TW201141793A - Waste water recycle processing system and processing method thereof - Google Patents

Waste water recycle processing system and processing method thereof Download PDF

Info

Publication number
TW201141793A
TW201141793A TW99115777A TW99115777A TW201141793A TW 201141793 A TW201141793 A TW 201141793A TW 99115777 A TW99115777 A TW 99115777A TW 99115777 A TW99115777 A TW 99115777A TW 201141793 A TW201141793 A TW 201141793A
Authority
TW
Taiwan
Prior art keywords
wastewater
waste water
hydrogen peroxide
ammonia
treatment
Prior art date
Application number
TW99115777A
Other languages
Chinese (zh)
Other versions
TWI534096B (en
Inventor
guo-yi Chen
yi-chang Cao
Original Assignee
Mega Union Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mega Union Technology Inc filed Critical Mega Union Technology Inc
Priority to TW099115777A priority Critical patent/TWI534096B/en
Publication of TW201141793A publication Critical patent/TW201141793A/en
Application granted granted Critical
Publication of TWI534096B publication Critical patent/TWI534096B/en

Links

Landscapes

  • Physical Water Treatments (AREA)

Abstract

The present invention provides a waste water recycle processing system and a processing method thereof, including an alkaline waste water recycle processing system, an acidic waste water recycle processing system and an application thereof. This invention can effectively process ammonium ion and hydrogen peroxide-containing waste water during semiconductor process. Wherein the alkaline waste water recycle processing system adjusts the processed waste water to have strong basicity so that the ammonium ions in the waste water are converted into ammonia molecules and then flows in an air stream to perform a stripping operation for said ammonia molecule-containing waste water so as to remove the ammonia molecules in the waste water. The acidic waste water recycle processing system adjusts the processed waste water to have strong basicity and then uses an activated carbon decomposition device to decompose hydrogen peroxide in the waste water to be harmless oxygen. After the processed waste water is treated by this waste water recycle processing system, it can be reused as water source provided for semiconductor process.

Description

201141793 六、發明說明: 【發明所屬之技術領域】 統及其處理方法, 驗廢水其所含的銨 回收處理系統及其 本發明係提供一種廢水回收處理系 尤指一種可將半導體製程中排放的酸、 離子與過氧化氫作有效回收處理的廢水 處理方法。 【先前技術】201141793 VI. Description of the invention: [Technical field to which the invention pertains] System and method for treating the same, the ammonium recovery treatment system contained in the wastewater treatment and the invention provide a waste water recovery treatment system, especially one that can discharge the semiconductor process Waste water treatment method for acid, ion and hydrogen peroxide as effective recovery treatment. [Prior Art]

在半導體製程中,最常出現的製程步驟就是晶圓清洗 (wafer cleaning)。晶圓清洗之目的乃是為了去除附著於晶 圓表面上的有機化合物、金屬雜質或微粒(particle)等污染 物。而這些污染物會對於產品後續製程的影響非常大。因 此,在晶圓清洗製程中,必須有效的去除附著於晶圓表面 之有機化合物、金屬雜質以及微粒。為了避免這些附著於 晶圓表面上的污染物影響產品之良率,因此在進行每一製 程步驟之前或是之後都會進行晶圓清洗,以去除晶圓上污 染物。 一般習知常用於晶圓清洗的方法係為rca清洗製程 (RCA cleaning process),其使用之清洗液係包括有硫酸_過 氧化氫混合物(sulfuric acid-hydrogen peroxide mixture, SPM)、氨水-過氧化氫混合物(amm〇nium_hydr〇gen mixture,APM)與鹽酸-過氧化氫混合物(hydr〇chl〇dc add-hydrogen peroxide mixture, HPM) 。 而 上述這 些清洗 液係由 多種化學成分所構成’其中APM清洗液係包括氨水、雙 氧水與水所組成’ SPM清洗液則包括硫酸' 雙氧水與水所 3 201141793 組成’而HPM清洗液係、包括鹽酸、雙氧水與水所組成。 當晶圓完成_清洗製程之程序後,上述所使用過的化學 清洗液必須枚集且送至工廠内的廠務端回收與處理後才可 排放出去,以避免直接放流而造成嚴重環境的汙染。 半導體工廠内的廠務端通常設有一廢水回收處理系統 (reclaim systems)來回收與處理製程廢水’一般而言可再細 分為 酸性廢水回收系統(acidIn semiconductor manufacturing, the most common process step is wafer cleaning. The purpose of wafer cleaning is to remove contaminants such as organic compounds, metal impurities, or particles attached to the surface of the wafer. These contaminants can have a significant impact on the subsequent process of the product. Therefore, in the wafer cleaning process, it is necessary to effectively remove organic compounds, metal impurities, and particles attached to the surface of the wafer. To prevent these contaminants adhering to the wafer surface from affecting the yield of the product, wafer cleaning is performed before or after each process step to remove contaminants from the wafer. The commonly used method for wafer cleaning is the RCA cleaning process, which uses a sulfuric acid-hydrogen peroxide mixture (SPM), ammonia-peroxidation. A mixture of hydrogen (amm〇nium_hydr〇gen mixture, APM) and a mixture of hydrogen peroxide-hydrogen peroxide (HPM). The above cleaning liquids are composed of various chemical components. The APM cleaning liquid system consists of ammonia water, hydrogen peroxide and water. The SPM cleaning liquid includes sulfuric acid 'hydrogen peroxide and water. 3 201141793 ' and the HPM cleaning liquid system, including hydrochloric acid. , hydrogen peroxide and water. After the wafer finishes the process of cleaning process, the above-mentioned chemical cleaning liquid must be collected and sent to the factory end of the factory for recycling and treatment before being discharged to avoid serious environmental pollution caused by direct discharge. . The factory side of the semiconductor factory usually has a reclaim system to recover and treat the process wastewater. In general, it can be further classified into an acid wastewater recovery system.

