201215276 六、發明說明： 【發明所屬之技術領域】 [0001] 本發明涉及一種殼體及其製造方法。 [先前技術] [0002] 鋁、鎂等金屬及其合金被廣泛應用於航空、航天、汽車 及微電子等工業領域。但鋁、鎂等金屬及其合金最明顯 的缺點為耐腐蝕差，暴露於自然環境中會引起表面快速 腐钱。 Q [0003] 提高鋁、鎂等金屬及其合金耐腐蝕性的方法通常為在其 表面形成保護性的膜層。傳統的陽極氧化、電沉積、化 學轉化膜技術及電鍍等表面處理方法存在生產工藝複雜 • ' 、效率低、環境污染嚴重等缺點。而真空鍍膜（PVD)技術 雖為一種非常環保的鍍膜工藝，且可鍍製的膜層種類豐 富、耐磨性能優異，但PVD工藝沉積的膜層大多以柱狀晶 形態生長，因此膜層存在大量的晶間間隙，導致膜層緻 密性不夠而對鋁、鎂等金屬及其合金的耐腐蝕性能的提 〇 高有限。 【發明内容】 [0004] 鑒於此，提供一種具有良好耐腐蝕性的殼體。 [0005] 另外，還提供一種上述殼體的製造方法。 [0006] —種殼體，包括基體及形成於基體上的防腐層，該防腐 層為CeSi NO層。 [0007] 一種殼體的製造方法，包括以下步驟： [0008] 提供基體； 099131906 表單編號A0101 第3頁/共9頁 0992055885-0 201215276 _9]以I氣為反應氣體，採㈣城氧㈣乾’於該基體上 磁控濺射防腐層’該防腐層為CeSiNO層。 ί：0010] $述防腐層在其⑯成過程巾可形成n相的s i π 4及陶免 相的Ce〇2 ’該兩相陶:是相對酸驗有一定的抵抗力，化學 穩定性及熱穩定性高，從而可提高殼體的耐腐触性。另 外Si3N4相及ce〇2相的兩相共沉積，能互相抑制柱狀晶 體的生長，增強所述防腐層的緻密性，從而進—步提高 所述殼體的耐腐蝕性。 【實施方式】 陳]β參關1，本發明—較佳實施例的殼體W包括基體^及 形成於該基體U上的防腐層131基體π的材質可為銘 、鎂、鋁合金或鎂合金。該殼體10可為3C電子產品的殼 體，亦可為眼鏡邊框、建築用件及汽車等交通工具的零 部件等。 [_該防腐層13為鈽錢氧（CeSiN〇)層，其摩度為〇 5 3. 。该防腐層13藉由磁控識射法沉積形成。 [剩可以理解的，在該防腐層_表面還可鑛覆顏色層15， 以增強該殼體1 〇的美觀性。 闺本發明-較佳實施例的製造所述殼㈣的方法主要包括 如下步驟： [0015] [0016] 099131906 提供基體11，所述基Λ 土 mil的材質可為紹、錢、銘合金或 鎮合金。 ’土體11依次進行研磨及電解抛光。電解拋光後，再依 ^去離子水和無水乙醇對該基體u 表+編號删1 - —^ 1〇55 201215276 [0017] Ο [0018] [0019]Ο 擦拭後的基體11放入盛裝有丙酮溶液的超聲波清洗器中 進行震動清洗，以除去基體11表面的雜質和油污等。清 洗完畢後吹幹備用。 對經上述處理後的基體11的表面進行電漿清洗，進一步 去除基體11表面的油污，以改善基體11表面與後續塗層 的結合力。該電漿清洗的具體操作及工藝參數可為：將 基體11放入一射頻磁控濺射鍍膜機（圖未示）的鍍膜室 内，抽真空該鍍膜室至真空度為1. 0xl0_3Pa，以 250〜500sccm (標準狀態毫升/分鐘）的流量向鍍膜室中 通入純度為99. 999%的氬氣，於基體11上施加-1 50 — 500V的偏壓，對基體11表面進行電漿清洗，清洗 時間為5〜1 5 m i η。 在對基體11進行電漿清洗後，於該基體11上形成防腐層 13。該防腐層13為CeSiNO層。形成該防腐層13的具體操 作及工藝參數如下： 以氩》氣為工作氣體，調節氬氣流量為10~150sccm，向鑛 膜室中通入流量為40~15〇3£^111的_反應氣體氮氣，於基體 11上施加- 50 — 115V的偏壓，並加熱鍍膜室至115~350 °C (即濺射溫度為115〜350°C);開啟安裝於所述鍍膜室 的矽（Si)靶及氧化鈽（Ce〇2)靶的電源，分別設置矽靶 的功率為50〜200W、氧化鈽靶的功率為5〜30W，沉積防腐 層13。沉積該防腐層13的時間為90~113min。 所述防腐層13在其形成過程中可形成陶瓷相的Si3N4及陶 瓷相的Ce〇2，該兩相陶瓷相對酸鹼有一定的抵抗力，化 099131906 表單編號A0101 第5頁/共9頁 0992055885-0 [0020] 201215276 學穩定性及熱穩定性高，從而可提高殼體ίο的耐腐蝕性 。另外，sw相及〇6〇9相的兩相共沉積，能互相抑制柱 狀晶體的生長，增強所述防腐層13的緻密性，從而進一 步提高所述殼體10的耐腐蝕性。 [0021] 關閉施加於基體11上的負偏壓、矽靶及氧化鈽靶的電源 ，停止通入氬氣及氮氣，待所述防腐層13冷卻後，向鍍 膜室内通入空氣，打開鍍膜室門，取出鍍覆有防腐層13 的殼體10。 [0022] 可以理解的，製造所述殼體10的方法還可包括在該防腐 層13的表面鍍覆顏色層15，以增強殼體10的美觀性。 【圖式簡單說明】 [0023] 圖1為本發明較佳實施例的殼體的剖視圖。 【主要元件符號說明】 [0024] 殼體：10 [0025] 基體：11 [0026] 防腐層：13 [0027] 顏色層：15 099131906 表單編號A0101 第6頁/共9頁 0992055885-0201215276 VI. Description of the Invention: [Technical Field of the Invention] [0001] The present invention relates to a housing and a method of manufacturing the same. [Prior Art] [0002] Metals such as aluminum and magnesium and their alloys are widely used in industrial fields such as aerospace, aerospace, automotive, and microelectronics. However, the most obvious disadvantages of metals such as aluminum and magnesium and their alloys are poor corrosion resistance, which can cause rapid surface decay due to exposure to the natural environment. Q [0003] A method for improving the corrosion resistance of metals such as aluminum and magnesium and alloys thereof is usually to form a protective film layer on the surface thereof. Conventional anodizing, electrodeposition, chemical conversion film technology, and surface treatment methods such as electroplating have disadvantages such as complex production processes, low efficiency, and serious environmental pollution. The vacuum coating (PVD) technology is a very environmentally friendly coating process, and the coating layer can be widely used and the wear resistance is excellent. However, the film deposited by the PVD process mostly grows in the form of columnar crystals, so the film layer exists. A large number of intergranular gaps result in insufficient density of the film layer and a high limit on the corrosion resistance of metals such as aluminum and magnesium and their alloys. SUMMARY OF THE INVENTION [0004] In view of this, a housing having good corrosion resistance is provided. Further, a method of manufacturing the above casing is also provided. [0006] A housing comprising a substrate and an anti-corrosion layer formed on the substrate, the anti-corrosion layer being a CeSi NO layer. [0007] A method of manufacturing a casing, comprising the following steps: [0008] providing a substrate; 099131906 Form No. A0101 Page 3 of 9 0992055885-0 201215276 _9] Using I gas as a reaction gas, mining (four) city oxygen (four) dry 'Magnetron sputtering anti-corrosion layer on the substrate' The anti-corrosion layer is a CeSiNO layer. ί:0010] The anti-corrosion layer can form n-phase si π 4 and ceramic-free phase Ce 〇 2 in its 16-inch process towel. The two-phase ceramic: it has certain resistance to chemical test, chemical stability and High thermal stability, which improves the corrosion resistance of the housing. In addition, the two phases of the Si3N4 phase and the ce〇2 phase are co-deposited, which can inhibit the growth of the columnar crystals and enhance the compactness of the coating layer, thereby further improving the corrosion resistance of the casing. [Embodiment] In the present invention, the casing W of the preferred embodiment comprises a base body and an anti-corrosion layer 131 formed on the base body U. The material of the base π may be inscription, magnesium, aluminum alloy or magnesium. alloy. The casing 10 may be a casing of a 3C electronic product, or may be a frame of a eyeglass, a building component, or a component of a vehicle such as an automobile. [_ The anti-corrosion layer 13 is a layer of CeSiN(R), and its degree of friction is 〇 5 3. The anti-corrosion layer 13 is formed by magnetron deposition. [Remainingly understandable, the color layer 15 may also be coated on the surface of the anti-corrosion layer to enhance the aesthetics of the casing 1 . The method for manufacturing the shell (four) of the preferred embodiment of the present invention mainly comprises the following steps: [0016] 099131906 provides a base 11 which can be made of Shao, Qian, Ming alloy or town. alloy. The soil 11 is sequentially subjected to grinding and electrolytic polishing. After electropolishing, according to the deionized water and absolute ethanol, the substrate u is numbered and deleted. 1 -^1〇55 201215276 [0017] [0019] [0019] The wiped substrate 11 is filled with acetone. The ultrasonic cleaning of the solution is subjected to vibration cleaning to remove impurities, oil stains, and the like on the surface of the substrate 11. After cleaning, blow dry and set aside. The surface of the substrate 11 subjected to the above treatment is subjected to plasma cleaning to further remove the oil stain on the surface of the substrate 11 to improve the adhesion of the surface of the substrate 11 to the subsequent coating. The specific operation and the process parameters of the plasma cleaning may be as follows: the substrate 11 is placed in a coating chamber of a radio frequency magnetron sputtering coating machine (not shown), and the vacuum chamber is evacuated to a vacuum of 1. 0xl0_3Pa to 250. a flow rate of ～500 sccm (standard state cc/min) was introduced into the coating chamber to a purity of 99.999% argon gas, and a bias voltage of -150 to 500 V was applied to the substrate 11, and the surface of the substrate 11 was plasma-cleaned. The cleaning time is 5 to 1 5 mi η. After the substrate 11 is subjected to plasma cleaning, an anticorrosive layer 13 is formed on the substrate 11. The anti-corrosion layer 13 is a CeSiNO layer. The specific operation and process parameters for forming the anti-corrosion layer 13 are as follows: using argon gas as the working gas, adjusting the flow rate of the argon gas to be 10 to 150 sccm, and introducing a flow rate of 40 to 15 〇 3 £^111 into the film chamber. Gas nitrogen, applying a bias voltage of -50 to 115V on the substrate 11, and heating the coating chamber to 115 to 350 ° C (that is, a sputtering temperature of 115 to 350 ° C); opening the crucible (Si) installed in the coating chamber The power source of the target and the cerium oxide (Ce〇2) target is set to have a power of 50 to 200 W, and a power of 5 to 30 W of the cerium oxide target, and the anticorrosive layer 13 is deposited. The time for depositing the anti-corrosion layer 13 is 90 to 113 min. The anti-corrosion layer 13 can form a ceramic phase of Si3N4 and a ceramic phase of Ce〇2 during the formation thereof, and the two-phase ceramic has a certain resistance against acid and alkali, and is 099131906. Form No. A0101 Page 5 / 9 page 0992055885 -0 [0020] 201215276 High stability and thermal stability, which can improve the corrosion resistance of the casing. Further, the two phases of the sw phase and the 〇6〇9 phase are co-deposited, and the growth of the columnar crystals can be suppressed from each other, and the denseness of the anticorrosive layer 13 can be enhanced, thereby further improving the corrosion resistance of the casing 10. [0021] The power supply of the negative bias, the target and the yttrium oxide target applied to the substrate 11 is turned off, and the argon gas and the nitrogen gas are stopped. After the anti-corrosion layer 13 is cooled, air is introduced into the coating chamber to open the coating chamber. The door is taken out of the casing 10 plated with the anticorrosive layer 13. [0022] It will be appreciated that the method of manufacturing the housing 10 may further include plating a color layer 15 on the surface of the anti-corrosion layer 13 to enhance the aesthetics of the housing 10. BRIEF DESCRIPTION OF THE DRAWINGS [0023] FIG. 1 is a cross-sectional view of a housing in accordance with a preferred embodiment of the present invention. [Main component symbol description] [0024] Housing: 10 [0025] Base: 11 [0026] Anti-corrosion layer: 13 [0027] Color layer: 15 099131906 Form number A0101 Page 6 of 9 0992055885-0