TW201109435A - Cleaning composition and method of cleaning panel using the composition - Google Patents

Abstract

Disclosed herein is a cleaning composition for a flat panel display, including, based on the total amount of the composition: (a) 0.05-5 wt% of an amine compound; (b) 0.01-10 wt% of an additive including one or more selected from the group consisting of an azole-based compound, an alkanolamine salt and a reductant; and (c) residual water.

Description

201109435 ‘VI. Description of the Invention: TECHNICAL FIELD OF THE INVENTION The present invention relates to a cleaning composition and a cleaning method using the same. Korean Patent Application Nos. 10-2009-0069505 and 10-2009-0069506, filed on Jul. 29, 2009, and Korean Patent Application No. 10-2009, filed on August 11, 2009, The benefit of U.S. Patent Application Serial No. 0,073, the entire disclosure of which is hereby incorporated by reference. [Prior Art] A flat panel display (hereinafter referred to as "FPD")'s exemplary embodiment is a liquid crystal display (LCD), which is manufactured by a film forming, exposure, etching, etc. process as a semiconductor device. However, various organic or inorganic particles having a size of 1 micron or less can adhere to the surface of the substrate during such procedures. Therefore, when the subsequent process is carried out under particle adhesion, it forms pinholes or pits (p i t) in the film and cuts or bridges the wiring, thereby lowering the yield of the product. Therefore, cleaning is performed between the programs to remove particles. A cleaning solution for removing particles has been proposed. For example, Japanese Unexamined Patent Application Publication No. Publication No. No. No. No. No. No. No. No. No. 2005-154558 discloses a lyophilized bath containing 〇4, HF, ammonia and/or amine. However, this cleaning solution cannot be used for cleaning the substrate for FpD because it includes a severe silver-engraved glass substrate (a substrate for a typical FpD) and a booklet for a typical wiring material. In addition, Japanese Unexamined Patent Application No. 3 discloses a cleaning solution in which _acid or Gu Zhong is used as an anti-corrosion agent. However, this cleaning solution is used to remove residual photoresist and has a pH range of acid. Therefore, in the early stage of the cleaning stage, it is difficult for the cleaning solution to remove organic or inorganic particles of a size of i micrometers or less and at the same time prevent the ship from being damaged. In addition, Korean Patent No. 5746〇7 3/35 201109435 discloses a solution containing deionized water, an organic compound and a chain compound in an I-type pH atmosphere. It is difficult to clean and dissolve the organic or inorganic particles, acidic solution, which is 1 micron or less in size. In addition, the Korean registered patent No. 1G side reveals a kind including urea and/or ethylene glycol, alkali components (such as ammonium hydride, ammonia, etc.), organic acids (such as citric acid, malic acid, tartar _ and/or Its salt), the rest is a cleaning solution of deionized water. However, this cleaning solution is problematic due to deposition of urea or acetaminophen over a long period of time. SUMMARY OF THE INVENTION Accordingly, the present invention has been conceived to solve the above problems, and it is an object of the present invention to provide a cleaning composition suitable for removing organic or inorganic particles remaining on a substrate for a flat panel display. . . Another purpose of this month is to provide a cleaning composition that does not corrode the steel wire or the wire containing the wire for flat panel display. - One embodiment of the present invention provides a cleaning composition. According to the total amount of the product, the weight of the amine compound represented by any one of the following: (b) 〇·〇!_〗 〇 weight. /0& is selected from the group consisting of a shirt compound, a sterolamine salt and a reducing agent; or (4) the rest is water: <Formula 1> Y~R1 - Mountain (R3)n2 4/ 35 201109435 <Formula 2> ho-^Woh (Re)n4 <Formula 3>

<Formula 5>

Ri3\ ΡΛ ' D \r12 ni4 wherein R, R4 and R5 are each independently a linear or branched extension of CrC1(); R2, R3 and R6 are each independently hydrogen or a straight chain or branch of CrC1Q Alkenyl; R7, Rg and Rig are each independently nitrogen, a direct bond or a branched bond of Ci_Ci〇, an aryl group of C6-C1(), a linear or branched alkylamine group of Cr.C1() , Q-Qo direct bond or branch light burnt base, C "ClQ direct bond or bond bond base, or amine group, 5/35 201109435 R·9 and Rn are each independently nitrogen, Cj-C^ a direct bond or a branch of Q, a aryl group of CVQo, a linear or branched alkylamine group of crC(1), or an amine group;

Ri2 is a linear or branched alkyl group of CrC4, or a linear or branched thiol group of Ci_C4; R 3 and Rm are each independently a linear or branched alkyl group of Crc5, a straight chain or a branch of Crc4 a chain hydroxyalkyl group, an aryl group of C6-C1Q, or an alkoxyalkyl group of crc4, and the ring and the core 4 are bonded to each other to form a heterocyclic ring; and 〇1 and Π3 are each independently an integer of 0 or 1. And n4 are each independently an integer of 〇4, n5 is an integer of 1 or 2, % is an integer from 丨 to 4, and is an integer of 0 to 4, Χι is S, Ό or N, χ2 is n, and X3 is CH or N, and Y are a trans- or amine group. Another embodiment of the present invention provides a method of cleaning a flat panel display using the cleaning composition. [Complex Mode] The present invention will be described in detail below. The cleaning composition for a flat panel display according to the present invention comprises: (a) an amine compound, (b) an additive, and (c) water. The amine compound included in the cold-cooling composition (4 is from the following formula to 5): / \ 丫-R, Nv|_yX "(R2)n1 (R3)n2 <Form N, X2~(R5 )Fr3〇H (Re)n4 HO-R4-6/35 10 201109435 &lt;Formula 3&gt;

^1ΐ)π6 &lt;Formula 4&gt; r8 (R9)n5 % &lt;Formula 5&gt; wherein R!, R4 and R5 are each independently a straight or branched chain extension of Ci-C1(); R2, &amp; And R6 are each independently hydrogen or a straight or branched alkyl group of Ci-Cio;

RtRs and R1G are each independently hydrogen, a straight or branched alkyl group of CrC1(), an aryl group of CVCiq, a linear or branched alkyl group of CrCu), a linear or branched hydroxyalkyl group of CrC1G, a straight or branched alkyl group of CrC1(), or an amine group; R_9 and Ru are each independently hydrogen, a straight or branched chain of CrC1G, an aryl group of C6-Cm, or a linear or branched chain of CrC1G An alkylamine group or an amine group; a linear or branched hydroxyalkyl group of CrC4, or a linear or branched thiol group of crc4,

Rn and R!4 are each independently CVC: a linear or branched alkyl group of 5, a linear or branched hydroxyalkyl group of Crc4, an aryl group of CVQo, or an alkoxyalkyl group of Ci_C4, and %4 is bonded to each other to form a heterocyclic ring; and 7/35 201109435 η] and ns are each independently 〇 or an integer of 1 '叱 and each is independently an integer from 〇 to 4' n5 is an integer of 1 or 2, n6 An integer from 1 to 4, n7 is an integer from 〇 to 4, X丨 is S, 〇 or N, X2 is N, X3 is CH or N, and γ is a hydroxyl group or an amine group. The amine compound (a) may be included in an amount of 〇. = _5% by weight, preferably 〇1 - 3% by weight, based on the total amount of the cleaning composition. A sufficient cleaning effect can be achieved when the amine compound is less than 0.05% by weight. Further, when the amount is more than 3% by weight, the activity of the cleaning composition is deteriorated, so that the particle removing effect is lowered, or the copper-containing wiring or the aluminum-containing wiring is gradually rotted. The amine compound represented by the above formula 1 may be selected from N_(2-hydroxyethyl)piperazine, N-(2-propyl) oxazin, N_(2-polybutyl) oxime, and b (2). _Ethyl)piperazine, 丨_(2·propyl), piperidinazine, b (厶) _4_▼ keetazine, b (2_ethyl) _4_ethyl π Oxazine, ^ search ethyl) 4-propyl piperazine, 1-(2-hydroxyethyl) piperidinyl piperazine, hydrazine (厶 propyl) _4_ 曱 base. Qin, (2_propyl)_4_ethyl 〇辰嘻 '丄·仏hydroxypropyl)-4-propylpiperazine, 1_(2-hydroxypropyl)-p-butylpiperazine, Butyl)-4-methyl-n-oxazine, N (2-dibutyl)_4-ethyl oxime, butyl)-4-propyl. Bottom 嗓 ' 1- (2-butyl-butyl)-4_butyl 0-Chenazine, N_ &amp; Ethyl) lin, N- (2-propyl) morphine, sense aminopropyl morphine , Ethyl ethyl hydrazine, propyl carbazine, and "(曱曱基娘嗓) ethanol group. The amine compound represented by the above formula 2 can be selected to be free of a group consisting of pyridinol. The amine compound represented by the above formula 3 may be optionally N-(2-hydroxyethyl)ethyl, N-(3-hydroxypropyl)-2. pyrrolidone, oxindole a group consisting of a pyridyl group and a chloroethyl)-2-pyrrolidone. The amine compound represented by the formula 4 can be selected from the group consisting of 2 pyridine and N-(2-hydroxypropyl) fluorene. The group consisting of sulfonium and hydrazine τ is composed of hydrazine and hydrazine (2-hydroxybutyl) piperidine. The amine compound represented by 5-1 can be selected from the group consisting of municipal ethoxyethanol, propyl propyl alcohol, and amine butyloxy Ethyl alcohol, dimethylamino ethoxy thiol, : ethylamine ethoxylated thiol, dipropylamino ethoxy thiol, dibutylamino ethane thiol, diterpene ethoxylated red alcohol, two Ethyl ethoxyethanol, propylaminoethoxyethanol, di-aminoethoxyethanol, diammonium Ethyl ethyl mercaptan, diethylamino ethoxy propyl mercaptan, dipropyl ethoxy ethoxy thiol, dibutyl ethoxy ethoxy ethoxy, hydrazine (methoxymethyl) morphine, ν _ (Ethoxymethyl) 吗琳, Ν· (2·methoxyethanol) 吗琳, Ν _ (2· ethoxyethanol) 吓, and Ν _ (2·butoxyethanol) 琳琳The additive (8) included in the detergent composition of the present invention comprises - or a plurality selected from the group consisting of a salivary compound, an alkoxylated amine salt and a reducing agent. The additive (8) is used to make the copper-containing wiring and the inclusion The wiring has the least amount of money. The additive may include 00 Μ 0% by weight, preferably (U-3% by weight), based on the total amount of the cleaning composition. When the amount of the additive meets the above range, it may be made of aluminum or copper. The metal film made of aluminum alloy, copper alloy, etc. has the least damage, thus increasing economic efficiency. The spit compound may include a tri-salt ring. In this case, it exists in the un-shared electron pair of nitrogen atoms in the ring. Electron bonding with copper, so as to prevent corrosion of steel. The azole compound can be selected from the group consisting of tris-triazole, anthracene, 2,3-benzene. And three saliva, 1'2'3-three saliva, 1,2,4-three. Sit, 3-amino], 2,4_tris-sal, 4-amino-.1,2,4-tri. Sit, 1 time, stupid and three. Sit, 1_曱基笨和三嗤, 2_methyl 9/35 201109435 benzotriazole, 5-mercaptobenzotriazole, benzotriazole-5-carbonate Ester, nitrobenzotriazole, 2-(2H-benzotriazol-2-yl)-4,6-di-t-butylphenol, and 2,2'-[[[ethyl-1H-benzene And one or more of the group consisting of ° 基 基 ] ] ] ] ] 烷 烷 烷 烷 烷 烷 烷 烷 烷 烷The metal is corroded and prevents the oxide film from being excessively insulted and used to cause the cleaning composition to exhibit a pH buffering effect by controlling the pH change of the cleaning composition. The reaction temperature for preparing the alkanolamine salt can be maintained at 9 ° C or lower. The alkaloid salt can be a low carbon alkalamine salt having a CrC5 group. Further, other lower carbitol amine salts such as monomethyl sterolamine salts may be used as the alkoxyamine salt because the other substituents may be present in the amine group if they have one or more via groups. Examples of the alkanolamine salt may include monoethanolamine salt, diethanolamine salt, triethanolamine salt, monoisopropanolamine salt, diisopropanolamine salt, triisopropanolamine salt and the like. Further, a commercially available product can be used as the alkanolamine salt. Examples of commercially available products of alkanolamine salts may include ABRUSTCM (manufactured by LABEMA Co.), AB RUST A4 (manufactured by LABEMA Co.), EMADOX-NA (manufactured by LABEMA Co.), EMADOX-NB (by LABEMA Co) . Fabrication), EMADOX-NCAL (manufactured by LABEMA Co.), EMADOX-102 (manufactured by LABEMA Co.), EMADOX-103 (manufactured by LABEMA Co.), EMAD〇X_D52〇 (manufactured by LABEMA c〇), AB Rust at (manufactured by LABEMA c〇) and so on. In the case of the original agent, the metal wiring is prevented from being rotted by suppressing the formation of the oxide film on the metal wiring! i. The reducing agent may include one or more selected from the group consisting of erythorbic acid, biotic C, and α-fertility. The water (4) included in the cleaning composition of the present invention may be deionized water, 10/35 .201109435

