TW201118134A - Curable resin composition and cured product thereof - Google Patents

Curable resin composition and cured product thereof Download PDF

Info

Publication number
TW201118134A
TW201118134A TW099119049A TW99119049A TW201118134A TW 201118134 A TW201118134 A TW 201118134A TW 099119049 A TW099119049 A TW 099119049A TW 99119049 A TW99119049 A TW 99119049A TW 201118134 A TW201118134 A TW 201118134A
Authority
TW
Taiwan
Prior art keywords
acid
group
resin composition
curable resin
compound
Prior art date
Application number
TW099119049A
Other languages
Chinese (zh)
Other versions
TWI485202B (en
Inventor
Masataka Nakanishi
Yoshihiro Kawada
Chie Sasaki
Shizuka Aoki
Naofusa Miyagawa
Kenichi Kuboki
Zuikan Suzuki
Masato Yarita
Hiroo Koyanagi
Original Assignee
Nippon Kayaku Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kayaku Kk filed Critical Nippon Kayaku Kk
Publication of TW201118134A publication Critical patent/TW201118134A/en
Application granted granted Critical
Publication of TWI485202B publication Critical patent/TWI485202B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22Di-epoxy compounds
    • C08G59/30Di-epoxy compounds containing atoms other than carbon, hydrogen, oxygen and nitrogen
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C08G59/681Metal alcoholates, phenolates or carboxylates
    • C08G59/685Carboxylates
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/38Polysiloxanes modified by chemical after-treatment
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/0091Complexes with metal-heteroatom-bonds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3412Heterocyclic compounds having nitrogen in the ring having one nitrogen atom in the ring
    • C08K5/3432Six-membered rings
    • C08K5/3435Piperidines
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes
    • C08L83/06Polysiloxanes containing silicon bound to oxygen-containing groups
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • H01L23/295Organic, e.g. plastic containing a filler
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/14Polysiloxanes containing silicon bound to oxygen-containing groups
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/52Encapsulations
    • H01L33/56Materials, e.g. epoxy or silicone resin

Abstract

An objective of the invention is to provide a curable resin composition, providing a cured product excellent in optical properties such as the erosion resistance against the gas in the environment, resistance to heat coloring, or light extraction efficiency and so on. The curable resin composition of the invention takes polyorganosiloxane (A) and zinc salt and/or zinc complex (C) as the essential ingredients, wherein the polyorganosiloxane (A) satisfies the following criteria. The polyorganosiloxane (A) is an epoxy resin at least having glycidyl group and/or epoxy cyclohexyl in the molecule.

Description

201118134 ,、、發明說明: 【發明所屬之技術領域】 :發明係關於一種適合於電氣電子材料用③ 先半導體用途之硬化性樹脂組成物、及其硬化物 【先前技術】 自“以來’作為LED製品等之光半導體元件之 厂,就性能與經濟性之平衡方面而一 脂組成物。尤m “…叫 幻木用環氧掏 ,…“廣泛使用耐熱性、透明性、機械特性之平 衡優異之” a型環氧樹脂所代表之環氧丙基 = 脂組成物。 n %乳樹 '、、、、而部被指出’隨著LED製品之發光波長之短波長化 :主要發出藍色光之LED製品為48〇細)的推進,結果在短 /長光之影響下,上述密封材料於LED晶片上著色,最終 作為LED製品而照度降低。 、 因此’與具有芳香環之環氧丙基峻型環氧樹脂組成物 比較3,4 -ί哀氧環己基甲酸3,4·環氧環己基甲醋所代表 ^旨環式環氧樹脂於透明性方面優異,因此一直作為㈣ 被封材料而被積極研究(專利文獻丨、2)。 λ又,近年來之LED製品,由於對照明或τν之背光源 等進-步推進高亮度化,且LED點亮時伴隨大量發熱,因 此即便是使用該脂環式環氧樹脂之樹脂組成物亦於LED晶 片上引起著色’最終作為LED製品而照度降低,财久性方 面亦殘留問題(專利文獻3)。 專利文獻1 :日本特開平9_213997號公報 201118134 專利文獻2 :日本特許3618238號公報 專利文獻3 . WO/2005-1 00445號公報 專利文獻5 :日本特開2〇〇7_324256號 專利文獻6 :日本特開2〇〇〇_174347號 【發明内容】 〃自上述環氧樹脂之耐久性問題考慮,正研究將如聚矽 氧樹脂或聚矽氧改質環氧樹脂等所代表之導入有矽氧烷骨 架(具體而言為具有Si_◦鍵之骨架)之樹脂作為密封材料(專 匕知 吊^入有石夕氧烧骨架之樹脂與環氧樹脂相 匕較對熱與光更穩定。因此’於應用於LEd製品之密 材料之情形時,就] a μ L 々 ' 尤LED晶片上之者色之觀點而言,-般認 為:、耐久性較環氧樹脂更優異 '然而,導入有石夕氧院骨架 之樹月曰類與環氧樹月旨相比較,财透氣性較差。目此,於使 二聚石夕氧樹脂或聚♦氧改質環氧樹脂作為LED㈣材料之 情形時’雖然LED晶月上之著色不成 起内部之構成構件之劣化'著色之門…仁會產生引 境中使用之情形時,。纟其於在生活環 至内部而成種5⑯,此種化合物渗透 ”明用ΐ 不良情況之契機。例如,於上述樹脂用 2明用途之情料,存在以下問題: 荨穿透LED之宗封从上, 兄甲之虱體 屬導線架上封裝體内之構成構件即金 〃、 鍍之銀成分(為了提高反射率而f 色或黑化,最故#τ +而實施鍍銀)變 6)。 ,、使作為㈣製品之性能降低(專利文獻5、 201118134 為了消除該耐透氣性 ,,# ^ ^ 4碭,專利文獻5、ό中使用將 被覆有耐透軋性保護劑 則之金屬部以無機材料被覆等之方 法,但该方法存在步驟择 诹增加、生產性變差之問題。 本發明係鑒於上述先前 Μ ^ 无别技術而完成者,其目的在於提 供一種可提供滿足作為電翁 电風電子材料用途、尤其是光半導 體密封材㈣要求之諸物性之硬化物的硬化性樹脂組成 物+尤其提供一種可提供對環境中之氣體等之腐餘性、耐 熱著色性或光取出效率黧古與 手等先學特性優異之硬化物的硬化性 樹脂組成物。 本發明人等鑒於如上所述之實際狀況而反覆潛心研 九,結果完成本發明。 即’本發明係關於下述者: ⑴ 種硬化性樹脂組成物,其係以有機聚矽氧(Α)、與辞 鹽及/或鋅錯合物(C)為必需成分’ 其中’有機聚矽氧(Α)滿足以下條件, 有機聚矽氧(Α): 其係至少於其分子中具有環氧丙基(glycidyl gr〇up)及/ 或環氧基環己基之環氧樹脂; (2) 如前項(1)之硬化性樹脂組成物,其中上述鋅鹽及/或辞 錯合物(C)為選自由選自磷酸酯及磷酸中之1種以上之酸之 辞鹽、與含有上述酸及上述鋅鹽作為配位基之鋅錯合物所 組成之群中之至少1種; 201118134 (3) 如前項(1)之硬化性樹脂組成物,其中上述鋅鹽及/ <在辛 錯合物(C)為選自由碳數1〜30之羧酸之辞鹽、與含有上述 酸及上述鋅鹽作為配位基之鋅錯合物所組成之群中、 1種; (4) 如前項(1)至(3)中任一項之硬化性樹脂組成物,其含# 具有2個以上羧基’且以脂肪族烴基為主骨架之多元緩奶 (B); (5) 如前項(4)之硬化性樹脂組成物,其中上述多元繞酸⑺) 係藉由碳數5以上之2〜6官能之多元醇與飽和脂肪族環狀 酸酐之反應而獲得之化合物; (6) 如前項(1)〜(5)中任一項之硬化性樹脂組成物,其含有 酸酐; ⑺ 如前項(1)〜(6)中任一項之硬化性樹脂組成物,其含有 党阻胺系光穩定劑及/或含填抗氧化劑; (8) 一種硬化物,其係將如前項(1)〜(7)中任一項之硬化性 樹脂組成物加以硬化而成。 本發明之硬化性樹脂組成物由於耐腐蝕氣體性、耐熱 著色性或光取出效率等光學特性優異,故於光學材料中 201118134 尤其作為照明箄在 製品201118134 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , A factory for optical semiconductor components such as products, which is a fat-based composition in terms of balance between performance and economy. Um "...called epoxy enamel for illusion wood, ..." is widely used for excellent balance of heat resistance, transparency, and mechanical properties. The epoxy propylene = fat composition represented by the "type epoxy resin". n% of the milk tree ',,, and the Ministry is pointed out that 'the short wavelength of the light-emitting wavelength of the LED product: the LED product that emits blue light is 48〇 fine), and the result is under the influence of short/long light. The sealing material is colored on the LED wafer, and finally the illuminance is reduced as an LED product. Therefore, 'Compared with the epoxy-propyl urethane epoxy resin composition having an aromatic ring, 3,4 -ί oxacyclohexylcarboxylic acid 3,4·epoxycyclohexyl ketone represents the ring epoxy resin Because it is excellent in transparency, it has been actively studied as (4) materials to be sealed (Patent Document No. 2, 2). λIn addition, in recent years, LED products have been promoted with high brightness due to illumination or τν backlights, and the LEDs are lit with a large amount of heat, so even the resin composition using the alicyclic epoxy resin is used. In the LED chip, coloring is also caused. Finally, the illuminance is lowered as an LED product, and there is a problem in terms of financial durability (Patent Document 3). Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. 〇〇〇2〇〇〇_174347号 [Summary of the Invention] From the consideration of the durability of the above epoxy resin, it is being studied to introduce a nonoxyl alkane represented by a polyoxymethylene resin or a polyoxymethylene-modified epoxy resin. The resin of the skeleton (specifically, the skeleton having the Si_◦ bond) is used as a sealing material (the resin and the epoxy resin which are specifically known to be suspended from the skeleton are more stable to heat and light than the epoxy resin. In the case of a dense material applied to a LEd product, in terms of a μ L 々', especially on the LED chip, it is generally considered that the durability is superior to that of the epoxy resin. Compared with the epoxy tree, the moon scorpion of the oxygen house skeleton is inferior in gas permeability. Therefore, when the dimeric oxysulfide resin or the polyoxygen modified epoxy resin is used as the material of the LED (four), The color of the LED crystal moon does not become internal Deterioration of the building member's door of coloring... When the person will use it in the environment of the introduction, it will grow into a kind of 516 in the inner ring of life, and this compound will infiltrate the opportunity to use it. For example, The above-mentioned resin has the following problems: The 荨 荨 LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED LED Rate and f color or blackening, the most #τ + and silver plating) 6), to reduce the performance of the product as (4) (Patent Document 5, 201118134 In order to eliminate the gas permeability, # ^ ^ 4砀In Patent Document 5, a method in which a metal portion to which a rolling resistance protective agent is applied is coated with an inorganic material is used, but this method has a problem that the step is increased and the productivity is deteriorated. Previously, 完成 ^ completed without any technology, the purpose of which is to provide a curable resin composition which can provide a hardened material which satisfies the requirements of the electric material of the electric wind electric material, in particular, the optical semiconductor sealing material (4) + especially A curable resin composition capable of providing a cured product having excellent corrosion resistance to a gas or the like in the environment, heat-resistant coloring property, or light extraction efficiency, and excellent in hand and the like. The present inventors have considered the above. The present invention has been completed in the past, and the present invention has been completed. That is, the present invention relates to the following: (1) A curable resin composition which is organic polyfluorene (oxime), salt and/or zinc The compound (C) is an essential component 'wherein' the organopolyfluorene (Α) satisfies the following conditions, the organic polyoxo (Α): which has at least a glycidyl gr〇up and/or in its molecule The epoxy resin composition of the above-mentioned (1), wherein the zinc salt and/or the complex (C) is selected from the group consisting of phosphates and phosphoric acid. At least one of a group consisting of one or more acid salts and a zinc complex containing the above acid and the above zinc salt as a ligand; 201118134 (3) The curable resin according to the above item (1) a composition wherein the above zinc salt and/or the octyl complex (C) is selected from the group consisting of carbon numbers 1 to 3 One of a group consisting of a carboxylic acid salt of 0 and a zinc complex containing the above acid and the above zinc salt as a ligand; (4) Any one of the above items (1) to (3) The curable resin composition, which comprises a polybasic slow milk (B) having two or more carboxyl groups and having an aliphatic hydrocarbon group as a main skeleton; (5) a curable resin composition according to the above item (4), wherein the above plural The acid (7)) is a compound obtained by reacting a 2 to 6-functional polyol having a carbon number of 5 or more with a saturated aliphatic cyclic acid anhydride; (6) according to any one of the above items (1) to (5) (7) The curable resin composition according to any one of the above items (1) to (6), which contains a party-blocking amine-based light stabilizer and/or an anti-oxidant; (8) A cured product obtained by hardening a curable resin composition according to any one of the above items (1) to (7). The curable resin composition of the present invention is excellent in optical properties such as corrosion-resistant gas resistance, heat-resistant coloring property, and light extraction efficiency, and is therefore used as an illumination in the optical material.

吐 生活衣丨見中所使用之光半導體用(LED 4 )之接著材料、穷4 ^在封材料而極其有用。 【實施方式】 、 對本發明之硬化性樹脂組成物進行記載。 本發月之%氧樹脂組成物係以有機聚 及/或鋅錯合物(c)為必需成分。 、匕 s有機聚石夕氧(A)之特徵在於,其係至少於其分子中具有 :?丙基及/或%氧環己基之環氧樹脂,通常係藉由將具有 衣氧丙基或%氧_己基之三院氧基梦院⑻仙⑽㈣丨3以)用 於原料之溶膠-凝膠反應而獲得。 具體可列舉:日本特開2_·2566()9號公報、日本特開 2004 346144號公報、w〇2〇〇4/〇72i5〇號公報、曰本特開 2006-8747琥公報、w〇2_簡99()號公報、日本特開 2006-104248號公報、w〇2〇〇7/1359〇9號公報、日本特開 讓-1购號公報、日本特開2__359933號公報、 W〇2〇〇5/100445號公報、日本特開2008-174640號公報等中 所§己載之具有:T維s 〇a 有一、准展開之網狀結構的倍半矽氧烷 (silsesquioxane)型有機聚矽氧。 對有機聚石夕氧之結構並無特別限定,但由於單純之三 維網狀結構之矽氧烷化合物過硬,因此期望緩和硬度之結 構於本發明中,尤佳為i分子中具有聚石夕氧鍵段與藉由 溶膠-凝膠反應所得之上述倍切氧院結構的嵌段結構體 (bI〇Ck StrUCtUre)(以下稱為嵌段型矽氧烷化合物(A1))。 欣段型石夕氧烧化合物(A1)並非如通常之嵌段共聚物般 201118134 之於直鏈上具有重複單元之化合物,而成為如下結構:具 有—維展開之網狀結構,以倍半矽氧烷結構為核心,鏈狀 聚石夕氧鏈段延伸而鍵結於τ —個倍切氧烧結構^本結構 在對本發明之硬化性樹脂組成物之硬化物賦予硬度與柔軟 性之平衡的意義上有效。 趴奴型矽氧烷化合物(Α丨)例如可如下所述以通式(1) 所表示之院氧基㈣化合物⑷與通式(2)所表示之聚石夕氧油 (b)為原料而製造,視需要亦可使用通式(3)所表示之烧氧基 矽烷化合物⑷作為原料。嵌段型矽氧烷化合物⑷)之鏈狀 聚砂氧鏈段係、由聚石夕氧油(b)所形成,三維網狀倍半石夕氧燒 鏈段係由烧氧基㈣⑷(及視需要所使用之院氧基錢J 所形成。以下,對各原料進行詳細說明。 烷氧基石夕炫化合物⑷係以下述式⑴所表示。 ⑴ XSi(〇R2): (式⑴中’X表示具有環氧丙基及/或環氧 基。存在複數個之R2表示碳數卜1()之直鏈狀、八之有機 環狀烷基,互相可相同,亦可不同) 刀支狀或 作為通式(1)中之X,只要為具有 己基之有機基,則並無特別限制。例如可列;:環氧環 氧基乙基(咖id。训M)、卜環氧丙氧:^環氧丙 氧基丁基等環氧丙氧基碳數丨〜彳 :# 土、環氧丙 環氧環己基)乙基、卜(3 4_環氧^ U丙基’ 6-(3,4- 衣己基)丙基'〜環氧 201118134 環庚基)乙基、/3-(3,4-環氧環己基)丙基、石_(3,4_環氧環己 基)丁基、沒-(3,4-環氧環己基)戊基等具有環氧乙烷基之經 碳數5〜8之環烷基所取代之碳數丨〜5之烷基。該等之中, 較佳為經環氧丙氧基所取代之碳數丨〜3之烷基、具有環氧 基之經碳數5〜8之環烷基所取代之碳數】〜3之烷基,例 如/5 _環氧丙氧基乙基、y _環氧丙氧基丙基、点_^,4-環氧 環己基)乙基,尤佳為0-(3,4-環氧環己基)乙基。It is extremely useful to use the adhesive material for the semiconductor (LED 4) used in the life jacket. [Embodiment] The curable resin composition of the present invention is described. The % oxygen resin composition of this month is an organic poly-and/or zinc complex (c) as an essential component. , 匕 s organopolylithium (A) is characterized in that it has at least a propyl group and/or a oxycyclohexyl group epoxy resin in its molecule, usually by having an oxypropyl group or The % oxygen-hexyl group of the three hospitals (8) Xian (10) (four) 丨 3 is obtained by the sol-gel reaction of the raw materials. Specifically, Japanese Laid-Open Patent Publication No. 2_2566(), Japanese Patent Laid-Open Publication No. 2004-346144, Japanese Patent Publication No. 2004/346, No. 72i5 No. 曰, 曰本特开 2006-8747 _Jian 99 (), Japanese Patent Laid-Open No. 2006-104248, Japanese Patent Publication No. Hei. No. 7/1359〇9, Japanese Patent Application No.-1, No. 2, Japanese Patent Publication No. 2_359933, W〇2 〇〇5/100445, and Japanese Laid-Open Patent Publication No. 2008-174640, etc., have a T-dimensional s 〇a having a quasi-expanded network structure of silsesquioxane type organic polymerization. Oxygen. The structure of the organic polyoxo oxygen is not particularly limited, but since the simple three-dimensional network structure of the oxirane compound is too hard, it is desirable to relax the hardness of the structure in the present invention, and it is particularly preferable to have a polyoxo oxygen in the i molecule. The bond segment and the block structure (bI〇Ck StrUCtUre) of the above-mentioned seso-oxygen structure obtained by a sol-gel reaction (hereinafter referred to as a block type siloxane compound (A1)). The Xinshi type oxime oxy-compound compound (A1) is not a compound having a repeating unit on a straight chain like the usual block copolymer 201118134, and has the following structure: a network structure having a dimensional expansion, sesquiterpene The oxyalkylene structure is a core, and the chain poly-stone phase segment is extended and bonded to the τ-double-cut oxy-fired structure. The structure imparts a balance between hardness and flexibility to the cured product of the curable resin composition of the present invention. Effective in meaning. The oxime-type oxoane compound (Α丨) can be, for example, a compound (4) represented by the formula (1) and a polyoxosulfuric acid (b) represented by the formula (2). For the production, the alkoxydecane compound (4) represented by the formula (3) can also be used as a raw material. a chain-type polyoxynene chain system of a block type oxoxane compound (4)), which is formed by polysulfuric acid (b), and a three-dimensional network sesquiterpoxide group is composed of alkoxy (4) (4) (and Each of the raw materials is described in detail below. The alkoxylated compound (4) is represented by the following formula (1): (1) XSi (〇R2): (X in the formula (1) Indicates that it has a propylene group and/or an epoxy group. A plurality of R2 represents a linear number of a carbon number, and an organic cyclic alkyl group of eight, which may be the same or different from each other. X in the general formula (1) is not particularly limited as long as it is an organic group having a hexyl group. For example, it can be listed; epoxy epoxyethyl group (coffee id. M), propylene oxide: ^Epoxypropoxy butyl group, etc. Epoxy propoxy carbon number 丨~彳:# soil, epoxy propylene epoxy cyclohexyl) ethyl, Bu (3 4_epoxy ^ U propyl ' 6-(3 , 4-hexyl)propyl '~epoxy 201118134 cycloheptyl)ethyl, /3-(3,4-epoxycyclohexyl)propyl, stone _(3,4-epoxycyclohexyl)butyl , without -(3,4-epoxycyclohexyl)pentyl, etc. having ethylene oxide Replaced by the sum of the carbon number of 5 ~ 8 carbon atoms, cycloalkyl of Shu ~ 5 alkyl group. Among these, a carbon number of 碳~3 alkyl group substituted with a glycidoxy group and a carbon number substituted with a cycloalkyl group having an epoxy group of 5 to 8 are preferably used. Alkyl group, for example,/5 _glycidoxyethyl, y-glycidoxypropyl, s-, 4-epoxycyclohexyl)ethyl, especially preferably 0-(3,4-ring Oxycyclohexyl)ethyl.

此處,當將X為環氧丙基之烷氧基矽烷化合物與X為 環氧環己基之烷氧基矽烷化合物併用之情形時,較佳/為將X 為環氧環己基之烧氧基錢化合物以烧氧基钱化合物⑷ 之總量之80%以上而使用。 通Λ (1艸存在複數個之L表示碳數之直鏈狀、 分支狀或環线基,互相可相同,亦可不同。例如可列舉: :基、乙基丙基、異丙基、正丁基、異丁基、三級丁 =、正戊基、正己基、環戊基、環己基等。就相溶性、反 :性等反應條件之觀點而言,該等&較佳為 尤佳為甲基。 氧美:佳具體例,可列舉:々-環氧丙 Γ;基石斤…-環氧丙氧基乙基三乙氧基石夕 二==氧基丙基2氧基錢、卜環氧丙氧基丙基 -(34 ;二广(3’4-環氧環己基)乙基三甲氧基石夕炫、々 (3,4-%购己基)乙基三乙氧基錢等,尤 ,環己基)乙基三甲氧基發燒。該 平獨使用’亦可使用2種以上,還— 具有下述式(2)所 矽氧油: 201118134 併用。 聚石夕氧油(b)為 石夕烷醇基之鏈狀聚 表示之結構的末端具有 r3 HO-t—'S1-〇 kHere, when a combination of an alkoxydecane compound wherein X is a glycidyl group and an alkoxydecane compound wherein X is an epoxycyclohexyl group is preferred, it is preferably an alkoxy group in which X is an epoxycyclohexyl group. The money compound is used in an amount of 80% or more based on the total amount of the alkoxy compound (4). Λ Λ (1 艸 复 复 复 表示 表示 表示 L L L L L 直 直 直 直 直 直 直 直 直 直 直 直 直 直 直 直 直 直 直 直 直 直 直 直 直 直 直 直 直 直 直 直 直Butyl, isobutyl, tertiary butyl =, n-pentyl, n-hexyl, cyclopentyl, cyclohexyl, etc. These & preferably are in terms of reaction conditions such as compatibility, reverseness and the like. Preferably, it is a methyl group. Oxygen: a specific example, which may be exemplified by: 々-epoxypropene fluorene; base stone jin...-glycidoxyethyl triethoxy oxalate == oxypropyl 2 oxy, Glycidoxypropyl-(34; Erguang (3'4-epoxycyclohexyl)ethyltrimethoxyxanthine, hydrazine (3,4-% hexyl)ethyltriethoxy money, etc. , especially, cyclohexyl) ethyltrimethoxylate. This can be used alone or in combination with two or more types, and has the following formula (2): Oxygenated oil: 201118134 Combined. Polylithic oxygen (b) The end of the structure represented by the chain polyglycol group has r3 HO-t—'S1-〇 k

(2) (式(2)中,存在複數個 碳數“14之芳A 表示碳數1〜1〇之烧基、 可不门:方基、%數2〜1〇之埽基,互相可相同,亦 了不同。m表示重複單元數)。 通式(2)之式中,存在複數個 基、碳數6〜14之芳基、3表不反數1〜1〇之烷 亦可不同。 之烯基,互相可相同, 八碳數1〜1G之院基,可列舉碳數u之直鏈狀、 :支狀或環狀之烧基,例如可列舉:甲基、乙基、正丙基、 異丙基、正T基、異丁基、二級了基、三級丁基、正戍基、 異戊基、戍基、正己美、 Μ正己基、戊基、環己基、辛基、2_乙基己 ^基Α基等。3亥等之中,若考慮到耐光性或耐執性, 則較佳為甲基、乙基、正丙基'環己基。 基 作為碳數6〜14之芳棊,例如可列舉:苯基、鄰甲笨 間甲苯基、對甲苯基、二甲笨基等。 基 作為碳數2〜1〇之稀基,可列舉:乙烤基、卜甲基乙稀 彿丙基 '丙稀基、丁晞基、戊稀基己烯基等烯基等。 就耐光性、耐熱性之觀點而言較佳為甲基、苯基、 10 201118134 環己基、正丙基,尤佳為甲基、苯基。 通式(2)之化合物之番 — 重複早疋數m以平均值表示3〜 200,較佳為3〜1〇〇, 文佳為3〜50。若m低於3,則硬化 物變得過硬,低彈性掇# 模數特性降低。若m高於200,則存在 硬化物之機械特性惡化之傾向,故而欠佳。 聚石夕氧油(b)之重量平均分子量㈣較佳為遍〜 1 8,000(凝膠滲透層析法(2) (In the formula (2), there are a plurality of carbon numbers "14 fang A represents a carbon number of 1 to 1 烧, and the thiol group of the square number, the number of 2 to 1 ,, may be the same as each other. M is also different. m represents the number of repeating units. In the formula (2), a plurality of groups, an aryl group having 6 to 14 carbon atoms, and 3 an alkane having an inverse number of 1 to 1 may be different. The alkenyl group may be the same as each other, and the octa group having a carbon number of 1 to 1 G may be a linear group having a carbon number of u, a branched or a cyclic group, and examples thereof include a methyl group, an ethyl group, and a n-propyl group. Base, isopropyl, n-butyl, isobutyl, secondary, tertiary butyl, n-decyl, isopentyl, decyl, n-hexyl, decanohexyl, pentyl, cyclohexyl, octyl 2, ethylhexyl fluorenyl, etc. Among 3, etc., in consideration of light resistance or durability, methyl, ethyl, n-propyl 'cyclohexyl group is preferred. Examples of the aryl group of 1-4, such as a phenyl group, a phenyl group, a tolyl group, a p-tolyl group, a dimethyl group, and the like. The group is a dilute group having a carbon number of 2 to 1 Å, and examples thereof include an ethyl bake group and a methyl group. Ethyl propyl propyl, butyl, pentane An alkenyl group such as a hexenyl group or the like is preferably a methyl group, a phenyl group, a 10 201118134 cyclohexyl group or a n-propyl group, and more preferably a methyl group or a phenyl group from the viewpoint of light resistance and heat resistance. The compound of the compound - repeating the number of early m is 3~200, preferably 3~1〇〇, and Wenjia is 3~50. If m is lower than 3, the hardened material becomes too hard and low elasticity掇# The modulus characteristic is lowered. If m is higher than 200, the mechanical properties of the cured product tend to deteriorate, so it is not preferable. The weight average molecular weight (4) of the polysulfuric acid (b) is preferably 〜1 8,000 (condensed) Gel permeation chromatography

Permeation Chromatography. (GPC)測定值)之範圍者兮 固I 5亥專之中,若考慮到低溫下之彈性 模數’則分子量較伟在^ 佳為300〜10,_者,進而,若考慮到組 成物化時之相溶性,刖审灶&amp; ,λ λ 則更佳為3⑼〜5,〇〇〇者,尤佳為50〇 3’000者。於重!平均分子量低於之情形時,存在難 :出現特性鏈段之鏈狀㈣氧部分之特性,而損及作為嵌 鲛型之特性之虞’若超丨(8,〇〇〇,則變得具有劇烈之層分 離結構’用於光學材料時,穿透性變差,變得難以使用。 本發明中,作為聚矽氧油(b)之分子量,可使用Gpc,於下 述條件下測定之聚苯乙烯換算,而算出重量平均分子 (Mw)。 GPC之各種條件 製造商:島津製作所 管柱:保護管柱 SHODEX GPC LF-G LF-804(3 根) 流速:1.0 ml/min. 管柱溫度:4〇t: 使用溶劑:T H F (四氫吱D南) 檢測器:RI(示差折射檢測器) 201118134 聚矽氧油(b)之動黏度較佳為1〇〜200 cSt之範圍者,更 佳為30〜90 cSt者。於低於cSt之情形時,存在嵌段型 石夕氧烧化合物(A1)之黏度變得過低,不適合作為光半導體密 封劑之情形,又’於高於200 cst之情形時’存在嵌段型矽 氧烷化合物(A 1)之黏度上升,於作業性上產生弊端之傾向, 故而欠佳。 作為聚矽氧油(b)之較佳具體例,可列舉以下製品名。 例如可列舉:Toray Dow Corning Silicone公司製造之 PRX-413、BY16-873;信越化學工業公司製造之χ_21-584ΐ、 KF-9701 ; Momentive 公司製造之 XC96-723、TSR-160 ' YR-33 70、YF-3 800、XF-3 905、YF-3057、YF-3 807' YF-3 802、 YF-3 897、YF-3 804、XF-3905 ; Gelest 公司製造之 DMS-S 1 2、 DMS-S14、DMS-S15、DMS-S21、DMS-S27、DMS-S31、 DMS-S32、DMS-S33、DMS-S35、DMS-S42、DMS-S45、 DMS-S5 卜 PDS-0332、PDS-1615、PDS-9931 等。上述之中, 就分子量、動黏度之觀而言,較佳為PRX-413、BY16-873、 X-21-5841、KF-9701、XC96-723、YF-3800、YF-3804、 DMS-S12、DMS-S14、DMS-S15、DMS-S21、PDS-1615。該 等之中,由於具有聚矽氧鏈段之柔軟性之特徵,故就分子 量之觀點而言’尤佳為X-2卜5841、XC96-723 ' YF-3800、 YF-3804、DMS-S14、PDS-1615。該等聚矽氧油(b)可單獨使 用,亦可併用2種以上。 繼而’對烷氧基矽烷(c)進行詳細闡述。烷氧基矽烷(c) 具有下述式(3)之結構。 12 201118134 R4(〇R5)3 (3) (通式(3)甲之R4表示曱基或苯基。存在複數個之Rs表 不奴數1〜10之直鏈狀、分支狀或環狀之烷基,互相可相 同,亦可不同) 通式(3)中’存在複數個之Rs表示碳數1〜1〇之直鏈 狀、分支狀或環狀之烷基,互相可相同,亦可不同。例如 可列舉.甲基、乙基、正丙基、異丙基、正丁基、異丁基、 二級丁基、正戊基、正己基、環戊基、環己基等。就相溶 性、反應性等反應條件之觀點而言,該等R5較佳為曱基或 乙基。 作為烷氧基矽烷(C)之較佳具體例’可列舉:甲基三甲 氧基矽烷 '苯基三甲氧基矽烷、甲基三乙氧基矽烷、苯基 三乙氧基矽烷等。上述之中,較佳為甲基三曱氧基矽烷、 苯基三曱氧基石夕院。 本發明中,為了調整嵌段型矽氧烷化合物(A丨)之分子 ®,且為了提高作為組成物時之相溶性,以及為了調整硬 化物之耐熱性、耐光性、低透濕性、低透氣性等,烷氧基 石夕烧(c)可與烷氧基矽烷(a)併用。 於使用烧氧基石夕烧⑷之情形時,較佳為炫氧基石夕烧⑷ 與(C)之合計莫耳中,烷氧基矽烷(c)係於5〜7〇莫耳%之範 圍内使用,更佳為5〜50莫耳%,尤佳為丨0〜40莫耳%。 若大於70莫耳%,則硬化物之交聯密度降低,機械強度降 13 201118134 低’故而欠佳。 院氧基矽烷(a)、聚矽氧油(b)、烷氧基矽烷(c)之反應比 率,較佳為相對於聚矽氧油(b)之矽烷醇基1當量,使烷氧 基石夕烷(a)(及視需要而使用之烷氧基矽烷(c))中之烷氧基以 當量值計為1.5〜200,較佳為2〜200,尤佳為2〜1〇〇之間 而進行反應。 若當量值超出200,則使用嵌段型矽氧烷化合物(A1)之 硬化物變得過硬,目標之低彈性模數特性降低。 以下,具體提及嵌段型矽氧烷化合物(A ”之較佳製造方 法0 嵌段型矽氧烷化合物(A1)之製造方法,較佳為經過以下 (i)、(ii)所示之製造步驟。 製造步驟(i):進行矽烷醇末端聚矽氧油(b)與具有烷氧 基之烷氧基矽烷(a)(及視需要而使用之烷氧基矽烷(c))之脫 醇縮合的步驟 使用 反應 製造步驟(ii):添加水而進行烷氧基矽烷(a)(及視需要而 間之水解縮合的步驟 ,則可以任意順序進行 之烷氧基矽烷(c))之烷氧基彼此 製造步驟(i)、(ii)若經過各步驟 較佳之製造方法,具體可列舉以下三種製造方法 &lt;製造方法①&gt; / 該製造方法①係: 製造步驟⑴:首先,進行藉由末端具有石夕燒醇基之聚 石夕氧油⑻與具有烧氧基之#合物之烧氧基錢⑽及視 201118134 需要而使用之烷氧基矽烷(C))之脫醇縮合反應,對聚石夕氧油 末端進行烷氧基矽烷改質,藉此獲得烷氧基矽烷改質體(d) 之步驟。 製造步驟(ii):繼而,經過於具有烷氧基之矽化合物之 燒氧基矽烷(a)(及視需要而使用之烷氧基矽烷(c))、及製造 步驟(i)中所得之聚矽氧油之烷氧基矽烷改質體(d)中添加 水’進行烷氧基彼此間之水解縮合反應之步驟,藉此製造 嵌段型矽氧烷化合物(A1)。 &lt;製造方法②&gt; 該製造方法②係: 製造步驟(i广首先,進行藉由進行烧氧基錢⑷(及視 需要而使用之烷氧基矽烷(c))之因添加水而產生之烷氧美 彼此間之水解縮合反應’而獲得分子内具有燒氧基:料 矽氧烷(e)之步驟。 製造步驟(Π):繼而’經過藉由聚錢油⑻與倍半石夕氧 之反應’使倍半嫩結構内所殘存之燒氧基議 知基進行脫醇縮合反應之步驟,藉 合物(Αυ。 減“讀㈣氧烧化 &lt;製造方法③&gt; 該製造方法③係: 製造步驟(1):首先,藉由末 油(b)與具有矽烷醇基之聚矽氧 而使用之烷Iu 虱基矽烷(a)(及視需要 便用之烷礼基矽烷⑷)之脫醇縮合反應 進行烧氧基钱改質而作為以 油末知 /沉改質體(d),然後於 15 201118134 系統内添加水,以一銷法(0ne_P〇t)進行製造步驟(ii):萨由 進行殘存之烷氧基矽烷(a)(及視需要而使用之烷氧基矽烷 (C))、及烷氧基矽烷改質體(d)之烷氧基彼此間之水解縮合反 應’製造嵌段型矽氧烷化合物(A ”。 本發明中’就縮短製造步驟之觀點而言,較佳為使用 逐次以一锅法進行反應之上述製造方法③。 以下’對製造方法③進行更加具體之闡述。 於以一鍋法進行反應之情形時,若為與上述製造方法 ③相反之順序,即於製造步驟(ii)後進行製造步驟〇,則製 造步驟(ii)中形成之具有烷氧基之倍半矽氧烷低聚物與聚矽 氧油(b)不相溶,於後續之製造步驟⑴中不會進行脫醇縮合 聚合,聚矽氧油殘留之可能性較高。另一方面,若使用如 製造方法③般,在製造步驟⑴後以一鍋法進行製造步驟⑴) 之方法,則聚矽氧油(b)與烷氧基矽烷(a)或烷氧基矽烷(c)之 相溶性相對較高,故而可避免如上述般不相溶而不進行反 應之問題。進而,由於相對於矽烷醇基而變得存在大量未 反應之低分子烷氧基矽烷,故就反應性之觀點而言亦較 佳。於以一鍋法進行之情形時,首先於製造步驟⑴中,進 行聚矽氧油(b)與烷氧基矽烷(a)(及視需要而使用之烷氧基 矽烷(c))之脫醇縮合,使聚矽氧油之末端進行烷氧基矽烷基 (alkoxysilyl)改質,而獲得烷氧基矽烷改質體(d)。一般認 為,由於製造步驟⑴令不添加水,故不會產生烷氧基彼此 間之水解縮合,於相對於矽烷醇基丨當量而使用烷氧基3 當量以上進行反應之情形時,烷氧基矽烷改質體(d)係以如 16 201118134 下述式(4)所示之結構而存在。The range of Permeation Chromatography. (GPC) is entangled in the I 5 hai special. If the elastic modulus at low temperature is taken into consideration, the molecular weight is better at 300~10, _, and then, if considering The compatibility of the composition into the physicochemical, 刖 灶 &amp; λ λ is more preferably 3 (9) ~ 5, the best, especially better than 50 〇 3 '000. Heavy! When the average molecular weight is lower than the case, there is difficulty in that the characteristic of the chain (tetra) oxygen moiety of the characteristic segment occurs, and the characteristic of the intrusive type is impaired if it exceeds (8, 〇〇〇, it becomes severe). When the layer separation structure is used for an optical material, the permeability is deteriorated and it becomes difficult to use. In the present invention, as the molecular weight of the polyoxyxanic oil (b), Gpc can be used, and polystyrene can be measured under the following conditions. Calculate the weight average molecular weight (Mw). GPC various conditions Manufacturer: Shimadzu Corporation Pipe column: Protection column SHODEX GPC LF-G LF-804 (3 pieces) Flow rate: 1.0 ml/min. Column temperature: 4 〇t: Solvent: THF (tetrahydroanthracene D South) Detector: RI (differential refraction detector) 201118134 Polyoxygenated oil (b) The dynamic viscosity is preferably in the range of 1 〇 to 200 cSt, more preferably 30 to 90 cSt. When the temperature is lower than cSt, the viscosity of the block type oxalate compound (A1) becomes too low, which is not suitable as a photo-semiconductor sealant, and is higher than 200 cst. In the case of 'the presence of a block type siloxane compound (A 1), the viscosity increases, The preferred disadvantages of the polyoxygenated oil (b) include the following product names. For example, PRX-413 and BY16-873 manufactured by Toray Dow Corning Silicone Co., Ltd.; Shin-Etsu Chemical Co., Ltd. manufactures χ21-584ΐ, KF-9701; Momentive's XC96-723, TSR-160 'YR-33 70, YF-3 800, XF-3 905, YF-3057, YF-3 807' YF-3 802, YF-3 897, YF-3 804, XF-3905; DMS-S 1 manufactured by Gelest 2, DMS-S14, DMS-S15, DMS-S21, DMS-S27, DMS-S31, DMS -S32, DMS-S33, DMS-S35, DMS-S42, DMS-S45, DMS-S5, PDS-0332, PDS-1615, PDS-9931, etc. Among the above, in terms of molecular weight and dynamic viscosity, Preferred are PRX-413, BY16-873, X-21-5841, KF-9701, XC96-723, YF-3800, YF-3804, DMS-S12, DMS-S14, DMS-S15, DMS-S21, PDS -1615. Among these, due to the flexibility of the polyoxygenated segment, it is particularly preferable to be X-2, 5841, XC96-723 'YF-3800, YF-3804, from the viewpoint of molecular weight. DMS-S14, PDS-1615. These polyoxygenated oils (b) may be used singly or in combination of two or more. This is followed by a detailed description of the alkoxydecane (c). The alkoxydecane (c) has a structure of the following formula (3). 12 201118134 R4(〇R5)3 (3) (R4 of formula (3) A represents a fluorenyl group or a phenyl group. There are a plurality of Rs which are not linear or branched, or branched or branched. The alkyl groups may be the same or different from each other. In the formula (3), a plurality of Rs are represented by a straight chain, a branched or a cyclic alkyl group having a carbon number of 1 to 1 Å, which may be the same as each other. different. For example, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, secondary butyl, n-pentyl, n-hexyl, cyclopentyl, cyclohexyl and the like can be mentioned. The R5 is preferably an anthracenyl group or an ethyl group from the viewpoints of reaction conditions such as compatibility and reactivity. Preferred examples of the alkoxydecane (C) include methyltrimethoxydecane 'phenyltrimethoxydecane, methyltriethoxydecane, and phenyltriethoxydecane. Among the above, methyltrimethoxy decane and phenyltrimethoxy sulphate are preferred. In the present invention, in order to adjust the molecular group of the block type siloxane compound (A 丨), in order to improve the compatibility as a composition, and to adjust the heat resistance, light resistance, low moisture permeability, and lowness of the cured product, Gas permeability, etc., alkoxylate (c) can be used in combination with alkoxydecane (a). In the case of using a spent oxygen oxy-stone (4), it is preferred that the alkoxy sulfonium (4) and (C) are in a molar range, and the alkoxy decane (c) is in the range of 5 to 7 〇 mol%. Use, more preferably 5 to 50% by mole, and especially preferably 丨0 to 40% by mole. If it is more than 70 mol%, the crosslink density of the hardened material is lowered, and the mechanical strength is lowered, and the lower the mechanical strength, 13 201118134, is unsatisfactory. The reaction ratio of the field oxydecane (a), the polyoxyxane oil (b), and the alkoxy decane (c) is preferably 1 equivalent of the decyl alcohol group relative to the polyoxyxane oil (b), such that the alkoxylate The alkoxy group in the alkane (a) (and the alkoxydecane (c) used as needed) is from 1.5 to 200, preferably from 2 to 200, particularly preferably from 2 to 1, in terms of equivalent weight. The reaction is carried out between. When the equivalent value exceeds 200, the cured product using the block type siloxane compound (A1) becomes too hard, and the low elastic modulus characteristic of the target is lowered. Hereinafter, a preferred method for producing the block type oxoxane compound (A) is a method for producing a block type siloxane compound (A1), preferably as shown in the following (i) and (ii). Manufacturing step. Manufacturing step (i): carrying out the decyl alcohol terminal polyoxy olefin oil (b) and the alkoxy decane (a) having an alkoxy group (and the alkoxy decane (c) used as needed) The step of alcohol condensation is carried out by using the reaction production step (ii): adding a water to carry out the alkoxydecane (a) (and, if necessary, the step of hydrolytic condensation, the alkoxydecane (c) can be carried out in any order) The alkoxy groups are produced in the steps (i) and (ii), and the preferred production methods are as follows. Specifically, the following three production methods are described. <Manufacturing method 1> / The manufacturing method 1 is: Manufacturing step (1): First, borrowing The dealcoholization condensation reaction of agglomerated oxygen (8) having a sulphuric acid group at the end and alkoxy oxime (10) having an alkoxy group and an alkoxy decane (C) used according to 201118134 Alkoxydecane modification at the end of the polysulfate oil, thereby obtaining an alkoxy group Step of the decane-modified body (d). Production step (ii): followed by the alkoxy decane (a) (and alkoxy decane (c) used as needed) of the oxime compound having an alkoxy group And a step of producing a block type oxime by adding a step of hydrolytic condensation reaction between the alkoxy groups by adding water' to the alkoxy decane modified substance (d) of the polyoxyxylene oil obtained in the step (i). The alkane compound (A1). &lt;Production method 2&gt; The production method 2 is a production step (i is first performed by performing an alkoxy oxime (4) (and an alkoxy decane (c) if necessary) The step of obtaining an alkoxy group in the molecule by the hydrolysis-condensation reaction between the alkoxyses produced by the addition of water'. The manufacturing step (Π): then 'passing through the money (8) The reaction with the sesquiterpene oxygen to carry out the step of the dealcoholization condensation reaction of the alkoxy group remaining in the sesylene structure, the compound (Αυ. minus "read (4) oxygen burning &lt; manufacturing method 3 &gt; The manufacturing method 3 is: manufacturing step (1): first, by the end oil (b) and having a stanol group The dealcoholization condensation reaction of the alkane Iu decyl decane (a) (and the alkyl decane decane (4) used as needed), which is used for polyoxygenation, is modified by alkoxylation as an oily/sinking modified body. (d), then add water to the system in 15 201118134, and carry out the manufacturing step (ii) by one pin method (0ne_P〇t): the alkoxy decane (a) remaining in Say (and the alkoxy group used as needed) The hydrolysis and condensation reaction of the alkane (C)) and the alkoxy group of the alkoxydecane modified product (d) with each other 'manufacture of a block type oxoxane compound (A". In the present invention, the manufacturing step is shortened. From the viewpoint, it is preferred to use the above-described production method 3 in which the reaction is carried out one by one in a row. The manufacturing method 3 will be described more specifically below. In the case of the reaction in the one-pot method, if the production step is carried out in the reverse order of the above-mentioned production method 3, that is, after the production step (ii), the alkoxy group formed in the production step (ii) is doubled. The semi-oxane oxide oligomer is incompatible with the polyoxyxane oil (b), and no dealcoholization condensation polymerization is carried out in the subsequent production step (1), and the possibility of residual polyoxyxene oil is high. On the other hand, if the method of the production step (1)) is carried out in a one-pot method after the production step (1) as in the production method 3, the polyoxygenated oil (b) and the alkoxydecane (a) or alkoxydecane are used. (c) The compatibility is relatively high, so that the problem of being incompatible without reacting as described above can be avoided. Further, since a large amount of unreacted low molecular alkoxydecane is present with respect to the stanol group, it is also preferable from the viewpoint of reactivity. In the case of the one-pot method, first, in the production step (1), the polysiloxane oil (b) and the alkoxy decane (a) (and the alkoxy decane (c) used as needed) are removed. The alcohol is condensed, and the alkoxysilyl group is subjected to alkoxysilyl modification to obtain an alkoxydecane modified body (d). It is considered that since the production step (1) does not require the addition of water, the alkoxy group is not hydrolyzed and condensed with each other, and when a reaction is carried out using an alkoxy group of 3 equivalent or more with respect to the decyl alcohol group oxime equivalent, the alkoxy group is used. The decane modified body (d) exists as shown in the following formula (4) of 16 201118134.

(式(4)中,R3及m表示與上述相同之含義,存在複數 個之R6分別獨立地表示上述χ或上述R4,當與鍵結 於相同矽之R,為上述X之情形時,表示上述尺2,當與 鍵結於相同矽之r0為上述心之情形時,I表示上述r〇7 於製造步驟⑴中,若相對於矽烷醇基!當量而使烷氧 基以少於丨#量之量進行反應,%由於製造步驟⑴結束時 不存在烷氧基,故不會向製造步驟(ii)推進,又,若使烷氧 基以丨〜^當量之間進行反應,則烧氧基秒烷(3)(及視=要 而使用之烧氧基#⑷)中之2個以域氧基與㈣氧油⑻ 之矽烷醇基進行反應,在製造步驟⑴結束時過於高分子化 而產生凝膠化。因此,必須相對於矽烷醇基丨當量而使烷 氧基以1.5當量以上進行反應。就反應控制之觀點而言,較 佳為2當量以上,更佳為3當量以上。 製造步驟⑴結束後,直接進行添加水而進行院氧基彼 此間之水解縮合的第2階段反應(製造步驟(u))。 於製造步驟(Π)中生下述所示之⑴〜⑽之反應。 ⑴系統&quot;斤殘存之烧氧基錢U)(及視需要而使用之 院乳基碎烧(c))之烧乳基彼此間之縮人反麻 矽烷改質體(d)與烷氧 ί (II)製造步驟(i)中所得之燒氧 17 201118134 基石夕烧(a)(及視需要而使用之烷氧基矽烷(c))之烷氧基彼此 間之縮合反應。 (ΠΙ)製造步驟(i)中所得之烷氧基矽烷改質體(d)與(I)中 所生成之炫氧基矽烷(及視需要而使用之烷氧基矽烷(c)) 之部分縮合物之烷氧基彼此間之縮合反應。 於製造步驟(ii)中複合產生上述反應,倍半矽氧烷鏈段 之形成、進而與源自聚矽氧油之鏈狀聚矽氧鏈段之縮合同 時進行。 嵌段型石夕氧烷化合物(Α1;)之製造亦可於無觸媒之狀態 下進行’但若無觸媒,則反應進行得慢,就反應時間縮短 之觀點而言’較佳為於觸媒存在下進行。可使用之觸媒, 只要為表現出酸性或驗性之化合物,則均可使用。酸性觸 媒之例’可列舉鹽酸、硫酸、硝酸等無機酸;或甲酸、乙 酸、乙一酸等有機酸。又’驗性觸媒之例,可使用:氫氧 化鈉 '氫氧化鉀、氫氧化鋰、氫氧化铯之類之鹼金屬氫氧 化物’碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀之類之鹼金 屬碳酸鹽等無機鹼;氨、三乙胺、二乙三胺、正丁胺、二 甲基胺基乙醇 '三乙醇胺、四甲基氫氧化銨等有機鹼。該 專之中’尤其就容易自產物中去除觸媒之方面而言,較佳 為無機鹼,尤佳為氫氧化鈉、氫氧化鉀。觸媒之添加量相 對於反應系統中之烷氧基矽烷(a)(及視需要而使用之燒氧 基矽院(c))之合計重量,通常為〇.001〜7·5重量%,較佳為 0 · 0 1〜5重量%。 觸媒之添加方法係直接添加’或者於溶解於可溶性溶 18 201118134 劑等中之狀態下使用。纟中’較佳為在使觸媒預先溶解於 甲酵、乙肖、丙醇、丁醇等醇類中之狀態下進行添加。此 時,作為使用水等之水溶液而添加存在以下可能性:如上 所述,單向進魏氧基找⑷(及視需^使用^氧㈣ 烧⑷)之縮合,藉此而生成之倍切氧燒低聚物與聚石夕氧油 (b)不相溶而白濁。 …嵌段型梦氧院化合物(A1)之製造可於無溶劑或溶劑中 進行。又,亦可於製造步驟之中途追加溶劑。使用時之溶 劑,只要為溶解烷氧基矽烷(a)、烷氧基矽烷(c)、聚矽氧油 (b)、烷氧基矽烷改質體(d)之溶劑,則並無特別限制。此種 溶劑,例如可例示:二甲基曱醯胺、二甲基乙醯胺、四氫 咬喃之類之非質子性極性溶劑;曱基乙基酮、曱基異丁基 酮、環戊酮之類之酮類;乙酸乙酯、乙酸丁酯、乳酸乙酯、 丁酸異丙酯等酯類;甲醇、乙醇、丙醇、丁醇之類之醇類; 己烷、%己烷、曱苯、二甲苯之類之烴等。本發明中,就 反應控制之觀點而言,較佳為醇類中之反應,更佳為曱醇、 乙醇。溶劑之使用量只要為反應順利進行之範圍,則並無 特別限制,相對於烷氧基矽烷(a)(及視需要而使用之烧氧基 石夕院(c))、聚矽氧油(b)之化合物之合計重量1〇〇份,通常使 用0〜900重量份左右。反應溫度雖亦取決於觸媒量,但通 常為20〜16(TC,較佳為40〜140T:,尤佳為50〜15〇。(:。 又’反應時間於各製造步驟中,分別通常為1〜4〇小時, 較佳為5〜3 〇小時。 反應結束後’視需要藉由淬火、及/或水洗而去除觸媒。 19 201118134 於進行水洗之情形時,較佳為根據所使用之溶劑之種類而 添加可與水分離之溶劑。較佳之㈣,例如可心:甲基 乙基酮 '甲基異丁基明、環戊_之類之酮类員;乙酸乙醋、 乙酸丁酉旨、乳酸乙酉旨、丁酿s 日7 s久異丙酯等酯類;己烷、環己烷、 曱苯、二甲苯之類之烴等。 雖然本反應可僅以水洗而進行觸媒之去除,但由於係 於酸性、驗性條件中之* —條件下進行反應,纟而較佳為 藉由中和反應進行淬火後爯;隹〜,^ 交冉進仃水洗’或者使用吸附劑吸 附觸媒後,藉由過濾而去除吸附劑。 中和反應時,只要為表現出酸性或驗性之化合物,則 可使用。表現出酸性之化合物之例,舉鹽酸、硫酸、 硝酸等無機酸;甲酸、乙酸、乙二酸等有機酸。又,表現 出驗性之化合物之例’可使用:氫氧化鈉、氫氧化卸、氫 氧化鐘、氫氧化铯之類之驗金屬氫氧化物,錢納、碳酸 鉀 '碳酸氫納、碳酸氫鉀之類之驗金屬石炭酸鹽;填酸、填 酸二氫鈉'磷酸氫二鈉、磷酸三鈉、聚磷酸、i聚磷酸鈉 之類之破酸鹽類等無機驗;4、三乙胺、二伸乙三胺、正 胺一曱基胺基乙醇、二乙醇胺、四甲基氮氧化錄等有 機驗。該等之中’ X其就容易自產物中去除之方面… 較佳為無機驗或無機酸’進而較佳為更容易將PH值調整至 中性附近之磷酸鹽類等。 吸附劑, 系合成吸附劑 活性黏土 叫J不活性黏土、活性碳、沸石、無機-有機 、離子父換樹脂等,具體例可列舉下述製品。 例如可列舉:東新化成公司製造之活性黏 20 201118134 土 SA35、SA卜 T、R-15、E、Nikkanite G-3 6、G-153、G-168 ; 水澤化學工業公司製造之Galleon Earth、Mizuka Ace等。 活性碳,例如可列舉:Ajinomoto Fine-Techno公司製造之 CL-H、Y-l〇s、Y-i〇SF ; Futamura Chemical 公司製造之 S、 Y、FC、DP、SA1000、K、A、KA、M、CW130BR、CW130AR、 GM1 30A等。沸石,例如可列舉:Union Showa公司製造之 Molecular Sieve3A、4A、5A、13X 等。合成吸附劑,例如 可列舉·協和化學公司製造之Kyoword 100、200、300、4〇〇、 500、600、700、1000、2000 ; Rohm and Haas 公司製造之(In the formula (4), R3 and m have the same meanings as described above, and a plurality of R6 each independently represent the above-mentioned enthalpy or the above-mentioned R4, and when it is bonded to the same 矽R, which is the above-described X, it means In the above rule 2, when r0 which is bonded to the same 矽 is the above-mentioned heart, I represents the above r 〇 7 in the production step (1), and the alkoxy group is less than 丨# with respect to the decyl alcohol group! The amount is reacted, and % is not promoted to the production step (ii) because the alkoxy group is not present at the end of the production step (1), and if the alkoxy group is reacted between 丨 and ^ equivalents, the oxygen is burned. Two of the secantane (3) (and the methoxy group #(4) used) are reacted with a methoxy alcohol group of (4) oxy oil (8), and are too polymerized at the end of the production step (1). Therefore, the alkoxy group is required to be reacted in an amount of 1.5 equivalent or more with respect to the decyl alcohol group oxime equivalent. From the viewpoint of reaction control, it is preferably 2 equivalents or more, more preferably 3 equivalents or more. After the completion of the production step (1), the water is directly added to carry out hydrolysis and condensation of the oxo groups. The second-stage reaction (manufacturing step (u)). The reaction of (1) to (10) shown below is produced in the manufacturing step (Π). (1) System &quot;Knocking of the burnt oxygen money U) (and used as needed The emulsion of the base of the milk-based crushed (c)) is condensed with each other. The anti-methane olefin is modified (d) with the alkoxylate (II). The oxygen-burning oxygen obtained in the step (i) is manufactured. (a) (and optionally alkoxydecane (c)) alkoxy groups are condensed with each other. (ΠΙ) a part of the alkoxydecane modified body (d) obtained in the step (i) and the alkoxy decane (and the alkoxy decane (c) used as needed) The alkoxy group of the condensate is condensed with each other. The above reaction is compounded in the production step (ii), and the formation of the sesquiterpene oxide segment and further contracting with the chain-like polyoxynene segment derived from the polyoxygenated oil are carried out. The production of the block type oxalate compound (Α1;) can also be carried out in the absence of a catalyst. However, if the catalyst is not used, the reaction proceeds slowly, and from the viewpoint of shortening the reaction time, it is preferably It is carried out in the presence of a catalyst. The catalyst which can be used can be used as long as it exhibits an acidity or a test compound. Examples of the acidic catalyst include inorganic acids such as hydrochloric acid, sulfuric acid, and nitric acid; and organic acids such as formic acid, acetic acid, and ethylic acid. In the case of an 'inferiority catalyst, an alkali metal hydroxide such as sodium hydroxide 'potassium hydroxide, lithium hydroxide or barium hydroxide' sodium carbonate, potassium carbonate, sodium hydrogencarbonate or potassium hydrogencarbonate can be used. An inorganic base such as an alkali metal carbonate; an organic base such as ammonia, triethylamine, diethylenetriamine, n-butylamine, dimethylaminoethanol, triethanolamine or tetramethylammonium hydroxide. In particular, it is preferable to use an inorganic base, and particularly preferably sodium hydroxide or potassium hydroxide. The total amount of the catalyst added is 〇.001 to 7.5 wt%, based on the total weight of the alkoxy decane (a) in the reaction system (and the alkoxy broth (c) used as needed). It is preferably 0 · 0 1 to 5 wt%. The catalyst addition method is directly added or used in a state of being dissolved in a soluble solvent 18 201118134 agent or the like. In the middle, it is preferred to add the catalyst in a state in which the catalyst is dissolved in an alcohol such as a yeast, a tea, a propanol or a butanol. In this case, as an aqueous solution using water or the like, there is a possibility that, as described above, the condensation of the one-way propionate (4) (and the use of the oxygen (four) calcination (4) as needed), thereby forming a double cut The oxygen-fired oligomer is incompatible with the polysulfuric acid (b) and is cloudy. The production of the block type monoxide compound (A1) can be carried out in the absence of a solvent or a solvent. Further, a solvent may be added in the middle of the production step. The solvent to be used is not particularly limited as long as it is a solvent for dissolving the alkoxydecane (a), the alkoxydecane (c), the polyoxyxanic acid (b), and the alkoxydecane modified product (d). . Such a solvent may, for example, be an aprotic polar solvent such as dimethyl decylamine, dimethylacetamide or tetrahydroanion; mercaptoethyl ketone, decyl isobutyl ketone, cyclopentane Ketones such as ketone; esters such as ethyl acetate, butyl acetate, ethyl lactate, isopropyl butyrate; alcohols such as methanol, ethanol, propanol and butanol; hexane, % hexane, Hydrocarbons such as toluene and xylene. In the present invention, from the viewpoint of reaction control, a reaction in an alcohol is preferred, and decyl alcohol and ethanol are more preferred. The amount of the solvent to be used is not particularly limited as long as it is in the range in which the reaction proceeds smoothly, and the alkoxydecane (a) (and the alkoxy furnace (c) used as needed) and the polyoxygenated oil (b) The total weight of the compound is 1 part by weight, and usually about 0 to 900 parts by weight is used. The reaction temperature is also dependent on the amount of the catalyst, but it is usually 20 to 16 (TC, preferably 40 to 140 T:, preferably 50 to 15 Torr. (:. Further, the reaction time is in each manufacturing step, respectively, usually It is 1 to 4 hours, preferably 5 to 3 hours. After the reaction, the catalyst is removed by quenching and/or washing as needed. 19 201118134 In the case of water washing, it is preferably used according to the use. A solvent which can be separated from water is added to the kind of the solvent. Preferably, (4), for example, a ketone member such as methyl ethyl ketone 'methyl isobutyl pentyl or cyclopentane ketone; ethyl acetate, butyl acetate, Ethyl lactate, styling, 7 s long isopropyl ester and other esters; hexane, cyclohexane, toluene, xylene and the like, etc. Although the reaction can be carried out by washing only with water, However, since the reaction is carried out under the conditions of acidic and test conditions, it is preferably quenched by a neutralization reaction; 隹~, ^ is transferred to a water-washing agent or after adsorbing the catalyst with an adsorbent, The adsorbent is removed by filtration. When neutralizing the reaction, as long as it exhibits acidity or Examples of the compound which can be used are acidic compounds such as hydrochloric acid, sulfuric acid, and nitric acid; organic acids such as formic acid, acetic acid, and oxalic acid; and examples of compounds which exhibit an inspectability can be used. : metal hydroxide, such as sodium hydroxide, hydroxide dehydration, hydrazine hydroxide, barium hydroxide, metal carbonate, such as sodium carbonate, potassium hydrogencarbonate, potassium hydrogencarbonate; acid filling, Inorganic tests such as sodium dihydrogen dihydrogen phosphate disodium hydrogen phosphate, trisodium phosphate, polyphosphoric acid, sodium polyphosphate, etc.; 4, triethylamine, diethylenetriamine, n-amine An organic test such as aminoethanol, diethanolamine or tetramethylammonium oxide. Among them, 'X is easy to remove from the product... preferably inorganic or inorganic acid' and further preferably easier to PH The value is adjusted to a phosphate or the like in the vicinity of neutral. Adsorbent, synthetic adsorbent Activated clay is called J inactive clay, activated carbon, zeolite, inorganic-organic, ion-exchange resin, and the like, and specific examples thereof include the following products. For example, it can be cited: Dongshin Chemical Co., Ltd. Sexual viscosity 20 201118134 Soil SA35, SA Bu T, R-15, E, Nikkanite G-3 6, G-153, G-168; Galleon Earth, Mizuka Ace, etc. manufactured by Mizusawa Chemical Industry Co., Ltd. Activated carbon, for example, : CL-H, Yl〇s, Yi〇SF manufactured by Ajinomoto Fine-Techno Co., Ltd.; S, Y, FC, DP, SA1000, K, A, KA, M, CW130BR, CW130AR, GM1 30A, etc. manufactured by Futamura Chemical Co., Ltd. Examples of the zeolite include Molecular Sieve 3A, 4A, 5A, and 13X manufactured by Union Showa. For the synthetic adsorbent, for example, Kyoword 100, 200, 300, 4, 500, 600, 700, 1000, 2000 manufactured by Kyowa Chemical Co., Ltd.; manufactured by Rohm and Haas

