201105823 四、指定代表圖： (一)本案指定代表圖為：第（3 ) ㈡本代細之元件符賴單說明： 302玻璃基板薄化機 306洗淨單元 310餘刻單元201105823 IV. Designated representative drawings: (1) The representative representative of the case is: (3) (2) The components of this generation are detailed: 302 glass substrate thinning machine 306 cleaning unit 310 moments unit
304308312 314酸液供應單元 316 基板輸入/出單元 乾燥單元 玻璃砂清除單元 酸液補充單元304308312 314 Acid Supply Unit 316 Substrate Input/Output Unit Drying Unit Glass Sand Removal Unit Acid Replenishment Unit
五、本案若有化學式時，請揭示最能顯示發明特徵的化學式： 六、發明說明： 【發明所屬之技術領域】 本發明係有關於一種玻璃基板蝕刻機台，特別是一種具有 防，嘴阻塞之固液分離裝置之玻璃基板蝕刻機台。以離心式分 離系統連接於酸液處理系統’藉由離心力輔助，快速將玻璃砂 分離」使供酸管線及喷嘴不致快速堵塞失效，讓設備能正常發 揮功能。並採用非接觸式磁性傳動基板，減少機件腐蝕。 【先前技術】 用於大型態電視、電腦監視器、膝上型電腦、行動電話、 掌上型遊樂器等之液晶顯示器（LCD)、電漿顯示器（PDP^及 有機發光顯示器（OLCD)，其面板主要為彼此附著且說面對之 兩片玻璃基板，玻璃基板需产薄，一般使玻璃基板變薄之餘刻 處理機台於製造過程中產生大量副產物--玻璃砂(產生率約 為2kg/hr.每產線），先前技術之一例如第1圖所示，利用玻 璃基板薄化機102以酸液触刻玻璃基板以達減薄玻璃基板的 目的’副產物玻璃砂沉積於酸液供應處理單元底部，單以重力 /儿降’或管路循壤流經過濾、器104以遽袋分離，再回供酸液供 201105823 fk2〇6^f至玻璃基板薄化機102，無法順利達到移除率 生到痕、重產=品表面產 於生產。以_ _忙於清理_砂、而非用 以酸如I2圖所示，利用玻璃基板薄化機2〇2 义,以達減薄玻璃基板的目的，副產物破璃砂 二J加堅方式達到酸液與玻璃砂分離之目的，再 玄益i力!5 Ί"7離法也無法達到即時過遽功能，使生彦效 ί 響生產，使量產性變差’設備效益大㈣斤: 扣’將耗費大量人員與時間。 去’ΐϊϊίίΐί 砂之_迅速將玻，砂除 口 不=塞’幫浦、閥件不致受損或失效，尤其使產 口 σ表面^刮痕及缺陷，增進量紐、減減本及人力。 Η署問題是輸人/出之動力傳送問題，動力機 * ;強”!、腐錄贼’有可能沒漏造成機構腐餘之疑慮。 ，别，術之再-問題是磁性@定塊之吸附面，面積過大而 ’不易洗淨’需增加洗淨時間，需要更多純水、 月匕源及人力成本。 其把針對此—需求，提出—種能解決以上缺點之玻璃 基板餘刻機台，以應產業之需。 ‘； 【發明内容】 目的在提供—種具有时嘴阻塞之固液分離裝置 之玻璃基板侧機纟’使嘴嘴賴阻塞，㈣、财不致受損 201105823 或失效，尤其使產品表面減少刮痕及缺陷，增進量產性、減低 成本及人力。 * 為達成上述目的，本發明教導一種防噴嘴阻塞之固液 之，璃基板侧機自，帛於_紐薄化之基板薄化機包含四 ，單元：基板輸入/出單元，將基板垂直輸入至蝕刻單元， 處理後經洗淨、乾燥後將基板輸出；洗淨單元，自綱單元接 收已蝕刻之^板予以純水準洗淨後，傳送至乾燁單元；乾燥 兀’自洗淨單元接收已洗淨之基板予以乾驗，傳送至輸 兀，蝕刻單元，以來自酸液供應處理單元之酸液钱刻基板；1 特徵為：酸液供應處理單元包含三個單元：玻璃砂清除單元: 將蝕刻單元產生之酸液及蝕刻過程中產生之副產物二'—右 玻璃砂之酸液立即以幫浦送至玻璃砂清除單元⑽心式玻 砂分離單元财分離；酸液供應單元，齡玻鱗分離單 酸液補充衫魏之清潔酸祕應侧單元；麟補充單元， 補充新酸液；該_砂·清除單元麟心式、· ft由旋轉單元β、旋轉内筒、過濾、器、驗清除單元Γ成 幫，自該㈣單元送來混有錢砂之酸液經由該旋轉内 離Γ力輔助’快速將玻璃砂分離於該過渡器，酸液流 入“疋，内筒’再將酸液送回酸液供應處理單元或予以排放， 使供酸官線、噴嘴不致快速堵塞失效，濾渣定時由絲器清除。 璧i發r又教導一種防噴嘴阻塞之固液分離之玻璃基板钱 21板輸入、輸出及傳送之傳動方法為非接觸式磁性傳 ^由非接觸式之磁力傳動，使空間區隔得以達成；上方且 辅姓性(腐钮環境）、與下方機構元件區（一般環境），利^ 品她之材料區隔於其間，在不需任何物理接觸即可完 Hi減省傳動設計，完全沒有因必需接觸傳動，而有 賴構雜讀慮’下綠輪纟秘帶動逆時鐘轉 阿缝力傳動賤時鐘旋轉，㈣有非接觸式 201105823 本發明再教導-種时嘴阻塞之固液分狀玻璃基板餘 台，用於玻璃基板薄化之基板薄化機，包含基板輸入/出 單元，以固定治具將玻璃基板垂直輸入至蝕刻單元，經處理後 經洗淨、乾燥後將玻璃基板輸出；洗淨單元，自蝕刻單元接收 ^蝕刻之基板予以純水準洗淨後，傳送至乾燥單元；乾燥單 元1自6亥洗淨單元接收已洗淨之基板予以乾燥後，傳送至該輸 出單元；蝕刻單元，以來自酸液供應處理單元之酸液蝕刻基 板；酸液供應處理單元，供應蝕刻單元所需酸液，其特徵為： δ亥輸入/出單元之固定治具以磁性夾持塊之尖端保持玻璃 基板垂直但不妨礙酸液#刻，諸尖端可旋轉9〇度離開以放鬆 玻璃基板，磁性夾持塊之吸附面非平面而為小面積之柱狀吸附 面，使吸附面之酸液附著量減少而易於洗淨。 【實施方式】 本發明之以上及其他目的及優點參考以下之參照圖示及 最佳實施例之說明而更易完全瞭解。 •一種較佳具體實施例如第3圖所‘示，第3圖係依據本發明 之一實施例之防喷嘴阻塞之固液分離之玻璃基板蝕刻機台。一 般玻璃基板薄化機302包含基板輸入/出單元304、洗淨單元 306、乾燥單元308及蝕刻單元310。基板輸入/出單元304， 將基板垂直輸入至钱刻單元310，經薄化處理、洗淨、乾燥後 將基板輸出；洗淨單元308，自餘刻單元310接收已姓刻之基 板以純水洗淨後，傳送至乾燥單元306 ;钱刻單元，以來自酸 液供應處理單元之酸液餘刻基板.；酸液供應處理單元318，包 含三個丨單元：玻璃砂清除單元312，將蝕刻單元310產生之酸 液及蝕刻過程t產生之副產物一混有玻璃砂之酸液立即以幫 浦送至該玻璃砂清除單元312以離心式迅速分離玻璃砂；酸液 供應單元314,儲存該玻璃砂清除單元312及酸液補充單元316 送來之清潔酸液供應該蝕刻單元310 ;酸液補充單元316，補 201105823 充新酸液給酸液供應單元314。 請參考第4圖，第4圖係依據本發明之一實施例之防嘴嘴 阻塞之離心式分離系統圖。玻璃砂清除單元4〇〇為離心式、'或 螺旋式過濾分離系統，旋轉單元402由馬達412以軸心420為 軸帶動旋轉，旋轉單元402由旋轉内筒404、過渡器41〇、渡 渣清除器408構成，由幫浦自蝕刻單元310自管線418送來^ 有玻璃砂之酸液經由旋轉内筒404 ’藉由馬達412帶動旋轉之 離心力輔助’快速將玻璃砂分離於過濾器410，酸液流入外筒5. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention: 6. Description of the invention: [Technical field of the invention] The present invention relates to a glass substrate etching machine, in particular to a preventive, mouth-blocking The glass substrate etching machine of the solid-liquid separation device. The centrifugal separation system is connected to the acid treatment system to quickly separate the glass sand by centrifugal force, so that the acid supply line and the nozzle can not be quickly blocked and the device can function normally. The non-contact magnetic drive substrate is used to reduce corrosion of the machine. [Prior Art] Liquid crystal display (LCD), plasma display (PDP^ and organic light emitting display (OLCD)) for large-scale televisions, computer monitors, laptops, mobile phones, handheld games, etc. The panel is mainly two glass substrates attached to each other and facing each other. The glass substrate needs to be thinned. Generally, the glass substrate is thinned, and the processing machine generates a large amount of by-products in the manufacturing process--glass sand (the yield is about 2kg). /hr. per production line), one of the prior art, for example, as shown in Fig. 1, using a glass substrate thinning machine 102 to acid-etch a glass substrate to reduce the thickness of the glass substrate. The by-product glass sand is deposited on the acid solution. At the bottom of the supply processing unit, the gravity/child drop alone or the pipeline flows through the filter, and the device 104 separates the bag, and then supplies the acid solution for 201105823 fk2〇6^f to the glass substrate thinning machine 102, which is not smooth. Reach the removal rate to the mark, heavy production = the surface of the product is produced in production. Take _ _ busy cleaning _ sand, instead of using acid as shown in Figure I2, using the glass substrate thinning machine 2 〇 2 meaning, to reduce The purpose of the thin glass substrate, the by-product broken glass sand J plus The way to achieve the separation of acid and glass sand, and then Xuan Yi i force! 5 Ί " 7 separation method can not achieve the instantaneous over-the-counter function, so that the production of the effect of the production of the effect of the production, resulting in poor productivity (4) Jin: The buckle will cost a lot of personnel and time. Go to 'ΐϊϊίίΐί sand _ quickly to the glass, sand removal mouth is not = plug 'pull, valve parts will not be damaged or invalid, especially the surface σ surface scratches and Defects, increase the amount of money, reduce the cost and manpower. The problem of the signing is the power transmission problem of the input/output, the power machine*; the strong "!, the corrupt thief" may not leak the doubts of the institutional corruption. The re-problem of the technique is the adsorption surface of the magnetic @定块, the area is too large and the 'easy to clean' needs to increase the washing time, which requires more pure water, monthly source and labor cost. It is proposed for this - demand, A glass substrate engraving machine that can solve the above shortcomings is required by the industry. '; 【Contents of the invention】 The purpose is to provide a glass substrate side machine with a solid-liquid separation device with a mouth blockage. Blocking, (4), the money will not be damaged 201105823 or invalid, In particular, the surface of the product is reduced in scratches and defects, and the mass productivity, cost reduction and manpower are improved. * In order to achieve the above object, the present invention teaches a solid liquid which is resistant to nozzle clogging, and the glass substrate side is self-contained. The substrate thinning machine comprises four, a unit: a substrate input/output unit, the substrate is vertically input to the etching unit, and after processing, the substrate is washed and dried, and the substrate is output; the cleaning unit receives the etched plate from the unit. After the pure water is washed, it is sent to the cognac unit; the dry 兀 'self-cleaning unit receives the cleaned substrate for dry inspection, and sends it to the sputum, and etches the unit to extract the acid from the acid supply processing unit. ;1 Features: The acid supply processing unit consists of three units: glass sand removal unit: the acid produced by the etching unit and the by-product produced by the etching process, the right acid solution of the right glass sand, is immediately sent to the pump. Glass sand removal unit (10) heart-type glass sand separation unit financial separation; acid supply unit, aged glass scale separation single acid liquid supplement shirt Wei Zhi clean acid secret side unit; Lin supplement unit, supplement new acid liquid; The _ sand·clearing unit core type, · ft is rotated by the rotating unit β, the rotating inner cylinder, the filter, the device, and the cleaning unit, and the acid liquid mixed with the sand sand is sent from the (four) unit. Γ力助' Quickly separate the glass sand from the transition device, the acid solution flows into the “疋, the inner tube” and then returns the acid solution to the acid supply processing unit or discharges it, so that the acid supply line and the nozzle do not quickly block and fail. The filter residue is periodically removed by the yarn.璧ifa r also teaches a glass substrate for preventing solid and liquid separation of nozzles. The transmission method of input, output and transmission is non-contact magnetic transmission, which is achieved by non-contact magnetic transmission, so that space separation can be achieved; Above and the auxiliary surname (corrosion button environment), and the lower institutional component area (general environment), the material of her product is separated between them, and the transmission design can be reduced without any physical contact. It is necessary to contact the transmission, and it depends on the miscellaneous readings. The green rim is used to drive the reverse clock to the sewing machine. The clock is rotated. (4) There is a non-contact type 201105823. The present invention further teaches a solid-liquid fractal glass substrate with a mouth blocked. The substrate thinning machine for thinning the glass substrate comprises a substrate input/output unit, and the glass substrate is vertically input to the etching unit by a fixed fixture, and after being processed, the glass substrate is output after being washed and dried; The clean unit receives the etched substrate from the etching unit and cleans it to a drying unit; the drying unit 1 receives the cleaned substrate from the 6-sea cleaning unit, and then transmits it to the cleaned substrate. An output unit; an etching unit for etching the substrate with an acid solution from the acid supply processing unit; an acid supply processing unit for supplying an acid solution required for the etching unit, wherein: the fixed fixture of the δH input/output unit is magnetically clamped The tip of the block keeps the glass substrate perpendicular but does not interfere with the acid solution. The tips can be rotated by 9 degrees to relax the glass substrate. The adsorption surface of the magnetic clamping block is non-planar and is a small-area columnar adsorption surface for adsorption. The amount of acid on the surface is reduced and it is easy to wash. The above and other objects and advantages of the present invention will be more fully understood from the following description of the preferred embodiments. A preferred embodiment is shown in Fig. 3, and Fig. 3 is a glass substrate etching machine for preventing solid and liquid separation by nozzle clogging according to an embodiment of the present invention. The general glass substrate thinning machine 302 includes a substrate input/output unit 304, a cleaning unit 306, a drying unit 308, and an etching unit 310. The substrate input/output unit 304 vertically inputs the substrate into the engraving unit 310, and outputs the substrate after being thinned, washed, and dried. The cleaning unit 308 receives the substrate of the surnamed pure water from the residual engraving unit 310. After washing, it is sent to the drying unit 306; the money engraving unit is the acid residual substrate from the acid supply processing unit. The acid supply processing unit 318 includes three germanium units: a glass sand removing unit 312, which will be etched. The acid produced by the unit 310 and the by-product produced by the etching process t, the acid liquid mixed with the glass sand is immediately sent to the glass sand removing unit 312 by the pump to rapidly separate the glass sand by centrifugation; the acid supply unit 314 stores the The cleaning acid sent from the glass sand removing unit 312 and the acid replenishing unit 316 is supplied to the etching unit 310; the acid replenishing unit 316 supplements 201105823 to the acid supply unit 314. Please refer to Fig. 4, which is a diagram of a centrifugal separation system for preventing mouthpiece clogging according to an embodiment of the present invention. The glass sand removing unit 4 is a centrifugal type, or a spiral filter separation system, and the rotating unit 402 is rotated by the motor 412 with the shaft 420 as an axis. The rotating unit 402 is rotated by the inner cylinder 404, the transition unit 41, and the slag. The cleaner 408 is configured to be sent from the pipeline self-etching unit 310 from the pipeline 418. The acid liquid having the glass sand is assisted by the centrifugal force of the rotating inner cylinder 404' by the motor 412 to quickly separate the glass sand from the filter 410. Acid flowing into the outer cylinder
404 ’再將酸液經由管線422送回酸液供應處理單元314或予 以排放，使供酸管線、噴嘴不致快速堵塞失效，濾.渣定時由濾 渣清除器408清除。定時清除濾渣時由管線416以清水將濾^ 沖洗，再由濾渣清除器408定時清除過濾器410内之玻璃 沖洗之清水則由管線414供應，由管線422排放。 叫參考第5圖，第5圖係依據本發明之一實施例之非接觸 式磁性傳動蝕刻安排。下方滾輪504置於一般環境，由馬達帶 ，順時鐘轉動’上方滾輪5G2置於具強烈輔錄(腐餘環境） ，由非接觸式之磁力龠動，使空間區隔得以達成；上方具強烈 j蝕性以酸液蝕刻基板5〇8之腐蝕環境，利用與化學品相容^ =510區隔於其間’上方滾輪5G2即可經磁力傳動以逆時鐘 因而有非接觸式線性傳動功能，在不需任何物理接觸即 目的，減省傳動設計，完全沒有因必需接觸傳動， 叙漏造成機構雜之疑慮。帛6圖係非接觸式磁性傳 f絲輪與被動輪之祕®。下方滾輪504為主動輪， ί 境^馬達帶動順時鐘轉動，上方滾輪5〇2為被動 ;方乎二:%<境，經磁力’動逆時鐘轉動，上方滾輪502、 滾輪504由與化學品相容之材料510區隔。 出單ΐΐΐΐ 7圖’第7圖係依據本發明之-實施例之輸入/ 出早疋之峡治具以磁性夾持塊之尖端保持破璃基板之示意 201105823 圖。第7 ί (A)為磁性夾持塊夾持玻璃基板之示意圖。磁性 灸持塊704以夾持尖端706使玻璃基板702保持垂直，但不完 全與玻璃基板702接觸’使酸液能到達夾持尖端706面對之玻 ，基板702表面，第7圖（Β)為磁性夾持塊放鬆玻璃基板之 示意圖。磁性夾持塊704之夾持尖端706轉開90度以放鬆玻 璃基板702，使玻璃基板702能輸入或輸出。 請參考第8圖，第8圖為先前技術之磁性夾持塊之吸附面 之示意圖。吸附面802以整個表面吸附使夾持尖端7〇6.保持玻 璃基板702垂直。吸附面之酸液附著整個表面，致難以洗淨， 需增加洗淨時間，需要更多純水、能源及人力成本。 ^吸附面，面積減少，可使吸附面之酸液附著量減少，易 淨，仍能保持玻璃基板702垂直。減少洗淨時間、純水、 請參考第9圖，第9圖為依據本發明之一實施例之磁性夾 持塊之吸附面之示意圖。柱狀吸附面9〇2之表面為小面積之柱 及人力成本。404' is further sent back to the acid supply processing unit 314 via line 422 or discharged, so that the acid supply line and the nozzle are not quickly blocked, and the slag timing is cleared by the filter slag remover 408. When the filter residue is removed regularly, the filter is flushed by the water in the pipeline 416, and then the glass rinsed in the filter 410 is periodically removed by the filter residue remover 408. The clean water is supplied from the line 414 and discharged by the line 422. Referring to Figure 5, Figure 5 is a non-contact magnetic drive etch arrangement in accordance with one embodiment of the present invention. The lower roller 504 is placed in the general environment, and is rotated by the motor belt. The upper roller 5G2 is placed in a strong auxiliary recording (corrosion environment), and the non-contact magnetic force is used to move the space to achieve the space separation; j etched with acid to etch the substrate 5 〇 8 corrosive environment, using chemical compatibility ^ = 510 zone between the 'upper roller 5G2 can be magnetically driven to reverse clock and thus has a non-contact linear transmission function, in No need for any physical contact, that is, the purpose of reducing the transmission design, there is no need to contact the transmission, and the leakage of the mechanism causes confusion.帛6 is a non-contact magnetic transmission f and a passive wheel. The lower roller 504 is the driving wheel, the ί environment ^ motor drives the clock to rotate, the upper roller 5 〇 2 is passive; the second two: % < the environment, the magnetic 'reverse clock rotation, the upper roller 502, the roller 504 and the chemical The material compatible material is 510. Figure 7 is a schematic view of the input/outlet of the gorge in accordance with the present invention, with the tip of the magnetic clamping block holding the glass substrate. The seventh ί (A) is a schematic view of the magnetic chuck holding the glass substrate. The magnetic moxibustion block 704 holds the tip 706 to keep the glass substrate 702 vertical, but does not completely contact the glass substrate 702 'to enable the acid to reach the glass facing the clamping tip 706, the surface of the substrate 702, Fig. 7 (Β) A schematic view of the glass substrate being relaxed for the magnetic clamping block. The gripping tip 706 of the magnetic clamping block 704 is rotated 90 degrees to relax the glass substrate 702, enabling the glass substrate 702 to be input or output. Please refer to Fig. 8. Fig. 8 is a schematic view showing the adsorption surface of the magnetic clamping block of the prior art. The adsorption surface 802 is adsorbed over the entire surface to hold the clamping tip 7〇6. The glass substrate 702 is held vertically. The acid on the adsorption surface adheres to the entire surface, making it difficult to wash. It requires more cleaning time and requires more pure water, energy and labor costs. ^Adsorption surface, the area is reduced, the acid deposition amount of the adsorption surface can be reduced, and the glass substrate 702 can be kept vertical. To reduce the washing time and pure water, please refer to Fig. 9. Fig. 9 is a schematic view showing the adsorption surface of the magnetic clamping block according to an embodiment of the present invention. The surface of the columnar adsorption surface 9〇2 is a small-area column and labor cost.
【圖式簡單說明】 ，易於洗 欠、能源 第1圖（先祕術）以沉殿過攄之玻璃基板钱刻機台； 第2圖（先前技術）赠外過狀朗基祕刻機台； 實施例之防噴嘴阻塞之固液分離之 苐3圖係依據本發明之一 玻璃基板蝕刻機台； 實施例之防噴嘴阻塞之離心式分離 第4圖係依據本發明之— 糸統圖； 201105823 本發明之一實施例之非接觸式磁性傳動#刻安 第6圖係依據本發明之一實施例之防喷嘴阻塞之非接觸式磁 性傳動蝕刻之主動輪與被動輪之關係圖； 第7圖係依據本發明之一實施例之輸入/出單元之固定治具以 磁性夹持塊之尖端保持玻璃基板之示意圖。 〃[Simple description of the schema], easy to wash, energy, the first picture (first secret surgery) to the sun-drenched glass substrate money engraving machine; Figure 2 (previous technology) gifted outside the Langji secret engraving machine 3 is a glass substrate etching machine according to the present invention; the centrifugal separation of the nozzle blocking in the embodiment is shown in FIG. 4 according to the present invention; 201105823 Non-contact magnetic transmission according to an embodiment of the present invention. FIG. 6 is a diagram showing a relationship between a driving wheel and a passive wheel of a non-contact magnetic transmission etching preventing nozzle clogging according to an embodiment of the present invention; The figure is a schematic view of a fixing fixture of an input/output unit according to an embodiment of the present invention holding a glass substrate at the tip end of a magnetic clamping block. 〃
第5圖係依據 排； 第7圖（A)為磁性夾持塊夾持玻璃基板之示意圖。 第7圖（B)為磁性夾持塊放鬆玻璃基板之示意圖。 第8圖為先前技術之磁性夾持塊之吸附面之示意圖。 第9圖為依據本發明之一實施例之磁性爽持塊之吸附面 意圖。Figure 5 is based on the row; Figure 7 (A) is a schematic view of the magnetic chuck holding the glass substrate. Figure 7 (B) is a schematic view of the magnetic clamping block relaxing the glass substrate. Figure 8 is a schematic view of the adsorption surface of the prior art magnetic clamping block. Fig. 9 is a view showing the adsorption surface of the magnetic holding block according to an embodiment of the present invention.
【主要元件符號說明】 102玻璃基板薄化機 106酸液供應槽 204 St液供應槽 302玻璃基板薄化機 306洗淨單元 310蝕刻單元 314酸液供應單元 400玻璃砂清除單元 404旋轉内筒 410.過濾器 414、416、422 管線 104過濾器 202玻璃基板薄化機 206 .線外過濾系統 304基板輸入/出單元 308乾燥單元 312玻璃砂清除單元 316酸液補充單元 402旋轉單元 408濾渣清除器 412馬達 420轴心 201105823 502上方滾輪 504 508基板 510 702玻璃基板 704 706夾持尖端 802 902柱狀吸附面 下方滾輪 與化學品相容之材料 磁性夾持塊 吸附面[Main component symbol description] 102 glass substrate thinner 106 acid supply tank 204 St liquid supply tank 302 glass substrate thinner 306 cleaning unit 310 etching unit 314 acid supply unit 400 glass sand removing unit 404 rotating inner cylinder 410 Filter 414, 416, 422 Line 104 Filter 202 Glass substrate thinner 206. Out-of-line filtration system 304 Substrate input/output unit 308 Drying unit 312 Glass sand removal unit 316 Acid replenishing unit 402 Rotating unit 408 Filter residue cleaner 412 motor 420 shaft 201105823 502 upper roller 504 508 substrate 510 702 glass substrate 704 706 clamping tip 802 902 cylindrical adsorption surface under the roller and chemical compatible material magnetic clamping block adsorption surface