201027144 無0 六、發明說明： 【發明所屬之技術領域】 本發明係有關於一種圖案修正方法與囷案修正裝置， 特別是修正形成於基板上的圖案的缺陷部的圖案修正方法 及圖案修正裝置。 【先前技術】 平面顯示器的代表例已知的有液晶顯示器、電漿顯示 器、EL顯示器等。在該等顯示器中，晝面的大型化高精 細化發展，畫素有增大的傾向。因此，在製造過程中在 晝素產生缺陷的機率高，為了提高良率，必須發展修補產 生於畫素的缺陷的技術。 例如，對液晶彩色濾光層的著色層（畫素）的一部份缺 ® 少顏色的白缺陷做修正的方法，在塗佈針的前端附著修正 液（修正墨水）後，使塗佈針的前端接觸於白缺陷而塗佈修 正液（例如參照專利文獻1)。 又，也有以雷射光照射產生於著色層的異物缺陷及白 缺陷而形成矩形的白缺陷，使用微喷注頭使修正液流入矩 形的白缺陷的方法（例如參照專利文獻2 )。 又’將修正液塗佈於矩形的白缺陷時，修正液填充於 白缺陷的角部，修正液的中央部膨脹高起，修正液被導引 至白缺陷的邊緣而使中央部呈凹陷狀，修正液的厚度容易 201027144 m 不平均。使塗佈於白缺陷的修正液的厚度平均的方法為對 塗佈於白缺陷的修正液從上方喷射氣體的方法（例如參/ 專利文獻3 )。 ^ 專利文獻1 :特開平9 —236933號公報 專利文獻2.特開平2006-145 7 86號公報 專利文獻3 :特開20 08-3287號公報 【發明内容】 [發明所欲解決的問題] 在上述專利文獻3的方法中，在使用高黏度的修正液 的情況下以及使用雖然是低黏度但乾燥速度快而黏度有變 高的傾向的修正液的情況下，$ 了使修正液的厚度平均， 必須提高喷射至修正液的氣體的壓力。但當噴射的氣體的 壓力過高時，修正液會從白缺陷的周圍逸出。 又，最近，隨著液晶顯示器的大畫面化，彩色濾光層 的畫素尺寸也大型化’缺陷尺寸也會變大。當修正液的塗 佈面積變大時，修正液的厚度不均會更厲#，在修正液突 起的地方，從上方噴射氣體時，修正液會向缺陷畫素的周 圍推出。 如此，本發明的主要目的在提供一種圖案修正方法及 圖案修正裝置’在於抑制塗佈於缺陷部的修正液朝周圍逸 出，而使修正液的厚度平均。 [解決問題的方法] 本發明的圖案修正方法為修正形成於基板上的圖案的 201027144 *缺陷部’包括下列步驟··第一步驟’在上述缺陷部塗佈修 正液；第二步驟，將溶劑的蒸氣吸收至上述修正液中，而 使上述修正液的黏度降低，使得塗佈於上述缺陷部的上述 修正液的厚度平均。 • 較佳的是上述溶劑與上述修正液所含的溶劑相同。 彳的疋預先求出將上述溶劑蒸氣吸收至上述修正液 而使上述修正液的厚度平均所需的時間，在上述第二步驟 β巾，僅在預先求出的時間中使上述修正液的溶劑的蒸氣吸 收至上述修正液中。 較佳的是在上述第二步驟中，觀察塗佈於上述缺陷部 的上述修正液，同時使上述溶劑的蒸氣吸收於上述修正液 中而使上述修正液的表面平坦化，對應於此，而結束上 述第二步驟。 佳的疋在上述第二步驟中，使喷嘴的前端與塗佈於 上述缺陷部的上述修正液的相向，從上述喷嘴將包含上述 ©溶劑蒸氣的氣體喷霧至上述修正液，而使上述溶劑 吸收於上述修正液中。 …軋 較佳的是上述喷嘴係相對於上述基板而略垂直或 地配置^ 較佳的是上述喷嘴係以複數個配置於上述缺陷部的周 圍。 較佳的疋在上述第二步驟中，供給氣體至上述溶劑所 注入的容器内，而產生包含上述溶劑蒸氣的上述氣體。 較佳的疋將氣體供給至上述容器内的上述溶劑中而產 201027144 生氣泡’増加上述溶劑的蒸氣的產生量。 較佳的是以加熱器加熱上述容器内，而增加上述溶劑 的蒸氣的產生量。 較佳的是在上述第二步驟中，相對於塗佈於上述缺陷 部的上述修正液，使吸收了上述溶劑的片件接近，上述溶 劑的蒸氣從上述片件供給至上述修正液。 較佳的是上述基板為透明基板，上述圖案為包含複數 個著色層的彩色濾光件，缺陷部為著色層的白缺陷。 又，本發明的圖案修正裝置為修正形成於基板上的圖 案的缺陷部’包括：一塗佈裝置，在上述缺陷部塗佈修正 液；以及一平均化裝置，將溶劑的蒸氣吸收至上述修正液 中而使上述修正液的黏度降低，使得塗佈於上述缺陷部 的上述修正液的厚度平均。 .較佳的是上述平均化裝置包括：—容器，注入上述溶 齊！氣體供給裝置，將氣體供給至上述容器内，而產生 =含上述溶劑蒸氣的上述氣體；以及—喷嘴，連接於上述 各器’將包含上述溶㈣氣的氣體喷至塗佈在上述缺陷部 的上述修正液上。 較佳的是上述平均化裝 劑；以及一保持構件，使片 修正液相向。 置包括：一片件，吸收上述溶 件與塗佈於上述缺陷部的上述 [發明的效果] 在本發明的圖案修正 的蒸氣吸收於修正液中而 方法及圖案修正裝置中，使溶劑 使修正液的黏度降低，使得塗佈 201027144 於缺陷部的修正液的厚度平均。因此，抑制修正液朝缺陷 部的周圍逸出，使塗佈於缺陷部的修正液的厚度平均。 【實施方式】 第1圖為本發明的一實施形態的圖案修正方法的修正 對象的液晶彩色濾光基板1的主要部位的圖，第2圖為其 -部份的剖面。在第i圖及第2圖中，液晶彩色濾光基板 ❹1包含玻璃基板2。在玻璃基板2的表面，形成格子狀的黑 矩陣3,在以黑矩陣3圍成的複數個區域中，R畫素4 g .畫素5以及B畫素6係以既定的週期形成。设畫素畫 素5以及B晝素6分別以紅色、綠色及藍色的著色層形成。 在第1圖及第2圖中，矣千太R全本 r录不在B畫素6的一部份存在著矩 形的白缺陷6a的狀態。矩形的白缺陷6a係對在該B畫素 6所產生的任意形狀的白缺陷或異物缺陷的矩形區域照射 雷射光而形成的。 第3a圖表不在白缺陷6a塗佈修正墨水7的工程。在 第3a圖中’使塗布針8的前端部附著修正墨水卜使塗布 針8的前端接觸於白缺险 ^ ^ ^ 臼缺陷6a，而將修正墨水7塗佈於白缺 陷6a上。修正墨水7為 馮將白缺陷存在的部分（於此為Β畫 素6)的的顏色的顏料、 ^ 樹月曰及为散劑添加於溶劑中。溶劑 係使用高彿點的溶翻，, ^劑，例如PGMEA(乙二醇單f基趟醋）。 PGMEA的沸點為146。〇：。 的前端部， 的前端 而且，在塗布針 變小的錐拔部，在塗布針 形成斷面積朝前端漸漸 ’形成圓形的平坦面。 201027144 又，如第3b圖所示，可使用微喷注頭9而將修正墨水7塗 佈於白缺陷6a。又，相對於白缺陷6a，塗佈形狀變小的情 況下’改變塗佈位置而進行複數次塗佈。 第4圖表示將修正墨水7塗佈於白缺陷6a。在第4圖 中，塗佈於白缺陷6a的修正墨水7並未填充於白缺陷6a 的全部區域，在白缺陷63的角部殘留著修正墨水7的未充 填部。 第5圖表示使塗佈於白缺陷的修正墨水7的厚度平 均的工程m圖中’塗佈於白缺陷6a的修正墨水7成 _ 為例如中央膨脹而塗佈厚度不均的狀態。在該圖案修正方 法中使用了氣體供給源（G)i〇、溶劑蒸氣產生裝置11以及 喷嘴20。氣體供給源10供給既定壓力的氣體。氣體使用 例如氮氣，若所使用的修正墨水7不會劣化也可使用壓縮 空氣。 '' 溶劑蒸氣產生裝置11包括調整從氣體供給源1〇供給 的氣體的壓力的調節器（R)12、調節器12與容器15的二口D 之間連接的電磁閥（v)13、控制電磁閥13開閉的計時器 (Ό14以及注入與修正墨水7的溶劑相同的溶劑16(例如 PGMEA)的容器15。 而且，溶劑16注入的容器15隨著缺陷修正而移動時， 溶劑1 6的液面搖晃而溶劑16流至喷嘴20側。為了防止溶 劑16流至喷嘴20側，可在容器15的氣體出口埠設有過濾 器17，亦可使溶劑1 6呈膠狀，或使吸收溶劑16的片件18 進入容器15内。 201027144 谷器15的出口與喷嘴2〇的底端以配管19連接。喷嘴 20係相對於成為修正對象的液晶彩色濾光基板i略垂直地 設置，其前端的開口部相對於白缺陷6a分隔既定的間隙而 相向。喷嘴20的前端與液晶彩色濾光基板工的間隙為imm 〜10mm。又，從喷嘴2〇喷霧的區域可包含白缺陷仏的範 圍，喷嘴20的内徑為例如從〇1咖至5mm。 在調節器12將氣體的壓力調整至最佳值後，以計時器 ❹14 "又疋的時間開放電磁閥13，使氣體流入容器丨5内。藉 此，使氣體與溶劑16的蒸氣混合。包含溶劑16的蒸氣的 ‘氣體經由喷嘴2〇從白缺陷6a的上方噴霧至包含白缺陷6a 的範圍。 第6圖為將包含溶劑16的蒸氣的氣體噴霧至塗佈於白 缺陷6a的修正墨水7的狀態的圖。當修正墨水7吸收了包 含於氣體中的溶劑16的蒸氣時，修正墨水7的黏度降低而 流度性增加，修正墨水7的表面平坦化。又，當修正液7 〇的流動性提高時，塗佈於白缺陷6a的修正墨水7即使有塗 佈不均勻處，例如在修正墨水7未塗佈的區域，修正墨水 7會流至白缺陷6a的全區而修復不均勻處，使修正墨水7 的厚度平均。而且，為了使修正墨水7的厚度平均化，以 預先的實驗求出必要的嘴霧時間，求出的喷霧時間由計時 器14設定。 在本實施形態中，將包含塗佈於白缺陷6a的修正墨水 7的溶劑16的蒸氣的氣體做喷霧而使修正墨水7的黏度降 低’提高修正墨水7的流動性，使修正墨水7的厚度平均。 201027144 因此即使修JL墨水7的黏度提高，由於不必提高氣體的 壓力可抑制修正墨水7從白缺陷6a的周圍逸出。 以下，針對該實施形態的各種變更例做說明。在第7 圖的變更例中’觀察光學系（未圖示）的接物透鏡21配置於 白缺陷6a的正上方，喷嘴2〇朝向白缺陷而傾斜配置。 在此變更例中，觀察塗佈於白缺陷上的修正墨水7的狀 L可從喷嘴20噴出包含溶劑16的蒸氣的氣體。因此， 確〜修正墨水7的表面的平坦化之後’關閉電磁閥13，藉 此可確實地實施修正墨水7的表面的平坦化。 在第8圖的變更例中，觀察光學系（未圖示）的對物透 鏡21配置於白缺陷6a的正上方複數個(在圖中為二個) 喷嘴20以等角間隔配置於白缺陷6a的周圍，各喷嘴別朝 白缺陷6a傾斜配置。在第7圖的變更例中，由於從白缺陷 6a的-侧以包含溶劑16的蒸氣喷霧，溶劑16的蒸氣在白 缺陷6a内不均勻，修 墨水7的動性不平均而妨礙平坦 化。對此’在第8圖的綈承也丨a .丄^.