TW201207576A - Exposure apparatus - Google Patents

Exposure apparatus Download PDF

Info

Publication number
TW201207576A
TW201207576A TW100127629A TW100127629A TW201207576A TW 201207576 A TW201207576 A TW 201207576A TW 100127629 A TW100127629 A TW 100127629A TW 100127629 A TW100127629 A TW 100127629A TW 201207576 A TW201207576 A TW 201207576A
Authority
TW
Taiwan
Prior art keywords
light
light modulation
optical
spatial light
alignment
Prior art date
Application number
TW100127629A
Other languages
English (en)
Chinese (zh)
Inventor
Koichi Kajiyama
Michinobu Mizumura
Original Assignee
V Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by V Technology Co Ltd filed Critical V Technology Co Ltd
Publication of TW201207576A publication Critical patent/TW201207576A/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/03—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on ceramics or electro-optical crystals, e.g. exhibiting Pockels effect or Kerr effect
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Liquid Crystal (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Mathematical Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
TW100127629A 2010-08-03 2011-08-03 Exposure apparatus TW201207576A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010174201A JP5458391B2 (ja) 2010-08-03 2010-08-03 露光装置

Publications (1)

Publication Number Publication Date
TW201207576A true TW201207576A (en) 2012-02-16

Family

ID=45559343

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100127629A TW201207576A (en) 2010-08-03 2011-08-03 Exposure apparatus

Country Status (3)

Country Link
JP (1) JP5458391B2 (ja)
TW (1) TW201207576A (ja)
WO (1) WO2012017837A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6037099B2 (ja) * 2012-02-29 2016-11-30 株式会社ブイ・テクノロジー 偏光露光装置
CN103973285A (zh) * 2014-05-27 2014-08-06 唐名姣 一种光控光闸及其集成电路
CN106324912B (zh) * 2016-11-04 2019-11-05 武汉华星光电技术有限公司 线偏振紫外光灯

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4974941A (en) * 1989-03-08 1990-12-04 Hercules Incorporated Process of aligning and realigning liquid crystal media
JP2682892B2 (ja) * 1990-07-27 1997-11-26 大蔵省印刷局長 多元画像表示体および多元画像表示法
GB9825023D0 (en) * 1998-11-13 1999-01-06 Rolic Ag Optical component
JP3994679B2 (ja) * 2001-03-30 2007-10-24 富士ゼロックス株式会社 光記録方法及び光記録装置
JP2002350858A (ja) * 2001-05-28 2002-12-04 Sony Corp 光配向装置
JP2010091906A (ja) * 2008-10-10 2010-04-22 Seiko Epson Corp 電気光学装置の製造方法

Also Published As

Publication number Publication date
JP2012032730A (ja) 2012-02-16
JP5458391B2 (ja) 2014-04-02
WO2012017837A1 (ja) 2012-02-09

Similar Documents

Publication Publication Date Title
CN104823096B (zh) 光调制元件
TWI355544B (en) Production method of liquid crystal display and ex
TWI701525B (zh) 圖案描繪裝置
JP2010091906A (ja) 電気光学装置の製造方法
TW201222164A (en) Exposure apparatus
WO2019204667A1 (en) Polarization-dependent metasurfaces for 2d/3d switchable displays
WO2008004570A1 (fr) Filtre passe-bas optique, appareil photographique, dispositif de formation d'image et procédé de fabrication d'un filtre passe-bas optique
TW201035698A (en) Exposure apparatus, exposure method, and method of manufacturing device
CN102419516B (zh) 光照射装置和光照射方法
TW201142362A (en) Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method
TW201819083A (zh) 雷射光照射裝置
TW201207576A (en) Exposure apparatus
JP2010268444A (ja) 撮像装置
CN105425503A (zh) 电控可调焦摆焦液晶微透镜阵列及其制备方法
TW201222163A (en) Exposure apparatus using micro lens array and optical member
TWI422999B (zh) 全像顯示裝置、其製造方法及產生全像重建的方法
US8730311B2 (en) Manufacturing device of a film patterned retarder for a three dimensional display device
JP2008107594A (ja) 配向膜の製造装置及び液晶表示装置並びに配向膜の製造方法
JP5354779B2 (ja) 露光装置
CN105739184B (zh) 配向装置、配向系统及配向方法
TW201222167A (en) Exposure apparatus
CN112946960A (zh) 基于数字微反射镜的大幅面任意分布的光取向装置及方法
KR102665879B1 (ko) 액정 셔터 어레이를 포함하는 디지털 노광장치 및 이를 이용한 노광방법
JP5747303B2 (ja) 露光装置
KR20120061535A (ko) 패턴드 리타더의 제조방법