TW201122077A - Conductive particles with attached insulating particles, method for producing conductive particles with attached insulating particles, anisotropic conductive material, and connection structure - Google Patents

Conductive particles with attached insulating particles, method for producing conductive particles with attached insulating particles, anisotropic conductive material, and connection structure Download PDF

Info

Publication number
TW201122077A
TW201122077A TW099130356A TW99130356A TW201122077A TW 201122077 A TW201122077 A TW 201122077A TW 099130356 A TW099130356 A TW 099130356A TW 99130356 A TW99130356 A TW 99130356A TW 201122077 A TW201122077 A TW 201122077A
Authority
TW
Taiwan
Prior art keywords
particles
conductive
insulating
conductive particles
insulating particles
Prior art date
Application number
TW099130356A
Other languages
Chinese (zh)
Other versions
TWI372779B (en
Inventor
Shinya Uenoyama
Shotaro Kobaru
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Publication of TW201122077A publication Critical patent/TW201122077A/en
Application granted granted Critical
Publication of TWI372779B publication Critical patent/TWI372779B/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R4/00Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation
    • H01R4/04Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation using electrically conductive adhesives
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00Apparatus or processes specially adapted for manufacturing conductors or cables
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/002Inhomogeneous material in general
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00Non-insulated conductors or conductive bodies characterised by their form
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R12/00Structural associations of a plurality of mutually-insulated electrical connecting elements, specially adapted for printed circuits, e.g. printed circuit boards [PCB], flat or ribbon cables, or like generally planar structures, e.g. terminal strips, terminal blocks; Coupling devices specially adapted for printed circuits, flat or ribbon cables, or like generally planar structures; Terminals specially adapted for contact with, or insertion into, printed circuits, flat or ribbon cables, or like generally planar structures
    • H01R12/50Fixed connections
    • H01R12/51Fixed connections for rigid printed circuits or like structures
    • H01R12/52Fixed connections for rigid printed circuits or like structures connecting to other rigid printed circuits or like structures
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/321Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
    • H05K3/323Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives by applying an anisotropic conductive adhesive layer over an array of pads
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/02Fillers; Particles; Fibers; Reinforcement materials
    • H05K2201/0203Fillers and particles
    • H05K2201/0206Materials
    • H05K2201/0224Conductive particles having an insulating coating

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Conductive Materials (AREA)
  • Non-Insulated Conductors (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Wire Bonding (AREA)

Abstract

Disclosed are conductive particles with attached insulating particles wherein detachment of the insulating particles from the surface of the conductive particles is difficult. Further disclosed is a method for producing said conductive particles with attached insulating particles. The conductive particles (1) with attached insulating particles are provided with conductive particles (2) having a conductive layer (5) on the surface (2a), and insulating particles (3) attached to the surface (2a) of the conductive particles (2). The insulating particles (3) have on the surface (3a) hydroxyl groups directly bonded to phosphorus atoms or hydroxyl groups directly bonded to silicon atoms. In the method for producing the conductive particles with attached insulating particles, the insulating particles (3) having on the surface (3a) hydroxyl groups directly bonded to phosphorus atoms or hydroxyl groups directly bonded to silicon atoms are attached to the surface (2a) of the conductive particles (2).

Description

201122077 六、發明說明: 【發明所屬之技術領域】 本發明例如係、關於-種可用於電極間之電性連接的附帶 絕緣粒子之導電性粒子及其製造方法、以及使用該附帶絕 緣粒子之導電性粒子的異向性導電材料及連接構造體。 【先前技術】 異向!·生導電糊、異向性導電油墨、異向性導電黏接著 片J異向性導電膜、及異向性導電片材等異向性導電材料 廣為人知〗等異向性導電材料係於糊、油墨或樹脂中 /刀散有導電性粒子。上述異向性導電材料例如可用於將破 璃基板及印刷基板等基板之電極間加以電性連接。 作為上述導電性粒子之—例,於下述專利文獻Η中, 揭示有包含表面之至少一部分具有極性基之導電性粒子、 及被覆該導電性趣i I β s , 子之表面之至少一部分的絕緣性材料之 2覆導電,粒子。其中’亦揭示有包含該被覆導電性粒 、及接著劑之異向性導電接著劑組合物。 上述絕緣性材料包含可吸附於導電性粒子之表面之極性 =高分子電解質、及可吸附於該高分子電解質之無機物 物粒子為絕緣粒子。上述被覆導電性粒子例 Θ吏上34南分子電冑質靜電吸㈣導電 面之至少一邱八从 丄 ^ 附而獲得。。使上述無機酸化物粒子進—步靜電吸 =為上述高分子電解質’可列舉:具有石黃酸、硫酸及绩 -夂等之可帶負電之官能基的聚陰離子,以及具有四級鐘基 I5067J.doc 201122077 及胺基等可帶正電之官能基的聚陽離子等。 又,下述專利文獻4中,揭示有包含導電性粒子、及被 覆該導電性粒子之表面之樹脂層的被覆導電性粒子《該樹 脂層係經由來源於三〃井硫醇化合物之結構而鍵結於導電性 粒子。上述樹脂層係厚度為1 〇 nm左右之被膜。 [先前技術文獻] [專利文獻] [專利文獻1]日本專利特開2008-120990號公報 [專利文獻2]日本專利特開2009-135086號公報 [專利文獻3]日本專利特開2009-170414號公報 [專利文獻4]日本專利特開2〇丨〇_丨53265號公報 【發明内容】 [發明所欲解決之問題] 專利文獻1〜3所記載之被覆導電性粒子有絕緣粒子自導 電J1粒子之表面脫離之情形。特別就專利文獻2〜3所記載 之被覆導電性粒子而言’於金屬層為金以外之金屬層之情 形、例如金屬層為Ni層或州層於金屬層之最表面露出之情 形時’絕緣粒子容易自導電性粒子之表面脫離。例如,於 使被覆導電性粒子分散於接著劑中時,絕緣粒子容易自導 電性粒子之表面脫離。 就專利文獻4所記載之被覆導電㈣子而言,導電㈣ 子係由樹脂層而非絕緣粒子所被覆。此種樹脂層與絕緣粒 子相比較,有無法藉由電極間之連接時之愿接加以充分去 除’殘存於導電性粒子與電極之間之㈣。因㈣ 150671.doc 201122077 之導通可靠性容易變低。 本發明之目的在於提供—種絕緣粒子不易自導電性教 之表面脫離的附帶絕緣粒子之導電性粒子及其製造方法子 以及使用該附帶絕緣粒子之導電性粒子的異向性導電 及連接構造體。 材料 本發明之限定性目的特別在於提供一種於金屬層為金以 外之金屬層之情形、例如金屬層為犯層或Ni層於金屬層= 最表面露出之情形時,絕緣粒子不易自導電性粒子之夺 脫離的附帶絕緣粒子之導電性粒子及其製造方法,、面 用該附帶絕緣粒子之導電性粒子的異向性導電材料及使 構造體。 、接 [解決問題之技術手段] 根據本發明之較寬泛之態樣,提供一種附帶絕緣粒子之 導電性粒子,其包含表面具有導電層之導電性粒子及 著於該導電性粒子之表面之絕緣粒子,且該絕緣粒子於表 面具有直接鍵結於磷原子之羥基或直接鍵結於矽原子之羥 基。 ’、&經 於本發明之附帶絕緣粒子之導電性粒 见卞之某特定態樣 下’上述絕緣粒子於表面具有下述式(1丨)所# _ 吓衣示之基或直 接鍵結於矽原子之羥基。 [化1] 150671.doc 201122077 X1I HO—P-I 0 ...式(11) 上述式(11)中,XI表示羥基、烷氧基或碳數卜12之烷 基。 於本發明之附帶絕緣粒子之導電性粒子之其他特定態樣 下,上述式(11)所表示之基為下述式(11A)所表示之基。 [化2] OH HO-P—I Ο ·.·式(11A) 於本發明之附帶絕緣粒子之導電性粒子之另一特定態樣 下,上述絕緣粒子係使用具有直接鍵結於磷原子之羥基之 化合物、或具有直接鍵結於㈣子之㈣之化合物作為材201122077 VI. [Technical Field] The present invention relates to, for example, conductive particles with insulating particles which can be used for electrical connection between electrodes, a method for producing the same, and a conductive method using the same An anisotropic conductive material of a particle and a bonded structure. [Prior Art] Heterogeneous! ·Original conductive paste, anisotropic conductive ink, anisotropic conductive adhesive sheet J anisotropic conductive film, and anisotropic conductive material such as anisotropic conductive material are widely known. Conductive particles are scattered in the ink or resin. The anisotropic conductive material can be used, for example, to electrically connect electrodes between substrates such as a glass substrate and a printed circuit board. As an example of the above-mentioned conductive particles, in the following Patent Document, there is disclosed an insulating layer comprising at least a part of a surface having a polar group and an insulating layer covering at least a part of a surface of the conductive substance i I s s 2 of the material is conductive, particles. Among them, an anisotropic conductive adhesive composition comprising the coated conductive particles and an adhesive is also disclosed. The insulating material contains a polarity that can be adsorbed on the surface of the conductive particles. The polymer electrolyte and the inorganic particles that can be adsorbed to the polymer electrolyte are insulating particles. The above-mentioned coated conductive particles are exemplified by at least one of the 34-molecular electric enamel electrostatically-absorbing (four) conductive surfaces. . The above-mentioned inorganic acid salt particles are subjected to electrostatic adsorption = the above-mentioned polymer electrolyte 'is a polyanion having a negatively chargeable functional group such as rhein, sulfuric acid and bismuth, and a four-stage clock base I5067J .doc 201122077 and polycations such as amine groups which can be positively charged. Further, Patent Document 4 listed below discloses coated conductive particles including conductive particles and a resin layer covering the surface of the conductive particles. The resin layer is bonded via a structure derived from a Sancha thiol compound. It is bonded to conductive particles. The resin layer is a film having a thickness of about 1 〇 nm. [PRIOR ART DOCUMENT] [Patent Document 1] Japanese Patent Laid-Open Publication No. 2008-120990 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2009-135086 (Patent Document 3) Japanese Patent Laid-Open No. 2009-170414 [Patent Document 4] Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. The situation in which the surface is detached. In particular, in the coated conductive particles described in Patent Documents 2 to 3, when the metal layer is a metal layer other than gold, for example, when the metal layer is a Ni layer or a state layer is exposed on the outermost surface of the metal layer, the insulating layer is insulated. The particles are easily detached from the surface of the conductive particles. For example, when the coated conductive particles are dispersed in the adhesive, the insulating particles are easily detached from the surface of the conductive particles. In the coated conductive (four) sub-document described in Patent Document 4, the conductive (tetra) sub-system is covered with a resin layer instead of the insulating particles. Such a resin layer is incapable of being sufficiently removed by the connection between the electrodes as compared with the insulating particles, and remains between the conductive particles and the electrode (4). Because (iv) 150671.doc 201122077, the reliability of the turn-on is likely to be low. It is an object of the present invention to provide conductive particles with insulating particles which are not easily detached from the surface of the conductive material, and a method for producing the same, and an anisotropic conductive and bonded structure using the conductive particles with the insulating particles. Materials The specific object of the present invention is, in particular, to provide a case where the metal layer is a metal layer other than gold, for example, when the metal layer is a layer or the Ni layer is exposed at the outermost surface of the metal layer, the insulating particles are not easily self-conductive particles. Conductive particles with incident insulating particles and a method for producing the same, and an anisotropic conductive material and a structure for using the conductive particles with the insulating particles. [Technical means for solving the problem] According to a broad aspect of the present invention, an electroconductive particle with insulating particles is provided, which comprises conductive particles having a conductive layer on the surface and insulation on the surface of the conductive particles. a particle, and the insulating particle has a hydroxyl group directly bonded to the phosphorus atom or a hydroxyl group directly bonded to the germanium atom on the surface. ', & the conductive particles of the accompanying insulating particles of the present invention are seen in a specific aspect of the above-mentioned insulating particles having the following formula (1丨) on the surface # _ scary basis or direct bonding The hydroxyl group of the atom. 150671.doc 201122077 X1I HO—P-I 0 Formula (11) In the above formula (11), XI represents a hydroxyl group, an alkoxy group or an alkyl group of a carbon number. In another specific aspect of the conductive particles with insulating particles of the present invention, the group represented by the above formula (11) is a group represented by the following formula (11A). OH HO-P—I Ο ··· (11A) In another specific aspect of the conductive particles with insulating particles of the present invention, the insulating particles are used to directly bond to phosphorus atoms. a compound of a hydroxyl group or a compound having a bond (4) directly bonded to (4)

^於本發明之附帶絕緣粒子之導電性粒子之進而其他特定 態樣下’上述絕,㈣子係使許述式⑴所表*之化合物或 具有直接ί建結於石夕原子之經基之化合物作為村料 f化3J 150671.doc 201122077 X1 …式(1) H〇-. — *X2In the other specific aspects of the conductive particles with insulating particles of the present invention, the above-mentioned "fourth" sub-systems are such that the compounds of the formula (1) or the radicals of the formula Compound as a village material f 3J 150671.doc 201122077 X1 ... (1) H〇-. — *X2

O 述式(i)中,xi表示羥基、烷氧基或碳數丨〜12之烷 基’ X2表示含不飽和鍵之有機基。 於本發明之附帶絕緣粒子之導電性粒子之進而其他特定 心樣下,上述式(1)所表示之化合物為下述式(1A)所表示之 化合物。 [化4]In the above formula (i), xi represents a hydroxyl group, an alkoxy group or an alkyl group having a carbon number of 丨~12. X2 represents an organic group having an unsaturated bond. Further, in the other specific sample of the conductive particles with insulating particles of the present invention, the compound represented by the above formula (1) is a compound represented by the following formula (1A). [Chemical 4]

OH …式(1A) HO-p-γ〇OH ...(1A) HO-p-γ〇

I Ο 上述式(1A)中,X2表示含不飽和鍵之有機基。 於本發明之附帶絕緣粒子之導電性粒子之其他特定態樣 下,上述導電性粒子包含基材粒子、及被覆該基材粒子之 表面之導電層。 於本發明之附帶絕緣粒子之導電性粒子之進而其他特定 態樣下,將使附帶絕緣粒子之導電性粒子〇·5 §於23£)(:下分 散於離子交換水50 g中的分散液在1〇(rc下放置1〇小時, 然後自分散液中去除附帶絕緣粒子之導電性粒子而獲得液 體時,所得液體之導電率為2〇 pS/cm以下。 於本發明之附帶絕緣粒子之導電性粒子之其他特定態樣 下’使附帶絕緣粒子之導電性粒子0.03 g於23〇c下分散於 150671.doc 201122077 甲苯i.o g中時,分散液之發熱量係附帶絕緣粒子之導電性 粒子每1 g為1〇 mJ以上。 於本發明之附帶絕緣粒子之導電性粒子之進而其他特定 態樣下,上述導電層之最表面為金層、鎳層或鈀層。 又,根據本發明,提供一種附帶絕緣粒子之導電性粒子 之製造方法,該附帶絕緣粒子之導電性粒子包含表面具有 導電層之導電性粒子、及附著於該導電性粒子之表面:絕 ㈣子的附帶絕緣粒子,該方法係使表面具有直接鍵結於 磷原子之羥基或直接鍵結於矽原子之羥基的絕緣粒子附著 於上述導電性粒子之表面。 本發明之附帶絕緣粒子之導電性粒子之製造方法中’使 用具有直接鍵結於磷原子之羥基之化合物或具有直接鍵结 於石夕原子之經基之化合物,藉此獲得表面具有直接鍵結於 上通蛾原子之經基或直接鍵結於⑦原子之㈣的上述絕緣 :發明之異向性導電材料包含依據本發明而構成之附, 、·-邑緣粒子之導電性粒子及黏合樹脂。 象之連接構造體包含第1連接對象構件、第2連接到 ^構件、及將第1與第2連接對象構件連接之連接部,且兮 =部係由㈣本發明㈣叙”料粒子之導電性粒 生^包含該附帶絕緣粒子之導電性粒子及黏合 向性導電材料所形成。 开 [發明之效果;) 本發明之附帶料粒子之導電性粒子巾,料粒子於表I Ο In the above formula (1A), X2 represents an organic group having an unsaturated bond. In another specific aspect of the conductive particles with insulating particles of the present invention, the conductive particles include a substrate particle and a conductive layer covering a surface of the substrate particle. In still another specific aspect of the conductive particles with insulating particles of the present invention, the conductive particles with insulating particles are §·5 § 23 (): dispersion dispersed in 50 g of ion-exchanged water When the liquid is obtained by removing the conductive particles with the insulating particles from the dispersion to obtain a liquid at 1 Torr (rc), the conductivity of the obtained liquid is 2 〇pS/cm or less. In other specific aspects of the conductive particles, when 0.03 g of conductive particles with insulating particles are dispersed at 23 〇c in 150671.doc 201122077 toluene io g, the heat of the dispersion is conductive particles with insulating particles. Further, in the other specific aspect of the conductive particles with insulating particles of the present invention, the outermost surface of the conductive layer is a gold layer, a nickel layer or a palladium layer. Further, according to the present invention, Provided is a method for producing conductive particles with insulating particles, wherein the conductive particles with insulating particles include conductive particles having a conductive layer on a surface thereof and a surface attached to the conductive particles: (4) The incident insulating particles of the sub-system, wherein the surface has an insulating particle directly bonded to a hydroxyl group of the phosphorus atom or directly bonded to a hydroxyl group of the deuterium atom, and is attached to the surface of the electroconductive particle. In the method for producing a particle, 'the compound having a hydroxyl group directly bonded to a phosphorus atom or a compound having a radical bonded directly to the austenite atom is used, whereby a surface having a surface directly bonded to a moth atom is obtained. Or the above-mentioned insulation which is directly bonded to (a) of 7 atoms: the anisotropic conductive material of the invention comprises the conductive particles and the binder resin which are formed according to the present invention, and the connecting structure includes the first (1) a connection target member, a second connection to the ^ member, and a connection portion connecting the first and second connection target members, and the 兮 = portion is composed of (4) the conductive particles of the material of the present invention (4) The conductive particles of the insulating particles and the adhesive conductive material are formed. [Effects of the Invention] The conductive particle of the incidental particles of the present invention, the particles are in the form

】5〇67 丨.dOC 201122077 面具有直接鍵結於磷原子之羥基或直接鍵結於矽原子之羥 基,絕緣粒子附著於導電性粒子之表面,故絕緣粒子不易 自導電性粒子之表面脫離。因此,於將附帶絕緣粒子之導 電性粒子用於電極間之連接之情形時,即便複數個附帶絕 緣粒子之導電性粒子接觸,絕緣粒子亦存在於鄰接之導電 性粒子間,故不應連接之相鄰電極間不易電性連接。 【實施方式】 以下,藉由對本發明之具體實施形態及實施例加以說明 而明確本發明。 (附帶絕緣粒子之導電性粒子) 圖1係以剖面圖表示本發明之一實施形態之附帶絕緣粒 子之導電性粒子。 如圖1所示,附帶絕緣粒子之導電性粒子丨包含導電性粒 子2、及附著於導電性粒子2之表面2a之複數個絕緣粒子 3 ° 導電性粒子2包含基材粒子4、及被覆該基材粒子4之表 面4a之導電層5。導電性粒子2係基材粒子*之表面钓經導 電層5被覆而成之被覆粒子。因此,導電性粒子2於表面。 具有導電層5。絕緣粒子3係由具有絕緣性之材料形成。 作為基材粒子4,可列舉樹脂粒子、無機粒子、有機無 機混合粒子及金屬粒子等。 基材粒子4較好的是由樹脂形成之樹脂粒子。使用附帶 絕緣粒子之導電性粒子以接電極間時,將附帶絕緣^ 之導電性粒子1配置於電極間之後進行壓接,藉此使導電 150671.doc 201122077 性粒子2壓縮。若基材粒子4為樹脂粒子,則上述壓接時導 電性粒子2容易變形,可增大導電性粒子埃電極之接觸面 積。因此,可提高電極間之導通可靠性。 作為用以形成上述樹脂粒子之樹脂,例如可列舉:聚烯 煙樹脂、丙稀酸系樹脂、盼樹脂、三聚氛胺樹脂、笨脈味 樹脂、膝樹脂、環氧樹脂、不飽和聚g旨樹脂、飽和聚醋樹 脂、聚對苯二甲酸乙二醋、聚硬、聚苯硫趟、聚縮酸、聚 酿亞胺、聚酿胺醯亞胺、聚輕喊鋼及聚謎石風等。用以形成 上述樹脂粒子之樹脂較好的是使丨種或2種以上之具有乙烯 性残和基之聚合性單體聚合而成之聚合物,其原因在於 可容易地將基材粒子4之硬度控制於合適之範圍内。 作為用以形成上述無機粒子之無機才勿,可列舉二氧化石夕 ^碳黑等。作為上述有機無機混合粒子,例如可列舉由經 交聯之烧氧基石夕院基聚合物與丙稀酸系樹脂形成之有機無 機混合粒子等。 、 於基材粒子4為金屬粒子之情形時,作為用以形成該金 屬粒子之金屬,可列舉銀、銅、錄、石夕、金及欽等。 用以形成導電層5之金屬並無特別限定。該金屬例如可 列舉.金、銀、銅、鉑、鈀、鋅、鐵、錫、鉛、鋁、鈷、 钔錦、鉻、欽、錄、叙'、錯、鑛、石夕及該等之合金等。 又,作為上述金屬,可列舉摻錫氧化銦(IT〇, indium % 〇Xlde)及焊錫等。其中,較好的是錫及含錫之合金、鎳、 免、銅或金’其原因在於可進—步降低電極間之連接電 阻。就進一步抑㈣絕緣,粒?之脫離之觀點而言,導電層之 15067丨.doc 201122077 最表面較好的是鎳層或把層,特別好的是錄層。本發明 中,即便於金屬層為金以外之金屬層之情形、例如金屬層 為Ni層或Ni層於金屬層之最表面露出之情形時,絕緣粒子 亦不易自導電性粒子之表面脫離。 導電層5係由一層所形成。導電層亦可由複數層形成。 即導電層亦可具有2層以上之積層構造。於導電層係由 複數層形成之情形時,最外層較好的是金層、鎳層、鈀 層、銅層或含有錫及銀之合金層,更好的是金層。於最外 層為該等較好之導電層之情形時,可進—步降低電極間之 連接電阻。X,於最外層為金層之情形時,可進一步提高 耐姓性。 又,就於使附帶絕緣粒子之導電性粒子〇〇3 §於23充下 分散於甲苯Ug中時’進一步增大分散液之發熱量、或進 -步提高黏合樹脂等中之附帶絕緣粒子之導電性粒子之分 散性的觀點而言,導電層之最表面較好的是金層、錄層或 纪層’特別好的是把層。 —於基材粒子4之表面4 a形成導電層5之方法並無特別限 疋。作為形成導雷夕士、+ 層之方法,例如可列舉:利用盔電解 =之方法、利用電鑛之方法、利用物理蒸鍵之 :金屬粉末或含有金屬料及黏合劑之糊塗佈於基材粒 之二表面 :的方法等。其中’較好的是利用無電解鍍敷 物η…、因在於導電層5之形成簡便。作為上述利用 等方=之方法’可列舉真空蒸鏟、離子電鏟及離子_ 150671.doc 201122077 導電性粒子2之平均粒徑較好的是在〇 5 μ〇ι〜1〇〇 之範 圍内。導電性粒子2之平均粒徑之更好下限為^叫,更好 上限為20㈣。於導電性粒子2之平均粒徑在上述較好範圍 内之清形時,可充分增大導電性粒子2與電極之接觸面 積’且形成導電層5時不易形成凝聚之導電性粒子2。又, 經由導電性粒子2連接之電極間之間隔不會過大,且導電 層5不易自基材粒子4之表面4a剝離。 導電性粒子2之「平均粒徑」表示數量平均粒徑。導電 性粒子2之平均粒㈣藉由制電子顯微鏡或光學顯微鏡 觀察任意50個導電性粒子,並計算平均值而求出。 導電層5之厚度較好的是請Η㈣之範圍内。導電層^ 之厚度之更好下限狀G1㈣’更好上限為Μ㈣。若導電 層5之厚度在上隸好範圍内,料獲得充分之導電性, 且導電性粒子2不會變得過硬,可於電極間之連接時使導 電性粒子2充分變形。 於導電層係由複數層形成之情形時,最外層之導電層之 厚度、特別是最外層為金層之情形的金層之厚度較好二 =0顧〜0.5 _之範圍内。上述最外層之導電層之厚^ 導限為°,1 _。若上述最外層之 之導“之^上述較好㈣内’則可均句地進行最外層 ==又可充分提高㈣性,且可充分降低電極 =二:述最外層為金層之情形的金層之厚 度越潯,則成本越低。 于 導電層5之厚度例如可藉由使用穿透式電子顯微鏡 150671.doc 12 201122077 (ΤΕΜ,Transmission Electron Microscope)觀察導電性粒子 2之剖面而測定。 絕緣粒子3係具有絕緣性之粒子。絕緣粒子3小於導電性 粒子2。 作為構成絕緣粒子3之材料,可列舉絕緣性之樹脂、及 絕緣性之無機物等。作為上述絕緣性之樹脂,可列舉作為 用以形成作為基材粒子4之樹脂粒子的樹脂而列舉之上述 树脂。作為上述絕緣性之無機物,可列舉作為用以形成作 為基材粒子4之無機粒子的無機物而列舉之上述無機物。 絕緣粒子3於表面3a具有直接鍵結於磷原子之羥基(以下 亦稱為P-OH基)、或直接鍵結於矽原子之羥基(以下亦稱為】5〇67 丨.dOC 201122077 The surface has a hydroxyl group directly bonded to a phosphorus atom or a hydroxyl group directly bonded to a ruthenium atom, and the insulating particles adhere to the surface of the conductive particle, so that the insulating particle is less likely to be detached from the surface of the conductive particle. Therefore, when the conductive particles with the insulating particles are used for the connection between the electrodes, even if a plurality of conductive particles with insulating particles are in contact, the insulating particles are present between the adjacent conductive particles, and therefore should not be connected. It is not easy to electrically connect between adjacent electrodes. BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be clarified by describing specific embodiments and examples of the invention. (Electroconductive particles with insulating particles) Fig. 1 is a cross-sectional view showing conductive particles with insulating particles according to an embodiment of the present invention. As shown in FIG. 1 , the conductive particles 附带 with insulating particles include conductive particles 2 and a plurality of insulating particles attached to the surface 2 a of the conductive particles 2 . The conductive particles 2 include the substrate particles 4 and are coated with the conductive particles 2 . The conductive layer 5 of the surface 4a of the substrate particles 4. The surface of the conductive particles 2 based on the substrate particles* is coated with the coated particles coated with the conductive layer 5. Therefore, the conductive particles 2 are on the surface. It has a conductive layer 5. The insulating particles 3 are formed of a material having an insulating property. Examples of the substrate particles 4 include resin particles, inorganic particles, organic inorganic particles, and metal particles. The substrate particles 4 are preferably resin particles formed of a resin. When the conductive particles with the insulating particles are used to connect the electrodes, the conductive particles 1 with the insulating material are placed between the electrodes and then pressed, whereby the conductive particles 2 are compressed. When the substrate particles 4 are resin particles, the conductive particles 2 are easily deformed during the pressure bonding, and the contact area of the conductive particles of the conductive particles can be increased. Therefore, the conduction reliability between the electrodes can be improved. Examples of the resin for forming the resin particles include a polyolefin resin, an acrylic resin, a resin, a trimeric amine resin, a stupid resin, a knee resin, an epoxy resin, and an unsaturated polyg. Resin, saturated polyester resin, polyethylene terephthalate, poly-hard, polyphenylene sulfide, poly-acid, poly-imine, poly-imine, poly-shock steel and polystone stone Wait. The resin for forming the resin particles is preferably a polymer obtained by polymerizing a polymerizable monomer having two or more kinds of ethylene residues and groups, because the substrate particles 4 can be easily used. The hardness is controlled within a suitable range. The inorganic material for forming the above inorganic particles may, for example, be a carbon dioxide black or the like. Examples of the organic-inorganic hybrid particles include organic inorganic mixed particles formed of a crosslinked alumite polymer and an acrylic resin. In the case where the substrate particles 4 are metal particles, examples of the metal for forming the metal particles include silver, copper, ruthenium, zea, gold, and chin. The metal for forming the conductive layer 5 is not particularly limited. Examples of the metal include gold, silver, copper, platinum, palladium, zinc, iron, tin, lead, aluminum, cobalt, ruthenium, chrome, chin, ruthenium, ruthenium, ruthenium, ore, and the like. Alloys, etc. Further, examples of the metal include tin-doped indium oxide (IT〇, indium % 〇Xlde), and solder. Among them, tin and tin-containing alloys, nickel, copper, or gold are preferred because the connection resistance between the electrodes can be further reduced. Further to suppress (four) insulation, grain? From the point of view of the detachment, the conductive layer of 15067 丨.doc 201122077 is preferably a nickel layer or a layer, and particularly preferably a recording layer. In the present invention, even when the metal layer is a metal layer other than gold, for example, when the metal layer is a Ni layer or a Ni layer is exposed on the outermost surface of the metal layer, the insulating particles are less likely to be detached from the surface of the conductive particles. The conductive layer 5 is formed of one layer. The conductive layer may also be formed of a plurality of layers. That is, the conductive layer may have a laminated structure of two or more layers. In the case where the conductive layer is formed of a plurality of layers, the outermost layer is preferably a gold layer, a nickel layer, a palladium layer, a copper layer or an alloy layer containing tin and silver, more preferably a gold layer. In the case where the outermost layer is such a preferred conductive layer, the connection resistance between the electrodes can be further reduced. X, when the outermost layer is a gold layer, can further improve the resistance to the surname. In addition, when the conductive particles 附带3 of the insulating particles are dispersed in the toluene Ug, the heat generation amount of the dispersion is further increased, or the incident insulating particles in the adhesive resin or the like are further increased. From the viewpoint of the dispersibility of the conductive particles, the outermost surface of the conductive layer is preferably a gold layer, a recording layer or a layer. The method of forming the conductive layer 5 on the surface 4a of the substrate particles 4 is not particularly limited. As a method of forming the Lewis and the + layer, for example, a method of using a helmet electrolysis method, a method using an electric ore, and a physical vapor bond: a metal powder or a paste containing a metal material and a binder is applied to the substrate pellet. The second surface: the method and so on. Among them, it is preferable to use the electroless plating material η... because the formation of the electroconductive layer 5 is simple. As a method of using the above-mentioned method, the vacuum shovel, the ion shovel, and the ion are exemplified. _ 150671.doc 201122077 The average particle diameter of the conductive particles 2 is preferably in the range of 〇5 μ〇ι~1〇〇. . The lower limit of the average particle diameter of the electroconductive particle 2 is ^, and the upper limit is preferably 20 (four). When the average particle diameter of the conductive particles 2 is in the above-described preferable range, the contact area of the conductive particles 2 and the electrode can be sufficiently increased, and the conductive particles 2 which are less likely to form agglomeration when the conductive layer 5 is formed. Further, the interval between the electrodes connected via the conductive particles 2 is not excessively large, and the conductive layer 5 is not easily peeled off from the surface 4a of the substrate particles 4. The "average particle diameter" of the conductive particles 2 means a number average particle diameter. The average particle (4) of the conductive particles 2 was obtained by observing an arbitrary number of 50 conductive particles by an electron microscope or an optical microscope, and calculating an average value. The thickness of the conductive layer 5 is preferably within the range of (4). A better lower limit of the thickness of the conductive layer ^ G1 (four)' is preferably a higher limit of Μ (four). When the thickness of the conductive layer 5 is within the upper range, the material is sufficiently conductive, and the conductive particles 2 are not excessively hard, so that the conductive particles 2 can be sufficiently deformed at the time of connection between the electrodes. In the case where the conductive layer is formed of a plurality of layers, the thickness of the outermost conductive layer, particularly the thickness of the gold layer in the case where the outermost layer is a gold layer, is preferably in the range of =0 to 0.5 _. The thickness of the outermost conductive layer is limited to °, 1 _. If the outermost layer of the guide "is better than the above (4), then the outermost layer == can be fully improved (four), and the electrode can be sufficiently reduced = two: the outermost layer is the gold layer The thickness of the gold layer is lower, and the cost is lower. The thickness of the conductive layer 5 can be measured, for example, by observing the cross section of the conductive particles 2 using a transmission electron microscope 150671.doc 12 201122077 (Transmission Electron Microscope). Insulating particles 3 are insulating particles 3. The insulating particles 3 are smaller than the conductive particles 2. Examples of the material constituting the insulating particles 3 include an insulating resin and an insulating inorganic material. The above-mentioned resin is exemplified as the resin for forming the resin particles as the substrate particles 4. The inorganic material to be used as the inorganic material for forming the inorganic particles as the substrate particles 4 is exemplified as the insulating inorganic material. The particle 3 has a hydroxyl group directly bonded to a phosphorus atom (hereinafter also referred to as a P-OH group) on the surface 3a, or a hydroxyl group directly bonded to a halogen atom (hereinafter Called

