TW201318805A - Manufacturing method of optical sheet, manufacturing method of mold for manufacturing optical sheet, electronic display device and method of mirror finishing - Google Patents

Manufacturing method of optical sheet, manufacturing method of mold for manufacturing optical sheet, electronic display device and method of mirror finishing Download PDF

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Publication number
TW201318805A
TW201318805A TW101137562A TW101137562A TW201318805A TW 201318805 A TW201318805 A TW 201318805A TW 101137562 A TW101137562 A TW 101137562A TW 101137562 A TW101137562 A TW 101137562A TW 201318805 A TW201318805 A TW 201318805A
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Taiwan
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optical sheet
base material
mold
cutting
aluminum base
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TW101137562A
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Chinese (zh)
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Makoto Ookawa
Mitsuharu Hamanaka
Kazuya Takanashi
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Mitsubishi Rayon Co
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Publication of TW201318805A publication Critical patent/TW201318805A/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23BTURNING; BORING
    • B23B5/00Turning-machines or devices specially adapted for particular work; Accessories specially adapted therefor
    • B23B5/08Turning-machines or devices specially adapted for particular work; Accessories specially adapted therefor for turning axles, bars, rods, tubes, rolls, i.e. shaft-turning lathes, roll lathes; Centreless turning
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23BTURNING; BORING
    • B23B27/00Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
    • B23B27/14Cutting tools of which the bits or tips or cutting inserts are of special material
    • B23B27/18Cutting tools of which the bits or tips or cutting inserts are of special material with cutting bits or tips or cutting inserts rigidly mounted, e.g. by brazing
    • B23B27/20Cutting tools of which the bits or tips or cutting inserts are of special material with cutting bits or tips or cutting inserts rigidly mounted, e.g. by brazing with diamond bits or cutting inserts
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23PMETAL-WORKING NOT OTHERWISE PROVIDED FOR; COMBINED OPERATIONS; UNIVERSAL MACHINE TOOLS
    • B23P15/00Making specific metal objects by operations not covered by a single other subclass or a group in this subclass
    • B23P15/24Making specific metal objects by operations not covered by a single other subclass or a group in this subclass dies
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/04Anodisation of aluminium or alloys based thereon
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/04Anodisation of aluminium or alloys based thereon
    • C25D11/045Anodisation of aluminium or alloys based thereon for forming AAO templates
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/04Anodisation of aluminium or alloys based thereon
    • C25D11/18After-treatment, e.g. pore-sealing
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/08Mirrors; Reflectors
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23BTURNING; BORING
    • B23B2222/00Materials of tools or workpieces composed of metals, alloys or metal matrices
    • B23B2222/04Aluminium
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C37/00Component parts, details, accessories or auxiliary operations, not covered by group B29C33/00 or B29C35/00
    • B29C37/0067Using separating agents during or after moulding; Applying separating agents on preforms or articles, e.g. to prevent sticking to each other
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/04Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts
    • B29C59/046Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts for layered or coated substantially flat surfaces

Abstract

A roll mold for producing an optical sheet is provided. The optical sheet may inhibit moire pattern even after transferring uneven streaks caused by cutting to anti-reflection film. According to the present invention, a roll mold for producing an optical sheet, is provided. The roll mold with fine irregularities being formed on its outer circumferential surface produces elongated optical sheet material by making an elongated sheet abut on the outer circumferential surface and transferring the fine irregularities to the elongated sheet. Moreover, in addition to the fine irregularities, a plurality of stripe-like irregular shapes, which extend in parallel with a period P of 5 μ m to 50 μ m, are formed on the outer circumferential surface, of the roll mold for producing an optical sheet.

Description

光學板製造用滾輪狀模具的製造方法、光學板製造方法、電子顯示裝置以及鋁母材的鏡面加工方法 Method for producing roller-shaped mold for optical plate production, method for producing optical plate, electronic display device, and mirror surface processing method for aluminum base material

本發明是有關於一種光學片製造用滾輪狀模具的製造方法、光學片製造方法、電子顯示裝置以及鋁母材的鏡面加工方法。詳細而言,本發明是有關於一種將形成於外周面上的微細凹凸結構轉印至長條狀的片材上的光學片製造用滾輪狀模具的製造方法、使用藉由該方法而製造的光學片製造用滾輪狀模具的光學片製造方法、具有藉由該製造方法而製造的光學片的電子顯示裝置以及鋁母材的鏡面加工方法。 The present invention relates to a method for producing a roller-shaped mold for producing an optical sheet, a method for producing an optical sheet, an electronic display device, and a mirror-finishing method for an aluminum base material. More specifically, the present invention relates to a method for producing a roll-shaped mold for producing an optical sheet in which a fine uneven structure formed on an outer peripheral surface is transferred onto an elongated sheet, and a method of manufacturing the same by using the method An optical sheet manufacturing method for a roll-shaped mold for producing an optical sheet, an electronic display device having an optical sheet produced by the production method, and a mirror surface processing method for an aluminum base material.

近年來,已知於表面上具有可見光的波長以下的週期性微細凹凸結構的物品表現出抗反射效果、蓮花效應(lotus effect)等。尤其已知,表面上具有由微細的大致圓錐形狀的凸部排列而成的被稱為蛾眼結構(moth-eye structures)的微細凹凸結構的物品由於其折射率自空氣的折射率連續增大至該物品的折射率,故成為有效的抗反射的方法。 In recent years, articles having a periodic fine uneven structure having a wavelength of visible light or less on the surface have been known to exhibit an antireflection effect, a lotus effect, and the like. In particular, it is known that an article having a fine uneven structure called moth-eye structure in which fine convex portions having a substantially conical shape are arranged on the surface continuously increases in refractive index from the refractive index of air. The refractive index of the article is an effective anti-reflection method.

作為將此種微細凹凸結構形成於物品的表面上的方法,已知以下方法:於表面上具有微細凹凸結構的滾輪狀模具與長條狀的基材(片材)之間夾持液狀的活性能量線硬化性樹脂組成物,藉由活性能量線的照射使活性能量線硬化性樹脂組成物硬化,由此將硬化樹脂層形成於基材的表面上而製成光學片,上述硬化樹脂層具有與模具的微細凹凸結構互補的形狀的微細凹凸結構。 As a method of forming such a fine uneven structure on the surface of an article, a method is known in which a liquid mold is sandwiched between a roller-shaped mold having a fine uneven structure on the surface and a long substrate (sheet). In the active energy ray-curable resin composition, the active energy ray-curable resin composition is cured by irradiation with an active energy ray, whereby a cured resin layer is formed on the surface of the substrate to form an optical sheet, and the cured resin layer is formed. A fine uneven structure having a shape complementary to the fine uneven structure of the mold.

於該方法中,由於加工的簡便性等原因,以於圓筒狀鋁母材的表面上設有具有多個孔隙的陽極氧化氧化鋁的光學片製造用滾輪狀模具的形式使用(專利文獻1)。 In this method, the use of a roll-shaped mold for producing an optical sheet having anodized alumina having a plurality of pores is provided on the surface of a cylindrical aluminum base material due to the simplification of the processing (Patent Document 1) ).

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2005-156695號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2005-156695

於如上述般使用鋁母材製造光學片製造用滾輪狀模具時,首先藉由切削將滾輪狀的鋁母材的表面鏡面加工成既定平滑度,對經鏡面加工的母材表面進行陽極氧化而賦予微細凹凸形狀。 When a roll-shaped mold for producing an optical sheet is produced by using an aluminum base material as described above, first, the surface of the roll-shaped aluminum base material is mirror-finished to a predetermined smoothness by cutting, and the surface of the mirror-finished base material is anodized. A fine uneven shape is imparted.

該鏡面加工是藉由以下方式進行:一面使滾輪狀鋁母材以長度方向軸線為中心旋轉,一面使工具(車刀)沿著母材的外周面並沿著滾輪狀鋁母材的軸線而移動。因此,於滾輪狀母材的表面上,週期性的條狀的凹凸形狀(凸條)作為工具(車刀)所致的切削痕而殘留。 This mirror surface processing is performed by rotating the roller-shaped aluminum base material around the longitudinal axis while the tool (turning tool) is along the outer peripheral surface of the base material and along the axis of the roller-shaped aluminum base material. mobile. Therefore, on the surface of the roller-shaped base material, a periodic strip-shaped uneven shape (rabbit) remains as a cutting mark by a tool (turning tool).

若藉由陽極氧化對此種條狀的凹凸形狀(凸條)殘留的滾輪狀母材賦予微細凹凸形狀,並由藉此而製造的滾輪狀模具,將微細凹凸形狀轉印至基材上來製造光學片,則除了轉印微細凹凸結構以外,亦轉印週期性的條狀的凹凸形狀(凸條)。 When a roller-shaped base material having a strip-shaped uneven shape (raise) remaining in the strip shape is anodized, a fine uneven shape is imparted, and a fine-shaped uneven shape is transferred onto a substrate by a roll-shaped mold manufactured thereby. In addition to the transfer of the fine uneven structure, the optical sheet also transfers a periodic strip-shaped uneven shape (rabbit).

於具有蛾眼結構的光學片中,由於抗反射性能優異而透明性高,故有時可見此種條狀的凹凸形狀。 In the optical sheet having the moth-eye structure, since the antireflection property is excellent and the transparency is high, such a strip-shaped uneven shape may be seen.

即,於將此種光學片用於通常的抗反射用途中的情形時,很少可見條狀的凹凸形狀,但本案發明的發明者等人 發現,於將轉印有此種條狀的凹凸形狀的光學片用作液晶顯示裝置等電子顯示裝置的抗反射膜的情形時,由於週期性的條狀的週期性凹凸與電子顯示裝置的畫素的干涉,而觀察到干涉像(interference figure)(干擾紋)。 That is, when such an optical sheet is used in a general anti-reflection application, a strip-like uneven shape is rarely seen, but the inventors of the present invention and the like When the optical sheet to which the strip-shaped uneven shape is transferred is used as an anti-reflection film of an electronic display device such as a liquid crystal display device, it is found that periodic strip-shaped periodic unevenness and drawing of the electronic display device The interference of the elements, while observing the interference figure (interference figure).

另外發現,於表面上形成有蛾眼結構般的微細凹凸結構的抗反射膜由於抗反射特性非常優異,故若產生干擾紋,則與其他光學膜的情形相比較有更清晰地可見干涉像的傾向。 Further, it has been found that an antireflection film having a fine uneven structure having a moth-eye structure on the surface is excellent in anti-reflection characteristics, so that if interference fringes are generated, an interference image is more clearly visible than in the case of other optical films. tendency.

為了防止此種干涉像的產生,只要以不形成作為切削痕的條狀凹凸的方式對滾輪狀鋁母材進行加工即可,但實質上難以在完全不產生切削痕的情況下實施滾輪狀鋁母材的表面的切削加工。 In order to prevent the occurrence of such an interference image, the roller-shaped aluminum base material may be processed so as not to form strip-shaped irregularities as the cutting marks, but it is substantially difficult to implement the roller-shaped aluminum without causing the cutting marks at all. Cutting of the surface of the base metal.

本發明是鑒於上述問題而成,其目的在於提供一種即便將由切削痕所致的條狀凹凸轉印至抗反射膜上亦可抑制干涉像的光學片製造用滾輪狀模具的製造方法、及使用此種光學片製造用模具的光學片製造方法。 The present invention has been made in view of the above problems, and an object of the invention is to provide a method and a method for producing a roller-shaped mold for producing an optical sheet which can suppress an interference image even when a strip-shaped unevenness due to a cutting mark is transferred to an anti-reflection film. A method of producing an optical sheet of such a mold for producing an optical sheet.

根據本發明,提供一種光學片製造用模具的製造方法,其為於表面上具有微細凹凸結構、且將表面的上述微細凹凸結構轉印至片材上而製造光學片材的光學片製造用模具的製造方法,且其特徵在於:包括以下步驟:以既定的進給間距(Feed Length)切削鋁母材的表面,對鋁母材的表面進行鏡面加工;以及對鋁母材的表面實施陽極氧化而形成微細凹凸結構; 並且於進行鏡面加工的步驟中,於將切削車刀的進給間距設定為F、切削車刀的頂端的曲率半徑設定為R時,以下述式(1)所表示的Ry的值成為1.5 nm以上且100 nm以下的方式,進行鋁母材的切削,Ry=F2/8R (1)。 According to the present invention, there is provided a method for producing an optical sheet manufacturing mold which is an optical sheet manufacturing mold which has a fine uneven structure on the surface and which transfers the fine uneven structure on the surface onto a sheet to produce an optical sheet. The manufacturing method is characterized in that it comprises the steps of: cutting the surface of the aluminum base material at a predetermined feed length, mirror-finishing the surface of the aluminum base material; and performing anodizing on the surface of the aluminum base material In the step of performing the mirror surface processing, when the feed pitch of the cutting tool is set to F and the radius of curvature of the tip of the cutting tool is set to R, the expression is expressed by the following formula (1). When the value of Ry is 1.5 nm or more and 100 nm or less, the aluminum base material is cut, and Ry=F 2 /8R (1).

根據此種構成,可將鋁母材的表面鏡面加工成並無干涉條紋或白化現象等外觀異常的良好狀態,藉由使用利用此種鋁母材所製造的模具來製造光學片,可防止於光學片上轉印干涉像。 According to such a configuration, the surface of the aluminum base material can be mirror-finished to have an excellent appearance such as interference fringes or whitening, and the optical sheet can be produced by using a mold made of such an aluminum base material. The interference image is transferred on the optical sheet.

根據本發明的其他較佳態樣,提供一種光學片的製造用模具的製造方法,其為上述光學片的製造用模具的製造方法,並且切削車刀的進給間距為5 μm以上且50 μm以下。 According to another preferred aspect of the present invention, there is provided a method of producing a mold for manufacturing an optical sheet, which is a method for manufacturing a mold for manufacturing the optical sheet, and a feed pitch of the cutting tool is 5 μm or more and 50 μm. the following.

根據本發明的其他態樣,提供一種光學片製造方法,其使用藉由上述製造方法而製造的模具,並且該光學片製造方法的特徵在於包括以下轉印步驟:使片抵接於模具的表面,將表面的形狀轉印至片上,製成光學片材。 According to another aspect of the present invention, there is provided an optical sheet manufacturing method using a mold manufactured by the above-described manufacturing method, and the optical sheet manufacturing method characterized by comprising the following transfer step of abutting the sheet against the surface of the mold The shape of the surface is transferred onto the sheet to form an optical sheet.

根據本發明的其他態樣,提供一種電子顯示裝置,其包含藉由上述製造方法而製造的光學片。 According to another aspect of the present invention, an electronic display device including the optical sheet manufactured by the above manufacturing method is provided.