waste reclaim system ,AWRWaste reclaim system , AWR

SyStem)」與「鹼性廢水回收系統(caustic waste reclaim system ’CWR system)」;然而,若只針對酸、驗廢水的酸 鹼性處理則較為單純’處理方式係將廢水送至中和池加藥 劑調節其pH值成中性後即可放流,但酸、鹼廢水成分中 的化予物質並無法去除,其中:酸性廢水的主要化學物質 係包括有硫酸根離子、磷酸根離子及高濃度的過氧化氫與"SyStem)" and "caustic waste reclaim system 'CWR system"; however, if the acid-alkaline treatment for acid and wastewater is only simple, the treatment method is to send the wastewater to the neutralization tank. After the agent adjusts its pH to neutral, it can be discharged, but the chemical substances in the acid and alkali wastewater components cannot be removed. Among them, the main chemical substances of acidic wastewater include sulfate ions, phosphate ions and high concentrations. Hydrogen peroxide and

尚濃度的銨根離子等,而鹼性廢水則包括有多種有機溶劑 及南濃度的過氧化氫與高濃度的銨根離子等。 該等廢水回收處理系統先將酸性廢水或鹼性廢水收集 至一緩衝槽(buffer tank)内,並分別連續地偵測槽中廢水之 導電度(conductivity)、酸鹼值(pH value)及總有機碳(t〇tal organic carbon,TOC)濃度值,若所偵測的廢水其水質符合 可處理的設定值範圍内時,再將酸鹼廢水繼續純化處理至 符合半導體製程中可使用之水質,而廢水經處理再生後, 仍可繼續循環使用;此外,製程廢水若需純化處理至半導 體製程中可使用的超純水程度,其處理的方法係包括有離 子交換(ion exchange)法、活性碳過濾(activatecJ carb〇n filtration)法與紫外線照射(Uv radiaii〇n)法等。—般來說, 201141793 半導體廢内的廢水回收處理系統通常會將上述的多種處理 方法作多種搭配使用,用以純化回收廢水,而操作的設備 通常包括有活性碳過濾單元、弱鹼性陰離子交換單元、強 酸性陽離子交換單元及逆滲透單元(reverse osmosis unit) 等’藉上述的設備將廢水高純化再生後’繼續於廠内的製 程端再循環使用。 然而’逆滲透單元所使用的逆滲透半透膜(reverse osmosis membrane,RO membrane)因不耐強氧化劑,易被 廢水的過氧化氫氧化分解,而造成逆滲透單元之過濾能力 喪失而必須再更換一新半透膜來繼續操作,造成廢水處 理的成本提南,再者,廢水中高濃度的銨離子成分並無法 以逆滲透半透膜或陰、陽離子交換樹脂來處理有效去除, 亦會造成賡水處理的負荷及環境的污染。 以上二點所述都是已知廢水回收處理系統未臻理想的 地方。由此可見,既有廢水回收處理系統實有待進一步檢 討’並謀求可行的解決方案。 【發明内容】 /有鑑於此,本發明之目的係在於提供一種廢水回收處 =糸統及其處理方法,其可針對半導體製程中帶有錄離子 粆雜4匕氫的廢水處理,將欲處理廢水中所帶有的高濃度 Γ 與過减氫予以移除’而得到不含㈣子與過氧化 為達上述目的 一驗性廢水回收處 ,本發明之廢水回收處理系統,係包括 理系統及一酸性廢水回收處理系統,苴 201141793 中: 該驗性廢水回收處理系統係 你桃 咕 栝有依序連接的一鹼性 廢水缓衝槽、一第一酸鹼值調整揭 一 ^及—含氨廢水處理單 兀’其中该含氦廢水處理單元係包 ^ ^ 括有—與第一醆鹼值調 整槽連接的氨吸收氣提單元以及虚& ^ ^ 汉興忒虱吸收氣提單元相連 接的一妓風機及一硫酸吸收槽;The ammonium ion is still in concentration, and the alkaline wastewater includes various organic solvents, hydrogen peroxide in the south concentration, and ammonium ion in the high concentration. The wastewater recycling treatment system first collects acidic wastewater or alkaline wastewater into a buffer tank, and continuously detects the conductivity, pH value and total amount of the wastewater in the tank. The concentration of organic carbon (TOC), if the water quality of the detected wastewater meets the set value of the treatable value, the acid-base wastewater is further purified to meet the water quality that can be used in the semiconductor process. After the wastewater is treated and regenerated, it can be recycled. In addition, if the process wastewater needs to be purified to the degree of ultrapure water that can be used in the semiconductor process, the treatment method includes ion exchange method and activated carbon. The method of filtering (activatecJ carb〇n filtration) and ultraviolet irradiation (Uv radiaii〇n). In general, 201141793 waste water recycling treatment system in semiconductor waste usually uses a variety of treatment methods as described above to purify the recovered wastewater. The operating equipment usually includes activated carbon filtration unit and weak alkaline anion exchange. The unit, the strong acid cation exchange unit, and the reverse osmosis unit, etc., after the high-purification and regeneration of the wastewater by the above-mentioned equipment, continue to be recycled at the process end of the plant. However, the reverse osmosis membrane (RO membrane) used in the reverse osmosis unit is easily decomposed by the peroxidation of the waste water due to its inability to resist strong oxidants, which causes the filtration capacity of the reverse osmosis unit to be lost and must be replaced. A new semi-permeable membrane continues to operate, causing the cost of wastewater treatment to be increased. Furthermore, the high concentration of ammonium ions in the wastewater cannot be effectively removed by reverse osmosis semipermeable membrane or anion or cation exchange resin, which may also cause 赓Water treatment load and environmental pollution. The above two points are all areas where the known wastewater reclamation treatment system is not ideal. It can be seen that the existing wastewater reclamation system has yet to be further reviewed and a viable solution is sought. SUMMARY OF THE INVENTION In view of the above, an object of the present invention is to provide a waste water recovery system, a sputum system, and a treatment method thereof, which can be applied to wastewater treatment with a recording ion doped hydrogen in a semiconductor process, which is to be treated. The high concentration of cesium in the wastewater and the reduction of hydrogen peroxide are removed to obtain a waste water recovery system that does not contain (iv) and peroxidize to achieve the above purpose. The wastewater recovery treatment system of the present invention includes a rational system and An acid waste water recycling system, 苴201141793: The water-repellent wastewater treatment system is an alkaline wastewater buffer tank with a sequential connection of your peach aphid, a first pH adjustment and an ammonia The wastewater treatment unit 兀 其中 该 该 该 该 ^ ^ ^ ^ ^ ^ ^ ^ ^ 氨 氨 氨 氨 氨 氨 氨 氨 氨 氨 氨 氨 氨 氨 氨 氨 氨 氨 氨 氨 氨 氨 氨 氨 氨 氨 氨 氨 氨 氨 氨 氨 氨 氨a fan and a sulfuric acid absorption tank;