Si-OH基)。其中,絕緣粒子3較好的是於表面化具有上述 P-OH基,其原因在於可進一步提高導電性粒子2與絕緣粒 子3之附著性。 附帶絕緣粒子之導電性粒子㈣如可藉由使表面3&具有 直接鍵結於磷原子之羥基或直接鍵結於矽原子之羥基的絕 緣粒子3附著於導電性粒子2之表面2a而獲得。附帶絕緣粒 子之導電性粒子1中,例如絕緣粒子3藉由上述p_〇H基或 上述Si-OH基而附著於導電性粒子2之表面2a。 絕緣粒子3之表面3a之上述p_〇H基或上述㈣η基對導 電性粒子2之表面2a之導電層5強固地進行化學鍵結。此種 鍵結與僅由凡得瓦力或靜電力所得之鍵結相比,鍵結力極 高。因此,可使導電性粒子2與絕緣粒子3強固地附著,而 可抑制絕緣粒子3自導電性粒子2之表面2a脫離。例如於黏 150671.doc 201122077 合樹脂等中添加附帶絕緣粒子之導電性粒子1進行混練 時’絕緣粒子3不易自導電性粒子2之表面2a脫離《又,於 複數個附帶絕緣粒子之導電性粒子1接觸時,絕緣粒子3不 易因接觸時之衝擊而自導電性粒子2之表面2a脫離。 又’表面3a具有上述P_OH基或上述Si_〇H基之複數個絕 緣粒子3,彼此之間由於上述p_〇H基或上述8丨_〇11基,不 相互進仃化學鍵結。因此,可使絕緣粒子3非以2層以上而 係以單層之方式附著於導電性粒子2之表面2a。因此,可 獲得粒徑均勻之附帶絕緣粒子之導電性粒子王。 又,絕緣粒子3於表面3a具有上述p_〇H基或上述以_〇1^ 基時’因上述P-〇H基或上述⑴领基,導電層5或電極不 易被腐银。例如絕緣粒子於表面具有含硫原子之基時,有 時會由於含硫原子之基而導致導電層5或電極被腐触。因 絕緣粒子3於表面33具有上述P-OH基或上述Si_0H基,故 可抑制導電層5或電極之腐蝕。 邑緣粒子3且於表面3旺具有下述式⑴)所表示之基、或直 H@原子之&基。即’上述表面具有卜⑽基之絕 緣粒子宜為表面具有 一 式(11)所表示之基。此時,絕緣 粒子3更不易自導電性粒子2之表面城離。 [化5] 150671.doc 201122077 X1 ...式(11) Η〇·—p~Si-OH group). Among them, the insulating particles 3 preferably have the above P-OH group in the surface formation because the adhesion between the conductive particles 2 and the insulating particles 3 can be further improved. The conductive particles (4) with insulating particles can be obtained by attaching the surface 3& to the surface 2a of the conductive particles 2 by having the hydroxyl group directly bonded to the phosphorus atom or the insulating particle 3 directly bonded to the hydroxyl group of the germanium atom. In the conductive particles 1 with insulating particles, for example, the insulating particles 3 are adhered to the surface 2a of the conductive particles 2 by the p_〇H group or the Si-OH group. The above p_〇H group or the above (4) η group on the surface 3a of the insulating particles 3 is strongly chemically bonded to the conductive layer 5 on the surface 2a of the conductive particles 2. This bond is extremely high in bonding force compared to a bond obtained only by van der Waals or electrostatic force. Therefore, the conductive particles 2 and the insulating particles 3 can be strongly adhered to each other, and the insulating particles 3 can be prevented from being detached from the surface 2a of the conductive particles 2. For example, when the conductive particles 1 with insulating particles are added to the resin, the insulating particles 3 are not easily detached from the surface 2a of the conductive particles 2, and the conductive particles are attached to the plurality of insulating particles. At the time of contact, the insulating particles 3 are less likely to be detached from the surface 2a of the conductive particles 2 by the impact at the time of contact. Further, the surface 3a has a plurality of insulating particles 3 of the above P_OH group or the above Si_〇H group, and the p_〇H group or the above 8丨_〇11 group are not chemically bonded to each other. Therefore, the insulating particles 3 can be attached to the surface 2a of the conductive particles 2 in a single layer instead of two or more layers. Therefore, a conductive particle king with incident insulating particles having a uniform particle diameter can be obtained. Further, when the insulating particles 3 have the above-mentioned p_〇H group or the above-mentioned _〇1^ group on the surface 3a, the conductive layer 5 or the electrode is not easily sinned by the above P-〇H group or the above (1) collar group. For example, when the insulating particles have a group containing a sulfur atom on the surface, the conductive layer 5 or the electrode may be corroded due to the group containing the sulfur atom. Since the insulating particles 3 have the above P-OH group or the above Si_0H group on the surface 33, corrosion of the conductive layer 5 or the electrode can be suppressed. The rim particle 3 has a group represented by the following formula (1)) or a straight H@ atom & Namely, the insulating particles having the surface (10) on the surface are preferably those having a surface represented by the formula (11). At this time, the insulating particles 3 are less likely to be separated from the surface of the conductive particles 2. [Chemical 5] 150671.doc 201122077 X1 ... (11) Η〇·—p~

I 0 上述式(11)中,X1表示羥基、烷氧基或碳數丨〜12之烷 基。 上述式(11)所表示之基較好的是下述式(11A)所表示之 基。於該情形時,可進一步提高絕緣粒子3對導電性粒子2 之附著性。 [化6]I 0 In the above formula (11), X1 represents a hydroxyl group, an alkoxy group or an alkyl group having a carbon number of 丨12. The group represented by the above formula (11) is preferably a group represented by the following formula (11A). In this case, the adhesion of the insulating particles 3 to the conductive particles 2 can be further improved. [Chemical 6]

OH HO—P--* …式(11A) _ 0 又’上述表面具有Si-OH基之絕緣粒子較好的是於表面 具有下述式(12)所表示之基。下述式(12)所表示之基可相 對較谷易地導入至絕緣粒子3之表面3 a。 [化7] H0-什...綱 _ 22 — 上述式(12)中,z 1及Z2分別表示羥基、烷氧基或碳數 150671.doc -15- 201122077 1〜12之烷基。21與22可相同,亦可不同。21及22較好的 疋刀別為羥基,其原因在於可使絕緣粒子3強固地附著於 導電性粒子2之表面2a。 作為對絕緣粒子3之表面3a導入上述p 〇H基或以_〇11基 之方法’可列舉:II由具有直接鍵結於磷原子之經基之化 合物(以下亦稱為含P_OH基之化合物)、或具有直接鍵結於 矽原子之羥基之化合物(以下亦稱為含Si 〇H基之化合物) 對絕緣粒子進行表面處理之方法;以及於絕緣粒子之製作 時,使構成絕緣粒子之材料中含有上述含p_〇H基之化合 物或上述含Si-ΟΗ基之化合物的方法等。就對絕緣粒子3之 表面3a有效率地導人上述p_〇H基或上述〜〇η基之觀點而 吕,較好的是於絕緣粒子3之製作時,使構成絕緣粒子3之 材料中含有上述含P_〇H基之化合物或上述含Si_〇H基之化 合物的方法。絕緣粒子3較好的是使用上述含p_〇H基之化 合物作為材料之絕緣粒子,其原因在於可進一步提高絕緣 粒子3與導電性粒子2之附著性。 如上所述,表面具有直接鍵結於磷原子之羥基或直接鍵 結於矽原子之羥基的絕緣粒子3例如可藉由使用具有直接 鍵結於磷原子之羥基之化合物或具有直接鍵結於矽原子之 羥基之化合物而獲得。 作為藉由上述含P_〇H基之化合物或上述含Si_〇H基之化 合物對絕緣粒子進行表面處理之方法,可列舉:使上述含 P-OH基之化合物或上述含Si_〇H基之化合物化學鍵結於絕 緣粒子之表面的方法;以及對絕緣粒子之表面進行化學處 150671.doc •16· 201122077 理’藉由上述含P-OH基之化合物或上述含Si_0H基之化合 物進行改質以使絕緣粒子於表面具有上述P-OH基或上述 Si-OH基的方法等。 作為上述含p_〇H基之化合物,可列舉下述式(1)所表示 之化合物。 [化8] X1 …式⑴ HO—·ρ χ2 0 上述式(1)中,XI表示羥基、烷氧基或碳數丨〜12之院 基’ X2表示含不飽和鍵之有機基。 上述式(1)中’ XI較好的是羥基。即’上述式(1)所表示 之化合物較好的是下述式(1A)所表示之化合物。於該情形 時’可進一步提高導電性粒子2與絕緣粒子3之附著性。 [化9]OH HO-P--* (11A) _ 0 Further, the insulating particles having a Si-OH group on the surface preferably have a group represented by the following formula (12) on the surface. The group represented by the following formula (12) can be introduced relatively easily to the surface 3a of the insulating particles 3. In the above formula (12), z 1 and Z 2 each represent a hydroxyl group, an alkoxy group or an alkyl group having a carbon number of 150671.doc -15 to 201122077 1 to 12. 21 and 22 may be the same or different. The preferred knives of 21 and 22 are hydroxyl groups because the insulating particles 3 can be strongly adhered to the surface 2a of the conductive particles 2. As a method of introducing the above p 〇H group or _〇11 group to the surface 3a of the insulating particles 3, a compound having a radical having a direct bond to a phosphorus atom (hereinafter also referred to as a P_OH group-containing compound) can be cited. a method of surface-treating an insulating particle with a compound directly bonded to a hydroxyl group of a halogen atom (hereinafter also referred to as a compound containing a Si 〇H group); and a material constituting the insulating particle when the insulating particle is produced The method of containing the above-mentioned p_〇H group-containing compound or the above Si-fluorenyl group-containing compound. In view of the fact that the surface 3a of the insulating particles 3 efficiently guides the above-mentioned p_〇H group or the above-mentioned ?〇η group, it is preferable to form the insulating particles 3 in the material of the insulating particles 3 A method comprising the above P_〇H group-containing compound or the above Si_〇H group-containing compound. The insulating particles 3 are preferably insulating particles using the above-mentioned p_〇H group-containing compound as a material because the adhesion between the insulating particles 3 and the conductive particles 2 can be further improved. As described above, the insulating particles 3 having a surface directly bonded to a hydroxyl group of a phosphorus atom or directly bonded to a hydroxyl group of a halogen atom can be, for example, by using a compound having a hydroxyl group directly bonded to a phosphorus atom or having a direct bond to the ruthenium. Obtained as a compound of a hydroxyl group of an atom. The method of surface-treating the insulating particles by the P_〇H group-containing compound or the Si—〇H group-containing compound may include the above P—OH group-containing compound or the above-described Si—〇H. a method of chemically bonding a compound to a surface of an insulating particle; and chemically treating a surface of the insulating particle 150671.doc •16·201122077 ′′ by using the above P-OH group-containing compound or the above Si_0H group-containing compound The method is such that the insulating particles have the above P-OH group or the above Si-OH group on the surface. The compound represented by the following formula (1) is exemplified as the compound containing the p_〇H group. X1 Formula (1) HO—·ρ χ2 0 In the above formula (1), XI represents a hydroxyl group, an alkoxy group or a group having a carbon number of 12~12. X2 represents an organic group having an unsaturated bond. In the above formula (1), XI is preferably a hydroxyl group. Namely, the compound represented by the above formula (1) is preferably a compound represented by the following formula (1A). In this case, the adhesion between the conductive particles 2 and the insulating particles 3 can be further improved. [Chemistry 9]

OHOH

I …式(1A) HO-P-X2 Ο 上述式(1A)中,X2表示含不飽和鍵之有機基。上述式 (1)及式(1A)中之X2較好的是含有(甲基)丙烯醯基其原因 在於可與絕緣粒子3之構成原料容易地共聚合。 上述含P-OH基之化合物之具體例可列舉:甲基丙烯酸· 150671.doc 17 201122077 酸式填醯氧基乙醋、曱基丙稀酸-酸式碌醯氧基丙於酽 式磷醯氧基聚氧乙二醇單曱基丙烯酸酯及酸式磷醯氧基= 氧丙二醇單曱基丙烯酸酯等。上述含P-OH基之化人物可 僅使用1種,亦可併用2種以上。 作為上述含Si-OH基之化合物,可列舉下述式所表示 之化合物。 [化 10] 21I Formula (1A) HO-P-X2 In the above formula (1A), X2 represents an organic group containing an unsaturated bond. It is preferable that X2 in the above formula (1) and formula (1A) contains a (meth) acrylonitrile group because it can be easily copolymerized with the constituent raw materials of the insulating particles 3. Specific examples of the above P-OH group-containing compound include methacrylic acid 150671.doc 17 201122077 acid-filled methoxyacetic acid, mercapto-acrylic acid-acidic fluorenyloxypropane Oxypolyoxyethylene glycol monodecyl acrylate and acid phosphonium oxy group = oxypropylene glycol monodecyl acrylate. The P-OH group-containing person may be used alone or in combination of two or more. The compound represented by the following formula is exemplified as the Si-OH group-containing compound. [化 10] 21

I HO—Si一23 …式(2) 22 上述式(2)中,Z1及Z2分別表示羥基、烷氧基或碳數 1〜12之烷基,Z3表示含不飽和鍵之有機基。ζι〜ζ3可相 同,亦可不同Z1及Z2較好的是分別為經基,其原因在於 可使絕緣粒子3強固地附著於導電性粒子2之表面。又, Z3較好的是含有(甲基)丙烯醯基,其原因在於可與絕緣粒 子之構成原料容易地共聚合。 作為上述含Si-ΟΗ基之化合物之具體例,可列舉乙烯基 起·基石夕烧、及3 -曱基丙稀醯氧基丙基三經基石夕燒等。上 述含Si-OH基之化合物可僅使用!種,亦可併用2種以上。 絕緣粒子3之粒徑可根據導電性粒子2之粒徑及附帶絕緣 粒子之導電性粒子丨之用途等而適當選擇。絕緣粒子3之平 均粒徑較好的是在〇〇〇5〜i μηι之範圍内。絕緣粒子3之平 均粒徑之更好下限為0.01 pm,更好上限為0·5 μιη。若絕緣 150671.doc 201122077 粒子3之平均粒徑料,則於使附帶_ 子1分散於黏合樹財時,複數個附帶絕緣粒子 粒子1之導電性粒子2彼此容易接觸。若絕緣粒子3之 粒徑過大’則於電極間之連接 -f 卩除電極與導電性粒 熱。1之絕緣粒子3’必須增大壓力,或必須於高溫下加 絕緣粒子3之「平均粒徑」表示數量平均粒徑。絕緣粒 子3之平均粒徑係與導電性粒子2之平均粒徑同樣地求[ 絕緣粒子3之平均粒徑較好的是導電性粒子2之平均師 之㈣下。絕緣粒子3之平均粒徑較好的是導電性粒^ :平均粒徑之⑽⑽以上。若絕緣粒子3之平均粒徑為導 /·生拉子2之平均粒徑之1/5以下,則例如製造附帶絕緣粒 子之導電性粒子,,可I絕緣粒子3更有效率地附著於導 電性粒子2之表面2a。 亦可使用粒徑不同之2種以上之絕緣粒子。於該情形 時,可使較小之絕緣粒子存在於導電性粒子2之表面㈣ 較大之絕緣粒子之間,故可減小導電性粒子以露出面 積。因此,即便複數個附帶絕緣粒子之導電性粒子接觸, 郝接之導電性粒子2亦不易接觸,故可抑制鄰接電極間之 妞路。較小之絕緣粒子之平均粒徑較好的是較大之絕緣粒、 ^之平均粒徑的1/2以下。較小之絕緣粒子之數量較好的 疋較大之絕緣粒子之數量的丨/4以下。 ,為使導電性粒子2之表面2a適當露出’絕緣粒子3之被覆 率(絕緣粒子3對導電性粒子2之被覆率)較好的是在5〜7〇% 15067I.doc 19 201122077 之範圍内。上述被覆率表示在導電性粒子2之整個表面積 中所占的由絕緣粒子4所被覆之部分之面積。若上述被覆 率在上述較好範圍内’則鄰接之導電性粒子2更難接觸, 且於電極之連接時即便不賦予必要程度以上之熱及壓力, 亦可充分排除絕緣粒子3。 附著於導電性粒子2之表面2a的絕緣粒子2之接觸面積較 好的是絕緣粒子3之表面積之20%以下.於該情形時,絕 緣粒子2之變形相對較小,可使附著於導電性粒子2之表面 的絕緣粒子3之被覆層之厚度均勻。χ,於電極間之接觸 時’可冑效率地排除導電性粒子2與電極之間之絕緣粒子 3。絕緣粒子2之上述接觸面積之下限並無特別限定,只要 絕緣粒子3附著於導電性粒子2之表面&,則實f上為㈣亦 可0 圖2甲,以剖面圖表示本發明之其他實施形態之附帶 緣粒子之導電性粒子。 圖2所示之附帶絕緣粒子之導電性粒子11包含作為金; 粒:之導電性粒子12、及附著於導電性粒子。之表面1: 之複數個絕緣粒子3。導電性粒子12為金屬粒子,故於4 面仏具有導電層。如此’導電性粒子只要表面具有導; 層即可,可為金屬被覆粒子,亦可為金屬粒子。 用以形成導電性粒子12之金屬並無特別限定。作為 屬,可列舉作為用以形成導電性粒子2之導電層5的金屬而 ΓΓ上述金屬。再者,導電性料以平均粒徑 祀與導電性粒子2之平均粒徑相同。 J5067J.doc •20- 201122077 於將使附帶絕緣粒子之導電性粒子〇 5 gM23tT分散於 離子交換水50 g中之分散液在l〇〇t下放置1〇小時,然後 自分散液中去除附帶絕緣粒子之導電性粒子而獲得液體 時,所得液體之導電率較好的是2〇 0/(;ηι以下。該溶液之 導電率更好的是H pS/cm以下。上述導電率越低,越可進 一步提高絕緣可靠性。 作為上述導電率之測定裝置,可列舉崛場製作所公司製 造之「COND METER ES-51」等。 作為控制上述導電率之方法’可列舉:於藉由絕緣粒子 破覆導電性粒子之步驟中不使用離子性化合物之方法;以 及於藉由絕緣粒子被覆導電性粒子之步驟中使用與導電性 粒子強固地鍵結之離子性化合物之方法等。其中,控制上 述導電率之方法較好的是於藉由絕緣粒子被覆導電性粒子 之步驟中不使用離子性化合物之方法,其原因在於導電率 之控制較容易。 於使附帶絕緣粒子之導電性粒子〇·〇3 g於231下分散於 甲苯1.0 g中時,分散液之發熱量較好的是附帶絕緣粒子之 導電性粒子每1 g為10 mJ以上。該發熱量更好的是8〇爪】以 上。上述發熱量越高’越可進一步提高黏合樹脂等中的附 帶絕緣粒子之導電性粒子之分散性。因此,不易產生凝聚 之附帶絕緣粒子之導電性粒子’可進一步於電極間精度佳 地配置導電性粒子。因此,由於可於電極間精度佳地配置 導電生粒+ it可藉由導電性粒子將應連接之上下電極間 容易地連接。進而’可抑制由於存在凝聚之附帶絕緣粒子 150671.doc -21 · 201122077 之導電性粒子而不應連接之相鄰電極間經由複數個導電性 粒子連接的現象。因此,電極間之導通可靠性變得更高。 特別是若上述發熱量為上述下限以上,則於黏合樹脂為環 氧樹脂之情形時’環氧樹脂中之附帶絕緣粒子之導電性粒 子之分散性變高。 作為上述發熱量之測定裝置,可列舉TA Instrument& 司製造之「TAMIII」等。 較好的是附帶絕緣粒子之導電性粒子中的上述導電性粒 子之平均粒禮為1〜2 0 μηι,且上述發熱量為上述下限以 上。進而,較好的是附帶絕緣粒子之導電性粒子中的上述 導電性粒子之平均粒徑為卜⑼μιη ,附帶絕緣粒子之導電 性粒子之被覆率為5〜70%,且上述發熱量為上述下限以 上。於該等情形時,可進一步增大分散液之發熱量,或可 進—步提高黏合樹脂等中之附帶絕緣粒子之導電性粒子之 分散性。 進而,較好的是導電層之最表面為金層、鎳層或鈀層 且上述發熱量為1〇 mJ以上。於該情形時,可進一步增 刀散液之&熱量,或進_步提高黏合樹脂等中之附帶絕 粒子之導電性粒子之分散性。 作為控制上述發熱量之方法,可列舉對導電性粒子進 表面處理之方法、使絕緣粒子之組成變得適當之方法、 及對絕緣粒子進行表面處理之方法等。其中,控制上述 熱置之方法較好的是使絕緣粒子之組成變得適當之方法 其原因在於發熱量之控制較容易。 150671.doc 22· 201122077 (異向性導電材料) :發明之異向性導電材料包含本發 導電性粒子及黏合樹脂。 &、彖板子之 二使用本實施形態之附帶絕緣粒子之導電性粒子 形時’絕緣粒子3與導_雷w? 月 絕綾㈣地附著,故於使附帶 ’ 冑性粒子1分散於黏合樹脂中時等,絕緣粒 子3不易自導電性粒子2之表面2a脫離。 、、邑緣粒 上述黏合樹脂並無特別限定。作為上述黏合樹脂,通常 係使用絕緣性之樹脂。作為上述黏合樹脂,例如可列舉乙 稀樹脂、熱塑性樹脂、硬化性樹脂、熱塑性嵌段共聚物及 彈性體等。上述黏合樹脂可僅使用旧,亦可併用2種以 上0 作為上述乙烯樹脂,例如可列舉乙酸乙烯酯樹脂、丙烯 酸系樹脂及苯乙烯樹脂等。作為上述熱塑性樹脂,例如可 列舉聚烯烴樹脂、乙烯-乙酸乙烯酯共聚物及聚醯胺樹脂 等。作為上述硬化性樹脂,例如可列舉環氧樹脂、胺基曱 酉文Ss树知、聚醯亞胺樹脂及不飽和聚酯樹脂等。再者,上 述硬化性樹脂可為常溫硬化型樹脂、熱硬化型樹脂、光硬 化型樹脂或濕氣硬化型樹脂。上述硬化性樹脂亦可與硬化 劑併用。作為上述熱塑性嵌段共聚物,例如可列舉苯乙 烯-丁二烯-笨乙烯嵌段共聚物、苯乙烯·異戊二烯_苯乙烯 嵌段共聚物 '苯乙烯_丁二烯-苯乙烯嵌段共聚物之氫化 物、及本乙稀-異戊二稀-本乙烯後段共聚物之氫化物等。 作為上述彈性體,例如可列舉苯乙烯-丁二稀共聚合橡 15067 丨.doc -23· 201122077 膠、及丙烯腈-苯乙烯嵌段共聚合橡膠等。 異向性導電材料中,除了附帶絕緣粒子之導電性粒子及 黏合樹脂以外,例如可含有填充劑、増量劑、軟化劑、增 塑劑、聚合觸媒、硬化觸媒、著色劑、抗氧化劑、熱穩定 劑1穩定劑、紫外線吸收劑、潤滑劑'抗靜電劑或阻燃_ 劑專各種添加劑。 使附帶絕緣粒子之導電性粒子分散於上述黏合樹脂中之 方法可使用先前公知之分散方法’並無特別限定。作為使 附▼絕緣粒子之導電性粒子分散於上述黏合樹脂中之方 彳士可列舉.於黏合樹脂中添加附帶絕緣粒子之導電 、只子後矛j用行星式混合機等進行混練而使其分散之方 法’使用均質機等使附帶絕緣粒子之導電性粒子均勻分散 於水或有機溶劑中後’添加至黏合樹脂中,利用行星式混 合機等進行混練而使其分散之方法;以及利用水或有機溶 劑等稀_合樹脂後,添加附帶絕緣粒子之導電性粒子, 利用灯星式混合機等進行混練而使其分散之方法等。 本《月之異向性導電材料能以異向性導電糊、異向性導 電油墨、異向性導電黏接著劑、異向性導電膜、或異向性 導電片材等之形式使用。於將包含本發明之附帶絕緣粒子 之導電性粒子的異向性導電材料以異向性導電膜或異向性 導電片材等之膜狀之接著劑的形式使用之情形時,亦可於* 含有該附帶絕緣粒子之導電性粒子的膜狀之接著劑上,積 層不含附帶絕緣粒子之導電性粒子的膜狀之接著劑。 上述附帶絕緣粒子之導電性粒子之含量並無特別限定。 150671.doc -24· 201122077 就k尚導通可靠性之顴 L1 規·.-占而s,較好的是於異向性導電材 料100體積〇/〇中,上述m *姐 〒电何 11附T絕緣粒子之導電性粒子之含眚 在〇.〇1〜20體積%之範圍内。 (連接構造體) 圖3係示意性地表示由 、使用本發明之一實施形態之導電性 粒子的連接構造體之剖面圖。 圖3所示之連接構造體21包含:第!連接對象構件22,第 2連接對象構件23 ’及將第i、第2連接對象構件&加 以電性連接之連接部24。連接部24係由包含附帶絕緣粒子 之導電性粒子!及點合樹脂25之異向性導電材料所形成。 於第1連接對象構件22之上表面22a設有複數個電極 咖。於第2連接對象構件23之下表面…設有複數個電極 23b。電極22b與電極23b經由附帶絕緣粒子之導電性粒子ι 而積層。電極22b與電極231?藉由導電性粒子2而電性連 接。 作為第1、第2連接對象構件22'23,具體可列舉:半導 體晶片、電容器及二極體等電子零件,以及印刷基板、可 撓性印刷基板及玻璃基板等電路基板等。 連接構造體2i之製造方法並無特別限定。作為連接構造 體21之製造m例’可列舉:於第丨連接對象構件22 與第2連接對象構件23之間配置上述異向性導電材料,名萑 得積層體後,對該積層體進行加熱、加壓之方、去。 對上述積層體進行加熱時之溫度為12〇〜22(TC左右。對 上述積層體進行加壓時之壓力為9_8〜1〇4〜4.9xl〇6 pa左右。 150671.doc -25· 201122077 對上述積層體進行加熱及加壓時,可排除存在於導電性 粒子2與電極22b、23b之間之絕緣粒子3。例如於上述加熱 及加壓時’存在於導電性粒子2與電極22b、23b之間之絕 緣粒子3熔融、或變形,導電性粒子2之表面2&局部地露 出。再者,上述加熱及加壓時,賦予較大之力,故有時一 部分絕緣粒子3亦自導電性粒子2之表面2a剝離,導電性粒 子2之表面2a局部地露出。導電性粒子2之表面2a露出之部 分與電極22b、23b接觸,由此可經由導電性粒子2將電極 22b、23b電性連接。 又,如圖3所示,絕緣粒子3熔融抑或變形,藉此源自絕 緣粒子3之層26形成於導電性粒子2與電極22b、23b之接觸 部分之周邊。絕緣粒子3於表面3a具有上述p_〇H*或上述 Si-OH基。上述Ρ·〇Η基或上述Si_0H基不僅強固地化學鍵 結於導電性粒子2之表面2a之導電層,亦強固地化學鍵結 於由金屬形成之電極22b、23b。因此,源自絕緣粒子3之 層26與電極22b、23b強固地化學鍵結。 因此,於使用附帶絕緣粒子之導電性粒子丨之情形時, 來源於絕緣粒子3之層26與電極22b、23b強固地化學鍵 結’故可提高導電性粒子2與電極22b、23b之接著強度。 因此’可提高電極間之連接可靠性。 又,將連接構造體2 1之變形例示於圖4,如該圖所示 般,有時分別配置於複數個電極22b、23b間的附帶絕緣粒 子之導電性粒子ΙΑ、1B與其他附帶絕緣粒子之導電性粒 子1C、1D接觸,附帶絕緣粒子之導電性粒子以〜^相連。 150671.doc -26- 201122077 近年來,鄰接之複數個哲托,,^ 個電極22b之間隔、及鄰接之複數個 電極23b之間隔逐漸變窄。若橫方向之電極咖之間 隔較窄,則有時於橫方向上鄰接之電極22卜咖經由相連 之附帶絕緣粒子之導電性粒子1A〜1D接觸。 於使用附帶絕緣粒子之導電性粒子1之情形時,只要不 施加較大之力,則絕緣粒子3不易自導電性粒子2之表面η 脫離’故即便複數個附帶絕緣粒子之導電性粒子丨接觸, 於導電性粒子2之間亦存在絕緣粒子3。因此,可抑制鄰接 之複數個電極22b、23b之短路。即,即便複數個附帶絕緣 粒子之V電性粒子1接觸,不應連接之於橫方向上鄰接之 複數個電極22b、23b亦不易因複數個導電性粒子2而連 接。 以下’列舉實施例及比較例對本發明加以具體說明。本 發明並非僅限定於以下實施例。 (絕緣粒子A〜E及I之製作) (1)絕緣粒子A之製作 於附有四口可分離式蓋、攪拌翼、三通旋栓、冷凝管及 溫度計之1 〇〇〇 mL可分離式燒瓶中’準備含有甲基丙稀酸 縮水甘油酯45 mmol、曱基丙烯酸甲酯380 mmol、二甲基 丙烯酸乙二醇酯13 mmol、酸式磷醯氧基聚氧乙二醇甲基 丙烯酸酯0·5 mmol、及2,2'-偶氮雙{2-[N-(2-羧基乙基)脒 基]丙院}1 mmol之單體組合物。將該單體组合物以固體成 分率成為10重量%之方式稱取於蒸餾水中後,以2〇〇 rpm進 行攪拌,於氮氣環境下、60。〇下進行24小時聚合。反應結 150671,doc •27· 201122077 束後’進行冷凍乾燥’獲得表面具有來源於酸式磷醯氧武 聚氧乙二醇曱基丙烯酸酯之上述p_〇H基之絕緣粒子A。 (2) 絕緣粒子B之製作 將上述酸式磷醯氧基聚氧乙二醇甲基丙烯酸酯變更為甲 基丙烯酸-酸式磷醯氧基乙酯,除此以外,與絕緣粒子八同 樣地獲得表面具有來源於曱基丙稀酸-酸式礙酿氧基乙酉旨 之上述P-OH基之絕緣粒子B。 (3) 絕緣粒子C之製作 將上述酸式磷醯氧基聚氧乙二醇曱基丙烯酸酯變更為酸 式磷醯氧基聚氧丙二醇單甲基丙烯酸酯,除此以外,與絕 緣粒子A同樣地獲得表面具有來源於酸式鱗醯氧基聚氧丙 二醇單甲基丙烯酸酯之上述P-OH基之絕緣粒子c。 (4) 絕緣粒子D之製作 於安裝有四口可分離式蓋、攪拌翼、三通旋栓、冷凝管 及溫度計之1000 mL可分離式燒瓶中,準備含有甲基丙稀 酸縮水甘油g旨45 mmol、曱基丙浠酸甲醋380 mmol、二甲 基丙稀酸乙二醇酯13 mmol、乙烯基三羥基石夕统〇.5 mmol、及2,2'-偶氮雙{2-[N-(2-羧基乙基)脒基;]丙烷μ mmol之單體組合物。將該單體組合物以固體成分率成為 1 〇重量%之方式稱取於蒸餾水中後,以200 rpm攪拌,於氮 氣環境下、60°C下進行24小時聚合。反應結束後,進行冷 東乾燥,獲得表面具有來源於乙烯基三經基石夕院之上述S i -OH基之絕緣粒子D。 (5) 絕緣粒子E之製作 150671.doc -28 201122077 將上述乙烯基三羥基矽烷變更為3_甲基丙烯醯氧基丙基 三羥基矽烷,除此以外’與絕緣粒子D同樣地獲得表面具 有來源於3 -甲基丙稀酿氧基丙基三經基石夕烧之上述8〖_〇η 基之絕緣粒子E。 (6)絕緣粒子I之製作 於安裝有四口可分離式蓋'攪拌翼、三通旋栓、冷凝管 及溫度計之1000 mL可分離式燒瓶中,準備含有甲基丙烯 酸縮水甘油酯45 mmol、甲基丙烯酸甲酯380 mmol、二甲 基丙烯酸乙二醇酯13 mmol、及2,2,-偶氮雙{2-[N-(2-羧基 乙基)脒基]丙烷mmol之單體組合物。將該單體组合物 以固體成分率成為1 〇重量%之方式稱取於蒸餾水中後以 200 rpm攪拌,於氮氣環境下、6〇t下進行24小時聚合。 反應結束後,進行冷凍乾燥,準備表面不具有p_〇H基及 Si-OH基之絕緣粒子I。 (導電性粒子A〜B之製作) (1)導電性粒子A(最外層為鎳層)之製作 於由平均粒徑為3 μιη之四羥曱基曱烷四丙烯酸酯與二乙 稀基苯之共聚合樹脂所形成之樹脂粒子丨〇 g中,進行利用 氫氧化鈉水洛液之鹼脫脂、酸中和、二氯化錫溶液中之敏 化其後,實施利用二氯化鈀溶液之活化之無電解鍍敷前 處理,過濾、清洗,獲得於粒子表面附著有鈀之樹脂粒 子。 #用該樹脂粒子進行以下之無電解顏步驟。 無電解鍍鎳步驟: 15067I.doc •29- 201122077 利用離子吸附劑之10重量%溶液對上述樹脂粒子進行5 分鐘處理,繼而添加至硫酸鈀00丨重量%水溶液中。其 後,添加二甲基胺硼烷進行還原處理,過濾、清洗,藉此 獲得附著有把之樹脂粒子。 繼而,製備使琥珀酸鈉溶解於離子交換水5〇〇 mL中之琥 珀酸鈉〗重量%溶液。於該溶液中添加附著有鈀之樹脂粒 子10 g,混合而製備漿料。於漿料中添加硫酸,將漿料之 pH調整為5。 7為鍍鎳液,製備含有硫酸鎳10重量%、次亞磷酸鈉ι〇 重里%、虱氧化鈉4重量。/。及琥珀酸鈉2〇重量%之上述鍍鎳 溶液。將已調整為pH5之上述襞料加溫至8(rc後於聚料 中連續滴加上述㈣溶液,授拌2G分鐘,藉此進行鍵敷反 應。確認不產生氫而結束鍍敷反應。 繼而,製備含有硫酸錄20重量%、二f基胺石朋貌5重量% 及虱氧化鈉5重量%之下述㈣溶液。於利用上述錄婷溶 =之錄敷反應結束後之溶液中’連續滴加下述鑛錦液,搜 拌H、時,藉此進行鐘敷反應1此,於樹脂粒子之表面 形成鎳層,獲得導電性粒子A。再 μπιβ ㈣鎳層之厚度為(Μ (2)導電性粒子β(最外層為鈀層)之製作 下之無電解鍍鈀 使用所得之上述導電性粒子A,進行以 步驟。 無電解鍍Ιε步驟:I HO—Si-23 (Formula (2) 22 In the above formula (2), Z1 and Z2 each represent a hydroxyl group, an alkoxy group or an alkyl group having 1 to 12 carbon atoms, and Z3 represents an organic group having an unsaturated bond. Ζι~ζ3 may be the same, or different Z1 and Z2 are preferably a warp group, because the insulating particles 3 may be strongly adhered to the surface of the conductive particles 2. Further, Z3 preferably contains a (meth) acrylonitrile group because it can be easily copolymerized with the constituent raw materials of the insulating particles. Specific examples of the Si-containing thiol group-containing compound include vinyl group ketone sulphate and 3-mercapto propyl methoxy propyl sulphate. The above Si-OH group-containing compound can be used only! Two or more kinds may be used in combination. The particle diameter of the insulating particles 3 can be appropriately selected depending on the particle diameter of the conductive particles 2 and the use of the conductive particles conjugated with the insulating particles. The average particle diameter of the insulating particles 3 is preferably in the range of 〇〇〇5 to i μηι. The lower limit of the average particle diameter of the insulating particles 3 is 0.01 pm, and the upper limit is preferably 0.5 πηη. When the average particle size of the particles 3 is insulated, the conductive particles 2 with the insulating particle particles 1 are easily brought into contact with each other when the _ sub-segment 1 is dispersed in the bonding tree. If the particle size of the insulating particles 3 is too large, the connection between the electrodes -f removes the electrode and the conductive grain heat. The insulating particles 3' of 1 must be increased in pressure, or the "average particle diameter" of the insulating particles 3 must be added at a high temperature to indicate the number average particle diameter. The average particle diameter of the insulating particles 3 is determined in the same manner as the average particle diameter of the conductive particles 2 [the average particle diameter of the insulating particles 3 is preferably the average of the conductive particles 2 (4). The average particle diameter of the insulating particles 3 is preferably (10) (10) or more of the conductive particles. When the average particle diameter of the insulating particles 3 is 1/5 or less of the average particle diameter of the conductive material 2, for example, conductive particles with insulating particles are produced, and the insulating particles 3 can be more efficiently adhered to the conductive particles. The surface 2a of the particle 2 is. Two or more kinds of insulating particles having different particle diameters can also be used. In this case, the smaller insulating particles can be present between the surface of the conductive particles 2 (4) and the larger insulating particles, so that the conductive particles can be made smaller to expose the area. Therefore, even if a plurality of conductive particles with insulating particles are in contact, the conductive particles 2 of Hao are not easily contacted, so that it is possible to suppress the path between the adjacent electrodes. The average particle diameter of the smaller insulating particles is preferably 1/2 or less of the larger average particle diameter of the insulating particles. The number of smaller insulating particles is preferably 丨/4 or less of the number of larger insulating particles. In order to appropriately expose the surface 2a of the conductive particles 2 to the coverage of the insulating particles 3 (the coverage ratio of the insulating particles 3 to the conductive particles 2) is preferably in the range of 5 to 7 % by % 15067 I. doc 19 201122077 . The coverage ratio indicates the area of the portion covered by the insulating particles 4 in the entire surface area of the conductive particles 2. When the coating ratio is within the above-described preferable range, the adjacent conductive particles 2 are more difficult to contact, and the insulating particles 3 can be sufficiently removed even when heat and pressure are not provided to the extent necessary for the connection of the electrodes. The contact area of the insulating particles 2 adhering to the surface 2a of the conductive particles 2 is preferably 20% or less of the surface area of the insulating particles 3. In this case, the deformation of the insulating particles 2 is relatively small, and adhesion to the conductivity can be made. The thickness of the coating layer of the insulating particles 3 on the surface of the particles 2 is uniform. In other words, the insulating particles 3 between the conductive particles 2 and the electrodes can be efficiently removed during the contact between the electrodes. The lower limit of the contact area of the insulating particles 2 is not particularly limited, and as long as the insulating particles 3 adhere to the surface & of the conductive particles 2, the actual f is (4) or 0 (Fig. 2A), and the other aspects of the present invention are shown in cross section. Conductive particles with incidental particles of the embodiment. The conductive particles 11 with insulating particles shown in FIG. 2 include conductive particles 12 as gold, particles, and conductive particles. Surface 1: a plurality of insulating particles 3. Since the conductive particles 12 are metal particles, they have a conductive layer on the four sides. Such a conductive particle may have a layer as a surface, and may be a metal-coated particle or a metal particle. The metal for forming the conductive particles 12 is not particularly limited. As the genus, the metal described above is used as the metal for forming the conductive layer 5 of the conductive particles 2. Further, the conductive material has the same average particle diameter 祀 and the average particle diameter of the conductive particles 2. J5067J.doc •20- 201122077 The dispersion containing the conductive particles 〇5 gM23tT with insulating particles dispersed in 50 g of ion-exchanged water was placed at 1 Torr for 1 hr, and then the additional insulation was removed from the dispersion. When the liquid is obtained by the conductive particles of the particles, the conductivity of the liquid obtained is preferably 2 〇 0 / (; ηι or less. The conductivity of the solution is preferably H pS / cm or less. The lower the conductivity, the lower In addition, the "COND METER ES-51" manufactured by Horiba Seisakusho Co., Ltd., etc. can be used as the measuring device for the above-mentioned conductivity. The method for controlling the above conductivity can be exemplified by breaking the insulating particles. a method of not using an ionic compound in the step of conducting the conductive particles; and a method of using an ionic compound strongly bonded to the conductive particles in the step of coating the conductive particles with the insulating particles, wherein the conductivity is controlled The method is preferably a method in which the ionic compound is not used in the step of coating the conductive particles by the insulating particles, because the conductivity is controlled more When the conductive particles 〇·〇3 g with the insulating particles are dispersed in 1.0 g of toluene under 231, the heat generation amount of the dispersion liquid is preferably 10 mJ or more per 1 g of the conductive particles with the insulating particles. The heat generation amount is preferably 8 】 or more. The higher the amount of heat generation is, the more the dispersion property of the conductive particles with the insulating particles in the adhesive resin or the like can be further improved. The conductive particles can further have conductive particles arranged with excellent precision between the electrodes. Therefore, the conductive particles + it can be disposed with high precision between the electrodes, and the upper and lower electrodes to be connected can be easily connected by the conductive particles. 'The phenomenon that the conductive particles of the incidental insulating particles 150671.doc -21 · 201122077 which are agglomerated and which are not connected should be connected via a plurality of conductive particles can be suppressed. Therefore, the conduction reliability between the electrodes becomes In particular, when the calorific value is at least the above lower limit, when the binder resin is an epoxy resin, the accompanying insulating particles in the epoxy resin The dispersibility of the electric particles is high. As the measuring device for the calorific value, "TAMIII" manufactured by TA Instrument & A., etc. is preferable. The average particle of the above-mentioned conductive particles in the conductive particles with insulating particles is preferable. The enthalpy is 1 to 20 μm, and the calorific value is equal to or higher than the lower limit. Further, it is preferred that the conductive particles having the insulating particles have an average particle diameter of the conductive particles of (9) μηη, and conductivity of the insulating particles. The coverage of the particles is 5 to 70%, and the calorific value is equal to or higher than the lower limit. In these cases, the calorific value of the dispersion may be further increased, or the incident insulating particles in the adhesive resin or the like may be further increased. Dispersibility of conductive particles. Further, it is preferred that the outermost surface of the conductive layer is a gold layer, a nickel layer or a palladium layer and the calorific value is 1 〇 mJ or more. In this case, the heat of the granules can be further increased, or the dispersibility of the conductive particles with the virgin particles in the adhesive resin or the like can be further increased. Examples of the method for controlling the amount of heat generation include a method of subjecting the conductive particles to a surface treatment, a method of forming a composition of the insulating particles, and a method of surface-treating the insulating particles. Among them, the method of controlling the above-described heat setting is preferably a method of making the composition of the insulating particles suitable because the control of the calorific value is easy. 150671.doc 22· 201122077 (Anisotropic conductive material): The anisotropic conductive material of the invention comprises the present conductive particles and a binder resin. When the conductive particles having the insulating particles of the present embodiment are used in the second embodiment, the insulating particles 3 and the conductive particles 3 are attached to each other, so that the incidental particles 1 are dispersed in the bonding. In the case of the resin or the like, the insulating particles 3 are less likely to be detached from the surface 2a of the conductive particles 2.邑 粒 粒 The above-mentioned adhesive resin is not particularly limited. As the above-mentioned binder resin, an insulating resin is usually used. Examples of the above-mentioned binder resin include an ethylene resin, a thermoplastic resin, a curable resin, a thermoplastic block copolymer, and an elastomer. The above-mentioned binder resin may be used alone or in combination of two or more kinds of the above-mentioned vinyl resins, and examples thereof include a vinyl acetate resin, an acrylic resin, and a styrene resin. Examples of the thermoplastic resin include a polyolefin resin, an ethylene-vinyl acetate copolymer, and a polyamide resin. Examples of the curable resin include an epoxy resin, an amine sulfonium Ss tree, a polyimide resin, and an unsaturated polyester resin. Further, the curable resin may be a room temperature curing resin, a thermosetting resin, a photohardening resin or a moisture curing resin. The above curable resin may be used in combination with a curing agent. Examples of the above thermoplastic block copolymer include a styrene-butadiene-styrene block copolymer, a styrene-isoprene-styrene block copolymer, and a styrene-butadiene-styrene block. a hydride of the segment copolymer, and a hydride of the present ethylene-isopentadiene-ethylene ethylene post-copolymer. Examples of the elastomer include styrene-butadiene copolymerized rubber 15067 丨.doc -23· 201122077, and acrylonitrile-styrene block copolymerized rubber. The anisotropic conductive material may contain, for example, a filler, a sizing agent, a softener, a plasticizer, a polymerization catalyst, a curing catalyst, a colorant, an antioxidant, and the like, in addition to the conductive particles and the binder resin with the insulating particles. Heat stabilizer 1 stabilizer, UV absorber, lubricant 'antistatic agent or flame retardant _ agent for various additives. The method of dispersing the conductive particles with insulating particles in the above-mentioned binder resin can be carried out by using a conventionally known dispersion method'. As a gentleman in which the conductive particles of the insulating particles are dispersed in the above-mentioned binder resin, the conductive resin with the insulating particles is added to the binder resin, and only the back spear j is kneaded by a planetary mixer or the like. a method of dispersing a method in which a conductive particle containing an insulating particle is uniformly dispersed in water or an organic solvent, and then added to a binder resin by a homomixer or the like, and kneaded by a planetary mixer or the like, and dispersed. After a rare resin such as an organic solvent, a conductive particle containing an insulating particle is added, and a method of kneading by a lamp star mixer or the like is dispersed. The "monthly anisotropic conductive material can be used in the form of an anisotropic conductive paste, an anisotropic conductive ink, an anisotropic conductive adhesive, an anisotropic conductive film, or an anisotropic conductive sheet. In the case where the anisotropic conductive material containing the conductive particles with insulating particles of the present invention is used in the form of a film-like adhesive such as an anisotropic conductive film or an anisotropic conductive sheet, On the film-form adhesive containing the conductive particles with the insulating particles, a film-like adhesive containing no conductive particles with insulating particles is laminated. The content of the conductive particles with the insulating particles is not particularly limited. 150671.doc -24· 201122077 kL1 规·.- occupies s, which is preferably in the volume of 异/〇 of the anisotropic conductive material, the above m * sister The content of the conductive particles of the T insulating particles is in the range of 1 to 20% by volume. (Connection structure) Fig. 3 is a cross-sectional view schematically showing a connection structure using conductive particles according to an embodiment of the present invention. The connection structure 21 shown in FIG. 3 includes: The connection target member 22, the second connection target member 23', and the connection portion 24 for electrically connecting the i-th and second connection target members& The connecting portion 24 is made of conductive particles containing insulating particles! And forming an anisotropic conductive material of the resin 25. A plurality of electrodes are provided on the upper surface 22a of the first connection member 22. A plurality of electrodes 23b are provided on the lower surface of the second connection member member 23. The electrode 22b and the electrode 23b are laminated via the conductive particles ι with insulating particles. The electrode 22b and the electrode 231 are electrically connected by the conductive particles 2. Specific examples of the first and second connection target members 22'23 include electronic components such as a semiconductor wafer, a capacitor, and a diode, and a circuit board such as a printed circuit board, a flexible printed circuit board, and a glass substrate. The manufacturing method of the connection structure 2i is not specifically limited. In the example of the manufacture of the connection structure 21, the anisotropic conductive material is disposed between the second connection target member 22 and the second connection target member 23, and the laminate is heated and the laminate is heated. , the side of the pressurization, go. The temperature at which the laminate is heated is about 12 to 22 (about TC). The pressure at which the laminate is pressurized is about 9 to 8 〇 4 to 4.9 x 1 〇 6 Pa. 150671.doc -25· 201122077 When the laminate is heated and pressurized, the insulating particles 3 existing between the conductive particles 2 and the electrodes 22b and 23b can be eliminated. For example, when the heating and pressurization are performed, the conductive particles 2 and the electrodes 22b and 23b are present. The insulating particles 3 are melted or deformed, and the surface 2& of the conductive particles 2 is partially exposed. Further, when the heating and pressurization are performed, a large force is applied, and thus some of the insulating particles 3 may also be self-conducting. The surface 2a of the particles 2 is peeled off, and the surface 2a of the conductive particles 2 is partially exposed. The exposed portion of the surface 2a of the conductive particles 2 is in contact with the electrodes 22b and 23b, whereby the electrodes 22b and 23b can be electrically connected via the conductive particles 2. Further, as shown in Fig. 3, the insulating particles 3 are melted or deformed, whereby the layer 26 derived from the insulating particles 3 is formed around the contact portion between the conductive particles 2 and the electrodes 22b and 23b. The insulating particles 3 are on the surface 3a. Having the above p_〇H* or the above Si-OH group. The above-mentioned fluorene-based group or the above-mentioned Si_0H group is not only strongly chemically bonded to the conductive layer of the surface 2a of the conductive particles 2, but also strongly chemically bonded to the electrodes 22b and 23b formed of metal. The layer 26 of the self-insulating particles 3 is strongly chemically bonded to the electrodes 22b and 23b. Therefore, when the conductive particles 附带 with insulating particles are used, the layer 26 derived from the insulating particles 3 is strongly chemically bonded to the electrodes 22b and 23b. Therefore, the bonding strength between the conductive particles 2 and the electrodes 22b and 23b can be increased. Therefore, the connection reliability between the electrodes can be improved. Further, a modification of the connection structure 21 is shown in Fig. 4, as shown in the figure. The conductive particles ΙΑ and 1B with the insulating particles disposed between the plurality of electrodes 22b and 23b are in contact with the other conductive particles 1C and 1D with the insulating particles, and the conductive particles with the insulating particles are connected by 〜. .doc -26- 201122077 In recent years, the interval between the adjacent electrodes, the interval between the electrodes 22b, and the interval between the adjacent plurality of electrodes 23b is gradually narrowed. In some cases, the electrodes 22 adjacent to each other in the lateral direction are in contact with the conductive particles 1A to 1D to which the insulating particles are attached. When the conductive particles 1 with insulating particles are used, as long as no large force is applied, Since the insulating particles 3 are not easily detached from the surface η of the conductive particles 2, even if a plurality of conductive particles 附带 with insulating particles are in contact with each other, the insulating particles 3 are present between the conductive particles 2. Therefore, it is possible to suppress a plurality of adjacent ones. Short-circuiting of the electrodes 22b and 23b, that is, even if a plurality of V-electrochemical particles 1 with insulating particles are in contact, the plurality of electrodes 22b and 23b which are not connected to each other in the lateral direction are not easily connected by the plurality of conductive particles 2. . The present invention will be specifically described below by way of examples and comparative examples. The present invention is not limited to the following embodiments. (Production of Insulating Particles A to E and I) (1) Insulating particle A is manufactured in a 〇〇〇mL separable type with four separable covers, agitating blades, three-way rotary plug, condenser tube and thermometer In the flask, 'prepared to contain 45 mmol of glycidyl methacrylate, 380 mmol of methyl methacrylate, 13 mmol of ethylene glycol dimethacrylate, and acid phosphatoxy polyoxyethylene glycol methacrylate. 0·5 mmol, and 2,2'-azobis{2-[N-(2-carboxyethyl)indenyl]propylamine}1 mmol of monomer composition. The monomer composition was weighed into distilled water so that the solid content thereof became 10% by weight, and then stirred at 2 rpm under a nitrogen atmosphere at 60 °C. The underarm was subjected to polymerization for 24 hours. Reaction junction 150671, doc • 27· 201122077 After the bundle, 'freeze-drying' was carried out to obtain the above-mentioned p_〇H-based insulating particles A derived from the acid-type phosphonoxane polyoxyethylene glycol methacrylate. (2) Preparation of Insulating Particles B The same as the insulating particles 8 except that the above-mentioned acid-type phosphonium polyoxyethylene glycol methacrylate was changed to methacrylic acid-acid phosphonium oxyethyl ester. The insulating particles B having the above-mentioned P-OH group derived from a mercapto acrylic acid-acid ethoxylate were obtained. (3) Production of Insulating Particles C The above-mentioned acid-type phosphonium-oxypolyoxyethylene glycol methacrylate was changed to an acid-phosphorus oxide polyoxypropylene glycol monomethacrylate, and in addition to the insulating particles A. Insulating particles c having the above-mentioned P-OH group derived from acid sulfonium oxide polyoxypropylene glycol monomethacrylate were obtained in the same manner. (4) The insulating particles D were prepared in a 1000 mL separable flask equipped with four separable caps, agitating blades, a three-way rotary plug, a condenser, and a thermometer, and were prepared to contain glycidol methacrylate. 45 mmol, 380 mmol of thioglycolic acid methyl acetate, 13 mmol of ethylene glycol dimethacrylate, vinyl trihydroxy sulfonium ruthenium. 5 mmol, and 2,2'-azo double {2- [N-(2-carboxyethyl)indenyl;] propane μ mmol of the monomer composition. The monomer composition was weighed in distilled water so that the solid content ratio was 1% by weight, and then stirred at 200 rpm, and polymerization was carried out at 60 ° C for 24 hours in a nitrogen atmosphere. After completion of the reaction, the mixture was cooled to a cold east to obtain an insulating particle D having a surface derived from the above-mentioned Si-OH group of the vinyl triion. (5) Preparation of insulating particles E 150671.doc -28 201122077 In addition to changing the vinyl trihydroxy decane to 3-methacryloxypropyl trihydroxy decane, the surface having the same surface as the insulating particles D was obtained. The above-mentioned 8 Å 〇 η based insulating particles E derived from 3-methyl propylene oxypropyl triacetate. (6) The insulating particles I were prepared in a 1000 mL separable flask equipped with four separable lids, a stirring blade, a three-way rotary plug, a condenser and a thermometer, and were prepared to contain 45 mmol of glycidyl methacrylate. Monomer combination of 380 mmol of methyl methacrylate, 13 mmol of ethylene glycol dimethacrylate, and 2,2,-azobis{2-[N-(2-carboxyethyl)indolyl]propane Things. The monomer composition was weighed in distilled water so as to have a solid content of 1% by weight, stirred at 200 rpm, and polymerized under nitrogen atmosphere at 6 Torr for 24 hours. After completion of the reaction, lyophilization was carried out to prepare insulating particles I having no p_〇H group and Si-OH group on the surface. (Preparation of conductive particles A to B) (1) Conductive particles A (the outermost layer is a nickel layer) were produced from tetrahydroquinone decane tetraacrylate having an average particle diameter of 3 μm and diethylbenzene benzene. The resin particles 丨〇g formed by the copolymerization resin are subjected to alkali degreasing, acid neutralization, and sensitization in a tin dichloride solution using a sodium hydroxide water solution, and then a palladium dichloride solution is used. The activated electroless plating is pretreated, filtered, and washed to obtain resin particles having palladium adhered to the surface of the particles. # The following electroless photo steps were carried out using the resin particles. Electroless nickel plating step: 15067I.doc • 29-201122077 The above resin particles were treated with a 10% by weight solution of an ion adsorbent for 5 minutes, and then added to a palladium sulfate 00% by weight aqueous solution. Thereafter, dimethylamine borane was added for reduction treatment, and the mixture was filtered and washed to obtain resin particles adhered thereto. Then, a sodium succinate-based weight % solution in which sodium succinate was dissolved in 5 〇〇 mL of ion-exchanged water was prepared. To the solution, 10 g of palladium-attached resin particles were added and mixed to prepare a slurry. Sulfuric acid was added to the slurry to adjust the pH of the slurry to 5. 7 is a nickel plating solution prepared by containing 10% by weight of nickel sulfate, 5% by weight of sodium hypophosphite, and 4 parts by weight of sodium bismuth oxide. /. And the above nickel plating solution of sodium succinate 2% by weight. The above-mentioned dip material adjusted to pH 5 was heated to 8 (rc), and the above (4) solution was continuously added dropwise to the polymer, and the bonding reaction was carried out for 2 G minutes to confirm the bonding reaction. It was confirmed that hydrogen generation was not caused and the plating reaction was terminated. Preparing the following (four) solution containing 20% by weight of sulfuric acid, 5% by weight of bis-fylamine, and 5% by weight of sodium bismuth oxide. In the solution after the end of the recording reaction using the above-mentioned recording solution The following mineral liquid was added dropwise, and when H was mixed, a bell reaction was carried out to form a nickel layer on the surface of the resin particles to obtain conductive particles A. The thickness of the nickel layer was (Μ) The electroless palladium produced under the production of the conductive particles β (the outermost layer is a palladium layer) is subjected to the step of using the obtained conductive particles A. The electroless plating Ι ε step:

將所得之導電性粒子A 10 g添加至離子 交換水500The obtained conductive particles A 10 g were added to the ion-exchanged water 500

mL 150671.doc 201122077 中’藉由超音波處理機充分地分散,獲得粒子懸濁液。將 該懸濁液—邊於5〇 t下進行攪拌,一邊緩緩添加含有硫酸 叙〇.02 m〇I/L、作為錯化劑之乙二胺0.04 mol/L、作為還原 劑之甲酸鈉0.06 m〇i/L及結晶調整劑之pH為〗〇 〇之無電解 鍍敷液,進行無電解鍍鈀。於鈀層之厚度成為〇〇3 之 時點結束無電解鍍鈀。繼而進行清洗,真空乾燥,藉此獲 知於鎖層之表面積層有鈀層之導電性粒子B。 (附帶絕緣粒子之導電性粒子之製作) (實施例1) ^所得之絕緣粒子A於超音波照射下分散於蒸餘水中, 獲得絕緣粒子八之1〇重量%水分散液。使所得之導電性粒 子A H) g分散於蒸館水5⑽紅中,添加絕緣粒子a之水分 散液4 g,於室溫下搜拌6小時。利用3 _之網薛過濟後, 進-步以甲醇清洗,進行乾燥,獲得附帶絕緣… (實施例2〜1 〇) 之導電性粒子 如下述表1所讀變更所使用之絕緣粒子與導電性粒子 之種類,除此以外’與實施例1同樣地獲得附帶絕緣粒子 (比較例1) /吏用絕緣粒子1及導電性粒子八,與實施们同樣 付附帶絕緣粒子之導電性粒子而進行 粒子I不附著於導電性粒子A。 ,,Λ ^ 欲獲 絕緣 (比較例2) 150671.doc • 31 · 201122077 使用絕緣粒子τ及導電性粒子B,與實施例丨同樣,欲獲 得附帶絕緣粒子之導電性粒子而進行了嘗試。然而,絕緣 粒子I不附著於導電性粒子B。 (評價) (1)被覆率 使用掃描電子顯微鏡(SEM,Scanning Ε1_〇η Microscope)觀察所得之附帶絕緣粒子之導電性粒子。 藉由S E Μ之圖像分析測定附帶絕緣粒子之導電性粒子之 被覆率。於SEM圖像中描畫出以附帶絕緣粒子之導電性粒 子之直徑之-半大小為直徑的圓,求出圓内之附帶絕緣粒 子之導電性粒子之被覆率(圓内之附帶絕緣粒子之導電性 粒子每1個之投影面積χ附帶絕緣粒子之導電性粒子之數量/ 圓内之附帶絕緣粒子之導電性粒子之投影面積)。 (2)絕緣粒子之附著性 將雙紛八型環氧樹脂(日本環氧樹脂公司製造「啊仙 聊」)10重量份 '丙烯酸系橡膠(重量平均分子量約 萬)40重量份、微膠囊型硬化劑(α_ a—、 司製w HX3941HP」)50重量份、石夕烧偶合劑(東麗道康 丁,夕氧a司製造「SH6_」)2重量份、及乙酸乙醋⑽ 重里伤A合’獲得樹脂組合物。於該樹脂植合物中以含量 成為3體積%之方式添加附帶絕緣粒子之導電性粒子獲 得異向性導電材料。 之一部分,取出附帶 觀察所取出之附帶絕 以甲笨清洗所得之異向性導電材料 絕緣粒子之導電性粒子。利用SEM, 15067l.doc •32· 201122077 緣粒子之導電性粒子中絕緣粒子是否自導電性粒子之表面 脫離’按下述評價基準評價絕緣粒子之附著性。 [絕緣粒子之附著性之評價基準] 〇〇:絕緣粒子之總個數之90%以上未自導電性粒子之 表面脫離 〇:絕緣粒子之總個數之6〇%以上、未滿9〇%未自導電 性粒子之表面脫離 △:絕緣粒子之總個數之3〇%以上、未滿6〇%未自導電 性粒子之表面脫離 X :絕緣粒子之總個數之未滿3〇%未自導電性粒子之表 面脫離 (3)附帶絕緣粒子之導電性粒子之分散性 觀察上述(2)絕緣粒子之附著纟之評價中所得之異向性 導電材料(異向性導電糊)中,附帶絕緣粒子之導電性粒子 是否沈降,及是否產生凝聚之附帶絕緣粒子之導電性粒 子。按下述評價基準評價附帶絕緣粒子之導電性粒子之八 散性。 刀 [附帶絕緣粒子之導電性粒子之分散性之評價基準] 〇〇··未產生凝聚之附帶絕緣粒子之導電性粒子 . 〇 :約25萬個中’稍許產生凝聚之附帶料粒子之導電 性粒子 X :約25萬個中,明顯產生凝聚之附帶絕緣粒子之 性粒子 ⑷之絕緣性試驗 150671.doc •33- 201122077 將上述(2)絕緣粒子之附著性之評價中所得之樹脂組合 物以乾燥後之厚度成為丨〇 pm之方式塗佈於脫模膜上,使 乙酸乙酯蒸發,獲得不含附帶絕緣粒子之導電性粒子之第 1接著膜。 又’將上述(2)絕緣粒子之附著性之評價中所得之異向 性導電材料以乾燥後之厚度成為7 μπι之方式塗佈於脫模膜 上’使曱笨蒸發’獲得含有附帶絕緣粒子之導電性粒子之 第2接著膜。於所得之不含附帶絕緣粒子之導電性粒子之 第1接著膜上,於常溫下貼合所得之含有附帶絕緣粒子之 導電性粒子之第2接著膜,藉此獲得2層構造之厚度丨7 μηι 之異向性導電膜。 將所得之異向性導電膜切割成4 mmxl8 mm之大小。 =,準備於下表面具有梳形圖案(線條數為4〇〇條,重疊部 分之長度為2 mm,線寬為2〇叫,線間隔為2〇叫線高 度為18㈣之由金形成之電極的石夕晶圓(縱向3⑺叫黃向二 _x厚度! _)。進而,準備於上表面具有由ιτ〇形成之電 極之玻璃基板(縱向2 mmx橫向12.5 mmx厚度! mm)。 於上述梦晶圓之下表面’自第2接著膜側貼附所得之異 向性導電膜。繼m述玻璃基板上,自異向性導電膜 側積層上述石夕晶圓。其後’於下述條件ι及條件2下敎愿 接’獲得測定樣品。測定所得之2〇個測定樣品之電極間之 電阻值’數出電阻值為W⑽上之測定樣品之數量,按 下述評價基準評價。 條件1 : 20N之加壓下、150t下加熱3〇分鐘 150671.doc -34- 201122077 條件2:200 N之加壓下、2〇〇t:下加熱%秒鐘 [鄰接電極間之絕緣性試驗之評價基準] 〇〇:電阻值為H) 8 Ω以上之測定樣品之比例為8 〇 %以上 0 :電阻值為ΙΟ8 Ω以上之測定樣品之比例為6〇%以上、 未滿80% x .電阻值為ΙΟ8 Ω以上之測定樣品之比例未滿6〇% (5) 對向電極間之導通試驗 將上述(4)鄰接電極間之絕緣性試驗中所得之異向性導 電膜切割成5 mmx5 mm之大小。又,準備於單面具有IT〇 屯極之玻璃基板(縱向25 mmx橫向35 mmx厚度1 mm) 〇 於上述玻璃基板之没有上述ITO電極之面之中央區域貼 附異向性導電膜後’以電極相對向之方式對位,貼附另一 片上述玻璃基板。其後’藉由下述條件1及條件2進行熱壓 接’獲得測定樣品。藉由四端子法測定所得之2〇個測定樣 品之電阻值’數出電阻值為5 Ω以下之測定樣品之數量, 按下述評價基準評價。 條件1 : 20 N之加壓下、15(TC下加熱30分鐘 條件2 : 200 N之加壓下、200°C下加熱30秒鐘 [電極間之導通試驗之評價基準] 〇:電阻值為5 Ω以下之測定樣品之比例為80%以上 △:電阻值為5 Ω以下之測定樣品之比例為60%以上、 未滿80% x :電阻值為5 Ω以下之測定樣品之比例未滿60% (6) 密接性試驗 150671.doc -35- 201122077 準備於上述對向電極間之導通試驗⑺之上述條件工下獲 得之測定樣品。將該測定樣品於饥下6小時及ΐ2〇Μ6 J時之循ί衣下放置300小時。其後,藉由sem觀察測定樣 品之剖面,觀察導電性粒子·絕緣粒子間、及絕緣粒子-黏 σ树月曰間之界面剝離之有無,按下述評價基準評價。 [後接性試驗之評價基準] 〇·導電性粒子-絕緣粒子間或絕緣粒子-黏合樹脂間無 界面剝離 △:導電性粒子-絕緣粒+間或絕緣粒子_黏合樹脂間有 些微界面剝離 X :導電性粒子-絕緣粒子間或絕緣粒子_黏合樹脂間有 些微界面剝離 (7) 導電率 使用攪拌機,使實施例之附帶絕緣粒子之導電性粒子或 比較例之導電性粒子〇·5 下分散於離子交換水5〇 § 中,獲得分散液。將該分散液於100它下放置1〇小時。使 用過據裝置,自放置後之分散液中去除附帶絕緣粒子之導 電性粒子或導電性粒子而獲得液體。使用導電率計⑺助 METER ES-51(崛場製作所公司製造)測定所得液體之導電 率〇 (8) 發熱量 使實施例之附帶絕緣粒子之導電性粒子及比較例之導電 性粒子0·03 g於23。(:下分散於曱苯1〇 §中,使用微熱卡計 「TAMIII」(Τ·A.Instrumenw 51製造)測定此時之該分散液 150671.doc •36· 201122077 中附帶絕緣粒子之導電性粒子或導電性粒子每1 g之發熱 量。 將結果示於下述表1中。 150671.doc -37- 201122077 【1<】 比較例2 一 1 C0 〇 1 X 1 1 1 t ( 00 比較例1 - 1 < 2 〇 1 X 1 1 1 1 1 00 m 實施例10 Si-OH 基 CQ 2 〇 〇 〇 〇 0 〇 0 m 00 Os 實施例9 IQ Si-OH 基 < 2 (N 0 〇 〇 〇 0 〇 〇 Ον 實施例8 〇 Si-OH 基 CQ 2 (N »〇 〇 〇 〇 〇 0 〇 〇 ο § 實施例7 〇 Si-OH基 | < 2 〇 〇 〇 〇 〇 〇 〇 (Ν (N 實施例6 U P-OH 基 CQ 2 CS 1 〇〇 00 〇〇 〇〇 0 〇 〇 00 462 I 實施例5 U P-OH 基 < 2 m 1 〇〇 00 〇〇 〇〇 〇 〇 〇 呀 387 實施例4 | CQ i P-OH基 0Q 2 00 00 〇〇 00 0 〇 〇 ON 537 實施例3 P-OH 基 < 2 〇〇 00 〇〇 〇〇 0 〇 0 二 280 實施例2 < P-OH 基 CQ 2 〇〇 00 〇〇 〇〇 0 〇 0 Tj· 實施例丨| < P-OH 基 < 〇〇 00 〇〇 〇〇 0 〇 0 m 300 | 種類 表面之基 種類 表面之導電層 被a率(%) 絕緣粒子之附著性 粒子之分散性 條件1 條件2 條件1 條件2 密接性試驗 導電率(pS/cm) 發熱量(mJ) 絕緣粒子 導電性粒子 锣£} 150671.doc ·38· 201122077 【圖式簡單說明】 圖1是表示本發明之一實施形態之附帶絕緣粒子之導電 性粒子的剖面圖。 _ 圖2是表示本發明之其他實施形態之附帶絕緣粒子之導 電性粒子的剖面圖。 圖3是使用本發明之一實施形態之附帶絕緣粒子之導電 性粒子的連接構造體之部分切缺剖面圖。 圖4是表示圖3所示之連接構造體之變形例的部分切缺剖 面圖。 【主要元件符號說明】 1 附帶絕緣粒子之導電性粒子 1A〜1D 附帶絕緣粒子之導電性粒子 2 導電性粒子 2a 表面 3 絕緣粒子 3a 表面 4 基材粒子 4a 表面 5 導電層 11 附▼絕緣粒子之導電性粒子 12 導電性粒子 12a 表面 21 連接構造體 22 第1連接對象構件 150671.doc -39- 201122077 22a 上表面 22b 電極 23 第2連接對象構件 23 a 下表面 23b 電極 24 連接部 25 黏合樹脂 26 來源於絕緣粒子之層 150671.doc -40-In the case of mL 150671.doc 201122077, it was sufficiently dispersed by an ultrasonic processor to obtain a particle suspension. The suspension was stirred while being stirred at 5 Torr, and slowly added with sulfuric acid 02.02 m〇I/L, ethylenediamine 0.04 mol/L as a correcting agent, and sodium formate 0.06 as a reducing agent. The electroless plating solution of m〇i/L and the crystal modifier is pH-free, and electroless palladium plating is performed. The electroless palladium is ended when the thickness of the palladium layer becomes 〇〇3. Then, it was washed and vacuum dried, whereby the conductive particles B having a palladium layer on the surface layer of the lock layer were obtained. (Preparation of Conductive Particles Included with Insulating Particles) (Example 1) ^ The obtained insulating particles A were dispersed in steamed water under ultrasonic irradiation to obtain an 8% by weight aqueous dispersion of insulating particles. The obtained conductive particles A H) g were dispersed in the steamed water 5 (10) red, and 4 g of the water dispersion of the insulating particles a was added, and the mixture was stirred at room temperature for 6 hours. After the _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ In the same manner as in the first embodiment, the insulating particles (Comparative Example 1) / the insulating particles 1 and the conductive particles 8 were obtained in the same manner as in Example 1, and the conductive particles with insulating particles were supplied in the same manner as in the above. The particles I do not adhere to the conductive particles A. , Λ ^ Insulation to be obtained (Comparative Example 2) 150671.doc • 31 · 201122077 In the same manner as in Example ,, the insulating particles τ and the conductive particles B were used, and an attempt was made to obtain conductive particles with insulating particles. However, the insulating particles I do not adhere to the conductive particles B. (Evaluation) (1) Coverage ratio The obtained conductive particles with insulating particles were observed using a scanning electron microscope (SEM, Scanning Ε1_〇η Microscope). The coverage of the conductive particles with the insulating particles was measured by image analysis of S E Μ. In the SEM image, a circle having a diameter of half the diameter of the conductive particles with insulating particles is drawn, and the coverage of the conductive particles with the insulating particles in the circle is determined (the conductivity of the incident insulating particles in the circle) The projected area per particle, the number of conductive particles with insulating particles, and the projected area of conductive particles with insulating particles in the circle. (2) Adhesion of insulating particles: 10 parts by weight of epoxy resin (made by Japan Epoxy Resin Co., Ltd.) 10 parts by weight of 'acrylic rubber (weight average molecular weight: about 10,000) 40 parts by weight, microcapsule type 50 parts by weight of a hardening agent (α_ a-, 司w hX3941HP), 2 parts by weight of Shi Xi Shao coupling agent (Dongli Dao Kangding, "SH6_" manufactured by Xiyang A Division), and ethyl acetate (10) The resin composition was obtained. The conductive particles with the insulating particles were added to the resin plant at a content of 3% by volume to obtain an anisotropic conductive material. In part, the conductive particles with the anisotropic conductive material insulating particles obtained by the cleaning were taken out. SEM, 15067l.doc • 32· 201122077 Whether or not the insulating particles are separated from the surface of the conductive particles in the conductive particles of the edge particles The adhesion of the insulating particles was evaluated according to the following evaluation criteria. [Evaluation criteria for adhesion of insulating particles] 〇〇: 90% or more of the total number of insulating particles is not separated from the surface of the conductive particles 〇: 6〇% or more of the total number of insulating particles, less than 9〇% The surface of the conductive particles is not separated by Δ: 3〇% or more of the total number of insulating particles, and less than 6% of the insulating particles are not separated from the surface of the conductive particles. X: The total number of insulating particles is less than 3〇%. The surface of the conductive particles is detached. (3) The dispersibility of the conductive particles with the insulating particles is observed. (2) The anisotropic conductive material (anisotropic conductive paste) obtained in the evaluation of the adhesion 绝缘 of the insulating particles is attached. Whether or not the conductive particles of the insulating particles are sedimented, and whether or not the conductive particles of the incident insulating particles are aggregated. The absorptivity of the conductive particles with insulating particles was evaluated according to the following evaluation criteria. Knife [Evaluation criteria for dispersibility of conductive particles with insulating particles] 导电·· Conductive particles with incident insulating particles that do not form cohesion. 〇: Conductivity of incidental particles with a little agglomeration in about 250,000 Particle X: Insulation test of the particles (4) with agglomerated insulating particles which are apparently agglomerated in about 250,000. 150671.doc • 33- 201122077 The resin composition obtained in the evaluation of the adhesion of the above (2) insulating particles is The thickness after drying was applied to the release film so as to be 丨〇pm, and ethyl acetate was evaporated to obtain a first adhesive film containing no conductive particles with insulating particles. Further, the anisotropic conductive material obtained by the evaluation of the adhesion of the above-mentioned (2) insulating particles was applied to the release film so that the thickness after drying became 7 μm, and the obtained anisotropic insulating particles were obtained. The second adhesive film of the conductive particles. The second adhesive film containing the conductive particles with insulating particles obtained by bonding the obtained first conductive film containing the conductive particles with the insulating particles to the obtained second bonding film at a normal temperature, thereby obtaining a thickness of the two-layer structure 丨7 An anisotropic conductive film of μηι. The resulting anisotropic conductive film was cut into a size of 4 mm x 18 mm. =, prepared to have a comb pattern on the lower surface (the number of lines is 4 ,, the length of the overlapping portion is 2 mm, the line width is 2 〇, the line spacing is 2 〇, the line height is 18 (four), the electrode formed by gold The stone ray wafer (longitudinal 3 (7) is called yellow to two _x thickness! _). Further, a glass substrate (longitudinal 2 mm x lateral 12.5 mm x thickness! mm) prepared on the upper surface with an electrode formed by ιτ〇 is prepared. The obtained lower surface of the wafer is attached to the obtained anisotropic conductive film from the second adhesive film side. The glass substrate is stacked on the glass substrate, and the above-mentioned Si Xi wafer is laminated on the side of the anisotropic conductive film. In the case of ι and condition 2, the measurement sample was obtained. The resistance value between the electrodes of the obtained two measurement samples was measured, and the number of the measurement samples on the resistance value W (10) was counted and evaluated according to the following evaluation criteria. : 20N under pressure, heating at 150t for 3〇150671.doc -34- 201122077 Condition 2: 200 N under pressure, 2〇〇t: lower heating for 1 second [Evaluation of insulation test between adjacent electrodes Benchmark] 〇〇: The resistance value is H) The ratio of the measured sample of 8 Ω or more is 8 〇% Upper 0: The ratio of the measurement sample whose resistance value is ΙΟ8 Ω or more is 6〇% or more and less than 80% x. The ratio of the measurement sample whose resistance value is ΙΟ8 Ω or more is less than 6〇% (5) between the counter electrodes Conduction test The anisotropic conductive film obtained in the above (4) insulation test between adjacent electrodes was cut into a size of 5 mm x 5 mm. Further, a glass substrate having an IT surface on one side (longitudinal 25 mm x lateral direction 35 mmx thickness: 1 mm) is prepared after attaching an anisotropic conductive film to a central portion of the glass substrate having no surface of the ITO electrode. The electrodes are aligned opposite each other, and another piece of the above glass substrate is attached. Thereafter, a measurement sample was obtained by thermocompression bonding under the following conditions 1 and 2. The resistance value of the two measurement samples obtained by the four-terminal method was measured as the number of measurement samples having a resistance value of 5 Ω or less, and evaluated according to the following evaluation criteria. Condition 1: 20 N under pressure, 15 (heating for 30 minutes under TC, condition 2: heating under 200 N, heating at 200 ° C for 30 seconds [Evaluation criteria for conduction test between electrodes] 〇: Resistance value The ratio of the measurement sample of 5 Ω or less is 80% or more. △: The ratio of the measurement sample having a resistance value of 5 Ω or less is 60% or more, less than 80% x: The ratio of the measurement sample having a resistance value of 5 Ω or less is less than 60 % (6) Adhesion test 150671.doc -35- 201122077 The measurement sample obtained under the above conditions of the above-mentioned opposite electrode conduction test (7) was prepared. The measurement sample was subjected to hunger for 6 hours and ΐ2〇Μ6 J. After immersing for 3-5 hours, the cross section of the sample was observed by sem observation, and the presence or absence of interfacial peeling between the conductive particles and the insulating particles and between the insulating particles and the viscous sap was observed. Benchmark evaluation [Evaluation criteria for the adhesion test] 导电 · Conductive particles - Inter-insulating particles or insulating particles - No interfacial peeling between the bonding resins △: Conductive particles - Insulating particles + Inter- or Insulating particles - Adhesive resin Interfacial peeling X: Conductive particles - between insulating particles or insulation There is some micro-interface peeling between the particles_adhesive resin. (7) Conductivity The conductive particles of the insulating particles with the insulating particles of the examples or the conductive particles of the comparative example were dispersed in the ion-exchanged water 5 § using a stirrer. The dispersion was placed under 100 for 1 hour, and the conductive particles or conductive particles with insulating particles were removed from the dispersed dispersion to obtain a liquid using a passing apparatus. METER ES-51 (manufactured by Horiba Seisakusho Co., Ltd.) measured the conductivity of the obtained liquid 〇 (8) The calorific value of the conductive particles of the insulating particles of the examples and the conductive particles of the comparative example of 0·03 g were at 23 (: The dispersion was dispersed in a benzene benzene, and the conductive particles or conductive materials with insulating particles were measured using a microcalorimeter "TAMIII" (manufactured by Τ·A. Instrumenw 51) at the time of the dispersion 150671.doc • 36· 201122077 The calorific value of the particles per 1 g. The results are shown in the following Table 1. 150671.doc -37- 201122077 [1<] Comparative Example 2 A 1 C0 〇1 X 1 1 1 t (00 Comparative Example 1 - 1 < 2 〇1 X 1 1 1 1 1 00 m Example 10 Si-OH group CQ 2 〇〇〇〇0 〇0 m 00 Os Example 9 IQ Si-OH group < 2 (N 0 〇〇〇0 〇〇Ον Example 8 〇Si-OH group CQ 2 (N »〇〇〇〇〇0 〇〇ο § Example 7 〇Si-OH group| < 2 〇〇〇〇〇〇〇(Ν (N Example 6 U P-OH group CQ 2 CS 1 〇〇00 〇〇〇〇0 〇〇00 462 I Example 5 U P-OH group < 2 m 1 〇〇00 〇〇〇〇〇〇〇 387 Example 4 | CQ i P-OH group 0Q 2 00 00 〇〇00 0 〇〇ON 537 Example 3 P-OH group < 2 〇〇00 〇〇〇〇0 〇0 2280 Example 2 < P-OH group CQ 2 〇〇00 〇〇〇〇 0 〇0 Tj· Example 丨| < P-OH group < 〇〇00 〇〇〇〇0 〇0 m 300 | Conductive layer on the surface of the type of surface type is a rate (%) adhesion of insulating particles Dispersion conditions of particles 1 Condition 2 Condition 1 Condition 2 Conductivity test Conductivity (pS/cm) Calorific value (mJ) Insulating particle conductive particles 150£157671.doc ·38· 201122077 [Simple diagram] Figure 1 Yes Sectional view of the conductive particles in the insulating particles included with one embodiment of the invention. Fig. 2 is a cross-sectional view showing conductive particles with insulating particles according to another embodiment of the present invention. Fig. 3 is a partially cutaway cross-sectional view showing a bonded structure in which conductive particles with insulating particles according to an embodiment of the present invention are used. Fig. 4 is a partially cutaway cross-sectional view showing a modification of the connection structure shown in Fig. 3; [Explanation of main component symbols] 1 Conductive particles with insulating particles 1A to 1D Conductive particles with insulating particles 2 Conductive particles 2a Surface 3 Insulating particles 3a Surface 4 Substrate particles 4a Surface 5 Conductive layer 11 With ▼ insulating particles Conductive particle 12 Conductive particle 12a Surface 21 Connection structure 22 First connection object member 150671.doc -39- 201122077 22a Upper surface 22b Electrode 23 Second connection object member 23 a Lower surface 23b Electrode 24 Connection portion 25 Adhesive resin 26 Layer derived from insulating particles 150671.doc -40-

Claims (1)

201122077 七、申請專利範圍: 一種附帶絕緣粒子之導電性粒子,其包含: 表面具有導電層之導電性粒子、及 附著於上述導電性粒子 包丨祖卞之表面之絕緣粒子,且 上述絕緣粒子於矣而g 士 、表面八有直接鍵結於磷原子之羥基或 直接鍵結於矽原子之羥基。 =月求項1之附帶絕緣粒子之導電性粒子,其中上述絕 矽於表面具有下述式⑴)所表示之基或直接鍵結於 石夕原子之羥基, [化I] X1 D. HO-— Ο 上 烷基 3. 如 述式(11)中’ XI表示羥基、烷氧基或碳數為卜12之 °月求項2之附帶絕緣粒子之導電性粒子 (11)所# - 丹干上述式 不之基為下述式(11A)所表示之基, [化2] ...式(11A) Ο 150671.doc 201122077 4. 5. 如請求項1之附帶絕緣粒子 祕如, 等電性粒子,其中上述筚 緣粒子為使用具有直接鍵姓 、 蕙、於磷原子之羥基之化合物、 具有直接鍵結㈣原子之經基之化合物作為材料者。 之附帶絕緣粒子之導電性粒子,其中上述絕 緣粒子為使用下述式⑴所表*之化合物或具有直接鍵結 於矽原子之羥基之化合物作為材料者, [化3] Χ1 ΗΟ—|—Χ2 …式⑴ Ο 一上述式(〗)中,XI表示羥基、烷氧基或碳數為卜Μ之 烧基’ Χ2表示含不飽和鍵之有機基。 6.如請求項5之附帶絕緣粒子之導電性粒子,其中上述式 (1)所表示之化合物為下述式(1Α)所表示之化合物’ [化4] ΟΗ ΗΟ·—j—X2 …式(ία) 0 上述式(1A)中,X2表示含不飽和鍵之有機基。 如請求項1之附帶絕緣粒子之導電性粒子,其中上述導 電性粒子包含基材粒子、及被覆該基材粒子之表面之導 電層。 150671.doc 201122077 如凊求項2之附帶絕緣粒子之導電性粒子,其中上述導 ί子包含基材粒子、及被覆該基材粒子之表面之導 電層。 9,如。月求項3之附帶絕緣粒子t導電性粒子,纟中上述導 ^子包含基材粒子、及被覆該基材粒子之表面之導 電層。 10.如凊求項4之附帶絕緣粒子之導電性粒子,其中上述導 電I1 生粒子包含基材粒子、及被覆該基材粒子之表面之導 電層。 Π.如請求項5之附帶絕緣粒子之導電性粒子,其中上述導 電性粒子包含基材粒子、及被覆該基材粒子之表面之導 電層。 12·如請求項6之附帶絕緣粒子之導電性粒子,其中上述導 電性粒子包含基材粒子、及被覆該基材粒子之表面 電層。 13.如請求項1至12中任-項之附帶絕緣粒子之導電性粒 子,其中於將使附帶絕緣粒子之導電性粒子〇5呂在^它 下分散於離子交換水5 〇 g中之分散液於丨〇 〇。匚下放置1 〇小 時,然後自分散液中去除附帶絕緣粒子之導電性粒子而 獲得液體時’所得液體之導電率為汕…⑽以下。 14.如請求項1至12中任一項之附憨绍 $之附▼絕緣粒子之導電性粒 子’其令於使附帶絕緣粒子之導電性粒子〇〇3 g在饥 下分散於甲苯1.0 g中時,分θ g吁”散液之發熱量係附帶絕緣粒 子之導電性粒子每1 g為】〇 mJ以上。 J50671.doc 201122077 之附帶絕緣粒子之導電性粒子,其中於使附 帶:邑緣粒子之導電性粒子0.03咖下分散於甲苯1〇 枓時’分散液之發熱量係附帶絕緣粒子之導電性粒子 每1 g為10 mJ以上。 A如請求項1至12中任一項之附帶絕緣粒子之導電性粒 子,其中上述導電層之最表面為金層、錄層或把層。 17·如請求们3之附帶絕緣粒子之導電性粒子,其中上述導 電層之最表面為金層、鎳層或鈀層。 18·如請求項14之附帶絕緣粒子之導電性粒子,其_上述導 電層之最表面為金層、鎳層戚鈀層。 19·如請求項15之附帶絕緣粒子之導電性粒子其_上述導 電層之最表面為金層、鎳層或鈀層。 20. -種附帶絕緣粒子之導電性粒子之製造方法,該附帶絕 緣粒子之導電性粒子包含表面具有導電層之導電性粒 子、及附著於該導電性粒子之表面之絕緣粒子,該方法係 使表面具有直接鍵結於磷原子之羥基或直接鍵結於矽 原子之羥基之絕緣粒子附著於上述導電性粒子之表面。 21·如請求項20之附帶絕緣粒子之導電性粒子之製造方法, 其中使用具有直接鍵結於磷原子之羥基之化合物或具有 直接鍵結於矽原子之羥基之化合物,藉此獲得表面具有 上述直接鍵結於磷原子之羥基或直接鍵結於矽原子之羥 基之上述絕緣粒子。 22.種異向性導電材料,其包含如請求項1至19中任一項 之附帶絕緣粒子之導電性粒子及黏合樹脂。 150671.doc 201122077 23 ,一種連接構造體,龙 象構件、及將^ 3第1連接對象構件、第2連接對 -、第2連接對象構件 上述連接部係由如連接之連接部,且 粒子之導電性粒子、卞—入 項之附帶絕緣 或包含該附帶絕緣粒子導 子及黏合樹脂之異向性導電材料所形成。 150671.doc201122077 VII. Patent application scope: A conductive particle with insulating particles, comprising: conductive particles having a conductive layer on a surface thereof; and insulating particles attached to a surface of the conductive particles, and the insulating particles are矣 g g, surface eight has a direct bond to the hydroxyl group of the phosphorus atom or directly bonded to the hydroxyl group of the ruthenium atom. The electroconductive particle with the insulating particles of the first aspect, wherein the above-mentioned surface has a group represented by the following formula (1)) or a hydroxyl group directly bonded to the stone atom, [Chemical I] X1 D. HO- — Ο 上 alkyl 3. As shown in the formula (11), XI represents a hydroxyl group, an alkoxy group or a conductive particle with a carbon number of 12, which is accompanied by an insulating particle (11)# - Dangan The base of the above formula is a group represented by the following formula (11A), [Chemical Formula 2] Formula (11A) Ο 150671.doc 201122077 4. 5. The incidental insulating particle of claim 1 is secret, isoelectric The particles are those in which a compound having a direct bond name, a ruthenium, a hydroxyl group at a phosphorus atom, or a compound having a direct bond (tetra) atom is used as a material. The conductive particles with insulating particles, wherein the insulating particles are compounds using a compound represented by the following formula (1) or a compound having a hydroxyl group directly bonded to a ruthenium atom as a material, [Chemical 3] Χ1 ΗΟ-|-Χ2 Formula (1) Ο In the above formula (1), XI represents a hydroxyl group, an alkoxy group or a carbon group having a carbon number of diarrhea, and Χ2 represents an organic group having an unsaturated bond. 6. The conductive particle with an insulating particle according to claim 5, wherein the compound represented by the above formula (1) is a compound represented by the following formula (1): [Chemical Formula 4] ΟΗ ΗΟ·—j—X2 (ία) 0 In the above formula (1A), X2 represents an organic group containing an unsaturated bond. The conductive particles with insulating particles according to claim 1, wherein the conductive particles comprise substrate particles and a conductive layer covering a surface of the substrate particles. The conductive particles with insulating particles according to Item 2, wherein the conductive particles include substrate particles and a conductive layer covering the surface of the substrate particles. 9, such as. In the case of the third aspect, the insulating particles t-conductive particles are contained, and the conductive material in the crucible includes a substrate particle and a conductive layer covering the surface of the substrate particle. 10. The conductive particles of the insulating particles according to claim 4, wherein the conductive particles are a substrate particle and a conductive layer covering a surface of the substrate particle. The conductive particles with insulating particles according to claim 5, wherein the conductive particles comprise substrate particles and a conductive layer covering a surface of the substrate particles. The conductive particles with insulating particles according to claim 6, wherein the conductive particles comprise substrate particles and a surface layer covering the substrate particles. 13. The conductive particles of the accompanying insulating particles according to any one of claims 1 to 12, wherein the conductive particles of the accompanying insulating particles are dispersed in the ion exchange water 5 〇g Liquid in the sputum. When the crucible is left for 1 Torr, and the conductive particles with the insulating particles are removed from the dispersion to obtain a liquid, the conductivity of the obtained liquid is 汕...(10) or less. 14. The conductive particles of the insulating particles attached to any one of claims 1 to 12, wherein the conductive particles 附带3 g with the insulating particles are dispersed in toluene 1.0 g. In the middle, the amount of heat generated by the dispersion is 〇mJ or more per 1 g of the conductive particles of the insulating particles. J50671.doc 201122077 Conductive particles with insulating particles, When the conductive particles of the particles are dispersed in toluene at a temperature of 0.03, the heat generation amount of the dispersion liquid is 10 mJ or more per 1 g of the conductive particles with the insulating particles. A is attached to any one of claims 1 to 12. The conductive particles of the insulating particles, wherein the outermost surface of the conductive layer is a gold layer, a recording layer or a layer. 17. The conductive particles of the insulating particles of claim 3, wherein the outermost surface of the conductive layer is a gold layer, A nickel-plated layer or a palladium layer. The conductive particle of the insulating particles according to claim 14, wherein the outermost surface of the conductive layer is a gold layer or a nickel layer palladium layer. Conductive particles The outermost surface is a gold layer, a nickel layer or a palladium layer. 20. A method for producing conductive particles with insulating particles, the conductive particles with insulating particles comprising conductive particles having a conductive layer on a surface, and adhesion to the conductive particles The insulating particles on the surface of the particles are such that the surface has a hydroxyl group directly bonded to the phosphorus atom or an insulating particle directly bonded to the hydroxyl group of the germanium atom, and is attached to the surface of the conductive particle. A method for producing conductive particles with insulating particles, wherein a compound having a hydroxyl group directly bonded to a phosphorus atom or a compound having a hydroxyl group directly bonded to a halogen atom is used, whereby a surface having the above direct bond to a phosphorus atom is obtained a hydroxy group or the above-mentioned insulating particles directly bonded to a hydroxyl group of a ruthenium atom. 22. An anisotropic conductive material comprising the conductive particles of the accompanying insulating particles according to any one of claims 1 to 19 and a binder resin. Doc 201122077 23 , a connection structure, a dragon image member, and a first connection object, a second connection pair, and a second connection object The above-mentioned connecting portion is formed by, for example, a connecting portion of the connecting portion, and conductive particles of the particles, incidental insulation of the bismuth, or an anisotropic conductive material containing the insulating particle guide and the adhesive resin.
TW099130356A 2009-09-08 2010-09-08 Conductive particles with attached insulating particles, method for producing conductive particles with attached insulating particles, anisotropic conductive material, and connection structure TW201122077A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009207175 2009-09-08

Publications (2)

Publication Number Publication Date
TW201122077A true TW201122077A (en) 2011-07-01
TWI372779B TWI372779B (en) 2012-09-21

Family

ID=43732388

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099130356A TW201122077A (en) 2009-09-08 2010-09-08 Conductive particles with attached insulating particles, method for producing conductive particles with attached insulating particles, anisotropic conductive material, and connection structure

Country Status (5)

Country Link
JP (2) JP4993230B2 (en)
KR (1) KR101222375B1 (en)
CN (1) CN102549676B (en)
TW (1) TW201122077A (en)
WO (1) WO2011030715A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI807004B (en) * 2018-04-04 2023-07-01 日商積水化學工業股份有限公司 Conductive particles with insulating particles, conductive materials and connection structures

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5620342B2 (en) * 2011-06-17 2014-11-05 積水化学工業株式会社 Conductive particles with insulating particles, anisotropic conductive material, and connection structure
JP5982217B2 (en) * 2011-08-08 2016-08-31 積水化学工業株式会社 Conductive particles, anisotropic conductive materials, and connection structures
JP6119130B2 (en) * 2012-07-11 2017-04-26 日立化成株式会社 Composite particles and anisotropic conductive adhesive
WO2014054572A1 (en) * 2012-10-02 2014-04-10 積水化学工業株式会社 Conductive particle, conductive material and connecting structure
KR102095291B1 (en) * 2012-11-28 2020-03-31 세키스이가가쿠 고교가부시키가이샤 Conductive particle with insulating particles, conductive material and connection structure
JP6212369B2 (en) * 2012-12-05 2017-10-11 積水化学工業株式会社 Conductive particles with insulating particles, method for producing conductive particles with insulating particles, conductive material, and connection structure
JP6577698B2 (en) * 2013-05-14 2019-09-18 積水化学工業株式会社 Conductive film and connection structure
EP3096330B1 (en) * 2014-01-14 2019-04-10 Toyo Aluminium Kabushiki Kaisha Composite conductive particle, conductive resin composition containing same and conductive coated article
KR102150607B1 (en) * 2014-09-12 2020-09-01 엘지이노텍 주식회사 Inorganic filler, epoxy resin composition comprising the same and light emitting element comprising isolation layer using the same
KR20210029143A (en) 2018-07-06 2021-03-15 세키스이가가쿠 고교가부시키가이샤 Conductive particles, conductive materials, and connection structures with insulating particles
JP7132112B2 (en) * 2018-12-11 2022-09-06 積水化学工業株式会社 Conductive film and connection structure

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004241489A (en) * 2003-02-04 2004-08-26 Sekisui Chem Co Ltd Anisotropic conductive light postcure type paste, connecting method of electric component employing it and electric component
JP2005187637A (en) * 2003-12-25 2005-07-14 Sekisui Chem Co Ltd Anisotropically electroconductive adhesive, top/bottom conductive material for liquid crystal display device and liquid crystal display device
KR100637763B1 (en) * 2004-05-12 2006-10-23 주식회사 마이크로글로브 Insulated conductive ball for anisotropic electric connection and its method of preparation and products using the same
JP4563110B2 (en) * 2004-08-20 2010-10-13 積水化学工業株式会社 Method for producing conductive fine particles
KR100662176B1 (en) * 2004-12-30 2006-12-27 제일모직주식회사 Anisotropic conductive film composition
JP2006269296A (en) * 2005-03-24 2006-10-05 Sekisui Chem Co Ltd Manufacturing method of particle with protrusions, particle with protrusions, conductive particle with protrusions, and anisotropic conductive material
JP4936775B2 (en) * 2005-04-26 2012-05-23 旭化成イーマテリアルズ株式会社 Conductive particle connection structure
CN101523513B (en) * 2006-10-17 2012-01-11 日立化成工业株式会社 Coated particle and method for producing the same, composition and adhesive film formed therefor
JP2008120990A (en) 2006-10-17 2008-05-29 Hitachi Chem Co Ltd Anisotropically electroconductive adhesive composition, anisotropically electroconductive film, connection structure of circuit member and process for producing coated particle
JP4957695B2 (en) * 2007-10-02 2012-06-20 日立化成工業株式会社 Conductive particle, method for producing the same, method for producing insulating coated conductive particle, and anisotropic conductive adhesive film
JP5024260B2 (en) * 2007-11-01 2012-09-12 日立化成工業株式会社 Conductive particles, insulating coated conductive particles and manufacturing method thereof, anisotropic conductive adhesive

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI807004B (en) * 2018-04-04 2023-07-01 日商積水化學工業股份有限公司 Conductive particles with insulating particles, conductive materials and connection structures

Also Published As

Publication number Publication date
WO2011030715A1 (en) 2011-03-17
CN102549676A (en) 2012-07-04
JP4993230B2 (en) 2012-08-08
TWI372779B (en) 2012-09-21
KR20120049904A (en) 2012-05-17
JPWO2011030715A1 (en) 2013-02-07
JP2012094529A (en) 2012-05-17
CN102549676B (en) 2013-06-12
KR101222375B1 (en) 2013-01-15

Similar Documents

Publication Publication Date Title
TW201122077A (en) Conductive particles with attached insulating particles, method for producing conductive particles with attached insulating particles, anisotropic conductive material, and connection structure
JP6475805B2 (en) Conductive particles with insulating particles, conductive material, and connection structure
KR101614675B1 (en) Conductive particles, conducting material, and connection structure
TW201207071A (en) Conductive particle with insulative particles attached thereto, anisotropic conductive material, and connecting structure
TWI601158B (en) Conductive particles, a conductive material, and a connecting structure
JP6165626B2 (en) Conductive particles, conductive materials, and connection structures
TW201239909A (en) Conductive particle, conductive particle manufacturing method, anisotropic conductive material, and connective structure
KR20150108347A (en) Base material particle, conductive particle, conductive material, and connection structure
JP6165625B2 (en) Conductive particles, conductive materials, and connection structures
JP2019114552A (en) Base particle, conductive particle, conductive material, and connection structure
KR20150108346A (en) Base material particle, conductive particle, conductive material, and connection structure
WO2016063941A1 (en) Conductive particles, conductive material and connection structure
JP5821551B2 (en) Conductive particles, anisotropic conductive materials, and conductive connection structures
JP2022022293A (en) Conductive particle, conductive material, and connection structure
JP5484265B2 (en) Conductive particles, conductive particles with insulating particles, anisotropic conductive material, and connection structure
JP2014029856A (en) Conductive particles with insulating particles, conductive material, and connection structure
JP6789118B2 (en) Manufacturing method of connection structure and connection structure
JP6577723B2 (en) Conductive particles with insulating particles, conductive material, and connection structure
JP6200318B2 (en) Conductive particles, conductive materials, and connection structures
JP5796232B2 (en) Conductive particles, anisotropic conductive materials, and connection structures
JP2016094555A (en) Polymer fine particle, conductive fine particle and anisotropic conductive material
JPWO2020009238A1 (en) Conductive particles with insulating particles, conductive materials and connecting structures
JP6066734B2 (en) Conductive particles, conductive materials, and connection structures
WO2018139552A1 (en) Insulation covered conductive particles, anisotropic conductive film, method for producing anisotropic conductive film, connection structure and method for producing connection structure
JPWO2019194133A1 (en) Conductive particles with insulating particles, methods for producing conductive particles with insulating particles, conductive materials and connecting structures