TW201213360A - An optical waveguide structure and an electronic device - Google Patents

Abstract

The present invention provides an optical waveguide structure and an electronic device. The freedom degree of the pattern shape design of the optical waveguide is broad, and the high size accuracy of the core part (optical path) of the optical waveguide can be formed by the simple method. In addition, the optical waveguide has a long life. An example of the present invention is described below. The optical waveguide structure 1 is equipped with an optical waveguide 9 formed by laminating clad layers 91 and 92 on the both surfaces of a core layer 93, conductor layers 51 and 52 joined on the both surfaces of the optical waveguide 9, an optical path transforming section 96 which inflects the optical path of the optical waveguide at an almost right angle, a light-emitting element 10 and an electrical element 12. The core layer 93 has a core part 94 and a clad part 95. The core part 94 is formed in an intended shape by selectively irradiating an active radical ray to a layer constituted with a composition comprising (A) cyclic olefin resin, (B) at least one of a monomer containing cyclic ether group and an oligomer containing cyclic ether group which have a different refraction index from (A), and a photo-acid-generating agent.

Description

201213360 VI. Description of the Invention: [Technical Field] The present invention relates to an optical waveguide structure and an electronic device. This is based on Japan's special offer No. 2〇10-088096, which was filed in Japan on April 6, 2010, and Japan's special offer, 20^-08^67, and 2〇10, which were filed in Japan on April 8, 2010. Japan's Japanese Patent Application No. 2010-089401, filed on Apr. 8, 2008, claims priority, the content of which is incorporated herein. [Prior Art] In recent years, an optical branching device (optocoupler), an optical multiplexer/demultiplexer, and the like have been developed as optical components in the field of optical communication, and are expected to be used for such optical waveguide type elements. In addition to the conventional quartz-based optical waveguide, a polymer-based optical waveguide which is easy to manufacture (patterned) and is versatile, has recently been actively used as the optical waveguide type element (hereinafter also referred to as "optical waveguide"). Carry out the latter development. The above optical waveguide is usually formed on a substrate by a specific arrangement (pattern) and processed in the form of an optical waveguide structure. As the optical waveguide structure, a specific electric wiring circuit and an optical waveguide formed of a core 4 and a cladding portion are formed on the substrate, and a light-emitting element and a light-receiving element are mounted on the optical waveguide (electrical/ Light-mixed substrate) (for example, refer to Patent Document 1). However, the optical waveguide structure described in the above Patent Document 1 has the following problems. 1 • The formation process of the optical waveguide is complicated, and the design of the pattern shape of the core portion of the optical path that constitutes the transmission light of 201213360 is narrow. 2. The accuracy or dimensional accuracy of the pattern shape of the core is poor. 3. At the time of manufacture, it is difficult to manufacture (assemble) when the light-emitting element, the light-receiving element, and the light-guide element are complicated in structure or the circuit is complicated. 4· With the electric wiring pattern 袓 夕 π ^ # ^ ^ card, σ 隋 shape, the design of the wiring pattern has a narrow degree of freedom. Moreover, if Yufeng _ && a 馒 first 3 and leaf electrical wiring pattern, the optical waveguide design of the optical path is less flexible. 5. It is not good for integration and miniaturization. [Patent Document 1] Japanese Laid-Open Patent Publication No. 2004-146602. SUMMARY OF THE INVENTION The object of the present invention is to provide a free design for a design having a simple shape to form a pattern shape, lt ^ Tian The core part (optical path) with a wide range of dimensional accuracy and high durability, and the optical waveguide structure and electronic equipment of the waveguide with excellent durability, and the first waveguide, up to π electric meters L · % Each of the circuits of the flawless circuit has an optical waveguide structure of an optical waveguide having a wide degree of freedom in designing a pattern shape and having a high degree of dimensional accuracy, and having excellent durability. An electronic device having the optical waveguide. Further, an object of the present invention is to provide an optical waveguide structure having a wide degree of freedom in designing an optical circuit which can be formed in a simple manner, and having a dimensional accuracy = core portion (optical path h and easy positioning of electrical components) Further, an object of the present invention is to provide an electronic device including the above optical waveguide structure of 201213360. The above object is achieved by the present inventions (1) to (131) below. (1) An optical waveguide structure The body is characterized in that it has an optical waveguide having a core portion and a cladding portion having different refractive indices, and an optical path conversion portion that bends an optical path of the core portion, wherein the core portion is composed of the following components The core layer composed of the composition is selectively irradiated with active radiation to form a desired shape: (A) CyCiic 〇iefin resin, (B) having a refractive index different from that of (A) above, and having a cyclic ether At least one of a monomer and a oligomer having a cyclic ether group, and (C) a photoacid generator (ph〇t〇_acid_generating agent). (2) an optical waveguide structure as described above (丨) Body, where The cyclic ether group of (b) is an oxetanyl group or an epoxy group. (3) The optical waveguide structure according to the above (丨) or (2), wherein the above (A) (4) The optical waveguide structure according to any one of (1) to (3) above, wherein the refractive index of the above (B) is lower than the above (A), the above cyclic olefin The resin has a detachment group which is detached by the acid generated by the photoacid generator of the above (C) and which lowers the refractive index of the above (a) by detachment. (5) The optical waveguide structure of the above (2) The cycloolefin resin of the above (A) has a debonding group which is desorbed by an acid generated by the photoacid generator of the above (c) in the side chain, and the above (B) contains the following formula (100). The first monomer: 6 201213360

(6) as described above (5, which contains an epoxy compound and has two leads: a structure in which the above (8) is at least __ as a gas heterozygous oxirane The second monomer.

(7) The ratio of the ratio of the optical waveguide block of the above-mentioned (6) to the second precursor of the above-mentioned second single-precursor (the ratio of the second monomer to the first monomer) ) counted as...丨. . The optical waveguide structure of any one of the above-mentioned items (4) to (6), wherein the above-mentioned detachable group has a genus of the genus. 4 4 square structure and similar structure 1 In the above (5) i (1), the optical waveguide structure of the item ",", and the cycloolefin resin of the above (A) is a norbornene-based resin. (8) The optical waveguide structure according to the above (9), wherein the ruthenium resin is an addition polymer of norbornene. (7) The optical waveguide structure according to (10) above, wherein the above-mentioned reduced addition polymer Repeating unit with the following formula (丨01): 201213360

(101) [where η is an integer of 0 or more and 9 or less]. (12) The optical waveguide structure according to (10) or (11) above, wherein the addition polymer of the above-described norbornene has a repeating unit as described in the following formula (102):

(13) The optical waveguide structure of the first monomer according to any one of the above (5) to (12), wherein the 'τ, % tθ 3 is relative to 100 parts by weight of the resin of the above formula (100), It is 1 part by weight or more, one " The optical waveguide structure according to any one of the above-mentioned (1), wherein the region of the core layer irradiated with active radiation and the unirradiated region are derived from the structure of the above (B) The concentration is different. (I5) The optical waveguide structure according to any one of the above (1), wherein the refractive index difference between the region irradiated with the active radiation of the core layer and the non-irradiated region is 0.01 or more. The optical waveguide structure according to any one of the above-mentioned (1), wherein the area of the core layer irradiated with the active radiation is at least a part of the cladding portion, and the unirradiated area is used as the core At least part of the ministry. (17) The optical waveguide structure according to any one of (1) to (16), wherein the light red converting portion has a reflecting surface that reflects at least a part of the transmitted light transmitted to the core portion. (1) The optical waveguide structure according to (7) above, wherein the optical waveguide structure has a hole provided in the core portion, and the reflection surface is formed by part or all of an interface between the core portion and the hole. (1) The optical waveguide structure according to (i7) or (?8) above, wherein the reflecting surface is set to an inclination angle at which the transmitted light is totally reflected. (20) The optical waveguide structure according to any one of (i7) to (9), wherein the projection of the reflecting surface in the direction of the core portion overlaps with the cross section of the core D? a cross-sectional area having a smaller area than the core portion is a branch portion that branches the transmitted light transmitted through the core portion into transmitted light reflected by the emitting surface and transmitted and linearly propagated in the core portion other than the reflecting surface. . The optical waveguide structure according to any one of the above-mentioned (17), wherein the projection of the projection surface in the direction of the core portion overlaps with the area of the core portion The core portion has the same sectional area, and the core portion is set to be large only in a portion of the core portion where the reflection surface exists. The optical waveguide structure according to any one of the above-mentioned (17), wherein the reflection surface is inclined with respect to the core portion, and at least one of both end portions of the reflection surface in a slope direction is located above The outer portion of the core portion has an outer extension line, and the core portion expands in a state of surrounding the reflection surface. (23) The optical waveguide structure according to any one of (1) to (22), wherein a cladding layer constituting the cladding portion is joined to both sides of the core layer by two cladding layers and The laminated body of the core layer between the equal parts constitutes the optical waveguide (24). The optical waveguide structure according to (23) above, wherein the cladding layer is made of the same material as the core layer. (25) The optical waveguide structure according to (23) or (24) above, wherein the optical path converting portion is formed across the core portion, ik at least - soil, and the coating layer. (26) The light guide structure according to any one of (1) to (24) above, wherein the optical path conversion portion is formed only in the core layer. (27) The optical waveguide structure according to any one of (1) to (17) above, wherein in the core layer, the core portion is formed by a five-footed horse at its end or in the middle of 10 201213360, The optical path conversion unit is formed in a portion where the core portion is interrupted. (28) The optical waveguide structure according to (27) above, comprising: a hole provided in a portion where the core portion is interrupted, wherein the reflecting surface is partially or wholly of an interface between the portion interrupted by the core portion and the hole Composition. (29) The optical waveguide structure according to any one of (1) to (28) above, wherein at least one conductor layer is bonded to the optical waveguide. The optical waveguide structure according to any one of the above (1) to (28), wherein a conductor layer is bonded to both surfaces of the optical waveguide. (3) The optical waveguide structure according to any one of the above (1) to (3), which has an element including a light-emitting portion or a light-receiving portion and a terminal. (32) The optical waveguide structure according to (29) or (3) above, There is a light-emitting portion or a light-receiving portion electrically connected to the terminal body layer. The upper portion and the above-mentioned guide (33) are as described above (31) in the above-mentioned element and the optical waveguide (34) as in the above (31) body, wherein the above-mentioned element system (35) The optical waveguide structure of (32), wherein the optical path conversion portion of the optical path conversion portion overlaps, or the optical waveguide structure of (32), wherein there is no gap portion therebetween. The optical waveguide structure encloses the material to close the outer surface thereof. The optical waveguide structure according to any one of (34) is formed in a plan view with the above-mentioned light-emitting portion or subjected to (36) as described above (to the body) The optical waveguide structure of the above-mentioned (36), wherein the wafer carrier has another optical waveguide. (38) The optical waveguide structure according to any one of the above (A) to (37), wherein At least one substrate is bonded to the optical waveguide, and the substrate includes a light transmitting portion that transmits light to the transmission light transmitted through the core portion, and is configured to transmit the transmission in a thickness direction of the substrate via the light transmitting portion (39) The optical waveguide structure according to (38), wherein the transmittance of the transmitted light of the substrate itself is 8% or more, whereby one of the substrates constitutes the light transmitting portion. In the optical waveguide structure of the above (38) or (39), the light transmitting portion is formed by a through hole penetrating the substrate. (41) The optical waveguide structure according to (40) above, wherein the through hole is The optical waveguide structure according to the above (38), wherein the light transmitting portion transmits the vertical light of the transmitted light in a thickness direction of the substrate. The optical waveguide structure of any one of the above-mentioned (38) to (42) wherein the light transmitting portion has a lens portion that can condense or diffuse the transmitted light. Any one of (1) to (43) The optical waveguide structure, wherein the active radiation has a peak wavelength in the range of 200 to 450 run. (45) The optical waveguide structure according to any one of (1) to (44) above, 12 201213360 wherein the active radiation The optical waveguide structure of any one of the above (1) to (45), wherein the active radiation is irradiated to the core layer via a mask. The optical waveguide structure according to any one of the above (1) to (46) wherein the core layer further contains an antioxidant. The optical waveguide structure according to any one of the above (1) to (47) wherein the core layer further contains a sensitizer. (49) An electronic device comprising: the optical waveguide structure according to any one of (48) above, wherein the optical waveguide structure is characterized in that it has a refractive index And an optical waveguide of the core portion and the cladding portion and a laminated structure of the conductor layer, and having a light guide extending in the thickness direction and optically connected to the core portion, and extending in the degreewise direction The core portion is formed by selectively irradiating a core layer containing the following components with an active radiation to form a ring-shaped resin, which is a desired shape: (B) the refractive index is different from (a) above. And having at least a de-etherified ether group of the product and the oligomer having a cyclic ether group, and (C) a photoacid generator.

The above-mentioned (B'-'-^ m ring-like group is oxetanyl group or epoxy group. (52) The light-equal structure of (5〇) or (51) above, The optical waveguide structure according to any one of the above (50), wherein the refractive index of the above (B) is lower than the above. (A) The cycloolefin resin has a debonding group which is desorbed by the acid generated by the photoacid generator of the above (C) and which is reduced in the refractive index of (A) by detachment. In the optical waveguide structure of (51), the cycloolefin resin of the above (a) has a debonding group which is desorbed by an acid generated by the photoacid generator described above in the side chain, and the above (B) contains the following formula: (1〇〇) the first monomer recorded:

. (100) (55) The optical waveguide of the above (54), the structure of the optical waveguide, wherein the above (Β) and further 3 have an epoxy compound and have 2 oxygen, Λ. At least one of the oxetane quinones is used as the second monomer. (56) The optical waveguide structure according to (55) above, wherein the ratio of the second precursor to the second monomer is a weight a / , . . . , and the weight of the second monomer / the first single The weight of the body is counted as 〇.丨~丨〇. (57) The above-mentioned (54) to (55) wherein the above-mentioned detachable group has an optical waveguide structure of any one of -〇-structure, -Si-aryl structure, and 〇·^_ 14 201213360 structure At least one. (58) The above (54) to (;57), wherein the cycloolefin resin of the above (A) is a lipid-lowering optical waveguide structure, such as the optical waveguide structure of (58), wherein the above-mentioned abatement system is The resin is a reduced addition polymer. (6) The optical waveguide structure according to the above (59), wherein the addition polymer of the above-mentioned reduced olefin has a repeating unit described in the following formula (1G1):

(101) [In the formula 101, η is an integer of 0 or more and 9 or less]. (61) The optical waveguide structure according to the above (59) or (60), wherein the addition polymer of the norbornene has a repeating unit as described in the following formula (1〇2)

15 S 201213360

(62) The body of any one of the above (54) to (61), wherein the content of the first monomer described in the above formula (1°) is 100 parts by weight of the cycloolefin resin, preferably Α^仴 For up and down. The knives are one or more parts of the summer portion, and 50 parts by weight ((1) the optical waveguide body of the above-mentioned (50) to (62), wherein the region irradiated with the active radiation of the core layer is irradiated with the region The structure of the above (Β) is different. (64) The optical waveguide structure of any of the above-mentioned (50) to (63) cups - TS ^ , ^, wherein the core layer is irradiated with active radiation The refractive index difference from the unirradiated region is 0.01 or more. The optical waveguide structure of the above-mentioned (5) to (4), wherein the active layer of the core layer is irradiated with the active radiation as the above At least a part of the cladding portion, the unirradiated region is at least a part of the core portion. (66) The optical waveguide structure 16 201213360 according to any one of the above (50) to (65), wherein the light path is The optical waveguide structure of any one of the above (5) to (66) has a through hole, and the light guide and the conductor portion are formed in the through hole. (68) The optical waveguide structure according to (67) above, wherein The optical waveguide structure according to any one of the above (5) to (68), wherein the light guide is made of the light and the light is disposed in the through hole. (70) The optical waveguide structure of any one of the above-mentioned (50) to (68) wherein the optical path is made of a core portion and a package having refractive indices different from each other (71) The optical waveguide structure of any one of the above (5) to (7), wherein a core portion of the light guiding path is a core portion of the optical waveguide (72) The optical waveguide structure according to (71) above, wherein the core portion of the light guiding private body is formed in the same manner as the core portion of the optical waveguide. (73) The optical waveguide structure according to any one of the above (50), wherein the cross-sectional shape of the light guiding path is formed in a circular shape. (74) The one of (5) to (73) above. An optical waveguide structure having an optical path converting portion that bends an optical path of the optical waveguide. (75) as described above ( 74) The optical waveguide structure, wherein the optical path conversion portion is provided at a portion of the optical waveguide core portion and the light guiding path 17 201213360. (76) The optical waveguide structure according to (74) or (75) above The light-transmissive conversion portion has a reflection surface that reflects at least a portion of the transmission light transmitted to the core portion. (77) The optical waveguide structure of any one of the above (50) to (76) The optical waveguide is formed by bonding the two layers of the core layer to the cladding layer constituting the cladding portion by a laminate of the two cladding layers and the core layer interposed therebetween. The optical waveguide structure according to any one of the above (50), wherein the conductor layer is bonded to at least one surface of the optical waveguide. (79) The optical waveguide structure of any one of the above (50) to (78), which has an element including a light-emitting portion or a light-receiving portion and a terminal. (80) The optical waveguide structure according to (79) above, wherein the terminal of the element is electrically connected to the conductor layer. (81) The optical waveguide structure according to (79) or (80) above, wherein the above-mentioned element is closed by the sealing material. (82) The optical waveguide structure of any one of the above (50) to (8), which has a rigid or flexible substrate. (83) The optical waveguide structure according to (82) above, wherein the optical waveguide is provided adjacent to the substrate. (84) The optical waveguide structure according to (82) or (83) above, wherein at least one of the light guiding member and the conductor portion is formed to penetrate the substrate. The optical waveguide structure 18 201213360 according to any one of the above-mentioned (82), wherein the light guiding path and at least one of the conductor portions are formed substantially perpendicular to the substrate. The bulk layer body 4 of the above-mentioned (50) to (85) has a plurality of conductors formed at different positions in the thickness direction. The conductor layers are electrically connected to each other via the conductor portion. (87) The above-mentioned (5()) to (86), wherein the light guiding path is obtained by performing at least a part of the steps of the core portion simultaneously with the core portion. The optical waveguide structure according to any one of the above (5) to (87), which has a lens portion which can condense or diffuse the transmitted light. (89) The optical waveguide as described in (88) above is obtained. The above-mentioned lens portion is provided at the end or inside of the above-mentioned light guiding path. (90) An electronic device characterized by having the optical waveguide structure according to any one of the above (5) to (89). 91) - an optical waveguide structure, comprising: a substrate, an optical waveguide having a different core portion and a cladding portion having a different rate; and a lightning bar; and a position determining the position of the electrical component The means is: q /, the core portion is formed by selectively irradiating the active layer with the core layer containing the composition of the following r component, and forming (A) a cycloolefin resin, Shape: (B) a refractive index different from the above (a), and having at least one of an s body and an oligomer having a cyclic ether group, a single squaring group, and (C) photoacid 19201213360 (92) The optical waveguide structure of (91) above, wherein the ring of the above (B) is shouted The optical waveguide structure according to the above (91) or (92), wherein the cycloolefin resin of the above (A) is a norbornene-based resin. In the optical waveguide structure of any one of the above (9) to (93), wherein the refractive index of the above (B) is lower than the above (a), the cycloaliphatic resin has a photoacid produced by the above (C) (95) The optical waveguide structure according to the above (92), wherein the cycloolefin resin of the above (a) is on the side of the optical waveguide structure of the above (A) The chain has a detachable group which is detached by the acid generated by the photoacid generator of the above (C), and the above (B) contains the first monomer described in the following formula (1):

(96) The optical waveguide structure according to (95) above, wherein the (b) oxygen compound and the #2 oxetane are contained in the above (95), further comprising at least one of an epoxy compound and a compound of the environment An alkyl oxetanyloxy compound and at least one of 2 are used as the second monomer.

As described above (96) "Optical waveguide structure, the above-mentioned first! The ratio of the monomers is 〇1 to 1() in terms of a weight ratio (the above-mentioned t second monomer weight 20 201213360/the weight of the second monomer). (98) The optical waveguide structure of the above-mentioned (95) to (97), wherein the dissociative group has -〇·έ+槿, 纴秘+, °, S-- at least one of an aryl structure and an -O-Si- structure. (99) The optical waveguide structure according to any one of (95) to (98) above, wherein the ring-thin resin of the above (A) is a reduced system (four). (100) The optical waveguide structure according to the above (99), wherein the #-reduced resin is an addition polymer of norbornene. # U0O如如1(1) above. Optical waveguide structure in which the above is lowered

(101) [In the formula 101, η is an integer of 0 or more and 9 or less]. (102) The optical waveguide structure according to the above (1〇〇) or (1〇ι), wherein the reduced-thinning addition polymer has a repeating unit described in the following formula (102): 21 201213360

The optical waveguide structure according to any one of the above (95), wherein the content of the first monomer described in the above formula (1) is 1 part by weight relative to the cycloolefin resin. It is preferably 1 part by weight or more and 50 parts by weight or less. (104) The optical waveguide structure according to any one of the above (91) to (103) wherein the concentration of the structure derived from the above (B) is different from the area irradiated by the active radiation of the core layer and the unirradiated area . The optical waveguide structure according to any one of the above-mentioned (9), wherein the refractive index difference between the region irradiated with the active radiation of the core layer and the unilluminated region is 〇. (106) The optical waveguide structure of any one of the above-mentioned (91) to (105), wherein the region irradiated with the active radiation of the core layer is at least a part of the cladding portion, and the unirradiated region is used as the core At least part of the ministry. (107) The optical waveguide structure according to any one of (91) to (6), wherein the substrate is made of a resin material or a semiconductor material or 22 201213360 is formed by impregnating a fiber substrate t with a resin material. Composed of. (108) The optical waveguide structure according to any one of the above (91), wherein the two sides of the core layer are respectively joined to form a cladding layer of the cladding portion. The laminated body of the core layer between the layers constitutes the optical waveguide. Body, person. 109) The above-mentioned positioning means determines the position (110) of the optical waveguide junction of any one of the above-mentioned core portions as in the above (9)) to (1G9). In the optical waveguide structure, the electric component is an element having a light-emitting portion or a light-receiving portion and a terminal. The optical waveguide structure according to any one of the preceding claims, wherein the optical waveguide has an optical path converting portion that bends an optical path of transmitted light transmitted through the core portion. (112) The optical waveguide structure according to the above (i), wherein the positioning means is positioned such that a position of the light-emitting portion or the light-receiving portion overlaps with a position of the optical path conversion portion in a plan view. (113) The optical waveguide structure according to (U1) or (112) above, wherein the optical path converting portion is formed by a reflecting surface that reflects at least a part of the transmitted light transmitted to the core portion. The optical waveguide structure according to any one of the above-mentioned (110), wherein the substrate is provided with a light transmitting portion having a light transmissive property to the transmitted light transmitted through the core portion, the element The light-emitting portion or the light-receiving portion and the core portion are optically connected via the light-transmitting portion. The optical waveguide structure according to (n4) above, wherein at least a portion of the substrate has a light transmissive property to the transmitted light, thereby constituting a light transmitting portion. The light transmission (116) is the optical waveguide structure of the above (114), and the portion is formed by a through hole penetrating the substrate. The optical waveguide structure according to any one of the above (91) to (116), wherein the optical waveguide is adjacent to the substrate and is provided with ❶ (118) as in any one of (91) to (117) above. The optical waveguide structure 'where the above electrical component comprises an electronic circuit component. The optical waveguide structure according to any one of the above-mentioned (91), wherein the electric component includes an element having a light-emitting portion or a light-receiving portion and a terminal, and has a wheel for driving the element or processing the element An electronic circuit component that functions as a signal. (120) The optical waveguide structure of any one of the above (91) to (U9), which has at least one conductor layer. The optical waveguide structure according to the above (120), wherein the terminal of the electric component is electrically connected to the conductor layer. The optical waveguide junction according to any one of the above (91), wherein the positioning means is formed by a step formed on an edge portion of the concave portion formed on the substrate. (123) The optical waveguide assembly body according to any one of the above (91) to (121) wherein the positioning means is a positioning member fixedly disposed with respect to the substrate. (124) The optical waveguide structure according to (123) above, wherein the predetermined member is a sheet or sheet joined to the substrate. The optical waveguide structure of any one of the above-mentioned (9), wherein the positioning means is formed by a contact surface formed on the substrate or relative to the substrate. (126) as described above ( The optical waveguide structure of any one of (91), wherein the positioning means performs the χ direction and the γ direction when the χ direction and the Υ direction are orthogonal to each other on a plane of the substrate (127) The optical waveguide structure of any one of the above (91) to (125), wherein when set in the X direction and the Υ direction orthogonal to each other on the plane of the substrate, The positioning means performs the positioning in the respective directions of the χ direction and the Υ direction. (128) The optical waveguide structure according to the above (126) or (127), wherein the longitudinal direction of the core portion and the X direction or the above The optical waveguide structure according to any one of the above-mentioned (91) to (128), which has a lens portion that can condense or diffuse transmitted light transmitted through the core portion. (130) An optical waveguide structure according to (129) above, wherein The lens unit is provided in the vicinity of or in the vicinity of the substrate. (131) An electronic device comprising the optical waveguide structure according to any one of the above (91) to (1 30). It is possible to obtain a pattern shape of the core portion of the optical path of the optical circuit by a simple method such as irradiation with light or active radiation (active energy, electron beam, X-ray, etc.), etc. 25 201213360 The core part with a wide degree of freedom and high dimensional accuracy. When the core layer is composed of the desired material, even when the stress acts on the optical waveguide or is deformed, especially in the case of repeated bending deformation, It is difficult to cause defects such as peeling between the core portion and the cladding portion or micro-cracking in the core portion, and as a result, the optical transmission performance of the optical waveguide can be maintained, and the durability is excellent. Further, the decene-based resin (cycloolefin system) When the resin composition mainly composed of a resin is a core portion, it is difficult to produce a particularly strong defect with respect to the above deformation, and the core portion and the package can be further increased. The refractive index of the covering portion is poor, and the heat resistance is excellent, and as a result, an optical waveguide having higher performance and more excellent durability can be obtained. Further, in the case of having an optical path converting portion, the optical path of the transmitted light can be made to be desired. The direction is curved, so the design of the optical path is more flexible, and it also contributes to the integration of the optical circuit. Moreover, in the case where the substrate has a light transmitting portion, the optical path through the substrate can be formed, so the optical path The degree of freedom in the design is further expanded. When the light-transmitting portion has a lens portion, it is possible to collect and diffuse the transmitted light as needed in the optical path, and to integrate with the optical path and the like. Further, the degree of freedom in designing the optical circuit is further expanded. Also, in the case where the waveguideless structure has Π, | 兀仵 or light-receiving element, by optically connecting with the optical waveguide, j is used to illuminate the component by the first waveguide. The light emitted by the part is introduced into other parts, and the lighter 4' leads the light from other parts to the light receiving part of the component, and can occupy a small and integrated optical circuit, and the operation of the optical circuit is reliable. Also higher. 26 201213360, it is easy to place the terminal for the above-mentioned components, and the like, and it is suitable for the degree of freedom of the installation portion of the wiring terminal of the wiring layer of the above-mentioned conductor layer. The type of component (the wiring thereof is versatile. And the degree of freedom in the design of the pattern (for example, the selection is wider. Regarding the above-described optical waveguide structure of the present invention, the optical circuit (pattern of the optical waveguide) or the design space of the electrical circuit) Wide, high yield, high optical transmission performance, reliable, sinful durability, and versatility. With the light structure of the present invention, various electronic components with high reliability can be obtained. In the case of the light guide disk conductor portion extending in the thickness direction of the laminated structure, the electrical circuit and the optical circuit can realize a three-dimensional circuit design, and the degree of freedom in design is expanded in each circuit design. In particular, by arranging the light guiding path and the conductor portion, particularly in the through hole, it is possible to contribute to the integration of the optical waveguide structure. Miniaturization. In the case of the optical path conversion unit, the optical path of the transmitted light can be bent in the desired direction. Therefore, the degree of freedom in designing the optical path is enlarged, which also contributes to the integration of the optical circuit. In the case of having a lens portion, it is possible to combine the light collecting and diffusing of the transmitting light in the optical path as needed, and to combine with the bending of the optical path to further expand the degree of freedom in designing the optical circuit. When the waveguide structure has an element (light-emitting element or light-receiving element), by optically connecting with the optical waveguide, the optical waveguide can introduce light emitted from the light-emitting portion of the element into other parts, or the optical waveguide will be from its 27 201213360 The light-receiving portion of the light-introducing element of the portion can form a small and integrated optical circuit, and the reliability of the operation of the optical circuit is also high. Moreover, in the case of having a conductor layer and a conductor portion that is electrically connected thereto, for example, It is easy to wire the above-mentioned components'. It is possible to realize the versatility regardless of the type of components (the wiring of the terminals is suitable for the wiring of the terminals). The degree of freedom (for example, the degree of freedom in the location where the terminal is selected) is wide. The optical waveguide structure of the present invention, the optical circuit (the pattern of the optical waveguide and the light guiding portion) or the electrical circuit (the pattern of the conductor layer and the conductor portion) The design has a wide space, good yield, high optical transmission performance, excellent reliability, durability, and versatility. Therefore, the optical waveguide structure of the present invention can be used for various electronic parts, electronic devices, and the like.使用 By using the optical waveguide structure of the present invention, it is possible to manufacture a conductor layer in which at least one layer of the electric rolling circuit is formed, and an optical waveguide in which at least one layer is arranged one-dimensionally or two-dimensionally in the plane direction. The multilayer optical-electric hybrid (fused) wiring board can be connected by any of the electrical wiring or the optical circuit by connecting the layers (the thickness direction of the layer) with the light-conducting path and the through-hole of the conductor portion. As a result, a three-dimensional light/electric hybrid substrate having a wide degree of freedom in circuit design can be provided. Further, it is easy to form an electric circuit or an optical circuit, and it is possible to form various shapes with good dimensional accuracy. In particular, with regard to the optical circuit, by selecting the exposure pattern, it is possible to form a crucible (core portion) of any shape or configuration, and it is also possible to clearly form a thinner #纽,,. In order to reduce the size of the device, it is possible to reduce the positional relationship between the electrical component and the optical waveguide (core (4)) easily and accurately. An optical circuit having excellent optical transmission characteristics and high reliability can be obtained, and a more fine and complicated circuit pattern can be obtained. In particular, the substrate is formed by positioning the electrical component (by irradiating active radiation or borrowing The core portion or the like is formed by further heating or the core layer is formed on the substrate in which the position of the electrical component is determined in advance, thereby forming a core portion or the like, whereby the light-emitting portion or the light-receiving portion of the electric component can be easily and quickly determined. a positional relationship with the core portion (in particular, the incident portion of the transmitted light incident on the core portion or the exit portion from the core portion), and in the case of having the optical path conversion portion, The optical path of the transmitted light is in the desired direction. The degree of freedom in designing the curved 'thus' optical path is expanded, and in particular, the optical circuit can be formed with a shorter optical path length, contributing to the high integration of the optical circuit. In this case, the positioning unit can be used to easily and accurately position the light-emitting unit or the light-receiving unit of the electric component and the optical path conversion unit. Further, when the substrate has a light-transmitting portion, the substrate can be formed. The first step (the optical path in the thickness direction of the substrate), so the degree of freedom in the design of the optical path is further expanded. In the case where the light transmitting portion has the lens portion, the light can be collected in the optical path as needed. Further, the diffusion, the bending of the optical path, and the like are combined to further expand the design of the optical circuit. Further, when the conductor layer is provided, for example, it is easy to wire the electrical component, and the type of the electrical component can be realized ( The wiring of the terminal is suitable for the wiring of the terminal, and is versatile. Moreover, the degree of freedom in the design of the wiring pattern of the above-mentioned wiring is high (for example, the selection of the terminal is freely selected) Regarding the optical waveguide structure of the present invention described above, the design of the optical circuit (the pattern of the optical waveguide and the light guiding portion) or the electrical circuit (the pattern of the conductor layer and the conductor portion) is wider, and the yield is better. The optical transmission performance can be maintained at a high level, and the reliability and durability are excellent, and the versatility is excellent. Therefore, the optical waveguide structure of the present invention can be used for various electronic parts, electronic devices, etc. The formation of the optical circuit is relatively easy and can be sized. It is possible to form a variety of shapes with high precision, and it is also possible to form a finer optical path with a clear shape, which contributes to the integration of the circuit and can be miniaturized. [Embodiment] In the preferred embodiment, the optical waveguide structure and the electronic device of the present invention will be described in detail. The first and second blades are the actual == diagrams of the optical waveguide structure of the present invention. The light waves are referred to by the τ, - surface. For the description of the configuration of the conductor, the above is "upper" or "upper", and the lower side is set to "down" or ":". In each figure, the thickness direction of the riding layer is exaggerated (the figures are shown in the following figure 20 to 24). shape Sectional view, g 25, the section line X in FIG waveguide structure of FIG months, in the FIG. 22 B R 27 is not a circle in the sectional view of FIG 20. Hereinafter, the cross-sectional view of the line and the lower side of w__ in Fig. 24 will be described with reference to these examples. Furthermore, in the following description, the upper side of FIG. 20 to FIG. 24 30 201213360 is set to "up" or "upper", and the lower side is set to "down" and "lower". In Fig. 24, the thickness direction of the edge layer is exaggerated in the upper two directions. Fig. 32 is a plan view showing the 19th problem of the optical waveguide structure of the present invention, and Fig. 33 is a cross-sectional view taken along line A_A of Fig. 32. Fig. 35 is a cross-sectional view showing a twentieth embodiment of the optical waveguide structure of the present invention, and Fig. 36 is a cross-sectional view showing a twenty-first embodiment of the optical undulation structure of the present invention. In the present invention, a cross-sectional view of a twenty-fourth embodiment of the waveguide structure will be described with reference to the configuration of the optical waveguide structure, and the above description will be given to the upper side of FIGS. 33 to 37. Set to "Up" or "Up" and the lower side to "Down" or "Bottom". In the other three, the thickness direction of the drawing layer is exaggerated (the horizontal direction (left-right direction) in the figure is set as the figure = direction). Further, Fig. 32) is referred to as "Y direction" (wherein χ too direction "' longitudinal direction (upper and lower. Alignment with γ direction) <First embodiment: Fig. i &gt; In the present invention, the two sides of the optical waveguide 9 are respectively connected to the two sides of the optical waveguide 9; the optical waveguide 9, the optical path conversion portion of the optical path bending, and the optical waveguide 9 of the first waveguide 9; And the electrical component 12. The cladding layer 9 core layer 93 is sequentially laminated on the lower layer (the lower core layer 93 is formed with a specific layer 2 (upper cladding layer) 92), and the core portion 94 is formed. Forming a portion of the core portion 94 and the cladding portion 95 of the transmitted light, the cladding portion 95 is formed in the core to the layer 93, but does not form the optical path of the passing light, and functions as a cladding layer. 9 i, 92 the same function portion. In the configuration shown in Fig. 1, the core portion 94 is formed on the left side of the core layer 93 at a position on the left side of Fig. 1, and is outside the core layer 93. A portion of the cladding portion 95 is formed. ' As a constituent material of the core layer 93, it can be set by irradiation with light (for example, ultraviolet rays) or by stepwise heating. A material which changes the refractive index. As a preferable example of the above-mentioned material, a resin material containing a benzene ring-shaped polymer and a cycloolefin resin such as a reduced-polymer (resin) is preferable. The female polymer (as a main material) is mainly composed of the above-mentioned material, and the core layer 93 is excellent in resistance to deformation such as deformation, in particular, even in the case of repeated bending deformation: :: 94 and the covering portion 95 The peeling, or the delamination between the core and I) can also prevent microcracking in the core portion 94 or the coating 4 95. As a result, the light transmission property of the special/leather guide 9 can be prevented. Further, an optical waveguide 9 having excellent durability can be obtained. Further, as a constituent material of the core layer 93, for example, a dose agent, a refractive index adjuster, a plasticizer, a tackifier, a smoke, a ton enhancer, a salt-increasing agent, or the like may be used. Addition of the leveling agent 'antifoaming agent, adhesion aid and flame retardant, etc. 1 has the effect of improving high temperature stability and improving weather resistance. Μ Μ: # η ^ 1 , L. 光 光 光 光 乍 乍Examples of the oxidizing agent include those of the Sanyo system and the aromatic amine group. Contrasting, 曰 曰 、 、 、 加强 弯曲 眭 眭 眭 眭 眭 眭 眭 眭 眭 2012 2012 2012 2012 2012 眭 2012 2012 2012 2012 2012 眭 2012 2012 2012 2012 眭 眭 2012 眭 眭 眭 眭 2012 2012 2012 眭 2012 眭 2012 2012 2012 2012 2012 2012 The constituting material as a whole is preferably Μ 4 〇 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 The type or characteristics of the additive are caused by a decrease in the transmittance of light (transmission light) transmitted through the core portion 94, a poor patterning, an unstable refractive index, etc. As a method of forming the core layer 93, a coating method can be cited. Bufa. As a coating, a method of coating a core layer-forming composition (varnish or the like) and hardening it (a method of solid-shadowing, and a method of applying a curable monomer composition and/or curing (curing)) Further, a method other than the coating method, for example, a method of joining separately manufactured sheets may be employed. Using the mask, the core layer 93 obtained in the above manner is selectively exposed (active radiation) to make desired The core portion (10) of the shape is exemplified. As the light for exposure, an active energy ray such as visible = may be used, or a particle beam such as a second line 4 electromagnetic wave or an electron beam may be used without using light. The refractive index of the portion irradiated with light is lowered, and a difference in refractive index is generated between the portion irradiated with the light. For example, the portion of the core layer 93 that is irradiated with light becomes the core portion of the portion where the coating is not irradiated (4). The rate is substantially the same as the refractive index of the cladding layers 91 and 92. Further, there is a case where the core portion 94 is formed by irradiating light with H 93 in a specific pattern and then applying heat to the core portion 94. By adding this heating step, Can:: step to increase the core part 94 with It is preferable that the cladding portion 95 has a difference in refractive index. Further, the principle and the like will be described in detail below. 33 201213360 As the pattern shape of the formed core portion 94, there is no J, and the shape is two: The shape, shape, and light type of the curved part: branch: the shape of the merged part or the intersection, the concentrating part (width: or the light diffusing part (the width is equal to the big eve but the eight knives; The shape or the like: = two or a combination of the two types of illumination patterns, and it is possible to easily form the core portion 94 of an arbitrary shape from the set light. The constituent materials and methods of the optical waveguide 9 are The formation layer of 94 and the conductor layer 51 and the conductor layer 52 which are bonded to the lower side of the optical waveguide 9 respectively carry the circuit of the above-mentioned bonding, and the shape of the upper surface is formed. The wiring of the bismuth alloy, Shao, Shao alloy, etc. are all 歹! Lifting copper, copper acne blush, this 禋 metal material 枓. The conductor layer 51, 52 is not limited, usually than 52 5~ 70 or so. '''', left and right, more preferably the conductor layers 51, 52 are, for example It can be formed by methods such as metallization of metal foil, (4), sputtering, etc. For conductors, gold can be used, for example, by button engraving, printing, shielding, etc. / Figure 2, in Figure 1, the light-emitting element 10 The pair of terminals t on the lower side has a hair first part (8) and a '„^ nine port P 01 between the terminals 103. If the terminal is energized, the light is emitted: 10=105. Element 4 I 01 illuminates. In addition to the other, the illuminating part of the illuminating part is composed of a single illuminating point, and is composed of a plurality of illuminating points, for example, '. As a set, there is a complex point called a... Two) two-point vacancies are arranged in a column shape (for example, two light-emitting lights) or a matrix (for example, nxm light-emitting points: 34 201213360 n, m is an integer of 2 or more), or a plurality of light-emitting points are irregular ( Random) configurator, etc. The light receiving element in the light receiving element 11 described below is the same. The light-emitting element 10 is mounted on the optical waveguide 9 such that its terminals 103 and 1〇5 are bonded (electrically connected) to specific portions of the conductor layer 52, respectively. The electric component (electronic circuit component) 12 is composed of, for example, a semiconductor component (semiconductor wafer). The function of the electric component 12 is not limited to the case of the circuit for driving the light-emitting element 1 . In Fig. 1, the electrical component 12 has two terminals 123, 125 on the lower side. The electrical component 12 is mounted on the optical wave by bonding (electrically connecting) a specific portion of the terminals 123 and 125 52 thereof: the gate: the component 1 and the electrical component 12 are made of the underfill material 4, etc. The terminals 103, 105, 123, and 125 are formed by the ejector element 10, the electrical component 12, and the fish portion, and the gap between the underfill material 4 and the guide 9 is not formed. . Further, the light-emitting element 10 and the electric device are as follows: the binary material 6 covers and closes the entire (outer surface). It is a structure in which the light-emitting element 12 is protected from contamination, damage, and oxygen enthalpy, so that reliability degradation can be protected, and the light (transmission light) of the underfill material 4 of the electronic component can be improved. The material constituting the penetrating self-illuminating portion 101 as an underfill material is preferably composed of a transparent material. The resin material, for example, may be a constituent material, preferably having insulating properties: cow epoxy resin, phenol resin, amine bismuth citrate 35 201213360 vinegar resin, polyimine resin, and the like. Further, as a constituent material of the sealing material 6, a resin material having an insulating property is preferable, and examples thereof include an epoxy resin, a phenol resin, a norbornene resin, and an anthracene resin. As shown by the circle 1, a plurality of through holes 8 penetrating through the thickness direction of the optical waveguide 9 are formed. Each of the through holes 8 is filled with a conductive material (for example, various metal materials such as copper, a copper alloy, or a bismuth alloy) to form a conductor post 81. The conductor layers 51 and the specific portions of the conductor layer 52 are electrically connected to each other via the conductor posts 81. That is, the energization of the light-emitting element 1A and the terminals 103, 1〇5, 123, and 125 of the electric component 12 can be performed via the conductor layer 51 on the lower surface side of the optical waveguide 9. Furthermore, the terminals 1〇5 and the terminals [Μ conduction] are connected to the ground side. The core portion 94 of the optical waveguide 9 is formed in a pattern shape in which the light-emitting portion 101 of the light-emitting element 10 is superimposed (that is, directly under the light-emitting portion ι ι) in a plan view (when viewed from above the figure i). The core portion 94 has a higher refractive index than the cladding portion 95, and has a higher refractive index for the cladding layers 91, 92. The covering layers 91 and 92 constitute a covering portion located at the lower portion and the upper portion of the core portion 94, respectively. According to the above configuration, the core portion 94 functions as a light guiding path that surrounds the entire circumference of the outer circumference in the cladding portion. The optical waveguide 9 has an optical path converting portion 96 that bends the optical path of the core portion 94. The optical path converting portion 96 is constituted by a reflecting surface (mirror) 961 that reflects at least a part of the transmitted light. The reflecting surface 961 is disposed at a position directly below the light emitting portion 1 〇 1 . The reflecting surface 961 is substantially 45 with respect to the optical path of the optical waveguide 9, that is, the long side 36 201213360 of the core portion 94. Tilt, top) function. More than half of the reflected transmission light (for example, 90% by the optical path conversion unit 96 described above)

A filling material for one of the optical waveguides 9. The square is the concave portion of the triangle of the bottom edge (the surface is vacant as the reflection surface 961. The reflection surface 96 is an example or a metal film (for example, an aluminum vapor deposition film), although not shown, the optical path conversion portion 96, especially the refractive index of the ytterbium Unlike the configuration in which the core portion 94 is different from the one shown in the figure, the reflecting surface 961 (optical path converting portion 96) is formed to extend across the mesa layer 93 and the cladding layer 92, or may be formed only in the core layer 93. In the optical waveguide structure, when the terminal 105 of the light-emitting element 1 is electrically connected via the conductor layer 51, the conductor post 81, and the conductor layer 52, the light-emitting portion 101 emits light, and the light emitted downward in FIG. The underfill material 4 and the cladding layer 92 are reflected by the reflecting surface 961 to be 90. The ridges are bent into the core portion 94 of the optical waveguide 9, and the cladding portion (the cladding layers 91, 92 and the side cladding portion) The interface of 95) is repeatedly reflected, and proceeds in the longitudinal direction (leftward direction in Fig. 1) in the core portion 94. Further, if the terminal 123 of the electric component 12 is via the conductor layer 51, the conductor post 81, and the conductor layer 52 When 125 is energized, the electrical component 12 can be driven. Furthermore, in Figure 1, the leftmost side of the figure The body column 81 and the core portion 94 are further shown, and the optical path of the core portion 94 does not interfere with the conductor post 81 in the front and rear directions of the paper surface of Fig. 1. <2nd embodiment: Fig. 2> 37 201213360 In the second embodiment, the second embodiment of the optical waveguide structure i of the present invention is described. Hereinafter, the optical waveguide structure 丨 will be described, and the same matters as those of the above-described third embodiment will be omitted, and the differences will be mainly In the optical waveguide structure 本 of the present embodiment, the configuration of the optical path conversion unit % is the same as the above, that is, the reflection surface (mirror) 961 constituting the optical path conversion unit % is located in the light-emitting portion. Directly below 1〇1, the reflecting surface 961 is formed across three layers of the cladding layer 91, the core layer 93, and the cladding layer 92. That is, the triangular recess of the optical path converting portion 96 is open to the lower surface of the optical waveguide 9. Further, the same as the above, the reflecting surface 961 may have a reflective film or a reflection increasing film such as a multilayer optical film or a metal thin film, and the concave portion of the optical path converting portion 96 may be filled with a filling material. Third embodiment Fig. 3 &gt; Fig. 3 shows a third implementation of the optical waveguide structure 1 of the present invention. Hereinafter, the optical waveguide structure i will be described, and the same matters as those of the above-described first embodiment will be omitted. The optical waveguide structure 1 of the present embodiment has a substrate 2, and the optical waveguide 9 is formed on the lower surface of the substrate 2 via the bonding layer 3. The substrate 2 is the same as the underfill 4 The ground is composed of a material (light-transmitting material that transmits light from the light-emitting portion 1〇1), which is substantially transparent material. Transparent substrate. As described in detail, the optical characteristics of the substrate 2 are preferably transmitted light. 38 201213360 - The transmittance is 8% or more, more preferably 90% or more, and still more preferably 95% or more. Since the substrate 2 has the above-described optical characteristics, the portion directly under the light-emitting portion ι ι of the substrate 2 constitutes the light-transmitting portion 21 that transmits the transmitted light. Similarly, the adhesive layer 3' is made of a material that substantially penetrates the transmitted light emitted from the light-emitting portion 1〇1, and is preferably made of a transparent material. Examples of the constituent material of the substrate 2 include a ring-and-loop resin, a phenolic tree, a bismuth bismuth quinone imine resin, a Shuangchuan butyl succinimide, a three-necked resin, a triazole resin, and a poly Cyanurate resin, polycyanate (Pycyanurate), succinyl butadiene resin, polyimide resin, polybenzopyrene resin, (tetra) ene resin, and the like. Further, the materials may be used singly or in combination of plural kinds. Further, the substrate 2 may be, for example, a fiber material such as a glass fiber or a resin fiber (woven fabric, non-woven fabric, woven fabric, or knitted fabric) impregnated with the resin material as described above (prepreg or the like) The glass-impregnated epoxy resin is called a glass epoxy substrate, and the above-mentioned one can be used as the substrate 2. The above-mentioned fiber-containing (four) substrate 2 has a high strength even when _ (four), and the thermal expansion rate is also low. Therefore, it is particularly advantageous when the optical waveguide 9 or the conductor layer (metal layer) is bonded to the substrate 2. The s and the substrate 2 may be a laminate of a plurality of layers, such as a resin material which is different in composition (type). The second layer of the first layer of the formed layer is laminated, and the layer (sheet) in which the resin material is impregnated into the fiber substrate and the layered layer composed of the resin material are formed. The layer structure of the laminate is of course not limited thereto. The thickness of the substrate 2 is not particularly limited, and is usually preferably about 5 〇 to 1.2 39 201213360 mm, more preferably ι 〇〇 6 〇〇 around the claw. 2 can be rigid or flexible ((4)e) λ may also have both a hard substrate and a substrate having a slidability. In this case, the optical waveguide 9 is formed on at least a hard substrate and a flexible substrate. A sheet (joined sheet) can be used as the adhesive layer 3, and examples of the constituent T material include an epoxy-based adhesive, an acrylic adhesive, and a phenol: A fat-based adhesive, a cyanic acid-acetate-based adhesive, a maleimide-yield, a ruthenium-based adhesive, etc. In particular, it is preferably made of a material having a reinforcing activity, such as an antioxidant or the like. Alternatively, the sheet 3 may be used as the adhesive layer 3, and the adhesive layer 3 may be formed on the lower surface of the substrate 2 or on the upper surface of the optical waveguide 9. The layer 3 may be formed by laminating two or more layers. It is not particularly limited, and is preferably about 5 to 15 Torr, more preferably about 10 to 70. The conductor layer 52 is formed on the substrate 2. In this case, a part of the conductor layer 52 is exposed to the sealing material. 6 is further outside. χ, the conductor layer 51 formed under the optical waveguide 9 and the above The conductor layer η of the embodiment is different from the 'wiring pattern. As shown in FIG. 3, two conductors 81 are provided through the optical waveguide 9, the subsequent layer 3, and the substrate 2, and the specific portions of the conductor layer 51 and the conductor layer 52 are mutually connected. The terminal 105 that turns on the light-emitting elements and the terminal 123 of the electric rolling element 12 are electrically connected via the conductor layer 51, the conductor post 81, and the conductor 40 201213360 body layer 52 via the lead 81, and are connected to the ground side. When the conductor layer 51 is further energized between the outer side of the sealing material 6 and the conductor layer 51 is electrically connected to the outside of the light-emitting portion 1 〇曰-, 6 and the conductor layer 52 of the other one is exposed, the electric drive can drive the electric In the optical waveguide structure of the present embodiment, when the conductors 81 and the conductor layer 52 are electrically connected to the terminals 1 〇 3 and (8) of the light-emitting element 1 则, (4) 1 〇 1 is lit, FIG. 3 The light emitted from the lower side of the middle is sequentially passed through the underfill material 4, the substrate 2. (the light-transmitting portion of the substrate 2), the adhesive layer 3 and the cladding layer 92, and is reflected by the reflecting surface 961 to be 90. Bending, entering the core portion 94 of the optical waveguide 9, and repeatedly reflecting at the interface with the cladding portion (the cladding layer 91, 92 and the side cladding portion 95) along the longitudinal direction thereof (left in FIG. 3) The direction) advances within the core portion 94. &lt;Fourth Embodiment: Fig. 4 &gt; Fig. 4 shows a fourth embodiment of the optical waveguide structure 1 of the present invention. The optical waveguide structure 1 will be described below, and the description of the same items as the above-described i-th and third-order cancers will be omitted, and the differences will be mainly described. The optical waveguide structure 1 of the present embodiment is the same as the above-described third embodiment except that the bonding layer 3 is not provided, the substrate 2 is directly bonded to the optical waveguide 9, and the configuration of the optical path converting portion 96 is different. Since the substrate 2 is directly bonded to the optical waveguide 9, the optical waveguide structure 1 is made thinner. The reflecting surface (mirror) 961 constituting the optical path converting portion 96 is located directly under the light-emitting portion 101, and the reflecting surface 961 is formed across the cladding layer 91, the core layer 93 201213360, and the cladding layer 92. In other words, the optical path converting portion 96 is formed by a concave portion having a triangular shape as a bottom side, and a reflecting surface 961 is formed on the inclined surface. The optical path converting portion 96 is provided adjacent to the substrate 2. Further, the same as the above, the reflecting surface 961 may have a reflecting film or a reflection increasing film such as a multilayer optical film or a metal film, and the concave portion of the optical path converting portion 96 may be filled with a filling material. In the optical waveguide structure 1 of the present embodiment, when the terminals 1〇3 and 1〇5 of the light-emitting element 1 are electrically connected via the conductor layer 5j, the conductor post 81, and the conductor layer 52, the light-emitting unit 101 emits light. The light emitted from the lower side of the middle and lower sides penetrates the underfill material 4 and the substrate 2 in sequence, and is reflected by the reflecting surface 961 to be 9 〇. The f-curve enters the core portion 94 of the optical waveguide 9 and is repeatedly reflected at the interface with the cladding portion (the cladding layer 9 j '92 and the lateral cladding portion 95) along the longitudinal direction thereof (Fig. 4 The center left direction) advances within the core portion 94. &lt;Fifth Embodiment: Fig. 5 &gt; Fig. 5 shows a fifth embodiment of the optical waveguide structure 1 of the present invention. Hereinafter, the optical waveguide structure 1 will be described, and the same matters as those of the above-described first and third embodiments will be omitted, and the differences will be mainly described. Other than the above, it is the same as the above-described third embodiment. In other words, the substrate 2 is adapted to have the transparency of transmitted light, and the through hole 22 penetrating the substrate 2 is formed at a position of the light-emitting portion 1 of the substrate 2. The through hole 22 is configured to transmit the light transmitting portion 21 that transmits light. In other words, the through hole 22 is a light guiding path for guiding light (passing) of the transmitted light in the thickness direction of the base 1. 42 201213360 Further, although not shown, the transmittance of the light to be filled in the inside (all or part of) of the through hole 22 may be 80% or more, preferably 9% or more, and more preferably 95% or more. Filling material for the material. Further, although not shown, a layer of a conductive material may be formed on the inner surface of the through hole 22 or the like, and in addition to having an optical transmission function, it also has a function of transmitting an electrical signal. In the optical waveguide structure 1 of the present embodiment, when the terminals ι 3 and 1 〇 5 of the light-emitting element 10 are electrically connected via the conductor layer 51, the conductor post 81, and the conductor layer 52, the light-emitting portion 101 emits light, and in FIG. The light emitted downward passes through the underfill material 4' through the through hole 22, penetrates the adhesive layer 3 and the cladding layer 92, and is reflected by the reflecting surface 961 to be 90. Bending, entering the core portion 94' of the optical waveguide 9 and repeating the reflection on one side of the interface with the cladding portion (the cladding layer 91, 92 and the side cladding portion 95) along the longitudinal direction thereof (left in Fig. 5) The direction) advances within the core portion 94. &lt;Sixth Embodiment: Fig. 6 &gt; Fig. 6 shows a sixth embodiment of the optical waveguide structure 1 of the present invention. The optical waveguide structure 1 will be described below, and the description of the same items as the above-described i, fourth, and fifth embodiments will be omitted, and the differences will be mainly described. The optical waveguide structure 1 of the present embodiment is replaced by the substrate 2 of the fifth embodiment in the optical waveguide structure 1 of the fourth embodiment. In other words, in the optical waveguide structure 1 of the present embodiment, the substrate 2 does not sufficiently have the transparency of transmitted light, and a through hole penetrating through the substrate 2 is formed at a position directly below the light-emitting portion 1 (the thickness direction of the substrate 2). Guide light path) 22. The through hole 22 constitutes the light transmitting portion 21. In the optical waveguide structure 1 of the present embodiment, when the conductors 103 and the conductor layer 52 are electrically connected to the terminals 103 and 105 of the light-emitting element 1A, the light-emitting portion 1〇1 is turned on. The light emitted from the lower side of the middle portion penetrates the underfill material 4, passes through the through hole 22, is reflected by the reflecting surface 961 and is bent at 90° into the core portion 94 of the optical waveguide 9, and the surface is covered with the cladding portion 91. The interface between the 92 and the side cladding portion 95) is repeatedly reflected, and advances in the core portion 94 along the longitudinal direction (the left direction in FIG. 6). &lt;Seventh Embodiment: Fig. 7 &gt; Fig. 7 shows a seventh embodiment of the optical waveguide structure 1 of the present invention, and the sixth embodiment of the optical waveguide structure 1 will be described. In the case of the same embodiment, the description thereof will be omitted, and the differences will be mainly described. In the light-emitting material structure of the present embodiment, the configuration of the light-transmitting portion ▲ (light-guiding path formed in the thickness direction) 21 of the substrate 2 is different from that of the fifth embodiment described above, and the other configuration is the same as that of the fifth embodiment. In other words, the core portion 24 is inserted into the through hole 22 formed at a position directly under the light-emitting portion (8) of the substrate 2, and the optical waveguide 23 is surrounded by the core portion 24. The vertical part to the material or the forming method of the outer peripheral cladding portion 25 may be: Γ22Τ"4 may also be used... 3=::: the true filling material is the same. . 5 or the same of the cladding layer 91 and the %. The optical waveguide junction conductor post 81 and the conductor layer cover right of the present embodiment are energized via the conductor layer 51, and the terminals (8) and 105 of the first 70 pieces are energized by 201213360. 101 emits light, and the light emitted downward in FIG. 7 penetrates the underfill material 4, passes through the core portion 24 of the vertical optical waveguide 23, penetrates the adhesive layer 3 and the cladding layer 92, and is reflected by the reflecting surface 961 to be 90. And entering the core portion 94 of the optical waveguide 9 and repeatedly reflecting on the interface with the cladding portion (the cladding layer 91, the % and the side cladding portion 95), along the longitudinal direction thereof (the left direction in FIG. 7) The eighth embodiment of the optical waveguide structure 本 of the present invention is shown in Fig. 8. The optical waveguide structure 1 will be described below. The description of the same matters as the above-described sixth embodiment and the sixth embodiment will be omitted. The optical waveguide structure 1 of the present embodiment is the optical waveguide structure 1 of the sixth embodiment. The configuration of the light guiding path formed in the thickness direction of the substrate 2 and the seventh In the through hole 22 formed at a position directly under the light-emitting portion 101 of the substrate 2, a core portion 24 and a cladding portion 25 surrounding the outer periphery of the core portion 24 are inserted. In the optical waveguide structure 1 of the present embodiment, when the conductors 5 and the conductor layer 52 are electrically connected to the terminals 1〇3 and 1〇5 of the light-emitting element 1A, the light is emitted. The portion 101 emits light, and the light emitted downward in FIG. 8 penetrates the underfill material 4, and is reflected by the reflecting surface 961 in the core portion 24 of the vertical optical waveguide 23 to be 90. Bending, entering the core portion 94 of the optical waveguide 9, on one side Repeatedly reflecting the interface with the cladding portion (the cladding layer 92 and the side cladding portion 95), and advancing along the longitudinal direction (leftward direction in Fig. 8) in the core portion 94 45 201213360 ^ &lt; Ninth Embodiment: Fig. 9 shows a ninth embodiment of the optical waveguide structure 1 of the present invention. The optical waveguide structure 1 will be described below, and the first and eighth embodiments will be described. The same matters are omitted, and the description is omitted, and the differences are mainly described. The optical waveguide structure 1 of the embodiment is the same as the eighth embodiment except that the lens portion 26 that condenses or diffuses the transmitted light is provided in the light transmitting portion 21, that is, the upper end surface of the vertical optical waveguide 23 The (incident side) is provided with a lens portion 26 composed of a convex lens (accurately, a plano-convex lens). Thereby, light emitted from the light-emitting portion 101 toward the lower side in FIG. 9 penetrates the underfill material 4, and is then condensed by the lens portion 26. The beam is concentrated by light, and the beam passes through the core portion 24 of the vertical optical waveguide 23, and is reflected by the reflecting surface 961 to be 90. Bending, entering the core portion 94 of the optical waveguide 9, along the longitudinal direction thereof (Fig. 9 in the left direction) advances in the core portion 94. By providing the above-described lens portion 26, sharper transmission light can be obtained, and more excellent light transmission characteristics can be obtained. Further, the lens portion 26 may be a person capable of diffusing and transmitting light. In this case, it is sufficient to use a concave lens. Further, the installation position of the lens portion 26 is not limited to the position shown in Fig. 9, and may be, for example, the middle or the lower portion of the light transmitting portion 21, or other portions, for example, the incident side end portion or the exit side end portion of the core portion 94. &lt;Tenth Embodiment: Fig. 1A&gt; Fig. 10 shows a first embodiment of the optical waveguide structure 本 of the present invention 46 201213360. In the following, the optical waveguide structure 1 will be described, and the description of the same matters as those in the first and second embodiments will be omitted, and the differences will be mainly described. A conductor layer 51 and a 52' conductor layer 51 and a conductor layer 52 of a specific pattern shape are bonded to the lower surface and the upper surface of the optical waveguide 9 formed by the cladding layers 91 and 92 and the core layer 93 therebetween. The specific portions are electrically connected to each other by the two conductor posts 81 formed through the optical waveguide 9. Further, two optical path conversion units 96a and 96b are formed in the optical waveguide 9. The optical path converting sections 96a and 96b respectively have the same reflecting surfaces 96la and 961b as described above. In the optical waveguide, the core portion 94 is formed on the left side of the relatively reflective surface "Η" of the core layer 93 and the right side of the reflective surface 961b is located in the right side of FIG. A portion other than the other portions of the Al and the 赝 93 is formed with a cladding portion 95. A wafer carrier (element) 13 is mounted on the upper portion of the optical waveguide 9. The wafer carrier 13 is provided with a substrate 2' and an optical waveguide different from the optical waveguide 9. 9 Optical element 10, light-receiving element u, conductor # is issued below, #f &quot; "潜54 55, and electrical component 12. The composition of the 4 carrier 13 is summarized in the armpit. 々 under the substrate 2 ′ is bonded to the core layer 93 between the cladding layer %, % and the like; ^ i &quot; to ... m optical waveguide 9, in the optical waveguide 9, the τ surface and the soil plate 2 The upper surface is joined to a specific pattern shape 55. The constituent materials, layers, and the like of the conductor layers 54 and 55 are the same as those of the conductor layers 51 and 52 described above. /, patterned square substrate 2' can be substantially transparent for rigid (rigid), medium-!**

S~ can also be a person with flexibility. 201213360 The specific portions of the conductor layer 54 and the conductor layer 55 are electrically connected to each other by the four conductor posts 82 formed through the substrate 2 and the optical waveguide 9'. Further, four optical path converting portions 96c, 96d, 96e, and 96f are formed in the optical waveguide 9'. The optical path converting portions 96c, 96d, 96e, and 96f respectively have the same reflecting surfaces 961c, 961d, 961e, and 961f as described above. In the optical waveguide 9', a portion 94 between the reflecting surface 961c of the core layer 93 and the reflecting surface 961d and a portion between the reflecting surface 96le and the reflecting surface 961f form a core portion 94 outside the core layer 93. Forming the cladding portion 95 ° An electrical component (semiconductor component) 12 having four terminals 123, 125, 127, and 12 is mounted on the upper portion of the substrate 2'. The electric component 12 is mounted on the substrate such that the pairs (1), 125, m, and 129 are in contact with each other (electrically connected) to a specific portion of the conductor layer 55. The function of the electric component 12 is not particularly limited, and as an example, a circuit constituting the light-emitting element 10 can be cited. Further, the electric component 12 may further have a function (circuit) for processing an electric signal output from the light receiving element 11 such as an increase in a signal. The above-mentioned electric component 12 is covered by the same closing material 61 as the above-mentioned sealing material 6, and is closed (outer surface). 2 The light-emitting element 1 () and the light-receiving element are mounted on the lower part of the optical waveguide 9! The light 7L member 1 is the same as the above-mentioned phase A丄-. Further, the first member 11 has the light portion 111 and the pair of children 113 and 115 in the above example. The light receiving portion 111 is located between M - ^ I of the terminal u3 and the terminal 115. 4 The light-receiving unit ill receives light (the light is transmitted by the illuminating light, and the potential difference is generated between the scorpions 113 and 115, and 48 201213360 outputs an electrical signal. The light-emitting element 10 is connected to the conductors 54 and 154, respectively. The specific portion is bonded (electrically connected) to the optical waveguide 9. The light-receiving element 11 is mounted on the optical waveguide such that the terminals 113 and U5 are connected (electrically connected) to specific portions of the conductor i 54 . &lt; The lower light-emitting element 10 and the light-receiving element 11 are closed by the underfill material 4 to the upper portions of the terminals 103, 105, 113, 115 including the same, and the light-emitting element 10 and the light-receiving element are covered by the two closed materials 6 The whole body (outer surface) of the optical waveguide 9'. The core portion 94 of the optical waveguide 9' overlaps with the light-emitting portion 1〇1 of the light-emitting element 10 and is received by the light-receiving element 1 in a plan view (when viewed from above the figure). The portion 111 is formed by overlapping (i.e., directly above the light-emitting portion 1〇1 and directly above the a and the portion 111). The 'reflecting surface 961d is disposed at the position of the light-emitting portion, and is reflected. Face 96le is set at Immediately above the light portion 111, the position of the class is 10,000, the reflecting surface 961c is disposed at a position directly above the reflecting surface 961a, and the β 6+ centering surface reflecting surface 961 f is disposed directly above the reflecting surface 961b. The wafer carrier 13 is electrically connected to a specific portion of the conductor layer a and the conductor layer 54 by solder (solder balls) 7 and mounted on the optical waveguide 9 θ. In this case, the 'optical waveguides 9 and 9' are connected. It is closed by the same underfill material 41 as the underfill material *. One portion of the conductor layer 52 is closed by the underfill material 41, and a portion of the conductor layer 52 is not enclosed by the underfill material 41 to be exposed to the outside 49 In the optical waveguide structure 1 of the present embodiment, when the terminals 103 and 105 of the light-emitting element 10 are energized, the light-emitting portion 1 〇1 emits light, and the light emitted upward in FIG. 10 penetrates the underfill material 4 The core portion 94 enters the optical waveguide 9 and is reflected by the reflecting surface 96Id to enter the optical waveguide 9, and advances in the core portion 94 along the longitudinal direction thereof (the middle left direction of FIG. 1), and then stands from the core portion 94. And the part of the transmitted light passes through the reflecting surface 9 6 1 c reflection is 90. The curved portion penetrates the underfill material 41 and the cladding layer 92 downward, and is reflected by the reflecting surface 961a to be bent at 90°, and enters the core portion 94 of the optical waveguide 9 along the longitudinal direction thereof ( Fig. 1 左 center left direction) advances in the core portion 94. On the other hand, the light entering the core portion 94 from the right side in Fig. 1 of the optical waveguide 9 is along the longitudinal direction (left direction in Fig. 10) at the core portion. Advancing in 94, it is reflected by the reflecting surface 96!b to be 90. Bending, penetrating the coating layer % and the underfill material 41 upward, and reflecting 9 经 through the reflecting surface 96lf. The core portion 94, which is bent and enters the optical waveguide 9, advances in the core portion 94 along the longitudinal direction thereof (the left direction in Fig. 1A). Further, the wheel light is reflected by the reflecting surface 96le as the material 4, and the light receiving portion 111 receives a potential difference to output an electrical signal. 'After the end of the core portion 94, the 9'° bend' penetrates the underfill to the bottom. Thereby, it is produced between the terminals 113 and ιι5. The eleventh embodiment: Fig. 1 shows the state of the invention in the figure. Hereinafter, the sixth embodiment and the first embodiment of the optical waveguide structure will be mainly described. 1 &gt; The eleventh embodiment 1 of the optical waveguide structure 1 will be described, and the description of the items ith and the above will be omitted, and the cladding layers 91, 92 and the substrate are bonded to the lower surface of the substrate 2 with a difference of 50 201213360. The optical waveguide 9 composed of the core layer 93 between the electrodes is bonded to the conductor layer 52 of a specific pattern shape on the upper surface of the substrate 2. Further, two optical path converting portions 96a and 96b are formed in the optical waveguide 9. The optical path conversion units 96a and 96b have the same configuration as the optical path conversion unit 96 of the fourth, eighth, and ninth embodiments, and have the same reflection surfaces 961a and 961b as described above. In the optical waveguide 9, the lower reflecting surface 96u of the core layer 93 is located on the left side in FIG. 11, and the portion of the reflecting surface 961b located on the right side in the drawing u forms a core portion 94' to be covered in a portion other than the core layer 93. Department 95. The substrate 2 is insufficiently transmitted to transmit light (transparency), and a through substrate is formed at a position directly above the reflection surfaces 961a and 961b of the substrate 2 (positions directly below the reflection surfaces 96ic and 6 1 f). 2 through the hole Μ. The through holes 22 constitute a light transmitting portion 21 that transmits light. In other words, the through holes 22 serve as light guiding paths for guiding (transmitting) the transmitted light in the thickness direction of the second layer. Further, the lens portion 26β of the ninth embodiment is provided on the upper portion of the two through-holes 22 (light-transmitting portions 21). For example, in the through-hole 22, a transparent material having a relatively low refractive index is filled. Forming a curved concave surface thereon, and filling the concave surface with a transparent second resin material having a higher refractive index than the second resin material, thereby forming the second resin material = playing a convex lens (flat convex lens, double convex The lens of the function of the material is not limited thereto, and only a convex shovel (a plano-convex lens, a lenticular lens, or the like) may be provided in the through hole 22. Brother 51 201213360 26 In the middle or lower, the position of the lens portion of the through hole 22 (light transmitting portion 21) is not limited to the upper portion as shown in the drawing, and may be the through hole U portion. Further, although not shown, a material having a transmission light transmittance of 8% or more, preferably (four) or more, more preferably 95% or more may be filled in the inside (all or part) of the through hole 22. Filling material. Further, in the same manner as in the seventh and eighth embodiments described above, the optical waveguide 23 may be formed inside the through hole 22. A wafer carrier (element) 13 similar to that of the above-described first embodiment is mounted on the upper portion of the optical waveguide 9 of the substrate 2 described above. In the optical waveguide structure i of the present embodiment, when the terminals 103 and 105 of the light-emitting element are energized, the light-emitting portion 1〇1 emits light, and the light emitted upward in the drawing u penetrates the underfill material 4, and The reflecting surface 96 1 d reflects 90 degrees. The core portion 94, which is bent and enters the optical waveguide 9, advances in the core portion 94 along the longitudinal direction thereof (the left direction in Fig. u). Further, the transmitted light emitted from the end portion of the core portion 94 is reflected by the reflecting surface 961c to be 90. Bending, penetrating the underfill material 41 downward, condenses light through the lens portion 26 to concentrate its beam, and the light beam passes through the through hole 22, is reflected by the reflecting surface 961a and is bent at 90°, and enters the optical waveguide 9 The core portion 94 advances in the core portion 94 along the longitudinal direction thereof (the left direction in Fig. 11). On the other hand, light entering the core portion 94 from the right side in Fig. 11 of the optical waveguide 9 advances in the core portion 94 along the longitudinal direction thereof (left direction in Fig. 11), and is reflected by the reflecting surface 961b to be bent at 90°. The light passes through the through hole 22 and is concentrated by the lens portion 26 to concentrate the beam thereof. The light beam penetrates the bottom portion 52 201213360 filling material 41 and is reflected by the reflecting surface 961f to be 9 inches. The core portion 94 of the singularity 9 is along the longitudinal direction of the cymbal (the left chord of the figure, and enters the optical waveguide 94. Further, the light beam from the core portion is directed to the core portion) passes through the reflecting surface 961e. The reflection is 9 inches. The light is transmitted and transmitted (the light is received by the light-receiving portion 4 via the poly-portion material 4, and the electric potential is generated by the potential difference between the terminals 113 and 115 by the bottom of the II.) <Twelfth Embodiment: Fig. 12 &gt And FIG. 12 shows the η implementation of the optical waveguide structure of the present invention. Hereinafter, the optical waveguide structure is merged into the same structure as the above-described 苐1 embodiment. Fig. 12 is a plan view of an optical waveguide structure! Fig. 12 shows an optical waveguide 9 having an optical path conversion portion (optical waveguide structure 1) The branch portion 941 having the core portion 94 branched in the right-angle direction in the middle of the core portion 94. The core portion 942 is formed from the branch portion 941 toward the lower side in Fig. 12. Further, the branch portion 941 is formed to penetrate the optical waveguide 9 in the thickness direction. The through hole 943 has a triangular shape in plan view, and one side is formed by forming an angle (inclination angle) of 45 with respect to the axis of the core portion 94 and the axis of the core portion 942, respectively. Making the core 94 The optical path conversion portion of the optical path curvature functions. That is, the edge is a reflection surface 944 that is partially reflected by the light transmitted from the core portion 94. On the other hand, the remaining side and the core portion of the two sides The axis of 94 is parallel, and the remaining one side is parallel to the axis of the core portion 942. The reflecting surface 944' reflects a portion of the transmitted light from the right side of FIG. 12 to the left side into the core portion 94 53 201213360, and changes the traveling direction to the lower side. Further, the transmitted light that is not reflected by the reflecting surface 944 is linearly advanced in the branch portion gw. Thus, in the branch portion 941, the transmitted light can be branched into two strands. ▲ Further, the reflecting surface 944 can have, for example, a reflective film or a reflective film of a multilayer optical film or a metal film (for example, a neodymium film). Further, although not shown, the through hole 943 may be filled with a filler, in particular, a refractive index and a core portion 94 or a core portion. 942. Different filling materials. Here, when the filling material is not filled in the through hole 943, there is usually a space 1. The reflecting surface 944 is based on the difference between the refractive index of the core portion 94 or the core portion 942 and the refractive index of the air. Nuclear The optical path bender of the portion 94 or the core state. Since the difference between the photosensitive resin composition used in the present invention and the air (four) is relatively A, the allowable range of the angle of total reflection of the reflection s 944 ^ is relatively large. Therefore, by the Snell's law, the tilt angle of the reflection® 944 can be set to an angle at which the light propagating in the core portion % or the core portion 942 is totally reflected. As a result, the reflection accompanying the reflecting surface 944 can be suppressed. The attenuation of the light suppresses the decrease in the light propagation efficiency. Further, the ratio of the transmitted light that branches downward in the branch portion 94'' to the lower portion and the transmitted light that is straightly advanced in the branch portion' is based on the reflecting surface 944 at the core portion 94. The projection image in the case of the direction projection (hereinafter referred to as "reflection of the projection image of the φ state") and the weight φ of the cross section of the core portion 94 vary. Specifically, as long as the projection image of the reflecting surface 944 does not completely cover the cross section of the core portion 94, the branching portion 941 can perform branching of the transmitted light. That is, as long as the overlapping area of the cross-sectional view of the reflecting surface _ and the core portion 94 is smaller than the cross-sectional area of the core portion 94, it may be generated that the branch is not branched and the line is transmitted before the line 54 201213360, Therefore, it is possible to branch at the branch portion 94. , 944 cast image and core section 94 of the cross-section of the heavy borrowing Qiu 94 搀 搀 丨 丨 扯 复 复 复 复 相对 相对 相对 相对 相对 邛 邛 邛 邛 邛 邛 邛 邛 邛 邛 邛 邛 邛 邛 邛 邛 邛 邛 邛 邛 邛 邛 邛 邛 邛 邛 邛 邛 邛 邛As described above, the branching ratio of the branching portion 941 can be set only by setting the area of the through hole 943, and the branching portion 941 can be easily formed. 13 and 14 are plan views showing a twelfth embodiment. The reflecting surface 944 shown in Fig. U is constructed such that its projection image completely covers the cross section of the core portion 94, and the cross-sectional area of the core portion % and the projection image of the reflecting surface 944 and the horizontal portion of the core portion 94 The repeat area of the section is the same. Therefore, all of the transmitted light passing through the core portion 94 at the branch portion 941' shown in Fig. 反射 is reflected by the reflecting surface 944. Further, the core portion 94 shown in Fig. 13 has a widened portion 945 at the branch portion 94. In the widened portion 945, the outer portion of the core portion 94 is expanded by the through hole 943. Specifically, when the widening portion 945 assumes an extension line (outer portion extension line) s of the outer contour of the core portion 94, both end portions of the reflecting surface 944 in the oblique direction are located outside the extension line $. Thereby, the transmission efficiency of the transmitted light of the reflecting surface 944 can be more surely improved for the transmitted light passing through the core portion 94. Further, in this case, in the reflecting surface 944, the vicinity of both end portions in the oblique direction in which the surface precision is low does not contribute to the reflection of the transmitted light, and the transmitted light is reflected in the vicinity of the center having a high surface precision. Therefore, the accuracy of the reflection angle is also increased, and the unnecessary reflection can be suppressed. As a result, it is possible to greatly reduce the leakage of a part of the transmitted light reflected at an unnecessary angle to the covering portion 95. Further, in the reflection surface 944, in the reflection surface 944, when the through hole 943 is formed in the vicinity of both end portions in the slope direction, there is a possibility that the processing accuracy is not lowered, the surface roughness is increased, or the inclination angle of the reflection surface 944 is deviated from the target angle. That is, it is effective to provide the above-described widening portion 945 from the viewpoint of preventing a decrease in transmission efficiency. On the other hand, the core portion 94 shown in Fig. 14 also has the same as the widened portion 945 shown in Fig. 13. The reflecting surface 944 shown in Fig. 14 is constructed such that its projected image covers a portion of the cross section of the core portion 94. With respect to the transmitted light passing through the core portion 94, a portion of the projected image of the reflecting surface 9 and the cross section of the core portion 94 are reflected, and the remaining transmitted light is linearly advanced in this state without being reflected. Therefore, in the branch portion 941 shown in Fig. 14, the transmitted light passing through the core portion 94 can be branched into two strands. Further, in the widened portion 945 shown in Fig. 14, the extension line S of the outline of the core portion 94 is assumed, and one of the both end portions of the inclined surface of the reflecting surface 944 is located outside the extending line s. In this case, as in the case of the above-described FIG. 13, in the reflection surface 944, the vicinity of both end portions of one of the slope directions having a low surface precision does not contribute to the reflection of the transmitted light, mainly in the vicinity of the center having a high surface precision. Reflected transmission of light. Therefore, the accuracy of the reflection angle is also increased, and the unwanted reflection can be suppressed. As a result, it is possible to greatly reduce the occurrence of leakage of one of the reflected light to the covering portion 95. In the above-described first embodiment, the case where the light is reflected by one reflecting surface 944 is described, and the two or more reflecting surfaces 944 may reflect the transmitted light. &lt;Third Embodiment 3: Fig. 15 &gt; Fig. 15 shows a thirteenth embodiment of the optical waveguide structure 1 of the present invention. The optical waveguide structure 1 will be described below, and the description of the same matters as those of the above-described first embodiment and the like will be omitted, and the differences will be mainly described. Fig. 15 is a perspective view of the optical waveguide structure 1. In the optical waveguide 9 (optical waveguide structure 1) having the optical path conversion portion shown in Fig. 15, the core portion % is interrupted at its end by the interruption portion 946 and the cladding portion 95 located on the side of the core portion 94. - Body. Further, by removing a portion of the interrupted portion 946 of the core layer 93 and a portion of each of the cladding layers 9A, 92 on both sides thereof, a triangular recess having a side of the cladding layer 91 as a base is formed. The width of the concave portion is set to be equal to or larger than the width of the core portion 94. Further, one of the two faces corresponding to the oblique side of the concave portion serves as the reflecting surface 961. The reflecting surface 961 is composed of an exposed surface of the coating layer 91, an exposed surface of the interruption portion 946, and an exposed surface of the coating layer 92. Since these exposed surfaces are formed by processing a coating material, when the reflection is formed from 961 t, it is difficult to cause a difference in the processing rate at the time of processing. Therefore, it is difficult to cause processing unevenness, and a reflection having high smoothness is formed. Face 961. When the smoothness of the reflecting surface 96 is changed, the surface accuracy and optical characteristics of the reflecting surface 961 can be improved, so that the reflecting surface can prevent a decrease in transmission efficiency at the time of optical path switching. On the other hand, if the reflecting surface 961 includes the exposed surface of the core portion 94, the difference between the core material and the covering material is easy to occur, and the surface unevenness and optical characteristics of the processing unevenness 'reflection φ 961 are generated.降低In the two sides of the oblique side of the concave portion, the reflecting surface 96丨 may have a function as a reflecting surface on the outside. 57 201213360 &lt;Fourth embodiment: Fig. 2〇&gt; The optical waveguide structure ι〇〇ι of the present invention includes a substrate 1〇〇2, an optical waveguide 1〇〇9 disposed adjacent to the substrate 1002, and conductor layers 1051 and 1〇52 respectively bonded to both surfaces of the optical waveguide 1009. The optical path conversion portion 96 that bends the optical path is an optical path conversion portion 96 that is bonded to the upper surface of the substrate 1002, the light-emitting element 101A, and the electrical element 1〇12. As a constituent material of the substrate 1002, for example, (4) Fat, double-butadiene diamine resin, double-m-butylene bismuth well, &quot;:, 3. Resin, uric acid vinegar resin, poly-cyanuric acid vinegar resin, benzene% butene resin, polyfluorene Resins such as imine, polybenzoic resin, and olefin resin Or a semiconductor material such as germanium, gallium-arsenic, indium-phosphorus, antimony, antimony carbide, antimony or the like. X' these materials may be used singly or in combination of plural kinds. Further, the substrate 1002 may be, for example, A fiber base material (woven fabric, non-woven fabric, woven fabric, knitted fabric, or the like) such as glass fiber or resin fiber is impregnated with the above-mentioned resin material (prepreg or the like). For example, the glass cloth is impregnated with a lyophilized resin. The glass epoxy group can be used as the substrate 1002. The substrate 1〇〇2 of the fiber-containing substrate is relatively thin, the strength is still relatively high, and the thermal expansion rate is low. It is particularly advantageous when the optical waveguide 1009 or the conductor layer (metal layer) 4 is bonded to the substrate 1 〇〇 2. Further, the substrate 1002 may be a laminated body of a plurality of layers. For example, a resin having a different composition (type) may be mentioned. A layer formed by laminating the first layer and the second layer of the material, and a layer (sheet) obtained by impregnating the fiber substrate with a resin material and a layer composed of a resin material. 58 201213360, the layer composition of the layer However, not limited to the thickness of the substrate is not particularly limited 10G2, it is generally preferred as "about, more preferably 5〇~6〇〇 &quot;. Left paw. The substrate ship can be rigid or can be made

We). Further, it may have both a rigid substrate and a flexible substrate. In this case, the optical waveguide hall may be formed on at least one of the hard substrate and the flexible substrate, or may be formed by averaging the optical waveguide on the lower surface of the substrate (10) 2. The optical waveguide 1〇〇9 is formed by sequentially laminating the cladding layer 1Q9i, n丨zhou and the cladding layer 1〇92 from the lower side in FIG. 20, and forms a core portion of the specific pattern 1〇94 and the package in the core layer (10)3. Cover 1095. The refractive index of the core portion 1094 is higher than that of the cladding portion 1〇95, and the refractive index of the cladding layers 1091 and 1092 is also high. The cladding layers 1〇91 and &quot;Μ are formed under the shirts β L_ below the core portion 1094, respectively.卩 and the upper cladding. According to the above configuration, the core portion 10 9 functions as an optical path of the transmitted light 1 0 18 surrounded by the entire circumference of the outer periphery. In Figure 2. In the configuration shown, it is difficult for the core layer (10) to form a core portion at a portion on the left side in Fig. 2A from the reflection surface 1961, and a cladding portion 1〇95 is formed in a portion other than the core layer 1093. The constituent material of the core layer may be a material which is irradiated with active radiation (active energy ray, electron beam or xenon ray) or whose refractive index is changed by further heating. As a preferable example of the above-mentioned material, a resin composition containing a benzene cyclobutene-based polymer or a cycloolefin-based resin such as a olefin-based polymer (resin) 59 201213360 is used as a main material, and it is particularly preferable to contain a lowering agent. A terpene polymer (as a main material). The core layer 1093 composed of the above-described materials is excellent in the property of deformation such as bending, and in particular, even in the case of repeated bending deformation, it is difficult to cause peeling of the core portion 1094 and the covering portion 1095, or the core layer 1〇93 Peeling between the layers of the adjacent layers (cladding layers 1〇91, 1092) prevents microcracking in the core portion 1094 or in the cladding portion 095. As a result, the optical transmission performance of the optical waveguide 1009 can be maintained, and the optical waveguide excellent in durability can be obtained. In, million? Additives such as bismuth agent, refractive index modifier, plasticizer, tackifier, reinforcing agent, sensitizer, leveling agent, antifoaming agent, adhesion aid and flame retardant. The addition of the antioxidant has an effect of improving high-temperature stability, improvement in weather resistance, and suppression of photo-deterioration. As the antioxidant, for example, a single-demand system, a =-system, or the like, or an aromatic amine-based one can be mentioned. Further, by adding a plasticizer, a tackifier, and a reinforcing agent, the resistance to f can be further increased. The content of the additive represented by the additive (in total, when ^ is the total), and the composition of the core layer as a whole, the comparison: ~40% by weight or so, more preferably 3~3. About weight%. If the 乂-乂 ’ does not fully utilize the function of the additive, it is generated in the core i depending on the type or characteristics of the additive. Second pass 2 first (transmission A 1G18) penetration (four) reduction: instability and so on. _ Poor tea, refractive index as the core layer 10 9 3 open ^ Zhan ancient, soil -, ώ 70% of the method, can be cited as coating method 涂 coating 60 201213360 'clothing' can be cited for coating core layer formation A method of hardening (curing) a composition (varnish or the like), a method of applying a curable monomer composition, and hardening (curing). Further, a method other than the coating method, for example, a method of joining separately produced sheets may be employed. The core portion 1094 of the desired shape is patterned by using the mask 'to selectively extract the core layer 1 〇 9 3 obtained in the above manner, and to emit active radiation'. Examples of the active radiation used for exposure include active energy rays such as visible light, ultraviolet light, infrared light, and laser light, electron beams, xenon rays, and the like. The electron beam can be irradiated, for example, at an irradiation dose of about 50 to 2 〇〇〇 KGy. In the core layer 1093, the refractive index of the portion irradiated with the active radiation changes (according to the material of the core layer 丨〇93, the case where the refractive index is increased and decreased), and the portion irradiated with the active radiation The difference in refractive index is produced. For example, the portion of the core layer 1〇93 irradiated with the active radiation becomes the cladding portion 1095, and the portion not irradiated becomes the core portion 1〇94. Also, there is a contradiction. The refractive index of the cladding portion 1095 is substantially equal to the refractive indices of the cladding layers 1091, 1092. Further, there is a case where the core layer 1093 is irradiated with active radiation in a specific pattern and then heated in order to form the core portion 1 (four). It is preferable that the heating step of the ❹ &amp; heating step can further increase the refractive index difference between the core portion 1094 and the cladding portion 1 〇 95. Further, 'this principle and the like' will be described in detail below. * The pattern shape of the core portion 1094 formed by the material is not particularly limited = ': linear, with the shape of the f-curved portion, the profiled shape, the branching portion having the optical path or the shape of the intersection, and the condensing Any one of the parts (the portion where the width is reduced by 61, 201213360), the portion where the light is diffused (the portion where the width is increased, etc.), or the shape of the two or more types in which the order is combined. The present invention is characterized in that the nucleus ridge portion 1094 of an arbitrary shape can be easily formed by setting the irradiation pattern of the active radiation. The constituent materials of the respective portions of the optical waveguide 1009 and the method of forming the core portion 1094 will be described in detail below. The conductor layer 1052 which is bonded to the lower surface of the optical waveguide 9 and the conductor layer 102 which is bonded to the upper surface of the substrate 1002 are rounded into a specific shape. 'And constitute the desired wiring or circuit. Examples of the constituent material of the conductor layers 1 to 51 to 1053 include copper, a copper alloy, aluminum, an aluminum alloy, and the like.

The rabbit is a scorpion. Conductor layer 1051 ~ "thickness is not specified, usually preferably about 3~m _, preferably 5~70 &quot;ni around Q metal it layer: 51~(9)3 is bonded by metal Then, Γ〇5 1 can be used, for example, (4) 'printing, masking, etc. can be used. The element 1010 has a light-emitting portion ιι and a pair of terminals 1103 '11 〇5 on its lower side. Luminous neighbor 1] 〇] You recognize the mountain x, the door. 1 ☆ The first time °P 1101 is located at the terminal _ and the terminal 1105 θ 2: while the sub-1103, 1105 is energized, the light-emitting portion 1101 emits light. Furthermore, the light-emitting element 1〇1〇

Pfc ^ ^ Μ . In addition to the number of light-emitting points composed of one light-emitting point, there are a plurality of light-emitting points. As a set, the complex point is (10):; the light-emitting points are arranged in a column shape (for example, the number of Μ), or a plurality of light-emitting points are irregularly 62 201213360 : (random) configurator or the like. The light receiving unit of the light receiving element described below is also the same. The light-emitting element 1〇1〇 is implanted on the substrate 1002 so that the terminals 11〇3 and 1105 thereof are joined (electrically connected) to the portions 1531 and 1532 of the conductor layer 1053, respectively. The electrical component (electronic circuit component) 1012 is composed of, for example, a semiconductor component (a semiconductor wafer). The function of the electric component 1012 is not particularly limited, and as an example, a circuit constituting the light-emitting element 1〇1〇 can be cited. The electric component 1 〇 12 has two terminals 1123 and 1 丨 25 on the lower side thereof. The electric component 1012 is mounted on the optical waveguide 1009 such that the terminals 1123 and 1125 thereof are joined (electrically connected) to the portions 1532 and 1533 of the conductor layer 1053, respectively. The light-emitting element 1010 and the electrical component 1012 are closed by the underfill material 1004 to the terminals 11〇3, 11〇5, ιΐ23' &quot; Thereby, a gap portion is not formed between the light-emitting element 1〇1〇 and the electric element 1〇12 and the optical waveguide W09, and is closed by the underfill material 1〇〇4. In the light-emitting element 1010 and the electrical component 1〇12, the whole (outer surface) is closed by the sealing material 1〇〇6. In this way, the light-emitting element 1〇1〇 and the electrical component 1〇12 are entirely enclosed, and in particular, the light-emitting portion 11〇1 is not exposed to the outer portion 4 and is closed, so that it can be protected from contamination, damage, oxidation. Deterioration 4' helps to improve the reliability of electronic components. The underfill material 004 is composed of a material that substantially penetrates the light (transmission light 1〇18) emitted from the light-emitting portion 11〇1, and is preferably made of transparent. The constituent material of the underfill material 1_ is preferably a resin material having an insulating property of 2012 20126060, and examples thereof include an epoxy resin, a phenol resin, a urethane resin, and a polyimide resin. Further, as a constituent material of the sealing material 1 006, a resin material having an insulating property is preferable, and examples thereof include an epoxy resin, a phenol resin, a decylene resin, and an anthracene resin. As shown in Fig. 20, a through hole or via hole 1008 penetrating in the thickness direction is formed in the optical waveguide 1〇〇9. The through hole 1008 is filled with a conductive material (for example, various metal materials such as copper or copper alloy 'aluminum, aluminum alloy, and the like) to form a conductor post (conductor portion) 1〇81. The conductor layer 1051 and the specific portion of the conductor layer ι 52 are electrically connected to each other via the conductor post 1081. That is, the energization of each of the light-emitting element 1〇1〇 and the electrical element 1〇12 can be performed by the conductor layer 1〇51 on the lower surface side of the optical waveguide 1009 and the conductor layer 1〇53 on the upper surface side of the substrate 1002 ( The parts 1531, 1533) are carried out. Further, the terminal 1105 is electrically connected to the terminal 1123, and the terminals are connected to the ground side. The optical waveguide 1009 has an optical path conversion portion 1096 that bends the optical path of the core portion 1094. The optical path converting portion 1〇96 is provided at a portion where the core portion 194 is connected to the light guiding portion 1024, that is, the connecting portion of the light guiding path 1024, that is, the right end portion of the core portion 1A, 94, and the lower end portion of the light guiding path 1024. Thereby, the optical path can be effectively and surely bent. The holographic path conversion unit 1096 is constituted by a reflection surface (mirror) 1961 that reflects at least a part of the transmitted light 1 〇 18. The reflecting surface 1961 is disposed at a position directly below the light emitting portion 1101. The optical path of the reflecting surface 1961 with respect to the optical waveguide 1009, that is, the longitudinal direction of the core portion 1〇94 64 201213360 is substantially 45. It has a function of reflecting half of the transmitted light 1〇18 (for example, 90% or more). The optical path conversion unit 1096 removes (defects) a part of the optical waveguide 1〇〇9, for example, a concave portion having a triangular cross section, and a tilted surface thereof is used as the reflecting surface 1961. The reflecting surface 1961 may have, for example, a reflective film or a reflection-increasing film such as a multi-layer optical film or a metal film (e.g., an aluminum vapor-deposited film). Further, although not shown, the concave portion of the optical path converting portion 1A 96 may be filled with a filling material having a light transmissive property to the transmitted light 1 〇 18. In the configuration shown in the figure, the reflecting surface 1961 (optical path converting portion 丨〇96) is formed across the cladding layer 1091, the core layer 1〇93, and the cladding layer 〇92, or may be formed only in the core layer 1093. . Also, mirror parts such as cymbals, specular mirrors, 矽 mirrors, etc. can be used. A through hole 1〇22 penetrating through the substrate 1002 is formed at a position directly below the light emitting portion U01 of the substrate 1002. The cross-sectional shape of the through-holes 1 to 22 is not particularly limited, and is circular in the present embodiment (see FIG. 25). Examples of other shapes include a grooved circle, an oblong shape, a rectangular shape (a square shape), and a hexagonal shape. A layer (conductor portion 1〇〇3) composed of a conductive material (metal material) similar to the conductor layer 1〇5&quot; is formed on the inner circumferential surface of the through hole 1022. By the material portion 1003, An electric signal or the like can be transmitted in the thickness direction of the substrate (hereinafter also referred to as "thickness direction"). Further, in the figure, the conductor portion 1003 is spread over the entire circumference of the inner circumferential surface of the through hole 1 22b ( It is formed in a ring shape, and may be partially formed in the circumferential direction. Further, the conductor portion 1003 is formed substantially perpendicularly to the substrate 1〇〇2. 65 201213360 However, the present invention is not limited thereto, and the conductor is a hip. The substrate 1002 is formed to be inclined at a specific angle, or the conductor has a body. The P 1003 may be deformed (bending, bending, branching, etc.). As a method of forming the conductor portion 1003, for example, a through hole may be used. Within 1022 Bonding (subsequent) gold W method, a method of forming a metal layer by a method such as vapor deposition or sputtering of a metal ore on the inner surface of the through hole 1022, and applying a metal paste containing a metal filler to perform a force 4 (baking) a method of forming a metal layer, etc. The upper end portion of the conductor portion 1003 is electrically connected to the portion 1532 of the conductor layer 1053. The lower end portion of the conductor portion aw is electrically connected to a specific portion of the conductor layer 1G52. Thereby, the conductor portion can be connected. 1〇〇3, an electrical signal is transmitted between the conductor layers 1052 and 1053 formed at different positions in the thickness direction. Further, a portion of the through hole 1022 that is further inside than the conductor portion 1〇〇3 is configured to transmit light 1G18. The light transmissive portion, that is, the portion is a light guiding path 1024 for guiding (transmitting) the transmitted light 1〇18 in the thickness direction of the substrate 1002. In other words, the conductor portion 1〇〇3 surrounds the light guiding path. The periphery of 1〇24 is formed. Thereby, the light guiding path ι 24 and the conductor portion 1〇〇3 can be effectively disposed in the through hole 1022 of the limited size (inner diameter). Further, the light guiding path 1024 is opposed to The substrate 1002 is formed substantially vertically. However, The present invention is not limited thereto, and the light guiding path 1 〇 24 may be formed at a certain angle with respect to the substrate ι 2 , or a part of the light guiding path 1 〇 24 may be deformed (bending, branching, etc.). The portion of the inner portion of the conductor portion 1003 may be a hollow portion. Preferably, the portion is filled with a light-transmitting filler material. 66 201213360: that is, the transmittance of the transmitted light 1018 is 80% or more, preferably 9 A filler of 5% or more, more preferably 95% or more of the material. The filler may be made of the same material as the core portion 1094 of the core layer H) 93. Thereby, the light guiding path (core portion) 1024 can be easily formed, and the same advantages as the core portion 1094 described below can be obtained. Further, the filler may be made of the same material as the cladding portion 1095 of the core layer 1〇93 or the same material as the cladding layer 91 or 91. The conductor portion 10〇3 is in contact with the light guiding path 1〇24 in the through hole 1022. However, the conductor portion 10〇3 is not limited thereto, and may be, for example, the conductor portion 1〇〇3 and the light guiding path 1〇24 via the middle not shown. The layer (subsequent layer 'insulating layer, etc.) is close to the structure. The inner diameter of the through hole 1022 is not particularly limited, and is usually preferably about 5 to 2 mm, more preferably about !. Further, the outer diameter of the light guiding path (core portion) 1024 is not particularly limited, but is preferably about 0.005 to 111.3 111111, more preferably about 0. 〇 2 to 〇 15111111. As described above, by forming the conductor portion 1〇〇3 extending in the thickness direction adjacent to the light guiding path 1024, the through holes 1〇22 can be used to transmit electrical signals and optical signals in the thickness direction. In the optical waveguide structure 1A1 of the present embodiment, when the conductor layer 1051 is electrically connected to the portion 1531 of the conductor layer 1〇53, the conductor layer (7) is electrically connected to the terminal 1105 via the conductor portion 1003 and the portion ι532. Therefore, the terminals 丨1 〇3 and u 05 of the light-emitting element 101 are energized, and the light-emitting portion 11 〇1 is turned on. The passing light 1018 emitted from the lower portion of FIG. 2B by the lighting of the light-emitting portion 1101 penetrates the underfill material 1〇〇4, passes through the light guiding path 1024 (core portion 1024) in the through-hole 〇22, and is reflected. The surface 1961 reflects 9 turns. Bending, entering the core portion 1〇94 of the optical waveguide 1009, and repeatedly reflecting at the interface with the cladding portion (the cladding layer 67201213360 1091, 1092 and the side portion (front and rear in FIG. 20)) One side advances in the core portion 1 0 9 4 along the longitudinal direction thereof (the left direction in Fig. 20). <Fifteenth embodiment: Fig. 21> Fig. 21 shows a third embodiment of the optical waveguide structure 1〇〇1 of the present invention. In the following, the optical waveguide structure 丨00丨 will be described, and the same matters (configuration, operation, and the like) as those of the above-described fourteenth embodiment will be omitted, and the differences will be mainly described. In the optical waveguide structure 10A1 of the present embodiment, the configuration of the light transmitting portion (near the through hole 1022) of the substrate 1A2 is the same as that of the above-described fourteenth embodiment, and is the same as the fourteenth embodiment. That is, the same conductor portion 1〇〇3 and light guide ι 24 are formed in the through hole 1022 of the substrate ι 2, and the lower portion of the through hole 1022 is provided to condense or diffuse the transmitted light 1〇18. Lens portion 1026. That is, a lens portion 1026 composed of a convex lens (accurately, a plano-convex lens) is provided at the lower end of the light guiding path 1024 (the outgoing side of the transmitted light 1 〇 18). Thereby, the transmitted light 1 〇 18 emitted from the light-emitting portion 1101 toward the lower side in FIG. 21 penetrates the underfill material 1 〇〇 4, passes through the light guiding path i 〇 24, and condenses the light through the lens portion 1026 to concentrate the light beam (beam The light beam is bent at 90 by the reflection surface 196, enters the core portion 1094 of the optical waveguide 1 〇〇9, and advances in the core portion 1〇94 along the longitudinal direction thereof (the left direction in Fig. 21). By providing the above-described lens portion 1026, more transparent transmission light can be obtained, and more excellent optical transmission characteristics can be obtained. 68 201213360 Furthermore, in this case 1018. The lens portion 1026 may be capable of diffusing and transmitting light as long as a concave lens is used. The material constituting the lens of the lens portion may be a material having a refractive index different from that of the light guiding member. The function of the lens portion 1 〇 26 can be set to any one of a condensing lens or a diffusion lens by making the lens material lower than the aging rate of the light guiding path 1024. Further, the position at which the lens portion 1026 is disposed is not limited to the position shown in FIG. 21, and may be, for example, the middle or upper end of the light guiding path 1〇24 (through hole ι〇22), or other parts, for example, the core portion 1〇 The incident side end or the exit side end of 94. &lt;Thirteenth Embodiment: Fig. 22&gt; A sixteenth embodiment of the optical waveguide structure 1〇〇1 of the present invention is shown in the middle of Fig. 22 . In the following, the optical waveguide structure 1A will be described. The same matters (configuration, operation, etc.) as those of the above-described fourteenth embodiment will be omitted. The optical waveguide structure 1〇〇1 of the present embodiment is transparent to the substrate 1〇〇2. The configuration of 卩 (near the through hole 1022) is the same as that of the above-described fourteenth embodiment, and is the same as the fourteenth embodiment. That is, the same conductor portion ι 3 is formed in the through hole 1022 of the substrate 1 〇〇 2, and the vertical optical waveguide 1023 is formed inside. The vertical optical waveguide 1023 is composed of a core portion 1 〇 24 and a cladding portion 1 〇 25 surrounding the outer periphery of the core portion 1024. The core portion 1024 has a higher refractive index than the cladding portion 1025. By forming the vertical optical waveguide 1023 as described above in the through hole 1022, 69 201213360 can further reduce the amount of light loss caused by light leakage or the like, and further improve the transmitted light, compared with the conductor portion 24 of the above-described fourteenth embodiment. Transmission characteristics of 101 8. The constituent material and formation method of the core portion 10 2 4 can be the same as the core portion 1 〇 9 4 . Alternatively, the core portion 10 2 4 may be the same as the light-transmitting filler described in the above-described first embodiment. The constituent material of the covering portion 1 〇 25 can be the same as the covering portion 1095 or the cladding layers 1091 and 1092. <17th embodiment: Fig. 23 &gt; Fig. 23 shows a seventh embodiment of the optical waveguide structure 1 of the present invention. In the following, the optical waveguide structure 1 〇〇 1 will be described, and the same matters (configuration, operation, and the like) as those of the above-described 14th to 16th embodiments will be omitted. The optical waveguide structure 100 1 of the present embodiment is the same as the above-described sixteenth embodiment except that the lens portion 丨〇26 is provided. That is, the same conductor portion i3 and vertical optical waveguide 1023 are formed in the through hole 1022 of the substrate 1 〇〇 2, and the lower portion of the through hole 1 〇 22 is provided to condense or diffuse the transmitted light 1 〇 18 The lens portion 1026 is the same as described above. The effect of providing the lens portion 1026, the lens material constituting the lens portion 1A26, the installation position of the lens portion 1026, and the like are the same as those described in the above-described sixteenth embodiment. &lt;Eighth Embodiment: Fig. 24&gt; Fig. 24 shows a first embodiment of the optical waveguide structure 1〇〇1 of the present invention. In the following, the optical waveguide structure 1 〇〇 1 will be described, and the same matters (configuration, operation, and the like) as those of the above-described 14th to 17th embodiments will be omitted. In the optical waveguide structure 1〇〇1 of the present embodiment, the configuration of the light transmitting portion (near the beacon hole 1022) of the substrate 1〇〇2 is different from that of the seventeenth embodiment, and the other configuration is the same as that of the seventeenth embodiment. That is, as shown in Fig. 27, the cross-sectional shape of the through hole 022 of the substrate 1002 is a combination of the circular portion 1222 and the rectangular shape. In the shape of the P 1224 (shaped), the vertical optical waveguide 1023 (or the light guiding path 1 〇 24) is inserted into the circular portion 222, and the conductor portion is inserted into the rectangular portion KM. The upper end portion and the lower end portion of the conductor portion are electrically connected to the portion 1532 of the conductor layer 1053 and the conductor layer 1〇52, respectively. The above configuration has an advantage that the volume (volume ratio) of the conductor portion can be further controlled by setting the cross-sectional area in advance on the circular portion 222 and the rectangular portion 1224, respectively. Further, the advantage of the conductor portion ι 3 is formed only in the necessary direction in the circumferential direction of the circular portion 1222. <19th Embodiment: FIG. 32 to FIG. 34> As shown in FIG. 32 to FIG. 34, the optical waveguide structure 2001 of the present invention has a substrate 2002, an optical waveguide 2_ formed on the lower portion of the substrate, and an optical waveguide 2GG9. The optical path conversion unit 2_ (reflection surface 2961), the light-emitting element chest and the electronic circuit element 2〇12 mounted on the substrate, and the conductor layer 2〇〇5 formed on the substrate 2〇〇2 . Examples of the constituent material of the substrate 2002 include epoxy resin and phenol. Bismuth, bis-butenylene diimide resin, bis-n-butenylene diimide _ three wells t, second reading grease, $ cyanuric acid § resin, polytrimerization resin, ^ _ tree moon 曰, Polyamidene, polybenzopyrazole resin, norbornene resin, etc. η 曰 曰 material ' or Shi Xi, gallium _ Shi Shen, indium _ broken, 锗, carbonized stone eve, Shi Xilu and other semi-conducting 71 201213360 Body material. ·^ It is also possible to mix a plurality of types so that the special material can be used alone. The two-dimensional substrate 2002 may be, for example, a fiber material such as glass fiber or resin fiber, a non-woven fabric, a woven fabric, a woven fabric or the like, which is impregnated with the above resin material (prepreg or the like). For example, a glass epoxy substrate is obtained by impregnating a glass cloth with a secret moon, and the above-mentioned substrate containing the fiber substrate can be made relatively thin, strong (four) n, and the thermal expansion rate is low. Therefore, it is particularly advantageous when the optical waveguide 2009 or the conductor layer (metal layer) is bonded to the substrate 2002. Eighth, the substrate 20〇2 may also be a laminated body of a plurality of layers. For example, a layer in which a second layer composed of a resin material having a different composition (type) is laminated, and a layer (sheet) in which a resin material is impregnated into the fiber substrate is used, and a resin is used. The layered material is composed of layers. Further, the layer constitution of the laminate is of course not limited to this. The thickness of the substrate 2002 is not particularly limited, and is usually preferably about 5 mm, preferably about 1 mm to about 15 mm, and more preferably about 150/zm to 1.2 mm. The substrate 2〇〇2 may be rigid or may have flexibility (f]exible). Of course, in the case of the substrate 2002, in the present embodiment, since the transmitted light 2〇18 penetrates the substrate 2002, the substrate 2002 has a transmittance of 80% or more of the transmitted light 2018. It is preferably 90% or more, more preferably 95% or more. In this manner, the substrate 2〇〇2 itself (all or part of the substrate 2002) is formed by a material having light transmissivity to the transmitted light 2018. That is, the substrate 2〇〇2 is set to 72 201213360. In the transparent substrate 2, the portion directly under the light-emitting portion 2i〇i of the substrate 2002 may be formed without forming the through-holes 2〇25 described below. The light-emitting portion 21〇1 of the light-emitting element 2010 is optically connected to the core portion 2094 (optical-path conversion unit 2〇96) of the optical waveguide 2009 via the transparent portion 2024. The optical waveguide 2〇〇9 is bonded to the lower surface of the substrate 2002. In the configuration shown in the drawing, the optical waveguide 2〇〇9 is directly bonded to the lower surface of the substrate 2002 (the optical waveguide 2 is adjacent to the substrate 2002). However, the present invention is not limited thereto, and may be formed via at least the intermediate layer of the layer. The intermediate layer can be formed for any purpose, and examples thereof include an adhesive layer, a conductor layer (wiring pattern), an insulating layer, or a laminate including two or more layers. The constituent material thereof is, for example, a binder, a phenol resin-based adhesive, a nitrogen-imide-mine resin-based adhesive, or the like. Insulation is especially composed of a material having a solubilizing activity. Here, as the adhesive layer, for example, a sheet of a bonding sheet can be used, and an epoxy-based adhesive, an acrylic cyanate S-based resin-based adhesive, and a butene can be used. In particular, it is preferably an antioxidant or the like. The adhesive layer preferably has electrical

70 # m or so.

2091, the core layer 2093 and the cladding layer form a core portion 2 33 of a specific pattern and the lower layer sequential cladding layer coating layer 2092 in FIG. 34, and the core layer 2093 2094 and the cladding portion 2095 (refer to FIG. 33) , 73 201213360 Figure 3 4) The refractive index of the core part 2094 is 209 i, the refractive index of _ is also higher than that of Γ 〇 95, and 'dry to the coating layer. The cladding layer 2〇91 and the cladding portions located at the lower portion and the upper portion of the core portion 2094, respectively. With the above configuration, the core portion 2094 functions as an optical path for transmitting the entire light 20 1 8 on the outer periphery. The two materials in the α and the coating portion may be irradiated by a line (active (four) precursor, electron beam or xenon ray, etc.) or a material whose refractive index is changed by heating. As a preferable example of the above-mentioned material, a resin composition containing a benzene cyclobutane-based polymer or a cycloolefin-based resin such as a reduced olefin-based polymer as a main material, and a terpene-based polymer (as The main material). U is 3, and the core layer composed of the above materials is excellent in "equivalent deformation, especially in the case of repeated f-bending deformation = stripping with the covering portion 2095, or layer of the core layer ... = (cladding layer) 2 〇 91, 2 〇 92) layer peeling, can also prevent two: micro-cracks in the joint 2 〇 94 or in the cladding portion 2095. h optical transmission 2 _ optical transmission performance, ° I maintained 2009. The optical waveguide with excellent humanity, such as the core material of the layer 2G93, may also contain, for example, 浐4 匕Μ, a refractive index modifier, a plasticizer, a tackifier, a reinforcing agent, a polyoxygenating agent. , Defoamer, adhesion aid and flame retardant, etc.: ::: Improves high temperature stability, improves weather resistance, and has the effect. Examples of the antioxidant include a phenol system such as a single compound, a 74 201213360 bisphenol system, a trisphenol type, or an aromatic amine system. Adding a chemical, a viscous agent, and a reinforcing agent can further increase the resistance to bending. The content of the additive represented by the above-mentioned antioxidant (in total of the two types) is about 0.5 to 40% by weight, more preferably about 3 to 3% by weight, based on the total amount of the constituent material of the core layer. If the amount is too small, the function of the additive cannot be sufficiently exhibited. If the amount is too large, the transmittance of the light (transmission light 2018) generated in the core portion 2〇94 is lowered depending on the type or characteristics of the additive. Poor patterning, unstable refractive index, and the like. As a method of forming the core layer 2G93, a coating method can be mentioned. The coating method includes a method of applying a composition for forming a core layer (such as a varnish) and curing (curing), and a method of applying a curable monomer composition and curing (curing) the composition. Further, a method other than the coating method, for example, a method of joining separately produced sheets may be employed. The core layer 2 〇 9 3 obtained in the above manner is selectively irradiated with active radiation using a mask, and the core portion 2〇94 of the desired shape is patterned. Examples of the active radiation used for exposure include active energy rays such as visible light, ultraviolet light, infrared light, and laser light, electron beams, xenon rays, and the like. The electron beam can be irradiated, for example, at an irradiation dose of about 50 to 2000 KGy. In the core layer 2093, the refractive index of the portion irradiated with the active radiation changes (in the case where the refractive index is increased or decreased according to the material of the core layer 2093), and the refractive portion is irradiated with the portion irradiated with the active radiation. The difference between the rates. For example, the portion of the core layer 2093 that is irradiated with active radiation becomes the cladding portion 2954, and the portion that is not irradiated becomes the core portion 2094. Also, 75 201213360 also has the opposite situation. The refractive index of the cladding portion 2095 is substantially equal to the refractive index of the cladding layers 2091, 20 92. Further, there is a case where the core layer 2093 is irradiated with an active radiation in a specific pattern and then heated to form the core portion 2094. By adding this heating step, the difference in refractive index between the core portion 2094 and the cladding portion 2095 can be further increased, which is preferable. Further, 'this principle and the like' will be explained in detail below. The pattern shape of the formed core portion 2094 is not particularly limited to a shape that can be linear, has a curved portion, an irregular shape, a branch portion having an optical path, a shape of a merging portion or an intersection portion, and a condensing portion (width, etc.) Any of the reduced knives or the light-diffusing portion (the portion where the width or the like is increased) or a combination of two or more of the shapes. According to the present invention, by arranging the irradiation pattern of the active radiation, the core portion of the arbitrary shape can be easily formed, and the constituent materials of the respective portions of the optical waveguide 2009 and the method of forming the core portion 2〇94 can be easily formed. It will be elaborated. The optical waveguide 2009 has a path conversion unit 2096 that bends the optical path of the core portion 2094. The optical path conversion unit 2096 is composed of a reflection surface (mirror) 2961 that reflects at least a part of the transmitted light (light emitted from the spontaneous light portion 2 1 0 1) 2〇丨8. The reflecting surface 2961 is disposed at a position directly below the light emitting portion 2101. The optical path of the reflecting surface 2961 with respect to the optical waveguide 2009, that is, the longitudinal direction of the core portion 2〇94 (the x direction in FIGS. 32 and 33, and the front and rear directions in FIG. 34) is substantially 45. The tilting function has a function of reflecting the transmitted light 2 〇 18 76 201213360 : which is emitted from the light-emitting portion 21 〇 1 (for example, 90% or more). In the optical path conversion # 2096, the blade of the optical waveguide 2〇〇9 is removed (defectively), for example, the cross section is formed into a triangular recess (see Fig. 33), and this is added! The inclined faces are used as reflectors. The reflecting surface 2961 may, for example, also have a reflective film or a reflection increasing film such as a multilayer optical film or a metal film (e.g., a vapor film). As a method of removing a part of the optical waveguide 2009, methods such as cutting and irradiation of laser light can be cited. Further, although not shown, the recessed portion of the optical path conversion unit 2〇96 may be filled with a filler, in particular, a filler (closed material) having a refractive index different from that of the core portion 2〇94, and a filler of the metal material ( Closure material). Further, the reflecting surface 2961 is not limited to the total reflection, and may be, for example, a portion such as a half mirror or a dichroic mirror that reflects the transmitted light and penetrates the remaining portion. In this case, the 'wire conversion unit' has a function as a spectroscope that separates the optical path into two directions (the left direction and the lower direction in Fig. 33). The optical characteristics of the above-mentioned reflecting surface 2961 can be appropriately set in accordance with the optical path design of the transmitted light 2〇18. Further, in the configuration shown in the drawing, the reflecting surface 2961 (optical path converting portion Μ%) is formed across the cladding layer 2091, the core layer 2093, and the cladding layer 2〇92, but is not limited thereto. Only formed in the core layer 2093. The formation of the core portion 2094 and the formation of the optical path conversion portion 2〇96 may be performed by mounting the following light-emitting elements 2〇1〇 or the like (positioned) 1 or later on the substrate 2002, and in any case, can be easily and accurately Grasp the position of its formation. That is, the position of the light-emitting portion 21〇1 relative to the plate 2002 can be specified by the positioning means 2033 described below. Therefore, when the second hole 20120460 core portion 2094 or the optical path conversion portion 2096 is formed in the optical waveguide 2009 on the substrate 2002, It is easy to make the formation position (exposure portion) of the core portion 2094 or the formation position of the optical path conversion portion 2096 coincide with the position corresponding to the light-emitting portion 2101 (the position immediately below the light-emitting portion 2101), and form the opposite substrate 2002 on the upper portion of the substrate 2002. Above and at least! Two recesses 2003 and 2004 with two sides open. The light-emitting elements 2〇1〇 and the electronic circuit elements 2〇12 are inserted (arranged) in the recesses 2003 and 2004, respectively. The light-emitting element 2010 has a light-emitting portion 21〇1 on its lower side and a pair of terminals 2103 and 2105 on the upper surface side (and may have other terminals). When the two terminals 2103 and 2105 are energized, the light-emitting portion 21〇1 emits light to emit the transmitted light 2018. Further, the light-emitting portion 21〇1 of the light-emitting element 2010 may be a plurality of light-emitting devices (four) in addition to the light-emitting portions. As a plurality of light-emitting points, for example, light-emitting points are arranged in a row (for example, 1×4 or 1×12 light-emitting points) or in a matrix (for example, nxm light-emitting points: η, and claws are integers of 2 or more). , or a plurality of illuminating points irregularly - dom) configurator, and the like. The light receiving unit of the light receiving element described below is also the same. The light-emitting element 2010 is provided in the concave portion such that the light-emitting portion 21〇1 is joined (contacted) to the bottom surface (lower surface) 2030 of the concave portion 2〇〇3. Further, the light-emitting portion 2101 can be arranged in plural numbers along the vertical direction in Fig. 32. The electronic circuit component 2012 is composed of, for example, a semiconductor element (semiconductor wafer). The electronic circuit _2G12 has a plurality of terminals (terminals 2123, 2125) on its upper side. Further, the electronic circuit components 2〇12 may have other terminals in addition to the terminals 2123' to 2125. 78 201213360 The functions that can be listed are not particularly limited. As an example, the circuit is used to drive the light-emitting elements. Further, as described below, in the case of a bi-optical element, the function of the money from the U-component of the U-element can be listed. a The function of the electronic circuit in the case of both of the optical waveguide structures 2001. The light-emitting element 2010 and the light-receiving element element 2012 may have both of the above, and in the present specification, the light-emitting element 2〇1〇, the light-receiving element, the electronic circuit element 2〇12, other various elements, or a combination thereof may be used. Two or more elements are referred to as "electrical components" or simply as "components". Further, the light-emitting elements 2010's light-receiving elements and electronic circuit elements 2'12 are not limited to being composed of different elements, and at least two of them may be connected or integrated (i wafers). The configuration (the composite component is provided on the substrate 2002, and positioning means 2033, 2043 for determining the position of the above-mentioned electrical component (light-emitting component 2" and the electronic circuit component 2012), particularly the position relative to the substrate 2? Hereinafter, the positioning means 2033 and 2043 will be described in order. The concave portions 2003 and 2004 which are open to the upper surface of the substrate 2002 are formed on the upper portion of the substrate 2002. The concave portion 2003 is opened to the right and below in Fig. 32, and is concave. The edge portion, that is, the left side and the upper side in FIG. 32 has a step difference from the upper surface of the substrate 2002. In this step, a contact surface 203 is formed on the left side in FIG. 32, and a contact surface 2032 is formed on the upper side in FIG. 32. The contact surface 2031 is formed. And 2032 are vertically erected with respect to the bottom surface 2030 of the recessed portion 2003, and the contact faces 2〇31 and 2032 form a right angle with each other. The contact faces 203 1 and 2032 form a fixed position of 201213360 (for light-emitting elements) 2033. The bottom surface 2030 may be included in the positioning means 2033, whereby the positioning of the substrate 2002 in the thickness direction may be performed. The light-emitting element 2010 is brought into contact with the bottom surface 2〇3〇 of the concave portion 2〇〇3 by the light-emitting element 2010. The two side faces adjacent to each other (orthogonal) of the light-emitting elements 200 are abutted (adjoined) with the contact faces 2031 and 2032, and are provided in the recesses 2003. Thereby, the light-emitting elements 2010 are contacted by the contact faces 2〇31. The position in the χ direction is regulated and the position in the γ direction is regulated by the contact surface 2032. That is, the light-emitting element 2〇1〇 is positioned in both the X direction and the γ direction (two-dimensional direction). The positioning of the light-emitting element 2〇1〇 with respect to the surface direction (two-dimensional direction) of the substrate 2〇〇2 is surely performed, and the operation is such that the light-emitting element 201 and the concave portion 2 are opposed to the fixed substrate 2002. 3 is close, moving in the upper left direction in FIG. 32 (relative movement), and abutting the contact faces "n and 2032, respectively, so that the positioning operation can be performed extremely simply. In particular, not only in the longitudinal direction of the core portion 2094 (χ direction), and at the core 209 Since the width direction (γ direction) of 4 is also positioned, even when the width of the core portion 2094 is small (a fine optical circuit), the position of the light-emitting portion 2 ι ι of the light-emitting element can be accurately The core portion 2094 is overlapped (in a plan view). By the positioning means 2033, it can be determined that the light-emitting element 2〇10 (the driver part 2101) is directly aligned with respect to the substrate 2〇〇2, and is also determined below the lower surface of the % substrate. The position of the core position of the optical waveguide 2_, in violation of the positional relationship of the optical path conversion unit (reflection surface 2961) with respect to the core portion _ has been determined. Therefore, it is also determined to read with respect to the optical path conversion unit. The position of the (reflecting surface 2961). That is, as shown in FIG. 32, the positioning means 2G33 is positioned such that the position of the light-emitting portion 2101 of the light-emitting element 2010 in plan view overlaps with the position of the optical path conversion portion (reflection surface 2961). . Thereby, the reflecting surface 2961 is located directly under the light-emitting portion 2HH, and the optical path as designed can be accurately formed. concave. The depth of P 2003 is preferably substantially equal to or greater than the thickness of the light-emitting element 2 (4) or greater than the thickness of the light-emitting element 2〇1〇&gt;ίΐώ: # , U. In this way, the light-emitting element 2010 can be prevented from being protruded from the concave portion 2003 by the iv dog, and the upper 〇 ρ is accommodated in the concave portion 2〇〇3. concave. Ρ 2004 is open to the left and the lower side in Fig. 32, and has a step difference from the upper surface of the substrate 2 in the edge portions of the concave portion 2〇〇3, that is, left and right in Fig. 32. In the case of the step difference, the contact surface 2041 is formed on the right side in Fig. 32, and the contact surface 2〇42 is formed on the upper side in Fig. 32. The contact faces 2〇41 and 2〇42 are vertically erected with respect to the bottom surface 2G4G of the recess P 2GG4, respectively, and the contact faces 2Q41 and 2〇42 are also formed at right angles to each other. The contact means (for electronic circuit components) of the electronic circuit component 2012 are formed by the contact faces 2〇41 and 2〇42. Furthermore, the bottom surface of the hand piece 2043 may also include a bottom surface 2〇4〇, whereby the positioning of the substrate 2002 in the thickness direction may also be performed. The electronic circuit component 2012 is brought into contact with the bottom surface 2040 of the recessed portion 2〇〇4, and the two adjacent sides (orthogonal) of the electronic circuit component 2012 are respectively associated with the contact faces 2〇41 and 2()42. Abutted (pushed) and set in the recess # 2004. Thereby, the electronic circuit component 2012 sees the position of the direction by the contact surface 2041, and the position of the Y direction is regulated by the contact surface 2042. That is, the electronic circuit component 2〇12 performs positioning of both the X direction and the γ direction (one-dimensional direction). In this way, the positioning of the electronic circuit element 81 201213360 piece 2012 with respect to the plane direction (two-dimensional direction) of the substrate 2〇〇2 can be surely performed and the operation is as long as the electronic circuit element 2012 is made with respect to the fixed substrate 2〇〇2. This positioning operation is extremely simple in that it is close to the concave portion _, and is moved toward the upper right direction in Fig. 32 to be in contact with the contact faces 2〇4丨 and 2〇42, respectively. The position of the electronic circuit component 2〇丨2 (terminals 2123, 2125) relative to the substrate 2〇〇2 can be determined by the above-mentioned positioning means 2043, which also determines the light-emitting element 2〇1 positioned relative to the positioning means 2033. The position of the crucible is further determined depending on the position of the optical path conversion unit 2096 (reflection surface 2961). In this way, by accurately determining the positional relationship between the electronic circuit components 2〇12 and the light-emitting elements 2010, it is possible to form (pattern) the following conductor layers, in particular, to form the electronic circuit components 2〇12 and the light-emitting elements 2〇. When the portion 2052 is between 1 ,, it can be formed in a more accurate shape and position. The depth of the recessed portion 2004 is preferably substantially equal to the thickness of the electronic circuit component 2〇12 or greater than the thickness of the electronic circuit component 2〇12. Thereby, the electronic circuit element 2012 can be accommodated in the concave portion 2004 without protruding from the concave portion 2004. Further, since the positioning means 2033 and 2〇43 of the present embodiment are in contact with the bottom surfaces 2030 and 2040 on the lower surface of the electric component, the thickness directions of the substrate 2〇〇2 are also orthogonal to each other (the X direction and the γ direction are orthogonal to each other). The orientation of the direction). Therefore, the positioning means of the present embodiment is capable of accurately positioning the three-dimensional direction. Further, the positioning means of the present embodiment is formed directly on the substrate 2002 82 201213360 (contact faces 2031, 2032, 2041, 204?, Bo * 2 0 4 2 ) 'but is not limited thereto, and may be relative to the substrate 2002 And with the meteorites ^ ^ ^ 叩俅 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不As such an example, a positioning member that is fixed to the substrate 2002 and has a contact surface against which the electrical component can abut is exemplified. Further, in the present invention, the positioning of the abundance seat &amp; may also be such that the electrical component is positioned only in the X direction and the Y direction. In this case, the positioning of the substrate 2002 in the thickness direction may or may not be performed. A conductor layer (metal layer) 2005 is formed on the substrate 2〇02. The conductor layer 2005 is patterned into a specific shape on the two sides of the body to form a desired electrical wiring or electrical circuit. In the present embodiment, the conductor layer is provided with the portions 205 1 and 2052. The portion 20M is formed across the upper surface of the substrate and the upper surface of the electronic circuit component 2012, and the disk end +" is electrically connected to the 2125. The portion 2052 spans the upper surface of the substrate 2002, the well is opened, the top of the cow 2010, and the electronic circuit components The upper surface is formed electrically connected to the terminal coffee 2125. The portion 2053 is formed across the upper surface of the substrate and the upper surface of the light-emitting element, and is electrically connected to the terminal 2105. The part is 205 1 or 2 For example, the structure of the conductor layer 2005 is 铋Μ ν , ^ ^ and the materials are respectively exemplified by copper, copper bismuth alloy, ruthenium, Ilu alloy, present, a &lt; human gold It is a variety of metal materials such as alloys and solders. Also, according to the gentleman's / bismuth material (for example, a substrate made of a semiconductor material, the substrate of the substrate 2002), it is also possible to use tungsten and tungsten alloys. Etc. The thickness of the conductor layer 2005 and the name of the helmet... ",, particularly limited, usually preferably 2 to 200

Mm or so, better 3~12〇

It is about 5~70 M 83 201213360 m or so. The conductor layer 2005 is formed by, for example, bonding (subsequent) of metal foil, metal plating, vapor deposition, sputtering, or the like. Patterning of the conductor layer 2〇〇5, for example, etching, printing, masking, or the like can be used. As a constituent material of the conductor layer 2005, when a metal such as copper which is easily diffused in the semiconductor material is used, the joint portion with the semiconductor material (in the case where the base 2 is composed of the semiconductor material) is preferably via, for example, It is formed of a barrier layer (not shown) made of titanium oxide or a group. Further, when a metal such as a crane having poor adhesion to a semiconductor material is used as a constituent material of the conductor layer 2005, it is preferable to use a joint portion of a semiconductor material (a substrate read from a semiconductor material). It is formed by increasing the adhesion layer (not shown). Further, the pattern of the conductor layer 2005 is not limited to those shown in Figs. 32 to 34, and may be any shape or arrangement. Further, the formation portion of the conductor layer 2005 is not limited to the light wave as shown in the figure; The upper portion (upper surface) of the structure 2G01 can be formed, for example, on the surface of the light wave | paste 9 or the inside of the optical waveguide structure 2001 (for example, between the optical waveguide 2 and the core plate 2 〇 02) to form the same conductor layer (electrical In the optical waveguide structure 2〇〇1 of the present embodiment, when the terminal of the light-emitting element 2〇1〇 is measured by the operation of the electronic component 2〇12, the light is emitted, and the light is emitted. The portion 2101 illuminates 'transmissions (5) 2018 which are emitted toward the lower side in FIG. 33 sequentially penetrates the light transmitting portion 2 (four) of the substrate 2002 and the cladding layer 2 (four), and each reflecting surface 2961 reflects the 纟 90. Bending, entering the core of the optical waveguide 2_Hung 2094, repeating the interface with the cladding portion (the cladding layer 2〇9卜2〇92 and the lateral side (Fig. 3 84 201213360 -) The reflection progresses in the core portion 2094 along the longitudinal direction (the left direction in Figs. 32 and 33). &lt;Twentyth Embodiment. Fig. 35 &gt; Fig. 35 shows a second embodiment of the optical waveguide structure 2〇〇1 of the present invention. In the following, the optical waveguide structure 2 〇〇 1 will be described, and the same matters (configuration, operation, and the like) as those of the above-described ninth embodiment will be omitted. The optical waveguide structure 2 (H of the present embodiment) is the same as the above-described 19th embodiment except that the configuration of the positioning means is different. That is, in the present embodiment, the upper surface of the substrate 2002 is formed into a flat surface, and the electrical component is determined. The positioning means for positioning is constituted by a positioning member 2006 fixedly provided with respect to the substrate 2'2. The positioning member 2006 is substantially equal in thickness to the thickness of the light-emitting element 2'' and/or the electronic circuit element 2012. A thinner plate (or sheet) is bonded (fixed) to the upper surface of the substrate 2〇〇2 via the adhesive layer 2007. As shown in the upper portion of Fig. 35, the planar shape of the positioning member 2〇〇6 is substantially Formed in a τ shape, the L-shaped contact surface 2〇61 having two side faces (corners) adjacent to each other (orthogonal) of the light-emitting element 2010, and the adjacent (orthogonal) of the electronic circuit component 2012 The U-shaped contact surface 2062 on which the two side surfaces (corner portions) abut. The light-emitting element 2010 is brought into contact with the upper surface of the substrate 2〇〇2 by the lower surface thereof, and the light-emitting element 2010 is adjacent to each other. The two sides of the intersection are in contact with the contact surface 2061 The position of the χ direction and the γ direction are separately adjusted. 85 201213360 That is, the light-emitting element 2010 performs positioning in both the χ direction and the Y direction (two-dimensional direction). Similarly, the electronic circuit component 2012 borrows The lower surface of the substrate 2〇〇2 is abutted against the upper surface of the substrate 2〇〇2, and the two sides of the adjacent (.ort.) of the electronic circuit component 2012 are abutted (adjoined) with the contact surface 2 0 6 2, and are separately regulated. The position of the χ direction and the γ direction, that is, the electronic circuit element 2 〇 12 performs positioning of both the χ direction and the γ direction (two-dimensional direction). By using the above-described positioning member 2006, it is possible to simultaneously Positioning the advantages of both the light-emitting element 2〇1〇 and the electronic circuit element 2〇12. Further, by adjusting or changing the solid-state position of the positioning member 2〇〇6 relative to the substrate 2〇〇2, or selecting a shape or size The different positioning members 2 〇〇 6 and fixed on the substrate 2002 ′ also have the advantage of being able to freely set or change the installation position of the electrical components (the light-emitting elements 2010 and/or the electronic circuit components 2 〇 12). Then layer 2007, can be used It is the same as the adhesive layer described in the nineteenth embodiment. In the present embodiment, the planar shape and thickness of the positioning member 2〇〇6 are limited to those of the drawings, and may be any shape and size. In the present embodiment, the positioning of the light-emitting element 2〇1〇 and the electronic component 20 1 2 is performed by one positioning member 2006, but the present invention is not limited thereto, and the light-emitting element 2〇 and the electronic circuit element # 2012 ^The positioning direction by the different positioning members is not particularly limited. <2nd Embodiment: Fig. 3 6 &gt; Fig. 36 shows the optical waveguide structure 2 of the present invention. 〇ι第21实86 201213360 方式 Form. The optical waveguide structure 2A will be described below, and the description of the same matters as those of the above-described first embodiment will be omitted, and the differences will be mainly described. The optical waveguide structure 2 of the present embodiment is different from the above-described nineteenth embodiment except that the configuration of the substrate 2〇〇2 is different. In other words, the substrate 2〇〇2 may have insufficient penetration of the transmitted light 2018, and a through hole 2025 penetrating the substrate 2〇〇2 is formed at a position directly below the light-emitting portion 2101 of the substrate 2〇〇2. The through hole 2025 constitutes a light transmitting portion 2024 that transmits the transmitted light 2〇18. In other words, the through hole 2〇25 serves as a light guiding path for guiding (transmitting) the transmitted light to the thickness of the substrate 2〇〇2. The cross-sectional shape of the Beton hole 2025 is not particularly limited, and may be any shape such as a circle, a circle, a rectangle (a square), a hexagon, or other polygons. The vertical ~ door but I or _ π points) can also fill the transmission of light transmission rate &amp; 8 〇% or more, preferably ah f f f is preferably (four) or more of the material filling material. The filling material is also. τ is composed of the same material as the constituent material of the core portion 2094, the layer 20", the soil layer 5, the cladding layer 2〇91, or the cladding. Further, although not shown, the through hole is formed. 2〇25 The material consists of the household, 囍μ· 印 · 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 Operation of component 2〇12 to the right by electronic

When the terminal 2103, 21〇5 R of the first piece of 2010 is energized, the light-emitting part 21 〇1 fj; the ancient, 0 5 points of the van Gogh's transmission light 87 from the lower side of the figure 36 201213360 2018 through the through hole of the substrate 2002 Within 2025, it penetrates the cladding layer 2092 and is reflected by the reflecting surface 2 916 to be 90. Bending, entering the core portion 2094' of the optical waveguide 2 0 ′′ is repeatedly reflected at the interface with the cladding portion (the cladding layers 2091, 2092 and the side (left and right in FIG. 33)), along one side The longitudinal direction (the left direction in Fig. 36) advances in the core portion 2094. <Twenty-second embodiment: Fig. 37> Fig. 37 shows a twenty-second embodiment of the optical waveguide structure 2〇〇 of the present invention. The optical waveguide structure 2001 will be described below, and the description of the same matters as those of the above-described 19th and 21st embodiments will be omitted, and the differences will be mainly described. The optical waveguide structure 2001 of the present embodiment is the same as the twenty-first embodiment except that the light transmitting portion 2A24 (through hole 2025) is provided with a lens portion 2026 that can condense or diffuse the transmitted light 2018. That is, a lens portion 2026 composed of a convex lens (a plano-convex lens in terms of pain) is provided in a lower portion of the through hole 2025 (on the incident side of the optical waveguide 2009). Thereby, the light emitted from the light-emitting portion 2101 toward the lower side in Fig. 37 passes through the through hole 2025 of the substrate 2002, and is concentrated by the lens portion 2026 to concentrate the beam. The light beam is reflected by the reflecting surface 2961 to be 9 turns. The core portion 2094 which is bent and enters the optical waveguide 2009 advances in the core portion 2094 along the longitudinal direction thereof (the left direction in Fig. 37). By providing the above-described lens portion 2〇26, it is possible to obtain a more transparent transmission light, and more excellent light transmission characteristics can be obtained. Further, the 'lens portion 2 0 2 6 may be a squeezing jt (a gamma J and a diffusible light 2018. In this case, a concave lens may be used. 88 201213360 Further, the position of the lens portion 2 〇 26 The position shown in FIG. 37 is not limited to, for example, the middle or the upper portion of the light transmitting portion 2〇24 (through hole 2〇25), and the wide position of the light portion, for example, the core portion 2.94 or the outgoing image in FIG. Left end). The lens portion 2〇26 may be provided to the 19th and 2nd 形, and the light/sheath structure 2 0 〇1 may be provided. In the light receiving mode, the light emitting element _ may be replaced by The upper copper and the f-first member have, for example, a light receiving portion on the lower side thereof, 2018, r, and a terminal (for example, a pair of terminals). If the light receiving portion receives the transmitted light for photoelectric conversion, the terminal outputs an electrical signal to the electronic device. 2, and the signal processing (for example, the optical waveguide structure of the signal of the moon), both of the light-receiving elements. In this case, it can be set as self-contained The light emitted by the part passes through the optical path conversion unit 2〇96, the optical waveguide: the optical path conversion unit 2〇96), and further, the center of the first part of the light-emitting unit is received by the first to the first part. In the twenty-fifth embodiment, the cable is not limited to the above, and the description is made to 'but other components of the present invention. The subject matter of the present invention' may be any two or more of the two types. The constituents of the μ Court form in the first to the twenty-secondth embodiments. The optical waveguide structure of the present invention has excellent durability in h. Therefore, by providing a high-quality optical communication between two points and a high-quality optical communication between two points, a sub-device (the present invention) In the case of the electronic device including the optical waveguide structure of the present invention, for example, a mobile phone, a game machine, a router device, a WDM device, a person shame, a television, An electronic device such as a home server, which has to transmit a large-capacity data at a high speed between a memory device such as an LSI and a memory device such as a ram. Therefore, the optical device structure is provided by the electronic device including the present invention. The body can eliminate the problems such as noise and signal degradation that are unique to the electric wiring. Therefore, it is expected to improve the performance. In addition, the optical waveguide portion can be significantly reduced compared with the electric wiring. Therefore, it can be improved. The size of the substrate can be reduced, and the power required for cooling can be reduced, and the power consumption of the entire electronic device can be reduced. λ Further, the present invention as described above The optical waveguide structure is capable of freely capturing a state in which the substrate or the optical waveguide is bent (bending state) by performing a bending operation, and a state in which the substrate or the optical waveguide is stretched by releasing the bending operation (: tension state)| Therefore, for example, it can be preferably used for a hinge portion or a bone moving portion of an electronic device such as a hinge portion or a sliding machine, a game machine, a pDA, a notebook personal computer, etc. For example, in a mobile phone, an optical waveguide is used. When the structure is connected between the two points of the chain part, when the mobile power is turned off, the optical waveguide structure adopts the f-curve state when the chain portion is closed, and when the hinge key is opened, the optical waveguide structure adopts the extension state. Thereby, the optical waveguide structure can maintain electrical connection and optical connection between the two points of the movable portion for a long period of time. Therefore, the mobile phone (electronic device) having the optical waveguide structure can improve the reliability. Further, the electronic device to which the optical waveguide structure of the present invention is applied is not limited to the above, and can be preferably applied to, for example, a router device, a Wdm device, a 201213360' personal computer, a television, a home server, or the like. Each of these electronic devices must transmit a large amount of data at a high speed between a computing device such as an LSI and a memory device such as a RAM. Therefore, by providing the above-described electronic device with the optical-electric hybrid substrate of the present invention, it is possible to eliminate problems such as noise and signal degradation peculiar to the electric wiring, and it is expected that the performance will be greatly improved. Further, the optical waveguide portion can significantly reduce heat generation as compared with the electric wiring. Therefore, the size of the substrate can be increased and the size can be reduced, and the power required for cooling can be reduced, and the power consumption of the entire electronic device can be reduced. &lt;Manufacturing Method of Optical Waveguide&gt; Next, the manufacturing method and the respective parts of the optical waveguides 9, 9, 1〇〇9, 2〇〇9 (hereinafter also referred to as the optical waveguide 9) in the above embodiments The constituent materials and the like are described in detail, and in particular, the method of forming the core portions 94, 1094, and 2094 (hereinafter also referred to as the core portion 94) will be described in detail. First, the photosensitive resin composition for forming the core portion 94 will be described before explaining the method of forming the core portion 94. (Photosensitive Resin Composition) The photosensitive resin composition of the present embodiment comprises: (A) a cycloolefin resin; (B) a monomer having a refractive index different from (A) and having a cyclic ether group and having a ring At least one of the oligomers of the sulfhydryl group, and (C) a photoacid generator. Among them, from the viewpoint of surely suppressing the generation of light propagation loss, it is preferred to have a cycloaliphatic resin having a debonding group which is desorbed by an acid generated by the (C) photoacid generator in the side chain (A). ), and 91 201213360 The squat (100) monomer.

The photosensitive resin composition is formed into a film shape and used as a film for forming an optical waveguide, and further used as a film containing a region having a different refractive index, for example, a photoconductive film. In other words, by using the above-mentioned photosensitive resin composition, it is possible to provide an optical waveguide film or the like which suppresses generation of light propagation loss. The towel can significantly suppress the generation of light propagation loss in the case of forming a curved optical waveguide. Further, it is possible to provide an optical wiring using the optical waveguide film, and an optical-electric hybrid substrate including the optical wiring and the electric circuit. According to the optical wiring and the photo-electric hybrid substrate, EMI which is a problem in the prior electrical wiring can be improved (electromagnetic interference can greatly increase the signal transmission speed compared with the prior art. Further, an electronic device using the optical waveguide film can be provided. Since the optical waveguide film can be used to save space, it can contribute to miniaturization of the electronic device. Specific examples of the electronic device include a computer, a server, a mobile phone, a game device, a memory tester, and an appearance inspection robot. The following is a detailed description of the components of the photosensitive resin composition. ((A) Cycloolefin resin) The ring-thin resin of the component (A) is a film of a protective photosensitive resin composition 92 201213360 Formability Addition, and here, the β-system substituted by the cycloolefin resin is a matrix polymer. It may be an unsubstituted one, or a hydrogen-based other group may be used as a cycloolefin resin, for example, a resin or the like. From the viewpoints of transparency of the resin and benzocyclobutene, etc., it is preferable to use a norbornene-based resin in terms of heat resistance. Examples of the reduced ethylenic resin include, for example: (1) addition (co)polymer of a norbornene-type monomer obtained by addition (co)polymerization of a falling (tetra) type monomer, addition of () a reduced-k-type monomer and ethylene or an α-olefin Copolymer, (3) an alkylene-type monomer and a non-conjugated ##, and an addition polymer such as an addition copolymer of other monomers required, (4) a norbornene type monomer a ring-opening (co)polymer and, if necessary, a resin obtained by hydrogenating a ruthenium (co)polymer, (5) a ring-opening copolymer of a norbornene type monomer and an ethylene or an α-olefin, and optionally a resin obtained by hydrogenating the (co)polymer, (6) a ring-opening copolymer of a norbornene-type monomer and a non-co-diene, or another monomer, and if necessary, hydrogenating the (co)polymer a ring-opening polymer such as a polymer. Examples of the polymer include a random copolymer, a block copolymer, an alternating copolymer, etc. The decene-based resin can be, for example, subjected to ring-opening metathesis polymerization. (ROMP), a combination of ROMP and hydrogenation reaction 'polymerization by radical or cation, polymerization using a cationic palladium polymerization initiator, using 93 It is obtained by all known polymerization methods such as polymerization of a polymerization initiator (for example, a polymerization initiator of nickel or another transition metal) of 201213360. Among the mysterious resins, it is preferably a ruthenium-based resin. Copolymer). In terms of transparency, heat resistance and flexibility, addition compounds are also preferred. For example, sometimes a film is formed by a photosensitive resin composition, and '35 is soldered. When installing electrical parts, etc., in the above case, it is necessary to have a higher thermal property, that is, resistance to reflow, so it is preferable to add A (co)polymer. Further, a film is formed by forming a photosensitive resin composition. In the case of a human product, it may be used, for example, in a force m: in a left-right environment. In the above case, it is preferable to add an (co)polymer to the viewpoint of heat, wherein 'northene-based resin It is preferred to contain a repeating unit of a reduced alkene having a substituent having a polymerizable group or a repeating unit having a substituent having an aryl group. The repeating unit ' of the norbornene having a substituent having a polymerizable group is preferably a repeating unit having a substituent having an epoxy group and having a repeating unit having a substituent of a (meth)acryl group. The repeating unit and the repeating unit (4) having a substituent containing a hospital oxygen group are one kind of various polymerizable groups, and those having a higher reactivity are preferably such polymerizable groups. Further, in the case of using a repeating unit containing two or more kinds of the above-mentioned polymerizable groups, it is desired to coexist flexibility (IV). On the other hand, by containing a repeating unit of a reduced olefin having a substituent having an aryl group, it is possible to more reliably prevent dimensional change due to water absorption and the like by utilizing extremely high hydrophobicity derived from an aryl group. 94 201213360 ' Further, the norbornene-based polymer is preferably a repeating unit containing an alkyl norbornene. Further, the alkyl group may be either linear or branched. By the repeating unit containing an alkyl norbornene, since the softness of the norbornene-based polymer becomes high, high flexibility can be imparted. Further, in the specific wavelength region (especially, the wavelength region in the vicinity of 850 nm: the transmittance of light of α is excellent, the norbornene-based polymer having a repeating unit of the alkyl group (four) is also preferable. Therefore, as the norbornene-based resin, those represented by the following formulas (丨) to (*) and (8) to (1) are preferable.

(In the formula (1), 1 represents a carbon number and a regular group, a represents a number b, and an integer of 1 to 3, and Pi/q! is 20 or less.) The pyrene-based resin of j (1) can be obtained by the following (1) is obtained by dissolving a drop having h (four), a side bond, and toluene in a toluene solution. 1 ° substance (A) is dissolved as a catalyst 95 201213360

Ph Ph

Further, a method for producing a norbornene having an epoxy group in a side chain is, for example, as described in (i) '(ii). (1) Synthesis of norbornene methanol (NB-CH2-〇H) CPD (cyclopentadiene) and alpha olefin (CH2=CH-CH2-) produced by cleavage of DCPD (dicyclopentadiene) OH) reacts at high temperature and pressure.

X = CHjOH (ii) Synthesis of epoxy norbornene It is formed by the reaction of norbornene methanol with surface gas alcohol.

Further, in the formula (1), in the case of the formula Ci), in the case where 13 is 2 or 3, the sulfhydryl fluorenyl group becomes an ethyl group, a propyl group or the like. Using the formula shown in equation (1)

And a and b are compounds of 1 respectively, &quot;, a T - a request for flexibility and preferably Rl is a carbon number of 4 to 1 烧, such as butyl hydrazine (tetra) methyl epoxide 96 201213360 : a base bond-reducing copolymer of a woman, a copolymer of hexyl amide (tetra) and a methyl methacrylate (tetra) (tetra) ene, a copolymer of decyl decazene and methyl epoxypropyl ether decene, and the like. ',

(Formula (7). Middle and reverse 2 represent a carbon number (7) alkyl group, ~ represents a hydrogen atom or a methyl group, C represents an integer of 〇~3, and p2/q2 is 2 Å or less.) The decene-based resin of the formula (7) may be It is obtained by dissolving a decene having a &amp; and a decene having an acrylic group and a mercaptoacrylic acid group in a side chain in toluene by solution polymerization using the above Ni compound (A) as a catalyst. Further, in the lanthanide-reduced polymer represented by (7), in view of the standability of heatability and heat resistance, a compound in which b is an alkyl group having a carbon number of 4 to 〇, and c is 1 is preferable. , for example, a copolymer of butyl norbornene with 2 (5-northenyl) decyl acrylate, a copolymer of hexyl decene and 2 - (5 - norbornenyl) acrylate, a sulfhydryl group A copolymer of an alkene and an acrylic acid 2_(5_educted alkenyl group). 97 201213360

In 3), R4 represents an alkyl group having a carbon number of 1 to 10, each bomb: ΐ: although gold I 1 J Λ Gan 八 3 knives / η, the d represents an integer of 〇 〜 3, p3 / q3 is independent The carbon number is 20 or less. There is an alkane [the reduction of the fluorenyl group] is carried out by using the above-mentioned Ni compound (A) as a catalyst for solution polymerization of a decene having R4 and a side chain having a solution in toluene. And get. For carbon == "two: _ system aggregation", especially good for ~ characters. Said, and "1 or oxime is a methyl or ethyl group, which reduces the dilution and reduces the dilute ethyl dimethyl methoxy group, which reduces the dilution and the reduction of the dilute ethyl trimethoxy shi. Copolymerization of calcined diene = dilute and reduced copolymer of dilute ethyl trimethoate, disc base = copolymer with triethoxymide (four) hexyl group (tetra) copolymer of diradyl olefin, hydrazine Base-reduced olefin and triethoxyl 1 = polymer, butyl group (tetra) and trimethoxy sulphate (four) 八里ο $ 欠 - methoxy decyl olefin copolymer, hexa a copolymer of trimethoxycarbazide (10), etc. 98 201213360

The base of the burnt group, Αι and A2 are independent (wherein, r5 represents the number of carbons; - "Mhy" word indicates a substituent represented by the following formula (5) to (7), but not the same substituent Further, 2 〇 or less) is obtained by diluting R6 with R6, dissolving it with a side bond, and dissolving it in a stupid liquid, and obtaining a liquid crystal by using N 2 (4). Dissolve as a catalyst

(Expression 5), where e represents an integer of 〇~3, and f represents an integer of 卜)

99 201213360 number) (In the formula (6), R6 represents a hydrogen atom or a sulfhydryl group, and g represents a whole of 〇~3

焼 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基 基It can be used as a butyl-reduced olefin, a hexyl-reduced olefin or a fluorenyl-reduced olefin, and an acrylic acid (2·5-reduced alkenyl group), and a reduced ethylidene trimethoxy group. a copolymer of any one of a base stone, a diethoxy decyl decene, or a tridecyl decyl decene; a butyl decene, a hexyl decene or a decyl decene Any one, a terpolymer of 2-(5-northenyl)methyl acrylate, and a decyl epoxypropyl ether decene; butyl norbornene, hexyl decene or decyl Any of the decenes, with decyl epoxypropyl ether decene, nortenyl ethyl methoxy methoxy sulphur, diethoxy sylvestre or trisyloxy sulphate a terpolymer of any of the olefins, and the like. 100 201213360

Xl represents an oxygen atom or a methylene group, an integer of \ 〇 〜3, i * 千J clothing is not 1-3 (in the formula (8), 'R7 represents a methyl group or an ethyl group, and Ar represents an aryl group as a carbon atom. Or dream atom, i means the number 'p5/q5 is 20 or less) τ~, the 莰 chain contains the piano-(CH+Xi-XKRAyAr), the decene is dissolved in A

JL. A »/ *, 1 History N 5 is used as a catalyst for solution polymerization to obtain (8). Further, in the reduced rare polymer represented by (1), an oxygen atom, X2 is a halogen atom, and Ar is a phenyl group. ···, Furthermore, in terms of flexibility, heat resistance, and refractive index control, VIII: is: “The appearance of 'the oxygen atom is the atom, the ^ is the base, and the R8 is the nail. a compound in which 1, 1 is 1, and J is 2, for example, a copolymer of butyl decene and diphenylmethyl oxime (4) with diphenylmethyl oxime, hexyl ruthenium - ruthenium methoxy decane And a sulfhydryl group-derived base group I-based (tetra) methoxy oxime copolymer. It is preferable to use the following (four) resin as the eighth body and 5'. 201213360

(R7, R8, P5, q5, and i in the formula (9) are the same as in the formula (8)) Further, in terms of flexibility, heat resistance, and refractive index control, the formula (8) may be used. R7 is a C 4~1〇 alkyl group, &amp; is an anthracenylene group, \ is a carbon atom, ΑΓ is a phenyl group, Rg is a hydrogen atom, and 丨 is 〇', such as butyl norbornene and a copolymer of phenylethyl norbornene, a copolymer of hexyl thiophene and a condensed base ethyl group, a copolymer of fluorenyl thiol and phenylethyl norbornene, and the like. Further, the following may be used as the norbornene-based resin.

(10) (In the formula (10), the radix of the stone inverse number 1 to 10 represents a square group, and k is 0 or more and 4 or less. P6/q6 is 20 or less) 102 201213360

Pi q! P3/q3, p5/q5, p6/q6 or p4/~+r may be preferably 15 or less, more preferably 0.1 to 10, as long as it is p. Thereby, the effect of containing a plurality of repeated units of reduced rareness can be fully utilized. The above-mentioned decyl-based resin preferably has detachment property. The detachment property means that it is detached by the action of an acid. V, body and. Preferably, it is at least one of a structure, a Si. group structure, and an -O-Si. structure in the molecular structure. The acid detachment group is relatively easily detached by the action of a cation. Here, as a detaching group which lowers the refractive index of the resin by detachment, k is preferably at least one of a -S!-diphenyl structure and a _〇_Si-diphenyl structure. For example, in the (4) olefin polymer represented by the formula (8), X is an oxygen atom x2 is Shi Xiyuan? When Ar is a phenyl group, it has a detachment base. Further, in the formula (3), the portion of Si_〇X3 of the alkoxyfluorenyl group may be detached. For example, in the case of using a decene-based resin of the formula (9), it is possible to carry out a reaction by the acid produced by a photoacid generator (referred to as PAG) as follows. Here, only the part of the detachment group is shown, and the case where i = 1 is explained.

Further, in addition to the structure of the formula (9), the film may be provided with a ring 103 201213360 in the side chain. The effect of the film having excellent adhesion is as follows: the base 1 has a specific value of 0 as the above, and the following

(In the formula (3 1 ), 'P7/q7 + r2 is 20 or less) The compound represented by the formula (3 1 ) can be, for example, by making hexylnordecene, and a radical methylnordecene methoxy decane (for example). In the side chain, -CH2-0-Si(CH3)(Ph)2 "Descending (tetra)) &amp; epoxy drop (iv) was dissolved in toluene and obtained by solution polymerization using a Ni compound as a catalyst. ((B) a monomer having a cyclic ether group or a polymer having a cyclic ether group) Next, the component of (B) will be described. Component (B) is at least one of a monomer having a cyclic ether group and an oligomer having a cyclic ether group. The component (B) may be a resin having a refractive index different from that of the component (A) and compatible with the resin of the component (A). The difference in refractive index between the component (B) and the resin of the component (A) is preferably 〇 以上 1 or more. Further, the component (B) may have a higher refractive index than the component (a), but it is preferred that the component (B) has a lower refractive index than the component (a). The monomer having a cyclic ether group of the component (B) and the oligomer 104 having a cyclic ether group are in the presence of an acid, and by the diffusibility of the oligomer, the monomer 11:: When considering the molecular weight of the monomer or the oligomer (... (weight average molecular weight), 400 or less. The amount of the knife is preferably 100 or more, respectively, and the knives (B) have, for example, an oxetane It is preferred that the acid is easily ring-opened, and the above-mentioned oxy group is a monomer having an oxetan group and a valence group having an oxetan group, and is preferably selected from the following formula (11). ) The group of ~10 is used. By using 5 Xuan et al., which has excellent transparency near the wavelength of 850 nm, it can combine flexibility and heat resistance. Moreover, these can be used alone or mixed. .

(11) (12) 105 (14)201213360 c2h5

(16)

- 〇C2H5 voc2h5 (17 )

(18) (in the formula (18), n is 0 or more and 3 or less)

106 (20) (20)201213360

In the above monomers and oligomers, from the viewpoint of ensuring a difference in refractive index from the resin of the component (A), it is preferred to use the formula (丨3), (丨5), (丨6), ( 17), the compound represented by (20). Further, it is preferable to use the formula (20) in view of the fact that the resin of the component (A) has a refractive index difference, the molecular weight is small, the mobility of the monomer is high, and the monomer is not easily volatilized. A compound represented by the formula (15). Further, as the compound having an oxetane group, a compound represented by the following formula (32) or formula (33) can be used. It is represented by the formula (32). As the compound represented by the formula "3. 3), the product name of the East Asia Synthetic Co., Ltd. can be used.

107 201213360

(Formula (33) Let 'n be ! or 2) an oligomer having an epoxy group, and the monomer or oligomer is based on an acid. Examples of the monomer having an epoxy group include, for example, the following In the presence of an epoxy group, it is polymerized by ring opening. As the monomer having an epoxy group and the oligomer having a % oxy group, the following formulas (34) to (39) may be used. Among them, the alicyclic epoxy monomer represented by the formulae (36) to (39) is preferably used from the viewpoint that the epoxy ring has a large energy and is not excellent in the properties of the epoxy ring. Further, the compound represented by the formula (34) is an epoxy norbornene as the above compound, and for example, ΕρΝΒ manufactured by Pr〇merus Co., Ltd. can be used. The compound represented by the formula (35) is 7 • glycidoxypropyltrimethoxydecane, and as the compound, for example, Z-6040 manufactured by T〇ray D〇w C〇rning SiHc〇ne Co., Ltd. can be used. The compound represented by the formula (36) is 2-(3,4-moroxycyclohexyl)ethyldimethoxycarbazide, and as the compound, for example, E0327 manufactured by Tokyo Chemical Industry Co., Ltd. can be used. Further, the compound represented by the formula (37) is 3,4-epoxycyclohexylmethyl-3,'4 epoxycyclohexanoic acid, and as the compound, for example, it can be used.

Celloxide 2021P manufactured by Daicel Chemical. Further, the compound represented by the formula (38) is 1,2-epoxy-4-vinylcyclohexane, and as the compound, for example, Celloxide 2000 manufactured by Daicel Chemical Co., Ltd. can be used. 108 201213360: Further, the compound represented by the formula (39) is 1,2:8,8 epoxide, and as the compound, for example, Celloxide 3000 manufactured by Daicel Chemical Co., Ltd. can be used.

/°

(3 6) (3?) 0

Further, a monomer having an oxetanyl group, a monomer having an oxa group 109 s 201213360 ==, :: a ring having a monocyclic ring having an epoxy group; The oligomerization of the oxetan group and the initiation of the polymerization start slowly, but the growth reaction is faster. In this case, the monomer having an epoxy group and the polymer having an epoxy group start to aggregate. The reaction is faster, but the growth reaction is slower. Therefore, by using a monomer having an oxygen ring, an oligomer having an oxetane group, and/or a monomer having a %oxy group, having a ring The oligomeric oxy group 16' can reliably generate a difference in refractive index between the irradiated portion of the light or the active radiation and the unirradiated portion when the light is emitted or the active radiation. The amount of the component (B) added is relative to the component (A). 1 part by weight, preferably 1 part by weight or more, 5 parts by weight or less, more preferably 2 parts by weight or more and 2 parts or less of the replacement part. Thereby, the core/coating refractive index can be achieved. Modifications and the effect of coexistence between flexibility and heat resistance. ((C) Photoacid generator) As a photo-k generator, only It is preferable to produce a Bronsted acid or a Lewis acid for absorbing light (active radiation), and examples thereof include triphenyl nickel trifluoromethanesulfonate and tris(4·tributylphenyl). Nickel salts such as nickel-trifluorodecanesulfonium sulphate; diazonium salts such as p-nitrophenyldiazonium hexafluorophosphate; sulfonium salts, scale salts; diphenylsulfonium trifluorosulfonate Cone salts such as salt, (triisopropylphenyl) ruthenium-tetrakis(pentafluorophenyl)borate; quinone dlazide; bis (phenylsulfonyl) diazonium Sulfonate; 1-phenyl-1-(4-mercaptophenyl)sulfonyloxy-p-benzoyldecane, N-hydroxynaphthalene imine-trifluorodecanesulfonate, etc. Acid esters; disulfones such as diphenyl disulfone 110 201213360 'di(2,4,6 -trimethylmethyl)-all three D wells, 2-(3,4-indenylenedioxyphenyl) -4,6-bis(trichloromethyl)_three-tillage and other compounds such as three-tillage. These photoacid generators can be used alone or in combination of multiple species. The content of photoacid generator is relative to (A 100 parts by weight of the component, preferably 0.01 part by weight or more and 0.3 part by weight or less More preferably, it is 2 parts by weight or more and 0 2 parts by weight or less, whereby the effect of improving reactivity is obtained. The photosensitive resin composition may be in addition to the above components (A), (B), and (c). An additive containing a sensitizer, etc. The sensitizer has a function of increasing the sensitivity of the photoacid generator to light (active radiation) and reducing the time (or reaction) of activation (reaction or decomposition) of the photoacid generator, and The wavelength change of the light (active radiation) is a function suitable for the wavelength of activation of the photoacid generator. The sensitizer may be appropriately selected depending on the sensitivity of the photoacid generator or the peak wavelength of absorption of the sensitizer. It is not particularly limited, and examples thereof include an anthraquinone such as 9,1〇-dibutoxy anthracene (CAS No. 76275-14-4), a π-ketone, a quinone, a phenanthrene, and a chopstick. , benzo-flowers, fluoranthenes, red fluorenes, auxiliaries, indanthrene, thiopurine 9 ketones (thi〇xanthen-9-_s), etc., which can be used alone, Or use in the form of a mixture. Specific examples of the sensitizer include, for example, 2—isopropyl_9h-sulfur—9·嗣, 4-isopropyl-9H-sulfanylindole, n4_propoxyoxysulfide, ^ Phenothiazine or a mixture of these. The content of the sensitizer is preferably 〇〇ι: % or more, more preferably 0.5% by weight or more, and further preferably more than $% by weight, in the photosensitive resin composition. 111 201213360 Further, the upper limit is preferably 5% by weight or less.

The characteristics of the obtained core layer 丨 093 (optical waveguide 1 〇〇 9) can be improved. As the antioxidant, it can be preferably used from New

Ciba Specialty Chemicals of Tarrytown obtained ciba (registered by ‘, the same as below) irganox (registered trademark, the same below) 1〇76 and Ciba IRGAFOS (registered trademark, the same below)168. Further, as the other antioxidant, for example, Ciba Irgan〇x (registered trademark, the same applies 129), Ciba Irganox 1330, Ciba Irganox (registered trademark) 3 114, Ciba Irganox 3 125, or the like can be used. Further, the above-mentioned antioxidant may be omitted, for example, when the film 19 is not exposed to oxidizing conditions or when the exposure time is extremely short. In the above photosensitive resin composition, a cycloolefin resin having a debonding group as a component (A), a photoacid generator containing the component (C), and the following formula as the component (B) are particularly preferable. A photosensitive resin composition of the first monomer described in (1).

112 201213360 The following is a description of the preferred photosensitive resin composition. As the cycloaliphatic resin (A) constituting the cycloaliphatic resin having a cleavable group in the side chain, the above may be used, and examples thereof include a polymer of a monocyclic monomer such as cyclohexanol or cyclooctane; (4), Dizedil, Dicyclodecadiene, Dihydrodicyclopentadiene, Tetracyclodene, Tricyclopentadiene, Dinitrotricyclopentanyl, Tetracyclopentadiene, Dihydrotetragen A polymer of a polycyclic monomer such as cyclopentane or the like. Among these, it is preferred to use a cycloolefin resin selected from the group consisting of polycyclic monomer monomers. Thereby, the heat resistance of the resin can be improved. Further, as the polymerization form, a known form such as random polymerization or talk polymerization can be applied. For example, as a specific example of polymerization for reducing a rare monomer, a copolymer of a (re)polymer of a norbornene type monomer, a norene-type monomer, and another copolymerizable monomer such as an olefin, and the like The vaporization of the copolymer and the like are in accordance with specific examples. The ring-forming resin can be produced by a known polymerization method, and the polymerization method includes an addition polymerization method and a ring-opening polymerization method, and the above-mentioned ring-shaped furnace obtained by an addition polymerization method is a ring-shaped furnace. (especially a decene-based resin) P'-addition polymer of a decene-based compound). Thereby, it is excellent in transparency, heat resistance, and flexibility. The above-mentioned detachment group means that the cleavage is caused by the action of the acid I H generated by the photoacid generator. Those who are separated from each other. Specifically, it has a molecular structure (side chain) having at least one of the above-described ? structure, -Sl-: two structure, and -〇-Sl- structure. The detachment group as described above is relatively easily detached by the action of the acid (H+). 113 201213360 In the above-mentioned release group, at least one of a -Si-diphenyl structure and a _〇_Si_diphenyl structure is preferable as the detachment group which lowers the refractive index of the resin by detachment. The content of the above-mentioned detachable group is not particularly limited, and is preferably 8% to 8% by weight, particularly preferably 20 to 60% by weight, based on the olefin resin having a cleavable group in the side chain. When the content is within the above range, in particular, the flexibility and the refractive index modulation function (the effect of increasing the refractive index difference) are excellent. The cycloolefin resin having a cleavable group in the side chain is preferably a repeating unit represented by the following formula UCH) and/or the following formula (1〇2). This can increase the refractive index of the resin.

(101) an integer of 9 or less) (In the formula 101, η is 〇 or more 114 201213360

The photosensitive resin composition contains a monomer recorded by the above formula (hereinafter referred to as a first monomer, whereby the refractive index difference between the core and the cladding can be further expanded. The content of the monomer is not particularly limited, and is preferably a part by weight or more based on 1 part by weight of the cycloolefin resin having a leaving group in the side chain: 5 parts by weight or less, particularly preferably 2 parts by weight or more. 20 parts by weight or less. Thereby, the refractive index change between the core and the coating can be achieved, and the flexibility and heat resistance can be achieved. As described above, the second monomer is desorbable from the side chain. When the cycloolefin resin is used in combination, the balance between the refractive index of the core and the coating is excellent in the balance of flexibility, and the reason is considered as follows. First, when the photosensitive resin composition as described above is used, The refractive index of the core/coating is excellent, because the reactivity of the first monomer is obtained by the polymerization of light (active radiation) or the like, and the polymerization of the first monomer is carried out. Excellent. If the reactivity of the i-th monomer is excellent, the first one The hardenability becomes higher. The yield of the first monomer produced by the concentration gradient of 帛1 monomer is increased. The diffusivity of the first monomer produced by 201213360 is improved. Thereby, the light (active radiation), the radiation area and the unilluminated area can be increased. Further, since the first monomer is a functional group, the polymerization reaction is carried out, and the crosslinking density of the photosensitive resin composition is not so high. Therefore, the recyclability is also excellent. The material is not particularly limited, and may further contain a second monomer different from the above-mentioned second monomer. Further, the second monomer different from the above-mentioned first embodiment may be a monomer having a different structure, and the same In the above, the 'second monomer' may be contained as the component (B), and for example, two: "No, other than the one represented by the formula (1〇〇), other oxetane, t, B a compound such as a dilute compound, etc., preferably an epoxy compound = a cyclic epoxy compound) and a difunctional oxetane compound (a monomer having two oxetan groups) At least one of the above, whereby the reactivity of the first monomer with the above-mentioned ring-thin resin, by: The transparency is improved, and the heat resistance of the waveguide is improved. The second monomer is specifically a compound of the above formula (15), a compound of the formula (12), a compound of the above formula (11), and the above formula ((1). The content of the compound, the compound of the above formula (19), the compound of the above formula (or the compound: /, the resin: the second heavy monomer) is not particularly limited, and is preferably 1 part by weight or more, and 5 parts by weight with respect to the above-mentioned ring-dense portion. It is more preferably 2 parts by weight or more and 2 parts by weight or more of the reactivity with the above-mentioned second monomer in the weight part or less. #本,可可 k 116 201213360 Further 'the above-mentioned second monomer and the above-mentioned first single There is no particular limitation on the ratio of the combination of the 1 and the 1 body, and the weight ratio (the weight of the first monomer in the above-mentioned first body) is af, preferably 〇.1 to 1, especially preferably 〇 1 兀 live horse 0.1~0.6. When the combined ratio is within the above range, the reactivity is high, and the balance of the heat resistance of the anti-conversion is excellent. The content of the photo-acid generator is not particularly limited, and has a debonding group with respect to the above-mentioned side bond. The amount by weight of the cycloolefin-based resin (10) is preferably 重量1 part by weight or more, 〇.3 parts by weight or less, more preferably 0.02 part by weight or more, or 0.2 part by weight or less. If the content is less than the lower limit value, the reactivity may be lowered. When the content exceeds the above upper limit, coloring may occur in the optical waveguide, and light loss may be reduced. The photosensitive resin composition may contain a curing catalyst, an antioxidant, or the like in addition to the above-mentioned cycloolefin-based resin, photo-acid-producing first monomer, and second monomer. Further, the photosensitive resin composition used in the present invention can be used as a composition for forming a core portion %. (Manufacturing Method of Optical Waveguide) Figs. 16 to 18, 28, 29, 30, 38, 39, and 40 are cross-sectional views each schematically showing a procedure example of a method of manufacturing an optical waveguide. Here, a method of producing an optical waveguide using a photosensitive resin composition in which the refractive index of the component (B) is lower than that of the epoxy resin of the component (a) will be described as an example. Further, the manufacturing method of the 'optical waveguide 9' is the same as that of the optical waveguide 9, and therefore the optical waveguide 9 is representative. First, as shown in Figs. 16(A), 28(A), and 38(A), the photosensitive 117 201213360 resin composition is dissolved in a solvent to prepare varnish 9 〇〇, 19 〇〇, 29 〇〇 (hereinafter also It is referred to as varnish 900)' The varnish 9 is applied to the coating layers 91, 1091, and 2091 (hereinafter also referred to as a coating layer 91). The solvent for preparing the photosensitive resin composition into a varnish is, for example, a solvent. Diethyl ether, diisopropyl ether, 1&gt;2-dimethoxyethane (Cong), 1'4 oxime, tetrahydrofuran (THF), tetrahydropyran (THP), anisole, diethyl An ether solvent such as diglyme or diethylene glycol diethyl ether (carbitol); a solvent such as methyl stilbene, ethyl 赛路苏, phenyl 赛路苏; hexane, An aliphatic hydrocarbon solvent such as pentane 'heptane or cyclohexane · an aromatic fumes such as toluene, xylene, benzene or mesitylene; 'mouth ratio well, 吱 吼 ' 吼 嗔, 嗔 、, A A solvent such as an aromatic heterodimer such as a bite; a guanamine solvent such as N,N-:f-methylformamide (DMF) or n,n•dimethylethyl (DMA); dichloromethane; Gas imitation,! , 2_2^ acetaminophen compound solvent, · ethyl acetate, acetic acid, acetic acid, ethyl acetate, solvent; diterpene sulphur (DMS 〇), ring butyl stone, etc. a solvent; or a mixed solvent of the same. The cold 4 is then applied to the cladding layer 91 of the optical waveguide 9 by applying varnish 9 〇〇 and then dried to evaporate the solvent (desolvation). Thereby, as shown in Fig. 进, (B), and 38 (8), 'varnish _ is used for forming an optical waveguide. 28 The film 910 is formed with a core portion 94? The core layer (hereinafter also referred to as the cladding portion 95) = 1093, 2093 (hereinafter also referred to as the core layer 93). Here, examples of the method of applying the varnish 900 include a method, a spin coating method, a dipping method, and a table coating method. 1 Fog=knife 118 201213360 Applicator method, curtain coating method The method of the die coating method, but is not limited to these. As the coating layer 91, for example, a sheet having a refractive index lower than that of the core portion 94 can be used, and for example, a sheet containing a norbornene-based resin and an epoxy resin can be used. Then, the film 910 is selectively irradiated with light or active radiation (e.g., ultraviolet light). At this time, in Fig. 17 (A), 29 (A), and 39 (as shown in A, a mask 形成 in which an opening is formed is disposed above the film 91 〇, 1910, and 2910 (hereinafter also referred to as a film 910). The opening of the mask M emits light (active radiation) to the film 91. The light (active radiation) used is, for example, a wavelength of 2 (eight) and a peak wavelength in the range of 450 μm. The composition of the photo-acid generator can be activated relatively easily. The constituent material of the mask M can be appropriately selected depending on the active radiation to be irradiated. Specifically, it is used as a constituent material of the mask m. (4) The material that illuminates the active radiation irradiated to the upper _91G is the one having the above characteristics, and the material of the mask 太 is too | n ± any known one. The material itself may be used or may be The formed (otherwise formed) (for example, a plate-shaped one) is formed by, for example, a vapor phase film formation method or a coating method on 910. The light produced by the substrate or the like is preferable as a mask. Cover, mold core, sapphire glass or enamel splash, etc.) f A , plate cover Cover and hunting are made by gas phase smelting method (vapor deposition, or stencil mask. The reason for beans is 4, especially the use of reticle - because the fine pattern can be formed accurately, 119 201213360 and easy to operate, favorable Further, the amount of irradiation of light (active radiation) is not particularly limited, but is preferably about 0.1 to 9 j/cm 2 , more preferably about 0.2 to ό J/cm 2 , and more preferably 0.2 to 2 3 J/cm2 or so" In the case of using light with high directivity (active radiation) such as laser light, the use of the mask can be omitted. In the film 910, the area irradiated by light (active radiation) The acid is generated by the photoacid generator, and the component (Β) is concentrated by the acid produced. In the region not irradiated with light (active radiation), the acid is not produced by the photoacid generator, so the component (Β In the irradiated portion, the component (β is polymerized to form a polymer, so the amount of the component (Β) is reduced. Accordingly, the component (8) of the irradiated portion is diffused to the irradiated portion, whereby the photo is irradiated with and not irradiated. Partially produces a refractive index difference. Here' When the refractive index of the component (8) is lower than that of the epoxy resin, since the component (8) of the unirradiated portion diffuses to the irradiated portion, the refractive index of the portion becomes high, and the refractive index of the irradiated portion becomes low. Further, the component (Β) The refractive index difference A of the monomer which is polymerized to form a base. The difference between the substance and the ring 耵 outer 为 is 0 or more, 0.001 or less + y, and the irradiance is substantially the same. The ns are enduring the acid: the Γ resin In the case of the composition, the polymerization of the knives (B) can be started by the production of the acid generated by the enthalpy. Further, the ring-forming resin base used in the present invention is not necessarily used in the use of the right amine. When it has a detachment from the use of a cycloolefin having a cleavage group, the following effects occur.乍为成刀(A): 120 201213360 In the part of the illuminating light (active radiation), the detachment group of the cycloolefin resin is detached by the acid generated by the photoacid generator. In the case of a detachment group such as a _si_aryl structure, a -Si-diphenyl structure, and a -〇-si-diphenyl structure, the refractive index of the resin can be lowered by detachment. Therefore, the refractive index of the irradiated portion is further lowered as compared with before the detachment of the detachment group. Then, the film 91 0 is heated. In this heating step, the component (B) of the irradiated portion irradiated with light (active radiation) is further polymerized. On the other hand, in this heating step, the component (B) of the unirradiated portion is volatilized. Thereby, the component (B) is reduced in the unirradiated portion, and a refractive index close to that of the cycloolefin resin is formed. In the 5th film 910, as shown in Figs. 17(b), 29(b), and 39(b), the region irradiated with light (active radiation) becomes the cladding portion 95, and the non-irradiated region becomes the core portion 94. The concentration of the structure derived from the above component (b) in the core portion 94 is different from the concentration of the structure derived from the above component (8) in _95. Specifically, the core concentration of the component (8) is lower than the concentration of the structure derived from the component (B) in the coating portion 95. The refractive index of the crucible 95 is lower than the core portion %, The difference in refractive index between the cladding portion % and the core portion 94 is Λ, and the horse is 0.01 or more. By the above-described manner, the core portion 94 and the cream 郫 匕 and 匕 4 4 95 are formed on the film 910 to obtain the core layer 93. In the step, the twisting, the field. The degree of the dish is not particularly limited, preferably about 30 to 18 ° ° C, more preferably 4 〇 ~ 16 (around rc, heating time is better for the news a horse sigh For the light-emitting (active radiation), the component (B) of the irradiated portion is substantially terminated, and specifically, it is preferably about 1 to 2 hours, more preferably 0.1. ～1 hour or so. 121 201213360 Thereafter, a film β similar to the coating layer 91 is attached to the core layer 93. The film is a coating layer 92, 1092, and 2092 (hereinafter also referred to as a coating layer 92). The cladding layers 91 and 92 are disposed in a direction different from the cladding portion 95 so as to sandwich the core portion 94. Further, the cladding layer 92 may not be borrowed. It is formed by coating a liquid material on the core layer 93 and hardening (curing) it by attaching a film shape. As a coating method of the coating layer 91 (92), it can apply a coating material. A method of hardening (curing) a varnish (a material for forming a coating layer), a method of applying a curable monomer composition, and hardening (curing) a method of forming a package by a coating method In the case of the coating layer 91 (92), for example, a spin coating method, a dipping method, a table coating method, a spray method, an applicator method, a curtain coating method, a die coating method, or the like can be mentioned. Examples of the constituent material of (92) include an acrylic resin, a mercapto acrylic resin, polycarbonate, polystyrene, epoxy resin, polyamine, polyimide, polybenzoxazole, A cycloolefin-based resin such as a benzenecyclobutene-based resin or a decene-based resin may be combined with one or more of these kinds (polymer alloy, polymer mixture (blend), and copolymer 7 composite (layered) Use, etc.), etc., especially in terms of excellent heat resistance Preferably, it is a cycloolefin-based resin such as an epoxy resin, a polyimine, a polybenzoxazole, a benzocyclobutene resin or a decene-based resin, or the like In particular, it is mainly a decene-based resin (northene-based polymer). The decene-based polymer is excellent in heat resistance, so it is used as a coating 122 201213360 layer 91 (92). In the optical waveguide 9 of the material, when the conductor layer is formed in the optical waveguide 9, and the wiring is formed in the processed conductor layer, even when the optical element or the like is heated, the coating layer 91 (92) can be prevented from being softened and deformed. 'Because of the hydrophobicity of the vehicle crossover, the coating layer 91 (92) which is less likely to cause dimensional changes due to water absorption or the like can be obtained. It is also preferable that the norbornene-based polymer or the norbornene-based monomer as a raw material thereof is relatively inexpensive and is easily available. Further, the use of the decene-based polymer as the material of the coating layer W (92) is excellent in resistance to deformation such as f-curvature, and it is difficult to produce a coating layer even when the f-bending deformation is repeated. The peeling between the layers of the core layer 92 and the core layer is prevented to cause microcracking inside the cladding layers 91 and 93. Further, since it is of the same kind as the material which can be preferably used as the constituent material of the core layer 93, the adhesion to the core layer 93 is higher, and the coating layer 91 (92) and the core layer 93 can be prevented. The layers are peeled off. Thereby, the optical waveguide 9 capable of holding and maintaining the optical transmission performance of the optical waveguide 9 and having excellent durability can be obtained. The average thickness of the cladding layers 91, 92 is preferably about 0.145 times the average thickness of the core layer 93, more preferably about 0.3 to (3) times. Specifically, the average thickness of the cladding layers 91, 92 is not particularly Limited, usually 1~~, preferably 5~1. ... around, and thus better: 10~6 〇 heart around. Thereby, the optical waveguide 9 can be prevented from being unnecessarily enlarged (compressed), and the function as a coating layer can be preferably exhibited. By the above steps, the optical waveguide 9 shown in Figs. 18, 3A, and 4B can be obtained. Further, in the case where the optical waveguide 9 is obtained by the photosensitive resin composition of the present invention, the solder reflow resistance is particularly excellent. Further, even in the case where the optical waveguide 9 is bent at 123 201213360, the light loss can be reduced. In the above description, the photosensitive resin composition is directly supplied onto the coating layer 91 to form a film 9 i (the case where the core layer is described), and the film 91G may be formed on the other substrate. After the core and the layer 93), the obtained core layer 93 is transferred onto the cladding layer 91 or the cladding layer 92, and thereafter the cladding layer 91 and the cladding layer % are overlapped via the core layer 93. The substrate is used, for example, 11 a substrate, a diced substrate, a glass substrate, a quartz substrate, a polyethylene terephthalate (pET) film, etc. Next, the effects of the present embodiment will be described. The photosensitive resin used in the present embodiment. When the composition is irradiated with light, an acid is generated by the photoacid generator, and polymerization of the component (9)) is carried out only in the irradiated portion. Thereby, the amount of the component (8) in the irradiated portion is reduced, so that the component (8) of the unexposed portion is diffused to the irradiating portion, whereby a refractive index difference occurs between the irradiated portion and the unirradiated portion. Specifically, in the present embodiment, the substituted or unsubstituted ring scutellaria having a higher refractive index than the component (B) is used as the matrix polymer, so that the component (8) of the unirradiated portion diffuses to the irradiation. Partly, the refractive index of the unirradiated portion is higher than the refractive index of the irradiated portion. Further, when the photosensitive resin = the object is heated after the irradiation of the light (active radiation), the component (8) is volatilized from the unirradiated portion. Thereby, a refractive index difference is further generated in the ..., the irradiated portion and the unirradiated portion. By using the photosensitive resin in a manner as described above, it is possible to form a refractive index difference between the irradiated portion and the unexposed portion by using the object. Further, according to the present invention, the core portion can be patterned by a simple method of irradiating light (active radiation). Example 124 201213360: If an exposure pattern such as a mask or the like is appropriately selected, an optical path (core portion) of an arbitrary shape or arrangement can be formed, and a finer optical path can be formed explicitly, thereby contributing to the circuit. The product is integrated and the device is miniaturized. Namely, according to the present invention, it is possible to obtain a core portion having a wide degree of freedom in designing a pattern shape of a core portion and having high dimensional accuracy. Further, a technique of crosslinking a norbornene-based resin having an oxetan group or the like by a thermal acid generator has been known. However, the composition used in the above technique contains a norbornene-based resin having an oxetane group or the like as a matrix polymer. Further, the composition heats the entire composition so that the composition as a whole has a parent structure. Therefore, the composition used in the prior art does not selectively generate light by selectively irradiating light (active radiation), and selectively generates polymerization to diffuse the monomer to a region where the monomer concentration becomes small, thereby forming a concentration difference. Technical thinking. In contrast, in the photosensitive resin composition used in the present embodiment, it is found that when light (active radiation) is selectively irradiated, the component (B) in the irradiated portion is caused by the generation of an acid. Since the amount is small, the component (B) which is not irradiated is diffused to the irradiated portion, whereby a refractive index difference is generated between the irradiated portion and the unirradiated portion. Further, in the case where the cycloolefin resin is desorbed by the photoacid generator, the refractive index of the cycloolefin resin of the component (A) is lowered by the detachment (in the case of the base) It is possible to surely reduce the folding &amplitude ratio of the region irradiated by the light (active radiation) to the unirradiated region phase tb. ^In other respects, the case of the cycloolefin resin is not the detachable matrix. Since the property is stabilized, it is possible to suppress the refractive index of the core portion and the cladding portion from being changed by conditions such as irradiation or heating of the light (active radiation 125 201213360 line). Further, in the present embodiment, 'the decene-based resin is used. As the component (A), it is possible to surely improve the light transmittance at a specific wavelength, and it is possible to surely reduce the propagation loss. Further, the refractive index of the cladding portion 95 is lower than that of the core portion 94 by The difference in refractive index between the covering portion 95 and the core portion 94 is 〇, 〇1 or more, and the light can be surely enclosed in the bobbin portion 94, and the generation of light propagation loss can be suppressed. On the other hand, it is known that the polymerization is contained. Matter, monomer, catalyst and catalyst precursor As a composition for forming an optical waveguide, wherein the 'single system forms a reactant by irradiation of light (active radiation), the refractive index of the region irradiated with light (active radiation) is different from that of the unirradiated region. Further, the 'catalyst precursor is a substance which starts a reaction of a monomer (polymerization reaction, crosslinking reaction, etc.) and is activated by a catalyst which is activated by irradiation of light (active radiation). The substance whose activation temperature changes is changed by the change of the activation temperature, and the temperature at which the reaction of the monomer starts is different between the irradiation region of the light (active radiation) and the non-irradiated region, and as a result, the reactant is formed only in the irradiation region. On the other hand, the photosensitive resin composition used in the present embodiment does not need to be a substance containing a large amount of a metal element as described above. Therefore, it is possible to prevent an increase in propagation loss as described above, and it is excellent in propagation efficiency and excellent in heat recovery. The optical waveguide 9. In the case where the above-mentioned previous composition is convenient to use, it can also be irradiated by the light 126 201213360 (active radiation). Although the core portion and the coating portion are formed, the refractive index difference between the core p. and the coating portion 95 can be further increased by the photosensitive resin composition used in the embodiment of the present yoke, and the heat resistance can be improved. The optical waveguide 9 having higher reliability is obtained, which is mainly produced by optimizing the composition of the component (a) and the component (B). The present invention can provide light propagation loss by using the above-mentioned photosensitive resin composition. When the optical waveguide film m which is suppressed is formed in the case where the curved optical waveguide is formed, the propagation loss of the light is remarkably suppressed at the time of the day, the sun, the moon, the moon, and the like. It is simple to process, and in a short time, obtains the optical waveguide 9 of the core portion 94 having the desired shape of the newspaper, a &gt; Next, the manufacturing method of the light guiding path will be described. In the case of forming the single conductor portion 24 in the through hole 1022 as in the fourteenth and fifteenth embodiments, first, a conductor is formed on the inner circumferential surface of the through hole 1022 by the above method. &quot;, followed by *, filling the core layer forming material 1 n . on the inner side thereof, and depending on the composition or characteristics of the core layer forming material 19 0 0, the irradiation of the active radiation And heating the core layer forming material 19 to cause the core to form the light guiding path 1024. In the case of self-hai, the formation of the optical path 1024 by the formation of the core layer 1093 of the channel 可09 can be formed as a ', the core of the derivative d, and the formation of the optical waveguide and the formation of the guide Step points. Thereby, it is possible to reduce the manufacturing of all or part of the =::: row heating step. ^The number of the steps is easier and shorter. 127 201213360 In the case of forming the vertical optical waveguide 1〇23 in the through hole 022 as in the above-described first, first, seventh, and eighth embodiments, first, By the above method, the conductor portion 1003' is formed on the entire circumference or a part (the rectangular portion 1224) of the inner surface of the through hole 1022, and then the inner layer (or the circular portion 1222) is filled with the material for forming the core layer, and then In the method of the core layer forming material 1900, for example, the active radiation is selectively irradiated to the portion of the filled core layer forming material 1900, for example (according to the composition or characteristics of the core layer forming material bay), at least i The heating method to form the core portion 1024 and the coating portion 1 () 25β with respect to the active radiation, the heating method or conditions, and other matters may be the same as described above. In this case, the formation of the core layer 1 〇 93 of the optical waveguide 1009 and the formation of the vertical optical waveguide 23 can be performed separately, and the core layer of the optical waveguide can be simultaneously formed and the vertical optical waveguide 23 23 Form all or part of the steps. For example, all or a part of the supply (coating & filling) step of the core layer forming material 1900, the irradiation step of the actinic radiation, the heating step, and the like may be simultaneously performed. Thereby, the number of steps of manufacturing can be reduced, making it easier to manufacture in a shorter period of time. Further, in the present invention, the basic structure, the layer constitution, the shape, the number, the arrangement, and the like of the optical waveguide structure are of course not limited to those shown in the drawings. Further, in the above-described respective embodiments, the light-emitting element ι 〇 〇 is used as a representative example, and a light-receiving element having a light-receiving portion may be mounted instead of the light-emitting element i G i 〇. In this case, for example, the optical waveguide (10) 9, the optical path conversion unit, and the optical path (core portion) M1 can be used to form the light receiving light transmitted to the light receiving element 128 201213360, or the light emitting element and the light receiving unit. In addition, *v L 4 loads at least one group. In the above embodiments, the example of the present invention is as follows: V may have a light-emitting element _ and any of the light-receiving elements - or two of the two may be a light-emitting element and a light-receiving element. Loading... Slightly. By. Further, the 'electronic circuit component (electronic circuit unit) may be omitted or more. The present invention is not limited to these embodiments based on the respective embodiments shown in the drawings, and the configuration of each component may replace any configuration of the same function of H. Further, the present invention is not limited to the above-described embodiments, and modifications, improvements, and the like in the range of the object of the cost are included in the present invention. Further, in the above embodiment, the optical waveguide film is formed using the photosensitive tree-like object, but the invention is not limited thereto, and may be used for a full-image film or the like. The above-mentioned photosensitive resin composition is suitable for forming a film in which a region having a high refractive index and a region having a low refractive index are mixed. 1. [Embodiment] Next, an embodiment of the present invention will be described. A. Production of Optical Waveguide (Example 1) (1) Synthesis of a reduced-resistance resin having a release group is controlled in a hand-working box filled with dry nitrogen at a moisture and oxygen concentration of less than i ppm. ML small glass bottle weighing hexyl norbornene ( HxNB ) 7.2 g ( 40.1 mmol ^ J - the present sulphur-based decyl decyloxy decane 12_9g (40.1 mmol), adding dehydrated a stupid 6 〇 2012 2012 2012 2012 60 g and B from the 乙 曰 曰 曰 ' ' ' ' ' ' ' ' ' ' ' ' , , , , , , , , , , , , , , , , , , , 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰 曰1.56 g (3.2 mmol) of the medium and 1 〇 mL of dehydrated toluene were placed in a stirrer chip and tightly plugged, and the catalyst was thoroughly stirred to completely dissolve it. The following chemical formula (B) was accurately weighed by a syringe. 1 mL of the Chuan catalyst solution was quantitatively injected into the above-mentioned dissolved #2 kinds of thin glass bottles, and the temperature was increased at room temperature for #丨 hours, and it was confirmed that the viscosity increased. At this time, the plug was pulled out. Add tetrahydrofuran (layer is stirred) to obtain the reaction solution. In a 100 m L beaker 9:5 g of acetic anhydride, 18 Torr of hydrogen peroxide (concentration: 3〇%), 30 g of ion-exchanged water, and stirring were carried out to prepare an aqueous solution of acetic acid on the spot. Then, the total amount of the aqueous solution was added to the above reaction solution and stirred. After 12 hours, the reduction treatment of Ni was carried out. Then, the reaction solution which was completed was transferred to a separatory funnel, and the lower aqueous layer was removed, and then 100 mL of a 3 % aqueous solution of isopropyl hydrazine copolyol was added thereto, and the reaction was vigorously carried out. After mixing, the water layer was removed after completely separating the two layers. After repeating the water washing process for 3 times in total, the oil layer was added dropwise to a very large amount of acetone, and the resulting polymer was further rubbed, Shi Dan-Human After being separated from the filtrate by filtration, it was dried by heating in a vacuum oven set to 60 ° C for 12 hours, thereby obtaining a polymer # GPC (Gel Permeation

Chromatography, gel permeation, W analysis, measurement, Mw = 100,000, Mn = 40,000. Moreover, the molar ratio of each of the surnames in the polymer #1 was determined by NMR, and the structure of the hexyl-norbornene structure was 50 m〇i%, and the diphenylmethylnorthene group 130 201213360 was rolled. The unit of the decane structure is 50 mol%. Further, the yield obtained by Metricon was 1.55 (measurement wavelength: 633 nm). # Η Ph

(B)

Polymer #1 (2) Production of photosensitive resin composition The purified polymer #1 was weighed in a 100 mL glass vessel, and thereto was added 40 mg of mesitylene and an antioxidant Irgan〇x 1〇. 76 (manufactured by Ciba-Geigy Co., Ltd.) 0.01 g, cyclohexyloxetane monomer (the first monomer represented by Formula 20 (Formula 1)), ch〇x manufactured by East Asia Synthetic Co., Ltd.

CAS#483303-25-9' molecular weight 186, boiling point 125 °C / 1.33kPa) 2 g, photoacid generator Rhodorsil Photoinitiator 2074 (Manufactured by Rhodia Company 'CAS#178233-72-2) ( 1.36E-2 g Ethyl acetate 〇"mL") 'after homogeneous dissolution' was filtered through a PTFE filter of 0.2 to obtain a clean photosensitive resin composition varnish V1. (3) Fabrication of an optical waveguide film (production of a lower cladding layer) :; ί 131 201213360 On a Shih-Ying wafer, a photosensitive resin composition (Promerus) is uniformly coated by a knife. After Avatrel 2000P varnish), put it into a 45 C dryer for 15 minutes. After the solvent was completely removed, the entire surface to be coated was irradiated with ultraviolet rays of 100 mJ, and heated in a dryer at 12 Torr for 1 hour to cure the coating film to form a lower cladding layer. The thickness of the underside cladding layer formed is 20 vm 'colorless and transparent, and the refractive index is 丨52 (measurement wavelength··6 = (formation of core layer) on the lower cladding layer' uniformly coated by a doctor blade After the photosensitive resin composition varnish VI was placed, it was put into a dryer of 45 t: for 15 minutes. After completely removing the solvent, the photomask was crimped, and ultraviolet rays were selectively irradiated at 500 mJ/cm 2 . The mask was removed and dried in a dryer. After 45 〇C3 〇 minutes, it was heated at 85 rpm for three minutes and at 150 tl hours. After heating, it was confirmed that a very clear waveguide pattern appeared. Further, the formation of the core portion and the cladding portion was confirmed. The formation of the coating layer is carried out on a polyethersulfone (PES) film. The dry film formed by laminating Avatrel 2000P in a dry thickness of 2 〇 #m is applied to the core layer, and a vacuum of 140 t is applied. The thermocompression bonding was carried out in the machine. Thereafter, the ultraviolet ray was irradiated at 100 mJ in total, and the Avatrel 2000P was hardened in a dryer at 12 Torr: for 12 hours to form an upper cladding layer to obtain an optical waveguide. The upper cladding layer is colorless and transparent, and its refraction It is i 52. (4) Evaluation (loss evaluation of optical waveguide) 132 VCSEL of 201213360 nm (the light emitted from the 850 illuminating laser through a 5 〇/z fiber in the surface of '200 沴 light) is introduced into the above light. The waveguide fiber receives light: the intensity of the light is measured. Further, the measurement system uses a back-cut (the method uses the longitudinal direction of the optical waveguide as the horizontal axis and the insertion loss as the vertical axis, and the measured values are accurately arranged on the straight line. The propagation loss can be calculated as 0.03 dB/em from the slope. (The difference in refractive index between the core portion and the cladding portion) The above-mentioned (formation of the core layer) is formed in the horizontal direction adjacent to the left and right core portions - between the cladding portions The difference in refractive index is obtained by the following method: The laser beam of 656 nm is irradiated to the optical waveguide by the pHcal waveguide analyzer 〇WA_95〇0 manufactured by EXF0 of Canada, and the refractive indices of the core region and the cladding region are respectively measured. The difference was found to be 0.02. (Example 2) (1) The synthesis of a decene-based resin having no detachment group was controlled to be equal to or less than 丨ppm and full. Dry nitrogen In a hand-held working box, weigh hexylpentene (HxNB) 9.4 g (53.1 mmol), phenylethyl-reduced olefin 1 〇 5 g (53 μmmol) in a 5 mL vial, add dehydrated toluene 6〇g and ethyl acetate ug, covering the encapsulation of tantalum and the upper part of the plug. Then, weigh the above-mentioned chemical formula (B) in a 100 mL vial to measure 2.06 g (3.2 mmol) 1 mL of dehydrated toluene was placed in a stirrer and the plug was tightly immersed, and the catalyst was thoroughly stirred to completely dissolve. Accurately weigh the Ni catalyst 133 201213360 solution represented by the above formula (B) with a syringe and accurately inject it into the glass bottle of the above two kinds of decene, at room temperature (4) In hours, the result confirmed that the apparent sound rose. At this time, the plug was removed and tetrahydrocethane (THF) 6Qg was added to obtain a reaction solution. In a (10) mL beaker, 95 g of acetic anhydride, nitrogen peroxide water μ (concentration: 30%), ion exchange enthalpy 30 git were added, and an aqueous solution of peracetic acid g was prepared on the spot. Then, the total amount of the aqueous solution was added to the above reaction solution, and the mixture was stirred for 12 hours to carry out a reduction treatment of Ni. Then, the reaction solution which had been subjected to the treatment was transferred to a separatory funnel, and after removing the lower aqueous layer, 1 〇〇 mL of a 3 〇% aqueous solution of isopropyl alcohol was added thereto, followed by vigorous stirring. The mixture was allowed to stand, and the water layer was removed after completely separating the two layers. After repeating the water washing process for a total of three times, the oil layer was added dropwise to a very large amount of acetone, and the resulting polymer was again precipitated, and after being separated from the filtrate by filtration, it was heated in a vacuum dryer of 60 C. The crucible was dried for 2 hours, whereby Polymer #2 was obtained. The molecular weight distribution of the polymer #2 was measured according to Gpc: Mw = 90,000 Mn to 10,000. Further, the molar ratio of each structural unit in the polymer #2 was determined by NMR, the structural unit of hexylpentene was 5 〇 m〇i%, and the structural unit of phenylethyl decene was 50 mol%. Further, the refractive index obtained by Metric〇n was 1.54 (measurement wavelength: 633 nm). 134 201213360

(2) Production of photosensitive resin composition 'Weigh 1 〇g of the above-mentioned polymer #2 purified in a 100 mL glass vessel, to which is added trisylbenzene 4 〇g, an antioxidant Irgan 〇 x 1 〇 76 (manufactured by Ciba-Geigy Co., Ltd.) 001 g, cyclohexyl oxetane monomer (manufactured by Formula 20, manufactured by East Asia Synthetic, ch〇X, CAS#483 303-25-9, molecular weight 186, boiling point is 125〇c /133 kPa) 2 g, photoacid generator

Rhodorsil Photoinitiator 2074 (manufactured by Rhodia, CAS#178233-72-2) (1.36E-2 g, ethyl acetate), uniformly dissolved, filtered through a 0.2 μm PTFE filter The photosensitive resin composition varnish V2. (3) Production of optical waveguide film (Production of lower cladding layer) The lower cladding layer was produced in the same manner as in Example 1. (Formation of Core Layer) On the lower cladding layer, the photosensitive sapphire composition varnish V2 was uniformly applied by a doctor blade, and then placed in a dryer at 45 ° C for 15 minutes. After the complete removal of the granules, the reticle is crimped and the ultraviolet ray is selectively irradiated at 500 mJ/cm2. The removal of the mask was carried out in a dryer at 45 » c minutes, at 85 &lt; t 3 〇 135 201213360 minutes, at 150 ° C for 1 hour in three stages. After heating, it was confirmed that a very distinctive waveguide pattern appeared. Further, the formation of the core portion and the cladding portion was confirmed. (Formation of Upper Side Coating Layer) The same upper side cladding layer as in Example 1 was produced. (4) Evaluation Evaluation was carried out by the same method as in Example 1. The propagation loss can be calculated as 0.04 dB/cm. The difference in refractive index between the core portion and the cladding portion is 〇.〇1. (Example 3) (1) Synthesis of norbornene-based resin having a debonding group A norbornene-based resin was produced in the same manner as in Example 1. (2) Production of photosensitive resin composition In a 100 mL glass container, 1 g of the purified polymer #1' was added thereto, and trisylbenzene 4 g was added thereto, and an antioxidant irgan〇x (Ciba- Ig.〇ig, a difunctional oxetane monomer (as shown in formula (15), d东亚X, CAS#18934-00_4, manufactured by East Asia, with a molecular weight of 214 and a boiling point of 11STC/0.67 kPa) 2 g, photoacid generator Rhodorsil Photoinitiator 2074 (manufactured by Rhodia, CAS#178233-72-2) ( 1.36E-2 g, ethyl acetate (in M mL), uniformly dissolved 'by 0.2 ym The PTFE filter was filtered to obtain a clean photosensitive resin composition varnish V3. (3) Production of optical waveguide film (production of lower cladding layer) A side cladding layer was produced in the same manner as in Example 1. 136 201213360 ( Formation of the core layer) On the lower layer of the lower cream layer, the photosensitive finger composition varnish V 3 was uniformly applied by a doctor blade, and then the heat λ / r was applied to the dryer of 45 C for 15 minutes. After removing the solvent, the dust is attached to the reticle, and the ultraviolet ray is selectively irradiated at 500 mW. The mask is removed in the dryer. The price is 30 minutes, 卩85. (: 30 minutes, 15 0 °C 1 small day Qin Ba - such as a 'knife two P white section heating. After heating, it is confirmed that there is a very distinctive waveguide figure and other patterns Further, the formation of the core portion and the cladding portion was confirmed. (Formation of the upper cladding layer) The upper cladding layer was formed in the same manner as in Example 1. (4) Evaluation was performed by the same method as in Example 1. Evaluation. The propagation loss was calculated to be 0.04 dB/cm. The difference in refractive index between the core portion and the cladding portion was 〇〇 1. (Example 4) (1) Synthesis and implementation of a decene-based resin having a detachment group The norbornene-based resin was produced in the same manner as in Example 1. (2) Production of photosensitive resin composition 10 g of the purified polymer #1 was weighed in a 100 mL glass vessel, and tris-benzene was added thereto. , antioxidant Irgan〇x 1〇76 (manufactured by CMba-Gdgy Co., Ltd.) 0.01 g, alicyclic epoxy monomer (expressed by formula (37), CeU〇xide 2〇21p, CAS#2386- manufactured by Daicel Chemical 87-0, molecular weight 252, boiling point 188〇c /4 hpa) 2 g, photoacid generator Rhodorsil Photoinitiator 2074 (Rhodia Manufacture 'CAS#178233-72-2 ) ( 1.36E-2 g, ethyl acetate 〇 1 mL), 137 201213360 After homogeneous dissolution, it was cleaned by 〇_2 // m PTFE filter The photosensitive resin composition varnish V4. (3) Production of optical waveguide film (Production of lower cladding layer) The lower cladding layer was produced in the same manner as in Example 1. (Formation of Core Layer) On the lower cladding layer, the photosensitive varnish t composition varnish V4 was uniformly applied to the knives, and then placed in a dryer at 45 ° C for 15 minutes. After completely removing the solvent, the photomask was crimped and the ultraviolet rays were selectively irradiated at 50 〇 mj/cm 2 . The removal of the mask was carried out in a dryer at 45 ° C for 30 minutes, at 851 30 minutes, and after 15 (TC 1 hour in three stages of heating), it was confirmed that a very distinct waveguide pattern appeared. Formation of core portion and coating portion. (Formation of upper cladding layer) The same upper cladding layer as in Example 1 was produced. (4) Evaluation was performed by the same method as in Example 1. The propagation loss was calculated as 0.04 dB/cn^ The refractive index difference between the core portion and the cladding portion was 〇〇ι. (Example 5) (1) Synthesis of a decene-based resin having a detachment group was produced in the same manner as in Example 1. Terpene-based resin. (2) Production of photosensitive resin composition in a 100 mL glass container. Weighing the above-mentioned polymer purified by adding mesitylene 40 g 'antioxidant irgan〇x attack ((10) heart (10) Manufactured by the company) g·〇1 g, cyclohexyloxyxanthene monomer (CHOX, manufactured by East Asia Synthetic, as shown in 138 201213360 20) 1 g, alicyclic epoxy monomer (manufactured by Daicel Chemical, Celloxide) 2021P) 1 g, photoacid generator Rhodorsil Photoinitiator 2074 ( Rhodia Manufactured, CAS#178233-72-2) ( 1.36E-2 g' acetate in 0.1 rnL), uniformly dissolved, 'filtered by 〇_2 PTFE filter to obtain clean photosensitive resin Composition varnish V 5. (3) Production of optical waveguide film (production of lower cladding layer) A lower cladding layer was produced in the same manner as in Example 1. (Formation of core layer) on the lower cladding layer The photosensitive resin composition varnish V5 was uniformly applied by a doctor blade, and then placed in a 45r drier for 15 minutes. After the cold was completely removed, the mask was pressure-bonded, and the ultraviolet ray was selectively irradiated at 5 〇〇 mJ/cm 2 . The cover was heated in a drier at 45 t3 〇 minutes, 8 generations of 3 〇, minutes, and = 1 hour in three stages. After heating, it was confirmed that a non-"light waveguide pattern appeared. Further, the core portion and the package were confirmed. Formation of the coating portion (Formation of the upper cladding layer) The same upper cladding layer as in Example 1 was produced. (4) The evaluation was as 0 to 03 dB/cm as in Example 1. The transmission loss was counted as The refractive index difference of the cladding portion is 0.01. C. Example 6) (1) The olefinic tree having a detachment group The synthesis of the decene-based resin was carried out in the same manner as in the first embodiment of the present invention. 139 201213360 (2) The photosensitive resin composition was weighed and weighed in a glass container of 10 mL. g The above-mentioned polymer #1 was purified, and 40 g of mesitylene, an antioxidant irgan〇x 1〇76 (manufactured by Ciba-Geigy Co., Ltd.), 〇丨g, cyclohexyloxetane monomer ( As shown in Formula 20, CH0X) manufactured by East Asia Synthetic Co., Ltd. 15 g, photoacid generator Rhodorsil Photoinitiatoi· 2074 (manufactured by Rh〇dia, CAS#178233-72-2) ( 1.36E-2 g, ethyl acetate 〇 "mL"), after the dissolution of the average sentence, was filtered by a 0.2 &quot;m PTFE filter to obtain a clean photosensitive resin composition varnish V6. (3) Production of optical waveguide film (Production of lower cladding layer) The lower cladding layer was produced in the same manner as in Example 1. (Formation of Core Layer) On the lower cladding layer, the photosensitive resin composition varnish V6 is uniformly applied to the knife, and then placed in a dryer at 45 ° C for 15 minutes. After completely removing the solvent, the pressure is crimped. The photomask selectively irradiates ultraviolet rays at 5 〇〇mj/cm2. The mask was removed and heated in a dryer at 45 ° C for 3 minutes to 85. The crucible was heated for 3 minutes, heated at 15 ° C for 1 hour, and heated in three stages. After heating, it was confirmed that a very sharp waveguide pattern appeared. Further, the formation of the core portion and the cladding portion was confirmed. (Formation of Upper Side Coating Layer) The same upper side cladding layer as in Example 1 was produced. (4) Evaluation Evaluation was carried out by the same method as in Example 1. The propagation loss can be calculated as 140 201213360 as 0.03 dB/cm. The refractive index of the core portion and the cladding portion is 0.0 0.01 〇 (Example 7) (1) The synthesis of the decene-based resin having a detaching group is controlled to be less than 1 ppm and the dry nitrogen is controlled at a moisture and oxygen concentration. Weigh the hexyl decene in a 500 mL vial in a hand-operated box. 6.4 § (36.1_υ, diphenylmethyl-decazide-oxygen-cut (diPhNB) 8.7g (27.1mm〇) i), epoxy-reduced ene (Qiu called soil 49 g (27.lmm〇l) 'added dehydrated benzene benzene 6 〇 g and acetic acid 丨 , ^, covered with the tamping of the plug, and the upper part of the bolt. In the 1〇〇mL small glass, drag the φ cat to stop L, 丄. The amount of the handle in the whistle bottle is the above-mentioned chemical formula (B), the Nl catalyst 丨'^(1) position (4) and the dehydrated one stupid 1 blush, put into the stirring The wafer is tightly packed, and the catalyst is fully stirred to completely dissolve it. The above-mentioned chemical formula w, the Ni touch and the cold liquid represented by the formula 1 β) are accurately weighed by a syringe, and the product is introduced into the ground. The above-mentioned three kinds of glass bottles which were reduced in dilute were mixed, and the mixture was stirred at room temperature for 1 hour, and it was confirmed that the viscosity was increased. At this time, the plug was pulled out, and hydrogen was added to obtain a reaction solution. The husband of Yufu Nan (Qing) was mixed, adding acetic acid Xuan 9 5 g, peroxidizing gas water core (/agronomy 30%), ion exchange water ^ A g to the tax in 2 (10) mL beaker, and preparing acetic acid water on the spot. Then, add the water to the reaction solution and stir for 12 hours to carry out the reduction treatment of Ni. The tax will then be completed. ... in the separatory funnel, '3G% aqueous solution of isopropyl alcohol (10)', it is stirred vigorously. It is allowed to stand still, 6 hard to remove the water layer after the separation of the two layers. Repeat this with 141 201213360 δ彳3 times After the water washing process, the oil layer was added dropwise to a very large amount of acetone to precipitate the polymer again, separated from the filtrate by filtration, and dried by heating in a vacuum dryer at 60 ° C for 12 hours. Polymer #3. The molecular weight distribution of polymer #3 was determined according to Gpc, 10,000, Μη == 40,000. Further, the molar ratio of each structural unit in the polymer #3 was determined by NMR, and the hexyl decene structural unit was determined. 4〇m〇l%, diphenylfluorenylnordecene decyloxydecane structure The position is 3 〇 m 〇 1%' epoxy decene structural unit is 30 mol%. Further, the refractive index obtained by Metricon is 丨53 (measurement wavelength: 633 nm).

(2) Production of photosensitive resin composition In a 100 mL glass container, 10 g of the purified polymer #3' was added thereto to add a uniformity of tetramethyl | 4 〇 g, an antioxidant _ brewing 1 〇 76 (Ciba-Geigy Manufactured by the company) 〇.1 g, cyclohexyl oxetane monomer (CHOX as shown in Formula 20, manufactured by Toago Chemical Co., Ltd.) 1 〇 Rhodorsil Photoinitiator 2074 (Manufactured by Rhodia g, Photoacid Generator, CAS# 1782 3 3-72-2 ) ( 1.36E-2 g, ethyl acetate 〇 1 mL), after dissolution, 'transition by 0.2 yn^PTFEm to obtain clean 142 201213360 : clean photosensitive resin composition varnish V7. (3) Production of optical waveguide film (Production of lower cladding layer) The lower cladding layer was produced in the same manner as in Example 1. (Formation of Core Layer) The photosensitive resin composition varnish V7 was uniformly applied onto the lower cladding layer by a doctor blade, and then placed in a dryer at 45 ° C for 15 minutes. After completely removing the solvent, the photomask was crimped and the ultraviolet rays were selectively irradiated at 500 mJ/cm2. The mask was removed in a desiccator at 45 art for 3 minutes and at 85. 〇3 〇, and 15 (TC1 hour, three stages of heating. After heating, it was confirmed that a very clear waveguide pattern appeared. Further, the formation of the core portion and the cladding portion was confirmed. (Upper cladding layer Formation) The same upper layer coating as in Example 1 was produced. (4) The evaluation was as shown in Table 1.

The evaluation result shows that the β-propagation loss can be calculated as 1 difference of 0.02. 143 201213360 [Table i]

In the examples 1 to 7, when the photosensitive resin composition is irradiated with light, an acid is generated from the photoacid generator, and polymerization of the monomer having a cyclic ether group is carried out only in the irradiated portion. Further, since the amount of the unreacted monomer in the irradiated portion is small, the monomer which is not irradiated is diffused to the irradiated portion in order to eliminate the concentration gradient generated between the irradiated portion and the unirradiated portion. 144 201213360 In addition, if heating is performed after light irradiation, the monomer is not irradiated from the unexposed portion according to the above relationship between the core portion and the cladding portion, and the concentration of the structure from the early body is different from that in the coating portion. Derived from a cyclic ether sense. The structure of the soil early body has a large number of bodies, and in the core part, it is derived from a hood having a cyclic ether group, and the structure is reduced. The reason for this is considered to be a relatively large refractive index difference between the core portion and the cladding portion. Further, in the first to seventh embodiments, a linear optical waveguide was formed and stretched in the case of an optical waveguide having a curved shape (having a radius of curvature of about 1 〇 mm); the light loss was remarkably small. Further, the optical waveguides obtained in Examples 1 to 7 have high heat resistance and have a reflow property of 260 °C. (Example 8) (1) Synthesis of a norbornene resin having a debonding group In the synthesis of a norbornene-based resin having a debonding group, phenyldidecylnordeceneoxydecane 1〇4 was used. The same operation as in Example 1 was carried out except that g (4 〇 1 mm 〇 1) was substituted for diphenyl decyl decylene decyloxy decane (12.9 g (40.1 mmo 1 )). The molecular weight of the reduced oxime resin B (formula 1 〇 3) obtained from the side chain having a cleavable group was measured by GPC, and Mw = 110,000 and Μ η = 50,000. Further, the molar ratio of each structural unit is 5 〇 mol% based on the identification of nmr, and the structural unit of phenyl fluorenyl decene oxime is 5 〇 mol%. Further, the refractive index obtained by Metricon was 1.53 (measuring wavelength: 633 nm) 〇 (2) Production of photosensitive resin composition 145 201213360 The same as in Example 1 except that the reduced-thinning resin B was used instead of the polymer #丨A photosensitive resin composition was obtained. (3) Production of optical waveguide film An optical waveguide was obtained in the same manner as in Example 1 except that the above-mentioned photosensitive resin composition containing a norbornene-based resin B was used. The loss of the optical waveguide was evaluated in the same manner as in Example 1. As a result, the propagation loss of the obtained optical waveguide film was 〇.03 dB/cm.

(103) (Example 9) (1) The same operation as in Example 1 was carried out except that the following was used as the photosensitive resin composition. 10 g of the decene-based resin obtained in Example i was weighed in a 100 mL glass vessel, and 40 g of stilbene was added thereto, and Irgan 〇x 1076 (manufactured by Ciba-Geigy Co., Ltd.) was added thereto. Cyclohexyloxybutane monomer (the first monomer represented by formula (100), Ch〇x, CAS#483303-25-9 manufactured by East Asia Synthetic, having a molecular weight of 186 and a boiling point of 125〇c/l 33kpa) 146 201213360 ig, difunctional oxetane monomer (second monomer represented by formula (104), DOX, cAS# 18934-00-4 manufactured by Toagosei, molecular weight 214, boiling point 119° C/0.67 kPa) ig, photoacid generator Rh〇d〇rsil

Photoinitiator 2074 (manufactured by Rhodia Co., Ltd., cas# 178233-72-2) (1.36E-2 g, ethyl acetate (M mL), uniformly dissolved, passed through a 〇2 /zm PTFE passer) A photosensitive resin composition varnish for a clean core layer was prepared. (2) Production of Optical Waveguide Film An optical waveguide film was obtained in the same manner as in Example 1 except that the photosensitive resin composition of the above (1) was used. 1 The loss evaluation of the optical waveguide was carried out in the same manner, and as a result, the propagation loss of the obtained optical waveguide film was 0.04 dB/cm.

(104) (Example 10) The same operation as in Example 1 was carried out except that the following was used as the ring thinner. (1) Synthesis of a decene-based resin c. A ring-opening metathesis polymerization of a phenylethyl norbornene (PENB) monomer is carried out by using a method of the A-head (for example, 曰本特开 2(8)弘(5)(6)号:) The oxime resin C represented by the following formula (1〇5). (2) Manufacture of photosensitive resin composition 147 201213360 A photosensitive resin composition was obtained in the same manner as in Example 1 except that the norbornene-based resin c was used instead of the polymer #1. (3) Production of optical waveguide film An optical waveguide film was obtained in the same manner as in Example 1 except that the above-mentioned photosensitive resin composition containing the norbornene-based resin C was used. The loss of the optical waveguide was evaluated in the same manner as in Example 1. As a result, the propagation loss of the obtained optical waveguide film was 0.05 dB/cm.

(Example 11) An optical waveguide film was produced in the same manner as in Example 1 except that the amount of the first monomer was changed to 〇 5 g. Furthermore, the propagation loss of the optical waveguide film is known to be 〇1〇 dB/cm. (Example 1 2) An optical waveguide film was produced in the same manner as in Example 1 except that the amount of the first monomer was changed to 4.0 g. Furthermore, the propagation loss of the obtained optical waveguide film was 〇1〇dB/cm. 148 201213360 (Comparative Example 1) An optical waveguide film was produced in the same manner as in Example 1 except that the first monomer was not used. Further, the propagation loss of the obtained optical waveguide film was 0.90 dB/cm. (Comparative Example 2) (1) Synthesis of each component <Catalyst precursor: Synthesis of Pd(〇Ac)2(P(Cy)3)2&gt; In a 2-neck round bottom flask equipped with a funnel, at - 78. (: A reddish brown suspension consisting of Pd(〇Ac)2 (5_〇〇g, 22 3 mm〇1) and CH2Cl2 (3 blush) was stirred under stirring. P(Cy)3 was added to the funnel (13.12) mL (44.6 mmol) of CH2C12 cold liquid (30 mL), and added dropwise to the stirred suspension over 5 minutes. As a result, it gradually turned from reddish brown to yellow. After the hour, the suspension was warmed to room temperature, and then mixed for 2 hours, and diluted with hexane (2 〇 mL). Then, the yellow solid was transferred in air and washed with sputum (5 χΐ〇 mL ). The mixture was vacuum-dried. The collected product was cooled to the same temperature and separated, and washed and dried in the same manner as above to obtain a catalyst precursor. (2) The photosensitive resin composition was produced in 100 mL. Weigh 1 〇g of the above-mentioned polymer purified in a glass container. Adding a uniform of $40 g, an antioxidant Irg靡 (Ciba-Geigy & Division) 0_01 g, and diterpene double Oxy) decane (SiX) 2.4g, the above catalyst precursor (2 6E_2g), photoacid generation 149 201213360 agent Rhodorsil Photoin Aitiator 2074 (manufactured by Rhodia Co., Ltd., raw CAS#17823 3-72_2) ( 1.36E-2 g, ethyl acetate 0.1 mL), uniformly dissolved, and then passed through a 0.2 &quot; m PTFE filter to obtain a floc Photosensitive resin composition varnish. (3) Production of optical waveguide film (production of lower cladding layer) A lower cladding layer was produced in the same manner as in Example 1. (Formation of core layer) Coating on the lower side On the layer, the prepared lacquer was uniformly applied by a doctor blade, and then placed in a dryer at 45 ° C for 15 minutes. After completely removing the solvent, the reticle was crimped, and ultraviolet rays were selectively irradiated at 500 mJ/cm 2 . The cover was heated in a drier at 45 ° C for 30 minutes, at 85 ° C for 30 minutes, and at a temperature of 15 ° C for 1 hour in three stages. After heating, it was confirmed that the waveguide pattern appeared, and the core portion and the package were confirmed. Formation of the coating portion (Formation of the upper cladding layer) The evaluation of the upper side cladding layer (4) was carried out in the same manner as in Example 1. The propagation loss was calculated to be 0.05 dB/cm. The difference in refractive index between the core and the cladding is 〇〇〇 5. B. Evaluation of the optical waveguide The optical waveguides obtained in the respective examples and comparative examples were subjected to the following price. The evaluation items are shown together with the contents. The results obtained are shown in Table 2. 1. The light loss is from the 850 rnn VCSEL (surface luminescence laser) The light emitted by the 150 201213360 5 0 // m fiber is introduced into the upper stencil, and the above nine waveguides of the scholastic, the light is received by the optical fiber of 200 //, and the intensity of the light is measured, "A go, Λ χ The measurement system uses the back-wearing method, and the waveguide length is plotted on the horizontal axis and the insertion loss is formed on the vertical axis. As a result, the measured values are accurately arranged on the straight line, and the propagation loss is calculated from the slope. 2. Heat resistance The above-mentioned optical waveguide was placed in a high-temperature and high-humidity bath (85 〇, 85% RH), and the propagation loss after the wet heat treatment was evaluated. At the same time, it was confirmed whether or not the deterioration of the propagation loss due to the reflow treatment (maximum temperature of 26 CTC/60 seconds in the N2 environment) was observed. Furthermore, the measurement of the propagation loss here is the same as the measurement method of the light loss of 1. 3 · Bending loss of the optical waveguide 〇 The bending of the light intensity of the optical waveguide film having the radius of curvature of 有01 〇 01111 was evaluated. The vcsel (surface-emitting laser) light from 85Gnm is introduced into the end surface of the optical waveguide film by the optical fiber of 50 &quot; claws, and the light is received from the other end by the optical fiber of 2〇0/4, and the intensity of the light is Reference: two j). The amount of loss caused when the optical waveguide film having the same length is bent is defined as "-bending loss", as shown in Fig. 19, in order to make the optical waveguide film shape j-shaped, the insertion loss is made and the optical waveguide film is made. The difference in insertion loss in the case where % is linear indicates "bending loss". =input loss [dB]=-i〇i〇g (exit light intensity/incident light intensity) help loss = (insertion loss under the curve) - (loss) 151 201213360 [Table 2] Polymer monomer light loss [ dB/cm] bending loss [dB/cm] heat resistance rating η 85〇C85%RH 500 hr 260°C reflowing example 1 round CHOX 0.03 0.7 0.05 0.04 Example 8 culvert CHOX 0.03 0.8 0·05 0.05 Example 9 Same as Example 1 CHOX DOX 0.04 0.9 0Ό4 - 0.05 Example 10 W CHOX 0.05 0.9 αΐό - 0.36 Example 11 Same as Example 1. CHOX 0.10 1.2 all - 0.11 Example 12 Same as Example 1 CHOX 0.10 1.1 0Λ2 ~~~ 0.11 Comparative Example 1 Same as Example 1 No 0.90 2.5 099 ~~ 1.12 Comparative Example 2 Same as Example 1 SiX 0.05 1.9 L35 —^ 1.50 It can be clearly shown in Table 2 that the light of Example 8~12 The loss is low and the performance of the optical waveguide is excellent. Further, it was shown that the light loss after the temperature-and-humidity treatment and the reflow treatment of Examples 1 and 8 to 12 was small, and the heat resistance was also excellent. Further, it is suggested that in particular, the bending loss of Examples 1, 8, 9, and 1 is also small, and sufficient performance is exhibited even when the optical waveguide is bent and used. Further, the optical waveguide structures of the first and the ninth embodiments were produced by using the optical waveguide films obtained in the respective examples and the comparative examples. As a result, the optical waveguide structure of the optical waveguide film obtained in each comparative example of 152 201213360 was used. In contrast, the optical waveguide structure using the optical waveguide film obtained in each of the examples can respectively obtain a lower loss. Further, the optical waveguide film of the fourteenth embodiment was produced by using the optical waveguide film obtained in each of the examples and the comparative examples. The optical waveguide films obtained in the respective examples and the comparative examples were also used for the vertical waveguide. With the use of the optical waveguide structure of the optical waveguide film obtained in each of the comparative examples, the optical waveguide structure of the optical waveguide of each of the first embodiment can be used to obtain a low transmission loss [industrial availability] The optical circuit (pattern of the optical waveguide) or the electrical circuit of the optical waveguide structure of the present invention has a wide width between the two, and the yield is relatively high, and the optical transmission performance can be maintained at a high level, and the reliability and durability are excellent. For versatility. Therefore, by providing the optical waveguide structure of the present invention, various electronic components and electronic devices with high reliability can be obtained. Thus, the present invention is extremely useful in the industry. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 0 is a cross-sectional view showing a first embodiment of the optical waveguide structure of the present invention. S2 is a cross-sectional view showing a second embodiment of the optical waveguide structure of the present invention. Fig. 3 is a view showing a third embodiment of the optical waveguide structure of the present invention. Fig. 4 is a cross-sectional view showing a fourth embodiment of the optical waveguide structure of the present invention. Fig. 4 is a cross-sectional view showing a fifth embodiment of the optical waveguide structure of the present invention. A cross-sectional view showing a seventh embodiment of the optical waveguide structure of the present invention is a cross-sectional view showing an eighth embodiment of the optical waveguide structure of the present invention, and FIG. 9 is a view showing a sixth embodiment of the optical waveguide structure according to the present invention. Fig. 1A showing a ninth embodiment of the optical waveguide structure of the present invention is a cross-sectional view showing a first embodiment of the optical waveguide structure of the present invention. Fig. 11 is a view showing a state in which the optical waveguide structure of the present invention is in the second embodiment. Fig. 12 is a plan view showing the optical waveguide structure of the present invention. (4) A plan view of the twelfth embodiment. Floor plan. 1 3 embodiment FIG. 3 shows another configuration example of the twelfth embodiment. FIG. 14 shows another configuration example of the twelfth embodiment. FIG. 5 is a perspective view showing the optical waveguide structure of the present invention. FIG. The pattern of the optical waveguide is schematically shown. / Cross section of the step example Fig. 1 shows a schematic diagram of the manufacturing of the optical waveguide. FIG. 18 is a cross-sectional view showing a step example of a method for manufacturing an optical waveguide. FIG. A cross-sectional view of the optical waveguide structure of the present invention. Fig. 21 is a cross-sectional view showing the fifteenth aspect of the optical waveguide structure of the present invention. Fig. 22 is a cross-sectional view showing the first embodiment of the optical waveguide structure of the present invention. Figure 23 is a cross-sectional view showing the first portion of the optical waveguide structure of the present invention. Fig. 24 is a cross-sectional view showing the eighth embodiment of the optical waveguide structure of the present invention. Fig. 25 is a cross-sectional view taken along line A-A of Fig. 20. Figure 26 is a cross-sectional view taken along the line B-B of Fig. 22; Figure 27 is a cross-sectional view taken along line C-C of Figure 24; FIG. 28 is a cross-sectional view showing a step example of a method of manufacturing an optical waveguide. FIG. 29 is a cross-sectional view showing an example of a method of manufacturing an optical waveguide. FIG. Fig. 31 of the cross section schematically shows the wave of the bending loss of the embodiment, 155 201213360. Fig. 32 is a plan view showing the ninth embodiment of the optical waveguide junction of the present invention. Figure 33 is a cross-sectional view taken along line A-A of Figure 32. Figure 34 is a cross-sectional circle taken along the line B-B in circle 32. Figure 35 is a cross-sectional view showing a twentieth embodiment of the optical waveguide structure of the present invention. Figure 36 is a cross-sectional view showing a twenty-first embodiment of the optical waveguide structure of the present invention. Figure 37 is a cross-sectional view showing a twenty-second embodiment of the optical waveguide structure of the present invention. Fig. 3 is a cross-sectional view showing an example of the steps of a method of manufacturing an optical waveguide. Fig. 39 is a cross-sectional view schematically showing an example of the steps of a method of manufacturing an optical waveguide. Fig. 40 is a view schematically showing a method of manufacturing an optical waveguide. Cross section of the step example Fig. 41 is a view schematically showing a bending loss diagram of the embodiment. [Major component symbol description] 1 Optical waveguide structure 2 &gt; 2, Substrate 21 Transmissive portion 22 Through hole 156 201213360 23 Vertical optical waveguide 24 Core portion 25 Cover portion 26 Lens portion 3 Next layer 4 , 41 underfill material 51, 52, 54 , 55 conductor layer 6, 61 sealing material 7 solder 8 through hole 81, 82 conductor column (conductive material) 9, 9' optical waveguide 91 cladding layer 92 coating Layer 93 Core layer 94 Core portion 95 Cover portion 96 Optical path conversion portion 961 Reflecting surfaces 96a, 96b, 96c, 96d, 96e, 96f Optical path converting portions 961a, 961b, 961c, 961d, 961e, 961f Reflecting surface 10 Light-emitting elements 101 Light-emitting unit 103 Terminal 157 201213360 105 Terminal 11 Light-receiving element 111 Light-receiving part 113 Terminal 115 Terminal 12 Electrical component (semiconductor component) 123 Terminal 125 Terminal 127 Terminal 129 Terminal 13 Wafer carrier 900 Varnish 910 Film 941 Branch 942 Core 943 Through-hole (empty hole) 944 reflecting surface 945 widening portion 946 interruption portion 遮 mask S extension line 1 001 Optical waveguide structure 1002 Substrate 1022 Through hole 158 201213360 1222 1224 1023 1024 1025 1026 1003 1004 1051, 1052, 1053 1531, 1532, 1533 1006 1008 1081 1009 1091 1092 1093 1094 1095 1096 1961 1010 1101 1103 Round Rectangular portion vertical optical waveguide light guide (core portion) cladding portion lens portion conductor portion underfill material conductor layer portion sealing material through hole (through hole conductor column (conductor portion) optical waveguide cladding layer core layer core Part coating part optical path conversion part Reflecting surface light-emitting element Light-emitting part terminal 159 201213360 1105 Terminal 1012 Electrical component (semiconductor element) 1123 Terminal 1125 Terminal 1018 Transmission light 1900 Varnish (material for core layer formation) 1910 Film 2001 Optical waveguide structure 2002 Substrate 2024 Transmissive portion 2025 Through hole 2026 Lens portion 2003 Concave portion 2030 Bottom surface (below) 203 1 Contact surface (Regular X direction) 2032 Contact (Regulation Y direction) 2033 Positioning means (for light-emitting elements) 2004 Concave 2040 Bottom (bottom) 2041 Contact surface (regular X direction) 2042 Contact surface (regular Y direction) 2043 Positioning means (for electronic components. For conductor components) 2005 Conductor layer 2051 &gt; 2052 ' 2053 part 160 201213360 2006 locating member (plate) 2061, 2062 contact surface 2007 next layer 2009 optical waveguide 2091 cladding layer 2092 cladding layer 2093 core layer 2094 core portion 2095 cladding portion 2096 optical path conversion portion 2961 Reflecting surface 2010 Light-emitting element 2101 Light-emitting part 2103, 2105 Terminal 2012 Electronic circuit component (semiconductor element) 2123 &gt; 2125 Terminal 2018 Transmission light 2900 Varnish (material for core layer formation) 2910 Film 161

Claims (1)

201213360 VII. Patent application scope: 1. An optical waveguide structure body having an optical waveguide having a branch having a different refractive index, an optical waveguide having a portion and a cladding portion, and an optical path converting portion for bending an optical path of the core portion, The core portion is formed into a desired shape by selectively irradiating an active radiation composed of a core layer composed of a composition containing the following components: (A) a cyclic olefin resin, (B) a refractive index and The (A) at least one of a monomer having a cyclic ether group and an oligomer having a cyclic ether group, and (c) a photoacid generator (photo_acid_generating agent). 2. The optical waveguide structure of the invention of claim i wherein the cyclic ether group of (b) is an oxetanyl group or an epoxy group. 3. The optical waveguide structure according to claim 2, wherein the cycloolefin resin of (A) has a debonding group which is detached from an acid generated by the photoacid generator of (c) in a side chain. (B) contains the first monomer described in the following formula (1〇〇): The optical waveguide junction according to any one of the items 3, wherein the optical transmission node to be transmitted to the core portion has the structure of the first embodiment of the invention, wherein the optical path conversion portion 162 201213360 reflects at least a portion of the light. A reflecting surface that is set to an inclination angle that causes the transmitted light to be totally reflected. The optical waveguide structure of any one of claims 1 to 4, which has an empty space disposed at the core portion, the reflective surface being a part of an interface between the core portion and the hole Or all of them, the reflecting surface is set to an inclination angle at which the transmitted light is totally reflected. 6. The optical waveguide structure according to claim 4 or 5, wherein 'the area where the projection of the reflecting surface is projected in the direction of the core portion overlaps with the cross section of the core portion, and the core portion The cross-sectional area is the same, and the core portion is set larger only in the portion where the reflecting surface is present in the core portion of the 5 hr. 7. The optical waveguide structure body of any one of claims 1 to 6, wherein the optical path conversion portion is formed only in the core layer. 8. The optical waveguide structure according to any one of claims 1 to 7, wherein in the core layer, the core portion is formed to be interrupted at an end or a middle thereof, the optical path conversion portion Formed in the part of the core interrupt. 9. An optical waveguide structure comprising a laminated structure including an optical waveguide having a core portion and a cladding portion having different refractive indices and a conductor layer, and extending in a thickness direction and the core portion a light guiding path of the optical connection and a conductor portion extending in the thickness direction and electrically connected to the conductor layer, wherein the core portion is formed by selectively irradiating the active layer with the core layer composed of the composition containing the following components Any desired shape. 163 201213360 (A) a cycloolefin resin, (B) at least one of a monomer having a refractive index different from the (A) and having a cyclic ether group and an oligomer having a cyclic group And (C) photoacid generator. 10. The optical waveguide structure of claim 9, which has a through hole, and the light guiding path and the conductor portion are formed in the through hole. 11. The optical waveguide structure according to claim 9 or 10, wherein the optical path length is constituted by a vertical optical waveguide having a core portion and a cladding portion having different refractive indices from each other. &lt; 12. An optical waveguide structure comprising a substrate 'an optical waveguide having a core portion and a cladding portion having different refractive indices, an electrical component, and a positioning means for determining an installation position of the electrical component. The core portion is formed into a desired shape by selectively irradiating an active radiation composed of a core layer composed of a composition containing the following components: (A) a cycloolefin resin, (B) a refractive index and the (a) And (C) a photoacid generator which is different from the female I and has a cyclic ether group and at least one of the oligomer having a cyclic group. 13. The optical waveguide structure of claim 12, wherein. The positioning means is positioned such that the position of the light-emitting portion or the position-receiving portion of the light-receiving portion overlaps in plan view. One 7 164