TW201114502A - Liquid supplying system, liquid supplying method, and coating apparatus - Google Patents

Liquid supplying system, liquid supplying method, and coating apparatus Download PDF

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Publication number
TW201114502A
TW201114502A TW099112859A TW99112859A TW201114502A TW 201114502 A TW201114502 A TW 201114502A TW 099112859 A TW099112859 A TW 099112859A TW 99112859 A TW99112859 A TW 99112859A TW 201114502 A TW201114502 A TW 201114502A
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Taiwan
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liquid
container
flow path
coating
pressure
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TW099112859A
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Chinese (zh)
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TWI523699B (en
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Tadashi Furukawa
Akihiko Igarashi
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Dainippon Printing Co Ltd
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
    • H01L21/02318—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment
    • H01L21/02343—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment treatment by exposure to a liquid

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

A liquid supplying system (1) for supplying chemical to a coating part (120) of a coating apparatus (100) comprises a buffer tank (3) for containing chemical, a pipe line (5-1), a pipe line (5-2) connecting to a buffer tank (3) for supplying chemical to a buffer tank (3), a pipe line (5-4) connecting to a buffer tank (3) for supplying pressuring gas to a buffer tank (3), and a pipe line (5-5) connecting to a buffer tank (3) and a coating part (120) such as discharging part (13), application nozzles (14), for supplying liquid to a coating part (120) from a buffer tank (3). A pipe line (5-1) and a pipe line (5-2) is able to connect to a resin container (17) removably. A pipe line (5-1) is able to supply gas to a resin container (17) which is connected to a pipe line (5-1).

Description

201114502 六、發明說明： 【發明所屬^^技名财頌域】 發明領域 本發明涉及供液系統、供液方法及塗布裝置。更詳細 而言，涉及對塗布裝置的塗布部進行供液的供液系統，使 用該供液系統的供液方法以及具備該供液系統的塗布裝置。 發明背景 在半導體或液晶顯示裝置的製造程序中，為了供給抗 钱劑或顏料分散液等藥液，廣泛使用將用於包含藥液的袋 狀概塾(liner)裝入金屬容器内，並向該襯墊内填充藥液的系 統°該系統是向襯墊和外側的金屬容器的空隙中導入用於 加壓輸送液體的氣體’該壓力使襯墊收縮，然後通過管子 加壓輸送液體’由於所含藥液被襯墊覆蓋，所以加壓用氣 體與藥液表面不直接接觸，具有能夠防止在加壓環境下氣 體向所含的液體中浸透並被吸收的優點。上述襯墊及金屬 谷器的例子示於專利文獻1。 +上述優點對料彻自由絲合的正性賊劑（含有 崎清漆樹脂和錢基魏的抗㈣丨等）制有利。另—方 對於含有光聚合弓丨發劑等的負性用光致抗触劑等而 。’在保存過程中藥液中的單體或低聚物在熱能的作用下 2生自由基並發生聚合(暗反應），所以，通過使含有氧的氣 溶存或者在藥液容器上部將與抗_液體接觸的空氣層 確保在規定體積，使由包含在* 匕3在王軋中的氧產生的自由基失 201114502 活，從祕礙暗反應，提⑼存穩定性。 因此，利用與空氣接觸少的向襯墊中的密閉填充無法 充刀传到上述效果，不能說是利用自由基聚合反應的光致 抗蝕劑的最佳保存狀態。 另外，在應用方面，雖然可以通過清掃或清洗包裝容 器:替換使用過的襯墊或管子來實現包裝容 器的再利用， 但疋產生採構包裝容㈣初期導人f用和襯墊或管子消耗 部件的替換或購買費用，並且，由於包裝容器的清洗、輸 达需要-段時間等，所以為了敎地應用，必須預先準備 多於實際容器使用數量的庫存，因此存在經濟性問題。 另外為了保持藥液的。。。質多數情況下難以再利用 使用過的襯钱管子，而成為廢棄物。附著在触等上的 抗触劑或用於㈣等的特氟龍（註冊商標）原料難以再回 收’再回收效率降低。 此考慮將藥液裝入圓桶(dr_)或淺罐⑽e㈣)等 金屬製容器中’適合用於供給藥液巧，向裝有藥液的容 «。内導入氣體然後加壓藥液’通過虹吸管的虹吸效應輸 送藥液。該容器由於是金屬，所以容易再回收。但是，存 在輸送時等的耐衝擊或外力導致的凹陷等變形、損傷、内 谷物Λ漏的擔’一，並且難以處理^此外，用於保護容器的 包裝專導致廢棄物數量的增加。 針對上述情况，有時將藥液裝入樹脂製容器中，同樣 地適用於供給藥液。適驗触製容^的藥賴給系統與 使用襯整的類型相比，變動費可控制在低廉的水準清潔 201114502 的樹脂製容器也容易從市售品得到。進一步的與金屬製容 器等比較，還具有彈性，所以在防止因掉落等衝擊引起的 來自外部的損傷方面是優良的。另外，如果使用聚乙烯等 製作樹脂製容器，通過使用過的容器的材料再循環或熱再 循環(thermal recycle)，能夠降低環境負荷。 在製造半導體或液晶顯示裝置時，為了防止異物等導 致的產率降低，通常在向喷出泵等喷出部一側輸送藥液的 配管管路中設置過濾器。用於除去聚集粒子或凝膠狀異物 等的過濾器，例如可以單獨使用或並用加工成褶皺狀或圓 盤狀的厚網過濾器或膜過濾器、纖維過濾器等（孔徑為 0.1〜ΙΟμιη左右）。另外，為了除去藥液中由溶存氣體產生的 微泡之類的微小氣泡，有時也設置脫氣元件（例如日東電工 社制的NITOSEP(註冊商標）等）。 但是，在管路上設置過濾器有時導致產生壓力損失、 低壓輸送時輸送力不足。在上述情況下，為了利用虹吸效 應向喷出部一側輸送藥液，必須以壓力損失以上的力擠出 藥液或在喷出部等進行抽吸。但是，由於前者的情況下， 必需高壓力，後者的情況下配管管路内由於成為負壓狀 態，其為藥液中的溶存氣體發泡，並產生微泡的原因之一， 或者有可能由抽吸的負荷造成泵或其發動機零件等劣化、 損傷。 因此，考慮到輸液配管管路内的壓力損失，有時採取 下述方法，即向藥液容器内的藥液施加適當的必需壓力後 通過虹吸管等加壓輸送，由此降低抽吸時的負壓引起的溶 201114502 存氣體的發泡或泵等的負荷β 但是，為了在所希望的時間得到必需的藥液供給量， 有必要向藥液容器内的藥液施加相應於其供給速度的壓 力，越是單位時_藥液供給量多的系統，為了提高供給 速度，越有必要施加更高的壓力。 製造液晶顯示裝置等時，近年來伴隨樣品玻璃(m〇ther gi㈣的大型化，用於處理每_張基板的藥液量也增加’因 此多數情況下以較高的壓力輸送。 [專利文獻1]特開2008-007153號公報 【發明内容3 發明概要 發明欲解決之課題 上述的樹脂製容器（或圓桶、淺罐等金屬製容器）不是耐 壓容器，所以難以僅對容器内部以高壓力直接加壓。例如， 樹脂製容器的情況下，從樹脂的特性方面考慮如果僅對 容器内部直接加壓，並穩定維持高壓狀態，有時容器的膨 脹變形容易發生塑性變形，由此導致容器破損等。 因此通常採取下述策略，即在該容器的外側使用圓筒 狀耐壓包裝容器，對容器内部施加壓力進行輸送的同時， 從外部也施加壓力等。 第10圖表示上述例子。在製造使用了大型樣品玻璃的 液晶顯示裝置料，在塗布程序中廣泛使用㈣塗布(die coating)法，該種方法的塗布裝置之一具備可往復運動的平 臺或托台（gantry)、塗布喷嘴(鑄型(die))和向塗布喷嘴供給 201114502 塗布的藥液的藥液供給系統^第關是說明該藥液供給系 統的例子的附圖。後述的第11圖也相同。 第10圖中，31是樹脂製容器，33是虹吸管，35是耐壓 包裝容器’卯7-1、37·2)是管路，39是閥Η，41是調節器， 43是過滤H，45是噴出部(噴等），47是塗布喷嘴。 在第1〇圖的例子中，樹脂製容器31密閉在圓筒狀耐壓 包裝容器35内，通過管路37“向裝有藥液的樹脂製容器η 内部及樹脂製容器31和包裝容器35的空隙導人壓縮空氣等 氣體。另外’利用噴出部45進行抽吸。由此利用伴隨加壓 的虹吸效應等，通壯吸管％、f路如向被設置在喷出 部45的儲液部供給樹脂製容器31内的藥液，根據其體積變 化等而由塗布喷嘴47噴出藥液。樹脂製容器31由於從其内 外被加壓，所以不會因加壓而發生變形。 另外’有時不是如上所述地將樹脂製容器31密閉在耐 壓包裝容器35内’而是用稍微大於樹脂製容器31的加壓護 板覆蓋樹脂製容器31，限制僅對樹脂製容器31的内部直接 加壓時樹脂製容器31的膨脹、變形。第u圖中對具有與第⑺ 圖相同的功能結構的元件標記相同的符號，並省略說明。 在第11圖的例子中，利用管路37]向裝有藥液的樹脂 製容器31的内部導入壓縮空氣等氣體。另外，利用喷出泵 45進行抽吸。由此利用伴隨加壓的虹吸效應等，通過虹吸 #33、官路37-2向被設置在喷出部45的儲液部供給樹脂製 容器31内的藥液，根據該體積變化等而由塗布喷嘴47喷出 藥液。利用其外側的加壓護板51限制樹脂製容器31因加壓 201114502 而引起的膨脹、變形。 耐壓包裝容器35或加壓護板51由不銹鋼等機械強度優 良的材料製作而成，對抑制加壓時容器的膨脹或變形有效。 但是，由於耐壓包裝容器35的直徑大小為填裝到内部 的樹脂製容器31器體的直徑以上（即使是通常的加侖容 器，也需要内徑200〜300mm左右大小的容器），所以如果使 用生產時替換效率更高的大容量樹脂製容器31，則隨之耐 壓包裝容器35的直徑也變大。 因此，如果向耐壓包裝容器35内施加例如lOOkPa(大氣 壓基準，以後相同）左右的高壓，則施加到其蓋部等的力變 得非常大。此時，如果不進行將加壓狀態的耐壓包裝容器 35洩壓至大氣壓的操作而開放蓋等截面積大的密閉部，則 有可能存在被加壓的蓋部等零件或藥液飛散，為了確保安 全，必須小心進行處理等。另外，可以通過設置適當的安 全機構來降低危險性，但由於殘留潛在的危險性，所以在 預想之外的使用中難以確保操作者的安全。 另一方面，在使用加壓護板51限制樹脂製容器31的變 形，同時直接對樹脂製容器31加壓供給藥液的方法中，在 膨脹引起的塑性變形的作用下，樹脂製容器31與加壓護板 51嚙合，導致替換操作時不容易取出樹脂製容器31，而且 膨脹、變形的應力集中在不與加壓護板51密合的部位，有 可能發生部分裂開、破裂、漏液或逆轉等，存在安全方面 的懸念。 另外，在利用加壓介質（壓縮空氣或壓縮氮氣等氣體) 201114502 產生的壓力加壓輸送藥液的情況下，隨著加壓時間的經 過，加壓環境中的氣體慢慢向藥液中溶解，由此藥液中的 溶存氣體量增多。施加高壓時，溶存氣體量變得更多。 如果在管路37-2等配管管路的節流孔或接頭部分等存 在配管内徑急劇變細的部位，則因文丘裏效應流速上升， 同時配管管路内的壓力降低，由於氣蝕，溶存在藥液中的 氣體產生肉眼不能見程度的微小氣泡，即微泡。這此微、包 有可能變成聚集體而成為大氣泡。 作為因由此形成的氣泡混入而帶來的影響，在半導體 或液晶顯衫置的製造程序中，微泡使塗布_折射率或 膜厚的均一性變差，該影響導致加工品質變差，產率等L 產性能降低。 另外’塗布在基材上的抗姓劑中如果殘留大氣泡，則 局部表面張力存在差別’成為膜料—性變差或外觀發生 不均的原S之-。並且在塗膜中殘留氣泡的狀態下，如果 通過減壓乾燥程序在真空乾燥㈣對其進行乾燥， 氣泡膨脹、破裂，使品質降低。 a另外’在模㈣布法巾，將由藥液的抽料產生的喷 出445的儲液部的體積變化作驗縮力傳給與塗布嗔嘴a 連接的配管㈣藥液，由此對應於其體積變化和壓力變化 從塗布噴嘴47前端㈣σ㈣部喷itj藥液。目此，自塗 =嘴，嘴出相對於拙吸操作產生的體積變化不是延遲 是必須隨動。如罢,友 ί、氣泡聚集並停滯在喷出部45或至含右 喷背47的切口部的配管、接頭或_:中，則由塗布操作開 201114502 始時的抽吸操作產生的體積變化作用於殘留氣泡的收縮， 也成為配管管路内的藥液喷出壓力的增加時間（應答速度) 發生延遲的主要原因。 利用模壓塗布法的逐張塗布方式的塗膜形成方法由於 該藥液喷出的時間延遲是造成塗布開始部和塗布結束部附 近的厚度均一性變差或線絡、不均等品質下降的主要原 因，故不優選。 作為對策，可以降低塗布速度，從而在某種程度上減 弱應答延遲的影響，但是不僅處理時間變長，生產率降低， 而且在多數處理中伴隨藥液的流動氣泡也被移動、除去， 由此造成塗布液的應答性發生改變，難以維持穩定均一性 (再現性）的生產品質。 本發明是鑒於上述問題而完成的，其目的在於提供安 全性、經濟性、生產率優良的供液系統等。 用以欲解決課題之手段 為了實現上述目的，第1發明為一種供液系統，用於向 塗布裝置的塗布部供給液體，其特徵在於，具有 儲存部，用於儲存液體的； 第1流道； 第2流道，與上述儲存部連接，用於向上述儲存部供給 液體； 第3流道，與上述儲存部連接，用於向上述儲存部供給 氣體； 第4流道，與上述儲存部及上述塗布部連接，用於從上 10 201114502 述儲存部向上述塗布部供給液體； 上述⑴流道、上述第2流道的流道能夠可拆卸地連接 規定容器，上述第！流道㈣向連接的上述規定容器供給氣體。 上述儲存部具有用於將儲存部内部向大氣開放的大氣 開放構件，在上述第1、第2、第3、第4流道上設置有用於 開閉各流道的開閉構件。另外，優選在上述儲存部設置用 於檢測液面高度的液面檢測裝置。 第1¾明的供液系統優選還具有能夠可拆卸地連接上 述規定容器的容器連接部，上述第1流道、上述第2流道可 以通過上述容II連接部連接上述収容器。 …p輯上述容器連接部在内周面具有㈣紋，可 'L過將上述内螺紋與設置在上述規定容器的開口部外周 面的外螺紋螺合’來連接上述容器連接部和上述規定容器。 、.上述第1流4向連接的上述規定容器内供給氣 ’=述規定容器内的壓力為抓〜瞻&的範圍。 ^ ϋ ^㈣裝置可以是在半導體裝置或液晶顯示 裝置的製造中使用的裝置。 ㈣’塗布裝置的塗布部是指喷出系等喷出 用?向基板等塗布藥液的裝置。 和儲存部内的2能_立地控制規定容器内的壓力狀態 等，一旦填充s，狀態，加壓輸送裝在規定容器内的藥液 向塗布裝置的=存部内’則—邊加壓儲存部内部，一邊 布部輸送液體，:供給液體。gp，不直接從容器内向塗 疋在向塗布部輸送液體時加壓儲存部内 201114502 部。因此，能夠使為了向儲存部輸送液體而對容器内施加 的壓力在例如5kPa〜lOOkPa的低壓範圍。為此，不需要能夠 耐高壓的容器作為容器，可以以通常用於藥液的輸送等的 树月曰製谷器專谷器作為規定容器，可拆卸地連接在供液系 統的流道上，並以該狀態加以使用。容器内的藥液使用完 後可以將其拆卸掉換成其他容器，經濟性優良。由於能夠 將％加在谷器内的壓力抑制得較低，所以能夠安全地進行 容器的替換操作等。 另外，由於在規定容器内處於低壓的狀態下向儲存部 供液’所以不會導致液财的溶存氣體過量。因此，能夠 抑制氣蚀造成的微泡等氣泡的產生。為此，能夠抑制上述 氣泡對品質的影響，並在塗布來自塗布部㈣液時，抑制 配管内壓力上升的延遲時間，降低初期噴出量的不足，提 =穩定均—的高品質產品。而且’向塗布部輸送液體時， =並用彻泵等噴出部的抽吸操作輸送藥液和通過加壓 =子部㈣輸«_方式，所叫使在崎管路上設置 伴Z等的情況下也能夠抵消過《等造成的壓力損失或 關。Γΐ操作而產生的負壓’並且與抑制氣泡的產生也有 零件望％夠降低抽^'負荷導致喷出科嘴出部或其發動機 7專劣化、損傷的可能性。 X通過連接部在流道上連接規定容器。此 在果通過螺合谷^連接勒周面具有的㈣紋與設置 壓^容器的開口部外周的外螺紋來連接蚊容器，則加 盗内口P時’在容器連接部形成氣密性，不易發生容器 12 201114502 連接部的鬆弛或漏氣。另外，在替換 ’ 益連接部鬆弛，由於容器的外螺紋連二發生容 ::卡住，___部不會飛:接 攸因弛而產生的間隙茂漏，由此能夠將容 礼 地變成大氣廢。因此容器的替換操作變得更安全。。p安全 此外，可u㈣❹❻料峰測構件根據 控制藥液的供給，所以儲存部内可以處於_ 面位置 的狀態。由此能夠使溶存在液體中體層 ,氣體層，從而與液體分離。因此，能夠降低供給：：内 :體内混入的氣體量，並能夠進—步抑制微泡等氣: 導提供—種供液系統’該供給系統在半 導體裝置或液曰曰顯示裝置的製造中安全性、經濟性 率優良，並向塗布裝置的塗布部供給液體。 生產 、為了實現上述目的，第2發明為-種供液方法，用於向 塗布裝置的塗布部供給液體’該供液方法使用一種供夜 統，所述供液系統具有用於储存液體的儲存部；第^道: 與上述儲存部連接，用於向上述儲存部供給液體㈣2流 與=賴存部連接，用於向上述儲存部供給氣體的第3 机道’與上述健存部及上述塗布裝置的塗布部連接，用於 從上述儲存部向上述塗布部供給㈣的第愤道，上述第1 流道、上述第2流道的流道能夠可拆卸地連接規定容器，上 迷第！流道能夠向連接的上述規定容器供給氣體。所述供液 方法的特徵在於，包括：健存部供液程序，即利用通過上 13 201114502 述第1流道供給的氣體對與上述第1流道、上述第2流道的流 道連接的上述規定容器内加壓，通過上述第2流道向上述儲 存部内供給上述規定容器内的液體；塗布部供液程序，即 利用通過上述第3流道供給的氣體加壓上述儲存部内部，通 過上述第4流道向上述塗布部供給上述儲存部内的液體。 利用上述結構，能夠獨立控制規定容器内的壓力狀態 和儲存部内的壓力狀態，加壓輸送裝在規定容器内的藥液 等液體，一旦填充到儲存部内，則一邊加壓儲存部内部， 一邊向塗布裝置的塗布部供給液體。即，能夠不必從容器 内直接向塗布部輸送液體，而是在向塗布部輸送液體時加 壓儲存部内部。因此，能夠使為了向儲存部輸送液體而對 容器内部施加的壓力為低壓。為此，不需要能夠耐高壓的 容器作為容器，而能夠以通常用於藥液的輸送等的樹脂製 容器等容器為規定容器，將其可拆卸地連接在供液系統的 流道上加以使用。可以在容器内的藥液使用完後將其拆 卸，替換成其他容器，經濟性優良。由於能夠將施加在容 器内的壓力抑制得較低，所以能夠安全地進行容器的替換 操作等。 另外，由於在規定容器内處於低壓的狀態下向儲存部 供液，所以不導致液體中的溶存氣體過量。因此，能夠抑 制氣蝕造成的微泡等氣泡的產生。為此，能夠抑制上述氣 泡對品質的影響，並在塗布來自塗布部的藥液時，抑制配 管内壓力上升的延遲時間，降低初期喷出量的不足，提供 穩定均一的高品質產品。而且，向塗布部輸送液體時，能 14 201114502 夠並用利H等噴出部產生_吸操作輸送㈣的方式和 通過加壓儲存部内部輸送藥㈣方式，所以即使在配管管 路t設置過渡11等的情況下也㈣抵消過濾器等造成的壓 力損失或伴_吸操作的貞壓，與抑制氣泡的產生也有 關。還能夠降低抽吸負荷導致喷出系等喷出部或其發動機 零件等劣化、損傷的可能性。 因此，能夠提供一種供液方法，其安全性、經濟性、 生產率優良，並向塗布裝置的塗布部供給液體。 為了實現上述目的’第3發明是一種塗布裝置，其特徵 在於，具備第1發明的供液系統。 利用上述結構能夠獨立地控制規定容器内的壓力狀態 ，儲存部内的壓力狀態，加壓輸送裝在規定容器内的藥液 等，一旦填充到儲存部内，則一邊加麼儲存部内部，一邊 向塗布裝置的塗布部供給液體1，不直接從容器内向塗 布部輸送液體，而是在向塗布部輪送液體時加壓儲存部内 部。因此，能夠使為了向儲存部輪送液體而對容器内施加 的壓力在例如5kPa〜腿Pa的低度範圍。為此，可以不需要 此夠财而壓的容器作為容器’而能夠以通常用於藥液的輸 送等的樹脂製容器等容器作為規定容器，可拆卸地連接在 供液系統的流道上’並以該狀態加以使用。容器内的藥液 使用完後可以將其拆卸掉換成其他容器，經濟性優良。由 於能夠將施加在容器内的壓力抑制得較低，所以能夠安全 地進行容器的替換操作等。 另外，由於在規定容器内處於低壓的狀態下向儲存部 15 201114502 制氣飿造成:!致液體中的溶存氣體過量。因此，能夠抑 泡對品等氣泡的產生。為此，能夠抑制上述氣 管内壓力上:並在塗布來自塗布部的藥液時，抑制配 穩定均延遲時間’降低初期嘴出量的不足，提供 夠並用二;Γ品。而且，向塗布部輪送液體時，能 通過加壓部產生的抽吸操作輸送液體的方式和 上設置過濟”的^ 方式’所以即使在配管管路 損失或伴_ Γ 抵消過渡器等造成的壓力 夭戈伴_轉作的負壓，與抑制氣 還可以通過容器連接部在流道上連接規^容器 :在=過螺合容器連接部的内周面具有的内螺纹與設 谷器開口部的外周的外螺紋來連接規定容器則 益内部時，在容器連接部形成氣密性，不易發生六 器連接部的鬆弛或漏氣。另外，在替換容器時 t f器連接部鬆他，由於容器的外螺紋和容器連接部的内螺 紋此夠卡住’所以容器或容器連接部不會飛散，而且加壓 乳體從因鬆弛而產生的間隙_，由此能夠使容器内 全地變成大氣壓。因此容器的替換操作變得更安全。 ，外’可讀用感測||等液面檢測構件根據液面位 控制樂液的供給，所以儲存部内可以處於一直存在氣體層 的f態。由此能夠使溶存在液體令的氣體散逸到儲存部内 的氣體層’從而與液體分離。因此，能夠降低供給至塗布 16 201114502 部的液體内混入的氣體量，並能夠進一步抑制微泡等氣泡 的產生。 因此能夠提供安全性、經濟性、生產率優良的塗布裝置。 發明效果 根據本發明能夠提供安全性、經濟性、生產率優良的 供液系統等。 圖式簡單說明 第1圓為本發明中供液系統的實施方式的示意圖； 第2圖為供液系統中的供液方法的流程圖； 第3圖為供液系統中的供液方法的流程圖； 第4圖為供液系統中的供液方法的流程圖； 第5圖為供液系統中的供液方法的流程圖； 第6圖為供液系統中的供液方法的流程圖； 第7圖為本發明的供液系統的其他實施方式的示意圖； 第8圖為表示附屬裝置的例子的附圖； 第9圖為表示塗布裝置結構的例子的附圖； 第10圖為表示财壓包裝容器的例子的附圖 第11圖為表示加壓護板的例子的附圖。 【實施方式】 用以實施發明之形態 下面參照附圖對本發明的供液系統等實施方式進行說 明。首先，參照第丨、9圖說明該實施方式的供液系統。 如第9圖所示，該實施方式的供液系統丨作為製造液晶 顯示裝置或半導體裝置時使用的塗布裝置1〇〇的一部分而 17 201114502 被組裝。塗布裝置卿除供液系統⑴外，還具備控制部 110、塗布部120、基板保持部13〇等。 控制部no由CPU(中央處理單元）等構成，控制供液系 統1或塗布部120、基板保持部13〇的運行。 塗布部_彳如包括衫了㈣部的料嘴出部或塗 布喷嘴(鑄模）等、以及驅動上述喷出部或塗布喷嘴等的驅動 機構，在基板上實際塗布抗蝕劑等藥液。 基板保持部130例如包括放置並支擇基板、可往復移動 的平臺等、以及驅動上述平臺等的驅動機構。 如第1圖所示，該實施方式的供液系統【具有緩衝罐 3(儲存部）、管路5(流道）、閥門7(開閉構件）、調節器9等， 向喷出。卩13、塗布喷嘴14(塗布部⑽)側供給樹脂製容器 Π(規定容||)内的抗_、顏料分散液等藥液(液體卜闕門 7和調節器9、喷出部13等的運行可以通過控制部職制。 緩衝罐3優選利用即使在供給臟Pa以上的高壓氣體 (壓縮氣體或壓職氣等）的«下，對抗㈣㈣度也優良 的材料、結構製成。另外’優選形成這樣-種容器設計， 即，，即使在至少細咖的加壓狀態下也不會漏氣或漏液或 變形、’並能夠水久保持耐壓性能。但是，緩衝罐的材料和 形狀並不具體限定於此^例如，作為緩衝罐3的材料，可以 使用⑽304不錄鋼或紹等金屬，容納的藥液具有腐钮金屬 的性質時或主重加工性時，在滿足财壓性的條件下，可以 使用氟樹脂或NC尼龍等作為原料。另外，為了賦予财化學 藥扣J·生’可以對内表面進行塗布樹脂絲層處理。 201114502 一還優選緩衝罐3令設置感測器4作為檢測罐内藥液的液 面高度的液面檢測構件。因為要形成在緩衝罐3内的上部一 直存在規定體積以上的空氣層的狀態，所以優選通過例如 感，器4檢測規定的（上限位置以下的）液面高度來控制設置 在B路上的閥門的開閉，進而阻斷藥液的供給等，以使液 面南度不在預先確定的上限位置以上。 s路5(5-1、5_2、5_3、5·4、5_5)是氣體或液體流道， 包括用於供給氣體或開放大氣的可流通氣體的管路(5」、 5-3、5-4)和用於供給藥液的可流通液體的管路(W、5巧）。 ”材料形狀等可以使用該種管路通常使用的材料、形狀。 s路5-1(第1流道)從供氣部（圖中未示出）開始延伸並 與Μ月日$^器π連接1路5]是為了加壓樹脂製容器口内 部而從供氣部供給氣體的配管管路。 g路5-2(第2流道)與樹脂製容心、緩衝罐3連接。管 路5-2是根據樹脂製容器17内的壓力，利用虹吸效應向緩衝 罐3供給樹脂製容器17内的藥液的配管管路。 管路5-3是與外部和緩衝權3連接，用於將緩細向大 氣開放使緩衝罐3内變成大氣壓的配管管路。 管路5,3流道)從管路5]分出，與緩衝罐3連接。管 路5-4是與供氣部和緩衝 連接，用於為加壓緩衝罐3内部 而伙Μ部向緩衝罐3内供給氣體的配管管路。 官路5-5(第4流道)與緩衝罐3 接。管路5-5是從绥彳私雄， ° (塗布。卩12〇)連 路5疋攸緩衝罐3向喷出部13、 部120供給藥液的配管管路。 赁嘴14專塗布 19 201114502 間門7(7]、7-2、7-3、7_4、7·5)是開放或阻斷管路5内 ⑽體或氣體流道的開閉構件，對其結構等沒有特別限 定’可以使用已知的各種結構。另外，根據各種條件，可、 以按照需要使控制部U0利用氣控閥㈣自動控制上㈣ 門的開閉。還可以使操作員等通過手動操作開閉上述閱門。 閥門7-1(V1)設置在管路5]上，閥門73(v3)設置管路 =閱門7娜置在管路5-4上，通過各自， 4·對應的管路5中流動的氣流。 需要說明的是，閥門7.3通過其開閉控制流經管路^ 的氣流’ «_罐3向大氣開放(及崎），㈣作為大氣 開放，件發揮作用。但是，將緩衝罐3向大氣開放的機構並 不限疋於此。例如，如果將緩衝罐3的外面直接與大氣相 連，則即使朗閉緩衝罐3的—部分也能發揮作為大氣開放 構件的作用。 另外，閥門7-2(V2)設置在管路5_2上，閥門7_5(V5)設 置在管路5_5上，通過各自的開閉，調整對應的管路$中流 動的藥液流。 另外，雖然附圖中沒有示出，但是可在上述緩衝罐3上 連接用於EJ收軸的藥液的管路或服注人清洗緩衝罐3 的溶劑的管路可以與’各管路上可以設置通過其開閉來控 制管路内的液流的閥門。 调即盗9(9-1、9-2、9-3)是-種壓力調節構件，用於調 郎並保持自供氣部供給的氣體的壓力，以使樹脂製容器17 或緩衝罐3内的氣體的壓力為任意固定的壓力值。與間門7 20 201114502 相同，其控制可以根據各種條件由控制部11〇自動進行控 制也可以由操作者手動操作進行控制。 立調2器9，1(REG1)設置在管路5]上相對與管路Η的分 支部分靠近供氣H調節供給至樹脂製容器17或緩衝 罐3的氣體的壓力。 调郎器9-2(REG2)設置在管路5 _丨上相對與管路5 _4的分 支部分靠近樹脂製容器17—側，調節供給至樹脂製容器17 的氣體的壓力》 ^調節器9-3(REG3)設置在管路5-4上，調節供給至緩衝 罐3的氣體的壓力。 過渡器11設置在管路5-5上。如上所述，過遽_用於 除去聚集粒子或凝膠狀異物等，例如可以單獨使用或並用 工成褶皺狀或圓盤狀的厚網過渡器、膜過遽器、纖維過 濾器等（孔徑為〇_1〜10μιη左右的過濾器）。還可以設置上述 的脫氣元件。 噴出部13被連接到管路5-5上。喷出部13例如為泵或分 配器（diSpenser)，具有儲存供給至塗布噴嘴14的藥液的儲液 部（圖中未示出）。噴出部13將藥液抽吸至儲液部後將與儲液 部的體積變化相對應的量的藥液送入塗布喷嘴14。 塗布喷嘴14為模頭(die head)或注射器針等，通過流道 與喷出部13連接。塗布喷嘴14從切口等開口部將由喷出部 13供給的藥液塗布在基材上。 喷出部13以及塗布喷嘴14作為塗布裝置1 〇〇的塗布部 120發揮功能，在製造半導體或液晶顯示裝置的塗布程序 21 201114502 中’對基板上實際進行藥液的塗布。 樹脂製容器17是儲存抗蝕劑或顏料分散液等藥液的容 器，使用加壓變形小的容器。具體而言，使用這樣的容器， 即對内部連續施加50kPa的氣壓的環境下，從開始至12小時 後，變形導致的容器體積變化量能夠抑制在5%以下。因 此，優選以彎曲彈性率為50〇MPa以上的樹脂為材料的樹脂 製容器。但是，樹脂製容器17的材料或形狀並不限定於此， 例如可以使用聚乙烯或氟樹脂作為材料。 需要說明的是，通常情況下藥液以儲存在樹脂製容器 中的狀態由抗蚀劑製造商等進行輸送、供給，但此時的容 器為保證輸送時的安全，通常滿足上述的強度。即，可: 將用於輸送的藥液容器直接適用於該供液系統’該種情況 ί利:必使用用於供㈣統1的制容器，在經濟性方面是 需要說明的是，如果滿足上述條件，則容器的材料並 不限於樹脂，也可以使用金屬等容器代替樹脂製容和。 但是’如上所述，由於樹脂具有的彈性，所以在防止 洛等衝擊導致的來自外部的損傷方面優選使用樹脂製容考 用用聚乙稀等製成樹脂製容器，則在因使 :-::也::::循環或熱再_ 屬裝置15(容科接 與管路Η、管路5·2連接。如第8圖所示，在扑製ΓΓ 上部的開口部24(注入口 _外周面上設置外螺;文25: 22 201114502 外周螺旋狀連接、 附屬裝置15ή/ 部24的水平外側方向突出。在 25，^螺旋狀H面上设置内螺紋27，其對應於該外螺紋 附属J 使上述外螺紋和内螺紋。齒合，能夠在 附屬裝置15上安裝並固 以在 安裝時，相料曰裘奋态Η上部的開口部24。 25和内螺紋^/脂製容心和附屬裝置15 ’使外螺紋 Η上部的.2。，從而在附屬裝置15上安裝樹脂製容器 容：ίΓ優選使用具有耐壓性，並且使用與樹脂製 漏〇林錄1相比壓力變形更小的材料，例如«以紹或 性的部位，在上H屬作為材料’或者對於必需耐化學藥品 成，但並不限定於此枓中組合特氟龍(註冊商標)等材料而製 樹脂製容5時’如果直接對樹脂製容器17進行加壓，則 微從内側膨脹。此時樹脂製容器17的開口 的附屬裝ί Γ外螺紋25自内側各向同性地擠壓變形強度高 总路Γ 5的内螺紋27，相互喃合而提高氣密性，所以 另卜附屬裝置15的鬆他或由其引起的氣體⑴爲。 ρ使附屬裝£15鬆他’由於樹脂製容器17的外 螺紋25㈣屬衫15的㈣紋27能夠卡住，所以外螺紋25 被内螺紋27卡定，附屬裝置叫會飛散，而且，加壓用氣 體自1弛產生的間隙逸出，由此能夠使樹脂製容 器17内安 全地成為大氣壓。 此卜附屬|置15喊面積能夠控制在樹脂製容器17 上部的開〇部24(與殼體部相比直徑縮小)的截面積左右，所 23 201114502 以’施加在附屬裝置15的力小於大小為樹脂製容器i7器體 部直徑以上的上述耐壓包裝容器的蓋部，進而能夠提供： 全的操作環境。 例如，如果圓筒狀耐壓包裝容器（不銹鋼容器等）的蓋的 直徑為300mm，則對其内部施M100kPa的壓力時蓋部整體 受到的力約為7065N/m2。 另-方面，安裝在樹脂製容器17的注入口的附屬裝置 15的直徑可以為80mm左右。此時如果對樹脂製容器17内施 加l〇kPa的壓力（如後所述，在供液系統丨中樹脂製容器η内 可以處於低壓），則附屬裝置15受到的力約為5().24驗2，為 1/100以下的大小，可知安全性進一步提高。 另外，附屬裝置15具有至少1個以上加壓口 22和送液口 23’加壓口22與管路5·1可拆卸地連接，送液e23與管路5·2 可拆卸地連接。 加壓口22是一個端部與管路5-1連接，將附屬裝置15向 t脂製容㈣方向㈣的妓，導《連接管路5_丨和樹脂 製容器17内部。 曰 口 23疋㈣部與管路5_2連接，將附屬裝置U向 樹脂製容器Π方向貫通的流道，導通並連接管路 製容器17内部。另外，另—端 十月曰 鸲。卩為虹吸管19。虹吸管 延伸至樹脂製容器17下部的管體。 尺 下面利用第2至6圖說明哕音说 … 月°亥貫施方式的供液系統1中的 供液方法的流程。 Θ 供液系統1進行供液時，管路Μ和加壓口 22連接，管 24 201114502 路5-2和送液口 23連接，在 的附屬裝置15上如上所μ以在料5]、管路5_2上 上所處地安裝樹脂製容 部24。或者錢屬裝如上絲樹 $ _ 1 裝置15安裝在管路5-1、管路5 2上 益17，再將附屬 接下來如第2圖所；201114502 VI. Description of the Invention: [Technical Field of the Invention] Field of the Invention The present invention relates to a liquid supply system, a liquid supply method, and a coating device. More specifically, the present invention relates to a liquid supply system for supplying a liquid to a coating portion of a coating apparatus, a liquid supply method using the liquid supply system, and a coating device including the liquid supply system. BACKGROUND OF THE INVENTION In a manufacturing process of a semiconductor or a liquid crystal display device, in order to supply a chemical liquid such as an anti-money agent or a pigment dispersion liquid, a bag-like liner for containing a chemical liquid is widely used in a metal container, and The system for filling the liquid in the liner. The system introduces a gas for pressurizing the liquid into the gap between the liner and the outer metal container. The pressure causes the liner to shrink, and then the liquid is pressurized by the tube. Since the chemical liquid contained is covered by the gasket, the pressurized gas does not directly contact the surface of the chemical liquid, and has an advantage of being able to prevent the gas from permeating into the liquid contained in the pressurized environment and being absorbed. Examples of the above liner and metal bar are shown in Patent Document 1. +The above advantages are advantageous for the production of a positive thief (a smear-containing varnish resin and a Qianjiwei anti-(four) 丨, etc.). The other side is a photo-sensitive anti-touching agent containing a photopolymerization bow hair styling agent or the like. 'In the process of preservation, the monomer or oligomer in the drug solution generates radicals under the action of thermal energy and polymerizes (dark reaction). Therefore, it is dissolved in the gas containing oxygen or in the upper part of the drug solution container. The liquid layer in contact with the liquid is ensured in a specified volume so that the free radicals generated by the oxygen contained in the * 匕3 in the king's rolling are lost in 201114502, from the dark reaction of the secret, and the stability of the (9) storage. Therefore, it is impossible to carry out the above-mentioned effects by using a hermetic filling in the liner which is less in contact with air, and it is not considered to be an optimum storage state of the photoresist by radical polymerization. In addition, in terms of application, although the packaging container can be cleaned or cleaned: the used gasket or tube is replaced to realize the recycling of the packaging container, but the production packaging capacity (4) is used for initial introduction and pad or tube consumption. The replacement or purchase cost of the components, and, because of the cleaning, delivery, and the like of the packaging container, it is necessary to prepare an inventory more than the actual container usage amount in advance for the application, and thus there is an economic problem. In addition, in order to maintain the liquid medicine. . . In most cases, it is difficult to reuse the used money-saving pipes and become waste. The anti-touching agent attached to the touch or the Teflon (registered trademark) raw material for (4) or the like is difficult to be recycled, and the recycling efficiency is lowered. In this case, it is considered that the liquid medicine is placed in a metal container such as a drum (dr_) or a shallow tank (10) e (four), and is suitable for supplying the liquid medicine to the contents containing the liquid medicine. The gas is introduced therein and then the drug solution is pressurized to deliver the drug solution by the siphon effect of the siphon. Since the container is made of metal, it is easy to recycle. However, there is a problem such as deformation or damage such as dents caused by impact or external force during transportation, and damage to the inner grain, and it is difficult to handle. In addition, the packaging for protecting the container is dedicated to an increase in the amount of waste. In view of the above, the chemical solution may be placed in a resin container, and the drug solution may be similarly applied. Compared with the type of lining, the variable cost can be controlled at a low level of cleaning. The resin container of 201114502 is also easily obtained from commercial products. Further, it is more elastic than a metal container or the like, and therefore is excellent in preventing damage from the outside due to impact such as dropping. Further, if a resin container is produced by using polyethylene or the like, the environmental load can be reduced by material recycling or thermal recycling of the used container. In the manufacture of a semiconductor or a liquid crystal display device, in order to prevent a decrease in yield due to foreign matter or the like, a filter is usually provided in a pipe line for supplying a chemical solution to a discharge portion such as a discharge pump. The filter for removing aggregated particles or gelatinous foreign matter or the like may be used alone or in combination with a thick mesh filter or a membrane filter processed into a pleated shape or a disk shape, a fiber filter or the like (a pore size of 0. 1~ΙΟμιη about). In addition, a degassing element (for example, NITOSEP (registered trademark) manufactured by Nitto Denko Corporation) may be provided in order to remove fine bubbles such as microbubbles generated by the dissolved gas in the chemical solution. However, the provision of a filter on the pipeline sometimes results in a pressure loss and a low delivery force at low pressure delivery. In the above case, in order to transport the chemical solution to the discharge portion side by the siphon effect, it is necessary to extrude the chemical solution with a force equal to or higher than the pressure loss, or to perform suction at the discharge portion or the like. However, in the case of the former, high pressure is required, and in the latter case, the inside of the piping is in a negative pressure state, which is one of the causes of foaming of the dissolved gas in the chemical liquid and generation of microbubbles, or may be caused by The pumped load causes deterioration or damage to the pump or its engine parts. Therefore, in consideration of the pressure loss in the infusion piping, a method is sometimes employed in which a necessary pressure is applied to the chemical liquid in the chemical liquid container, and then pressurized by a siphon or the like, thereby reducing the negative pressure during suction. The pressure of the 201114502 gas storage foam or the load of the pump is caused by the pressure. However, in order to obtain the necessary chemical supply amount at a desired time, it is necessary to apply a pressure corresponding to the supply speed to the chemical liquid in the chemical liquid container. The more the unit is, the system with a large supply of chemical liquid, in order to increase the supply speed, it is necessary to apply higher pressure. In the case of manufacturing a liquid crystal display device or the like, in recent years, as the size of the sample glass (the size of the sample glass) is increased, the amount of the chemical liquid used for processing each substrate is also increased. Therefore, in many cases, it is transported at a relatively high pressure. [Patent Document 1 In the above-mentioned resin container (or a metal container such as a drum or a shallow can), it is not a pressure-resistant container, so it is difficult to apply high pressure only to the inside of the container. For example, in the case of a resin container, from the viewpoint of the properties of the resin, if the inside of the container is directly pressurized and the high pressure state is stably maintained, the expansion deformation of the container may be easily plastically deformed, thereby causing damage to the container. In general, a cylindrical pressure-resistant packaging container is used on the outer side of the container, and pressure is applied to the inside of the container, and pressure is applied from the outside. Fig. 10 shows the above example. A liquid crystal display device using a large sample glass, which is widely used in a coating process, and a die coating method. One of the coating devices is provided with a reciprocable platform or gantry, a coating nozzle (die), and a chemical supply system for supplying the coating liquid to the coating nozzle of 201114502. The drawings of the example of the system are the same as the eleventh figure described later. In Fig. 10, 31 is a resin container, 33 is a siphon tube, and 35 is a pressure-resistant packaging container '卯7-1, 37·2) is a pipe. 39 is a valve port, 41 is a regulator, 43 is a filter H, 45 is a discharge portion (spraying or the like), and 47 is a coating nozzle. In the example of the first drawing, the resin container 31 is sealed in the cylindrical pressure-resistant packaging container 35, and the inside of the resin container η containing the chemical liquid and the resin container 31 and the packaging container 35 are "passed" through the line 37. The space of the air is compressed by a gas such as a compressed air. In addition, the suction is performed by the discharge unit 45. By using the siphon effect or the like accompanying the pressurization, the passages % and f of the suction pipe are provided in the liquid storage portion of the discharge portion 45. The chemical liquid supplied into the resin container 31 is ejected by the application nozzle 47 in accordance with the volume change or the like. Since the resin container 31 is pressurized from the inside and the outside, the resin container 31 is not deformed by the pressurization. Instead of sealing the resin container 31 in the pressure-resistant packaging container 35 as described above, the resin container 31 is covered with a pressurizing shield slightly larger than the resin container 31, and the inside of the resin container 31 is restricted. In the first embodiment, the components having the same functional configurations as those in the seventh embodiment are denoted by the same reference numerals and will not be described. In the example of Fig. 11, the pipe 37] is used. Resin filled with liquid A gas such as compressed air is introduced into the interior of the container 31. The suction is performed by the discharge pump 45. The siphon effect or the like by the siphon effect is used to provide the discharge portion 45 by the siphon #33 and the official road 37-2. The liquid storage unit supplies the chemical liquid in the resin container 31, and the chemical liquid is ejected by the application nozzle 47 in accordance with the volume change or the like. The pressure regulating plate 51 on the outer side restricts the resin container 31 from being pressurized by 201114502. The pressure-resistant packaging container 35 or the pressure-resistant protective plate 51 is made of a material having excellent mechanical strength such as stainless steel, and is effective for suppressing expansion or deformation of the container during pressurization. However, due to the diameter of the pressure-resistant packaging container 35 It is larger than the diameter of the resin container 31 to be filled in the inside (even a normal gallon container requires a container having an inner diameter of about 200 to 300 mm), so if it is used, it is made of a large-capacity resin with higher replacement efficiency during production. In the case of the container 31, the diameter of the pressure-resistant packaging container 35 is also increased. Therefore, if a high pressure of, for example, 100 kPa (atmospheric pressure reference, the same after) is applied to the pressure-resistant packaging container 35, The force applied to the lid portion or the like is extremely large. In this case, if the pressure-resistant packaging container 35 in the pressurized state is not released to the atmospheric pressure, and the sealing portion having a large cross-sectional area such as a lid is opened, there is a possibility that the sealing portion may be opened. Parts such as pressurized lids or chemical liquids are scattered, and care must be taken to ensure safety. In addition, an appropriate safety mechanism can be provided to reduce the risk. However, due to the potential danger of residue, it is unexpected. On the other hand, in the method of using the pressure guard 51 to restrict the deformation of the resin container 31 and directly supplying the chemical solution to the resin container 31, the plasticity caused by the expansion is caused. Under the action of the deformation, the resin container 31 is engaged with the pressure plate 51, so that the resin container 31 is not easily taken out during the replacement operation, and the stress of expansion and deformation is concentrated on the portion which is not in close contact with the pressure plate 51. There may be partial cracking, rupture, leakage or reversal, etc., and there is a suspense in safety. Further, in the case where the chemical liquid is pressurized and pressurized by a pressure generated by a pressurized medium (compressed air or a gas such as compressed nitrogen) 201114502, the gas in the pressurized environment is slowly dissolved into the chemical solution as the pressurization time elapses. Therefore, the amount of dissolved gas in the chemical solution increases. When a high pressure is applied, the amount of dissolved gas becomes more. If there is a portion where the inner diameter of the pipe is sharply narrowed, such as the orifice or the joint portion of the piping line such as the line 37-2, the flow rate increases due to the Venturi effect, and the pressure in the piping line decreases, due to cavitation, The gas dissolved in the chemical solution produces minute bubbles, that is, microbubbles, which are invisible to the naked eye. This micro-package may become an aggregate and become a large bubble. As a result of the incorporation of the bubbles formed thereby, in the manufacturing process of the semiconductor or the liquid crystal display, the microbubbles deteriorate the uniformity of the coating_refractive index or the film thickness, and the influence causes the processing quality to deteriorate. Rate, etc. L performance is reduced. Further, if there is a large air bubble remaining in the anti-surname agent coated on the substrate, there is a difference in the local surface tension, which is the original S of the film-deterioration or uneven appearance. Further, in a state where air bubbles remain in the coating film, if it is dried by vacuum drying (4) by a vacuum drying process, the bubbles expand and rupture, and the quality is lowered. a further 'in the mold (four) cloth towel, the volume change of the liquid storage portion of the discharge 445 generated by the pumping of the chemical liquid is transmitted to the piping (four) liquid medicine connected to the coating nozzle a, thereby corresponding to The volume change and pressure change are sprayed from the front end (four) σ (four) portion of the coating nozzle 47. For this reason, self-coating = mouth, the volume change caused by the mouth relative to the sucking operation is not delayed and must be followed. If the bubble is collected and stagnated in the spout 45 or into the pipe, joint or _: of the notch portion of the right spout 47, the volume change caused by the suction operation at the beginning of the coating operation 201114502 The shrinkage of the residual air bubbles also causes a delay in the increase time (response speed) of the discharge pressure of the chemical liquid in the piping. In the coating film forming method by the die coating method by the die coating method, the time delay of the discharge of the chemical solution is a cause of deterioration in thickness uniformity in the vicinity of the coating start portion and the coating end portion, or deterioration in quality such as gradation and unevenness. Therefore, it is not preferable. As a countermeasure, the coating speed can be lowered to weaken the influence of the response delay to some extent, but not only the processing time becomes long, the productivity is lowered, and the flow bubbles accompanying the chemical liquid are also moved and removed in most processes, thereby causing The responsiveness of the coating liquid changes, and it is difficult to maintain the production quality of stable uniformity (reproducibility). The present invention has been made in view of the above problems, and an object thereof is to provide a liquid supply system and the like which are excellent in safety, economy, and productivity. Means for Solving the Problems In order to achieve the above object, a first aspect of the invention provides a liquid supply system for supplying a liquid to a coating portion of a coating device, comprising: a storage portion for storing a liquid; and a first flow path a second flow path connected to the storage portion for supplying a liquid to the storage portion; a third flow path connected to the storage portion for supplying a gas to the storage portion; and a fourth flow path and the storage portion And the coating unit is connected to supply the liquid to the coating unit from the storage unit of the above 10 201114502; and the flow path of the (1) flow channel and the second flow channel can be detachably connected to the predetermined container, the first! The flow path (4) supplies a gas to the connected predetermined container. The storage unit has an air opening member for opening the inside of the storage unit to the atmosphere, and the first, second, third, and fourth flow paths are provided with opening and closing members for opening and closing the respective flow paths. Further, it is preferable that a liquid level detecting device for detecting the liquid level height is provided in the storage portion. The liquid supply system of the first aspect of the invention preferably further includes a container connecting portion that can detachably connect the predetermined container, and the first flow path and the second flow path can be connected to the receiving container via the capacitance II connecting portion. The above-mentioned container connecting portion has a (four) pattern on the inner peripheral surface, and can be connected to the container connecting portion and the predetermined container by screwing the internal thread to the external thread provided on the outer peripheral surface of the opening of the predetermined container. . , The first flow 4 supplies air to the connected predetermined container. The pressure in the predetermined container is the range of the grasping and seeing. ^ 四 ^ (4) The device may be a device used in the manufacture of a semiconductor device or a liquid crystal display device. (4) The application portion of the coating device refers to a device for ejecting a discharge system or the like to apply a chemical solution to a substrate or the like. And the inside of the storage unit can control the pressure state in the predetermined container, etc., and when the s is filled, the chemical liquid contained in the predetermined container is pressurized and transported into the storage unit of the coating device, and the inside of the storage unit is pressurized. The liquid is conveyed on one side of the cloth, and the liquid is supplied. Gp, which is not directly applied from the inside of the container to the inside of the pressurized storage unit when the liquid is delivered to the coating unit. Therefore, the pressure applied to the inside of the container for transporting the liquid to the storage portion can be, for example, a low pressure range of 5 kPa to 100 kPa. Therefore, a container capable of withstanding high pressure is not required as a container, and a tree stalker stalker, which is generally used for transportation of a chemical liquid, or the like, can be detachably connected to a flow path of the liquid supply system, and Use it in this state. After the liquid medicine in the container is used, it can be removed and replaced with other containers, which is economical. Since the pressure which can be added to the barn is suppressed to be low, the replacement operation of the container or the like can be performed safely. Further, since the liquid is supplied to the storage portion in a state where the inside of the predetermined container is at a low pressure, the dissolved gas of the liquid is not excessive. Therefore, generation of bubbles such as microbubbles due to cavitation can be suppressed. For this reason, it is possible to suppress the influence of the above-mentioned bubbles on the quality, and to suppress the delay time of the pressure increase in the pipe when the liquid from the coating portion (4) is applied, thereby reducing the shortage of the initial discharge amount and improving the quality of the product. In addition, when the liquid is delivered to the coating unit, the liquid medicine is supplied by the suction operation of the discharge unit such as the pump, and the pressure is applied to the sub-section (four). It can also offset the pressure loss caused by "etc. The negative pressure generated by the operation of the crucible and the generation of the suppression of the bubble are also likely to reduce the possibility of the discharge of the nozzle or the engine 7 of the nozzle or the engine. X connects the predetermined container to the flow path through the connection portion. In this case, the mosquito net container is connected by the external thread of the outer circumference of the opening portion of the sealing container by the screwing groove, and the airtightness is formed at the container connecting portion when the inner port P is inserted. The container 12 201114502 is loose or leaking at the connection. In addition, in the replacement of the 'Benefit joint loose, because the external thread of the container is connected to the second:: stuck, the ___ part does not fly: the gap caused by the relaxation of the joint is leaked, thereby enabling the Rongli to become Atmospheric waste. Therefore, the replacement operation of the container becomes safer. . p Safety In addition, the u (four) dip peak measuring member can be in the _ surface position according to the supply of the control liquid. Thereby, it is possible to dissolve the bulk layer and the gas layer in the liquid to be separated from the liquid. Therefore, it is possible to reduce the amount of gas in the supply:: in the body, and to further suppress the gas such as microbubbles: to provide a liquid supply system. The supply system is in the manufacture of a semiconductor device or a liquid helium display device. The safety and economic efficiency are excellent, and the liquid is supplied to the application portion of the coating device. In order to achieve the above object, the second invention is a liquid supply method for supplying a liquid to a coating portion of a coating device. The liquid supply method uses a night supply system having a storage for storing a liquid. a channel connected to the storage unit for supplying a liquid (4) to the storage unit, a flow connecting the third storage channel to the storage unit, and a storage unit and the storage unit The application portion of the coating device is connected, and the agitator is supplied to the application portion from the storage portion, and the flow path of the first flow path and the second flow path can be detachably connected to the predetermined container. The flow path can supply a gas to the connected predetermined container. The liquid supply method is characterized in that it includes a storage unit liquid supply program that is connected to a flow path of the first flow path and the second flow path by a gas supplied from a first flow path described in the above 13 201114502. The inside of the predetermined container is pressurized, and the liquid in the predetermined container is supplied into the storage unit through the second flow path; and the application unit liquid supply program is used to pressurize the inside of the storage unit by the gas supplied through the third flow path. The fourth flow path supplies the liquid in the storage unit to the application unit. According to the above configuration, the pressure state in the predetermined container and the pressure state in the storage portion can be independently controlled, and the liquid such as the chemical liquid contained in the predetermined container can be pressurized and transported, and once filled in the storage portion, the inside of the storage portion can be pressurized while The coating portion of the coating device supplies a liquid. In other words, it is possible to pressurize the inside of the storage portion when the liquid is conveyed to the application portion without directly transporting the liquid from the inside of the container to the application portion. Therefore, the pressure applied to the inside of the container for conveying the liquid to the storage portion can be made low. For this reason, a container which can withstand high pressure is not required as a container, and a container such as a resin container which is generally used for transportation of a chemical liquid or the like can be used as a predetermined container, and can be detachably connected to a flow path of the liquid supply system and used. After the liquid medicine in the container is used up, it can be removed and replaced with other containers, which is economical. Since the pressure applied to the container can be suppressed low, the replacement operation of the container or the like can be performed safely. Further, since the liquid is supplied to the storage portion in a state where the inside of the predetermined container is at a low pressure, the dissolved gas in the liquid is not excessive. Therefore, it is possible to suppress the generation of bubbles such as microbubbles caused by cavitation. For this reason, it is possible to suppress the influence of the above-mentioned bubble on the quality, and when the chemical solution from the coating portion is applied, the delay time of the pressure increase in the pipe is suppressed, and the shortage of the initial discharge amount is reduced, thereby providing a stable and uniform high-quality product. Further, when the liquid is transported to the coating unit, the energy can be 14 201114502, and the method of generating the suction operation (four) by the discharge unit such as the profit H and the medicine (four) by the inside of the pressure storage unit can be used. In the case of (4), the pressure loss caused by the filter or the like or the pressure of the accompanying suction operation is also related to the suppression of the generation of bubbles. Further, it is possible to reduce the possibility that the suction load is deteriorated or damaged by the discharge portion such as the discharge system or the engine parts thereof. Therefore, it is possible to provide a liquid supply method which is excellent in safety, economy, and productivity, and supplies a liquid to a coating portion of a coating apparatus. In order to achieve the above object, a third aspect of the invention provides a coating apparatus comprising the liquid supply system according to the first aspect of the invention. According to the above configuration, the pressure state in the predetermined container can be independently controlled, and the pressure state in the storage portion can be pressurized to transport the chemical solution or the like contained in the predetermined container. Once filled in the storage portion, the inside of the storage portion can be applied while being applied. The liquid application 1 is supplied to the application portion of the device, and the liquid is not directly transferred from the inside of the container to the application portion, but the inside of the storage portion is pressurized while the liquid is being pumped to the application portion. Therefore, the pressure applied to the inside of the container for transferring the liquid to the storage portion can be made, for example, in a low range of 5 kPa to leg Pa. For this reason, a container such as a resin container which is generally used for transportation of a chemical liquid or the like can be used as a predetermined container, and can be detachably connected to the flow path of the liquid supply system. Use it in this state. The liquid medicine in the container can be removed and replaced with other containers after use, and the economy is excellent. Since the pressure applied to the container can be suppressed to be low, the replacement operation of the container or the like can be performed safely. In addition, since the gas is generated in the storage portion 15 201114502 in a state where the inside of the predetermined container is in a low pressure, the exhaust gas in the liquid is excessive. Therefore, it is possible to suppress the generation of bubbles such as the product. For this reason, it is possible to suppress the above-mentioned intra-tracheal pressure: when applying the chemical solution from the coating portion, it is possible to suppress the insufficient delay time of the distribution and to reduce the shortage of the initial discharge amount, thereby providing a combination of two; Further, when the liquid is pumped to the coating portion, the liquid can be transported by the suction operation by the pressurizing portion, and the method of setting the excess can be used. Therefore, even if the piping is lost or the _ 抵消 offsets the transition device, etc. The pressure 夭 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ When the external thread of the outer circumference of the part is connected to the predetermined container, the inner portion of the container is sealed, and airtightness is formed in the container connecting portion, and slack or air leakage of the six-piece connecting portion is less likely to occur. Further, when the container is replaced, the tf device connecting portion is loosened. The external thread of the container and the internal thread of the container connecting portion are enough to be stuck. Therefore, the container or the container connecting portion does not scatter, and the pressurized milk body is separated from the gap caused by the slack, thereby enabling the entire container to become atmospheric pressure. Therefore, the replacement operation of the container becomes safer. The external 'readable sensing||etc. liquid level detecting means controls the supply of the liquid liquid according to the liquid level, so that the storage portion can be in the presence of the gas layer. In this way, the gas dissolved in the liquid can be dissipated into the gas layer in the storage portion to separate from the liquid. Therefore, the amount of gas mixed into the liquid supplied to the coating 16 201114502 can be reduced, and the microbubbles can be further suppressed. Therefore, it is possible to provide a coating apparatus which is excellent in safety, economy, and productivity. Advantageous Effects of Invention According to the present invention, it is possible to provide a liquid supply system and the like which are excellent in safety, economy, and productivity. Schematic diagram of an embodiment of a medium liquid supply system; Fig. 2 is a flow chart of a liquid supply method in a liquid supply system; Fig. 3 is a flow chart of a liquid supply method in a liquid supply system; and Fig. 4 is a liquid supply system Flow chart of the liquid supply method; Fig. 5 is a flow chart of the liquid supply method in the liquid supply system; Fig. 6 is a flow chart of the liquid supply method in the liquid supply system; Fig. 7 is a liquid supply system of the present invention BRIEF DESCRIPTION OF THE DRAWINGS FIG. 8 is a view showing an example of an attachment device; FIG. 9 is a view showing an example of a configuration of a coating device; and FIG. 10 is a view showing a financial packing capacity. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 11 is a view showing an example of a pressurized shield. [Embodiment] Embodiments of the present invention will be described below with reference to the accompanying drawings. The liquid supply system of this embodiment will be described with reference to Fig. 9. As shown in Fig. 9, the liquid supply system 该 of this embodiment is used as a part of the coating device 1 used for manufacturing a liquid crystal display device or a semiconductor device 17 201114502 In addition to the liquid supply system (1), the coating device includes a control unit 110, an application unit 120, a substrate holding unit 13 and the like. The control unit no is constituted by a CPU (Central Processing Unit) or the like, and controls the liquid supply system 1 or the coating unit. 120. Operation of the substrate holding portion 13A. The coating portion includes, for example, a nozzle discharge portion or a coating nozzle (molding mold) including a shirt (four) portion, and a driving mechanism for driving the discharge portion or the coating nozzle or the like on the substrate. A chemical solution such as a resist is actually applied. The substrate holding portion 130 includes, for example, a driving mechanism that places and controls a substrate, a reciprocable platform, and the like, and drives the above-described platform or the like. As shown in Fig. 1, the liquid supply system of this embodiment has a buffer tank 3 (storage portion), a line 5 (flow path), a valve 7 (opening and closing member), a regulator 9, and the like, and is ejected.