TW201240981A - Coating solution for forming functional polymer film, and method for forming functional polymer film - Google Patents
Coating solution for forming functional polymer film, and method for forming functional polymer film Download PDFInfo
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Abstract
Description
201240981 六、發明說明 【發明所屬之技術領域】 本發明係有關新穎之形成機能性聚合物膜用之塗 及機能性聚合物膜之形成方法》 【先前技術】 液晶顯示元件中,液晶配向膜擔任使液晶配向於 方向之角色,目前工業上利用之主要液晶配向膜係由 聚醯亞胺先驅物之聚醯胺酸、聚醯胺酸酯或聚醯亞胺 液所形成的聚醯亞胺系液晶配向劑塗佈於基板上成 得。又,相對於基板面之液晶爲平行配向或傾斜配向 成膜後係藉由刷洗進行表面延伸處理。又,曾提案之 刷洗處理之方法爲,利用藉由照射偏光紫外線等之各 性化學反應之方法,且近年來檢討其朝向工業化。 爲了提升該類液晶顯示元件之顯示特性,曾藉由 聚醯胺酸、聚醯胺酸酯或聚醯亞胺之構造、摻混特性 之聚醯胺酸、聚醯胺酸酯或聚醯亞胺、添加添加劑等 法,改善液晶配向性及電特性等,或控制預傾角等。 利用聚醯亞胺之構造控制預傾角之技術中,以具 鏈之二胺作爲部分聚醯亞胺原料用之方法爲,可因應 胺之使用比例控制預傾角,因此較易得到目的之預傾 故爲適用之增加預傾角之方法。已知之增加液晶之預 的二胺之支鏈構造如,長鏈之烷基或氟烷基(例如參 利文獻1 )、環狀基或環狀基與烷基之組合(例如參考 佈液 一定 ,將 之溶 膜所 時, 取代 向異 變更 不同 之方 有支 該二 角, 傾角 考專 專利 -5- 201240981 文獻2)、巢類骨架(例如參考專利文獻3)等。 又,爲了改善預傾角之安定性及步驟依存性,曾檢討 該類增加液晶之預傾角用之二胺之構造,此時所使用之支 鏈構造曾提案,含有苯基或環己基等之環構造之物(例如 參考專利文獻4、5)。另外曾提案3個至4個支鏈具有該 類環構造之二胺(例如參考專利文獻6)。 近年來伴隨著液晶顯示元件被廣泛實用化於大畫面之 液晶電視及高精細行動用途(數位相機或行動電話之顯示 部分),而擴大先前所使用之基板大型化、基板段差之凹 凸。該狀況下就顯示特性之觀點,相對於大型基板及段差 也要求能均勻塗佈液晶配向膜。 製作液晶配向膜之過程中,將聚醯胺酸溶液或溶劑可 溶性聚醯亞胺之溶液塗佈於基板時,工業上一般係進行撓 性印刷等。所添加之塗佈液之溶劑爲,對樹脂具有優良溶 解性之溶劑(以下也稱爲良溶劑)之N-甲基-2-吡咯烷酮或 r-丁內酯等時,爲了提高塗膜均勻性係混合對樹脂之溶 解性較低之溶劑(以下也稱爲弱溶劑)之丁基溶纖劑等。但 弱溶劑溶解聚醯胺酸及聚醯亞胺之能力較差,故需大量混 合,結果會發生析出(例如參考專利文獻7)。特別是於溶 劑可溶性聚醯亞胺之溶液中,該問題更明顯化。又,使用 前述具有該類支鏈之二胺所得之聚醯亞胺,傾向會降低溶 液之塗佈均勻性,因此需增加弱溶劑之混合量,故該類溶 劑之混合容許量也成爲聚醯亞胺之重要特性。 又,除了促成液晶顯示元件之高性能化、大面積化、 -6 - 201240981 顯示裝置之省電力化等,爲了使用於各種環境下,促使液 晶配向膜所要求之特性更嚴苛化。特別是將液晶配向劑塗 佈於基板時會拉長接觸時間,故有因析出或分離而發生印 刷不良、因蓄積電荷(RDC)而焙燒等之問題,但先前技術 難同時解決該兩者。 該類聚醯亞胺系液晶配向膜爲了改善所希望之特性, 曾嘗試以各種二胺成分作爲部分原料用,但與其他特性之 關係中無法自由使用所希望之二胺成分。 另外,聚醯亞胺因所具有之高機械強度、耐熱性、耐 溶劑性之特性,除了液晶配向膜,也被廣泛使用於電動電 子領域中之保護材料、絕緣材料,又使用該類材料時同樣 進行改良聚醯亞胺之原料用之二胺成分,但同樣無法自由 使用所希望之二胺成分。 因此爲了改善該類所希望之特性,非限定上述聚醯亞 胺系之液晶配向膜,同樣也存在將其他聚合物等之溶液塗 佈於基板而成膜形成之聚合物膜。 先前技術文獻 專利文獻 專利文獻1 :特開平2-282726號公報 專利文獻2 :特開平3 - 1 79 3 23號公報 專利文獻3 :特開平4-28 1 427號公報 專利文獻4:特開平9-278724號公報 專利文獻5 :國際公開第2004/52962號報告 專利文獻6 :特開2004-67589號公報 201240981 專利文獻7:特開平2-37324號公報 【發明內容】 發明之槪要 發明所欲解決之課題 爲了解決上述先前技術之問題點,本發明之課題爲, 提供可得到能較自由改善各種特性之機能性聚合物膜的形 成機能性聚合物膜用之塗佈液,及使用其之機能性聚合物 膜之形成方法。 解決課題之方法 解決上述課題之本發明之形成聚醯亞胺膜用之塗佈液 爲’特徵係含有具備賦予機能性之機能性構造部位,與其 所連結之至少1個梅爾德倫酸構造部位的下述式[A]至[D] 所表示之群中所選出之至少一種修飾用化合物,及被修飾 用之聚合物或合成前述被修飾用之聚合物用之單體。 [化1]201240981 VI. Description of the Invention [Technical Field] The present invention relates to a novel method for forming a functional polymer film for forming a functional polymer film. [Prior Art] In a liquid crystal display device, a liquid crystal alignment film is used. The role of the liquid crystal in the direction of orientation, the main liquid crystal alignment film currently used in the industry is a polyimide system formed by a polyimide, polyglycolate or polyimine solution of a polyimide precursor. The liquid crystal alignment agent is coated on the substrate. Further, the liquid crystal is applied in a parallel alignment or oblique alignment with respect to the liquid crystal on the substrate surface, and the surface extension treatment is performed by brushing. Further, the method of the brushing treatment which has been proposed is a method in which various chemical reactions such as polarized ultraviolet rays are applied, and it has been reviewed in recent years for industrialization. In order to enhance the display characteristics of such liquid crystal display elements, polyamines, polyphthalates or polyazides which have been constructed by blending properties of polylysine, polyamidomate or polyimine. Amine, additive, etc., improve liquid crystal alignment and electrical properties, or control pretilt angle. In the technique of controlling the pretilt angle by using the structure of polyimine, the method of using the chain diamine as a partial polyimine raw material can control the pretilt angle according to the use ratio of the amine, so that the pretilt of the purpose can be easily obtained. Therefore, it is a method to increase the pretilt angle. It is known to increase the branched structure of the pre-diamine of liquid crystal, such as a long-chain alkyl group or a fluoroalkyl group (for example, reference), a cyclic group or a combination of a cyclic group and an alkyl group (for example, a reference cloth liquid must be In the case of dissolving the film, the two corners are replaced by the different sides, and the dip angle test patent-5-201240981 document 2), the nest skeleton (for example, refer to Patent Document 3), and the like. Further, in order to improve the stability of the pretilt angle and the dependency of the steps, the structure of the diamine for increasing the pretilt angle of the liquid crystal has been reviewed. The branched structure used at this time has been proposed, and a ring containing a phenyl group or a cyclohexyl group has been proposed. The structure is constructed (for example, refer to Patent Documents 4 and 5). Further, three to four branched diamines having such a ring structure have been proposed (for example, refer to Patent Document 6). In recent years, liquid crystal display devices have been widely used in large-screen liquid crystal televisions and high-definition mobile applications (displays for digital cameras or mobile phones), and the size of substrates used previously and the unevenness of substrate steps have been expanded. In this case, from the viewpoint of the characteristics, it is required to uniformly coat the liquid crystal alignment film with respect to the large substrate and the step. In the process of producing a liquid crystal alignment film, when a solution of a polyamic acid solution or a solvent-soluble polyimine is applied to a substrate, flexographic printing or the like is generally performed industrially. The solvent of the coating liquid to be added is used to improve the uniformity of the coating film when N-methyl-2-pyrrolidone or r-butyrolactone of a solvent having excellent solubility in a resin (hereinafter also referred to as a good solvent) is used. A butyl cellosolve or the like in which a solvent having a low solubility in a resin (hereinafter also referred to as a weak solvent) is mixed. However, the ability of the weak solvent to dissolve the polyamic acid and the polyimine is inferior, so a large amount of mixing is required, and as a result, precipitation occurs (for example, refer to Patent Document 7). This problem is more pronounced especially in solutions of solvent soluble polyimine. Further, the use of the polyimine obtained by the above-described branched diamine tends to lower the uniformity of coating of the solution, so that it is necessary to increase the mixing amount of the weak solvent, so that the mixing tolerance of the solvent also becomes a polyfluorene. An important property of imines. In addition, in order to improve the performance and size of the liquid crystal display device, and to save power in the -6 - 201240981 display device, the characteristics required to promote the liquid crystal alignment film are more severe in various environments. In particular, when the liquid crystal alignment agent is applied to the substrate, the contact time is elongated. Therefore, there is a problem that printing failure occurs due to precipitation or separation, and baking is caused by accumulation of electric charge (RDC). However, it is difficult to solve both of them at the same time in the prior art. In order to improve the desired properties, such a polyimide-based liquid crystal alignment film has been attempted to use various diamine components as a partial raw material, but the desired diamine component cannot be used freely in connection with other characteristics. In addition, because of its high mechanical strength, heat resistance, and solvent resistance, polyimine is widely used in protective materials and insulating materials in the field of electric electronics, in addition to liquid crystal alignment films, and when such materials are used. In the same manner, the diamine component for the raw material of the polyimine is modified, but the desired diamine component cannot be used freely. Therefore, in order to improve the desired properties of the above, the liquid crystal alignment film of the above polyamidiamine type is not limited, and a polymer film formed by coating a solution of another polymer or the like on a substrate is also known. CITATION LIST PATENT DOCUMENT PATENT DOCUMENT PATENT DOCUMENT PATENT DOCUMENT PATENT DOCUMENT PATENT DOCUMENT PATENT DOCUMENT PATENT DOCUMENT PATENT DOCUMENT PATENT DOCUMENT Patent Document 5: International Publication No. 2004/52962, Patent Document 6: JP-A-2004-67589, No. JP-A No. Hei. In order to solve the problems of the prior art described above, an object of the present invention is to provide a coating liquid for forming a functional polymer film capable of providing a functional polymer film capable of improving various characteristics, and to use the same. A method of forming a functional polymer film. Solution to Problem The coating liquid for forming a polyimide film of the present invention which solves the above-described problems is characterized in that the characteristic system includes at least one Meldronic acid structure having a functional structural portion having a functional property. At least one compound for modification selected from the group represented by the following formulas [A] to [D], and a polymer to be modified or a monomer for synthesizing the polymer for modification. [Chemical 1]
(式中,Wi爲賦予機能性之機能性構造部位之h價之 有機基。Vi爲-H、-OH、-OR、-SR或- NHR,R爲任意之 場所可含有苯環、環己烷環、雜環、氟、醚鍵、酯鍵 '醯 -8- 201240981 胺鍵之碳原子數1至35之一價有機基。1^爲1至8之整 數)。 [化2](In the formula, Wi is an organic group having a h-valent value at a functional structural site of the function. Vi is -H, -OH, -OR, -SR or -NHR, and R may contain a benzene ring or a ring in any place. Alkane ring, heterocyclic ring, fluorine, ether bond, ester bond '醯-8- 201240981 The carbon atom of the amine bond is 1 to 35 one-valent organic group. 1^ is an integer of 1 to 8). [Chemical 2]
(式中,W2爲賦予機能性之機能性構造部位之k2價之 有機基。V2爲-H、-OH、-SR、-OR或-NHR,R爲任意之 場所可含有苯環、環己院環、雜環、氟、醚鍵、酯鍵、醯 胺鍵之碳原子數1至35之一價有機基。k2爲1至8之整 數)。 [化3](In the formula, W2 is an organic group having a k2 valence of a functional structural site of a functionality. V2 is -H, -OH, -SR, -OR or -NHR, and R may contain a benzene ring or a ring in any place. The ring of the courtyard, the heterocyclic ring, the fluorine, the ether bond, the ester bond, and the guanamine bond have a carbon number of 1 to 35, and the k2 is an integer of 1 to 8. [Chemical 3]
(式中,W3及W4各自爲賦予機能性之機能性構造部 位之h價之有機基’ W3及w4可相同或相異。k3爲1至 8之整數)。 201240981 [化4](wherein, W3 and W4 are each an organic group in which the h-valent organic structure of the functional structural moiety is imparted to the same or different. W3 and w4 may be the same or different. k3 is an integer of 1 to 8). 201240981 [化4]
(式中’ W5爲賦予機能性之機能性構造部位之2 k4價 之有機基。k4爲1至8之整數)。 本發明之機能性聚合物膜之形成方法爲,特徵係將上 述形成機能性聚合物膜用之塗佈液塗佈於基板上,焙燒後 得到介由前述梅爾德倫酸構造部位使前述機能性構造部位 鍵結於前述被修飾聚合物之機能性聚合物膜。 發明之效果 本發明可藉由含有具備賦予機能性之機能性構造部 位,與其所連結之至少1個梅爾德倫酸構造部位的上述式 [A]至[D]所表示之群中所選出之至少一種所表示之修飾用 化合物的形成機能性聚合物膜用之塗佈液,得到比較能自 由改善各種特性之機能性聚合物膜。 實施發明之形態 下面將詳細說明本發明。 本發明之形成機能性聚合物膜用之塗佈液爲,含有具 備賦予機能性之機能性構造部位’與其所連結之至少1個 梅爾德倫酸構造部位的下述式[A]至[D]所表示之群中所選 -10- 201240981 出之至少一種修飾用化合物之物。 [化5](wherein W5 is an organic base of 2 k4 valence imparting functional structural sites. k4 is an integer from 1 to 8). The method for forming a functional polymer film of the present invention is characterized in that the coating liquid for forming the functional polymer film is applied onto a substrate, and after firing, the above-mentioned function is obtained by the Meldronic acid structural portion. The structural site is bonded to the functional polymer film of the modified polymer described above. Advantageous Effects of Invention The present invention can be selected from the group represented by the above formulas [A] to [D] including at least one Meldronic acid structural portion to which the functional structural portion having the functional property is provided. The coating liquid for forming a functional polymer film of at least one of the compounds for modification shown is a functional polymer film which can be freely improved in various properties. Mode for Carrying Out the Invention The present invention will be described in detail below. The coating liquid for forming a functional polymer film of the present invention contains the following formula [A] to [including at least one meldronic acid structural portion to which the functional structural site having the functional property is attached" D] The compound of at least one modification compound selected in -10-201240981 selected from the group. [Chemical 5]
[A] 性構造部位之k,價有 -NMR,R爲任意之場 i、醚鍵、酯鍵、醯胺 巨。ki爲1至8之整 (式中,Wi爲賦予機能性之機能 機基。V!爲-H、-OH、-SR、-OR 或 所可含有苯環、環己烷環、雜環、壽 鍵之碳原子數1至35之一價有機3 數)。 [化6][A] The k of the structural site has a valence of -NMR, and R is an arbitrary field i, an ether bond, an ester bond, or a guanamine. Ki is from 1 to 8 (where Wi is a functional basis for imparting functionality. V! is -H, -OH, -SR, -OR or may contain a benzene ring, a cyclohexane ring, a heterocyclic ring, The number of carbon atoms in the Shou bond is 1 to 35, and the organic number is 3). [Chemical 6]
(式中,W2爲賦予機能性之機能 有機基。v2 爲-H、-OH、-SR、-OR 場所可含有苯環、環己院環、雜環、 胺鍵之碳原子數1至35之一價有機 數)° 性構造部位之k2價之 或-NHR,R爲任意之 氟、醚鍵、酯鍵、驢 基。k2爲1至8之整 201240981 [化7](wherein W2 is a functional organic group imparting functionality. v2 is -H, -OH, -SR, -OR. The place may contain a benzene ring, a cyclohexyl ring, a heterocyclic ring, and an amine bond having 1 to 35 carbon atoms. One of the organic numbers) The sum of the k2 valence of the structural moiety - NHR, R is any fluorine, ether bond, ester bond, or sulfhydryl group. K2 is from 1 to 8 201240981 [Chem. 7]
(式中,W3及W4各自爲賦予機能性之機能性構造部 位之k3價之有機基,w3及W4可相同或相異。k3爲1至 8之整數)。 [化8](wherein W3 and W4 are each an organic group having a k3 valence of a functional structural moiety imparted to the function, and w3 and W4 may be the same or different. k3 is an integer of 1 to 8). [化8]
(式中’ W5爲賦予機能性之機能性構造部位之2 k4價 之有機基。k4爲1至8之整數)。 上述式[A]所表示之修飾用化合物之具體例如,下述 式[U至[iii]所表示之修飾用化合物。此時以末端胺基爲— 級或二級之胺化合物,或肼化合物爲原料,合成上述式[A] 所表示之修飾用化合物時,係合成下述[i]所表示之修飾用 化合物,以硫醇化合物,或二硫化碳爲原料,合成上述式 [A ]所表不之修飾用化合物時’係合成下述式[i i ]所表示之 修飾用化合物,以醛、酮化合物,或羧酸衍生物爲原料, 合成上述式[A]所表不之修飾用化合物時,係合成下述式 [iii]所表示之修飾用化合物。又,以碳二醯亞胺化合物爲 -12- 201240981 原料時,係合成下述式[i]所表示之化合物,此時Rj爲〜 Η 〇 [化9](wherein W5 is an organic base of 2 k4 valence imparting functional structural sites. k4 is an integer from 1 to 8). Specific examples of the compound for modification represented by the above formula [A] include a compound for modification represented by the following formula [U to [iii]. In this case, when the compound for modification represented by the above formula [A] is synthesized by using an amine compound having a terminal amine group as a primary or secondary amine or a hydrazine compound as a raw material, the compound for modification represented by the following [i] is synthesized. When a compound of the above formula [A] is synthesized by using a thiol compound or carbon disulfide as a raw material, a compound for modification represented by the following formula [ii] is synthesized, and is derived from an aldehyde, a ketone compound, or a carboxylic acid. When the compound for modification described in the above formula [A] is synthesized as a raw material, a compound for modification represented by the following formula [iii] is synthesized. Further, when the carbodiimide compound is a raw material of -12-201240981, a compound represented by the following formula [i] is synthesized, and at this time, Rj is ~Η 〇 [Chemical 9]
(式中,爲來自上述式[Α]所表示之修飾用化合物之 原料用的末端胺基爲一級或二級之胺化合物、肼化合物, 或碳二醯亞胺化合物的k,價之有機基,例如單鍵,或可 具有雜原子及環構造之直鏈狀或支鏈狀碳原子數1至6〇 之h價之有機基。]^及…與上述式以]之1^及乂^目同。 P爲,以胺化合物或碳二醯亞胺化合物爲原料時爲1,以 肼化合物爲原料時爲2。Rj爲Ri至R8所表示之-H,或任 意之場所可含有苯環、環己烷環、雜環、氟、醚鍵、醋 鍵、醯胺鍵之碳原子數1至35之一價有機基,尺1至r8 可相同或相異。又,Rj可與部分Y!連結形成環)。 [化 10](wherein the terminal amine group used for the raw material of the modifying compound represented by the above formula [Α] is a primary or secondary amine compound, an anthracene compound, or a k quinone imine compound k, a valence organic group , for example, a single bond, or an organic group having a linear or branched carbon atom number of 1 to 6 Å having a hetero atom and a ring structure.]^ and ... and the above formula are 1^ and 乂^ P is the same as when the amine compound or the carbodiimide compound is used as the raw material, and 2 when the ruthenium compound is used as the raw material. Rj is -H represented by Ri to R8, or the benzene ring may be contained in any place. The cyclohexane ring, the heterocyclic ring, the fluorine, the ether bond, the vinegar bond, the guanamine bond have an organic group having 1 to 35 carbon atoms, and the scales 1 to r8 may be the same or different. Further, Rj may be combined with the moiety Y. ! Link to form a ring). [化10]
(式中,Y2爲來自上述式[A]所表示之修飾用化合物之 原料用的硫醇化合物,或二硫化碳的h價之有機基,例 & -13- 201240981 如單鍵,或可具有雜原子或環構造之直鏈狀或支鏈狀碳原 子數1至60之ki價之有機基。幻及Vi與上述式[八]之Id 及V,相同)。(wherein Y2 is a thiol compound for use as a raw material of the compound for modification represented by the above formula [A], or an organic group of h-valent of carbon disulfide, and the example & -13-201240981 is a single bond, or may have a hetero A linear or branched carbon atom having an atomic or branched structure having a ki valence of from 1 to 60. The phantom and Vi are the same as Id and V of the above formula [VIII].
(式中,Y3爲來自上述式[A]所表示之修飾用化合物之 原料用的醛化合物、酮化合物或羧酸衍生物、或源自鄰甲 酸酯之k,價之有機基,例如單鍵,或可具有雜原子或環 構造之直鏈狀或支鏈狀碳原子數1至60之1^價之有機 基。1^及乂1與上述式[八]之1^及V!相同)。 上述式[i]至[iii]所表示之修飾用化合物中,h爲2時 Υι至Y4之具體例如,下述式(Y-1)至(Y-120)所表示之2 價有機基等。其中以所得之機能性聚合物膜作爲液晶配向 膜用時’爲了得到良好之液晶配向性較佳爲,以直線性較 高之二胺化合物爲原料之構造,該類之Y如,(Y-7)、(Y- 10)、 (Υ-11)、 (Υ-12) ' (Υ-13) ' (Υ-21) ' (Υ-22)、 (Υ- 23)、 (Υ-25)、 (Υ-26)、 (Υ-27)、 (Υ-41)、 (Υ-42)、 (γ- 43)、 (Υ-44) ' (Υ-45) ' (Υ-46)、 (Υ-48)、 (Υ-61)、 (Υ- 63)、 (Υ-64)、 (Υ-65)、 (Υ-66)、 (Υ-67)、 (Υ-68)、 (Υ- 69)、 (Υ-70) ' (Υ-71)、 (Υ-78)、 (Υ-79) ' (Υ-80) ' (Υ- -14- 201240981 8 1)、(Υ-8 2)或(Y-l 09)。又,以所得之機能性聚合物膜爲 提高液晶之預傾角用之液晶配向膜時較佳爲,以支鏈具有 長鏈烷基(例如碳數10以上之烷基)、芳香族環、脂肪族 環、巢類骨架,或組合該等之構造之二胺化合物爲原料之 構造,該類 Y W,(Y-83)、(Y-84)、(Y-85)、(Y-86)、(Y-87)、(Y-88)、(Y-89)、(Y-90)、(Y-91)、(Y-92)、(Y-93)、(Υ-94)、(Υ-95)、(Υ-96)、(Υ-97)、(Υ-98)、(Υ_ 99) 、 (Υ-100) 、 (Υ-101) 、 (Υ-102) 、 (Υ-103) 、 (Υ-104)、 (Υ-105)、 (Υ-106)、 (Υ-107)、或(Υ·1〇8)等,但非限定於 此。又,欲提升液晶顯示元件之電特性時如’(γ·31)、 (Υ-40) 、 (Υ-64) 、 (Υ-65) 、 (Υ-66) 、 (Υ-67) 、 (Υ-109) 、 (Υ-1 1 〇)等。又,欲將光反應性賦予液晶配向膜時如’(丫- 17)、(Υ-18)、(Υ-111)、(Υ-112)、(Υ-113)、(Υ·114)、(Υ-115)、 (Υ-116)' (Υ-117)、 (Υ-118)、 (Υ-119)等。 [化 12](In the formula, Y3 is an aldehyde compound, a ketone compound or a carboxylic acid derivative derived from a raw material of the modifying compound represented by the above formula [A], or k derived from an orthoformate, a valence organic group, for example, a single a bond, or an organic group having a linear or branched carbon atom number of 1 to 60, which may have a hetero atom or a ring structure. 1^ and 乂1 are the same as 1^ and V! of the above formula [8] ). In the compound for modification represented by the above formulas [i] to [iii], when h is 2, specific examples of Υι to Y4 include, for example, a divalent organic group represented by the following formulas (Y-1) to (Y-120). . When the obtained functional polymer film is used as a liquid crystal alignment film, it is preferable to use a diamine compound having a high linearity as a raw material for obtaining a good liquid crystal alignment property, such as Y-(Y- 7), (Y-10), (Υ-11), (Υ-12) ' (Υ-13) ' (Υ-21) ' (Υ-22), (Υ- 23), (Υ-25) , (Υ-26), (Υ-27), (Υ-41), (Υ-42), (γ- 43), (Υ-44) ' (Υ-45) ' (Υ-46), ( Υ-48), (Υ-61), (Υ-63), (Υ-64), (Υ-65), (Υ-66), (Υ-67), (Υ-68), (Υ- 69), (Υ-70) ' (Υ-71), (Υ-78), (Υ-79) ' (Υ-80) ' (Υ- -14- 201240981 8 1), (Υ-8 2) Or (Yl 09). Further, when the obtained functional polymer film is used as a liquid crystal alignment film for increasing the pretilt angle of liquid crystal, it is preferred that the branched chain has a long-chain alkyl group (for example, an alkyl group having 10 or more carbon atoms), an aromatic ring, and a fat. a family ring, a nest skeleton, or a structure in which a diamine compound of such a structure is combined as a raw material, such YW, (Y-83), (Y-84), (Y-85), (Y-86), (Y-87), (Y-88), (Y-89), (Y-90), (Y-91), (Y-92), (Y-93), (Υ-94), (Υ -95), (Υ-96), (Υ-97), (Υ-98), (Υ_99), (Υ-100), (Υ-101), (Υ-102), (Υ-103) , (Υ-104), (Υ-105), (Υ-106), (Υ-107), or (Υ·1〇8), etc., but are not limited thereto. Moreover, when it is desired to improve the electrical characteristics of the liquid crystal display element, such as '(γ·31), (Υ-40), (Υ-64), (Υ-65), (Υ-66), (Υ-67), ( Υ-109), (Υ-1 1 〇), etc. Further, when the photoreactivity is to be imparted to the liquid crystal alignment film, such as '(丫-17), (Υ-18), (Υ-111), (Υ-112), (Υ-113), (Υ·114), (Υ-115), (Υ-116)' (Υ-117), (Υ-118), (Υ-119), etc. [化 12]
S -15- 201240981 [化 13] .ch5 .5 (Υ·18) ch2 (Y-19) (Y-20) (Y-21) (Y-22) CH3 (Y-23)S -15- 201240981 [Chem. 13] .ch5 .5 (Υ·18) ch2 (Y-19) (Y-20) (Y-21) (Y-22) CH3 (Y-23)
(Y-24) (Y-25) {Y-26) (Y-27) (Y-28) (Y-30) (Y-31) (Y-32) (Y-33) (Y-29) [化 14](Y-24) (Y-25) {Y-26) (Y-27) (Y-28) (Y-30) (Y-31) (Y-32) (Y-33) (Y-29) [Chemistry 14]
[化 15][化15]
[化 16] ch3 h2) - HI C—CH 2 \I/ H2)55 (CH(Y-Η I CICH H2- c CH3 —(CH2)n- —(CH2)2-C-(CH2)2--(CH2)4-C-(CH2)3- n = 2~5 CH3 CH3 (Y-52) (Y-53) (Y-54) ch3 ch3 ch3 ch3 -CH2-C-(CH2)2-C-(CH2)3--(CH2)2-C-(CH2)5- —(CH2)4-C-(CH2)5- (Y-56) (Y-57) (Y-58) -16- 20\2409%\ [化 17〕 ch3 (一 (Y-63)CH3 h2) - HI C—CH 2 \I/ H2)55 (CH(Y-Η I CICH H2- c CH3 —(CH2)n- —(CH2)2-C-(CH2)2- -(CH2)4-C-(CH2)3- n = 2~5 CH3 CH3 (Y-52) (Y-53) (Y-54) ch3 ch3 ch3 ch3 -CH2-C-(CH2)2-C -(CH2)3--(CH2)2-C-(CH2)5--(CH2)4-C-(CH2)5- (Y-56) (Y-57) (Y-58) -16- 20\2409%\[化17] ch3 (一(Y-63)
〇 (Υ-66) (V-65) (Υ-64) 々,v::rxx m-n*2·4 (Y-68) (Y><7) ,o(cH2CH2〇L· 〔化· (Υ-69) m,n s 2·4 (Υ-70) 9] 令。Na0Hw W0t?" (V-71) (V-72) (V-73) 产〆 (Y-74)V^a, (Y-77) (Y-75)〉JX (Y-78) (Y-76) n = 2-5 (V-79) -17 5 201240981 [化 20]〇(Υ-66) (V-65) (Υ-64) 々, v::rxx mn*2·4 (Y-68) (Y><7), o(cH2CH2〇L·[化· ( Υ-69) m, ns 2·4 (Υ-70) 9] 令.Na0Hw W0t?" (V-71) (V-72) (V-73) 〆(Y-74)V^a, (Y-77) (Y-75)〉JX (Y-78) (Y-76) n = 2-5 (V-79) -17 5 201240981 [Chem. 20]
[化 21] η = 0-21 、0- -(CH2)n-CH3η = 0-21 , 0- -(CH2)n-CH3
~ύ~'~ύ~'
、〇~C3""""^*~^~(CH2)n-CH3 (Y-85) s〇—(CH2)n-CH3 (Y-91) n = 0~21 >"~0~0~(CH2)n"CH3 n = 0〜21 (Υ·86) Η〇Κ> 〇-(CH2)n-CH3 (Y-88) n = 0-21 0-(3-〇-°-(CH2)n-CH3 (Y-90) n = 0-21,〇~C3""""^*~^~(CH2)n-CH3 (Y-85) s〇—(CH2)n-CH3 (Y-91) n = 0~21 >"~0~0~(CH2)n"CH3 n = 0~21 (Υ·86) Η〇Κ> 〇-(CH2)n-CH3 (Y-88) n = 0-21 0-(3-〇- °-(CH2)n-CH3 (Y-90) n = 0-21
(CH2)n-CH3 n = 0-21 (Y-92) O-(CH2)n-CH3 (Y-93) n = 0-21 "cc °'O—O~O_0'(CH2>n-CH3 (Y-94) n = 0-21 [化 22](CH2)n-CH3 n = 0-21 (Y-92) O-(CH2)n-CH3 (Y-93) n = 0-21 "cc °'O-O~O_0'(CH2>n- CH3 (Y-94) n = 0-21 [Chem. 22]
n = 0~21n = 0~21
〇-(CH2)n-CH3 n = 0-21〇-(CH2)n-CH3 n = 0-21
(Y-96) Π = °~21 b—^〇-(CH2)n~CH3 (Y-98) n = 〇~21 Ί8- 201240981 [化 23](Y-96) Π = °~21 b—^〇-(CH2)n~CH3 (Y-98) n = 〇~21 Ί8- 201240981 [Chem. 23]
"CC -Q) (Y-100)"CC -Q) (Y-100)
[化 24][Chem. 24]
-19- 201240981-19- 201240981
H2n+1 [化 26]H2n+1 [Chemistry 26]
(Y-116)(Y-116)
上述式[Π至[iii]所表示之修飾用化合物中,k,爲1時 ¥,至Y3之具體例如,下述式所表示之1價有機基,或 [Υ-1]至[Υ-120]之1個鍵結手與氫原子鍵結之構造等,但 非限定於此。 -20- 201240981 [化 27] -(CH2)n-CH3 η = 0-21In the compound for modification represented by the above formula [Π to [iii], k is 1 hour, and specific to Y3 is, for example, a monovalent organic group represented by the following formula, or [Υ-1] to [Υ- 120] The structure in which one of the bonding hands is bonded to a hydrogen atom, but is not limited thereto. -20- 201240981 [Chem. 27] -(CH2)n-CH3 η = 0-21
-©"(CHJn-CHa -〇-(CH2)n-CH3 - CK21 〇—(靴-叫 η = 0-21-©"(CHJn-CHa -〇-(CH2)n-CH3 - CK21 〇-(boots - called η = 0-21
η = 0-21 -(CH2)n-CH3 n = CK21 ^0- η = 0-21 ^o- -(CH2)„-CH3 η = 0-21 P^: —.c -(CH2)n-CH3 η = 0-21 -〇-〇-〇(CH2)nCH3 -〇-〇-〇-(CH2)n-CH3 〖0-21 、HN-^^^^-〇-(CH2)n-CH3 n = 0~21"a ^〇-Q-(ch2)„-ch3 n * 0-21 ~®~^N~〇-(CH2)n-CH3 n = 〇~21 3-Q-〇(CH2)n-CH3 :0 〜21 -〇{CH2)a-〇-^-^-〇(CH2)nCH3 :0~21η = 0-21 -(CH2)n-CH3 n = CK21 ^0- η = 0-21 ^o- -(CH2)„-CH3 η = 0-21 P^: —.c -(CH2)n- CH3 η = 0-21 -〇-〇-〇(CH2)nCH3 -〇-〇-〇-(CH2)n-CH3 〖0-21 、HN-^^^^-〇-(CH2)n-CH3 n = 0~21"a ^〇-Q-(ch2)„-ch3 n * 0-21 ~®~^N~〇-(CH2)n-CH3 n = 〇~21 3-Q-〇(CH2)n -CH3 :0 ~21 -〇{CH2)a-〇-^-^-〇(CH2)nCH3 :0~21
(CH^-CHs 0-21 n = 0-21 -〇-(CH2)n-CH3 n*0~21 〇-CCH2)n-CH3 0-21 0-〇-(chz)-ch3 n = o-2i -(CH2)-CH3 n = 0~21(CH^-CHs 0-21 n = 0-21 -〇-(CH2)n-CH3 n*0~21 〇-CCH2)n-CH3 0-21 0-〇-(chz)-ch3 n = o- 2i -(CH2)-CH3 n = 0~21
又,上述式[i]至[iii]所表示之修飾用化合物中,!^爲 3以上時Y!至Y4之具體例如,下述式所表示之3價以上 之有機基,或[Υ-1]至[Υ-120]脫離氫原子之構造等’但非 限定於此。又,本說明書中Me爲甲基。 -21 - 201240981 [化 28] Λ众1r浐浐Further, among the compounds for modification represented by the above formulas [i] to [iii], When it is 3 or more, Y! to Y4 is specifically a trivalent or higher organic group represented by the following formula, or a structure in which [Υ-1] to [Υ-120] is desorbed from a hydrogen atom, etc., but is not limited thereto. . Further, in the present specification, Me is a methyl group. -21 - 201240981 [化 28] Λ众1r浐浐
上述式[A]所表示之修飾用化合物之製造方法無特別 限定,例如上述式[i]及[ii]所表示之修飾用化合物可藉 由,於原甲酸三甲酯中,或原甲酸三乙酯中,或一般有機 合成用之有機溶劑(例如乙酸乙酯、己烷、甲苯、四氫呋 喃、乙腈、甲醇、氯仿、1,4·二噁烷、N,N -二甲基甲醯 胺、N -甲基-2-吡咯烷酮)中使原甲酸三甲酯或原甲酸三乙 酯’同時與下述式[E1]所表示之胺化合物或下述式[E2]所 表示之硫醇化合物與梅爾德倫酸反應而得。該反應之反應 溫度及反應時間無特別限制,例如6 0至1 2 〇 t下反應3 0 -22- 201240981 分鐘至2小時。 [化 29]The method for producing the compound for modification represented by the above formula [A] is not particularly limited. For example, the compound for modification represented by the above formulas [i] and [ii] may be used in trimethyl orthoformate or orthoformate III. In ethyl ester, or an organic solvent for general organic synthesis (e.g., ethyl acetate, hexane, toluene, tetrahydrofuran, acetonitrile, methanol, chloroform, 1,4-dioxane, N,N-dimethylformamide, In the N-methyl-2-pyrrolidone), the trimethyl orthoformate or the triethyl orthoformate 'is simultaneously with the amine compound represented by the following formula [E1] or the thiol compound represented by the following formula [E2] Meldron acid reacted. The reaction temperature and reaction time of the reaction are not particularly limited, and for example, the reaction is carried out at 60 to 12 Torr for 3 0 -22 to 201240981 minutes to 2 hours. [化29]
Yi—^NHRj)^ [El] (式中,Y^Rj及1^與上述式[i]之YpRj及1^相 同)。 [化 30] Y2~f-SH)ki [E2] (式中,Y2及k,與上述式[ii]之Υ2及k,相同)。 又,上述式[iii]所表示之修飾用化合物可藉由,於吡 啶中或其他之有機鹼化合物中(例如三乙基胺、三丁基 胺、二異丙基乙基胺),或共存該等有機鹼化合物及三苯 基膦等之膦系化合物之上述一般有機合成用之有機溶劑 中’使下述式[E3]所表示之醛化合物與梅爾德倫酸反應而Yi—^NHRj)^ [El] (wherein Y^Rj and 1^ are the same as YpRj and 1^ of the above formula [i]). Y2~f-SH)ki [E2] (wherein Y2 and k are the same as Υ2 and k of the above formula [ii]). Further, the modifying compound represented by the above formula [iii] may be present in pyridine or other organic alkali compound (for example, triethylamine, tributylamine, diisopropylethylamine), or coexistence. In the organic solvent for general organic synthesis of the organic base compound and the phosphine-based compound such as triphenylphosphine, the aldehyde compound represented by the following formula [E3] is reacted with Meldron acid.
得。該反應之反應溫度及反應時間無特別限制,例如0°C 至100°C下反應1至24小時。 [化 31] Y3-fCH〇)ki [E3] (式中,Y3及1^與上述式[丨⑴之丫3及k,相同)》 其他之上述式[A]所表示之修飾用化合物之製造方法 如’以一般已知之各種有機合成法化學修飾上述[E1]等之 胺化合物、上述[E2]等之硫醇化合物,或上述[E3]等之醛 化合物之胺基、硫醇基、醛基後’介有調距器得具有胺 基、硫醇基或醛基之化合物,再以其爲原料與梅爾德倫酸 S. -23- 201240981 反應之方法。該化學修飾可進行複數次。 具體例如,可以一般已知之各種有機合成法化學修飾 上述[E1]之胺化合物之胺基,得下述式[E4]至[E-4]所表示 之化合物後,藉由與上述式[i]至[iii]所表示之修飾用化合 物相同之合成法使其與梅爾德倫酸反應而得。又,以下述 式[E4]至[E 6]所表示之化合物爲原料與梅爾德倫酸反應 時’可合成下述式[i,]至[iii’]之式[A]所表示之修飾用化 合物。 [化 32] Q^NHRj [E4] kiGot it. The reaction temperature and reaction time of the reaction are not particularly limited, and for example, the reaction is carried out at 0 ° C to 100 ° C for 1 to 24 hours. Y3-fCH〇)ki [E3] (wherein, Y3 and 1^ are the same as the above formula [丨(1), 丫3 and k, the same)" The other modification compound represented by the above formula [A] In the production method, the amine compound such as the above [E1], the thiol compound of the above [E2], or the amine group or the thiol group of the aldehyde compound of the above [E3], or the like, is chemically modified by various organic synthesis methods generally known. After the aldehyde group, a compound having an amine group, a thiol group or an aldehyde group is introduced with a distance adjuster, and then a method of reacting with Melduronic acid S. -23-201240981 is used as a raw material. This chemical modification can be carried out multiple times. Specifically, for example, the amine group of the amine compound of the above [E1] can be chemically modified by various organic synthesis methods, and the compound represented by the following formulas [E4] to [E-4] can be obtained by the above formula [i] It is obtained by reacting the same compound as the modification compound represented by [iii] with Meldronic acid. Further, when the compound represented by the following formulas [E4] to [E6] is used as a raw material to react with Meldronic acid, the formula [A] of the following formula [i,] to [iii'] can be synthesized. A compound for modification. [化32] Q^NHRj [E4] ki
Rj ki [E5][E6] (式中,Y!、Rj及k丨與上述式[i]之γ丨、Rj及k丨相 同° Q!爲單鍵’或可具有雜原子及環構造之直鏈狀或支 鏈狀碳原子數1至15之二價有機基。心爲^至R8所表 示之一 Η’或任意之場所可含有苯環、環己烷環雜環、 讓 '酸鍵、酯鍵 '醯胺鍵之碳原子數1至35之一價有機 基’ Ri至Rs可相同或相異。又,1可與部分Qi連結形 成環)。 -24- 201240981 [化 33]Rj ki [E5][E6] (wherein Y!, Rj and k丨 are the same as γ丨, Rj and k丨 of the above formula [i] ° Q! is a single bond ' or may have a hetero atom and a ring structure a linear or branched divalent organic group having 1 to 15 carbon atoms. The core is one of R to 'R' or any place may contain a benzene ring, a cyclohexane ring hetero ring, and an 'acid bond. The ester bond 'amine' bond has a carbon number of 1 to 35. The organic group ' Ri to Rs may be the same or different. Further, 1 may be bonded to the part Qi to form a ring). -24- 201240981 [Chem. 33]
(式中,Yi、Rj、Ri、Qi 及 ki 與上述s[E4]至[E_6]之 Yi、Rj、Ri、(^及k,相同’ ▽1與上述式[八]之Vi相同)。 上述式[B]所表示之修飾用化合物之具體例如,下述 式[iv]及[v]所表示之修飾用化合物。 [化 34](wherein, Yi, Rj, Ri, Qi, and ki are the same as Yi, Rj, Ri, (^ and k of the above s[E4] to [E_6], and the same '▽1 is the same as Vi of the above formula [VIII]). Specific examples of the compound for modification represented by the above formula [B] are, for example, the compounds for modification represented by the following formulas [iv] and [v].
原料用的醒、酮化合物、鹵化烷基化合物或具有電子不足 3 -25- 201240981 不飽和鍵之化合物(例如具有丙烯醯基之化合物)的k2價之 有機基’例如單鍵’或可具有雜原子及環構造之直鏈狀或 支鏈狀碳原子數1至60之h價之有機基。“及v2與上 述式[B]之k2及V2相同)。 [化 35]a ketone, a ketone compound, a halogenated alkyl compound or a compound having an electron-deficient bond of 3 -25 to 201240981 (for example, a compound having a propylene fluorenyl group) may have a k2-valent organic group such as a single bond or may have a hetero A linear or branched organic group having from 1 to 60 hrs of atomic and cyclic structures. "And v2 is the same as k2 and V2 of the above formula [B].) [Chem. 35]
(式中’ Y5爲來自上述式[B]所表示之修飾用化合物之 原料用的羧酸衍生物之k2價之有機基,例如單鍵,或可 具有雜原子及環構造之直鏈狀或支鏈狀碳原子數1至6〇 之h價有機基。h及V2與上述式[B]之k2及V2相同)。 上述式[iv]及[v]所表示修飾用化合物中,γ4及γ5之 具體例與上述丫,至Υ3相同。 上述式[Β]所表示之修飾用化合物之製造方法無特別 限制’例如,上述式[iv]所表示之修飾用化合物可藉由, 於上述一般有機合成用之有機溶劑中,使吡啶,或其他有 機鹼化合物(例如三乙基胺、三丁基胺、二異丙基乙基 胺),或碳酸鉀、碳酸氫鈉、氫氧化鈉般之無機鹼,同時 與醛、酮化合物、鹵化烷基化合物(鹵素可爲- Cl、-Br、_1 中任何一種)或具有電子不足不飽和鍵之化合物(例如具有 丙烯醯基之化合物),與梅爾德倫酸反應而得。該反應之 反應溫度及反應時間無特別限制,例如〇°C至120°c下反 201240981 應3 0分鐘至2小時。又,以該類醛、酮化合物、鹵化烷 基化合物’或具有電子不足不飽和鍵之化合物(例如具有 丙輝醯基之化合物)爲原料,合成上述式[Β]所表示之修飾 用化合物時’可直接’或經由上述式[i i i ]所表示之化合 物’其後還原碳-碳雙鍵’而合成上述式[iv]所表示之修飾 用化合物。 又’上述式[v]所表示之修飾用化合物可藉由,於上 述一般有機合成用之有機溶劑中,使吡啶,或其他有機鹼 化合物(例如三乙基胺、三丁基胺、二異丙基乙基胺),或 碳酸鉀、碳酸氫鈉、氫氧化鈉般之無機鹼,同時與羧酸、 羧酸氯化物等之羧酸衍生物’與梅爾德倫酸反應而得。該 反應之反應溫度及反應時間無特別限制,例如_2〇至1 20 t下反應3 0分鐘至2小時。 其他之上述式[B]所表示之修飾用化合物之製造方法 如’同上述式[A]所表示之化合物之製造方法,以一般已 知之各種有機合成法化學修飾醛、酮化合物、鹵化院基化 合物、具有電子不足不飽和鍵之化合物、羧酸及羧酸衍生 物後,介有調距器得具有醛基、酮基、鹵化院基、具有電 子不足不飽和鍵之基(例如丙烯醯基)、羧基之化合物,再 以其爲原料與梅爾德倫酸反應之方法,該化學修飾可進行 複數次。該類實施化學修飾以製造上述式[B]所表示之修 飾用化合物時可得到,例如具有上述式[iv]所表示之修飾 用化合物之Y4與梅爾德倫酸構造部位之間,插入來自經 化學修飾之化合物之構造(例如可具有雜原子及環構造之 -27- 201240981 鏈狀或支鏈構造所形成的碳原子數1至15之二價有機基) 之構造的式[B]所表示之修飾用化合物,或具有上述式[v] 所表示之修飾用化合物之Y5與羰基之間,插入來自經化 學修飾之化合物之構造(例如可具有雜原子及環構造之鏈 狀或支鏈構造所形成的碳原子數1至15之二價有機基)之 構造的式[B]所表示之修飾用化合物。 上述式[C]所表示之修飾用化合物之具體例如,下述 式[vi]所表示之修飾用化合物。 [化 36](wherein Y5 is a k2-valent organic group of a carboxylic acid derivative derived from a raw material of the modifying compound represented by the above formula [B], for example, a single bond, or may have a linear structure of a hetero atom and a ring structure or a branched-chain H-valent organic group having 1 to 6 Å, and h and V2 are the same as k2 and V2 of the above formula [B]. Among the compounds for modification represented by the above formulas [iv] and [v], specific examples of γ4 and γ5 are the same as those described above for 丫3 and Υ3. The method for producing the compound for modification represented by the above formula [Β] is not particularly limited. For example, the compound for modification represented by the above formula [iv] can be obtained by using pyridine in the organic solvent for general organic synthesis described above, or Other organic base compounds (such as triethylamine, tributylamine, diisopropylethylamine), or inorganic bases such as potassium carbonate, sodium hydrogencarbonate, and sodium hydroxide, together with aldehydes, ketone compounds, and halogenated alkane The base compound (halogen may be any one of -Cl, -Br, _1) or a compound having an electron-deficient unsaturated bond (for example, a compound having an acrylonitrile group) is obtained by reacting with a Meldronic acid. The reaction temperature and reaction time of the reaction are not particularly limited, and for example, from 〇 ° C to 120 ° C, the reaction time of 201240981 should be 30 minutes to 2 hours. Further, when the aldehyde, the ketone compound, the halogenated alkyl compound or the compound having an electron-deficient unsaturated bond (for example, a compound having a fluorene group) is used as a raw material, the compound for modification represented by the above formula [Β] is synthesized. The compound for modification represented by the above formula [iv] can be synthesized "directly" or via the compound 'reduced carbon-carbon double bond' represented by the above formula [iii]. Further, the compound for modification represented by the above formula [v] can be obtained by using pyridine or other organic base compounds (for example, triethylamine, tributylamine, diiso) in the above organic solvent for general organic synthesis. Propylethylamine), or an inorganic base such as potassium carbonate, sodium hydrogencarbonate or sodium hydroxide, which is obtained by reacting a carboxylic acid derivative such as a carboxylic acid or a carboxylic acid chloride with Meledronic acid. The reaction temperature and reaction time of the reaction are not particularly limited, and for example, from 2 Torr to 1 20 t for 30 minutes to 2 hours. The production method of the compound for modification represented by the above formula [B] is as follows: a method for producing a compound represented by the above formula [A], which chemically modifies an aldehyde, a ketone compound, or a halogenated hospital base by various organic synthesis methods generally known. a compound, a compound having an electron-deficient unsaturated bond, a carboxylic acid, and a carboxylic acid derivative, and having a calibrator having an aldehyde group, a ketone group, a halogenated compound, and a group having an electron-unsaturated bond (for example, an acrylonitrile group) And a compound of a carboxyl group, which is then reacted with Meldronic acid as a raw material, and the chemical modification can be carried out plural times. When such a chemical modification is carried out to produce a compound for modification represented by the above formula [B], for example, between the Y4 and Meldron acid structural sites having the compound for modification represented by the above formula [iv], the insertion is derived from The structure of the chemically modified compound (for example, the formula [B] of a divalent organic group having 1 to 15 carbon atoms which may be formed by a chain or branched structure of a hetero atom and a ring structure -27-201240981) Between the Y5 and a carbonyl group of the compound for modification or the compound for modification represented by the above formula [v], a structure derived from a chemically modified compound (for example, a chain or a branch having a hetero atom and a ring structure) A compound for modification represented by the formula [B] which has a structure in which a divalent organic group having 1 to 15 carbon atoms is formed. Specific examples of the compound for modification represented by the above formula [C] include a compound for modification represented by the following formula [vi]. [化36]
(式中,丫6及Y7各自爲來自上述式[C]所表示之修飾 用化合物之原料用的鹵化烷基化合物,或醇衍生物之k3 價之有機基,例如單鍵,或可具有雜原子及環構造之直鏈 狀或支鏈狀碳原子數1至60之k3價之有機基。Y6及Y7 可相同或相異。k3與上述式[C]之k3相同)。 上述式[vi]所表示之修飾用化合物中,γ6及Y7之具 體例與上述Yi至Υ3相同。 上述式[C]所表示之修飾用化合物之製造方法無特別 限定,例如上述式[vi]所表示之修飾用化合物可藉由,於 上述一般有機合成用之有機溶劑中,同時使吡啶’或·其他 有機鹼化合物(例如三乙基胺、三丁基胺、二異丙基乙基 -28- 201240981 胺),或碳酸鉀、碳酸氫鈉、氫氧化鈉般之無機鹼,與上 述式[iv]所表示之修飾用化合物及鹵化烷基化合物,或另 共存鈀觸媒下,與具有末端羥基之化合物反應而得。或可 藉由於上述一般有機合成用之有機溶劑中,同時使吡啶, 或其他有機鹼化合物(例如三乙基胺、三丁基胺、二異丙 基乙基胺),或碳酸鉀、碳酸氫鈉、氫氧化鈉般之無機 鹼,與鹵化烷基化合物,與另共存鈀觸媒下,與末端具有 羥基之化合物反應而得。此時Y6及Y7可相同或相異,γ6 及Υ7不同時,上述製造方法中,可於共存2種以上之鹵 化烷基化合物及末端具有羥基之化合物,或階段添加而 得》該反應之反應溫度及反應時間無特別限制,例如60 至l2〇°C下反應30分鐘至2小時。 其他之上述式[C]所表示之修飾用化合物之製造方法 如,同上述式[A]所表示之化合物之製造方法,以一般已 知之各種有機合成法化學修飾鹵化烷基化合物或醇衍生物 後,介有調距器得具有鹵化烷基、烷氧基、羥基之化合 物,再以其爲原料與梅爾德倫酸反應之方法。該化學修飾 可進行複數次。該類實施化學修飾以製造上述式[C]所表 示之修飾用化合物時可得到,例如具有上述式[vi]所表示 之修飾用化合物之γ6與梅爾德倫酸構造部位之間,或Y7 與梅爾德倫酸構造部位之間,插入來自經化學修飾之化合 物之構造(例如可具有雜原子及環構造之鏈狀或支鏈構造 所形成的碳原子數1至15之二價有機基)之構造的式[C] 所表示之修飾用化合物。 -29 - 201240981 上述式[D]所表示之修飾用化合物之具體例如,下述 式[νΠ]所表示之修飾用化合物。 [化 37](wherein, each of 丫6 and Y7 is a halogenated alkyl compound derived from a raw material of the modifying compound represented by the above formula [C], or an k3 valent organic group of the alcohol derivative, for example, a single bond, or may have a hetero A linear or branched organic group having a k3 valence of 1 to 60 carbon atoms in the atomic and ring structure. Y6 and Y7 may be the same or different. k3 is the same as k3 of the above formula [C]). Among the compounds for modification represented by the above formula [vi], specific examples of γ6 and Y7 are the same as those of the above Yi to Υ3. The method for producing the compound for modification represented by the above formula [C] is not particularly limited. For example, the compound for modification represented by the above formula [vi] can be used in the above organic solvent for general organic synthesis while simultaneously making pyridine' or · Other organic base compounds (such as triethylamine, tributylamine, diisopropylethyl-28-201240981 amine), or inorganic bases such as potassium carbonate, sodium hydrogencarbonate, and sodium hydroxide, and the above formula [ Iv] The compound for modification and the halogenated alkyl compound or the palladium catalyst coexisting with the compound having a terminal hydroxyl group. Or may be due to the above organic solvent for general organic synthesis, simultaneously with pyridine, or other organic base compounds (such as triethylamine, tributylamine, diisopropylethylamine), or potassium carbonate, hydrogencarbonate An inorganic base such as sodium or sodium hydroxide is obtained by reacting a halogenated alkyl compound with a palladium catalyst coexisting with a compound having a hydroxyl group at the terminal. In this case, Y6 and Y7 may be the same or different, and when γ6 and Υ7 are different, in the above production method, two or more kinds of halogenated alkyl compounds and a compound having a hydroxyl group at the terminal may be present or added in stages to obtain a reaction of the reaction. The temperature and the reaction time are not particularly limited, and for example, the reaction is carried out at 60 to 12 ° C for 30 minutes to 2 hours. The production method of the compound for modification represented by the above formula [C] is as follows. For the production method of the compound represented by the above formula [A], the halogenated alkyl compound or the alcohol derivative is chemically modified by various organic synthesis methods generally known. Thereafter, a compound having a halogenated alkyl group, an alkoxy group, and a hydroxyl group is interposed with a distance adjuster, and then a method of reacting with Meldronic acid as a raw material is used. This chemical modification can be carried out plural times. When such a chemical modification is carried out to produce a compound for modification represented by the above formula [C], for example, a γ6 having a modification compound represented by the above formula [vi] and a structural site of Meldron acid or Y7 are obtained. Between the structural site of Meldronic acid, a structure derived from a chemically modified compound (for example, a divalent organic group having 1 to 15 carbon atoms formed by a chain or branched structure which may have a hetero atom and a ring structure) a compound for modification represented by the formula [C]. -29 - 201240981 The specific compound of the modification represented by the above formula [D] is, for example, a compound for modification represented by the following formula [νΠ]. [化37]
(式中,Y8爲來自上述式[D]所表示之修飾用化合物之 原料用的環狀酮化合物、環狀烷氧基亞胺化合物,或環狀 碳二醯亞胺化合物之碳原子數1至15之2 k4之有機基。 h與上述式[D]之k4相同P 上述式[vii]所表示之修飾用化合物中,Y8之具體例 如,來自環戊烷環、環己烷環或環辛烷環,或r-吡喃酮 般之環狀酮之環狀構造。 上述式[D]所表示之修飾用化合物之製造方法無特別 限制,例如上述式[Vi i]所表示之修飾用化合物可藉由,於 上述一般有機合成用之有機溶劑中,使吡啶,或其他有機 鹼化合物(例如三乙基胺、三丁基胺、二異丙基乙基胺), 或碳酸鉀、碳酸氫鈉' 氧氧化鈉般之無機鹼,同時與環狀 酮化合物(例如環己酮衍生物、T ·吡喃酮衍生物)、環狀 烷氧基亞胺化合物(例如6-位烷氧基取代四氫吡啶),或瓌 狀碳二醯亞胺化合物(例如3 -二氮雜環壬- ls2 -二烯衍生 物),及梅爾德倫酸反應而得。該反應之反應溫度及反應 時間無特別限制,例如60至1 20°C下反應30分鐘至2小 -30- 201240981 時。 上述式[A]至[D]所表示之修飾用化合物可爲1種或2 種以上倂用。 又,本發明之形成機能性聚合物膜用之塗佈液爲,含 有被修飾用聚合物或合成該等被修飾用聚合物之單體。被 修飾用聚合物可爲具有梅爾德倫酸構造與反應部位之物無 特別限定,例如使四羧酸及其衍生物中所選出之至少一種 四羧酸成分與二胺成分聚合反應得聚醯亞胺先驅物後,將 該聚醯亞胺先驅物醯亞胺化所得之聚醯亞胺、丙烯酸基聚 合物、甲基丙烯酸基聚合物、丙烯醯胺聚合物、甲基丙烯 醯胺聚合物、聚苯乙烯、聚乙烯酯、聚矽氧烷、聚醯胺、 聚酯、聚胺基甲酸酯、聚碳酸酯、聚脲、聚苯酚(酚醛清 漆樹脂)、馬來醯亞胺聚合物,或導入具有三聚異氰酸骨 架及三哄骨架之化合物之聚合物。又,聚合物之形態例如 可爲樹脂狀聚合物、高支化聚合物、星狀聚合物等之支化 狀聚合物、聚索羥、聚旋型環等之非共鍵性聚合物之形 態。又,合成該等被修飾用聚合物用之單體如,被修飾用 聚合物爲聚醯亞胺先驅物及聚醯亞胺時爲四羧酸及其衍生 物中所選出之至少一種四羧酸成分與二胺成分,被修飾用 聚合物爲丙烯酸基聚合物時爲丙烯酸及其衍生物、丙烯酸 酯及其衍生物,被修飾用聚合物爲甲基丙烯酸基聚合物時 爲甲基丙烯酸及其衍生物、甲基丙烯酸酯及其衍生物,被 修飾用聚合物爲丙烯醯胺聚合物時爲丙烯醯胺及其衍生 物,被修飾用聚合物爲甲基丙烯醯胺聚合物時爲甲基丙烯 -31 - 201240981 醯胺及其衍生物,被修飾用聚合物爲聚苯乙烯時爲苯乙烯 及其衍生物’被修飾用聚合物爲聚乙烯酯時爲具有乙烯基 之衍生物,被修飾用聚合物爲聚矽氧烷時爲具有甲氧基或 乙氧基之矽烷化合物,被修飾用聚合物爲聚醯胺時爲二羧 酸及其衍生物中所選出之至少一種二羧酸成分與二胺成 分,被修飾用聚合物爲聚酯時爲二羧酸及其衍生物中所選 出之至少一種二羧酸成分與二醇成分,被修飾用聚合物爲 聚胺基甲酸酯時爲異氰酸酯化合物與具有羥基之化合物, 被修飾用聚合物爲聚碳酸酯時爲雙酚衍生物與光氣,或光 氣等價體(例如三氯光氣),或二苯基碳酸酯,被修飾用聚 合物爲聚脲時爲二異氰酸酯衍生物與二胺成分,被修飾用 聚合物爲馬來醯亞胺聚合物時爲馬來醯亞胺衍生物單獨, 或與苯乙烯之共聚物’被修飾用聚合物爲導入具有三聚異 氰酸骨架或三畊骨架之化合物之聚合物時爲具有三聚異氰 酸骨架或三哄骨架之化合物。該被修飾用聚合物或合成該 等被修飾用聚合物用之單體可爲1種,或2種以上併用。 又,聚醯亞胺先驅物係指,聚醯胺酸及聚醯胺酸酯。 本發明之形成機能性聚合物膜用之塗佈液所含的被修 飾用聚合物可以一般使用之方法製造。例如,聚醯亞胺先 驅物及聚醯亞胺可藉由上述四羧酸及其衍生物中所選出之 至少一種四羧酸成分與二胺成分聚合反應而得β 二胺成分如,h爲2之上述式[El]所表示之二胺化合 物。又’可使用先前二胺成分與四羧酸成分反應製造聚醯 亞胺先驅物時所使用之二胺成分。該聚醯亞胺先驅物之原 -32- 201240981 料用的二胺成分可爲,部分或全部係與上述式[A]所表示 之修飾用化合物之原料相同之化合物,又,二胺成分可爲 與上述式[A]所表示之修飾用化合物之原料不同之化合 物。 又,四羧酸及其衍生物中所選出之至少一種四羧酸成 分可使用,先前二胺成分與四羧酸成分反應製造聚醯亞胺 先驅物時所使用之四羧酸成分。四羧酸衍生物如,四羧酸 二鹵化物、下述式[F]所表示之四羧酸二酐、四羧酸二酯 二氯化物、四羧酸二酯等。例如,四羧酸二鹵化物、四羧 酸二酐等之四羧酸或其衍生物,與二胺成分反應,可得聚 醯胺酸。又,藉由四羧酸二酯二氯化物與二胺成分之反 應,或存在適當之縮合劑及鹼下等使四羧酸二酯與二胺成 分反應,可得聚醯胺酸酯。 [化 38] Ο 〇(wherein Y8 is a cyclic ketone compound, a cyclic alkoxyimine compound, or a cyclic carbodiimide compound having a carbon number of 1 derived from a raw material of the modifying compound represented by the above formula [D]; To the organic group of 2 k4, h is the same as k4 of the above formula [D]. In the compound for modification represented by the above formula [vii], specific examples of Y8 are, for example, derived from a cyclopentane ring, a cyclohexane ring or a ring. The ring structure of the octane ring or the cyclic ketone like r-pyrone. The method for producing the compound for modification represented by the above formula [D] is not particularly limited, and for example, the modification represented by the above formula [Vi i] The compound can be obtained by using pyridine or other organic base compounds (for example, triethylamine, tributylamine, diisopropylethylamine), or potassium carbonate or carbonic acid in the above organic solvent for general organic synthesis. Sodium hydride as an inorganic base like sodium oxyhydroxide, together with cyclic ketone compounds (such as cyclohexanone derivatives, T · pyrone derivatives), cyclic alkoxyimine compounds (such as 6-position alkoxy groups) Substituted tetrahydropyridine), or a quinoid carbodiimide compound (eg 3-diazepine-ls2 - The reaction temperature and reaction time of the reaction are not particularly limited, and for example, the reaction is carried out at 60 to 120 ° C for 30 minutes to 2 small -30 to 201240981. The compound for modification represented by [A] to [D] may be used alone or in combination of two or more. The coating liquid for forming a functional polymer film of the present invention contains a polymer to be modified or synthesized. The monomer for the polymer to be modified. The polymer to be modified may be one having a Meldronic acid structure and a reaction site, and for example, at least one selected from the group consisting of tetracarboxylic acid and a derivative thereof After the carboxylic acid component and the diamine component are polymerized to obtain a polyimide precursor, the polyimine imine of the polyimine precursor is imidized, the acryl-based polymer, the methacrylic polymer, and the propylene. Guanidine polymer, methacrylamide polymer, polystyrene, polyvinyl ester, polyoxyalkylene, polyamine, polyester, polyurethane, polycarbonate, polyurea, polyphenol ( Novolak resin), maleic imine polymer, or imported with three a polymer of a compound of an isocyanate skeleton and a triterpene skeleton. Further, the form of the polymer may be, for example, a branched polymer such as a resinous polymer, a highly branched polymer or a star polymer, or polyhydroxyl, a form of a non-co-bonding polymer such as a polycyclonic ring, and a monomer for synthesizing the polymer for modification, for example, when the polymer to be modified is a polyimide precursor and a polyimine At least one of a tetracarboxylic acid component and a diamine component selected from the group consisting of a tetracarboxylic acid and a derivative thereof, and an acrylic acid-based polymer, a derivative thereof, an acrylate, and a derivative thereof, are modified When the polymer is a methacrylic polymer, it is methacrylic acid and its derivatives, methacrylate and its derivatives, and when the modified polymer is a acrylamide polymer, it is acrylamide and its derivatives. When the modifying polymer is a methacrylamide polymer, it is a methacryl-31 - 201240981 decylamine and a derivative thereof, and when the modified polymer is a polystyrene, it is a styrene and a derivative thereof. When the product is a polyvinyl ester a derivative of a vinyl group, a decane compound having a methoxy group or an ethoxy group when the polymer for modification is a polyoxyalkylene oxide, and a dicarboxylic acid and a derivative thereof when the polymer for modification is a polydecylamine At least one dicarboxylic acid component and a diamine component are selected, and when the modified polymer is a polyester, at least one dicarboxylic acid component and a diol component selected from the dicarboxylic acid and a derivative thereof, the modified polymer When it is a polyurethane, it is an isocyanate compound and a compound having a hydroxyl group, and when the polymer to be modified is a polycarbonate, it is a bisphenol derivative and phosgene, or a phosgene equivalent (for example, trichlorophosgene). Or diphenyl carbonate, when the modified polymer is a polyurea, it is a diisocyanate derivative and a diamine component, and when the modified polymer is a maleic imine polymer, it is a maleimide derivative alone. Or a copolymer with styrene The polymer to be modified is a compound having a trimeric isocyanic acid skeleton or a triterpene skeleton when a polymer having a compound having a trimeric isocyanate skeleton or a tri-nral skeleton is introduced. The polymer to be modified or the monomer for synthesizing the polymer for the modification may be used alone or in combination of two or more. Further, the polyimine precursor refers to polyamic acid and polyamidomate. The polymer to be modified contained in the coating liquid for forming a functional polymer film of the present invention can be produced by a generally used method. For example, the polyimine precursor and the polyimine may be obtained by polymerizing at least one of the tetracarboxylic acid component selected from the above tetracarboxylic acid and a derivative thereof and the diamine component to obtain a β-diamine component, for example, h is 2 is a diamine compound represented by the above formula [El]. Further, a diamine component used in the production of a polyimide precursor can be used by reacting a previously diamine component with a tetracarboxylic acid component. The diamine component of the poly-imine precursor precursor-32-201240981 may be a compound partially or entirely the same as the raw material of the modifying compound represented by the above formula [A], and the diamine component may be used. It is a compound different from the raw material of the compound for modification represented by the above formula [A]. Further, at least one tetracarboxylic acid component selected from the group consisting of a tetracarboxylic acid and a derivative thereof can be used, and a tetracarboxylic acid component used in the production of a polyimide precursor is produced by reacting a previously diamine component with a tetracarboxylic acid component. The tetracarboxylic acid derivative is, for example, a tetracarboxylic acid dihalide, a tetracarboxylic dianhydride represented by the following formula [F], a tetracarboxylic acid diester dichloride, a tetracarboxylic acid diester or the like. For example, a tetracarboxylic acid such as a tetracarboxylic acid dihalide or a tetracarboxylic acid dianhydride or a derivative thereof can be reacted with a diamine component to obtain a polyamic acid. Further, the polycarboxylic acid ester can be obtained by reacting a tetracarboxylic acid diester with a diamine component by reacting a tetracarboxylic acid diester dichloride with a diamine component or by a suitable condensing agent and a base. [化38] Ο 〇
Ο 〇 (X爲4價有機基)。Ο 〇 (X is a 4-valent organic group).
S 上述式[F]之X之具體例如’下述式(X-1)至(X-46)所 表示之4價有機基。就化合物之取得性觀點,X較佳爲 (X-1)、(X-2)、(X-3)、(X-4)、(X-5)、(X-6)、(X-8)、(X-16)、(X-17)、(X-19)、(X-21)、(X-25)、(X-26)、(X-27)、(X-28)、(X-32)及(X-46)。爲提昇所得之機能性聚合 -33- 201240981 物膜(聚醯亞胺膜)之透明性較佳爲,使用脂肪族及具有脂 肪族環構造之四羧酸二酐,X更佳爲(X-1)、(X-2)及(x. 2 5),就與二胺成分之反應性觀點特佳爲(X-1)。 [化 39] (X-i) IH3S specifically, for example, X of the above formula [F] is a tetravalent organic group represented by the following formulas (X-1) to (X-46). From the viewpoint of the availability of the compound, X is preferably (X-1), (X-2), (X-3), (X-4), (X-5), (X-6), (X- 8), (X-16), (X-17), (X-19), (X-21), (X-25), (X-26), (X-27), (X-28) , (X-32) and (X-46). In order to enhance the functional polymerization of the polymer-33-201240981, the transparency of the film (polyimine film) is preferably an aliphatic and tetracarboxylic dianhydride having an aliphatic ring structure, and X is more preferably (X- 1), (X-2) and (x.25), and the reactivity with the diamine component is particularly preferably (X-1). [X] 39 (X-i) IH3
H3C CHa (X-2) (X-3) (X-4) (X-5) (X-6) pf-8) (X-9) (X-10) (X-ll) (X-12) (X-13) intern CX-14) (X-15) (X-16)H3C CHa (X-2) (X-3) (X-4) (X-5) (X-6) pf-8) (X-9) (X-10) (X-ll) (X-12 ) (X-13) intern CX-14) (X-15) (X-16)
XX. (X-23) (X-24) (X-25) 攻:CCc (X-26) PC-27) =8=知如 (X-28) (X-29) (X-30) -34- 201240981 [化 40]XX. (X-23) (X-24) (X-25) Attack: CCc (X-26) PC-27) =8=知如(X-28) (X-29) (X-30) - 34- 201240981 [化40]
OCC OCC >〇KI (Χ-39). pi-40) PC-41) (X-42) (X-43)OCC OCC >〇KI (Χ-39). pi-40) PC-41) (X-42) (X-43)
四羧酸二酯之具體例如,1,2,3,4-環丁烷四羧酸二烷 基酯、1,2-二甲基-1,2,3,4-環丁烷四羧酸二烷基酯、1,3-二甲基·1,2,3,4-環丁烷四羧酸二烷基酯、1,2,3,4-四甲基- 1.2.3.4- 環丁烷四羧酸二烷基酯、1,2,3,4-環戊烷四羧酸二 烷基酯、2,3,4,5 -四氫呋喃四羧酸二烷基酯、1,2,4,5 -環己 烷四羧酸二烷基酯、3,4 -二羧基-1-環己基琥珀酸二烷基 酯、3,4-二羧基-1,2,3,4 -四氫-1-萘琥珀酸二烷基酯、 1.2.3.4- 丁烷四羧酸二烷基酯、二瓌[3,3,0]辛烷-2,4,6,8-四 羧酸二烷基酯、3,3’,4,4’-二環己基四羧酸二烷基酯、 2,3,5-三羧基環戊基乙酸二烷基酯、順式-3,7-二丁基環辛-1,5-二烯-1,2,5,6-四羧酸二烷基酯、三環[4.2.1.02’5]壬-3,4,7,8-四羧酸-3,4 : 7,8-二烷基酯、六環 [6.6.0. 12’7.03’619’14.01()’13]十六烷-4,5,1 1,12-四羧酸-4,5 : 11,12-二烷基酯、4-(2,5-二羰基四氫呋喃-3-基)-1,2,3,4-四 氫萘-1,2 -一碳二院基酯等之脂肪族四殘酸二醋,或均苯四 -35- 201240981 酸二烷基酯、3,3’,4,4’-聯苯四羧酸二烷基酯、2,2’,3,3’-聯苯四羧酸二烷基酯、2,3,3’,4-聯苯四羧酸二烷基酯、 3,3’,4,4’-二苯甲酮四羧酸二烷基酯、2,3,3’,4-二苯甲酮四 羧酸二烷基酯、雙(3,心二羧基苯基)醚二烷基酯 '雙(3,4-二羧基苯基)颯二烷基酯、I,2,5,6-萘四羧酸二烷基酯、 2,3,6,7-萘四羧酸二烷基酯等之芳香族四羧酸二烷基酯。 該二胺成分及四羧酸成分可各自爲1種,或2種以上 併用。 將四羧酸成分與二胺成分聚合反應以合成聚醯亞胺先 驅物之方法無特別限定,可使用已知之合成方法。 例如,二胺成分與四羧酸二酐.之反應爲,於有機溶劑 中使二胺成分與四羧酸二酐反應之方法。此時所使用之有 機溶劑可爲能溶解所生成之聚醯亞胺先驅物之物無特別限 定。其具體例如,N,N-二甲基甲醯胺、N,N-二甲基乙醯 胺、N-甲基-2-吡咯烷酮、N-甲基己內醯胺、二甲基亞 颯、四甲基尿素、吡啶、二甲基颯、六甲基亞颯、T-丁 內酯、異丙基醇、甲氧基甲基戊醇、二戊烯、乙基戊基 酮、甲基壬基酮、甲基乙基酮、甲基異戊基酮、甲基異丙 基酮、甲基溶纖劑、乙基溶纖劑、甲基溶纖劑乙酸酯、乙 基溶纖劑乙酸酯、丁基卡必醇、乙基卡必醇、乙二醇、乙 二醇單乙酸酯、乙二醇單異丙基醚、乙二醇單丁基醚、丙 二醇、丙二醇單乙酸酯、丙二醇單甲基醚、丙二醇-tert-丁基醚、二丙二醇單甲基醚、二乙二醇、二乙二醇單乙酸 酯 '二乙二醇二甲基醚、二丙二醇單乙酸酯單甲基醚、二 -36- 201240981 丙二醇單甲基醚、二丙二醇單乙基醚、二丙二醇單乙酸酯 單乙基醚、二丙二醇單丙基醚、二丙二醇單乙酸酯單丙基 醚、3-甲基-3-甲氧基丁基乙酸酯 '三丙二醇甲基醚、3-甲 基-3-甲氧基丁醇、二異丙基醚、乙基異丁基醚、二異丁 烯、戊基乙酸酯、丁基丁酸酯、丁基醚、二異丁基酮、甲 基環己烷、丙基醚、二己基醚、二噁烷、η-己烷、η-戊 烷、η-辛烷、二乙基醚、環己酮、伸乙基碳酸酯、伸丙基 碳酸酯、乳酸甲酯、乳酸乙酯、乙酸甲酯、乙酸乙酯、乙 酸η-丁基、乙酸丙二醇單乙基醚、丙酮酸甲酯、丙酮酸 乙酯、3-甲氧基丙酸甲酯、3-乙氧基丙酸甲基乙酯、3-甲 氧基丙酸乙酯、3 -乙氧基丙酸、3 -甲氧基丙酸、3 -甲氧基 丙酸丙酯、3-甲氧基丙酸丁酯、二聚醚或4-羥基-4-甲基-2-戊酮等。該等可單獨使用,或混合使用。又,既使爲無 法溶解聚醯亞胺先驅物之溶劑,於不析出所生成之聚醯亞 胺先驅物之範圍內,可混合上述溶劑使用。又,有機溶劑 中之水分會阻礙聚合反應,及成爲水解聚醯亞胺先驅物之 原因,因此有機溶劑較佳爲使用經脫水乾燥之物。 於有機溶劑中使二胺成分與四羧酸二酐反應之方法 如,攪拌二胺成分分散或溶解於有機溶劑所得之溶液下, 將四羧酸二酐直接,或分散或溶解於有機溶劑後加入之方 法,另外可使用將二胺成分加入四羧酸二酐分散或溶解於 有機溶劑所得之溶液之方法,交互添加四羧酸二酐與二胺 成分之方法等,該等方法中任何一種。又,各自使用複數 種之二胺成分與四羧酸二酐進行反應時,可以先行混合之 -37- 201240981 狀態進行反應,或依序各自反應,或將各自反應所得之低 分子量物混合反應形成聚合物。此時之聚合溫度可選用- 2 0°C至15(TC中任意之溫度,但較佳爲-5°C至l〇〇°C。 又,反應可以任意之濃度進行,但濃度太低時難得到高分 子量之聚合物,濃度太高時會過度提升反應液之黏度而難 均勻攪拌。因此較佳爲1至50質量%,更佳爲5至30質 量%。反應初期可以高濃度進行,其後追加有機溶劑。 聚醯亞胺先驅物之聚合反應中,二胺成分之合計莫耳 數與四羧酸二酐之合計莫耳數之比値較佳爲0.8至1.2。 同一般之聚縮合反應,該莫耳比接近1.0時會增加所生成 之聚醯亞胺先驅物之分子量。 · 又,聚醯胺酸酯可藉由,上述般四羧酸二酯二氯化物 與二胺成分之反應,或存在適當之縮合劑、鹼下使四羧酸 二酯與二胺成分反應而得。又,可藉由預先以上述方法合 成聚醯胺酸後,利用高分子反應將聚醯胺酸之羧基酯化而 得。 具體例如,存在鹼與有機溶劑下以-20 °C至150 °C, 較佳以〇°C至50°C使四羧酸二酯二氯化物與二胺成分反應 3 〇分鐘至24小時,較佳爲1小時至4小時,可合成聚醯 胺酸酯。 可使用之鹼如吡啶、三乙基胺、4 -二甲基胺基吡啶 等,但爲了穩定進行反應較佳爲吡啶。鹼之添加量就易去 除之量,且易得高分子量物之觀點,相對於四羧酸二酯二 氯化物較佳爲2至4倍莫耳。 -38 - 201240981 又,存在縮合劑下使四羧酸二酯與二胺成分聚縮合 時,可使用之鹼如,三苯基亞磷酸鹽、二環己基碳二醯亞 胺、1-乙基-3-(3-二甲基胺基丙基)碳二醯亞胺鹽酸鹽、 N,N,-羰基二咪唑、二甲氧基-1,3,5-三畊基甲基嗎啉鎗、 0-(苯并三唑-1-基)-Ν,Ν,Ν’,Ν’-四甲基脲鎗四氟硼酸鹽、 0-(苯并三唑-卜基)-Ν,Ν,Ν’,Ν’-四甲基脲鎗六氟亞磷酸 鹽、(2,3·二氫-2-硫代-3-苯并噁唑基)膦酸二苯酯、4-(4,6-二甲氧基-1 , 3,5 -三哄-2 -基)4 -甲氧基嗎啉鎰氯化物η -水合 物等。 又,使用上述縮合劑之方法中,添加添加劑用之路易 斯酸可有效率進行反應。路易斯酸較佳爲氯化鋰、溴化鋰 等之鹵化鋰。路易斯酸之添加量相對於反應用之二胺或四 羧酸二酯較佳爲0.1至1.0倍莫耳量。 上述反應用之溶劑可爲與上述合成聚醯胺酸時所使用 之溶劑相同之溶劑,但就單體及聚合物之溶解性較佳爲 Ν-甲基-2-吡咯烷酮、r-丁內酯,該等可1種或2種以上 混合使用。合成時之濃度就不易發生聚合物析出,且易得 到高分子量物之觀點,於四羧酸二酯二氯化物或四羧酸二 酯等之四羧酸衍生物與二胺成分之反應溶液中之合計濃度 較佳爲1至30質量%,更佳爲5至20質量%。又,爲了 防止四羧酸二酯二氯化物水解,聚醯胺酸酯合成用之溶劑 較佳爲盡量脫水,又以氮環境中防止外氣混入爲佳。 本發明之形成機能性聚合物膜之塗佈液所含的聚醯亞 胺係藉由’將上述聚醯亞胺先驅物脫水閉環而得。該聚醯 -39 - 201240981 亞胺中,醯胺酸基之脫水閉環率(醯亞胺化率)非必要爲 100%,可因應用途及目的任意調整。 將聚醯亞胺先驅物醯亞胺化之方法如,將聚醯亞胺先 驅物之溶液直接加熱醯亞胺化,或將觸媒加入聚醯亞胺先 驅物之溶液中進行觸媒醯亞胺化。 溶液中將聚醯亞胺先驅物熱醯亞胺化時之溫度爲100 至400°C ’較佳爲120至250°C ’又醯亞胺化反應所生成 之少較佳爲排除至系外。 聚醯亞胺先驅物之觸媒醯亞胺化可藉由,將鹼性觸媒 與酸酐加入聚醯亞胺先驅物之溶液中,於-20至250 °C, 較佳於〇至180°C下攪拌進行。鹼性觸媒之量爲醯胺酸基 之0.5至30莫耳倍,較佳爲2至20莫耳倍,酸酐之量爲 醯胺酸基之1至5 0莫耳倍,較佳爲3至3 0莫耳倍,鹼性 觸媒可爲吡啶、三乙基胺、三甲基胺、三丁基胺或三辛基 胺等,其中吡啶於進行反應時可持有適度鹼性而爲佳。酸 酐可爲乙酸酐、偏苯三酸酐或均苯四酸酐等,其中使用乙 酸酐時反應結束後易精製而爲佳。藉由觸媒醯亞胺化之醯 亞胺化率可藉由調節觸媒量、反應溫度與反應時間而控 制。 由聚醯亞胺先驅物或聚醯亞胺之反應溶液中,回收所 生成之聚醯亞胺先驅物或聚醯亞胺時,可將反應溶液投入 溶劑中進行沈澱β沈澱用之溶劑如,甲醇、丙酮、己烷、 丁基溶纖劑、庚烷、甲基乙基酮 '甲基異丁基酮、乙醇、 甲苯 '苯、水等。過濾回收投入溶劑後沈澱之聚合物後, -40- 201240981 可於常壓或減壓下,以常溫或加熱乾燥。又,重覆2至 10次將沈澱回收之聚合物再溶解於有機溶劑中,再沈澱 回收之步驟,可減少聚合物中之不純物。此時之溶劑如, 醇類、酮類或碳化氫等,又以由該等之內選用3種以上溶 劑,可更有效率精製而爲佳。 又,可作爲被修飾用聚合物用之聚醯亞胺先驅物,及 聚醯亞胺以外之聚合物如,丙烯酸基聚合物、甲基丙烯酸 基聚合物、丙烯醯胺聚合物、甲基丙烯醯胺聚合物、聚苯 乙烯、聚乙烯酯 '聚矽氧烷、聚醯胺、聚酯、聚胺基甲酸 酯、聚碳酸酯 '聚脲、聚苯酚(酚醛清漆樹脂)、馬來醯亞 胺聚合物’或導入三聚異氰酸骨架及三畊骨架之聚合物、 樹枝狀聚合物、高支化聚合物、星狀聚合物等之支化狀聚 合物、聚索羥或聚旋型環等之非共鍵性聚合物等,又,該 等聚合物中存在可與梅爾德倫酸化合物熱分解所形成之烯 酮中間物反應的官能基(例如羧基、羥基、硫醇、胺基、 亞胺基、碳-碳雙鍵(鏈烯)及碳-碳三鍵(炔烴)等之不飽和 鍵、腈、酮 '醛、酯、醯胺、醯亞胺)等時,該等聚合物 適用市售之物及已知之物。 本發明之形成機能性聚合物膜用之塗佈液所含的被修 飾用聚合物,就考量所得之機能性聚合物膜之強度、形成 機能性聚合物膜時之作業性、機能性聚合物膜之均勻性 時’以 GPC(Gel Permeation Chromatography)法測定之重 量平均分子量較佳爲5,000至1,000,000,更佳爲1〇,〇〇〇 至 1 50,000 〇 -41 - 201240981 如上述藉由含有,具有賦予機能性之機能性構造部位 ,!至W5,與其所連結之至少1個梅爾德倫酸構造部位的 上述式[A]至[D]所表示之群中所選出之至少一種修飾用化 合物,及被修飾用聚合物或合成該被修飾用聚合物用之單 體,即,藉由例如先前形成聚合物膜等所使用的形成聚合 物膜用之塗佈液中,另含有上述式[A]至[D]所表示之群中 所選出之至少一種修飾用化合物,可得到能形成較自由改 善各種特性之機能性聚合物膜的形成機能性聚合物膜用之 塗佈液。 詳細而言,上述式[A ]至[D ]所表示之修飾用化合物 爲’末端具有至少1個梅爾德倫酸構造,即,來自.梅爾德 倫酸之構造’又該梅爾德倫酸構造藉由加熱(例如1 8 0至 2 50 °C以上),可伴隨著二氧化碳與丙酮之脫離,形成烯酮 (即,二價基之持有〉C = C = 0之羰基化合物),例如可與存 在於聚醯亞胺先驅物、聚醯亞胺、丙烯酸基聚合物、甲基 丙烯酸基聚合物、丙烯醯胺聚合物、甲基丙烯醯胺聚合 物、聚苯乙烯、聚乙烯酯、聚矽氧烷、聚醯胺、聚酯、聚 胺基甲酸酯、聚碳酸酯、聚脲、聚苯酚(酚醛清漆樹脂)、 馬來醯亞胺聚合物’或導入三聚異氰酸骨架及三哄骨架之 聚合物、樹枝狀聚合物、高支化聚合物、星狀聚合物等之 支化狀聚合物、聚索羥及聚旋型環等之非共鍵性聚合物中 可修飾之官能基(例如羧基 '羥基、硫醇、胺基 '亞胺 基、碳-碳雙鍵(鏈烯)及碳-碳三鍵(炔烴)等之不飽和鍵' 腈基、酮基、醛基、酯基 '醯胺基、醯亞胺基)反應,或 -42- 201240981 利用烯酮本身二聚化等而反應之物。因此上述式[A]至[D] 所表示之修飾用化合物爲,未加熱至高溫(例如1 〇〇乞以 下)之形成機能性聚合物膜用之塗佈液之狀態下,不會與 被修飾用聚合物或合成被修飾用聚合物用之單體反應,但 藉由加熱可介由梅爾德倫酸構造而導入被修飾用聚合物 中。又,k!至ku爲2以上之上述式[A]至[D]所表示之修 飾用化合物因具有2個以上之梅爾德倫酸構造,故推測加 熱後可形成,被修飾用聚合物藉由上述式[A]至[D]所表示 之修飾用化合物交聯所得之構造。 因此將本發明之形成機能性聚合物膜用之塗佈液塗佈 於基板後焙燒所得之機能性聚合物膜爲,具有上述式[A] 至[D]所表示之修飾用化合物的Wi至W5之構造被導入被 修飾用聚合物中之物。 先前之機能性聚合物膜之一例的聚醯亞胺膜因具有高 機械強度、耐熱性、耐溶劑性之特性,故被廣泛使用爲液 晶配向膜’及電動電子領域中之保護材料、絕緣材料,而 爲了改善曾以各種二胺成分作爲部分原料用,但無法自由 使用所希望之二胺成分。例如液晶配向膜中,爲了提升液 晶配向性及預傾角等改善所希望之特性而曾以各種二胺成 分作爲部分原料用’但得到所希望之特性而使用之二胺成 分之種類、組合及量’會使二胺成分與四羧酸成分之聚合 反應性變差’因此得到所希望之特性用之二胺成分之種 類、組合及量會受限。又,有關得到所希望之特性用之二 胺成分之種類及組合,係需檢討二胺成分與四羧酸成分之 -43- 201240981 聚合反應條件。另外爲了得到可形成均勻之聚醯亞胺膜之 形成聚醯亞胺膜用之塗佈液(形成機能性聚合物膜用之塗 佈液),需爲含有成分溶解於溶劑之溶液狀態,但會因得 到所希望之特性用之二胺成分之量、組合及量,而有使形 成聚醯亞胺膜用之塗佈液所含有之聚醯亞胺先驅物或聚醯 亞胺之溶解性變差之問題。因此非限於聚醯亞胺膜,各種 聚合物膜中改善所希望之特性時而以各種單體作爲部分原 料用時,同樣會有聚合反應性變差之問題,需檢討有關得 到所希望之特性用之單體種類及組合之聚合反應條件之問 題’及使形成機能性聚合物膜用之塗佈液所含的聚合物之 溶解性變差之問題。 . 本發明中,於形成機能性聚合物膜用之塗佈液之階段 內’係以各自之化合物形態含有被修飾用聚合物或合成被 修飾用聚合物用之單體,與得到所希望之特性用之上述式 [A]至[D]所表示之修飾用化合物,又,於加熱(焙燒)形成 機能性聚合物膜用之塗佈液之階段內,得到所希望之特性 用之化合物的上述式[A]至[D]所表示之被修飾用化合物係 被導入被修飾用聚合物中》因此形成機能性聚合物膜用之 塗佈液所含的被修飾用聚合物無需以得到所希望之特性用 之單體爲原料’故不會發生單體之聚合反應性變差之問 題、需檢討有關得到所希望之特性用之單體種類及組合之 聚合反應條件之問題’及使形成機能性聚合物膜用之塗佈 液所含的聚合物之溶解性變差之問題。因此本發明之形成 機能性聚合物膜用之塗佈液可於無需考量單體之聚合反應 -44- 201240981 性、檢討聚合反應條件之必要性,及聚合物之溶解性下, 使用能得到所希望之特性(機能)之被修飾用化合物,故比 較先前形成聚合物膜用之塗佈液,可較自由改善所得之機 能性聚合物膜之各種特性。 另外本發明之形成機能性聚合物膜用之塗佈液爲,含 有具有2個以上之梅爾德倫酸構造的上述式[A]至[D]所表 示之修飾用化合物時,被修飾用聚合物可藉由加熱以上述 式[A]至[D]所表示之修飾用化合物交聯,故所得之機能性 聚合物膜相對於有機溶劑具有耐性,且爲較硬之膜。 又,使用含有,藉由四羧酸及其衍生物中所選出之至 少一種四羧酸成分與二胺成分聚合反應所得之聚·醯亞胺先 驅物,及將該聚醯亞胺先驅物醯亞胺化所得之聚醯亞胺中 所選出之至少一方聚合物,與上述式[i]所表示之具有2個 梅爾德倫酸構造之修飾用化合物的形成機能性聚合物膜用 之塗佈液時,該上述式[i]所表示之修飾用化合物爲,二胺 化合物之2個胺基各自導入梅爾德倫酸構造之物,又,該 二胺化合物適用先前檢討能得到所希望之特性之二胺成 分,即,與四羧酸成分聚合反應製造聚醯亞胺先驅物或聚 醯亞胺用之二胺成分中能得到所希望之特性之二胺成分。 因此易改善所得之聚醯亞胺膜之各種特性。 其爲含有被修飾用聚合物之形成機能性聚合物膜用之 塗佈液時,上述式[A]至[D]所表示之修飾用化合物可藉由 加熱以支鏈形態導入被修飾用聚合物,特別是上述式[A] 至[D]所表示之修飾用化合物具有2個以上之梅爾德倫酸Specific examples of the tetracarboxylic acid diester are, for example, 1,2,3,4-cyclobutanetetracarboxylic acid dialkyl ester, 1,2-dimethyl-1,2,3,4-cyclobutane tetracarboxylic acid Dialkyl ester, 1,3-dimethyl-1,2,3,4-cyclobutane tetracarboxylic acid dialkyl ester, 1,2,3,4-tetramethyl- 1.2.3.4-cyclobutane Dialkyl alkanetetracarboxylate, dialkyl 1,2,3,4-cyclopentanetetracarboxylate, dialkyl 2,3,4,5-tetrahydrofurantetracarboxylate, 1,2,4 , 5-cyclohexanetetracarboxylic acid dialkyl ester, 3,4-dicarboxy-1-cyclohexyl succinic acid dialkyl ester, 3,4-dicarboxy-1,2,3,4-tetrahydro- Dialkyl 1-naphthalene succinate, 1.2.3.4-butane tetracarboxylic acid dialkyl ester, diterpene [3,3,0]octane-2,4,6,8-tetracarboxylic acid dialkyl Ester, 3,3',4,4'-dicyclohexyltetracarboxylic acid dialkyl ester, 2,3,5-tricarboxycyclopentyl acetic acid dialkyl ester, cis-3,7-dibutyl Cyclooctane-1,5-diene-1,2,5,6-tetracarboxylic acid dialkyl ester, tricyclo[4.2.1.02'5]indole-3,4,7,8-tetracarboxylic acid-3 , 4: 7,8-dialkyl ester, hexacyclo[6.6.0. 12'7.03'619'14.01()'13]hexadecane-4,5,1 1,12-tetracarboxylic acid-4, 5: 11,12-dialkyl ester, 4-(2,5-dicarbonyltetrahydrofuran-3-yl)-1,2,3,4- An aliphatic tetra-residual acid diacetate such as hydrogen naphthalene-1,2-carbocarbyl ester or tetraphenyl-35-201240981 dialkyl ester, 3,3',4,4'-biphenyl tetra Dialkyl carboxylate, dialkyl 2,2',3,3'-biphenyltetracarboxylate, dialkyl 2,3,3',4-biphenyltetracarboxylate, 3,3' , 4,4'-dibenzophenone tetracarboxylic acid dialkyl ester, 2,3,3',4-benzophenone tetracarboxylic acid dialkyl ester, bis(3,heart dicarboxyphenyl)ether Dialkyl esters 'bis(3,4-dicarboxyphenyl)phosphonium dialkyl ester, dialkyl 1,2,5,6-naphthalenetetracarboxylate, 2,3,6,7-naphthalenetetracarboxylic acid A dialkyl aromatic tetracarboxylic acid such as a dialkyl acid ester. Each of the diamine component and the tetracarboxylic acid component may be used alone or in combination of two or more. The method of synthesizing the tetracarboxylic acid component and the diamine component to synthesize the polyimide precursor is not particularly limited, and a known synthesis method can be used. For example, the reaction of a diamine component with a tetracarboxylic dianhydride is a method of reacting a diamine component with a tetracarboxylic dianhydride in an organic solvent. The organic solvent used at this time may be any one which is capable of dissolving the produced polyimide precursor. Specifically, for example, N,N-dimethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, N-methylcaprolactam, dimethyl hydrazine, Tetramethyl urea, pyridine, dimethyl hydrazine, hexamethylarylene, T-butyrolactone, isopropyl alcohol, methoxymethylpentanol, dipentene, ethyl amyl ketone, methyl hydrazine Ketone, methyl ethyl ketone, methyl isoamyl ketone, methyl isopropyl ketone, methyl cellosolve, ethyl cellosolve, methyl cellosolve acetate, ethyl cellosolve B Acid ester, butyl carbitol, ethyl carbitol, ethylene glycol, ethylene glycol monoacetate, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether, propylene glycol, propylene glycol monoacetic acid Ester, propylene glycol monomethyl ether, propylene glycol-tert-butyl ether, dipropylene glycol monomethyl ether, diethylene glycol, diethylene glycol monoacetate 'diethylene glycol dimethyl ether, dipropylene glycol single B Acid ester monomethyl ether, di-36- 201240981 propylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monoacetate monoethyl ether, dipropylene glycol monopropyl ether, dipropylene glycol monoacetate single Propyl ether, 3-methyl-3-methoxy Butyl acetate 'tripropylene glycol methyl ether, 3-methyl-3-methoxybutanol, diisopropyl ether, ethyl isobutyl ether, diisobutylene, pentyl acetate, butyl butyl Acid ester, butyl ether, diisobutyl ketone, methylcyclohexane, propyl ether, dihexyl ether, dioxane, η-hexane, η-pentane, η-octane, diethyl ether ,cyclohexanone, ethyl acrylate, propyl carbonate, methyl lactate, ethyl lactate, methyl acetate, ethyl acetate, η-butyl acetate, propylene glycol monoethyl ether, methyl pyruvate , ethyl pyruvate, methyl 3-methoxypropionate, methyl ethyl 3-ethoxypropionate, ethyl 3-methoxypropionate, 3-ethoxypropionic acid, 3-methoxy Propionic acid, propyl 3-methoxypropionate, butyl 3-methoxypropionate, diether or 4-hydroxy-4-methyl-2-pentanone, and the like. These may be used alone or in combination. Further, even if it is a solvent which cannot dissolve the polyimide precursor, it can be used by mixing the above solvent within the range of the polyimide precursor which is not precipitated. Further, the water in the organic solvent hinders the polymerization reaction and becomes a cause of hydrolysis of the polyimide precursor. Therefore, it is preferred to use a dehydrated and dried organic solvent. The method for reacting a diamine component with a tetracarboxylic dianhydride in an organic solvent, for example, stirring a solution in which a diamine component is dispersed or dissolved in an organic solvent, and directly or dispersing or dissolving the tetracarboxylic dianhydride in an organic solvent In addition, a method of adding a diamine component to a solution obtained by dispersing or dissolving a dicarboxylic acid dianhydride in an organic solvent, a method of mutually adding a tetracarboxylic dianhydride and a diamine component, and the like may be added, and any of the methods may be used. . Further, when a plurality of diamine components are reacted with a tetracarboxylic dianhydride, the reaction may be carried out by mixing in the state of -37 to 201240981, or separately, or the low molecular weights obtained by the respective reactions may be mixed and formed. polymer. The polymerization temperature at this time may be selected from - 20 ° C to 15 (any temperature in TC, but preferably from -5 ° C to l ° ° C. Further, the reaction may be carried out at any concentration, but when the concentration is too low It is difficult to obtain a polymer having a high molecular weight. When the concentration is too high, the viscosity of the reaction liquid is excessively increased and it is difficult to uniformly stir. Therefore, it is preferably from 1 to 50% by mass, more preferably from 5 to 30% by mass. The initial stage of the reaction can be carried out at a high concentration. Further, an organic solvent is added. In the polymerization reaction of the polyimine precursor, the ratio of the total number of moles of the diamine component to the total number of moles of the tetracarboxylic dianhydride is preferably from 0.8 to 1.2. In the condensation reaction, when the molar ratio is close to 1.0, the molecular weight of the formed polyimide precursor is increased. Further, the polyphthalate can be obtained by the above-mentioned tetracarboxylic acid diester dichloride and diamine components. The reaction may be carried out by reacting a tetracarboxylic acid diester with a diamine component in the presence of a suitable condensing agent or a base. Further, the polyamine may be synthesized by a polymer reaction by synthesizing the polyamic acid in advance as described above. The esterification of the carboxyl group of the acid gives, for example, the presence of a base and an organic solvent to - The tetracarboxylic acid diester dichloride is reacted with the diamine component at 20 ° C to 150 ° C, preferably at 〇 ° C to 50 ° C for 3 minutes to 24 hours, preferably 1 hour to 4 hours, to be synthesized. Polyamide. A base such as pyridine, triethylamine or 4-dimethylaminopyridine can be used, but in order to carry out the reaction, it is preferably pyridine. The amount of the base is easily removed, and it is easy to remove. The viewpoint of obtaining a high molecular weight substance is preferably 2 to 4 times moles relative to the tetracarboxylic acid diester dichloride. -38 - 201240981 Further, when a tetracarboxylic acid diester is condensed with a diamine component in the presence of a condensing agent a base such as triphenyl phosphite, dicyclohexylcarbodiimide, 1-ethyl-3-(3-dimethylaminopropyl)carbodiimide hydrochloride, N,N,-carbonyldiimidazole, dimethoxy-1,3,5-tri-negylmethylmorpholine gun, 0-(benzotriazol-1-yl)-oxime, oxime, Ν', Ν '-Tetramethylurea gun tetrafluoroborate, 0-(benzotriazole-bu)-Ν, Ν,Ν',Ν'-tetramethylurea gun hexafluorophosphite, (2,3· Diphenyl-2-dihydro-3-benzoxazolyl)phosphonate, 4-(4,6-dimethoxy-1, 3,5-哄-2 -yl)4-methoxymorpholinium chloride η-hydrate, etc. Further, in the method using the above condensing agent, the Lewis acid added with the additive can be efficiently reacted. The Lewis acid is preferably chlorine. Lithium halide such as lithium or lithium bromide. The amount of the Lewis acid added is preferably 0.1 to 1.0 times the molar amount of the diamine or the tetracarboxylic acid diester for the reaction. The solvent for the above reaction may be the above-mentioned synthetic polyfluorene. The solvent used in the case of the amine acid is the same solvent, but the solubility of the monomer and the polymer is preferably Ν-methyl-2-pyrrolidone or r-butyrolactone, and one type or two or more types may be used in combination. The reaction solution in which the concentration at the time of synthesis is less likely to cause precipitation of a polymer, and a high molecular weight substance is easily obtained, and a reaction solution of a tetracarboxylic acid derivative such as a tetracarboxylic acid diester dichloride or a tetracarboxylic acid diester and a diamine component The total concentration in the mixture is preferably from 1 to 30% by mass, more preferably from 5 to 20% by mass. Further, in order to prevent hydrolysis of the tetracarboxylic acid diester dichloride, it is preferred that the solvent for the synthesis of the polyphthalate is desicient as much as possible, and it is preferable to prevent the incorporation of outside air in a nitrogen atmosphere. The polyimine contained in the coating liquid for forming the functional polymer film of the present invention is obtained by dehydrating and ring-closing the above-mentioned polyimine precursor. In the imine-39 - 201240981 imine, the dehydration ring closure ratio of the proline group (the imidization ratio) is not necessarily 100%, and can be arbitrarily adjusted depending on the purpose and purpose. The method for imidating the polyimine precursor ruthenium, for example, directly heating the solution of the polyimide precursor to the imidization, or adding the catalyst to the solution of the polyimide precursor to carry out the catalyst Amination. The temperature at which the polyamidene precursor is thermally imidized in the solution is from 100 to 400 ° C. Preferably, it is from 120 to 250 ° C. The less yttrium imidization reaction is preferably excluded from the system. . The ruthenium imidization of the polyimide precursor can be carried out by adding a basic catalyst and an acid anhydride to a solution of the polyimide precursor at -20 to 250 ° C, preferably 〇 to 180 °. Stirring is carried out under C. The amount of the basic catalyst is 0.5 to 30 moles, preferably 2 to 20 moles, and the amount of the acid anhydride is 1 to 50 moles, preferably 3, of the amidate group. Up to 30 moles, the basic catalyst may be pyridine, triethylamine, trimethylamine, tributylamine or trioctylamine, etc., wherein the pyridine can hold moderate alkalinity during the reaction. good. The acid anhydride may be acetic anhydride, trimellitic anhydride or pyromellitic anhydride. Among them, acetic anhydride is preferably used after the completion of the reaction. The imidization ratio of the imidization by the catalyst can be controlled by adjusting the amount of the catalyst, the reaction temperature and the reaction time. When recovering the produced polyimide precursor or polyimine from the reaction solution of the polyimine precursor or the polyimine, the reaction solution may be put into a solvent to precipitate a solvent for β precipitation, for example, Methanol, acetone, hexane, butyl cellosolve, heptane, methyl ethyl ketone 'methyl isobutyl ketone, ethanol, toluene' benzene, water, and the like. After filtering and recovering the polymer precipitated after the solvent is introduced, -40-201240981 can be dried at normal temperature or under heat at normal pressure or reduced pressure. Further, by repeating the steps of re-dissolving the precipitate-recovered polymer in an organic solvent for 2 to 10 times, and then recovering and recovering, the impurities in the polymer can be reduced. The solvent at this time is, for example, an alcohol, a ketone or a hydrocarbon, and it is preferable to use three or more solvents selected from the above to be more efficiently purified. Further, it can be used as a polyimide precursor for a polymer to be modified, and a polymer other than polyimine, such as an acrylic polymer, a methacrylic polymer, an acrylamide polymer, or a methacryl. Indoleamine polymer, polystyrene, polyvinyl ester 'polyoxane, polyamide, polyester, polyurethane, polycarbonate 'polyurea, polyphenol (novolac resin), mala Imine polymer' or a branched polymer of a polymer of a polyisocyanate skeleton and a three-till backbone, a dendrimer, a hyperbranched polymer, a star polymer, a polyether or a polycyclone a non-co-bonding polymer or the like of a ring or the like, and further having a functional group (for example, a carboxyl group, a hydroxyl group, a thiol group) capable of reacting with an enone intermediate formed by thermal decomposition of a Meldronic acid compound. When an amine group, an imine group, a carbon-carbon double bond (alkenyl group), an unsaturated bond such as a carbon-carbon triple bond (alkyne), a nitrile, a ketone 'aldehyde, an ester, a guanamine, a quinone imine, etc. These polymers are suitable for use in commercially available products and known materials. The polymer to be modified contained in the coating liquid for forming a functional polymer film of the present invention takes into consideration the strength of the obtained functional polymer film, workability in forming a functional polymer film, and functional polymer. When the film is uniform, the weight average molecular weight measured by the GPC (Gel Permeation Chromatography) method is preferably 5,000 to 1,000,000, more preferably 1 〇, 〇〇〇 to 1 50,000 〇-41 - 201240981 as described above, A functional structural part that gives functionality! And at least one modifying compound selected from the group represented by the above formulas [A] to [D] of at least one Meldron acid structural moiety to which W5 is linked, and the polymer to be modified or synthesized The monomer for a polymer to be modified, that is, the coating liquid for forming a polymer film used for forming a polymer film or the like, for example, further comprising the group represented by the above formulas [A] to [D] The at least one compound for modification selected in the present invention can provide a coating liquid for forming a functional polymer film which can form a functional polymer film which is free from various characteristics. In detail, the compound for modification represented by the above formulas [A] to [D] has a structure of at least one Meldron acid at the end, that is, a structure derived from .meldonic acid. The bismuth acid structure is heated (for example, above 180 to 250 ° C), and can be accompanied by the detachment of carbon dioxide from acetone to form an ketene (ie, a carbonyl compound in which a divalent group is held > C = C = 0). , for example, may be present in polyimine precursors, polyimine, acrylic based polymers, methacrylic based polymers, acrylamide polymers, methacrylamide polymers, polystyrene, polyethylene Ester, polyoxyalkylene, polyamine, polyester, polyurethane, polycarbonate, polyurea, polyphenol (novolac resin), maleimide polymer' or introduction of trimeric isocyanide a non-co-bonding polymer such as a polymer of a acid skeleton and a triterpene skeleton, a dendrimer, a highly branched polymer, a branched polymer such as a star polymer, a polyether hydroxyl group, and a polycyclonic ring. Functional group that can be modified (eg, carboxyl 'hydroxyl, thiol, amine' imine, carbon-carbon double bond (chain And an unsaturated bond such as a carbon-carbon triple bond (alkyne), a nitrile group, a ketone group, an aldehyde group, an ester group, a 'mercaptoamine group, an oxime imine group, or -42-201240981, which utilizes the ketene itself. A substance that reacts by polymerization or the like. Therefore, the compound for modification represented by the above formulas [A] to [D] is not coated with a coating liquid for forming a functional polymer film which is not heated to a high temperature (for example, 1 Å or less). The modification polymer or the monomer for synthesizing the polymer for modification is reacted, but it can be introduced into the polymer for modification via heating by Mellonic acid structure. In addition, since the compound for modification represented by the above formulas [A] to [D] having k: to ku of 2 or more has two or more Meldron acid structures, it is presumed that it can be formed after heating, and the polymer to be modified is formed. The structure obtained by crosslinking the compound for modification represented by the above formulas [A] to [D]. Therefore, the functional polymer film obtained by applying the coating liquid for forming a functional polymer film of the present invention to a substrate and calcining it is a Wi to the compound for modification represented by the above formulas [A] to [D]. The structure of W5 is introduced into the polymer to be modified. Polyimine film, which is a kind of functional polymer film, has high mechanical strength, heat resistance and solvent resistance, so it is widely used as a liquid crystal alignment film and a protective material and insulating material in the field of electric electronics. In order to improve the use of various diamine components as a part of raw materials, the desired diamine component cannot be used freely. For example, in the liquid crystal alignment film, in order to improve the desired properties such as liquid crystal alignment and pretilt angle, various diamine components have been used as a part of raw materials, but the types, combinations, and amounts of diamine components used to obtain desired characteristics have been obtained. 'The polymerization reactivity of the diamine component and the tetracarboxylic acid component is deteriorated', and thus the type, combination and amount of the diamine component used to obtain the desired properties are limited. Further, regarding the types and combinations of diamine components for obtaining desired characteristics, it is necessary to review the polymerization conditions of the diamine component and the tetracarboxylic acid component -43-201240981. In addition, in order to obtain a coating liquid for forming a polyimide film (a coating liquid for forming a functional polymer film) which can form a uniform polyimide film, it is necessary to dissolve the solvent in a solvent, but The solubility, the amount and combination of the diamine component used for obtaining the desired properties, and the solubility of the polyimine precursor or polyimine contained in the coating liquid for forming the polyimide film. The problem of deterioration. Therefore, it is not limited to the polyimide film, and when the desired properties are improved in various polymer films, when various monomers are used as a part of the raw materials, there is also a problem that the polymerization reactivity is deteriorated, and it is necessary to review the desired properties. The problem of the polymerization conditions of the monomer type and the combination used, and the problem that the solubility of the polymer contained in the coating liquid for forming the functional polymer film is deteriorated. In the present invention, in the stage of forming the coating liquid for the functional polymer film, the monomer for the modified polymer or the synthetic polymer for modification is contained in the form of each compound, and the desired one is obtained. The compound for modification represented by the above formulas [A] to [D] is used in the step of heating (baking) a coating liquid for forming a functional polymer film to obtain a compound having a desired property. The compound for modification represented by the above formulas [A] to [D] is introduced into the polymer for modification. Therefore, it is not necessary to obtain a polymer for modification contained in the coating liquid for forming a functional polymer film. It is desirable that the monomer used as the raw material is used as a raw material. Therefore, there is no problem that the polymerization reactivity of the monomer is deteriorated, and it is necessary to review the problem of the polymerization reaction conditions for obtaining the monomer type and combination of the desired characteristics. The solubility of the polymer contained in the coating liquid for a functional polymer film is deteriorated. Therefore, the coating liquid for forming a functional polymer film of the present invention can be used without considering the polymerization reaction of the monomer, the necessity of reviewing the polymerization conditions, and the solubility of the polymer. Since the desired compound (functional) is modified, the various properties of the resulting functional polymer film can be relatively easily improved by comparing the coating liquid for forming a polymer film. Further, when the coating liquid for forming a functional polymer film of the present invention contains a compound for modification represented by the above formulas [A] to [D] having two or more meldene acid structures, it is modified. The polymer can be crosslinked by heating the compound for modification represented by the above formulas [A] to [D], so that the resulting functional polymer film is resistant to an organic solvent and is a hard film. Further, a polyfluorene imine precursor obtained by polymerizing at least one of a tetracarboxylic acid component selected from a tetracarboxylic acid and a derivative thereof and a diamine component, and a polyfluorene precursor precursor are used. At least one polymer selected from the polyimide obtained by imidization is coated with a functional polymer film having a modification compound having two Meldron acid structures represented by the above formula [i] In the case of the cloth liquid, the compound for modification represented by the above formula [i] is obtained by introducing the two amine groups of the diamine compound into the structure of the Meldronic acid, and the diamine compound can be obtained by the prior review. The diamine component of the characteristic, that is, a diamine component which can be obtained by a polymerization reaction with a tetracarboxylic acid component to produce a polyimine precursor or a diamine component for polyimine. Therefore, it is easy to improve various properties of the obtained polyimide film. When it is a coating liquid for forming a functional polymer film containing a polymer for modification, the compound for modification represented by the above formulas [A] to [D] can be introduced into the modified polymerization by heating in a branched form. The compound for modification, particularly the compound represented by the above formulas [A] to [D], has two or more meldene acids.
S -45- 201240981 構造時會形成,被修飾用聚合物藉由上述式[A]至[D]所表 示之修飾用化合物而交聯之構造。又其爲含有合成被修飾 用聚合物用之單體之形成機能性聚合物膜用之塗佈液時, 因上述式[A]至[D]所表示之修飾用化合物之梅爾德倫酸構 造基本上於發生單體聚合之溫度下不會發生反應,故,首 先以低溫聚合合成被修飾用聚合物用之單體而合成被修飾 用聚合物後’藉由加熱可以被修飾用聚合物之支鏈形態導 入上述式[A]至[D]所表示之修飾用化合物,特別是上述式 [A]至[D]所表示之修飾用化合物具有2個以上之梅爾德倫 構造時會形成’被修飾用聚合物藉由上述式[A]至[D]所表 示之修飾用化合物而交聯之構造。另外爲含有合成被修飾 用聚合物用之單體,與具有2個以上之梅爾德倫構造之上 述式[A]至[D]所表示之修飾用化合物的形成機能性聚合物 膜用之塗佈液時,藉由可同時發生單體之聚合反應及梅爾 德倫酸構造之反應之溫度,同時進行單體聚合與梅爾德倫 酸構造反應下,也可將上述式[A]至[D]所表示之修飾用化 合物導入被修飾用聚合物之主鏈。 本發明之形成機能性聚合物膜用之塗佈液之製造方法 無特別限定,可爲將具備賦予機能性之機能性構造部位, 與其所連結之至少1個梅爾德倫酸構造部位的上述式[A] 至[D]所表示之之群中所選出之至少—種修飾用化合物, 及被修飾用聚合物或合成該被修飾用聚合物用之單體,溶 解於溶劑中。 本發明之形成機能性聚合物膜用之塗佈液之溶劑可 -46- 201240981 爲’能溶解上述被修飾用聚合物或合成被修飾用聚合物用 之單體’及具備賦予機能性之機能性構造部位與其所連結 之至少1個梅爾德倫酸構造部位的上述式[A]至[D]所表示 之修飾用化合物之物,例如,N,N -二甲基甲醯胺、N,N -二 甲基乙醯胺、N-甲基-2-吡咯烷酮、N-甲基己內醯胺、2-吡咯烷酮' N-乙基-2-吡咯烷酮' N-乙烯基吡咯烷酮、二 甲基亞諷 '四甲基尿素、吡啶、二甲基硒、六甲基亞颯、 7-丁內酯、1,3-二甲基-咪唑啉酮、乙基戊基酮、甲基壬 基酮、甲基乙基嗣、甲基異戊基酮、甲基異丙基酮、環己 酮、伸乙基碳酸酯' 伸丙基碳酸酯、二聚醚及4-羥基-4-甲基-2 -戊酮之有機溶劑。該等可單獨或混合使用。- 本發明之形成機能性聚合物膜用之塗佈液,就藉由塗 佈可形成均勻之機能性聚合物膜之觀點,有機溶劑之含量 較佳爲7〇至97質量%。該含量可依目的之機能性聚合物 膜之膜厚適當變更。 又,本發明之形成機能性聚合物膜用之塗佈液中,被 修飾用聚合物或合成被修飾用聚合物用之單體之含量較佳 爲3至30質量%。該含量也可依目的之機能性聚合物膜 之膜厚適當變更。 本發明之形成機能性聚合物膜用之塗佈液中,上述式 [A]至[D]所表示之修飾用化合物之含量可爲,能溶解下其 含量無特別限制,但相對於被修飾用聚合物或合成被修飾 用聚合物用之單體之總量1〇〇質量份,較佳爲1至200質 量份,爲了不會降低液晶之配向性,更佳爲1至1 〇〇質量 -47- 201240981 份,特佳爲1至50質量份。 本發明之形成機能性聚合物膜用之塗佈液,於無損本 發明之效果下,可使用塗佈本發明之形成機能性聚合物膜 用之塗佈液時能提升機能性聚合物膜之膜厚均勻性及表面 平滑性之有機溶劑(可稱爲弱溶劑)或化合物。另外可使用 提升機能性聚合物膜與基板之密合性之化合物等。 提升膜厚之均勻性及表面平滑性之弱溶劑之具體例 如’異丙基醇、甲氧基甲基戊醇、甲基溶纖劑、乙基溶纖 劑、丁基溶纖劑、甲基溶纖劑乙酸酯、乙基溶纖劑乙酸 酯、丁基卡必醇、乙基卡必醇、乙基卡必醇乙酸酯、乙二 醇、乙二醇單乙酸酯、乙二醇單異丙基醚、乙二醇單丁基 醚、丙二醇、丙二醇單乙酸酯、丙二醇單甲基醚、丙二 醇-tert-丁基醚、二丙二醇單甲基醚、二乙二醇、二乙二 醇單乙酸酯、二乙二醇二甲基醚 '二丙二醇單乙酸酯單甲 基醚、二丙二醇單甲基醚、二丙二醇單乙基醚、二丙二醇 單乙酸酯單乙基醚、二丙二醇單丙基醚、二丙二醇單乙酸 酯單丙基醚、3 -甲基-3 -甲氧基丁基乙酸酯、三丙二醇甲 基醚、3-甲基-3-甲氧基丁醇、二異丙基醚、乙基異丁基 醚、二異丁烯、戊基乙酸酯、丁基丁酸酯、丁基醚、二異 丁基酮、甲基環己烯、丙基醚、二己基醚、n-己烷、η-戊 烷、η-辛烷、二乙基醚、乳酸甲酯、乳酸乙酯、乙酸甲 酯、乙酸乙酯、乙酸η-丁酯、乙酸丙二醇單乙基醚、丙 酮酸甲酯、丙酮酸乙酯、3-甲氧基丙酸甲酯、3-乙氧基丙 酸甲基乙酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸、3-甲氧 -48- 201240981 基丙酸、3 -甲氧基丙酸丙酯、3 -甲氧基丙酸丁酯、1-甲氧 基-2-丙醇、1-乙氧基-2-丙醇、1-丁氧基-2-丙醇、1-苯氧 基_2·丙醇、丙二醇單.乙酸酯、丙二醇二乙酸酯 '丙二醇-.1-單甲基醚-2-乙酸酯、丙二醇-1-單乙基醚-2-乙酸酯、二 丙二醇、2-(2-乙氧基丙氧基)丙醇、乳酸甲基酯、乳酸乙 基酯、乳酸η-丙基酯、乳酸η-丁基酯或乳酸異戊基酯等 之具有低表面張力之有機溶劑等。該等弱溶劑可1種或複 數種混合使用。使用上述弱溶劑時其含量較佳爲,形成機 能性聚合物膜用之塗佈液所含的有機溶劑全體之1至50 質量%,更佳爲5至3 0質量%。 提升膜厚之均勻性及表面平滑性之化合物如,氟系表-面活性劑、聚矽氧系表面活性劑、非離子系表面活性劑 等,具體例如,耶佛特 EF301、EF303、EF352(特肯姆 製)、美卡范F171' F173、R-30(大日本油墨製)、佛洛拉 FC430、FC431(住友 3M製)、艾薩西 AG710、薩佛隆 S-382、SC101、SC102、SC103、SC104、SC105、SC106(旭 硝子製)等。該等表面活性劑之使用比例,相對於形成機 能性聚合物膜用之塗佈液所含的被修飾用聚合物或合成被 修飾用聚合物用之單體之總量1 0 0質量份,較佳爲0.0 1 至2質量份,更佳爲〇.〇1至1質量份。 提升機能性聚合物膜與基板之密合性之化合物之具體 例如,3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽 烷、2-胺基丙基三甲氧基矽烷、2-胺基丙基三乙氧基矽 烷、N-(2-胺基乙基)-3-胺基丙基三甲氧基矽烷、N-(2-胺 -49- 201240981 基乙基)-3-胺基丙基甲基二甲氧基矽烷、3-胺基丙基三甲 氧基矽烷、3-脲基丙基三乙氧基矽烷、N-乙氧基羰基- 3-胺基丙基三甲氧基矽烷、N-乙氧基羰基-3-胺基丙基三乙 氧基矽烷、N-三乙氧基矽烷基丙基三伸乙基三胺、N-三甲 氧基矽烷基丙基三伸乙基三胺、10-三甲氧基矽烷基-1,4,7-三氮雜癸烷、10-三乙氧基矽烷基-1,4,7-三氮雜癸 烷、9-三甲氧基矽烷基-3,6-二氮雜壬基乙酸酯、9-三乙氧 基矽烷基-3,6-二氮雜壬基乙酸酯、N-苄基-3-胺基丙基三 甲氧基矽烷、N-苄基-3-胺基丙基三乙氧基矽烷、N-苯基-3-胺基丙基三甲氧基矽烷、N-苯基-3-胺基丙基三乙氧基 矽烷、N-雙(氧基伸乙基)-3·胺基丙基三甲氧基矽烷、N-雙 (氧基伸乙基)-3-胺基丙基三乙氧基矽烷、乙二醇二縮水甘 油醚、聚乙二醇二縮水甘油醚、丙二醇二縮水甘油醚、三 丙二醇二縮水甘油醚、聚丙二醇二縮水甘油醚、新戊二醇 二縮水甘油醚、1,6-己二醇二縮水甘油醚、甘油二縮水甘 油醚、2,2-二溴新戊二醇二縮水甘油醚、1,3,5,6·四縮水甘 油基-2,4-己二醇、^>1’,>^’-四縮水甘油基-111-二甲苯二 胺、1,3-雙(Ν,Ν-二縮水甘油基胺基甲基)環己烷或 Ν,Ν,Ν’,Ν’-四縮水甘油基-4,4’-二胺基二苯基甲烷等之含 有官能性矽烷之化合物及含有環氧基之化合物》 使用該等與基板密合之化合物時,相對於本發明之形 成機能性聚合物膜用之塗佈液所含的被修飾用聚合物或合 成被修飾用聚合物用之單體之總量100質量份較佳爲〇」 至3 0質量份,更佳爲1至20質量份。未達〇.1質量份時 -50- 201240981 無法得到提升密合性之效果,多於3 0質量份時以機能性 聚合物膜作爲液晶配向膜用時會使液晶之配向性變差。 又’本發明之形成機能性聚合物膜用之塗佈液,於無 損本發明之效果下,可添加改變機能性聚合物膜之電容率 及導電性等之電特性用之介電體及導電物質》 又’本發明之形成機能性聚合物膜用之塗佈液,於無 損本發明之效果下,可混合具有環氧基、異氰酸酯基或氧 雜環丁烷基之交聯性化合物’及具有羥基或烷氧基所成群 中所選出之至少一種取代基之交聯性化合物、具有聚合性 不飽和鍵之交聯性化合物。 該類本發明之形成機能性聚合物膜用之塗佈液可作爲 形成液晶配向膜用之液晶配向劑用。又,液晶配向膜係指 使液晶配向於一定方向之膜。 藉由將本發明之形成機能性聚合物膜用之塗佈液塗佈 於基板後進行焙燒,可形成具有來自上述式[Α]至[D]所表 示之化合物之機能性構造部位的機能性聚合物膜。又,以 本發明之形成機能性聚合物膜用之塗佈液作爲液晶配向劑 用時,將其塗佈於基板後焙燒,再實施刷洗處理或光照射 等之配向處理,或垂直配向用途等無需配向處理下,可形 成液晶配向膜。 基板可爲能塗佈形成機能性聚合物膜用之塗佈液之物 無特別限制,但形成液晶配.向膜時又以透明性較高之物爲 佳。具體例如,玻璃基板,或丙烯酸基板及聚碳酸酯基板 等之塑料基板等。又,就步驟簡單化之觀點較佳爲使用形 -51 - 201240981 成液晶驅動用之ITO電極之基板。另外反射型之液晶顯示 元件般係具單側基板時可使用矽電路板爲之不透明物,此 時之電極可使用鋁等之反射光之材料。又,TFT型元件般 之高機能元件中,係使用液晶驅動用之電極與基板之間形 成電晶體般之元件之物。 將形成機能性聚合物膜用之塗佈液塗佈於基板之方法 無特別限定,一般工業上係使用網版印刷、平版印刷、撓 性印刷、噴墨等。其他之塗佈方法如,浸漬、輥塗、縫 塗、旋塗等,可因應目的使用該等。 將形成機能性聚合物膜用之塗佈液塗佈於基板後,必 要時可乾燥部分或全部溶劑。形成機能性聚合物膜用之塗 佈液含有合成被修飾用聚合物用之單體時,較佳於將形成 機能性聚合物膜用之塗佈液塗佈於基板上之階段內,或乾 燥時,將單體聚合反應。 又,將形成機能性聚合物膜用之塗佈液塗佈於基板 上,必要時乾燥部分或全部溶劑後進行焙燒。該焙燒可爲 加熱至使上述式[A]至[D]所表示之修飾用化合物之梅爾德 倫酸構造形成烯酮等之能與被修飾用聚合物等所具有之羧 基、羥基 '硫醇基、胺基、亞胺、碳-碳雙鍵(鏈烯)或碳-碳三鍵(炔烴)等之不飽和鍵、腈基、酮基、醛基、酯鍵、 醯胺鍵、醯亞胺鍵等之反應性部位反應之溫度。例如可藉 由熱板、熱風循環爐、紅外線爐等之加熱方法以18〇至 250 °C進行,同時使溶劑蒸發及使梅爾德倫酸構造與被修 飾用聚合物反應,而將上述式[A]至[D]所表示之修飾用化 -52- 201240981 合物導入被修飾用聚合物’形成本發明之機能性聚合物 膜。 焙燒後所形成之機能性聚合物膜之厚度,於作爲液晶 配向膜用時,因太厚將不利於液晶顯示元件之消耗電子方 面,太薄將會降低液晶顯示元件之信賴性,故較佳爲5至 3 OOnm,更佳爲1 〇至200nm。使液晶水平配向或傾斜配 向時,係藉由刷洗或照射偏光紫外線等處理焙燒後之塗 膜。 本發明之液晶顯示元件爲,藉由上述方法製造附液晶 配向膜之基板後,以已知之方法製作液晶單元,而得之液 晶顯示元件。一例如,具備具有對向配置之2枚基板,及 設置於基板間之液晶層,及設置於基板與液晶層之間藉由 本發明之形成機能性聚合物膜用之塗佈液所形成之液晶配 向劑形成的上述液晶配向膜之液晶單元之液晶顯示元件。 該類本發明之液晶顯不兀件如,扭轉向列(TN: Twisted Nematic)方式、垂直配向(VA: Vertical Alignment)方式, 及水平配向(IPS : In-Plane Switching)方式等各種之物。 本發明之液晶顯示元件所使用的基板可爲透明性較高 之基板無特別限定,一般爲基板上形成驅動液晶用之透明 電極之基板。具體例如,與上述機能性聚合物膜所記載之 基板相同之物。 又,液晶配向膜爲,將本發明之形成機能性聚合物膜 用之塗佈液所形成的液晶配向劑塗佈於該基板後焙燒形成 之物,詳細內容如上所述。 -53- 201240981 構成本發明之液晶顯不兀件之液晶層的液晶材料無特 別限定,可使用先前之液晶材料,例如梅爾庫公司製之 MLC-2003 ' MLC-6608、MLC-6609 等 ° 液晶單元之製作方法-例如,準備1對形成液晶配向 膜之基板’於一方基板之液晶配向膜上散布珠狀等之調距 器後,以液晶配向膜爲內側之方式貼合另一方基板,再減 壓注入液晶’其後封裝之方法,或將液晶滴落於散布調距 器之液晶配向膜面後貼合基板再封裝之方法等。此時之調 距益之厚度較佳爲1至30μηι,更佳爲2至ΙΟμιη。 上述所製作之液晶顯示元件係使用,含有可導入所希 望之特性的上述式[Α]至[D]所表示之修飾用化合物,與被 修飾用聚合物或合成被修飾用聚合物用之單體之液晶配向 劑製作之物,因此可改善各種特性。 【實施方式】 下面將舉實施例及比較例更詳細說明本發明,但本發 明之解釋非限定於該等實施例。 [合成上述式[Α]至[D]所表示之修飾用化合物] <合成例1 > 合成下述式[4]所表示之化合物5,5’-(1,4-伸苯基雙(脲 二基))雙(甲烷-1-基-1-亞基)雙(2,2-二甲基-1,3-二噁焼_ 4,6-二酮) -54- 201240981 [化 41]S-45-201240981 A structure in which a polymer to be modified is crosslinked by a modifying compound represented by the above formulas [A] to [D]. Further, when it is a coating liquid for forming a functional polymer film containing a monomer for synthesizing a polymer for modification, Melalonic acid of the modifying compound represented by the above formulas [A] to [D] The structure does not react at substantially the temperature at which the polymerization of the monomer occurs. Therefore, the polymer for modification is synthesized by synthesizing the monomer for the polymer for modification at a low temperature, and then the polymer can be modified by heating. When the compound for modification represented by the above formulas [A] to [D] is introduced into the branched form, in particular, when the compound for modification represented by the above formulas [A] to [D] has two or more Meldron structures, The structure in which the polymer for modification is crosslinked by the compound for modification represented by the above formulas [A] to [D] is formed. Further, it is used for forming a functional polymer film containing a monomer for synthesizing a modified polymer and a compound for modification represented by the above formulas [A] to [D] having two or more Meldron structures. In the case of coating a liquid, the above formula [A] can also be carried out by simultaneously reacting a polymerization reaction of a monomer and a reaction of a Meldronic acid structure with a monomer polymerization and a Meldronic acid structural reaction. The modification compound represented by [D] is introduced into the main chain of the polymer for modification. The method for producing the coating liquid for forming a functional polymer film of the present invention is not particularly limited, and may be any of the above-described Meldenic Acid structural sites to which functional functional sites having functional properties are provided. At least one of the compounds for modification selected from the group represented by the formulae [A] to [D], and the monomer for modification or the monomer for synthesizing the polymer for modification are dissolved in a solvent. The solvent for forming a coating liquid for a functional polymer film of the present invention can be -46-201240981, which is a monomer capable of dissolving the above-mentioned modified polymer or synthetic modified polymer, and has a function of imparting functional properties. The compound for modification represented by the above formulas [A] to [D] of at least one Meldronic acid structural site to which the structural moiety is attached, for example, N,N-dimethylformamide, N , N-dimethylacetamide, N-methyl-2-pyrrolidone, N-methyl caprolactam, 2-pyrrolidone 'N-ethyl-2-pyrrolidone' N-vinylpyrrolidone, dimethyl Alkali 'tetramethyl urea, pyridine, dimethyl selenium, hexamethylarylene, 7-butyrolactone, 1,3-dimethyl-imidazolidinone, ethyl amyl ketone, methyl decyl ketone , methyl ethyl hydrazine, methyl isoamyl ketone, methyl isopropyl ketone, cyclohexanone, ethyl acrylate propyl propyl carbonate, di polyether and 4-hydroxy-4-methyl-2 - an organic solvent of pentanone. These may be used singly or in combination. - The coating liquid for forming a functional polymer film of the present invention has a content of an organic solvent of from 7 Å to 97% by mass from the viewpoint of coating a uniform functional polymer film. This content can be appropriately changed depending on the film thickness of the functional polymer film. Further, in the coating liquid for forming a functional polymer film of the present invention, the content of the monomer for the polymer to be modified or the polymer for the synthesis of the modified polymer is preferably from 3 to 30% by mass. The content may be appropriately changed depending on the film thickness of the functional polymer film. In the coating liquid for forming a functional polymer film of the present invention, the content of the modifying compound represented by the above formulas [A] to [D] may be, and the content of the compound to be dissolved is not particularly limited, but is modified relative to The total amount of the monomer used for the polymer or the polymer for modification is 1 part by mass, preferably 1 to 200 parts by mass, more preferably 1 to 1 〇〇 in order not to lower the alignment of the liquid crystal. -47- 201240981 parts, especially preferably 1 to 50 parts by mass. The coating liquid for forming a functional polymer film of the present invention can improve the functional polymer film when the coating liquid for forming the functional polymer film of the present invention can be used without impairing the effects of the present invention. An organic solvent (which may be referred to as a weak solvent) or a compound having uniform film thickness and surface smoothness. Further, a compound which enhances the adhesion between the functional polymer film and the substrate can be used. Specific examples of weak solvents which increase the uniformity of film thickness and surface smoothness, such as 'isopropyl alcohol, methoxymethylpentanol, methyl cellosolve, ethyl cellosolve, butyl cellosolve, methyl cellosolve Acetate, ethyl cellosolve acetate, butyl carbitol, ethyl carbitol, ethyl carbitol acetate, ethylene glycol, ethylene glycol monoacetate, ethylene glycol Monoisopropyl ether, ethylene glycol monobutyl ether, propylene glycol, propylene glycol monoacetate, propylene glycol monomethyl ether, propylene glycol-tert-butyl ether, dipropylene glycol monomethyl ether, diethylene glycol, diethyl Glycol monoacetate, diethylene glycol dimethyl ether 'dipropylene glycol monoacetate monomethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monoacetate monoethyl Ether, dipropylene glycol monopropyl ether, dipropylene glycol monoacetate monopropyl ether, 3-methyl-3-methoxybutyl acetate, tripropylene glycol methyl ether, 3-methyl-3-methyl Oxybutanol, diisopropyl ether, ethyl isobutyl ether, diisobutylene, pentyl acetate, butyl butyrate, butyl ether, diisobutyl ketone, methylcyclohexene, C base , dihexyl ether, n-hexane, η-pentane, η-octane, diethyl ether, methyl lactate, ethyl lactate, methyl acetate, ethyl acetate, η-butyl acetate, propylene glycol Ethyl ether, methyl pyruvate, ethyl pyruvate, methyl 3-methoxypropionate, methyl ethyl 3-ethoxypropionate, ethyl 3-methoxypropionate, 3-ethoxy Propionate, 3-methoxy-48- 201240981 propyl propionic acid, propyl 3-methoxypropionate, butyl 3-methoxypropionate, 1-methoxy-2-propanol, 1-B Oxy-2-propanol, 1-butoxy-2-propanol, 1-phenoxy-2-propanol, propylene glycol monoacetate, propylene glycol diacetate, propylene glycol-.1-monomethyl Ethyl ether-2-acetate, propylene glycol-1-monoethyl ether-2-acetate, dipropylene glycol, 2-(2-ethoxypropoxy)propanol, methyl lactate, ethyl lactate An organic solvent having a low surface tension, such as an ester, η-propyl lactate, η-butyl lactate or isoamyl lactate. These weak solvents may be used singly or in combination of plural kinds. When the above-mentioned weak solvent is used, the content thereof is preferably from 1 to 50% by mass, more preferably from 5 to 30% by mass based on the total of the organic solvent contained in the coating liquid for forming the functional polymer film. A compound which enhances uniformity of film thickness and surface smoothness, for example, a fluorine-based surface active agent, a polyoxynoxy surfactant, a nonionic surfactant, etc., specifically, for example, Yvette EF301, EF303, EF352 ( Tecomm system), US card F171' F173, R-30 (Daily Ink system), Flora FC430, FC431 (Sumitomo 3M system), Isaac AG710, Saffron S-382, SC101, SC102 , SC103, SC104, SC105, SC106 (Asahi Glass System), etc. The ratio of use of the surfactants is 100 parts by mass based on the total amount of the monomers to be modified or the monomers for synthesizing the polymer to be modified contained in the coating liquid for forming the functional polymer film. It is preferably from 0.01 to 2 parts by mass, more preferably from 1 to 1 part by mass. Specific examples of the compound which enhances the adhesion of the functional polymer film to the substrate are, for example, 3-aminopropyltrimethoxydecane, 3-aminopropyltriethoxydecane, 2-aminopropyltrimethoxy Decane, 2-aminopropyltriethoxydecane, N-(2-aminoethyl)-3-aminopropyltrimethoxydecane, N-(2-amine-49- 201240981 ethyl) 3-aminopropylmethyldimethoxydecane, 3-aminopropyltrimethoxydecane, 3-ureidopropyltriethoxydecane, N-ethoxycarbonyl-3-aminopropyl Trimethoxy decane, N-ethoxycarbonyl-3-aminopropyltriethoxy decane, N-triethoxydecylpropyltriethylamine, N-trimethoxydecylpropyl Base triethylamine, 10-trimethoxydecyl-1,4,7-triazadecane, 10-triethoxydecyl-1,4,7-triazadecane, 9 -trimethoxydecyl-3,6-diazaindolyl acetate, 9-triethoxydecyl-3,6-diazaindolyl acetate, N-benzyl-3-amine Propyltrimethoxydecane, N-benzyl-3-aminopropyltriethoxydecane, N-phenyl-3-aminopropyltrimethoxydecane, N-phenyl-3-amine Triethoxy decane, N-bis(oxyethyl)-3,aminopropyltrimethoxydecane, N-bis(oxyethyl)-3-aminopropyltriethoxydecane, Ethylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, tripropylene glycol diglycidyl ether, polypropylene glycol diglycidyl ether, neopentyl glycol diglycidyl ether, 1,6- Hexanediol diglycidyl ether, glycerol diglycidyl ether, 2,2-dibromoneopentyl glycol diglycidyl ether, 1,3,5,6·tetraglycidyl-2,4-hexanediol, ^>1',>^'-tetraglycidyl-111-xylenediamine, 1,3-bis(indole, fluorene-diglycidylaminomethyl)cyclohexane or hydrazine, hydrazine, Ν', Ν'-tetraglycidyl-4,4'-diaminodiphenylmethane, etc., a compound containing a functional decane and a compound containing an epoxy group" When using such a compound which is in close contact with a substrate, The total amount of 100 parts by mass of the monomer for modifying the polymer or the monomer for synthesizing the modified polymer contained in the coating liquid for forming the functional polymer film of the present invention is preferably 〇" to 3 0 The amount of parts, more preferably 1 to 20 parts by mass. When the amount is less than 1 part by mass -50-201240981 The effect of improving the adhesion is not obtained. When the functional polymer film is used as the liquid crystal alignment film, the alignment property of the liquid crystal is deteriorated when it is more than 30 parts by mass. Further, in the coating liquid for forming a functional polymer film of the present invention, a dielectric body and a conductive material for changing electrical characteristics such as permittivity and conductivity of the functional polymer film can be added without impairing the effects of the present invention. And a coating liquid for forming a functional polymer film of the present invention, which can be mixed with an epoxy group, an isocyanate group or an oxetanyl group as a cross-linking compound A crosslinkable compound having at least one substituent selected from a group consisting of a hydroxyl group or an alkoxy group, and a crosslinkable compound having a polymerizable unsaturated bond. The coating liquid for forming a functional polymer film of the present invention can be used as a liquid crystal alignment agent for forming a liquid crystal alignment film. Further, the liquid crystal alignment film refers to a film in which liquid crystals are aligned in a certain direction. By coating the coating liquid for forming a functional polymer film of the present invention on a substrate and then baking it, the functional properties of the functional structural sites having the compounds represented by the above formulas [Α] to [D] can be formed. Polymer film. In addition, when the coating liquid for forming a functional polymer film of the present invention is used as a liquid crystal alignment agent, it is applied to a substrate and then fired, and then subjected to alignment treatment such as brushing treatment or light irradiation, or vertical alignment use. The liquid crystal alignment film can be formed without the need of alignment treatment. The substrate may be any one which can be applied to form a coating liquid for forming a functional polymer film. However, it is preferable to form a liquid crystal alignment film with a high transparency. Specifically, for example, a glass substrate, a plastic substrate such as an acrylic substrate or a polycarbonate substrate, or the like. Further, in view of simplification of the steps, it is preferable to use a substrate of an ITO electrode for liquid crystal driving using the shape -51 - 201240981. In addition, when a single-sided substrate is used as a reflective liquid crystal display element, a ruthenium board can be used as an opaque material, and the electrode can be made of a material such as aluminum. Further, in a high-performance element such as a TFT-type element, a device having a transistor-like element is formed between an electrode for driving a liquid crystal and a substrate. The method of applying the coating liquid for forming the functional polymer film to the substrate is not particularly limited, and generally, screen printing, lithography, flexographic printing, inkjet, or the like is used industrially. Other coating methods such as dipping, roll coating, slit coating, spin coating, etc. may be used depending on the purpose. After the coating liquid for forming the functional polymer film is applied onto the substrate, some or all of the solvent may be dried as necessary. When the coating liquid for forming the functional polymer film contains a monomer for synthesizing the polymer for modification, it is preferred to apply the coating liquid for forming the functional polymer film on the substrate, or to dry it. At the time, the monomer is polymerized. Further, a coating liquid for forming a functional polymer film is applied onto a substrate, and if necessary, some or all of the solvent is dried and then fired. The calcination may be carried out by heating the Meldronic acid structure of the modifying compound represented by the above formulas [A] to [D] to form an ketene or the like, a carboxyl group having a modified polymer or the like, and a hydroxy group. An unsaturated bond such as an alcohol group, an amine group, an imine, a carbon-carbon double bond (alkenyl) or a carbon-carbon triple bond (alkyne), a nitrile group, a ketone group, an aldehyde group, an ester bond, a guanamine bond, The temperature at which the reactive site of the quinone bond or the like reacts. For example, it can be carried out by a heating method of a hot plate, a hot air circulating furnace, an infrared furnace or the like at 18 Torr to 250 ° C while evaporating the solvent and reacting the Meldronic acid structure with the polymer for modification, and the above formula The modified polymer represented by [A] to [D] is used to form the functional polymer film of the present invention. The thickness of the functional polymer film formed after calcination is too thick to be detrimental to the electronic consumption of the liquid crystal display element when used as a liquid crystal alignment film, and too thin will reduce the reliability of the liquid crystal display element, so it is preferable. It is 5 to 300 nm, more preferably 1 to 200 nm. When the liquid crystal is aligned horizontally or obliquely, the baked film is treated by brushing or irradiating polarized ultraviolet rays or the like. The liquid crystal display device of the present invention is a liquid crystal display device obtained by producing a liquid crystal cell by a known method by fabricating a substrate with a liquid crystal alignment film by the above method. For example, a liquid crystal layer having two substrates disposed opposite to each other and disposed between the substrates, and a liquid crystal formed by the coating liquid for forming the functional polymer film of the present invention between the substrate and the liquid crystal layer are provided. A liquid crystal display element of a liquid crystal cell of the above liquid crystal alignment film formed by an alignment agent. The liquid crystal display of the present invention is various such as a twisted nematic (TN: Twisted Nematic) method, a vertical alignment (VA: Vertical Alignment) method, and an IPS (In-Plane Switching) method. The substrate used for the liquid crystal display device of the present invention is not particularly limited as long as it has high transparency, and is generally a substrate on which a transparent electrode for driving a liquid crystal is formed. Specifically, for example, it is the same as the substrate described in the above functional polymer film. Further, the liquid crystal alignment film is obtained by applying a liquid crystal alignment agent formed by the coating liquid for forming a functional polymer film of the present invention to the substrate, followed by firing, and the details are as described above. -53- 201240981 The liquid crystal material constituting the liquid crystal layer of the liquid crystal display of the present invention is not particularly limited, and a conventional liquid crystal material such as MLC-2003 'MLC-6608, MLC-6609, etc. manufactured by Melco Co., Ltd. can be used. In the method of producing a liquid crystal cell, for example, a pair of substrates for forming a liquid crystal alignment film are prepared by dispersing a bead or the like on a liquid crystal alignment film of one substrate, and then bonding the other substrate so that the liquid crystal alignment film is inside. The method of injecting the liquid crystal into the liquid film after the pressure reduction, or the method of re-packaging the substrate after the liquid crystal is dropped on the liquid crystal alignment film surface of the spreader. The thickness of the pitch at this time is preferably from 1 to 30 μm, more preferably from 2 to ΙΟμιη. The liquid crystal display device produced as described above is used, and contains a compound for modification represented by the above formulas [Α] to [D], which can introduce desired properties, and a polymer for modification or a polymer for synthetic modification. The liquid crystal alignment agent is used to improve various properties. [Embodiment] Hereinafter, the present invention will be described in more detail by way of examples and comparative examples, but the explanation of the present invention is not limited to the examples. [Synthesis of a compound for modification represented by the above formula [Α] to [D]] <Synthesis Example 1 > Compound 5,5'-(1,4-phenylene double represented by the following formula [4] was synthesized. (urea diyl)) bis(methane-1-yl-1-ylidene)bis(2,2-dimethyl-1,3-dioxin-4,6-dione) -54- 201240981 41]
s 將梅爾德倫酸[l](14.7g,102mmol)’及原甲酸三甲酯 [2](147g)加入300mL四口燒瓶中,進行1小時加熱回 流。其後加入對伸苯基二胺[3](5.0g,46mm〇l),再進行2 小時加熱回流。結束反應後,將反應溶液冷卻至室溫,濾 取所析出之固體後,以己烷洗淨,再乾燥固體,得化合物 [4]15.8g(產率 82%)。 1 H-NMR(400MHz, DMSO-d6, (5 ppm): 1 1 .29(2H,d) > 8.56(2H,d),7.64(4H,s),1.68(12H,s)。 <合成例2 > 合成下述式[6]所表示之化合物5,5’-( 1,3-伸苯基雙(脲 二基))雙(甲烷-1-基-1-亞基)雙(2,2-二甲基-1,3-二噁烷-4,6-二酮) [化 42] j〇is Meldronic acid [l] (14.7 g, 102 mmol) and trimethyl orthoformate [2] (147 g) were placed in a 300 mL four-necked flask and heated to reflux for 1 hour. Thereafter, p-phenylenediamine [3] (5.0 g, 46 mm 〇l) was added, followed by heating under reflux for 2 hours. After the completion of the reaction, the reaction solution was cooled to room temperature, and the precipitated solid was filtered, washed with hexane, and then dried to yield compound [4] 15.8 g (yield 82%). 1 H-NMR (400 MHz, DMSO-d6, (5 ppm): 1 1.29 (2H, d) > 8.56 (2H, d), 7.64 (4H, s), 1.68 (12H, s). Synthesis Example 2 > The compound 5,5'-(1,3-phenylenebis(ureidodiyl))bis(methane-1-yl-1-ylidene) double represented by the following formula [6] was synthesized. (2,2-dimethyl-1,3-dioxane-4,6-dione) [化42] j〇i
CH(OMe)3 [2]CH(OMe)3 [2]
j〇iJ〇i
-55- 201240981 將梅爾德倫酸[l](14.7g,102mmol),及原甲酸三甲酯 [2](147g)加入300mL四口燒瓶中,進行1小時加熱回 流。其後加入間伸苯基二胺[5](5_Og,46mmol),再進行2 小時加熱回流。結束反應後,將反應溶液冷卻至室溫,濾 取所析出之固體後,以己烷洗淨,再乾燥固體,得化合物 [6] 14· lg(產率 72%)。 1 H-NMR(400MHz, DMSO-d6, δ ppm) : 11.28(2H,s), 8.74(2H,s),7.98(lH,s),7.44(3H,s),1.68(12H,s)。 <合成例3 > 合成下述式[8]所表示之化合物5,5’-(吡啶-2,6-二基雙 (脲二基))雙(甲烷-1-基-卜亞基)雙(2,2-二甲基-1,3-二噁烷- 4,6-二酮) [化 43]-55- 201240981 Meldronic acid [1] (14.7 g, 102 mmol) and trimethyl orthoformate [2] (147 g) were placed in a 300 mL four-necked flask and heated to reflux for 1 hour. Thereafter, an inter-phenylenediamine [5] (5-Og, 46 mmol) was added, followed by heating under reflux for 2 hours. After the completion of the reaction, the reaction solution was cooled to room temperature, and the precipitated solid was filtered, washed with hexane, and then dried to give compound [6] 14· lg (yield: 72%). 1 H-NMR (400 MHz, DMSO-d6, δ ppm): 11.28 (2H, s), 8.74 (2H, s), 7.78 (1H, s), 7.44 (3H, s), 1.68 (12H, s). <Synthesis Example 3 > A compound 5,5'-(pyridine-2,6-diylbis(ureidodiyl))bis(methane-1-yl-buylidene) double represented by the following formula [8] was synthesized. (2,2-dimethyl-1,3-dioxane-4,6-dione) [Chem. 43]
[7] [2] [8] 將梅爾德倫酸[l](16.0g,lllmmol)及原甲酸三甲酯 [2](160g)加入300mL四口燒瓶中,進行 1小時加熱回 流。其後加入2,6-二胺基吡啶[7](5.5g ’ 50mmol),再進行 2小時加熱回流。結束反應後,將反應溶液冷卻至室溫, 濾取所析出之固體後,以己烷洗淨,再乾燥固體’得化合 物[8]16.7g(產率 80%)。 -56- 201240981 1 H-NMR(400MHz, DMSO-d6, δ ppm) : 11.42(2H,d), 9_15(2H,d),7.96(lH,t),7.52(2H,d),1.67(12H,s)。 <合成例4> 合成下述式[11]所表示之化合物5,5’,5”(苯-1,3,5-三 基三(脲二基))三(甲烷-1-基-1-基亞基)三(2,2-二甲基-1,3-二噁烷-4,6-二酮) [化 44] o2n[7] [2] [8] Meldronic acid [l] (16.0 g, lllmmol) and trimethyl orthoformate [2] (160 g) were placed in a 300 mL four-necked flask and heated to reflux for 1 hour. Thereafter, 2,6-diaminopyridine [7] (5.5 g '50 mmol) was added, followed by heating under reflux for 2 hours. After the completion of the reaction, the reaction solution was cooled to room temperature, and the precipitated solid was filtered, washed with hexane, and then dried to yield a compound [8], 16.7 g (yield: 80%). -56- 201240981 1 H-NMR (400MHz, DMSO-d6, δ ppm) : 11.42 (2H,d), 9_15 (2H,d), 7.96 (lH,t), 7.52 (2H,d), 1.67 (12H , s). <Synthesis Example 4> A compound 5,5',5" (benzene-1,3,5-triyltris(ureido)yl)tri(methane-1-yl-) represented by the following formula [11] was synthesized. 1-ylylene)tris(2,2-dimethyl-1,3-dioxane-4,6-dione) [44] o2n
[9] N〇2[9] N〇2
Hz, 5wl%Pd/C 1/4-二噁烷 [10] NH2 H2N^^NHaHz, 5wl%Pd/C 1/4-dioxane [10] NH2 H2N^^NHa
Λ 〇 乂。Λ 〇 乂.
[11] 將 3,5-二硝基苯胺[9](32.6g,178mmol)、5% 鈀碳 (3.75g,10wt%)及1,4-二噁烷(3 7 5 g)之混合物放入1L四口 燒瓶中,氫環境下以室溫攪拌。結束反應後,以矽藻土濾 除鈀碳後,以蒸發器濃縮濾液,得化合物[l〇]21.7g(產率 9 9%) 〇 1H-NMR(400MHz, DMSO-d6, δ ppm) : 5.1 1 (3H,s)-4.28(6H,s) » 將梅爾德倫酸[1](83.88,582111111〇1)及原甲酸三甲酯 [2] (660g)加入1L四口燒瓶中,進行1小時加熱回流。其 後加入化合物[l〇](21.7g,176mmol),再進行2小時加熱 回流。結束反應後,將反應溶液冷卻至室溫,濾取所析出 之固體後,以己烷洗淨,再乾燥固體,得化合物 s -57- 201240981 [1 l]73.0g(產率 71%)。 1H-NMR(400MHz, DMSO-d6, <5 ppm): 11.22(3H,s), 8_26(3H,s),7.70(3H,s),1.65(18H,s)。 <合成例5 > 合成下述式[13]所表示之化合物5,5’-(4,4’-伸甲基雙 (4,1-伸苯基)雙(脲二基))雙(甲烷-1_基-1_基亞基)雙(2,2-二 甲基-1,3-二噁烷-4,6-二酮) [化 45][11] A mixture of 3,5-dinitroaniline [9] (32.6 g, 178 mmol), 5% palladium on carbon (3.75 g, 10 wt%) and 1,4-dioxane (37 g) The mixture was placed in a 1 L four-necked flask and stirred at room temperature under a hydrogen atmosphere. After the completion of the reaction, the palladium carbon was filtered off with celite, and the filtrate was concentrated with an evaporator to give compound [1], 21.7 g (yield: 9 9%) 〇1H-NMR (400 MHz, DMSO-d6, δ ppm): 5.1 1 (3H, s) - 4.28 (6H, s) » Add Meldronic acid [1] (83.88, 582111111〇1) and trimethyl orthoformate [2] (660g) to a 1L four-necked flask. The mixture was heated to reflux for 1 hour. Thereafter, the compound [l?] (21.7 g, 176 mmol) was added, and the mixture was heated under reflux for 2 hours. After the completion of the reaction, the reaction solution was cooled to room temperature, and the precipitated solid was filtered, washed with hexane, and then dried to give compound s -57 - 201240981 [1 l] 73.0 g (yield 71%). 1H-NMR (400 MHz, DMSO-d6, <5 ppm): 11.22 (3H, s), 8 - 26 (3H, s), 7.70 (3H, s), 1.65 (18H, s). <Synthesis Example 5 > The compound 5,5'-(4,4'-extended methylbis(4,1-phenylene)bis(ureidodiyl)) double represented by the following formula [13] was synthesized. (methane-1_yl-1_ylylene) bis(2,2-dimethyl-1,3-dioxane-4,6-dione) [45]
將梅爾德倫酸[l](l4.7g,102mmol)及原甲酸三甲酯 [2](147g)加入300mL四口燒瓶中,進行 1小時加熱回 流β其後加入 4,4’-二胺基二苯基甲烷[12](5.0g, 46mmol),再進行2小時力卩熱回流。反應結束後,將反應 溶液冷卻至室溫,濾取所析出之固體後,以己烷洗淨,再 乾燥固體,得化合物[13]14.1g(產率72%)。 1H-NMR(400MHz, DMSO-d6, δ ppm) : 11.23(2H,d), 8.54(2H,d) , 7.50-7.48(4H,m) , 7.3 1 - 7 · 2 9 (4 H,m), 3.96(2H,m),1.66(12H,s)。 <合成例6 > -58- 201240981 合成下述式[15]所表示之化合物5,5,-(4,4’-氧代雙 (4,1-伸苯基)雙(脲二基))雙(甲烷-1-基-1-亞基)雙(2,2-二甲 基-1,3-二噁烷-4,6-二酮) [化 46]Meldronic acid [l] (l4.7g, 102mmol) and trimethyl orthoformate [2] (147g) were added to a 300mL four-necked flask, heated for reflux for 1 hour, and then added 4,4'-two Aminodiphenylmethane [12] (5.0 g, 46 mmol) was further refluxed for 2 hours. After the completion of the reaction, the reaction solution was cooled to room temperature, and the precipitated solid was filtered, washed with hexane, and then dried to yield compound [13] 14.1 g (yield: 72%). 1H-NMR (400MHz, DMSO-d6, δ ppm): 11.23(2H,d), 8.54(2H,d), 7.50-7.48(4H,m) , 7.3 1 - 7 · 2 9 (4 H,m) , 3.96 (2H, m), 1.66 (12H, s). <Synthesis Example 6 > -58- 201240981 A compound represented by the following formula [15] 5,5,-(4,4'-oxobis(4,1-phenylene)bis(ureidodiyl) was synthesized. )) bis(methane-1-yl-1-ylidene)bis(2,2-dimethyl-1,3-dioxane-4,6-dione) [Chem. 46]
將梅爾德倫_[l](7.92g,54.9mmol)及原甲酸三甲酯 [2] (7 8 g)加入2 OOmL四口燒瓶中,進行1小時加熱回流。 其後加入4,4’-二胺基二苯基醚[14](5.0g,25.0mmol),再 進行2小時加熱回流。結束反應後,將反應溶液冷卻至室 溫,濾取所析出之固體後,以己烷洗淨,再乾燥固體,得 化合物[15]1 1.7g(產率92%)。 1 Η - N M R (4 0 0 Μ H z,D Μ S Ο - d 6 , δ ppm) : 11.30(2H,d) ’ 8.51(2H,d),7.62(4H,d),7.08(4H,d),1.67(12H,s)。 <合成例7 > 合成下述式[17]所表示之化合物5,5’-(4,4,-脲二基雙 (4,1-伸苯基)雙(脲二基))雙(甲烷-1_基-1_亞基)雙(2,2-二甲 基-1,3 -二噁烷-4,6 -二酮)Meldron _[l] (7.92 g, 54.9 mmol) and trimethyl orthoformate [2] (7 8 g) were placed in a 200 mL four-necked flask, and heated under reflux for 1 hour. Thereafter, 4,4'-diaminodiphenyl ether [14] (5.0 g, 25.0 mmol) was added, followed by heating under reflux for 2 hours. After the completion of the reaction, the reaction solution was cooled to room temperature, and the precipitated solid was filtered, washed with hexane, and then dried to yield compound </ </ RTI> 1.7 g (yield: 92%). 1 Η - NMR (4 0 0 Μ H z, D Μ S Ο - d 6 , δ ppm) : 11.30(2H,d) ' 8.51(2H,d), 7.62(4H,d),7.08(4H,d ), 1.67 (12H, s). <Synthesis Example 7 > The compound 5,5'-(4,4,-ureidodiylbis(4,1-phenylene)bis(ureidodiyl)) double represented by the following formula [17] was synthesized. (methane-1_yl-1_ylidene)bis(2,2-dimethyl-1,3-dioxane-4,6-dione)
S -59- 201240981 [化 47]S -59- 201240981 [化 47]
將梅爾德倫酸[l](7.96g ’ 55.2mmol)及原甲酸三甲醋 [2](79£)加入20〇1^四口燒瓶中’進行1小時加熱回流。 其後加入4,4,-二胺基二苯基胺[16](5_Og,25.1mmol)’再 進行2小時加熱回流。結束反應後’將反應溶液冷卻至室 溫,濾取所析出之固體後,以己烷洗淨’再乾燥固體,得 化合物[17]10.1g(產率79%) » 1 H-NMR(400MHz, DMSO-d6, δ ppm) : 11.29(2H,d), 8.51(2H,d) , 7.62(4H,d) , 7.08(4H,d) ’ 4.97(1H,s) ’ 1.67(12H,s) ° <合成例8 > 合成下述式[19]所表示之化合物5,5’-(4,4’-甲基脲二 基)雙(4,1-伸苯基)雙(脲二基))雙(甲烷-1-基-1·亞基)雙 (2,2-二甲基-1,3-二噁烷-4,6-二酮) [化 48]Meldronic acid [l] (7.96 g '55.2 mmol) and toluene formic acid [2] (79 £) were placed in a 20 〇 1 ^ four-necked flask, and heated under reflux for 1 hour. Thereafter, 4,4,-diaminodiphenylamine [16] (5-Og, 25.1 mmol) was added, followed by heating under reflux for 2 hours. After the completion of the reaction, the reaction solution was cooled to room temperature, and the precipitated solid was filtered, washed with hexane and then dried to give compound [17] 10.1 g (yield: 79%). <1>H-NMR (400 MHz) , DMSO-d6, δ ppm) : 11.29(2H,d), 8.51(2H,d) , 7.62(4H,d) , 7.08(4H,d) ' 4.97(1H,s) ' 1.67(12H,s) ° <Synthesis Example 8 > Compound 5,5'-(4,4'-methylureidodiyl)bis(4,1-phenylene)bis(urea) represented by the following formula [19] was synthesized. Base)) bis(methane-1-yl-1.subunit)bis(2,2-dimethyl-1,3-dioxane-4,6-dione) [48]
-60- 201240981 將梅爾德倫酸[1](14.98,103111111〇1)及原甲酸三甲酯 [2](100g)加入 500mL四口燒瓶中,進行1小時加熱回 流。其後加入 4,4’ -二胺基二苯基甲基胺[18](10.0g, 46.9mmol) ’再進行2小時加熱回流。結束反應後,將反 應溶液冷卻至室溫,濾取所析出之固體後,以己烷洗淨, 再乾燥固體,得化合物[19]21.7g(產率86%)。 1H-NMR(400MHz, DMSO-d6, δ ppm) : 1 1.2 1 (2H,d) » 8.44(2H,d) > 7.45-7.42(4H,m) , 7.0 3 - 7. Ο 1 (4 H,m), 3.24(3H,s),1 _62(12H,s) » <合成例9 > 合成下述式[21]所表示之化合物5,5’-(4,4’-(戊烷-1,5- 二基雙(氧)雙(4,1-伸苯基))雙(脲二基)雙(甲烷-1-基-1-亞 基)雙(2,2-二甲基-1,3-二噁烷- 4,6-二酮) [化 49]-60- 201240981 Meldronic acid [1] (14.98, 103111111〇1) and trimethyl orthoformate [2] (100 g) were placed in a 500 mL four-necked flask and heated to reflux for 1 hour. Thereafter, 4,4'-diaminodiphenylmethylamine [18] (10.0 g, 46.9 mmol) was added, followed by heating under reflux for 2 hours. After the completion of the reaction, the reaction solution was cooled to room temperature, and the precipitated solid was filtered, washed with hexane, and then dried to give the compound [19] 21.7 g (yield 86%). 1H-NMR (400MHz, DMSO-d6, δ ppm) : 1 1.2 1 (2H,d) » 8.44(2H,d) > 7.45-7.42(4H,m) , 7.0 3 - 7. Ο 1 (4 H , m), 3.24 (3H, s), 1 _62 (12H, s) » <Synthesis Example 9 > Compound 5,5'-(4,4'-(penta) represented by the following formula [21] was synthesized. Alkan-1,5-diylbis(oxy)bis(4,1-phenylene))bis(ureidodiyl)bis(methane-1-yl-1-ylidene)bis(2,2-dimethyl Base-1,3-dioxane-4,6-dione) [Chem. 49]
[1] H2N^^ ^NH2 CH(OHe)3 [20] [2] [21] ο«Λ七 將梅爾德倫酸[l](16.6g,115mmol)及原甲酸三甲酯 [2](lllg)加入3 00mL四口燒瓶中,進行1小時加熱回 流。其後加入化合物[20](1 5.0g,52.4mmol),再進行2小 時加熱回流。結束反應後,將反應溶液冷卻至室溫,濾取 所析出之固體後,以己烷洗淨,再乾燥固體,得化合物 [21]20.8g(產率 67%)» -61 - 201240981 j.23(2H,s) · ^ Ppm) · 1 ^ 〇4(4H,m) ’ T.00-6' 1.62- 1 Η -NMR(4^^z> DMSO-d6 8-45(2HjS) , 7.51-7.47(4H,m) 4.〇l(4H,l) , 1.82- 1,72(4H,m) <合成例1 G > 合成下述式[23]所表示之化合物丨3_雙(4-((2,2_二甲 基_4,6-二氧代-I,3·二噁烷-5-亞基)甲胺基)仲麥基)脈 [化 50][1] H2N^^ ^NH2 CH(OHe)3 [20] [2] [21] ο«Λ七将梅德伦酸 [l] (16.6g, 115mmol) and trimethyl orthoformate [2] (lllg) was placed in a 300 mL four-necked flask, and heated under reflux for 1 hour. Thereafter, the compound [20] (1 5.0 g, 52.4 mmol) was added, followed by heating under reflux for 2 hours. After completion of the reaction, the reaction solution was cooled to room temperature, and the precipitated solid was collected by filtration, washed with hexane, and then dried to yield compound [21] 20.8 g (yield 67%)» -61 - 201240981 j. 23(2H,s) · ^ Ppm) · 1 ^ 〇4(4H,m) ' T.00-6' 1.62- 1 Η -NMR(4^^z> DMSO-d6 8-45(2HjS) , 7.51 -7.47(4H,m) 4.〇l(4H,l) , 1.82- 1,72(4H,m) <Synthesis Example 1 G > A compound represented by the following formula [23] was synthesized. (4-((2,2-dimethyl-7,6-dioxo-I,3·dioxan-5-ylidene)methanyl))]
〇^ [1] -1 [22] [23] NH* CH(0Me)3 [2] 將梅爾徳倫酸[Π(28·6δ,M7nim〇1) &庳甲酸三甲酯 [2](2〇〇g)加入200mL四口燒瓶中,進行1小時加熱回 流。其後加入化合物[22](20.〇g ’ 67.〇mmol) ’再進行2小 時加熱回流。結束反應後,將反應溶液冷卻至室溫,濾取 所析出之固體後’以己烷洗淨’再乾燥固體,得化合物 [23]40.3g(產率 99%) ° 1 H-NMR(400MHz, DMS 0-d6, δ ppm) : 11.17(2H,d), 8.48(2H,d),7.40(4H,d),7.21(4H,d),5.89(2H,t),3.18-3.14(4H,m),2.62(4H,t),1.62(12H,s)。 <合成例11 > 合成下述式[25]所表示之化合物 5,5’- -62- 201240981 (6,7,9,10,17,18,20,21-八氫二基倂[b,k][l,4,7,10,1316]六 氧雜十八環烷-2,13-二基)雙(脲二基)雙(甲烷-^基-丨_亞基) 雙(2,2-二甲基-1,3-二噁烷·4,6-二酮) [化 51] η2ν〇^ [1] -1 [22] [23] NH* CH(0Me)3 [2] Will behenic acid [Π(28·6δ, M7nim〇1) & dimethyl carboxylic acid [2] (2 〇〇 g) was placed in a 200 mL four-necked flask, and heated under reflux for 1 hour. Thereafter, the compound [22] (20. 〇 g '67. 〇 mmol) was added, and the mixture was heated under reflux for 2 hours. After the completion of the reaction, the reaction solution was cooled to room temperature, and the precipitated solid was collected by filtration, then washed with hexanes and then dried to yield compound [23] 40.3 g (yield: 99%) ° 1 H-NMR (400 MHz) , DMS 0-d6, δ ppm) : 11.17(2H,d), 8.48(2H,d), 7.40(4H,d),7.21(4H,d),5.89(2H,t),3.18-3.14(4H , m), 2.62 (4H, t), 1.62 (12H, s). <Synthesis Example 11 > Compound 5,5'--62-201240981 (6,7,9,10,17,18,20,21-octahydrodiylhydrazine) represented by the following formula [25] was synthesized. b,k][l,4,7,10,1316]hexaoxaoctadecane-2,13-diyl)bis(ureidodiyl)bis(methane-^yl-indole-subunit) bis( 2,2-dimethyl-1,3-dioxane·4,6-dione) [化51] η2ν
Ο 0 【24]Ο 0 [24]
ΝΗ2ΝΗ2
ο 將梅爾德倫酸[l](mg,51.2 mmol)及原甲酸三甲酯 [2](100g)加入200mL四口燒瓶中,進行1小時加熱回 流。其後加入化合物[24](10.0g,25.6mmol),再進行2小 時加熱回流。結束反應後,以蒸發器去除溶劑再乾燥,得 化合物[25]17.9g(產率96%) » 'H-NMR(400MHz, DMSO-d6, <5 ppm) : 1 1 . 1 6(2H,d) > 8.50(2H,d) » 7.19(2H,d) » 7.0 1 - 6.9 8 (2 H ,m) > 6.93(2H,m) » 4‘09-4.08 (4H,m) , 4.04-4.02(4H,m) , 3.79(8H,m), 1.6 1 (1 2H,s)。 <合成例1 2 > 合成下述式[2 7]所表示之化合物5-((3-(2,2-二甲基-4,6_二氧-1,3·二噁烷-5-基亞基)甲胺基)苯胺基)伸甲基)-2,2_~ 甲基 _1,3-二噁烷-4,6-二酮 -63- 201240981 [化 52] „2NXXnh2 [26]ο Meldronic acid [l] (mg, 51.2 mmol) and trimethyl orthoformate [2] (100 g) were placed in a 200 mL four-necked flask and heated to reflux for 1 hour. Thereafter, the compound [24] (10.0 g, 25.6 mmol) was added, followed by heating under reflux for 2 hours. After completion of the reaction, the solvent was removed by an evaporator and dried to give the compound [25] 17.9 g (yield: 96%). <>H-NMR (400 MHz, DMSO-d6, <5 ppm): 1 1.16 (2H) , d) > 8.50(2H,d) » 7.19(2H,d) » 7.0 1 - 6.9 8 (2 H ,m) > 6.93(2H,m) » 4'09-4.08 (4H,m) , 4.04-4.02 (4H, m), 3.79 (8H, m), 1.6 1 (1 2H, s). <Synthesis Example 1 2 > A compound 5-((3-(2,2-dimethyl-4,6-dioxo-1,3·dioxane) represented by the following formula [2 7] was synthesized. 5-ylidene)methylamino)anilino)methyl)-2,2_~methyl-1,3-dioxane-4,6-dione-63- 201240981 [Chemical 52] „2NXXnh2 [ 26]
[2][2]
[27】 將梅爾德倫酸[l](23.6g,164mm〇l)及原甲酸三甲酯 [2](100g)加入300mL四口燒瓶中,進行1小時加熱回 流。其後加入3-胺基苄基胺[26](10.0g,81.9mmol),再進 行2小時加熱回流。結束反應後,以蒸發器去除溶劑再乾 燥,得化合物[27]36.2g(產率100%)。 'Η-ΝΜΚ(400ΜΗζ, DMSO-d6, <5 ppm) : 1 1.2 1 (1 H,s) > 1 0.04-9.97(lH,m),8.55(lH,s),8.30(lH,d),7.57(lH,s), 7.48-7.3 8 (2H,m),7_23(lH,d),4.65(2H,d),1.63(6H,s), 1 .55(6H,s)。 <合成例1 3 > 合成下述式[29]所表示之化合物5,5’_(4,4’_丙烷-l,3_ 二基)雙(哌啶-4,l-二基)雙(甲烷-l_基-l-亞基)雙(2,2-二甲 基-1,3-二噁烷-4,6·二酮) [化 53][27] Meldronic acid [1] (23.6 g, 164 mm 〇l) and trimethyl orthoformate [2] (100 g) were placed in a 300 mL four-necked flask, and heated to reflux for 1 hour. Thereafter, 3-aminobenzylamine [26] (10.0 g, 81.9 mmol) was added, followed by heating under reflux for 2 hours. After the completion of the reaction, the solvent was removed by an evaporator and dried to give compound [27] 36.2 g (yield 100%). 'Η-ΝΜΚ (400ΜΗζ, DMSO-d6, <5 ppm) : 1 1.2 1 (1 H,s) > 1 0.04-9.97(lH,m),8.55(lH,s),8.30(lH,d ), 7.57 (lH, s), 7.48-7.3 8 (2H, m), 7_23 (lH, d), 4.65 (2H, d), 1.63 (6H, s), 1.55 (6H, s). <Synthesis Example 1 3 > A compound represented by the following formula [29] 5,5'-(4,4'-propane-l,3-diyl)bis(piperidine-4,l-diyl) was synthesized. Bis(methane-l-yl-l-subunit) bis(2,2-dimethyl-1,3-dioxane-4,6·dione) [53]
將梅爾德倫酸[l](11.7g,81.0mmol)及原甲酸三甲酯 -64- 201240981 [2](128g)加入200mL四口燒瓶中,進行i小時加熱回 流。其後加入 1,3-二-4-哌啶基丙烷[28](8.52g, 40.5mmol),再進行2小時加熱回流。結束反應後,以蒸 發器去除溶劑再乾燥,得化合物[29]20.2g(產率99%)。 1 H-NMR(400MHz, DMSO-d6, δ ppm) : 8.09(2H,s) > 4.06-3.97(4H,m) » 3 . 5 6 - 3.4 9 (2 H , m) > 3.2 8 - 3.2 5 (2 H ,m) > 1.84-1.81(4H,m),1.61-1.56(12H,m),1.32- 1.23( 1 2H,m)。 <合成例1 4 > 合成下述式[31]所表示之化合物5,5,-(丙烷-1,3-二基 雙(脲二基)雙(甲烷-1-基-1-亞基)雙(2,2-二甲基-1,3-二噁 烷-4,6-二酮) [化 54]Meldronic acid [l] (11.7 g, 81.0 mmol) and trimethyl orthoformate-64-201240981 [2] (128 g) were placed in a 200 mL four-necked flask and heated to reflux for one hour. Thereafter, 1,3-di-4-piperidylpropane [28] (8.52 g, 40.5 mmol) was added, followed by heating under reflux for 2 hours. After completion of the reaction, the solvent was removed by an evaporator and dried to give the compound [29] 20.2 g (yield: 99%). 1 H-NMR (400 MHz, DMSO-d6, δ ppm): 8.09 (2H, s) > 4.06-3.97 (4H, m) » 3 . 5 6 - 3.4 9 (2 H , m) > 3.2 8 - 3.2 5 (2 H , m) > 1.84-1.81 (4H, m), 1.61-1.56 (12H, m), 1.32 - 1.23 (1 2H, m). <Synthesis Example 1 4 > A compound represented by the following formula [31] 5,5,-(propane-1,3-diylbis(ureidodiyl)bis(methane-1-yl-1-a) was synthesized. Bis(2,2-dimethyl-1,3-dioxane-4,6-dione) [Chem. 54]
將梅爾德倫酸[l](42.8g,297mmol)及原甲酸三甲酯 [2](150g)加入500mL四口燒瓶中,進行1小時加熱回 流。其後加入1,3-二胺基丙烷[30](10.0g,135mmol),再 進行2小時加熱回流。結束反應後,將反應溶液冷卻至室 溫,濾取所析出之固體後,以己烷洗淨,再乾燥固體,得 化合物[3 l]24.8g(產率48%)。 1H-NMR(400MHz, CDC13, δ ppm) : 9.5 7 - 9.5 4 (2 Η,m) s -65- 201240981 ,8.16(2H,d),3.59(4H,q),2.1 1(2H,quin),1.71(12H,s) <合成例1 5 > 合成下述式[33]所表示之化合物5,5’-(環己烷-1,3-二 基雙(伸甲基))雙(脲二基)二(甲烷-1·•基-1-亞基)雙(2,2-二 甲基-1,3-二噁烷-4,6-二酮) [化 55]Meldronic acid [l] (42.8 g, 297 mmol) and trimethyl orthoformate [2] (150 g) were placed in a 500 mL four-necked flask, and heated to reflux for 1 hour. Thereafter, 1,3-diaminopropane [30] (10.0 g, 135 mmol) was added, followed by heating under reflux for 2 hours. After the completion of the reaction, the reaction solution was cooled to room temperature, and the precipitated solid was filtered, washed with hexane, and then dried to give the compound [3l] 24.8 g (yield 48%). 1H-NMR (400MHz, CDC13, δ ppm) : 9.5 7 - 9.5 4 (2 Η,m) s -65- 201240981 ,8.16(2H,d),3.59(4H,q),2.1 1(2H,quin) , 1.71 (12H, s) <Synthesis Example 1 5 > The compound 5,5'-(cyclohexane-1,3-diylbis(methyl)) double represented by the following formula [33] was synthesized. (ureadiyl)di(methane-1·•yl-1-ylidene)bis(2,2-dimethyl-1,3-dioxane-4,6-dione) [Chem. 55]
將梅爾德倫酸[l](44.6g,309mmol)及原甲酸三甲酯 [2](200g)加入500mL四口燒瓶中,進行 1小時加熱回 流。其後加入I,3-雙胺基甲基環己烷(cis-/tranS-混合 物)[3 2](20.0g,14 1mmol),再進行2小時加熱回流。結束 反應後,將反應溶液冷卻至室溫,濾取所析出之固體後, 以己烷洗淨,再乾燥固體,得化合物[33](CiS-/tranS-混合 物)58.3g(產率 92%)。 1 Η - N M R ( 4 Ο Ο Μ H z, DMSO-d6, δ ppm) · 9.63-9.60 (2H,m) > 8. 1 1-7.97(2H,m) > 3 . 5 1 - 3 . 1 2 (4 H , m) > 1.87-0.54 (22H,m)。 <合成例1 6 > -66 - 201240981 合成下述式[35]所表示之化合物5,5 ’- (5,8 -二氧- 2,11-(^11丨3(1〇(!6〇3116-1,12-二基亞基)雙(2,2-二甲基-1,3-二噁烷-4,6-二酮) [化 56]Meldronic acid [l] (44.6 g, 309 mmol) and trimethyl orthoformate [2] (200 g) were placed in a 500 mL four-necked flask, and heated to reflux for 1 hour. Thereafter, I,3-diaminomethylcyclohexane (cis-/tranS-mixture) [3 2] (20.0 g, 14 1 mmol) was added, followed by heating under reflux for 2 hours. After the completion of the reaction, the reaction solution was cooled to room temperature, and the precipitated solid was filtered, washed with hexane, and then dried to yield compound [33] (CiS-/tranS-mixture) 58.3 g (yield 92%) ). 1 Η - NMR ( 4 Ο Ο Μ H z, DMSO-d6, δ ppm) · 9.63-9.60 (2H, m) > 8. 1 1-7.97(2H,m) > 3 . 5 1 - 3 . 1 2 (4 H , m) > 1.87-0.54 (22H, m). <Synthesis Example 1 6 > -66 - 201240981 A compound represented by the following formula [35] 5,5 '- (5,8-dioxo-2,11-(^11丨3(1〇(! 6〇3116-1,12-diylylene)bis(2,2-dimethyl-1,3-dioxane-4,6-dione) [Chem. 56]
CH(OMe)3 12] [35] 〇 〇七 將梅爾德倫酸[1](13.6呂,94.2111〇1〇1)及原甲酸三甲酯 [2](134g)加入200mL四口燒瓶中,進行1小時加熱回 流。其後加入 3,6-二氧雜-1,8-辛烷二硫醇[34](7.8§, 42.8mmol) ’再進行2小時加熱回流。結束反應後,以蒸 發器去除溶劑再乾燥,得化合物[35]20.8g(產率99%)。 1 H-NMR(400MHz, DMSO-d6, δ ppm) : 9.29(2H,s), 3.72(4H,t),3.57(4H,s),3.3 9-3.34(4H,m),1.66(12H,s)。 <合成例1 7 > 合成下述式[37]所表示之化合物3,5-雙((2,2-二甲基- 4,6-二氧-1,3-二噁烷-5-基亞基)甲胺基)苯甲酸 [化 57]CH(OMe)3 12] [35] 〇〇7 will add Meldronic acid [1] (13.6 Lu, 94.2111〇1〇1) and trimethyl orthoformate [2] (134g) to a 200mL four-necked flask. , heating and refluxing for 1 hour. Thereafter, 3,6-dioxa-1,8-octanedithiol [34] (7.8 §, 42.8 mmol) was added, followed by heating under reflux for 2 hours. After completion of the reaction, the solvent was removed by an evaporator and dried to give the compound [35] 20.8 g (yield: 99%). 1H-NMR (400MHz, DMSO-d6, δ ppm): 9.29 (2H, s), 3.72 (4H, t), 3.57 (4H, s), 3.3 9-3.34 (4H, m), 1.66 (12H, s). <Synthesis Example 1 7 > A compound represented by the following formula [37] 3,5-bis((2,2-dimethyl- 4,6-dioxo-1,3-dioxane-5) was synthesized. -kiyaki)methylamino)benzoic acid [57]
將梅爾德倫酸[1](10.4§,72.3111111〇1)及原甲酸三甲酯 S -67- 201240981 [2](105g)加入200mL四口燒瓶中,進行 1小時加熱回 流。其後加入3,5-二胺基苯甲酸[36](5.08,32.9111111〇1), 再進行2小時加熱回流。結束反應後,將反應溶液冷卻至 室溫,濾取所析出之固體後,以己烷洗淨,再乾燥固體, 得化合物[37]9_0g(產率59%)。 1 H-NMR(400MHz, DMSO-d6, δ ppm) : 11.34(2H,d), 8_74(2H,d),7.92(2H,d),1.69(12H,s)。 <合成例1 8 > 合成下述式[39]所表示之化合物3,5-雙((2,2-二甲基-4,6-二氧- I,3-二噁烷-5-基亞基)甲胺基)-N-(吡啶-3-基甲基) 苯甲醯胺 [化 58]Meldronic acid [1] (10.4 §, 72.3111111〇1) and trimethyl orthoformate S-67-201240981 [2] (105 g) were placed in a 200 mL four-necked flask and heated to reflux for 1 hour. Thereafter, 3,5-diaminobenzoic acid [36] (5.08, 32.9111111〇1) was added, followed by heating under reflux for 2 hours. After the completion of the reaction, the reaction solution was cooled to room temperature, and the precipitated solid was filtered, washed with hexane, and then dried to yield compound [37] 9-0 g (yield 59%). 1 H-NMR (400 MHz, DMSO-d6, δ ppm): 11.34 (2H,d), 8 -74 (2H,d), 7.92 (2H,d), 1.69 (12H, s). <Synthesis Example 1 8 > A compound represented by the following formula [39] 3,5-bis((2,2-dimethyl-4,6-dioxo-I,3-dioxane-5) was synthesized. -ylylene)methylamino)-N-(pyridin-3-ylmethyl)benzamide [5]
將梅爾德倫酸[l](6.5g,45.4mmol)及原甲酸三甲醋 [2](66g)加入200mL四口燒瓶中,進行1小時加熱回流β 其後加入化合物[38](5.〇g,20.6mmol),再進行2小時加 熱回流。結束反應後,以蒸發器去除溶劑再乾燥,得化合 物[39]11.3g(產率 98%)。 1 H-NMR(400MHz, DMSO-d6, δ ppm) : 11.35(2H,d), 9.27(lH,t) > 8.78(2H,d) » 8.59(lH,d) > 8.4 9 - 8.4 7 (1 H, m). 8.16-8.15(lH,m) , 7.84(2H,d) , 7.77-7.74(lH,m) , 7.40- 201240981 7.36(lH,m),4.55(2H,d),l_69(12H,s)。 <合成例1 9 > 合成下述式[41]所表示之化合物N-(3-(lH -咪唑-1-基) 丙基)-3,5-雙(2,2-二甲基·4,6-二氧-1,3-二噁烷-5-基亞基) 甲胺基)苯甲醯胺 [化 59]Meldronic acid [l] (6.5 g, 45.4 mmol) and toluene formic acid [2] (66 g) were placed in a 200 mL four-necked flask, heated to reflux for 1 hour, and then compound [38] was added. 〇g, 20.6 mmol), and heated to reflux for 2 hours. After the reaction was completed, the solvent was removed by an evaporator and dried to give 11.3 g (yield 98%) of compound [39]. 1 H-NMR (400 MHz, DMSO-d6, δ ppm): 11.35 (2H,d), 9.27 (1H,t) > 8.78 (2H,d) » 8.59 (lH,d) > 8.4 9 - 8.4 7 (1 H, m). 8.16-8.15(lH,m) , 7.84(2H,d) , 7.77-7.74(lH,m) , 7.40- 201240981 7.36(lH,m),4.55(2H,d),l_69 (12H, s). <Synthesis Example 1 9 > A compound represented by the following formula [41] N-(3-(lH-imidazol-1-yl)propyl)-3,5-bis(2,2-dimethyl group) · 4,6-dioxo-1,3-dioxan-5-ylidene) methylamino)benzamide [59]
將梅爾德倫酸[l](l〇.lg,52.1mmol)及原甲酸三甲酯 [2](50g)加入200mL四口燒瓶中’進行i小時加熱回流。 其後加入化合物[40](5.0g,23.7mmol),再進行2小時加 熱回流。結束反應後,以蒸發器去除溶劑再乾燥,得化合 物[41]13.4g(產率 100%)。 1 Η - N M R (4 0 0 Μ H z,D Μ S Ο - d 6 , § ppm) : 11.27(2H,s), 8.71-8.65(3H,m) ’ 8.01(lH,t),7.99(lH,t),7.75(2H,d), 7.32(lH,t),7.05(lH,t),4.07-4.03 (2H,m),3.25-3.18 (2H,m),1.97(2H,t),1.64(12H,s)。 〈合成例20 > 合成下述式[43]所表示之化合物3,5_雙((2,2_二甲基_ 4,6-一氧-1,3 -二卩惡院-5-亞基)甲胺基)苯倂呋喃_2_碳酸酯 -69- 201240981 [化 60]Meldronic acid [l] (l〇.lg, 52.1 mmol) and trimethyl orthoformate [2] (50 g) were placed in a 200 mL four-necked flask, and heated under reflux for 1 hour. Thereafter, the compound [40] (5.0 g, 23.7 mmol) was added, followed by heating under reflux for 2 hours. After the reaction was completed, the solvent was removed by an evaporator and dried to give 13.4 g (yield: 100%) of compound [41]. 1 Η - NMR (4 0 0 Μ H z, D Μ S Ο - d 6 , § ppm) : 11.27(2H,s), 8.71-8.65(3H,m) ' 8.01(lH,t),7.99(lH , t), 7.75 (2H, d), 7.32 (lH, t), 7.05 (lH, t), 4.07-4.03 (2H, m), 3.25-3.18 (2H, m), 1.97 (2H, t), 1.64 (12H, s). <Synthesis Example 20 > A compound represented by the following formula [43], 3,5-bis ((2,2-dimethyl- 4,6-monooxy-1,3-dioxime-5-) was synthesized. Subunit)methylamino)benzoquinone-2-yl carbonate-69- 201240981 [Chem. 60]
將梅爾德倫酸[n(13.7g ’ 94.7mmo1)及原甲酸三甲酯 [2](100g)加入 200mL四口燒瓶中,進行 1小時加熱回 流。其後加入化合物[42] (10.0g,43.1 mmol),再進行2小 時加熱回流。結束反應後,將反應溶液冷卻至室溫,濾取 所析出之固體後,以己烷洗淨,再乾燥固體,得化合物 [43]21.1g(產率 90%)。 1 H-NMR(400MHz,D M S Ο - d 6 , (5 ppm) : 11.22(2H,d), 8.67(2H,d),7.94-7.93(1 H,m),7_ 87-7· 86(1 H,m), 7.46-7.45(2H,m) , 7.38(lH,dd) , 6.6 8 - 6 · 6 6 ( 1 H,m), 5.28(2H,s),1.63(12H,s)。 <合成例2 1 > 合成下述式[45]所表示之化合物5,5’-(4-(十二烷氧 基)-1,3-伸苯基)雙(脲二基)雙(甲烷-丨—基-^基亞基)雙(2,2 二甲基-1,3-二嚼院-4,6-二酮) [化 61]Meldronic acid [n (13.7 g '94.7 mmo1) and trimethyl orthoformate [2] (100 g) were placed in a 200 mL four-necked flask and heated to reflux for 1 hour. Thereafter, the compound [42] (10.0 g, 43.1 mmol) was added, followed by heating under reflux for 2 hours. After the completion of the reaction, the reaction solution was cooled to room temperature, and the precipitated solid was filtered, washed with hexane, and then dried to give compound [43] 21.1 g (yield 90%). 1 H-NMR (400 MHz, DMS Ο - d 6 , (5 ppm): 11.22 (2H, d), 8.67 (2H, d), 7.94-7.93 (1 H, m), 7_ 87-7·86 (1) H, m), 7.46-7.45 (2H, m), 7.38 (lH, dd), 6.6 8 - 6 · 6 6 ( 1 H, m), 5.28 (2H, s), 1.63 (12H, s). Synthesis Example 2 1 > The compound represented by the following formula [45] was synthesized, 5,5'-(4-(dodecyloxy)-1,3-phenylene)bis(ureidodiyl)bis ( Methane-丨-yl-yl-based subunit) bis(2,2-dimethyl-1,3-diche-4,6-dione) [Chem. 61]
-70- 201240981 將梅爾德倫酸[l](10.8g,75.2mmol)及原甲酸三甲酯 [2](100g)加入300mL四口燒瓶中,進行1小時加熱回 流。其後加入化合物[44](10.0g,34.2mmol),再進行2小 時加熱回流。結束反應後,以蒸發器去除溶劑再乾燥,得 化合物[45]29.7g(產率99%)。 1H-NMR(400MHz, DMSO-d6, δ ppm) : 1 1 .57(lH,d) > 11.20(lH,d) , 8.90(lH,d) , 8.64(lH,d) , 8.09(lH,d), 7.31(lH,dd),7.13(lH,d),4.06(2H,t),1.74- 1.68(2H,m), 1.63(12H,s) , 1.46- 1.40(2H,m) , 1.25-1. 1 6(1 6H,m), 0.79(3H,t)。 〈合成例2 2 > 合成下述式[47]所表示之化合物5,5’-(4-(十烷氧基)-1,3-伸苯基)雙(脲二基)雙(甲烷-1-基-1-亞基)雙(2,2-二甲 基-1,3-二噁烷-4,6-二酮) [化 62]-70- 201240981 Meldronic acid [l] (10.8 g, 75.2 mmol) and trimethyl orthoformate [2] (100 g) were placed in a 300 mL four-necked flask and heated to reflux for 1 hour. Thereafter, the compound [44] (10.0 g, 34.2 mmol) was added, followed by heating under reflux for 2 hours. After the completion of the reaction, the solvent was removed by an evaporator and dried to give the compound [45] 29.7 g (yield: 99%). 1H-NMR (400MHz, DMSO-d6, δ ppm): 1 1 .57 (lH,d) > 11.20 (lH,d), 8.90 (lH,d), 8.64 (lH,d), 8.09 (lH, d), 7.31 (lH, dd), 7.13 (lH, d), 4.06 (2H, t), 1.74- 1.68 (2H, m), 1.63 (12H, s), 1.46- 1.40 (2H, m), 1.25 -1. 1 6 (1 6H, m), 0.79 (3H, t). <Synthesis Example 2 2 > A compound represented by the following formula [47] 5,5'-(4-(decaloxy)-1,3-phenylene)bis(ureidodiyl)bis (methane) was synthesized. -1-yl-1-ylidene)bis(2,2-dimethyl-1,3-dioxane-4,6-dione) [Chem. 62]
將梅爾德倫酸[1] (4.2g,29.2mmol)及原甲酸三甲酯 [2] (42 g)加入lOOmL四口燒瓶中,進行1小時加熱回流。 其後加入化合物[46](5.〇g,13.3mmol),再進行2小時加 熱回流。結束反應後,將反應溶液冷卻至室溫,濾取所析 -71 - 201240981 出之固體後,以己烷洗淨’再乾燥固體,得化合物 [47]6_4g(產率 71%)。 1 H-NMR(400MHz, DMSO-d6, δ ppm) : 1 1.63( 1 H,d) > 11.26(lH,d),8.99(lH,d),8.72(lH,d),8_19(lH,d), 7.40(lH,dd),7.20(lH,d),4.13(2H,t),1.80- 1.74(2H,m), 1.68(12H,s) ’ 1.49- 1.45(2H,m) , 1.25- 1 .22(28H,m) > 0.85(3H,t)。 〈合成例23 > 合成下述式[49]所表示之化合物5,5’-(4-(4-反-4-庚基 環己基)苯氧基)-1,3-伸苯基)雙(脲二基)雙(甲烷-基-i_亞 基)雙(2,2-二甲基-1,3-二噁烷- 4,6-二酮) [化 63]Meldronic acid [1] (4.2 g, 29.2 mmol) and trimethyl orthoformate [2] (42 g) were placed in a 100 mL four-necked flask, and heated under reflux for 1 hour. Thereafter, the compound [46] (5. g, 13.3 mmol) was added, and the mixture was further refluxed for 2 hours. After the completion of the reaction, the reaction solution was cooled to room temperature, and the solid obtained was analyzed by filtration, and the solid was eluted with hexane, and the solid was dried to give compound [47] 6-4 g (yield: 71%). 1 H-NMR (400 MHz, DMSO-d6, δ ppm): 1 1.63 (1H, d) > 11.26 (lH, d), 8.99 (lH, d), 8.72 (lH, d), 8_19 (lH, d), 7.40 (lH, dd), 7.20 (lH, d), 4.13 (2H, t), 1.80- 1.74 (2H, m), 1.68 (12H, s) ' 1.49- 1.45 (2H, m), 1.25 - 1.22(28H,m) > 0.85(3H,t). <Synthesis Example 23 > The compound 5,5'-(4-(4-trans-4-heptylcyclohexyl)phenoxy)-1,3-phenylene group represented by the following formula [49] was synthesized. Bis(ureidodiyl)bis(methane-yl-i-subunit)bis(2,2-dimethyl-1,3-dioxane-4,6-dione) [Chem. 63]
• C7H1S• C7H1S
將梅爾德倫酸[1] (4.2g,28.9mmol)及原甲酸三甲酯 [2](44)加入10〇11^四口燒瓶中,進行1小時加熱回流。 其後加入化合物[48](5.〇g,13.1mmol),再進行2小時加 熱回流。結束反應後,以蒸發器去除溶劑再乾燥,得化合 物[49]9.0g(產率 98%)。 1H-NMR(400MHz, DMSO-d6, 5 ppm) : 11.64(lH,d), -72- 201240981 11.30(lH,d),9.03(lH,d),8.76(lH,d),8.31(lH,d), 7.40(lH,dd),7.28(2H,H),7.03(2H,d),6.97(lH,d), l_81(2H,d) , 1.69(1 OH,d) , 1.44-1 . 34( 1 H,m) > 1.26- 1.78(10H,m),1,07-1.01(lH,m),0.86(3H,t)。 <合成例24> 合成下述式[51]所表示之化合物5,5’-(4-(反-4-(反-4’-戊基雙(環己基)-4-基)苯氧基)-1,3-伸苯基)雙(脲二基)雙 (甲烷-1-基-1-亞基)雙(2,2-二甲基-1,3-二噁烷-4,6-二酮) [化 64]Meldronic acid [1] (4.2 g, 28.9 mmol) and trimethyl orthoformate [2] (44) were placed in a 10 〇 11 ^ four-necked flask, and heated under reflux for 1 hour. Thereafter, the compound [48] (5. g, 13.1 mmol) was added, followed by heating under reflux for 2 hours. After the reaction was completed, the solvent was removed by an evaporator and dried to give 9.0 g (yield 98%) of compound [49]. 1H-NMR (400MHz, DMSO-d6, 5 ppm): 11.64 (1H, d), -72 - 201240981 11.30 (lH, d), 9.03 (lH, d), 8.76 (lH, d), 8.31 (lH, d), 7.40 (lH, dd), 7.28 (2H, H), 7.03 (2H, d), 6.97 (lH, d), l_81 (2H, d), 1.69 (1 OH, d), 1.44-1. 34( 1 H,m) > 1.26- 1.78 (10H, m), 1,07-1.01 (lH, m), 0.86 (3H, t). <Synthesis Example 24> A compound 5,5'-(4-(trans-4(trans-4'-pentyl)bis(cyclohexyl)-4-yl)phenoxy) represented by the following formula [51] was synthesized. ))-1,3-phenylene) bis(ureidodiyl)bis(methane-1-yl-1-ylidene)bis(2,2-dimethyl-1,3-dioxane-4, 6-diketone) [Chem. 64]
將梅爾德倫酸[1] (9.0g,62.1mmol)及原甲酸三甲酯 [2]U20g)加入3 00mL四口燒瓶中,進行1小時加熱回 流。其後加入化合物[50](12.3g,28.2mmol),再進行2小 時加熱回流。結束反應後,以蒸發器去除溶劑再乾燥,得 化合物[51] 20.6 8g(產率 98%)。 'H-NMR(400MHz, DMSO-d6, δ ppm) : 1 1,64(lH,d)-11.30(lH,d),9.03(lH,d),8.76(lH,d),8.31(lH,d), 7.39(lH,dd),7.27(lH,d),7.02(2H,d),6.97(2H,d), -73- 201240981 1.88- 1.03 (43H,m),〇.86(3H,t)。 〈合成例25 > 合成下述式[53]所表示之化合物5,5’_(5_((反_4_(反_ 4’-戊基雙(環己基)-4-基)苯氧基)甲基伸苯基)雙(脲 二基)雙(甲烷-卜基-1-亞基)雙(2,2-二甲基-1,3-二噁烷-4,6-二酮) [化 65]Meldronic acid [1] (9.0 g, 62.1 mmol) and trimethyl orthoformate [2] U20 g) were placed in a 300 mL four-necked flask and heated to reflux for 1 hour. Thereafter, the compound [50] (12.3 g, 28.2 mmol) was added, followed by heating under reflux for 2 hours. After the reaction was completed, the solvent was removed by an evaporator and dried to give Compound [51] 20.6 g (yield 98%). 'H-NMR (400 MHz, DMSO-d6, δ ppm): 1 1,64 (1H, d) -11.30 (1H, d), 9.03 (1H, d), 8.76 (lH, d), 8.31 (lH, d), 7.39 (lH, dd), 7.27 (lH, d), 7.02 (2H, d), 6.97 (2H, d), -73- 201240981 1.88- 1.03 (43H, m), 〇.86 (3H, t). <Synthesis Example 25 > The compound represented by the following formula [53] was synthesized, 5, 5'-(5-((trans_4_(anti-4'-pentyl bis(cyclohexyl))-4-yl)phenoxy) Methyl phenyl) bis(ureidodiyl) bis(methane-buyl-1-ylidene) bis(2,2-dimethyl-1,3-dioxane-4,6-dione) [化65]
將梅爾德倫酸[1] (19.0g,98.6mmol)及原甲酸三甲酯 [2](200g)加入500mL四口燒瓶中,進行1小時加熱回 流。其後加入化合物[52](20.0g,44.6mmol),再進行2小 時加熱回流。結束反應後,以蒸發器去除溶劑再乾燥,得 化合物[53]33.4g(產率99%)。 1H-NMR(400MHz, DMSO-d6, δ ppm) : 1 1.29(2H,d) > 8_74(2H,d) , 7.94(lH,s) , 7.53(2H,d) , 7.12(2H,d), 6.92(2H,d) , 5.09(2H,s) , 1 . 8 1 -1 . 6 8 (2 Ο H,m) , 1.36- 0.84(23H,m) 〇 -74- 201240981 〈合成例2 6 > 合成下述式[55]所表示之化合物4’·戊基雙(反-環己 基)-4-基 3,5·雙((2,2-一甲基-4,6 - 一 氧-1,3-二嚼院-5-亞基) 甲胺基)苯甲酸酯 [化 66]Meldronic acid [1] (19.0 g, 98.6 mmol) and trimethyl orthoformate [2] (200 g) were placed in a 500 mL four-necked flask, and heated to reflux for 1 hour. Thereafter, the compound [52] (20.0 g, 44.6 mmol) was added, followed by heating under reflux for 2 hours. After the reaction was completed, the solvent was removed by an evaporator and dried to give 33.4 g (yield: 99%) of Compound [53]. 1H-NMR (400MHz, DMSO-d6, δ ppm): 1 1.29(2H,d) > 8_74(2H,d) , 7.94(lH,s) , 7.53(2H,d) , 7.12(2H,d) , 6.92(2H,d) , 5.09(2H,s) , 1. 8 1 -1 . 6 8 (2 Ο H,m) , 1.36- 0.84(23H,m) 〇-74- 201240981 <Synthesis Example 2 6 > Synthesis of compound 4'·pentyl bis(trans-cyclohexyl)-4-yl 3,5·bis((2,2-methyl-4,6-oxy) represented by the following formula [55] -1,3-two chewing compound-5-subunit) methylamino)benzoate [Chem. 66]
將梅爾德倫酸[1] (13.3g,92.0mmol)及原甲酸三甲醋 [2](150g)加入500mL四口燒瓶中,進行1小時加熱回 流。其後加入化合物[54](15.0g,41.8mmol),再進行2小 時加熱回流。結束反應後,以蒸發器去除溶劑再乾燥,得 化合物[55]28.8g(產率99%)。 1H-NMR(400MHz, DMSO-d6, δ ppm) : 1 1 .28(2H,s) > 8.67(2H,s) « 8.17(lH,t),7.86(2H,d),4.79-4.73(lH,m), 2.02(2H,d) > 1.74- 1.64(1 8H,m) - 1.4 4 - 1 . 3 2 (2 H , m) > 1.29-0.76(20H,m) 〇 〈合成例2 7 > 合成下述式[57]所表示之化合物N-(2,4 -雙((2,2 -二甲Meldronic acid [1] (13.3 g, 92.0 mmol) and toluene formic acid [2] (150 g) were placed in a 500 mL four-necked flask, and heated to reflux for 1 hour. Thereafter, the compound [54] (15.0 g, 41.8 mmol) was added, followed by heating under reflux for 2 hours. After the completion of the reaction, the solvent was removed by an evaporator and dried to give the compound [55] 28.8 g (yield: 99%). 1H-NMR (400MHz, DMSO-d6, δ ppm) : 1 1 .28(2H,s) > 8.67(2H,s) « 8.17(lH,t),7.86(2H,d),4.79-4.73( lH,m), 2.02(2H,d) > 1.74- 1.64(1 8H,m) - 1.4 4 - 1 . 3 2 (2 H , m) > 1.29-0.76(20H,m) 〇<Synthesis example 2 7 > The compound represented by the following formula [57] is synthesized as N-(2,4-bis((2,2-dimethyl)
S -75- 201240981 基-4,6-二氧-1,3-二噁烷-5-亞基)甲胺基)苯基)-4-(反-4-戊 基環己基)苯甲醯胺 [化 67]S-75- 201240981 base-4,6-dioxo-1,3-dioxan-5-ylidenemethylamino)phenyl)-4-(trans-4-pentylcyclohexyl)benzamide Amine [67]
將梅爾德倫酸[l](8.2g,56.7mmol)及原甲酸三甲酯 [2] (8 0g)加入3 OOmL四口燒瓶中,進行1小時加熱回流。 其後加入化合物[56](lG.0g,25.8mmol),再進行2小時加 熱回流。結束反應後,將反應溶液冷卻室溫,濾取所析出 之固體後,以己烷洗淨,再乾燥固體,得化合物 [57]16_0g(產率 92%)。 1 H-NMR(400MHz, DMSO-d6, δ ppm) : 11.36- 1 1.27(2H,m) , 1 0.38(1 H,s) , 8.8 0 - 8.7 4 (2 H , m) > 8,09(lH,s),7.87(2H,d),7.44(lH,dd),7.34(2H,d), 2_5I-2.46(3H,m),1.77(2H,d),I.66(6H,s),l_59(6H,s), 1.50- 1.37(3 H,m) > 1.29-1 . 14(8H,m) , 0.99(2H,q), 0.82(3H,t)。 〈合成例2 8 > 合成下述式[59]所表示之化合物N-(2,4-雙((2,2-二甲 基-4,6-二氧-1,3-二噁烷-5-亞基)甲胺基)苯基)-4-(反-4-庚 基環己基)苯甲醯胺 -76- 201240981 [化 68] h2nMeldronic acid [l] (8.2 g, 56.7 mmol) and trimethyl orthoformate [2] (80 g) were placed in a 300 mL four-necked flask and heated to reflux for 1 hour. Thereafter, the compound [56] (1 G.0 g, 25.8 mmol) was added, and the mixture was refluxed for 2 hours. After the completion of the reaction, the reaction solution was cooled to room temperature, and the precipitated solid was filtered, washed with hexane, and then dried to yield compound [57] 16 </ RTI> (yield: 92%). 1 H-NMR (400 MHz, DMSO-d6, δ ppm): 11.36- 1 1.27 (2H, m) , 1 0.38 (1 H, s) , 8.8 0 - 8.7 4 (2 H , m) > 8,09 (lH, s), 7.87 (2H, d), 7.44 (lH, dd), 7.34 (2H, d), 2_5I-2.46 (3H, m), 1.77 (2H, d), I.66 (6H, s ), l_59(6H, s), 1.50- 1.37(3 H,m) > 1.29-1 . 14(8H,m) , 0.99(2H,q), 0.82(3H,t). <Synthesis Example 2 8 > A compound represented by the following formula [59] N-(2,4-bis((2,2-dimethyl-4,6-dioxo-1,3-dioxane)) was synthesized. -5-subunit)methylamino)phenyl)-4-(trans-4-heptylcyclohexyl)benzamide-76- 201240981 [化68] h2n
[58][58]
將梅爾德倫酸[l](11.7g,81.0mmol)及原甲酸三甲酯 [2](150g)加入300mL四口燒瓶中,進行1小時加熱回 流。其後加入化合物[58] (15.0g,3 6.8 mmol),再進行2小 時加熱回流。結束反應後,將反應溶液冷卻室溫,濾取所 析出之固體後,以己烷洗淨,再乾燥固體,得化合物 [59]26.1g(產率 99%)。 1 Η-N M R (4 0 0 Μ H z , DMSO-d6, 5 ppm) : 11.36-11.27 (2H,m) > 1 0.3 8( 1 H,s) > 8.78(2H,t) , 8. 10(lH,s) ’ 7_88(2H,d) , 7.44(lH,dd) , 7.35(3H,d) , 2.52(2H,t), 1.78(2H,d),1.65(6H,s),1.60(6H,s),1.50- 1.3 7(2H,m), 1.29-1.12(14H,m),0.99(2H,q),0.82(3H,t)。 〈合成例2 9 > 合成下述式[61]所表示之化合物 5,5’·(4-((33,83,98,1011,1311,143,1711)-10,13-二甲基-17-((11)-5-甲 基己-2-基)-2,3,4,7,8,9,10,11,12,13,14,15,16,17-十四氫-1Η-環戊基[a]菲-3 —基氧)_ι,3-伸苯基)雙(脲二基)雙(甲烷-1-基-1-亞基)雙(2,2-二甲基-1,3-二噁烷-4,6-二酮) 201240981 [化 69]Meldronic acid [1] (11.7 g, 81.0 mmol) and trimethyl orthoformate [2] (150 g) were placed in a 300 mL four-necked flask and heated to reflux for 1 hour. Thereafter, the compound [58] (15.0 g, 3 6.8 mmol) was added, followed by heating under reflux for 2 hours. After the completion of the reaction, the reaction solution was cooled to room temperature, and the precipitated solid was filtered, washed with hexane, and then dried to yield compound (59), 26.1 g (yield: 99%). 1 Η-NMR (4 0 0 Μ H z , DMSO-d6, 5 ppm): 11.36-11.27 (2H, m) > 1 0.3 8 ( 1 H, s) > 8.78 (2H, t) , 8. 10(lH,s) ' 7_88(2H,d) , 7.44(lH,dd) , 7.35(3H,d) , 2.52(2H,t), 1.78(2H,d),1.65(6H,s),1.60 (6H, s), 1.50-1.3 7(2H, m), 1.29-1.12 (14H, m), 0.99 (2H, q), 0.82 (3H, t). <Synthesis Example 2 9 > A compound represented by the following formula [61] 5,5'·(4-((33,83,98,1011,1311,143,1711)-10,13-dimethyl group) was synthesized. -17-((11)-5-methylhex-2-yl)-2,3,4,7,8,9,10,11,12,13,14,15,16,17-tetrahydrogen -1Η-cyclopentyl [a]phenanthrene-3-yloxy)_ι,3-phenylene)bis(ureidodiyl)bis(methane-1-yl-1-ylidene)bis(2,2-di Methyl-1,3-dioxane-4,6-dione) 201240981 [Chem. 69]
將梅爾德倫酸[l](4.lg ’ 29mmol)及原甲酸三甲酯 [2](50g)加入lOOmL四口燒瓶中’進行1小時加熱回流。 其後加入化合物[60](l〇.〇g,13mraol),再進行2小時加熱 回流。結束反應後,將反應溶液冷卻室溫,濾取所析出之 固體後,以己烷洗淨,再乾燥固體,得化合物[61] 9.9g(產 率 99%)。 <合成例3 0 > 合成下述式[63]所表示之(Ε)·2,4·雙((2,厂二甲基-4 6 —氧- I,3-二噁烷基二基)甲胺基)苯乙基二環氧 苯基)丙烯酸酯 [化 70]Meldronic acid [l] (4. lg '29 mmol) and trimethyl orthoformate [2] (50 g) were placed in a 100 mL four-necked flask, and heated under reflux for 1 hour. Thereafter, the compound [60] (l〇.〇g, 13mraol) was added, followed by heating under reflux for 2 hours. After the completion of the reaction, the reaction solution was cooled to room temperature, and the precipitated solid was collected by filtration, washed with hexane, and then dried to yield compound [61] 9.9 g (yield: 99%). <Synthesis Example 3 0 > Synthesis of (Ε)·2,4·bis ((2, dimethyl-methyl-6 6-oxo-I,3-dioxaalkyl) represented by the following formula [63] Methylamino)phenethyl epoxide phenyl) acrylate [70]
將梅爾德倫酸[l](7.3g,37mm〇l))3r & _甲酸三甲酯 -78- 201240981 [2](75g)加入200mL四口燒瓶中’進行1小時加熱回流。 其後加入化合物[62](7.46g,17mmol),再進行2小時加熱 回流。結束反應後,以蒸發器去除溶劑再乾燥,得化合物 [63]12.5g(產率 99%) 1 1.57(lH,d) ’ 8.04(1H,s), 4.34(2H,t)-2l(15H,m), 1 H-NMR(400MHz, DMS 0-d6, δ ppm): 1 1.2 9 ( 1 Η,s ),8.8 2 (1 Η,d d) ’ 8.2 3 (1 Η,d d ) ’ 7.57-7.46(5H,m),6.92(2H,d),6_35(lH,d), 3.99(2H,t) , 1.74- 1.65( 1 5H,m) · 1.43-1. 0.85(3H,t)。 <合成例3 1 > - 合成下述式[65]所表示之(E)-3,5-雙((2,2_二甲基_4 6 二氧-1,3-二噁烷-5-基亞基·)甲胺基)苯醯3-(4、(二環氧)萍 基)丙烯酸酯 [化 71]Meldronic acid [l] (7.3 g, 37 mm 〇l)) 3r & dimethyl formate -78-201240981 [2] (75 g) was placed in a 200 mL four-necked flask, and heated under reflux for 1 hour. Thereafter, the compound [62] (7.46 g, 17 mmol) was added, followed by heating under reflux for 2 hours. After completion of the reaction, the solvent was removed by an evaporator and dried to give compound [63] 12.5 g (yield: 99%) 1 1.57 (lH,d) ' 8.04 (1H, s), 4.34 (2H, t) -1l (15H , m), 1 H-NMR (400MHz, DMS 0-d6, δ ppm): 1 1.2 9 ( 1 Η, s ), 8.8 2 (1 Η, dd) ' 8.2 3 (1 Η, dd ) ' 7.57- 7.46 (5H, m), 6.92 (2H, d), 6_35 (lH, d), 3.99 (2H, t), 1.74- 1.65 (1 5H, m) · 1.43-1. 0.85 (3H, t). <Synthesis Example 3 1 > - Synthesis of (E)-3,5-bis((2,2-dimethyl- 4 6-dioxo-1,3-dioxane) represented by the following formula [65] -5-kiylidene)methylamino)phenylhydrazine 3-(4,(diepoxy)propyl) acrylate [71]
將梅爾德倫酸,33mmol)及原 — 、中酸三甲酯 [2](638)加入2〇〇1^四口燒瓶中,進行1小03£ 時加熱回流。 小時加熱 得化合物 其後加入化合物[64](6.3g,15mmol),再進行 回流。結束反應後’以蒸發器去除溶劑再乾燦 [65]10.7g(產率 99%)。 201240981 】H-NMR(400MHz,DMSO-d6, δ ppm) : 11.25(lH,d), 8.71(lH,d),7.93(lH,s),7.67-7.62(3H,m),7.48(2H,d), 6.91(2H,d),6.52(lH,d),5.19(2H,s),3.96(2H,t),3.62-3.60(2H,m) , 1.68 - 1 .6 3 ( 1 5 H,m) ’ 1.3 8 - 1.20( 1 5H,m), 0.8 1 (3H,t)。 〈合成例3 2 > 合成下述式[66]所表示之化合物5-(甲氧基伸甲基)_ 2,2-二甲基-1,3-二噁烷-4,6-二酮 [化 72]Mellonic acid, 33 mmol) and trimethyl methacrylate [2] (638) were placed in a 2 〇〇 1 ^ four-necked flask and heated to reflux at 1 pm. The compound was heated in an hour and then the compound [64] (6.3 g, 15 mmol) was added and then refluxed. After the end of the reaction, the solvent was removed by an evaporator and dried (65 g, 10.7 g, yield 99%). 201240981 】H-NMR (400MHz, DMSO-d6, δ ppm): 11.25 (lH, d), 8.71 (lH, d), 7.93 (lH, s), 7.67-7.62 (3H, m), 7.48 (2H, d), 6.91 (2H, d), 6.52 (lH, d), 5.19 (2H, s), 3.96 (2H, t), 3.62-3.60 (2H, m), 1.68 - 1. 6 3 ( 1 5 H , m) ' 1.3 8 - 1.20 ( 1 5H, m), 0.8 1 (3H, t). <Synthesis Example 3 2 > Compound 5-(methoxymethyl)- 2,2-dimethyl-1,3-dioxane-4,6-dione represented by the following formula [66] was synthesized. [化72]
將梅爾德倫酸[l](50.0g,347mmol)及原甲酸三甲酯 [2](184g)加入500mL四口燒瓶中,進行1小時加熱回 流。結束反應後,以蒸發器去除溶劑,再以己烷/四氫呋 喃混合溶劑將粗物再結晶,得化合物[6 6 ] 4 3.7 g (產率 6 8%) ,H-NMR(400MHz, CDC13, <5 ppm) : 8.16(lH,s)- 4.29(3H,s),1.73(6H,s)。 <合成例3 3 > 合成下述式[68]所表示之化合物5_((十二院胺基)伸甲 基)-2,2-—甲基-1,3-二嚼院-4,6-二酮 -80- 201240981 [化 73]Meldronic acid [l] (50.0 g, 347 mmol) and trimethyl orthoformate [2] (184 g) were placed in a 500 mL four-necked flask and heated to reflux for 1 hour. After the completion of the reaction, the solvent was removed by an evaporator, and the crude material was recrystallized from hexane/tetrahydrofuran solvent to give compound [6 6 ] 4 3.7 g (yield 6 8%), H-NMR (400 MHz, CDC13, <;5 ppm) : 8.16 (lH, s) - 4.29 (3H, s), 1.73 (6H, s). <Synthesis Example 3 3 > The compound represented by the following formula [68] was synthesized as a compound of the following formula [6] ((12-amino)methyl)-2,2-methyl-1,3-diche-4 ,6-diketone-80- 201240981 [化73]
CH(OMe)3 [2] ΟCH(OMe)3 [2] Ο
C12H2S H2N-C12H24 [67] [68] 將梅爾德倫酸[H(21_4g ’ 148mmol)及原甲酸三甲酯 [2](250g)加入200mL四口燒瓶中,進行1小時加熱回 流。其後加入十二烷基胺[67](25.0g,mmmol),再進行 2小時加熱回流。結束反應後’以蒸發器去除溶劑再乾 燥,得化合物[68]45.3g(產率99%)。 1 H-NMR(400MHz, DMSO-d6, δ ppm) : 9.64(lH,s) > 8.10(lH,d) > 3 .3 5-3.3 7(2H,m) » 1 . 5 4 - 1.4 8 ( 6 H, m) > 1.43- 1 .2 1 (20H,m),0.85(3H,t)。 〈合成例34〉 合成下述式[7〇]所表示之化.合物2,2·二甲基-5-((十八 烷胺基)伸甲基)-1,3-二噁烷-4,6-二酮 [化 74] 〇乂〇 .•C18H37 [1] H2N-C18H37 — CH(OMe)3 [70] [69] [2] 將梅爾德倫酸[l](14.7g,l〇2mmol)及原甲酸三甲酯 [2](250g)加入200mL四口燒瓶中,進行1小時加熱回 流。其後加入十八烷基胺[69](25.0g,93mmol),再進行2 -81 - 201240981 劑再乾燥 小時加熱回流。結束反應後,以蒸發器去除^ 得化合物[7〇]38.9g(產率99%)。 1H-NMR(400MHz, DMSO-d6 § OOm\ , ) · 9.67(1H,s), 8.10(lH,d) , 2.89-2.47(2H,m) , l 54 , 4'°-72(38H,m), 0.85(3H,t)。 <合成例3 5 > 合成下述式[72]所表示之化合物5,5,_(1,4_伸苯基雙 (甲烷-1-基-1-亞基))雙(2,2-二甲基-u-二噁烷_4,6_二酮 [化 75]C12H2S H2N-C12H24 [67] [68] Meldronic acid [H (21_4 g ' 148 mmol) and trimethyl orthoformate [2] (250 g) were placed in a 200 mL four-necked flask and heated to reflux for one hour. Thereafter, dodecylamine [67] (25.0 g, m mmol) was added, followed by heating under reflux for 2 hours. After the end of the reaction, the solvent was removed by an evaporator and dried to give 45.3 g (yield: 99%) of compound [68]. 1 H-NMR (400 MHz, DMSO-d6, δ ppm): 9.64 (lH, s) > 8.10 (lH,d) > 3 .3 5-3.3 7(2H,m) » 1 . 5 4 - 1.4 8 ( 6 H, m) > 1.43- 1 .2 1 (20H, m), 0.85 (3H, t). <Synthesis Example 34> A compound represented by the following formula [7〇] was synthesized, and 2,2·dimethyl-5-((octadecylamino)methyl)-1,3-dioxane was synthesized. -4,6-dione [化74] 〇乂〇.•C18H37 [1] H2N-C18H37 — CH(OMe)3 [70] [69] [2] Will Meldronic acid [l] (14.7g , l〇2 mmol) and trimethyl orthoformate [2] (250 g) were placed in a 200 mL four-necked flask, and heated under reflux for 1 hour. Thereafter, octadecylamine [69] (25.0 g, 93 mmol) was added, followed by 2 -81 - 201240981, followed by drying under reflux for heating. After completion of the reaction, the compound [7〇] was obtained by an evaporator to obtain 38.9 g (yield: 99%). 1H-NMR (400MHz, DMSO-d6 § OOm\ , ) · 9.67(1H,s), 8.10(lH,d) , 2.89-2.47(2H,m) , l 54 , 4'°-72(38H,m ), 0.85 (3H, t). <Synthesis Example 3 5 > A compound 5,5,-(1,4-phenylphenylbis(methane-1-yl-1-ylidene)) bis (2, represented by the following formula [72] was synthesized. 2-dimethyl-u-dioxane_4,6-dione [化75]
將對苯二甲醛[71](10.0g,75mmol)、梅爾德倫酸 [l](22.6g,157mmol)及吡啶(150g)加入 500mL 四 口燒瓶 中,室溫下攪拌一夜。其後以蒸發器去除吡啶,將殘渣溶 解於1,2-二氯乙烷/甲醇混合溶劑後,再度以蒸發器去除 溶劑進行結晶化。以2-丙醇將所得之固體再結晶,得化合 物[72]18.8g(產率 65%)。 1H-NMR(400MHz, DMSO-d6, <5 ppm) : 8.56(2H,s), 7.96(4H,s),1.74(12H,s)。 〈合成例3 6 > 合成下述式[74]所表示之化合物5,5’-(1,3-伸苯基雙 -82- 201240981 (甲烷-1-基-1-亞基))雙(2,2-甲基-1,3-二噁烷-4,6-二酮) [化 76]To a 500 mL four-necked flask, terephthalaldehyde [71] (10.0 g, 75 mmol), Meldronic acid [1] (22.6 g, 157 mmol) and pyridine (150 g) were placed and stirred at room temperature overnight. Thereafter, the pyridine was removed by an evaporator, and the residue was dissolved in a 1,2-dichloroethane/methanol mixed solvent, and the solvent was again removed by an evaporator to carry out crystallization. The obtained solid was recrystallized from 2-propanol to give 18.8 g (yield 65%) of compound [72]. 1H-NMR (400 MHz, DMSO-d6, <5 ppm): 8.56 (2H, s), 7.96 (4H, s), 1.74 (12H, s). <Synthesis Example 3 6 > A compound 5,5'-(1,3-phenylene bis-82-201240981 (methane-1-yl-1-ylidene)) double represented by the following formula [74] was synthesized. (2,2-methyl-1,3-dioxane-4,6-dione) [Chem. 76]
將間苯二甲醛[73](10.0g,75mmol)、梅爾德倫酸 [l](22.6g,157mmol)及吡啶(150g)加入 500mL 四 口燒瓶 中,室溫下攪拌一夜。其後以蒸發器去除吡啶,將殘渣溶 解於1,2-二氯乙烷/甲醇混合溶劑後,再度以蒸發器去除 溶劑進行結晶化。以2-丙醇將所得之固體再結晶,得化合 物[74]16.2g(產率 56%)。 1H-NMR(400MHz, DMSO-d6, (5 ppm) : 8 · 5 5 (2 Η,s ), 7.80-7.76(2H,m) ’ 7.52-7.42( 1 H,in) , 1.74(6H,s), 172(61^)。 〈合成例3 7 > 合成下述式[78]所表示之化合物反(4_(2,2_二甲基_Isophthalaldehyde [73] (10.0 g, 75 mmol), Meldronic acid [1] (22.6 g, 157 mmol) and pyridine (150 g) were placed in a 500 mL four-neck flask and stirred at room temperature overnight. Thereafter, the pyridine was removed by an evaporator, and the residue was dissolved in a 1,2-dichloroethane/methanol mixed solvent, and the solvent was again removed by an evaporator to carry out crystallization. The obtained solid was recrystallized from 2-propanol to give the compound [74] 16.2 g (yield: 56%). 1H-NMR (400MHz, DMSO-d6, (5 ppm): 8 · 5 5 (2 Η, s ), 7.80-7.76 (2H, m) ' 7.52-7.42 ( 1 H,in) , 1.74(6H,s ), 172 (61^). <Synthesis Example 3 7 > The compound represented by the following formula [78] was synthesized (4_(2,2-dimethyl)
-83- 201240981 [化 77]-83- 201240981 [化77]
將 4-羥基苯醛[76](35.7g,292mm〇l)、三乙基胺 (31.5g,311mmol)及四氫呋喃(150g)加入 1L 四口燒瓶 後,將內溫冷卻至1 〇 °C下。注意發熱的同時滴入1 , 3 , 5 -苯 三羰基三氯化物[75](25.0g,94mmol)之四氫呋喃(225g)溶 液,結束滴液後,室溫下再反應2小時。結束反應後,將 反應液注入純水(225 Og)中,濾取所析出之固體後,以己 烷洗淨,再乾燥固體,得化合物[77]48.0g(產率98%)。 將化合物[77](48.0g,92mmol)、梅爾德倫酸 [l](56.2g,289mmol)及吡啶(720g)加入 2L 四口燒瓶中, 室溫下攪拌一夜。其後以蒸發器去除吡啶,再以四氫呋喃 /己院混合溶劑將殘澄再結晶,得化合物[78]75.6g(產率 9 1%)。 δ ppm) : 8.57- 1 H-NMR(400MHz, DMSO-d6, -84 - 201240981 8.55(3H,m) , 8.38(3H,s) ’ 7.8 3 - 7.8 1 (6 Η, m) , 7.42- 7.39(6H,m),1.74(1 8H,s)。 〈合成例3 8 > 合成下述式[80]所表示之化合物5-(1-羥基伸苯基)_ 2,2-二甲基-1,3-二噁烷-4,6-二酮 [化 78]4-hydroxybenzaldehyde [76] (35.7 g, 292 mm 〇l), triethylamine (31.5 g, 311 mmol) and tetrahydrofuran (150 g) were added to a 1 L four-necked flask, and the internal temperature was cooled to 1 〇 ° C. . At the same time as the heat generation, a solution of 1,3,5-benzenetricarbonyltrichloride [75] (25.0 g, 94 mmol) in tetrahydrofuran (225 g) was added dropwise, and after completion of the dropwise addition, the mixture was further reacted at room temperature for 2 hours. After the completion of the reaction, the reaction solution was poured into pure water (225 Og), and the precipitated solid was filtered, washed with hexane, and then dried to yield 48.0 g (yield 98%) of compound [77]. Compound [77] (48.0 g, 92 mmol), Meldronic acid [1] (56.2 g, 289 mmol) and pyridine (720 g) were placed in a 2-L four-neck flask and stirred at room temperature overnight. Thereafter, the pyridine was removed by an evaporator, and the residue was recrystallized from a mixture of tetrahydrofuran / hexanes to obtain 75.6 g of compound [78] (yield: 91%). δ ppm) : 8.57- 1 H-NMR (400MHz, DMSO-d6, -84 - 201240981 8.55(3H,m) , 8.38(3H,s) ' 7.8 3 - 7.8 1 (6 Η, m) , 7.42- 7.39 (6H, m), 1.74 (1 8H, s). <Synthesis Example 3 8 > A compound represented by the following formula [80] 5-(1-hydroxyphenylphenyl)-2,2-dimethyl group was synthesized. -1,3-dioxane-4,6-dione [78]
將戊酸[79](25.0g,245mmol)' 二氯甲院(2〇〇g)加入 200L四口燒瓶中,再加入N,N-二甲基胺基吡啶(DMAP : 32.6g,267mmol)、二環己基碳二醯亞胺(DCC : 55.6g, 270mmol)、梅爾德倫酸[l](35.3g,245mmol),室溫下攪 拌一夜。結束反應後,使用矽藻工濾除固體成分,再以蒸 發器濃縮濾液。將粗生成物溶解於乙酸乙酯(3 00g)中,以 1M鹽酸洗淨。以硫酸鎂乾燥有機層,過濾餾去溶劑,得 化合物[80]53.6g(產率96%)。 1 H-NMR(400MHz, CDC13, <5 ppm) : 3.09-3.01 (2H,m) > 1.70(6H,s)> 1 .70- 1 .53 (2H,m) > 1.41(2H,q)> 0.92(3H,t) a 〈合成例3 9 > -85- 201240981 合成下述式[82]所表示之化合物5-(i -羥基四伸環癸 烯基)-2,2-二甲基-1,3-二噁烷-4,6-二酮 [化 79]Valeric acid [79] (25.0 g, 245 mmol)' of dichlorocarbyl (2 〇〇g) was placed in a 200 L four-necked flask, followed by the addition of N,N-dimethylaminopyridine (DMAP: 32.6 g, 267 mmol) Dicyclohexylcarbodiimide (DCC: 55.6 g, 270 mmol), Meldronic acid [l] (35.3 g, 245 mmol), stirred at room temperature overnight. After the reaction was completed, the solid component was filtered off using an algae, and the filtrate was concentrated by an evaporator. The crude product was dissolved in ethyl acetate (300 g) and washed with 1M hydrochloric acid. The organic layer was dried over magnesium sulfate, and the solvent was evaporated to ethylamine (yield: 1 H-NMR (400 MHz, CDC13, < 5 ppm) : 3.09 - 3.01 (2H, m) > 1.70 (6H, s) > 1.70 - 1.53 (2H, m) > 1.41 (2H , q) > 0.92 (3H, t) a <Synthesis Example 3 9 > -85- 201240981 The compound 5-(i-hydroxytetracyclohexenyl)-2 represented by the following formula [82] is synthesized, 2-dimethyl-1,3-dioxane-4,6-dione [Chem. 79]
將梅爾德倫酸[l](25.0g,l73mmol)、吡啶(27.4g, 346mmol)、二氯甲烷(250g)加入200L四口燒瓶中,氮氣 下將溶液冷卻至〇°C。注意發熱的同時滴入肉豆蔻酸氯化 物[8 1](42.7g,173mmol),結束滴液後,將反應液返回室 溫,再攪拌1小時。結束反應後依序以1Μ鹽酸、純水、 飽和食鹽水洗淨有機層,再以硫酸鎂乾燥。過濾該溶液餾 去溶劑後,進行管柱精製(己烷/乙酸乙酯),得化合物 [82]29.1g(產率 66%)。 1 H-NMR(400MHz, CDC13, δ ppm) : 3.09- 3.04(2H,m) , 1.72(6H,s) , 1 · 7 2 - 1 _ 6 5 ( 2 H,m ) , 1.46- 1.34(2H,m),1.26(18H,s),〇.88(3H,t)。 〈合成例40 > 合成下述式[8 4]所表示之化合物5-(3,5-二甲氧基苯 基)-2,2-二甲基-1,3-二噁烷-4,6-二酮 -86- 201240981 [化 80]Meldronic acid [1] (25.0 g, l73 mmol), pyridine (27.4 g, 346 mmol), dichloromethane (250 g) was placed in a 200 L four-neck flask, and the solution was cooled to 〇 ° C under nitrogen. At the same time as the heat was added, myristic acid chloride [8 1] (42.7 g, 173 mmol) was added dropwise, and after the completion of the dropping, the reaction solution was returned to room temperature and stirred for further 1 hour. After the completion of the reaction, the organic layer was washed successively with 1 mL of hydrochloric acid, purified water and brine, and dried over magnesium sulfate. After the solution was filtered to remove the solvent, the residue was purified (hexane/ethyl acetate) to afford compound (2) (yield: 66%). 1 H-NMR (400MHz, CDC13, δ ppm): 3.09- 3.04(2H,m) , 1.72(6H,s) , 1 · 7 2 - 1 _ 6 5 ( 2 H,m ) , 1.46- 1.34(2H , m), 1.26 (18H, s), 〇.88 (3H, t). <Synthesis Example 40 > The compound 5-(3,5-dimethoxyphenyl)-2,2-dimethyl-1,3-dioxane-4 represented by the following formula [8 4] was synthesized. ,6-diketone-86- 201240981 [化80]
將梅爾德倫酸[l](5g,28.9mmol)、3,5-二甲氧基苯醛 (4.70g,28.3mmol)、乙醇(50g)加入 200L 四口 燒瓶中,再 加入吡啶鎗乙酸酯(〇.42g,2.89mmol)攪拌30分鐘。 ΟMeldronic acid [l] (5g, 28.9mmol), 3,5-dimethoxybenzaldehyde (4.70g, 28.3mmol), ethanol (50g) was added to a 200L four-necked flask, followed by the addition of pyridine gun The acid ester (〇.42 g, 2.89 mmol) was stirred for 30 minutes. Ο
V OMe [83] 其後將反應溶液冷卻至〇°C,分批加入少許氰基氫化 硼鈉(2.7g,43.4mmol)後,將反應溫度返回室溫。結束反 應後,注意所發生之氣體的同時,以1 0%鹽酸急冷,更後 餾去乙醇。將粗物再度懸浮於10%鹽酸,以二氯甲烷(8 0g) 進行3次萃取。總和有機層後,以硫酸鎂乾燥,再過濾餾 去溶劑,以甲醇將所得之粗物再結晶,得化合物 [84]4.7g(產率 55%) » !H-NMR(400MHz, CDC13, δ ppm) : 6.44(2H,d) > 6.29(lH,t) > 3.73(lH,t) > 3.36(2H,d) > 1.69(3H,s), 1 .5 1 (3H,s)。 <合成例4 1 > 合成下述式[86]所表示之化合物5-(3,5-二甲氧基苯)-2,2-二甲基- 5-(吡啶-4-甲基)-1,3-二噁烷-4,6-二酮V OMe [83] Thereafter, the reaction solution was cooled to 〇 ° C, and a small amount of sodium cyanoborohydride (2.7 g, 43.4 mmol) was added portionwise, and the reaction temperature was returned to room temperature. After the reaction was completed, attention was paid to the gas generated, and the mixture was quenched with 10% hydrochloric acid, and then ethanol was distilled off. The crude material was resuspended in 10% hydrochloric acid and extracted three times with dichloromethane (80 g). After the organic layer was combined, the organic layer was dried over magnesium sulfate, and then filtered, and the solvent was evaporated to give crystals of crystals to crystals to crystals to afford crystals of compound [84] 4.7 g (yield 55%) »H-NMR (400 MHz, CDC13, δ Ppm): 6.44(2H,d) > 6.29(lH,t) > 3.73(lH,t) > 3.36(2H,d) > 1.69(3H,s), 1. .5 1 (3H,s ). <Synthesis Example 4 1 > A compound represented by the following formula [86] 5-(3,5-dimethoxybenzene)-2,2-dimethyl-5-(pyridine-4-methyl) )-1,3-dioxane-4,6-dione
S -87- 201240981 [化 81] OMeS -87- 201240981 [化 81] OMe
將化合物[84](4.70g,1 6_〇mmol)、碳酸鉀(3.3 1 g, 24.0mmol)、二甲基甲醯胺(DMF)(50g)加入200L四口燒瓶 中,再滴入4-(溴甲基)吡啶溴化氫酸鹽(4.45g,17.6mmol) 之DMF(lOg)溶液。結束反應後,將反應溶液注入純水 (600g)中,以乙酸乙酯(150g)進行3次萃取。其次總和有 機層,以飽和碳酸氫鈉、飽和食鹽水洗淨後,以硫酸鎂乾 燥有機層。其後過濾溶液餾去溶劑,以甲醇將粗物再結 晶,得化合物[86]4.4g(產率72%)。 1H-NMR(400MHz, CDC13, 6 ppm) : 8.51(2H,d), 7.10(2H,d),6.72-6.66(3H,m),3.82(3H,s),3.80(3H,s), 3,39(2H,s),0.73(3H,s),0.68(3H,s)。 〈合成例42〉 合成下述式[88]所表示之化合物苯基3_(2,2-二甲基-4,6-二氧-1,3-二噁烷-5-基)丙酸酯 -88- 201240981 [化 82] cr〇l [87]Compound [84] (4.70 g, 16 6 mmol), potassium carbonate (3.31 g, 24.0 mmol), dimethylformamide (DMF) (50 g) were placed in a 200 L four-necked flask, and then dropped into 4 A solution of -(bromomethyl)pyridine hydrobromide (4.45 g, 17.6 mmol) in DMF (10 g). After the reaction was completed, the reaction solution was poured into pure water (600 g), and extracted three times with ethyl acetate (150 g). Next, the organic layer was washed with saturated sodium hydrogencarbonate and saturated brine, and the organic layer was dried over magnesium sulfate. Thereafter, the solvent was evaporated to remove the solvent, and the crude material was recrystallized from methanol to give 4.4 g (yield: 72%). 1H-NMR (400MHz, CDC13, 6 ppm): 8.51 (2H, d), 7.10 (2H, d), 6.72-6.66 (3H, m), 3.82 (3H, s), 3.80 (3H, s), 3 , 39 (2H, s), 0.73 (3H, s), 0.68 (3H, s). <Synthesis Example 42> The compound phenyl 3_(2,2-dimethyl-4,6-dioxo-1,3-dioxan-5-yl)propionate represented by the following formula [88] was synthesized. -88- 201240981 [化82] cr〇l [87]
將梅爾德倫酸[l](15.0g,l〇4mmol)、乙膳(150g)加入 200L四口燒瓶中’再加入碳酸鉀(i4.3g,104mmol)、节 基三乙基銨氯化物(23.9g,104mmol),室溫下攪拌15分 鐘。其後加入化合物[87](25.3g,156mmol),60°C下加熱 攪拌。結束反應後’餾去溶劑,再將粗物溶解於乙酸乙酯 (1 50 g),以10%硫酸氫鉀洗淨3次後,以硫酸鎂乾燥有機 層。過濾溶液餾去溶劑後,對所得之粗物進行管柱精製 (Si〇2:己院/乙酸乙酯),得化合物[88]28.4g(產率89%)。 1 H-NMR(400MHz, CDC13, δ ppm) : 7.3 8 - 7.2 9 (5 Η, m) ’ 5.08(2H,s),3.89(lH,t),2.67(2H,t)> 2.44-2.34(2H,m) ,1.73(3H,s),1.72(3H,s)。 〈合成例43 > 合成下述式[90]所表示之化合物(s)_正-丁基2-(正-丁 氧锻基胺基)-5-(2,2-—甲基-4,6-二氧-1,3_二噁烷-5_基)丙 酸酯 产 -89- 201240981 [化 83] COzt-BuMeldronic acid [l] (15.0 g, l 4 mmol), and B (150 g) were added to a 200 L four-necked flask. 'Addition of potassium carbonate (i4.3 g, 104 mmol), benzyl triethylammonium chloride (23.9 g, 104 mmol), stirred at room temperature for 15 minutes. Thereafter, the compound [87] (25.3 g, 156 mmol) was added, and the mixture was stirred under heating at 60 °C. After the completion of the reaction, the solvent was evaporated. The crude material was dissolved in ethyl acetate (1 50 g), and washed three times with 10% potassium hydrogen sulfate, and the organic layer was dried over magnesium sulfate. After the solvent was evaporated to remove the solvent, the obtained crude material was purified by column column (Si.sub.2: hexanes/ethyl acetate) to give the compound [88] 28.4 g (yield 89%). 1 H-NMR (400 MHz, CDC13, δ ppm) : 7.3 8 - 7.2 9 (5 Η, m) ' 5.08 (2H, s), 3.89 (lH, t), 2.67 (2H, t) > 2.44-2.34 (2H,m), 1.73 (3H, s), 1.72 (3H, s). <Synthesis Example 43 > Compound (s)-n-butyl 2-(n-butoxy-indenylamino)-5-(2,2-methyl-4) represented by the following formula [90] was synthesized. ,6-dioxo-1,3-dioxan-5-yl)propionate production-89- 201240981 [Chem. 83] COzt-Bu
1) DCC, DMAP, CH2CI2 2) NaBH4, AcOH, CH2CI21) DCC, DMAP, CH2CI2 2) NaBH4, AcOH, CH2CI2
s^C〇2t-BuNHBoc 將梅爾德倫酸[l](15_0g,104mmol)、DMAP(18.4g, 151mmol)、化合物[89](28.4g,94mmol)、二氯甲烷(i〇〇g) 加入200L四口燒瓶中,將反應液冷卻至〇 °C後,加入 DCC(22.5g,109mmol)之二氯甲烷(50g)溶液,攪拌一夜。 結束反應後濾除固體’以1 0%硫酸氫鉀洗淨濾液3次後, 以飽和食鹽水洗淨,再以硫酸鎂乾燥有機層,其次加入乙 酸(50mL)使溶液爲酸性後,冷卻至〇°C,再分批加入少許 氫化硼鈉(9.0g,236mmol) ’ 0°C下持續攪拌。結束反應 後,以飽和食鹽水、純水洗淨,再以硫酸鎂乾燥有機層, 過濾溶液餾去溶劑,得粗物。對該粗物進行管柱精製 (Si02:己烷/乙酸乙酯),得化合物[90]34.1g(產率79%)。 1H-NMR(400MHz, CDC13, δ ppm) : 5.04(lH,d), 4.20-3.08(lH,m),3.52(lH,t), 2.20-2.00(2H,m) , 1.89- 1.40(4H,m) ’ 1.77(3H,m) , 1.73(3H,s) , 1.43(9H,s), 1 ‘41 (9H,s)。 〈合成例44 > 合成下述式[92]所表示之化合物5-(雙(甲基硫基)伸甲 基-2,2-二甲基-1,3-二噁烷-4,6-二酮 -90 - 201240981 [化 84]s^C〇2t-BuNHBoc Will Meldronic acid [l] (15_0g, 104mmol), DMAP (18.4g, 151mmol), compound [89] (28.4g, 94mmol), dichloromethane (i〇〇g) After adding to a 200 L four-necked flask, the reaction mixture was cooled to 〇°C, and a solution of DCC (22.5 g, 109 mmol) in dichloromethane (50 g) was added and stirred overnight. After completion of the reaction, the solid was filtered off. The filtrate was washed three times with 10% potassium hydrogen sulfate, washed with saturated brine, dried over magnesium sulfate, and then acetic acid (50 mL) was added to acid. At 〇 ° C, a little sodium borohydride (9.0 g, 236 mmol) was added in portions and stirring was continued at 0 °C. After completion of the reaction, the mixture was washed with saturated brine and purified water, and the organic layer was dried over magnesium sulfate. The crude product was purified by column chromatography (SiO 2 : hexane / ethyl acetate) to afford compound (s) (3) g (yield: 79%). 1H-NMR (400MHz, CDC13, δ ppm): 5.04(lH,d), 4.20-3.08(lH,m), 3.52(lH,t), 2.20-2.00(2H,m), 1.89- 1.40 (4H, m) ' 1.77(3H,m) , 1.73(3H,s) , 1.43(9H,s), 1 '41 (9H,s). <Synthesis Example 44 > A compound represented by the following formula [92] 5-(bis(methylthio)methyl-2,2-dimethyl-1,3-dioxane-4,6 was synthesized. -dione-90 - 201240981 [Chem. 84]
Et3N7 CSz, Mel, DMSOEt3N7 CSz, Mel, DMSO
MeS 八 SMe [92] 將梅爾德倫酸[l](40.9g,284mmol)、三乙基胺 (57.5g,568mmol)、D M S O ( 1 4 0 g)力卩入 200L 四口 燒瓶中’ 再加入二硫化碳(21.6g,284mmol),室溫下攪拌1小時。 其後將反應液冰冷,再緩緩加入碘化甲酯(80.6g, 5 6 8mmol),室溫下持續進行反應。結束反應後,將反應液 注入冰水(2 5 0g)中,濾取所析出之固體後,以己烷洗淨, 得化合物[92]36.7g(產率52%)。 1H-NMR(400MHz, CDC13, δ ppm) : 2.57(6H,s) » 1 .53(6H,s)。 〈合成例45 > 合成下述式[94]所表示之化合物2,2-二甲基- 5-(甲基 硫基(新戊基胺基)-伸甲基)-1,3-二噁烷-4,6-二酮 [化 85]MeS 八SMe [92] Meldronic acid [l] (40.9g, 284mmol), triethylamine (57.5g, 568mmol), DMSO (140g) into a 200L four-necked flask Carbon disulfide (21.6 g, 284 mmol) was added and stirred at room temperature for 1 hour. Thereafter, the reaction liquid was ice-cooled, and methyl iodide (80.6 g, 5 6 8 mmol) was gradually added thereto, and the reaction was continued at room temperature. After the completion of the reaction, the reaction mixture was poured into ice water (250 g), and the precipitated solid was filtered, and then washed with hexane to give 36.7 g (yield 52%) of compound [92]. 1H-NMR (400 MHz, CDC13, δ ppm): 2.57 (6H, s): 1.53 (6H, s). <Synthesis Example 45 > A compound represented by the following formula [94] was synthesized, 2,2-dimethyl-5-(methylthio(neopentylamino)-methyl)-1,3-di Osterane-4,6-dione [Chem. 85]
將化合物[92](18.6g,75mmol)、2,2-二甲基丙基胺 (6.53g,75mmol)、THF(180g)加入 200mL 四口燒瓶中, -91 - 201240981 室溫下進行攪拌。結束反應後,以蒸發器濃縮至溶劑約爲 一半,再加入二乙基醚(lOOg),濾取所析出之固體後,以 THF/二乙基醚混合溶劑再結晶,得化合物[94]16.9g(產率 7 7%)= 1H-NMR(400MHz, CDC13, δ ppm) : 3.1 1 (2H,d) > 2.58(3H,s),1 .73(6H,s)。 〈合成例4 6 > 合成下述式[95]所表示之化合物2,2-二甲基- 5-(甲基 硫基(新戊基胺基)-伸甲基)-1,3-二噁烷-4,6-二酮 [化 86]The compound [92] (18.6 g, 75 mmol), 2,2-dimethylpropylamine (6.53 g, 75 mmol) and THF (180 g) were placed in a 200 mL four-neck flask, and stirred at -91 - 201240981 at room temperature. After completion of the reaction, the mixture was concentrated to a solvent by an evaporator to a solvent, and then diethyl ether (100 g) was added thereto, and the precipitated solid was filtered, and then recrystallized from a solvent mixture of THF/diethyl ether to give compound [94] 16.9. g (yield 7 7%) = 1H-NMR (400 MHz, CDC13, δ ppm): 3.1 1 (2H, d) > 2.58 (3H, s), 1.73 (6H, s). <Synthesis Example 4 6 > A compound represented by the following formula [95] was synthesized, 2,2-dimethyl-5-(methylthio(neopentylamino)-methyl)-1,3- Dioxane-4,6-dione [Chem. 86]
將化合物[92](2.428,1〇111111〇1)、2,2-二甲基丙基胺 (2.62g,30mmol)、乙醇(60g)加入200mL四口燒瓶中,進 行加熱回流。結束反應後,以蒸發器濃縮至溶劑約爲一 半,再加入二乙基醚(5〇g),冷卻至0°C析出固體後,濾取 固體,再以THF/二乙基醚混合溶劑再結晶,得化合物 [95]l_62g(產率 50%)。 1H-NMR(400MHzJ CDC13, δ ppm) : 9.83(2H,s), 3.10(2H,d),l_61(6H,s),0_96(18H,s)。 〈合成例47 > -92- 201240981 合成下述式[97]所表示之化合物5,5’-(1,8-二羥基辛 烷-1,8-二亞基)-雙(2,2-二甲基-1,3-二噁烷-4,6-二酮) [化 87]The compound [92] (2.428, 1〇111111〇1), 2,2-dimethylpropylamine (2.62 g, 30 mmol), and ethanol (60 g) were placed in a 200 mL four-necked flask and heated to reflux. After the reaction was completed, it was concentrated by an evaporator to about half of the solvent, and diethyl ether (5 〇g) was added thereto. After cooling to 0 ° C to precipitate a solid, the solid was collected by filtration, and then the solvent was mixed with THF / diethyl ether. Crystallization gave Compound [95] 1-62 g (yield 50%). 1H-NMR (400 MHz J CDC13, δ ppm): 9.83 (2H, s), 3.10 (2H, d), l_61 (6H, s), 0-96 (18H, s). <Synthesis Example 47 > -92- 201240981 The compound 5,5'-(1,8-dihydroxyoctane-1,8-diphenyl)-bis (2,2) represented by the following formula [97] was synthesized. - dimethyl-1,3-dioxane-4,6-dione) [Chem. 87]
將梅爾德倫酸 H](14.7g,1 lmmol)、吡啶(19.87g, 0.26mmol)、二氯甲烷(200g)加入 200mL四口燒瓶中,將 反應溶液冷卻至〇°c後,注息發熱的同時緩緩加入己烷二 羧基二氯化物[96](ll_98g,51mmol)之二氯甲烷(50g),23 °C下持續反應。結束反應後,使用1 〇%鹽酸水溶液使溶液 爲酸性,再以蒸發器餾去溶劑。濾取固體後以純水洗淨, 再以二氯甲烷/二乙基醆之混合溶劑再結晶,得化合物 [97]16.6g(產率 78%)。 1H-NMR(400MHz, CDC13, δ ppm) : 15.30(2H,s), 3.09(4H,t),1.73(12H,s),1.66(4H,m),1.47(4H,m)。 〈合成例4 8 > 合成下述式[99]所表示之化合物 5,5’-(((6,7,9,10,17,18,20,21-八氫基二苯[15,1〇[1,4,7,10,13,16] 六氧雜環十八烷-2,14-二基)雙(脲二基)雙(甲基亞基)雙 (2,2-二甲基-1,3-二噁烷-4,6-二酮) a -93- 201240981 [化 88]Mellonic acid H] (14.7 g, 1 lmmol), pyridine (19.87 g, 0.26 mmol), dichloromethane (200 g) was placed in a 200 mL four-necked flask, and the reaction solution was cooled to 〇 °c, and the interest was poured. While heating, hexane dicarboxy dichloride [96] (ll_98 g, 51 mmol) in dichloromethane (50 g) was gradually added, and the reaction was continued at 23 °C. After the completion of the reaction, the solution was made acidic using a 1% aqueous solution of hydrochloric acid, and the solvent was distilled off by an evaporator. The solid was collected by filtration, washed with purified water, and then recrystallized from methylene chloride/diethyl hydrazide to give compound [97] 16.6 g (yield 78%). 1H-NMR (400MHz, CDC13, δ ppm): 15.30 (2H, s), 3.09 (4H, t), 1.73 (12H, s), 1.66 (4H, m), 1.47 (4H, m). <Synthesis Example 4 8 > A compound 5,5'-(((6,7,9,10,17,18,20,21-octahydrobiphenyl) [15, represented by the following formula [99] was synthesized. 1〇[1,4,7,10,13,16] hexaoxacyclooctadecane-2,14-diyl)bis(ureidodiyl)bis(methylphenyl)bis(2,2-di Methyl-1,3-dioxane-4,6-dione) a -93- 201240981 [化88]
[98][98]
CH(OMe)3 [2] ΟCH(OMe)3 [2] Ο
J〇t o o o o [99]J〇t o o o o [99]
O 〇W 將梅爾德倫酸[1] (4.87g,33.8 mmol)及原甲酸三甲酯 [2](60g)加入200mL四口燒瓶中,進行1小時加熱回流。 其後加入化合物[98](6.00g,15.4mmol),再進行2小時加 熱回流。結束反應後,以蒸發器去除溶劑再乾燥,得化合 物[99] 1 0.4g(產率 97%)。 1H-NMR(400MHz, DMS0-d6, <5 ppm): 1 1 .2 1 (2H,d) > 8.54(2H,d) · 7.26(2H,d) > 7.05(2H,dd) > 6.96(2H,d) > 4.15-4.06(8H,m) > 3.8 8 - 3.8 0( 6 H,m ),3.17(2H,d),1.67(1 2H,s) 〈合成例49 > 合成下述式[101]所表示之 5,5’-((1,4,10,13-四酮基· 7,16-二氮雜環十八烷-7,16-二基)雙(甲基-亞基))雙(2,2-二 甲基-1 ,3-二噁烷-4,6-二酮) [化 89]O 〇W Meldronic acid [1] (4.87 g, 33.8 mmol) and trimethyl orthoformate [2] (60 g) were placed in a 200 mL four-necked flask, and heated under reflux for 1 hour. Thereafter, the compound [98] (6.00 g, 15.4 mmol) was added, followed by heating under reflux for 2 hours. After the completion of the reaction, the solvent was removed by an evaporator and dried to give compound [99] 1 0.4 g (yield: 97%). 1H-NMR (400MHz, DMS0-d6, <5 ppm): 1 1 .2 1 (2H,d) > 8.54(2H,d) · 7.26(2H,d) > 7.05(2H,dd) > 6.96(2H,d) > 4.15-4.06(8H,m) > 3.8 8 - 3.8 0( 6 H,m ), 3.17(2H,d),1.67(1 2H,s) <Synthesis Example 49 > Synthesis of 5,5'-((1,4,10,13-tetraketo-7,16-diazacyclooctadecane-7,16-diyl) double represented by the following formula [101] (methyl-subunit)) bis(2,2-dimethyl-1,3-dioxane-4,6-dione) [Chem. 89]
201240981 將梅爾德倫酸[l](24.17g,167.7mmol)及原甲酸三甲 酯[2](2〇〇g)加入500mL四口燒瓶中,進行1小時加熱回 流。其後加入化合物[l〇〇](20.00g,76.2mmol),再進行2 小時加熱回流。結束反應後,以蒸發器去除溶劑再乾燥, 得化合物[l〇l]43.2g(產率100%)。 <合成例5 0 > 合成下述式[1〇3]所表示之5,5’-(((((氧基雙(乙烷-2,1- 二基))雙(氧))雙(4,1-伸苯基))雙(脲二基))雙(伸甲基-亞基)) 雙(2,2-二甲基-1,3-二噁烷-4,6-二酮) [化 90] [102]201240981 Meldronic acid [l] (24.17 g, 167.7 mmol) and trimethyl orthoformate [2] (2 〇〇g) were placed in a 500 mL four-necked flask, and heated to reflux for 1 hour. Thereafter, the compound [10] (20.00 g, 76.2 mmol) was added, and the mixture was heated under reflux for 2 hours. After the completion of the reaction, the solvent was removed by an evaporator and dried to give 43.2 g (yield: 100%) of Compound. <Synthesis Example 5 0 > 5,5'-(((((((((((((((())))))) Bis(4,1-extended phenyl))bis(ureidodiyl))bis(methyl-subunit))bis(2,2-dimethyl-1,3-dioxane-4,6- Diketone) [化90] [102]
將梅爾德倫酸[1](22.008,153111111〇1)及原甲酸三甲酯 [2](200g)加入 5 00mL四口燒瓶中,進行1小時加熱回 流。其後加入化合物[l〇2](20.00g,69.4mmol),再進行2 小時加熱回流。結束反應後,以蒸發器去除溶劑再乾燥, 得化合物[l〇3]40.2g(產率97%)。 *Η-ΝΜΚ(400ΜΗζ, DMSO-d6, δ ppm) : 11.23 (2H,d) > 8.44(2H,d) > 7.5 0-7.48(2H,m) > 7.0 1 - 6.9 9 (4 H , m) > 4.42- 4.12(4H,m),3.89-3.78(4H,m),1.67(12H,s)» S. <合成例5 1 > -95- 201240981 合成下述式[105]所表示之2-(甲基環氧基)乙烯基 3,5-雙(((2,2-二甲基- 4,6-二氧-1,3-二噁烷-5-亞基)甲基)胺 基)苯甲酸酯 [化 91]Meldronic acid [1] (22.008, 153111111〇1) and trimethyl orthoformate [2] (200 g) were placed in a 500 mL four-necked flask and heated to reflux for 1 hour. Thereafter, the compound [10〇2] (20.00 g, 69.4 mmol) was added, and the mixture was heated under reflux for 2 hours. After the completion of the reaction, the solvent was removed by an evaporator and dried to give 40.2 g (yield: 97%) of compound [3]. *Η-ΝΜΚ(400ΜΗζ, DMSO-d6, δ ppm) : 11.23 (2H,d) > 8.44(2H,d) > 7.5 0-7.48(2H,m) > 7.0 1 - 6.9 9 (4 H , m) > 4.42- 4.12 (4H, m), 3.89-3.78 (4H, m), 1.67 (12H, s)» S. <Synthesis Example 5 1 > -95- 201240981 The following formula [105] 2-(Methylcyclooxy)vinyl 3,5-bis(((2,2-dimethyl- 4,6-dioxo-1,3-dioxan-5-ylidene) )methyl)amino)benzoate [Chem. 91]
將梅爾德倫酸[1](2 4.188,168111111〇1)及原甲酸三甲酯 [2](300g)'加入500mL四口燒瓶中,進行1小時加熱回 流。其後加入化合物[104](20.0(^,76.3111111〇1),再進行 2 小時加熱回流。結束反應後加入己烷,過濾後乾燥,得化 合物[105]43.7g(產率 100%)。 1H-NMR(400MHz, CDC13, δ ppm) : 11.36(2H,d), 8,72(2H,d),7.80(2H,d),7_37(lH,t),6.17(lH,t),5.64-5.62( 1 H,m) > 4.6 7 - 4.6 5 (2 H,m) , 4.5 5 - 4 · 5 2 (2 H,m ), 3.79(lH,s),3_47(lH,s),3.34(2H,s),1 · 9 7 - 1 . 9 6 ( 3 H,m ), 1.78-1.76(13H,m) 0 〈合成例52 > 合成下述式[l〇7]所表示之(E)-2,4-雙(((2,2-二甲基-4,6-二氧-1,3-二噁烷-5-亞基)甲基)胺基)苯乙基3-(4,-丁氧 基雙苯基]-4-基)丙酸酯 -96- 201240981 [化 92]Meldronic acid [1] (2 4.188, 168111111〇1) and trimethyl orthoformate [2] (300 g) were placed in a 500 mL four-necked flask and heated to reflux for 1 hour. Thereafter, the compound [104] (20.0 (^, 76.3111111〇1) was added, followed by heating under reflux for 2 hours. After completion of the reaction, hexane was added, and the mixture was filtered and dried to give compound [105] 43.7 g (yield 100%). - NMR (400 MHz, CDC13, δ ppm): 11.36 (2H, d), 8,72 (2H, d), 7.80 (2H, d), 7_37 (lH, t), 6.17 (lH, t), 5.64 5.62( 1 H,m) > 4.6 7 - 4.6 5 (2 H,m) , 4.5 5 - 4 · 5 2 (2 H,m ), 3.79(lH,s),3_47(lH,s),3.34 (2H, s), 1 · 9 7 - 1 . 9 6 ( 3 H, m ), 1.78-1.76 (13H, m) 0 <Synthesis Example 52 > Synthesis The following formula [l〇7] is represented ( E)-2,4-bis((2,2-dimethyl-4,6-dioxo-1,3-dioxan-5-ylidene)methyl)amino)phenethyl 3- (4,-butoxybisphenyl]-4-yl)propionate-96- 201240981 [Chem. 92]
[106】 [2][106] [2]
將梅爾德倫酸[l](4.00g,20.4mmol)及原甲酸三甲酯 [2](40g)加入100mL四口燒瓶中,進行1小時加熱回流》 其後加入化合物[1 06] (4. OOg,9.3 mmol),再進行2小時加 熱回流。結束反應後,以蒸發器去除溶劑再乾燥’得化合 物[107]6.8g(產率 99%)。 1H-NMR(400MHz, CDC13, δ ppm) : 11.59(lH,d) > ll_29(lH,d) , 8.84(lH,d) , 8.78(lH,d),8.23(lH,s), 8.04(1H,s),7.70-7.64(7H,m),7.62(lH,d),7.48(2H,s), 7.03(2H,d),6.53(lH,d),4.41(2H,t),4.01(2H,t)’3.66-3.63(6H,m) , 1.68-1 .57(1 OH,m) , 1 .56(1 H,s) > 1.44- 1 .39(1 H,m),0.94(3H,t)。 〈合成例5 3 > 合成下述式[1〇9]所表示之0)-2,4-雙(((2,2-二甲基-1,3-二噁烷-5-亞基)甲基)胺基)苯乙基3-(4-環己基苯基)丙 201240981 [化 93]Meldronic acid [l] (4.00 g, 20.4 mmol) and trimethyl orthoformate [2] (40 g) were placed in a 100 mL four-necked flask and heated to reflux for 1 hour, followed by the addition of the compound [1 06] ( 4. OOg, 9.3 mmol), followed by heating for 2 hours. After the completion of the reaction, the solvent was removed by an evaporator and dried to give a compound [107] 6.8 g (yield: 99%). 1H-NMR (400MHz, CDC13, δ ppm): 11.59(lH,d) > ll_29(lH,d), 8.84(lH,d), 8.78(lH,d), 8.23(lH,s), 8.04( 1H, s), 7.70-7.64 (7H, m), 7.62 (lH, d), 7.48 (2H, s), 7.03 (2H, d), 6.53 (lH, d), 4.41 (2H, t), 4.01 (2H,t)'3.66-3.63(6H,m) , 1.68-1 .57(1 OH,m) , 1.56(1 H,s) > 1.44- 1 .39(1 H,m), 0.94 (3H, t). <Synthesis Example 5 3 > 0)-2,4-bis((2,2-dimethyl-1,3-dioxan-5-ylidene) represented by the following formula [1〇9] was synthesized. )methyl)amino)phenethyl 3-(4-cyclohexylphenyl)propene 201240981 [Chem. 93]
將梅爾德倫酸[l](4.35g,30mmol)及原甲酸三甲酯 [2](50g)加入200mL四口燒瓶中,進行1小時加熱回流。 其後加入化合物[108](5.00g,14mmol),再進行2小時加 熱回流。結束反應後,以蒸發器去除溶劑再乾燥,得化合 物[109]9.63g(產率 99%)。 1H-NMR(400MHz, CDC13, <5 ppm) : 1 1.63(lH,d) » 1 1 .30(lH,d) , 8.64-8_63(2H,m) , 7_60(lH,d) , 7.42- 7.39(3H,m) , 7 · 2 9 - 7.2 7 (2 H,m) , 7.2 1 - 7.1 5 ( 3 H , m ), 6‘37(lH,d),4.49-4.46(2H,m),3.33-3.11(2H,m),2.59-2.42(lH,m),1.86-l_45(2H,m),1.76-1.70(14H,m),1.42-1.20(6H,m)。 <合成例54〉 合成下述式[m]所表示之(E)-2,4-雙(((2,2-二甲基-4,6-二氫-1,3-二噁烷-5-亞基)甲基)胺基)苯乙基3-(4-([反-1,1 雙(環己基)]-4-基)苯基)丙酸酯 -98 - 201240981 [化 94]Meldronic acid [l] (4.35 g, 30 mmol) and trimethyl orthoformate [2] (50 g) were placed in a 200 mL four-necked flask, and heated under reflux for 1 hour. Thereafter, the compound [108] (5.00 g, 14 mmol) was added, followed by heating under reflux for 2 hours. After the reaction was completed, the solvent was removed by an evaporator and dried to give the compound [109], 9.63 g (yield: 99%). 1H-NMR (400MHz, CDC13, <5 ppm) : 1 1.63 (lH,d) » 1 1 .30 (lH,d) , 8.64-8_63(2H,m) , 7_60(lH,d) , 7.42- 7.39(3H,m) , 7 · 2 9 - 7.2 7 (2 H,m) , 7.2 1 - 7.1 5 ( 3 H , m ), 6'37(lH,d),4.49-4.46(2H,m) , 3.33 - 3.11 (2H, m), 2.59 - 2.42 (lH, m), 1.86-l_45 (2H, m), 1.76-1.70 (14H, m), 1.42-1.20 (6H, m). <Synthesis Example 54> Synthesis of (E)-2,4-bis((2,2-dimethyl-4,6-dihydro-1,3-dioxane) represented by the following formula [m] -5-subunit)methyl)amino)phenethyl 3-(4-([trans-1,1 bis(cyclohexyl)]-4-yl)phenyl)propionate-98 - 201240981 94]
將梅爾德倫酸H](2.84g ’ 20mmol)及原甲酸三甲酯 [2](40g)加入200mL四口燒瓶中’進行1小時加熱回流。 其後加入化合物Π l〇](4.〇〇g ’ 9_0mmol),再進行2小時加 熱回流。結束反應後,以蒸發器去除溶劑再乾燥’得化合 物[1 1 1 ] 6 · 6 g (產率 9 9 %)。 1H-NMR(400MHz, CDC13, δ ppm) : 1 1.6 3 ( 1 Η,d), 1 1 .30(lH,d) > 8.67-8.60(2H, m) , 7.60(lH,d) , 7.4 1- 7.39(3H,m),7_26-7.14(4H,m),6.36(lH,d),4.48(2H,t), 3.12(2H,t),2.52-2.45(lH,m),1.9 1 - 1.70(24H,m),1.52-1 . 〇 1 (8H,m)。 〈合成例5 5 > 合成下述式[113]所表示之(£)-4-(((2,2-二甲基-4,6-二 氧-1,3-二噁烷-5-亞基)甲基)胺基)苯乙基3-(4-環己基苯基) 丙酸酯Meldronic acid H] (2.84 g' 20 mmol) and trimethyl orthoformate [2] (40 g) were placed in a 200 mL four-necked flask, and heated under reflux for 1 hour. Thereafter, the compound Π l〇] (4. 〇〇g '9_0 mmol) was added, and the mixture was further heated under reflux for 2 hours. After the completion of the reaction, the solvent was removed by an evaporator and dried to give a compound [1 1 1 ] 6 · 6 g (yield 99 %). 1H-NMR (400MHz, CDC13, δ ppm) : 1 1.6 3 ( 1 Η,d), 1 1 .30(lH,d) > 8.67-8.60(2H, m) , 7.60(lH,d) , 7.4 1- 7.39(3H,m),7_26-7.14(4H,m),6.36(lH,d),4.48(2H,t), 3.12(2H,t),2.52-2.45(lH,m),1.9 1 - 1.70(24H,m), 1.52-1 . 〇1 (8H,m). <Synthesis Example 5 5 > (£)-4-(((2,2-dimethyl-4,6-dioxo-1,3-dioxane-5) represented by the following formula [113] was synthesized. -subunit)methyl)amino)phenethyl 3-(4-cyclohexylphenyl)propionate
S -99- 201240981 [化 95]S -99- 201240981 [化 95]
[112] [2] [113] 將梅爾德倫酸m(2.7g ’ 19mmol)及原甲酸三甲酯 [2] (3 Og)加入2 OOmL四口燒瓶中’進行1小時加熱回流。 其後加入化合物[1 12](3.00g,8.6mmol) ’再進行2小時加 熱回流。結束反應後,以蒸發器去除溶劑再乾燥,得化合 物[1 1 3]4.22g(產率 99%)。 'Η-ΝΜΚ(400ΜΗζ, CDC13 , δ ppm) : 1 1 .25( 1 H,d) * 8.62(lH,d),7.64(lH,d),7.44(2H,d),7.32(2H,d),7,24-7.19(4H,m),6.36(lH,d),4.42(2H,t),3.03(2H,t),1.87- 1 .38(1 7H,m) » <合成例5 6 > 合成下述式[115]所表示之(E)-2,4-雙(((2,2-二甲基-4,6-二氧-l,3-二噁烷-5-亞基)甲基)胺基)苯乙基3-(4-(反-4-戊基環己基)丙酸酯 [化 96][112] [2] [113] Meldronic acid m (2.7 g '19 mmol) and trimethyl orthoformate [2] (3 Og) were placed in a 200 mL four-necked flask, and heated under reflux for 1 hour. Thereafter, the compound [1 12] (3.00 g, 8.6 mmol) was added, and the mixture was further refluxed for 2 hours. After the reaction was completed, the solvent was removed by an evaporator and dried to give the compound [1 1 3] 4.22 g (yield: 99%). 'Η-ΝΜΚ (400ΜΗζ, CDC13, δ ppm) : 1 1 .25( 1 H,d) * 8.62(lH,d), 7.64(lH,d),7.44(2H,d),7.32(2H,d ), 7,24-7.19(4H,m), 6.36(lH,d),4.42(2H,t),3.03(2H,t),1.87- 1.38(1 7H,m) » <Synthesis Example 5 6 > Synthesis of (E)-2,4-bis((2,2-dimethyl-4,6-dioxo-l,3-dioxane-5) represented by the following formula [115] -subunit)methyl)amino)phenethyl 3-(4-(trans-4-pentylcyclohexyl)propionate [Chem. 96]
將梅爾德倫酸[l](13.55g,69.8mmol)及原甲酸三甲醋 -100- 201240981 [2](l4〇g)加入300mL四口燒瓶中’進行1小時加熱回 2 流。其後加入化合物[114](13.7% ’ 31.7mm〇l) ’再進行 小時加熱回流。結束反應後,以蒸發器去除溶劑再乾燥 得化合物[115]22.4g(產率95%)。 1 Η - N M R ( 4 0 0 Μ H z, C D C1 3,5 P P m ) : U · 6 3 (1 H,d), 11.27(lH,d) - 8.6 8 -8.5 7(2H,m) J 7.4 1 - 7.3 9 (3 H , m) » 7.26- 7.14(4H,m) > 6.36(lH,d) > 4.48(2H,t) > 3.8 0 - 3 . 7 6 (3 H , m) > 3.48(2H,d) , 3.34(lH,s) , 3.l2(2H,d) » 2.47(2H,t), 1.86(6H,d)« 1 .77- 1.68( 1 0H,m) » 1.47- 1.20( 1 0H,m) · 1.06-0.90(5H,m)。 〈合成例5 7 > 合成下述式[117]所表示之0)-2,4-雙(((2,2-二甲基- 4,6-二氧-1,3-二噁烷-5-亞基)甲基)胺基)苯乙基3-(4-(反- 4-庚基環己基)苯基)丙酸酯 [化 97]Meldronic acid [l] (13.55 g, 69.8 mmol) and orthoformic acid trimethylacetate-100-201240981 [2] (14 g) were placed in a 300 mL four-necked flask and heated to reflux for 2 hours. Thereafter, the compound [114] (13.7% '31.7 mm〇l) was added and heated under reflux for an additional hour. After the completion of the reaction, the solvent was removed by an evaporator and dried to give the compound [115] 22.4 g (yield 95%). 1 Η - NMR ( 4 0 0 Μ H z, CD C1 3,5 PP m ) : U · 6 3 (1 H,d), 11.27(lH,d) - 8.6 8 -8.5 7(2H,m) J 7.4 1 - 7.3 9 (3 H , m) » 7.26- 7.14(4H,m) > 6.36(lH,d) > 4.48(2H,t) > 3.8 0 - 3 . 7 6 (3 H , m > 3.48(2H,d) , 3.34(lH,s) , 3.l2(2H,d) » 2.47(2H,t), 1.86(6H,d)« 1 .77- 1.68( 1 0H,m » 1.47- 1.20( 1 0H,m) · 1.06-0.90(5H,m). <Synthesis Example 5 7 > 0)-2,4-bis((2,2-dimethyl- 4,6-dioxo-1,3-dioxane) represented by the following formula [117] was synthesized. -5-subunit)methyl)amino)phenethyl 3-(4-(trans-4-heptylcyclohexyl)phenyl)propionate [Chemical 97]
將梅爾德倫酸[l](3.43g,23.8mmol)及原甲酸三甲酯 [2](508)加入10〇!111^四口燒瓶中,進行1小時加熱回流。 其後加入化合物Π 16](5.00g,10.8mmol),再進行2小時 加熱回流。結束反應後’以蒸發器去除溶劑再乾燥,得化 -101 - 201240981 合物[1 17]8.3g(產率 100%)。 'H-NMR(400MHz, CDC13, δ ppm) : ll_64(lH,d), ll,28(lH,d) , 8.70-8.63(2H,m) > 7.61 (lH,d) , 7.45- 7_40(3H,m),7.27-7.15(3H,m),6_37(lH,d),4.46(2H,t), 3.60(2H,d),3. 12(2H,t),2.34(lH,t),1.87(4H,d),1.85-1.75(15H,m),1.4 2 -1 · 3 8 (2 H, m ),1.33-1.26(1 OH,m) > 1.07-1 .02(2H,m),0.89(3H,t)。 〈合成例5 8 > 合成下述式[119]所表示之(E)-3,5-雙(((2,2-二甲基-4,6-二氧-1,3-二嚼烷-5-亞基)甲基)胺基)苯基3-(4-(反- 4- 戊基環己基)苯基)丙酸酯 [化 98]Meldronic acid [l] (3.43 g, 23.8 mmol) and trimethyl orthoformate [2] (508) were placed in a 10 〇! 111^ four-necked flask, and heated under reflux for 1 hour. Thereafter, the compound Π 16] (5.00 g, 10.8 mmol) was added, followed by heating under reflux for 2 hours. After the completion of the reaction, the solvent was removed by an evaporator and dried to give 8.3 g (yield: 100%). 'H-NMR (400MHz, CDC13, δ ppm): ll_64(lH,d), ll,28(lH,d), 8.70-8.63(2H,m) > 7.61 (lH,d) , 7.45- 7_40( 3H, m), 7.27-7.15 (3H, m), 6_37 (lH, d), 4.46 (2H, t), 3.60 (2H, d), 3. 12 (2H, t), 2.34 (lH, t) , 1.87 (4H, d), 1.85-1.75 (15H, m), 1.4 2 -1 · 3 8 (2 H, m ), 1.33-1.26 (1 OH, m) > 1.07-1 .02 (2H, m), 0.89 (3H, t). <Synthesis Example 5 8 > Synthesis of (E)-3,5-bis((2,2-dimethyl-4,6-dioxo-1,3-di-chew) represented by the following formula [119] Alkan-5-ylidenemethyl)amino)phenyl 3-(4-(trans- 4-pentylcyclohexyl)phenyl)propionate [Chem. 98]
將梅爾德倫酸[l](H.31g,78.5mmo1)及原甲酸三甲酯 [2](150g)加入300mL四口燒瓶中,進行1小時加熱回 流。其後加入化合物[1 18](15.00g,35.7mmol) ’再進行2 小時加熱回流。結束反應後’以蒸發器去除溶劑再乾燥’ 得化合物[119]25.3g(產率99%)。 1 H-NMR(400MHz, CDC13, 5 ppm) : 1 1 · 3 0 (2 Η,d) ’ 8.66(2H,d),7.74(lH,d),7.49(2H,d) ’ 7.26-7.19(4H,m), -102- 201240981 7.08(lH,d),6.49(lH,d),5.27(2H,s),2.49(lH,t),1.93-1.77(18H,m),1.65-0.87( 1 4H,m)。 <合成例59> 合成下述式[121]所表示之(E)-3,5 -雙(((2,2·二甲基-4,6-二氧-1,3-二噁烷-5-亞基)甲基)胺基)苯基3-(4-(反-4’_ 戊基[1,1,-雙(環己基)]-4_基)苯氧基)丙酸酯 [化 99]Meldronic acid [l] (H.31 g, 78.5 mmol) and trimethyl orthoformate [2] (150 g) were placed in a 300 mL four-necked flask and heated to reflux for 1 hour. Thereafter, the compound [1 18] (15.00 g, 35.7 mmol) was added, followed by heating under reflux for 2 hours. After the completion of the reaction, the solvent was removed by an evaporator and dried to give a compound [119] 25.3 g (yield: 99%). 1 H-NMR (400 MHz, CDC 13 , 5 ppm) : 1 1 · 3 0 (2 Η, d) ' 8.66 (2H, d), 7.74 (lH, d), 7.49 (2H, d) ' 7.26-7.19 ( 4H,m), -102- 201240981 7.08(lH,d),6.49(lH,d),5.27(2H,s),2.49(lH,t),1.93-1.77(18H,m),1.65-0.87( 1 4H, m). <Synthesis Example 59> (E)-3,5-bis((2,2·dimethyl-4,6-dioxo-1,3-dioxane) represented by the following formula [121] was synthesized. -5-subunit)methyl)amino)phenyl 3-(4-(trans-4'-pentyl[1,1,-bis(cyclohexyl)]-4-yl)phenoxy)propanoic acid Ester
將梅爾德倫酸[l](1.83g,12.7mmol)及原甲酸三甲酯 [2] (45 g)加入2 OOmL四口燒瓶中,進行1小時加熱回流。 其後加入化合物[120](3.00g,5.8mmol),再進行2小時加 熱回流。結束反應後,以蒸發器去除溶劑再乾燥,得化合 物[121]4.8g(產率 100%)。 1 H-NMR(400MHz, CDC13, δ ppm) : 11.27(2H,d) » 8.64(2H,d)’7.85(lH,d)’7.21(2H,d),7.14(2H,d),7.1〇-7.09(lH,m) ’ 7.00-6.98 (2H,m),5.57(IH,d),5.19(2H,s), 3.81(1H,s) ’ 3.47-3.46(lH,m),3.33(4H,s),l_9i. 1.72(20H,m)’ 1.41-0_84(13H,m)。 〈合成例60 > 合成下述式[123]所表示之(E)_4_(((2,2_二甲基_4,6-二 -103- 201240981 氧-1,3·二噁烷-5-亞基)甲基)胺基)苯基3-(4-(反-4·戊基環 己基)苯基)丙酸酯 [化 100]Meldronic acid [l] (1.83 g, 12.7 mmol) and trimethyl orthoformate [2] (45 g) were placed in a 200 mL four-necked flask and heated to reflux for 1 hour. Thereafter, the compound [120] (3.00 g, 5.8 mmol) was added, followed by heating under reflux for 2 hours. After the completion of the reaction, the solvent was removed by an evaporator and dried to give 4.8 g (yield 100%) of compound [121]. 1 H-NMR (400 MHz, CDC 13 , δ ppm) : 11.27 (2H,d) » 8.64 (2H,d) '7.85 (lH,d) '7.21 (2H,d),7.14(2H,d),7.1〇 -7.09(lH,m) ' 7.00-6.98 (2H,m),5.57(IH,d),5.19(2H,s), 3.81(1H,s) ' 3.47-3.46(lH,m),3.33(4H , s), l_9i. 1.72 (20H, m) ' 1.41-0_84 (13H, m). <Synthesis Example 60 > (E)_4_(((2,2_Dimethyl_4,6-di-103-201240981 oxy-1,3·dioxane) represented by the following formula [123] was synthesized. 5-substyl)methyl)amino)phenyl 3-(4-(trans-4.pentylcyclohexyl)phenyl)propionate [100]
將梅爾德倫酸[l](3.6g,25mmol)及原甲酸一甲醋 [2](90g)加入2 00mL四口燒瓶中,進行1小時加熱回流β 其後加入化合物[122](9.00g,23mmol),再進行2小時加 熱回流。結束反應後,以蒸發器去除溶劑再乾燥,得化合 物[123] 12.1 g(產率 99%)。 1H-NMR(400MHz, DMSO-d6, δ ppm) : 1 1.28(lH,d) > 8_61(lH,d),7_85(lH,d),7.52(2H,d),7.29-7.26(5H,m), 6.54(lH,d),2.52(lH,t),1.89(4H,d),1.57-0.89(22H,t)。 <合成例6 1 > 合成下述式[125]所表示之(£)-4-(((2,2-二甲基-4,6-二 氧-1,3·二噁烷_5·亞基)甲基)胺基)苯乙基3_(4-(反-4_戊基 環己基)苯基)丙酸酯 [化 101] h2nMeldronic acid [l] (3.6 g, 25 mmol) and orthoformic acid monoacetate [2] (90 g) were placed in a 200 mL four-necked flask, heated to reflux for 1 hour, and then compound [122] (9.00) was added. g, 23 mmol), and heated to reflux for 2 hours. After the reaction was completed, the solvent was removed by an evaporator and dried to give 12.1 g (yield: 99%) of compound [123]. 1H-NMR (400MHz, DMSO-d6, δ ppm): 1 1.28 (lH,d) > 8_61(lH,d),7_85(lH,d),7.52(2H,d),7.29-7.26 (5H, m), 6.54 (lH, d), 2.52 (lH, t), 1.89 (4H, d), 1.57-0.89 (22H, t). <Synthesis Example 6 1 > Synthesis of (£)-4-(((2,2-dimethyl-4,6-dioxo-1,3.dioxane) represented by the following formula [125] 5. Subunit)methyl)amino)phenethyl 3_(4-(trans-4-pentylcyclohexyl)phenyl)propionate [Chem. 101] h2n
-104- [125] 201240981 將梅爾德倫酸[l](2.00g,Mmmol)及原甲酸三甲酯 [2] (75 g)加入200mL四口燒瓶中,進行1小時加熱回流。 其後加入化合物[124](4.92g,13mmol),再進行2小時加 熱回流。結束反應後,以蒸發器去除溶劑再乾燥,得化合 物[125]7.16g(產率 100%)。 1H-NMR(400MHz, CDC13, δ ppm) : 1 1.24(1 H,d), 8.62(lH,d),7.63(lH,d),7.44(2H,d),7.32(2H,d),7.24-7.19(4H,m) , 6.36(lH,d) ,4.42(2H,t) ,3.03(2H,t), 2.48(lH,t),1.87(4H,d),1.76(6H,s),1.49-1.21(lH,m), 1.07-1.00(2H,m),0.97(3H,t)。 〈合成例62 > 合成下述式[127]所表示之5-(( (4 ·十二烷基苯基)胺基) 伸甲基-2,2-二甲基-1,3-二噁烷-4,6-二酮 [化 102]-104- [125] 201240981 Meldronic acid [l] (2.00 g, Mmmol) and trimethyl orthoformate [2] (75 g) were placed in a 200 mL four-necked flask, and heated under reflux for 1 hour. Thereafter, the compound [124] (4.92 g, 13 mmol) was added, and the mixture was refluxed for 2 hr. After the completion of the reaction, the solvent was removed by an evaporator and dried to give the compound [125] 7.16 g (yield 100%). 1H-NMR (400MHz, CDC13, δ ppm): 1 1.24 (1 H,d), 8.62 (lH,d), 7.63 (lH,d), 7.44 (2H,d), 7.32 (2H,d), 7.24 -7.19(4H,m) , 6.36(lH,d) ,4.42(2H,t) ,3.03(2H,t), 2.48(lH,t),1.87(4H,d),1.76(6H,s), 1.49-1.21 (lH, m), 1.07-1.00 (2H, m), 0.97 (3H, t). <Synthesis Example 62 > 5-(((4)-dodecylphenyl)amino)-methyl-2,2-dimethyl-1,3-di) represented by the following formula [127] Oxane-4,6-dione [Chem. 102]
將梅爾德倫酸[l](12.13g,84.2mmol)及原甲酸三甲酯 [2](100g)加入200mL四口燒瓶中,進行1小時加熱回 流。其後加入化合物[126](20.00g,76.5mmol),再進行 2 小時加熱回流。結束反應後,以蒸發器去除溶劑再乾燥, 得化合物[1 2 7 ] 3 1 . 1 g (產率9 8 %)。 S· -105- 201240981 1H-NMR(400MHz, DMSO-d6, δ ppm) : 11.24(lH,d)’ 8.50(lH,d),7.41(2H,d),7.20(2H,d),2.53(2H,t),2.27- 2.46(1 H,m) > 1.63(6H,s) , 1 · 5 2 - 1.4 7 ( 2 H,m ) ’ 1.29- 1.86(1 7H,m),0.83(3H,t)。 <合成例63 > 合成下述式[129]所表示之 5-(((4-(1,1,2,2,3,3,4,4,5,5, 6,6,7,7,7-十五氟基庚基))胺基)伸甲基)-2,2-二甲基-1,3-二 噁烷-4,6-二酮 [化 103] 〇 乂。 h2n j〇tC7Fis Ο [128] CH(OMe)3 人〇 H [2] j〇rC7Fl5 [129] 將梅爾德倫酸[l](3.10g,22mmol)及原甲酸三甲酯 [2] (2 0 g)加入2 OOmL四口燒瓶中,進行1小時加熱回流。 其後加入化合物[128](10.00g,19.6mmol),再進行2小時 加熱回流》結束反應後,以蒸發器去除溶劑再乾燥,得化 合物[129]12.6g(產率 100%)。 1H-NMR(400MHz, DMSO-d6, ¢5 ppm): 1 1.60( 1 H,d) » 8.70(lH,d),7.68(2H,d),7.39(2H,d),l_77(6H,s)。 [合成聚醯胺酸或聚醯亞胺及製作其溶液] 下述所使用之代號如下所述。 -106- 201240981 (四羧酸二酐) CBDA : 1,2,3,4-環丁烷四羧酸二酐 BODA:環[3,3,0]辛院-2,4,6,8-四羧酸二酐 [化 104]Meldronic acid [l] (12.13 g, 84.2 mmol) and trimethyl orthoformate [2] (100 g) were placed in a 200 mL four-necked flask and heated to reflux for 1 hour. Thereafter, the compound [126] (20.00 g, 76.5 mmol) was added, followed by heating under reflux for 2 hours. After completion of the reaction, the solvent was removed by an evaporator and dried to give Compound [1 2 7 ] 3 1 .1 g (yield 98%). S· -105- 201240981 1H-NMR (400MHz, DMSO-d6, δ ppm) : 11.24(lH,d)' 8.50(lH,d), 7.41(2H,d), 7.20(2H,d),2.53 ( 2H,t), 2.27- 2.46(1 H,m) > 1.63(6H,s) , 1 · 5 2 - 1.4 7 ( 2 H,m ) ' 1.29- 1.86(1 7H,m),0.83(3H , t). <Synthesis Example 63 > 5-((4-(1,1,2,2,3,3,4,4,5,5, 6,6,7) represented by the following formula [129] was synthesized. , 7,7-pentadecafluoroheptyl))amino)methyl)-2,2-dimethyl-1,3-dioxane-4,6-dione [Chem. 103] oxime. H2n j〇tC7Fis Ο [128] CH(OMe)3 Human 〇H [2] j〇rC7Fl5 [129] Will Meldronic acid [l] (3.10g, 22mmol) and trimethyl orthoformate [2] ( 20 g) was placed in a 200 mL four-necked flask and heated to reflux for 1 hour. Thereafter, the compound [128] (10.00 g, 19.6 mmol) was added, and the mixture was heated under reflux for further 2 hours. After the reaction was completed, the solvent was removed by an evaporator and then dried to give the compound [129] 12.6 g (yield 100%). 1H-NMR (400MHz, DMSO-d6, ¢5 ppm): 1 1.60( 1 H,d) » 8.70(lH,d), 7.68(2H,d),7.39(2H,d),l_77(6H,s ). [Synthesis of Polyamide or Polyimine and Preparation of Its Solution] The codes used below are as follows. -106- 201240981 (tetracarboxylic dianhydride) CBDA : 1,2,3,4-cyclobutane tetracarboxylic dianhydride BODA: ring [3,3,0] 辛院-2,4,6,8- Tetracarboxylic dianhydride [化104]
CBDA (二胺) p-PDA : p-伸苯基二胺 DDM: 4,4’-二胺基二苯基甲烷 己基)苯氧基] PCH7AB : 1,3-二胺基-4-[4-(反-4-n-庚基環 苯 [化 105]CBDA (diamine) p-PDA : p-phenylenediamine DDM: 4,4'-diaminodiphenylmethanehexyl)phenoxy] PCH7AB : 1,3-diamino-4-[4 -(trans-4-n-heptylcyclobenzene [105]
h2n^~\-nh2 j〇^〇l h2n々^ 、^nh2 p-PDA DDMH2n^~\-nh2 j〇^〇l h2n々^ , ^nh2 p-PDA DDM
(CH2)6CH3 (有機溶劑) NMP: N -甲基-2-吡咯烷酮 BCS: 丁基溶纖劑 -107- 201240981 (測定分子量) 本實施例中,聚合物(聚醯胺酸、聚醯亞胺等)之分子 量係使用Shod ex(股)公司製常溫凝膠浸透色譜法(GPC)裝 置(GPC-101)、Shodex 公司製管柱(KD-803、KD-805)以下 述方法測定。(CH2)6CH3 (organic solvent) NMP: N-methyl-2-pyrrolidone BCS: butyl cellosolve-107-201240981 (measurement molecular weight) In the present example, a polymer (polyproline, polyimine, etc.) The molecular weight was measured by the following method using a room temperature gel permeation chromatography (GPC) apparatus (GPC-101) manufactured by Shod Ex Co., Ltd., and a column (KD-803, KD-805) manufactured by Shodex Co., Ltd.
管柱溫度:50°C 溶離液:N,N -二甲基甲醯胺(添加劑爲,溴化鋰-水合 物(LiBr · H2O)30mmol/L、磷酸-酐結晶(0_磷酸)3〇mm〇l/ L、四氫呋喃(THF)10ml/L) 流速:1 .OmL/分 檢量線製作用柱準樣品:東索公司製TSK標準聚環 氧乙院(分子量約 900,000、150,000、1〇〇, 〇〇〇、30,〇〇〇), 及波里曼公司製聚乙二醇(分子量約12,〇〇〇、4,000、 1,000) ° '(測定醯亞胺化率) 本實施例中,係以下述方法測定聚醯亞胺之醯亞胺化 率。 將聚醯亞胺粉末約2〇mg放入NMR樣品管中,加入 氘化二甲基亞颯(DMS0-d6,0.05%TMS混合品)約〇 53ml 後,施加超音波使其完全溶解。以NMR測定裝置測定該 溶液之500MHz之質子NMR。醯亞胺化率係藉由,以來 自醯亞胺化前後未改變之構造之質子爲基準質子,使用該 質子之峰積算値,與出現於1 O.Oppm附近來自醯胺酸之 -108- 201240981 NH基之質子峰積値以下述式求取。又,下述式中,x爲 來自醯胺酸之NH基之質子峰積算値,y爲基準質子之峰 積算値’ α爲聚醯胺酸(醯亞胺化率爲〇%)時之相對於醯 胺酸之ΝΗ基質子一個的基準質子之個數比例。Column temperature: 50 ° C Dissolution: N,N-dimethylformamide (additive, lithium bromide-hydrate (LiBr · H2O) 30 mmol / L, phosphoric acid anhydride crystals (0 - phosphoric acid) 3 〇 mm 〇 l/ L, tetrahydrofuran (THF) 10ml/L) Flow rate: 1.0 mL/minometric line preparation column sample: TSK standard poly epoxy plant made by Dongsuo Company (molecular weight about 900,000, 150,000, 1〇〇, 〇〇〇, 30, 〇〇〇), and Polyethylene glycol (molecular weight of about 12, 4,000, 4,000, 1,000) ° (measured by yttrium imidation rate) in this example, The ruthenium imidization ratio of the polyimine was measured by the following method. About 2 mg of polyimine powder was placed in an NMR sample tube, and about 53 ml of deuterated dimethyl hydrazine (DMS0-d6, 0.05% TMS mixture) was added, and ultrasonic waves were applied to completely dissolve it. The 500 MHz proton NMR of the solution was measured by an NMR measuring apparatus. The imidization rate is based on the protons from the unaltered structure before and after the imidization, using the peak product of the protons to calculate the enthalpy, and the -108- from the proline in the vicinity of 1 O.Oppm. 201240981 The proton peak product of the NH group is obtained by the following formula. Further, in the following formula, x is the proton peak product of the NH group derived from proline, and y is the peak product of the reference proton. When α is a poly-proline (the imidization ratio is 〇%), The ratio of the number of reference protons to the protons of the proline.
醯亞胺化率(%) = (1-α · x/y)xlOO <合成聚醯亞胺(PAA-1)及製作其溶液> 將 DDM 7.93g(40mmol)、NMP(20g)加入 lOOmL 四口 燒瓶中,溶解後冷卻至約1 0 °C,再加入c B D A 7.4 6g (38mmol)之Ν Μ P (6 7 g)漿料溶液,返回室溫後於氮氣下反 應6小時,得聚醯胺酸(PAA-1)之濃度15質量%之溶液。 將該聚醯胺酸(PAA-1)之濃度15質量%之溶液88g移 入 200mL三角燒瓶中,加入 NMP 87.6g、BCS 43.8g稀 釋,製作聚醯胺酸(PAA-1)爲6質量%、NMP爲74質量 %、BCS爲20質量%之聚醯胺酸(PAA-1)溶液。該聚醯胺 酸(PAA-1)之數平均分子量爲12,081、重量平均分子量爲 3 0,449 ° <合成聚醯胺酸(PAA-2)及製作其溶液>Ruthenium amination rate (%) = (1 - α · x / y) xlOO < Synthesis of polyimine (PAA-1) and preparation of the solution > DDM 7.93g (40mmol), NMP (20g) was added In a 100 mL four-necked flask, after cooling, it was cooled to about 10 ° C, and then c BDA 7.4 6 g (38 mmol) of Ν ( P (67 g) slurry solution was added, and the mixture was returned to room temperature and reacted under nitrogen for 6 hours. A solution of polyamine acid (PAA-1) at a concentration of 15% by mass. 88 g of a solution of the polyamine acid (PAA-1) concentration of 15% by mass was transferred to a 200 mL Erlenmeyer flask, and 87.6 g of NMP and 43.8 g of BCS were added to prepare a polyglycine (PAA-1) to be 6 mass%. A solution of polyamido acid (PAA-1) having a NMP of 74% by mass and a BCS of 20% by mass. The polyammonium acid (PAA-1) has a number average molecular weight of 12,081 and a weight average molecular weight of 30,449 ° <synthetic polyglycine (PAA-2) and preparation of the solution>
S 將 p-PDA 8.65g(80mmol)、NMP(49g)加入 200mL 四 口燒瓶中,溶解後冷卻至約10 °C ’再加入 CBDA 14.1g(72mmol)之NMP(80g)漿料溶液,返回室溫後於氮氣 下反應6小時,得聚醯胺酸(P A A-2)之濃度15質量%之溶 -109- 201240981 液。 將該聚醯胺酸(PAA-2)之濃度15質量°/〇之溶液125g 移入300mL三角燒瓶中,加入NMP 118,5g、BCS 6(K9g 稀釋,製作聚醯胺酸(PAA-2)爲6質量%、NMP爲74質量 %、BCS爲20質量%之聚醯胺酸(PAA-2)溶液。該聚醯胺 酸(PAA-2)之數平均分子量爲7.609、重量平均分子量爲 15,837 。 <合成聚醯胺酸(PAA-3)及製作其溶液〉 將 p-PDA 8.05g(74mmol)、PCH7AB 2.13g(5.6mmol) 、NMP(118g)加入200mL四口燒瓶中溶解後冷卻至約 l〇°C,再加入 CBDA 14· 1 g(72mmol)之 NMP(1 00g)漿料溶 液,返回室溫後於氮氣下反應6小時,得聚醯胺酸(PAA-3) 之濃度10質量%之溶液。 將該聚醯胺酸(PAA-3)之濃度10質量%之溶液234g 移入300mL三角燒瓶中,加入NMP 70.8g、BCS 76.2g稀 釋,製作聚醯胺酸(PAA-3)爲6質量% ' NMP爲74質量 %、BCS爲20質量%之聚醯胺酸(PAA-3)溶液、該聚醯胺 酸(PAA-3)之數平均分子量爲 6,092、重量平均分子量 12,〇〇2 〇 <合成可溶性聚醯亞酸(SP 1-1)及製作其溶液> 於 3 00mL 四口燒瓶中將 BODA(16.9g,68mmol)、p-PDA(6.8g > 63mmol)、PCH7 AB( 10.3 g,27mmol)混入 -110- 201240981 NMP(lOOg)中,40°C下反應3小時後,加入CBDA(4.1g, 21mmol)與NMP(52g),40°C下再反應3小時,得聚醯胺酸 溶液。將NMP加入該聚醯胺酸溶液(130g)稀釋爲6質量% 後,加入醯亞胺化觸媒用之乙酸酐(16g)、吡啶(12g),80 °C下反應3小時。將該反應溶液投入甲醇(1.6L)中,濾取 所得之沈澱物後,以甲醇洗淨該沈澱物,1 〇〇 °C下減壓乾 燥,得聚醯亞胺粉末(SP1-1)。該聚醯亞胺之醯亞胺化率爲 54%,·數平均分子量爲 18,300、重量平均分子量爲 45,300。該聚醯亞胺中羧基之量相對於重獲單位爲0.92 個。 將NMP(98g) ' BCS(90g)加入上述所得之聚醯亞胺粉 末(SPI-l)(12.0g)中,80°C下攪拌40小時使其溶解,製作 可溶性聚醯亞胺(SPI-1)溶液。 [調製形成聚醯亞胺膜用之塗佈液(液晶配向劑)] <實施例1至1〇> 各自將修飾用化合物之上述合成例所製作的下述表1 所記載之化合物,以相對於聚醯胺酸(p A A-1)溶液之固體 成分(即聚醯胺酸(PAA-1)爲1 Omol%之量,加入上述所製 作之聚醯胺酸(PAA-1)溶液(l〇.〇g)中,室溫(25°C)下攪拌 爲均勻溶液,調製實施例1至10之形成聚醯亞胺膜用之 塗佈液(形成機能性聚合物膜用之塗佈液)^ -111 - 5 201240981 [表1] 聚醯胺酸 修飾用化合物 .實施例1 PAA- 1 合成例4 [11] 實施例2 PAA- 1 合成例5 [13] 實施例3 PAA- 1 合成例6 [15] 實施例4 PAA-1 合成例7 [17】 實施例5 PAA- 1 合成例9. [2 1] 實施例6 PAA - 1 合成例1 7 [3 7] 實施例7 PAA- 1 合成例1 8 [3 9] 實施例8 P AA- 1 .合成例2 2 [4 7] 實施例9 P A A— 1 合成例2 3 [49] 實施例1 〇 PAA-1. 合成例2 4 [5 1] 〈實施例11至45〉 各自將修飾用化合物之上述合成例所製作的下述表2 所記載之化合物,以相對於聚醯胺酸(PAA-1)溶液之固體 成分(即聚醯胺酸(PAA-1))爲下述表2所記載之比例之 量,加入上述所製作之聚醯胺酸(PAA-1)溶液(lO.Og)中’ 室溫下攪拌爲均勻溶液,調製實施例1 1至45之形成聚醯 亞胺膜用之塗佈液。 -112- 201240981 [表2] 聚醯胺酸 修飾用化合物 麵 添加量(wt%) 實施例1 1 PAA-1 合成例2 4 [5 1] 1 實施例1 2 PAA-1 合成例2 4 [5 1] 3 實施例1 3 PAA- 1 合成例2 4 [5 1】 5 實施例1 4 PAA- 1 合成例2 4 [5 1] 1 0 實施例1 5 PAA- 1 合成例2 4 [5 1] 2 0 寳施例1 6 PAA- 1 合成例2 2 [4 7] 1 實施例1 7 PAA- 1 合成例2 2 [4 7] 3 實施例1 8 PAA- 1 合成例2 2 [4 7】 5 實施例1 9 PAA- 1 合成例2 2 [4 7] 10 實施例2 0 PAA— 1 合成例2 2 [4 7] 2 0 實施例2 1 PAA- 1 合成例2 3 [4 9】 1 實施例2 2 PAA- 1 合成例2 3 [49] 3 實施例2 3 PAA- 1 合成例2 3 [4 9] 5 實施例2 4 PAA- 1 合成例2 3 [4 9] 10 實施例2 5 PAA— 1 合成例2 3 [4 9】 2 0 實施例2 6 PAA- 1 合成例2 6 [5 5】. 1 實施例2 7 P AA- 1 合成例2 6 [5 5】 3 實施例2 8 PAA— 1 合成例2 6 [5 51 5 實施例2 9 P AA- 1 合成例2 6 [5 5】 10 實施例3.0 P AA- 1 合成例2 6 [5 5] 2 0 實施例3 1 P AA- 1 合成例2 8 [5 9】 1 實施例3 2 PAA- 1 合成例2 8 [5 9】 3 實施例3 3 PAA- 1 合成例2 8 [5 91 5 實施例3 4 PAA- 1 合成例2 8 [5 9] 10 實施例3 5 P AA— 1 合成例2 8 [5 91 2 0 實施例3 6 PAA- 1 合成例3 3 [6 81 1 實施例3 7 P AA- 1 合成例3 3 [6 8] 3 實施例3 8 PAA- 1 合成例3 3 [6 8] 5 實施例3 9 P AA- 1 合成例3 3 [6 8】 10 實施例4 0 PAA- 1 合成例3 3 [6 8】 2 0 實施例4 1 PAA- 1 合成例3 4 [7 0】 1 實施例4 2 PAA— 1 合成例3 4 [7 0】 3 實施例4 3 P AA— 1 合成例3 4 [7 0] 5 實施例4 4 PAA- 1 合成例3 4 [7 0] 10 實施例4 5 PAA- 1 合成例3 4 [7 0】 2 0 〈實施例46至57 > 各自將修飾用化合物之上述合成例所製作的下述表3 -113- 201240981 所記載之化合物,以相對於聚醯胺酸(PAA_2)溶液之固體 成分(即聚醯胺酸(?八八_2))爲1〇m〇i%之量,加入上述所製 作之聚醯胺酸(PAA-2)溶液(lo.og)中,室溫下攪拌爲均勻 溶液’調製實施例46至57之形成聚醯亞胺膜用之塗佈 液。 [表3] 聚醯胺酸 修飾用化合物 實施例4 6 PAA- 2 合成例4 [11】 實施例4 7 PAA-2 合成例5 [13] 實施例4 8 PAA- 2 合成例β 【15】 實施例4 9 --- PAA- 2 合成例7 [17] 實施例5 〇 PAA-2 合成例9 [2 1] 實施例5 1 PAA-2 合成例1 7 [3 7] 實施例5 2 PAA-2 合成例1 8 [3 9】 實施例5 3 PAA- 2 合成例2 2 [4 71 實施例5 4 PAA- 2 合成例2 3 [4 9】 實施例5 5 PAA- 2 合成例2 4 [5 1]. 實施例5 6 PAA- 2 合成例2 7 [5 7] 實施例5 7 PAA-2 合成例2 8 [5 9] <實施例5 8至7 1 > 各自將修飾用化合物之上述合成例所製作的下述表4 所記載之化合物,以相對於聚醯胺酸(PAA-3)溶液之固體 成分(即聚醯胺酸(PAA-3))爲表4所記載之質量%之量,加 入上述所製作之聚醯胺酸(PAA-3)溶液(40.0g)中,室溫下 攪拌爲均勻溶液,調製實施例58至71之形成聚醯亞胺膜 用之塗佈液。 -114- 201240981 [表4] 聚醯胺酸 修飾用化合物 添加量(wt%) 實施例5 8 PAA-3 [6 3] 5 實施例5 9 PAA- 3 [6 3] -------:_ 1 0 實施例6 0 PAA-3 [6 3] 2 0 實施例6 1 PAA-3 [6 3] 3 0 實施例6 2 PAA-3 [6 3] 5 0 實施例6 3 PAA-3 [6 3] 7 0 實施例6 4 PAA-3 [6 3] 10 0 實施例6 5 P AA- 3 [6 5] 5 實施例6 6 PAA-3 [6 5] 10 實施例6 7 PAA-3 [6 5] 2 0 實施例6 8 PAA-3 [6 5] 3 0 實施例6 9 PAA-3 [6 5] To 實施例7 〇 PAA — 3 [6 5] 7 0 實施例7 1 P AA- 3 [6 5] 10 0 〈實施例72至74 > 各自將修飾用化合物之上述合成例所製作的下·述表5 所記載之化合物,以相對於聚醯胺酸(PAA-2)溶液之固體 成分(即聚醯胺酸(P AA-2))爲下述表5所記載之比例之 量,加入上述所製作之聚醯胺酸(PAA-2)溶液(7〇.〇g)中, 室溫下攪拌爲均勻溶液,調製實施例72至74之形成聚醯 亞胺膜用之塗佈液。 [表5] 聚醯胺酸 修飾用化合物 觀 添加量(wt%) 實施例7 2 PAA-2 合成例2 3 [49] 10 實施例7 3 PAA-2 合成例2 3 [49] 15 實施例7 4 PAA- 2 合成例2 3 [4 9] 2 0 -115- 201240981 〈實施例75至90> 各自將修飾用化合物之上述合成例所製作的下述表6 所記載之化合物,以相對於可溶性聚醯亞胺(SP 1-1)溶液之 固體成分(即可溶性聚醯亞胺(SPI-1))爲下述表6所記載之 比例之量,加入上述所製作之可溶性聚醯亞胺(SP 1-1)溶液 (10.〇g)中,室溫下攪拌爲均勻溶液,調製實施例75至90 之形成聚醯亞胺膜用之塗佈液。 [表6] 可溶性聚醯亞胺 修飾用化雜 種 類 添加量(wt%) 實施例7 5 SP I-1 合成例5 [13] 10 實施例7 6 S P I - 1 合成例6 [15] 10 實施例7 7 SP I - 1 合成例7 [17] 10 實施例7 8 SP I - 1 合成例9 [2 1】 10 實施例7 9 SP I -1 合成例1 3 [2 9] 10 實施例8 0 S P I - 1 合成例1 6 [3 5J 10 實施例8 1 S P I - 1 合成例1 7 [3 7】 1 0 實施例8 2 SP I - 1 合成例1 8 [3 9] 10 實施例8 3 S P I — 1 合成例2 2 [4 7] 10 實施例8 4 SP 1-1 合成例2 3 [4 9] 10 實施例8 5 .S P I - 1 合成例2 4 [5 1] 10 實施例8 6 SP I - 1 合成例3 2 [6 6] 10 實施例8 7 S P I - 1 合成例3 0 [6 3] 5 實施例8 8 SP I - 1 合成例3 0 [6 3] 10 實施例8 9 SP I - 1 合成例3 0 [6 3】 3 0 實施例9 0 S P I - 1 合成例3 0 [6 3】 5 0 <實施例91至1 02及比較例1 > [交聯效果之確認試 驗(脫膜試驗)] 將上述實施例75至86之形成聚醯亞胺膜用之塗佈液 旋塗(2500rpm/30秒)於矽電路板上,置於2 3 0艺之熱板上 焙燒30分鐘,形成塗膜[al]。使用小坂硏究所(股)公司製 薩佛克ET4000M測定所得之塗膜[al]之膜厚。其次將形成 -116- 201240981 塗膜[al]之矽電路板再度安裝於旋塗機上,滴入NMP全面 覆蓋矽電路板後靜置60秒’再旋乾NMP(1500rpm/30秒), 置於100°C之熱板上焙燒30秒,以殘膜爲塗膜[0.2]。再度 測定該塗膜[a2]之膜厚,以下述計算式算出殘膜率。比較例 1爲,對上述所製作之可溶性聚醯亞胺(SPI-1)溶液,即不含 上述式[A]至[D]所表示之修飾用化合物之可溶性聚醯亞胺溶 液進行相同操作,算出殘膜率。結果如表7所示。 殘膜率(%) =塗膜[a2]之膜厚/塗膜[al]之膜厚X100 由該結果確認,使用添加修飾用化合物之形成聚醯亞 胺膜用之塗佈液(液晶配向處理劑),可改善塗膜(聚醯亞胺 膜)之溶劑耐性。因此修飾用化合物係導入可溶性聚醯亞胺 中。又,使用具有2個以上梅爾德倫酸之上述式[A]所表示 之修飾用化合物的實施例75至85中,特別是殘膜率較高。 因此推斷可藉由上述式[A]所表示之修飾用化合物交聯可溶 性聚醯亞胺。另外藉由適當選擇所添加之上述式[A]所表示 之修飾用化合物,確認可較自由控制塗膜之溶解性。 同樣地對使用實施例1至74及實施例87至90之形成 聚醯亞胺膜用之塗佈液形成之塗膜進行脫膜試驗後’比較未 添加修飾用化合物之物時,可提高殘膜率,因此確認使用添 加修飾用化合物之形成聚醯亞胺膜用之塗佈液,可改善聚醯 亞胺膜之溶劑耐性。 S-. -117- 201240981 [表7] .形成聚醯亞胺膜用之塗佈液. 塗膜丨a 1]之 MM (nm) 塗膜ia2]之 顧(nm) 瓣率 (%) 實施例編號 修飾用化潍 實施例9 1 »施例75 合成例5 [1 3] 18 0 14 3 7 9.4 實施例9 2 實施例7 6 合成例6 【15] 1 84 147 7 9.9 實施例9 3 實施例7 7 合成例7 [1 7] 16 0 15 1 94. 2 實施例9 4 實施例7 8. 合成例9 [2 1】 16 5. 15 2 9 2.1 實施例9 5 實施例7 9 合成例1 3 【2 91 14 9 14 0 94. 6 實施例9 6 實施例8 0 合成例1 6 [3 5】 1.4 7 10 7 7 2. 8 實施例9 7 實施例8 1 合成例1 7 [3 7】 1 24 6 9 5 5.7 實施例9 8 實施例8 2 合成例1 8 【3 9] 16 4 10 2 62. 2 實施例9 9 實施例8 3 合成例2 2 [4 7】 17 7 111 6 2. 7 實施例1Q 0 實施例8 4 合成例2 3 [4 91 17 0 10 4 6 1. 2 實施例10 1 實施例8 5 合成例2 4 [5 1] 17 3 113 6 5.3 實施例1 0 2 實施例8 6 合成例3 2 16 6] 146 7 3 50. 〇 比較例1 — 無 15 1 0 無殘膜 [製作液晶配向膜及液晶單元] 使用上述各實施例所調製之形成聚醯亞胺膜用之塗佈 液(液晶配向劑),以下述方法製作液晶單元。 將形成聚醯亞胺膜用之塗佈液(液晶配向劑)旋塗於玻 璃基板或附ITO透明電極之玻璃基板上,置於80°c之熱 板上乾燥70秒後,以一定之焙燒條件形成膜厚l〇〇nm之 塗膜。 其後利用輥徑1 20nm之刷洗裝置,使用人工絲以一定 之刷洗條件刷洗該塗膜面,進行藉由刷洗之液晶配向處S 8.65 g (80 mmol) of p-PDA and NMP (49 g) were placed in a 200 mL four-necked flask, dissolved, and cooled to about 10 ° C. Then, CBDA 14.1 g (72 mmol) of NMP (80 g) slurry solution was added, and returned to the chamber. After the reaction, the mixture was reacted under nitrogen for 6 hours to obtain a solution of poly-proline (PA A-2) at a concentration of 15% by mass of -109-201240981. 125 g of a solution of polypyridic acid (PAA-2) at a concentration of 15 mass%/〇 was transferred into a 300 mL Erlenmeyer flask, and NMP 118, 5 g, and BCS 6 (K9g diluted) were added to prepare polylysine (PAA-2). A polyammonic acid (PAA-2) solution having 6 mass%, NMP of 74 mass%, and BCS of 20 mass%. The polyamine acid (PAA-2) had a number average molecular weight of 7.609 and a weight average molecular weight of 15,837. <Synthesis of polyaminic acid (PAA-3) and preparation of the solution> 8.05 g (74 mmol) of p-PDA, 2.13 g (5.6 mmol) of PCH7AB, and NMP (118 g) were dissolved in a 200 mL four-necked flask, and then cooled to about L〇 ° C, then add CBDA 14 · 1 g (72mmol) of NMP (100g) slurry solution, return to room temperature and react under nitrogen for 6 hours to obtain the concentration of poly-proline (PAA-3) 10 234 g of a solution of the polyamine acid (PAA-3) at a concentration of 10% by mass was transferred to a 300 mL Erlenmeyer flask, and 70.8 g of NMP and 76.2 g of BCS were added thereto to prepare polyglycine (PAA-3). 6 mass% of a polyamido acid (PAA-3) solution having a NMP of 74% by mass and a BCS of 20% by mass, the polyaminic acid (PAA-3) having a number average molecular weight of 6,092 and a weight average molecular weight of 12, 〇 〇2 <Synthesis of soluble polydecanoic acid (SP 1-1) and preparation of the solution> BODA (16.9 g, 68 mmol), p-PDA (6.8 g > 63 mmol), PCH7 AB in a 300 mL four-necked flask 10.3 g, 27 mmol) was mixed into -110-201240981 NMP (100 g), and after reacting at 40 ° C for 3 hours, CBDA (4.1 g, 21 mmol) and NMP (52 g) were added, and reacted at 40 ° C for 3 hours to obtain a poly A solution of lysine. After the NMP was added to the polyamic acid solution (130 g) and diluted to 6 mass%, acetic anhydride (16 g) and pyridine (12 g) for the ruthenium catalyst were added, and the reaction was carried out at 80 °C. The reaction solution was poured into methanol (1.6 L), and the obtained precipitate was collected by filtration, and the precipitate was washed with methanol and dried under reduced pressure at 1 ° C to obtain a polyimine powder (SP1-1). The polyamidimide has a ruthenium iodide ratio of 54%, a number average molecular weight of 18,300, and a weight average molecular weight of 45,300. The amount of carboxyl groups in the polyimine is 0.92 relative to the unit of retrievation. (98 g) 'BCS (90 g) was added to the polyimine powder (SPI-1) obtained above (12.0 g), and stirred at 80 ° C for 40 hours to dissolve to prepare soluble polyimine (SPI-1). Solution. [Preparation of a coating liquid for forming a polyimide film (liquid crystal alignment agent)] <Examples 1 to 1> Each of the compounds described in the following Table 1 prepared by the above synthesis examples of the compound for modification, The above-prepared polyglycine (PAA-1) was added in an amount of 1 mol% relative to the solid component of the polyaminic acid (p A A-1) solution (i.e., polyamine acid (PAA-1)). In the solution (l〇.〇g), the mixture was stirred at room temperature (25 ° C) to obtain a uniform solution, and the coating liquids for forming the polyimide film of Examples 1 to 10 were prepared (for forming a functional polymer film) Coating liquid) ^ -111 - 5 201240981 [Table 1] Compound for polyaminic acid modification. Example 1 PAA-1 Synthesis Example 4 [11] Example 2 PAA-1 Synthesis Example 5 [13] Example 3 PAA - 1 Synthesis Example 6 [15] Example 4 PAA-1 Synthesis Example 7 [17] Example 5 PAA-1 Synthesis Example 9. [2 1] Example 6 PAA - 1 Synthesis Example 1 7 [3 7] Example 7 PAA-1 Synthesis Example 1 8 [3 9] Example 8 P AA-1. Synthesis Example 2 2 [4 7] Example 9 PAA-1 Synthesis Example 2 3 [49] Example 1 〇PAA-1. Synthesis Example 2 4 [5 1] <Examples 11 to 45> Each of the compounds for modification The compound described in the following Table 2 produced in the above Synthesis Example is described in Table 2 below with respect to the solid component of the polyacrylic acid (PAA-1) solution (i.e., polyamine acid (PAA-1)). The amount of the mixture is added to the polyamic acid (PAA-1) solution (10.Og) prepared above, and stirred at room temperature to obtain a homogeneous solution, and the polyimine film of the examples 1 to 45 is prepared. Coating liquid. -112- 201240981 [Table 2] Compound addition amount (wt%) of polyamine acid modification Example 1 1 PAA-1 Synthesis Example 2 4 [5 1] 1 Example 1 2 PAA-1 Synthesis Example 2 4 [5 1] 3 Example 1 3 PAA-1 Synthesis Example 2 4 [5 1] 5 Example 1 4 PAA-1 Synthesis Example 2 4 [5 1] 1 0 Example 1 5 PAA-1 Synthesis Example 2 4 [5 1] 2 0 Bao Shi Example 1 6 PAA-1 Synthesis Example 2 2 [4 7] 1 Example 1 7 PAA-1 Synthesis Example 2 2 [4 7] 3 Example 1 8 PAA-1 Synthesis Example 2 2 [4 7] 5 Example 1 9 PAA-1 Synthesis Example 2 2 [4 7] 10 Example 2 0 PAA-1 Synthesis Example 2 2 [4 7] 2 0 Example 2 1 PAA-1 Synthesis Example 2 3 [4 9] 1 Example 2 2 PAA-1 Synthesis Example 2 3 [49] 3 Example 2 3 PAA-1 Synthesis Example 2 3 [4 9] 5 Example 2 4 PAA-1 Synthesis Example 2 3 [4 9] 10 Example 2 5 PAA-1 Synthesis Example 2 3 [4 9] 2 0 Example 2 6 PAA-1 Synthesis Example 2 6 [5 5]. 1 Example 2 7 P AA-1 Synthesis Example 2 6 [5 5] 3 Example 2 8 PAA-1 Synthesis Example 2 6 [5 51 5 Example 2 9 P AA-1 Synthesis Example 2 6 [5 5] 10 Example 3.0 P AA-1 Synthesis Example 2 6 [5 5] 2 0 Example 3 1 P AA-1 Synthesis Example 2 8 [5 9] 1 Example 3 2 PAA-1 Synthesis Example 2 8 [5 9] 3 Example 3 3 PAA-1 Synthesis Example 2 8 [5 91 5 Example 3 4 PAA-1 Synthesis Example 2 8 [5 9] 10 Example 3 5 P AA-1 Synthesis Example 2 8 [5 91 2 0 Example 3 6 PAA- 1 Synthesis Example 3 3 [6 81 1 Example 3 7 P AA-1 Synthesis Example 3 3 [6 8] 3 Example 3 8 PAA-1 Synthesis Example 3 3 [6 8] 5 Example 3 9 P AA-1 Synthesis Example 3 3 [6 8] 10 Example 4 0 PAA-1 Synthesis Example 3 3 [6 8] 2 0 Example 4 1 PAA-1 Synthesis Example 3 4 [7 0] 1 Example 4 2 PAA-1 Synthesis Example 3 4 [7 0] 3 Example 4 3 P AA-1 Synthesis Example 3 4 [7 0] 5 Example 4 4 PAA-1 Synthesis Example 3 4 [7 0] 10 Example 4 5 PAA-1 Synthesis Example 3 4 [7 0] 2 0 <Examples 46 to 57 > Compound 3 -113-201240981 described in the following Table of the above compound produced in Synthesis Example modification with respect to the solid content of the solution (i.e., polyamide acid (polyamide acid (PAA_2)?八八_2)), in an amount of 1〇m〇i%, added to the poly-proline (PAA-2) solution (lo.og) prepared above, and stirred at room temperature to obtain a homogeneous solution 'Modification Example 46 A coating liquid for forming a polyimide film to 57. [Table 3] Compound for polyaminic acid modification Example 4 6 PAA-2 Synthesis Example 4 [11] Example 4 7 PAA-2 Synthesis Example 5 [13] Example 4 8 PAA-2 Synthesis Example β [15] Example 4 9 --- PAA-2 Synthesis Example 7 [17] Example 5 〇PAA-2 Synthesis Example 9 [2 1] Example 5 1 PAA-2 Synthesis Example 1 7 [3 7] Example 5 2 PAA -2 Synthesis Example 1 8 [3 9] Example 5 3 PAA-2 Synthesis Example 2 2 [4 71 Example 5 4 PAA-2 Synthesis Example 2 3 [4 9] Example 5 5 PAA-2 Synthesis Example 2 4 [5 1]. Example 5 6 PAA-2 Synthesis Example 2 7 [5 7] Example 5 7 PAA-2 Synthesis Example 2 8 [5 9] <Example 5 8 to 7 1 > The compound described in the following Table 4 produced by the above synthesis example of the compound is described in Table 4 with respect to the solid component of the polyaminic acid (PAA-3) solution (i.e., polyamine acid (PAA-3)). The amount of the mass% was added to the polyamic acid (PAA-3) solution (40.0 g) prepared above, and stirred at room temperature to obtain a homogeneous solution to prepare the polyimine film of Examples 58 to 71. Coating solution. -114-201240981 [Table 4] Compound addition amount (wt%) for polyaminic acid modification Example 5 8 PAA-3 [6 3] 5 Example 5 9 PAA-3 [6 3] ------ -: _ 1 0 Example 6 0 PAA-3 [6 3] 2 0 Example 6 1 PAA-3 [6 3] 3 0 Example 6 2 PAA-3 [6 3] 5 0 Example 6 3 PAA- 3 [6 3] 7 0 Example 6 4 PAA-3 [6 3] 10 0 Example 6 5 P AA- 3 [6 5] 5 Example 6 6 PAA-3 [6 5] 10 Example 6 7 PAA -3 [6 5] 2 0 Example 6 8 PAA-3 [6 5] 3 0 Example 6 9 PAA-3 [6 5] To Example 7 〇PAA — 3 [6 5] 7 0 Example 7 1 P AA-3 [6 5] 10 0 <Examples 72 to 74 > Each of the compounds described in the above Synthesis Examples prepared by the above-mentioned synthesis examples of the compounds for modification, with respect to poly-proline (PAA- 2) The solid content of the solution (i.e., polyamic acid (P AA-2)) is in the proportions shown in Table 5 below, and the polylysine (PAA-2) solution prepared above is added (7〇. In 〇g), the mixture was stirred at room temperature to obtain a homogeneous solution, and the coating liquids for forming polyimine films of Examples 72 to 74 were prepared. [Table 5] Amount of the compound for polyamine acid modification (wt%) Example 7 2 PAA-2 Synthesis Example 2 3 [49] 10 Example 7 3 PAA-2 Synthesis Example 2 3 [49] 15 Example 7 4 PAA-2 Synthesis Example 2 3 [4 9] 2 0 -115-201240981 <Examples 75 to 90> Each of the compounds described in the following Table 6 produced by the above-mentioned synthesis examples of the compound for modification is used in relation to The solid component of the soluble polyimine (SP 1-1) solution (ie, soluble polyimine (SPI-1)) is in the proportions shown in Table 6 below, and the soluble polyimine prepared above is added. In the (SP 1-1) solution (10. g), the mixture was stirred at room temperature to obtain a homogeneous solution, and the coating liquids for forming polyimine films of Examples 75 to 90 were prepared. [Table 6] Addition amount (wt%) of the soluble type for the soluble polyimine modification Example 7 5 SP I-1 Synthesis Example 5 [13] 10 Example 7 6 SPI - 1 Synthesis Example 6 [15] 10 Implementation Example 7 7 SP I - 1 Synthesis Example 7 [17] 10 Example 7 8 SP I - 1 Synthesis Example 9 [2 1] 10 Example 7 9 SP I -1 Synthesis Example 1 3 [2 9] 10 Example 8 0 SPI - 1 Synthesis Example 1 6 [3 5J 10 Example 8 1 SPI - 1 Synthesis Example 1 7 [3 7] 1 0 Example 8 2 SP I - 1 Synthesis Example 1 8 [3 9] 10 Example 8 3 SPI-1 Synthesis Example 2 2 [4 7] 10 Example 8 4 SP 1-1 Synthesis Example 2 3 [4 9] 10 Example 8 5 . SPI - 1 Synthesis Example 2 4 [5 1] 10 Example 8 6 SP I - 1 Synthesis Example 3 2 [6 6] 10 Example 8 7 SPI - 1 Synthesis Example 3 0 [6 3] 5 Example 8 8 SP I - 1 Synthesis Example 3 0 [6 3] 10 Example 8 9 SP I - 1 Synthesis Example 3 0 [6 3] 3 0 Example 9 0 SPI - 1 Synthesis Example 3 0 [6 3] 5 0 <Examples 91 to 1 02 and Comparative Example 1 > [Crosslinking effect Confirmation test (release test)] The coating liquids for forming the polyimide film of the above Examples 75 to 86 were spin-coated (2500 rpm / 30 seconds) on a ruthenium circuit board, and placed. 2 3 0 art hot plate is baked for 30 minutes to form a coating film [al]. The film thickness of the obtained coating film [al] was measured using a Suffolk ET4000M company. Next, the circuit board of -116-201240981 film [al] will be installed again on the spin coater, and the NMP will be completely covered with the circuit board and left to stand for 60 seconds. Then spin dry NMP (1500 rpm / 30 seconds). The film was fired on a hot plate at 100 ° C for 30 seconds, and the residual film was used as a coating film [0.2]. The film thickness of the coating film [a2] was measured again, and the residual film ratio was calculated by the following calculation formula. In Comparative Example 1, the same operation was carried out on the above-prepared soluble polyimine (SPI-1) solution, that is, the soluble polyimine solution containing no modification compound represented by the above formulas [A] to [D]. , calculate the residual film rate. The results are shown in Table 7. Residual film rate (%) = film thickness of coating film [a2] / film thickness of coating film [al] X100 From the results, it was confirmed that a coating liquid for forming a polyimide film using a compound for adding a modification (liquid crystal alignment) The treatment agent) can improve the solvent resistance of the coating film (polyimine film). Therefore, the compound for modification is introduced into the soluble polyimine. Further, in Examples 75 to 85 in which the compound for modification represented by the above formula [A] having two or more Meldronic acids was used, in particular, the residual film ratio was high. Therefore, it is estimated that the soluble polyimine can be crosslinked by the modifying compound represented by the above formula [A]. Further, by appropriately selecting the compound for modification represented by the above formula [A], it was confirmed that the solubility of the coating film can be controlled relatively freely. Similarly, after the release film test was carried out using the coating film formed by using the coating liquid for forming a polyimide film of Examples 1 to 74 and Examples 87 to 90, when the compound for the modification was not added, the residue was improved. Since the film ratio was confirmed, it was confirmed that the solvent resistance of the polyimide film was improved by using the coating liquid for forming a polyimide film with the compound for modification. S-. -117- 201240981 [Table 7] . Coating solution for forming a polyimide film. Film 丨a 1] MM (nm) Coating film ia2] (nm) Rate (%) Implementation Example No. Modified 潍 Example 9 1 » Example 75 Synthesis Example 5 [1 3] 18 0 14 3 7 9.4 Example 9 2 Example 7 6 Synthesis Example 6 [15] 1 84 147 7 9.9 Example 9 3 Example 7 Synthesis Example 7 [1 7] 16 0 15 1 94. 2 Example 9 4 Example 7 8. Synthesis Example 9 [2 1] 16 5. 15 2 9 2.1 Example 9 5 Example 7 9 Synthesis Example 1 3 [2 91 14 9 14 0 94. 6 Example 9 6 Example 8 0 Synthesis Example 1 6 [3 5] 1.4 7 10 7 7 2. 8 Example 9 7 Example 8 1 Synthesis Example 1 7 [ 3 7] 1 24 6 9 5 5.7 Example 9 8 Example 8 2 Synthesis Example 1 8 [3 9] 16 4 10 2 62. 2 Example 9 9 Example 8 3 Synthesis Example 2 2 [4 7] 17 7 111 6 2. 7 Example 1Q 0 Example 8 4 Synthesis Example 2 3 [4 91 17 0 10 4 6 1. 2 Example 10 1 Example 8 5 Synthesis Example 2 4 [5 1] 17 3 113 6 5.3 Implementation Example 1 0 2 Example 8 6 Synthesis Example 3 2 16 6] 146 7 3 50. 〇Comparative Example 1 - None 15 1 0 No residual film [Production of liquid crystal alignment film and liquid crystal cell] The coating liquid (liquid crystal alignment agent) for forming a polyimide film prepared in each of the Examples was prepared, and a liquid crystal cell was produced by the following method. The coating liquid (liquid crystal alignment agent) for forming a polyimide film is spin-coated on a glass substrate or a glass substrate with an ITO transparent electrode, and dried on a hot plate at 80 ° C for 70 seconds, and then baked at a certain degree. The film was formed to have a film thickness of 10 nm. Thereafter, using a brushing device having a roll diameter of 1 to 20 nm, the surface of the coating film is brushed with artificial silk using a certain brushing condition, and the liquid crystal alignment by brushing is performed.
理,得附液晶配向膜V之基板。另外將曝光量變化於OmJ 至lOOOmJ之間之直線偏光UV光線(UV波長313nm,照 射強度8.0mW/cnT2),由相對於板之法線傾斜40°之方向 照射於該塗膜面,進行藉由光之液晶配向處理。調製直線 偏光UV之方法爲,使高壓水銀燈之紫外光通過313 nm之 帶通濾光器後,再通過313 nm之偏光板。 -118- 201240981 準備2枚該類經液晶配向處理之附液晶配向膜之基 板’將6μηι之調距器散佈於其中1枚之液晶配向膜面 上’再將封裝劑印刷於其上方,另一枚基板係以液晶配向 膜面對面方式使刷洗方向相互平行般貼合(反平行液晶單 元’實施例103至133),及以直交方式貼合(扭轉向列液 晶單元,實施例1 74至206、實施例3 22至3 43及實施例 344至3 50),另外有關照射UV之物係以使照射之偏光方 向平行之方式貼合(垂直配向型用反平行液晶單元,實施 例2〇7至209、實施例210至321),其後硬化封裝劑製作 空單元。相對於該空單元,以減壓注入法,將液晶MLC-20〇3(美爾庫公司製)注入反平行液晶單元,或將添加手徵 劑之液晶MLC-2003(美爾庫公司製)注入扭轉向列液晶單 元,或將液晶MLC-6608(美爾庫公司製)注入垂直配向型 用反平行液晶單元後,封裝注入口,得各自之液晶單元。 [評估液晶單元] 測定所得之各液晶單元之物性,及評估特性之方法如 下所述。又,各測定、評估中所製作之液晶配向膜及液晶 單元之基板、焙燒條件及刷洗條件總合如下所示。 〈實施例1 〇 3至1 3 3及比較例2至4 >〈液晶配向性 評估> 以偏光板挾持使用表8所示之各實施例所調製的形成 聚醯亞胺膜用之塗佈液所製作之液晶單元後,由後面照射 -119- 201240981 背光之狀態下回轉液晶單元,以目視觀察明暗變化及有無 流動配向下液晶是否配向。此時係以下述基準評估。又, 液晶配向性評估用所製作之液晶單元係以,基板使用玻璃 基板、形成聚醯亞胺膜用之塗佈液之塗膜的焙燒條件爲置 於加熱至23 0°C之熱板上焙燒30分鐘,及刷洗條件爲輥 回轉數300rpm、輥進行速度 50mm/sec、擠入量 0.15mm 之方法製作。又,調製未添加修飾用化合物及交聯劑之物 (比較例2),及添加一般市售之交聯劑之下述交聯劑的塗 佈液(比較例3或比較例4),比較效果。結果如表8所示。 評估基準 ◎:可確認液晶配向,且無流動配向 〇:液晶雖有配向,但觀察到若干流動配向 X :液晶雖有配向,但明察到大量流動配向 [化〗06]The substrate of the liquid crystal alignment film V is attached. In addition, the amount of exposure is changed from linear polarized UV light (UV wavelength 313 nm, irradiation intensity 8.0 mW/cnT2) between OmJ and 1000 mJ, and is irradiated onto the surface of the coating film by a direction inclined by 40° with respect to the normal line of the sheet. It is processed by the liquid crystal alignment. The method of modulating the linear polarized UV is to pass the ultraviolet light of the high pressure mercury lamp through a 313 nm band pass filter and then through a 313 nm polarizing plate. -118- 201240981 Prepare two substrates of this type of liquid crystal alignment film with liquid crystal alignment processing. Spread a 6μηι modulator on one of the liquid crystal alignment films and print the encapsulant on top of it. The substrates are bonded in such a manner that the brushing directions are parallel to each other in a liquid crystal alignment film (anti-parallel liquid crystal cells 'Examples 103 to 133), and are bonded in a straight manner (twisted nematic liquid crystal cell, Examples 1 74 to 206, Example 3 22 to 3 43 and Examples 344 to 3 50), in addition, the UV-irradiated material is attached in such a manner that the direction of polarization of the irradiation is parallel (vertical alignment type anti-parallel liquid crystal cell, Example 2〇7 to 209, Examples 210 to 321), wherein the hardening encapsulant is used to make an empty cell. The liquid crystal MLC-20〇3 (manufactured by Mercury Co., Ltd.) was injected into the antiparallel liquid crystal cell or the liquid crystal MLC-2003 (manufactured by Murku Co., Ltd.) to which the chiral agent was added, with respect to the empty cell. The twisted nematic liquid crystal cell is injected, or liquid crystal MLC-6608 (manufactured by Murku) is injected into the vertical alignment type anti-parallel liquid crystal cell, and then the injection port is packaged to obtain respective liquid crystal cells. [Evaluation of Liquid Crystal Cell] The physical properties of each of the obtained liquid crystal cells and the method of evaluating the characteristics are as follows. Further, the total of the substrate, the baking conditions, and the brushing conditions of the liquid crystal alignment film and the liquid crystal cell produced in each measurement and evaluation are as follows. <Example 1 〇3 to 133 and Comparative Examples 2 to 4 > <Liquid alignment evaluation> With a polarizing plate, the coating for forming a polyimide film prepared by using the respective examples shown in Table 8 was used. After the liquid crystal cell produced by the cloth liquid, the liquid crystal cell is rotated by the backlight-119-201240981 backlight to visually observe the change of light and dark and whether or not the liquid crystal is aligned with the liquid crystal. This is evaluated on the basis of the following criteria. In addition, in the liquid crystal cell produced by the liquid crystal alignment evaluation, the baking condition of the coating film using the glass substrate and the coating liquid for forming a polyimide film is placed on a hot plate heated to 23 ° C. The baking was carried out for 30 minutes, and the brushing conditions were as follows: a roll rotation number of 300 rpm, a roll speed of 50 mm/sec, and an extrusion amount of 0.15 mm. Further, a coating liquid (Comparative Example 2) in which a compound for modifying and a crosslinking agent were not added (Comparative Example 2) and a crosslinking agent to which a commercially available crosslinking agent was added (Comparative Example 3 or Comparative Example 4) was prepared and compared. effect. The results are shown in Table 8. Evaluation criteria ◎: The liquid crystal alignment can be confirmed, and there is no flow alignment. 〇: Although the liquid crystal has an alignment, a number of flow alignments are observed. X: Although the liquid crystal has an alignment, a large amount of flow alignment is observed. [Chem. 06]
交聯劑-1 交聯劑-2 由該結果確認,如比較例3及比較例4,使用市售交 聯劑時,一般傾向易阻礙液晶之配向性,但使用本發明之 添加修飾用化合物之形成聚醯亞胺膜用之塗佈液時,既使 使用具有2個以上之梅爾德倫構造部位之修飾用化合物, 也不會阻礙液晶之配向性,因此依情形也可提升配向性。 -120- 201240981 [表8]Crosslinking agent-1 Crosslinking agent-2 From the results, it was confirmed that, in Comparative Example 3 and Comparative Example 4, when a commercially available crosslinking agent is used, it tends to hinder the alignment of the liquid crystal, but the compound for addition modification of the present invention is used. When a coating liquid for a polyimide film is formed, even if a compound for modifying having two or more Meldron structure sites is used, the alignment property of the liquid crystal is not inhibited, so that the alignment property can be improved depending on the case. . -120- 201240981 [Table 8]
形成聚酿碰麵之塗佈液 評估 結果 實施例編號 聚醯胺酸 修飾用化合物 麵 添加量(wt%) 實施例1 0 3 食施例1 PAA- 1 [11] 1Omo 1 % 〇 實施例10 4 實施例2 PAA- 1 [13] 1Omo1 % 〇 實施例1 〇 5 實施例3 PAA— 1 [15] 1Omo1 % 〇 實施例1 〇 6 實施例4 PAA- 1 [1 7] 1Omo1 % 〇 _實施例1 0 7 «施例5 PAA-1 [2 1] 10 mo 1 % ◎ 實施例1〇 8 實施例6 PAA- 1 [3 7] 1Omo 1 % 〇 *施例1 0 9 實施例7 PAA-1. 13 9] 1Omo1 % ◎ 實施例11〇 實施例8 PAA-1 [4 7] 1Omo1 % ο 實施例1 1 1 實施例9 PAA-1 [4 91 1Omo1 % 〇 實施例1 1 2 實施例1 〇 PAA-1 [5 1) 1Omo1 % ◎ 賣施例1 1 3 實施例1 1 PAA-1 [5 1] 1 w t % ◎ 實施例1 1 4 實施例1 2 PAA-1 [5 1] 3wt % ◎ 實施例1 1 5 實施例1 3 PAA- 1 [5 11 5wt % ◎ 實施例1 1 6 *施例1 4 PAA- 1 [5 11 1 Owt% ◎ 實施例1 1 7 實施例1 5 PAA- 1 [5 11 2 0 w t % ◎ 貪施例1 1 8 *施例1 6 PAA-1 [4 7] lwt % 〇 9mm 19 實施例1 7 PAA-1 [4 7J 3w t % 〇 黉施例12 0 實施例1 8 PAA- 1 [4 7] 5wt% 〇 實施例12 1 實施例1 9 PAA- 1 [471 1 Ow t % ο 實施例12 2 實施例2 1 PAA- 1 [4 91 lwt% 〇 實施例12 3 實施例2 2 PAA- 1 [4 9] 3 w t % 〇 實施例12 4 實施例2 3 PAA- 1 [4 9】 5 w t % 〇 實施例12 5 實施例2 4 PAA- 1 [4 9] 1 Owt % 〇 實施例12 6 實施例2 6 PAA. — 1 [5 5] lwt% 〇 實施例12 7 實施例2 7 PAA- 1 [5 5] 3w t % ο 實施例12 8 實施例2 8 PAA- 1 [5 5] 5 w t % 〇 實施例12 9 實施例2 9 ΡΛΑ- 1 [5 51 1 Ow t % 〇 實施例13 0 實施例3 1 PAA- 1 [5 9] lwt% ◎ 實施例13 1 實施例3 2 P AA- 1 [5 9] 3 w t % ◎ 實施例13 2 實施例3 3 PAA— 1 [5 9】 5 w t % ◎ 實施例13 3 實施例3 4 P AA - 1 [5 9] 1 Ow t % 〇 比較例2 一 PAA— 1 Μ ^\w — 〇 比較例3 一 PAA-1 . 交聯劑-1 1 OmoI % X 比較例4 — PAA- 1 交聯劑-2 1Omo1 % X <實施例1 3 4至1 7 3及比較例5至6 >〈刷洗耐性評 估> 使用共焦點雷射顯微鏡觀察使用表9-1至表9-2所示 之各實施例所調製的形成聚醯亞胺膜用之塗佈液所製作的 液晶配向膜之表面,再以下述基準評估。又係以,基板使 201240981 用附ITO透明電極之玻璃基板、形成聚醯亞胺膜用之塗佈 液之塗膜的焙燒條件爲置於加熱至230°C之熱板上焙燒30 分鐘,及刷洗條件爲輕回轉數1000 rpm、輥進行速度 50mm/sec、擠入量〇.5mm之方法製作。又,調製未添加 修飾用化合物之物(比較例5及比較例6),比較效果。結果 如表9-1至表9-2所示。 〇:未觀察到削渣及刷洗傷 △:觀察到削渣及刷洗傷 X :膜剝離或目視觀察到刷洗傷 由該結果確認,比較未添加修飾用化合物之比較例5 及比較例6時,使用添加具有2個以上之梅爾德倫酸構造部 位之修飾用化合物的形成聚醯亞胺膜用之塗佈液時’既使使 用任何聚合物均可改善削剝耐性。 -122- 201240981 [表 9-1] 形成聚醯亞胺膜用之塗佈液 結果 實施例編號 聚醯胺酸 修飾用化合物 麵 添加量(Wt%) 實施例1 3 4 實施例1 PAA- 1 [11] 1Omo 1 % 〇 實施例1 3 5 實施例2 ΡΑΛ- 1 [i 31 10 mo 1 % 〇 實施例1 3 6 實施例3 PAA-1 [1 5) 1Omo 1 % 〇 實施例1 3 7 實施例4 PAA- 1 【17】 1Omo1 % 〇 實施例1 3 8 實施例5 PAA- 1 [2 1】 1Omo 1 % 〇 實施例1 3 9 實施例6 PAA- 1 [3 7] 1Omo 1 % 〇 實施例14 0 實施例1 0 PAA- 1 [5 1] 1Omo 1 % 〇 實施例141 實施例1 1 P A A — 1 [5 1] 1 w t % 〇 實施例14 2 實施例1 2 PAA-1 [5 1.] 3 w t % 〇 實施例14 3 實施例1 3 PAA-1 [5 1】 5 w t % 〇 實施例14 4 實施例1 4 PAA-1 [5 1】 1 0 w t % 〇 實施例14 5 實施例1 5 PAA-1 [5 1】 2 0 w t % 〇 實施例14 6 實施例1 6 PAA-1 [4 7] 1 w t % 〇 實施例14 7 實施例1 7 PAA-1 [4 7] 3 w t % 〇 實施例14 8 實施例1 8 PAA-1 [4 7] 5 w t % 〇 實施例14 9 實施例1 9 PAA-1 [4 7】 1 0 w t % 〇 實施例1 5 0 實施例2 1 PAA-1 [4 9] 1 w t % 〇 實施例151 實施例2 2 PAA— 1 [49] 3 w t % 〇 實施例1 5 2 . 實施例2 3 PAA-1 [4 9] 5 w t % 〇 實施例1 5 3 實施例2 4 PAA-1 [4 9]. 1 0 w t % 〇 實施例1 5 4 實施例2 6 ΡΛΑ- 1 【5 5] 1 w t % 〇 實施例1 5 5 實施例2 7 PAA-1 [5 5】 3 w t % 〇 實施例1 5 6 實施例2 8 PAA-1 [5 5] 5 w t % 〇 實施例1 5 7 實施例2 9 PAA-1 [5 5] 1 0 w t % 〇 實施例1 5 8 實施例3 1 PAA- 1 [5 9] 1 w t % 〇 實施例1 5 9 實施例3 2 PAA- 1 [5 9】 3 w ΐ % 〇 實施例1 6 0 實施例3 3 PAA-1 [5 9] 5 w t % 〇 實施例161 實施例3 4 PAA— 1 [5 9】 1 0 w t % 〇 比較例5 - PAA- l 無 — △Evaluation result of coating liquid for forming a blister surface Example No. of compounding amount of compound for polyaminic acid modification (wt%) Example 1 0 3 Food application example 1 PAA-1 [11] 1Omo 1 % 〇 Example 10 4 Example 2 PAA-1 [13] 1Omo1 % 〇 Example 1 〇 5 Example 3 PAA-1 [15] 1Omo1 % 〇 Example 1 〇 6 Example 4 PAA-1 [1 7] 1Omo1 % 〇 Example 1 0 7 «Example 5 PAA-1 [2 1] 10 mo 1 % ◎ Example 1 〇 8 Example 6 PAA-1 [3 7] 1Omo 1 % 〇 * Example 1 0 9 Example 7 PAA- 1. 13 9] 1Omo1 % ◎ Example 11 〇 Example 8 PAA-1 [4 7] 1Omo1 % ο Example 1 1 1 Example 9 PAA-1 [4 91 1Omo1 % 〇 Example 1 1 2 Example 1 〇PAA-1 [5 1) 1Omo1 % ◎ Selling Example 1 1 3 Example 1 1 PAA-1 [5 1] 1 wt % ◎ Example 1 1 4 Example 1 2 PAA-1 [5 1] 3wt % ◎ Example 1 1 5 Example 1 3 PAA-1 [5 11 5 wt % ◎ Example 1 1 6 * Example 1 4 PAA-1 [5 11 1 Owt% ◎ Example 1 1 7 Example 1 5 PAA- 1 [5 11 2 0 wt % ◎ Greedy Example 1 1 8 *Example 1 6 PAA-1 [4 7] lwt % 〇9mm 19 Example 1 7 PAA-1 [4 7J 3w t % 〇黉Example 12 0 Example 1 8 PAA-1 [4 7] 5 wt% 〇 Example 12 1 Example 1 9 PAA-1 [471 1 Ow t % ο Example 12 2 Example 2 1 PAA-1 [4 91 lwt % 〇Example 12 3 Example 2 2 PAA-1 [4 9] 3 wt % 〇 Example 12 4 Example 2 3 PAA-1 [4 9] 5 wt % 〇 Example 12 5 Example 2 4 PAA- 1 [4 9] 1 Owt % 〇 Example 12 6 Example 2 6 PAA. — 1 [5 5] lwt% 〇 Example 12 7 Example 2 7 PAA-1 [5 5] 3w t % ο Example 12 8 Example 2 8 PAA-1 [5 5] 5 wt % 〇 Example 12 9 Example 2 9 ΡΛΑ - 1 [5 51 1 Ow t % 〇 Example 13 0 Example 3 1 PAA-1 [5 9] Lwt% ◎ Example 13 1 Example 3 2 P AA-1 [5 9] 3 wt % ◎ Example 13 2 Example 3 3 PAA-1 [5 9] 5 wt % ◎ Example 13 3 Example 3 4 P AA - 1 [5 9] 1 Ow t % 〇Comparative Example 2 A PAA-1 Μ ^\w — 〇Comparative Example 3 A PAA-1 . Crosslinking agent - 1 1 OmoI % X Comparative Example 4 - PAA-1 Crosslinking agent-2 1Omo1 % X <Example 1 3 4 to 1 7 3 and Comparative Examples 5 to 6 > <Brushing resistance evaluation> Using a confocal laser microscope to observe Table 9-1 to Table The surface of the liquid crystal alignment film produced by the coating liquid for forming a polyimide film prepared in each of the examples shown in 9-2 was evaluated on the basis of the following criteria. Further, the substrate is used to heat the glass substrate of the ITO transparent electrode and the coating film for forming the coating liquid for the polyimide film of 201240981 by baking on a hot plate heated to 230 ° C for 30 minutes, and The brushing conditions were produced by a method of a light swing number of 1000 rpm, a roll speed of 50 mm/sec, and a crushing amount of 55 mm. Further, the compound to which the compound for modification was not added (Comparative Example 5 and Comparative Example 6) was prepared to compare the effects. The results are shown in Table 9-1 to Table 9-2. 〇: No slag and brushing were observed. Δ: slag and brushing were observed. X: Film peeling or visual observation of the brushing was confirmed by the results, and Comparative Example 5 and Comparative Example 6 in which no modifying compound was added were compared. When a coating liquid for forming a polyimide film is added by using a compound for modification having two or more Meldronic acid structural sites, the peeling resistance can be improved even if any polymer is used. -122-201240981 [Table 9-1] Coating liquid for forming a polyimide film Example Example No. Polysaccharide-modified compound surface addition amount (Wt%) Example 1 3 4 Example 1 PAA-1 [11] 1Omo 1 % 〇 Example 1 3 5 Example 2 ΡΑΛ-1 [i 31 10 mo 1 % 〇 Example 1 3 6 Example 3 PAA-1 [1 5] 1Omo 1 % 〇 Example 1 3 7 Example 4 PAA-1 [17] 1Omo1 % 〇 Example 1 3 8 Example 5 PAA-1 [2 1] 1Omo 1 % 〇 Example 1 3 9 Example 6 PAA-1 [3 7] 1Omo 1 % 〇 Example 14 0 Example 1 0 PAA-1 [5 1] 1Omo 1 % 〇 Example 141 Example 1 1 PAA — 1 [5 1] 1 wt % 〇 Example 14 2 Example 1 2 PAA-1 [5 1.] 3 wt % 〇 Example 14 3 Example 1 3 PAA-1 [5 1] 5 wt % 〇 Example 14 4 Example 1 4 PAA-1 [5 1] 1 0 wt % 〇 Example 14 5 Example 1 5 PAA-1 [5 1] 2 0 wt % 〇 Example 14 6 Example 1 6 PAA-1 [4 7] 1 wt % 〇 Example 14 7 Example 1 7 PAA-1 [4 7] 3 wt % 〇 Example 14 8 Example 1 8 PAA-1 [4 7] 5 wt % 〇 Example 14 9 Example 1 9 PAA-1 [4 7] 1 0 wt % 〇 Example 1 5 0 Example 2 1 PAA-1 [4 9] 1 wt % 〇 Example 151 Example 2 2 PAA-1 [49] 3 wt % 〇 Example 1 5 2 . Example 2 3 PAA- 1 [4 9] 5 wt % 〇 Example 1 5 3 Example 2 4 PAA-1 [4 9]. 1 0 wt % 〇 Example 1 5 4 Example 2 6 ΡΛΑ-1 [5 5] 1 wt % 〇Example 1 5 5 Example 2 7 PAA-1 [5 5] 3 wt % 〇 Example 1 5 6 Example 2 8 PAA-1 [5 5] 5 wt % 〇 Example 1 5 7 Example 2 9 PAA-1 [5 5] 1 0 wt % 〇 Example 1 5 8 Example 3 1 PAA-1 [5 9] 1 wt % 〇 Example 1 5 9 Example 3 2 PAA-1 [5 9] 3 w ΐ % 〇 Example 1 6 0 Example 3 3 PAA-1 [5 9] 5 wt % 〇 Example 161 Example 3 4 PAA-1 [5 9] 1 0 wt % 〇Comparative Example 5 - PAA- l None — △
S -123- 201240981 [表 9-2]S -123- 201240981 [Table 9-2]
形成聚醯亞胺膜用之塗佈液 結果 實施例編號 聚醯胺酸 修飾用化合物 讎 添加量(wt%) 實施例16 2 實施例4 6 FAA-2 [11】 1 0w t % Δ 實施例16 3 實施例4 7 PAA-2 [1 31 1 Owt% Δ 實施例16 4 實施例4 8 PAA-2 (1 5] 1 0 w t % △ 實施例16 5 實施例4 9 PAA-2 [17】 1 0w t % △ 實施例1 6 6 實施例5 0 PAA-2 12 1] 1 0 w t % 〇 實施例16 7 實施例5 1 PAA-2 [3 7] 1 Ow t % 〇 實施例16 8 實施例5 2 PAA-2 13 9] 1 Owt % 〇 實施例16 9 實施例5 3 PAA-2. [4 71 1 Owt % Δ 實施例17 0 實施例5 4 PAA-2 [4 9) 1 Owt % 〇 實施例171 實施例5 5 PAA-2 「【5 1] 1 Owt% 〇 實施例17 2 實施例5 6 PAA-2 15 7] 1 Owt % 〇 實施例17 3 實施例5 7 PAA-2 [5 9】 1 0 w t % 〇 比較例6 - PAA-2 無 — X 〈實施例1 74至2 06及比較例7 >〈測定扭轉向列液晶 單元之預傾角> 以105°C加熱使用表10所示之各實施例所調製的形成 聚醯亞胺膜用之塗佈液所製作之液晶單元5分鐘後,測定預 傾角。預傾角係使用Axo Metrix公司之「Axo Scan」以米 勒矩陣法測定。又,測定扭轉向列液晶單元之預傾角用所 製作之液晶單元係以,基板使用附ITO透明電極之玻璃基 板、形成聚醯亞胺膜用之塗佈液之塗膜的焙燒條件爲置於 加熱至2 3 ot之熱板上焙燒3 0分鐘,及刷洗條件爲輥回 轉數lOOOrpm、輕進行速度50mm/sec、擠入量0.3mm之 方法製作。又,調製未添加修飾用化合物之物(比較例 7),比較效果。結果如表10所示。 由該結果確認,適當選擇修飾用化合物之種類及添加 量,可得到任意之所希望之預傾角。 -124- 201240981 [表 10] 形成聚醢亞胺膜 用之塗佈液 預傾角 實施例編號 聚醯胺酸 修飾用化合物 (。 ) 麵 添加量hm) 實施例1 7 4 實施例1 1 PAA- 1 【5 1】 1 3. 0 實施例1 7 5 實施例1 2 PAA—1 [5 1] 3 11 7 實施例17 6 實施例1 3 PAA- 1 [5 1】 5 2 0 2 實施例1 7 7 實施例14 .PAA—1 [5 1】 10 6 5 4 實施例1 7 8 實施例1 5 PAA- 1 15 1】 2 0 8 7 2 實施例17 9 實施例1 6 PAA- 1 [4 7】 1 2. 9 實施例18 0 實施例1 7 PAA- 1 14 7] 3 4. 4 實施例18 1 貫施例1 8 PAA-1 [4 7] 5 6. 8 實施例18 ? 實施例19 PAA-1 [47] 10 3 5· 3 實施例18 3 實施例2 0 PAA- 1 [4 7] 2 0 5 4. 0 實施例184 實施例2 1 PAA- 1. (4 9] 1 2. 6 實施例18 5 實施例2 2 PAA-1 [4 9] 3 3. 8 實施例18 6 實施例2 3 PAA- 1 14 9] 5 6. 3 實施例18 7 實施例2 4 PAA-1 【4 9] 10 1 5. 2 實施例18 8 實施例2 5 PAA - 1 [4 9】 2 0 4 9· 6 實施例18 9 實施例2 6 PAA — 1 15 5] 1 2. 6 實施例19 0 .實施例27 PAA- 1 15 5] 3 2. 7 實施例1 9 1 實施例2 8 PAA - 1 [5 51 5 2. 8 實施例1 9 2 實施例2 9 PAA- 1 【5 51 10 3. 4 實施例1 9 3 實施例3 0 PAA- 1 [5 5] 2 0 6. 6 實施例194 實施例3 1 PAA- 1 [5 9] 1 2. 6 實施例1 9 5 實施例3 2 PAA- 1 [5 9] 3 2. 7 實施例1 9 6 實施例3 3 PAA- 1 [5 9] 5 3. 0 實施例1 9 7 實施例3 4 PAA- 1 [5 9] 10 3. 1 實施例1 9 8 實施例3 5 ΡΑΛ— 1 [5 9] 2 0 4. 1 實施例19 9 實施例3 6 PAA- 1 [6 8] 1 1. 5 實施例2 0 0 實施例3 8 PAA- 1 [6 8】 5 1.6 實施例2 0 ]. 實施例3 9 PAA- 1 【6 8】 10 1. 6 實施例2 0 2 實施例4 0 PAA- 1 [6 8] 2 0 1. 7 實施例2 0 3 實施例4 1 PAA- 1 [7 0] 1 2. 1 實施例2 0 4 實施例4 3 PAA-1 [7 0】 5 2. 3 實施例2 0 5 實施例4 4 PAA- 1 [7 0] 10 2. 5 實施例2 0 6 實施例4 5 PAA- 1 17 0] 2 0 4, 3 比較例7 — PAA-1 無 — 1. 4 〈實施例207至2 09及比較例8 >〈測定反平行液晶單 元之預傾角> 以1 20°C加熱使用表1 1所示之各實施例所調製的形成 聚醯亞胺膜用之塗佈液所製作之液晶單元1小時後,測定預 傾角。預傾角係使用Axo Metrix公司之「Axo Scan」以米 -125- 201240981 勒矩陣法測定。又,測定反平行液晶單元之預傾角用所製 作之液晶單元係以,基板使用附ITO透明電極之玻璃基 板、形成聚醯亞胺膜用之塗佈液之塗膜的焙燒條件爲於加 熱至200°c之熱風循環式烤箱內焙燒30分鐘之方法,於 未進行配向處理下製作前述液晶單元。又,調製未添加修 飾用化合物之物(比較例8 ),比較效果。結果如表1 1所 示。 由該結果確認,比較未添加修飾用化合物之比較例8 時,使用添加修飾用化合物之形成聚醯亞胺膜用之塗佈液可 明顯增加預傾角。因此添加修飾用化合物下,既使含有形成 聚醯亞胺膜用之塗佈液之聚醯亞胺先驅物或聚醯亞胺未導入 散佈液晶之支鏈成分,也可使液晶垂直配向》 [表 11] 形成聚醯亞月 安膜用之塗佈液 預傾角 (。) 實施例編號 聚醯胺酸 修飾用 化合物 喔 添加量加⑶ 實施例2 0 7 實施例7 2 PAA- 2 [4 9] 10 9 0.0 實施例2 0 8 實施例7 3 PAA-2 [4 91 1 5 9 0.0 實施例2 0 9 實施例7 4' PAA- 2 14 9] 2 0 9 0. 0 比較例8 - PAA- 2 Jrrr m — 1. 3 <實施例2 1 0至32 1 ><評估液晶配向性及測定反平行 液晶單元之預傾角> 以偏光板挾持使用表12-1至12-4所示之各實施例所調 製的形成聚醯亞胺膜用之塗佈液所製作之液晶單元後,由背 面照射背光之狀態下回轉液晶單元,以目視觀察明暗變化及 有無流動配向下液晶是否配向,結果具有良好之配向性。其 後將3V之交流電壓施加於液晶單元,以目視觀察液晶是否 -126- 201240981 配向。此時以下述基準評估。又,評估液晶配向性用所製 作之液晶單元係以,基板使用玻璃基板、形成聚醯亞胺膜用 之塗佈液之塗膜的焙燒條件爲置於加熱至20(TC之熱風循環 式烤箱中焙燒30分鐘後,對所得之附塗膜之玻璃基板進行 前述光配向處理之方法製作。 評估基準 良好:可確認液晶配向,且無流動配向 不良:液晶雖有配向,但觀察到大量流動配向 又’以120°C加熱使用表12-1至12-4所示之各實施例 所調製的形成聚醯亞胺膜用之塗佈液所製作之液晶單元1小 時後,測定預傾角。預傾角係使用 Axo Metrix公司之 「Αχ〇 Scan」,以米勒矩陣法測定。 由該結果確認,使用添加具有光反應性支鏈之修飾用 化合物的形成聚醯亞胺膜用之塗佈液(液晶配向處理劑)進 行光配向處理時,均可得良好之垂直配向性。又確認,將 偏光之紫外線照射於本發明之形成聚醯亞胺膜用之塗佈液 (液晶配向處理劑),可以僅少許傾斜於垂直之狀態得到液 晶配向之能力。另外確認藉由控制添加量及照射量,也可 微調整預傾角。由此得知本發明之形成聚醯亞胺膜用之塗 佈液(液晶配向處理劑)可利用於垂直配向方式之液晶顯示 元件用之液晶配向膜,又適用爲使用光配向法之液晶配向 膜。 -127- 201240981 [表 12-1] 形成聚醯亞胺膜用之1 請液 照射強度 (ni J) 液晶配向性 預傾角 (° ) 實施例編號 麵 添加量 _ 未施加 電壓時 施加 電壓時 實施例2 1 0 實施例5 8 [6 3] 5 0 良好 不良 9 0. 0 0 實施例2 1 1 實施例5 8 [6 3] 5 2 0 良好 良好 9 0. 0 0 實施例2 1 2 實施例5 8 [6 31 5 5 0 良好 良好 9 0. 0 0 實施例2 1 3 實施例5 8 [6 3] 5 10 0 良好 良好 9 0. 0 0 實施例214 實施例5 8 [6 3】 5 2 0 0 良好 良好 9 0. 0 0 實施例2 1 5 實施例5 8 [6 3】 5 4 0 0 良好 良好 8 9. 9 4 實施例21 6 實施例5 8 16 3] 5 8 0 0 良好 良好 8 9. 9 2 實施例2 1 7 實施例5 8 [6 3] 5 1 0 0 0. 良好 良好 8 9. 8 6 實施例2 I 8 實施例5 9 [6 3] 10 0 良好 不良 9 0. 0 0 實施例2 1 9 實施例5 9 [6 3] 1 0 2 0 良好 良好 9 0. 0 0 實施例2 2 0 實施例5 9 【6 3] 10 5 0 良好 良好 9 0. 0 0 實施例2 2 1 實施例5 9 [6 3】 1 0 10 0 良好 良好 8 9. 9 6 實施例2 2 2 實施例5 9 16 3] 10 2 0 0 良好 良好 8 9. 8 4 實施例2 2 3 實施例5 9 [6 3] 10 4 0 0 良好 良好 8 9. 8 5 實施例2 2 4 實施例5 9 [6 3] 10 8 0 0 良好 良好 8 9. 7 7 實施例22 5 實施例5 9 [6 31 1 0 10 0 0 良好 良好 8 9. 8 0 實施例2 2 6 實施例6 0 [6 3] 2 0 0 良好 不良 9 0. 0 0 實施例2 2 7 實施例6 0 [6 3】 2 0 2 0 良好 良好 8 9, 8 6 實施例2 2 8 實施例6 0 [6 3】 2 0 5 0 良好 良好 8 9. 9 0 實施例2 2 9 實施例6 0 [6 3] 2 0 10 0 良好 良好 8 9. 9 7 實施例2 3 0 實施例6 0 [6 31 2 0 2 0 0 良好 良好 8 9. 9 0 實施例2 3 1 實施例6 〇 [6.3] 2 0 4 0 0 良好 良好 8 9. 8 9 實施例2 3 2 實施例6 0 16 31 2 0 8 0 0 良好 良好 8 9. 9 2 實施例2 3 3 實施例6 0 [6 3] 2 0 10 0 0 良好 良好 8 9. 8 9 實施例2 3 4 實施例6 1 [6 3] 3 0 0 良好 不良 9 0, 0 0 實施例23 5 實施例6 1 【6 3] 3 0 2 0 良好 良好 8 9. 8 9 實施例2 3 6 實施例6 1 [6 3】 3 0 5 0 良好 良好 8 9. 9 5 實施例237 實施例6 1 [6 3] 3 0 10 0 良好 良好 8 9. 8 6 實施例2 3 8 實施例6 1 [6 3] 3 0 2 0 0 良好 良好 8 9. 8 9 實施例2 3 9 實施例6 1 【6 3] 3 0 4 0 0 良好 良好 8 9. 8 6 實施例2 4 0 實施例6 1 [6 3] 3 0 8 0 0 良好 良好 8 9. 9 0 實施例2 4 1 實施例6 1 [6 3】 3 0 10 0 0 良好 良好 8 9. 9 3 -128- 201240981 [表 12-2] 形成聚醯亞胺膜用之塗佈液 照射強度 (m J) 液晶配向性 預傾角 (。) 實施例編號 麵 添加量 (wt«) 未施加 電壓時 施加 電壓時 實施例242 實施例6 2 [6 31 5 0 0 良好 不良 9 0. 0 0 實施例243 實施例6 2 [6 3] 5 0 2 0 良好 良好 8 9. 9 5 實施例2 4 4 實施例6 2 [6 3】 5 0 5 0 良好 良好 8 9- 8 8 實施例245 實施例6 2 [6 3] 5 0 10 0 良好 良好 8 9. 9 2 實施例2 4 6 實施例6 2 [6 3] 5 0 2 0 0 良好 良好 8 9. 9 8 實施例247 實施例6 2 [6 3] 5 0 4 0 0 良好 良好 8 9. 9 3 實施例248 實施例6 2 [6 3] 5 0 8 0 0 良好 良好 8 9. 9 0 實施例2 4 9 *施例6 2 [6 3] 5 0 10 0 0 良好 良好 8 9. 8 8 實施例2 5 0 實施例6 3 [6 3】 7 0 0 良好 不良 9 0. 0 0 實施例2 5 1 實施例6 3 [6 3] 7 0 2 0 良圩 良好 8 9. 9 5 實施树2 5 2 實施例6 3 [6 3] 7 0 5 0 良好 良好 8 9. 9 7 實施例2 5 3 實施例6 3 【6 3】 7 0 10 0 良好 良好 8 9·. 9 3 實施例2 5 4 實施例6 3 [6 3] 7 0 2 0 0 良好 良好 8 9. 9 4 實施例2 5 5 實施例6 3 [6 3] 7 0 4 0 0 良好 良好 8 9. 9 5 實施例2 5 6 實施例6 3 [6 3】 7 0 8 0 0 良好 良好 8 9. 9 2 實施例2 5 7 實施例6 3 [6 3】 7 0 10 0 0 良好 良好 8 9. 9 0 實施例2 5 8 實施例6 4 [6 31 1 0 0 0 良好 不良 9 0. 0 0 實施例2 5 9 實施例6 4 [6 31 10 0 2 0 良好 良好 8 9. 9 3 實施例2 6 0 實施例6 4 [6 3】 10 0 5 0 良好 良好 8 9. 7 4 實施例2 6 1 實施例6 4 [6 3] 10 0 10 0 良好 良好 8 9. 9 4 實施例2 6 2 實施例6 4 [6 3】 10 0 2 0 0 良好 良好 8 9. 9 1 實施例2 6 3 賣施例6 4 [6 3】 1 0 0 4 0 0 良好 良好 8 9. 8 5 實施例264 實施例6 4 [6 31 10 0 8 0 0 良好 良好 8 9. 8 2 實施例2 6 5 實施例6 4 [6 3] 10 0 10 0 0 良好 良好 8 9. 8 1 實施例2 6 6 實施例6 5 [6 5] 5 0 良好 不良 9 0. 0 0 實施例2 6 7 實施例6 5 [6 5] 5 2 0 良好 良好 8 9. 9 3 實施例268 實施例6 5 [6 5】 5 5 0 良好 良好 8 9. 9 9 實施例2 6 9 實施例6 5 [6 5]. 5 10 0 良好 良好 8 9. 9 0 實施例2 7 0 實施例6 5 [6 51. δ 2 0 0 良好 良好 8 9. 8 9 實施例2 7 1 實施例6 5 [6 5] 5 4 0 0 良好 良好 8 9〇 8 8 實施例2 7 2 實施例6 5 [6 5] 5 8 0 0 良好 良好 8 9. 9 2 實施例2 7 3 實施例6 5 [6 5] 5 10 0 0 良好 良好 8 9. 9 4 -129- 201240981 [表 12-3] 形成聚醯亞胺膜用之塗佈液 照射強度 (m J) 液晶配向性 預傾角 (。) 實施例編號 觀 添加量 _ 未施加 電壓時 施加 電壓時 實施例2 7 4 實施例6 6 [6 5] 10 0 良好 不良 9 0. 0 0 實施例275 實施例6 6 [6 5] 1 0 2 0 良好 良好 8 9. 9 7 實施例2 7 6 實施例6 6 [6 5] 1 0 5 0 良好 良好 8 9. 9 9 實施例2 7 7 實施例6 6 【6 51 10 10 0 良好 良好 8 9. 9 3 實施例2 7 8 實施例6 6 [6 5] 10 2 0 0 良好 良好 8 9. 9 2 實施例279 實施例6 6 [6 51 10 4 0 0 良好 良好 8 9. 9 4 實施例2 8 0 實施例6 6 [6 51 10 8 0 0 良好 良好 8 9. 9 4 實施例2 8 1 實施例6 6 [6 51 1 0 10 0 0 良好 良好 8 9. 9 1 實施例2 8 2 實施例δ 7 [6 5] 2 0 0 良好. 不良 9 0. 0 0 實施例2 8 3 實施例6 7 [6 5】 2 0 2 0 良好 良好 8 9. 9 7 實施例2 8 4 實施例6 7 [6 5] 2 0 5 0 良好 良好 8 9. 9 0 實施例285 實施例6 7 [6 5] 2 0 10 0 良好 良好 8 9. 9 9 實施例2 8 6 實施例6 7 [6 5] 2 0 2 0 0 良好 良好 8 9. 8 5 實施例28 7 實施例6 7 [6 5] 2 0 4 0 0 良好 良好 8 9. 8 7 實施例2 8 8 實施例6 7 16 5] 2 0 8 0 0 良好 良好 8 9* 9 0 實施例2 8 9 實施例6 7 [6 51 2 0 . 10 0 0 良好 良好 8 9. 8 2 實施例2 9 0 實施例6 8 [6 51 3 0 0 良好 不良 9 0. 0 0 實施例29 1 實施例6 8 [6 5] 3 0 2 0 良好 良好 8 9. 9 2 賈施例2 9 2 實施例6 8 [6 51 3 0 5 0 良好 良好 8 9. 7 9 實施例2 9 3 實施例6 8 [6 5] 3 0 10 0 良好 良好 8 9. 7 6 實施例2 9 4 實施例6 8 [6 51 3 0 2 0 0 良好 良好 8 9. 9 0 實施例2 9 5 實施例6 8 [6 5] 3 0 4 0 0 良好 良好 8 9. 8 7 實施例2 9 6 實施例6 8 【6 5】 3 0 8 0 0 良好 良好 8 9. 8 7 實施例2 9 7 實施例6 8 [6 5] 3 0 10 0 0 良好 良好 8 9. 8 3 實施例2 9 8 實施例6 9 [6 5] 5 0 0 良好 不良 9 0. 0 0 實施例2 9 9 實施例6 9 [6 5) 5 0 2 0 良好 良好 8 9. 9 8 實施例3 0 0 實施例6 9 (6 5] 5 0 5 0 良好 良好 8 9. 9 9 實施例3 0 1 實施例6 9 [6 5] 5 0 10 0 良好 良好 8 9. 9 2 實施例3 0 2 實施例6 9 [6 5] 5 0 2 0 0 良好 良好 8 9. 7 7 實施例3 0 3 實施例6 9 [6 51 5 0 4 0 0 良好 良好 8 9. 8 6 實施例304 實施例6 9 [6 51 5 0 8 0 0 良好 良好 8 9. 8 9 實施例3 〇 5 實施例6 9 16 5) 5 0 10 0 0 良好 良好 8 9. 8 8 -130- 201240981 [表 12-4] 形成聚醯亞胺膜用之塗佈液 照射強度 (m J) ------ 液晶配向性 _______ 預顧 (。) 實施例編號 麵 添加量 _ 未施加 電壓時 施加 電壓時 實施例306 實施例7 0 [6 5] 7 0 0 良好 不良 9 0. 0 0 實施例3 0 7 實施例7 0 [6 5] 7 0 2 0 良好 Μ& 8 9. 9 0 實施例3 0 8 實施例7 0 [6 5] 7 0 5 0 良好 良好 8 9. 9 9 實施例309 實施例7 0 [65] 7 0 10 0 良好 良好 8 9. 8 9 實施例3 1 0 實施例7 0 [6 5】 7 0 2 0 0 良好 「良好 8 9. 8 6 實施例3 1 1 實施例7 0 [6 5] 7 0 4〇〇 良好 良好 8 9, 8 0 實施例3 12 實施例7 0 [6 5] 7 0 8〇〇 良好 良好 8 9. 8 4 實施例3 1 3 實施例7 0 【6 5] 7 0 10 0 0 良好 良好 8 9. 8 1 實施例314 實施例7 1 [6 5] 10 0 0 良好 不良 9 0. 0 0 實施例3 +1 5 實施例7 1 16 5] 10 0 2 0 良好 良好 8 9. 9 3 實施例3 1 6 實施例7 1 [6 5] 10 0 5 0 良好 8 9. 9 6 實施例317 實施例7 1 16 5] 10 0 10 0 良好 良好 8 9. 9 2 實施例318 實施例7 1 [65] 10 0 2〇〇 良好 良好 8 9. 9 0 實施例319 實施例7 1 [65】 10 0 4 0 0 良好 良好 8 9. 8 3 實施例3 2 0 實施例7 1 [6 5] 10 0 8 0 0 良好 良好 8 9. 7 5 實施例3 2 1 實施例7 1 [65] 10 0 10 0 0 良好 良好 8 9. 7 6 〈實施例3 22至3 43及比較例9> <測定電壓保持率 (VHR) > 測定使用表13所示之各實施例所調製之形成聚醯亞 胺膜用之塗佈液製作的液晶單元之初期狀態之電壓保持 率。測定電壓保持率之方法爲,90 °C之溫度下60 間施 加4V之電壓,測定16.67ms後之電壓,以可保持多少電 壓計算電壓保持率。測定電壓保持率時係使用東陽技術公 司製之VHR-1電壓保持率測定裝置。又,測定電壓保持 率(VHR)用所製作之液晶單元係以,基板使用附ITO透明 電極之玻璃基板、形成聚醯亞胺膜用之塗佈液之塗膜的焙 燒條件爲置於加熱至2 3 0 °C之熱板上焙燒3 0分鐘,及刷 洗條件爲輕回轉數lOOOrpm、輕進行速度 50mm/sec、擠 入量0.3mm之方法製作。又,調製未添加修飾用化合物 s -131 - 201240981 之物(比較例9),比較效果。結果如表1 3所示。 由該結果確認,使用添加修飾用化合物之形成聚醯亞 胺膜用之塗佈液,可得到比未添加時更良好之電壓保持率 特性。 [表 13] 形成聚醢亞胺膜用之塗佈液 電壓保持率 (¾) 實施例編號 聚醯胺酸 修飾用4 匕合物 種類 添加量 實施例322 實施例1 PAA-1 111] 1Omo1 % 6 5. 6 實施例32 3 實施例2 PAA-1 [13] 1 Omo 1 % 6 5. 4 實施例3 2 4 實施例5 PAA- 1 【2 11. 1Omo1 % 6 7. 8 實施例3 2 5 實施例6 PAA- 1 [37】 1 OmoI % 6 5. 6 實施例3 2 6 實施例7 ΡΛΑ-1 13 9] 1Omo1 % 8 5. 2 實施例3 2 7 _ 實施例1 1 PAA — 1 15 1】 1 w t % 6 8. 0 實施例3 2 8 實施例12 PAA- 1 [5 1] 3 w t % 7 8. 2 實施例3 2 9 實施例1 3 PAA- 1 【5 1] 5w t % 7 7. 8 實施例3 3 0 實施例1 6 P AA- 1 147] 1 w t % 8 0. 9 實施例3.3 1 實施例1 7 ΡΑΛ- 1 [4 7] 3 w t % δ 3. 0 實施例3 3 2 實施例1 8 PAA- 1 [4 7] 5 w t % 7 6. 6 實施例3 3 3 實施例2 1 PAA- 1 149] 1 w t % 7 9. 9 實施例3 3 4 實施例2 2 PAA- 1 [49] 3w t % 8 3. δ 實施例3 3 5 實施例2 3 P AA- 1 [49】 5 w t % 8 2. 1 實施例3 3 6 實施例2 6 PAA- 1 [5 51 1 w t % 6 5. 4 實施例3 3 7 實施例2 7 PAA- 1 [5 51 3 w t % 6 0. 4 實施例3 3 8 實施例2 8 PAA- 1 [5 5] 5 w t % 6 5. 7 實施例3 3 9 實施例2 9 PAA— 1 [551 1 Ow t % 6 9. 7 實施例3 4 0 實施例3 0 PAA- 1 [5 5] 2 0 w t % 6 7 · 4 實施例3 4 1 實施例3 3 PAA- 1 [5 9】 .5 w t % 7 3. 4 實施例3 4 2 實施例3 4 P AA- 1 [5 9] 1 Owt % 7 4. 5 實施例3 4 3 實施例3 5 PAA - 1 [5 9】 2 0 w t % 7 6. 2 比較例9 - PAA- 1 <ftrr m — 5 8. 7 <實施例3 44至3 5 0及比較例1 0 >〈估計蓄積電荷 (RDC) > 使用表14所示之各實施例所調製的形成聚醯亞胺膜 用之塗佈液所製作之扭轉向列液晶單元係以,23 °C之溫度 下以0V至〇. 1 V間隔施加直流電壓至1 . 0V,測定各電壓 -132- 201240981 下之閃變振幅水準,製作檢量線。5分鐘接地後,施加交 流電壓3.0 V、直流電壓5.0 V,測定1小時後之閃變振幅 水準,再藉由對照預先製作之檢量線估計RDC(閃變參照 法)。又,估計測定蓄積電荷(RDC)用所製作之液晶單元係 以,基板使用附ITO透明電極之玻璃基板、形成聚醯亞胺 膜用之塗佈液之塗膜的焙燒條件爲置於加熱至230 °c之熱 板上焙燒30分鐘,及刷洗條件爲輥回轉數lOOOrpm'輥 進行速度50mm/sec、擠入量0.3mm之方法製作。又,調 製未添加修飾用化合物之物(比較例1 〇),比較效果。結果 如表1 4所示。 -由該結果確認,使用添加修飾用化合物之形成聚醯亞 胺膜甩之塗佈液,可得RDC較小之液晶單元。 [表 14] 形成聚醯亞胺! 箧用之塗佈液 RDC 實施例編號 聚醯胺酸 修飾用化合物 觀 添加量 (τηο \ %) 積存· (V) 遺漏〃 (V) 實施例3 4 4 實施例1 PAA- 1 [11】 10 >1 0.6 4 實施例3 4 5 實施例2 PAA- 1 [1 3] 10 >1 0,3 2 實施例3 4 6 實施例3 PAA- 1 [1 5] 10 >1 0.2 8 實施例3 4 7 實施例4 PAA- 1 【17] 10 >1 0.17 實施例3 4 8 實施例5 PAA- 1 [2 1J 10 >1 0.3 8 實施例34 9 實施例6 PAA- 1 【3 7] 10 >1 0. 42 實施例3 5 0 實施例7 PAA- 1 [3 91 10 0.8 2 0. 17 比較例.1· 〇 — .PAA-1 無 — >1 0.4 6 *來自光學性閃變參照法之直流電壓(DC)停止後之RDC値 * *停止直流電壓(DC)後3盼鐘之殘留RDC値 〈實施例3 5 1至3 5 8及比較例1 1 >測定老化試驗前後 之離子密度 各自將修飾用化合物用之合成例所製作的表1 5所示 之化合物’以相對於聚醯胺酸(PAA-1)溶液之固體成分爲 s -133- 201240981 下述表15所記載之比例之量,加入上述聚醯胺酸(PAA-1) 溶液(10.〇g)中,室溫下攪拌爲均勻溶液,調製形成聚醯亞 胺膜用之塗佈液。 其次測定各自使用該等形成聚合物膜用之塗佈液(液 晶配向劑)製作的扭轉向列液晶單元之初期狀態(23 °C )之離 子密度,再測定60 °C下保持3 0小時(老化)後之離子密 度。所測定之離子密度爲,將電壓±10V、周波數0.01 Hz 之三角波施加於液晶單元時之離子密度。測定溫度爲80 °C。測定裝置均使用東陽技術公司製6245型液晶物性評 估裝置。結果如表1 5所示。 又,扭轉向列液晶單元係以,除了形成聚醯亞胺膜用 之塗佈液之塗膜的焙燒條件爲置於加熱至2〇〇 °C之熱板上 焙燒3 0分鐘外,進行與上述扭轉向列液晶單元(實施例 174至206)相同之操作製作。又,對未添加修飾用化合物 之物進行相同之操作,比較效果。 由該結果確認,藉由適當選擇修飾用化合物之種類及 添加量,比較未添加時,可大幅減少液晶單元中之離子性 不純物。 -134- 201240981 [表 15] 形成聚醯亞胺膜用之塗佈液 離子3 PC) 聚醯胺酸 修飾用化雜 2 3*C 6 or mm. 添加量 (w t %) 實施例3 5 1 P AA- 1 合成例4 8 [9 9] 5 7 1. 2 7 5 17. 7 實施例3 5 2 PAA- 1 合成例4 8 [9 9] 1 ο 4 6.70 3 4 5. 3 實施例3 5 3 P AA- 1 合成例4 8 [9 9] 2 0 2 5. 9 2 2 2 1.4 實施例3 5 4 P AA- 1 合成例4 8 [9 9] 5 0 1 2. 5 5 10 3. 8 實施例3 5 5 P AA- 1 合成例5 0 [10 3] 5 6 1. 17 5 6 1.9 實施例3 5 6 P AA- 1 合成例5 0 [10 3] 10 6 2. 5 8 4 7 0. 8 實施例3 5 7 PAA-1 合成例5 0 [10 3] 2 0 6 2 . 7 6 4 3 0. 3 實施例3 5 8 PAA- 1 合成例5 0 [10 3] .5 0 3 5.38 3 3 2. 2 比較例1 1 P AA- 1 — 一 — 10 3.4 9 6 7.2 [合成聚合物及製作其溶液] 下面所使用之代號如下所述。 (單體) HEMA :甲基丙烯酸2-羥基乙酯 M A A ·甲基丙燃酸 MMA :甲基丙烯酸甲酯 CHMI : 環己基馬來醯亞胺 TEOS :四乙氧基矽烷 (聚合引發劑) AIBN: <2,α’-偶氮雙異丁腈 (溶劑) PGMEA :丙二醇單乙基醚 CHN :環己烷 HG :己二醇 BCS : 丁溶纖劑 1,3-BDD: 1,3-丁二醇 下述合成例所得之丙烯酸基聚合物及聚矽氧烷之數平 -135- 3: 201240981 均分子量Μη及重量平均分子量Mw係藉由使用日本分光 (股)製 GPC裝置(Shodex(登記商標)管柱 KF803L及 KF804L,以管柱中(管柱溫度40°C)以流量lml/分使溶出 溶劑四氫呋喃流經進行溶離之條件測定。又,數平均分子 量Μη及重量平均分子量Mw均以聚苯乙烯換算値表示β (市售聚合物) 有關下述市售之聚合物係以,將NMP/BCS(重量比 80 : 20)混合溶液調製爲固體成分濃度6質量%之聚合物溶 液形態使用。又,PSM-4326係由群榮化學工業公司,其 他之聚合物係由艾爾德公司購入之物。又,MEK爲甲基 乙基酮。 ·The coating liquid for forming a polyimide film was used. Example No. Polyamphenic acid modification compound 雠 addition amount (wt%) Example 16 2 Example 4 6 FAA-2 [11] 1 0w t % Δ Example 16 3 Example 4 7 PAA-2 [1 31 1 Owt% Δ Example 16 4 Example 4 8 PAA-2 (1 5) 1 0 wt % △ Example 16 5 Example 4 9 PAA-2 [17] 1 0w t % △ Example 1 6 6 Example 5 0 PAA-2 12 1] 1 0 wt % 〇 Example 16 7 Example 5 1 PAA-2 [3 7] 1 Ow t % 〇 Example 16 8 Implementation Example 5 2 PAA-2 13 9] 1 Owt % 〇 Example 16 9 Example 5 3 PAA-2. [4 71 1 Owt % Δ Example 17 0 Example 5 4 PAA-2 [4 9] 1 Owt % Example 171 Example 5 5 PAA-2 "[5 1] 1 Owt% 〇 Example 17 2 Example 5 6 PAA-2 15 7] 1 Owt % 〇 Example 17 3 Example 5 7 PAA-2 [ 5 9] 1 0 wt % 〇Comparative Example 6 - PAA-2 None - X <Example 1 74 to 2 06 and Comparative Example 7 > <Measurement of pretilt angle of twisted nematic liquid crystal cell> Charge at 105 ° C The liquid crystal cell prepared by forming the coating liquid for the polyimide film prepared by the respective examples shown in Table 10 for 5 minutes Thereafter, the pretilt angle was measured, and the pretilt angle was measured by the Axo Metrix "Axo Scan" by the Miller matrix method. Further, the liquid crystal cell produced by measuring the pretilt angle of the twisted nematic liquid crystal cell is placed on the substrate using a glass substrate with an ITO transparent electrode and a coating film for forming a coating liquid for a polyimide film. It was baked on a hot plate heated to 23 ot for 30 minutes, and the brushing conditions were as follows: the number of revolutions of the roller was 1000 rpm, the speed was 50 mm/sec, and the amount of extrusion was 0.3 mm. Further, the compound to which the compound for modification was not added (Comparative Example 7) was prepared to compare the effects. The results are shown in Table 10. From the results, it was confirmed that the desired type of pretilt angle can be obtained by appropriately selecting the type and amount of the compound for modification. -124-201240981 [Table 10] Pre-tilt angle of coating liquid for forming polyimide film Example No. Compound for polyamido acid modification (.) Surface addition amount hm) Example 1 7 4 Example 1 1 PAA- 1 [5 1] 1 3. 0 Example 1 7 5 Example 1 2 PAA-1 [5 1] 3 11 7 Example 17 6 Example 1 3 PAA-1 [5 1] 5 2 0 2 Example 1 7 7 Example 14 .PAA-1 [5 1] 10 6 5 4 Example 1 7 8 Example 1 5 PAA-1 1 1 1 2 0 8 7 2 Example 17 9 Example 1 6 PAA-1 [4 7] 1 2. 9 Example 18 0 Example 1 7 PAA-1 1 7 7] 3 4. 4 Example 18 1 Example 1 8 PAA-1 [4 7] 5 6. 8 Example 18 ? 19 PAA-1 [47] 10 3 5· 3 Example 18 3 Example 2 0 PAA-1 [4 7] 2 0 5 4. 0 Example 184 Example 2 1 PAA- 1. (4 9] 1 2 6 Example 18 5 Example 2 2 PAA-1 [4 9] 3 3. 8 Example 18 6 Example 2 3 PAA-1 1 9 9] 5 6. 3 Example 18 7 Example 2 4 PAA-1 [4 9] 10 1 5. 2 Example 18 8 Example 2 5 PAA - 1 [4 9] 2 0 4 9· 6 Example 18 9 Example 2 6 PAA — 1 15 5] 1 2. 6 Example 19 0. Example 27 PAA- 1 15 5 3 2. 7 Example 1 9 1 Example 2 8 PAA - 1 [5 51 5 2. 8 Example 1 9 2 Example 2 9 PAA-1 [5 51 10 3. 4 Example 1 9 3 Example 3 0 PAA-1 [5 5] 2 0 6. 6 Example 194 Example 3 1 PAA-1 [5 9] 1 2. 6 Example 1 9 5 Example 3 2 PAA-1 [5 9] 3 2 7 Example 1 9 6 Example 3 3 PAA-1 [5 9] 5 3. 0 Example 1 9 7 Example 3 4 PAA-1 [5 9] 10 3. 1 Example 1 9 8 Example 3 5 ΡΑΛ— 1 [5 9] 2 0 4. 1 Example 19 9 Example 3 6 PAA-1 [6 8] 1 1. 5 Example 2 0 0 Example 3 8 PAA-1 [6 8] 5 1.6 Example 2 0 ]. Example 3 9 PAA-1 [6 8] 10 1. 6 Example 2 0 2 Example 4 0 PAA-1 [6 8] 2 0 1. 7 Example 2 0 3 Example 4 1 PAA-1 [7 0] 1 2. 1 Example 2 0 4 Example 4 3 PAA-1 [7 0] 5 2. 3 Example 2 0 5 Example 4 4 PAA-1 [7 0] 10 2 5 Example 6 0 6 Example 4 5 PAA-1 1 0 0] 2 0 4, 3 Comparative Example 7 - PAA-1 None - 1. 4 <Examples 207 to 2 09 and Comparative Example 8 > Pretilt angle of parallel liquid crystal cell > Heating at 1200 ° C using the various examples shown in Table 11 After forming the liquid crystal cell was made of polyimide coating film of 1 hour, the pretilt angle was measured. The pretilt angle was measured using the Axo Metrix "Axo Scan" in meters -125 - 201240981. Further, the liquid crystal cell produced by measuring the pretilt angle of the antiparallel liquid crystal cell is heated to the baking condition of the glass substrate with the ITO transparent electrode and the coating film for forming the polyimide film. The liquid crystal cell was produced by a method of baking in a hot air circulating oven of 200 ° C for 30 minutes without performing an alignment treatment. Further, a compound (Comparative Example 8) to which no compound for conditioning was added was prepared, and the effects were compared. The results are shown in Table 11. From the results, it was confirmed that when Comparative Example 8 in which the compound for modification was not added, the pretilt angle was remarkably increased by using the coating liquid for forming the polyimide film with the compound for modification. Therefore, when a compound for modification is added, even if the polyimine precursor or the polyimine containing the coating liquid for forming the polyimide film is not introduced into the branched component of the dispersed liquid crystal, the liquid crystal can be vertically aligned. Table 11] Pre-tilt angle of the coating liquid for forming a polyfluorene film (.) Example No. Polyamide-modified compound 喔 Addition amount (3) Example 2 0 7 Example 7 2 PAA- 2 [4 9 10 9 0.0 Example 2 0 8 Example 7 3 PAA-2 [4 91 1 5 9 0.0 Example 2 0 9 Example 7 4' PAA- 2 14 9] 2 0 9 0. 0 Comparative Example 8 - PAA - 2 Jrrr m - 1. 3 <Example 2 1 0 to 32 1 ><Evaluation of liquid crystal alignment and measurement of pretilt angle of antiparallel liquid crystal cell> Use of polarizing plates to hold Tables 12-1 to 12-4 After the liquid crystal cell produced by the coating liquid for forming a polyimide film prepared in each of the examples shown in the above, the liquid crystal cell was rotated from the back surface to illuminate the liquid crystal cell, and the light and dark change and the presence or absence of the liquid crystal were observed by visual observation. Orientation, the result has a good alignment. Thereafter, an alternating voltage of 3 V was applied to the liquid crystal cell to visually observe whether the liquid crystal was aligned -126-201240981. At this time, the evaluation is based on the following criteria In addition, the liquid crystal cell system for liquid crystal alignment is evaluated, and the baking condition of the coating film using the glass substrate and the coating liquid for forming a polyimide film is placed in a hot air circulating oven heated to 20 (TC). After calcination for 30 minutes, the obtained glass substrate with a coating film was subjected to the above-described photoalignment treatment. The evaluation criteria were good: liquid crystal alignment was confirmed, and no flow alignment was poor: although the liquid crystal was aligned, a large amount of flow alignment was observed. Further, the liquid crystal cell prepared by using the coating liquid for forming a polyimide film prepared in each of the examples shown in Tables 12-1 to 12-4 was heated at 120 ° C for 1 hour, and then the pretilt angle was measured. The tilt angle was measured by the Miller matrix method using "Αχ〇Scan" of Axo Metrix Co., Ltd. From the results, it was confirmed that a coating liquid for forming a polyimide film using a compound having a photoreactive branching modification was confirmed ( When the liquid crystal alignment agent is subjected to photo-alignment treatment, good vertical alignment property can be obtained. It is also confirmed that the polarized ultraviolet light is irradiated to the coating liquid for forming a polyimide film of the present invention (liquid crystal distribution) The treatment agent can obtain the ability of liquid crystal alignment with only a slight tilt to the vertical state. It is also confirmed that the pretilt angle can be finely adjusted by controlling the amount of addition and the amount of irradiation. Thus, it is known that the polyimide film of the present invention is formed. The coating liquid (liquid crystal alignment treatment agent) can be used for a liquid crystal alignment film for a liquid crystal display element of a vertical alignment type, and is also suitable for a liquid crystal alignment film using a photo alignment method. -127- 201240981 [Table 12-1] For yttrium imide film 1 Liquid irradiation intensity (ni J) Liquid crystal alignment pretilt angle (°) Example No. Surface addition amount _ When voltage is applied when no voltage is applied Example 2 1 0 Example 5 8 [6 3] 5 0 Good defect 9 0. 0 0 Example 2 1 1 Example 5 8 [6 3] 5 2 0 Good good 9 0. 0 0 Example 2 1 2 Example 5 8 [6 31 5 5 0 Good good 9 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 Example 2 1 5 Example 5 8 [6 3] 5 4 0 0 Good Good 8 9. 9 4 Example 21 6 Example 5 8 16 3] 5 8 0 0 Good Good 8 9. 9 2 Example 2 1 7 Example 5 8 [6 3] 5 1 0 0 0. Good good 8 9. 8 6 Example 2 I 8 Example 5 9 [6 3] 10 0 Good defect 9 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 Example 2 2 1 Example 5 9 [6 3] 1 0 10 0 Good good 8 9. 9 6 Example 2 2 2 Example 5 9 16 3] 10 2 0 0 Good good 8 9. 8 4 Example 2 2 3 Example 5 9 [6 3] 10 4 0 0 Good good 8 9. 8 5 Example 2 2 4 Example 5 9 [6 3] 10 8 0 0 Good good 8 9. 7 7 Example 22 5 Example 5 9 [6 31 1 0 10 0 0 Good Good 8 9. 8 0 Example 2 2 6 Example 6 0 [6 3] 2 0 0 Good defect 9 0. 0 0 Example 2 2 7 Example 6 0 [6 3] 2 0 2 0 Good good 8 9, 8 6 Example 2 2 8 Example 6 0 [6 3] 2 0 5 0 Good good 8 9. 9 0 Example 2 2 9 Example 6 0 [ 6 3] 2 0 10 0 Good good 8 9. 9 7 Example 2 3 0 Example 6 0 [6 31 2 0 2 0 0 Good good 8 9. 9 0 Example 2 3 1 Example 6 〇 [6.3] 2 0 4 0 0 Good good 8 9. 8 9 Example 2 3 2 Example 6 0 16 31 2 0 8 0 0 Good good 8 9. 9 2 Example 2 3 3 Example 6 0 [6 3] 2 0 10 0 0 Good Good 8 9. 8 9 Example 2 3 4 Example 6 1 [6 3] 3 0 0 Good defect 9 0, 0 0 Example 23 5 Example 6 1 [6 3] 3 0 2 0 Good good 8 9. 8 9 Example 2 3 6 Example 6 1 [6 3] 3 0 5 0 Good good 8 9. 9 5 Example 237 Example 6 1 [6 3] 3 0 10 0 Good good 8 9. 8 6 Example 2 3 8 Example 6 1 [6 3] 3 0 2 0 0 Good good 8 9. 8 9 Example 2 3 9 Example 6 1 [6 3] 3 0 4 0 0 Good good 8 9. 8 6 Example 2 4 0 Example 6 1 [6 3] 3 0 8 0 0 Good good 8 9. 9 0 Example 2 4 1 Example 6 1 [6 3] 3 0 10 0 0 Good good 8 9. 9 3 -128 - 201240981 [Table 12-2] Coating liquid for forming a polyimide film. Irradiation intensity (m J) Liquid crystal alignment pretilt angle (. Example No. Surface Addition Amount (wt«) When a voltage is applied when no voltage is applied Example 242 Example 6 2 [6 31 5 0 0 Good Good 9 0. 0 0 Example 243 Example 6 2 [6 3] 5 0 2 0 Good good 8 9. 9 5 Example 2 4 4 Example 6 2 [6 3] 5 0 5 0 Good good 8 9- 8 8 Example 245 Example 6 2 [6 3] 5 0 10 0 Good Good 8 9. 9 2 Example 2 4 6 Example 6 2 [6 3] 5 0 2 0 0 Good good 8 9. 9 8 Example 247 Example 6 2 [6 3] 5 0 4 0 0 Good good 8 9. 9 3 Example 248 Example 6 2 [6 3] 5 0 8 0 0 Good good 8 9. 9 0 Example 2 4 9 *Example 6 2 [6 3] 5 0 10 0 0 Good good 8 9 8 8 Example 2 5 0 Example 6 3 [6 3] 7 0 0 Good defect 9 0. 0 0 Example 2 5 1 Example 6 3 [6 3] 7 0 2 0 Good 圩 good 8 9. 9 5 Implementation tree 2 5 2 Example 6 3 [6 3] 7 0 5 0 Good good 8 9. 9 7 Example 2 5 3 Example 6 3 [6 3] 7 0 10 0 Good good 8 9·. 9 3 Example 2 5 4 Example 6 3 [6 3] 7 0 2 0 0 Good good 8 9. 9 4 Example 2 5 5 Example 6 3 [6 3] 7 0 4 0 0 Good good Good 8 9. 9 5 Example 2 5 6 Example 6 3 [6 3] 7 0 8 0 0 Good good 8 9. 9 2 Example 2 5 7 Example 6 3 [6 3] 7 0 10 0 0 Good Good 8 9. 9 0 Example 2 5 8 Example 6 4 [6 31 1 0 0 0 Good bad 9 0. 0 0 Example 2 5 9 Example 6 4 [6 31 10 0 2 0 Good good 8 9. 9 3 Example 2 6 0 Example 6 4 [6 3] 10 0 5 0 Good good 8 9. 7 4 Example 2 6 1 Example 6 4 [6 3] 10 0 10 0 Good good 8 9. 9 4 Example 2 6 2 Example 6 4 [6 3] 10 0 2 0 0 Good Good 8 9. 9 1 Example 2 6 3 Selling Example 6 4 [6 3] 1 0 0 4 0 0 Good Good 8 9. 8 5 Example 264 Example 6 4 [6 31 10 0 8 0 0 Good good 8 9. 8 2 Example 2 6 5 Example 6 4 [6 3] 10 0 10 0 0 Good good 8 9. 8 1 Implementation Example 2 6 6 Example 6 5 [6 5] 5 0 Good defect 9 0. 0 0 Example 2 6 7 Example 6 5 [6 5] 5 2 0 Good good 8 9. 9 3 Example 268 Example 6 5 [6 5] 5 5 0 Good good 8 9. 9 9 Example 2 6 9 Example 6 5 [6 5]. 5 10 0 Good good 8 9. 9 0 Example 2 7 0 Example 6 5 [6 51. δ 2 0 0 Good good 8 9. 8 9 Example 2 7 1 Example 6 5 [6 5] 5 4 0 0 Good good 8 9〇8 8 Example 2 7 2 Example 6 5 [6 5] 5 8 0 0 Good and good 8 9. 9 2 Example 2 7 3 Example 6 5 [6 5] 5 10 0 0 Good good 8 9. 9 4 -129- 201240981 [Table 12-3] Coating for forming a polyimide film Liquid irradiation intensity (m J) Liquid crystal alignment pretilt angle (. Example No. Addition Amount _ When a voltage is applied when no voltage is applied Example 2 7 4 Example 6 6 [6 5] 10 0 Good defect 9 0. 0 0 Example 275 Example 6 6 [6 5] 1 0 2 0 Good good 8 9. 9 7 Example 2 7 6 Example 6 6 [6 5] 1 0 5 0 Good good 8 9. 9 9 Example 2 7 7 Example 6 6 [6 51 10 10 0 Good and good 8 9. 9 3 Example 2 7 8 Example 6 6 [6 5] 10 2 0 0 Good Good 8 9. 9 2 Example 279 Example 6 6 [6 51 10 4 0 0 Good Good 8 9. 9 4 Example 2 8 0 Example 6 6 [6 51 10 8 0 0 Good Good 8 9. 9 4 Example 2 8 1 Example 6 6 [6 51 1 0 10 0 0 Good Good 8 9. 9 1 Example 2 8 2 Example δ 7 [6 5] 2 0 0 Good. Poor 9 0. 0 0 Example 2 8 3 Example 6 7 [6 5] 2 0 2 0 Good good 8 9. 9 7 Example 2 8 4 Example 6 7 [6 5] 2 0 5 0 Good Good 8 9. 9 0 Example 285 Example 6 7 [6 5] 2 0 10 0 Good Good 8 9. 9 9 Example 2 8 6 Example 6 7 [6 5] 2 0 2 0 0 Good good 8 9. 8 5 Example 28 7 Example 6 7 [6 5] 2 0 4 0 0 Good good 8 9. 8 7 Example 2 8 8 Example 6 7 16 5] 2 0 8 0 0 Good good 8 9* 9 0 Example 2 8 9 Example 6 7 [6 51 2 0 . 10 0 0 Good good 8 9. 8 2 Example 2 9 0 Example 6 8 [6 51 3 0 0 Good bad 9 0. 0 0 Example 29 1 Example 6 8 [6 5] 3 0 2 0 Good good 8 9. 9 2 Jia Shi Example 2 9 2 Example 6 8 [6 51 3 0 5 0 Good good 8 9. 7 9 Example 2 9 3 Example 6 8 [6 5] 3 0 10 0 Good good 8 9. 7 6 Example 2 9 4 Implementation Example 6 8 [6 51 3 0 2 0 0 Good Good 8 9. 9 0 Example 2 9 5 Example 6 8 [6 5] 3 0 4 0 0 Good Good 8 9. 8 7 Example 2 9 6 Example 6 8 [6 5] 3 0 8 0 0 Good good 8 9. 8 7 Example 2 9 7 Example 6 8 [6 5] 3 0 10 0 0 Good good 8 9. 8 3 Example 2 9 8 Example 6 9 [6 5] 5 0 0 Good bad 9 0. 0 0 Example 2 9 9 Example 6 9 [6 5) 5 0 2 0 Good good 8 9. 9 8 Example 3 0 0 Example 6 9 ( 6 5] 5 0 5 0 Good good 8 9. 9 9 Example 3 0 1 Example 6 9 [6 5] 5 0 10 0 Good good 8 9. 9 2 Example 3 0 2 Example 6 9 [6 5 ] 5 0 2 0 0 Good good Good 8 9. 7 7 Example 3 0 3 Example 6 9 [6 51 5 0 4 0 0 Good Good 8 9. 8 6 Example 304 Example 6 9 [6 51 5 0 8 0 0 Good Good 8 9. 8 9 Example 3 〇 5 Example 6 9 16 5) 5 0 10 0 0 Good and good 8 9. 8 8 -130- 201240981 [Table 12-4] Irradiation strength of coating liquid for forming a polyimide film ( m J) ------ LCD alignment _______ foresight (. Example No. Surface Addition Amount _ When a voltage is applied without applying a voltage Example 306 Embodiment 7 0 [6 5] 7 0 0 Good defect 9 0. 0 0 Embodiment 3 0 7 Example 7 0 [6 5] 7 0 2 0 Good Μ & 8 9. 9 0 Example 3 0 8 Example 7 0 [6 5] 7 0 5 0 Good good 8 9. 9 9 Example 309 Example 7 0 [65] 7 0 10 0 Good Good 8 9. 8 9 Example 3 1 0 Example 7 0 [6 5] 7 0 2 0 0 Good "Good 8 9. 8 6 Example 3 1 1 Example 7 0 [6 5] 7 0 4〇〇 Good good 8 9, 8 0 Example 3 12 Example 7 0 [6 5] 7 0 8 〇〇 Good good 8 9. 8 4 Example 3 1 3 Example 7 0 [6 5] 7 0 10 0 0 Good Good 8 9. 8 1 Example 314 Example 7 1 [6 5] 10 0 0 Good bad 9 0. 0 0 Example 3 +1 5 Example 7 1 16 5] 10 0 2 0 Good good 8 9. 9 3 Example 3 1 6 Example 7 1 [6 5] 10 0 5 0 Good 8 9. 9 6 Example 317 Example 7 1 16 5] 10 0 10 0 Good Good 8 9. 9 2 Example 318 Example 7 1 [65] 10 0 2 〇〇 good good 8 9. 9 0 Example 319 Example 7 1 [65] 10 0 4 0 0 Good good 8 9. 8 3 Example 3 2 0 Example 7 1 [6 5] 10 0 8 0 0 Good good 8 9. 7 5 Example 3 2 1 Example 7 1 [65] 10 0 10 0 0 Good 8 9. 7 6 <Example 3 22 to 3 43 and Comparative Example 9> <Measurement voltage holding ratio (VHR) > Measurement The coating for forming a polyimide film prepared by using the respective examples shown in Table 13 was measured. The voltage holding ratio of the initial state of the liquid crystal cell produced by the cloth liquid. The voltage holding ratio is measured by applying a voltage of 4 V to 60 at a temperature of 90 ° C, and measuring the voltage after 16.67 ms to calculate how much voltage can be maintained. In the measurement of the voltage holding ratio, the VHR-1 voltage holding ratio measuring device manufactured by Toyo Denki Co., Ltd. was used. The liquid crystal cell produced by measuring the voltage holding ratio (VHR) was used, and the glass substrate with the ITO transparent electrode was used for the substrate. The baking condition of the coating film for forming the coating film for the polyimide film is to be calcined on a hot plate heated to 203 ° C for 30 minutes, and the brushing condition is a light rotation number of 1000 rpm, and the light speed is 50 mm. /sec, the amount of extrusion is 0.3mm. Further, the compound (Comparative Example 9) in which the compound for modification s -131 - 201240981 was not added was prepared, and the effect was compared. The results are shown in Table 13. From the results, it was confirmed that a coating liquid for forming a polyimide film using the compound for modifying can obtain a voltage holding ratio characteristic which is better than that at the time of no addition. [Table 13] The coating liquid voltage retention ratio (3⁄4) for forming a polyimide film was carried out. Example No. Polyamide modification 4 Hydrate species addition amount Example 322 Example 1 PAA-1 111] 1Omo1 % 6 5. 6 Example 32 3 Example 2 PAA-1 [13] 1 Omo 1 % 6 5. 4 Example 3 2 4 Example 5 PAA-1 [2 11. 1Omo1 % 6 7. 8 Example 3 2 5 Example 6 PAA-1 [37] 1 OmoI % 6 5. 6 Example 3 2 6 Example 7 ΡΛΑ-1 13 9] 1Omo1 % 8 5. 2 Example 3 2 7 _ Example 1 1 PAA — 1 15 1] 1 wt % 6 8. 0 Example 3 2 8 Example 12 PAA-1 [5 1] 3 wt % 7 8. 2 Example 3 2 9 Example 1 3 PAA-1 [5 1] 5w t % 7 7. 8 Example 3 3 0 Example 1 6 P AA-1 147] 1 wt % 8 0. 9 Example 3.3 1 Example 1 7 ΡΑΛ - 1 [4 7] 3 wt % δ 3. 0 Implementation Example 3 3 2 Example 1 8 PAA-1 [4 7] 5 wt % 7 6. 6 Example 3 3 3 Example 2 1 PAA-1 1 149] 1 wt % 7 9. 9 Example 3 3 4 Example 2 2 PAA-1 [49] 3w t % 8 3. δ Example 3 3 5 Example 2 3 P AA-1 [49] 5 wt % 8 2. 1 Example 3 3 6 Example 2 6 PAA-1 [5 51 1 wt % 6 5. 4 real Example 3 3 7 Example 2 7 PAA-1 [5 51 3 wt % 6 0. 4 Example 3 3 8 Example 2 8 PAA-1 [5 5] 5 wt % 6 5. 7 Example 3 3 9 Implementation Example 2 9 PAA-1 [551 1 Ow t % 6 9. 7 Example 3 4 0 Example 3 0 PAA-1 [5 5] 2 0 wt % 6 7 · 4 Example 3 4 1 Example 3 3 PAA - 1 [5 9] .5 wt % 7 3. 4 Example 3 4 2 Example 3 4 P AA-1 [5 9] 1 Owt % 7 4. 5 Example 3 4 3 Example 3 5 PAA - 1 [5 9] 2 0 wt % 7 6. 2 Comparative Example 9 - PAA-1 1 <ftrr m - 5 8. 7 <Example 3 44 to 3 50 and Comparative Example 1 0 > <Estimulated accumulated charge ( RDC) > The twisted nematic liquid crystal cell system prepared by using the coating liquid for forming a polyimide film prepared in each of the examples shown in Table 14 was used at a temperature of 23 ° C to 0 V to 〇. A DC voltage was applied to the V-interval to 1.0 V, and the flicker amplitude level at each voltage of -132 - 201240981 was measured to prepare a calibration curve. After 5 minutes of grounding, an AC voltage of 3.0 V and a DC voltage of 5.0 V were applied, and the flicker amplitude level after one hour was measured, and RDC (Flicker Reference Method) was estimated by comparison with a previously prepared calibration curve. Further, it is estimated that the liquid crystal cell to be used for the measurement of the accumulated charge (RDC) is such that the substrate is formed by using a glass substrate with an ITO transparent electrode and a coating film for forming a coating liquid for a polyimide film. The hot plate was baked on a hot plate at 230 ° C for 30 minutes, and the brushing condition was a roll rotation number of 1000 rpm, a roll speed of 50 mm/sec, and an extrusion amount of 0.3 mm. Further, the compound to which the compound for modification was not added (Comparative Example 1) was prepared, and the effects were compared. The results are shown in Table 14. From this result, it was confirmed that a liquid crystal cell having a small RDC can be obtained by using a coating liquid for forming a polyimide film of the compound for modification. [Table 14] Formation of polyimine! Coating liquid RDC for use Example No. Polyhalic acid modification compound apparent addition amount (τηο \ %) Accumulation · (V) Missing 〃 (V) Example 3 4 4 Example 1 PAA-1 [11] 10 > 1 0.6 4 Example 3 4 5 Example 2 PAA-1 [1 3] 10 > 1 0, 3 2 Example 3 4 6 Example 3 PAA-1 [ 1 5] 10 > 1 0.2 8 Example 3 4 7 Example 4 PAA-1 [17] 10 > 1 0.17 Example 3 4 8 Example 5 PAA-1 [2 1 J 10 > 1 0.3 8 Example 34 9 Example 6 PAA-1 [3 7] 10 > 1 0. 42 Example 3 5 0 Example 7 PAA-1 [3 91 10 0.8 2 0. 17 Comparative Example 1.1 〇 - .PAA-1 None - >1 0.4 6 * RDC値* from the DC voltage (DC) after the optical flicker reference method is stopped *Residual RDC after 3 minutes of stopping the DC voltage (DC) <Example 3 5 1 to 3 5 8 and Comparative Example 1 1 > Determination of ion density before and after the aging test Each of the compounds shown in Table 15 prepared by using the compound for modification as a compound with respect to the poly-proline (PAA-1) solution The solid content is s -133- 201240981 The amount shown in Table 15 below, plus Above polyamide acid (PAA-1) solution (10.〇g), the homogeneous solution was stirred at room temperature to prepare a coating solution for forming the film Juxi alkylene amines. Next, the ion density in the initial state (23 ° C) of each of the twisted nematic liquid crystal cells produced by using the coating liquid for forming a polymer film (liquid crystal alignment agent) was measured, and the measurement was carried out for 30 hours at 60 ° C ( Ion density after aging). The ion density measured was an ion density when a triangular wave having a voltage of ±10 V and a number of cycles of 0.01 Hz was applied to the liquid crystal cell. The measurement temperature was 80 °C. The measuring device used the 6245 liquid crystal property evaluation device manufactured by Dongyang Technology Co., Ltd. The results are shown in Table 15. Further, the twisted nematic liquid crystal cell is fired under the conditions of a coating film for forming a coating liquid for a polyimide film by firing on a hot plate heated to 2 ° C for 30 minutes. The twisted nematic liquid crystal cell (Examples 174 to 206) was fabricated in the same manner. Further, the same operation was carried out on the compound to which the compound for modification was not added, and the effect was compared. From the results, it was confirmed that the type and amount of the compound for modification can be appropriately selected, and when it is not added, the ionic impurities in the liquid crystal cell can be greatly reduced. -134- 201240981 [Table 15] Coating liquid ions for forming a polyimide film 3 PC) Polyamide for modification of polyamine 2 3*C 6 or mm. Adding amount (wt %) Example 3 5 1 P AA-1 Synthesis Example 4 8 [9 9] 5 7 1. 2 7 5 17. 7 Example 3 5 2 PAA-1 Synthesis Example 4 8 [9 9] 1 ο 4 6.70 3 4 5. 3 Example 3 5 3 P AA-1 Synthesis Example 4 8 [9 9] 2 0 2 5. 9 2 2 2 1.4 Example 3 5 4 P AA-1 Synthesis Example 4 8 [9 9] 5 0 1 2. 5 5 10 3 8 Example 5 5 5 P AA-1 Synthesis Example 5 0 [10 3] 5 6 1. 17 5 6 1.9 Example 3 5 6 P AA-1 Synthesis Example 5 0 [10 3] 10 6 2. 5 8 4 7 0. 8 Example 3 5 7 PAA-1 Synthesis Example 5 0 [10 3] 2 0 6 2 . 7 6 4 3 0. 3 Example 3 5 8 PAA-1 Synthesis Example 5 0 [10 3] . 5 0 3 5.38 3 3 2. 2 Comparative Example 1 1 P AA-1 - 1 - 10 3.4 9 6 7.2 [Synthesis of Polymer and Preparation of Solution] The symbols used below are as follows. (Monomer) HEMA : 2-hydroxyethyl methacrylate MAA · Methyl propylene flammable acid MMA : Methyl methacrylate CHMI : Cyclohexyl maleimide TEOS : Tetraethoxy decane (polymerization initiator) AIBN : <2,α'-azobisisobutyronitrile (solvent) PGMEA: propylene glycol monoethyl ether CHN: cyclohexane HG: hexanediol BCS : butyl cellosolve 1,3-BDD: 1,3- Butanediol The acrylic acid-based polymer obtained from the following synthesis example and the polyoxyalkylene number-135- 3: 201240981 The average molecular weight Μη and the weight average molecular weight Mw are obtained by using a GPC device manufactured by JASCO Corporation (Shodex ( Registered trademark) KF803L and KF804L, measured in the column (column temperature 40 ° C) at a flow rate of 1 ml / min to dissolve the solvent tetrahydrofuran through the dissolution, and the number average molecular weight Μη and the weight average molecular weight Mw In terms of polystyrene, 値 represents β (commercially available polymer). The following commercially available polymer is prepared by mixing a NMP/BCS (weight ratio of 80:20) solution into a polymer solution having a solid concentration of 6 mass%. Form use. In addition, PSM-4326 is owned by Qunrong Chemical Industry Co., Ltd. Meridian company purchased. In addition, MEK is methyl ethyl ketone.
Polymer — 1 : Poly[(〇-cresy I glycidyl ether)-c〇-formaldehyde] Po I yme r —2 :Poly[N,N’-bis(2,2,6, 6-hexanediamine-co-2,4-dichloro-6-morpholino-l, 3,5-triazine]Polymer — 1 : Poly[(〇-cresy I glycidyl ether)-c〇-formaldehyde] Po I yme r —2 :Poly[N,N'-bis(2,2,6, 6-hexanediamine-co-2, 4-dichloro-6-morpholino-l, 3,5-triazine]
Po I yme r —3 : Poly(Bisphenol A-co-epichlorohydrin)Po I yme r —3 : Poly(Bisphenol A-co-epichlorohydrin)
Po I yme r—4 : Poly(melamine-co-formaldehyde) acrylated, 80 wt% MEK Solution. P ο I y m e r- 5 :群榮化學工業公司製酚醛清漆樹脂,PSM-4 3 2 6 <合成Polymer-6及製作其溶液> 以莫耳比爲 MMA : MAA : HEMA : CHMI=13 : 26 : 25: 36、固體成分濃度爲 40wt%之條件含有 MMA、 MAA、HEMA及CHMI,又以PGMEA爲溶劑調製溶液, 將聚合觸媒AIBN加入該溶液中,80°C下反應20小時, 得共聚合物(丙烯酸基聚合物)之溶液。所得之共聚合物之 數平均分子量Μη爲4,000、重量平均分子量 Mw爲 7500、其次以NMP將所得之溶液稀釋爲固體成分濃度 -136- 201240981 5wt%,得丙烯酸基聚合物(p〇iymer-6)溶液。 <合成Polymer-7及製作其溶液> 將混合溶劑(重量比爲HG: BCS: l,3-BDO = 65: 30: 5)及TEOS加入備有溫度計 '回流管之l〇〇mL四口燒瓶 中’調製烷氧基矽烷單體之溶液。室溫下以30分鐘將預 先混合上述混合溶劑、水及觸媒用之草酸所得之溶液滴入 該溶液中’攪拌該溶液30分鐘後加熱回流1小時,放冷 得Si02換算濃度爲I2wt%之聚矽氧烷溶液。其次以上述 混合溶劑稀釋所得之Si02換算濃度爲12wt%之聚矽氧烷 溶液,得5wt%_之聚砂氧院(P〇lymer-7)溶液。 [製作液晶配向膜及液晶單元] 各自將修飾用化合物用之合成例所製作之表1 6所表 示之化合物,以相對於聚合物溶液之固體成分(即 Polymer-Ι至Polymer-7)爲下述表16所記載之比例之量, 加入上述各聚合物(Polymer-Ι至Polymer-5)溶液、丙條酸 基聚合物(Polymer-6)溶液或聚矽氧烷(Polymer-7)溶液 中’室溫下攪拌爲均勻溶液,調製形成聚合物膜用之塗佈 液。 其次以l2〇°C加熱各自使用該等形成聚合物膜用之塗 佈液(液晶配向劑)製作之反平行液晶單元1小時後。將液 晶單元載置於背光上,通過偏光板以目視觀察垂直配向 性。又,垂直配向時記爲「垂直」,未垂直配向時記爲Po I yme r—4 : Poly(melamine-co-formaldehyde) acrylated, 80 wt% MEK Solution. P ο I yme r- 5 : Novolac resin made by Qunrong Chemical Industry Co., Ltd., PSM-4 3 2 6 <Synthesis Polymer-6 and its solution> MMA with a molar ratio: MAA: HEMA: CHMI=13: 26: 25: 36, MMA, MAA, HEMA and CHMI with PGMEA at a solid concentration of 40% by weight To prepare a solution for the solvent, a polymerization catalyst AIBN was added to the solution, and the mixture was reacted at 80 ° C for 20 hours to obtain a solution of a copolymer (acrylic based polymer). The obtained copolymer had a number average molecular weight Μη of 4,000, a weight average molecular weight Mw of 7,500, and secondly, the obtained solution was diluted with NMP to a solid concentration of -136 to 201240981 5 wt% to obtain an acrylic-based polymer (p〇iymer-6). ) solution. <Synthesis of Polymer-7 and preparation of the solution> The mixed solvent (weight ratio HG: BCS: l, 3-BDO = 65: 30: 5) and TEOS were added to a thermometer equipped with a 'return tube' A solution of the alkoxydecane monomer was prepared in a vial. The solution obtained by premixing the above mixed solvent, water and oxalic acid for the catalyst was dropped into the solution at room temperature for 30 minutes. The solution was stirred for 30 minutes, heated to reflux for 1 hour, and allowed to cool to obtain a concentration of SiO 2 in an amount of 12% by weight. Polyoxane solution. Next, the obtained polyoxysiloxane solution having a concentration of SiO 2 of 12 wt% was diluted with the above mixed solvent to obtain a 5 wt% solution of Pölymer-7. [Production of Liquid Crystal Alignment Film and Liquid Crystal Cell] Each of the compounds shown in Table 16 prepared by using the compound for modification is a solid component (ie, Polymer-Ι to Polymer-7) of the polymer solution. The amount of the ratio described in Table 16 is added to each of the above polymers (Polymer-Pluronium to Polymer-5) solution, Propyl-based polymer (Polymer-6) solution or Polyoxane (Polymer-7) solution. The mixture was stirred at room temperature to form a uniform solution, and a coating liquid for forming a polymer film was prepared. Next, the antiparallel liquid crystal cells each having the coating liquid for forming a polymer film (liquid crystal alignment agent) were heated at 1 °C for 1 hour. The liquid crystal unit was placed on the backlight, and the vertical alignment was visually observed through a polarizing plate. Also, when the vertical alignment is marked as "vertical", when it is not vertically aligned, it is recorded as
S -137- 201240981 「非垂直」,結果如表1 6所示。 該反平行液晶單元係以,除了基板使用附ITO透明電 極之玻璃基板,各種形成聚合物膜用之塗佈液之塗膜的焙 燒條件爲置於加熱至200°C之熱風循環式烤箱內焙燒30 分鐘,未進行配向處理外,進行與垂直配向型用反平行液 晶單元(實施例210至321)相同之操作而得。又,對未添 加修飾用化合物之物進行相同之操作,比較效果。 [表 16] 形成聚合物膜用之塗佈液 '~* 有無垂直 配向 聚合物種 修飾) 电化飾 種類 添加量(wt*) 實施例3 5 9 Po 1 yme r — 1 [5 1] 5 垂直 實施例3 6 0 Polymer—1 [5 1] 10 垂直 實施例3 6 1 P ο 1yme r-1 [5 1] .2 0 箠直 比較例1 2 Polymer—1 無 — 非垂直 實施例3 6 2 P o 1yme r — 2 [5 1] 3 0 垂直 實施炉ί 3 6 3 Polymer — 2 [5 1] 4 0 垂直 比較例1 3 P ο 1 yme r — 2 無 — 非垂直 實施例3 6 4 Polymer — 3 [4 9] 2 0 垂直 實施例3 6 5 P ο 1yme r — 3 [5 1] 2 0 垂直 比較例1 4 P o 1yme r- 3 無 __ 非垂直 實施例3 6 6 Polymer — 4 [4 9] 2 0 垂直 實施例3 6 7 P ό 1yme r — 4 [5 1] 5 垂直 實施例3 6 8 P ο 1yme r — 4 [5 1] 10 垂直 實施例3 6 9 P o 1yme r — 4 [5 1] 2 0 垂直 比較例1 5 P ο 1 y τη e r — 4 無 — 非垂直 實施例3 7 0 Polymer-5 [4 9] 5 垂直 實施例3 7 1 Polymer — 5 [49] 1 0 垂直 實施例3 7 2 P ο 1 yme r — 5 [4 9] 2 0 垂直 實施例3 7 3 Polymer-5 [5 1] 5 垂直 實施例3 7 4 Polymer — 5 [5 1] 10 垂直 實施例3 7 5 Polymer — 5 [5 1] 2 0 垂直 比較例1 6 Polymer-5 無 — 非垂直 實施例3 7 6 Po lyme r — 6 [4 9] 5 非垂直 實施例3 7 7 P o 1 yme r — 6 [4 9] 2 0 垂直 實施例3 7 8 P ό 1 yme, r — 6 [5 1] 10 垂直 .實施例3 7 9 Polymer-6 [5 1] 2 0 垂直 比較例1 7 Polymer—6 無 — 非垂直 實施例3 8 0 P o 1yme r — 7 [4 9] 5 垂直 實施例3 8 1 Polymer-7 [49] 10 垂直 實施例3 8 2 P o 1yme r- 7 [49] 2 0 垂直 比較伽1 8 Polymer一7 姐 — 垂直* *液晶注入口陳 f近稍有漏光(即非垂® -138- 201240981 由該結果確認,既使Polymer-1至Polymer-6中任何 一種聚合物,未添加修飾用化合物下之比較例1 2至1 8完 全無垂直配向性,但添加修飾用化合物之形成聚合物膜用 之塗佈液時,因應各自之聚合物藉由添加適當量可得垂直 配向性。即,適當選擇添加劑之種類及添加量,無關基本 聚合物之種類,確認易製作垂直配向性單元。 又,因Polymer-7既使未添加添加劑也具有垂直配向 性,故製作垂直配向單元無需添加劑,但確認添加添加劑 時可提升垂直配向性。 <實施例3 8 3至401 > 各自將修飾用化合物用之上述合成例所製作的下述表 17所記載之化合物,以相對於聚醯胺酸(Pa厂^溶液之固 體成分(即聚醯胺酸(P A A -1 ))爲下述表1 7所記載之比例之 量,加入上述製作之聚醯胺酸(PAA-1)溶液(l〇.〇g)中,室 溫下擾伴爲均句溶液’調製實施例383至401之形成聚酿 亞胺膜用之塗佈液。 -139- 201240981 [表 17] 聚醯胺酸‘ 修飾用化合物 添加量(wt%) 實施例3 8 3 PAA- 1 合成例5 6 [115] 10 實施例3 8 4 PAA- 1 合成例5 6 [115] 15 實施例3 8 5 P AA- 1 合成例5 6 [115] 2 0 實施例3 8 6 PAA- 1 合成例5 7 [117] 5 mm 3 8 7 PAA- 1 合成例5 7 [117] 10 實施例3 8 8 PAA- 1 合成例5 7 [117] 2 0 實施例3 8 9 PAA- 1 合成例5 7 [117] 3 0 實施例3 9 0 P AA- 1 合成例5 7 [117] 4 0 實施例3 9 1 P AA- 1. 合成例5 7 [117] 5 0 實施例3 9 2 PAA- 1 合成例5 7 [117] 7 0 實施例3 9 3 P AA- 1 合成例5 8 [119] 5 實施例3 9 4 PAA- 1 合成例5 8 [119] 6 實施例3 9 5 PAA- 1 合成例5 8 「119] 7 實施例3 9 6 Γ PAA- 1 合成例6 0 [12 3] 5 實施例3 9 7 PAA- 1 合成例6 1 [12 5] 5 實施例3 9 8 P AA- 1 合成例6 1 [12 5] 7 實施例3 9 9 PAA- 1 合成例6 1 [12 5] 10 實施例4 0 0 PAA- 1 合成例6 1 [12 5] 15 實施例4 0 1 PAA- 1 合成例6 1 [12 5] 2 0 <實施例402至403 > 各自將修飾用化合物用之上述合成例所製作的下述表 18所記載之化合物,以相對於聚醯胺酸(paA-3)溶液之固 體成分(即聚醯胺酸(PAA-3)爲表18所記載之質量%之量, 加入上述製作之聚醯胺酸(PAA-3)溶液(40.0g)中,室溫下 攪拌爲均勻溶液,調製實施例402至403之形成聚醯亞胺 膜用之塗佈液。 [表 18] 聚酸胺酸 修飾用化合物 添加量(wt%) 實施例4 0 2 P AA- 3 [10 7] 7 0 實施例4 0 3 P AA- 3 [10 7] 10 0 〈實施例4〇4至53 6 >〈評估液晶配向性及測定垂直 配向型用反平行液晶單元之預傾角> -140- 201240981 [製作液晶配向膜及液晶單元] 使用上述各實施例383至403所調製之形成聚醯亞胺 膜用之塗佈液(液晶配向劑),以下述方法製作液晶單元。 將形成聚醯亞胺膜用之塗佈液(液晶配向劑)旋塗於玻 璃基板上,置於80°C之熱板上乾燥70秒後,置於加熱至 2〇〇°C之熱風循環式烤箱內焙燒30分鐘,形成膜厚l〇〇nm 之塗膜。 其後將曝光量變化於OmJ至100 OmJ之間之直線偏光 UV光線(UV波長313nm,照射強度8.0mW/cnT2),由相對 於板之法線傾斜40 °C之方向照射於該塗膜面。調製直線 偏光UV之方法爲,使高壓水銀燈之紫外光通過3 13nm之 帶通濾光器後,再通過313nm之偏光板。 準備2枚該類經液晶配向處理之附液晶配向膜之基 板,將6μπι之調距器散佈於其中1枚液晶配向膜上,再 將封裝劑印刷於其上方,以液晶配向膜面對面方式使經照 射偏光之方向相互平行酸貼合另一枚基板後,硬化封裝劑 製作空單元。以減壓注入法將液晶MLC-6608(美爾庫公司 製)注入該空單兀中’封裝注入口’得各垂直配向型用反 平行液晶單元。 其次以偏光板挾持所得之上述液晶單元,由後方照射 背光之狀態下回轉液晶單元,以目視觀察明暗變化及有無 流動配向下液晶是否配向,結果得良好之配向性。其後將 3 V之交流電壓施加於液晶單元’再以目視觀察液晶是否 配向。此時以下述基準評估。結果如表19_i至19_5所 -141 - 201240981 示。 評估基準 良好:可確認液晶配向,且無流動配向 不良:液晶雖配向,但觀察到大量流動配向 又,以1 20°c加熱所製作之上述液晶單元1小時後, 測定預傾角。預傾角係使用Axo Metrix公司之「Αχ〇 S c an」,以米勒矩陣法測定。結果如表! 9 -1至1 9 - 5所 示。 由該結果確認,如表19-1至19-5所示,使用添加具 有光反應性支鏈之修飾用化合物的形成聚醯亞胺膜用之塗 佈液(液晶配向處理劑),既使進行光配向處理也可得良好 之垂直配向性。又確認,將偏光之紫外線照射於本發明之 形成聚醯亞胺膜用之塗佈液(液晶配向處理劑),可以僅少 許傾斜於垂直之狀態得到液晶配向之能力。另外確認藉由 控制添加量及照射量,可微調整預傾角。由此得知本發明 之形成聚醯亞胺膜用之塗佈液(液晶配向處理劑)可利用於 垂直配向方式之液晶顯示元件用之液晶配向膜,又適用爲 使用光配向法之液晶配向膜。 -142- 201240981 [表 19-1] 形成聚醯亞胺膜用之塗佈液 照射強度 (m J ) 液晶配向性 預傾角 (。) 實施例編號 mm 添加量 (wt%) 未施加 電壓時 施加 麵時 實施例4 0 4 實施例4 0 2 [10 7] 70 0 良好 不良 9 0. 0 0 實施例4 0 5 實施例4 0 2 [10 7] 7 0 5 0 良好 良好 9 0. 0 0 實施例4 0 6 實施例4 0 2 [10 7] 7 0 1 0 Q 良好 良好 8 9. 9 2 實施例4 0 7 實施例4 0 2 [10 7] 7 0 2 0 0 良好 良好 8 9 · 9 0 實施例4 0 8 實施例4 0 2 [10 7] 7 0 4 0 0 良好 良好 8 9. 9 0 實施例4 0 9 實施例4 0 2 [10 7] 7 0 8 0 0 良好 良好 8 9. 8 6 實施例4 1 0 實施例4 0 2 [10 7] 7 0 10 0 0 良好 良好 8 9. 7 9 實施例4 1 1 實施例4 0 3 [10 7] 10 0 0 良好 不良 9 0. 0 0 實施例412 實施例4 0 3 [10 7] 10 0 5 0 良好 良好 8 9. 9 3 實施例413 實施例4 0 3 [10 7] 10 0 10 0 良好 良好 8 9. 9 3 實施例414 實施例4 0 3 [10 7] 10 0 2 0 0 良好 良好 8 9. 8 8 實施例415 實施例4 0 3 [10 7] 10 0 4 0 0 良好 良好 8 9. 8 9 實施例416 實施例4 0 3 [10 7] 10 0 8 0 0 良好 良好 8 9. 7 3 實施例417 實施例4 0 3 [10 7] 10 0 10 0 0 良好 良好 8 9. 7 0 實施例4 1 8 實施例3 8 3 [115] 1 0 0 良好 不良 9 0. 0 0 實施例4 1 9 實施例3 8 3 [115] 10 2 0 良好 良好 8 9. 3 9 實施例4 2 0 實施例3 8 3 [115] 10 5 0 良好 良好 8 9. 0 0 實施例4 2 1 實施例3 8 3 [1 1 5] 10 10 0 良好 良好 8 8. 7 2 實施例4 2 2 實施例3 8 3 [1 1 5] 1 0 2 0 0 良好 良好 8 8. 8 8 實施例4 2 3 實施例3 8 3 [115] 10 4 0 0 良好 良好 8 9. 0 6 實施例4 2 4 實施例3 8 4 [115] 15 0 良好 不良 9 0. 0 0 實施例4 2 5 實施例3 8 4 [115] 15 2 0 良好 良好 8 9. 6 5 實施例4 2 6 實施例3 8 4 [1. 1.5] 15 5 0 良好 良好 8 9. 5 7 實施例4 2 7 實施例3 8 4 [115] 1 S 10 0 良好 良好 8 9. 5 7 實施例4 2 8 實施例3 8 4 [115] 15 2 0 0 良好 良好 8 9. 4 4 實施例4 2 9 實施例3 8 4 [1 \ 5] 15 4 0 0 良好 良好 8 9. 4 2 -143- 201240981 [表 19-2] 形成聚醯亞胺膜用之塗佈液 照射強度 液晶配向性 實施例編號 麵 添加量 (wt*) (m J ) 未施加 電壓時 施加 電壓時 孭傾月 (° ) 實施例4 3 0 實施例3 8 5 [115] 2 0 0 良好 不良 9 0 . 0 0 實施例4 3 1 實施例3 8 5 [115] 2 0 2 0 良好 良好 8 9〇 9 0 實施例4 3 2 實施例3 8 5 [115] 2 0 5 0 良好 良好 8 9. 7 6 實施例4 3 3 實施例3 8 5 [115] 2 0 10 0 良好 良好 8 9. 7 0 實施例4 3 4 實施例3 8 5 [115] 2 0 2 0 0 良好 良好 8 9. 4 8 實施例4 3 5 實施例3 8 5 [115] 2 0 4 0 0 良好 良好 8 9. 5 4 實施例4 3 6 實施例3 8 6 [117] 5 0 良好 不良 9 0. 0 0 實施例4 3 7 實施例3 8 6 [117] 5 2 0 良好 良好 8 8. 8 0 實施例4 3 8 實施例3 8 6 [117] 5 5 0 良好 良好 8 8 . 2 4 實施例4 3 9 實施例3 8 6 [117] 5 10 0 良好 良好 8 8. 2 7 實施例4 4 0 實施例3 8 6 [117] 5 2 0 0 良好 良好 8 8. 2 8 實施例4 4 1 實施例3 8 6 [117] 5 4 0 0 良好 良好 8 8, 5 6 實施例4 4 2 實施例3 8 6 [117] 5 8 0 0 良好 良好 8 8. 6 4 實施例4 4 3 啻施例3 8 6 [117] 5 10 0 0 良好 良好 8 8. 5 8 實施例4 4 4 實施例3 8 7 [117] 10 0 良好 不良 9 0. 0 0 實施例44 5 實施例3 8 7 [117] 10 2 0 良好 良好 8 9. 6 8 實施例4 4 6 實施例3 8 7 [117] 1 0 5 0 良好 良好 8 9. 3 8 實施例4 4 7 實施例3 8 7 [117] 1 0 10 0 良好 良好 8 9. 2 8 實施例4 4 8 實施例3 8 7 [1. 1 7 ] 1 0 2 0 0 良好 良好 8 9 . 10 實施例4 4 9 實施例 3 8 7 [117] 10 4 0 0 良好 良好 8 9. 2 7 實施例4 5 0 實施例 3 8 7 [117] 10 8 0 0 良好 良好 8 9. 3 1 實施例4 5 1 實施例3 8 7 [1 1.7] 10 10 0 0 良好 良好 8 9 . 18 實施例4 5 2 實施例3 8 8 [117] 2 0 0 良好 不良 9 0. 0 0 實施例4 5 3 實施例3 8 8 [117] 2 0 2 0 良好 良好 8 9. 8 1 實施例4 5 4 實施例3 8 8 [117] 2 0 5 0 良好 良好 8 9 . 5 2 實施例4 5 5 實施例3 8 8 [117] 2 0 10 0 良好 良好 8 9. 5 2 實施例4 5 6 實施例3 8 8 [117] 2 0 2 0 0 良好 良好 8 9. 3 6 實施例4 5 7 實施例3 8 8 [117] 2 0 4 0 0 良好 良好 8 9. 3 2 實施例4 5 8 實施例3 8 8 [1 1. 7 ] 2 0 8 0 0 良好 良好 8 9. 3 0 實施例4 5 9 實施例3 8 8 [117] 2 0 10 0 0 良好 良好 8 9. 2 8 -144- 201240981 [表 19-3] 形成聚醯亞胺膜用之塗佈液 照射強度 (m J ) 液晶配向性 預傾角 (。) 實施例編號 種類 添加量 (wt%) 未施加 電壓時 施加 雷壓時 實施例4 6 0 實施例3 8 9 [117] 3 0 0 良好 不良 9 0. 0 0 實施例4 6 1 實施例3 8 9 [117] 3 0 2 0 良好 良好 8 9. 8 8 實施例4 6 2 實施例3 8 9 [117] 3 0 5 0 良好 良好 8 9. 7 1 實施例4 6 3 實施例3 8 9 [117] 3 0 1 0 0 良好 良好 8 9 * 5 5 實施例4 6 4 實施例3 8 9 [117] 3 0 2 0 0 良好 良好 8 9. 4 3 實施例4 6 5 實施例3 8 9 [117] 3 0 4 0 0 良好 良好 8 9. 3 1 實施例4 6 6 實施例3 8 9 [117] 3 0 8 0 0 良好 良好 8 9. 3 0 實施例4 6 7 實施例3 8 9 [117] .30 10 0 0 良好 良好 8 9 . 3 3 實施例4 6 8 實施例3.9 0 [117] 4 0 0 良好 不良 9 0 . 0 0 實施例4 6 9 實施例3 9 0 [117] 4 0 2 0 良好 良好 8 9. 8 1 實施例4 7 0 實施例3 9 0 [117] 4 0 5 0 良好 良好 8 9. 7 0 實施例4 7 1 實施例3 9 0 [117] 4 0 10 0 良好 良好 8 9. 5 7 實施例4 7 2 實施例3 9 0 [1 17] 4 0 2 0 0 良好 良好 8 9. 4 3 實施例4 7 3 實施例3 9 0 [117] 4 0 4 0 0 良好 良好 8 9. 4 4 實施例47 4 實施例3 9 0 [117] 4 0 8 0 0 良好 良好 8 9. 3 2 實施例4 7 5 實施例3 9 0 [117] 4 0 10 0 0 良好 良好 8 9 _ .2 6 實施例4 7 6 實施例3 9 1 [117] 5 0 0 良好 不良 9 0 . 0 0 實施例4 7 7 實施例3 9 1 [117] 5 0 2 0 良好 良好 8 9. 9 8 實施例4 7 8 實施例3 9 1 [117] 5 0 5 0 良好 良好 8 9. 8 2 實施例4 7 9 實施例3 9 1 [117] 5 0 10 0 良好 良好 8 9 . 7 3 實施例4 8 0 實施例3 9 1 [1 1 .7 ] 5 0 2 0 0 .良好 良好 8 9· 7 8 實施例4 8 1 實施例3 9 1 [117] 5 0 4 0 0 良好 良好 8 9 . 7 5 實施例4 8 2 實施例3 9 1 [117] 5 0 8 0 0 良好 良好 8 9. 7 3 實施例4 8 3 實施例3 9 1 [117] 5 0 10 0 0 良好 良好 8 9. 7 4 S, -145- 201240981 [表 19-4] 形成聚醯亞胺膜用之塗佈液 照射強度 (m J) 液晶配向性 預傾角 (° ) 實施例編號 觀 添加量 (wt%) 未施加 電壓時 施加 電壓時 實施例4 8 4 實施例3 9 2 [117] 7 0 0 良好 不良 9 0. 0 0 實施例4 8 5 實施例3 9 2 [117] 7 0 2 0 良好 良好 8 9 . 9 4 實施例4 8 6 實施例3 9 2 [117] 7 0 5 0 良好 良好 8 9 . 8 9 實施例4 8 7 實施例3 9 2 [117] 7 0 10 0 良好 良好 8 9 . 8 5 實施例4 8 8 實施例3. 9 2 [117] 7 0 2 0 0 良好 良好 8 9. 7 5 實施例4 8 9 實施例3 9 2 [117] 7 0 4 0 0 良好 良好 8 9. 4 8 實施例4 9 0 實施例3 9 2 [117] 7 0 8 0 0 良好 良好 8 9. 4 9 實施例4 9 1 實施例3 9 2 [117] 7 0 10 0 0 良好 良好 8 9. 6 1 實施例4 9 2 實施例3 9 3 [119] 5 0 良好 不良 9 0. 0 0 實施例4 9 3 實施例3 9 3 [119] 5 2 0 良好 良好 S 9 . 9 5 實施例4 9 4 實施例3 9 3 [119] 5 5 0 良好 良好 8 9 . 7 0 實施例4 9 5 實施例3 9 3 [119] 5 10 0 良好 良好 8 9. 6 2 實施例4 9 6 實施例3 9 3 [119] 5 2 0 0 良好 良好 8 9. 6 0 實施例4 9 7 實施例3 9 <1 [1 19] 6 0 良好 不良 9 0. 0 0 實施例4 9 8 實施例3 9 4 [119] 6 2 0 良好 良好 8 9. 9 5 實施例4 9 9 實施例3 9 4 [119] 6 5 0 良好 良好 8 9 . 7 0 實施例5 0 0 實施例3 9 4 [119] 6 10 0 良好 良好 8 9 . 6 2 實施例5 0 1 實施例3 9 4 [119] 6 2 0 0 良好 良好 8 9 . 6 0 實施例5 0 2 實施例3 9 5 [119] 7 0 良好 不良 9 0. 0 0 實施例5 0 3 實施例3 9 5 [119] 7 2 0 良好 良好 8 9. 9 4 實施例5 0 4 實施例3 9 5 [1 19] 7 5 0 良好 良好 8 9. 7 4 實施例5 0 5 實施例3 9 5 U 1 9] 7 10 0 良好 良好 8 9. 5 7 實施例5 0 6 實施例3 9 5 [119] 7 2 0 0 良好 良好 8 9. 6 3 實施例5 0 7 實施例3 9 6 [12 3] 5 0 良好 不良 9 0. 0 0 實施例5 0 8 實施例3 9 6 [12 3] 5 2 0 良好 良好 8 9. 1 4 實施例5 0 9 實施例3 9 6 [1 2 3] 5 5 0 良好 良好 8 9. 5 4 實施例5 1 0 實施例3 9 6 [12 3] 5 1 0 0 良好 良好 8 8. 2 0 實施例5 1 ] 實施例3 9 6 [12 3] 5 2 0 0 良好 良好 8 8· 2 4 -146- 201240981 [表 19-5] 形成聚酿亞胺膜用之塗佈液 照射強度 (m J ) -Hi 未咖 電壓時 實施例編號 讎 添加量 (wt%) 預傾角 (。) 實施例5 1 2 實施例3 9 7 [12 5] 5 0 良好 管施例513 實施例3 9 7 [12 5] 5 2 0 良好 3g: s: 9 0.00 實施例5 14 實施例3 9 7 [1 2 5] 5 5 0 7. 5 5 眚施例515 實施例3 9 7 [12 5] 5 10 0 8 9 窗施例5 16 實施例3 9 7 [12 5] 5 2 0 0 —8 8. 〇〇 實施例5 1 7 實施例3 9 8 [12 5] 7 0 良好 -8 8. 4 8 窗施例5 1 8 實施例3 9 8 [12 5] 7 2 0 良好 卜?— 〇 · 0 0 實施例5 1 9 實施例3 9 8 [12 5] 7 5 0 良好 良好 8 8. 7 6 ~§_β· 0 5 -A»· 1 8 —8 8. 4 2 —9 〇 0 0 窨施例5 2 0 實施例3 9 8 [12 5] 7 10 0 良好 不良 實施例5 2 1 實施例3 9 8 [12 5] 7 2 0 0 實施例5.2 2 實施併J 3 9 9 [12 5] 10 0 窨施例5 2 3 實施例3 9 9 [12 5] 10 2 0 良好~ 實施例5 2 4 實施例3 9 9 [12 5] 10 5 0 良好 良好 »»? ^ . 4 2 -§ 9. 12 ΙΙΙΓτΤ' —8 8 . 3 fi 9 0.00 μ§ θ. 5 9 盲施例5 2 5 實施例3 9 9 [12 5] 10 10 0 赫_ 眚施例5 2 6 實施例3 9 9 [12 5] 10 2 0 0 良好 管施例5 2 7 實施例4 0 0 [12 5] 15 0 .良好 實施例S 2 8 實施例4 0 0 [12 5] 1 5 2 0 良好 良好 實施例5 2 9 實施例4 0 0 [12 5] I 5 5 0 良好 良 實施例5 3 0 實施例4 0 0 [12 5] 15 10 0 良好 良好 一V 口 ·丄办 8 ft η ο 窨施例5 3 1 實施例4 0 0 [12 5] 15 2 0 0 良好 良好 -^ ° » » 4, 8 8.86 實施例5 3 2 實施例4 0 1 [12 5] 2 0 0 _良好 不良 實施例5 3 3 實施例4 0 1 [12 5] 2 0 2 0 良好 良好~ 實施例5 3 4 實施例4 0 1 [12 5] 2 0 5 0 良好 良好 Λ±,~Τ3~ -111 2 5 8 8. 9 #? 實施例5 3 5 實施例4 0 1 [12 5] 2 0 10 0 良好 良好 實施例5 3 6 實施例4 0 1 [12 5] 2 0 2 0 0 良好 〈實施例537至578> 各自將修飾用化合物之上述合成例所製作的下述_ 20-1至20-2所記載之化合物’以相對於聚醯胺酸(pAA_q 溶液之固體成分(即聚醯胺酸(PAA-1))爲下述表至 2 0-2所記載之比例之量,加入上 述所製作之聚醯胺酸 (PAA-1)溶液(lO.Og)中,室溫下攪拌爲均勻溶液,調製 施例5 3 7至5 7 8之形成聚醯亞胺膜用之塗佈液》 -147- 201240981 [表 20-1] 聚醯胺酸 修飾用化合物 麵 添加量 (w t %) 實施例5 3 7 P AA- 1 合成例5 3 [10 9] 5 0 實施例5 3 8 P AA- 1 合成例5 3 [10 9] 5 0 實施例5 3 9 P AA- 1 合成例5 3 [10 9] 5 0 mm 5 4 0 P AA- 1 合成例5 3 [10 9] 5 0 實施例5 4 1 P AA- 1 合成例5 3 [10 9] 5 0 實施例5 4 2 P AA- 1 合成例5 3 [10 9] 5 0 實施例5 4 3 P AA- 1 合成例5 3 [10 9] 7 0 實施例5 4 4 P AA- 1 合成例5 3 [10 9] 7 0 實施例5 4 5 P AA- 1 合成例5 3 [10 9] 7 0 實施例5 4 6 P AA- 1 合成例5 3 [10 9] 7 0 實施例5 4 7 P AA- 1 合成例5 3 [10 9] 7 0 實施例5 4 8 P AA- 1 合成例5 3 [10 9] 7 0 實施例5 4 9 P AA- 1 合成例5 3 [10 9] 10 0 實施例5 5 0 P AA- 1 合成例5 3 [10 9] 10 0 實施例5 5 1 P AA- 1 合成例5 3 [10 9] 10 0 實施例5 5 2 P AA- 1 合成例5 3 [10 9] 10 0 實施例5 5 3 P AA- 1 合成例5 3 [10 9] 10 0 實施例5 5 4 P AA - 1 合成例5 3 [10 9] 10 0 實施例5 5 5 P AA- 1 合成例5 4 [111] 5 0 實施例5 5 6 P AA- 1 合成例5 4 [111] 5 0 實施例5 5 7 P AA- 1 合成例5 4 [111] 5 0 實施例5 5 8 P AA - 1 合成例5 4 [111] 5 0 實施例5 5 9 P AA - 1 合成例5 4 [111] 5 0 實施例5 6 0 P AA- 1 合成例5 4 [111] 5 0 -148- 201240981 [表 20-2] 聚醯胺酸 修飾用化雜 觀 添加量 (wt %) 實施例5 6 1 P AA- 1 合成例5 5 [113] 5 0 實施例5 6 2 P AA- 1 合成例5 5 [113] 5 0 實施例5 6 3 P AA- 1 合成例5 5 [113] 5 0 實施例5 6 4 PAA- 1 合成例5 5 [113] 5 0 實施例5 6 5 P AA- 1 合成例5 5 [113] 5 0 實施例5 6 6 PAA- 1 合成例5 5 [113] 5 0 實施例5 6 7 P AA- 1 合成例5 5 [113] 7 0 實施例5 6 8 P AA- 1 合成例5 5 [113] 7 0 實施例5 6 9 P AA- 1 合成例5 5 [113] 7 0 實施例5 7 0 PAA- 1 合成例5 5 [113] 7 0 實施例5 7 1 P AA- 1 合成例5 5 [113]. 7 0 實施例5 7 2 P AA- 1 合成例5 5 [113] 7 0 實施例5 7 3 P A A — 1 合成例5 5 [113] 10 0 實施例5 7 4 P AA- 1 合成例5 5 [113] 10 0 實施例5 7 5 PAA- 1 合成例5 5 [113] 10 0 實施例5 7 6 P AA- 1 合成例5 5 [113] 10 0 實施例5 7 7 PAA- 1 合成例5 5 [113] 1 0.0 實施例5 7 8 PAA- 1 合成例5 5 [113] 10 0 〈實施例5 79至620 > <水平配向型用反平行單元之 液晶配向性評估> [製作液晶配向膜及液晶單元] 使用上述各實施例5 3 7至5 7 8所調製之形成聚醯亞胺 膜用之塗佈液(液晶配向劑),以下述方法製作液晶單元。 將形成聚醯亞胺膜用之塗佈液(液晶配向劑)旋塗於玻 璃基板上,置於80°C之熱板上乾燥70秒後,再置於加熱 至200 °C之熱風循環式烤箱內焙燒30分鐘,形成膜厚 lOOnm之塗膜。 其後將曝光量變化於OmJ至100mJ之間之直線偏光 UV光線(UV波長3 1 3nm,照射強度8.0mW/cm·2),由基板 正上方照射於該塗膜面。又,調製直線偏光UV之方法S -137- 201240981 "Non-vertical", the results are shown in Table 16. The anti-parallel liquid crystal cell is prepared by using a glass substrate with an ITO transparent electrode in addition to the substrate, and baking conditions of various coating films for forming a polymer film are baked in a hot air circulating oven heated to 200 ° C. The same operation as that of the vertical alignment type anti-parallel liquid crystal cell (Examples 210 to 321) was carried out for 30 minutes without performing the alignment treatment. Further, the same operation was carried out on the compound to which no modification compound was added, and the effect was compared. [Table 16] Coating liquid for forming a polymer film '~* with or without vertical alignment polymer species) Addition amount of electrochemical decoration type (wt*) Example 3 5 9 Po 1 yme r — 1 [5 1] 5 Vertical implementation Example 3 6 0 Polymer-1 [5 1] 10 Vertical Example 3 6 1 P ο 1yme r-1 [5 1] .2 0 Straight Comparative Example 1 2 Polymer-1 None - Non-Vertical Example 3 6 2 P o 1yme r — 2 [5 1] 3 0 Vertical implementation furnace ί 3 6 3 Polymer — 2 [5 1] 4 0 Vertical comparison example 1 3 P ο 1 yme r — 2 None — Non-vertical embodiment 3 6 4 Polymer — 3 [4 9] 2 0 Vertical Embodiment 3 6 5 P ο 1yme r — 3 [5 1] 2 0 Vertical Comparative Example 1 4 P o 1yme r- 3 No __ Non-Vertical Example 3 6 6 Polymer — 4 [ 4 9] 2 0 Vertical Embodiment 3 6 7 P ό 1yme r — 4 [5 1] 5 Vertical Embodiment 3 6 8 P ο 1yme r — 4 [5 1] 10 Vertical Embodiment 3 6 9 P o 1yme r — 4 [5 1] 2 0 Vertical Comparative Example 1 5 P ο 1 y τη er — 4 None — Non-Vertical Example 3 7 0 Polymer-5 [4 9] 5 Vertical Example 3 7 1 Polymer — 5 [49] 1 0 Vertical Embodiment 3 7 2 P ο 1 yme r — 5 [4 9] 2 0 Vertical implementation 3 7 3 Polymer-5 [5 1] 5 Vertical Example 3 7 4 Polymer — 5 [5 1] 10 Vertical Example 3 7 5 Polymer — 5 [5 1] 2 0 Vertical Comparative Example 1 6 Polymer-5 None— Non-Vertical Example 3 7 6 Po lyme r — 6 [4 9] 5 Non-Vertical Example 3 7 7 P o 1 yme r — 6 [4 9] 2 0 Vertical Embodiment 3 7 8 P ό 1 yme, r — 6 [5 1] 10 Vertical. Example 3 7 9 Polymer-6 [5 1] 2 0 Vertical Comparative Example 1 7 Polymer-6 No - Non-Vertical Example 3 8 0 P o 1yme r — 7 [4 9] 5 Vertical Example 3 8 1 Polymer-7 [49] 10 Vertical Example 3 8 2 P o 1yme r- 7 [49] 2 0 Vertical comparison gamma 1 8 Polymer a 7 sister - vertical * * Liquid crystal injection port There is light leakage (ie, non-sag®-138-201240981. It is confirmed from this result that even in any polymer of Polymer-1 to Polymer-6, Comparative Example 1 2 to 1 8 without addition of a modifying compound has no vertical alignment property. However, when a coating liquid for forming a polymer film is added to a compound for modification, vertical alignment property can be obtained by adding an appropriate amount to each polymer. That is, the type and amount of the additive are appropriately selected, and it is confirmed that the vertical alignment unit is easily produced regardless of the type of the basic polymer. Further, since Polymer-7 has vertical alignment without adding an additive, it is not necessary to prepare an additive for the vertical alignment unit, but it is confirmed that the vertical alignment property is improved when the additive is added. <Example 3 8 3 to 401 > Each of the compounds described in the above Synthesis Table prepared by using the compound for modification described above was used as a solid component with respect to polyacrylic acid (Pa plant solution) Polyammonic acid (PAA-1)) is added to the above-prepared polylysine (PAA-1) solution (l〇.〇g) in the proportions shown in Table 17 below, and is disturbed at room temperature. The coating liquid for forming a polyaniline film was prepared by using the homogenous solution's to prepare Examples 383 to 401. -139- 201240981 [Table 17] Polyampinic acid's compounding amount (% by weight) of the compound for modification Example 3 8 3 PAA-1 Synthesis Example 5 6 [115] 10 Example 3 8 4 PAA-1 Synthesis Example 5 6 [115] 15 Example 3 8 5 P AA-1 Synthesis Example 5 6 [115] 2 0 Example 3 8 6 PAA-1 Synthesis Example 5 7 [117] 5 mm 3 8 7 PAA- 1 Synthesis Example 5 7 [117] 10 Example 3 8 8 PAA-1 Synthesis Example 5 7 [117] 2 0 Example 3 8 9 PAA-1 Synthesis Example 5 7 [117] 3 0 Example 3 9 0 P AA-1 Synthesis Example 5 7 [117] 4 0 Example 3 9 1 P AA- 1. Synthesis Example 5 7 [117] 5 0 Implementation Example 3 9 2 PAA-1 Synthesis Example 5 7 [117] 7 0 Example 3 9 3 P AA-1 Synthesis Example 5 8 [119] 5 Example 3 9 4 PAA-1 Synthesis Example 5 8 [119] 6 Example 3 9 5 PAA-1 Synthesis Example 5 8 "119] 7 Example 3 9 6 Γ PAA-1 Synthesis Example 6 0 [12 3] 5 Example 3 9 7 PAA-1 Synthesis Example 6 1 [12 5] 5 Example 3 9 8 P AA-1 Synthesis Example 6 1 [12 5] 7 Example 3 9 9 PAA-1 Synthesis Example 6 1 [12 5 10 Example 4 0 0 PAA-1 Synthesis Example 6 1 [12 5] 15 Example 4 0 1 PAA-1 Synthesis Example 6 1 [12 5] 2 0 <Examples 402 to 403 > The compound described in the following Table 18 produced by the above-mentioned synthesis example is described as a solid component of the polyacrylic acid (paA-3) solution (i.e., polyamine acid (PAA-3) is shown in Table 18). The amount of the mass% was added to the polyamic acid (PAA-3) solution (40.0 g) prepared above, and stirred at room temperature to obtain a homogeneous solution, and the coatings of the polyimine films of Examples 402 to 403 were prepared. Cloth liquid. [Table 18] Amount of addition of compound for polyamic acid modification (wt%) Example 4 0 2 P AA-3 [10 7] 7 0 Example 4 0 3 P AA- 3 [10 7] 10 0 Example 4〇4 to 53 6 > <Evaluation of liquid crystal alignment and measurement of pretilt angle of anti-parallel liquid crystal cell for vertical alignment type] -140 - 201240981 [Production of liquid crystal alignment film and liquid crystal cell] Using the above embodiments 383 to 403 A liquid crystal cell was produced by the following method by preparing a coating liquid (liquid crystal alignment agent) for forming a polyimide film. The coating liquid (liquid crystal alignment agent) for forming a polyimide film is spin-coated on a glass substrate, dried on a hot plate at 80 ° C for 70 seconds, and then placed in a hot air circulation heated to 2 ° C. The oven was baked for 30 minutes to form a coating film having a film thickness of 10 nm. Thereafter, the exposure amount was changed from linear polarized UV light (UV wavelength 313 nm, irradiation intensity 8.0 mW/cnT2) between OmJ and 100 OmJ, and the film surface was irradiated in a direction inclined by 40 ° C with respect to the normal line of the plate. . The method of modulating the linear polarized UV is to pass the ultraviolet light of the high pressure mercury lamp through a bandpass filter of 3 13 nm and then pass through a polarizing plate of 313 nm. Prepare two substrates of the liquid crystal alignment film which are processed by liquid crystal alignment, spread a 6μπι distance adjuster on one of the liquid crystal alignment films, and then print the encapsulant on the liquid crystal alignment film in a face-to-face manner. The direction in which the polarized light is irradiated is applied to the other substrate in parallel with each other, and then the hardening encapsulant is used to form an empty cell. Liquid crystal MLC-6608 (manufactured by Murku Co., Ltd.) was injected into the empty unit ’ 'package injection port' by a vacuum injection method to obtain each of the vertical alignment type anti-parallel liquid crystal cells. Next, the obtained liquid crystal cell was held by a polarizing plate, and the liquid crystal cell was rotated while being irradiated with a backlight from the rear side to visually observe the change in brightness and darkness and whether or not the liquid crystal was aligned in the downward direction, resulting in good alignment. Thereafter, an alternating voltage of 3 V was applied to the liquid crystal cell', and then it was visually observed whether or not the liquid crystal was aligned. At this time, the evaluation is based on the following criteria The results are shown in Tables 19_i to 19_5 -141 - 201240981. Evaluation criteria Good: Liquid crystal alignment was confirmed, and no flow alignment was observed. The liquid crystal was aligned, but a large amount of flow alignment was observed. The liquid crystal cell was heated at 1200 ° C for 1 hour, and the pretilt angle was measured. The pretilt angle was measured by the Miller matrix method using Axo Metrix's "Αχ〇 S c an". The result is like a watch! 9 -1 to 1 9 - 5 are shown. From the results, it was confirmed that, as shown in Tables 19-1 to 19-5, a coating liquid (liquid crystal alignment treatment agent) for forming a polyimide film with a compound for modification having a photoreactive branch was used, even A good vertical alignment can also be obtained by performing photoalignment processing. Further, it has been confirmed that the polarized ultraviolet light is applied to the coating liquid (liquid crystal alignment treatment agent) for forming a polyimide film of the present invention, and the ability to obtain liquid crystal alignment can be obtained with little inclination to the vertical state. Further, it is confirmed that the pretilt angle can be finely adjusted by controlling the amount of addition and the amount of irradiation. Thus, the coating liquid (liquid crystal alignment treatment agent) for forming a polyimide film of the present invention can be used for a liquid crystal alignment film for a liquid crystal display element of a vertical alignment type, and is also suitable for liquid crystal alignment using a photo alignment method. membrane. -142- 201240981 [Table 19-1] Coating liquid for forming a polyimide film, irradiation intensity (m J ) Liquid crystal alignment pretilt angle (.) Example No. mm Adding amount (wt%) Applied when no voltage is applied Example 4 0 4 Example 4 0 2 [10 7] 70 0 Good defect 9 0. 0 0 Example 4 0 5 Example 4 0 2 [10 7] 7 0 5 0 Good good 9 0. 0 0 Example 4 0 6 Example 4 0 2 [10 7] 7 0 1 0 Q Good good 8 9. 9 2 Example 4 0 7 Example 4 0 2 [10 7] 7 0 2 0 0 Good good 8 9 · 9 0 Example 4 0 8 Example 4 0 2 [10 7] 7 0 4 0 0 Good good 8 9. 9 0 Example 4 0 9 Example 4 0 2 [10 7] 7 0 8 0 0 Good 8 9. 8 6 Example 4 1 0 Example 4 0 2 [10 7] 7 0 10 0 0 Good good 8 9. 7 9 Example 4 1 1 Example 4 0 3 [10 7] 10 0 0 Good defect 9 0. 0 0 Example 412 Example 4 0 3 [10 7] 10 0 5 0 Good good 8 9. 9 3 Example 413 Example 4 0 3 [10 7] 10 0 10 0 Good good 8 9. 9 3 Example 414 Example 4 0 3 [10 7] 10 0 2 0 0 Good Good 8 9. 8 8 Example 415 Example 4 0 3 [10 7] 10 0 4 0 0 Good good 8 9. 8 9 Example 416 Example 4 0 3 [10 7] 10 0 8 0 0 Good good 8 9. 7 3 Example 417 Example 4 0 3 [10 7] 10 0 10 0 0 Good Good 8 9. 7 0 Example 4 1 8 Example 3 8 3 [115] 1 0 0 Good defect 9 0. 0 0 Example 4 1 9 Example 3 8 3 [115] 10 2 0 Good good 8 9. 3 9 Example 4 2 0 Example 3 8 3 [115] 10 5 0 Good good 8 9. 0 0 Example 4 2 1 Example 3 8 3 [1 1 5] 10 10 0 Good good 8 8. 7 2 Example 4 2 2 Example 3 8 3 [1 1 5] 1 0 2 0 0 Good Good 8 8. 8 8 Example 4 2 3 Example 3 8 3 [115] 10 4 0 0 Good Good 8 9. 0 6 Example 4 2 4 Example 3 8 4 [115] 15 0 Good defect 9 0. 0 0 Example 4 2 5 Example 3 8 4 [115] 15 2 0 Good good 8 9. 6 5 Example 4 2 6 Example 3 8 4 [1. 1.5] 15 5 0 Good good 8 9. 5 7 Example 4 2 7 Example 3 8 4 [115] 1 S 10 0 Good good 8 9. 5 7 Example 4 2 8 Example 3 8 4 [115] 15 2 0 0 Good Good 8 9. 4 4 Example 4 2 9 Example 3 8 4 [1 \ 5] 15 4 0 0 Good Good 8 9. 4 2 -143- 20124 0981 [Table 19-2] Coating liquid for forming a polyimide film, irradiation intensity, liquid crystal alignment, example No. surface addition amount (wt*) (m J ) When a voltage is applied, voltage is applied (°) Example 4 3 0 Example 3 8 5 [115] 2 0 0 Good defect 9 0 . 0 0 Example 4 3 1 Example 3 8 5 [115] 2 0 2 0 Good good 8 9〇9 0 Example 4 3 2 Example 3 8 5 [115] 2 0 5 0 Good good 8 9. 7 6 Example 4 3 3 Example 3 8 5 [115] 2 0 10 0 Good good 8 9. 7 0 Example 4 3 4 Example 3 8 5 [115] 2 0 2 0 0 Good Good 8 9. 4 8 Example 4 3 5 Example 3 8 5 [115] 2 0 4 0 0 Good Good 8 9. 5 4 Example 4 3 6 Example 3 8 6 [117] 5 0 Good defect 9 0. 0 0 Example 4 3 7 Example 3 8 6 [117] 5 2 0 Good good 8 8. 8 0 Example 4 3 8 Example 3 8 6 [117] 5 5 0 Good Good 8 8 . 2 4 Example 4 3 9 Example 3 8 6 [117] 5 10 0 Good Good 8 8. 2 7 Example 4 4 0 Example 3 8 6 [117] 5 2 0 0 Good good 8 8. 2 8 Example 4 4 1 Example 3 8 6 [117] 5 4 0 0 Good good 8 8, 5 6 Real Example 4 4 2 Example 3 8 6 [117] 5 8 0 0 Good Good 8 8. 6 4 Example 4 4 3 啻 Example 3 8 6 [117] 5 10 0 0 Good Good 8 8. 5 8 Implementation Example 4 4 4 Example 3 8 7 [117] 10 0 Good defect 9 0. 0 0 Example 44 5 Example 3 8 7 [117] 10 2 0 Good good 8 9. 6 8 Example 4 4 6 Example 3 8 7 [117] 1 0 5 0 Good good 8 9. 3 8 Example 4 4 7 Example 3 8 7 [117] 1 0 10 0 Good good 8 9. 2 8 Example 4 4 8 Example 3 8 7 [1. 1 7 ] 1 0 2 0 0 Good good 8 9 . 10 Example 4 4 9 Example 3 8 7 [117] 10 4 0 0 Good good 8 9. 2 7 Example 4 5 0 Example 3 8 7 [117] 10 8 0 0 Good good 8 9. 3 1 Example 4 5 1 Example 3 8 7 [1 1.7] 10 10 0 0 Good good 8 9 . 18 Example 4 5 2 Example 3 8 8 [117] 2 0 0 Good bad 9 0. 0 0 Example 4 5 3 Example 3 8 8 [117] 2 0 2 0 Good good 8 9. 8 1 Example 4 5 4 Example 3 8 8 [117] 2 0 5 0 Good good 8 9 . 5 2 Example 4 5 5 Example 3 8 8 [117] 2 0 10 0 Good good 8 9. 5 2 Example 4 5 6 Example 3 8 8 [117] 2 02 0 0 Good good 8 9. 3 6 Example 4 5 7 Example 3 8 8 [117] 2 0 4 0 0 Good good 8 9. 3 2 Example 4 5 8 Example 3 8 8 [1 1. 7 ] 2 0 8 0 0 Good good 8 9. 3 0 Example 4 5 9 Example 3 8 8 [117] 2 0 10 0 0 Good good 8 9. 2 8 -144- 201240981 [Table 19-3] Formation of poly Coating liquid for yttrium imide film Irradiation intensity (m J ) Liquid crystal alignment pretilt angle (. Example Number Addition Quantity (wt%) When a voltage is applied when no voltage is applied Example 4 6 0 Example 3 8 9 [117] 3 0 0 Good defect 9 0. 0 0 Example 4 6 1 Example 3 8 9 [117] 3 0 2 0 Good good 8 9. 8 8 Example 4 6 2 Example 3 8 9 [117] 3 0 5 0 Good good 8 9. 7 1 Example 4 6 3 Example 3 8 9 [117] 3 0 1 0 0 Good good 8 9 * 5 5 Example 4 6 4 Example 3 8 9 [117] 3 0 2 0 0 Good good 8 9. 4 3 Example 4 6 5 Example 3 8 9 [117] 3 0 4 0 0 Good good 8 9. 3 1 Example 4 6 6 Example 3 8 9 [117] 3 0 8 0 0 Good good 8 9. 3 0 Example 4 6 7 Example 3 8 9 [117] .30 10 0 0 Good good 8 9 . 3 3 Example 4 6 8 Example 3.9 0 [117] 4 0 0 Good bad 9 0 . 0 0 Example 4 6 9 Example 3 9 0 [117] 4 0 2 0 good good 8 9. 8 1 embodiment 4 7 0 embodiment 3 9 0 [117] 4 0 5 0 good good 8 9. 7 0 embodiment 4 7 1 embodiment 3 9 0 [117] 4 0 10 0 Good good 8 9. 5 7 Example 4 7 2 Example 3 9 0 [1 17] 4 0 2 0 0 Good good 8 9. 4 3 Example 4 7 3 Real Example 3 9 0 [117] 4 0 4 0 0 Good Good 8 9. 4 4 Example 47 4 Example 3 9 0 [117] 4 0 8 0 0 Good Good 8 9. 3 2 Example 4 7 5 Example 3 9 0 [117] 4 0 10 0 0 Good good 8 9 _ .2 6 Example 4 7 6 Example 3 9 1 [117] 5 0 0 Good defect 9 0 . 0 0 Example 4 7 7 Example 3 9 1 [117] 5 0 2 0 Good good 8 9. 9 8 Example 4 7 8 Example 3 9 1 [117] 5 0 5 0 Good good 8 9. 8 2 Example 4 7 9 Example 3 9 1 [117] 5 0 10 0 Good Good 8 9 . 7 3 Example 4 8 0 Example 3 9 1 [1 1 .7 ] 5 0 2 0 0 . Good Good 8 9· 7 8 Example 4 8 1 Example 3 9 1 [117] 5 0 4 0 0 Good good 8 9 . 7 5 Example 4 8 2 Example 3 9 1 [117] 5 0 8 0 0 Good good 8 9. 7 3 Example 4 8 3 Example 3 9 1 [117] 5 0 10 0 0 Good and good 8 9. 7 4 S, -145- 201240981 [Table 19-4] Coating liquid for forming polyimide film. Irradiation intensity (m J) Liquid crystal alignment Pretilt angle (°) Example No. Addition amount (wt%) When voltage is applied when no voltage is applied Example 4 8 4 Example 3 9 2 [117] 7 0 0 Good defect 9 0. 0 0 Example 4 8 5 Example 3 9 2 [117] 7 0 2 0 Good good 8 9 . 9 4 Example 4 8 6 Example 3 9 2 [117] 7 0 5 0 Good good 8 9 8 9 Example 4 8 7 Example 3 9 2 [117] 7 0 10 0 Good good 8 9 . 8 5 Example 4 8 8 Example 3. 9 2 [117] 7 0 2 0 0 Good good 8 9 7 5 Example 4 8 9 Example 3 9 2 [117] 7 0 4 0 0 Good good 8 9. 4 8 Example 4 9 0 Example 3 9 2 [117] 7 0 8 0 0 Good good 8 9 4 9 Example 4 9 1 Example 3 9 2 [117] 7 0 10 0 0 Good good 8 9. 6 1 Example 4 9 2 Example 3 9 3 [119] 5 0 Good bad 9 0. 0 0 Example 4 9 3 Example 3 9 3 [119] 5 2 0 Good Good S 9 . 9 5 Example 4 9 4 Example 3 9 3 [119] 5 5 0 Good Good 8 9 . 7 0 Example 4 9 5 Example 3 9 3 [119] 5 10 0 Good good 8 9. 6 2 Example 4 9 6 Example 3 9 3 [119] 5 2 0 0 Good good 8 9. 6 0 Example 4 9 7 Example 3 9 <1 [1 19] 6 0 Good bad 9 0. 0 0 Example 4 9 8 Example 3 9 4 [119] 6 2 0 Good good 8 9. 9 5 Example 4 9 9 Example 3 9 4 [ 119] 6 5 0 good good 8 9 . 7 0 embodiment 5 0 0 embodiment 3 9 4 [119] 6 10 0 good good 8 9 . 6 2 embodiment 5 0 1 embodiment 3 9 4 [119] 6 2 0 0 Good good 8 9 . 6 0 Example 5 0 2 Example 3 9 5 [119] 7 0 Good defect 9 0. 0 0 Example 5 0 3 Example 3 9 5 [119] 7 2 0 Good good 8 9. 9 4 Example 5 0 4 Example 3 9 5 [1 19] 7 5 0 Good good 8 9. 7 4 Example 5 0 5 Example 3 9 5 U 1 9] 7 10 0 Good good 8 9. 5 7 Example 5 0 6 Example 3 9 5 [119] 7 2 0 0 Good good 8 9. 6 3 Example 5 0 7 Example 3 9 6 [12 3] 5 0 Good defect 9 0. 0 0 Implementation Example 5 0 8 Example 3 9 6 [12 3] 5 2 0 Good Good 8 9. 1 4 Example 5 0 9 Example 3 9 6 [1 2 3] 5 5 0 Good Good 8 9. 5 4 Example 5 1 0 Example 3 9 6 [12 3] 5 1 0 0 Good good 8 8. 2 0 Example 5 1 ] Example 3 9 6 [12 3] 5 2 0 0 Good good 8 8· 2 4 -146 - 201240981 [Table 19-5] Irradiation strength (m J ) of coating liquid for forming a polyimide film - Hi Example No. 雠 Adding amount (wt%) Pretilt angle (Example 5 1 2 Example 3 9 7 [12 5] 5 0 Good Tube Example 513 Example 3 9 7 [12 5] 5 2 0 Good 3g: s: 9 0.00 Example 5 14 Example 3 9 7 [1 2 5] 5 5 0 7. 5 5 眚Example 515 Example 3 9 7 [12 5] 5 10 0 8 9 Window Example 5 16 Example 3 9 7 [12 5] 5 2 0 0 — 8 8. 〇〇 Example 5 1 7 Example 3 9 8 [12 5] 7 0 Good-8 8. 4 8 Window Example 5 1 8 Example 3 9 8 [12 5] 7 2 0 Good Bu?—〇 · 0 0 Example 5 1 9 Example 3 9 8 [12 5] 7 5 0 Good good 8 8. 7 6 ~§_β· 0 5 -A»· 1 8 —8 8. 4 2 —9 〇0 0 Example 5 2 0 Example 3 9 8 [12 5] 7 10 0 Good Poor Example 5 2 1 Example 3 9 8 [12 5] 7 2 0 0 Example 5.2 2 Implementation and J 3 9 9 [12 5] 10 0 窨 Example 5 2 3 Example 3 9 9 [12 5] 10 2 0 Good ~ Example 5 2 4 Example 3 9 9 [12 5] 10 5 0 Good Good»»? ^ . 4 2 -§ 9. 12 ΙΙΙΓτΤ' —8 8 . 3 fi 9 0.00 μ§ θ. 5 9 Blind Example 5 2 5 Example 3 9 9 [12 5] 10 10 0 Hz 眚 Example 5 2 6 Example 3 9 9 [12 5] 10 2 0 0 Good Tube Practice 5 2 7 Example 4 0 0 [12 5] 15 0. Good example S 2 8 Example 4 0 0 [12 5] 1 5 2 0 Good good example 5 2 9 Example 4 0 0 [12 5] I 5 5 0 Good example 5 3 0 Example 4 0 0 [12 5] 15 10 0 Good good one V port 丄 8 ft η ο 窨 Example 5 3 1 Example 4 0 0 [12 5] 15 2 0 0 Good good -^ ° » » 4, 8 8.86 Example 5 3 2 Example 4 0 1 [12 5] 2 0 0 _ Good bad example 5 3 3 Example 4 0 1 [12 5] 2 0 2 0 Good good ~ Example 5 3 4 Example 4 0 1 [12 5] 2 0 5 0 Good good Λ±,~Τ3~ -111 2 5 8 8. 9 #? Example 5 3 5 Example 4 0 1 [12 5] 2 0 100 good good example 5 3 6 Example 4 0 1 [12 5] 2 0 2 0 0 Good <Examples 537 to 578> Each of the following synthesis examples of the compound for modification was prepared as follows _ 20-1 to The compound described in 20-2 is added in an amount relative to polyamic acid (the solid component of the pAA_q solution (ie, polyaminic acid (PAA-1)) is in the ratios shown in the following Tables to 20-2. The polylysine (PAA-1) solution (10.Og) prepared above is stirred at room temperature to form a homogeneous solution. Example 5 3 7 to 5 7 8 Coating solution for forming a polyimide film] -147- 201240981 [Table 20-1] Compound addition amount (wt %) of polyamine acid modification Example 5 3 7 P AA-1 Synthesis Example 5 3 [10 9] 5 0 Example 5 3 8 P AA-1 Synthesis Example 5 3 [10 9] 5 0 Example 5 3 9 P AA-1 Synthesis Example 5 3 [10 9] 5 0 mm 5 4 0 P AA-1 Synthesis Example 5 3 [10 9] 5 0 Example 5 4 1 P AA-1 Synthesis Example 5 3 [10 9] 5 0 Example 5 4 2 P AA-1 Synthesis Example 5 3 [10 9] 5 0 Example 5 4 3 P AA-1 Synthesis Example 5 3 [10 9] 7 0 Example 5 4 4 P AA-1 Synthesis Example 5 3 [10 9] 7 0 Example 5 4 5 P AA-1 Synthesis Example 5 3 [10 9] 7 0 Example 5 4 6 P AA-1 Synthesis Example 5 3 [10 9] 7 0 Example 5 4 7 P AA-1 Synthesis Example 5 3 [10 9 7 0 Example 5 4 8 P AA-1 Synthesis Example 5 3 [10 9] 7 0 Example 5 4 9 P AA-1 Synthesis Example 5 3 [10 9] 10 0 Example 5 5 0 P AA-1 Synthesis Example 5 3 [10 9] 10 0 Example 5 5 1 P AA-1 Synthesis Example 5 3 [10 9] 10 0 Example 5 5 2 P AA-1 Synthesis Example 5 3 [10 9] 10 0 Example 5 5 3 P AA-1 Synthesis Example 5 3 [10 9] 10 0 Example 5 5 4 P AA - 1 Synthesis Example 5 3 [10 9] 10 0 Example 5 5 5 P AA-1 Synthesis Example 5 4 [111] 5 0 Example 5 5 6 P AA-1 Synthesis Example 5 4 [111] 5 0 Example 5 5 7 P AA- 1 Synthesis Example 5 4 [111] 5 0 Example 5 5 8 P AA - 1 Synthesis Example 5 4 [111] 5 0 Example 5 5 9 P AA - 1 Synthesis Example 5 4 [111] 5 0 Example 5 6 0 P AA-1 Synthesis Example 5 4 [111] 5 0 -148- 201240981 [Table 20-2] Addition amount of polyamine derivative for modification (wt %) Example 5 6 1 P AA-1 Synthesis Example 5 5 [0105] Example 5 6 2 P AA-1 Synthesis Example 5 5 [113] 5 0 Example 5 6 3 P AA-1 Synthesis Example 5 5 [113] 5 0 Example 5 6 4 PAA-1 Synthesis Example 5 5 [113] 5 0 Example 5 6 5 P AA-1 Synthesis Example 5 5 [113] 5 0 Example 5 6 6 PAA-1 Synthesis Example 5 5 [113] 5 0 Example 5 6 7 P AA - 1 Synthesis Example 5 5 [113] 7 0 Example 5 6 8 P AA-1 Synthesis Example 5 5 [113] 7 0 Example 5 6 9 P AA-1 Synthesis Example 5 5 [113] 7 0 Example 5 7 0 PAA-1 Synthesis Example 5 5 [113] 7 0 Example 5 7 1 P AA-1 Synthesis Example 5 5 [113]. 7 0 Example 5 7 2 P AA-1 Synthesis Example 5 5 [113] 7 0 Example 5 7 3 PAA — 1 Synthesis Example 5 5 [113] 10 0 Example 5 7 4 P AA-1 Synthesis Example 5 5 [113] 10 0 Example 5 7 5 PAA-1 Synthesis Example 5 5 [113] 10 0 Example 5 7 6 P AA-1 Synthesis Example 5 5 [113] 10 0 Example 5 7 7 PAA-1 Synthesis Example 5 5 [113] 1 0.0 Example 5 7 8 PAA-1 Synthesis Example 5 5 [113] 10 0 <Example 5 79 to 620 ><Horizontal alignment type anti-parallel unit Evaluation of Liquid Crystal Alignment > [Production of Liquid Crystal Alignment Film and Liquid Crystal Cell] Using the coating liquid (liquid crystal alignment agent) for forming a polyimide film prepared in each of the above Examples 5 3 to 5 7 8 Method of making a liquid crystal cell. The coating liquid (liquid crystal alignment agent) for forming a polyimide film is spin-coated on a glass substrate, dried on a hot plate at 80 ° C for 70 seconds, and then placed in a hot air circulation type heated to 200 ° C. It was baked in an oven for 30 minutes to form a coating film having a film thickness of 100 nm. Thereafter, the amount of exposure was changed to linearly polarized UV light (UV wavelength 3 1 3 nm, irradiation intensity 8.0 mW/cm·2) between OmJ and 100 mJ, and the coating film surface was irradiated from directly above the substrate. Also, a method of modulating linearly polarized UV
爲,使高壓水銀燈之紫外光通過313nm之帶通濾光器 S -149 - 201240981 後,再通過313nm之偏光板。 準備2枚該類經液晶配向處理之附液晶配向膜之基 板,將6μπι之調距器散佈於其中1枚之液晶配向膜面 上,再將封裝劑印刷於其上方,再以液晶配向膜面對面方 式使照射之偏光方向互相平行般貼合另一枚基板,硬化封 裝劑製作空單元β以減壓注入法將液晶MLC-2041 (美爾庫 公司製)注入該空單元中,封裝注入口,得水平配向型用 反平行液晶單元。 其次以偏光板挾持所得之上述水平配向型反平行液晶 單元,由後方照射背光之狀態下回轉液晶單元,再以目視 觀察明暗變化及有無流動配向下液晶是否配向。此時以下 述基準評估。結果如表2卜1至2 1 -2所示。 評估基準 ◎:可確認液晶配向,且無流動配向 〇:液晶雖配向,但觀察到若干流動配向 △:液晶雖配向,但觀察到大量流動配向 X:液晶完全未配向 由該結果確認,任何一種液晶單元未進行光照射時液 晶單元完全未配向,但進行光照射之液晶單元,可因應修 飾用化合物之添加量及光照射量,使液晶配向。又,既使 以1 3 0°c對確認配向之各液晶單元進行30分鐘各向同性處 理也無法明顯改變配向性。即,適當選擇添加劑之種類及添 加量,確認易製作水平配向性單元。 -150- 201240981 [表 21-1] 形成聚醯亞月 安膜用之塗佈液 照射強度 (m J) 有無 配向 實施例編號 麵 添加量 (w t %) 實施例5 7 9 實施例5 3 7 [10 9] 5 0 0 X 實施例5 8 0 實施例5 3 8 [10 93 5 0 2 0 〇 實施例5 .8 1 實施例5 3 9 [10 9] 5 0. 5 0 〇 實施例5 8 2 實施例5 4 0 [10 9] 5 0 10 0 〇 實施例5 8 3 實施例5 4 1 [10 9] 5 0 2.0 0 ◎ 實施例5 8 4 實施例5 4 2. [10 9] 5 0 5 0 0 ◎ 實施例5 8 5 實施例5 4 3 [10 9] 7 0 0 X 實施例5 8 6 實施例5 4 4 [10 9] 7 0 2 0 〇 實施例5 8 7 實施例5. 4 5 [10 9] 7 0 5 0 ◎ 實施例5 8 8 實施例5 4 6 [10 9] 7 0 10 0 ◎ 實施例5 8 9 實施例5 4 7 [10 9] 7 0 2 0 0 ◎ 實施例5 9 0 實施例5 4 8 [10 9] 7 0 5 0 0 ◎ 實施例5 9 1 實施例5 4 9 [10 9] 10 0 0 X 實施例5 9 2 實施例5 5 0 [10 9] 10 0 2 0 ◎ 實施例5 9 3 實施例5 5 1 [10 9] 10 0 5 0 ◎ 實施例5 9 4 實施例5 5 2 [10 9] 10 0 10 0 ◎ 實施例5 9 5 實施例5 5 3 [10 9] 10 0 2 0 0 ◎ 實施例5 9 6 實施例5 5 4 [10 9] 10 0 5 0 0 ◎ 實施例5 9 7 實施例5 5 5 [111] 5 0 0 X 實施例5 9 8 實施例5 5 6 [111] 5 0 2 0 〇 實施例5 9 9 實施例5 5 7 [111] 5 0 5 0 〇 實施例6 0 0 實施例5 5 8 [111] 5 0 10 0 ◎ 實施例6 0 1 實施例5 5 9 [111] 5 0 2 0 0 ◎ 實施例6 0 2 實施例5 6 0 [111] 5 0 5 0 0 ◎ [表 21-2] 形成聚醯亞 按膜用之塗佈货 交 照射強度 (m J ) 有無 配向 實施例編號 種類 添加量 (w t %) 實施例6 0 3 實施例5 6 1 [113] 5 0 0 X 實施例6 0 4 實施例5 6 2 [113] 5 0 2 0 △ 實施例6 0 5 實施例5 6 3 [113] 5 0 5 0 Δ 實施例6 0 6 實施例5 6 4 [113] 5 0 10 0 〇 實施例6 0 7 實施例5 6 5 [113] 5 0 2 0 0 〇 實施例6 0 8 實施例5 6 6 [113] 5 0 5 0 0 ◎ 實施例6 0 .9 實施例5 6 7 [113] 7 0 0 X 實施例6 1 0 實施例5 6 8 [113] 7 0 2 0 〇 實施例6 1 1 實施例5 6 9 [113] 7 0 5 0 〇 實施例6 1 2 實施例5 7 0 [113] 7 0 10 0 〇 實施例6 1 3 實施例5 7 1 [113] 7.0 2 0 0 ◎ 實施例6 1 4 實施例5 7 2 [113] 7 0 5 0 0 ◎ 實施例6 1 5 實施例5 7 3 [113] 10 0 .0 X 實施例6 1 6 實施例5 7 4 [113] 10 0 2 0 ◎ 實-施例6 1 7 實施例5 7 5 [113] 10 0 5 0 © 實施例6 1 8 實施例5 7 6 [113] 10 0 10 0 ◎ 實施例6 1 9 實施例5 7 7 [113] 10 0 2 0 0 ◎ 實施例6 2 0 實施例5 7 8 [1131 10 0 5 0 0 ◎ 151In order to pass the ultraviolet light of the high pressure mercury lamp through the 313 nm band pass filter S-149 - 201240981, it passes through a 313 nm polarizing plate. Prepare two substrates of this type of liquid crystal alignment film with liquid crystal alignment treatment, spread a 6μπι distance adjuster on one of the liquid crystal alignment film faces, and then print the encapsulant on top of it, and then face the film with the liquid crystal alignment film. The method is such that the polarizing direction of the irradiation is parallel to each other and the other substrate is bonded to each other, and the hardening encapsulant is made into the empty cell β. The liquid crystal MLC-2041 (manufactured by Mercury Co., Ltd.) is injected into the empty cell by a reduced pressure injection method, and the injection port is sealed. A horizontal alignment type anti-parallel liquid crystal cell is used. Next, the horizontal alignment type anti-parallel liquid crystal cell obtained by the polarizing plate is held, and the liquid crystal cell is rotated by the backlight while being irradiated, and then the light and dark changes are observed visually and whether the liquid crystal is aligned with the liquid crystal. The baseline assessment is described below. The results are shown in Table 2, 1 to 2 1 - 2. Evaluation criteria ◎: Liquid crystal alignment was confirmed, and no flow alignment was observed. Although the liquid crystal was aligned, a certain flow alignment was observed. Δ: Although the liquid crystal was aligned, a large amount of flow alignment was observed. X: The liquid crystal was completely unaligned. When the liquid crystal cell is not irradiated with light, the liquid crystal cell is completely unaligned, but the liquid crystal cell which is irradiated with light can align the liquid crystal in accordance with the amount of the compound to be modified and the amount of light irradiation. Further, even if the respective liquid crystal cells which were confirmed to be aligned at 130 °C were subjected to isotropic treatment for 30 minutes, the alignment property could not be remarkably changed. That is, it is confirmed that the type and amount of the additive are appropriately selected, and it is confirmed that the horizontal alignment unit is easily produced. -150-201240981 [Table 21-1] Irradiation strength (m J) of coating liquid for forming polythene sub-film; presence or absence of alignment example number surface addition amount (wt %) Example 5 7 9 Example 5 3 7 [10 9] 5 0 0 X Example 5 8 0 Example 5 3 8 [10 93 5 0 2 0 〇 Example 5. 8 1 Example 5 3 9 [10 9] 5 0. 5 0 〇 Example 5 8 2 Example 5 4 0 [10 9] 5 0 10 0 〇 Example 5 8 3 Example 5 4 1 [10 9] 5 0 2.0 0 ◎ Example 5 8 4 Example 5 4 2. [10 9] 5 0 5 0 0 ◎ Example 5 8 5 Example 5 4 3 [10 9] 7 0 0 X Example 5 8 6 Example 5 4 4 [10 9] 7 0 2 0 〇 Example 5 8 7 Example 5. 4 5 [10 9] 7 0 5 0 ◎ Example 5 8 8 Example 5 4 6 [10 9] 7 0 10 0 ◎ Example 5 8 9 Example 5 4 7 [10 9] 7 0 2 0 0 ◎ Example 5 9 0 Example 5 4 8 [10 9] 7 0 5 0 0 ◎ Example 5 9 1 Example 5 4 9 [10 9] 10 0 0 X Example 5 9 2 Example 5 5 0 [10 9] 10 0 2 0 ◎ Example 5 9 3 Example 5 5 1 [10 9] 10 0 5 0 ◎ Example 5 9 4 Example 5 5 2 [10 9] 10 0 10 0 ◎ Example 5 9 5 Example 5 5 3 [10 9] 10 0 2 0 0 ◎ Example 5 9 6 Example 5 5 4 [10 9] 10 0 5 0 0 ◎ Example 5 9 7 Example 5 5 5 [111] 5 0 0 X Example 5 9 8 Example 5 5 6 [111] 5 0 2 0 〇 Example 5 9 9 Example 5 5 7 [111] 5 0 5 0 〇 Example 6 0 0 Example 5 5 8 [111] 5 0 10 0 ◎ Example 6 0 1 Example 5 5 9 [111] 5 0 2 0 0 ◎ Example 6 0 2 Example 5 6 0 [111] 5 0 5 0 0 ◎ [Table 21-2] Forming the coating irradiation intensity of the polyimide film ( m J ) presence or absence of alignment example number type addition amount (wt %) Example 6 0 3 Example 5 6 1 [113] 5 0 0 X Example 6 0 4 Example 5 6 2 [113] 5 0 2 0 △ Example 6 0 5 Example 5 6 3 [113] 5 0 5 0 Δ Example 6 0 6 Example 5 6 4 [113] 5 0 10 0 〇 Example 6 0 7 Example 5 6 5 [113] 5 0 2 0 0 〇Example 6 0 8 Example 5 6 6 [113] 5 0 5 0 0 ◎ Example 6 0 . 9 Example 5 6 7 [113] 7 0 0 X Example 6 1 0 Example 5 6 8 [113] 7 0 2 0 〇 Embodiment 6 1 1 Embodiment 5 6 9 [113] 7 0 5 0 〇 Embodiment 6 1 2 Example 5 7 0 [113] 7 0 10 0 〇 Example 6 1 3 Example 5 7 1 [113 7.0 2 0 0 ◎ Example 6 1 4 Example 5 7 2 [113] 7 0 5 0 0 ◎ Example 6 1 5 Example 5 7 3 [113] 10 0 . 0 X Example 6 1 6 Example 5 7 4 [113] 10 0 2 0 ◎ Real - Example 6 1 7 Example 5 7 5 [113] 10 0 5 0 © Example 6 1 8 Example 5 7 6 [113] 10 0 10 0 ◎ Implementation Example 6 1 9 Example 5 7 7 [113] 10 0 2 0 0 ◎ Example 6 2 0 Example 5 7 8 [1131 10 0 5 0 0 ◎ 151
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