Amberlyst 15JWET、15DRY、16WET、31WET、A21、Amberlite IRA400JCI、IRA403BLCI、IRA404JCI ; Dow Chemical 公司 製造之 Dowex 66、HCR-S、HCR-W2、MAC-3 等。 將吸附劑添加於反應液中,進行攪拌、加熱等處理而 吸附觸媒後,過濾吸附劑’進而對殘渣進行水洗,藉此可 去除觸媒、吸附劑。 反應結束後或淬火後’除了水洗、過濾之外,可藉由 慣用之分離精製方法將產物精製。精製方法,例如可列舉 管柱層析法、減壓濃縮、蒸餾、萃取等。該等精製方法^ 單獨進行,亦可組合複數種而進行。 形時’較佳為於淬火後, 去除與水混合之反應溶劑 行水洗。 於使用與水混合之溶劑作為反應溶劑而進行反應之产 藉由蒸餾或減壓濃縮而自系統中 ,然後使用可與水分離之溶 劑進 可獲得嵌段型 水洗後’藉由減壓濃縮等將溶劑去除, 21 201118134 矽氧烷化合物(A1)。 如此所得之敌段型妙氧燒化合物(A1)之外觀,通常為無 色透明且於25°C下具有流動性之液狀。又,其分子量較佳 為以GPC所測定之重量平均分子量計為8〇〇〜2〇 〇〇〇者, 更佳為1,000〜10, 〇〇〇者,尤佳為1,5〇〇〜6,〇〇〇者。於重量 平均刀子里低於8 0 0之情形時’存在耐熱性降低之虞,於 高於20,〇〇〇之情形時’黏度上升,作業性上產生弊端。再 者,分子量可根據烷氧基矽烷(a)(及視需要而使用之烷氧基 石夕烧(0)與聚矽氧油(b)之當量比、聚矽氧油(b)之分子量、 反應時之水之添加量、反應時間、反應溫度而調整。 上述重量平均分子量係使用GPC(凝膠滲透層析法),於 下述條件下測定之聚笨乙烯換算之重量平均分子量(Mw)。 GPC之各種條件 製造商:島津製作所 管柱:保護管柱 SHODEX GPC LF-G LF-804(3 根) 流速:1 .〇 ml/min.Amberlyst 15JWET, 15DRY, 16WET, 31WET, A21, Amberlite IRA400JCI, IRA403BLCI, IRA404JCI; Dowex 66, HCR-S, HCR-W2, MAC-3, etc. manufactured by Dow Chemical Company. The adsorbent is added to the reaction liquid, and after the catalyst is adsorbed by stirring or heating, the adsorbent is filtered, and the residue is washed with water, whereby the catalyst and the adsorbent can be removed. After completion of the reaction or after quenching, the product can be purified by a conventional separation and purification method in addition to washing with water and filtration. Examples of the purification method include column chromatography, concentration under reduced pressure, distillation, and extraction. These purification methods are carried out separately or in combination of plural kinds. Preferably, after the quenching, the reaction solvent mixed with water is washed with water. The reaction using a solvent mixed with water as a reaction solvent is carried out by distillation or concentration under reduced pressure from the system, and then a solvent which can be separated from water is used to obtain a block type water-washing, 'concentration by decompression, etc. Removal of solvent, 21 201118134 oxirane compound (A1). The appearance of the ester-type oxygen-burning compound (A1) thus obtained is usually a liquid which is colorless and transparent and has fluidity at 25 °C. Further, the molecular weight thereof is preferably 8 Å to 2 Å, more preferably 1,000 to 10% by weight average molecular weight measured by GPC, and particularly preferably 1,5 〇〇 to 6 , the leader. When the weight is less than 8000 in the average knife, there is a decrease in heat resistance. When the temperature is higher than 20, the viscosity is increased, and workability is disadvantageous. Further, the molecular weight may be based on the alkoxydecane (a) (and the equivalent ratio of the alkoxylate (0) to the polyoxyxane (b) used, and the molecular weight of the polyoxyxane (b), The amount of water added during the reaction, the reaction time, and the reaction temperature are adjusted. The weight average molecular weight is a weight average molecular weight (Mw) in terms of polystyrene measured by GPC (gel permeation chromatography) under the following conditions. GPC various conditions Manufacturer: Shimadzu Manufacturing Pipe column: Protection column SHODEX GPC LF-G LF-804 (3) Flow rate: 1. 〇ml/min.

管柱溫度:40°C 使用溶劑:THF(四氫呋喃) 檢測器:RI(示差折射檢測器) 又,該嵌段型矽氧烷化合物(A1)之環氧當量(以JIS K-7236中記載之方法進行測定)較佳為3〇〇〜1,6〇〇g/eq. 者,更佳為400〜1,〇〇〇 g/eq·者,尤佳為45〇〜9〇〇 g/eq者。 於環氧當量低於300 g/eq.之情形時,存在其硬化物變硬, 彈性模數變得過高之傾向,於高於之情形時,存 22 201118134 在硬化物之機械特性惡化之傾向,故而欠佳。 嵌段型石夕氧烷化合物(A1)之黏度(E型黏度計,於25它 下測疋)較佳為50〜20,000 mPa · s者,更佳為500〜10,〇〇〇 mPa s者,尤佳為8〇〇〜5,〇〇〇 mpa· s者。於黏度低於5〇 mPa · s之情形時,存在黏度過低,不適合作為光半導體密 封材料用途之虞,於高於2〇,〇〇〇 mPa · s之情形時,存在黏 度過高,作業性差之情形。 嵌段型矽氧烷化合物(A1)中源自倍半矽氧烷之鍵結於 3個氧之矽原子相對於總矽原子之比例較佳為5〜5〇莫耳 %,更佳為8〜30莫耳%,尤佳為1〇〜2〇莫耳。若源自倍 半矽氧烷之鍵結於3個氧之矽原子相對於總矽原子之比例 低於5莫耳% ’則存在作為鏈狀聚碎氧鏈段之特徵,硬化物 變得過軟之傾向,有產生表面黏性或損傷之虞。又,若高 於50莫耳%,則作為倍半石夕氧院鍵段之特徵,硬化物變 過硬,故而欠佳。 所存在之石夕原子之比例可藉由嵌段型砂 ⑷)之ihNMR、29siNMR、元素分析等而求出。 成分本發明之硬化性樹脂組成物含有多元叛酸⑻作為較佳 多元m酸(bh系特徵為具有至少2個以上緩烏 匕 肪族烴基為主骨芊之仆人铷 土 且以月日 不僅包…:: 明中,所謂多元敌酸, 早-結構之多錢酸,而且亦包括 不同、或取代基不同之複數種化合物之 : 酸組成物,於本發明中,將其等統稱為多元^竣 23 201118134 多元叛酸W’尤佳為2〜6官能之緩酸,更佳為藉由碳 數5以上之2〜6目能之多元醇與酸酐之反應而獲得之化合 物進而車义佳為上述酸酐為飽和脂肪族環狀酸軒之多叛酸。 2〜6官能之多元醇,只要為具有醇性羥基之化合物, 則並無特別限定,可列舉:乙二醇、丙二醇、U-丙二醇' 醇1,4 丁一醇、丨,5_戊二醇、丨,6己二醇、環己燒 二甲醇、 戍二醇、三環癸烧二曱醇、降莰晞二醇等二醇類;甘油、 三經甲乙烧、三經甲丙院、三經f 丁院、2•經基甲基.a 丁二醇等三醇類;新戊四醇、二三㈣丙烧等四醇類;二 新戊四醇等六醇類等。 尤佳之多元醇為碳數為5以上之醇,尤佳為U•己二 醇:1,4-環己烷二甲醇、環己烷二甲醇' &amp;環己烷二 曱醇、2广二乙基戊二醇、2·乙基_2_ 丁基],%丙二醇、新戊 二醇、三環癸烷二甲醇' 降莰烯二醇等,其中,更佳為2_ 乙基2-丁基_丨,3_丙二醇'新戊二醇、2,4_二乙基戊二醇、I〆· 衣己烷一甲醇、二環癸烷二甲醇、降莰烯二醇等具有分支 鏈狀結構或環狀結構之多元醇。 酸酐尤佳為甲基四氫鄰苯二甲酸酐、甲基耐地酸酐 (methyl nadic anhydride)、耐地酸酐、六氫鄰苯二甲醆酐、 曱基六氫鄰苯:甲酸酐、丁烧四甲酸酐、冑環[221]庚燒 -2,3-二f酸酐、甲基雙環[221]庚烷_23•二甲酸酐、環已烷 -1,3,=三甲酸·3,4_酐等,其中較佳為甲基六氫鄰苯二甲= 酐、環己烷-1,3,4·三甲酸·3,4-酐。 24 201118134 加成反應之條件,並未特別指定,具 -,可列舉使酸酐、多元醇於無觸媒、無^反應條件之 40〜15(TC下反應並加熱,反應結束後直接取:之條件下在 並不限定於本反應條件。 之方法但 如此所得之多羧酸,尤佳為下述式 ^表不之化合物:Column temperature: 40 ° C Solvent: THF (tetrahydrofuran) Detector: RI (differential refractive index detector) Further, the epoxy equivalent of the block type siloxane compound (A1) (as described in JIS K-7236) The method is preferably 3 〜1,6 〇〇g/eq., more preferably 400 〜1, 〇〇〇g/eq·, especially preferably 45〇~9〇〇g/eq. By. When the epoxy equivalent is less than 300 g/eq., the hardened material becomes hard and the elastic modulus tends to be too high. When it is higher than the above, the mechanical properties of the hardened material deteriorate. The tendency is therefore not good. The viscosity of the block type oxalate compound (A1) (E-type viscometer, measured under 25) is preferably 50 to 20,000 mPa · s, more preferably 500 to 10, 〇〇〇mPa s , especially good for 8〇〇~5, 〇〇〇mpa·s. When the viscosity is lower than 5 〇 mPa · s, the viscosity is too low, which is not suitable for use as an optical semiconductor sealing material. When the viscosity is higher than 2 〇, 〇〇〇mPa · s, the viscosity is too high, and the operation is too high. Poor sex. The ratio of the sesquioxanes derived from sesquioxanes in the block type siloxane compound (A1) to the ruthenium atoms of 3 oxygens relative to the total ruthenium atoms is preferably 5 to 5 〇 mol%, more preferably 8 ~30% by mole, especially good for 1〇~2〇 Mo Er. If the ratio of the sesquioxanes derived from the argon helium to the three argon atoms to the total argon atoms is less than 5 mol%, then there is a characteristic of the chain condensed oxygen chain segment, and the hardened material becomes The tendency of softness is the result of surface stickiness or damage. On the other hand, if it is more than 50% by mole, the cured product becomes hard as a characteristic of the sesquisoidal bond segment, which is not preferable. The ratio of the presence of the Shixia atom can be determined by ih NMR, 29si NMR, elemental analysis or the like of the block type sand (4)). Ingredients The curable resin composition of the present invention contains a plurality of polyphenolic acids (8) as a preferred polybasic acid (bh is characterized as having a servant bauxite having at least two or more eucalyptus aliphatic hydrocarbon groups as the main skeleton and not only on the day of the month) ...:: In the Ming Dynasty, the so-called polybasic acid, the early-structured acid, and also includes a plurality of compounds having different or different substituents: acid composition, in the present invention, collectively referred to as plural ^竣23 201118134 Multi-repulsive acid W' is preferably a 2- to 6-functional slow acid, more preferably a compound obtained by reacting a polyol having a carbon number of 5 or more and 2 to 6 mesh energy with an acid anhydride, and then Che Yijia is The above-mentioned acid anhydride is a saturated aliphatic cyclic acid acid. The 2 to 6-functional polyol is not particularly limited as long as it is a compound having an alcoholic hydroxyl group, and examples thereof include ethylene glycol, propylene glycol, and U-propylene glycol. 'Alcohol 1,4 butanol, hydrazine, 5-pentanediol, hydrazine, 6 hexanediol, cyclohexane dimethanol, decanediol, tricyclic terpineol, decanediol and other diols Class; glycerin, three-armed-and-single-burning, three-story-a-birth, three-family, Dingyuan, 2• .a triols such as butanediol; tetraols such as pentaerythritol and tris(tetra)propanol; hexaols such as dipentaerythritol; etc. More preferred polyols are alcohols having a carbon number of 5 or more. Especially preferred is U•hexanediol: 1,4-cyclohexanedimethanol, cyclohexanedimethanol' &amp; cyclohexanedimethanol, 2G of diethyl pentanediol, 2·ethyl_2_ Base], % propylene glycol, neopentyl glycol, tricyclodecane dimethanol' decene diol, etc., more preferably 2_ethyl 2-butyl hydrazine, 3 propylene glycol 'neopentylene glycol, 2 , 4_diethylpentanediol, I oxime, hexane-methanol, dicyclodecane dimethanol, norbornene diol, etc., having a branched chain structure or a cyclic structure. Tetrahydrophthalic anhydride, methyl nadic anhydride, benzoic acid anhydride, hexahydrophthalic anhydride, mercapto hexahydrophthalic acid: formic anhydride, butadiene tetracarboxylic anhydride, hydrazine Ring [221] heptane-2,3-di-f-anhydride, methylbicyclo[221]heptane_23•dicarboxylic anhydride, cyclohexane-1,3,=tricarboxylic acid·3,4-anhydride, etc. Preferred are methylhexahydrophthalic acid = anhydride, cyclohexane-1,3,4·tricarboxylic acid·3,4-anhydride. 24 201118134 Addition reaction conditions, not specified, with -, can be used to make acid anhydride, polyol in the absence of catalyst, no reaction conditions of 40 ~ 15 (TC reaction and heating, after the reaction is completed directly: The method is not limited to the reaction conditions, but the polycarboxylic acid thus obtained is preferably a compound of the following formula:

(式中,存在複數個之q表示氮原 X今 里U /不卞、甲基、缓基中之 至少1種。P為源自上述多元醢鉍 土 狀故I 分支狀或環狀之脂 肪族基。m為多元醇之宫能美數卩赔茸 犯丞數(私基數),較佳為2〜6之 整數)。 本發明之硬化性樹脂组成物鲂估 成物杈佳為含有酸酐。酸酐具 體可列舉:鄰苯二曱酸酐、苯偏二 本侷一馱酐、焦蜜石酸酐、順 丁烯二酸酐、四氫鄰苯二 Θ义St〒基四虱鄰苯二曱酸酐、 甲基耐地酸肝、而&quot;也酸酐、_笨二甲酸針、甲基六氫 鄰苯二甲酸針、丁院四甲酸酐、雙環[2·21跡2,3_二甲酸 :、甲基雙環[2.2.U庚燒.2,3·二甲酸軒、環己三甲 k - 3,4 -酐等酸酐。 尤佳為曱基四氳鄰 —曱西欠針、甲基财地酸肝、而;j·地 酸酐、六氫鄰苯二曱酸酐、甲某 1 T丞八虱鄰苯二曱酸酐、丁烷 25 201118134 四曱酸酐、雙環「2 2 11 &amp; α 芰衣1二人1]庚烷-2,3-二曱酸酐、甲基雙環[2 2 l 庚烷_2’3·-曱酸酐、環己烷-1,3,4-三甲酸-3,4-酐。 進而,上述酸肝中’較佳為下述式(6)(In the formula, there are a plurality of q representing at least one of U/N, methyl and slow bases of the nitrogen source X. P is derived from the above-mentioned multi-alumina-like I branched or cyclic aliphatic The base m is a polyphenol, and the number of the numerators is ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( The curable resin composition of the present invention preferably has an acid anhydride. Specific examples of the acid anhydride include: phthalic anhydride, benzene, phthalic anhydride, pyrogallic anhydride, maleic anhydride, tetrahydrophthalic yttrium, stynyl tetradecanoic acid anhydride, Acidic liver, and "also anhydride", _ stearic acid needle, methyl hexahydrophthalic acid needle, Dingyuan tetracarboxylic anhydride, bicyclo [2·21 trace 2,3 dicarboxylic acid:, methyl Double-ring [2.2.U Gengzhuo.2,3. dicarboxylic acid oxime, cyclohexylmethyl k - 3,4-anhydride and other anhydrides. Yu Jia is a four-neighboring 曱-------------------------------------------------------------------------------------------------------------------------------------- Alkane 25 201118134 tetraphthalic anhydride, bicyclo "2 2 11 &amp; α 芰衣1二人1]heptane-2,3-diphthalic anhydride, methylbicyclo[2 2 l heptane-2'3·-phthalic anhydride And cyclohexane-1,3,4-tricarboxylic acid-3,4-anhydride. Further, in the above-mentioned acid liver, 'the following formula (6) is preferred.

(式中’Z表示氫原子、甲基、羧基中之至少1種) 所表不之六氫鄰苯二曱酸酐、曱基六氫鄰苯二甲酸 酐、環己烷-1,3,4-三甲酸_3,4_酐,其中較佳為甲基 : 二曱㈣、環己烧切_三甲酸_3,… 飞鄰本 於本發明之硬化性樹脂組成物含有酸酐之情形時,罝 使用量係以與多元緩酸(B)之比例所決定,較佳 m . 乂八 &lt; W 1/(W1 + W2) (其中,W1表示多元羧酸(B)之摻合重量份,W2 酐之摻合重量份) 不-夂 丄上述中,W1/(W1 + W2)之範圍,更佳為〇.〇5〜〇 65,進 而較佳為〇.1〇〜〇65’尤佳為03〜06。若低於〇〇5,則硬 化時酸酐之揮發變多之傾向較強,故而欠佳。若超出〇 65, 、成為向黏度’變得難以操作。於不含酸酐(少县A — 形除从、 文町。1殘存之情 ”外)之情形時,多元羧酸(B)之形狀於常溫下 接# 人两凹形或 迎固形之狀態、或結晶,故無問題。 26 201118134 於將多元羧酸(B)與酸酐併用之情形時,就操作之簡便 性之方面而言,於多元幾酸(B)之製造時,在過剩之酸肝中 製造而製成多元羧酸(B)與酸酐之混合物之方法亦佳。 本發明之硬化性樹脂組成物含有鋅鹽及/或鋅錯合物⑷) 作為必需成分。辞鹽及/或鋅錯合物(c)於本發明中係作為環 氧樹脂與硬化劑之硬化促進劑而發揮作用。 鋅鹽及/或鋅錯合物(C),只要為以鋅離子作為中心元素 之鹽及/或錯合物,則並無特別限定,但較佳為含有選自具 有碳數1〜30之烷基之羧酸、磷酸酯及磷酸中之至少丨種 酸作為相對離子及/或配位基者。|發明中,幻圭為幾酸鋅 體、磷酸醋辞體,尤其就相溶性方面而言,較佳為羧 體。 上述中烷基,可列舉:甲基、異丙基、丁基、2_乙基己 基辛基、異癸基、異硬脂基、癸基、鯨蠟基、十一烯λ 等。 土 羧酸鋅體,可使用選自由碳數1〜30之羧酸之鋅鹽、 有厌數1 30之敌酸及上述鋅鹽作為配位基之鋅錯合 物所組成之群中之至少丨種。羧酸鋅體,上述碳數丨〜% 之羧酸,較佳為具有鏈狀分支結構之烷基或具有烯烴等官 能基之烷基者,進而較佳為碳數3〜30之碳數者,其中尤 佳為5〜20之碳數者。該等就相溶性方面而言較佳,於碳 數過大(¼數超出3〇)之情形時,或者於分支結構或不具有 稀:^等s肖b基等之結構之情形時,與樹脂之相溶性較差, 故欠佳。 27 201118134 具體可列舉2-乙基己酸鋅 '異硬脂酸鋅、十一烯酸鋅 等。 Μ酸自曰體’可使用選自由磷酸酯之鋅鹽、與含有鱗酸 西曰及上述辞鹽作為配位基之鋅錯合物所組成之群中之至少 1種。又’磷酸酯體中亦可含有源自磷酸酯之磷酸作為相對 離子及/或配位基。 本發明中’尤佳之磷酸酯體,較佳為磷酸酯(單烷基酯 體、一烷基酯體、三烷基酯體、或其等之混合物)之鋅鹽及/ 或鋅錯合物,亦可含有複數之磷酸酯體。具體而言,較佳 為於包含於磷酸酯體之磷酸酯中,單烷基酯體、二烷基酯 體、二烷基酯體之莫耳比(以氣相層析法之純度代替。其中, 由於必y員進行二甲基石夕院基(trimethylsilyl)化,故靈敏度上 出現差異)中,在進行三甲基矽烷基化處理之階段,單烷基 西旨體之存在量為50面積%以上。 此種磷酸酯鋅之鋅鹽及/或鋅錯合物,例如可藉由使石粦 酸酯與例如碳酸鋅、氫氧化鋅等反應而獲得(專利文獻 EP699708 號公報)。 磷酸酯,較佳為2-乙基己基磷酸、硬脂基磷酸等。 此種填酸醋之鋅鹽及/或鋅錯合物之詳細情況,礙原子 與鋅原子之比率(P/Zn)較佳為1.2〜2.3,更佳為1.3〜2.0。 尤佳為1.4〜1 ·9。即,於尤佳之形態中,相對於鋅離子i 莫耳,填酸酯(或源自雄酸酯之填酸)成為2.0莫耳以下,較 佳者並非具有單純之離子結構,而是具有若干分子藉由離 子鍵(或配位鍵)而關聯之結構者。此種鋅鹽及/或鋅錯合 28 201118134 物,例如亦可以日本特表2003-51495號公報中記載之方法 而獲得。 作為此種化合物,市售品之羧酸辞體可列舉:Zn_st、(wherein 'Z represents at least one of a hydrogen atom, a methyl group and a carboxyl group) hexahydrophthalic anhydride, mercaptohexahydrophthalic anhydride, cyclohexane-1,3,4 - tricarboxylic acid _3,4-anhydride, wherein methyl group is preferably: ruthenium (tetra), cyclohexane-cut-tricarboxylic acid _3, ... when the curable resin composition of the present invention contains an acid anhydride, The amount of hydrazine used is determined by the ratio of the polybasic acid (B), preferably m. &8 &lt; W 1/(W1 + W2) (wherein W1 represents the blended parts by weight of the polycarboxylic acid (B), The blending weight fraction of the W2 anhydride is not - 夂丄 In the above, the range of W1/(W1 + W2) is more preferably 〇.〇5~〇65, and further preferably 〇.1〇~〇65' For 03~06. If it is less than 〇〇5, the tendency of the acid anhydride to volatilize during hardening tends to be strong, which is not preferable. If it exceeds 〇 65, it becomes difficult to operate as the viscosity. In the case where the acid anhydride is not contained (except for the case of a small county A - except for the residual of the Wenchuan.1), the shape of the polycarboxylic acid (B) is at a normal temperature and is in a state of two concave or sturdy shapes. 26 201118134 When the polycarboxylic acid (B) is used in combination with an acid anhydride, in terms of the ease of handling, in the manufacture of the polybasic acid (B), the excess acid liver A method of producing a mixture of a polyvalent carboxylic acid (B) and an acid anhydride is also preferred. The curable resin composition of the present invention contains a zinc salt and/or a zinc complex (4) as an essential component. Salt and/or zinc The complex compound (c) functions as a curing accelerator for an epoxy resin and a curing agent in the present invention. The zinc salt and/or the zinc complex (C) is a salt having zinc ions as a central element and The complex compound is not particularly limited, but preferably contains at least a ruthenium acid selected from the group consisting of a carboxylic acid having a carbon number of 1 to 30, a phosphate, and a phosphoric acid as a relative ion and/or coordination. Base. In the invention, the illusion is a zinc acid body or a phosphate vinegar body, especially in terms of compatibility. Preferably, the above alkyl group is methyl, isopropyl, butyl, 2-ethylhexyloctyl, isodecyl, isostearyl, decyl, cetyl, undecene. λ, etc. The zinc carboxylic acid body may be a group consisting of a zinc complex selected from the group consisting of a zinc salt of a carboxylic acid having 1 to 30 carbon atoms, a dilute acid having an anisotropic number of 30 and a zinc salt as a ligand. The carboxylic acid having a carbon number of 丨% or more is preferably an alkyl group having a chain branch structure or an alkyl group having a functional group such as an olefin, and more preferably a carbon number of 3. Those with a carbon number of ~30, especially those having a carbon number of 5 to 20. These are preferred in terms of compatibility, when the carbon number is too large (1⁄4 is more than 3 〇), or in a branched structure or In the case of a structure which does not have a structure such as a dilute: ^, etc., it is inferior in compatibility with a resin, and is therefore inferior. 27 201118134 Specifically, zinc 2-ethylhexanoate, zinc isostearate, undecene Zinc acid, etc. The ruthenium citrate can be selected from the group consisting of a zinc salt of a phosphate ester and a zinc complex containing cerium sulphate and the above-mentioned salt as a ligand. The phosphoric acid ester may also contain phosphoric acid ester-derived phosphoric acid as a relative ion and/or a ligand. In the present invention, a particularly preferred phosphate ester, preferably a phosphate ester (monoalkyl ester) The zinc salt and/or zinc complex of the compound, the monoalkyl ester, the trialkyl ester, or a mixture thereof, may also contain a plurality of phosphate esters. Specifically, it is preferably included in In the phosphate ester of phosphate ester, the molar ratio of monoalkyl ester, dialkyl ester, and dialkyl ester (replaced by gas chromatography), wherein dimethyl is required In the case where the trimethylsilyl group is used, the amount of the monoalkyl group is 50% by area or more in the stage of the alkylation treatment of trimethyl hydrazine. The zinc salt and/or the zinc complex can be obtained, for example, by reacting a phthalic acid ester with, for example, zinc carbonate, zinc hydroxide or the like (Patent Document EP699708). The phosphate ester is preferably 2-ethylhexylphosphoric acid, stearylphosphoric acid or the like. The details of the zinc salt and/or zinc complex of the acid vinegar, the ratio of the atom to the zinc atom (P/Zn) is preferably from 1.2 to 2.3, more preferably from 1.3 to 2.0. Yu Jia is 1.4 to 1 · 9. That is, in the form of Yu Jia, the acid ester (or acid-derived from the maleic acid ester) is 2.0 moles or less relative to the zinc ion i mole, preferably not having a simple ion structure but having A structure in which several molecules are related by an ionic bond (or a coordinate bond). Such a zinc salt and/or zinc mismatch 28 201118134 can be obtained, for example, by the method described in JP-A-2003-51495. As such a compound, a carboxylic acid substance of a commercial item can be exemplified by Zn_st,

Zn-St 602、Zn-St NZ、ZS-3、ZS-6、ZS-8、ZS-8、ZS-7、 ZS-10、ZS-5、ZS-14、ZS-16(曰東化成工業製造), XK-614(King Industry 製造),18% 〇ct〇pe Zri、12% 〇ct〇peZn-St 602, Zn-St NZ, ZS-3, ZS-6, ZS-8, ZS-8, ZS-7, ZS-10, ZS-5, ZS-14, ZS-16 (曰东化成工业Manufacturing), XK-614 (manufactured by King Industry), 18% 〇ct〇pe Zri, 12% 〇ct〇pe

Zn、8% 〇ctopeZn(H〇pe製藥製造);磷酸酯及/或磷酸鋅體 可列舉LBT-2000B(SC有機化學製造)、xc_92〇6(King Industry 製造)。 於本發明之硬化性樹脂組成物中比率為,有機聚矽氧 (A)、與辞鹽及/或鋅錯合物(c)之比例相對於有機聚矽氧 (A) ’辞鹽及/或鋅錯合物(c)以重量比計為〇 〇1〜8重量%, 更佳為0.05〜5重量%,進而較佳為〇1〜4量量%。又,尤 佳為0.1〜2重量%。 於將本發明之硬化性樹脂組成物用於光學材料,尤其 是光半導體密封劑之情形時,尤佳之成分,較佳為含有作 為光穩定劑之受阻胺化合物、作為抗氧化材料之磷系化合 物。於本發明巾,尤佳為含有受阻胺化合物,較; 要含有磷系化合物。 ^ 上述胺化合物,例如可列舉:丁烷四甲酸四 (1,2,2,6,6_五甲基_4_派啶基)醋、1,2,3,4-丁烷四甲酸四 (2,2,6,6-四甲基-4_哌啶基)酉旨、1,2,3,4- 丁烷四甲酸與 1’2’2’6’6-五甲基_4_旅咬醇及3,9_雙(2•經基n-二甲基乙 基)-2,4,8,10.四^雜螺[55]十一烧之混合醋化物、癸二二雙 29 201118134 (2,2,6,6-四曱基-4-哌啶基)酯、碳酸雙(1-十一烷氧基 -2,2,6,6·四曱基哌啶-4-基)酯、曱基丙烯酸2,2,6,6-四曱基-4-哌啶基酯、癸二酸雙(2,2,6,6-四曱基-4-哌啶基)_、癸二酸 雙(1,2,2,6,6-五曱基-4-哌啶基)醋、4-苯曱醯氧基-2,2,6,6-四 曱基哌啶、l-[2-[3-(3,5-二-三級丁基-4-羥基苯基)丙醯氧基] 乙基]-4-[3-(3,5-二-二級丁基-4-經基苯基)丙酿氣 基]-2,2,6,6-四曱基哌啶、曱基丙烯酸1,2,2,6,6-五曱基-4-呱 口定基酉旨(l,2,2,6,6-pentamethyl-4-piperidinyl-methacrylate)、 [[3,5-雙(1,1-二甲基乙基)-4-羥基苯基]曱基]丁基丙二酸雙 (1,2,2,6,6-五曱基-4-呱啶基)g旨、癸二酸雙[2,2,6,6-四曱基 -1-(辛氧基)-4-哌啶基]_、1,1-二甲基乙基氫過氧化物與辛 烷之反應產物、Ν,Ν’,N”,N&quot;'-四-[4,6-雙-[丁基-(N-甲基 -2,2,6,6-四曱基口底11 定·4-基)胺基]-二口井-2-基]-4,7-二氮雜 癸烷-1,10-二胺、二丁胺-1,3,5-三口井-Ν,Ν’-雙(2,2,6,6-四曱 基-4-哌啶基-1,6-己二胺與Ν-(2,2,6,6-四曱基-4-哌啶基)丁 胺之聚縮物、聚[[6-(1,1,3,3-四曱基丁基)胺基-1,3,5-三口井 -2,4-二基][(2,2,6,6-四f基-4-哌啶基)亞胺基]六亞曱基 [(2,2,6,6-四曱基-4-哌啶基)亞胺基]]、丁二酸二曱基與4-羥 基-2,2,6,6-四甲基-1-哌啶乙醇之聚合物' 2,2,4,4-四曱基 -20-( yS -月桂氧基羰基)乙基-7-氧雜-3,20-二氮雜二螺 [5.1.11.2]二十一烷-21-酮、/3-丙胺酸小-(2,2,6,6-四曱基-4-0瓜。定基)-十二自旨/十四自旨、N-乙醢基-3 -十二基-1-(2,2,6,6 -四 甲基-4-呱啶基)吡咯啶-2,5-二酮、2,2,4,4-四曱基-7-氧雜 -3,20-二氮雜二螺[5.1.1 1.2]二十一烷-21-酮、2,2,4,4-四曱基 30 201118134 -21-氧雜-3,20 -二氮雜一%- [5.1.11.2]-二十一烧 _2〇_ 丙酸十 二酯/十四酯、丙二酸[(4-曱氧基苯基)-亞f基]-雙(1,2,2,6 6 五甲基-4-0瓜咬基)醋、2,2,6,6-四曱基-4 -派σ定醇之高級脂肪 酸酯、Ν,Ν’-雙(2,2,6,6-四甲基-4-呱啶基)ι,3·苯二甲醯胺等 受阻胺系化合物等。 上述光穩定材料之胺化合物,可使用以下所示之市售 品。 例如可列舉:Ciba Specialty Chemicals 製造之 TINUVIN765 、 TINUVIN770DF 、 TINUVIN144 、 TINUVIN123 、 TINUVIN622LD 、 TINUVIN152 、 CHIMASSORB944 ; Adeka 製造之 LA-52、LA-57、LA-62、 LA-63P、LA-77Y、LA-81、LA-82 ' LA-87 等。 本發明之硬化性樹脂組成物中,相對於有機聚石夕氧 (A),光穩定劑之使用量以重量比計為0.005〜5重量%,更 佳為0.01〜4重量%、0.1〜2重量%。 上述填系化合物,並無特別限定,例如可列舉:1,1,3 _ 三(2 -曱基-4-二-十三基亞填酸醋-5-三級丁基苯基)丁烧、二 硬脂基新戊四醇二亞磷酸酯、雙(2,4-二-三級丁基苯基)新 戊四醇二亞磷酸酯、雙(2,6-二-三級丁基-4-曱基苯基)新戊 四醇二亞鱗酸酯、苯基雙紛A新戊四醇二亞鱗酸酯、二環 己基新戊四醇二亞磷酸酯、三(二乙基苯基)亞磷酸酯、三(二 -異丙基苯基)亞磷酸酯、三(二-正丁基苯基)亞磷酸酯、三 (2,4-二-三級丁基苯基)亞磷酸酯、三(2,6-二-三級丁基苯基) 亞磷酸酯 '三(2,6-二-三級丁基苯基)亞磷酸酯、2,2,-亞曱基 Γ ·£*Zn, 8% 〇 ctope Zn (manufactured by H〇pe Pharmaceutical Co., Ltd.); phosphate ester and/or zinc phosphate body, exemplified by LBT-2000B (manufactured by SC Organic Chemicals) and xc_92〇6 (manufactured by King Industry). The ratio of the organopolyfluorene (A), the salt and/or the zinc complex (c) to the organopolyoxo (A)' salt and/or in the curable resin composition of the present invention. Or the zinc complex (c) is 〇〇1 to 8% by weight, more preferably 0.05 to 5% by weight, still more preferably 〇1 to 4% by weight, based on the weight ratio. Further, it is preferably 0.1 to 2% by weight. When the curable resin composition of the present invention is used for an optical material, particularly a photo-semiconductor encapsulant, a preferred component is preferably a hindered amine compound as a light stabilizer and a phosphorus-based compound as an antioxidant material. Compound. The towel of the present invention preferably contains a hindered amine compound, and contains a phosphorus compound. ^ The above amine compound, for example, tetrabutane tetracarboxylic acid tetrakis(1,2,2,6,6-pentamethyl-4-indanyl) vinegar, 1,2,3,4-butanetetracarboxylic acid tetra (2,2,6,6-tetramethyl-4_piperidinyl), 1,2,3,4-butanetetracarboxylic acid and 1'2'2'6'6-pentamethyl_4 _Break octopus and 3,9_bis(2•trans-n-dimethylethyl)-2,4,8,10.tetrazole snail [55] eleven-burning mixed vinegar, 癸二二Double 29 201118134 (2,2,6,6-tetradecyl-4-piperidinyl) ester, bis(1-undecyloxy-2,2,6,6·tetradecylpiperidine-4) -yl)ester, 2,2,6,6-tetradecyl-4-piperidyl methacrylate, bis(2,2,6,6-tetradecyl-4-piperidinyl) sebacate _, azelaic acid bis(1,2,2,6,6-pentamethyl-4-piperidinyl) vinegar, 4-phenylhydrazineoxy-2,2,6,6-tetradecylpiperidine , l-[2-[3-(3,5-di-tertiary butyl-4-hydroxyphenyl)propenyloxy]ethyl]-4-[3-(3,5-di-secondary Butyl-4-Phenylphenyl)propanol]-2,2,6,6-tetradecylpiperidine, 1,2,2,6,6-pentamethyl-4-indole (1,2,2,6,6-pentamethyl-4-piperidinyl-methacrylate), [[3,5-bis(1,1-dimethylethyl)-4-hydroxyphenyl] Bis-butylmalonate bis(1,2,2,6,6-pentamethyl-4-acridinyl)g, azelaic acid bis[2,2,6,6-tetradecyl-1 -(octyloxy)-4-piperidinyl]-, the reaction product of 1,1-dimethylethylhydroperoxide and octane, hydrazine, Ν', N", N&quot;'-tetra-[ 4,6-bis-[butyl-(N-methyl-2,2,6,6-tetradecyl oleyl 11-yl)amino]-two well-2-yl]-4 ,7-diazadecane-1,10-diamine, dibutylamine-1,3,5-three wells-Ν,Ν'-bis(2,2,6,6-tetradecyl-4- Polycondensate of piperidinyl-1,6-hexanediamine and Ν-(2,2,6,6-tetradecyl-4-piperidyl)butylamine, poly[[6-(1,1, 3,3-tetradecylbutyl)amino-1,3,5-three well-2,4-diyl][(2,2,6,6-tetrafyl-4-piperidinyl) Amino]hexamethylene[(2,2,6,6-tetradecyl-4-piperidyl)imido]], dimethyl succinate and 4-hydroxy-2,2,6, Polymer of 6-tetramethyl-1-piperidineethanol ' 2,2,4,4-tetradecyl-20-( yS -lauryloxycarbonyl)ethyl-7-oxa-3,20-di Aza-bispiro[5.1.11.2] eicosane-21-one, /3-alanine small-(2,2,6,6-tetradecyl-4-0 melon.定定)-Twelve-six/fourteen-supplied, N-acetyl-3,t-dodecyl-1-(2,2,6,6-tetramethyl-4-acridinyl)pyrrolidine-2 ,5-diketone, 2,2,4,4-tetradecyl-7-oxa-3,20-diazaspiro[5.1.1 1.2]hexadecane-21-one, 2,2 , 4,4-tetradecyl 30 201118134 -21-oxa-3,20-diaza-%-[5.1.11.2]- twenty-one burnt _2〇_ dodecyl propionate/tetradecyl ester, Malonic acid [(4-decyloxyphenyl)-y-fyl]-bis(1,2,2,6 6 pentamethyl-4-0 melon) vinegar, 2,2,6,6- Higher fatty acid ester of tetradecyl-4-pyrrolidine, anthracene, Ν'-bis(2,2,6,6-tetramethyl-4-acridinyl)ι,3·benzamide A hindered amine compound or the like. As the amine compound of the above light-stable material, a commercially available product shown below can be used. For example, TINUVIN765, TINUVIN770DF, TINUVIN144, TINUVIN123, TINUVIN622LD, TINUVIN152, CHIMASSORB944 manufactured by Ciba Specialty Chemicals; LA-52, LA-57, LA-62, LA-63P, LA-77Y, LA-81 manufactured by Adeka, LA-82 'LA-87 and so on. In the curable resin composition of the present invention, the light stabilizer is used in an amount of 0.005 to 5% by weight, more preferably 0.01 to 4% by weight, or 0.1 to 2 parts by weight based on the weight of the organic polyoxo (A). weight%. The above-mentioned filling compound is not particularly limited, and examples thereof include 1,1,3 _ tris(2-mercapto-4-di-tridecyl sulphate-5-tributylphenyl) butadiene. , distearyl neopentyl alcohol diphosphite, bis(2,4-di-tert-butylphenyl)neopentitol diphosphite, bis(2,6-di-tertiary butyl -4-mercaptophenyl) pentaerythritol di sulphate, phenyl bis-A pentaerythritol di sulphate, dicyclohexyl neopentyl alcohol diphosphite, tris(diethyl Phenyl)phosphite, tris(di-isopropylphenyl)phosphite, tris(di-n-butylphenyl)phosphite, tris(2,4-di-tert-butylphenyl) Phosphite, tris(2,6-di-tertiary butylphenyl) phosphite, 'tris(2,6-di-tert-butylphenyl) phosphite, 2,2,-indenylene Γ ·£*

L 31 201118134 雙(4,6-二-三級丁基苯基)(2,4-二-三級丁基苯基)亞磷酸 商旨、2,2'-亞甲基雙(4,6-二-三級丁基笨基)(2_三級丁基·4·曱 基苯基)亞填酸酯' 2,2'-亞曱基雙(4-甲基-6-三級丁基苯 基)(2-三級丁基-4-曱基笨基)亞磷酸酯、2,2,-亞乙基雙(4-曱 基-6-三級丁基苯基)(2-三級丁基-4-曱基苯基)亞填酸酯、四 (2,4-二-三級丁基苯基)-4,4,-伸聯苯二亞膦酸酯 (tetrakis(2,4-di-tert-butylphenyl)-4,4'-biphenylenediphospho nite)、四(2,4-二-三級丁基苯基)·4,3,-伸聯苯二亞膦酸酯、 四(2,4-二-三級丁基苯基)-3,3’-伸聯苯二亞膦酸酯、四(2,6-二-三級丁基苯基)-4,4'-伸聯苯二亞膦酸醋、四(2,6-二-三級 丁基苯基)-4,3'-伸聯苯二亞膦酸酯、四(2,6-二-三級丁基苯 基)-3,3'-伸聯苯二亞膦酸醋、雙(2,4-二-三級丁基苯基)-4-笨基-笨基亞膦酸酯、雙(2,4-二-三級丁基苯基)_3_苯基-苯基 亞膦酸酯、雙(2,6-二-正丁基苯基)_3_苯基-苯基亞膦酸酯、 雙(2,6-二-三級丁基苯基)-4-苯基-苯基亞膦酸酯 '雙(2,6-二-三級丁基苯基)-3-苯基-苯基亞膦酸酯、四(2,4-二·三級丁基 -5-曱基苯基)-4,4'-伸聯笨二亞膦酸醋、磷酸三丁 g旨' 磷酸三 甲酯、磷酸三甲苯酯、磷酸三苯酯、磷酸三氯苯酯、磷酸 三乙酯、磷酸二苯基曱笨酯、磷酸二苯基單-鄰聯苯酯、磷 酸三丁氧基乙酯 '磷酸二丁酯、磷酸二辛酯、磷酸二異丙 脂等。 上述鱗系化合物亦可使用市售品。 例如可列舉 Adeka製造之 Adekastab PEP-4C、 Adekastab PEP-8' Adekastab PEP-24G' Adekastab PEP-36 ' 32 201118134L 31 201118134 Bis(4,6-di-tertiary butylphenyl)(2,4-di-tertiary butylphenyl)phosphoric acid, 2,2'-methylene double (4,6 -di-tertiary butylphenyl)(2_tris-butyl-4-indenylphenyl) sub-filler '2,2'-arylene di(4-methyl-6-tridecyl) Phenyl)(2-tert-butyl-4-indolyl)phosphite, 2,2,-ethylenebis(4-mercapto-6-tributylphenyl) (2- Tert-butyl-4-mercaptophenyl) sub-allate, tetrakis(2,4-di-tert-butylphenyl)-4,4,-extended biphenylphosphonate (tetrakis (2) ,4-di-tert-butylphenyl)-4,4'-biphenylenediphospho nite), tetrakis(2,4-di-tert-butylphenyl)·4,3,-extended biphenylphosphonate, four (2,4-di-tertiary butylphenyl)-3,3'-extended biphenylphosphonate, tetrakis(2,6-di-tri-butylphenyl)-4,4'- Diphenyldiphosphinate, tetrakis(2,6-di-tributylphenyl)-4,3'-extended biphenylphosphonate, tetrakis(2,6-di-tridecyl) Phenyl)-3,3'-extended biphenylphosphonate, bis(2,4-di-tert-butylphenyl)-4-indolyl-phenylphosphonate, double (2 ,4-di-tertiary butylphenyl)_3_ -Phenylphosphonite, bis(2,6-di-n-butylphenyl)-3-phenyl-phenylphosphinate, bis(2,6-di-triphenyl) -4-phenyl-phenylphosphonite 'bis(2,6-di-tert-butylphenyl)-3-phenyl-phenylphosphinate, tetrakis(2,4-di.3) Grade butyl-5-mercaptophenyl)-4,4'-extension of stannodiphosphonic acid vinegar, tributyl sulphate, 'trimethyl phosphate, tricresyl phosphate, triphenyl phosphate, trichlorophosphate Phenyl ester, triethyl phosphate, diphenylphosphonium phosphate, diphenyl mono-o-phenyl ester, tributoxyethyl phosphate dibutyl phosphate, dioctyl phosphate, diisopropyl phosphate Wait. Commercially available products can also be used as the above scaly compound. For example, Adekastab PEP-4C manufactured by Adeka, Adekastab PEP-8' Adekastab PEP-24G' Adekastab PEP-36 ' 32 201118134

Adekastab HP-10 &gt; Adekastab 2112 &gt; Adekastab 260 &gt;Adekastab HP-10 &gt; Adekastab 2112 &gt; Adekastab 260 &gt;

Adekastab 522A ' Adekastab 1178 ^ Adekastab 15〇〇 ,Adekastab 522A ' Adekastab 1178 ^ Adekastab 15〇〇 ,

Adekastab C ^ Adekastab 135A ^ Adekastab 3〇l〇 &gt; Adekastab TPP。 本發明之硬化性樹脂組成物中,相對於有機聚石夕氧 (A) ’麟系化合物之使用量以重量比計為〇 〜5重量%, 更佳為0.0 1〜4重量%、〇. 1〜2重量〇/〇。 本發明之硬化性樹脂組成物,係以作為環氧樹脂之有 機聚矽氧(A)與作為硬化促進劑之鋅鹽及/或辞錯合物(c)為 必需成分,進而包含作為硬化劑之多元羧酸(B)及酸酐、作 為添加劑之受阻胺系光穩定劑及含磷抗氧化劑作為較佳之 住意成分,該等亦可與其他環氧樹脂、硬化劑、各 劑併用。 環氧樹脂成分中,將有機聚矽氧(A)與其他環氧樹脂併 有機聚石夕氧⑷於總環氧樹脂中所佔之比例較佳為6〇 重置%以上,尤佳為7〇重量%以上。 …主可與有機聚矽氧(A)併用之其他環氧樹脂,可列舉:酚 2漆型環氧樹脂、㈣A型環氧樹脂、聯苯型環氧樹脂、 。本基甲烷型環氧樹脂、苯酚芳烷基型環氧樹脂等。具體 可::舉:雙酚Α、雙酚S、硫代二酚、g雙酚、祐二酚、4:4、 =本紛、2,2’-聯苯盼、3,3,’5,5、四曱基_π,广聯44,·_ 醇、對笨二齡、間苯二酚、葶-盼、—M 一 不—酚、二-(4-¾基苯基)甲烷、 ,四(4-經基笨基)乙&amp;、紛類(苯紛、經烧基取代之笨 .、蔡盼 '經烧基取代之萘盼、二經基苯、二經基蔡等)與 33 201118134 甲路、乙酸、笑甲磁、 對羥基苯甲醛、鄰羥基苯 =本乙酮、鄰經基笨乙綱、二環戊二烯、糠…_雙(氯 甲基)-1,1’-聯苯、4,4··雙 ' (甲虱基曱基聯苯、1,4-雙(氯 :基)本、1,4-雙(甲氧基甲基)苯等之聚縮物及該等之改質 物四邊雙盼A等,化雙酶類' 由醇類衍生之環氧 脂環式環氧樹脂、環氧丙基胺系環氧樹脂、環氧兩 糸環氧樹脂等固形或液狀環氧樹脂,但並不限定於节 等。該等可單獨使用,亦可併用2種以上。 … 、尤”本發明之硬化性樹脂組成物係以用於光學用途 為主要目@。於用於光學用途之情形時,較佳為與脂環式 %乳樹脂併用。於脂環式環氧樹脂之情形日寺,較佳為骨架 :具有環氧環己烷結構之化合物,尤佳為藉由具有環己烯 結構之化合物之氧化反應所獲得之環氧樹脂。 八該等環氧樹脂,可列舉將可藉由以下反應而製造之化 合物乳化而成者等:環己烯甲酸與醇類之醋化反應或環己 烯甲醇與羧酸類之酯化反應(Tetrahedr〇n ν〇1. 36 ρ 24〇9 (1980)、Tetrahedr〇n Letter ρ 料75 (ΐ98〇)等中記載之方 法)、或者環己烯醛之季先科反應(Tishchenk〇 reacti〇n)(曰本 特開2003_ι70059號公報、日本特開2〇〇4_262871號公報等 中δ己載之方法)、進而環己烯甲酸酯之酯交換反應(日本特開 2〇〇6-〇5 21 87號公報等中所記載之方法)。 醇類,只要為具有醇性羥基之化合物,則並無特別限 定,可列舉:乙二醇、丙二醇、丨,3_丙二醇、丨,2_丁二醇、 14-丁二醇、1;5_戊二醇' 1&gt;6·己二醇、環己烷二甲醇、 34 201118134 二乙基戊二醇、2 -乙美7 丁糞工 G|-2-丁基-1,3-丙二醇、新戊二醇、三 ί衣癸燒* —甲®?、降蘇说-两古楚-36含#ε Τ人佈一醇專一醇類;甘油、三羥曱乙烷、 三經甲丙基甲基·1,4.丁二醇等三醇 類;新戍四醇、二-二叙田名Ρ哲 —羥曱丙烷4四醇類等。又,羧酸類可 列舉:乙二酸、順丁株—&amp; r; _ 貝Ί埤一馱、反丁烯二酸、鄰苯二甲酸、 間苯二曱酸、己二酸、if己烷二曱酸等,但並不限於此。 進而,其他環氧樹脂,可列舉藉由氧化反應將由環己 烯醛衍生物與醇體之縮醛反應所得之縮醛化合物環氧化而 成之環氧樹脂。 s亥等環氧樹脂之且@也丨 曰(八體例,可列舉:ERL-4221、 UVR-6105、ERL-4299(全邱盔亦 σ 々 , (王為商αο名,均由Dow Chemical w) Celloxide202lP、Epolead GT401、EHPE3150、 EHPEWOCE(全部為商品名,均由叫“丨化學工業製造)及 二環戊二稀二環氧化物等,但並不限定於料(參考文獻: 總論環氧樹脂基礎編I p76_85)。 該等可單獨使用,亦可併用2種以上。 本發明中之硬化劑成公,* η 夕 战刀並無特別限定,較理想為將 夕元羧酸化合物(Β)單獨# 司1更用或與酸酐併用,亦可將該等與 其他硬化劑併用而使用。於併 八 &amp;併用之情形時,多元羧酸化合 物(Β)與酸酐之總重量於蜱 4里於屬硬化劑中所佔之比例較佳為3〇 重量%以上,尤佳為40重量%以上。 可併用之硬化劑’例如可列與松备儿人仏 J夕』舉私系化合物、酸酐系化 &amp;物、酿胺系化合物、盼系外人此 糸化合物、羧酸系化合物等。可 使用之硬化劑之具體例, 夕】舉.胺類或聚醯胺化合物(二 35 201118134 胺基二苯基曱烷、二伸乙三胺、三伸乙四胺、二胺基二笨 基砜、異佛酮二胺、二氰二胺、由次亞麻油酸之二聚物與 乙二胺所合成之聚醯胺樹脂等)、酸酐與聚矽氧系醇類之反 應物(鄰苯二曱酸酐、苯偏三酸酐、焦蜜石酸酐、順丁烯二 酸酐'四氫鄰苯二曱酸酐、曱基四氫鄰苯二甲酸酐、曱基 耐地酸酐、耐地酸酐、六氫鄰苯二曱酸酐、甲基六氫鄰苯 二甲酸酐、丁烷四曱酸酐、雙環[2.2.1]庚烷·2,3-二曱酸酐、 甲基雙環[2.2.1]庚烷-2,3-二曱酸酐、環己烷-1,3,4-三甲酸 -3,4-針等酸針與甲醇改質聚石夕氧等聚石夕氧系醇類之反應物 等)、多元酚類(雙酚A、雙酚F、雙酚S、苐雙酚 '萜二酚、 4,4’-聯苯酚、2,2,-聯苯酚、3,3,,5,5,-四甲基_[1,1,-聯笨]-4,4,-二醇、對苯二盼、間苯二盼、萘二紛、三_ (4-經基苯基)曱炫' 1,1,2,2-四(4-羥基苯基)乙烷、酚類(苯酚、經烧基取代之笨 酚、萘酚、經烷基取代之萘酚、二羥基苯、二羥基萘等)與 甲酸、乙酿、苯甲醛、對羥基苯甲醛、鄰羥基苯甲醛、對 物,四溴雙酚A等鹵化雙酚類 、萜烯與酚類之縮合物)、Adekastab C ^ Adekastab 135A ^ Adekastab 3〇l〇 &gt; Adekastab TPP. The curable resin composition of the present invention is used in an amount of 〇 to 5% by weight, more preferably 0.01 to 4% by weight, based on the weight of the organic polyoxo (A)'s compound. 1~2 weight 〇/〇. The curable resin composition of the present invention contains an organic polyfluorene oxide (A) as an epoxy resin, a zinc salt as a curing accelerator, and/or a rhythm compound (c) as essential components, and further contains a curing agent. The polycarboxylic acid (B) and an acid anhydride, a hindered amine light stabilizer as an additive, and a phosphorus-containing antioxidant are preferred components, and these may be used in combination with other epoxy resins, hardeners, and agents. In the epoxy resin component, the ratio of the organic polyfluorene (A) to the other epoxy resin and the organic polyoxo (4) in the total epoxy resin is preferably 6% or more, more preferably 7 〇% by weight or more. ... Other epoxy resins which can be used together with the organic polyfluorene (A) include phenol 2 lacquer epoxy resin, (IV) A type epoxy resin, and biphenyl type epoxy resin. A base methane type epoxy resin, a phenol aralkyl type epoxy resin, or the like. Specifically:: bisphenol bismuth, bisphenol S, thiodiphenol, g bisphenol, diphenol, 4:4, = this, 2,2'-biphenyl, 3,3, '5, 5, tetradecyl _π, Guanglian 44, · _ alcohol, pair of stupid age, resorcinol, 葶-pan, -M a non-phenol, di-(4-3⁄4-ylphenyl) methane, Four (4-transbasic) B&amp;, categorical (benzene, substituted by the burnt base, and Cai Pan's substituted by naphthoquinone, dipyridylbenzene, dipyridyl, etc.) 33 201118134 A road, acetic acid, serotonin, p-hydroxybenzaldehyde, o-hydroxybenzene = ethyl ketone, ortho-formis, dicyclopentadiene, hydrazine... bis (chloromethyl)-1,1 Condensation of '-biphenyl, 4,4··bis' (formylmercaptobiphenyl, 1,4-bis(chloro:yl)bendi, 1,4-bis(methoxymethyl)benzene, etc. And the modified substances on both sides are double-awaited, etc., and the double enzymes are derived from alcohol-derived epoxy alicyclic epoxy resin, epoxy propylamine epoxy resin, epoxy bismuth epoxy resin, etc. The solid or liquid epoxy resin is not limited to a knot or the like. These may be used singly or in combination of two or more kinds. In particular, the curable resin of the present invention The adult system is mainly used for optical purposes. When used for optical applications, it is preferably used in combination with an alicyclic type of latex resin. In the case of an alicyclic epoxy resin, the temple is preferably a skeleton. A compound having an epoxycyclohexane structure, particularly preferably an epoxy resin obtained by an oxidation reaction of a compound having a cyclohexene structure. The epoxy resins are exemplified by the following reaction. Emulsification of compounds, etc.: acetalization of cyclohexenecarboxylic acid with alcohols or esterification of cyclohexene methanol with carboxylic acids (Tetrahedr〇n ν〇1. 36 ρ 24〇9 (1980), Tetrahedr〇 n Letter ρ 75 (ΐ 98〇), etc., or a cyclohexenal quaternary reaction (Tishchenk〇reacti〇n) (Japanese Unexamined Patent Publication No. 2003- PCT No. And the transesterification reaction of the cyclohexene acrylate (the method described in JP-A No. 2-6-〇5 21 87, etc.). The alcohol is as long as it is alcoholic. The compound of the hydroxyl group is not particularly limited, and examples thereof include ethylene glycol. Propylene glycol, hydrazine, 3-propylene glycol, hydrazine, 2-butanediol, 14-butanediol, 1,4-pentanediol '1> hexamethylene glycol, cyclohexanedimethanol, 34 201118134 diethyl pentyl Glycol, 2-ethylamide, 7 butyl, G|-2-butyl-1,3-propanediol, neopentyl glycol, three-yellow yam*, A-®, suisu-two Guchu-36 Containing #ε Τ 布 布 醇 专 专 ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; Famous Ρ — - hydroxy hydrazine propanol and other four alcohols. Further, examples of the carboxylic acid include oxalic acid, cis-butane-&amp;r; _ beryllone, fumaric acid, phthalic acid, isophthalic acid, adipic acid, and if hexane. Diterpenic acid, etc., but is not limited thereto. Further, examples of the other epoxy resin include an epoxy resin obtained by epoxidizing an acetal compound obtained by reacting a cyclohexenal derivative with an acetal of an alcohol by an oxidation reaction. s Hai and other epoxy resin and @ 也丨曰 (eight body examples, can be cited: ERL-4221, UVR-6105, ERL-4299 (All-Chief Helmet also σ 々, (Wang Weishi αο名, both by Dow Chemical w Celloxide 202lP, Epolead GT401, EHPE3150, EHPEWOCE (all of which are trade names, all manufactured by 丨Chemical Industries) and dicyclopentane diepoxide, but not limited to materials (Reference: General Epoxy Resin base I p76_85). These may be used singly or in combination of two or more. The curing agent in the present invention is not limited, and the η 夕 战 knife is not particularly limited, and it is preferable to use a carboxylic acid compound (Β). Separately #司1 is used in combination with an acid anhydride, and may be used in combination with other hardeners. In the case of octagonal &amp; combined, the total weight of the polycarboxylic acid compound (Β) and the anhydride is in 蜱4. The proportion of the sclerosing agent is preferably 3% by weight or more, and more preferably 40% by weight or more. The hardener which can be used in combination can be listed as a compound, an acid anhydride, and an anhydride. a compound, an amine compound, a ruthenium compound, a carboxylic acid Compounds, etc. Specific examples of hardeners that can be used, amines or polyamine compounds (II 35 201118134 Aminodiphenylnonane, diethylenetriamine, triethylenetetramine, diamine Reaction of an acid anhydride with a polyoxyl alcohol by a base of a sulfone, an isophorone diamine, a dicyandiamide, a polyamine resin synthesized from a dilinoleic acid dimer and an ethylenediamine (o-phthalic anhydride, trimellitic anhydride, pyrogallic anhydride, maleic anhydride 'tetrahydrophthalic anhydride, mercapto tetrahydrophthalic anhydride, mercapto-resistant acid anhydride, ground resistance Anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, butane tetraphthalic anhydride, bicyclo[2.2.1]heptane·2,3-diphthalic anhydride, methylbicyclo[2.2.1 Acid heptane-2,3-diphthalic anhydride, cyclohexane-1,3,4-tricarboxylic acid-3,4-needle and the like, and methanol-modified polyoxo-alcohol Reactant, etc.), polyphenols (bisphenol A, bisphenol F, bisphenol S, bisphenol phenol quinolol, 4,4'-biphenol, 2,2,-biphenol, 3,3, 5,5,-tetramethyl _[1,1,-linked stupid]-4,4,-diol, p-benzoquinone, between Di-, naphthalene, tris-(4-pyridylphenyl)anthracene 1,1,2,2-tetrakis(4-hydroxyphenyl)ethane, phenols (phenol, substituted by substituting Phenol, naphthol, alkyl-substituted naphthol, dihydroxybenzene, dihydroxynaphthalene, etc.) with formic acid, ethylene, benzaldehyde, p-hydroxybenzaldehyde, o-hydroxybenzaldehyde, p-tetrabromobisphenol A, etc. Halogenated bisphenols, condensates of terpenes and phenols),

羥基笨乙酮、鄰羥基苯乙酮、二環戊二烯、糠醛、4,4,_雙(氣 f基)-1,1,-聯苯、4,4,_雙(甲氧基甲基聯苯、1,4,-雙(氣 甲基)苯、雙(甲氧基甲基)苯等之聚縮物及該等之改質 、胍衍生物 亦可使用2Hydroxy acetophenone, o-hydroxyacetophenone, dicyclopentadiene, furfural, 4,4, bis (gas f-)-1,1,-biphenyl, 4,4,_bis (methoxy Polycondensates such as bisphenyl, 1,4,-bis(gasmethyl)benzene, bis(methoxymethyl)benzene, and the like, and the modified or hydrazine derivatives may also be used.

之環 36 201118134 氧基1當量,硬化劑成分成為0.7〜1.2當量,尤 〜1 _ 1當量之比例而使用硬化劑。 -〇·75 相對,環氧基丨當量,於未滿〇_7當量之情形時 出i.2當量之情形時,均存在硬化不完全,無法獲得良 硬化物性之虞。 於本發明之硬化性樹脂組成物中,作為必需成分之鋅 鹽及/或鋅錯合物(C) ’由於直接表現出作為硬化觸媒之作 用,故可不另外添加硬化觸媒,但亦可併用其他硬化觸媒。 可使用之硬化促進劑,可列舉:2_甲基咪唑、2_苯基咪唑、 2-十一基咪唑、2-十七基咪唑、2_苯基_4_甲基咪唑、丨_苄基 -2-苯基咪唑、丨-节基_2·曱基咪唑、丨_氰基乙基_2_曱基咪唑、 1-氰基乙基-2-苯基咪唑、丨-氰基乙基_2_十一基咪唑、2,4_ 二胺基-6(2’-甲基咪唑(1,))乙基_均三口井、2,4_二胺基_6(2、 十一基咪唑(1'))乙基-均三口井、2,4_二胺基_6(2,_乙基_4_曱 基咪吐(Γ))乙基-均三口井、2,4-二胺基·6(2,-曱基咪唑(1')) 乙基-均二口井異三聚氰酸加成物、2_甲基咪唑異三聚氰酸 之2 : 3加成物、2-苯基咪唑異三聚氰酸加成物、2-苯基-3,5-二羥基甲基咪唑、2-笨基-4-羥基曱基-5-曱基咪唑、1 -氰基 乙基-2-苯基-3,5-二氰基乙氧基甲基咪唑之各種咪唑類;及 該等咪唑類與鄰笨二甲酸、間苯二曱酸、對笨二甲酸、丨,2,4_ 苯三曱酸、焦蜜石酸、萘二甲酸、順丁稀二酸、乙二酸等 多元羧酸之鹽類;二氰二胺等醯胺類;丨,8-二吖-雙環(5.4.0) 十一烯-7等二吖化合物及該等之四笨基硼酸鹽;笨酚酚醛 清漆等之鹽類;與上述多元叛酸類、或次膦酸(phosphinic 37 201118134 acid)類之鹽類’四丁基溴化銨、鯨蠟基三甲基溴化銨、三 :基甲基演化銨等銨鹽;三苯基麟、三(甲苯甲酿基)麟、四 苯基溴化鱗、四苯基鱗四苯基硼酸鹽等膦類或鱗化合物; 2,4,6-三胺基甲基笨齡等盼類;胺加成物、辛酸錫等金屬化 合物等;&amp;冑該等硬化促進劑製成微膠囊之微膠囊型硬化 促進劑等。使用該等硬化促進射之哪—種係根據例如透 明性、硬化速度、作業條件等對所得透明樹脂組成物所要 求之特性而適當選擇。硬化促進劑相對於環氧樹脂成分ι〇〇 重量份,通常於0.001〜15重量份之範圍内使用。 本發明之硬化性樹脂組成物可添加以下所列舉之各種 添加劑、輔助材料。 本發明之硬化性樹脂組成物中亦可含有含磷化合物作 為阻燃性賦予成分。含磷化合物可為反應型者,亦可為添 加型者。含鱗化合物之具體例,可列舉:填酸三曱酯 '碟 酸三乙酯 '磷酸三甲苯酯、磷酸三(二甲苯)酯、磷酸曱苯基 —苯酯、磷酸曱笨基-2,6-二(二曱笨)酯、丨,3_伸苯基雙(磷酸 一(一曱苯)酯)、1,4-伸笨基雙(磷酸二(二曱苯)酯)、4,4,_聯 笨(磷酸二(二甲苯)酯)等磷酸酯類;9,1〇_二氫_9_氧雜_1〇-磷 雜菲-10-氧化物、10(2,5-二羥基苯基)_1〇Η_9·氧雜_1〇-磷雜 菲-10-氧化物等磷烷(phosphane)類;使環氧樹脂與上述磷烷 類之活性氫反應所得之含磷環氧化合物、紅磷等,較佳為 磷酸@旨類、墻统類或含構環氧化合物,尤佳為1,3 _伸苯基雙 (填酸二(二甲苯)醋)、1,4-伸苯基雙(碟酸二(二曱苯)酷)' 4,4 %纟本(攝酸二(二甲本)gB )或含碟環氧化合物。含叾粦化合 38 201118134 物之含量較佳為含磷化合物/環氧樹脂=〇 ι〜旦 比)。當小於(M日夺,阻燃性不充分,若超出〇6,則H = 硬化物之吸濕性、介電特性造成不良影響之虞。 、 進而,本發明之硬化性樹脂組成物中視需要亦可推入 黏合劑樹脂。黏合劑樹脂,可列舉:丁醛系樹脂、縮醛: ,脂、丙稀酸系樹脂、環氧_尼龍系樹脂、峨_紛系樹脂: %乳-臟系樹脂、聚醯胺系樹脂、聚醯亞胺系樹脂曰 氧系樹脂等,但並不限定於該等。黏合劑樹脂之捧合量較 佳為不損及硬化物之阻燃性、耐熱性之範圍,相對於 樹脂成分與硬化劑成分1〇〇重量份,$常視需要使用二5 〜50重量份,較佳為〇 〇5〜2〇重量份。 本發明之硬化性樹脂組成物中視需要可添加 劑。無機填充劑,可列舉··結晶二氧切、炼融二氧化石夕、 乳化I鍅英石、石夕酸妈、碳_、碳化石夕、氮化石夕、氮 化硼、氧化锆、鎂橄欖石、塊滑石、&amp;晶石、二氧化鈦、 滑石等之粉體或將該等球形化而成之珠粒#,但並不限定 於該等H亥等無機填充材料可單獨使用,亦可使用2 種以上。該等無機填充劑之含量係使用於本發明之硬化性 樹脂組成物中佔0〜95重量%之量。進而,本發明之硬化性 ㈣旨組錢中可添加石夕炫偶合劑、硬脂酸、棕櫚酸、硬脂 ::::::脂酸勢等脫模劑、顏料等各種摻合劑、各種熱硬 化性秘月曰。 於將本發明之硬化性樹脂組成物用於光學材立 是光半導體密封劑之情料,作為上述所使用之無機填; &lt;r- 39 201118134 材料之粒徑,藉由使用奈米級水準之填充材料,可不阻礙 透明性而補足機械強度等。就透明性之觀點而言,作為奈 米級水準之標準較佳為使用平均粒徑為5〇〇 nm以下、尤佳 為平均粒徑為200 ηηι以下之填充材料。 於將本發明之硬化性樹脂組成物用於光學材料 疋光半導體密封劑之情形時,視需要可添加螢光體。螢光 體具有以下作用:例如吸收由藍色LED元件發出之藍色光 之一部分,而發出經波長轉換之黃色光,藉此形成白色光。 將螢光體預先分散於硬化性樹脂組成物中後,將光半導體 密封。螢光體並無特別限制,可使用先前公知之螢光體, 例如可例示稀土元素之_鹽、石荒代没食子酸鹽、原石夕酸 鹽等。更具體而言’可列舉YAG螢光體、tag螢光體、原 矽酉夂鹽螢光體、硫代沒食子酸鹽螢光體、硫化物螢光體等 螢光體’可例示:YA1〇3 : Ce、γ3Α15〇ΐ2 :。、ΜΑ : Ce &gt; Y202S . Eu ^ Sr5(P〇4)3ci : Eu ^ (SrEu)O · A1203 # = ^ 螢光體之粒徑,可使用該領域中公知之粒徑者,平均粒徑, 較佳為1〜25G心’尤佳為2〜Μ㈣。於使用該等螢光 體之情:時’其添加量相對於有機聚矽氧⑷等之有機成分 1〇0重量份’為1〜80重量份’較佳為5〜60重量份。 ;:本發月之硬化性樹脂組成物用於光學材料、尤其 是光半導體密封劑之,1·奎;^ 月形時,基於防止各種螢光體之硬化 ;尤降之::,可添加以二氧化矽微粉末(亦稱作八⑽… 化妙Μ私末,例如| . Δ 了列舉.Ae咖150、Aer〇sll9〇' Aer〇sil 40 201118134 130、Aerosil 200、Aerosil 3 00、Aerosil 3 80、Aerosil 0X50、 Aerosil TT600、Aerosil R972、Aerosil R974、Aerosil R202、 Aerosil R812 ' Aerosil R812S、Aerosil R805、RY200、 RX200(Japan Aerosil 公司製造)等。 本發明之硬化性樹脂組成物可含有酚系化合物作為抗 氧化材料。 苯酚化合物並無特別限定,例如可列舉:2,6-二-三級 丁基-4-曱基笨酚、正十八基-3-(3,5-二-三級丁基-4-羥基苯 基)丙酸酯、四[亞甲基-3-(3,5-二-三級丁基-4-羥基苯基)丙 酸酯]甲烷、2,4-二-三級丁基-6-曱基苯酚、1,6-己二醇-雙 -[3-(3,5 -二-三級丁基-4-經基苯基)丙酸g旨]、三(3,5-二-三級 丁基-4-羥基苄基)-異三聚氰酸酯、1,3,5-三曱基-2,4,6-三 (3,5-二-三級丁基-4-經基节基)笨、新戊四醇-四[3-(3,5-二_ 三級丁基-4-羥基苯基)丙酸酯]、3,9-雙-[2-[3-(3-三級丁基-4-羥基-5-曱基笨基)-丙醯氧基]-1,1-二甲基乙基]-2,4,8,10-四 氧雜螺[5.5]十一烷、三乙二醇-雙[3-(3-三級丁基-5-曱基-4-羥基苯基)丙酸酯]、2,2’-亞丁基雙(4,6-二-三級丁基苯酚)、 4,4、亞丁基雙(3 -曱基-6-三級丁基苯酚)、2,2’-亞曱基雙(4-曱基-6-三級丁基苯酚)、2,2·-亞甲基雙(4-乙基-6-三級丁基 本酌)、2-二級丁基-6-(3-二級丁基-2 -經基-5-曱基节基)_4_ 甲基苯酚丙烯酸酯、2-[1-(2-羥基-3,5-二-三級戊基苯基)乙 基]-4,6-二-三級戊基苯基丙烯酸酯、4,4'-硫代雙(3-曱基-6-三級丁基苯酚)、4,4,-亞丁基雙(3 -甲基-6-三級丁基苯酚)、 2-三級丁基-4-曱基苯酚、2,4-二-三級丁基苯酚、2,4-二-三 201118134 級戊基苯酚、4,4'-硫代雙(3-曱基-6-三級丁基苯酚)、4,4·-亞丁基雙(3 -甲基-6-三級丁基苯酚)、雙-[3,3-雙-(4·-羥基-3'· 三級丁基苯基)-丁酸]-二醇酯、2,4-二-三級丁基苯酚、2,4-二-二級戍基苯齡、2-[1-(2 -經基-3,5-二-二級戍基苯基)乙 基]-4,6-二-三級戊基苯基丙烯酸酯、雙-[3,3-雙-(4’-羥基-3’· 三級丁基苯基)-丁酸]-二醇酯等。 上述酚系化合物亦可使用市售品。 例如可歹1J 舉:Ciba Specialty Chemicals 製造之 IRGANOX1010 、 IRGANOX1035 、 RGANOX1076 、 IRGANOX1 135 、 IRGANOX245 、 IRGANOX259 、 IRGANOX295 、 IRGANOX3114 、 IRGANOX1098 、 IRGANOX1520L;Adeka 製造之 Adekastab AO-20、Adekastab AO-30、Adekastab AO-40、Adekastab AO-50、Adekastab AO-60、Adekastab AO-70、Adekastab AO-80、Adekastab AO-90、Adekastab AO-330 ;住友化學工業製造之 Sumilizer GA-80、Sumilizer MDP-S、Sumilizer BBM-S、Sumilizer GM、Sumilizer GS(F)、Sumilizer GP 等。 除此以外,可使用市售之添加材料作為樹脂之防著色 劑。例如可列舉:Ciba Specialty Chemicals 製造之 TINUVIN328、TINUVIN234、TINUVIN326、TINUVIN120、 TINUVIN477、TINUVIN479、CHIMASSORB2020FDL、 CHIMASSORB119FL 等。 於添加上述酚系化合物之情形時,其摻合量並無特別 限定,可以於本發明之硬化性樹脂組成物中以佔0.005〜5 ·0 42 201118134 重量%之量添加。 本發明之硬化性樹脂組成物可藉由將各成分均勻地混 合而獲得。又,本發明之硬化性樹脂組成物可利用與先前 已知之方法相同之方法而容易地製成其硬化物。 本發明之硬化性樹脂組成物例如可視需要使用擠出 機、捏合機、輥或行星式混合機等,將環氧樹脂成分與硬 化劑成分與辞鹽及/或辞錯合物(c)充分混合直至達到均勻 為止而獲得。於所得硬化性樹脂組成物為液狀之情形時, 將其裝填(potting)或澆鑄(casting)、或含浸於基材中,戈者 於模具中流入硬化性樹脂組成物而進行澆鑄,藉由加熱使 其硬化,藉此可製成硬化物。另一方面,於硬化性樹脂組 成物為固形之情形時,熔融後進行澆鑄,或者利用轉注成 型機等進行成型,進而藉由加熱使其硬化,藉此可製 化物。 更 再者,作為任意成分之其他硬化促進劑、胺化合物、 含磷化合物、酚化合物、黏合劑樹脂、無機填充材料等尸 要於上述混合步驟中添加、混合即可,硬化溫度、時間為 〜2〇〇°C、2〜1〇小時。硬化方法,可於高溫下—次硬化, 但較佳為逐步升溫而進行硬化反應。具體而言,於肋〜1 Μ c之間進行初始硬化,於10(rc〜20(rc之間進行後硬化。 更化h段,較佳為分成2〜8個階段進行升溫,更佳2〜 個階段。 ’ 〜 又,使本發明之硬化性樹脂組成物溶解於甲苯、一 本、丙蜩、甲基乙基酮、甲基異丁基酮、二甲基甲醯胺甲 43 201118134 甲基乙醯胺、N-甲基吡咯啶酮等溶劑中,製成硬化性樹 月曰組成物清漆,將其含浸於玻璃纖維、碳纖維、聚酯纖維' 聚醯胺纖維、氧化铭纖維、紙等基材_,進行加熱乾燥, 對所獲知之預⑦體進行熱壓成形,藉此可製成本發明之硬 =樹脂組成物之硬化物。此時之溶劑於本發明之硬化性 :脂組成4勿與該溶劑之混合物中,ϋ常係使則占10〜70重 里幸乂佳為15〜70重量%之量。又,亦可以RTM(Resin Trans如MGlding’樹脂轉注成形)方式,直接以液狀組成物 之狀態獲得含有碳纖維之環氧樹脂硬化物。 亦了將本發明之硬化性樹脂組成物用作膜型密到 用組成物。獲得此種膜型密封用組成物之方法,可列舉首 先將本發明之硬化性㈣組絲^上料化性樹脂組成 物清漆,並將其塗佈於剝離膜上,於加熱下去除溶劑而進 仃B階段化之方法,藉此可獲得作為片料狀接著劑之膜型 密封用組成物。該片料狀接著劑可用作多層基板等中之層 間絕緣層、光半導體之批次膜密封材料。 繼而,對將本發明之環氧樹脂組成物用作光半導體之 密封材料或黏晶(dlebQnd)材料之情形進行詳細說明。 於將本發明之硬化性樹脂組成物用作高亮度白色⑽ 體之密封材料或黏晶材料之情形日夺,係藉由將環 :樹月曰、硬化劑、偶合劑、抗氧化劑、光穩定劑等添加物 刀展合而製備硬化性樹脂組成物。混合方法只要使用 捏合機、三輥、萬能混合機、行星式混合機、均質混合機、 均質分散機'珠磨機等,於常溫下或加溫而進行混合即可。 44 201118134 晶材料與 所得硬化性樹脂組成物可用於密封材料、或者黏 进封材料之兩者。 — 同7C度白色LED等弁jjL道舰-ja +導體兀件通常係使用接著劑(黏 -材科)’將積層於藍寶石、尖晶石、Sic、si、zn0等基板 AIN、InGaN等半導體晶片接著於導線架或散熱板、封裝體 上而成°為了流通電流’亦存在連接金導線等導線之類型。 方面°亥半導體晶片係、以環氧樹脂等密封材料來密封 =圍。密封材料係為了保護半導體晶片不受熱或濕氣之 衫a ,且發揮透鏡功能之作用而使用。 本發月之硬化性樹脂組成物可用作該密封材料或黏晶 材料H驟上而t ’適合將本發明之硬化性樹脂組成物 用於黏晶材料與密封材料之兩者。 用本發月之硬化性樹脂組成物而將半導體晶片接著 於基板之方法,可列舉藉由分配器、裝填或網版印刷,將 本發明之硬化性樹脂組成物塗佈於基板上後,於上述硬化 性樹脂組成物上裝載半導體晶片而進行加熱硬化之方法。 藉由3亥方法,可將半導體晶片接著於基板。加熱時可使用 熱風循環式、紅外線、高頻等方法。 加熱條件例如較佳為80〜230°c、1分鐘〜24小時左 右。。為了降低加熱硬化時所產生之内應力,例如可於8〇〜 12〇C下預硬化30分鐘〜5小時後,於12〇〜18〇&lt;t、3〇分 釦〜1 0小時之條件下進行後硬化。 密封材料之成形方式,可使用:在插入有如上所述固Ring 36 201118134 The oxygen group is 1 equivalent, and the hardener component is 0.7 to 1.2 equivalents, particularly a ratio of 1 to 1 equivalent, and a curing agent is used. - 〇 · 75 相对 环 环 75 环 环 环 环 环 环 环 环 环 环 虞 虞 虞 虞 虞 虞 虞 虞 虞 虞 虞 虞 虞 虞 虞 虞 虞 虞 虞 虞 虞 虞 虞 虞 虞 虞 虞 虞 虞 虞In the curable resin composition of the present invention, the zinc salt and/or the zinc complex (C) as an essential component directly exhibits a function as a curing catalyst, so that a curing catalyst may not be added, but And use other hardening catalysts. Examples of the hardening accelerator which can be used include 2-methylimidazole, 2-phenylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, 2-phenyl-4-methylimidazole, and hydrazine-benzyl Benzyl-2-phenylimidazole, fluorenyl-pyrrolyl-2-mercaptoimidazole, hydrazine-cyanoethyl-2-indolyl imidazole, 1-cyanoethyl-2-phenylimidazole, fluorenyl-cyanoethyl Base 2_undecyl imidazole, 2,4-diamino-6 (2'-methylimidazolium (1,)) ethyl _ three wells, 2,4-diamine _6 (2, eleven Imidazole (1')) ethyl-all three wells, 2,4-diamino _6 (2, _ethyl _4 曱 咪 咪 咪 (Γ)) ethyl - three wells, 2, 4 -diamino-6 (2,-nonyl imidazole (1')) ethyl-distillary iso-cyanuric acid adduct, 2-methylimidazole isocyanuric acid 2:3 addition , 2-phenylimidazolium isocyanurate adduct, 2-phenyl-3,5-dihydroxymethylimidazole, 2-phenyl-4-hydroxyindolyl-5-mercaptoimidazole, 1- Various imidazoles of cyanoethyl-2-phenyl-3,5-dicyanoethoxymethylimidazole; and these imidazoles and o-dibenzoic acid, isophthalic acid, p-dicarboxylic acid,丨, 2,4_ benzenetricarboxylic acid, pyromic acid, naphthalenedicarboxylic acid, cis-butyl succinic acid a salt of a polycarboxylic acid such as oxalic acid; a guanamine such as dicyandiamide; a ruthenium compound such as ruthenium, 8-di-bicyclo-bicyclo(5.4.0) undecen-7, and the above-mentioned tetraphenylboronic acid a salt of a phenolic novolac varnish or the like; a salt of the above-mentioned multi-repulsive or phosphinic acid (phosphinic 37 201118134 acid), tetrabutylammonium bromide, cetyltrimethylammonium bromide, three An ammonium salt such as a methyl group-developing ammonium; a phosphine or a scaly compound such as triphenyl lin, tris(toluene) lin, tetraphenyl brominated sulphate or tetraphenyl quaternary tetraphenyl borate; 2, 4 , a 6-triaminomethyl phenyl group, a metal compound, a metal compound such as tin octylate, etc.; and a hardening accelerator which is a microcapsule type hardening accelerator of a microcapsule. The use of these hardening-promoting shots is appropriately selected depending on the properties required for the obtained transparent resin composition, for example, transparency, curing speed, working conditions and the like. The hardening accelerator is usually used in an amount of from 0.001 to 15 parts by weight based on the parts by mass of the epoxy resin component ι. The curable resin composition of the present invention may be added with various additives and auxiliary materials listed below. The curable resin composition of the present invention may further contain a phosphorus-containing compound as a flame retardancy imparting component. The phosphorus-containing compound may be of a reactive type or may be an additive type. Specific examples of the scaly compound include: tridecyl sulphate triethyl sulphate tricresyl phosphate, tris(xylylene) phosphate, phenyl phenyl phosphate, and bismuth phosphite-2. 6-di(diphenyl) ester, anthracene, 3_phenylene bis(mono(phenyl)phosphonate), 1,4-extended bis(diphenylene phosphate), 4, 4, _ Lian (phosphonium di(xyl) phosphate) and other phosphates; 9,1 〇 _ dihydro _9 _ oxa 〇 〇 磷 磷 phenanthrene-10-oxide, 10 (2,5- Phosphines such as dihydroxyphenyl)_1〇Η_9·oxa-1〇-phosphaphenanthrene-10-oxide; phosphorus-containing epoxy obtained by reacting an epoxy resin with active hydrogen of the above-mentioned phosphines The compound, red phosphorus or the like is preferably a phosphoric acid @-type, a wall-type or an epoxide-containing compound, and particularly preferably a 1,3 _phenylene bis(xylylene) vinegar, 1,4- Phenyl bis (disc bis(diphenyl benzene) cool) ' 4,4% sputum (acid di(dimethyl) gB) or dish epoxy compound. The content of the compound containing lanthanum 38 201118134 is preferably phosphorus-containing compound / epoxy resin = ι ι ~ denier ratio). When it is less than (M, the flame retardancy is insufficient, and if it exceeds 〇6, H = the hygroscopic property of the cured product and the dielectric properties are adversely affected. Further, the curable resin composition of the present invention is optionally required. It is also possible to push in the binder resin. Examples of the binder resin include butyral resin, acetal: fat, acrylic resin, epoxy-nylon resin, and 峨 纷 resin: % milk-dirty system The resin, the polyamide resin, the polyimide resin, the silicone resin, and the like are not limited thereto. The binder resin preferably has a flame retardancy and heat resistance without impairing the cured product. The range is preferably from 5 to 50 parts by weight, preferably from 5 to 2 parts by weight, based on 1 part by weight of the resin component and the hardener component. The curable resin composition of the present invention is regarded as a component. Additives are required. Inorganic fillers include, for example, crystal dioxotomy, smelting of sulphur dioxide, emulsification of yttrium, yoghurt, carbon _, carbon carbide, nitriding, boron nitride, Powder of zirconia, forsterite, talc, &amp; spar, titanium dioxide, talc, etc. The inorganic fillers may be used alone or in combination of two or more kinds. The contents of the inorganic fillers are used in the present invention. The amount of the curable resin composition is from 0 to 95% by weight. Further, in the curability (IV) of the present invention, the Shi Xi Xuan coupling agent, stearic acid, palmitic acid, and stearin may be added to the group::::: : various kinds of admixtures such as a release agent such as a fatty acid, a pigment, and the like, and various thermosetting secrets. The use of the curable resin composition of the present invention for an optical material is an optical semiconductor sealing agent. Inorganic filling used; &lt;r- 39 201118134 The particle size of the material, by using a nano-level filling material, can make up the mechanical strength without hindering transparency. From the viewpoint of transparency, as a nano level The standard is preferably a filler having an average particle diameter of 5 Å or less, and more preferably an average particle diameter of 200 ηη or less. The curable resin composition of the present invention is used for an optical material glazing semiconductor sealing agent. In case, add fluorescent light as needed The phosphor has the following effects: for example, absorbing a portion of the blue light emitted by the blue LED element and emitting wavelength-converted yellow light, thereby forming white light. Dispersing the phosphor in advance in the curable resin composition In the meantime, the photo-semiconductor is sealed. The phosphor is not particularly limited, and a conventionally known phosphor can be used, and examples thereof include a rare earth element salt, a rock salt, a protopanalate, and the like. The term "YAG phosphor, tag phosphor, protopium salt phosphor, thiogallate phosphor, sulfide phosphor, etc." can be exemplified as: YA1〇3 : Ce, γ3Α15〇ΐ2 :, ΜΑ : Ce &gt; Y202S . Eu ^ Sr5(P〇4) 3ci : Eu ^ (SrEu)O · A1203 # = ^ The particle size of the phosphor can be used in the art. The particle size, the average particle diameter, preferably 1 to 25 G heart 'is especially 2 to Μ (four). In the case of using the above-mentioned phosphors, the amount thereof is preferably from 1 to 80 parts by weight, based on the organic component of the organic polysiloxane (4), of from 1 to 80 parts by weight, preferably from 5 to 60 parts by weight. ;: The hardening resin composition of this month is used for optical materials, especially optical semiconductor encapsulants, 1· Kui; ^ Moon shape, based on prevention of hardening of various phosphors; especially::, can be added With cerium oxide micropowder (also known as octagonal (10)... Μ Μ , , , , , , , . . . . . . . A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A 3 80, Aerosil 0X50, Aerosil TT600, Aerosil R972, Aerosil R974, Aerosil R202, Aerosil R812 'Aerosil R812S, Aerosil R805, RY200, RX200 (manufactured by Japan Aerosil Co., Ltd.), etc. The curable resin composition of the present invention may contain a phenol system The phenol compound is not particularly limited, and examples thereof include 2,6-di-tertiarybutyl-4-mercaptophenol, n-octadecyl-3-(3,5-di-tridyl). Butyl-4-hydroxyphenyl)propionate, tetrakis[methylene-3-(3,5-di-tri-butyl-4-hydroxyphenyl)propionate]methane, 2,4- Di-tertiary butyl-6-nonylphenol, 1,6-hexanediol-bis-[3-(3,5-di-tri-tert-butyl-4-phenylphenyl)propionic acid g] , three (3,5-di-tertiary butyl -4-hydroxybenzyl)-isocyanate, 1,3,5-trimethyl-2,4,6-tris(3,5-di-tri-butyl-4-yl) Stupid, pentaerythritol-tetrakis[3-(3,5-di-tri-tert-butyl-4-hydroxyphenyl)propionate], 3,9-bis-[2-[3-(3- Tert-butyl-4-hydroxy-5-fluorenyl)-propenyloxy]-1,1-dimethylethyl]-2,4,8,10-tetraoxaspiro[5.5] Mono-, triethylene glycol-bis[3-(3-tert-butyl-5-indolyl-4-hydroxyphenyl)propionate], 2,2'-butylene bis(4,6-di - Tert-butylphenol), 4,4, butylene bis(3-indolyl-6-tertiary butylphenol), 2,2'-indenylene bis(4-mercapto-6-tertiary Phenol), 2,2·-methylenebis(4-ethyl-6-tributyl), 2-secondylbutyl-6-(3-tertiary butyl-2-yl)- 5-fluorenyl cyclyl)_4_methylphenol acrylate, 2-[1-(2-hydroxy-3,5-di-triamylphenyl)ethyl]-4,6-di-tri-pentane Phenyl acrylate, 4,4'-thiobis(3-indolyl-6-tertiary butyl phenol), 4,4,-butylene bis(3-methyl-6-tertiary butylphenol ), 2-tert-butyl-4-nonylphenol, 2,4-di-tertiary butylphenol, 2,4-di-three 201118134 Amyl phenol, 4,4'-thiobis(3-mercapto-6-tertiary butyl phenol), 4,4·-butylene bis(3-methyl-6-tertiary butyl phenol), Bis-[3,3-bis-(4.-hydroxy-3'.tris-butylphenyl)-butyric acid]-diol ester, 2,4-di-tertiary butylphenol, 2,4- Di-second fluorenyl benzene, 2-[1-(2-propionyl-3,5-di-nonyl-nonylphenyl)ethyl]-4,6-di-triamylphenyl acrylate Ester, bis-[3,3-bis-(4'-hydroxy-3'.tris-butylphenyl)-butyric acid]-glycol ester, and the like. Commercially available products can also be used as the phenolic compound. For example, 歹1J: IRGANOX1010, IRGANOX1035, RGANOX1076, IRGANOX1 135, IRGANOX245, IRGANOX259, IRGANOX295, IRGANOX3114, IRGANOX1098, IRGANOX1520L manufactured by Ciba Specialty Chemicals; Adekastab AO-20, Adekastab AO-30, Adekastab AO-40 manufactured by Adeka, Adekastab AO-50, Adekastab AO-60, Adekastab AO-70, Adekastab AO-80, Adekastab AO-90, Adekastab AO-330; Sumilizer GA-80, Sumilizer MDP-S, Sumilizer BBM-S, manufactured by Sumitomo Chemical Industries, Sumilizer GM, Sumilizer GS (F), Sumilizer GP, etc. In addition to this, commercially available additive materials can be used as the anti-staining agent for the resin. For example, TINUVIN328, TINUVIN234, TINUVIN326, TINUVIN120, TINUVIN477, TINUVIN479, CHIMASSORB2020FDL, CHIMASSORB119FL manufactured by Ciba Specialty Chemicals, and the like can be cited. In the case where the phenolic compound is added, the amount of the phenolic compound to be added is not particularly limited, and may be added in an amount of 0.005 to 5 · 0 42 201118134% by weight in the curable resin composition of the present invention. The curable resin composition of the present invention can be obtained by uniformly mixing the components. Further, the curable resin composition of the present invention can be easily produced into a cured product by the same method as previously known. The curable resin composition of the present invention may be, for example, an extruder, a kneader, a roll or a planetary mixer, if necessary, and the epoxy resin component and the hardener component and the salt and/or the complex (c) are sufficient. Mix until it is uniform. When the obtained curable resin composition is in the form of a liquid, it is potted or cast, or impregnated into the substrate, and the caster is poured into the mold into the curable resin composition for casting. It is hardened by heating to form a cured product. On the other hand, when the curable resin composition is solid, it may be cast after melting, or molded by a transfer molding machine or the like, and further cured by heating, whereby the compound can be produced. Furthermore, other hardening accelerators, amine compounds, phosphorus-containing compounds, phenol compounds, binder resins, inorganic fillers, and the like, which are optional components, may be added and mixed in the above mixing step, and the curing temperature and time are ~ 2〇〇°C, 2~1〇 hours. The hardening method may be a secondary hardening at a high temperature, but it is preferred to carry out a hardening reaction by gradually increasing the temperature. Specifically, the initial hardening is performed between the ribs ~1 Μ c, and the hardening is performed at 10 (rc~20 (r. rc). The h segment is more preferably divided into 2 to 8 stages for temperature rise, and more preferably 2 ~ stage. ' 〜 Further, the curable resin composition of the present invention is dissolved in toluene, a book, propionate, methyl ethyl ketone, methyl isobutyl ketone, dimethylformamide 43 201118134 A curable eucalyptus varnish is prepared in a solvent such as acetamide or N-methylpyrrolidone, and is impregnated with glass fiber, carbon fiber, polyester fiber, polyamide fiber, oxidized fiber, paper. The substrate _ is heated and dried, and the obtained pre- 7 body is subjected to hot press forming, whereby the hardened resin composition of the present invention can be obtained. The solvent at this time is the hardenability of the present invention: the fat composition 4 Do not mix with the solvent, the 系 often makes 10~70 weights, preferably 15~70% by weight. Also, RTM (Resin Trans such as MGMding' resin transfer molding), directly The state of the liquid composition obtains an epoxy resin hardened material containing carbon fibers. The curable resin composition is used as a film-type dense composition. The method for obtaining such a film-type sealing composition is exemplified by first curing the curable (four) composition of the present invention. This is applied to a release film, and the solvent is removed by heating to carry out a B-stage process, whereby a film-type sealing composition as a sheet-like adhesive can be obtained. A multilayer film sealing material for an interlayer insulating layer or an optical semiconductor in a multilayer substrate or the like. Next, a case where the epoxy resin composition of the present invention is used as a sealing material of a photo-semiconductor or a dlebQnd material will be described in detail. The use of the curable resin composition of the present invention as a sealing material or a die-bonding material for a high-brightness white (10) body is achieved by a ring: a tree, a hardener, a coupling agent, an antioxidant, and a light. A curable resin composition is prepared by blending an additive such as a stabilizer, and a mixing method is used as long as a kneader, a three-roller, a universal mixer, a planetary mixer, a homomixer, a homogenizer, a bead mill, or the like is used. It can be mixed at room temperature or under heating. 44 201118134 The crystal material and the obtained curable resin composition can be used for both sealing materials and adhesive sealing materials. - Same as 7C white LED, etc. jjL road ship -ja + The conductor element is usually formed by laminating a semiconductor wafer such as sapphire, spinel, Sic, si, zn0, etc. on a lead frame or a heat sink or a package using an adhesive (adhesive material). °In order to flow current 'there is also a type of wire connecting a gold wire. Aspects are semiconductor wafers, sealed with a sealing material such as epoxy resin. The sealing material is used to protect the semiconductor wafer from heat or moisture. And it is used for the function of the lens. The curable resin composition of the present month can be used as the sealing material or the die-bonding material H, and t' is suitable for the use of the curable resin composition of the present invention for the die-bonding material and Both of the sealing materials. A method of adhering a semiconductor wafer to a substrate using the curable resin composition of the present month, and applying the curable resin composition of the present invention to the substrate by dispenser, filling or screen printing, A method in which a semiconductor wafer is mounted on the curable resin composition and heat-hardened. The semiconductor wafer can be attached to the substrate by the 3H method. Hot air circulation type, infrared ray, high frequency, etc. can be used for heating. The heating conditions are, for example, preferably from 80 to 230 ° C and from 1 minute to 24 hours. . In order to reduce the internal stress generated during heat hardening, for example, it can be pre-hardened at 8 〇 to 12 ° C for 30 minutes to 5 hours, after 12 〇 18 〇 t 〇 〇 t t t 〜 〜 〜 〜 〜 〜 After the hardening. The sealing material can be formed by using:

45 201118134 定有半導體晶片之基板的模具内注入密封材料後,進行加 熱硬化而成形之注入方式;於模具上預先注入密封材料, 使固定於基板上之半導體晶片浸潰於其中,進行加熱硬化 後’自模具中脫模之壓縮成形方式等。 注入方法,可列舉分配器、轉注成形、射出成形等。 加熱可使用熱風循環式、紅外線、高頻等方法。 加熱條件例如較佳為80〜23(rc ' 1分鐘〜24小時左 右。為了降低加熱硬化時所產生之内應力,例如可於8〇〜 120°C下預硬化30分鐘〜5小時後,於12〇〜18〇。匚' μ分 鐘〜1 0小時之條件下進行後硬化。 本發明之硬化性樹脂組成物之用途並 途’可適用於使用環氧樹脂等硬化性樹脂之一般二二 如可列舉:接著劑、塗料、塗佈劑、成形_包^料例 膜、FRP等)、絕緣材料(包括印刷電路板 '電線包覆等)、 密封材料,此外還可列舉:审封紝 ; 幻舉&amp;封材枓、基板用氰酸酯樹脂 成物:或作為抗姓用硬化劑而添加至丙稀酸醋系樹脂等 ,、他樹脂等中之添加劑等。 接著劑,可列舉土木用、建築用、汽車用、一般事務 用、醫療用之接著劑,此外還可列 兮黧夕* J幻舉電子材枓用之接著劑。 ^之中,電子材料用之接著劑,可列舉:增層基板㈣ substrate)等多層基板之層間接 f;m楚u·…曾μ W黏日曰劑、底填料(under 1)等+導體用接著劑;職加_底填料 (叫異向性導電糊(ACP)等安裝用接著劑等。 密封劑’可列舉:電容器、電晶體、二極體、發光二 46 20111813445 201118134 An injection method in which a sealing material is injected into a mold of a substrate of a semiconductor wafer, and then formed by heat curing; a sealing material is preliminarily injected onto the mold to impregnate the semiconductor wafer fixed on the substrate, and after heat curing 'Compression forming method for demolding from the mold. Examples of the injection method include a dispenser, transfer molding, and injection molding. For heating, a hot air circulation type, an infrared ray, a high frequency, or the like can be used. The heating condition is, for example, preferably 80 to 23 (rc '1 minute to 24 hours or so.) To reduce the internal stress generated during heat curing, for example, it can be pre-hardened at 8 Torr to 120 ° C for 30 minutes to 5 hours. 12 〇 18 〇 匚 匚 μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ μ Examples thereof include an adhesive, a coating material, a coating agent, a film of a molding method, an FRP film, an insulating material (including a printed circuit board 'wire coating, etc.), a sealing material, and a sealing material; A magical lift &amp; sealant, a cyanate resin for a substrate, or an additive such as an acrylic acid vinegar resin as an anti-surname hardener, an additive such as a resin, or the like. Examples of the subsequent agent include an adhesive for civil engineering, construction, automotive, general affairs, and medical use, and an adhesive for the use of electronic materials for the use of electronic materials. ^ Among them, the adhesive for electronic materials, for example, layered substrate (four) substrate) and other layers of the multilayer substrate indirect f; m Chuu · ... Zeng μ W sticky sundraft, underfill (under 1), etc. + conductor Adhesive; _ bottom filler (called anisotropic conductive paste (ACP) and other adhesives for installation. Sealant's can be cited: capacitors, transistors, diodes, illuminating two 46 201118134

極體、IC、LSI等用之裝填、浸潰、轉注成形密封;IC、LSI 類之COB、COF、TAB等用之裝填密封;倒裝 底填料;QFP、BGA、CSP等IC封 、日日相之 加強用底填料)等。 f裝類-裝時之密封(包括 本發明中所得之硬化物可用於以光學零 之各種用途。所謂光學用材料,通常係表示用於使可見光、 紅外線、紫外線、X射線、雷射等光通過該材料中之 材:二更具體而言’除了燈型、⑽型等咖用密封材料 可歹:舉以下所不者。液晶顯示器領域中之基板材料、 導先板、稜鏡片料、偏轉板、相位差板、視角修正膜、接 著劑、偏光鏡(P〇larizer)保護膜等液晶用膜等之液晶顧示裝 置周邊材料。X,作為下一代平板顯示器而受到期待之彩 色PDP(PlaSma Display,電衆顯示器)之密封材料、抗反射 臈、光學修正膜、外殼材料、前面玻璃之保護膜、前面玻 璃代替材料、接著劑;以及LED顯示裝置中所使用之㈣ 之模具材料、LED之密封材料、前面玻場之保護膜、前面 玻璃代替材料、接著劑;以及電锻定址液晶(piasma㈣⑽Packing, impregnation, transfer molding and sealing for polar body, IC, LSI, etc.; filling and sealing for COB, COF, TAB, etc. of IC and LSI; flip-chip filling; QFP, BGA, CSP, etc. The same as the use of the bottom filler). F-package-sealing seal (including the hardened material obtained in the present invention can be used for various purposes in optical zero. The so-called optical material is usually used to make visible light, infrared rays, ultraviolet rays, X-rays, lasers, etc. Through the material in the material: two more specifically - in addition to the lamp type, (10) type and other coffee sealing materials can be: the following: in the field of liquid crystal display substrate materials, guide plates, sheet materials, deflection A liquid crystal display device such as a liquid crystal film such as a plate, a retardation film, a viewing angle correction film, an adhesive, or a polarizer (P〇larizer) protective film. X, a color PDP that is expected as a next-generation flat panel display (PlaSma) Display, anti-reflective coating, optical correction film, outer casing material, protective film for front glass, front glass replacement material, adhesive; and (4) mold materials used in LED display devices, LED Sealing material, protective film on front glass field, front glass replacement material, adhesive; and electric forging address liquid crystal (piasma (4) (10)

