TW201221677A - Housing and method for making the same - Google Patents

Housing and method for making the same Download PDF

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Publication number
TW201221677A
TW201221677A TW99141321A TW99141321A TW201221677A TW 201221677 A TW201221677 A TW 201221677A TW 99141321 A TW99141321 A TW 99141321A TW 99141321 A TW99141321 A TW 99141321A TW 201221677 A TW201221677 A TW 201221677A
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Taiwan
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color
layer
color layer
nitrogen
bonding layer
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TW99141321A
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Chinese (zh)
Inventor
Hsin-Pei Chang
Wen-Rong Chen
Huan-Wu Chiang
Cheng-Shi Chen
zi-cheng Wan
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Hon Hai Prec Ind Co Ltd
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Priority to TW99141321A priority Critical patent/TW201221677A/en
Publication of TW201221677A publication Critical patent/TW201221677A/en

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Abstract

A housing is provided which includes a substrate, a transition layer and a color layer. The transition layer is directly formed on the substrate. The color layer is formed on the transition layer. The color layer is a Zr-N film. The color layer has a L* value between 55 to 65, and a* value between 10 to 20, and a b* value between 30 to 40 in the CIE LAB. A method for making the housing is also provided.

Description

201221677 六、發明說明: 【發明所屬之技術領域】 [0001] 本發明涉及一種殼體及其製作方法。 【先前技術】 [0002] 隨著科技的不斷進步,行動電話、個人數位助理等各式 電子裝置也迅速發展’其功能亦愈來愈豐富。為了使電 子裝置的外殼具有豐富色彩,傳統上可利用彩色塑膠形 成彩色塑膠外殼,或藉由喷漆方式在電子裝置的殼體表 面形成色料層。然而,塑膠外殼與噴漆外殼不能呈現良 好的金屬質感。另一方面,由於真空鑛膜技術本身較為 複雜而不易精密操控,習知技術申於參隹表面形成的金 屬真空鍍膜層的色彩有限,與烤漆;、陽極處理等工藝相 比,真空鍍膜層的色彩不夠豐富,嚴重影響了其在裝飾 鍍膜領域的競爭力。 【發明内容】 [0003] 有鑒於此,本發明提供一種具有金黃色及金屬質感的殼 體。 [0004] 另外,本發明還提供一種上述殼體的製作方法。 [0005] -種殼體’包括基體、結合層以及色彩層,所述結合層 形成於基體的表面,所述色彩層形成於結合層的表面, 該色彩層為,其藉由直流磁控_法形成,以結 為靶材,以氮氣為反應氣體,氬氣為工作氣體,其中氮 氣與氬氣總的流量為15Q〜7⑽sccm,氮氣的分壓占總的 氣體壓強的50〜80%201221677 VI. Description of the Invention: [Technical Field of the Invention] [0001] The present invention relates to a housing and a method of fabricating the same. [Prior Art] [0002] With the continuous advancement of technology, various electronic devices such as mobile phones and personal digital assistants have also developed rapidly, and their functions have become more and more abundant. In order to make the outer casing of the electronic device rich in color, it is conventional to form a colored plastic casing by using colored plastic, or to form a toner layer on the surface of the casing of the electronic device by painting. However, plastic casings and painted casings do not exhibit a good metallic feel. On the other hand, because the vacuum ore film technology itself is more complicated and less precise, the color of the metal vacuum coating layer formed by the conventional technology applied to the surface of the ginseng is limited, compared with the baking varnish; the anode treatment process, the vacuum coating layer The lack of color is a serious influence on its competitiveness in the field of decorative coatings. SUMMARY OF THE INVENTION [0003] In view of the above, the present invention provides a casing having a golden yellow and metallic texture. In addition, the present invention also provides a method of fabricating the above casing. [0005] A casing 'includes a base body, a bonding layer, and a color layer, the bonding layer is formed on a surface of the substrate, and the color layer is formed on a surface of the bonding layer, which is by DC magnetron_ The method is formed to form a target, with nitrogen as the reaction gas and argon as the working gas, wherein the total flow rate of nitrogen and argon is 15Q~7(10)sccm, and the partial pressure of nitrogen accounts for 50~80% of the total gas pressure.

;該色彩層呈現的色度區域於CIE 099141321 LAB表色系統的U座標值介於55至65之間,座標值介 表單編號A0101 第3頁/共11頁 0992071886-0 201221677 於10至20之間,b*座標值介於30至40之間。 [0006] [0007] [0008] [0009] [0010] [0011] 099141321 一種殼體的製作方法,其包括如下步驟: 提供一基體; 在該基體的表面磁控濺射一結合層;在該結合層的表面 直流磁控濺射一色彩層,直流磁控濺射所述色彩層的工 藝參數為:以锆為靶材,以氮氣為反應氣體,氬氣為工 作氣體,其中氮氣與氬氣總的流量為150〜700sccm,氮 氣的分壓占總的氣體壓強的50〜80% ;所述色彩層為Zr-N 膜,所述色彩層呈現的色度區域於CIE LAB表色系統的 L*座標值介於55至65之間,a*座標值介於10至20之間, b*座標值介於30至40之間。 所述殼體的製備方法,在形成色彩層時,採用鈦靶作為 靶材,藉由對反應氣體氮氣流量的控制,從而實現所需 的色彩層中各成分的比例關係及各成分間的微觀鍵合結 構,從而達到使色彩層呈現出金黃色的目的。以該方法 所製得的殼體可呈現出具吸引力的金黃色的金屬外觀, 極大地提高了產品的外觀競爭力。 【實施方式】 請參閱圖1,本發明一較佳實施例的殼體10可為一手機的 殼體。該殼體10包括基體11、結合層13及色彩層15。該 結合層13設置於基體11的表面,該色彩層15設置於結合 層1 3的表面。 基體11可以為金屬材料或玻璃、塑膠等非金屬材料。 結合層1 3以直流磁控濺射的方式形成於基體11的表面。 表單編號A0101 第4頁/共11頁 0992071886-0 [0012] 201221677 該結合層13為鈦金屬膜,其厚度在〇.卜〇 3/zm之間。該 結合層13的顏色為不影響色彩層顏色的淺色調,比如可 為銀色、白色及灰白色等淺色調。 [0013]色彩層丨5為Zr-N膜,其以直流磁控濺射的方式形成。該 色彩層15的厚度在0.3〜〇.5;tzm之間。該色彩層15呈現出 金黃色,其呈現的色度區域KCIE LAB表色系統的L木座 才示值介於55至65之間,a*座標值介於1〇至20之間,b*座 標值介於30至40之間。 〇 [0014]請一併參閱圖1與圖2,本發明殼體10的製作方法包括以 下步驟: ⑽15]提供基體11。該基體11可以為金屬材料或玻璃、塑膠等 非金屬材料。 [0016]對該基體11進行預處理。該預處理可包括常規的對基體 11進行化學除油、除蠟、酸洗、超聲波清洗及烘乾等步 驟。 〇 [0017]在基體11的表面形成結合層13。該結合層13為鈦金屬膜 ,其可採用直流磁控漱射的方式形成。形成該結合層13 的具體操作方法可為:將基體lla定於一直流磁控濺射 鍵膜機(圖未示)的轉架上,抽真空該鑛膜機的腔體至3 xlO_5Torr,並加熱該腔體至i2(TC左右,通入流量為 400〜450scCm (標準狀態毫升/分鐘)的氬氣(工作氣體 );開啟鈦靶材的電源,設定鈦靶材電源功率為8〜1〇kw ,對基體11施加0〜-200V的偏壓,占空比為〇〜1〇〇%,並 設置轉架的公轉轉速為3轉每分鐘(revolutiorl per 0992071886-0 099141321 表單編號A0101 第5頁/共11頁 201221677 [0018] [0019] [0020] [0021] [0022] minute,rpm) ’沉積所述結合層13。沉積所述結合層13 的時間可為5〜10分鐘。 在該結合層13的表面形成色彩層15。在本發明的較佳實 施例中’形成色彩層15的具體操作方法可為:在沉積所 述結合層13後’向所述直流磁控濺射鍍膜機中通入反應 氣體氮氣及工作氣體氬氣,並設定氮氣與氬氣總的流量 為150〜700sccm ’且氮氣的分壓占總的氣體壓強的 50〜80% ;設置锆靶材電源功率為nzkw,調節對基體11 的偏壓至0〜-250V、占空比為〇〜1〇〇%,轉架的公轉轉速 為2. 5-3. 5轉母分鐘(revolution per minute,rpm) ’沉積所述色彩層15。沉積色彩層15的時間可為2〇〜4〇 分鐘。 該色彩層15為Zr-N膜,其於CIE LAB表色系統的L*座標 值介於55至65之間,a*座標值介於1〇至2〇之間,b*座標 值介於30至40之間。 本發明殼體10可為筆記型電腦、個人數位助理等電子裝 置的殼體,或為其他裝飾類產品的殼體。 相較於習知技術,所述殼體1〇的製備方法,係藉由對靶 材的選取及對反應氣體氮氣流量的設計,從而達到使色 彩層15呈現出金黃色的目的。 應該指出,上述實施方式僅為本發明的較佳實施方式, 本領域技術人員還可在本發明精神内做其他變化。這些 依據本發明精神所做的變化,都應包含在本發明所要求 保護的範圍之内。 099141321The color region of the color layer is represented by CIE 099141321. The U coordinate value of the LAB color system is between 55 and 65. The coordinate value is shown in Form No. A0101. Page 3 / Total 11 Page 0992071886-0 201221677 at 10 to 20 The b* coordinate value is between 30 and 40. [0006] [0009] [0011] [0011] 099141321 A method of manufacturing a housing, comprising the steps of: providing a substrate; magnetron sputtering a bonding layer on a surface of the substrate; The surface of the bonding layer is DC magnetron sputtering a color layer, and the process parameters of the DC magnetron sputtering color layer are: zirconium as a target, nitrogen as a reaction gas, and argon as a working gas, wherein nitrogen and argon are used. The total flow rate is 150 to 700 sccm, and the partial pressure of nitrogen accounts for 50 to 80% of the total gas pressure; the color layer is a Zr-N film, and the color layer exhibits a chromaticity region in the CIE LAB color system L * The coordinate value is between 55 and 65, the a* coordinate value is between 10 and 20, and the b* coordinate value is between 30 and 40. In the method for preparing the casing, when a color layer is formed, a titanium target is used as a target, and by controlling the flow rate of the nitrogen gas of the reaction gas, the proportional relationship of the components in the desired color layer and the microscopic relationship between the components are realized. Bonding structure to achieve the purpose of making the color layer appear golden yellow. The housing produced by this method can exhibit an attractive golden metallic appearance, which greatly enhances the appearance competitiveness of the product. [Embodiment] Referring to Figure 1, a housing 10 in accordance with a preferred embodiment of the present invention can be a housing for a handset. The housing 10 includes a base 11, a bonding layer 13, and a color layer 15. The bonding layer 13 is provided on the surface of the substrate 11, and the color layer 15 is provided on the surface of the bonding layer 13. The base 11 may be a metal material or a non-metal material such as glass or plastic. The bonding layer 13 is formed on the surface of the substrate 11 by DC magnetron sputtering. Form No. A0101 Page 4 of 11 0992071886-0 [0012] 201221677 The bonding layer 13 is a titanium metal film having a thickness between 〇.〇3/zm. The color of the bonding layer 13 is a light color tone which does not affect the color of the color layer, and may be a light color such as silver, white or grayish white. [0013] The color layer 丨5 is a Zr-N film which is formed by DC magnetron sputtering. The color layer 15 has a thickness of between 0.3 and tz.5; tzm. The color layer 15 exhibits a golden yellow color, and the chromaticity region of the KCIE LAB color system is represented by the L-seat of between 55 and 65, and the a* coordinate value is between 1 and 20, b* The coordinates are between 30 and 40. [0014] Referring to Figures 1 and 2 together, the method of fabricating the housing 10 of the present invention includes the following steps: (10) 15] providing the substrate 11. The base 11 may be a metal material or a non-metal material such as glass or plastic. The substrate 11 is pretreated. The pretreatment may include conventional steps of chemical degreasing, wax removal, pickling, ultrasonic cleaning, and drying of the substrate 11.结合 [0017] A bonding layer 13 is formed on the surface of the substrate 11. The bonding layer 13 is a titanium metal film which can be formed by DC magnetron sputtering. The specific operation method for forming the bonding layer 13 may be: placing the substrate 11a on a rotating frame of a continuous magnetron sputtering sputtering film machine (not shown), and vacuuming the cavity of the film casting machine to 3 x lO_5 Torr, and Heat the chamber to i2 (about TC, argon gas (working gas) with a flow rate of 400~450scCm (standard state ML/min); turn on the power of the titanium target and set the power of the titanium target to 8~1〇 Kw, a bias voltage of 0~-200V is applied to the base 11, the duty ratio is 〇~1〇〇%, and the revolution speed of the turret is set to 3 revolutions per minute (revolutiorl per 0992071886-0 099141321 Form No. A0101 Page 5 [0022] [0022] [0022] [0022] minute, rpm) 'depositing the bonding layer 13. The time for depositing the bonding layer 13 may be 5 to 10 minutes. The surface of the layer 13 forms a color layer 15. In a preferred embodiment of the invention, the specific method of forming the color layer 15 may be: after depositing the bonding layer 13, 'to the DC magnetron sputtering coater Passing the reaction gas nitrogen and the working gas argon, and setting the total flow rate of nitrogen and argon to 150~ 700sccm 'and the partial pressure of nitrogen accounts for 50~80% of the total gas pressure; the power supply of the zirconium target is nzkw, the bias voltage of the substrate 11 is adjusted to 0~-250V, and the duty ratio is 〇~1〇〇%. The revolution speed of the turret is 2. 5-3. 5 revolutions per minute (rpm) 'The color layer 15 is deposited. The color layer 15 may be deposited for 2 〇 to 4 〇 minutes. 15 is a Zr-N film, the L* coordinate value of the CIE LAB color system is between 55 and 65, the a* coordinate value is between 1〇 and 2〇, and the b* coordinate value is between 30 and 40. The housing 10 of the present invention may be a housing of an electronic device such as a notebook computer or a personal digital assistant, or a housing of other decorative products. Compared with the prior art, the manufacturing method of the housing 1〇 The purpose of the color layer 15 is golden yellow by selecting the target and designing the nitrogen flow rate of the reaction gas. It should be noted that the above embodiment is only a preferred embodiment of the present invention, and the prior art Personnel may also make other changes within the spirit of the invention. These changes in accordance with the spirit of the present invention should The present invention contained within the scope of the claims. 099141321

表單編號A010I 第6頁/共11頁 0992071886-0 201221677 【圖式簡單說明】 [0023] [0024] [0025] [0026] [0027] [0028] Ο 圖1係本發明較佳實施例的殼體的剖視示意圖。 圖2係本發明較佳實施例製作所述殼體的流程圖。 【主要元件符號說明】 殼體:10 基體:11 結合層:13 色彩層:15 ❹ 099141321 表單編號A0HU 第7頁/共11頁 0992071886-0Form No. A010I Page 6 of 11 0992071886-0 201221677 [Simplified Schematic] [0023] [0028] [0028] FIG. 1 is a shell of a preferred embodiment of the present invention A schematic cross-sectional view of the body. 2 is a flow chart of making the housing in accordance with a preferred embodiment of the present invention. [Main component symbol description] Housing: 10 Base: 11 Bonding layer: 13 Color layer: 15 ❹ 099141321 Form number A0HU Page 7 of 11 0992071886-0

Claims (1)

201221677 七、申請專利範圍: 1 · 一種殼體,包括基體、結合層以及色彩層,所述結合層形 成於基體的表面’所述色彩層形成於結合層的表面,其改 良在於:該色彩層為Zr-N膜,其藉由直流磁控濺射法形 成’以鍅為靶材,以氮氣為反應氣體,氬氣為工作氣體, 其中氮氣與氬氣總的流量為150~700sccm,氮氣的分壓 占總的氣體壓強的50〜80% ;該色彩層呈現的色度區域於 CIE LAB表色系統的L*座標值介於55至65之間,a*座標 值介於10至20之間,b*座標值介於30至40之間。 2 .如申請專利範圍第1項所述之殼體,其中所述結合層為一 敛金屬膜,其厚度〇. 1〜〇· 。 3 ·如申請專利範圍第1項所述之蠢體,其中所述色彩層厚度 為 〇·3 〜0·5/ζπι。 4 ·如申請專利範圍第1項所述之殼體,其中所述基體為金屬 材料、玻璃或塑膠。 5 · —種殼體的製作方法,其包括如下步驟: 提供一基體; 在該基體的表面磁控濺射一結合層; 在該結合層的表面直流磁控濺射一色彩層,直流磁控濺射 所述色彩層的工藝參數為:以鍅為靶材,以氮氣為反應氣 體’氬氣為工作氣體,其中氮氣與氬氣總的流量為 150〜700sccm,氮氣的分壓占總的氣體壓強的50〜80% ; 所述色彩層為Zr-N膜,所述色彩層呈現的色度區域於CIE LAB表色系統的L*座標值介於55至65之間,a*座標值介 於10至20之間,b*座標值介於30至40之間。 099141321 表單編號A0101 第8頁/共11頁 0992071886-0 201221677 6 .如申請專利範圍第5項所述之殼體的製作方法,其中形成 * 所述結合層的工藝參數為:設置鈦靶的電源功率為 8-10kw,對基體施加的偏壓為0 — 200V,占空比為 0~100%,鍍膜時間為5~10分鐘。 7 .如申請專利範圍第5項所述之殼體的製作方法,其中形成 所述色彩層的工藝參數為:設置鈦靶的電源功率為 8-12kw,對基體施加的偏壓為0~-250V,占空比為 0〜100%,鍍膜時間為20〜40分鐘。 Ο 099141321 表單編號A0101 第9頁/共11頁 0992071886-0201221677 VII. Patent application scope: 1 . A casing comprising a base body, a bonding layer and a color layer, the bonding layer being formed on a surface of the base body. The color layer is formed on a surface of the bonding layer, and the improvement is: the color layer It is a Zr-N film, which is formed by DC magnetron sputtering, with 鍅 as the target, nitrogen as the reaction gas, and argon as the working gas, wherein the total flow rate of nitrogen and argon is 150~700sccm, nitrogen The partial pressure accounts for 50~80% of the total gas pressure; the color layer exhibits a chromaticity region with a L* coordinate value between 55 and 65 in the CIE LAB color system, and a* coordinate value between 10 and 20 The b* coordinate value is between 30 and 40. 2. The casing of claim 1, wherein the bonding layer is a metal film having a thickness of 1. 1~〇·. 3. The stupid body of claim 1, wherein the color layer has a thickness of 〇·3 〜0·5/ζπι. 4. The casing of claim 1, wherein the substrate is a metal material, glass or plastic. a method for manufacturing a casing, comprising the steps of: providing a substrate; magnetron sputtering a bonding layer on a surface of the substrate; directing magnetron sputtering a color layer on the surface of the bonding layer, DC magnetron The process parameters for sputtering the color layer are: using 鍅 as a target and nitrogen as a reaction gas 'argon gas as a working gas, wherein the total flow rate of nitrogen and argon is 150~700 sccm, and the partial pressure of nitrogen accounts for the total gas. 50~80% of the pressure; the color layer is a Zr-N film, and the color region exhibits a chromaticity region in the CIE LAB color system with an L* coordinate value between 55 and 65, and the a* coordinate value Between 10 and 20, the b* coordinate value is between 30 and 40. The method of manufacturing the casing according to claim 5, wherein the process parameter for forming the bonding layer is: setting the power source of the titanium target. 099141321 Form No. A0101, No. 8/11. The power is 8-10kw, the bias voltage applied to the substrate is 0-200V, the duty ratio is 0-100%, and the coating time is 5~10 minutes. 7. The method of manufacturing a casing according to claim 5, wherein the process parameter for forming the color layer is: setting a power supply of the titanium target to 8-12 kW, and applying a bias voltage to the substrate of 0~- 250V, duty cycle is 0~100%, coating time is 20~40 minutes. Ο 099141321 Form No. A0101 Page 9 of 11 0992071886-0
TW99141321A 2010-11-30 2010-11-30 Housing and method for making the same TW201221677A (en)

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