TW201127919A - Reflection prevention laminate and production method thereof, and curable composition - Google Patents

Reflection prevention laminate and production method thereof, and curable composition Download PDF

Info

Publication number
TW201127919A
TW201127919A TW099140217A TW99140217A TW201127919A TW 201127919 A TW201127919 A TW 201127919A TW 099140217 A TW099140217 A TW 099140217A TW 99140217 A TW99140217 A TW 99140217A TW 201127919 A TW201127919 A TW 201127919A
Authority
TW
Taiwan
Prior art keywords
group concentration
mmol
concentration
curable composition
particles
Prior art date
Application number
TW099140217A
Other languages
Chinese (zh)
Other versions
TWI377236B (en
Inventor
Takahiro Kawai
Eiichiro Urushihara
Taro Kanamori
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2010100663A external-priority patent/JP4831377B2/en
Priority claimed from JP2010100664A external-priority patent/JP4775603B2/en
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW201127919A publication Critical patent/TW201127919A/en
Application granted granted Critical
Publication of TWI377236B publication Critical patent/TWI377236B/zh

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/111Anti-reflection coatings using layers comprising organic materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02Physical, chemical or physicochemical properties
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/113Anti-reflection coatings using inorganic layer materials only
    • G02B1/115Multilayers
    • G02B1/116Multilayers including electrically conducting layers
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133502Antiglare, refractive index matching layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)

Abstract

This invention provides a curable composition capable of forming a cured film having low refractivity and excellent scratch resistance through one coating step and also provides an reflection prevention laminate having the cured film and its production method. The reflection prevention laminate according to this invention is characterized in that a cured film of the curable composition is disposed on the substrate, the curable composition containing a polymerizable compound having at least one polar group selected from the group consisting of hydroxyl, carboxyl, phosphate ester group, and sulfo group and particles in which refractivity is below 1.4. Moreover, the total concentration of the hydroxyl, carboxyl, phosphate ester group, and sulfo group contained in 1g polymerizable compound is above 0.5mmol/g and below 15mmol/g, and the aforementioned particles being locally located in the side of the aforementioned cured film opposite to the face contacting with the aforementioned substrate.

Description

201127919 六、發明說明: 【發明所屬之技術領域】 本發明係關於一種防反射用層合物及其製造方法,以 及硬化性組成物。 【先前技術】 近年來,液晶顯示裝置被使用作爲電視或個人電腦等 之顯示裝置。該液晶顯示裝置中,爲了防止外光映入提高 畫質,故而提案使用含有低折射率層之防反射膜。 過去之液晶顯示裝置所使用之防反射膜係藉由多層塗 佈低折射率層與硬質塗層而具備低折射率性及耐刮傷性。 該種具有多層構造之防反射膜雖可降低低折射率層之反射 率’但由於成爲多層構造而有生產性或成本差之問題。另 外,藉由層合低折射率層與硬質塗層而製造之防反射膜會 有低折射率層與硬質塗層之界面處容易造成剝離之問題。 爲解決該問題’而提出以氟矽烷修飾二氧化矽粒子, 且藉由表面能使液體中之二氧化矽粒子局部化後形成硬化 膜之防反射膜之製造方法(參照例如專利文獻1 )。 [先前技術文獻] [專利文獻1]日本國特開2001-316604號公報 【發明內容】 [發明欲解決之課題] 然而’專利文獻1所述之方法會有二氧化矽粒子局部 -5- 201127919 性不穩定之問題。 因此,本發明之該若千樣態爲提供解決上述課題,可 以一次塗佈步驟形成低折射率性及耐刮傷性優異之硬化膜 之硬化性組成物,以及具有該硬化膜之防反射用層合物以 及其製造方法者。 [用以解決課題之手段] 本發明係爲了解決上述課題之至少一部份而完成者, 可藉下述樣態或適用例而實現。 [適用例1] 本發明之防反射用層合物之一樣態之特徵爲: 於基材上具有硬化膜,該硬化膜含有具有選自羥基、 羧基、磷酸酯基及磺基之一種以上極性基之基質,與折射 率1·4以下之粒子,且lg之前述基質中之羥基濃度、羧基 濃度、磷酸酯基濃度及磺基濃度之合計爲0.5mmol/g以上 1 5mmol/g以下, 且前述粒子在前述硬化膜中係局部存在於與前述基材 接觸之面爲相反之面側。 依據該防反射用層合物,於與基材接觸之面爲相反之 面側具有高密度存在有折射率爲1.4 0以下之粒子之層’且 於與基材接觸之面側具有實質上不存在折射率1.40以下之 粒子之層,故可兼具耐刮傷性及低折射率性二者。 201127919[Technical Field] The present invention relates to a laminate for antireflection, a method for producing the same, and a curable composition. [Prior Art] In recent years, liquid crystal display devices have been used as display devices for televisions, personal computers, and the like. In the liquid crystal display device, in order to prevent external light from being reflected and to improve image quality, it is proposed to use an antireflection film containing a low refractive index layer. The antireflection film used in the conventional liquid crystal display device has low refractive index and scratch resistance by coating a low refractive index layer and a hard coat layer in multiple layers. Such an antireflection film having a multilayer structure can reduce the reflectance of the low refractive index layer, but has a problem of productivity or cost due to the multilayer structure. Further, the antireflection film produced by laminating the low refractive index layer and the hard coat layer has a problem that the interface between the low refractive index layer and the hard coat layer is liable to cause peeling. In order to solve this problem, a method for producing an antireflection film in which a cerium oxide particle is modified with a fluorohalane and a cerium oxide particle in a liquid surface is localized to form a cured film is proposed (see, for example, Patent Document 1). [Prior Art Document] [Patent Document 1] Japanese Laid-Open Patent Publication No. 2001-316604 [Draft of the Invention] [Problems to be Solved by the Invention] However, the method described in Patent Document 1 may have cerium oxide particles locally-5-201127919 The problem of sexual instability. Therefore, in the present invention, in order to solve the above problems, it is possible to form a curable composition of a cured film having excellent low refractive index and scratch resistance in a single application step, and an antireflection having the cured film. A laminate and a method for producing the same. [Means for Solving the Problem] The present invention has been made to solve at least a part of the above problems, and can be realized by the following aspects or application examples. [Application Example 1] The antireflection laminate of the present invention is characterized in that it has a cured film containing at least one polarity selected from the group consisting of a hydroxyl group, a carboxyl group, a phosphate group, and a sulfo group. a matrix of the base, and a particle having a refractive index of 1.4 or less, and a total of a hydroxyl group concentration, a carboxyl group concentration, a phosphate group concentration, and a sulfo group concentration in the matrix of lg is 0.5 mmol/g or more and 15 mmol/g or less, and The particles are partially present on the surface opposite to the surface in contact with the substrate in the cured film. According to the antireflection laminate, the layer having a high refractive index of 1.40 or less is present on the opposite side of the surface in contact with the substrate, and the surface side in contact with the substrate has substantially no Since there is a layer of particles having a refractive index of 1.40 or less, both scratch resistance and low refractive index can be achieved. 201127919

[適用例2J 適用例1之防反射用層合物中’ lg之前述基質中之經 基濃度爲2.0mmol/g以上15mmol/g以下。[Application Example 2J In the antireflection laminate of Application Example 1] The base concentration in the above-mentioned matrix of lg is 2.0 mmol/g or more and 15 mmol/g or less.

[適用例3J 適用例1之防反射用層合物中,lg之前述基質中之殘 基濃度、磷酸酯基濃度及磺基濃度之合計爲0_5mm〇丨/§以 上10mm〇l/g以下。 [適用例4] 適用例1之防反射用層合物中,lg之前述基質中之殘 基濃度、磷酸醋基濃度及擴基濃度之合計爲〇.5mmol/g以 上5mmol/g以下 。 [適用例5] 適用例1之防反射用層合物中,前述粒子爲中空二氧 化砂粒子。 [適用例6] 本發明之防反射用層合物之一樣態,其特徵爲 於基材上具有硬化性組成物之硬化膜,該硬化性組成 物含有具有選自羥基 '羧基、磷酸酯基及磺基之一種以上 極性基之聚合性化合物及折射率1 .40以下之粒子,且1 g之 全部聚合性化合物中之羥基濃度、羧基濃度、磷酸酯基濃 201127919 度及磺基濃度之合計爲〇.5mmol/g以上15mmol/g以下’ 且前述粒子在前述硬化膜中係局部存在於與前述基材· 接觸之面爲相反之面側。 依據該防反射用層合物,於與基材接觸之面爲相反之 面側具有高密度存在有折射率爲1.40以下之粒子之層,且 於與基材接觸之面側具有實質上不存在折射率1.40以下之 粒子之層,故可兼具耐刮傷性及低折射率性二者。 [適用例7] 適用例6之防反射用層合物中,ig之前述全部聚合性 化合物中之經基濃度爲2.〇mmol/g以上15mmo丨/ g以下。 [適用例8] 適用例6之防反射用層合物中,lg之前述全部聚合性 化合物中之羧基濃度、磷酸酯基濃度及磺基濃度之合計爲 0.5mmol/g以上 l〇mmol/g以下。 [適用例9] 適用例6之防反射用層合物中,ig之前述全部聚合性 化合物中之羧基濃度、磷酸酯基濃度及磺基濃度之合計爲 0.5mmol/g 以上 5mmol/g 以下》 [適用例1〇] 適用例6之防反射用層合物中,前述粒子爲中空二氧[Applicable Example 3J In the antireflection laminate of Application Example 1, the total of the residue concentration, the phosphate group concentration, and the sulfonic acid concentration in the above-mentioned matrix of lg is 0_5 mm § / § 10 mm 〇 l / g or less. [Application Example 4] In the antireflection laminate of the first embodiment, the total of the residue concentration, the phosphoric acid vinegar concentration, and the base concentration in the matrix of lg is 5 mmol/g or more and 5 mmol/g or less. [Application Example 5] In the antireflection laminate of the first aspect, the particles are hollow silica sand particles. [Application Example 6] The same as the antireflection laminate of the present invention, characterized in that it has a cured film of a curable composition containing a hydroxyl group selected from a hydroxyl group and a phosphate group. And a polymerizable compound having one or more polar groups of a sulfo group and particles having a refractive index of 1.40 or less, and a total of a hydroxyl group concentration, a carboxyl group concentration, a phosphate group concentration of 201127919 degrees, and a sulfo group concentration in all the polymerizable compounds of 1 g. It is 55 mmol / g or more and 15 mmol / g or less ' and the said particle exists in the surface of the said hardened film in the surface of the surface which contact the base material. According to the antireflection laminate, a layer having particles having a refractive index of 1.40 or less is present at a high density on the surface opposite to the surface of the substrate, and substantially does not exist on the surface side in contact with the substrate. Since the layer having a refractive index of 1.40 or less has a layer of both scratch resistance and low refractive index. [Application Example 7] In the antireflection laminate of the application example 6, the base concentration in all the polymerizable compounds of ig is 2. 〇mmol/g or more and 15 mmo 丨/g or less. [Application Example 8] In the antireflection laminate of the application example 6, the total of the carboxyl group concentration, the phosphate group concentration, and the sulfo group concentration in all the polymerizable compounds of lg is 0.5 mmol/g or more and 10 mmol/g. the following. [Application Example 9] In the antireflection laminate of the application example 6, the total of the carboxyl group concentration, the phosphate group concentration, and the sulfo group concentration in all the polymerizable compounds of ig is 0.5 mmol/g or more and 5 mmol/g or less. [Application Example 1] In the antireflection laminate of Application Example 6, the particles are hollow dioxins

