CN209515624U - Single-wafer wet treatment apparatus - Google Patents

Abstract

This announcement provides a kind of single-wafer wet treatment apparatus, includes: turntable, for placing wafer；Liquid supplying apparatus, for applying kinds of processes liquid to the wafer；Liquid withdrawal system includes multiple recycling rings, wherein each recycling ring is used to collect the gas-liquid mixture of corresponding one of process liquid and its entrainment；And multiple gas concentration units, it is correspondingly connected with respectively with the multiple recycling ring of the liquid withdrawal system, the gas-liquid mixture discharge for that will collect.

Description

Single-wafer wet treatment apparatus

Technical field

This announcement is related to a kind of wet treatment apparatus, more particularly to a kind of single-wafer wet treatment apparatus.

Background technique

In the technique of semiconductor crystal wafer, the element setting face to semiconductor crystal wafer is needed to carry out multiple tracks processing step, packet Containing wet processeds programs such as etching, cleanings.As the process complexity of semiconductor crystal wafer increases, a kind of single-wafer has been developed Wet process board, wherein the design of multiple liquids recovery mould groups is corresponded to using a turntable, so that single-wafer wet process board A variety of different chemical liquids can be applied to the wafer on turntable, and the chemical liquids are collected by corresponding recycling mould group Body.By apply different chemical liquid can on semiconductor crystal wafer various metals layer or other materials film layer clean Etching.That is, will use a variety of different chemical liquids in single-wafer wet process board, this makes for collecting chemistry The functional requirement of the collection device of liquid and its gas-liquid mixture of entrainment becomes especially stringent.

However, existing single-wafer wet process board is to be commonly connected to a gas using multiple liquids recovery mould groups to return The design of receiving apparatus.That is, although existing single-wafer wet process board can be corresponded to by multiple liquids recovery mould groups Different chemical liquids is collected, but the different gas-liquid mixtures that different chemical liquids is carried secretly can not independently be collected. It is mixed in together in gas concentration unit that the design of above-mentioned single a gas concentration unit will lead to different gas-liquid mixtures. Since different gas-liquid mixtures contains (such as acid, alkali, solvent etc.) medical fluid of different nature, if easy production mixed in together Raw additional chemical reaction, in turn results in the injury of personnel or board, and also will increase the degree of difficulty of processing gas recovery.Again Person, if mixture mixed in together flows back into multiple liquids recovery module internals, it will cause liquids recovery mould group receipts The problem of cross contamination occurs between the chemical liquid and mixture collected.

In view of this, it is necessary to a kind of single-wafer wet treatment apparatus is proposed, to solve problems of the prior art.

Utility model content

To solve above-mentioned problem of the prior art, this announcement is designed to provide a kind of single-wafer wet treatment apparatus, Independent recycling operation can be carried out for the gas-liquid mixture of different process liquid entrained with, it is mixed to avoid different gas-liquid mixtures It is miscellaneous together.

To reach above-mentioned purpose, this announcement provides a kind of single-wafer wet treatment apparatus, includes: turntable, for placing crystalline substance Circle；Liquid supplying apparatus is arranged above the turntable, for applying kinds of processes liquid to the wafer；Liquids recovery Device is arranged circumferentially at around the turntable, and can be moved along vertical direction relative to the turntable, wherein institute Stating liquid withdrawal system includes multiple recycling rings that setting is stacked along the vertical direction, and each recycling ring is for receiving Collect the gas-liquid mixture of corresponding one of process liquid and its entrainment；And multiple gas concentration units, respectively with it is described The multiple recycling ring of liquid withdrawal system is correspondingly connected with, wherein each gas concentration unit includes: bellows, comprising the One connector and the second connector, wherein first connector is connected with corresponding recycling ring, so that in the recycling ring The gas-liquid mixture enters the inside of the bellows by first connector；And exhaust pipe, the institute with the bellows The connection of the second connector is stated, the gas-liquid mixture discharge for that will collect.

