JP2009031506A - Near infrared ray shielding material with reduced reflection for display and electronic image display device using same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a near infrared ray shielding material with reduced reflection for display which has a low visible reflectance, is excellent in scratch resistance, wear resistance and water resistance and can shield near infrared ray. <P>SOLUTION: A reduced reflection layer 15 is configured by stacking a hard coat layer 12 and a low refractive index layer 13 via an adhesive layer 11 on a transparent base film 10 in this order. In an antireflection film whose visible reflectance is 0.5% or less, a difference of refractive index between the transparent base film and the hard coat layer is 0.02 or less and a film thickness of the adhesive layer is 5 to 30 nm. Further, the low refractive index layer has a film-forming property and contains a fluorine-containing compound with polymerizable double bond and modified hollow silica fine particles which are subjected to hydrothermal treatment, are modified with silane coupling agent having polymerizable double bond, has a porosity of a hollow part of 40 to 45% and the average particle size of 10 to 100 nm, wherein a content of the fluorine-containing compound in the total amount of the fluorine-containing compound and modified hollow silica fine particles is 40 to 80 mass% and a content of modified hollow silica fine particles is 20 to 60 mass%. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention is provided on a display screen of an electronic image display device such as a plasma display panel (PDP) and a liquid crystal display (LCD), and has a near-infrared shielding function that shields near-infrared rays that cause malfunction of peripheral electronic devices, The present invention relates to a low-reflective near-infrared shielding material for display and a electronic image display device using the same, which has a low-reflection function that reduces reflection of light and imparts excellent visibility.

  2. Description of the Related Art In recent years, electronic image display devices (electronic displays) such as plasma display panels and liquid crystal displays have made remarkable progress for television and monitor applications and have become widespread. As these electronic image display devices are increased in size, there is a problem that visibility is reduced due to reflection of external light. In a plasma display panel, near-infrared light emitted in principle may cause a malfunction of a remote control device or the like.

  In order to solve these problems, the plasma display filter emits light from an anti-reflection material with an anti-reflection function or a plasma display illuminator to reduce the reflection of external light and improve visibility. In order to shield near-infrared light generated, a near-infrared shielding material having a near-infrared shielding function is used.

  Conventionally, in order to obtain high antireflection performance, the antireflection layer provided in this antireflection material generally has a multilayer structure in which a plurality of high refractive index materials and low refractive index materials are laminated. If a material having a refractive index is used, reflection can be reduced in a wide wavelength region even with a single-layer structure having only a low refractive index layer. A single-layer anti-reflection material has a simpler layer structure than a multi-layer structure, and is excellent in terms of productivity and cost performance.

  As a low refractive index material, a low refractive index coating agent using hollow silica fine particles having cavities therein has been proposed (see, for example, Patent Document 1). That is, it is a low refractive index coating agent comprising an active energy ray-curable resin containing a compound having a (meth) acryloyloxy group in the molecule and hollow fine particles of 0.5 to 200 nm. Further, Patent Document 1 describes that the refractive index of the coating film formed by the coating agent is 1.40 to 1.33. Moreover, a composition containing a fluorine-containing polyfunctional monomer having two or more polymerizable groups has been proposed as a low refractive index material (see, for example, Patent Document 2). That is, a composition containing a fluorine-containing polyfunctional monomer and hollow silica fine particles is disclosed.

In addition, an antireflection laminate is proposed in which a low refractive index layer having a refractive index of 1.45 or less is provided on a light-transmitting substrate (see, for example, Patent Document 3). Such a low refractive index layer contains an ionizing radiation curable resin composition and silica fine particles that are surface-treated with a silane coupling agent having an ionizing radiation curable group and that are porous or hollow inside. The low refractive index layer can contain a fluorine-based or silicon-based compound that is compatible with the ionizing radiation curable resin composition and the silica fine particles.
JP 2003-292831 A (pages 2 and 5) JP 2006-28409 A (page 2, pages 43-47) Japanese Patent Laying-Open No. 2005-99778 (pages 2 and 22)

Moreover, as a near-infrared shielding material, in order to shield light in the wavelength region of 800 to 1000 nm including wavelengths of 820 nm, 880 nm, and 980 nm that are used in a remote control or the like, there is a method of using several kinds of near-infrared absorbing dyes in combination. It is known (see, for example, Patent Document 4).
Japanese Patent Application Laid-Open No. 11-305033 (pages 2 and 3)

  However, since the active energy ray-curable resin forming the low refractive index coating agent described in Patent Document 1 does not contain fluorine, the effect of low refractive index and low reflectance of the resulting coating film can be obtained. I can't. Moreover, since the hollow silica fine particles themselves do not have reactivity on the surface, the affinity (binding property) with the active energy ray-curable resin having a (meth) acryloyloxy group is not sufficient. That is, since the hollow silica fine particles are not incorporated into the matrix but are separated as a dispersed phase, the strength and hardness of the resulting coating film are low, resulting in poor scratch resistance and wear resistance on the film surface. There was a problem that it was enough. In addition, moisture is easily adsorbed on the surface of the hollow silica fine particles, and if a water droplet is left on the film, a spot-like mark (water mark) is formed, which increases the refractive index of the part. Since the reflectance of the coating surface increases, there arises a problem that the antireflection performance is deteriorated.

  Further, in the composition described in Patent Document 2, since the hollow silica fine particles are only surface-treated with a silane coupling agent, moisture is easily adsorbed on the surface of the hollow silica fine particles. Problems similar to the low refractive index coatings described arise. Furthermore, since the ionizing radiation curable resin composition forming the low refractive index layer described in Patent Document 3 does not contain a fluorine compound, the function based on the fluorine compound cannot be exhibited, and the desired antireflection is achieved. You can't get performance. In addition, although it is described that a fluorine-based compound is blended as another component if necessary, since the content thereof is a small amount of 0.01 to 10% by mass, the effect based on the fluorine-based compound is not sufficiently exhibited. . In addition, similar to the hollow silica fine particles used in Patent Document 2, moisture is easily adsorbed on the surface of the hollow silica fine particles, and thus the same problem as in Patent Document 1 or 2 occurs.

  Furthermore, the near-infrared absorption filter described in Patent Document 4 uses KayasorbIRG-022 manufactured by Nippon Kayaku Co., Ltd. as a near-infrared absorbing dye, but the absorption ability of the diimonium salt compound at a wavelength of 820 nm is not high. Therefore, there is a problem that the second near-infrared absorbing dye must be added, and as a result, the total amount of the near-infrared absorbing dye increases, resulting in an increase in cost.

  Therefore, the object of the present invention is to achieve good scratch resistance and wear resistance on the surface of the cured film, achieve a low refractive index, and improve the water resistance of the cured film. By reducing the total amount of near-infrared-absorbing dyes, it is possible to reduce the near-infrared transmittance to the desired value by sufficiently shielding near-infrared rays using a fluorine-containing curable coating solution An object of the present invention is to provide a near-infrared shielding material for display that has a near-infrared shielding layer capable of realizing cost reduction and an electronic image display device using the same.

  In order to achieve the above object, the reduced reflection near-infrared shielding material for display of the first invention is provided with a reduced reflection layer on one surface of the transparent substrate film and a near-infrared absorbing dye on the other surface. In the near-infrared shielding near-infrared shielding material for display provided with the near-infrared shielding layer, the reduced-reflection layer has a hard coat layer and a low refractive index layer on the transparent substrate film via an adhesive layer. In the antireflection film that is laminated in this order and has a visibility reflectance of 0.5% or less, the refractive index difference between the transparent substrate film and the hard coat layer is within 0.02, and The adhesive layer has a film thickness of 5 to 30 nm. Further, the low refractive index layer has film-forming properties, is subjected to hydrothermal treatment with a fluorine-containing compound having a polymerizable double bond, By silane coupling agent having a heavy bond Modified, containing modified hollow silica fine particles having a hollow portion porosity of 40 to 45% and an average particle diameter of 10 to 100 nm, and the amount of the fluorine-containing compound in the total amount of the fluorine-containing compound and the modified hollow silica fine particles The content is 40 to 80% by mass and the content of the modified hollow silica fine particles is 20 to 60% by mass.

The reduced-reflection near-infrared shielding material for display according to the second invention, in the first invention, contains conductive metal oxide fine particles, whereby 1.0 × 10 ^{8 to} 1.0 × 10 ¹² Ω / □. And the hard coat layer has a refractive index of 1.6 to 1.7.

  According to a third aspect of the present invention, in the first or second invention, the modified hollow silica fine particle is a hollow silica fine particle formed by a silane coupling agent represented by the following chemical formula (1). It is denatured and has a thermal mass decrease of 2 to 10% by mass when the temperature is increased from room temperature to 500 ° C. at a rate of temperature increase of 10 ° C./min.

（式中、Ｚは（メタ）アクリロイルオキシ基であり、Ｒ^１は炭素数１〜４のアルキレン基であり、Ｒ^２は水素原子、メチル基又はエチル基である。）
第４の発明のディスプレイ用減反射性近赤外線遮蔽材は、第１から第３のいずれかに係る発明において、前記低屈折率層は、さらに成膜性を有しない下記の化学式（２）で示される含フッ素（メタ）アクリル酸エステルを含有することを特徴とするものである。

(In the formula, Z is a (meth) acryloyloxy group, R ¹ is an alkylene group having 1 to 4 carbon atoms, and R ² is a hydrogen atom, a methyl group or an ethyl group.)
In the invention according to any one of the first to third aspects, the low-reflective near-infrared shielding material for display according to a fourth aspect of the present invention is the following chemical formula (2), wherein the low refractive index layer further has no film formability. It contains the fluorine-containing (meth) acrylic acid ester shown.

（式中、Ｘ及びＹは（メタ）アクリロイルオキシ基又は水酸基であり、少なくとも一方は（メタ）アクリロイルオキシ基である。）

(In the formula, X and Y are a (meth) acryloyloxy group or a hydroxyl group, and at least one is a (meth) acryloyloxy group.)

  The reduced reflection near-infrared shielding material for display according to a fifth aspect of the present invention is the invention according to any one of the first to fourth aspects, wherein the transparent base film is a polyester film containing an ultraviolet absorber. is there.

In the invention according to any one of the first to fifth aspects, the near-infrared absorbing material for display according to a sixth aspect of the invention is the invention according to any one of the first to fifth aspects, wherein the near-infrared absorbing dye is selected from at least two kinds of near-infrared absorbing dyes. One is a diimonium salt having a sulfonimide represented by the following general formula (3) as an anionic component, and the other is a fluorine-containing phthalocyanine-based metal complex compound.

(In the formula, R is the same or different group, and represents a group selected from the group consisting of an alkyl group, a halogenated alkyl group, a cyanoalkyl group, an aryl group, a hydroxyl group, a phenyl group, and a phenylalkylene group; R ¹ and R ² are the same or different groups and each represents a fluoroalkylene group or a fluoroalkylene group formed by them together)

  According to a seventh aspect of the present invention, in the sixth aspect, the diimonium salt is a compound in which R is a halogenated alkyl group and exhibits a pull-shift effect. Is.

  A reduced reflective near-infrared shielding material for display according to an eighth aspect of the present invention is the display of the reduced reflective near-infrared shielding material according to any one of the first to seventh aspects of the invention, directly on the display screen or on the display screen. It is an electronic image display device that is bonded to a transparent plate disposed on the front surface.

According to the present invention, the following effects can be exhibited.
In the first aspect of the invention, the near-infrared shielding layer can shield near-infrared rays that are emitted from the display and cause a malfunction of a remote control device or the like, and the visibility reflectance is suppressed to 0.5 or less by the anti-reflection layer. Therefore, it is possible to provide a reduced-reflection near-infrared shielding material for display that suppresses reflection of external light or the like. The difference in refractive index between the transparent substrate film and the hard coat layer is 0.02 or less, and the film thickness of the adhesive layer is 5 to 30 nm. From this, it is possible to effectively suppress the occurrence of interference unevenness of the hard coat layer resulting from the refractive index difference between the transparent substrate film and the hard coat layer, and the adhesion of the hard coat layer to the transparent substrate film Can be increased. Further, since the low refractive index layer contains a fluorine-containing compound having film formability and a polymerizable double bond and hollow silica fine particles, the refractive index is sufficiently lowered and the reflectance is lowered. be able to. Further, since the modified hollow silica fine particles are subjected to hydrothermal treatment, the outer shell thereof is densified, moisture is hardly adsorbed on the surface of the obtained cured film, and the water resistance of the cured film can be improved. Since the modified hollow silica fine particles are modified with a silane coupling agent having a polymerizable double bond, the polymerizable double bond of the silane coupling agent and the polymerizable double bond of the fluorine-containing compound must be copolymerized. Thus, the hollow silica fine particles are integrally bonded to the fluorine-containing compound, and the strength and hardness of the cured film can be improved. The content of the fluorine-containing compound in the low refractive index layer is 40 to 80% by mass in the total amount of the fluorine-containing compound and the modified hollow silica fine particles, and the higher the fluorine content in the fluorine-containing compound, the lower the refractive index. Therefore, it is possible to improve the low reflectance of the cured film.

In the second invention, since the hard coat layer contains conductive metal oxide fine particles, it has a surface resistivity of 1.0 × 10 ^{8 to} 1.0 × 10 ¹² Ω / □. It can prevent the adhesion of foreign matters such as dust due to static electricity. Moreover, since the refractive index of the said hard-coat layer is 1.6-1.7, the refractive index difference of a transparent base film and a hard-coat layer becomes small, and generation | occurrence | production of an interference fringe can be suppressed. Therefore, in addition to the effects of the first invention, adhesion of foreign matters such as dust due to static electricity can be suppressed, and occurrence of interference fringes can be suppressed.

  In the third invention, the heat when the modified hollow silica fine particles are modified by the silane coupling agent represented by the chemical formula (1) and heated from room temperature to 500 ° C. at a temperature rising rate of 10 ° C./min. The weight loss is 2 to 10% by weight. Therefore, in addition to the effects of the first or second invention, the compatibility between the modified hollow silica fine particles and the fluorine-containing compound is improved, and the strength and hardness of the cured film can be improved.

  In 4th invention, since the said low-refractive-index layer contains the fluorine-containing (meth) acrylic acid ester shown by the said Chemical formula (2) which does not have a film formability further, any one of 1st-3rd In addition to this invention, effects such as antifouling properties based on fluorine can be exhibited well.

  In the fifth invention, since the transparent substrate film is an ultraviolet absorber-containing polyester film, in addition to any one of the first to fourth inventions, the ultraviolet light can be efficiently shielded and has a predetermined thickness. In addition, it is easy to form, and it is easy to obtain, and the manufacturing cost can be reduced.

  In the sixth invention, since the infrared absorbing dye is a mixed system of a specific diimonium salt and a fluorine-containing phthalocyanine-based metal complex, in addition to the first to fifth inventions, malfunction of a peripheral device such as a remote control is prevented. Even if the near infrared ray is sufficiently shielded to suppress the visible light transmittance, the visible light transmittance does not decrease.

  In the seventh invention, since the diimonium salt has a blue shift effect, the addition amount of the second and third near-infrared absorbing dyes having maximum absorption on the short wavelength side in the near-infrared region is reduced, and the near-infrared ray is reduced. Since the total addition amount of the absorbing dye can be reduced, in addition to the sixth effect, it is possible to prevent a decrease in visible light transmittance and an increase in cost.

  In the eighth invention, in addition to the first to seventh effects, when used in a display screen of an electronic image display device, particularly a plasma display, it prevents malfunction of peripheral devices such as a remote control, etc. An electronic image display device in which reflection of light or the like is suppressed can be provided.

In the following, embodiments that are considered to be the best of the present invention will be described in detail. The reduced reflection near-infrared shielding material of the present invention uses a transparent substrate film as a substrate (base layer), on which (A) an adhesive layer, (B) a hard coat layer, and (C) a low refractive index layer. They are laminated in this order, and (D) a near infrared ray shielding layer is provided on the opposite surface.
First, the transparent base film which is the base material (base layer) of the antireflection film of the present invention will be described.
The transparent substrate film used in the present invention is not particularly limited as long as it has transparency, but preferably has a refractive index (n) in the range of 1.55 to 1.70 in order to suppress reflection. Examples of such transparent resin base materials include polyesters such as polyethylene terephthalate (PET, n = 1.65), polycarbonate (PC, n = 1.59), polyarylate (PAR, n = 1.60), and polyether. Sulfone (PES, n = 1.65) or the like is preferable. Among these, a polyester film, particularly a polyethylene terephthalate film is preferable in terms of ease of molding, availability, and cost.

  Moreover, the thickness of a transparent base film becomes like this. Preferably it is 25-400 micrometers, More preferably, it is 50-200 micrometers. In addition, the transparent substrate film may contain various additives. Examples of such additives include ultraviolet absorbers, antistatic agents, stabilizers, plasticizers, lubricants, flame retardants, and the like. Among these, an ultraviolet absorber is particularly preferable in terms of improving the light resistance of the near-infrared shielding layer.

  Next, the (A) adhesive layer provided on the transparent substrate film will be described. The (A) adhesive layer used in the present invention has a function of enhancing the adhesion between the transparent substrate film and the (B) hard coat layer described later without adversely affecting optically. The film thickness of the adhesive layer is 5 to 30 nm, preferably 10 to 20 nm, and a known resin layer having an arbitrary refractive index as an adhesive as long as the adhesion between the transparent substrate film and the hard coat layer can be improved. Is applicable. When the film thickness of the adhesive layer is less than 5 nm, the adhesion between the transparent substrate film and the hard coat layer cannot be maintained. On the other hand, when the film thickness of the adhesive layer exceeds 30 nm, for example, a commercially available adhesive layer is provided. The transparent base film has many interference fringes because the adhesive layer has an optical adverse effect.

  As a method for forming the adhesive layer (A), a method of applying a coating liquid containing a water-dispersible or water-soluble polyester resin as an adhesive on a transparent substrate film and then drying it is preferable. In particular, when a polyester film is used as the transparent substrate film, it is preferable to use a polyester resin, particularly a copolymerized polyester resin, as an adhesive for forming the adhesive layer. The copolyester resin means a polyester resin obtained by a polycondensation reaction between a plurality of dicarboxylic acids and a plurality of polyols or a transesterification reaction between a plurality of esters and a plurality of polyols. Such a copolyester resin is formed by a polycondensation reaction of a dicarboxylic acid and a polyol.

  Dicarboxylic acids include terephthalic acid, isophthalic acid, phthalic acid, phthalic anhydride, 2,6-naphthalenedicarboxylic acid, 1,4-cyclohexanedicarboxylic acid, adipic acid, sebacic acid, trimellitic acid, pyromellitic acid, dimer acid Etc. In addition to the dicarboxylic acid, a sulfonic acid metal base-containing dicarboxylic acid may be added to impart water dispersibility.

  Examples of the polyol include ethylene glycol, propylene glycol, tetramethylene glycol, 1,4-cyclohexanedimethanol, neopentyl glycol, diethylene glycol, 1,4-butanediol, dipropylene glycol, 1,6-hexanediol, and xylene glycol. However, it is not limited to these.

A filler, wax, or the like may be added to the coating solution containing the copolymerized polyester resin for the purpose of imparting blocking resistance and slipperiness.
Examples of the filler include silica, titanium oxide, calcium carbonate, calcium silicate, barium sulfate, calcium phosphate, aluminum oxide, magnesium oxide, zinc oxide, and tin oxide. Among these, it is preferable to select one that does not settle in the coating solution. These fillers usually have an average particle size of 20 to 60 nm. When the average particle size is less than 20 nm, sufficient blocking resistance and slipping properties may not be obtained, and when it exceeds 60 nm, the filler tends to fall off.

As the wax, water-dispersible or water-soluble waxes such as carnauba wax, candelilla wax, rice wax, wood wax, palm wax, montan wax, ozokerite, ceresin wax, paraffin wax, polyethylene glycol, and polypropylene glycol are preferable.
In order to further improve the scratch resistance, it is preferable to add a crosslinking agent to the adhesive layer (A).
As the crosslinking agent, oxazolines, epoxy compounds, melamine compounds, isocyanate compounds, coupling agents and the like can be used, and among them, oxazolines are preferable. As the oxazolines, a polymer containing an oxazoline group is preferable. This is obtained by copolymerization with an addition polymerizable oxazoline group-containing monomer alone or with another monomer. Examples of the addition polymerizable oxazoline group-containing monomer include 2-vinyl-2-oxazoline, 2-vinyl-4-methyl-2-oxazoline, and 2-isopropenyl-2-oxazoline. Among these, 2-isopropenyl-2-oxazoline is preferred because it is easily available industrially. Other monomers are not limited as long as they are copolymerizable with addition-polymerizable oxazoline group-containing monomers, and are acrylic acid esters, unsaturated carboxylic acids, unsaturated nitriles, unsaturated amides. , Vinyl esters, vinyl ethers, α-olefins, halogen-containing α, β-unsaturated monomers, α, β-unsaturated aromatic monomers, and the like.

  In order to provide the adhesive layer (A) on the transparent substrate film, the coating solution is applied to one or both sides of the transparent substrate film. The application can be carried out at any stage, but it is preferably carried out during the production process of the transparent substrate film. As a coating method, any known coating method can be used. For example, a gravure coating method, a roll brush method, a spray coating method, an air knife method, a coil bar method, a dip coating method and the like can be mentioned.

Next, the (B) hard coat layer used on one surface of the transparent substrate film will be described.
The (B) hard coat layer is used for the hard coat layer as long as the difference in refractive index between the refractive index and the refractive index of the transparent substrate film is within 0.02, and the surface hardness and scratch resistance can be improved. Any known resin can be used, and it is particularly preferable that the resin is formed from a material containing an ionizing radiation curable resin and metal oxide fine particles. Here, the metal oxide fine particles mean metal oxides having an average particle diameter of preferably 150 nm or less, more preferably 10 to 150 nm. When this average particle diameter exceeds 150 nm, the fine particles become too large, resulting in a loss of transparency of the hard coat layer.

  By reducing the reflected light by making the refractive index of the hard coat layer close to the refractive index of the transparent substrate film, interference fringes generated by interference of the reflected light can be reduced. On the other hand, when the difference in refractive index between the transparent substrate film and the hard coat layer exceeds 0.02, the reflected light at the interface between the transparent substrate film and the hard coat layer becomes strong, resulting in strong interference fringes. It is inappropriate.

  The ionizing radiation curable resin particularly preferable as the (B) hard coat layer is a resin that undergoes a curing reaction when irradiated with active energy rays such as ultraviolet rays and electron beams, and the type thereof is not particularly limited. Specifically, for example, monofunctional (meth) acrylate [in the present specification, (meth) acrylate means a generic name including both acrylate and methacrylate. ], Starting materials such as polyfunctional (meth) acrylates and reactive silicon compounds such as γ-acryloxypropyltrimethoxysilane. Among these, from the viewpoint of achieving both productivity and hardness, a composition containing an ultraviolet curable polyfunctional acrylate as a main component is preferable. The composition containing such an ultraviolet curable polyfunctional acrylate is not particularly limited. For example, a mixture of two or more known ultraviolet curable polyfunctional acrylates is commercially available as an ultraviolet curable hard coat material. Are listed.

  The ultraviolet curable polyfunctional acrylate is not particularly limited. For example, dipentaerythritol hexaacrylate, tetramethylol methane tetraacrylate, tetramethylol methane triacrylate, trimethylol propane triacrylate, 1,6-hexanediol diacrylate, 1, Acrylic derivatives of polyfunctional alcohols such as 6-bis (3-acryloyloxy-2-hydroxypropyloxy) hexane, polyethylene glycol diacrylate and polyurethane acrylate are preferred.

  When the metal oxide fine particles added to the ionizing radiation curable resin are dispersed in the ionizing radiation curable resin to form a coating film, the difference in refractive index between the transparent base film and the hard coat layer is 0. Those that can be adjusted to be 02 or less are selected. Examples of the metal oxide include ITO (indium-tin composite oxide, refractive index 2.0), ATO (antimony-tin composite oxide, refractive index 2.1), tin oxide (refractive index 2.0), From antimony oxide (refractive index 2.1), zinc oxide (refractive index 2.1), zirconium oxide (refractive index 2.1), titanium oxide (refractive index 2.4) and aluminum oxide (refractive index 1.6). At least one selected from the group consisting of Of these, tin oxide and antimony oxide are particularly preferable in terms of particle dispersibility, average particle diameter, availability, and production cost. The addition amount of the metal oxide fine particles to the ionizing radiation curable resin is about 1 to 400 parts by mass with respect to 100 parts by mass of the ionizing radiation curable resin.

  Furthermore, other components can be further added to the ionizing radiation curable resin as long as the effects of the present invention are not impaired. Examples of such other components include additives such as a polymer, a polymerization initiator, a polymerization inhibitor, an antioxidant, a dispersant, a surfactant, a light stabilizer, and a leveling agent. Further, any amount of solvent can be added as long as it is dried after film formation in the wet coating method.

  The method for forming the (B) hard coat layer is not particularly limited, and a general wet coat method such as a roll coat method, a coil bar method, or a die coat method is employed. The formed layer can be subjected to a curing reaction by heating or irradiation with active energy rays such as ultraviolet rays and electron beams, as necessary.

Next, (C) the low refractive index layer will be described.
In the present invention, the (C) low refractive index layer is composed of (c1) a fluorine-containing compound having film-forming properties and having a polymerizable double bond, and (c2) a hydrothermal treatment, and a polymerizable double bond. It contains a modified hollow silica fine particle having a hollow part porosity of 40 to 45% and an average particle diameter of 10 to 100 nm. In this case, the content of the fluorine-containing compound in the total amount of the fluorine-containing compound and the modified hollow silica fine particles is 40 to 80% by mass, and the content of the modified hollow silica fine particles is 20 to 60% by mass.

First, the (c1) fluorine-containing compound will be described.
Fluorine atoms (hereinafter also simply referred to as fluorine) have a very low polarizability, so fluorine-containing monomers have low molecular cohesion and can provide low surface energy after film formation, but have poor film formability. It has the property of Here, the film formability represents a property that a cured film (hereinafter also simply referred to as a film) is formed from a fluorine-containing curable coating liquid without being repelled when applied onto a substrate such as a synthetic resin film. A film that can form a uniform film with a certain thickness at the stage where a fluorine-containing curable coating liquid containing a solvent is applied to a substrate and heated to remove the solvent is judged to have good film formability. For example, when the trifluoromethyl group is oriented, the critical surface tension is 6 dyn / cm, while the tetrafluoroethylene group is 18 dyn / cm, so that fluorine in the form of a methylene fluoride group or a fluorinated methine group is used. The film-formability is improved by introducing. Further, from the viewpoint of increasing the cohesive force of molecules, a technique of polymerizing is also effective. Therefore, as the fluorine-containing compound having the film-forming property and having a polymerizable double bond, (a) a fluorine-containing compound having a structure in which a fluorine atom is introduced into the molecule as a methylene fluoride group or a fluorinated methine group. Examples thereof include monomers and (a) a fluorine-containing reactive polymer that is soluble in a solvent and has a polymerizable double bond.

  The (a) fluorine-containing monomer having a structure in which a fluorine atom is introduced into the molecule as a methylene fluoride group or a fluorinated methine group has almost all the fluorine atoms in the molecule as a methylene fluoride group or a fluorinated methine group. All known monomers can be used as long as they are introduced monomers. That is, the polymerizable double bond may be either one (monofunctional) monomer, two or more (polyfunctional) monomers, or a mixture thereof.

  These fluorine-containing compounds can increase the strength and hardness of the cured film, and can improve the scratch resistance and wear resistance of the film surface. Among the fluorine-containing compounds, a fluorine-containing polyfunctional (meth) acrylic acid ester is preferable because a crosslinked structure can be formed and the strength and hardness of the cured film are high. In this specification, both acrylic and methacrylic are referred to as (meth) acrylic.

  Specific examples of the fluorine-containing polyfunctional (meth) acrylic acid ester include, for example, 1,3-bis {(meth) acryloyloxy} -2,2-difluoropropane, 1,4-bis {(meth) acryloyloxy}. -2,2,3,3-tetrafluorobutane, 1,5-bis {(meth) acryloyloxy} -2,2,3,3,4,4-hexafluoropentane, 1,6-bis {(meta ) Acryloyloxy} -2,2,3,3,4,4,5,5-octafluorohexane, 1,7-bis {(meth) acryloyloxy} -2,2,3,3,4,4, 5,5,6,6-decafluoroheptane, 1,8-bis {(meth) acryloyloxy} -2,2,3,3,4,4,5,5,6,6,7,7-dodeca Fluorooctane, 1,9-bis {(meth) acrylo Ruoxy} -2,2,3,3,4,4,5,5,6,6,7,7,8,8-tetradecafluorononane, 1,10-bis {(meth) acryloyloxy} -2 , 2,3,3,4,4,5,5,6,6,7,7,8,8,9,9-hexadecafluorodecane, 1,11-bis {(meth) acryloyloxy} -2 , 2, 3, 3, 4, 4, 5, 5, 6, 6, 7, 7, 8, 8, 9, 9, 10, 10-octadecafluoroundecane, 1,12-bis {(meth) acryloyl Oxy} -2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11-eicosafluorododecane, 1, 8-bis {(meth) acryloyloxy} -2,7-dihydroxy-4,4,5,5-tetrafluorooctane, 1,7-bis {( Ta) acryloyloxy} -2,8-dihydroxy-4,4,5,5-tetrafluorooctane, 2,7-bis {(meth) acryloyloxy} -1,8-dihydroxy-4,4,5,5 -Tetrafluorooctane, 1,10-bis {(meth) acryloyloxy} -2,9-dihydroxy-4,4,5,5,6,6,7,7-octafluorodecane, 1,9-bis { (Meth) acryloyloxy} -2,10-dihydroxy-4,4,5,5,6,6,7,7-octafluorodecane, 2,9-bis {(meth) acryloyloxy} -1,10- Dihydroxy-4,4,5,5,6,6,7,7-octafluorodecane, 1,2,7,8-tetrakis {(meth) acryloyloxy} -4,4,5,5-tetrafluorodecane 1, 2, 8 , 9-Tetrakis {(meth) acryloyloxy} -4,4,5,5,6,6-hexafluorononane, 1,2,9,10-tetrakis {(meth) acryloyloxy} -4,4,5 , 5,6,6,7,7-octafluorodecane, 1,2,10,11-tetrakis {(meth) acryloyloxy} -4,4,5,5,6,6,7,7,8, 8-decafluoroundecane, 1,2,11,12-tetrakis {(meth) acryloyloxy} -4,4,5,5,6,6,7,7,8,8,9,9-dodecafluorododecane 1,10-bis (α-fluoroacryloyloxy) -2,9-dihydroxy-4,4,5,5,6,6,7,7-octafluorodecane, 1,9-bis (α-fluoroacryloyl) Oxy) -2,10-dihydroxy-4 , 4,5,5,6,6,7,7-octafluorodecane, 2,9-bis (α-fluoroacryloyloxy) -1,10-dihydroxy-4,4,5,5,6,6 7,7-octafluorodecane, 1,2,9,10-tetrakis (α-fluoroacryloyloxy) -4,4,5,5,6,6,7,7-octafluorodecane, 1,2,11 , 12-tetrakis (α-fluoroacryloyloxy) -4,4,5,5,6,6,7,7,8,8,9,9-dodecafluorododecane and the like. In use, these are used alone or as a mixture.

  These fluorine-containing polyfunctional (meth) acrylic acid esters are produced by a known method. For example, a ring-opening reaction between a corresponding fluorine-containing epoxy compound and (meth) acrylic acid, a corresponding fluorine-containing polyhydric alcohol, or a fluorine-containing (meta) group having a hydroxyl group (hydroxyl group) obtained as an intermediate by the ring-opening reaction. ) Manufactured by esterification reaction of acrylic acid ester and (meth) acrylic acid chloride.

  In addition, the (a) fluorine-containing reactive polymer that is soluble in the solvent and has a polymerizable double bond has a main chain derived from the fluorine-containing ethylenic monomer and has a reactive group for crosslinking and curing. is there. As the solvent, ester solvents such as ethyl acetate and propyl acetate, ketone solvents such as methyl ethyl ketone and methyl isobutyl ketone, alcohol solvents such as isopropyl alcohol and 2-butanol are preferable. Examples of the reactive group include a (meth) acryloyloxy group, an α-fluoroacryloyloxy group, and an epoxy group. Such a fluorine-containing reactive polymer that is soluble in a solvent and has a polymerizable double bond has a high molecular weight, so it has good film forming properties while containing fluorine, and is crosslinked and cured using reactive groups after film formation. By doing so, a solvent-insoluble cured film can be obtained.

  The (a) fluorine-containing reactive polymer that is soluble in a solvent and has a polymerizable double bond has a group content of a polymerizable double bond of usually 1 to 20% by mass, preferably 5 to 15% by mass, Moreover, mass (weight) average molecular weight is 500-1,000,000 normally, Preferably it is 1,000-500,000, More preferably, it is 2,000-200,000. As such a fluorine-containing reactive polymer, known fluorine-containing reactive polymers (for example, those disclosed in the republished patent WO02 / 018457) are used.

  The content (ratio) of the fluorine-containing compound having (c1) film-forming properties and having a polymerizable double bond is 40 to 40 in the total amount (solid content) with (c2) modified hollow silica fine particles described later. It is 80 mass%, and it is preferable that it is 40-60 mass%. When the content of the fluorine-containing compound is less than 40% by mass, the strength and hardness of the cured film tend to decrease, and the scratch resistance and abrasion resistance of the film surface are insufficient. On the other hand, when the content is more than 80% by mass, the content of the modified hollow silica fine particles is relatively reduced, the overall balance is deteriorated, the scratch resistance and wear resistance of the coating surface are insufficient, and the reflectance of the coating is reduced. Also grows.

Next, (c2) modified hollow silica fine particles will be described.
The hollow silica fine particles are fine particles in which silica (silicon dioxide, SiO ₂ ) is formed in a substantially spherical shape and has a hollow portion in the outer shell, and the average particle diameter is about 10 to 100 nm. The thickness of the outer shell is about 1 to 60 nm, the porosity of the hollow portion is 40 to 45%, and the refractive index is a low refractive index of 1.20 to 1.29. Since the hollow portion contains air having a refractive index of 1.0, the coating formed by curing the fluorine-containing curable coating liquid can be reduced in refractive index and reflectance, and silica fine particles. The inorganic fine particles can improve the scratch resistance and wear resistance of the coating. When the void ratio of the hollow portion is less than 40%, the amount of air in the hollow portion is reduced, and it becomes impossible to reduce the refractive index and reflectivity of the coating. On the other hand, when the void ratio of the hollow portion exceeds 45%, it is necessary to make the outer shell thin in order to increase the void ratio, which makes it difficult to manufacture. When the refractive index is higher than 1.29, the refractive index of the cured film is also high, and the antireflection performance is low.

  Furthermore, since the conventional hollow silica fine particles do not have a dense outer shell, they easily adsorb moisture, and if water droplets are left on the film containing the hollow silica fine particles, the moisture is adsorbed and can be visually recognized. A spot (water mark) is made. Since the hollow silica fine particles used in the present embodiment are hydrothermally treated to densify the outer shell, moisture becomes difficult to be adsorbed on the silica surface, so that the water resistance of the coating containing the hollow silica fine particles is improved.

  In addition, since the modified hollow silica fine particles used in the present invention are modified by a silane coupling agent having a polymerizable double bond, an excellent effect that is not found in ordinary silica fine particles or hollow silica fine particles, that is, a fluorine-containing compound. The effect that it is excellent in compatibility with can be expressed. For this reason, when the modified hollow silica fine particles are mixed with a fluorine-containing compound, aggregation of the modified hollow silica fine particles can be suppressed, and a film having no transparency and excellent transparency can be obtained. Further, in the film, the polymerizable double bond of the silane coupling agent and the polymerizable double bond of the fluorine-containing compound are copolymerized (chemically bonded) to form a strong film, so that the film has scratch resistance and abrasion resistance. The sex can be improved dramatically.

（式中、Ｚは（メタ）アクリロイルオキシ基であり、Ｒ^１は炭素数１〜４のアルキレン基であり、Ｒ^２は水素原子、メチル基又はエチル基である。） Furthermore, in order to enhance the effect of modification, (c2) modified hollow silica fine particles are preferably modified with a silane coupling agent having a polymerizable double bond represented by the following chemical formula (1).

(In the formula, Z is a (meth) acryloyloxy group, R ¹ is an alkylene group having 1 to 4 carbon atoms, and R ² is a hydrogen atom, a methyl group or an ethyl group.)

The (c2) modified hollow silica fine particles will be further described. The modified hollow silica fine particles are obtained by surface-treating the surface of the hollow silica fine particles having an average particle diameter of 5 to 100 nm and a specific surface area of 50 to 1000 m ² / g with a silane coupling agent. It is manufactured by. Specifically, an organosilyl group (monoorganosilyl group, diorganosilyl group or triorganosilyl group) is formed on the surface of the hollow silica fine particles by a hydrolysis reaction between the silanol groups on the surface of the hollow silica fine particles and the silane coupling agent. In addition to bonding, the surface has an organic group directly bonded to a large number of silicon atoms.

  Further, since the hollow portion (cavity) is larger than the conventional hollow silica fine particles, the refractive index of the cured film is 1 by combining the modified hollow silica fine particles having a low refractive index and the fluorine-containing compound having a high fluorine content. .28 to 1.32, which can realize a lower refractive index and lower reflectance than conventional cured films.

  The content of the (c2) modified hollow silica fine particles is 20 to 60% by mass and preferably 40 to 60% by mass in the total amount with the (c1) fluorine-containing compound. When this content is less than 20% by mass, the content of the modified hollow silica fine particles is small, and it becomes impossible to reduce the refractive index and reflectivity of the resulting film, and to provide scratch resistance and abrasion resistance. Lack of sex. On the other hand, when it exceeds 60% by mass, the excessive modified hollow silica fine particles cannot react with the fluorine-containing compound, and the modified hollow silica fine particles remain, and on the contrary, the film surface lacks scratch resistance and wear resistance. As a result of the copolymerization and bonding of the (meth) acryloyloxy group contained in the silane coupling agent of the modified hollow silica fine particles and the polymerizable double bond of the fluorine-containing compound, the function of the modified hollow silica fine particles and the fluorine-containing compound are obtained. Are expressed synergistically and continuously.

Specifically, the hollow silica fine particles used as the raw material of the modified hollow silica fine particles can be produced through the following first to fifth steps.
That is, in the first step, an aqueous solution of silicate or acidic silicic acid solution and an alkali-soluble inorganic compound aqueous solution are added to an alkaline aqueous solution having a pH of 10 or higher, or an alkaline aqueous solution having a pH of 10 or higher in which seed particles are dispersed as required. At the same time, a core particle dispersion in which the molar ratio of silica and inorganic compound other than silica is in the range of 0.3 to 1.0 is prepared.

  Subsequently, in the second step, a silica source is added to the core particle dispersion to form a first silica coating layer on the core particle surface. Next, in the third step, an acid is added to the dispersion liquid on which the first silica coating layer is formed to remove part or all of the elements constituting the core particles. Next, in the fourth step, an aqueous alkali solution and an organosilicon compound or a partial hydrolyzate thereof are added to the dispersion of the hollow silica fine particles obtained in the third step, and the second silica coating layer is added to the hollow silica fine particles. Form.

  Further, it is preferable to add a fifth step of hydrothermally treating the hollow silica fine particle dispersion obtained in the fourth step. Hydrothermal treatment is a modification treatment of hollow silica fine particles performed in the presence of high-temperature water. By this hydrothermal treatment, hollow silica fine particles having a dense outer shell can be obtained. By densifying the outer shell, it becomes difficult for moisture to be adsorbed, and the water resistance of the hollow silica fine particles can be improved. As a result, the modified hollow silica fine particles obtained by modifying the hollow silica fine particles and the fluorine-containing compound It is possible to improve the water resistance of a film obtained by curing a fluorine-containing curable coating liquid in combination. Further, by densifying the outer shell, the thickness of the outer shell can be reduced and the porosity of the hollow portion can be increased.

  Moreover, as conditions for the hydrothermal treatment, the treatment temperature is preferably 200 to 280 ° C., the treatment time is preferably 5 to 20 hours, and more preferably 10 to 20 hours. When the treatment temperature is less than 200 ° C., the hydrothermal treatment is not sufficiently performed, and the outer shell of the hollow silica fine particles tends to be insufficiently densified. On the other hand, when the temperature exceeds 280 ° C., the outer shell of the hollow silica fine particles is not further densified, and the hollow silica fine particles are aggregated. In addition, when the treatment time is less than 5 hours, the outer shell of the hollow silica fine particles cannot be sufficiently densified, which is not preferable. On the other hand, when the time exceeds 20 hours, the outer shell of the hollow silica fine particles is not further densified, and the productivity of the hollow silica fine particles is lowered, which is industrially undesirable.

  The modification of the hollow silica fine particles with the silane coupling agent is performed as follows. For example, a silane coupling agent is added to and mixed with hollow silica fine particles dispersed in an organic solvent, and distilled water is added to this mixture to carry out ordinary hydrolysis and condensation reactions. The solid content of the hollow silica fine particles is preferably 1 to 70% by mass, and more preferably 15 to 40% by mass. In this case, the order of adding the silane coupling agent is not particularly limited. The content of distilled water to be mixed is desirably 3 to 5 times by mass with respect to the silane coupling agent. The operation for carrying out the hydrolysis reaction and the condensation reaction is carried out by refluxing the organic solvent for 3 to 7 hours under normal pressure with stirring.

  The production method of the modified hollow silica fine particles will be further described. An organosol having a silica concentration of 1 to 70% by mass is prepared, and a silane coupling agent and an alkali catalyst are added within a range of 30 to 300 ° C. A silane coupling agent is allowed to react with the hollow silica fine particles under a condition where the water content is 0.1 to 50% by mass. In the method for producing an organosol, a silica sol composed of hollow silica fine particles prepared using water as a dispersion medium is solvent-substituted to obtain an organosol.

  Examples of the silane coupling agent include γ-methacryloyloxypropyltrimethoxysilane, γ-acryloyloxypropyltrimethoxysilane, γ-methacryloyloxypropyltriethoxysilane, and γ-acryloyloxypropyltriethoxysilane. Content of a silane coupling agent is 1-50 mass parts normally with respect to 100 mass parts of hollow silica fine particles, Preferably it is 3-25 mass parts. If the content is less than 1 part by mass, the proportion of untreated hollow silica fine particles increases, and the yield of the modified hollow silica fine particles is undesirably reduced. If the content exceeds 50 parts by mass, the silane coupling agent becomes excessive and excessive. The silane coupling agent remains undesirably.

  The organic solvent is not particularly limited as long as it does not adversely affect the surface coating of the hollow silica fine particles by the silane coupling agent. As examples of such organic solvents, alcohols, glycols, esters, ketones, nitrogen compounds, aromatics, and the like can be used. Specific examples of organic solvents include alcohols such as methanol, isopropyl alcohol, ethylene glycol, butanol and ethylene glycol monopropyl ether, ketones such as methyl ethyl ketone and methyl isobutyl ketone, aromatic hydrocarbons such as toluene and xylene, dimethyl Amides such as formamide, dimethylacetamide, N-methylpyrrolidone and the like can be mentioned. Of these, alcohols such as methanol, ethanol and isopropyl alcohol are preferred. An organic solvent can be used individually or in mixture of 2 or more types. The resulting modified hollow silica fine particles can be isolated by centrifugation or the like, but can also be subjected to a subsequent step while the organic solvent is present.

  The kind of the alkali catalyst is not particularly limited, and ammonia, an alkali metal hydroxide, an amine compound, and the like are preferably used. These alkali catalysts may be added in the form of an aqueous solution. The content of the alkali catalyst is not particularly limited, and is preferably 20 to 2000 ppm based on the organosol in which the hollow silica fine particles are dispersed, although it depends on the type of the alkali catalyst. When this content is less than 20 ppm, the reaction of the silane compound on the surface of the hollow silica fine particles may not sufficiently proceed. On the other hand, when it exceeds 2000 ppm, the dispersibility when the hollow silica fine particles are dispersed in the fluorine-containing compound may be deteriorated due to the excess alkali catalyst, and there is a problem that the alkali catalyst remains in the composition. There are things to do.

  The water content in the reaction solution is preferably 10 to 50% by mass, more preferably 10 to 40% by mass, based on the silica content. If the moisture content is in the range of 10 to 50% by mass, the surface of the hollow silica fine particles reacts with the silane coupling agent to effect surface treatment effectively. When the water content is less than 10% by mass, the surface treatment efficiency is low and stable surface treatment is not performed, and when it exceeds 50% by mass, the tendency of the silane coupling agents to react with each other increases, resulting in the surface treatment of the hollow silica fine particles. It becomes insufficient.

  The reaction temperature when the silane coupling agent is reacted with the hollow silica fine particles is preferably in the temperature range of 30 ° C. to less than the boiling point of the organic solvent, and 30 to 300 ° C. considering the case where the reaction is performed using a pressure vessel. It is preferable that When the reaction temperature is less than 30 ° C., the reaction rate is slow and not practical. On the other hand, if it exceeds 300 ° C., it exceeds the boiling point of the solvent of the organosol, and the evaporation of the solvent may cause an increase in the water content, which is not preferable.

  Moreover, 0.1-100 hours are preferable and, as for reaction time when making a silane coupling agent react with a hollow silica fine particle, 3-30 hours are more preferable. When the reaction time is shorter than 0.1 hour, the reaction may not proceed sufficiently, which is not practical. On the other hand, when the time is longer than 100 hours, the yield and the like are not improved, and further continuation of the reaction is not preferable. The hollow silica fine particles modified by the surface treatment may be further substituted with an organic solvent by the same method as described above, if necessary.

  The average particle diameter of the modified hollow silica fine particles is 10 to 100 nm, and preferably 30 to 80 nm. Modified hollow silica fine particles having an average particle diameter in this range can form a transparent film. It is difficult to produce modified hollow silica fine particles having an average particle size of less than 10 nm. On the other hand, when the thickness exceeds 100 nm, light scattering is increased, and reflection is increased in the thin film, so that the antireflection function cannot be exhibited.

The specific surface area of the modified hollow silica fine particles is preferably 50~1000m ² / g for obtaining the dispersibility and stability of the modified hollow silica fine particles during or coalescing solvent, 50 to 200 m ² / g is more preferable. When the specific surface area is less than 50 m ² / g, it is difficult to obtain modified hollow silica fine particles having a low refractive index. On the other hand, when it exceeds 1000 m ² / g, the dispersion stability of the modified hollow silica fine particles is lowered, which is not desirable.

  In the modified hollow silica fine particles, the amount of the silane coupling agent bonded to the hollow silica fine particles by the modification treatment can be easily known by a thermal mass measurement method (TG). The thermogravimetry analysis is a method in which a change in mass of a sample due to an increase (or decrease) in the ambient temperature of the sample is measured with respect to temperature. The mass change curve with respect to the temperature change is called a TG curve.

  For the modified hollow silica fine particles, thermal mass measurement is performed in a temperature range of 200 to 500 ° C., but for example, a decrease in thermal mass when the temperature is raised from room temperature to 500 ° C. at a rate of temperature increase of 10 ° C./min is preferable. It is 2-10 mass%, More preferably, it is 3-10 mass%. In a film formed from a fluorine-containing curable coating liquid formed by blending modified hollow silica fine particles having a thermal mass reduction of less than 2% by mass, whitening occurs, and both scratch resistance and wear resistance are insufficient. On the other hand, when the thermal mass decrease exceeds 10% by mass, the reaction between particles is likely to occur, so that the stability as the sol of the modified hollow silica fine particles and the stability as the fluorine-containing cured coating liquid are unfavorable. .

  The water resistance of a cured film can be evaluated by the reflectance of the film. In a film having no water resistance, when water droplets are left on the film for 30 minutes, moisture is adsorbed and the refractive index increases, resulting in an increase in the reflectance of light on the film surface. In a film made of a fluorine-containing curable coating solution obtained by using a hydrosilicic hollow silica fine particle, even when a water droplet is left on the film for 30 minutes, the change in light reflectance on the film surface before and after being left is 0 .. 3% or less.

（式中、Ｘ及びＹは（メタ）アクリロイルオキシ基又は水酸基のいずれかであり、少なくとも一方は（メタ）アクリロイルオキシ基である。） In addition to the (c1) fluorine-containing compound having film-forming properties and the (c2) modified hollow silica fine particles, the (C) low refractive index layer further has the following chemical formula (2). It is preferable to contain the fluorine-containing (meth) acrylic acid ester shown by these.

(In the formula, X and Y are either a (meth) acryloyloxy group or a hydroxyl group, and at least one is a (meth) acryloyloxy group.)

  Although the above-mentioned fluorine-containing (meth) acrylic acid ester itself does not exhibit film-forming properties, it has an affinity for the fluorine-containing compound having the film-forming property (c1) and does not deteriorate the film-forming properties. Is. For this reason, the fluorine-containing curable coating liquid can exhibit excellent film forming properties. Moreover, the fluorine-containing (meth) acrylic acid ester represented by the chemical formula (2) having no film-forming property is a component that can exhibit high antifouling properties. Furthermore, since the fluorine-containing (meth) acrylic acid ester has a polymerizable double bond, it has the film-forming property, and undergoes a copolymerization reaction with a fluorine-containing compound having a polymerizable double bond to form a cured film.

Such fluorine-containing (meth) acrylic acid ester has a fluoroalkyl group having 10 carbon atoms having a trifluoromethyl group (CF _3- ) at its terminal, and this fluorine-containing (meth) acrylic acid ester is a small amount. A trifluoromethyl group is oriented on the surface. In particular, the trifluoromethyl group is sufficiently oriented on the surface even in a film made of a fluorine-containing compound having a film forming property and a high fluorine content having a polymerizable double bond. Therefore, the obtained fluorine-containing cured film can exhibit properties such as antifouling property and low refractive index. On the other hand, in the fluorine-containing (meth) acrylic acid ester having a fluoroalkyl group having 9 or less carbon atoms, the terminal trifluoromethyl group is not sufficiently oriented on the surface, and the effect cannot be obtained. On the other hand, fluorine-containing (meth) acrylic acid esters having a fluoroalkyl group having 11 or more carbon atoms are difficult to produce and obtain. In other words, only fluorine-containing (meth) acrylate having a C10 fluoroalkyl group exhibits a specific function compared to other fluorine-containing (meth) acrylates having fluoroalkyl groups of other chain lengths. It can be done.

  As the fluorine-containing (meth) acrylic acid ester represented by the chemical formula (2), specifically, 1- (meth) acryloyloxy-2-hydroxy-4,4,5,5,6,6,7,7 , 8,8,9,9,10,10,11,11,12,12,13,13,13-heneicosafluorotridecane, 2- (meth) acryloyloxy-1-hydroxy-4,4 5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,13,13,13-heneicosafluorotridecane and 1,2-bis (Meth) acryloyloxy-4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,13,13,13-heneico Examples include safluorotridecane. These fluorine-containing (meth) acrylic acid esters can be used alone or as a mixture.

  Moreover, content of this fluorine-containing (meth) acrylic acid ester is 0.5-30 mass% with respect to the total amount of the said (c1) fluorine-containing compound and (c2) modified hollow silica fine particles. preferable. When this content is less than 0.5% by mass, the antifouling property of the cured film surface is lowered, and when it exceeds 30% by mass, it tends to be difficult to obtain a transparent, uniform and good cured film. is there.

  In addition, a solvent may be contained in the fluorine-containing curable coating liquid as long as the reaction is not inhibited for the purpose of adjusting the viscosity of the coating liquid and surface leveling after coating. Examples of the solvent include alcohol solvents such as methanol, ethanol, isopropanol, 2-butanol and isobutanol, and ketone solvents such as methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone. Further, in the fluorine-containing curable coating liquid, for the purpose of adjusting the fluorine content, a polyfunctional (meth) acrylic acid ester not containing fluorine, for example, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (Meth) acrylate or the like can be blended at a ratio of 60% by mass or less. When this content exceeds 60% by mass, the refractive index of the film is increased, which is not preferable.

  The cured film is obtained by polymerizing and curing the fluorine-containing curable coating liquid with a high energy beam such as an electron beam, or polymerizing and curing the fluorine-containing curable coating liquid in the presence of a thermal decomposition type polymerization initiator or a photopolymerization initiator. Can be obtained. Among these, a method of applying a fluorine-containing curable coating liquid containing a photopolymerization initiator to the surface of the substrate and then irradiating it with ultraviolet rays in an inert gas atmosphere is preferable because it is simple and preferable.

  The photopolymerization initiator may be any as long as it has a polymerization initiating ability by ultraviolet irradiation. For example, 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane-1 -One, acetophenone polymerization initiators such as 1- [4- (2-hydroxyethoxy) phenyl] -2-hydroxy-2-methyl-1-propan-1-one, benzoin, 2,2-dimethoxy 1,2 -Benzoin-based polymerization initiators such as diphenylethane-1-one, benzophenone, [4- (methylphenylthio) phenyl] phenylmethanone, 4-hydroxybenzophenone, 4-phenylbenzophenone, 3,3 ′, 4,4 ′ -Benzophenone polymerization initiators such as tetra (t-butylperoxycarbonyl) benzophenone, 2-chlorothio Xanthone, such thioxanthone type polymerization initiators such as 2,4-diethyl thioxanthone, and the like. These photopolymerization initiators can be used alone or as a mixture.

  It is preferable that content of these photoinitiators is 0.1-20 mass% with respect to solid content in a fluorine-containing curable coating liquid. When the content of the photopolymerization initiator is less than 0.1% by mass, the polymerization and curing of the fluorine-containing curable coating liquid is insufficient, and when it exceeds 20% by mass, the refractive index of the film after polymerization and curing is increased. Therefore, it is not preferable. The type of ultraviolet lamp used for ultraviolet irradiation is not particularly limited as long as it is generally used. For example, a low-pressure mercury lamp, a high-pressure mercury lamp, an ultrahigh-pressure mercury lamp, a metal halide lamp, a xenon lamp, or the like is used.

  Moreover, as a condition for ultraviolet irradiation, the irradiation amount is preferably 10 mJ or more, and more preferably 100 mJ or more. The upper limit of the irradiation amount is determined according to a conventional method in this type of ultraviolet irradiation. When the irradiation dose is less than 10 mJ, sufficient hardness cannot be obtained for the film obtained after polymerization and curing. Further, post-curing by ultraviolet irradiation may be performed after the polymerization curing. In order to obtain good polymerization curability, it is preferable to suppress the oxygen concentration at the time of ultraviolet irradiation to 1000 ppm or less by blowing an inert gas such as nitrogen or argon during both polymerization curing and post-curing. The film thickness is preferably 50 to 200 nm. When this film thickness is less than 50 nm or exceeds 200 nm, the antireflection effect is lowered.

（式中におけるＲは、同一又は異なる基であって、アルキル基、ハロゲン化アルキル基、シアノアルキル基、アリール基、ヒドロキシル基、フェニル基、及びフェニルアルキレン基からなる群より選ばれる基を示し、Ｒ^１及びＲ^２は、それぞれ同一又は異なる基で、それぞれフルオロアルキレン基を示すか、それらが一緒になって形成するフルオロアルキレン基を示す） Next, the (D) near-infrared shielding layer used for the other surface of the transparent substrate film will be described.
The near-infrared absorbing dye contained in the (D) near-infrared shielding layer is a diimonium salt containing a sulfonimide represented by the following general formula (3) as an anion component.

(In the formula, R is the same or different group, and represents a group selected from the group consisting of an alkyl group, a halogenated alkyl group, a cyanoalkyl group, an aryl group, a hydroxyl group, a phenyl group, and a phenylalkylene group; R ¹ and R ² are the same or different groups and each represents a fluoroalkylene group or a fluoroalkylene group formed by them together)

（式中におけるｎ及びｎ´は、１〜８の整数を表す） In the general formula (3), R ¹ and R ² of the anion component are each a fluoroalkyl group that may be the same or different, or a fluoroalkylene group that is formed by combining them. There is no particular limitation on the number of fluorine atoms and the number of carbon atoms. Among these, R ¹ and R ² are preferably a C 1-8 perfluoroalkyl group represented by the following general formula (4), and more preferably a C 1-4 perfluoroalkyl group.

(N and n ′ in the formula represent an integer of 1 to 8)

  Preferable specific examples of such anion components include, for example, bis (trifluoromethanesulfone) imide, bis (pentafluoroethanesulfone) imide having the same perfluoroalkanesulfonyl group, and pentafluoroethanesulfone trifluoromethane having different perfluoroalkanesulfonyl groups. Sulfonimide, nonafluoromethanesulfone heptafluoropropanesulfonimide, and the like are mentioned. Among them, bis (trifluoromethanesulfone) imide or bis (perfluoroalkanesulfonyl group is the same and n and n ′ are 1 or 2). Pentafluoroethanesulfone) imide is more preferable in terms of near infrared absorption ability.

（式中におけるｍは、２〜１２の整数を表す）
ここで、ｍは２〜８が好ましく、ｍが３である１，３‐ジスルホニルヘキサフルオロプロピレンイミドが特に好ましい。 Further, another preferred example of R ¹ and R ² in the anion component of the general formula (3) is represented by the following general formula (5), and the number of carbons formed by combining R ¹ and R ² together Examples include 2 to 12 perfluoroalkylene groups. This anion component is preferable in terms of further improving the heat resistance of the near infrared absorbing dye.

(M in the formula represents an integer of 2 to 12)
Here, m is preferably 2 to 8, and 1,3-disulfonylhexafluoropropyleneimide in which m is 3 is particularly preferable.

  R in the general formula (3) is a substituent selected from the group consisting of an alkyl group, a halogenated alkyl group, a cyanoalkyl group, an aryl group, a hydroxyl group, a phenyl group, and a phenylalkylene group, and these are the same. It may or may not be. Among these, an alkyl group having 1 to 8 carbon atoms or a side chain or an alkyl group, a halogenated alkyl group, a cyanoalkyl group or the like is preferable, and a linear alkyl group or a halogenated alkyl group having 2 to 6 carbon atoms is particularly preferable. . Specific examples of the linear alkyl group having 2 to 6 carbon atoms and the halogenated alkyl group include an ethyl group, a 2,2,2-trifluoroethyl group, a 2,2,2-trichloroethyl group, a perfluoroethyl group, Perchloroethyl group, propyl group, 3,3,3-trifluoropropyl group, 3,3,3-trichloropropyl group, perfluoropropyl group, perchloropropyl group, butyl group, 4,4,4-trifluoro Butyl group, 4,4,4-trichlorobutyl group, perfluorobutyl group, perchlorobutyl group, amyl group, 5,5,5-trifluoroamyl group, 5,5,5-trichloroamyl group, perfluoroamyl Group, perchloroamyl group, heptyl group, 6,6,6-trifluoroheptyl group, 6,6,6-trichloroheptyl group, perfluoroheptyl group, park Rohepuchiru group, an isopropyl group, an isobutyl group, etc. isoamyl group.

（式中におけるＡは、炭素数１〜１８の直鎖又は側鎖を有するアルキレン基を表し、環Ｂは置換基を有していてもよいベンゼン環を表す） Moreover, as another preferable example of R of General formula (3), the phenylalkylene group represented by following General formula (6) is preferable, and it is especially preferable that carbon number of this alkylene group is 1-8. In the case of such R, the heat resistance of the near-infrared absorbing dye is improved.

(A in the formula represents an alkylene group having a straight chain or a side chain having 1 to 18 carbon atoms, and ring B represents a benzene ring which may have a substituent)

  Further, the phenyl group in the phenylalkylene group of the general formula (6) may not have a substituent, or an alkyl group, a hydroxyl group, a sulfonic acid group, an alkylsulfonic acid group, a cyano group, a nitro group, an amino group. , An alkoxy group, a halogenated alkyl group, and at least one substituent selected from the group consisting of halogens. Of these, a phenyl group having no substituent is preferable, and specifically, a benzyl group, a phenethyl group, a phenylpropylene group, a phenyl-α-methylpropylene group, a phenyl-β-methylpropylene group, a phenylbutylene group, A phenylpentylene group, a phenyloctylene group, etc. are mentioned, A benzyl group and a phenethyl group are the most preferable.

  Moreover, it is preferable that a diimonium salt is a compound which expresses a blue shift effect. By having such a blue shift effect, the light absorption wavelength of the diimonium salt is shifted to the short wavelength side (visible light side), and the transmittance in the near infrared region can be sufficiently suppressed to the short wavelength side. Here, the blue shift effect means an effect of shifting the maximum absorption wavelength to a shorter wavelength side than the conventional diimonium salt because the near-infrared absorbing dye is a diimonium salt represented by the general formula (3). The wavelength range for shifting to the short wavelength side of the blue shift effect is preferably 10 to 60 nm, and more preferably 10 to 30 nm. If the wavelength range shifted to the short wavelength side exceeds 60 nm, the absorption on the long wavelength side is not sufficient, and it is not preferable if the wavelength range is less than 10 nm, because a sufficient blue shift effect cannot be obtained.

  Examples of the diimonium salt having a blue shift effect include bis {bis (trifluoromethanesulfone) imidic acid} -N, N, N ′, N′-tetrakis (p-dibenzylaminophenyl) -p-phenylenediimonium, Bis (1,3-disulfonylhexafluoropropylimidic acid) -N, N, N ′, N′-tetrakis (p-dibenzylaminophenyl) -p-phenylenediimonium, bis {bis (trifluoromethanesulfone) imidic acid } -N, N, N ′, N′-tetrakis {p-di (4-fluoride) benzylaminophenyl} -p-phenylenediimonium, bis (1,3-disulfonylhexafluoropropylimidate) -N, N, N ′, N′-tetrakis {p-di (4-fluoride) benzylaminophenyl} -p-phenyle Diimonium, bis {bis (trifluoromethanesulfonyl) imidic acid} -N, N, N ′, N′-tetrakis {p-di (2,2,2-trifluoroethyl) aminophenyl} -p-phenylenediimonium, bis {Bis (trifluoromethanesulfonyl) imidic acid} -N, N, N ′, N′-tetrakis {p-di (4,4,4-trifluorobutyl) aminophenyl} -p-phenylenediimonium, bis {bis ( Trifluoromethanesulfonyl) imidic acid} -N, N, N ′, N′-tetrakis {p-di (4,4,4-trichlorobutyl) aminophenyl} -p-phenylenediimonium, bis {bis (trifluoromethanesulfonyl) Imido acid} -N, N, N ′, N′-tetrakis {p-di (perfluorobutyl) aminophenyl} -p- Enylene diimmonium, bis (1,3-disulfonylhexafluoropropylimidic acid) -N, N, N ′, N′-tetrakis {p-di (2,2,2-trifluoroethyl) aminophenyl} -p -Phenylenediimonium, bis (1,3-disulfonylhexafluoropropylimidic acid) -N, N, N ', N'-tetrakis {p-di (4,4,4-trifluorobutyl) aminophenyl} -p -Phenylenediimonium, bis (1,3-disulfonylhexafluoropropylimidic acid) -N, N, N ', N'-tetrakis {p-di (4,4,4-trichlorobutyl) aminophenyl} -p- Phenylenediimonium, bis (1,3-disulfonylhexafluoropropylimidic acid) -N, N, N ′, N′-tetrakis {p-di (par Fluorobutyl) aminophenyl} -p-phenylenediimmonium and the like. These diimonium salts can be used alone or in admixture of two or more.

  Although the said diimonium salt can be used independently, it can also be used in combination with another near-infrared absorption pigment | dye suitably. Other near-infrared absorbing dyes are not particularly limited. For example, dyes such as polymethine series, cyanine series, phthalocyanine series, naphthalocyanine series, dithiol metal complex series, naphthoquinone series, anthroquinone series, triphenylmethane series, and aminium series are available. Can be mentioned. Such dyes may be commercially available, for example, NK-5037, NK-5060, NK-5706, NK-8893, NK-8589, NK-8758, NK-9014, NK-9026 (above, ( Manufactured by Hayashibara Biochemical Laboratories Co., Ltd.), e-ex color IR1, e-ex color IR3, e-ex color HA-1, e-ex color 810K (= IR-10A), e-ex color 812K (= IR-12), e Ex color 814K (= IR-14), e ex color 905B, e ex color 907B, e ex color 910B (above, manufactured by Nippon Shokubai Co., Ltd.), PROJET800NP, PROJET830NP, PROJET900NP, PROJET925NP (above, manufactured by Avicia Co., Ltd.) ), SIR-128, SIR 130, SIR-132, SIR-159 (Mitsui Chemicals Co., Ltd.), CIR-1080, CIR-1081 (Nippon Carlit Co., Ltd.), KAYASORBIR-022, KAYASORBIRG-023, KAYASORBIRG-040 ( As described above, Nippon Kayaku Co., Ltd.).

  The method for forming the (D) near-infrared shielding layer on the transparent substrate is not particularly limited, and a method capable of forming it uniformly is preferable. For example, the method of forming the solution containing a near-infrared absorption pigment | dye by the wet coating method is mentioned. When forming a near-infrared shielding layer, it can carry out using the organic binder which melt | dissolved or disperse | distributed the said near-infrared absorption pigment | dye. Examples of the organic binder include polyolefins such as polyethylene and polypropylene; polystyrene compounds such as polystyrene and poly (α-methylstyrene); styrene-butadiene copolymers, styrene-isoprene copolymers, styrene-acrylic acid copolymers, Styrene copolymers such as styrene-acrylic acid ester copolymer, styrene-maleic acid copolymer, styrene-maleic acid ester copolymer; methyl poly (meth) acrylate, poly (meth) ethyl acrylate, Poly (meth) acrylates such as poly (meth) acrylate propyl, poly (meth) acrylate butyl, poly (meth) acrylate cyclohexyl, etc .; polyethers such as polyoxymethylene and polyethylene oxide; polyethylene succinate, polybutylene Adipate, Polylactic acid, polyglycolic acid, polycaprolactone, polyesters such as polyethylene terephthalate; polyurethane, polycarbonate resins, epoxy resins, and the like. These can be used individually or in mixture of 2 or more types.

  The (D) near infrared ray shielding layer may contain other components other than the organic binder as long as the effects of the present invention are not impaired. Other components are not particularly limited, and examples thereof include additives such as polymerization inhibitors, antioxidants, dispersants, surfactants, surface modifiers, light stabilizers, etc. Any solvent can be added as long as it is dried after film formation.

  Further, (D) the thickness of the near infrared shielding layer is preferably about 2 to 20 μm. When the thickness of the near-infrared shielding layer is less than 2 μm, it is difficult to sufficiently develop the near-infrared shielding function, which is not preferable. On the other hand, when the thickness exceeds 20 μm, there is a problem in that the bending resistance of the near-infrared shielding material is lowered, which is not preferable.

  Regarding the (D) near-infrared shielding layer, the transmittance in the near-infrared region of light having a wavelength of 800 to 1000 nm is preferably 40% or less, and more preferably 30% or less. If the near-infrared transmittance exceeds 40%, the near-infrared shielding function cannot be sufficiently provided, and this is not preferable from the viewpoint of causing malfunctions to peripheral devices such as remote control devices.

  The (D) near-infrared shielding layer preferably contains a specific wavelength absorbing dye having a maximum absorption wavelength at a wavelength of 570 to 610 nm in order to cut off a bright line of Ne light emitted from a plasma display on the principle of operation. Such a specific wavelength absorbing dye is not particularly limited, and examples thereof include squarylium-based, azomethine-based, cyanine-based, xanthene-based, azo-based, tetraazaporphyrin-based, pyromethene-based, etc., and squarylium-based, cyanine-based, tetraazaporphyrin-based A system is preferred.

  The (D) near-infrared shielding layer preferably contains a color material for correcting the color tone in order to improve the color purity and contrast of the luminescent color of the display. The color material for color tone correction may be a general dye or pigment having a desired absorption in the visible light region. Examples of the dye include squarylium, azomethine, cyanine, xanthene, azo, and tetraazaporphyrin. Examples of pigments such as pyromethene, azo, isoindolinone, quinacridone, diketopyrrolopyrrole, anthraquinone, dioxazine, etc., which are generally commercially available dyes or pigments may be used. it can.

  The antireflective film of the present embodiment can reduce reflection of a fluorescent lamp or the like coming from the background by bonding to the surface of an electronic image display device such as a cathode ray tube, a plasma display, or a liquid crystal display device. As a result, the visibility can be remarkably improved, so that eyestrain and the like can be reduced.

Hereinafter, the embodiment will be described more specifically with reference to production examples, examples and comparative examples, but the present invention is not limited to these examples. In addition, the part in each example represents a mass part, and% represents mass%.
As shown in FIG. 1, the reduced-reflection near-infrared shielding material for display of this example has an adhesive layer 11, a hard coat layer 12, and a low refractive index layer 13 sequentially on one surface of a transparent substrate film 10. Is formed. Moreover, the near-infrared shielding layer 14 containing a near-infrared absorbing pigment is formed on the other surface of the transparent substrate film 10. The adhesive layer 11, the hard coat layer 12, and the low refractive index layer 13 constitute a reduced reflection layer 15.

(Production Example 1 Preparation of a coating liquid as an adhesive for forming an adhesive layer (hereinafter referred to as an adhesive coating liquid))
(1) Synthesis of Copolyester Resin (A) 100 parts by mass of dimethyl terephthalate, 100 parts by mass of dimethyl isophthalate, 30.3 parts by mass of ethylene glycol, 150 parts by mass of neopentyl glycol, 0.1 part by mass of zinc acetate and trioxide 0.1 part by mass of antimony was charged into a transesterification reaction vessel, heated to 180 ° C. and heated for 4 hours to conduct a transesterification reaction. Thereafter, 5 parts by mass of 5-sodium sulfoisophthalic acid was added, and an esterification reaction was performed at 240 ° C. for 1 hour. Next, the temperature was raised to 250 ° C., the inside of the system was reduced to 1 mmHg, and a polycondensation reaction was carried out for 2 hours to obtain a copolymerized polyester resin (A).

(2) Synthesis of cross-linking agent (B) Charge 300 parts by mass of ion-exchanged water into a flask and heat to 60 ° C. under a nitrogen stream, and add 0.3 part by mass of ammonium persulfate and 0.3 part by mass of sodium hydrogen nitrite. Added. Thereafter, a mixture of 20.2 parts by mass of methyl methacrylate, 21.2 parts by mass of 2-isopropenyl-2-oxazoline, 45.5 parts by mass of polyethylene oxide methacrylic acid and 10.2 parts by mass of acrylamide was dropped over 4 hours. did. Stirring was continued for 1 hour after completion of the dropwise addition to obtain a 25% by mass aqueous dispersion of the crosslinking agent (B).

(3) Preparation of adhesive coating solution 65 parts by mass of a 30% by mass aqueous dispersion of the copolyester resin (A), 40 parts by mass of a 25% by mass aqueous dispersion of the crosslinking agent (B) and ion-exchanged water 450 parts by mass was mixed to obtain an adhesive coating solution.

(Production Example 2, production of transparent substrate film)
(Production Example 2-1, production of transparent substrate film A)
The adhesive coating liquid was applied by a gravure coating method to a surface without an adhesive film of a biaxially stretched polyester film (Teijin DuPont Films, Teijin Tetron Film HB3, thickness 100 μm, refractive index 1.65). When the cross section of the film was observed by SEM, the thickness of the adhesive layer was 15 nm as a dry film thickness.

(Production Example 2-2, Production of Transparent Substrate Film B)
An adhesive coating solution was applied to the surface of the biaxially stretched polyester film used in Production Example 2-1 without an adhesive film by a gravure coating method. When the cross section of the film was observed by SEM, the film thickness of the adhesive layer was 5 nm.

(Production Example 2-3, production of transparent substrate film C)
An adhesive coating solution was applied to the surface of the biaxially stretched polyester film used in Production Example 2-1 without an adhesive film by a gravure coating method. When the cross section of the film was observed by SEM, the film thickness of the adhesive layer was 30 nm.

(Production Example 2-4, Production of Transparent Substrate Film D)
An adhesive coating solution was applied to the surface of the biaxially stretched polyester film used in Production Example 2-1 without an adhesive film by a gravure coating method. When the cross section of the film was observed by SEM, the film thickness of the adhesive layer was 40 nm.

(Production Example 3, preparation of hard coat layer coating solution)
(Production Example 3-1, preparation of hard coat layer coating solution A)
Antimony-doped tin oxide 30 mass% methyl ethyl ketone dispersion (antimony-doped tin oxide average particle size 98 nm, manufactured by Ishihara Sangyo Co., Ltd., SNS-10M) 83 parts by mass, polyfunctional acrylate compound (hexafunctional dipentaerythritol hexaacrylate) And pentafunctional dipentaerythritol pentaacrylate, average functional group number 5.5, Nippon Kayaku Co., Ltd., DPHA) 75 parts by mass and UV radical initiator (Ciba Specialty Chemicals Co., Ltd., Irgacure 184) 5 parts by mass was stirred and mixed to obtain a hard coat layer coating solution A.

(Production Example 3-2, Preparation of Hard Coat Layer Coating Liquid B)
Antimony-doped tin oxide 30 mass% methyl ethyl ketone dispersion (antimony-doped tin oxide average particle size 98 nm, Ishihara Sangyo Co., Ltd., SNS-10M) 73 parts by mass, polyfunctional acrylate compound (hexafunctional dipentaerythritol hexaacrylate) And pentafunctional dipentaerythritol pentaacrylate, average functional group number 5.5, Nippon Kayaku Co., Ltd., DPHA 78 parts by mass and UV radical initiator (Ciba Specialty Chemicals Co., Ltd., Irgacure 184) 5 parts by mass was stirred and mixed to obtain a hard coat layer coating solution B.

(Production Example 3-3, Preparation of Hard Coat Layer Coating Liquid C)
Antimony-doped tin oxide 30 mass% methyl ethyl ketone dispersion (antimony-doped tin oxide average particle size 98 nm, Ishihara Sangyo Co., Ltd., SNS-10M) 57 parts by mass, polyfunctional acrylate compound (hexafunctional dipentaerythritol hexaacrylate) And pentafunctional dipentaerythritol pentaacrylate, average number of functional groups 5.5, Nippon Kayaku Co., Ltd., DPHA) 83 parts by mass and UV radical initiator (Ciba Specialty Chemicals Co., Ltd., Irgacure 184) 5 parts by mass was stirred and mixed to obtain a hard coat layer coating solution C.

(Production Example 4, production of a film having a hard coat layer on the surface)
(Production Example 4-1, Production of Hard Coat Film A)
The hard coat layer coating solution A obtained in Production Example 3-1 is applied onto the adhesive layer of the transparent substrate film A obtained in Production Example 2-1 by a spin coating method so that the dry film thickness is about 5 μm. After coating, a hard coat film was produced by irradiating and curing 400 mJ of ultraviolet rays using an ultraviolet irradiation device (made by Eye Graphics, 120W high pressure mercury lamp). The refractive index of the hard coat layer was 1.64.

(Production Example 4-2, Production of Hard Coat Film B)
Spin coating method with the hard coat layer coating solution A obtained in Production Example 3-1 on the adhesive layer of the transparent substrate film B obtained in Production Example 2-2 so that the dry film thickness is about 5 μm. After coating, a hard coat film was produced by irradiating and curing 400 mJ of ultraviolet rays using an ultraviolet irradiation device (made by Eye Graphics, 120W high pressure mercury lamp). The refractive index of the hard coat layer was 1.64.

(Production Example 4-3, Production of Hard Coat Film C)
The hard coat layer coating solution A obtained in Production Example 3-1 is applied onto the adhesive layer of the transparent substrate film C obtained in Production Example 2-3 by spin coating so that the dry film thickness is about 5 μm. After coating, a hard coat film was produced by irradiating and curing 400 mJ of ultraviolet rays using an ultraviolet irradiation device (120 W high pressure mercury lamp, manufactured by Eye Graphics Co., Ltd.). The refractive index of the hard coat layer was 1.64.

(Production Example 4-4, Production of Hard Coat Film D)
The hard coat layer coating solution A obtained in Production Example 3-1 on the adhesive layer of the transparent substrate film D obtained in Production Example 2-4 is spin-coated so that the dry film thickness is about 5 μm. After coating, a hard coat film was produced by irradiating and curing 400 mJ of ultraviolet rays using an ultraviolet irradiation device (made by Eye Graphics, 120W high pressure mercury lamp). The refractive index of the hard coat layer was 1.64.

(Production Example 4-5, production of hard coat film E)
Spin the hard coat layer coating solution A obtained in Production Example 3-1 on the surface without an adhesive film of the biaxially stretched polyester film used in Production Example 2-1 so that the dry film thickness is about 5 μm. After coating by a coating method, a hard coat film was produced by irradiating and curing 400 mJ of ultraviolet rays using an ultraviolet irradiation device (made by Eye Graphics, 120W high-pressure mercury lamp). The refractive index of the hard coat layer was 1.64.

(Production Example 4-6, Production of Hard Coat Film F)
The hard coat layer coating solution B obtained in Production Example 3-2 on the adhesive layer of the transparent substrate film A obtained in Production Example 2-1 is spin-coated so that the dry film thickness is about 5 μm. After coating, a hard coat film was produced by irradiating and curing 400 mJ of ultraviolet rays using an ultraviolet irradiation device (made by Eye Graphics, 120W high pressure mercury lamp). The refractive index of the hard coat layer was 1.63.

(Production Example 4-7, Production of Hard Coat Film G)
The hard coat layer coating solution C obtained in Production Example 3-3 on the adhesive layer of the transparent substrate film A obtained in Production Example 2-1 is spin-coated so that the dry film thickness is about 5 μm. After coating, a hard coat film was produced by irradiating and curing 400 mJ of ultraviolet rays using an ultraviolet irradiation device (made by Eye Graphics, 120W high pressure mercury lamp). The refractive index of the hard coat layer was 1.60.

(Production Example 5, production of modified hollow silica sol)
(Production Example 5-1, Production of Modified Hollow Silica Sol α)
As a first step, a silica sol having an average particle diameter of 5 nm and a silica (SiO ₂ ) concentration of 20% and pure water were mixed to prepare a reaction mother liquor, which was heated to 80 ° C. The pH of this reaction mother liquor was 10.5, and 1.17% sodium silicate aqueous solution as SiO ₂ and 0.83% sodium aluminate aqueous solution as alumina (Al ₂ O ₃ ) were simultaneously added to the reaction mother liquor. did. Meanwhile, the temperature of the reaction solution was kept at 80 ° C. The pH of the reaction solution rose to 12.5 immediately after the addition of sodium silicate and sodium aluminate and remained almost unchanged thereafter. After completion of the addition, the reaction solution was cooled to room temperature and washed with an ultrafiltration membrane to prepare a SiO ₂ .Al ₂ O ₃ primary particle dispersion (core particle dispersion) having a solid concentration of 20%.

Next, as a second step, this SiO ₂ · Al ₂ O ₃ primary particle dispersion is collected, pure water is added and heated to 98 ° C., and while maintaining this temperature, sodium sulfate having a concentration of 0.5% Was added. Subsequently, an aqueous solution of sodium silicate having a concentration of 1.17% as SiO ₂ and an aqueous solution of sodium aluminate having a concentration of 0.5% as Al ₂ O ₃ were added to form a composite oxide fine particle dispersion (first silica as a core particle). A fine particle dispersion having a coating layer was obtained. And this was wash | cleaned with the ultrafiltration membrane, and it was set as the complex oxide fine particle dispersion liquid of solid content concentration 13%.

  As a third step, pure water was added to the composite oxide fine particle dispersion, and concentrated hydrochloric acid (35.5%) was added dropwise to adjust the pH to 1.0, followed by dealumination. Next, the aluminum salt dissolved in the ultrafiltration membrane was separated while adding 10 L of hydrochloric acid aqueous solution of pH 3 and 5 L of pure water, and washed to obtain an aqueous dispersion of silica-based fine particles (1) having a solid content concentration of 20%. .

As a fourth step, a mixture of an aqueous dispersion of silica-based fine particles (1) having a solid content concentration of 20%, pure water, ethanol and 28% aqueous ammonia is heated to 35 ° C., and then ethyl silicate (SiO 2 ₂ 28%) was added to form a silica coating (second silica coating layer). Subsequently, while adding 5 L of pure water, it was washed with an ultrafiltration membrane to prepare a dispersion of silica-based fine particles (2) having a solid concentration of 20%.

Finally, as a fifth step, the dispersion of silica-based fine particles (2) was hydrothermally treated again at 200 ° C. for 11 hours. Thereafter, it was washed with an ultrafiltration membrane while adding 5 L of pure water to adjust the solid content concentration to 20%. Then, using an ultrafiltration membrane, the dispersion medium of this dispersion was replaced with ethanol to obtain an organosol having a solid content concentration of 20%. This organosol was an organosol in which hollow silica fine particles having an average particle diameter of 60 nm and a specific surface area of 110 m ² / g were dispersed (hereinafter referred to as “hollow silica sol A”).

200 g of the hollow silica sol A (silica solid content concentration 20%) is prepared, and solvent replacement with methanol is performed with an ultrafiltration membrane, and 100 g of organosol having a SiO ₂ content of 20% (the water content is relative to the SiO ₂ content). 0.5%). Thereto, 28% aqueous ammonia solution was added to 100 g of the organosol so as to be 100 ppm as ammonia, and mixed well, and then γ-acryloyloxypropyltrimethoxysilane [trade name: KBM5103, manufactured by Shin-Etsu Chemical Co., Ltd.] 3.6 g was added to prepare a reaction solution. This was heated to 50 ° C. and heated at 50 ° C. for 6 hours with stirring. After completion of the heating, the reaction solution was cooled to room temperature, and further the solvent was replaced with isopropyl alcohol by a rotary evaporator to obtain an organosol composed of coated hollow fine particles having a SiO ₂ concentration of 20%. This organosol has an average particle size of 60 nm, a refractive index of 1.25, a porosity of 40 to 45%, a specific surface area of 130 m ² / g, and a mass reduction ratio by thermal mass measurement (TG) of 3.6%. It was an organosol in which hollow silica fine particles were dispersed (hereinafter referred to as “modified hollow silica sol α”).

The average particle diameter, specific surface area and TG were measured by the following methods.
(Average particle size)
Using a particle size distribution measuring device (PAR-III, manufactured by Otsuka Electronics Co., Ltd.), the average particle size was measured by a dynamic light scattering method using laser light.
(Specific surface area)
A sample obtained by drying 50 ml of sol at 110 ° C. for 20 hours was measured by a nitrogen adsorption method (BET method) using a specific surface area measurement device (manufactured by Yuasa Ionics Co., Ltd., Multisorb 12).
(Differential thermal mass measurement method, TG / DTA)
Differential thermothermal mass simultaneous measurement was performed using a differential thermothermal mass simultaneous measurement apparatus (manufactured by Rigaku Corporation, Thermoplus TG8110). Note that TG represents a thermogravimetry analysis, and DTA represents a differential scanning calorimetry (differential scanning calorimetry). The measurement conditions are a temperature range of room temperature to 500 ° C. under a temperature rise rate of 10 ° C./min in an air atmosphere. In addition, about the sample for differential thermothermal mass simultaneous measurement methods (TG / DTA), after removing the solvent of the organosol prepared as mentioned above, it wash | cleans thoroughly with hexane, and it dries under reduced pressure after removing hexane. It dried with the machine and it used for the measurement as a powder sample.

(Production Example 5-2, Production of Modified Hollow Silica Sol β)
In Production Example 5-1, a dispersion of silica-based fine particles (2) was produced in the same manner as in Production 5-1, except that hydrothermal treatment was performed at 200 ° C. for 1 hour to obtain an organosol having a SiO ₂ concentration of 20%. This organosol was an organosol in which hollow silica fine particles having an average particle diameter of 50 nm and a specific surface area of 120 m ² / g were dispersed (hereinafter referred to as “hollow silica sol B”).

Except for using the hollow silica sol B as a raw material, the same procedure as in Modification Example 5-1 was carried out to obtain an organosol composed of coated hollow fine particles having a SiO ₂ concentration of 20%. In this organosol, modified hollow silica fine particles having an average particle diameter of 50 nm, a refractive index of 1.30, a porosity of 30 to 35%, a specific surface area of 90 m ² / g, and a mass reduction ratio of TG of 3.2% are dispersed. Organosol (hereinafter referred to as “modified hollow silica sol β”). The average particle diameter, specific surface area and TG were measured by the above methods.

(Production Example 5-3, Production of Modified Hollow Silica Sol γ)
Except for using hollow silica sol A as a raw material and changing the content of γ-acryloyloxypropyltrimethoxysilane [trade name: KBM5103, manufactured by Shin-Etsu Chemical Co., Ltd.] to 1.8 g, the same as in Production Example 5-1. An organosol consisting of coated hollow fine particles having a SiO ₂ concentration of 20% was obtained. This organosol has an average particle size of 60 nm, a specific surface area of 109 m ² / g, and a TG mass reduction ratio of 1.4% of hollow silica fine particles dispersed therein (hereinafter referred to as “modified hollow silica sol γ”). )Met.

(Production Example 6, production of fluorine-containing compound having a polymerizable double bond)
In a four-necked flask, 104 parts of perfluoro- (1,1,9,9-tetrahydro-2,5-bisfluoromethyl-3,6-dioxanonenol) and bis (2,2,3,3) , 4,4,5,5,6,6,7,7-dodecafluoroheptanoyl) peroxide 11 parts of 8% perfluorohexane. The hollow portion was purged with nitrogen, and then stirred at 20 ° C. for 24 hours under a nitrogen stream to obtain a highly viscous solid. A solution obtained by dissolving the obtained solid in diethyl ether was poured into perfluorohexane, followed by separation and vacuum drying to obtain a colorless and transparent polymer.

  When this polymer was analyzed by 19F-NMR (nuclear magnetic resonance spectrum), 1H-NMR, and IR (infrared absorption spectrum), it was a fluorine-containing polymer having a hydroxyl group at the end of the side chain consisting of the structural unit of the allyl ether. The number average molecular weight measured by GPC (gel permeation chromatograph) was 72,000, and the mass average molecular weight was 118,000.

The obtained hydroxyl group-containing fluorine-containing allyl ether polymer (5 parts), methyl ethyl ketone (MEK) (43 parts), and pyridine (1 part) were charged into a four-necked flask and cooled to 5 ° C. or lower with ice. Subsequently, 1 part of α-fluoroacrylic acid fluoride dissolved in 9 parts of MEK was added dropwise over 10 minutes while stirring under a nitrogen stream. And the solution of the fluorine-containing reactive polymer was obtained as a fluorine-containing compound having a polymerizable double bond.
The obtained MEK solution had a solid content of 13%. As a result of analysis by 19F-NMR, the α-fluoroacryloyl group introduction rate was 40 mol%.

(Production Example 7, preparation of near-infrared shielding coating liquid)
(Preparation of Production Example 7-1, near-infrared shielding coating solution “NIRA-1”)
As a near-infrared absorbing dye, 5.0 parts by mass of a diimonium salt compound represented by the general formula (3) (product name “CIR-1085F” manufactured by Nippon Carlit Co., Ltd.) and a fluorine-containing phthalocyanine compound (Japan) 2.0 parts by mass of catalyst (product name “IR-10A”), 100 parts by mass of acrylic resin (manufactured by Mitsubishi Rayon Co., Ltd., product name “Dyanal BR-80”) as binder resin, 450 masses of methyl ethyl ketone as solvent And 450 parts by mass of toluene were mixed and stirred to dissolve, and a near-infrared shielding layer coating solution “NIRA-1” was prepared.

(Production Example 7-2, Preparation of Coating Solution “NIRA-2” for Near Infrared Shielding Layer)
As a near-infrared absorbing dye, 5.0 parts by mass of a diimonium salt compound (manufactured by Nippon Carlit Co., Ltd., product name “CIR-1085F”), and a cyanine compound (manufactured by Hayashibara Biochemical Research Institute, Inc., product name “NK-”) 5060 ") 0.5 parts by mass, acrylic resin as a binder resin (Mitsubishi Rayon Co., Ltd., product name" Dyanal BR-80 ") 100 parts by mass, 450 parts by mass of methyl ethyl ketone and 450 parts by mass of toluene as a solvent The mixture was dissolved by stirring to prepare a near-infrared shielding layer coating solution “NIRA-2”.

Example 1
50 parts of the modified hollow silica sol α obtained in Production Example 5-1 in terms of solid content, and 50 parts of the solvent-soluble fluorine-containing reactive polymer (fluorine content 64%) obtained in Production Example 6 in terms of solid content. 1-acryloyloxy-2-hydroxy-4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,13,13, 13 parts of 13-heneicosafluorotridecane (hereinafter abbreviated as DHPA), 2-methyl-1- [4-methylthiophenyl] -2-morpholinopropan-1-one [trade names: Irgacure 907, Ciba 5 parts of Specialty Chemicals Co., Ltd. and 2000 parts of isopropyl alcohol were mixed to obtain a fluorine-containing curable coating liquid.
This fluorine-containing curable coating solution was applied onto the hard coat film A produced in Production Example 4-1 by a spin coat method so that the dry film thickness was about 0.1 μm. At this time, the film-forming property of the fluorine-containing curable coating liquid was good. Then, in a nitrogen atmosphere, ultraviolet rays of 400 mJ were irradiated using an ultraviolet irradiation device (made by Eye Graphics, 120W high-pressure mercury lamp), the fluorine-containing curable coating liquid was cured, and a coating film (cured film) was formed. An anti-reflective film was obtained.
Next, the near-infrared shielding coating solution NIRA-1 is applied to the back surface of the obtained anti-reflection film using a bar coater so as to have a dry film thickness of 8 μm, and then dried at 130 ° C. for 5 minutes. A low-reflection near-infrared shielding material was obtained.
About the obtained low-reflective near-infrared shielding material, reflectance, near-infrared shielding performance, scratch resistance, abrasion resistance, surface resistance, adhesion, measurement of contact angle with water on the film surface, antifouling property, coating The durability of the water resistance, interference fringes and reduced reflection near infrared shielding material was evaluated by the method described below, and the results are shown in Table 1.

(1) Measurement of luminous reflectance Y The spectrophotometer [trade name, manufactured by JASCO Corporation, obtained by roughening the near-infrared shielding layer with sandpaper and painting with black paint to remove the back reflection of the measurement surface. : U-best 560], 5 ° and −5 ° specular reflection spectra of 380 nm to 780 nm were measured. Using the obtained spectral reflectance of 380 nm to 780 nm and the relative spectral distribution of CIE standard illuminant D65, the tristimulus value Y of the object color due to reflection in the XYZ color system defined by JIS Z8701 was calculated.

(2) Evaluation of near-infrared shielding layer performance The near-infrared shielding performance of the low-reflective near-infrared shielding material was measured using a spectrophotometer (manufactured by Shimadzu Corporation, product name “UV-1600PC”) at a wavelength of 820 nm, The near infrared transmittance at 850 nm and 950 nm was evaluated.

(3) Evaluation of scratch resistance A steel wool of # 0000 was fixed to the tip of an eraser abrasion tester manufactured by Honko Seisakusho, and a load of 2.5 N (250 gf) and 1 N (100 gf) was applied to reduce the anti-reflection property. The scratches on the surface after reciprocating and rubbing 10 times on the surface of the infrared shielding material were visually observed, and evaluated according to the following 6 grades A to E.
A: No scratch, A ': 1-3 scratches, B: 4-10 scratches, C: 11-20 scratches, D: 21-30 scratches, E: 31 or more

(4) Evaluation of abrasion resistance At the tip of the eraser abrasion tester manufactured by Honko Seisakusho, Shiranell (manufactured by Kowa Co., Ltd.) is attached and a load of 10.0 N (1000 gf) is applied to reduce the near-reflective near-infrared shielding material. The number of times the surface was rubbed before and after scratching was recorded.

(5) Measurement of surface resistivity value Using a digital insulation meter [manufactured by Toa DKK Co., Ltd., trade name: SM-8220], the surface resistance value of the reduced reflection near-infrared shielding material was measured.

(6) Evaluation of adhesion The surface of the anti-reflection layer was subjected to a cross-cut peeling tape test according to JIS D0202-1998. Using cellophane tape (manufactured by Nichiban Co., Ltd., CT24), the film was adhered to the film and then peeled off. Judgment is represented by the number of squares that do not peel out of 100 squares, and the case where peeling does not occur is 100/100, and the case where peeling completely occurs is represented as 0/100.

(7) Measurement of contact angle The static contact angle (degree) with respect to distilled water of the antireflection layer was measured using a static contact angle meter [trade name: CA-A, manufactured by WA Interface Chemical Co., Ltd.].

(8) Evaluation of antifouling property Marking was performed on the surface of the antireflection layer with a marker [manufactured by Zebra Co., Ltd., trade name: McKee, abbreviated as McKee in Tables 2, 4 and 6]. Thereafter, the antifouling property was evaluated by the following three-stage evaluation.
◎: When there is ink repellency and can be wiped, ○: When there is no ink repellency but can be wiped, △: When there is no ink repellency and cannot be wiped off

(9) Water resistance of the reduced reflection layer After leaving the distilled water to stand for 30 minutes on the surface of the obtained antireflection layer, wipe the moisture with Kimwipe (Wiper S-200, manufactured by Crecia Co., Ltd.) and leave the distilled water to stand. The reflectance difference at a wavelength of 600 nm of light was measured on the front and rear reduced reflection layer surfaces.
○: Reflectance difference is less than 0.3%, Δ: Reflectance difference is 0.3 to 0.5%, and X: Reflectance difference is greater than 0.5%.

(10) Evaluation of interference fringes In order to eliminate the influence of back surface reflection, a sample was prepared by painting the near infrared shielding layer surface with a black paint. When the sample was visually observed using a three-wavelength fluorescent lamp as a light source in a dark room, the intensity of interference fringes was evaluated.
◎: No interference fringes are visible, ○: Weak interference fringes are visible, ×: Strong interference fringes are visible.

(11) Durability of near-infrared shielding layer Durability when the obtained low-reflective near-infrared shielding material was allowed to stand in an environment of 80 ° C. and 95% RH for 48 hours, transmittance at wavelengths of 820 nm, 850 nm, and 950 nm The amount of change was evaluated. When the amount of change before and after the test was less than 3%, it was evaluated as ◯.

(Example 2)
In Example 1, it replaced with the hard coat film A, and produced the reduced reflection near-infrared shielding material like Example 1 except having used the hard coat film B produced by manufacture example 4-2. The evaluation results are shown in Table 1.

(Example 3)
In Example 1, it replaced with the hard coat film A, and produced the reduced reflection near-infrared shielding material like Example 1 except having used the hard coat film C produced by manufacture example 4-3. The evaluation results are shown in Table 1.

Example 4
In Example 1, it replaced with the hard coat film A, and produced the reduced reflection near-infrared shielding material like Example 1 except having used the hard coat film D produced by manufacture example 4-4. The evaluation results are shown in Table 1.

(Comparative Example 1)
In Example 1, it replaced with the hard coat film A, and produced the reduced reflection near-infrared shielding material like Example 1 except having used the hard coat film E produced by manufacture example 4-5. The evaluation results are shown in Table 1.

(Comparative Example 2)
In Example 1, it replaced with the hard coat film A, and produced the reduced reflection near-infrared shielding material like Example 1 except having used the hard coat film F produced by manufacture example 4-6. The evaluation results are shown in Table 1.

表１に示す結果より、実施例１〜４においては、視感度反射率０．５％以下を達成することができた。さらに、耐擦傷性についての評価をＢ〜Ｃに維持することができ、耐磨耗性について７０回以上を達成することができた。また、耐水性に優れた変性中空シリカゾルαを使用しているため、水跡後による反射率差を０．３％未満に抑えることができた。また、接着層の膜厚が５〜３０ｎｍの範囲内であることから、透明基材フィルムに対するハードコート層の密着性を保持しつつ、干渉縞の発生を十分に抑えることができた。一方、比較例１では接着層が設けられていないため、透明基材フィルムに対するハードコート層の密着性が全く不良であり、耐擦傷性や耐磨耗性に関しても弱い結果となった。比較例２では接着層の膜厚が３０ｎｍよりも厚いため、干渉縞が強く見えることが分かった。また、比較例３のように接着層の膜厚が５〜３０ｎｍの範囲であっても、ハードコート層と透明基材フィルムの屈折率差が０．０２よりも大きいため、干渉縞が強く見えることが分かった。いずれの減反射性近赤外線遮断材も、近赤外線は十分に遮蔽しており、かつ耐久性も良好であった。 (Comparative Example 3)
In Example 1, it replaced with the hard coat film A, and produced the reduced reflection near-infrared shielding material like Example 1 except having used the hard coat film G produced by manufacture example 4-7. The evaluation results are shown in Table 1.

From the results shown in Table 1, in Examples 1 to 4, it was possible to achieve a visibility reflectance of 0.5% or less. Furthermore, the evaluation about the scratch resistance could be maintained at B to C, and the wear resistance could be achieved 70 times or more. Moreover, since the modified hollow silica sol α having excellent water resistance was used, the difference in reflectance after water marks could be suppressed to less than 0.3%. Moreover, since the film thickness of the adhesive layer is in the range of 5 to 30 nm, it was possible to sufficiently suppress the occurrence of interference fringes while maintaining the adhesion of the hard coat layer to the transparent substrate film. On the other hand, in Comparative Example 1, since the adhesive layer was not provided, the adhesion of the hard coat layer to the transparent substrate film was completely poor, and the results were weak in terms of scratch resistance and abrasion resistance. In Comparative Example 2, it was found that the interference fringes look strong because the thickness of the adhesive layer is greater than 30 nm. Moreover, even if the film thickness of the adhesive layer is in the range of 5 to 30 nm as in Comparative Example 3, the interference fringes look strong because the refractive index difference between the hard coat layer and the transparent substrate film is larger than 0.02. I understood that. Any of the reduced reflection near-infrared shielding materials sufficiently shielded near-infrared rays and had good durability.

(Example 5)
50 parts of the modified hollow silica sol α obtained in Production Example 5-1 in terms of solid content, and 50 parts of the solvent-soluble fluorine-containing reactive polymer (fluorine content 64%) obtained in Production Example 6 in terms of solid content. Then, 5 parts of Irgacure 907 and 2000 parts of isopropyl alcohol were mixed to obtain a fluorine-containing curable coating liquid. The composition of this fluorine-containing curable coating liquid is shown in Table 2.
This fluorine-containing curable coating solution was applied onto the hard coat film A produced in Production Example 4-1 by a spin coat method so that the dry film thickness was about 0.1 μm. At this time, the film-forming property of the fluorine-containing curable coating liquid was good. Then, in a nitrogen atmosphere, ultraviolet rays of 400 mJ were irradiated using an ultraviolet irradiation device (made by Eye Graphics, 120W high-pressure mercury lamp), the fluorine-containing curable coating liquid was cured, and a coating film (cured film) was formed. An anti-reflective film was obtained.
Next, the near-infrared shielding coating solution NIRA-1 is applied to the back surface of the obtained anti-reflection film using a bar coater so as to have a dry film thickness of 8 μm, and then dried at 130 ° C. for 5 minutes. A low-reflection near-infrared shielding material was obtained.
About the obtained low-reflective near-infrared shielding material, reflectance, near-infrared shielding performance, scratch resistance, abrasion resistance, surface resistance, adhesion, measurement of contact angle with water on the film surface, antifouling property, coating The durability of the water resistance, interference fringes and reduced reflection near-infrared shielding material was evaluated by the method described below, and the results are shown in Table 3.

(Example 6)
A reduced reflection near-infrared shielding material was obtained in the same manner as in Example 1, except that the modified hollow silica sol α was changed to the modified hollow silica sol γ obtained in Production Example 5-3.
About the obtained low-reflective near-infrared shielding material, reflectance, near-infrared shielding performance, scratch resistance, abrasion resistance, surface resistance, adhesion, measurement of contact angle with water on the film surface, antifouling property, coating The durability of the water resistance, interference fringes and reduced reflection near-infrared shielding material was evaluated by the method described below, and the results are shown in Table 3.

(Comparative Example 4)
A reduced reflection near-infrared shielding material was obtained in the same manner as in Example 1 except that the modified hollow silica sol α was changed to the modified hollow silica sol β obtained in Production Example 5-2.
About the obtained low-reflective near-infrared shielding material, reflectance, near-infrared shielding performance, scratch resistance, abrasion resistance, surface resistance, adhesion, measurement of contact angle with water on the film surface, antifouling property, coating The durability of the water resistance, interference fringes and reduced reflection near-infrared shielding material was evaluated by the method described below, and the results are shown in Table 3.

  From the results shown in Tables 2 and 3, in Examples 1 and 5, the scuff resistance evaluation could be maintained at B to C. Furthermore, 70 times or more was able to be achieved about abrasion resistance. Moreover, the visibility reflectance of 0.5% or less could be maintained. Furthermore, in Examples 1 and 6, since DHPA having no film formability was blended, the contact angle could be increased as compared with Example 5, and the antifouling property could be improved. In Examples 1 and 5 and Comparative Example 4, since the modified hollow silica sol α having excellent water resistance was used, the reflectance difference after water marks could be suppressed to less than 0.3%.

  In Example 6, although the modified hollow silica sol γ is modified, the mass reduction rate due to TG is lower than that of the modified hollow silica sol α of Examples 1 and 5, so that the scratch resistance and wear resistance are weak. It was.

On the other hand, in Comparative Example 4, since hollow silica sol β having a high refractive index was used, although the scratch resistance and abrasion resistance were sufficient, the refractive index of the cured film was high and the antireflection performance was higher than that of Examples 1 and 5. The result was inferior. Moreover, since it did not have water resistance, the difference in reflectance due to water marks in the obtained film was 0.5% or more.
Any of the reduced reflection near-infrared shielding materials sufficiently shielded near-infrared rays and had good durability.

(Examples 7 to 8)
In Examples 7 and 8, the fluorine-containing curability was changed by changing the blending ratio of the modified hollow silica sol α obtained in Production Example 5-1 and the fluorine-containing reactive polymer obtained in Production Example 6 as shown in Table 4. A coating solution was obtained. Then, in the same manner as in Example 1, a reduced reflection near-infrared shielding material was obtained.
About the obtained low-reflective near-infrared shielding material, reflectance, near-infrared shielding performance, scratch resistance, abrasion resistance, surface resistance, adhesion, measurement of contact angle with water on the film surface, antifouling property, coating The durability of the water resistance, interference fringes and reduced reflection near infrared shielding material was evaluated by the method described below, and the results are shown in Table 5.

(Comparative Examples 5-7)
In Comparative Examples 5 and 6, the fluorine-containing curability was changed by changing the blending ratio of the modified hollow silica sol α obtained in Production Example 5-1 and the fluorine-containing reactive polymer obtained in Production Example 6 as shown in Table 4. A coating solution was obtained. Then, in the same manner as in Example 1, a reduced reflection near-infrared shielding material was obtained. In Comparative Example 7, a reduced-reflection near-infrared shielding material was produced in the same manner as in Example 1 except that the near-infrared shielding coating liquid NIRA-1 was changed to NIRA-2 in Example 1.

表４及び表５に示した結果から、実施例７から８では視感度反射率０．５％以下を維持することができた。また、実施例７では含フッ素化合物の配合割合が多くなったため、反射率が若干高くなったほか、耐擦傷性及び耐摩耗性共に優れていた。さらに、実施例８では、変性中空シリカゾルαの配合割合が多くなったため、耐擦傷性及び耐摩耗性共に若干弱くなったほかは、反射防止性能が優れていた。 About the obtained low-reflective near-infrared shielding material, reflectance, near-infrared shielding performance, scratch resistance, abrasion resistance, surface resistance, adhesion, measurement of contact angle with water on the film surface, antifouling property, coating The durability of the water resistance, interference fringes and reduced reflection near infrared shielding material was evaluated by the method described below, and the results are shown in Table 5.

From the results shown in Tables 4 and 5, in Examples 7 to 8, the visibility reflectance of 0.5% or less could be maintained. Moreover, in Example 7, since the blending ratio of the fluorine-containing compound was increased, the reflectance was slightly increased, and both scratch resistance and abrasion resistance were excellent. Furthermore, in Example 8, since the blending ratio of the modified hollow silica sol α was increased, the antireflection performance was excellent except that both the scratch resistance and the wear resistance were slightly weakened.

On the other hand, in Comparative Example 5, excess modified hollow silica could not react with the fluorine-containing compound, and no improvement in scratch resistance was observed, and E. Further, in Comparative Example 6, the content of the modified hollow silica was small, and the result was weak because it could not sufficiently contribute to the improvement of scratch resistance. Furthermore, the reflectance was inferior to 1.4% because the content of the modified hollow silica was small.
In Examples 5 to 7 and Comparative Examples 5 to 6, near infrared rays were sufficiently shielded, and durability was also good.

  On the other hand, in Comparative Example 7, the near-infrared shielding material uses a dimonium salt compound having a blue shift effect, but the second near-infrared absorbing dye is not a fluorine-containing phthalocyanine-based metal complex compound. Since it is a cyanine compound, sufficient durability could not be obtained.

  The present invention can be used for antireflection of a display using liquid crystal, plasma, or the like.

Sectional drawing of the low reflective near-infrared shielding material for displays which concerns on one specific Example of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 ... Transparent base film 11 ... Adhesion layer 12 ... Hard-coat layer 13 ... Low refractive index layer

Claims (8)

  In the reduced-reflection near-infrared shielding material for display, wherein a reduced reflection layer is provided on one side of the transparent substrate film, and a near-infrared shielding layer containing a near-infrared absorbing dye is provided on the other side, The antireflection film is formed by laminating a hard coat layer and a low refractive index layer in this order via an adhesive layer on a transparent base film, and an antireflection film having a visibility reflectance of 0.5% or less. The refractive index difference between the transparent substrate film and the hard coat layer is within 0.02, the film thickness of the adhesive layer is 5 to 30 nm, and the low refractive index layer has film-forming properties. And a fluorine-containing compound having a polymerizable double bond, hydrothermally treated, and modified with a silane coupling agent having a polymerizable double bond, the void ratio of the hollow portion being 40 to 45%, Change in average particle size from 10 to 100 nm The content of the fluorine-containing compound in the total amount of the fluorine-containing compound and the modified hollow silica fine particles is 40 to 80% by mass and the content of the modified hollow silica fine particles is 20 to 60% by mass. A low-reflective near-infrared shielding material for displays. When the hard coat layer contains conductive metal oxide fine particles, it has a surface resistivity of 1.0 × 10 ^{8 to} 1.0 × 10 ¹² Ω / □, and the refractive index of the hard coat layer is 1. The reduced reflection near-infrared shielding material for display according to claim 1, which is .6 to 1.7.
The modified hollow silica fine particles have a thermal mass when the hollow silica fine particles are modified with a silane coupling agent represented by the following chemical formula (1) and heated from room temperature to 500 ° C. at a temperature rising rate of 10 ° C./min. The reduced reflection near-infrared shielding material for display according to claim 1 or 2, wherein the reduction is 2 to 10% by mass.

(In the formula, Z is a (meth) acryloyloxy group, R ¹ is an alkylene group having 1 to 4 carbon atoms, and R ² is a hydrogen atom, a methyl group or an ethyl group.) The low refractive index layer further contains a fluorine-containing (meth) acrylic acid ester represented by the following chemical formula (2) having no film-forming property. Item 2. A low-reflection near-infrared shielding material for display according to item.

(In the formula, X and Y are a (meth) acryloyloxy group or a hydroxyl group, and at least one is a (meth) acryloyloxy group.)   The reduced reflective near-infrared shielding material for display according to any one of claims 1 to 4, wherein the transparent base film is a polyester film containing an ultraviolet absorber. The near-infrared absorbing dye is selected from at least two kinds of near-infrared absorbing dyes, at least one of which is a diimonium salt having a sulfonimide represented by the following general formula (3) as an anionic component, and the other is a fluorine-containing phthalocyanine. The reduced reflective near-infrared shielding material for display according to any one of claims 1 to 5, which is a metal complex compound.

(In the formula, R is the same or different group, and represents a group selected from the group consisting of an alkyl group, a halogenated alkyl group, a cyanoalkyl group, an aryl group, a hydroxyl group, a phenyl group, and a phenylalkylene group; R ¹ and R ² are the same or different groups and each represents a fluoroalkylene group or a fluoroalkylene group formed by them together)   7. The reduced reflection near-infrared shielding material for display according to claim 6, wherein the diimonium salt is a compound in which R is a halogenated alkyl group and exhibits a blue shift effect.   An electronic image display obtained by bonding the reduced-reflection near-infrared shielding material for display according to any one of claims 1 to 7 directly on a display screen or on a transparent plate disposed in front of the display screen. apparatus.

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