半導體裝置200的構成例的概略剖面圖。在各散熱片120與導線架106之間配置本發明的附有金屬箔的樹脂片110。另外,間隔物107在功率半導體晶片102與導線架106之間經由焊料層104而配置。藉由該構成,與圖1~圖3的單面冷卻結構相比,可獲得更高的冷卻效果。 FIG. 4 is a schematic cross-sectional view showing a configuration example of the power semiconductor device 200 in which the heat sink 120 is disposed on both surfaces of the power semiconductor wafer 102. The metal foil-attached resin sheet 110 of the present invention is disposed between each of the fins 120 and the lead frame 106. Further, the spacer 107 is disposed between the power semiconductor wafer 102 and the lead frame 106 via the solder layer 104. With this configuration, a higher cooling effect can be obtained than the one-side cooling structure of FIGS. 1 to 3.

圖5是表示在功率半導體晶片102的兩面配置冷卻構件而構成的功率半導體裝置210的構成例的概略剖面圖。本發明的樹脂片112將導線架106與散熱片120黏接,因此不需要間隔物107,而可獲得高於圖4的構成的冷卻效果。 FIG. 5 is a schematic cross-sectional view showing a configuration example of the power semiconductor device 210 in which cooling members are disposed on both surfaces of the power semiconductor wafer 102. The resin sheet 112 of the present invention bonds the lead frame 106 to the heat sink 120, so that the spacer 107 is not required, and a cooling effect higher than that of the configuration of Fig. 4 can be obtained.

圖6是表示使用藉由已形成電路的銅箔116與鋁板 118夾持本發明的樹脂硬化物片112的結構體115而構成的LED燈條300的構成的一例的概略剖面圖。 Figure 6 is a view showing the use of a copper foil 116 and an aluminum plate which have been formed by a circuit A schematic cross-sectional view showing an example of the configuration of the LED light bar 300 formed by sandwiching the structure 115 of the resin cured product sheet 112 of the present invention.

LED燈條300是依序配置外罩132、熱導材122、本發明的結構體115、以及LED個別零件130而構成。作為發熱體的LED個別零件130介隔已形成電路的銅箔116及本發明的樹脂硬化物片112而與金屬板(鋁板)118具有電絕緣性,但可高效地散熱。外罩132藉由採用金屬製,而可發揮出作為散熱片的功能。 The LED light bar 300 is configured by sequentially arranging the outer cover 132, the heat conductive member 122, the structural body 115 of the present invention, and the individual LED components 130. The LED individual component 130 as a heating element is electrically insulated from the metal plate (aluminum plate) 118 by interposing the copper foil 116 having the circuit and the resin cured material sheet 112 of the present invention, but can efficiently dissipate heat. The cover 132 can function as a heat sink by using a metal.

圖7是表示使用藉由已形成電路的銅箔116與鋁板118夾持本發明的樹脂硬化物片112的結構體115而構成的LED燈泡400的構成的一例的概略剖面圖。LED燈泡400具有LED驅動電路142,隔著燈泡筐體140在一側配置燈座146、在另一側依序配置熱導材122、本發明的結構體115、以及LED個別零件130,藉由透鏡144覆蓋LED個別零件130。作為發熱體的LED個別零件130介隔本發明的結構體115而配置於燈泡筐體140上,藉此可高效地散熱。 FIG. 7 is a schematic cross-sectional view showing an example of a configuration of an LED bulb 400 configured by sandwiching a structure 115 of the resin cured product sheet 112 of the present invention with a copper foil 116 having a circuit formed thereon and an aluminum plate 118. The LED bulb 400 has an LED driving circuit 142, and the lamp holder 146 is disposed on one side of the bulb housing 140, and the thermal conductor 122, the structural body 115 of the present invention, and the LED individual component 130 are sequentially disposed on the other side. Lens 144 covers LED individual parts 130. The LED individual component 130 as a heating element is disposed on the bulb housing 140 via the structural body 115 of the present invention, whereby heat can be efficiently dissipated.

[實例] [Example]

以下,藉由實例對本發明進行具體地說明,但本發明並不限定於這些實例。另外,只要無特別說明,「份」及「%」為質量基準。 Hereinafter, the present invention will be specifically described by way of examples, but the present invention is not limited to these examples. In addition, “parts” and “%” are quality standards unless otherwise stated.

以下表示實例中所記載的環氧樹脂、酚醛清漆樹脂、無機填充材、添加劑、及溶劑的種類與縮寫符號或型號。 The types and abbreviations or types of the epoxy resin, the novolak resin, the inorganic filler, the additive, and the solvent described in the examples are shown below.

(環氧樹脂單體) (epoxy resin monomer)

TPM-Ep:三苯基甲烷型環氧樹脂(日本化藥製造的EPPN-502H、多官能、分支型固形環氧樹脂、環氧當量168 g/eq) TPM-Ep: Triphenylmethane type epoxy resin (EPPN-502H manufactured by Nippon Kayaku Co., Ltd., multi-functional, branched solid epoxy resin, epoxy equivalent 168 g/eq)

PhN-Ep:雙酚F酚醛清漆型環氧樹脂(三菱化學製造的jER 152、多官能、直鏈型液狀環氧樹脂、環氧當量165 g/eq) PhN-Ep: bisphenol F novolac type epoxy resin (jER 152 manufactured by Mitsubishi Chemical Corporation, polyfunctional, linear liquid epoxy resin, epoxy equivalent 165 g/eq)

BisAF-Ep:液狀雙酚A型環氧樹脂及雙酚F型環氧樹脂混合物(新日鐵化學製造的ZX-1059、二官能型液狀環氧樹脂、環氧當量165 g/eq) BisAF-Ep: liquid bisphenol A epoxy resin and bisphenol F epoxy resin mixture (ZX-1059, difunctional liquid epoxy resin, epoxy equivalent 165 g/eq) manufactured by Nippon Steel Chemical Co., Ltd.

(硬化劑) (hardener)

ReN:間苯二酚酚醛清漆樹脂(合成品、二元酚型酚醛清漆樹脂(m=2)、羥基當量:62 g/eq、通式(I)的R1:H、R2:H) ReN: resorcinol novolac resin (synthetic product, diphenol novolak resin (m=2), hydroxyl equivalent: 62 g/eq, R 1 :H, R 2 :H of the general formula (I)

RCN:間苯二酚鄰苯二酚酚醛清漆樹脂(合成品、二元酚型酚醛清漆樹脂(m=2)、羥基當量:62 g/eq、通式(I)的R1:H、R2:H) RCN: resorcinol catechol novolac resin (synthesis product, diphenol novolak resin (m=2), hydroxyl equivalent: 62 g/eq, R 1 :H, R of the general formula (I) 2 :H)

XLC:苯酚-伸苯基芳烷基樹脂(三井化學製造的XLC-LL、多官能型固體形狀芳烷基型樹脂、羥基當量:175 g/eq) XLC: phenol-phenylphenyl aralkyl resin (XLC-LL, polyfunctional solid aralkyl resin manufactured by Mitsui Chemicals, hydroxyl equivalent: 175 g/eq)

Res:間苯二酚(和光純藥製造的試劑、二元單核酚化合物、羥基當量55 g/eq) Res: resorcinol (a reagent made from Wako Pure Chemical Industries, a binary mononuclear phenol compound, a hydroxyl equivalent of 55 g/eq)

(無機填充材) (inorganic filler)

HP-40(氮化硼、水島合金鐵製造;體積平均粒徑40 μm、六方晶、凝聚、縱橫比1.5) HP-40 (boron nitride, water island alloy iron; volume average particle size 40 μm, hexagonal crystal, agglomeration, aspect ratio 1.5)

PT-110(氮化硼、日本邁圖(Momentive Japan)製造;體積平均粒徑43 μm、六方晶、鱗片狀、縱橫比10) PT-110 (boron nitride, manufactured by Momentive Japan; volume average particle size 43 μm, hexagonal crystal, scale, aspect ratio 10)

AA-18(氧化鋁、住友化學製造;體積平均粒徑18 μm) AA-18 (alumina, manufactured by Sumitomo Chemical; volume average particle size 18 μm)

AA-3(氧化鋁、住友化學製造;體積平均粒徑3 μm) AA-3 (alumina, manufactured by Sumitomo Chemical; volume average particle size 3 μm)

AA-04(氧化鋁、住友化學製造;體積平均粒徑0.4 μm) AA-04 (manufactured by Alumina and Sumitomo Chemical; volume average particle size 0.4 μm)

Shapal H(氮化鋁、德山(Tokuyama)製造;體積平均粒徑0.5 μm) Shapal H (aluminum nitride, manufactured by Tokuyama; volume average particle size 0.5 μm)

(硬化促進劑) (hardening accelerator)

TPP:三苯基膦(和光純藥公司製造) TPP: Triphenylphosphine (manufactured by Wako Pure Chemical Industries, Ltd.)

(偶合劑) (coupling agent)

PAM:N-苯基-3-胺基丙基三甲氧基矽烷(信越化學工業公司製造、KBM-573) PAM: N-phenyl-3-aminopropyltrimethoxydecane (manufactured by Shin-Etsu Chemical Co., Ltd., KBM-573)

(分散劑) (Dispersant)

BYK-106(日本畢克化學(BYK-Chemie Japan)公司製造) BYK-106 (made by BYK-Chemie Japan)

REB122-4(日立化成工業製造、乳酸乙酯45%溶液) REB122-4 (manufactured by Hitachi Chemical Co., Ltd., ethyl lactate 45% solution)

(溶劑) (solvent)

CHN:環己酮 CHN: cyclohexanone

(支撐體) (support)

PET:已單面脫模處理的聚對苯二甲酸乙二酯膜(藤森工業股份有限公司製造、Filmbyna 75E-0010CTR-4) PET: Polyethylene terephthalate film which has been subjected to single-sided release treatment (manufactured by Fujimori Industrial Co., Ltd., Filmbyna 75E-0010CTR-4)

GTS:電解銅箔(古河電工股份有限公司製造、厚度80 μm、GTS級) GTS: Electrolytic copper foil (manufactured by Furukawa Electric Co., Ltd., thickness 80 μm, GTS grade)

[酚醛清漆樹脂的合成] [Synthesis of Novolak Resin] (ReN的合成) (Synthesis of ReN)

在具備攪拌機、冷卻器及溫度計的1 L可分離式燒瓶中,量取間苯二酚110 g(1 mol)、37%福馬林45 g(約0.5 mol、F/P=0.5)、作為觸媒的草酸1.1 g、作為溶劑的水50 g後,一邊攪拌內容物一邊將油浴設為120℃,一邊回流一邊進行3小時反應。然後,取出冷卻器、安裝蒸餾器,一邊將水蒸餾除去一邊升溫至150℃。進而,以150℃攪拌12小時並繼續反應。反應結束後加熱至170℃,在減壓下使未反應的間苯二酚昇華並歷時8小時除去。除去單體後,移至不鏽鋼槽(stainless vat)中並冷卻而獲得間苯二酚酚醛清漆樹脂(ReN)。 In a 1 L separable flask equipped with a stirrer, a cooler and a thermometer, 110 g (1 mol) of resorcinol and 45 g of fumarin (about 0.5 mol, F/P = 0.5) were taken as a touch. After 1.1 g of oxalic acid and 50 g of water as a solvent, the oil bath was set to 120 ° C while stirring the contents, and the reaction was carried out for 3 hours while refluxing. Then, the cooler was taken out, and the distiller was attached, and the temperature was raised to 150 ° C while distilling off the water. Further, the mixture was stirred at 150 ° C for 12 hours and the reaction was continued. After completion of the reaction, the mixture was heated to 170 ° C, and unreacted resorcinol was sublimed under reduced pressure and removed over 8 hours. After removing the monomer, it was transferred to a stainless vat and cooled to obtain a resorcinol novolak resin (ReN).

間苯二酚酚醛清漆樹脂(ReN)藉由凝膠滲透層析法(gel permeation chromatography,GPC)的分子量測定,單體含有率為8質量%,除單體外的反應產物的數量平均分子量為900。藉由1H NMR(nuclear magnetic resonance,核磁共振)的測定可知,重複單元中包含平均2.0個羥基。藉由將數量平均分子量除以式(I)的結構單元的分子量122,而計算出平均重複單元數n為7.4。另外,羥基當量為62 g/eq。 The resorcinol novolak resin (ReN) has a monomer content of 8 mass%, and the number average molecular weight of the reaction product other than the monomer is determined by molecular weight of gel permeation chromatography (GPC). 900. It was found by 1 H NMR (nuclear magnetic resonance) that the repeating unit contained an average of 2.0 hydroxyl groups. The average number of repeating units n was calculated to be 7.4 by dividing the number average molecular weight by the molecular weight 122 of the structural unit of the formula (I). Further, the hydroxyl equivalent was 62 g/eq.

(RCN的合成) (synthesis of RCN)

在具備攪拌機、冷卻器及溫度計的3 L可分離式燒瓶中,投入間苯二酚627 g、鄰苯二酚33 g、37%福馬林316.2 g、草酸15 g、水300 g,一邊藉由油浴加溫一邊升溫至100℃。在104℃左右進行回流,在回流溫度下進行4小時 反應。然後,一邊將水蒸餾除去一邊將燒瓶內的溫度升溫至170℃。一邊保持170℃一邊繼續反應8小時。反應後,在減壓下進行20分鐘濃縮,將體系內的水等除去而獲得間苯二酚鄰苯二酚酚醛清漆樹脂(RCN)。 In a 3 L separable flask equipped with a stirrer, a cooler and a thermometer, 627 g of resorcinol, 33 g of catechol, 316.2 g of 37% humamine, 15 g of oxalic acid, and 300 g of water were charged. The oil bath was heated to 100 ° C while heating. Reflow at about 104 ° C, 4 hours at reflux temperature reaction. Then, the temperature in the flask was raised to 170 ° C while distilling off the water. The reaction was continued for 8 hours while maintaining 170 °C. After the reaction, the mixture was concentrated under reduced pressure for 20 minutes to remove water or the like in the system to obtain resorcinol catechol novolak resin (RCN).

間苯二酚鄰苯二酚酚醛清漆樹脂(RCN)藉由GPC的分子量測定,單體含有率為8質量%,除單體外的反應產物的數量平均分子量為600。藉由1H NMR的測定可知,重複單元中包含平均1.8個羥基。羥基當量為62 g/eq。另外,藉由場解吸質譜分析(field desorption mass spectrometry,FD-MS)確認結構,結果包含至少1種以上的下述式(VIIIa)~式(VIIId)的任一個所示的二苯并哌喃骨架衍生物。忽視二苯并哌喃骨架衍生物,將數量平均分子量除以式(I)的結構單元的分子量119,藉此計算出平均重複單元數n為5.0。 The resorcinol catechol novolak resin (RCN) has a monomer content of 8% by mass as determined by molecular weight of GPC, and the number average molecular weight of the reaction product other than the monomer is 600. It was found by 1 H NMR that the repeating unit contained an average of 1.8 hydroxyl groups. The hydroxyl equivalent weight was 62 g/eq. In addition, the structure was confirmed by field desorption mass spectrometry (FD-MS), and as a result, at least one of the dibenzopyrans represented by any one of the following formulas (VIIIa) to (VIIId) was contained. Skeleton derivatives. The dibenzopyran skeleton derivative was neglected, and the number average molecular weight was divided by the molecular weight 119 of the structural unit of the formula (I), whereby the average number of repeating units n was calculated to be 5.0.

[化11] [11]

【硬化劑的評價方法] [Evaluation method of hardener]

按以下方式,對上述所得的硬化劑進行物性值的測定。 The physical properties of the hardener obtained above were measured in the following manner.

(分子量測定) (molecular weight determination)

數量平均分子量(Mn)的測定是使用日立製作所股份有限公司製造的高效液相層析儀L6000及島津製作所製造 的資料解析裝置C-R4A來進行。分析用GPC管柱是使用東曹(Tosoh)股份有限公司製造的G2000HXL及G3000HXL。試樣濃度為0.2質量%、移動相是使用四氫呋喃,並以流速1.0 ml/min進行測定。使用聚苯乙烯標準樣品製作校準曲線,使用該校準曲線以聚苯乙烯換算值計算數量平均分子量。 The number average molecular weight (Mn) was measured using a high performance liquid chromatography instrument L6000 manufactured by Hitachi, Ltd. and Shimadzu Corporation. The data analysis device C-R4A is used. The GPC column for analysis was G2000HXL and G3000HXL manufactured by Tosoh Corporation. The sample concentration was 0.2% by mass, and the mobile phase was measured using tetrahydrofuran at a flow rate of 1.0 ml/min. A calibration curve was prepared using a polystyrene standard sample, and the number average molecular weight was calculated using the calibration curve in terms of polystyrene.

(羥基當量) (hydroxy equivalent)

羥基當量是藉由乙醯氯-氫氧化鉀滴定法進行測定。另外,由於溶液顏色為暗色,並非藉由利用指示藥的呈色法,而是藉由電位差滴定來進行滴定終點的判斷。具體而言,將測定樹脂的羥基在吡啶溶液中進行乙醯氯化後,將該過量的試劑用水分解,將所生成的乙酸藉由氫氧化鉀/甲醇溶液進行滴定。 The hydroxyl equivalent is determined by the ethyl chlorohydroxide-potassium hydroxide titration method. Further, since the color of the solution is dark, the determination of the end point of the titration is not performed by potentiometric titration by the coloring method using the indicator. Specifically, after the hydroxyl group of the measurement resin is subjected to acetonitrile chlorination in a pyridine solution, the excess reagent is decomposed with water, and the produced acetic acid is titrated by a potassium hydroxide/methanol solution.

[不含無機填充材的環氧樹脂硬化物的製造] [Manufacture of hardened epoxy resin without inorganic filler] <參考例1> <Reference Example 1>

在經脫模處理的直徑5 cm的不鏽鋼培養皿中,計量作為多官能環氧樹脂的TPM-Ep 100份、作為硬化劑的ReN 37份、作為硬化促進劑的TPP 0.3份,在加熱板上一邊以150℃加熱熔融一邊混合後,在150℃放置1小時進行硬化。接著,進行160℃ 2小時與190℃ 2小時的二次硬化後,自不鏽鋼培養皿取出樹脂硬化物,而獲得環氧樹脂硬化物。動態黏彈性測定的結果是,在300℃以上存在橡膠狀平坦區域,儲存彈性模數的最小值在340℃為230 MPa。 100 parts of TPM-Ep as a multifunctional epoxy resin, 37 parts of ReN as a hardener, 0.3 parts of TPP as a hardening accelerator, on a hot plate in a 5 cm diameter stainless steel petri dish which was subjected to release treatment The mixture was mixed while heating and melting at 150 ° C, and then allowed to stand at 150 ° C for 1 hour to be hardened. Next, after secondary hardening at 160 ° C for 2 hours and 190 ° C for 2 hours, the cured resin was taken out from the stainless steel petri dish to obtain an epoxy resin cured product. As a result of the dynamic viscoelasticity measurement, a rubbery flat region was present at 300 ° C or higher, and the minimum value of the storage elastic modulus was 230 MPa at 340 ° C.

<參考例2> <Reference Example 2>

使用BisAF-Ep 66份代替實例1的作為環氧樹脂的TPM-Ep,使用XLC 71份代替作為硬化劑的ReN,除此以外,以相同的方式獲得樹脂硬化物。 A resin cured product was obtained in the same manner except that 66 parts of BisAF-Ep was used instead of TPM-Ep as an epoxy resin of Example 1, and 71 parts of XLC was used instead of ReN as a hardener.

[參考例1及參考例2的交聯密度的計算] [Calculation of Crosslink Density of Reference Example 1 and Reference Example 2]

根據下述方法,對參考例1及參考例2的樹脂組成的硬化物計算交聯密度。將參考例1與參考例2進行比較,可知參考例1的樹脂組成的硬化物的交聯密度高約12倍。 The crosslink density was calculated for the cured product of the resin compositions of Reference Example 1 and Reference Example 2 according to the following method. Comparing Reference Example 1 with Reference Example 2, it was found that the cured product of the resin composition of Reference Example 1 had a crosslinking density of about 12 times higher.

樹脂硬化物的交聯密度若依據古典橡膠彈性理論,則可根據樹脂硬化物的橡膠狀平坦區域的儲存彈性模數最小值(E'min)並藉由(式2)而求出。 The crosslink density of the cured resin can be determined by (Expression 2) from the minimum value (E'min) of the storage elastic modulus of the rubber-like flat region of the cured resin according to the classical rubber elastic theory.

n:交聯密度(mol/cm3)、Mc:交聯點間平均分子量(g/mol) n: crosslink density (mol/cm 3 ), Mc: average molecular weight between cross-linking points (g/mol)

E'min:拉伸儲存彈性模數最小值(Pa)、ρ:密度(g/cm3) E'min: tensile storage elastic modulus minimum (Pa), ρ: density (g/cm 3 )

Φ:修正係數(front coefficient)(Φ1)、R:氣體常數(J/K.mol) Φ: front coefficient (Φ) 1), R: gas constant (J/K.mol)

T:E'min的絕對溫度(K) T: E'min absolute temperature (K)

[結構體的製造] [Manufacture of structure] <實例1> <Example 1>

在250 mL的聚乙烯瓶中,計量作為多官能環氧樹脂 主劑的TPM-Ep 10.0 g(100份)、作為硬化劑的ReN 3.7 g(37份)、作為硬化促進劑的TPP 0.11 g(1.1份)、作為無機填充材的HP-40 56 g(560份)、AA-04 11.3 g(113份)、作為偶合劑的PAM 0.07 g(0.7份)、作為分散劑的BYK-106 0.1 g(1份)及REB122-4 1.6 g(16份)、作為溶劑的CHN 50 g(500份)、直徑5 mm的氧化鋁珠100 g(1000份)後,將聚乙烯瓶的蓋子密閉,藉由球磨機以轉速100轉/分鐘混合30分鐘而獲得樹脂組成物清漆。 Metered as a multifunctional epoxy resin in a 250 mL polyethylene bottle The main agent has TPM-Ep 10.0 g (100 parts), ReN 3.7 g (37 parts) as a hardener, TPP 0.11 g (1.1 parts) as a hardening accelerator, and HP-40 56 g (560) as an inorganic filler. A), AA-04 11.3 g (113 parts), PAM 0.07 g (0.7 parts) as a coupling agent, BYK-106 0.1 g (1 part) as a dispersing agent, and REB122-4 1.6 g (16 parts) as After the solvent had a CHN of 50 g (500 parts) and a diameter of 5 mm of alumina beads of 100 g (1000 parts), the lid of the polyethylene bottle was sealed, and the resin composition was obtained by mixing at a rotation speed of 100 rpm for 30 minutes by a ball mill. Varnish.

使用間隙為400 μm的敷料器,將所得的樹脂組成物清漆塗佈於聚對苯二甲酸乙二酯(polyethylene terephthalate,PET)膜(藤森工業股份有限公司製造、75E-0010CTR-4)的脫模面上後,迅速在100℃的箱型烘箱中乾燥10分鐘。 The resulting resin composition varnish was applied to a polyethylene terephthalate (PET) film (manufactured by Fujimori Industrial Co., Ltd., 75E-0010 CTR-4) using an applicator having a gap of 400 μm. After the die surface, it was quickly dried in a box oven at 100 ° C for 10 minutes.

接著,將乾燥片切出2片10 cm見方,將樹脂面朝向內側重合2片,藉由真空熱壓製機(熱板150℃、壓力10 MPa、真空度≦1 kPa、處理時間1分鐘)進行熱壓接,製成樹脂組成物層的厚度為200 μm的樹脂片,而獲得B階段片。 Next, the dried sheet was cut out into two pieces of 10 cm square, and the resin surface was superposed on the inner side by two pieces, and the vacuum heat pressing machine (hot plate 150 ° C, pressure 10 MPa, vacuum degree ≦ 1 kPa, treatment time 1 minute) was carried out. The resin sheet having a thickness of 200 μm in the resin composition layer was formed by thermocompression bonding, and a B-stage sheet was obtained.

自所得的B階段片的兩面剝離PET膜,用80 μm厚的GTS銅箔的粗化面側夾持兩面,藉由真空熱壓製機(熱板溫度150℃、真空度≦1 kPa、壓力10 MPa、處理時間10分鐘)進行壓接及硬化,然後在箱型烘箱中進行160℃ 2小時、190℃ 2小時的二次硬化,而獲得在兩面設置有銅箔的結構體。 The PET film was peeled off from both sides of the obtained B-stage sheet, and both sides were sandwiched by the roughened side of the 80 μm thick GTS copper foil by a vacuum hot press (hot plate temperature 150 ° C, vacuum degree 1 kPa, pressure 10) MPa and a treatment time of 10 minutes were subjected to pressure bonding and hardening, and then secondary hardening was performed at 160 ° C for 2 hours and at 190 ° C for 2 hours in a box type oven to obtain a structure in which copper foil was provided on both sides.

<比較例1> <Comparative Example 1>

使用BisAF-Ep 6.6 g(66份)代替實例1的作為環氧樹脂的TPM-Ep,使用XLC 7.1 g(71份)代替作為硬化劑的ReN,除此以外,以相同的方式獲得樹脂硬化物。 A resin cured product was obtained in the same manner except that BisAF-Ep 6.6 g (66 parts) was used instead of TPM-Ep as an epoxy resin of Example 1, and XLC 7.1 g (71 parts) was used instead of ReN as a hardener. .

<比較例2> <Comparative Example 2>

使用84.9 g(849份)的AA-18、30.9 g(309份)的AA-3及12.9 g(129份)的AA-04,代替實例1的作為無機填充材的HP-40及AA-04,除此以外,以與實例1相同的方式獲得樹脂硬化物。 84.9 g (849 parts) of AA-18, 30.9 g (309 parts) of AA-3, and 12.9 g (129 parts) of AA-04 were used instead of HP-40 and AA-04 as inorganic fillers of Example 1. Except for this, a cured resin was obtained in the same manner as in Example 1.

<比較例3> <Comparative Example 3>

使用84.9 g(849份)的AA-18、0.9 g(309份)的AA-3 3及12.9 g(129份)的AA-04,代替比較例1的作為無機填充材的HP-40及AA-04,除此以外,以與比較例1相同的方式獲得樹脂硬化物。 84.9 g (849 parts) of AA-18, 0.9 g (309 parts) of AA-3 3 and 12.9 g (129 parts) of AA-04 were used instead of HP-40 and AA as inorganic fillers of Comparative Example 1. -04, except that the resin cured product was obtained in the same manner as in Comparative Example 1.

[除去銅箔的樹脂片硬化物樣品的製作] [Preparation of a resin sheet cured sample from which copper foil is removed]

將所得的兩面附有銅箔的樹脂片硬化物浸漬於20%的過硫酸鈉水溶液的蝕刻液中,處理至銅箔完全溶解為止。銅箔除去完成後,將片狀硬化物充分水洗,以120℃乾燥4小時,將所得的樣品作為除去銅箔的樹脂片硬化物樣品。 The obtained cured resin sheet having copper foil on both sides thereof was immersed in an etching solution of a 20% aqueous solution of sodium persulfate, and the mixture was treated until the copper foil was completely dissolved. After the copper foil removal was completed, the sheet-like cured product was sufficiently washed with water, and dried at 120 ° C for 4 hours, and the obtained sample was used as a resin sheet cured product sample from which copper foil was removed.

(熱擴散率的評價) (Evaluation of thermal diffusivity)

自除去銅箔的樹脂片硬化物樣品切出10 mm見方的樣品,使用NETZSCH公司製造的Nanoflash LFA447型,藉由閃光法測定25℃時的已除去銅箔的樹脂片硬化物的厚度方向的熱擴散率。 A sample of a cured sheet of a copper foil was removed, and a 10 mm square sample was cut out, and the heat of the thickness direction of the cured copper sheet-removed resin sheet at 25 ° C was measured by a flash method using a Nanoflash LFA447 model manufactured by NETZSCH Co., Ltd. Diffusion rate.

(比熱的評價) (Evaluation of specific heat)

以重量為20 mg~40 mg的方式自除去銅箔的樹脂片硬化物樣品切出數片約3 mm見方的樣品。使用示差掃描熱量計(珀金埃爾默(PERKINELMER)公司製造的Pyris-1),將藍寶石作為基準試樣,測定25℃時的已除去銅箔的樹脂片硬化物的比熱。 A sample of about 3 mm square was cut out from the cured sheet of the resin sheet of the copper foil in a weight of 20 mg to 40 mg. The specific heat of the cured copper sheet-removed resin sheet at 25 ° C was measured using a differential scanning calorimeter (Pyris-1 manufactured by PERKINELMER Co., Ltd.) as a reference sample.

(密度的評價) (Evaluation of density)

使用阿基米德法密度測定裝置(阿發米拉(Alfa mirage)公司製造的SD-200L),測定25℃時的已除去銅箔的樹脂片硬化物的密度。 The density of the cured copper sheet-removed resin sheet at 25 ° C was measured using an Archimedes-based density measuring apparatus (SD-200L manufactured by Alfa Mirage Co., Ltd.).

(熱導率的評價) (Evaluation of thermal conductivity)

將上述所求出的熱擴散率、比熱及密度代入(式3),求出樹脂硬化物片的厚度方向的熱導率。 The thermal diffusivity, the specific heat, and the density obtained above were substituted into (Formula 3), and the thermal conductivity in the thickness direction of the cured resin sheet was determined.

λ=α.Cp.ρ (式3) λ=α. Cp. ρ (Formula 3)

λ:熱導率(W/m.K)、α:熱擴散率(mm2/s) λ: thermal conductivity (W/m.K), α: thermal diffusivity (mm 2 /s)

Cp:比熱(J/kg.K)、ρ:密度(g/cm3) Cp: specific heat (J/kg.K), ρ: density (g/cm 3 )

[儲存彈性模數及玻璃轉移溫度的測定] [Measurement of storage elastic modulus and glass transition temperature]

自除去銅箔的樹脂片硬化物切出長度33 mm×寬度5 mm的試樣,使用流變科學(Rheometric Scientific)公司製造的SOLIDS ANALYZER II,藉由拉伸模式測定30℃~350℃的儲存彈性模數的溫度依存性。 A sample having a length of 33 mm × a width of 5 mm was cut out from the cured sheet of the resin sheet from which the copper foil was removed, and stored at 30 ° C to 350 ° C by a tensile mode using a SOLIDS ANALYZER II manufactured by Rheometric Scientific Co., Ltd. The temperature dependence of the elastic modulus.

讀取tanδ的峰值溫度作為動態黏彈性測定時的玻璃轉 移溫度(Tg)。試驗條件設為:升溫速度5℃/分鐘、頻率10 Hz、跨距21 mm、拉伸應變量0.1%、空氣環境中。 Read the peak temperature of tan δ as the glass transition in dynamic viscoelasticity measurement Shift temperature (Tg). The test conditions were as follows: a heating rate of 5 ° C / min, a frequency of 10 Hz, a span of 21 mm, a tensile strain of 0.1%, and an air atmosphere.

(結果) (result)

根據實例1與比較例1的結果可明白,若將氮化硼作為無機填充材的主成分,若基質樹脂的交聯密度為約13倍,則熱導率提高3成。 According to the results of Example 1 and Comparative Example 1, it is understood that when boron nitride is used as a main component of the inorganic filler, if the crosslinking density of the matrix resin is about 13 times, the thermal conductivity is improved by 30%.

另一方面,根據比較例2與比較例3的結果可明白,若將氧化鋁作為無機填充材的主成分,則即便基質樹脂的交聯密度為約12倍,亦限於提高1成。根據比較例2的玻璃轉移溫度比實例1降低45℃,認為原因是,氧化鋁的吸 附水阻礙硬化反應而降低交聯密度。 On the other hand, according to the results of Comparative Example 2 and Comparative Example 3, when alumina is used as the main component of the inorganic filler, even if the crosslinking density of the matrix resin is about 12 times, it is limited to 10%. The glass transition temperature according to Comparative Example 2 was lowered by 45 ° C compared to Example 1, and the reason was that the adsorption of alumina was Water is attached to hinder the hardening reaction and reduce the crosslinking density.

[結構體的製造] [Manufacture of structure] <實例2~實例12、比較例4~比較例5> <Example 2 to Example 12, Comparative Example 4 to Comparative Example 5>

根據實例1的順序,調配表2所示的材料,而獲得樹脂硬化物。另外,以與實例1相同的量調配表2未記載的材料,即硬化促進劑、偶合劑、分散劑。 According to the procedure of Example 1, the materials shown in Table 2 were blended to obtain a cured resin. Further, materials not described in Table 2, that is, a curing accelerator, a coupling agent, and a dispersing agent were blended in the same amounts as in Example 1.

[評價方法] [Evaluation method]

對上述所得的樹脂組成物,以與上述相同的方式,測定樹脂硬化物的熱導率及玻璃轉移溫度。並且,按以下方式評價樹脂組成物的柔軟性、及由樹脂組成物形成的樹脂硬化物的絕緣破壞電壓。將結果表示於表2。 The thermal conductivity and the glass transition temperature of the cured resin were measured in the same manner as described above for the resin composition obtained above. Further, the flexibility of the resin composition and the dielectric breakdown voltage of the cured resin formed of the resin composition were evaluated in the following manner. The results are shown in Table 2.

(柔軟性評價) (softness evaluation)

將所製作的B-階段片切出長度100 mm、寬度10 mm,並除去表面的PET膜。在鋁製、且多段重疊直徑為20 mm~140 mm、刻紋20 mm的圓板的夾具中提供樣品,將在25℃下不破損而彎曲的最小徑為20 mm的情形以◎評價為良好;將不破損而彎曲的最小徑為40 mm或60 mm的情形以○進行評價;將不破損而彎曲的最小徑為80 m或100 m的情形以△評價為實用的極限;將不破損而彎曲的最小徑為120 mm以上的情形以×評價為不適合。 The produced B-stage sheet was cut into a length of 100 mm and a width of 10 mm, and the PET film on the surface was removed. A sample was provided in a fixture made of aluminum and having a plurality of discs having a diameter of 20 mm to 140 mm and a score of 20 mm, and the minimum diameter of 20 mm which was bent without damage at 25 ° C was evaluated as good. The case where the minimum diameter of bending is 40 mm or 60 mm without damage is evaluated by ○; the case where the minimum diameter of bending is 80 m or 100 m without damage is evaluated as a practical limit; The case where the minimum diameter of the curve is 120 mm or more is evaluated as not suitable.

(絕緣破壞電壓測定) (Measurement of dielectric breakdown voltage)

在金屬製容器中放置除去銅箔的樹脂片硬化物樣品,將電極(鋁製平圓電極、直徑25 mm、接觸面20 mm)設置成片狀。接著,注入Fluorinert絕緣油(3M公司製造的 FC-40),在浸漬於Fluorinert中的狀態下使用總研電製造的DAC-6032C測定25℃時的絕緣破壞電壓。測定條件設為:頻率50 Hz、升壓速度500 V/秒的固定速度升壓。 A resin sheet cured sample from which copper foil was removed was placed in a metal container, and an electrode (a flat electrode made of aluminum, a diameter of 25 mm, and a contact surface of 20 mm) was placed in a sheet shape. Next, inject Fluorinert insulating oil (manufactured by 3M Company) FC-40), the dielectric breakdown voltage at 25 ° C was measured using a DAC-6032C manufactured by Total Electric Co., Ltd. in a state of being immersed in Fluorinert. The measurement conditions were set to a fixed speed boost of a frequency of 50 Hz and a boosting speed of 500 V/sec.

實例1~實例12與比較例1~比較例5相比,硬化前具有優異的柔軟性,硬化後表現高的熱導率。 In Examples 1 to 12, compared with Comparative Example 1 to Comparative Example 5, it had excellent flexibility before curing, and exhibited high thermal conductivity after curing.

若更詳細地確認,則在實例1、實例12及比較例4的比較中,TPM-Ep、PhN-Ep、BisAF-Ep的羥基當量大致同等,調配量亦大致同等,但熱導率大大不同。TPM-Ep是重複單元中具有反應性末端的分支結構且交聯密度變高的 樹脂骨架,因此與多官能型、直鏈結構的PhN-Ep及二官能的Bis-AF相比,可以說表現出熱導率提高的效果。 In more detail, in the comparison of Example 1, Example 12, and Comparative Example 4, the hydroxyl equivalents of TPM-Ep, PhN-Ep, and BisAF-Ep were approximately the same, and the blending amounts were approximately the same, but the thermal conductivity was greatly different. . TPM-Ep is a branched structure having a reactive end in a repeating unit and has a high crosslinking density Since the resin skeleton is compared with the polyfunctional or linear-structured PhN-Ep and the difunctional Bis-AF, it can be said that the effect of improving the thermal conductivity is exhibited.

比較例1、比較例4、比較例5的結果與實例1相比,熱導率降低,認為原因是環氧樹脂組成物的交聯密度低。 The results of Comparative Example 1, Comparative Example 4, and Comparative Example 5 were lower than those of Example 1, and the reason was that the crosslinking density of the epoxy resin composition was low.

而且,根據實例1~實例5的結果的比較,藉由添加二官能環氧樹脂或單核二元酚化合物而柔軟性提高,若將二官能環氧樹脂及單核二元酚化合物這兩種加以組合,則可獲得充分的柔軟性。另一方面認為,藉由添加二官能環氧樹脂或單核二元酚化合物,而交聯密度降低,熱導率與實例1相比降低。另外,實例6及實例7中所使用的RCN由於包含單體,因此認為可獲得與實例4及實例5同等的柔軟化效果。 Further, according to the comparison of the results of Examples 1 to 5, the flexibility is improved by adding a difunctional epoxy resin or a mononuclear dihydric phenol compound, and if a difunctional epoxy resin and a mononuclear dihydric phenol compound are used, When combined, sufficient flexibility can be obtained. On the other hand, it is considered that by adding a difunctional epoxy resin or a mononuclear dihydric phenol compound, the crosslinking density is lowered, and the thermal conductivity is lowered as compared with Example 1. Further, since the RCN used in Examples 6 and 7 contained monomers, it was considered that the same softening effects as those of Examples 4 and 5 were obtained.

實例8~實例10的結果與實例1、實例6、實例7相比,可以說可減少氮化硼而增加氧化鋁的比例直至無機填充材的34體積%。 The results of Examples 8 to 10 are comparable to those of Example 1, Example 6, and Example 7, and it can be said that boron nitride can be reduced to increase the proportion of alumina up to 34% by volume of the inorganic filler.

實例11的結果與實例1相比,可以說若使用具有較氧化鋁更高的熱導率的氮化鋁作為小粒徑填料,則能夠提高樹脂硬化物的熱導率。 As a result of Example 11, as compared with Example 1, it can be said that if aluminum nitride having a higher thermal conductivity than alumina is used as the small-particle diameter filler, the thermal conductivity of the cured resin can be improved.

100、150、160、200、210‧‧‧功率半導體裝置 100, 150, 160, 200, 210‧‧‧ power semiconductor devices

102‧‧‧功率半導體晶片 102‧‧‧Power semiconductor wafer

104‧‧‧焊料層 104‧‧‧ solder layer

106‧‧‧配線用金屬板(導線架、匯流排) 106‧‧‧Metal plates for wiring (conductor, busbar)

107‧‧‧間隔物 107‧‧‧ spacers

108‧‧‧密封樹脂 108‧‧‧ Sealing resin

110‧‧‧附有金屬箔的樹脂片 110‧‧‧Resin sheet with metal foil

112‧‧‧樹脂片或樹脂硬化物片 112‧‧‧Resin sheet or resin cured sheet

114‧‧‧金屬箔支撐體 114‧‧‧metal foil support

115‧‧‧結構體 115‧‧‧ structure

116‧‧‧已電路加工的金屬箔 116‧‧‧Circuit processed metal foil

118‧‧‧金屬板 118‧‧‧Metal plate

120‧‧‧散熱片 120‧‧‧ Heat sink

122‧‧‧熱導材(散熱油膏、散熱片、相變片) 122‧‧‧Hot conductive materials (heat-dissipating grease, heat sink, phase change film)

130‧‧‧LED個別零件 130‧‧‧LED individual parts

132‧‧‧外罩 132‧‧‧ Cover

140‧‧‧LED燈泡筐體 140‧‧‧LED bulb housing

142‧‧‧LED驅動電路 142‧‧‧LED drive circuit

144‧‧‧透鏡 144‧‧‧ lens

146‧‧‧燈座 146‧‧‧ lamp holder

300‧‧‧LED燈條 300‧‧‧LED strips

400‧‧‧LED燈泡 400‧‧‧LED bulb

圖1是表示使用本發明的附有金屬箔的樹脂片而構成的功率半導體裝置的構成例的概略剖面圖。 1 is a schematic cross-sectional view showing a configuration example of a power semiconductor device configured by using a metal foil-attached resin sheet of the present invention.

圖2是表示使用本發明的樹脂片而構成的功率半導體裝置的其他構成例的概略剖面圖。 2 is a schematic cross-sectional view showing another configuration example of a power semiconductor device configured by using the resin sheet of the present invention.

圖3是表示使用本發明的樹脂片而構成的功率半導體 裝置的其他構成例的概略剖面圖。 Figure 3 is a diagram showing a power semiconductor constructed using the resin sheet of the present invention. A schematic cross-sectional view of another configuration example of the device.

圖4是表示使用本發明的附有金屬箔的樹脂片而構成的功率半導體裝置的其他構成例的概略剖面圖。 4 is a schematic cross-sectional view showing another configuration example of a power semiconductor device configured by using a metal foil-attached resin sheet of the present invention.

圖5是表示使用本發明的樹脂片而構成的功率半導體裝置的其他構成例的概略剖面圖。 FIG. 5 is a schematic cross-sectional view showing another configuration example of a power semiconductor device configured by using the resin sheet of the present invention.

圖6是表示使用本發明的結構體而構成的LED燈條的構成例的概略剖面圖。 Fig. 6 is a schematic cross-sectional view showing a configuration example of an LED light bar constructed by using the structure of the present invention.

圖7是表示使用本發明的結構體而構成的LED燈泡的構成例的概略剖面圖。 FIG. 7 is a schematic cross-sectional view showing a configuration example of an LED light bulb configured by using the structure of the present invention.

100‧‧‧功率半導體裝置 100‧‧‧Power semiconductor devices

102‧‧‧功率半導體晶片 102‧‧‧Power semiconductor wafer

104‧‧‧焊料層 104‧‧‧ solder layer

106‧‧‧配線用金屬板(導線架、匯流排) 106‧‧‧Metal plates for wiring (conductor, busbar)

108‧‧‧密封樹脂 108‧‧‧ Sealing resin

110‧‧‧附有金屬箔的樹脂片 110‧‧‧Resin sheet with metal foil

112‧‧‧樹脂片或樹脂硬化物片 112‧‧‧Resin sheet or resin cured sheet

114‧‧‧金屬箔支撐體 114‧‧‧metal foil support

120‧‧‧散熱片 120‧‧‧ Heat sink

122‧‧‧熱導材(散熱油膏、散熱片、相變片) 122‧‧‧Hot conductive materials (heat-dissipating grease, heat sink, phase change film)

Claims (19)

一種樹脂組成物,含有:包含多官能環氧樹脂的環氧樹脂、包含具有下述通式(I)所示的結構單元的酚醛清漆樹脂的硬化劑、以及包含氮化物粒子的無機填充材: 通式(I)中,R1及R2分別獨立表示氫原子或甲基,m以平均值表示1.5~2.5,n以平均值表示1~15。 A resin composition comprising: an epoxy resin containing a polyfunctional epoxy resin; a hardener comprising a novolac resin having a structural unit represented by the following formula (I); and an inorganic filler comprising nitride particles: In the formula (I), R 1 and R 2 each independently represent a hydrogen atom or a methyl group, m represents an average value of 1.5 to 2.5, and n represents an average value of 1 to 15. 如申請專利範圍第1項所述之樹脂組成物,其中上述多官能環氧樹脂實質上不具有液晶基元骨架。 The resin composition according to claim 1, wherein the polyfunctional epoxy resin does not substantially have a liquid crystal skeleton. 如申請專利範圍第1項或第2項所述之樹脂組成物,其中上述多官能環氧樹脂具有分支結構,並在分支結構所造成的側鏈具有反應性環氧基。 The resin composition according to claim 1 or 2, wherein the polyfunctional epoxy resin has a branched structure and has a reactive epoxy group in a side chain caused by the branched structure. 如申請專利範圍第1項至第3項中任一項所述之樹脂組成物,其中將不含上述無機填充材的樹脂組成物硬化時的樹脂硬化物的交聯密度為5 mmol/cm3以上。 The resin composition according to any one of claims 1 to 3, wherein the resin cured product when the resin composition containing the inorganic filler is not cured has a crosslinking density of 5 mmol/cm 3 the above. 如申請專利範圍第1項至第4項中任一項所述之樹脂組成物,其中含有50體積%~85體積%的上述無機填充材。 The resin composition according to any one of claims 1 to 4, which contains 50% by volume to 85% by volume of the above inorganic filler. 如申請專利範圍第1項至第5項中任一項所述之樹脂組成物,其中在全部環氧樹脂中含有20質量%以上的上述多官能環氧樹脂。 The resin composition according to any one of the items 1 to 5, wherein the epoxy resin contains 20% by mass or more of the above polyfunctional epoxy resin. 如申請專利範圍第1項至第6項中任一項所述之樹脂組成物,其中上述多官能環氧樹脂是選自三苯基甲烷型環氧樹脂、四苯基乙烷型環氧樹脂、二羥基苯酚醛清漆型環氧樹脂及縮水甘油胺型環氧樹脂中的至少一種。 The resin composition according to any one of claims 1 to 6, wherein the polyfunctional epoxy resin is selected from the group consisting of a triphenylmethane type epoxy resin and a tetraphenylethane type epoxy resin. At least one of a dihydroxy novolac type epoxy resin and a glycidylamine type epoxy resin. 如申請專利範圍第1項至第7項中任一項所述之樹脂組成物,其中上述環氧樹脂進一步包含液狀或半固體形狀環氧樹脂,上述液狀或半固體形狀環氧樹脂是選自雙酚A型環氧樹脂、雙酚F型環氧樹脂、雙酚A型及F型環氧樹脂、雙酚F型酚醛清漆型環氧樹脂、萘二醇型環氧樹脂以及縮水甘油胺型環氧樹脂中的至少一種。 The resin composition according to any one of claims 1 to 7, wherein the epoxy resin further comprises a liquid or semi-solid epoxy resin, and the liquid or semi-solid epoxy resin is Selected from bisphenol A epoxy resin, bisphenol F epoxy resin, bisphenol A and F epoxy resin, bisphenol F novolak epoxy resin, naphthalene glycol epoxy resin and glycidol At least one of the amine type epoxy resins. 如申請專利範圍第1項至第8項中任一項所述之樹脂組成物,其中上述硬化劑含有20質量%~70質量%的選自單核二羥基苯的至少一種。 The resin composition according to any one of claims 1 to 8, wherein the curing agent contains 20% by mass to 70% by mass of at least one selected from the group consisting of mononuclear dihydroxybenzenes. 如申請專利範圍第1項至第9項中任一項所述之樹脂組成物,其中上述無機填充材中含有50體積%~95體積%的上述氮化物粒子。 The resin composition according to any one of claims 1 to 9, wherein the inorganic filler contains 50% by volume to 95% by volume of the nitride particles. 如申請專利範圍第1項至第10項中任一項所述之樹脂組成物,其中上述氮化物粒子是六方晶氮化硼的凝聚物或粉碎物,長徑與短徑之比率為2以下。 The resin composition according to any one of the preceding claims, wherein the nitride particles are agglomerates or pulverized materials of hexagonal boron nitride, and a ratio of a major axis to a minor axis is 2 or less. . 如申請專利範圍第1項至第11項中任一項所述之樹脂組成物,其中進一步包含偶合劑。 The resin composition according to any one of claims 1 to 11, further comprising a coupling agent. 如申請專利範圍第1項至第12項中任一項所述之樹脂組成物,其中進一步包含分散劑。 The resin composition according to any one of claims 1 to 12, further comprising a dispersing agent. 一種樹脂片,其是如申請專利範圍第1項至第13項中任一項所述之樹脂組成物的未硬化物或半硬化物。 A resin sheet which is an uncured or semi-cured product of the resin composition according to any one of claims 1 to 13. 一種附有金屬箔的樹脂片,包括:如申請專利範圍第14項所述之樹脂片、以及金屬箔。 A resin sheet with a metal foil, comprising: a resin sheet as described in claim 14 of the patent application, and a metal foil. 一種樹脂硬化物片,其是如申請專利範圍第1項至第13項中任一項所述之樹脂組成物的硬化物。 A cured resin sheet which is a cured product of the resin composition according to any one of claims 1 to 13. 如申請專利範圍第16項所述之樹脂硬化物片,其中厚度方向的熱導率為10 W/m.K以上。 The resin cured sheet according to claim 16, wherein the thermal conductivity in the thickness direction is 10 W/m. K or more. 一種結構體,包括:如申請專利範圍第14項所述之樹脂片或如申請專利範圍第16項或第17項所述之樹脂硬化物片、及與上述樹脂片或上述樹脂硬化物片的單面或兩面接觸而設置的金屬板。 A structure comprising the resin sheet according to claim 14 or the resin cured sheet according to claim 16 or 17, and the resin sheet or the cured resin sheet. A metal plate that is placed on one or both sides. 一種動力用或光源用半導體元件,包括:如申請專利範圍第14項所述之樹脂片、如申請專利範圍第15項所述之附有金屬箔的樹脂片、如申請專利範圍第16項或第17項所述之樹脂硬化物片、或如申請專利範圍第18項所述之結構體。 A semiconductor element for a power source or a light source, comprising: a resin sheet according to claim 14 of the patent application, a metal foil-attached resin sheet according to claim 15 of the patent application, as claimed in claim 16 or The cured resin sheet according to item 17, or the structure according to item 18 of the patent application.
TW101131781A 2011-08-31 2012-08-31 Resin composition, resin sheet, resin sheet with metal foil, cured resin sheet, structure, and semiconductor device for power or luminous source TWI548692B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2011/069845 WO2013030998A1 (en) 2011-08-31 2011-08-31 Resin composition, resin sheet, resin sheet with metal foil, hardened resin sheet, structure, and semiconductor device for power or light source

Publications (2)

Publication Number Publication Date
TW201319158A true TW201319158A (en) 2013-05-16
TWI548692B TWI548692B (en) 2016-09-11

Family

ID=47755547

Family Applications (2)

Application Number Title Priority Date Filing Date
TW105112040A TWI585147B (en) 2011-08-31 2012-08-31 Resin composition, resin sheet, resin sheet with metal foil, cured resin sheet, structure, and semiconductor device for power or luminous source
TW101131781A TWI548692B (en) 2011-08-31 2012-08-31 Resin composition, resin sheet, resin sheet with metal foil, cured resin sheet, structure, and semiconductor device for power or luminous source

Family Applications Before (1)

Application Number Title Priority Date Filing Date
TW105112040A TWI585147B (en) 2011-08-31 2012-08-31 Resin composition, resin sheet, resin sheet with metal foil, cured resin sheet, structure, and semiconductor device for power or luminous source

Country Status (5)

Country Link
JP (1) JP5850056B2 (en)
KR (3) KR101970771B1 (en)
CN (1) CN103764713B (en)
TW (2) TWI585147B (en)
WO (1) WO2013030998A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI649903B (en) * 2014-05-08 2019-02-01 羅冠傑 Slice white light emitting diode, preparing chip white light emitting diode Body method and package adhesive
TWI842113B (en) * 2022-09-26 2024-05-11 大陸商鵬鼎控股(深圳)股份有限公司 Circuit board with heat dissipation performance and method for fabrication of the same

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5373215B1 (en) * 2013-03-28 2013-12-18 日東電工株式会社 System, manufacturing condition determination device and manufacturing management device
CN103959488B (en) * 2013-03-28 2015-09-30 日东电工株式会社 System, manufacturing condition determination device and manufacturing management device
JP6635034B2 (en) * 2014-07-02 2020-01-22 住友ベークライト株式会社 Semiconductor device
JP6536045B2 (en) * 2015-01-28 2019-07-03 日立化成株式会社 Resin composition, resin sheet and cured resin sheet
JP6222209B2 (en) * 2015-12-04 2017-11-01 日立化成株式会社 Resin composition, resin sheet, resin sheet with metal foil, cured resin sheet, structure, and semiconductor device for power or light source
JP6616344B2 (en) * 2017-03-24 2019-12-04 株式会社豊田中央研究所 Thermally conductive composite material
CN107958857B (en) * 2017-11-28 2024-03-19 北方电子研究院安徽有限公司 Briquetting trigger device and epoxy resin vacuum low-pressure packaging process method
EP3816237A4 (en) * 2018-06-26 2022-03-23 Kyocera Corporation Organic substrate, metal-clad laminate and wiring board
WO2020067364A1 (en) * 2018-09-28 2020-04-02 富士フイルム株式会社 Composition for forming heat conductive materials, heat conductive material, heat conductive sheet, device with heat conductive layer, and film
EP3733753A1 (en) * 2019-05-03 2020-11-04 3M Innovative Properties Company Film usable for roll-to-roll processing of flexible electronic devices comprising a composite material of a polymer and boron nitride
JP7424168B2 (en) * 2020-03-31 2024-01-30 味の素株式会社 Resin compositions, resin pastes, cured products, resin sheets, printed wiring boards, semiconductor chip packages, and semiconductor devices
JP7424167B2 (en) * 2020-03-31 2024-01-30 味の素株式会社 Resin compositions, cured products of resin compositions, resin sheets, printed wiring boards, semiconductor chip packages, and semiconductor devices
JPWO2023189609A1 (en) * 2022-03-31 2023-10-05
JPWO2023189610A1 (en) * 2022-03-31 2023-10-05
TWI839000B (en) * 2022-12-05 2024-04-11 立錡科技股份有限公司 Package structure and packaging method

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03258829A (en) * 1990-03-07 1991-11-19 Mitsui Toatsu Chem Inc Highly heat-hesistant epoxy resin composition
JPH03258830A (en) * 1990-03-08 1991-11-19 Mitsui Toatsu Chem Inc Epoxy resin composition for sealing semiconductor
JP3151826B2 (en) * 1990-11-07 2001-04-03 日立化成工業株式会社 Epoxy resin molding compound for sealing electronic components
JPH09328610A (en) * 1996-06-12 1997-12-22 Nitto Denko Corp Tubular material made of heat-resistant resin
US6645612B2 (en) * 2001-08-07 2003-11-11 Saint-Gobain Ceramics & Plastics, Inc. High solids hBN slurry, hBN paste, spherical hBN powder, and methods of making and using them
JP5010112B2 (en) * 2004-07-26 2012-08-29 新神戸電機株式会社 Manufacturing method of prepreg, manufacturing method of laminated board and printed wiring board
PL2119737T3 (en) * 2008-05-15 2011-09-30 Evonik Degussa Gmbh Electronic packaging
WO2011040415A1 (en) * 2009-09-29 2011-04-07 日立化成工業株式会社 Multilayer resin sheet and method for producing same, method for producing multilayer resin sheet cured product, and highly thermally conductive resin sheet laminate and method for producing same
CN105542125B (en) * 2009-09-29 2018-02-06 日立化成株式会社 Resin combination, resin sheet, resin cured matter and its manufacture method, resin laminate and its manufacture method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI649903B (en) * 2014-05-08 2019-02-01 羅冠傑 Slice white light emitting diode, preparing chip white light emitting diode Body method and package adhesive
TWI842113B (en) * 2022-09-26 2024-05-11 大陸商鵬鼎控股(深圳)股份有限公司 Circuit board with heat dissipation performance and method for fabrication of the same

Also Published As

Publication number Publication date
TWI548692B (en) 2016-09-11
KR101825259B1 (en) 2018-02-02
KR101970771B1 (en) 2019-04-22
JP5850056B2 (en) 2016-02-03
KR20180012343A (en) 2018-02-05
KR20190042109A (en) 2019-04-23
CN103764713A (en) 2014-04-30
WO2013030998A1 (en) 2013-03-07
TW201625735A (en) 2016-07-16
TWI585147B (en) 2017-06-01
JPWO2013030998A1 (en) 2015-03-23
CN103764713B (en) 2016-08-24
KR102081876B1 (en) 2020-02-26
KR20140071377A (en) 2014-06-11

Similar Documents

Publication Publication Date Title
TWI585147B (en) Resin composition, resin sheet, resin sheet with metal foil, cured resin sheet, structure, and semiconductor device for power or luminous source
JP6222209B2 (en) Resin composition, resin sheet, resin sheet with metal foil, cured resin sheet, structure, and semiconductor device for power or light source
JP5397476B2 (en) Resin composition, resin sheet, and cured resin and method for producing the same
JP6048039B2 (en) Resin composition, resin sheet, resin sheet cured product, resin sheet laminate, resin sheet laminate cured product and method for manufacturing the same, semiconductor device, and LED device
EP3121210A1 (en) Resin composition, resin sheet, resin sheet cured product, resin sheet laminate, resin sheet laminate cured product and method for producing same, semiconductor device, and led device.
TW201512292A (en) Resin composition, resin sheet, cured resin sheet, resin sheet structure, cured resin sheet structure, method of producing cured resin sheet structure, semiconductor device and LED device
WO2015059950A1 (en) Polyimide resin composition, and heat-conductive adhesive film produced using same
WO2021117758A1 (en) Thermosetting resin composition, resin sheet, and metal base substrate
TWI728057B (en) Resin sheet and cured resin sheet
JP6536045B2 (en) Resin composition, resin sheet and cured resin sheet
JP5888584B2 (en) Resin composition, resin sheet, prepreg sheet, cured resin sheet, structure, and semiconductor device for power or light source
JP2019064089A (en) Epoxy resin sheet, method for producing epoxy resin sheet, and method for producing insulator and method for producing electrical device
JP2021031600A (en) Resin composition, resin sheet, and resin sheet cured product
JP7577932B2 (en) Phenolic compound, phenolic curing agent, thermosetting resin composition, and method for producing phenolic compound
JP2024141872A (en) Thermally conductive sheet, metal base substrate, electronic device, and thermosetting resin composition
JP2024135026A (en) Thermosetting resin composition, thermally conductive sheet, metal base substrate, and electronic device
JP2024134291A (en) Thermosetting resin composition, resin sheet, metal base substrate, and electronic device

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees