TW201213573A - Housing and method for making the same - Google Patents

Housing and method for making the same Download PDF

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Publication number
TW201213573A
TW201213573A TW99133190A TW99133190A TW201213573A TW 201213573 A TW201213573 A TW 201213573A TW 99133190 A TW99133190 A TW 99133190A TW 99133190 A TW99133190 A TW 99133190A TW 201213573 A TW201213573 A TW 201213573A
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TW
Taiwan
Prior art keywords
layer
color layer
color
bonding layer
substrate
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TW99133190A
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Chinese (zh)
Inventor
Hsin-Pei Chang
Wen-Rong Chen
Huan-Wu Chiang
Cheng-Shi Chen
zi-cheng Wan
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Hon Hai Prec Ind Co Ltd
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Application filed by Hon Hai Prec Ind Co Ltd filed Critical Hon Hai Prec Ind Co Ltd
Priority to TW99133190A priority Critical patent/TW201213573A/en
Publication of TW201213573A publication Critical patent/TW201213573A/en

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  • Physical Vapour Deposition (AREA)
  • Casings For Electric Apparatus (AREA)

Abstract

A housing is provided which includes a substrate, a transition layer and a color layer. The transition layer is directly formed on the substrate. The color layer is formed on the transition layer. The color layer is a Zr-N film. The color layer has a L* value between 40 to 50, an a* value between -25 to -15, and a b* value between -45 to -35 in the CIE LAB. A method for making the housing is also provided.

Description

201213573 六、發明說明: 【發明所屬之技術領域】 [0001]本發明涉及一種殼體及其製作方/去 [0002] ❹ 【先前技術J 隨著科技的不斷進步,行動電話、個人數位助理等各式 電子裝置也迅速發展,其功能亦愈來愈豐备。為了使電 子裝置的外殼具有豐富色彩’傳統上可利用彩色塑膠开^ 成彩色塑膠外殼,或藉由噴漆方式在電子裝置的殼體表 面形成色彩層。然而,塑膠外蘇與喷漆外殼不能呈 好的金屬質感。另祕 複雜而不易精密操控,習知技術中於殼體表面形成^ 屬真空鍍膜層的色彩有限’與烤漆、陽極處理等工々 比’真空鍍膜層的色彩不夠豐富,嚴重影響了其在;: 鍍膜領域的競爭力。 11 【發明内容】 [0003] 有鑒於此’本發明提供—種具有藍色及金屬 ❹ 質感的殼體 [0004] [0005] 另外,本發明觀供—種上糾體的f作方法。 一種殼體,該殼體包括一基 媸一結合層以及一色彩層 ,所述結合層形成於基體 人表所述色彩層形成於結述色彩層為一Zr,該色彩層呈現的 色度區域'統咐座標值介於娜〇之 間’ a*座標值介於_25至 3_。 座標值介於-45至_ 099133190 表單編號A0101 0992058023-0 201213573 [0006] 一種殼體的製作方法,其包括如下步驟: [0007] 提供一基體;在該基體的表面磁控濺射一結合層;在該 結合層的表面磁控濺射一色彩層,磁控濺射所述色彩層 的工藝參數為:以锆為靶材,以氮氣及氬氣為工作氣體 ,其中氮氣與氣氣總的流量為150-700sccm,氮氣的分 壓佔總的氣體壓強的20〜40% ;所述色彩層為Zr-N膜,所 述色彩層呈現的色度區域於CIE LAB表色系統的L*座標 值介於40至50之間,a*座標值介於-25至-15之間,b*座 標值介於-45至-35之間。 [0008] 所述殼體的製備方法,在形成色彩層時,採用鈦靶作為 靶材,通過對反應氣體氮氣的流量的控制,從而實現所 需的色彩層中各成分的比例關係及各成分間的微觀鍵合 結構,從而達到使色彩層呈現出藍色的目的。以該方法 所製得的殼體可呈現出具吸引力的藍色的金屬外觀,豐 富了真空鍍膜層的顏色,極大地提高了產品的外觀競爭 力。 【實施方式】 [0009] 請參閱圖1,本發明一較佳實施例的殼體10可為一手機的 殼體。該殼體10包括基體11、結合層13及色彩層15。該 結合層13設置於基體11的表面,該色彩層15設置於結合 層13的表面。 [0010] 基體11可以為金屬材料或玻璃、塑膠等非金屬材料。 [0011] 結合層13以磁控濺射的方式形成於基體11的表面。該結 合層1 3為鈦金屬膜,其厚度在0.卜0. 3 μ m之間。該結合 099133190 表單編號A0101 第4頁/共11頁 0992058023-0 201213573 [0012] [0013] ❹ [0014] [0015] [0016] Ο 層13的顏色為不影響色彩層顏色的淺色調,比如可為銀 色、白色及灰白色等淺色調。 色彩層15為Zr-N膜,其以磁控濺射的方式形成。該色彩 層15的厚度在0.3〜0.5μιη之間。該色彩層15呈現出藍色 ,其呈現的色度區域於CIE LAB表色系統的L*座標值介 於40至50之間,a*座標值介於-25至-15之間,b*座標值 介於-45至-35之間。 請一併參閱圖1與圖2,本發明殼體10的製作方法包括以 下步驟: 提供基體11。該基體11可以為金屬材料或玻璃、塑膠等 非金屬材料。 對該基體11進行預處理。該預處理可包括常規的對基體 11進行化學除油、除蠟、酸洗、超聲波清洗及烘乾等步 驟。 在基體11的表面形成結合層13。該結合層13為鈦金屬膜 ,其可採用磁控濺射的方式形成。形成該結合層13的具 體操作方法可為:將基體11固定於一磁控濺射鍍膜機( 圖未示)的轉架上,抽真空該鍍膜機的腔體至3x 10_5Torr,並加熱該腔體至120°C左右,通入流量為 400〜450sccm (標準狀態毫升/分鐘)的氬氣;開啟鈦靶 材的電源,設定鈦靶材電源功率為8〜10kw,對基體11施 加0〜-200V的偏壓,佔空比為0~100%,並設置轉架的公 轉轉速為2. 5〜3. 5轉每分鐘(revolution per minute ,rpm),沉積所述結合層13。沉積所述結合層13的時間 099133190 表單編號A0101 第5頁/共11頁 0992058023-0 201213573 可為5〜10分鐘。 [0017] 在該結合層13的表面形成色彩層15。在本發明的較佳實 施例中,形成色彩層15的具體操作方法可為:在沉積所 述結合層13後,向所述磁控濺射鍍膜機中通入反應氣體 氮氣及氬氣,並設定氮氣與蠱^氣總的流量為 150-700sccm,且氮氣的分壓佔總的氣體壓強的20~40% :設置鍅靶材電源功率為8〜12kw,調節對基體11的偏壓 至0〜-250V、佔空比為0〜100%,轉架的公轉轉速為 2. 5 〜3. 5 轉每分鐘(revolution per minute,rpm), 沉積所述色彩層1 5。沉積色彩層1 5的時間可為2 0〜4 0分 鐘。 [0018] 該色彩層15為Zr-N膜,其於CIE LAB表色系統的L*座標 值介於40至50之間,a*座標值介於-25至-15之間,b*座 標值介於-45至-35之間。 [0019] 本發明殼體10可為筆記型電腦、個人數位助理等電子裝 置的殼體,或為其他裝飾類產品的殼體。 [0020] 相較於習知技術,所述殼體10的製備方法,係通過對靶 材的選取及對反應氣體氮氣流量的設計,從而達到使色 彩層15呈現出藍色的目的。 [0021] 應該指出,上述實施方式僅為本發明的較佳實施方式, 本領域技術人員還可在本發明精神内做其他變化。這些 依據本發明精神所做的變化,都應包含在本發明所要求 保護的範圍之内。 【圖式簡單說明】 099133190 表單編號 A0101 第 6 頁/共 11 頁 0992058023-0 201213573 [0022] 圖1係本發明較佳實施例的殼體的剖視示意圖。 [0023] 圖2係本發明較佳實施例製作所述殼體的流程圖 【主要元件符號說明】 [0024] 殼體:1〇 [0025] 基體:11 [0026] 結合層:13 [0027] 色彩層:15201213573 VI. Description of the Invention: [Technical Field] [0001] The present invention relates to a housing and its maker/go [0002] 先前 [Prior Art J With the continuous advancement of technology, mobile phones, personal digital assistants, etc. Various types of electronic devices have also developed rapidly, and their functions have become more and more abundant. In order to make the outer casing of the electronic device rich in color, it is conventionally possible to use a color plastic to open a colored plastic casing, or to form a color layer on the surface of the casing of the electronic device by painting. However, the plastic outer suede and the painted outer casing do not have a good metallic texture. The secret is complicated and not easy to manipulate. In the conventional technology, the color of the vacuum coating layer is formed on the surface of the casing. The color of the vacuum coating layer is not rich enough, which seriously affects its color. : Competitiveness in the field of coatings. [Invention] [0003] In view of the above, the present invention provides a housing having a blue and metallic texture. [0004] In addition, the present invention provides a method for correcting the body. A casing comprising a base layer and a color layer, the bonding layer being formed on the base body, wherein the color layer is formed on the color layer of the knot to be a Zr, and the color region is represented by the color layer 'The coordinate value of the system is between 〇 '' a* coordinate value is between _25 and 3_. The coordinate value is between -45 and _ 099133190. Form number A0101 0992058023-0 201213573 [0006] A method of manufacturing a housing, comprising the steps of: [0007] providing a substrate; magnetron sputtering a bonding layer on the surface of the substrate Magnetron sputtering a color layer on the surface of the bonding layer, and the process parameters of the magnetron sputtering color layer are: zirconium as a target, nitrogen and argon as a working gas, wherein nitrogen and gas are total The flow rate is 150-700 sccm, and the partial pressure of nitrogen accounts for 20 to 40% of the total gas pressure; the color layer is a Zr-N film, and the color layer exhibits a chromaticity region at the L* coordinate of the CIE LAB color system. Values range from 40 to 50, a* coordinate values range from -25 to -15, and b* coordinate values range from -45 to -35. [0008] The method for preparing the casing, when forming a color layer, using a titanium target as a target, and controlling the flow rate of the reaction gas nitrogen to achieve a desired ratio of each component in the color layer and each component The micro-bonding structure between them achieves the purpose of making the color layer appear blue. The housing produced by this method exhibits an attractive blue metallic appearance, enriches the color of the vacuum coating layer, and greatly enhances the appearance competitiveness of the product. [Embodiment] Referring to Figure 1, a housing 10 in accordance with a preferred embodiment of the present invention can be a housing for a handset. The housing 10 includes a base 11, a bonding layer 13, and a color layer 15. The bonding layer 13 is provided on the surface of the substrate 11, and the color layer 15 is provided on the surface of the bonding layer 13. [0010] The base 11 may be a metal material or a non-metal material such as glass or plastic. [0011] The bonding layer 13 is formed on the surface of the substrate 11 by magnetron sputtering. 5微米之间。 The bonding layer 13 is a titanium metal film, the thickness of which is between 0. 3 0. The combination 099133190 Form No. A0101 Page 4 / Total 11 Page 0992058023-0 201213573 [0013] [0015] [0016] The color of the layer 13 is a light color tone that does not affect the color of the color layer, such as Light shades of silver, white and off-white. The color layer 15 is a Zr-N film which is formed by magnetron sputtering. The color layer 15 has a thickness of between 0.3 and 0.5 μm. The color layer 15 exhibits a blue color, and the chromaticity region it presents has a L* coordinate value between 40 and 50 in the CIE LAB color system, and a* coordinate value between -25 and -15, b* The coordinates are between -45 and -35. Referring to Figures 1 and 2 together, the method of fabricating the housing 10 of the present invention includes the following steps: providing a substrate 11. The base 11 may be a metal material or a non-metal material such as glass or plastic. The substrate 11 is pretreated. The pretreatment may include conventional steps of chemical degreasing, wax removal, pickling, ultrasonic cleaning, and drying of the substrate 11. A bonding layer 13 is formed on the surface of the substrate 11. The bonding layer 13 is a titanium metal film which can be formed by magnetron sputtering. The specific operation method for forming the bonding layer 13 may be: fixing the substrate 11 on a rotating frame of a magnetron sputtering coating machine (not shown), vacuuming the cavity of the coating machine to 3×10_5 Torr, and heating the cavity. The body is heated to about 120 ° C, and an argon gas having a flow rate of 400 to 450 sccm (standard state ML/min) is introduced; the power of the titanium target is turned on, the power of the titanium target is set to 8 to 10 kW, and the substrate 11 is applied with 0 to - The bonding layer 13 is deposited by a bias voltage of 200 V, a duty ratio of 0 to 100%, and a revolution speed of the turret of 2. 5 to 3. 5 revolutions per minute (revolution per minute, rpm). Time for depositing the bonding layer 13 099133190 Form No. A0101 Page 5 of 11 0992058023-0 201213573 It can be 5 to 10 minutes. [0017] A color layer 15 is formed on the surface of the bonding layer 13. In a preferred embodiment of the present invention, the specific operation method of forming the color layer 15 may be: after depositing the bonding layer 13, the reaction gas nitrogen gas and argon gas are introduced into the magnetron sputtering coating machine, and Set the total flow rate of nitrogen and helium gas to be 150-700sccm, and the partial pressure of nitrogen gas accounts for 20~40% of the total gas pressure: set the power supply of the target gas to be 8~12kw, and adjust the bias voltage to the substrate 11 to 0. 〜250V, the duty ratio is 0~100%, the revolution speed of the turret is 2. 5 〜3. 5 revolutions per minute (rpm), the color layer 15 is deposited. The time for depositing the color layer 15 may be 20 to 40 minutes. [0018] The color layer 15 is a Zr-N film, and the L* coordinate value of the CIE LAB color system is between 40 and 50, and the a* coordinate value is between -25 and -15, and the b* coordinate Values range from -45 to -35. [0019] The housing 10 of the present invention may be a housing of an electronic device such as a notebook computer or a personal digital assistant, or a housing of other decorative products. [0020] Compared with the prior art, the method for preparing the casing 10 achieves the purpose of making the color layer 15 appear blue by selecting the target and designing the nitrogen flow rate of the reaction gas. [0021] It should be noted that the above-described embodiments are merely preferred embodiments of the present invention, and those skilled in the art may make other changes within the spirit of the present invention. All changes made in accordance with the spirit of the invention are intended to be included within the scope of the invention. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a cross-sectional view of a housing in accordance with a preferred embodiment of the present invention. [0099] FIG. 2 is a flow chart of manufacturing the housing according to a preferred embodiment of the present invention. [Main component symbol description] [0024] Housing: 1〇 [0025] Base: 11 [0026] Bonding layer: 13 [0027] Color layer: 15

CC

〇 0992058023-0 099133190 表單煸號A0101 第7頁/共11育〇 0992058023-0 099133190 Form nickname A0101 Page 7 of 11

Claims (1)

201213573 七、申請專利範圍: 1 . 一種殼體,包括一基體、一結合層以及一色彩層,所述結 合層形成於基體的表面,所述色彩層形成於結合層的表面 ,其改良在於:所述色彩層為一Zr-N膜,該色彩層呈現 的色度區域於CIE LAB表色系統的L*座標值介於40至50 之間,a*座標值介於-25至-15之間,b*座標值介於-45 至-35之間。 2 .如申請專利範圍第1項所述之殼體,其中所述結合層為一 鈦金屬膜,其厚度0.1~0.3/zm。 3. 如申請專利範圍第1項所述之殼體,其中所述色彩層厚度 為0. 3~0. 5/zm 〇 4. 如申請專利範圍第1項所述之殼體,其中所述基體為金屬 材料、玻璃或塑膠。 5 . —種殼體的製作方法,其包括如下步驟: 提供一基體; 在該基體的表面磁控濺射一結合層; 在該結合層的表面磁控濺射一色彩層,磁控濺射所述色彩 層的工藝參數為:以鍅為靶材,以氮氣及氬氣為工作氣體 ,其中氮氣與氬氣總的流量為150-700sccm,氮氣的分 壓佔總的氣體壓強的20〜40% ;所述色彩層為Zr-N膜,所 述色彩層呈現的色度區域於CIE LAB表色系統的L*座標值 介於40至50之間,a*座標值介於-25至-15之間,b*座標 值介於-45至-35之間。 6 .如申請專利範圍第5項所述之殼體的製作方法,其中形成 所述結合層為鈦金屬膜,形成該結合層的工藝參數為:設 099133190 表單編號A0101 第8頁/共11頁 0992058023-0 201213573 置鈦乾的電源功率功率為8_1〇kw,對基體施加的偏麼為 〇〜-200V,佔空比為〇〜1〇〇%,鏟膜時間為分鐘。 •如申請專利範圍第5項所述之殼體的製作方法,其中形成 該色彩層的工藝參數為:設置絲的電源功率功率為 8-12kw,對基體施加的偏壓為〇~_25〇v,佔空比為 0-100% ’鍍膜時間為20〜40分鐘。 〇 〇 099133190 表單編號A0101 第9頁/共11頁 0992058023-0201213573 VII. Patent Application Range: 1. A casing comprising a base body, a bonding layer and a color layer, the bonding layer being formed on a surface of the base body, the color layer being formed on a surface of the bonding layer, the improvement being: The color layer is a Zr-N film, and the color layer exhibits a chromaticity region in the CIE LAB color system with an L* coordinate value between 40 and 50, and an a* coordinate value between -25 and -15. The b* coordinate value is between -45 and -35. 2. The casing of claim 1, wherein the bonding layer is a titanium metal film having a thickness of 0.1 to 0.3/zm. 3. The casing of claim 1, wherein the color layer has a thickness of 0. 3~0. 5/zm 〇4. The substrate is made of metal, glass or plastic. 5 . A method for fabricating a casing, comprising the steps of: providing a substrate; magnetron sputtering a bonding layer on a surface of the substrate; magnetron sputtering a color layer on the surface of the bonding layer, magnetron sputtering The process parameters of the color layer are: using krypton as a target, nitrogen and argon as working gases, wherein the total flow rate of nitrogen and argon is 150-700 sccm, and the partial pressure of nitrogen accounts for 20 to 40 of the total gas pressure. The color layer is a Zr-N film, and the color layer exhibits a chromaticity region in the CIE LAB color system with an L* coordinate value between 40 and 50, and an a* coordinate value between -25 and - Between 15, the b* coordinate value is between -45 and -35. 6. The method of manufacturing a casing according to claim 5, wherein the bonding layer is formed as a titanium metal film, and the process parameters for forming the bonding layer are: 099133190 Form No. A0101 Page 8 of 11 0992058023-0 201213573 The power supply power of titanium dry is 8_1〇kw, the bias applied to the substrate is 〇~-200V, the duty ratio is 〇~1〇〇%, and the shovel time is minutes. The manufacturing method of the casing according to claim 5, wherein the process parameter for forming the color layer is: setting the power supply power of the wire to 8-12 kW, and applying a bias voltage to the substrate 〇~_25〇v The duty ratio is 0-100% 'The coating time is 20~40 minutes. 〇 〇 099133190 Form No. A0101 Page 9 of 11 0992058023-0
TW99133190A 2010-09-30 2010-09-30 Housing and method for making the same TW201213573A (en)

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