[Technical Field] The present invention relates to a pattern correction method and a file correction device, and more particularly to a pattern correction method and a pattern correction device for correcting a defect portion of a pattern formed on a substrate . [Prior Art] A representative example of a flat panel display is known as a liquid crystal display, a plasma display, an EL display or the like. In such displays, the enlargement of the kneading surface is progressing, and the pixels are tending to increase. Therefore, there is a high probability that defects will occur in the manufacturing process, and in order to improve the yield, it is necessary to develop a technique for repairing defects occurring in pixels. For example, a method of correcting a part of the coloring layer (pixel) of the liquid crystal color filter layer that lacks the white color of the color is attached, and the correction liquid (correction ink) is attached to the front end of the coating needle, and the coating needle is applied. The tip end is coated with a correction liquid in contact with a white defect (for example, refer to Patent Document 1). In addition, there is a method of forming a rectangular white defect by irradiating a foreign matter defect and a white defect generated in the colored layer with laser light, and using a micro-injection head to cause the correction liquid to flow into a rectangular white defect (see, for example, Patent Document 2). Further, when the correction liquid is applied to a rectangular white defect, the correction liquid is filled in the corner portion of the white defect, the central portion of the correction liquid is swollen, and the correction liquid is guided to the edge of the white defect to make the central portion concave. The thickness of the correction fluid is easy to be uneven at 201027144 m. The method of averaging the thickness of the correction liquid applied to the white defect is a method of ejecting a gas from above to the correction liquid applied to the white defect (for example, Reference / Patent Document 3). [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. In the method of the above-mentioned Patent Document 3, when a correction liquid having a high viscosity is used and a correction liquid having a low viscosity but a high drying speed and a high viscosity tends to be used, the thickness of the correction liquid is averaged. , the pressure of the gas injected to the correction fluid must be increased. However, when the pressure of the injected gas is too high, the correction fluid will escape from the periphery of the white defect. Further, recently, with the increase in the size of the liquid crystal display, the pixel size of the color filter layer has also increased in size, and the size of the defect has also increased. When the coating area of the correction liquid becomes large, the thickness of the correction liquid becomes more uneven. # When the correction liquid rises, when the gas is ejected from above, the correction liquid is pushed out around the defective pixel. As described above, a main object of the present invention is to provide a pattern correction method and a pattern correction device which are characterized in that the correction liquid applied to the defective portion is prevented from escaping to the periphery, and the thickness of the correction liquid is averaged. [Method for Solving the Problem] The pattern correction method of the present invention is to modify the pattern formed on the substrate 201027144 * the defective portion 'includes the following steps · the first step 'coating the correction liquid on the defective portion; the second step, the solvent The vapor is absorbed into the correction liquid, and the viscosity of the correction liquid is lowered to make the thickness of the correction liquid applied to the defective portion uniform. • It is preferred that the above solvent is the same as the solvent contained in the above correction liquid. The time required for the solvent vapor to be absorbed into the correction liquid to average the thickness of the correction liquid is determined in advance, and in the second step, the solvent of the correction liquid is used only in a predetermined time. The vapor is absorbed into the above correction liquid. Preferably, in the second step, the correction liquid applied to the defective portion is observed, and the vapor of the solvent is absorbed in the correction liquid to planarize the surface of the correction liquid. End the second step above. In the second step, the tip end of the nozzle is opposed to the correction liquid applied to the defect portion, and a gas containing the solvent vapor is sprayed from the nozzle to the correction liquid to cause the solvent. Absorbed in the above correction fluid. Preferably, the nozzles are arranged vertically or vertically with respect to the substrate. Preferably, the nozzles are disposed in a plurality of positions around the defective portion. Preferably, in the second step, a gas is supplied to the container into which the solvent is injected to generate the gas containing the solvent vapor. Preferably, the gas is supplied to the solvent in the container to produce the amount of vapor generated by the bubble of the above-mentioned solvent. It is preferred to heat the inside of the container by a heater to increase the amount of vapor generated by the solvent. Preferably, in the second step, the sheet member absorbing the solvent is brought close to the correction liquid applied to the defect portion, and the vapor of the solvent is supplied from the sheet member to the correction liquid. Preferably, the substrate is a transparent substrate, and the pattern is a color filter including a plurality of colored layers, and the defective portion is a white defect of the colored layer. Further, the pattern correction device of the present invention includes a coating device that corrects a pattern formed on a substrate, and includes a coating device that applies a correction liquid to the defect portion, and an averaging device that absorbs vapor of the solvent to the correction. The viscosity of the correction liquid is lowered in the liquid to make the thickness of the correction liquid applied to the defective portion uniform. Preferably, the averaging means comprises: - a container, infused with the above! a gas supply device that supplies a gas to the container to generate the gas containing the solvent vapor; and a nozzle that is connected to the respective devices to spray a gas containing the dissolved gas to the defect portion Above the correction fluid. Preferred is the above-described averaging agent; and a holding member for correcting the liquid phase of the sheet. The present invention includes: a sheet member absorbing the above-mentioned solution and applying the above-described defect portion. [Effect of the invention] In the method and the pattern correction device in which the pattern-corrected vapor of the present invention is absorbed in the correction liquid, the solvent is caused to be a correction liquid The viscosity is lowered so that the thickness of the correction fluid applied to the defect portion of 201027144 is averaged. Therefore, the correction liquid is prevented from escaping toward the periphery of the defect portion, and the thickness of the correction liquid applied to the defect portion is made uniform. [Embodiment] FIG. 1 is a view showing a main part of a liquid crystal color filter substrate 1 to which a pattern correction method according to an embodiment of the present invention is modified, and FIG. 2 is a partial cross section. In the first and second figures, the liquid crystal color filter substrate ❹1 includes the glass substrate 2. On the surface of the glass substrate 2, a lattice-shaped black matrix 3 is formed, and in a plurality of regions surrounded by the black matrix 3, R pixels 4 g and P pixels 6 are formed at predetermined periods. It is assumed that the pixels 5 and B are formed of red, green and blue colored layers, respectively. In Fig. 1 and Fig. 2, there is a state in which a rectangular white defect 6a exists in a part of the B pixel 6 in the entire picture. The rectangular white defect 6a is formed by irradiating laser light to a rectangular region of an arbitrary shape of white defect or foreign matter defect generated by the B pixel 6. The 3a chart does not apply the correction ink 7 to the white defect 6a. In Fig. 3a, the correction ink is adhered to the tip end portion of the coating needle 8, and the tip end of the coating needle 8 is brought into