S -8 - 201127919 化矽粒子。 [適用例1 1] 適用例1至適用例1〇之任一例中’前述基材爲三乙醯 基纖維素樹脂薄膜或聚對苯二甲酸乙二酯樹脂薄膜。 [適用例12] 本發明之防反射用層合物之製造方法之一樣態,其特 徵爲 包含將硬化性組成物塗佈於基材上後經硬化之步驟, 其中該硬化性組成物含有具有選自羥基 '羧基、磷酸酯基 及磺基之一種以上之極性基之聚合性化合物及折射率爲 1 .40以下之粒子,且1 g之全部聚合性化合物中之羥基濃度 、羧基濃度、磷酸酯基濃度及磺基濃度之合計爲 0.5mmol/g 以上 15mol/g 以下。 依據該防反射用層合物之製造方法,藉由將滿足前述 條件之硬化性組成物一次塗佈於基材上並經硬化’可於與 基材接觸之面爲相反面側上形成以高密度存在有折射率胃 1.40以下之粒子之層,於與基材接觸之面上形成實質上不 存在折射率爲1.40以下之粒子之層。據此’可製造兼具耐 刮傷性及低折射率性二者之防反射用層合物。 [適用例13] 適用例12之防反射用層合物之製造方法中’前述硬 <匕 201127919 性組成物之全部聚合性化合物1 g中之羥基濃度爲 2.0mmol/g 以上 15mmol/g 以下。 [適用例14] 適用例12之防反射用層合物之製造方法中,前述硬化 性組成物之全部聚合性化合物lg中之羧基濃度、磷酸酯基 濃度及磺基濃度之合計爲〇.5mmol/g以上l〇mm〇l/g以下。 [適用例1 5 ] 適用例12之防反射用層合物之製造方法中,前述硬化 性組成物之全部聚合性化合物lg中之羧基濃度、磷酸酯基 濃度及磺基濃度之合計爲〇.5mmol/g以上5mmol/g以下。 [適用例16] 適用例12之防反射用層合物之製造方法中,前述粒子 爲中空二氧化矽粒子》 [適用例I7] 適用例12至適用例16任一例之防反射用層合物之製造 方法中,前述基材爲三乙醯基纖維素樹脂薄膜或聚對苯二 甲酸乙二酯樹脂薄膜。 [適用例18] 本發明之硬化性組成物之一樣態其特徵爲, λ -10- 201127919 含有具有選自羥基、羧基、磷酸酯基及磺基之一種以 上之極性基之聚合性化合物及折射率爲〗.40以下之粒子’ 且1 g之全部聚合性化合物中之羥基濃度、羧基濃度 '磷酸 酯基濃度及磺基濃度之合計爲〇.5mmol/g以上l5m〇l/g以下 [適用例19] 適用例1 8之硬化性組成物中,1 g之前述全部聚合性化 合物中之經基濃度爲2.0mmol/g以上15mm〇l/g以下。 [適用例20] 適用例1 8之硬化性組成物中,含有(甲基)丙烯酸2 -羥基乙酯作爲前述聚合性化合物。 [適用例21] 適用例1 8之硬化性組成物中,1 g之前述全部聚合性化 合物中之羧基濃度、磷酸酯基濃度及磺基濃度之合計爲 0.5mmol/g以上 l〇mmol/g以下。 [適用例22] 適用例1 8之硬化性組成物中,1 g之前述全部聚合性化 合物中之羧基濃度、磷酸酯基濃度及磺基濃度之合計爲 0.5mmol/g以上 5mmol/g以下。 -11 - 201127919 [適用例23] 適用例1 8至適用例22任一例之硬化性組成 粒子爲中空二氧化矽粒子。 [發明效果] 依據本發明之防反射用層合物之製造方法 之硬化性組成物一次塗佈於基材上並經硬化, 觸之面爲相反面側上形成以高密度存在折射率 之粒子之層,且在與基材接觸之面側上形成實 1.40以下之粒子之層。據此,可製造兼具耐刮 射率性二者之防反射用層合物。 【實施方式】 以下針對本發明之較佳實施形態加以詳細 本發明並不受限於下述之實施形態,亦包含不 主旨之範圍內進行之各種變形例。 1.硬化性組成物 本實施形態之硬化性組成物含有(A1 )具 、羧基、磷酸酯基及磺基之一種以上極性基之 物,與(B )折射率爲1.4以下之粒子。以下, 形態之硬化性組成物之各成分加以詳細說明。 述中之(A)至(D)之各材料分別簡化描述尽 至(D )成分。 物中,前述 ,可將特定 在與基材接 爲1.4 0以下 質上不存在 傷性及低折 說明。又, 改變本發明 有選自羥基 聚合性化合 針對本實施 又,以下敘 r ( A )成分 -12- 201127919 1.1. ( A )聚合性化合物 本實施形態之硬化性組成物含有(A )聚合性化 。(A )聚合性化合物爲具有聚合性官能基之化合物 好爲具有(甲基)丙烯醯基、乙烯基或環氧基之化合 另外,(A)聚合性化合物爲包含(A1)具有選自羥 羧基、磷酸酯基及磺基之一種以上極性基之聚合性化 。本實施形態之硬化性組成物較好含有前述(A 1 )具 性基之聚合性化合物,亦可含有該等以外之不具有極 之聚合性化合物(以下亦稱爲(A2 )成分)。前述 )具有極性基之聚合性化合物之功能之一列舉爲形成 膜時引起後述(B )成分局部化,提高硬化性組成物 膜性。 至於(A1)成分只要是具有選自羥基、羧基、磷 基及磺基之一種以上之極性基即無特別限制,但較好 甲基)丙烯酸酯類。 具有羥基之聚合性化合物列舉爲例如(甲基)丙 2 -經基乙酯' (甲基)丙烯酸羥基丙酯、季戊四醇三 基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、新 醇二(甲基)丙烯酸酯、六氫苯二甲酸環氧丙烯酸酯 油環氧丙烯酸酯、(甲基)丙烯酸2,3 -二羥基丙酯、 基乙基乙烯基醚等。 胃有羧基之聚合性化合物列舉爲例如丙烯酸、丙 二聚物 '琥珀酸改質之二季戊四醇五丙烯酸酯、2,2 合物 ,較 物。 基、 合物 有極 性基 (A1 硬化 之成 酸酯 爲( 烯酸 (甲 戊二 、甘 2-羥 烯酸 ,2三 -13- 201127919 丙烯醯氧基甲基乙基琥珀酸、1〇-甲基丙烯醯氧基十伸甲 基丙二酸、4-甲基丙烯氧基胺基水楊酸、4-甲基丙烯醯氧 基乙基氧基羰基苯二甲酸' 4-甲基丙烯醯氧基乙基氧基羰 基苯二甲酸酐、N-甲基丙烯醯基-Ν’,N’-二羧基甲基-1,4-二胺基苯、N-2-羥基-3-甲基丙烯醯氧基丙基-N-苯基甘胺 酸、4-乙烯基苯甲酸、3,4,3’,4’-聯苯四羧酸酐與2-羥基乙 基甲基丙烯酸酯之1 : 2加成物、均苯四酸酐與甲基丙烯酸 2-羥基乙酯之1 : 2加成物等。 具有磷酸酯基之聚合性化合物列舉爲例如磷酸三丙烯 酸酯、2-甲基丙烯醯氧基乙基磷酸、2-甲基丙烯醯氧基乙 基苯基磷酸、10-甲基丙烯醯氧基十伸甲基磷酸、4-乙烯基 苄基磷酸、五丙烯醯氧基二季戊四醇磷酸等。 具有磺基之聚合性化合物列舉爲例如2-丙烯醯胺-2-甲 基丙烷磺酸等。 (A1)成分,於前述例示之成分中,較好爲含有季戊 四醇三(甲基)丙烯酸酯、(甲基)丙烯酸2-羥基乙酯、 丙烯酸、丙烯酸二聚物、琥珀酸改質之二季戊四醇五丙烯 酸酯、2,2,2-三丙烯醯氧基甲基乙基琥珀酸、磷酸三丙烯 酸酯、2-丙烯醯胺-2-乙基丙烷磺酸等者。 藉由含有(A1)成分,可容易地在與基材接觸之面爲 相反側之面上形成使(B )成分局部化之硬化膜。 該等之(A 1 )具有極性基之聚合性化合物可單獨使用 一種或兩種以上混合使用,亦可與如前述之(A2)不具有 極性基之聚合性化合物倂用。S -8 - 201127919 Chemical particles. [Application Example 1 1] In any one of Application Examples 1 to 1, the substrate is a triethylenesulfonated cellulose resin film or a polyethylene terephthalate resin film. [Application Example 12] In the same manner as in the method for producing an antireflection laminate of the present invention, the method comprises the steps of applying a hardenable composition to a substrate and then hardening, wherein the curable composition contains a polymerizable compound selected from a polar group of at least one of a hydroxyl group, a phosphate group, and a sulfo group, and a particle having a refractive index of 1.40 or less, and a hydroxyl group concentration, a carboxyl group concentration, and a phosphoric acid in all of the polymerizable compounds of 1 g The total of the ester group concentration and the sulfo group concentration is 0.5 mmol/g or more and 15 mol/g or less. According to the method for producing the antireflection laminate, the curable composition satisfying the above conditions is applied to the substrate once and hardened, and can be formed on the opposite side to the surface in contact with the substrate. A layer having particles having a refractive index of 1.40 or less is present in the density, and a layer having substantially no refractive index of 1.40 or less is formed on the surface in contact with the substrate. According to this, it is possible to manufacture an antireflection laminate which has both scratch resistance and low refractive index. [Application Example 13] In the method for producing an antireflection laminate of the application example 12, the hydroxyl group concentration in 1 g of all the polymerizable compounds of the above-mentioned hard <匕201127919 composition is 2.0 mmol/g or more and 15 mmol/g or less. . [Application Example 14] In the method for producing an antireflection laminate according to Application Example 12, the total of the carboxyl group concentration, the phosphate group concentration, and the sulfo group concentration in all the polymerizable compounds lg of the curable composition is 〇.5 mmol. /g or more l〇mm〇l/g or less. [Application Example 15] In the method for producing an antireflection laminate according to Application Example 12, the total of the carboxyl group concentration, the phosphate group concentration, and the sulfo group concentration in all the polymerizable compounds lg of the curable composition is 〇. 5 mmol/g or more and 5 mmol/g or less. [Application Example 16] In the method for producing an antireflection laminate of the application example 12, the particles are hollow cerium oxide particles. [Application Example I7] The antireflection laminate of any one of Application Examples 12 to 16 In the production method, the substrate is a triethylenesulfonated cellulose resin film or a polyethylene terephthalate resin film. [Application Example 18] The same state of the curable composition of the present invention is characterized in that λ -10- 201127919 contains a polymerizable compound having one or more polar groups selected from a hydroxyl group, a carboxyl group, a phosphate group, and a sulfo group, and a refractive index. The total of the hydroxyl group concentration, the carboxyl group concentration, the phosphate group concentration, and the sulfo group concentration in all the polymerizable compounds of 1 g is 〇.5 mmol/g or more and l5 m〇l/g or less. [Example 19] In the curable composition of Application Example 1, the base concentration in 1 g of all the polymerizable compounds is 2.0 mmol/g or more and 15 mm〇/g or less. [Application Example 20] The curable composition of Application Example 1 1 contains 2-hydroxyethyl (meth)acrylate as the polymerizable compound. [Application Example 21] In the curable composition of Example 1, the total of the carboxyl group concentration, the phosphate group concentration, and the sulfo group concentration in all the above polymerizable compounds of 1 g is 0.5 mmol/g or more and 10 mmol/g. the following. [Application Example 22] The total of the carboxyl group concentration, the phosphate group concentration, and the sulfo group concentration in all the polymerizable compounds of the above-mentioned 1 g of the curable composition of 1 g is 0.5 mmol/g or more and 5 mmol/g or less. -11 - 201127919 [Application Example 23] The curable composition of any of Examples 8 to 24 is a hollow cerium oxide particle. [Effect of the Invention] The curable composition according to the method for producing an antireflection laminate of the present invention is applied to a substrate once and hardened, and the contact surface is formed on the opposite side to form a particle having a refractive index at a high density. The layer is formed on the side of the surface in contact with the substrate to form a layer of particles of 1.40 or less. According to this, it is possible to manufacture an antireflection laminate which has both scratch resistance. BEST MODE FOR CARRYING OUT THE INVENTION The present invention is not limited to the following embodiments, and various modifications are possible within the scope of the invention. 1. Curable composition The curable composition of the present embodiment contains (A1) one or more polar groups having a carboxyl group, a phosphate group and a sulfo group, and (B) particles having a refractive index of 1.4 or less. Hereinafter, each component of the form of the curable composition will be described in detail. Each of the materials (A) to (D) in the description simplifies the description as far as the component (D). In the above, it can be specified that it is 1.40 or less with the substrate, and there is no damage and low folding. Further, the present invention is selected from a hydroxyl group-polymerizable compound. In the present embodiment, the following r (A) component -12-201127919 1.1. (A) Polymerizable compound The curable composition of the present embodiment contains (A) polymerizability. Chemical. (A) The polymerizable compound is a compound having a polymerizable functional group, preferably a compound having a (meth) acrylonitrile group, a vinyl group or an epoxy group, and (A) a polymerizable compound containing (A1) having a group selected from hydroxy group. Polymerization of one or more polar groups of a carboxyl group, a phosphate group, and a sulfo group. The curable composition of the present embodiment preferably contains the polymerizable compound of the above (A 1 ) group, and may contain a polymerizable compound having no polarity other than the above (hereinafter also referred to as a component (A2)). One of the functions of the above-mentioned polymerizable compound having a polar group is that when the film is formed, localization of the component (B) described later is caused, and the film properties of the curable composition are improved. The (A1) component is not particularly limited as long as it has one or more kinds of polar groups selected from the group consisting of a hydroxyl group, a carboxyl group, a phosphorus group and a sulfo group, and is preferably a methyl) acrylate. The polymerizable compound having a hydroxyl group is exemplified by, for example, (meth)propan-2-ethylidene ethyl ester 'hydroxypropyl methacrylate (meth) acrylate, pentaerythritol tris) acrylate, dipentaerythritol penta (meth) acrylate, neoalcohol (Meth) acrylate, hexahydrophthalic acid epoxy acrylate oil epoxy acrylate, (meth)acrylic acid 2,3-dihydroxypropyl ester, chloroethyl vinyl ether, and the like. The polymerizable compound having a carboxyl group in the stomach is exemplified by acrylic acid, propylene dimer 'succinic acid-modified dipentaerythritol pentaacrylate, 2, 2 compound, and the like. The base has a polar group (A1 hardened acid ester is (enoic acid (methyl pentane, glycerol 2-hydroxyenoic acid, 2 3-13-201127919 acryloxymethylethyl succinic acid, 1 〇- Methyl propylene decyl decyl methylmalonic acid, 4-methyl acryloxy aminosalicylic acid, 4-methyl propylene methoxyethyl oxy phthalic acid ' 4- methacryl hydrazine Oxyethyloxycarbonyl phthalic anhydride, N-methylpropenyl-hydrazine', N'-dicarboxymethyl-1,4-diaminobenzene, N-2-hydroxy-3-methyl Propylene methoxypropyl-N-phenylglycine, 4-vinylbenzoic acid, 3,4,3',4'-biphenyltetracarboxylic anhydride and 2-hydroxyethyl methacrylate 1: 2 adduct, pyromellitic anhydride and 2-hydroxyethyl methacrylate 1: 2 adduct, etc. The polymerizable compound having a phosphate group is exemplified by, for example, phosphoric acid triacrylate, 2-methylpropene oxime Ethylethylphosphoric acid, 2-methylpropenyloxyethylphenylphosphoric acid, 10-methylpropenyloxydecylmethylphosphoric acid, 4-vinylbenzylphosphoric acid, pentapropyleneoxydipentaerythritol phosphate, etc. Polymeric compound with sulfo group For example, 2-propenylamine-2-methylpropanesulfonic acid or the like. The component (A1), among the components exemplified above, preferably contains pentaerythritol tri(meth)acrylate or (meth)acrylic acid 2- Hydroxyethyl ester, acrylic acid, acrylic acid dimer, succinic acid modified dipentaerythritol pentaacrylate, 2,2,2-tripropylene methoxymethylethyl succinic acid, phosphoric acid triacrylate, 2-propenyl decylamine -2-ethylpropane sulfonic acid, etc. By containing the component (A1), it is possible to easily form a cured film which localizes the component (B) on the surface opposite to the surface in contact with the substrate. (A1) The polymerizable compound having a polar group may be used singly or in combination of two or more kinds thereof, or may be used in combination with a polymerizable compound having no polar group as described above (A2).

S -14- 201127919 (A2 )不具有極性基之 提高硬化性組成物之成膜性 聚合性化合物可列舉爲例如 化合物、多官能基之乙烯基 物、烷氧基甲基胺化合物, 物。多官能基之(甲基)丙 (甲基)丙烯酸酯、季戊四 戊四醇六(甲基)丙烯酸酯 參(2-羥基乙基)異氰尿酸 醇二(甲基)丙烯酸酯、1, 、1,4-丁二醇二(甲基)丙 )丙烯酸酯、二乙二醇二( (甲基)丙烯酸酯、二丙二 2-羥基乙基)異氰尿酸酯二 基乙烯基化合物列舉爲二乙 二乙二醇二乙烯基醚、三乙 之環氧化合物列舉爲1,4-丁 醇二縮水甘油醚、新戊二醇 三縮水甘油醚、聚乙二醇二 醚等。烷氧基甲基胺化合物 胺、六丁氧基甲基化三聚氰 丁氧基甲基化甘脲等。 又,本實施形態之硬化 化合物中之極性基濃度有必 聚合性化合物使用之目的係爲 。至於(A 2 )不具有極性基之 多官能基之(甲基)丙烯酸酯 化合物、多官能基之環氧化合 較好爲(甲基)丙烯酸酯化合 烯酸酯列舉爲三羥甲基丙烷三 醇四(甲基)丙烯酸酯、二季 、甘油三(甲基)丙烯酸酯、 酯三(甲基)丙烯酸酯、乙二 3-丁二醇二(甲基)丙烯酸酯 烯酸酯、1,6 -己二醇二(甲基 甲基)丙烯酸酯、三乙二醇二 醇二(甲基)丙烯酸酯、雙( (甲基)丙烯酸酯等。多官能 烯基苯、乙二醇二乙烯基醚、 二醇二乙烯基醚等。多官能基 二醇二縮水甘油醚、1,6 -己二 二縮水甘油醚、三羥甲基丙烷 縮水甘油醚 '甘油三縮水甘油 列舉爲六甲氧基甲基化三聚氰 胺、四甲氧基甲基化甘脲、四 性組成物中,1 g之全部聚合性 要在羥基濃度、羧基濃度、磷 -15- 201127919 酸酯基濃度及磺基濃度之合計爲0.5mmol/g以上i5mmol/g 以下之範圍內。 本實施形態之硬化性組成物中,1 g之全部聚合性化合 物中之經基濃度較好爲2.0mmol/g以上i5mmol/g以下。又 ,lg之全部聚合性化合物中之羧基濃度、磷酸酯基濃度及 礎基濃度之合計較好爲〇.5mmol/g以上l〇mmol/g以下,更 好爲〇.5mmol/g以上5mmol/g以下。 藉由使lg之全部聚合性化合物中之極性基濃度滿足上 述範圍,將本實施形態之硬化性組成物塗佈於基材上時, 藉由(A1)成分之極性基與基材之相互作用使(A1)成 分朝與基材接觸之面方向移行。認爲藉由其作用,使後述 之(B)成分於與基材接觸之面爲相反側之面局部化。藉 由以該狀態使硬化性組成物硬化,可在與基材接觸之面相 反側之面上形成(B )成分局部化之硬化膜。該種硬化膜 由於(B)成分局部化於硬化膜之表面上,故成爲防反射 功能優異者。lg之全部聚合性化合物中之極性基濃度未滿 足上述範圍時,(B)成分無法局部化於硬化膜之表面上 ,會損及硬化膜之防反射功能。又,羧基濃度、磷酸酯基 濃度及磺基濃度超過上述範圍時,有對(D )溶劑之溶解 性下降,使塗佈性變差之虞。 本實施形態之硬化性組成物中之(A )成分之含量, 以去除溶劑之成分之合計作爲100質量%時,爲6〇〜99.5質 量%之範圍內,較好爲70〜99質量%之範圍內,更好爲 8 0〜9 8質量%之範圍內。藉由以上述範圍調配(A)成分’ -16- 201127919 不僅可獲得具有高硬度之硬化膜,且可使(B)成分 地於與基材接觸之面相反側之面上局部化。 1.2. ( B )粒子 本實施形態之硬化性組成物含有(B )折射率爲 以下之粒子。該粒子藉由於硬化膜之表面局部化而形 折射率層,可賦予硬化膜作爲防反射膜之功能。又, 使該粒子在硬化膜表面上局部化’可提高硬化膜表面 度,亦期待有縮小捲曲之效果。 粒子只要是折射率在1.40以下者即無特別限制, 爲例如中空二氧化矽粒子、氟化金屬粒子等。該等中 好爲以二氧化矽作爲主要成分之中空二氧化矽粒子。 二氧化矽粒子由於其內部具有空洞,故相較於實心粒 更低折射率化。 粒子之折射率爲1_40以下,較好爲1.35以下,更 1.3 0以下。使折射率成爲1.40以下之理由爲即使添加 率超過1.40之粒子,仍無法獲得防反射性優異之硬化 故。又,防反射性能雖以折射率1.〇〇爲下限愈低愈好 使用中空粒子時,由於折射率低使粒子之強度下降, 使硬化膜之硬度或耐刮傷性下降。因此,折射率之下 好成爲1.20。 本說明書中之「折射率」係指於25°C之Na-D線( 5 8 9nm )之折射率。本說明書中之「粒子之折射率」 在同一基質中,使固體成分中之粒子含量成爲1質量% 容易 1.40 成低 藉由 之硬 列舉 ,較 中空 子可 好爲 折射 膜之 ,但 故亦 限較 波長 意指 、10 -17- 201127919 質量%、20質量%之組成物成膜,依循JIS K7105(ISO489 ),在25°C下以Na-D測定折射率,以檢量線法計算之粒子 含量1 00質量%之値。 以透過型電子顯微鏡測定之粒子之數平均粒徑較好爲 1〜100nm,更好爲5〜60nm。粒子之形狀並不限於球狀,亦 可爲不定形之形狀。 中空二氧化矽粒子之市售品列舉爲例如日揮觸媒化成 股份有限公司製造之「JX1 008SIV」(以透過型電子顯微 鏡求得之數平均粒徑50nm,折射率1.29,固體成分20質量 %,異丙醇溶劑)、「JX1 009SIV」(以透過型電子顯微 鏡求得之數平均粒徑50nm,折射率1.29,固體成分20質量 %,甲基異丁基酮溶劑)等。 本實施形態所使用之中空二氧化矽粒子亦可爲以粒子 改質劑改質者。粒子改質劑列舉爲具有聚合性不飽和基及 水解性矽烷基之化合物(以下亦稱爲「聚合性粒子改質劑 」)。聚合性粒子改質劑之聚合性不飽和基列舉爲乙烯基 、(甲基)丙烯醯基。又,水解性矽烷基意指與水反應生 成矽烷醇基(S i - Ο Η )者’例如,矽上鍵結—個以上之甲 氧基、乙氧基、正丙氧基、異丙氧基、正丁氧基等烷氧基 、芳基氧基、乙醯氧基、胺基、鹵素原子者。 本實施形態所使用之聚合性粒子改質劑亦可使用甲基 丙烯醯氧基丙基三甲氧基矽烷等市售品,例如可使用國際 公開公報W097/12942號公報中所述之化合物。 另外,作爲粒子改質劑亦可使用具有含氟之水解性矽 • 18 · 201127919 烷基之化合物(以下亦稱爲「含氟粒子改質劑」)。使用 含氟粒子改質劑時,可使中空二氧化矽粒子效率良好地局 部化。本實施形態所使用之含氟粒子改質劑可使用十三氟 辛基三甲氧基矽烷等市售品。 再者,具有烷基之粒子改質劑或具有矽酮之粒子改質 劑與含氟粒子改質劑同樣亦可使用。 上述各種粒子改質劑可單獨使用一種,亦可組合複數 種使用。 爲了將本實施形態所使用之中空二氧化矽粒子改質, 宜混合中空二氧化矽粒子與粒子改質劑,藉由水解使二者 結合。所得反應性中空二氧化矽粒子中之有機聚合物成分 ,亦即水解性矽烷之水解物與縮合物之比例通常爲使乾燥 粉體在空氣中完全燃燒時之重量減少%之恆量値,例如, 可在空氣中藉由自室溫至通常8 00 °C之熱重量分析求得。 粒子改質劑對反應性中空二氧化矽粒子之結合量,以 改質後之中空二氧化矽粒子作爲1 00質量%,較好爲 0.01~40質量%,更好爲0.1〜30質量%,最好爲1〜20質量% 。與中空二氧化矽粒子反應之粒子改質劑之量在上述範圍 時,可提高組成物中中空二氧化矽粒子之分散性,亦可期 待提高所得硬化物之透明性或耐刮傷性之效果。 本實施形態之硬化性組成物中,(B )成分之含量可 依據形成之硬化膜之膜厚適當調整,但以去除(D)溶劑 之成分之合計作爲1〇〇質量%時,較好爲0.2〜5質量%,更 好爲0.3〜3質量%。例如,硬化膜之膜厚爲ΙΟμηι時,以去 -19- 201127919 除溶劑之成分之合計作爲100質量%時,較好爲〇.4~1.2質 量%,更好爲0.5〜1質量%之範圍內。例如,硬化膜之膜厚 爲7μιη時,較好爲〇.6~1.8質量%,更好爲0.7〜1.5質量%, 硬化膜之膜厚爲3μηι時,較好爲1 ·2~4質量%,更好爲1 .5~3 質量%之範圍內。(Β)成分之含量未達上述範圍時,有 無法形成展現防反射性之(Β)成分以高密度存在之層( 低折射率層)之情況。另一方面,(Β )成分之含量超過 上述範圍時,展現防反射性之(Β)成分以高密度存在之 層(低折射率層)之厚度太大,而有無法展現反射率減低 效果之情況。 1.3. (C)聚合起始劑 本實施形態之硬化性組成物亦可含有(C )聚合起始 劑。該種(C)聚合起始劑在例如含有(甲基)丙烯酸酯 化合物及/或乙烯基化合物作爲(A )成分之情況下,舉例 有藉由熱產生活性自由種之化合物(熱自由基聚合起始劑 )及利用輻射線(光)照射產生活性自由種之化合物(輻 射線(光)自由基聚合起始劑)等泛用品。該等中,以輻 射線(光)自由基聚合起始劑較佳。 輻射線(光)聚合起始劑只要是利用光照射分解產生 自由基而起始聚合者即無特別限制,列舉爲例如苯乙酮、 苯乙酮苄基縮酮、1-羥基環己基苯基酮、2,2 -二甲氧基-1,2-二苯基乙烷-1-酮、咕噸酮、蒹酮、苯甲醛、莽、蒽醌 、三苯基胺、咔唑、3 -甲基苯乙酮、4-氯苯乙酮、4,4’-二 -20- 201127919 甲氧基二苯甲酮、4,4,-二胺基二苯甲酮、苯偶因丙基醚、 苯偶因乙基醚、苯偶因二甲基縮酮、卜異丙基苯基)_ 2-羥基-2-甲基丙-1-酮、2-羥基-2-甲基-1-苯基丙-1-酮、噻 噸酮、二乙基噻噸酮、2 -異丙基噻噸酮、2 -氯噻噸酮、2_ 甲基-1-[4-(甲硫基)苯基]-2-嗎啉基-丙-1-酮、2-苄基- 2-二甲胺基-1- ( 4-嗎啉基苯基)-丁酮-1,4- ( 2-羥基乙氧基 )苯基-(2-羥基-2-丙基)酮、2,4,6-三甲基苯甲醯基二苯 基膦氧化物、雙_(2,6-二甲氧基苯甲醯基)-2,4,4-三甲基 戊基膦氧化物、寡聚(2-羥基-2-甲基-1-(4-(1-甲基乙烯 基)苯基)丙酮)等。 輻射線(光)自由基聚合起始劑之市售品列舉爲例如 曰本汽巴股份有限公司製造之IRGACURE 184、3 69、651 、5 00、819、907、784、2959、CGI 1 700、CGI 1 75 0、 CGI1850、CG24-61、DAROCURE 1116、1173、BASF 公司 製造之 LUCIRIN TPO、8 893UCB公司製造之 UBECRYL P36 、LAMBERTI 公司製造之 EZACURE KIP 1 5 0、K IP 6 5 L T、 KIP100F、KT37、KT55、ΚΤ Ο 4 6、KIP 7 5 / B 等。 熱自由基聚合起始劑只要是藉由加熱分解產生自由基 而起始聚合者即無特別限制,可列舉爲例如過氧化物、偶 氮化合物’具體而言列舉爲苯偶因過氧化物、第三丁基過 氧基苯甲酸酯、偶氮雙異丁腈等。 又’ (C)聚合起始劑含有環氧化合物及/或烷氧基甲 基胺化合物作爲(A)成分時,列舉爲酸性化合物或藉由 輻射線(光)照射產生酸之化合物(輻射線(光)酸產生 -21 - 201127919 劑)等泛用品。 輻射線(光)酸產生劑可使用三芳基鏑鹽類、二芳基 碘鎰鹽類等之化合物。輻射線(光)酸產生劑之市售品列 舉爲San-Apro公司製造之CPI-100P、101A等。 本實施形態之硬化性組成物中,視需要使用之(C ) 聚合起始劑之含量,以去除溶劑之成分之合計作爲100質 量%時,較好爲0.01〜2〇質量%,更好爲0.1~10質量%之範 圍內。未達〇.〇1質量%時,會有作爲硬化物時之硬度不足 之虞’超過20質量%時’會有損及塗膜硬度之虞。 1.4. ( D )溶劑 本實施形態之硬化性組成物爲了調節塗膜之厚度,可 以(D )溶劑稀釋使用。例如,使用本實施形態之硬化性 組成物作爲防反射膜或被覆材時之黏度通常爲 0.1~50,000mPa .秒 /25°C ’ 較好爲 0.5〜l〇,〇〇〇mPa ·秒 /25°C 〇 至於(D )溶劑列舉爲例如甲醇、乙醇、異丙醇、丁 醇、辛醇等醇類:丙酮、甲基乙基酮、甲基異丁基酮、環 己酮等酮類;乙酸乙酯、乙酸丁酯、乳酸乙酯、γ -丁內酯 、丙二醇單甲基醚乙酸酯、丙二醇單乙基醚乙酸酯等酯類 •,乙二醇單甲基醚、二乙二醇單丁基醚等醚類;苯、甲苯 、二甲苯等芳香族烴類;二甲基亞硼、二甲基乙醯胺、Ν_ 甲基吡咯烷酮等醯胺類等。 本實施形態之硬化性組成物中,視需要使用之(D ) -22- 201127919 溶劑之含量,以去除(D )溶劑之成分之合計作爲1 〇〇質量 份時,較好在5 0〜10,000質量份之範圍內。溶劑之含量可 考量塗佈膜厚、硬化性組成物之黏度等適宜決定。 1 . 5 .其他添加劑 本實施形態之硬化性組成物可視需要含有粒子分散劑 、抗氧化劑、紫外線吸收劑、光安定劑、矽烷偶合劑、抗 老化劑、熱聚合抑制劑、著色劑、平流劑、界面活性劑、 保存安定劑、可塑劑、滑劑、無機系塡充材、有機系塡充 材、塡料、潤濕性改良劑、塗面改良劑等。又,使用含氟 之化合物及/或具有矽氧烷鏈之化合物作爲前述例示之粒 子分散劑時,可促進中空二氧化矽粒子之局部化,可降低 塗膜之折射率。 1.6.硬化性組成物之製造方法 本實施形態之硬化性組成物可藉由分別添加(A )聚 合性化合物、(B )粒子、視需要之(c )聚合起始劑、( D )溶劑、其他添加劑,在室溫或加熱條件下混合而調製 。具體而言,可使用混練機、捏合機、球磨機、三軸輕等 混合機調製。但’在加熱條件下混合時,較好在視需要添 加之熱聚合起始劑之分解溫度以下進行。 2.防反射用層合物及其製造方法 2.1·防反射用層合物之製造方法 -23- 201127919 本實施形態之防反射用層合物之製造方法包含(a ) 製備含有具有選自羥基、羧基、磷酸酯基及磺基之一種以 上之極性基之聚合性化合物及折射率爲1.40以下之粒子, 且lg之全部聚合性化合物中之羥基濃度、羧基濃度、磷酸 酯基濃度及磺基濃度之合計滿足〇.5mmol/g以上15mol/g以 下之關係之硬化性組成物之步驟(以下亦稱爲「步驟(a )」)’及(b )將前述硬化性組成物塗佈於基材上之後 ,經硬化之步驟(以下亦稱爲「步驟(b)」)。 依據該防反射用層合物之製造方法,可將滿足前述條 件之硬化性組成物一次塗佈於基材上並經硬化,形成與基 材接觸之面爲相反面側上以高密度存在有折射率爲1.40以 下之粒子之層。據此,可製造兼具耐刮傷性及低折射率性 二者之防反射用層合物。以下說明每步驟。 2 · 1 · 1 ·步驟(a ) 步驟(a )爲製備前述硬化性組成物之步驟。該硬化 性組成物之構成及製造方法等由於如前述,故省略詳細說 明。 2.1.2.步驟(b ) 步驟(b )爲將步驟(a )製備之硬化性組成物塗佈於 基材上之後經硬化之步驟。 將步驟(a )製備之硬化性組成物塗佈於基材上之方 法並無特別限制,可使用例如塗佈棒塗佈、空氣刀塗佈、 -24 - 201127919 凹版塗佈、凹板逆輥塗佈、逆輥塗佈、模唇塗佈、模嘴塗 佈、浸漬塗佈、平版印刷、軟版印刷、網版印刷等習知方 法。 硬化組成物之硬化條件並無特別限制,但可爲將前述 硬化性組成物塗佈於各種基材,例如三乙醯基纖維素樹脂 基材、聚對苯二甲酸乙二酯基材等並使硬化者。具體而言 ,可塗佈前述硬化性組成物,較好在0~2 0 0 °C下使揮發成 分乾燥後’進行輻射線及/或熱硬化處理形成防反射用層 合物。熱硬化時之較佳條件爲在2 0 ~ 1 5 0 °C於1 〇秒〜2 4小時 之範圍進行。以輻射線硬化時,較好使用紫外線或電子束 。紫外線之照光量較好爲0.01〜l〇J/cm2 ,更好爲 0_1〜2J/cm2。又,電子束之照射條件爲加壓電壓1〇〜3〇〇kV ’電子密度0.02〜0.30mA/cm2,電子束照射量1〜i〇Mrad。 2.2.防反射用層合物 本實施形態之防反射用層合物爲以前述防反射用層合 物之製造方法製造者。圖1爲模式性顯示本實施形態之防 反射用層合物之剖面圖。如圖1所示,本實施形態之防反 射用層合物1 0 0爲使前述硬化性組成物於基材丨0上硬化形 成硬化膜20,前述硬化膜20中,於與基材10接觸之面側形 成實質上不存在粒子22之硬質層24,於與基材接觸之面 爲相反之面側形成以高密度存在有粒子2 2之低折射率層2 6 。硬化膜20中,粒子以外之部份(以下亦稱爲「基質」) 係以使即述硬化性組成物之(B )成分以外硬化獲得,j g -25- 201127919 之基質中之羥基濃度、羧基濃度、磷酸酯基濃度及擴基濃 度之合計較好爲0.5mmol/g以上15mmol/g以下。以下針對 本實施形態之防反射用層合物之各層加以說明。 2.2.1· 基材 本實施形態之防反射用層合物所用之基材10之種類並 無特別限制,列舉爲例如三乙醯基纖維素樹脂、聚對苯二 甲酸乙二酯樹脂、聚碳酸酯樹脂、聚酯樹脂、丙烯酸系樹 脂、玻璃等。該等中,以由三乙醯基纖維素樹脂或聚對苯 二甲酸乙二酯樹脂構成之基材較佳。藉由成爲包含該等基 材之防反射用層合物,可容易地使前述硬化性組成物中所 含之(A1)成分拉到基材附近。尤其是基材爲三乙醯基纖 維素樹脂,且含有(甲基)丙烯酸2-羥基乙酯作爲(A1 ) 成分時,該作用效果顯著展現。據此,可在與基材接觸之 面成相反之面側上形成以高密度存在有粒子22之低折射率 層2 6。 又’藉由成爲含有該等基材之防反射用層合物,可在 相機之鏡片部、電視(CRT )之畫面顯示部、或液晶顯示 裝置中之彩色濾光片等廣範圍之硬質塗層及/或防反射膜 之利用領域中獲得優異之耐刮傷性及防反射效果。 2.2.2.硬質塗層 硬質塗層24係於使前述硬化性組成物硬化所得之具有 兩層構造之硬化膜20中,由實質上不存在粒子22之層所構 -26- 201127919 成。 硬質塗層24之厚度並無特別限制’較好爲1〜5 Μ01 ’更 好爲1~10μιη,其原因爲硬質塗層24之厚度未達Ιμηι時’有 無法提高對基材1〇之密著力之情況’另—方面’超過50μιη 時,有難以形成均勻膜之情況。 2.2.3 .低折射率層 低折射率層2 6係如使前述硬化性組成物硬化獲得之具 有兩層構造之硬化膜2〇中’由以高密度存在有粒子22之層 所構成。 低折射率層26之厚度並無特別限制,較好爲50〜200nm ,更好爲60〜150nm,最好爲80~120nm。其理由爲低折射 率層26之厚度未達50nm時,有無法獲得充分防反射效果之 情況,另一方面,超過200nm時,有防反射效果降低之情 況。 本實施形態之防反射用層合物〗〇〇中之硬質塗層2 4與 低折射率層26之折射率差較好成爲0.05以上之値。其理由 爲硬質塗層24與低折射率層26之折射率差未達〇.〇5之値時 ,無法獲得該等防反射膜之相乘效果,且有防反射效果降 低之情況。 3.實施例 以下利用實施例更詳細說明本發明,但本發明並不受 該等實施例之任何限制 -27- 201127919 3.1 .實施例1 3.1.1. 硬化性組成物之製造 於遮蔽紫外線之容器中,適量添加中空二氧化矽粒子 (商品名「JX-1009SIV」,20質量%甲基異丁基酮溶膠’ 曰揮觸媒化成股份有限公司製造)5質量份(以固體成分 計爲1質量份)、甘油環氧丙烯酸酯(商品名「DENACOL DA314」,Nagasechemtex股份有限公司製造)96質量份、 2-甲基- l[4-(甲硫基)苯基]-2-嗎啉基丙-1-酮(商品名「 IRGACURE (註冊商標)907」,日本汽巴股份有限公司 製造)3質量份、SILA PLANE FM0725 ( CHISSO股份有限 公司製造)0.1質量份、以及甲基異丁基酮(表中,使用 「MIBK」之簡寫),在室溫攪拌2小時,藉此獲得均勻溶 液。稱量2g之該溶液於鋁製皿中之後,在175t之加熱板 上乾燥30分鐘,稱量求得固體成分含量爲50質量% » 3.1.2. 硬化模樣品之製備 使用棒塗佈器將前述^ 3 . 1 . 1 .硬化性組成物之製備」 中獲得之溶液以整體之硬化膜厚成爲約7μιη之方式塗佈於 三乙醯基纖維素(TAC )膜(商品名「TDY-80UL」,富 士薄膜股份有限公司製造)上,在80°C乾燥2分鐘後,於 氮氣流下使用高壓水銀燈(300mJ/Crn2 )使之硬化。又, 塗佈係在捲成輥狀之薄膜內側之面上形成塗膜之方式進行 -28- 201127919 3.2 .實施例2 ~ 2 3、比較例1〜4 除了以表2至表4之組成調配表2〜表4所示之成分以外 ,餘與實施例1同樣製造硬化性組成物,獲得硬化膜樣品 。又,聚合性化合物之種類、商品名、極性基之種類、極 性基之濃度彙整列於表1。 表1] 聚合性化合物種類 商品名 極性基 極性基濃度 (mmol/g) 甘油環氧丙烯酸酯 DENACOL DA314 羥基 6.0 六氫苯二甲酸環氧丙烯酸酯 DENACOL DA722 羥基 4.7 季戊四醇三丙烯酸酯 KYALITE PET-30 羥基 1.9 丙烯酸羥乙酯 LIGHT ESTER HOA 羥基 8.6 甲基丙烯酸羥乙酯 LIGHT ESTER HO-MS 羥基 7.7 琥珀酸改質之二季戊四醇五丙烯酸酯 ARONIX M-520 羧基 1.7 2,2,2-三丙烯醯氧基甲基乙基號拍酸 NK ESTER CBX-0 羧基 2.6 磷酸三丙稀酸酯 BISCOTE 3PA 磷酸酯基 3.3 2-丙烯醯胺-2-甲基丙烷磺酸 ATBS 磺基 4.8 丙烯酸二聚物 ARONIX M-5600 羧基 4.6 丙烯酸 羧基 13.9 二甲胺基丙烯酸酯 DMA 胺基 7.0 三羥甲基丙烷三丙烯酸酯 ARONIX M-309 Μ •Μ、、 0 又,實施例13及實施例23中使用之粒子「B-1」係如 下列合成。使中空二氧化矽粒子(商品名「J X -1 〇 〇 9 S IV」 ,甲基異丁基酮溶膠,日揮觸媒化成股份有限公司製造) 9 0.9質量份(固體成分濃度:20質量份)、十三氟辛基三 甲氧基矽烷(GE東芝矽酮股份有限公司製造)1質量份、 異丙醇0.1質量份及離子交換水0.05質量份之混合液於80t -29 - 201127919 攪拌3小時後,添加原甲酸甲酯〇 . 7質量份’接著以相同溫 度加熱攪拌1小時’獲得無色透明之粒子分散液Β_1。坪量 2g之Β-1於鋁製皿中之後’於l2〇°C之加熱板上乾燥1小時 ,秤量求得固成分含量爲22.5質量% » 3.3 .評價試驗 針對下述項目評價實施例及比較例中獲得之硬化性組 成物及硬化膜之特性。其結果合倂列於表2至表4。 3.3 . 1 .反射率 以黑色噴霧塗裝所得硬化膜之背面,利用分光反射率 測定裝置(裝設大型試料式積分球附屬裝置1 5 0-09090之 自記分光光度計U-3410,日立製作所股份有限公司製造) ,自基材側測定波長3 40~700nm之範圍之反射率並經評價 。具體而言,以鋁之蒸鍍膜之反射率作爲基準(1 〇〇% ) ’ 測定各波長之防反射用層合物(防反射膜)之反射率’該 等波長5 50nm之光之反射率合倂示於表2至表4。若反射率 未達3.0%則可判斷具有低反射性。 3.3.2.耐刮傷性(鋼毛耐性試驗) 將鋼毛(BONSTAR No. 0000,日本 STEEL WOOL 股 份有限公司製造)安裝於學振型摩擦堅牢度試驗機(AB-301,Tester產業股份有限公司製造),以於所得硬化膜表 面荷重200g之條件重複擦過10次,以下列基準目視確認該 -30- 201127919 硬化膜表面有無產生刮傷。評價基準如下。 AA :硬化膜未出現刮傷。 A :幾乎無法確認硬化膜之剝離或刮傷,或者確認硬 化膜上有少許刮傷。 B :確認硬化膜之整面上有條狀刮傷。 C :硬化膜產生剝離。 3 . 3 · 3 .鉛筆硬度 將所得硬化膜固定於玻璃基板上,依據「〗131^5600-5-4」(ISO/DIS 15184)加以評價。 -31 - 201127919 表 實施例13 S CO - CO d I 100.1 I MIBK S S 卜· < :實施例12| S to 〇 d I 100.1 I 1甲醇I 3 S e>j eg < δ 丨實施例”| S (D n o I 100.1 I MIBK S CM < 5 丨實施例Η S (D CO d I 100.1 I MIBK | p s m eg < 5 >施例9丨 (Ο CM ο o 丨〗〇〇 I MIBK g < 5 1實施例β| <〇 CM ο Ci I loo I MIBK n C4 s < 5 丨實施例7丨 ο - rt d I 100.1 | MIBK 2 s CO < X 丨實施例6丨 〇 <〇 eg - C5 I loo I MIBK ci s < δ |實施例5| 〇 <〇 ca - e〇 5 I ioo.t | MIBK S g r* < δ 丨實施例4 〇 «〇 - w I ίσο I MIBK S s < S 丨實施例3 S (0 r> 〇 I 100.1 1 MIBK s s CO < 5 丨實施例2 <〇 〇) n 5 I 1Q0.1 I MIBK s C^4 〇J < X 實施例1 <〇 σ> r? 〇 I 100.1 1 MIBK S s Csl < 5 [甘油環氧丙烯酸酯 | m 越 a? r 槭 雔 S- II 浒 I季戊四醇三丙烯酸酯 I [丙烯酸經乙酯 I I甲基丙烯酸羥乙酯 I 12,2,2-三丙烯蘧氧基甲基乙基號珀酸| |磷酸三丙烯酸酯 | 趙 m SS K m H- C^l ύ & at κ 丨三羥甲基丙烷三丙烯酸酯 I I中空二氣化砍粒子 I τ· I a I IGACURE907 | I SALIPLANE FM0725 | $ m 琪 tt^o <〇 (D)溶劑 |聚合性化合物中極性基澳度 (Πΐτηοΐ/g) 固體成分濃度(%) 反射率(%> 耐鋼毛性 鈴笨硬度 I I (Α1)成分 I (A2)成分I (B)粒子 ] I <C)聚合起始劑 I I其他添加劑 I 1 評價項目 (A)Sii -32- 201127919 3 表 實施例23 CO CO g - Γ9 Ο 100.1 ΜΙΘΚ <〇 o S η csi < 5 實施例22 〇 <〇 CO - η Ο 100 MIBK 对· s eg < 5 實施例21 CO § - co 5 100.1 MIBK CO d s csi < 5 實施例20| 〇 (Ο CO - CO 5 100.1 I甲醇i tn 〇 s ir> csi < 5 實施例19 CO s CO Ο 100.1 MIBK <〇 d s \n c*i < 5 實施例18 CO eM o - CO Ο 100.1 MIBK σι s < δ 實施例Π <〇 σ> - r> ο ο MIBK n ci s CO esj < 5 實施例16 (Ο CO g - co 5 100.1 MIBK CD s S < δ 實施例15 <〇 〇> - CO Ο 100.1 MIBK <〇 oi s CM CNI < 5 實施例Μ <〇 〇> - n ο I 100.1 MIBK r-· g eo csi < 5 琥珀酸改質二季戊四醇五丙烯酸酯 2,2,2-三丙烯醯氧基甲基乙基琥珀酸 碟酸三丙烯酸酯 2-丙烯醯胺-2-甲基丙烷磺酸 丙烯酸二聚物 丙烯酸 三羥甲基丙烷三丙烯酸酯 中空二氧化较粒子 1 ω IGACURE 907 SALIPLANE FM0725 合計(質量份) (D)溶劑 聚合性化合物lg中極性基濃度 (rmnol/g) 固體成分濃度(%) 反射率(%) 耐鋼毛性 鉛筆硬度 (A1)成分 1 (A2)成分I (B)粒子 (C)聚合起始劑 其他添加劑 評價項目 (A)聚合性化合物 -33- 201127919 [表4] 比較例4 I g CO CO 〇 100.1 M1BK _____ _ 〇 S \n — < 5 比較例3 CO CO d 100.1 MIBK CO d S in 一 < 5 比較例2 〇 涅 CO V·· 〇 100.1 MIBK «〇 S m 七 < 5 比較例1 CO S 〇 100.1 MIBK ο g ir> < 5 2,2,2-三丙嫌面氧基甲基乙基號拍酸 磷酸三丙讎酯 號拍酸改質二季戊四醇五丙烯酸酯 三羥甲基丙烷三丙烯酸酯 | 二甲胺基丙烯酸酯 中空二氧化砂粒子 IGACURH 907 SALIPLANE FM0725 合計(質量份) (D)溶劑 聚合性化合物lg中極性基澳度(mmol/g) 固體成分濃度(%) 反射率(%) 耐鋼毛性 鄉硬度 (A1)成分 (A2)成分 (B)粒子 (C)聚合起始劑 其他添加劑 評價項目 (A)聚合性化飾 -34- 201127919 3.4.評價結果 由表2及表3之結果可知,使全部聚合性化合物中之極 性基濃度滿足前述條件之實施例1〜23之硬化性組成物硬化 而成之硬化膜,確認具有反射率成爲未達3 %之防反射性。 又由耐鋼毛性之結果可知耐刮傷性亦優異。 相對於此,由表4之結果可知,使全部聚合性化合物 中之極性基濃度未滿足前述條件之比較例1〜4之硬化性組 成物硬化而成之硬化膜中,耐刮傷性雖優異,但反射率超 過3 %而爲反射率差者。 以透過型電子顯微鏡觀察實施例1〜2 3及比較例1〜4之 層合物之剖面後,實施例1〜2 3之層合物確認粒子局部存在 於硬化膜表面,但比較例1〜4中無法確認粒子局部存在。 本發明並不受限於上述之實施形態者,各種變形均爲 可能。例如,本發明包含與實施形態中說明之構成實質上 相同之構成(例如,功能、方法及結果爲相同之構成,或 者目的及效果相同之構成)。又,本發明包含替代實施形 態中說明之構成之非本質部份而成之構成。