Uqiud Crysta卜PALC)顯示器中之基板材料、導光板、棱鏡 片料、偏轉板、相位差板、視角修正膜、接著劑、偏光鏡 保護膜;以及有機EL(Electr〇 Luminescence,電致發光)顯 示器中之别面玻璃之保護膜、前面玻璃代替材料、接著劑; 以及場發射顯示器(Field Emissi〇11 Display,FED)中之各種 膜基板、前面玻璃之保護膜、前面玻璃代替材料、接著劑。 於光學記錄領域中,為VD(Vide〇 Disc,視訊光碟)、 47 201118134 CD/CD-ROM、CD-R/Rw、DVD-R/DVD-RAM、MO/MD、 PD(PhSae-Change Disc,相變光碟)、光學卡(〇pticai 用 之碟片基板材料、光碟機讀取頭(pick_up lens)、保護膜、密 封材料、接著劑等。 於光學設備領域中,為靜態相機(still camera)之鏡頭用 材料、取景器稜鏡、靶稜鏡、取景器[受光感測器部。 又,視訊相機之攝影鏡頭、取景胃。另外,投影電視之投 ㈣頭 '㈣膜 '㈣材料 '接著劑等。光感測設備之鏡 頭用材料、密封材料、接著劑、膜等。於光學零件領域, 為光通信系統中之光開關周邊之纖維材料、透鏡、波導、 元件之密封材料、接著劑等。光連接器周邊之光纖材料、 套圈、密封材料、接著劑等。於光被動零件、《電路零件 中’為透鏡、波導、LED之㈣材料、CCD之密封材料、 接著劑等。光電子積體電路(〇EIC)周邊之基板材料 '纖唯 材料、元件之密封材料、接著劑等。於光纖領域中,為裝 飾顯示器用照明/光導等,工業用途之感測器類,顯示/標識 頬等;又有通信基礎設施用及家庭内之數位設備連接用之 光纖。於半導體積體電路周邊材料中’為LSI、超lsi材料 用之顯微蝕刻術(microlithography)用之抗蝕材料。於汽車' 輪送機領域中’為汽車用之燈反射器、軸承護圈、齒輪部 分 '耐蝕塗料、開關部分、頭燈、引擎内零件、電機零件、 各種内外裝品、驅動引擎、刹車油箱、汽車用防鏽鋼板、 車内電盤(lnten〇r P繼1)、内裝材料、保護/捆束用線束、燃 料軟皆、汽車燈、玻璃代替品β χ ’為鐵路車輛用之複層 48 201118134 為航二機之結構材科之韌性 構件、保護/梱束用線束、耐蝕塗 w、引擎周邊 裝/加工用材料、電氣蓋〜:建築領域中,為内 Tt ¥虱盍片料、破璃中η时^ 太陽電池周邊材料^ 中間膜、破螭代替品、 為下-代用途中,為溫室包覆用膜。作 科、有機㈣射元件%件周邊材 算元件、有機太陽電池周邊之心㈣放大7&quot;件、光運 之密封材料、接著劑等。板材料、纖維材料、元件 光學用材料之其他用途, 物之-般用途,例如可列舉.接」二使用硬化性樹脂組成 形材艇β紅Μ W .接耆劑、塗料、塗佈劑、成 柄 片料、膜、FRP等)、絕緣材料(包括印刷電路 ^電線被覆等)、密封劑,此外還可列舉添加至 專中之添加劑等。 實施例 ^以下,精由合成例、實施例,對本發明進行更詳細之 5兒明。再者,本發明並不限定於該等合成例、實施例。又, :下合成例、實施例中,「份」係指重量份,「%」係指重 置〇/〇。再者,實施例中之各物性值係利用以下方法而測定。 (1)分子量:藉由凝膠滲透層析(Gpc)法,於下述條件下 /則疋之聚苯乙烯換算,而算出重量平均分子量。 GPC之各種條件 製造商:島津製作所 官柱:保護管柱 SHODEX GPC LF-G LF-804(3 根) 流速· 1·〇 rni/min 49 201118134 管柱溫度:40°C 使用溶劑:THF(四氫呋0南) 檢測器:RI(示差折射檢測器) (2) 環氧當量:卩Jis K-7236中記载之方法而測定。 (3) 黏度.使用東機產業股份有限公司製造之e型黏度 計(TV-20),於h°C下進行測定。 合成例1 製造步驟⑴:將㈠3,4_環氧環己基)乙基三甲氧基石夕炫 心份、重量平均分子4 17〇〇(咖測定值)之石夕烧醇末端甲 基笨基聚魏油234份(錢醇當量請,算出為使用Gpc 所測定之重量平均分子量之一本 里 &lt; 牛)、〇·5%氫氧化鉀(KOH)甲 醇溶液18份(KOH份數Α η λο &amp;、, 忉数為0·09份)放入反應容器中,將浴溫 設定為7 5 °C ’進行升溫0升、、田会 开,皿後,於回流下反應8小時。 製造步驟(ii):追加曱醇3 了醉川5份後,以6〇分鐘滴加5〇% 蒸餾水甲醇溶液86.4份,於同4 π 於回流下,於75艽下反應8小時。 反應結束後,以5%磷酸-气知, 啤虱鈉水溶液進行中和,然後於8〇 °C下進行甲醇之蒸餾回收。 添加曱基異丁基酮(MIBKP80 h,重複水洗3次。繼而, π减壓下、i 〇〇 C下,對有 去除溶劑’藉此獲得具有反應性官能基之有 物(A-1)3^。所得化合物之環氧當量為718g/eq,M 平均分子量為2200’外觀為無色透明。 q·重量 合成例2Substrate material, light guide plate, prism sheet, deflecting plate, phase difference plate, viewing angle correction film, adhesive, polarizer protective film in Uqiud Crysta PALC) display; and organic EL (Electr〇 Luminescence) display A protective film for a face glass, a front glass substitute material, an adhesive; and various film substrates in a field emission display (Field Emissi® 11 Display, FED), a protective film for the front glass, a front glass replacement material, and an adhesive. In the field of optical recording, it is VD (Vide〇Disc, video CD), 47 201118134 CD/CD-ROM, CD-R/Rw, DVD-R/DVD-RAM, MO/MD, PD (PhSae-Change Disc, Phase change optical disc), optical card (the disc substrate material for 〇pticai, pickup_up lens, protective film, sealing material, adhesive, etc.) In the field of optical equipment, it is a still camera. The material for the lens, the viewfinder, the target, the viewfinder [the light sensor unit. Also, the camera lens of the video camera, the framing stomach. In addition, the projection of the projection TV (four) head '(four) film '(four) material' A material for a lens of a light sensing device, a sealing material, an adhesive, a film, etc. In the field of optical parts, a fiber material, a lens, a waveguide, a sealing material for a component, and an adhesive for an optical switch in an optical communication system. Etc. Optical fiber materials, ferrules, sealing materials, adhesives, etc. around the optical connector. In the passive parts of the light, in the circuit parts, it is a lens, a waveguide, a material of the LED (4), a sealing material of the CCD, a follower, etc. Photoelectrons Integrated circuit (〇EIC) Substrate material 'fibrous material, sealing material for components, adhesive, etc. In the field of optical fiber, it is used for lighting/light guides for decorative displays, sensors for industrial use, display/logging, etc.; An optical fiber used for connection between digital devices in facilities and homes. It is used as a resist material for microlithography for LSI and ultra-lsi materials in the peripheral materials of semiconductor integrated circuits. 'For automotive reflectors, bearing retainers, gear parts' corrosion resistant coatings, switch parts, headlights, engine parts, motor parts, various internal and external products, drive engines, brake oil tanks, automotive rust-proof steel, In-car electric disc (lnten〇r P followed by 1), interior materials, harness for protection/bundling, fuel soft, auto lamp, glass substitute β χ 'for the complex layer of railway vehicles 48 201118134 for the second aircraft Resilience members for structural materials, wiring harness for protection/twisting, corrosion-resistant coating w, engine peripheral packaging/processing materials, electrical cover~: in the construction field, for inner Tt ¥ 虱盍 料 、 、 、 、 太Battery peripheral material ^ Intermediate film, broken sputum substitute, for lower-generation use, for greenhouse coating film. For the branch, organic (four) shooting element% of peripheral materials, organic solar cell peripheral heart (four) enlargement 7 &quot; , sealing materials for optical transportation, adhesives, etc. Other uses of board materials, fiber materials, and materials for component optics, for general use, for example, can be exemplified by the use of a hardening resin to form a shape boat. An adhesive, a coating, a coating agent, a handle sheet, a film, an FRP, etc., an insulating material (including a printed circuit, a wire coating, etc.), a sealant, and an additive added to a special one. EXAMPLES Hereinafter, the present invention will be described in more detail by way of Synthesis Examples and Examples. Furthermore, the present invention is not limited to the above-described synthesis examples and examples. Further, in the following synthesis examples and examples, "parts" means parts by weight, and "%" means reset 〇/〇. Further, each physical property value in the examples was measured by the following method. (1) Molecular weight: The weight average molecular weight was calculated by a gel permeation chromatography (Gpc) method under the following conditions. GPC various conditions Manufacturer: Shimadzu Manufacturing Bureau column: protection column SHODEX GPC LF-G LF-804 (3) Flow rate · 1·〇rni/min 49 201118134 Column temperature: 40 °C Solvent: THF (four Hydrogen furan 0) Detector: RI (differential refractive index detector) (2) Epoxy equivalent: Measured by the method described in isJis K-7236. (3) Viscosity. The measurement was carried out at h ° C using an e-type viscometer (TV-20) manufactured by Toki Sangyo Co., Ltd. Synthesis Example 1 Manufacturing step (1): (1) 3,4-epoxycyclohexyl)ethyltrimethoxyxanthene, weight average molecular 4 17 〇〇 (calcical value) 234 parts of Weiyou oil (calculated as the equivalent of the weight average molecular weight measured by Gpc), 18 parts of the methanol solution of 〇·5% potassium hydroxide (KOH) (KOH part Α η λο &amp;, the number of turns is 0·09 parts), placed in a reaction vessel, and the bath temperature was set to 75 ° C. The temperature was raised to 0 liters, the field was opened, and the dish was refluxed for 8 hours. Production step (ii): adding decyl alcohol 3 After 5 parts of drunken water, 86.4 parts of a methanol solution of 5 % by weight of distilled water was added dropwise thereto over 6 minutes, and reacted at 75 Torr for 8 hours under reflux with 4 π. After completion of the reaction, the mixture was neutralized with 5% phosphoric acid-gas, aqueous sodium sulphate solution, and then distilled under methanol at 8 ° C. Add fluorenyl isobutyl ketone (MIBKP 80 h, repeat water washing 3 times. Then, under π decompression, i 〇〇 C, there is a solvent removed) to obtain a reactive functional group (A-1) 3^. The obtained compound has an epoxy equivalent of 718 g/eq, and the M average molecular weight is 2200'. The appearance is colorless and transparent. q·Weight Synthesis Example 2

於具備授拌機、回流A L冷凝管、攪拌裝置之燒瓶中, 面實施氮氣沖洗,一面禾士 __ &lt; 1 &lt; k瓶中,_ 面添加二環癸烷二甲醇20份、曱基六 50 201118134 氫鄰苯二甲酸酐(新曰本理化(股)製造,Rikacid μη,以下 稱作酸酐(Η-1)) 100份’於40°C下反應3小時後,於70°C下 加熱攪拌1小時(藉由GPC確認三環癸烷二曱醇之消失(1面 積%以下))’藉此獲得含有多元叛酸(B_ 1)與酸針(η- 1)之硬 化劑組成物(T-1) 1 20份。所得硬化劑組成物丨)為無色液 狀樹脂,利用GPC所得之純度,多元羧酸(Bj ;下述式(7)) 為55面積% ’酸酐(H-1)為45面積%。又,官能基當量為 201 g/eq.。又’25C下之黏度為18900 mPa · s(E型黏度計)。In a flask equipped with a mixer, a refluxing AL condenser, and a stirring device, a nitrogen purge was applied to the surface, and in the flask __ &lt; 1 &lt; k bottle, 20 parts of dicyclodecane dimethanol was added to the surface of the flask. Six 50 201118134 Hydrogen phthalic anhydride (manufactured by Shinji Ryo Chemical Co., Ltd., Rikacid μη, hereinafter referred to as anhydride (Η-1)) 100 parts 'reacted at 40 ° C for 3 hours, at 70 ° C Heating and stirring for 1 hour (confirmation of disappearance of tricyclodecane decyl alcohol by GPC (1 area% or less)), thereby obtaining a hardener composition containing a plurality of polyphenolic acid (B-1) and an acid needle (η-1) (T-1) 1 20 copies. The obtained hardener composition 丨) was a colorless liquid resin, and the purity obtained by GPC was 53.% area acid anhydride (H-1) was 45 area%. Further, the functional group equivalent was 201 g/eq. The viscosity at '25C is 18900 mPa · s (E-type viscometer).

合成例3 於具備攪拌機、回流冷凝管、攪拌裝置之燒瓶中,一 面實施氮氣沖洗,一面添加2,4-二乙基戊二醇20份、酸軒 (Η-1) 1 〇〇份,於4〇°C下反應3小時後,於70°C下加熱授拌 1小時(藉由GPC確認2,4-二乙基戊二醇之消失(1面積%以 下))’藉此獲得含有多元羧酸(B-2)與酸酐(H-1)之硬化劑組 成物(T-2) 120份。所得硬化劑組成物(T-2)為無色液狀樹 脂’利用GPC所得之純度,多元羧酸(B-2 ;下述式8)為5〇 面積%,酸酐(H-1)為50面積%。又,官能基當量為2〇1 g/eq_。又,25。(:下之黏度為16200 mPa · S(E型黏度計)。 51 201118134Synthesis Example 3 In a flask equipped with a stirrer, a reflux condenser, and a stirring device, while nitrogen gas was purged, 20 parts of 2,4-diethylpentanediol and 2 parts of acid oxime (Η-1) were added thereto. After reacting at 4 ° C for 3 hours, the mixture was heated and heated at 70 ° C for 1 hour (the disappearance of 2,4-diethylpentanediol (1 area% or less) was confirmed by GPC". The hardener composition (T-2) of the carboxylic acid (B-2) and the acid anhydride (H-1) was 120 parts. The obtained hardener composition (T-2) is a colorless liquid resin 'purity obtained by GPC, the polycarboxylic acid (B-2; the following formula 8) is 5 Å area%, and the acid anhydride (H-1) is 50 area. %. Further, the functional group equivalent is 2〇1 g/eq_. Also, 25. (The viscosity below is 16200 mPa · S (E-type viscometer). 51 201118134

合成例4 製造步驟(i):將Α μ Λ ^ Μ点-(3,4-環氧環己基)乙基三曱氧基矽院 2 9 6份、重詈平泊分j β 务 卞夏1700(GPC測定值)之矽烷醇末端甲 基苯基聚碎氧油505份(碎院醇當量85〇,#出為使用Gpc 所測疋之重I平均分子量之_半)' 〇 5。錢氧化鉀(κ〇Η)甲 醇溶液40份(KOH份叙* Λ、 、 份數為〇_2份)放入反應容器中,將浴溫 β又疋為75 C ’進行升溫。升溫後,於回流下反應8小時。 製造步驟(ii):追加甲醇51〇份後,以6〇分鐘滴加5〇% 蒸顧水甲醇㈣⑽份,於回流下,於饥下反應8小時。 反應結束後’以5%磷酸二氫鈉水溶液進行中和然後於8〇 c下進#甲醇之蒸餘回收。添加曱基異丁基嗣(mibk)7〇4 份,重複水洗3次。繼而,於減壓下、i〇〇&lt;t下,對有機相 去除溶劑,藉此獲得具有反應性官能基之有機聚矽氧化合 物(Α-2)697份。所得化合物之環氧當量為598 —,重量 平均分子量為2370 ’外觀為無色透明。 合成例5 於具備攪拌機、回流冷凝管、攪拌裝置之燒瓶中,一 面實施氮氣沖洗,一面添加三環癸烷二甲醇12份、2,4_二 乙基-1,5-戊二醇18份'甲基六氫鄰笨二甲酸酐(新曰本理化 (股)製造,相當於Rikacid MH酸酐(H_1))155份、丨,3,4_環 己烷三甲酸_3,4-酐(三菱氣體化學(股)製造,Η_ΤΜΑη’,以下 52 201118134 稱作酸酐(H-2))15份’於40°C下反應3小時後,於70。(:下 加熱授拌1小時(藉由GPC確認原料醇之消失(丨面積%以 下)),藉此獲得含有多元羧酸(8_丨)(3_2)與酸酐(H_i)(H_2) 之硬化劑組成物(T-3)200份。所得硬化劑組成物(τ·3)為無 色液狀樹脂,利用GPC所得之純度,多元羧酸(Β_丨、β_2) 為52面積%,酸酐(11_丨、Η_2)為48面積%。又,官能基當 里為9〇g/eq.又,25C下之黏度為i5500mPa.s(E型黏 度計)。 合成例6Synthesis Example 4 Manufacturing step (i): Α μ Λ ^ Μ point - (3,4-epoxycyclohexyl)ethyltrimethoxy 矽 2 2 2 6 parts, heavy 詈 泊 分 j j β 卞 卞 summer 505 parts of 1700 (GPC measured value) of decyl alcohol end methylphenyl polyoxyl oil (the amount of broken alcohol is 85 〇, #出为为为为重量的重量的均均均均均的半半) 〇5. 40 parts of the potassium oxide (κ〇Η) methanol solution (KOH portion, 份, part, 〇 2 parts) was placed in a reaction vessel, and the bath temperature β was again increased to 75 C ' to raise the temperature. After the temperature was raised, the reaction was carried out under reflux for 8 hours. Production step (ii): After adding 51 parts of methanol, 5 parts by weight of methanol (4) (10 parts) was added dropwise thereto over 6 minutes, and the mixture was reacted under reflux for 8 hours under reflux. After the completion of the reaction, the mixture was neutralized with a 5% aqueous solution of sodium dihydrogen phosphate and then recovered at 8 〇 c. 7 〇 4 parts of 曱-isobutyl hydrazine (mibk) was added, and washing was repeated 3 times. Then, the solvent was removed from the organic phase under reduced pressure at &lt;t&gt;, whereby 697 parts of an organic polyfluorene oxide (?-2) having a reactive functional group was obtained. The obtained compound had an epoxy equivalent of 598 - and a weight average molecular weight of 2,370 Å. The appearance was colorless and transparent. Synthesis Example 5 In a flask equipped with a stirrer, a reflux condenser, and a stirring device, 12 parts of tricyclodecane dimethanol and 18 parts of 2,4-diethyl-1,5-pentanediol were added while performing nitrogen purge. 'Methylhexahydrophthalic anhydride (manufactured by Shinji Ryo Chemical Co., Ltd., equivalent to Rikacid MH anhydride (H_1)) 155 parts, hydrazine, 3,4-cyclohexanetricarboxylic acid _3,4-anhydride ( Manufactured by Mitsubishi Gas Chemical Co., Ltd., Η_ΤΜΑη', the following 52 201118134 is called anhydride (H-2)) 15 parts 'reacted at 40 ° C for 3 hours, at 70. (: heating was carried out for 1 hour (by GPC, the disappearance of the raw material alcohol (% by area or less) was confirmed), whereby hardening of the polycarboxylic acid (8_丨) (3_2) and the acid anhydride (H_i) (H_2) was obtained. The composition of the agent (T-3) was 200 parts. The obtained hardener composition (τ·3) was a colorless liquid resin, and the purity obtained by GPC, the polycarboxylic acid (Β_丨, β_2) was 52 area%, and the acid anhydride ( 11_丨, Η_2) is 48% by area. Further, the functional group is 9〇g/eq. Further, the viscosity at 25C is i5500mPa.s (E-type viscometer). Synthesis Example 6

製造步驟(i):將々_(3,4_環氧環己基)乙基三甲氧基矽烷 44份、重量平均分子量17〇〇(Gpc測定值)之矽烷醇末端甲 基苯基聚秒氧油153份(錢醇當量㈣,#出為使用GPC 所測定之重量平均分子量之 醇溶液11.2份(KOH份數為 浴溫設定為75°C,進行升溫 時。 一半)、0.5%氫氧化鉀(KOH)曱 〇,〇56份)放入反應容器中,將 。升溫後,於回流下反應8小 “ 步驟(il):追加甲醇157份後,以60分鐘滴加5 甲醇溶液19·3份,於回流下,於听下反應8似 反應結束後’以5%磷酸二氫鈉水溶液進行中和後,於 重丁 ^醇之蒸顧回收。添加甲基異丁基酮(MIBK)1 二重複水洗3次。繼而,於減壓下、⑽。口,對 去除溶劑,藉此獲得具有 、 .汉應性g能基之有機聚矽氧化 份,化合物之環氧當量為 千均刀子置為2100,外觀為無色透明。 53 201118134 實施例1、2 ' 3、4、比較例1 ' 2、3 使用作為環氧樹脂之合成例丨t所得之有機Μ氧化 合物(Α-1)、作為硬化劑之合成例2、3中所得之硬化劑組成 物(τ-υ、(τ-2)(有機聚矽氧(Α)與硬化劑組成物(丁_丨)、(τ·2) 之比率以官能基當量計為1: 1)、作為辞鹽及/或鋅錯合物的 磷酸之2-乙基己酯(磷酸:單酯體:二酯體:三酯體3 5 : 68.2 : 26.5 : 1_8 ’其中,由於進行三尹基矽烷基化處理,故 靈敏度不同,並非為正確之重量比。以下稱作辞鹽及/或鋅 錯合物(C-1))之鋅錯合物(碟:鋅=1 _7 : },利用ICp光發射 光譜學分析而測定,依據JIS K0166)丙二醇溶液(依據曰本 特表2003-51495號公報而製造,以下稱作、作為硬化 促進劑之四級鱗鹽(曰本化學工業製造,Hishic〇Hn P X 4 Μ P ’以下稱作觸媒(I _ 1)) '作為添加劑之癸二酸雙 (2,2,6,6-四曱基_4_哌啶基)酯(ciba Japan製造, TINUVIN770DF,以下稱作(L-1))、及作為磷系化合物之4,4,_ 亞丁基雙(3-甲基_6_三級丁基苯基-二-十三基亞磷酸 酿)(ADEKA 製造 ’ Adekastab 260,以下稱作(M-1)),以下 述表1所示之摻合比(重量份)進行摻合’進行20分鐘之消 泡’從而獲得本發明或比較用之硬化性樹脂組成物。 將所得硬化性樹脂組成物慢慢地澆鑄於試驗片用模具 中,使該澆鑄物於12〇tx3小時之預硬化後’於l50°Cxi 小時之條件下硬化,獲得各種試驗用之硬化物。對所得硬 化物,於以下所記載之條件下,對以下之硬度、熱耐久性 穿透率試驗之試驗進行評價。將結果一併示於下述表1中。 54 201118134Manufacturing step (i): 44 parts of 々_(3,4-epoxycyclohexyl)ethyltrimethoxydecane, weight average molecular weight 17 〇〇 (Gpc measured value) of decyl alcohol terminal methyl phenyl poly secoxide 153 parts of oil (money alcohol equivalent (four), #1 is an alcohol solution using a weight average molecular weight measured by GPC, 11.2 parts (the KOH fraction is 75 ° C, the temperature is raised. Half), 0.5% potassium hydroxide (KOH) 曱〇, 份 56 parts) placed in the reaction vessel, will. After the temperature was raised, the reaction was carried out under reflux for 8 hours. "Step (il): After adding 157 parts of methanol, 19 parts of 5 methanol solution was added dropwise over 60 minutes, and under reflux, after the reaction was heard, the reaction was completed. The sodium dihydrogen phosphate aqueous solution was neutralized, and then recovered by distillation of the dibutyl alcohol. The methyl isobutyl ketone (MIBK) 1 was added and washed twice with water, and then under reduced pressure, (10). The solvent is removed, thereby obtaining an organic polyfluorene oxide having an identifiable g-energy group, and the epoxy equivalent of the compound is set to 2100, and the appearance is colorless and transparent. 53 201118134 Example 1, 2 ' 3. 4. Comparative Example 1 '2, 3 The organic oxime compound (Α-1) obtained as a synthetic example of the epoxy resin, and the hardener composition obtained in Synthesis Examples 2 and 3 as a curing agent (τ- υ, (τ-2) (the ratio of organopolyoxygen (Α) to hardener composition (丁_丨), (τ·2) is 1:1 in terms of functional group equivalents), as a salt and/or 2-ethylhexyl phosphate of zinc complex (phosphoric acid: monoester: diester: triester 3 5 : 68.2 : 26.5 : 1_8 ' The basic treatment, so the sensitivity is different, not the correct weight ratio. Hereinafter referred to as the salt complex and / or zinc complex (C-1) zinc complex (disc: zinc = 1 _7: }, using ICp It is determined by light emission spectroscopy and is produced according to JIS K0166) propylene glycol solution (manufactured according to 曰本特表 2003-51495, hereinafter referred to as a four-stage scale salt as a hardening accelerator (manufactured by Sakamoto Chemical Industry, Hishic〇) Hn PX 4 Μ P 'hereinafter referred to as catalyst (I _ 1)) 'As an additive, bis(2,2,6,6-tetradecyl_4_piperidinyl) sebacate (manufactured by ciba Japan, TINUVIN770DF, hereinafter referred to as (L-1)), and 4,4,_butylidene bis(3-methyl-6-tris-butylphenyl-di-tridecylphosphoric acid) as a phosphorus compound (ADEKA manufactured 'Adekastab 260, hereinafter referred to as (M-1)), and blended with the blending ratio (parts by weight) shown in Table 1 below for '20 minutes of defoaming' to obtain the present invention or comparative use thereof. A curable resin composition. The obtained curable resin composition was slowly cast in a test piece mold, and the cast material was pre-hardened at 12 〇t x 3 hours. The hardened material for various tests was obtained under the conditions of l50 ° Cxi, and the obtained cured product was evaluated for the following hardness and thermal durability transmittance test under the conditions described below. And shown in Table 1 below. 54 201118134

(硬度) 蕭氏A 依據JIS K 7215「塑膠之硬度計硬度試驗方法」而進行 測定。 (熱耐久性穿透率試驗) 耐熱試驗條件:於i 50烘箱中放置%小時 試驗片尺寸:厚度1 mm 評價條件:利用分光光度計測定4〇〇 mm之穿透率,算 出其變化率(保持率)。 (LED點亮試驗) 進而’對實施例及比較例中所得之硬化性樹脂組成物 實施20分鐘之真空消泡後,將其填充於注射器中,使用精 密喷出裝置,將其澆鑄於搭載有具有發光波長465 nm之發 光元件的表面安裝型LED中。其後,使其於特定之硬化條 件(於11(TC下2小時,然後於i50°C下3小時)下硬化,藉 此獲得點亮試驗用LED。點亮試驗係進行規定電流之加伴 即60 mA(定電流驅動’規定電流30 mA)下之點亮試驗,而 測定初始照度。 55 201118134 [表i] 項目 實施例1 實施例2 比較例1 組 成 環氧樹脂 有機聚矽氧 A-1 10.0 10.0 10.0 硬化劑 硬化劑組成物 T-1 2.8 2.8 2.8 T-2 硬化促進劑 鋅鹽(辞錯合物) C-1 0.01 0.03 四級鏞鹽 1-1 0.01 添加劑 光穩定劑 L-1 0.03 0.03 0.03 磷系化合物 M-1 0.03 0.03 0.03 硬 化 物 性 硬度試驗 蕭氏A 97 97 98 熱耐久性穿透率試驗 保持率(400 nm) % 98.3% 98.6% 97.7% LED點免試驗 初始照度 mW 9577 9597 8183 項目 實施例3 比較例2 組 成 環氧樹脂 有機聚矽氧 A-1 10.0 10.0 硬化劑 硬化劑組成物 T-1 T-2 2.8 2.8 硬化促進劑 鋅鹽(鋅錯合物) C-1 0.03 四級磷鹽 1-1 0.03 添加劑 光穩定劑 L-1 磷系化合物 M-1 硬 化 物 性 硬度試驗 蕭氏A 90 90 熱耐久性穿透率試驗 保持率(400 nm) % 95.1% 82.1% LED點免試驗 初始照度 mW 7737 4993 項目 實施例4 比較例3 組 成 環氧樹脂 有機聚矽氧 A-1 10.0 10.0 硬化劑 硬化劑組成物 T-1 T-2 2.8 2.8 硬化促進劑 鋅鹽(鋅錯合物) C-1 0.01 四級鐫鹽 1-1 0.01 添加劑 光穩定劑 L-1 0.05 0.05 磷系化合物 M-1 0.05 0.05 硬 化 物 性 硬度試驗 蕭氏A 93 92 熱耐久性穿透率試驗 保持率(400 nm) % 97.5% 95.3% LED點党试驗 初始照度 mW 9037 9030 56 201118134 實施例5、6、比較例4 人使用作為環氧樹脂之合成例2中所得之有機聚石夕氧化 合物(A-2)、作為硬化劑之合錢2中所得之硬化劑組成物 (T-1)(有機聚矽氧(A)與硬化劑組成物(τ_ι)之比率以官能美 當量計為1 : 0.8)、作為硬化促進劑之鋅鹽及/或辞錯合物 (C-1)、觸媒(1])、添加劑化丨),。,卩下述表2所示之摻 合比(重量份)進行摻合,進行2〇分鐘之消泡,從而獲得本 發明或比較用之硬化性樹脂組成物。 將所得硬化性樹脂組成物慢慢地澆鑄於試驗片用 中’使該洗鑄物於12(TCx3小時之預硬化後,於⑼ 小時之條件下硬化,獲得各種試驗用之硬化物。 之硬化物,於以下所記載之條# 、 軌之保件下對以下之耐熱特性試 ”、硬度、穿透率試驗之試驗進行評價。將結果 下述表2中。 (财熱特性試驗) 測定條件 DMA-2980 動態黏彈性測定. Τ Λ . + β I工叫 · lA_lnstruments 製造 測定溫度範圍:· 3 〇。〇〜2 8 〇 t 升溫速度:2°C/分鐘 mm者(厚度約800 試驗片尺寸:使用切割成5 mmx50 // m)。 分析條件(Hardness) The Shore A was measured in accordance with JIS K 7215 "Test Method for Hardness of Plastic Durometer". (Thermal durability penetration test) Heat resistance test conditions: % hour in the i 50 oven. Test piece size: thickness 1 mm Evaluation conditions: The transmittance of 4 〇〇mm was measured by a spectrophotometer, and the rate of change was calculated ( Retention rate). (LED lighting test) Further, the curable resin composition obtained in the examples and the comparative examples was subjected to vacuum defoaming for 20 minutes, and then filled in a syringe, and cast using a precision discharge device. A surface mount type LED having a light emitting element having an emission wavelength of 465 nm. Thereafter, it was cured under specific hardening conditions (2 hours at TC (2 hours at TC, then 3 hours at i50 °C) to obtain an LED for lighting test. The lighting test was performed with a predetermined current. That is, the lighting test under 60 mA (fixed current drive 'specified current 30 mA) was measured, and the initial illuminance was measured. 55 201118134 [Table i] Item Example 1 Example 2 Comparative Example 1 Composition of epoxy resin organopolyoxyl A- 1 10.0 10.0 10.0 Hardener hardener composition T-1 2.8 2.8 2.8 T-2 Hardening accelerator zinc salt (complex) C-1 0.01 0.03 Grade IV salt 1-1 0.01 Additive light stabilizer L-1 0.03 0.03 0.03 Phosphorus compound M-1 0.03 0.03 0.03 Hardened physical hardness test Xiao A 97 97 98 Thermal durability penetration test retention (400 nm) % 98.3% 98.6% 97.7% LED spot test initial illumination mW 9577 9597 8183 Item Example 3 Comparative Example 2 Composition Epoxy Resin Organic Polyoxo A-1 10.0 10.0 Hardener Hardener Composition T-1 T-2 2.8 2.8 Hardening Accelerator Zinc Salt (Zinc Complex) C-1 0.03 Quaternary Phosphate 1-1 0.03 Additive Light Stabilizer L-1 Phosphorous compound M-1 Hardening physical hardness test Xiao A 90 90 Thermal durability penetration test retention (400 nm) % 95.1% 82.1% LED spot test initial illuminance mW 7737 4993 Item Example 4 Comparative Example 3 Composition Epoxy Resin Organic Polyoxygen A-1 10.0 10.0 Hardener Hardener Composition T-1 T-2 2.8 2.8 Hardening Accelerator Zinc Salt (Zinc Complex) C-1 0.01 Grade IV Salt 1-1 0.01 Additive Light stabilizer L-1 0.05 0.05 Phosphorus compound M-1 0.05 0.05 Hardened physical hardness test Xiao A 93 92 Thermal durability penetration test retention (400 nm) % 97.5% 95.3% LED dot test initial illumination mW 9037 9030 56 201118134 Examples 5, 6 and Comparative Example 4 The organic polyphosphate compound (A-2) obtained in Synthesis Example 2 as an epoxy resin and the hardened rubber 2 obtained as a curing agent were used. Composition (T-1) (the ratio of organopolyoxane (A) to hardener composition (τ_ι) is 1:0.8 in functional US equivalent), zinc salt as a hardening accelerator, and/or dysfunctional (C-1), catalyst (1), additive 丨). The blending ratio (parts by weight) shown in the following Table 2 was blended, and defoaming was carried out for 2 minutes to obtain a curable resin composition of the present invention or comparatively. The obtained curable resin composition was slowly cast into a test piece. The molded product was hardened under conditions of (9) hours after pre-hardening of TCx for 3 hours, and hardened materials for various tests were obtained. The test of the following heat resistance test, hardness, and penetration test was carried out under the article # and the rail under the article described below. The results are shown in Table 2 below. (Fuel and heat characteristics test) Measurement conditions DMA-2980 Dynamic Viscoelasticity Measurement. Τ Λ . + β I Job · lA_lnstruments Manufacturing Measurement Temperature Range: · 3 〇.〇~2 8 〇t Heating rate: 2°C/min mm (thickness about 800 test piece size) : Use to cut into 5 mmx50 // m). Analysis conditions

Tg :將DMA測定下之Tan_ 5之波峰點作為^ 30。(:彈性模數:敎3〇t時之彈性模數。Tg: The peak point of Tan_5 under DMA measurement is taken as ^30. (: Elastic modulus: elastic modulus at 敎3〇t.