In one of them preferred embodiment of this announcement, the bellows of each gas concentration unit also include: upper table Face, lower surface, side surface, cavity, the upper surface are oppositely arranged with the lower surface, and side surface position is in the upper table Between face and the lower surface and the cavity is interconnected by the upper surface, the lower surface and the side surface And form, wherein first connector setting is arranged in the side surface and second connector in the upper surface.

In one of them preferred embodiment of this announcement, the bellows of each gas concentration unit also include: drain Mouthful, setting is in the lower surface, so that the gas-liquid mixture passes through the row by the coagulating liq that the bellows generate The discharge of liquid mouth.

In one of them preferred embodiment of this announcement, each recycling ring of the liquid withdrawal system includes: liquid Receiving port is aligned with the turntable；The inside of the recycling ring is arranged in be separated out inner annular space and outer annular space in demarcation plate Between, wherein the inner annular space is used to accept the gas from the Liquid acquisition mouth process liquid entered and its entrainment Liquid mixture, and the demarcation plate stops the process liquid to flow to the outer annular space, Yi Jisuo from the inner annular space It states and is formed with multiple through-holes on demarcation plate, for allowing the gas-liquid mixture in the inner annular space to pass through the multiple through-hole Into the outer annular space；And liquid collection port, it is connected to the inner annular space, for allowing the process liquid from the liquid The discharge of body collection port；And multiple gas concentration units, it is corresponding with the multiple recycling ring of the liquid withdrawal system respectively Connection, the gas-liquid mixture discharge for that will collect.

In one of them preferred embodiment of this announcement, each recycling ring also includes: annular upper cover；Annular bottom plate, with The annular upper cover is correspondingly arranged；External annulus is connect with the outer peripheral edge of the outer peripheral edge of the annular upper cover and the annular bottom plate； Gas passage mouth is arranged on the external annulus, and with it is one of corresponding described in gas concentration unit connect, wherein described in Demarcation plate setting is between the annular upper cover and the annular bottom plate and Liquid acquisition mouth position is in the annular upper cover Inner peripheral and the annular bottom plate inner peripheral between.

In one of them preferred embodiment of this announcement, the bellows of each gas concentration unit also include to see view Window, and the inside of the bellows can be seen by the observing window；And wherein the single-wafer wet treatment apparatus also includes more A water lines, and the bellows of each gas concentration unit are connect with the water lines, and pass through the water Clean water is transmitted to the bellows to clean the inside of the bellows by pipeline.

This announcement also provides a kind of single-wafer wet treatment apparatus, includes: turntable, for placing wafer；Liquid supply dress It sets, is arranged above the turntable, for applying kinds of processes liquid to the wafer；Liquid withdrawal system is circumferentially set It sets around the turntable, and can be moved along vertical direction relative to the turntable, wherein the liquids recovery fills It sets comprising multiple recycling rings for stacking setting along the vertical direction, wherein each recycling ring includes: Liquid acquisition mouth, It is aligned with the turntable, for receiving the gas-liquid mixture of corresponding one of process liquid and its entrainment；Demarcation plate, if The inside in the recycling ring is set to be separated out inner annular space and outer annular space, wherein the inner annular space is for accepting from described The gas-liquid mixture of the process liquid and its entrainment that Liquid acquisition mouth enters, and the demarcation plate stops the work Skill liquid flow in the outer annular space and the demarcation plate from the inner annular space and is formed with multiple through-holes, for allowing The gas-liquid mixture stated in inner annular space enters the outer annular space by the multiple through-hole；And liquid collection port, It is connected to the inner annular space, for allowing the process liquid to be discharged from the liquid collection port；And multiple gas recycling dresses It sets, is correspondingly connected with respectively with the multiple recycling ring of the liquid withdrawal system, the gas-liquid mixture for that will collect Discharge.

In one of them preferred embodiment of this announcement, each recycling ring also includes: annular upper cover；Annular bottom plate, with The annular upper cover is correspondingly arranged；External annulus is connect with the outer peripheral edge of the outer peripheral edge of the annular upper cover and the annular bottom plate； Gas passage mouth is arranged on the external annulus, and with it is one of corresponding described in gas concentration unit connect, wherein described in Demarcation plate setting is between the annular upper cover and the annular bottom plate and Liquid acquisition mouth position is in the annular upper cover Inner peripheral and the annular bottom plate inner peripheral between.

In one of them preferred embodiment of this announcement, each gas concentration unit includes: bellows, includes the first connection Mouth and the second connector, wherein first connector is connected with corresponding recycling ring, so that the gas in the recycling ring Liquid mixture enters the inside of the bellows by first connector；And exhaust pipe, described second with the bellows Connector connection, the gas-liquid mixture discharge for that will collect.

In one of them preferred embodiment of this announcement, the bellows of each gas concentration unit also include: upper table Face, lower surface, side surface, cavity, the upper surface are oppositely arranged with the lower surface, and side surface position is in the upper table Between face and the lower surface and the cavity is interconnected by the upper surface, the lower surface and the side surface And form, wherein first connector setting is arranged in the side surface and second connector in the upper surface.

In one of them preferred embodiment of this announcement, the bellows of each gas concentration unit also include: drain Mouthful, setting is in the lower surface, so that the gas-liquid mixture passes through the row by the coagulating liq that the bellows generate The discharge of liquid mouth.

In one of them preferred embodiment of this announcement, the bellows of each gas concentration unit also include to see view Window, and the inside of the bellows can be seen by the observing window；And wherein the single-wafer wet treatment apparatus also includes more A water lines, and the bellows of each gas concentration unit are connect with the water lines, and pass through the water Clean water is transmitted to the bellows to clean the inside of the bellows by pipeline.

Compared to prior art, this announcement passes through setting gas concentration unit identical with the recycling quantity of ring, and every One recycling ring is correspondingly connected with a gas concentration unit.Design whereby, can by different gas concentration units to from The process gas of difference recycling ring independently carries out pumping operation, mixed to avoid the different gas-liquid mixtures of different process liquid entrainment It is miscellaneous and then to generate additional chemical reaction together, single-wafer wet treatment apparatus or the injury of personnel are caused, and also reduce Handle the complexity of gas recovery.Furthermore wafer caused by the exhaust gas recirculation mixed to turntable or recycling ring can also be avoided The either pollution of other process chambers.

Detailed description of the invention

Fig. 1 shows the stereoscopic schematic diagram of the single-wafer wet treatment apparatus of the preferred embodiment of this announcement；

Fig. 2 shows the enlarged cross-sectional view of the single-wafer wet treatment apparatus of Fig. 1；

Fig. 3 shows the partial schematic diagram of the recycling ring and gas concentration unit of the single-wafer wet treatment apparatus of Fig. 1；

Fig. 4 shows the part explosive view of the recycling ring of Fig. 3；And

Fig. 5 shows another enlarged cross-sectional view of the single-wafer wet treatment apparatus of Fig. 1.

Specific embodiment

In order to which the above-mentioned and other purposes of this announcement, feature, advantage can be clearer and more comprehensible, it is excellent that spy is hereafter lifted into this announcement Embodiment is selected, and cooperates institute's accompanying drawings, is described in detail below.

Fig. 1 is please referred to, shows the stereoscopic schematic diagram of the single-wafer wet treatment apparatus 1 of the preferred embodiment of this announcement.It is single Wafer wet treatment apparatus 1 includes turntable 10, liquid supplying apparatus (not shown in the figures), liquid withdrawal system 20, Duo Geqi Body recyclable device 30 and lifting device 40.The quantity of gas concentration unit 30 is four in the present embodiment, only this announcement not office It is limited to this.Turntable 10 is for placing single wafer (not shown in the figures).In the present embodiment, the top packet of turntable 10 Containing a vacuum chuck, and the suction of the application by vacuum chuck, so that wafer can be fixed at the top of turntable 10.Rotation Turntable 10 is configured with driving mechanism, for driving turntable 10 to be pivoted.Others side also can be used in other embodiments Formula is fixed on a spinstand by wafer, for example, by using clamping device etc..Furthermore liquid supplying apparatus is arranged on turntable 10 Side, for applying kinds of processes liquid to wafer.Specifically, liquid supplying apparatus includes nozzle and a plurality of liquid transfer tube Line, wherein nozzle is set as connecting with one end of the top alignment of turntable 10 and a plurality of liquid transfer tube line with nozzle, separately One end is respectively connected to the feed end of different process liquids.It designs whereby, liquid supply dress can be controlled according to process requirements The wafer applied on corresponding process liquid to turntable 10 is set, the operations such as to be etched or clean to wafer.

As shown in Figure 1, liquid withdrawal system 20 is arranged circumferentially at around turntable 10, for collecting from turntable 10 The process liquid that upper crystal column surface is thrown away by centrifugal force, and the process liquid is discharged.Multiple gas concentration units 30 with Liquid withdrawal system 20 is correspondingly connected with, the gas-liquid mixture discharge for that will collect.The liquid withdrawal system 20 of the present embodiment with The specific structure of gas concentration unit 30 will be in rear detailed description.Lifting device 40 is connect with liquid withdrawal system 20, for controlling liquid Body recyclable device 20 is along 10 lifting moving of a vertical direction relative rotation platform.Also, due to multiple gas concentration units 30 with Liquid withdrawal system 20 connects, therefore when liquid withdrawal system 20 is gone up and down, jointly in multiple meetings together of gas concentration units 30 It rises or declines.

Referring to Fig.1 and 2, Fig. 2 shows the enlarged cross-sectional view of the single-wafer wet treatment apparatus 1 of Fig. 1.Liquids recovery Device 20 includes multiple recycling rings 21~24 that setting is stacked along vertical direction.Each recycling ring 21~24 is for collecting correspondence One of process liquid and its entrainment gas-liquid mixture.By the control of lifting device 40, make the multiple recycling ring 21~24 synchronizing movings together, can so be such that specified recycling ring 21~24 is moved to and be aligned with turntable 10, wherein alignment is Refer to that the Liquid acquisition mouth of one of them recycling ring 21~24 is adjacent with the wafer on turntable 10, so that when liquid supplying apparatus is applied Add the wafer on process liquid to turntable 10, and when turntable 10 rotates, crystal column surface is thrown away because of centrifugal force on turntable 10 Process liquid can be collected by one of adjacent recycling ring 21~24.That is, the single-wafer wet process of this announcement is set Standby 1 is a kind of cleaning etching machines with mobile liquid recyclable device 20, it can be such that the wafer on turntable 10 keeps Level is fixed, does not move up and down.It is specified according to the step of executing control when carrying out single-wafer rotary-cleaning or etch process Recycling ring be moved to alignment turntable 10, specific process liquid is then sprayed to crystalline substance by the liquid supplying apparatus above wafer Circular surfaces, and wafer rotation is driven by turntable 10, to collect the gas-liquid mixture of this specific process liquid and its entrainment.

Referring to figure 2. and Fig. 3, wherein Fig. 3 shows that the recycling ring 21 of the single-wafer wet treatment apparatus 1 of Fig. 1 and gas recycle The partial schematic diagram of device 30.Fig. 3 be using position first layer recycling ring 21 and gas concentration unit connected to it 30 as Explanation.It should be understood that the structure of remaining recycling ring 22~24 is roughly the same with the recycling structure of ring 21 of first layer.Such as figure Shown in 2, recycling ring 21 includes annular upper cover 201, annular bottom plate 202, external annulus 203, Liquid acquisition mouth 204.Also, such as Fig. 3 institute Show, recycling ring 21 also includes demarcation plate 205, gas passage mouth 206 and liquid collection port 207.Recycle the annular bottom plate of ring 21 202 are correspondingly arranged with annular upper cover 201.In the present embodiment, the multiple recycling ring 21~24 is set along vertical direction stacking It sets, and the annular bottom plate 202 of the recycling ring of position above is the annular upper cover 201 of the recycling ring as lower section, so that Space inside each recycling ring is maximized, and that saves liquid withdrawal system 20 uses material, and effectively reduces liquid The overall volume of body recyclable device 20.Recycle the external annulus 203 of ring 21 and outer peripheral edge and the annular bottom plate 202 of annular upper cover 201 Outer peripheral edge connection.Annular upper cover 201, annular bottom plate 202 and external annulus 203 are connected to each other and define recycling ring 21 Inner space.204, Liquid acquisition mouth of recycling ring 21 are in the inner peripheral of annular upper cover 201 and the inner peripheral of annular bottom plate 202 Between.When specified recycling ring 21 is moved to alignment turntable 10, the Liquid acquisition mouth 204 of specified recycling ring 21 can be with rotation Platform 10 is aligned, so that recycling ring 21 can receive the gas-liquid mixed of corresponding process liquid and its entrainment by Liquid acquisition mouth 204 Object.

As shown in figure 3, the inside that the inside of recycling ring 21 is arranged in will recycle ring 21 in the demarcation plate 205 of recycling ring 21 is empty Between be separated out an inner annular space 208 and an outer annular space 209.Inner annular space 208 is used to accept from the entrance of Liquid acquisition mouth 204 Process liquid and its gas-liquid mixture of entrainment, and process liquid can be prevented from inner annular space by the blocking of demarcation plate 205 208 flow to outer annular space 209.Multiple through-holes 2051 are formed on demarcation plate 205, so that the gas-liquid mixed in inner annular space 208 Object can enter outer annular space 209 by the multiple through-hole 2051.In the present embodiment, 28 are formed on demarcation plate 205 to lead to Hole 2051, it is only not limited to this.Preferably, the aperture of the through-hole 2051 of demarcation plate 205 is about 5 to 10mm, to ensure on the one hand The gas-liquid mixture that process liquid is carried secretly can be fully evacuated to outer annular space 209 from inner annular space 208, on the other hand can also incited somebody to action Process liquid obstructs in inner annular space 208.

As shown in figure 3, recycling ring 21 gas passage mouth 206 be arranged on external annulus 203, and gas passage mouth 206 with Corresponding gas concentration unit 30 connects, and so recycling can after the gas-liquid mixture that ring 21 is collected into enters outer annular space 209 Gas concentration unit 30 is sent to by gas passage mouth 206.The liquid collection port 207 and inner annular space 208 for recycling ring 21 connect It is logical, for allowing process liquid to be discharged from liquid collection port 207.Specifically, liquid collection port 207 is located at the level of recycling ring 21 The minimum point of position, so that process liquid collected by recycling ring 21 flow to liquid collection port 207 because of gravity.Also, it returns The liquid collection port 207 for receiving ring 21 is connected with corresponding recovery tube, and then the process liquid being collected into is discharged or recycled.Citing For, as shown in Fig. 2, position is connect in the recycling ring 22 of the second layer with the recovery tube 50 inside single-wafer wet treatment apparatus 1, and The process liquid that recycling ring 22 is collected is that passage path 51 is discharged.Optionally, recovery tube 50 can be connect with the circulatory system, will be located Process liquid after reason is transmitted back to the liquid supplying apparatus of single-wafer wet treatment apparatus 1 again.Preferably, liquid collection port 207 Aperture be about 10 to 15mm, with guarantee to allow impurity after etching, collection process liquid or its crystallization formed pass through.

Referring to figure 4., the part explosive view of the recycling ring 21 of Fig. 3 is shown.The plate face of demarcation plate 205 is parallel to recycling ring 21 stacking direction.The side of demarcation plate 205 be mounted in the lower groove 2021 of annular bottom plate 202 and demarcation plate 205 it is another Side is mounted in the upper groove 2011 (referring to Fig. 5) of annular upper cover 201.It, can be square by the mounting means of above-mentioned demarcation plate 205 Just the assembling and replacement of demarcation plate 205.Furthermore the demarcation plate 205 in the present embodiment, recycling ring 21 is using four-piece type knot Structure designs whereby, when the wherein obstruction of through-hole 2051 of a piece of demarcation plate 205, can be replaced just for described demarcation plate 205 It changes, without all changing whole group demarcation plate 205.The demarcation plate of other quantity can be used in other embodiments, no It is confined to this.It should be noted that multiple through-holes 2051 of demarcation plate 205 are with equal or similar be alternatively arranged into one each other Ring-type, to form a cyclic annular pumping construction, and then the extraction air-flow for ensuring to recycle ring 21 be it is uniform, can sufficiently extract cleaning or The gas-liquid mixture of the process liquid entrained with of etching.Also, the design of pumping construction cyclic annular whereby, can avoid to wafer into When row etching operation, the process liquid on wafer is biased to certain by the big airflow influence towards single direction on one side, causes wafer Etching it is uneven.