The car's father is the deionized wheel P good cleaning composition for the preparation of economic and environmental friendliness. The weight of the cleansing composition of the present invention is the total composition of the cleansing composition nr copolymer, measurement one) two = alcohol, and the secret _ constitute at least the county. The secret acid combination is used to inhibit the metal and alkali ions on the surface of the metal to form a protective layer. Two == by two &lt;Formula 6&gt;

Rl5 Rl6 I I _ c _ c —

II R17 (CH2)niiCOOMi wherein R15 to R'n are each independently a hydrogen atom, a direct bond or a branched alkyl group of CA, or (CHdr^COOM2; M^M2 are each independently a gas atom, a metal m metal, Or C"Cl. The alkylammonium group; and m丨 and 叱 are each independently an integer of 〇2. 'Multi-repulsive acid copolymer may include - species having the above formula 6 Monomer of unit structure ° The monomer having the unit structure represented by the above formula 6 may be selected from the group consisting of acrylonitrile, (mercapto) propionate, ruthenium, (mercapto) acetoacetate, trimethyl propyl acrylate. a group consisting of dilute acid, cis-butyl diacid, trans-butyl succinic acid, itaconic acid m citraconic acid, ethylene diacetic acid, 4-indole acid, and a salt thereof. More preferably, it is acrylic acid, (mercapto) decyl acrylate and maleic acid. 11/35 201109435 Further, the polyoxoic acid copolymer may further comprise one or more other monomers, which may have The monomer structure of the unit structure represented by Formula 6. The embodiment of the polycarboxylic acid copolymer may include a polyacrylic acid polymer (PAA), a poly(indenyl) decyl acrylate. Polymer (PMAA), polyacrylic acid maleic acid copolymer (PAMA), polyacrylic acid (meth) methacrylate copolymer (PAMAA), polymaleic acid copolymer (PMA), poly(fluorenyl) a decyl succinate copolymer (PMAMA), or a salt thereof. The polycarboxylic acid copolymer may include 〇·〇Μ〇% by weight, preferably 0.05 to 5% by weight, more preferably 0.1 to 1% by weight. The amount of the alkylene glycol monoalkyl ether compound is used as a solvent for dissolving organic contaminants. In addition, the metering of the alkyl diol is used to improve the cleaning power because it lowers the surface of the cleaning composition. Tension, thus increasing the wetting force of the cleaning composition on the glass substrate. The metering of the alkylene glycol single-ether ether compound can be selected from the group consisting of ethylene glycol monobutyl _ (BG), diethylene glycol mono- _ (MDG), two Ethylene glycol monoethyl ether (carbitol), monoethylene glycol monobutyl ether (BDG), dipropylene glycol monoterpene ether (DPM), dipropylene glycol monoethyl _ (MFDG), triethylene glycol monobutyl ether (BTG) , triethylene glycol monoethyl ether (MTG), and propylene glycol monoterpene ether (MFG) group. Metering alkylene glycol monoalkyl ether compounds according to the cleaning group The total amount of the substance may include 0.05-20% by weight, preferably 0.5-10% by weight. When the amount of the alkylene glycol monoalkyl ether compound is less than 0.05% by weight, it is impossible to increase The ability of the composition to dissolve organic contaminants is cleaned. Further, when the amount is 20% by weight, it is not expected to increase the wetting force of the cleaning composition on the glass substrate. The surfactant is used to enhance the cleaning composition to the substrate. The wetting force causes the substrate to be uniformly cleaned, and is used to clean the metal pattern with oxygen 12/35 201109435. The metal is rotted. - Oxide inhibitor, cationic surfactant, :=; ionic interface active group group. In particular, "the composition of non-authentic surfactants" is preferably used in the second surfactant. Non-ionic &quot;&quot;scraping&quot; has excellent wetting force and produces a small amount of bubbles. Glycol=Sex: The inerting agent may include a material selected from the group consisting of polyoxyethylene/polyoxypropylene bis, polyfluorinated vinyl alkyl ether, polyoxyethylene alkyl phenyl ether, polyoxyethylene/polyoxypropylene decyl ether , polyoxyethylene / polyoxybutylene sulphate scales, polyoxyethylene amide amine fine 'polyoxyethylene _ _, polyethylene glycol fatty acid ester, sorbitan fatty acid vinegar, fat moon cool, One or more of a group consisting of glycerin fatty acid vinegar, polyglycerin fatty acid ester, glycerin ester, alkyl decylamine, fatty acid decylamine, and fatty acid decylamine added with oxyethylene. Among these nonionic interface/tongue agents, it is preferred to use oxyethylene (Ε〇) as a hydrophilic group and oxypropylene (ΡΟ) and/or oxybutylene (Β〇) as a hydrophobic group. Oxyethylene/polyoxybutylene alkyl ether copolymer. Here, the oxyethylene (Ε〇) system is represented by -CH2-CH2-0-, and 'oxypropylene (Ρ0) is represented by _CH(CH3)-CH2-〇- or -CH2(CH3)_CH2_0-·, and Dilute (B〇) is derived from -CH2-CH2-CH2-CH2-〇-, -CH(CH3)-CH2-CH2-〇-, -CHrCH(CH3)-CH2-〇·, or -CH2-CH2-CH (CH3) 2-0- indicates. The copolymerization portion of oxyethylene (EO), oxypropylene (PO) or oxybutylene (BO) may be a block copolymer, a random copolymer, or a block-random copolymer. Further, the copolymerized molecule may be a copolymer of oxyethylene (FX) and oxypropylene (PO), a copolymer of oxyethylene (EO) and oxybutylene (BO), or an oxyethylene (EO) or oxypropylene (PO). a copolymer with oxybutylene (BO). Here, when the total number of moles of oxyethylene (EO) is represented by X, and the total number of moles of oxypropylene (PO) or oxybutylene (BO) is represented by Y, oxyethylene (EO) to oxypropylene The molar ratio of (PO) or oxybutylene (B〇) (represented by 13/35 201109435 Χ/(Χ+Υ)) may range from 0.05 to 0. The end of the surfactant can be an ethylenediamine or glycerin at the end selected from one or more of a group consisting of a hydrogen group, an alkyl group, and an alkenyl group. Non-ionic active agent _ can be packaged (tetra) oxygen (tetra) / poly (tetra) chelate = dilute / polyoxybutylene condensate, polyoxyethylene / polyoxypropylene condensed fine condensed dicarbon-based complex, polyoxyethylene Dilute/polyoxypropylene tetradecyl 2: 12 2 ethylene/polyoxy sulphide _ compound, polyoxygen = 7, rabbit fine condensate, polyoxyethylene rim margin T needle two counts _ combined =; Carbon-based, polyoxyethylene/polyoxypropylene t soil polyethylene/polyoxypropylene lauryl propylene stearyl ether, added I hydrazine. Polyoxyethylene of polyene/polyfluorene and glycerol: polyoxyethylene/polyoxypropylene condensate, sulphur/polyoxypropene condensate, polyoxyethylene added with ethylenediamine, polyoxyethylene/ Poly oxygen. (10) ^ Oxygen τ dilute condensation 曰 直 straight 5 5 butene 2 - ethyl hexyl ether, polyoxyethylene / polyoxybutylene ruthenium / polyoxygen τ - lipid hydrazine and so on. The material::=/, the agent may preferably be a polyoxyethylene/polyoxypropylene condensed propylene diene condensate, a glycerol-added polyoxyethylene/polyoxygen non-ionic ethylenediamine polyoxyethylene/polyoxygen Propylene condensate. The i &quot;H agent is better than the wire/polyoxygen or the ethylene oxide/polyoxypropylene condensate. The total amount of the cleaning composition may include 1]. 低于 lower than _ 乂; quantity. The amount. In the total amount of surfactants, the clearing and cleaning of the substrate are increased. This /, when u is % by weight, 'although ensuring the uniformity of cleaning, the cleaning uniformity of the 14/35 201109435 glass substrate is no longer increased and the improvement of the cleaning uniformity is limited to a specific value. The method of cleaning a flat panel display using the cleaning composition in accordance with the present invention can be carried out in a manner well known in the art. One or more of the groups selected from the group consisting of spraying, rotating, soaking, and soaking with ultrasonic waves may be used. Further, the method can be carried out at a temperature of from 20 to 80 ° C, preferably from 20 to 50 ° C, at which the best cleaning effect is obtained. In addition, the method can be carried out for 30 seconds to 10 minutes. The invention is described in more detail below with reference to the following examples. However, the scope of the invention is not limited thereto. Examples 1 to 19 and Comparative Examples 1 to 3: Preparation of cleaning composition A cleaning composition was prepared by mixing the components in the composition ratios shown in Table 1 below, followed by stirring the mixture.

15/35 201109435 [Table 1] Ring amine compound additive *GE Polycarboxylic acid copolymer surfactant Water type weight % Type weight % Type weight % Type weight % Type weight % Example 1 NHEP1 0.2 *1) 0.05 - - - - - - The remaining Example 2 NHEP1 0.2 *2) 0.2 - - - - - - The remaining Example 3 NHEP1 0.2 *3) 0.2 - - - - - - The remaining Example 4 NHEP1 1.0 0.1 - - - - - - Example 5 HEMP 0.2 0.05 - - - - - - The remaining Example 6 HEMP 0.2 * 2) 0.2 - - - - - - The remaining Example 7 HEMP 0.2 * 3) 0.2 - - - - - - The remaining Example 8 HEMP 1.0 * 1) 0.1 - - - - - - The remaining Example 9 NHEM 0.2 *1) 0.05 - - - - - - - The remaining Example 10 NHEM 0.2 * 2) 0.2 - - - - - - - The remaining Example 1 丨 NHEM 0.2 *3 0.2 - - - - - The remaining Example 12 NHEM 1.0 *1) 0.1 - - - - - - The remaining Example 13 NHEP 1.0 *1) 0.1 *4) 0.5 - - - - The remaining Example 14 NHEP 1.0 *1) 0.1 *5) 0.5 - - - - The remaining examples 15 NHEP 1.0 *1) 0.1 *6) 0.5 - - - - The remaining examples 16 NHEP 1.0 *1) 0.1 - - *7) 0.2 - - Example 17 NHEP 1.0 *l) 0.1 - - *8) 0.2 - - The remaining Example 18 NHEP 1.0 *1) 0.1 - - - - *9) 0.02 The remaining Example 19 NHEP 1.0 0.1 - - - - *10) 0.02 Remaining比比交例1 TMAH 1.0 *2) 0.3 - - - - - - Other Comparative Example 2 NH4OH 1.0 - - - - - - - - Other Comparative Example 3 MEA 1.0 - - - - - - - - Other Notes) NHEPl: N-(2-hydroxyethyl)piperazine HEMP: 1-(2-hydroxyethyl)-4-methylpiperazine 16/35 201109435 NHEM: N-(2-hydroxyethyl)morpholine TMAH: Hydroxide NH4OH: Ammonium hydroxide MEA: monoethanolamine *1): 2,2'-[[[Ethyl-1H-benzotriazole·indolyl]indenyl]imido]]iethanol*2) : EMAD〇X-NA (trade name, manufactured by LABEMACo.) *3): erythorbic acid ★GE: metered alkyl diol monoalkyl ether *4): diethylene glycol 曱 5) · 乙二Alcohol·Dingjun*6): Triethylene glycol-B_7): Polyacrylic acid polymer (pAA) *8)·Poly(indenyl) decyl acrylate copolymer (pMAA) *9): Polyoxygen Ethylene/Polyoxypropylene Glycol*10): Evaluation of Characteristics of Polyoxyethylene/Polyoxypropylene Condensate Adding Ethylenediamine 1) Evaluation of Copper Engraving Rate 100 U of Copper Film Coated with 2500 Å Thick Glass substrate as in Example 1, "each of the cleaning compositions of 3 m1 to soak for 30 minutes. Here, the temperature of the '1 liter fpi wall is 4Gt:. Then in the soaked glass substrate] = summer = thickness 'and the thickness rate by the steel film. The results are shown in Table 2 below. 2) Evaluation of the removal power of organic pollutants by the glass removal force, the size is 5 cm # or organic felt handwriting pollution, and then sprayed; /35 201109435 Cleaning equipment to make the contaminated glass plate at 4Gt temperature as implemented The cleaning compositions of Examples 4, 8, 12 to 19 were washed for 2 minutes. The glass substrate was then washed with ultrapure water for 3Q seconds and then dried with nitrogen. In this case, 'the case of removing organic contaminants is indicated by 〇 in the following Table 2' and the case where the organic contaminants are not removed by X. When the cleaning group of the embodiment 16 is used, the gambling is shown in the figure 丨 to *. Here, Fig. 1 1 shows a photograph of a glass substrate dyed with a fresh hair (which is an organic contaminant -) &gt;5. Fig. 2 is a photograph showing the use of the cleaning composition of Example 16 to remove the glass substrate of Fig. 1 . Figure 3 shows (4) a glass substrate contaminated by a fingerprint which is one of the organic contaminants. Fig. 4 is a photograph showing the cleaning of the glass substrate of the fingerprint of Fig. 3. 3) Evaluation of the removal power of organic pollutants·2. The glass substrate is placed in the atmosphere alone for a few hours, so that the glass substrate is contaminated with organic substances, inorganic substances, particles, etc. in the atmosphere, and then the spray type is used. 'The substrate of the (4) was cleaned for 2 minutes at each of the cleaning compositions of Examples 4, 8, 12 to 19 at the temperature of the thief. Then, the washed glass substrate was further washed with ultrapure water to clean 3G #, and the wire was dried with nitrogen. Then, 0.5 μl of ultrapure water droplets were placed on the dried glass substrate to measure the contact angle. The results are shown in Table 2 below. 4) Evaluation of removal power of organic contaminants _3 The glass substrates contaminated with the organic particle solution were washed with the cleaning compositions of Examples 4, 8, 12, 13, 16, and 18. Even if the glass substrate is contaminated with an organic particle solution having an average particle size of 0.8 μm, the contaminated glass substrate is then spun at a rotation rate of 3000 rpm for a minute, and then the spray-type cleaning device is used to make the spin-dried glass substrate at 4 〇. The temperature of &lt;t was washed for 2 minutes with each of the cleaning compositions of Examples 4, 8, 18/35. 201109435 12, 13, 16, and 18. The cleaned glass substrate was then further washed with ultrapure water for 3 seconds and then dried with nitrogen. The surface particle detector (Topc〇n WM_丨5〇〇) was used to measure the number of particles before and after cleaning, which was 〇·μm or larger, and the results are shown in the following table [Table 2]

The cleaning compositions of Examples 1 to 12 above show the effect of preventing steel, and the remaining effects. However, the cleaning composition of Comparative Example 1 S 3 (excluding the cyclic amine = (4) is a self-purified compound) is rotted. Further, the cleaning compositions of Examples 4, 8, U, 13, and 16 to 19 exhibited the ability to remove organic contaminants because they had 2 Å. -4Q. Contact angle. Further, when the glass substrate contaminated with the organic particle solution was washed with the cleaning compositions of Examples 4, 8, 12, 13, 16, and 18, it exhibited about 77 to 86 ° /. Particle removal rate. 19/35 201109435 Preparation of cleaning composition A cleaning composition was prepared by mixing the ingredients 'in the composition ratio shown in Table 3 below and then dropping the compound. 【table 3】

Note) NHEP2: NHPP: N_(2-2-hydroxyethyl)piperidine N-(2-propyl)piperidine 20/35 201109435 HEP· 1-(2-Liethyl)_2-° ratio. Each **1): 2,2'-[[[ethyl-1H-benzotriazole·丨·yl] fluorenyl]imino] oxime ethanol*2): EMADOX-NA (trade name, by Manufactured by LABEMACo. *3): Isoascorbic acid *GE: metered alkylene glycol monoalkyl ether *4): diethylene glycol monomethyl ether *5): diethylene glycol monobutyl ether *6): triethyl Glycol monoethyl ether * 7): Polyacrylic acid polymer (PAA) *8): Poly(methyl methacrylate) methyl ester copolymer (pMAA) *9) · Polyoxyethylene / polyoxypropylene diol 10). Polyoxyethylene/Polyoxypropylene Ethylenediamine Condensate Column 2: __zil Clean Composition ^Features|Ping Shi 1) Copper | Evaluation of Insect Rate 100 First, the glass plate coated with 2500 angstroms thick Each of the cleaning compositions of Examples 2 to 31 was immersed for 30 minutes. In this case, each cleaning, and the fox degree of the object is 4G, and then the thickness of the copper film is measured before and after the glass substrate is immersed; the rate of the copper film is calculated from the thickness variation of the steel film. The results are shown in Table 4 below. 2) Evaluation of the removal power of organic pollutants “ ^ Evaluate the removal force of the machine, for the size of 5 cm χ 5 cm t plate with fingerprint or organic wool traces' then use the spray of the second to make the contaminated glass substrate 4 (The temperature of TC is reduced by 4 ΐ 38 in the example, and the cleaning composition is cleaned for 2 minutes. Then the soil is washed with ultrapure water for 30 seconds and then dried with nitrogen. 21 /35 201109435 In Table 4 below, the removal of organic contaminants = 2 indicates that the organic contaminants were not removed. The results of using the composition of Example W to remove organic contaminants are shown in Figures 5 to 8. Figure 5 shows - a photograph of a wool substrate (which is a glass substrate of wood of organic contaminants. Section 6 11 is a photograph showing the use of the 32-month ice composition of Example 32 to remove the glass substrate of the number of handwriting of Figure 5. 7 A photograph of a glass substrate contaminated with organic contaminants is shown, and Fig. 8 is a photograph showing the glass substrate of the fingerprint of the embodiment shown in Fig. 7. 3) Organic contaminants Evaluation of the removal force _2, the glass substrate is placed separately in the atmosphere After 24 hours, the glass substrate was contaminated with the organic matter 'inorganic substances, particles, etc. in the large milk, and then the sprinkling type cleaning device was used to make the contaminated substrate at the temperature of the thief. Example 23, 27, 31 The cleaning composition of each of the cleaning compositions was washed for 2 minutes, and then the washed (four) substrate was further washed with ultrapure water for 3 G seconds, and then air dried. Then, G. 5 μl of ultrapure water was dropped on the silk glass substrate. The contact angle was measured. The results are shown in Table 4 below. 4) Evaluation of organic contaminant removal force _3 The glass substrate contaminated with the organic particle solution was cleaned by the examples, 27, 31, 32, 35, and 37. Cleaning. Even if the glass substrate is contaminated with an organic particle solution having an average particle size of 0.8 μm, the contaminated glass substrate is then spun at a rotation rate of 3000 rpm for a minute, and then sprayed and rinsed again. The glass substrate was washed at the temperature of each of the cleaning compositions of Examples 23, 27, 31, 32, 35, and 37 for 2 minutes. The washed glass substrate was further washed with ultrapure water for 30 seconds, and then dried with nitrogen. Using surface particles The detector (Dingkoukou (;〇11"]\/1-1500) measures the size of the clean 22/35 201109435 before and after the oi is shown in Table 4. The number of particles of micron or larger, and the results are shown [Table 4 】

Culi engraving rate (A/min) -—^_ Organic refers to the organic felt handwriting----T* The number of particles before the cleaning angle is cleaned. The number of particles removed after cleaning (%) Example 20 1.0 _--- Implementation Example 21 1.6 -· - • - - Example 22 1.3 * - • • Example 23 0.8 〇- _ • - Example 24 0.7 _ --- One - _ - J - 38 2851 627 80 Example 25 1.4 - - - - Example 26 0.9 - _ - . - - Example 27 0.6 〇 &quot; ~ - - - - Example 28 0.6 〇 37 2936 675 80 Example 29 1.2 —— - - • - - Example 30 0.8 1 *-_ - - - - Example 31 0.5 - 2 - - - - Example 32 - ----- 0 0 36 2987 627 81 Example 33 - Ο - 〇 35 2913 582 82 Example 34 〇 ' 〇 36 - - - Example 35 _ 〇 0 36 - - - Example 36 _ 〇 39 3056 61] 80 _ Example 37 ----. 〇〇 39 - Example 38 - o'---- 0 35 3201 544 83 __ 十36 - Referring to Table 4 above, the cleaning compositions of Examples 20 to 31 exhibited an effect of preventing the corrosion of the surname. Further, the cleaning compositions of Examples 27, 3, 32, and 35 to 38 all have the ability to remove organic contaminants, and have a contact angle of 2 〇M〇c. Further, when the glass substrate contaminated with the organic particle solution was washed with the cleaning compositions of Examples 23, 27, 31, 32, 35, and 37, it exhibited a particle removal rate of about 77 to 86%. The composition for cleaning the composition was prepared by mixing the ingredients 'in the composition ratio shown in Table 5 below and then mixing the mixture. 23/35 201109435 [Table 5] Oxyamine Compound Chain Alkanolamine Additives * GE Polycarboxy Acid Copolymer Surfactant Type Weight Type Weight Weight Weight Weight Type Weight % Weight% % Class% Class% Class% Implementation Example 39 AEE 0.2 - - *1) 0.05 - - - - - - Example 40 AEE 0.2 - - *2) 0.2 - - - - - - - Example 41 AEE 0.2 - - *3) 0.2 - - - - - Example 42 AEE 1.0 - - *1) 0.1 - - - - - - Example 43 DAEE 0.2 - *1) 0.05 - - - - - - Example 44 DABE 0.2 - - *2) 0.2 - - - - - - Example 45 DAEE 0.2 - - +3) 0.2 - - - - - - Example: 46 DAEE 1.0 - - *1) 0.1 - - - - - - Example 47 AEE 0.9 MEA 0.1 ♦1) 0.1 - - - - - - Example 48 AEE 0.9 MIPA 0.1 *2) 0.1 - - - - - - Example 49 DAEE 0.9 MEA 0.1 *3) 0.1 - - - - - - Example 50 DAEE 0.9 MIPA 0.1 *0 0.1 - - - * - - Example 51 AEE 1.0 - - *D 0.1 *4) 0.5 - - - - Example 52 AEE 1.0 - - *1) 0.1 *5) 0.5 - - - - Example 53 AEE 1.0 - - *1) 0.1 *6 0.5 - - - - Example 54 DAEE 1.0 - - *1) 0.1 *4) 0.5 - - - - Real Example 55 AEE 0.9 MEA 0.1 *1) 0.1 *4) 0.5 - - - Example 56 DAEE 0.9 MEA 0.1 *1) 0.1 *4) 0.5 - - - - Example 57 AEE 0.9 MEA 0.1 *1) 0.1 - *7) 0.2 - - Example 58 DAEE 0.9 MBA 0.1 ♦ π 0.1 * - *8) 0.2 - - Example 59 AEE 1.0 - * *1) 0.1 - - - - *9) 0.02 Example 60 AEE 1.0 - - *1) 0.1 - - Reputation - *10) 0.1 Note) AEE: Amino ethoxyethanol DAEE: Dimethylaminoethoxyethanol MEA: Monoethanolamine MIPA: Monoisopropanolamine TMAH: Tetrahydrohydroxide Ammonium 24/35 201109435 nh4oh: Ammonium hydroxide *1): 2,r-[[[Ethyl-1H-benzotriazol-1-yl]indolyl]imido]indoleethanol*2): EMADOX- NA (trade name, manufactured by LABEMACo.) *3): isoascorbic acid *GE: metering alkylene glycol monoalkyl ether *4): diethylene glycol monomethyl ether *5): diethylene glycol monobutyl ether *6): Triethylene glycol monoethyl ether *7): Polyacrylic acid polymer (PAA) *8): Poly(decyl) decyl acrylate copolymer (pmaa) *9): Polyoxyethylene/polyoxypropylene II Alcohol MO): Polyoxyethylene/polyoxypropylene ethylenediamine condensate reverse j Test Example 3: Characteristics of cleaning composition 1) Evaluation of copper engraving rate firstly coated with 2500 angstroms A glass substrate of a thick copper film was immersed in each of the cleaning compositions of Examples 38 to 50 for 30 minutes. In this case, the temperature of each cleaning composition was 40. (:. The thickness of the copper film was measured before and after soaking the glass substrate, and the etching rate of the copper film was calculated from the thickness variation of the copper film. The results are shown in Table 6 below. 2) Evaluation of the removal power of organic pollutants q In order to evaluate organic Contaminant removal force, contamination of the glass substrate of 5 cm in size with fingerprint or organic felt writing, and then using a spray type cleaning device to make the contaminated glass substrate at 4 (rC2 temperature as in Examples 42, 46, 47, 49. Each cleaning composition of .51 to 60 is washed for 2 minutes. Then, the cleaned glass substrate is further washed with ultrapure water for 3 sec seconds, and then dried with nitrogen 25/35 201109435. In this case, in Table 6 below 〇 indicates the case of removing organic contaminants' and WX indicates the case where organic contaminants are not removed. The results of using the cleaning composition of Example 51 to remove organic contaminants are shown in Figures 9 to 12. Here, Figure 9 shows - a photograph of a glass substrate dyed with a hair (one of the organic contaminants). Fig. 10 is a view showing the use of Example 51 ^ Cleaning the composition to remove the slab of the slanting substrate of Fig. 9 Photo. 11th The figure shows a photograph of a glass substrate contaminated with a fingerprint which is one of organic contaminants. Fig. 12 is a photograph showing the use of the cleaning composition of Example 51 to remove the fingerprint of the glass substrate of Fig. 11. 3) Organic Evaluation of Pollutant Removal Force _2 The glass substrate is placed in the atmosphere alone for 24 hours, and is contaminated by organic substances, inorganic substances, particles, etc. in the atmosphere, and then the sprinkler-type cleaning equipment is used to make the contaminated substrate The temperature of the thief was washed for 2 minutes with each of the clearings of Examples 42, 46, 47, 49, 51 to 60. The cleaned glass substrate was then further washed with ultrapure water for 3 sec seconds and then dried with nitrogen. 0.5 μl of ultrapure water droplets were placed on the glass substrate to measure the contact angle. The results are shown in Table 6 below. 4) Evaluation of Organic Pollutant Removal Force_3 The glass substrate contaminated with the organic particle solution was washed with each of the cleaning compositions of Examples 42, 46, 55, 57, and 59. Even if the glass substrate is contaminated with an organic particle solution having an average particle size of 0.8 μm, the contaminated glass substrate is then spun at a rotation rate of 3000 rpm for a minute, and then the spray-type refreshing device is used to make the spin-dried glass substrate at 4 The temperature of 〇 °c was washed with each of the cleaning compositions of Examples 42, 46, 55, 57, and 59 for 2 minutes. The cleaned glass substrate was then further washed with ultrapure water for 3 seconds and then dried with nitrogen. 26/35 201109435 The Topcon WM-1500 measures the number of large ''', '1 U meters or larger particles before and after cleaning, and the results are shown in the following table. Fingerprint organic felt handwriting contact Number of particles before cleaning. Number of particles removed after cleaning (%) — - _ - - ''—— - _ - - - • - - _____________________________________________________________________________ 〇34 2925 439 85 - • - - - • • - • ~ .— - • _ - - 0 38 2965 563 81 〇 30 _ - ---- - - 参 - - 〇 31 • - • ----- - - - . 〇32 _ - . — 0 34 • -峰〇35 • • _ 0 36 _ - • 0 27 3012 η Λ 1 I 89 0 28 • • 〇29 2913 350 88 ~~一〇30 0 32 3019 497 84 〇33 - - ^ ^ ” The slippery composition of Cangzhou exhibits the effect of preventing copper residue. In addition, Examples 42, 46, 47, 49, 51 to 60

The composition exhibits the ability to remove organic contaminants because it has =〇. Contact angle. Further, when the cleaned and dyed glass substrates were cleaned with the cleaning liquids of Examples 42, 46, 55, 57, and 59 ^, they exhibited a particle removal rate of about 80%. As described above, the cleaning composition of the present invention has an excellent ability to remove organic or inorganic particles remaining on a substrate for flat display. ^ The cleaning and medicinal materials of the present invention have the effect of preventing the corrosion of the copper-containing wiring or the aluminum-containing wiring disposed on the substrate. 27/35 201109435 Furthermore, the cleaning composition of the present invention is easy to handle and environmentally friendly because it includes a large amount of water. While the invention has been described with respect to the preferred embodiments of the present invention, it is understood that various modifications, additions and substitutions may be made without departing from the scope and spirit of the invention. BRIEF DESCRIPTION OF THE DRAWINGS The above and other objects, features and advantages of the present invention will become more <RTIgt; Photograph of the contaminated glass substrate; Fig. 2 is a photograph showing the use of the cleaning composition of Example 16 to remove the glass substrate of the felt writing of Fig.; Fig. 3 is a view showing a fingerprint (which is an organic contaminant) Photograph of the contaminated glass substrate; Fig. 4 is a photograph showing the use of the cleaning composition of Example 16 to remove the fingerprint of the glass substrate of Fig. 3; Fig. 5 is a view showing a felt writing (which is one of organic contaminants) Photograph of the contaminated glass substrate; Fig. 6 is a photograph showing the use of the cleaning composition of Example 32 to remove the glass substrate of the felt writing of Fig. 5; Fig. 7 is a view showing a fingerprint (which is an organic contaminant) a photograph of the contaminated glass substrate; / Fig. 8 is a photograph showing the use of the cleaning composition of Example 32 to remove the fingerprint of the glass substrate of Fig. 7; θ Fig. 9 shows a Photograph of a glass substrate contaminated with a felt handwriting (which is an organic contaminant); 28/35 201109435 FIG. 10 is a photograph showing the use of the cleaning composition of Example 51 to remove the glass substrate of the felt writing of FIG. 9; 11 is a photograph showing a glass substrate contaminated with a fingerprint which is one of organic contaminants; and FIG. 12 is a photograph showing the glass substrate using the cleaning composition of Example 51 to remove the fingerprint of FIG. 29/35

Claims (1)

201109435 VII. Patent application scope: 1. A cleaning composition for a flat panel display, which comprises, according to the total amount of the composition,: (a) 0.05 to 5% by weight of an amine represented by any one of the following formulas 1 to 5 (b) 0.00% by weight of an additive comprising one or more selected from the group consisting of a solace compound, an alkanolamine salt and a reducing agent; and (c) the remainder being water: &lt;Formula 1 〉 <Formula 2> <Formula 3> Ο <Formula 4> 30/35 201109435 &lt;Formula 5&gt; Rl3 Rl4 N^:V a Rl2 Its _R r&gt; 1 4 and Rs are each independently a linear or branched extension of crc1G R2 I and & are each independently hydrogen, or a straight or branched alkyl group of Ci_Ciq; cc 8 each independently hydrogen, a straight or branched alkyl group of crc1(), an aryl group of 6 1G, a linear or branched alkylamine group of CrCio, CrC10 a 1 or a branched alkyl group, a linear or branched alkylbenzene of ci-Ci〇, or an amine group; /, 11 each independently hydrogen, a linear or branched alkyl group of CrC1G, ^ ^ R soil, linear or branched alkylamine group of CrCi0, or amine group; branch i ^]; 'c4 direct bond or branch ship base, or C1_C4 straight chain or ground is CA straight a bond or a lysine, a CA-based group, and an aryl group of R 10 or an alkoxy group 13 and a caliper 14 of C1_C4 bonded to each other to form a heterocyclic ring; and n 丨, h are each independently 〇 or 〇 to 4 Integer, n5W or 2 敕 ^ f 114 are each independently n7 A 5. 5 integer ^ integer, n6 is an integer from 1 to 4, 7 is an integer from 〇 to 4, \ is 8, ❹' and γ are secret Or an amine group. Χ2ΛΝ Χ3Λ€Η The cleaning composition for the flat panel display of the first item 'the amine compound is selected from the group consisting of singly lion, iN U-propyl propyl piperazine, and the team (2_ 铐 曱 曱 piperazine, Γ 2 _ work soil) piperazine, μ ( 2 · hydroxyethyl), & propyl) 4-methyl, 1-(2-butyl butyl) 31/35 2. 201109435 -4-mercapto Piperazine, i_(2-hydroxyethyl)_4_ethylpiperazine, 丨_(2•hydroxyethyl)-4-propylpiperazine, 1·(2·hydroxyethyl)pipetopiperazine,丨_(2-hydroxypropyl)-4-mercaptopiperazine, 1-(2-hydroxypropyl)-4-ethylpiperazine, ^(2-hydroxypropyl)-4-propylpiperazine, 1-(2-hydroxypropyl)pipetopiperazine, u(2-hydroxybutyl)-4-methylpiperazine, 1-(2-hydroxybutyl)·4·ethylpiperazine, 2-hydroxybutyl)-4-propylpiperazine, 1-(2-hydroxybutyl)-4-butylpiperazine, Ν_(2•hydroxyethyl)morpholine, Ν-(2-hydroxypropyl)? Group consisting of porphyrin, hydrazine-aminopropylmorpholine, hydroxyethylpiperazine, hydroxypropylpiperazine, and 1_(Ν-methylpiperazine)ethanol. 3. The cleaning composition for a flat panel display according to the first aspect of the invention, wherein the amine compound represented by the formula 2 is selected from the group consisting of hydrazine-piperazine diethanol and 1,4-piperazine dimethanol. 4. A cleaning composition for a flat panel display according to the scope of the patent application, wherein the amine compound represented by Formula 3 is selected from N_(2-hydroxyethyl)-extension/ethylurea N (3-light propyl group). a group consisting of ketones and ketones with 0 ketones and (2-hydroxyethyl)-2-pyrrolidone. 5. A cleaning composition for a flat panel display according to the scope of the patent application, wherein The amine compound represented by Formula 4 is selected from the group consisting of N-(2-hydroxyethyl)piperidine 6 N (2-propylpropyl) piperidine and N-(2-polybutyl) piperidine. The cleaning composition for a flat panel display according to claim i, wherein the amine compound represented by Formula 5 is selected from the group consisting of aminoethylaminopropyloxyethanol, aminobutoxyethanol, and dimethylamine. Ethoxy ethoxy ethoxy thiol, monopropyl ethoxy thiol, dibutylamino ethoxylate: alcohol, dimethylaminoethoxyethanol, diethylaminoethoxyethanol, propylamine Ethyl ethoxyethanol, dibutylaminoethoxyethanol, dimethylaminoethylene, ethanethiol, diethylaminoethoxypropane, dipropylaminoethoxybutanol, two Butyryl ethoxyethanol, N. (methoxymethyl) morphine, N_ 32/35 201109435 7. 8. 9. 10. 11. (Ethyl thiol sulfhydryl) hydrating, N_ (2_曱Oxyethanol), ethoxylate, acetin, and N_(2 • butoxyethanol) are formed by SH. ° = application of the patent _ 之 之 flat display (four) of the cleaning composition, hair The 5 oxazolium compound is selected from the group consisting of tolyltriazole, ^3. benzotriazole, I, 2,3-triazole, anthracene, 2,4, triazole, and amine-1,2,4-triazole. , 胺美美_4 ° °, three saliva, 1-p-benzotriazole, i• mercaptobenzotrisene, 2 ^ a' saliva, 5-methylbenzene f benzotrizene carbon Three: - (2, butterfly) * Two (four) Medium: The hospital salt is selected from the group consisting of monoethanolamine salt, diethyl; ethylamine salt, early isopropanolamine salt, and diisopropanolamine salt. The monoisopropylamine salt is as claimed in the scope of the patent application. The reducing agent comprises one or more selected from the group consisting of erythorbic acid. The flat panel display of the patent n n item (4) further comprises a chain-shaped alkanolamine, polyacidic acid: 1 substance ^ At least the group consisting of the substance and the surfactant - as in the scope of the patent application, wherein the chain is a cleaning composition, an alcohol amine, a butanamine, a 2-propoxyethylamine, an amine , monoisopropanolamine, and N-ethylethanolamine group / alcohol amine, N-methyl B, as claimed in the scope of the 10th item. Member of the board such as cleaning composition, 33/35 12. 201109435 Wherein the polyacid-copolymer comprises a unit structure represented by the following formula 6: &lt;Formula 6&gt; Rl5 Rl6 II-c-c-II RiT (CH2)hiiCOOMi wherein R丨7 is independently a hydrogen atom 'c-wide CA a straight or branched alkyl group, or (CH2)m2C00M2; Μ, and M2 are each independently a hydrogen atom, a metal, a soil tester, or a C"C1G unsubstituted or substituted alkylammonium group; m] and rri2 are each independently an integer of 〇2. 13. The cleaning composition for a flat panel display according to claim 10, wherein the metered alkylene glycol monoalkyl ether compound is selected from the group consisting of ethylene glycol monobutyl ether (BG) and diethylene glycol monoterpene ether. (MDG) 'diethylene glycol monoethyl ether (carbitol), diethylene glycol monobutyl ether (BDG), dipropylene glycol monoterpene ether (DpM), dipropylene glycol monoethyl ether (MFDG), triethylene glycol monobutyl A group consisting of ether (BTG), triethylene glycol monoethyl ether (MTG), and propylene glycol monoterpene ether (MFG). H. A cleaning composition for a flat panel display according to claim 1, wherein the cleaning composition has a pH of from 7 to 13. 15. A method of cleaning a flat panel display which uses a cleaning composition as claimed in claim i. 16. The method of cleaning a flat panel display according to claim 15, wherein the method is carried out using one or more selected from the group consisting of spraying, rotating, soaking, and ultrasonic soaking. 17. A method of cleaning a flat panel display according to claim 15 wherein the method is carried out at a temperature of from 20 to 80 °C. 34/35 201109435 18. The method of cleaning a flat panel display of claim 15, wherein the method is performed for 30 seconds to 10 minutes. 35/35