TW200932362A - Positioning-type mask - Google Patents

Positioning-type mask Download PDF

Info

Publication number
TW200932362A
TW200932362A TW97102193A TW97102193A TW200932362A TW 200932362 A TW200932362 A TW 200932362A TW 97102193 A TW97102193 A TW 97102193A TW 97102193 A TW97102193 A TW 97102193A TW 200932362 A TW200932362 A TW 200932362A
Authority
TW
Taiwan
Prior art keywords
positioning
mask
thin plate
substrate
area
Prior art date
Application number
TW97102193A
Other languages
English (en)
Chinese (zh)
Other versions
TWI362228B (enExample
Inventor
Sheng-Wei Chen
Hui-Lung Lai
Original Assignee
Chi Hsin Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chi Hsin Electronics Corp filed Critical Chi Hsin Electronics Corp
Priority to TW97102193A priority Critical patent/TW200932362A/zh
Publication of TW200932362A publication Critical patent/TW200932362A/zh
Application granted granted Critical
Publication of TWI362228B publication Critical patent/TWI362228B/zh

Links

Landscapes

  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
TW97102193A 2008-01-21 2008-01-21 Positioning-type mask TW200932362A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW97102193A TW200932362A (en) 2008-01-21 2008-01-21 Positioning-type mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW97102193A TW200932362A (en) 2008-01-21 2008-01-21 Positioning-type mask

Publications (2)

Publication Number Publication Date
TW200932362A true TW200932362A (en) 2009-08-01
TWI362228B TWI362228B (enExample) 2012-04-11

Family

ID=44865565

Family Applications (1)

Application Number Title Priority Date Filing Date
TW97102193A TW200932362A (en) 2008-01-21 2008-01-21 Positioning-type mask

Country Status (1)

Country Link
TW (1) TW200932362A (enExample)

Also Published As

Publication number Publication date
TWI362228B (enExample) 2012-04-11

Similar Documents

Publication Publication Date Title
JP6035548B2 (ja) 蒸着マスク
JP5641462B1 (ja) 金属板、金属板の製造方法、および金属板を用いてマスクを製造する方法
CN105358732B (zh) 成膜掩模和成膜掩模的制造方法
TWI721170B (zh) 蔽蔭遮罩沉積系統及其方法
JP2018135604A (ja) フレーム一体型の樹脂層付き金属マスクの製造方法
JP7097821B2 (ja) シャドーマスク堆積システム及びその方法
KR20140090267A (ko) 증착 마스크, 증착 마스크 장치의 제조 방법, 및 유기 반도체 소자의 제조 방법
WO2014109394A1 (ja) 金属板、金属板の製造方法、および金属板を用いて蒸着マスクを製造する方法
CN107653436A (zh) 掩膜板及其制作方法、蒸镀方法
CN104532183A (zh) 高精度掩膜板的制作方法
JP2013083704A5 (ja) マスク、それに使用するマスク用部材、マスクの製造方法及び有機el表示用基板の製造方法
JP2014088594A (ja) 蒸着マスク
JP4335865B2 (ja) シャドウマスクパターンの形成方法
TW200841765A (en) Mask frame assembly for thin film deposition of flat panel display and deposition apparatus using the same
JP2015017308A (ja) 蒸着マスク、樹脂層付き金属マスク、および有機半導体素子の製造方法
WO2016106947A1 (zh) 组合式掩模板及其制作方法
CN105951040A (zh) 掩膜块、掩膜版及掩膜版的制造方法
JP2008196002A (ja) 蒸着マスクおよび蒸着マスクの製造方法
CN110055498B (zh) 面蒸镀源及其制作方法、蒸镀方法、蒸镀装置
TW200539741A (en) Mask, method of manufacturing the same, method of forming thin film pattern, method of manufacturing electro-optical device and electronic equipment
JP6330377B2 (ja) 基板付蒸着マスク装置の製造方法、基板付蒸着マスクおよびレジストパターン付基板
CN110629160B (zh) 掩膜板组件
TW200932362A (en) Positioning-type mask
CN104988458A (zh) 一种带锥角开口掩模板的制作方法
JP2004152704A (ja) 有機エレクトロルミネッセンス素子の製造方法

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees