TW201209198A - Vacuum deposited articles and method for making the same - Google Patents

Vacuum deposited articles and method for making the same Download PDF

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TW201209198A
TW201209198A TW99128596A TW99128596A TW201209198A TW 201209198 A TW201209198 A TW 201209198A TW 99128596 A TW99128596 A TW 99128596A TW 99128596 A TW99128596 A TW 99128596A TW 201209198 A TW201209198 A TW 201209198A
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Taiwan
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substrate
layer
color layer
titanium
color
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TW99128596A
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Chinese (zh)
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Hsin-Pei Chang
Wen-Rong Chen
Huan-Wu Chiang
Cheng-Shi Chen
Juan Zhang
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Hon Hai Prec Ind Co Ltd
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Priority to TW99128596A priority Critical patent/TW201209198A/en
Publication of TW201209198A publication Critical patent/TW201209198A/en

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Abstract

A vacuum deposited article is provided. The vacuum deposited article includes a substrate, and a color layer formed on the substrate. The color layer is a TiAlOC layer. The color layer has a L* value between 28 to 32, an a* value between -1 to 1, and a b* value between -1 to 1 in the CIE LAB. A method for making the vacuum deposited article is also provided.

Description

201209198 六、發明說明: 【發明所屬之技術領域】 [麵]本發明涉及一種真空鍍膜件及其製造方法。 【先前技術】 [〇〇〇2] 真空鍍膜技術係一個環保的成膜技術。以真空鍍膜的方 式所形成的膜層具有高硬度、高耐磨性、良好的化學穩 定性、與基體結合牢固以及亮麗的金屬外觀等優點’因 此真空鍍膜在裝飾性表面處理領域的應用越來越廣。但 真空錄膜技術亦具有一定的局限性,在製造純黑色膜層 ^ 過程中容易出現異色、黑中帶藍或黑中帶紅等現象,如 此嚴重影響了黑色膜層的美觀„目前已見報道的黑色膜 層L值(即明度值)最佳只能達到3 5左右,為了得到更純 的黑色繼續降低膜層的L值存在較大難度v因此’開發一 種L值較低的黑色鍍膜件實為必要。 【發明内容】 [0003] 有鑒於此,本發明提供一種L值較低的黑色的真空鍍膜件 〇 。 -靈'Λ。 [0004] 另外,還提供一種上述真空鍍膜件的製造方法。 [0005] 一種真空鍍膜件,包括一基體及一形成於基體上的顏色 層,該顏色層為一碳氧化鈦鋁層,該顏色層呈現的色度 區於CIE LAB表色系統的l*座標介於28至32之間,#座 標介於-1至1之間,b*座標介於-1至1之間。 [0006] 一種真空鍍膜件的製造方法,包括以下步驟: [0007] 提供一基體; 099128596 表單編號A0101 第3頁/共1〇頁 0992050224-0 201209198 [0008] [0009] [0010] [0011] [0012] [0013] [0014] 使用一欽乾及一銘乾’通入流量為15〜20sccm的氧氣及 流量為15〜20sccm的乙炔氣體,藉由磁控濺射鍍膜方法 在基體上形成一顏色層,該顏色層為一TiAlOC層,其厚 度為0.3〜l/zm,其呈現的色度區域於CIE LAB表色系統 的L*座標介於28至32之間,a*座標介於-1至1之間,b* 座標介於-1至1之間。 相較於習知技術’上述真空鍍膜件的製造方法,採用鈦 靶與鋁靶作為靶材’藉由對反應氣體氮氣及乙炔氣體的 流量控制來改變顏色層的成分,從而使顏色層的L*座標 介於28至32之間,呈現出純正的黑色。以該方法所製得 的真空鍍膜件可呈現出具吸引力的純黑色的金屬外觀。 【實施方式】 本發明的真空鍍膜件可為電子裝置外殼,亦可為眼鏡邊 框、鐘錶外殼、金屬衛浴件及建築用件等。 圖1所示為本發明較佳實施例的真空轉膜件1〇,其包括一 基體11、一襯底層13及一顏色層15 6襯底層13直接與基 體11結合,顏色層15形成於襯底層13的表面。 基體11的材質可為金屬、玻璃、陶瓷或塑膠。 襯底層13形成於基體11與顏色層15之間,以增強顏色層 15於基體11上的附著力。襯底層13可為一鈦層或其他可 提供附著效果的塗層。襯底層丨3的厚度大約為〇. 〇卜〇. i 仁m。襯底層13的顏色以不影響顏色層顏色的色調為佳, 比如可為銀色、白色及灰白色等淺色調。 顏色層15為一碳氧化鈦鋁(TiA1〇c)層。該顏色層15呈 099128596 表單編號A0101 第4頁/共1〇頁 0992050224-0 201209198 [0015] [0016] Ο [_ ο [0018] 現的色度區域於CIE LAB表色系統的L*座標介於28至32 之間,a*座標介於-1至1之間,b*座標介於-1至1之間, 呈現出黑色。該顏色層15的厚度大約為0.3〜l//m。 上述真空鍍膜件10的製造方法主要包括如下步驟: 提供一基體11,並將基體11放入盛裝有乙醇及/或丙酮溶 液的超聲波清洗器中進行震動清洗,以除去基體11表面 的雜質和油污。清洗完畢後烘乾備用。所述基體11的材 質可為金屬、玻璃、陶瓷或塑膠。 再對基體11的表面進行電漿清洗,進一步去除基體11表 面的油污,以改善基體11表面與後續塗層的結合力。對 基體11的表面進行電漿清洗的方法包括如下步驟:將基 體11放入一中頻磁控濺射鍍膜機的真空室内的工件架上 ,抽真空該真空室至真空度為8. 0xl0-3Pa,以 300~600sccm (標準狀態毫升/分鐘)的流量向真空室内 通入純度為99. 999%的氩氣,於基體11施加-300 — 800V 的偏壓,對基體11表面進行電漿清洗,清洗時間為 5~1Omin ° 採用磁控濺射的方式在基體11上形成一襯底層13。該襯 底層13為一鈦層。形成該襯底層13的具體操作方法及工 藝參數為:在所述電漿清洗完成後,調節氬氣流量至 10〜200sccm,加熱該真空室至50〜180°C,並設置工件 架的公轉轉速為1〜4rpm,優選為3rpm ;開啟已置於中頻 磁控濺射鍍膜機中的一鈦靶的電源,設置鈦靶的電源功 率為5〜llkw,並對基體11施加-50〜-200V的偏壓,沉積 099128596 表單編號A0101 第5頁/共10頁 0992050224-0 201209198 襯底層13。沉積該襯底層13的時間為3〜1〇min。 [0019] [0020] [0021] [0022] [0023] [0024] 形成該襯底層13後,向真空室内通入15〜2〇sccm的純度 為99. 99%的氧氣及15〜20sccm的純度為99. 8%的乙炔氣 體,施加-50~~200V的偏壓於基體n上;同時開啟鈦靶 與鋁靶,對基體11繼續鍍膜,以在襯底層13上鍍覆一顏 色層15,該顏色層15為一TiAlOC層。沉積該顏色層15的 時間為10~60min。所述鈦把與鋁靶的電源功率均設置為 5〜11kw 。 所述顏色層15呈現的色度區域於ciE LAB表色系統的L木 座標介於28至32之間,a*座標介於-1至1之間,b*座標 介於-1至1之間,呈現出黑色。 上述真空鍍膜件的製造方法,採用鈦靶與鋁靶作為靶材 ’藉由對反應氣體氮氣及乙炔氣體流量的控制來改變顏 色層15的成分,從而使顏色層15的L*座標介於28至32之 間’呈現出純正的黑色❶同時’藉由選擇合適的偏壓, 控制鈦原子、鋁原子、碳原丰及氧原子的沉積速率,可 增強顏色層15的緻密性。另外,遠擇合適的偏壓、乙炔 與氧氣的流量,能夠保證較高的沉積速率,從而可進一 步提高該真空鍍膜件10的生產效率。 【圖式簡單說明】 圖1為本發明較佳實施例的真空鍍膜件的剖視示意圖。 【主要元件符號說明】 真空鍍膜件:10 基體:11 099128596 表單編號A0101 第6頁/共10頁 0992050224-0 201209198 [0025] 襯底層:13 [0026] 顏色層:15201209198 VI. Description of the Invention: [Technical Field to Be Invented] [Face] The present invention relates to a vacuum coating member and a method of manufacturing the same. [Prior Art] [〇〇〇2] Vacuum coating technology is an environmentally friendly film forming technology. The film formed by vacuum coating has the advantages of high hardness, high wear resistance, good chemical stability, strong bonding with the substrate and a beautiful metallic appearance. Therefore, the application of vacuum coating in the field of decorative surface treatment is coming. The wider the more. However, the vacuum recording film technology also has certain limitations. In the process of manufacturing pure black film layer ^, it is easy to appear in different colors, black in the blue or black in the red, which seriously affects the beauty of the black film. The reported black film L value (ie, the brightness value) is best only about 3 5, in order to get a more pure black, it is more difficult to continue to reduce the L value of the film. Therefore, 'develop a black coating with a lower L value. SUMMARY OF THE INVENTION [0003] In view of the above, the present invention provides a black vacuum-coated member having a low L value. - [0004] In addition, a vacuum coating member is also provided. [0005] A vacuum coating device comprising a substrate and a color layer formed on the substrate, the color layer being a titanium aluminum oxide layer, the color layer exhibiting a chromaticity region in the CIE LAB color system The l* coordinate is between 28 and 32, the # coordinate is between -1 and 1, and the b* coordinate is between -1 and 1. [0006] A vacuum coating member manufacturing method comprising the following steps: 0007] providing a substrate; 099128596 form number A0101 Page 3 / Total 1 page 0992050224-0 201209198 [0008] [0010] [0012] [0014] [0014] [0014] Use a Qinqin and a Minggan 'pass flow rate of 15~20sccm Oxygen gas with a flow rate of 15 to 20 sccm is formed by a magnetron sputtering coating method to form a color layer on the substrate. The color layer is a TiAlOC layer having a thickness of 0.3 to 1/zm and exhibiting a chromaticity region. The L* coordinates of the CIE LAB color system are between 28 and 32, the a* coordinates are between -1 and 1, and the b* coordinates are between -1 and 1. Compared to the prior art 'the above The vacuum coating member is manufactured by using a titanium target and an aluminum target as a target. The composition of the color layer is changed by controlling the flow rate of the reaction gas nitrogen gas and acetylene gas, so that the L* coordinate of the color layer is between 28 and 32. Between the two, the vacuum coating material produced by the method can exhibit an attractive pure black metal appearance. [Embodiment] The vacuum coating material of the present invention can be an electronic device casing or a pair of glasses. Frame, watch case, metal bathroom parts and building parts, etc. Figure 1 shows a preferred embodiment of the present invention. The vacuum film transfer member 1 of the embodiment comprises a substrate 11, a substrate layer 13 and a color layer. The substrate layer 13 is directly bonded to the substrate 11, and the color layer 15 is formed on the surface of the substrate layer 13. The material of the substrate 11 It may be metal, glass, ceramic or plastic. A substrate layer 13 is formed between the substrate 11 and the color layer 15 to enhance the adhesion of the color layer 15 to the substrate 11. The substrate layer 13 may be a titanium layer or other to provide adhesion. The effect of the coating. The thickness of the substrate layer 丨3 is approximately 〇. 〇卜〇. i 仁m. The color of the substrate layer 13 is preferably a color tone which does not affect the color of the color layer, and may be, for example, a light color such as silver, white or grayish white. The color layer 15 is a layer of titanium aluminum oxynitride (TiA1〇c). The color layer 15 is 099128596 Form No. A0101 Page 4/Total 1 page 0992050224-0 201209198 [0015] [0016] Ο [_ ο [0018] The current chromaticity area is in the L* coordinate of the CIE LAB color system. Between 28 and 32, the a* coordinate is between -1 and 1, and the b* coordinate is between -1 and 1, showing a black color. The color layer 15 has a thickness of about 0.3 to 1/m. The manufacturing method of the vacuum coating member 10 mainly includes the following steps: providing a substrate 11 and subjecting the substrate 11 to an ultrasonic cleaner containing an ethanol and/or acetone solution for vibration cleaning to remove impurities and oil on the surface of the substrate 11. . After cleaning, dry and set aside. The material of the substrate 11 may be metal, glass, ceramic or plastic. The surface of the substrate 11 is further subjected to plasma cleaning to further remove the oil stain on the surface of the substrate 11 to improve the bonding force between the surface of the substrate 11 and the subsequent coating. 5xl0- The vacuum chamber is vacuumed to a vacuum of 8. 0xl0-, the method of the method of the present invention is as follows: 3Pa, argon gas having a purity of 99.999% is supplied to the vacuum chamber at a flow rate of 300 to 600 sccm (standard state cc/min), and a surface of the substrate 11 is plasma-cleaned by applying a bias of -300 to 800 V to the substrate 11. The cleaning time is 5 to 10 min. A substrate layer 13 is formed on the substrate 11 by magnetron sputtering. The underlayer 13 is a titanium layer. The specific operation method and process parameters for forming the substrate layer 13 are: after the plasma cleaning is completed, adjusting the flow rate of the argon gas to 10 to 200 sccm, heating the vacuum chamber to 50 to 180 ° C, and setting the revolution speed of the workpiece holder. 1 to 4 rpm, preferably 3 rpm; turn on the power supply of a titanium target which has been placed in the intermediate frequency magnetron sputtering coating machine, set the power of the titanium target to 5 llkw, and apply -50 to -200 V to the substrate 11. Bias, Deposition 099128596 Form No. A0101 Page 5 / Total 10 Page 0992050224-0 201209198 Substrate Layer 13. The time for depositing the substrate layer 13 is 3 to 1 〇 min. [0024] [0024] [0024] [0024] [0024] [0024] [0024] [0024] [0024] [0024] [0024] [0024] [0024] [0024] [0024] [0024] After the formation of the substrate layer 13 99. 8% of acetylene gas, applying a bias voltage of -50 to 200V on the substrate n; simultaneously opening the titanium target and the aluminum target, continuing to coat the substrate 11 to plate a color layer 15 on the substrate layer 13, The color layer 15 is a TiAlOC layer. The color layer 15 is deposited for a period of 10 to 60 minutes. The power of the titanium and the aluminum target is set to 5 to 11 kW. The color layer 15 exhibits a chromaticity region between 28 and 32 in the ciE LAB color system, a* coordinates between -1 and 1, and b* coordinates between -1 and 1. In between, it appears black. In the above method for manufacturing a vacuum coated member, a titanium target and an aluminum target are used as a target. The composition of the color layer 15 is changed by controlling the flow rates of the reaction gas nitrogen gas and the acetylene gas, so that the L* coordinate of the color layer 15 is between 28 Between 32 and 32, a pure black ❶ is exhibited, and the density of the color layer 15 can be enhanced by selecting a suitable bias voltage to control the deposition rate of titanium atoms, aluminum atoms, carbon atoms, and oxygen atoms. In addition, a suitable bias voltage, a flow rate of acetylene and oxygen can ensure a high deposition rate, so that the production efficiency of the vacuum coating member 10 can be further improved. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a cross-sectional view showing a vacuum coating member according to a preferred embodiment of the present invention. [Main component symbol description] Vacuum coating: 10 Base: 11 099128596 Form No. A0101 Page 6 / Total 10 pages 0992050224-0 201209198 [0025] Substrate layer: 13 [0026] Color layer: 15

099128596 表單編號A0101 第7頁/共10頁 0992050224-0099128596 Form No. A0101 Page 7 of 10 0992050224-0

Claims (1)

201209198 七、申請專利範圍: 種真二鍍膜件,包括一基體及一形成於基體上的顏色層 ,其改良在於:該顏色層為一碳氧化鈦鋁層,該顏色層呈 現的色度區於CIE LAB表色系統的L*座標介於28至32之 間,a*座標介於—1至1之間,b*座標介於_丨至丨之間。 2 .如申請專利範圍第丨項所述之真空鍍膜件,其中所述顏色 層的厚度為0. 3〜1 #ιη。 3 ·如申請專利範圍第丨項所述之真空鍍膜件,其中該真空鍍 骐件還包括一形成於基體與顏色層之間的襯底層,該襯底 層為一鈦層。 4 .如申請專利範圍第3項所述之真空鍍膜件,其中該襯底層 的厚度為0. 01〜〇. 1 。 5 .如申請專利範圍第丨項所述之真空鍍膜件,其中該基體的 材質為金屬、玻璃、陶瓷及塑膠中的一種。 6’ 種真空鍵膜件的製造方法,包括以下步驟: 提供一基體; 使用鈦乾及一銘把,通入流量為1 5〜20sccm的氧氣及流 里為15〜20sccm的乙炔氣體,藉由磁控濺射鍍膜方法在基 體上形成一顏色層,該顏色層為一TiA1〇c層,其厚度為 0.3~lym,其呈現的色度區域於CIE LAB表色系統的L* 座標介於28至32之間,a*座標介於-1至1之間,b*座標 介於-1至1之間。 7 ·如申請專利範圍第6項所述之真空鍍膜件的製造方法,其 中在形成該顏色層的過程中,對基體施加-50~_2〇〇v的偏 壓。 099128596 表·單蝙號A0101 第8頁/共10頁 0992050224-0 201209198 8.如申請專利範圍第7項所述之真空鍍膜件的製造方法,其 ’ 中該顏色層的沉積時間為10〜60min,該顏色層的厚度為 0.3~1 e m。 9 .如申請專利範圍第6項所述之真空鍍膜件的製造方法,其 中該真空鍍膜件的製造方法還包括在形成顏色層前在基體 上鍍覆一鈦襯底層的步驟。 10 .如申請專利範圍第9項所述之真空鍍膜件的製造方法,其 中形成該鈦襯底層的工藝參數為:以鈦靶及鋁靶為靶材, 設置鈦把與銘乾的電源功率為5〜llkw,氬氣的流量為 0 10~200sccm,濺射溫度為50〜180°C,公轉轉速為 卜4rpm,對基體施加的偏壓為-50 — 200V,沉積時間為 3-1Omiη。201209198 VII. Patent application scope: The true two-coated material comprises a substrate and a color layer formed on the substrate, wherein the color layer is a layer of titanium oxy-titanium, and the color layer exhibits a chromaticity region. The C* LAB color system has an L* coordinate between 28 and 32, an a* coordinate between -1 and 1, and a b* coordinate between _丨 and 丨. 2〜1#ιη。 The thickness of the color layer is 0. 3~1 #ιη. 3. The vacuum coated article of claim 2, wherein the vacuum plated member further comprises a substrate layer formed between the substrate and the color layer, the substrate layer being a titanium layer. 〜1. 1。 The thickness of the substrate layer is 0. 01~〇. 1 . 5. The vacuum coated article of claim 2, wherein the substrate is made of one of metal, glass, ceramic, and plastic. 6' method for manufacturing a vacuum key film member, comprising the steps of: providing a substrate; using titanium dry and a handle, introducing oxygen gas having a flow rate of 15 to 20 sccm and acetylene gas having a flow rate of 15 to 20 sccm, by using The magnetron sputtering coating method forms a color layer on the substrate, the color layer is a TiA1〇c layer having a thickness of 0.3~lym, and the chromaticity region of the CIE LAB color system is represented by a L* coordinate of 28 Between 32, the a* coordinate is between -1 and 1, and the b* coordinate is between -1 and 1. The method of manufacturing a vacuum coated article according to claim 6, wherein a bias voltage of -50 to _2 〇〇v is applied to the substrate during the formation of the color layer. The method for manufacturing a vacuum coated member according to claim 7, wherein the deposition time of the color layer is 10 to 60 min. The thickness of the color layer is 0.3~1 em. 9. The method of manufacturing a vacuum coated article according to claim 6, wherein the method of manufacturing the vacuum coated member further comprises the step of plating a layer of a titanium substrate on the substrate before forming the color layer. 10. The method of manufacturing a vacuum coated article according to claim 9, wherein the process parameter for forming the titanium substrate layer is: using a titanium target and an aluminum target as a target, and setting a power supply of the titanium stem and the stem is 5~llkw, the flow rate of argon gas is 0 10~200sccm, the sputtering temperature is 50~180°C, the revolution speed is 4 rpm, the bias voltage applied to the substrate is -50-200V, and the deposition time is 3-1Omiη. 099128596 表單編號Α0101 第9頁/共10頁 0992050224-0099128596 Form number Α0101 Page 9 of 10 0992050224-0
TW99128596A 2010-08-26 2010-08-26 Vacuum deposited articles and method for making the same TW201209198A (en)

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