contact with the white defect ^^^ 臼 defect 6a, and the correction ink 7 is applied to the white defect 6a. The correction ink 7 is a color pigment of the portion where the white defect is present (here, the ruthenium element 6), and the powder is added to the solvent as a powder. The solvent is a solution of a high-fool point, such as PGMEA (ethylene glycol mono-f-based vinegar). PGMEA has a boiling point of 146. Hey: At the tip end of the front end portion, the tapered portion of the coating needle is formed, and the coating needle is formed into a circular flat surface toward the front end. 201027144 Further, as shown in Fig. 3b, the correction ink 7 can be applied to the white defect 6a using the micro-injection head 9. Further, when the coating shape is small with respect to the white defect 6a, the coating position is changed and the coating is performed plural times. Fig. 4 shows the application of the correction ink 7 to the white defect 6a. In Fig. 4, the correction ink 7 applied to the white defect 6a is not filled in the entire area of the white defect 6a, and the unfilled portion of the correction ink 7 remains at the corner of the white defect 63. Fig. 5 shows a state in which the thickness of the correction ink 7 applied to the white defect is uniform, and the correction ink 7 applied to the white defect 6a is, for example, a state in which the center is expanded and the coating thickness is uneven. In the pattern correction method, a gas supply source (G), a solvent vapor generation device 11, and a nozzle 20 are used. The gas supply source 10 supplies a gas of a predetermined pressure. The gas is used, for example, nitrogen gas, and compressed air can be used if the correction ink 7 used does not deteriorate. '' The solvent vapor generating device 11 includes a regulator (R) 12 that adjusts the pressure of the gas supplied from the gas supply source 1 , a solenoid valve (v) 13 connected between the regulator 12 and the port D of the container 15, and control The timer for opening and closing the electromagnetic valve 13 (the crucible 14 and the container 15 for injecting the same solvent 16 as the solvent of the correction ink 7 (for example, PGMEA). Further, when the container 15 injected with the solvent 16 moves with the defect correction, the solvent 16 is liquid. The surface is shaken and the solvent 16 flows to the side of the nozzle 20. In order to prevent the solvent 16 from flowing to the nozzle 20 side, the filter 17 may be provided at the gas outlet port of the container 15, or the solvent 16 may be gelatinized or the solvent 16 may be absorbed. The sheet member 18 enters the container 15. 201027144 The outlet of the barrage 15 is connected to the bottom end of the nozzle 2A by a pipe 19. The nozzle 20 is disposed perpendicularly to the liquid crystal color filter substrate i to be corrected, and the front end thereof is provided. The opening portion faces the predetermined gap with respect to the white defect 6a. The gap between the tip end of the nozzle 20 and the liquid crystal color filter substrate is imm to 10 mm. Further, the area sprayed from the nozzle 2 may include a range of white defects. The inner diameter of the nozzle 20 is an example From 〇1 coffee to 5mm. After the regulator 12 adjusts the pressure of the gas to the optimum value, the solenoid valve 13 is opened by the timer &14 " 疋, and the gas flows into the container 丨5. The gas containing the vapor of the solvent 16 is mixed. The gas containing the vapor of the solvent 16 is sprayed from above the white defect 6a to the range containing the white defect 6a via the nozzle 2A. Fig. 6 is a spray of the gas containing the vapor of the solvent 16 to the coating. In the state of the correction ink 7 of the white defect 6a, when the correction ink 7 absorbs the vapor of the solvent 16 contained in the gas, the viscosity of the correction ink 7 is lowered to increase the fluidity, and the surface of the correction ink 7 is flattened. Further, when the fluidity of the correction liquid 7 提高 is improved, even if the correction ink 7 applied to the white defect 6a is unevenly coated, for example, in the region where the correction ink 7 is not applied, the correction ink 7 flows to the white defect. In the entire area of 6a, the unevenness is repaired, and the thickness of the correction ink 7 is averaged. Further, in order to average the thickness of the correction ink 7, the necessary nozzle mist time is obtained by a preliminary experiment, and the obtained spray time is counted by the timing. Set to 14. In the present embodiment, the gas containing the vapor of the solvent 16 of the correction ink 7 applied to the white defect 6a is sprayed to lower the viscosity of the correction ink 7, and the fluidity of the correction ink 7 is increased to correct the ink 7. 201027144 Therefore, even if the viscosity of the JL ink 7 is improved, it is possible to prevent the correction ink 7 from escaping from the periphery of the white defect 6a without increasing the pressure of the gas. Hereinafter, various modifications of the embodiment will be described. In the modified example of the figure, the objective lens 21 of the observation optical system (not shown) is disposed directly above the white defect 6a, and the nozzle 2 is disposed obliquely toward the white defect. In this modification, the shape L of the correction ink 7 applied to the white defect is observed to eject the gas containing the vapor of the solvent 16 from the nozzle 20. Therefore, it is confirmed that the electromagnetic valve 13 is closed after the flattening of the surface of the ink 7 is corrected, whereby the flattening of the surface of the correction ink 7 can be surely performed. In the modified example of Fig. 8, the objective lens 21 of the observation optical system (not shown) is disposed directly above the white defect 6a (two in the figure). The nozzles 20 are arranged at equal angular intervals on the white defect. Around the 6a, each nozzle is disposed obliquely toward the white defect 6a. In the modified example of Fig. 7, since the vapor containing the solvent 16 is sprayed from the side of the white defect 6a, the vapor of the solvent 16 is uneven in the white defect 6a, and the kinetic property of the ink refining 7 is uneven, which hinders the planarization. . In this case, the inheritance in Figure 8 is also a.丄^.
儆篁的修正墨水17比多量的修正墨水 快速恢復修正墨水7的流動性，可辦知, 的墨水的黏度高的修正墨水 正墨水7的液量是微少的， 正墨水17容易乾燥。為了 可增加溶劑16的蒸氣量（提 201027144 高濃度）。 於此，在第9圖的變更例中，流入容器15的氣體一旦 進入溶劑16的液體中而產生氣泡，促進溶劑16的蒸發。 又，在第1〇圖的變更例中，加熱器22配置於容器15中， 加熱溶劑16而促進溶劑16的蒸發。藉此，可提高溶剩16 的蒸氣濃度’可增加單位時間被修正墨水7所吸收的溶劑 量。又’可縮短包含溶劑16的蒸氣的氣體喷霧時間。The correction ink 17 of the crucible is more than a large amount of correction ink. The fluidity of the correction ink 7 is quickly recovered. It is understood that the correction ink having a high viscosity of the ink has a small amount of liquid, and the positive ink 17 is easily dried. In order to increase the amount of vapor in the solvent 16 (higher concentration of 201027144). Here, in the modified example of Fig. 9, the gas which has flowed into the container 15 enters the liquid of the solvent 16 to generate bubbles, thereby promoting evaporation of the solvent 16. Further, in the modified example of the first drawing, the heater 22 is disposed in the container 15, and the solvent 16 is heated to promote evaporation of the solvent 16. Thereby, the vapor concentration of the remaining portion 16 can be increased to increase the amount of solvent absorbed by the corrected ink 7 per unit time. Further, the gas spray time of the vapor containing the solvent 16 can be shortened.
❹ 又，溶劑16的蒸氣量與喷霧時間具相對關係，若明瞭 塗佈於白缺陷6a的修正墨纟7的液量與溶劑16的蒸氣 量則可預測平坦化所需的各種條件。又，藉由預先實驗 而掌握最佳的修正條件，可對應於缺陷而改變條件。而且， 進行缺陷修正的房間的環境例如由於室溫與漁度使已塗 佈的修正墨纟7的乾燥性及流度性不同，因此對應於環 境可"^疋/谷劑16的蒸氣量與喷霧時間。 又’在第11圖的變更例中，-個B畫素6全體形成白 缺陷6a。在以喷墨方式製造的液晶彩色渡光基板1上，會 有數個畫素,昆色的情況。此時’彡留黑矩陣3而以雷射光 ，、、、射畫素全體，使畫素全體轉換成白缺陷6a，而塗佈修正 入 近的彩色濾光基板1上，隨著畫面尺寸的大型 化，一個畫素的尺寸也變大。僅在大畫素6的-部份產生 白缺陷63的情況下，將修正墨水7塗佈於大的白缺陷6a 畫素6内會有顏色不均的情況產生。於此為了防 畫素Θ的顏色不均’以雷射光照射畫素6全體而將晝 11 201027144 素6全體轉換成白缺陷63而塗佈修正墨水7。如此，將修 正墨水7塗佈於大的白缺陷㈣，在白缺陷&内改變塗 佈位置並塗佈修正墨水7複數次。 在第12圖中，使修正墨水7附著於塗布針8的前端， 使塗布針8的位置偏移而橫越複數次地將修正墨水7塗佈 於白缺陷6a上。此時，由於塗佈形狀重疊地塗佈複數次， 修正墨水7的厚度與缺陷尺寸小的情況相^匕會有不平均 的現象，而容易產生著色不平均。 第13圖為表不以帛12賴示的方法將修正墨水7塗 佈於白色缺陷6a的剖視圖。在第13圖中，塗佈於白缺陷 6a的修正墨水7無法形成均勾的厚度，其表面呈凹凸狀。 特別是在塗佈次數多的情況下’修正墨水7厚度不平均的 傾向會變強。 在第14圖中，對第13圖所包含的白缺陷&的區域以 第5圖所示的方法喷射包含溶劑16的蒸氣而表示修正墨 水7的厚度平均化的狀態。即使白缺陷6a的面積變大，由 於塗佈於白缺陷6a内的修正墨纟7吸收了溶劑Η，修正 墨水7的黏度降低，其流動性提高，可使修正墨水7的表 平一化若修正墨水7為紫外線硬化型，之後照射紫外 線而使修正墨水7硬化。又，若有需要可在之後燒結。 而且，包含溶劑16的蒸氣的氣體噴霧進行至使塗佈於 白缺陷6a的修正墨水7平坦化為止。喷霧時間係由溶劑 16的蒸氣的濃度、白缺陷6a的形狀、塗佈後的修正墨水7 的液量、修正墨水7的黏度決定。嘴霧時間例如設定為數 201027144 秒。又’包含溶劑16的蒸氣的氣鱧可連續喷霧，反覆進行 噴霧及停止，間歇地喷霧亦可。 在第15圖的變更例中，除了將溶劑16的蒸氣喷霧於 塗佈在白缺陷6a的修正墨水7上，也可以將吸收溶劑 的片件接近修正墨水7，而進行修正墨水7的平坦化。即 /谷劑蒸氣產生裝置25包含支持桿26以及固著於其前端的 片件27。由片件27吸收溶劑16。在將修正墨水7塗佈於 ❹白缺陷6a之後’使片件27接近白缺陷6a而相向。溶劑 16從片件27蒸發，其蒸氣被吸收至塗佈在白缺陷6a的修 正墨水7，而使修正墨水7平坦化。片件27為例如圓筒形 的海綿、不織布或多孔質材料。溶劑16的蒸發濃度係由相 向於採測濾光基板1的片件27的面積或體積、溶劑16的 吸收量、相向的間隙而不同。 又’第16圖為第1圖至第14圖所示的實施圖案修正 方法的圖案修正裝置30的全體構造的立體圖。在第16圖 ©中，在該㈣修正裝置3G中’在定盤31的中央部設置爽 頭32。在夾頭32上固定著成為修正對象的液晶彩色滤光 基板1。 又，在定盤31上搭載著起重機型的^^台”。^台 33係包含又轴#咖與門形的γ轴台咖。γ轴纟 設置成跨越夾頭32’於圖中的γ轴方向移動。X:台33a 搭載於Y軸台3 3b上，於圖中的χ方向移動。 下方向移動的Z軸台34。 35、透鏡36、塗佈單元 在X轴台33a上，搭載著於上 在Z軸台34上固定著觀察光學系 13 201027144 37以及,谷劑蒸氣產生裝置丨丨。藉由控制χ軸台3仏、γ軸 台33b及Ζ轴台34，可使觀察光學系35、透鏡％、塗佈 單元37以及溶劑蒸氣產生裝置u分別移動至基板丨的表 面的所希望的位置的上方。 觀察光學系35包含接觸透鏡21，用於觀察修正前後 的白缺陷6a等。透鏡36經由觀察光學系35以雷射光照射 基板1上的缺陷，藉由雷射操作將該缺陷變換成矩形的白 缺陷6a。塗佈單元37包含χγζ台、墨水槽及塗布針8等， 使塗布針8的前端部附著修正墨水7，使塗布針8的前端❿ 接觸白缺陷6a而將修正墨水7塗佈於白缺陷“上。溶劑 蒸氣產生裝置11使包含溶劑16的蒸氣的氣體經由喷嘴2〇 喷射至塗佈在白缺陷6a的修正墨水7上，使修正墨水7的 黏度降低而使修正墨水7的厚度平均化。 根據該圖案修正裝置30,產生於液晶彩色遽光基板i 的畫素6的白缺陷6a以雷射光照射而整形成矩形，將修正 墨水7塗佈於白缺陷6a上’將包含溶劑16的蒸氣的氣體 喷射於該修正墨水7上而使厚度平均。因此，不會產生塗 佈不均或顏色不均，可修正白缺m 6a，可提升修正部的品 質。 而且，除了喷嘴20與溶劑蒸氣產生裝置u之外，也 可搭載如第15圖所示的溶劑蒸氣產生裝置U。 於此所揭露的實施形態中，所有的特徵係舉例說明並 非用於限制本發明。本發明的範圍係由申請專利範圍所揭 露並非由上述說明所限定，與申請專利範圍相等意義及範 14 201027144 、圍内的所有變化均包含於本發明的範圍内。 【圖式簡單說明】 第1圖為本發明的一實施形態的圖案修正方法的修正 對象的液晶彩色濾光基板的主要部位的圖。 第2圖為第！圖中所示的包含白缺陷的畫素剖視圖。 第3a圖及第3b圖為將修正墨水塗佈於第2圖所示的 ❾ 白缺陷的工程的剖視圖》 第4圖為將修正墨水塗佈於第i圖所示的白缺陷的狀 態的圖。 第5圖為使塗佈於白缺陷的修正墨水的厚度平均化的 工程的剖視圖。 第6圖為由第5圖所示工程而使厚度平均化的修正墨 水的剖視圖。 第7圖為表示實施形態的變化例的剖視圖。 魯 第8圖為表示實施形態的其他變化例的剖視圖。 第9圖為表示實施形態的其他變化例的剖視圖。 第10圖為表不實施形態的其他變化例的剖視圖。 第11圖為實施形態的其他變化例的修正對象的液晶 彩色濾光基板的圖。 第12圖為將修正墨水塗佈於第U圖所示的白缺陷的 圖。 第13圖為以第12圖所示的方法所塗佈的修正墨水的 剖視圖。 15 201027144 第14圖為厚度平均化後的修正墨水的剖視圖。 第15圖為實施形態的其他變化例的剖視圖。 第16圖為實施第1〜14圖所示的圖案修正方法的圖案 修正裝置的構造的立體圖。 【主要元件符號說明】 1〜液晶彩色濾光基板； 2〜玻璃基板；Further, the amount of vapor of the solvent 16 has a relative relationship with the spraying time. When the amount of the modified ink cartridge 7 applied to the white defect 6a and the amount of vapor of the solvent 16 are known, various conditions required for planarization can be predicted. Further, by grasping the optimum correction conditions by experiments in advance, the conditions can be changed in accordance with the defects. Further, the environment of the room in which the defect correction is performed, for example, the difference in the drying property and the fluidity of the applied correction ink cartridge 7 due to the room temperature and the fishing degree, and therefore the amount of steam corresponding to the environment can be " With spray time. Further, in the modification of Fig. 11, the entire B pixel 6 is formed with the white defect 6a. In the liquid crystal color light-emitting substrate 1 manufactured by the ink jet method, there are a plurality of pixels, which are in the form of a quinque. At this time, the black matrix 3 is reserved, and the entire laser is converted into the white defect 6a by the laser light, and the entire pixel is applied, and the color filter substrate 1 is applied to the adjacent color filter substrate 1 along with the screen size. Larger, the size of one pixel is also larger. In the case where the white defect 63 is generated in the portion of the large pixel 6, the correction ink 7 is applied to the large white defect 6a pixel 6 to cause color unevenness. Here, in order to prevent color unevenness of the pixels, the entire surface of the pixel 6 is irradiated with laser light, and the entire ink is converted into the white defect 63, and the correction ink 7 is applied. Thus, the correction ink 7 is applied to a large white defect (4), the coating position is changed within the white defect & and the correction ink 7 is applied a plurality of times. In Fig. 12, the correction ink 7 is attached to the tip end of the coating needle 8, and the position of the coating needle 8 is shifted to apply the correction ink 7 to the white defect 6a over a plurality of times. At this time, since the application shape is overlapped and applied a plurality of times, the thickness of the correction ink 7 and the case where the defect size is small may be uneven, and color unevenness may easily occur. Fig. 13 is a cross-sectional view showing the correction ink 7 applied to the white defect 6a by the method shown in Fig. 12. In Fig. 13, the correction ink 7 applied to the white defect 6a cannot form a uniform hook thickness, and its surface has an uneven shape. In particular, when the number of application times is large, the tendency of the thickness of the correction ink 7 to be uneven is increased. In Fig. 14, the region of the white defect & which is included in Fig. 13 is sprayed with the vapor containing the solvent 16 in the manner shown in Fig. 5, and the thickness of the corrected ink 7 is averaged. Even if the area of the white defect 6a is increased, since the correction ink ray 7 applied in the white defect 6a absorbs the solvent Η, the viscosity of the correction ink 7 is lowered, and the fluidity is improved, so that the surface of the correction ink 7 can be corrected. The ink 7 is of an ultraviolet curing type, and then irradiated with ultraviolet rays to cure the correction ink 7. Moreover, it can be sintered later if necessary. Further, the gas spray containing the vapor of the solvent 16 is carried out until the correction ink 7 applied to the white defect 6a is flattened. The spraying time is determined by the concentration of the vapor of the solvent 16, the shape of the white defect 6a, the amount of the corrected ink 7 after application, and the viscosity of the correction ink 7. The mist time is set, for example, to 201027144 seconds. Further, the gas containing the vapor of the solvent 16 can be continuously sprayed, sprayed and stopped repeatedly, and intermittently sprayed. In the modified example of Fig. 15, in addition to spraying the vapor of the solvent 16 onto the correction ink 7 applied to the white defect 6a, the sheet of the solvent-absorbing material may be brought close to the correction ink 7, and the correction ink 7 may be flattened. Chemical. That is, the/small vapor generating device 25 includes a support rod 26 and a sheet member 27 fixed to the front end thereof. The solvent 16 is absorbed by the sheet member 27. After the correction ink 7 is applied to the chalk defect 6a, the sheet member 27 is brought close to the white defect 6a to face each other. The solvent 16 is evaporated from the sheet member 27, and the vapor is absorbed into the correction ink 7 coated on the white defect 6a, and the correction ink 7 is flattened. The sheet member 27 is, for example, a cylindrical sponge, a nonwoven fabric or a porous material. The evaporation concentration of the solvent 16 differs depending on the area or volume of the sheet member 27 facing the filter substrate 1, the absorption amount of the solvent 16, and the gap therebetween. Further, Fig. 16 is a perspective view showing the overall structure of the pattern correction device 30 for performing the pattern correction method shown in Figs. 1 to 14 . In Fig. 16, in the (four) correction device 3G, the head 32 is provided at the center portion of the fixed plate 31. The liquid crystal color filter substrate 1 to be corrected is fixed to the chuck 32. Further, a crane-type gantry is mounted on the fixed plate 31. The gantry 33 includes a y-axis table with a shaft #咖 and a gate shape. The γ-axis is disposed to cross the chuck 32' in the figure. X: The table 33a is mounted on the Y-axis table 3 3b and moves in the χ direction in the drawing. The Z-axis table 34 moves in the downward direction. 35. The lens 36 and the coating unit are mounted on the X-axis table 33a. The observation optical system 13 201027144 37 and the grain vapor generating device 固定 are fixed on the Z-axis stage 34. By controlling the cymbal stage 3仏, the γ-axis stage 33b, and the Ζ-axis stage 34, the observation optics can be made. The lens 35, the lens %, the coating unit 37, and the solvent vapor generating device u are respectively moved above the desired position of the surface of the substrate. The observation optical system 35 includes a contact lens 21 for observing white defects 6a before and after correction, etc. The lens 36 irradiates the defect on the substrate 1 with laser light through the observation optical system 35, and converts the defect into a rectangular white defect 6a by a laser operation. The coating unit 37 includes a χγζ, an ink tank, a coating needle 8, and the like. The correction ink 7 is attached to the front end portion of the coating needle 8, and the front end of the coating needle 8 is brought into contact with white. 6a notch 7 and a correction is applied to the ink white defects "on. The solvent vapor generation device 11 ejects the gas containing the vapor of the solvent 16 to the correction ink 7 coated on the white defect 6a via the nozzle 2, and lowers the viscosity of the correction ink 7 to average the thickness of the correction ink 7. According to the pattern correcting device 30, the white defect 6a of the pixel 6 generated on the liquid crystal color light-emitting substrate i is formed into a rectangular shape by irradiation with laser light, and the modified ink 7 is applied onto the white defect 6a. The gas is ejected onto the correction ink 7 to average the thickness. Therefore, uneven coating or uneven color can be produced, and the white missing m 6a can be corrected, and the quality of the correction portion can be improved. Further, in addition to the nozzle 20 and the solvent vapor generating device u, the solvent vapor generating device U as shown in Fig. 15 may be mounted. In the embodiments disclosed herein, all of the features are exemplified and are not intended to limit the invention. The scope of the present invention is defined by the scope of the claims, and is not limited by the scope of the claims, and all changes in the scope of the invention are included in the scope of the invention. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view showing a main part of a liquid crystal color filter substrate to which a pattern correction method according to an embodiment of the present invention is corrected. Figure 2 is the first! A cross-sectional view of a pixel containing white defects shown in the figure. Figs. 3a and 3b are cross-sectional views showing a process of applying the correction ink to the chalk defect shown in Fig. 2, and Fig. 4 is a view showing a state in which the correction ink is applied to the white defect shown in Fig. i. . Fig. 5 is a cross-sectional view showing a process for averaging the thickness of the correction ink applied to the white defect. Fig. 6 is a cross-sectional view showing the corrected ink whose thickness is averaged by the work shown in Fig. 5. Fig. 7 is a cross-sectional view showing a modification of the embodiment. Fig. 8 is a cross-sectional view showing another modification of the embodiment. Fig. 9 is a cross-sectional view showing another modification of the embodiment. Fig. 10 is a cross-sectional view showing another variation of the embodiment. Fig. 11 is a view showing a liquid crystal color filter substrate to be corrected in another variation of the embodiment. Fig. 12 is a view showing the application of the correction ink to the white defect shown in the U-picture. Fig. 13 is a cross-sectional view showing the correction ink applied by the method shown in Fig. 12. 15 201027144 Figure 14 is a cross-sectional view of the corrected ink after the thickness is averaged. Fig. 15 is a cross-sectional view showing another variation of the embodiment. Fig. 16 is a perspective view showing the structure of a pattern correction device for carrying out the pattern correction method shown in Figs. 1 to 14. [Main component symbol description] 1 ~ liquid crystal color filter substrate; 2 ~ glass substrate;
3〜黑矩陣； 4〜R畫素； 5〜G畫素； 6〜B畫素； 6a〜白缺陷； 7〜修正墨水； 8〜塗布針；3 ~ black matrix; 4 ~ R pixels; 5 ~ G pixels; 6 ~ B pixels; 6a ~ white defects; 7 ~ correction ink; 8 ~ coating needle;
9〜微喷注頭； 10〜氣體供給源； 11、25〜溶劑蒸氣產生裝置； 12〜調節器； 1 3〜電磁閥； 14〜計時器； 15〜容器； 1 6〜溶劑； 1 7〜濾、光層； 16 201027144 % 18、27〜片件； 1 9〜配管； 20〜喷嘴； 21〜接物透鏡； 22〜加熱器； 26〜支持桿； 30〜圖案修正裝置； 31〜定盤； 參 32〜夹頭； 33〜XY台； 33a〜X軸台； 33b〜Y軸台； 34〜Z軸台； 35〜觀察光學系； 36〜透鏡； 〇 37〜塗佈單元。9~ micro-injection head; 10~ gas supply source; 11, 25~ solvent vapor generating device; 12~ regulator; 1 3~ solenoid valve; 14~ timer; 15~ container; 1 6~ solvent; Filter, light layer; 16 201027144 % 18, 27 ~ piece; 1 9 ~ pipe; 20 ~ nozzle; 21 ~ lens lens; 22 ~ heater; 26 ~ support rod; 30 ~ pattern correction device; 31 ~ fixed plate ; 32~ chuck; 33~XY table; 33a~X axis table; 33b~Y axis table; 34~Z axis table; 35~ viewing optical system; 36~ lens; 〇37~ coating unit.