TW201118181A - Titanium-copper for electric component - Google Patents

Titanium-copper for electric component Download PDF

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TW201118181A
TW201118181A TW099135532A TW99135532A TW201118181A TW 201118181 A TW201118181 A TW 201118181A TW 099135532 A TW099135532 A TW 099135532A TW 99135532 A TW99135532 A TW 99135532A TW 201118181 A TW201118181 A TW 201118181A
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Taiwan
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grain boundary
reaction phase
boundary reaction
copper
phase
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TW099135532A
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Chinese (zh)
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TWI413698B (en
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Naohiko Era
Hiroyasu Horie
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Jx Nippon Mining & Metals Corp
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    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/08Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R13/00Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
    • H01R13/02Contact members
    • H01R13/03Contact members characterised by the material, e.g. plating, or coating materials

Abstract

The invention provides a titanium-copper actively precipitating TiCu.sub.3 as the stable phase, and excellent in strength and bending processing property. The copper alloy for the electronic component of this invention contains 2.0 to 4.0 % by mass of Ti, and the remaining portion is composed of copper and inevitable impurities. While utilizing an electron microscope to observe the tissue of the cross-section parallel to a rolling direction, there exists a crystal boundary reaction phase comprising Ti-Cu based particles precipitated along the crystal boundary. The average value Avg (D.sub.2/D.sub.1) of the ratio (D.sub.2/D.sub.1) of a diameter D.sub.2 of the minimum circle of the encircled grain boundary reaction phase of each grain boundary reaction phase with respect to a diameter D.sub.1 of the maximum circle encircled by the grain boundary reaction phase, is 1.0 to 6.0. The average value Avg D.sub. 1 is 0.4 to 2.0micrometer. Moreover, the grain boundary reaction phase occupies 1.5 to 15 percent area of the per 1000 micro square meter of observation field.

Description

201118181 六、發明說明: 【發明所屬之技術領域】 本發明係關於一種適合用作連接器等電子零件用構件 之鈦銅及其製造方法。 【先前技術】 近年來,以移動終端等為代表之電子機器之小型化不 斷發展,因此其中所使用之連接器之窄間距化及低背化(1〇评 pr〇fue)之傾向顯著。連接器越小型,接腳寬度㈣ 越窄,且為了成為摺疊得較小之加工形狀,故要求所使用 之構件具有較高的強度以獲得必需之彈性、以及具有可承 受嚴酷彎曲加工之優異彎曲加工性。於該方面,由於含有 鈦之銅合金(以下,稱為「鈦銅」)之強度比較高,且應力緩 和特性在銅合金中最為優異,因此自先前以來用作為特別 要求強度之訊號端子用構件。 鈦銅係時效硬化型之銅合金。若藉由固溶化處理形成 溶質原子即Ti之過飽和固溶體,並自該狀態於低溫下實施 杈長時間之熱處理,則會因為離相分解(spin〇dai decomposition),而使得母相中Ti濃度週期性變動即調變結 構擴展,且強度提高。 為獲得強度及彎曲加工性優異之鈦銅,如何抑制穩定 相即ΤΊ(:ιΐ3係到目前為止之重要課題。其原因在於,由於穩 定相之整合性相對於母相較差,因此若其存在比率增大, 則會對f曲加工性或強度造成不良影響。穩定相較多出現 於以較高之溫度長時間進行時效處理(aging…咖如)時、 201118181 或者固溶化處料充分時。因此,為改善錢之特性,業 界致力於極力抑制於固溶化處理或時效處理等熱處理中生 成穩定相(專利文獻1〜4)。 [專利文獻1]日本特開20〇4— 231985號公報 [專利文獻2]日本特開2〇〇4 — 176163號公報 [專利文獻3]曰本特開2〇〇6_283 142號公報 [專利文獻4]日本特開2〇〇8_ 3〇8734號公報 【發明内容】 先前之用以實現欽銅之高性能化之方*,其基本為抑 制由TiCu3f Ti與Cu之金屬間化合物粒子構成之穩定相⑺ —Cu系之穩定相)’於鈦銅之特性提高方面確實取得了一定 之成果。然而,為了開發滿足預計今後將越來越嚴格之要 求特性之鈦鉬I,認為利用與目前為止*同之方法來針對欽 銅尋求新的可能性是較有助益的。 因此,本發明之課題之一在於提供一種使TiCU3等穩定 相積極地析出,並且強度及彎曲加工性優異之鈦銅。又, 本發明之另一課題在於提供此種鈦銅之製造方法。 本發明人為解決上述課題而進行努力研究後,發現Ti 一 Cu系之穩定相於粒界以未固溶粒子形態分散於cu母相 中之狀態,確實對強度或_曲加工性造成不良影響,但若 Ή-Cu系之穩定相局部地成長且周邊之粒子彼此聚集以 具有-定大小及形狀之析出物粒子群的形態存在,則相反 地不良影響會減輕或無害化。於本發明中,將由沿結晶粒 界出現之此種析出物粒子群構成之與母相不同之相稱為 201118181 粒界反應相」。e i係捕捉了粒界反應相之電子顯微鏡 照片。圖+’沿粒界成長之與母相不同之斑點圖案之相為 粒界反應相。 以上述見解為基礎而完成之本發明之一形態係一種電 子零件用銅合金’其係含有U〜4.0質量%之Ti,且剩餘 :伤由銅及不可避免之雜質構成;於利用電子顯微鏡觀察 平行於壓延方向之剖面之組織時’存在包含沿結晶粒界析 出之Ti Cu系粒子之粒界反應相,關於各個粒界反應相之 包圍粒界反應相之最小圓的直徑〇2相對於由粒界反應相所 匕圍之最大圓的直徑D】之比(DVDi)之平均值八1(〇2/£)丨)為 1.0〜6.0, 〇1之平均值AvgD^ 〇4〜2 〇⑽,進而,粒 界反應相於每1000从m2之觀察視野中佔1.5〜15%之面積。 於本發明之銅合金之一實施形態中,利用電子顯微鏡 觀察平行於壓延方向之剖面之組織時,D2之平均值AvgD2 為1 ·〇〜5.0以m。 於本發明之銅合金之另一實施形態中,利用電子顯微 鏡觀察平行於壓延方向之剖面之組織時,平均結晶粒徑以 近似圓的直毡表示為5 "爪以上、3〇 "爪以下,關於包圍 粒界反應相之各結晶粒’由該結晶粒之粒界所包圍之最大 圓之直徑〇3之平均值AvgD3為AvgD2 < AvgD3。 本發明之銅合金之又一實施形態,合計含有〇〜〇·5質 量/〇之選自由為第3元素群之Mn、Fe、Mg、Co、Ni、Cr、 V、Nb、Mo、7r、q . n[Technical Field] The present invention relates to a titanium copper suitable for use as a member for an electronic component such as a connector, and a method of manufacturing the same. [Prior Art] In recent years, the miniaturization of electronic devices represented by mobile terminals and the like has progressed steadily. Therefore, the narrow pitch and low profile of the connectors used therein have become remarkable. The smaller the connector, the narrower the width (4) of the pin, and in order to be a folded shape, the member to be used is required to have high strength to obtain the necessary elasticity and excellent bending to withstand severe bending. Processability. In this respect, since the copper alloy containing titanium (hereinafter referred to as "titanium copper") has a relatively high strength and the stress relaxation property is the most excellent in the copper alloy, it has been used as a signal terminal member having a particularly required strength since the prior art. . Titanium copper type age hardening type copper alloy. If a solute atom, that is, a supersaturated solid solution of Ti, is formed by solution treatment, and heat treatment is performed for a long time from this state at a low temperature, Ti in the parent phase is caused by spin dai decomposition. The periodic variation of the concentration, that is, the modulation structure is expanded, and the strength is increased. In order to obtain titanium copper excellent in strength and bending workability, how to suppress the stable phase, ie, ΤΊ (: ιΐ3 is an important issue so far. The reason is that since the integration of the stable phase is inferior to that of the parent phase, if the ratio is increased, the ratio is increased. Large, it will have an adverse effect on the workability or strength of f. The stable phase is more likely to occur when the aging treatment is performed at a higher temperature for a long time (aging, coffee, etc.), 201118181, or when the solid solution is sufficient. In order to improve the characteristics of the money, the industry is striving to suppress the formation of a stable phase in a heat treatment such as a solution treatment or an aging treatment (Patent Documents 1 to 4). [Patent Document 1] Japanese Patent Laid-Open No. Hei 20-23-231985 [Patent Document 3] Japanese Unexamined Patent Publication No. Hei No. Hei. No. Hei. No. Hei. The previous method for realizing the high performance of the copper is to suppress the stable phase (7) of the intermetallic compound particles of TiCu3f and Cu, and the stable phase of the Cu system. It has indeed achieved certain results. However, in order to develop titanium-molybdenum I that meets the increasingly demanding characteristics that are expected to become more stringent in the future, it is considered to be more helpful to use the same method as it has so far to seek new possibilities for Chin. Therefore, one of the problems of the present invention is to provide a titanium copper which is formed by actively depositing a stable phase such as TiCU3 and having excellent strength and bending workability. Further, another object of the present invention is to provide a method for producing such a titanium copper. In order to solve the above problems, the inventors of the present invention have found that the stable phase of the Ti-Cu system is dispersed in the cu matrix phase in the form of undissolved particles in the grain boundary, and does adversely affect the strength or the workability. However, if the stable phase of the bismuth-Cu system locally grows and the surrounding particles aggregate with each other in the form of a population of precipitated particles having a constant size and shape, adverse effects are reduced or harmless. In the present invention, a phase different from the parent phase composed of such a precipitated particle group appearing along the crystal grain boundary is referred to as a "201118181 grain boundary reaction phase". The e i system captures an electron micrograph of the grain boundary reaction phase. Figure +' The phase of the speckle pattern that grows along the grain boundary and is different from the parent phase is the grain boundary reaction phase. One aspect of the present invention based on the above findings is a copper alloy for electronic parts, which contains U to 4.0% by mass of Ti, and the remainder: the damage is composed of copper and unavoidable impurities; and observation by an electron microscope In the case of a structure parallel to the cross section in the rolling direction, there is a grain boundary reaction phase containing Ti Cu-based particles precipitated along the grain boundary, and the diameter 〇2 of the smallest circle surrounding the grain boundary reaction phase of each grain boundary reaction phase is relative to The ratio of the diameter of the largest circle D] of the grain boundary reaction phase (DVDi) is 8.1 (〇2/£) 丨) is 1.0 to 6.0, and the average value of 〇1 is AvgD^ 〇4~2 〇(10) Further, the grain boundary reaction phase accounts for 1.5 to 15% of the area per 1000 from the observation field of m2. In an embodiment of the copper alloy of the present invention, when the microstructure parallel to the cross section in the rolling direction is observed by an electron microscope, the average value Av3 of D2 is 1 · 〇 to 5.0 m. In another embodiment of the copper alloy of the present invention, when the microstructure parallel to the cross section in the rolling direction is observed by an electron microscope, the average crystal grain size is represented by a straight felt of approximately 5 "claws above, 3〇" Hereinafter, the average value AvgD3 of the diameter 〇3 of the largest circle surrounded by the grain boundaries of the crystal grains surrounding the grain boundary reaction phase is AvgD2 < AvgD3. In still another embodiment of the copper alloy of the present invention, Mn, Fe, Mg, Co, Ni, Cr, V, Nb, Mo, 7r, which are selected from the group consisting of 〇, 〇, and 5 Å, are selected from the group consisting of Mn, Fe, Mg, Co, Ni, Cr, V, Nb, Mo, and 7r. q . n

Zr Spb及p構成之群中之i種或2種以上。 本發明之另— copper 形態係一種伸銅品(el〇ngated 201118181 product) ’其由上述銅合金構成β 本發明之又一形態係一種電子零件 令仔其具備上述銅合 本發明之又一形態係-種連接器’其具備上述鋼合金。 本發明之又-形態係-種電子零件用銅合金之製造方 法,其包含如下步驟: 對含有2.0〜4.0質量%之丁卜並合計含有G〜〇5質』 %之選自由為第3元素群之Mn、Fe、Mg、c〇、Ni、Cr、: 仙’〜……構成之群中之…種或… 上,且剩餘部份由銅及不可避免之雜質構成之銅合金^ 材:進行加熱至730〜峨内Ti固溶限變成與添加量才" 之溫度以上的固溶化處理; 於固溶化處理後,進行於材料溫度4〇〇〜5〇〇t加熱〇 〜2 0小時之時效處理; 於時效處理後,進行軋縮率(r〇丨Hng reducti〇n)為〇 4 0 %之冷軋。 根據本發明,可獲得使穩定相即TiCu3大量析出,並且 強度及彎曲加工性優異之鈦銅。 【實施方式】 < Ti含量> 於Τι未達2.0質量〇/〇時,無法充分獲得由鈦銅原本之 調變結構之形成所產生的強化機制,因此無法獲得充分之 強度,相反地若超過4.〇質量% ’則存在粗大之TiCu3易於 析出,且強度及彎曲加工性劣化之傾向。因此,本發明之 6 201118181 銅合金中之Ti的含量為2.0〜4.0質量〇/〇, 干乂 1主马2 · 7〜3.5 質量%。藉由將Ti之含量以此方式適當化, 了问時實現適 «用於電子零件之強度及彎曲加工性。 <第3元素> 若於鈦銅中添加一定之第3元素,則具有如下之效果: 即便於Ti充分地固溶之較高溫度下進行固溶化處理結晶 粒亦易於微細化,且使強度提高。又,_ θθ , 心< 第3元素促 進調變結構之形成。進而,亦具有抑制Ti — cu系 ^ ^ , 尔I穩疋相 急遽粗大化之效果。因此,可膳撂 了獲付鈦銅原本之時效硬化能 (Age-hardening Power)。 若合計含有0.05質量%以上之該等元素,則出現該效 果’但若合計超過0.5質量則存在強度與彎曲加工性之 2性劣化之傾向。因此’可合計含有g〜g.5質量%之選 由為第 3 元素群之 Mn、Fe、Mg、c〇、Ni、Cr、v、Nb、One or more of the group consisting of Zr Spb and p. Another aspect of the present invention is a copper-clad product (el〇ngated 201118181 product) 'which is composed of the above-mentioned copper alloy. According to still another aspect of the present invention, an electronic component is provided with the above copper. A type connector is provided with the above steel alloy. Further, the present invention relates to a method for producing a copper alloy for an electronic component, comprising the steps of: containing from 2.0 to 4.0% by mass of the butadiene and containing G to 〇5 mass% selected from the third element a group of Mn, Fe, Mg, c〇, Ni, Cr, : a group of or consisting of copper and an inevitable impurity in the group consisting of: Heating to 730~峨 Ti solid solubility limit becomes the solution treatment with the addition amount of temperature above; after the solution treatment, heating at the material temperature of 4〇〇~5〇〇t~~0 hours The aging treatment; after the aging treatment, the rolling reduction (r〇丨Hng reducti〇n) is 〇40% cold rolling. According to the present invention, it is possible to obtain titanium copper which is a large amount of a stable phase, i.e., TiCu3, and which is excellent in strength and bending workability. [Embodiment] <Ti content> When Τι is less than 2.0 mass 〇/〇, the strengthening mechanism due to the formation of the original tuned structure of titanium copper cannot be sufficiently obtained, so that sufficient strength cannot be obtained, and conversely When the amount exceeds 4.% by mass, the coarse TiCu3 tends to be precipitated, and the strength and bending workability tend to deteriorate. Therefore, the content of Ti in the 6 201118181 copper alloy of the present invention is 2.0 to 4.0 mass 〇 / 〇, and the dry 乂 1 main horse 2 · 7 to 3.5 mass %. By optimizing the content of Ti in this way, it is possible to achieve the strength and bending workability of electronic parts. <Third Element> When a certain third element is added to titanium copper, the effect of solid solution treatment at a relatively high temperature at which Ti is sufficiently solid-solved is also facilitated to be finer and finer. Increased strength. Further, _ θθ , the heart < the third element promotes the formation of the modulation structure. Furthermore, it also has the effect of suppressing the Ti-cu system ^ ^ and the I stable phase. Therefore, it is possible to eat the original age-hardening power of titanium and copper. When the total amount of these elements is 0.05% by mass or more, the effect is exhibited. However, when the total amount exceeds 0.5 mass, the strength and the bending workability tend to deteriorate. Therefore, the selection of g to g. 5 mass% in total is Mn, Fe, Mg, c〇, Ni, Cr, v, Nb of the third element group.

Mo、Zr、Si、B及P構成之群中 種或2種以上,較佳 為合計含有〇.〇5〜0.5質量%。 <粒界反應相> 粒界反應相,係於時效虚理主 ,,曰 处理時以粒界反應型粒子形態 /0,,、口晶粒界析出之Ti — Cu备越:—上丄 、L疋相彼此聚集而成之與母相 不问之相。若用電子顯微 覜察拉界反應相,則看上去為 斑點圖案。藉由將粒界反應相 衩制為一疋之大小及形狀, 使由T!— Cu系之穩定相所 取 < 不良影響減包或無害化。 由於粒界反應相係沿妹曰 、 姓曰Μ 、0日日粒界朝向粒内成長,因此若 、,口日曰板杈變大,則存在粒》 界反應相沿結晶粒界變長之傾 7 201118181 向。又,存在如下之傾向,即隨著最終之冷乳之乾縮率增 大’”。曰曰粒朝壓延方向延伸,伴隨於此,粒界反應相亦朝 壓延方向變長。若粒界反應相朝特定之方向延伸得較長, 則對弯曲加工之不良影響不會減輕,因此較理想為粒界反 應相於所有方向上均勻地成長。 因此,於本發明之鈦銅,於利用電子顯微鏡觀察平行 於壓延方向之剖面之組織時,關於各個粒界反應相之包圍 粒界反應相之最小圓的直徑〇2相對於由粒界反應相所包圍 之最大圓的直Dl之比(D2/Di)(以下,稱為「粒界反應相縱 橫比」)之平均值八哪瓜)為1 .〇〜6.0,較佳為2.0〜5 〇。 例如’關於圖卜1中所示之粒界反應相A,圓U為由粒界 反應相所包圍之最大圓’圓12 $包圍粒界反應相之最小 圓。再者,雖然存在複數個粒界反應相互相接觸之情形, 但該等因相不同,故可利用反射電子像之母相的濃淡、 ΕΡΜΑ之元素分佈圖(ele_tal邮叩㈣)或利用E⑽之方 位分佈圖等加以區別,而作為不同之粒界反應相進行處理。 又’即便已控制粒界反應相縱橫比,但若粒界反應相 過度增大,則仍然無法減輕對彎曲加工性之不良影響。且, 應有助於調變結構擴展之固溶丁丨成分被導入至粒界反應相 中’而無法確保充分之強度。另一方面’即便粒界反應相 之擴展不充分’由穩定相所造成之不良影響亦不會減輕, 且固溶Ti成分過多而亦無法確保必需之導電_。因此,本 發明之鈦銅,於利用電子顯微鏡觀察平行於麼延方向之剖 面之組織時,0|之平均值AvgD々〇 4〜2 〇心,較佳為 8 201118181 0.4〜1_5 "m,更佳為〇,4〜i.o //m。又,於利用電子顯 微鏡觀察平行於壓延方向之剖面之組織時,D2之平均值 AvgD2於一實施形態中為^〜5〇 μΓη,較佳為2〇〜5〇以 m,更佳為2.0〜3.0 ym。 即便各個粒界反應相為一定之大小,但若於金屬組織 中所占之比例不合適’則不會顯現出效果。另一方面,若 粒界反應相變得過剩,則會造成應有助於調變結構擴展2 固溶Τι成分被導入至粒界反應相中之結果。因此,於利用 電子顯微鏡觀察平行於壓延方向之剖面之組織時,粒界反 應相於每1000 Mm2之觀察視野中佔15〜15%之面積,較 佳為佔1.6〜10%之面積,更佳為佔17〜3 2%之面積。 <結晶粒徑> 〜,p r座生粒界 反應相之面積率易上升至超過所需之不良情況。因此 佳之平均結晶粒徑為30 “ m以下,更佳為2〇从⑺以下。 下限設為1…乂上較佳’以使得粒界反應相之面積率不 會上升至超過所需,更佳為5 手不 μ m以上。於本發明中, 均結晶粒徑係以利用電子顯抖& 丁 千.、属微鏡觀察平行於壓延方向之圳 面之組織時之近似圓的直徑來表示。 〜 通常,結晶粒會對應於最终 取、、之冷軋中之軋縮率 壓延方向延伸之楕圓形狀,但若 呈朝 々平l艰率提尚而使 得極為扁平,則應變會 文、〇日日粒變 口此易成為彎曲破刹, 由此,較理想為儘量接近正圓。 < 之原因。 一實施形態中,關於包圍粒界反 之鈦銅之 應相之各結晶粒,將由該 201118181 結晶粒之粒界所包圍之最大圓之直徑A的平均值AvgD3加 以定義’當該值大於包圍粒界反應相之最小圓之直徑d2的 平均值AvgD2時,為AvgD2 < AvgD3。於此情形時,不會損 害彎曲加工性。例如,關於圖丨—2中所示之粒界反應相A, 圓13為由包圍該粒界反應相之結晶粒之粒界所包圍之最大 圓。 <用途> 本發明之銅合金可供作為各種伸銅品,例如以板、條' e棒及線。本發明之鈦銅並無限定,可較佳地用作開關、 連接器、插孔 '端子、繼電器等電子零件之材料。 <製法> 本發明之欽銅可藉由尤其於最終之固溶化處理及其後 之步驟中實施適當之熱處理及冷軋而製造。以下,按每個 步驟依序說明適宜之製造例。 1)錠之製造 藉由熔解及鑄造之錠之劁 心裂以,基本上於真空中或惰 氣體環境中進行。若於炫解中 研1Γ存在添加70素之熔解殘渣 則無助於強度之提高。由此,為去除熔解殘渣,必須於 加以或以等高炫點之第3元素後充分地進行搜样,A 保持一定時間。另一方面, 田於Τι比較谷易熔解於cu中 故於炼解第3元素後添加 I 了。因此,較為理想的是, 合計含有0〜〇.50質量%之 乃式將選自由Mn、Fe、Mg、The seed or the mixture of two or more of Mo, Zr, Si, B and P is preferably contained in a total amount of 〜.〇5 to 0.5% by mass. <grain boundary reaction phase> The grain boundary reaction phase is based on the aging principle, and the grain boundary reaction particle morphology /0,, and the grain boundary of the grain are precipitated in the grain boundary. The 丄 and L 疋 are clustered with each other and are not related to the mother. If the reaction phase is observed by electron microscopy, it looks like a speckle pattern. By making the grain boundary reaction phase into a size and shape, the stable phase of the T!-Cu system is taken to reduce or degrade the adverse effects. Since the grain boundary reaction phase grows along the grain boundary along the sister-in-law, surname 曰Μ, and 0-day grain boundaries, if the 曰 曰 曰 杈 杈 杈 , , , , 粒 粒 粒 粒 粒 粒 粒 粒 粒 粒 粒 粒 粒 粒 粒7 201118181 To. Further, there is a tendency that the drying shrinkage ratio of the final cold milk increases. The crucible grains extend in the rolling direction, and along with this, the grain boundary reaction phase also becomes longer in the rolling direction. When the length is extended in a specific direction, the adverse effect on the bending process is not alleviated, so it is preferable that the grain boundary reaction phase grows uniformly in all directions. Therefore, in the titanium copper of the present invention, an electron microscope is used. When observing the structure of the cross section parallel to the rolling direction, the ratio of the diameter 〇2 of the smallest circle surrounding the grain boundary reaction phase of each grain boundary reaction phase to the straight D1 of the largest circle surrounded by the grain boundary reaction phase (D2/) Di) (hereinafter, the average value of the "grain boundary reaction phase aspect ratio") is 1 . 〇 ~ 6.0, preferably 2.0 to 5 〇. For example, with respect to the grain boundary reaction phase A shown in Figure 1, the circle U is the smallest circle surrounded by the grain boundary reaction phase, the circle 12, which surrounds the smallest circle of the grain boundary reaction phase. Furthermore, although there are a plurality of grain boundary reactions in contact with each other, the phase factors are different, so that the concentration of the mother phase of the reflected electron image, the element distribution map of the ΕΡΜΑ (ele_tal (4)), or the use of E(10) can be utilized. The orientation maps and the like are distinguished and treated as different grain boundary reaction phases. Further, even if the aspect ratio of the grain boundary reaction phase is controlled, if the grain boundary reaction phase is excessively increased, the adverse effect on the bending workability cannot be alleviated. Further, it should contribute to the fact that the solid solution of the expanded structure of the butyl component is introduced into the grain boundary reaction phase, and sufficient strength cannot be ensured. On the other hand, even if the expansion of the grain boundary reaction phase is insufficient, the adverse effects caused by the stable phase are not alleviated, and the amount of solid solution Ti is too large to ensure the necessary conductivity. Therefore, in the titanium copper of the present invention, when the microstructure parallel to the cross section in the direction of the extension is observed by an electron microscope, the average value of 0| is AvgD 々〇 4 〜 2 〇, preferably 8 201118181 0.4 〜 1 _ 5 " m, Better for 〇, 4~io //m. Further, when the microstructure of the cross section parallel to the rolling direction is observed by an electron microscope, the average value AvgD2 of D2 is, in one embodiment, 〜5〇μΓη, preferably 2〇~5〇 in m, more preferably 2.0~ 3.0 ym. Even if the respective grain boundary reaction phases are of a certain size, if the proportion in the metal structure is not appropriate, the effect will not be exhibited. On the other hand, if the grain boundary reaction phase becomes excessive, it will result in the conversion of the modified structure 2 solid solution component into the grain boundary reaction phase. Therefore, when the microstructure parallel to the cross section of the rolling direction is observed by an electron microscope, the grain boundary reaction phase accounts for 15 to 15% of the area per 1000 Mm 2 of the observation field, preferably 1.6 to 10% of the area, more preferably For an area of 17 to 3 2%. <crystal grain size> 〜, p r seat grain boundary The area ratio of the reaction phase tends to rise above the required defect. Therefore, the average crystal grain size is preferably 30 "m or less, more preferably 2 〇 from (7) or less. The lower limit is set to 1 乂 preferably ' so that the area ratio of the grain boundary reaction phase does not rise above the required, more preferably In the present invention, the average crystal grain size is expressed by the diameter of an approximate circle when the microstructure of the face parallel to the rolling direction is observed by electron microscopy & Ding Qian. ~ Usually, the crystal grain will correspond to the round shape of the rolling direction in the final rolling and cold rolling, but if it is extremely flat due to the difficulty of raising the crucible, the strain will be In the next day, the grain-changing mouth is likely to become a bending brake, and therefore, it is preferable to be as close to a perfect circle as possible. In the embodiment, the crystal grains surrounding the grain boundary and the titanium-copper phase should be The average value AvgD3 of the diameter A of the largest circle surrounded by the grain boundary of the 201118181 crystal grain is defined as 'AvgD2 < AvgD3 when the value is larger than the average value AvgD2 of the diameter d2 of the smallest circle surrounding the grain boundary reaction phase. In this case, it will not damage the bending plus For example, regarding the grain boundary reaction phase A shown in Fig. 2, the circle 13 is the largest circle surrounded by the grain boundaries of the crystal grains surrounding the grain boundary reaction phase. <Use> Copper of the present invention The alloy can be used as a variety of copper-stretching products, for example, a plate, a bar and a wire. The titanium copper of the present invention is not limited, and can be preferably used as an electronic component such as a switch, a connector, a jack terminal, a relay, and the like. <Production Method> The copper of the present invention can be produced by performing appropriate heat treatment and cold rolling in particular in the final solution treatment and subsequent steps. Hereinafter, suitable production will be described in order of each step. Example: 1) The manufacture of ingots is carried out by melting and casting the ingots, basically in a vacuum or in an inert gas environment. If there is a 70-thick melting residue in the dazzling solution, it does not contribute to the strength. Therefore, in order to remove the melting residue, the sample must be sufficiently searched after the third element of the contour is added, and A is kept for a certain period of time. On the other hand, Tian Yuyu is more soluble in cu. Therefore, I added I after refining the third element. , It is preferable that the total content 0~〇.50 is the mass% of the formula selected from the group consisting of Mn, Fe, Mg,

Ni、Cr、V、Nb、Mo、Zr、t D « η μ 、 Sl、B& P構成之群中之1種 2種以上添加至Cu中,繼二 . 主Lu T '繼而以含有2 〇〜4 〇質量%之方 10 201118181 將Ti添加至Cu中來製造錠。 2) 均質化退火及熱軋 由於在鍵之製造時所產生之凝固偏析或晶出物較粗 大因此藉由均質化退火使其盡可能固溶於母相中而縮 小’較為理想的是儘可能將其去除。其原因在於:對防止 彎曲破裂有效。 具體而言’較佳為於錠之製造步驟後,加熱至900〜970 c而進订3〜24小時之均質化退火,其後實施熱軋。為防 止液體金屬脆性’較佳為於熱軋前及熱軋中設為960°C以 下’且於自初始厚度至整體之軋縮率為90%為止之道次設 為900°C以上。而且,為於每一道次中產生適度之再結晶而 有效減少丁1之偏析,只要將每一道次之軋縮量以1 0〜20 mm實施即可。 3) 第一固溶化處理 其後,較佳為於適當地反覆進行冷軋與退火後進行固 溶化處理。此處預先進行固溶化之理由為減輕最終之固溶 化處理中之負擔。即,最終之固溶化處理並非用以使第二 相粒子固溶之熱處理,而是由於已被固溶化,因此只要一 面維持該狀態一面僅產生再結晶即可’故可進行輕微之熱 處理。具體而t ’第-固溶化處理係只要將加熱溫度設為 850〜900°C ’並進行2〜1〇分鐘即可。較佳為極力使此時 之升溫速度及冷卻速度亦加速,且此處不使第二相粒子析 出。再者’亦可不進行第一固溶化處理。 4) 中間壓延 11 201118181 最終之固溶化處理前之中間壓延中之軋縮率越高,則 最終之固溶化處理中之再結晶粒越均勻且微細地生成,因 此將中間壓延之軋縮率設定得較高。較佳為7〇〜99%。軋 縮率係以{((壓延前之厚度一壓延後之厚度V壓延前之厚度) XI 〇〇% }定義。 5)最終之固溶化處理 於最終之固溶化處理中,較為理想的是使析出物完全 固溶’但若加熱至完全去除為止之高S,則結曰曰曰粒易粗大 化因此將加熱溫度設為第二相粒子組成之固溶限附近之 恤度(於Τι之添加量為2 〇〜4 〇質量。之範圍内,丁丨之固溶 限复成與添加量相同之溫度為73〇〜84〇它左右,例如於h 之添加量$ 3.2質量%時&嶋。c左右)。而且,若迅速加熱 至該溫度為止,且亦使冷卻速度加速,則粗大之第二相粒 。子之產生會受到抑制。因此,較典型的是加熱至73〇〜_ CTi gU容限會變成肖添加量相同之溫度以上,更典型的是 二至較730〜880 C之Ti固溶限會變成與添加量相同之溫 2 〇 C之皿度,較佳為加熱至高0〜10。(:之溫度。 又t終之固溶化處理中之加熱時間越短结晶粒越 ^細化。加熱時間例如可設為3()〜9()秒,較典型的是可設 ;6〇私。較佳為於該時間點時盡可能不生成第二相粒 :式處理。冷卻速度較快為較佳就操作穩定性之觀 而言’用水冷卻較為有利。 6)時效處理 最終之固溶化處理之後進行時效處理。雖然先前於最 12 201118181 終之固溶化處理後進行冷札係通例,但於獲得本發明之欽 銅之方面,較佳為於最終之固溶化處理後’不進行冷軋而 ^接進行時效處理。先前為維持延伸並獲得高強度:進行 高加工度之冷軋,但彎曲加工性會劣化。若為維持彎曲加 工性而降低加工度,則不僅應變之分佈變得不均勻,而且 強度上升亦較小。其原因在於:若於時效處理前進行低加 工度之冷軋,則加工應變易分佈不均勻’且調變結構之形 成變得不均勻,對於彎曲應變之阻力減弱,不僅如此粒 界反應相亦難以擴展。時效處理可於較慣例之時效條件略 高之溫度下進行,以使於粒界反應中所析出之Ti — 系之 穩定相聚集且粒界反應相成長為適當之大小。若進行低溫 時效處理,則粒界反應相沿粒界成長(A變大),並朝向粒内 成長得較薄(Di較小),因此Avg(D2/Di)易變大。具體而言, 較佳為於材料溫度400〜500〇c加熱〇丨〜2〇小時更佳°為 於材料溫度400〜480X:加熱1〜16小時。 7) 最終之冷軋 於上述時效處理後,進行最終之冷軋。藉由最终之冷 加工可提尚鈦銅之強度。亦可不實施該冷軋,但於以獲得 較高強度之鈦銅為目的之情形時將軋縮率設為5%以上,較 佳為10%以上,更佳為15%以上。然而,若札縮率過高, 則粒界反應相縱橫比會變得過大,因此將軋縮率設為40% 以下’較佳為30%以下,更佳為25%以下。 8) 去應變退火 依電子零件之構造,要求不同之形狀加工。通常施有 13 201118181 彎曲加工或凹口加工等塑性變形之部位會加工硬化,而素 材之強度會進-步提升。以此種.擎曲加工部確保接愿之構 造不易塑性變形’因此不需要較高之彈曲彈性限度 (spring bending elastic Hmit)。因此,於此種用途中亦可: 進行去應變退火。 另方©,以衝;1後之形狀加工時不會塑,性變形之部 位來確保接Μ之構造(例如:自端子之接點部至彎曲加工; 之直線部分(支臂)的距離較長之構造,或如又型端子般未施 有凹口加工或f曲加工之構造,即如對支臂施加彎曲應力 之構造)’因為需要有對於彎曲變形之阻力,因此較高之彈 簧彎曲彈性限度變得重要。 =因此,尤其於彈簧彎曲彈性限度為重要之用途中,在 最終之冷軋後進行去應變退火.較佳為尤其於最終之冷軋 之軋縮率為3%以上之情形時,在彈簧彎曲彈性限度變得重 要之用途中進行去應變退火。又,特佳為於最終之冷札之 乾縮率為1 〇 /。以上之情形時,在彈簧彎曲彈性限度變得重 要之用途中進行去應變退火。在冷札中所導入之差排分佈 =均勻’但藉由進行去應變退火而使差排再排列,藉此亦 °進步謀求強度上升。然而,若過度地進行去應變退火, 則差排會消失且強度降低,故欠佳。 去應變退火之條件可為慣用之條件,具體而言,較佳 2 X於材料溫度2〇(rc以上且未達彻。c加# 〇刪〜小 、,之條件進行,若為低溫,則更佳為以長時間(例如於材料 溫度 2 0 〇 〜3 〇 〇。 i C力熱12〜20小時)之條件進行、若為高溫, 14 201118181 則更佳為以短時間(例如於材料溫度3〇〇〜4〇〇r加熱〇_ 〜12小時)之條件進行。 再者,若為本領域從業人員,則應該能夠理解可於上 述各步驟之間適當地進行用以去除表面之氧化皮之研削、 研磨、珠粒噴擊酸洗等步驟。 [實施例] 以下一併表示本發明之實施例及比較例,但該等實施 例係為了更理解本發明及其優點而提供,並非欲限定發明。 於製造本發明例之銅合金時,由於將活性金屬即以作 為第2成分而添加’因此於溶製時使用真空熔解爐。又, 為預防發生因混入本發明規定之元素以外之雜質元素而產 生預想外之副作用,原㈣嚴格挑選純度比較高者來使用。 對於添加表1中所記載之濃度之Ti,並具有剩餘部份 為銅及不可避免之雜質之組成之旋進行於9耽加熱3小時 之均質化退火後,於900〜i * 95〇c進仃熱軋,而獲得板厚為 10麵之熱軋板。藉由平面切削除錄皮後,進行冷乾而形 成板條之板厚(2_〇mm)’且進行板條狀態下之第i次固溶化 處理。第1次固溶化處理之條件設為於85代加熱ig分鐘。 錢片未進行第i次固溶化處理。繼而,於中間之冷札中, 以使最終板厚達到〇.1〇 _之方式進行冷軋調整中間之板 厚後,插人至可迅速加熱之退火爐中進行最終之固溶化處 理,其後,用水冷卻。此時之加熱條件係材料溫度以丁丨之 固溶限變成與添加量相同之溫度(於Ti濃度為32質量%時 約峨,於τπ農度為時約7听,於η漠度為 15 201118181 4.0質置%時約MOt )作為基準以表1中所記載之加熱條件 刀別保持1分鐘。(參照表1)。繼而,試驗片以表1中所記 戰之條件進行固溶化處理後之冷軋後,於Ar氣體環境中以 表 1 士 中所記載之條件進行時效處理。於藉由酸洗除鏽皮後, 以表1中所記載之條件進行最終冷軋,最後以表1中所記 栽之各加熱條件進行退火製成發明例及比較例之試驗片。 [表 1- 1] 組成 製造條件 Ti濃度 (wt%) 固溶化處理 (第1次) 固溶化處理 (最終) 固溶化 後之壓 延之軋 縮率 時效處理 最終壓 延之軋 縮率 退火 先前例 3.2 850〇C 600 s 820〇C 60s 24% 400。。3 h 0% - 先前例 3.2 850〇C 600 s 820〇C 60s 29% 400°C 3h 0% - 先前例 3.2 850〇C 600 s 820〇C 60s 47% 400°C 3h 0% - 先前例 3.2 850〇C 600 s 820〇C 60s 24% 380〇C 3h 0% - 16 201118181 [表 1 — 2] 組成 製造條件 Ti濃度 副成分 固溶化處理 固溶化處理 最終壓 時效處理 延之軋 退火 (wt%) (wt%) (第1次) (最終) 縮率 實施例A 3.2 - 無 820°C 60s 450°C 5h 0% 無 實施例B 3.2 - 無 820〇C 60s 450〇C 5h 5% 無 實施例c 3.2 - 無 820〇C 60s 450〇C 5h 20% 無 實施例D 3.2 - 無 820〇C 60s 450°C 5h 40% 無 實施例E 3.2 - 無 840〇C 60s 450〇C 5h 0% 無 實施例F 3.2 - 無 840°C 60s 450〇C 5h 5% 無 實施例G 3.2 - ,無 840°C 60s 450〇C 5h 20% 無 實施例Η 3.2 - 無 840〇C 60s 450〇C 5h 40% 無 實施例1 3.2 - 850〇C 600 s 820〇C 60s 450〇C 5h 0% 無 實施例J 3.2 - 850〇C 600 s 820〇C 60s 450〇C 5h 5% 無 實施例Κ 3.2 - 850°C 600 s 820°C 60s 450〇C 5h 20% 無 實施例L 3.2 - 850〇C 600 s 820〇C 60s 450〇C 5h 40% 無 實施例1 3.2 - 850〇C 600 s 820〇C 60s 450°C 5h 0% 300。。0.008 h 實施例2 3.2 - 850〇C 600 s 820〇C 60s 450°C 5h 5% 300°C 0.008 h 實施例3 3.2 - 850〇C 600 s 820°C 60s 450°C 5h 10% 300°C 0.008 h 實施例4 3.2 - 850°C 600 s 820°C 60s 450°C 5h 20% 300°C 0.008 h 實施例5 3.2 - 850°C 600 s 820°C 60s 450〇C 5h 30% 300。。0.008 h 實施例Μ 3.2 - 850〇C 600 s 820°C 60s 450〇C 5h 40% 300。。0.008 h 實施例Ν 3.2 - 850°C 600 s 820〇C 60s 450〇C 5h 0% 300°C 12 h 實施例0 3.2 - 850°C 600 s 820°C 60s 450°C 5h 5% 300°C 12 h 實施例Ρ 3.2 - 850°C 600 s 820〇C 60s 450〇C 5h 20% 300°C 12 h 實施例Q 3.2 - 850〇C 600 s 820〇C 60s 450〇C 5h 40% 300°C 12 h 實施例R 3.2 - 850〇C 600 s 820°C 60s 400°C 1 h 20% 300°C 0.008 h 實施例S 3.2 - 850°C 600 s 820〇C 60s 400°C 1 h 40% 300°C 0.008 h 實施例6 3.2 - 850〇C 600 s 820〇C 60s 400°C 16 h 20% 300°C 0.008 h 實施例7 3.2 - 850〇C 600 s 820〇C 60s 400°C 16 h 30% 300°C 0.008 h 實施例8 3.2 - 850〇C 600 s 800。。60s 480°C 1 h 10% 300°C 0.008 h 17 201118181Two or more kinds of Ni, Cr, V, Nb, Mo, Zr, t D « η μ , Sl, B & P are added to Cu, followed by 2. The main Lu T ' and then 2 〇 ~4 〇% by mass of 10 201118181 Ti is added to Cu to make ingots. 2) Homogenization annealing and hot rolling are reduced by solidification segregation or coarser crystals produced during the production of bonds, so they are reduced in the mother phase by homogenization annealing. Remove it. The reason is that it is effective for preventing bending cracking. Specifically, it is preferable to perform homogenization annealing after heating to 900 to 970 c after the production step of the ingot, and then perform hot rolling. In order to prevent the liquid metal brittleness, it is preferably set to 960 ° C or lower before hot rolling and hot rolling, and the pass rate from the initial thickness to the overall rolling reduction ratio of 90% is set to 900 ° C or higher. Further, in order to effectively reduce the segregation of D1 in order to generate moderate recrystallization in each pass, it is sufficient to carry out the rolling reduction per pass at 10 to 20 mm. 3) First solution treatment Thereafter, it is preferred to carry out the solution treatment after cold rolling and annealing as appropriate. The reason for preliminarily solidifying here is to reduce the burden in the final solution treatment. That is, the final solution treatment is not a heat treatment for solid-solubilizing the second phase particles, but is solid-solved, so that only one side of the surface can be recrystallized while maintaining this state, so that a slight heat treatment can be performed. Specifically, the t ′ first-solution treatment treatment may be carried out by setting the heating temperature to 850 to 900 ° C ' for 2 to 1 minute. It is preferable to accelerate the temperature increase rate and the cooling rate at this time as much as possible, and the second phase particles are not precipitated here. Further, the first solution treatment may not be performed. 4) Intermediate rolling 11 201118181 The higher the rolling reduction rate in the intermediate rolling before the final solution treatment, the more uniform and finely formed recrystallized grains in the final solution treatment, so the rolling reduction of the intermediate rolling is set. Got higher. It is preferably 7 〇 to 99%. The rolling reduction ratio is defined by {((thickness before rolling, thickness after rolling V, thickness before rolling) XI 〇〇% }. 5) Final solution treatment in the final solution treatment, it is preferred to The precipitate is completely solid solution', but if it is heated to the high S of complete removal, the crusted particles are easily coarsened, so the heating temperature is set to the vicinity of the solid solution limit of the second phase particle composition (addition of Τι The amount is 2 〇~4 〇 mass. Within the range, the solid solution limit of Ding 复 is the same as the addition amount of 73〇~84〇, for example, when the addition amount of h is 3.2% by mass & .c or so). Further, if the temperature is rapidly heated to this temperature and the cooling rate is also accelerated, the coarse second phase particles are obtained. The production of the child will be suppressed. Therefore, it is more typical to heat up to 73〇~_ CTi gU tolerance will become the same as the temperature of the same amount of Sha added, more typically two to 730~880 C Ti solid solubility limit will become the same amount of temperature 2 〇C, preferably heated to 0~10. (: the temperature. The shorter the heating time in the final solution treatment, the finer the crystal grain is. The heating time can be set, for example, to 3 () to 9 () seconds, which is more typical; Preferably, at this time point, the second phase granule is not generated as much as possible: the cooling rate is faster, and the cooling stability is more favorable in terms of operational stability. 6) aging treatment final solid solution The treatment is followed by aging treatment. Although it has been conventionally performed after the solution treatment at the end of 201112181, in order to obtain the copper of the present invention, it is preferred to perform the aging treatment without cold rolling after the final solution treatment. . Previously, in order to maintain elongation and obtain high strength: cold rolling with high workability was performed, but bending workability was deteriorated. If the degree of machining is lowered in order to maintain the bending workability, not only the distribution of the strain becomes uneven, but also the strength rise is small. The reason is that if the cold rolling is performed at a low degree of work before the aging treatment, the processing strain is easily distributed unevenly and the formation of the modulation structure becomes uneven, and the resistance to the bending strain is weakened, not only the grain boundary reaction phase but also Hard to expand. The aging treatment can be carried out at a temperature slightly higher than the conventional aging conditions so that the stable phase of the Ti-system precipitated in the grain boundary reaction is aggregated and the grain boundary reaction phase is grown to an appropriate size. When the low-temperature aging treatment is carried out, the grain boundary reaction phase grows along the grain boundary (A becomes large) and grows thinner toward the inside of the grain (di is smaller), so Avg (D2/Di) tends to become large. Specifically, it is preferably heated at a material temperature of 400 to 500 〇c for 2 to 2 hours, more preferably at a material temperature of 400 to 480X: heating for 1 to 16 hours. 7) Final cold rolling After the above aging treatment, the final cold rolling is performed. The strength of the titanium copper can be raised by the final cold working. The cold rolling may not be carried out, but the rolling reduction ratio is preferably 5% or more, more preferably 10% or more, and still more preferably 15% or more for the purpose of obtaining titanium copper of higher strength. However, if the shrinkage ratio is too high, the aspect ratio of the grain boundary reaction phase becomes too large, so the rolling reduction ratio is 40% or less', preferably 30% or less, more preferably 25% or less. 8) Strain annealing According to the construction of electronic parts, different shapes are required. Usually applied 13 201118181 Plastic deformation parts such as bending or notch processing will work harden, and the strength of the material will be further improved. In this way, the structure of the engine is ensured that the structure of the connection is not easily plastically deformed, so that a high spring elastic elastic Hmit is not required. Therefore, in such an application, it is also possible to: perform strain relief annealing. The other side, to the rush; 1 shape after processing will not be plastic, the part of the deformation to ensure the structure of the joint (for example: from the joint of the terminal to the bending process; the distance of the straight part (arm) A long structure, or a configuration in which a notch process or a f-bend process is not applied as a re-type terminal, that is, a structure in which a bending stress is applied to a support arm)" because a resistance to bending deformation is required, so a high spring bend is required. The elastic limit becomes important. = Therefore, especially in applications where the spring bending elastic limit is important, the strain relief annealing is performed after the final cold rolling. It is preferable to bend the spring especially when the final cold rolling reduction ratio is 3% or more. De-strain annealing is performed in applications where the elastic limit becomes important. In addition, the best rate for the final cold is 1 〇 /. In the above case, strain relief annealing is performed in applications where the spring bending elastic limit becomes important. The difference distribution introduced in the cold slab = uniform', but by performing strain relief annealing, the difference rows are rearranged, thereby progressing to increase the strength. However, if the strain relief annealing is excessively performed, the difference is lost and the strength is lowered, which is not preferable. The condition of the strain relief annealing may be a conventional condition. Specifically, it is preferably 2 X at a material temperature of 2 〇 (rc or more and is not reached. c plus # 〇 deleting ~ small, the condition is carried out, if it is low temperature, then More preferably, it is carried out under the conditions of a long time (for example, a material temperature of 2 0 〇~3 〇〇. i C heat of 12 to 20 hours), and if it is high temperature, 14 201118181 is more preferably a short time (for example, at a material temperature) The conditions of 3〇〇~4〇〇r heating 〇_~12 hours). Further, if it is a person skilled in the art, it should be understood that the scale of the surface can be appropriately removed between the above steps. The steps of grinding, grinding, bead blasting, etc. [Examples] The following examples and comparative examples of the present invention are shown, but are provided for a better understanding of the present invention and its advantages, and are not intended to In the case of producing the copper alloy of the present invention, the active metal is added as the second component. Therefore, a vacuum melting furnace is used for the dissolution. Further, in order to prevent the occurrence of the elements specified in the present invention. Produced by impurity elements For the side effects, the original (4) is strictly selected to be used with higher purity. For the addition of Ti in the concentration shown in Table 1, the remaining part is composed of copper and unavoidable impurities. After homogenization annealing for an hour, hot rolling is performed at 900 to i * 95 〇c to obtain a hot-rolled sheet having a thickness of 10 faces. After the skin is cut by plane cutting, lyophilization is performed to form a slat sheet. Thickness (2_〇mm)' and the i-th solution treatment in the slat state. The conditions of the first solution treatment were set to be heated for ig minutes in the 85th generation. The money sheet was not subjected to the i-th solution treatment. Then, in the middle of the cold, the final plate thickness of the cold rolling is adjusted so that the final thickness reaches 〇.1〇_, and then inserted into a rapidly heated annealing furnace for final solution treatment. After that, it is cooled with water. The heating condition at this time is that the material temperature becomes the same temperature as the addition amount in the solid solution limit of the butyl hydrazine (about 峨 at a Ti concentration of 32% by mass, and about 7 at a τπ agronomic degree). η Moment is 15 201118181 4.0 when the mass is set to about MOt) as a benchmark as noted in Table 1. The heating condition was kept for 1 minute (see Table 1). Then, the test piece was subjected to cold-rolling after solution treatment under the conditions recorded in Table 1, and then described in Table 1 in the Ar gas environment. The conditions were subjected to aging treatment. After the scale was removed by pickling, the final cold rolling was carried out under the conditions described in Table 1, and finally annealed under the heating conditions recorded in Table 1 to prepare the inventive examples and comparative examples. [Table 1 - 1] Composition of manufacturing conditions Ti concentration (wt%) Solution treatment (first time) Solution treatment (final) Rolling reduction after solutionization aging treatment Final rolling reduction ratio Annealing Previous Example 3.2 850 〇 C 600 s 820 〇 C 60 s 24% 400. . 3 h 0% - Previous Example 3.2 850〇C 600 s 820〇C 60s 29% 400°C 3h 0% - Previous Example 3.2 850〇C 600 s 820〇C 60s 47% 400°C 3h 0% - Previous Example 3.2 850〇C 600 s 820〇C 60s 24% 380〇C 3h 0% - 16 201118181 [Table 1 - 2] Composition of manufacturing conditions Ti concentration Subcomponent solid solution treatment Solution treatment Final pressure aging treatment Extension rolling annealing (wt% (wt%) (1st) (final) Shrinkage Example A 3.2 - No 820 °C 60s 450 °C 5h 0% None Example B 3.2 - No 820〇C 60s 450〇C 5h 5% No implementation Example c 3.2 - No 820〇C 60s 450〇C 5h 20% No Example D 3.2 - No 820〇C 60s 450°C 5h 40% No Example E 3.2 - No 840〇C 60s 450〇C 5h 0% None Example F 3.2 - No 840 ° C 60 s 450 〇 C 5h 5% No Example G 3.2 - , No 840 ° C 60 s 450 〇 C 5h 20% No Example Η 3.2 - No 840 〇 C 60 s 450 〇 C 5h 40 % None Example 1 3.2 - 850〇C 600 s 820〇C 60s 450〇C 5h 0% None Example J 3.2 - 850〇C 600 s 820〇C 60s 450〇C 5h 5% No ExampleΚ 3.2 - 850 °C 600 s 820°C 60s 450〇C 5h 20% No Example L 3.2 - 850〇C 600 s 820〇C 60s 450〇C 5h 40% None Example 1 3.2 - 850〇C 600 s 820〇C 60s 450°C 5h 0% 300. . 0.008 h Example 2 3.2 - 850〇C 600 s 820〇C 60s 450°C 5h 5% 300°C 0.008 h Example 3 3.2 - 850〇C 600 s 820°C 60s 450°C 5h 10% 300°C 0.008 h Example 4 3.2 - 850 ° C 600 s 820 ° C 60 s 450 ° C 5 h 20% 300 ° C 0.008 h Example 5 3.2 - 850 ° C 600 s 820 ° C 60 s 450 〇 C 5 h 30% 300. . 0.008 h Example Μ 3.2 - 850 〇C 600 s 820°C 60s 450〇C 5h 40% 300. . 0.008 h Example Ν 3.2 - 850 ° C 600 s 820 〇 C 60 s 450 〇 C 5 h 0% 300 ° C 12 h Example 0 3.2 - 850 ° C 600 s 820 ° C 60 s 450 ° C 5 h 5% 300 ° C 12 h Example Ρ 3.2 - 850 ° C 600 s 820 〇 C 60 s 450 〇 C 5h 20% 300 ° C 12 h Example Q 3.2 - 850 〇 C 600 s 820 〇 C 60 s 450 〇 C 5h 40% 300 ° C 12 h Example R 3.2 - 850 〇 C 600 s 820 ° C 60 s 400 ° C 1 h 20% 300 ° C 0.008 h Example S 3.2 - 850 ° C 600 s 820 〇 C 60 s 400 ° C 1 h 40% 300 °C 0.008 h Example 6 3.2 - 850 〇 C 600 s 820 〇 C 60 s 400 ° C 16 h 20% 300 ° C 0.008 h Example 7 3.2 - 850 〇 C 600 s 820 〇 C 60 s 400 ° C 16 h 30 % 300 °C 0.008 h Example 8 3.2 - 850 〇 C 600 s 800. . 60s 480°C 1 h 10% 300°C 0.008 h 17 201118181

組成 製造條件 最終 Ti濃度 副成分 固溶化處理 固溶化處 壓延 時效處理 退火 (wt%) (wt%) (第1次) 理(最終) 之軋 縮率 實施例9 3.2 - 850〇C 600 s 800°C 60s 480〇C 1 h 20% 300°C 0.008 h 實施例τ 3.2 - 850°C 600 s 800°C 60s 480〇C 16 h 20% 300°C 0.008 h 實施例10 3.2 - 850°C 600 s 800°C 60s 480〇C 1 h 30% 300°C 0.008 h 實施例U 3.2 - 850°C 600 s 800°C 60s 480°C 1 h 40% 300°C 0.008 h 實施例V 3.2 - 850〇C 600 s 800°C 60s 480〇C 16 h 40% 300°C 0.008 h 實施例W 3.2 - 850〇C 600 s 840〇C 60s 450〇C 5h 5% 300°C 0.008 h 實施例X 3.2 - 850〇C 600 s 840〇C 60s 450〇C 5h 20% 300°C 0.008 h 實施例Υ 3.2 - 850〇C 600 s 840〇C 60s 450〇C 5h 40% 300°C 0.008 h 實施例11 3.2 - 850〇C 600 s 840°C 60s 450°C 5h 30% 300°C 0.008 h 實施例12 3.2 - 850°C 600 s 860〇C 60s 450°C 5h 20% 300°C 0.008 h 實施例13 2.2 - 850〇C 600 s 780°C 60s 480°C 1 h 20% 300°C 0.008 h 實施例14 4.0 - 850〇C 600 s 840〇C 60s 400°C 16 h 10% 300°C 0.008 h 實施例Ζ 4.0 - 850〇C 600 s 840〇C 60s 400°C 16 h 30% 300°C 0.008 h 實施例Α' 4.0 - 850〇C 600 s 880〇C 60s 400°C 16 h 30% 300。。0.008 h 實施例15 3.2 0.2Fe 850〇C 600 s 820〇C 60s 450°C 5h 20% 300°C 0.008 h 實施例16 3.2 0.05Zr、O.lCr 850〇C 600 s 820°C 60s 450〇C 5h 20% 300°C 0.008 h 實施例17 3.2 O.lCo、0.05Si 850°C 600 s 820〇C 60s 450°C 5h 20% 300°C 0.008 h 18 201118181 [表 1-4]Composition Manufacturing Conditions Final Ti Concentration Subcomponent Solid Solution Treatment Solution Treatment Pressure Delay Treatment Annealing (wt%) (wt%) (1st) Rational (final) rolling reduction Example 9 3.2 - 850〇C 600 s 800 °C 60s 480〇C 1 h 20% 300°C 0.008 h Example τ 3.2 - 850 ° C 600 s 800 ° C 60 s 480 〇 C 16 h 20% 300 ° C 0.008 h Example 10 3.2 - 850 ° C 600 s 800 ° C 60 s 480 〇 C 1 h 30% 300 ° C 0.008 h Example U 3.2 - 850 ° C 600 s 800 ° C 60 s 480 ° C 1 h 40% 300 ° C 0.008 h Example V 3.2 - 850 〇 C 600 s 800°C 60s 480〇C 16 h 40% 300°C 0.008 h Example W 3.2 - 850〇C 600 s 840〇C 60s 450〇C 5h 5% 300°C 0.008 h Example X 3.2 - 850 〇C 600 s 840〇C 60s 450〇C 5h 20% 300°C 0.008 h Example Υ 3.2 - 850〇C 600 s 840〇C 60s 450〇C 5h 40% 300°C 0.008 h Example 11 3.2 - 850 〇C 600 s 840 ° C 60 s 450 ° C 5 h 30% 300 ° C 0.008 h Example 12 3.2 - 850 ° C 600 s 860 〇 C 60 s 450 ° C 5 h 20% 300 ° C 0.008 h Example 13 2.2 - 850 〇C 600 s 780°C 60s 480°C 1 h 20% 300°C 0.008 h Example 14 4.0 - 850 〇 C 600 s 840 〇 C 60 s 400 ° C 16 h 10% 300 ° C 0.008 h Example Ζ 4.0 - 850 〇 C 600 s 840 〇 C 60 s 400 ° C 16 h 30% 300 ° C 0.008 h Example 4.0 ' 4.0 - 850 〇 C 600 s 880 〇 C 60 s 400 ° C 16 h 30% 300. . 0.008 h Example 15 3.2 0.2Fe 850〇C 600 s 820〇C 60s 450°C 5h 20% 300°C 0.008 h Example 16 3.2 0.05Zr, O.lCr 850〇C 600 s 820°C 60s 450〇C 5h 20% 300°C 0.008 h Example 17 3.2 O.lCo, 0.05Si 850°C 600 s 820〇C 60s 450°C 5h 20% 300°C 0.008 h 18 201118181 [Table 1-4]

進行特性評價。將 於以下之條件對所獲得之各試驗片 結果不於表2。 &lt;強度&gt; 以使拉伸方向與壓延方向平行之方式,使 作--號試驗片。根據JIS—Ζ2241進行該試驗片之拉伸 试驗’測疋壓延平行方向之G.2%对力(YS)。 &lt;彎曲加工性&gt; 根據1S Ή 3 130 ’測定進行Badway (彎曲軸與壓延方向 為同方向)之W彎曲試驗而不產生破裂之最小半徑(mbr) 相對於板厚(t)之比即MBR/t值。 19 201118181 〈平均結晶粒徑&gt; 平均結晶粒徑之測定係利 剖面切斷’藉此露出剖面後, 母單位面積之結晶粒之數量, 的直徑。具體而言,製作100 存在於該框中之結晶粒之數量 用FIB將平行於壓延方向之 利用SIM觀察剖面,並計算 求出結晶粒之平均之近似圓 //mxlOO 之框,並計算 。再者,關於橫穿框之結晶 粒,均算作為1/2個。框之面積1〇〇〇〇 v 一除以結晶粒之 合計數所得者為每1個結晶粒之面積平均值。由於具有該 面積之正圓之直控為近似圓的直徑,因此將其設為平均結 晶粒徑。 &lt;粒界反應相&gt; 於利用FIB將平行於壓延方向之剖面切斷,藉此露出 剖面後,利用SIM觀察剖面,並拍攝觀察視野丨〇〇 &quot; mx丨〇〇 々 m。藉由附屬之 EDS(Energy Dispersive x_rayConduct a characteristic evaluation. The results of the respective test pieces obtained under the following conditions are not in Table 2. &lt;Strength&gt; A test piece was prepared in such a manner that the stretching direction was parallel to the rolling direction. The tensile test of the test piece was carried out in accordance with JIS - 2241, and the G. 2% versus force (YS) in the parallel direction of the rolling was measured. &lt;Bending workability&gt; The W bend test in which the Badway (the bending axis and the rolling direction are the same direction) is measured according to 1S Ή 3 130 ', and the ratio of the minimum radius (mbr) to the plate thickness (t) is not generated. MBR/t value. 19 201118181 <Average crystal grain size> The measurement of the average crystal grain size is obtained by cutting the cross section to expose the number of crystal grains per unit area after the cross section. Specifically, the number of crystal grains present in the frame was made 100. The cross section was observed by SIM in parallel with the rolling direction by FIB, and a frame of an approximate circle of /mxlOO of the average of the crystal grains was calculated and calculated. Further, the crystal grains which traverse the frame are counted as 1/2. The area of the frame 1 〇〇〇〇 v divided by the total number of crystal grains is the average of the area of each crystal grain. Since the direct control of the perfect circle having the area is an approximate circle diameter, it is set as the average crystal grain size. &lt;Grain boundary reaction phase&gt; After the cross section parallel to the rolling direction was cut by FIB, the cross section was exposed, and the cross section was observed by SIM, and the observation field 丨〇〇 &quot; mx丨〇〇 々 m was taken. By affiliated EDS (Energy Dispersive x_ray

Spectrometer)確認構成粒界反應相之斑點圖案之黑色部分 為 T i C u 3。 關於各個粒界反應相,分別於照片上測定由粒界反應 相所包圍之最大圓之直徑Di與包圍粒界反應相之最小圓之 直技Da ’並針對各個粒界反應相求出〇2/〇1。針對觀察視野 中所包含之可測定D!及D2之所有粒界反應相求出d2/D,, 將其平均值設為Avg(D2/D〇。又,將所測定之〇丨及D2之 平均值分別設為AvgDt及AvgD2。 又’關於包圍粒界反應相之各結晶粒,分別於照片上 測定由該結晶粒之粒界所包圍之最大圓之直徑D3,將於觀 20 201118181 察視:中可,所有D3之平均值設為A* 立^ V像刀析裝置求出粒界反應相於上述照片上 壬思之1000 “m2的觀察視野中所佔據之面積,並計算5 P位之平均值,將其設為粒界反應相之每1 000 &quot; m2之 觀察視野中之面積。 &lt;彈簧彎曲彈性限度(Kb) &gt; 彈簧彎曲彈性限度(Kb)係依據JIS H3 130(合金編號 C1990),實施重複式彎曲試驗,並根據殘留永久應變之彎 曲矩測定表面最大應力。 21 201118181 [表 2- 1] 構造 特性 Avg.(D2/D,) Avg.D 丨 (/zm) 粒界反應相 面積/1000 μ m2(%) Avg.D2 (μπι) 平均結晶 粒徑(//m) Avg.D3 (//m) 強度 (MPa) 曲 Kb (MPa) 先前例1 4.3 0.3 2.2 1.3 15 11 845 1 634 先前例2 9.0 0.2 2.4 1.8 15 8.3 856 2 642 先前例3 58.8 0.2 4.1 11.8 15 6.0 878 3 659 先前例4 6.0 0.1 0.8 0.6 15 11 805 1 604 22 201118181 [表 2- 2] 構造 特性 Avg.(D2/D,) Avg.D, (//m) 粒界反應相面 積/1000 gm2 (%) Avg.D2 (ym) 平均結晶 粒徑 (㈣ Avg_D3 (gm) 強度 (MPa) 弩曲 Kb (MPa) 實施例A 1.4 1.3 2.6 1.9 13 12 816 0 561 實施例B 2.1 0.9 2.8 1.9 13 10 855 0.2 492 實施例c 2.7 0.8 2.6 2.1 13 7 1023 1.4 256 實施例D 2.8 0.8 2.6 2.1 13 5 1028 1.8 154 實施例E 1.4 1.3 1.7 1.9 21 19 821 0 564 實施例F 2.1 0.9 1.7 1.9 21 16 857 0.2 493 實施例G 2.7 0.8 1.7 2.1 21 11 1028 1.6 257 實施例Η 2.8 0.8 1.7 2.1 21 9 1038 1.9 156 實施例I 1.4 1.3 2.1 1.9 16 14 825 0 567 實施例J 2.1 0.9 2.3 1.9 16 12 854 0.0 491 實施例κ 2.7 0.8 2.1 2.1 16 9 1032 1.2 258 實施例L 2.8 0.8 2.1 2.1 16 7 1042 1.7 156 實施例1 1.4 1·3 2.1 1.9 16 14 835 0 574 實施例2 2.1 0.9 2.3 1.9 16 12 863 0.0 594 實施例3 2.5 0,8 2.1 2.0 16 10 947 0.5 651 實施例4 2.7 0.8 2.1 2.1 16 9 1040 1.2 715 實施例5 2.8 0.8 2.1 2.1 16 7 1049 1.7 721 實施例Μ 2.8 0.8 2.1 2.1 16 7 1056 2.1 726 實施例Ν 1.4 1.3 2.1 1.9 16 14 840 0 630 實施例0 2.1 0.9 2.3 1.9 16 12 867 0.0 651 實施例Ρ 2.7 0.8 2.1 2.1 16 9 1046 1.2 785 實施例Q 2.8 0.8 2.1 2.1 16 7 1055 1.7 792 實施例R 2.9 0.5 1.5 1.4 16 9 1005 1.0 691 實施例S 2.9 0.5 1.5 1.4 16 8 1016 1.0 699 實施例6 5.1 0.5 1.6 2.5 16 8 1018 1.0 700 實施例7 5.4 0.5 1.6 2.5 16 6 1029 1.6 708 實施例8 3.4 1.4 9.1 4.6 10 7 936 0.4 644 23 201118181 [表 2- 3] 搆造 特性 Avg.(D2/D,) Avg.D, (ym) 粒界反應 相面積 /1000 μ m2 (%) Avg.D2 Um) 平均結 晶粒徑 (㈣ Avg.D3 (//m) 強度 (MPa) 弩曲 Kb (MPa) 實施例9 4.0 1.3 9.1 5.2 10 6 995 1.0 684 實施例T 4.0 1.3 14.8 5.2 10 6 987 1.3 679 實施例10 4.2 1.3 9.1 5.4 10 4 1007 1.1 692 實施例U 4.2 1.3 9.1 5.4 10 7 1015 1.1 698 實施例V 4.2 1.3 14.8 5.4 10 6 1023 1.8 703 實施例W 2.1 0.9 1.7 1.9 25 24 856 0 589 實施例X 2.7 0.8 1.7 2.1 25 21 1033 1.4 710 實施例Y 2.8 0.8 1.7 2.1 25 8 1042 1.9 716 實施例11 5.4 0.4 1.7 2.3 25 10 1047 1.8 720 實施例12 4,5 0.4 1.6 1.8 29 17 1083 2.2 745 實施例13 2.2 0.6 1.6 1.3 18 11 917 0.4 630 實施例14 2.7 1.8 13.3 4.8 6 5 1065 2,2 732 實施例Z 2.7 1.8 13.3 4.8 6 5 1080 2.4 743 實施例A’ 2.7 1.8 5.3 4.8 15 13 1060 2.1 729 實施例15 2.7 0.8 2.1 2.0 14 8 1071 1.8 736 實施例16 2.7 0.8 2.2 2.1 15 9 1081 2.2 743 實施例17 2.8 0.8 2.2 2.2 14 7 1049 1.4 721 24 201118181 [表 2 — 4]Spectrometer) confirms that the black portion of the speckle pattern constituting the grain boundary reaction phase is T i C u 3 . Regarding the respective grain boundary reaction phases, the diameter Di of the largest circle surrounded by the grain boundary reaction phase and the straight line Da' of the smallest circle surrounding the grain boundary reaction phase were respectively determined on the photograph, and 〇2 was obtained for each grain boundary reaction phase. /〇1. D2/D is obtained for all the grain boundary reaction phases of the measurable D! and D2 included in the observation field, and the average value is set to Avg (D2/D〇. Further, the measured enthalpy and D2 are determined. The average value is set to AvgDt and AvgD2, respectively. Further, the diameter D3 of the largest circle surrounded by the grain boundary of the crystal grain is measured on each crystal grain surrounding the grain boundary reaction phase, and will be examined at 20 201118181. : In the middle, the average value of all D3 is set to A*. The V-like knife is used to determine the area occupied by the grain boundary reaction phase in the above-mentioned photograph of 1000" m2 observation field, and calculate 5 P position. The average value is set as the area in the observation field per 1 000 &quot; m2 of the grain boundary reaction phase. &lt;Spring bending elastic limit (Kb) &gt; Spring bending elastic limit (Kb) is based on JIS H3 130 ( Alloy No. C1990), repeated bending test was carried out, and the maximum surface stress was measured according to the bending moment of residual permanent strain. 21 201118181 [Table 2 - 1] Structural characteristics Avg. (D2/D,) Avg.D 丨(/zm) Grain boundary reaction phase area / 1000 μ m2 (%) Avg.D2 (μπι) Average crystal grain size (//m) Avg.D3 (/ / m) Strength (MPa) Curve Kb (MPa) Previous Example 1 4.3 0.3 2.2 1.3 15 11 845 1 634 Previous Example 2 9.0 0.2 2.4 1.8 15 8.3 856 2 642 Previous Example 3 58.8 0.2 4.1 11.8 15 6.0 878 3 659 Previous Example 4 6.0 0.1 0.8 0.6 15 11 805 1 604 22 201118181 [Table 2 - 2] Structural characteristics Avg. (D2/D,) Avg.D, (//m) Grain boundary reaction phase area / 1000 gm2 (%) Avg.D2 (ym) average crystal grain size ((iv) Avg_D3 (gm) strength (MPa) distortion Kb (MPa) Example A 1.4 1.3 2.6 1.9 13 12 816 0 561 Example B 2.1 0.9 2.8 1.9 13 10 855 0.2 492 Example c 2.7 0.8 2.6 2.1 13 7 1023 1.4 256 Example D 2.8 0.8 2.6 2.1 13 5 1028 1.8 154 Example E 1.4 1.3 1.7 1.9 21 19 821 0 564 Example F 2.1 0.9 1.7 1.9 21 16 857 0.2 493 Example G 2.7 0.8 1.7 2.1 21 11 1028 1.6 257 EXAMPLES 2.8 0.8 1.7 2.1 21 9 1038 1.9 156 Example I 1.4 1.3 2.1 1.9 16 14 825 0 567 Example J 2.1 0.9 2.3 1.9 16 12 854 0.0 491 Example κ 2.7 0.8 2.1 2.1 16 9 1032 1.2 258 Example L 2.8 0.8 2.1 2.1 16 7 1042 1.7 156 Example 1 1.4 1·3 2.1 1.9 16 14 835 0 574 Example 2 2.1 0.9 2.3 1.9 16 12 863 0.0 594 Example 3 2.5 0,8 2.1 2.0 16 10 947 0.5 651 Example 4 2.7 0.8 2.1 2.1 16 9 1040 1.2 715 Example 5 2.8 0.8 2.1 2.1 16 7 1049 1.7 721 Example Μ 2.8 0.8 2.1 2.1 16 7 1056 2.1 726 Example Ν 1.4 1.3 2.1 1.9 16 14 840 0 630 Example 0 2.1 0.9 2.3 1.9 16 12 867 0.0 651 Example 2.7 2.7 0.8 2.1 2.1 16 9 1046 1.2 785 Example Q 2.8 0.8 2.1 2.1 16 7 1055 1.7 792 Example R 2.9 0.5 1.5 1.4 16 9 1005 1.0 691 Example S 2.9 0.5 1.5 1.4 16 8 1016 1.0 699 Example 6 5.1 0.5 1.6 2.5 16 8 1018 1.0 700 Example 7 5.4 0.5 1.6 2.5 16 6 1029 1.6 708 Example 8 3.4 1.4 9.1 4.6 10 7 936 0.4 644 23 201118181 [Table 2 - 3] Structural characteristics Avg. (D2/D,) Avg.D, (ym) Grain boundary reaction phase area / 1000 μ m2 (%) Avg.D2 Um) Average crystal grain size ((iv) Avg.D3 (//m) Strength (MPa) Distortion Kb (MPa) Example 9 4.0 1.3 9.1 5.2 10 6 995 1.0 684 Example T 4.0 1.3 14.8 5.2 10 6 987 1.3 679 Example 10 4.2 1.3 9.1 5.4 10 4 1007 1.1 692 Example U 4.2 1.3 9.1 5.4 10 7 1015 1.1 698 Example V 4.2 1.3 14.8 5.4 10 6 1023 1.8 703 Example W 2.1 0.9 1.7 1.9 25 24 856 0 589 Example X 2.7 0.8 1.7 2.1 25 21 1033 1.4 710 Example Y 2.8 0.8 1.7 2.1 25 8 1042 1.9 716 Example 11 5.4 0.4 1.7 2.3 25 10 1047 1.8 720 Example 12 4,5 0.4 1.6 1.8 29 17 1083 2.2 745 Example 13 2.2 0.6 1.6 1.3 18 11 917 0.4 630 Example 14 2.7 1.8 13.3 4.8 6 5 1065 2, 2 732 Example Z 2.7 1.8 13.3 4.8 6 5 1080 2.4 743 Example A' 2.7 1.8 5.3 4.8 15 13 1060 2.1 729 Example 15 2.7 0.8 2.1 2.0 14 8 1071 1.8 736 Example 16 2.7 0.8 2.2 2.1 15 9 1081 2.2 743 Example 17 2.8 0.8 2.2 2.2 14 7 1049 1.4 721 24 201118181 [Table 2 — 4]

&lt;考察&gt; 先前例1〜4係條件為Ti _ cu系之穩定相於粒界以未 固溶粒子形態分散於Cu母相中,於最終之固溶化處理與時 效處理之間進行冷軋之例,於此情形時,粒界反應相之成 長較小,面積率亦較小。強度及彎曲加工性之平衡性亦較 差。 實施例1〜17係於最終之固溶化處理後不進行冷軋而 進行時效處理之例。實施例丨〜7係將最終固溶化處理固定 為820 C x60 s而改變時效處理及最終壓延之條件。可知任 25 201118181 -實施例與先前例相比,強度與朁曲加工性之平衡性均顯 著提高。 又,由實施例1〜5或實施例6〜7可知,隨著最終壓 延之軋縮率上升,AvgCDVD,)亦上升。 實施例8〜10係將最終固溶化處理設為$之 例,與實施例i〜7相比,平均粒徑減小實施例η〜ΐ2 中’相反地使最終HI溶化處理之溫度升高,因此與實施例工 〜7相比’平均粒徑增大。 由實施例13及14可知,存在若提高Ti濃度,則強度 上升之傾向。 實施例15〜17係添加有第三元素之例。可理解即便添 加第二元素,本發明之效果亦得以維持。 實施例A〜Η雖未進行第i次固溶化處理及去應變退火 中之任一者,但可獲得強度與彎曲加工性之平衡性優異之 本發明之鈦銅。然而,由於未進行去應變退火,因此與進 行了去應變退火之例相比,Kb值較小。 實施例I〜L雖未進行去應變退火,但可獲得強度與彎 曲加工性之平衡性優異之本發明之鈦銅。同樣地,Kb值較 小 〇 實施例Μ係相對於實施例5將最終壓延之軋縮率提高 至40%之例,強度略微提高。 實施例Ν〜Q係與實施例1〜5及Μ相比進行延長去應 變退火時間之例,可知若以相同軋縮率進行比較,則彈簧 彎曲彈性限度略微提高。 26 201118181 實施例R及S係於低溫側進行時效處理之例,雖然與 實施例4及Μ相比,粒界反應相之面積分別減少,但強度 與彎曲加工性之平衡性依然優於比較例。 實施例Τ係與實施例9相比為長時間進行時效處理之 例,雖然粒界反應相之面積增大,但強度與彎曲加工性之 平衡性依然優於比較例。 實施例U係與實施例9相比為提高最終冷札之札縮率 之例,雖然包圍粒界反應相之最小圓之直徑A略微増大, 但強度與彎曲加工性之平衡性依然優於比較例。 實施例V與實施例9相比,時效處理之時間較長最 終冷軋之軋縮率亦較高,但強度與彎曲加工性之平衡性依 然優於比較例。 於實施你I W〜Υ巾,由於將最終固溶化處理之溫度設 火在尚’見側因此平均結晶粒略微變大,但強度與彎曲加 工性之平衡性依然優於比較例。 ‘實施例Ζ及Α,係將Ti濃度設為4 〇質量%之例但可 獲得強度與彎曲加工性之平衡性優異之本發明之鈦銅。 比較例1〜8係與實施例同樣地於最終之固溶化處理後 不進行冷軋而進行時效處理之例,但由於任一者之熱處理 條件及/或壓延條件均不合適’因此係強度及彎曲加工性未 充分提局之例。 較例1係’由於固溶化處理溫度及時效溫度過高, 因此粒界反應相粗大化,且粒界反應相之面積率較大,結 晶粒亦較大。 27 201118181 果;5廄Γ例2係’由於最終壓延中之軋縮率過高,因此粒 界反應相及結晶粒扁平化。 車幻3係,由於最終壓延中之軋縮率過高,因此粒 界反應相扁平化。由於固溶化處理溫度較高,因此結晶粒 較大。因結晶粒較大’故粒界面積減少,且粒界反應相變 i因相同之理由,粒界反應相之面積率減小。 4係由於固溶化處理溫度較低,因此結晶粒 變小,又,由於最終壓延中之軋縮率過高,因此粒界反應 相及結晶粒扁平化。 較例5係’由於最終壓延中之軋縮率過高,因此粒&lt;Inspection&gt; In the prior examples 1 to 4, the stable phase of the Ti_cu system was dispersed in the Cu matrix phase in the form of undissolved particles at the grain boundary, and cold rolling was performed between the final solution treatment and the aging treatment. For example, in this case, the growth of the grain boundary reaction phase is small, and the area ratio is also small. The balance between strength and bending workability is also poor. Examples 1 to 17 are examples in which aging treatment is carried out without cold rolling after the final solution treatment. In the examples 丨~7, the final solution treatment was fixed to 820 C x 60 s to change the conditions of aging treatment and final calendering. It can be seen that the balance between the strength and the tortuous workability is remarkably improved as compared with the previous examples. Further, from Examples 1 to 5 or Examples 6 to 7, it is understood that AvgCDVD, as the final rolling shrinkage rate increases, also increases. In the examples 8 to 10, the final solution treatment was carried out as an example. Compared with the examples i to 7, the average particle diameter was decreased in the examples η to ΐ2, and the temperature of the final HI dissolution treatment was increased. Therefore, the average particle diameter is increased as compared with the embodiment of the work-7. As is apparent from Examples 13 and 14, when the Ti concentration is increased, the strength tends to increase. Examples 15 to 17 are examples in which a third element is added. It is understood that the effect of the present invention is maintained even if the second element is added. In the examples A to Η, the i-th solid solution treatment and the strain relief annealing were not performed, but the titanium copper of the present invention excellent in balance between strength and bending workability was obtained. However, since the strain relief annealing is not performed, the Kb value is small as compared with the case where the strain relief annealing is performed. In Examples I to L, although the strain relief annealing was not performed, the titanium copper of the present invention excellent in balance between strength and bending workability was obtained. Similarly, the Kb value was smaller than that of the Example Μ, and the final rolling reduction ratio was increased to 40% with respect to Example 5, and the strength was slightly increased. In the examples Ν to Q, in comparison with Examples 1 to 5 and Μ, the elongation annealing time was extended, and it was found that the spring bending elastic limit was slightly improved when compared at the same rolling reduction ratio. 26 201118181 Examples R and S are aging treatments on the low temperature side. Although the area of the grain boundary reaction phase is reduced compared with Example 4 and Μ, the balance between strength and bending workability is still superior to the comparative example. . The examples are an example in which aging treatment is carried out for a long period of time as compared with Example 9. Although the area of the grain boundary reaction phase is increased, the balance between strength and bending workability is still superior to the comparative example. Example U is an example of improving the final cold-shrinking ratio compared with Example 9. Although the diameter A of the smallest circle surrounding the grain boundary reaction phase is slightly large, the balance between strength and bending workability is still superior to comparison. example. In Example V, compared with Example 9, the aging treatment time was longer and the cold rolling reduction ratio was higher, but the balance between strength and bending workability was still superior to the comparative example. In the implementation of your I W ~ wipes, the average crystal grain size is slightly larger due to the temperature at which the final solution treatment is set on the side of the product, but the balance between strength and bending workability is still superior to the comparative example. In the examples, the titanium concentration of the present invention is such that the Ti concentration is 4% by mass. However, the titanium copper of the present invention having excellent balance between strength and bending workability can be obtained. Comparative Examples 1 to 8 are examples in which aging treatment is carried out without cold rolling after the final solution treatment in the same manner as in the examples, but the heat treatment conditions and/or rolling conditions of either of them are not suitable. The bending processability is not sufficiently improved. Compared with the first example, the temperature of the solid solution treatment is too high, so the grain boundary reaction phase is coarsened, and the area ratio of the grain boundary reaction phase is large, and the grain size is also large. 27 201118181 Fruit; 5廄Γ例2系' Because the rolling reduction rate in the final calendering is too high, the grain boundary reaction phase and crystal grains are flattened. In the car 3 series, the grain boundary reaction phase is flattened because the rolling reduction rate in the final rolling is too high. Since the solution treatment temperature is high, the crystal grains are large. Since the crystal grain size is larger, the grain boundary area is decreased, and the grain boundary reaction phase change i is the same, and the area ratio of the grain boundary reaction phase is decreased. In the case of the 4 series, since the solid solution treatment temperature is low, the crystal grains become small, and since the rolling reduction ratio in the final rolling is too high, the grain boundary reaction phase and the crystal grains are flattened. Comparative Example 5 is due to the excessively high rate of shrinkage in the final calendering.

界反應相及結晶粒扁平仆 ,„ . L 构十化。又,由於時效溫度過高,因此 粒界反應相粗大化。 比較例6係,由於最終壓延中之札縮率過高,因此粒 界反應相及’”。日曰粒扁平化。χ ’由於固溶化處理溫度及時 效溫度過高’ 0此粒界反應相粗大化,且粒界反應相之面 積率較大,結晶粒亦較大。 比較例7係,由於固溶化處理溫度較低,因此結晶粒 變小’由於時效處理溫度較高,因此粒界反應相粗大化, 且由於最終壓延中之軋縮率過高,因此粒界反應相及結晶 粒扁平化。 比較例8係,由於固溶化溫度過高,因此結晶粒徑粗 大化’雖然進行了理想之時效處理,但因沿粒界形成有反 應相而導致粒界反應相扁平化。由於粒徑較大,因此於時 效處理中擴散至粒界為止之距離變長,且對於反應相之Ti 28 201118181 原子之供給不足’因而粒界反應相之面積率較低。 比較例9係,由於時效處理溫度較低,因此Avg(D2/D|) 增大且粒界反應相之形狀不合適’彎曲發生劣化。 比較例10係,由於時效處理溫度過高,因此AvgD2增 大且粒界反應相粗大化。 比較例11〜1 3係 且改變時效處理溫度。 之面積比例亦不合適。 將固溶化處理溫度設定得較低,並 除結晶粒徑較小以外,粒界反應相 比較例A係相對於比較例8減小了最終冷軋中之軋縮 率之例,但與比較例8相同,結晶粒徑粗大化,且Avg(D2/Di) 亦增大。 比較例B係相對於比較例10減小了最終冷札中之札縮 率之例,但Avg(D2/Dl)依然較大,且無法獲得取得平衡之 特性。 【圖式簡單說明】 圖1— 1係利用電子顯微鏡觀察粒界反應相A之例。 圖1 一 2係縮小圖1 — 1之倍率而成之圖。 【主要元件符號說明】 11 由粒界反應相所包圍之最大圓 12 包圍粒界反應相之最小圓 13 由包圍粒界反應相之結晶粒之物1 α ^ 7之祖界所包圍之最大 圓 Α 粒界反應相 29The boundary reaction phase and the crystal grain are flat, and the L-structure is decimated. Moreover, since the aging temperature is too high, the grain boundary reaction phase is coarsened. In Comparative Example 6, the grain shrinkage rate in the final calendering is too high, so the grain is too high. The boundary reaction phase and '". The sundial is flattened. χ ′ Because the solution treatment temperature is too high, the temperature is too high, and the grain boundary reaction phase is coarsened, and the grain boundary reaction phase has a large area ratio and the crystal grains are also large. In Comparative Example 7, since the solid solution treatment temperature is low, the crystal grains become small. Since the aging treatment temperature is high, the grain boundary reaction phase is coarsened, and since the rolling reduction rate in the final calendering is too high, the grain boundary reaction The phase and the crystal grains are flattened. In Comparative Example 8, since the solid solution temperature was too high, the crystal grain size was coarsened. Although the desired aging treatment was carried out, the grain boundary reaction phase was flattened by the formation of the reaction phase along the grain boundary. Since the particle diameter is large, the distance from the diffusion to the grain boundary in the aging treatment becomes long, and the supply of Ti 28 201118181 atoms to the reaction phase is insufficient, and thus the area ratio of the grain boundary reaction phase is low. In Comparative Example 9, since the aging treatment temperature was low, Avg (D2/D|) was increased and the shape of the grain boundary reaction phase was not appropriate, and the bending was deteriorated. In Comparative Example 10, since the aging treatment temperature was too high, AvgD2 was increased and the grain boundary reaction phase was coarsened. Comparative Examples 11 to 1 3 were used and the aging treatment temperature was changed. The area ratio is also inappropriate. The solution treatment temperature was set to be low, and in addition to the smaller crystal grain size, the grain boundary reaction phase comparison example A reduced the rolling reduction ratio in the final cold rolling with respect to Comparative Example 8, but compared with the comparative example. When 8 is the same, the crystal grain size is coarsened, and Avg (D2/Di) is also increased. Comparative Example B is an example in which the reduction ratio in the final cold is reduced with respect to Comparative Example 10, but Avg (D2/Dl) is still large, and the balance is not obtained. [Simple description of the diagram] Figure 1-1 shows an example of the grain boundary reaction phase A observed by an electron microscope. Figure 1 - 2 is a diagram of reducing the magnification of Figure 1-1. [Explanation of main component symbols] 11 The largest circle surrounded by the grain boundary reaction phase 12 The smallest circle surrounded by the grain boundary reaction phase 13 The largest circle surrounded by the ancestors of the grain 1 α ^ 7 surrounding the grain boundary reaction phase Α grain boundary reaction phase 29

Claims (1)

201118181 七、申請專利範圍: 1. 一種電子零件用銅合金,其係含有2.0〜4.0質量%之 Ti,且剩餘部份由銅及不可避免之雜質構成;或者係含有 2.0〜4_〇質量%之Ti,進而合計含有〇〜0.5質量%之選自由 為第 3 元素群之 Mn ' Fe、Mg、Co、Ni、Cr、V、Nb、Mo ' Zr、Si、B及P構成之群中之i種或2種以上,且剩餘部份 由銅及不可避免之雜質構成; 於利用電子顯微鏡觀察平行於壓延方向之剖面之組織 時’存在包含沿結晶粒界析出之Ti 一 Cu系粒子之粒界反應 相,關於各個粒界反應相之包圍粒界反應相之最小圓的直 徑D2相對於由粒界反應相所包圍之最大圓的直徑a之比 (D2/D,)之平均值Avg(D2/D丨)為1〇〜6〇’〇1之平均值 為〇·4〜2.0 Am,進而’粒界反應相於 察視野中佔i.5〜15%之面積。 之觀 2.如申請專利範圍第i項之銅合金,其中,利用電子顯 微鏡觀察平行於壓延方向之剖面之·组織時,D2之平均值 AvgD2 為 ι·〇〜5 〇 μ m。 3_如申請專利範圍第1項 乂弟2項之鋼合金,其中, 用電子顯微鏡觀察平行於壓 、 沾曰叮、縻延方向之剖面之組織時,平 、,,〇日日粒僅以近似圓的直徑表 , M ^ ^ 為 5^m 以上、30/zm 下關於包圍粒界反應相之各姓日4 Ρή ^ m ^ ^ 、、、0日日粒,由該結晶粒之粒 所包圍之最大圓之直徑d3 AvgD3 〇 千均值 AvgD3 為 AvgD2 4· 一種伸鋼品,係由申請專利範 圍第 1至3項中任一項 30 201118181 之銅合金構成。 5 · —種電早φ 件’其具備申請專利範圍第1至3項中任 一項之銅合金。 種連接器’其具備申請專利範圍第^至3項中任一 項之銅合金。 7.種電子零件用銅合金之製造方法,其包含如下步 驟: 對3有2.0〜4.0質量%之Ti,且剩餘部份由銅及不可 避免之雜質構成之銅合金素材,或者含有2.〇〜4〇質量% 之Ti ’進而合計含有。〜〇 5質量%之選自由為第3元素群 之 Mn、Fe、Mg、Co、Ni、Cr、v、灿、m〇、&amp;、^ b 及 P構成之群中之i種或2種以上,且剩餘部份由銅及不 &lt;避 免之雜質構成之銅合金素材,進行加熱至73〇〜88〇。匸内丁t 固溶限變成與添加量相同之溫度以上的固溶化處理; 於固溶化處理後,進行於材料溫度4〇〇〜5〇(rc加熱〇.1 〜2 0小時之時效處理; 於時效處理後,進行軋縮率為〇〜4〇%之冷軋。 八、圖式· (如次頁) 31201118181 VII. Patent application scope: 1. A copper alloy for electronic parts, which contains 2.0 to 4.0% by mass of Ti, and the remainder is composed of copper and unavoidable impurities; or 2.0 to 4% by mass. Further, Ti is further contained in a group consisting of Mn 'Fe, Mg, Co, Ni, Cr, V, Nb, Mo ' Zr, Si, B, and P which are 第 0.5 0.5% by mass of the third element group. i or more than two, and the remainder is composed of copper and unavoidable impurities; when the microstructure parallel to the cross section of the rolling direction is observed by an electron microscope, 'there is a grain containing Ti-Cu-based particles precipitated along the grain boundary The boundary reaction phase, the average value Avg of the ratio (D2/D,) of the diameter D2 of the smallest circle surrounding the grain boundary reaction phase of each grain boundary reaction phase to the diameter a of the largest circle surrounded by the grain boundary reaction phase (D2/D) D2/D丨) is 1〇~6〇' The average value of 〇1 is 〇·4~2.0 Am, and the 'grain boundary reaction phase accounts for i.5~15% of the area of view. 2. The copper alloy of the i-th aspect of the patent application, wherein the average value of D2, AvgD2, is ι·〇~5 〇 μ m when the microstructure of the cross section parallel to the rolling direction is observed by an electron microscope. 3_For example, in the first application of the patent scope, the steel alloy of the two brothers, in which the microstructure parallel to the profile of the pressure, the sputum, and the sag is observed by an electron microscope, the granules are only The diameter table of the approximate circle, M ^ ^ is 5^m or more, and the number of days around the grain boundary reaction phase is 4 Ρή ^ m ^ ^, and 0 day, under the 30/zm, the grain of the crystal grain The diameter of the largest circle surrounded by d3 AvgD3 〇 Thousand mean AvgD3 is AvgD2 4. A steel-stretched product consisting of a copper alloy of any one of claims 1 to 3 of claim 30 201118181. (5) - A type of copper alloy having any one of claims 1 to 3. A connector of the present invention has a copper alloy as claimed in any one of claims. 7. A method for producing a copper alloy for an electronic component, comprising the steps of: having 2.0 to 4.0% by mass of Ti for 3, and the remaining portion of copper alloy material composed of copper and unavoidable impurities, or containing 2. ~4〇% by mass of Ti' is further contained in total. ~5% by mass of one or two selected from the group consisting of Mn, Fe, Mg, Co, Ni, Cr, v, can, m〇, &amp;, ^ b and P of the third element group Above, and the remaining part is made of copper and a copper alloy material which is not made of impurities, and is heated to 73 〇 to 88 〇. The solid solution limit of the ruthenium t becomes a solution treatment at a temperature equal to or higher than the addition amount; after the solution treatment, the aging treatment is performed at a material temperature of 4 〇〇 to 5 Torr (rc heating 〇.1 to 2 hours); After the aging treatment, the cold rolling is performed at a rolling reduction ratio of 〇~4〇%. 8. Drawings (as in the next page) 31
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