TW201129873A - Substrate table for a lithographic apparatus, lithographic apparatus, method of using a substrate table and device manufacturing method - Google Patents

Substrate table for a lithographic apparatus, lithographic apparatus, method of using a substrate table and device manufacturing method

Info

Publication number
TW201129873A
TW201129873A TW99121112A TW99121112A TW201129873A TW 201129873 A TW201129873 A TW 201129873A TW 99121112 A TW99121112 A TW 99121112A TW 99121112 A TW99121112 A TW 99121112A TW 201129873 A TW201129873 A TW 201129873A
Authority
TW
Taiwan
Prior art keywords
substrate table
lithographic apparatus
device manufacturing
substrate
lithographic
Prior art date
Application number
TW99121112A
Other languages
English (en)
Other versions
TWI439817B (zh
Inventor
Raymond Wilhelmus Louis Lafarre
Jozef Petrus Henricus Benschop
Kate Nicolaas Ten
Niek Jacobus Johannes Roset
Gerardus Adrianus Antonius Maria Kusters
Alexander Nikolov Zdravkov
Hrishikesh Patel
Opstal Sander Van
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of TW201129873A publication Critical patent/TW201129873A/zh
Application granted granted Critical
Publication of TWI439817B publication Critical patent/TWI439817B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
TW99121112A 2009-06-30 2010-06-28 微影裝置的基板台、微影裝置、使用基板台的方法及元件製造方法 TWI439817B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US21365809P 2009-06-30 2009-06-30

Publications (2)

Publication Number Publication Date
TW201129873A true TW201129873A (en) 2011-09-01
TWI439817B TWI439817B (zh) 2014-06-01

Family

ID=43390566

Family Applications (1)

Application Number Title Priority Date Filing Date
TW99121112A TWI439817B (zh) 2009-06-30 2010-06-28 微影裝置的基板台、微影裝置、使用基板台的方法及元件製造方法

Country Status (6)

Country Link
US (1) US8941815B2 (zh)
JP (1) JP5162626B2 (zh)
KR (2) KR101160215B1 (zh)
CN (1) CN101937174B (zh)
NL (1) NL2004807A (zh)
TW (1) TWI439817B (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2006203A (en) * 2010-03-16 2011-09-19 Asml Netherlands Bv Cover for a substrate table, substrate table for a lithographic apparatus, lithographic apparatus, and device manufacturing method.
NL2006244A (en) 2010-03-16 2011-09-19 Asml Netherlands Bv Lithographic apparatus, cover for use in a lithographic apparatus and method for designing a cover for use in a lithographic apparatus.
JP5313293B2 (ja) 2010-05-19 2013-10-09 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、リソグラフィ装置で使用する流体ハンドリング構造およびデバイス製造方法
NL2008239A (en) * 2011-03-28 2012-10-01 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
NL2008695A (en) 2011-05-25 2012-11-27 Asml Netherlands Bv Lithographic apparatus comprising substrate table.
NL2008979A (en) 2011-07-11 2013-01-14 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
NL2008980A (en) 2011-07-11 2013-01-14 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
NL2009284A (en) * 2011-09-22 2013-10-31 Asml Netherlands Bv A cleaning substrate for a lithography apparatus, a cleaning method for a lithography apparatus and a lithography apparatus.
WO2017097502A1 (en) * 2015-12-08 2017-06-15 Asml Netherlands B.V. Substrate table, lithographic apparatus and method of operating a lithographic apparatus

Family Cites Families (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4509852A (en) 1980-10-06 1985-04-09 Werner Tabarelli Apparatus for the photolithographic manufacture of integrated circuit elements
US4742797A (en) 1987-06-25 1988-05-10 Xerox Corporation Tear drop seal
JPH1022200A (ja) 1996-07-04 1998-01-23 Rohm Co Ltd 半導体基板露光装置
WO1999049504A1 (fr) 1998-03-26 1999-09-30 Nikon Corporation Procede et systeme d'exposition par projection
US6461155B1 (en) 2001-07-31 2002-10-08 Novellus Systems, Inc. Method and apparatus for heating substrates in supercritical fluid reactor
US6680774B1 (en) 2001-10-09 2004-01-20 Ultratech Stepper, Inc. Method and apparatus for mechanically masking a workpiece
EP1420298B1 (en) 2002-11-12 2013-02-20 ASML Netherlands B.V. Lithographic apparatus
SG121822A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1420300B1 (en) 2002-11-12 2015-07-29 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
SG121819A1 (en) * 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP3977324B2 (ja) 2002-11-12 2007-09-19 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置
EP1429188B1 (en) 2002-11-12 2013-06-19 ASML Netherlands B.V. Lithographic projection apparatus
US7213963B2 (en) 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TW201445617A (zh) 2003-06-13 2014-12-01 尼康股份有限公司 基板載台、曝光裝置
EP3139214B1 (en) 2003-12-03 2019-01-30 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
JP4513534B2 (ja) 2003-12-03 2010-07-28 株式会社ニコン 露光装置及び露光方法、デバイス製造方法
JP2005175016A (ja) 2003-12-08 2005-06-30 Canon Inc 基板保持装置およびそれを用いた露光装置ならびにデバイス製造方法
US7394521B2 (en) 2003-12-23 2008-07-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7517639B2 (en) 2004-06-23 2009-04-14 Taiwan Semiconductor Manufacturing Co., Ltd. Seal ring arrangements for immersion lithography systems
US7501226B2 (en) 2004-06-23 2009-03-10 Taiwan Semiconductor Manufacturing Co., Ltd. Immersion lithography system with wafer sealing mechanisms
JP2006120889A (ja) 2004-10-22 2006-05-11 Sony Corp 半導体装置の製造方法及びその方法に用いられる半導体ウェハホルダ
US7365827B2 (en) 2004-12-08 2008-04-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2006173527A (ja) 2004-12-20 2006-06-29 Sony Corp 露光装置
JP2006202825A (ja) 2005-01-18 2006-08-03 Jsr Corp 液浸型露光装置
JP4548789B2 (ja) 2005-11-18 2010-09-22 台湾積體電路製造股▲ふん▼有限公司 ウェーハ封止機構を有する液浸リソグラフィシステム
US7446859B2 (en) 2006-01-27 2008-11-04 International Business Machines Corporation Apparatus and method for reducing contamination in immersion lithography
US7787101B2 (en) 2006-02-16 2010-08-31 International Business Machines Corporation Apparatus and method for reducing contamination in immersion lithography
US8027019B2 (en) 2006-03-28 2011-09-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7936447B2 (en) * 2006-05-08 2011-05-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8253922B2 (en) 2006-11-03 2012-08-28 Taiwan Semiconductor Manufacturing Company, Ltd. Immersion lithography system using a sealed wafer bath
US8634052B2 (en) 2006-12-13 2014-01-21 Asml Netherlands B.V. Lithographic apparatus and method involving a ring to cover a gap between a substrate and a substrate table
US8416383B2 (en) 2006-12-13 2013-04-09 Asml Netherlands B.V. Lithographic apparatus and method
JP2009105183A (ja) 2007-10-23 2009-05-14 Orc Mfg Co Ltd 投影露光装置
JP2008263092A (ja) * 2007-04-13 2008-10-30 Orc Mfg Co Ltd 投影露光装置
US7777863B2 (en) * 2007-05-30 2010-08-17 Asml Netherlands B.V. Lithographic apparatus with mask to prevent exposure of peripheral exposure region of substrate
US8125611B2 (en) * 2007-06-13 2012-02-28 Taiwan Semiconductor Manufacturing Company, Ltd. Apparatus and method for immersion lithography
US8889042B2 (en) 2008-02-14 2014-11-18 Asml Netherlands B.V. Coatings
NL2006203A (en) * 2010-03-16 2011-09-19 Asml Netherlands Bv Cover for a substrate table, substrate table for a lithographic apparatus, lithographic apparatus, and device manufacturing method.
NL2006244A (en) * 2010-03-16 2011-09-19 Asml Netherlands Bv Lithographic apparatus, cover for use in a lithographic apparatus and method for designing a cover for use in a lithographic apparatus.
NL2006536A (en) * 2010-05-13 2011-11-15 Asml Netherlands Bv A substrate table, a lithographic apparatus, a method of flattening an edge of a substrate and a device manufacturing method.
JP5313293B2 (ja) * 2010-05-19 2013-10-09 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、リソグラフィ装置で使用する流体ハンドリング構造およびデバイス製造方法

Also Published As

Publication number Publication date
JP5162626B2 (ja) 2013-03-13
CN101937174B (zh) 2013-03-27
TWI439817B (zh) 2014-06-01
CN101937174A (zh) 2011-01-05
KR20110001961A (ko) 2011-01-06
US8941815B2 (en) 2015-01-27
JP2011014905A (ja) 2011-01-20
NL2004807A (en) 2011-01-04
KR101160215B1 (ko) 2012-06-26
US20110013169A1 (en) 2011-01-20
KR20110114513A (ko) 2011-10-19

Similar Documents

Publication Publication Date Title
TW201129873A (en) Substrate table for a lithographic apparatus, lithographic apparatus, method of using a substrate table and device manufacturing method
IL243814A (en) Metrological system and method, lithographic system, lithographic processing cell and substrate including metrological purposes
SG157327A1 (en) Substrate table, lithographic apparatus and device manufacturing method
TWI369418B (en) Wafer electroplating apparatus for reducing edge defects
SG150453A1 (en) Lithographic apparatus and device manufacturing method
IL207506A0 (en) Metrology method and apparatus, lithographic apparatus, and device manufacturing method
GB201115008D0 (en) Housing for electronic apparatus, apparatus including such housing and method for making such housing
EP2312819A4 (en) METHOD, DEVICE AND SYSTEM FOR PROCESSING OUTGOING CALLS
EP2503615A4 (en) DEVICE, THIN-LAYER TRANSISTOR, METHOD FOR PRODUCING THE DEVICE AND METHOD FOR PRODUCING THE THIN-LAYER TRANSISTOR
EP2436498A4 (en) METHOD FOR PRODUCING A WAFERLINSE AND METHOD AND DEVICE FOR PRODUCING A WAFERLINSE COATING
IL218799A0 (en) Method, inspection apparatus and substrate for determining an approximate structure of an object on the substrate
EP2404684A4 (en) MACHINING APPARATUS AND MACHINING METHOD FOR A METAL PLATE
GB2463504B (en) Method and apparatus for installing tidal barrages
GB2482452A (en) Methods and apparatus for automated predictive design space estimation
EP2414174A4 (en) HARD PRINTING PLATE, PLATE MANUFACTURING METHOD FOR THE HARD PRINTING PLATE, AND PLATE MANUFACTURING APPARATUS FOR THE HARD PRINTING PLATE
EP2001045A4 (en) PLASMA CVD DEVICE, METHOD FOR FORMING THIN FILM AND SEMICONDUCTOR DEVICE
AP2010005498A0 (en) Apparatus and method for mechanical deaeration.
AP2012006273A0 (en) An apparatus and method for size reduction.
SG147353A1 (en) Apparatus for object processing
HK1171866A1 (zh) 基板支承構件、基板搬送裝置、基板搬送方法、曝光裝置及元件製造方法
HK1128349A1 (en) Method and apparatus for database table management
HK1166824A1 (zh) 金屬氧化膜的成膜方法、金屬氧化膜及金屬氧化膜的成膜裝置
EP2555054A4 (en) DEVELOPER FOR PROCESSING A FLAT PRESSURE PLATELETER, METHOD FOR PRODUCING A FLAT PRESSURE PLATE WITH THE DEVELOPER AND PRINTING METHOD
EP2498413A4 (en) METHOD AND DEVICE FOR PROCESSING DOWNLINK COMMUNICATION AND ASSISTANCE METHOD AND DEVICE THEREFOR
EP2414175A4 (en) PRINTING PLATE IN RELIEF, AND METHOD AND APPARATUS FOR MANUFACTURING PRINTING PLATE IN RELIEF