TW201309820A - Method for making a housing and housing made by same - Google Patents

Method for making a housing and housing made by same Download PDF

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TW201309820A
TW201309820A TW100130972A TW100130972A TW201309820A TW 201309820 A TW201309820 A TW 201309820A TW 100130972 A TW100130972 A TW 100130972A TW 100130972 A TW100130972 A TW 100130972A TW 201309820 A TW201309820 A TW 201309820A
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Taiwan
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color layer
chromium
coordinate
casing
substrate
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TW100130972A
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Chinese (zh)
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Huann-Wu Chiang
Cheng-Shi Chen
Hua-Yang Xu
Juan Zhang
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Hon Hai Prec Ind Co Ltd
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Abstract

A method for making a housing with black color is provided, which includes the following steps: providing a substrate; forming a colored layer on the surface of the substrate, the colored layer is a CrxCy layer, wherein the ratio of x to y is between 1: 6 and 1: 5; the colored layer is made by magnetron sputtering, using targets including chromium and carbide chromium, and using carbon source gas as reaction gas. In the CIE LAB color system, L * coordinate of the colored layer locates between 27 and 30, a* coordinate of the colored layer locates between -0.1 and 0.1, and b* coordinate of the colored layer locates between -0.1 and 0.1. A housing made by the above-mentioned method is also provided.

Description

殼體的製備方法及由該方法所製得的殼體Method for preparing housing and housing made by the method

本發明涉及一種殼體的製備方法及由該方法所製得的殼體。The present invention relates to a method of making a housing and a housing made by the method.

目前最常用的製備黑色塗層的方法為電化學方法,如陽極氧化黑色膜,鍍黑鎳、黑鉻等,但該類方法污染重不環保。At present, the most commonly used methods for preparing black coatings are electrochemical methods, such as anodized black film, black nickel plating, black chromium plating, etc., but the pollution of such methods is not environmentally friendly.

PVD鍍膜技術是一種較為環保的鍍膜工藝。然而,利用PVD鍍膜技術於殼體表面形成的黑色膜層容易出現異色、黑中帶藍及黑中帶紅等現象,嚴重影響了黑色膜層的美觀性;且利用PVD製備的黑色膜層往往黑色的深度不夠,膜層的色度區域於CIE Lab表色系統中的L*值通常只能達到35左右,繼續降低L*值存在很大難度。PVD coating technology is a more environmentally friendly coating process. However, the black film layer formed on the surface of the shell by PVD coating technology is prone to heterochromatic, blackish blue and black with red, which seriously affects the aesthetics of the black film; and the black film layer prepared by PVD is often The depth of black is not enough. The L* value of the chromaticity area of the film in the CIE Lab color system usually only reaches about 35. It is very difficult to continue to reduce the L* value.

有鑒於此,本發明提供一種有效解決上述問題的黑色的PVD鍍膜的殼體的製備方法。In view of the above, the present invention provides a method of manufacturing a casing of a black PVD coating that effectively solves the above problems.

另外,本發明還提供一種由上述方法製得的殼體。Further, the present invention provides a casing obtained by the above method.

一種殼體的製備方法,其包括如下步驟:A method of preparing a casing, comprising the steps of:

提供一基體;Providing a substrate;

在該基體的表面形成一色彩層,該色彩層為鉻-碳層,其化學式為CrxCy,其中x:y的值介於1:6與1:5之間;所述色彩層的形成採用磁控濺射法,使用複合靶,通入碳源反應氣體,該複合靶中含有金屬鉻和碳化鉻,其中金屬鉻的質量百分含量為50~90%,碳化鉻的質量百分含量為10~50%;該色彩層呈現的色度區域於CIE Lab表色系統的L*座標介於27至30之間,a*座標介於-0.1至0.1之間,b*座標介於-0.1至0.1之間。Forming a color layer on the surface of the substrate, the color layer being a chromium-carbon layer having a chemical formula of Cr x C y , wherein the value of x:y is between 1:6 and 1:5; The magnetron sputtering method is used to form a composite target, and a carbon source reaction gas is introduced. The composite target contains metal chromium and chromium carbide, wherein the metal chromium has a mass percentage of 50-90% and a chromium carbide mass percentage. The content is 10~50%; the chromaticity region of the color layer is between 27 and 30 in the C* Lab color system, the a* coordinate is between -0.1 and 0.1, and the b* coordinate is between -0.1 to 0.1.