As depicted in figs. 1 and 2, the quantity of gas concentration unit 30 and the recycling quantity of ring 21~24 are identical and each Recycling ring 21~24 is correspondingly connected with a gas concentration unit 30.It designs whereby, different gas concentration units 30 can be passed through Pumping operation is independently carried out for the process gas from different recycling rings 21~24, to avoid different process liquid entrainment Different gas-liquid mixtures are mixed in together, and then generate additional chemical reaction, cause single-wafer wet treatment apparatus 1 or personnel Injury, and also reduce the complexity of processing gas recovery.Furthermore the exhaust gas recirculation mixed can also be avoided to turntable 10 Or recycling ring 21~24, in turn result in the pollution of wafer either other process chambers.

Referring to figure 5., another enlarged cross-sectional view of the single-wafer wet treatment apparatus 1 of Fig. 1 is shown.Fig. 5 is with position Explanation is used as in the recycling ring 21 and gas concentration unit connected to it 30 of first layer.It should be understood that remaining recycling ring 22~24 and remaining gas recyclable device 30 structure and first layer recycling ring 21 and gas concentration unit 30 structure substantially It is identical.30 pairs of recycling rings 21 of gas concentration unit apply negative pressure, so that the inside of recycling ring 21 and gas concentration unit 30 can produce Air-flow of the life such as path 61.Specifically, the gas-liquid mixture that recycling ring 21 is collected into can pass through separation from inner annular space 208 The through-hole 2051 of plate 205 is evacuated to outer annular space 209.Also, the gas-liquid mixture in outer annular space 209 can pass through external annulus 203 On gas passage mouth 206 be sent to inside gas concentration unit 30.

As shown in figure 5, gas concentration unit 30 includes bellows 31 and exhaust pipe 32.Bellows 31 include upper surface 301, following table Face 302, side surface 303, cavity 304, the first connector 305, the second connector 306 and leakage fluid dram 307.The upper table of bellows 31 Face 301 is oppositely arranged with lower surface 302, and side surface 303 is between upper surface 301 and lower surface 302.Upper surface 301, Lower surface 302 and side surface 303 interconnect and form cavity 304.The side surface 303 of bellows 31 is formed with the first connector 305, upper surface 301 is formed with the second connector 306 and lower surface 302 is formed with leakage fluid dram 307.The first of bellows 31 connects Interface 305 is connect with the gas passage mouth 206 of recycling ring 21, so that the gas-liquid mixture in recycling ring 21 passes through the first connector 305 enter inside the cavity 304 of bellows 31.Exhaust pipe 32 is connect with the second connector 306 of bellows 31, for what will be collected Gas-liquid mixture discharge.Furthermore when gas-liquid mixture passes through bellows 31, the gas of part can condense into liquid.In order to avoid In the cavity 304 of bellows 31, the setting by position in the leakage fluid dram 307 of the lower surface of bellows 31 302 can will coagulate liquid buildup Knot liquid is discharged along path 62 by leakage fluid dram 307, to keep clean inside bellows 31.

In addition, as shown in figure 3, single-wafer wet treatment apparatus 1 also includes multiple water lines 70, and each gas concentration unit 30 bellows 31 are connect with a water lines 70.Also, the bellows 31 of each gas concentration unit 30 also include observing window 80.Cause This can be cleaned described when personnel are seen inside bellows 31 by observing window 80 has crystallization or foreign matter to accumulate by water lines 70 The inside of bellows.Specifically, a small amount of clean waters is transmitted to inside bellows 31 by water lines 70, so that crystallization or foreign matter It is discharged along path 62 (as shown in Figure 5) from the leakage fluid dram 307 of bellows 31.