卩13, the coating nozzle 14 (application portion (10)) side is supplied with a chemical liquid such as an anti-particle and a pigment dispersion liquid in a resin container 规定 (predetermined volume ||) (liquid sputum door 7, regulator 9, discharge unit 13, etc.) The operation of the buffer tank 3 is preferably made of a material or a structure excellent in resistance to (four) (four) degrees even under the supply of high-pressure gas (compressed gas, pressurized gas, etc.) of the dirty Pa or the like. Forming a container design that does not leak or leak or deform even under the pressurized state of at least fine coffee, and is capable of maintaining pressure resistance for a long time. However, the material and shape of the buffer tank are For example, as the material of the buffer tank 3, it is possible to use (10) 304, which does not record steel or the like, and the chemical liquid contained therein has the property of the metal of the button or the main reworkability, and the fuel pressure is satisfied. Under the circumstance, a fluororesin, an NC nylon, or the like may be used as a raw material. Further, in order to impart a chemical chemical, the inner surface may be coated with a resin filament layer. 201114502 A buffer tank 3 is also preferably provided to provide the sensor 4 As a test canister Since the liquid level detecting member of the liquid level is formed in a state in which an air layer of a predetermined volume or more is always present in the upper portion of the buffer tank 3, it is preferable to detect a predetermined liquid level (below the upper limit position) by, for example, the sensor 4 The height is used to control the opening and closing of the valve provided on the B road, thereby blocking the supply of the chemical liquid, etc., so that the liquid level south is not above the predetermined upper limit position. s road 5 (5-1, 5_2, 5_3, 5.4) , 5_5) is a gas or liquid flow path, including a flowable gas supply line (5", 5-3, 5-4) for supplying a gas or an open atmosphere, and a flowable liquid supply line for supplying the chemical liquid (W, 5). "Material shapes and the like can be used for materials and shapes commonly used in such pipes. s Road 5-1 (first flow path) extends from the air supply portion (not shown) and Μ 日 $ π π π 连接 连接 π π ^ π π π π π π π π π π ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ g g ^ The buffer tank 3 is connected. The line 5-2 supplies the resin to the buffer tank 3 by the siphon effect according to the pressure in the resin container 17. The piping line of the chemical liquid in the unit 17. The line 5-3 is a piping line that is connected to the outside and the buffering weight 3, and is used to open the buffer tank 3 to atmospheric pressure. The flow path is branched from the line 5] and connected to the buffer tank 3. The line 5-4 is connected to the air supply unit and the buffer for supplying the inside of the pressure buffer tank 3 to the buffer tank 3 Gas piping line. Guan Lu 5-5 (4th flow passage) is connected to buffer tank 3. Line 5-5 is from Qiongxiong, ° (Coating. 卩12〇) Link 5疋攸 buffer tank 3, the piping line for supplying the chemical liquid to the discharge portion 13 and the portion 120. The nozzle 14 is specifically coated 19 201114502 The door 7 (7), 7-2, 7-3, 7_4, 7·5) is open or blocked. The opening/closing member of the inside of the pipe 5 or the gas flow path is not particularly limited in its structure and the like. Various known structures can be used. Further, depending on various conditions, the control unit U0 can automatically control the opening and closing of the upper (four) door by the air control valve (4) as needed. It is also possible for the operator or the like to open and close the above-mentioned door by manual operation. Valve 7-1 (V1) is placed on the pipeline 5], and the valve 73 (v3) is provided with the pipeline = the gate 7 is placed on the pipeline 5-4, and flows through the corresponding pipeline 4 of the respective 4 airflow. It should be noted that the valve 7. 3 The airflow flowing through the pipe ^ is controlled by its opening and closing. «_The can 3 is open to the atmosphere (and the Kawasaki), and (4) is opened as an atmosphere. However, the mechanism for opening the buffer tank 3 to the atmosphere is not limited thereto. For example, if the outside of the buffer tank 3 is directly connected to the atmosphere, even a portion of the buffer tank 3 can function as an atmosphere opening member. Further, the valve 7-2 (V2) is disposed on the pipe 5_2, and the valve 7_5 (V5) is disposed on the pipe 5_5, and the flow of the chemical flowing in the corresponding pipe $ is adjusted by the respective opening and closing. In addition, although not shown in the drawings, a pipe for connecting the chemical liquid for the EJ retracting to the buffer tank 3 or a pipe for rinsing the solvent of the buffer tank 3 may be used with the respective pipes. A valve that controls the flow of liquid in the line by its opening and closing. The thief 9 (9-1, 9-2, 9-3) is a pressure regulating member for regulating the pressure of the gas supplied from the air supply portion to make the resin container 17 or the buffer tank 3 The pressure of the gas inside is any fixed pressure value. Like the door 7 20 201114502, the control can be automatically controlled by the control unit 11 according to various conditions or manually by the operator. The vertical regulator 9, 1 (REG1) is disposed on the line 5] to adjust the pressure of the gas supplied to the resin container 17 or the buffer tank 3 with respect to the branch portion of the line Η near the supply air H. The aligner 9-2 (REG2) is disposed on the pipe 5_丨 with respect to the branch portion of the pipe 5_4 near the resin container 17 side, and the pressure of the gas supplied to the resin container 17 is adjusted. -3 (REG3) is provided on the line 5-4 to adjust the pressure of the gas supplied to the buffer tank 3. The transition unit 11 is disposed on the line 5-5. As described above, the enthalpy is used to remove aggregated particles or gelatinous foreign matter, and the like, for example, a reticular or disk-shaped thick mesh transition device, a membrane filter, a fiber filter, or the like may be used alone or in combination (aperture For 〇_1~10μιη around the filter). It is also possible to provide the above described degassing element. The discharge portion 13 is connected to the line 5-5. The discharge portion 13 is, for example, a pump or a dispenser, and has a liquid storage portion (not shown) that stores the chemical liquid supplied to the coating nozzle 14. The discharge unit 13 sucks the chemical solution into the liquid storage unit, and then feeds the chemical liquid corresponding to the volume change of the liquid storage unit to the coating nozzle 14. The coating nozzle 14 is a die head, a syringe needle or the like, and is connected to the discharge portion 13 through a flow path. The coating nozzle 14 applies the chemical solution supplied from the discharge unit 13 to the substrate from an opening such as a slit. The discharge unit 13 and the coating nozzle 14 function as the application unit 120 of the coating device 1 and apply the chemical solution to the substrate in the coating program 21 201114502 for manufacturing a semiconductor or a liquid crystal display device. The resin container 17 is a container for storing a chemical liquid such as a resist or a pigment dispersion liquid, and a container having a small pressure deformation is used. Specifically, in such an environment that the pressure of 50 kPa is continuously applied to the inside, the amount of change in the volume of the container due to deformation can be suppressed to 5% or less from the start to 12 hours. Therefore, a resin container made of a resin having a bending modulus of 50 MPa or more is preferably used. However, the material or shape of the resin container 17 is not limited thereto, and for example, polyethylene or a fluororesin may be used as the material. In the case where the chemical solution is normally stored in a resin container, it is transported and supplied by a resist manufacturer or the like. However, the container at this time is safe for transportation, and generally satisfies the above-described strength. That is, it is possible to: directly apply the liquid chemical container for transport to the liquid supply system. In this case, it is necessary to use a container for the supply of (4), and in terms of economy, it is necessary to explain that if it is satisfied In the above conditions, the material of the container is not limited to the resin, and a container such as metal may be used instead of the resin. However, as described above, in order to prevent damage from the outside due to impact such as impact, it is preferable to use a resin-made container for polyethylene resin or the like to form a resin container. : Also:::: Circulation or heat _ gen device 15 (Rongke is connected to the pipe Η, pipe 5.2. As shown in Figure 8, the opening 24 in the upper part of the ΓΓ ( (injection port _ The external snail is provided on the outer peripheral surface; the text 25: 22 201114502 outer peripheral spiral connection, the horizontal direction of the attachment 15 ή / portion 24 protrudes. On the 25, ^ spiral H surface, an internal thread 27 is provided, which corresponds to the external thread J. The external thread and the internal thread are meshed, and can be mounted on the attachment device 15 and fixed to the opening portion 24 of the upper part of the material during the installation. 25 and the internal thread ^ / fat tolerance and Attachment 15 'move the external thread to the upper part. 2. Therefore, the resin container is mounted on the attachment device 15 : it is preferable to use a pressure-resistant property, and a material having a smaller pressure deformation than the resin-made leaking forest record 1 is used, for example, a part of the The above-mentioned H is a material' or a chemical resistant product is required, but it is not limited to the case where a material such as Teflon (registered trademark) is used in this case to prepare a resin material 5, 'If the resin container 17 is directly pressurized , then slightly inflated from the inside. At this time, the externally-mounted external thread 25 of the opening of the resin container 17 isotropically pressed from the inner side to the internal thread 27 of the high-deformation high-pitch 5, and is tempered to improve airtightness, so that the attachment is attached. 15 of the pine or the gas (1) caused by it. ρ makes the attachment 1515 loose. 'Because the external thread 25 of the resin container 17 (4) the (four) pattern 27 of the shirt 15 can be caught, the external thread 25 is locked by the internal thread 27, the attachment device is called to scatter, and the pressure is applied. When the gas escapes from the gap generated by the relaxation, the inside of the resin container 17 can be safely brought to atmospheric pressure. The area of the yokes and the yokes can be controlled by the cross-sectional area of the opening portion 24 (the diameter of the casing portion is smaller than that of the casing portion) in the upper portion of the resin container 17, and the force applied to the attachment device 15 is less than the size of 23 201114502. The lid portion of the pressure-resistant packaging container having a diameter of the body of the resin container i7 or more can further provide a full operating environment. For example, if the diameter of the cap of the cylindrical pressure-resistant packaging container (stainless steel container or the like) is 300 mm, the force applied to the entire cover portion when the pressure of M100 kPa is applied to the inside is about 7065 N/m2. On the other hand, the attachment 15 attached to the injection port of the resin container 17 may have a diameter of about 80 mm. At this time, if a pressure of 10 kPa is applied to the resin container 17 (as will be described later, the resin container η may be at a low pressure in the liquid supply system )), the attachment 15 receives a force of about 5 (). 24 test 2, the size of 1/100 or less, it is known that the safety is further improved. Further, the attachment 15 has at least one or more pressurizing ports 22 and a liquid supply port 23'. The pressurizing port 22 is detachably connected to the pipe 5·1, and the liquid feeding e23 is detachably connected to the pipe 5·2. The pressurizing port 22 is connected to the pipe 5-1 at one end, and the dam of the attachment device 15 in the direction (4) of the t (b) is guided to the inside of the connecting pipe 5_丨 and the resin container 17. The port 23疋(4) is connected to the pipe 5_2, and the flow path through which the attachment U passes in the direction of the resin container is electrically connected to the inside of the pipe container 17. In addition, the other end of the October 曰 鸲. The 卩 is a siphon 19. The siphon extends to the tube body at the lower portion of the resin container 17. The following is a description of the flow of the liquid supply method in the liquid supply system 1 of the ° 说 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 Θ When the liquid supply system 1 performs liquid supply, the pipe Μ and the pressurizing port 22 are connected, and the pipe 24 201114502 road 5-2 and the liquid supply port 23 are connected, and the auxiliary device 15 is as above in the material 5], the pipe The resin preparation portion 24 is mounted on the upper side of the road 5_2. Or the money is loaded with the silk tree as above. $ _ 1 The device 15 is installed on the pipeline 5-1, the pipeline 5 2 and the benefit is 17, and then attached. Next, as shown in Fig. 2;

内供給加壓嶋(壓一：^管路M等向樹脂製容器P 液的樹康扣_。==；^)，加壓儲存有藥 中，利用咖9]、^打開閥叫。在該實施方式 並保持該壓力。再_ρ Ρ7=·2將該壓力調錢咖左右， 衝_成大氣壓。另卜^ 另外，在關閉閥門7-5的同時打開間 門7 2肖先使緩衝罐3内處於可填充藥液的狀態。但是， 緩衝罐3内只要是低於樹脂製容器17内的壓力狀態即可，在 該限定中’即使是高於大氣壓的壓力狀態也可以。 如果為上述狀態，關时隨樹脂製容器17内（10kPa) 和緩衝罐3内（大氣壓）的氣壓差的虹吸效應樹脂製容器η 内的藥液通過管路5_2被供給至緩衝罐3内，如第3圖所示， 藥液被填充到緩衝罐3内。由於樹脂製容器17内處於低壓狀 態，所以不會導致藥液中溶存的氣體過量。 需要說明的是，在大氣壓環境下，如果對密封的樹脂 製容器17内部長時間施加超過1〇〇kPa的恒壓，則隨著時間 的遷移發生膨脹，有可能存在漏液或破裂、翻倒，並出現 能否確保操作者的安全性等問題。因此，在該實施方式的 供液系統1中，為確保安全，樹脂製容器17内部的氣體壓力 在5kPa〜100kpa的範圍。另外，在更確實地保證安全性的情 25 201114502 況下，優選使壓力在5kPa〜50kPa的範圍而加以使用。但是， 根據樹脂製容器Π的強度或使用其他容器代替樹脂製容器 17等的情況下，只要不漏液或破裂、翻倒，並確保操作者 的安全性等，有時也變化可以施加的壓力。 此處，21是氣液分離面，是藥液上部的液面。供給藥 液時’氣泡也有可能從樹脂製容器17側的管路等没入藥 液，但是如上所述，在緩衝罐3中設置氣液分離面21，用於 分離混入藥液的氣泡和藥液，並除去氣泡。即，藥液的上 部達不到緩衝罐3的上表面，而通常確保充滿了空氣等氣體 的空間在規定體積以上。由此氣泡上升至氣液分離面21， 被排放到上部的氣體中，從而與藥液分離。 因此，優選在緩衝罐3中設置上述的感測器4。而且， 為了使緩衝罐3内的上部處於一直存在規定體積以上的空 氣層的狀態，優選通過感測器4檢測適當規定（上限位置以 下）的氣液分離面21的高度，來利用閥門的開閉控制等進行 藥液供給的阻斷等，從而使氣液分離面21不在預先規定的 上限位置以上。 需要說明的是，在緩衝罐3單獨的氣液分離能力不充分 的情況下，可以在管路等以其他方式追加氣液分離容器或 脫氣元件等氣泡除去裝置。 另外，作為在緩衝罐3内更有效地脫氣的例子，例如， 可以在緩衝罐3上在圓筒狀緩衝罐3的水平内壁切線方向或 相對内壁傾斜的方向設置用於流過經管路5-2供給的藥液 的貫通孔，從該貫通孔向緩衝罐3的内壁切線方向或相對於 26 201114502 内壁傾斜的方向喷出藥液。此時在緩衝罐3内形成藥液的旋 轉流，因而產生渦流效應，由此在緩衝罐3的内壁方向移動 密度高的液體’而在水平中央方向流動密度低的氣體。氣 體自緩衝罐3的水平巾央部移動至氣液分離面2卜由此也能 夠提焉氣液分離性。 在1、給的藥液量或流速不足 力>τThe inside is supplied with a pressurization 嶋 (pressure one: ^ pipe M, etc. to the resin container P liquid tree 康 _. ==; ^), pressurization and storage of medicine, use the coffee 9], ^ open the valve. In this embodiment and maintaining this pressure. Then _ρ Ρ7=·2 adjusts the pressure to the left and right, and rushes into atmospheric pressure. In addition, when the valve 7-5 is closed, the door 7 is opened to make the buffer tank 3 in a state in which the liquid medicine can be filled. However, the inside of the buffer tank 3 may be lower than the pressure state in the resin container 17, and in this definition, it may be a pressure state higher than atmospheric pressure. In the above state, the chemical liquid in the siphon effect resin container η which is separated from the inside of the resin container 17 (10 kPa) and the pressure inside the buffer tank 3 (atmospheric pressure) is supplied to the buffer tank 3 through the line 5_2. As shown in Fig. 3, the chemical solution is filled into the buffer tank 3. Since the inside of the resin container 17 is in a low pressure state, it does not cause an excessive amount of gas dissolved in the chemical solution. In the atmospheric pressure environment, if a constant pressure of more than 1 kPa is applied to the inside of the sealed resin container 17 for a long period of time, expansion occurs over time, and there is a possibility of liquid leakage or cracking, overturning. And there are problems such as ensuring the safety of the operator. Therefore, in the liquid supply system 1 of the embodiment, in order to ensure safety, the gas pressure inside the resin container 17 is in the range of 5 kPa to 100 kPa. Further, in the case where the safety is more reliably ensured, it is preferable to use the pressure in the range of 5 kPa to 50 kPa. However, depending on the strength of the resin container 或 or the use of another container instead of the resin container 17 or the like, the pressure that can be applied may be changed as long as it does not leak, rupture, or fall over, and ensures the safety of the operator. . Here, 21 is a gas-liquid separation surface, and is a liquid surface on the upper portion of the chemical liquid. When the liquid is supplied, the air bubbles may be detached from the liquid pipe or the like on the resin container 17 side. However, as described above, the gas-liquid separation surface 21 is provided in the buffer tank 3 for separating the air bubbles and the chemical liquid mixed with the chemical liquid. And remove the bubbles. That is, the upper portion of the chemical solution does not reach the upper surface of the buffer tank 3, and generally the space filled with gas such as air is required to be a predetermined volume or more. Thereby, the bubble rises to the gas-liquid separation surface 21, and is discharged into the upper gas to be separated from the chemical liquid. Therefore, it is preferable to provide the above-described sensor 4 in the buffer tank 3. Further, in order to keep the upper portion of the buffer tank 3 in a state in which an air layer of a predetermined volume or more is always present, it is preferable that the height of the gas-liquid separation surface 21 appropriately defined (below the upper limit position) is detected by the sensor 4 to open and close the valve. The control or the like performs the interruption of the supply of the chemical liquid or the like so that the gas-liquid separation surface 21 is not above the predetermined upper limit position. In the case where the gas-liquid separation capacity of the buffer tank 3 alone is insufficient, a gas-liquid separation container or a bubble removing device such as a deaeration element may be additionally added to the piping or the like. Further, as an example of more effective degassing in the buffer tank 3, for example, it may be provided on the buffer tank 3 in the tangential direction of the horizontal inner wall of the cylindrical buffer tank 3 or in the direction inclined with respect to the inner wall for flowing through the pipe line 5. The through hole of the chemical liquid supplied to the -2 is discharged from the through hole to the inner wall of the buffer tank 3 in the tangential direction or in the direction inclined with respect to the inner wall of the 201114, 502502. At this time, a swirling flow of the chemical liquid is formed in the buffer tank 3, so that a vortex effect is generated, whereby a liquid having a high density is moved in the inner wall direction of the buffer tank 3, and a gas having a low density flows in the horizontal center direction. The gas moves from the central portion of the horizontal towel of the buffer tank 3 to the gas-liquid separation surface 2, whereby the gas-liquid separation property can also be improved. In 1, the amount of liquid or flow is insufficient, force > τ

/卜月匕个Τ玉1J 日V 一:脫氣的充分的旋轉流時，可以在緩衝罐3内設置磁性撥 旁或攪拌螺方疋柴等旋轉翼，由此強制性形成藥液的旋轉 =因此時’旋轉翼的形狀如果為例如面向上部擴展的形狀， 、^成面向上_氣液分離面21的旋風狀旋轉流，故優選。 卜為了收集在旋轉流作用下向緩衝罐3的水平中央 體2移動的氣泡，將其導向上枝液分離面21並排放到氣 、’可以在内部設置集泡管，該集泡管是側面具有用於 隼2收集氣泡的孔部的管體。在集泡管的内部，氣泡聚 ，、/成大氣泡，從而促進向上方移動。 八離；第4圖所不’如果上述感測器4檢測到液面高度（氣液 的供、）到達了規定位置’關閉閥門7-2，阻斷經由管路5-2 開放 缩氣^ °緩衝罐3内供給加壓用氣體(壓、缩空氣或壓 體所=等）、’對緩衝罐3施加向喷出部13(塗布部12G)輸送液 上的壓力。需要說明的是，此時間門Μ處於關閉狀態。 在喷出=== 是加，送藥液所需的壓力’該壓力 減Μ等“ 產生氣壓差，並能夠抵消過 起的管路5·5處的壓力損失或伴隨喷出部η的 27 201114502 樂液抽吸操作的負壓。在供液系㈣1緩衝罐3内施加 Pa〜2〇GkPa左右的範圍内的必需壓力，但並不限定於 此，根據緩衝罐3的強度等，變化可根據需要而施加的壓力。 對緩衝罐3内的藥液施加上述規定的懕 _ 至力後，如第5圖 所示，打開閥門7-5，同時利用噴出部13進行藥液的抽吸， 向喷出部13的儲液部填裝藥液，並利用塗布噴嘴μ在基材 上塗布藥液。 土 設置在管路5-5上的過渡器llf在管路5_5造成壓力損 失。另外，伴隨喷出部13的抽吸操作儲液部產生負壓，形 成抽吸負壓。還存在以下擔心：與壓力損失高的過據別 等之間的流勒也產生壓差，並且因管路5_5的内部或儲液 部内的氣姓，殘留在藥液中的溶存氣體發泡。 但是，在該供液系統1中，利用喷出部13抽吸藥液的同 時，加壓緩衝罐3内部’並施加能夠抵消過濾器丨丨等產生的 壓力損失或負壓的程度的壓力幫助輸送液體，所以能夠防 止上述的管路5-5或儲液部内的發泡。還能夠抑制因抽吸時 對喷出泵的發動機等喷出部13的過大的負荷而導致部件劣 化、損傷。 需要說明的是，在因緩衝罐3内的輔助加壓導致儲液部 殘留少許壓力，塗布開始時藥液溢出或者藥液從塗布噴嘴 14等洩漏（有可能）的情況下，通過在該塗布前進行預分配 (predispense)操作，能夠使塗布部12〇(從儲液部到塗布喷嘴 14的開口部的流道等）恢復大氣壓，或者打開閥門7-3使緩衝 罐3向大氣開放，然後打開閥門7_5，由此除去儲液部内殘 28 201114502 留的壓力，調整塗布部120與大氣壓相同。 也可以同時進行向緩衝罐3内供給藥液和自緩衝罐3向 塗布部12G供給㈣。純情況下，缝分離面21如果達到 了規定的位置，則在打開閥門7-2的狀態下進行加壓緩衝罐 3内邛以及自緩衝罐3向喷出部13、塗布噴嘴μ等塗布部 供給藥液。 ^ J %开罙砍分離的氣泡與藥液一同被吸入管路5_5 或者充分分離氣體之前的藥液被吸入管路5-5(有可能）的情 可以首先向緩衝罐3内供給藥液，然後，開放—段時 間，即為分離氣體，向上方排出氣、泡，完成氣液分離所需 夺間間隔’之後打開閥門7 5，通過管路向塗布部供 旦^液^由於藥液的黏度或添加到藥液中的表面活性劑的 〜曰^肖祕有時不同，此時的待機時間沒有制規定。 經以均作，形成以低壓加㈣⑽製容心内 二藥液中的溶存量，並且在緩衝罐3内將氣泡 ”、中讀’向塗布部12G選擇性地僅供給液體。 ::内的輔助加壓抵消過澹器U等產生的壓力損失或 迎吸操作的負壓，從而能夠向塗布士 此能夠抑制上述的氣泡對品質的影響。而且= =:::嘴14喷_時，能夠抑制配管内 足遲並 =降齡隨壓力上升延遲時間的初期噴出量不 、'提仏穩定均一性的高品質產品。 如第二？明的是，如果完成Μ13的儲液_^ 圖所示，關閉閥門7_4、閥門h，然後打開閥門仏 29 201114502 將緩衝罐3内向大耽開放。先於閥門7_3賴閥門7_5是為了 防止向大氣開放時藥液向緩衝罐3内倒流。 如果打Mm2 ’則如第6圖所示，再—次利用樹脂 製容器17和緩衝罐3内的壓力差產生的虹吸效應，將樹脂製 容器17内的藥液通過虹吸管19、送液σ23、管路5_2加壓送 至緩衝罐3内，從而在緩衝罐3内填充藥液。 如以上說明’該實施方式的供液系統遣夠在獨立的壓 力狀態下分離控職脂製容器17和緩衝罐3㈣部。由此， 在維持施加在樹脂製容器17内的低壓（例如5kPa〜1〇〇kPa的 範圍）的同時使緩衝罐3内處於大氣壓狀態，然後打開管路 5-2的閥Η7·2，由此利肢吸效應向_罐3供給藥液。 因此’不必將樹脂製容器17與耐壓包裝容器或加壓護 板合併使用或者使用強度特別高的容器，可以單獨使用通 常用於輸送時等的樹脂製容器作為樹脂製容器17，所以消 減設備費用以及簡化安全裝置機構，從而提高經濟性。另 外’提高用盡了藥液容器内的殘液時的容器替換或清掃等 操作性，從而能夠有效地應用。而且在再循環方面也是優 選的。還由於將施加在容器内的壓力抑制為低壓，所以能 夠安全地進行容器的替換操作等。 另外’在樹脂製容器17内處於低壓的狀態下向緩衝罐3 供液’所以不會導致藥液中的溶存氣體過量。因此，能夠 抑制在管路5-5或儲液部内的發泡。並且向塗布部120供給 緩衝罐3内的藥液時，施加一定程度的較低的低壓力以抵消 由過濾器11等產生的壓力損失等’輔助喷出泵(注射器、管 30 201114502 膜㈣咖㈣、橫㈣咖如續 即使在管路5—5上設置過據器;= 夠抵消過㈣叫造成的壓力損失或 壓，並抑制管路5_5或儲液部内的發泡。細作的負 由此此夠抑制上述的氣泡對品質的影響。而且能夠消 除㈣開始時壓力上升時間因氣泡而延遲，從而能夠利用 穩定的藥液輸送進行精密、均勻的塗布。因此，能夠容易 維持穩㈣—的高品質，並提高生產率。還能夠抑制抽吸 時喷出部的發動機等嘴出部13因過度負荷而導致零件劣 化、損壞。 另外供液系統1中，雖然對樹脂製容器17直接加壓， 但此時通過附屬裝置15連接管路5小管路5_2和樹脂製容器 17。使樹脂製容n 17的開口料(注人口）外周面的外螺紋^ 與對應於外螺紋25設置的附屬裝置15内周面的内螺紋27螺 合，從而將樹脂製容器Π安裝到附屬裝置丨5上。因此，在 加壓引起树月g製容器17稍微膨脹時，由於其開口部％外周 面的外螺紋25與附屬裝置15的内螺紋27嚙合，所以氣密性 變高’鬆弛或洩漏的危險性降低。 另外，在替換容器等時，即使發生附屬裝置15的鬆弛， 由於能夠在樹脂製容器17的外螺紋25和附屬裝置15的内螺 紋27處卡住，所以外螺紋25被内螺紋27卡定，從而附屬裝 置15不會飛散，而且由於加壓用氣體從因鬆弛而形成的間 隙中逸出’所以能夠安全地使樹脂製容器17内變成大氣壓 狀態。並且附屬裝置15的截面積能夠小至樹脂製容器17的 31 201114502 開口。卩24裡度，由此使附屬裝置15所承受的力變小。因 能夠提供更安全鳴作環境。 —另外，緩衝罐3内設置感測器4，由此根據液面位置控 制樂液供給’並能夠形成缓衝罐3内通f存在—定體積: 體層的狀態。因此，能夠使由自管路5_2等混入藥液中的^ 成的氣/包上升，從氣液分離面21排出，與藥液分離。 二:制氣㈣人憎13、塗布她4等塗布部咖 B 5内’從而抑制微泡等氣泡的產生。 喷出。IU3的儲液部的藥液中不蓄積過剩的壓力，並 塗布則進仃預分配操作或者通過打開間門7小間門7 儲液部内的殘留壓力，從而與大氣壓相 噴嘴14内的筚液在舍右乂 b月匕夠抑制 幻樂液在塗布刖被擠出或者在噴出開始時溢出 〜利用第7圖對本發明的供液系統的其他實施方式進L 說明。第7圓中對具有與幻圖相同功 :丁 同的符號，並省略說明。 肖㈣件I己相 在該實施方式的供液系統3 氣部(圖中未示出μ (第1流道)自供 )、伸，/、祕脂製容器17連接。 脂製容器17内，管路56你徂名如人 钱為了加壓樹 Θ吕路5-6從供乳部向樹脂 官路”(第3流道〕自供氣部(圖中未 供，了體。 罐3連接。為了加壓緩衝罐 μ _，與緩衝 3内供給氣體。 ^路5·7從供氣部向緩衝罐 即’在該實施方式中，士 管路（管-7)不是從向樹脂製給加壓用氣體的 管路（管路5-6)分路，上。中供給加壓用氣體的 i料路獨立地與供氣部連接而設 32 201114502 調節器9-2，在管路 獨立控制樹脂製容 置。在^路5·6的管路上設置閥門7-1和 的S路上。又置閥門7-4和言周節器9-3， 器17、緩衝罐3内的加壓狀態。 此婦況下，與上灿_方法 =也，4等塗布部·藥液進行塗布，此: 的效果也與上述相同管路或閥門、調節器的配置等 只要能夠進行下述操作即可，並不限定於實施方式所示的 配置，所物作為向樹脂製容器17内導入氣體(低壓）進行加 壓’利用樹脂製容器17内與緩衝罐3内的壓差向緩衝罐3内 供給藥液，'然後向緩衝罐3内導人氣體，對緩衝罐3内的藥 液施加規定的壓力（與噴出部13的藥液抽吸操作並朴同時 將藥液輸送至塗布部12〇。 如以上所說明的，利用該實施方式，能夠提供安全性、 經濟性、生產率優良的供液系統等。 需要說明的是，該供液系統丨的適用範圍優選的藥液是 具有1〜lOOmPa.s左右、優選左右的黏度的液體更 優選為牛頓流體。這是適合於模壓塗布法中的逐張塗布的 藥液的物性，但對於具有觸變性等的非牛頓流體的藥液也 能夠適用。 從其他觀點考慮’適用範圍優選的藥液是使用 PGMEA、PGME、EEP、MB A、EDM、DMDG、乙酸丁 酉旨、 乳酸乙酯等作為主溶劑的藥液，作為具體用途的例子，可 以舉出半導體或液晶顯示裝置的製造中的半導體用光刻 法、有源矩陣元件、配線形成用光刻法、渡色器形成用光 33 201114502 刻法等的程序，例如如果是濾色器形成用光刻法的程序， 則包括遮光用黑色矩陣的形成、著色用rGBY或CMY彩色 圖凡的形成、白層（white layer)或散射層的形成、取向設定 用犬起的^/成、LCD間隙控制材料(ph〇t〇 spacer)的形成、 保護層（overcoat layer)的形成等。 另外’進行藥液塗布的被塗布基材包括矽片、玻璃、 金屬、塑膠、膜⑼叫等。 以上參照附圖對本發明的供液系統等的優選實施方式 進行了說明，但並不限定於本發明的舉例。對於本領域技 老人員而言，在本申請公開的技術思想的範圍内，能想到 各種變型例或修正例是顯而易見的，它們也應當屬於本發 明的技術範圍。 I圖式簡軍說*明】 第1圖為本發明中供液系統的實施方式的示意圖； 第2圖為供液系統中的供液方法的流程圖； 第3圖為供液系統中的供液方法的流程圖； 第4圖為供液系統中的供液方法的流程圖； 第5圖為供液系統中的供液方法的流程圖； 第ό圖為供液系統中的供液方法的流程圖； 第7圖為本發明的供液系統的其他實施方式的示意圖； 第8圖為表示附屬裝置的例子的附圖； 第9圖為表示塗布裝置結構的例子的附圖； 第10圖為表示耐壓包裝容器的例子的附圖； 第11圖為表示加壓護板的例子的附圖。 34 201114502 【主要元件符號說明】 1···供液系統 25…外螺紋 3…緩衝罐 27...内螺紋 4…感測器 31...樹脂製容器 5(5-1、5-2、5-3、5·4、5-5).··管路 33...虹吸管 7(7-1、7-2、7-3、7·4、7-5)···閥門 35...耐壓包裝容器 9(9-1、9-2、9-3)..·調節器 11…過濾器 13…泵 14…塗布噴嘴 15…附屬裝置 17…樹脂製容器 19···虹吸管 21…氣液分離面 22…加壓口 23…送液口 24...開口部 37(37-1、37-2).··管路 39(39-1、39-2)…閥門 41.. .調節器 43.. .過濾器 45·.·噴出部(喷出泵等) 47.. .塗布噴嘴 100…塗布裝置 110.. .控制部 120·.·塗布部 130.. .基板保持部 35/ 卜月匕一Τ玉1J日 V一: When the degassing is full of swirling flow, a rotating wing such as a magnetic dial or a stirring screw, which can be formed in the buffer tank 3, is mandatory to form a rotation of the liquid medicine. Therefore, it is preferable that the shape of the rotary wing is, for example, a shape that expands toward the upper portion, and a swirling swirling flow that faces the gas-liquid separation surface 21 upward. In order to collect the bubbles moving to the horizontal central body 2 of the buffer tank 3 under the action of the swirling flow, directing them to the upper liquid separation surface 21 and discharging them to the gas, 'a bubble collecting tube may be provided inside, the collecting tube has a side surface The tube body for the hole portion of the 隼2 collecting bubble. Inside the collecting tube, the bubbles gather, and/or become large bubbles, thereby promoting upward movement. 8: If the above sensor 4 detects that the liquid level (supply of gas and liquid) has reached the specified position, 'close the valve 7-2, block the opening of the air through the line 5-2 ^ In the buffer tank 3, a pressurized gas (pressure, reduced air, or a compressed body = or the like) is supplied, and "the pressure applied to the discharge tank 13 (application portion 12G) is applied to the buffer tank 3. It should be noted that this time threshold is closed. When the discharge === is added, the pressure required to deliver the liquid medicine 'the pressure minus the enthalpy, etc.' generates a pressure difference, and can offset the pressure loss at the passage 5·5 or the accompanying discharge portion η. 201114502 Negative pressure of the liquid suction operation. The required pressure in the range of about Pa~2〇GkPa is applied to the liquid supply system (4)1 buffer tank 3. However, the pressure is not limited thereto, and the change may be according to the strength of the buffer tank 3 or the like. Pressure applied as needed. After applying the above-described predetermined 懕_ to force to the chemical solution in the buffer tank 3, as shown in Fig. 5, the valve 7-5 is opened, and the discharge portion 13 is used to suction the chemical liquid. The chemical solution is filled into the liquid storage portion of the discharge portion 13, and the chemical liquid is applied to the substrate by the application nozzle μ. The transition piece 11f provided in the line 5-5 of the soil causes a pressure loss in the line 5_5. With the suction operation of the discharge portion 13, the liquid storage portion generates a negative pressure to form a suction negative pressure. There is also a fear that a pressure difference is generated between the flow rate and the high pressure loss, and the flow is also caused by the flow. The internal gas in the 5_5 or the gas in the liquid storage part, and the dissolved gas remaining in the chemical liquid foams. In the liquid supply system 1, the liquid medicine is sucked by the discharge unit 13, and the inside of the pressure buffer tank 3 is pressurized and a pressure that can offset the pressure loss or the negative pressure generated by the filter or the like is applied to help convey the liquid. It is possible to prevent the above-described pipe 5-5 or the inside of the liquid storage portion from being foamed. It is also possible to suppress deterioration and damage of the member due to an excessive load on the discharge portion 13 such as the engine that ejects the pump during suction. When a small amount of pressure remains in the liquid storage portion due to the auxiliary pressurization in the buffer tank 3, and the chemical liquid overflows at the start of application or the chemical liquid leaks from the coating nozzle 14 or the like (possible), pre-distribution is performed before the coating. (predispense) operation, the application portion 12 (the flow path from the liquid storage portion to the opening portion of the coating nozzle 14) can be restored to atmospheric pressure, or the valve 7-3 can be opened to open the buffer tank 3 to the atmosphere, and then the valve 7_5 is opened. Thus, the pressure remaining in the liquid storage portion residue 28 201114502 is removed, and the application portion 120 is adjusted to be the same as the atmospheric pressure. The chemical solution can be supplied to the buffer tank 3 and supplied from the buffer tank 3 to the coating portion 12G (4). When the slit separation surface 21 reaches a predetermined position, the inside of the pressure buffer tank 3 is opened in a state where the valve 7-2 is opened, and the medicine is supplied from the buffer tank 3 to the application portion such as the discharge unit 13 or the coating nozzle μ. Liquid. ^ J % open and chopped separated air bubbles are sucked into the line 5_5 together with the liquid medicine or the liquid before the gas is sufficiently separated is sucked into the line 5-5 (possibly). The medicine can be supplied to the buffer tank 3 first. The liquid is then opened for a period of time, that is, the gas is separated, the gas and bubbles are discharged upward, and the interval between the gas and liquid separation is completed, and then the valve is opened, and the liquid is supplied to the coating portion through the pipeline. The viscosity of the surfactant added to the liquid medicine is sometimes different from that of the surfactant, and the standby time at this time is not regulated. The mixture is uniformly formed to form a dissolved amount in the two chemical liquids in the core at a low pressure plus (4) (10), and the bubble ", medium read" is selectively supplied to the coating portion 12G only in the buffer tank 3. The auxiliary pressurization cancels the pressure loss generated by the damper U or the like, or the negative pressure of the suction operation, so that the influence of the above-mentioned bubble pair quality can be suppressed to the coating. Moreover, when the nozzle 14 is sprayed, the nozzle 14 can be sprayed. It is a high-quality product that suppresses the delay in the piping and the initial discharge amount of the delay time with the pressure rise delay, and the high-quality product of the stability and uniformity of the lifting. As the second is, if the storage of the Μ13 is completed, Close the valve 7_4, valve h, and then open the valve 仏29 201114502 Open the buffer tank 3 to the large raft. Before the valve 7_3 depends on the valve 7_5 to prevent the liquid medicine from flowing back into the buffer tank 3 when it is open to the atmosphere. Then, as shown in Fig. 6, the liquid medicine in the resin container 17 is passed through the siphon 19, the liquid supply σ23, and the line 5_2 by the siphon effect by the pressure difference between the resin container 17 and the buffer tank 3. Pressed into the buffer tank 3, thereby in the buffer tank 3 The liquid supply system is filled as described above. The liquid supply system of this embodiment separates the control grease container 17 and the buffer tank 3 (four) portion under independent pressure conditions. Thereby, the low pressure applied in the resin container 17 is maintained. At the same time (for example, a range of 5 kPa to 1 kPa), the inside of the buffer tank 3 is in an atmospheric pressure state, and then the valve Η 7·2 of the line 5-2 is opened, whereby the absorbing effect is supplied to the _ tank 3 by the limb absorption effect. 'It is not necessary to use the resin container 17 in combination with the pressure-resistant packaging container or the pressure-resistant protective sheet, or to use a container having a particularly high strength. A resin container which is usually used for transportation or the like can be used as the resin container 17 alone, so that the equipment cost is reduced. Further, it is possible to improve the economy by simplifying the safety device mechanism, and it is also effective in improving the operability such as container replacement or cleaning when the residual liquid in the chemical liquid container is used up. It is also preferable in terms of recycling. Since the pressure applied to the container is suppressed to a low pressure, the replacement operation of the container or the like can be performed safely. Further, 'the resin container 17 is in a low pressure state. Since the liquid is supplied to the buffer tank 3, the amount of the dissolved gas in the chemical solution is not excessive. Therefore, it is possible to suppress the foaming in the conduit 5-5 or the liquid storage portion, and supply the chemical solution in the buffer tank 3 to the coating portion 120. At the time, a certain degree of low low pressure is applied to offset the pressure loss caused by the filter 11 or the like. [Assistor ejection pump (syringe, tube 30 201114502 membrane (four) coffee (four), horizontal (four) coffee continues even in the pipeline 5 - 5 is provided with a filter; = can offset the pressure loss or pressure caused by (4), and inhibit the foaming in the pipe 5_5 or the liquid storage portion. The negative of the fine thus reduces the influence of the above-mentioned bubble on the quality. It is possible to eliminate the delay of the pressure rise time at the start of (4) due to the bubble, and it is possible to perform precise and uniform coating by stable chemical liquid transport. Therefore, it is possible to easily maintain the high quality of the (four)-- and increase the productivity. Further, it is possible to suppress deterioration or damage of the parts due to excessive load due to excessive load on the nozzle portion 13 such as the engine of the discharge portion at the time of suction. Further, in the liquid supply system 1, the resin container 17 is directly pressurized, but at this time, the small line 5_2 of the line 5 and the resin container 17 are connected by the attachment 15. The external thread of the outer peripheral surface of the opening material of the resin preparation n 17 is screwed with the internal thread 27 of the inner peripheral surface of the attachment 15 provided corresponding to the external thread 25, thereby mounting the resin container to the attachment.丨5. Therefore, when the pressurization causes the container 17 to slightly expand, since the external thread 25 of the outer peripheral surface of the opening portion meshes with the internal thread 27 of the attachment 15, the airtightness becomes high, and the risk of slack or leakage is high. reduce. Further, when the container or the like is replaced, even if the slack of the attachment 15 occurs, since the external thread 25 of the resin container 17 and the internal thread 27 of the attachment 15 can be caught, the external thread 25 is locked by the internal thread 27, Therefore, the attachment device 15 does not scatter, and since the pressurized gas escapes from the gap formed by the slack, the inside of the resin container 17 can be safely brought into an atmospheric pressure state. Further, the sectional area of the attachment 15 can be as small as the opening of the 2011 17502 of the resin container 17. The 卩 24 degrees, thereby reducing the force that the attachment 15 is subjected to. Because it provides a safer environment. - In addition, the sensor 4 is disposed in the buffer tank 3, whereby the liquid supply is controlled according to the liquid level position and the state of the body layer can be formed in the buffer tank 3. Therefore, the gas/package which is mixed in the chemical liquid from the pipe 5_2 or the like can be raised, discharged from the gas-liquid separation surface 21, and separated from the chemical liquid. Second: gas production (4) human 憎 13, coating her 4 etc. coating department B 5 inside 'to suppress the generation of bubbles such as microbubbles. ejection. Excessive pressure is not accumulated in the liquid medicine of the liquid storage portion of the IU3, and the coating is carried out in the pre-dispensing operation or by opening the residual pressure in the liquid storage portion of the small door 7 of the door 7, so that the liquid in the atmospheric pressure phase nozzle 14 is The right side of the month is sufficient to suppress the magic liquid from being squeezed out at the coating crucible or overflowing at the beginning of the ejection - another embodiment of the liquid supply system of the present invention will be described with reference to Fig. 7. In the seventh circle, the symbols have the same functions as those of the magic map, and the description is omitted. The fourth component is connected to the gas portion of the liquid supply system 3 of the present embodiment (the μ (first flow path) is not supplied), the extension, and the secret fat container 17 are connected. In the fat container 17, the pipe 56 is not named for the money, in order to pressurize the tree, Lulu 5-6 from the milk supply to the resin official road" (the third flow channel) from the gas supply section (not shown in the figure) The tank 3 is connected. In order to pressurize the buffer tank μ _, the gas is supplied to the buffer 3. The road 5·7 is supplied from the air supply unit to the buffer tank, that is, in this embodiment, the pipe (tube-7) It is not branched from a line (line 5-6) for supplying a gas for pressurization to a resin, and the i-feed path for supplying a gas for pressurization is independently connected to the gas supply unit. 32 201114502 Regulator 9- 2, in the pipeline independent control resin capacity. Set the valve 7-1 and the S road on the pipeline of ^5 5.6. Also set the valve 7-4 and the ninth chapter 9-3, the device 17, buffer The pressurized state in the can 3. In this case, the coating is applied to the coating unit or the chemical solution such as the above-mentioned method, and the same applies to the same piping, valve, regulator, etc. as described above. It is not limited to the arrangement shown in the embodiment, and the product is pressurized as a gas (low pressure) introduced into the resin container 17 by the resin container 17 and buffered. The pressure difference in the inside of the buffer tank 3 is supplied to the buffer tank 3, and then the gas is introduced into the buffer tank 3, and a predetermined pressure is applied to the chemical liquid in the buffer tank 3 (the liquid medicine suction operation with the discharge portion 13 is simple) At the same time, the chemical solution is transported to the application portion 12A. As described above, according to the embodiment, it is possible to provide a liquid supply system and the like which are excellent in safety, economy, and productivity. The liquid chemical liquid having a preferred range is preferably a liquid having a viscosity of about 1 to 100 mPa·s, preferably about a Newtonian fluid. This is a physical property suitable for the drug solution applied one by one in the press coating method, but has thixotropy or the like. The non-Newtonian fluid can also be applied. From other viewpoints, the preferred drug solution is a drug using PGMEA, PGME, EEP, MB A, EDM, DMDG, acetonate, ethyl lactate or the like as a main solvent. Examples of the specific use of the liquid include a photolithography method for semiconductors, an active matrix device, a wiring for forming a wiring, and a light for forming a color filter in the manufacture of a semiconductor or a liquid crystal display device. The program such as the engraving method, for example, if it is a program for photolithography for color filter formation, includes formation of a black matrix for light shielding, formation of a coloring rGBY or CMY color pattern, a white layer or a scattering layer. The formation of the orientation, the setting of the dog, the formation of the LCD gap control material (ph〇t〇 spacer), the formation of an overcoat layer, etc. Further, the coated substrate to be coated with the chemical solution includes 矽The sheet, the glass, the metal, the plastic, the film (9), etc. The preferred embodiments of the liquid supply system and the like of the present invention have been described above with reference to the drawings, but are not limited to the examples of the present invention. It is obvious to those skilled in the art that various modifications or alterations are obvious within the scope of the technical idea disclosed in the present application, and they should also fall within the technical scope of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing an embodiment of a liquid supply system in the present invention; Fig. 2 is a flow chart showing a liquid supply method in a liquid supply system; and Fig. 3 is a flow chart in a liquid supply system Flow chart of the liquid supply method; Fig. 4 is a flow chart of the liquid supply method in the liquid supply system; Fig. 5 is a flow chart of the liquid supply method in the liquid supply system; Figure 7 is a schematic view showing another embodiment of the liquid supply system of the present invention; Fig. 8 is a view showing an example of the attachment device; and Fig. 9 is a view showing an example of the structure of the coating device; 10 is a view showing an example of a pressure-resistant packaging container; and FIG. 11 is a view showing an example of a pressure-resistant protective plate. 34 201114502 [Description of main component symbols] 1···Supply system 25...External thread 3...Buffer tank 27...Internal thread 4...Sensor 31...Resin container 5 (5-1, 5-2 , 5-3, 5·4, 5-5).··· Pipe 33...Siphon 7 (7-1, 7-2, 7-3, 7.4, 7-5)··· Valve 35 Pressure-resistant packaging container 9 (9-1, 9-2, 9-3).., adjuster 11...filter 13...pump 14...application nozzle 15...attachment device 17...resin container 19··· Siphon pipe 21...gas-liquid separation surface 22...pressure port 23...liquid supply port 24...opening portion 37 (37-1, 37-2).··pipe 39 (39-1, 39-2)...valve 41.. Adjuster 43.. Filter 45·.· Ejection unit (discharge pump, etc.) 47.. Coating nozzle 100: Coating device 110.. Control unit 120·.· Coating unit 130.. Substrate holding portion 35

Claims (1)

201114502 七、申請專利範圍： 種供液系統，用於向塗布裝置的塗布部供給 特徵在於，具備： 其 儲存部，用於儲存液體； 第1流道； 第2流道，與所述儲存部連接，用於向所 供給液體； 存邛 第3流道，與所述儲存部連接，用於向所述 供給氣體； # 第4流道’與所述儲存部以及所述塗布部連接，用 於自所述儲存部向所述塗布部供給液體； 所述第1流道、所述第2流道能夠可拆卸地連接規定 4器’所述第1流道能夠向連接的所述規定容器供給氣體。 2·如申請專利範圍第1項所述的供液系統，其特徵在於， 所述儲存部具有用於將儲存部内部向大氣開放的大氣 開放構件； 在所述第1、第2、第3、第4流道中設置有用於開閉 各流道的開閉構件。 3·如申請專利範圍第1項所述的供液系統，其特徵在於， 所述儲存部設置有用於檢測液面高度的液面檢測構件。 4.如申請專利範圍第1項所述的供液系統，其特徵在於， 還具備能夠可拆卸地連接所述規定容器的容器連接部， 所述第1流道、所述第2流道能夠通過所述容器連接 部連接所述規定容器。 36 2〇lH4502 5妒申請專利範圍第4項所述的供液系統，其特徵在於， 所述容器連接部在内周面具㈣做，通過所述内螺故 與铁置在所述規疋容器的開口部外周面的外螺紋螺 舍，能夠連接所述容器連接部和所述規定容器。 … 6如申請專利範圍第1項所述的供液系統，其特徵在於 所述第1流道向連接的所述規定容器内供給氣體，使所 述规定容器内的壓力在5kPa至lOOkPa的範圍。 7. 如申請專利範圍第1項所述的供液系統，其特徵在於， 所述塗布裝置用於製造半導體裝置或液晶顯示農置。 8. —種供液方法，所述供液方法使用供液系統並用於向塗 布裝置的塗布部供給液體，所述供液系統具備用於儲存 液體的儲存部；第1流道；與所述儲存部連接，用於向 . 所述儲存部供給液體的第2流道；與所述儲存部連接， • 用於向所述儲存部供給氣體的第3流道；與所述儲存部 以及塗布裝置的塗布部連接，用於自所述儲存部向所述 塗布部供給液體的第4流道；所述第1流道、所述第2流 道月b夠可拆卸地連接規定容器，所述第1流道能夠向連 接的所述規定容器供給氣體，其特徵在於，具有 儲存部供液程序，即利用通過所述第1流道供給的 氣體對與所述第1流道、所述第2流道速接的所述規定容 器内加壓，通過所述第2流道向所述儲存部内供給所述 規定容器内的液體； 塗布部供液程序，即利用通過所述第3流道供給的 氣體加壓所述错存部内部，通過所述第4流道向所述塗 37 201114502 布部供給所述儲存部内的液體。 9. 一種塗布裝置，其特徵在於，具備如申請專利範圍第1 至7項中的任一項所述的供液系統。 38201114502 VII. Patent application scope: A liquid supply system for supplying a coating portion of a coating device, comprising: a storage portion for storing a liquid; a first flow channel; a second flow channel, and the storage portion Connected to the supplied liquid; stored in the third flow path, connected to the storage portion for supplying the gas; #4流流' is connected to the storage portion and the coating portion, The liquid is supplied from the storage unit to the coating unit; the first flow path and the second flow path are detachably connected to the predetermined container that the first flow path can be connected to Supply gas. The liquid supply system according to claim 1, wherein the storage unit has an atmospheric opening member for opening the inside of the storage portion to the atmosphere; and the first, second, and third The fourth flow passage is provided with an opening and closing member for opening and closing each flow passage. 3. The liquid supply system according to claim 1, wherein the storage portion is provided with a liquid level detecting member for detecting a liquid level. 4. The liquid supply system according to claim 1, further comprising a container connecting portion that can detachably connect the predetermined container, wherein the first flow path and the second flow path can The predetermined container is connected through the container connecting portion. The liquid supply system of claim 4, wherein the container connecting portion is made in the inner peripheral mask (four), and the inner screw is placed in the gauge container by the inner screw The external thread of the outer peripheral surface of the opening can connect the container connecting portion and the predetermined container. [6] The liquid supply system according to Item 1, wherein the first flow path supplies a gas to the connected predetermined container such that a pressure in the predetermined container is in a range of 5 kPa to 100 kPa. . 7. The liquid supply system according to claim 1, wherein the coating device is used for manufacturing a semiconductor device or a liquid crystal display. 8. A liquid supply method using a liquid supply system for supplying a liquid to a coating portion of a coating device, the liquid supply system having a storage portion for storing a liquid; a first flow path; a storage unit connected to the second flow path for supplying the liquid to the storage unit; a third flow path for supplying the gas to the storage unit; and the storage unit and the coating The application portion of the device is connected to a fourth flow path for supplying the liquid from the storage portion to the application portion; the first flow path and the second flow path are sufficiently detachably connected to the predetermined container. The first flow path can supply a gas to the connected predetermined container, and has a storage portion liquid supply program, that is, a gas pair supplied through the first flow path, the first flow path, and the Pressurizing the predetermined container in the second flow path, and supplying the liquid in the predetermined container to the storage unit through the second flow path; and applying the liquid supply program, that is, using the third flow The gas supplied by the channel pressurizes the inside of the defective portion and passes through the A fourth flow path to the supply of the coating liquid within the reservoir portion 37201114502 cloth portion. A coating apparatus comprising the liquid supply system according to any one of claims 1 to 7. 38
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