根據本發明的其他態樣,提供一種鏡面加工方法, 其為鋁母材的鏡面加工方法,上述鋁母材被用作於表面上形成有微細凹凸結構、且用以將該微細凹凸結構轉印至片材上而製造光學片材的光學片製造用模具的母材,且上述鏡面加工方法的特徵在於:包括以既定的進給間距切削上述鋁母材的表面的步驟;並且於上述步驟中,於將上述切削車刀的進給間距設定為F、上述切削車刀的頂端的曲率半徑設定為R時,以下述式(1)所表示的Ry的值成為1.5 nm以上且100 nm以下的方式,進行上述鋁母材的切削,Ry=F2/8R (1)。 According to another aspect of the present invention, there is provided a mirror surface processing method which is a mirror surface processing method of an aluminum base material, wherein the aluminum base material is used to form a fine uneven structure on a surface, and to transfer the fine uneven structure a base material for manufacturing an optical sheet manufacturing mold of an optical sheet to a sheet, and the mirror surface processing method is characterized by including a step of cutting a surface of the aluminum base material at a predetermined feed pitch; and in the above step When the feed pitch of the cutting tool is set to F and the radius of curvature of the tip of the cutting tool is set to R, the value of Ry expressed by the following formula (1) is 1.5 nm or more and 100 nm or less. In the manner, the aluminum base material was cut, and Ry=F 2 /8R (1).

根據具備此種構成的本發明,提供一種即便將由切削痕所致的條狀凹凸轉印至抗反射膜上亦可抑制干涉像的光學片製造用滾輪狀模具、此種光學片製造用滾輪狀模具的製造方法、以及使用此種光學片製造用滾輪狀模具的光學片製造方法。 According to the present invention having such a configuration, it is possible to provide a roller-shaped mold for producing an optical sheet which can suppress an interference image even when a strip-shaped unevenness due to a cutting mark is transferred onto the anti-reflection film, and a roller shape for manufacturing the optical sheet. A method of producing a mold, and a method of producing an optical sheet using the roller-shaped mold for producing the optical sheet.

以下,參照圖式,對本發明的較佳實施形態的光學片製造用滾輪狀模具的製造方法、及使用此種光學片製造用滾輪狀模具的光學片製造方法加以說明。 Hereinafter, a method for producing a roll-shaped mold for producing an optical sheet according to a preferred embodiment of the present invention and a method for producing an optical sheet using the roll-shaped mold for producing the optical sheet will be described with reference to the drawings.

再者,於本說明書中,所謂「微細凹凸結構」或「微 細凹凸形狀」,是指凸部或凹部的平均間隔(週期)為可見光波長以下、即400 nm以下的結構或形狀。 Furthermore, in the present specification, the term "fine concavo-convex structure" or "micro The fine uneven shape refers to a structure or shape in which the average interval (period) of the convex portion or the concave portion is equal to or less than the visible light wavelength, that is, 400 nm or less.

另外,所謂「活性能量線」,是指可見光線、紫外線、電子束、電漿、熱線(紅外線等)等。另外,(聚)氧伸烷基烷基磷酸化合物是指具有1個氧伸烷基的氧伸烷基烷基磷酸化合物或具有2個以上的氧伸烷基的聚氧伸烷基烷基磷酸化合物。 In addition, the "active energy ray" means visible light, ultraviolet light, electron beam, plasma, hot wire (infrared rays, etc.). Further, the (poly)oxyalkylalkylphosphonic acid compound means an oxygen alkylalkylphosphoric acid compound having one oxygen alkyl group or a polyoxyalkylene alkyl phosphate having two or more oxygen alkyl groups. Compound.

進而,所謂「(甲基)丙烯酸酯」,是指丙烯酸酯或甲基丙烯酸酯。 Further, the term "(meth)acrylate" means acrylate or methacrylate.

所謂「矩形」,亦包含大致矩形,例如即便為於四邊的一部分設有切缺部等或進行倒角(chamfering)的情形,只要整體大致為矩形,則該等亦包含於「矩形」中。 The "rectangular shape" also includes a substantially rectangular shape. For example, even if a portion of the four sides is provided with a cutout portion or a chamfering, the entire shape is substantially rectangular, and these are also included in the "rectangular shape".

首先,對本實施形態的光學片製造用滾輪狀模具(以下稱為「滾輪狀模具」)加以說明。 First, a roller-shaped mold for manufacturing an optical sheet (hereinafter referred to as a "roller-shaped mold") of the present embodiment will be described.

本實施形態的滾輪狀模具是藉由具有下述步驟(a)~步驟(g)的方法來製作。 The roll-shaped mold of this embodiment is produced by the method of the following steps (a) to (g).

(a)為了使鋁母材的表面狀態平滑化(鏡面化),而進行切削加工的步驟。 (a) A step of performing a cutting process in order to smooth the surface state of the aluminum base material (mirror surface).

(b)將鋁母材於電解液中於恆定電壓下陽極氧化,於鋁母材的表面上形成氧化皮膜的步驟。 (b) A step of anodizing an aluminum base material in an electrolytic solution at a constant voltage to form an oxide film on the surface of the aluminum base material.

(c)將氧化皮膜的一部分或全部去除,於鋁母材的表面上形成陽極氧化的孔隙產生點的步驟。 (c) a step of removing a part or all of the oxide film to form an anodized pore generating point on the surface of the aluminum base material.

(d)將鋁母材於電解液中再次陽極氧化,形成於孔隙產生點具有孔隙的氧化皮膜的步驟。 (d) a step of anodizing the aluminum base material again in the electrolytic solution to form an oxide film having pores at the pore generating point.

(e)使孔隙的孔徑擴大的步驟。 (e) a step of expanding the pore diameter of the pores.

(f)步驟(e)後,於電解液中再次陽極氧化的步驟。 (f) a step of re-anodizing in the electrolyte after the step (e).

(g)重複進行步驟(e)與步驟(f),獲得於鋁的表面上形成有具有多個孔隙的陽極氧化氧化鋁的模具的步驟。 (g) Step (e) and step (f) are repeated to obtain a step of forming a mold having anodized alumina having a plurality of pores on the surface of aluminum.

步驟(a) Step (a)

首先,為了將作為滾輪狀模具的材料的鋁母材的表面調整為必要的平滑度,而進行使用工具的切削加工。就連續製造光學片的觀點而言,鋁母材較佳為使用滾輪狀者。 First, in order to adjust the surface of the aluminum base material which is a material of a roll-shaped mold to the required smoothness, the cutting process using a tool is performed. From the viewpoint of continuously producing an optical sheet, the aluminum base material is preferably a roller-shaped one.

成型時大多必需調溫功能,為了使冷熱介質於滾輪內部通過,主要使用套筒(sleeve)狀結構等中空或實施了分為數個部位的貫通孔加工者。鋁的純度較佳為99%以上,更佳為99.5%以上,特佳為99.8%以上。若鋁的純度低,則有時於陽極氧化時由於雜質的偏析而形成使可見光散射的大小的凹凸結構,或由陽極氧化所得的孔隙的規則性降低。 In the molding, the temperature adjustment function is often required. In order to allow the cold and heat medium to pass through the inside of the roller, a sleeve-like structure or the like is used, and a through-hole processor that is divided into a plurality of parts is mainly used. The purity of aluminum is preferably 99% or more, more preferably 99.5% or more, and particularly preferably 99.8% or more. When the purity of aluminum is low, a concavo-convex structure having a size that scatters visible light due to segregation of impurities during anodic oxidation or a regularity of pores obtained by anodization may be lowered.

繼而,所使用的工具大多是使用被稱為車刀的刀具。於切削鋁材料的車刀的頂端,較理想為使用形狀的穩定性優異的單晶金剛石。 In turn, most of the tools used use a tool called a turning tool. It is preferable to use a single crystal diamond excellent in shape stability for the tip of a turning tool for cutting aluminum material.

車刀的形狀有頂端為R形狀的R車刀、與扁平的扁平車刀。 The shape of the turning tool has an R turning tool with an R shape at the top and a flat flat turning tool.

R車刀對滾輪直徑的變化或加工方向並無限制,故可容易地使用。另一方面,於為了進一步增大表面粗糙度而欲使用大的R形狀的情形時,製作車刀時對加工機台或製 造技術要求高的精度,有時車刀本體變昂貴。 The R turning tool has no restrictions on the change in the diameter of the roller or the machining direction, so it can be easily used. On the other hand, in the case where a large R shape is to be used in order to further increase the surface roughness, the processing machine or the system is manufactured when the turning tool is produced. The manufacturing technology requires high precision, and sometimes the turning body becomes expensive.

另外,頂端形狀平坦的扁平車刀由於形狀簡單,故製作本身容易,但變更滾輪狀的鋁母材的直徑時必須進行安裝調整,而要求高的安裝精度。 Further, since the flat turning tool having a flat top end shape is simple in shape, it is easy to manufacture itself. However, when the diameter of the aluminum base material of the roll shape is changed, it is necessary to perform mounting adjustment, and high mounting precision is required.

綜合考慮該些方面,本實施形態中使用R車刀,但亦可使用扁平車刀。 Taking these aspects into consideration, the R turning tool is used in the present embodiment, but a flat turning tool can also be used.

本實施形態中所用的R車刀的頂端形狀較佳為半徑1 mm~1000 mm的R形狀,進而佳為半徑2 mm~200 mm的R形狀。 The shape of the tip end of the R turning tool used in the present embodiment is preferably an R shape having a radius of 1 mm to 1000 mm, and is preferably an R shape having a radius of 2 mm to 200 mm.

根據圖1,對鋁母材的切削加工加以詳細說明。於滾輪狀工件的加工中,通常使用車床,該車床是於使滾輪旋轉的狀態下使成為工具的車刀進行既定的切入而進行加工。 The cutting process of the aluminum base material will be described in detail based on Fig. 1 . In the processing of the roller-shaped workpiece, a lathe is usually used, and the turning tool is rotated in a state where the turning tool of the tool is cut and cut.

一面使用旋轉機構2使圓筒狀的鋁母材1以長度方向軸線為中心以既定的轉速旋轉,一面使固定有車刀4的平台6於X軸(鋁母材的徑方向)上移動,使車刀4於鋁母材1的外周面上以既定的深度切入,進而使平台6及車刀4於Z軸(鋁母材1的軸線)方向上以既定的速度移動,使圓筒狀的鋁母材1的外周面1a全體鏡面化(圖2)。 When the cylindrical aluminum base material 1 is rotated at a predetermined number of revolutions around the longitudinal axis by the rotation mechanism 2, the stage 6 to which the turning tool 4 is fixed is moved on the X-axis (diameter of the aluminum base material). The turning tool 4 is cut at a predetermined depth on the outer peripheral surface of the aluminum base material 1, and the table 6 and the turning tool 4 are moved at a predetermined speed in the direction of the Z axis (the axis of the aluminum base material 1) to make the cylindrical shape. The outer peripheral surface 1a of the aluminum base material 1 is mirror-finished (Fig. 2).

於本實施形態中,一面以在鋁母材1以軸方向中心軸為中心而旋轉一周的期間中切削車刀4沿著軸方向(圖1中的Z軸方向)移動5 μm~50 μm的速度,使切削車刀4及平台6沿著圓筒狀的鋁母材1的軸方向移動,一面進行切削的鏡面加工。 In the present embodiment, the cutting tool 4 moves 5 μm to 50 μm along the axial direction (Z-axis direction in FIG. 1) while the aluminum base material 1 is rotated about the central axis in the axial direction. At the speed, the cutting tool 4 and the table 6 are moved in the axial direction of the cylindrical aluminum base material 1, and the mirror surface of the cutting is performed.

再者,於本說明書中,於鋁母材為滾輪狀的情形時,將在鋁母材1旋轉一周的期間中移動的切削車刀4沿著鋁母材1的軸線方向移動的距離設定為切削間距(進給間距)。 In the case where the aluminum base material is in the form of a roller, the distance in which the cutting tool 4 that moves during the rotation of the aluminum base material 1 in the axial direction of the aluminum base material 1 is set to Cutting pitch (feed spacing).

另外,於鋁母材為平板狀的情形時,沿著既定的方向(X方向)進行切削加工,使切削車刀4於與既定方向正交的方向(Y方向)上移動既定距離,進而沿著既定的方向進行切削加工。藉由重複進行該動作而對鋁母材的表面進行加工,將此時切削車刀4朝Y方向的移動距離設定為切削間距(進給間距)。 Further, when the aluminum base material is in the form of a flat plate, cutting is performed in a predetermined direction (X direction), and the cutting tool 4 is moved by a predetermined distance in a direction (Y direction) orthogonal to a predetermined direction, and further along Cutting in a given direction. By repeating this operation, the surface of the aluminum base material is processed, and the moving distance of the cutting tool 4 in the Y direction at this time is set as the cutting pitch (feed pitch).

藉由將該切削間距設定為5 μm~50 μm,殘留於鋁母材1上的條狀的凹凸(凸條)的間隔(間距)成為5 μm~50 μm,結果,於使用藉由後述方法製造的由鋁母材所製作的滾輪狀模具來製造光學片的情形時,可將轉印至光學片上的條狀的凹凸結構的排列週期(間距)設定為5 μm~50 μm。 By setting the cutting pitch to 5 μm to 50 μm, the interval (pitch) of strip-like irregularities (ridges) remaining on the aluminum base material 1 is 5 μm to 50 μm, and as a result, the method described later is used. In the case where the optical sheet is manufactured by a roll-shaped mold made of an aluminum base material, the arrangement period (pitch) of the strip-shaped uneven structure transferred onto the optical sheet can be set to 5 μm to 50 μm.

切削間距較佳為設定為5 μm~50 μm。 The cutting pitch is preferably set to 5 μm to 50 μm.

於切削間距為5 μm以下的情形時,有以下問題:鋁母材1的切削需要長時間;另外車刀於鋁母材1的切削步驟的中途磨損,必須更換車刀。 When the cutting pitch is 5 μm or less, there is a problem that the cutting of the aluminum base material 1 takes a long time; and the turning tool is worn in the middle of the cutting step of the aluminum base material 1, and the turning tool must be replaced.

若切削間距超過50 μm,則難以減少於液晶面板之間產生的干涉條紋的產生。 When the cutting pitch exceeds 50 μm, it is difficult to reduce the occurrence of interference fringes generated between the liquid crystal panels.

目前,液晶面板等電子顯示裝置的畫素的通常的排列週期(畫素間距)最小亦為80 μm左右,故若將上述切削 間距設定為5 μm~40 μm,則成為液晶面板等電子顯示裝置的畫素的通常的畫素間距的一半以下。 At present, the usual arrangement period (pixel pitch) of the pixels of an electronic display device such as a liquid crystal panel is also about 80 μm, so the above cutting is performed. When the pitch is set to 5 μm to 40 μm, it is half or less of the normal pixel pitch of the pixels of an electronic display device such as a liquid crystal panel.

