TW201245878A - Photosensitive resin composition, color filter, protective film, photo spacer, substrate for liquid crystal display, liquid crystal display, and solid-state image sensing device - Google Patents

Abstract

A photosensitive resin composition having excellent polymerization hardenability under exposure and high exposure sensitivity is provided. Even when a time of a heat treatment is short, the photosensitive resin composition is capable of forming a coloring pattern with excellent profile characteristic, a photo spacer with excellent uniformity of cross sectional shape and uniformity of height, and a protective film with excellent uniformity or hardness. The photosensitive resin composition includes an alkali soluble resin (A), a polymerizable compound (B), and a photoinitiator (C), wherein each has at least a group having an acidic group and polymerizable unsaturated groups different from each other on a branched chain.

Description

201245878 U 1 厶JJ_if VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to a photosensitive resin composition. Further, there is a color filter, a protective film, a photo spacer, and a substrate for a liquid crystal display device using the photosensitive resin composition. Further, there is a liquid crystal display device and a solid-state imaging device using the color filter or the like. [Prior Art] A liquid crystal display device is widely used in display devices for displaying high-quality images. The display device substrate (for example, a color filter substrate, an active matrix substrate, or the like) has a structure in which a structure such as a colored pattern or a protective film is axially mounted on the substrate. As a method of forming a color in these structures, or a method of forming a protective film or a photo-spacer, a photo-lithography method using a sensible composition has become mainstream. Regarding the photosensitive tree residue, 'has been studied since the previous use, and the use of the unsaturation and the like and the filaments of the s-unsaturated & Reference is made to the patent document υ. Moreover, it is disclosed that ^^ is hard ==曰, which comprises an aliphatic cyclic furnace group having the following molecular structure, and is linked with an aliphatic ruthenium star having a specific structure and having an acidity. The structural unit of the functional group, the molecular structure of the early structural unit (for example, one of the specific polymerizable groups is used as a coloring liquid used in a liquid crystal display device, and a pigment dispersion method is widely used. The method of producing a color filter by photolithography is dispersed in the photosensitive resin composition. As for the method, since the pigment is contained, it is stable to light or heat, and Since the light micro-pattern is patterned, the positional accuracy can be sufficiently ensured, and the color filter used in the liquid crystal display device or the like can be used as a second method. The coloring agent used in the production is not only extensively studied for pigments but also pigment compounds other than pigments such as dyes. Among them, dyes are known to have a triaryl decane dye and an η ratio: anthracene A compound of various pigment precursors such as a dye, a azo dye, a η 嗤 azo dye, a dibenzo oxime dye, and a phthalocyanine dye (see, for example, Patent Document 3 to Patent Document 5). The use of a dye as a colorant is useful in that the color or brightness of the displayed image during image display can be improved due to the color purity of the dye itself or the vividness of its hue. It is also disclosed that if a specific brewing compound is used as a dye In addition, a color filter excellent in contrast and the like is obtained (for example, see Patent Document 6). On the other hand, a photosensitive resin composition using a colorant such as a dye and a resin binder having a specific structure of an unsaturated group is also known. The solvent property can be improved (for example, refer to Patent Document 7), etc.; the resin binder of a specific structure contributes to imparting light lithia or resistance to a large extent. [Improvement of the performance of the performance, etc., but not sufficient. [PRIOR ART DOCUMENT] [Patent Document 1] Japanese Patent Laid-Open Publication No. 2007-86565 No. 2007-201285878 HZO IZpif [Patent Document 2] Japanese Patent Laid-Open No. 2 [Patent Document 3] Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. Hei. Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. (such as light spacers and color patterns. The following is the same) or protection: In the case of 'there is only the exposure of the 骑 骑 合 ( (4) insufficient production and exist in the exposure and the amount of heat must be applied to the heat treatment (four) is #上上实实In order to correct the purpose for the course of the nature ^ 'The purpose of this is to provide - the polymerization of the hard one when exposed.", the so-called exposure sensitivity is high, the spectral characteristics are excellent, the liquid crystal specific resistance is excellent H Another object of the present invention is to provide, for example, a

A photosensitive resin composition which is excellent in the uniformity and the high uniformity of the optical spacer and the protective film of the uniformity. The second X is used in the present invention, and the object of the present invention is to provide a liquid crystal display device which can suppress the unevenness of the liquid crystal display device (IV) in the liquid crystal display I, and a liquid crystal display device which is not inhibited. 4 不 不 不 Based on this situation, the inventor of the present application conducted an active research, and the result was issued 7 201245878

The specific means for achieving the problem are as follows. (1) A photosensitive resin composition comprising: a group having an acidic group at least in a side chain; and two or more polymerizable unsaturated groups (A) and a polymerizable compound (8) Photopolymerization initiator (C). (2) The photosensitive resin composition according to the above, which further comprises a colorant. (3) The photosensitive resin composition according to (1) or (2), wherein the test solubility resin has a repeating unit represented by the following formula (A): Formula (A) [Chemical Formula 1]

(In the formula (A), R represents a hydrogen atom or a fluorenyl group, and Ri, R2, δ 201245878 wzpif R, R and R5 are each a hydrogen atom, a halogen atom, a cyano group, an alkyl group or an aryl group). (4) The photosensitive resin composition according to (1) or (2), wherein the alkali-soluble resin has a repeat represented by the following formula (B) and repeats represented by the following formula (B) Unit: 夂 General formula (A) [Chemical 2]

(于通, (A)' R represents a gas atom

R3, R4 and R5 represent a hydrogen atom, 4 R R aryl group, respectively, an atom, a minus, a burnt group or a formula (8) [Chemical 3]

201245878 (In the formula (B), R represents a hydrogen atom or a methyl group). (5) The photosensitive resin composition according to (1) or (2), wherein the alkali-soluble resin has a repeating unit represented by the following formula (A) and is represented by the following formula (B) a repeating unit and a repeating unit represented by the following formula (c): Formula (A) [Chemical 4]

R3, R aryl) (in the formula (A), 'r represents a hydrogen atom or a methyl group, and r1, r2, R4 and R5 respectively represent a hydrogen atom, a _ atom, a cyano group, a decyl group or a formula (B) [化5] 201245878

(In the general formula (B), r represents a hydrogen atom or a fluorenyl group) Formula (C) [Chemical 6]

RIC-C ο \ 0~X~Ac / (In the formula (C), R represents a hydrogen atom or a fluorenyl group, and x represents a divalent linking group, and Ac represents a (fluorenyl) acryloxy group). (6) The photosensitive resin composition as described in any one of (3) to (5) is represented by the repeating unit represented by the above formula (A) and the pass (B) In any of the repeating unit and the repeating unit represented by the above formula (C), R is a fluorenyl group. (7) The photosensitive resin composition according to any one of (3) to (6) wherein, in the repeating unit represented by the above formula (A), R is a methyl group 'R1 to R5. It is a hydrogen atom. (8) A color filter, a protective film, a light-receiving member, or a liquid crystal display. The substrate for a photosensitive device according to any one of 201245878 is formed using the resin composition of (1) to (7). (9) A method for producing a color filter, comprising: a colored layer of a coloring layer, and a silky color layer formed on a photosensitive tree ship as described in (2) to (7) And an exposure step of patterning the colored layer: a developing step to form a pattern. Developing the colored layer on which the latent image is formed (1 〇) A liquid crystal display device or a solid-state imaging device comprising: the color filter according to (8), as described in (9) A color filter, a light sheet, a protective film, or a light spacer manufactured by the method for producing a color filter, etc. (11) A resin comprising a repeating unit represented by the following formula (M), and the following formula ( 2·1) The repeating unit represented by the repeating unit represented by the following 诵(1)): a general formula (1-1) [Chemical 7]

12 201245878

General formula (3-1) [Chemical 9]

And small, X represents a divalent linking group (in the formula (3-1), the soil Ac represents (acryl) acryloxy). c ^挂护,甘山 (12), as described in (11), the eight or more of the repeating units constituting the resin are the heavy pain unit represented by the general formula (丨-1), Any of the repeating unit represented by the formula (2-1) and the repeating unit represented by the formula 0-1:. (13) The resin according to (n) or (12), wherein the resin comprises the repeating unit represented by the formula (M): 4〇m〇1% to 80 13 201245878 201245878 m〇]%, Prescripts General formula (2 5~3 0 in private, by, above) (4) 缲...単1 mol%~3〇moP/〇. ^Repetition unit represented by formula (3.1)! [Invention effect; | Light time Si:: Sex: a photosensitive resin composition which can be formed by exposure to a short heat treatment time, and which has high sensitivity and excellent uniformity and uniformity of optical spacers and uniformity. Moreover, the present invention can provide a display device capable of suppressing display unevenness when the liquid crystal display device is used, and can display the device when the device is used, and the display of the device plate and the display unevenness is suppressed. BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the photosensitive resin composition of the present invention will be described in detail, and the color filter, the protective film, the optical spacer, the substrate for display, and the liquid crystal display of the photosensitive resin composition of the present invention will be described. Detailed description. τ and 刀心平 In addition, in this application _ t, "~" to include its before and after Is used as the lower limit value and meaning of the upper limit value. In the present specification

In the case, the (mercapto) acrylic acid vinegar α is used in the meaning of the two sides of the acrylic acid & mercapto acrylate vinegar. X &lt;Photosensitive Resin Composition&gt; The photosensitive resin composition of the present invention is characterized by comprising: an alkali group having an acidic group and two or more different polymerizable unsaturated groups; 201245878 Z-pif resin (A), polymerizable compound (B), and photopolymerization initiator (c). The photosensitive resin composition of the present invention may be further formed by using a coloring agent, an organic solvent, and various additives as needed. In the following, the photosensitive resin composition of the present invention may be simply referred to as "the composition of the present invention" or "composition". In addition, the alkyl group is a general term for a burnt group having a substituent and a non-substituent alkyl group, and is a linear chain, a branched chain or a cyclic alkyl group, unless otherwise specified. <Alkali-soluble resin (A) &gt; The alkali-soluble resin used in the present invention is characterized by having a group having an acidic group and two or more polymerizable unsaturated groups which are different from each other. The photosensitive resin composition of the present invention preferably contains an alkali-soluble resin (A) in a proportion of 10% by mass to 5% by mass of the solvent-removing component, more preferably 15% by mass to 45% by mass. Contains an alkali-soluble resin (A). The acidic group may, for example, be a carboxyl group, a sulfonic acid group, a hydroxy acid group, a salicylic acid group or an acid urea group, and more preferably a carboxyl group. The acidic group may be only one type or two or more types. The acidic group is preferably embedded in the test resin as a repeating unit containing an acidic group. As the repeating unit containing an acidic group, it is preferable to contain a ratio of 3 mol% to 50 mol%, more preferably 10 mol% to 40 mol%, in a 7 small force V resin. More preferably, it contains a ratio of 15 mol% to 35 mol%. Two or more kinds of polymerizable unsaturated groups which are different from each other may be exemplified ((fluorenyl) 15 201245878 acryloxy group, vinyl group, cyclic unsaturated group, etc.), and preferably at least (fluorenyl) propylene oxide Base and vinyl. The polymerizable unsaturated group may be one or more types. Two or more kinds of polymerizable unsaturated groups which are different from each other are preferably incorporated into the alkali-soluble resin as a repeating unit containing a polymerizable unsaturated group. As the repeating unit containing a polymerizable unsaturated group, it is preferred that the total of the repeating units containing a polymerizable unsaturated group is 4 〇 m 〇 1% to 97 mol% of the alkali-soluble resin, and more preferably 5 〇 mol%. ~90 mol%. Further, when two or more kinds of polymerizable unsaturated groups different from each other are contained in a repeating unit containing at least a (meth) acryloxy group and a repeating unit containing ethylene, it is preferred to contain a fluorenyl group. The repeating unit of the acryloxy group is 1 mol% to 3 〇 mol%, and the repeating unit containing a vinyl group is 4 〇m 〇 1% to 80 mol%. The alkali-soluble resin used in the present invention preferably has a repeating unit represented by the following formula (A), and more preferably has a repeating unit represented by the following formula (a) and a formula More preferably, the repeating unit represented by the following formula (A), the repeating unit represented by the following formula (B), and the following formula (C); Repeat unit. General formula (A) [化 10] 16 201245878 ^fz^izpif

R4 R3 Ri occ=c R5 (In the formula (A), R represents a hydrogen atom or a fluorenyl group, and R1, R2, R3, R4 and R5 are in addition | J represents a hydrogen atom, a halogen atom, a cyano group, a burnt group or Aryl.) Formula (B) [Chemical 11]

R CH2-C- co2h (In the formula (B), R represents a hydrogen atom or a hydrazine group. (C) [Chemical 12] 17

201245878 HZJiZpiL

Base-table, Formula R(2A)RC5): R is preferably a fluorenyl group. The following may be mentioned. The elemental atom, the stilbene group, and the aryl group have a bond, and the group has a C, Br, and 1, and the like. The alkyl group may be a butyl group such as a straight group or a naphthyl group. The ternary aryl group may be exemplified by a phenyl group or a fur: a gas: R3, R4 and R5 are each preferably a nitrogen atom, and x in the butterfly branch Sic represents a divalent linking group, preferably a linear chain. The base group and the substituent selected from the group consisting of -α and <(3), which may be substituted for the above-mentioned alkyl group, and the carbon number of the mouth are preferably, for example, a mercapto group. Preferably, the AC in the stretching group is a methyl ene oxime oxy group. The fluorinated resin comprises: preferably 20% to 9% by weight, more preferably 40% to 80% by weight of 201245878. The repeating unit represented by the above formula (A) is preferably 10 mol% to 35 mol%, and the repeating unit represented by the above formula (B) is 15 to 30% by mass. Preferably, it is 1 mol% to 30 mol% of the repeating unit represented by the above formula (C). The repeating unit represented by the formula (A) is preferably the following formula (A-1) Repetitive unit represented by the formula (A-1) [Chemical 13]

- 2 Η

The repeating unit represented by the above formula (B) is preferably a repeating unit represented by the following formula (B-1). General formula (B-1) [Chem. 14]

19 201245878 is a repeating unit represented by the following formula rr n ", the repeating unit represented by the formula (c) is represented by the hair (C-1).

(Based in the formula (3-1)) a acryloxy group. X represents a divalent linking group, and Ac represents a substituted or unmodified silk of a linear, branched or cyclic X-touch, or comprises the wire and selected from _〇_, -C (=0)-- and a combination of at least one or more of the combinations of the above-mentioned groups. The substituents which the stretching group may have are, for example, audible. The carbon number of the wire is preferably from i to 15. Preferably, Ac in the -1) is a methacryloxy group. Further, the test polymer used in the present invention may contain other repeating single-core repeating units in addition to the gist of the present invention. It is better to test the solubility of the polymer 〇 _% ~ 30 mol. /., more preferably 〇 mol% ~ 20 mol? 'More good step is 〇 -% ~ 1 〇 % %. Other repeat I yuan Preferably, the repeat represented by the following formula (D) is 20 201245878 42 il ^ pif 〇 σ — monoterpene. Formula (D) [Chem. 16]

(In the formula (D), 'R represents a 4-atomic machine group.) Eight clothes are not R. Preferred is a fluorenyl group. a preferred m chain, /7 or a stretched base. (4) The base is preferably a carbon number of 2 (), preferably a warp group. The base-soluble resin used in the present invention is preferably substantially free of the repeating unit represented by the above formula (4) to formula (9); The term "substantially free" means an impurity or the like, and is usually i or less. In the present invention, (4) (4) m is determined; the molecular weight is preferably _1, more preferably 〜1X105, still more preferably 5000~xiq4, preferably at least the following

Formula I

C 21 201245878 TJ 7 IX C— II 2C Η -C- ό 0R4C-IR5

RvRa

(In the formula I, R represents a hydrogen atom or a methyl group, and R1, R2, R3, R and R5 are each a hydrogen atom, a halogen atom, a cyano group, an alkyl group or an aryl group.) Further, in the present invention, The alkali-soluble resin is preferably synthesized via the following formula II or formula, and more preferably synthesized via the formula. Formula II

[Chem. 18]

4 (In the formula II, R represents a hydrogen atom or a fluorenyl group, R1, R2,

R4 and R5 are each a hydrogen atom, a halogen atom, a cyano group, an alkyl group or an aryl group. Formula III 22 201245878 4Z312pif [Chem. 19]

(In the formula II, R represents a hydrogen atom or a fluorenyl group, and R1, R2, R3, R4 and R5 each independently represent a hydrogen atom, a halogen atom, a cyano group, an alkyl group or an aryl group, and R6 represents a carbon number of 2 to 8. An alkyl group.) R, R1, R2, R3, R4, 5 and ' in the above formula I to Formula III, respectively, and R, Ri, and R2 in the above formula (A) to formula (c), respectively R, R4, R5 and R6 are synonymous, and the preferred ranges are also synonymous. The monomer represented by the formula I can be synthesized by subjecting the following alcoholic oxime-alkenyl group or methacryl group having an oxime group to an esterification reaction. The silk compound can be exemplified by propylene glycol, 2-methylpropanol, crotyl alcohol, 3-indol-2-propanol, 3-phenylene-2-propan-1-ol, 3-indol-3-benzene. Propyl-like::,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, Alcohol, 2-ethyl-1 3-depleted-2-propen-1-ol, 2,3_di-pupid i, 3-propenyl-1-ol, 2,3 3-:benzoquinone ^Alcohol, U,3-triphenyl-2-methanol, 1,1,3-triphenyl-2-propene, 3_-benyl-2-propanol, 1-phenyl-2- Propylene small alcohol ^1,3,3·® phenyl-2-propene small % dipyridyl-2-propanyl r-alcohol, i• stupid 23 201245878. •t厶i 厶μϋ -2-mercapto _2-propylene small alcohol, 1-cyclohexylpropanol, 2_mercapto propylene-1-ol, 1-sulfo-2-propanol, i. cyano 1 propylene 丨 醇, 3 • cyclopentyl-2-propanol, 3-bromo-2-propenol, 2-methyl-cold winter propylene, 2-methyl-3-iso-2-propene-l- Alcohol, 2_chloro_3_styl 2·propylene small alcohol (2_ gas cinnamyl alcohol), 2-moly-3-phenyl-2-propene + alcohol (2_ desert cinnamon), 2_winter Phenyl-2-propan-1-ol (2-fluorocinnacol), 2-cyano _3_Stupid base_2_propen-1-ol (2-cyanocinnacol), 2-gas-2-propanol (2- acetophenone), 2-, odor-2, propylene- I-alcohol (2_mopropenol), 2|3,3_di 2 propylene propylene, 2-chloro-3,3-difluoro-2-propene+alcohol, 2•gas_3_gas_ 2_acrylic alcohol, 2,3-dibromo-2-propanol and 2_gas_3-methyl-2-propene alcohol. As the acidic group, a vinyl compound containing a (tetra) group which can be copolymerized with a monomer having an unsaturated group represented by the formula; can be any one, for example, "Molecular Data" The manual [Basic Editing] is described in the Pei Feng Museum (1986). Specific examples thereof include acrylic acid, α and/or β-substituted acrylic acid (for example, α-ethenyloxy, α-ethoxylated fluorene, α-(2-amino) fluorene, α-gas, a-bromine. , α·fluoro, α•tributyl decyl, α-cyano, β-gas, β bromine, spirulina, α,β-dichloro, etc., methacrylic acid, y Kang acid, itaconic acid half ester, itaconic acid hemidecylamine, crotonic acid, 2-alkenyl carboxylic acid (such as 2-pentenoic acid, 2_mercapto-2-hexenoic acid) (2-metyl-2-hexenoic acid), 2-octenoic acid, 4-mercapto-2-hexenoic acid, 4-ethyl-2-octenoic acid, etc., maleic acid , maleic acid half ester, maleic acid hemidecylamine, vinyl benzene carboxylic acid, vinyl benzene sulfonic acid, vinyl sulfonic acid, vinyl phosphonic acid, dicarboxylic acid vinyl or allyl half ester derivative And a compound containing the acidic group in the substituents of the carboxylic acid or sulfonic acid ester derivative and the guanamine derivative. The alkali-soluble resin used in the present invention may, as shown in the above formula II and formula III, be a monomer represented by at least general I and a monomer having at least an acidic group, and further optionally with (mercapto)acrylic acid. The hydroxyalkyl ester is copolymerized to obtain a copolymer having the unsaturated group. The alkyl group of the hydroxyalkyl (meth) acrylate is an exoethyl group, a propyl group and a butyl group. The monomer for introducing the structural unit may be exemplified by 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 4-hydroxybutyl acrylate, and 4-hydroxybutyl methacrylate and the like. The (mercapto) acrylate-containing compound which reacts with the acidic group and the hydroxyl group of the hydroxyalkyl (meth) acrylate is a (fluorenyl) acrylate having an epoxy group or may have a substituent (A) Base) acrylonitrile alkyl isocyanate and (fluorenyl) acrylonitrile chloride. The (fluorenyl) acrylate having an epoxy group is, for example, preferably a compound represented by the following formula (1) and a compound represented by the formula (2). [Chem. 20] R1

〇 Structural formula (1) 25 201245878 wherein, in the structural formula (1), R] represents a hydrogen atom or ^ represents an organic group. The L1 is a linear or squash-like substituted or unsubstituted (tetra) group, or a base comprising the combination of at least one of the ray and the at least one selected from the group _α == base. Examples of the substituent which the stretching group may have are, for example, silk. The preferred one is 1 to 15, and more preferably 丨~4. [Chem. 21] R2

In the structural formula (7), r2 represents a hydrogen atom or a methyl group. ^ The table is not organic. W represents the aliphatic cigarette base of the 4-member ring to the 7-member ring. ^, better than the money, the branching tree line replaced or unsubstituted stretch base ' or contains the stretch base and selected from _ 〇 _, _c (which and at least one of the above H bases are better) It is a stretching group. The substituent group may be, for example, a filament. The carbon number of the wire is preferably 1, 15, more preferably 1 to 4. The compound represented by the formula (1) and the compound represented by the structural formula (2) (IV) are more preferably the compound of the formula (1). In the structural formula (1) and the structural formula (2) +, it is more preferred that L1 and L2 are independent of each other. The compound represented by the structural formula (1) or the compound represented by the structural formula (7) is not particularly limited, and examples thereof include the following exemplified compounds ( 1) ~ Illustrative compound (10).

The (fluorenyl) acrylonitrile alkyl isocyanate compound which may have a substituent is a (fluorenyl) acrylonitrile group bonded to an isocyanate 27 201245878 酉曰=10) via an alkylene group having a carbon number of 2 to 6; As an example, the compound can be exemplified by (4) aryl-ethyl group and 2-methyl propyl-ethyl (4). 2_Kyiyi C, decylethyl isocyanate 8 is commercially available as "karenzMOI" manufactured by Showa Denko Co., Ltd., etc. As a (meth) propylene helium gas compound, a propylene-grown chlorine or a mercapto-propene broth is commercially available in the form of Tokyo Chemical Industry Co., Ltd. 0. The test resin of the present invention may further copolymerize other monomers. . -Other monomers - The other monomer is not particularly limited, and examples of the monomer having a branch having a branched and/or alicyclic structure include styrene, (meth) acrylate, vinyl ether, vinyl ester. The class of (fluorenyl) acrylamides and the like are preferably (fluorenyl) acrylates, vinyl esters and (fluorenyl) acrylamides, more preferably (fluorenyl) acrylates. A specific example of the monomer is (mercapto)propionate having an alicyclic hydrocarbon group having 5 to 20 carbon atoms. Specific examples thereof include (fluorenyl)acrylic acid (bicyclo-2,2,1-heptyl-2)g, (fluorenyl)acrylic acid ruthenium acetonate, (meth)acrylic acid _2-adamantyl ester, (fluorenyl)acrylic acid _3_mercapto-1-adamantyl ester, (mercapto)acrylic acid _3,5-diindenyl-1_adamantyl styrene, (mercapto)acrylic acid-3-ethyl gen Alkyl ester, 3-mercapto-5-ethyl-1-adamantyl (meth)acrylate, _3,5,8-triethylamadamantyl (meth)acrylate, (曱) Acrylic acid _3,5-didecyl _8_ethyl-1-adamantyl aryl, (mercapto)acrylic acid octahydro-4,7-indenylene (menthanol) 茚-5-based vinegar, ( Octahydro-4-(7,7-indenyl)-1-ylmercaptoate, (mercapto)-propionate-monomenthyl ester, tricyclodecyl (meth) acrylate, (A) Acrylic acid-3- 28 201245878 HZJizpif minus _2,6,6-dimercapto-bicyclo[m]heptyl cool, (meth)acrylic acid j octamethyl-4-carbo-bicyclo[4 ,1,0]heptylamine, (meth)acrylic acid (lowering) borneol-based vinegar, (mercapto)acrylic isobornyl vinegar, (meth)acrylic acid-based (fenchy (10) and (sulfanyl) Acrylic acid _2, 2, 5_ Trimethylcyclohexyl vinegar, etc. Preferred among the (meth) acrylates of koala are methacrylic acid cyclohexyl vinegar, (methacrylic acid (nor) borneol vinegar, (mercapto) propylene Acid isobornyl vinegar, (mercapto) acrylic acid small radix sulphate, (methyl) acrylic acid _2 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ Vinegar and (meth)acrylic acid triterpene vinegar, etc. 'Specially good is methyl _ _ hexyl, decyl propyl norbornene f, (mercapto) acrylic acid isobornyl vinegar and (mercapto) Acrylic acid can be used as a base. Moreover, monomers having no branching and/or alicyclic structure acid esters, styrene and vinyl ether, and olefinic olefinic alkenyl groups can be used. The ethylene group such as a phthalic anhydride group, an ethylene vine group, and a base is not particularly limited, and examples thereof include a butyl ethyl group and an isacon anhydride group. The alkenyl group is not particularly limited, and for example, it can be two = two ===: r is a moir «, and further is a better state. IG secret. 20 29 201245878 As a specific example of the alkali-soluble resin used in the present invention , for example The compounds represented by the following compounds Ρ-1 to Ρ-18 are listed. [Chem. 23] ch3 - CH2~C-co2h a CH3 - CH2*C-co2ch2ch=ch2 b -CH〇-C-

P-1 a : b : c = 20.0 : 76.0 : 4.0 (mol%) P-2 a : b : c = 24.0 : 70.0 : 6.0 (mol%) P-3 a : b : c = 24.0 : 60.0 :1 Θ.0 (mol%) P-4 a : b : c = 24.0 ; 50.0 : 26.0 (mol%)

CH3—CH2&quot;C- co2h ch3 ch3 —CH2'C--CH2-C—C02CH2CH=CH2 C〇2 b , P-5 a : b : o = 20.0 : 76,0 : 4.0 (mol% HO〆Ρ-β a : b : c = 24.0 : 70.0 : 6.0 (moIX) P-7 a : b : c = 24.0 : 60.0 : 16.0 (mol%) P-8 a : b : c = 24.0 : 50.0 : 26.0 (mol%) [化25] 30 201245878 42312pif CH3 CH 2 ·. C co2h

Ch3 ch3 -CH2'C- -CH2*C- co2ch2ch=ch2 C〇2 c P-9 a: b : c = 20.0 : 76.0 : 4.0 (mol%) P-10 a : b : c = 24.0 : 70.0 : 6.0 (mol») P-11 a : b : c - 24.0 : 60.0 :16.0 (moi%) P-12 a : b : c = 24.0 : 50.0 : 26.0 (mol%)

[Chem. 26] ch3 - CH2'C- - co2h a P-t3 P-14 ch3 ch2*c - co2ch2ch«ch2

a : b : o : d- 24.0 : 60.0 : 12.0 : 4.0 (mol%) a : b : c : d&quot; 24.0 : 60,0 : 8.0 : 8Ό (mol%)

Ch3 —ch2-c— co2h a CH3 —CH2'C— co2ch2ch=ch2 b

CH3 ch2-c—C〇2C OH P-15 a : b : o : d= 24.0 : 60.0 : 12.0 : 4.0 (mol%) P-16 a : b : o : d= 24.0 : 60.0 : 8.0 : 8.0 ( Mol*) ch3 —ch2-c— C〇2 d

31 201245878 •fjLD ΙΖ,ρΐΙ ch3 I ^一CHo^C--&quot; co2h ch3 ch &quot;CHg^C&quot;1* *TM·〇Η2**ε C〇2CH2CH«CH2 b

Ch3 I 4 -CHjfC C〇2 c CO^ 9 OC-NH 2 dCIr&gt; P-17 a : b : c : 24.0 : 60.0 ; 12,0 : 4.0 (molK) P-18 a : b : c : d= 24.0 : 60.0 : 8.0 : 8.0 (mol%)

O o

[化29]

Ch3 a CHjj-C- C02H CH3 —CHj-C- co2ch2ch=ch2 b ch3 CH^-C- I j C〇2

P-19 P-20 a : b : c : d= 240: 60.0 : 12.0: 4.0 (mol%) a : b : c : d= 24.0: 60.0 : 8.0 : 8Ό (moIX)

&lt; (B) Polymerizable compound&gt; The polymerizable compound is, for example, a polymerizable compound having at least one ethylenically unsaturated double bond, and can be selected from components constituting a known composition, and Japanese Patent Laid-Open No. 2 The paragraph number [0010] of the 公报6_23696 bulletin [0020] is described in the section [0020] or the paragraph of the paragraph of the patent publication No. 2006-64921, pp. 27~~paragraph number [〇〇53] The ingredients contained in S. Further, it is also suitable to use a polymerizable compound which is produced by an addition reaction of an isocyanate to a trans group, and an amine group is also disclosed. Japanese Patent Laid-Open No. 37-m, Japanese Patent Publication No. m(9) Japanese Patent Publication No. 2/16765, the disclosure of the Japanese Patent Publication No. Hei. No. Sho. No. 2, 16765, or the Japanese Patent Special Publication No. ZHAO 嶋 、 、 、 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 Amino phthalate compounds having an epoxy eucalyptus described in Japanese Laid-Open Patent Publication No. 62-39418 are also suitable. For example, Japanese Patent Laid-Open No. 3 48-64183, Japanese Laid-Open No. 49-43191旒, and Japanese Patent Publication No. Sho 52 3_〇(()) propylene-based, epoxy resin olefins A polyfunctional propylene or methacrylic acid vinegar such as an epoxy acrylate obtained by an acid reaction. In addition, it is also possible to use a compound introduced by the magazine I., page 300 to page (Cong Nian is a photocurable monomer and oligomer).

Specific examples thereof include pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol penta(indenyl)acrylate, dipentaerythritol hexakis(meth)acrylate, and tris((fluorenyl)acrylonitrile. Oxyethyl)isomeric cyanurate, pentaerythritol tetra(meth)acrylate E〇 modified product, dipentaerythritol hexa(indenyl)acrylate EO modified product, etc., and as a commercial iNK

Ester A-TMMT, NK Ester A-TMM-3, NK〇Ug〇IjA-32P, NK Oligo UA-7200 (above), Aronix M-305, Aronix M-306, Aronix μ·309, Aronix M-450, Aronix M-402, TO-1382 (manufactured by Toagosei Co., Ltd.) and V#802 (manufactured by Osaka Organic Chemical Industry Co., Ltd.) are preferred examples. These polymerizable compounds may be used singly or in combination of two or more kinds. The polymerizable compound in all solids of the photosensitive resin composition 33 201245878 1 ^.μιχ Containing S (total content in the case of two or more kinds) is preferably 10% by mass 'more preferably 15% by mass ~75% by mass, particularly good is 20% set to 60% by mass. &lt;(C) Photopolymerization Initiator&gt; The photopolymerization initiator is not particularly limited as long as it can polymerize the polymerizable compound, and is preferably obtained according to characteristics, initial efficiency, absorption wavelength, and Choose from the perspectives of sex and cost. The photopolymerization initiator is a compound which is photosensitive due to exposure light, which initiates and promotes polymerization of the polymerizable compound. (4) is a compound which induces polymerization of a polymerizable compound by an active light having an induced wavelength of 3 Å or more. Further, a combination of a photopolymerization initiator and a sensitizer which do not directly induce active light having a wavelength of 3 〇〇 or more can be preferably used. Specifically, for example, an oxime ester compound, an organic dentate compound, an oxadiazole compound 'carbonyl compound, a ketal compound, a benzoin compound, an acridine compound, an organic peroxide, an azo compound, a coumarin compound, Azide compound, metallocene compound, hexaaryldiimidazole compound, organoboric acid compound, disulfonic acid compound, rust salt compound, mercaptophosphine (oxide), benzophenone compound, acetophenone compound and derivatives thereof Wait. Preferred from the viewpoint of sensitivity are the Jiang Zizhi compound and the hexaaryl di-salt compound. The oxime ester compound can be used in JP-A-2000-80068, JP-A-2001-233842, JP-A-2004-534797, International Publication No. 2005/080337, and International Publication No. 2006/018973. Japanese Patent Laid-Open No. 2007-210991 34 201245878 4ZJ12pif, Japanese Patent Laid-Open Publication No. Hei. No. 2007-269779, Japanese Patent Laid-Open No. 2007-269779 The compound described in the specification and International Publication No. 2009/131189. Specific examples include 2-(0-benzoquinone)-1-[4-(phenylthio)phenyl]-1,2-butanedione and 2-(indolyl-benzidine) small [4] -(phenylthio)phenyl]_ι,2-pentanedione, 2-(0-benzoquinone) small [4-(phenylthio)phenyl]-1,2-hexanedione, 2- (0-benzoquinone)-1-[4-(phenylthio)phenyl]-1,2-heptanedione, 2·(〇-benzoquinone)-1-[4-(phenylsulfonate) Phenyl]-1,2-octanedione, 2-(0-benzoquinone)-1-[4-(mercaptophenylthio)phenyl]-1,2-butanedione, 2 -(0-benzoquinone)-1-[4-(ethylphenylthio)phenyl]-1,2-butanedione, 2-(0-benzoquinone)-[4-[4 -(butylphenylthio)phenyl]-1,2-butanedione, 1-(〇_乙醯肟)-1-[9-ethyl-6-(2-mercaptophenyl) -9H-carbazol-3-yl]ethanone, 1-(0-acetamido)-1-[9-fluorenyl-6-(2-methylbenzylidene)-9H-carbazole-3 -yl] Ethylketone, 1-(0-acetamidine)-1-[9-propyl-6-(2-mercaptobenzylidene)_9H-indazol-3-yl]ethanone, 1- (〇_乙醯肟)-49-Ethyl-6-(2-ethylphenylindenyl)-9H-indazol-3-yl]ethanone and 1-(〇_乙醯肟H-[9 -ethyl-6-(2-butylphenylhydrazino)-9H-indazol-3-yl]ethanone, etc., but is not limited to these compounds Further, in the present invention, from the viewpoints of sensitivity, temporal stability, and coloring at the time of post-heating, the compound represented by the following formula (III) is also suitable as the oxime ester compound as a photopolymerization initiator. [化30] 35 201245878 厶J i 厶pijl ο

In the formula (III), χι, χ2, and X3 each independently represent a nitrogen atom, a halogen atom or an alkyl group, and R1 represents _R, _〇R, _c〇R SR, -CONRR, or -CN 'r2 and R3 independently represents R, 〇r, c〇r -SR ^-NRR'cR and R* each independently represent an alkyl group, an aryl group, an aryl group or a heterocyclic group, and the group may also be free from the atomic atom. And one or more substitutions of the group of light bases and one or more carbon atoms constituting the alkyl group bond in the silk and the green group may be substituted with an unsaturated bond, an ether bond or an ester bond, R and R. 'Can also be bonded to each other to form a ring. In the above formula (III), the porphyrin atom in the case where χΐ, X2, and χ3 represent a halogen atom may be exemplified by fluorine, gas, bromine, and iodine; and the alkyl group in the case where χ1, χ2, and X3 represent an alkyl group. For example, a mercapto group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a second butyl group, a tert-butyl group, a pentyl group, an isopentyl group, a third pentyl group, a hexyl group, a heptyl group, Octyl, isooctyl, 2 ethylhexyl, second octyl, decyl, isodecyl, decyl, isodecyl, vinyl, allyl, butenyl, ethynyl, propynyl, Oxyethyl, ethoxyethyl, propoxyethyl, decyloxyethoxyethyl, ethoxyethoxyethyl, propoxyethoxyethyl, methoxypropyl, Monofluorodecyl, difluoromethyl, trifluoromethyl, trifluoroethyl, perfluoroethyl, 2-(benzoxanth-2,-yl)vinyl, and the like. 36 201245878 42312pif wherein 'preferably Χΐ, χ 2 and χ 3 all indicate that a hydrogen atom represents a leukoyl group and both X2 and X3 represent a hydrogen atom. Examples of the alkyl group represented by 'R and R in the above formula (111) include a mercapto group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a second butyl group, and a third butyl group. , pentyl, isopentyl, third amyl, hexyl, heptyl, octyl, isooctyl, 2-ethylhexyl 't-octyl, decyl, isodecyl, fluorenyl, fluorenyl, Vinyl ipropyl, butyl, ethyl, propyl, methyl lactylethyl ethoxyethyl, propoxyethyl, methoxyethoxyethyl, oxy ethoxy Ethyl ethyl, propoxyethoxyethyl, methoxypropyl, mono-(fluorenyl)difluoromethyl, trifluoromethyl, trifluoroethyl, perfluoroethyl and oxo-2'- Base) vinyl and the like. Examples of the aryl group represented by R and R include a phenyl group, a tolyl group, a phenyl group, an ethylphenyl group, a gas phenyl group, a naphthyl group, an anthracenyl group, a phenanthryl group, and the like. Examples of the alkyl group include a benzyl group, a chloro group group, an α-methyl group, an α, α dimethyl group, a phenylethyl group, a phenylvinyl group, etc., and a heterocyclic group represented by R, for example. Examples include a pyrrolyl group, a thienyl group, etc., a sulfonyl group, and R and R, a ring-formed ring formed by bonding with each other, a morpholine ring, etc. 辰 %% (4)!: contains; ^R and the above R, Lai Xu R2 And the R3 and the best sites are methyl, hexyl, cyclohexyl, _pure, 2-S-Ph-Br ° and (C) photopolymerization initiators, the following compounds are used as photoinitiators It is not suitable: in the above formula (ΙΠ), χ1, = 37 201245878 is a hydrogen atom; R1 is an alkyl group, especially a fluorenyl group; R2 is an alkyl group, especially a fluorenyl group; R3 is an alkyl group, particularly The preferred embodiment of the photopolymerization initiator represented by the above formula (III) is exemplified by the following compounds A to F. However, the present invention is not limited to any of the following compounds. System. [Formula 31]

[化32] 38 201245878 4^JlZpif

[化33] 39 201245878

The photopolymerization initiation of the above formula (III) can be synthesized by the method described in JP-A-2005-220097. The compound represented by the formula (III) used in the present invention has an absorption wavelength in a wavelength region of from 25 Å to 500 nm. More preferably, those having an absorption wavelength in the wavelength range of 300 nm to 380 nm can be listed. Particularly preferred are those with high absorbance at 308 nm and 355 nm. Further, in the present invention, the compound represented by the following formula (II) is also suitable as the oxime ester compound of the photopolymerization initiator from the viewpoints of sensitivity, temporal stability, and coloration at the time of heating. [34] 201245878, i ^, ριΓ ο ο

In the formula (II), 'R22 represents a monovalent substituent. Α22 represents a 2-valent linking group, and Ar represents an aryl group. η is an integer of 〇~5. X22 represents a substituent of 1 valence. When η is an integer of 2 to 4, a plurality of X22 existing may be the same or different. The one-valent substituent represented by R22 is preferably a non-metal atomic group represented by one of the following. The non-metal atomic group represented by R22 may, for example, be an alkyl group which may have a substituent, an aryl group which may have a substituent, an alkyl group which may have a substituent, and an aryl group which may have a substituent. Further, a fluorenyl group, a fluorenyl group which may have a substituent, a heterocyclic group which may have a substituent, and the like. The alkyl group which may have a substituent is preferably an alkyl group having a carbon number of 1 to 30, and examples thereof include a mercapto group, an ethyl group, a propyl group, a butyl group, a hexyl cyclopentyl group, a cyclohexyl group, a trifluoromethyl group, and the like. . The aryl group which may have a substituent is preferably an aryl group having 6 to 30 carbon atoms, and examples thereof include a phenyl group, a biphenyl group, a naphthyl group, and a 2-naphthyl group. The alkylsulfonyl group which may have a substituent is preferably an alkylsulfonyl group having a carbon number of 丨~, and examples thereof include a methylsulfonyl group and an ethylsulfonyl group. The arylsulfonyl group which may have a substituent is preferably an arylsulfonyl group having a carbon number of 6 to 3 Å. Examples thereof include a phenylsulfonyl group and a fluorenyl-naphthylsulfonyl group. The fluorenyl group which may have a substituent is preferably a fluorenyl group having a carbon number of 2 to 2 Å, which may, for example, be an ethyl fluorenyl group, a propyl fluorenyl group, a butyl sulfonyl group, a ternary methyl carbonyl group, 41 201245878 pentamidine group, benzoquinone. Indenyl, 1-naphthylfluorenyl, 2-naphthylfluorenyl, 4-nonylthiobenzimidyl, 4-phenylthiobenzoinyl, 4-didecylaminobenzimidyl, 4 -monoethylaminophenylhydrazino, 2-p-benzoquinone, 2-methylphenylhydrazino, 2-decyloxynonyl, 2-butoxyphenylhydrazine, 3-gas Benzyl fluorenyl, 3-di II fluorene basic methyl, 3-cyanophenyl fluorenyl, 3- stone fluorenyl fluorenyl, 4-fluorophenyl fluorenyl, 4-cyano cumyl and 4 - methoxy alum and the like. The heterocyclic group which may have a substituent is preferably an aromatic or aliphatic heterocyclic ring containing a nitrogen atom, an oxygen atom, a sulfur atom or a phosphorus atom. For example, a thienyl group, a furyl group, a pyranyl group and the like can be listed. More preferably, the R22' is a non-substituted or substituted aryl group from the viewpoint of high sensitivity, and particularly preferably an unsubstituted or substituted ethyl ketone group or a propyl group. , phenyl and toluene. The substituent may, for example, be a group represented by the following structural formula, and is preferably any of 〇1) (d-4) and (d-5). Eight [35]

(iv) (d-3)

句~5)--Ν(") 42 201245878 42312pif The divalent linking group represented by the above A22 may be an alkylene group having a carbon number of 1 to 12 which may have a substituent, or may have a substituent. a cyclohexyl group and an alkynyl group which may have a substituent. Examples of the substituent which may be introduced into the group include a halogen atom such as a fluorine atom, a gas atom, a bromine atom and an iodine atom, a decyloxy group, an ethoxy group, and a third group. An alkoxy group such as a butoxy group; an aryloxy group such as a phenoxy group or a p-phenoxy group; an alkoxycarbonyl group such as a decyloxycarbonyl group, a butoxycarbonyl group or a phenoxycarbonyl group; The A22 is preferably an unsubstituted alkylene group and is substituted by an alkyl group (e.g., anthracenyl, ethyl, tert-butyl, and dodecyl) because of the coloring over time after heating. An alkyl group substituted with an alkenyl group (e.g., a vinyl group and an allyl group) and an aryl group (e.g., phenyl, p-tolyl, xylyl, cumenyl, naphthyl, anthracenyl, a phenanthrenyl group substituted with a phenanthrenyl group and a styryl group. The aryl group represented by Ar is preferably an aryl group having a carbon number of 6 to 30. Further, it may have a substituent. Specifically, 'Ar may include a phenyl group, a biphenyl group, an anthracene-naphthyl group, a 2-naphthyl group, a triphenylene group, a tetraphenylene group, an o-tolyl group, an m-phenylene group. , p-phenylene, xylyl, o-isopropylphenyl, m-isopropylphenyl, p-cumyl and mesityl, etc. Among them, since the sensitivity is increased, the coloring after passing the heating is suppressed. In view of the above, a substituted or unsubstituted phenyl group is preferred. When the phenyl group has a substituent, the substituent may, for example, be a halogen atom such as a gas atom, a chlorine atom, a bromine atom or an iodine atom. Alkoxy groups such as oxy, ethoxy and tert-butoxy, alkoxycarbonyl such as phenoxy and p-tolyloxy, methoxycarbonyl, butoxycarbonyl and phenoxycarbonyl 201245878 base, methoxy group such as ethoxylated, propyloxy and benzyl methoxy, ethyl hydrazino, methionyl, isobutyl decyl, propyl broth, methyl propyl thiol and methoxy grass Alkyl amines such as methylamino and cyclohexylamine, dimethylamino, diethylamino, morpholinyl and piperidine An alkyl group such as a dialkylamino group, a phenylamino group, a decyl group, an ethyl group, a tributyl group or a dodecyl group, a hydroxyl group, a carboxyl group, etc. In the formula (III), if the Ar is The structure of "SAr" formed by the adjacent S is preferably the structure shown below, and is preferable in terms of sensitivity. [化36] 201245878 42312pif SO SXX stXr

The one-valent substituent represented by X22 may, for example, be an alkyl group which may have a substituent, an aryl group which may have a substituent, an alkenyl group which may have a substituent, an alkynyl group which may have a substituent, Further, it may have an alkoxy group having a substituent, an aryloxy group which may have a substituent, an alkylthiooxy group which may have a substituent, an arylthiooxy group which may have a substituent, a halogen atom, and the like. The alkyl group which may have a substituent is preferably an alkyl group having 1 to 30 carbon atoms, and examples thereof include an alkyl group, an ethyl group, a propyl group, a butyl group, a hexyl group, a cyclopentyl group, 45 201245878 cyclohexyl group, and difluoro group. Methyl, 2-ethylhexyl and benzhydryl groups. The aryl group which may have a substituent is preferably an aryl group having a carbon number of 6 to 3 Å, for example, a phenyl group, a biphenyl group, a fluorenyl-naphthyl group, a 2-naphthyl group, a triphenyl group, a hydrazine group. Phenyl, o-tolyl, m-phenylene, p-phenylene and xylyl. The alkenyl group which may have a substituent is preferably an alkenyl group having a carbon number of 2 to 1 Å, and examples thereof include a vinyl group, an allyl group, and a styryl group. The alkynyl group which may have a substituent is preferably an alkynyl group having a carbon number of 2 to 1 fluorene, and examples thereof include an ethynyl group, a propynyl group, and a propargyl group. The alkoxy group which may have a substituent is preferably an alkoxy group having a carbon number of 1 to 3 Å, and examples thereof include a decyloxy group, an ethoxy group, a propoxy group, an isopropoxy group, a butoxy group, and a benzyl group. Oxyl and the like. The aryloxy group which may have a substituent is preferably an aryloxy group having a carbon number of 6 to 3 Å, and examples thereof include a silyloxy group, a 1-naphthyloxy group, a 2-naphthyloxy group, and a 2-phenoxy group. , 2-mercaptophenoxy and 2-methoxyphenoxy. The alkylthiooxy group which may have a substituent is preferably a thioalkyloxy group having a carbon number of 1 to 3 Å, and examples thereof include a thioloxy group, an ethylthio group, and a propylthio group. Isopropylthiooxy, butylthiooxy, isobutylthiooxy, second butylthiooxy, tert-butylthiooxy, pentylthiooxy, isopentylthiooxy, hexyl Thiooxy, heptylthio, octylthiooxy, 2-ethylhexylthiooxy, sulfonyloxy, dodecylthiooxy, octadecylthiooxy and benzyl Sulfuryloxy and the like. The arylthiooxy group which may have a substituent is preferably an arylthiooxy group having a carbon number of 6 to 30, for example, a phenylthiooxy group, a fluorenylnaphthylthio group, 46 201245878 HZJIZpif 2- Naphthylthiooxy, 2·chlorophenylthiooxy, 2-methylphenylthiooxy, 2 decyloxythiooxy, 2-butoxyphenylthiooxy, 3-chlorobenzene Sulfur-based gas group, 3-difluorodecylphenylthiooxy group, 3-cyanophenylthiooxy group, 3-nitrophenylthiooxy group, 4-fluorophenylthiooxy group, 4-cyano group Phenylthiooxy, 4, methoxyphenylthiooxy, 4-didecylaminophenylthiooxy, 4-methylthiosulfooxy and 4-phenylthiophenylthiooxy Base. A halogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, etc. exist. The halogenated alkyl group which may have a substituent may, for example, be a monofluoroindenyl group, a diindenyl group, a trifluoroindolyl group, a dihalofluorenyl group, a yttrium fluorenyl group, a monobromomethyl group or a dibromomethyl group. Tribromomethyl and the like. Examples of the amidino group having a substituent on N include an n,N-dimethylammonium group and an N,N-diethylguanamine group. In the above, X22 is preferably an alkyl group which may have a substituent, an aryl group which may have a substituent, or may have a viewpoint of improving solvent solubility and absorption ratio in a long wavelength region. The alkenyl group of the substituent, the alkynyl group which may have a substituent, the alkoxy group which may have a substituent, the aryloxy group which may have a substituent, the alkylthiooxy group which may have a substituent, or may have The arylthiooxy group of the substituent, the functional alkyl group which may have a substituent, the amine group which may have a substituent or the sulfonyl group which may have a substituent on N, and more preferably may have The alkyl group of the substituent. Further, η in the formula (III) represents an integer of 0 to 5, and from the viewpoint of easiness of synthesis, it is preferably an integer of 〇3 to 3, and more preferably an integer of 〇2. In the case of the general formula (III), when there are a plurality of X22, a plurality of X22 47 201245878

----XT can be the same or different. Specific examples of the photopolymerization initiator represented by the above formula (III) are shown, for example. [化37]

48 201245878 42312pif 匕38]

The compound represented by the formula (III) used in the present invention is a compound having an absorption wavelength in a wavelength region of from 250 nm to 500 nm. More preferably 49 201245878 a - Aijyix is a sigma species having an absorption wavelength in the wavelength range from 300 nm to 38 〇 nm. Particularly preferred are compounds with high absorbance at 308 nm and 355 11111. Specific examples of the organic compound include, for example, "Foreign Chemical Society Bulletin (Bull Chem. Soc. Japan)" 42, 2924 (1969), U.S. Patent No. 3,905,815, Japanese Patent Publication No. SHO 46-46-5, Japanese Patent Laid-Open No. 48-3, Japanese Laid-Open Patent Publication No. SHO-55-32070, Japanese Patent Laid-Open Publication No. Hei. No. Hei. Japanese Laid-Open Patent Publication No. SHO-62-212401, Japanese Laid-Open Patent Publication No. SHO-62-212401 M.RHU «"Heterinary Chemical Journal (J〇umal 〇f HetenDeydie)

The compound described in "i" (No. 3), (197), and the like may, for example, be a sitting compound substituted with a difunctional fluorenyl group and a homotrimide compound. . Examples of the hexaaryl-based oxime compound include, for example, Japanese Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Explain the various compounds described in Kuizhong, specifically $2,2, bis(o.g.; keto)-4,4,5,5-tetra-based ketone, 2,2,-bis (near phenyl) )) 4,4,,5 $, tetraphenyl-linked, 2,2, only (__diphenyl)_4,4,,5,51 tetraphenyl-linked saliva, 2,2'-double (ozone phenyl (4) (1) '-tetrazedyloxy phenyl carbitol, 2,2'-bis(o-o-dichlorophenyl)-4,4,,5,5|_tetraphenyl-linked Jun, 2,2,_bis(o-nitrophenyl)-4,4',5,5'-tetraphenylbiimidazole, 22, bis(o-nonylbenzene 201245878 42312pif base &gt; 4,4', 5,5'_four stupid base. Sit and 2,2,-bis(o-trifluorophenyl)-4,4,5 5, tetraphenylbiimidazole, etc. 'Photopolymerization initiator can be used (10) When two or more types are used in combination, a plurality of compounds represented by the formula (III) may be used, and a plurality of compounds represented by the formula (Π) may be used. At least one of the compounds represented by the general formula (8) and the general formula (HI) may be used. Further, at least one of the compounds represented by the general formula (II) and the general formula (In) may be used. (II) and a photopolymerization initiator other than the compound of the compound of the formula (IU), and may also be used in combination with a sensitizer. 0 as a total amount of a photopolymerization initiator, relative Preferably, all solids in the photosensitive resin are 〇·1% by mass to 20% by mass, and $ 佳 is 0.5% by mass to 1% by weight of the stomach, and most preferably i% by mass to 5%. In the case of this specification, the sensitivity is high at the time of exposure, and the silk color characteristics are also good. &lt;Sensitizer&gt; A sensitizer may be added to the photosensitive resin composition of the present invention. Typical sensitizers to be used can be exemplified by C sensitizers [J. vx: nvell Q, Advance in Polymer Science (Adv, Bob (10), (1984)], specifically :芘' ', ^定,车_, 2_ gas lazy, benzoflavin, N• ethylene based miso, two 10 = butoxyg, brewing, diphenyl _, fragrant, Ketone As a sensitizer, it is preferred that the phase is first added to the 201245878 line at a ratio of 50% by mass to 2 (8)% by mass of the starting agent. &lt;Multifunctional thiol compound&gt; The photosensitive resin composition of the present invention may further comprise a polyfunctional thiol compound. The photosensitive resin composition of the present invention can be used to suppress ions caused by a colored material such as a dye by containing a polyfunctional thiol compound. When the photosensitive resin composition of the present invention is used in the production of a color light-emitting sheet for a liquid crystal display device, it is possible to prevent deterioration of the quality of crosstalk such as cross-talk, and to achieve a high-definition quality. display. Further, as the color filter using the photosensitive resin composition of the present invention, since the pattern shape can have an appropriate gradient, even if the transparent electrode is provided, there is no disconnection of the transparent electrode, and the coloring in the pattern development is not generated. The protrusion of the element, etc., the linearity of the pattern is good. A liquid crystal display device having a high quality can be obtained by including a color filter using the photosensitive resin composition of the present invention. In the present invention, the "polyfunctional thiol compound" is a compound having two or more thiol groups in the molecule. The above polyfunctional thiol compound is preferably a low molecular compound having a molecular weight of 100 or more, and specifically preferably has a molecular weight of from 100 to 1,500, more preferably from 150 to 1,000. The above polyfunctional thiol compound preferably has 2 to 1 fluorene groups in the molecule, more preferably 2 to 6 groups. Further, these compounds are preferably systems which are used as an auxiliary in the polymerization of the above-mentioned radical polymerizable monomer. Specifically, it is preferred that the amount of the polyfunctional thiol compound added is such an amount as to be i% by mass to 2% by mass based on all the solid matter of the composition, or the above-mentioned freeness The amount of the base polymerizable monomer is more 52 201245878 4Z^izpif Less added amount. In the present invention, the '(B) polyfunctional thiol compound is preferably a compound having two or more groups represented by the following formula (2). [化39] —0-A-CH2CH-SH (2)

R (in the formula (2), R represents a hydrogen atom or a burnt group, and a represents _c〇- or -CH2-.) (B) The polyfunctional thiol compound preferably has 2 to 6 formulas. (2) The compound represented by the group is more preferably a compound having 2 to * groups represented by the formula (2). The group of R in the formula (2) is a linear, branched or cyclic alkyl group, and the range of the carbon number is preferably from 1 to 16 Å, more preferably from 1 to 1 Å. Specific examples of the alkyl group are a mercapto group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a second butyl group, a tert-butyl group, a pentyl group, a hexyl group, a 2-ethylhexyl group, etc., preferably a methyl group. , ethyl, propyl and isopropyl. Particularly preferred R is a hydrogen atom, a mercapto group, an ethyl group, a propyl group and an isopropyl group, and most preferably a mercapto group and an ethyl group. In the present invention, the (B) polyfunctional thiol compound is particularly preferably a compound represented by the following formula (1) having a plurality of the above formula (2). [化 40] 53 201245878

(In the formula (1), R represents a hydrogen atom or an alkyl group, and A represents -co- or -CH2-. L represents a n-valent linking group, and η represents an integer of 2 to 6.) In the formula (1) The alkyl group of R is synonymous with R in the above formula (1), and the preferred range is also the same. η is preferably 2 to 4. L of the n-valent linking group in the formula (1) includes, for example, a divalent linking group such as -(CH2)m-(m is 2 to 6), and a trimethylolpropane residue having 3 -(CH2) groups. a trivalent linking group such as a di-cyanuric acid ring of p-(p is 2 to 6), a hexavalent linking group such as a tetravalent linking group such as a pentaerythritol residue, or a hexavalent linking group such as a dipentaerythritol residue. Specific examples of the (B) polyfunctional thiol compound include, for example, tris-mercaptopropane tris(3·mercaptopropionic acid) g, pentaerythritol tetrakis(3-mercaptopropionic acid) vinegar, and tetraethylene glycol bis ( 3-mercaptopropionic acid) vinegar, dipentaerythritol hexa(3-mercaptopropionic acid) S, pentaerythritol tetrakis(thioglycolate), pentaerythritol tetrakis(3-mercaptobutyric acid), butanediol bis (3) - mercaptobutyrate), 1,4-bis(3-mercaptobutoxy)butane, anthracene, 3,5-tris(3·decylbutoxyethyl)-1,3,5-triazine -2,4,6(1H,3H,5H)_ Diterpene or the like as a suitable polyfunctional thiol compound. The content of the polyfunctional thiol compound is preferably from 0.01% by mass to 20% by mass based on all the solids in the photosensitive resin composition, and more preferably from 0.1% by mass to 10% by mass. When the content of the polyfunctional thiol compound is within this range, a photosensitive resin or a composition having the following characteristics can be provided: the sensitivity of the photosensitive resin composition is good, and the storage stability is good, and the color filter obtained is good. The pixel in the light sheet has good adhesion and no pattern defects, and has good electrical characteristics when used in a liquid crystal display device. (Colorant) The colorant may be any of a pigment, a dye or a mixture of a pigment and a dye. &lt;Pigment&gt; The earth pigment may be any of various previously known inorganic or organic pigments, and from the viewpoint of sinfulness, it is preferred to use an organic pigment. In the present invention, the organic pigment is, for example, the organic pigment described in paragraph [0093] of JP-A-2002-256572. Moreover, in particular, the following pigments are suitable from the viewpoint of color reproducibility: C'I. Pigment Red 177, 224, 242, 254, 255, 264, CL Pigment Yellow 138, 139, 150, 18 〇, 185, CI Pigment Tan 36, 38, 71, CI Pigment Green 7, 36, 58, CI Pigment Blue 15 : 6, CI Pigment Violet 23 can be species not limited to these organic pigments. These organic pigments are used in various combinations in order to improve the color purity. Crude. It is the average-sub-granules, which are 10 nm to 30 nm. Resin ^成^秘 ‧ 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 感光 感光 感光 感光 感光 感光 感光 感光 感光 感光 感光 感光 感光 感光

201245878 HZJIZpU % of all solids of this composition. If it is effective in the privacy of the color, it is effective in ensuring excellent color (dye). In the photosensitive resin composition of the invention, it is also a pyridyl azo group. Aniline-based lanthanum 3 - human I-line, onion homologue, phenylarylene-based metal ruthenium metal-missing compound, ruthenium tri-salt-ruthenium, right-scale methylene group as photosensitive resin composition of the present invention Specific examples of the material are, for example, Japanese Patent No. 4, "No. 4, No. 2, 592, 207, No. U.S. Patent No. 4 8/Report, Japanese Patent No. 5,667,920, US Special 'f Specification, US Patent No. 5_3332() No. 7, Gazette, Japanese Bulletin, Japanese Patent Special Kaiping (4) Ben 8 Patent_Ping "5183 Ping-6-194828", 曰太直虎么报, 曰本专利特曰本本本特平平4-249549号八1平Μ115&quot;号公告, 1〇], such as the 6th bulletin, Japan Special Tiger 1 report, Japanese patent special open patent, special Kaiping 7_2861m death plus bulletin, Japanese number , Japan, Japanese Patent No. eight special side __ ^ Si Laid-Open Patent present said message 56 201245878 42312pif = promoter No. 1 and Japanese Patent Laid-Open Patent Laid present ⑶⑽ No. JP Shu, reported = 5, Day

No. Bulletin, 曰本专利特开2002-14220泸八报: Taizhi 8_62416 2002-14221 bulletin, Japanese Taizhi ~ △ newspaper, Japanese patent special opening, ^ Japanese Patent Special Open 2002-14222 bulletin Q = profit Special open 2 () 0 read the 23rd bulletin, Japan, Japan ^ newspaper, Japanese Patent Special Kaiping 8 · Chest No. Bulletin, Japanese Patent No. 8-179120, Japanese Patent Laid-Open No. 8-151531, Japanese Patent The dye described in JP-A-6-23〇21〇, and the like. The suitable materials which may be contained in the photosensitive resin composition of the present invention include the following. (secondary base) [Chem. 41]

(dipyrrolidino group-based metal-miscing compound) The compound represented by the formula (I) is compounded on a metal atom or a metallized 57 201245878 compound to form a bis-pyrylene-based metal-based compound. Detailed description. General formula (I)

(In the formula (I), R1, R2, R4, R5 and R6 each independently represent a hydrogen atom or a monovalent substituent, and R7 represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group or a heterocyclic group. The monovalent substituent means a halogen atom (e.g., a fluorine atom, a gas atom, and a bromine atom), an alkyl group (preferably a linear, branched or cyclic alkyl group having a carbon number of 丨 to 48, more Preferred are straight-chain, branched or cyclic alkyl groups having a carbon number of from i to 24, such as methyl, ethyl, propyl, isopropyl, butyl, t-butyl, pentyl, hexyl, Heptyl, octyl, 2-ethylhexyl, dodecyl, hexadecanyl, cyclopropyl, cyclopentyl, cyclohexyl, 1-norbornyl and 1-methylalkonyl), women's base The alkenyl group having a carbon number of 2 to 48 is more preferably an alkenyl group having 2 to 18 carbon atoms, such as a vinyl group, a dipropyl 3-butene-1-yl group, or an aryl group. It is a carbon number of 6 to 48: preferably a carbon number of 6 to 24, _ is a phenyl group and a naphthyl group, and ^ (preferably a heterocyclic group having a carbon number of 1 to 32, more preferably Is a carbon number, the heterocyclic group of the soil 18 is, for example, 2-nonyl, 4_bite* , 2_biting base, ~ 58 201245878 pyrimidinyl, 1-pyridyl, 2-benzothiazolyl, imidazolyl, pyrazolyl, benzotriazol-1·yl), decylalkyl (preferred It is a decyl group having a carbon number of 3 to 38, more preferably a carbon group having a carbon number of 3 to 18, such as a trimethyl sulfonium group, a triethyl decyl group, a tributyl decyl group, and a third butyl group. More preferably a dimethyl decyl group, a second hexyl dimethyl fluorene group, a trans group, a cyano group, a nitro group or an alkoxy group (preferably an alkoxy group having a carbon number of 〜48). Is an alkoxy group having a carbon number of 24, and is, for example, a decyloxy group, an ethoxy group, a decyloxy group, a 2 butyl group, a heterodioxy group, a third T oxy group, a 12-thyl group, and further a ring. Alkoxy groups, such as cyclopentyloxy and cyclohexyloxy), aryloxy (preferably an aryloxy group having a carbon number of 6 to 48, more preferably an aryloxy group having a carbon number of 6 to 24) For example, a phenoxy group and a 1-naphthyloxy group, a heterocyclic oxy group (preferably a heterocyclic oxy group having a carbon number of from 〜32), more preferably a heterocyclic oxy group having a carbon number of 丨~ , for example, 1-phenyltetrazole-5-oxy, 2-tetrahydrofuranyloxy), decaneoxy (preferably, the carbon number is a fluorenyloxy group of 32, more preferably a decyloxy group having a carbon number of i to U, such as a trimethyldecyloxy group, a third butyl dimethyl group, and a sulphur-burning oxygen And diphenylmethylweiloxy), anthracenyloxy (preferably carbon is a 2 to 48 decyloxy group, more preferably a decyloxy group having a carbon number of 2 to 24, such as acetamidine a base group, a pentyloxy group, a phenoxy group, a decyloxy group, an alkoxy group (preferably a carbon group having a carbon number of 2 to fluorene, and a carbon number of 2 to 24 to find oxygen-oxyl group, for example, ethoxy group, and second T-oxyl group 'in addition to riding a silk group, such as cyclohexyloxy group), aryloxy group (more than _^ The number is a aryloxy group of i, i3i, more preferably an aryloxy group having a carbon number of 7 to 24, such as a phenoxy oxy group, an amine mercaptooxy group (preferably 59 201245878 The carbon number is the amino group of the oxime group, and the oxime group is the amine methionyl group of the oxime group 24, for example, the dimethylamine methoxyl group and the N-butylamine. Brewing oxy group, N-phenylamine, and n-ethyl-N-phenylamine T-decyloxy), amine (It is difficult to use an amine-based oxy group having a carbon number of 1 to 32, and more preferably an amine sulfenyloxy group having a carbon number of, for example, ruthenium, bis-diethylamine bis-oxyl and N-propyl Alkalyloxy), alkylsulfonyloxy (preferably having a carbon number of 烷基~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~ For example, fluorenylsulfonyloxy, hexadecanosulfonyloxy and cyclohexylsulfonyloxy), arylsulfonyloxy (preferably arylsulfonyloxy having 6 to 32 carbon atoms) More preferably, it is an arylsulfonyloxy group having a carbon number of 6 to 24, for example, a phenyloxy group, a fluorenyl group (preferably a fluorenyl group having a carbon number of 丨 to 48), more preferably a mercapto group having a carbon number of 1 to 24, for example, a fluorenyl group, an ethyl fluorenyl group, a pentylene group, a decyl group, a tetradecyl group and a cyclohexyl group, and an alkoxycarbonyl group (preferably An alkoxycarbonyl group having 2 to 48 carbon atoms, more preferably an alkoxycarbonyl group having 2 to 24 carbon atoms, such as an anthracenyloxycarbonyl group, an ethoxycarbonyl group, an octadecyloxycarbonyl group or a cyclohexyloxy group. Alkylcarbonyl and 2,6-di-t-butyl-4-indolylcyclohexyloxycarbonyl), aryloxy a group (preferably an aryloxycarbonyl group having a carbon number of 7 to 32, more preferably an aryloxycarbonyl group having a carbon number of 7 to 24, such as a phenoxycarbonyl group) or an amine fluorenyl group (preferably An amidino group having a carbon number of 1 to 48, more preferably an amine fluorenyl group having a carbon number of 1 to 24, such as an amine fluorenyl group, an n,N-diethylamino fluorenyl group, and an N-B group. --N-octylamine fluorenyl, N,N-dibutylaminecarbamyl, N-propylaminecarbamyl, N-phenylaminoindolyl, N-methyl N-phenylamine Anthracenyl and fluorene, anthracene dicyclohexylamine fluorenyl), an amine group (preferably having an alkyl group having a carbon number of 201245878 4ZJ12pif of 32 or less, more preferably an amine group having a carbon number of 24 or less, for example Amino group, methylamino group, hydrazine, hydrazine-dibutylamino group, tetradecylamino group, 2-ethylhexylamino group and cyclohexylamino group), anilino group (preferably, carbon number is 6 〜) An anilino group of 32, more preferably an anilino group of 6 to 24, such as an anilino group and a fluorenyl-methylanilino group, or a heterocyclic amino group (preferably a heterocyclic amino group having a carbon number of 1 to 32). More preferably, it is a heterocyclic amino group of 1 to 18, for example, a 4-pyridylamino group, and a few Jimi groups (preferably A ruthenium amino group having a carbon number of 2 to 48, more preferably a carboxy guanylamino group of 2 to 24, such as an acetamino group, a benzoguanamine group, a tetradecyl guanamine group, or a pentamidine group. And cyclohexylamine), urea group (preferably a ureido group having a carbon number of 1 to 32, more preferably a ureido group having a carbon number of 丨~24, such as a urea group, N, N-dimethyl group a ureido group and a phenylureido group, a quinone imine group (preferably a quinone imine group having a carbon number of 36 or less, more preferably a quinone imine group having a carbon number of 24 or less, such as N-amber醯imino and N-o-phenylenedimino), alkoxycarbonylamino (preferably an alkoxycarbonyl group having a carbon number of 2 to 48, more preferably a carbon number of 2) An alkoxyamino group of ～24, for example, a fluorenylamino group, an ethoxylated phenylamino group, a third butoxycarbonylamino group, an octadecyloxycarbonylamino group and a cyclohexyloxy group. a carbonylamino group), an aryloxycarbonylamino group (preferably an aryloxy group amino group having a carbon number of 7 to 32, more preferably an aryloxycarbonylamino group having a carbon number of 7 to 24, for example Phenoxycarbonylamino), sulfonamide group (preferably having a carbon number of 1 to 48) More preferably, the hydrazine group is more preferably a hydrazine group having a carbon number of from 1 to 24, such as a methyl oxime amino group, a butyl hydrazine group, a phenyl continuation amine group, a hexadecanol group. Amine and cyclohexylsulfonylamino), aminesulfonylamino (preferably an amine having a carbon number of from 1 to 48, more preferably an amine having a carbon number of from 丨 to 24, continued 2012 61 201245878 The amine group 'for example is N, N-dipropylamine sulfonamide and N-ethyl-N-dodecylamine sulfonamide), azo (preferably, carbon number is 1 to 32) The azo group is more preferably an azo group having a carbon number of 1 to 24, such as a phenylazo group and a 3-pyrazolylazo group, or an alkylthio group (preferably having a carbon number of 1). More preferably, the alkylthio group is a thiol group having a carbon number of from 1 to 24, such as an anthracenylthio group, an ethylthio group, an octylthio group or a cyclohexylthio group, and an arylthio group (preferably An arylthio group having a carbon number of from 6 to 48, more preferably an arylthio group having a carbon number of from 6 to 24, such as a thiol group, or a heterocyclic thio group (preferably having a carbon number of from 1 to 32) The sulfenyl group is more preferably a heterocyclic thio group having a carbon number of 1 to 18, such as a 2-benzothiazolylthio group or a 2-pyridylthio group. 1-phenyltetrazolylthio), alkylsulfinyl (preferably an alkylsulfinyl group having a carbon number of 1 to 32, more preferably a thiol having a carbon number of 1 to 24) a sulfhydryl group (for example, a decyl group), an arylsulfinyl group (preferably an arylsulfinylene group having a carbon number of 6 to 32, more preferably a carbon number of 6 to 6) An arylsulfinyl group of 24, for example, a phenylsulfinyl group, an alkylsulfonyl group (preferably an alkylsulfonyl group having a carbon number of 1 to 48, more preferably a carbon number of 1) Alkylsulfonyl group of ~24, for example, fluorenylsulfonyl, ethylsulfonyl, propylsulfonyl, butylsulfonyl, isopropylsulfonyl, 2-ethylhexylsulfonyl , cetylsulfonyl, octylsulfonyl and %hexyl fluorenyl), aryl aryl (preferably an aryl sulfonyl group having a carbon number of 6 to 48, more preferably carbon An arylsulfonyl group of 6 to 24, for example, a phenylsulfonyl group and a 1-naphthylsulfonyl group, an aminesulfonyl group (preferably an amine having a carbon number of 32 or less) Preferred is an amine sulfhydryl group having a carbon number of 24 or less, such as an amine sulfonyl group, N,N-dipropylamine sulfonyl group, N-B. -N-dodecylamine sulfonyl, N-ethyl-N-phenylamine sulfonyl and N-cyclohexyl 62 201245878 42312pif sulfonyl), sulfo, phosphinyl (preferably a fluorenyl group having 1 to 32 carbon atoms, more preferably a phosphinium group having a carbon number of 1 to 24, such as a phenoxyphosphinyl group, an octyloxyphosphonium group or a phenylphosphonium group, and a phosphine. a mercaptoamine group (preferably a phosphinylamino group having a carbon number of 1 to 32, more preferably a phosphinylamino group having a carbon number of 1 to 24, for example, a diethoxyphosphinylamino group And dioctyloxyphosphonylamino). In the case where the above-mentioned monovalent group is a group which can be further substituted, it may be further substituted by any of the above groups. Further, in the case of having two or more substituents, the substituents may be the same or different. In the formula (I), 111 and 112, 112 and 113, 114 and 115, and 1^5 and R6 may each independently be bonded to each other to form a ring of 5 members, 6 members or 7 members. In addition, the ring formed has a saturated ring or an unsaturated ring. Examples of the saturated or unsaturated ring of the = ring include a pyrrole ring, a furan coat, a ruthenium, a ruthenium ring, a ring, a triazole pyrrolidine ring, a piperidine ring, a cyclopentene ring, and a cyclohexene. The azine ring and °_, it is difficult to P ring cycling = ring, in addition, in the case of the formation of the 5 Chang 2 „ n replaced base, can be two: Bei ring is advancing - step by 2 The substitution of more than one substituent may be different, and any of the two may be substituted. The substituents may be the same, and in the case of the heterocyclic group in the formula (1), this is... "Atom, an alkyl group, an aryl group or a sulfhydryl atom, a filament, or a carboxylic acid, a carboxylic acid group, an aryl group, an aryl group, and a carboxylic acid. An amidino group, a ureido group, a quinone imine group, an alkoxycarbonylamino group and a sulfonylamino group, more preferably a carboxy oxime amino group, a ureido group, an alkoxycarbonylamino group and a sulfonylamino group, furthermore Preferred are carboguanamine, ureido, alkoxycarbonylamino and sulfonylamino groups, particularly preferably carboguanamine and ureido groups. In the formula (I), as the above R2 and R5, preferred among the above are alkoxycarbonyl, aryloxycarbonyl, aminemethanyl, alkylsulfonyl, arylsulfonyl, nitrile. More preferably an alkoxycarbonyl group, an aryloxycarbonyl group, an amine fluorenyl group, an alkylsulfonyl group, a nitrile group, a quinone imine group and an amine oxime. Further preferred are alkoxy groups, aryloxycarbonyl groups, amine mercapto groups, nitrile groups, quinone imido groups and amine sulfonyl sulfonyl groups, particularly preferably alkoxy groups. A carbonyl group, an aryloxycarbonyl group, and an amine carbenyl group. In the formula (I), as the above R3 and R4, preferred among the above are substituted or unsubstituted alkyl, substituted or unsubstituted aryl, and substituted or unsubstituted. The cyclo group is more preferably a substituted or unsubstituted alkyl group or a substituted or unsubstituted aryl group. In the general formula (I), when R3 and R4 represent an alkyl group, the alkyl group is preferably a linear, branched or cyclic substituted or unsubstituted alkyl group having a carbon number of 1 to 12. More specifically, for example, a mercapto group, an ethyl group, a propyl group, an isopropyl group, a cyclopropyl group, a n-butyl group, an isobutyl group, a tributyl group, a % butyl group, a pentyl group, a cyclohexyl group More preferably, the carbon number is a branched or cyclic substituted or unmodified silk, and more specifically, for example, isopropyl, cyclopropyl, isobutyl, tert-butyl, a cyclobutyl group, a cyclopentyl group and a cyclohexyl group; a further step (4) is a substituted or unsubstituted alkyl group having a carbon number of the second or 64 201245878 42312pif, more specifically, for example, Propyl, cyclopropyl, isobutyl, tert-butyl, cyclobutyl and cyclohexyl. In the general formula (I), when R3 and R4 represent an aryl group, the aryl group preferably includes a substituted or unsubstituted phenyl group and a substituted or unsubstituted naphthyl group, more preferably It is a substituted or unsubstituted phenyl group. In the case where R3 and R4 represent a heterocyclic group, the heterocyclic group preferably includes a substituted or unsubstituted 2-thienyl group, a substituted or unsubstituted 4-pyridyl group, substituted or unsubstituted. Substituted 3_pyridyl, substituted or unsubstituted 2-pyridyl, substituted or unsubstituted 2-furanyl, substituted or unsubstituted 2-» dimethyl, substituted or unsubstituted Substituted 2_benzoxanthyl, substituted or unsubstituted sityl, substituted or unsubstituted 1-pyrazolyl and substituted or unsubstituted benzotriazole-yl-yl More preferably, a substituted or unsubstituted 2_thienyl group, a substituted or unsubstituted 4-pyridyl group, a substituted or unsubstituted 2-furanyl group, substituted or unsubstituted 2-pyrimidinyl and substituted or unsubstituted oxime-pyridyl. Next, a metal atom or a metal compound which forms a dipyrromethene-based metal-miscible compound will be described. The metal or metal compound may be any metal atom or metal compound which can form a complex compound, and includes any of a divalent metal atom, a divalent metal oxide, a divalent metal hydroxide or a divalent metal. Metal chloride. For example, in addition to Zn, Mg, Si, Sn, Rh, pt, Pd, Μο, Μη, Pb, Cu, Ni, Co, Fe' B, etc., 'Ara, Ιηα, Fea, TiCl2, SnCl2, SiCl2, GeCl2, etc. are also included. Metal chloride, metal oxide such as Ti〇 or v〇, metal hydroxide such as Si(OH)2. 65 201245878 From the viewpoints of stability, spectroscopic characteristics, heat resistance, light resistance, and manufacturing suitability of self-aligned compounds, the preferred ones are Fe, Zn, Mg, Si, Pt, Pd, Mo, Μη, Cu, Ni, Co, TiO, B or VO, more preferably Fe, Zn, Mg, Si, Pt, Pd, Cu, Ni, Co, B or VO, most preferably Fe, Zn, Cu, Co, B or VO (V=0). Particularly preferred among these are Zn. The dipyrromethene-based metal-doped compound in which the compound represented by the above formula (I) is bonded to a metal atom or a metal compound is preferably as follows. That is, 'the following can be cited: in the general formula (j), 'R1 and R6 each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, a heterocyclic group, a decyl group, a hydroxyl group, a cyano group, an alkoxy group. Alkyl, aryloxy, heterocyclic oxy, fluorenyl, alkoxycarbonyl, aminyl, amine, anilino, heterocyclic amine, carboxamide, ureido, quinone, alkoxy Carbocarbonylamino, aryloxycarbonylamino, sulfonylamino, azo, alkylthio, arylthio, heterocyclic thio, alkyl thiol, aryl sulfhydryl or phosphinium amide And R 2 and R 5 each independently represent a hydrogen atom, a halogen atom, a alkyl group, an alkenyl group, an aryl group, a heterocyclic group, a trans group, a cyano group, an an alkoxy group, an alkoxy group, an aryloxy group, a heterocyclic oxy group, Mercapto, alkoxycarbonyl, aryloxycarbonyl, amidino, quinone imine, alkoxyalkylamino, amidino, azo, thiol, arylthio, heterocycle a thio group, an alkylsulfonyl group, an arylsulfonyl group or an amine sulfonyl group, and R3 and R4 each independently represent a halogen atom, a halogen atom, a alkyl group, an alkenyl group, an aryl group, a heterocyclic group, a decyl group, or a hydroxy group. , cyano group, Oxyl, aryloxy, heterocyclic, fluorenyl, alkoxycarbonyl, aminyl, anilino, carboxy oxime, ureido, quinone, alkoxycarbonyl, sulfonium Amine, azo, 66 201245878 42312pif alkylthio, arylthio, heterocyclic thio, alkylsulfonyl, arylsulfonyl, sulfonyl or phosphinylamino, R7 represents a hydrogen atom A halogen atom, an alkyl group, an aryl group or a heterocyclic group, a metal atom or a metal compound means a state of Zn, Mg, Si, Pt, Pd, Mo, Mn, Cu, Ni, Co, TiO, B or ν〇. A more preferred aspect of the dipyrylene fluorene based metal complex compound is shown below. That is, in the above formula (1;), R1 and R6 each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, a heterocyclic group, a cyano group, a aryl group, and a calcination group. Oxyl group, amine mercapto group, amine group, heterocyclic amine group, carboxylammonium group, ureido group, oxime imido group, alkoxycarbonylamino group, aryloxycarbonylamino group, benzylamino group, An azo group, an alkyl group fluorenyl group, an aryl sulfonyl group or a phosphinium group, and R 2 and R 5 each independently represent an alkyl group, an alkenyl group, an aryl group, a heterocyclic group, a cyano group, a nitro group, a fluorenyl group, The alkoxycarbonyl group, the aryloxycarbonyl group, the amine carbenyl group, the oxime imido group, the alkylsulfonyl group, the arylsulfonyl group or the aminesulfonyl group 'R and R each independently represent a hydrogen atom, a pyridyl group, Alkenyl, aryl, heterocyclyl, cyano, fluorenyl, alkoxy group, amine carbhydryl, atomic amine, ureido, oxime imido, alkoxycarbonylamino, sulfonamide a group, a thiol group, an aryl fluorenyl group, a heterocyclic thio group, a decyl group, an aryl group or an amine group, and R 7 represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group or a heterocyclic group. Metal atom or metal compound means Zn Mg, Si, Pt, Pd, Cu, Ni, Co, B, or aspects of VO. The preferred separation of the bis-pyrylene-based metal-based compound obtained by disposing the compound represented by the general formula (I) on a metal atom or a metal compound is the following general formula (1-1). A compound represented by the formula (1-2) and the formula 3·3). 67 201245878 1厶j i厶μϋ [Chem. 43] General formula (1-1)

R5 (In the formula (1-1), R1, R2, R3, R4, R5 and R6 each independently represent a hydrogen atom or a substituent. R7 represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group or a heterocyclic ring. Ma represents a metal atom or a metal compound, X1 represents a group which can be bonded to Ma, and X2 represents a group necessary for neutralizing the charge of Mai. Further, X1 and X2 may be bonded to each other to form a 5 member, 6 Ring of a member or a member of the staff.) R1 to R6 in the formula (1-1) are synonymous with R1 to R6 in the formula (I), and preferred embodiments are also the same. In the general formula (1-1), Ma represents a metal atom or a metal compound, and a metal atom or a complex compound in which the compound represented by the general formula (I) is bonded to a metal atom or a metal compound or Metal compounds are synonymous and their preferred ranges are also the same. R7 in the formula (1-1) is synonymous with R7 in the formula (I), and preferred embodiments are also the same. X1 in the general formula (1-1) may be any group which may be bonded to Ma, and may be any of the following compounds: water, alcohols (for example, methanol, ethanol, and propanol). )#, and "Metal Meal" [1] Sakaguchi Takeshi, Ueno Jingping (1995 Nanjiang Hall), "Metal Chelate" [2] (Na Nian), "Metal Chelate" [3] (1997) and the compounds described in the above. Among them, in terms of manufacturing, water, a compound, an alcohol, an amine compound, and a guanamine compound are preferred, and water, a compound, and a chiral alkalization of X2 in the formula (1-1) are more preferred. The base "which is necessary for neutralizing the charge of ruthenium" means, for example, a halogen atom (for example, a fluorine atom, a chloro group, or an aliphatic quinone imide (for example, aresine, maleimide, etc.) The valerian imine, the diethylamine or the like is preferably a valence group derived from an aromatic quinone imine or a heterocyclic quinone imide (for example, phthalic acid is exemplified). Formammine, naphthylimine, odorous phthalimide, 4-methylphthalimide, 4-nitro-n-methylimine, naphthylcarboxyl The amine and tetrabromophthalimide are preferably exemplified by the valence group of o-phenylenediamine, 4_glycol-o-phenyl phthalimide, and derived from an aromatic group. Examples thereof include benzoic acid, 2-methoxybenzoic acid, 3-methoxybenzoic acid, 41 methoxy alum acid, 4-chlorobenzoic acid, 2-cainic acid, salicylic acid, and (4) monooxyl group. Clumsy acid, 4·heptane Benzoic acid and 4_third τ-based succinic acid '-one, preferably benzoic acid, 4- methoxy benzoic acid and salicylic acid, etc., are derived from aliphatic tetamine (for example, Citrate, acetic acid, methacrylic acid, acetic acid, propionic acid, lactic acid, pivalic acid, hexyl 2-ethylhexanoic acid, neodecanoic acid, dodecanoic acid, myristic acid, palmitic acid, 'fat 69 201245878: τ心J up农4 酉^,, oleic acid, isostearic acid, 2_hexadecyl octadecanoic acid, 2_hexyl decanoic acid, citric acid, cyclohexyl ketone, 5 _ borneol thin _2_曱Acid and bromine, etc., preferably exemplified by acetic acid, methacrylic acid, lactic acid, pivalic acid, 2-ethylhexanoic acid, stearic acid, etc., derived from a dithiol group Formic acid = one valent group such as dimethyldithiocarbamic acid, diethyldithioaminocarbamidine and one-block dithiocarbamic acid, derived from a hydrazine amine (for example, Listed as phenyl lysine, 4 _ phenyl phenylamine, 4- oxy phenyl mineral amide, 4 - methyl phenyl lysine, 2 - methyl benzyl amine and thiol amine One can list the price of phenyl _ and methyl bisamine , source, clever job (for example, exemplified by acetamidine, octanoyl (tetra) acid, and benzoiso-acid), derived from a nitrogen-containing ring compound (exemplified by B, 1H5-ethoxyl) B, urea, propyl carbendazim, 5,5-diphenylethylene carbazide, 5,5-dimethyl-2,4 · oxazolidine dioxime, barbituric acid, Imidazole, pyrazole, 4,5-dicyanoimidazole, 4 5 dimercaptoimidazole, benzopyrene, 1H+ sit-4,5-dioxalic acid, etc. 5-5-ethoxyethyl urea, 5,5-dimethyl ketone, oxadipine, 4,5-dicyanoimidazole, 1H-imidazole _4,5-dicarboxylic acid diethyl ester The basis of a price. Among them, from the viewpoint of production, preferred are money atom, fat, acid-lowering group, aromatic carboxylic acid group, aliphatic quinone imine group, aromatic acid group and nitrogen-containing ring compound, and more preferably miscellaneous , an aromatic quinone imine group and a nitrogen-containing ring compound. The enthalpy and X2 in the general formula (1-1) may be bonded to each other to form a ring of 5 members, 6 members or 7 members together with Ma. The ring of the 5, 6 and 7 members formed may be a saturated ring or an unsaturated ring. Further, 201245878 1厶J 1 JLyif of 5 members, 6 members, and 7 members may contain only carbon atoms and hydrogen atoms, and may be a heterocyclic ring having at least one atom selected from a nitrogen atom, an oxygen atom, and a sulfur atom. General formula (1-2)

In the above formula (1-2), R1, R2, R5, r6, R8, R, R, R, R and R13 each independently represent a hydrogen atom or a substituent. R and R 4 each independently represent a hydrogen atom, a halogen atom, a alkyl group, an aryl group or a heterocyclic group. Ma represents a metal atom or a metal compound. R1 to R6 in the formula (1-2) are synonymous with r1 to r6 in the formula (1), and preferred embodiments are also the same. The substituent represented by R8 to R13 in the formula (1-2) is synonymous with the substituent represented by R1 to R6 of the compound represented by the formula (1), and preferably has the same sadness. When the substituent represented by R8 to r13 of the compound represented by the formula (1-2) is a group which may be further substituted, it may be substituted by any of the substituents R described above, and may be substituted by two or more. In the case where the substituent is substituted, the substituents may be the same or different. 71 201245878 ι^, μιι R7 in the formula (1-2) is synonymous with R7 in the formula (I), and preferred embodiments are also the same. R14 in the formula (1-2) represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group or a heterocyclic group, and a preferred range of R14 is the same as the preferred range of the above R7. In the case where R14 is a group which may be further substituted, it may be substituted by any of the substituents R described above, and when substituted by two or more substituents, the substituents may be the same or different. In the formula (1-2), Ma represents a metal atom or a metal in which a metal or a metal compound is complexed with a compound represented by the formula (I) on a metal atom or a metal compound. The compounds are synonymous and their preferred ranges are also the same. R8 and R9, R9 and R10, Rii and Ri2, and R12 and R13 in the formula (1-2) may each independently bond to each other to form a saturated or unsaturated ring of 5 members, 6 members or 7 members. The saturated or unsaturated ring formed is synonymous with a saturated or unsaturated ring formed by R1 and R2, R2 and R3, R4 and R5, and R5 and R6, and preferred examples are also the same. General formula (1-3)

72 201245878 4ZJlZpif In the above formula (1-3), R 2 , R 3 , 尺 4 and r 5 each independently represent a hydrogen atom or a substituent, and R 7 represents a halogen atom, a halogen atom, an alkyl group, an aryl group or a heterocyclic group. . R8 and R9 each independently represent an alkyl group, a dilute group, an aryl group, a hetero-based group, an alkoxy group, an aryloxy group, an alkylamino group, an arylamino group or a heterocyclic amine group. ]Via represents a metal atom or a metal compound. X3 and X4 each independently represent NRa (Ra represents a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, a heterocyclic group, a fluorenyl group, an alkylsulfonyl group or an arylsulfonyl group), an oxygen atom or a sulfur atom. Y1 and Y2 each independently represent NRb (Rb represents a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, a heterocyclic group, a fluorenyl group, an alkylsulfonyl group or an arylsulfonyl group), an oxygen atom, a sulfur atom or a carbon. atom. X5 represents a group which can be bonded to Ma, and a represents 〇, 1 or 2. R8 and Y1 can also be bonded to each other to form a ring of 5, 6 or 7 members. R9 and Y2 can also be bonded to each other to form a ring of 5, 6 or 7 members. Further, r2 to R1 R7 in the formula (1-3) are the same as those in the formula (1) in which r2 to R5 and R7 are synonymous. In the formula (1-3), Ma represents a metal or a metal compound, and a metal atom or a metal compound in a complex compound in which the compound represented by the formula (I) is bonded to a metal atom or a metal compound is synonymous. The preferred range is also the same. In the formula (1-3), R8 and R9 each independently represent an alkyl group (preferably a linear, branched or cyclic alkyl group having a carbon number of 1 to 36, more preferably 1 to 12). a straight chain, a branched chain or a cyclic alkyl group, for example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert-butyl, hexyl, 73 201245878 2-ethylhexyl, Dodecyl, cyclopropyl, cyclopentyl, cyclohexyl and adamantyl), alkenyl (preferably an alkenyl group having 2 to 24 carbon atoms, more preferably an alkenyl group of 2 to 12). For example, a vinyl group, an allyl group and a 3 butylene group, an aryl group (preferably an aryl group having a carbon number of 6 to 36, more preferably an aryl group of 6 to 18, such as a phenyl group and Naphthyl), heterocyclic group (preferably a heterocyclic group having a carbon number of 24, more preferably a heterocyclic group of 丨~12, such as 2 thienyl, 4-pyridyl, 2-furyl, 2 a pyrimidinyl group, a pyridyl group, a 2-benzothiazolyl group, a 1-imidazolyl group, a 1-pyrazolyl group, and a benzotriazole group, an alkoxy group (preferably a carbonaceous gas having a carbon number of 1 to 36) More preferably, the alkoxy group of the group 18 is, for example, a methoxy group, an ethoxy group or a propoxy group. More preferably, an oxy group, a hexyloxy group, a 2-ethylhexyloxy group, a dodecyloxy group and a cyclohexyloxy group, and an aryloxy group (preferably an aryloxy group having a carbon number of 6 to 2') An aryloxy group of the group 18, for example, a phenoxy group and a naphthyloxy group, an alkylamino group (preferably an alkylamine group having a carbon number of 丨36), preferably an alkylamine group of 疋1 to 18 , for example, a mercaptoamine group, an ethylamino group, a propylamino group, a butylamino group, a hexylamino group, a 2-ethylhexylamino group; an isopropylamino group, a tert-butylamino group, Third octylamino group, cyclohexylamino group, N'N-ethylamino group, N,N-dipropylamino group, n,N-dibutylamino group and methyl-N-ethylamine And an arylamine group (preferably having a carbon number of 6 to 9% of an arylamine group, more preferably an arylamine group of 6 to 18, such as a phenylamine di, a naphthylamino group, or a N , N-diphenylamino group and N-ethyl-N-phenylamino group), heterocyclic amine group (preferably a heterocyclic amine group having a carbon number of 1 to 24, more preferably 疋1 to 12) The heterocyclic amino group is, for example, a 2-amino group pi-l- yl, a 3-amino-indenyl group, a 2-aminopyridyl group, and a 3-aminopyridinyl group. In the formula U-3), as defined by alkyl, alkenyl, 74 201245878 4ZM2pif aryl, heterocyclic, alkoxy, aryloxy, alkylamino, arylamine or hetero When the cyclic amino group is a group which may be further substituted, it may be substituted by any of the substituents R when it is substituted by two or more substituents, and the substituents may be the same or different. In the formula (1-3), X3 and X4 each independently represent an NRa, an oxygen atom or a sulfur atom. Ra represents a hydrogen atom, an alkyl group (preferably a linear, branched or cyclic alkyl group having a carbon number of 1 to 36, more preferably a linear, branched or cyclic alkyl group of ι 12). , for example, anthracenyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert-butyl, hexyl, 2-ethylhexyl, dodecyl, cyclopropyl, cyclopentyl, ring Hexyl and oxime-adamantyl), alkenyl (preferably an alkenyl group having 2 to 24 carbon atoms, more preferably an alkenyl group of 2 to 12, = vinyl, allyl and 3-butyl) Alkenyl), aryl (preferably an aryl group having 6 to 36 carbon atoms, more preferably an aryl group of 6 to 18, such as a strepyl and naphthyl group), or a heterocyclic group (preferably a carbon) The number is a heterocyclic group of 丨~24, more preferably a heterocyclic group of 1 to 12, such as a 2-thienyl group, a 4-pyridyl group, a fluorenylfuranyl group, a 2-pyrimidinyl group, a pyridyl group, and a 2 stupid group. And a thiazolyl group, an imidazolyl group, a succinyl group, a benzotrisyl group, a fluorenyl group (preferably, a carbon number of 1^24 = a fluorenyl group is preferably a fluorenyl group of 2 to 18), for example, an acetamidine group. Base, special amylose - ethylhexyl, alum, and cyclohexyl), alkylsulfonyl is preferred The number is 1 to 24 filaments, more preferably is 18 methylsulfonyl, ethylsulfonyl, isopropylsulfonyl: dimercapto) and silky light base (more than (10) is 6 carbon atoms ~ Benzene is 6 to 18 of the aryl base of the base 'for example, soil only" soil is not, base sulfonyl group). Moreover, R a substitution may be occasional 75 201245878, 'can also be stepped into the base Substituted, in the case of being substituted by a plurality of substituents; the opening/time, the substituents may be the same or different. 4 χ3 and χ4 are preferably each independently an oxygen atom or a sulfur atom, X3 and X. Preferably, in the formula (1-3), γ1 and Υ2 each independently represent NRb, a sulfur atom or a 1-carbon original f, and Rb is synonymous with Ra in the oxime 3. Y1 and Y2 are preferred. It is independent of the brain (Rb is a hydrogen atom or a carbon number of 1 to 8). V and γ2 are both excellent NH. * In the general formula (1-3), 圮 and γι can also Mutual bonding, κ8, γ1 &amp; carbon atoms s form the same five-membered king 裒 (such as cyclopentanone, 派定定, tetrahydrogenate 南南, oxy pentyl tetrahydro porphin, η bil, biting, sighing , 吲哚, benzophene, benzophene), 6 members Ring (such as ring hexane burning ★ Ding, material, lin, tetrahydrofuran, diwei, vulcanized cyclopentane, diwei, benzene, money, Niang sniffing, linazine, phlegm and Bao Lin) &lt; 7 a member ring (for example, cycloheptyl imine). * In the general formula (1-3), R9 and γ2 may also be bonded to each other, and r9, y2 and a broken atom form a ring of 5, 6 or 7 members. The ring of the 5 member, the 6 member, and the 7 member formed may be a ring in which one of the bonds formed by the r8, y1, and a carbon atom is changed to a double bond. In the formula (I·3) When R8 and Y1 and R9 and Y2 are bonded to each other, the ring of 5 members, 6 members and 7 members is a ring which can be further substituted, and may be substituted by the group described in any of the substituents R. When the substituent is substituted by two or more substituents, the substituents may be the same or different. In the formula (1-3), hydrazine 5 represents a group which can be bonded to the genus &amp; and can be exemplified by 76 201245878 42312pif which is the same as the oxime 2 in the above formula (M). a indicates 〇, 1 or 2. Preferred aspects of the compound represented by the formula (/-3) are shown below. That is, 'R2 to R5, R7 and stealing respectively contain a preferred form of a compound of a metal atom or a metal compound represented by the formula (1), and each of X3 and X4 is represented by NRa (Ra is a hydrogen atom, an alkane And heterocyclic groups) or oxygen atoms Y and γ2 are each independently NRb (Rb is a gas atom or a burnt group), nitrogen is 8 atoms ^ carbon atom, (4) is a subunit of a money, R and -R are independent The ground represents an alkyl group, an aryl group, a heterocyclic group, an alkoxy group or a 9-amine amine f' or R8 and γ1 are bonded to each other to form a 5-member or 6-membered ring, and ^ and Υ are bonded to each other to form a 5-member, 6-member. The ring of the member, a indicates the aspect of 〇 or 丄. The better aspect of the compound of the wire of $ (1_3) is as follows. The two R7 and the other include the atom or metal compound represented by the formula (Ι). Compared with the slave state, the sheep/horse oxygen atom 'γ1 is ΝΗ, γ2 is nitrogen atom, and X5 is the group bonded via oxo 1 'R8 and R9 respectively represent silk, = soil ', % base, alkoxy or alkyl amine group, 8 , = form a 5 or 6 member ring, R9 #Y2 is bonded to each other to form 夂, 6 坏 bad 'a indicates the aspect. Expression represented by formula (1) The compound of the formula (1)), the formula (5)) and the formula (1)) in which the compound is located on a metal atom or a compound is a compound of the formula (1)) The compound represented by the above-mentioned compound (I) is represented by a metal atom or a metal compound, which is represented by the above formula (I) used in the present invention. Specific examples of the above-mentioned two α ratio σ each of the fluorene-based metal-based compound compounds. However, the present invention is not limited to these specific examples. [Chem. 46] 78 201245878 HZJ lzpif

Illustrative compound Rm R1W X101 M1 1 ^-〇·ν}&quot;Μθ IBu Me —0*^J*Me 〇Zn 2 ι·Βν_ ^〇·-〇~Μβ t-8u One OQt-Bu 0 2n 3 t- Bu t-Bu~ ¥ Zn 4 t-Bu ° t-Bu^ &lt;} -3⁄4 Zn 5 t-Bu t-Bu factory ~Ώ -og-(cH2)1Bai3 o Zn 6 t-Bu ~g-0- /~V-Me ° t-Bu^ O —t-Bu —Op-Mo 0 Zn 7 t-Bu t-Bu 〇-t-8u -\〇0 Zn β t-Bu -ς-0-^^- Μβ l&quot;Bu厂—t-Bu -NlyAph Zn 9 t-Bu ^•〇K3~Me t-Bu -o 义-CHi^n-Bu —Op-Mo 〇Zn 10 t-Bu t-Bu factory~o X -CHz n-Bu pull o Zn [Chem. 47] 79 201245878 Exemplary compound R101 R102 R103 X101 M1 11 t-Bu t-Βυ o ^〇&quot;Me —〇-ζ-Μθ 0 Zn 12 t-Bu -Q- 〇-/~Vm0 t*Bu~ ~o Me ~〇·μθ -y〇Zn 13 t-Bu \Z/ Me t-Bu o Μβ^ Me -〇-§, Zn 14 t-Bu ° t-Bu - o ¥ O Zn 15 t-Bu t-6u o Me Me -^Vcn Zn 16 t-Bu Factory o Me —O-^J-Μθ Zn 17 trBU t-Bu o Me MeEx Me ~vo Zn 1Θ t-Bu \rB\lo Me 0 Zn 1Θ t-Bu t-Bu o Me plant~0-ζ·Μθ 0 Zn 20 t-Bu —y—Me t-Bu o -v〇Zn [Chem. 48] 80 201245878 42312pif exemplified compound R101 R102 Rm X M1 21 Me MeO OMe ~^Q -〇-9-〇Cu 22 0 —Et —*Me -〇-G-〇-ct Fe 23 _9-〇Ό Ο —i-Pr —Et -s-ς-Ηρ* S Et Ni 24 —I-Pr Co 25 —^-NHEt 0 Me -Q Me Me -〇-ς-〇Q , ___/ Cr 26 -o Γ ch3 o Zn 27 -fiVe 0 0 &quot;&quot;&quot; /=\ -〇-g&lt;3 Zn 28 —-CN Zn 29 !K ~ν/·Μθ M厂~O~丨·^ -VO-B, 0 Zn 30 \〇〇-V^Me 0 Zn [化49] 81 201245878

[化 50] 82 201245878 42312pif

[化 51] 83 201245878

In the example compound of the dipyrromethene-based metal-based compound compound in which the compound represented by the formula (1) is bonded to a metal atom or a gold compound, the exemplified compound (40) to the exemplified compound (44) Further, it is an exemplified compound of the formula (1-1), and the exemplified compound (45) is also an exemplified compound of the formula, and the exemplified compound of the formula (1) to the exemplified compound (39). In addition to the above-exemplified compounds, examples of the dipyrrolidinium-based metal-doped compound in which the compound represented by the following formula (I) is coordinated to a metal atom or a metal compound can also be exemplified: The exemplified compound (Ia_3) to the example compound (la-83), the tf compound (la-1), the exemplified person (IIa-20), and the exemplified compound (1-1) are disclosed in JP-A-2008-292970. ~ exemplified compound (136) exemplified 84 201245878 J 1 z, pif compound (II-1) ~ exemplified compound (II-ll) and exemplified compound (III-1) - exemplified compound (111-103), Japanese Patent No. 3324279 The exemplified compound (1-1) to the exemplified compound (1-35), and the exemplified compound (1-1) to the exemplified compound (1-13) described in Japanese Patent No. 3279035, Japanese Patent Laid-Open No. 11 Illustrative compound (2-1) to exemplified compound (2-32), exemplified compound (3-1) to exemplified compound (3-32), and exemplified compound (4-1) to exemplified compound (4-26) and exemplified compound (5-1) to exemplified compound (5-26) The exemplified compound (1-1) to the exemplified compound (1-6) and the exemplified compound (VII-1) to the exemplified compound (VII-8) described in Japanese Patent Publication No. 2005-77953, Japanese Patent Laid-Open No. Hei 11- Illustrative compound (1-1) to exemplified compound (1-45) described in Japanese Patent Publication No. 352686, and the exemplified compound (M) to exemplified compound (1-50) described in JP-A-2000-19729, The exemplified compound (1-1) to the exemplified compound (1-45) described in Japanese Laid-Open Patent Publication No. Hei 11-352685. [化52] 85 201245878

[化53] 86 201245878 42312pif

(Triarylmethane system [Chem. 54] 87 201245878

Person [化55]

[化56] 88 201245878 4Z312pif

(dibenzopyran) [Chem. 57] 89 201245878

So2nh-r

So2nh-r

90 201245878 42312pif (酉大菁系) [化58]

Exemplary compound Rs — A-1 —η —B u A-2 —CaH«S 02N HB u A — 3 ~CH,CONHB u A — 4 ~CaHaOPh A _ 5 —CH8CONP h A — 6 —CH,CON (Bu ) 2

In the abbreviations of the following compounds, Pc represents a phthalocyanine nucleus, Zn represents a central metal, and Pc is followed by a substituent which substitutes for the α position, and after the substituent substituted for the α position, the ρ position is indicated. Substituted substituents represent substituents that do not depend on the position of the substitution. χ and y are positive numbers in which the number of substitutions becomes a positive number of 0 or more. 91 201245878 i ^yn [ZnPc-|a-(4-COOC2HAOCH3&gt;CeH4〇K, liS-U-COOCahUOCHjCehUOl&amp;e-xHo.eCl"]] [ZnPc-la-W-COOCahUOCHWCehUOL ta — ( 2, e-ClJCeHsSL. [y3-&lt;4—COOC2H4OCH3)CeH4 OI2. 88-*t^ &quot;&quot;(2, 6 —CI2)C6HaS)0i 72-y. H) eCl1O&lt;0] • [ZnPc -Ια —(4-00002ΗΑΟΟΗ3&gt;ΟβΗ4〇|,. {召-U-COOCzhUOCHaJiV^Ola.e-^, (彡一Ν〇2)αεΗ0.β Chi. 4] • [2 mouth (.32吣.2 ) -4- (4-〇〇〇〇九〇). 八〇] binding, 彳卜 (4-. 〇〇^4〇. Called. 04〇13.8_/〇^^ • [2η(〇3Ζ. 8Ν0)-[α-(4-ΟΟΟΟ2Η4ΟΟΗ3)ΟοΗ4〇]„ 1^-(4-000^400^)^^0)3.8-^,.201^.,,] • [Zn&lt;C32.8Ne)- -|α-(4-00002^00^)06^0),, I β-(4-COOC2H4OCH3)CeH4〇l 3. β-χΗ〇. aCln. 4Br ο. 4] • [ΖηΡο-Ια-14 -00〇02Η4ΟΟΗ8)ΟβΗΛ0)χ, (^ - C4-C00C2H40CH3)C6H40}3. θ_,. (β TMΝΗ2)〇. 2Η〇. β Cln. 4Ι • [ZnPc-t£y-(4-COOCzH4〇 CH3)CeH4〇)^ {j8-(4-00002«4〇^3)〇6^0}3. 8-χ. (5-〇H)〇. 2H〇. eC *11. • [ZnP〇- La-(4-COOCaH4〇CH3)CeH40]„ [)S-(4-COOCzH4OCH 3) CeHaOJ3.a_x. (-C(CH3)3)0i z eCI.· J , •[ZnPc-itf-M-COOCshUOChVCeH^Ol,, Ij^-W—COOCaHaOCHyCeHftOia.e-AHc^Cln.e] • T2n(C32N8.08)-(^-(4-0000^00^)0^0]^ [)5-(4-C00C2H40CH3)CeH40)3, ^Ho.oeCI-n. θθ3 • [ZnP〇-la -(4-COOC2H4OCH3)CeH4〇lx, {i-(4-COOC2H4OCH3)CflH4OJa. θ_ΛΗ〇. 8Fn. 4] • [ZnPc-a-((CH3CH(OCH3)CaHe〇〇C)C2H4Sj0.z,U- (4-COOC^H4OCH3)CeH4〇h, l彡一(4-COO C2H*OCH3)CeH4OJ3. e-.Ho. eCU,. 4] .[ZnPcH〇f-(4-SCV^hOCHeCe^Oh. le -W-SCW^OCHyCeHUOlanHuCI"]] -[ΖηΡ〇-1α-(4-ΟΟΟΟΗ3)06Η4〇1Λ. M -C4-COOCH3)CeH4〇U.7-*Ho.0CV6] • [ZnPc-1α-U- COOCaKtOCHjCeHaO},. 13-(4-COOC2H4OCH3)CeHU〇k2S"H0·eCln2.92] -[ΖηΡο-1 flf -(4-C00C2H40CH3)C6H40}x. {j8 -(4-C00C2H40CH3)CeH40} v BC\ ,A_ w] -[ΖηΡ〇-{α-(4-〇ΟΟΟ2Η40Χ:Η3)〇βΗ4〇)^ t ar-(Z-〇CHA-4-COOC2HAOCH3)CeHaO}yt (,9-(4-0 OOCzHAOHjCeK ^Olujj~丨eU-OCHs-A-COOCW^CHjCeHaOU.ee-yHs^Chos:]

-[ZnPc-1 a - (2-CO〇C2H4OCH3)C10H8-6-〇}x, {J5 - (2~0ΟΟ02Η^Ο0Η3) €10Η8-6-Ο)3, „_XH0. eCI 11. 4] • [ZnPcHa«(4-C00C2H40CH3>CeH40}x,i〇r-(4-CN)CeH4O]0.M. A COOC2hU〇CH3)CeH4 〇U,〇4-»Hi 88Cle. .iZnPc-|a-( 4-COOC2H«OCH3)CeH4OJM. t〇f-(2-CeHs)CeH4〇ly,[j8-(4-COOC2H4OCH3)CeH4 〇U.42-»· Iβ _(2—CeH8>CeHe〇l0,3a_vH〇 , eCl", Λ] . [ZnPc-|ci~~(4-COOC2H4OCH3)CeH4〇l·. UU-COOCHjCehUSlr |jS-(4-COOCaHflOCH3)Ce H4〇)3. 〇4-*. i ί -C2 -COOCH3)CeH4Sj〇. 7e_rH〇, eCl,,. 4] .[2nPc-|〇f-(4_COOC2H4OCH3)CeH4〇h. {0r-(4-OCH3)CeH4O|y. |^»(4- COOC2H4OCH3&gt;C^U 〇la_ «2-»,l Θ _(4 — OCH3>CeH4〇J〇. 33-vH〇. a.·”. 4] • [ΖηΡ〇-Ια~(4-00〇α8Η4 〇〇Η3) ΟβΗ4〇Ι,. (a-(2-C(CH3)3)CeHa〇]v, |β ~(4-COOC2H4OCH3)CB h4〇)3 .42—*· {i-(2- C(CH3)3)CeH40]0,38-yH〇. 8Cln.a]

• [2nPc-[〇f-(4-COOC2HeOCH3)C6HAOJ„ { a - (3-COOC2HB)C6H4〇iy, {β-(4-CO〇C2H^OCH3)C 6H40)a. 6β-κ* — ( 3—COOC2HB)CeH4〇i 1, i*-yH〇«Cln. dl •[ZnPc-|&lt;V-(4-COOC2H4OCH3)CeH4〇Ua-C0H5〇}r [β—U-COOCshUOCHdCeH^Olve-JjS —CeHs〇l〇. aBri.j^CI” 32] (蒽S Kun) [化60] 92 201245878 42312pif

^ CjHs ^cHa)^00^ 丨-娜

(Organic solvent) The photosensitive resin composition of the present invention may contain an organic solvent. If the organic solvent satisfies the solubility of the coexisting components or the coating property when the photosensitive resin composition is formed, there is basically no particular limitation. 93 201245878=Specially consider the rotation of the solid matter, coating For the cloth and safety, the solvent is selected, and the vinegar may, for example, be ethyl acetate, n-butyl acetate, valeric acid acetate, isovaleric acid acetate, isobutyl vinegar acetate, ortholactic acid, '76§ , butyl acetonate, lactic acid methyl ketone, r 醅r dialkyl acetate alkyl oxime (for example, oxidized acetate acetate, oxidized, methyl oxyacetate § 1 (specifically, methoxy methoxyacetate) Ethyl acetate, methoxyacetic acid, ethoxyacetic acid, acetic acid, acetic acid, acetic acid, acetic acid, acetic acid, acetic acid, acetic acid, acetic acid, acetic acid, acetic acid, acetic acid, acetic acid, acetic acid, acetic acid 2_oxy-2_methylpropionic acid methyl, 2_oxy-2•methylpropionic acid='-propyl- vinegar, pyruvic acid (10), acetone acetoacetate, acetoacetic acid: hydrazine, acetic acid Vinegar, 2-oxo-oxybutyric acid, and g-butoxybutyric acid, vinegar, etc. One. For example, the dikes can be exemplified by diethylene glycol diphthene and tetrahydrogen. Fulan, B "alcohol monoterpene, ethylene glycol monoethyl _, thiocarbazone acetic acid brewing (8) mail cell (10) lve acetate), ethyl celecoxib acetate vinegar (coffee cdi e e acetate), - ethylene glycol Monomethyl ether, diethylene glycol mono(10), diethylene glycol monobutyl ether, propanol monohydric sulfonate, propylene glycol monoacetic acid, propylene glycol monoethyl ether acetate, and propylene glycol monopropyl ether acetate. Examples thereof include methyl ethyl ketone, cyclohexanone, 2-heptanone, and 3-heptanone. Examples of the scented saponins include fluorene, xylene, and the like. The solubility and the inclusion of each component are described. In the case of a soluble binder, it is preferable to mix two or more kinds of organics from the viewpoints of solubility and improvement of a coating surface. In this case, it is particularly preferable to include 94 201245878 4Z312pif as follows. Two or more mixed solutions: methyl 3-ethoxypropionate, ethyl 3-methoxypropionate, ethyl celecoxib acetate, ethyl lactate, diethylene glycol dimer, butyl acetate , 3_Methoxypropionic acid methyl ester, 2_gg_, ring I 5 carbitol acetate, butyl carbitol acetate (Butylcarbit〇lacetate), propylene glycol and propan-A turn

Acid acetate. The content of the T^organic gluten in the photosensitive resin composition is preferably reduced in light, and the concentration of all the solids in the resin composition is 10% by mass to 5% by mass, more preferably 15% by mass. %~60 quality. /. The amount. (Surfactant) The photosensitive resin composition of the present invention may further contain a surfactant. As the surfactant, any of anionic, cationic, nonionic or amphoteric can be used. A preferred surfactant is a nonionic surfactant. Specifically, a nonionic surfactant described in Paragraph No. 005 8 of JP-A-2009-098616 is preferred, and a fluorine-based surfactant is preferred. Other surfactants which can be used in the present invention include, for example, Megafac F142D, Megafac F172, Megafac F173, Megafac F176, Megafac F177, Megafac F183, Megafac F479, Megafac F482, Megafac F554, Megafac F780, Megafac, which are commercially available products. F781, Megafac F781-F, Megafac R30, Megafac R08, Megafac F-472SF ' Megafac BL20 ' Megafac R-61 ' Megafac R-90 (manufactured by DIC Corporation), Fluorad FC-135, Fluorad FC-170C, Fluorad FC -430, Fluorad FC-431, Novec FC-4430 95 201245878 (manufactured by Sumitomo 3M Co., Ltd.), Asahi Guard AG7105, 7000, 950, 7600, Surflon S-112, Surflon S-113, Surflon S-131, Surflon S -141, Surflon S-145, Surflon S-382, Surflon SC-101, Surflon SC-102, Surflon SC-103, Surflon SC-104, Surflon SC-105, Surflon SC·106 (manufactured by Asahi Glass Co., Ltd.), Eftop EF351, Eftop 352, Eftop 801, Eftop 802 (manufactured by Mitsubishi Materials Electronic Co., Ltd.), Ftergent 250 (manufactured by Neos Co., Ltd.), etc. Further, examples of the surfactant include a copolymer comprising a structural unit A and a structural unit B represented by the following formula (W), and a tetrahydrofuran as a solvent and a gel. The polystyrene-equivalent weight average molecular weight (Mw) measured by dialysis chromatography was 1,000 to 1 Torr. Structural Unit A Structural Unit B R3!

(In the formula (W), R1 and R3 each independently represent a hydrogen atom or a methyl group, and R2 represents a linear extended alkyl group of 1 to 4 of the ruthenium. R4 represents a hydrogen atom or a fluorenyl group having a carbon number of 1 to 4. , L represents an alkylene group having a carbon number of 3 to fluorene, p and q are percentages by weight of the polymerization ratio, and P is a value of 1 〇% by weight to 8 〇 weight 〇/〇, q表禾2〇weight°/q A value of ～90% by weight, Γ represents an integer of 1 to 18 96 201245878 HZJlZpif, and η represents an integer of 1 to 1 。.) The L is preferably a branched alkyl group represented by the following formula (W_2). R5 in the formula (W-2) represents an alkyl group having a carbon number of i to 4, and is preferably an alkyl group having a carbon number of 丨3 to 3 in terms of compatibility and wettability to a surface to be coated. More preferably, the carbon number is 2 or 3. Preferably, ^(p+q) in the formula is p+q=s, which is 100 mass/〇. The weight average molecular weight (Mw) of the copolymer is more preferably 1500 to 5,000 0 [Chem. 62]

These surfactants may be used alone or in combination of two or more. The amount of the surfactant added to the photosensitive resin composition of the present invention is preferably 0.01% by mass to 2.0% by mass based on the total mass of the photosensitive resin composition, and particularly preferably 0. 02% by mass. ❶/❶~丨〇% by mass. When the right side is in this range, the uniformity of the coatability and the cured film becomes good. (Adhesive Modifier) The photosensitive resin composition of the present invention may contain an adhesion improving agent. The adhesion improving agent is a compound for improving the adhesion to the cured film of the photosensitive resin composition layer, such as an inorganic material such as glass, ruthenium, iridium oxide or tantalum nitride, or gold, copper or aluminum. . Specific examples thereof include a decane coupling agent and the like. The decane coupling of the adhesion improving agent 97 201245878 疋 The purpose of the modification of the interface is not particularly limited, and a known one can be used. The simmering coupling agent is preferably a frequency coupling agent as described in the paragraph of the Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. Mercaptopropyl methoxy propyl diacetate oxi. The Wei Coin financial bill is more than two types or two or more. The content of the adhesion improving agent in the photosensitive resin composition of the present invention is preferably 0.1% by mass to 2% by mass, more preferably Q 2 f, based on the total solid content of the photosensitive resin composition. Amount % to 5 mass%. (Crosslinking agent) The crosslinking agent can be used in the photosensitive resin composition of the present invention to further improve the hardness of the cured layer obtained by curing the photosensitive resin composition. The crosslinking agent is not particularly limited as long as it can be cured by a crosslinking reaction, and examples thereof include (a) an epoxy resin selected from a methylol group, an alkoxy group, and a decyloxy group. a melamine compound, a guanamine compound, a glycoluril compound or a urea compound substituted with at least one substituent of the fluorenyl group, and (c) at least one selected from the group consisting of a hydroxy fluorenyl group, an alkoxy fluorenyl group and a fluorenyl fluorenyl group A substituent compound, a naphthalene compound or a ruthenium compound substituted with a substituent. Among them, a polyfunctional epoxy resin is preferred. The details of the specific examples of the crosslinking agent and the like can be referred to in paragraphs [0134] to [10147] of JP-A-2004-295116. 98 201245878 ^Jizpif (Development Accelerator) In order to promote the solubility of the photosensitive resin composition layer in the exposed region, the photosensitivity tree 2 is sought; in the case of no further mention, a development accelerator may be added. A low molecular weight organic carboxylic acid having a molecular weight of 1000 or less: a human: and a low molecular weight compound of less than 1 coffee. Specific examples of the Q material include aliphatic carboxylic acids such as capric acid, acetic acid, propionic acid, butyric acid, pivalic acid, caproic acid, diethyl acetic acid, heptanoic acid, and caprylic acid, and oxalic acid, malonic acid, and amber. Acid, glutaric acid, adipic acid, pimelic acid, octanoic acid, azelaic acid, sebacic acid, tridecanedioic acid, mercaptomalonic acid, ethyl malonic acid, dimethylmalonic acid , aliphatic carboxylic acid such as methyl cis, tetramethyl squama and citraconic acid; 123-tricarballylic acid, aconitic acid and camphoronic acid And other aromatic tricarboxylic acids; benzoic acid, phthalic acid, cumic acid, 2,3-dimethylbenzoic acid (hemeiiitic acid) and 3,5-dimethylformic acid (mesitylenicacid) and other aromatic Monobasic acid; phthalic acid, isophthalic acid, terephthalic acid, trimellitic acid, trimesic acid, melophanic acid, and Aromatic polyphenolic acid such as pyromellitic acid; phenylacetic acid, hydratropic acid, hydrogenated cinnamic acid Hydrocinnamic acid ), mandelic acid, phenyl succinic acid, atropic acid, cinnamic acid, cinnamic acid methyl vinegar, cinnamic acid benzyl vinegar, cinnamylidene acetic acid , coumaric acid and umbellic acid 99 201245878 -r厶ji 厶|·Ηΐ·etc. (Other Additives) The photosensitive resin composition of the present invention may further contain various additives such as a filler, a polymer compound other than the above, an ultraviolet absorber, an antioxidant, and the like, as needed. The additives are described in paragraphs [〇155] to 'paragraphs [0156] of JP-A-2004-295116. / ' ^ The photosensitive resin composition of the present invention may contain the optical stabilizer described in paragraph number [0078] of the Japanese Patent Laid-Open Publication No. 2004-295116, and the paragraph number of Japanese Patent Laid-Open No. Hei 2__295116 The thermal polymerization inhibitor (polymerization inhibitor) described in [Deleted]. (Preparation method of photosensitive resin composition) The photosensitive resin composition of the present invention can be prepared by mixing the above-mentioned respective components with optional components as needed. The colorant may be any of a pigment dye or a mixture of a pigment and a dye. In addition, when the photosensitive resin composition is prepared, the components constituting the photosensitive resin composition may be formulated in a total amount, or each component may be dissolved and dispersed in a solvent, and then successively formulated. Moreover, the order of input or the working conditions at the time of preparation are not particularly limited. For example, all the components may be simultaneously dissolved and dispersed in a solvent to prepare a composition, and if necessary, each component may be appropriately prepared into two or more solutions and dispersions, and these may be mixed at the time of application (at the time of coating). It is prepared as a photosensitive resin composition. The photosensitive resin composition prepared as described above is preferably used by filtration using a filter having a pore diameter of about 0.01 μm to about 3.0 μm, and then 100 201245878 42312pif. Since the photosensitive resin composition of the present invention can form a colored cured film having excellent color tone and contrast, it can be suitably used as a coloring element for color filters used in a liquid crystal display device, and can also be suitably used as a coloring element. Production of printing inks, inkjet inks, and coatings. (Color filter and method for producing the same) The shirt filter of the present invention comprises a substrate and a colored region containing the photosensitive resin composition of the present invention provided on the substrate. The colored areas on the substrate include coloring layers such as red (^), green (g), and blue (B) which form respective elements of the color filter. The method for producing a color filter of the present invention comprises the following steps: == ???a photosensitive _ body-on-color layer (photosensitive resin composition (B), as described in the step (A) Figure = , forming a latent image; development step (., forming a pattern of 4 = coloring layer to form a pattern. ^ 斤 and in the production of the color enamel sheet of the present invention step by step = state ' The step (the heat treatment of the colored pattern is carried out by the coloring method. The manufacturing method of the pure calendering sheet of the present invention is more specific - step (Α) - in the manufacturing method of the colored calender sheet of the present invention, Slit coating, cast coating, = 101

201245878 ^UJiZpiI = The liquid crystal display cap can be used to make a glass, a glass, a glass, a quartz glass 1 substrate, a resin substrate, and the like. Moreover, on the support bodies, an undercoat layer may be provided as needed to improve adhesion to the upper layer, to prevent diffusion of substances, or to achieve planarization. The pre-baking conditions include the following conditions: heating at 70 c to 130 c for 0.5 minutes to 15 minutes using a hot plate or a supply box. Further, the thickness of the coloring layer formed by the photosensitive resin composition can be appropriately selected as needed. In the color calender sheet for a liquid crystal display device, a range of from 0.2 μm to 5.0 μm is preferable, and a range of from 1 μm to 4.0 μm is more preferable. Further, the thickness of the colored layer is the film thickness after drying. - Step (Β) - Then, in the method of producing a color filter of the present invention, the colored layer formed on the support is subjected to pattern exposure. The light or radiation that can be used in the exposure is preferably a g-line, an h-line, an i-line, and various kinds of laser light, and particularly preferably a 1-line. When the i-line is used for the irradiation light, it is preferably irradiated with an exposure amount of 5 mJ/cm 2 to 500 mJ/cm 2 . Moreover, other exposure light sources can use mercury lamps, chemical lamps, carbon arc lamps, xenon lamps, metal halide lamps, and various laser sources such as ultra high pressure, high pressure, medium pressure, and low pressure. ~ Exposure steps using a laser source ~ 102 201245878 42312pif

In the exposure mode using a laser light source, the irradiation light is preferably an ultraviolet laser having a wavelength in the range of 300 nm to 410 nm, more preferably a wavelength in the range of 300 nm to 360 nm. In particular, it is particularly suitable to use a solid-state Nd: YAG laser with a large output and a relatively inexpensive solid-state laser (355 nm) or a quasi-molecular laser (308 nm), XeF (353 nm). . The pattern exposure amount is preferably in the range of 1 mJ/cm 2 to 100 mJ/cm 2 from the viewpoint of productivity, and more preferably in the range of j mJ/cm 2 to 50 mJ/cm 2 . The exposure device is not particularly limited, and a commercially available exposure device can be used.

Callisto (manufactured by V Technology Co., Ltd.) or EGIS (V)

Manufactured by Technology Co., Ltd.) or DF2200G (manufactured by Dainippon Screen Co., Ltd., etc. Also, it is also suitable to use a device other than the above. - Step (C) _, then, the exposed color layer by the developer solution Development is carried out, whereby a colored pattern can be formed. If the developer is a uncured portion in which the colored layer is dissolved and the hardened portion is not dissolved, a combination of various organic solvents or an aqueous alkaline solution can be used. In the case where the alkali concentration can be adjusted, it is preferably pH 1 〇 to η. The calibrated aqueous solution may, for example, be cerium oxide, potassium hydroxide, sodium carbonate, sodium hydrogencarbonate, sodium citrate, or hemiplegia. S'sodium, ammonia, ethylamine, diethylamine, dimercaptoethanolamine, tetradecylammonium hydroxide, tetraethylammonium hydroxide, choline, pyrrole, piperidine and 1,1 azapine An alkaline aqueous solution of [5,4,0]-7-undecene, etc. The development time is preferably from 30 seconds to 300 seconds, more preferably from 30 seconds to 120 seconds. The development temperature is preferably ~4〇.匸, more preferably it is 23. 103 201245878 Development can be done by paddle l ^ Equation, etc. (7)) Method, spray method and spray water intake: J wash after development with an aqueous solution, preferably by using the manufacturing method, particularly good for the sense of use The step of exposing after the ultraviolet irradiation of the colored resin formed by the precursor resin composition. 〃" - Step (D) - Ultraviolet 21 疋 The color pattern after development or the color pattern of post-exposure using nr as described above is further heated = the heat treatment of the formed color pattern is performed ( The so-called subsequent supply: ❹ can make the coloring pattern stepwise hardening. The heat treatment can be carried out, for example, by a heating plate, various heaters, an oven, etc. The temperature at the time of heat treatment is preferably a gift of c~3() ( Rc, more preferably =C~25 (rC. Moreover, the heating time is preferably about 1 minute to about 12 minutes. The colored pattern thus obtained constitutes a halogen in the color light film. In the production of a color filter having a plurality of tones of pixels, the above steps (4), steps, and steps (D) may be repeated in accordance with a desired number of colors. The step (D) is performed after the formation, exposure, and development are completed (per color), and the step (D) may be performed after all the colored axes of the desired number of colors, exposure, and display. 104 201245878 42312pif , by the color filter of the present invention The color filter (the color filter of the present invention) obtained by the production method uses the photosensitive resin composition of the present invention. Therefore, the color tone and the contrast are excellent. When used in a liquid crystal display device or the like, it is possible to obtain a good mosquito. The color tone and the image excellent in the index and the contrast are displayed. <Liquid crystal display device> The liquid crystal display device of the present invention includes the color filter of the present invention described above. The definition of the liquid crystal display device or the details of each display device For example, it is described in the electronic display device (issued by Sasaki Mori, Industrial Research Association Co., Ltd., 1990), and "display device (Ibuki Shunzhang, Industrial Book Co., Ltd. issued in the first year of Heisei)". The liquid crystal display device is described in, for example, "Next Generation Liquid Crystal Display Technology (Edited by Uchida Ryuo, Industrial Research Association, 1994)". The liquid crystal display device to which the present invention is applicable is not particularly limited, for example, Applicable to various methods of liquid crystal display described in the "Next Generation Liquid Crystal Display Technology" In the apparatus, the color light-emitting sheet of the present invention is particularly effective for a liquid crystal display device of a color TFT type. For example, a color TFT liquid crystal display device, for example, "color TFT liquid crystal display (issued by Kyoritsu Publishing Co., Ltd., 1996) In addition, the present invention is also applicable to a liquid crystal display device in which an angle of view such as a transverse electric field driving method such as IPS and a pixel division method such as MVA is expanded, or STN, TN, VA, OCS, F1FS, and R-OCB. Moreover, the color filter of the present invention can also be used in a color-filter on Array (105) mode. 105 201245878 If the color filter of the present invention is used for liquid crystal display In the device, the high-contrast color can be achieved by combining the three-wavelength tube of the cold cathode tube which is previously known. In addition, the color of the high-purity and high-purity color can be provided by backlighting the red, green and blue LED light sources (rgb_led). A good liquid crystal display device. <<Light spacer and method of forming the same>> The optical spacer of the invention is formed by using the photosensitive resin of the present invention described above. The details and preferred aspects of the photosensitive resin composition are as described above. The optical spacer of the invention is excellent in the uniformity of the cross-sectional shape of the photosensitive resin composition of the present invention, that is, the uniformity of the height and the height (i.e., the unevenness of the cross-sectional shape or the unevenness of the height). In the case of the photosensitive resin composition of the present invention, the optical spacer having the pressure-receiving number and the recovery property of the deformation is used as the optical spacer. In the present invention, as a state of "cross-sectional shape: excellent" of a pattern structure such as a light spacer, it is preferable that the cross-sectional shape of the pattern structure becomes close to a rectangle in a plurality of places in the substrate (more than two) The state of the shape. It is more preferable that the shape of the rectangular shape is close to the shape of the cross section of the pattern structure, and the line on the side of the pattern structure corresponds to the lower surface of the pattern structure. The angle formed (hereinafter also referred to as "taper") is 4 inches. ~1〇〇. Here, the lower surface of the pattern structure refers to the contact surface of the surface of the pattern structure 106 201245878 42312pif with the substrate formed by the pattern structure. Further, the fi: the side of the structure means the surface of the pattern structure, and does not correspond to the figure 2, '. The lower surface of the object does not correspond to the upper surface of the pattern structure (the surface parallel to the lower surface of the f structure, and the surface not in contact with the substrate = f is a method of using the photosensitive resin composition of the present invention) ^Methods (4) The optical spacer of the invention can be formed by using the method comprising the two hairs to the step (3), and the method for forming the optical spacer of the present invention comprises: (Yu Ming photosensitive resin) Step of coating the composition; lower = light = light step" ^ (2) Step of exposure to at least part of the film (hereinafter also referred to as "exposure step (hereinafter also referred to as "丄" = (10) Ageing) or it-step contains other steps (1) Film formation step

The lipid 2 = 3 step is to form the photosensitive tree of the present invention on the substrate, and the film of the product. Photosensitive T ===_ The exposure step described later or the light spacer of the thickness of the single 70 is maintained. The use of too "pieces" by Sa is particularly effective in eliminating the unevenness of the display in the image of the mobile device. (In particular, the method of forming a photosensitive resin layer on a substrate is suitable.) (a) a coating method of applying a photosensitive frequency composition containing at least the resin, a polymerizable compound, and a photopolymerization initiator; and (4) (4) having the photosensitive resin layer H-transfer, borrowing A transfer method in which a photosensitive resin layer is laminated and transferred by heating and domain pressing. (a) Coating method The coating of the photosensitive resin composition can be carried out by a known coating method; Spin coating method, curtain coating method, slit coating method, dip coating method, air knife; cloth method, test method, transfer (four) method, gravure printing method or American special; the use described in the specification of No. 294 The invention is carried out by the method of extrusion coating, etc., wherein the Japanese Patent Laid-Open No. Hei 2__89851, the Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. 2003-170098, Japanese Patent No. 2003-170098 Japanese Patent Laid-Open No. 2 〇〇 3 164787, the Patent Publication No. 2〇〇3_娜7, The method of the slit nozzle or the slit coater described in Japanese Patent Laid-Open Publication No. Hei. No. 2-79163 and Japanese Patent Laid-Open Publication No. Hei. For the photosensitive transfer material, for example, by heating and/or adding a layer j or a flat plate, a photosensitive resin layer which is opened on the temporary support by pressure bonding or splicing is attached to the desired one. On the substrate surface, then 8, the dragon is secret, and the (four) button is transferred to the layer: Specifically, the patent can be cited as a special patent, the 7th newspaper, the second Liliate Kaiping bulletin, and the Japanese paste 108 201245878 42312pif machine. In the case of the low-rise foreign matter described in the Japanese Patent Publication No. Hei 8794, it is preferable to use the method described in Japanese Laid-Open Patent Publication No. Hei. Further, an oxygen barrier layer (hereinafter also referred to as an "oxygen barrier film" intermediate layer) may be further formed between the photosensitive resin layer and the surface of the photosensitive resin layer. The result is an increase in exposure sensitivity. Further, in order to improve the transfer property, a cushioning thermal resin layer may be provided. The temporary support for constituting the photosensitive transfer material, the oxygen barrier layer, the thermoplastic resin layer, the other layer, or the method for producing the photosensitive transfer material can be adapted to the paragraph of the Japanese Patent Laid-Open Publication No. 2__23696. The structure and manufacturing method described in the paragraph No. [0030]. In the case of (a) coating method, (8) transfer method - when used to form a photosensitive tree, the layer thickness is preferably 〇5哗~1〇〇, more preferably 1 μηη ~6 μηι. When the layer thickness is in the above range, it is possible to prevent the pinhole which is generated at the time of coating formation at the time of production, and it is not necessary to perform development and removal of the unexposed portion over a long period of time. Examples of the substrate on which the photosensitive resin layer is formed include a transparent substrate (for example, a glass substrate or a plastic substrate), a substrate with a transparent conductive film (for example, a ruthenium film), and a substrate with a color county plate (also referred to as a color ruthenium substrate). And a drive substrate to which a driving element (for example, a thin film transistor [TFT]) is attached. The thickness of the substrate is usually preferably from 700 μm to 1200 μm. (2) Exposure step, (3) Developing step In the exposure step, at least a portion of the film formed in the film forming step is exposed (four) into a latent image. Development step of Yu New 109 201245878 4^i2pir 2=34 Exposure step The exposure is developed by the exposure, and the spacer pattern of the shape of the shape can be formed. Specific examples of the seven steps include the formation example in the paragraph number [0071] to the paragraph number [0077] of the Japanese Patent No. 6/4921, or the paragraph of the paragraph No. 2006-23696 of the Japanese Patent Publication No. 2006-23696. [〇_]~Paragraph number [(8)5丨] Invented by the towel + suitable example. The method for forming the optical spacer of the present invention may further include a fourth step of heating the film, which may be followed by a step of heating or the like, or a heating step (hereinafter also referred to as "no heating". The step of forming a light interval having excellent cross-sectional shape uniformity and excellent height uniformity can be more effectively suppressed by deterioration of the optical spacer to be formed by setting it as "no heating step" Deformation of the formed pattern structure (coloring pattern, etc.) or protective film. The exposure amount in the case of "there is no heating step" is preferably 1 mJ/cm to 500 mJ/cm2', preferably 1 〇 mj/cm2 to 3 〇〇 mj/cm2. (4) Film heating step The method of forming the optical spacer of the present invention may further comprise a film heating step, i.e., heating the film after development in the developing step. Further promoting the hardening of the film by heating, thereby obtaining high strength

Light spacer. Further, when the photosensitive resin composition contains the resin A, a light spacer having a good compression modulus and elastic recovery property can be obtained. 110 201245878 42312pif As described above, a substrate for a display device having a light spacer on a substrate can be produced. The light spacer is preferably formed on a black matrix or the like formed on the substrate, on the color light shielding portion or on a driving element such as a TFT. Further, a transparent conductive layer (transparent electrode) such as ITO or an alignment film such as polyimide may be present between the black light-shielding portion such as a black matrix or a driving element such as a TFT and the optical spacer. For example, in a shape in which a light spacer is provided on a black light-shielding portion or a driving element to cover a black light-shielding portion (black matrix or the like) or a shaft member previously disposed on the substrate, for example, a sense The feeling of the transfer material, = resin layer inspection of the dragon face, riding _ transfer to form a photosensitive test layer, after the exposure, development and heat treatment, etc., to form a light spacer, thereby A substrate for a display device is produced. Further, a color pixel such as three colors of red (R), blue (B), and green (G) may be provided on the substrate for the display device as needed. The optical spacer of the present invention can be formed after forming a color filter including a black shading portion such as a black matrix and a coloring portion such as a color pixel. The black blocking portion, the fourth member, and the optical spacer can be formed by arbitrarily combining the following methods: a coating method for applying a photosensitive resin composition, and a spotting method = a photosensitive resin layer (the photosensitive resin layer) A transfer method of a transfer material containing a photosensitive resin and a film. The black blocking portion and the coloring portion and the optical spacers may be formed of a composition of a resin, for example, by directly applying a liquid axe U-tree assay to the substrate (4) After forming the photosensitive resin g, exposure and development are carried out, and the black blocking portion and the colored portion 111 are processed in the form of 201245878, and then the transfer material is produced (the above is produced by placing other liquids n) Recording the nucleus composition of the nucleus, the other substrate (temporary photosensitive resin layer) different from the core plate, and transferring the photosensitive resin layer to the transfer material, and then performing the light separation The piece is formed into a pattern. The color filter "protective film" provided with the light coffee piece can be produced as a protective film of the present invention, and if it is a method of the composition, the storage device is sensitive to the tree.曰 = the method of forming the optical spacer of the present invention is the same 'two places, in the case of not patterning the protective film $ 〇 film film 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于 于The whole method of secret light. L example] Ming corpse by example to this It is explained in more detail, but this article is not limited to the following examples, except for the main purpose of (4). In addition, only „, “parts” and “%” are the quality benchmarks. Synthesis Example _ via a compound of the formula π and a temperature = a stirrer with a stir bar and a stirring blade, a reflux condenser, and a dropping funnel base, a 2-molecular drop solution as a reaction solvent The surface was heated to 70 ° C while replacing with nitrogen. In the '',, allyl methacrylate (82.3 g), methacrylic acid 112 201245878 42312pif (17.7 g) and as a polymerization initiator W074, 2 azo Bis(2,4·dimethylpentyl U-human, six-source hydrazine in 5〇0 8 of 2' methoxypropanol, the mixed heart-reading-face-drip-step in 2 hours 2 reaction at the reaction temperature under the enthalpy (7), then the mixture is stirred in the fire ah, after the end of the heating, the inlet is:: liter of distilled water is stirred - the surface is added dropwise with the above reaction ί white ί ^ ^ ^ ^ body. The solid was dried and a white solid compound (88 g) (a compound of the formula II) was obtained. The acid value was determined to be methyl propyl/methyl methene. Vinegar = 24/76 (unit: mol%) 0 The above-obtained polymer (5 〇, 2-methoxypropanol (82 g)' was placed in a 1-liter Erlang flask and heated to 11 〇 while stirring. The solution was dissolved in methoxy phenol (0.6 g) as a polymerization inhibitor. While the solution was stirred under an oxygen atmosphere, glycidyl methacrylate (2.44 g) was added dropwise for 6 hours. After the reaction, the reaction solution was added dropwise to the steaming water (820 g), and the solution was reprecipitated. The polymer was collected by filtration and dried at 50 ° C to obtain a white powder. A (46 g). The acid value was measured again to obtain methacrylic acid/allyl methacrylate/glycidyl group adduct = 20/76/4 (unit: mol%). The weight average molecular weight obtained by GPC was 30,000. &lt;Synthesis Example of Polymer P-2 to Polymer P-4 - via Compound of Formula II&gt; In the synthesis example of the above polymer P-1, 'polyacrylic acid/oxime was replaced in the following manner Allyl acrylate/glycidyl methacrylate), respectively, polymer P-2 to polymer P·4. 113 201245878 Polymer P-2: poly(methacrylic acid/allyl methacrylate/glycidyl methacrylate) (copolymer molar ratio 24/70/6, weight average molecular weight 32,000) Polymer P -3 : poly(methacrylic acid / allyl methacrylate / glycidyl methacrylate) (copolymer molar ratio of 24/60/16, weight average molecular weight of 35,000) Polymer Ρ-4: Poly(methacrylic acid/allyl methacrylate/glycidyl methacrylate) (copolymer molar ratio is 24/50/26, weight average molecular weight is 33,000) &lt;Polymer Ρ-5~polymer Ρ Synthesis Example of -8 - By Compound of the Formula π &gt; In the synthesis example of the above polymer Ρ-1, the glycidyl methacrylate was changed to CYCLOMERA (CYCLOMERA-200, manufactured by Daisaiyou Chemical Industry Co., Ltd.) In addition, synthesis was carried out by the same method as the synthesis example of the polymer p_1, and the test resin polymer Ρ-5~polymerΡ-8 was synthesized. σ &lt;Polymer 9·9~Polymer Ρ_12 Synthesis of the final compound of the formula m&gt; The polymer Ρ-9-bearing material 1^12 can be specifically described by the above formula III In the synthesis of the compound of the general oxime, the step-copolymerization of the methyl 2-propionic acid 2-ethylhexyl vinegar monomer, in addition to the general π of the human: u (four) material private m of the r6 is the ethyl form ^ The second one is made by injecting 2_曱oxy (82g) into the obtained polymer, and heating one side of the sand 114, 201245878, 42312pif to 50 °C. The solution was dissolved as (〇.6g). - Mixing with oxy-oxyphenol in the preparation of oxygen, and making the reaction of the solution to the kernezMOI reaction of the solution = /, 'Vinyl ester (Showa Denko) Manufacture, &lt;Synthesis Example of Polymer IM3~Polymer p_16&gt; - In the synthesis example of octahydrate 1, in the synthesis of the above-mentioned white on-body polymer, except for methacrylic acid and methyl group = white private polymethacrylic acid It is the same as the synthesis example of the compound ρ-1 and d:: the blush polymer P-13 to the polymer P_16. Synthesis of P-17 to polymer! M8 'via general formula & compound> In the synthesis example of the above polymer Ρ-9, when synthesizing a compound of the formula Ιπ, further copolymerization of dicyclopentene methacrylate The base ester was synthesized by the same method as the synthesis example of the polymer -9, and the polymer Ρ-17 and the polymer Ρ-18 were synthesized. <Polymer Ρ-19~Polymer Ρ-20 Synthesis Example - Compound via Formula & Polymer Ρ-19~Polymer-20 can be synthesized via the above formula III. Further In the formula, a glycidyl methacrylate was added dropwise in the same manner as in the synthesis example of the polymer Ρ-1 to synthesize a polymer Ρ-19~polymer Ρ-20. <Synthesis Example 1 &gt; O-Benzene Nitrile compound [a-{(4_COOC2H4OCH3)C6H4〇}a, p-{(4-COOC2H4OCH3)C6H4 115 201245878 ιυ厶如ηι 〇}』13 phthalonitrile] (0^a&lt;1) (synthesis of intermediates) In a two-ml flask, four gas phthalonitriles (hereinafter referred to as .g (0.03 Torr) and p-hydroxybenzoic acid methyl sarbuta 5.95 g (〇._mole), acetonitrile 319 μg were used. The magnetic observation device performs about 3 〇 for the bell to mix until the internal temperature is stable at 4 (after TC, the potassium carbonate is 4.56 g (j).033 g) and reacts for about 3 hours. After cooling, it will proceed. The solution obtained by pumping and venting is evaporated to remove the solvent by evaporation treatment at about 11 Torr for 1 hour. Further, it is about 11 Torr. [Under vacuum drying overnight, about 13" g is obtained. The yield of TCpN was 4 mol%. <Synthesis Example 2 &gt; Phthalocyanine compound (hereinafter referred to as pcl)

[ZnPc-{a-(4-CO〇C2H4〇CH3)C6H40}x,{p-(4-COOC2H4OCH 3)C6H4O}38_xh08c1&quot;4] (〇$χ&lt;3 8) synthesized in a 150 ml flask The intermediate 1, 10·21 g (0.024 mol), phthalonitrile niobium 16 g (〇〇〇1 mol), and nitrile (BN) 3.46 g ' obtained in Synthesis Example 1 were put under nitrogen gas flow ( 10 ml/min), stirring was carried out for about 1 hour using a magnetic stirrer until the internal temperature was stabilized at 16 ° C, and then 2.22 g (0.007 mol) of bulk zinc was introduced and allowed to react for about 12 hours. After cooling, the reaction solution was evaporated at 140 ° C for 1 hr to remove the solvent. Then, the obtained solid was added with thioglycol (6.9 g) (corresponding to the phthalocyanine reaction). The weight of the intermediate 1 and the phthalonitrile used (10.37 g) minus the weight of the BN (3.46 g) was stirred and dissolved to prepare a crystallization solution. Next, the prepared crystallization solution was added dropwise to methanol (103.8 g) (corresponding to the intermediate j used in the phthalocyanine reaction 116 201245878 milk i2pif and the stirring for 30 minutes in the adjacent line. In 10 times the amount, enter (equivalent to the weight of the intermediate and the second drop, add distilled water (7 2.6 g) and stir for 30 minutes to make the crucible batch), after the end of the addition, further, add again When crystallization, yang ° = the crystal obtained is subjected to suction filtration for 30 minutes, and then _3 is carried out _ (called, added to the drop; two: amount;

The St-technical track, in turn, takes the crystals taken out and vacuum-dried to obtain about yang with a yield of 99.2% relative to the intermediate body 1 and phthalonitrile. [Example 1] - Preparation of coloring photosensitive resin composition _ The composition of each of the lower ages was sighed and dissolved, and the coloring composition was colored. • Organic solvent 1 (propylene glycol monoterpene ether acetate) 33.ig • Organic gluten 2 (3-ethoxypropionate B) 25.2 gt • Alkali-soluble binder p-2 poly(methacrylic acid/ Glycosyl methacrylate/glycidyl methacrylate) (copolymer molar ratio is 24/70/6, weight average molecular weight is 32,000) 6.9 g • Polymerizable compound 1 manufactured by Nippon Kayaku Co., Ltd., KAYARAD DPHA 2.8 g . Polymeric compound 2 manufactured by Toagosei Co., Ltd., Aronix TO-2349 2.8 g • Polymerization inhibitor (p-methoxyphenol) 0.003 g 117 201245878 • Photopolymerization initiator 1 CGI-242 : Cibafin Co., Ltd. manufactures 0.39 g • adhesion improver (3-mercapto propylene methoxy propyl trimethoxy decane) 0.2 g • fluorine-based surfactant (Megafac F554, manufactured by DIC) 〇.〇1 g • Blue Color pigment dispersion (Pigment Blue 15:6 dispersion (solid content concentration: 16.8%, pigment concentration: 9.9%)) 28.5 g Further, the blue pigment dispersion liquid can be prepared as follows. 12.8 parts of CI Pigment Blue 15:6 and 7.2 parts of a dispersant (Solsperse 5500 manufactured by Lubrizol Co., Ltd.) were mixed with 80.0 parts of propylene glycol monomethyl acetate, and the pigment was sufficiently dispersed and adjusted using a bead mill. Blue pigment dispersion. - Formation of a coloring photosensitive resin composition layer (colored layer) - The above-mentioned prepared coloring photosensitive resin composition was applied by spin coating on a glass (#1737; manufactured by Corning Incorporated) substrate, and then at room temperature The drying was carried out for 30 minutes, whereby the volatile component was volatilized to form the colored layer A. The latent image is formed by irradiating the i-line (wavelength of 365 nm) to the smudged layer A. The light source of the i-line uses an ultra-high pressure mercury lamp to illuminate the light into parallel light. At this time, the amount of irradiation light was set to 40 mJ/cm2. Then, using the aqueous solution of sodium carbonate/sodium hydrogencarbonate (concentration: 2.4%), the latent image-forming color layer A was developed at 26 〇Ct for 45 seconds, and then rinsed by running water for 20 seconds. Drying by spraying to obtain a fine line pattern image. The obtained fine line pattern image was baked at 230 ° C for 2 minutes and then = 118 201245878 to obtain a coloring layer B having a film thickness of 2. • Evaluation _ The sensitivity of the coloring layer obtained above, the specific resistance of the liquid crystal, the spectral characteristics, the contrast, and the adhesion were evaluated by the methods described below. The evaluation results are shown in Table 2 below. (1) Sensitivity Using the 1-line reduction projection exposure apparatus, the coating-dried coloring layer A obtained as described above was subjected to a coating having a line width of 20 μm at a wavelength of 365 nm and an irradiation amount of 4 〇mj/cm 2 . Irradiation. After the irradiation, development was carried out for 45 seconds at 26 ° C using a developing solution (aqueous solution of sodium carbonate / sodium hydrogencarbonate (concentration: 2.4%)). Next, after rinsing with running water for 2 sec seconds, it was dried by spraying to obtain a fine line pattern image. For the obtained image, an image of a thin line pattern was taken at a magnification of 200 times by an optical microscope. At this time, the width of the thin line is measured by the obtained image. The higher the sensitivity, the wider the width of the thin line, so the width of the thin line is reduced by the width of the mask width as the line width sensitivity. In the case where the number is large, the sensitivity is high and it is preferable. (2) The specific resistance of the liquid crystal is scraped from the substrate to obtain the coloring layer B obtained above, and the scraping material 9.0 mg is added to the liquid crystal material ZLI-4792 (manufactured by Merck & Co., Ltd.) 2·〇〇g at 120°. Heating was carried out for 5 hours under C. Thereafter, the filtration was carried out, and the specific resistance of the wave: : 2 was measured by a liquid crystal specific resistance measuring device (model: ADVANTTEST R8340 ULTRA HIGHT RESISTANCE ME, manufactured by Advantest Test Co., Ltd. 119 201245878 (ADVANTEST CORPORATION)). Since the liquid crystal material is lowered due to the elution of the metal ions, the metal ion/valley can be evaluated by the degree of specific resistance. [Evaluation Criteria] 〇: Specific resistance 21.0x10&quot; ΜΩ, flashing to liquid crystal No residual image failure was observed when the panel was made in the display device. x: specific resistance &lt; 1. 〇χ〇ηΜΩ, which causes an afterimage failure when it is incorporated into a liquid crystal display device to form a panel. (3) Spectroscopic characteristics The transmitted spectrum of the coloring layer β obtained above was measured using a microscopic spectroscopic measuring apparatus OSP-SP200 (trade name) manufactured by Olympus Co., Ltd. The color coordinate X value, y value, and γ value in the CIE1931 color system were obtained from the obtained transmission spectrum. When the γ value in (X, y) = (0 138, 〇 〇 85) is high as the spectral characteristic, it can be said that the spectral characteristic 4 is excellent, so that the larger the γ value, the more excellent the spectral characteristic. (4) Between the contrasts, the substrate of the color layer is clamped to the 牧 (6) 2 of the 2 牧 偏 偏 偏 而 而 而 而 而 而 而 而 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 二 二 二 二 二 二 二 二 情 情 情 情 情The brightness obtained in the vertical direction is bright when the axis is parallel. The liquid crystal display is turned on. (4) The ratio is higher than the degree 1 (5) The adhesion is better than the first film. 120 201245878 42312pif With regard to the coloring layer A obtained above, the projection exposure apparatus is reduced by a twist line, and the exposure of the mask width 4 〇mI/em2 with a mask width of 5 μm, 1 μm, 15 μm, 20 μm, and 25 μm is used. The Wei colored layer is irradiated with a wavelength of 365 nm. After the irradiation, the developing solution was used to carry out development for 2 seconds. Next, after rinsing with running water for 20 seconds, it was dried by spraying to obtain a fine line pattern image. Image formation can be observed by a conventional method by optical microscopy and SEM photograph observation. Then, the pattern size of the finest fine line pattern remaining on the substrate was evaluated as the adhesion. The case where finer fine lines remain can be used as the adhesion. [Example 2] Preparation of μ-colored photosensitive resin composition _ The following components were mixed and dissolved to prepare a colored photosensitive resin composition. • Organic solvent 1 (propylene glycol monoterpene ether acetate) 33. 丄g • Organic solvent 2 (3-ethoxypropionic acid ethyl vinegar) 25.2 g • Alkali-soluble binder P-2 poly(methacrylic acid/mercapto group Allyl acrylate / glycidyl methacrylate) (copolymer molar ratio of 24/7 〇 / 6, weight average molecular weight of 32,000) 6 9 g • Polymeric compound 1 dipentaerythritol hexaacrylate Japan Chemical Co., Ltd. Manufactured by the company, KAYARAD DPHA 2.8 g • Polymeric compound 2 manufactured by Toagosei Co., Ltd., Aronix TO-2349 2.8 g • Polymerization inhibitor (p-methoxyphenol) 0.003 g 121 5 201245878. • Photopolymerization initiator 1 ( 1-(0-acetamidine)-l-[9-ethyl-6-(thiophene oxime 0.39 g 0.2 g group)-9H-indazol-3-yl]ethanone): • Polyfunctional thiol compound 1 • Intimate improver (3-mercapto propyleneoxypropyl trimethoxy decane) 0.2 g • Fluorine-based surfactant (Megafac F554, manufactured by DIC) 〇.〇1 g • Blue pigment dispersion (pigment blue) 15 : 6 dispersion (solids concentration 16.8%, pigment concentration 9.9 ° /.)) 27.0 g • Dyes (A_l) 1.1 g • Dyes (Bl) 0 .4 g The polyfunctional thiol compound used in the above is 1,4-bis(3-mercaptobutyl sulfoxide) butane. In the above, the dye (A·1) is a dye of a dipyrromethene-based metal-coordinated compound, and the dye (B-1) is a ruthenium compound (a compound having a 蒽_9,10-di- skeleton). The coloring photosensitive resin composition described above was adjusted in the same manner as in Example 1. [化63]

122 201245878 42312pif [化64]

[Examples 3 to 8] In the same manner as in Example 2, except that the alkali-soluble binder was changed in the manner described in the following Table, the colored photosensitive resin composition was prepared to form a colored layer and was carried out. Evaluation. [Example 9] A colored photosensitive resin composition was prepared in the same manner as in Example 2 except that the dye (A-1/B-1) was changed to the dye (A-3) (0.6 g). A coloring layer was formed and evaluated. The dye (A-3) is a dibenzopyran dye. [Chem. 65]

[Example 1〇] 201245878 i ζ, μιι In Example 1, a blue pigment dispersion (Pigment Blue 15:6 dispersion (solid content concentration: 16.8%, pigment concentration: 9.9%)) was changed to a yellow pigment dispersion. In the same manner as in Example 1, except that (pigment yellow 150 dispersion) (9.0 g) and green pigment dispersion (pigment green 58 dispersion) (21.0 g), a colored photosensitive resin composition was prepared to form a colored layer. Conduct an evaluation. [Example 11] Example 11 is that in Example 10, the pigment was changed only to a yellow pigment dispersion (Pigment Yellow 150 dispersion), and further changed to use a dye (TA-1) (0.6 g), and Example 10 was additionally used. In the same manner, the coloring photosensitive resin composition was prepared to form a colored layer and evaluated. TA-1 is a triaryldecane dye. TA-1 [Chem. 66]

[Example 12] • Phthalocyanine compound Pc_l 10 parts • Yellow coloring material YG-1 30 parts • Benzyl methacrylate/mercaptoacrylic acid (=70/30 [mole ratio]) copolymer (Mw of 30,000) of propylene glycol Monoterpene ether acetate solution (solid 124 201245878 A - ώ-pif is 50%) 12 parts • dpha (manufactured by Sakamoto Chemical Co., Ltd.) 12 parts • 2-(o-chlorophenyl)_4,5-diphenyl Imidazolyl dimer (photopolymerization initiator) 3 parts • 2-carbylbenzothiazole (hydrogen-donating compound) 2 parts ♦ combination inhibitor: p-nonyloxyphenol 0.001 part lanthanide surfactant (commercial product) Name: Megafac F475 manufactured by Otsuka Mobo Co., Ltd.) 0.5 parts of 'propanol monoterpenoid acetic acid g 129 parts &lt;Preparation of pigment dispersion composition YG-1&gt; The components of the following composition are mixed and homogenized The mixture was stirred at 3,000 rpm for 3 hours to prepare a mixed solution containing the pigment. [Composition] 130 parts • Pigment Yellow 138 • Mercapto acrylate phenol/methacrylic acid (=70/30 [mole ratio]) copolymer (Mw 5,000) propylene glycol monoterpene ether acetate solution (solid matter is 50%) 1 ς /ίν Dispersing agent (Disperbyk-161, BYK-CHEMIE JAPAN Κ.Κ) 60 parts • propylene glycol monoterpenoid acetate 795 parts, and further by using 〇·3 mmcp cerium oxide particles The dispersing machine Dispermat (manufactured by GETZMANN Co., Ltd.) was subjected to a dispersion treatment for 12 hours, and then a high-pressure dispersing machine NANO-3000-10 equipped with a pressure reducing mechanism of 125 5 201245878 (manufactured by Japan BEE Co., Ltd.) was further used. The dispersion treatment was carried out by setting the flow rate to 50 〇g/min under a pressure of 2000 kg/cm3. This dispersion treatment was carried out one step at a time to obtain a pigment dispersion composition YG_i. [Example 13] to [Example I7] The yellow coloring agent YG-1 used in Example 12 was changed to the components of D1 to D-5, and the same adjustment as in Example 12 was carried out. (D-1) · A propylene glycol monomethyl ether acetate solution of a dye compound represented by the following structural formula (solid content: 13%) [Chem. 67]

(D-2): propylene glycol monoterpene ether core ester solution (solid content 13%) of the dye compound (B_10) represented by the formula [Chem. 68] 126 201245878 42312pif

(D-3): a propylene glycol monoterpene ether acetate solution of the dye compound (B-9) represented by the following structural formula (solid content: 13%) [Chem. 69]

, ΝΗ ΗΝ ,

C8H1702S δ〇2〇8^17 (D-4): a propylene glycol monoterpene ether acetate solution of a dye compound represented by the following structural formula (solid content: 13%) [Chem. 70] 127 201245878 ^zjizpii

(D-5): A propylene glycol monoterpene ether acetate solution of a certain azo dye described in the example of the synthesis example of the azo dye (3) (Japanese Patent Laid-Open Publication No. 2011-197669) (solid matter 13%) ) [化71]

Trioctylamine salt [Comparative Example 1] A coloring photosensitive resin was prepared in the same manner as in Example 1 except that the P-2 was changed by using the alkali-soluble resin polymer Q-1 having the following structure. The composition was formed into a colored layer and evaluated. The evaluation results are shown in Table 2 below. Detective polymer: Q-1 [化72] 128 201245878 42312plf

x: y: z = 49: 20: 40 [Comparative Example 2] In the case of the case 2, the copolymer resin (1) described in the example of JP-A-2002-293837 was used to change P.2, except In the same manner as in Example 2, the colored photosensitive resin composition was prepared to form a colored layer and evaluated. [Comparative Example 3] Example 2 was carried out in the same manner as in Example 2 except that the P-2 was changed using the test-reducing resin polymer Q-1, and the dye was changed to the dye (A_3) (G.6 g). On the other hand, the coloring photosensitive resin composition was prepared to form a colored layer and evaluated. [Comparative Example 4] A coloring photosensitive resin composition was prepared in the same manner as in Example 10 except that the P-reducing resin polymer Q-1 having the following structure was used in the same manner as in Example 10 except that P-2 was used. The layers were colored and evaluated. [Comparative Example 5] The colored photosensitive resin composition was prepared in the same manner as in Example 使用 except that the alkali-soluble resin polymer Q-1 having the following structure was used to change P-2', and a coloring layer was formed. And evaluation. 129 201245878 [Comparative Example 6] In the same manner as in Example 13 except that the P-2 was changed by using the alkali-soluble resin polymer Q1 having the following structure, the coloring photosensitive resin composition was prepared to form a coloring layer. And evaluation. 130 201245878 42312pif [Table 1] Alkali-soluble resin coloring # Pigment dye Example 1 P-2 Blue pigment dispersion - Example 2 P-2 Blue pigment dispersion dye (A-1/B-1) Example 3 P-7 Blue pigment dispersion dye (A-1/B-1) Example 4 P-10 Blue pigment dispersion dye (A-1/B-1) Example 5 P-14 Blue pigment dispersion dye (A-1 /B-1) Example 6 P-16 Blue pigment dispersion dye (A-1/B-1) Example 7 P-18 Blue pigment dispersion dye (A-1/B-1) Example 8 P-20 Blue pigment dispersion dye (A-1/B-1) Example 9 P-2 Blue pigment dispersion dye (A-3) Example 10 P-2 Yellow pigment dispersion / Green pigment dispersion - Example 11 P- 2 Yellow pigment dispersion dye (TA-1) Example 12 P-2 Yellow pigment dispersion dye (Pc-1) Example 13 P-2 No dye (Pc-1/Dl) Example 14 P-2 No dye (Pc- l/D-2) Example 15 P-2 No dye (Pc-l/D-3) Example 16 P-2 No dye (Pc-l/D-4) Example 17 P-2 No dye (Pc-l/ D-5) Comparative Example 1 Q-1 Blue Pigment Dispersion - Comparative Example 2 Japanese Patent Laid-Open Publication No. 2002-293837 - Resin Γ Blue pigment dispersion Dye (A-1/B-1) Comparative Example 3 Q-1 Blue pigment dispersion dye (A-3) Comparative Example 4 Q-1 Yellow pigment dispersion / Green pigment dispersion - Comparative Example 5 Q-1 Yellow Pigment Dispersion Dyes (TA-1) Comparative Example 6 Q-1 No Dyes (Pc-l/D-2) 131 s 201245878 ιζ, ριι [Table 2]

Sensitivity line width widening width (μιτι) Spectral characteristics (Υ value) Contrast adhesion (μηι) Liquid crystal specific resistance Example 1 6.5 7.8 20000 10 〇 Example 2 7.2 8.5 20000 10 〇 Example 3 7.3 8.5 20000 10 〇 Example 4 7.3 8.5 20000 10 〇 Example 5 7.5 8.4 20000 10 〇 Example 6 7.4 8.4 20000 10 〇 Example 7 7.5 8.4 20000 10 〇 Example 8 7.5 7.5 18000 10 〇 Example 9 7.5 8.2 20000 10 〇 Example 10 6.4 65 23000 10 〇 Example 11 6.5 65.1 23000 10 〇Example 12 6.4 65.1 23500 10 〇Example 13 6.5 66.9 29000 10 〇Example 14 6.4 66.8 28000 10 〇Example 15 6.4 66.5 25000 10 〇Example 16 6.3 66.5 25000 10 〇Example 17 6.5 66.1 24000 10 〇Comparative Example 1 6 7.8 20000 25 〇Comparative Example 2 6.5 8.4 20000 25 X Comparative Example 3 5.9 8 18000 25 X Comparative Example 4 5.9 65 22900 25 〇Comparative Example 5 6 66.8 22900 25 X Comparative Example 6 6 66.8 29000 25 X From Table 2, the following is known. . The coloring photosensitive resin composition of the alkali-soluble resin of the present invention using Examples 1 to 17 is excellent in sensitivity and spectral characteristics (Υ value), high in contrast, excellent in adhesion, and large in specific resistance of liquid crystal. The liquid crystal display device obtained by the coloring photosensitive resin composition of Example 17 did not produce an afterimage. On the other hand, in Comparative Examples 1 to 6 in which the alkali-soluble resin of the present invention was not used, the sensitivity and the adhesion were low, and the ratios of the liquid crystals of Comparative Example 2, Comparative Example 3, Comparative Example 5, and Comparative Example 6 were also obtained. The resistance value is also low. 132 201245878 ^ζόΐζρή [Cross Example 18~Example 2〇, Comparative Example 7, Ratio &lt;Production of Color Filter Substrate>~ Paragraph No. [_又编#u_5] of Li Tekai 2〇05· According to the method described, a color matrix, R = halogen, G (green) pixel, and B (blue color = sheet (hereinafter referred to as a color filter, a light substrate) are produced. Here: color filter The substrate size of the light-substrate substrate is 550 mm×650 mm. In the second step, the indium tin oxide is formed by sputtering on the R pixel, the G pixel and the B-crystal and the black matrix of the obtained color filter substrate. (Indium Tin Oxide 'ITO) transparent electrode. &lt;Formation of light spacer&gt; On the ITO transparent electrode of the color filter substrate on which the transparent electrode is formed by sputtering, the rotator is narrowed A coating liquid for a photosensitive resin layer containing the formulation shown in the following Table 3 was applied to the slit. Then, a vacuum dryer VCD (manufactured by Tokyo Ohka Co., Ltd.) was used to partially dry the solvent in 3 sec. After the fluidity of the film disappeared, pre-bake for 3 minutes on a hot plate at 9 ° C. A photosensitive resin layer having a film thickness of 5.2 μm was formed (film formation step). Then, a proximity type exposure machine (manufactured by Kyori Hi-Tech Electronics Co., Ltd.) having an ultrahigh pressure mercury lamp was used in the mask (having a diameter of 15) a quartz crystal exposure mask of a circular pattern of μιη) and a color filter substrate (which is arranged such that the mask faces the photosensitive resin layer) are vertically erected in parallel, and the mask surface and the photosensitive property are made The distance between the surfaces of the resin layer is 100 μm, and the intensity transmitted through the mask at 365 nm is 250 133 201245878 Two μ 1 W/m transmission UV transmission filter (UV-35, Toshiba Glass Co., Ltd. Manufactured by ultraviolet light (exposure step, exposure amount: 200 mJ/cm2). Next, 'Use sodium carbonate-based developer (a product obtained by diluting the following product with pure water by 10 times, the product contains 0.38 mol/liter of carbonic acid) Sodium hydrogenate, 0.47 mol/L sodium carbonate, 5% dibutyl naphthalenesulfonate, anionic surfactant, antifoaming agent and stabilizer; trade name T-CD1 (manufactured by Fujifilm Co., Ltd.) On the 29th (:: the lower and the conical nozzle pressure is 0.15 MPa, the spray development is carried out for 3 seconds, and the pattern image is formed (the development step is followed by the use of the cleaning agent (the following product is diluted 1 times with pure water). Liquid, which contains phosphate, citrate, nonionic surfactant, antifoaming agent and stabilizer; trade name is T_SD3 (made by Fujifilm Co., Ltd.)) and 33. (: lower, conical The nozzle pressure is sprayed by O. 〇2 Mpa for 20 seconds by spraying, and the residue around the formed pattern image is removed to form a cylinder in a manner of 300 μπιΧ300 μηη as the spacing of the root spacers. Shaped spacer pattern. Next, a light spacer was produced on the color filter substrate by subjecting the color filter substrate provided with the spacer pattern to heat treatment (heating step) at 13 ° C for 60 minutes. Here, '1' of the obtained optical spacers are measured from the upper surface of the IOT transparent electrode using a three-dimensional surface structure analysis microscope (manufacturer: ZYG〇c〇rp〇mti〇n, model: ^5022) (parallel to the substrate) The distance from the far side of the two faces to the highest position of the optical spacer (hereinafter referred to as the "height of the optical spacer"), the average of one optical spacer The value is taken as the average height of the light spacer. 134 201245878 42312pif Furthermore, the measurement of the bottom surface of the obtained optical spacer was carried out using an SEM photograph. The result is a cylindrical shape with a diameter of 15.1 μηη and an average height of 4.7 μηη. [Table 3] Example of coating liquid for photosensitive resin layer Example 19 Example 20 Comparative Example 7 Comparative Example 8 1-Methoxy-2-propyl acetate 26 26 26 35 35 Butanone 28 28 28 30 30 Solsperse 20000 0.42 0.42 0.42 0.42 0.42 DPHA solution (76 parts of dipentaerythritol hexaacrylate and 24 parts of 1-decyloxy-2-propyl acetate) 14.2 14.2 14.2 142 14.2 Alkali-soluble resin (solution) P-2 20.5 0 0 0 0 Alkali-soluble resin (solution) P-7 0 20.5 0 0 0 Alkali-soluble resin (solution) P_10 0 0 20.5 0 0 Alkali-soluble resin (solution) Q-1 0 0 0 20.5 0 Alkali-soluble resin (solution) Patent Document 2 Resin 1· 0 0 0 0 20.5 CGI242 (Manufactured by Ciba Specialty Chemicals Co., Ltd., photopolymerization initiator) 0.227 0.227 0.227 0.23 0.23 Hydroquinone monomethyl ether 0.0036 0.0036 0.0036 0.0036 0.0036 Surfactant 1 (Megafac F- 780-F, Dainippon Ink 0.032 0.032 0.032 0.032 0.032 Unit: Part &lt;Production of Liquid Crystal Display Device&gt; Further, a glass substrate was prepared as a counter substrate on the transparent electrode and the counter substrate of the color filter substrate obtained above. Implemented separately for ρνΑ mode Patterning, on which the alignment film containing the polyimine is placed in a stepwise manner. Thereafter, it is placed at a position corresponding to the black matrix frame surrounding the color filter group surrounding the color filter. The sealant of the ultraviolet curable resin is applied by a dropper method, and the liquid crystal for PVA mode is added dropwise, and after the spot is bonded to the substrate, the urethane is pulled by the susceptor, and then the sealant is cured. The two sides of the obtained liquid crystal cell were attached with a polarizing plate hlc2 2518 manufactured by Sarmtz Co., Ltd. 135 201245878 - Τ^, -7 1 ZL/11 Secondly, using FR1112H (Stanley) as a red (R) LED

Wafer type LED manufactured by Electric Co., Ltd.), DG1112H (wafer type LED manufactured by Stanley Electric Co., Ltd.) as green (G) LED, and DB1112H (Stanley Electric Co.) as blue (b) LED ,

The backlight of the wafer type manufactured by Ltd. constitutes a backlight of the side light type, and is disposed on the side of the back surface of the liquid crystal cell in which the polarizing plate is provided, thereby forming a liquid crystal display device. &lt;Evaluation&gt; The following evaluation was performed regarding the light spacer and the liquid crystal display device. The results of the measurement of 疋 = price are shown in Table 4 below. (The cross-sectional shape of the light spacer), and the cross-sectional shape of the light spacer of the salt-like portion of the above-mentioned light spacer was observed with a (IV) type electron microscope. Observe the substrate. In the corners and the center portion of the substrate, a total of five places were performed. The following reference was made to evaluate the cross-sectional shape of the optical spacer. A light spacer having a cross-sectional shape as follows: a taper at 5 is 45. Above 9〇. the following. In the ministry. A light spacer having a cross-sectional shape as follows: C at 5: The following is formed, but does not correspond to the above A. In the section, the taper is the face. Shaped light spacers: any of the five. ‘Up to 100 or less, but not equivalent to the above Α and 136 201245878 ^znzpif Cone produced by the following light spacers: 1 out of 5 to 4, the brooding exceeds 4〇. Above touch. The following range. The light spacers are produced as follows: in all of the five places, the taper exceeds 40 from the upper 100 〇 range. (The height average of the light spacers) The result of the degree of the difference between the 1000 light levels measured in the above-mentioned <Formation of the optical spacers> is calculated as the difference between the maximum value and the minimum value, and is calculated according to the following criteria. Evaluation. The smaller the difference, the better the uniformity. ~ Evaluation criteria ~ A. The difference between the maximum value and the minimum value of the height of the optical spacer is less than 0.2 μηι. Β The difference between the maximum value and the minimum value of the height of the light spacer is 0.2 μm or more and less than 〇3 μιη. The difference between the maximum value and the minimum value of the height of the C* optical spacer is 0.3 μm or more and less than 44 μιη. D. The difference between the maximum value and the minimum value of the height of the optical spacer is 〇·4 μηη or more and less than 〇5 μιη. Ε: The difference between the maximum value and the minimum value of the height of the light spacer is 0.5 μιη or more. (Deformation recovery rate) The obtained optical spacers were measured and evaluated as follows by a micro hardness tester (DUH-W2, manufactured by Shimadzu Corporation). With a 5G μ hip conical table indenter, the maximum load is set to 137 201245878

- Γ^«/ X 50 mN ' The holding time was set to 5 seconds, and the measurement was carried out by a load-unloading test method. From the measured values, the deformation recovery rate was obtained by the following formula, and evaluated according to the following evaluation criteria. The measurement was carried out in an environment of 22 ± 1 ° C and 50% RH. Deformation recovery rate (%) = (recovery amount after load release [μιη] / deformation amount at negative cut time [μπι]) χίοο ~ Evaluation criteria ~ A: The deformation recovery rate is 9〇% or more. B: The deformation recovery rate is 87% or more and less than 90%. C. The deformation recovery rate is 85% or more and less than 87%. D: The deformation recovery rate is 8〇% or more and less than 85%. E: The deformation recovery rate is 75% or more and less than 8〇%. F: The deformation recovery rate is less than 75〇/〇. (The display unevenness of the liquid crystal display device) Gray = crystal display device, by visual observation, the input 2 2 =: ? gray display 'According to the following evaluation criteria, paste ~ evaluation criteria ~ A: no visible, can be obtained B: The edge of the board of the glass plate in the glass plate is slightly == The image is not displayed on the display part, and the image is good. C: It is obvious that the money is rich, but it is not uniform, but it does not affect the practical permission. 138 201245878 42JiZpif Inside. D: Unevenness was found on the display unit. The evaluation results are shown in Table 4 below. [Table 4]

Example 21 Evaluation of cross-sectional shape of alkali-soluble resin Knot height uniformity deformation recovery vehicle display unevenness Example 22 Example 23^ P-2 - Pv BABBBBAA Comparative example ^ ~Comparative example 1 ~~~ Ρ·10 ____Q-1 Patent Document 2 - Resin 1, ABBACCCC~ DEAA _ ^ As shown in Table 4, the example of the optical spacer has a uniform cross-sectional shape, and the height unevenness is suppressed. Further, in the liquid crystal display device including the photo spacer, display unevenness is suppressed. [Example 24; | &lt;Formation of protective &] In the production of a color filter substrate, after forming a black matrix, R 昼, G 昼 and B 昼, the black matrix and each pixel are advanced. The photosensitive resin composition of the above-mentioned Example 21 was applied by step exposure without exposure to a mask (the entire surface exposure), and heat treatment was performed to form a protective film. Here, as conditions for coating, exposure, and heat treatment, the conditions of coating, exposure, and heat treatment in the formation of the optical spacer of Example 21 were the same except that the exposure was not carried out through the mask. Further, a transparent electrode of ιτο (following Tin0xide) is formed on the resulting protective layer by a money bond. MIT0 &lt;Formation of Light Spacer&gt; 139 201245878 On the IT〇 transparent electrode formed above, the photosensitive shaft grease group used in Example 2I was used as the silk resin group filament, and by the example 21 The optical spacer is formed in the same manner. &lt;Production and Evaluation of Liquid Crystal Display Device&gt; The liquid crystal display device was produced by the same method as in Example 12 using the color filter substrate on which the photo spacer was formed. The obtained protective film and liquid crystal display device were evaluated by the same method as in Example 21. The evaluation results are shown in Table 5. [table 5]

As shown in Table 5, the use of the photosensitive resin composition of the present invention to form a thin film was also obtained as a result of the formation of the shed spacer. [Simple description of the schema] Benefits. [Main component symbol description] 140

Claims (1)

201245878 42312pif VII. Patent application: 1. A photosensitive resin composition which contains at least a group having an acidic group at the side chain and two or more kinds of polymerizable unsaturated groups different from each other (A) ), a polymerizable compound (B) and a photopolymerization initiator (c). 2. The photosensitive resin composition according to claim 1, which further comprises a colorant. 3. The photosensitive resin composition as described in claim 1, wherein the alkali-soluble resin has a repeating unit represented by the following formula (A): Formula (A) [Chemical Formula 2] (In the formula (A), R represents a hydrogen atom or a methyl group; R1, r2, R3, and R4^R5 are each a hydrogen atom, a halogen atom, a cyano group, an alkyl group or an aryl group). The photosensitive resin composition according to the first aspect of the invention, wherein the alkali-soluble resin has a repeating 141 201245878 unit represented by the following formula (A) and a formula represented by the following formula (B) Repeat unit formula (A) [Chemical 3] R CH2-C- C=0 *?4R3 Rl ό-cc=c R5 3 (4 In the formula (A), R represents a hydrogen atom or a fluorenyl group, and R], R2, ^R and R respectively represent hydrogen Atom, halogen atom, aryl group, alkyl group or square group) Formula (B) [Chemical 4] (In the formula (B), R represents a hydrogen atom or a methyl group). The photosensitive resin composition according to the first aspect of the invention, wherein the alkali-soluble resin has a unit represented by the following formula (A): 142 201245878 42312pif unit, represented by the following formula (B) a repeating unit and a repeating unit represented by the following formula (c): Formula (A) [Chemical 5] ,. (4 in the formula (4) towel, R represents a hydrogen atom or a methyl group, R1, R2, aryl) and R5 respectively represent a hydrogen atom, a _ atom, a ruthenium group, a burnt group or a formula (B) [Chem. 6] (In the formula (8), R represents a hydrogen atom or a methyl group) 143 201245878 JL Formula (c) [Chem. 7] (In the formula (C), R represents a hydrogen atom or a fluorenyl group, and χ represents a divalent linking group 'Ac represents a (meth) acryloxy group). 6. The photosensitive resin composition according to claim 3, wherein 'the repeating unit represented by the general formula (A), the repeating unit represented by the general formula (B), and the pass In any of the repeating units represented by the formula (C), R is a fluorenyl group. 7. The photosensitive resin composition according to claim 3, wherein, in the repeating unit represented by the formula (A), R is a fluorenyl group, and R1 to R5 are each a hydrogen atom. 8. A color filter, a protective film, a photo spacer, or a substrate for a liquid crystal display device, which is obtained by using the photosensitive resin composition according to the first aspect of the invention. A method of producing a color filter, comprising: a step of forming a colored layer, applying the photosensitive resin composition according to item 2 of the patent application to a support to form a colored layer; 144 201245878 42312pif exposure step, The colored layer is subjected to pattern exposure to form a latent image; and a developing step is performed to develop the colored layer on which the latent image is formed to form a pattern. 10. A liquid crystal display device or a solid-state imaging device, comprising: the color filter according to claim 8 of the patent application, which is manufactured by the method for producing a color filter according to claim 9 Color filter, protective film or light spacer. A resin comprising a repeating unit represented by the following formula (1-1), a repeating unit represented by the following formula (2-1), and a repeat represented by the following formula (3-1) Unit: General formula (1-1) [Chemical 8] General formula (2-1) [Chemical 9] 145 201245878 General formula (3-1) [Chemical 10] -t*CH2&quot;C— Q—Ο 0 one X-Ac (In the formula (3-1), X represents a divalent linking group, and Ac represents a (meth)acryloxy group). 12. The resin according to claim 11, wherein 90 mol% or more of the repeating unit constituting the resin is a repeating unit represented by the formula (1-1), and the formula (2) -1) Any of the repeating unit represented by the above and the repeating unit represented by the above formula (3-1). 13. The resin according to claim 11, wherein the resin comprises 40 mol% to 80 mol% of the repeating unit represented by the formula (1-1), and the general formula (2 - 1) T table $ 缲〇 缲〇 back to L unit 1 5~3 0 乇杳 and the repeating unit represented by the general formula (3-1) 1 mol% ~ 30 mol%. 146 201245878 Τ 厶-ϊ 1 厶 pif IV. Designated representative map: (1) The representative representative of the case is: None. (2) A brief description of the component symbols of this representative figure: None. 5. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention: General formula (A) General formula (B) 201245878 Formula (c) CH2-C' O-X-Ac 201245878 ^z^izpifl is the 101114563 Chinese manual without a slash correction. This revision period: 发明1 July 31 invention patent specification (this specification format, order and bold type 'Do not arbitrarily Change, please do not fill in the ※ mark. ※Application number: μ/&quot;(5) Π: ※Application deadline: 丨叫 "IPC classification one, invention name: (Chinese / English) ... photosensitive resin composition, color filter Light sheet, protective film, optical spacer, 0 substrate for liquid crystal display device, liquid crystal display device, and solid-state imaging device PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER, PROTECTIVE FILM, PHOTO SPACER, SUBSTRATE FOR 1ΐ〇ϋϊ&amp;ΐ^Ϊ5Τ&amp; LIQUID CRYSTAL DISPLAY AND AND SOLID-STATE IMAGE SENSING DEVICE 2. SUMMARY OF THE INVENTION The present invention provides a photosensitive resin composition which is excellent in poly-suppression property at the time of exposure, and has high exposure sensitivity, even in a short heat treatment time. An optical spacer, uniformity, or uniformity of color pattern, uniformity of cross-sectional shape, and uniformity of height uniformity Of the protective film is excellent. A photosensitive resin composition comprising an alkali-soluble resin (A) having at least an acidic group and at least two different polymerizable unsaturated groups in a side chain, a polymerizable compound (B), and photopolymerization Starting agent (c). III. Summary of the Invention of the Invention: A photosensitive resin composition having excellent η 201245878 Revision date: July 31, 101 is the Chinese manual of No. 101114563. There is no slash correction. 6. Description of the Invention: Technical Field of the Invention The present invention relates to A photosensitive resin composition. Further, there is a color filter moon, a protective iridium, a light spacer, and a substrate for a liquid crystal display device using the photosensitive resin composition. Further, there is a liquid crystal display device and a solid-state imaging device using the color filter or the like. [Prior Art] ο ο A liquid crystal display device is widely used in a display device for displaying a high-quality image. The display device substrate (for example, a color filter substrate, a driving substrate, or the like) has a structure in which a structure such as a colored pattern or a protective film is formed on the substrate. As a coloring pattern or a method for forming a protective film or a light spacer in these structures, a method of forming a photosensitive resin composition by photolithography has become mainstream. The photosensitive resin composition has been subjected to various studies since the past, and for example, a photosensitive composition using a copolymer of a vinyl-based unsaturated compound such as an ethylenically unsaturated carboxylic acid and a specific photopolymerization initiator has been disclosed (for example, Reference is made to the patent document 〇. Further, it is disclosed that a hard substance contains a group of an aliphatic cyclic ketone group having an oxime structure and an aliphatic cyclic hydrocarbon group having a characteristic structure. There is a structural structure of an acid official and a molecular structure having a self-assembled structural unit (for example, refer to Patent Document 2). Soil is used as a color light-emitting sheet used in a liquid crystal display device, and a pigment dispersion method is widely used. There is a pigment dispersion method = various senses of the new tree, the surplus of the towel is scattered, and the new resin is replaced. 5 201245878 * χ »· For the 101111563 Chinese manual, there is no slash correction, this revision date, the July illusion, borrow A method of producing a color filter by photolithography. As for the method, since it contains a pigment, it is stable to light or heat, and is patterned by photolithography. The color filter which is used in a liquid crystal display device or the like can be sufficiently ensured, and it is suitable as a coloring agent used in the production of a color filter, not only for the pigment but also for the dye. Pigment compounds other than pigments have also been extensively studied. Among them, dyes are known to have triarylmethane dyes, pyridinium-based dyes, pyrimidine azo dyes, oxazoline dyes, diphenyls, The compounding amount of various pigment precursors such as a meridane dye and a phthalocyanine dye (see, for example, Patent Document 3 to Patent Document 5). ° If a dye is used as a coloring agent, it is useful in the following points: The color of the color or the color of the color is increased by the brightness of the image; the color tone or brightness of the image is not displayed. Moreover, if a specific fine compound is used as the dye, the light-emitting sheet excellent in contrast ratio is obtained (for example, refer to the patent). Document G). Another aspect is also known as a photosensitive resin group using a coloring agent such as a dye and a resin binder having a specific structure of unsaturated soil = Tienan (4) Refer to Patent Document 7), etc., to give first lithiation or tolerance to [rh] [previous technical literature] [patent literature] [patent document 1] Japanese Patent Special Open Survey No. 65, 20124587^ ϋ 101114563 Japanese Unexamined Patent Publication No. JP-A No. 2-293837 [Patent Document 3] Japanese Patent Laid-Open Publication No. Hei. [Patent Document 5] Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. Hei. Patent Laid-Open No. 2-9169231 [Summary of the Invention] 〇〇继Λ The tree-forming substrate is a pattern structure ^ (for example, a light spacer and a color pattern. In the case of the same or the following, there is a case where only (four) exposure causes the polymerization hardening to become insufficient, and there is a case where heat treatment at a high temperature is required after exposure and development. The present invention is based on the above facts, and is achieved in order to achieve the following objectives. The object of the present invention is to provide a polymerization hardening during exposure, a so-called high exposure sensitivity, and a spectral characteristic. A photosensitive resin composition excellent in excellent resistance and excellent specific resistance of liquid crystal. According to the shape 4: the second object provides, for example, a spacer which can form a protective film having an excellent cross-sectional shape, and a uniformity or a hardness. The purpose of the invention is to provide a substrate and display for a crystal-inhibiting display device in a liquid crystal display device. Based on the situation, the inventor of the present application conducted an active research, and the result was issued. 7 201245878 Revision period: July 31, 101, No. 101114563 Chinese manual, no drawing u-line repair by the photosensitive composition t In the test-soluble resin to be contained, two or more kinds of polymerizable unsaturated group-based solvent-soluble resins are used, and the light-crosslinking and the shadow-shaping treatment by patterning by the light micro-f彡 method are successively performed. The thermal crosslinking at the time of heat treatment is performed, whereby the crosslinked structure is made dense, and the above problems can be solved. The specific means for achieving the problem are as follows. (1) A photosensitive resin composition comprising an alkali-soluble resin (A) and a polymerizable compound (b) having at least a group having an acidic group and two or more different polymerizable unsaturated groups in a side chain. And a photopolymerization initiator (C). (2) The photosensitive resin composition according to (1), which further contains a colorant. The photosensitive resin composition as described in (1) or (2), wherein the alkali-soluble resin has a repeating unit represented by the following formula (A): Formula (A) [Chemical 1 ] 〇«〇 I shame o-c-c=c k 4 (In the general formula (A), 'R represents a hydrogen atom or a methyl group, and Ri, r2, 201245878 is No. 101114563. The Chinese manual has no underline correction. This revision date: July 31, 2011, R3, R4, and R5, respectively. It is a hydrogen atom, a halogen atom, a cyano group, a alkyl group or an aryl group. (4) The photosensitive resin composition according to the above formula (1), wherein the alkali-soluble resin has a repeating unit represented by the following formula (A) and represented by the following formula (B) Repeating unit: General formula (A) [Chemical 2] (In the general formula (A), R represents a hydrogen atom or a methyl group, and ruthenium, R2, R3, R4 and R5 respectively represent a nitrogen atom, a sulphur atom, a cyano group, a decyl group or an aryl group) [Chemical 3] 9 201245878 Revision date: July 31, 101 is the Chinese manual No. 101114563. There is no underline correction (in the formula (Β), R represents a hydrogen atom or a sulfhydryl group). (5) The photosensitive resin composition according to (1) or (2), wherein the alkali-soluble resin has a repeating unit represented by the following formula (Α), and is represented by the following formula (Β) Repeating unit and repeating unit represented by the following formula: General formula (Α) [Chemical 4] Aryl) Others Residual Atoms, _Phase Atoms, Cyano Groups, Hyun Groups General Formula (B) [Chem. 5] 201245878^ The Chinese Manual No. 101114563 has no underline correction. This revision period: 1〇丨July 3i / t --ch2-o—C〇2H (in the formula (B), R represents an argon atom or a fluorenyl group) Formula (C) [Chemical 6] Ο 〇—X—Ac J (In the formula (c), R represents a hydrogen atom or a fluorenyl group, x represents a divalent linking group, and Ac represents a (meth) acryloxy group). (6) The photosensitive resin composition 'wherein' according to any one of (3) to (5) is represented by the repeating unit represented by the above formula (A), and the formula (B) In any of the repeating unit and the repeating unit represented by the above formula (C), R is a fluorenyl group. (7) The photosensitive resin composition according to any one of (3) to (6), wherein in the repeating unit represented by the above formula (A), 'R is a sulfhydryl group, &amp;~ R5 is a hydrogen atom. (8) A color filter, a protective film, a light spacer, or a liquid crystal display 11 201245878 i. ± No. 101114563 Chinese manual without a slash correction substrate for the device 'used as used in (1) to (7) The photosensitive resin composition is described. (9) A method for producing a color filter or a light sheet, comprising: a colored layer forming step of forming a coloring layer by turning the four photosensitive resin composition according to any one of (2) to (7) onto a support; Step 'to the thick of the reed; 隹I is the exposure of the baline pattern, forming &gt;1 Revision date: July 31, 2011, the formation of the shadow = formation of the surface of the latent image The layer is displayed as a second shot, which comprises a 冰 制 ^ 古 古 古 古 古 制 制 藉 藉 藉 藉 彩色 彩色 彩色 彩色 彩色 彩色 彩色 彩色 彩色 彩色 彩色 彩色 彩色 彩色 彩色 彩色 彩色 彩色 彩色 彩色 彩色 彩色 彩色 彩色 彩色 彩色 彩色 彩色 彩色 彩色Complex unit, the following formula (1)) (4) _ $(1)) (1)) The unit of the surface of the shirt is not repeated and the following general formula (1-1) [Chemical 7] 201245878, Revision date: July 31, 1st, 1st Chinese translation for the 1st m4563, no underline correction, general formula (2-1) [Chem. 8] General formula (3-1) [Chemical 9] (In the formula (3-1), X represents a divalent linking group, and Ac represents a (meth)propenyloxy group). (12) The resin according to (11), wherein 90 mol% or more of the repeating unit constituting the resin is a repeating unit represented by the above formula (1-1), and the formula (2-1) Any of the repeating unit represented by the above and the repeating unit represented by the above formula (3-1). (13) The resin according to (11) or (12), wherein the resin comprises the repeating unit represented by the formula (1-1): 40 mol% to 80 13 201245878 Revision date: July 2011 31 is the Chinese manual of No. 101114563, without the singularity mol%, the repeating unit i _% to % mol% represented by the above formula (2-1), and the repeating unit represented by the general formula (3-1)] Mol%. [Effects of the Invention] According to the present invention, it is possible to provide a photosensitive resin composition which is excellent in polymerization hardenability at the time of exposure, so that the exposure sensitivity is high, and the contour characteristics are excellent even with a short heat treatment time. A light-shielding member having a uniformity of a coloring pattern and a cross-sectional shape and excellent uniformity of horsepower, and a protective film excellent in hardness. Further, the present invention can provide a display device substrate and a display unevenness suppressing display device which can suppress display unevenness when used in a liquid crystal display device. [Embodiment] Hereinafter, the photosensitive resin composition of the present invention will be described in detail, and the color ray-reel film, the optical spacer, the display-transfer board, and the liquid crystal display of the present invention using the photosensitive resin composition will be described in detail. Detailed description. In the specification of the present application, "~" is used in the sense that the numerical value described before and after is included as the lower limit and the upper limit. In the present specification, '(methyl)-propyl acetoacetate is used in the sense of containing acrylic acid g and methyl (tetra) vinegar. Further, the photosensitive resin composition of the present invention is characterized in that it contains an acidic group and two or more polymerizable unsaturated groups which are different from each other. 14 201245878 I-Cpifl is No. 101114563 The specification is not corrected by the sizing. The date of revision: July 31, 101, the resin (A), the polymerizable compound (B), and the photopolymerization initiator (C). The photosensitive resin composition of the present invention may be further formed by using a coloring agent, an organic solvent, and various additives as needed. In the following, the photosensitive resin composition of the present invention may be simply referred to as "the composition of the present invention" or "composition". Further, the term "alkyl group" is a general term for a linear group, a branched chain or a cyclic alkyl group as long as it is not particularly limited, and is an alkyl group having a substituent and an alkyl group having no substituent. &lt;Alkali-soluble resin (A) &gt; The alkali-soluble resin used in the present invention is characterized by having a group having an acidic group and two or more polymerizable unsaturated groups which are different from each other. The photosensitive resin composition of the present invention preferably contains an alkali-soluble resin (A) in a proportion of 10% by mass to 50% by mass of the solvent-removing component, more preferably 15% by mass to 45% by mass. Alkali-soluble resin (A). The acidic group may, for example, be a carboxyl group, a sulfonic acid group, a hydroxy acid group, a salicylic acid group or a ureido group, and more preferably a carboxyl group. The acidic group may be only one type or two or more types. The acidic group is preferably embedded in the alkali-soluble resin as a repeating unit containing an acidic group. As the repeating unit containing an acidic group, it is preferable to contain a ratio of 3 mol% to 50 mol% in the test-soluble resin, and more preferably a ratio of the melon (10) to (9) coffee, and further preferably contain ^ then 炚 ~35 mol% ratio. Two or more kinds of polymerizable unsaturated groups which are different from each other can be exemplified by (meth) propyl 15 201245878 ιζ, ριιι Amendment date: July 31, 101 is No. 101114563 Chinese manual without scribe correction = oxygen species to A person The polymerizable unsaturated group having a different f on the U t is preferably used as a hetero-group of the Wei unit. As the money unit containing the polymer base, the total of the repeating units containing the polymerizable unsaturated group is 4% by weight of the test-soluble resin, and more preferably 50% by weight to 9% by mole. 1%. Further, as the polymerizable unsaturated group having two or more kinds different from each other, it is preferable to contain a complex unit containing a (meth)propenyloxy group and a repeating unit containing a vinyl group, and it is preferable to contain (?) (4) The repeating unit of the oxime group is 1 mol% to 30 mol%, and the repeating unit containing a vinyl group is 4 〇m 〇 1% to 80 mol%. The alkali-soluble resin used in the present invention preferably has a repeating unit represented by the following formula (A), and more preferably has a repeating unit represented by the following formula (A) and a formula More preferably, the repeating unit represented by the formula (B) has a repeating unit represented by the following formula (A), a repeating unit represented by the formula (B), and a formula represented by the following formula (c) Repeat unit. General formula (A) [Chem. 10] 16 201245878 Revision date: July 3I, July 1st, 2011 No. 101114563 Chinese manual, no underline correction, R4R3R1 o-c-c-c r5 r2 / R TcH2-C 一 〇-〇 〇 (In the formula (4), R represents a hydrogen atom or a methyl group, H aryl 3 group. 4) and I respectively represent a hydrogen atom, a sulfonyl group, a cyano group, a decyl group or a formula (B). Ο (In the general formula (B), the general formula (C) R represents a hydrogen atom or a sulfhydryl group [Chemical 12] 17 Modified period: July 31, 2011 201245878 ΙΖ, ρυ.1 No. 101114563 Chinese specification Line repair D—X—Ac (In the formula (C), R represents a hydrogen atom or a methyl group, χ represents a divalent linking group, and Ac represents a (fluorenyl) acryloxy group.) Formula (A) to Formula ( Preferably, r in c) is a fluorenyl group. The halogen atom, the alkyl group and the aryl group in Ri, I, R3 and R4 and the following may be exemplified. Specific examples of the halogen atom include α, a step, and j. The alkyl group may be a linear knives or a ring, and examples thereof include a methyl group, a n-propyl group, an isopropyl group, a tert-butyl group and the like, and an alkyl group having a carbon number of 1 to 7 is preferred. Examples of the aryl group include a phenyl group, a furyl group, and a naphthyl group. Ri, the ruler 2, I, R4 and R5 are each preferably a hydrogen atom, and more preferably a hydrogen atom. The oxime in the formula (C) represents a divalent linking group, preferably a linear, branched or cyclic substituted or unsubstituted alkylene group, or a stretching group, and a group selected from the group consisting of - _, _ (: (=0) _ and _ _ _ at least one or more combinations of soils. The alkyl group may have a substituent, for example, a hydroxyl group. The carbon number of the alkyl group is preferably 1 Preferably, Ac in the formula (C) is a mercaptopropenyloxy group. The solvent-soluble resin comprises: preferably 20 mol% to 9 〇m〇p/., more preferably 18 201245878n is the 10th. ^114563 Chinese manual no slash correction This correction date: July 31, 101 is 40 mol% ~ 80 mol% of the repeating unit represented by the above formula (A), preferably 10 mol% ~ 35 mol%, more preferably 15 mol% to 30 mol% of the repeating unit represented by the above formula (B), preferably 1 mol% to 30 mol% of the above formula (C) The repeating unit represented by the above formula (A) is preferably a repeating unit represented by the following formula (A-1): Formula (A-1) 0 [Chemical 13] The repeating unit represented by the above formula (B) is preferably a repeating unit represented by the following formula (B-1). General formula (B-1) [Chem. 14] 19 201245878 Revision date: July 31, 101 This is the first repetition of the Chinese manual (C-1) in No. 114563. 〇-χ-Ac (in the formula (3-1), X represents a divalent linking group, a group) acryloxy group. And X in the formula (3-1) is preferably a straight chain, a branched or a cyclic group; a substituted or unsubstituted alkylene group, or a substituted alkyl group '-C (flanked by Further, at least one of the combinations of the above-mentioned groups may be exemplified by a hydroxyl group. The carbon number of the alkyl group is preferably -15. Ac in the formula (3-1) is preferred. Further, the alkali-soluble polymer used in the present invention may contain other repeating units within the scope of the present invention without pain. The other repeating ones are preferably alkali-soluble polymerization.物m〇1%~3〇m〇1%, more preferably mol%~20 m〇l%, further preferably 〇m〇1%~1〇m〇1% &amp; other repeating units Preferably, the following formula (D) shows the same name of the unit 0-20 201245878 IA JL Revision date: July 31, 101 is the 101114563 Chinese specification without a slash correction of the general formula (D) [ 16] 〇 (In the formula (D), R represents a hydrogen atom or a fluorenyl group, and Α represents an organic group.) R is preferably a fluorenyl group. A is preferably a linear, branched or cyclic substituted or unsubstituted alkylene group. The alkylene group is preferably; the δ carbon number is 丨~2〇. Further, the substituent is preferably a hydroxyl group. The alkali-soluble resin used in the present invention preferably contains substantially no repeating unit other than the repeating unit represented by the formula (Α) to the formula (D). The term "substantially free" means an impurity or the like, and is usually 1 mol% or less. The molecular weight of the alkali-soluble resin used in the present invention is not particularly specified. The weight average molecular weight is preferably from 1 〇〇〇 to 2 χΐ〇 5, more preferably from 2 〇〇〇 to 1 x 10 5 5, and further preferably 5 〇. 〇〇~lxl〇4. The test resin used in the present invention is preferably synthesized by polymerizing at least a monomer represented by the following formula I. Formula I [Chem. 17] 21 201245878 No. 101114563 Chinese specification without scribe correction This revision date: July 31, 101 H2C=CR c=o D EH 13 Γ&lt;4 K3 113⁄4 〇~cc=c I t Rs R2 (In the formula I, R represents a hydrogen atom or a fluorenyl group, and Ri, R2, R3, R4 and R5 are each a hydrogen atom, a halogen atom, a cyano group, an alkyl group or an aryl group.) Further, in the present invention The test resin to be used is preferably synthesized via the following Formula II or Formula III, and more preferably synthesized via Formula II. Formula II [Chem. 18] (In the formula II, R represents a hydrogen atom or a fluorenyl group, and Ri, R2, R3, R4 and R5 are each a hydrogen atom, a halogen atom, a cyano group, an alkyl group or an aryl group.) Formula III [Chem. 19] 22 201245878 H-zjizpifl Revision period: July 31, 101 is the 101111563 Chinese manual without a slash correction CHa'C-- c=o 〇-r6-〇h (In the formula II, R represents a hydrogen atom or a fluorenyl group, and R!, R2, R3, R4 and Rs each represent a hydrogen atom, a halogen atom, a cyano group, an alkyl group or an aryl group, and R6 represents a carbon number of 2 to 8 The alkyl group.) R, R1, R2, R3, r4, and 5 in the above formula I to formula III and r, Ri, and R2 in the above formula (a) to formula (c), respectively. R3, I, R5 and Re are synonymous, and the preferred ranges are also synonymous. The monomer which is not coated can be synthesized by subjecting the following alcohol-propenyl group or methacryl group having an unsaturated group to an esterification reaction. 1 representative compound may be exemplified by acryl alcohol, 2-mercaptopropenol, croton chloropropene + alcohol, 3 - styryl-2-nene-1-ol, 3,3-diphenylen-1-ol, 3 -Bromo-3-phenyl-2-propen-1-ol, 2-methyl-3 | quinone + alcohol, 2·methyl _33_m (tetra) xylate 3 - benzyl 1 propyl group. j,3 a base-2-propen-1-ol, 2·ethyl=propanol, 2,3_diphenyl_2^heptaol, U,3-triphenyl_2_propene^' :=2-propane-alcohol, 1-phenyl-2-propanol+alcohol, i 2_其,3_四本基_2·丙妇七 methyl1propene+alcohol,丨·cyclohexyl _2_propen-1-ol, 丨_phenylhexyl·2' propylene glycol, 2-block _2-propane 23 201245878 Revision IE date: July 31, 101 is No. 101114563 Chinese manual no plan Line correction of the present dil-1-ol, 1-bromo-2-propan-1-ol, U cyan-2-propanol, 3-phenyl-2-propanol, 3-di-2-propene Small alcohol, 2-methyl hydrazine chloride, drunk, 2-methyl phthalocyanine-2-propanol, 2|3_phenyl (10) chlorocinnacol), 2-prepared 3-phenyl-2-propene (1) Stinyl cinnamic alcohol), -3-phenyl-2-propene small alcohol, gas cinnamyl alcohol, 2_yl alcohol _3, phenyl -2- propylene-1-ol (2-#l cinnamyl alcohol), 2 ϋ two dilute + alcohol (2_ gas 212-propanol (2-molyl alcohol per, 2-chloro-3,3-difluoro-2-propanol, 2|3_gas_2_ propylene + Alcohol, 2,3-di-di-2-propanol, 2-chloro-3-indolyl-2-propanol, etc. As an acidic group, it is not sufficient to have the formula The vinyl group-containing compound containing an acidic group may be any one, for example, it is described in the Polymer Materials / Handbook [Basic Editing] Pei Feng Museum (1986). Acrylic, alpha and/or beta substituted acrylic acid (for example, ethoxylated, α-ethoxylated fluorene, α-(2-amino) fluorene, α-gas, α-bromine, α_ Fluorine, ... tributyl decyl, α-cyano, β-chloro, β bromine, ... chloro-hydrazine - fluorenyl, α, β-di, etc., methacrylic acid, itaconic acid , itaconic acid half esters, itaconic acid hemidecylamine, crotonic acid, 2-alkenyl carboxylic acid (eg 2-pentenoic mad (^(1), 2-methyl-2) - hexanoic acid (2-11^丫1-2-116乂611〇1〇acid), 2-octenoic acid, 4-mercapto-2-hexanoic acid, 4-ethyl -2-octenoic acid, etc.), maleic acid, maleic acid half ester, maleic acid hemidecylamine, vinyl benzene carboxylic acid, vinyl benzene sulfonic acid, vinyl sulfonic acid, vinyl phosphonic acid, two a vinyl or allyl half ester derivative of a carboxylic acid and The substituent of the acid or sulfonic acid ester derivative and the guanamine derivative contains the same. 201224878^ Revision date: July 31, 2011 is the 101111563 Chinese specification. The alkali-soluble resin used in the invention may have at least a monomer represented by the formula I and a monomer having at least an acidic group as described in the above formula and formula III, and further optionally with (mercapto)acrylic acid. The hydroxyalkyl ester is copolymerized to thereby obtain a copolymer having the unsaturated group. The alkyl group of the (hydroxy) hydroxyalkyl acrylate is an ethyl group, a propyl group and a butyl group. The monomer for introducing the structural unit may be exemplified by 2-hydroxyindoleethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 4-hydroxybutyl acrylate. Ester and methacrylic acid 4-pyridyl vinegar and the like. The (meth) acrylate-containing compound which reacts with the acidic group and/or the (meth)acrylic acid via the base group is a (meth) acrylate having an epoxy group or may have a substituent (Mercapto) acrylonitrile alkyl isocyanate and (meth) propylene helium gas. The (meth) acrylate having an epoxy group is preferably, for example, a compound represented by the following structural formula (1) and a compound represented by the following structural formula (2). Υ Structural formula (1) wherein 'in the structural formula (1), R1 represents a hydrogen atom or a methyl group. 25 201245878 I ^ Λ Λ. Λ. Λ. For the Chinese manual No. 101114563, there is no slash correction. The revised period: July 31, 101. U shows the organic group ^_ is a linear 'branch' or a ring Or an unsubstituted hetero group or a group comprising at least one of a combination of at least one of _q_)_ and -NH- is more preferably a base. The substituent which the extension base may have is, for example, a secret. The number of the stretched base is preferably 1 to 15, more preferably 1 to 4. [Chem. 21] R2 In the structural formula (2), R2 represents a ruthenium atom or a ruthenium group. L2 represents an organic group. W represents a fat nucleus of 4 贞 ring ~ 7 贞 ring. L2 is preferably a linear, branched or cyclic substituted or unsubstituted alkylene group, or a pendant alkyl group and at least one selected from the group consisting of _〇_, _C(=〇)_&amp;_nh_ More preferably, the alkyl group is an alkyl group. The substituent which the alkylene group may have may be, for example, a hydroxyl group. The carbon number of the alkylene group is preferably 15, and more preferably 1 to 4. Among the compounds represented by the structural formula (1) and the compound represented by the structural formula (2), a compound represented by the structural formula (丨) is more preferred. In the structural formula (1) and the structural formula (2), it is more preferable that L1 and L2 are each independently a base of a carbon number of 1 to 4. The compound represented by the structural formula (1) or the compound represented by the structural formula (2) is not particularly limited, and examples thereof include the following exemplified compounds 26 201245878 MZ. J izpifl Revision period: July 31, 1 The Japanese manual No. 101114563 has no scribe line correction (1) to exemplified compound (10). [化22] The (fluorenyl) acrylonitrile alkyl isocyanate compound which may have a substituent is a (fluorenyl) acrylonitrile group bonded to an isocyanate group (-NCO) via an alkylene group having 2 to 6 carbon atoms. Specifically, it can be exemplified: 2-propenyl fluorenyl 27 201245878 1 厶pj_A 1 is the (9) u side number Chinese reward book without underline repair county correction date side ¥ July 3 丨 ethyl isocyanate vinegar and 2-methyl Acetyl ethyl isocyanate and the like. 2_Methyl acrylonitrile ethyl isocyanate is commercially available as "karenz MOI" manufactured by Showa Denko Co., Ltd., and the like. As the (meth)-based chloroform compound, the propylene gas or the thiol propylene sulfonium hydride can be further copolymerized with other monomers in the form of the alkali-soluble resin of the present invention. . - other monomer - the other monomer is not particularly limited, and examples of the monomer having a branch having a branched and/or alicyclic structure include styrene, acetoacetate T, vinyl ether, Vinyl esters, (meth) acrylamides, etc., preferably (fluorene methacrylate) vinegar, vinyl vinegar and (meth) acrylamide, more preferably fluorenyl (meth) acrylate Vinegar. A specific example of the monomer is a (meth) acrylate having an alicyclic hydrocarbon group having 5 to 20 carbon atoms. Specific examples thereof include (meth) enoic acid (bicyclo-2,2,1-heptyl-2) vinegar, (ada) (meth)acrylic acid adamantyl ester, and (meth)acrylic acid _2-adamantyl ester. , (meth)acrylic acid _3_mercapto-1-adamantyl ester, (mercapto)acrylic acid _3,5-diindenyl-b-adamantyl oxime, (methyl) acrylic acid -3- Ethyl adamantyl ester, _3_mercapto-5-ethyl-1-adamantyl (meth)acrylate, _3,5,8-triethyl 丨 金 gold, (meth)acrylic acid, Alkyl ester, (meth)acrylic acid-3,5-dimethyl-8-ethyl-1-adamantyl ester, (8) hexamethylene (meth) acrylate _4,7-methylene (menthan〇1)茚_5_yl ester, octahydro-4,7-methylene fluoren-1-yl decyl (meth) acrylate, 1-1 mentyl (meth) acrylate, tricyclo (meth) acrylate Mercaptoester, (meth)acrylic acid-3-chyl-2,6,6-trimethyl-bicyclop?heptyl ester, (meth)acrylic acid_3,7 7_ 28 201245878ιχ Revised date July 31 For the Chinese manual No. 114563, the ruthenium trimethyl 4-hydroxy-bicyclo[4.1.0]heptyl ester, (decyl)acrylic acid (norbornyl) borneyl ester, Yue-yl) acrylate, isobornyl acrylate, (Yue-yl) acrylate, fenchyl group (fenchyl) ester and (meth) acrylate _2 two 5-trimethyl-cyclohexyl acrylate and the like. Preferred among these (meth)acrylic acid S are mercaptopropionic acid cyclohexyl vinegar, (meth)acrylic acid (lowering) borneol base, (mercapto) succinic acid, and (methyl) Acrylic acid - acetol vinegar, (meth)propionic acid _2 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ Mercapto vinegar, etc., particularly preferred are sulfhydryl (10) domain hexanyl, methyl acrylic acid (lowering) borneol-based vinegar, (mercapto) acrylic isobornyl vinegar and (meth) acrylic acid _2_金刚Base ester. Further, a (meth) propylene vinegar having no branching and/or alicyclic structure, a styrene and a styrene or a monomer having a dibasic acid anhydride group or a hydrocarbon alkenyl group may be used. ^ s swallow /, the B-group is not particularly _, for example, a spleen base or the like. The dibasic acid anhydride group is not particularly limited, and examples thereof include a ketone group and an ikonic anhydride group. The vinyl ester group is not particularly limited. For example, the group is not particularly limited, and for example, butyl: the composition of the mole %, and more preferably 0_% to i (wr. m〇U~20) As a specific example of the test of the solubility tree used in the present invention, for example, 29 201245878 is the Chinese manual of No. 101114563, and there is no slash correction. This correction date: July 31, 101, the following formula P-1 to P are listed. Compound represented by -18. CH3—ch2-c— co2h a ch3 ch2-c—co2ch2ch=ch2 b ch3 ~*CH2**C~*&quot; P-1 a ; b : c = 20,0 : 76,0 : 4,0 (mol%) P-2 a : b : o = 24.0 : 70.0 ; 6.0 (mol%) P-3 a : b : o = 24.0 : 60.0 : 16.0 (moi%) P-4 a : b : o = 24.0 : 50.0 : 26.0 (mol%) CH3 —ch2-c—co2h a ch3 CH3 —ch2-c—— —ch2-c—co2ch2ch=ch2 C〇2 b , P-5 a ; b : o = 20.0 : 76,0 : 4.0 (mo!%) HO^ P-6 a: b : c = 24.0 : 70,0 : 6.0 (mol%) P-7 a : b : c = 24.0 : 60,0 :16.0 (mol%) P-8 a : b : c = 24.0 : 50.0 : 26.0 (moi%) [化25] 30 201245878 ^zjizpufl is the 101114563 Chinese manual without a slash correction Corrected flood season: 1〇1 July 31 CH3 •CHfC- co2h ch3 -CH2~C— co2ch2ch=ch2 ch3 ch2~c——C〇2 P-9 a : b : c = 20.0 : 76.0 : 4,0 (moi%) P-10 a : b ; c = 24.0 ; 70.0 : 6.0 (molK) P-11 a : b : c = 24.0 : 60.0 : 16.0 (mol%) P-12 a : b : c = 24.0 : 50.0 : 26,0 (woi%) c\ 9 OC-NH [Chemical 26] ch3 C02H ch3 •ch2-c— - C02CH2CHkCH2 ch3 CO, 0 pH ch3 _ch2-c—6〇2 d P-13 a : b : c : 24.0 : 60.0 : 12.0 : 4.0 (mol%} P-14 a : b : g : d= 24.0 : 60*0 : 8„0 : 8,0 (mol%) 〇ch3 i 0 ~CH2*C- co2h ch3 ....... - co2ch2ch=ch2 b CH3 -ch2***c—* P-15 a : b ; o : d= 24.0 : 60.0 :12.0 ; 4,0 (molS) P-16 a : b : o : d= 24.0 : 60.0 : 8.0 : 8.0 (molW CO, 0 PH [化28] 31 201245878 iz-plll No. 101114563 Chinese manual without underline correction This revision date··July n day ch3 ch3 CH2*C—-C〇2 c co0 OC-NH I,) T ch3 ch3 —ch2-c——ch2-〒—— Co2h co2ch2ch=ch2 ab 12.0: 4.0 (mol%) 8.0: 8.0 (moW) °H P-17 a : b : o : d- 24.0 : 60.0 P-18 a ; b : o ; d= 24.0 : 60.0 29] ch3 -CHjfC- ch3 ch3 —CH2-C* _CH2&quot;C—&quot;&quot; C〇2 pH co2h co2ch2ch-ch ab P-19 a : b : c: d= 240 : 60.0 : 12.0: 4Λ (mol%) u ' P-20 a : b : c : 240 : 80.0 : 8 , 0 : 8, 0 ( mol % ) &lt; (B) Polymerizable compound &gt; The polymerizable compound is, for example, a polymerizable compound having at least one ethylidene group and a double bond. The component described in the paragraph number [0010] to the paragraph number [0020] of the Japanese Patent Publication No. 2006_23696, or the Japanese Patent Laid-Open No. 2006-64921, can be used as the composition of the composition of the known composition. The components described in paragraph number [0027] to paragraph number [0053]. Further, a urethane-containing polymerizable compound produced by an addition reaction of an isocyanate and a hydroxyl group is also suitable, and Japanese Patent Laid-Open Publication No. Sho 51-37193, Japanese Patent Publication No. Hei. Japanese Patent Publication No. Sho-58-49860, Japanese Patent Publication No. SHO 58-49860, Japanese Patent Publication No. SHO 32 201245878, λ mm Λ 1. No. It is also suitable to have an amine-based f-ester compound of the Japanese frame, which is described in Japanese Patent Publication No. Sho 62-3 (4), Japanese Patent Publication No. Sho 62-3 (4). Other examples of the enamel enamel may be exemplified by the patents of the Japanese Patent Laid-Open No. 48-641, the Japanese Patent Publication No. Sho. No. 91, and the Japanese Japanese Patent No. ___, Ο and (f-acrylic acid reacted) The obtained epoxy acrylate acrylate or methacrylate _. In addition, it is also possible to use Japan followed by 杂. vol. 20, Νο·7, page 300 to page 3 (1984 ς A compound which is described as a photocurable monomer and an oligomer. Specific examples thereof include pentaerythritol tris(mercapto)acrylic acid vinegar, pentaerythritol (f-based) acrylate, and dipentaerythritol penta(methyl) acrylate acid. Alcohol hexa(meth)acrylic acid vinegar, tris((meth)acryloxyethyl)isophthalocyanate, pentaerythritol tetra(meth)acrylate E 〇 modified and dipentaerythritol hexa Acetate EO modified, etc., and as a commercial product, Ester A-TMMT, NK Ester A-TMM-3, NK 〇lig0 UA_32P, NK Ohgo UA-7200 (above by Xinzhongcun Chemical Industry Co., Ltd.) Made by the company), Aronix M-305, Aronix M-306, Aronix M-309, Aronix M-450, Aronix M-402, TO-B82 (above by East Asia) Preferred examples of the synthetic resin composition and the V# 802 (manufactured by Osaka Organic Chemical Industry Co., Ltd.). These polymerizable compounds may be used singly or in combination of two or more. In the case of the polymerizable compound 33 201245878 is the 10111th article, the article says that _ 鱅 修正 修正 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 101 It is more preferable that it is Μ mass % -75 mass %, particularly preferably 20 mass % - 60 mass %. <(C) Photopolymerization initiator> The photopolymerization initiator is such that the polymerizable compound can be used. The aggregator is not particularly limited, and is preferably selected in view of characteristics, initial efficiency, absorption wavelength, availability, and cost, etc. The photoinitiator is photosensitive due to exposure light, starts and promotes polymerization. A compound which polymerizes a compound. It is preferably a compound which induces an active light having a wavelength of 3 〇〇 mn or more, which initiates and promotes polymerization of a polymerizable compound. Moreover, it is preferable to use a non-direct feeling. A combination of a photopolymerization initiator and an sensitizer of an active light having a wavelength of 3 Å or more. Specific examples thereof include an oxime ester compound, an organic dentate compound, an 11-n-n-none compound, and a sulphate compound. , a compound, a benzoin compound, an acridine compound, an organic peroxide, an azo compound, a coumarin compound, an azide compound, a metallocene compound, a hexaaryldimethine compound, an organoboronic acid compound, a disulfonic acid compound , rust salt compounds, mercaptophosphines (oxides), benzophenone compounds, acetophenone compounds and derivatives thereof. Preferred from the viewpoint of sensitivity are preferred fatty acid compounds and hexaaryl dimethanone compounds. The oxime ester compound can be used in JP-A-2000-80068, JP-A-2001-233842, JP-A-2004-534797, International Publication No. 2005/080337, and International Publication No. 2006/018973. No. specification, Japanese Patent Special Open 2007-210991 34 201245878π Revision date: July 1st, 1st, July 31st - No. 114563 Chinese manual _ Line revision, this report, this patent special opening 2, 31 〇〇〇 The compounds described in the specification of the Japanese Patent Laid-Open Publication No. 2007-269779, the Japanese Patent Application Laid-Open No. Hei. Specific examples include 2-(0-benzoquinone)-丨-^-phenylthio)phenyl]-1,2-butanedione, 2-(0-benzoquinone)-1_[4- (phenylthio)phenylpentanedione, 2-(0-phenylsulfonylphenyl)phenyl]+2-hexanedione, 2-(0-benzoquinone)-1_[4-( Phenylthio)phenyl]-I,2-heptanedione, 2·(〇-benzothymidine)-1-[4-(phenylthio)phenyl]-1,2-octanedione, 2 -(0-benzhydrazide)-1-[4-(mercaptophenylthio)phenyl]-1,2-butanedione, 2-(〇-benzophenone)-1-[4- (ethylphenylthio)phenyl]-1,2-butanediazine, 2-(〇-benzoamyl hydrazine)-1-[4-(butylphenylthio)phenyl]-l,2 - butanedione, ι_(〇_乙醯肟)-1-[9-ethyl-6-(2-methylbenzhydryl)-9H-indazol-3-yl]ethanone, 1-( 0-acetamidine) small [9-fluorenyl-6-(2-mercaptobenzylidene)-9H-carbazol-3-yl]ethanone, H0-acetamidine) small [9-propyl _6-(2-mercaptobenzylidene)_9H_^ saliva·_3-yl]acetamidine, 1-(〇_乙酿月亏)-1·[9-ethyl-6-(2-ethyl Benzene oxime)-9H-carbazole-glycolyl]ethanone and 1-(0-acetamidine) small [9-ethyl_6_(2-butylbensyl)-911-°carboside-3 -yl]ketone and the like. However, it is not limited to this compound. Further, in the present invention, a compound represented by the following formula (III) is also suitable as a photopolymerization initiator brick vinegar compound from the viewpoints of sensitivity, temporal stability, and coloration at the time of heating. [化30] 35 is the first (^1114563 Chinese manual without a slash correction this revision period: 1〇1年July 31 0 2012458/8 In the general formula (III), 'X1, X2, and X3 each independently represent a hydrogen atom, a halogen atom or a burnt group, and R1 represents -R, -OR, _C〇R, _SR, -CONRR' or -CN R2 and R3 independently represent -R, _〇r, _c〇r, -SR or -NRR', respectively. R and R' each independently represent an alkyl group, an aryl group, an aryl group or a heterocyclic group. The groups may be substituted with one or more selected from the group consisting of a halogen atom and a heterocyclic group to constitute the alkane. One or more carbon atoms of the alkyl chain in the group and the aralkyl group may be substituted with an unsaturated bond, an ether bond or an ester bond, and R and R· may be bonded to each other to form a ring. In the above formula (III), the halogen atom in the case of χΐ, χ2, and χ3 represents a halogen atom, and examples thereof include fluorine, chlorine, bromine, and iodine; and χ1, χ2, and X3 represent an alkyl group in the case of an alkyl group. For example, a mercapto group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a second butyl group, a tert-butyl group, a pentyl group, an isopentyl group: a third pentyl group, a hexyl group, a heptyl group, Octyl, isooctyl, 2-ethyloxy, trioctyl, decyl, isodecyl, decyl, isodecyl, ethyl, allyl, I, ethyl, propyl Alkynyl, methoxyethyl, ethoxyethyl, oxyethyl, methoxyethoxyethyl, ethoxyethoxyethyl, propyl, ethoxyethyl, methoxy Propyl group, monofluoromethyl group, di-gas methyl group, trifluoromethyl group, trifluoroethyl group, perfluoroethyl group, 2•(benzophenone vinyl group, etc. 36 201245878 No. 101114563 Chinese manual without line Amendment of this revision date: July 31, 101, wherein 'X1, X2, and X3 all represent a hydrogen atom, or X1 represents a burnt group and X2 and X3 each represent a hydrogen atom. In the above formula (III), examples of the alkyl group represented by R and R include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a second butyl group, and a third butyl group. , pentyl, isopentyl, third amyl, hexyl, heptyl, octyl, isooctyl, 2-ethylhexyl, trioctyl, decyl, isodecyl, decyl, isodecyl, Vinyl, allyl, butenyl, ethynyl, propynyl, methoxyethyl, ethoxyethyl, propoxyethyl, methoxyethoxyethyl, ethoxy ethoxy Ethyl ethyl, propoxyethoxyethyl, methoxypropyl, monofluoromethyl, difluoromethyl, trifluoromethyl, trifluoroethyl, perfluoroethyl, 2_(stupidoxazole -2'-yl) vinyl and the like. Examples of the aryl group represented by R and R' include a phenyl group, a tolyl group, a xylyl group, an ethylphenyl group, a chlorophenyl group, a naphthyl group, an anthracenyl group, and a phenanthryl group. Examples of the aryl group represented by R and R include a benzyl group, a gas benzyl group, a methyl group, an α, α-dimethyl group, a phenylethyl group, and a phenylethylene base. Examples of the heterocyclic group represented by R' include a fixed group, a pyrene group, a furyl group, and a thienyl group. What is the soil and the two: 'The ring formed by the mutual bond, for example, the piperidine ring 37 201245878 Revision date: July 31, 2011 is the 101114563 Chinese manual without a slash correction of the hydrogen atom; R1 Is an alkyl group, especially a fluorenyl group; R2 is an alkyl group, especially a fluorenyl group; and R3 is an alkyl group, especially an ethyl group. Therefore, preferred examples of the photopolymerization initiator represented by the above formula (III) include the compounds A to F exemplified below. However, the present invention is not limited by any of the following compounds. [化31] Compound A [化32] 38 201245878 -TjL,^ λ. Ten fl Revision date: 1〇July 31 is the 101114563 Chinese manual without a slash correction 〇 [化33] 39 201245878 ιζ, ριιι is the 101111563 Chinese manual without picture 丨! Line correction Och3 compound £ date of revision: July 31, 101 0ο Η The photopolymerization represented by the above formula (III) is a compound represented by the formula (111) used in the Japanese invention, which has an absorption wavelength in a wavelength region of 250 nm to 500 nm. By. More preferably, those having an absorption wavelength in the wavelength range of 300 nm to 380 nm can be listed. Particularly preferred are those with high absorbance at 308 nm and 355 nm. Further, in the present invention, the compound represented by the following formula (Π) is also suitable as the photopolymerization initiator from the viewpoints of sensitivity, stability over time, and coloration at the time of heating. [化34] 40 201245878 H-ZJlZpifl is the Chinese manual of No. 101114563 without a slash correction (II) Revision 1E Date: July 31, 101 In the formula (II), R22 represents a monovalent substituent. A22 represents a 2-valent linking group 'Ar' represents an aryl group. η is an integer of 〇~5. X22 represents a substituent of the work price. When η is an integer of 2 to 4, X22 of the plurality of stores I may be the same or different. The one-valent substituent represented by R22 is preferably a non-metal atomic group represented by one of the following. The non-metal atomic group represented by R may, for example, be an alkyl group which may have a substituent, a aryl group which may have a substituent, an alkylsulfonyl group which may have a substituent, or a substituent. The arylsulfonyl group, a mercapto group which may have a substituent, a heterocyclic group which may have a substituent, and the like. The alkyl group which may also have a substituent is preferably an alkyl group having a carbon number Examples of the group include a mercapto group, an ethyl group, a propyl group, a butyl group, a hexyl group, a cyclopentyl group, a cyclohexyl group, a trifluoromethyl group, and the like. The aryl group which may have a substituent is preferably an aryl group having a carbon number of 6 to 3 Å, and examples thereof include a phenyl group, a biphenyl group, an L-naphthyl group and a 2-naphthyl group. Further, the base of the substituent having a substituent is preferably an alkylsulfonyl group having 1 to 2 carbon atoms, and examples thereof include a methylsulfonyl group and an ethylsulfonyl group. The arylsulfonyl group having a carbon number of 6 to 3 Å is preferably an arylsulfonyl group having a carbon number of 6 to 3 Å, and examples thereof include a phenylsulfonyl group and a naphthylsulfonyl group. The fluorenyl group which may have a substituent is preferably a fluorenyl group having a carbon number of 2 to 20, and examples thereof include an ethyl fluorenyl group, a propyl fluorenyl group, a butyl fluorenyl group, a trifluoromethylcarbonyl group, and 201245878 L^yu i is the 101111563 number. Chinese manual without line repair IH date: like the year? On the 31st of the month, pentamidine, phenylhydrazine, U-cyanyl, 2_benzhydryl, 4-phenylthiobenzamide,;, thiol 4-diethylamino Benzopyridinyl, 2-chloro; methyl, ketone, benzene, benzyl, 2-methoxybenzhydryl, 2-butoxybenzhydryl, 3-methyl, benzyl, -3- a mercaptobenzoic acid base, a 3-pin alum base, a 4-pin phenylhydrazine wire, a 4-cyano alum-based group, and a 4-amino group, preferably a heterocyclic group which may have a substituent It is the package base and so on. A hetero atom of an aromatic or aliphatic group of a sulfur atom, a sulfur atom, an oxygen atom, a thienyl group, a furyl group, a pyranyl group or the like. For example, the coating may be listed as the R22' from the viewpoint of high sensitivity, and more preferably an unsubstituted or substituted fluorenyl group. Specifically, it is preferably an unsubstituted or substituted group B, propylene. Base, stupid base and base. The substituent may, for example, be a group represented by the following structural formula, and any of (d-1), (d-4) and (d-5) is preferred. [GH35] —GH^ m) 〇(d-2) ch3 ch:3 ch3 (d~3) v_/ {Φ-4} —-HM (4) N (d~6) 42 201245878li is the Chinese manual No. 101114563 No slash correction This revision date: July 31, 2011. The divalent linking group represented by A22 may be an alkyl group having a substituent having a carbon number of 1 to 12, or may be substituted. The base is a cyclohexyl group and an alkynyl group which may also have a substituent. Examples of the substituent which can be introduced into these groups include a halogen atom such as a fluorine atom, a gas atom, a bromine atom and an argon atom, an alkoxy group such as a decyloxy group, an ethoxy group or a third butoxy group, and a phenoxy group. An aryloxy group such as a nonylphenoxy group, an alkoxycarbonyl group such as a decyloxycarbonyl group, a butoxycarbonyl group or a phenoxycarbonyl group. In which the A22 is preferably an unsubstituted alkylene group or an alkyl group (for example, anthracenyl group, ethyl group, third party) in terms of improving sensitivity and suppressing coloring over time after heating. Substituted and dodecyl) substituted alkyl, alkyl substituted by alkenyl (e.g., vinyl and allyl) and aryl (e.g., phenyl, p-tolyl, xylyl, cumene) Alkyl, naphthyl, anthracenyl, phenanthryl and stupid vinyl) substituted alkyl. The aryl group represented by Ar is preferably an aryl group having a carbon number of 6 to 3 Å, and may have a substituent. 3 "For the body, Ar may be exemplified by phenyl, biphenyl, 1-naphthyl, 2-naphthyl, trifolyl, biphenyl, o-phenyl, m-phenyl, p-tolyl. , di-phenyl phenyl, o- cumyl phenyl, m-isopropyl phenyl, p- cumyl, and sulphate, which are preferred from the viewpoint of improving sensitivity and suppressing coloring over time after heating. A substituted or unsubstituted phenyl group. When the above group has a substituent, the substituent is, for example, a fluorene group, a halogen atom such as a fluorine atom, a molybdenum atom, or a moth atom, and a methoxy group. 2 base and butyloxy group, alkoxy group, phenoxy group and p-nonyloxy group "alumina", alkoxycarbonyl group such as methyl carbonyl group, butoxycarbonyl group and phenoxycarbonyl group; 201245878 Corrected Chinese 谕 谕 正 正 original revised date: 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨An alkylamino group such as a fluorenyl fluorenyl group, a methacryl fluorenyl group or a fluorene aryl group, such as a mercapto group, a mercaptoamine group or a cyclohexylamino group, a dimethylamino group, a diethylamino group, Lin Ji and travel biting burning two-ylamino group, a phenyl group, Yue, ethyl, tert-butyl and dodecyl group, a hydroxyl group, a carboxyl group. In the general formula (III), the structure of "SAr" formed by the Ar and the adjacent S is as follows, and it is preferable in terms of sensitivity. [化36] 44 201245878 ^ζ^ιζριΩ _ is the 101114563 Chinese manual without a slash correction. Revision period: 701年31曰 The one-valent substituent represented by X22 may, for example, be an alkyl group which may have a substituent, an aryl group which may have a substituent, an alkenyl group which may have a substituent, an alkynyl group which may have a substituent, Further, it may have an alkoxy group having a substituent, an aryloxy group which may have a substituent, an alkylthiooxy group which may have a substituent, an arylthiooxy group which may have a substituent, a halogen atom, and the like. The alkyl group which may have a substituent is preferably an alkyl group having a carbon number of from 1 to 30, which may, for example, be a mercapto group, an ethyl group, a propyl group, a butyl group, a hexyl group or a cyclopentyl group, and a group of 45 201245878 1 2 J i 厶The plii revision period: January 31, 2011 is the 101111563 Chinese manual without a slash correction of the cyclohexyl, difluorodecyl, 2-ethylhexyl and benzoic acid sulfhydryl groups. The aryl group which may have a substituent is preferably an aryl group having a carbon number of 6 to 3 Å, for example, a phenyl group, a biphenyl group, a fluorenyl-naphthyl group, a naphthyl group, a hydrazine group, a tetraphenyl group. , o-phenyl, m-phenyl, p-phenyl and dimethyl. The fluorenyl group having a substituent may preferably be an alkenyl group having 2 to 1 Å, and examples thereof include a vinyl group, an allyl group, and a styryl group. The alkynyl group which may have a substituent is preferably an alkynyl group having a carbon number of 2 to 1 fluorene, and examples thereof include an ethynyl group, a propynyl group, and a propargyl group. The alkoxy group which may have a substituent is preferably an alkoxy group having a carbon number of 丨-decane, and examples thereof include a decyloxy group, an ethoxy group, a propoxy group, an isopropoxy dibutoxy group, and a benzyloxy group. Base. The aryloxy group which may have a substituent is preferably an aryloxy group having a carbon number of 6 to 3 Å, and examples thereof include a phenoxy group, a 1-naphthyloxy group, a 2-naphthyloxy group, and a 2-chloroindolyloxy group. , 2-mercaptophenoxy and 2-decyloxyphenoxy, and the like. The alkylthiooxy group which may have a substituent is preferably an alkylthiooxy group having a carbon number of 1 to 3 Å, and examples thereof include a thioloxy group, an ethylthio group, and a propylthio group. Isopropylthiooxy, butylthiooxy, isobutylthiooxy, dibutylphosphinyl, second butylthiooxy, pentylthiooxy, isodecylthiooxy, Hexylthiooxy, heptylthiooxy, octylthiooxy, 2-ethylhexylthiooxy, decylthiooxy, dodecylthiooxy, octadecylthiooxy and Benzylthiooxy and the like. The arylthiooxy group which may have a substituent is preferably an arylthiooxy group having a carbon number, for example, a phenylthiooxy group, a naphthylthiooxy group, 46 201245878 • -Λ A ί X is the first With the Chinese version of the tactile _ line correction this correction date _ July 3rd of the following year 2-naphthylthiooxy, 2-chlorophenylthiooxy, 2-methylphenylthiooxy, 2_ methoxy Phenyl phenyloxy, 2-butoxyphenylthiooxy, L phenylthiooxy, 3-trifluoromethylphenylthiooxy, 3-cyanophenylthiooxy, 3_ Nitrophenylthiooxy, 4-fluorophenylthiooxy, 4-cyanophenylthiooxy, 4-nonyloxythiooxy, 4-didecylaminophenylthiooxy 4_Methylthiophenylthiooxy and 4-phenylthiophenylthiooxy and the like. The halogen atom includes a fluorine atom, a chlorine atom, a bromine atom, and a broken atom. The halogenated alkyl group which may have a substituent may, for example, be a monofluoroindenyl group, a difluoroindolyl group, a difluoromethyl group, a monomethyl group, a trichloromethyl group, a monomethyl sulfhydryl group, a dimethyl sulfhydryl group, and a tribromo group. Base. Further, the amine group which may have a substituent on N may, for example, be N,N-dimethylammonium and fluorene, fluorenyl-diethylguanamine or the like. In the above, from the viewpoint of improving the solubility of the solvent and the absorption efficiency of the long-wavelength region, it is preferable that χ22 is preferably an alkyl group which may have a substituent, an aryl group which may have a substituent, or a substituent. The alkenyl group may have an alkynyl group having a substituent, an alkoxy group which may have a substituent, an aryloxy group which may have a substituent, an alkylthiooxy group which may have a substituent, or may have The arylthiooxy group of the substituent, the functional alkyl group which may have a substituent, the amine group which may have a substituent or the sulfonyl group which may have a substituent on the compound, and more preferably An alkyl group having a substituent. Further, η in the formula (III) represents an integer of 〇~5, and is preferably an integer of 0 to 3, more preferably an integer of 0 to 2, from the viewpoint of the stability of the synthesis. In the case of the presence of a plurality of crucibles 22 in the general formula (III), a plurality of X22 47 201245878 is the Chinese specification of the 101114563 no-line correction. The date of revision: July 31, 2011 may be the same or different. Specific examples of the photopolymerization initiator represented by the above formula (III) are shown below. [化37] 48 201245878 Revision date: July 31, 1st, 2011 No. 101114563 Chinese manual without line [Chem. 38] The compound represented by the formula (III) used in the present invention is a compound having an absorption wavelength in a wavelength region of from 250 nm to 5 Å nm. More preferably 49 201245878 ~ TU On X Revision date: July 31, 101 is the 101114563 Chinese specification. The singular correction is a compound having an absorption wavelength in the wavelength range of 300 nm to 380 nm. Particularly preferred are compounds with high absorbance at 308 nm and 355 11111. Specific examples of the organic compound include, for example, "Foreign Chemical Society Bulletin (Bull Chem_Soc. Japan)" 42, 2924 (1969), U.S. Patent No. 3,905,815, Japanese Patent Publication No. Sho 46_46〇5, 曰Japanese Patent Laid-Open No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Japanese Laid-Open Patent Publication No. SHO-62-58241, Japanese Patent Laid-Open No. SHO-62-212401, Japanese Patent Laid-Open No. SHO-63-70243, Japanese Patent Laid-Open Publication No. SHO-63-298339, and MP Hutt The compound described in J. urnal 〇f Heter0CyCiic Chemistry, 1 (N〇3), (1970), etc., particularly includes an oxazole compound substituted with a tris-fluorenyl group and a homotriazole compound. Examples of the hexaaryl amide compound are exemplified by the Japanese Patent Publication No. Hei 6-29285, the U.S. Patent No. 3,479,185, the U.S. Patent No. 4,311,783, and the U.S. Patent No. 4,622,286. 5 various compounds, specifically 2,2'-bis(o-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2,_bis(o-bromobenzene) _4,4,,5,5,_tetraphenylbiimidazole, 2,2,-bis(o-, p-dichlorophenyl)-4,4',5,5,-tetraphenyl carbamide Saliva, 2,2'-bis(o-chlorophenyl)_4,4,,5,5'-tetra(m-decyloxyphenyl)biimidazole, 2,2'·bis(ortho, ortho--dioxin Stupid)-4,4,,5,5,-tetraphenylbiimidazole, 2,2,_bis (o-Shisha basic)-4,4',5,5'-tetraphenyl-linked rice Saliva, 2,2'-bis (o-nonylbenzene 50 201245878 Revision date: July 31, 101 is the 101111563 Chinese manual without painting (1-line revision of the base) -4,4',5,5'- Tetraphenylene "m. sit and 2,2,-bis(o-trifluorophenyl)_4,4,5,5'-tetraphenylbiimidazole and the like. The photopolymerization initiator may be used alone or in combination of two or more. When two or more kinds are used, a plurality of compounds represented by the formula (?) may be used, and a plurality of compounds represented by the formula (11) may also be used. Further, at least one of the compounds represented by the general formula (II) and the general formula (111) may be used. Further, at least each of the compounds represented by the general formula (π) and the general formula (ΠΙ) can also be used! A photopolymerization initiator other than the compound represented by the formula (ΙΙ) and the formula (m) other than the compound green compound. Moreover, a sensitizer can also be used in combination. As the total content of the silking starter, the money (4) is Q1% by mass to 2%, preferably 0.5% by mass to 1% by mass, based on the weight of the photosensitive resin composition. The most preferable is ^ Wonderful ~ I %. If it is within the range, the warm #士, , is also good. The sensitivity is high and the color characteristics are as shown in the L-renewing composition of the present invention. Typical sensitizers can be listed as (f), as disclosed in (10)4)], 62, ! Oral pyridine, thioxanthone, 2- thia thiophene: J specific and έ can be listed as dibutoxy M benzoxanthine 4 ethyl sulphate saliva, phenanthrene, camphor phlegm and light weight = A = fragrant reading, _ fragrant beans Prime, for photopolymerization agent #. As the sensitizer, it is preferable that the ratio of the phase 5% by mass to the mass% is entered in 2012458/8. The date of revision: July 31, 101 is the Chinese specification of No. 101114563. <Polyfunctional thiol compound> The light-reflective resin composition of the present invention may further comprise a polyfunctional thiol compound. The photosensitive resin composition of the present invention can improve the sensitivity by containing a polyfunctional thiol compound, suppress ion elution caused by a colored material such as a dye, and the like, and can use the photosensitive light of the present invention in the production of a color light-emitting sheet for a liquid crystal display device. The sex tree, the composition of the moon, can prevent the deterioration of the book quality such as crosstalk (cr〇sstalk), and thus can display a clear and high quality. Further, as the color filter using the photosensitive resin composition of the present invention, since the pattern shape can have an appropriate gradient, even if the transparent electrode is provided, there is no disconnection of the transparent electrode, and the coloring in the pattern development is not generated. The protrusion of the element, etc., the linearity of the pattern is good. A liquid crystal display device having a high quality can be obtained by including a color filter using the photosensitive resin composition of the present invention. In the present invention, the "polyfunctional thiol compound" is a compound having two = upper thiol groups in the molecule. The above polyfunctional thiol compound is preferably a low molecular compound having a content of 100 or more, and specifically preferably a molecular weight of 100 to 1,500, more preferably 15 Å to 1 Torr. Preferably, the above-mentioned multi-institutional lavage compound has 2 to 1 疏 base groups in the molecule, and more = 2 to 6 pieces. Further, these compounds are preferably used for the auxiliary use in the polymerization of the above-mentioned radical polymerizable monomer. It is preferable that the amount of the compounding compound is added in an amount of i% by mass to 2% by weight relative to all solids of the composition, or free silk fibrillation in the range of (4) The addition of monomer g 52 201245878 is the number of the date of the 101114563, the date of the touch: the amount added on July 31, 1G1. In the present invention, the above polyfunctional thiol compound of the above formula (B) is preferably a compound having the group represented by (2). 2 -〇-a^h2ch_sh (2) R (In the formula (2), R represents a hydrogen atom or an alkyl group, and A represents _c〇_ or -CH2-.) (B) The polyfunctional thiol compound is preferably The compound having 2 to 6 groups represented by the formula (2) is more preferably a compound having 2 to 4 groups represented by the formula (2). The alkyl group of R in the formula (2) is a linear, branched or cyclic alkyl group, and the carbon number is preferably in the range of 1 to 16, more preferably in the range. Specific examples of the alkyl group are an anthracenyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a second butyl group, a third butyl group, a pentyl group, a hexyl group, a 2-ethylhexyl group, etc., preferably hydrazine. Base, ethyl, propyl and isopropyl. Particularly preferred R is a hydrogen atom, a mercapto group, an ethyl group, a propyl group and an isopropyl group, and most preferably a mercapto group and an ethyl group. In the present invention, the (B) polyfunctional thiol compound is particularly preferably a compound represented by the following formula (1) having a plurality of the above formula (2). [化 40] 53 201245878 The Chinese manual No. 101114563 is not underlined. This revision period: July 31, 101 (In the formula (1), R represents a halogen atom or an alkyl group, and A represents -CO- or -CH2-. L represents a linking group of η valence, and η represents an integer of 2 to 6.) In the formula (1) The alkyl group of R is synonymous with R in the above formula (2), and the preferred range is also the same. η is preferably 2 to 4. The L of the n-valent linking group in the formula (1) includes, for example, a divalent linking group such as -(CH2)ra-(m is 2 to 6), and a trihydroxydecylpropane residue having 3 -(CH2) groups. a trivalent linking group such as p-(p is 2 to 6), a tetravalent linking group such as a pentaerythritol residue, or a hexavalent linking group such as a dipentaerythritol residue. Specific examples of the (B) polyfunctional thiol compound include trishydroxypropyl propane tris(3-mercaptopropionic acid) vinegar, pentaerythritol tetrakis(3-mercaptopropionic acid) ester, and tetraethylene glycol bis (3). - mercaptopropionic acid) cool, dipentaerythritol hexa(3-mercaptopropionate), pentaerythritol tetrakis(mercaptoacetate), pentaerythritol tetrakis(3-mercaptobutyrate), butanediol bis(3_mercaptobutyl) Acid) vinegar, 1,4-bis(3-mercaptobutoxy)butane, 1,3,5-tris(3-mercaptobutoxyethyl)-1,3,5-triazine-2,4, 6(1H, 3H, 5H)-trione or the like is a suitable polyfunctional thiol compound. The content of the polyfunctional thiol compound is preferably from 0.1% by mass to 20% by mass, more preferably from 0.1% by mass to 10% by mass, based on all the solids in the photosensitive resin composition. When the content of the polyfunctional thiol compound is within this range, a photosensitive resin composition having the following characteristics can be provided: the sensitivity of the photosensitive resin composition is good, and the storage stability is good, and the obtained color filter is used. The contact between the pixels is good and there is no pattern. 54 Revision date: July 31, 1st, 1st 〇宜201245878 ^zjizpifl Correction of this defect for the No. 1011145« Chinese duck thin line's use in the liquid_indicator device (colorant) coloring for the class, transfer or combination of simple and transfer / 3⁄4. &lt;Pigment&gt;, various conventional inorganic pigments or organic pigments can be used, and the age is considered to be the timing. In the present invention, the organic pigment described in K. K. [0093] of the Japanese Sleeve No. 2 spectroscopy publication is listed. Moreover, in particular, the following pigments are suitable for color reproducibility, such as CI·Pigment Red 177, 224, 242, 254, 255, 264, CI Pigment Yellow 1, 38, 139, 150, 180, 185, CI·Pigment Dial 36, 38, 71, CI Pigment Green 7, 36, 58, CI Pigment Blue 15 : 6, CJL Pigment Violet 23 The present invention is not limited to these organic classes. These organic pigments may be used singly or in various combinations for the purpose of improving the color purity. Preferably, the pigment is an average primary particle size of 10 rnn to 30 nm. On the right, the sample of the money is used to obtain a photosensitive resin composition excellent in color tone. In the case of using a pigment, the content of the pigment in the photosensitive resin composition of the present invention is 55 with respect to all the contents of the composition. 201224878 ι^, ριιι Amendment date: July 31, 101 The Chinese manual No. 101114563 is preferably 0.5% by mass to 50% by mass, more preferably i% by mass to 3% by mass. When the content of the pigment is within the above range, it is effective for ensuring excellent color characteristics. (Dyes) The half material which may be contained in the photosensitive resin composition of the present invention is a methine group, a π ratio quaternary azo system, an anilino azo system, a triaryl arsenic system, an anthraquinone system, or a ruthenium pyridine. Ketone, benzoquinone, oxonium, dipyrrolidium^ metal complex, pyrazolotriazole azo, pyridone azo, flower, phenothiazine, pyrrolop A dye such as an oxazolyl azo group or a dibenzopyranyl phthalocyanine system, such as a 敝 系, a benzene 比 喃, and a lacquer. Specific examples of the photosensitive resin composition of the present invention are disclosed in, for example, Japanese Patent Laid-Open Publication No. SHO-64-90403/Japanese Patent Laid-Open No. 64-911〇2轳Happiness. Japanese Patent Special Open ^/... 曰本专利特开平1彻! No. 2592207号 US 1614 Bulletin, Japanese Patent Special Edition 5W20 a, # . # ^ This patent special Kaiping 332 332 brother 5, G59, 5GG manual, Japanese bulletin, Japanese patent special Kaiping = 'Japan special ___ 纲平6-194828 bulletin, Japanese 5唬 △ newspaper, Japanese patent special open Japanese patent special Kaiping 4_249549 ^^ 平咖599号, 〇-〗 No. 23316, ~a newspaper, 曰本 patent special open patent, special open flat 7 interesting 1 (^ Qiao Kaiping U-3G2283 bulletin, nickname bulletin, 曰本专利保^么报, Japanese Patent Special Open 2〇〇1 -4823 No. 8~29771 Bulletin No. 15522, 曰本本特特本本特特辞8 arrest 215 Bulletin, 曰56 201245878 Revision date: July 31, 2011 is the 101114563 Chinese saying sun and moon The book has no underline to correct this t ί = bulletin, Japanese patent special open flat secret 416 Hulu newspaper, Japan fills the customs u : Η22 Shu input, pay a fine day butterfly benzoin = ^ Publication Laid-Open No. Fine packets, Laid-Open Japanese Patent Publication No. wish printing, Japanese Patent No. Hei 8-179120, Japanese Patent Laid-Open Publication No. 8_151531, A dye described in Japanese Laid-Open Patent Publication No. Hei 6-230210 or the like. Suitable materials which may be contained in the photosensitive resin composition of the present invention include the following. 〃 (methine) [Chem. 41] (Dipyrromethene-based metal-miscible compound) The dipyridamole-based metal-doped compound obtained by disposing a compound represented by the formula (I) on a metal atom or a metal compound is described in detail 57 201245878 ji ζ, ριι i is the 101111563 Chinese manual without painting II line correction this revision period: 1〇1 July 31. General formula (I) (In the formula (I), R1, r2, r3, R4, R5, and R6 each independently represent a hydrogen atom or a substituent of a valence, and R7 represents a hydrogen atom, a halogen atom, a leuoleyl group, an aryl group or a heterocyclic ring. The substituent of the monovalent group means a halogen atom (for example, a fluorine atom, a chlorine atom, and/or a odor atom), a burnt group (preferably a straight bond having a carbon number of 1 to 48, a branched bond or a cyclic alkyl group). 'More preferred are straight-chain, branched or cyclic alkyl groups having a carbon number of from 1 to 24, such as fluorenyl, ethyl, propyl, isopropyl, butyl, tert-butyl, pentyl, Hexyl, heptyl, octyl, 2-ethylhexyl, dodecyl, hexadecyl, cyclopropyl, cyclopentyl, cyclohexyl, bunorbornyl and 1-adamantyl), alkenyl ( Preferred are alkenyl groups having 2 to 48 carbon atoms, more preferably alkenyl groups having 2 to 18 carbon atoms, such as vinyl, allyl and 3-buten-1-yl), and aryl ( Preferred are aryl groups having 6 to 48 carbon atoms, more preferably aryl groups having 6 to 24 carbon atoms, such as phenyl and naphthyl groups, and heterocyclic groups (preferably having a carbon number of 1 to 2). a heterocyclic group of 32, more preferably a heterocyclic group having a carbon number of W For example, 2_thienyl, 4-pyridyl, 2-furyl, 2-hydrazino, 1-pyridyl, 2-benzothiazolyl, oxime-imidazolyl, pyrazolyl, 58 201245878 is No. 101114563 Chinese manual without slash correction date of revision: July 31, 101 苯 benzotris-l-yl), decyl-alkyl (preferably a carbon number of 3 to 38), more preferably carbon number It is a ruthenium group of 3 to 18, for example, a tridecyl group; a glycol group, a triethyl decyl group, a tributyl decyl group, a tert-butyl dimethyl decyl group, a third hexyl decyl fluorenyl group a hydroxyl group, a cyano group, a nitro group, an alkoxy group (preferably an alkoxy group having a carbon number of 1 to 48, more preferably an alkoxy group having a carbon number of 1 to 24), for example, a methoxy group, Ethoxy, 丨-butoxy, butoxy, isopropoxy, tert-butoxy, dodecyloxy, and further cycloalkyloxy such as cyclopentyloxy and cyclohexyloxy) An aryloxy group (preferably having a carbon number of from 6 to 48, more preferably an aryloxy group having a carbon number of from 6 to 24, for example, a phenoxy group and a 1-naphthyloxy group), An epoxy group (preferably an epoxy group having a carbon number of 236) More preferably, the heterocyclic oxy group having a carbon number of 丨~18, such as 1-phenyltetras--5-oxyl, hydrogen hydride, and oxime-oxyl (preferably) The carbon number is a fluorinyloxy group of 32, more preferably a carbon number of ～18 夕 alkoxy, such as trimethyl decyloxy, tert-butyldimethyl methoxy and diphenyl Methyl-Weioxy), sulphonyl (preferably a decyloxy group having a carbon number of 2 to 48, more preferably a carbon number of 2 to 24, a pentylene methoxy group, a benzoyloxy group) 12 醯 醯 ▲), preferably a oxyloxy group having a carbon number of 2 to 48, a oxy-oxyloxy group of ～24, for example, an ethoxylated -1-lacyloxy group, If it is a cyclohexyloxyoxy group, then 7^2 } ' ^(^ 3⁄4 (4) its (iv) base group, more preferably an aryloxy group having a carbon number of 7 to 24 == oxygen/contact, amine formazan The base is 1 48 of the amine sulfhydryloxy group, and more preferably the carbon number is the 24 of the 24 201245878 • · -1 Λ Λ.*· *· Revision period: 1〇1年July 31 is the first 101114563 Chinese manual no slash correction # Aminyloxy, for example, Ν, Ν 曱 曱 曱醯 曱醯 氡 Ν Ν Ν a base amine methyl methoxy group, a hydrazine-stylaminomethyl hydrazino group and a hydrazine-ethyl phenyl hydrazinyloxy group, an amine sulfonyloxy group (preferably having a carbon number of 丨 〜 32) More preferably, the hydrazino group is more preferably an alkoxy group having a carbon number of from 1 to 24, such as hydrazine, hydrazine-diethylamine sulfonyloxy group and hydrazine-propylamine sulfonyloxy group. a base group, a base group, and a methoxy group (preferably, the carbon number is 丨~38 to find a benzyloxy group, and more preferably a carbon number of 1 to 24, such as a methyl group. , hexadecyloxy and cyclohexyl oxy), aryl decyloxy (preferably, the number of 6 to 32 aryl decyloxy, more preferably the number of carbon is 6 to 24 The aryl stone yellow oxy group, for example, phenyl fluorenyloxy), awake base (preferably, the ruthenium group having a carbon number of 丨~48, more preferably the ruthenium group having a carbon number of 24, for example a base group, an ethyl sulfonyl group, a pentylene group, a benzoic acid group, a tetradecyl group and a cyclohexyl group, and a silk group (preferably a hydroxyl group having a carbon number of 2 to 48). More preferably, the alkoxy group having a carbon number of 2 to 24, methoxy, ethoxy, and 18 , cyclohexan = soil and 2,6·di-tert-butyl-4-methylcyclohexyloxycarbonyl), aryloxy group (difficult is the aryloxy county with a carbon number of 7 to 32, More preferably, the aryloxy group having a carbon f of 7 to 24, for example, a phenoxy group, and the amine aryl group are preferably an amine having a carbon number of 48, and more preferably having a carbon number of ^ =24-aminocarboxylidene, for example, aminic acid, N,N-diethylamine, N-ethylh-octylamine, hydrazine, hydrazine, butylamine, N_ Amine methyl sulfhydryl, N-epiamine methyl sulfonyl, N-methyl _N_phenylamine methyl ketone and N, l ^ dicyclohexylamine carbaryl, amine (preferably carbon) The number is less than %, more preferably the carbon number is 24, such as amine, 60 201245878 HZJ izpifl is the first leg 14563 Chinese _ face _ correction of the revised coffee (four) July Ε 曱 曱 胺, , hydrazine, hydrazine-dibutylamino, tetradecylamino, 2-ethylhexylamino and cyclohexylamino), anilino (preferably a stilbene having a carbon number of 6 to 32, More preferred are 6 to 24 anilino groups such as anilino and indole-methylanilino, and heterocyclic amine groups (preferably carbon number) a heterocyclic amino group of 丨~32, more preferably a heterocyclic amino group of 疋1 to 18, for example, a 4-pyridylamino group, or a carboguanamine group (preferably a carboxy group having a carbon number of 2 to 48) An amine group, more preferably a 2 to 24 rebel amino group, such as an acetamino group, a benzylamino group, a decylamino group, a pentamidine group, and a cyclohexylamine group, Urea group (preferably a urea group having a carbon number of 1 to 32, more preferably a urea group having a carbon number of 丨24, such as a urea group, an N,N-dimercaptourea group, and an n-styl group Urea group), quinone imine group (preferably a quinone imine group having a carbon number of 36 or less, more preferably a quinone imine group having a carbon number of not more than %, such as N_amber quinone imine group and N _o-phenylenedimino group), alkoxycarbonylamino group (preferably an alkoxycarbonylamino group having a carbon number of 2 to 48, more preferably an alkoxy group having a carbon number of 2 to 24) A carbonylamino group, for example, a methoxycarbonylamino group, an ethoxycarbonylamino group, a third butoxycarbonyl group, an octadecyloxycarbonylamino group, and a cyclohexyloxycarbonylamino group), an aryloxy group a carbonylamino group (preferably an aryloxycarbonylamino group having a carbon number of 7 to 32, More preferably, the aryloxycarbonylamino group having a carbon number of 7 to 24, for example, a phenoxy arylamino group, or a sulfonylamino group (preferably a sulfonamide group having a carbon number of 〜48) More preferably, it is a sulfonamide group having a carbon number of 1 to 24, such as a methylsulfonylamino group, a butylsulfonylamino group, a phenylsulfonylamino group, a hexadecylsulfonylamino group and a ring. Hexylsulfonylamino), sulfonamide group (preferably, the carbon number is 丨~ octal amine 醯 amine group, more preferably the sulfonamide group having a carbon number of 丨~24, such as N , N-dipropylamine sulfonamide and N_ethyl_N_dodecylamine sulfonate 61 201245878 i. Z^JJX± ± is the 101U4563 Chinese manual without a slash correction. 〇i July, e-amino), azo (preferably an azo group having a carbon number of 1 to 32, more preferably an azo group having a carbon number of 1 to 24, such as a phenyl group) Nitrogen and 3_D-pyrazylazo), sulphur-based (preferably a sulfur-burning group having a hindrance of 1 to 48, more preferably an alkylthio group having a carbon number of 1 to 24, such as sulfonium sulfide Base, ethylthio, octylthio and cyclohexylthio), arylthio (preferably having a carbon number of 6 to 48) The arylthio group is more preferably an arylthio group having a carbon number of 6 to 24, for example, a phenylthio group, or a hetero group (preferably a heterocyclic thio group having a carbon number of 1 to 32, more preferably a heterocyclic thio group having 1 to 18 carbon atoms, such as a 2-benzothiazolylthio group, a 2-pyridylthio group and a 1-phenyltetrazolylthio group, or an alkylsulfinyl group (preferably) It is an alkylsulfinyl group having a carbon number of 1 to 32, more preferably an alkylsulfinyl group having a carbon number of 丨~24, such as a dodecylsulfinyl group, or an arylsulfinyl group. Sulfhydryl (preferably an arylsulfinylene group having a carbon number of 6 to 32, more preferably an arylsulfinyl group having a carbon number of 6 to 24, for example, a phenylsulfinyl group), or an alkane A sulfonyl group (preferably an alkylsulfonyl group having a carbon number of 1 to 48, more preferably an alkylsulfonyl group having a carbon number of 1 to 24, such as a methylsulfonyl group or an ethyl sulfonate. Sulfhydryl, propylsulfonyl, butylsulfonyl, isopropylsulfonyl, 2-ethylhexyldecyl, hexadecylsulfonyl, octylsulfonyl and cyclohexylsulfonyl , an arylsulfonyl group (preferably an arylsulfonyl group having a carbon number of 6 to 48, more preferably a carbon number of 6 to 24) An arylsulfonyl group, for example, a phenylsulfonylnaphthylsulfonyl group, an aminesulfonyl group (preferably having a carbon number of 32 or less, more preferably a carbon number of 24 or less) Aminesulfonyl, for example, amine & fluorenyl, N,N-dipropylamine sulfonyl, N-ethyl-N-dodecylamine sulfonyl, N-ethyl-N-phenyl Aminesulfonyl and N. cyclohexylamine sulfonyl), sulfo, phosphinyl (preferably a phosphinium group having a carbon number of 1 to 32, more preferably 62 201245878 1 ζ, ριίΐ is 101114563 The Chinese manual has no slash correction period: July 31, 1st, the number of carbons is 1~24, such as phenoxy aryl, decyl and phenylphosphonium, and phosphine The amino group (preferably a terpenylamino group of the earth 32, more preferably a carbon number of the group such as an ethyl lactylphosphorylamino group and a dioctyloxylanyl group). - When the above-mentioned 1 county is in a step-by-step reading format, it can be further replaced by any of the above-mentioned groups. Further, in the case of having two or more substituents, the substituents may be the same or different. In the general formula (I), ^^ and 112, 112 and ]13, the ruler 4 and 115 Ϊ ΥΓ&quot; are each independently bonded to each other to form 5 M, 6 or 7 members, and the formed ring exists. There are saturated or unsaturated rings. The 昌, 6 贝 or 7 贞 戟 赖 赖 赖 赖 环 环 ' 环 环 环 环 环 环 环 环 环 环 环 环 环 环 环 环 环 环 环 环 环 环 环 环 环 环 环 环 环 环 环 环 环 环 环 环 环 环 环 环 环The cyclohexene ring and the benzene ring are more than the ir ° ratio of the azine ring and the oxazine ring, and a benzene ring and a bite ring are preferred. In addition, in the case where the ring formed by the 5, 6 and 7 members formed is the base of the substituted base, the substitution of the above-mentioned substituents may be described. : Miscellaneous: Love: ^ ^ The preferred target range is the same as the preferred range of R1~upper atom, silk, aryl or transylation. In the sputum (1) of R, as the above-mentioned and R6, the above-mentioned preferred 4-based amino group, arylamine group, amine group, ureido group, hydrazine group, and the like , the face is Yan Lu, urea i,, ί 63 201245878 *1·厶J i 厶jjiil is the 101111563 Chinese manual without a slash correction. Amendment date: July 31, 1 oxycarbonylamine and Further preferred are sulfonamide groups, carboxylammonium groups, ureido groups, alkoxycarbonylamino groups and sulfonamide groups, and particularly preferred are carboguanamine groups and urea groups. In the formula (I), as the above R2 and R5, preferred among the above are an alkoxycarbonyl group, an aryloxycarbonyl group, a carbamic acid group, a decyl group, an aryl fluorenyl group, and a nitrile group. More preferably an alkoxycarbonyl group, an aryloxycarbonyl group, an amine fluorenyl group, an alkylsulfonyl group, a nitrile group, a quinone imine group and an amine oxime. Further, the alkoxycarbonyl group, the aryloxycarbonyl group, the amine decanoic acid group, the nitrile group, the quinone imine group and the amine sulfhydryl fluorenyl group are particularly preferably an alkoxycarbonyl group or an aryloxy group. Carbocarbonyl and amine carbenyl. In the formula (I), as the above R3 and R4, preferred among the above are substituted or unsubstituted alkyl, substituted or unsubstituted aryl, and substituted or unsubstituted. The cyclo group is more preferably a substituted or unsubstituted alkyl group and a substituted or unsubstituted aryl group. In the case of the formula (I), when R3 and R4 represent a burnt group, the alkyl group is preferably a substituted or unsubstituted straight or branched chain or cyclic group having a carbon number of 1 to 12. Further, for example, a mercapto group, an ethyl group, a n-propyl group, an isopropyl group, a cyclopropyl group, a n-butyl group, an isobutyl group, a tert-butyl group, a cyclobutyl group, a cyclopentyl group or a cyclohexyl group are exemplified. And a benzyl group; more preferably a branched or cyclic substituted or unsubstituted alkyl group having a carbon number of 1 to 12, and more specifically, for example, an isopropyl group, a cyclopropyl group, an isobutyl group, a third butyl group, a cyclobutyl group, a cyclopentyl group and a cyclohexyl group; still more preferably a second or second substituted or unsubstituted alkyl group having a carbon number of 1 to 12, more specifically, for example, Listed are isopropyl, cyclopropyl, isobutyl, tert-butyl, cyclobutyl and cyclohexyl. 64 201245878 For the Chinese manual No. 101114563, there is no slash correction. The revision period is: in the general formula (I), on July 31, 2010, when R3 and R4 represent an aryl group, the aryl group is preferably The substituted or unsubstituted phenyl group and the substituted or unsubstituted naphthyl group are exemplified, and a substituted or unsubstituted phenyl group is more preferred. In the case where R3 and R4 represent a heterocyclic group, the heterocyclic group preferably includes a substituted or unsubstituted 2-thienyl group, a substituted or unsubstituted 4-pyridyl group, substituted or unsubstituted. Substituted 3-pyridyl, substituted or unsubstituted 2-pyridyl, substituted or unsubstituted 2-furyl, substituted or unsubstituted 2-pyrimidinyl, substituted or not Substituted 2-benzothiazolyl, substituted or unsubstituted 1-imidazolyl, substituted or unsubstituted 1-pyrazolyl, and substituted or unsubstituted benzotriazolyl, more preferably The substituted or unsubstituted 2-thienyl group, the substituted or unsubstituted 4-pyridyl group, the substituted or unsubstituted 2-furyl group, the substituted or unsubstituted 2-pyrimidine may be mentioned. A butyl group and a substituted or unsubstituted pyridine group. For a long time, a metal atom or a metal compound which forms a metal complex compound of at least 13 fluorenylene groups will be described. 〇 as a metal or a metal compound, if it is a metal atom or a metal compound capable of forming a complex, it may be any one, including a divalent metal atom, a 24 Å metal emulsion, a divalent metal hydroxide or A metal valence of two valences. For example, in addition to Zn, Mg, Si, Sn, Rh, pt, Pd, Μ〇, Μ, PJ), CU, Ni, C〇, Fe, B, etc., also includes chlorinated, chlorinated steel, ferric chloride A metal chloride such as titanium chloride, tin chloride, vaporized ruthenium or ruthenium chloride, or a metal hydroxide such as TiO or VO, such as Si(OH)2. From the viewpoints of stability, spectroscopic characteristics, heat resistance, light resistance, and manufacturing suitability of the self-aligned compound, it is preferable that Fe, Zn, Mg, Si, 65 201245878 I w* JL A. is 101117563 No. Chinese manual no picture IJ line correction This revision date: 1〇1 July” Pt, Pd, Mo, Mn, Cu, Ni, Co, TiO, B or VO, more preferably Fe, Zn, Mg, Si, Pt, Pd, Οι, Ni, Co, B or VO, most preferably Fe, Zn, Cu, Co, B or VO (V = 0). Among these, it is Zn. (I) The compound represented by the formula (I) is a dipyrrolidine-based metal-based compound which is a metal atom or a metal compound. The preferred embodiment is as follows. Wherein R 1 and R 6 each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, a heterocyclic group, a decyl group, a hydroxy group, a cyano group, an alkoxy group, an aryloxy group, a heterocyclic oxy group, a decyl group or an alkane group; Oxycarbonyl, aminyl, amine, anilino, heterocyclic amine, carboxylamido, ureido, oxime imido, alkoxycarbonylamino, aryloxycarbonylamino, sulfonium a group, an azo group, an alkylthio group, an arylthio group, a heterocyclic thio group, an alkylsulfonyl group, an arylsulfonyl group or a phosphinium group, and R2 and R5 each independently represent a hydrogen atom, a halogen atom, Alkyl, alkenyl, aryl, heterocyclic, hydroxy, cyano, nitro, alkoxy, aryloxy, heterocyclooxy, decyl, alkoxycarbonyl, aryloxycarbonyl, amine formazan Base, quinone imine, alkoxycarbonylamino, sulfonylamino, azo, alkylthio, arylthio, heterocyclic thio, alkylsulfonyl, arylsulfonyl or amine sulfonate Indenyl, R3 and R4 each independently represent a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, an aryl group, a heterocyclic group, a decyl group, a hydroxy group, a cyano group, an alkoxy group, an aryloxy group, a heterocyclic oxy group, Sulfhydryl, alkoxy group, amidino group, anilino group, carboxy amido group, gland group, aryl imino group, alkoxy group, amino group, azo group, alkylthio group , arylthio, heterocyclic thio, alkyl sulfonyl, aryl sulfonyl, sulfonyl or phosphinium amide, R 7 represents hydrazine, _ atom, alkyl, 66 201245878 :1〇1年July 31st is the 101111563 Chinese specification without a slash correction. The aryl or heterocyclic group 'metal atom or metal compound means Zn, Mg, Si, Pt, Pd, Mo, Μη, Cu, Ni, Co, TiO, B or The aspect of VO is as follows. A preferred aspect of the σ-rhomo-methylene-based metal-miscible compound is as follows: that is, in the above formula (1), each of R1 and R is as follows. Independently represents a hydrogen atom, a pyridyl group, an alkenyl group, an aryl group, a heterocyclic group, a chaotic group, a aryl group, an alkoxy group, an amine methyl group, an amine group, a heterocyclic amine group, a carboxy oxime group, a ureido group. , 醯imino, alkoxycarbonylamino, aryloxycarbonyl fluorenylamino, sulfonylamino, azo, alkylsulfonyl, arylsulfonyl or phosphinylamino 'R2 And R5 each independently represent an alkyl group, a dilute group, an aryl group, a heterocyclic group, a cyano group, a nitro group, a decyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an amine fluorenyl group, an acid imido group, and a sulphur group. Alkyl, aryl sulfhydryl or amine acid group, R and R each independently represent a hydrogen atom, an alkyl group, a dilute group, an aryl group, a heterocyclic group, a cyano group, a decyl group, an alkoxycarbonyl group醯Carboxylamido, ureido, oximine, alkoxycarbonylamino, sulfonylamino, alkylthio, thio, heterocyclic thio, decyl aryl, aryl thiol Or an amine fluorenyl group, ◦ R represents a halogen atom, a halogen atom, a alkyl group, an aryl group or a heterocyclic group, and the metal atom or metal compound represents Zn, Mg, Si, Pt, Pd, Cu, Ni, Co, B or VO. The situation. A preferred aspect of the dipyrromethene-based metal-substituted compound in which the compound represented by the above formula (I) is bonded to a metal atom or a metal compound is the following general formula (1-1): (1-2) and a compound represented by the formula (1-3). [Chem. 43] General formula (1-1) 67 201245878 is the Chinese manual No. 101114563 without a slash correction. Amendment date: July 31, 101 (In the formula (1-1), R1, R2, R3, R4, R5 and R6 each independently represent a hydrogen atom or a substituent. R7 represents a hydrogen atom, a halogen atom, a aryl group, an aryl group or a heterocyclic group. Ma represents a metal atom or a metal compound, X1 represents a group which can be bonded to Ma, and X2 represents a group necessary for neutralizing the charge of Ma. Further, X1 and X2 may be bonded to each other to form a 5 member, 6 Ring of a member or a member of the staff.) R1 to R6 in the formula (1-1) are synonymous with R1 to R6 in the formula (I), and preferred embodiments are also the same. In the general formula (1-1), Ma represents a metal atom or a metal compound, and a metal atom or a complex compound in which the compound represented by the general formula (I) is bonded to a metal atom or a metal compound or Metal compounds are synonymous and their preferred ranges are also the same. R7 in the formula (1-1) is synonymous with R7 in the formula (I), and preferred embodiments are also the same. X1 in the formula (1-1) may be any group which may be bonded to Ma, and examples thereof include a group derived from water, an alcohol (for example, decyl alcohol, ethanol, and propanol). , and "metal chelate" [1] Sakaguchi Takeshi, Ueno 68 201245878 Hzjizpifl for the first leg touch __none _ original revision date 7_e Jing Ping (1995 Nanjiang Hall), "metal chelate" [2] (ip%) "metal chelate" [3] (1997) and the like, wherein in terms of production, water, a carboxylic acid compound, an alcohol, a compound and a guanamine are preferred. The compound is more preferably water, a carboxylic acid compound or a guanamine compound. X2 in the formula (1-1) represents a group necessary for neutralizing the charge of Ma, and for example, represents a halogen atom (for example, a fluorine atom, The chlorine atom and the bromine atom) and the starting group are derived from an aliphatic brewing imine (for example, amber imide, maleimide, pentaneimine, diethylamine, etc.), preferably, One of the valent groups of amber succinimide and maleimide, derived from an aromatic quinone imine or a heterocyclic quinone imide (for example, Benzoimine, naphthyl imine, 4-bromophthalimide, 'methylphthalimide, winter nitro-p-methylimine, naphthylcarboxyl The imine and tetrabromo phthalimide, etc., preferably include phthalimide, 4-bromophthalimide, and 4-methylphthalimide. One of the valent groups derived from an aromatic carboxylic acid (example), for example, benzoic acid, 2-methoxybenzoic acid, 3-methoxybenzoic acid, 4-methoxybenzoic acid, 4-air benzene Formic acid, 2-naphthoic acid, salicylic acid, 3,4,5-trimethoxybenzoic acid, 4-heptyloxybenzoic acid, 4-tert-butylbenzoic acid, etc., preferably benzoic acid, 4 - methoxybenzoic acid, salicylic acid, etc. - valence group, derived from aliphatic carboxylic acid (for example, citric acid, acetic acid, propylene glycol, methacrylic acid, propionic acid, lactic acid, pivalic acid, Acid, caprylic acid, 2-ethylhexanoic acid, neodecanoic acid, dodecanoic acid, myristic acid, palmitic acid, stearic acid, oleic acid, isostearic acid, 2-hexadecyl octadecanoic acid, 2_ Hexyl decanoic acid, cyclopentyl decanoic acid, decyl carboxylic acid, 5-norbornenecarboxylic acid and ^ Cyclodecanoic acid, etc., 69 201245878 -fZ-J ΙΖ, ρίλΙ is the 101111563 Chinese manual without a slash correction. Amendment date: July 31, 101 is preferably exemplified by acetic acid, methacrylic acid, lactic acid, and pentylene. One of the valent groups of acid, 2-ethylhexanoic acid, stearic acid, etc., derived from dithioamino decanoic acid (for example, dimethyldithiocarbamic acid, diethyldithioamine) One of the valent groups of the base acid and dibenzyldithiocarbamic acid, derived from a sulfonamide (for example, phenylsulfonamide, 4-chlorophenylsulfonamide, 4-methoxyphenyl) Sulfamide, 4-methylphenylsulfonamide, 2-nonylphenylsulfonamide and mercaptosulfonamide, preferably one of phenylsulfonamide and mercaptosulfonamide A valence group derived from a hydrocarbyl acid (for example, an oxime hydroxamic acid, a octylisohydroxy acid, and a benzohydroxamic acid) derived from a nitrogen-containing ring compound (for example, Internal carbazide, 1-benzyl-5-ethoxyethyl carbazide, 1-allyl carbendazim, 5,5-diphenylethylene carbazide, 5,5-dimercapto-2 , 4-oxazolidine di-, barbituric acid,. Rice saliva, saponin, 4,5-dicyanoimidazole, 4,5-dimethylimidazole, benzoimidazole, 1H-imidazole-4,5-dicarboxylic acid diethyl ester, etc., preferably exemplified ^午基·5-ethoxy Binecene gland, 5,5-dimercapto-2,4-^n^^定_自同4 Dicyanomethane sit, 111-°米唾-4,5 - Dicapric acid diethylene from the purpose of - ' Among them, from the viewpoint of manufacturing, it is preferred that halogen atom, oxime, acid group, aromatic carboxylic acid group, aliphatic quinone imine group, Guan Xiangyue The aryl sulfonate group and the nitrogen-containing ring compound are more preferably a hydroxyl group, a fat group, a group, an aromatic quinone group, and a nitrogen-containing ring compound. Further, X1 and X2 in the formula (1-1) may be bonded to each other to form a ring of 5 members, 6 members or 7 members. The formed 5 members, 6 2, and Ma may have a saturated ring or an unsaturated ring. Further, the ring of 5 members, and 7 members may contain only a carbon atom and a hydrogen atom, and may be a hetero ring having an atom of a nitrogen atom, an oxygen atom and a sulfur atom to = and 7 members. 1 less from 70 201245878 πζ^ιζριΩ is the 101114563 Chinese manual without a slash correction. Revision date: 1〇1年July 3i [化44] General formula (1-2) In the above formula (1-2), R1, R2, R3, R4, r5, R6, r8, '', R11, R12 and Rl3 each independently represent a hydrogen atom or a substituent. R7 and R14 each independently represent a hydrogen atom, a halogen atom, an alkyl group, an aryl group or a heterocyclic group. Ma represents a metal atom or a metal compound. R1 to R6 in the formula (1-2) are synonymous with Ri to R6 in the formula (1), and preferred embodiments are also the same. The substituent represented by R8 to R13 in the formula (1-2) is synonymous with the substituent represented by Ri to R6 of the compound represented by the formula (j), and the preferred embodiment is also the same. When the substituent represented by R8 to R13 of the compound represented by the formula (1-2) is a group which may be further substituted, it may be substituted by any of the substituents R described above. In the case where the substituent is substituted, the substituents may be the same or different. R7 in the formula (1-2) is synonymous with R7 in the formula (1), and preferred embodiments are also the same. 71 201245878 Hz^izpm For the first leg of the first letter, there is no underline correction. This day's coffee (4) η Japanese formula (1-2) R14 represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group or a heterocyclic group. The preferred range of R14 is the same as the preferred &amp; When R14 is a group which may be further substituted, it may be substituted by any of the substituents R described above, and when substituted by two or more substituents, the substituents may be the same or different. (1-2) The term "Ma" means that the metal or metal compound is synonymous with the metal atom or the metal compound in the "compound compound in which the compound represented by the formula (I) is bonded to a metal atom or a metal compound". The preferred range is also the same. R8 and ^, :^ in the general formula (1-2) and R and R may also be bonded to each other independently to form a saturated or unsaturated ring of 5 members, 6 members or 7 members. . The saturated or unsaturated cyclone formed is synonymous with a saturated or unsaturated ring formed by R1 and R2, R2 and R3, R4 and R5, and R5 and R6, and preferred examples are also the same. General formula (1-3) In the general formula (1-3), 'R2, r4 and r5 are each independently 72 201245878 HZJizpifl Revision date: July 31, 101 is the 101114563 Chinese manual without a line to indicate the hydrogen atom, R7 An aryl or heterocyclic group. R8 and a compound of π, 衣, and R each independently represent an alkyl group, an alkenyl group, a group, a heterocyclic group, an alkoxy group, an aryloxy group, an alkylamino group, an arylamine group or a hetero Bad amine group: Ma represents a metal atom or a metal compound. X3 and X4 each = = NRa (Ra wire hydrogen atom, silk, alkenyl group, aryl group, heterocyclic ring, ", alkyl group or aryl group"), oxygen atom or sulfur atom: J each independently represents NRb (Rb represents a hydrogen atom, a pyridyl group, an alkenyl group, an aryl group, a heterocyclic group, a county, a silky group or a silky group), an oxygen atom, a sulfur atom or a carbon atom. Χ5 indicates the base that can be bonded to Ma. A table or 2°R8 and γΐ can also be bonded to each other to form a ring of 5, 6 or 7 members. R9 and Υ2 can also be bonded to each other to form 5 members and 6 Member or ring. In the formula (1-3), it is synonymous with r2 to R5 and R7 in the formula (1), and the preferred embodiment is also the same. In the formula (1-3), Ma represents a metal or a metal compound, and a metal atom or a metal compound in a complex compound in which the compound represented by the formula (I) is bonded to a metal atom or a metal compound is synonymous. The preferred range is also the same. In the formula (1-3), R8 and R9 each independently represent an alkyl group (preferably a linear, branched or cyclic alkyl group having a carbon number of 1 to 36, more preferably 1 to 12). a straight chain, a branched chain or a cyclic alkyl group, for example, anthracenyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert-butyl, hexyl, 2-ethylhexyl, twelve An alkyl group, a cyclopropyl group, a cyclopentyl group, a cyclohexyl group and an adamantyl group, an alkenyl group (preferably an alkenyl group having a carbon number of 2 to 24, more preferably 73 201245878 ^ZJiZpin is the first umi4563) The specification does not have a slash correction. The date of the amendment is July 3], the base of 2 to 12, such as ethyl ketone, allyl and butene, and aryl (preferably, the carbon number is 6~). 36 aryl, more preferably 6 to 18 aryl, such as phenyl and naphthyl), heterocyclic (preferably a heterocyclic group having a carbon number of 1 to 24, more preferably 1~) a heterocyclic group of 12, for example, 2_thienyl, 4-pyridyl, 2-furyl, 2-pyrimidinyl, 1-pyridyl, 2-benzothiazolyl, 1-merzino, lt-based And benzotrisin-1-yl), alkoxy (preferably the inverse of the stone is 1~) 36 calcined base, more preferably an alkoxy group of 1~is, such as methoxy, ethoxy, propoxy, butoxy, hexyloxy, 2-ethylhexyloxy, twelve Alkoxy group and cyclohexyloxy group, aryloxy group (preferably having a carbon number of 6 to 24j aryloxy group) more preferably an aryloxy group of 1 to 18, such as a phenoxy group and a naphthyloxy group) An alkyl group (preferably an alkyl group having a carbon number of 丨36), more preferably an alkyl group of hydrazine 1 to 18, such as a mercaptoamine group, an ethylamino group or a propylamine. Base, butylamino, hexylamino, 2-ethylhexylamino, isopropylamino, tert-butylamino, trioctylamino, cyclohexylamine, n,n-di Amino group, N,N-dipropylamino group, N,N-dibutylamino group and N-fluorenyl-N-ethylamino group), arylamine group (preferably having a carbon number of 6) An arylamine group of ～36, more preferably an arylamine group of 6 to 18, such as a phenylamino group, a naphthylamino group, an anthracene, a fluorenyl-diphenylamino group and an N-ethyl_N_ group. Phenylamino), heterocyclic amine group (preferably a heterocyclic amine group having a carbon number of 丨~24, more preferably a heterocyclic amino group of 疋1 to 12, such as 2-aminopyridinium Rupyl, 3-aminopyrazolyl, 2-aminopyridyl and 3-aminopyridyl). "In the formula (1-3), an alkyl group, an alkenyl group, an aromatic group, a heterocyclic group, an alkoxy group, an aryloxy group, an alkylamino group, an arylamino group represented by the ruler 8 and the ruler 9. Or when the heterocyclic amine group is a group which can be further substituted, it can also be taken as 74 201245878 1厶ji 厶jjifl is the (9) η#63 No. Na Na Gu Ji Zaizhen makeup date: 丨_July Any of the substitutions of 3 代, R, may be the same or different when substituted by two or more substituents. In the formula (1-3), X3 and X4 are each independently Represents NRa, an oxygen atom or a sulfur atom. Ra represents a hydrogen atom, an alkyl group (preferably a linear, branched or cyclic alkyl group having a carbon number of j to 36, more preferably a linear chain of 丨~12) a branched chain or a cyclic alkyl group, for example, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tert-butyl group, a hexyl group, a decylethyl group, a decyl group, Cyclopropyl, cyclopentyl, cyclohexyl and 1-adamantyl), alkenyl (preferably an alkenyl group having 2 to 24 carbon atoms, more preferably an alkenyl group of 2 to 12, such as a vinyl group) , allyl and 3-butene·丨·yl) An aryl group (preferably an aryl group having 6 to 36 carbon atoms, more preferably an aryl group of 6 to 18, such as a strepyl group or a naphthyl group) or a heterocyclic group (preferably having a carbon number of 1) a heterocyclic group of ～1, more preferably a heterocyclic group of 疋1 to 12, for example, 2—nonyl, a fixed group, a 2-furyl group, a 2-pyrimidinyl group, a pyridyl group, a 2-benzothiazolyl group, and an imidazole group. a base group, a 1-pyrazolyl group, a benzotriazolyl group, a fluorenyl group (preferably, a fluorenyl group having a carbon number of 丨~), more preferably a fluorenyl group of 2 to 18, for example, an acetamino group, Terpene, ethyl hexyl fluorenyl, phenyl fluorenyl and cyclohexyl fluorenyl, alkyl sulfonyl (preferably alkyl sulfonyl having 1 to 24 carbon atoms, more preferably hydrazine) Alkyl sulfonate, such as, for example, fluorenylsulfonyl, ethylsulfonyl, isopropylsulfonyl and hexylsulfonyl) and arylsulfonyl (preferably having a carbon number of 6~^, a sulfonyl group, more preferably an arylsulfonyl group of 6 to 18, such as a phenylsulfonyl group and a naphthylsulfonyl group. Moreover, the case where the ruler &amp; can be replaced吟, which may be further substituted by a substituent, when replaced by a plurality of substituents The substituents may be the same or different. 75 201245878 H-ZrJ ιζ, ριιι is the 101114563 Chinese manual without a slash correction. The revised period: 1 7 1 July 31, X3 and X4 are better Independently an oxygen atom or a sulfur atom, and particularly preferably 3 and X4 are oxygen atoms. In the formula (1-3), γΐ and γ2 each independently represent NRb, a sulfur atom or a carbon atom, and Rb is as described above. Preferably, Ra is synonymous in X3. Y1 and Y2 are each independently NRb (wherein Rb is a hydrogen atom or an alkyl group having a carbon number of 1 to 8), and γΐ and Υ2 are particularly preferred. In -3), R8 and Υ1 may also be bonded to each other, and R8, Υ1 and a carbon atom together form a 5-membered ring (for example, cyclopentane, piperidine, tetrahydrofuran, monooxolane, tetrahydrothiophene, pyrrole, furan, thiophene). , hydrazine, benzofuran and benzothiophene), 6-membered ring (eg cyclohexane, piperidine, piperazine, morpholine, tetrahydropyran, dioxane, sulfurized cyclopentane, dithiane, benzene) , piperidine, piperazine, pyridazine, quinoline and quinazoline) or 7-membered ring (such as cycloheptane and hexamethyleneimine). In the formula (1-3), R9 and γ2 may be bonded to each other, and R9, γ2 and , together, form a ring of 5 members, 6 members or 7 members. The ring of the 5-member, 6-shell, and 7-membered members may be a ring in which one of the rings formed by the R8, γ 1, and carbon atoms is changed to a double bond. In the general formula (I-3), R8 is bonded to γΐ and R9 and Y2, and when the ring of 5 members, 6 members and 7 members is a ring which can be further substituted, the substituent may be used. The substituents described in any of R may be the same or different when substituted by two or more substituents. In the formula (1-3), X5 represents a group which may be bonded to Ma, and may be the same group as X2 in the above formula (1)). a indicates 〇, u2. Preferred embodiments of the compound represented by the formula (1-3) are as follows. Also 76 201245878 Revision date: July 31, 101 is the Chinese specification No. 101114563. There is no slash correction. That is, 'R~R HMa is a complex containing the compound 4 represented by the general formula (1) and a metal atom or a metal compound. In a preferred embodiment, each of X3 and X is represented by NRa (Ra is a hydrogen atom, an alkyl group and a heterocyclic group) or an oxygen atom, and Y and Y2 are each independently NRb (Rb is a hydrogen atom or an alkyl group), and nitrogen 8 Atom, an atom' is a group bonded via an oxygen atom or a nitrogen atom, and R and R each independently represent an alkyl group, an aryl group, a heterocyclic group, an alkoxy group or an alkylamino group, or R8 and γι are bonded to each other. Form a 5-member or 6-member ring, 〇^ and 丫2 are interlocked to form a 5-member, 6-member ring, a means 〇 or! The preferred aspect of the compound represented by the formula (1-3) is as follows. That is, R2 to R5, r7 and Ma* are preferably a preferred embodiment comprising a compound represented by the formula (1) and a metal atom or a metal compound, wherein X3 and X4 are oxygen atoms, and Y1 is NH. Y2 is a nitrogen atom, X5 is a group bonded via an oxygen atom or a nitrogen atom, and R8 and R9 each independently represent an alkyl group, an aryl group, a heterocyclic group, an alkoxy group or an alkylamino group, or R8 and γΐ are mutually Bonding to form a 5-member or 6-member ring, R9 and Υ2 are bonded to each other to form a 5-member, 6-member ring 'a' indicates a 〇 or 1 aspect. The general formula (Μ) and the general formula of a dipyrrolidine-based metal-based compound which is obtained by disposing a compound represented by the above formula (I) on a metal atom or a metal compound Among the mismatched compounds represented by the formula (1) and the compound represented by the formula (1-3), the compound represented by the formula (1-3) is a particularly preferable aspect. Hereinafter, the dipyrromethene 77 in which the compound represented by the above formula (I) used in the present invention is bonded to a metal atom or a metal compound is shown. 201245878 L 曰 Modified period: July 31, 2011 Japanese Patent No. 101114563 is a specific example of a metal-based compound which is not corrected by a slash correction. However, the present invention is not limited to these specific examples. [化46] R102 H R102 R surgery R like χ101 exemplified 4 匕 r r!02 R103 X1. 1 M1 1 t-Bu —Me ° mu o Me -o —0~Q-Me 〇Zn 2 t-Bu ° o -Q 〇-^— T-9u 0 Zn 3 t-8u dip plant ~o Zn 4 t-Bu t*Bu 〇} Mv_ 七-v〇O Zn 5 t-8ti ° t-Bu 〇) Me -b 〇ΊΜ (3) 2) ieCH3 Ο Zn 6 t-Bu^ 〇t-8 Factory 〇—t-Bu 0 2fi 7 ^δυ ° &lt;} —t-Bu -v〇0 Is\ δ t-Bu Qw.〇\ ^HVte t-Bu 〇 *—tBy V^OEt 〇Zn 9 t—BiVa t-Bui &lt;} et -CHf^n-Bu —〇-Q-Me 0 Zn 10 t gas-TMQ-〇—/ V-Me t-Bu I -CH^ n-8u 〇 Zn r 78 201245878 Revision period: 1 7 1 7 July 31 is the first 〇&quot;ηΐ4563 Chinese manual without scribe correction [Chem. 47] Illustrative compound R1〇1 R102 R163 X gift 11 t-Bu -QQ-^y-me -〇!K 〇Zn 12 t-8u o )f t-Bu Me — ~v〇O Zn 13 *-Bv t-8u FactoryTMo Me^ —C ^Me Me Zn 14 *·&gt;Λ 〇tB Factory〇Nf Zn 15 i-Bu -o MeMe Wi Zn 16 t-8u y~Me i-8 Factory~~o MV^e -〇〇Zn 17 trBU 〇t -Bu ~o Me ~v 0 Zn 1S t-Bu 〇bBu -o Me Me -iusr 0 Zn 19 —ζ-〇-/ V-Me t-Bu o Me广^Ο-ζί-Μβ o Zh 20 t -Bu q-q—/ VTMMe l-Bu o ~v〇 o Zn [201248] For the 1st (5ll 14563 Chinese manual without a slash correction) Amendment date: July 31, 1st, exemplified compound R moved R to X M1 21 〇—Me MeOOMe ~&quot;O Cu. 22 _only-〇£t 〇-Et —Me _o- Fe 23 0 —i-Pr —Et —S兮H Let se Ni 24 —o —i-Pr Co 25 1-NH£t 0 Me -o ~~ ~p~^Me Me -°-§-〇Cr 26 -§·〇~&quot;0 OH a CHQ person CH3 b Zn 27 ο ό -Q rss\ *~H\ ^-ΌΜβ TM〇-9-〇O , f 2n 28 -o ~0TMζϊ*~^ ^-~CN 〇'-f Zn 29 &quot;&quot;em factory*·*-^TM^·—t-Pr ~VO-Br 0 Zn 30 Q / =\ -o 0 Zx\ [化49] 80 201245878 -ΙΆ J 丄 is the 101114563 Chinese manual without a slash correction. Amendment date: July 31, 101 [化50] 〇81 201245878 No. 101114563 Chinese manual without scribe correction This revision date: 1 7 1 July 31 Η 2〇^Μβ0^0 S ΟΑο Me—\ I .t-δυ &gt;=qIp =&lt; 37 a/b = ^)/ 70 (w/w) Mw= 10,500 Mw/Mn- 1,68 Me- 39 a/b = 5 / 80,15 (w/w) Mw = 12,600 Mw/Mn » 1,68 , O . i-Bu l-P『 36 38 OZH /t-Bu t-B a^b ~ 15/8$ (w/w) Mw 11.800 Mw/Mn ~ 1.54 t-Βυ °l-Pr hPr° t-Bu Μθ [化51] 82 201245878 HZJlZpifl is the 101111563 Chinese manual without a slash correction. Amendment date: July 31, 2001 In the exemplary compounds of the dipyrromethene-based metal-doped compound in which the compound represented by the formula (1) is bonded to a metal atom or a metal compound, the exemplified compound (40) to the exemplified compound (44) are also An exemplary compound of the formula (1-1) is exemplified. The compound (45) is also an exemplary compound of the formula (1), and the exemplary compound (1) to the exemplary compound (39) are also exemplified by the formula (1-3). Compound. Further, in addition to the above-exemplified compounds, examples of the dipyrromethene-based metal-doped compound in which the compound represented by the formula (I) is bonded to a metal atom or a metal compound may be mentioned: Japanese Patent Laid-Open Exemplary compound (Ia_3) to exemplified compound (la-83), exemplified compound (ia_;i) to exemplified compound (IIa-20) 'exemplified compound (1-1) to exemplified compound (Japanese Patent No. 2008-292970) ), Illustrator 83 201245878 No. 101114563 Chinese specification without slash correction This revision date: July 31, 2011 Compound (ii-i) ~ exemplified compound (ii-ii) and exemplified compound ~ exemplified compound (III- 103) The exemplified compound (1-1) to the exemplified compound (1-35) described in Japanese Patent No. 3324279, and the exemplified compound (1-1) to the exemplified compound (1) described in Japanese Patent No. 3279035 13) The exemplified compound (2-1) to the exemplified compound (2-32) and the exemplified compound (3-1) to the exemplified compound (3-32) and exemplified in the Japanese Patent Publication No. 256057 Compound (4-1) ~ exemplified compound (4-26) and the exemplified compound (5-1) to the exemplified compound (5-26), and the exemplified compound (1-1) to the exemplified compound (1) described in JP-A-2005-77953 6) and the exemplified compound (vn-i) to the exemplified compound (VII-8), and the exemplified compound (1-1) to the exemplified compound (丨_45) contained in Japanese Patent Laid-Open Publication No. Hei. The exemplified compound *(M) to the non-compound (1-50) described in Japanese Laid-Open Patent Publication No. 2000-19729, and the exemplified compound (1_丨) exemplified in Japanese Patent Laid-Open Publication No. Hei. Compound (丨_45) and the like. [化 52] 84 201245878 Τ^, _Ι 1 i-JJlfl is the 101114563 Chinese manual without a slash correction. Amendment date: July 31, 1st, 1st [化53] 85 201245878 x x The Chinese manual for the 101114563 has no underline correction. This revision date: July 31, 101 (triarylmethane system) [Chem. 54] 86 201245878 HZJlZpifl is the 101111563 Chinese manual without a slash correction. Amendment date: July 31, 1st, 1st [化55] I m [化56] 87 201245878 七oizpui is the 101111563 Chinese manual without a slash correction. Amendment date: July 31st of the following year 〇 (Dibenzomethane) [Chem. 57] 88 201245878 H-ZJ IZpifl is the 101114563 Chinese manual without a slash correction. Amendment date: July 31, 101 Ο gh3 ch3 So2nh-r so2NH-R so2nh-r G2H5 so3- ch3 S02NH-R PH3 och3 Ch3 89 201245878 1·么 J 1 厶pll i is the Chinese manual of No. 101114563, no picture of the dirty manuscript revision. The revised side of the year is July” (酉太菁系) [化58] Illustrative compound................. "Rs A-1 —η —B υ A — 2 ~~C!,HeS02NH8u A — 3 —CH,C〇NHB u A- 4 Hop h A — 5 —CHACON P h A — 6 —CH2CON (Bu) 2 In the abbreviations of 芡 连 & & 物 , , , , P P P P P P P P P P P P P P P P P P P 核 核 核 核 核 核 核 核 核 核 核 核 核 核 核 核 核 核 核 核 核 核The base indicates a positive number that does not depend on the substitution position, and is replaced by a positive number that is replaced by 立. Daiji. x, y is the number of substitutions [59] 90 201245878^ is the first (^1114563 Chinese manual without a slash correction this revision date: 1 7 1 July) - CZnPc~{ a — (4-COOC2H*OCH3 )CBH4〇i&gt;«-(4-C〇〇C2H*〇CH3)C6H4〇l3.8-xH〇.8c*n.&lt;] -[ZnPc-{a-C4-COOC2H(»OCH3)C6H4〇 iJ&lt;. 6-a£)C^3Sjr -{4-COOC2HeOCH3&gt;C6H* 〇Ϊ2.ββ-«{/3-&lt;2, e-a2)C6H3S}OJ72-,. • EZnPc—{a: — (4—COOC^HAOCHaJCgH^Jjc — (4—COOC2H4OCH3)C6H4〇l3.»-x. (^—NO£)0i zHa e • gn (C32Ne' 2) H a _ (4—COOC^(4OCH3)CeH4 〇] *, {没有-(4 a COOCZH4〇GH3) CsH4〇}3. 8_xHa 6CInr 4] • Kn(C32. 8ΝΘ) — I or — (4—COOCEH4OCHa) C6H4〇], f 3 — (4 _ COOCaH4OCH3). This. 13· 8-*....J • EZn&lt;C3^Me) - fa — (4—COOCaHUOChyCehUOl,·[J3 — &lt;4—COOC2H4〇CH3&gt;C6H4〇J 丨布凡 aC!”. 4Br o. 4] -[2nPo—{a —(斗一CO〇C2H4OCH3)CeH4OJx. ίβ-(4—C0〇C2H40CH3&gt;C6H*0}3_e-x. (β—NH*)0,2H0.6 • tZr»Pc—(a —(4—COOCgh^OCHdCeKiOh, [jS—¢4-COOCaH^OCHyCeHiOke-x· (5-〇Η) 0·2Η0·β〇彳11. 4] • CZnPc-ia-{4TMCOOCaH4OCH3}C6H4〇K&lt; E^S TM&lt;4~-C〇〇C2H4〇CH3)CeH4〇}3.g-*. (-C(CH3)3)〇^ Ηλ *CI« · «1 • [ZnPc-[or — (4-C00C2H4〇CHs&gt;CeH4〇)x, [/? One (4-COOCaH4OCH3)C6H*〇ke- KH "C,".s] • DZr^CsaN* « —&lt;4_COOC2H4OCH3)CeH4〇Ix.【无一(4-COOC^U〇CH3)CeH4〇k〇«0”. 8β3 * [ZnPo« f Of - (4—COOCah^ OCHsJCe^Oh, I in one (4-C00C8H40GH3)CeH40]a. s-»H〇, 8F". 4] [ZnPc-oi-t(CH3CH(OCH3)C2H义OOC)C2H*S}0 2, Icr -M-COOC^HtOCHyCeHiOh, {彡一(4-COO C2H#0CH3&gt;CeH4.0j3i e-*H〇. eCl-i,. 4] tZnPc-|a-(4-S03C2H4OCH3)CeH40},„ -( 4-503C2H4〇CH3)CeH^〇ia. 8«xH〇. 8Cf„. J [ZnPc-f αTM(4—COOCHJCWDU -U-COOCh3)C^H4〇U, 7』〇,你,8] CZnPc -ia-(4-C00C2H*〇CH3)CflH4O})(1 {jS -(4-00002ΗΛ〇〇Η3)ΟβΗ4〇}2.28_xH〇, gCI12,92] .[ZnP.- UW-COOCgKiOCHyCACtU Cold One (4 a c〇〇C2H4〇eHa)C&amp;H4〇}, 1β·χΗα a〇14· 〇e] '[ZnPc—{a —(4-0000^001^4)06^140}^ (cr —(2 —〇CH3—4-CO〇CaH4〇CH3)CeH30)y. ίβ—(4—〇00C2HA0CH3)CeH40}2i72_x, ίβ-(2-OCHr—COOCj^OCHjCeHaOkee-yH^Chaji} [ZnPc- (a - ( 2-C〇〇C2M*OCH3)C1〇HB-6^〇jx {^ _ (2-c〇OC2H4OCH3)C10H8-'6--0)3. «Cl [ZnP〇-iaf-(4»COOCeH+〇 CH3)CeHfl〇}X( {a-(4_cN)c6H* 〇J〇. {^? ~(4-0ΟΟ02Η*Ο0Η3)0βΗ4 〇l 3- ia] • t〒PC-巧(a_(2—c H>.H 〇| (^-(4—oooc^och ) CeH· .sp: two inverse 'hX« 1^-(4-0000^400«3)06 \[Ϊ〇Γ61!ΓΚ3-0^ηΪ^ 'L^!:^:H;Xra°C35)CeH4〇 K· ^-&lt;4-0000^)0^0,,,,^ (蒽S Kun) [化60] 91 201245878 For the "1114563 Chinese manual, no underline correction. Amendment date: July, 101 31st (Organic solvent) The photosensitive resin composition of the present invention may contain an organic solvent. , organic 〉 If each agent is suitable for the solubility of the coexisting components or the coating properties when the photosensitive resin composition is formed, there is basically no special limit 92 201245878 HZjizpifl is the i 〇m gamma Chinese manual 雠 修正 本 This revision date: July 31st of the following year, especially good considering the solubility, coating and safety of solids. Examples of the organic solvent include ethyl acetate, n-butyl acetate, isobutyl acetate, citric acid, acetic acid, and isobutyl acetonate, butyl citrate, isopropyl butyrate, and butyric acid. Ethyl ester, butyl butyrate, methyl lactate, ethyl lactate, alkyl acetate oxidized (such as methyl acetate, ethyl oxyacetate, butyl oxyacetate (specifically, decyloxyacetic acid)曱Ο 酉曰, ethyl methoxyacetate, butyl methoxyacetate, decyl ethoxyacetate and ethyl ethoxyacetate, etc.), alkyl 3-mercaptopropionate, 2 _ oxygen Acetyl acetonitrile, 2-oxy-2-indolyl propionate, 2-ethoxy-2-propenyl propionate, ethyl pyruvate, ethyl pyruvate, propyl pyruvate , acetamidine acetate, ethyl acetate ethyl acetate, 2-oxo-oxybutyrate and ethyl acetoacetate. Further, examples of the ethers include diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl hydrazine, ethylene glycol monoethyl hydrazine, methyl stilbene acetate ◎ CeU 〇 S〇lve acetate, and ethyl group. Ethyl acetate (ethyl ceU〇s〇lve acetate), ethylene glycol monomethyl ether, diethylene glycol monoethyl sulphate, diethylene glycol monobutyl ether propylene glycol monomethyl ether, propylene glycol monomethyl ether Acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, and the like. Examples of the _ class include methyl ethyl ketone, cyclohexanone, 2-heptanone, and 3-heptanone. Examples of the aromatic hydrocarbons include toluene, diphenylbenzene, and the like. In the case of the above-mentioned organic solvent, it is preferable to mix two or more kinds of these organic solvents in view of the solubility of each component and the case of containing an alkali-soluble binder. In this case, it is particularly preferable to include a mixed solution selected from the group consisting of 93 201245878 for the 101111563 Chinese manual without a scribe line correction date: Revision date: July 31, 2011 for the following solvents: 3_B Oxy-methyl ketone, 3 ethoxypropionic acid ethyl SI, ethyl celecoxib acetate §|, lactic acid ethyl, diethylene glycol dimethyl mystery, acetic acid butyl hydrazine, 3 曱 methoxy propionate methyl vinegar, 2 ketone, oxime, ethyl carbitol acetate (ethylcarbit 〇 Ucetate), butyl carbitol acetate (bUtylCarbitolacetate), propylene glycol methyl sulphide and propylene glycol acetate. The content of the organic solvent in the photosensitive resin composition is preferably such that all solid content in the photosensitive resin composition is 1% by mass of the second rib% by mass, more preferably 15% by mass to 60% by mass. The amount of %. (Surfactant) The photosensitive resin composition of the present invention may further contain a surfactant. The surfactant may be any of an anionic, cationic, nonionic or amphoteric surfactant. Preferably, the surfactant is a nonionic surfactant. Specifically, a nonionic surfactant described in Paragraph No. 0058 of JP-A-2009-098616 is preferred, and a fluorine-based surfactant is preferred. Other surfactants which can be used in the present invention include, for example, Megafac F142D, Megafac F172, Megafac F173, Megafac F176, Megafac F177, Megafac F183, Megafac F479, Megafac F482, Megafac F554, Megafac F780, Megafac, which are commercially available products. F781, Megafac F781-F, Megafac R30, Megafac R08, Megafac F-472SF, Megafac BL20, Megafac R-61, Megafac R-90 (manufactured by DIC Corporation), Fluomd FC-135, Fluorad FC-170C, Fluorad FC -430, Fluorad FC-431, Novec FC-4430 94 201245878 No. 101114563 Chinese manual without scribe correction This revision date: July 31, m (manufactured by Sumitomo 3M Co., Ltd.), Asahi Guard AG7105, 7000, 950 , 7600, Surflon S-112, Surflon S-113, Surflon S-131, Surflon S-141, Surflon S-145, Surflon S-382, Surflon SC-101, Surflon SC-102, Surflon SC-103, Surflon SC -104, Surflon SC-105, Surflon SC-106 (made by Asahi Glass Co., Ltd.), Eftop EF351, Eftop 352, Eftop 801, Eftop 802 (manufactured by Mitsubishi Materials Corporation) Ftergent 250 0 (Neos Co., Ltd.) and the like. Further, the surfactant may, for example, be a copolymer comprising a structural unit A and a structural unit B represented by the following formula (w), which are condensed by using tetrahydro-fluorenyl as a solvent. The polystyrene-equivalent weight average molecular weight (Mw) measured by gel dialysis chromatography is 1,000 to 10,000. Structural unit A structural unit B R3. (In the formula (w), r1 &amp; r3 each independently represent a hydrogen atom or a fluorenyl group, R2 represents a linear alkyl group having a carbon number of 1 to 4, and R4 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. 'L represents an alkylene group having a carbon number of 3 to 6, P and q are percentages indicating a polymerization ratio, P is a value of 10% by mass to 80% by mass, and q is a value of 2% by mass to 90% by mass. Γ indicates 1~18 95 201245878 ^+厶JA 厶jJllA is the first instruction of No. 1114563. There is no slash correction. This correction date is an integer from July 31, 1st, and η is an integer from 1 to 10. L is preferably a branched alkyl group represented by the following formula (W_2). R5 in the formula (W-2) represents an alkyl group having a carbon number of 1 to 4, and in terms of compatibility and wettability to a coated surface, a firing group having a carbon number of i to 3 is preferred. 'More preferably, the charcoal number is 2 or 3. The sum of p and q (p+q) in the car type (W) is p+q=1〇〇, which is 1〇〇% by mass. The copolymer preferably has a weight average molecular weight (Mw) of U, 5 〜 to 5,000. R5 (W-2) I -CH2CH' These surfactants may be used alone or in combination. The addition of the surfactant to the photosensitive resin composition of the present invention is preferable to the photosensitive resin composition. Then the amount %~2_. % of quality, especially good. 〇2 = °/〇. When it is this range, the uniformity of the coating property, the hardening m, and the (adhesion improver) film will become favorable. In the case where the photosensitive resin composition of the photosensitive resin group is further improved, the photosensitive resin composition may be further improved. As a secret 96 201245878 • One-one II is the 101111563 Chinese manual without a slash correction. This revision date: July 31, 2011 is based on the modification of the interface. 'There is no special limit, you can use the public. . Preferably, the Shixi sinter coupling agent is a plucking agent described in the paragraph of the Japanese Patent Laid-Open Publication No. 2-99, which has a preferred shrinkage of the towel, and the oleyloxypropyl sulphate is sintered. Or 丫 _ _ propyl propylene oxide oxypropyl trioxide oxy-stone burning. These may be used alone or in combination of two or more. The content of the solid content of the photosensitive resin composition in the photosensitive resin composition of the present invention is preferably from 0.1% by mass to 20% by mass based on the total amount of the solid content of the photosensitive resin composition. 〇2% by mass to 5 % ° ' (crosslinking agent) The crosslinking agent may be used in the photosensitive resin composition of the present invention to further improve the hardened layer obtained by curing the photosensitive resin composition. hardness. The crosslinking agent is not particularly limited as long as it can be cured by a crosslinking reaction, and examples thereof include (a) an epoxy resin and (b) an epoxy group selected from the group consisting of a hydroxy group and an anthracene group. And a melamine compound, a guanamine compound, a glycoluril compound or a urea compound substituted with at least one substituent of the fluorenyl fluorenyl group, (c) selected from a methylol group, an alkoxy fluorenyl group and a hydrazine group A phenol compound, a naphthol compound or a hydroxy hydrazine compound substituted with at least one substituent of a methyl group. Among them, a polyfunctional epoxy resin is preferred. For the details of the specific examples of the crosslinking agent, etc., reference is made to the paragraph number [0134] to the paragraph number [〇147] of the Japanese Patent Laid-Open Publication No. Hei 2-295116. 97 201245878 For the Chinese manual No. 101114563, there is no slash correction. This revision period: July 3, 2003 (development accelerator) Non-exposure & field test when promoting the exposure of the photosensitive resin composition layer When the solubility is further improved in view of the conspicuousness of the photosensitive resin composition, a development accelerator may be added. The development accelerator is preferably a low molecular weight organic carboxylic acid compound having a molecular weight of 1,000 or less and a low molecular weight phenol compound having a molecular weight of 1,000 or less. Specific examples thereof include aliphatic monocarboxylic acids such as capric acid, acetic acid, propionic acid, butyric acid, valeric acid, pivalic acid, caproic acid, diethyl acetic acid, heptanoic acid, and octanoic acid; oxalic acid and malonic acid; Succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, tridecyl succinic acid, methylmalonic acid, ethylmalonic acid, dimercaptopropane Acid, mercapto succinic acid, tetramethyl succinic acid and citraconic acid (6 plus (; 〇11 3 (^(1)) and other aliphatic dicarboxylic acids; 1,2,3-propanetricarboxylic acid (tricarballylic acid) ), aconitic acid and fatty acid tricarboxylic acid such as camphoronic acid; benzoic acid, toluic acid, acrylic acid (〇111^&amp;(^), 2,3-dimethyl Aromatic benzoic acid (1^11^11. acid) and 3,5-dibenzoic acid (mesitylenic acid) and other aromatic monoenosine; phthalic acid, isophthalic acid, terephthalic acid , trimellitic acid, trimesic acid, melophanic acid, pyromellitic acid and other aromatic polyacids; phenylacetic acid, hydrogenation Atropine Ic acid ), hydrocinnamic acid, mandelic acid, phenyl acid, atropic acid, cinnamic acid, cinnamic acid cinnamic acid, benzyl cinnamic acid, sub-cinnamyl Acetic acid (cinnamylidene acetic acid), coumaric acid and umbellic acid 98 201245878 H-ZJlZpifl No. 101114563 Chinese manual without slash correction This revision period: July of the following year n. Other additives. The photosensitive resin composition of the present invention may further contain various additives such as a filler, a polymer compound other than the above, a UV absorber, an antioxidant, etc., as needed. The object of the invention is described in paragraph number [〇155] to paragraph number [0156] of the Japanese Patent Laid-Open Publication No. 2004-295116. The photosensitive resin composition of the present invention may contain a special patent 2004. a thermal stabilizer described in Paragraph No. [0078] of No. 295116, and a thermal polymerization inhibitor described in Paragraph No. [〇〇81] of JP-A-2004-295116 ( Co-inhibitor). (Preparation Method of the photosensitive resin composition) The photosensitive resin composition of the present invention may be by the components of the composition are mixed as required with any of the modulation. The colorant may be any of a pigment, a dye, or a mixture of a pigment and a dye. Further, when the photosensitive resin composition is prepared, the components constituting the photosensitive resin composition may be formulated in a total amount, or each component may be dissolved and dispersed in a solvent, and then successively formulated. Moreover, the order of input or the working conditions at the time of preparation are not particularly limited. For example, the components may be prepared by simultaneously dissolving and dissolving all the components in a solvent, and if necessary, each component may be appropriately prepared into two or more solutions and dispersions, and when used (at the time of coating), These were mixed to prepare a photosensitive resin composition. The photosensitive resin composition prepared as described above is preferably subjected to filtration separation using a filter having a pore diameter of about 0.01 μm to 3.0 μm, etc. 99 201245878 HZ.J ΙΖ, ρΐΙΙ Revision date: 1 year 7 The Chinese manual of No. 101114563 is not available for use. The photosensitive resin composition of the present invention can form a colored cured film which is excellent in color tone and contrast. Therefore, it can be suitably used as a coloring element for a color-developing film used in a liquid crystal display device, and can also be suitably used. Used in the production of printing inks, inkjet inks, and coatings. (Color filter and method of manufacturing the same) The color filter of the present invention comprises a substrate and a colored region comprising the photosensitive resin composition of the present invention provided on the substrate. The colored regions on the substrate include colored layers such as red (R), green (G), and blue (B) which form respective elements of the color filter. The method for producing a color filter or a light sheet according to the present invention includes the following steps: a colored layer forming step (A), and applying the photosensitive resin composition to an old body to form a colored layer (photosensitive resin composition layer) The exposure step is specifically (8) 'the coloring layer formed in the step (4) is subjected to patterning = exposure to form a latent image; and (4) in the step (6), the coloring layer having the latent image is developed on the axis to form a pattern. / ' In the method of manufacturing the color filter of the invention, the γ 6 is further subjected to the step (D), wherein the step is the heat treatment of the colored pattern obtained in (c). 7 戈 = lower, the method of manufacturing the color filter of the present invention is more bone-step (A)- In the method for producing a color filter according to the present invention, the first slit coating, the cast coating, the roll coating, the bar coating, and the inkjet coating method are used = 100 201245878 This correction date is: 1 kiss month 31 E. The photosensitive resin composition of the present invention is applied to a support to form a colored layer, and then the colored layer is heated (pre-baked) or vacuum dried. dry. Examples of the support include soda glass, alkali-free glass, borosilicate glass, quartz glass, a ruthenium substrate, and a resin substrate used in a liquid crystal display device. Moreover, on the support bodies, an undercoat layer may be provided as needed to improve the adhesion to the upper layer, prevent the diffusion of the substance, or achieve flattening of the surface. The pre-baking conditions include the following conditions: heating at 70 ° c to 130 ° C for 0.5 minutes to 15 minutes using a hot plate or an oven. Further, the thickness of the coloring layer formed by the photosensitive resin composition can be appropriately selected as needed. In the color filter for a liquid crystal display device, a range of 0.2 μm to 5.0 μm is preferable, and a range of 1.0 μm to 4.0 μm is more preferable. Further, the thickness of the colored layer is the film thickness after drying. - Step (Β) - Then, in the method of producing a color filter of the present invention, the colored layer formed on the support is subjected to pattern exposure. The light or radiation that can be used in the exposure is preferably a g-line, an h-line, an i-line, and various kinds of laser light, and particularly preferably an i-line. When the i-line is used for the irradiation light, it is preferably irradiated with an exposure amount of 5 mJ/cm 2 to 500 mJ/cm 2 . Moreover, other exposure light sources can use mercury lamps, chemical lamps, carbon arc lamps, xenon lamps, metal halide lamps, and various laser sources such as ultra high pressure, high pressure, medium pressure, and low pressure. ~ Exposure step using laser light source ~ 101 201245878 ST (^4563 Chinese manual without line correction This 1toE date: _ July is in the exposure mode using laser light source, the illumination light is preferably 300 nm~ Ultraviolet lasers in the wavelength range of 410 nm are better in the range of 疋300 nm to 360 nm. Specifically, Nd:YAG lasers with solid output and relatively inexpensive solid lasers can be suitably used. The third harmonic (355 nm) or the excimer laser XeC1 (3〇8 imO'XeF (353 nm). From the viewpoint of productivity, the pattern exposure is preferably 1 mJ/cm2~1〇〇 The range of mj/cm2 is more preferably in the range of mJ/cm2 to 50 mJ/cm2. The exposure apparatus is not particularly limited, and a commercially available exposure apparatus may use Callisto (manufactured by V Technology Co., Ltd.) or EGIS ( v Tedmoiogy Co" Ltd.) or DF22〇〇G (manufactured by Dainippon Screen Co., Ltd.), etc. - It is also possible to use devices other than the above. - Step (C)-, m rtrj 荖 荖 2: After the color layer is developed, the county is a color pattern. If the developer is an unhardened solution of the dissolved colored layer; a combination of various organic solvents or an alkaline water may be used: ί: In the case of an aqueous solution, the alkalinity concentration can be used to paste a dihydrogenated dihydrogenated dibasic aqueous solution such as sodium sulphate, ammonia water, sodium sulphate, sodium bicarbonate, Weiner, mei (four) = Ethylamine, dimethylethanolamine, tetraterpene: azabi-bis-5:5-ylammonium oxide, choline, pyrrole, piperidine and U Ϊ = an aqueous solution of eleven olefins. 120 seconds to show 'ί佳 is 3 〜 to 300 seconds' is better 30 seconds - 乂 ',, ^ ^ dish is preferably 20 ° C ~ 40 ° C, more preferably 23 ° C 102 201245878 Revision date: July 31, 101 is the Chinese manual No. 101114563. There is no scribe correction. The development can be performed by a paddle method, a spray method, a spray method, or the like. Further, after the aqueous solution was subjected to an aqueous solution, it was washed with water. In the method for producing a color filter of the present invention, it is particularly preferable to expose the colored pattern (halogen) formed by the resin composition by irradiation with a krypton outer line. 〇〇-Step (D)-1 is preferable to further heat-treat the colored pattern after development or the coloring pattern which is subjected to post-exposure as described above (so-called after the red pattern enters) The heat treatment can be performed, for example, by a heating plate, various heaters, an oven, etc. The force of the force = 5 = the temperature is preferably _ ~ load, more preferably about the clock and the 'heating time is better It is 10 minutes to minute, and the resulting colored pattern constitutes a color 遽 === in the production of the color filter, the step () of the above-mentioned step, the exposure and the developed color number are performed. The step (D) can also be performed on the formation, exposure and display of all the enamel layers of the desired number of colors. The results are collectively carried out 103 201245878 IAX Revision date: July 31, 1G1 is the Chinese manual No. 101114563 The color tear film (the color filter and the light sheet of the present invention) obtained by the method for producing a color light-sensitive sheet of the present invention is used without a slash correction. The photosensitive resin composition of the present invention is used. . A liquid crystal display excellent in cracking and the like when the case is set by the manipulation, can achieve good color tone 'and shows excellent spectroscopic characteristics and contrast of an image &lt;. The liquid crystal display device &gt; The liquid crystal display device of the present invention comprises the color tear sheet of the present invention as described. The definition of the liquid crystal display device or the details of each display device is as follows: "Electronic display device (sasaki Sasaki, Industrial Research Association Co., Ltd. issued in 1990)", "display device (Ibuki Shunzhang, industrial book shares limited) The company issued in the first year of Heisei) and others. Further, the liquid crystal display device is described, for example, in "Next-generation liquid crystal display technology (issued by Uchida Ryuo, Industrial Investigations Co., Ltd., 1994)". The liquid crystal display device of the present invention is not particularly limited to, for example, a liquid crystal display device which can be applied to various types described in the above-mentioned "lower generation liquid crystal display technology". As the color filter of the present invention, Yin is particularly advantageous for color TFT mode i liquid crystal display. The liquid crystal display of Guan Qing's color chat mode is set to be in the form of a shirt-colored TFT liquid crystal display (a total of two limited editions I&quot;6 years issued). In addition, the money can be applied to the L-field electric field and the MVA (four) prime sub-finance type, such as large liquid crystal display devices, or STN, TN, VA, 〇cs, yang^R-OCB, and the like. Further, the color filter of the present invention is also available in the (4) (C〇l〇r-fllter 〇n Array 'color enamel array) mode. 104 201245878 HZJIZ-pifl Revision date: July 31, 2011 is the number 101114563 Chinese saying __Μίι#ΙΕφ: If the color filter of the present invention is used in a liquid crystal display device, it is known in the prior art. The high-contrast ratio can be achieved when the three-wavelength tube of the cold cathode tube is combined, and the liquid crystal display with high brightness and high color purity can be provided by using the red, green and blue LED light source (rgb_led) as a backlight. Device. "Light spacers and their formation methods" 〇 The optical spacer of the present invention is formed by using the photosensitive resin of the present invention described above. The details and preferred aspects of the photosensitive resin composition are as described above. Since the optical spacer of the present invention is constituted by using the photosensitive resin composition of the present invention, the uniformity of the cross-sectional shape and the uniformity of the height (that is, the unevenness of the cross-sectional shape or the unevenness of the height) are excellent. In addition, in the case of containing the test of the sensation of the sensation of the present invention, β is obtained as a spacer having a spacer having a high compressive elastic modulus and deformation recovery. In the present invention, the "state of the cross-sectional shape = excellent uniformity" of the pattern structure such as the optical spacer is preferably a cross-sectional shape of the pattern structure in a plurality of places (more than ί: above) in the substrate. It is closer to a rectangle, and the shape close to the rectangle is more preferably in the cross section of the pattern structure, which corresponds to the angle formed by the side surface of the pattern structure n A s ^ f and the line corresponding to the lower surface of the pattern structure. (The following is also known as Α Γ button, *, shape. Bait horse taper)) is 40. ~100. The shape of the lower surface of the structure is the surface of the pattern structure 105 201245878. The contact surface of the substrate. Further, the side surface of the pattern structure means that the surface of the pattern structure does not correspond to the pattern, the lower surface of the structure, and does not correspond to the upper surface of the pattern structure (the surface parallel to the lower surface of the pattern structure) , the side of the surface that is not in contact with the substrate. = In the method of using the photosensitive resin composition of the present invention, the optical spacer of the present invention can be formed by any method, and the method comprising the steps of (4 to (3)) can be used. The photo spacer of the invention is most suitable for the formation of the optical spacer. The method for forming the photo-spacer comprises: -) a step of coating the photosensitive resin composition of the %&quot; on the substrate (hereinafter also referred to as (4)), (:) A small part of the riding machine is also referred to as the "exposure step (hereinafter also referred to as "developing = (4) the step of heating the film after development.", 4 "Wei heating Step") or step-by-step includes other steps (1) overlay formation step _ Cheng can; ==:: especially, except for the unit, the display device (especially the liquid crystal display) The device is formed on the substrate by forming the photosensitive tree light lysate layer of the present invention on the substrate by an exposure step or a material described later, the feeling 106 201245878π -r厶ji 厶]Jiil corrected date: 1〇July 31 is No. 101114563 Chinese manual without line Correction of display unevenness in the image of the present invention. The method of forming the photosensitive resin layer on the substrate is preferably as follows: (a) coating at least the photosensitive resin, the polymerizable compound, and the photopolymerization initiator a method of coating a resin composition, and (b) using a photosensitive transfer material having the photosensitive layer, and laminating and transferring the photosensitive resin layer by heating and/or pressurization Transfer method. (a) Coating method The application of the photosensitive resin composition can be carried out by a known coating method such as spin coating, curtain coating, slit coating, dip coating, gas. The knife coating method, the roll coating method, the _ coating method, the gravure printing method, or the hopper (h) (four) squeegee coating method described in the specification of the U.S. Patent No. 5, wherein the Japanese Patent Laid-Open Employment _89851, Japanese Patent (4) 2〇〇4_17〇43, Japanese 2_-Π_8, Japanese Patent Special 2_Well, Japanese Patent (4), Dirty 7 μ, 2 Guanfu 3 The slit nozzle or slit coating described in the Gazette and the Japanese Patent Laid-Open No. 31 Publication No. (8) transfer method 勹, and ΐΠ 2 2 2 transfer material 'use, for example, heating and / or pressure ==, the layer is attached to the desired substrate surface, and then the temporary % support _, minus In particular, the sensation can be cited as 特 专利 特 = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = July 31, 101 is the Chinese manual No. 101114563, which is not underlined. This publication and Japanese Patent Laid-Open No. 2G() No. 2-148794, the pressure method is considered from the viewpoint of low foreign matter, and the second patent is JP-A-7-110575. The method described. In the case of the shape of money, the new tree, can be found in the resin layer? An oxygen barrier layer (hereinafter also referred to as "oxygen barrier film" or intermediate layer) is formed in one step. This will improve the exposure sensitivity. Further, in order to improve transferability, a cushioning thermoplastic resin layer may be provided. The temporary support body, the oxygen barrier layer, and the ruthenium plastic resin constituting the photosensitive transfer material are the same as those described in the unexamined paragraph No. [0030] of the Japanese Patent Laid-Open No. _23696. The composition and production method. ^之义布法~(8)Transfer Fagor used to form a photosensitive tree. The layer thickness is preferably G 5 μιη~1() Q _, more preferably ^ 1 μιη~6_. When the layer thickness is the above-mentioned range, it is possible to prevent the pinhole generated during the formation at the time of production and the development of the unexposed portion without a long period of time. Examples of the substrate on which the photosensitive resin layer is formed include a transparent substrate (for example, a glass substrate or a plastic substrate), a substrate with a transparent conductive film (for example, Tingda film), and a substrate with a color filter (also referred to as a color twilight). Sheet substrate) A drive substrate to which a driving member such as a thin film transistor [TFT] is attached. The thickness of the substrate is usually preferably from 700 μm to 1200 μη. (2) Exposure step, (3) Development step In the exposure step, the film formed at the film formation step and the portion to be exposed are exposed to form a latent image. The subsequent development step 108 201245878 UJLZpifl is the 101111563 Chinese manual without a slash correction. The correction period: 1 〇 1 July "Sun Yat" to develop the exposed film in the exposure step, A spacer pattern having a desired shape is formed. Specific examples of the steps include a formation example described in paragraph number [007丨] to paragraph number [〇〇77] of JP-A-2006-64921. Or the steps described in Paragraph No. [0040] to Paragraph No. [〇〇51] of JP-A-2006-23696 are suitable examples of the present invention. The method of forming the optical spacer of the present invention may also be used. In the film heating step (4) described later, the film heating step (hereinafter also referred to as "no heating step") may be performed without increasing the exposure amount during the exposure, and the cross-sectional shape uniformity may be excellent. Highly uniform optical spacers for sexual and superior performance. By setting it as "no heating step", it is possible to more effectively suppress deterioration of the optical spacer to be formed or deterioration of the formed pattern structure (coloring pattern or the like) or the protective film. ◎ The exposure amount in the case of "no heating step" is preferably ^ mJ/cm 2 to 500 mj/cm 2 ', more preferably 1 〇 mJ/cm 2 〜 3 〇〇 . (4) Film heating step The method of forming the optical spacer of the present invention may further comprise a film heating step ‘that is, heating the film after development in the developing step. The hardening of the film is further promoted by heating to obtain a light spacer having high strength. Further, when the photosensitive resin composition contains the resin A, an optical spacer having a good compression modulus and elastic recovery property can be obtained. 109 201245878 1^-ριι.ι Amendment date: July 31, 101 is the number 101114563 Chinese saying that the sun and the moon are not marked with a slash correction - it can be made on a substrate with a light spacer. Use a substrate. The 疋 of the Ρ member between the light is formed on the black mask formed on the substrate, the color opaque portion, or the driving element such as the TFT. Further, in the black light-shielding portion such as the lining matrix or the driving element such as the TFT and the optical spacer, an alignment film such as a dielectric layer (transparent electrode) such as ITO or a polyimide may be present. In the case where the optical spacer is provided on the black light-shielding portion or the driving element, the black light-shielding portion (black matrix or the like) or the crane element previously disposed on the substrate is covered, for example, the sense The photosensitive resin layer of the specific material is laminated on the support surface, and is subjected to peel transfer to form a photosensitive resin layer, and then "exposure, ageing, and heating are performed to form a photo spacer". Substrate. Further, coloring elements such as red (R), blue (B), and green (G) colors may be further provided on the substrate for the display device as needed. The optical spacer of the present invention can be formed after forming a color filter including a black shading portion such as a black matrix and a coloring portion such as a coloring element. The black blocking portion, the colored portion, and the optical spacer can be formed by arbitrarily combining the following methods: a coating method of applying a photosensitive resin composition, and a photosensitive resin layer (including the photosensitive resin layer) A transfer method of a transfer material of a photosensitive resin composition). The black blocking portion, the colored portion, and the optical spacer may be formed of a photosensitive resin composition, and specifically, for example, by directly applying the photosensitive resin composition of the liquid onto the substrate. After the photosensitive resin layer, exposure and development are carried out, and the black blocking portion and the coloring portion are replaced by the transfer material after the third day of the Japanese manual. (The transfer material can be produced by the method of I: setting the composition of the other liquids on the other substrate (temporary support) different from the substrate to form the photosensitive material The enamel layer is formed by adhering the transfer material to the substrate on which the black opaque coloring portion is formed, transferring the photosensitive resin layer, and then exposing and developing the optical spacer. Patterned. Color filter with light spacers can be fabricated in the above manner. 乍 is the protective film of the present invention, and if it is a method of using the photosensitive resin of the present invention, it can be formed by any method, and can be formed by the same method as the above-described method of forming the optical spacer of the invention. And formed. In the case of the actualization of the protective film, in the case of protecting the film-shaped film (SQlid film), in the case of the (2) step, it is suitable for the film. The method of performing the entire face exposure. The present invention will be more specifically described by way of examples without departing from the spirit and scope of the invention. In addition, "only" and "%" are the quality standards. 4^0物Ρ-1 Synthesis Example - a compound of the formula & 及 及 及 及 及 及 及 及 及 及 及 及 及 及 及 及 及 及 及 扰 及 及 及 及 扰 及 及 及 及 及 及 及 及 及 及 及 及 及 及 及The solvent was charged as a reaction solvent, and the mixture was heated to 70 ° C while being purged with nitrogen. In ''中'', 曱 丙 丙 丙 ( ( (82.3 g), methacrylic acid 111 201245878 丄 1 is the table 101114563 Chinese manual no line correction this amendment period: 1 July 1 π·7 g) and 2 nitrile as a polymerization initiator (0.74 g) are dissolved in 500 g of 2 milk (2,4-methylhydrazine, the mixed solution-surface (four)-surface is added dropwise, After 2 hours, a 'w 7 Π ° Γ % ο. After the reaction is completed, the mixture is stirred at a reaction temperature of 70 C for 2 hours, and the cold potassium is added. One cup of distilled water is stirred for one liquid, and the solution is filtered. Precipitated solids. Dry at 5 (r(:lr ' σ in white polymer) (88 g) a compound of the formula). The methacrylic acid/allyl acrylate was found to be 6 (unit: mol%) by acid value measurement. The polymer (5 μg) obtained above and 2-methoxypropanol (82 g) were placed in a 1-liter Erlang flask, and the surface was heated to u叱. The methoxy phenol (0.6 g) as a polymerization inhibitor was added and dissolved. While the solution was stirred under an oxygen atmosphere, a solution of thioglycolic acid glycerin (2.44 g) was added dropwise for 6 hours. After the completion of the reaction, the reaction liquid was added dropwise while stirring the distilled water (820 g) to cause it to stand again. The polymer was filtered off at 5 Torr. (: Drying was carried out to obtain white powder A (46 g). The acid value was measured again, and the result was methacrylic acid/allyl acrylate/glycidyl group adduct = 20/76 M (unit: mol%) The weight average molecular weight obtained by GPC is 30,000. The synthesis example of the compound P-2 to the polymer P-4 is via the compound of the formula II> in the synthesis example of the above polymer P-1, The poly(methacrylic acid/allyl acrylate/glycidyl methacrylate) was replaced by the following method to synthesize the polymer P-2 to the polymer P-4, respectively. 112 201245878 x^pxfl No. 101114563 The specification has no slash correction. The revised period: 1 July 1st, polymer P-2. Poly(mercapto-acrylic acid/mercapto-acrylic acid-to-acrylic acid/glycidyl methacrylate) (copolymerization) The molar ratio is 24/70/6, and the weight average molecular weight is 32,000. Polymer P-3: poly(methacrylic acid/allyl methacrylate/glycidyl methacrylate) (copolymer molar ratio is 24) /60/16, weight average molecular weight is 35,000) Polymer P-4: poly(methacrylic acid/mercaptoacrylic acid propylene glycol/methyl 0 glycidyl acrylate) (copolymer molar ratio is 24/50/26, weight average molecular weight is 33,000) &lt;Synthesis of polymer P-5 to polymer P-8 - via compound of the formula π &gt; In the synthesis example of the above polymer Ρ-1, the glycidyl methacrylate was changed to CYCLOMERA (CYCLOMERA-200, manufactured by Daisaiyou Chemical Industry Co., Ltd.), except for the synthesis example of the polymer ρ_1. The synthesis is carried out to synthesize an alkali-soluble resin polymer P-5 to polymer P-8. 〇 &lt; Synthesis Example of Polymer P-9 to Polymer P-12_Compound via Formula 冚&gt; Polymer P-9~Polymer P-12 can be synthesized via the above formula m. Specifically, a 2-ethylhexyl methacrylate monomer is further copolymerized when the compound of the formula II is synthesized, in addition to A compound of the formula m wherein r6 of the formula III is an ethyl group is synthesized by the same method as the synthesis of the compound of the formula π. 2-methoxypropanol (82 g) is added to the obtained polymer while stirring 113 201245878 f Λ Μ. For the Chinese manual No. 101114563, no line correction date: On July 31, 101, the dough-side was heated to 5GC. It was dissolved as (0.6g) and mixed with methoxy--inhibitor of methoxyphenol. The ethyl solution was subjected to a karenz MOI) reaction for synthesis. .s曰 (manufactured by Showa Denko, &lt;Polymer P-13~Polymer: p_16 is the person of the above polymer IM. You can use it to synthesize the above-mentioned white powder I except for yttrium, acid and sulfhydryl groups. Propylene hexyl methacrylate or methyl propyl bromide iL:: The same method was used to synthesize the synthetic resin polymer p-13~polymer p_16. &lt;Synthesis Example 5 of the P 17 t compound p_18 of the present invention, by the compound of the formula m&gt; In the synthesis example of the above polymer oxime-9, the synthesis of the thiol group is carried out in the synthesis of the compound of the formula m. In the same manner as in the synthesis example of the polymerization·P-9, the polymer P-17 and the polymer P-18 were synthesized, except that the acid dicyclopentanil g| was synthesized. <Synthesis Example of Polymer P-19 to Polymer p_2〇] The compound Ρ-19 to polymer ρ_2〇 can be synthesized via the above formula i via a compound of the formula &. Further, in the same manner as in the synthesis example of the polymer p-oxime of the formula 111, glycidyl methacrylate was added dropwise to carry out a reaction to synthesize a polymer Ρ49 to a polymer Ρ-20. &lt;Synthesis Example 1 &gt; O-phthalonitrile compound [a-{(4-COOC2H4〇CH3)C6H4〇}a, p_{(4-COOC2H4OCH3)C6H4 114 201245878 ~Γ"一Λ"^/Λ·ΙΊ Correction Date: July 31, 101 is the Chinese manual No. ί01114563 No painting! ί线修正本〇}Henan phthalonitrile] (4) a&lt;1) (Intermediate oxime synthesis in 150 mI flask to put tetrachloroorthophenone Dinitrile (hereinafter referred to as TCPN) 7.98 g (0.030 mol) and p-carbazide succinyl sulphide 5.95 g (0.030 mol), acetonitrile 3191 g, using a magnetic repellent for about 30 knives After mixing until the internal temperature stabilizes, the reaction is carried out for about 3 hours by discharging 4% g (0.033 mol) of carbonic acid. After cooling, the solution obtained by pumping and drying is subjected to a condition of about 11 〇ΐχ 1 hour. The solvent is removed by steaming and smashing the chamber. The step is about 11.1 g at about 11 (one night of rc drying) (relative to 1 〇 [^ yield of 1 〇 2 4 mol%) &lt;Synthesis Example 2 &gt; Phthalocyanine compound (hereinafter abbreviated as Ρ(&gt;1) [ZnPc-{a-(4-CO〇C2H4OCH3)C6H4〇}x, {p_(4-COOC2H4OCH 3)C6H4〇 }38_XH08C1114] (〇Sx&lt; 3.8) The synthesis was carried out in a 150 ml flask and the intermediate 1, 10·21 g (0·024 mol), phthalonitrile 0.16 g (0.001 mol), and benzonitrile (BN) obtained in Synthesis Example 1 were put. 3.46 g, under nitrogen flow (10 ml/min), stir for about 1 hour using a magnetic stirrer until the internal temperature is stable to 丨(6), then put the molybdenum zinc 2.22 g (0.007 mol) and react it. After 12 hours, after cooling, the reaction solution was evaporated at 140 ° C &gt;&lt; 1 hr, and the solvent was removed by steaming, and then thiopyrrol (6.9 g) was added to the obtained solid matter (equivalent to The sum of the weights of the intermediate 1 and the phthalonitrile used in the phthalocyanine reaction (10.37 g) minus the weight of the BN (3.46 g) is stirred and dissolved to prepare a crystallization solution. The prepared crystallization solution was added dropwise to decyl alcohol (103.8 g) (corresponding to the phthalocyanine reaction 115 201245878 -· - A' Revision date: 1〇〗 July 31st was No. 101114563 Chinese specification Line correction The mixture of the intermediate hydrazine and the weight of the phthalonitrile used was stirred for 30 minutes. Thereafter, distilled water (72 6 g) (corresponding to the weight of the intermediate and 7 times the amount) was added dropwise thereto over 3 minutes, and after the completion of the dropwise addition, the mixture was further stirred for 30 minutes to precipitate crystals. After the obtained crystal was subjected to suction filtration = 1-10 times the amount of methanol (51 9 g) at the time of recrystallization, and stirring for 3 + 0 minutes, and then dropwise addition was carried out for 3 minutes. 1/2 times the amount of distilled water (36.3 g) was stirred and purified by stirring for 3 minutes after the completion of the dropwise addition. After suction filtration, the crystals taken out were vacuum dried overnight at 6 ° C to obtain about 1 g of 7 g (yield of 99.2 mol% relative to the intermediate 1 and phthalonitrile). . [Example 1] Preparation of coloring photosensitive resin composition _ The following components were mixed and dissolved to prepare a colored photosensitive resin composition. • Organic solvent 1 (propylene glycol monoterpene ether acetate) 33”g • Organic solvent 2 (3-ethyl alcohol-propionic acid ethyl acetate) 25.2 g • Alkali-soluble binder P-2 poly(methacrylic acid/methacrylic acid) Allyl ester/glycidyl methacrylate) (copolymer molar ratio is 24/7 〇/6, weight average molecular weight is 30,000) 6 9 g • Polymerizable compound 1 manufactured by Nippon Kayaku Co., Ltd., KAYARAD DPHA 2 8 g • Polymeric compound 2 manufactured by Toagosei Co., Ltd., Aronix TO-2349 2 8 g • Polymerization inhibitor (p-methoxyphenol) 0.003 g 116 201245878 1 zpifl No. 101114563 Chinese specification without scribe correction This revision date: July 31, 101 • Photopolymerization initiator 1 CGI-242: Ciba Specialty Chemicals Co., Ltd. 0.39 g • Intimate modifier (3-methacryloxypropyltrimethoxy)矽 )) 0.2 g • Fluorine-based surfactant (Megafac F554, manufactured by DIC) 0.01 g • Blue pigment dispersion (Pigment Blue 15:6 dispersion (solids concentration 〇16.8%, pigment concentration 9.9%) )) 28.5 g Additional 'The blue pigment dispersion can be Prepare the following manner. 12.8 parts of CI Pigment Blue 15:6 and 7.2 parts of a dispersing agent (S0lsperse 5500 manufactured by Lubrizol Co., Ltd.) and 80 parts of propylene glycol monomethylidene acetate were mixed, and the pigment was sufficiently dispersed using a bead mill. , modulating a blue pigment dispersion. - Formation of a coloring photosensitive resin composition layer (colored layer) - On a glass (#1737; manufactured by Corning Incorporated) substrate, the above-mentioned prepared colored photosensitive resin composition is applied by spin coating method, and then placed in a chamber Drying was carried out for 30 minutes at a temperature to volatilize the volatile components to form a colored layer of ruthenium. The colored layer Α is irradiated with an i-line (wavelength of 365 nm) to form a latent image. The light source of the i-line uses an ultra-high pressure mercury lamp to make the light become parallel light and then add it. On this day, the amount of illumination is set to 4 〇 mJ/cm2. Then, using the aqueous solution of sodium carbonate/sodium bicarbonate (concentration of 24%), the color layer A having the latent image of the shape f was developed for 45 seconds, and then washed by running water for 20 seconds. Drying by spraying to obtain a fine line pattern image. The resulting fine _ (four) is like 23 (the rc rides 2 () minutes after the 117 201245878 1. i date of revision: July 31, 101 is the first ιοί 114563 Chinese manual without drawing U line correction this roasting treatment, obtained The color layer B having a film thickness of 2 μm. - Evaluation - θ The sensitivity of the coloring layer obtained above, the specific resistance of the liquid crystal, the spectral characteristics, the contrast, and the adhesion were evaluated by the method described below. The results are shown in Table 2 below. (1) Sensitivity ☆ Using the i-line reduction projection exposure apparatus, the obtained colored layer A after irradiation is irradiated with a light having a line width of 20 μm by a wavelength of 365 nm and irradiated with a light amount of 4 〇 mj/cm 2 . After the irradiation, development was carried out for 45 seconds under a process using a developing solution (aqueous solution of sodium carbonate/sodium strontium carbonate (concentration: 24%)). Next, after rinsing with running water for 20 seconds, it was dried by spraying to obtain a fine line pattern image. For the obtained image, an image of a thin line pattern was taken at a magnification of 2 times by an optical microscope. 〃 At this time, the width of the thin line is measured by the obtained image. The more the sensitivity is, the wider the width of the thin line is, so the width of the thin line is subtracted from the width of the mask. The width is widened as the line width sensitivity. In the case where the number is large, the sensitivity is high and it is preferable. (2) The specific resistance of the liquid crystal is obtained by scraping the coloring layer B obtained above from the substrate, and adding 9 〇mg of the scraping material to the liquid crystal material ZLI-4792 (manufactured by Merck & Co., Ltd.) 2.00 g at 120 ° C Heat for 5 hours. Thereafter, the filter is filtered, and the liquid crystal specific resistance measuring device (model: ADVANTEST R8340 ULTRA HIGHT RESISTANCE ME, Advantest Test Co., Ltd. 118 201245878 -T^~J ί η is the 101114563 Chinese manual without a slash correction The specific resistance of the liquid crystal material was measured in the year of the revision date (manufactured by ADVANTEST CORPORATION). Since the specific resistance of the liquid crystal material is lowered by the elution of the metal ions, the elution of the metal ions can be evaluated by the degree of the specific resistance. &lt;Evaluation Criteria&gt; / 〇 : The specific resistance gl.OxlO11 Μ Ω was not found in the panel when it was incorporated into a liquid crystal display device. x: Specific resistance &lt; Ι.ΟχΟηΜΩ, which is built into the liquid crystal display unit and 残 An afterimage failure occurs when the panel is formed. (3) Spectroscopic characteristics The transmitted spectrum of the coloring layer β obtained above was measured using a microscopic spectroscopic measuring apparatus OSP-SP200 (trade name) manufactured by Olympus Co., Ltd. The color coordinate X value, y value, and Y value in the CIE1931 color system were obtained from the obtained transmission spectrum. As a spectral characteristic, when the γ value in (x ' y) = (〇 138, 〇 〇 85) is high, it can be said that it has excellent spectral characteristics. It can be said that the larger the 丫 value, the better the spectral characteristics. (4) Contrast The obtained substrate having each colored layer B was sandwiched between two polarizing films. Two color polarizing films were measured using a color luminance meter (manufactured by Topcon Co., Ltd., model: BM-5A). In the case where the partial transition is parallel and the luminance value when the vertical U is straight, the value obtained by dividing the luminance when the polarization axes of the two polarized films are parallel by the luminance in the vertical direction is obtained as the contrast. The higher the contrast, the better the performance as a color filter for a liquid crystal display device. (5) Adhesiveness 119 201245878 Revision date: July 31, 2011 is the 101111563 Chinese manual. There is no sizing correction. For the coloring layer A obtained above, use the i-line reduction projection exposure device 'with 5 μιη, A mask width of 10 μm, 15 μm, 20 μm, and 25 μm was applied to the colored layer a at a wavelength of 365 nm at an exposure amount of 40 mJ/cm 2 . After the irradiation, the developer was used at 23. The underarm is developed for 60 seconds. Next, after rinsing with running water for 2 sec seconds, it was dried by spraying to obtain a fine line pattern image. Image formation can be observed by the usual method by means of a photo-observation and SEM photograph observation. Then, the pattern size of the finest fine line pattern remaining on the substrate was evaluated as the adhesion. The case where finer fine lines remain can be used as the adhesion. [Example 2] &quot; - Preparation of coloring photosensitive resin composition - The following components were mixed and dissolved to prepare a coloring photosensitive resin composition. 33.1 g 25.2 g. Organic solvent 1 (propylene glycol monoterpene acetate) • Organic solvent 2 (3-ethoxypropionate ethyl acetate) • Solubility adhesive P-2 poly(methacrylic acid/methacrylic acid) Propyl ester / glycidyl methacrylate) (copolymer molar ratio of 24/7 〇 / 6, weight average molecular weight of 32,000) 6 &gt; 9g • Polymerizable compound 1 dipentaerythritol hexaacrylate manufactured by Nippon Kayaku Co., Ltd. KAYARAD DPHA 2 8 g . Manufactured by Polymeric Compound 2 East Asia Synthetic Co., Ltd., 2.8 g 0.003 g Aronix TO-2349 • Polymerization inhibitor (p-methoxy phenol) 120 201245878 J 1 No. 101114563 Correction of the line revision period: July 31, 101 • Photopolymerization initiator 1 (1-(0-acetamidine)-1-[9-ethyl-6-(thiophenanthryl)-9H-oxime Zyrid-3-yl]ethanone): 0.39 g • Polyfunctional alcoholic compound 1 0.2 g • Adhesion modifier (3-mercaptopropoxypropyltrimethoxydecane) 0.2 g. Fluorinated surfactant (Megafac F554, manufactured by DIC) 0.01 g 〇• Blue pigment dispersion (Pigment Blue 15: 6 dispersion (solids) Degree of 16.8%, pigment concentration of 9.9%)) 27.0 g • Dyes (A-1) 1.1 g • Dyes (B-1) 0.4 g The polyfunctional thiol compound used in the above is 1,4-double (3) - mercapto can be oxylated). In the above, the dye (A-1) is a dye of a dipyrrolidium-based metal complex compound, and the dye (B-1) is an anthracene compound (a compound having a fluorene-9,10-dione skeleton). The coloring photosensitive resin composition described above was prepared and evaluated in the same manner as in Example 1. [化63] 121 201245878 The Chinese manual No. 101114563 is not underlined. The date of this amendment is: July 31, 2010. [Chem. 64] 丫, 〆 CH3 Ϊ L ηΜ^ Lq^3 so2nh^^^^3 C2Hs [Examples 3 to 8] In the same manner as in Example 2 except that the alkali-soluble binder was changed in the manner described in the following Table 2, respectively. The coloring photosensitive resin composition was prepared to form a colored layer and evaluated. [Example 9] A colored photosensitive resin composition was prepared in the same manner as in Example 2 except that the dye (A-1/B-1) was changed to the dye (A-3) (0.6 g). A coloring layer was formed and evaluated. The dye (A-3) is a dibenzopyran dye. [Chem. 65] [Example 1〇] 122 201245878 No. 101114563 Chinese specification without scribe correction This revision date: 丨〇1 July 7i in Example 1, blue pigment dispersion (Pigment Blue 15 : 6 dispersion (solid) Changed to a yellow pigment dispersion (Pigment Yellow 150 dispersion) (9.0 g) and a green pigment dispersion (Pigment Green 58 dispersion) (21.0 g), except for a concentration of 16.8% and a pigment concentration of 9.9%). In the same manner as in Example i, the coloring photosensitive resin composition was prepared to form a colored layer and evaluated. [Example 11] 实例 Example u is an example in which the pigment was changed only to a yellow pigment dispersion (Pigment Yellow 150 dispersion), and further changed to use a dye (TA^) (0.6 g), and Example 1 The colored salty resin composition was prepared in the same manner to form a colored layer and evaluated. ~ TA-1 is a triaryl zephyr dye. TA-1 [Chem. 66] [Example 12] 10 parts of 30 parts • Phthalocyanine compound Pc-1 • Yellow coloring material YG-1 methacrylic acid benzyl g / methyl propyl benzoic acid (= 7 〇 / 3 〇 [mole than this polymer 30,000) propylene glycol mono-single acetic acid g solution / = 123 201245878 HjLO ιζ, ριιι is the 101114563 Chinese manual without a slash correction This revision date: 1 7 1 July 31, 50%) 12 copies • DPHA (manufactured by Sakamoto Chemical Co., Ltd.) 12 parts. 2-(o-phenyl)-4,5-diphenyl spheroid dimer (photopolymerization initiator) 3 parts. 2-mercapto benzothiazole (hydrogen-donating compound) 2 parts • polymerization inhibitor: p-methoxyphenol 0.001 parts • fluorine-based surfactant (trade name: manufactured by Megafac F475 Dainippon Ink Co., Ltd.) 0.5 parts • propylene glycol monoterpene acetate 129 parts &lt;Preparation of the pigment-dispersed composition YG-1&gt; The components of the following composition were mixed, and the mixture was stirred and stirred at 3,000 rpm for 3 hours using a homogenizer to prepare a mixed solution containing the pigment. L composition j • Pigment Yellow 138 13 parts • Methacrylate methacrylate/methacrylic acid (=70/30 [mole ratio]) polymer (Mw 5,000) propylene glycol monomethyl ether acetate solution (solids 50%) 15 parts' • Dispersant ( Disperbyk-16 BU BYK-CHEMIE JAPAN K ] Manufactured α ^ 60 parts • propylene glycol monomethyl ether acetate 795 parts, and further by using 〇 3 mm (p cerium oxide particles $ disperser Dispermat ( GETZMANN company Manufactured), the mixed solution of the above-mentioned j was subjected to a dispersion treatment for 12 hours, and then further used; 124 201245878 Η厶JlZjJlfl is the 101111563 Chinese manual without a slash correction. The date of revision: July 31, 101 decompression The high-pressure disperser NANO-3000-10 (manufactured by Japan BEE Co., Ltd.) was used to disperse the flow rate at a pressure of 2000 kg/cm3 at 5 〇〇g/min, and the dispersion treatment was repeated one time. The pigment dispersion composition YG-1 was obtained. [Example 13] to [Example 17] Similarly to Example I, except that the yellow coloring agent YG used in 12 was changed to a knife of Di to D5. Modulation. D 'Dye represented by the following structural formula Compound (B-1) of propan - ol acetate as early as 4 _ purpose solution (solid content [of 67] 125 201245878 HZJ lzpili For the Chinese manual No. 101114563, there is no slash correction. Amendment Day - July 31, 101 8π17 (D-3): a propylene glycol monoterpene ether acetate solution of a dye compound (Β-9) represented by the following structural formula (solid content: 13%) [Chem. 69] (D-4): a propylene glycol monoterpene ether acetate solution of a dye compound represented by the following structural formula (solid content: 13%) [Chem. 70] 126 201245878 π is the 101141563 Chinese manual without a slash correction 曰 某 : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : Monoterpene ether acetate solution (solids 13〇/〇) [化71] 〇 Trioctylamine salt [Comparative Example 1] A coloring photosensitive resin composition was prepared in the same manner as in Example 1 except that the alkali-soluble resin polymer having the following structure was used instead of P-2. A colored layer was formed and evaluated. The evaluation results were killed in Table 2 below. Detective polymer: Q-1 [化72] 127 201245878 丄 person I is the 101111563 Chinese manual no picture 51 line correction# Amendment date: 1〇] July 31st [Comparative Example 2] ~; mj吏 used in the shell example of the patent publication No. 2〇〇2_293837 in the shell example (1,) instead of ρ· 2, other than this: 着色::, the coloring photosensitive resin composition was prepared, and [Comparative Example 3] was formed in the real m, and the dye was changed to the secret (A_3) using the alkali-soluble resin polymerization (Q _ ::=r Modulated coloring photosensitive resin composition, shape [Comparative Example 4] The second generation was prepared by using the above-mentioned structure of the testable resin polymer Q·1 except for the soil of Example 10 (5). The resin composition was formed into a coloring layer and evaluated. [Comparative Example 5] Example 11 was prepared in the same manner as in Example 11 except that the solvent-soluble resin polymer Q-1 Ρ-2 having the above structure was used. The resin composition was formed into a colored layer and evaluated. &amp; 128 201245878 Ι/, ρίΓΙ is the Chinese manual of No. 101114563. No correction is made. This revision date: July 31, 2011 [Comparative Example 6] In Example 13 In the above, the alkali-soluble resin polymer Q-1 of the above structure is used instead of P-2. In the same manner as in Example 13, except that the colored photosensitive resin composition was prepared, a coloring layer was formed and evaluated. 129 201245878 ιζ, ριιι is the 101141563 Chinese manual without a slash correction. Amendment date: July 1, 2011 [Table 1] Alkali-soluble resin colorant Pigment dye Example 1 Ρ-2 Blue pigment dispersion - Example 2 Ρ-2 Blue pigment dispersion dye (Α-1/Β-1) Example 3 Ρ-7 Blue pigment dispersion dye ( Α-1/Β-1) Example 4 Ρ-10 Blue pigment dispersion dye (Α-1/Β-1) Example 5 Ρ-14 Blue pigment dispersion dye (Α-1/Β-1) Example 6 Ρ-16 Blue pigment dispersion dye (Α-1/Β-1) Example 7 Ρ-18 Blue pigment dispersion dye (Α-1/Β-1) Example 8 Ρ-20 Blue pigment dispersion dye ( Α-1/Β-1) Example 9 Ρ-2 Blue pigment dispersion dye (Α-3) Example 10 Ρ-2 Yellow pigment dispersion / Green pigment dispersion - Example 11 Ρ-2 Yellow pigment dispersion dye ( ΤΑ-1) Example 12 Ρ-2 Yellow pigment dispersion dye (Pc-1) Example Ρ Ρ-2 No dye (Pc-1/Dl) Example 14 Ρ-2 No dye (Pc-l/D-2) Example 15 Ρ-2 No dye (Pc-l/D-3) Example 16 Ρ-2 No dye (Pc-l/D-4) Example Ρ Ρ-2 No dye (Pc-l/D-5) Comparative Example 1 Q-1 Blue Pigment Dispersion - Comparative Example 2 曰 Patent-Open Publication No. 2002-293837 - Resin Γ Blue Pigment Disperse dye (A-1/B-1) Comparative Example 3 Q-1 Blue pigment dispersion dye (A-3) Comparative Example 4 Q-1 Yellow pigment dispersion / Green pigment dispersion - Comparative Example 5 Q- 1 Yellow pigment dispersion dye (TA-1) Comparative example 6 Q-1 No dye (Pc-l/D-2) 130 201245878 1厶J is the Chinese manual of 101114563 No underline correction This revision period: 101 years July 31 [Table 2] Sensitivity line width widening width (μιη) Spectral characteristics (Υ value) Contrast adhesion (μιη) &quot;_ LCD ratio [: and Example 1 6.5 7.8 20000 10 ~^^- Example 2 7.2 8.5 20000 10 ' &quot;ο ^ Example 3 7.3 8.5 20000 10 'Instance 4 7.3 8.5 20000 10 Example 5 7.5 8.4 20000 10 Example 6 7.4 8.4 20000 10 Example 7 7.5 8.4 20000 10 ^—Example 8 Ί5 7.5 18000 10 〇Example 9 7.5 8.2 20000 10 Example 10 6.4 65 23000 10 〇 Example 11 6.5 65.1 23000 10 〇 Example 12 6.4 65.1 23500 10 〇^' Example 13 6.5 66.9 29000 10 Example 14 6.4 66.8 28000 10 〇^ Example 15 6.4 66.5 25000 10 Example 16 63 66.5 25000 10 Example 17 6.5 66.1 24000 10 Comparative Example 1 6 7.8 20000 25 Comparative Example 2 6.5 8.4 20000 25 Comparative Example 3 5.9 8 18000 25 Comparative Example 4 5.9 65 22900 25 Comparative Example 5 6 66.8 22900 25 ~~~~ΊΓ - Comparative Example 6 6 66.8 29000 25 ~~~~Τ The following are known from Table 2. The colored photosensitive resin composition of the alkali-soluble resin of the present invention is excellent in sensitivity and spectral characteristics (Y value), and has excellent affinity, excellent adhesion, and large specific resistance of liquid crystal. The liquid crystal display was obtained by the coloring photosensitive resin composition of the example, and the sensitivity and the adhesion were lower than those of the first to the comparative examples, and the ratio, the comparative example 3, the tb example 5, and the taste example were compared. The liquid crystal steepness value of the liquid crystal of 6 is also low. 131 201245878 1 厶JA 厶pill Revision date: July 31, 2011 is the 101st 14563 Chinese manual without scribe correction [Example 18~Example 20, Comparative Example 7, Comparative Example 8] &lt;Color Filter [Production of Sheet Substrate] A method having the black matrix, R (red) halogen, G (produced by the method described in paragraph number [〇〇84] to paragraph number [0095] of the Japanese Patent Laid-Open Publication No. 2005_3861. Green) Color/lighting sheet of halogen and B (blue) halogen (hereinafter referred to as a color calender substrate). Here, the substrate size of the color filter substrate is 550 mm x 650 mm. Next, a transparent electrode of Indium Tin Oxide (ITO) is further formed by sputtering on R, G, and B, and a black matrix of the obtained color filter substrate. &lt;Formation of Light Spacer&gt; The ITO transparent electrode of the color filter substrate on which the ITO transparent electrode was formed by sputtering described above was subjected to slit coating by a rotator as shown in Table 3 below. A coating liquid for a photosensitive resin layer of the formulation. Then, using a vacuum dryer VCD (manufactured by Tokyo Ohka Co., Ltd.), one part of the solvent was dried in 3 sec seconds, and the fluidity of the coating film was disappeared, and then pre-baked for 3 minutes on a hot plate of 9 (rc). A photosensitive resin layer having a film thickness of 5 μm is formed (film formation step). Then, a proximity type exposure machine (manufactured by Kyori Hi-Tech Electronics Co., Ltd.) having an ultrahigh pressure mercury lamp is used in the mask (having a diameter of a quartz crystal exposure mask of a circular pattern of b μηι) and a color filter substrate (which is arranged such that the mask faces the photosensitive resin layer) are vertically erected in parallel, and the mask surface and the photosensitive layer are erected The distance between the surfaces of the resin layer is 100 μηι′ The intensity of exposure to the 365 nm through the mask is 250 132 201245878 UX 厶ριίΊ Date of revision: July 31, 101 is the Chinese manual of No. 101114563 Ultraviolet light (exposure step, exposure amount: 2〇〇mJ/cm2) of W/m transmitted through ultraviolet transmission calender (υν_35, manufactured by Toshiba Glass Co., Ltd.). Sodium-based developer (a liquid obtained by diluting 10 times with pure water, which contains Ο.% mol/L of CCL, 0.47 mol/L sodium carbonate, 5% dibutylnaphthalene) Sodium sulfonate, anionic surfactant, antifoaming agent and stabilizer; trade name T-CD1 (manufactured by Fujifilm Co., Ltd.) and riding at a cone pressure of 0 15 ° MPa at 29 ° C Development of 3G seconds, forming a silk image (developing step). Then 'using a cleaning agent (a product obtained by diluting the product with a water dilution of 1 〇, which contains phosphate, citrate, nonionic interface activity) Agent, defoamer and stabilizer; the product name is T_SD3 (manufactured by Fujifilm Co., Ltd.), and it will be sprayed by spraying for 20 seconds at a cone pressure of 〇〇2MPa at 33C. The residue around the pattern image is removed, and a cylindrical spacer pattern is formed so as to be spaced apart from each other by 300 μηιχ300 μηι. Q. Second, by using a color filter substrate provided with a spacer pattern Heat treatment at 130 C for 60 minutes (Heating step), a light spacer is formed on a color filter substrate. Here, '1000 obtained optical spacers are measured using a three-dimensional surface structure analysis microscope (manufacturer: Zyg〇 Corporation, model: New View 5022) The distance from the upper surface of the IT 〇 transparent electrode (the surface on the side farther from the substrate in the two faces parallel to the substrate) to the highest position of the optical spacer (hereinafter the distance is referred to as the "height of the optical spacer") The average value of one optical spacer is taken as the average height of the optical spacer. 133 201245878 TCJ HpiJL 丄 is 101111563 Chinese manual without scribe correction This revision period: 1 7 1 July 31 穑== Phase 2 performs the bottom surface of the obtained optical spacer = measurement =. The result is straight money, and the average height is a cylindrical shape. [table 3] Unit: CGI242 (Manufactured by Ciba Specialty Chemicals Co., Ltd., well 厶 仏 仏 仏 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对Production of Liquid Crystal Display Device&gt; In addition, a glass substrate is prepared as a counter substrate, and the pattern of the pi mode is taken on the transparent electrode and the counter substrate of the color substrate obtained above, and the pattern is formed thereon. An alignment film containing a poly-imine is provided. &gt; Thereafter, it is coated by a dropper method at a position corresponding to a black matrix frame surrounded by a group of pixels surrounding the color light-emitting sheet. The sealant for the external hardening resin 'drops the liquid crystal for the pVA mode, and after bonding the substrate to the counter substrate, the substrate is bonded to the substrate, and then heat-treated to cure the sealant. 6. The sealant is cured as described above. The polarizing plate HLC2-2518 manufactured by Sanritz Co., Ltd. is attached to both sides of the liquid crystal cell. 134 Revised date _·July 31, 2011 〇〇B 201245878 J 1 z.pifl No. 101114563 Chinese manual No underline correction Secondly 'use as red (R) LED FR1H2H (wafer type LED manufactured by Stanley Electric Co., Ltd.), DGlllOT (wafer type LED manufactured by Stanley Electric Co., Ltd.) as green (g) LED, DB1 as blue (B) LED mH (Stoley (10) also produced a wafer type LED) to form a backlight of the side light type, and is disposed on the side of the liquid crystal cell provided with the polarizing plate as the back surface to form a liquid crystal display device. β &lt; Evaluation The results of the measurement evaluation of the obtained optical spacer and the liquid crystal display device are shown in Table 4 below. (See the cross-sectional shape of the light spacer), and the above-mentioned light interval was observed with a scanning electron microscope. The four parts of the part (the shape of the contact of the four corners. The angle of the periphery of the substrate) and the central portion of the substrate were measured at five points in total, and the cross-sectional shape of the optical spacer was evaluated. All the middle taper 1 becomes a light spacer with a shape of ^^=: at 5 places. Form 2: below; but not equivalent to the above-mentioned Α. In the section, the taper is a light spacer: at 5 places Any of the following. But not equivalent to the above A and 135 201245878 ΙΖ,ρΐΙΙ is the Chinese manual of No. 101114563. There is no slash correction. This revision date: July 31, 2011 D: The following light spacers are formed: about 1 to 4 of 5, taper Exceeding the range of 40° or more and 100° or less. Ε : The following optical spacers are formed: in all of the five places, the taper exceeds 40. Above 100. The following range. (Height uniformity of the optical spacer) The difference between the maximum value and the minimum value was calculated based on the results of the heights of the 1000 optical spacers measured in the above <Formation of the optical spacer>, and evaluated according to the following criteria. . The smaller the difference, the better the uniformity. ~ Evaluation criteria ~ A : The difference between the maximum value and the minimum value of the height of the optical spacer is less than 0.2 μη 〇 Β : The difference between the maximum value and the minimum value of the height of the optical spacer is 0.2 μm or more and less than 0.3 μm. C: The difference between the maximum value and the minimum value of the height of the optical spacer is 0.3 μm or more and less than 0.4 μm. D: The difference between the maximum value and the minimum value of the height of the optical spacer is 0.4 μm or more and less than 0.5 μm. Ε: The difference between the maximum value and the minimum value of the height of the optical spacer is 0.5 μmη or more. (Deformation recovery rate) The obtained optical spacers were measured and evaluated as follows by a micro hardness meter (DUH-W201, manufactured by Shimadzu Corporation). Using a 50 μηκρ cone-shaped indenter, the maximum load is set to 136 201245878^ is the 101114563 Chinese manual without a slash correction. The correction date is: 50 mN on July 31, 1st, and the hold time is set to 5 seconds. The measurement was carried out by a load-unloading test method. From the measured values, the deformation recovery ratio [°/〇] was obtained by the following formula, and evaluated according to the following evaluation criteria. The measurement was carried out in an environment of 22 ± 1 ° C and 5 % RH. Deformation recovery rate (%) = (recovery amount after load release [μιη] / deformation amount at load [μπι]) xlOO ~ Evaluation criteria ~ A B C D E F The deformation recovery rate is 90% or more. The deformation recovery rate is 87% or more and less than 90%. The deformation recovery rate is 85% or more and less than 87%. The deformation recovery rate is 80% or more and less than 85 〇/〇. The deformation recovery rate is 75% or more and less than 80%. The deformation recovery rate is less than 75%. 〇 (display unevenness of the liquid crystal display device) The liquid crystal display device of the gray screen is displayed by visual observation of the input gray display 'Evaluation based on the evaluation criteria below~ Good display ・ Sounds on the display unit, and the image is displayed in good condition. There is a slight unevenness, but it does not affect C: Yu Xian Shen slightly found the name, but the actual order is 137 201245878 ιζ, ριιι is the 101114563 Chinese manual without a line correction this repair. 臼期: July, 101 r%. D: Unevenness was found on the display unit. The evaluation results are shown in the following Table 4 [Table 4] Alkali-soluble resin P-2 P-7 P-10 Q-i Patent Document 2 - Resin 1 Example 21 Example 22 Example 23 Comparative Example 7 Comparative Example 8 As shown in Table 4, the unevenness of the shed spacer of the example was suppressed. Further, in the case where the optical spacer j is uniform, the unevenness in the degree of display is suppressed. 'Day 4 does not install, [Example 24] &lt;Formation of protective film&gt; G Gui 3 In the process of forming a black matrix, R Shu:: and after the black matrix and each element The photosensitive resin composition of 21 is exposed to a t-surface without passing through a mask. The heat treatment is performed to form a protective film. Here, the conditions of the coating, exposure, and heat treatment were the same as those of the coating, exposure, and heat treatment in the formation of the optical spacer of Example 21 except that the film was exposed through a mask. Then, a transparent electrode of ITO (Indium Tin Oxide) was further formed on the obtained protective layer by sputtering. &lt;Formation of Light Spacer&gt; 138 201245878^ Revision date: July 1st, 2011, No. 101114563 Chinese character description without scribe line correction is used on the 1τ transparent electrode formed as described above, and used in Example 21 The photosensitive resin composition was used as a photosensitive resin composition, and the method (4) was used for the same as in Example 2U. &lt;Production and Evaluation of Liquid Crystal Display Device&gt; Using a color green plate substrate on which the above-described spacers were formed, a liquid-display device was produced by the same method as in Example 21. Evaluation was carried out in the same manner as in Example 21. The evaluation results are shown in Table 5. [Table 5] Patent ·~~ As shown in Table 5, in the case of a protective film, a good result. The use of the photosensitive fine composition of the present invention is also obtained in the same manner as in the case of forming the optical spacer. - Evaluation results - Film thickness uniformity is uneven -»__ AA — ~~_ BA [Simple description of the diagram] No 0 [Description of main component symbols] None. 139 201245878 ^z^izpifl For the Chinese manual No. 101114563, there is no slash correction. This revision period: 发明1 July 31 invention patent specification (this specification format, order and bold type 'Do not change, ※ mark Please do not fill in the details. ※Application number: μ/&quot;(5) Π: ※Application deadline: 丨叫 "IPC classification one, invention name: (Chinese / English) ... photosensitive resin composition, color filter, protection Film, optical spacer, 0 substrate for liquid crystal display device, liquid crystal display device and solid-state imaging device PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER, PROTECTIVE FILM, PHOTO SPACER, SUBSTRATE FOR 1ΐ〇ϋϊ&amp;ΐ^Ϊ5Τ&amp; LIQUID CRYSTAL DISPLAY, AND SOLID- STATE IMAGE SENSING DEVICE 2. SUMMARY OF THE INVENTION The present invention provides a photosensitive resin composition which is excellent in aggregation and hardenability at the time of exposure, and has high exposure sensitivity, and can be excellent in contour characteristics even with a short heat treatment time. Light spacers, uniformity or hardness with excellent color pattern, uniformity of cross-sectional shape and high uniformity The protective film. A photosensitive resin composition comprising an alkali-soluble resin (A) having at least an acidic group and at least two different polymerizable unsaturated groups in a side chain, a polymerizable compound (B), and photopolymerization Starting agent (c). III. Abstract of English invention: A photosensitive resin composition having excellent 201245878 *t厶J i厶Ρ·ΙΧ丄 is the Chinese manual No. 101114563. There is no slash correction. The revision period is: July 31, 1st, 1st, July, 31, polymerization hardenability under exposure And high exposure sensitivity is provided. Even when a time of a heat treatment is short, the photosensitive resin composition is capable of forming a coloring pattern with excellent profile characteristic, a photo spacer with excellent uniformity of cross sectional shape and uniformity of height, and a photosensitive film with excellent uniformity or hardness. The photosensitive resin composition includes an alkali soluble resin (A), a polymerizable compound (B), and a photoinitiator (C), each having at least a group having an acidic group and a polymerizable unsaturated 201245878 J iw^pil 1 is the Chinese manual of No. 101114563. There is no slash correction. This revision period: July 31, 101 VII. Application for specialization Scope: 1. A photosensitive resin composition comprising an alkali-soluble resin (A) having at least an acidic group and at least two different polymerizable unsaturated groups in a side chain, and a polymerizable compound (B) And a photopolymerization initiator (C). 2. The photosensitive resin composition according to claim 1, which further comprises a colorant. 3. The photosensitive resin composition according to claim 1, wherein the alkali-soluble resin has a repeating unit represented by the following formula (A): Formula (A) [Chemical Formula 2] / R / I ~/*ch2-c- I Λ c=o A4 is a group of 1 o_c-c=c (in the formula (A), R represents a hydrogen atom or a methyl group, and R!, R2, R3, R4 and R5 are each a hydrogen atom, a halogen atom, a cyano group, or an alkyl group. Base or aryl). 4. The photosensitive resin composition according to claim 1, wherein the alkali-soluble resin has a repeat represented by the following formula (A): 140 201245878 ιζ, ριίΐ is No. 101114563 Line correction This revision date: July 31, 2011 and the repeating unit represented by the following general formula (B): General formula (A) [Chemical 3] (In the general formula (A), R represents a halogen atom or a fluorenyl group, and &amp;, R2, R3, R4 and R5 respectively represent a hydrogen atom, a halogen atom, a cyano group, an alkyl group or an aryl group) Formula (B) 〇 [Chemical 4] (In the formula (B), R represents a hydrogen atom or a methyl group). 5. The photosensitive resin composition according to claim 1, wherein the alkali-soluble resin has a repeat represented by the following formula (A): 141 201245878 厶J 1 厶JL is No. 1114114563 Chinese manual: No graffiti correction This revision date: July 31, 2011, the repeating unit represented by the following general formula (B) and the repeating unit represented by the following general formula (C): General formula (A) ) [Chemical 5] / R 4ch2-c~ I 0=0 〇-〇-〇=〇 R5 R2 (In the general formula (A), R represents a hydrogen atom or a fluorenyl group, ^. U Ί-% •, a L aryl 3 group t and R5 respectively represent a hydrogen atom, a functional atom, a cyano group, an alkyl group General formula (B) [Chemical 6] (In the general formula (8), 'R represents a hydrogen atom or a methyl group) 142 201245878tl is the Chinese manual of No. 101114563 No picture 1} Line correction This revision period: January 1, 31, General formula (C) [Chemistry 7 ] (In the general formula (C), r represents a hydrogen atom or a methyl group, X represents a divalent linking group, and Ac represents a (meth)acryloxy group). 6. The photosensitive resin composition according to claim 3, wherein the repeating unit represented by the formula (A), the repeating unit represented by the formula (B), and the pass are In any of the repeating units represented by the formula (C), R is a fluorenyl group. 7. The photosensitive resin composition as described in claim 3, wherein, in the repeating unit represented by the above formula (A), R is a methyl group, and R1 to R5 are both nitrogen atoms. A color filter, a protective film, a photo spacer, or a substrate for a liquid crystal display device, which is obtained by using the photosensitive resin composition as described in claim i. A method of producing a color filter, comprising: a step of forming a colored layer, applying the photosensitive resin composition according to item 2 of the patent application to a support to form a colored layer; 143 31201245878 for the 1011145 The Chinese manual has no scratch date: 1〇1 year exposure step, the tomb shadow; and 9 pattern exposure, forming a latent development step 'to form a right to form a pattern. The coloring layer of the latent image is developed. 10. The liquid crystal display is described in the eighth item of the patent scope. The 111-state imaging device includes: the color light described in claim 9 is considered, The patent scope sheet, protective film or light spacer is used. 4 color ray light manufactured by the method of manufacture r. 11.11. A resin comprising the repeating unit represented by the repetition represented by 'jy1 represented by the following formula (2-1): ^ unit and the following formula (3-1) General formula (1-1) [Chemical 8] General formula (2-1) [Chemical 9] 144 201245878 Revision period: 1 July 1st, 2001 ^ifl is No. 101114563 Chinese manual without line correction General formula (3-1) [Chemical 10] 0 = 〇 | 〇 - X~Ac J (In the formula (3-1), X represents a divalent linking group, and Ac represents a (fluorenyl) acryloxy group). 12. The resin according to claim 11, wherein 90 mol% or more of the repeating unit constituting the resin is a repeating unit represented by the formula (1-1), and the formula (2) -1) Any of the repeating unit represented by the above and the repeating unit represented by the above formula (3-1). The resin according to claim 11, wherein the resin comprises 40 mol% to 80 mol% of the repeating unit represented by the formula (1-1), and the formula (2-1) The repeating unit represented by the formula is 15 mol% to 30 mol% and the repeating unit represented by the formula (3-1) is 1 mol% to 30 mol%. 145 201245878ti • m. L· is the Chinese manual of No. 101114563. There is no slash correction. The date of this amendment: July 31, 101. IV. Designated representative map: (1) The representative representative of the case is: None. (2) A brief description of the component symbols of this representative figure: None. 5. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention: General formula (A) General formula (B) 3 201245878 S Λ. ^ Λ Λ. Λ. Revision period: July 31, 1st, 2011 No. 101114563 Chinese manual without scribe line correction formula (C)