In conclusion this announcement is by being arranged gas concentration unit identical with the recycling quantity of ring, and each recycling Ring is correspondingly connected with a gas concentration unit.It designs, can be returned by different gas concentration units to from difference whereby The process gas for receiving ring independently carries out pumping operation, is mingled in one to avoid the different gas-liquid mixtures of different process liquid entrainment It rises, and then generates additional chemical reaction, cause single-wafer wet treatment apparatus or the injury of personnel, and also reduce and handle back The complexity of getter body.Furthermore can also avoid the exhaust gas recirculation mixed to turntable or recycling ring, in turn result in wafer or It is the pollution of other process chambers.

The above is only the preferred embodiments of this announcement, it is noted that for those skilled in the art, originally takes off not departing from Under the premise of showing principle, several improvements and modifications can also be made, these improvements and modifications also should be regarded as the protection model of this announcement It encloses.

Claims (12)

1. a kind of single-wafer wet treatment apparatus, characterized by comprising:

Turntable, for placing wafer；

Liquid supplying apparatus is arranged above the turntable, for applying kinds of processes liquid to the wafer；

Liquid withdrawal system is arranged circumferentially at around the turntable, and can be along vertical direction relative to the rotation Platform is mobile, wherein the liquid withdrawal system includes multiple recycling rings for stacking setting along the vertical direction, and each institute State the gas-liquid mixture that recycling ring is used to collect corresponding one of process liquid and its entrainment；And

Multiple gas concentration units are correspondingly connected with, wherein each respectively with the multiple recycling ring of the liquid withdrawal system The gas concentration unit includes:

Bellows include the first connector and the second connector, wherein first connector is connected with corresponding recycling ring, so that The gas-liquid mixture in the recycling ring enters the inside of the bellows by first connector；And

Exhaust pipe is connect with second connector of the bellows, the gas-liquid mixture discharge for that will collect.

2. single-wafer wet treatment apparatus as described in claim 1, which is characterized in that each gas concentration unit it is described Bellows also include: upper surface, lower surface, side surface, cavity, and the upper surface is oppositely arranged with the lower surface, and the side Surface position is between the upper surface and the lower surface and the cavity is by the upper surface, the lower surface and institute It states side surface to interconnect and form, wherein first connector is arranged in the side surface and second connector It is arranged in the upper surface.

3. single-wafer wet treatment apparatus as claimed in claim 2, which is characterized in that each gas concentration unit it is described Bellows also include: leakage fluid dram, are arranged in the lower surface, so that the condensation that the gas-liquid mixture is generated by the bellows Liquid is discharged by the leakage fluid dram.

4. single-wafer wet treatment apparatus as described in claim 1, which is characterized in that the liquid withdrawal system it is each described Recycling ring includes:

Liquid acquisition mouth is aligned with the turntable；

The inside of the recycling ring is arranged in be separated out inner annular space and outer annular space, wherein the inner annular space in demarcation plate For accepting the gas-liquid mixture from the Liquid acquisition mouth process liquid entered and its entrainment, and described point Process liquid described in spacers block flow in the outer annular space and the demarcation plate from the inner annular space be formed with it is multiple Through-hole, for allowing the gas-liquid mixture in the inner annular space to enter the outer annular space by the multiple through-hole；With And

Liquid collection port is connected to the inner annular space, for allowing the process liquid to be discharged from the liquid collection port；And

Multiple gas concentration units are correspondingly connected with the multiple recycling ring of the liquid withdrawal system respectively, for that will receive The gas-liquid mixture discharge of collection.

5. single-wafer wet treatment apparatus as claimed in claim 4, which is characterized in that each recycling ring also includes:

Annular upper cover；

Annular bottom plate is correspondingly arranged with the annular upper cover；

External annulus is connect with the outer peripheral edge of the outer peripheral edge of the annular upper cover and the annular bottom plate；

Gas passage mouth is arranged on the external annulus, and with it is one of corresponding described in gas concentration unit connection, wherein It is described that demarcation plate setting is between the annular upper cover and the annular bottom plate and Liquid acquisition mouth position is in the annular Between the inner peripheral of upper cover and the inner peripheral of the annular bottom plate.

6. single-wafer wet treatment apparatus as described in claim 1, which is characterized in that each gas concentration unit it is described Bellows also include observing window, and the inside of the bellows can be seen by the observing window；And

Wherein the single-wafer wet treatment apparatus also includes multiple water lines, and the bellows of each gas concentration unit It is connect with the water lines, and clean water is transmitted to the bellows to clean the bellows by the water lines It is internal.

7. a kind of single-wafer wet treatment apparatus, characterized by comprising:

Turntable, for placing wafer；

Liquid supplying apparatus is arranged above the turntable, for applying kinds of processes liquid to the wafer；

Liquid withdrawal system is arranged circumferentially at around the turntable, and can be along vertical direction relative to the rotation Platform is mobile, wherein the liquid withdrawal system includes multiple recycling rings for stacking setting along the vertical direction, wherein each The recycling ring includes:

Liquid acquisition mouth is aligned with the turntable, for receiving the gas-liquid of corresponding one of process liquid and its entrainment Mixture；

The inside of the recycling ring is arranged in be separated out inner annular space and outer annular space, wherein the inner annular space in demarcation plate For accepting the gas-liquid mixture from the Liquid acquisition mouth process liquid entered and its entrainment, and described point Process liquid described in spacers block flow in the outer annular space and the demarcation plate from the inner annular space be formed with it is multiple Through-hole, for allowing the gas-liquid mixture in the inner annular space to enter the outer annular space by the multiple through-hole；With And

Liquid collection port is connected to the inner annular space, for allowing the process liquid to be discharged from the liquid collection port；And

Multiple gas concentration units are correspondingly connected with the multiple recycling ring of the liquid withdrawal system respectively, for that will receive The gas-liquid mixture discharge of collection.

8. single-wafer wet treatment apparatus as claimed in claim 7, which is characterized in that each recycling ring also includes:

Annular upper cover；

Annular bottom plate is correspondingly arranged with the annular upper cover；

External annulus is connect with the outer peripheral edge of the outer peripheral edge of the annular upper cover and the annular bottom plate；

Gas passage mouth is arranged on the external annulus, and with it is one of corresponding described in gas concentration unit connection, wherein It is described that demarcation plate setting is between the annular upper cover and the annular bottom plate and Liquid acquisition mouth position is in the annular Between the inner peripheral of upper cover and the inner peripheral of the annular bottom plate.

9. single-wafer wet treatment apparatus as claimed in claim 7, which is characterized in that each gas concentration unit includes:

Bellows include the first connector and the second connector, wherein first connector is connected with corresponding recycling ring, so that The gas-liquid mixture in the recycling ring enters the inside of the bellows by first connector；And

Exhaust pipe is connect with second connector of the bellows, the gas-liquid mixture discharge for that will collect.

10. single-wafer wet treatment apparatus as claimed in claim 9, which is characterized in that the institute of each gas concentration unit Stating bellows also includes: upper surface, lower surface, side surface, cavity, the upper surface are oppositely arranged with the lower surface, and described Side surface position between the upper surface and the lower surface and the cavity be by the upper surface, the lower surface and The side surface interconnects and forms, wherein first connector setting is in the side surface and second connection Mouth is arranged in the upper surface.

11. single-wafer wet treatment apparatus as claimed in claim 10, which is characterized in that the institute of each gas concentration unit Stating bellows also includes: leakage fluid dram, and setting is in the lower surface, so that the gas-liquid mixture is coagulated by what the bellows generated Knot liquid is discharged by the leakage fluid dram.

12. single-wafer wet treatment apparatus as claimed in claim 9, which is characterized in that the institute of each gas concentration unit Stating bellows also includes observing window, and the inside of the bellows can be seen by the observing window；And

Wherein the single-wafer wet treatment apparatus also includes multiple water lines, and the bellows of each gas concentration unit It is connect with the water lines, and clean water is transmitted to the bellows to clean the bellows by the water lines It is internal.