57 201118134 (硬度試驗)57 201118134 (hardness test)

蕭氏A 依據JIS K 7215「塑膠之硬度計硬度試驗方法」進行測 定0 (穿透率試驗) 試驗片尺寸:厚度1 mm 评價條件:利用分光光度計測定4〇〇 ηιη之穿透率。 進而,使用所得之硬化性樹脂組成物’將其填充至注 射器中,使用精密噴出裝置,將其洗鑄於搭載有中心發光 波465 nm之晶片的外徑5 mm見方之表面安裝型led封裝 體(内徑4 mm,外壁高度丨25 mm)中。將該澆鑄物投入至 加熱爐中,於12〇。(:下進行i小時之硬化處理,進而於15〇 C下進行3小時之硬化處理,從而製成[ED封裝體。於下 述條件下’將LED封裝體放置於腐蝕性氣體中,觀察密封 内部經链銀之導線架部之顏色變化(腐蝕氣體穿透性試 驗)。將結果一併示於表2中。 (腐蝕氣體穿透性試驗) 測定條件 腐姓氣體:硫化銨20%水溶液(於硫成分與銀反應之情 形時變黑) 接觸方法:於廣口玻璃瓶中,使硫化銨水溶液之容器 -、上it LED封裝體混合存在,蓋上廣口玻璃槪,於密閉狀 況下’使揮發之硫化銨氣體與Led封裝體接觸/曝露。 腐餘之判定:觀察LED封裝體内部之導線架變黑(稱作 58 201118134 黑化)之時間’該變色時間越長,判斷耐腐蝕氣體性越優里 觀察係於丨小時後、2小時後、3小時後、4小時後取出進 行確認,評價係將無變色者視為〇,#色〜褐色者視為X, 完全黑化者視為XX。 [表2] 組成 | 硬化物性Xiao's A was measured according to JIS K 7215 "Testing method for hardness of plastic durometer". 0 (Permeability test) Test piece size: Thickness 1 mm Evaluation conditions: The transmittance of 4 〇〇 ηιη was measured by a spectrophotometer. Further, the obtained curable resin composition was filled in a syringe, and the surface mount type LED package having an outer diameter of 5 mm square, which was mounted on a wafer having a central light-emitting wave of 465 nm, was molded by a precision discharge device. (inner diameter 4 mm, outer wall height 丨 25 mm). The cast was placed in a heating furnace at 12 Torr. (: The hardening treatment was performed for 1 hour, and further hardening treatment was performed at 15 ° C for 3 hours to prepare an [ED package. The LED package was placed in a corrosive gas under the following conditions, and the seal was observed. The color change of the lead frame of the internal silver chain (corrosion gas permeability test). The results are shown together in Table 2. (Corrosion gas permeability test) Determination of the condition of the gas: ammonium sulfide 20% aqueous solution ( When the sulfur component reacts with silver, it turns black. Contact method: In a wide-mouth glass bottle, the container of the ammonium sulfide aqueous solution and the upper LED package are mixed and covered with a wide-mouth glass crucible in a sealed state. The volatilized ammonium sulfide gas is brought into contact with/exposed to the Led package. Judgment of the corrosion: Observing the blackening of the lead frame inside the LED package (referred to as 58 201118134 blackening) 'The longer the discoloration time, the corrosion-resistant gas is judged The more excellent the observation system was taken out after 丨 hours, 2 hours, 3 hours, and 4 hours later, the evaluation was regarded as 〇 without color change, and the color of brown to brown was regarded as X, and those who were completely blackened were regarded as XX. [Table 2] Composition | Hardening properties

J知,本發明之硬/ 曰’’且'物耐熱著色性(耐熱穿透率試驗)優異,且 效率良好之硬化物(LED點亮試驗),並且光學彳 施例5、6、比較例4可知,本發明之硬幻 二成:提供一種耐透氣性優異之硬化物(腐敍氣體穿$ ^要如對外部環境脆弱之半導體晶片或[心 干特性的領域中有用。 59 201118134 實施例7-1 2、比較例5〜9 使用作為環氧樹脂之合成例丨、4、6中所得之有機聚 矽氧化合物(A-l) ' (A-2) ' (A-3),作為硬化劑之合成例2、 3中所得之硬化劑組成物(T_丨)、(T_2)(有機聚矽氧(a)與硬化 劑組成物(T-丨)或(T_2)之比率以官能基當量計為丨·· 〇 8),酸 酐(Η-1)(有機聚矽氧(Α)與酸酐(Η-1)之比率以官能基當量計 為1 : 〇.8),作為鋅鹽及/或鋅錯合物之2_乙基己酸鋅(c_2)、 十一烯酸鋅(C-3)、2-乙基己酸鋅(含有咪唑化合物,幻%J is a hardened material (LED lighting test) which is excellent in heat-resistant coloring property (heat-resistant transmittance test) of the present invention and which is excellent in heat resistance (LED lighting test), and optical examples 5, 6, and comparative examples. 4 It is understood that the hard twitch of the present invention provides a hardened material excellent in gas permeability (the gas permeable gas is to be used as a semiconductor wafer which is weak to the external environment or [in the field of heart-drying characteristics. 59 201118134 Example) 7-1 2. Comparative Examples 5 to 9 The organic polyoxosiloxane (Al) '(A-2) ' (A-3) obtained as a synthetic example of an epoxy resin, 4, 6 was used as a hardener. The ratio of the hardener composition (T_丨), (T_2) (organic polyfluorene oxide (a) to the hardener composition (T-丨) or (T_2) obtained in Synthesis Examples 2 and 3 is equivalent to the functional group. Calculated as 丨·· 〇8), the anhydride (Η-1) (the ratio of organopolyfluorene (Α) to anhydride (Η-1) is 1: 〇.8 in terms of functional group equivalent), as zinc salt and / Or zinc complex compound of zinc 2-ethylhexanoate (c_2), zinc undecylenate (C-3), zinc 2-ethylhexanoate (containing imidazole compound, magic %)

Industry製造,χκ_614,以下稱作(c_4)),作為硬化促進劑 之四級鱗鹽(日本化學工業製造,Hishic〇Hn ρχ·4Ετ,以下 稱作觸媒(1-2))、咪唑化合物(四國化成製造,2Ε4ΜΖ,以下 稱作觸媒(1-3)),作為添加劑之癸二酸雙(2,2,6,6四甲基 哌啶基)酯(Ciba japan製造,TINUVIN77〇DF,以下稱作 ^ ))以下述表所示之摻合比(重量份)進行#合,進 一 刀在里之'肖/包’從而獲得本發明或比較用之硬化性樹脂 組成物。 將所彳于之硬化性樹脂組成物慢慢地澆鑄於試驗片用模Manufactured by Industry, χκ_614, hereinafter referred to as (c_4)), a quaternary scale salt as a hardening accelerator (manufactured by Nippon Chemical Industry, Hishic 〇Hn ρχ·4Ετ, hereinafter referred to as catalyst (1-2)), an imidazole compound ( Manufactured by Shikoku Kasei, 2Ε4ΜΖ, hereinafter referred to as catalyst (1-3)), as an additive, bis(2,2,6,6-tetramethylpiperidyl) sebacate (manufactured by Ciba japan, TINUVIN77〇DF In the following, it is called "^)), and the blending ratio (parts by weight) shown in the following table is carried out, and the "Shaw/Pack" in the inside is obtained to obtain the curable resin composition of the present invention or comparatively. The curable resin composition to be poured is slowly cast into the test piece mold

中,使遠澆鑄物於i 1(rc χ3小時之預硬化後,於14〇。〇X 夺之條件下硬化’獲得各種試驗用之硬化物。對於所得 之硬化物’進行腐飯氣體穿透性試驗(關於試驗方法等,除 了將觀察設為1小時後' 2小時後、3小時後、6小時後、 10】時後以外,與上述相同)。將結果一併示於下述表3、4 中。 201118134 [表3]In the case of i 1 (r χ 3 hr pre-hardening, hardening under 14 〇 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得 获得The test (the same as the above) except for the test method and the like, except that after 2 hours, 3 hours, 3 hours, and 10 hours after the observation, the results are shown in Table 3 below. , 4 in. 201118134 [Table 3]

項目 實施例7 實施例8 實施例9 比較例5 比較例6 比較例7 組 成 環氧樹脂 有機聚矽氧 A-1 7.1 7.1 7.1 7.1 7.1 7.1 有機聚矽氧 A-2 有機聚矽氧 A-3 硬化劑 硬化劑組成物 T-1 1.6 1.6 硬化劑,组成物 T-2 1.6 1.6 1.6 1.6 酸酐 H-1 鋅鹽(鋅錯合物) C-2 0.07 C-3 0.07 C-4 0.07 硬化促進劑 四級鎮鹽 1-2 0.07 咪唑化合物 1-3 0.07 添加劑 光穩定劑 L-1 0.01 0.01 0.01 0.01 0.01 0.01 硬 化 ^勿 性 腐蝕氣體穿透性試驗 曝露時間 1 h 〇 〇 〇 〇 〇 〇 2h 〇 〇 〇 〇 〇 〇 3h 〇 〇 〇 〇 〇 〇 6h 〇 〇 〇 X X X lOh 〇 〇 〇 XX XX XXItem Example 7 Example 8 Example 9 Comparative Example 5 Comparative Example 6 Comparative Example 7 Composition Epoxy Resin Organic Polyoxo A-1 7.1 7.1 7.1 7.1 7.1 7.1 Organic Polyoxo A-2 Organic Polyoxo A-3 Hardener hardener composition T-1 1.6 1.6 Hardener, composition T-2 1.6 1.6 1.6 1.6 Anhydride H-1 Zinc salt (zinc complex) C-2 0.07 C-3 0.07 C-4 0.07 Hardening accelerator Grade 4 salt 1-2 0.07 Imidazole compound 1-3 0.07 Additive light stabilizer L-1 0.01 0.01 0.01 0.01 0.01 0.01 Hardening ^Do not corrosive gas penetration test exposure time 1 h 〇〇〇〇〇〇2h 〇〇 〇〇〇〇3h 〇〇〇〇〇〇6h 〇〇〇XXX lOh 〇〇〇XX XX XX

[表4][Table 4]

項目 實施例10 實施例11 實施例12 比較例8 比較例9 組 成 環氧樹脂 有機聚矽氧 A-1 有機聚矽氧 A-2 6.0 6.0 6.0 6.0 有機聚矽氧 A-3 10.2 硬化劑 硬化劑組成物 T-1 1.6 1.6 1.6 硬化劑組成物 T-2 酸酐 H-1 1.3 1.3 鋅鹽(鋅錯合物) C-2 0.06 C-3 0.06 0.06 C-4 硬化促進劑 四級鱗鹽 1-2 0.06 0.06 咪。坐化合物 1-3 添加劑 光穩定劑 L-1 硬 化 物 性 腐蝕氣體穿透性試驗 曝露時間 1 h 〇 〇 〇 〇 〇 2h 〇 〇 〇 〇 X 3h 〇 〇 〇 〇 X 6h 〇 〇 〇 X XX lOh 〇 〇 X XX XX 61 201118134 實施例1 3、14 一使用作為環氧樹脂之合成例ό中所得之有機聚矽氧化 合物(Α_3) ’作為硬化劑之合成例5中所得之硬化劑組成物 (Τ-3)(有機聚矽氧(Α)與硬化劑組成物(τ_3)之比 舍番i 干M s忐基 田t為1 : 〇.8),鋅鹽及/或鋅錯合物(C-1)、(c_2),作、 添加劑之文阻胺化合物(Adeka製造,LA_8丨, 从卜稱作 (L·2))、磷化合物(Adeka製造,Adeka 260,以下稱作(L_3)), 以下述表5所示之摻合比(重量份)進行摻合,進行分鐘 之消泡,從而獲得本發明之硬化性樹脂組成物。 里 (腐银氣體穿透性試驗) 將所知·之硬化性樹脂組成物慢慢地澆鑄於試驗片用模 具中’使該澆鑄物於12(rCxl小時之預硬化後,於15〇它^ 3 j時之條件下硬化,獲得各種試驗用之硬化物。對於所得 之更化物進行腐姓氣體穿透性試驗(關於試驗方法等,與 上述相同)。將結果一併示於下述表5中。 /、 (L E D點党試驗) 將所得之硬化性樹脂組成物填充於注射器中,使用精 岔喷出裝置,將其澆鑄於搭載有具有發光波長465 之發 光元件的表面安裝型LED(SMD型,5 _φ,規定電流2〇 mA)。其後,於特定之硬化條件(於i 2〇它下^小時,進而於 15〇°C下3小時)進行硬化,藉此獲得點亮試驗用led。點亮 試驗係進行大幅超出規定電流即2〇 mAi 23〇 mA之電流下 之點亮試驗。詳細條件示於下述。測定項目,係使用積分 球測定40小時點亮前後之照度,算出試驗用㈣之照度之 62 201118134 曹 保持率。將結果示於表5中。 點1^詳細條件 發光波長:中心發光波長,465 nm 驅動方式:定電流方式,以230 mA(發光元件規定電流 為20 mA)串聯同時點亮3個 驅動環境:25°C,65%濕熱機内之點亮 評價:分別測定20小時、40小時後之照度及其照度保 持率。 [表5] 項目 實施例13 實施例14 環氧樹脂 有機聚矽氧 A-3 10.2 10.2 硬化劑 硬化劑組成物 T-3 1.5 1.5 鋅鹽(鋅錯合物) C-1 0.05 C-2 0.03 添加劑 光穩定劑 L-2 0.02 0.02 礙化合物 L-3 0.02 0.02 主1 # t fp| i w 腐蝕氣體穿透性試驗 曝露時間 10h 〇 〇 點亮試驗(230 mA) 照度(# W)/照度保持率(%) 0 h(ref) 9900 9900 20 h 9950 10100 100% 102% 40 h 8400 10200 85% 103% 雖參照特定態樣,對本發明進行了詳細說明,但對於 本從業人員而言,可明白能夠不脫離本發明之精神與範圍 而進行各種變更及修正。 再者,本申請案係基於2009年11月30曰申請之曰本 專利申請(特願2009-271469),其整體係藉由引用而援用。 又,此處所引用之所有參照係作為整體而併入。 63 201118134 【圖式簡單說明】 無 【主要元件符號說明】 Μ # »»&gt; 64Item Example 10 Example 11 Example 12 Comparative Example 8 Comparative Example 9 Composition Epoxy Resin Organic Polyoxo A-1 Organic Polyoxo A-2 6.0 6.0 6.0 6.0 Organic Polyoxo A-3 10.2 Hardener Hardener Composition T-1 1.6 1.6 1.6 Hardener Composition T-2 Anhydride H-1 1.3 1.3 Zinc Salt (Zinc Complex) C-2 0.06 C-3 0.06 0.06 C-4 Hardening Accelerator Grade IV Scale Salt 1- 2 0.06 0.06 mic. Sitting compound 1-3 additive light stabilizer L-1 hardening physical corrosion gas permeability test exposure time 1 h 〇〇〇〇〇2h 〇〇〇〇X 3h 〇〇〇〇X 6h 〇〇〇X XX lOh 〇〇 X XX XX 61 201118134 Example 1 3, 14 A synthetic polysiloxane compound (Α_3) obtained as a curing agent, a hardener composition obtained in Synthesis Example 5 as a curing agent (Τ- 3) (Comparative ratio of organopolyfluorene (Α) to hardener composition (τ_3) 舍番i dry M s忐基田t is 1: 〇.8), zinc salt and / or zinc complex (C- 1), (c_2), an additive, a hindered amine compound (manufactured by Adeka, LA_8丨, referred to as (L·2)), a phosphorus compound (manufactured by Adeka, Adeka 260, hereinafter referred to as (L_3)), The blending ratio (parts by weight) shown in the following Table 5 was blended, and defoaming was performed for several minutes to obtain a curable resin composition of the present invention. (the sulphur gas gas permeability test) The known curable resin composition is slowly cast into the test piece mold. 'The cast material is made at 12 (rCxl hour pre-hardening, 15 〇 it ^ It is hardened under the conditions of 3 j to obtain various hardened materials for the test. The gasification test of the gasification of the obtained compound is carried out (the test method and the like are the same as above). The results are shown together in Table 5 below. /. (LED dot test) The obtained curable resin composition was filled in a syringe, and cast into a surface mount type LED (SMD) equipped with a light-emitting element having an emission wavelength of 465 using a fine squirting device. Type, 5 _φ, specified current 2 〇 mA). Thereafter, it is hardened under specific hardening conditions (i 2 〇 under it for 2 hours and further at 15 ° C for 3 hours), thereby obtaining a lighting test. Led. The lighting test is performed on a lighting test that greatly exceeds the current of 2 mAi at 23 mA. The detailed conditions are shown below. The measurement items are measured by using an integrating sphere to measure the illuminance before and after lighting for 40 hours. Illumination for test (4) 62 2011 18134 Cao retention rate. The results are shown in Table 5. Point 1^ Detailed conditions Luminescence wavelength: Center emission wavelength, 465 nm Drive mode: Constant current mode, 230 mA (20 mA specified current of the illuminating element) Three driving environments: 25 ° C, lighting evaluation in a 65% damp heat machine: The illuminance after 20 hours and 40 hours and the illuminance retention rate were measured. [Table 5] Item Example 13 Example 14 Epoxy resin organic polymerization Neodymium A-3 10.2 10.2 Hardener Hardener Composition T-3 1.5 1.5 Zinc Salt (Zinc Complex) C-1 0.05 C-2 0.03 Additive Light Stabilizer L-2 0.02 0.02 Obstruction Compound L-3 0.02 0.02 Main 1 # t fp| iw Corrosion gas penetration test exposure time 10h 〇〇 lighting test (230 mA) illuminance (# W) / illuminance retention rate (%) 0 h (ref) 9900 9900 20 h 9950 10100 100% 102% 40 h 8400 10200 85% 103% The present invention has been described in detail with reference to the specific embodiments thereof, and it is understood that various changes and modifications can be made without departing from the spirit and scope of the invention. The application is based on November 30, 2009. Please refer to this patent application (Japanese Patent Application No. 2009-271469), the entire disclosure of which is incorporated herein by reference. Explanation of symbols] Μ # »»&gt; 64

Claims (1)

201118134 七、申請專利範圍: 1. 種硬化性樹脂組成物,其係以有機聚矽氧(A)、斑 鋅鹽及/或鋅錯合物(c)為必需成分, 、 其中,有機聚矽氧(A)滿足以下條件, 有機聚矽氧(A): ”;”刀子中具有環氧丙基(glycidyl group)及/或環 氧環己基之環氧樹脂。 2. 如申5青專利範圍第1項之硬化性樹脂組成物,其中, 辞鹽及/或鋅錯合物(c)為選自由選自鱗酸醋及構酸中之^種 以上之I之鋅鹽、與含有該酸及該鋅鹽作為配位基之鋅錯 合物所組成之群中之至少1種。 曰 3. 如申請專利範圍第i項之硬化性樹脂組成物,其中, 鋅鹽及/或鋅錯合物(c)係選自由碳數1〜之羧酸之鋅鹽、 與a有忒酸及鋅鹽作為配位基之鋅錯合物所組成之群中之 至少1種。 4. 如申請專利範圍第1至3項中任一項之硬化性樹脂組 成物,其含有具有2個以上之羧基,且以脂肪族烴基為主 骨架之多元羧酸(B)。 5. 如申請專利範圍第4項之硬化性樹脂組成物,其中, 。亥夕元羧酸(B)係藉由碳數5以上之2〜6官能之多元醇與飽 和脂肪族環狀酸酐之反應而獲得之化合物。 6. 如申請專利範圍第1至5項中任一項之硬化性樹脂組 成物,其含有酸酐。 7. 如申請專利範圍第丨至6項中任一項之硬化性樹脂組 65 201118134 成物,其含有受阻胺系光穩定劑及/或含磷抗氧化劑。 8. —種硬化物,其係將申請專利範圍第1至7項中任一 項之硬化性樹脂組成物加以硬化而成。 八、圖式· (無) 66201118134 VII. Patent application scope: 1. A kind of hardening resin composition, which is composed of organic polyoxygen (A), zinc salt and/or zinc complex (c), among which, organic polyfluorene Oxygen (A) satisfies the following conditions: Organic polyfluorene (A): ";" An epoxy resin having a glycidyl group and/or an epoxycyclohexyl group in the knife. 2. The curable resin composition of claim 1, wherein the salt and/or the zinc complex (c) is one selected from the group consisting of lactic acid and phytic acid. At least one of the group consisting of a zinc salt and a zinc complex containing the acid and the zinc salt as a ligand.曰3. The curable resin composition of claim i, wherein the zinc salt and/or the zinc complex (c) is selected from the group consisting of a zinc salt of a carboxylic acid having a carbon number of 1 to a tannic acid with a And at least one of the group consisting of a zinc complex as a zinc complex of a ligand. 4. The curable resin composition according to any one of claims 1 to 3, which contains a polyvalent carboxylic acid (B) having two or more carboxyl groups and having an aliphatic hydrocarbon group as a main skeleton. 5. A curable resin composition as claimed in claim 4, wherein. The carboxylic acid (B) is a compound obtained by a reaction of a 2 to 6-functional polyol having a carbon number of 5 or more and a saturated aliphatic cyclic acid anhydride. 6. The curable resin composition according to any one of claims 1 to 5, which contains an acid anhydride. 7. The curable resin group 65 201118134 according to any one of claims 6 to 6, which contains a hindered amine light stabilizer and/or a phosphorus-containing antioxidant. A hardened material obtained by hardening a curable resin composition according to any one of claims 1 to 7. Eight, schema · (none) 66
TW099119049A 2009-11-30 2010-06-11 Hardened resin composition and hardened product thereof TWI485202B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009271469 2009-11-30

Publications (2)

Publication Number Publication Date
TW201118134A true TW201118134A (en) 2011-06-01
TWI485202B TWI485202B (en) 2015-05-21

Family

ID=44066147

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099119049A TWI485202B (en) 2009-11-30 2010-06-11 Hardened resin composition and hardened product thereof

Country Status (6)

Country Link
JP (1) JP5433705B2 (en)
KR (1) KR20120114237A (en)
CN (1) CN102639590B (en)
SG (1) SG181122A1 (en)
TW (1) TWI485202B (en)
WO (1) WO2011065044A1 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5700618B2 (en) * 2009-11-30 2015-04-15 日本化薬株式会社 Epoxy resin composition, curable resin composition
JP5300148B2 (en) * 2009-11-30 2013-09-25 日本化薬株式会社 Epoxy resin composition, curable resin composition
JP5626856B2 (en) * 2010-06-11 2014-11-19 日本化薬株式会社 Curable resin composition and cured product thereof
JP5472924B2 (en) * 2010-10-21 2014-04-16 日本化薬株式会社 Curable resin composition and cured product thereof
CN104871040B (en) * 2012-12-20 2020-02-21 飞利浦照明控股有限公司 Protective composition
JP5736524B1 (en) * 2013-08-01 2015-06-17 株式会社ダイセル Curable resin composition and semiconductor device using the same
CN104583325B (en) * 2013-08-02 2016-11-09 株式会社大赛璐 Hardening resin composition and use its semiconductor device
WO2015019767A1 (en) * 2013-08-06 2015-02-12 株式会社ダイセル Curing resin composition and semiconductor device employing same
JP6404110B2 (en) * 2014-12-18 2018-10-10 信越化学工業株式会社 Epoxy resin containing silicone-modified epoxy resin and polyvalent carboxylic acid compound and cured product thereof

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3016103A1 (en) * 1980-04-25 1981-10-29 Siemens AG, 1000 Berlin und 8000 München METHOD FOR PRODUCING TRANSPARENT GOAT RESINS
JPH0736451B2 (en) * 1983-03-31 1995-04-19 日東電工株式会社 Light emitting element or light receiving element sealed body
JPS6377929A (en) * 1986-09-19 1988-04-08 Fujitsu Ltd Epoxy resin composition for transfer molding
JPH02233763A (en) * 1989-03-08 1990-09-17 Toshiba Silicone Co Ltd Polyorganosiloxane composition for surface treatment
JPH05226700A (en) * 1992-02-12 1993-09-03 Hitachi Chem Co Ltd Epoxy resin composition for sealing light emitting diode and light emitting diode sealed with same
US6632892B2 (en) * 2001-08-21 2003-10-14 General Electric Company Composition comprising silicone epoxy resin, hydroxyl compound, anhydride and curing catalyst
JP2004292706A (en) * 2003-03-27 2004-10-21 Nof Corp Optical semiconductor sealing epoxy resin composition, and optical semiconductor device
JP4831992B2 (en) * 2005-04-08 2011-12-07 ヘンケルエイブルスティックジャパン株式会社 Translucent resin composition
JP5300148B2 (en) * 2009-11-30 2013-09-25 日本化薬株式会社 Epoxy resin composition, curable resin composition

Also Published As

Publication number Publication date
JP5433705B2 (en) 2014-03-05
WO2011065044A1 (en) 2011-06-03
KR20120114237A (en) 2012-10-16
CN102639590B (en) 2015-06-24
SG181122A1 (en) 2012-07-30
JPWO2011065044A1 (en) 2013-04-11
CN102639590A (en) 2012-08-15
TWI485202B (en) 2015-05-21

Similar Documents

Publication Publication Date Title
TWI538959B (en) Hardened resin composition and hardened product thereof
TW201118134A (en) Curable resin composition and cured product thereof
JP5730852B2 (en) Method for producing organopolysiloxane, organopolysiloxane obtained by the production method, and composition containing the organopolysiloxane
TWI504628B (en) Hardened resin composition and hardened product thereof
TWI494376B (en) A hardened resin composition for light semiconductors and a hardened product thereof
TWI564318B (en) Epoxy resin composition
JP6143359B2 (en) Silicone-modified epoxy resin and composition thereof
JP5561778B2 (en) Curable resin composition and cured product thereof
JP5472924B2 (en) Curable resin composition and cured product thereof
JP5300148B2 (en) Epoxy resin composition, curable resin composition
JP5700618B2 (en) Epoxy resin composition, curable resin composition
JP5519685B2 (en) Curable resin composition and cured product thereof
JP2014237861A (en) Epoxy resin composition and curable resin composition
JP5832601B2 (en) Curable resin composition and cured product thereof
JP2017031247A (en) Curable resin composition containing sulfur-based antioxidant, epoxy resin composition and cured article thereof

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees