TWI467042B - Anticorrosion surface treating for al alloy and articles treated by the same - Google Patents

Anticorrosion surface treating for al alloy and articles treated by the same Download PDF

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TWI467042B
TWI467042B TW99129193A TW99129193A TWI467042B TW I467042 B TWI467042 B TW I467042B TW 99129193 A TW99129193 A TW 99129193A TW 99129193 A TW99129193 A TW 99129193A TW I467042 B TWI467042 B TW I467042B
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aluminum alloy
titanium
chromium
oxynitride layer
percentage
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TW201209210A (en
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Hsin Pei Chang
wen rong Chen
Huan Wu Chiang
Cheng Shi Chen
xiao-qing Xiong
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Hon Hai Prec Ind Co Ltd
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鋁合金表面防腐處理方法及其製品Aluminum alloy surface anti-corrosion treatment method and product thereof

本發明涉及一種鋁合金表面防腐處理方法及其製品。The invention relates to an anticorrosive treatment method for aluminum alloy surface and a product thereof.

鋁合金具有品質輕、散熱性能好等優點,在通訊、電子、交通運輸、建築及航太航空等領域應用廣泛。在空氣中鋁合金表面會形成氧化鋁保護膜,在一般的大氣環境下,鋁合金表面的氧化鋁膜能夠有效地對鋁合金基體進行保護,但在含有電解質的濕氣中,例如海洋表面大氣環境,鋁合金表面容易出現點蝕,嚴重破環鋁合金製品的外觀,同時導致製品使用壽命縮短。Aluminum alloy has the advantages of light weight and good heat dissipation performance, and is widely used in communications, electronics, transportation, construction and aerospace. An aluminum oxide protective film is formed on the surface of the aluminum alloy in the air. Under normal atmospheric conditions, the aluminum oxide film on the surface of the aluminum alloy can effectively protect the aluminum alloy substrate, but in the moisture containing the electrolyte, such as the surface atmosphere of the ocean. Environment, aluminum alloy surface is prone to pitting corrosion, the appearance of severely broken aluminum alloy products, and at the same time lead to shortened product life.

耐鹽霧侵蝕性能係鋁合金耐腐蝕性能的一個重要參數,為了提高鋁合金的耐鹽霧侵蝕性能,通常需要對鋁合金表面進行表面成膜處理,常見的處理手段有陽極氧化處理、烤漆等,但這些工藝都存在較大的環境污染問題。而真空鍍膜(PVD)技術雖係一種非常環保的鍍膜工藝,且可鍍製的膜層種類豐富、耐磨性能優異,但PVD工藝沉積的薄膜往往係以柱狀晶形態生長,因此膜層存在大量的晶間間隙,導致薄膜緻密性不夠而無法有效地防止鹽霧的侵蝕。Salt spray resistance is an important parameter of the corrosion resistance of aluminum alloy. In order to improve the salt spray resistance of aluminum alloy, it is usually necessary to form a surface film on the surface of aluminum alloy. Common treatment methods include anodizing, baking varnish, etc. However, these processes have major environmental pollution problems. The vacuum coating (PVD) technology is a very environmentally friendly coating process, and the coating film can be rich in variety and excellent in wear resistance. However, the film deposited by PVD process tends to grow in the form of columnar crystal, so the film layer exists. A large amount of intercrystalline gaps result in insufficient film densification and cannot effectively prevent salt spray erosion.

有鑒於此,有必要提供一種可效提高鋁合金耐鹽霧侵蝕性能的鋁合金表面防腐處理方法。In view of this, it is necessary to provide an aluminum alloy surface anticorrosive treatment method which can effectively improve the salt spray resistance of the aluminum alloy.

另外,還有必要提供一種由上述方法製得的鋁合金製品。In addition, it is also necessary to provide an aluminum alloy article obtained by the above method.

一種鋁合金表面防腐處理方法,包括以下步驟:An aluminum alloy surface anti-corrosion treatment method comprises the following steps:

採用無水乙醇對鋁合金基材進行超聲波清洗;Ultrasonic cleaning of aluminum alloy substrate with anhydrous ethanol;

以純鈦為靶材,以氬氣為工作氣體,氮氣和氧氣為反應氣體,採用磁控濺射法在鋁合金基材表面濺鍍鈦氧氮化合物層;Using pure titanium as a target, argon gas as working gas, nitrogen gas and oxygen as reaction gas, magnetron sputtering method is used to sputter a titanium oxynitride layer on the surface of the aluminum alloy substrate;

以純鉻為靶材,以氬氣為工作氣體,氮氣和氧氣為反應氣體,採用磁控濺射法在該鈦氧氮化合物層上濺鍍鉻氧氮化合物層。A pure chromium is used as a target, argon gas is used as a working gas, nitrogen gas and oxygen gas are used as reaction gases, and a chromium oxynitride layer is sputtered on the titanium oxynitride layer by magnetron sputtering.

一種鋁合金製品,包括鋁合金基材及形成於該鋁合金基材表面的複合薄膜,該複合薄膜包括形成於鋁合金基材表面的鈦氧氮化合物層及形成於該鈦氧氮化合物層上的鉻氧氮化合物層。An aluminum alloy product comprising an aluminum alloy substrate and a composite film formed on the surface of the aluminum alloy substrate, the composite film comprising a titanium oxynitride layer formed on the surface of the aluminum alloy substrate and formed on the titanium oxynitride layer Layer of chrome oxynitride.

相較於習知技術,由上述鋁合金表面防腐處理方法所製得的鋁合金製品由於其表面具有由鈦氧氮化合物層和鉻氧氮化合物層組成的複合薄膜,該複合薄膜由比較細小的晶粒組成,晶間間隙比較小,該複合薄膜表面非常緻密,可有效防止鹽霧侵蝕,因此可有效提高鋁合金的抗腐蝕性能。Compared with the prior art, the aluminum alloy article prepared by the above-mentioned aluminum alloy surface anticorrosive treatment method has a composite film composed of a titanium oxynitride layer and a chromium oxynitride layer on the surface thereof, and the composite film is relatively small. The grain composition and the intergranular gap are relatively small, and the surface of the composite film is very dense, which can effectively prevent salt spray erosion, thereby effectively improving the corrosion resistance of the aluminum alloy.

本發明鋁合金表面防腐處理方法主要包括如下步驟:The method for preserving the surface of the aluminum alloy of the invention mainly comprises the following steps:

(1)採用無水乙醇對鋁合金基材進行超聲波清洗,以除去試樣表面油污。(1) Ultrasonic cleaning of the aluminum alloy substrate with anhydrous ethanol to remove oil stain on the surface of the sample.

(2)以純鈦為靶材,以氬氣為工作氣體,氮氣和氧氣為反應氣體,採用磁控濺射法在經清洗後的鋁合金基材表面濺鍍鈦氧氮化合物(TiON)層。該步驟在磁控濺射設備中進行,濺射參數如下:真空腔內真空度為5×10-3 Pa~9×10-3 Pa,腔體溫度為100~180℃,轉架轉速為0.5~1轉/分鐘,氬氣流量為150~300sccm(標準狀態毫升/分鐘),氧氣流量為10~100sccm,氮氣流量為10~80sccm,鈦靶功率為6~12kw,偏壓為-100~-300V,占空比為40%~60%,濺射0.5~1.5小時。(2) Using pure titanium as the target, argon gas as the working gas, nitrogen and oxygen as the reaction gases, and the surface of the cleaned aluminum alloy substrate was sputtered with a titanium oxynitride (TiON) layer by magnetron sputtering. This step is carried out in a magnetron sputtering apparatus. The sputtering parameters are as follows: the vacuum degree in the vacuum chamber is 5×10 -3 Pa~9×10 -3 Pa, the cavity temperature is 100-180 ° C, and the rotating speed is 0.5. ~1 rpm, argon flow rate is 150~300sccm (standard state cc/min), oxygen flow rate is 10~100sccm, nitrogen flow rate is 10~80sccm, titanium target power is 6~12kw, bias voltage is -100~- 300V, duty cycle 40%~60%, sputtering 0.5~1.5 hours.

(3)以純鉻為靶材,以氬氣為工作氣體,氮氣和氧氣為反應氣體,採用磁控濺射法在鈦氧氮化合物薄膜表面濺鍍鉻氧氮化合物(CrON)層。該步驟在磁控濺射設備中進行,濺射參數如下:真空腔內真空度為5×10-3 Pa~9×10-3 Pa,腔體溫度為100~180℃,轉架轉速為0.5~1轉/分鐘,氬氣流量為150~300sccm,氧氣流量為10~150sccm,氮氣流量為10~100sccm,鉻靶功率為6~12kw,偏壓為-100~-300V,占空比為40%~60%,濺射0.5~3小時。由此在鋁合金基材表面獲得由鈦氧氮化合物層和鉻氧氮化合物層組成的複合薄膜。該複合薄膜的厚度大約0.6~2.5μm。(3) Using pure chromium as the target, argon gas as working gas, nitrogen and oxygen as reaction gases, and chromium oxide-oxygen compound (CrON) layer were sputtered on the surface of titanium oxynitride film by magnetron sputtering. This step is carried out in a magnetron sputtering apparatus. The sputtering parameters are as follows: the vacuum degree in the vacuum chamber is 5×10 -3 Pa~9×10 -3 Pa, the cavity temperature is 100-180 ° C, and the rotating speed is 0.5. ~1 rpm, argon flow rate is 150~300sccm, oxygen flow rate is 10~150sccm, nitrogen flow rate is 10~100sccm, chrome target power is 6~12kw, bias voltage is -100~-300V, duty cycle is 40 %~60%, sputtering for 0.5~3 hours. Thus, a composite film composed of a titanium oxynitride layer and a chromium oxynitride layer was obtained on the surface of the aluminum alloy substrate. The composite film has a thickness of about 0.6 to 2.5 μm.

較佳地,步驟(2)和步驟(3)在同一磁控濺射設備中進行。Preferably, step (2) and step (3) are carried out in the same magnetron sputtering apparatus.

較佳地,上述步驟(3)中(即濺鍍該鈦氧氮化合物層時)總的氣壓大於上述步驟(2)中(即濺鍍該鉻氧氮化合物層時)總的氣壓。Preferably, the total gas pressure in the above step (3) (that is, when the titanium oxynitride layer is sputtered) is greater than the total gas pressure in the above step (2) (that is, when the chromium oxynitride layer is sputtered).

較佳地,步驟(2)和步驟(3)中氮氣流量與氧氣流量之比大約為1:1~1:3。Preferably, the ratio of the nitrogen flow rate to the oxygen flow rate in steps (2) and (3) is about 1:1 to 1:3.

請參閱圖1,由上述鋁合金表面防腐處理方法所獲得的鋁合金製品10,包括鋁合金基材11及形成於鋁合金基材11表面的複合薄膜13,該複合薄膜13包括直接形成於該鋁合金基材11表面的鈦氧氮化合物層131,及形成於該鈦氧氮化合物層131上的鉻氧氮化合物層132。其中,該鈦氧氮化合物層131中鈦原子個數百分比為40%~65%,氧原子個數百分比為25%~50%,氮原子個數百分比為10%~20%。該鉻氧氮化合物層132中鉻原子個數百分比為50%~70%,氧原子個數百分比為20%~45%,氮原子個數百分比為5%~10%。該複合薄膜13由直徑大約為4~7nm的晶粒組成。Referring to FIG. 1 , an aluminum alloy article 10 obtained by the above aluminum alloy surface anti-corrosion treatment method includes an aluminum alloy substrate 11 and a composite film 13 formed on the surface of the aluminum alloy substrate 11 , and the composite film 13 is directly formed on the aluminum alloy substrate 11 . A titanyl compound layer 131 on the surface of the aluminum alloy substrate 11 and a chromium oxynitride layer 132 formed on the titanyl compound layer 131. The titanium oxynitride layer 131 has a percentage of titanium atoms of 40% to 65%, an oxygen atom percentage of 25% to 50%, and a nitrogen atom percentage of 10% to 20%. The chromium oxynitride layer 132 has a percentage of chromium atoms of 50% to 70%, a percentage of oxygen atoms of 20% to 45%, and a percentage of nitrogen atoms of 5% to 10%. The composite film 13 is composed of crystal grains having a diameter of about 4 to 7 nm.

下麵藉由實施例來對本發明進行具體說明。The invention will now be specifically described by way of examples.

實施例1Example 1

採用無水乙醇對鋁合金試樣進行超聲波清洗大約30分鐘。將清洗好的鋁合金試樣放入中頻磁控濺射鍍膜機的真空腔中。本實施例所使用的中頻磁控濺射鍍膜機為深圳南方創新真空技術有限公司生產,型號為SM-1100H。The aluminum alloy sample was ultrasonically cleaned with absolute ethanol for about 30 minutes. The cleaned aluminum alloy sample is placed in a vacuum chamber of an intermediate frequency magnetron sputtering coating machine. The intermediate frequency magnetron sputtering coating machine used in this embodiment is produced by Shenzhen Nanfang Innovation Vacuum Technology Co., Ltd., and the model number is SM-1100H.

開啟真空泵對真空腔抽真空並設定真空度為8×10-3 Pa,開啟轉架並設定轉速為0.5轉/分鐘,開啟真空腔烘烤並設定真空腔內溫度為120℃。Open the vacuum pump and vacuum the vacuum chamber and set the vacuum to 8×10 -3 Pa. Turn on the rotating frame and set the rotation speed to 0.5 rpm. Turn on the vacuum chamber and set the vacuum chamber temperature to 120 °C.

待真空腔的真空度抽至上述設定值後,通入工作氣體氬氣及反應氣體氧氣和氮氣,氬氣流量為150sccm,氧氣流量為30sccm,氮氣流量為20sccm,開啟鈦靶並調節鈦靶功率為8kw,鈦靶偏壓為-200V,占空比為50%,濺射0.5小時,以在鋁合金表面形成一層鈦氧氮化合物層。After the vacuum of the vacuum chamber is pumped to the above set value, the working gas argon gas and the reaction gas oxygen and nitrogen are introduced, the flow rate of the argon gas is 150 sccm, the oxygen flow rate is 30 sccm, the nitrogen flow rate is 20 sccm, the titanium target is turned on and the titanium target power is adjusted. For 8 kW, the titanium target was biased at -200 V, the duty cycle was 50%, and sputtering was carried out for 0.5 hours to form a layer of titanium oxynitride on the surface of the aluminum alloy.

然後關閉鈦靶,調節氧氣流量為40sccm,氮氣流量為30sccm,開啟鉻靶並調節鉻靶功率為8kw,鉻靶偏壓-200V,占空比為50%,濺射1小時,以在鈦氧氮化合物層上形成一層鉻氧氮化合物層,從而在鋁合金基材表面獲得由鈦氧氮化合物層和鉻氧氮化合物層組成的複合薄膜。Then the titanium target was turned off, the oxygen flow rate was adjusted to 40 sccm, the nitrogen flow rate was 30 sccm, the chromium target was turned on and the chromium target power was adjusted to 8 kw, the chromium target bias was -200 V, the duty ratio was 50%, and sputtering was performed for 1 hour to A layer of chromium oxynitride is formed on the nitrogen compound layer to obtain a composite film composed of a titanium oxynitride layer and a chromia oxynitride layer on the surface of the aluminum alloy substrate.

實施例2Example 2

實施例2與實施例1類似,不同之處在於,本實施例開啟鉻靶時氧氣流量調節為80sccm,氮氣流量調節為50sccm,其他條件均與實施例1相同。按照實施例2亦可製得表面形成有由鈦氧氮化合物層和鉻氧氮化合物層組成的複合薄膜的鋁合金製品。The second embodiment is similar to the first embodiment except that the oxygen flow rate is adjusted to 80 sccm when the chromium target is turned on, and the nitrogen flow rate is adjusted to 50 sccm, and other conditions are the same as in the first embodiment. According to Example 2, an aluminum alloy article having a composite film formed of a titanium oxynitride layer and a chromium oxynitride layer on its surface was also obtained.

由實施例1和實施例2製得的鋁合金製品的複合薄膜形貌、結構比較類似,且具有類似的防腐性能。The composite films of the aluminum alloy articles prepared in Example 1 and Example 2 have similar morphology and structure, and have similar corrosion resistance.

對比例Comparative example

採用與實施例1相同的中頻磁控濺射鍍膜機對鋁合金試樣進行濺射,與實施例1不同的係靶材為鉻靶,反應氣體為氮氣,氮氣流量為60sccm,鉻靶功率為8kw,鉻靶偏壓為-200V,占空比為50%,濺射0.5小時,在鋁合金試樣表面濺鍍單組分氮化鉻(CrN)薄膜。The aluminum alloy sample was sputtered by the same intermediate frequency magnetron sputtering coater as in Example 1. The target target different from Example 1 was a chromium target, the reaction gas was nitrogen, the nitrogen flow rate was 60 sccm, and the chromium target power was used. It was 8 kw, the chromium target was biased at -200 V, the duty ratio was 50%, and sputtering was performed for 0.5 hours, and a one-component chromium nitride (CrN) film was sputtered on the surface of the aluminum alloy sample.

對實施例1鍍製的鈦氧氮化合物和鉻氧氮化合物複合薄膜和對比例鍍製的氮化鉻(CrN)薄膜分別用掃描電鏡觀察其表面形貌,所用掃描電鏡儀為日本電子生產的型號為JSM-6701F的場發射掃描電鏡儀。圖2為本發明實施例1鍍製的鈦氧氮化合物和鉻氧氮化合物複合薄膜的掃描電鏡圖,圖3為對比例鍍製的氮化鉻(CrN)薄膜的掃描電鏡圖。相較於圖2,圖3示出的單組分氮化鉻(CrN)薄膜由比較粗大的晶粒構成,且表面存在大量較大的晶間間隙;而由鈦氧氮化合物層和鉻氧氮化合物層組成的複合薄膜由非常細小的晶粒組成,晶粒平均直徑大約為4~7nm,晶間間隙比較小,該複合薄膜表面非常緻密。The surface morphology of the titanium oxynitride compound and the chromium oxynitride composite film and the comparatively plated chromium nitride (CrN) film plated in Example 1 were observed by scanning electron microscopy. The scanning electron microscope used was produced by Japan Electronics. The field emission scanning electron microscope model of the model JSM-6701F. 2 is a scanning electron micrograph of a titanium oxynitride compound and a chromium oxynitride composite film plated in Example 1 of the present invention, and FIG. 3 is a scanning electron micrograph of a chromium nitride (CrN) film plated in a comparative example. Compared with FIG. 2, the one-component chromium nitride (CrN) film shown in FIG. 3 is composed of relatively coarse crystal grains, and a large amount of intergranular gap exists on the surface; and the titanium oxynitride layer and chrome oxide are formed. The composite film composed of the nitrogen compound layer is composed of very fine crystal grains, and the average crystal grain diameter is about 4 to 7 nm, and the intergranular gap is relatively small, and the surface of the composite film is very dense.

對由本發明的方法所製備的鍍覆有所述複合薄膜的鋁合金試樣和對比例所製得的鍍覆氮化鉻(CrN)薄膜的鋁合金試樣進行35℃中性鹽霧(NaCl濃度為5%)測試。結果發現,對比例所製得的表面鍍覆氮化鉻(CrN)薄膜的鋁合金試樣4小時後就發生明顯腐蝕;而由本發明實施例的方法所製備的表面鍍覆有複合薄膜的鋁合金試樣在72小時後才出現有腐蝕現象。The aluminum alloy sample coated with the composite film prepared by the method of the present invention and the aluminum alloy sample coated with the chromium nitride (CrN) film prepared in the comparative example were subjected to a neutral salt spray of 35 ° C (NaCl). The concentration is 5%) tested. As a result, it was found that the aluminum alloy sample of the surface-plated chromium nitride (CrN) film prepared in the comparative example was significantly corroded after 4 hours; and the surface prepared by the method of the present invention was plated with the composite film aluminum. The alloy samples showed corrosion after 72 hours.

可見,由本發明的鋁合金表面防腐處理方法所製得的鋁合金製品由於其表面具有鈦氧氮化合物層和鉻氧氮化合物層組成的複合薄膜,該複合薄膜可有效防止鹽霧侵蝕,因此可提高鋁合金的抗腐蝕性能。It can be seen that the aluminum alloy article prepared by the aluminum alloy surface anti-corrosion treatment method of the present invention has a composite film composed of a titanium oxynitride layer and a chromium oxynitride layer on the surface thereof, and the composite film can effectively prevent salt spray erosion, thereby Improve the corrosion resistance of aluminum alloys.

10...鋁合金製品10. . . Aluminum alloy products

11...鋁合金基材11. . . Aluminum alloy substrate

13...複合薄膜13. . . Composite film

131...鈦氧氮化合物層131. . . Titanium oxynitride layer

132...鉻氧氮化合物層132. . . Chromium oxynitride layer

圖1為由本發明較佳實施例的鋁合金表面防腐處理方法所製得的鋁合金製品的剖視示意圖。BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic cross-sectional view showing an aluminum alloy article obtained by a method for preserving an aluminum alloy surface according to a preferred embodiment of the present invention.

圖2為本發明一實施例製備的複合薄膜的放大10萬倍的掃描電鏡圖。2 is a scanning electron micrograph of a composite film prepared according to an embodiment of the present invention at an magnification of 100,000 times.

圖3為一採用磁控濺鍍法製備的氮化鉻薄膜的放大5萬倍的掃描電鏡圖。Figure 3 is a scanning electron micrograph of a 50,000-fold magnification of a chromium nitride film prepared by magnetron sputtering.

10...鋁合金製品10. . . Aluminum alloy products

11...鋁合金基材11. . . Aluminum alloy substrate

13...複合薄膜13. . . Composite film

131...鈦氧氮化合物層131. . . Titanium oxynitride layer

132...鉻氧氮化合物層132. . . Chromium oxynitride layer

Claims (12)

一種鋁合金表面防腐處理方法,包括以下步驟:
採用無水乙醇對鋁合金基材進行超聲波清洗;
以純鈦為靶材,以氬氣為工作氣體,氮氣和氧氣為反應氣體,採用磁控濺射法在鋁合金基材表面濺鍍鈦氧氮化合物層;
以純鉻為靶材,以氬氣為工作氣體,氮氣和氧氣為反應氣體,採用磁控濺射法在該鈦氧氮化合物層上濺鍍鉻氧氮化合物層。
An aluminum alloy surface anti-corrosion treatment method comprises the following steps:
Ultrasonic cleaning of aluminum alloy substrate with anhydrous ethanol;
Using pure titanium as a target, argon gas as working gas, nitrogen gas and oxygen as reaction gas, magnetron sputtering method is used to sputter a titanium oxynitride layer on the surface of the aluminum alloy substrate;
A pure chromium is used as a target, argon gas is used as a working gas, nitrogen gas and oxygen gas are used as reaction gases, and a chromium oxynitride layer is sputtered on the titanium oxynitride layer by magnetron sputtering.
如申請專利範圍第1項所述之鋁合金表面防腐處理方法,其中所述濺鍍鈦氧氮化合物層步驟和濺鍍該鉻氧氮化合物層的步驟中,氮氣流量與氧氣流量之比均為1:1~1:3。The method for preserving an aluminum alloy surface according to claim 1, wherein in the step of sputtering a titanate layer and the step of sputtering the layer of oxynitride, a ratio of a nitrogen flow rate to an oxygen flow rate is 1:1~1:3. 如申請專利範圍第2項所述之鋁合金表面防腐處理方法,其中所述濺鍍鈦氧氮化合物層步驟中氧氣流量為10~100sccm,氮氣流量為10~80sccm。The method for preserving the surface of an aluminum alloy according to the second aspect of the invention, wherein the step of sputtering the titanium oxynitride layer has an oxygen flow rate of 10 to 100 sccm and a nitrogen flow rate of 10 to 80 sccm. 如申請專利範圍第3項所述之鋁合金表面防腐處理方法,其中所述濺鍍鈦氧氮化合物層步驟還在如下參數條件下進行:真空腔內真空度為5×10-3 ~9×10-3 Pa,腔體溫度為100~180℃,轉架轉速為0.5~1轉/分鐘,鈦靶功率為6~12kw,氬氣流量為150~300sccm,鈦靶偏壓為-100~-300V,占空比為40%~60%,濺射0.5~1.5小時。The method for preserving an aluminum alloy surface according to claim 3, wherein the step of sputtering the titanium oxynitride layer is further performed under the following parameter conditions: a vacuum degree in the vacuum chamber is 5×10 -3 to 9× 10 -3 Pa, the cavity temperature is 100~180°C, the rotating speed is 0.5~1 rev/min, the titanium target power is 6~12kw, the argon flow rate is 150~300sccm, and the titanium target bias is -100~- 300V, duty cycle 40%~60%, sputtering 0.5~1.5 hours. 如申請專利範圍第2項所述之鋁合金表面防腐處理方法,其中所述濺鍍鉻氧氮化合物層的步驟中氧氣流量為10~150sccm,氮氣流量為10~100sccm。The method for preserving the surface of an aluminum alloy according to claim 2, wherein the step of sputtering the chromium oxide compound layer has an oxygen flow rate of 10 to 150 sccm and a nitrogen flow rate of 10 to 100 sccm. 如申請專利範圍第5項所述之鋁合金表面防腐處理方法,其中所述濺鍍鉻氧氮化合物層的步驟還在如下參數條件下進行:真空腔內真空度為5×10-3 ~9×10-3 Pa,腔體溫度為100~180℃,轉架轉速為0.5~1轉/分鐘,鈦靶功率為6~12kw,氬氣流量為150~300sccm,鉻靶偏壓為-100~-300V,占空比為40%~60%,濺射0.5~3小時。The method for preserving an aluminum alloy surface according to claim 5, wherein the step of sputtering the chromium oxide compound layer is performed under the following parameter conditions: a vacuum degree in the vacuum chamber is 5×10 -3 to 9× 10 -3 Pa, the cavity temperature is 100~180 °C, the rotating speed is 0.5~1 rev / min, the titanium target power is 6~12kw, the argon flow rate is 150~300sccm, and the chrome target bias is -100~- 300V, duty cycle is 40%~60%, sputtering is 0.5~3 hours. 如申請專利範圍第1項所述之鋁合金表面防腐處理方法,其中所述鈦氧氮化合物層中鈦原子個數百分比為40%~65%,氧原子個數百分比為25%~50%,氮原子個數百分比為10%~20%;該鉻氧氮化合物層中鉻原子個數百分比為50%~70%,氧原子個數百分比為20%~45%,氮原子個數百分比為5%~10%。The method for preserving an aluminum alloy surface according to claim 1, wherein the titanium oxynitride layer has a percentage of titanium atoms of 40% to 65%, and the number of oxygen atoms is 25% to 50%. The percentage of nitrogen atoms is 10% to 20%; the percentage of chromium atoms in the chromium-oxygen compound layer is 50% to 70%, the percentage of oxygen atoms is 20% to 45%, and the percentage of nitrogen atoms is 5 %~10%. 如申請專利範圍第1項所述之鋁合金表面防腐處理方法,其中所述鈦氧氮化合物層與該鉻氧氮化合物層由直徑為4~7nm的晶粒組成。The method for preserving an aluminum alloy surface according to claim 1, wherein the titanium oxynitride layer and the chromium oxynitride layer are composed of crystal grains having a diameter of 4 to 7 nm. 一種鋁合金製品,包括鋁合金基材及形成於該鋁合金基材表面的複合薄膜,其改良在於:該複合薄膜包括形成於鋁合金基材表面的一鈦氧氮化合物層及形成於該鈦氧氮化合物層上的鉻氧氮化合物層。An aluminum alloy product comprising an aluminum alloy substrate and a composite film formed on the surface of the aluminum alloy substrate, wherein the composite film comprises: a titanium oxynitride layer formed on the surface of the aluminum alloy substrate and formed on the titanium a chromium oxynitride layer on the oxynitride layer. 如申請專利範圍第9項所述之鋁合金製品,其中所述該鈦氧氮化合物層中鈦原子個數百分比為40%~65%,氧原子個數百分比為25%~50%,氮原子個數百分比為10%~20%;該鉻氧氮化合物層中鉻原子個數百分比為50%~70%,氧原子個數百分比為20%~45%,氮原子個數百分比為5%~10%。The aluminum alloy article according to claim 9, wherein the titanium oxynitride layer has a percentage of titanium atoms of 40% to 65%, and the number of oxygen atoms is 25% to 50%, and the nitrogen atom The percentage of the number is 10% to 20%; the percentage of chromium atoms in the chromium-oxygen compound layer is 50% to 70%, the percentage of oxygen atoms is 20% to 45%, and the percentage of nitrogen atoms is 5%~ 10%. 如申請專利範圍第9項所述之鋁合金製品,其中所述複合薄膜由直徑為4~7nm的晶粒組成。The aluminum alloy article according to claim 9, wherein the composite film is composed of crystal grains having a diameter of 4 to 7 nm. 如申請專利範圍第9項所述之鋁合金製品,其中所述複合薄膜的厚度為0.6~2.5μm。The aluminum alloy article according to claim 9, wherein the composite film has a thickness of 0.6 to 2.5 μm.
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US20040151926A1 (en) * 2003-01-23 2004-08-05 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel Ltd.) Aluminum alloy member superior in corrosion resistance and plasma resistance
US20060159940A1 (en) * 2005-01-18 2006-07-20 Applied Materials, Inc. Corrosion-resistant aluminum component having multi-layer coating
US20080231992A1 (en) * 2007-03-21 2008-09-25 Sae Magnetics (Hk) Ltd. Metal oxynitride adhesion/corrosion barrier layer and a diamond-like carbon overcoat

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040151926A1 (en) * 2003-01-23 2004-08-05 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel Ltd.) Aluminum alloy member superior in corrosion resistance and plasma resistance
US20060159940A1 (en) * 2005-01-18 2006-07-20 Applied Materials, Inc. Corrosion-resistant aluminum component having multi-layer coating
US20080231992A1 (en) * 2007-03-21 2008-09-25 Sae Magnetics (Hk) Ltd. Metal oxynitride adhesion/corrosion barrier layer and a diamond-like carbon overcoat

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