又,本發明包 含達到與實施形態中說明之構成相同作用之構成或可達成 相同目的之構成。又,本發明包含於實施形態中說明之構 成附加習知技術而成之構成。 【圖式簡單說明】 圖1爲模式性顯示本實施形態之防反射用層合物之剖 面圖。 -35- 201127919 【主要元件符號說明】 1 0 :基材 20 :硬化膜 24 :硬質塗層 26 :低折射率層 1〇〇:防反射用層合物S -14-201127919 (A2) Film-forming property of the curable composition which does not have a polar group The polymerizable compound may, for example, be a compound, a polyfunctional vinyl group or an alkoxymethylamine compound. Polyfunctional (meth) propyl (meth) acrylate, pentaerythritol hexa (meth) acrylate gin (2-hydroxyethyl) isocyanurate di(meth) acrylate, 1 , 1,4-butanediol di(meth)prop) acrylate, diethylene glycol bis((meth)acrylate, dipropylenedi-2-hydroxyethyl)isocyanurate divinyl The compound is exemplified by diethylene glycol ethylene divinyl ether or an epoxy compound of triethyl 1,4-butanol diglycidyl ether, neopentyl glycol triglycidyl ether, polyethylene glycol diether, and the like. Alkoxymethylamine compound Amine, hexabutoxymethylated melamine butoxymethylated glycoluril, and the like. Further, the polar group concentration in the hardening compound of the present embodiment is intended to be used as a polymerizable compound. As the (A 2 ) (meth) acrylate compound having a polyfunctional group having no polar group, the epoxidation of the polyfunctional group is preferably a (meth) acrylate compound enoate, which is exemplified by trimethylolpropane III. Alcohol tetra(meth)acrylate, diquaternary, tris(meth)acrylate, ester tri(meth)acrylate, ethylene-3-butanediol di(meth)acrylate enoate, 1,6 - hexanediol di(methylmethyl) acrylate, triethylene glycol diol di(meth) acrylate, bis((meth) acrylate, etc. polyfunctional alkenylbenzene, ethylene glycol divinyl Ether, diol divinyl ether, etc. Polyfunctional diol diglycidyl ether, hexamethylene diglycidyl ether, trimethylolpropane glycidyl ether glycerol triglycidyl exemplified as hexamethoxy In the melamine, tetramethoxymethylated glycoluril, and tetrameric compositions, the total polymerizability of 1 g is determined by the combination of hydroxyl concentration, carboxyl concentration, phosphorus-15-201127919 acid ester group concentration and sulfo group concentration. 0.5 mmol/g or more and i5 mmol/g or less. The curability of the present embodiment In the composition, the base concentration in all the polymerizable compounds of 1 g is preferably 2.0 mmol/g or more and i5 mmol/g or less. Further, the carboxyl group concentration, the phosphate group concentration, and the base concentration in all the polymerizable compounds of lg The total amount is preferably 55 mmol/g or more and 10 〇mmol/g or less, more preferably 55 mmol/g or more and 5 mmol/g or less. By making the polar group concentration in all the polymerizable compounds of lg satisfy the above range, When the curable composition of the present embodiment is applied onto a substrate, the component (A1) is moved toward the surface in contact with the substrate by the interaction between the polar group of the component (A1) and the substrate. By this action, the component (B) described later is localized on the surface opposite to the surface in contact with the substrate. By curing the curable composition in this state, it is possible to face the surface opposite to the substrate. A cured film in which the component (B) is locally formed is formed. Since the (B) component is localized on the surface of the cured film, the cured film has excellent antireflection function. The polar group concentration in all the polymerizable compounds of lg is not When the above range is satisfied, the component (B) cannot be localized On the surface of the cured film, the antireflection function of the cured film is impaired. When the carboxyl group concentration, the phosphate group concentration, and the sulfonic acid concentration exceed the above range, the solubility in the solvent (D) is lowered, and the coating property is changed. When the content of the component (A) in the curable composition of the present embodiment is 100% by mass in total of the components of the solvent to be removed, it is preferably in the range of 6 Å to 99.5% by mass, preferably 70%. In the range of 99% by mass, more preferably in the range of 80 to 98% by mass, by disposing the component (A) in the above range '-16-201127919, not only a cured film having high hardness but also a B) The component is localized on the opposite side of the surface in contact with the substrate. 1.2. (B) Particles The curable composition of the present embodiment contains (B) particles having a refractive index of at least. The particles are shaped by the localization of the surface of the cured film to impart a function as an antireflection film. Further, localizing the particles on the surface of the cured film can increase the surface of the cured film, and an effect of reducing the curl is also expected. The particles are not particularly limited as long as they have a refractive index of 1.40 or less, and are, for example, hollow cerium oxide particles or fluorinated metal particles. Among these, hollow cerium oxide particles containing cerium oxide as a main component are preferred. Since the cerium oxide particles have voids inside, the refractive index is lower than that of the solid particles. The refractive index of the particles is 1 to 40 or less, preferably 1.35 or less, and more preferably 1.3 or less. The reason why the refractive index is 1.40 or less is that even if the addition ratio exceeds 1.40, the curing which is excellent in antireflection property cannot be obtained. Further, the antireflection performance is preferably as low as the lower limit of the refractive index of 1. 使用 When the hollow particles are used, the strength of the particles is lowered due to the low refractive index, and the hardness or scratch resistance of the cured film is lowered. Therefore, the refractive index is preferably 1.20. The "refractive index" in the present specification means the refractive index of the Na-D line (589 μm) at 25 °C. In the present specification, the "refractive index of particles" in the same matrix makes the content of the particles in the solid component 1% by mass. It is easy to 1.40 which is hard to enumerate, and the hollower may be a refractive film, but it is also limited. More wavelength means that 10 -17- 201127919 mass%, 20 mass% of the composition is formed into a film, according to JIS K7105 (ISO489), the refractive index is measured by Na-D at 25 ° C, and the particles are calculated by the calibration method. The content is 100% by mass. The number average particle diameter of the particles measured by a transmission electron microscope is preferably from 1 to 100 nm, more preferably from 5 to 60 nm. The shape of the particles is not limited to a spherical shape, and may be an amorphous shape. The commercially available product of the hollow cerium oxide particles is, for example, "JX1 008SIV" manufactured by Nippon Kasei Chemicals Co., Ltd. (the number average particle diameter obtained by a transmission electron microscope is 50 nm, the refractive index is 1.29, and the solid content is 20% by mass. Isopropyl alcohol solvent), "JX1 009SIV" (number average particle diameter 50 nm obtained by a transmission electron microscope, refractive index 1.29, solid content 20 mass%, methyl isobutyl ketone solvent). The hollow cerium oxide particles used in the embodiment may be modified by a particle modifier. The particle modifier is exemplified by a compound having a polymerizable unsaturated group and a hydrolyzable decyl group (hereinafter also referred to as "polymerizable particle modifier"). The polymerizable unsaturated group of the polymerizable particle modifier is exemplified by a vinyl group or a (meth) acrylonitrile group. Further, the hydrolyzable decyl group means a group which reacts with water to form a stanol group (S i - Ο Η ), for example, a fluorene-bonded one or more methoxy groups, ethoxy groups, n-propoxy groups, and isopropyloxy groups. An alkoxy group such as a group or a n-butoxy group, an aryloxy group, an ethoxy group, an amine group or a halogen atom. A commercially available product such as methacryloxypropyltrimethoxydecane may be used as the polymerizable particle modifier used in the embodiment, and for example, a compound described in International Publication WO097/12942 may be used. Further, as the particle modifier, a compound having a fluorine-containing hydrolyzable 矽 18 · 201127919 alkyl group (hereinafter also referred to as "fluorine-containing particle modifier") may be used. When a fluorine-containing particle modifier is used, the hollow ceria particles can be efficiently obtained. A commercially available product such as tridecafluorooctyltrimethoxydecane can be used as the fluorine-containing particle modifier used in the embodiment. Further, a particle modifier having an alkyl group or a particle modifier having an anthrone may be used in the same manner as the fluorine-containing particle modifier. The above various particle modifiers may be used singly or in combination of plural kinds. In order to modify the hollow cerium oxide particles used in the present embodiment, it is preferred to mix the hollow cerium oxide particles and the particle modifier to bond the two by hydrolysis. The ratio of the organic polymer component in the obtained reactive hollow ceria particles, that is, the hydrolyzate of the hydrolyzable decane to the condensate is usually a constant amount of % by weight of the dry powder when it is completely burned in the air, for example, It can be obtained in the air by thermogravimetric analysis from room temperature to usually 800 °C. The amount of the modifier of the particle modifier to the reactive hollow ceria particles is 10,000% by mass, preferably 0.01 to 40% by mass, more preferably 0.1 to 30% by mass, based on the modified hollow cerium oxide particles. It is preferably 1 to 20% by mass. When the amount of the particle modifier which reacts with the hollow ceria particles is in the above range, the dispersibility of the hollow ceria particles in the composition can be improved, and the effect of improving the transparency or scratch resistance of the obtained cured product can also be expected. . In the curable composition of the present embodiment, the content of the component (B) can be appropriately adjusted depending on the film thickness of the cured film to be formed. However, when the total amount of the component of the solvent (D) is removed, it is preferably 1% by mass. 0.2 to 5 mass%, more preferably 0.3 to 3 mass%. For example, when the film thickness of the cured film is ΙΟμηι, when the total amount of the components of the solvent to be removed is -19-201127919, it is preferably from 0.4 to 1.2% by mass, more preferably from 0.5 to 1% by mass. Inside. For example, when the film thickness of the cured film is 7 μm, it is preferably from 0.6 to 1.8% by mass, more preferably from 0.7 to 1.5% by mass, and when the film thickness of the cured film is from 3 μm, preferably from 1. 2 to 4% by mass. More preferably in the range of 1.5 to 3 mass%. When the content of the (Β) component is less than the above range, there is a case where a layer (low refractive index layer) having a high density (展现) component exhibiting antireflection properties cannot be formed. On the other hand, when the content of the (Β) component exceeds the above range, the thickness of the layer (low refractive index layer) in which the antireflective component exhibits high density is too large, and the effect of reducing the reflectance cannot be exhibited. Happening. 1.3. (C) Polymerization initiator The curable composition of the present embodiment may further contain (C) a polymerization initiator. In the case where the (C) polymerization initiator contains, for example, a (meth) acrylate compound and/or a vinyl compound as the component (A), a compound which generates an active free species by heat (thermal radical polymerization) is exemplified. A starter) and a general product such as a compound (radiation (photo) radical polymerization initiator) which produces a free radical by irradiation with radiation (light). Among these, a radiation (photo) radical polymerization initiator is preferred. The radiation (light) polymerization initiator is not particularly limited as long as it is a radical generated by decomposition by light irradiation, and is exemplified by, for example, acetophenone, acetophenone ketal, and 1-hydroxycyclohexylphenyl. Ketone, 2,2-dimethoxy-1,2-diphenylethane-1-one, xanthone, anthrone, benzaldehyde, hydrazine, hydrazine, triphenylamine, carbazole, 3- Methylacetophenone, 4-chloroacetophenone, 4,4'-di-20- 201127919 methoxybenzophenone, 4,4,-diaminobenzophenone, benzoin propyl ether , Benzene ethyl ether, benzoin dimethyl ketal, isopropylphenyl) 2-hydroxy-2-methylpropan-1-one, 2-hydroxy-2-methyl-1- Phenylpropan-1-one, thioxanthone, diethylthioxanthone, 2-isopropylthioxanthone, 2-chlorothioxanthone, 2-methyl-1-[4-(methylthio)benzene 2-ylmorpholinyl-propan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)-butanone-1,4-(2-hydroxyl Ethoxy)phenyl-(2-hydroxy-2-propyl)one, 2,4,6-trimethylbenzimidyldiphenylphosphine oxide, bis-(2,6-dimethoxy Benzamethylene)-2,4,4-trimethylpentylphosphine oxide, oligomeric (2-hydroxy-2-methyl) Base-1-(4-(1-methylvinyl)phenyl)propanone) and the like. Commercial products of radiation (photo) radical polymerization initiators are listed, for example, as IRGACURE 184, 3 69, 651, 5 00, 819, 907, 784, 2959, CGI 1 700 manufactured by Sakamoto Ciba Co., Ltd. CGI 1 75 0, CGI1850, CG24-61, DAROCURE 1116, 1173, LUCIRIN TPO manufactured by BASF, UBECRYL P36 manufactured by 8 893UCB, EZACURE KIP 1 50 from LAMBERTI, K IP 6 5 LT, KIP100F, KT37 , KT55, ΚΤ Ο 4 6, KIP 7 5 / B, etc. The thermal radical polymerization initiator is not particularly limited as long as it is a radical generated by decomposition by heating, and examples thereof include a peroxide and an azo compound, and specific examples thereof include benzoin peroxide. Tert-butylperoxybenzoate, azobisisobutyronitrile, and the like. Further, when the (C) polymerization initiator contains an epoxy compound and/or an alkoxymethylamine compound as the component (A), it is exemplified by an acidic compound or a compound which generates an acid by irradiation with radiation (light) (radiation line) (Photo) Acid production - 21 - 201127919 agent) and other pan-products. As the radiation (photo) acid generator, a compound such as a triarylsulfonium salt or a diaryliodonium salt can be used. Commercial products of a radiation (photo) acid generator are listed as CPI-100P, 101A, and the like manufactured by San-Apro Corporation. In the curable composition of the present embodiment, the content of the (C) polymerization initiator to be used, if the total amount of the components for removing the solvent is 100% by mass, preferably 0.01 to 2% by mass, more preferably Within the range of 0.1 to 10% by mass. When it is less than 质量1% by mass, the hardness when the cured product is insufficient, when it exceeds 20% by mass, the hardness of the coating film may be impaired. 1.4. (D) Solvent The curable composition of the present embodiment can be used by diluting the solvent (D) in order to adjust the thickness of the coating film. For example, when the curable composition of the present embodiment is used as an antireflection film or a covering material, the viscosity is usually 0.1 to 50,000 mPa. sec / 25 ° C ' is preferably 0.5 to 1 〇, 〇〇〇 mPa · sec / 25 The solvent of (D) is, for example, an alcohol such as methanol, ethanol, isopropanol, butanol or octanol: a ketone such as acetone, methyl ethyl ketone, methyl isobutyl ketone or cyclohexanone; Ethyl acetate, butyl acetate, ethyl lactate, γ-butyrolactone, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, etc., ethylene glycol monomethyl ether, diethyl An ether such as diol monobutyl ether; an aromatic hydrocarbon such as benzene, toluene or xylene; or a guanamine such as dimethyl boron, dimethylacetamide or hydrazine-methylpyrrolidone. In the curable composition of the present embodiment, if necessary, the content of the solvent (D) -22-201127919 is used to remove the total of the components of the (D) solvent as 1 part by mass, preferably 5 to 10,000. Within the range of parts by mass. The content of the solvent can be appropriately determined in consideration of the thickness of the coating film and the viscosity of the curable composition. 1.5. Other Additives The curable composition of the present embodiment may optionally contain a particle dispersant, an antioxidant, an ultraviolet absorber, a photo-stabilizer, a decane coupling agent, an anti-aging agent, a thermal polymerization inhibitor, a colorant, and a leveling agent. , surfactant, storage stabilizer, plasticizer, slip agent, inorganic enamel, organic enamel, mash, wettability improver, coating improver, etc. Further, when a fluorine-containing compound and/or a compound having a decane chain is used as the above-exemplified particle dispersant, localization of the hollow cerium oxide particles can be promoted, and the refractive index of the coating film can be lowered. 1.6. Method for Producing Curable Composition The curable composition of the present embodiment can be obtained by separately adding (A) a polymerizable compound, (B) particles, optionally (c) a polymerization initiator, (D) a solvent, Other additives are prepared by mixing at room temperature or under heating. Specifically, it can be prepared by using a mixer such as a kneader, a kneader, a ball mill, or a three-axis light. However, when it is mixed under heating, it is preferably carried out below the decomposition temperature of the thermal polymerization initiator which is added as needed. 2. Antireflection laminate and method for producing the same 2.1. Method for producing an antireflection laminate -23 - 201127919 The method for producing an antireflection laminate of the present embodiment comprises (a) preparing a composition having a hydroxyl group selected from a polymerizable compound having one or more polar groups of a carboxyl group, a phosphate group, and a sulfo group, and a particle having a refractive index of 1.40 or less, and a hydroxyl group concentration, a carboxyl group concentration, a phosphate group concentration, and a sulfo group in all of the polymerizable compounds of lg The step of satisfying the curable composition in a relationship of 〇.5 mmol/g or more and 15 mol/g or less (hereinafter also referred to as "step (a)") and (b) applying the curable composition to the base After the material is applied, the step of hardening (hereinafter also referred to as "step (b)"). According to the method for producing the antireflection laminate, the curable composition satisfying the above conditions can be applied to the substrate once and hardened, and the surface which is in contact with the substrate is formed on the opposite side to have a high density. A layer of particles having a refractive index of 1.40 or less. According to this, it is possible to produce an antireflection laminate which has both scratch resistance and low refractive index. Each step is explained below. 2 · 1 · 1 · Step (a) Step (a) is a step of preparing the aforementioned curable composition. Since the constitution, manufacturing method, and the like of the curable composition are as described above, detailed descriptions thereof will be omitted. 2.1.2. Step (b) Step (b) is a step of hardening the hardenable composition prepared in the step (a) after it is applied to a substrate. The method of applying the curable composition prepared in the step (a) to the substrate is not particularly limited, and for example, coating bar coating, air knife coating, -24 - 201127919 gravure coating, concave plate reverse roller can be used. Conventional methods such as coating, reverse roll coating, lip coating, die coating, dip coating, lithography, flexographic printing, screen printing, and the like. The curing condition of the hardening composition is not particularly limited, but the curable composition may be applied to various substrates such as a triethylenesulfonyl cellulose resin substrate or a polyethylene terephthalate substrate. Make the hardener. Specifically, the curable composition may be applied, and it is preferred to dry the volatile component at 0 to 200 ° C and then perform radiation treatment and/or heat hardening to form an antireflection layer. The preferable conditions for the heat hardening are carried out at a temperature of from 20 ° to 150 ° C in the range of from 1 sec to 24 hours. When hardening with radiation, it is preferred to use ultraviolet rays or electron beams. The amount of ultraviolet light is preferably 0.01 to 1 〇 J/cm 2 , more preferably 0 1 to 2 J/cm 2 . Further, the irradiation conditions of the electron beam are a pressurization voltage of 1 〇 to 3 〇〇 kV ' electron density of 0.02 to 0.30 mA/cm 2 and an electron beam irradiation amount of 1 to i 〇 Mrad. 2.2. Antireflection laminate The antireflection laminate of the present embodiment is produced by the method for producing an antireflection laminate. Fig. 1 is a cross-sectional view schematically showing a laminate for antireflection of the present embodiment. As shown in FIG. 1, the antireflection laminate 100 of the present embodiment is formed by curing the curable composition on the substrate 形成0 to form a cured film 20, and the cured film 20 is in contact with the substrate 10. The hard layer 24 in which the particles 22 are substantially absent is formed on the surface side, and the low refractive index layer 2 6 in which the particles 2 2 are present at a high density is formed on the surface opposite to the surface in contact with the substrate. In the cured film 20, a portion other than the particles (hereinafter also referred to as "matrix") is obtained by hardening the component other than the component (B) of the curable composition, and the hydroxyl group concentration and carboxyl group in the matrix of jg - 25 - 201127919 The total concentration, the phosphate group concentration, and the base concentration are preferably 0.5 mmol/g or more and 15 mmol/g or less. Hereinafter, each layer of the antireflection laminate of the present embodiment will be described. 2.2.1. Base material The type of the substrate 10 used for the antireflection laminate of the present embodiment is not particularly limited, and examples thereof include triethyl fluorenyl cellulose resin, polyethylene terephthalate resin, and poly A carbonate resin, a polyester resin, an acrylic resin, glass, or the like. Among these, a substrate composed of a triethyl fluorenyl cellulose resin or a polyethylene terephthalate resin is preferred. By forming the antireflection laminate containing the substrates, the component (A1) contained in the curable composition can be easily pulled to the vicinity of the substrate. In particular, when the substrate is a triethylenesulfonyl cellulose resin and 2-hydroxyethyl (meth)acrylate is contained as the component (A1), the effect is remarkably exhibited. According to this, the low refractive index layer 26 in which the particles 22 are present at a high density can be formed on the opposite side to the surface in contact with the substrate. In addition, by making the antireflection laminate containing the substrates, it is possible to apply a wide range of hard coatings such as a lens portion of a camera, a screen display portion of a television (CRT), or a color filter in a liquid crystal display device. Excellent scratch resistance and anti-reflection effects are obtained in the field of use of layers and/or anti-reflection films. 2.2.2. Hard coat layer The hard coat layer 24 is formed in a cured film 20 having a two-layer structure obtained by hardening the above-mentioned curable composition, and is formed of a layer substantially free of particles 22 -26-201127919. The thickness of the hard coat layer 24 is not particularly limited 'better than 1 to 5 Μ01' and more preferably 1 to 10 μm, because the thickness of the hard coat layer 24 is less than Ιμηι, and there is no possibility of increasing the density of the substrate. In the case where the 'other aspect' exceeds 50 μm, it is difficult to form a uniform film. 2.2.3. Low-refractive-index layer The low-refractive-index layer 26 is composed of a layer having a two-layer structure in which a cured film having a two-layer structure obtained by curing the curable composition is formed of a layer having particles 22 at a high density. The thickness of the low refractive index layer 26 is not particularly limited, but is preferably 50 to 200 nm, more preferably 60 to 150 nm, and most preferably 80 to 120 nm. The reason for this is that when the thickness of the low refractive index layer 26 is less than 50 nm, sufficient antireflection effect cannot be obtained. On the other hand, when the thickness exceeds 200 nm, the antireflection effect is lowered. The difference in refractive index between the hard coat layer 24 and the low refractive index layer 26 in the antireflection laminate of the present embodiment is preferably 0.05 or more. The reason for this is that when the refractive index difference between the hard coat layer 24 and the low refractive index layer 26 is less than 〇5〇, the synergistic effect of the antireflection films cannot be obtained, and the antireflection effect is lowered. 3. EXAMPLES Hereinafter, the present invention will be described in more detail by way of examples, but the present invention is not limited by the examples. -27-201127919 3.1. Example 1 3.1.1. The curable composition is manufactured to shield ultraviolet rays. In the container, an appropriate amount of hollow cerium oxide particles (trade name "JX-1009SIV", 20% by mass of methyl isobutyl ketone sol'), manufactured by Co., Ltd., was added in an amount of 5 parts by mass (based on solid content) (parts by mass), glycerol epoxy acrylate (trade name "DENACOL DA314", manufactured by Nagasechemtex Co., Ltd.) 96 parts by mass, 2-methyl-l[4-(methylthio)phenyl]-2-morpholinyl Propane-1-one (trade name "IRGACURE (registered trademark) 907", manufactured by Nippon Ciba Co., Ltd.) 3 parts by mass, SILA PLANE FM0725 (manufactured by CHISSO Co., Ltd.) 0.1 parts by mass, and methyl isobutyl ketone (In the table, abbreviation of "MIBK" was used), and the mixture was stirred at room temperature for 2 hours, thereby obtaining a homogeneous solution. After weighing 2 g of the solution in an aluminum dish, it was dried on a 175 t hot plate for 30 minutes, and the solid content was determined to be 50% by mass. 3. 3.1.2. Preparation of the hardened mold sample using a bar coater The solution obtained in the above "3.1.1. Preparation of the curable composition" was applied to a triacetyl cellulose (TAC) film (trade name "TDY-80UL" in such a manner that the overall cured film thickness was about 7 μm. On the other hand, it was dried at 80 ° C for 2 minutes, and then hardened with a high-pressure mercury lamp (300 mJ/Crn2) under a nitrogen stream. Further, the coating was carried out by forming a coating film on the inner surface of the film wound into a roll-shaped film. -28-201127919 3.2. Examples 2 to 2 3, Comparative Examples 1 to 4 In addition to the composition of Tables 2 to 4 The curable composition was produced in the same manner as in Example 1 except for the components shown in Tables 2 to 4 to obtain a cured film sample. Further, the types of the polymerizable compound, the trade name, the type of the polar group, and the concentration of the polar group are shown in Table 1. Table 1] Polymeric compound type Trade name Polar group Polar group concentration (mmol/g) Glycerol Epoxy acrylate DENACOL DA314 Hydroxy 6.0 Hexahydrophthalic acid Epoxy acrylate DENACOL DA722 Hydroxy 4.7 Pentaerythritol triacrylate KYALITE PET-30 Hydroxy 1.9 Hydroxyethyl acrylate ENER HOA Hydroxy 8.6 Hydroxyethyl methacrylate LIGHT ESTER HO-MS Hydroxy 7.7 Succinic acid modified dipentaerythritol pentaacrylate ARONIX M-520 Carboxylic acid 1.7 2,2,2-tripropenyloxy Methyl ethyl ketone acid NK ESTER CBX-0 carboxyl group 2.6 triacetate phosphate BISCOTE 3PA phosphate group 3.3 2-propenylamine-2-methylpropane sulfonic acid ATBS sulfo 4.8 acrylic acid dimer ARONIX M- 5600 Carboxyl group 4.6 Acrylic acid carboxyl group 13.9 Dimethylamino acrylate Amino group 7.0 Trimethylolpropane triacrylate ARONIX M-309 Μ Μ,, 0 Further, the particles used in Example 13 and Example 23 "B- 1" is synthesized as follows. Hollow ceria particles (trade name "JX -1 〇〇9 S IV", methyl isobutyl ketone sol, manufactured by Nippon Chemical Co., Ltd.) 9 0.9 parts by mass (solid content concentration: 20 parts by mass) a mixture of 1 part by mass of tridecafluorooctyltrimethoxydecane (manufactured by GE Toshiba Anthraquinone Co., Ltd.), 0.1 part by mass of isopropyl alcohol, and 0.05 part by mass of ion-exchanged water, stirred at 80t -29 - 201127919 for 3 hours. Adding methyl orthoformate 〇. 7 parts by mass 'then heated and stirred at the same temperature for 1 hour' to obtain a colorless transparent particle dispersion Β_1. After the amount of 2 g of Β-1 was dried in an aluminum dish, it was dried on a hot plate of l2 〇 ° C for 1 hour, and the solid content was determined to be 22.5 mass %. 3.3. Evaluation test The following examples were evaluated for the examples and The properties of the curable composition and the cured film obtained in the comparative examples. The results are shown in Tables 2 to 4. 3.3.1. Reflectance The back surface of the obtained cured film is coated with a black spray. The spectroscopic reflectance measuring device (self-recording spectrophotometer U-3410 equipped with a large sample type integrating sphere attachment device 150-09090, Hitachi, Ltd. Co., Ltd. manufactured), measured the reflectance in the range of wavelength 3 40 ~ 700nm from the substrate side and evaluated. Specifically, the reflectance of the antireflection laminate (antireflection film) at each wavelength is measured by the reflectance of the aluminum vapor deposited film as a reference (1 〇〇 % ) 'the reflectance of the light having a wavelength of 50 nm The combination is shown in Tables 2 to 4. If the reflectance is less than 3.0%, it can be judged to have low reflectivity. 3.3.2. Scratch resistance (steel wool resistance test) Steel wool (BONSTAR No. 0000, manufactured by STEEL WOOL Co., Ltd., Japan) was installed on the vibration-type friction fastness tester (AB-301, Tester Industries Limited) The company manufactured by the company was repeatedly rubbed 10 times under the conditions of the surface hardness of the obtained cured film of 200 g, and it was visually confirmed on the following basis whether or not the surface of the cured film was scratched. The evaluation criteria are as follows. AA: The cured film did not scratch. A: It is almost impossible to confirm the peeling or scratching of the cured film, or it is confirmed that there is a slight scratch on the hardened film. B: It was confirmed that there was a strip scratch on the entire surface of the cured film. C: The cured film is peeled off. 3 . 3 · 3. Pencil Hardness The obtained cured film was fixed on a glass substrate and evaluated in accordance with "131/5600-5-4" (ISO/DIS 15184). -31 - 201127919 Table Example 13 S CO - CO d I 100.1 I MIBK SS · < : Example 12 | S to 〇d I 100.1 I 1 Methanol I 3 S e > j eg < δ 丨 Example S (D no I 100.1 I MIBK S CM < 5 丨Example Η S (D CO d I 100.1 I MIBK | psm eg < 5 > Example 9丨(Ο CM ο o 丨〗 〇〇 I MIBK g < 5 1 Example β| <〇CM ο Ci I loo I MIBK n C4 s < 5 丨Example 7丨ο - rt d I 100.1 | MIBK 2 s CO < X 丨Example 6丨〇 <〇eg - C5 I loo I MIBK ci s < δ | Example 5| 〇 <〇ca - e〇5 I ioo.t | MIBK S gr* < δ 丨 Example 4 〇«〇- w I ίσο I MIBK S s < S 丨 Embodiment 3 S (0 r > 〇I 100.1 1 MIBK ss CO < 5 丨 Example 2 <〇〇) n 5 I 1Q0.1 I MIBK s C^4 〇 J < X Example 1 <〇σ> r? 〇I 100.1 1 MIBK S s Csl < 5 [glycerol epoxy acrylate | m more a? r maple 雔S- II 浒I pentylene Triacrylate I [Ethyl Acrylate II Hydroxyethyl Methacrylate I 12,2,2-Tripropylene methoxymethylethyl benzoic acid | | Phosphate Triacrylate | Zhao m SS K m H- C ^l ύ & at κ 丨 Trimethylolpropane triacrylate II hollow two gasification chopping particles I τ· I a I IGACURE907 | I SALIPLANE FM0725 | $ m 琪 tt^o <〇(D) Solvent|Polymerization Polarity of the compound in the compound (Πΐτηοΐ/g) Solid content concentration (%) Reflectance (%> Steel resistance toughness II (Α1) Component I (A2) Component I (B) Particle] I <C) Polymerization initiator II other additive I 1 Evaluation item (A) Sii -32 - 201127919 3 Table Example 23 CO CO g - Γ9 Ο 100.1 ΜΙΘΚ <〇o S η csi < 5 Example 22 〇<〇CO - η Ο 100 MIBK pair · s eg < 5 Example 21 CO § - co 5 100.1 MIBK CO ds csi < 5 Example 20| 〇 (Ο CO - CO 5 100.1 I methanol i tn 〇s ir > csi &lt 5 Example 19 CO s CO Ο 100.1 MIBK <〇ds \nc*i < 5 Example 18 CO eM o - CO Ο 100.1 MIBK σι s < δ Real Example Π <〇σ> - r> ο ο MIBK n ci s CO esj < 5 Example 16 (Ο CO g - co 5 100.1 MIBK CD s S < δ Example 15 <〇〇> - CO Ο 100.1 MIBK <〇oi s CM CNI < 5 EXAMPLES <〇〇> - n ο I 100.1 MIBK r-· g eo csi < 5 Succinic acid-modified dipentaerythritol pentaacrylate 2,2 ,2-tripropenyloxymethylethyl succinic acid, triacrylate, acrylamide, 2-methylpropane sulfonic acid, acrylic acid dimer, acrylic acid, trimethylolpropane, triacrylate, hollow dioxide, comparative particle 1 ω IGACURE 907 SALIPLANE FM0725 Total (parts by mass) (D) Solvent-polymerizable compound lg Polar group concentration (rmnol/g) Solid content concentration (%) Reflectance (%) Steel-resistant pencil hardness (A1) Component 1 (A2) Component I (B) Particles (C) Polymerization Initiator Other Additives Evaluation Item (A) Polymerizable Compound-33-201127919 [Table 4] Comparative Example 4 I g CO CO 〇 100.1 M1BK _____ _ 〇S \n — < 5 Comparative Example 3 CO CO d 100.1 MIBK CO d S in a < 5 Comparative Example 2 Nirvana CO V· 〇100.1 MIBK «〇S m 七< 5 Comparative Example 1 CO S 〇100.1 MIBK ο g ir>< 5 2,2,2-Tripropylene aceoxymethylethyl ethyl citrate tripropionate Acid-modified dipentaerythritol pentaacrylate trimethylolpropane triacrylate | dimethylamino acrylate hollow silica sand particles IGACURH 907 SALIPLANE FM0725 total (parts by mass) (D) solvent-polymerizable compound lg polar group Australian (mmol/g) Solid content concentration (%) Reflectance (%) Steel resistance (A1) Component (A2) Component (B) Particle (C) Polymerization initiator Other additives Evaluation item (A) Polymerization-Decorative-34-201127919 3.4. Evaluation results The results of Tables 2 and 3 show that the curable composition of Examples 1 to 23 in which the polar group concentration of all the polymerizable compounds satisfies the above conditions is hardened. The cured film was confirmed to have an antireflection property in which the reflectance was less than 3%. Further, as a result of the resistance to steel wool, it was found that the scratch resistance was also excellent. On the other hand, as a result of the results of Table 4, the cured film obtained by curing the curable composition of Comparative Examples 1 to 4 in which the polar group concentration of all the polymerizable compounds did not satisfy the above conditions was excellent in scratch resistance. However, the reflectance is more than 3% and the reflectance is poor. After observing the cross sections of the laminates of Examples 1 to 2 and Comparative Examples 1 to 4 with a transmission electron microscope, the laminates of Examples 1 to 2 were confirmed to have localized particles on the surface of the cured film, but Comparative Example 1 was It is impossible to confirm the local presence of particles in 4. The present invention is not limited to the above embodiments, and various modifications are possible. For example, the present invention includes substantially the same configurations as those described in the embodiments (for example, the functions, methods, and results are the same, or the configurations and effects are the same). Further, the present invention includes a configuration in which a non-essential portion of the configuration described in the embodiment is replaced. Further, the present invention includes a configuration that achieves the same function as the configuration described in the embodiment or a configuration that achieves the same object. Further, the present invention includes the configuration in which the conventional art described in the embodiment is constructed. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view schematically showing a laminate for antireflection of the present embodiment. -35- 201127919 [Explanation of main component symbols] 1 0 : Substrate 20 : Cured film 24 : Hard coating 26 : Low refractive index layer 1〇〇: Antireflection laminate

Claims (1)

201127919 七、申請專利範圍: —種防反射用層合物,其特徵爲於基材上具有硬 化膜,該硬化膜含有具有選自羥基、羧基、磷酸酯基及磺 基之一種以上極性基之基質,與折射率丨_ 4以下之粒子, 且Ig之前述基質中之羥基濃度、羧基濃度、磷酸酯基濃度 及擴基濃度之合g十爲0.5mmol/g以上15mmol/g以下, 且前述粒子在前述硬化膜中係局部存在於與前述基材 接觸之面爲相反之面側。 2 _如申請專利範圍第1項之防反射用層合物,其中1 g 之則述基質中之經基濃度爲2.0mmol/g以上15mmol/g以下 〇 3 _如申請專利範圍第1項之防反射用層合物,其中1 g 之前述基質中之羧基濃度、磷酸酯基濃度及磺基濃度之合 計爲0.5mmol/g以上10mmol/g以下。 4. 如申請專利範圍第1項之防反射用層合物,其中1 g 之前述基質中之羧基濃度、磷酸酯基濃度及磺基濃度之合 計爲0.5mmol/g以上5mmol/g以下。 5. 如申請專利範圍第1項之防反射用層合物,其中前 述粒子爲中空二氧化矽粒子。 6. 一種防反射用層合物,其特徵爲於基材上具有硬 化性組成物之硬化膜’該硬化性組成物含有具有選自羥基 、羧基、磷酸酯基及磺基之一種以上極性基之聚合性化合 物及折射率1.4以下之粒子’且1 g之全部聚合性化合物中 之羥基濃度、羧基濃度、磷酸酯基濃度及磺基濃度之合計 -37- 201127919 爲 0.5mm〇l/g以上 i5mmol/g以下, 且前述粒子在前述硬化膜中係局部存在於與前述基材 接觸之面爲相反之面側。 7 _如申請專利範圍第6項之防反射用層合物,其中1 g 之前述全部聚合性化合物中之羥基濃度爲2. 〇mmol/g以上 1 5mmol/g以下。 8 ·如申請專利範圍第6項之防反射用層合物,其中1 g 之前述全部聚合性化合物中之羧基濃度、磷酸酯基濃度及 礦基濃度之合計爲O_5mmol/g以上l〇mmol/g以下。 9.如申請專利範圍第6項之防反射用層合物,其中lg 之前述全部聚合性化合物中之羧基濃度、磷酸酯基濃度及 磺基濃度之合計爲0_5mmol/g以上5mmol/g以下。 1 〇 ·如申請專利範圍第6項之防反射用層合物,其中 前述粒子爲中空二氧化矽粒子。 11.如申請專利範圍第1至1 〇項中任一項之防反射用 層合物’其中前述基材爲三乙醯基纖維素樹脂薄膜或聚對 苯二甲酸乙二酯樹脂薄膜。 12· —種防反射用層合物之製造方法,其特徵爲包含 將硬化性組成物塗佈於基材上後經硬化之步驟,其中該硬 化性組成物含有具有選自羥基、羧基、磷酸酯基及磺基之 一種以上之極性基之聚合性化合物及折射率爲1 .40以下之 粒子,且lg之全部聚合性化合物中之羥基濃度、羧基濃度 、磷酸酯基濃度及磺基濃度之合計爲〇.5mmol/g以上 1 5mol/g以下。 Μ -38- 201127919 1 3 .如申請專利範圍第1 2項之防反射用層合物之製造 方法,其中前述硬化性組成物之全部聚合性化合物1 g中之 徑基濃度爲2.0mmol/g以上15mmol/g以下。 14.如申請專利範圍第12項之防反射用層合物之製造 方法,其中前述硬化性組成物之全部聚合性化合物1 g中之 羧基濃度、磷酸酯基濃度及磺基濃度之合計爲0.5mmol/g 以上l〇mmol/g以下。 1 5 .如申請專利範圍第1 2項之防反射用層合物之製造 方法,其中前述硬化性組成物之全部聚合性化合物1 g中之 羧基濃度、磷酸酯基濃度及磺基濃度之合計爲0.5 mmol/g 以上5mmol/g以下。 16.如申請專利範圍第I2項之防反射用層合物之製造 方法,其中前述粒子爲中空二氧化矽粒子。 1 7.如申請專利範圍第1 2至1 6項中任一項之防反射用 層合物之製造方法,其中前述基材爲三乙醯基纖維素樹脂 薄膜或聚對苯二甲酸乙二酯樹脂薄膜。 18. —種硬化性組成物,其特徵爲含有具有選自羥基 、羧基、磷酸酯基及磺基之一種以上之極性基之聚合性化 合物及折射率爲1.4〇以下之粒子,且1 g之全部聚合性化合 物中之羥基濃度、羧基濃度、磷酸酯基濃度及磺基濃度之 合計爲〇.5mmol/g以上I5mol/g以下。 1 9 ·如申請專利範圍第1 8項之硬化性組成物,其中1 g 之前述全部聚合性化合物中之羥基濃度爲2. Ommol/g以上 1 5mmol/g以下。 -39- 201127919 2 〇 ·如申請專利範圍第1 8項之硬化性組成物,其含有 (甲基)丙烯酸2-羥基乙酯作爲前述聚合性化合物。 2 1 ·如申請專利範圍第1 8項之硬化性組成物,其中1 g 之前述全部聚合性化合物中之羧基濃度、磷酸酯基濃度及 磺基濃度之合計爲0.5mmol/g以上l〇mmol/g以下。 2 2.如申請專利範圍第1 8項之硬化性組成物,其中1g 之前述全部聚合性化合物中之羧基濃度、磷酸酯基濃度及 擴基濃度之合計爲〇.5mmol/g以上5mmol/g以下。 23.如申請專利範圍第18至22項中任一項之硬化性組 成物’其中前述粒子爲中空二氧化矽粒子。 S -40-201127919 VII. Patent application scope: A laminate for antireflection, characterized in that it has a cured film on a substrate, and the cured film contains one or more polar groups selected from the group consisting of a hydroxyl group, a carboxyl group, a phosphate group and a sulfo group. a matrix having a refractive index of 丨_4 or less, and a combination of a hydroxyl group concentration, a carboxyl group concentration, a phosphate group concentration, and a base concentration in the matrix of Ig is 0.5 mmol/g or more and 15 mmol/g or less, and the foregoing The particles are locally present in the cured film on the side opposite to the surface in contact with the substrate. 2 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ In the antireflection laminate, the total of the carboxyl group concentration, the phosphate group concentration, and the sulfo group concentration in the above-mentioned matrix of 1 g is 0.5 mmol/g or more and 10 mmol/g or less. 4. The antireflection laminate according to the first aspect of the invention, wherein a total of a carboxyl group concentration, a phosphate group concentration and a sulfo group concentration in the substrate of 1 g is 0.5 mmol/g or more and 5 mmol/g or less. 5. The antireflection laminate according to the first aspect of the invention, wherein the particles are hollow ceria particles. 6. An antireflection laminate characterized by having a cured film having a curable composition on a substrate, wherein the curable composition contains one or more polar groups selected from the group consisting of a hydroxyl group, a carboxyl group, a phosphate group, and a sulfo group. The total of the hydroxyl group concentration, the carboxyl group concentration, the phosphate group concentration, and the sulfo group concentration in the polymerizable compound and the particles having a refractive index of 1.4 or less and 1 g of all the polymerizable compounds - 37 - 201127919 is 0.5 mm / l / g or more I5 mmol/g or less, and the particles are partially present on the surface opposite to the surface in contact with the substrate in the cured film. 7 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ 8. The antireflection laminate according to claim 6, wherein a total of carboxyl group concentration, phosphate group concentration, and ore concentration in 1 g of all the polymerizable compounds is O_5 mmol/g or more l〇mmol/ g below. 9. The antireflection laminate according to the sixth aspect of the invention, wherein the total of the carboxyl group concentration, the phosphate group concentration and the sulfo group concentration in all the polymerizable compounds of lg is from 0 to 5 mmol/g to 5 mmol/g. The antireflection laminate according to the sixth aspect of the invention, wherein the particles are hollow ceria particles. The antireflection laminate of any one of claims 1 to 1 wherein the substrate is a triethylenesulfonated cellulose resin film or a polyethylene terephthalate resin film. 12. A method for producing an antireflection laminate comprising the step of applying a curable composition to a substrate, wherein the curable composition contains a selected from the group consisting of a hydroxyl group, a carboxyl group, and a phosphoric acid. a polymerizable compound having one or more polar groups of an ester group and a sulfo group, and a particle having a refractive index of 1.40 or less, and a hydroxyl group concentration, a carboxyl group concentration, a phosphate group concentration, and a sulfo group concentration in all of the polymerizable compounds of lg The total amount is 55 mmol/g or more and 15 mol/g or less. The method for producing an antireflection laminate according to the first aspect of the invention, wherein the base group concentration of the polymerizable compound 1 g of the curable composition is 2.0 mmol/g. Above 15 mmol/g or less. 14. The method for producing an antireflection laminate according to claim 12, wherein a total of a carboxyl group concentration, a phosphate group concentration and a sulfo group concentration in 1 g of all the polymerizable compounds of the curable composition is 0.5. Methylene / g or more l〇mmol / g or less. The method for producing an antireflection laminate according to the first aspect of the invention, wherein a total of a carboxyl group concentration, a phosphate group concentration, and a sulfo group concentration in 1 g of all the polymerizable compounds of the curable composition It is 0.5 mmol/g or more and 5 mmol/g or less. 16. The method for producing an antireflection laminate according to the invention of claim 1, wherein the particles are hollow ceria particles. The method for producing an antireflection laminate according to any one of claims 1 to 6 wherein the substrate is a triethylenesulfonated cellulose resin film or polyethylene terephthalate. Ester resin film. 18. A curable composition comprising a polymerizable compound having one or more polar groups selected from a hydroxyl group, a carboxyl group, a phosphate group, and a sulfo group, and a particle having a refractive index of 1.4 Å or less, and 1 g of The total of the hydroxyl group concentration, the carboxyl group concentration, the phosphate group concentration, and the sulfo group concentration in all the polymerizable compounds is 〇5 mmol/g or more and I5 mol/g or less. 1 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。. -39-201127919 2 〇 The curable composition of claim 18, which contains 2-hydroxyethyl (meth)acrylate as the polymerizable compound. 2 1 . The curable composition of claim 18, wherein a total of a carboxyl group concentration, a phosphate group concentration, and a sulfo group concentration of 1 g of all the polymerizable compounds is 0.5 mmol/g or more. /g below. 2 2. The curable composition of claim 18, wherein a total of a carboxyl group concentration, a phosphate group concentration, and a base concentration in 1 g of all the polymerizable compounds is 〇.5 mmol/g or more and 5 mmol/g. the following. The sclerosing composition of any one of claims 18 to 22 wherein the aforementioned particles are hollow cerium oxide particles. S -40-
TW099140217A 2009-11-30 2010-11-22 Reflection prevention laminate and production method thereof, and curable composition TW201127919A (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2009271392 2009-11-30
JP2009271394 2009-11-30
JP2010100663A JP4831377B2 (en) 2009-11-30 2010-04-26 Antireflection laminate, method for producing the same, and curable composition
JP2010100664A JP4775603B2 (en) 2009-11-30 2010-04-26 Antireflection laminate, method for producing the same, and curable composition

