TW201014797A - Tin oxide particles and the method for preparing the same - Google Patents

Tin oxide particles and the method for preparing the same Download PDF

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TW201014797A
TW201014797A TW98122283A TW98122283A TW201014797A TW 201014797 A TW201014797 A TW 201014797A TW 98122283 A TW98122283 A TW 98122283A TW 98122283 A TW98122283 A TW 98122283A TW 201014797 A TW201014797 A TW 201014797A
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tin oxide
tin
oxide particles
compound
sample
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TW98122283A
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TWI523813B (en
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Norihiko Sanefuji
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Ishihara Sangyo Kaisha
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    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G19/00Compounds of tin
    • C01G19/02Oxides
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00Crystal-structural characteristics
    • C01P2002/70Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/72Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/01Particle morphology depicted by an image
    • C01P2004/03Particle morphology depicted by an image obtained by SEM
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/20Particle morphology extending in two dimensions, e.g. plate-like
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/61Micrometer sized, i.e. from 1-100 micrometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/62Submicrometer sized, i.e. from 0.1-1 micrometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/42Magnetic properties

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  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Catalysts (AREA)
  • Paints Or Removers (AREA)
  • Conductive Materials (AREA)
  • Non-Insulated Conductors (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
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Abstract

Novel tin oxide particles characterized in that in powder X-ray diffraction, the peak intensity ratio of the (101) plane to the (110) plane of tin oxide is 1.0 or higher. The tin oxide particles have a flake-like shape, and the longest width and shortest width of the face of the flake fall within the range of 0.05 to 40μm and the thickness is preferably 0.005 to 2μm. The tin oxide particles are produced by adding both a tin(II) compound and an alkali into a reactor in such a manner as to keep the pH in the reactor at 6 or below to hydrolyze the tin(II) compound. The obtained hydrolyzate may be further fired, as necessary. The tin oxide particles are useful as conductive material, catalyst, gas sensor, and so on, and can be either used as dispersions, or incorporated into coating materials, resin compositions, and so on.

Description

201014797 六、發明說明: 【發明所屬之技術領域】 本發明係關於氧化錫粒子及其製造方法。又,關於含 有此氧化錫粒子之分散體、塗料、樹脂組成物等。 【先前技術】 氧化錫一般已知有四價錫作爲構成成分的氧化錫( Sn02)、和二價錫作爲構成成分的氧化亞錫(Sn0)。氧 0 化錫爲半導體,雖然單體未顯示高導電性,但亦知藉由摻 混異原子則可取得高導電性。氧化錫爲透明性、物理化學 安定性優良的材料,係被期待於電性、電子用途的材料。 具體而言,於氧化錫中摻混銻、磷、氟等,因爲導電性優 良’故以導電性充塡劑型式混入塑膠和橡膠等,並被利用 作爲導電性塑膠的材料。更且,若使用配合上述導電性充 塡劑之塗料製作透明導電膜,則取得極低電阻且低霧値, φ 並且與基體之密合性及膜強度優良的膜,此類膜因可防止 OA機器等之顯示器和TV布朗管之影像表面帶電,故被使 用作爲電磁保護。又,透明導電膜亦可被利用於觸控面板 和液晶顯示器等之顯示裝置的透明電極。更且,以氧化錫 之燒結體作爲標的並以濺鍍法於玻璃上製作氧化錫薄膜, 製造透明導電性氧化物塗敷玻璃、熱線反射玻璃、低放射 玻璃、電熱玻璃等。另一方面,氧化亞錫爲溶解於硫酸等 並且被用於鍍錫浴。 氧化錫係將四價錫鹽水溶液與鹼性水溶液反應之沉澱 -5- 201014797 物煅燒而製造。例如專利文獻1爲記載,將四價錫鹽水溶 液與鹼性溶液之反應於pH爲〇_5〜4之範圍進行,生成含 錫沉澱物,其次,以400〜120(TC之溫度範圍煅燒。又, 專利文獻2爲記載,將四價錫鹽水溶液與鹼性水溶液於水 ' 中並行添加,一邊令中和反應液的pH保持於3以上,一 邊中和生成氧化錫的水合物,其次於該生成物的水中並行 添加氯化銻之溶液和鹸性水溶液,一邊令中和反應液的 pH保持於3以上,一邊中和在該生成物的表面生成氧化 _ 銻的水合物,其後煅燒,製造摻混銻之氧化錫的方法。另 一方面,關於氧化亞錫,例如專利文獻3爲記將氯化亞鍚 之水溶液與氫氧化鈉之水溶液混合反應,以pH 12〜13.5’ 以靜置狀態熟化2小時以上則可製造。 [先前技術文獻] (專利文獻) [專利文獻1]特開2002-029744號公報 [專利文獻2]專利第3647929號公報 @ [專利文獻3]特開平1-201 022號公報 【發明內容】 (發明所欲解決之問題) 如上述之專利文獻1、2般,使用四價之錫化合物, 藉由水解,中和反應所得之沉澱物予以熘燒所製造的氧化 錫’係具有微細的粒狀形狀,此些方法中,並無法製造具 有薄片狀等粒子形狀的氧化錫。另一方面,專利文獻3之 -6- 201014797 方法中,雖然使用二價錫化合物藉由中和反應取得平板狀 之氧化亞錫,但並無法取得厚度薄之薄片狀形狀的氧化亞 錫。並且,此氧化亞錫爲溶解於硫酸等且被使用於鍍錫浴 ,並未記載將氧化亞錫氧化製造氧化錫。 (解決問題之手段) 本發明者等人考慮藉由將氧化錫的粒子形狀作爲薄片 狀,形成薄的氧化錫膜,取得導電性等效果高的有用材料 ,並且硏究製造具有薄片狀粒子形狀之氧化錫粒子的方法 。其結果,發現若將二價錫化合物與鹼,以反應器內之 pH維持於6以下添加,並將錫化合物水解,則取得厚度 薄的薄片狀氧化亞錫粒子,將其煅燒則取得維持薄片狀形 狀之氧化錫粒子。f,發現上述之薄片狀氧化亞錫粒子及 薄片狀氧化錫粒子之粉末X射線繞射剖視圖,相對於氧化 錫(110)面之(101)面的波峰強度比(波峰高度比)爲 1.0以上,更且,即使.將其粉碎作成不定形狀亦可使上述 之波峰強度比維持於1.0以上,並且完成本發明。 即,本發明爲 (1) 一種氧化錫粒子,其特徵爲於粉末X射線 繞射中,相對於氧化錫(110 )面之(1 01 )面的波峰強度 比爲1.0以上、 (2) 如上述(1 )記載之氧化錫粒子,其中,氧 化錫爲具有氧化錫(Sn02 )之結晶構造、 如上述(1)或(2)記載之氧化錫粒子,其 201014797 中,具有不定形狀之粒子形狀、 (4) 如上述(1)或(2)記載之氧化錫粒子,其 中,具有薄片狀之粒子形狀、 (5) 如上述(1)記載之氧化錫粒子,其中,氧 、 化錫爲具有氧化亞錫(SnO)之結晶構造,且,具有薄片 . 狀之粒子形狀、 (6) 如上述(4)或(5)記載之氧化錫粒子,其 中,薄片面之厚度爲5μπι以下、 (7) 如上述(4)或(5)記載之氧化錫粒子,其 中,薄片面之最長寬度及最短寬度分別爲〇.〇5〜40μιη之 範圍,厚度爲0.005〜2μπι之範圍、 (8 ) 如上述(1 )〜(7 )中任一項記載之氧化錫201014797 6. Description of the Invention: TECHNICAL FIELD OF THE INVENTION The present invention relates to tin oxide particles and a method of manufacturing the same. Further, a dispersion containing the tin oxide particles, a coating material, a resin composition, and the like. [Prior Art] Tin oxide is generally known as tin oxide (Sn02) having tetravalent tin as a constituent component and stannous oxide (Sn0) having divalent tin as a constituent component. Oxide Tin is a semiconductor. Although the monomer does not exhibit high conductivity, it is also known that high conductivity can be obtained by blending heteroatoms. Tin oxide is a material excellent in transparency and physicochemical stability, and is expected to be used for electrical and electronic applications. Specifically, antimony, phosphorus, fluorine, and the like are blended in tin oxide, and since it is excellent in electrical conductivity, it is mixed with plastic, rubber, or the like in the form of a conductive filler, and is used as a material of a conductive plastic. Further, when a transparent conductive film is formed using a coating material containing the above-mentioned conductive filler, a film having extremely low electrical resistance and low haze, φ and excellent adhesion to a substrate and film strength can be obtained. The display surface of the OA machine and the image of the TV Brown tube are charged, so they are used as electromagnetic protection. Further, the transparent conductive film can also be used for a transparent electrode of a display device such as a touch panel or a liquid crystal display. Further, a tin oxide film is formed on the glass by sputtering using a sintered body of tin oxide as a target to produce a transparent conductive oxide-coated glass, a heat-reflecting glass, a low-radiation glass, an electrothermal glass, or the like. On the other hand, stannous oxide is dissolved in sulfuric acid or the like and used in a tin plating bath. The tin oxide is produced by calcining a precipitate of a tetravalent tin salt aqueous solution and an alkaline aqueous solution. For example, Patent Document 1 describes that a reaction between a tetravalent tin salt aqueous solution and an alkaline solution is carried out at a pH of 〇5 to 4 to form a tin-containing precipitate, and secondly, it is calcined at a temperature of 400 to 120 (TC). Further, Patent Document 2 describes that a tetravalent tin salt aqueous solution and an alkaline aqueous solution are added in parallel in water', while maintaining the pH of the neutralization reaction liquid at 3 or more, and neutralizing the hydrate forming tin oxide, followed by In the water of the product, a ruthenium chloride solution and an aqueous solution are added in parallel, and while maintaining the pH of the neutralization reaction liquid at 3 or more, a hydrate of oxidized ruthenium is formed on the surface of the product, and then calcined. A method of producing tin oxide mixed with bismuth. On the other hand, regarding stannous oxide, for example, Patent Document 3 is a mixture of an aqueous solution of cerium chloride and an aqueous solution of sodium hydroxide, and is reacted at a pH of 12 to 13.5'. In the case of the aging, the aging is carried out for 2 hours or more. [PRIOR ART DOCUMENT] [Patent Document 1] JP-A-2002-029744 [Patent Document 2] Patent No. 3647929 [PATENT DOCUMENT 3] -201 022 SUMMARY OF THE INVENTION (Problems to be Solved by the Invention) As in the above-mentioned Patent Documents 1 and 2, a tin oxide compound produced by calcining a precipitate obtained by hydrolysis and neutralization reaction using a tetravalent tin compound is used. In such a method, it is not possible to produce tin oxide having a particle shape such as a flaky shape. On the other hand, in the method of -6-201014797 of Patent Document 3, although a divalent tin compound is used, it is neutralized. In the reaction, a flat-shaped stannous oxide is obtained, but it is not possible to obtain a sheet-like shape of stannous oxide. The stannous oxide is dissolved in sulfuric acid or the like and used in a tin plating bath, and no stannous oxide is described. Oxidation to produce tin oxide. (Means for Solving the Problem) The present inventors have considered that a thin tin oxide film is formed by using a particle shape of tin oxide as a sheet, and a useful material having high effects such as conductivity is obtained, and the material is manufactured. A method of oxidizing tin particles having a flaky particle shape. As a result, it was found that when a divalent tin compound and a base are added, the pH in the reactor is maintained at 6 or less, and tin is added. When the compound is hydrolyzed, flaky cuprous oxide particles having a small thickness are obtained, and the tin oxide particles which maintain the flaky shape are obtained by calcination. f, and the powder X of the flaky oxidized stannous particles and the flaky tin oxide particles are found. In the cross-sectional view of the ray, the peak intensity ratio (peak height ratio) of the (101) plane of the tin oxide (110) plane is 1.0 or more, and even if it is pulverized into an indefinite shape, the above-described peak intensity ratio can be made. The present invention is completed at 1.0 or more. That is, the present invention is (1) a tin oxide particle characterized by a peak of a (1 01 ) plane with respect to a (110) plane of a tin oxide in powder X-ray diffraction. (2) The tin oxide particles according to the above (1), wherein the tin oxide is a crystal structure having tin oxide (Sn02), and the tin oxide particles described in (1) or (2) above, In the case of the above-mentioned (1) or (2), the tin oxide particles according to the above (1) or (2) have a flaky particle shape, and (5) the tin oxide described in the above (1). Particles, among them, The tin is a crystal structure having stannous oxide (SnO), and has a particle shape of a sheet. (6) The tin oxide particles according to (4) or (5) above, wherein the thickness of the sheet surface is (5) The tin oxide particles according to the above (4) or (5), wherein the longest width and the shortest width of the sheet surface are in the range of 〇. 5 to 40 μm, and the thickness is in the range of 0.005 to 2 μm. (8) The tin oxide according to any one of the above (1) to (7)

I 粒子,其中,進一步含有錫以外之無機元素、 (9) 如上述(1)〜(8)中任一項記載之氧化錫 粒子,其中,於氧化錫粒子之表面被覆無機化合物及/或 有機化合物、 q (10) 如上述(9)記載之氧化錫粒子,其中,於 氧化錫粒子之表面被覆導電性無機化合物、 (11) —種氧化錫粒子之製造方法,其特徵爲將錫 (II )化合物與鹼,以反應器內之pH維持於6以下添加 ,將錫(Π)化合物水解、 (12) 如(11)記載之氧化錫粒子之製造方法,其 中,於加入50°C以上溫度水之反應器中,添加錫(π )化 合物和鹼、 -8- 201014797 (13) —種氧化錫粒子之製造方法’其特徵爲將錫 (II)化合物與鹼與無機化合物,以反應器內之pH維持 於6以下添加,將錫(II )化合物水解、 (14) 如上述(1 1 )〜(1 3 )中任一項記載之氧化 錫粒子之製造方法,其中,氧化錫爲具有氧化亞錫之結晶 構造、 (15) —種氧化錫粒子之製造方法,其特徵爲將如 • 上述(11)〜(14)中任一項記載之方法所得之錫(II) 化合物的水解生成物進行煅燒、 • (16) 如上述(15)記載之氧化錫粒子之製造方法 ' ,其中,將錫(II)化合物之水解生成物與熔劑混合煅燒 、 (17) 如上述(15)或(16)記載之氧化錫粒子之 製造方法,其中,氧化錫爲具有氧化錫之結晶構造、 (18) —種氧化錫粒子之製造方法,其特徵爲將如 φ 上述(11)〜(17)中任一項記載之方法所得的氧化錫進 行粉碎、 (19) 一種氧化錫粒子之製造方法,其特徵爲於如 上述(11)〜(18)中任一項記載之方法所得之氧化錫粒 子的表面被覆無機化合物及/或有機化合物、 (20) 如上述(19)記載之氧化錫粒子之製造方法 ’其中,被覆無機化合物及/或有機化合物後煅燒、 (21) —種分散體,其特徵爲含有如上述(1)〜 (1 0 )中任一項記載之氧化錫粒子、 -9 - 201014797 (22) —種塗料,其特徵爲含有如上述(1)〜( 1 〇 )中任一項記載之氧化錫粒子、 (2 3 ) —種樹脂組成物,其特徵爲含有如上述(1 )〜(10)中任一項記載之氧化錫粒子、 (24) —種氧化錫膜,其特徵爲於基材上塗佈如上 述(21)記載之分散體或如上述(22)記載之塗料、 (25) —種導電性材料,其特徵爲含有如上述(1 )〜(1〇)中任一項記載之氧化錫粒子、 (26) —種觸媒,其特徵爲含有如上述(1)〜( 10)中任一項記載之氧化錫粒子、 (27) —種氣體感應器,其特徵爲含有如上述(1 )〜(10)中任一項記載之氧化錫粒子。 (發明之效果) 本發明之氧化錫粒子,於粉末X射線繞射中,相對於 氧化錫(11 〇 )面之(1 〇 1 )面的波峰強度比爲1. 〇以上, 具有特異的X射線剖視圖。利用此特性,被使用於導電性 材料、觸媒、氣體感應器等。 又,被使用於具有薄片狀之粒子形狀,利用其特異的 粒子形狀,形成薄氧化錫膜之材料、和導電性材料等。 本發明之氧化錫粒子之製造方法不需要龐大之裝置, 且使用較廉價之原材料,故可較簡單製造工業上有利之具 有特異之X射線剖視圖的氧化錫粒子和具有特異之粒子形 狀之氧化錫粒子的有利方法。 -10- 201014797 【實施方式】 本發明之氧化錫粒子於粉末X射線繞射中’相對於氧 化錫(110)面之(101)面的波峰強度比爲1.0以上。 本發明之氧化錫可爲氧化亞錫,也可爲氧化錫,也可 分別含有彼等,亦可含有氫氧化亞錫、氫氧化錫等。氧化 錫中,由於可用於各種用途,故以具有氧化亞錫或氧化錫 1 之結晶構造者爲佳,以具有氧化錫之結晶構造者爲更佳, 且氧化錫全部爲具有氧化錫之結晶構造者爲再佳。如先前 • 記載般,本發明之氧化錫爲具有特殊的X射線剖視圖,具 體而言,若以粉末X射線繞射(線源;Cu-KoO確認氧化 錫的結晶構造,則於繞射角(2Θ ) 3 3.8°左右出現之氧化錫 之(101)面的波峰高度,與繞射角(2Θ) 26.6°左右出現 之(110)面的波峰高度相同或者更高。又,若以粉末X 射線繞射(線源;Cu-Κα )確認氧化亞錫的結晶構造,則 φ 於繞射角(2Θ ) 29.9°左右出現之氧化亞錫之(101 )面的 波峰高度,與繞射角(2Θ) 33.3°左右出現之(110)面的 波峰高度相同或者更高。即,於粉末X射線繞射中,氧化 錫之(101)面之波峰高度/(110)面的波峰高度所示之 波峰強度比爲1.0以上,以1.1以上爲更佳,2以上爲再 佳。 此現象通常於本發明之薄片狀氧化亞錫粒子及氧化錫 粒子之情形中察見,另一方面,於先前之粒狀粒子之情形 中,(101)面之波峰高度爲比(110)面之波峰高度更低 -11 - 201014797 ,因此,本發明之薄片狀氧化錫粒子爲與先前之粒狀粒子 不同,認爲於(101)面配向。若將本發明之薄片狀氧化 錫粒子予以強力粉碎破壞,則因上述之波峰強度比爲逐漸 變小,因此可理解以波峰強度比可特定本發明之薄片狀氧 化錫粒子的特徵。另外,根據粉碎的程度,即使爲包含各 種形狀的不定形狀,有時亦可維持上述之波峰強度比爲 1.0以上。因此,本發明之氧化錫粒子的粒子形狀一般爲 薄片狀形狀,但只要滿足波峰強度比,則亦可爲包含將此 薄片狀形狀粉碎所得之各種形狀的不定形狀。 所謂薄片狀形狀,係指於具有最長寬度及最短寬度之 薄片中,具有相對於此薄片面有意義小且垂直方向厚度之 形狀,較佳,最長寬度/厚度爲4以上,更佳,爲10〜 1 000左右,一般包含所謂之薄層狀、薄板狀、片狀、薄片 狀、奈米片狀之形狀。相對於薄片面之垂直方向的厚度爲 薄至5 μιη以下者爲佳,以0.0005〜5 μιη之範圍爲更佳, 以0.005〜2 μπι之範圍爲再佳,以0.01〜2 μιη之範圍爲再 更佳。薄片面之最長寬度,或最短寬度,由粉體特性之觀 點而言分別爲0.05〜40μηι之範圍爲佳,以0.5〜30μιη之 範圍爲更佳。薄片狀形狀和其大小可根據電子顯微鏡觀察 求出。薄片狀形狀和其大小可根據電子顯微鏡觀察求出。 於氧化錫粒子中,亦可含有Sn以外的無機元素。無 機元素,例如於賦予導電性等之目的下,亦可將一部分之 Sn以Sb、P、Nb、W等之無機元素取代,又,亦可經Si 、A1等之無機元素取代。其取代量可根據無機元素而適當 -12- 201014797 設定。又,由溶劑之分散性、樹脂之親和性等觀點而言, 氧化錫之粒子表面亦可經先前之界面活性劑、偶合劑、羧 酸、多元醇、胺、矽氧烷等之有機化合物和二氧化矽、氧 化鋁等之無機化合物被覆。又,亦可於氧化錫之粒子表面 被覆已摻混Sb、P、Nb、W等之氧化錫等之導電性無機化 合物。於氧化錫粒子之表面被覆無機化合物及/或有機化 合物、導電性無機化合物之份量可適當設定。 本發明之具有特異之X射線剖視圖的氧化錫粒子,例 9 如,將錫(II)化合物(Sn2+)與鹼維持於pH6以下反應 * ,將錫(II)化合物水解則可取得。錫(II)化合物可使 * 用氯化錫(II)等之二價錫化合物。水溶性之錫(Π )化 合物爲佳,氯化錫(II)爲更佳。錫(II)化合物之濃度 ,於溶解於水中使用時,相對於水以0.05〜150重量%爲 佳,更佳爲1.0〜100重量%。鹼可使用氫氧化鈉、氫氧化 鉀、氫氧化鋰等之氫氧化鹼、碳酸鈉等之碳酸鹼、碳酸銨 φ 等之銨化合物、氨等,其中以氫氧化鹼,特別以氫氧化鈉 爲佳。錫(II)化合物與鹼之添加爲將反應器內之pH — 邊調整爲6以下一邊添加,較佳調整爲pH爲3〜6,更佳 爲3.5〜5.5 —邊添加。於pH高於6之中性附近,易生成 錫的酸氫氧化物(Siu〇4(OH)4 ),其並非薄片狀之形狀。 又,於pH爲9以上則有時變成平板狀,但其厚度爲大於 5 μιη 〇 錫(II )化合物與鹼之添加方法可列舉,於反應器中 預先添加錫(II )化合物後添加鹼,於反應器中預先添加 -13- 201014797 鹼後添加錫(II)化合物,於反應器中將錫(II )化合物 與鹼同時並行添加的方法。以其一種方法,或者組合二種 以上之方法亦可,但以同時並行添加錫(II )化合物與鹼 爲佳。若添加後之反應器溫度爲50。(:以上,則可有效進行 錫(II)化合物之水解故爲佳。添加錫(II )化合物(或 鹼)並升溫至5 0 °c以上之後添加鹸(或錫(II )化合物) 亦可,預先於反應器中加入水,且將此水溫度作成50°C以 上之後,將錫(II)化合物與鹼同時並行添加亦可,以後 者爲佳。較佳溫度爲70〜105 °C左右,更佳溫度爲85〜 1 0 5 °C左右。 上述所謂之同時並行添加,係指兩者分別各以少量且 連續或間歇性添加至反應器的方法。具體而言,將兩者歷 10分鐘〜10小時左右同時添加爲佳。 添加錫(II)化合物與鹼後,若進行熟化,則氧化亞 錫的結晶性更高故爲佳。熟化溫度爲50°c以上爲佳,以 70〜105 °C左右爲較佳,以90〜105 °C左右爲更佳。熟化時 間爲5分鐘〜6小時左右爲佳。上述之水解反應和熟化爲 以錫價數保持2價般,在氮氣等之非氧化性環境氣體下進 行,但亦可於通常的大氣中。 如上述將錫(Π )化合物水解,取得具有氧化亞錫之 結晶構造的氧化錫粒子,特別爲薄片狀氧化亞錫粒子。其 後,視需要爲了除去水溶液中存在之不需要的電解質,進 行洗淨。洗淨時爲了令生成的水解生成物凝集,乃添加 pH調整劑。所使用之pH調整劑,可列舉鹽酸、硫酸等 -14- 201014797 之無機酸和氫氧化鈉等之鹼。洗淨後,視需要,予以固液 分離,進一步乾燥。固液分離上,可使用濾紙加壓、滾筒 加壓等之過濾器,又,於乾燥上可使用帶式加熱器、分批 式加熱器、噴霧乾燥機等。乾燥爲以錫價數保持2價般, 在氮氣等之非氧化性環境氣體下進行,但亦可於通常的大 氣中乾燥。乾燥溫度爲50〜120 °C之範圍爲佳。更且,乾 燥後,視需要亦可煅燒, » ,於氮、氬、氫等之非氧 或煅燒後,根據氧化錫粒 等之衝擊粉碎機、輥磨、 、滾筒粉碎機、顎式粉碎 氣流粉碎機進行乾式粉碎 若將如此處理所得之 粒子,特別爲薄片狀氧化 錫之結晶構造的氧化錫粒 φ 較佳爲取得全部之氧化錫 煅燒的溫度可適當設定, 錫氧化之溫度更高之溫度 溫度爲佳。更佳爲600〜 上述範圍,則生成的氧化 ,煅燒的環境氣體並無特 氣體爲佳。烟燒上,可使 道窖等公知之加熱熘燒爐 化鈉、氯化錫等氯化合物 且以120〜500°C範圍之溫度爲佳 化性環境氣體下爲更佳。乾燥後 子的凝集程度,使用錘磨、針磨 粉碎機、解碎機等之磨碎粉碎機 機等之壓縮粉碎機、噴射磨等之 亦可。 具有氧化亞錫結晶構造之氧化錫 亞錫粒子煅燒,則取得具有氧化 子,特別爲薄片狀氧化錫粒子, 爲氧化錫的薄片狀氧化錫粒子。 若薄片狀氧化亞錫粒子爲比氧化 即可,以 5 0 0 °C〜1 1 〇 〇 °C範圍之 1 〇〇〇 °c之範圍。煅燒溫度若高於 錫粒子間進行燒結故爲不佳。又 別限制,但以空氣(大氣)環境 用流動爐、靜置爐、旋轉窖、隧 。煅燒時亦可添加熔劑,例如氯 。煅燒後,根據燒結之程度,使 -15- 201014797 用錘磨、針磨等之衝擊粉碎機、輥磨、粉碎機、解碎機等 之磨碎粉碎機、滾筒粉碎機、顎式粉碎機等之壓縮粉碎機 、噴射磨等之氣流粉碎機進行乾式粉碎亦可。 於氧化錫粒子中含有上述之無機元素上,將錫(Π) 化合物與鹼反應’將錫(II)化合物水解時令無機化合物 存在進行爲佳,另外,此時亦令反應器內之pH維持在6 以下添加。具體而言,可列舉 (1 )於反應器中預先含有無機化合物後,添加錫(U )化合物和鹼,將錫(Π)化合物水解的方法、 (2 )於反應器中添加錫(II)化合物和鹼和無機化合 物,將錫(II)化合物水解的方法,此方法爲例如包含, 分別添加錫(II )化合物和鹼和無機化合物的方法,於錫 (II)化合物溶液中預先混合添加無機化合物的方法,於 鹼中預先混合添加無機化合物的方法等。 (3)於反應器中添加錫(II)化合物和鹼,將錫(II )化合物水解後,添加無機化合物的方法等。 又,其他之方法,於氧化錫之漿料中添加無機化合物 亦可,於漿料中將無機化合物予以中和析出,並於氧化錫 粒子中含有無機元素爲更佳。又,亦可氧化錫之粉末中, 添加混合無機化合物。 於氧化錫粒子中含有無機元素後,視需要,過濾、洗 淨,並且乾燥亦可。氧化亞錫之乾燥爲以錫價數保持2價 般,在氮氣等之非氧化性環境氣體下進行,但亦可於通常 的大氣中乾燥。氧化錫的乾燥亦可於通常的大氣中。乾燥 -16- 201014797 的溫度爲50〜120°C之範圍爲佳。更且,乾燥後,視需要 煅燒亦可,藉由此煅燒可將一部分的錫元素以無機元素取 代。煅燒溫度爲1 20〜1 1 〇〇 °C之範圍爲佳,環境氣體爲空 氣(大氣)環境氣體下爲佳,以氮、氳、氫等之非氧化性 環境氣體下爲更佳。 於乾燥後或煅燒後,根據氧化錫粒子的凝集程度,使 用錘磨、針磨等之衝擊粉碎機、輥磨、粉碎機、解碎機等 之磨碎粉碎機、滾筒粉碎機、顎式粉碎機等之壓縮粉碎機 、噴射磨等之氣流粉碎機進行乾式粉碎亦可。 於氧化錫粒子之表面被覆無機化合物及/或有機化合 物上,可使用先前之表面處理方法,具體而言對氧化錫之 漿料添加被覆無機化合物和有機化合物爲佳,於漿料中將 無機化合物和有機化合物予以中和析出並被覆爲更佳。又 ,對氧化錫之粉末,添加混合被覆無機化合物和有機化合 物亦可。 又,於氧化錫粒子之表面被覆導電性無機化合物上, 對氧化錫之漿料添加被覆成爲導電性無機化合物之化合物 爲佳,且以漿料中成爲導電性無機化合物之化合物被中和 或水解析出被覆爲更佳。 對氧化錫粒子之表面被覆無機化合物及/或有機化合 物或導電性無機化合物後,視需要,過濾、洗淨,並且乾 燥亦可。氧化亞錫之乾燥爲以錫價數保持2價般,在氮氣 等之非氧化性環境氣體下進行,但亦可於通常的大氣中乾 燥。氧化錫的乾燥亦可於通常的大氣中。乾燥的溫度爲50 -17- 201014797 〜120 °C之範圍爲佳。更且,乾燥後,視需要煅燒亦可, 煅燒溫度爲120〜1100 °C之範圍爲佳,環境氣體爲空氣( 大氣)環境氣體下爲佳,以氮、氬、氫等之非氧化性環境 氣體下爲更佳。 於乾燥後或煨燒後,根據氧化錫粒子的凝集程度,使 用錘磨、針磨等之衝擊粉碎機、輥磨、粉碎機、解碎機等 之磨碎粉碎機、滾筒粉碎機、顎式粉碎機等之壓縮粉碎機 、噴射磨等之氣流粉碎機進行乾式粉碎亦可。 將上述之氧化錫粒子分散於溶劑,可作成分散體。將 氧化錫粒子分散的溶劑,可使用冰或醇、二甲基甲醯胺( DMF)、酮等之有機溶劑、或其混合物,於工業上使用水 作爲主體的水性溶劑、或二甲基甲醯胺(DMF )、酮爲佳 。酮可例示丙酮、2-丁酮、甲基乙基酮等。分散體中之氧 化錫粒子的濃度可適當設定,例如0.1〜10g/l左右爲佳。 又,爲了改良分散性,亦可適時使用離心機等。 又,將上述之氧化錫粒子分散於溶劑並且配合樹脂黏 合劑,可作成塗料。樹脂黏合劑具體而言可列舉(1 )無 機系黏合劑((a )聚合性矽化合物(水解性矽烷或其水 解生成物或其部分縮合物、水玻璃、膠體二氧化矽、有機 基聚矽氧烷等)、(b)金屬醇鹽類等)、(2)有機系黏 合劑(醇酸系樹脂、丙烯酸系樹脂、聚酯系樹脂、環氧系 樹脂、氟系樹脂、改性聚矽氧系樹脂)等。 於上述之分散體和塗料中,除了氧化錫粒子、溶劑、 樹脂黏合劑以外,在不妨礙本發明效果之範圍下,亦可含 -18- 201014797 有分散劑、pH調整劑、消泡劑、乳化劑、著色劑、增量 劑、防黴劑、硬化輔助劑、增黏劑等之各種添加劑、充塡 劑等作爲第三成分。分散劑可列舉(1 )界面活性劑((a )陰離子系(羧酸鹽、硫酸酯鹽、磺酸鹽、磷酸酯鹽等) 、(b)陽離子系(烷基胺鹽、烷基胺之四級銨鹽、芳香 族四級銨鹽、雜環四級銨鹽等)、(c)兩性(甜菜鹼型 、胺基酸型、烷基胺氧化物、含氮雜環型等)、(d)非 p 離子系(醚型、醚酯型、酯型、含氮型等)等、(2)聚 矽氧系分散劑(烷基改性聚矽氧烷、聚氧伸烷基改性聚矽 氧烷等)、(3)磷酸鹽系分散劑(磷酸鈉、焦磷酸鈉、 鄰磷酸鈉、偏磷酸鈉、三聚磷酸鈉等)、(4)烷醇胺類 (胺甲基丙醇、胺甲基丙二醇等)等。分散體和塗料中之 氧化錫粒子的配合量、其他添加劑的配合量等可適當設定 〇 將上述錫(II)化合物水解所得之生成物(薄片狀氧 φ 化亞錫粒子),即使於製造狀態亦爲薄片狀氧化錫粒子以 分散之狀態,故將其直接使用作爲含有薄片狀氧化錫粒子 之分散體亦可,或者,將其後固液分離之薄片狀氧化錫粒 子於溶劑中再分散供使用亦可。又,將乾燥之粉末、煅燒 之粉末、含有無機元素之粉末、表面被覆處理之粉末或粉 碎之粉末,特別爲薄片狀氧化錫粒子之粉末於溶劑中再分 散亦可。再分散可使用通常的攪拌機、膠體磨、球磨、珠 粒磨、超音波等之分散機,此時,可添加上述的第三成分 。又,爲了改良分散性’亦可適時使用離心機等。 -19- 201014797 此類分散體和塗料爲長期保存安定性優良,在基材上 塗敷,並且乾燥或煅燒則可取得氧化錫膜。在基材上塗敷 之方法爲自旋塗敷、噴霧塗敷、滾筒塗敷、浸漬塗敷、流 動塗敷、刀塗敷、靜電塗敷、棒塗敷、型板塗敷、刷塗、 滴下液滴之方法等一般之方法可無限制使用。若膜厚更厚 ,則亦可進行重覆塗敷。若由塗敷物中除去溶劑則成膜出 氧化錫膜。在室溫〜800°C範圍之溫度下進行成膜爲佳。 更佳溫度爲根據溶劑之沸點,例如,若爲水性溶劑則以室 溫〜150 °C之範圍爲佳,更佳爲100〜150 °C之範圍。 又,氧化錫粒子與樹脂混合,如上述作成塗料、油墨 等之液狀樹脂組成物亦可,或者,於樹脂中混合氧化錫粒 子作成塑膠成形體、片、膜等之固體樹脂組成物亦可。此 類樹脂可適當使用上述之樹脂黏合劑和生物分解性樹脂、 紫外線硬化性樹脂、熱硬化性樹脂等,且氧化錫粒子之配 合量、其他添加劑之配合量等可適當設定。 上述之氧化錫粒子可使用於各種機能性材料用途。例 如,亦可使用於導電性充塡劑、觸媒、觸媒載體、氣體感 應器、光觸媒、紅外線遮蔽劑、陶瓷、金屬之添加劑、硏 磨材等。氧化錫粒子爲(1 01 )面之結晶性高,或者,具 有薄片狀之粒子形狀,因此適合使用於導電性充塡劑、觸 媒、觸媒載體、氣體感應器。導電性充塡劑可使用於防靜 電劑、電極材料等。觸媒可使用以丙烯氧化生丙烯醛的氧 化觸媒,以氨之NO的選擇性還原觸媒等’觸媒載體可使 用於甲烷之氧化觸媒用的載體等。又,氣體感應器可使用 -20-(I) The tin oxide particle according to any one of the above (1) to (8), wherein the surface of the tin oxide particle is coated with an inorganic compound and/or organic The tin oxide particle according to the above (9), wherein the surface of the tin oxide particle is coated with a conductive inorganic compound, and the method for producing (11) a tin oxide particle is characterized in that tin (II) is used. The compound and the base are added to the pH of the reactor to be maintained at 6 or less to hydrolyze the tin (antimony) compound, and (12) the method for producing tin oxide particles according to (11), wherein a temperature of 50 ° C or higher is added. In the water reactor, a tin (π) compound and a base are added, and -8-201014797 (13) is a method for producing tin oxide particles, which is characterized in that a tin (II) compound and a base and an inorganic compound are used in the reactor. The method for producing a tin oxide particle according to any one of the above (1) to (1), wherein the tin oxide is oxidized, wherein the tin oxide is oxidized. Crystal structure of stannous, (15) - oxygen species A method for producing a tin-based particle, which is characterized in that the hydrolyzed product of the tin (II) compound obtained by the method according to any one of the above (11) to (14) is calcined, and (16) as described above (15) And a method for producing a tin oxide particle according to the above (15) or (16), wherein the method for producing a tin oxide particle according to the above (15) or (16) is the method for producing a tin oxide particle according to the above (15) or (16), wherein The tin oxide is a crystal structure having a tin oxide, and (18) a method for producing a tin oxide particle, characterized in that the tin oxide obtained by the method according to any one of the above (11) to (17) is pulverized. (19) A method for producing a tin oxide particle, characterized in that the surface of the tin oxide particle obtained by the method according to any one of the above (11) to (18) is coated with an inorganic compound and/or an organic compound, (20) The method for producing tin oxide particles according to the above (19), wherein the inorganic compound and/or the organic compound are coated and then calcined, and the (21) dispersion is characterized by containing (1) to (1 0) as described above. Tin oxide particles as described in any one of them A coating material containing the tin oxide particles according to any one of the above (1) to (1), and a resin composition of the above (2), characterized in that it is characterized in that The tin oxide particle according to any one of the above (1) to (10), and the tin oxide film of (24), characterized in that the dispersion according to the above (21) is applied onto a substrate or as described above. (22) A coating material according to (22), wherein the conductive material is characterized by containing the tin oxide particles according to any one of the above (1) to (1), and (26) a catalyst. The tin oxide particle according to any one of the above (1) to (10), which is characterized in that the gas sensor according to any one of the above (1) to (10) is contained. Tin particles. (Effect of the Invention) The tin oxide particles of the present invention have a specific X at a peak intensity ratio of (1 〇 1 ) plane to the (1 〇 1 ) plane of the tin oxide (11 〇) plane in powder X-ray diffraction. A ray cutaway view. This property is used for conductive materials, catalysts, gas sensors, and the like. Further, it is used in a particle shape having a flaky shape, and a material of a thin tin oxide film, a conductive material, or the like is formed by using a specific particle shape. The method for producing tin oxide particles of the present invention does not require a bulky device and uses a relatively inexpensive raw material, so that it is relatively simple to manufacture industrially advantageous tin oxide particles having a specific X-ray cross-sectional view and tin oxide having a specific particle shape. An advantageous method of particles. -10-201014797 [Embodiment] The peak intensity ratio of the tin oxide particles of the present invention in the powder X-ray diffraction with respect to the (101) plane of the tin oxide (110) plane is 1.0 or more. The tin oxide of the present invention may be stannous oxide or tin oxide, or may contain each of them, and may contain stannous hydroxide, tin hydroxide or the like. In tin oxide, since it can be used for various purposes, it is preferable to use a crystal structure having stannous oxide or tin oxide 1, and a crystal structure having tin oxide is preferable, and all the tin oxides are crystal structures having tin oxide. It is better. As described in the foregoing, the tin oxide of the present invention has a special X-ray cross-sectional view, specifically, by powder X-ray diffraction (line source; Cu-KoO confirms the crystal structure of tin oxide, at the diffraction angle ( 2Θ) 3 The peak height of the (101) plane of tin oxide appearing at around 3.8° is the same as or higher than the peak height of the (110) plane appearing at a diffraction angle (2Θ) of about 26.6°. Also, if powder X-ray is used The diffraction (line source; Cu-Κα) confirms the crystal structure of stannous oxide, and then the peak height of the (101) plane of the stannous oxide which appears at a diffraction angle (2Θ) of 29.9°, and the diffraction angle (2Θ The peak height of the (110) plane appearing at around 33.3° is the same or higher. That is, the peak of the peak height of the (101) plane of the tin oxide / the peak height of the (110) plane in the powder X-ray diffraction The intensity ratio is 1.0 or more, more preferably 1.1 or more, and 2 or more is more preferable. This phenomenon is generally observed in the case of the flaky cuprous oxide particles and tin oxide particles of the present invention, and on the other hand, in the prior grain In the case of a particle, the peak height of the (101) plane is a ratio (110) plane The peak height is lower -11 - 201014797. Therefore, the flaky tin oxide particles of the present invention are different from the conventional granulated particles, and are considered to be aligned in the (101) plane. If the flaky tin oxide particles of the present invention are strongly pulverized In the case of the above-described peak intensity ratio, the peak intensity ratio is gradually reduced, so that it is understood that the peak intensity ratio can specify the characteristics of the flaky tin oxide particles of the present invention. Further, depending on the degree of pulverization, even if it is an indefinite shape including various shapes, In some cases, the peak intensity ratio of the above-described tin oxide particles may be 1.0 or more. Therefore, the particle shape of the tin oxide particles of the present invention is generally a sheet-like shape, but if the peak intensity ratio is satisfied, the sheet-like shape may be pulverized. The shape of the sheet is defined as the shape having a longest width and the shortest width, and has a shape which is small and has a thickness in the vertical direction with respect to the sheet surface. Preferably, the longest width/thickness is 4 or more. More preferably, it is about 10 to 1 000, and generally contains so-called thin layer, thin plate, sheet, flake, and nano tablets. The shape is preferably as thin as 5 μm or less with respect to the vertical direction of the sheet surface, more preferably in the range of 0.0005 to 5 μm, and preferably in the range of 0.005 to 2 μm, preferably 0.01 to 2 μm. The range is more preferably. The longest width of the sheet surface, or the shortest width, is preferably in the range of 0.05 to 40 μm from the viewpoint of powder characteristics, and more preferably in the range of 0.5 to 30 μm. The shape of the sheet and the size thereof are preferable. The flaky shape and the size thereof can be determined by observation with an electron microscope. The tin oxide particles may contain an inorganic element other than Sn. The inorganic element may be used for the purpose of imparting conductivity, for example. A part of Sn may be substituted with an inorganic element such as Sb, P, Nb or W, or may be substituted with an inorganic element such as Si or A1. The amount of substitution can be appropriately set according to the inorganic element -12- 201014797. Further, from the viewpoints of dispersibility of the solvent, affinity of the resin, etc., the surface of the particles of the tin oxide may be subjected to an organic compound such as a surfactant, a coupling agent, a carboxylic acid, a polyhydric alcohol, an amine, a decane or the like. An inorganic compound such as cerium oxide or aluminum oxide is coated. Further, the surface of the particles of tin oxide may be coated with a conductive inorganic compound such as tin oxide such as Sb, P, Nb or W. The amount of the inorganic compound and/or the organic compound or the conductive inorganic compound to be coated on the surface of the tin oxide particles can be appropriately set. The tin oxide particles having a specific X-ray cross-sectional view of the present invention, for example, can be obtained by reacting a tin (II) compound (Sn2+) with a base at a pH of 6 or less * and hydrolyzing a tin (II) compound. The tin (II) compound can be used as a divalent tin compound such as tin (II) chloride. A water-soluble tin (Π) compound is preferred, and tin (II) chloride is more preferred. The concentration of the tin (II) compound is preferably from 0.05 to 150% by weight, more preferably from 1.0 to 100% by weight, based on the water when it is dissolved in water. As the base, an alkali hydroxide such as sodium hydroxide, potassium hydroxide or lithium hydroxide, an alkali carbonate such as sodium carbonate or the like, an ammonium compound such as ammonium carbonate φ, ammonia or the like can be used, and among them, alkali hydroxide, particularly sodium hydroxide is used. good. The addition of the tin (II) compound and the base is carried out while adjusting the pH in the reactor to 6 or less, preferably adjusted to a pH of 3 to 6, more preferably 3.5 to 5.5. In the vicinity of a pH higher than 6 neutral, a tin acid anhydride (Siu〇4(OH)4) is easily formed, which is not in the form of a flake. Further, when the pH is 9 or more, the plate may be formed into a flat shape. However, the thickness thereof is more than 5 μm. The addition method of the tin (II) compound and the base may be carried out by adding a tin (II) compound to the reactor and then adding a base. A method in which a tin (II) compound is added in advance to the reactor after the addition of a-13-201014797 base, and a tin (II) compound and a base are simultaneously added in a reactor. In either case, it is also possible to combine two or more methods, but it is preferred to add the tin (II) compound and the base in parallel at the same time. If the temperature of the reactor after the addition is 50. (: The above is effective in the hydrolysis of the tin (II) compound. It is also preferable to add a tin (II) compound (or a base) and raise the temperature to 50 ° C or more and then add a ruthenium (or tin (II) compound). After adding water to the reactor in advance, and the temperature of the water is 50° C. or higher, the tin (II) compound may be added in parallel with the base, preferably the latter. The preferred temperature is about 70 to 105 ° C. More preferably, the temperature is about 85 to 1 0 5 ° C. The above-mentioned simultaneous parallel addition refers to a method in which both are added to the reactor in small amounts continuously or intermittently. Specifically, the two are 10 In the case of addition of the tin (II) compound and the base, the addition of the tin (II) compound and the base is preferred because the crystallinity of the stannous oxide is higher, and the aging temperature is preferably 50 ° C or more. Preferably, the temperature is about 105 ° C, preferably about 90 to 105 ° C. The ripening time is preferably from about 5 minutes to about 6 hours. The above hydrolysis reaction and ripening are maintained at a valence of tin valence, in nitrogen, etc. Under non-oxidizing ambient gases, but also in the usual atmosphere The tin (Π) compound is hydrolyzed as described above to obtain tin oxide particles having a crystal structure of stannous oxide, particularly flaky stannous oxide particles. Thereafter, if necessary, in order to remove an unnecessary electrolyte present in the aqueous solution, In the case of washing, a pH adjuster is added to agglomerate the produced hydrolyzate. The pH adjuster used may be a mineral acid such as hydrochloric acid or sulfuric acid, or a base such as sodium hydroxide. After the net, if necessary, solid-liquid separation and further drying. For solid-liquid separation, filters such as filter paper pressurization and drum pressurization can be used, and belt heaters and batch heaters can be used for drying. , spray dryer, etc. Drying is carried out in a non-oxidizing atmosphere such as nitrogen gas in the form of a valence of tin, but it can also be dried in a normal atmosphere. The drying temperature is in the range of 50 to 120 °C. Further, after drying, it can be calcined as needed, », after non-oxygen or calcination of nitrogen, argon, hydrogen, etc., according to the impact pulverizer, roll mill, roller mill, sputum type according to tin oxide particles. Dry pulverization by a pulverizing mill to treat the particles obtained in this manner, in particular, the tin oxide particles φ of the flaky tin oxide crystal structure is preferably set to a temperature at which all of the tin oxide is calcined, and the temperature of the tin oxidation is higher. Preferably, the temperature is preferably from 600 to the above range, and the generated oxidized or calcined ambient gas is preferably a special gas. The smouldering can be used to heat the sinter, such as ballast, and chlorination. It is more preferable to use a chlorine compound such as tin and a temperature in the range of 120 to 500 ° C as a preferred environment gas. The degree of agglomeration after drying, using a grinding mill such as a hammer mill, a needle mill, a pulverizer or the like It is also possible to obtain a compression pulverizer such as a machine, a jet mill, etc. When the tin oxide tin oxide particles having a stannous oxide crystal structure are fired, a flaky tin oxide having oxidized ions, particularly flaky tin oxide particles, and tin oxide is obtained. particle. If the flaky cuprous oxide particles are oxidized, it is in the range of 1 〇〇〇 °c in the range of 500 ° C to 1 1 〇 〇 °C. If the calcination temperature is higher than that between the tin particles, it is not preferable. There is no restriction, but the air (atmospheric) environment uses a flow furnace, a stationary furnace, a rotating crucible, and a tunnel. A flux such as chlorine may also be added during calcination. After calcination, according to the degree of sintering, -15-201014797 is used as a grinding mill, a roller mill, a pulverizer, a pulverizer, a pulverizer, a pulverizer, etc., such as a hammer mill, a needle mill, or the like. The air pulverizer such as a compression pulverizer or a jet mill may be subjected to dry pulverization. In the tin oxide particles, the above-mentioned inorganic element is contained, and the tin (bismuth) compound is reacted with a base. When the tin (II) compound is hydrolyzed, the presence of the inorganic compound is preferably carried out, and at this time, the pH in the reactor is maintained. Add below 6. Specifically, (1) a method in which a tin (U) compound and a base are added to a reactor, a tin (Π) compound is added to the reactor, and (2) a tin (II) is added to the reactor. a compound and a base and an inorganic compound, a method of hydrolyzing a tin (II) compound, which comprises, for example, a method of separately adding a tin (II) compound and a base and an inorganic compound, and premixing and adding an inorganic substance to the tin (II) compound solution. A method of a compound, a method of adding an inorganic compound in advance to a base, or the like. (3) A method in which a tin (II) compound and a base are added to a reactor, and a tin (II) compound is hydrolyzed, and an inorganic compound is added. Further, in another method, an inorganic compound may be added to the slurry of tin oxide, and the inorganic compound may be neutralized and precipitated in the slurry, and the inorganic element is preferably contained in the tin oxide particles. Further, a mixed inorganic compound may be added to the powder of tin oxide. After the inorganic oxide element is contained in the tin oxide particles, it may be filtered, washed, and dried as needed. The drying of the stannous oxide is carried out in a non-oxidizing atmosphere such as nitrogen gas at a valence of valence of tin, but it may be dried in a normal atmosphere. The drying of tin oxide can also be carried out in the usual atmosphere. Drying -16- 201014797 The temperature is preferably in the range of 50 to 120 °C. Further, after drying, calcination may be carried out as needed, and by this calcination, a part of the tin element may be substituted with an inorganic element. The calcination temperature is preferably in the range of 1 20 to 1 1 〇〇 ° C, and the ambient gas is preferably air (atmospheric) ambient gas, preferably in a non-oxidizing atmosphere such as nitrogen, helium or hydrogen. After drying or after calcination, according to the degree of agglomeration of the tin oxide particles, a grinding mill, a roller mill, a pulverizer, a pulverizer or the like, a pulverizer, a drum pulverizer, and a smashing type are used. Dry pulverization may be carried out by a jet mill such as a compression pulverizer or a jet mill. When the surface of the tin oxide particles is coated with the inorganic compound and/or the organic compound, the surface treatment method may be used. Specifically, it is preferable to add the inorganic compound and the organic compound to the slurry of the tin oxide, and the inorganic compound is added to the slurry. It is more preferable to neutralize and coat the organic compound. Further, it is also possible to add a mixed coating inorganic compound and an organic compound to the powder of tin oxide. In addition, it is preferable to coat a conductive inorganic compound on the surface of the tin oxide particles, and to add a compound which is a conductive inorganic compound to the slurry of tin oxide, and to neutralize or water the compound which becomes a conductive inorganic compound in the slurry. Parsing out the coverage is better. After coating the surface of the tin oxide particles with an inorganic compound and/or an organic compound or a conductive inorganic compound, it may be filtered, washed, and dried as needed. The drying of the stannous oxide is carried out in a non-oxidizing atmosphere such as nitrogen gas in the same manner as the valence of tin, but it can also be dried in a normal atmosphere. The drying of tin oxide can also be carried out in the usual atmosphere. The drying temperature is preferably in the range of 50 -17 - 201014797 ~ 120 °C. Further, after drying, calcination may be carried out as needed, and the calcination temperature is preferably in the range of 120 to 1100 ° C, and the ambient gas is preferably air (atmospheric) ambient gas, and non-oxidizing environment such as nitrogen, argon or hydrogen. It is better under gas. After drying or after calcination, according to the degree of agglomeration of the tin oxide particles, a grinding mill, a roller mill, a pulverizer, a pulverizer, or the like, a pulverizer, a drum pulverizer, or the like is used. Dry pulverization may be carried out by a jet mill such as a crusher or a jet mill such as a pulverizer. The above tin oxide particles are dispersed in a solvent to form a dispersion. As the solvent in which the tin oxide particles are dispersed, an organic solvent such as ice or alcohol, dimethylformamide (DMF), ketone or the like, or a mixture thereof, industrially using water as a main solvent or dimethyl group can be used. Indoleamine (DMF) and ketone are preferred. The ketone may, for example, be acetone, 2-butanone or methyl ethyl ketone. The concentration of the tin oxide particles in the dispersion can be appropriately set, and is preferably, for example, about 0.1 to 10 g/l. Further, in order to improve the dispersibility, a centrifuge or the like may be used as appropriate. Further, the above tin oxide particles are dispersed in a solvent and a resin binder is blended to prepare a coating material. Specific examples of the resin binder include (1) an inorganic binder (a) a polymerizable hydrazine compound (hydrolyzable decane or a hydrolyzate thereof or a partial condensate thereof, water glass, colloidal cerium oxide, or organic condensate) (2) an organic binder (alkyd resin, acrylic resin, polyester resin, epoxy resin, fluorine resin, modified polyfluorene) Oxygen resin). In addition to the tin oxide particles, the solvent, and the resin binder, the dispersion and the coating material may contain a dispersing agent, a pH adjusting agent, an antifoaming agent, and the like, in the range of not inhibiting the effects of the present invention. As the third component, various additives such as an emulsifier, a coloring agent, an extender, an antifungal agent, a hardening aid, and a tackifier, and a sputum-filling agent are used. Examples of the dispersant include (1) a surfactant ((a) an anion (carboxylate, sulfate, sulfonate, phosphate, etc.), (b) a cationic (alkylamine, alkylamine) a quaternary ammonium salt, an aromatic quaternary ammonium salt, a heterocyclic quaternary ammonium salt, etc.), (c) an amphoteric (betaine type, amino acid type, alkylamine oxide, nitrogen-containing heterocyclic type, etc.), d) non-p ion system (ether type, ether ester type, ester type, nitrogen type, etc.), (2) polyfluorene-based dispersant (alkyl modified polyoxane, polyoxyalkylene modified Polyoxane, etc., (3) phosphate dispersant (sodium phosphate, sodium pyrophosphate, sodium orthophosphate, sodium metaphosphate, sodium tripolyphosphate, etc.), (4) alkanolamines (amine methyl propyl acrylate) The amount of the tin oxide particles in the dispersion and the coating material, the amount of the other additives, and the like can be appropriately set, and the product obtained by hydrolyzing the tin (II) compound (flaky oxygen φ) can be appropriately set. The stannous particles are in a state of being dispersed in the form of flaky tin oxide particles, so they are directly used as flaky tin oxide. The dispersion of the particles may be used, or the flaky tin oxide particles separated by solid-liquid separation may be redispersed in a solvent, and the dried powder, the calcined powder, the powder containing the inorganic element, and the surface coating may be used. The treated powder or the pulverized powder, in particular, the powder of the flaky tin oxide particles may be redispersed in a solvent. The redispersing may be carried out using a conventional disperser, a colloid mill, a ball mill, a bead mill, an ultrasonic wave or the like. In addition, the above-mentioned third component may be added. Further, in order to improve the dispersibility, a centrifuge or the like may be used as appropriate. -19- 201014797 Such dispersions and coatings are excellent in long-term storage stability, coated on a substrate, and dried. Or calcination can obtain a tin oxide film. The method of coating on a substrate is spin coating, spray coating, roller coating, dip coating, flow coating, knife coating, electrostatic coating, rod coating, A general method such as coating, brushing, or dropping a droplet can be used without limitation. If the film thickness is thicker, it can be repeatedly applied. If the solvent is removed from the coating, oxygen is formed. The film is preferably formed at a temperature ranging from room temperature to 800 ° C. The temperature is preferably based on the boiling point of the solvent, for example, in the range of room temperature to 150 ° C, more preferably in the case of an aqueous solvent. Further, the tin oxide particles are mixed with a resin, and the liquid resin composition such as a coating material or an ink may be used as described above, or the tin oxide particles may be mixed in the resin to form a plastic molded body or sheet. A solid resin composition such as a film may be used. The above-mentioned resin binder, biodegradable resin, ultraviolet curable resin, thermosetting resin, etc. may be suitably used for such a resin, and the blending amount of tin oxide particles and other additives may be used. The amount of the above tin oxide particles can be used for various functional materials. For example, it can also be used for conductive additives, catalysts, catalyst carriers, gas sensors, photocatalysts, infrared shielding agents, ceramics. , metal additives, honing materials, etc. Since the tin oxide particles have high crystallinity on the (1 01 ) plane or have a flake-like particle shape, they are suitably used for a conductive filler, a catalyst, a catalyst carrier, and a gas sensor. The conductive filler can be used for an antistatic agent, an electrode material, and the like. As the catalyst, an oxidizing catalyst for oxidizing acrolein with propylene, a selective catalyst for reducing NO with ammonia, and the like can be used as a carrier for an oxidation catalyst for methane. Also, the gas sensor can be used -20-

201014797 作爲可燃性氣體警報器等,且氣體檢測感應 用於微量CO和H2S等之測定。 又,氧化錫膜可使用於各種機能性材料 除了使用於透明性材料、導電膜、電阻體、 應器以外,可使用玻璃基板上形成氧化錫膜 性氧化物之玻璃、熱線反射玻璃、低放射玻 等。也可用於光觸媒性材料、防反射材料、 。對於此些用途之使用可根據先前所用之形 、配合比例而應用氧化錫粒子、氧化錫膜等 爲光觸媒時,照射具有氧化錫之帶隙以上能 除去有害物質、惡臭物質、污穢物等,且以 活用防污、防霧作用等。 [實施例] 以下,根據實施例說明本發明,但本發 施例所限定。 實施例1 將氯化亞錫2水合物(SnCl2 · 2H20試 解於35%鹽酸水溶液15.6克中。於此溶解 14.8克進行濃度調整,取得氯化亞錫水溶液 其次,於90°C之純水0.5公升中將上述 溶液與5當量之氫氧化鈉水溶液,一邊維持 歷30分鐘進行同時添加,添加後,熟化10 度高,亦可使 用途。例如, 電極、氣體感 等且塗敷導電 璃、電熱玻璃 阻氣性材料等 態、擔持狀態 ,例如使用作 量的波長光, 超親水性效果 明不被此些實 藥)8.63克溶 液中添加純水 〇 之氯化亞錫水 ρΗ5±0·2 —邊 分鐘。其後, -21 - 201014797 使用3當量之鹽酸水溶液使pH爲3.0,且攪拌放置5分鐘 開始洗淨。於濾液比電阻値爲1〇萬Ω cm時中止洗淨,所 得之餅狀物於大氣中以105 r放置一晚,乾燥。乾燥物以 瑪瑙乳鉢進行手粉碎,取得本發明之薄片狀氧化錫粒子( 試料A )。 進行試料A的X射線繞射測定(理學公司製 X射線 繞射裝置RINT-1200 ),此X射線繞射剖視圖示於圖1。 如圖1所示般,試料A爲具有相對於氧化亞錫(11〇)面 之(101)面的波峰強度比爲1.0以上之薄片狀氧化亞錫 所特有的X射線繞射剖視圖。試料A之掃描型電子顯微 鏡照片示於圖2。由圖2可知最長寬度及最短寬度分別爲 0.05〜40μιη之範圍,厚度爲〇.〇〇5〜20111範圍的薄片狀粒 子。另外,關於各試料之薄片狀的厚度係由個別之高倍率 電子顯微鏡照片測定。 實施例2 將實施例1所得之試料A,以大氣中9 0 0 °C之溫度煅 燒1小時,取得本發明之薄片狀氧化錫粒子(試料B)。 進行試料B之x射線繞射測定’其X射線繞射剖視 圖示於圖3。如圖3所示般試料B爲與後述比較例2所得 之試料Y不同’具有相對於(110)面之(101)面的波峰 強度比爲1. 〇以上之薄片狀氧化錫所特有的χ射線繞射剖 視圖。試料B之掃描型電子顯微鏡照片示於圖4°由圖4 可知,烟燒後亦維持薄片形狀’最長寬度及最短寬度分別 -22 - 201014797 爲0.05〜40 μηι之範圍,厚度爲0.005〜2 μιη範圍之薄片狀 粒子。 實施例3201014797 As a flammable gas alarm, etc., and gas detection induction is used for the measurement of trace amounts of CO and H2S. Further, the tin oxide film can be used for various functional materials in addition to a transparent material, a conductive film, a resistor, and a device, and a glass of a tin oxide film oxide on a glass substrate, a heat reflecting glass, and a low emission can be used. Glass and so on. It can also be used for photocatalytic materials, anti-reflective materials, and. For the use of these applications, when a tin oxide particle or a tin oxide film is used as a photocatalyst according to the shape and blending ratio used previously, it is possible to remove harmful substances, malodorous substances, dirt, and the like by irradiating a band gap of tin oxide. In order to use anti-fouling and anti-fog effects. [Examples] Hereinafter, the present invention will be described based on examples, but the present invention is limited thereto. Example 1 Stannous chloride 2 hydrate (SnCl 2 · 2H20 was dissolved in 15.6 g of a 35% hydrochloric acid aqueous solution. The concentration was adjusted by dissolving 14.8 g to obtain a solution of stannous chloride followed by pure water at 90 ° C. 0.5 liter of the above solution and 5 equivalents of sodium hydroxide aqueous solution are added for 30 minutes while being added, and after being added, the aging is 10 degrees high, and it can also be used. For example, an electrode, a gas sensation, etc., and a conductive glass are coated. The isothermal and supported state of the electrothermal glass gas barrier material, for example, the wavelength of light used for the amount of super-hydrophilic effect is not recognized by these practical drugs. 8.63 g of solution is added with pure water, stannous chloride water ρΗ5±0 · 2 — minutes and minutes. Thereafter, -21 - 201014797 was adjusted to pH 3.0 with 3 equivalents of aqueous hydrochloric acid, and the mixture was stirred for 5 minutes to start washing. The washing was stopped when the filtrate had a specific resistance of 10,000 Ωcm, and the obtained cake was placed in the atmosphere at 105 r overnight and dried. The dried product was hand-pulverized in an agate mortar to obtain the flaky tin oxide particles of the present invention (sample A). X-ray diffraction measurement (X-ray diffraction apparatus RINT-1200 manufactured by Rigaku Corporation) of Sample A was carried out, and this X-ray diffraction cross-sectional view is shown in Fig. 1. As shown in Fig. 1, sample A is an X-ray diffraction cross-sectional view peculiar to flaky tin oxide having a peak intensity ratio of 1.0 or more with respect to the (101) plane of the stannous oxide (11 Å) plane. A scanning electron micrograph of sample A is shown in Fig. 2. Fig. 2 shows that the longest width and the shortest width are in the range of 0.05 to 40 μm, and the thickness is in the range of 〇.〇〇5 to 20111. Further, the thickness of each sheet was measured by an individual high-magnification electron microscope photograph. Example 2 Sample A obtained in Example 1 was calcined at a temperature of 90 ° C for 1 hour in the atmosphere to obtain flaky tin oxide particles of the present invention (sample B). The x-ray diffraction measurement of sample B was carried out. The X-ray diffraction cross-sectional view is shown in Fig. 3. As shown in Fig. 3, the sample B is different from the sample Y obtained in the comparative example 2 described later. The peak intensity ratio of the (101) plane with respect to the (110) plane is 1. 〇 or more of the flaky tin oxide. A ray diffraction cross-sectional view. The scanning electron micrograph of sample B is shown in Fig. 4. It can be seen from Fig. 4 that the shape of the sheet is maintained after the smoke is burned. The longest width and the shortest width are respectively -22 - 201014797, and the thickness is 0.005 to 2 μm. Range of flaky particles. Example 3

將氯化亞錫2水合物(SnCl2 · 2Η20、和光純藥工業 公司製)17.45克溶解於35 %鹽酸水溶液19.46克中。於 此溶解液中添加純水18.54克進行濃度調整,取得氯化亞 錫水溶液。 其次,於90°C之純水0.5公升中將上述之氯化亞錫水 溶液與5當量之氫氧化鈉水溶液,一邊維持pH4±0.2 —邊 歷20分鐘進行同時添加,添加後,熟化10分鐘。其後, 使用3當量之鹽酸水溶液使pH爲3.0,且攪拌放置5分鐘 開始洗淨。於濾液比電阻値爲1萬5000Ωcm時中止洗淨 ,所得之餅狀物於大氣中以1〇5 t放置一晚,乾燥。乾燥 物以瑪瑙乳鉢進行手粉碎,取得本發明之薄片狀氧化錫粒 子(試料C )。 試料C以掃描型電子顯微鏡觀察時,可知最長寬度及 最短寬度分別爲〇.〇5〜40μιη之範圍,厚度爲0.005〜2μπι 範圍之薄片狀粒子。又,進行X射線繞射測定時,具有相 對於氧化亞錫(110)面之(101)面的波峰強度比爲1.0 以上之薄片狀氧化亞錫所特有的X射線繞射剖視圖。 實施例4 將實施例3所得之試料C 2.0克放入鋁坩堝,並於大 -23- 201014797 氣中進行900°C煅燒2小時,取得本發明之薄片狀氧化錫 粒子(試料D)。 試料D之掃描型電子顯微鏡照片示於圖5»由圖5可 知’最長寬度及最短寬度分別爲0.05〜40μπι之範圍,厚 度爲0.005〜2 μιη範圍之薄片狀粒子。又,·進行X射線繞 射測定時,同實施例2,具有薄片狀氧化錫所特有的X射 線繞射剖視圖,(101)面/(110)面之波峰強度比爲6.2 實施例5 將實施例3所得之乾燥物2.0克與氯化鈉0.4克以瑪 瑙乳鉢慢慢進行手粉碎,由其中取出2.0克放入鋁坩堝, 並於大氣中進行900 °C煅燒2小時,最得本發明之薄片狀 氧化錫粒子(試料E)。 試料E之掃描型電子顯微鏡照片示於圖6。由圖6可 知,最長寬度爲0.5〜6μιη左右之薄片狀粒子。由高倍率 之電子顯微鏡照片厚度爲0.08〜2.0 μιη左右。又,進行X 射線繞射測定時,同實施例2,具有薄片狀氧化錫所特有 的X射線繞射剖視圖,(1 0 1 )面/( 1 1 0 )面之波峰強度 比爲2.0。 實施例6 將實施例3所得之乾燥物2.0克與氯化亞錫0.4克以 瑪瑙乳鉢慢慢進行手粉碎,由其中取出2.0克放入鋁坩堝 -24- 201014797 ,並於大氣中進行900°C煅燒2小時,取得本發明之 狀氧化錫粒子(試料F)。 試料F之掃描型電子顯微鏡照片示於圖7。由圖 知,最長寬度爲0.1〜0.5 μιη左右之薄片狀粒子。由 率之電子顯微鏡照片厚度爲0.05〜1.5μιη左右。又, X射線繞射測定時,同實施例2,具有薄片狀氧化錫 有的X射線繞射剖視圖,(1 0 1 )面/( 1 1 0 )面之波 實施例7 於實施例3中,除了將同時添加時使用之鹼源 5 %氨水代替5當量之氫氧化鈉以外,進行與實施例3 之操作,取得本發明之薄片狀氧化錫粒子(試料G) 試料G以掃描型電子顯微鏡觀察時,可知最長寬 最短寬度分別爲0.05〜40μιη之範圍,厚度爲0.005 -範圍的薄片狀粒子。又,進行X射線繞射測定時,具 對於氧化亞錫(110)面之(101)面的波峰強度比j 以上之薄片狀氧化亞錫所特有的X射線繞射剖視圖。 實施例8 將實施例7所得之試料G 2.0克放入鋁坩堝,並 氣中進行900°C煅燒2小時,取得本發明之薄片狀氧 粒子(試料Η)。 試料Η之掃描型電子顯微鏡照片示於圖8。由圖 薄片 7可 高倍 進行 所特 峰強 使用 同樣 〇 度及 2 μιη 有相 於大 化錫 8可 -25- 201014797 知,最長寬度及最短寬度分別爲0.05〜40 μιη之範圍’厚 度爲0.005〜2 μηι範圍之薄片狀粒子。又,進行X射線繞 射測定時,同實施例2,具有薄片狀氧化錫所特有的X射 線繞射剖視圖,(1 〇 1 )面/( 1 1 〇 )面之波峰強度比爲8 · 3 實施例9 將氯化亞錫2水合物(SnCl2 · 2Η20和光純藥工業公 司製)17.45克溶解於35 %鹽酸水溶液19.46克中。於此 溶解液中添加純水18.54克進行濃度調整,取得氯化亞錫 水溶液。 其次,於90°C之純水〇.5公升中將上述之氯化亞鍚水 溶液與溶解矽酸鈉溶液(水玻璃、Si02部分;35〜38%、 試藥、關東化學公司製)0.14克之5當量氫氧化鈉水溶液 ,一邊維持pH4±0.2,一邊歷20分鐘進行同時添加,添加 後,熟化1 〇分鐘。其後,使用3當量之鹽酸水溶液使pH 爲3.0,且攪拌放置5分鐘開始洗淨。於濾液比電阻値爲 1萬5000Qcm時中止洗淨,所得之餅狀物於大氣中以105 °C置一晚,乾燥。乾燥物以瑪瑙乳鉢進行手粉碎,取得本 發明之薄片狀氧化錫粒子(試料I)。 試料I以掃描型電子顯微鏡觀察時,可知最長寬度及 最短寬度分別爲0.05〜40μπι之範圍,厚度爲0.005〜2μιη 範圍之薄片狀粒子。又,進行X射線繞射測定時,具有相 對於氧化亞錫(110)面之(101)面的波峰強度比爲1.0 -26- 201014797 以上之薄片狀氧化亞錫所特有的χ射線繞射剖視圖。 實施例1 〇 - 將實施例9所得之試料I 2.0克放入鋁坩堝,並於大 . 氣中進行900°C熘燒2小時,取得本發明之含有矽(換算 成3丨〇2爲0.5重量%)的薄片狀氧化錫粒子(試料J)。 試料J之掃描型電子顯微鏡照片示於圖9。由圖9可 • 知,最長寬度及最短寬度分別爲〇.〇5〜40μπι之範圍,厚 度爲0.005〜2 μιη範圍之薄片狀粒子。又,進行X射線繞 射測定時,同實施例2,具有薄片狀氧化錫所特有的X射 線繞射剖視圖,(1 〇 1 )面/( 1 1 〇 )面之波峰強度比爲5.1 〇 實施例11 於實施例9中,除了使用0.47克之矽酸鈉溶液代替 φ 〇. 14克以外,同實施例9操作,取得本發明之薄片狀氧化 錫粒子(試料Κ)。 試料Κ以掃描型電子顯微鏡觀察時,可知最長寬度及 最短寬度分別爲〇.〇5〜40μιη之範圍,厚度爲0.005〜2μιη 範圍之薄片狀粒子。又,進行X射線繞射測定時,具有相 對於氧化亞錫(110)面之(101)面的波峰強度比爲1.0 以上之薄片狀氧化亞錫所特有的X射線繞射剖視圖。 實施例1 2 -27- 201014797 將實施例11所得之試料κ 2.0克放入鋁坩堝’並於 大氣中進行90(TC煅燒2小時,取得本發明之含有矽(換 算成Si02爲1.64重量%)的薄片狀氧化錫粒子(試料L) 〇 試料L之掃描型電子顯微鏡照片示於圖10。由圖10 可知,最長寬度及最短寬度分別爲〇.〇5〜40μιη之範圍, 厚度爲0.005〜2 μιη範圍之薄片狀粒子。又,進行X射線 繞射測定時,同實施例2,具有薄片狀氧化錫所特有的X 射線繞射剖視圖,(101)面/ (110)面之波峰強度比爲 6.2。 實施例1 3 於實施例9中,除了使用0.91克之矽酸鈉溶液代替 0.14克以外,同實施例9操作,取得本發明之薄片狀氧化 錫粒子(試料Μ )。 試料Μ以掃描型電子顯微鏡觀察時,可知最長寬度及 最短寬度分別爲〇·〇5〜40 μιη之範圍,厚度爲0.005〜2 μιη 範圍之薄片狀粒子。又,進行X射線繞射測定時,具有相 對於氧化亞錫(110)面之(101)面的波峰強度比爲1.0 以上之薄片狀氧化亞錫所特有的X射線繞射剖視圖。 實施例1 4 將實施例13所得之試料Μ 2.0克放入鋁坩堝,並於 大氣中進行900 °C熘燒2小時,取得本發明之含有矽(換 -28- 201014797 算成Si02爲3.2重量%)的薄片狀氧化錫粒子(試料N) 〇 試料N之掃描型電子顯微鏡照片示於圖11。由圖11 可知,最長寬度及最短寬度分別爲0.05〜40μιη之範圍, 厚度爲0.0 05〜2 μιη範圍之薄片狀粒子。又,進行X射線 繞射測定時,同實施例2,具有薄片狀氧化錫所特有的X 射線繞射剖視圖,(1 〇 1 )面/( 1 1 0 )面之波峰強度比爲 實施例1 5 於實施例9中,除了使用0.14克鋁酸鈉(Α12〇3: 34 〜3 9 % )代替矽酸鈉溶液以外,同實施例9操作,取得本 發明之薄片狀氧化錫粒子(試料Ο)。 試料Ο以掃描型電子顯微鏡觀察時,可知最長寬度及 最短寬度分別爲0.05〜40μιη之範圍,厚度爲0.005〜2μηι φ 範圍之薄片狀粒子。又,進行X射線繞射測定時,具有相 對於氧化亞錫(110)面之(101)面的波峰強度比爲10 以上之薄片狀氧化亞錫所特有的X射線繞射剖視圖。 實施例1 6 將實施例15所得之試料Ο 2.0克放入鋁坩堝,並於 大氣中進行900°C煅燒2小時,取得本發明之含有銘(換 算成Ah〇3爲0·5重量%)的薄片狀氧化錫粒子(試料p) -29- 201014797 試料P之掃描型電子顯微鏡照片示於圖12。由圖12 可知,最長寬度及最短寬度分別爲0.05〜40μιη之範圍, 厚度爲0.005〜2 μιη範圍之薄片狀粒子。又,進行X射線 繞射測定時,同實施例2,具有薄片狀氧化錫所特有的X 射線繞射剖視圖,(1 〇 1 )面/( 1 1 0 )面之波峰強度比爲 10.9 ° 實施例1 7 將氯化亞錫2水合物(SnCl2 · 2Η20、和光純藥工業 公司製)17.45克及氯化銻(SbCl3試藥、Nacarai Tesk公 司製)0.02克溶解於35 %鹽酸水溶液19.46克中。於此溶 解液中添加純水18.54克進行濃度調整,取得含氯化銻之 氯化亞錫水溶液。 其次,於90°C之純水0.5公升中將上述之氯化亞錫水 溶液與5當量之氫氧化鈉水溶液,一邊維持PH4±0.2,一 邊歷20分鐘進行同時添加,添加後,熟化10分鐘。其後 ,使用3當量之鹽酸水溶液使pH爲3.0,且攪拌放置5分 鐘開始洗淨。於濾液比電阻値爲1萬5000Qcm時中止洗 淨,所得之餅狀物於大氣中以105 °C放置一晚,乾燥。乾 燥物以瑪瑙乳鉢進行手粉碎,取得本發明之薄片狀氧化錫 粒子(試料Q)。 試料Q以掃描型電子顯微鏡觀察時,可知最長寬度及 最短寬度分別爲〇.〇5〜40μιη之範圍,厚度爲0.005〜2μιη 範圍之薄片狀粒子。又,進行X射線繞射測定時,具有相 -30- 201014797 對於氧化亞錫(110)面之(101)面的波峰強度比爲1.0 以上之薄片狀氧化亞錫所特有的X射線繞射剖視圖。 實施例1 8 將實施例17所得之試料Q 2.0克放入鋁坩堝,並於 大氣中進行90(TC煅燒2小時,取得本發明之摻混銻(換 算成Sb205爲0.5重量%)的薄片狀氧化錫粒子(試料R )° 試料R之掃描型電子顯微鏡照片示於圖13。由圖13 可知,最長寬度及最短寬度分別爲〇.〇5〜40μηι之範圍, 厚度爲0.005〜2 μιη範圍之薄片狀粒子。又,進行X射線 繞射測定時,同實施例2,具有薄片狀氧化錫所特有的X 射線繞射剖視圖,(101)面/(110)面之波峰強度比爲 φ 實施例1 9 將氯化亞錫2水合物(SnCl2 · 2Η20、和光純藥工業 公司製)17.45克及鎢酸鈉(Na2W04 · 2Η20試藥、和光 純藥工業公司製)0.04克溶解於35 %鹽酸水溶液19·46克 中。於此溶解液中添加純水18.54克進行濃度調整,取得 含有鎢酸鈉之氯化亞錫水溶液。 其次,於90 °C之純水0.5公升中將上述之氯化亞錫水 溶液與5當量之氫氧化鈉水溶液,一邊維持pH4±0.2 —邊 歷20分鐘進行同時添加,添加後,熟化1 〇分鐘。其後, -31 - 201014797 使用3當量之鹽酸水溶液使pH爲3.0’且攪捽放置5分鐘 開始洗淨。於濾液比電阻値爲1萬SOOOQcm時中止洗淨 ,所得之餅狀物於大氣中以1〇5 °C置一晚,乾燥。乾燥物 t 以瑪瑙乳鉢進行手粉碎,取得本發明之薄片狀氧化錫粒子 (試料S)。 試料S以掃描型電子顯微鏡觀察時,可知最長寬度及 最短寬度分別爲0.05〜40 μιη之範圍,厚度爲0.005〜2 μπι 範圍之薄片狀粒子。又,進行X射線繞射測定時,具有相 對於氧化亞錫(110)面之(101)面的波峰強度比爲1.0 以上之薄片狀氧化亞錫所特有的X射線繞射剖視圖。 實施例20 將實施例19所得之試料S 2.0克放入鋁坩堝,並於大 氣中進行900°C煅燒2小時’取得本發明之摻混鎢(換算 成W03爲1重量%)的薄片狀氧化錫粒子(試料T)。 試料T之掃描型電子顯微鏡照片示於圖14。由圖14 可知,最長寬度及最短寬度分別爲0.05〜40 μπι之範圍, 厚度爲0.005〜2μιη範圍之薄片狀粒子。又,進行X射線 繞射測定時’同實施例2 ’具有薄片狀氧化錫所特有的X 射線繞射剖視圖,(101)面/ (110)面之波峰強度比爲 3.0 〇 實施例2 1 將實施例4所得之試料D以離心粉碎機(Rich公司 -32- 201014797 製離心粉碎機ZM-100)粉碎後,將此試料10克放入1公 升純水中,進行流漿化。 此流漿於90°C中升溫後,將氯化錫(SnCl4 · 5H20、 試藥、和光純藥工業公司製)2.33克和氯化銻(SbCl3、 試藥、Nacari Tesk公司製)0.14克溶解於3當量鹽酸水 溶液之溶液,與5當量之氫氧化鈉水溶液,一邊保持一定 pH,一邊歷60分鐘進行同時添加。更且進行熟化60分鐘 ,其後,脫水、洗淨,並乾燥。將乾燥之粉末以瑪瑙乳鉢 輕輕粉碎後,將2.0克裝入鋁坩堝,並於大氣中進行650 °C煅燒60分鐘。取得本發明之被覆銻摻混氧化錫的薄片 狀氧化錫粒子(試料U)。 試料U之掃描型電子顯微鏡照片示於圖15。由圖15 可知,最長寬度及最短寬度分別爲0.05〜40μηι之範圍, 厚度爲0.005〜2 μπι範圍之薄片狀粒子。又,同上述進行 X射線繞射測定時,同實施例2,具有薄片狀氧化錫所特 有的X射線繞射剖視圖,(1 〇 1 )面/( 1 1 0 )面之波峰強 度比爲3.4。 實施例22 將實施例4所得之試料D於氮氣環境氣體下進行9〇〇 °C煅燒2小時,取得本發明之薄片狀氧化錫粒子(試料ν )0 試料V之掃描型電子顯微鏡照片,可知最長寬度及最 短寬度分別爲〇·〇5〜40μπι之範圍,厚度爲0.005〜2μπι範 -33- 201014797 圍之薄片狀粒子。又,進行χ射線繞射測定時,同實施例 4,具有薄片狀氧化錫所特有的X射線繞射剖視圖,(1 01 )面/( 1 10)面之波峰強度比爲6.2。 實施例23 將實施例22所得之試料V 1克以Likai機(石川工場 公司製石川式攪拌Likai機AGA )粉碎5分鐘,取得氧化 錫粒子(試料W)。 由試料W之掃描型電子顯微鏡照片,可知爲不定形 狀之粒子。又,進行X射線繞射測定時,具有氧化錫所特 有的X射線繞射剖視圖,(1 0 1 )面/( 1 1 0 )面之波峰強 度比爲3 .1。 比較例1 將氯化錫五水合物(SnCl2 · 5H20、和光純藥工業製 )27.12克溶解於35%鹽酸水溶液19.46克中。於此溶解 液中添加純水18.54克進行濃度調整,取得氯化亞錫水溶 液。 其次,於90°C之純水0.5公升中將上述之氯化錫水溶 液與5當量之氫氧化鈉水溶液,一邊維持PH4±0.2 —邊歷 20分鐘進行同時添加,添加後,熟化10分鐘。其後,使 用3當量之鹽酸水溶液使pH爲3.0,且攪拌放置5分鐘開 始洗淨。於濾液比電阻値爲1萬5000Qcm時中止洗淨, 所得之餅狀物於大氣中以1 〇 5 °C置一晚,乾燥。乾燥物以 -34· 201014797 瑪瑙乳鉢進行手粉碎,取得氧化錫粒子(試料χ)。 試料X以掃描型電子顯微鏡觀察時’可知爲粒狀。又 ,進行X射線繞射測定時’具有非晶質狀態之X射線繞 射剖視圖。 比較例2 將比較例1所得之試料X 2.0克放入鋁坩堝,並於大 氣中進行900。(:煅燒2小時,取得氧化錫粒子(試料Y) 〇 試料Y之掃描型電子顯微鏡照片示於圖16»由圖16 可知,其爲粒狀。又’進行X射線繞射測定時,具有粒狀 氧化錫所特有的X射線繞射剖視圖(圖3 ),( 1 0 1 )面/ (11〇)面之波峰強度比爲〇.8。 比較例3 將比較例2所得之試料Y於氮氣環境氣體下進行900 °C煅燒2小時,取得氧化錫粒子(試料Z )。 試料Z之掃描型電子顯微鏡照片,可知其爲粒狀。又 ,進行X射線繞射測定時,具有粒狀氧化錫所特有的X 射線繞射剖視圖,(1 〇 1 )面/( 110 )面之波峰強度比爲 0.8。 將上述之試料d、r、t、u分別取出1.0克’夾住銅 電極,於100kg/cm2之壓力下,進行此粉體體積電阻値( Ωοιη )的測定(使用 Hewlet Packard 公司製 multimeter -35- 201014797 3457A,根據下述式1算出),示於表1。 式1 :粉體體積電阻値(ncm) = {體積電阻値(測定値 ;Ω)χ試料之面積(cm2)}/厚度(cm) 摻混銻之試料R、摻混鎢之試料T、以摻混銻之氧化 錫被覆之試料U,粉體體積電阻均比試料D低,可知能使 用作爲導電性充塡劑。 [表 1]_ 體積電阻値(Ωαη) 實施例4 D 24.5x106 實施例18 R 335 實施例20 T 1.03χ103 實施例21 U 13 將上述之試料V、w、z分別5.0克放入鋁杯,並於 8 0°C之恆溫乾燥機中保管4週。其後,以上述方法進行粉 體體積電阻値(Qcm )的測定,示於表2。 實施例22之試料V爲將氧化錫於非氧化性環境氣體 下煅燒者,實施例23之試料W爲將試料V粉碎者,但均 © 爲粉體體積電阻低,可知能使用作爲導電性充塡劑。 又,實施例22、23之試料V、W,相對於初期粉體體 積電阻値之4週後的比率低,可知因加溫所造成之體積電 阻的經時變化低。其原因認爲係爲氧化錫之(1 0 1 )面/ ( 110)面的波峰強度比爲1.0以上的原因,可知波峰強度 比愈高則體積電阻比愈低。 -36- 201014797 [表2] 試料 體積電ΡΙ 値(Ωαη) 體積電阻比 (4週後之値/初期之値) 初期 4週後 實施例22 V 61.5 189 3.1 實施例23 W 85.2 1226 14.4 比較例3 Ζ 5.26 2849 542 將實施例21所得之試料u與比較試料ET-500W (石 原產業公司製,添加銻之二氧化錫被覆球狀二氧化鈦)分 φ 別20克、Aery die A-165(大日本油墨化學工業公司製) 30.6克、甲苯/正丁醇混合溶劑(甲苯··正丁醇=1·· 1重量 比)26.4克及玻璃珠粒50.0克放入140毫升之美乃滋( mayonnaise)瓶,並以塗料調理池(R_ed-Devil公司製) 進行20分鐘的振盪。 其次,由此美乃滋瓶中取出15克之樹脂組成物,於 其中,加入 Acrydic A-165(大日本油墨化學工業公司製 )14.5克及甲苯/正丁醇混合溶劑(甲苯:正丁醇=1: 1重 φ 量比)4.6克,再以塗料調理池(Red-Devil公司製)進行 3分鐘的振盪。 其次,於隱蔽力試驗紙上放置此些樹脂組成物,使用 - 3磨(mill)的塗佈器進行塗佈,於室溫進行自然乾燥一晚。 此些塗膜之表面電阻値以 High Rester UP ( Dia Instrument公司製)測定之結果示於表3。此些膜厚爲 1 9 μιη。 實施例21之試料U,相比於添加銻之二氧化錫被覆 球狀二氧化鈦,表示出較低的表面電阻値,可知能使用作 -37- 201014797 爲導電膜。 [表3] 試料 表面電阻値(Ω/Sq) 實施例21 U 3.6xl06 比較試料 ET-500W Over-Range (產業上之可利用性) 本發明之氧化錫粒子除了導電性充塡劑以外,亦可使 用於觸媒、觸媒載體、氣體感應器、光觸媒、紅外線遮蔽 劑、陶瓷、金屬之添加劑、硏磨材等。 又,將氧化錫粒子成膜的氧化錫膜,除了於導電膜、 電阻體、電極、觸媒、觸媒載體、氣體感應器、透明性材 料以外,亦可使用於玻璃基板上形成氧化錫膜的導電性氧 化物塗敷玻璃、熱線反射玻璃、低放射玻璃、電熱玻璃等 。又,亦可使用於光觸媒性材料、防反射材料、阻氣性材 料等之各種用途。 【圖式簡單說明】 圖1爲示出試料A之X射線繞射剖視圖之圖示。 圖2爲示出試料A之粒子形狀的掃描型電子顯微鏡照 片。 圖3爲不出試料B及試料Y之X射線繞射剖視圖之 圖示。 圖4爲示出試料Β之粒子形狀的掃描型電子顯微鏡照 片。 -38 - 201014797 圖5爲示出試料D之粒子形狀的掃描型電子顯微鏡照 片。 圖6爲示出試料E之粒子形狀的掃描型電子顯微鏡照 片。 圖7爲示出試料F之粒子形狀的掃描型電子顯微鏡照 片。 圖8爲示出試料Η之粒子形狀的掃描型電子顯微鏡照 圖9爲示出試料J之粒子形狀的掃描型電子顯微鏡照 片。 圖10爲示出試料L之粒子形狀的掃描型電子顯微鏡 照片。 圖11爲示出試料Ν之粒子形狀的掃描型電子顯微鏡 照片。 圖12爲示出試料Ρ之粒子形狀的掃描型電子顯微鏡 照片。 圖13爲示出試料R之粒子形狀的掃描型電子顯微鏡 照片。 圖14爲示出試料Τ之粒子形狀的掃描型電子顯微鏡 照片。 圖15爲示出試料U之粒子形狀的掃描型電子顯微鏡 照片。 圖16爲示出試料Υ之粒子形狀的掃描型電子顯微鏡 照片。 -39-17.45 g of stannous chloride 2 hydrate (SnCl 2 · 2Η20, manufactured by Wako Pure Chemical Industries, Ltd.) was dissolved in 19.46 g of a 35 % aqueous hydrochloric acid solution. To the solution, 18.54 g of pure water was added to adjust the concentration to obtain an aqueous solution of stannous chloride. Next, the above-mentioned stannous chloride aqueous solution and 5 equivalents of sodium hydroxide aqueous solution were simultaneously added at a pH of 4 ± 0.2 at 0.5 liter of pure water at 90 ° C for 20 minutes while being added thereto. After the addition, the mixture was aged for 10 minutes. Thereafter, the pH was 3.0 using 3 equivalents of an aqueous hydrochloric acid solution, and the mixture was stirred for 5 minutes to start washing. When the filtrate had a specific resistance of 15,000 Ωcm, the washing was stopped, and the obtained cake was placed in the atmosphere at 1 〇 5 t for one night and dried. The dried product was hand-pulverized in an agate mortar to obtain the flaky tin oxide particles of the present invention (sample C). When the sample C was observed by a scanning electron microscope, it was found that the longest width and the shortest width were in the range of 〇. 5 to 40 μm, and the flaky particles having a thickness in the range of 0.005 to 2 μm. Further, in the X-ray diffraction measurement, an X-ray diffraction cross-sectional view peculiar to the flaky stannous oxide having a peak intensity ratio of 1.0 or more with respect to the (101) plane of the stannous oxide (110) plane is obtained. (Example 4) 2.0 g of the sample C obtained in Example 3 was placed in an aluminum crucible, and calcined at 900 °C for 2 hours in a gas of -23 - 201014797 to obtain flaky tin oxide particles of the present invention (sample D). The scanning electron micrograph of the sample D is shown in Fig. 5» from Fig. 5, the flaky particles having the range of the longest width and the shortest width of 0.05 to 40 μm and the thickness of 0.005 to 2 μm are known. Further, when X-ray diffraction measurement is performed, in the same manner as in the second embodiment, the X-ray diffraction cross-section unique to the flaky tin oxide is used, and the peak intensity ratio of the (101) plane/(110) plane is 6.2. 2.0 g of the dried product obtained in Example 3 and 0.4 g of sodium chloride were slowly pulverized in an agate mortar, and 2.0 g of the aluminum mash was taken out and placed in an aluminum crucible, and calcined at 900 ° C for 2 hours in the atmosphere. Flaky tin oxide particles (sample E). A scanning electron microscope photograph of sample E is shown in Fig. 6. As is apparent from Fig. 6, the flaky particles having a longest width of about 0.5 to 6 μm are obtained. The electron micrograph of the high magnification has a thickness of about 0.08 to 2.0 μm. Further, in the X-ray diffraction measurement, in the same manner as in the second embodiment, the X-ray diffraction cross-section characteristic of the flaky tin oxide was used, and the peak intensity ratio of the (1 0 1 ) plane/(1 1 0) plane was 2.0. Example 6 2.0 g of the dried product obtained in Example 3 and 0.4 g of stannous chloride were slowly pulverized in an agate mortar, and 2.0 g of the aluminum bismuth-24-201014797 was taken out and 900° in the atmosphere. C was calcined for 2 hours to obtain tin oxide particles of the present invention (sample F). A scanning electron microscope photograph of sample F is shown in Fig. 7. It is known that the longest width is about 0.1 to 0.5 μm. The electron micrograph of the rate is about 0.05 to 1.5 μm. Further, in the X-ray diffraction measurement, in the same manner as in the second embodiment, the X-ray diffraction cross-sectional view of the flaky tin oxide is present, and the (1 0 1 ) plane/(1 1 0) plane wave is applied to the embodiment 7 in the embodiment 3. The flaky tin oxide particles of the present invention (sample G) sample G was obtained by a scanning electron microscope, except that the alkali source 5% ammonia water used in the simultaneous addition was used instead of 5 equivalents of sodium hydroxide. When observed, it was found that the longest width and the shortest width were in the range of 0.05 to 40 μm, and the thickness was 0.005 to the range of the flaky particles. Further, in the X-ray diffraction measurement, an X-ray diffraction cross-section unique to the flaky stannous oxide having a peak intensity ratio of j or more on the (101) plane of the stannous oxide (110) plane is obtained. (Example 8) 2.0 g of the sample G obtained in Example 7 was placed in an aluminum crucible, and calcined at 900 °C for 2 hours in the gas to obtain flaky oxygen particles (sample Η) of the present invention. A scanning electron microscope photograph of the sample is shown in Fig. 8. From the picture sheet 7, the peak intensity can be high, and the same intensity and 2 μιη can be used. The phase of the longest width and the shortest width are 0.05 to 40 μm, respectively. The thickness is 0.005~ Flaky particles in the range of 2 μηι. Further, in the X-ray diffraction measurement, in the same manner as in the second embodiment, the X-ray diffraction cross-section characteristic of the flaky tin oxide is used, and the peak intensity ratio of the (1 〇1) plane/(1 1 〇) plane is 8 · 3 Example 9 17.45 g of stannous chloride 2 hydrate (SnCl 2 · 2Η20 and Wako Pure Chemical Industries, Ltd.) was dissolved in 19.46 g of a 35 % aqueous hydrochloric acid solution. To the solution, 18.54 g of pure water was added to adjust the concentration to obtain an aqueous solution of stannous chloride. Next, the above aqueous solution of arsenic chloride and the dissolved sodium citrate solution (water glass, SiO 2 portion; 35 to 38%, reagent, manufactured by Kanto Chemical Co., Ltd.) were 0.14 g in a pure water 〇 5 ° C at 90 ° C. Five equivalents of aqueous sodium hydroxide solution was added while maintaining pH 4±0.2 for 20 minutes, and after the addition, the mixture was aged for 1 minute. Thereafter, the pH was 3.0 using 3 equivalents of an aqueous hydrochloric acid solution, and the mixture was stirred for 5 minutes to start washing. When the filtrate had a specific resistance of 105,000 Qcm, the washing was stopped, and the obtained cake was placed in the atmosphere at 105 ° C overnight, and dried. The dried product was hand-pulverized in an agate mortar to obtain the flaky tin oxide particles of the present invention (Sample I). When the sample I was observed by a scanning electron microscope, it was found that the longest width and the shortest width were in the range of 0.05 to 40 μm, and the thickness was in the range of 0.005 to 2 μm. Further, in the case of performing X-ray diffraction measurement, the X-ray diffraction profile specific to the flaky stannous oxide having a peak intensity ratio of 1.0 -26 to 201014797 or more with respect to the (101) plane of the stannous oxide (110) plane is obtained. . Example 1 〇- 2.0 g of the sample I obtained in Example 9 was placed in an aluminum crucible, and calcined at 900 ° C for 2 hours in a large atmosphere to obtain a hydrazine containing the present invention (converted to 3 丨〇 2 as 0.5). 3% by weight of flaky tin oxide particles (sample J). A scanning electron microscope photograph of sample J is shown in Fig. 9. As can be seen from Fig. 9, the longest width and the shortest width are flaky particles having a range of 〇. 5 to 40 μm and a thickness of 0.005 to 2 μm. Further, in the X-ray diffraction measurement, in the same manner as in the second embodiment, the X-ray diffraction cross-section characteristic of the flaky tin oxide is used, and the peak intensity ratio of the (1 〇1) plane/(1 1 〇) plane is 5.1 〇. Example 11 In the same manner as in Example 9, except that 0.47 g of a sodium citrate solution was used instead of φ 〇. 14 g, the flaky tin oxide particles of the present invention (sample Κ) were obtained. When the sample was observed by a scanning electron microscope, it was found that the longest width and the shortest width were in the range of 〇. 5 to 40 μm, and the flaky particles having a thickness in the range of 0.005 to 2 μm. Further, in the X-ray diffraction measurement, an X-ray diffraction cross-sectional view peculiar to the flaky stannous oxide having a peak intensity ratio of 1.0 or more with respect to the (101) plane of the stannous oxide (110) plane is obtained. Example 1 2 -27- 201014797 The sample κ 2.0 g obtained in Example 11 was placed in aluminum crucible' and was subjected to 90 (TC calcination for 2 hours in the atmosphere to obtain hydrazine containing the present invention (in terms of SiO 2 of 1.64% by weight) The flaky tin oxide particles (sample L) The scanning electron microscope photograph of the sample L is shown in Fig. 10. As can be seen from Fig. 10, the longest width and the shortest width are respectively in the range of 〇. 5 to 40 μm, and the thickness is 0.005 to 2 In the case of X-ray diffraction measurement, in the same manner as in Example 2, the X-ray diffraction cross section unique to the flaky tin oxide is used, and the peak intensity ratio of the (101) plane/(110) plane is 6.2. Example 1 3 In the same manner as in Example 9, except that 0.91 g of sodium citrate solution was used instead of 0.14 g, the flaky tin oxide particles of the present invention (sample Μ) were obtained. When observed by an electron microscope, it is known that the longest width and the shortest width are in the range of 〜·〇5 to 40 μm, and the thickness is 0.005 to 2 μηη in the range of 0.005 to 2 μηη. Further, when X-ray diffraction is measured, it has a relative oxidation degree. An X-ray diffraction cross-sectional view peculiar to the flaky stannous oxide having a peak intensity ratio of the (101) plane of the tin (110) plane of 1.0 or more. Example 1 4 The sample of the sample obtained in Example 13 was placed in an aluminum crucible. And calcined at 900 °C for 2 hours in the atmosphere to obtain flaky tin oxide particles (sample N) containing ruthenium (converted from -28 to 201014797 to SiO2 of 3.2% by weight). The electron micrograph is shown in Fig. 11. It can be seen from Fig. 11 that the longest width and the shortest width are in the range of 0.05 to 40 μm, and the thickness is in the range of 0.005 to 2 μm, and the X-ray diffraction measurement is performed. Example 2, X-ray diffraction cross-section characteristic of flaky tin oxide, the peak intensity ratio of the (1 〇 1 ) plane / ( 1 1 0 ) plane is Example 15 in Example 9, except that 0.14 g is used. Sodium aluminate (Α12〇3: 34 ~3 9 %) was used in the same manner as in Example 9 except that sodium citrate solution was used to obtain the flaky tin oxide particles of the present invention (sample Ο). When the sample was observed by a scanning electron microscope It can be seen that the longest width and the shortest width are 0.05~ a flaky particle having a thickness of 0.005 to 2 μm φ in the range of 40 μm, and a sheet having a peak intensity ratio of 10 or more with respect to the (101) plane of the (110) plane of the stannous oxide (110) surface when subjected to X-ray diffraction measurement. X-ray diffraction cross-section characteristic of stannous oxide. Example 1 6 The sample Ο obtained in Example 15 was placed in an aluminum crucible and calcined at 900 ° C for 2 hours in the atmosphere to obtain the inscription of the present invention. The flaky tin oxide particles (sample p) converted to Ah 〇 3 (0.5% by weight) -29- 201014797 A scanning electron microscope photograph of sample P is shown in Fig. 12 . As is apparent from Fig. 12, the longest width and the shortest width are each in the range of 0.05 to 40 μm, and the thickness is in the range of 0.005 to 2 μm. Further, in the X-ray diffraction measurement, in the same manner as in the second embodiment, the X-ray diffraction cross-section characteristic of the flaky tin oxide is used, and the peak intensity ratio of the (1 〇1) plane/(1 1 0) plane is 10.9 °. Example 1 7 17.45 g of stannous chloride 2 hydrate (SnCl 2 · 2Η20, manufactured by Wako Pure Chemical Industries, Ltd.) and 0.02 g of lanthanum chloride (SbCl3 reagent, manufactured by Nacarai Tesk Co., Ltd.) were dissolved in 19.46 g of a 35 % aqueous hydrochloric acid solution. . To the solution, 18.54 g of pure water was added to adjust the concentration to obtain an aqueous solution of stannous chloride containing ruthenium chloride. Next, the above-mentioned stannous chloride aqueous solution and 5 equivalents of sodium hydroxide aqueous solution were simultaneously added at a temperature of 0.5 liter of pure water at 90 ° C for 5 minutes while maintaining the pH 4 ± 0.2, and the mixture was aged for 10 minutes. Thereafter, a pH of 3.0 was made using 3 equivalents of an aqueous hydrochloric acid solution, and the mixture was stirred for 5 minutes to start washing. The washing was stopped when the filtrate had a specific resistance of 15,000 Qcm, and the resulting cake was allowed to stand at 105 ° C overnight in the atmosphere and dried. The dried product was hand-pulverized in an agate mortar to obtain the flaky tin oxide particles of the present invention (sample Q). When the sample Q was observed by a scanning electron microscope, it was found that the longest width and the shortest width were in the range of 〇. 5 to 40 μm, and the flaky particles having a thickness in the range of 0.005 to 2 μm. Further, in the X-ray diffraction measurement, the X-ray diffraction cross-section unique to the flaky stannous oxide having a peak intensity ratio of 1.0 or more to the (101) plane of the stannous oxide (110) plane is -30-201014797. . Example 1 8 2.0 g of the sample Q obtained in Example 17 was placed in an aluminum crucible, and 90 (TC was calcined in the air for 2 hours to obtain a flake of the mixed crucible of the present invention (converted to 0.5% by weight of Sb205). Tin oxide particles (sample R) ° Scanning electron micrograph of sample R is shown in Fig. 13. As can be seen from Fig. 13, the longest width and the shortest width are in the range of 〇. 5 to 40 μηι, and the thickness is in the range of 0.005 to 2 μηη. In the X-ray diffraction measurement, in the same manner as in the second embodiment, the X-ray diffraction cross section unique to the flaky tin oxide is used, and the peak intensity ratio of the (101) plane/(110) plane is φ. 1 9 Dissolve 17.4 g of stannous chloride dihydrate (SnCl2 · 2Η20, manufactured by Wako Pure Chemical Industries, Ltd.) and 0.04 g of sodium tungstate (Na2W04 · 2Η20 reagent, manufactured by Wako Pure Chemical Industries, Ltd.) in 35% hydrochloric acid aqueous solution. In 19.46 g, 18.54 g of pure water was added to the solution to adjust the concentration to obtain an aqueous solution of stannous chloride containing sodium tungstate. Next, the above-mentioned chloride was added to 0.5 liter of pure water at 90 °C. Aqueous tin solution and 5 equivalents of aqueous sodium hydroxide solution While maintaining pH 4 ± 0.2 - while adding for 20 minutes, add it, and then aging for 1 〇 minutes. Thereafter, -31 - 201014797 using 3 equivalents of aqueous hydrochloric acid to make the pH 3.0', and stirring for 5 minutes to start washing. When the filtrate has a specific resistance of 10,000 SOOOQcm, the washing is stopped, and the obtained cake is placed in the atmosphere at 1 〇 5 ° C overnight, and dried. The dried product t is hand-pulverized in an agate mortar to obtain a sheet of the present invention. The tin oxide particles (sample S). When the sample S was observed by a scanning electron microscope, it was found that the longest width and the shortest width were in the range of 0.05 to 40 μm, and the thickness was in the range of 0.005 to 2 μπι. In the ray diffraction measurement, an X-ray diffraction cross-sectional view peculiar to the flaky stannous oxide having a peak intensity ratio of 1.0 or more with respect to the (101) plane of the stannous oxide (110) plane is used. Example 20 Example 19 2.0 g of the obtained sample S was placed in an aluminum crucible and calcined at 900 ° C for 2 hours in the atmosphere to obtain flaky tin oxide particles (sample T) of the blended tungsten of the present invention (in terms of W03: 1% by weight). Sample T scan The electron micrograph is shown in Fig. 14. As can be seen from Fig. 14, the longest width and the shortest width are in the range of 0.05 to 40 μm, and the thickness is in the range of 0.005 to 2 μm, and the X-ray diffraction measurement is performed simultaneously. Example 2 'X-ray diffraction cross-section characteristic of flaky tin oxide, the peak intensity ratio of the (101) plane / (110) plane was 3.0 〇 Example 2 1 The sample D obtained in Example 4 was centrifuged ( After the pulverization of the centrifugal mill (ZM-100) of Rich Corporation-32-201014797, 10 g of this sample was placed in 1 liter of pure water to carry out slurry formation. After the temperature of the slurry was raised at 90 ° C, 2.33 g of tin chloride (SnCl4 · 5H20, reagent, manufactured by Wako Pure Chemical Industries, Ltd.) and 0.14 g of lanthanum chloride (SbCl3, reagent, manufactured by Nacari Tesk Co., Ltd.) were dissolved. A solution of 3 equivalents of aqueous hydrochloric acid solution and 5 equivalents of aqueous sodium hydroxide solution were added while maintaining a constant pH for 60 minutes. Further, it was aged for 60 minutes, after which it was dehydrated, washed, and dried. After the dried powder was lightly pulverized with an agate mortar, 2.0 g of aluminum crucible was placed and calcined at 650 ° C for 60 minutes in the atmosphere. The ruthenium-doped tin oxide-doped tin oxide particles (sample U) of the present invention were obtained. A scanning electron microscope photograph of the sample U is shown in Fig. 15. As can be seen from Fig. 15, the longest width and the shortest width are each in the range of 0.05 to 40 μm, and the thickness is in the range of 0.005 to 2 μm. Further, in the X-ray diffraction measurement as described above, in the same manner as in the second embodiment, the X-ray diffraction cross-section characteristic of the flaky tin oxide is obtained, and the peak intensity ratio of the (1 〇 1 ) plane / (1 1 0 ) plane is 3.4. . Example 22 The sample D obtained in Example 4 was calcined at 9 ° C for 2 hours under a nitrogen atmosphere to obtain a scanning electron micrograph of the flaky tin oxide particle (sample ν ) of the present invention 0 sample V. The longest width and the shortest width are respectively 〇·〇5~40μπι, and the thickness is 0.005~2μπι-33- 201014797. Further, in the case of the x-ray diffraction measurement, in the same manner as in the fourth embodiment, the X-ray diffraction cross-section characteristic of the flaky tin oxide was used, and the peak intensity ratio of the (1 01 ) plane/(1 10) plane was 6.2. Example 23 A sample of the sample V obtained in Example 22 was pulverized by a Likai machine (Ishikawa-type stirring Likai machine AGA manufactured by Ishikawa Kogyo Co., Ltd.) for 5 minutes to obtain tin oxide particles (sample W). From the scanning electron micrograph of the sample W, it was found to be an amorphous particle. Further, in the X-ray diffraction measurement, there is an X-ray diffraction cross-section unique to tin oxide, and the peak intensity ratio of the (1 0 1 ) plane/(1 1 0 ) plane is 3.1. Comparative Example 1 27.12 g of tin chloride pentahydrate (SnCl2 · 5H20, manufactured by Wako Pure Chemical Industries, Ltd.) was dissolved in 19.46 g of a 35% hydrochloric acid aqueous solution. To the solution, 18.54 g of pure water was added for concentration adjustment to obtain a stannous chloride aqueous solution. Next, the above-mentioned aqueous solution of tin chloride and 5 parts of sodium hydroxide aqueous solution were added while maintaining the pH of 4±0.2 for 20 minutes in 0.5 liter of pure water at 90 ° C, and after the addition, the mixture was aged for 10 minutes. Thereafter, a pH of 3.0 was made using a 3 equivalent aqueous hydrochloric acid solution, and the mixture was stirred for 5 minutes to start washing. The washing was stopped when the specific gravity of the filtrate was 15,000 Qcm, and the obtained cake was placed in the atmosphere at 1 〇 5 ° C overnight, and dried. The dried product was hand-pulverized with -34· 201014797 agate mortar to obtain tin oxide particles (sample χ). When the sample X was observed by a scanning electron microscope, it was found to be granular. Further, in the X-ray diffraction measurement, an X-ray diffraction cross-sectional view having an amorphous state is performed. Comparative Example 2 A sample X 2.0 of the sample obtained in Comparative Example 1 was placed in an aluminum crucible, and 900 in an atmosphere. (: calcination for 2 hours, obtaining tin oxide particles (sample Y) 扫描 Scanning electron micrograph of sample Y is shown in Fig. 16» It can be seen from Fig. 16 that it is granular. In addition, when performing X-ray diffraction measurement, it has particles. The X-ray diffraction cross section (Fig. 3) characteristic of the tin oxide, the peak intensity ratio of the (1 0 1) plane / (11 〇) plane is 〇. 8. Comparative Example 3 The sample Y obtained in Comparative Example 2 was nitrogen. After calcination at 900 ° C for 2 hours under ambient gas, tin oxide particles (sample Z) were obtained. Scanning electron micrographs of sample Z were found to be granular, and when subjected to X-ray diffraction measurement, there was granular tin oxide. The unique X-ray diffraction cross-sectional view shows that the peak intensity ratio of the (1 〇1) plane/(110) plane is 0.8. The above samples d, r, t, and u are respectively taken out to 1.0 g of 'clamped copper electrodes, at 100 kg. The powder volume resistance 値( Ωοιη ) was measured under a pressure of /cm 2 (using a multimeter -35-201014797 3457A manufactured by Hewlet Packard Co., Ltd., calculated according to the following formula 1), and is shown in Table 1. Formula 1: Powder volume Resistance 値 (ncm) = {volume resistance 値 (measured 値; Ω) 面积 area of the sample Cm2)}/thickness (cm) The sample R of the blended crucible, the sample T blended with tungsten, and the sample U coated with tin oxide doped with antimony, the volume resistivity of the powder is lower than that of the sample D, and it can be known that it can be used as the conductivity. [Table 1]_Volume resistance 値(Ωαη) Example 4 D 24.5x106 Example 18 R 335 Example 20 T 1.03χ103 Example 21 U 13 The above-mentioned samples V, w, and z were respectively 5.0 g. The aluminum cup was placed in a constant temperature drier at 80 ° C for 4 weeks. Thereafter, the powder volume resistance 値 (Qcm ) was measured by the above method and shown in Table 2. The sample V of Example 22 was When the tin oxide was calcined in a non-oxidizing atmosphere, the sample W of Example 23 was a sample in which the sample V was pulverized, but both of them were low in powder volume resistance, and it was found that the sample can be used as a conductive filler. The sample V and W of 23 were lower than the initial powder volume resistance 4 after 4 weeks, and it was found that the change in volume resistance due to heating was low. The reason was considered to be tin oxide (1) 0 1) The reason why the peak intensity ratio of the face/(110) plane is 1.0 or more, the higher the peak intensity ratio is, the larger the volume is. -36- 201014797 [Table 2] Sample volume ΡΙ Ω (Ωαη) Volume resistance ratio (値 after 4 weeks/initial 値) After the first 4 weeks Example 22 V 61.5 189 3.1 Example 23 W 85.2 1226 14.4 Comparative Example 3 Ζ 5.26 2849 542 The sample u obtained in Example 21 and the comparative sample ET-500W (manufactured by Ishihara Sangyo Co., Ltd., added with bismuth tin dioxide-coated spherical titanium dioxide) were divided into 20 g, Aery die A -165 (manufactured by Dainippon Ink Chemical Industry Co., Ltd.) 30.6 g, toluene/n-butanol mixed solvent (toluene·n-butanol=1··1 by weight) 26.4 g and glass beads 50.0 g were placed in 140 ml of Meyer The mayonnaise bottle was shaken for 20 minutes with a paint conditioning tank (manufactured by R_ed-Devil). Next, 15 g of the resin composition was taken out from the vial bottle, and 14.5 g of Acrydic A-165 (manufactured by Dainippon Ink Chemical Industry Co., Ltd.) and a toluene/n-butanol mixed solvent (toluene: n-butanol = 1) were added thereto. : 1 weight φ ratio) 4.6 g, and then shaken for 3 minutes with a paint conditioning tank (manufactured by Red-Devil Co., Ltd.). Next, these resin compositions were placed on a concealing force test paper, coated with a -3 mill coater, and naturally dried overnight at room temperature. The surface resistance of these coating films is shown in Table 3 as a result of measurement by High Rester UP (manufactured by Dia Instrument Co., Ltd.). These film thicknesses are 1 9 μm. The sample U of Example 21 showed a lower surface resistance 相比 than the bismuth-doped tin dioxide-coated spherical titanium oxide, and it was found that it can be used as a conductive film of -37-201014797. [Table 3] Sample surface resistance 値 (Ω/Sq) Example 21 U 3.6xl06 Comparative sample ET-500W Over-Range (industrial availability) The tin oxide particles of the present invention are in addition to the conductive filler It can be used for catalysts, catalyst carriers, gas sensors, photocatalysts, infrared shielding agents, ceramics, metal additives, honing materials, and the like. Further, the tin oxide film in which the tin oxide particles are formed may be used to form a tin oxide film on a glass substrate in addition to a conductive film, a resistor, an electrode, a catalyst, a catalyst carrier, a gas sensor, or a transparent material. Conductive oxide coated glass, hot wire reflective glass, low emission glass, electrothermal glass, and the like. Further, it can be used in various applications such as photocatalytic materials, antireflection materials, and gas barrier materials. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view showing a X-ray diffraction cross-sectional view of a sample A. Fig. 2 is a scanning electron microscope photograph showing the particle shape of the sample A. Fig. 3 is a view showing a X-ray diffraction cross-sectional view of the sample B and the sample Y. Fig. 4 is a scanning electron microscope photograph showing the particle shape of the sample crucible. -38 - 201014797 Fig. 5 is a scanning electron microscope photograph showing the particle shape of the sample D. Fig. 6 is a scanning electron microscope photograph showing the particle shape of the sample E. Fig. 7 is a scanning electron microscope photograph showing the particle shape of the sample F. Fig. 8 is a scanning electron microscope photograph showing the particle shape of the sample 图. Fig. 9 is a scanning electron microscope photograph showing the particle shape of the sample J. Fig. 10 is a scanning electron micrograph showing the particle shape of the sample L. Fig. 11 is a scanning electron micrograph showing the particle shape of the sample crucible. Fig. 12 is a scanning electron micrograph showing the particle shape of the sample crucible. Fig. 13 is a scanning electron micrograph showing the particle shape of the sample R. Fig. 14 is a scanning electron micrograph showing the particle shape of the sample crucible. Fig. 15 is a scanning electron micrograph showing the particle shape of the sample U. Fig. 16 is a scanning electron micrograph showing the particle shape of the sample crucible. -39-

Claims (1)

201014797 七、申請專利範囲: 1·-種氧化錫粒子,其特徵爲於粉末X射線繞射中 ,相對於氧化錫(110)面之(ιοί)面的波峰強度比爲 1. 〇以上。 2. 如申請專利範圍第1項之氧化錫粒子,其中,氧 化錫爲具有氧化錫(Sn02 )之結晶構造。 3. 如申請專利範圍第1或2項之氧化錫粒子,其中 ’具有不定形狀之粒子形狀" 4·如申請專利範圍第1或2項之氧化錫粒子,其中 ,具有薄片狀之粒子形狀。 5. 如申請專利範圍第1項之氧化錫粒子,其中,氧 化錫爲具有氧化亞錫(SnO )之結晶構造,且,具有薄片 狀之粒子形狀。 6. 如申請專利範圍第4或5項之氧化錫粒子,其中 ,薄片面之厚度爲5μηι以下。 7. 如申請專利範圍第4或5項之氧化錫粒子,其中 ,薄片面之最長寬度及最短寬度分別爲0.05〜4〇μπι之範 圍,厚度爲0·005〜2μιη之範圍。 8. 如申請專利範圍第1〜7項中任一項之氧化錫粒子 ,其中,進一步含有錫以外之無機元素。 9. 如申請專利範圍第丨〜8項中任一項之氧化錫粒子 ’其中’於氧化錫粒子之表面被覆無機化合物及/或有機 化合物。 10. 如申請專利範圍第9項之氧化錫粒子,其中,於 -40- 201014797 氧化錫粒子之表面被覆導電性無機化合物。 11. 一種氧化錫粒子之製造方法,其特徵爲將錫(11 )化合物與鹼’以反應器內之pH維持於6以下添加,將 錫(II )化合物水解。 12. 如申請專利範圍第11項之氧化錫粒子之製造方 法,其中’於加入50°C以上溫度水之反應器中,添加錫( II)化合物和鹼。 13. —種氧化錫粒子之製造方法,其特徵爲將錫(Π )化合物與鹼與無機化合物,以反應器內之pH維持於6 以下添加,將錫(II )化合物水解。 14. 如申請專利範圍第11〜13項中任一項之氧化錫 粒子之製造方法,其中,氧化錫爲具有氧化亞錫之結晶構 造》 15. —種氧化錫粒子之製造方法,其特徵爲將如申請 專利範圍第1 1〜1 4項中任一項之方法所得之錫(II )化合 物的水解生成物進行煅燒。 16. 如申請專利範圍第15項之氧化錫粒子之製造方 法,其中,將錫(II)化合物之水解生成物與熔劑混合煅 燒。 1 7 .如申請專利範圍第1 5或1 6項之氧化錫粒子之製 造方法,其中,氧化錫爲具有氧化錫之結晶構造。 18. —種氧化錫粒子之製造方法,其特徵爲將如申請 專利範圍第1 1〜1 7項中任一項之方法所得的氧化錫進行 粉碎。 -41 - 201014797 19. 一種氧化錫粒子之製造方法,其特徵爲於如申請 專利範圍第1 1〜1 8項中任一項之方法所得之氧化錫粒子 的表面被覆無機化合物及/或有機化合物。 20. 如申請專利範圍第19項之氧化錫粒子之製造方 法,其中,被覆無機化合物及/或有機化合物後煅燒。 21. —種分散體,其特徵爲含有如申請專利範圍第i 〜ίο項中任一項之氧化錫粒子。 22· —種塗料,其特徵爲含有如申請專利範圍第1〜 10項中任—項之氧化錫粒子。 23. —種樹脂組成物,其特徵爲含有如申請專利範圍 第1〜10項中任一項之氧化錫粒子。 24· —種氧化錫膜,其特徵爲於基材上塗佈如申請專 利範圍第21項之分散體或如申請專利範圔第22項之塗料 〇 25. —種導電性材料,其特徵爲含有如申請專利範圍 第1〜1 0項中任一項之氧化錫粒子。 26·—種觸媒,其特徵爲含有如申請專利範圍第1〜 10項中任一項之氧化錫粒子。 27· ~種氣體感應器’其特徵爲含有如申請專利範圍 第1〜10項中任一項之氧化錫粒子。 -42-201014797 VII. Patent application: 1·- kinds of tin oxide particles, characterized in that in the powder X-ray diffraction, the peak intensity ratio of the (ιοί) plane relative to the tin oxide (110) surface is 1. 〇 or more. 2. The tin oxide particles according to claim 1, wherein the tin oxide is a crystal structure having tin oxide (Sn02). 3. The tin oxide particles according to claim 1 or 2, wherein 'the shape of the particles having an indefinite shape" 4. The tin oxide particles according to claim 1 or 2, wherein the particles have a flaky shape . 5. The tin oxide particles according to claim 1, wherein the tin oxide is a crystal structure having stannous oxide (SnO) and has a flake-like particle shape. 6. The tin oxide particle according to claim 4 or 5, wherein the thickness of the sheet surface is 5 μηι or less. 7. The tin oxide particles according to claim 4 or 5, wherein the longest width and the shortest width of the sheet surface are in the range of 0.05 to 4 μm, and the thickness is in the range of 0·005 to 2 μm. 8. The tin oxide particles according to any one of claims 1 to 7, which further contain an inorganic element other than tin. 9. The tin oxide particles 'where' of any one of the above-mentioned items of the invention are coated with an inorganic compound and/or an organic compound on the surface of the tin oxide particles. 10. The tin oxide particle of claim 9, wherein the surface of the tin oxide particle is coated with a conductive inorganic compound at -40 to 201014797. A method for producing tin oxide particles, characterized in that a tin (II) compound and a base are added at a pH of 6 or less in a reactor to hydrolyze a tin (II) compound. 12. A method of producing tin oxide particles according to claim 11 wherein a tin (II) compound and a base are added to a reactor in which water at a temperature of 50 ° C or higher is added. A method for producing tin oxide particles, characterized in that a tin (II) compound and a base and an inorganic compound are added at a pH of 6 or less in a reactor to hydrolyze a tin (II) compound. The method for producing tin oxide particles according to any one of claims 11 to 13, wherein the tin oxide is a crystal structure having stannous oxide, and the method for producing tin oxide particles is characterized in that The hydrolyzed product of the tin (II) compound obtained by the method of any one of claims 1 to 14 is calcined. 16. The method for producing tin oxide particles according to claim 15, wherein the hydrolyzed product of the tin (II) compound is mixed with a flux to be calcined. A method of producing tin oxide particles according to the fifteenth or sixteenth aspect of the patent application, wherein the tin oxide is a crystal structure having tin oxide. A method for producing a tin oxide particle, which comprises pulverizing tin oxide obtained by the method according to any one of claims 1 to 17. A method for producing a tin oxide particle, characterized in that the surface of the tin oxide particle obtained by the method according to any one of claims 1 to 18 is coated with an inorganic compound and/or an organic compound. . 20. The method for producing tin oxide particles according to claim 19, wherein the inorganic compound and/or the organic compound are coated and then calcined. A dispersion comprising the tin oxide particles according to any one of the claims i to ̄. 22. A coating comprising a tin oxide particle as claimed in any one of claims 1 to 10. A resin composition comprising the tin oxide particles according to any one of claims 1 to 10. A tin oxide film characterized in that a dispersion of a coating according to claim 21 or a coating material of a coating of claim 22 is coated on a substrate, characterized in that The tin oxide particles according to any one of claims 1 to 10 of the patent application. A catalyst comprising a tin oxide particle according to any one of claims 1 to 10. The gas sensor of the invention is characterized in that it contains the tin oxide particles according to any one of claims 1 to 10. -42-
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