TW201008960A - Epoxy resin composition, the cured article thereof, light-semiconductor sealing material, and light-semiconductor device - Google Patents

Epoxy resin composition, the cured article thereof, light-semiconductor sealing material, and light-semiconductor device Download PDF

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TW201008960A
TW201008960A TW98124026A TW98124026A TW201008960A TW 201008960 A TW201008960 A TW 201008960A TW 98124026 A TW98124026 A TW 98124026A TW 98124026 A TW98124026 A TW 98124026A TW 201008960 A TW201008960 A TW 201008960A
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epoxy resin
aliphatic
resin composition
acid
mass
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TW98124026A
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Chinese (zh)
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Atsuko Kobayashi
Ichirou Ogura
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Dainippon Ink & Chemicals
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/10Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polymers containing more than one epoxy radical per molecule
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/52Encapsulations
    • H01L33/56Materials, e.g. epoxy or silicone resin

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

The subject of the present invention provides an epoxy resin composition showing the excellent liquidity in the state of the varnish, in the meantime, showing the excellent heat-yellowing resistance, and further showing the excellent performance in the strength of the cured article. An epoxy resin composition is characterized in that comprises epoxy resin (A), having 150 to 500g/eq. of epoxy equivalent of biphenol type epoxy resin or cyclic aliphatic structure; methacrylic acid (B); radical polymerization monomer having acid groups that contains aliphatic ester bonds or aliphatic carbonate (C), and radical polymerization initiator (D) as the essential components.

Description

201008960 六、發明說明: 【發明所屬之技術領域】 本發明係相關於適用於光半導體封止材之環氧樹脂組 成物、其硬化物、光半導體封止材及光半導體裝置。 【先前技術】 近年,廣泛使用LED、光電耦合器、光感應器、半導 體雷射、影像感應器等光半導體裝置作爲發光元件或光傳 送裝置,組合芳香族系環氧樹脂與酸酐系硬化劑而成之2 © 液型硬化劑,因成形加工性和透明性等優異,故被使用爲 封止光半導體因子之樹脂材料。 惟,使用上述芳香族系環氧樹脂爲主劑之封止材料, 因此樹脂中的芳香環之吸光,易導致硬化物之黃變,特別 是在LED領域,演進爲LED元件的高輸出化及短波長化, 因上述芳香族系環氧樹脂易於吸收此短波長的光,故導致 光半導體元件黃變及光輸出效率之低落。 少發生硬化物的黃變之光半導體封止材料,例如使用 3,4-環氧環己基甲基-3’,4’-環氧環己烷羧酸酯等脂肪族環 狀環氧化合物爲主劑之技術(參考專利文獻1)。惟,即 使爲此類非芳香族系化合物,亦無法避免因其硬化物之熱 經歷而有的黃變,特別是無法具有近年需求高之高輸出型 的高亮度LED的封止材料所需之熱安定性。又,光半導體 封止材料需具有適度的柔軟性,以上述脂肪族環狀環氧化 合物爲主劑之封止材料,因硬化物係硬且脆,而不具適度 之強度,爲其缺點。且,此類環氧硬化系之封止材料,因 -4- 201008960 硬化反應須長時間,故光半導體裝置的生產性低落,爲提 升硬化速度,而於硬化反應時過度加熱後’仍導致硬化物 之著色。 因此,從硬化物的耐熱性、耐濕性優異且可於短時間 內硬化之觀點,而使用紫外線硬化型之封止材料,例如, 使上述脂肪族環狀環氧化合物之乙烯酯化合物藉由自由基 聚合而硬化之方法(參考下述專利文獻2) »惟,使用乙 烯酯化合物時,必須進行使脂肪族環狀環氧化合物與甲基 Φ 丙烯酸反應之步驟,對工業生產而言,非爲適當之方法, 且脂肪族環狀環氧化合物與甲基丙烯酸之反應生成物爲固 態,故使用爲光半導體封止材料時,必須調整成溶液狀之 清漆,而侷限材料之設計,不易因應近年光半導體裝置之 用途的明顯的擴大。又,此硬化物本身的著色亦明顯,且 光輸出效率低落,不易達到LED封止材之實用化。 [專利文獻1]特開平6-3 1 6626號公報 ^ [專利文獻2]特開2006-332262號公報 ❹ 【發明內容】 發明解決之課題 因此,本發明解決之課題,係提供一種於清漆狀態的 流動性優異,又硬化物之透明性及熱經歷後之耐熱黃變性 優異’且硬化物的強度亦優異之環氧樹脂組成物。 解決課題之手段 本發明者等,爲解決上述課題而致力於硏究之結果, 發現使已配合環氧樹脂和甲基丙烯酸及含特定酸基的自由 '201008960 基聚合性單體之組成物進行反應,而使之硬化,亦即藉由 原位(in situ)反應而硬化,藉此,不僅硬化前具有優異之流 動性,且硬化後仍具有優異之透明性、耐熱黃變性及強度, 而完成本發明。 亦即,本發明係相關於一種以環氧樹脂(A )、甲基丙 烯酸(B)、含有具脂肪族酯鍵或脂肪族碳酸酯鍵的含酸基 之自由基聚合性單體(C)及自由基聚合引發劑(D)爲必 要成分之環氧樹脂組成物。 β 由上述環氧樹脂組成物形成之光半導體封止材。 本發明又相關於一種將上述透明性環氧樹脂組成物賦 型後,藉由加熱或照射活性能量線而硬化之硬化物。 本發明又相關於一種將上述透明性環氧樹脂組成物賦 型後,藉由加熱或照射活性能量線而進行硬化之硬化物之 製造方法。 本發明更相關於一種以上述透明性環氧樹脂組成物來 ©封止光半導體之光半導體裝置。 發明效果 依據本發明,可提供一種於清漆狀態之流動性優異, 又硬化物於熱經歷後之耐熱黃變性儍異,且機械強度亦具 有優異性能之環氧樹脂組成物。 【實施方式】 進行發明之最佳形態 以下,詳細地說明本發明。 本發明之環氧樹脂組成物,如上述般,係以環氧樹脂 201008960 (A)、甲基丙烯酸(B)、含有具脂肪族酯鍵或脂肪族碳 酸酯鍵的含酸基之自由基聚合性單體(C)及自由基聚合引 發劑(D)爲必要成分,連續乃至同時地進行環氧基與酸基 之反應,和自由基聚合性基之聚合反應。如此,藉由原位 反應而使其硬化之作法,可改善硬化前以環氧樹脂和硬化 劑爲必要成份之環氧樹脂組成物之流動性,同時,明顯地 提升硬化物的耐熱黃變性和強度,此乃其特點。 使用於本發明之環氧樹脂(A),例如雙酚A型環氧 Ο 樹脂、雙酚F型環氧樹脂等雙酚型環氧樹脂;加氫雙酚A 型環氧樹脂、加氫雙酚F型環氧樹脂等加氫雙酚型環氧樹 脂;苯酚酚醛清漆樹脂型環氧樹脂、甲酚酚醛清漆型環氧 樹脂、雙酚A酚醛清漆型環氧樹脂等酚醛清漆型環氧樹 脂;苯二甲酸、二聚物酸等多氯酸類的聚縮水甘油酯;二 胺基二苯基甲烷、三聚異氰酸等聚胺類與環氧氯丙烷反應 所得之縮水甘油胺型環氧樹脂;丁基縮水甘油醚、i,6-己二 醇二縮水甘油醚、新戊二醇二縮水甘油醚、環己烷二甲醇 二縮水甘油醚、聚丙二醇縮水甘油醚、三羥甲基丙烷三縮 水甘油醚等直鏈型脂肪族環氧樹脂;具有2- (3,4-環氧) 環己基-5,5-螺-(3,4-環氧)環己烷-間-二曙烷、3,4-環氧環 己基甲基-3,4-環氧環己烷羧酸酯、3,4-環氧-6 -甲基環己基 甲基-3,4-環氧-6-甲基環己烷羧酸酯、乙烯環己烷二氧化 物、雙(3,4-環氧環己基甲基)己二酸酯、雙(3,4-環氧-6-甲基環己基甲基)己二酸酯、環外-環外雙(2,3-環氧環戊 基)醚、2,2-雙(4-(2,3-環氧丙基)環己基)丙烷、2,6- 201008960 雙(2,3-環氧丙氧環己基-對-二噚烷)、2,6-雙(2,3·環氧 丙氧)降茨烯、亞油酸二聚物的二縮水甘油醚、檸檬烯二 氧化物、2,2-雙(3,4-環氧環己基)丙烷、二環戊二烯二氧 化物、鄰-(2,3-環氧)環戊基苯基-2,3-環氧丙醚、1,2-雙 〔5-( 1,2-環氧)-4,7-六羥甲烷茚氧〕乙烷、環己二醇二縮 水甘油醚及二縮水甘油六羥苯二甲酸酯等環狀脂肪族結構 之環氧樹脂等。 其中,從預防硬化物的黃變之觀點,宜爲雙酚型環氧 Ο 樹脂中,環氧當量150~l,000g/eq.的低分子量體,或含有 直鏈型脂肪族環氧樹脂、加氫雙酚型環氧樹脂及環狀脂肪 族結構之環氧樹脂,特別是從形成流動性優異的清漆之觀 點,宜爲環氧當量150~500g/ eq.的雙酚型環氧樹脂及含有 環狀脂肪族結構之環氧樹脂。 其次,使用於本發明的甲基丙烯酸(B),係如上述般, 與環氧樹脂(A)反應之同時,藉由自由基聚合而發生丙烯 醯基之聚合。本發明係可藉由進行該利用原位反應之硬 化,而明顯地提升耐熱黃變性。 使用於本發明的含有具脂肪族酯鍵或脂肪族碳酸酯鍵 的含酸基之自由基聚合性單體(C),係一種爲提升硬化物 的透明性而提升光輸出效率,同時給予硬化物適度的柔軟 性而提升強度時之必需成份。相關的含酸基之自由基聚合 性單體(C),具體而言’從與環氧樹脂(A)之相溶性之 觀點,宜爲下述結構式(1)所示者。 201008960 ο201008960 VI. Description of the Invention: [Technical Field] The present invention relates to an epoxy resin composition suitable for an optical semiconductor sealing material, a cured product thereof, an optical semiconductor sealing material, and an optical semiconductor device. [Prior Art] In recent years, an optical semiconductor device such as an LED, a photocoupler, a photosensor, a semiconductor laser, or an image sensor has been widely used as a light-emitting element or an optical transmission device, and an aromatic epoxy resin and an acid anhydride-based hardener are combined. In the case of the liquid-type hardener, it is used as a resin material for sealing the photo-semiconductor factor because it is excellent in moldability and transparency. However, since the aromatic epoxy resin is used as the sealing material of the main component, the absorption of the aromatic ring in the resin tends to cause yellowing of the cured product, and in particular, in the field of LEDs, the LED element is highly exported. In the case of shortening the wavelength, the aromatic epoxy resin easily absorbs the short-wavelength light, resulting in yellowing of the optical semiconductor element and a decrease in light output efficiency. An optical semiconductor sealing material having less yellowing of a cured product, for example, an aliphatic cyclic epoxy compound such as 3,4-epoxycyclohexylmethyl-3',4'-epoxycyclohexanecarboxylate is used. The technique of the main agent (refer to Patent Document 1). However, even for such non-aromatic compounds, yellowing due to the thermal history of the cured product cannot be avoided, and in particular, it is not required to have a high-output type high-brightness LED sealing material which has been in high demand in recent years. Thermal stability. Further, the photo-semiconductor sealing material needs to have moderate flexibility, and the above-mentioned aliphatic cyclic epoxide is mainly used as a sealing material, and since the hardened material is hard and brittle, it does not have moderate strength, which is a disadvantage. Moreover, such an epoxy hardening type sealing material has a long-term hardening reaction due to -4-201008960, so the productivity of the optical semiconductor device is low, and the hardening speed is increased, and the excessive curing after the hardening reaction is still caused by the hardened material. The color. Therefore, from the viewpoint of excellent heat resistance and moisture resistance of the cured product and curing in a short time, an ultraviolet curing type sealing material is used, for example, a vinyl ester compound of the above aliphatic cyclic epoxy compound is used. A method of curing by radical polymerization (refer to Patent Document 2 below). However, when a vinyl ester compound is used, a step of reacting an aliphatic cyclic epoxy compound with methyl Φ acrylic acid is required, and for industrial production, In order to be a suitable method, and the reaction product of the aliphatic cyclic epoxy compound and methacrylic acid is solid, when it is used as a photo-semiconductor sealing material, it must be adjusted into a solution-like varnish, and the design of the limited material is not easy to cope with. A significant expansion in the use of optical semiconductor devices in recent years. Moreover, the color of the cured product itself is also conspicuous, and the light output efficiency is low, and it is difficult to achieve practical use of the LED sealing material. [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. 2006-332262. [Patent Document 2] JP-A-2006-332262A SUMMARY OF THE INVENTION PROBLEMS TO BE SOLVED BY THE INVENTION Accordingly, the object of the present invention is to provide a varnish state. An epoxy resin composition which is excellent in fluidity, excellent in transparency of a cured product, and excellent in heat-resistant yellowing after heat history, and excellent in strength of a cured product. Means for Solving the Problems As a result of intensive studies to solve the above problems, the present inventors have found that a composition of a free '201008960-based polymerizable monomer having an epoxy resin, methacrylic acid, and a specific acid group is blended. The reaction is hardened, that is, hardened by an in situ reaction, whereby not only excellent fluidity before hardening but also excellent transparency, heat yellowing resistance and strength after hardening are obtained. The present invention has been completed. That is, the present invention relates to an acid group-containing radical polymerizable monomer (C) containing an epoxy resin (A), methacrylic acid (B), and having an aliphatic ester bond or an aliphatic carbonate bond. And the radical polymerization initiator (D) is an epoxy resin composition of an essential component. β An optical semiconductor sealing material formed of the above epoxy resin composition. Further, the present invention relates to a cured product which is cured by heating or irradiating an active energy ray after the above transparent epoxy resin composition is formed. Further, the present invention relates to a method for producing a cured product which is cured by heating or irradiating an active energy ray after the transparent epoxy resin composition is formed. The present invention is more related to an optical semiconductor device in which an optical semiconductor is sealed by the above-described transparent epoxy resin composition. EFFECTS OF THE INVENTION According to the present invention, it is possible to provide an epoxy resin composition which is excellent in fluidity in a varnish state, and which has a heat-resistant yellowing property after heat treatment, and which has excellent mechanical strength and excellent properties. [Embodiment] BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in detail. The epoxy resin composition of the present invention, as described above, is an epoxy resin 201008960 (A), methacrylic acid (B), and an acid group-containing radical polymerization having an aliphatic ester bond or an aliphatic carbonate bond. The monomer (C) and the radical polymerization initiator (D) are essential components, and the reaction of the epoxy group with the acid group and the polymerization of the radical polymerizable group are carried out continuously or simultaneously. Thus, by hardening it by in-situ reaction, the fluidity of the epoxy resin composition containing an epoxy resin and a hardener as an essential component before hardening can be improved, and at the same time, the heat-resistant yellowing of the cured product is remarkably enhanced. Strength, this is its characteristic. The epoxy resin (A) used in the present invention, for example, a bisphenol type epoxy resin such as a bisphenol A type epoxy resin or a bisphenol F type epoxy resin; a hydrogenated bisphenol A type epoxy resin and a hydrogenation double Hydrogenated bisphenol type epoxy resin such as phenol F type epoxy resin; phenol novolak resin type epoxy resin, cresol novolac type epoxy resin, bisphenol A novolac type epoxy resin, etc. Polyglycidyl ester of polychloric acid such as phthalic acid or dimer acid; glycidylamine type epoxy obtained by reacting polyamines such as diaminodiphenylmethane and trimeric isocyanic acid with epichlorohydrin Resin; butyl glycidyl ether, i, 6-hexanediol diglycidyl ether, neopentyl glycol diglycidyl ether, cyclohexane dimethanol diglycidyl ether, polypropylene glycol glycidyl ether, trimethylolpropane a linear aliphatic epoxy resin such as triglycidyl ether; having 2-(3,4-epoxy)cyclohexyl-5,5-spiro-(3,4-epoxy)cyclohexane-m-dioxin Alkane, 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, 3,4-epoxy-6-methylcyclohexylmethyl-3,4-epoxy-6 -methylcyclohexane Acid ester, ethylene cyclohexane dioxide, bis(3,4-epoxycyclohexylmethyl) adipate, bis(3,4-epoxy-6-methylcyclohexylmethyl)adipate Ester, exo-ring-exo-bis(2,3-epoxycyclopentyl)ether, 2,2-bis(4-(2,3-epoxypropyl)cyclohexyl)propane, 2,6-201008960 double (2,3-glycidoxycyclohexyl-p-dioxane), 2,6-bis(2,3·epoxypropoxy)norzene, diglycidyl ether of linoleic acid dimer, Limonene dioxide, 2,2-bis(3,4-epoxycyclohexyl)propane, dicyclopentadiene dioxide, o-(2,3-epoxy)cyclopentylphenyl-2,3 -glycidyl ether, 1,2-bis[5-(1,2-epoxy)-4,7-hexahydromethane oxime]ethane, cyclohexanediol diglycidyl ether and diglycidyl hexahydro An epoxy resin having a cyclic aliphatic structure such as phthalic acid ester. Among them, from the viewpoint of preventing yellowing of the cured product, it is preferably a low molecular weight body having an epoxy equivalent of 150 to 1,000 g/eq., or a linear aliphatic epoxy resin, in the bisphenol epoxy resin. The hydrogenated bisphenol type epoxy resin and the epoxy resin having a cyclic aliphatic structure, in particular, from the viewpoint of forming a varnish excellent in fluidity, it is preferably a bisphenol type epoxy resin having an epoxy equivalent of 150 to 500 g/eq. An epoxy resin containing a cyclic aliphatic structure. Next, the methacrylic acid (B) used in the present invention is reacted with the epoxy resin (A) as described above, and polymerization of an acrylonitrile group is carried out by radical polymerization. The present invention can significantly enhance the heat-resistant yellowing by performing the hardening by the in-situ reaction. The acid group-containing radical polymerizable monomer (C) containing an aliphatic ester bond or an aliphatic carbonate bond used in the present invention is a type which enhances the light output efficiency while improving the transparency of the cured product while imparting hardening The necessary softness to increase the strength of the ingredients. The acid group-containing radical polymerizable monomer (C) is specifically represented by the following structural formula (1) from the viewpoint of compatibility with the epoxy resin (A). 201008960 ο

(式中,R1表示爲碳原子數2~10的脂肪族烴基’ χ爲 酯鍵或碳酸酯鍵’ R2表示爲碳原子數2~ 10的脂肪族烴基’ η爲1〜5之整數) 上述結構式(1)中’表示爲χ的含醋鍵者’例如經院 基(甲基)丙烯酸酯與碳原子數2~ 10的脂肪族多價羧酸反 ^ 應所得之化合物、及羥烷基(甲基)丙烯酸酯和碳原子數 2~ 10的脂肪族二醇與碳原子數10的脂肪族多價羧酸反 應所得之化合物。 其中,羥烷基(甲基)丙烯酸酯例如/S-羥乙基甲基丙 烯酸酯、/3-羥乙基丙烯酸酯等。又,脂肪族多價羧酸例如 琥珀酸酐、己二酸、馬來酸酐、四氫苯二甲酸、環己烷二 羧酸。 又,碳原子數2~10的脂肪族二醇例如1,2-丙二醇、1,3-〇 丙二醇、1,4-丁 二醇、1,5-戊二醇、1,6-己二醇、1,7-庚二醇、 1,8-辛二醇、1,9-壬二醇、1,ίο-癸二醇、2·甲基-1,3-丙二醇、 2,2-二甲基-1,%丙二醇、3-甲基-丨,^戊二醇、丨,2_環己烷二 醇、1,3-環己烷二醇、ΐ,4-環己烷二醇、1,2-環己烷二甲醇、 1,3-環己烷二甲醇、ι,4-環己烷二甲醇、1,2-環己烷二乙醇、 1,3-環己烷二乙醇、ι,4-環己烷二乙醇等。其中,宜爲碳原 子數4~8的丁二醇、戊二醇、己二醇、環己烷二醇、環己 垸二甲醇’係因與環氧樹脂(Α)之相溶性優異而爲較佳。 201008960 上述結構式(ο中,表示爲χ的含碳酸酯鍵者,例如 碳原子數2~10的脂肪族二醇和碳酸二烷基經過酯交換反 應而得聚碳酸酯二醇後,與(甲基)丙烯酸或其衍生物反 應所得之化合物。 其中,碳原子數2~10的脂肪族二醇,例如1,2-丙二醇、 1,3-丙二醇、1,4-丁 二醇、1,5-戊二醇、1,6-己二醇、1,7-庚 二醇、1,8-辛二醇、1,9-壬二醇、1,10-癸二醇、2-甲基-1,3-丙二醇、2,2-二甲基-1,3-丙二醇、3-甲基-1,5-戊二醇、1,2-O 環己烷二醇、1,3-環己烷二醇、1,4-環己烷二醇、1,2-環己 烷二甲醇、1,3-環己烷二甲醇、1,4-環己烷二甲醇、1,2-環 己烷二乙醇、1,3·環己烷二乙醇、1,4-環己烷二乙醇等碳原 子數3~10者等。其中,宜爲碳原子數4~8的丁二醇、戊二 醇、己二醇、環己烷二醇、環己烷二甲醇,係因與環氧樹 脂(A)之相溶性優異。另一方面,從反應性之觀點,碳酸 二烷基宜爲碳酸二甲酯。 其中,特別是從可使硬化物具有適度的柔軟性之觀 〇 點,宜爲上述結構式(1)中的X爲酯鍵者,特別是/5-羥 乙基甲基丙烯酸酯與琥珀酸酐之附加物之3-〔 〔2-(甲基 丙烯醯氧)乙氧基〕羰基〕丙酸、羥乙基甲基丙烯酸酯 與六氫苯二甲酸之附加物之2-甲基丙烯醯氧乙基六氫苯二 甲酸。 以上詳述的環氧樹脂(A)、甲基丙烯酸(B)、及含 有具脂肪族酯鍵或脂肪族碳酸酯鍵的含酸基之自由基聚合 性單體(C)之各配合比例,從硬化物的耐熱黃變性和強度 -10- 201008960 成良好平衡之觀點,具體而言,相對於其總計100質量份, 宜配合10〜60質量份的上述環氧樹脂(A) ,1~35質量份 的上述甲基丙烯酸(B) ,5~50質量份的上述含有具脂肪 族酯鍵或脂肪族碳酸酯鍵的酸基之自由基聚合性單體(C)。 使用於本發明的自由基聚合引發劑(D),爲使用爲熱 自由基聚合引發劑者即可,例如甲基乙基酮過氧化物、甲 基環己酮過氧化物、甲基乙醯乙酸過氧化物、乙醢丙酮過 氧化物、1,1-雙(第三丁基過氧基)3,3,5-三甲基環己烷、 Φ 1,1-雙(第三己基過氧基)環己烷、1,1-雙(第三己基過氧 基)3,3,5-三甲基環己烷、1,1-雙(第三丁基過氧基)環己 烷、2,2-雙(4,4-二-第三丁基過氧基環己基)丙烷、1,1-雙 (第三丁基過氧基)環十二烷、正丁基4,4-雙(第三丁基 過氧基)戊酯、2,2-雙(第三丁基過氧基)丁烷、1,1-雙(第 三丁基過氧基)-2-甲基環己烷、第三丁基氫過氧化物、對 萜烷氫過氧化物、1,1,3,3-四甲基丁基氫過氧化物、第三己 _ 基氫過氧化物、二枯烯基過氧化物、2,5-二甲基-2,5-雙(第 ❿ 三丁基過氧基)己烷、α,α’-雙(第三丁基過氧基)二異 丙基苯、第三丁基枯烯基過氧化物、二-第三丁基過氧化 物、2,5-二甲基-2,5-雙(第三丁基過氧基)己炔-3、異丁醯 過氧化物、3,3,5-三甲基己醢過氧化物、辛醯過氧化物、月 桂醯過氧化物、月桂酸過氧化物、間甲苯醯過氧化物、苯 甲醯過氧化物、二異丙基過氧二碳酸酯、雙(4-第三丁基 環己基)過氧二碳酸酯、二-3-甲氧基丁基過氧二碳酸酯、 二-2-乙基己基過氧二碳酸酯、二-第二丁基過氧二碳酸酯、 -11- 201008960 二(3-甲基-3-甲氧丁基)過氧二碳酸酯、二(4-第三丁基 環己基)過氧二碳酸酯、α,α’·雙(過氧新癸醯基)二異 丙基苯、過氧枯烯新癸醯酯、1,1,3,3-四甲基丁基過氧新癸 醯酯、1-環己基-1-甲基乙基過氧新癸醯酯、第三己基過氧 新癸醯酯、第三丁基過氧新癸醯酯、第三己基過氧三甲基 乙酸酯、第三丁基過氧三甲基乙酸酯、2,5-二甲基-2,5-雙(2-乙基己醯過氧基)己烷、1,1,3,3-四甲基丁基過氧-2-乙基己 酸酯、1-環己基-1-甲基乙基過氧基-2-乙基己酸酯、第三己 〇 基過氧-2-乙基己酸酯、第三丁基過氧-2-乙基己酸酯、第三 丁基過氧異丁酯、第三丁基過氧馬來酸、第三丁基過氧月 桂酸酯、第三丁基過氧-3,5,5-三甲基己酸酯、第三丁基過 氧異丙基單碳酸酯、第三丁基過氧-2-乙基己基單碳酸酯、 2,5-二甲基-2,5-雙(苯甲醯過氧基)己烷、第三丁基過氧乙 酸酯、第三己基過氧苯甲酯、第三丁基過氧-間-甲苯醯苯 甲酯、第三丁過氧苯甲酯、雙(第三丁基過氧基)間苯二 甲酸酯、第三丁基過氧烯丙基單碳酸酯、3,3’,4,4’-四(第 三丁基過氧羰基)二苯甲酮等。上述自由基聚合引發劑(D) 之用量,相對於自由基聚合性成分的總質量及自由基聚合 引發劑(D)之合計質量,宜爲0.001質量%以上,2質量 %以下之比例。 本發明的環氧樹脂組成物,除上述之各成分,宜更進 一步使用含有脂肪族環狀結構之單甲基丙烯酸酯化合物 (E),係因可更加提升硬化物之耐熱黃變性》該含有脂肪 族環狀結構之單甲基丙烯酸酯化合物(E),具體而言,例 -12- 201008960 如二環戊基甲基丙烯酸酯、二環戊基氧乙基甲基丙烯酸 酯、1,2-環氧-4-乙烯環己烷、3,4-環氧環己基甲基甲基丙烯 酸酯、環己基甲基丙烯酸酯、2-甲基環己基甲基丙烯酸酯、 異冰片基甲基丙烯酸酯等。其中,尤宜選自二環戊基甲基 丙烯酸酯、1,2-環氧-4-乙烯環己烷、3,4-環氧環己基甲基甲 基丙烯酸酯、環己基甲基丙烯酸酯、及異冰片基甲基丙烯 酸酯等所組成的群組之化合物,係因更加提升硬化物之機 械強度。 © 上述含有脂肪族環狀結構之單甲基丙烯酸酯化合物 (E)之使用比例,相對於環氧樹脂(A)、甲基丙烯酸(B)、 含有具脂肪族酯鍵或脂肪族碳酸酯鍵的含酸基之自由基聚 合性單體(C)、及含有脂肪族環狀結構之單甲基丙烯酸酯 化合物(E )之合成質量100質量份,係20〜70質量份之比 例,從硬化物強度之觀點,尤宜40~60質量份之比例。 本發明的透明性環氧樹脂組成物,除上述各成分之 A 外,藉由倂用反應性矽(F),可更進一步改善硬化物之耐 光性及耐熱黃變性。該反應性矽(F),例如在聚矽氧烷結 構之一部分,含有選自胺基、環氧基、脂環族環氧基、甲 醇系羥基、矽烷醇系羥基、甲基丙烯醯基、聚醚醇基、氫 硫基及羧基所組成的群組之反應性官能基者。 更具體而言,下述結構式(2)(wherein R1 represents an aliphatic hydrocarbon group having 2 to 10 carbon atoms' χ is an ester bond or a carbonate bond' R2 represents an aliphatic hydrocarbon group having a carbon number of 2 to 10' η is an integer of 1 to 5) In the structural formula (1), a compound represented by a hydrazine-containing hydrazine bond, for example, a trans-group (meth) acrylate and an aliphatic polyvalent carboxylic acid having 2 to 10 carbon atoms, and a hydroxyalkyl group A compound obtained by reacting a (meth) acrylate and an aliphatic diol having 2 to 10 carbon atoms with an aliphatic polyvalent carboxylic acid having 10 carbon atoms. Among them, a hydroxyalkyl (meth) acrylate such as /S-hydroxyethyl methacrylate or /3-hydroxyethyl acrylate. Further, the aliphatic polyvalent carboxylic acid is succinic anhydride, adipic acid, maleic anhydride, tetrahydrophthalic acid or cyclohexane dicarboxylic acid. Further, an aliphatic diol having 2 to 10 carbon atoms, such as 1,2-propanediol, 1,3-propanediol, 1,4-butanediol, 1,5-pentanediol, 1,6-hexanediol 1,7-Heptanediol, 1,8-octanediol, 1,9-nonanediol, 1, ίο-decanediol, 2-methyl-1,3-propanediol, 2,2-dimethyl Base-1,% propylene glycol, 3-methyl-indole, pentanediol, hydrazine, 2-cyclohexanediol, 1,3-cyclohexanediol, hydrazine, 4-cyclohexanediol, 1 , 2-cyclohexanedimethanol, 1,3-cyclohexanedimethanol, iota, 4-cyclohexanedimethanol, 1,2-cyclohexanediethanol, 1,3-cyclohexanediethanol, ι , 4-cyclohexane diethanol, and the like. Among them, it is preferred that the butylene glycol, pentanediol, hexanediol, cyclohexanediol, and cyclohexyl dimethanol having a carbon number of 4 to 8 are excellent in compatibility with an epoxy resin (Α). Preferably. 201008960 The above structural formula (in the case of a carbonate-containing bond represented by ruthenium, for example, an aliphatic diol having 2 to 10 carbon atoms and a dialkyl carbonate obtained by transesterification to obtain a polycarbonate diol, a compound obtained by reacting acrylic acid or a derivative thereof, wherein an aliphatic diol having 2 to 10 carbon atoms, such as 1,2-propanediol, 1,3-propanediol, 1,4-butanediol, 1,5 - pentanediol, 1,6-hexanediol, 1,7-heptanediol, 1,8-octanediol, 1,9-nonanediol, 1,10-decanediol, 2-methyl- 1,3-propanediol, 2,2-dimethyl-1,3-propanediol, 3-methyl-1,5-pentanediol, 1,2-O cyclohexanediol, 1,3-cyclohexane Alkanediol, 1,4-cyclohexanediol, 1,2-cyclohexanedimethanol, 1,3-cyclohexanedimethanol, 1,4-cyclohexanedimethanol, 1,2-cyclohexane Alkane diethanol, 1,3-cyclohexane diethanol, 1,4-cyclohexane diethanol, etc., such as 3 to 10 carbon atoms, among which, it is preferably a butanediol having a carbon number of 4 to 8, and a pentanediol. Alcohol, hexanediol, cyclohexanediol, and cyclohexanedimethanol are excellent in compatibility with the epoxy resin (A). On the other hand, from the viewpoint of reactivity, carbon The acid dialkyl group is preferably dimethyl carbonate. Among them, in particular, from the viewpoint that the cured product has moderate flexibility, it is preferred that X in the above structural formula (1) is an ester bond, especially /5. 3-[[2-(Methacryloxy)ethoxy]carbonyl]propionic acid, hydroxyethyl methacrylate and hexahydrophthalic acid as an addition to hydroxyethyl methacrylate and succinic anhydride The addition of 2-methylpropenyloxyethyl hexahydrophthalic acid. The epoxy resin (A), methacrylic acid (B), and the aliphatic ester bond or aliphatic carbonate bond described above are contained. The mixing ratio of the acid group-containing radical polymerizable monomer (C) is from the viewpoint of a good balance between the heat-resistant yellowing resistance of the cured product and the strength of -10-201008960, specifically, 100 parts by mass relative to the total amount, It is preferable to mix 10 to 60 parts by mass of the above epoxy resin (A), 1 to 35 parts by mass of the above methacrylic acid (B), and 5 to 50 parts by mass of the above-mentioned one having an aliphatic ester bond or an aliphatic carbonate bond. Acid-based radical polymerizable monomer (C). The radical polymerization initiator (D) used in the present invention is used as The thermal radical polymerization initiator may be, for example, methyl ethyl ketone peroxide, methyl cyclohexanone peroxide, methyl ethyl hydrazine acetate peroxide, acetamidine acetone peroxide, 1, 1-double (Third butylperoxy) 3,3,5-trimethylcyclohexane, Φ 1,1-bis(Third hexylperoxy)cyclohexane, 1,1-double (Third hexyl Oxy)3,3,5-trimethylcyclohexane, 1,1-bis(t-butylperoxy)cyclohexane, 2,2-bis(4,4-di-t-butyl Peroxycyclohexyl)propane, 1,1-bis(t-butylperoxy)cyclododecane, n-butyl 4,4-bis(t-butylperoxy)pentyl ester, 2,2 - bis(t-butylperoxy)butane, 1,1-bis(t-butylperoxy)-2-methylcyclohexane, tert-butyl hydroperoxide, p-decane hydrogen Peroxide, 1,1,3,3-tetramethylbutyl hydroperoxide, third hexyl hydroperoxide, dicumyl peroxide, 2,5-dimethyl-2, 5-bis(tertiary tributylperoxy)hexane, α,α'-bis(t-butylperoxy)diisopropylbenzene, tert-butyl cumyl peroxide, di- Tertiary butyl peroxidation , 2,5-dimethyl-2,5-bis(t-butylperoxy)hexyne-3, isobutyl hydrazine peroxide, 3,3,5-trimethylhexyl peroxide , octyl peroxide, laurel peroxide, lauric acid peroxide, meta-toluene peroxide, benzamidine peroxide, diisopropyl peroxydicarbonate, double (4-third Cyclohexyl)peroxydicarbonate, bis-3-methoxybutyl peroxydicarbonate, di-2-ethylhexyl peroxydicarbonate, di-second butyl peroxydicarbonate, -11- 201008960 bis(3-methyl-3-methoxybutyl)peroxydicarbonate, bis(4-t-butylcyclohexyl)peroxydicarbonate, α,α'·double (peroxygen) Neodecyl)diisopropylbenzene, peroxycumene neodecyl ester, 1,1,3,3-tetramethylbutyl peroxy neodecyl ester, 1-cyclohexyl-1-methyl Base peroxy neodecyl ester, third hexyl peroxy neodecyl ester, tert-butyl peroxy neodecyl ester, third hexyl peroxytrimethyl acetate, tert-butyl peroxy trimethyl Acetate, 2,5-dimethyl-2,5-bis(2-ethylhexylperoxy)hexane, 1,1,3,3-tetramethylbutylperoxy-2-ethyl Hexanoate, 1-cyclohexyl-1-methylethylperoxy-2-ethylhexanoate, third hexyl peroxy-2-ethylhexanoate, tert-butylperoxy- 2-ethylhexanoate, tert-butylperoxy isobutyl ester, tert-butylperoxymaleic acid, tert-butylperoxylaurate, tert-butylperoxy-3,5,5 -trimethylhexanoate, tert-butylperoxyisopropylmonocarbonate, tert-butylperoxy-2-ethylhexylmonocarbonate, 2,5-dimethyl-2,5-double (benzimidoxime)hexane, tert-butylperoxyacetate, third hexylperoxybenzyl ester, tert-butylperoxy-m-tolylbenzyl ester, third butoxyperoxide Benzyl methyl ester, bis(t-butylperoxy)isophthalate, tert-butylperoxyallyl monocarbonate, 3,3',4,4'-tetra (t-butyl Peroxycarbonyl) benzophenone and the like. The amount of the radical polymerization initiator (D) to be used is preferably 0.001% by mass or more and 2% by mass or less based on the total mass of the radical polymerizable component and the total mass of the radical polymerization initiator (D). In the epoxy resin composition of the present invention, in addition to the above components, it is preferred to further use a monomethacrylate compound (E) having an aliphatic cyclic structure, because the heat-resistant yellowing of the cured product can be further enhanced. Monocyclic methacrylate compound (E) having an aliphatic cyclic structure, specifically, -12-201008960 such as dicyclopentyl methacrylate, dicyclopentyloxyethyl methacrylate, 1, 2 -Epoxy-4-vinylcyclohexane, 3,4-epoxycyclohexylmethyl methacrylate, cyclohexyl methacrylate, 2-methylcyclohexyl methacrylate, isobornyl methacrylate Ester and the like. Among them, it is particularly preferably selected from the group consisting of dicyclopentyl methacrylate, 1,2-epoxy-4-vinylcyclohexane, 3,4-epoxycyclohexylmethyl methacrylate, cyclohexyl methacrylate And a compound of the group consisting of isobornyl methacrylate or the like is because the mechanical strength of the cured product is further enhanced. © The above-mentioned ratio of the monomethacrylate compound (E) containing an aliphatic cyclic structure, relative to the epoxy resin (A), methacrylic acid (B), containing an aliphatic ester bond or an aliphatic carbonate bond 100 parts by mass of the acid group-containing radical polymerizable monomer (C) and the monocyclic methacrylate compound (E) having an aliphatic cyclic structure, in a ratio of 20 to 70 parts by mass, from hardening The viewpoint of the strength of the material is particularly suitable for a ratio of 40 to 60 parts by mass. In the transparent epoxy resin composition of the present invention, in addition to the above-mentioned respective components, the light resistance and heat yellowing resistance of the cured product can be further improved by using the reactive ruthenium (F). The reactive hydrazine (F), for example, in a part of the polyoxyalkylene structure, contains an amine group, an epoxy group, an alicyclic epoxy group, a methanol-based hydroxyl group, a stanol-based hydroxyl group, a methacryl fluorenyl group, A reactive functional group of a group consisting of a polyether alcohol group, a hydrogenthio group, and a carboxyl group. More specifically, the following structural formula (2)

-13- 201008960 其中,上述通式(2)中,R1及R2表示爲各自獨立的 甲基或氫原子。又,上述通式(2)中,X、X’及X”表示 爲各自獨立的選自由下述結構式a~h所組成的群組之反應 性基、甲基或氫原子,X及y爲1以上之整數。X及y之總 計爲2~100之範圍。 —RNH2 a bIn the above formula (2), R1 and R2 are each independently a methyl group or a hydrogen atom. Further, in the above formula (2), X, X' and X" are each independently a reactive group selected from the group consisting of the following structural formulae a to h, a methyl group or a hydrogen atom, X and y. It is an integer of 1 or more. The total of X and y is in the range of 2 to 100. —RNH2 ab

-R-CH—CHj Ο-R-CH—CHj Ο

c —ROH d —RSH c -RCOOH fc —ROH d —RSH c -RCOOH f

OO

II —R-O-C—C=CH2 g ❹ CH3 -OH h X、X’及X”係上述反應基,上述結構式a~g中之R ’ 表示爲碳原子數1~4之伸烷基。 其中,含有環氧基、羧基和甲基丙烯醯基之聚矽氧烷, 因反應性優異,故特別適用。 上述反應性矽(F)之用量,相對於環氧樹脂(A)、 甲基丙烯酸(B)、含有具脂肪族酯鍵或脂肪族碳酸酯鍵的 -14- 201008960 酸基之自由基聚合性單體(C)、上述反應性矽(F)之總 計100質量份,宜爲5~30質量份之範圍,係因更提昇耐光 性、耐熱黃變性β 本發明的環氧樹脂組成物,更可適當地倂用硬化促進 劑。上述硬化促進劑係可使用各種的種類,例如磷系化合 物、第三級胺、咪唑、有機酸金屬鹽、路易士酸、胺配鹽 等。特別是使用爲光半導體封止材料用途時,因硬化性、 耐熱性、電氣特性、耐濕信賴性等優異,磷系化合物宜爲 ® 三苯基膦氫,第三級胺宜爲1,8-二氮雙環〔5.4.0〕-十一烯 (DBU)。 本發明的環氧樹脂組成物,亦可適當地倂用自由基聚 合性多官能單體,因可提高硬化物的耐熱性,而調整物性 平衡。其中,使用的自由基聚合性多官能單體,例如二季 戊四醇六丙烯酸酯、二季戊四醇五丙烯酸酯、二季戊四醇 四丙烯酸酯、二季戊四醇三丙烯酸酯、季戊四醇四丙烯酸 $ 酯、季戊四醇三丙烯酸酯、新戊二醇二丙烯酸酯、三羥甲 基丙烷三甲基丙烯酸酯、乙烯二胺四甲基丙烯酸酯、己烷 二丙烯酸醋、二季戊四醇五乙烯酯。此類自由基聚合性多 官能單體之用量,宜爲組成物中的1~10質量%之範圍。 本發明的環氧樹脂組成物,除上述各成分之外,宜配 合抗氧化劑,可預防加熱時的氧化劣化,而製得透明性優 異之硬化物。 上述所使用之抗氧化劑,例如2,6-二-第三丁基-對-甲 酚、丁基化羥苯甲醚、2,6-二-第三丁基-對-乙基苯酚、硬 -15- 201008960 脂醯-方-(3,5-二-第三丁基-4-羥苯基)丙酸酯、4-甲氧萘 酚等一苯酚類、氫醌、2,2’-亞甲基雙(4-甲基-6-第三丁基 苯酚)、2,2’-亞甲基雙(4-乙基-6-第三丁基苯酚)、4,4’-硫代雙(3-甲基-6_第三丁基苯酚)、4,4’-亞丁基雙(3-甲 基-6-第三丁基苯酚)、3,9-雙〔1,1-二甲基-2-{ yS-(3-第 三丁基-4-羥基-5-甲基苯基)丙醯基氧}乙基〕2,4,8,10-四 氧雜螺〔5,5〕十一烷等雙酚類、1,1,3-三(2-甲基-4-羥基 -5 -第三丁基苯基)丁烷、1,3,5-三甲基-2,4,6-三(3,5-二-© 第三丁基-4-羥苄基)苯、四-〔亞甲基- 3-(3’,5’-二-第三丁 基-4-羥苯基)丙酸酯〕甲烷、雙〔3,3’-雙- (4’-羥基- 3’-第 三丁基苯基)丁酸〕二醇酯、1,3,5-三(3’,5’-二-第三丁基 -4-羥苄基)-S-三畊-2,4,6-(1Η,3Η,5Η)三酮、生育酚等多 官能苯酚類爲代表之苯酚系抗氧化劑;對-苯醌、甲苯醌、 萘醌爲代表之醌系抗氧化劑;二月桂基-3,3’-硫代二丙酸 酯、二肉豆蔻基-3,3’-硫代二丙酸酯、二硬脂醯基-3,3’-硫 ^ 代二丙酸酯等硫系抗氧化劑;三苯基磷酸酯、二苯基異癸 參 基磷酸酯、苯基二異癸基磷酸酯、三(壬基苯基)磷酸酯、 二異癸基季戊四醇磷酸酯、三(2,4-二-第三丁基苯基)磷 酸酯、環新戊烷四基雙(十八基)磷酸酯、環新戊烷四基 雙(2,4-二-第三丁基苯基)磷酸酯、環新戊烷四基雙(2,4-二-第三丁基-4-甲基苯基)磷酸酯、雙〔2-第三丁基-6-甲基 -4- {2-(十八基氧羰基)乙基}苯基〕氫磷酸酯等磷酸酯 類、9,10-二氫-9-氧雜-10-磷菲-10-氧化物、10- (3,5-二-第 三丁基-4-羥苄基)-9,10-二氫-9-氧雜-10-磷菲-10-氧化物、 -16- 201008960 10-癸氧基-9,10-二氫-9-氧雜-10-磷菲-10-氧化物等氧雜磷 菲氧化物類爲代表之磷系抗氧化劑。上述抗氧化劑之用 量,相對於全硬化成分100質量份,宜爲0.005~1質量份之 範圍。 本發明的環氧樹脂組成物,藉由更進一步配合紫外線 吸收劑’可更提昇耐光性。可配合之紫外線吸收劑,例如 苯基水楊酸酯、對-第三丁基苯基水楊酸酯、對-辛基苯基 水楊酸酯等水楊酸類;2,4 -二羥二苯甲酮、2 -羥基-4 -甲氧 Φ 基二苯甲酮、2-羥基-4-辛氧基二苯甲酮、2-羥基-4-十二烷 基二苯甲酮、2,2-二羥基-4-甲氧基二苯甲酮、2,2’-二羥基 _4,4’-二甲氧基二苯甲酮、2-羥基-4-甲氧基-5-磺基二苯甲酮 等二苯甲酮類;2- (2’-羥基- 5’-甲基苯基)苯并三唑、2-(2’-羥基-5’-第三丁基苯基)苯并三嗖、2-(2’-羥基-3’,5’-二第三丁基苯基)苯并三唑、2· (2’-羥基- 3’-第三丁基-5’-甲基苯基)-5-氯苯并三唑、2- (2’-羥基-3’,5’-二第三丁基 苯基)-5-氯苯并三唑、2-(2’-羥基-3’,5’-二第三戊基苯基)II —ROC—C=CH 2 g ❹ CH 3 —OH h X, X′ and X′′ are the above-mentioned reactive groups, and R′ in the above structural formula a to g is represented by an alkylene group having 1 to 4 carbon atoms. The polyoxyalkylene containing an epoxy group, a carboxyl group and a methacryloyl group is particularly suitable because of its excellent reactivity. The amount of the above reactive hydrazine (F) is relative to the epoxy resin (A) and methacrylic acid ( B), a radical polymerizable monomer (C) containing an aliphatic ester bond or an aliphatic carbonate bond, and a total of 100 parts by mass of the above reactive hydrazine (F), preferably 5~ In the range of 30 parts by mass, the light-resistant property and the heat-resistant yellowing resistance are further improved. The epoxy resin composition of the present invention can be suitably used as a curing accelerator. The above-mentioned curing accelerator can be used in various types, for example, a phosphorus system. a compound, a tertiary amine, an imidazole, an organic acid metal salt, a Lewis acid, an amine complex salt, etc., particularly when used as a photo-semiconductor sealing material, due to hardenability, heat resistance, electrical properties, moisture resistance, etc. Excellent, the phosphorus compound should be ® triphenylphosphine hydrogen, and the third amine should be 1,8-two Bicyclo [5.4.0]-undecene (DBU). The epoxy resin composition of the present invention may be suitably used as a radical polymerizable polyfunctional monomer, and the physical properties of the cured product may be improved by adjusting the heat resistance of the cured product. Balanced, wherein a radically polymerizable polyfunctional monomer is used, such as dipentaerythritol hexaacrylate, dipentaerythritol pentaacrylate, dipentaerythritol tetraacrylate, dipentaerythritol triacrylate, pentaerythritol tetraacrylate, pentaerythritol triacrylate , neopentyl glycol diacrylate, trimethylolpropane trimethacrylate, ethylene diamine tetramethacrylate, hexane diacrylate vinegar, dipentaerythritol pentavinyl ester. Such free radical polymerizable multifunctional single The amount of the body is preferably in the range of from 1 to 10% by mass in the composition. The epoxy resin composition of the present invention, in addition to the above components, is preferably formulated with an antioxidant to prevent oxidative degradation upon heating. A cured product excellent in transparency. The antioxidants used above, such as 2,6-di-t-butyl-p-cresol, butylated hydroxyanisole, 2,6-di-t-butyl- Correct -ethylphenol, hard -15- 201008960 a phenol, hydroquinone such as bismuth-s-(3,5-di-t-butyl-4-hydroxyphenyl)propionate or 4-methoxynaphthol , 2,2'-methylenebis(4-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-ethyl-6-tert-butylphenol), 4 , 4'-thiobis(3-methyl-6_t-butylphenol), 4,4'-butylene bis(3-methyl-6-tert-butylphenol), 3,9-double [1,1-Dimethyl-2-{ yS-(3-tert-butyl-4-hydroxy-5-methylphenyl)propanyloxy}ethyl]2,4,8,10-tetra Bisphenols such as oxaspiro[5,5]undecane, 1,1,3-tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane, 1,3,5 -trimethyl-2,4,6-tris(3,5-di-© tert-butyl-4-hydroxybenzyl)benzene, tetra-[methylene-3-(3',5'-di -T-butyl-4-hydroxyphenyl)propionate]methane, bis[3,3'-bis-(4'-hydroxy-3'-tert-butylphenyl)butyrate], 1,3,5-tris(3',5'-di-t-butyl-4-hydroxybenzyl)-S-three-plow-2,4,6-(1Η,3Η,5Η)trione, fertility a phenolic antioxidant represented by a polyfunctional phenol such as phenol; p-benzoquinone, A Anthraquinone and naphthoquinone represented by lanthanide; dilauryl-3,3'-thiodipropionate, dimyristyl-3,3'-thiodipropionate, distearyl sulfonate a sulfur-based antioxidant such as -3,3'-thio-dipropionate; triphenyl phosphate, diphenylisodecyl phosphoric acid ester, phenyl diisodecyl phosphate, tris(nonylphenyl) Phosphate ester, diisodecyl pentaerythritol phosphate, tris(2,4-di-t-butylphenyl) phosphate, cyclopentane tetrakis(bis-octadecyl) phosphate, cyclopentane tetrayl Bis(2,4-di-t-butylphenyl)phosphate, cyclopentanetetrakis(2,4-di-t-butyl-4-methylphenyl)phosphate, bis[2 - Phosphate esters such as tert-butyl-6-methyl-4-{2-(octadecyloxycarbonyl)ethyl}phenyl]hydrogen phosphate, 9,10-dihydro-9-oxa-10 - phosphophenanthrene-10-oxide, 10-(3,5-di-t-butyl-4-hydroxybenzyl)-9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxidation A phosphorus-based antioxidant represented by an oxaphosphorus oxide such as -10-201008960 10-decyloxy-9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide. The amount of the antioxidant to be used is preferably in the range of 0.005 to 1 part by mass based on 100 parts by mass of the total hardening component. The epoxy resin composition of the present invention can further improve light resistance by further blending the ultraviolet absorber. UV absorbers which can be combined, such as phenyl salicylate, p-t-butylphenyl salicylate, p-octylphenyl salicylate, etc.; 2,4-dihydroxy Benzene, 2-hydroxy-4-methoxypyrbenzophenone, 2-hydroxy-4-octyloxybenzophenone, 2-hydroxy-4-dodecylbenzophenone, 2, 2-dihydroxy-4-methoxybenzophenone, 2,2'-dihydroxy-4,4'-dimethoxybenzophenone, 2-hydroxy-4-methoxy-5-sulfonate Benzophenones such as benzophenone; 2-(2'-hydroxy-5'-methylphenyl)benzotriazole, 2-(2'-hydroxy-5'-tert-butylphenyl Benzotriazine, 2-(2'-hydroxy-3',5'-di-t-butylphenyl)benzotriazole, 2·(2'-hydroxy-3'-tert-butyl-5 '-Methylphenyl)-5-chlorobenzotriazole, 2-(2'-hydroxy-3',5'-di-t-butylphenyl)-5-chlorobenzotriazole, 2-( 2'-hydroxy-3',5'-di-p-pentylphenyl)

W 苯并三唑、2- { ( 2 ’ -羥基-3 ’、3”、4”、5”、6” -四氫酞醯亞 胺甲基甲基苯基}苯并三唑等苯并三唑類;雙(2,2,6,6-四甲基-4-哌啶基)癸二酸酯、雙(1,2,2,6,6-五甲基-4-哌啶 基)癸二酸酯、雙(1,2,2,6,6-五甲基-4-哌啶基)[{3,5-雙 (1,1-二甲基乙基)-4-茚滿氧苯基}甲基]丁基丙二醯酯等 受阻胺類。此類紫外線吸收劑之配合量,相對於全硬化成 分100質量份,宜爲0.1〜10質量份。 本發明的環氧樹脂組成物中,除上述各成分之外,可 -17- 201008960 因應目的而適當地添加著色劑、偶合劑、塗平齊 潤滑劑等。 著色劑係無特別之限制,例如酞花青、偶裊 喹吖酮、蒽醌、黃蒽酮、周酮、周烯、二噚畊、 甲亞胺系之各種有機系色素、氧化鈦、硫酸鉛 黃、鉻朱砂、氧化鐵紅、鈷紫、普魯士藍、群 鉻綠、氧化鉻、鈷綠等無機顔料。 使用爲塗平劑者,例如由乙基丙烯酸酯、 ❷ 酯、2 -乙基己基丙烯酸酯等丙烯酸酯類形β 4000〜12000之低聚物類、環氧化大豆脂肪酸、 醇、加氫蓖麻子油、酞系偶合劑等。潤滑劑例 晶蠟、聚乙烯蠟等烴系潤滑劑、十二烷酸、十 六烷酸、十八烷酸、二十烷酸、二十二烷酸等 系潤滑劑、十八醯胺、十六醯胺、二十醯胺、 脂醯胺、乙烯二硬脂醯胺等高級脂肪酸醯胺系 I 化蓖麻子油、丁基硬脂酸酯、乙二醇單硬脂酸 馨 醇(單,二,三或四)硬脂酸酯等高級脂肪酸酯系 醇、十八醇、聚乙二醇、聚丙三醇等醇系潤滑齊 十四酸、十六酸、十八酸、二十酸、二十二酸 環烷酸等的鎂、鈣、鎘、鋇、鋅、鉛等的金屬 類、巴西棕櫚蠟、小燭樹蠟、蜂蠟、褐煤蠟等 偶合劑例如3 -環氧丙氧丙基三甲氧基矽院 氧丙基甲基二甲氧基矽烷、3-環氧丙氧丙基甲 矽烷、2- (3,4-環氧環己基)乙基三甲氧基矽娱 ΰ、離型劑、 无、二重氮、 縮合偶氮、 、鉻黃、鋅 青、碳黑、 丁基丙烯酸 交之分子量 環氧化松香 如石蠟、微 四烷酸、十 高級脂肪酸 亞甲基二硬 潤滑劑、硬 酯、季戊四 滑劑、十六 |、十二酸、 、蔑麻酸、 鹽之金靥皂 天然蠟類。 :、3-環氧丙 基二甲氧基 ί、Ν- ( 2-胺 -18- 201008960 乙基)3-胺基丙基甲基三甲氧基矽烷、3-胺基丙基三乙氧 基矽烷、3-氫硫基丙基三甲氧基矽烷、乙烯三甲氧基矽烷、 N-(2-(乙烯苄基胺)乙基)3-胺基丙基三甲氧基矽烷鹽 酸鹽、3-甲基丙烯醯氧丙基三甲氧基矽烷、3_氯丙基甲基 二甲氧基矽烷、3-氯丙基三甲氧基矽烷等矽烷系偶合劑、 異丙基(N-乙基胺乙基胺)鈦酸酯、異丙基三異硬脂醯鈦 酸酯、鈦二(二辛基焦磷酸酯)氧乙酸酯、四異丙基二(二 辛基亞磷酸酯)鈦酸酯、新烷氧基三(對-N-(沒-胺乙基) © 胺苯基)鈦酸酯等鈦系偶合劑、鉻-乙醯乙醯酯、銷-甲基 丙烯酸酯、銷-丙酸酯、新烷氧鉻酸酯、新烷氧三新癸醯基 锆酸酯、新烷氧三(十二醯基)苯磺醯锆酸酯、新烷氧三 (伸乙二胺乙基)鉻酸酯、新烷氧三(間-胺苯基)锆酸酯、 銨锆碳酸酯、鋁-乙醯乙醯酯、鋁-甲基丙烯酸酯、鋁-丙酸 酯等锆或鋁系偶合劑,惟宜爲矽系偶合劑。藉由使用偶合 劑,可製得耐濕信賴性優異且吸濕後的黏合強度降低少之 硬化物。 離型劑例如石蠟、微晶蠟、聚乙烯蠟等烴系滑劑、十 二烷酸、十四烷酸、十六烷酸、十八烷酸、二十烷酸、二 十二烷酸等髙級脂肪酸系潤滑劑、十八醯胺、十六醯胺、 二十醯胺、亞甲基二硬脂醯胺、乙烯二硬脂醯胺等高級脂 肪酸醯胺系潤滑劑、硬化蓖麻子油、丁基硬脂酸酯、乙二 醇單硬脂酸酯、季戊四醇(單,二,三或四)硬脂酸酯等高級 脂肪酸酯系潤滑劑、十六醇、十八醇、聚乙二醇、聚丙三 醇等醇系潤滑劑、十二酸、十四酸、十六酸、十八酸、二 -19- 201008960 十酸、二十二酸、蓖麻酸、環烷酸等的 鋅、鉛等的金屬鹽之金屬皂類、巴西棕 蜂蠟、褐煤蠟等天然蠟類,其中宜爲高 級脂肪酸醯胺類。高級脂肪酸、金屬皂 十八烷酸鋅、十八烷酸鎂、十八烷酸、 三或四)硬脂酸酯。 本發明之環氧樹脂組成物,係藉由 地攪拌,可製得液狀之光半導體封止材 # 本發明的環氧樹脂組成物之硬化反 不特別將環氧基與酸基之反應以及自由 反應區別爲反應步驟,而是同時乃至連 亦即藉由原位反應而進行硬化。具體; 50〜200°C之溫度範圍,尤宜於50~100°C 皺褶狀之硬化物後,更於120~180°C之滔 以上詳述之本發明的組成物,係如 ^ 和耐黃變性特別是耐熱黃變性優異,且 異,適用爲LED、光電晶體管、光電二g CCD、EPROM、光電感應器等各樣光半 材料,特別適用爲發光時發熱顯著的高 止材料。高亮度LED元件係指具有100 以上的光束者。 上述高亮度LED,例如在波長35(l· 波峰之藍色乃至白色之LED、以及使用 四元素所形成之化合物半導體,藉由調 鎂、鈣、鎘、鋇、 櫚蠟、小燭樹蠟、 級脂肪酸酯類、高 、烴系滑劑,尤宜 季戊四醇(單,二, 將上述各成分均勻 〇 應,係如上述般, 基聚合性基之聚合 續地進行兩反應, 匕硬化溫度,宜爲 進行硬化而形成無 .度條件進行處理。 上述般,因透明性 硬化前之流動性優 ί管、光電耦合器、 導體裝置用之封止 亮度LED元件用封 巟明(lumen) ( lm) •550nm具有主發光 由鋁、鎵、銦、磷 整元素組成,可發 -20- 201008960 出紅色、橙色、黃色、黃綠色之四元系LED。 上述在波長3 50~550nm具有主發光波峰之藍色乃至白 色之LED之用途,例如使用於攜帶型DVD放映機或衛星導 航等的液晶面板用背光光源、使用於筆記型電腦等的10~17 吋液晶面板用背光光源、汽車頭燈之光源等。 另一方面,四元系LED之用途,例如室外顯示器、汽 車的後照燈或車內照明、薄型電視或電腦的液晶顯示器之 背光等。 ❺ 本發明的光半導體裝置,係可藉由以上述環氧樹脂組 成物來封止光半導體及接合於此光半導體之電極零件而製 得。具體而言,例如藉由以本發明的環氧樹脂組成物遞模 成形、澆鑄等模塑方法,將已充分脫泡之上述環氧樹脂組 成物封止、硬化於附導線等電極零件的光半導體之方法, 或預先將光半導體實裝於電路基板,再以本發明的環氧樹 脂組成物封止並硬化之方法等。具體而言,流入已設置光 0 半導體元件之型箱後,以上述溫度條件進行加熱硬化而製 得。 本發明的光半導體裝置,係列舉爲上述環氧樹脂組成 物之用途之各種光半導體裝置,具體而言,例如將LED、 光電晶體管、光電二極管、光電耦合器、CCD、EPROM、 光電感應器等受光元件或發光元件等封止之光半導體裝 置。其中,宜爲LED裝置,特別是高亮度LED裝置,尤宜 在波長3 50~5 5 0nm具有主發光波峰之藍色乃至白色之LED 裝置及四元系LED裝置。 -21- 201008960 實施例 其次,以實施例、比較例更具體地說明本發明 述中的「份」及「%」係重量基準。又,各物性評 下述條件而測定。 1) 清漆黏度:於25°C,使用E型黏度計(東機產$ 製)「TV-20型」玉米板型來測定。 2) 光線透過率:使用分光光度計「UV-3150」(島 所(股)製)來測定。 0 3 )耐熱劣化性:於150°C,測定加熱72小時後之環 的硬化物在400nm波長之光線透過率。 4) 耐紫外線性:使用退色計(SUGA試驗機(股) 測定以照射強度490W/m2、黑面板溫度63°C而照 小時的紫外線後之硬化物在400nm波長之光線透過 5) 彎曲強度、彎曲彈性率:依據JIS6911。 6 )儲存安定性:將清漆保存於25 °C 2週後,測定其 實施例1〜8、比較例3及4 〇 依據下述表1或表2所示之配合,使用攪拌機 樹脂和各種羧酸、聚合性化合物、自由基聚合引發 化促進劑等混合,而製得環氧樹脂組成物。使用此 脂組成物,評價清漆黏度、儲存安定性。 又,將此環氧樹脂組成物注入以玻璃板夾著厚 的間隔器(矽膠管)而成之塑型的間隙,於80°C使 2小時,從塑型中取出硬化物,確認形成無皺摺狀 升溫至16(TC,到達160°C後維持於此溫度2小時, 硬化物,使用此硬化物爲試驗片來進行各種評價試 ,惟下 價係於 !(股) 津製作 氧樹脂 製), U 1000 率〇 黏度。 將環氧 劑、硬 環氧樹 度 3 mm 其硬化 後,更 而製得 驗。結 -22- 201008960 果如表1及表2所示。 比較例1及2 依據下述表2所示之配合,摻合各成分,使用攪拌機 進行混合而製得環氧樹脂組成物。使用此環氧樹脂組成 物,評價清漆黏度、儲存安定性。 又,將此環氧樹脂組成物注入實施例1所使用之塑型 的間隙,於11 0 °C使其硬化2小時,從塑型中取出硬化物, 更升溫至165 °C,到達165 °C後維持於此溫度2小時,而製 〇 得硬化物,使用此硬化物爲試驗片來進行各種評價試驗。 結果如表2所示。 表1 實施例 1 2 3 4 5 6 7 8 配 合 組 成 脂職環氧樹脂 25 27 22 纖雙酚A型環纖脂 32 35 16 16 28 加氫雙酚A型環罐脂 16 16 甲基丙烯酸 8 12 7 10 8 7 9 8 HO-MS 16 15 20 13 12 HO-HH 27 24 24 二環戊基甲基丙烯酸酷 40 45 37 40 40 37 36 32 酿性砍 20 20 本甲基六氫苯二甲酸肝 過氧化物 1 1 1 1 1 1 1 1 硬化織劑 1 1 1 1 1 1 1 1 清雜度(mPaS) 52 24 100 56 63 109 21 31 硬化條件 80〇C/2h+160°C/2h 評 價 結 果 光線透過率(400膽) 83.6 83.1 79.7 81.3 82 81.2 80.2 83.5 耐熱劣化性耐熱後(150 〇C72h) 74.1 72.4 70.4 72.8 70.3 70.2 72.8 75.7 外線性1000h 81.8 81.9 77.5 78.3 78.9 79.3 79.2 83.5 彎曲強度(MPa) 125 130 144 147 140 140 119 108 彈性率(MPa) 3700 3700 3500 3300 3300 3500 2500 2690 儲安(25°C) 2週後 〇 〇 〇 〇 〇 〇 〇 〇 -23- 201008960 表2 比較例 1 2 3 4 配 合 組 成 44 30 30 酚A型環麵脂 53 加氫雙酚A型環麵脂 甲基丙嫌酸 20 HO-MS HO-HH 40 二環戊基甲基丙烯酸酯 50 30 反應性矽 4*甲基六氫苯二甲酸酐 56 47 過氧化物 1 1 硬化麵劑 0.4 0.5 1 1 清獅度(mPaS) 120 736 20 56 硬' 條件 not/3h+165t:/2i S0°C/7h+mX:/7h 評 價 結 果 光麟過率(400nra) 82.6 83 85 66.4 耐熱劣化性耐麵150。。73〇 60.2 42.2 62.7 20 耐紫外線性l〇〇〇h 81.5 73.5 82 55.3 彎曲強度(MPa) 70 139 80 120 彈性率(MPa) 3400 3000 2800 3200 儲安(25。〇 2週後 X X 〇 〇 上述表1及表2中,「儲存安定性」係調製成瓌氧胃 脂組成物後,2週後之黏度爲200mPa · s以下者記爲^ 〇」’ ❹ 超過200mPa· s者記爲「X」^ 又,上述表1及表2中所示之各成分,係如下所示。 脂環族環氧樹脂:(3,4-環氧環己烷)甲基_3’,4’-環氧 環己基-羧酸酯(商品名「西羅基塞特202 1 P」,戴西爾化 學工業(股)製) 雙酚A型環氧樹脂:環氧當量188g/eq.之雙酚A型 環氧樹脂(商品名「EPICLON 850S」,DIC (股)製) 加氫雙酚A型環氧樹脂:加氫雙酚A型環氧樹脂(商 -24- 201008960 品名「EPICLON EXA-7015」環氧當量 200g/eq,DIC (股) 製) HO-MS: 3-[[2-(甲基丙烯醯氧)乙氧]羰基]丙酸(商 品名「萊特酯HO-MS」,共榮社化學(股)製) HO-HH: 2 -甲基丙烯醯氧乙基六氫苯二甲酸(商品名 「萊特酯HO-HH」,共榮社化學(股)製) 二環戊基甲基丙烯酸酯:商品名「仿克力FA-513M」 曰立化成工業(股)製 〇 反應性矽:含甲基丙烯基之矽油(信越化學製’商品 名「X-22- 1 64A」) 過氧化物:1,1-二(第二己基過氧基)環己院(商品名 「帕黑克斯HC」日油(股)製) 硬化促進劑:甲基三丁基鳞二甲基磷酸酯(商品名「皮 喜可林PX-4MP」日本化學工業(股)製) 比較例5 將27質量份的上述脂環族環氧樹脂[(3,4_環氧環己 參 烷)甲基-3,,4’-環氧環己基·羧酸酯(戴西爾化學工業(股) 製「西羅基塞特2021P」)]、0.027質量份的氫醌放入反應 容器,升溫至7(TC使氫醒溶解後’放入1丨·8質量份的甲基 丙烯酸、16質量份的3-[[2-(甲基丙烯醯氧)乙氧]羰基] 丙酸(共榮社化學(股)製「萊特酯H0-MS」)、相對於 固形分lOOOppm的三苯基膦,更添加22.7質量份的二環戊 基甲基丙烯酸酯(日立化成工業(股)製「仿克力FA_513M」) 作爲溶劑,調整不揮發分爲70質量%。其次’升溫至80 -25- 201008960 °C,維持於90°C 7.5小時。此間,於反應系內,間歇地添 加相對於固形分質量成爲lOOOppm量之三苯基膦。反應結 束後,添加22.6質量份的二環戊基甲基丙烯酸酯,而製得 清漆。 製得的清漆之清漆黏度爲890mPa · s。 其次,於製得的清漆中,添加1,1-二(第三己基過氧 基)環己烷(日油(股)製「帕黑克斯HC」)及甲基三丁 基鱗二甲基磷酸酯(日本化學工業(股)製「皮喜可林 ® PX-4MP」)各1PHR,作爲硬化觸媒。之後,注入實施例1 中使用的塑型之間隙,於100°C使其硬化1小時,從塑型中 取出硬化物,更升溫至17 0°C,並維持於此溫度1小時而製 得硬化物。將製得的硬化物著色爲茶色,光線透過率 (400nm )爲 52.2%。 【圖式簡單說明】 無。 【主要元件符號說明】 φ 零無。 -26-W benzotriazole, 2-{( 2 '-hydroxy-3 ', 3", 4", 5", 6"-tetrahydrofurfurimide methylmethylphenyl} benzotriazole and other benzo Triazoles; bis(2,2,6,6-tetramethyl-4-piperidyl)sebacate, bis(1,2,2,6,6-pentamethyl-4-piperidinyl Azelaic acid ester, bis(1,2,2,6,6-pentamethyl-4-piperidinyl)[{3,5-bis(1,1-dimethylethyl)-4-oxime A hindered amine such as a oxyphenyl}methyl]butyl propylene dicarboxylate. The amount of such an ultraviolet absorber is preferably 0.1 to 10 parts by mass based on 100 parts by mass of the total hardening component. In the resin composition, in addition to the above-mentioned respective components, a coloring agent, a coupling agent, a flat lubricant, or the like may be appropriately added depending on the purpose. The coloring agent is not particularly limited, for example, phthalocyanine or袅quinacridone, anthraquinone, xanthone, ketone, perene, diterpene, methine, various organic pigments, titanium oxide, lead sulfate yellow, chrome vermilion, iron oxide red, cobalt violet, Prussian Inorganic pigments such as blue, group chrome green, chrome oxide, cobalt green, etc. Used as a leveling agent, for example, ethyl propyl An acrylate type β 4000 to 12000 oligomer such as an acid ester, an oxime ester or a 2-ethylhexyl acrylate, an epoxidized soybean fatty acid, an alcohol, a hydrogenated castor oil, an oxime coupling agent, etc. Hydrocarbon-based lubricants such as crystalline wax and polyethylene wax, lubricating lubricants such as dodecanoic acid, palmitic acid, octadecanoic acid, eicosanoic acid, behenic acid, octadecylamine, and hexadecane Higher fatty acids such as amine, decylamine, decylamine, ethylene distearamide, amide amine I ramie oil, butyl stearate, ethylene glycol monostearate (single, two, Three or four) higher fatty acid esters such as stearate, alcohols such as stearyl alcohol, polyethylene glycol, and polyglycerol are lubricated with tetradecanoic acid, palmitic acid, octadecanoic acid, icosonic acid, and a metal such as magnesium, calcium, cadmium, strontium, zinc or lead such as dodecanoic acid, a coupling agent such as carnauba wax, candelilla wax, beeswax or montan wax, such as 3-glycidoxypropyltrimethyl Oxalyl oxypropylmethyldimethoxydecane, 3-glycidoxypropylmethyl decane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxy phthalocyanine Agent, non-diazo, condensed azo, chrome yellow, zinc cyanide, carbon black, butyl acrylate, molecular weight epoxidized rosin such as paraffin, micro-tetradecanoic acid, ten higher fatty acid methylene di-hard lubricant, Hard ester, pentaerythritol, hexadecane, dodecanoic acid, ricinoleic acid, salt, natural soap, etc. :, 3-epoxypropyldimethoxy, Ν- ( 2- Amine-18- 201008960 ethyl) 3-aminopropylmethyltrimethoxydecane, 3-aminopropyltriethoxydecane, 3-hydrothiopropyltrimethoxydecane, ethylene trimethoxydecane , N-(2-(vinylbenzylamine)ethyl)3-aminopropyltrimethoxydecane hydrochloride, 3-methylpropenyloxypropyltrimethoxydecane, 3-chloropropylmethyl a decane coupling agent such as dimethoxy decane or 3-chloropropyltrimethoxy decane, isopropyl (N-ethylamine ethylamine) titanate, isopropyl triisostearyl strontium titanate, Titanium di(dioctyl pyrophosphate) oxyacetate, tetraisopropylbis(dioctylphosphite) titanate, neoalkoxy tris(p-N-(no-amineethyl) © Titanium couples such as amine phenyl) titanate Mixture, chrome-acetamidine, pin-methacrylate, pin-propionate, neoalkoxy chromate, neoalkoxytrimethylsulfonate, neoalkoxy III Benzosulfonium zirconate, neoalkoxytris(ethylenediamineethyl)chromate, neoalkoxytris(m-aminophenyl)zirconate, ammonium zirconium carbonate, aluminum-acetonitrile A zirconium or aluminum coupling agent such as an oxime ester, an aluminum-methacrylate or an aluminum-propionate, which is preferably a lanthanide coupling agent. By using a coupling agent, it is possible to obtain a cured product which is excellent in moisture resistance and has little reduction in adhesion strength after moisture absorption. Release agents such as paraffin wax, microcrystalline wax, polyethylene wax and other hydrocarbon-based lubricants, dodecanoic acid, myristic acid, palmitic acid, octadecanoic acid, eicosanoic acid, behenic acid, etc. Terpene fatty acid-based lubricant, octadecylamine, hexadecaneamine, decylamine, methylene distearylamine, ethylene distearylamine, and other higher fatty acid amide-based lubricants, hardened castor oil Higher fatty acid ester lubricants such as butyl stearate, ethylene glycol monostearate, pentaerythritol (mono, di, tri or tetra) stearate, cetyl alcohol, stearyl alcohol, polyethyl b Alcohol-based lubricants such as diols and polyglycerols, dodecanoic acid, tetradecanoic acid, palmitic acid, octadecanoic acid, di-19-201008960, octanoic acid, behenic acid, ricinoleic acid, naphthenic acid, etc. A natural wax such as a metal soap of a metal salt such as zinc or lead, a Brazilian brown beeswax or a montan wax, and preferably a higher fatty acid amide. Higher fatty acid, metal soap zinc octadecanoate, magnesium octadecanoate, octadecanoic acid, tri or tetra) stearate. The epoxy resin composition of the present invention can be obtained by stirring, and a liquid photo-semiconductor sealing material can be obtained. The curing of the epoxy resin composition of the present invention does not specifically react the epoxy group with the acid group. The free reaction is distinguished by the reaction step, but is hardened at the same time or even by in situ reaction. Specifically; a temperature range of 50 to 200 ° C, particularly preferably 50 to 100 ° C after the wrinkle-like cured product, more than 120 to 180 ° C, the composition of the present invention detailed above, such as ^ and It is excellent in yellowing resistance, especially heat-resistant yellowing, and is suitable for various light and semi-materials such as LED, phototransistor, photoelectric two-g CCD, EPROM, and photoelectric sensor. It is especially suitable for high-temperature materials with remarkable heat generation during illuminating. High-brightness LED elements refer to those having a beam of more than 100. The above high-brightness LED, for example, at a wavelength of 35 (a blue or even white LED of a crest, and a compound semiconductor formed using four elements, by adjusting magnesium, calcium, cadmium, strontium, palm wax, candelilla wax, Grade fatty acid esters, high, hydrocarbon-based slip agents, especially pentaerythritol (single and second, the above components are uniformly conjugated, as described above, the polymerization of the base polymerizable group continues to carry out two reactions, the hydrazine hardening temperature is preferably For the purpose of curing, it is treated under the conditions of the degree of curing. In the above, the fluidity before curing, the photocoupler, the sealing device for the brightness of the LED device for the conductor device is sealed (lm) • 550nm has a main luminescence consisting of aluminum, gallium, indium, and phosphorous elements, and can emit -20- 201008960. Red, orange, yellow, and yellow-green quaternary LEDs. The above has a main illuminating peak at a wavelength of 3 50 to 550 nm. For blue or even white LEDs, for example, backlights for liquid crystal panels such as portable DVD projectors or satellite navigation, backlights for 10 to 17 inch LCD panels used in notebook computers, and automotive headlights. The light source, etc. On the other hand, the use of the quaternary LED, such as an outdoor display, a backlight of a car or an interior illumination, a backlight of a thin television or a liquid crystal display of a computer, etc. 光 The optical semiconductor device of the present invention is The photo-semiconductor and the electrode component bonded to the photo-semiconductor are sealed by the epoxy resin composition. Specifically, for example, by molding, casting, and the like using the epoxy resin composition of the present invention. In the plastic method, a method of sealing or hardening the above-mentioned epoxy resin composition which has been sufficiently defoamed to an optical semiconductor to which an electrode component such as a wire is attached, or mounting an optical semiconductor on a circuit substrate in advance, and using the epoxy resin of the present invention A method of sealing and hardening a composition, etc. Specifically, it is obtained by flowing into a mold in which a light-emitting semiconductor element is provided, and then heat-hardening under the above-described temperature conditions. The optical semiconductor device of the present invention is a series of the above-mentioned epoxy. Various optical semiconductor devices for the use of the resin composition include, for example, LEDs, phototransistors, photodiodes, photocouplers, CCDs, EPROMs, An optical semiconductor device sealed by a light-receiving element such as an electric sensor or a light-emitting element, etc., preferably an LED device, particularly a high-brightness LED device, particularly having a blue or even white color of a main illuminating peak at a wavelength of 3 50 to 550 nm. - - - - - - - - - - 1) varnish viscosity: measured at 25 ° C using an E-type viscometer (Euro machine production system) "TV-20" corn plate type. 2) Light transmittance: using a spectrophotometer " UV-3150" (made by the island company). 0 3) Thermal deterioration resistance: The light transmittance of the cured product of the ring after heating for 72 hours at a wavelength of 400 nm was measured at 150 °C. 4) UV resistance: using a color fader (SUGA tester) to measure the light intensity of 490 W/m2, the black panel temperature of 63 °C and the ultraviolet light after the ultraviolet light is transmitted at a wavelength of 400 nm. 5) Bending strength, Flexural modulus: according to JIS6911. 6) Storage stability: After varnish was stored at 25 ° C for 2 weeks, the examples 1 to 8 and Comparative Examples 3 and 4 were measured. According to the combination shown in Table 1 or Table 2 below, a blender resin and various carboxylic acids were used. An acid, a polymerizable compound, a radical polymerization initiation accelerator, and the like are mixed to obtain an epoxy resin composition. Using this fat composition, the varnish viscosity and storage stability were evaluated. Further, this epoxy resin composition was poured into a gap formed by sandwiching a thick spacer (tank tube) on a glass plate, and the mixture was allowed to stand at 80 ° C for 2 hours, and the cured product was taken out from the molding to confirm the formation of no The wrinkle is heated to 16 (TC, and after maintaining the temperature at 160 ° C for 2 hours, the cured product is used as a test piece for various evaluation tests, but the price is based on! System), U 1000 rate 〇 viscosity. After the epoxy resin and the hard epoxy resin are hardened by 3 mm, they are further produced.结-22- 201008960 The results are shown in Tables 1 and 2. Comparative Examples 1 and 2 According to the blending shown in Table 2 below, the components were blended and mixed using a stirrer to obtain an epoxy resin composition. Using this epoxy resin composition, the varnish viscosity and storage stability were evaluated. Further, this epoxy resin composition was poured into the gap of the molding used in Example 1, and it was hardened at 110 ° C for 2 hours, and the cured product was taken out from the molding, and further heated to 165 ° C to reach 165 °. After C was maintained at this temperature for 2 hours, a hardened material was obtained, and the cured product was used as a test piece to carry out various evaluation tests. The results are shown in Table 2. Table 1 Example 1 2 3 4 5 6 7 8 compounded epoxy resin 25 27 22 fiber bisphenol A type ring resin 32 35 16 16 28 hydrogenated bisphenol A type ring grease 16 16 methacrylic acid 8 12 7 10 8 7 9 8 HO-MS 16 15 20 13 12 HO-HH 27 24 24 Dicyclopentyl methacrylate Cool 40 45 37 40 40 37 36 32 Brewing cut 20 20 methyl hexahydrophthalic acid Liver peroxide 1 1 1 1 1 1 1 1 Hardening agent 1 1 1 1 1 1 1 1 Cleanliness (mPaS) 52 24 100 56 63 109 21 31 Hardening conditions 80〇C/2h+160°C/2h Evaluation result Light transmittance (400 biliary) 83.6 83.1 79.7 81.3 82 81.2 80.2 83.5 Resistance to heat deterioration (150 〇C72h) 74.1 72.4 70.4 72.8 70.3 70.2 72.8 75.7 External linear 1000h 81.8 81.9 77.5 78.3 78.9 79.3 79.2 83.5 Flexural strength (MPa) 125 130 144 147 140 140 119 108 Elasticity (MPa) 3700 3700 3500 3300 3300 3500 2500 2690 Storage safety (25 ° C) 2 weeks later 〇〇〇〇〇〇〇〇-23- 201008960 Table 2 Comparative Example 1 2 3 4 compounding composition 44 30 30 phenolic type A toroidal grease 53 hydrogenated bisphenol A type Face fat methyl propylene acid 20 HO-MS HO-HH 40 Dicyclopentyl methacrylate 50 30 Reactive 矽 4* methyl hexahydrophthalic anhydride 56 47 Peroxide 1 1 Hardening agent 0.4 0.5 1 1 Qingshi (mPaS) 120 736 20 56 Hard 'condition not/3h+165t:/2i S0°C/7h+mX:/7h Evaluation result Guanglin over rate (400nra) 82.6 83 85 66.4 Resistance to heat deterioration Face 150. . 73〇60.2 42.2 62.7 20 UV resistance l〇〇〇h 81.5 73.5 82 55.3 Flexural strength (MPa) 70 139 80 120 Elasticity (MPa) 3400 3000 2800 3200 Storage safety (25. 〇 2 weeks later XX 〇〇 above table In Tables 1 and 2, the "storage stability" is adjusted to a composition of 瓌 胃 胃 胃 胃 , , 2 2 2 2 2 2 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 200 ^ Further, the components shown in the above Tables 1 and 2 are as follows. Alicyclic epoxy resin: (3,4-epoxycyclohexane)methyl_3', 4'-epoxy Cyclohexyl-carboxylate (trade name "Sirokitet 202 1 P", manufactured by Daisy Chemical Industry Co., Ltd.) Bisphenol A type epoxy resin: bisphenol A type with epoxy equivalent weight 188 g/eq. Epoxy resin (trade name "EPICLON 850S", manufactured by DIC) Hydrogenated bisphenol A epoxy resin: Hydrogenated bisphenol A epoxy resin (Shang-24- 201008960 Product name "EPICLON EXA-7015" ring Oxygen equivalent: 200g/eq, DIC (manufactured by DIC) HO-MS: 3-[[2-(methacryloxy)ethoxy]carbonyl]propionic acid (trade name "Lite ester HO-MS", Kyoeisha Chemical (share) system) HO- HH: 2-Methyl propylene oxiranyl hexahydro phthalic acid (trade name "Lite ester HO-HH", manufactured by Kyoeisha Chemical Co., Ltd.) Dicyclopentyl methacrylate: trade name "Imitation FAFA-513M" 曰立化成工业(股) 〇Responsive 矽: methacrylate-containing eucalyptus oil (Shin-Etsu Chemical's trade name "X-22- 1 64A") Peroxide: 1,1-two (Second hexylperoxy) Cyclohexanin (trade name "Pahex HC", manufactured by Nippon Oil Co., Ltd.) Hardening accelerator: methyltributyl squamous dimethyl phosphate (trade name "Pi Xi Ke" Lin PX-4MP" manufactured by Nippon Chemical Industry Co., Ltd.) Comparative Example 5 27 parts by mass of the above alicyclic epoxy resin [(3,4-epoxycyclohexyl)methyl-3,, 4'- Epoxycyclohexyl carboxylate ("Sirokitet 2021P" manufactured by Daisy Chemical Industry Co., Ltd.)], 0.027 parts by mass of hydroquinone was placed in a reaction vessel, and the temperature was raised to 7 (TC dissolved hydrogen after dissolution) '1 丨·8 parts by mass of methacrylic acid and 16 parts by mass of 3-[[2-(methacryl oxime) ethoxy) carbonyl] propionic acid (Lyme ester manufactured by Kyoeisha Chemical Co., Ltd.) H0-MS"), relative to Further, in the case of triphenylphosphine of 100 ppm by weight, 22.7 parts by mass of dicyclopentyl methacrylate ("Flush FA_513M" manufactured by Hitachi Chemical Co., Ltd.) was added as a solvent, and the nonvolatile content was adjusted to 70% by mass. Secondly, 'heat up to 80 -25-201008960 °C, maintain at 90 °C for 7.5 hours. Here, in the reaction system, triphenylphosphine in an amount of 100 ppm relative to the solid content was intermittently added. After the reaction was completed, 22.6 parts by mass of dicyclopentyl methacrylate was added to obtain a varnish. The varnish viscosity of the obtained varnish was 890 mPa · s. Next, 1,1-di(Third-hexylperoxy)cyclohexane ("Haihes HC" manufactured by Nippon Oil Co., Ltd.) and methyltributyl dimethyl dimethyl hydride were added to the obtained varnish. Phosphate ("Pixicolin® PX-4MP" manufactured by Nippon Chemical Industry Co., Ltd.) each has 1 PHR as a curing catalyst. Thereafter, the gap of the molding used in Example 1 was injected, and it was cured at 100 ° C for 1 hour, and the cured product was taken out from the molding, heated to 170 ° C, and maintained at this temperature for 1 hour. Hardened material. The obtained cured product was colored in brown color, and the light transmittance (400 nm) was 52.2%. [Simple description of the diagram] None. [Description of main component symbols] φ Zero is not available. -26-

Claims (1)

201008960 七、申請專利範圍: 1. 一種環氧樹脂組成物,其特徵係以環氧樹脂(A)、甲基 丙烯酸(B)、含有脂肪族酯鍵或脂肪族碳酸酯鍵的含酸 基之自由基聚合性單體(C)及自由基聚合引發劑(D) 爲必要成分。 有脂 性單 2.如申請專利範圍第1項之環氧樹脂組成物,其中含 肪族酯鍵或脂肪族碳酸酯鍵的含酸基之自由基聚合 體(C ),係如通式(1 )所示201008960 VII. Patent application scope: 1. An epoxy resin composition characterized by epoxy resin (A), methacrylic acid (B), acid group containing aliphatic ester bond or aliphatic carbonate bond The radical polymerizable monomer (C) and the radical polymerization initiator (D) are essential components. The present invention relates to an epoxy resin composition according to claim 1, wherein the acid group-containing radical polymer (C) containing a fatty ester bond or an aliphatic carbonate bond is of the formula (1). ) shown (1) (式中,R1表示爲碳原子數2〜10的脂肪族烴基,X爲酯 鍵或碳酸酯鍵,R2表示爲碳原子數2〜10的脂肪族烴基, η爲1〜5之整數)。 3.如申請專利範圍第1項之環氧樹脂組成物,其中該環氧 樹脂(Α)係具有環狀脂肪族結構之環氧樹脂。 Φ 4.如申請專利範圍第1項之環氧樹脂組成物,其中該環氧 樹脂(Α)係環氧當量150~l,〇〇〇g/eq.之雙酚型環氧樹 脂。 5.如申請專利範圍第1項之環氧樹脂組成物’其中環氧樹 脂(A)、甲基丙烯酸(B)及含有脂肪族酯鍵或脂肪族碳 酸酯鍵的含酸基之自由基聚合性單體(C)之總計1〇〇質 量份中,以1〇~60質量份之比例’含有該環氧樹脂(A)’ 以1〜35質量份之比例,含有該甲基丙烯酸(B)’ -27- 201008960 以5~5 0質量份之比例,含有該含有脂肪族酯鍵或脂肪族 碳酸酯鍵的含酸基之自由基聚合性單體(C)。 6. 如申請專利範圍第1項之環氧樹脂組成物,其係除環氧 樹脂(Α)、甲基丙烯酸(Β)、含有脂肪族酯鍵或脂肪族 碳酸酯鍵的含酸基之自由基聚合性單體(C)及自由基聚 合引發劑(D)之各成分之外,更含有具脂肪族環狀結構 之單甲基丙烯酸酯化合物(Ε)。 7. 如申請專利範圍第6項之環氧樹脂組成物,其中環氧樹 ® 脂(Α)、甲基丙烯酸(Β)、含有脂肪族酯鍵或脂肪族碳 酸酯鍵的含酸基之自由基聚合性單體(C)及含有脂環結 構的單甲基丙烯酸酯化合物(E)之合成質量100質量份 中,以20~7 0質量份之比例,含有該具有脂肪族環狀結 構之單甲基丙烯酸酯化合物(E)。 8. —種光半導體封止材,其係由如申請專利範圍第1項之 環氧樹脂組成物所形成。 Λ 9.一種硬化物,其係將如申請專利範圍第1項之環氧樹脂 組成物賦型後,藉由原位(in-situ)反應使其硬化之硬化 物。 10. —種硬化物之製造方法,其係於成形機內,使如申請專 利範圍第1項之環氧樹脂組成物藉由原位(in-situ)反應 而硬化。 11. 一種光半導體裝置,其係以如申請專利範圍第1項之環 氧樹脂組成物,來封止光半導體及接合於此光半導體之 電極零件而形成。 -28- 201008960 四、指定代表圖: (一) 本案指定代表圖為:無。 (二) 本代表圖之元件符號簡單說明: 〇(1) (wherein R1 represents an aliphatic hydrocarbon group having 2 to 10 carbon atoms, X is an ester bond or a carbonate bond, R2 represents an aliphatic hydrocarbon group having 2 to 10 carbon atoms, and η is 1 to 5 Integer). 3. The epoxy resin composition according to claim 1, wherein the epoxy resin is an epoxy resin having a cyclic aliphatic structure. Φ 4. The epoxy resin composition according to claim 1, wherein the epoxy resin is an epoxide type epoxy resin having an epoxy equivalent of 150 to 1, 〇〇〇g/eq. 5. The epoxy resin composition of claim 1 of the invention, wherein the epoxy resin (A), methacrylic acid (B), and an acid group-containing radical polymerization containing an aliphatic ester bond or an aliphatic carbonate bond In a total of 1 part by mass of the monomer (C), the epoxy resin (A) is contained in a ratio of 1 to 35 parts by mass, and the methacrylic acid (B) is contained in a ratio of 1 to 35 parts by mass. ) -27- 201008960 The acid group-containing radical polymerizable monomer (C) containing the aliphatic ester bond or the aliphatic carbonate bond is contained in an amount of 5 to 50 parts by mass. 6. The epoxy resin composition of claim 1 is free of epoxy resin (Α), methacrylic acid (Β), acid group containing aliphatic ester bond or aliphatic carbonate bond. In addition to each component of the radical polymerizable monomer (C) and the radical polymerization initiator (D), a monomethacrylate compound having an aliphatic cyclic structure is further contained. 7. The epoxy resin composition of claim 6 of the patent scope, in which the epoxy group (Α), methacrylic acid (Β), an aliphatic ester bond or an aliphatic carbonate bond-containing free radical 100 parts by mass of the synthetic mass of the radical polymerizable monomer (C) and the monomethacrylate compound (E) having an alicyclic structure, the aliphatic cyclic structure is contained in a ratio of 20 to 70 parts by mass. Monomethacrylate compound (E). 8. An optical semiconductor sealing material formed by the epoxy resin composition of claim 1 of the patent application. Λ 9. A cured product which is a hardened product which is hardened by an in-situ reaction after the epoxy resin composition of the first application of the patent application is formed. A method for producing a cured product which is obtained in a molding machine to harden an epoxy resin composition as in the first item of Patent Application No. 1 by an in-situ reaction. An optical semiconductor device formed by sealing an optical semiconductor and an electrode member bonded to the optical semiconductor by the epoxy resin composition of claim 1 of the patent application. -28- 201008960 IV. Designated representative map: (1) The representative representative of the case is: None. (2) A brief description of the symbol of the representative figure: 〇 五、本案若有化學式時,請揭示最能顯示發明特徵的化學式:5. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention:
TW98124026A 2008-07-18 2009-07-16 Epoxy resin composition, the cured article thereof, light-semiconductor sealing material, and light-semiconductor device TW201008960A (en)

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