Publications (2)

Publication Number Publication Date
TW201127919A true TW201127919A (en) 2011-08-16
TWI377236B TWI377236B (en) 2012-11-21

Family

ID=44395499

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099140217A TW201127919A (en) 2009-11-30 2010-11-22 Reflection prevention laminate and production method thereof, and curable composition

Country Status (3)

Country Link
KR (1) KR101184995B1 (en)
CN (1) CN102152560A (en)
TW (1) TW201127919A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101813707B1 (en) 2015-11-04 2017-12-29 주식회사 엘지화학 Anti-reflective film and preparation method of the same
TWI663063B (en) 2016-03-09 2019-06-21 Lg化學股份有限公司 Anti-reflective film
WO2017155337A1 (en) * 2016-03-09 2017-09-14 주식회사 엘지화학 Anti-reflection film

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008152199A (en) 2006-12-20 2008-07-03 Konica Minolta Opto Inc Antiglare antireflection film, polarizing plate and display apparatus each using the same
JP5157162B2 (en) 2006-12-27 2013-03-06 日本ゼオン株式会社 Antireflection laminate and method for producing the same

Also Published As

Publication number Publication date
CN102152560A (en) 2011-08-17
TWI377236B (en) 2012-11-21
KR20110060810A (en) 2011-06-08
KR101184995B1 (en) 2012-10-02

Similar Documents

Publication Publication Date Title
KR102118904B1 (en) Anti-relrection composition and optical film using thereof
TWI520846B (en) Hard coating film and preparation method therof
TWI640568B (en) Curable composition containing siloxane oligomer and inorganic fine particle
TWI357431B (en) Composition for active energy ray curable coating
TWI374290B (en) Stacked film for optical use
CN104508023A (en) Method for manufacturing hard coating film
TWI547370B (en) Antireflective composition, a method for producing the same, and a hardening composition
TWI588165B (en) Plastic film and method for preparing the same
TW201240822A (en) Containing material containing organic-inorganic composite, organic-inorganic composite film and antireflective member
KR20150131960A (en) Thermosetting compositions
TW200829661A (en) Coating material, optical article using it and method for producing optical article
TW201326326A (en) Hard coating film, composition for hard coating film, polarizing plate including the same, and liquid crystal display including the same
KR20110047596A (en) Composition for hard coating, hard coating film and polarizing film comprising thereof
WO2012086552A1 (en) Water-absorbable resin composition and laminate produced using same
JP2002079600A (en) Anti-reflection laminate
JP2006212987A (en) Transfer material
TW201127919A (en) Reflection prevention laminate and production method thereof, and curable composition
JP2012247606A (en) Laminate for antireflection and manufacturing method thereof, and curable composition
JP2013008025A (en) Laminate for antireflection and manufacturing method thereof, and curable composition
JP4775603B2 (en) Antireflection laminate, method for producing the same, and curable composition
JP2012159744A (en) Laminate for antireflection and producing method thereof, and curable composition
JP2001163906A (en) Low refractive index composition, low refractive index film, optical multilayer film and antireflection film
JP2009031506A (en) Near infrared ray shielding material with reduced reflection for display and electronic image display device using same
JP4831377B2 (en) Antireflection laminate, method for producing the same, and curable composition
JP4904885B2 (en) Curable resin composition, cured film, antireflection film laminate and method for producing cured film

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees