TW201040203A - Olefin resin, epoxy resin, curable resin composition, and material resulting from curing same - Google Patents

Olefin resin, epoxy resin, curable resin composition, and material resulting from curing same Download PDF

Info

Publication number
TW201040203A
TW201040203A TW099112114A TW99112114A TW201040203A TW 201040203 A TW201040203 A TW 201040203A TW 099112114 A TW099112114 A TW 099112114A TW 99112114 A TW99112114 A TW 99112114A TW 201040203 A TW201040203 A TW 201040203A
Authority
TW
Taiwan
Prior art keywords
acid
epoxy resin
resin composition
reaction
curable resin
Prior art date
Application number
TW099112114A
Other languages
Chinese (zh)
Other versions
TWI455949B (en
Inventor
Masataka Nakanishi
Kenichi Kuboki
Naofusa Miyagawa
Yoshihiro Kawada
Chie Sasaki
Shizuka Aoki
Zuikan Suzuki
Masato Yarita
Hiroo Koyanagi
Original Assignee
Nippon Kayaku Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kayaku Kk filed Critical Nippon Kayaku Kk
Publication of TW201040203A publication Critical patent/TW201040203A/en
Application granted granted Critical
Publication of TWI455949B publication Critical patent/TWI455949B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/32Epoxy compounds containing three or more epoxy groups
    • C08G59/34Epoxy compounds containing three or more epoxy groups obtained by epoxidation of an unsaturated polymer
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/74Esters of carboxylic acids having an esterified carboxyl group bound to a carbon atom of a ring other than a six-membered aromatic ring
    • C07C69/75Esters of carboxylic acids having an esterified carboxyl group bound to a carbon atom of a ring other than a six-membered aromatic ring of acids with a six-membered ring
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D301/00Preparation of oxiranes
    • C07D301/02Synthesis of the oxirane ring
    • C07D301/03Synthesis of the oxirane ring by oxidation of unsaturated compounds, or of mixtures of unsaturated and saturated compounds
    • C07D301/12Synthesis of the oxirane ring by oxidation of unsaturated compounds, or of mixtures of unsaturated and saturated compounds with hydrogen peroxide or inorganic peroxides or peracids
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D303/00Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
    • C07D303/02Compounds containing oxirane rings
    • C07D303/38Compounds containing oxirane rings with hydrocarbon radicals, substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
    • C07D303/40Compounds containing oxirane rings with hydrocarbon radicals, substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals by ester radicals
    • C07D303/44Esterified with oxirane-containing hydroxy compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/32Epoxy compounds containing three or more epoxy groups
    • C08G59/3218Carbocyclic compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/42Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
    • C08G59/4215Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof cycloaliphatic
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00Systems containing only non-condensed rings
    • C07C2601/12Systems containing only non-condensed rings with a six-membered ring
    • C07C2601/16Systems containing only non-condensed rings with a six-membered ring the ring being unsaturated

Abstract

Provided is a new alicyclic epoxy resin that is highly curable and, when cured, is highly transparent and has excellent heat- and light-resistance. Said alicyclic epoxy resin is obtained by epoxidizing the starting material thereof, which is an olefin resin represented by formula (1). (In the formula, the multiple instances of R and P each independently represent either hydrogen atoms or C1-15 alkyl groups.)

Description

201040203 六、發明說明: 【發明所屬之技術領域】 本發明係關於一種新穎之環氧樹脂及成為其原料之婦 烴樹脂、以及使用該環氧樹脂之適合於電氣電子材料用途 之硬化性樹脂組成物。 【先前技術】 Ο ο 環氧樹脂係藉由以各種硬化劑進行硬化,而成為通常 機械f生質、财水性、耐化學品性、对熱性、電氣性質等優 異之硬化物,從而用於接著劑、塗料、積層板、成形材料、 注模材料、光阻劑等廣泛之領域。近年來,尤其於半導體 相關材料之領域中大量存在著如附照相功能行動電話、超 薄型液晶及電漿電視、輕型筆記型個人電腦等輕、薄、短 關鍵之類的電子機器,由此對以環氧樹脂為代表之 變要求非常高之特性。尤其是前端封裝,其結構 ㈣ncedBGA(EnhancedBal =者。例如 格陣列)之魅AlTay,增強型球狀柵 )之類的成為方凹區朝下(cavhy d〇 需進行八金± !之結構者必 m 封’無法對應於轉注成型。因此,譁·”功 旎之液狀環氧樹脂之開發。 為求同功 #為複合材料、車之車體及 年來就其製造法之簡便性而a _田 之、、,口構材料,近201040203 VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to a novel epoxy resin and a maternity hydrocarbon resin which is a raw material thereof, and a curable resin composition suitable for electrical and electronic materials using the epoxy resin. Things. [Prior Art] 环氧树脂 ο Epoxy resin is cured by various hardeners, and is used as a cured product which is excellent in mechanical properties, water, chemical resistance, heat resistance, electrical properties, etc. A wide range of applications such as agents, coatings, laminates, forming materials, injection molding materials, and photoresists. In recent years, in particular, in the field of semiconductor-related materials, there are a large number of electronic devices such as camera functions, mobile phones, ultra-thin liquid crystal and plasma TVs, and light-duty personal computers, such as light, thin, and short keys. The characteristics that are represented by epoxy resin are very high. Especially the front-end package, its structure (4) ncedBGA (EnhancedBal = such as grid array) charm AlTay, enhanced spherical grid) and so on become a concave area facing down (cavhy d〇 need to carry out eight gold ±! m seal 'cannot correspond to transfer molding. Therefore, the development of liquid epoxy resin of 哗·" gong 。. For the same work # for composite materials, car body and the simplicity of its manufacturing method for years _ Tian Zhi,,, mouth material, near

Mo^ng, ^ S^M(Resin Transfer g樹月曰轉注成型)。此種组成物中^ 中之含浸容易好而▲, ㈣中m纖維等 勿裎度而έ,期望為低黏 又,於光雷;ΒΗ *厌之環氧樹脂。 相關領域,尤其伴隨近 <干水之鬲度資訊 201040203 化’為順利地傳送及處理龐大之資訊,而開發出產生光信 號之技術來代替先前之利用電氣配線之信號傳送。其中, 於光波導、藍光LED及光半導體等光學零件領域,期望開 發出透明性優異之樹脂材料^針對該等要求,脂環式環氧 樹脂受到關注。 脂環式環氧樹脂與縮水甘油醚型環氧樹脂相比較,在 電氣絕緣性及透明性方面優異,故多方面用於透明密封材 料等。然而,該脂環式環氧樹脂雖具有上述優異之處,但 另一方面存在著硬化物較硬、韌性較差之問題,為改良該 缺點而進行研究(專利文獻1、2 )。 又 兀八於液狀樹脂組成物中將酸酐用作硬化劑之情 形時,基於在室溫下為液狀、及容易操作等理由,而使用 選自甲基八氫鄰笨二甲酸酐、曱基四氫鄰苯二甲酸酐、六 虱鄰苯二甲酸酐以及四氫鄰苯二甲酸酐等中之羧酸酐或該 等之混合物。《而,該等賴酐由於低分子量之化合物較 多因此尤其於在開放系統中進行熱硬化時使用作為環氧 樹脂之硬化劑之情形時,該等叛㈣容易揮發之情況成為 問題。若於環氧樹脂之熱硬化時叛酸針揮發至大氣中,則 不僅引起由有宝物暂、 央。物質向大氣中之釋放而造成之環境 及對人體之不良影趨 ^ , 木 響,引起生產線之污染、及由於硬 化物中不存在子f令θ t ^ 疋置之羧酸酐(硬化劑)而造成的環氧樹 月曰組成物之硬化尤白從,* 十 '專(專利文獻3、專利文獻4 )。為斟 應上述問題,而謀七 ' 物〇 ㈣硬化所需之時隨短之環氧樹脂組成 201040203 又’本發明之環氧樹脂之結構公開於專利文獻5中。 具體而言,係藉由3,4_環氧環己曱酸乙酯與二(三羥曱基丙 烷)之酯交換反應而製造。 然而,由本製法所獲得之環氧樹脂的4官能環氧樹脂 之純度較低,例如該專利文獻5之段落〇〇32中記载之例8 中,4官能之四環氧體之純度為42·5%,剩餘為三環氧體、 或一%氧體、單環氧體,為殘存醇結構之純度較差者。 又,本反應由於為高溫下之反應,故亦產生環氧基彼 此之聚合反應,因此亦有成為黏度較高之樹脂,在作業性 方面產生問題之情況。 又,上述醇結構之殘存只要例如為利用酸酐之硬化, 則產生導致於一液化時在室溫程度下引起與酸酐之反應, 從而儲存敎性變得非常差之問題。又,交聯密度亦變低, 對硬化物性造成影響,因此欠佳。 [先前技術文獻] [專利文獻] 〇 [專利文獻1]曰本專利特開2006_52187號公報 [專利文獻2]曰本專利特開2〇〇7_5 1〇772號公報 [專利文獻3]曰本專利特開2〇〇3 277473號公報 [專利文獻4]日本專利特開2〇〇8-53529號公報 [專利文獻5]日本專利特開平5_17〇753號公報 【發明内容】 [發明所欲解決之問題] 本發明之目的在於提供—種新賴之環氧樹脂,其提供 201040203 不僅硬化性優異、並且耐熱性及耐光性亦優異之逸明性較 南之硬化物。 [解決問題之手段] 本發明者等人鑒於上述實際情況而進行潛心研究,結 果完成本發明。 即’本發明係關於: (1) 一種烯烴樹脂,其特徵在於:係由下述式(!) 所表示:Mo^ng, ^ S^M (Resin Transfer g tree moon 曰 transfer molding). The impregnation of ^ in such a composition is easy and ▲, (4) m fiber, etc., do not smash and smash, and it is expected to be low-viscosity, and it is light-thunder; In related fields, especially with the recent information on the rapid transmission and processing of huge information, the technology for generating optical signals has been developed to replace the previous signal transmission using electrical wiring. Among them, in the field of optical components such as optical waveguides, blue LEDs, and optical semiconductors, it is desired to develop a resin material having excellent transparency. In view of these requirements, alicyclic epoxy resins have attracted attention. The alicyclic epoxy resin is superior to the glycidyl ether type epoxy resin in terms of electrical insulation and transparency, and is therefore used in various places for transparent sealing materials. However, the alicyclic epoxy resin has the above-mentioned advantages, but on the other hand, there is a problem that the cured product is hard and the toughness is poor, and research has been made to improve the disadvantage (Patent Documents 1 and 2). In the case where an acid anhydride is used as a curing agent in a liquid resin composition, it is selected from methyl octahydrophthalic acid anhydride and hydrazine based on the fact that it is liquid at room temperature and is easy to handle. a carboxylic acid anhydride in tetrahydrophthalic anhydride, hexamethylene phthalic anhydride, tetrahydrophthalic anhydride or the like or a mixture thereof. Further, in the case where the lysine is used as a curing agent for an epoxy resin in a case where the amount of the compound having a low molecular weight is large, especially when it is thermally hardened in an open system, such rebellious (four) volatilization becomes a problem. If the ticked acid needle is volatilized into the atmosphere during the thermal hardening of the epoxy resin, it will not only cause temporary damage to the object. The environment caused by the release of substances into the atmosphere and the adverse effects on the human body, the sound of wood, causing pollution of the production line, and the absence of the carboxylic anhydride (hardener) of the θ t ^ 疋 in the hardened material The hardening of the composition of the epoxy resin cercaria is particularly effective, and it is a special product (patent document 3, patent document 4). In order to solve the above problems, the epoxy resin composition required for the hardening of the material (4) is required. The structure of the epoxy resin of the present invention is disclosed in Patent Document 5. Specifically, it is produced by a transesterification reaction of ethyl 3,4-epoxycyclohexanoate with bis(trihydroxydecylpropane). However, the tetrafunctional epoxy resin of the epoxy resin obtained by the present process has a low purity. For example, in the example 8 described in paragraph 32 of Patent Document 5, the purity of the tetrafunctional tetraether is 42. 5%, the remainder being a triepoxide, or a % oxygen, monoepoxide, which is a poor purity of the residual alcohol structure. Further, since this reaction is a reaction at a high temperature, a polymerization reaction of each of the epoxy groups is also caused. Therefore, a resin having a high viscosity is also caused, which may cause problems in workability. Further, the residual of the above-described alcohol structure is caused by, for example, curing with an acid anhydride, which causes a reaction with an acid anhydride at room temperature in the case of liquefaction, and the storage property is extremely poor. Further, the crosslink density is also low, which affects the hardened physical properties and is therefore unsatisfactory. [PRIOR ART DOCUMENT] [Patent Document 1] Japanese Patent Laid-Open Publication No. 2006-52187 [Patent Document 2] Japanese Patent Laid-Open Publication No. Hei. No. Hei. Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. [Problem] An object of the present invention is to provide a new epoxy resin which provides 201044203 which is not only excellent in hardenability but also excellent in heat resistance and light resistance. [Means for Solving the Problem] The present inventors conducted intensive studies in view of the above-described actual circumstances, and as a result, completed the present invention. That is, the present invention relates to: (1) An olefin resin characterized by the following formula (!):

(1) (式中’存在複數個之R、p分㈣立地存在,表示氣 原子、或碳數1〜15之貌基); (2) —種環氧樹脂,其特徵在於··係藉由將如前項⑴ 之稀fe樹脂氧化而獲得; (3 )如刖項(2 )之環氧樹脂,係使用過氧化氫或過 酸而環氧化; (4 )種硬化性樹脂組成物,其特徵在於:其含有如 前項⑺或⑺之環氧樹腊、硬化劑及/或硬化觸媒·以° 及 201040203 C5) —種硬化物,发輯激户# 八符徵在於:係將如前項(4 )之 硬化性樹脂組成物硬化而成。 [發明之效果] 本發明之稀烴樹脂成為提供耐熱性及耐光性優異之硬 化物^環氧樹脂(本發明之環氧樹脂)的原料。含有本發 明之環氧樹脂的本發明之硬化 &性樹月曰組成物之硬化性優 異,對環境之影響亦較少。含右太 3有本發明之環氧樹脂的本發 ❹ 明之硬化性脂組成物可用於電氣 + 电乳黾千材枓、成型材料、注 模材料、積層材料、塗料、垃^ i & 复科接著劑、光阻劑等廣泛之用途。 又’本發明之環氧樹脂由於不呈右_意戸κ * 个丹有矛香環故透明性優異, 因此極其有用於光學材料。 、 【實施方式】 本發明之烯烴樹脂係由下述式(丨)所表示:(1) (wherein there are a plurality of R, p points (four) standing in the ground, indicating a gas atom, or a carbon number of 1 to 15); (2) an epoxy resin, characterized by · Obtained by oxidizing a rare Fe resin as in the above item (1); (3) an epoxy resin according to the item (2), which is epoxidized using hydrogen peroxide or a peracid; (4) a curable resin composition, It is characterized in that it contains the epoxy wax, hardener and/or hardening catalyst of the above item (7) or (7), and the hardened material of the product, and the acquaintance of the acquaintance # 八符征: the system will be as before (4) The curable resin composition is hardened. [Effects of the Invention] The dilute hydrocarbon resin of the present invention is a raw material for providing a hard resin (epoxy resin of the present invention) excellent in heat resistance and light resistance. The hardening & sap structure of the present invention containing the epoxy resin of the present invention is excellent in hardenability and has less influence on the environment. The curable fat composition of the present invention containing the right epoxy resin of the present invention can be used for electrical + electric nipples, molding materials, injection molding materials, laminated materials, coating materials, coatings, and coatings. A wide range of applications such as adhesives and photoresists. Further, the epoxy resin of the present invention is excellent in transparency because it does not have a right _ _ _ _ * dan has a spear ring, and therefore is extremely useful for optical materials. [Embodiment] The olefin resin of the present invention is represented by the following formula (丨):

(式中’存在複數個之尺 原子、或碳數1〜15之烷基) 、P分別獨立 地存在,表示氫 由環己烯f酸衍 作為環己稀甲酸 由上述式(1 )所表示之烯烴樹脂係藉 生物與二(三羥甲基烷烴)類之反應而獲得。 201040203 衍生物係由下述式(2 )所表示之化合物(wherein 'there are a plurality of atomic atoms or an alkyl group having 1 to 15 carbon atoms'), and P is independently present, and hydrogen is represented by cyclohexene f acid as cyclohexanecarboxylic acid represented by the above formula (1) The olefin resin is obtained by the reaction of a living organism with a bis(trimethylol alkane). 201040203 The derivative is a compound represented by the following formula (2)

υ⑵ Ρ (式中’Ρ表示氫原子、或碳數1〜15之烷基。又,X 表示羥基、碳數1〜10之烷氧基、鹵素原子), 具體可列舉:環己烯甲酸、環己烯曱酸曱酯、環己烯 甲酸乙S曰、環己烯甲酸丙酯、環己烯曱酸丁酯、環己烯甲 酸己酯、環己烯甲酸(環己烯基曱基)酯、環己烯曱酸辛酯、 環己烯甲醯氣、環己烯甲醯溴、甲基環己烯曱酸、甲基環 己烯甲酸甲酯、曱基環己烯甲酸乙酯、曱基環己烯曱酸丙 酯、甲基環己烯甲酸(甲基環己烯基甲基)酯、曱基環己烯甲 醯氣等’但並不限定於該等。該等可單獨使用,亦可併用2 種以上。 又,本發明中之二(三經甲基烧烴)類係由下述式所表示 之化合物: Η(\ /ΟΗυ(2) Ρ (wherein Ρ represents a hydrogen atom or an alkyl group having 1 to 15 carbon atoms. Further, X represents a hydroxyl group, an alkoxy group having 1 to 10 carbon atoms, or a halogen atom), and specific examples thereof include cyclohexenecarboxylic acid. Cyclohexene decanoate, cyclohexene carboxylic acid ethyl ethoxide, propyl cyclohexene carboxylate, butyl cyclohexene decanoate, cyclohexene hexyl methacrylate, cyclohexene carboxylic acid (cyclohexenyl fluorenyl) Ester, octyl cyclohexene decanoate, cyclohexene methyl hydrazine, cyclohexene methyl hydrazine, methyl cyclohexene decanoic acid, methyl methyl cyclohexenecarboxylate, ethyl decyl cyclohexenecarboxylate, hydrazine Butyl hexyl hexene hexanoate, methylcyclohexenecarboxylic acid (methylcyclohexenylmethyl) ester, decyl cyclohexene methyl hydrazine, etc. 'but is not limited thereto. These may be used alone or in combination of two or more. Further, the second (trimethylsulfonated hydrocarbon) of the present invention is a compound represented by the following formula: Η (\ /ΟΗ

R R (式中,R表不氫原子、或碳數1〜15之烷基)。具體 201040203 而言,例如可列舉:二(三經甲基丙烧)、二U經甲基丁烧)、 一(二羥甲基戊烷)、二(三羥甲基己烷)、二(三羥甲基庚烷卜 二(三羥曱基辛烷)等。作為此種化合物之製造方法,可藉由 ,曱搭(或者三聚甲搭、變甲搭等)與末端具有甲酿基之 石厌數1〜15之化合物進行反應而獲得。(例&,作為參考 專利文獻可列舉:日本專利特開2GG5_G23G67號公報、日本 專利特開2GG3-3 35717號公報、日本專利特開平Q9_268l5〇 號公報、日本專利特開2〇〇2_〇47224號公報等)。 作為環己烯甲酸衍生物與二(三羥甲基烷烴)類之反 應,可應用通常之醋化方法。具體而言可應用通常之醋化 反應可列舉.使用酸觸媒之Fischer⑶以出⑽丨⑽(費雪 酯化),鹼性條件下之醢函、酵之反應,利用各種縮合劑 之縮合反應等(ADVANCED ORGANIC CHEMISTRY PartB:R R (wherein R represents a hydrogen atom or an alkyl group having 1 to 15 carbon atoms). Specific examples of 201040203 include, for example, di(tri-methylpropane), di-U-methylbutyring, mono-(dimethylolpentane), di-(trimethylolhexane), and Trishydroxymethylheptane bis(trihydroxydecyloctane), etc. As a method for producing such a compound, it can be obtained by hydrating (or trimeric, metamorphic, etc.) The compound of the stone reptiles 1 to 15 is obtained by a reaction. (Examples &, as a reference patent document, Japanese Patent Laid-Open No. 2GG5_G23G67, Japanese Patent Laid-Open No. 2GG3-335717, Japanese Patent Laid-Open No. Q9_268l5 〇 公报 、 日本 日本 日本 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 。 The usual vinegarization reaction can be exemplified by using an acid catalyst Fischer (3) to give (10) 丨 (10) (Fisher esterification), a reaction under alkaline conditions, a fermentation reaction, a condensation reaction using various condensing agents, etc. ADVANCED ORGANIC CHEMISTRY PartB:

Reaction and Synthesis,P135、145〜147、151 等)。又, 作為具體之事例,亦可藉由利用醇與羧酸類之酯化反應 (Tetrahedron vol. 36 p. 2409 (1980) ^ Tetrahedron Letter p. 4475 (1980)),進而利用羧酸酯之酯交換反應(日本專利 特開2006-052187號公報)而製造。 作為以上述方式合成之上述式(丨)之烯烴樹脂之較佳 、’、。構’上述式(1 )中P為氫原子、碳數1〜丨5之烷基,較 佳為氫原子、曱基、乙基、丁基中之任一者。尤其於取代 基p鍵結於烯烴之情形時,為提高其反應性,鍵結於烯烴 之P較佳為氫原子、曱基中之任一者,更佳為氫原子。取 代基R為碳數1〜丨5之烷基,較佳為2〜1〇。 201040203 具體而言作為較佳之取代基R,可列舉:甲基、乙基、 丙基、丁基、戊基、己基,尤佳為乙基、丙基、丁基,更 佳為乙基。 又,以上述方式獲得之烯烴樹脂為至少其主成分具有4 官能之稀烴之四環己稀體’其純度較佳為8G面積%(/凝膠 渗透層析法(gel-permeation chr〇mat〇graphy),以下稱為 啦)以上’更佳為9()面積%以上,尤佳為%面積%以上。 於其純度未達80面積%之情形時,除產生於後續之環 氧化步驟中容易經水解等問題以外,當將所得之環氧樹脂 作為環氧樹脂組成物時,尤其若與酸肝等硬化劑一液化, 2由於常溫程度下酸肝與環氧樹脂中殘留之經基反應之影 響,而產生儲存穩定性變差之問題,因此欠佳。 ,者’本發明之烯烴樹脂之Gpc之測^條件如下所 官柱為 Sh〇dex SYSTEM_21 管柱(kf_8〇3l、kf 8〇2 5 ml/ •根\ KF·802 ),連結洗提液為四1 ind S柱'皿度為4〇 C,又,檢測係以RI ( refractive 乙:X。,折射率)進行,校準曲㈣❹製標準聚苯 成太路ί式⑴所不之本發明之烯烴樹脂可藉由氧化而製 成本發明之環氧樹脂。作 ^ ^ 酸等過酸進行氧化之方法'、以^方法,可列舉:以過乙 法、以空氣(氧)進行氧介過乳化氫水進行氧化之方 作Α 之方法等,但並不限定於該等。 作為利用過酸之環氧 特開20〇6_52187號 …具體可列舉曰本專利 ^報中記載之方法等。作為可使用之過 201040203 酸,例如可列羸.田雜 .甲酉文、乙酸、丙酸、順丁烯二酸、苯甲 酸、間氯苯甲酸、鄭苴_ ^ 、 那本一甲酸等有機酸及該等之酸酐。該 A 、就與過氧化氫進行反應而生成有機過酸之效率、Reaction and Synthesis, P135, 145~147, 151, etc.). Further, as a specific example, esterification of a carboxylic acid ester can be further carried out by utilizing an esterification reaction of an alcohol with a carboxylic acid (Tetrahedron vol. 36 p. 2409 (1980) ^ Tetrahedron Letter p. 4475 (1980)) The reaction was produced by the reaction (Japanese Patent Laid-Open Publication No. 2006-052187). The olefin resin of the above formula (丨) synthesized in the above manner is preferred. In the above formula (1), P is a hydrogen atom and an alkyl group having 1 to 5 carbon atoms, and more preferably a hydrogen atom, a decyl group, an ethyl group or a butyl group. Particularly, in the case where the substituent p is bonded to the olefin, in order to increase the reactivity, P bonded to the olefin is preferably any of a hydrogen atom and a fluorenyl group, and more preferably a hydrogen atom. The substituent R is an alkyl group having 1 to 5 carbon atoms, preferably 2 to 1 Å. Particularly preferred as the substituent R, a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group or a hexyl group is preferred, and an ethyl group, a propyl group and a butyl group are preferred, and an ethyl group is more preferred. Further, the olefin resin obtained in the above manner is a tetracyclohexanthene having at least a tetrafunctional dilute hydrocarbon having a main component thereof, and its purity is preferably 8 G area% (gel-permeation chr〇mat) 〇graphy), hereinafter referred to as the above) is more preferably 9% or more, more preferably %% or more. When the purity is less than 80% by area, in addition to the problem that it is easily hydrolyzed in the subsequent epoxidation step, when the obtained epoxy resin is used as the epoxy resin composition, especially if it is hardened with acid liver or the like The agent is liquefied, and 2 is poor in storage stability due to the influence of the reaction of the base in the acid liver and the epoxy resin at a normal temperature. The measurement conditions of the Gpc of the olefin resin of the present invention are as follows: the official column is a Sh〇dex SYSTEM_21 column (kf_8〇3l, kf 8〇2 5 ml/•root\KF·802), and the linked eluent is The four 1 ind S column has a dish size of 4 〇C, and the detection system is performed with RI (refractive B: X., refractive index), and the calibration curve (4) is made of standard polystyrene. The formula (1) does not have the invention. The olefin resin can be made into the epoxy resin of the present invention by oxidation. For example, a method of oxidizing a peracid such as an acid is used, and a method of oxidizing by emulsification of hydrogen water by air (oxygen) by air (oxygen) may be mentioned, but Limited to these. As a method of using the peracid, the epoxy resin is disclosed in JP-A No. 20〇6_52187, and the method described in the patent application is specifically mentioned. As the acid that can be used in 201040203, for example, it can be listed as 羸 羸. Tian Mis., 酉 酉, acetic acid, propionic acid, maleic acid, benzoic acid, m-chlorobenzoic acid, Zheng 苴 _ ^, Na- carboxylic acid, etc. Acid and the anhydrides. The A, the reaction with hydrogen peroxide to produce an organic peracid,

反應溫度、择竹夕雜lL 之簡便性、經濟性等觀點而言,較佳為使 用甲酸、乙酸、激 — 鄰本一甲酸酐,尤其就反應操作之簡便性 觀點而言,争社达任m 1 吏佳為使用甲酸或乙酸。From the viewpoints of the reaction temperature, the simplicity of the selection of bamboo and the lL, and the economical efficiency, it is preferred to use formic acid, acetic acid, and stilbene-based anhydride, especially in terms of the simplicity of the reaction operation. It is preferred to use formic acid or acetic acid.

,、於利用過氧化氫水進行環氧化之方法巾,可應用各種 ”體而σ,可應用如日本專利特開昭59-108793號公 本專利特開昭62-234550號公報、日本專利特開平 9號Α報、曰本專利特開平1 1-349579號公報、曰 本專利特公平“33471號公報、日本專利特開2GG1-17864 號公報、日本專利特好3_571G2號公報等中所列舉之方 以下,例示為獲得本發明之環氧樹脂而尤佳之方法。 、先使本發明之稀烴樹脂、聚酸類及四級錄鹽在有 機物與過氧化氫水之乳液狀態下進行反應。 本發明中所使用之聚酸類只要為具有聚酸結構之化合 物則並無特別限制,較佳為含有鎢或鉬之聚酸類,更佳 為含有鎢之聚酸類,尤佳為鎢酸鹽類。 *作為具體之聚酸及聚酸鹽,可列舉:選自鎢酸、12_鎢 碟酸、12-鎢蝴酸、18_鶴鱗酸及12.鶴石夕酸等中之鶴系酸, 選自鋼酸及磷鉬酸等中之鉬系酸,以及該等之鹽等。 作為該等之鹽之抗衡陽離子,可列舉:四級銨離子、 驗土金屬離子、鹼金屬離子等。 201040203 具體可列舉:四甲基錄離子、节基三乙基錄離子、十 三烧基曱基銨離子、二(十二炫基)二甲基銨離子、三辛基甲 基敍離子、三烧基甲基(辛基與癸基之混合型)錢離子、 三(十六烷基)甲基銨離子、三甲基十八烷基銨離子、四戊基 錄離子、十六烧基三甲基錄離子m錢離子、三 辛基甲基敍離子、二(十六烧基)二甲基錄離子等四級錢離 子,鈣離子、鎂離子等鹼土金屬離子,鈉、鉀、鉋等鹼金 属離子等,但並不限定於該等。其中,作為尤佳之抗衡陽 離子,可列舉:鈉離子、鉀離子、鈣離子、銨離子。 f 作為聚酸類之使用量,相對於本發明之烯烴丨莫耳(官 能基當量),以金屬元素換算(鎢酸時為鎢原子、鉬酸時 為翻原子之莫耳數)為〇.5〜2〇毫莫耳,較佳為1〇〜2〇毫 莫耳’更佳為2.5〜15毫莫耳。 作為用於反應之四級銨鹽,較佳為可使用總碳數為1〇 以上、更佳為25〜55之四級銨鹽,尤佳為其烷基鏈全部為 脂肪族鏈者。 具體可列舉:十三烷基甲基銨鹽、二(十二烷基)二甲基 |j 銨鹽、三辛基甲基銨鹽、三烷基甲基(烷基為辛基之化合 物與烷基為癸基之化合物之混合型)銨鹽、三(十六烷基) 甲基銨鹽、二曱基十八烷基銨鹽、四戊基銨鹽、十六烷基 二甲基銨鹽、苄基三丁基銨鹽、二(十六烷基)二甲基銨鹽、 三(十六烷基)甲基銨鹽、二硬化牛油烷基二甲基銨鹽等,但 並不限定於該等。 又,對該等鹽之陰離子種類並無特別限定,具體可列 12 201040203 » 舉:鹵化物離子、硝酸離子、硫酸離子、硫酸氫離子、乙 酸鹽離子、碳酸離子等,但並不限定於該等。 若碳數超過100,則疏水性變得過強,有四級銨鹽於有 機層中之溶解性變差之情況。若碳數未達10,則親水性變 強,同樣地四級銨鹽於有機層中之相溶性變差,因此欠佳。 四級銨鹽之使用量較理想為由所使用之聚酸類(較佳 為鎢酸類)之價數決定,較佳為聚酸類之價數倍之001〜 10倍當量。更佳為〇·〇5〜6.0倍當量,更佳為〇〇5〜45倍 u當量。 例如,只要為鎢酸則H2W〇4由於為2價,因此相對於 鎢酸1莫耳,四級銨鹽較佳為0〇2〜2〇莫耳之範圍。又, 只要為嫣填酸,則由於為3價,因此同樣地較佳為〇.〇3〜 3〇莫耳’只要為矽鎢酸,則由於為4價,因此較佳為〇.04 〜40莫耳。 旦於四級銨鹽之使用量低於聚酸類之價數倍之〇.〇1倍當 ο量之情形時,產生難以進行環氧化反應(根據情況不同有 時加快進行反應),又容易生成副產物之問題。於多於i 〇 倍當量之情形時,不僅後處理困難,並且有抑制反應之作 用’因此欠佳。 反應時較佳為使用緩衝液。作為緩衝液可使用任一 種,本反應中較佳為使用磷酸鹽水溶液。作為其pH值,較 佳為pH值經調整為4〜1〇之間者,更佳為pH值為5〜9。 於PH值未達4之情形時,環氧基之水解反應及聚合反應變 伸容易進行。又,於pH值超過1〇之情形時,產生反應變 13 201040203 得極度緩慢,反應時間過長之問題。 尤其於本發明中,齡^去& 士 較佳為於溶解作為觸媒之聚酸類 蚪,進行調整以使pH值為5〜9之間。 Λ緩衝液之使用方法例如可列舉於作為較佳緩衝液之麟 酉夂-鱗酸鹽水溶液之情形時,相 , τ祁對於過氧化氫,使用0.1〜10 莫耳%當量之構酸(或去虛舱_ -—氣鈉專鱗酸鹽),以鹼性化 &物(例如氫氧化鈉、氫氧化鈿 軋礼化鉀、妷酸鈉、碳酸氫鈉、碳 酸鉀等)進行pH值調整的方沐 lL . β登的方去。此處,較佳為以pH值於 添加過氧化氫時成為上述pH值之方々灸t p方式添加。又,亦可使用 磷酸二氫鈉、構酸氫二納等 寺進仃調整。較佳磷酸鹽之濃度 為0·1〜60重量%,較佳為1〜45重量%。 又’本反應中亦可不估用螻„ 便用緩衝液,且不進行pH值調整, 而直接添加構酸氫二納 '破醅__ 嶙酸一虱鈉、磷酸鈉或者三聚磷 酸納(或其水合物)等磷酸醆 _ 树暇皿就步驟之簡略化的意義而 &,尤佳為無PH值調整之煩輕而直接添加。此時之磷酸 鹽之使用量相對於過氧化氫,通“ Qi〜5 較佳為0.2〜4莫耳%當量,更佳 田 尺佳為〇.3〜3莫耳%當量。此 時’若相對於過氧化氣而超過5莫耳%當量, H未^莫耳%當量之情形時’產生變得容 易進行所生成之環氧樹脂之水解 鮮欠應或者反應變得緩慢等 弊病。 本反應係使用過氧化氫進行環氧化。作為本反應 使用之過氧化氨,就其操作之簡便性而言,較佳為:氧化 幻辰度為1〇〜4〇重量%之濃度之水溶液。於濃度超過40重 201040203 量%之情形時,除變得難關作以外,亦變得容易 成之環氧樹脂之分解反應,因此欠佳。 丁生 曰本反應係使用有機溶劑Η乍為所使用之有機 頁’相對於作為反應基質之稀烴樹脂i,以重量比 〜1〇’較佳為0.3〜50,更佳" · 〜2.5。於以重量比計超 過〇之情形時,反應之進行變得極度緩慢,因此欠佳。 為可使用之有機溶劑之具體例,可列舉:己烷、環己俨 庚燒等烷烴類,甲苯、二甲苯等芳香族烴化合物,甲:、 .=醇:異丙醇、丁醇、己醇、環己醇等醇類。又,根據情 沉,亦可使用:甲基乙基_、甲基異丁基酮、環戊_ 己綱等_類,二乙趟、四氮咳喃、二嗯燒等賴,乙酸乙义 S曰、乙酸丁酉旨、甲酸甲醋等醋化合物,乙猜等猜化合物等。 作為尤佳之溶劑為己烧、環己貌、庚烧等烧烴類,甲笨、 一甲苯等芳香族烴化合物。 作為具體之反應操作方法,例如以批次式之.反應爸進 ’添加稀烴樹脂、過氧化氮(水溶液)、聚酸類 (觸媒)、緩衝液、四級錄鹽以及有機溶劑,以二層進行 攪拌。對搜拌速度並未特別指定。由於過氧化氮之添加時 發熱之情形較多,因此亦可為添加各成分後緩緩添加過氧 化氫之方法。 f使用如下方法.添加緩衝液(或者水與麟酸鹽)、 聚I類進仃pH值調整後,添加四級銨鹽、有機溶劑及烯烴 化合物,以二層進行授拌,然後滴加過氧化氫。 或者亦可為使用如下方法之方法:於授摔水、有機溶 15 201040203 劑及烯烴化合物之過程中,添加聚酸類、磷醆(或者填酸 鹽類)進行pH值調整後,添加四級銨鹽,以二層進行搜掉, 然後滴加過氧化氫。 反應溫度並無特別限定,較佳為〇〜9(TC,更佳為〇〜 75°C,尤佳為15〜60〇c。於反應溫度過高之情形時,水解 反應容易進行,若反應溫度較低,則反應速度變得極其緩 f曼。 ' 又,反應時間雖亦取決於反應溫度、觸媒量等,但就 工業生產之觀點而言,長時間之反應會消耗大量能量,因 此欠佳。較佳範圍為1〜48小時,較佳為3〜36小時更 佳為4〜24小時。 反應結束後,進行過剩之過氧化氫之淬滅處理。淬滅 處理車父佳為使用鹼性化合物而進行。X,亦較佳為將還原 劑與驗性化合物併用。作為較佳之處理方法,可列舉如下 方法·以鹼性化合物將ρΗ值中和調整為6〜1〇後,使用還 原劑,將殘留之過氧化氫淬滅。於pH值未達6之情形時, 有將過剩之過氧化氫還原時之發熱較大,產生分解物之可 能性。 作為還原劑,可列舉:亞硫酸納、硫代硫酸納 '肼、 草酸、維生专· p # ,, ’、 寺。作為還原劑之使用量,相對於過剩部 分之過氧化氫之装 異耳數’通常為0.01〜20倍莫耳,更佳為 0·05〜1〇倍草耳,、* 、 進而更佳為0.05〜3倍莫耳。 °亥等較佳為作為水溶液而添加,其濃度較佳為0.5〜3〇 重量%。 16 201040203 作為驗性化合物,可列舉··氫氧化 氧化鎮、氯氧㈣等金屬氣氧化物,碳酸納二:風 屬碳酸鹽’麟酸納、碟酸氫 ::鉀專金 氧化銘等驗性固體。 n離子父換樹脂、 作為其使i轉於水 甲苯、二甲苯等芳香族煙 H谷劑(例如 r卷呉丁基綱、甲其^•立_μ 酮類,環己烧、庚烧、辛燒等煙,甲醇 土嗣等 醇類等各種溶劑)中者,I彳I θ /、丙知等 〇氧化氫之莫耳數,m 4相對於過剩部分之過 乳化風之莫耳數,通常為0.01〜20倍莫耳 、 10倍莫耳,進而更佳為0.05〜3倍莫耳^為〇.05〜 丨口杲斗〇該等可七 或上述有機溶劑之溶液而添加,亦可以單體添加。 於使用不溶解於水或有機溶劑中之固體驗之情形睥 相對於系統t殘留之過氧化氣之4 ㈣時, 計為卜麵倍之量。更佳A 較佳為使用以重量比In the method of epoxidation using hydrogen peroxide water, various kinds of "body" and "sigma" can be applied, and Japanese Patent Laid-Open No. 59-108793 Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Hereinafter, a method which is particularly preferable for obtaining the epoxy resin of the present invention is exemplified. First, the dilute hydrocarbon resin, the polyacid, and the quaternary salt of the present invention are reacted in an emulsion state of an organic substance and hydrogen peroxide water. The polyacid used in the present invention is not particularly limited as long as it is a compound having a polyacid structure, and is preferably a polyacid containing tungsten or molybdenum, more preferably a polyacid containing tungsten, and particularly preferably a tungstate. * As the specific polyacid and polyacid salt, a tether acid selected from the group consisting of tungstic acid, 12-tungsten-disc acid, 12-tungsoleic acid, 18-tartrate, and 12. A molybdenum-based acid selected from the group consisting of steel acid, phosphomolybdic acid, and the like, and the like. Examples of the counter cation of the salt include a quaternary ammonium ion, a soil test metal ion, and an alkali metal ion. 201040203 Specific examples include: tetramethyl-recording ions, sulfhydryl triethyl-recording ions, tridecyl thiol ammonium ion, di(12-decyl)dimethylammonium ion, trioctylmethyl sulphide, three Pyridylmethyl (mixture of octyl and sulfhydryl), money ion, tris(hexadecyl)methylammonium ion, trimethyloctadecyl ammonium ion, tetrapentyl ion, hexadecane Alkaline metal ions such as calcium ion, magnesium ion, etc., sodium, potassium, planing, etc. An alkali metal ion or the like is not limited thereto. Among them, sodium or potassium ions, calcium ions, and ammonium ions are exemplified as the anti-weighing cations. f is used as the amount of the polyacid, and is equivalent to the olefin oxime (functional equivalent) of the present invention in terms of a metal element (the number of moles of a turning atom in the case of a tungsten atom or a molybdic acid in the case of a tungstic acid). ~ 2 〇 millimoles, preferably 1 〇 ~ 2 〇 millimoles 'better than 2.5 to 15 millimoles. As the quaternary ammonium salt used for the reaction, it is preferred to use a quaternary ammonium salt having a total carbon number of 1 Å or more, more preferably 25 to 55, and particularly preferably an alkyl chain of all of which is an aliphatic chain. Specific examples thereof include a tridecylmethylammonium salt, a di(dodecyl)dimethyl group, an ammonium salt, a trioctylmethylammonium salt, and a trialkylmethyl group (an alkyl group is an octyl compound). a mixed type of a compound in which an alkyl group is a mercapto group, an ammonium salt, a tris(hexadecyl)methylammonium salt, a didecyloctadecyl ammonium salt, a tetraamyl ammonium salt, a hexadecyldimethylammonium salt Salt, benzyltributylammonium salt, di(hexadecyl)dimethylammonium salt, tris(hexadecyl)methylammonium salt, dihardened tallow alkyldimethylammonium salt, etc., but Not limited to these. Further, the type of the anion of the salt is not particularly limited, and specifically, it may be listed as 12, 2010, 203, 203: a halide ion, a nitrate ion, a sulfate ion, a hydrogen sulfate ion, an acetate ion, a carbonate ion, etc., but is not limited thereto. Wait. When the carbon number exceeds 100, the hydrophobicity becomes too strong, and the solubility of the quaternary ammonium salt in the organic layer may be deteriorated. When the carbon number is less than 10, the hydrophilicity becomes strong, and similarly, the compatibility of the quaternary ammonium salt in the organic layer is deteriorated, which is not preferable. The amount of the quaternary ammonium salt used is preferably determined by the number of valences of the polyacids (preferably tungstic acids) to be used, and is preferably 001 to 10 equivalents which are several times the price of the polyacids. More preferably, it is 5 to 6.0 times equivalent, more preferably 5 to 45 times u equivalent. For example, as long as it is tungstic acid, since H2W〇4 is divalent, the quaternary ammonium salt is preferably in the range of from 0 2 to 2 mol with respect to 1 mol of tungstic acid. Further, as long as it is a ruthenium, since it is trivalent, it is preferably 〇.〇3~3〇莫耳', as long as it is yttrium tungstic acid, since it is tetravalent, it is preferably 〇.04 〜 40 moles. When the amount of the quaternary ammonium salt is less than several times the valence of the polyacid, when the amount is 〇1 times, it is difficult to carry out the epoxidation reaction (the reaction may be accelerated depending on the case), and it is easy to generate. The problem of by-products. In the case of more than i 倍 double equivalent, not only is post-treatment difficult, but also the effect of suppressing the reaction is therefore poor. It is preferred to use a buffer in the reaction. Any one may be used as the buffer, and in the reaction, an aqueous phosphate solution is preferably used. As the pH, it is preferred that the pH is adjusted to be between 4 and 1 Torr, and more preferably the pH is 5 to 9. When the pH is less than 4, the hydrolysis reaction of the epoxy group and the polymerization reaction are easily carried out. Further, when the pH exceeds 1 Torr, the reaction becomes 13 201040203, which is extremely slow and the reaction time is too long. In particular, in the present invention, it is preferred to dissolve the polyacid oxime as a catalyst to adjust the pH to a value of 5 to 9. The method of using the hydrazine buffer is, for example, in the case of a linseed-salt aqueous solution as a preferred buffer, and the phase τ 祁 is used in the case of hydrogen peroxide, 0.1 to 10 mol% of the constitutive acid (or Go to the virtual cabin _ - - gas sodium scallops), with alkaline and & substances (such as sodium hydroxide, barium hydroxide, sodium citrate, sodium bicarbonate, potassium carbonate, etc.) for pH Adjust the square Mu lL. Here, it is preferred to add a moxibustion t p method in which the pH is the above-mentioned pH value when hydrogen peroxide is added. In addition, it is also possible to use sodium dihydrogen phosphate or acid hydrogen di-nano. The concentration of the preferred phosphate is from 0.1 to 60% by weight, preferably from 1 to 45% by weight. In addition, in this reaction, it is also possible to use 缓冲 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便 便醆 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇 暇, "Q~5 is preferably 0.2~4 mol% equivalent, and the better field is preferably 3.3~3 mol% equivalent. In this case, when it is more than 5 mol% equivalent to the peroxidation gas, and H is not equimolar, it is easy to carry out the hydrolysis of the epoxy resin which is easily formed, or the reaction becomes slow. Disadvantages. This reaction is epoxidized using hydrogen peroxide. As the peroxidation ammonia used in the reaction, in terms of ease of handling, an aqueous solution having a concentration of 1 〇 to 4 〇 by weight is preferably used. In the case where the concentration exceeds 40% by weight of 201040203%, in addition to becoming difficult to handle, it is also easy to form a decomposition reaction of the epoxy resin, which is not preferable. Ding Shengyu This reaction uses an organic solvent Η乍 as the organic page used 'relative to the dilute hydrocarbon resin i as the reaction substrate, preferably in a weight ratio of ~1 〇', preferably 0.3 to 50, more preferably " . In the case where the weight ratio is exceeded, the progress of the reaction becomes extremely slow, which is not preferable. Specific examples of the organic solvent that can be used include an alkane such as hexane or cyclohexylpyrene, an aromatic hydrocarbon compound such as toluene or xylene, and a::= alcohol: isopropanol, butanol, and An alcohol such as an alcohol or a cyclohexanol. In addition, depending on the situation, you can also use: methyl ethyl _, methyl isobutyl ketone, cyclopentyl hexyl yloids, etc., diacetyl, tetrazine cough, dioxin, etc. S曰, butyl acetate, carboxylic acid methyl acetate and other vinegar compounds, B guess and other compounds. The solvent which is particularly preferred is a hydrocarbon such as a burned hydrocarbon, a cyclohexane or a heptane, or an aromatic hydrocarbon compound such as a benzene or a toluene. As a specific reaction operation method, for example, in a batch type, the reaction daddy 'adds a rare hydrocarbon resin, a nitrogen peroxide (aqueous solution), a polyacid (catalyst), a buffer, a quaternary salt, and an organic solvent, The layers were stirred. There is no specific designation for the speed of the search. Since there are many cases where heat is generated during the addition of nitrogen peroxide, a method of slowly adding hydrogen peroxide after adding each component may be employed. f Use the following method: Add buffer (or water and linoleate), adjust the pH value of poly-type I, add quaternary ammonium salt, organic solvent and olefin compound, mix in two layers, then add Hydrogen peroxide. Alternatively, the method may be as follows: in the process of imparting water drop, organic solvent 15 201040203 agent and olefin compound, adding polyacids, phosphonium (or acid salt) for pH adjustment, and adding quaternary ammonium The salt was searched off in two layers and then hydrogen peroxide was added dropwise. The reaction temperature is not particularly limited, and is preferably 〇~9 (TC, more preferably 〇~75 ° C, particularly preferably 15 to 60 〇c. When the reaction temperature is too high, the hydrolysis reaction proceeds easily, if the reaction When the temperature is low, the reaction rate becomes extremely slow. 'Also, the reaction time depends on the reaction temperature, the amount of catalyst, etc., but from the viewpoint of industrial production, long-term reaction consumes a large amount of energy, so The preferred range is from 1 to 48 hours, preferably from 3 to 36 hours, more preferably from 4 to 24 hours. After the reaction is completed, excess hydrogen peroxide is quenched. The quenching treatment is carried out by the car. It is preferable to carry out a basic compound, and it is preferable to use a reducing agent together with the test compound. As a preferable processing method, the following method is used, and the neutral value of the ρΗ value is adjusted to 6 to 1 碱性 by the basic compound, and it is used. The reducing agent quenches the residual hydrogen peroxide. When the pH is less than 6, there is a possibility that the heat generated when the excess hydrogen peroxide is reduced is large, and a decomposition product is generated. Examples of the reducing agent include: Sodium sulfite, sodium thiosulfate, oxalic acid Vitamins · p # ,, ', Temple. The amount of use as a reducing agent, relative to the excess part of hydrogen peroxide installed in the number of ears 'usually 0.01 to 20 times the molar, more preferably 0. 05~1 〇倍草耳,,*, and further preferably 0.05 to 3 times mol. °Hay, etc. is preferably added as an aqueous solution, and its concentration is preferably 0.5 to 3 〇% by weight. 16 201040203 As an experimental compound, Listed······························································· As a result, i is transferred to an aromatic fumes such as water toluene or xylene (for example, r 呉 呉 纲 甲, 甲 甲 立 立 _ ketones, cyclohexanthene, gamma burning, xin burning, etc., methanol soil Among the various solvents such as hydrazine and the like, I彳I θ /, the molar number of hydrogen peroxide, etc., and the molar number of m 4 relative to the excess portion of the emulsified air, usually 0.01 to 20 times. Ear, 10 times Mo, and more preferably 0.05 to 3 times Mo ^ ^ 〇.05~ 丨口杲斗〇 These seven or the above organic solvent solution In addition, it may be added as a monomer. In the case of using a solid solution which is not dissolved in water or an organic solvent, the amount of the peroxidized gas remaining in the system t (4) is counted as the amount of the surface. Preferably used in weight ratio

〜則倍。於使料溶解於水或有機 為W ❹時,亦可將下文所記載之水層與有機層分離後 於過氧化氮之泮滅後(或者進行泮 :里: =機層與水層不分離時,或者不使用有機溶劑Π;時 反應時,添加上述有機溶劑而 則而進仃 應產物之萃取。此時所使用之有1用水層進行反 脂,以重量比計為0.H。倍有較„目對於原料稀煙樹 將該操作反覆進行數次後分離 、 硯需要 水洗而進行純化。 有機層m將該有機層 所獲得之有機層視需要利用離子交換樹脂或金屬氧化 17 201040203 物(尤佳為矽膠或氧化鋁等)、活性碳(其中尤佳為化學 活化活性碳)、複合金屬鹽(其中尤佳為鹼性複合金層鹽)、 黏土礦物(其中尤佳為蒙脫石等層狀黏土礦物)等,去除 雜質’進而進行水洗及過據等後,將溶劑蒸館去除而獲得 目標之環氧樹脂。 、上述方式獲知之環氧樹脂係以由式(3)所表示之分 子作為主成分:~ then times. When the material is dissolved in water or the organic material is W ,, the water layer and the organic layer described below may be separated from the organic layer and then quenched after the nitrogen peroxide (or 泮: 里: = the machine layer is not separated from the water layer) When the reaction is carried out, the above organic solvent is added, and then the extraction of the product is carried out. At this time, 1 water layer is used for the anti-fat, and the weight ratio is 0.H. The organic layer m is obtained by ion-exchange resin or metal oxidation as needed. The organic layer obtained by the organic layer is oxidized by ion exchange resin or metal as needed. (especially for tannin or alumina, etc.), activated carbon (particularly chemically activated carbon), composite metal salts (particularly alkaline composite gold salts), clay minerals (of which montmorillonite is especially preferred) After removing the impurities, such as layered clay minerals, and then washing with water and the like, the solvent is evaporated to obtain the desired epoxy resin. The epoxy resin obtained by the above method is represented by the formula (3). Molecule The main ingredients:

(式中,存在複數個之R、p分別獨立地存在,表示氫 '、子、或碳數1〜15之烷基), 5存在如式(4)所示之各種結構之化合物: 18 201040203(wherein, a plurality of R and p are independently present, and represent hydrogen ', a sub, or an alkyl group having 1 to 15 carbon atoms), and 5 are compounds having various structures as shown in the formula (4): 18 201040203

(D)之組合可為任一種組合。R 、P相同之含義)。The combination of (D) may be any combination. The same meaning of R and P).

P 原料之單羥曱基體、二 環氧基彼此聚合而成之The monohydroxyindole matrix and the dicyclooxy group of the P raw material are polymerized with each other.

(式中,(A)〜 表示與式(3)中之R(where (A)~ represents R in equation (3)

又,根據反應條件而生成來 經曱基體等具有醇結構之化合物 高分子量體或其他副反應物。 本發明之%氧樹脂具有由式(3、张主_ π w八、3)所表不之結構作為主 成分’其純度於GPC測定中較佳為8〇面積%以上,更佳為 90面積。/〇以上,進而更佳為95面積%以上。 再者,本發明之環氧樹月旨令之Gpc之測定條件如下所 述。管柱為 Sh〇dex SYSTEM_21 f 柱(κρ 謝l、kf_8〇2 $ (x2根)、KF-802 )、連結洗提液為四氫吱喃,流速為1 ,管柱溫度為40t,又,檢測係以ri進行,校準曲 線係使用Shodex製標準聚笨乙婦。 201040203 可用作環氧丙烯酸酯 環狀碳酸酯化合物等 所獲得之本發明之環氧樹脂例如 及其衍生物n相系化合物或者 各種樹脂原料。 以下,記載含有本發明 樹脂組成物。 之環氧樹脂的本發明之硬化性 本發月之硬化性樹脂組成物含有本發明之環氧樹脂作 為必需成分。於本發明之硬化性樹脂組成物中,可應用利 劑之熱硬化(硬化性樹脂組成物A)及以酸為硬化觸 媒之陽離子硬化(硬化性樹脂組成物B)此兩種方法。 硬化性樹脂組成# A及硬化性樹脂組成# B巾,本發 明之%氧樹脂可單獨使用或者與其他環氧樹脂併用而使 用於併用之情形時,本發明之環氧樹脂在總環氧樹脂令 所占之比例較佳為3〇質量%以上,尤佳為4〇質量。以上。 其中,於將本發明之環氧樹脂用作硬化性樹脂組成物之改 質劑之情形時,亦可以j〜3〇質量%之比例添加。 作為可與本發明之環氧樹脂併用之其他環氧樹脂,可 列舉:酚醛型環氧樹脂、雙酚型環氧樹脂、聯苯型環氧樹 脂、三苯基曱烷型環氧樹脂、苯酚芳烷基型環氧樹脂等。 具體可列舉:雙酚A、雙酚s、硫代二酚、苐雙酚、萜烯二 酚' 4,4’-聯苯酚、2,2,-聯苯酚、3,3,,5,5,-四曱基聯笨 基]-4,4-一醇、對苯二紛、間苯二盼、萘二盼、三_(4_趣烏 本基)曱烧、1,1,2,2_四(4 -經基苯基)乙烧,盼類(苯盼、經 烧基取代之苯酚、萘酚、經烷基取代之萘酚、二羥基笨、 二經基萘等)與甲醛、乙醛、苯甲醛、對羥基苯曱醛、鄰 20 201040203 羥基苯甲醛、對羥基苯乙酮、 糖…雙(氯甲卿,笨、4;本雙乙(=環戍二 聯苯、雙(氯甲基)苯或U•雙(甲氧^甲甲氧甲基⑷,-合物及該等之改質物,四演雙朌 土 土)本專之聚縮 衍生之縮水甘油喊化物,脂環式環^匕雙紛類以及醇類 ^ u f氧树知、縮水甘油胺系 衣乳樹月曰、縮水甘油醋系環氧樹脂、倍 脂(鏈狀、環狀、梯狀、或者該等至少 系^樹 構之石夕氧院結構中具有縮水甘油基及 ^上之混5結 〇環氧樹脂)等固形或液狀環氧 衣乳環己炫結構之 乳钳知但並不限定於該等》 二其:將本發明之硬化性樹脂组成物用於光學用途之 二將本發明之環氧樹脂與脂環式環氧樹脂或 =夕減結構之環氧樹脂併“❹。尤其於脂環式環 曰之情形時,較佳為骨架上具有環氧環己烧結構之化 二,,亡,為藉由具有環己稀結構之化合物之氧化反應而 獲侍之裱乳樹脂。 °甲酸:::有環己烯結構之化合物,可列舉可藉由環己烯 甲^與%類之醋化反應或者環己烯甲醇與叛酸類之醋化反 應(Tetrahedron νο1. 36 Ρ·2409 ⑽0)、Tetrahedron Letter ρ·4475 (1980)等中記載之方法)、或者環己稀搭之季先科反 應(Tlshchenk0 reaction)(日本專利特開屬·⑽59號 公報,日本專利特開2004·262871號公報等中記载之方0 法)、進而環己烯甲酸醋之醋交換反應(日本專利特開 2006-052187號公報等t記載之方法)而製造之化合物。 作為醇類,只要是具有醇性經基之化合物,則無特別 21 201040203 限定,可列舉:乙二醇、丙二醇、丨,3_丙二醇、丨,2_丁二醇' 1,4-丁 一醇、15•戊二醇、Ik己二醇、環己烷二甲醇等二 醇類,甘油、三羥甲基乙烷、三羥甲基丙烷、三羥甲基丁 烷、2-羥基甲基_丨,4_丁二醇等三醇類,季戊四醇等四醇類 等。又,作為羧酸類,可列舉:草酸、順丁烯二酸、反丁 烯二酸、鄰苯二甲酸、間苯二曱酸、己二酸、環己二曱酸 等’但並不限定於此。 進而’作為上述以外之具有環己烯結構之化合物,可 列舉:環己烯醛衍生物、及藉由與醇體之縮醛反應而成之 縮醛化合物。作為反應方法,只要應用通常之縮醛化反應 則可製造,例如揭示有以下方法:反應介質中使用甲苯、 二甲苯等溶劑而一邊進行共沸脫水一邊進行反應之方法 (美國專利第2945008號公報)、於濃鹽酸中溶解多元醇 後一邊緩緩添加醛類一邊進行反應之方法(日本專利特開 昭48-96590號公報)、反應介質中使用水之方法(美國專 利第3092640冑公報)、反應介質中使用有機溶劑之方法 (日本專利特開平7.215979號公報)、使用固體酸觸媒之 方法(日本專利特開2007_23〇992號公報)等。就結構之穩 定性而言’較佳為環狀縮醛結構。 作為該等環氧樹脂之具體例,可列舉:erl_422i、 UVR-61〇5、ERL-4299 (全部為商品名,任一者均為d〇w Chemical 製造)、Celloxide 2〇21ρ、Ερ〇ι_ gt4〇i、 EHPE3 1 50、EHPE3 1 50CE(全部為商品名,任一者均為MM Chemical Industries製造)以及二環戊二烯二環氧化物等, 22 201040203 但並不限定於該等(參考 . 芩馱.4淪環氧樹脂基礎篇] Ρ76-85 ) 〇 該等可單獨使用,亦可併用2種以上。 以下對各個硬化性樹脂組成物進行說明。 硬化性樹月旨組成物Α (利用硬化劑之熱硬化) 作為本發明之硬化㈣脂組絲A所含有之硬化劑, 可列舉:胺系化合物、酸肝系化合物、醯胺系化合物、 Ο Ο :化合物、叛酸系化合物等。作為可使用之硬化劑之具 乙二’可列舉:二胺基二苯基^、二伸乙基三胺、三伸 次四胺、一胺基二苯基砜、異佛爾_二胺、雙氰胺、由 八 丨酸之-聚物肖〔二胺合成之《醯胺樹脂等含氮化 约4 (胺醯胺化合物),鄰苯二甲酸酐、偏苯三甲酸酐、 四f四甲酸酐、順丁烯二酸酐、四氫鄰苯二甲酸酐、曱基 _氣鄰笨—甲酸酐、甲基耐地酸酐、耐地酸酐、六氫鄰苯 ^甲酸酐、甲基六氫鄰苯二曱酸酐、丁烷四甲酸酐、雙環 ’2,1]庚烷-2,3-二甲酸酐、甲基雙環[2,2」]庚烷_2,3二甲酸 奸、王班 衣烧1’4-二甲酸-3,4 -肝等酸酐;藉由各種醇、經甲 5^改哲 買之聚矽氧與上述酸酐之加成反應而獲得之羧酸樹 月旨* —,雙酚八、雙酚F、雙酚s、苐雙酚、萜烯二酚、4,4,·聯 求紛、2,2’_聯苯酚、3,3·,5,5,-四甲基-[1,1,-聯苯基]_4,4·-二 西亨- 1對苯二酚、間苯二酚、萘二酚、三-(4-羥基苯基)曱烷、 5,2,2-四(4-羥基苯基)乙烷,酚類(笨酚、經烷基取代之 紛、兹 不酚、經烷基取代之萘酚、二羥基苯、二羥基萘等) 與Ψ磁· 盼、乙链、苯甲醛、對羥基苯甲醛、鄰羥基苯甲醛、 23 201040203 對羥基苯乙酮、鄰羥基苯乙冑、二環戊二烯 '糠醛、Μ 雙(氯甲基聯苯、4,4.·雙(甲氧基甲基Η,Γ_聯苯、K 雙(氯甲基)苯《M,,f氧基甲基)苯等之聚縮合物及該 等之改質物’四漠雙盼A等齒化雙盼類、㈣與紛類之縮 物等多酚類,咪唑、二氟化硼·胺錯合物' 胍衍生物之化 合物等’但並不限定於該等。該等可單獨使用,亦可使用2 於本發明中,尤佳為以上述酸酐系化合物、致酸系化 合物為代表之具有酸奸結構、或者幾酸結構之化合物。 本發明之硬化性樹脂組成物A中之硬化劑之使用量相 對於環氧樹脂之環氧基i當量,較佳為〇7〜12當量。於 相對二環氧基丨當量而未達〇7當量之情形時、或者超過 1·2當量之情形時’任—者均有硬化變得不完全而無法獲得 良好之硬化物性之虞。 於本㈣之硬化性樹驗成物Α +,亦可料化促進 Μ (硬化觸媒)與硬化劑-起併用。作為可使用之硬化促 進劑之具體例’可列舉:2_甲基咪唾〜基㈣及2_乙基 雜4雙曱二;=」坐類,乂二甲基胺基甲基)苯盼或1,8·二氮 . 烯_7等三級胺類,三苯基膦等膦類,四丁 基叙鹽、三異丙基甲基錄鹽'三甲基癸基錄鹽、十六院基 =銨鹽、十六貌基三甲基氫氧化銨等四級銨鹽,三苯 ,卞基鱗鹽、三苯基乙基鱗鹽、四了基鱗鹽等四級鱗鹽(四 ::之抗衡離子為函素、有機酸離子、氫氧化物離子 並未特別指定,尤佳為有機酸離子、氣氧化物離子),辛 24 201040203 酸錫等金屬化合物等。硬化促進劑視需要相對於環氧樹月旨 100重量份而使用〇 〇1〜5 〇重量份。 本發明之硬化性樹脂組成物Α亦可含有含磷化合物作 為阻燃性賦予成分。作為含磷化合物,可為反應型者,亦 可為添加型者。作為含磷化合物之具體例,可列舉:鱗酸 三曱酯、磷酸三乙酯、磷酸三甲苯酯、磷酸三(二曱苯)崎、Further, depending on the reaction conditions, a compound having an alcohol structure such as a ruthenium matrix or a high molecular weight body or other side reactants is produced. The % oxygen resin of the present invention has a structure represented by the formula (3, the main _ π w VIII, 3) as a main component, and its purity is preferably 8 Å or more, more preferably 90 Å in the GPC measurement. . More than or equal to 95% by area. Further, the measurement conditions of Gpc of the epoxy resin of the present invention are as follows. The column is Sh〇dex SYSTEM_21 f column (κρ谢l, kf_8〇2 $ (x2 root), KF-802), the linked eluent is tetrahydrofuran, the flow rate is 1, the column temperature is 40t, and The detection system was performed with ri, and the calibration curve was performed using the standard polystyrene of Shodex. 201040203 It can be used as an epoxy acrylate cyclic carbonate compound or the like, an epoxy resin of the present invention obtained by, for example, a derivative thereof, or an n-phase compound or various resin raw materials. Hereinafter, the resin composition of the present invention is contained. The curable property of the present invention The epoxy resin composition of the present invention contains the epoxy resin of the present invention as an essential component. In the curable resin composition of the present invention, two methods of thermal curing (curable resin composition A) of the agent and cation hardening (curable resin composition B) using an acid as a curing catalyst can be applied. Curable resin composition # A and curable resin composition # B towel, the epoxy resin of the present invention can be used alone or in combination with other epoxy resins, and the epoxy resin of the present invention is used in the total epoxy resin. The proportion of the order is preferably 3% by mass or more, and particularly preferably 4 〇. the above. In the case where the epoxy resin of the present invention is used as a modifier for a curable resin composition, it may be added in a ratio of j to 3 % by mass. Examples of other epoxy resins which can be used together with the epoxy resin of the present invention include a novolac type epoxy resin, a bisphenol type epoxy resin, a biphenyl type epoxy resin, a triphenyldecane type epoxy resin, and a phenol. An aralkyl type epoxy resin or the like. Specific examples thereof include bisphenol A, bisphenol s, thiodiphenol, bismuth bisphenol, terpene diphenol '4,4'-biphenol, 2,2,-biphenol, 3,3,5,5 , - 四曱基联笨基]-4,4-Alcohol, p-Benzene, inter-phenylene, naphthalene, _(4_趣乌本基)曱, 1,1,2, 2_tetrakis(4-cyanophenyl)ethene, expectant (benzene, substituted phenol, naphthol, alkyl substituted naphthol, dihydroxy stupid, dipyridyl, etc.) and formaldehyde , acetaldehyde, benzaldehyde, p-hydroxybenzaldehyde, o- 20 201040203 hydroxybenzaldehyde, p-hydroxyacetophenone, sugar ... double (chloromethyl qing, stupid, 4; the double bis (= ring quinone diphenyl, double (Chloromethyl)benzene or U•bis(methoxymethoxymethyl(4), a compound and these modified substances, four-fold double-dish soil), a polycondensed derivative of glycidol Cycloring ring 匕 匕 以及 以及 以及 以及 以及 以及 以及 uf uf uf uf uf uf uf uf uf uf uf uf uf uf uf uf uf uf uf uf uf uf uf uf uf uf uf uf uf uf uf uf uf uf uf uf uf uf uf uf At least in the structure of the stone structure of the stone structure, there is a glycidyl group and a mixture of 5 The nipple of a solid or liquid epoxidized latex ring hexacene structure such as an oxy-resin is not limited to the above, and the second embodiment: the curable resin composition of the present invention is used for optical use. The epoxy resin and the alicyclic epoxy resin or the epoxy resin of the yoke structure are "❹. Especially in the case of the alicyclic ring oxime, it is preferred to have the epoxide ring burned structure on the skeleton. , dies, is a bismuth resin obtained by oxidation reaction of a compound having a cyclohexene structure. ° Formic acid:: a compound having a cyclohexene structure, which may be exemplified by cyclohexene and % The vinegarization reaction or the vinegarization reaction of cyclohexene methanol with a tickic acid (Tetrahedron νο1. 36 Ρ·2409 (10)0), Tetrahedron Letter ρ·4475 (1980), etc., or the pre-ecological reaction of cyclohexane (Tlshchenk0 reaction) (Japanese Patent Laid-Open Publication No. (10) No. 59, Japanese Patent Laid-Open Publication No. 2004-262871, etc.), and vinegar exchange reaction of cyclohexene carboxylic acid vinegar (Japanese Patent Laid-Open No. 2006) Manufactured by the method described in t-052187 or the like) As the alcohol, as long as it is a compound having an alcoholic trans group, there is no particular 21 201040203, and examples thereof include ethylene glycol, propylene glycol, hydrazine, 3-propylene glycol, anthracene, and 2-butanediol ' 1,4 -diols such as butanol, 15 pentanediol, Ik hexanediol, cyclohexanedimethanol, glycerin, trimethylolethane, trimethylolpropane, trimethylolbutane, 2- Triols such as hydroxymethyl hydrazine and 4-butane diol, tetraols such as pentaerythritol, etc. Further, examples of the carboxylic acid include oxalic acid, maleic acid, fumaric acid, and phthalic acid. , 'm-phthalic acid, adipic acid, cyclohexanedioic acid, etc.' are not limited thereto. Further, the compound having a cyclohexene structure other than the above may, for example, be a cyclohexenal derivative or an acetal compound obtained by reacting an acetal with an alcohol. The reaction method can be produced by applying a usual acetalization reaction. For example, a method in which a reaction is carried out by azeotropic dehydration using a solvent such as toluene or xylene in a reaction medium is disclosed (U.S. Patent No. 2945008) a method of reacting a polyhydric alcohol in a concentrated hydrochloric acid, and slowly adding an aldehyde (Japanese Patent Laid-Open Publication No. SHO 48-96590), and a method of using water in a reaction medium (U.S. Patent No. 3,092,640) A method of using an organic solvent in the reaction medium (Japanese Patent Laid-Open No. Hei. No. 7.215979), a method using a solid acid catalyst (Japanese Patent Laid-Open Publication No. 2007-23〇992), and the like. It is preferably a cyclic acetal structure in terms of structural stability. Specific examples of such epoxy resins include erl_422i, UVR-61〇5, and ERL-4299 (all of which are trade names, either of which are manufactured by d〇w Chemical), Celloxide 2〇21ρ, Ερ〇ι_. Gt4〇i, EHPE3 1 50, EHPE3 1 50CE (all of which are trade names, either manufactured by MM Chemical Industries) and dicyclopentadiene diepoxide, etc. 22 201040203 However, it is not limited thereto (Ref.芩驮.4沦Epoxy resin basics] Ρ76-85 ) 〇 These may be used alone or in combination of two or more. Each of the curable resin compositions will be described below. The sclerosing tree composition (heat-hardening by a hardening agent). The hardening agent contained in the hardening (4) lipid filament A of this invention is an amine compound, a sour-patent compound, a amide type compound, and a hydrazine. Ο : a compound, a tickic acid compound, and the like. As the hardener which can be used, there are exemplified as: diaminodiphenyl^, di-extended ethyltriamine, tri-extension tetraamine, monoaminodiphenylsulfone, isophorol-diamine, double Cyanamide, a polymer of octadecanoic acid [diamine synthesis, such as a guanamine resin containing about 4 (amine amide compound), phthalic anhydride, trimellitic anhydride, tetrafic tetracarboxylic anhydride , maleic anhydride, tetrahydrophthalic anhydride, mercapto-gas, stearic-formic anhydride, methylic acid anhydride, acid anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic acid Phthalic anhydride, butane tetracarboxylic anhydride, bicyclo '2,1]heptane-2,3-dicarboxylic anhydride, methylbicyclo[2,2"]heptane_2,3 dicarboxylic acid, Wang Banyi 1 '4-dicarboxylic acid-3,4-hepatic acid anhydride; carboxylic acid tree obtained by the addition reaction of various alcohols, polyoxyl which is bought by Azure 8. Bisphenol F, bisphenol s, bismuth bisphenol, terpene diol, 4, 4, · 联, 2,2'-biphenol, 3,3,5,5,-tetramethyl- [1,1,-biphenyl]_4,4·-bisxihen-1 hydroquinone, resorcinol, naphthalenediol, tri-(4- Phenyl) decane, 5,2,2-tetrakis(4-hydroxyphenyl)ethane, phenols (thins, phenols, alkyl-substituted phenols, alkyl-substituted naphthols, Hydroxybenzene, dihydroxynaphthalene, etc.) with ruthenium, expectant, ethyl chain, benzaldehyde, p-hydroxybenzaldehyde, o-hydroxybenzaldehyde, 23 201040203 p-hydroxyacetophenone, o-hydroxyphenylacetamidine, dicyclopentadiene Furfural, hydrazine bis (chloromethylbiphenyl, 4,4.. bis(methoxymethyl hydrazine, hydrazine _ biphenyl, K bis (chloromethyl) benzene "M,, f oxymethyl) benzene, etc. The polycondensate and the modified substances of the above-mentioned four kinds of polyphenols such as tetrahydropyrene A and the like, (four) and various kinds of polycondensates, imidazole, boron difluoride and amine complex 'deuterium derivatives The compound or the like is not limited thereto. These may be used singly or in the present invention, and it is particularly preferable to have an acidity structure represented by the above-mentioned acid anhydride compound or acid-based compound, or The compound having an acid structure. The amount of the hardener used in the curable resin composition A of the present invention is preferably from 7 to 12 equivalents per equivalent of the epoxy group i equivalent of the epoxy resin. When the oxime equivalent is less than 7 equivalents, or when it exceeds 1.2 equivalents, the hardening becomes incomplete and the cured properties are not obtained. The hardenability of the present (4) The tree test substance Α + can also be used to promote the Μ (hardening catalyst) and the hardener - together. As a specific example of a hardening accelerator that can be used, it can be exemplified: 2_methylimidyl-based (four) and 2 _Ethyl 4 bismuth bis(2); =" succinyl, dimethylaminomethyl) phenyl or benzodiazepines, tertiary amines such as olefin-7, phosphines such as triphenylphosphine, Tetrabutyl salt, triisopropylmethyl salt, trimethyl sulfonium salt, hexavalent base = ammonium salt, hexadecane trimethyl ammonium hydroxide and other four-grade ammonium salt, triphenyl, Four grades of scale salts such as sulfhydryl scale salt, triphenylethyl scale salt, and tetrakilin scale salt (four:: the counter ion is a functional element, organic acid ion, hydroxide ion is not specified, especially good Organic acid ions, gas oxide ions), Xin 24 201040203 Metal compounds such as tin oxide. The hardening accelerator is used in an amount of 1 to 5 parts by weight based on 100 parts by weight of the epoxy resin. The curable resin composition of the present invention may contain a phosphorus-containing compound as a flame retardancy imparting component. As the phosphorus-containing compound, it may be either a reactive type or an additive type. Specific examples of the phosphorus-containing compound include tridecyl sulphate, triethyl phosphate, tricresyl phosphate, and tris(diphenyl) phosphate.

Ο 磷酸曱苯基二苯酯、磷酸曱苯基_2,6_二(二曱苯)酯、j,夂伸 笨基雙(磷酸二(二曱苯)酯)、1>4_伸苯基雙(磷酸二(二甲笨) 酉日)以及4,4'-聯苯基(磷酸二(二甲苯)酯)等磷酸酯類;9,1〇、 —氣-9-氧雜·1〇_磷雜菲_1〇_氧化物或ι〇(2,5二羥基笨 基)-10H-9-氧雜-10_磷雜菲_1〇_氧化物等膦類;使環氧樹脂 與上述膊類之活性氫進行反應而獲得之含磷環氧樹脂、紅 &等,較佳為磷酸酯類、膦類或者含磷環氧樹脂,尤佳為 I3·伸笨基雙(磷酸二(二甲苯)酯)、丨,4_伸苯基雙(磷酸二(二 甲苯)酯)、4,4,-聯苯(磷酸二(二曱苯)酯)或者含磷環氧曱Phenylphenyl diphenyl phosphate, phenyl phenyl 2,6-bis(diphenylene) acrylate, j, bismuth bis(diphenylene phosphate), 1> Phosphate such as bis (phosphoric acid dichloride) and 4,4'-biphenyl (di(xylylene phosphate) phosphate; 9,1 〇, - gas-9-oxa-1 〇_phosphaphenanthrene 〇 氧化物 _ oxide or ι〇 (2,5 dihydroxy phenyl)-10H-9-oxa-10-phosphaphenanthrene 〇 氧化物 oxides; The phosphorus-containing epoxy resin, red & or the like obtained by reacting with the active hydrogen of the above-mentioned body is preferably a phosphate ester, a phosphine or a phosphorus-containing epoxy resin, and more preferably an I3·extension base double (phosphoric acid) Di(xylylene) ester), hydrazine, 4_phenylene bis(di(xylylene) phosphate), 4,4,-biphenyl (bis(diphenylene) phosphate) or phosphorus-containing epoxy

曰3磷化合物之含量相對於本發明之硬化性樹脂組成物A 中之%氧樹脂成分之總量,較佳為0.6倍以下。於超過〇.6 D之情形時,有對硬化物之吸濕性、介電特性造成不良影 響之擔憂。 進而,於本發明之硬化性樹脂組成物A中亦可視需要 石、、力抗氧化劑。作為可使用之抗氧化劑,可列舉:酚系、 1f人磷系抗氡化劑。抗氧化劑可單獨使用或者將2種以 t ^ 使用。抗氧化劑之使用量相對於本發明之硬化性樹 成物中A之樹脂成分100重量份,通常為〇 008〜i重 25 201040203 量份’較佳為0.01〜0.5重量份。 作為抗氧化劑’例如可列嚴· μ ^ ^ # ^ ^ 歹】舉.酚系抗氧化劑、硫系抗 氧化劑、磷系抗氧化劑等。作為 巧时系抗氧化劑之具體例, 可例示.2,6 -二-第三丁基_對甲秘、τ甘 土耵f酚、丁基化羥基苯甲醚、2,6_ 二-第三丁基-對乙基苯紛 '十八燒基二第三丁基 -4-經基苯基)丙酸醋、異辛基_3_(3,5二第三丁基_4_經基二 基)丙酸醋、2,4-雙-(正辛硫基)_6_(4_麵基_3,5_二第三丁基 苯胺基)-1,3,5·三唤、2,4_雙[(辛硫基)甲基]•鄰甲盼等單盼 類;2,2,-亞曱基雙(4·甲基冬第三丁基苯紛)、2,2,_亞,基雙 (4-乙基-6-第三丁基苯酚)、4,4,_硫代雙(3_甲基_6第三丁基 苯酚)、4,4,-亞丁基雙(3_甲基_6_第三丁基苯酚)、三乙二醇_ 雙[3 (3-第二丁基_5_甲基_4_經基苯基)丙酸醋]、ι,6_己二醇_ 雙[3-(3,5-二-第三丁基羥基苯基)丙酸酯]、ν,ν·-六亞甲基 雙(3,5- 第三丁基-4-經基-苯丙酼胺)、2,2-硫代-二伸乙基 雙[3-(3,5-二-第三丁基_4_經基苯基)丙酸g旨]、3,5-二-第三丁 基-4-羥基苄基膦酸酯-二乙酯、3,9_雙[!,][_二曱基_2_{石_(3_ 第三丁基-4-羥基-5-甲基苯基)丙醯氧基}乙基]2,4,8,10-四氧 雜螺[5,5]十一烧、雙(3,5-二-第三丁基-4-經基节基續酸乙醋) 鈣等雙酚類;H3-三(2-甲基-4-羥基-5-第三丁基苯基)丁 烷、1,3,5-三甲基_2,4,6-三(3,5-二-第三丁基_4_羥基苄基) 苯、四-[亞甲基_3_(3,,5,_二-第三丁基_4,_羥基苯基)丙酸酯] 甲烷、雙[3,3,-雙-(4,-羥基-3'-第三丁基苯基)丁酸]二醇酯、 三_(3,5·二-第三丁基-4-羥基苄基)_異三聚氰酸、1,3,5-三 (3’,5·-二-第三丁基_4,·羥基苄基)_均三嗪-2,4,6-(1Η,3Η,5Η) 26 201040203 —酮、生育盼等咼分子型紛類。 _作為硫系抗氧化劑之具體例,可例示:3,3,硫代二丙酸 一(_十一烷基)酯、3,3,_硫代二丙酸二(十四烷基)酯、m 代二丙酸二(十八烷基)酯等。 作為磷系抗氧化劑之具體例,可例示:亞磷酸三苯酯、 亞磷酸二笨基異癸酯、亞磷酸苯基二異癸酯、亞磷酸三(壬 基苯基)酯、二異癸基季戊四醇亞磷酸酯、三(2,4_二_第三丁 基苯基)亞磷酸醋、環狀新戊烷四基雙(十八烷基)亞磷酸 醋、環狀新戊烷四基雙(2,4_二_第三丁基苯基)亞磷酸醋、環 狀新戊烷四基雙(2,4_二·第三丁基·4_甲基苯基)亞磷酸醋、 ^[2-第三丁基_6_甲基·4_{2_(十八烧氧基幾基)乙基}苯基] 虱亞磷酸酯等亞磷酸酯類;9,1〇_二氫_9氧雜-1〇_磷雜菲 氧化物、U)-(3,5-二-第三丁基_4_羥基节基)_9,1〇•二氫_9•氧 雜-ίο-磷雜菲_10_氧化物、1〇_癸氧基·9,1〇_二氫·9_氧雜_ι〇_ 磷雜菲-10-氧化物等氧雜磷雜菲氧化物類等。 G 该等抗氧化劑可分別單獨使用,亦可將2種以上組合 而併用*於本發明中尤佳為磷系抗氧化劑。 進而,於本發明之硬化性樹脂組成物Α中亦可視需要 而添加光穩定劑。 作為光穩定劑,較佳為受阻胺系光穩定劑,尤佳為 HALS ( Hindered Amine Light Stabilizer,受阻胺光穩定劑) 等。作為HALS並無特別限定,作為代表性者,可列舉: 二丁胺/1,3,5·三嗪/N,N,·雙(2,2,6,6-四甲基 _4_哌啶基 w,6_ 八亞曱基一胺與N-(2,2,6,6-四甲基-4-哌啶基)丁胺之聚縮合 27 201040203 物、丁二酸二甲酯-1-(2-羥基乙基)-4-羥基-2,2,6,6-四甲基哌 啶聚縮合物、聚[{6-(1,1,3,3-四甲基丁基)胺基-1,3,5-三〇秦 _2,4 - 一基}{(2,2,6,6-四曱基-4-旅咬基)亞胺基}六亞甲基 {(2,2,6,6-四甲基-4-哌啶基)亞胺基}]、雙(1,1-二甲基 乙基)-4-羥基苯基]曱基]丁基丙二酸雙(1,2,2,6,6_五甲基 派咬基)S旨、癸二酸雙(2,2,6,6-四曱基-4-哌啶基)酯、癸二酸 雙(1’2,2,6,6-五曱基_4 -η底咬基)酯、癸二酸雙(ι_辛氧基 -2,2,6,6-四曱基-4-哌啶基)酯、2-(3,5-二-第三丁基-4-羥基苄 基)-2-正丁基丙酸雙(1,2,2,6,6_五甲基_4哌啶基)酯等。 HALS可僅使用1種,亦可併用2種以上。 進而,於本發明之硬化性樹脂組成物A中可視需要而 添加黏合樹脂。作為黏合樹脂,可列舉:丁醛系樹脂、縮 醛系樹脂、丙烯酸系樹脂、環氧_尼龍系樹脂、 (Nunle-Butadiene Rubber,丁腈橡膠)_苯酚系樹脂、環氧 -NBR系樹脂、聚醯胺系樹脂、聚醯亞胺系樹脂、聚矽氧系 樹脂等,但並不限定於該等。黏合樹脂之調配量較佳為不 損及硬化物之阻燃性、耐熱性之範圍,相對於本發明之硬 化性樹脂組成物A中之樹脂成分1〇〇重量份,通常視 使用〇.05〜50重量份,較佳為〇.〇5〜20重量份。 了視需要而添加無 結晶二氧化石夕、炫 碳酸鈣、碳化矽、 塊滑石、尖晶石、 而成之珠粒等,但 於本發明之硬化性樹脂組成物A中 機填充劑。作為無機填充劑,可列舉: 融一氧化矽、氧化鋁、锆英石、矽酸鈣、 氮化矽、氮化硼、氧化锆、鎂撖欖石、 氧化鈦、滑石等粉體或者使該等球.形化 28 201040203 並不限定於該等。該等可單獨使用,亦可使用2種以上 該等無機填充劑之含量係使用在本發明之硬化性樹脂組成 =A中占95質量%以下之量。進而,於本發明之硬化性樹 脂組成物A中可添加:矽烷偶合劑、硬脂酸、棕櫚酸、硬 脂酸鈣、羧酸鋅(2_乙基己酸鋅、硬脂酸鋅、山窬酸鋅、肉 豆蔻酸辞) 等鋅化合物 或磷酸酯鋅(辛基磷酸鋅、十八烷基磷酸鋅等) 、界面活性劑、染料、顏料、紫外線吸收劑等The content of the cerium 3 phosphorus compound is preferably 0.6 times or less the total amount of the % oxygen resin component in the curable resin composition A of the present invention. When it exceeds 〇.6 D, there is a concern that the hygroscopicity and dielectric properties of the cured product are adversely affected. Further, in the curable resin composition A of the present invention, a stone or a force antioxidant may be used as needed. Examples of the antioxidant that can be used include a phenol-based and a 1f human phosphorus-based anti-deuteration agent. Antioxidants can be used alone or in two groups at t ^ . The amount of the antioxidant to be used is usually 〇 008 to i weight 25 201040203 parts by weight, preferably 0.01 to 0.5 parts by weight, based on 100 parts by weight of the resin component of the curable resin of the present invention. As the antioxidant, for example, a phenolic antioxidant, a sulfur-based antioxidant, a phosphorus-based antioxidant, or the like can be listed. As a specific example of the antioxidant, it can be exemplified as .2,6-di-t-butyl-p-methyl, t-glycol, butyl hydroxyanisole, 2,6-di-third Butyl-p-ethylbenzene, 'Eoctadecyldi-tert-butyl-4-phenylphenyl)propionic acid vinegar, isooctyl_3_(3,5-di-tert-butyl-4-yl) Base) propionic acid vinegar, 2,4-bis-(n-octylthio)_6_(4_face group_3,5_di-t-butylanilino)-1,3,5·three-call, 2,4 _bis[(octylthio)methyl]• 甲甲盼等单相类; 2,2,- fluorenyl bis(4·methyldongthylene butyl benzene), 2,2, _, Bis(4-ethyl-6-tert-butylphenol), 4,4,-thiobis(3-methyl-6 tetrabutylphenol), 4,4,-butylene bis (3_ Methyl-6_t-butylphenol), triethylene glycol_bis[3 (3-second butyl_5_methyl_4_pyridylphenyl)propionic acid vinegar], ι,6_己Diol _ bis [3-(3,5-di-tert-butylhydroxyphenyl)propionate], ν, ν·-hexamethylene bis (3,5-t-butyl-4- -Phenylbenzamide), 2,2-thio-di-extension ethyl bis[3-(3,5-di-t-butyl-4-yl-phenyl)propionic acid g], 3, 5-di-t-butyl-4-hydroxybenzyl Acid ester-diethyl ester, 3,9_bis[!,][_didecyl_2_{stone_(3_t-butyl-4-hydroxy-5-methylphenyl)propenyloxy}B 2,4,8,10-tetraoxaspiro[5,5] eleven-burning, bis(3,5-di-t-butyl-4-yl)-based ethyl acetate Phenols; H3-tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane, 1,3,5-trimethyl-2,4,6-tris (3,5- Di-tert-butyl-4-ylhydroxybenzyl)benzene, tetra-[methylene_3_(3,5,2-di-tert-butyl-4,-hydroxyphenyl)propionate] methane, Bis[3,3,-bis-(4,-hydroxy-3'-t-butylphenyl)butanoic acid]diol, tris-(3,5·di-t-butyl-4-hydroxybenzyl) Base) _ iso-cyanuric acid, 1,3,5-tris(3',5--di-t-butyl-4,-hydroxybenzyl)-s-triazine-2,4,6-(1Η , 3Η, 5Η) 26 201040203 — Ketones, fertility and other molecular types. _ As a specific example of the sulfur-based antioxidant, 3, 3, thiodipropionate mono(-undecyl) ester, 3,3,- thiodipropionate di(tetradecyl) ester can be exemplified. And m dioctadecyl dipropionate and the like. Specific examples of the phosphorus-based antioxidant include triphenyl phosphite, di-p-isodecyl phosphite, phenyl diisononyl phosphite, tris(nonylphenyl) phosphite, and diisoindole. Pentaerythritol phosphite, tris(2,4-di-t-butylphenyl) phosphite, cyclic neopentane tetrakis(bis-octadecyl)phosphite vinegar, cyclic neopentane tetrayl Bis(2,4-di-t-butylphenyl)phosphite sorbate, cyclic neopentane tetrakis(bis(2,4-di-tert-butyl-4-ylphenyl)phosphite vinegar, ^[2-Ternyl_6_methyl·4_{2_(octadecyloxy)ethyl}phenyl]phosphite such as phosphite; 9,1〇_dihydrogen_ 9 oxa-1〇_phosphaphenanthrene oxide, U)-(3,5-di-t-butyl-4-ylhydroxyl group)_9,1〇•dihydro_9•oxa-ίο-phosphine Phenanthrene _10_oxide, 1〇_癸oxy·9,1〇_dihydro·9_oxa_ι〇_ phosphaphenanthrene-10-oxide and other oxaphosphorus phenanthrene oxides. G These antioxidants may be used alone or in combination of two or more. In the present invention, a phosphorus-based antioxidant is particularly preferred. Further, a light stabilizer may be added to the curable resin composition of the present invention as needed. The light stabilizer is preferably a hindered amine light stabilizer, and more preferably a HALS (Hindered Amine Light Stabilizer). The HALS is not particularly limited, and as a representative, dibutylamine/1,3,5·triazine/N,N,·bis(2,2,6,6-tetramethyl_4_per pipe Polycondensation of pyridine-based w,6-octadecyl-monoamine with N-(2,2,6,6-tetramethyl-4-piperidyl)butylamine 27 201040203, dimethyl succinate-1 -(2-hydroxyethyl)-4-hydroxy-2,2,6,6-tetramethylpiperidine polycondensate, poly[{6-(1,1,3,3-tetramethylbutyl) Amino-1,3,5-trimethylhepta-2,4-yl}{(2,2,6,6-tetradecyl-4-bunkyl)imine}hexamethylene{( 2,2,6,6-tetramethyl-4-piperidinyl)imido}], bis(1,1-dimethylethyl)-4-hydroxyphenyl]indolyl]butylpropane Acidic bis(1,2,2,6,6-pentamethylpitrile) S, bis(2,2,6,6-tetradecyl-4-piperidyl) sebacate, bismuth Acidic bis(1'2,2,6,6-pentamethylene-7-η bottom base) ester, sebacic acid bis(ι_octyloxy-2,2,6,6-tetradecyl-4 -piperidinyl)ester, 2-(3,5-di-t-butyl-4-hydroxybenzyl)-2-n-butylpropionic acid bis(1,2,2,6,6-pentamethyl _4 piperidinyl) ester, etc. HALS may be used alone or in combination of two or more. Further, the curability of the present invention A binder resin may be added to the fat composition A as needed. Examples of the binder resin include butyral resin, acetal resin, acrylic resin, epoxy-nylon resin, and (Nunle-Butadiene Rubber, nitrile rubber). _ phenol resin, epoxy-NBR resin, polyamine resin, poly phthalimide resin, polyoxyn resin, etc., but is not limited thereto. The amount of the binder resin is preferably not impaired. The range of the flame retardancy and the heat resistance of the cured product is usually from 〇05 to 50 parts by weight, preferably from 〇〇.05 to 50 parts by weight, based on 1 part by weight of the resin component in the curable resin composition A of the present invention. 〇 5 to 20 parts by weight. Adding non-crystalline sulphur dioxide, sulphuric calcium carbonate, strontium carbide, talc, spinel, beads, etc., as needed, but the curable resin composition of the present invention A medium filler. As the inorganic filler, there may be mentioned: cerium oxide, aluminum oxide, zircon, calcium silicate, cerium nitride, boron nitride, zirconia, magnesia, titanium oxide, talc Wait for the powder or shape the ball. 28 201040203 and The content of the inorganic filler may be used alone or in an amount of 95% by mass or less based on the curable resin composition of the present invention = A. Further, the present invention is also used. The curable resin composition A may be added: a decane coupling agent, stearic acid, palmitic acid, calcium stearate, zinc carboxylate (zinc 2-ethylhexanoate, zinc stearate, zinc behenate, meat) Zinc acid or zinc phosphate (zinc octyl phosphate, zinc octadecyl phosphate, etc.), surfactant, dye, pigment, UV absorber, etc.

各種調配劑,各種熱硬化性樹脂。Various formulating agents, various thermosetting resins.

於將本發明之硬化性樹脂組成物A用於光半導體密封 劑之情形時,可視需要而添加螢光體。螢光體例如為具有 如下作用者:藉由吸收自藍光LED元件發出之藍光之一部 刀並發出經波長轉換之黃光而形成白光。使螢光體預先 分散於硬化性樹脂組成物中之後,密封光半導體。作為螢 光體並無特別限制,可使用先前公知之螢光體,例如可例 示:稀土元素之鋁酸鹽、硫代沒食子酸鹽、原矽酸鹽等。 更具體而言,可列舉:YAG ( Yttrium Aluminum Garnet,釔 鋁石榴石)螢光體、TAG ( Terbium Aluminum Garnet ’ 铽 鋁石榴石)螢光體、原矽酸鹽螢光體、硫代鎵酸鹽螢光體、 硫化物螢光體等螢光體,可例示:YA1〇3 : Ce、γ3Αΐ5〇ΐ2 : Ce、Y4A1209 : Ce、Y202S : Eu、Sr5(P04)3Cl : Eu、(SrEu)O. Al2〇3等。作為該螢光體之粒徑,係使用該領域中公知之粒 徑者,作為平均粒徑’較佳為1〜250 ,尤佳為2〜5〇 " m。於使用該等螢光體之情形時,其添加量相對於樹脂成分 100重量份,較佳為1〜80重量份,更佳為5〜6〇重量份。 29 201040203 本發明之硬化性樹脂組成物A係藉由將上述各成分均 勻混合而獲得。本發明之硬化性樹脂組成物A可以與先前 已知之方法相同之方法容易地製成其硬化物。例如可藉由 如下方式獲得本發明之硬化物:將本發明之環氧樹脂與硬 化劑以及視需要將硬化促進劑、含麟化合物、黏合樹脂、 無機填充材料及調配劑,視需要使用挤出機、捏合機、親 等充分混合直至均勻為止,獲得硬化性樹脂組成物,將該 硬化性樹脂組成物灌注、熔融後(於液狀之情形時無熔 融),使用注模或轉注成型機等進行成型,進而於8〇〜2〇〇 °C下加熱2〜1 〇小時。 又’可藉由如下方式製成本發明之硬化性樹脂組成物A 之硬化物:使本發明之硬化性樹脂組成物A視需要溶解於 甲苯、二曱苯、丙酮、甲基乙基酮、甲基異丁基酮、Ν,Ν· 二甲基甲醯胺、Ν,Ν-二曱基乙醯胺及Ν·曱基吡咯啶酮等溶 劑中,製成硬化性樹脂組成物清漆,使其含浸於玻璃纖維、 碳纖維、聚酯纖維、聚醯胺纖維、氧化鋁纖維及紙等基材 中,進行加熱並乾燥而獲得預浸體,將該預浸體熱壓成形。 此時之溶劑係使用在本發明之硬化性樹脂組成物與該溶劑 Α之此合物中通常占丨〇〜7〇質量0/。、較佳為丨5〜質量〇乂 之量。又,若為液狀組成物,則亦可直接例如以RTM方式 獲得含有碳纖維之環氧樹脂硬化物。 又’於以臈或片形狀使用本發明之硬化性樹脂組成物A 之情形時,具有B階段之可撓特性等優異之特性。此種膜 或片形狀之樹脂組成物係藉由如下方式而獲得:將本發明 30 201040203 之硬化性樹脂組成物A製成上述硬化性樹脂組成物清漆而 塗佈於剝離膜上,於加熱下去除溶劑後,進行B階段化。 該膜或片狀樹脂組成物可用作多層基板等中之接著劑(層 間絕緣層)。 硬化性樹脂組成物B (利用酸性硬化觸媒之陽離子硬 化) 使用酸性硬化觸媒而硬化之本發明之硬化性樹脂組成 物B含有光聚合引發劑或熱聚合引發劑作為酸性硬化觸 〇 媒。進而’亦可含有稀釋劑、聚合性單體、聚合性寡聚物、 聚合引發助劑、光敏劑等各種公知之化合物、材料等。又, 亦可視需要而含有無機填充材料、著色顏料、紫外線吸收 劑、抗氧化劑、穩定劑等各種公知之添加劑。 作為酸性硬化觸媒,較佳為陽離子聚合引發劑,尤佳 為光陽離子聚合引發劑。作為陽離子聚合引發劑,可列舉 具有鎖鹽、锍鹽、重氮鑌鹽等鏽鹽者,該等可單獨使用或 者以2種以上使用。 〇 、 活性能量線陽離子聚合引發劑之例為:金屬氟化硼錯 鹽以及三氟化硼錯合物(美國專利第3379653號)、雙(全 氟烷基磺醯基)甲烷金屬鹽(美國專利第3586616號)、芳 基重氮鏽化合物(美國專利第3708296號)、VIa族元素之 芳香族鏽鹽(美國專利第4058400號)、va族元素之芳香 族鏽鹽(美國專利第4069055號)、ina〜Va族元素之二羰 基螯合物(美國專利第4068091號)、硫代吼喃鑌鹽(美 國專利第4139655號)、MF6-陰離子之形態之VIb族元素 31 201040203 (美國專利第4161478號;Μ係選自磷、銻及砷中)、芳 基錡錯鹽(美國專利第4231951號)、芳香族鐫錯鹽及芳 香族錡錯鹽(美國專利第4256828號)、以及雙二苯基 銕基)苯基]硫醚-雙六氟金屬鹽(journal 〇f p〇lyiner Science,When the curable resin composition A of the present invention is used for a photo-semiconductor encapsulant, a phosphor may be added as needed. The phosphor is, for example, a person who forms white light by absorbing a portion of the blue light emitted from the blue LED element and emitting wavelength-converted yellow light. After the phosphor is previously dispersed in the curable resin composition, the photo-semiconductor is sealed. The phosphor is not particularly limited, and a conventionally known phosphor can be used, and examples thereof include an aluminate of a rare earth element, a thiogallate, an orthosilicate, and the like. More specifically, YAG (Yttrium Aluminum Garnet) phosphor, TAG ( Terbium Aluminum Garnet ' yttrium aluminum garnet) phosphor, orthosilicate phosphor, thiogallate Examples of the phosphor such as a salt phosphor or a sulfide phosphor include YA1〇3: Ce, γ3Αΐ5〇ΐ2: Ce, Y4A1209: Ce, Y202S: Eu, Sr5(P04)3Cl: Eu, (SrEu)O . Al2〇3 and so on. As the particle diameter of the phosphor, those having a particle diameter known in the art are used, and the average particle diameter ' is preferably from 1 to 250, particularly preferably from 2 to 5 Å " m. In the case of using such a phosphor, the amount thereof is preferably from 1 to 80 parts by weight, more preferably from 5 to 6 parts by weight, per 100 parts by weight of the resin component. 29 201040203 The curable resin composition A of the present invention is obtained by uniformly mixing the above components. The curable resin composition A of the present invention can be easily made into a cured product by the same method as previously known. For example, the cured product of the present invention can be obtained by using the epoxy resin and the hardener of the present invention and, if necessary, a hardening accelerator, a lining compound, a binder resin, an inorganic filler, and a compounding agent, if necessary, using extrusion. The kneading machine, the kneading machine, and the like are sufficiently mixed until uniform, and a curable resin composition is obtained, and the curable resin composition is poured and melted (there is no melting in the case of liquid), and is carried out by using an injection molding machine or a transfer molding machine. Molding, and then heating at 8 〇 to 2 ° ° C for 2 to 1 〇 hours. Further, the cured product of the curable resin composition A of the present invention can be obtained by dissolving the curable resin composition A of the present invention in toluene, diphenylbenzene, acetone, methyl ethyl ketone, and the like as needed. A curable resin composition varnish is prepared in a solvent such as isobutyl ketone, hydrazine, hydrazine dimethyl carbamide, hydrazine, hydrazine-dimercaptoacetamide or hydrazine decyl pyrrolidone. It is impregnated into a substrate such as glass fiber, carbon fiber, polyester fiber, polyamide fiber, alumina fiber, or paper, heated and dried to obtain a prepreg, and the prepreg is hot pressed. The solvent at this time is usually used in the composition of the curable resin composition of the present invention and the solvent, and usually accounts for 丨〇7 〇 mass 0/. Preferably, it is a quantity of 丨5~质量〇乂. Further, in the case of a liquid composition, an epoxy resin-containing cured product containing carbon fibers can be directly obtained, for example, by RTM. Further, when the curable resin composition A of the present invention is used in the form of a crucible or a sheet, it has excellent properties such as flexibility in the B-stage. The film or sheet-shaped resin composition is obtained by applying the curable resin composition A of the present invention 30 201040203 to the above-mentioned curable resin composition varnish, and applying it to a release film under heating. After the solvent is removed, the B stage is carried out. The film or sheet-like resin composition can be used as an adhesive (interlayer insulating layer) in a multilayer substrate or the like. The curable resin composition B (hardened by the cation of the acidic curing catalyst) The curable resin composition B of the present invention which is cured by using an acidic curing catalyst contains a photopolymerization initiator or a thermal polymerization initiator as an acid-curing ruthenium. Further, various known compounds and materials such as a diluent, a polymerizable monomer, a polymerizable oligomer, a polymerization initiation aid, and a photosensitizer may be contained. Further, various known additives such as an inorganic filler, a coloring pigment, an ultraviolet absorber, an antioxidant, and a stabilizer may be contained as needed. The acid curing catalyst is preferably a cationic polymerization initiator, and more preferably a photocationic polymerization initiator. The cationic polymerization initiator may be a rust salt such as a lock salt, a sulfonium salt or a diazonium salt, and these may be used singly or in combination of two or more. Examples of ruthenium, active energy line cationic polymerization initiators are: metal fluoride boron mis-salt and boron trifluoride complex (U.S. Patent No. 3,375,653), bis(perfluoroalkylsulfonyl)methane metal salt (USA) Patent No. 3,586,616), aryldiazonium rust compound (U.S. Patent No. 3,708,296), aromatic rust salt of Group VIa element (U.S. Patent No. 4,058,400), aromatic rust salt of va group element (U.S. Patent No. 4,609,905) a dicarbonyl chelate of the ina~Va group element (U.S. Patent No. 4,406,091), a thiopurine salt (U.S. Patent No. 4,139,655), and a MF6-anion form of the VIb group element 31 201040203 (US Patent No. No. 4,161,478; lanthanide selected from phosphorus, lanthanum and arsenic), aryl sulfonium salt (U.S. Patent No. 4,231,951), aromatic sulfonium salt and aromatic sulfonium salt (U.S. Patent No. 4,256,828), and double Phenyl fluorenyl) phenyl] thioether-bis hexafluorometal salt (journal 〇fp〇lyiner Science,

Polymer Chemistry,第 2 卷,1789 項(1984 年))。此外, 亦可使用鐵化合物之混合配位基金屬鹽以及矽烷醇_鋁錯合 物。 又’作為具體例’可列舉:「Adeka Optomer SP150」、 「Adeka Optomer SP170」(任一者均為旭電化工業公司製 造)、「UVE-1014」(General Electronics 公司製造)、 「CD-1012」(Sartomer 公司製造)、「RP-2074」(Rhodia 公司製造)等。 該陽離子聚合引發劑之使用量相對於環氧樹脂成分 100重量份,較佳為0 01〜50重量份,更佳為〇丨〜1〇重量 份。 於本發明之硬化性樹脂組成物B中,可與陽離子聚合 引發劑併用而使用1種或2種以上之聚合引發助劑、以及 視需要使用光敏劑。 作為聚合引發助劑之具體例,可列舉:安息香、二苯 乙二酮 '安息香甲醚、安息香異丙醚、苯乙酮、2,2-二甲氧 基_2-笨基笨乙酮、1,1-二氣苯乙酮、1-羥基環己基苯基酮、 2-曱基-1-(4-甲硫基苯基)-2-嗎啉醇丙烷-1·酮、N,N-二甲基 胺基笨乙_、2-曱基蒽醌、2-乙基蒽醌、2_第三丁基蒽醌、 1-氯蒽醌、2-戊基蒽醌、2-異丙基噻噸酮、2,4-二曱基噻噸 32 201040203 酮、2,4-二乙基嗟嘴酮、2,4-二異丙基售噸酮、苯乙酮二曱 基縮酮、二苯曱酮、4-甲基二苯甲酮、4,4'-二氣二苯甲酮、 4,4·-雙(二乙基胺基)二苯甲酮、米其勒酮(Michler's ketone ) 等聚合引發劑。聚合引發劑等之聚合引發助劑之使用量相 對於可進行光自由基聚合之樹脂成分100質量份,為〇.〇1 〜30質量份,較佳為0.1〜10質量份。 又,作為光敏劑之具體例’可列舉:蒽、2-異丙基噻噸 酮、2,4-二曱基噻噸酮、2,4-二乙基噻噸酮、2,4-二異丙基 Ο °塞噸酮、吖。定撥、吖咬黃、膦R、苯并黃素、硫代續素丁、 茈、N,N-二曱基胺基苯甲酸乙酯、Ν,Ν-二甲基胺基苯曱酸 異戊醋、三乙醇胺、三乙胺等。光敏劑之使用量相對於環 氧樹脂成分100質量份,為0.01〜30質量份,較佳為〇1 〜1 〇質量份。 進而,於本發明之硬化性樹脂組成物Β中,可視需要 而添加無機填充劑或矽烷偶合材料、脫模劑、顏料等各種 調配劑,各種熱硬化性掛脂之各種調配劑。作為具體之例 ❹如上所述。 本發明之硬化性樹脂組成物Β係藉由將各成分均勻混 合而獲得。又’亦可使本發明之硬化性樹脂組成物Β均句 溶解於聚乙二醇單乙醚或環己酮、丁内酯等有機溶劑中 後,藉由乾燥而去除溶劑後使用。此時之溶劑於本發明之 硬化性樹脂組成物Β與該溶劑之混合物中通常為1〇〜7〇質 量%,較佳為15〜70質量%。 本發明之硬化性樹脂組成物Β可藉由加熱及/或紫外線 33 201040203 照射而硬化(例如’參考文獻:總論環氧樹脂第1卷基 礎篇Ip82-84),但此時之熱量及/或紫外線照射量依存於 硬化性樹脂組成物B之組成而有所不同,因此根據各自之 組成而決定硬化條件。基本上,只要為硬化物可表現出在 使用目的中所必需之強度的硬化條件即可。通常,該等環 孔秘月曰系組成物難以僅藉由光照射而完全硬化,因此於要 求耐熱性之用途中必需在光照射後藉由加熱而使反應完全 結束。又,由於必需使光硬化時之照射光穿透至細部,因 此期望本發明之環氧樹脂及硬化性樹脂組成物B中透明性 較高之化合物及組成物。 於光照射後進行加熱之情形時,可於通常之硬化性樹 月曰組成物B之硬化溫度區域進行。例如較適宜為常溫〜1 C下30分鐘〜7天之範圍。雖由於硬化性樹脂組成物b之 調配而發生變化,但越為特別高之溫度區$,越對光照射 後之硬化促進有效果,短時間之熱處理即有效果。又,越Polymer Chemistry, Vol. 2, 1789 (1984)). Further, a mixed ligand metal salt of an iron compound and a stanol-aluminum complex may also be used. In addition, as a specific example, "Adeka Optomer SP150", "Adeka Optomer SP170" (any one is manufactured by Asahi Kasei Kogyo Co., Ltd.), "UVE-1014" (manufactured by General Electronics Co., Ltd.), "CD-1012" (manufactured by Sartomer Co., Ltd.), "RP-2074" (manufactured by Rhodia Corporation), etc. The cationic polymerization initiator is used in an amount of preferably from 0 to 50 parts by weight, more preferably from 10,000 to 1 part by weight, based on 100 parts by weight of the epoxy resin component. In the curable resin composition B of the present invention, one or two or more kinds of polymerization initiation aids may be used in combination with the cationic polymerization initiator, and a photosensitizer may be used as needed. Specific examples of the polymerization initiation aid include benzoin, diphenylethylenedione benzoin methyl ether, benzoin isopropyl ether, acetophenone, 2,2-dimethoxy-2-phenyl-acetophenone, 1,1-dioxaacetophenone, 1-hydroxycyclohexyl phenyl ketone, 2-mercapto-1-(4-methylthiophenyl)-2-morpholinol propane-1·one, N, N - dimethylamino stupyl, 2-mercaptopurine, 2-ethylhydrazine, 2_t-butylhydrazine, 1-chloroindole, 2-pentylhydrazine, 2-isopropyl Ketoxanone, 2,4-dimercaptothioxene 32 201040203 ketone, 2,4-diethylpyrone, 2,4-diisopropyl ketene, acetophenone didecyl ketal, Diphenyl ketone, 4-methylbenzophenone, 4,4'-dibenzobenzophenone, 4,4·-bis(diethylamino)benzophenone, Michler's (Michler's Ketone) and other polymerization initiators. The amount of the polymerization initiator to be used in the photo-radical polymerization is from 0.1 to 30 parts by mass, preferably from 0.1 to 10 parts by mass, per 100 parts by mass of the resin component which can be photo-radically polymerized. Further, specific examples of the photosensitizer include: hydrazine, 2-isopropylthioxanthone, 2,4-dimercaptothioxanthone, 2,4-diethylthioxanthone, 2,4-di Isopropyl Ο ° ketoxime, hydrazine. Ding, bite yellow, phosphine R, benzoflavin, thio- continuation, hydrazine, ethyl N,N-didecylaminobenzoate, hydrazine, hydrazine-dimethylaminobenzoic acid Valeric vinegar, triethanolamine, triethylamine, and the like. The amount of the photosensitizer to be used is 0.01 to 30 parts by mass, preferably 〇1 to 1 part by mass, based on 100 parts by mass of the epoxy resin component. Further, in the curable resin composition of the present invention, various preparation agents such as an inorganic filler, a decane coupling material, a release agent, and a pigment, and various types of thermosetting greases may be added as needed. As a specific example, ❹ is as described above. The curable resin composition of the present invention is obtained by uniformly mixing the components. Further, the curable resin composition of the present invention may be dissolved in an organic solvent such as polyethylene glycol monoethyl ether or cyclohexanone or butyrolactone, and then the solvent is removed by drying and used. The solvent at this time is usually from 1 to 7 〇% by mass, preferably from 15 to 70% by mass, based on the mixture of the curable resin composition of the present invention and the solvent. The curable resin composition of the present invention can be hardened by irradiation with heat and/or ultraviolet rays 33 201040203 (for example, 'Reference: General Epoxy Resin Volume 1 Basics Ip82-84), but the heat and/or at this time Since the amount of ultraviolet irradiation varies depending on the composition of the curable resin composition B, the curing conditions are determined according to the respective compositions. Basically, it is sufficient that the hardened material exhibits a hardening condition of the strength necessary for the purpose of use. In general, it is difficult to completely cure the composition of the cyclic pores, and it is necessary to completely cure the reaction by heating after the light irradiation in the application requiring heat resistance. Further, since the irradiation light at the time of photohardening must be penetrated to the fine portion, the epoxy resin and the curable resin composition B of the present invention are desired to have a compound having high transparency and a composition. When heating is performed after light irradiation, it can be carried out in the hardening temperature region of the usual hardenable tree sap composition B. For example, it is more suitable for a range of 30 minutes to 7 days at a normal temperature of ~1 C. Although the temperature is changed by the blending of the curable resin composition b, the more particularly the temperature zone $ is effective for the hardening promotion after light irradiation, and the heat treatment for a short period of time is effective. Again, the more

為低溫’則越需要長時間之熱處理。藉由此種熱後硬化, 亦出現成為老化處理之效果。 使該等硬化性樹脂組成物B硬化而獲得之硬化t 之形狀亦根㈣途而可採取各種,因此並無特別限定,^ 如可製成膜狀、片狀、塊狀等形狀。成形之方法根據所, 用之部位、構件而有所X円 .., ’所不同’例如可列舉:鑄造法、注; 法、網版印刷法、雒泠i ^ 疋塗法、喷霧法、轉印法、分注器方, 等,但並不限定於兮笪 ' Μ 4 ’,、要採用為獲得所需之形狀而 當之方法即可。成你{挞 ^模八可使用研磨玻璃、硬質不鏽鋼; 34 201040203 磨板、聚碳酸醋板、聚對笨二甲酸乙二醋板、聚甲基丙烯 酸甲酉曰板等。又,為提高成形模具與硬化性樹脂組成物B 之脫模性,可使用聚對苯二甲酸乙二酯膜、聚碳酸酯膜、 聚氣乙烯膜、$乙烯膜、聚四氟乙烯膜、聚丙烯膜、聚醯 亞胺膜等。 例如於用於陽離子硬化性光阻劑時,首先,將溶解於 聚乙一醇單乙醚或環己酮、丁内酯等有機溶劑中之硬化The lower the temperature, the longer the heat treatment is required. With such heat-hardening, the effect of aging treatment also occurs. The shape of the hardening t obtained by curing the curable resin composition B is also various (4), and is not particularly limited. For example, it can be formed into a film shape, a sheet shape, a block shape or the like. The method of forming may be based on the parts and components used, and the 'different' may be, for example, casting method, injection method, screen printing method, 雒泠i ^ 疋 coating method, spray method. , transfer method, dispenser, etc., but not limited to 兮笪 ' Μ 4 ', to use the method to obtain the desired shape. You can use the ground glass or hard stainless steel; 34 201040203 Grinding plate, polycarbonate plate, poly-p-formic acid diacetate plate, polymethyl methacrylate plate. Moreover, in order to improve the mold release property of the molding die and the curable resin composition B, a polyethylene terephthalate film, a polycarbonate film, a polyethylene film, a vinyl film, a polytetrafluoroethylene film, or the like can be used. A polypropylene film, a polyimide film, or the like. For example, when used in a cationic curable photoresist, first, it is hardened by dissolving in an organic solvent such as polyethyl ether monoethyl ether or cyclohexanone or butyrolactone.

性樹脂組成物B’利用網版印刷、旋塗法等方法以5〜160 " m之膜厚塗佈於銅镇積層板或陶竞基板、玻璃基板等基板 使塗膜於60〜li〇c下預備乾燥。對所得基板上之硬化 !·生樹月曰組成物B ’通過描緣出所需圖案之底片而照射紫外線 (例如低壓水銀燈、高壓水銀燈、超高壓水銀燈、氣氣燈、 雷射光等)’繼而,於7〇〜l2(rc下進行曝光後烘烤處理。 ’以聚乙二醇單乙喊等溶劑將未曝光部分溶解去除(顯 〜),進而,如有必要則藉由紫外線之照射及/或加熱(例 = 100〜2〇〇t下0.5〜3小時)而進行充分之硬化,從而獲 知更化物。亦可以上述方式獲得印刷配線板。再者,上述 方法係於負型^阻劑之情形,但本發明之硬化性樹脂组成 物B亦可用作正型光阻劑。 將本發明之硬化性樹脂組成4勿A及硬化性樹脂組成物 硬化而成之硬化物可用於以光學零件材料為代表之各種 用途。所谓光學用材料,通常係指於可見光、紅外線、紫 線X射線及雷射等之光通過該材料中之用途中所使用之 # 料。更具體而言,除燈型、SMD (surface_Mount Device, 35 201040203 表面黏著元件)型等LED用密封材料以外,於顯示體相關 領域中可列舉:以液晶顯示器之基板材料、導光板、稜鏡 片、偏向板、相位差板、視角補償膜、接著劑及偏光元件 保護膜為代表之液晶用膜等;期待作為下一代平板顯示器 之彩色PDP ( Plasma Display Pane卜電漿顯示器)之密封 材料、抗反射膜、光學補償膜、外罩材料、前玻璃之保護 膜、前玻璃代替材料及接著劑等;LED顯示裝置中所使用 的LED之模具材料、LED之密封材料、前玻璃之保護膜、 前玻璃代替材料及接著劑等;電漿定址液晶(pALC,plasma Address Liquid Crystal )顯示器中之基板材料、導光板、稜 鏡片、偏向板、相位差板、視角補償膜、接著劑及偏光元 件保遵膜等;有機EL ( Electro-Luminescence,電致發光) 顯示器中之前玻璃之保護膜、前玻璃代替材料及接著劑 等;場發射顯示器(FED,Field Emission Display)中之各 種膜基板、前玻璃之保護膜、前玻璃代替材料及接著劑等。 於光記錄領域中可列舉:VD ( Video Disc,視訊光碟)、 CD ( Compact Disc,光碟)/CD-ROM ( Read-Only Memory, 唯讀記憶體)、CD-R( Recordable,可記錄)/RW( Rewritable, 可重寫記錄)、DVD ( Digital Vedio Disk,數位視訊光碟) -R/DVD-RAM( Random-access memory,隨機存取記憶體)、 MO ( Magneto-Optical,磁光碟)/MD ( Mini Disk,迷你光 碟)、PD ( Phase change Disc,相變化光碟)及光學卡用光 碟基板材料、光碟機讀取鏡頭、保護膜、密封材料及接著 劑等。 36 201040203 t光學機器領域中可列舉:靜態相機之透鏡用材料、 取景讀鏡、目標稜鏡、取景器外殼及受光感測器部等; 攝像機之攝影透鏡及取景器等;投影電視之投射透鏡、保 j膜在封材料及接著劑等;光感測機器之透鏡用材料、 在封材料、接著劑及膜等。於光學零件領域中可列舉.光 通信系統中之光開關周邊之纖維材料、透鏡、光學波導、 2件之密封材料及接著劑等;光連接器周邊之光纖材料、 Ο Ο 圈、密封材料及接著劑等;光被動零件或光電路零件中 之透鏡、光學波導、LED之密封材料、CCD( Charge ,’電荷輕合元件)之密封材料及接著劑等;光電積體 ,路(OEIC,〇pt〇-Electronic Integrated Circuit)周邊之美 板材料、纖維材料、元件之密封材料及接著劑等。於光i 領域中可列舉:裝都顯示器用照明、光導等;工業用途之 感測器類及顯示、標記類等;通信基礎設施用及家庭内之 數位機器連接用之光纖等。於半導體積體電路周邊材料中 可列舉:LSI (Large Scale Integration,大型積體電路)或 超LSI材料用之微影技術用之光阻劑材料等。於汽The resin composition B' is applied to a substrate such as a copper laminated board or a ceramic substrate or a glass substrate by a screen printing method, a spin coating method or the like at a film thickness of 5 to 160 " m to form a coating film at 60 to li. Prepare for drying under c. Hardening on the obtained substrate! The raw tree composition B' is irradiated with ultraviolet rays (for example, a low-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high pressure mercury lamp, a gas lamp, a laser beam, etc.) by drawing a film of a desired pattern. , after exposure and baking treatment at 7 〇 to l2 (rc). 'Dissolve the unexposed portion by a solvent such as polyethylene glycol, and then, if necessary, irradiate with ultraviolet rays and / or heating (for example, 0.5 to 3 〇〇t for 0.5 to 3 hours) and sufficient hardening to obtain a modified product. The printed wiring board can also be obtained in the above manner. Further, the above method is based on a negative resist. In this case, the curable resin composition B of the present invention can also be used as a positive photoresist. The cured product of the curable resin composition 4 of the present invention and the hardenable resin composition can be used for optical use. The material of the part is representative of various uses. The term "optical material" generally refers to the material used in the use of light such as visible light, infrared light, purple X-rays and laser light, etc. More specifically, Light type, S Other than the LED sealing material such as the MD (surface_Mount Device, 35 201040203 surface-adhesive element) type, the substrate material of the liquid crystal display, the light guide plate, the cymbal sheet, the deflecting plate, the phase difference plate, and the viewing angle compensation are exemplified. A film, an adhesive, and a polarizing element protective film are representative of a liquid crystal film, etc., and are expected to be a sealing material, an antireflection film, an optical compensation film, a cover material, and a color PDP (Plasma Display Panel) of a next-generation flat panel display. Front glass protective film, front glass substitute material and adhesive; LED mold material used in LED display device, LED sealing material, front glass protective film, front glass substitute material and adhesive; etc.; plasma addressing Substrate materials, light guide plates, ruthenium plates, deflecting plates, phase difference plates, viewing angle compensation films, adhesives, and polarizing elements in liquid crystal (pALC) plasma display liquid crystal displays; organic EL (Electro-Luminescence) Luminescence) the protective film of the glass before the display, the front glass instead of the material and the adhesive; Various film substrates in the display (FED, Field Emission Display), protective film for front glass, front glass substitute materials and adhesives, etc. In the field of optical recording, VD (Video Disc), CD (Compact Disc) , CD-ROM (Read-Only Memory), CD-R (Recordable), RW (Rewritable), DVD (Digital Vedio Disk) - R/DVD-RAM (Random Access Memory), MO ( Magneto-Optical)/MD (Mini Disk), PD (Phase Change Disc) and Optical Card Use a disc substrate material, an optical disk drive to read a lens, a protective film, a sealing material, and an adhesive. 36 201040203 tIn the field of optical equipment, the lens material for static camera, finder mirror, target 稜鏡, viewfinder case and light sensor part; camera lens and viewfinder of camera; projection lens of projection TV And the sealing material and the adhesive agent for the j-film, the lens material for the light sensing device, the sealing material, the adhesive, and the film. In the field of optical components, the fiber material around the optical switch in the optical communication system, the lens, the optical waveguide, the sealing material of two pieces, the adhesive, and the like; the optical fiber material around the optical connector, the Ο ring, the sealing material, and Receptive agents, etc.; lenses in optical passive parts or optical circuit parts, optical waveguides, sealing materials for LEDs, sealing materials and adhesives for CCD (Charge, 'Charge Light Combination Components), etc.; Optoelectronics, OEIC, 〇 pt〇-Electronic Integrated Circuit) is a sheet of material, a fiber material, a sealing material for components, and an adhesive. In the field of Yuguang i, there are lighting, light guides, etc. for displays, sensors, display and marking for industrial use, and optical fibers for communication infrastructure and digital devices in the home. Examples of the material surrounding the semiconductor integrated circuit include a LSI (Large Scale Integration) or a photoresist material for lithography for ultra-LSI materials. Yuqi