一種殼體,其包括基體及形成於基體表面的色彩層,該色彩層為鉻-碳層,其化學式為CrxCy,其中x:y的值介於1:6與1:5之間;該色彩層呈現的色度區域於CIE Lab表色系統的L*座標介於27至30之間,a*座標介於-0.1至0.1之間,b*座標介於-0.1至0.1之間。A housing comprising a substrate and a color layer formed on a surface of the substrate, the color layer being a chromium-carbon layer having a chemical formula of Cr x C y , wherein the value of x:y is between 1:6 and 1:5 The color layer presents a chromaticity region between the C* Lab color system with an L* coordinate between 27 and 30, an a* coordinate between -0.1 and 0.1, and a b* coordinate between -0.1 and 0.1. .

本發明在所述色彩層的製備過程中使用一種含金屬鉻與碳化鉻的靶材,並通入碳源反應氣體,使獲得的色彩層的色度區域於CIE Lab表色系統的L*低於30。所述殼體呈現出具有吸引力的黑色的外觀,顏色均衡且無黑中帶藍或紅;另外所述色彩層還具有良好的抗磨損性能,可持久保持其良好的黑色的外觀,同時還可有效防止基體被磨損,相應地延長了殼體的使用壽命。The invention uses a target containing metal chromium and chromium carbide in the preparation process of the color layer, and introduces a carbon source reaction gas, so that the chromaticity region of the obtained color layer is low in the L* of the CIE Lab color system. At 30. The casing exhibits an attractive black appearance with a balanced color and no black or blue in red; in addition, the color layer also has good abrasion resistance and can maintain its good black appearance for a long time while still The base body can be effectively prevented from being worn, and the service life of the housing is correspondingly extended.

本發明提供一種靶材23(參圖2所示),該靶材23用以製備黑色膜層。該靶材23中含有金屬鉻(Cr)和碳化鉻(CrC),其中金屬鉻的質量百分含量為50~90%,碳化鉻的質量百分含量為10~50%。The present invention provides a target 23 (shown in Figure 2) for producing a black film layer. The target 23 contains metal chromium (Cr) and chromium carbide (CrC), wherein the metal chromium has a mass percentage of 50 to 90%, and the chromium carbide has a mass percentage of 10 to 50%.

本發明所述靶材23的製備方法,包含以下步驟:The method for preparing the target 23 of the present invention comprises the following steps:

(1)將鉻和碳化鉻的超細高純粉體放入球磨機中混合均勻,其中金屬鉻的質量百分含量為50~90%,碳化鉻的質量百分含量為10~50wt%,球磨時間為1~24小時。(1) The ultrafine and high-purity powders of chromium and chromium carbide are placed in a ball mill and mixed uniformly, wherein the metal chromium has a mass percentage of 50-90%, and the chromium carbide has a mass percentage of 10-50% by weight. The time is 1~24 hours.

(2)採用冷等靜壓對混合後的粉體原料進行預壓,使之成型為一坯體,預壓壓力為100~300MPa,保壓時間為1~10min。(2) The mixed powder material is pre-compressed by cold isostatic pressing to form a blank body, the pre-compression pressure is 100-300 MPa, and the dwell time is 1~10 min.

(3)將上述冷等靜壓製成的坯體放入燒結爐中進行熱壓燒結,從室溫開始升溫,升溫速率為90~100℃/min,當溫度升高到800~900℃時對坯體進行施壓,壓力為20~40MPa,當溫度上升到1000~1500℃時,將壓力調節為50~70MPa,保壓3~10min。降溫後取出得到塊體靶材。(3) The above-mentioned cold isostatically pressed green body is placed in a sintering furnace for hot pressing sintering, and the temperature is raised from room temperature, and the heating rate is 90 to 100 ° C / min, when the temperature is raised to 800 to 900 ° C. The pressure is 20~40MPa, and when the temperature rises to 1000~1500°C, the pressure is adjusted to 50~70MPa and the pressure is kept for 3~10min. After cooling, the block target was taken out.

可以理解的,該靶材23的製備方法不限於上述方法,也可採用其他方法製備。It can be understood that the preparation method of the target 23 is not limited to the above method, and may be prepared by other methods.

本發明殼體10(如圖1所示)的製備方法包括以下步驟:The preparation method of the casing 10 (shown in FIG. 1) of the present invention comprises the following steps:

提供一基體11,該基體11的材質為金屬、玻璃、陶瓷或塑膠。A substrate 11 is provided, which is made of metal, glass, ceramic or plastic.

對該基體11進行預處理,該預處理包括對基體11進行常規的除油、除蠟、酸洗、中和、噴淋等步驟。The substrate 11 is subjected to a pretreatment which comprises the steps of conventional degreasing, wax removal, pickling, neutralization, spraying, etc. of the substrate 11.

採用磁控濺射法在所述基體11的表面形成色彩層13。A color layer 13 is formed on the surface of the substrate 11 by magnetron sputtering.

結合參閱圖2,提供一真空鍍膜機20,該真空鍍膜機20包括一鍍膜室21及連接於鍍膜室21的一真空泵30,真空泵30用以對鍍膜室21抽真空。該鍍膜室21內設有轉架(未圖示)、二靶材23。轉架帶動基體11沿圓形的軌跡25運行,且基體11在沿軌跡25運行時亦自轉。Referring to FIG. 2, a vacuum coater 20 is provided. The vacuum coater 20 includes a coating chamber 21 and a vacuum pump 30 connected to the coating chamber 21 for vacuuming the coating chamber 21. A rotating frame (not shown) and two targets 23 are provided in the coating chamber 21. The turret drives the base body 11 to run along a circular trajectory 25, and the base body 11 also rotates as it travels along the trajectory 25.

形成色彩層13的具體操作方法可為:將基體11固定於真空鍍膜機20的轉架上,設置轉架的公轉轉速為1~3rpm(轉/分鐘),抽真空使該鍍膜室21的本底真空度為8×10-3Pa,所述基體11若為塑膠,不需要對鍍膜室21加熱(或保持室溫),所述基體11若為金屬、玻璃或陶瓷,加熱該鍍膜室21使鍍膜室21溫度為50~200℃;採用靶材23,設定靶材23的功率為8~12kW,設定施加於基體11的偏壓為-50~-200V,偏壓的佔空比為30~70%;通入反應氣體乙炔,乙炔的流量為80~120sccm,通入工作氣體氬氣,氬氣的流量為300~500sccm,沉積所述色彩層13。沉積所述色彩層13的時間為15~60min。該色彩層13為鉻-碳層,其化學式為CrxCy,其中x:y的值介於1:6與1:5之間。該色彩層13的厚度為1~3μm。可以理解的,鍍膜過程中,反應氣體也可為其他的碳源反應氣體,如甲烷等。The specific operation method for forming the color layer 13 may be: fixing the base 11 to the turret of the vacuum coating machine 20, setting the revolution speed of the turret to 1 to 3 rpm (revolutions per minute), and vacuuming the present portion of the coating chamber 21 The bottom vacuum is 8×10 −3 Pa. If the substrate 11 is plastic, the coating chamber 21 does not need to be heated (or kept at room temperature), and if the substrate 11 is metal, glass or ceramic, the coating chamber 21 is heated. The temperature of the coating chamber 21 is set to 50 to 200 ° C. The target 23 is used to set the power of the target 23 to 8 to 12 kW, and the bias voltage applied to the substrate 11 is set to be -50 to -200 V, and the duty ratio of the bias is 30. ~70%; the reaction gas acetylene is introduced, the flow rate of acetylene is 80-120 sccm, the working gas argon gas is introduced, and the flow rate of argon gas is 300-500 sccm, and the color layer 13 is deposited. The time for depositing the color layer 13 is 15 to 60 minutes. The color layer 13 is a chromium-carbon layer having a chemical formula of Cr x C y , wherein the value of x:y is between 1:6 and 1:5. The color layer 13 has a thickness of 1 to 3 μm. It can be understood that during the coating process, the reaction gas can also be other carbon source reaction gases such as methane.

該色彩層13於CIE Lab表色系統的L*座標介於27至30之間,a*座標介於-0.1至0.1之間,b*座標介於-0.1至0.1之間。The color layer 13 has a L* coordinate between 27 and 30 in the CIE Lab color system, an a* coordinate between -0.1 and 0.1, and a b* coordinate between -0.1 and 0.1.

可以理解的,本發明所述殼體10還可在基體11與色彩層13之間設置一過渡層,以增加膜基結合力。It can be understood that the housing 10 of the present invention can also provide a transition layer between the base 11 and the color layer 13 to increase the film-based bonding force.

請再一次參閱圖1,由上述製備方法所獲得的殼體10包括基體11及形成於基體11表面的色彩層13,該色彩層13為鉻-碳層,其化學式為CrxCy,其中x:y的值介於1:6與1:5之間。Referring to FIG. 1 again, the housing 10 obtained by the above preparation method includes a base 11 and a color layer 13 formed on the surface of the base 11. The color layer 13 is a chromium-carbon layer having a chemical formula of Cr x C y , wherein The value of x:y is between 1:6 and 1:5.

基體11的材質為金屬、玻璃、陶瓷或塑膠。The base 11 is made of metal, glass, ceramic or plastic.

該色彩層13肉眼直觀呈現黑色,其於CIE Lab表色系統的L*座標介於27至30之間,a*座標介於-0.1至0.1之間,b*座標介於-0.1至0.1之間。該色彩層13的厚度為1~3μm。The color layer 13 is visually black in color, and the L* coordinate of the CIE Lab color system is between 27 and 30, the a* coordinate is between -0.1 and 0.1, and the b* coordinate is between -0.1 and 0.1. between. The color layer 13 has a thickness of 1 to 3 μm.

下面藉由實施例來對本發明進行具體說明。The invention will now be specifically described by way of examples.

實施例1Example 1

提供一基體11,該基體11的材質為不銹鋼。A base 11 is provided, which is made of stainless steel.

將預處理後的基體11放入真空鍍膜機20的鍍膜室21中,所述真空鍍膜機20為中頻磁控濺射鍍膜機。The pretreated substrate 11 is placed in a coating chamber 21 of a vacuum coater 20, which is an intermediate frequency magnetron sputtering coater.

開啟真空泵30對鍍膜室21抽真空並設定本底真空度為8×10-3Pa,開啟轉架並設定轉速為3轉/分鐘,開啟鍍膜室21加熱並設定鍍膜室21內的溫度為80℃。The vacuum pump 30 is turned on to evacuate the coating chamber 21 and set the background vacuum degree to 8×10 −3 Pa, the turntable is turned on and the rotation speed is set to 3 rpm, the coating chamber 21 is turned on and the temperature in the coating chamber 21 is set to 80. °C.

使用的靶材23中金屬鉻的含量為50wt%,剩餘的為碳化鉻。The content of metal chromium in the target 23 used was 50% by weight, and the remainder was chromium carbide.

待鍍膜室21的真空度抽至上述設定值後,開啟靶材23,並設定靶材23的功率為8kW,基體11的偏壓-80V,佔空比為50%,通入工作氣體氬氣和反應氣體乙炔,氬氣流量為300sccm,乙炔流量為105sccm,沉積所述色彩層13,沉積時間為40min。After the vacuum degree of the coating chamber 21 is drawn to the above-mentioned set value, the target 23 is turned on, and the power of the target 23 is set to 8 kW, the bias voltage of the substrate 11 is -80 V, the duty ratio is 50%, and the working gas argon gas is introduced. And the reaction gas acetylene, the flow rate of argon gas was 300 sccm, the flow rate of acetylene was 105 sccm, the color layer 13 was deposited, and the deposition time was 40 min.

由本實施例所製得的色彩層13呈現的色度區域於CIE Lab表色系統的L*座標為28.99,a*座標為-0.04,b*座標為-0.6。The color region 13 produced by the present embodiment exhibits a chromaticity region of 28.99 for the CIE Lab color system, an a* coordinate of -0.04, and a b* coordinate of -0.6.

實施例2Example 2

提供一基體11,該基體11的材質為玻璃。A substrate 11 is provided, the material of which is glass.

本實施例所使用的真空鍍膜機20與實施例1中的相同。The vacuum coater 20 used in the present embodiment is the same as that in the first embodiment.

開啟真空泵30對鍍膜室21抽真空並設定本底真空度為8×10-3Pa,開啟轉架並設定轉速為3轉/分鐘,開啟鍍膜室21加熱並設定鍍膜室21內的溫度為80℃。The vacuum pump 30 is turned on to evacuate the coating chamber 21 and set the background vacuum degree to 8×10 −3 Pa, the turntable is turned on and the rotation speed is set to 3 rpm, the coating chamber 21 is turned on and the temperature in the coating chamber 21 is set to 80. °C.

使用的靶材23中金屬鉻的含量為50wt%,剩餘的為碳化鉻。The content of metal chromium in the target 23 used was 50% by weight, and the remainder was chromium carbide.

待鍍膜室21的真空度抽至上述設定值後,開啟靶材23,並設定靶材23的功率為10kW,基體11的偏壓-100V,佔空比為50%,通入工作氣體氬氣和反應氣體乙炔,氬氣流量為300sccm,乙炔流量為120sccm,沉積所述色彩層13,沉積時間為60min。After the vacuum degree of the coating chamber 21 is drawn to the above-mentioned set value, the target 23 is turned on, and the power of the target 23 is set to 10 kW, the bias voltage of the substrate 11 is -100 V, the duty ratio is 50%, and the working gas argon gas is introduced. And the reaction gas acetylene, the flow rate of argon gas was 300 sccm, the flow rate of acetylene was 120 sccm, and the color layer 13 was deposited for a deposition time of 60 min.

由本實施例所製得的色彩層13呈現的色度區域於CIE Lab表色系統的L*座標為29.54,a*座標為-0.47,b*座標為0.05。The color region 13 produced by the present embodiment exhibits a chromaticity region of 29.54 for the CIE Lab color system, an a* coordinate of -0.47, and a b* coordinate of 0.05.

本發明殼體10可為筆記型電腦、個人數位助理等電子裝置的殼體,或為其他裝飾類產品的殼體。The housing 10 of the present invention may be a housing of an electronic device such as a notebook computer or a personal digital assistant, or a housing of other decorative products.

本發明在所述色彩層13的製備過程中使用一種含金屬鉻與碳化鉻的靶材23,並通入碳源反應氣體,使獲得的色彩層13的色度區域於CIE Lab表色系統的L*低於30。所述殼體10呈現出具有吸引力的黑色的外觀,顏色均衡且無黑中帶藍或紅;另外所述色彩層13還具有良好的抗磨損性能,可持久保持其良好的黑色的外觀,同時還可有效防止基體11被磨損,相應地延長了殼體10的使用壽命。In the preparation process of the color layer 13, the present invention uses a target 23 containing metal chromium and chromium carbide, and passes a carbon source reaction gas, so that the chromaticity region of the obtained color layer 13 is in the CIE Lab color system. L* is below 30. The housing 10 exhibits an attractive black appearance with a balanced color and no black or blue in red; in addition, the color layer 13 also has good anti-wear properties and can maintain its good black appearance for a long time. At the same time, the base body 11 can be effectively prevented from being worn, and the service life of the housing 10 is correspondingly extended.

10...殼體10. . . case

11...基體11. . . Matrix

13...色彩層13. . . Color layer

20...真空鍍膜機20. . . Vacuum coating machine

21...鍍膜室twenty one. . . Coating chamber

23...靶材twenty three. . . Target

25...軌跡25. . . Trajectory

30...真空泵30. . . Vacuum pump

圖1為本發明一較佳實施例的鍍膜件的剖視圖;1 is a cross-sectional view of a coated member according to a preferred embodiment of the present invention;

圖2為本發明一較佳實施例真空鍍膜機的俯視示意圖。2 is a top plan view of a vacuum coater according to a preferred embodiment of the present invention.

10...殼體10. . . case

11...基體11. . . Matrix

13...色彩層13. . . Color layer

Claims (10)

一種殼體的製備方法,其包括如下步驟:
提供一基體;
在該基體的表面形成一色彩層,該色彩層為鉻-碳層,其化學式為CrxCy,其中x:y的值介於1:6與1:5之間;所述色彩層的形成採用磁控濺射法,使用複合靶,通入碳源反應氣體,該複合靶中含有金屬鉻和碳化鉻,其中金屬鉻的質量百分含量為50~90%,碳化鉻的質量百分含量為10~50%;該色彩層呈現的色度區域於CIE Lab表色系統的L*座標介於27至30之間,a*座標介於-0.1至0.1之間,b*座標介於-0.1至0.1之間。
A method of preparing a casing, comprising the steps of:
Providing a substrate;
Forming a color layer on the surface of the substrate, the color layer being a chromium-carbon layer having a chemical formula of Cr x C y , wherein the value of x:y is between 1:6 and 1:5; The magnetron sputtering method is used to form a composite target, and a carbon source reaction gas is introduced. The composite target contains metal chromium and chromium carbide, wherein the metal chromium has a mass percentage of 50-90% and a chromium carbide mass percentage. The content is 10~50%; the chromaticity region of the color layer is between 27 and 30 in the C* Lab color system, the a* coordinate is between -0.1 and 0.1, and the b* coordinate is between -0.1 to 0.1.
如申請專利範圍第1項所述之殼體的製備方法,其中形成所述色彩層的工藝參數為:複合靶的功率為8~12kW,施加於基體的偏壓為-50~-200V,佔空比為30~70%;碳源反應氣體為乙炔,乙炔的流量為80~120sccm,以氬氣為工作氣體,氬氣的流量為300~500sccm,鍍膜溫度為50~200℃或室溫;沉積所述色彩層的時間為15~60min。The method for preparing a casing according to claim 1, wherein the process parameter for forming the color layer is: the power of the composite target is 8 to 12 kW, and the bias voltage applied to the substrate is -50 to -200 V, accounting for The air ratio is 30~70%; the carbon source reaction gas is acetylene, the flow rate of acetylene is 80~120sccm, argon gas is used as working gas, the flow rate of argon gas is 300~500sccm, and the coating temperature is 50~200°C or room temperature; The time for depositing the color layer is 15 to 60 minutes. 如申請專利範圍第1項所述之殼體的製備方法,其中所述基體的材質為金屬、玻璃、陶瓷或塑膠。The method for preparing a casing according to claim 1, wherein the substrate is made of metal, glass, ceramic or plastic. 如申請專利範圍第1項所述之殼體的製備方法,其中所述色彩層的厚度為1~3μm。The method for preparing a casing according to claim 1, wherein the color layer has a thickness of 1 to 3 μm. 如申請專利範圍第1項所述之殼體的製備方法,其中所述色彩層呈現黑色。The method of producing a casing according to claim 1, wherein the color layer is black. 如申請專利範圍第1項所述之殼體的製備方法,其中所述複合靶的製備方法為:將鉻和碳化鉻的粉體放入球磨機中混合均勻,其中金屬鉻的質量百分含量為50~90%,碳化鉻的質量百分含量為10~50wt%,球磨時間為1~24小時;採用冷等靜壓對混合後的粉體原料進行預壓,使之成型為一坯體,預壓壓力100~300MPa,保壓時間1~10min;將坯體放入燒結爐中進行熱壓燒結,從室溫開始升溫,升溫速率為90~100℃/min,當溫度升高到800~900℃時對坯體進行施壓,壓力為20~40MPa,當溫度上升到1000~1500℃時,將壓力調節為50~70MPa,保壓3~10min。The method for preparing a shell according to claim 1, wherein the composite target is prepared by placing a powder of chromium and chromium carbide in a ball mill and mixing uniformly, wherein the mass percentage of the metal chromium is 50~90%, the mass percentage of chromium carbide is 10~50wt%, and the ball milling time is 1~24 hours; the mixed powder raw material is pre-pressed by cold isostatic pressing to form it into a blank body. The pre-pressing pressure is 100~300MPa, and the holding time is 1~10min; the blank is placed in the sintering furnace for hot pressing sintering, and the temperature is raised from room temperature, the heating rate is 90~100°C/min, and the temperature rises to 800~ The body is pressed at 900 ° C, the pressure is 20 ~ 40MPa, when the temperature rises to 1000 ~ 1500 ° C, the pressure is adjusted to 50 ~ 70MPa, pressure for 3 ~ 10min. 一種殼體,其包括基體及形成於基體表面的色彩層,其改良在於:該色彩層為鉻-碳層,其化學式為CrxCy,其中x:y的值介於1:6與1:5之間;該色彩層呈現的色度區域於CIE Lab表色系統的L*座標介於27至30之間,a*座標介於-0.1至0.1之間,b*座標介於-0.1至0.1之間。A casing comprising a base body and a color layer formed on the surface of the base body, wherein the color layer is a chromium-carbon layer having a chemical formula of Cr x C y , wherein the value of x:y is between 1:6 and 1 Between 5; the color layer presents a chromaticity region between the C* Lab color system with an L* coordinate between 27 and 30, an a* coordinate between -0.1 and 0.1, and a b* coordinate between -0.1 Between 0.1 and 0.1. 如申請專利範圍第7項所述之殼體,其中所述基體的材質為金屬、玻璃、陶瓷或塑膠。The casing of claim 7, wherein the base material is made of metal, glass, ceramic or plastic. 如申請專利範圍第7項所述之殼體,其中所述色彩層的厚度為1~3μm。The casing of claim 7, wherein the color layer has a thickness of 1 to 3 μm. 如申請專利範圍第7項所述之殼體,其中所述色彩層呈現黑色。The casing of claim 7, wherein the color layer is black.
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