TW201302437A - In-line apparatus for extrusion molding and pattern forming - Google Patents

In-line apparatus for extrusion molding and pattern forming Download PDF

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Publication number
TW201302437A
TW201302437A TW101101555A TW101101555A TW201302437A TW 201302437 A TW201302437 A TW 201302437A TW 101101555 A TW101101555 A TW 101101555A TW 101101555 A TW101101555 A TW 101101555A TW 201302437 A TW201302437 A TW 201302437A
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Taiwan
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light guiding
guiding substrate
pattern
heating
unit
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TW101101555A
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Chinese (zh)
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TWI531462B (en
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Hoon-Hee Jung
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Raygen Co Ltd
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/0001Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
    • G02B6/0011Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
    • G02B6/0065Manufacturing aspects; Material aspects
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/0001Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
    • G02B6/0011Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
    • G02B6/0033Means for improving the coupling-out of light from the light guide
    • G02B6/0035Means for improving the coupling-out of light from the light guide provided on the surface of the light guide or in the bulk of it
    • G02B6/0038Linear indentations or grooves, e.g. arc-shaped grooves or meandering grooves, extending over the full length or width of the light guide
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133524Light-guides, e.g. fibre-optic bundles, louvered or jalousie light-guides

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Extrusion Moulding Of Plastics Or The Like (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Planar Illumination Modules (AREA)

Abstract

Disclosed herein is an in-line apparatus for extrusion molding and pattern forming. The in-line apparatus for extrusion molding and pattern forming may form a pattern on a base light guide plate made of a resin material and subjected to primary cooling through an extruder (including a T-die and a polishing roll (calendar roll)), and may cut the light guide plate to a predetermined size after patterning, so that the light guide plate can be manufactured through extrusion molding, pattern transfer, and cutting in a single in-line system, thereby reducing process time of the light guide plate.

Description

用於押出成型及圖案形成之同軸射出式裝置Coaxial injection device for extrusion molding and patterning

本發明係有關於一種用於押出成型及圖案形成之同軸射出式(In-line)裝置,特別是有關於一種可在以樹脂材料製成的導光基板上形成圖案且經由押出機執行主冷卻,以及在圖案轉移後可切割導光板至一預設尺寸之同軸射出式裝置,如此導光板能在單一同軸射出式系統中,經由押出成型、圖案轉移及切割來製造,藉此降低導光板的製程時間。
The present invention relates to a coaxial in-line device for extrusion molding and patterning, and more particularly to a pattern that can be formed on a light guiding substrate made of a resin material and performs main cooling via an extruder. And a coaxial injection device capable of cutting the light guide plate to a predetermined size after the pattern transfer, such that the light guide plate can be manufactured by extrusion molding, pattern transfer and cutting in a single coaxial injection system, thereby reducing the light guide plate Process time.

一般而言,例如導光板、光學膜等之光學薄片係廣泛地被使用,以允許例如背光單元之光源能有效率地發射光線。In general, optical sheets such as light guides, optical films, and the like are widely used to allow a light source such as a backlight unit to efficiently emit light.

舉例而言,導光板是液晶顯示器(Liquid Crystal Display,LCD)的基本元件,以確保背光單元有均勻的照度及亮度,並且在收集一個方向的光線時,在沒有光學損耗的情況下,使由側光源發射到前側的光線能夠均勻的散佈。因此,導光板是以微米級的光學圖案所形成的。For example, the light guide plate is a basic component of a liquid crystal display (LCD) to ensure uniform illumination and brightness of the backlight unit, and when collecting light in one direction, without optical loss, The light emitted from the side light source to the front side can be evenly dispersed. Therefore, the light guide plate is formed by an optical pattern of a micron order.

這樣的導光板通常是經由押出成型或射出成型所製成的。Such a light guide plate is usually produced by extrusion molding or injection molding.

在傳統的押出成形製程中,樹脂材料被押出機押出以製造具有某個區域的導光基板,其依序被切割為預設尺寸,接下來研磨切面以形成鏡面,並將光學樹脂圖案印製在光發射面上。或者,此圖案可藉由不同的模具,以射出成型的方式形成在其上。In a conventional extrusion forming process, a resin material is extruded by an extruder to manufacture a light guiding substrate having a certain area, which is sequentially cut into a predetermined size, and then the cut surface is polished to form a mirror surface, and the optical resin pattern is printed. On the light emitting surface. Alternatively, the pattern may be formed thereon by injection molding by means of different molds.

然而,由於傳統的押出成形製程必須經由押出機製造導光板之後,經由個別的圖案形成裝置來形成圖案,因此具有增加額外的製作程序及製程時間的問題。However, since the conventional extrusion forming process has to fabricate the light guide plate via the extruder, the pattern is formed via the individual pattern forming means, thus having the problem of adding additional fabrication procedures and process time.

再者,在傳統的押出成形製程中,圖案是形成在硬化的導光基板上,因此將微細圖案轉移到導光基板上會更加困難,並導致圖案轉移率的降低且限制了設計上的自由度。
Moreover, in the conventional extrusion forming process, the pattern is formed on the hardened light guiding substrate, so it is more difficult to transfer the fine pattern onto the light guiding substrate, and the pattern transfer rate is lowered and the design freedom is limited. degree.

本發明設想解決上述的問題,並提供一種用於押出成型及圖案形成之同軸射出式裝置,其可在以樹脂材料製成且經由押出機(包含T型模具及拋光輥(壓光輥))執行主冷卻的導光基板上形成圖案,且在圖案轉移後可切割導光基板至預設尺寸,如此導光板可以在單一同軸射出式系統中,經由押出成型、圖案轉移及切割來製造,藉此降低導光板的製程時間。The present invention contemplates solving the above problems, and provides a coaxial injection type device for extrusion molding and patterning, which can be made of a resin material and passed through an extruder (including a T-die and a polishing roller (calender roller)) Forming a pattern on the light-guide substrate that performs main cooling, and cutting the light-guiding substrate to a preset size after the pattern transfer, such that the light guide plate can be manufactured by extrusion molding, pattern transfer, and cutting in a single coaxial injection system. This reduces the process time of the light guide plate.

根據本發明的觀點,用於押出成型及圖案形成之同軸射出式裝置包含:一押出機,其押出樹脂材料以製造導光基板;一預熱單元,其加熱導光基板;一圖案化單元,其轉移一圖案至經加熱的導光基板;一冷卻單元,其冷卻具有該圖案於其上的導光基板;以及一切割單元,其切割從冷卻單元移出的導光板至一預設尺寸。According to the viewpoint of the present invention, a coaxial injection type apparatus for extrusion molding and patterning includes: an extruder that ejects a resin material to manufacture a light guiding substrate; a preheating unit that heats the light guiding substrate; and a patterning unit, It transfers a pattern to the heated light guiding substrate; a cooling unit that cools the light guiding substrate having the pattern thereon; and a cutting unit that cuts the light guiding plate removed from the cooling unit to a predetermined size.

預設單元可包含複數個加熱塊及可個別控制每一加熱塊的加熱控制器。The preset unit may include a plurality of heating blocks and a heating controller that can individually control each of the heating blocks.

複數個加熱塊可橫向地(TD direction)交替設置。由於加熱塊被交替地設置,增加了加熱區域並移除非加熱區域,因此可使導光板被均勻的預熱。A plurality of heating blocks may be alternately arranged in the TD direction. Since the heating blocks are alternately disposed, the heating area is increased and the non-heating area is removed, so that the light guide plate can be uniformly preheated.

為了藉由增加每一區域的加熱塊數量來改善加熱的均勻度,複數個加熱塊可設置於多個階段(stage)上。In order to improve the uniformity of heating by increasing the number of heating blocks per zone, a plurality of heating blocks can be placed on a plurality of stages.

加熱塊控制器可控制加熱塊加熱導光板至一範圍為150~230℃的預設溫度。The heating block controller controls the heating block to heat the light guide plate to a preset temperature ranging from 150 to 230 °C.

圖案化單元可包含相互分離的上滾筒及下滾筒,上滾筒及下滾筒中的至少之一包含一直接形成在滾筒表面上的圖案或具有一待轉移至導光基板的圖案之壓印器。圖案化單元可分別在其右側及左側對導光基板加壓高達20噸的負載,並加熱導光板至一範圍為100~200℃的預設溫度。The patterning unit may include upper and lower rollers that are separated from each other, and at least one of the upper and lower rollers includes a pattern formed directly on the surface of the roller or an imprinter having a pattern to be transferred to the light guiding substrate. The patterning unit can pressurize the light guiding substrate up to 20 tons on the right side and the left side, respectively, and heat the light guide plate to a preset temperature ranging from 100 to 200 °C.

冷卻單元可包含位於上下兩側且相互分離的複數個冷卻器,係分別冷卻導光板的上側及下側。The cooling unit may include a plurality of coolers located on the upper and lower sides and separated from each other, and respectively cooling the upper side and the lower side of the light guide plate.

此外,複數個冷卻器可橫向地交替設置於多個階段上,以調整押出成型製成的導光板的彎曲度,並經由個別的控制排風速率以改善圖案轉移率。Further, a plurality of coolers may be alternately disposed laterally alternately on a plurality of stages to adjust the curvature of the light guide plate formed by extrusion molding, and to improve the pattern transfer rate by individually controlling the exhaust rate.

這裡,每一個冷卻器可使用自動阻尼系統來部份地調整排風速率,且可使用自氮氣冷卻裝置產生的冷空氣或室溫的空氣來冷卻導光板。冷卻單元可包含過濾器以在排風時移除空氣中的污染物。Here, each of the coolers may use an automatic damping system to partially adjust the exhaust rate, and the cold light or room temperature air generated from the nitrogen cooling device may be used to cool the light guide plate. The cooling unit may include a filter to remove contaminants in the air when exhausting.

如此,根據實施例的用於押出成型及圖案形成之同軸射出式裝置可經由同軸射出製程,來執行導光基板的押出成形、圖案轉移及切割,藉此在大幅減少製程時間的情況之下,改善製程效率。As such, the coaxial ejection device for the extrusion molding and patterning according to the embodiment can perform the extrusion forming, the pattern transfer, and the cutting of the light guiding substrate via the coaxial injection process, thereby greatly reducing the processing time. Improve process efficiency.

另外,在這個裝置中,圖案被轉移到導光基板,其經由押出機(包含T型模具及拋光輥(壓光輥))執行主冷卻,並藉由預熱單元來預熱,藉此改善轉移率、生產率及產品可靠性。再者,根據實施例的系統允許在不切割導光基板的情況之下,連續轉移圖案到導光基板,藉此大幅地改善光學圖案設計的彈性。Further, in this apparatus, the pattern is transferred to the light guiding substrate, which performs main cooling via an extruder (including a T-die and a polishing roll (calender roll), and is preheated by the preheating unit, thereby improving Transfer rate, productivity and product reliability. Furthermore, the system according to the embodiment allows the pattern to be continuously transferred to the light guiding substrate without cutting the light guiding substrate, thereby greatly improving the elasticity of the optical pattern design.

再者,此裝置允許圖案連續轉移,藉此可以使大型導光板的製造更為方便。
Moreover, the device allows continuous pattern transfer, thereby making the manufacture of large light guides more convenient.

現在將參照相關圖式來詳細說明本發明之例示性實施例。Exemplary embodiments of the present invention will now be described in detail with reference to the accompanying drawings.

第1圖係為本發明之一例示性實施例之用於押出成型之同軸射出式(In-line)系統之方塊圖。BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a block diagram of an in-line system for extrusion molding in accordance with an exemplary embodiment of the present invention.

請參閱第1圖,根據此實施例之用於押出成型及圖案形成之同軸射出式裝置可包含一押出機10(包含T型模具及拋光輥),其押出樹脂材料以製造導光基板;一預熱單元20,其加熱從押出機10移出且受到主冷卻的導光基板;一圖案化單元30,其轉移圖案到經加熱的導光基板的表面;一冷卻單元40,其冷卻具有圖案於其上的導光基板;以及一切割單元50,其切割從冷卻單元40移出的導光板至預設尺寸。Referring to FIG. 1 , a coaxial injection device for extrusion molding and patterning according to this embodiment may include an extruder 10 (including a T-die and a polishing roller) that ejects a resin material to manufacture a light guiding substrate; a preheating unit 20 that heats the light guiding substrate that is removed from the extruder 10 and is subjected to main cooling; a patterning unit 30 that transfers a pattern to the surface of the heated light guiding substrate; and a cooling unit 40 that is cooled to have a pattern a light guiding substrate thereon; and a cutting unit 50 that cuts the light guide plate removed from the cooling unit 40 to a predetermined size.

根據此實施例的系統可包含,例如一引導滾筒,以從押出機10傳送導光基板至切割單元50。The system according to this embodiment may include, for example, a guide roller to convey the light guide substrate from the extruder 10 to the cutting unit 50.

押出機10為用來押出流體樹脂材料以形成導光基板的裝置。這裡,樹脂材料的例子包含聚甲基丙烯酸甲酯(polymethyl methacrylate,PMMA)、聚碳酸酯(polycarbonate,PC)、聚苯乙烯(polystyrene,PS)、甲基丙烯酸甲酯苯乙烯(methyl methacrylate-styrene,MS)等。The extruder 10 is a device for ejecting a fluid resin material to form a light guiding substrate. Here, examples of the resin material include polymethyl methacrylate (PMMA), polycarbonate (PC), polystyrene (PS), and methyl methacrylate-styrene. , MS) and so on.

由於押出機10一般常用於經由押出成形來製造導光板,因此其細部的元件及操作在此處將略過不提。Since the extruding machine 10 is generally used to manufacture a light guide plate by extrusion molding, the details of its components and operations will not be mentioned here.

雖然此實施例是以導光板做為說明,但應了解到的是,本發明不但可應用於導光板上,也可以應用於任何產品,例如可被當作光學元件來使用的光學薄片、光學膜等。在這裡,名詞”圖案”泛指任何微細的結構,包含波紋、點、稜鏡(Prisms)或微透鏡(Micro Lenses)等,其可以在薄片的表面形成多種形狀。Although this embodiment is described with a light guide plate, it should be understood that the present invention can be applied not only to a light guide plate but also to any product such as an optical sheet, optical which can be used as an optical element. Membrane and the like. Here, the term "pattern" refers to any fine structure including corrugations, dots, Prisms or Micro Lenses, etc., which can form various shapes on the surface of the sheet.

第2a~2c圖顯示了第1圖的裝置的預熱單元,其中2a圖為預熱單元的平視圖,而第2b及2c圖則是此預熱單元的側視圖。Figures 2a-2c show the preheating unit of the apparatus of Fig. 1, wherein Fig. 2a is a plan view of the preheating unit, and Figs. 2b and 2c are side views of the preheating unit.

請參閱第2a~2c圖,預熱單元20在圖案轉移之前預熱被押出的導光基板以增加圖案轉移率。Referring to Figures 2a-2c, the preheating unit 20 preheats the extruded light guide substrate prior to pattern transfer to increase the pattern transfer rate.

尤其,在經由圖案化單元30轉換圖案到導光基板上的期間,導光基板會受到加熱輥突然的擠壓,導光基板的表面溫度則會突然的上升,導致導光基板由硬化的狀態變為軟化的狀態,如此則導光基板便很容易遭受到彎曲、波浪化或其它擴張的形變。預熱單元20用於補償導光基板如此的形變。In particular, during the transition of the pattern onto the light guiding substrate via the patterning unit 30, the light guiding substrate is suddenly pressed by the heating roller, and the surface temperature of the light guiding substrate suddenly rises, resulting in the hardened state of the light guiding substrate. It becomes a softened state, and thus the light guiding substrate is easily subjected to deformation by bending, wavering or other expansion. The preheating unit 20 is for compensating for such deformation of the light guiding substrate.

此外,當硬化的導光基板受到圖案轉移時,圖案轉移率會因導光基板的厚度改變或彎曲而受到不利的影響。因此,預熱單元20也用於使導光基板變得具有高度的彈性,以改善圖案轉移率。Further, when the hardened light guiding substrate is subjected to pattern transfer, the pattern transfer rate is adversely affected by the change or bending of the thickness of the light guiding substrate. Therefore, the preheating unit 20 is also used to make the light guiding substrate highly elastic to improve the pattern transfer rate.

預熱單元20可包含複數個加熱塊210及個別控制該些加熱塊210的加熱控制器。The preheating unit 20 can include a plurality of heating blocks 210 and a heating controller that individually controls the heating blocks 210.

預熱單元20可包含複數個加熱塊210以均勻地加熱導光基板,其中,該些加熱塊210係橫向地(垂直於導光板的移動方向)交替排列,如第2a~2c圖所示。The preheating unit 20 may include a plurality of heating blocks 210 for uniformly heating the light guiding substrate, wherein the heating blocks 210 are alternately arranged laterally (perpendicular to the moving direction of the light guiding plate) as shown in FIGS. 2a-2c.

複數個加熱塊210可使用陶瓷加熱器或由線圈發射紅外光的紅外線(IR)加熱器以直接加熱的形式來實行。The plurality of heating blocks 210 can be implemented in the form of direct heating using a ceramic heater or an infrared (IR) heater that emits infrared light from the coil.

在第2a~2c圖中,所繪示的裝置包含以機器方向(MD direction)設置的15列的加熱塊210,其中每列具有6個橫向(TD direction)設置的加熱塊210。然而,這裡應了解到的是,加熱塊210的數量及排列方式可以依需求而改變。In Figures 2a-2c, the illustrated device comprises 15 columns of heating blocks 210 arranged in the MD direction, with each column having 6 heating blocks 210 in a TD direction setting. However, it should be understood here that the number and arrangement of the heating blocks 210 can be varied as desired.

當複數個加熱塊210均勻地等間隔設置時,加熱塊210之間則形成了非加熱區域。因此,為了達到均勻加熱導光基板的目的,該些加熱塊210較佳的為橫向地交替設置。When a plurality of heating blocks 210 are evenly spaced at equal intervals, a non-heating region is formed between the heating blocks 210. Therefore, in order to achieve uniform heating of the light guiding substrate, the heating blocks 210 are preferably alternately disposed laterally.

另外,如第2a~2c圖所示,預熱單元20是由多階段的預熱區域所構成,以增加每一區域的加熱塊210的數量,藉此使導光基板的所有區域能夠更均勻的加熱。In addition, as shown in FIGS. 2a-2c, the preheating unit 20 is constituted by a multi-stage preheating zone to increase the number of the heating blocks 210 in each zone, thereby making all areas of the light guiding substrate more uniform. Heating.

再者,由於以塑膠材料所製成的導光基板被加熱到230℃或更高的溫度時可能溶化,因此預熱單元20的加熱溫度被設定為低於230℃,而較佳的是在100至230℃(最佳的為150至230℃)。Furthermore, since the light guide substrate made of a plastic material may be melted when heated to a temperature of 230 ° C or higher, the heating temperature of the preheating unit 20 is set to be lower than 230 ° C, and preferably 100 to 230 ° C (optimally 150 to 230 ° C).

圖案化單元30是用於轉移圖案到導光基板表面的裝置。圖案化單元30在其上側及下側分別設置有上滾筒及下滾筒,當導光基板通過上下滾筒之間時,加熱並加壓導光基板以轉移圖案到其表面。The patterning unit 30 is a device for transferring a pattern to the surface of the light guiding substrate. The patterning unit 30 is provided with an upper roller and a lower roller on its upper side and lower side, respectively, and when the light guiding substrate passes between the upper and lower rollers, heats and presses the light guiding substrate to transfer the pattern to the surface thereof.

上滾筒及下滾筒中的至少之一可包含一形成在滾筒表面上的圖案或具有圖案之壓印器。At least one of the upper roller and the lower roller may include a pattern formed on the surface of the roller or a stamp having a pattern.

此外,每一滾筒可藉由在滾筒中循環的的加熱流體來加熱,並可連結至一維持壓力恆定的裝置,如此滾筒即可用固定的壓力來加壓導光基板。Further, each of the rollers can be heated by a heating fluid circulating in the drum, and can be coupled to a device that maintains a constant pressure so that the rollers can pressurize the light guiding substrate with a fixed pressure.

圖案化單元30可分別在其右側及左側對導光基板加壓高達20噸的負載,並可加熱導光基板至範圍為100~200℃的預設溫度。The patterning unit 30 can pressurize the light guiding substrate up to 20 tons on its right and left sides, respectively, and can heat the light guiding substrate to a preset temperature ranging from 100 to 200 °C.

第3a~3c圖為根據本發明之一例示性實施例之裝置之一冷卻單元之示意圖。其中,第3a圖為此冷卻單元的平視圖,而第3b及3c圖則是此冷卻單元的側視圖。3a-3c are schematic views of a cooling unit of a device in accordance with an exemplary embodiment of the present invention. Here, Fig. 3a is a plan view of the cooling unit, and Figs. 3b and 3c are side views of the cooling unit.

冷卻單元40用於經由具有圖案於其上的導光板的橫向(TD direction)及上下表面的冷卻率的調整,來改善圖案轉移率,並調整導光板的彎曲度。The cooling unit 40 is for improving the pattern transfer rate and adjusting the curvature of the light guide plate by adjusting the lateral direction (TD direction) of the light guide plate patterned thereon and the cooling rate of the upper and lower surfaces.

當導光板在圖案轉移的過程後,未經切割而暴露於室溫下時,導光板很容易遭受到形變,例如當軟化的導光板硬化時,產生橫向地收縮或逆向彎曲。When the light guide plate is exposed to room temperature without being cut after the process of pattern transfer, the light guide plate is easily subjected to deformation, for example, when the softened light guide plate is hardened, lateral contraction or reverse bending is caused.

因此,當經加熱的導光板在圖案被轉移至導光板之後,通過某個冷卻區域時,可排風於導光板上以調整導光板上下左右側的壓力,藉此提供具有所欲達到的彎曲度形狀的導光板。Therefore, when the heated light guide plate passes through a certain cooling area after the pattern is transferred to the light guide plate, the light can be exhausted on the light guide plate to adjust the pressure of the lower left and right sides of the light guide plate, thereby providing the desired bending. The shape of the light guide plate.

冷卻單元40可由複數個位於上下兩側且相互分離的冷卻器所構成,係分別冷卻該導光基板的上側及下側。再者,該些位於上下兩側的冷卻器可橫向地(TD direction)交替設置於多個階段上,如第3a圖所示,且可配置以藉由自動阻尼系統部份地調整排風速率。The cooling unit 40 may be composed of a plurality of coolers located on the upper and lower sides and separated from each other, and respectively cools the upper side and the lower side of the light guiding substrate. Furthermore, the coolers located on the upper and lower sides may be alternately disposed in a plurality of stages in a TD direction, as shown in FIG. 3a, and may be configured to partially adjust the exhaust rate by an automatic damping system. .

冷卻單元40當冷卻導光板時可使用自氮氣冷卻裝置產生的冷空氣或室溫的冷空氣。The cooling unit 40 may use cold air generated from a nitrogen gas cooling device or cold air at room temperature when cooling the light guide plate.

這裡,當冷卻單元40排出受到污染的空氣時,導光板的表面可能因此被污染。因此,冷卻單元40更可包含過濾器430在排風時移除空氣中的污染物。Here, when the cooling unit 40 discharges the contaminated air, the surface of the light guide plate may be contaminated accordingly. Therefore, the cooling unit 40 may further include the filter 430 to remove contaminants in the air when exhausting.

雖然冷空氣排風機(cooling air blower)410經由連結管排出相同空氣的量到每一冷卻塊420,但每一冷卻塊420仍可包含排風控制器(未繪於圖中),其以調整朝向導光板排風的開口的噴嘴的大小,來控制排風速率。Although the cooling air blower 410 discharges the same amount of air to each of the cooling blocks 420 via the connecting pipe, each cooling block 420 may still include an exhaust controller (not shown) for adjustment The size of the nozzle toward the opening of the light guide plate is controlled to control the exhaust rate.

因此,此裝置的操作者可以考量導光板圖案轉移的部位產生局部的彎曲或形變,以局部地調整每一冷卻塊420的排風速率。Therefore, the operator of the apparatus can locally bend or deform the portion where the light guide plate pattern is transferred to locally adjust the exhaust rate of each of the cooling blocks 420.

再者,複數個冷卻塊420可分開地設置於上下階段上,如第3a~3c圖所示,導光板的冷卻度可根據複數個橫向分隔於每一上下階段的冷卻區域,藉由控制該些冷卻塊420的排風速率來調整。Furthermore, a plurality of cooling blocks 420 can be separately disposed on the upper and lower stages. As shown in FIGS. 3a-3c, the cooling degree of the light guide plate can be separated from the cooling areas of each of the upper and lower stages according to a plurality of lateral directions, by controlling the The exhaust rates of the cooling blocks 420 are adjusted.

也就是說,冷卻單元40可考量導光板圖案轉移的部位產生局部的彎曲或形變的情況,被操作來執行導光板上側或下側的局部冷卻,如此冷空氣只會被排放到導光板遭受到局部彎曲或形變的部位。That is to say, the cooling unit 40 can be operated to perform local cooling on the side or the lower side of the light guide plate in consideration of local bending or deformation of the portion where the light guide plate pattern is transferred, so that the cold air is only discharged to the light guide plate. Partially bent or deformed parts.

在通過冷卻單元40後,導光板可經由切割單元50切割到所欲達到的尺寸,藉此提供具有轉移圖案於其上的導光板。After passing through the cooling unit 40, the light guide plate can be cut to the desired size via the cutting unit 50, thereby providing a light guide plate having the transfer pattern thereon.

如此,根據實施例的裝置允許經由同軸射出製程來執行押出成形及圖案轉移,藉此大幅地減少製程時間。特別的是,此裝置允許圖案連續轉移,藉此可以使大型導光板的製造更為方便。As such, the apparatus according to the embodiment allows the extrusion forming and pattern transfer to be performed via the coaxial injection process, thereby greatly reducing the process time. In particular, the device allows continuous pattern transfer, thereby making the manufacture of large light guides more convenient.

以上所述僅為舉例性,而非為限制性者。任何未脫離本發明之精神與範疇,而對其進行之等效修改或變更,均應包含於後附之申請專利範圍中。
The above is intended to be illustrative only and not limiting. Any equivalent modifications or alterations to the spirit and scope of the invention are intended to be included in the scope of the appended claims.

10...押出機10. . . Extruder

20...預熱單元20. . . Preheating unit

210...加熱塊210. . . Heating block

30...圖案化單元30. . . Patterned unit

40...冷卻單元40. . . Cooling unit

410...冷空氣排風機410. . . Cold air exhaust fan

420...冷卻塊420. . . Cooling block

430...過濾器430. . . filter

50...切割單元50. . . Cutting unit

第1圖 係為本發明之一例示性實施例之用於押出成型之同軸射出式裝置之一例示性實施例之方塊圖;
第2a~2c圖 係為第1圖之裝置之一預熱單元之示意圖;以及
第3a~3c圖 係為第1圖之裝置之一冷卻單元之示意圖。
1 is a block diagram of an exemplary embodiment of a coaxial injection-type device for extrusion molding according to an exemplary embodiment of the present invention;
2a~2c are schematic views of a preheating unit of one of the devices of Fig. 1; and Figs. 3a-3c are schematic views of a cooling unit of the device of Fig. 1.

10...押出機10. . . Extruder

20...預熱單元20. . . Preheating unit

30...圖案化單元30. . . Patterned unit

40...冷卻單元40. . . Cooling unit

50...切割單元50. . . Cutting unit

Claims (10)

一種用於押出成型及圖案形成之同軸射出式(In-line)裝置,係包含:
一押出機,係押出一樹脂材料以製造一導光基板;
一預熱單元,係加熱該導光基板並包含複數個加熱塊及一個別控制該些加熱塊之加熱塊控制器;
一圖案化單元,係轉移一圖案至加熱後之該導光基板;
一冷卻單元,係冷卻具有該圖案於其上之該導光基板;以及
一切割單元,係切割從該冷卻單元移出的該導光基板至一預設尺寸。
A coaxial in-line device for extrusion molding and patterning, comprising:
a squeezing machine, which is extruded with a resin material to manufacture a light guiding substrate;
a preheating unit for heating the light guiding substrate and comprising a plurality of heating blocks and a heating block controller for controlling the heating blocks;
a patterning unit for transferring a pattern to the heated light guiding substrate;
a cooling unit that cools the light guiding substrate having the pattern thereon; and a cutting unit that cuts the light guiding substrate removed from the cooling unit to a predetermined size.
如申請專利範圍第1項所述之同軸射出式裝置,其中該複數個加熱塊係橫向地交錯排列。The coaxial injection device of claim 1, wherein the plurality of heating blocks are staggered in a lateral direction. 如申請專利範圍第1項所述之同軸射出式裝置,其中該複數個加熱塊係設置在多個階段上,藉由增加每一區域的該些加熱塊的數量來改善加熱的均勻度。The coaxial injection device of claim 1, wherein the plurality of heating blocks are disposed on a plurality of stages to improve heating uniformity by increasing the number of the heating blocks in each area. 如申請專利範圍第1項所述之同軸射出式裝置,其中該加熱塊控制器控制該些加熱塊加熱該導光基板至一範圍為150~230℃的預設溫度。The coaxial injection device of claim 1, wherein the heating block controller controls the heating blocks to heat the light guiding substrate to a preset temperature ranging from 150 to 230 °C. 如申請專利範圍第1項所述之同軸射出式裝置,其中該圖案化單元包含相互分離的一上滾筒及一下滾筒,該上滾筒及該下滾筒中的至少之一包含一直接形成在滾筒表面上的圖案或具有一待轉移至該導光基板的圖案之壓印器。The coaxial injection device of claim 1, wherein the patterning unit comprises an upper roller and a lower roller separated from each other, and at least one of the upper roller and the lower roller comprises a surface directly formed on the roller. The upper pattern or the stamp having a pattern to be transferred to the light guiding substrate. 如申請專利範圍第5項所述之同軸射出式裝置,其中該圖案化單元分別在其右側及左側對該導光基板加壓高達20噸的負載,並加熱該導光基板至一範圍為100~200℃的預設溫度。The coaxial injection device of claim 5, wherein the patterning unit presses the light guiding substrate with a load of up to 20 tons on the right side and the left side thereof, and heats the light guiding substrate to a range of 100. Preset temperature of ~200 °C. 如申請專利範圍第1項所述之同軸射出式裝置,其中該冷卻單元包含位於上下兩側且相互分離的複數個冷卻器,係分別冷卻該導光基板的上側及下側。The coaxial injection type device according to claim 1, wherein the cooling unit comprises a plurality of coolers located on the upper and lower sides and separated from each other, and respectively cooling the upper side and the lower side of the light guiding substrate. 如申請專利範圍第7項所述之同軸射出式裝置,其中當冷卻該導光基板時,該些冷卻器使用產生於一氮氣冷卻裝置的冷空氣或室溫的空氣。The coaxial injection type device of claim 7, wherein when cooling the light guide substrate, the coolers use cold air or room temperature air generated from a nitrogen gas cooling device. 如申請專利範圍第7項所述之同軸射出式裝置,其中該些冷卻器橫向地交替設置於多個階段上,並使用一自動阻尼系統部份地調整一排風速率。The coaxial injection device of claim 7, wherein the coolers are alternately disposed laterally on the plurality of stages, and an automatic damping system is used to partially adjust an exhaust rate. 如申請專利範圍第7項所述之同軸射出式裝置,其中該冷卻單元更包含一過濾器以在排風時移除空氣中的污染物。
The coaxial injection device of claim 7, wherein the cooling unit further comprises a filter to remove contaminants in the air during exhaust.
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