送機領域中可列舉:汽車用之燈管反射罩、軸承護圈、J 輪部分、耐#塗層、開關部分、頭燈、引擎内部零件、電In the field of delivery, the lamp reflector, the bearing retainer, the J wheel part, the #coating, the switch part, the headlight, the internal parts of the engine, and the electric

Si:、各種内外組件、驅動引擎、煞車油箱、汽車用防 鏽鋼板、室内裝飾面板、内包裝材料、保護/捆紮、 燃料軟管、汽車燈及玻璃代替品等;鐵路車辆用之複層玻 璃等;飛機之構造材料之陳賦予劑、引擎周邊構件、保 遵/捆紮用線束及耐㈣層等。於建築領域中可列舉·" 37 201040203 裝/加工料料、電氣外罩、片、玻獅間膜、玻璃代替品 及太陽電池周邊材料等。於農業用中可列舉溫室覆蓋用膜 等。作為下-代之光、電子功能有機材料,可列舉:有機 件周邊材料、有機光折射元件、光.光轉換器件即光放 大-件、光運算元件 '有機太陽電池周邊之基板材料、纖 維材料、元件之密封材料及接著劑等。 作為密封劑,可列舉:電容器、電晶體、二極體、發 光二極體、IC ( Integrated Circuit,積體電路)及⑶等中 所使用之灌注、浸潰及轉注成型密封;U W類之咖 (Chip 0n Board,板上晶片封裝)、c〇f (⑶卩〇n f如, 覆晶薄膜封裝)以及TAB ( Tape Aut〇mated Bon—,捲帶 式自動接合)#中所使用之灌注密封;倒裝晶片等中所使 用之底填劑;BGA( Ball Grid Array’球狀拇格陣列)或⑽ (Chip Scale Package’晶片尺寸封裝)等ic封裝類安裝時 之密封(增強用底填劑)等。 作為光學用材料之其他用途,可列舉使用硬化性樹脂 組成物A或硬化性樹脂組成物B之通常用途,例如可列舉曰: 接著劑、塗料、塗佈劑、成形材料(包括片、膜、FRp(F^ Reinforced Plastics ’纖維強化塑膠)等)、絕緣材料(包 括印刷基板、電線被覆等)、密封劑及添加於其他樹脂= 中之添加劑等。將本發明之硬化性樹脂組成物A或硬化性 樹脂組成物B用作添加於其他樹脂中之添加劑之情形,例 如可列舉.於密封材料或者基板用氰酸酯樹脂組成物中用 作硬化劑之情形、或用於丙稀酸自旨系樹脂等中作為光阻劑 38 201040203 。作為接著劑,可列舉:土木用、建築用、 秦用、醫療用及電子材料用。該等之中作 用硬化劑之情形 汽車用、通常業 為電子材料用之接著劑,可列舉:增層基板等多層基板之 層間接著劑、晶粒接著劑及底填劑等半導體用接著劑、BGa 增強用底填劑、異向性導電膜(Acf,Anisotropic conductive Film)及異向性導電膏(Acp,Anis〇tr〇pic ⑽paste) 等安裝用接著劑等β [實施例]Si:, various internal and external components, drive engines, brake oil tanks, rust-proof steel plates for automobiles, interior decorative panels, inner packaging materials, protection/bundling, fuel hoses, automobile lamps and glass substitutes; Glass, etc.; the agent for the structural materials of the aircraft, the peripheral components of the engine, the harness for the compliance/bundling, and the resistance layer (four). In the field of construction, please refer to " 37 201040203 Packing/Processing Materials, Electrical Covers, Sheets, Glass Lions Films, Glass Substitutes, and Solar Cell Peripherals. For agricultural use, a film for greenhouse covering or the like can be cited. Examples of the lower-generation light and electronic functional organic materials include organic material peripheral materials, organic light-refracting elements, optical and optical conversion devices, that is, optical amplification devices, optical computing elements, substrate materials around organic solar cells, and fiber materials. , sealing materials for components and adhesives. Examples of the sealant include a capacitor, a transistor, a diode, a light-emitting diode, an IC (Integrated Circuit), and (3), etc., which are used for infusion, dipping, and transfer molding; UW type coffee (Chip 0n Board, on-chip package), c〇f ((3)卩〇nf, for example, flip-chip package) and TAB (Tape Aut〇mated Bon-) Underfill used in flip chip, etc.; BGA (Ball Grid Array) or (10) (Chip Scale Package') package for ic package mounting (enhanced underfill) Wait. For other uses of the material for optics, a general use of the curable resin composition A or the curable resin composition B is exemplified, and examples thereof include a binder, a coating material, a coating agent, and a molding material (including a sheet, a film, and the like). FRp (F^ Reinforced Plastics), insulating materials (including printed boards, wire coatings, etc.), sealants, and additives added to other resins. When the curable resin composition A or the curable resin composition B of the present invention is used as an additive to be added to other resins, for example, it can be used as a hardener in a sealing material or a cyanate resin composition for a substrate. In the case of the use of acrylic acid or the like as a photoresist 38 201040203. Examples of the adhesive include civil engineering, construction, Qin, medical, and electronic materials. In the case of the above-mentioned hardener, the adhesive for the electronic material is usually used for automobiles, and examples thereof include an interlayer adhesive for a multilayer substrate such as a build-up substrate, a semiconductor adhesive such as a die attach agent and a primer, BGa reinforcing underfill, anisotropic conductive film (Acf, Anisotropic conductive film), and an anisotropic conductive paste (Acp, Anis〇tr〇pic (10) paste), etc., such as an adhesive for mounting [Example]

其次’利用實施例對本發明進行更具體之說明,以下, 只要無特別說明,則份為重量份。再者,本發明並不限定 於該等實施例。又’於實施例中,環氧當量係使用US κ-7236 進行測定’黏度係於25。(:下使用Ε型黏度計進行測定。又, 氣相層析法(Gas Chromatography,以下稱作r gc」)中之 分析條件為:分離管柱使用HP5-MS ( 0.25 mm I.D.X15 m, 膜厚0 · 2 5 // m ) ’將管柱供箱溫度設定為初始溫度1 〇 〇。〇, 以每分鐘15°C之速度使其升溫,於300。〇下保持90分鐘。 又,將氦氣作為載流氣體。進而,凝膠滲透層析法(GelNext, the present invention will be more specifically described by way of examples, and the parts are by weight unless otherwise specified. Furthermore, the invention is not limited to the embodiments. Further, in the examples, the epoxy equivalent was measured using US κ-7236 and the viscosity was at 25. (The measurement was carried out using a Ε-type viscometer. In addition, the gas chromatographic method (Gas Chromatography, hereinafter referred to as r gc)) was analyzed using HP5-MS (0.25 mm IDX15 m, membrane). Thickness 0 · 2 5 // m ) 'Set the column supply temperature to the initial temperature of 1 〇〇. 〇, raise the temperature at 15 ° C per minute, at 300. Hold for 90 minutes. Helium is used as a carrier gas. Further, gel permeation chromatography (Gel)

Permeation Chromatography,以下稱作「GPC」)之測定如 下所述。管柱為 Shodex SYSTEM-21 管柱(KF_8〇3L、 KF-802.5 (X2根)、KF-802),連結洗提液為四氫呋喃, 流速為1 ml/min.,管柱溫度為40°C,又,檢測係以ri進 行,校準曲線使用Shodex製標準聚苯乙稀。 實施例1 於具備攪拌機、回流冷卻管、攪拌裝置、迪恩_斯達克 39 201040203 一邊添加 (Dean-Stark)管之燒航中’一邊實施氮氣沖 150份甲苯、62.6份下述式(5)The measurement of Permeation Chromatography (hereinafter referred to as "GPC") is as follows. The column is Shodex SYSTEM-21 (KF_8〇3L, KF-802.5 (X2), KF-802), the eluent is tetrahydrofuran, the flow rate is 1 ml/min., the column temperature is 40 °C. Further, the detection system was performed with ri, and the calibration curve was made of standard polystyrene manufactured by Shodex. Example 1 With a stirrer, a reflux cooling tube, a stirring device, and a Dean-Stark 39 201040203, a nitrogen purge was carried out while 150 parts of toluene, 62.6 parts of the following formula (5) )

HCS /OHHCS / OH

Et Et (5) (perst〇rp製造,二(三羥甲基丙烷 Di-TMP )、126份3-環己烯甲酸、2份對甲苯續酸,於I熱 回流下以10小時-邊去除水一邊進行反應。反應結束後, 以50份10%碳酸氫鈉水溶液水洗2次,進而將所獲得之有 機層以50份水水洗2次,然、後制旋轉蒸發器將有機溶劑 濃縮,藉此獲得165份本發明之烯烴樹脂(D_〇 。形狀為 液狀,由氣相層析法所得之純度為92%,由凝膠滲透層析 法所付之分析結果確認為9 6 %之純度。 實施例2 於具備攪拌機、回流冷卻管、攪拌裝置之燒槪中,— 邊實施氮氣沖洗,一邊添加丨5份水、0 95份12_鎢磷酸、 0.78份磷酸氫二鈉、2.7份二硬化牛油烷基二曱基乙酸銨 (Lion Akzo 製造,50〇/〇 己烷溶液,Arquad 2HT-Acetate ), 生成鎢酸系觸媒後’添加90份甲苯、85份實施例1中所獲 得之烯煙樹脂D-1 ’將該混合溶液升溫至50°c,一邊激烈 攪拌’一邊添加55份35重量%過氧化氫水,直接於50T: 下攪拌13小時。以GC確認到反應之進行,結果反應結束 201040203 後之基質之轉化率為>99%,原料峰消失。 繼而,卩1重量%氫氧化納水溶液加以中和後,添加 25份20重量%硫代硫酸鋼水溶液進行3〇分鐘授摔,然後 靜置。取出分離為2層之有機層,向其中添加10份矽膠 ("Wakogel C-3 00 ’和光姊缠丁进·制、从、 ,,屯樂工業製造)、20份活性碳(norit 製造 ’ CAP SUPER )、20 afc、袖 L / ττ . / /閏土( Hojun 製造,Bengel SH ), 於室溫下攪拌!小時後,逸 傻進仃過濾。將所獲得之濾液以1〇〇 份水進行3次水洗,白邮從^ Ο 獲传之有機層中蒸德去除有機溶 劑’藉此獲得99份以由下、十.斗^、 由下迷式(6)所表示之化合物為主 成分的本發明之環氧樹脂(Ερ^Et Et (5) (manufactured by perst〇rp, bis(trimethylolpropane Di-TMP), 126 parts of 3-cyclohexenecarboxylic acid, 2 parts of p-toluene acid, removed by heat for 10 hours under I reflux After the reaction was completed, the mixture was washed twice with 50 parts of a 10% aqueous sodium hydrogencarbonate solution, and the obtained organic layer was washed twice with 50 parts of water, and then the organic solvent was concentrated by a rotary evaporator. Thus, 165 parts of the olefin resin of the present invention (D_〇 was obtained in a liquid form, and the purity obtained by gas chromatography was 92%, and the analysis result by gel permeation chromatography was confirmed to be 96%. Purification Example 2 In a crucible equipped with a stirrer, a reflux cooling tube, and a stirring device, while adding nitrogen gas, adding 5 parts of water, 0 95 parts of 12-tungstophosphoric acid, 0.78 parts of disodium hydrogen phosphate, and 2.7 parts. Di-hardened tallow alkyl dimercaptoacetic acid ammonium (manufactured by Lion Akzo, 50 〇 / 〇 hexane solution, Arquad 2HT-Acetate), after the formation of tungstic acid-based catalyst, 'add 90 parts of toluene, 85 parts of Example 1 The obtained olefin resin D-1 'heated the mixed solution to 50 ° C, and added 55 parts while stirring vigorously 3 5 wt% of hydrogen peroxide water was stirred for 13 hours under 50T: The reaction was confirmed by GC, and as a result, the conversion of the substrate after the end of the reaction 201040203 was >99%, and the peak of the raw material disappeared. After neutralization of the aqueous solution of sodium hydroxide, 25 parts of a 20% by weight aqueous solution of thiosulfate steel was added for 3 minutes, and then left to stand. The organic layer separated into 2 layers was taken out and 10 parts of silicone was added thereto (" Wakogel C-3 00 'and 姊 姊 进 · , , , , , , , , , , , , , , , , , , , , , , , , 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 Manufactured, Bengel SH), stirred at room temperature! After an hour, the sputum was filtered and filtered. The obtained filtrate was washed 3 times with 1 part of water, and the white post was steamed from the organic layer obtained from ^ Ο The organic solvent is removed, thereby obtaining 99 parts of the epoxy resin of the present invention containing the compound represented by the following formula (6) as a main component (Ερ^).

仆又1/承龙|多’J厂/] 測定結果,確認 ,GC測定中純Servant 1/Chenglong|Multi-J Factory/] Measurement results, confirmation, pure in GC measurement

孔衡脂之G 含有98%之式(6)之 月朱的化合物 度為90%。又,環氣卷Θ 田 1為 201 g/eq 實施例3 EIM )使用105份矽膠 ’使用乙酸乙酯:己烷 對於15份所獲得 / 仟之環氧樹脂( (Wakogel C-300,去 f光純藥製造) 201040203 ==1 : 3之展開劑,利用管柱層析法進行純化。所獲得之環 氧樹脂(EP-2 )為10份,根據GPC之測定結果確認所獲得 之環氧樹脂之純度含有98 %以上之上述式(6)之骨架之化 。物。進而,GC測疋中純度約為99%。又,環氧當量為1 89 g/eq. 〇 合成例1 於貫施例2中,利用曰本專利特開平7_丨79丨7號公報中 。己載之方法,將85份烯烴樹脂d- 1變更為6〇份所製造之 由下述式(7)所表示之烯烴樹脂(D_2):The G of Konghengzhi contains 98% of the compound of formula (6) and the compound degree is 90%. Also, the ring gas coil field 1 was 201 g/eq. Example 3 EIM) 105 parts of silicone rubber was used. Ethyl acetate: hexane was obtained for 15 parts of epoxy resin (Wakogel C-300, went to f Wako Pure Chemical Manufacturing Co., Ltd.) 201040203 ==1 : 3 developer, purified by column chromatography. The obtained epoxy resin (EP-2) was 10 parts, and the obtained epoxy resin was confirmed according to the measurement result of GPC. The purity is 98% or more of the skeleton of the above formula (6). Further, the purity in the GC is about 99%. Further, the epoxy equivalent is 1 89 g/eq. 〇 Synthesis Example 1 In the example 2, the method of the above-mentioned formula (7) is produced by changing the 85 parts of the olefin resin d-1 to 6 parts by the method of the above-mentioned Japanese Patent Publication No. Hei 7-7丨79. Olefin resin (D_2):

、N 〇从仅忖份比較j 之環氧樹脂(EP_3)。進而對於3G份所獲得之環氧樹) (BP-3)使用21〇㈣膠(WakGgeic_跡和光純藥製 析法進行純化。 5之展開劑,利用管柱) έ士所獲得之環氧樹脂(EP_4)為7份,根據Gpc 、·、。果綠認’該環氧樹脂之純度含有98 ’ > 之結構之化合物: 之下迷式U: 42 201040203, N 〇 from only the comparison of j epoxy resin (EP_3). Further, for the epoxy tree obtained in 3G parts (BP-3), 21 〇 (4) glue was used (WakGgeic_ trace and pure chemical preparation method for purification. 5 developing agent, using the column) The epoxy obtained by the gentleman The resin (EP_4) is 7 parts, according to Gpc, ·,. Fruit Green recognizes that the purity of the epoxy resin contains 98 ′ > of the structure of the compound: the following U: 42 201040203

進而,GC測定中純度約為99%。又,環氧當量為137 g/eq. 〇 實施例4、5、比較例1 對於實施例2、3中所獲得之本發明之環氧樹脂(Ep_ i、 EP-2 )、合成例1中所獲得之比較用之環氧樹脂(ep_4 ), 使用曱基六氫鄰苯二曱酸酐(新日本理化(股)製造,Rikacid MH700G,以下稱作HI)作為硬化劑、使用十六炫基=甲 基虱乳化敍(東不化成工業(股)製造,25%曱醇溶液,稱 作C1)作為硬化促進劑(硬化觸媒),以下述表1所示之 調配比(重量份)加以調配,進行20分鐘脫泡,獲得本發 明及比較用之硬化性樹脂組成物。對所獲得之硬化性樹脂 組成物,如下所述試驗物性,將結果一併示於表丨。再者, 财熱特性試驗以及熱機械特性試驗中之硬化條件於丨2 01 x 1小時之預備硬化後為150°C x3小時。 (耐熱特性試驗) 將實施例及比較射所獲得《硬化性樹脂組成物實施 真空脫泡20分鐘後,慢慢地注模於橫7 mm、縱$ 、厚 43 201040203 度約800 ^/爪之試驗片用金屬模具中,然後,自上方覆蓋 聚醯亞胺膜。使該注模物於上述條件下硬化而獲得動態黏 彈性用試驗片。使用該等試驗片,以下述所示之條件實施 動態黏彈性試驗(DMA ( Dynamic Mechanical Analysis,動 態機械分析)測定試驗)。 測定條件 動態黏彈性測定器:TA-instruments製造,DMA-2980 測定溫度範圍:-30°C〜28(TC 升溫速度:2°C /分鐘 試驗片尺寸:使用經切成5 mmx50 mm者(厚度約為 8〇〇 v m)。 分析條件Further, the purity in the GC measurement was about 99%. Further, the epoxy equivalent was 137 g/eq. 〇 Examples 4 and 5, and Comparative Example 1 The epoxy resins (Ep_i, EP-2) of the present invention obtained in Examples 2 and 3, and Synthesis Example 1 were used. The epoxy resin (ep_4) obtained for comparison was prepared using mercaptohexahydrophthalic anhydride (manufactured by Nippon Chemical and Chemical Co., Ltd., Rikacid MH700G, hereinafter referred to as HI) as a hardener, using sixteen bases = Methyl hydrazine emulsification (manufactured by Toka Chemical Industries Co., Ltd., 25% sterol solution, referred to as C1) as a hardening accelerator (hardening catalyst), formulated at the blending ratio (parts by weight) shown in Table 1 below The defoaming was carried out for 20 minutes to obtain a curable resin composition of the present invention and comparative use. The curable resin composition obtained was tested for physical properties as described below, and the results are shown in the same table. Furthermore, the hardening conditions in the thermal property test and the thermomechanical property test were 150 ° C x 3 hours after the preliminary hardening of 丨 2 01 x 1 hour. (Heat resistance characteristic test) After the vacuum curing of the curable resin composition was carried out for 20 minutes in the examples and comparative shots, the mold was slowly injection molded at a width of 7 mm, a length of $, and a thickness of 43 201040203 degrees of about 800 ^/claw. The test piece was placed in a metal mold, and then the polyimide film was covered from above. The injection molded article was cured under the above conditions to obtain a test piece for dynamic viscoelasticity. Using these test pieces, a dynamic viscoelasticity test (DMA (Dynamic Mechanical Analysis) measurement test) was carried out under the conditions shown below. Determination conditions Dynamic viscoelasticity tester: manufactured by TA-instruments, DMA-2980 Measurement temperature range: -30 ° C ~ 28 (TC heating rate: 2 ° C / min Test piece size: using cut into 5 mm x 50 mm (thickness) About 8〇〇vm). Analysis conditions

Tg :將DMA測定中之Tan- <5之峰值點設為Tg。 (熱機械特性試驗) 將實施例及比較例中所獲得之硬化性樹脂組成物實施 真空脫泡20分鐘後’注模於Teflon(註冊商標)製之多2 mm 官中’使該注模物於上述條件下硬化而獲得試驗片。使用 5亥試驗片’以下述所示之條件實施熱機械特性試驗(TMA (Thermo-Mechanical Analysis,熱機械分析)測定試驗)。 測定條件 動態黏彈性測定器:真空理工(股)製造,TM-7000 測定溫度範圍:40°C〜250°C 升溫速度:2°C/分鐘 試驗片尺寸:使用經切成分2 mm、15 mm者。 44 201040203 (熱耐久性穿透率試驗) 將實施例及比較例中所獲得之硬化性樹脂組成物實施 真空脫泡20分鐘後,以成為3〇 mmx2〇 mmx高度i爪爪之方 式慢慢地注模於利用耐熱膠帶製成障壁之玻璃基板上。使 該注模物於120。(:><3小時之預備硬化後以15(Γ(:χ1小時進 行硬化,獲得厚度1 mm之穿透率用試驗片。 使用該等試驗片,利用分光光度計測定於15〇t>c烘箱中 放置96小時前後之穿透率(測定波長·· 465 nm),算出其 〇 穿透率之保持率。 (硬化性試驗) 取1 mL實施例及比較例中所獲得之硬化性樹脂組成 物’測定15(TC下之凝膠時間。 測定機器 凝膠計時器:No. 153 Geltime Tester (安田精機製作所 製造) [表1] 項目 實施例4 實施例5 比較例1 組成 耐熱: EP-1 5.03 EP-2 4.73 EP-4 3.43 硬化劑(H1) 3.36 3.36 3.36 硬化觸媒(C1) 0.04 0.04 0.04 寺性 DMA (tan <5 ) 211°C 224〇C 184〇C 熱機械特性TMA (Tg) 180°C 187〇C 139〇C 耐熱穿透率保持率(465 nm) 94% 42% 凝膠#間 777秒 2234 秒 〇 45 201040203 根據以上結果可知,本發明之環氧樹脂可提供凝膠時 間較短的硬化特性優異之硬化性樹脂組成物,且可提供耐 熱性(耐熱特性、熱機械特性、耐熱著色性)優異之硬化 物。 實施例6、比較例2 對於實施例2中所獲得之本發明之環氧樹脂(Ep_2)、 3,4-環氧環己曱酸-3,4-環氧環己基甲酯(D〇w Chemical製 造,ERL-4221 (以下稱作環氧樹脂(Ερ·5))),使用硬 化劑(m)、硬化促進劑(硬化觸媒)(C1),以下述表 2所不之調配比(重量份)加以調配,進行2〇分鐘脫泡, 獲得本發明及比較用之硬化性樹脂組成物。對所獲得之硬 化性樹脂組成物,如下所述試驗物性,將結果一併示於表2。 (穿透率試驗) 將實施例及比較例令所獲得之硬化性樹脂組成物實施 真空脫泡20分鐘後,以成為3〇 mmx2〇 mmx高度j爪爪之方 式慢慢地注模於利用耐熱膠帶製成障壁之玻璃基板上。使 該注模物於12〇tx3小時之預備硬化後以15〇〇Cxl小時進 行硬化,獲得厚度丨mm之穿透率用試驗片。利用分光光度 什對其穿透率進行比較。(測定波長:4〇〇 nm ) (LED點燈試驗) 將實施例及比較例中所獲得之硬化性樹脂組成物實施 真空脫泡20分鐘後,填充於注射器中,使用精密噴出裝置, 模於裝載有具有發光波長465 nm之發光元件的外徑5 111見方之表面安裝型LED封裝(内徑4.4 mm,外壁高度 46 201040203 1.25 mm )中。然後’藉由以預定之硬化條件使其硬化而獲 得點燈試驗用LED。點燈試驗係進行規定電流即3〇 下 之點燈试驗。詳細條件如下所示。作為測定項目,係使用 積分球測定200小時點燈前後之照度,算出試驗用LED之 照度之保持率。 點燈詳細條件 發光波長:465 nm 驅動方式:恆定電流方式,30 mA (發光元件規定電流 Ο 為 30 mA ) 驅動環境:85°C,85% 評價:照度保持率 〇 [表2]Tg: The peak point of Tan- <5 in the DMA measurement is set to Tg. (Thermo-mechanical property test) The curable resin composition obtained in the examples and the comparative examples was subjected to vacuum defoaming for 20 minutes, and then injection molded in a 2 mm official Teflon (registered trademark) to make the injection molded article. The test piece was obtained by hardening under the above conditions. A thermomechanical property test (TMA (Thermo-Mechanical Analysis) test) was carried out using the following conditions. Measuring conditions Dynamic viscoelasticity measuring device: Vacuum engineering (stock) manufacturing, TM-7000 Measuring temperature range: 40 ° C ~ 250 ° C Heating rate: 2 ° C / min Test piece size: using cut ingredients 2 mm, 15 Mm. 44 201040203 (Thermal durability penetration rate test) The curable resin composition obtained in the examples and the comparative examples was subjected to vacuum defoaming for 20 minutes, and then slowly became 3 〇 mm x 2 〇 mm x height i claws. The injection molding is performed on a glass substrate in which a barrier is formed using a heat resistant tape. The injection molding is made at 120. (:><3 hours after the preliminary hardening, 15 (Γ(:1, hardening was performed for 1 hour, and a test piece for a transmittance of 1 mm in thickness was obtained. Using these test pieces, the measurement was performed by a spectrophotometer at 15 〇t> The penetration rate (measurement wavelength · 465 nm) was set in the oven for 96 hours, and the retention rate of the ruthenium transmittance was calculated. (Sturability test) The sclerosing property obtained in 1 mL of the examples and the comparative examples was taken. Resin composition 'measurement 15 (gel time under TC. Measurement machine gel timer: No. 153 Geltime Tester (manufactured by Yasuda Seiki Seisakusho Co., Ltd.) [Table 1] Item Example 4 Example 5 Comparative Example 1 Composition heat resistance: EP -1 5.03 EP-2 4.73 EP-4 3.43 Hardener (H1) 3.36 3.36 3.36 Hardening Catalyst (C1) 0.04 0.04 0.04 Temple DMA (tan <5 ) 211°C 224〇C 184〇C Thermomechanical Properties TMA (Tg) 180 ° C 187 〇 C 139 〇 C heat penetration rate retention (465 nm) 94% 42% gel # between 777 seconds 2234 seconds 〇 45 201040203 According to the above results, the epoxy resin of the present invention can provide a curable resin composition having a short gelation time and excellent hardening property, and A cured product excellent in heat resistance (heat resistance, thermomechanical properties, heat resistance and coloring resistance). Example 6 and Comparative Example 2 The epoxy resin (Ep_2), 3,4-ring of the present invention obtained in Example 2 Oxycyclohexanic acid-3,4-epoxycyclohexylmethyl ester (manufactured by D〇w Chemical, ERL-4221 (hereinafter referred to as epoxy resin (Ερ·5))), using hardener (m), hardening promotion The agent (curing catalyst) (C1) was prepared by blending at a mixing ratio (parts by weight) as shown in the following Table 2, and defoaming was carried out for 2 minutes to obtain a curable resin composition of the present invention and comparative use. The curable resin composition was tested for physical properties as described below, and the results are shown in Table 2. (Permeability test) After the vacuum curable resin composition obtained in the examples and the comparative examples was subjected to vacuum defoaming for 20 minutes, Slowly injection molding on a glass substrate made of a heat-resistant adhesive tape to form a barrier of 3 〇 mm x 2 〇 mm x height j. The injection molding was allowed to be 15 〇〇 C x 1 hour after 12 〇 t x 3 hours of preliminary hardening. Hardening was carried out to obtain a test piece for a transmittance of thickness 丨 mm. Using spectrophotometry The transmittance was compared. (Measurement wavelength: 4 〇〇 nm) (LED lighting test) The curable resin composition obtained in the examples and the comparative examples was subjected to vacuum defoaming for 20 minutes, and then filled in a syringe. In the surface mount type LED package (inner diameter 4.4 mm, outer wall height 46 201040203 1.25 mm) having an outer diameter of 5 111 square having a light-emitting element having an emission wavelength of 465 nm, a precision ejection device was used. Then, the LED for lighting test was obtained by hardening it under predetermined hardening conditions. The lighting test is a lighting test with a specified current of 3 〇. The detailed conditions are as follows. As a measurement item, the illuminance before and after the lighting for 200 hours was measured using an integrating sphere, and the illuminance retention rate of the test LED was calculated. Detailed lighting conditions Lighting wavelength: 465 nm Driving method: Constant current mode, 30 mA (lighting element specified current Ο 30 mA) Driving environment: 85 ° C, 85% Evaluation: Illuminance retention rate 〇 [Table 2]

硬化劑(H1) 硬化觸媒(C1)Hardener (H1) hardening catalyst (C1)

點燈試驗保持率 根據以上結果可知,本發明之環氧樹脂可提供不僅且 有良好之硬化性、並且穿透性(透明性)優異之硬化物: 又,根據照度保持率之結果可知,由本發明之 得之硬化物的耐熱劣化性及耐劣化性According to the above results, the epoxy resin of the present invention can provide a cured product which is excellent in both hardenability and transparency (transparency): It is also known from the results of the illuminance retention rate. Heat deterioration resistance and deterioration resistance of the cured product of the invention

用途具有優異之適應性。 、w 對LED 已參照特定之態樣對本發明進行詳細說明,但就本領 47 201040203 域技術人員而言財瞭解,可在不脫離本發明 圍下進行各種變更及修正。 神及範 再者’本申請案係基於2〇〇9年4 : = 申請案(特願2___8),其全部内 為參文卜又,其中所引用之所有全部内容係作 【圖式簡單說明】 無 【主要元件符號說明】 無 48The use has excellent adaptability. The invention has been described in detail with reference to the specific aspects of the LEDs, but it will be understood by those skilled in the art that various changes and modifications can be made without departing from the invention. God and Fan Zai's 'This application is based on 2〇〇9年4: = Application (Special Wish 2___8), all of which are in the text, and all the contents quoted therein are [simplified description] 】 No [main component symbol description] No 48

Claims (1)

201040203 七、申請專利範圍: 係由下述式(1 )所表 1. 一種烯烴樹脂,其特徵在於 不 ·201040203 VII. Patent application scope: It is expressed by the following formula (1). 1. An olefin resin, characterized in that (式中,存在複數個之R 原子、或碳數1〜15之烷基) p分別獨立地存在,表示氫 第 2.—種環氧樹脂,其特徵在於: 1項之烯烴樹脂氧化而獲得。 係藉由將申請專利範圍 3 ·如申請專利範圍第2 或過酸而環氧化。 項之環氧樹脂,係使用 過氧化氫 〇 利-图—種硬化性樹脂組成物’其特徵在於:其含有申-專 利轭圍第2 Ji赤筮3甲〇月專 一 之%氧樹脂、硬化劑及/或硬化觸媒。 之心Γ種硬化物,其特徵在於:係料請專利範圍第4項 之硬化性樹脂組成物硬化而成。 員 八、 圖式 無 49(wherein a plurality of R atoms or an alkyl group having 1 to 15 carbon atoms) p are independently present, and represent a hydrogen type 2 epoxy resin, characterized in that: one of the olefin resins is oxidized to obtain . It is epoxidized by applying the patent scope 3 · as claimed in the patent range 2 or peracid. The epoxy resin of the item is a hydrogen peroxide-based image-hardening resin composition, which is characterized in that it contains the oxy-resin and hardening of the second-party yoke Agent and / or hardening catalyst. The hardened material of the heart is characterized in that the curable resin composition of the fourth item of the patent range is hardened. VIII, schema no 49
TW099112114A 2009-04-17 2010-04-16 Olefin resin, epoxy resin, curable resin composition and cured product thereof TWI455949B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009100638 2009-04-17

Publications (2)

Publication Number Publication Date
TW201040203A true TW201040203A (en) 2010-11-16
TWI455949B TWI455949B (en) 2014-10-11

Family

ID=42982617

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099112114A TWI455949B (en) 2009-04-17 2010-04-16 Olefin resin, epoxy resin, curable resin composition and cured product thereof

Country Status (5)

Country Link
JP (1) JP5559154B2 (en)
KR (1) KR20120026035A (en)
CN (1) CN102395555B (en)
TW (1) TWI455949B (en)
WO (1) WO2010119960A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI647248B (en) * 2012-06-07 2019-01-11 日商日本化藥股份有限公司 Epoxy resin composition, cured product thereof, and curable resin composition

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5404514B2 (en) * 2010-04-19 2014-02-05 日本化薬株式会社 Epoxy resin production method, epoxy resin, and curable resin composition
JP5843584B2 (en) * 2011-11-29 2016-01-13 昭和電工株式会社 Method for producing polyvalent glycidyl compound
CA2856353C (en) * 2011-12-02 2020-03-24 Senseair Ab Epoxy molded gas cell for optical measurement and method of forming
CN103289326B (en) * 2013-06-28 2015-10-07 山东科技大学 For the halogen-free flame retardant epoxy resin composition of potting compound
WO2016119848A1 (en) * 2015-01-29 2016-08-04 Henkel Ag & Co. Kgaa Method for the preparation of cycloaliphatic epoxy resins
KR102204653B1 (en) * 2016-11-07 2021-01-19 쇼와 덴코 가부시키가이샤 Method for producing polyhydric glycidyl compound
CN108649113A (en) * 2018-04-28 2018-10-12 上海应用技术大学 A kind of new application technique improving LED yields
KR20210036119A (en) * 2019-09-25 2021-04-02 주식회사 케이씨씨 Powder coating composition

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2052381A1 (en) * 1990-09-28 1992-03-29 James P Stanley Transesterification process for preparation of cycloaliphatic epoxides
JPH05213919A (en) * 1992-02-04 1993-08-24 Tosoh Corp Epoxidization of alicyclic olefin
US5767150A (en) * 1997-04-10 1998-06-16 Sartomer Company Cycloaliphatic epoxide compounds
CA2351472C (en) * 1998-11-23 2010-01-26 Sun Chemical Corporation Energy curable gravure and ink jet inks incorporating grafted pigments
JP2006052187A (en) * 2004-08-16 2006-02-23 Daicel Chem Ind Ltd Methods for producing alicyclic olefin compound and alicyclic epoxy compound

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI647248B (en) * 2012-06-07 2019-01-11 日商日本化藥股份有限公司 Epoxy resin composition, cured product thereof, and curable resin composition

Also Published As

Publication number Publication date
JP5559154B2 (en) 2014-07-23
CN102395555B (en) 2015-01-21
TWI455949B (en) 2014-10-11
WO2010119960A1 (en) 2010-10-21
KR20120026035A (en) 2012-03-16
CN102395555A (en) 2012-03-28
JPWO2010119960A1 (en) 2012-10-22

Similar Documents

Publication Publication Date Title
TWI647248B (en) Epoxy resin composition, cured product thereof, and curable resin composition
TW201040203A (en) Olefin resin, epoxy resin, curable resin composition, and material resulting from curing same
TWI488890B (en) A polycarboxylic acid composition and a method for producing the same, and a hardening resin composition comprising the polycarboxylic acid composition
TWI579313B (en) Epoxy resin, epoxy resin composition and hardened material
JP5517237B2 (en) Method for producing epoxy compound, epoxy compound, curable resin composition and cured product thereof
KR20120030056A (en) Polyvalent carboxylic acid, composition thereof, curable resin composition, cured product, and method for manufacturing a polyvalent carboxylic acid
JP5775869B2 (en) Polyvalent carboxylic acid composition, curing agent composition, and curable resin composition containing the polyvalent carboxylic acid composition or the curing agent composition as a curing agent for epoxy resin
TW201211093A (en) Curable resin composition and cured product thereof
TWI510478B (en) A diene compound, an epoxy resin, a hardened resin composition, and a cured product
JP5294771B2 (en) Method for producing epoxy compound
JP5430337B2 (en) Diolefin compound, epoxy resin, curable resin composition and cured product thereof
JP5780627B2 (en) Method for producing epoxy compound
TWI460171B (en) Diene compounds, epoxy resins and the compositions
TWI422592B (en) Olefin compounds, epoxy resins, hardened resin compositions and hardened products thereof, LED devices
TWI471347B (en) A thermosetting resin composition and a hardened product thereof, and an optical semiconductor device
JP5686629B2 (en) Epoxy resin composition
JP5505960B2 (en) Diolefin compound, epoxy resin, curable resin composition and cured product thereof
JP5489559B2 (en) Resin composition, production method thereof and cured product thereof
JP2010018538A (en) Method for producing epoxy compound
JP5748191B2 (en) Method for producing epoxy compound
TW201443140A (en) Epoxy resin, curable resin composition and cured material
TW201412851A (en) Polycarboxylic acid composition, method for producing polycarboxylic acid composition, curing agent composition for epoxy resin, epoxy resin composition, and cured product
JP2011225654A (en) Diolefin resin, epoxy resin, and composition for the same
JP5796916B2 (en) Production method of epoxy resin
WO2011145733A1 (en) Diolefin compound, epoxy resin, curable resin composition, and cured article

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees