201241198 六、發明說明： 【發明所屬之技術領域】 [0001] 本發明涉及一種鍍膜件及其製備方法，尤其涉及一種具 有黑色外觀的鍍膜件及其製備方法。 [先前技術] [0002] 黑色塗層的應用主要係為了消除或減小光線的影響，或 作為產品表面的裝飾塗層。目前最常用的製備黑色塗層 的方法為電化學方法，如陽極氧化黑色膜，電鍍黑鎳或 黑絡等，但該類方法污染重不環保。 [0003] PVD鍵膜技術係一種較為環保的鍵膜工藝。習知技術中， 利用PVD鍵膜技術於鑛膜件表面形成的黑色膜層在工業上 應用得較多的膜系主要係碳化鈦（TiC)及碳化鉻（CrC)等 。在利用PVD鍍膜技術製備黑色的碳化鈦或碳化鉻膜層的 過程中，為了使膜層黑色的深度較大，即降低塗層的色 度區域於CIE LAB表色系統中的值使其小於35，通常 需通入大量的含碳元素的反應氣體，如曱烷、乙炔等， 〇 然而這些11體通人過多時’氣體會與㈣反應造成㈣才 中毒。 【發明内容】 剛㈣於此’本發明提供-種可避免上述問題的PVD黑色链 膜件。 _5]另外’本發明還提供-種上錢科的製備方法。 -種锻膜件，包括基體及形成於該基體上的色彩層，該 色彩層為〇χΝ層’其中2/3gxg3 ;該色彩層呈現的色度 100113069 表單編號Α0101 1002021795-0 [0006] 201241198 區域於CIE LAB表色系統的L*座標介於32至35之間，a* 座標介於0. 6至1之間，b*座標介於〇. 8至1之間。 [0007] [0008] [0009] [0010] [0011] [0012] [0013] 100113069 一種鑛膜件的製備方法，其包括如下步驟： 提供基體； 採用磁控濺射鍍膜法，以石墨靶為靶材，以氨氣為反應 氣體，於該基體的表面形成色彩層；該色彩層為層， 其中2/3SxS3;該色彩層呈現的色度區域於CIE LAB表 色系統的L*座標介於32至35之間，a*座標介於〇· 6至1之 間，b*座標介於0· 8至1之間。 所述鍍膜件的製備方法在濺射所述色彩層時，藉由對靶 材的選取、反應氣體氨氣流量的設計及濺射時間的控制 ’使色衫層呈現出穩㈣黑色。以該方法所製得的鑛膜 件呈現出黑色外觀’豐富了真空鍍膜層的顏色，提高了 產品的外觀競爭力。更重要的係，在保證該色彩層:色 度區域於CIE LAB表色系統的值低於35的情況下無 需通入曱烧、乙炔等含碳元素的反應氣體，避免了因通 入過多的甲烧、乙块等含碳元素的反應氣體而造成的乾 材中毒。 【實施方式】 凊參閱圖1 |發日月較佳實施例的賴㈣包括基體11及 形成於基體11上的色彩層13。 所述基體11的材質可為令厪 ..* 屬、玻璃、陶瓷及塑膠中的一 種。 該色彩層1 3肉 1002021795-0 所述色彩層13為CXN層，其中2/39S3 表單编號A0101 第4頁/共1〇頁 201241198 [0014] [0015] [0016] ❹ [0017] [0018] G [0019] 眼直觀呈現黑色，其色度區域於CIE LAB表色系統的L* 座標介於32至35之間，a*座標介於0. 6至1之間，b*座標 介於0. 8至1之間。所述色彩層13的厚度為500~700em。 所述色彩層13藉由磁控濺射方法形成。 所述鍍膜件10可為筆記型電腦、個人數位助理等電子裝 置的殼體，或為其他產品的裝飾性部件。 上述鍍膜件10的製備方法，包括以下步驟： 提供基體11。基體11的材質可為金屬、玻璃、陶瓷及塑 膠中的一種。 將基體11放入無水乙醇中進行超聲波清洗，以除去基體 11表面的雜質和油污等，清洗完畢後烘乾備用。 結合參閱圖2，提供一真空鍍膜機20，該真空鍍膜機20包 括一鍍膜室21及連接於鍍膜室21的一真空泵30，真空泵 30用以對鍍膜室21抽真空。該鍍膜室21内設有轉架（未圖 示）相對設置的二石墨靶23。轉架帶動基體11沿圓形的軌 跡25公轉，且基體11在沿軌跡25公轉時亦自轉。 在基體11的表面形成色彩層13。該色彩層13為C N層，其201241198 VI. Description of the Invention: [Technical Field] The present invention relates to a coated member and a method of manufacturing the same, and more particularly to a coated member having a black appearance and a method of preparing the same. [Prior Art] [0002] The application of the black coating is mainly to eliminate or reduce the influence of light, or as a decorative coating on the surface of the product. At present, the most commonly used method for preparing a black coating is an electrochemical method such as an anodized black film, electroplating of black nickel or black matrix, etc., but the method is not environmentally friendly. [0003] PVD key film technology is a more environmentally friendly bond film process. In the prior art, the film system which uses the PVD key film technology to form a black film layer on the surface of the mineral film member, which is widely used in the industry, is mainly titanium carbide (TiC) and chromium carbide (CrC). In the process of preparing black titanium carbide or chromium carbide film by PVD coating technology, in order to make the black depth of the film larger, the value of the chromaticity of the coating in the CIE LAB color system is reduced to less than 35. Usually, a large amount of carbon-containing reaction gases, such as decane, acetylene, etc., are required. However, when these 11 bodies are too many people, the gas will react with (4) to cause (4) poisoning. SUMMARY OF THE INVENTION Just as the present invention provides a PVD black chain film member which avoids the above problems. _5] In addition, the present invention also provides a method for preparing a medicinal plant. a forged film member comprising a substrate and a color layer formed on the substrate, the color layer being a layer of '' wherein 2/3gxg3; the color layer exhibiting chromaticity 100113069 Form No. Α0101 1002021795-0 [0006] 201241198 Area The L* coordinates of the CIE LAB color system are between 32 and 35, the a* coordinates are between 0.6 and 1, and the b* coordinates are between 〇. 8 and 1. [0010] [0013] [0013] 100113069 A method for preparing a mineral film member, comprising the steps of: providing a substrate; using a magnetron sputtering coating method, using a graphite target as The target material uses ammonia gas as a reactive gas to form a color layer on the surface of the substrate; the color layer is a layer, wherein 2/3 SxS3; the color region exhibits a chromaticity region at the L* coordinate of the CIE LAB color system. Between 32 and 35, the a* coordinate is between 〇·6 and 1, and the b* coordinate is between 0·8 and 1. The method of preparing the coated member causes the color layer to appear stable (four) black by sputtering the color layer, by selecting the target, designing the flow rate of the reaction gas ammonia gas, and controlling the sputtering time. The mineral film obtained by this method exhibits a black appearance, which enriches the color of the vacuum coating layer and improves the appearance competitiveness of the product. More importantly, in the case of ensuring that the color layer: chroma region has a value of less than 35 in the CIE LAB color system, it is not necessary to pass a reaction gas such as calcined or acetylene, thereby avoiding excessive passage of the reaction. Dry material poisoning caused by a reaction gas containing carbon such as A, B, and B. [Embodiment] Referring to Figure 1 , a preferred embodiment of the present invention comprises a substrate 11 and a color layer 13 formed on the substrate 11. The material of the base 11 may be one of 厪..* genus, glass, ceramic and plastic. The color layer 13 meat 1002021795-0 the color layer 13 is a CXN layer, wherein 2/39S3 form number A0101 page 4 / total 1 page 201241198 [0014] [0016] [0017] [0018] ] [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ 0. 8 to 1. The color layer 13 has a thickness of 500 to 700 em. The color layer 13 is formed by a magnetron sputtering method. The coated member 10 can be a housing of an electronic device such as a notebook computer, a personal digital assistant, or a decorative component of other products. The method for preparing the above-mentioned coating member 10 comprises the following steps: providing a substrate 11. The material of the base 11 may be one of metal, glass, ceramic, and plastic. The substrate 11 is placed in absolute ethanol for ultrasonic cleaning to remove impurities and oil stains on the surface of the substrate 11, and after drying, it is dried for use. Referring to Fig. 2, a vacuum coater 20 is provided. The vacuum coater 20 includes a coating chamber 21 and a vacuum pump 30 connected to the coating chamber 21 for vacuuming the coating chamber 21. The coating chamber 21 is provided with two graphite targets 23 which are disposed opposite to each other by a turret (not shown). The turret drives the base 11 to revolve along a circular trajectory 25, and the base 11 also rotates as it revolves along the trajectory 25. A color layer 13 is formed on the surface of the substrate 11. The color layer 13 is a C N layer,
X 採用磁控濺射的方式形成。形成該色彩層13的具體操作 方法可為：如圖2所示，將基體11放入真空鍍膜機20的鍍 膜室21内，抽真空使該鍍膜室21的本底真空度為8x 10_3Pa，以氨氣為反應氣體，向鍍膜室21内通入流量為 300~500sccm的氨氣，以氬氣為工作氣體，調節其流量 至200〜300sccm ;對基體11施加-100〜-250V的偏壓，設 置佔空比為40~60%，加熱該鍍膜室21至120〜150°C (即 100113069 表單編號A0101 第5頁/共10頁 1002021795-0 201241198 濺射溫度為120〜150°C)，並設置工件架的公轉轉速為 1. 0〜3. Or pm ;開啟石墨靶23的電源，設置其功率為 7〜1 0kw，沉積色彩層1 3。沉積該色彩層1 3的時間為 60〜90min (即滅射時間為60~90min)。所述色彩層13 的厚度為500~700nm。 [0020] [0021] [0022] [0023] [0024] 該色彩層13於CIE LAB表色系統的L*座標介於32至35之 間，a*座標介於0. 6至1之間，b*座標介於0. 8至1之間。 在上述提供的參數範圍内，當氨氣的流量改變時，所述 色彩層13中碳元素與氮元素的質量百分含量相應發生改 變，色彩層13的色差值亦隨之改變，但均在上述色差值 範圍之内，均呈現為黑色。具體參數參見表1。 表1 序 號 石 墨 靶 功 率 kW 偏 懕 V 佔 空 比 % 轉架 轉速 r/min 氨氣 流量 seem 鍍 色 彩 層 時 間 min 色彩層 色彩層色差 值 C wt% N wt% L A B 1 10 -200 50 1.5 320 40 55 45 34 0.5 0.5 2 10 -200 50 1.5 420 40 60 40 32 0.3 0.25 3 10 -200 50 1.5 500 40 45 55 35 0.68 0.7 所述鍍膜件10的製備方法藉由磁控濺射方法在形成所述 色彩層13時，藉由對靶材的選取、反應氣體氨氣流量的 設計及濺射時間的控制，使所述色彩層1 3呈現出穩定的 黑色。以該方法所製得的鍍膜件10呈現出黑色的外觀， 豐富了真空鍍膜層的顏色，提高了產品的外觀競爭力。 100113069 表單編號A0101 第6頁/共10頁 1002021795-0 201241198 [0025] 更重要的，在保證該色彩層13的色度區域於CIE LAB表 色系統的L*值低於35的情況下，無需通入甲烷、乙炔等 含碳元素的反應氣體，避免了因通入過多的甲烷、乙炔 等含碳元素的反應氣體而造成的靶材中毒。 此外，所述色彩層13具有良好的抗磨損性能，可持久保 持其良好的黑色的外觀，同時還可有效防止基體11被磨 損，相應地延長了鍍膜件10的使用壽命。 [0026] 【圖式簡單說明】 圖1為本發明一較佳實施例鍍膜件的剖視圖。 [0027] 圖2為本發明一較佳實施例真空鍍膜機的示意圖。 [0028] 【主要元件符號說明】 鍍膜件：10 [0029] 基體：11 [0030] 色彩層：13 [0031] 真空鍍膜機：20 %J [0032] 鍍膜室：21 [0033] 石墨乾· 2 3 [0034] 軌跡：25 [0035] 真空泵：30 100113069 表單編號A0101 第7頁/共10頁 1002021795-0X is formed by magnetron sputtering. The specific operation method for forming the color layer 13 may be as follows: as shown in FIG. 2, the substrate 11 is placed in the coating chamber 21 of the vacuum coater 20, and the vacuum degree of the coating chamber 21 is 8×10_3 Pa. The ammonia gas is a reaction gas, and ammonia gas having a flow rate of 300 to 500 sccm is introduced into the coating chamber 21, and argon gas is used as a working gas to adjust the flow rate to 200 to 300 sccm; and a bias voltage of -100 to -250 V is applied to the substrate 11 Setting the duty ratio to 40~60%, heating the coating chamber 21 to 120~150 °C (ie 100113069 Form No. A0101 Page 5/10 pages 1002021795-0 201241198 Sputtering temperature is 120~150 °C), and The rpm of the workpiece holder is set to 1. 0~3. Or pm; the power of the graphite target 23 is turned on, the power is set to 7~1 0kw, and the color layer 13 is deposited. The time for depositing the color layer 13 is 60 to 90 min (i.e., the off-time is 60 to 90 min). The color layer 13 has a thickness of 500 to 700 nm. [0024] [0024] [0024] [0024] [0024] The color layer 13 in the CIE LAB color system L* coordinates between 32 to 35, a* coordinates between 0.6 to 1, The b* coordinate is between 0.8 and 1. Within the range of parameters provided above, when the flow rate of ammonia gas changes, the mass percentage of carbon and nitrogen in the color layer 13 changes correspondingly, and the color difference of the color layer 13 also changes, but Within the above range of color difference values, all appear black. See Table 1 for specific parameters. Table 1 No. Graphite Target Power kW Bias V Duty Cycle % Rack Speed r/min Ammonia Flow Seem Plating Color Layer Time Min Color Layer Color Layer Color Difference C wt% N wt% LAB 1 10 -200 50 1.5 320 40 55 45 34 0.5 0.5 2 10 -200 50 1.5 420 40 60 40 32 0.3 0.25 3 10 -200 50 1.5 500 40 45 55 35 0.68 0.7 The preparation method of the coating member 10 is carried out by a magnetron sputtering method When the color layer 13 is described, the color layer 13 exhibits a stable black color by the selection of the target, the design of the ammonia gas flow rate of the reaction gas, and the control of the sputtering time. The coated member 10 obtained by this method exhibits a black appearance, enriches the color of the vacuum coating layer, and improves the appearance competitiveness of the product. 100113069 Form No. A0101 Page 6 of 10 1002021795-0 201241198 [0025] More importantly, in the case where the chromaticity region of the color layer 13 is guaranteed to have an L* value of less than 35 in the CIE LAB color system, The reaction gas containing carbonaceous elements such as methane and acetylene is introduced to avoid target poisoning caused by excessive reaction gases such as methane and acetylene. Further, the color layer 13 has good anti-wear properties, can maintain its good black appearance for a long time, and can also effectively prevent the base 11 from being worn, thereby prolonging the service life of the coated member 10. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a cross-sectional view showing a coated member according to a preferred embodiment of the present invention. 2 is a schematic view of a vacuum coating machine according to a preferred embodiment of the present invention. [Description of main component symbols] Coating member: 10 [0029] Base: 11 [0030] Color layer: 13 [0031] Vacuum coating machine: 20% J [0032] Coating chamber: 21 [0033] Graphite dry · 2 3 [0034] Track: 25 [0035] Vacuum pump: 30 100113069 Form number A0101 Page 7 / Total 10 pages 1002021795-0