例如於使用頂端R為10 mm的車刀4的情形時,進給間距F較佳為於10 μm~50 μm之間設定,更佳為於20 μm~50 μm之間設定。 For example, in the case of using the turning tool 4 having a top end R of 10 mm, the feed pitch F is preferably set between 10 μm and 50 μm, more preferably between 20 μm and 50 μm.

進而,於使用頂端R為5 mm的車刀4的情形時,進給間距F較佳為於10 μm~50 μm之間設定,更佳為於15 μm~40 μm之間設定。 Further, in the case of using the turning tool 4 having a top end R of 5 mm, the feed pitch F is preferably set between 10 μm and 50 μm, more preferably between 15 μm and 40 μm.

切削車刀的頂端半徑R及進給間距F較理想為以理論表面粗糙度Ry在1.5nm~100 nm的範圍內的方式決定,更佳為以理論表面粗糙度Ry在5 μ~60 μ的範圍內的方式決定。 The tip radius R and the feed pitch F of the cutting tool are preferably determined such that the theoretical surface roughness Ry is in the range of 1.5 nm to 100 nm, and more preferably the theoretical surface roughness Ry is 5 μ to 60 μ. The way within the scope is determined.

再者,理論表面粗糙度Ry是藉由以下的式(1)而算出。 In addition, the theoretical surface roughness Ry is calculated by the following formula (1).

Ry=F2/8R (1) Ry=F 2 /8R (1)

(式中,F表示上述切削車刀的進給間距,R表示上述切削車刀的頂端的曲率半徑) (wherein F represents the feed pitch of the cutting tool, and R represents the radius of curvature of the tip of the cutting tool)

於採用該理論表面粗糙度Ry成為小於1.5 nm的值般的切削車刀的頂端半徑R及進給間距F的情形時,不僅縮短車刀的壽命,而且產生模具外觀白化的現象,外觀品質大幅度地降低。另一方面,於採用理論表面粗糙度Ry超過100 nm的值般的切削車刀的頂端半徑R及進給間距F 的情形時,無法充分獲得鋁切削中重要的刀尖處的削除(vanishing)效果,且全面產生表面粗糙度的惡化以及虹狀的條紋缺陷,而可確認到外觀品質的惡化。 When the theoretical surface roughness Ry is set to a value of less than 1.5 nm, the tip radius R and the feed pitch F of the cutting tool are not only shortened the life of the turning tool, but also the appearance of the appearance of the mold is whitened, and the appearance quality is large. Decrease in magnitude. On the other hand, the tip radius R and the feed pitch F of the cutting tool are used with a theoretical surface roughness Ry exceeding 100 nm. In the case of the vanishing effect at the tip of the blade which is important in the aluminum cutting, the deterioration of the surface roughness and the stray defect of the rainbow shape were all caused, and the deterioration of the appearance quality was confirmed.

於本實施形態中,切入量(圖1中的x軸方向)是於0.5 μm~100 μm的範圍內設定。更佳為於1 μm~50 μm之間設定,進而佳為於1 μm~20 μm之間設定。 In the present embodiment, the amount of cut (the x-axis direction in Fig. 1) is set in the range of 0.5 μm to 100 μm. More preferably, it is set between 1 μm and 50 μm, and is preferably set between 1 μm and 20 μm.

若進行切削步驟,則於鋁母材的表面上必定會產生被稱為進給間距大小的削痕(cut mark)的與車刀軌跡對應的條狀凹凸(切削痕)。因此,為了減輕該切削痕的凹凸,除了切削加工以外,亦可併用拋光研磨、化學研磨、電解研磨處理(蝕刻處理)等研磨。 When the cutting step is performed, strip-shaped irregularities (cutting marks) corresponding to the turning path of the turning mark, which is called a cut mark having a feed pitch size, are always generated on the surface of the aluminum base material. Therefore, in order to reduce the unevenness of the cut marks, in addition to the cutting, polishing such as buffing, chemical polishing, or electrolytic polishing (etching treatment) may be used in combination.

然而,即便進行上述研磨處理,亦難以完全去除切削痕,如圖2中示意性地表示般,於利用切削或切削與研磨的鏡面加工已完成的鋁母材1的外周面1a上,殘留有具有凸條1b的部分的條狀凹凸結構,上述凸條1b於與圓筒狀的鋁母材1的軸線大致正交的方向即圓周方向上延伸。 However, even if the above-described polishing treatment is performed, it is difficult to completely remove the cutting marks, and as shown schematically in FIG. 2, the outer peripheral surface 1a of the aluminum base material 1 which has been completed by mirror processing by cutting or cutting and polishing remains. A strip-shaped uneven structure having a portion of the ridge 1b, the rib 1b extending in a circumferential direction substantially perpendicular to the axis of the cylindrical aluminum base material 1, that is, in the circumferential direction.

圓筒狀的鋁母材1的軸線方向上的凸條1b的週期(間距P)對應於切削間距(進給間距),成為5 μm~50 μm。 The period (pitch P) of the ridges 1b in the axial direction of the cylindrical aluminum base material 1 corresponds to the cutting pitch (feed pitch) and is 5 μm to 50 μm.

再者,如上所述,目前液晶面板等電子顯示裝置的畫素的通常的排列週期(畫素間距)最小亦為80 μm左右,故上述圓筒狀的鋁母材1的軸線方向上的凸條1b的週期(間距P)亦較佳為設定為液晶面板等電子顯示裝置的畫素的通常的畫素間距的一半以下。 In addition, as described above, in the electronic display device such as a liquid crystal panel, the normal arrangement period (pixel pitch) of the pixel is also about 80 μm, so that the cylindrical aluminum base material 1 is convex in the axial direction. The period (pitch P) of the strip 1b is also preferably set to be less than or equal to half the normal pixel pitch of the pixels of an electronic display device such as a liquid crystal panel.

另外,鋁母材有時附著有切削加工時所用的油,故較 佳為於陽極氧化前預先經脫脂處理。 In addition, the aluminum base material sometimes has the oil used in the cutting process, so It is pre-degreased before anodizing.

於使用平板狀的鋁母材代替圓筒狀鋁母材的情形時,藉由重複進行以下步驟來對平板狀的鋁母材的整個表面進行鏡面加工:將鋁母材固定於工件上,利用可使切削車刀於X方向、及與X方向大致正交的Y方向上移動的平板加工機,利用切削車刀於X方向上以條狀切削鋁基材的步驟;及使切削車刀於Y方向上以5 μm~50 μm的間距移動的步驟。 When a flat aluminum base material is used instead of the cylindrical aluminum base material, the entire surface of the flat aluminum base material is mirror-finished by repeating the following steps: fixing the aluminum base material to the workpiece, and utilizing a step of cutting a aluminum substrate in a strip shape in the X direction by a cutting tool in a sheet processing machine in which the cutting tool moves in the X direction and the Y direction substantially orthogonal to the X direction; and the cutting tool is used in the cutting tool The step of moving at a pitch of 5 μm to 50 μm in the Y direction.

另外,亦可為以下方法:將切削車刀於X方向移動而以條狀切削,並使工件於Y方向上以既定間距為單位而移動。 Further, the cutting tool may be moved in the X direction to be cut in a strip shape, and the workpiece may be moved in the Y direction in units of a predetermined pitch.

步驟(b): Step (b):

如圖3中的(b)所示,若對鋁母材1的表面部分10(圖3中的(a))進行陽極氧化,則形成具有孔隙12的氧化皮膜14。 As shown in (b) of FIG. 3, when the surface portion 10 ((a) in FIG. 3) of the aluminum base material 1 is anodized, the oxide film 14 having the pores 12 is formed.

電解液可列舉硫酸、草酸、磷酸等。 Examples of the electrolytic solution include sulfuric acid, oxalic acid, phosphoric acid, and the like.

使用草酸作為電解液的情形: The case of using oxalic acid as the electrolyte:

以下對使用硫酸作為電解液的情形的具體例加以說明。草酸的濃度較佳為0.7 M以下。若草酸的濃度超過0.7 M,則有時電流值變得過高而氧化皮膜的表面變粗糙。 Specific examples of the case where sulfuric acid is used as the electrolytic solution will be described below. The concentration of oxalic acid is preferably 0.7 M or less. When the concentration of oxalic acid exceeds 0.7 M, the current value may become too high and the surface of the oxide film may become rough.

於化成電壓(formation voltage)為30 V~60 V時,可獲得具有週期為100 nm的規則性高的孔隙的陽極氧化氧化鋁。無論化成電壓是高於該範圍還是低於該範圍,均有規則性降低的傾向。 When the formation voltage is 30 V to 60 V, anodized alumina having a regular high porosity of 100 nm can be obtained. Regardless of whether the formation voltage is higher than the range or lower than the range, there is a tendency for the regularity to decrease.

電解液的溫度較佳為60℃以下,更佳為45℃以下。若電解液的溫度超過60℃,則引起所謂被稱為「灼燒」的現象,有時孔隙被損壞,或表面溶解而孔隙的規則性被擾亂。 The temperature of the electrolytic solution is preferably 60 ° C or lower, more preferably 45 ° C or lower. If the temperature of the electrolytic solution exceeds 60 ° C, a phenomenon called "burning" is caused, and sometimes the pores are damaged, or the surface is dissolved and the regularity of the pores is disturbed.

使用硫酸作為電解液的情形: When sulfuric acid is used as the electrolyte:

以下對使用硫酸作為電解液的情形的具體例加以說明。硫酸的濃度較佳為0.7 M以下。若硫酸的濃度超過0.7 M,則有時電流值變得過高而無法維持恆定電壓。 Specific examples of the case where sulfuric acid is used as the electrolytic solution will be described below. The concentration of sulfuric acid is preferably 0.7 M or less. When the concentration of sulfuric acid exceeds 0.7 M, the current value may become too high to maintain a constant voltage.

於化成電壓為25 V~30 V時,可獲得具有週期為63 nm的規則性高的孔隙的陽極氧化氧化鋁。無論化成電壓是高於該範圍還是低於該範圍,均有規則性降低的傾向。 When the formation voltage is 25 V to 30 V, anodized alumina having a regular high porosity of 63 nm can be obtained. Regardless of whether the formation voltage is higher than the range or lower than the range, there is a tendency for the regularity to decrease.

電解液的溫度較佳為30℃以下,更佳為20℃以下。若電解液的溫度超過30℃,則引起所謂被稱為「灼燒」的現象,有時孔隙損壞,或表面溶解而孔隙的規則性被擾亂。 The temperature of the electrolytic solution is preferably 30 ° C or lower, more preferably 20 ° C or lower. If the temperature of the electrolytic solution exceeds 30 ° C, a phenomenon called "burning" is caused, and sometimes the pores are damaged, or the surface is dissolved and the regularity of the pores is disturbed.

步驟(c): Step (c):

如圖3中的(c)所示,將氧化皮膜14的一部分或全部暫且去除,將其作為陽極氧化的孔隙產生點16,藉此可提高孔隙的規則性。即便於氧化皮膜14未全部去除而一部分殘留般的狀態下,只要氧化皮膜14中可充分提高規則性的部分已殘留,則亦可達成氧化皮膜去除的目的。 As shown in (c) of FIG. 3, a part or all of the oxide film 14 is temporarily removed, and this is used as an anodized pore generating point 16, whereby the regularity of the pores can be improved. In other words, in a state in which the oxide film 14 is not completely removed and a part remains, the purpose of removing the oxide film can be achieved as long as the portion of the oxide film 14 which can sufficiently improve the regularity remains.

去除氧化皮膜的方法可列舉:溶解於不溶解鋁而選擇性地溶解氧化皮膜的溶液中而將氧化皮膜去除的方法。此種溶液例如可列舉鉻酸/磷酸混合液等。 The method of removing the oxide film is a method of removing the oxide film by dissolving it in a solution which does not dissolve aluminum and selectively dissolves an oxide film. Examples of such a solution include a chromic acid/phosphoric acid mixed solution.

步驟(d): Step (d):

如圖3中的(d)所示,若將去除了氧化皮膜的鋁母材 10再次陽極氧化,則形成具有圓柱狀的孔隙12的氧化皮膜14。 As shown in (d) of Fig. 3, if the aluminum base material from which the oxide film is removed is 10 is anodized again to form an oxide film 14 having cylindrical pores 12.

陽極氧化只要於與步驟(b)相同的條件下進行即可。越延長陽極氧化的時間,可獲得越深的孔隙。其中,只要為不喪失步驟(c)的效果的範圍,則可適當調整步驟(d)中的陽極氧化的電壓、電解液的種類、溫度等。 The anodization may be carried out under the same conditions as in the step (b). The longer the anodization time is, the deeper the pores can be obtained. However, as long as the range of the effect of the step (c) is not lost, the voltage of the anodization in the step (d), the type of the electrolytic solution, the temperature, and the like can be appropriately adjusted.

步驟(e): Step (e):

如圖3中的(e)所示,進行使孔隙12的孔徑擴大的處理(以下記作孔隙徑擴大處理)。孔隙徑擴大處理為浸漬於溶解氧化皮膜的溶液中而使由陽極氧化所得的孔隙的孔徑擴大的處理。此種溶液例如可列舉5質量%左右的磷酸水溶液等。 As shown in (e) of FIG. 3, a process of expanding the pore diameter of the pores 12 (hereinafter referred to as a pore diameter expansion treatment) is performed. The pore diameter enlargement treatment is a treatment of immersing in a solution in which the oxide film is dissolved to expand the pore diameter of the pores obtained by anodization. Examples of such a solution include a phosphoric acid aqueous solution of about 5% by mass.

越延長孔隙徑擴大處理的時間,孔隙徑越變大。 The longer the pore diameter is enlarged, the larger the pore diameter becomes.

步驟(f): Step (f):

如圖3中的(f)所示,若再次陽極氧化,則進一步形成自圓柱狀的孔隙12的底部向下延伸的直徑小的圓柱狀的孔隙12'。 As shown in (f) of FIG. 3, if it is anodized again, a cylindrical hole 12' having a small diameter extending downward from the bottom of the cylindrical pore 12 is further formed.

陽極氧化只要於與步驟(b)相同的條件下進行即可。越延長陽極氧化的時間,可獲得越深的孔隙。 The anodization may be carried out under the same conditions as in the step (b). The longer the anodization time is, the deeper the pores can be obtained.

步驟(g): Step (g):

若重複進行步驟(e)的孔隙徑擴大處理與步驟(f)的陽極氧化,則如圖3中的(g)所示,形成具有直徑自開口部於深度方向上連續減小的形狀的孔隙12的氧化皮膜14,而獲得於鋁母材1的表面10上具有陽極氧化氧化鋁(鋁 的多孔質的氧化皮膜(Alumite))的模具18。最後較佳為以步驟(e)結束。 When the pore diameter expansion treatment of the step (e) and the anodization of the step (f) are repeated, as shown in (g) of FIG. 3, pores having a shape whose diameter continuously decreases from the opening portion in the depth direction are formed. The oxide film 14 of 12 is obtained on the surface 10 of the aluminum base material 1 with anodized aluminum oxide (aluminum) A mold 18 of a porous oxide film (Alumite). Finally, it is preferred to end with step (e).

重複次數合計較佳為3次以上,更佳為5次以上。若重複次數為2次以下,則孔隙的直徑非連續地減小,故使用具有此種孔隙的陽極氧化氧化鋁所形成的蛾眼結構的反射率降低效果不充分。 The total number of repetitions is preferably 3 or more, more preferably 5 or more. When the number of repetitions is two or less, the diameter of the pores is discontinuously decreased, so that the effect of reducing the reflectance of the moth-eye structure formed using the anodized alumina having such pores is insufficient.

孔隙12的形狀可列舉大致圓錐形狀、角錐(pyramid)形狀、圓柱形狀等,較佳為圓錐形狀、角錐形狀等般,與深度方向正交的方向的孔隙剖面積自最表面於深度方向上連續減小的形狀。 The shape of the pores 12 may be a substantially conical shape, a pyramid shape, a cylindrical shape or the like, and is preferably a conical shape or a pyramid shape. The pore cross-sectional area in the direction orthogonal to the depth direction is continuous from the outermost surface in the depth direction. Reduced shape.

孔隙12間的平均間隔為可見光的波長以下、即400 nm以下。孔隙12間的平均間隔較佳為20 nm以上。 The average spacing between the apertures 12 is below the wavelength of visible light, i.e., below 400 nm. The average spacing between the pores 12 is preferably 20 nm or more.

孔隙12間的平均間隔為藉由電子顯微鏡觀察對鄰接的孔隙12間的間隔(自孔隙12的中心起至鄰接的孔隙12的中心為止的距離)測定50點,並將該些值平均所得的值。 The average interval between the pores 12 is 50 points measured by an electron microscope observation of the interval between adjacent pores 12 (the distance from the center of the pore 12 to the center of the adjacent pore 12), and the values are averaged. value.

於平均間隔為100 nm的情形時,孔隙12的深度較佳為80 nm~500 nm,更佳為120 nm~400 nm,特佳為150 nm~300 nm。 When the average interval is 100 nm, the depth of the pores 12 is preferably from 80 nm to 500 nm, more preferably from 120 nm to 400 nm, and particularly preferably from 150 nm to 300 nm.

孔隙12的深度為藉由電子顯微鏡觀察以30000倍的倍率進行觀察時,測定孔隙12的最底部與存在於孔隙12間的凸部的最頂部之間的距離所得的值。 The depth of the pores 12 is a value obtained by measuring the distance between the bottommost portion of the pores 12 and the topmost portion of the convex portion existing between the pores 12 when observed by an electron microscope at a magnification of 30,000 times.

孔隙12的縱橫比(孔隙的深度/孔隙間的平均間隔)較佳為0.8~5.0,更佳為1.2~4.0,特佳為1.5~3.0。 The aspect ratio of the pores 12 (the depth of the pores / the average interval between the pores) is preferably from 0.8 to 5.0, more preferably from 1.2 to 4.0, particularly preferably from 1.5 to 3.0.

如此而獲得於外周面上形成有微細凹凸結構及條狀的 凹凸形狀的滾輪狀模具。使用該滾輪狀模具,製造於表面上轉印有微細凹凸結構及條狀的凹凸形狀的長條狀光學片。 Thus, a fine uneven structure and a strip shape are formed on the outer peripheral surface. A roller-shaped mold with a concave-convex shape. Using the roll-shaped mold, an elongated optical sheet having a fine uneven structure and a strip-shaped uneven shape transferred onto the surface was produced.

(製造裝置) (manufacturing device)

於本實施形態的光學片製造方法中,使用圖4所示的製造裝置20。 In the optical sheet manufacturing method of the present embodiment, the manufacturing apparatus 20 shown in Fig. 4 is used.

製造裝置20具備:如上述般於外周面上形成有微細凹凸結構且經旋轉驅動的滾輪狀模具22;將成為光學片的基材的長條狀基材24連續供給至滾輪狀模具22的機構;將長條狀基材24按壓於滾輪狀模具22的外周面上的夾持滾輪(nip roll)26;將活性能量線硬化性樹脂組成物28供給於滾輪狀模具22與長條狀基材24之間的噴嘴30;以及於夾持滾輪26的下游側位置向活性能量線硬化性組成物28照射活性能量線的活性能量線照射裝置32等。 The manufacturing apparatus 20 is provided with the roll-shaped mold 22 which has the fine uneven|corrugated structure on the outer peripheral surface, and the rotation of the roll-form-form- The nip roll 26 is pressed against the outer peripheral surface of the roller-shaped mold 22, and the active energy ray-curable resin composition 28 is supplied to the roller-shaped mold 22 and the elongated substrate. The nozzle 30 between the 24; and the active energy ray irradiation device 32 or the like that irradiates the active energy ray-curable composition 28 with the active energy ray at the downstream side of the nip roller 26.

夾持滾輪26是以於滾輪狀模具22的旋轉方向上流側位置藉由空氣壓缸34加以驅動,將長條狀基材24按壓於滾輪狀模具22的外周面上的方式構成。而且,於將長條狀基材24按壓於滾輪狀模具22的外周面上的區域中,將儲罐36中收容的活性能量線硬化性組成物28自噴嘴30供給於長條狀基材24與滾輪狀模具22之間。 The grip roller 26 is configured such that the flow side position in the rotation direction of the roller-shaped mold 22 is driven by the air cylinder 34, and the elongated base material 24 is pressed against the outer peripheral surface of the roller-shaped mold 22. Then, the active energy ray-curable composition 28 accommodated in the accumulator 36 is supplied from the nozzle 30 to the elongated substrate 24 in a region where the elongated substrate 24 is pressed against the outer peripheral surface of the roller-shaped mold 22. Between the roller-shaped mold 22.

設置於滾輪狀模具22下方的活性能量線照射裝置32,通過基材24對配置於基材24與滾輪狀模具22之間的活性能量線硬化性樹脂組成物28照射活性能量線,使活性能量線硬化性樹脂組成物28硬化,藉此於基材24上形成 具有與滾輪狀模具22的微細凹凸結構互補的形狀的硬化樹脂層38。 The active energy ray irradiation device 32 disposed under the roller-shaped mold 22 irradiates the active energy ray-curable resin composition 28 disposed between the substrate 24 and the roller-shaped mold 22 with an active energy ray through the substrate 24 to activate the active energy. The line curable resin composition 28 is cured to form on the substrate 24 The cured resin layer 38 has a shape complementary to the fine uneven structure of the roller-shaped mold 22.

於基材24的表面上形成有硬化樹脂層38的光學片材40(圖5)是藉由剝離滾輪40自滾輪狀模具22剝離。 The optical sheet 40 (FIG. 5) on which the cured resin layer 38 is formed on the surface of the substrate 24 is peeled off from the roller-shaped mold 22 by the peeling roller 40.

再者,於本實施形態的說明中,於滾輪狀模具22與基材24之間配置活性能量線硬化性樹脂組成物28,但出於說明的簡便性,將此種狀態亦稱為使滾輪狀模具22與基材24抵接的狀態。另外,亦可不於滾輪狀模具22與基材24之間配置活性能量線硬化性樹脂組成物28,而一面對滾輪狀模具22按壓基材24一面加熱,於基材24的表面上直接形成與微細凹凸結構互補的形狀。 In the description of the present embodiment, the active energy ray-curable resin composition 28 is disposed between the roller-shaped mold 22 and the substrate 24. However, for the sake of simplicity of description, the state is also referred to as a roller. The state in which the mold 22 is in contact with the substrate 24 is obtained. Further, the active energy ray-curable resin composition 28 may not be disposed between the roller-shaped mold 22 and the substrate 24, and may be formed on the surface of the substrate 24 while being heated by pressing the substrate 24 against the roller-shaped mold 22. A shape complementary to the fine uneven structure.

基材24較佳為由射出成形、壓製成形等所得的膜、片。基材24的材質為光透射性的材質,例如可列舉:聚碳酸酯系樹脂、聚苯乙烯系樹脂、聚酯系樹脂、聚胺基甲酸酯系樹脂、丙烯酸系樹脂、聚醚碸、聚碸、聚醚酮、纖維素系樹脂(三乙醯纖維素等)、聚烯烴、脂環式聚烯烴、玻璃等。 The substrate 24 is preferably a film or sheet obtained by injection molding, press molding, or the like. The material of the base material 24 is a light transmissive material, and examples thereof include a polycarbonate resin, a polystyrene resin, a polyester resin, a polyurethane resin, an acrylic resin, and a polyether oxime. Polyfluorene, polyether ketone, cellulose resin (such as triethyl fluorene cellulose), polyolefin, alicyclic polyolefin, glass, and the like.

(活性能量線硬化性樹脂組成物) (Active energy ray curable resin composition)

活性能量線硬化性樹脂組成物28為含有聚合性化合物、聚合起始劑及內部脫模劑的組成物。 The active energy ray-curable resin composition 28 is a composition containing a polymerizable compound, a polymerization initiator, and an internal mold release agent.

組成物於25℃下的黏度較佳為10000 mPa.s以下,進而佳為5000 mPa.s以下,更佳為2000 mPa.s以下。若組成物於25℃下的黏度為10000 mPa.s以下,則組成物對微細凹凸結構的追隨性(conformance)變良好,可精度佳地轉 印微細凹凸結構。組成物的黏度是使用旋轉式E型黏度計於25℃下測定。 The viscosity of the composition at 25 ° C is preferably 10000 mPa. s below, and then preferably 5000 mPa. Below s, more preferably 2000 mPa. s below. If the composition has a viscosity of 10000 mPa at 25 ° C. s or less, the conformability of the composition to the fine uneven structure becomes good, and the precision can be accurately changed. Printed fine concave and convex structure. The viscosity of the composition was measured at 25 ° C using a rotary E-type viscometer.

(聚合性化合物) (polymerizable compound)

聚合性化合物可列舉:分子中具有自由基聚合性鍵及/或陽離子聚合性鍵的單體、低聚物、反應性聚合物等。 Examples of the polymerizable compound include a monomer having a radical polymerizable bond and/or a cationic polymerizable bond in the molecule, an oligomer, a reactive polymer, and the like.

具有自由基聚合性鍵的單體可列舉單官能單體、多官能單體。 The monomer having a radical polymerizable bond may, for example, be a monofunctional monomer or a polyfunctional monomer.

單官能單體可列舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸-2-乙基己酯、(甲基)丙烯酸月桂酯、(甲基)丙烯酸烷基酯、(甲基)丙烯酸十三烷基酯、(甲基)丙烯酸硬脂酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸苄酯、(甲基)丙烯酸苯氧基乙酯、(甲基)丙烯酸異冰片酯、(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸四氫糠酯、(甲基)丙烯酸烯丙酯、(甲基)丙烯酸-2-羥乙酯、(甲基)丙烯酸羥丙酯、(甲基)丙烯酸-2-甲氧基乙酯、(甲基)丙烯酸-2-乙氧基乙酯等(甲基)丙烯酸酯衍生物;(甲基)丙烯酸、(甲基)丙烯腈;苯乙烯、α-甲基苯乙烯等苯乙烯衍生物;(甲基)丙烯醯胺、N-二甲基(甲基)丙烯醯胺、N-二乙基(甲基)丙烯醯胺、二甲基胺基丙基(甲基)丙烯醯胺等(甲基)丙烯醯胺衍生物等。該等可單獨使用一種,亦可併用兩種以上。 The monofunctional monomer may, for example, be methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, n-butyl (meth)acrylate or isobutyl (meth)acrylate, ( Dibutyl methacrylate, tert-butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, lauryl (meth)acrylate, alkyl (meth)acrylate, ( Tridecyl methyl methacrylate, stearyl (meth) acrylate, cyclohexyl (meth) acrylate, benzyl (meth) acrylate, phenoxyethyl (meth) acrylate, (methyl) ) Isobornyl acrylate, glycidyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, allyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, (methyl) (meth) acrylate derivatives such as hydroxypropyl acrylate, 2-methoxyethyl (meth)acrylate, 2-ethoxyethyl (meth)acrylate; (meth)acrylic acid, (A) Acrylonitrile; styrene derivatives such as styrene and α-methylstyrene; (meth) acrylamide, N-dimethyl (meth) acrylamide, N-diethyl (methyl) Acrylamide, dimethylaminopropyl (meth) acrylamide, etc. (Methyl) acrylamide derivatives and the like. These may be used alone or in combination of two or more.

多官能單體可列舉:乙二醇二(甲基)丙烯酸酯、三丙二醇二(甲基)丙烯酸酯、異氰尿酸環氧乙烷改質二(甲基) 丙烯酸酯、三乙二醇二(甲基)丙烯酸酯、二乙二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、1,5-戊二醇二(甲基)丙烯酸酯、1,3-丁二醇二(甲基)丙烯酸酯、聚丁二醇二(甲基)丙烯酸酯、2,2-雙(4-(甲基)丙烯醯氧基聚乙氧基苯基)丙烷、2,2-雙(4-(甲基)丙烯醯氧基乙氧基苯基)丙烷、2,2-雙(4-(3-(甲基)丙烯醯氧基-2-羥基丙氧基)苯基)丙烷、1,2-雙(3-(甲基)丙烯醯氧基-2-羥基丙氧基)乙烷、1,4-雙(3-(甲基)丙烯醯氧基-2-羥基丙氧基)丁烷、二羥甲基三環癸烷二(甲基)丙烯酸酯、雙酚A的環氧乙烷加成物二(甲基)丙烯酸酯、雙酚A的環氧丙烷加成物二(甲基)丙烯酸酯、羥基特戊酸新戊二醇二(甲基)丙烯酸酯、二乙烯基苯、亞甲基雙丙烯醯胺等二官能性單體;季戊四醇三(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、三羥甲基丙烷環氧乙烷改質三(甲基)丙烯酸酯、三羥甲基丙烷環氧丙烷改質三丙烯酸酯、三羥甲基丙烷環氧乙烷改質三丙烯酸酯、異氰尿酸環氧乙烷改質三(甲基)丙烯酸酯等三官能單體;琥珀酸/三羥甲基乙烷/丙烯酸的縮合反應混合物、二季戊四醇六(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、二-三羥甲基丙烷四丙烯酸酯、四羥甲基甲烷四(甲基)丙烯酸酯等四官能以上的單體;二官能以上的丙烯酸胺基甲酸酯、二官能以上的聚酯丙烯酸酯等。該等可單獨使用一種,亦可併用兩種以上。 Examples of the polyfunctional monomer include ethylene glycol di(meth)acrylate, tripropylene glycol di(meth)acrylate, and isocyanuric acid ethylene oxide modified di(methyl). Acrylate, triethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate, 1,6-hexanediol di(methyl) Acrylate, 1,5-pentanediol di(meth)acrylate, 1,3-butanediol di(meth)acrylate, polybutylene glycol di(meth)acrylate, 2,2- Bis(4-(methyl)propenyloxypolyethoxyphenyl)propane, 2,2-bis(4-(methyl)propenyloxyethoxyphenyl)propane, 2,2-double (4-(3-(Methyl)propenyloxy-2-hydroxypropoxy)phenyl)propane, 1,2-bis(3-(methyl)propenyloxy-2-hydroxypropoxy Ethane, 1,4-bis(3-(methyl)propenyloxy-2-hydroxypropoxy)butane, dimethyloltricyclodecane di(meth)acrylate, bisphenol A Ethylene oxide adduct di(meth)acrylate, propylene oxide adduct di(meth)acrylate of bisphenol A, hydroxypivalic acid neopentyl glycol di(meth)acrylate, a difunctional monomer such as divinylbenzene or methylenebis acrylamide; pentaerythritol tri(meth)acrylate, trimethylolpropane tri(meth)acrylate, trimethylolpropane ethylene oxide Modified three (Meth) acrylate, trimethylolpropane propylene oxide modified triacrylate, trimethylolpropane oxirane modified triacrylate, isocyanuric acid ethylene oxide modified tris(methyl) Trifunctional monomer such as acrylate; condensation reaction mixture of succinic acid/trimethylolethane/acrylic acid, dipentaerythritol hexa(meth) acrylate, dipentaerythritol penta (meth) acrylate, di-trimethylol A tetrafunctional or higher monomer such as propane tetraacrylate or tetramethylol methane tetra(meth)acrylate; a difunctional or higher urethane acrylate; a difunctional or higher polyester acrylate. These may be used alone or in combination of two or more.

具有陽離子聚合性鍵的單體可列舉具有環氧基、氧雜環丁基、噁唑啉基、乙烯氧基等的單體,特佳為具有環氧 基的單體。 The monomer having a cationically polymerizable bond may, for example, be a monomer having an epoxy group, an oxetanyl group, an oxazoline group, a vinyloxy group or the like, and particularly preferably an epoxy group. Base monomer.

低聚物或反應性聚合物可列舉:不飽和二羧酸與多元醇的縮合物等不飽和聚酯類;聚酯(甲基)丙烯酸酯、聚醚(甲基)丙烯酸酯、多元醇(甲基)丙烯酸酯、環氧(甲基)丙烯酸酯、(甲基)丙烯酸胺基甲酸酯、陽離子聚合型環氧化合物、側鏈上具有自由基聚合性鍵的上述單體的均聚物或共聚物等。 Examples of the oligomer or the reactive polymer include unsaturated polyesters such as a condensate of an unsaturated dicarboxylic acid and a polyhydric alcohol; polyester (meth) acrylate, polyether (meth) acrylate, and polyhydric alcohol ( Methyl) acrylate, epoxy (meth) acrylate, (meth) acrylate urethane, cationically polymerized epoxy compound, homopolymer of the above monomer having a radical polymerizable bond on the side chain Or copolymers, etc.

(聚合起始劑) (polymerization initiator)

於利用光硬化反應的情形時,光聚合起始劑例如可列舉:安息香、安息香甲醚、安息香乙醚、安息香異丙醚、安息香異丁醚、苯偶醯(benzil)、二苯甲酮、對甲氧基二苯甲酮、2,2-二乙氧基苯乙酮、α,α-二甲氧基-α-苯基苯乙酮、苯甲醯甲酸甲酯、苯甲醯甲酸乙酯、4,4'-雙(二甲基胺基)二苯甲酮、2-羥基-2-甲基-1-苯基丙烷-1-酮等羰基化合物;一硫化四甲基秋蘭姆、二硫化四甲基秋蘭姆等硫化合物;2,4,6-三甲基苯甲醯基二苯基膦氧化物、苯甲醯基二乙氧基膦氧化物等。該等可單獨使用一種,亦可併用兩種以上。 In the case of using a photohardening reaction, the photopolymerization initiator may, for example, be benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzil, benzophenone, or the like. Methoxybenzophenone, 2,2-diethoxyacetophenone, α,α-dimethoxy-α-phenylacetophenone, methyl benzhydrazide, ethyl benzhydrazide a carbonyl compound such as 4,4'-bis(dimethylamino)benzophenone or 2-hydroxy-2-methyl-1-phenylpropan-1-one; tetramethylthiuram monosulfide, a sulfur compound such as tetramethylthiuram disulfide; 2,4,6-trimethylbenzimidyldiphenylphosphine oxide, benzamidinediethoxyphosphine oxide or the like. These may be used alone or in combination of two or more.

於利用電子束硬化反應的情形時,聚合起始劑例如可列舉:二苯甲酮、4,4-雙(二乙基胺基)二苯甲酮、2,4,6-三甲基二苯甲酮、鄰苯甲醯基苯甲酸甲酯、4-苯基二苯甲酮、第三丁基蒽醌、2-乙基蒽醌、2,4-二乙基噻噸酮、異丙基噻噸酮、2,4-二氯噻噸酮等噻噸酮;二乙氧基苯乙酮、2-羥基-2-甲基-1-苯基丙烷-1-酮、苯偶醯二甲基縮酮、1-羥基環己 基-苯基酮、2-甲基-2-嗎啉基(4-硫甲基苯基)丙烷-1-酮、2-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)-丁酮等苯乙酮;安息香甲醚、安息香乙醚、安息香異丙醚、安息香異丁醚等安息香醚;2,4,6-三甲基苯甲醯基二苯基膦氧化物、雙(2,6-二甲氧基苯甲醯基)-2,4,4-三甲基戊基膦氧化物、雙(2,4,6-三甲基苯甲醯基)-苯基膦氧化物等醯基膦氧化物;苯甲醯基甲酸甲酯、1,7-雙吖啶基庚烷、9-苯基吖啶等。該等可單獨使用一種,亦可併用兩種以上。 In the case of using an electron beam hardening reaction, examples of the polymerization initiator include benzophenone, 4,4-bis(diethylamino)benzophenone, and 2,4,6-trimethyl group. Benzophenone, methyl ortho-benzoylbenzoate, 4-phenylbenzophenone, tert-butylhydrazine, 2-ethylhydrazine, 2,4-diethylthioxanthone, isopropyl Thiophenones such as thioxanthone and 2,4-dichlorothioxanthone; diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzoin Methyl ketal, 1-hydroxycyclohexane Base-phenyl ketone, 2-methyl-2-morpholinyl (4-thiomethylphenyl)propan-1-one, 2-benzyl-2-dimethylamino-1-(4-? Acetophenone such as phenylphenyl)-butanone; benzoin ether such as benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether; 2,4,6-trimethylbenzhydryldiphenylphosphine Oxide, bis(2,6-dimethoxybenzylidene)-2,4,4-trimethylpentylphosphine oxide, bis(2,4,6-trimethylbenzylidene) a mercaptophosphine oxide such as a phenylphosphine oxide; methyl benzylidenecarboxylate, 1,7-biacridyl heptane, 9-phenyl acridine or the like. These may be used alone or in combination of two or more.

於利用熱硬化反應的情形時,熱聚合起始劑例如可列舉:過氧化甲基乙基酮、過氧化苯甲醯、過氧化二異丙苯、氫過氧化第三丁基、氫過氧化異丙苯、過氧化辛酸第三丁酯、過氧化苯甲酸第三丁酯、過氧化月桂醯等有機過氧化物;偶氮雙異丁腈等偶氮系化合物;於上述有機過氧化物中組合N,N-二甲基苯胺、N,N-二甲基-對甲苯胺等胺而成的氧化還原系聚合起始劑等。 In the case of utilizing a thermosetting reaction, examples of the thermal polymerization initiator include methyl ethyl ketone peroxide, benzamidine peroxide, dicumyl peroxide, tert-butyl hydroperoxide, and hydroperoxide. An organic peroxide such as cumene, tert-butyl peroxyoctanoate, tert-butyl peroxybenzoate or lauric acid; an azo compound such as azobisisobutyronitrile; in the above organic peroxide A redox polymerization initiator which is obtained by combining an amine such as N,N-dimethylaniline or N,N-dimethyl-p-toluidine.

相對於聚合性化合物100質量份,聚合起始劑的量較佳為0.1質量份~10質量份。若聚合起始劑的量少於0.1質量份,則聚合難以進行。若聚合起始劑的量超過10質量份,則有時硬化膜著色,或機械強度降低。 The amount of the polymerization initiator is preferably from 0.1 part by mass to 10 parts by mass per 100 parts by mass of the polymerizable compound. If the amount of the polymerization initiator is less than 0.1 part by mass, polymerization is difficult to proceed. When the amount of the polymerization initiator exceeds 10 parts by mass, the cured film may be colored or the mechanical strength may be lowered.

(內部脫模劑) (internal release agent)

活性能量線硬化性樹脂組成物藉由含有內部脫模劑,可提高連續轉印性。 The active energy ray-curable resin composition can improve the continuous transfer property by containing an internal mold release agent.

內部脫模劑提高活性能量線硬化性樹脂組成物的硬化物與模具表面的脫模性,且只要具有與活性能量線硬化性 樹脂組成物的相溶性,則其組成並無特別限制。 The internal mold release agent improves the mold release property of the cured product of the active energy ray-curable resin composition and the surface of the mold, and has curable property with active energy rays The composition of the resin composition is not particularly limited in its composition.

內部脫模劑例如可列舉:(聚)氧伸烷基烷基磷酸化合物、含氟化合物、矽酮系化合物、具有長鏈烷基的化合物、聚伸烷基蠟、醯胺蠟、鐵氟龍粉末(鐵氟龍為註冊商標)等。該等可單獨使用一種,亦可併用兩種以上。該等中,較佳為以(聚)氧伸烷基烷基磷酸化合物作為主成分者。 Examples of the internal mold release agent include a (poly)oxyalkylalkylphosphoric acid compound, a fluorine-containing compound, an anthrone compound, a compound having a long-chain alkyl group, a polyalkylene wax, a guanamine wax, and a Teflon. Powder (Teflon is a registered trademark) and so on. These may be used alone or in combination of two or more. Among these, a (poly)oxyalkylalkylphosphoric acid compound is preferred as a main component.

藉由含有與模具脫模劑相同的(聚)氧伸烷基烷基磷酸化合物作為內部脫模劑,作為其硬化物的硬化樹脂層與模具的脫模性變得特別良好。另外,脫模時的負荷極低,故微細凹凸結構的破損少,結果可高效且精度佳地轉印模具的微細凹凸結構。 By using the (poly)oxyalkylalkylphosphoric acid compound which is the same as the mold release agent as the internal mold release agent, the mold release property of the cured resin layer as a cured product and the mold becomes particularly good. Further, since the load at the time of mold release is extremely low, the fine uneven structure is less damaged, and as a result, the fine uneven structure of the mold can be transferred efficiently and with high precision.

就脫模性的方面而言,(聚)氧伸烷基烷基磷酸化合物較佳為下述式(1)所表示的化合物:(HO)3-n(O=)P[-O-(R2O)m-R1]n………(1) In terms of mold releasability, the (poly)oxyalkylalkylphosphonic acid compound is preferably a compound represented by the following formula (1): (HO) 3 - n (O =) P [-O- ( R 2 O) m -R 1 ] n .........(1)

R1為烷基,R2為伸烷基,m為1~20的整數,n為1~3的整數。 R 1 is an alkyl group, R 2 is an alkylene group, m is an integer of 1 to 20, and n is an integer of 1 to 3.

R1較佳為碳數1~20的烷基,更佳為碳數3~18的烷基。 R 1 is preferably an alkyl group having 1 to 20 carbon atoms, more preferably an alkyl group having 3 to 18 carbon atoms.

R2較佳為碳數1~4的伸烷基,更佳為碳數2~3的伸烷基。 R 2 is preferably an alkylene group having 1 to 4 carbon atoms, more preferably an alkylene group having 2 to 3 carbon atoms.

m較佳為1~10的整數。 m is preferably an integer of 1 to 10.

(聚)氧伸烷基烷基磷酸化合物可為單酯體(n=1)、二 酯體(n=2)、三酯體(n=3)的任一種。另外,二酯體或三酯體的情形時,1分子中的多個(聚)氧伸烷基烷基亦可各不相同。 The (poly)oxyalkylalkylphosphoric acid compound may be a monoester (n=1), two Any one of an ester body (n=2) and a triester body (n=3). Further, in the case of a diester or a triester, a plurality of (poly)oxyalkylalkyl groups in one molecule may be different.

(聚)氧伸烷基烷基磷酸化合物的市售品例如可列舉下述者。 Commercial products of the (poly)oxyalkylalkylphosphoric acid compound include, for example, the following.

城北化學公司製造:JP-506H(n≒1~2,m≒1,R1=丁基,R2=伸乙基),艾克塞爾(Axel)公司製造:模維茲(Moldwiz)INT-1856(結構未公開),日光化學公司製造:TDP-10(n≒3,m≒10,R1=C12~15,R2=伸乙基)、TDP-8(n≒3,m≒8,R1=C12~15,R2=伸乙基)、TDP-6(n≒3,m≒6,R1=C12~15,R2=伸乙基)、TDP-2(n≒3,m≒2,R1=C12~15,R2=伸乙基)、DDP-10(n≒2,m≒10,R1=C12~15,R2=伸乙基)、DDP-8(n≒2,m≒8,R1=C12~15,R2=伸乙基)、DDP-6(n≒2,m≒6,R1=C12~15,R2=伸乙基)、DDP-4(n≒2,m≒4,R1=C12~15,R2=伸乙基)、DDP-2(n≒2,m≒2,R1=C12~15,R2=伸乙基)、TLP-4(n≒3,m≒4,R1=月桂基,R2=伸乙基)、TCP-5(n≒3,m≒5,R1=鯨蠟基,R2=伸乙基)、DLP-10(n≒3,m≒10,R1=月桂基,R2=伸乙基)。 Manufactured by Chengbei Chemical Co., Ltd.: JP-506H (n≒1~2, m≒1, R 1 = butyl, R 2 = extended ethyl), manufactured by Axel: Moldwiz INT -1856 (structure not disclosed), manufactured by Nikko Chemical Co., Ltd.: TDP-10 (n≒3, m≒10, R 1 = C12~15, R2 = extended ethyl), TDP-8 (n≒3, m≒8 , R 1 = C12~15, R2 = extended ethyl), TDP-6 (n≒3, m≒6, R 1 = C12~15, R 2 = extended ethyl), TDP-2 (n≒3, m≒2, R 1 = C12~15, R 2 = extended ethyl), DDP-10 (n≒2, m≒10, R 1 = C12~15, R 2 = extended ethyl), DDP-8 ( n≒2, m≒8, R 1 = C12~15, R 2 = extended ethyl), DDP-6 (n≒2, m≒6, R 1 = C12~15, R 2 = extended ethyl), DDP-4 (n≒2, m≒4, R 1 = C12~15, R 2 = extended ethyl), DDP-2 (n≒2, m≒2, R 1 = C12~15, R 2 = stretch Ethyl), TLP-4 (n≒3, m≒4, R 1 = lauryl, R 2 = exoethyl), TCP-5 (n≒3, m≒5, R 1 = cetyl, R 2 = extended ethyl), DLP-10 (n≒3, m≒10, R 1 = lauryl, R 2 = extended ethyl).

(聚)氧伸烷基烷基磷酸化合物可單獨使用一種,亦可併用兩種以上。 The (poly)oxyalkylalkylphosphoric acid compound may be used alone or in combination of two or more.

相對於聚合性化合物的100質量%,(聚)氧伸烷基烷基磷酸化合物的量較佳為0.01質量%~1質量%,更佳為0.05 質量%~0.5質量%,進而佳為0.05質量%~0.1質量%。若(聚)氧伸烷基烷基磷酸化合物的量為1質量%以下,則可抑制硬化樹脂層的性能降低。另外,可抑制與基材的密接性的降低,結果可抑制模具上的樹脂殘留(脫模不良)或硬化樹脂層自物品的剝離。若(聚)氧伸烷基烷基磷酸化合物的量為0.01質量%以上,則自模具的脫模性變充分,可抑制模具上的樹脂殘留(脫模不良)。 The amount of the (poly)oxyalkylalkylphosphonic acid compound is preferably 0.01% by mass to 1% by mass, more preferably 0.05% by mass based on 100% by mass of the polymerizable compound. The mass % to 0.5% by mass, and more preferably 0.05% by mass to 0.1% by mass. When the amount of the (poly)oxyalkylalkylphosphoric acid compound is 1% by mass or less, the deterioration of the performance of the cured resin layer can be suppressed. Further, it is possible to suppress a decrease in the adhesion to the substrate, and as a result, it is possible to suppress resin residue (de-mold failure) on the mold or peeling of the cured resin layer from the article. When the amount of the (poly)oxyalkylene alkylphosphoric acid compound is 0.01% by mass or more, the mold release property from the mold is sufficient, and resin residue (deformation failure) on the mold can be suppressed.

活性能量線硬化性樹脂組成物為了進一步提高脫模性,亦可含有(聚)氧伸烷基烷基磷酸化合物以外的提高脫模性的成分。該成分例如可列舉:含氟化合物、矽酮系化合物、磷酸酯系化合物、具有長鏈烷基的化合物、包含固體蠟(聚伸烷基蠟、醯胺蠟、鐵氟龍粉末(鐵氟龍為註冊商標)等)等的化合物等。 The active energy ray-curable resin composition may further contain a component which improves mold releasability other than the (poly)oxyalkylalkylphosphoric acid compound in order to further improve the mold release property. Examples of the component include a fluorine-containing compound, an anthrone-based compound, a phosphate-based compound, a compound having a long-chain alkyl group, and a solid wax (polyalkylene wax, guanamine wax, and Teflon powder (Teflon). It is a compound such as a registered trademark).

(其他成分) (other ingredients)

活性能量線硬化性樹脂組成物視需要亦可含有非反應性的聚合物、活性能量線溶膠凝膠反應性組成物、抗靜電劑、用以提高防污性的氟化合物等的添加劑、微粒子、少量的溶劑。 The active energy ray-curable resin composition may optionally contain a non-reactive polymer, an active energy ray sol-gel reactive composition, an antistatic agent, an additive such as a fluorine compound for improving antifouling properties, fine particles, A small amount of solvent.

非反應性的聚合物可列舉:丙烯酸系樹脂、苯乙烯系樹脂、聚胺基甲酸酯、纖維素系樹脂、聚乙烯基縮丁醛、聚酯、熱塑性彈性體等。 Examples of the non-reactive polymer include an acrylic resin, a styrene resin, a polyurethane, a cellulose resin, polyvinyl butyral, a polyester, and a thermoplastic elastomer.

活性能量線溶膠凝膠反應性組成物可列舉:烷氧基矽烷化合物、烷基矽酸酯化合物等。 The active energy ray sol-gel reactive composition may, for example, be an alkoxydecane compound or an alkyl phthalate compound.

烷氧基矽烷化合物可列舉:四甲氧基矽烷、四異丙氧 基矽烷、四正丙氧基矽烷、四正丁氧基矽烷、四-第二丁氧基矽烷、四-第三丁氧基矽烷、甲基三乙氧基矽烷、甲基三丙氧基矽烷、甲基三丁氧基矽烷、二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、三甲基乙氧基矽烷、三甲基甲氧基矽烷、三甲基丙氧基矽烷、三甲基丁氧基矽烷等。 The alkoxydecane compound may, for example, be tetramethoxynonane or tetraisopropoxy Base decane, tetra-n-propoxy decane, tetra-n-butoxy decane, tetra-second butoxy decane, tetra-butoxy decane, methyl triethoxy decane, methyl tripropoxy decane Methyl tributoxy decane, dimethyl dimethoxy decane, dimethyl diethoxy decane, trimethyl ethoxy decane, trimethyl methoxy decane, trimethyl propoxy decane , trimethylbutoxydecane, and the like.

烷基矽酸酯化合物可列舉:甲基矽酸酯、乙基矽酸酯、異丙基矽酸酯、正丙基矽酸酯、正丁基矽酸酯、正戊基矽酸酯、乙醯矽酸酯等。 Examples of the alkyl phthalate compound include methyl phthalate, ethyl phthalate, isopropyl phthalate, n-propyl phthalate, n-butyl phthalate, n-pentyl phthalate, and B. Phthalate esters, etc.

活性能量線照射裝置32較佳為高壓水銀燈、金屬鹵化物燈、融合燈(fusion lamp)等,該情形的光照射能量之量較佳為100 mJ/cm2~10000 mJ/cm2The active energy ray irradiation device 32 is preferably a high pressure mercury lamp, a metal halide lamp, a fusion lamp or the like, and the amount of light irradiation energy in this case is preferably from 100 mJ/cm 2 to 10000 mJ/cm 2 .

(光學片材) (optical sheet)

圖5為概略地表示藉由製造裝置20而製造、於表面上具有微細凹凸結構的長條狀光學片材40的構成的剖面圖。 FIG. 5 is a cross-sectional view schematically showing a configuration of an elongated optical sheet 40 having a fine uneven structure on the surface, which is manufactured by the manufacturing apparatus 20.

形成於基材24上的硬化樹脂層38為包含活性能量線硬化性樹脂組成物28的硬化物的層,具有凸部44,該凸部44構成與滾輪狀模具22於外周面上形成的微細凹凸形狀互補的形狀。再者,凸部44的形狀與滾輪狀模具22的形成於外周面上的微細凹凸結構的凹部的形狀互補。另外,微細凹凸結構為多個微細的凸部44以可見光的波長以下的間隔排列而成的所謂蛾眼結構。 The cured resin layer 38 formed on the substrate 24 is a layer containing a cured product of the active energy ray-curable resin composition 28, and has a convex portion 44 which is formed to be fine with the roller-shaped mold 22 on the outer peripheral surface. A shape in which the concave and convex shapes are complementary. Further, the shape of the convex portion 44 is complementary to the shape of the concave portion of the fine uneven structure formed on the outer peripheral surface of the roller-shaped mold 22. In addition, the fine uneven structure is a so-called moth-eye structure in which a plurality of fine convex portions 44 are arranged at intervals of a wavelength of visible light or less.

凸部44的形狀較佳為與高度方向正交的方向的凸部剖面積自最表面起於深度方向上連續增加的形狀,即凸部的高度方向的剖面形狀為三角形、梯形、吊鐘形等形狀。 The shape of the convex portion 44 is preferably a shape in which the cross-sectional area of the convex portion in the direction orthogonal to the height direction continuously increases from the outermost surface in the depth direction, that is, the cross-sectional shape in the height direction of the convex portion is triangular, trapezoidal, or bell-shaped. And other shapes.

凸部44間的平均間隔為可見光的波長以下,即400 nm以下。於使用陽極氧化氧化鋁的模具形成凸部的情形時,由於凸部間的平均間隔成為100 nm~200 nm左右,故特佳為250 nm以下。 The average interval between the convex portions 44 is equal to or less than the wavelength of visible light, that is, 400 nm or less. When a convex portion is formed in a mold using anodized alumina, since the average interval between the convex portions is about 100 nm to 200 nm, it is particularly preferably 250 nm or less.

就凸部的形成容易性的方面而言,凸部44的平均間隔較佳為20 nm以上。 The average interval of the convex portions 44 is preferably 20 nm or more in terms of ease of formation of the convex portions.

凸部44的平均間隔為藉由電子顯微鏡觀察對鄰接的凸部44的間隔(自凸部的中心至鄰接凸部的中心為止的距離)測定50點,並將該些值平均所得的值。 The average interval between the convex portions 44 is a value obtained by measuring the distance between the adjacent convex portions 44 (the distance from the center of the convex portion to the center of the adjacent convex portion) by an electron microscope, and averaging the values.

凸部44的高度於平均間隔為100 nm的情形時,較佳為80 nm~500 nm,更佳為120 nm~400 nm,特佳為150 nm~300 nm。若凸部的高度為80 nm以上,則反射率充分變低,且反射率的波長依存性少。若凸部的高度為500 nm以下,則凸部的耐擦傷性變良好。 When the height of the convex portion 44 is 100 nm at an average interval, it is preferably 80 nm to 500 nm, more preferably 120 nm to 400 nm, and particularly preferably 150 nm to 300 nm. When the height of the convex portion is 80 nm or more, the reflectance is sufficiently low, and the wavelength dependence of the reflectance is small. When the height of the convex portion is 500 nm or less, the scratch resistance of the convex portion becomes good.

凸部44的高度為藉由電子顯微鏡以30000倍的倍率進行觀察時,對凸部的最頂部與存在於凸部間的凹部的最底部之間的距離進行測定所得的值。 The height of the convex portion 44 is a value obtained by measuring the distance between the topmost portion of the convex portion and the bottommost portion of the concave portion existing between the convex portions when observed by an electron microscope at a magnification of 30,000 times.

凸部44的縱橫比(凸部的高度/凸部間的平均間隔)較佳為0.8~5.0,更佳為1.2~4.0,特佳為1.5~3.0。若凸部的縱橫比為1.0以上,則反射率充分變低。若凸部的縱橫比為5.0以下,則凸部的耐擦傷性變良好。 The aspect ratio of the convex portion 44 (the height of the convex portion/the average interval between the convex portions) is preferably 0.8 to 5.0, more preferably 1.2 to 4.0, and particularly preferably 1.5 to 3.0. When the aspect ratio of the convex portion is 1.0 or more, the reflectance is sufficiently lowered. When the aspect ratio of the convex portion is 5.0 or less, the scratch resistance of the convex portion is improved.

硬化樹脂層38的折射率與基材24的折射率之差較佳為0.2以下,更佳為0.1以下,特佳為0.05以下。若折射率差為0.2以下,則可抑制硬化樹脂層38與基材24的界 面上的反射。 The difference between the refractive index of the cured resin layer 38 and the refractive index of the substrate 24 is preferably 0.2 or less, more preferably 0.1 or less, and particularly preferably 0.05 or less. When the refractive index difference is 0.2 or less, the boundary between the cured resin layer 38 and the substrate 24 can be suppressed. Reflection on the surface.

已知於表面上具有微細凹凸結構的情形時,若其表面是由疏水性的材料所形成,則可藉由蓮花效應而獲得超撥水性,若其表面是由親水性的材料所形成,則可獲得超親水性。 When it is known that the surface has a fine concavo-convex structure, if the surface is formed of a hydrophobic material, the super-water-repellent property can be obtained by the lotus effect, and if the surface is formed of a hydrophilic material, Super hydrophilicity is obtained.

於硬化樹脂層38的材料為疏水性的情形時,微細凹凸結構的表面的水接觸角較佳為90°以上,更佳為110°以上,特佳為120°以上。若水接觸角為90°以上,則水污垢不易附著,故可發揮充分的防污性。另外,由於水不易附著,故可期待防止凍冰(icing)。 When the material of the cured resin layer 38 is hydrophobic, the water contact angle of the surface of the fine uneven structure is preferably 90 or more, more preferably 110 or more, and particularly preferably 120 or more. When the water contact angle is 90 or more, the water stain is less likely to adhere, so that sufficient antifouling properties can be exhibited. In addition, since water is not easily adhered, it is expected to prevent icing.

於硬化樹脂層38的材料為親水性的情形時,微細凹凸結構的表面的水接觸角較佳為25°以下,更佳為23°以下,特佳為21°以下。若水接觸角為25°以下,則表面上附著的污垢可用水沖洗,另外油污不易附著,故可發揮充分的防污性。就抑制由硬化樹脂層38的吸水所致的微細凹凸結構的變形、隨之而產生的反射率上升的方面而言,該水接觸角較佳為3°以上。 When the material of the cured resin layer 38 is hydrophilic, the water contact angle of the surface of the fine uneven structure is preferably 25 or less, more preferably 23 or less, and particularly preferably 21 or less. When the water contact angle is 25 or less, the dirt adhering to the surface can be washed with water, and the oil stain is less likely to adhere, so that sufficient antifouling properties can be exhibited. The water contact angle is preferably 3° or more in terms of suppressing deformation of the fine concavo-convex structure due to water absorption of the hardened resin layer 38 and an accompanying increase in reflectance.

如上所述,於滾輪狀模具22的外周面上,殘留有作為切削痕的含有凸條狀部分的條狀凹凸,故該含有凸條狀部分的條狀凹凸形狀亦被反轉轉印至硬化樹脂層38上。而且,該條狀的凹凸雖然通常看不到,但若自光學片材40的背面使用指向性高的發光二極體(Light Emitting Diode,LED)光源進行利用透射光的觀察,則略微可看到。 As described above, the strip-shaped unevenness including the ridge-like portion as the cutting mark remains on the outer circumferential surface of the roller-shaped mold 22, so that the strip-shaped uneven shape including the ridge-like portion is also reverse-transferred to hardening. On the resin layer 38. Further, although the strip-shaped unevenness is not normally observed, if the light-emitting diode (LED) light source having high directivity is used from the back surface of the optical sheet 40, observation by transmitted light is slightly observed. To.

然而,滾輪狀模具22的外周面的凸條1b的間距為5 μm~50 μm,故反轉轉印至硬化樹脂層38上的條狀凹凸的間距亦成為5 μm~50 μm。 However, the pitch of the ridges 1b of the outer peripheral surface of the roller-shaped mold 22 is 5 Since μm is 50 μm, the pitch of the strip-like unevenness which is reversely transferred to the cured resin layer 38 is also 5 μm to 50 μm.

如上所述,目前液晶面板等電子顯示裝置的畫素的通常的排列週期(畫素間距)最小亦為80 μm左右,故上述反轉轉印至硬化樹脂層38上的條狀凹凸的間距亦為5 μm~50 μm,而成為液晶面板等電子顯示裝置的畫素的通常的畫素間距的一半以下。 As described above, the current arrangement period (pixel pitch) of the pixels of an electronic display device such as a liquid crystal panel is at least about 80 μm, so that the pitch of the strip-shaped unevenness which is reversely transferred to the cured resin layer 38 is also It is 5 μm to 50 μm, and is half or less of the normal pixel pitch of a pixel of an electronic display device such as a liquid crystal panel.

通常,於電子顯示裝置中,以約100 μm~300 μm的既定的點間距縱橫地且規則地配置有畫素點,若於其上配置具有與畫素點的排列平行的圖案的光學片等,則容易產生干涉像。 In an electronic display device, a pixel point is vertically and horizontally arranged at a predetermined dot pitch of about 100 μm to 300 μm, and an optical sheet having a pattern parallel to the arrangement of pixel points is disposed thereon. , it is easy to produce interference images.

然而,基於本實施形態的光學片中,條狀的凹凸形狀的排列間距為5 μm~50 μm的範圍內,與顯示裝置等的點間距相比較非常小,故於在電子顯示裝置中利用本發明的光學片的情形時,可抑制干涉像的產生或即便產生亦非常小而不易看到。因此,本發明的光學片可較佳地用作配置於液晶顯示裝置或有機EL(Organic Electro-Luminescence)等電子顯示裝置的表面上的電子顯示裝置用抗反射膜。 However, in the optical sheet of the present embodiment, the arrangement pitch of the strip-shaped uneven shapes is in the range of 5 μm to 50 μm, and is extremely small compared with the dot pitch of the display device or the like. Therefore, the present invention is used in an electronic display device. In the case of the optical sheet of the invention, it is possible to suppress the occurrence of an interference image or to be very small even if it is not easily seen. Therefore, the optical sheet of the present invention can be preferably used as an antireflection film for an electronic display device which is disposed on the surface of an electronic display device such as a liquid crystal display device or an organic EL (Organic Electro-Luminescence).

另外,電子顯示裝置的畫素點的週期視電子顯示裝置的不同而不同,但若滾輪狀模具22的外周面的凸條1b的間距為電子顯示裝置的點間距的一半以下,則可抑制產生干涉像。於上述說明中,對滾輪狀模具22的外周面的凸條1b的間距為5 μm~50 μm以下的情形進行了說明,但如上所述,由於目前液晶面板等電子顯示裝置的畫素的通常的 排列週期(畫素間距)最小亦為80 μm左右,故凸條1b的間距成為電子顯示裝置的畫素點的週期的一半以下。 In addition, the period of the pixel point of the electronic display device differs depending on the electronic display device. However, if the pitch of the ridges 1b on the outer circumferential surface of the roller-shaped mold 22 is less than or equal to half the dot pitch of the electronic display device, generation can be suppressed. Interference image. In the above description, the case where the pitch of the ridges 1b on the outer circumferential surface of the roller-shaped mold 22 is 5 μm to 50 μm or less has been described. However, as described above, the pixels of an electronic display device such as a liquid crystal panel are generally used. of The arrangement period (pixel pitch) is also at least about 80 μm, so the pitch of the ridges 1b is less than or equal to half the period of the pixel point of the electronic display device.

因此,由於電子顯示裝置的畫素點的週期視電子顯示裝置的不同而不同,故若預先充分減小凸條1b的間距,則可製造可應用於大多數的電子顯示裝置中的電子顯示裝置用抗反射膜。亦就此種觀點而言,較佳為將滾輪狀模具22的外周面的凸條1b的間距設定為5 μm以上,且較佳為設定為50 μm以下,更佳為設定為40 μm以下,進而佳為設定為30 μm以下。 Therefore, since the period of the pixel point of the electronic display device differs depending on the electronic display device, if the pitch of the ridge 1b is sufficiently reduced in advance, an electronic display device applicable to most electronic display devices can be manufactured. Use an anti-reflection film. In this regard, the pitch of the ridges 1b on the outer circumferential surface of the roller-shaped mold 22 is preferably set to 5 μm or more, and is preferably set to 50 μm or less, and more preferably set to 40 μm or less. The optimum setting is 30 μm or less.

進而,電子顯示裝置的畫素點的週期不限定於目前的數值,故本實施形態以凸條1b的間距成為電子顯示裝置的畫素點的週期的一半以下的方式適當變更上述切削間距。 Further, the cycle of the pixel point of the electronic display device is not limited to the current numerical value. Therefore, in the present embodiment, the cutting pitch is appropriately changed so that the pitch of the ridge 1b becomes half or less of the period of the pixel point of the electronic display device.

另外,基於本發明的電子顯示裝置用抗反射膜可配置於顯示裝置的保護板或前面板的單面或兩面、或者顯示裝置上配置的觸控面板等構件的單面或兩面上而使用。然而,由於隔開顯示裝置而配置的構件不易產生與顯示裝置的畫素的干涉像,故於使用基於本發明的光學片作為電子顯示裝置用抗反射膜的情形時,較佳為貼附於顯示裝置的表面上而使用。 Further, the antireflection film for an electronic display device according to the present invention can be disposed on one side or both sides of a protective plate or a front panel of a display device, or a member such as a touch panel disposed on a display device. However, since the member disposed apart from the display device is less likely to generate an interference image with the pixel of the display device, when the optical sheet according to the present invention is used as an antireflection film for an electronic display device, it is preferably attached to Used on the surface of the display device.

[實例] [Example] (實例1) (Example 1)

製作滾輪狀模具時,準備直徑200 mm、寬度320 mm的鋁母材。滾輪狀鋁母材是使用在兩端實施了夾盤用的軸加工、且進行了不產生由車床加工所致的變形的加工者。 When making a roller-shaped mold, prepare an aluminum base material with a diameter of 200 mm and a width of 320 mm. The roller-shaped aluminum base material is a processor that uses a shaft for performing a chuck at both ends and performs deformation without causing machining by a lathe.

繼而,以作為基準的滾輪狀鋁母材的軸部的接觸部成為5 μm以下的方式設置於精密車床中。 Then, the contact portion of the shaft portion of the roller-shaped aluminum base material as a reference is set to be 5 μm or less in a precision lathe.

然後,準備頂端R為5 mm的單晶金剛石車刀,藉由顯微鏡確認車刀頂端並無異常後,安裝於精密車床上。於使滾輪以每分鐘1000轉的速度旋轉的狀態下,進行10 μm的切入,以每轉10 μm的進給切削間距進行鋁母材的表面的鏡面切削。 Then, a single crystal diamond turning tool having a top end of 5 mm was prepared, and it was confirmed by a microscope that the tip of the turning tool was not abnormal, and then mounted on a precision lathe. In the state where the roller was rotated at a speed of 1000 rpm, a 10 μm cut was performed, and the surface of the aluminum base material was mirror-cut at a feed cutting pitch of 10 μm per revolution.

為了改善加工部的冷卻及潤滑,對金剛石車刀的前刀面(rake face)及後刀面(relief face)以霧狀供給切削油,實施加工。進而將所產生的切屑配置於鏡面加工的未加工側,平行地實施所產生的切屑的排出。 In order to improve the cooling and lubrication of the processed portion, the cutting oil is supplied to the rake face and the relief face of the diamond turning tool in a mist form and processed. Further, the generated chips are placed on the unmachined side of the mirror surface processing, and the generated chips are discharged in parallel.

對實施了鏡面加工的鋁母材於暗室內使用線性光(line light)而實施模具本身的外觀檢查,結果製成了外觀上美觀的鏡面加工滾輪。此時的理論表面粗糙度Ry為2.5 nm。 The aluminum base material subjected to mirror processing was subjected to visual inspection using linear light in a dark room, and as a result, a mirror-finished roller having an aesthetically pleasing appearance was produced. The theoretical surface roughness Ry at this time was 2.5 nm.

繼而,對實施了鏡面加工的鋁母材實施以下處理,於表面上形成微細凹凸形狀。 Then, the aluminum base material subjected to the mirror surface processing was subjected to the following treatment to form a fine uneven shape on the surface.

(a)步驟: (a) Steps:

將該鋁板於0.3 M草酸水溶液中於直流40 V、溫度16℃的條件下進行30分鐘陽極氧化。 The aluminum plate was anodized in a 0.3 M aqueous solution of oxalic acid under the conditions of a direct current of 40 V and a temperature of 16 ° C for 30 minutes.

(b)步驟: (b) Steps:

將於上述步驟中形成了氧化皮膜的鋁板於6質量%磷酸/1.8質量%鉻酸混合水溶液中浸漬6小時,將氧化皮膜去除。 The aluminum plate on which the oxide film was formed in the above step was immersed in a 6 mass% phosphoric acid/1.8 mass% chromic acid mixed aqueous solution for 6 hours to remove the oxide film.

(c)步驟: (c) Steps:

將該鋁板於0.3 M草酸水溶液中於直流40 V、溫度16℃的條件下進行30秒鐘陽極氧化。 The aluminum plate was anodized in a 0.3 M aqueous solution of oxalic acid under the conditions of a direct current of 40 V and a temperature of 16 ° C for 30 seconds.

(d)步驟: (d) Steps:

將於上述步驟中形成了氧化皮膜的鋁板於32℃的5質量%磷酸中浸漬8分鐘,進行孔隙徑擴大處理。 The aluminum plate on which the oxide film was formed in the above step was immersed in 5 mass% phosphoric acid at 32 ° C for 8 minutes to carry out a pore diameter expansion treatment.

(e)步驟: (e) Steps:

將上述(c)步驟及(d)步驟重複合計5次,獲得具有週期為100 nm、深度為180 nm的大致圓錐形狀的孔隙的陽極氧化多孔氧化鋁。 The above steps (c) and (d) were recombined five times to obtain an anodized porous alumina having a substantially conical shape having a period of 100 nm and a depth of 180 nm.

以脫離子水清洗所得的陽極氧化多孔氧化鋁,繼而藉由鼓風(air flow)將表面的水分去除,於利用稀釋劑(哈維斯(Harves)公司製造,商品名HD-ZV)將氟系剝離材(大金工業公司製造,商品名奧普拓(Optools)DSX)以固體成分成為0.1質量%的方式稀釋所得的溶液中浸漬10分鐘,風乾20小時,獲得於表面上形成有孔隙的滾輪狀模具。 The obtained anodized porous alumina was washed with deionized water, and then the surface water was removed by air flow, and fluorine was used by using a diluent (manufactured by Harves, trade name HD-ZV). The release material (manufactured by Daikin Industries, Ltd., trade name: Optools DSX) was immersed for 10 minutes in a solution obtained by diluting the solid content to 0.1% by mass, and air-dried for 20 hours to obtain pores formed on the surface. Roller mold.

若對所得的滾輪狀模具照射指向性高的來自LED光源的光進行觀察,則略微確認到20 μm間距的條狀的凹凸結構。 When the obtained roller-shaped mold was irradiated with light having high directivity from the LED light source, a strip-like uneven structure having a pitch of 20 μm was slightly confirmed.

於滾輪狀模具的孔隙面上流入紫外線硬化性樹脂組成物,於其上將基材膜一面推開一面被覆。自該基材膜側使用高壓水銀燈以2000 mJ/cm2的能量照射紫外線,使樹脂組成物硬化。其後,自滾輪狀模具剝離基材膜及經硬化的 樹脂組成物,獲得於表面上具有微細凹凸結構的光學片。 An ultraviolet curable resin composition was poured into the pore surface of the roll-shaped mold, and the base film was pushed over while being covered. The resin composition was cured by irradiating ultraviolet rays with an energy of 2000 mJ/cm 2 from the substrate film side using a high pressure mercury lamp. Thereafter, the base film and the cured resin composition were peeled off from the roller-shaped mold to obtain an optical sheet having a fine uneven structure on the surface.

於該光學片的表面上,轉印有滾輪狀模具的條狀的凹凸結構及微細凹凸結構,形成如圖5所示的10 μm間距的條狀的凹凸結構、及鄰接的凸部46的間隔為100 nm且凸部46的高度為180 nm的大致圓錐形狀的奈米凹凸結構。 On the surface of the optical sheet, a strip-shaped uneven structure and a fine uneven structure of a roller-shaped mold are transferred, and a strip-shaped uneven structure having a pitch of 10 μm as shown in FIG. 5 and an interval of adjacent convex portions 46 are formed. A substantially conical nano-concave structure of 100 nm and a height of the convex portion 46 of 180 nm.

將該光學片切割成矩形而獲得矩形狀的光學膜。此時,以條狀的凹凸結構與矩形形狀的至少一邊平行的方式切割光學片。 The optical sheet was cut into a rectangular shape to obtain a rectangular optical film. At this time, the optical sheet is cut in such a manner that the strip-shaped uneven structure is parallel to at least one side of the rectangular shape.

繼而,將矩形狀光學膜設置於單元間距為180 μm的液晶單元上,組入至背光單元中並點亮,結果可獲得看不到干擾紋的良好外觀。 Then, a rectangular optical film was placed on a liquid crystal cell having a cell pitch of 180 μm, incorporated into the backlight unit, and lit, and as a result, a good appearance in which interference fringes were not obtained was obtained.

(實例2) (Example 2)

將與實例1相同的滾輪狀模具設置於精密車床中,用於加工的單晶金剛石車刀是準備頂端R為15 mm者。藉由顯微鏡確認車刀頂端並無異常後,安裝於精密車床上。於使滾輪以每分鐘1000轉的速度旋轉的狀態下,進行10 μm的切入,以每轉50 μm的進給切削間距進行鋁母材的表面的鏡面切削。此時的理論表面粗糙度Ry為20.8 nm。 The same roller-shaped mold as in Example 1 was placed in a precision lathe, and the single crystal diamond turning tool for processing was prepared to have a tip R of 15 mm. After confirming that there is no abnormality at the top of the turning tool by the microscope, it is mounted on a precision lathe. In the state where the roller was rotated at a speed of 1000 rpm, a cutting of 10 μm was performed, and the surface of the aluminum base material was mirror-cut at a feed cutting pitch of 50 μm per revolution. The theoretical surface roughness Ry at this time was 20.8 nm.

鏡面加工後,於暗室內使用線性光實施模具本身的外觀檢查,結果製成了外觀上美觀的鏡面加工滾輪。 After the mirror processing, the visual inspection of the mold itself was carried out using linear light in a dark room, and as a result, a mirror-finished roller having an aesthetically pleasing appearance was produced.

另外,與實例1同樣地實施陽極氧化處理及賦形作業,獲得光學片卷材。對於該光學片,以條狀的凹凸結構與矩形形狀的至少一邊平行的方式切割光學片,將矩形狀光學膜設置於單元間距為180 μm的液晶單元上,組入至 背光單元中並點亮,結果可獲得看不到干擾紋的良好外觀。 Further, an anodizing treatment and a forming operation were carried out in the same manner as in Example 1 to obtain an optical sheet web. In the optical sheet, the optical sheet is cut in such a manner that the strip-shaped uneven structure is parallel to at least one side of the rectangular shape, and the rectangular optical film is placed on the liquid crystal cell having a cell pitch of 180 μm, and is assembled to The backlight unit is lit and the result is that a good appearance without interference fringes can be obtained.

(實例3) (Example 3)

將與實例1相同的滾輪狀模具設置於精密車床中,用於加工的單晶金剛石車刀是準備頂端R為2 mm者。藉由顯微鏡確認車刀頂端並無異常後,安裝於精密車床上。於使滾輪以每分鐘1000轉的速度旋轉的狀態下,進行10 μm的切入,以每轉30 μm的進給切削間距進行鋁母材的表面的鏡面切削。此時的理論表面粗糙度Ry為56.25 nm。 The same roller-shaped mold as in Example 1 was placed in a precision lathe, and the single crystal diamond turning tool for processing was prepared to have a tip R of 2 mm. After confirming that there is no abnormality at the top of the turning tool by the microscope, it is mounted on a precision lathe. In the state where the roller was rotated at a speed of 1000 rpm, a 10 μm cut was performed, and the surface of the aluminum base material was mirror-cut at a feed cutting pitch of 30 μm per revolution. The theoretical surface roughness Ry at this time was 56.25 nm.

鏡面加工後,於暗室內使用線性光實施模具本身的外觀檢查,結果製成了外觀上美觀的鏡面加工滾輪。 After the mirror processing, the visual inspection of the mold itself was carried out using linear light in a dark room, and as a result, a mirror-finished roller having an aesthetically pleasing appearance was produced.

另外,與實例1同樣地實施陽極氧化處理及賦形作業,獲得光學片卷材。對於該光學片,以條狀的凹凸結構與矩形形狀的至少一邊平行的方式切割光學片,將矩形狀光學膜設置於單元間距為180 μm的液晶單元上,組入至背光單元中並點亮,結果可獲得看不到干擾紋的良好外觀。 Further, an anodizing treatment and a forming operation were carried out in the same manner as in Example 1 to obtain an optical sheet web. In the optical sheet, the optical sheet is cut in such a manner that the strip-shaped uneven structure is parallel to at least one side of the rectangular shape, and the rectangular optical film is placed on the liquid crystal cell having a cell pitch of 180 μm, incorporated into the backlight unit and lit. As a result, a good appearance in which interference fringes are not obtained can be obtained.

(實例4) (Example 4)

將與實例1相同的滾輪狀模具設置於精密車床中,用於加工的單晶金剛石車刀是準備頂端R為100 mm者。藉由顯微鏡確認車刀頂端並無異常後,安裝於精密車床上。於使滾輪以每分鐘1000轉的速度旋轉的狀態下,進行10 μm的切入,以每轉100 μm的進給切削間距進行鋁母材的表面的鏡面切削。此時的理論表面粗糙度Ry為12.5 nm。 The same roller-shaped mold as in Example 1 was placed in a precision lathe, and the single crystal diamond turning tool for processing was prepared to have a tip R of 100 mm. After confirming that there is no abnormality at the top of the turning tool by the microscope, it is mounted on a precision lathe. In the state where the roller was rotated at a speed of 1000 rpm, a 10 μm cut was performed, and the surface of the aluminum base material was mirror-cut at a feed cutting pitch of 100 μm per revolution. The theoretical surface roughness Ry at this time was 12.5 nm.

鏡面加工後,於暗室內使用線性光實施模具本身的外觀檢查,結果製成了外觀上美觀的鏡面加工滾輪。 After the mirror processing, the visual inspection of the mold itself was carried out using linear light in a dark room, and as a result, a mirror-finished roller having an aesthetically pleasing appearance was produced.

另外,與實例1同樣地實施陽極氧化處理及賦形作業,獲得光學片卷材。對於該光學片,以條狀的凹凸結構與矩形形狀的至少一邊平行的方式切割光學片,將矩形狀光學膜設置於單元間距為180 μm的液晶單元上,組入至背光單元中並點亮,結果除了確認到明顯的干擾紋以外確認不到外觀的異常。 Further, an anodizing treatment and a forming operation were carried out in the same manner as in Example 1 to obtain an optical sheet web. In the optical sheet, the optical sheet is cut in such a manner that the strip-shaped uneven structure is parallel to at least one side of the rectangular shape, and the rectangular optical film is placed on the liquid crystal cell having a cell pitch of 180 μm, incorporated into the backlight unit and lit. As a result, an abnormality in appearance was not confirmed except that a significant interference pattern was confirmed.

(比較例1) (Comparative Example 1)

除了將切削間距設定為200 μm以外,進行與實例1相同的作業。 The same operation as in Example 1 was carried out except that the cutting pitch was set to 200 μm.

將所得的矩形狀光學片設置於單元間距為180 μm的液晶單元上,組入至背光單元中並點亮,結果確認到明顯的干涉條紋。此時的理論表面粗糙度Ry為333.3 nm。 The obtained rectangular optical sheets were placed on a liquid crystal cell having a cell pitch of 180 μm, incorporated into a backlight unit, and lit, and as a result, significant interference fringes were confirmed. The theoretical surface roughness Ry at this time was 333.3 nm.

(比較例2) (Comparative Example 2)

除了將切削間距設定為5 μm以外,進行與實例2相同的作業。結果模具外觀全面白化,而成為無法用作模具的狀態。此時的理論表面粗糙度Ry為0.21 nm。 The same operation as in Example 2 was carried out except that the cutting pitch was set to 5 μm. As a result, the appearance of the mold was completely whitened, and it became a state in which it could not be used as a mold. The theoretical surface roughness Ry at this time was 0.21 nm.

(比較例3) (Comparative Example 3)

將與實例1相同的滾輪狀模具設置於精密車床中,用於加工的單晶金剛石車刀是準備頂端R為2 mm者。藉由顯微鏡確認車刀頂端並無異常後,安裝於精密車床上。於使滾輪以每分鐘1000轉的速度旋轉的狀態下,進行10 μm的切入,以每轉50 μm的進給切削間距進行鋁母材的表面的鏡面切削。此時的理論表面粗糙度Ry為156.3 nm。 The same roller-shaped mold as in Example 1 was placed in a precision lathe, and the single crystal diamond turning tool for processing was prepared to have a tip R of 2 mm. After confirming that there is no abnormality at the top of the turning tool by the microscope, it is mounted on a precision lathe. In the state where the roller was rotated at a speed of 1000 rpm, a cutting of 10 μm was performed, and the surface of the aluminum base material was mirror-cut at a feed cutting pitch of 50 μm per revolution. The theoretical surface roughness Ry at this time was 156.3 nm.

鏡面加工後,於暗室內使用線性光實施模具本身的外 觀檢查,結果確認不到干擾紋,然而,全面產生虹狀的條紋,而成為無法用作鏡面加工滾輪的狀態。 After mirror processing, linear light is used in the dark room to implement the mold itself. As a result of the inspection, it was confirmed that the interference pattern was not observed. However, the rainbow-like streaks were generated in an all-round manner, and it was in a state incapable of being used as a mirror-finished roller.

1‧‧‧鋁母材 1‧‧‧Aluminum base metal

1a‧‧‧外周面 1a‧‧‧outer surface

1b‧‧‧凸條 1b‧‧‧ ribs

2‧‧‧旋轉機構 2‧‧‧Rotating mechanism

4‧‧‧車刀 4‧‧‧ turning tools

6‧‧‧平台 6‧‧‧ platform

10‧‧‧表面部分 10‧‧‧Surface

12、12'‧‧‧孔隙 12, 12'‧‧‧ pores

14‧‧‧氧化皮膜 14‧‧‧Oxide film

16‧‧‧孔隙產生點 16‧‧‧Pore generation points

18‧‧‧模具 18‧‧‧Mold

20‧‧‧製造裝置 20‧‧‧ Manufacturing equipment

22‧‧‧滾輪狀模具 22‧‧‧Roller mould

24‧‧‧基材 24‧‧‧Substrate

26‧‧‧夾持滾輪 26‧‧‧Clamping roller

28‧‧‧活性能量線硬化性樹脂組成物 28‧‧‧Active energy ray-curable resin composition

30‧‧‧噴嘴 30‧‧‧Nozzles

32‧‧‧活性能量線照射裝置 32‧‧‧Active energy line irradiation device

34‧‧‧空氣壓缸 34‧‧‧Air cylinder

36‧‧‧儲罐 36‧‧‧ storage tank

38‧‧‧硬化樹脂層 38‧‧‧ hardened resin layer

40‧‧‧光學片材 40‧‧‧Optical sheet

42‧‧‧剝離滾輪 42‧‧‧ peeling roller

44‧‧‧凸部 44‧‧‧ convex

P‧‧‧排列週期 P‧‧‧ Arrangement cycle

圖1為說明製作本發明的較佳實施形態的光學片製造用滾輪狀模具時的鋁母材的切削加工的圖式。 Fig. 1 is a view for explaining a cutting process of an aluminum base material when a roll-shaped mold for producing an optical sheet according to a preferred embodiment of the present invention is produced.

圖2為示意性地表示本發明的其他較佳態樣的光學片製造用滾輪狀模具的構成的圖式。 Fig. 2 is a view schematically showing the configuration of a roll-shaped mold for producing an optical sheet according to another preferred embodiment of the present invention.

圖3為表示於滾輪狀模具的表面上製造具有微細凹凸結構的陽極氧化氧化鋁的步驟的示意性剖面圖。 Fig. 3 is a schematic cross-sectional view showing a step of producing an anodized alumina having a fine uneven structure on the surface of a roll-shaped mold.

圖4為示意性地表示製造於表面上具有微細凹凸結構的光學片的製造裝置的一例的構成的構成圖。 FIG. 4 is a configuration diagram schematically showing an example of a manufacturing apparatus of an optical sheet having a fine uneven structure on the surface.

圖5為示意性地表示於表面上具有微細凹凸結構的光學片的剖面結構的圖式。 Fig. 5 is a view schematically showing a cross-sectional structure of an optical sheet having a fine uneven structure on its surface.

1‧‧‧鋁母材 1‧‧‧Aluminum base metal

1a‧‧‧外周面 1a‧‧‧outer surface

1b‧‧‧凸條 1b‧‧‧ ribs

P‧‧‧排列週期 P‧‧‧ Arrangement cycle

Claims (5)

一種光學片製造用模具的製造方法,其為於表面上具有微細凹凸結構、並將上述表面的上述微細凹凸結構轉印至片材上而製成光學片材的光學片製造用模具的製造方法,且其特徵在於,包括:鏡面加工步驟,以既定的進給間距切削鋁母材的表面,對上述鋁母材的表面進行鏡面加工;以及微細凹凸結構的形成步驟,對上述鋁母材的上述表面實施陽極氧化而形成微細凹凸結構;並且於上述鏡面加工步驟中,於將上述切削車刀的上述進給間距設定為F、上述切削車刀的頂端的曲率半徑設定為R時,以下述式(1)所表示的Ry的值成為1.5 nm以上且100 nm以下的方式進行上述鋁母材的切削,Ry=F2/8R (1)。 A method for producing an optical sheet manufacturing mold, which is a method for producing an optical sheet manufacturing mold having a fine uneven structure on a surface and transferring the fine uneven structure on the surface onto a sheet to form an optical sheet And characterized in that it comprises: a mirror finishing step of cutting a surface of the aluminum base material at a predetermined feed pitch, mirror-finishing the surface of the aluminum base material; and forming a fine uneven structure on the aluminum base material The surface is anodized to form a fine uneven structure; and in the mirror processing step, when the feed pitch of the cutting tool is set to F and the radius of curvature of the tip of the cutting tool is set to R, the following The aluminum base material is cut so that the value of Ry represented by the formula (1) is 1.5 nm or more and 100 nm or less, and Ry=F 2 /8R (1). 如申請專利範圍第1項所述之光學片製造用模具的製造方法,其中上述切削車刀的上述進給間距為5 μm以上且50 μm以下。 The method for producing a mold for producing an optical sheet according to claim 1, wherein the feed pitch of the cutting tool is 5 μm or more and 50 μm or less. 一種光學片製造方法,其使用藉由如申請專利範圍第1項所述之製造方法而製造的模具,上述光學片製造方法的特徵在於,包括:轉印步驟,使片抵接於上述模具的表面,將上述表面的形狀轉印至上述片上,而製成光學片 材。 An optical sheet manufacturing method using the mold manufactured by the manufacturing method according to claim 1, wherein the optical sheet manufacturing method includes a transfer step of bringing the sheet into contact with the mold. a surface on which the shape of the surface is transferred onto the sheet to form an optical sheet material. 一種電子顯示裝置,其包含藉由如申請專利範圍第3項所述之製造方法而製造的光學片。 An electronic display device comprising an optical sheet manufactured by the manufacturing method according to claim 3 of the patent application. 一種鏡面加工方法,其為鋁母材的鏡面加工方法,上述鋁母材被用作於表面上形成有微細凹凸結構、且用以將上述微細凹凸結構轉印至片材上而製造光學片材的光學片製造用模具的母材,且上述鏡面加工方法的特徵在於,包括:切削步驟,以既定的進給間距切削上述鋁母材的表面;並且於上述切削步驟中,於將上述切削車刀的上述進給間距設定為F、上述切削車刀的頂端的曲率半徑設定為R時,以下述式(1)所表示的Ry的值成為1.5 nm以上且100 nm以下的方式進行上述鋁母材的切削,Ry=F2/8R (1)。 A mirror surface processing method which is a mirror surface processing method of an aluminum base material, wherein the aluminum base material is used to form a fine uneven structure on a surface thereof, and is used for transferring the fine uneven structure to a sheet to manufacture an optical sheet. The base material of the optical sheet manufacturing mold, wherein the mirror surface processing method includes: a cutting step of cutting a surface of the aluminum base material at a predetermined feed pitch; and in the cutting step, the cutting wheel is used When the above-described feed pitch of the knives is set to F and the radius of curvature of the tip end of the cutting tool is set to R, the aluminum mother is performed so that the value of Ry represented by the following formula (1) is 1.5 nm or more and 100 nm or less. Cutting of the material, Ry = F 2 / 8R (1).
TW101137562A 2011-10-14 2012-10-12 Manufacturing method of optical sheet, manufacturing method of mold for manufacturing optical sheet, electronic display device and method of mirror finishing TW201318805A (en)

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