該酸性廢水處理系統係包括有一酸性廢水緩衝槽、— 第二酸驗值調整槽、-過氧化氫處理單元、—逆滲透過濟 裝置、-紫外光殺菌裝置及—最終檢㈣,其中該過^ 氫處理單元係透過該第H驗值調整槽與該酸性廢水緩衝 槽相連接,並且包括有一活性碳分解裝置'一活性碳再生 裝置及一第三酸鹼值調整槽。 ^另方面,本發明亦提供一種廢水回收處理方法,其 係包括有一鹼性廢水回收處理與一酸性廢水回收處理:’、 該鹼性廢水回收處理包括: 先將一含有銨離子的鹼性廢水的酸鹼值調整至呈強鹼 性,進而令廢水内的銨離子易於轉化成氨分子的形式存 在’並得到一含有氨分子的的鹼性廢水; 再將該含有氨分子的的鹼性廢水對含氨廢水進行氣提 操作’進而得到一無氨成分的鹼性廢水及混有氨氣分子的 空氣;以及 該酸性廢水回收處理包括: 先將一含有過氧化氩的廢水的酸鹼值調整至呈強驗 性’以得到一含有過氧化氫的強鹼性廢水; 再將含有過氧化氫的強鹼性廢水藉由吸附操作將過氧 201141793 化IL分解成氧氣分子,而得到_ I合t$ μ p u & J 無3有過氧化氫的強鹼性 廢水; 再將該無含過氧化氫的強鹼性廢水的酸鹼值調整至呈 中性’而得到—中性的廢水; 將該中性的廢水以逆渗透方法進行雜質過滤以及紫外 光殺菌’並對其水質作檢測,若氨分子濃度,度、酸 鹼值及總有機碳濃度值,則最終得到一可回收至製程端再 度使用的純水。 【實施方式】 本發明係提供一種廢水回收處理系統,而有關廢水回 收處理系統之一較佳實施例,請參照圖丨所示,首先將製 粒排放的驗性廢水送至一鹼性廢水回收處理系統進行廢 水處理,而該鹼性廢水回收處理系統係包括有一鹼性廢水 緩衝槽10、一第一酸鹼值調整槽2〇及一含氨廢水的處理 單元30’首先由製程端收集其排放的驗性廢水,並送至該 鹼性廢水緩衝槽1〇中,而分別連續地檢測該鹼性廢水緩 衝槽10令廢水的的導電度(c〇nductivity)、酸驗值(ρΗ μ丨此) 及總有機碳(total organic carbon,TOC)濃度值(t〇C mg/1) ’若所偵測的鹼性廢水其水質符合可處理的設定值範 圍内時,可得到一含有銨離子的鹼性廢水,再將含有銨離 子的鹼性廢水送至第一酸鹼值調整槽2〇中,藉由適當的 添加鹼性的氫氧化鈉溶液(45%)或酸性的硫酸溶液(5〇%)來 對廢水作預處理’使廢水調整至呈強鹼性且酸鹼值至少超 過9.0以上’進而令廢水内的銨離子易於轉化成氨分子的 .201141793 形式存在’而得到一含有氨分子的的鹼性廢水,因而可將 該氨分子的鹼性廢水送至含氨廢水的處理單元3〇處理。 該含氨廢水處理單元3Ό係包括有一氨氣提裝置3 1、The acidic wastewater treatment system includes an acidic wastewater buffer tank, a second acid value adjustment tank, a hydrogen peroxide treatment unit, a reverse osmosis permeation device, an ultraviolet sterilization device, and a final inspection (four). ^ The hydrogen processing unit is connected to the acidic wastewater buffer tank through the H-th value adjustment tank, and includes an activated carbon decomposition unit 'an activated carbon regeneration unit and a third pH adjustment tank. In another aspect, the present invention also provides a wastewater recycling treatment method, which comprises an alkaline wastewater recovery treatment and an acidic wastewater recovery treatment: ', the alkaline wastewater recovery treatment comprises: firstly, an alkaline wastewater containing ammonium ions The pH value is adjusted to be strongly alkaline, so that the ammonium ions in the wastewater are easily converted into the form of ammonia molecules, and an alkaline wastewater containing ammonia molecules is obtained; and the alkaline wastewater containing the ammonia molecules is further Performing a stripping operation on the ammonia-containing wastewater to obtain an ammonia-free alkaline waste water and air mixed with ammonia gas molecules; and the acid waste water recovery treatment comprises: first adjusting the pH value of a wastewater containing argon peroxide To be strongly 'to obtain a strong alkaline wastewater containing hydrogen peroxide; then the strong alkaline wastewater containing hydrogen peroxide is decomposed into oxygen molecules by peroxidation 201141793 by adsorption operation to obtain _I t$ μ pu & J No 3 strong alkaline wastewater with hydrogen peroxide; then adjust the pH value of the strong alkaline wastewater containing no hydrogen peroxide to neutral, and obtain neutral wastewater;The neutral wastewater is subjected to impurity filtration and ultraviolet sterilization by reverse osmosis method, and the water quality is detected. If the ammonia concentration, degree, pH value and total organic carbon concentration value are obtained, a recyclable process can be finally obtained. Pure water used again. [Embodiment] The present invention provides a wastewater recovery treatment system, and a preferred embodiment of the wastewater recovery treatment system, as shown in the figure, firstly sends the granulated wastewater to the alkaline wastewater recovery. The treatment system performs wastewater treatment, and the alkaline wastewater recovery treatment system includes an alkaline wastewater buffer tank 10, a first pH adjustment tank 2, and an ammonia-containing wastewater treatment unit 30', which is first collected by the process end. The discharged experimental wastewater is sent to the alkaline wastewater buffer tank, and the alkaline wastewater buffer tank 10 is continuously detected to determine the conductivity (c〇nductivity) and acid value (ρΗ μ丨) of the wastewater. This) and the total organic carbon (TOC) concentration value (t〇C mg/1) 'If the detected alkaline wastewater has a water quality that meets the set value range, an ammonium ion is obtained. The alkaline waste water is sent to the first pH adjustment tank 2, and the alkaline sodium hydroxide solution (45%) or the acidic sulfuric acid solution is appropriately added (5). 〇%) to pre-empt the wastewater Rational 'making the wastewater to be strongly alkaline and having a pH of at least 9.0 or more' to facilitate the conversion of ammonium ions in the wastewater into ammonia molecules. The 201141793 form exists to obtain an alkaline wastewater containing ammonia molecules. The alkaline wastewater of the ammonia molecule can be sent to a treatment unit 3 containing ammonia wastewater for treatment. The ammonia-containing wastewater treatment unit 3 includes an ammonia stripping device 3 1 .

一鼓風機32及一硫酸吸收槽33,當該含氨廢水處理單元 30對含有氨分子的鹼性廢水處理時,先將含有氨分子的驗 性廢水送至氨氣提裝置31的氣提塔311進行氣提操作, 藉由鼓風機32產生流動的空氣通入該氨氣提裝置31的氣 提塔311 ’使氨分子由廢水中逸出至空氣中,進而得到一 無氨成分的鹼性廢水及混有氨氣分子的空氣,可將混有氨 氣分子的空氣排至與硫酸吸收槽33連接的吸收塔312作 處理’經由源自硫酸吸收槽33内的硫酸溶液可連續且重 .複地吸收氨氣分子’可去除通入空氣中的氨氣分子,並且 可於吸收塔3 12内付到硫酸錢之.固.體,,而當吸收议3 12 之液位達至向液位時’再將吸收塔3 12内的硫酸録自動抽 至一硫酸銨儲槽34儲放,而該無氨成分的鹼性廢水可直 接排放至一酸性廢水回收處理系統再進行第二次的處理。 再請參照圖2所示,可將製程端排放的酸性廢水與經 前述驗性廢水回收處理系統的氨氣提裝置31處理過所得 到的無氨成分的鹼性廢水送至該酸性廢水回收處理系統: 行處理’該酸性廢水處理系統係包括有一酸性廢水緩衝槽 40、一第二酸鹼值調整槽50、—過氧化氫處理單元曰 一逆滲透過濾裝置80、一紫外光殺菌裝置9〇及—最終檢 測槽100;先將上述由製程端排放的酸性廢水與經前述鹼 性廢水回收處理系統的氨氣提裝置31處理過所得到=無 氨成分的鹼性廢水收集後,再分別送至該酸性廢水緩衝桦 201141793 40中,並連續地偵測該醆性廢水緩衝槽中的導電度、酸鹼 值及總有機碳濃度值(TOC<5 mg/〗),若所偵測的廢水其水 質符合可處理的設定值範圍内時,可得到一含有過氧化氫 的廢水,進而將含有過氧化氫的廢水送至第二酸鹼值調整 槽50中,藉由適當的添加鹼性的氫氧化鈉溶液或酸性的 硫酸溶液(50%)來對廢水作預處理,使廢水調整至呈強鹼 性且酸鹼值至少超過8_5以上,以令廢水内的過氧化氫處 於一弱鹼性狀態,以得到一含有過氧化氫的弱鹼性廢水, 因而可將含有過氧化氫分子的弱鹼性廢水送至過氧化氫處 理單元60進行廢水處理。 该過氧化氫處理單元60係包括有一活性碳分解裝置 61、一活性碳再生裝置62及一第三酸鹼值調整槽7〇,當 該過氧化氫處理單元60對含有過氧化氫的強鹼性廢水處 理時,先將含有過氧化氫的強鹼性廢水送至活性碳分解裝 置61接觸,利用活性碳分解裝置61本身形成的複數微小 孔隙對過氧化氫進行吸附反應r又由於處於強鹼性狀態下 更利其將過氧化氫分解成無害的氧氣分子,以得到一無含 有過氧化氫的強鹼性廢水;當活性碳分解裝置61的活性 碳與廢水中廢水中的微粒子二者濃度達到平衡時,則活性 碳分解裝置達飽和(exhausted)狀態,此時需以該活性碳再 生裝置62對該活性碳分解裝置進行反洗(backwash)程序, 將阻塞活性碳微小空隙的微粒子洗去,使活性碳分解裝置 Μ與活性碳再生裝£ 62彳連續地對含有過氧化氮的強鹼 性廢水進行處理,當該強鹼性廢水中的過氧化氫濃度合於 所設定之放流廢水標準時’即將該無含有過氧化氣的強鹼 201141793 性廢水送至第三酸驗值調整槽70’藉由適當的添加鹼性的 氫氧化鈉溶液或酸性的硫酸溶液(5〇%)來對該無含有過氧 化氫的弱鹼性廢水的酸鹼性作調整,而得到—酸鹼值為7〇 中性的廢水,並進一步將該中性的廢水送至逆滲透過濾裝 置80進行雜質過濾。 該逆滲透過濾裝置80可以將含有許多污染物質的中 性的廢水過濾,藉由大於自然滲透壓差的壓力後,使該中 性的廢水中的污染物質攔戴在逆滲透膜而被去除,達到水 質純化的目的,而得到一逆滲透過濾後的水,並再將逆滲 透過濾後的水送至紫外光殺菌裝置9〇進行殺菌處理。而 紫外光殺菌裝置,由於屬於物理式處理,並不需添加化學 藥劑而可直接將逆滲透過濾後的水進行殺菌,利用細菌被 紫外光殺菌裝置90照射後,紫外光光將穿透細菌,且紫 外光之光波會抑制細菌的繁殖,因而達到消毒的效果,而 得到一純水,最終將該純水送至最終檢測槽1〇〇,並連續 地檢測該最终檢測槽中的氨分子濃度(ΜΗ〆1〇〇 ppb)、導 電度((:〇1^.<300 //8/(^)、酸鹼值(阳:6〜8)及總有機碳濃度 值(TOC< 1 mg/i),當最終檢測槽之水其符合所設定之回收 水標準時,可將此一經純化處理後且符合半導體製程中可 使用之回收水回收至製程端再度使用。 此外,本發明的之廢水回收處理系統與方法,可由硫 酸銨儲存槽34内的硫酸銨之固體,並可去除通入空氣中 的氨氣分子,而所得到的硫酸銨並可作為農業用的肥料, 尤其在缺硫的土壤上可得到很好施肥效果,其兼具環 實用效果。 201141793 【圖式簡單說明】 圖1 :係本發明之較佳的實施例之流程圖。 圖2 :係本發明之較佳的實施例另一流程圖。A blower 32 and a sulfuric acid absorption tank 33, when the ammonia-containing wastewater treatment unit 30 treats the alkaline wastewater containing ammonia molecules, first sends the test wastewater containing the ammonia molecules to the stripping tower 311 of the ammonia stripping device 31. Performing a stripping operation, the flow of air generated by the blower 32 is introduced into the stripping tower 311' of the ammonia stripping device 31 to allow ammonia molecules to escape from the wastewater into the air, thereby obtaining an ammonia-free alkaline wastewater and The air mixed with the ammonia gas molecules can discharge the air mixed with the ammonia gas molecules to the absorption tower 312 connected to the sulfuric acid absorption tank 33 for treatment. The sulfuric acid solution from the sulfuric acid absorption tank 33 can be continuously and repeatedly The absorption of ammonia molecules can remove the ammonia molecules that are introduced into the air, and can be used to absorb the sulfuric acid in the absorption tower 3 12 , and when the liquid level of the absorption 3 12 reaches the liquid level 'The sulfuric acid in the absorption tower 3 12 is automatically pumped to the ammonium sulfate storage tank 34 for storage, and the ammonia-free alkaline wastewater can be directly discharged to an acidic wastewater recovery treatment system for a second treatment. Referring to FIG. 2, the acidic waste water discharged from the process end and the ammonia-free alkaline waste water treated by the ammonia stripping device 31 of the above-mentioned tentative wastewater recovery and treatment system can be sent to the acidic wastewater recycling treatment. System: Line treatment 'The acidic wastewater treatment system includes an acidic wastewater buffer tank 40, a second pH adjustment tank 50, a hydrogen peroxide treatment unit, a reverse osmosis filtration device 80, and an ultraviolet sterilization device. And the final detection tank 100; firstly, the acidic waste water discharged from the process end and the ammonia stripping device 31 processed by the alkaline waste water recovery and treatment system are used to collect the alkaline wastewater obtained by the non-ammonia component, and then separately sent To the acidic wastewater buffered birch 201141793 40, and continuously detecting the conductivity, pH value and total organic carbon concentration value (TOC < 5 mg / 〗) in the buffer tank of the alkaline wastewater, if the detected wastewater When the water quality is within the range of the settable values that can be treated, a wastewater containing hydrogen peroxide can be obtained, and the wastewater containing hydrogen peroxide is sent to the second pH adjustment tank 50 by appropriate addition of alkali. The sodium hydroxide solution or the acidic sulfuric acid solution (50%) is used to pretreat the wastewater, so that the wastewater is adjusted to be strongly alkaline and the pH value is at least more than 8_5, so that the hydrogen peroxide in the wastewater is in a weak base. The state of the state is such that a weakly alkaline wastewater containing hydrogen peroxide is obtained, so that the weakly alkaline wastewater containing hydrogen peroxide molecules can be sent to the hydrogen peroxide treatment unit 60 for wastewater treatment. The hydrogen peroxide treatment unit 60 includes an activated carbon decomposition unit 61, an activated carbon regeneration unit 62, and a third pH adjustment tank 7〇. When the hydrogen peroxide treatment unit 60 is used for a strong base containing hydrogen peroxide. In the treatment of the wastewater, the strong alkaline wastewater containing hydrogen peroxide is first sent to the activated carbon decomposition device 61 for contact, and the adsorption of the hydrogen peroxide by the plurality of micropores formed by the activated carbon decomposition device 61 itself is also caused by the strong alkali. It is more advantageous to decompose hydrogen peroxide into harmless oxygen molecules in a sexual state to obtain a strong alkaline wastewater containing no hydrogen peroxide; when the activated carbon of the activated carbon decomposition device 61 and the fine particles in the wastewater are in a wastewater concentration When the equilibrium is reached, the activated carbon decomposition apparatus is in an exhausted state. At this time, the activated carbon decomposition apparatus 62 is subjected to a backwashing process to wash off the fine particles blocking the minute voids of the activated carbon. , the activated carbon decomposition device and the activated carbon regeneration device are continuously treated to treat the strong alkaline wastewater containing nitrogen peroxide, in the strong alkaline wastewater. When the hydrogen peroxide concentration is combined with the set discharge wastewater standard, the short-lived 201141793 wastewater containing no peroxygen gas is sent to the third acid value adjustment tank 70' by appropriate addition of alkaline sodium hydroxide solution or acidity. The sulfuric acid solution (5〇%) is used to adjust the acidity and alkalinity of the weak alkaline wastewater containing no hydrogen peroxide, thereby obtaining a wastewater having a pH of 7〇 neutral and further neutralizing the neutral wastewater. It is sent to the reverse osmosis filtration device 80 for impurity filtration. The reverse osmosis filtration device 80 can filter the neutral waste water containing a lot of pollutants, and the pollutants in the neutral waste water are blocked by the reverse osmosis membrane by the pressure greater than the natural osmotic pressure difference. To achieve the purpose of purifying the water, a reverse osmosis filtered water is obtained, and the reverse osmosis filtered water is sent to the ultraviolet sterilizing device 9 for sterilization treatment. The ultraviolet light sterilizing device is a physical treatment, and the water after the reverse osmosis filtration can be directly sterilized without adding a chemical agent. After the bacteria are irradiated by the ultraviolet ray sterilizing device 90, the ultraviolet light will penetrate the bacteria. And the ultraviolet light wave can inhibit the proliferation of bacteria, thus achieving the disinfection effect, and obtaining a pure water, and finally sending the pure water to the final detection tank 1 连续, and continuously detecting the concentration of ammonia molecules in the final detection tank. (ΜΗ〆1〇〇ppb), conductivity ((:〇1^.<300 //8/(^), pH value (yang: 6~8) and total organic carbon concentration value (TOC< 1 mg /i), when the water of the final detection tank meets the set recycled water standard, the purified water which has been purified and processed in accordance with the semiconductor process can be recycled to the process end for reuse. Further, the wastewater of the present invention is used. The recycling treatment system and method can be used to store the solid ammonium sulfate in the tank 34 by ammonium sulfate, and can remove the ammonia molecules which are introduced into the air, and the obtained ammonium sulfate can be used as a fertilizer for agriculture, especially in the case of sulfur deficiency. Available on soil Fig. 1 is a flow chart showing a preferred embodiment of the present invention. Fig. 2 is a flow chart showing a preferred embodiment of the present invention. Fig. 2 is a flow chart showing a preferred embodiment of the present invention. .

【主要元件符號說明】 1 0鹼性廢水缓衝槽 30含氨廢水處理單无 311氣提塔 32鼓風機 34硫酸銨儲存槽 50第二酸鹼值調整槽 6-1活性碳分解裝置 70第三酸鹼值調整槽 90紫外光殺菌裝置 20第一酸鹼值調整槽 31氨氣提裝置 3 1 2吸收塔 33硫酸吸收槽 4 0酸性廢水缓衝槽 60過氧化氫處理單元 62活性碳再生裝置 80逆滲透過濾裝置 100最終檢測槽[Main component symbol description] 1 0 alkaline wastewater buffer tank 30 containing ammonia wastewater treatment single 311 stripping tower 32 blower 34 ammonium sulfate storage tank 50 second pH adjustment tank 6-1 activated carbon decomposition device 70 third Acid-base adjusting tank 90 ultraviolet sterilizing device 20 first acid-base adjusting tank 31 ammonia stripping device 3 1 2 absorption tower 33 sulfuric acid absorption tank 40 acid waste water buffer tank 60 hydrogen peroxide treatment unit 62 activated carbon regeneration device 80 reverse osmosis filtration device 100 final detection tank

1111

Claims (1)

201141793 七、申請專利範圍: / 1·-種廢水回收處理系統,係包括一鹼性廢水回收處 理系統及一酸性廢水回收處理系統,其中: i驗f生廢水回收處理系統係、包括有依序連接的一驗性 廢水緩衝槽、一笛 ^ 第—酸鹼值調整槽及一含氨廢水處理單 二2 水處理單元係包括有-與第-酸驗值調 "提裝置以及與該氨氣提裝置相連接的一鼓 風機及一硫酸吸收槽; 該酸性廢水處理系轉在 糸,.·先係匕括有一酸性廢水緩衝槽、一 第二酸鹼值調整槽、一 & 氧化虱處理單元、一逆滲透過濾 裝置、一紫外光殺菌梦罟 — & + βο 裝置及一最終檢測槽,其中該過氧化 虱處理早元係透過該坌__ ^, 第一馱鹼值调整槽與該酸性廢水緩衝 槽相連接,並且包括有一 ν石注奴分解裝置、一活性碳再生 裝置及一第三酸鹼值調整槽。 2. 如申請專利範圍…所述之廢水回收處理系統, 其^驗性廢水_槽的_“端係與第—酸驗值調整槽 相接,该氨氣提裝置係包括一 秸 轧棱塔、一吸收塔、一硫酸 及收槽以及一硫酸銨儲槽, ^ , 乳提塔係與第一酸鹼值調整 槽相接,該氣提塔分別遠技古# ^ 接有豉風機與吸收塔,而該吸收 。的一進給端係與硫酸吸收 AlU Β1 Λ ^ Λ 叹僧連接,而該吸收塔的一出口 螭則與硫酸銨儲槽連接。 3. 如申請專利範圍第1 j. , _ Λ χ 嚷所逃之廢水回收處理系統’ 其中該活性碳分解裝置的 ^ ik ^ ^ ^ ^ ^ 進口 7刀別與該第二酸鹼值調整 僧與活性奴再生裝置相接, 筮-缺认,士 , 又'舌性碳分解裝置的一出口與 第二Sk驗值調整槽相接,而 ^ ~ ^文驗值調整槽之出口端與 12 .201141793 該逆滲透過濾裝置連接 光殺菌裝置相接,該紫 終檢測槽相接。 運接’而該逆滲透過濾裝置係與該紫外 該紫外光殺菌裝置的一出口端係與該最 項或第3項所述之廢水回收處201141793 VII. Patent application scope: / 1·- kinds of wastewater recycling treatment system, including an alkaline wastewater recycling treatment system and an acid wastewater recycling treatment system, wherein: i test f wastewater recycling treatment system, including sequential An experimental wastewater buffer tank connected, a flute gas-pH adjustment tank, and an ammonia-containing wastewater treatment unit 2 2 water treatment unit include a - and a - acid test value adjustment device and the ammonia a blower connected to the gas stripping device and a sulfuric acid absorption tank; the acidic wastewater treatment system is transferred to the crucible, the first system includes an acidic wastewater buffer tank, a second pH adjustment tank, and a < a unit, a reverse osmosis filter device, an ultraviolet sterilization nightmare- & + βο device and a final detection tank, wherein the ruthenium peroxide treatment early element passes through the 坌__^, the first osmium value adjustment groove The acidic wastewater buffer tank is connected and includes a ν stone injection decomposition device, an activated carbon regeneration device and a third pH adjustment tank. 2. In the wastewater recycling treatment system described in the scope of application of the patent, the _"end system of the _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ , an absorption tower, a sulfuric acid and a trough and an ammonium sulfate storage tank, ^, the lactating tower is connected with the first pH adjustment tank, and the stripping tower is respectively separated by a remote fan and absorbed The tower, and the absorption end of the absorption system is connected to the sulfuric acid absorption AlU Β1 Λ ^ Λ sigh, and the outlet enthalpy of the absorption tower is connected to the ammonium sulfate storage tank. 3. As claimed in the patent scope 1 j. , _ Λ χ 嚷 之 之 之 废水 其中 其中 其中 其中 其中 其中 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该Lack of recognition, gentleman, and an outlet of the tongue carbon decomposition device is connected to the second Sk value adjustment groove, and the outlet end of the calibration value adjustment groove is connected with 12.201141793. The reverse osmosis filter device is connected to the light sterilization. When the devices are connected, the purple final detecting tank is connected. The transporting and the reverse osmosis filtering device The UV germicidal ultraviolet light with the outlet end of a device or system and the wastewater of the item 3 at the uppermost item recovered 4.如申請專利範圍第 理系統,第一酸鹼搐調44. If the patent scope system is applied, the first acid-base 搐 4 處理與一酸性廢水回收處理: 該驗性廢水回收處理包括: 先將一含有銨離子的鹼性廢水的酸鹼值調整至呈強鹼 性,進而令廢水内的銨離子易於轉化成氨分子的形式存 在,並得到一含有氣分子的的鹼性廢水; 再將該含有氨分子的的鹼性廢水對含氨廢水進行氣提 操作,進而得到-無氨成分的驗性廢水及混有氨氣分子的 空氣;以及 , 該酸性廢水回收處理包括: 先將一含有過氧化氫的廢水的酸鹼值調整至呈強鹼 性,以得到一含有過氧化氫的強鹼性廢水; 廢水; 再將含有過氧化氫的強鹼性廢水藉由吸附操作將過氧 化氫分解成氧氣分子,而得到〆無含有過氧化氫的_性 再將該無含過氧化氫的強鹼性廢水的酸鹼值調整至呈 中性’而得到.一中性的廢水; 將該中性的廢水以逆滲透方法進行雜質過濾以及紫外 13 201141793 光殺菌’並對其水質作私,Bt 質作铋測,若氨分子濃度、導電度、酸 鹼值及總有機碳濃度值, θ 貝J最終传到一可回收至製程端再 度使用的純水。 如申明專利範圍第5項所述之廢水回收處理方法, 八中將3有錢離子的驗性廢水送的酸驗值調整至呈強驗 性的步驟包括將該含有錢離子的驗性廢水酸驗值調整至酸 鹼值至少超過9.0。Treatment and treatment of an acidic wastewater: The laboratory wastewater treatment includes: first adjusting the pH value of an alkaline wastewater containing ammonium ions to be strongly alkaline, thereby facilitating the conversion of ammonium ions in the wastewater into ammonia molecules. The form exists, and an alkaline wastewater containing gas molecules is obtained; and the alkaline wastewater containing ammonia molecules is subjected to a gas stripping operation on the ammonia-containing wastewater, thereby obtaining an ammonia-free inorganic test wastewater and ammonia gas mixed therein. Molecular air; and, the acid waste water recovery treatment comprises: first adjusting a pH value of a wastewater containing hydrogen peroxide to be strongly alkaline to obtain a strong alkaline wastewater containing hydrogen peroxide; wastewater; The strong alkaline wastewater containing hydrogen peroxide decomposes hydrogen peroxide into oxygen molecules by an adsorption operation, thereby obtaining a pH value of the hydrogen peroxide-free strong alkaline wastewater containing no hydrogen peroxide. Adjusted to neutrality to obtain a neutral wastewater; the neutral wastewater is filtered by reverse osmosis method and UV 13 201141793 light sterilization' and its water quality is private, Bt Measured for bismuth, ammonia molecules if the concentration, conductivity, total organic carbon concentration of the acid value and the base value, [theta] reached a final shell J recycled to the process again measured using pure water side. For example, in the wastewater recycling treatment method described in item 5 of the patent scope, the acidity test value of the experimentally effluent sent by the three rich ions is adjusted to a strong step including the acidity of the test water containing the money ion. The test value is adjusted to a pH of at least 9.0. 7.如申請專利範圍帛5項所述之廢水回收處理方法, 其中將-含有過氧化氫的廢水的酸驗值調整至呈強驗性的 步驟包括將該含有過氧化氫的廢水酸鹼值調整至酸鹼值至 少超過8.5。 之廢水回收處理方 8.如申請專利範圍第6或7項所述 法,該吸附操作係以活性碳作為其媒介 八、圖式:(如次頁)7. The wastewater recovery treatment method according to claim 5, wherein the step of adjusting the acid value of the wastewater containing hydrogen peroxide to a positive step comprises the pH value of the wastewater containing hydrogen peroxide Adjust to a pH of at least 8.5. Wastewater recovery treatment 8. As described in the scope of claim 6 or 7, the adsorption operation uses activated carbon as its medium. 8. Pattern: (eg next page)
TW099115777A 2010-05-18 2010-05-18 Wastewater recovery and treatment system and its treatment method TWI534096B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW099115777A TWI534096B (en) 2010-05-18 2010-05-18 Wastewater recovery and treatment system and its treatment method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW099115777A TWI534096B (en) 2010-05-18 2010-05-18 Wastewater recovery and treatment system and its treatment method

Publications (2)

Publication Number Publication Date
TW201141793A true TW201141793A (en) 2011-12-01
TWI534096B TWI534096B (en) 2016-05-21

Family

ID=46764872

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099115777A TWI534096B (en) 2010-05-18 2010-05-18 Wastewater recovery and treatment system and its treatment method

Country Status (1)

Country Link
TW (1) TWI534096B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI613153B (en) * 2012-11-27 2018-02-01 Organo Corp Treatment device for ammonia-containing wastewater and treatment method for ammonia-containing wastewater
TWI803039B (en) * 2021-10-29 2023-05-21 超重力股份有限公司 Wastewater treatment method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI613153B (en) * 2012-11-27 2018-02-01 Organo Corp Treatment device for ammonia-containing wastewater and treatment method for ammonia-containing wastewater
TWI803039B (en) * 2021-10-29 2023-05-21 超重力股份有限公司 Wastewater treatment method

Also Published As

Publication number Publication date
TWI534096B (en) 2016-05-21

Similar Documents

Publication Publication Date Title
Acero et al. Micropollutants removal from retentates generated in ultrafiltration and nanofiltration treatments of municipal secondary effluents by means of coagulation, oxidation, and adsorption processes
JP3426072B2 (en) Ultrapure water production equipment
JP5567468B2 (en) Method and apparatus for treating organic wastewater
JP3477526B2 (en) Wastewater recovery equipment
US20040050786A1 (en) Method of removing organic impurities from water
JP5782229B2 (en) Wastewater treatment method
TWI540103B (en) Method for removing boron from a boron-containing wastewater
KR101476864B1 (en) Method and apparatus for removing organic matters
JP2008194560A (en) Evaluation method of water to be treated in membrane separation device, water treatment method, and water treatment device
JP2008272713A (en) Method for producing ultrapure water, and production device therefor
JP3800449B2 (en) Method and apparatus for treating organic wastewater containing high concentrations of salts
TWI613153B (en) Treatment device for ammonia-containing wastewater and treatment method for ammonia-containing wastewater
JP2000354729A5 (en)
TW201141793A (en) Waste water recycle processing system and processing method thereof
JP3417052B2 (en) Ultrapure water production method
JP5678436B2 (en) Ultrapure water production method and apparatus
JP3376639B2 (en) Pure water recovery method from semiconductor cleaning wastewater
JP6036011B2 (en) Method and apparatus for treating wastewater containing formaldehyde
Kiashemshaki et al. Investigation of the efficiency of the conventional water treatment processes employed to eliminate TOC in Jalaliyeh water treatment plant, Tehran
JP2002346561A (en) Treating method for wastewater containing salt of high concentration
JPH09253638A (en) Ultrapure water making apparatus
JP2004202313A (en) Method and apparatus for treating washing wastewater
JP6007282B2 (en) Waste water treatment method and waste water treatment equipment
Dolar et al. Combined Methods of Highly Polluted Pharmaceutical Wastewater Treatment--a Case Study of High Recovery.
JP3992996B2 (en) Wastewater treatment method and apparatus