200918228 九、發明說明 【發明所屬之技術領域】 本發明係關於對加工對象物照射雷射束來進行 雷射加工裝置以及雷射加工方彳去。 【先前技術】 第3 ( A )圖〜第3 ( C )圖係對加工對象物照 束以進行圖案化加工之雷射加工裝置之槪略圖。 第3(A)圖所示之雷射加工裝置，係具備雷 5 〇、照射光學系統5 1 a〜5 1 d、以及載台5 2，將加 物60裝載於載台52上。載台52，能讓加工對象物 與互相正交之X方向、Y方向各個平行的方向移動 加工對象物60 ’例如爲平面顯示器（Flat Display ; FPD )或太陽電池製程中使用之面板。面 如是在厚度〇_5mm〜〇.7mm之玻璃基板上形成透明 (厚度〜〇.2//m之ITO膜）而構成。 爲了製造FPD或太陽電池，係從IT0膜上方 束照射面板’以將照射位置之ΙΤ〇膜除去（ΙΤ0膜 工）。 關於太陽電池，不是使用面板，而是以在厚度 之聚醯亞胺上形成厚度〇·〗#„!〜〇·2//ηι之ΙΤΟ膜 之薄膜作爲加工對象物。 第3(A)圖所示之雷射加工裝置，從雷射光源 出之雷射束’例如分成4路而經由照射光學系統 加工之 射雷射 射光源 工對象 ，60朝 〇 Panel 板，例 導電膜 用雷射 除去加 0.1mm 而構成 50射 5 1 a〜 -4 - 200918228 5 Id照射至加工對象物60。 照射光學系統5 1 a〜5 1 d，係朝固定的一方向射出雷 射束。藉由載台52使加工對象物60沿X方向及Y方向 移動，可改變雷射束在加工對象物60上之入射位置，而 對ITO膜進行圖案化加工。 第3 ( A )圖所示之雷射加工裝置，必須將載台52沿 X方向及Y方向驅動，因此有佔地變大的缺點。又由於藉 由載台52之驅動來進行雷射束之掃描，也會有加工速度 變慢的缺點。例如使用第3 ( A )圖所示之雷射加工裝置 時，長730mm、寬920mm之面板是以lm/s的加工速度進 行圖案化加工。 第3(B)圖所示之雷射加工裝置，與第3(A)圖所 示之雷射加工裝置之不同點在於，將照射光學系統5 1 a〜 5 1 d之位置關係維持固定，而使其等沿X方向移動。由於 照射光學系統5 1 a〜5 1 d能沿X方向移動，故載台5 2僅能 使加工對象物6 0沿Y方向移動，這點也不同。 使用第3 ( B )圖所示之雷射加工裝置時，相較於使 用第3(A)圖所示之雷射加工裝置的情形，可對更大尺 寸的加工對象物60進行加工。然而，由於尺寸變大，載 台52之驅動變慢，例如長2100mm、寬2400mm之面板是 以0 _ 5 m/s的加工速度進行圖案化加工。 第3(A) 、（B)圖所示之雷射加工裝置之加工位置 精度良好’例如能以± 1 〇 " m之誤差範圍進行加工。 第3 ( C)圖所示之雷射加工裝置，係藉由擺動鏡掃 -5- 200918228 描器（galvanometer scanner) 53使雷射束之出射方向在 2維方向改變，藉此改變雷射束在加工對象物60上之入 射位置。擺動鏡掃描器53係具備：X軸方向掃描用擺動 鏡以及Y軸方向掃描用擺動鏡共2片擺動鏡。 使用擺動鏡掃描器5 3進行雷射束之掃描時，例如很 容易就能獲得1 〇m/s的加工速度，但相反地，由於加工位 置精度會正比於加工區域的面積而惡化’因此在進行大面 積區域之加工時，難以進行高品質的加工。例如對長 73 0mm、寬92 0mm的區域進行加工時，加工位置誤差達 ±20 〜50/z m。 另外，例如將Y軸方向掃描用擺動鏡固定住，僅讓X 軸方向掃描用擺動鏡擺動，而將雷射束沿X軸方向進行 直線掃描的情形，即使如此雷射束仍可能在Y軸方向擺 動。 爲了實現低成本、高生產性且穩定性優異之雷射加工 ，先前揭示之雷射加工方法的發明，係將驅動擺動鏡所進 行之雷射束的照射，對加工對象物之入射角度設定在30° 以內（例如參照專利文獻1 )。 另外，爲了在使用複數個掃描裝置掃描雷射束來形成 貫穿孔時，防止相鄰之貫穿孔群之貫穿孔一體化，先前揭 示之貫穿孔形成用黏著片製造方法之發明，係使用將複數 個擺動鏡串列配置之雷射加工裝置，對於複數個擺動鏡所 產生之雷射束之複數個掃描列，將相鄰的掃描列間錯開以 避免該複數個掃描列互相重疊（例如參照專利文獻2 )。 -6 - 200918228 再者’爲了提昇最終掃描時之雷射束的利用效率，先 前揭示之雷射束之掃描方法之發明，係以對向面彼此錯開 的方式將2個多邊形鏡平行配置’藉此對2個多邊形鏡交 互照射雷射束（例如參照專利文獻3 )。 〔專利文獻1〕日本特開2004-335863號公報 〔專利文獻2〕日本特開2007-70440號公報 〔專利文獻3〕日本特開平5-88099號公報 【發明內容】 本發明之目的’係爲了提供一種能進行高速高精度的 加工之雷射加工裝置。又爲了提供一種能進行高速高精度 的加工之雷射加工方法。 依據本發明之一觀點，係提供一種雷射加工裝置，係 具有：用來射出雷射束之雷射光源、將前述雷射光源所射 出之雷射束分支成第1光路及與前述第1光路不同的第2 光路之光束分支器、將加工對象物保持成能在第1方向移 動之保持機構、將箱由前述光束分支器分支至前述第1光 路之雷射束朝前述保持機構所保持之加工對象物射入之第 1光學系統、以及將藉由則述光束分支器分支至前述第2 光路之雷射束朝前述保持機構所保持之加工對象物射入之 第2光學系統；該第1光學系統含有將該雷射束在該加工 對象物上朝與前述第1方向交叉之第2方向掃描之第1擺 動鏡’該第2光學系統含有將該雷射束在該加工對象物上 朝與前述第1方向交叉之第3方向掃描之第2擺動鏡；將 -7- 200918228 前述第1及第2擺動鏡配置成，當前述第丨擺動鏡將雷 束掃描在該加工對象物上的範圔沿前述第i方向平行移 時’係和前述第2擺動鏡將雷射束掃描在該加工對象物 的範圍重疊；在前述第i、第2擺動鏡之動作狀態下， 射束係對即述第1、第2擺動鏡分別從固定的光路射入 藉由前述第1、第2擺動鏡所掃描之雷射束，分別直接 入前述保持機構所保持之加工對象物。 依據本發明之另一觀點，係提供一種雷射加工方法 其具備· (a)在加工對象物上沿第丨方向平行移動時 劃設出相互重疊之第1及第2區域之步驟；（b)在前 第1區域，將第1雷射束沿與前述第1方向不同之第2 向射入，且在前述第2區域，將第2雷射束沿與前述第 方向不同之第3方向射入之步驟；以及（c )使前述加 對象物沿前述第1方向移動之步驟。 依據本發明’可提供一種能進行高速高精度的加工 雷射加工裝置。又可提供一種能進行高速高精度的加工 雷射加工方法。 【實施方式】 桌1圖係第1實施例之雷射加工裝置之槪略圖。第 實施例之雷射加工裝置，係具備：雷射光源1 〇、擴張 11、光罩12、半反射鏡13、返射鏡14x〜14z、成像透 15a、15b、透鏡移動系統16a、16b、擺動鏡17a、17b 控制裝置1 8以及載台1 9。 射 動 上 雷 射 述 方 1 工 之 之 器 鏡 -8- 200918228 雷射光源10，當接收來自控制裝置18之觸發訊號後 ’會射出脈衝雷射束40。雷射光源1〇例如含有Nd : YAG 雷射振盪器以及非線性光學結晶。脈衝雷射束4 0，例如 爲Nd : YAG雷射之2倍高諧波。脈衝雷射束40之脈衝寬 例如爲 lOnsec〜30nsec。 脈衝雷射束40，係經過擴張器1 1 (將射入的雷射束 的射束徑放大後射出）以及光罩12 (具有透光區域和遮 光區域，用來將脈衝雷射束4 0的截面形狀予以整形）， 然後射入半反射鏡1 3。半反射鏡1 3，係將脈衝雷射束4 0 分支成脈衝雷射束40a、40b。 脈衝雷射束40a，經返射鏡1 4x返射後，透過成像透 鏡1 5 a後被擺動鏡1 7a反射，再直接射入載台1 9上所裝 載之加工對象物（面板30 )。脈衝雷射束40a，係對擺動 鏡1 7 a從固定的光路射入。 載台19’係將面板30保持成能在1維方向（在本圖 是與Y方向平行的方向）移動。因載台19而造成之面板 3 〇的移動，係依據控制裝置1 8的控制訊號來進行。 擺動鏡1 7a，當收到控制裝置1 8之控制訊號時，會 將脈衝雷射束40a之出射方向改變成和載台19所造成之 面板30的移動方向交叉之1維方向（在本圖是與γ方向 平行的方向）後射出。 面板3 0，係在太陽電池之一製程中待加工的面板， 俯視例如呈長1 〇〇〇mm、寬1400mm之矩形。作爲面板30 ’例如是在厚度0.5mm〜0.7mm之玻璃基板上積層厚度 -9- 200918228 0_l/zm〜0.2em之透明電極膜（例如ITO膜）而構成。 經擺動鏡1 7 a反射後之脈衝雷射束4 0 a照射在面板 30之ITO膜上，藉此將照射位置之ITO膜除去。成像透 鏡15a，係將光罩12的透光區域的形狀成像在IT〇膜上 〇 藉由擺動鏡17a所造成之脈衝雷射束40a之出射方向 的變化、載台19所造成之面板30的移動，使脈衝雷射束 4〇a移動至ITO膜上之入射位置，藉此進行ITO膜之圖案 化加工。沿X軸方向之圖案化加工的加工寬度，例如爲 5 0 // m以下。 透鏡移動機構16a，係將成像透鏡15a保持成能在脈 衝雷射束4〇a之光軸方向（行進方向）移動。成像透鏡 1 5a ’係在與脈衝雷射束40a的光軸方向平行的方向移位 ，即使因擺動鏡17a之動作而使脈衝雷射束40a在面板 3 0上之入射位置改變，仍能恒使光罩1 2面之脈衝雷射束 40在面板30之ITO膜上進行成像。透鏡移動機構16a所 造成之成像透鏡1 5 a的移位，係根據控制裝置1 8之控制 訊號來進行。 在半反射鏡1 3分支後之脈衝雷射束40b，被返射鏡 14y、14z返射後透過成像透鏡15b，被擺動鏡17b反射後 射入面板30之ΐτο膜，藉此將入射位置之ITO膜除去。 對於脈衝雷射束4 0 b之成像透鏡1 5 b、擺動鏡1 7 b、 透鏡移動機構1 6b之作用，係和對於脈衝雷射束40a之成 像透鏡15a、擺動鏡17a、透鏡移動機構16a之作用相同 -10- 200918228 藉由擺動鏡17b所造成之脈衝雷射束 的變化、載台19所造成之面板30的移動 4〇b掃描在ITO膜上，藉此進行ITO膜之 X軸方向之圖案化加工之加工寬度，例如 束4 0a來進行圖案化加工時相同。 例如，藉由交互反覆進行：藉由擺動 改變脈衝雷射束40a及40b之出射方向 19使面板30移動以改變脈衝雷射束40a , 上的入射位置的步驟，來進行面板3 0之Ϊ 擺動鏡17a、17b配置成：各擺動鏡 之脈衝雷射束40a、40b所進行之圖案化 域，至少在沿Y方向平行移動時會相互 成：由一脈衝雷射束40分支出之2個脈 4 0B照射於面板30之加工線存在於同一直 藉由使用第1實施例之雷射加工I 1 〇m/s以上的高速進行沿X軸方向之圖案 軸方向之雷射束入射位置的移動也能以高 在第1實施例之雷射加工裝置，脈衝 反射鏡1 3分支爲2，分支後之脈衝雷射穿 係藉由擺動鏡17a、17b獨立掃描。使J 17a、17b的原因，是在例如以50//m以 行圖案化加工時，要求縮短透鏡之焦點距 點距離縮短時擺動鏡1 7a、1 7b可加工的 40b之出射方向 ，將脈衝雷射束 圖案化加工。沿 和照射脈衝雷射 鏡1 7 a及1 7 b來 的步驟、用載台 及40b在面板30 0案化加工。 17a、17b所掃描 加工之可加工區 重疊。例如配置 衝雷射束40a、 :線上。 妄置，能以例如 化加工。又朝Y 精度進行。 雷射束4 0被半 ί 40a、40b 各個 毛複數個擺動鏡 下的加工寬度進 離，當透鏡之焦 區域變窄。因此 -11 - 200918228 ，例如以超過50 " m加工寬度來進行圖案化加工時，可 僅採用1個擺動鏡來進行雷射束之掃描。 在本實施例，藉由擺動鏡17a、17b，將脈衝雷射束 4 0 a、4 0 b都沿和X軸方向平行的方向掃描。但脈衝雷射 束40a、40b之掃描方向也可以互相不同。 第2圖係顯示第2實施例之雷射加工裝置之槪略圖。 和第1實施例之不同點在於：用來將光罩1 2的透光區域 形狀成像於面板3 0上之成像透鏡1 5，係配置於藉由半透 鏡13分支前之脈衝雷射束40的光路上。因此，在第2實 施例之雷射加工裝置，在藉由半透鏡13分支後迄射入面 板30前之脈衝雷射束40a、40b之光路長互相相等。控制 裝置1 8，以使擺動鏡1 7a、1 7b互相對應、例如進行對稱 或同樣動作的方式，進行使擺動鏡17a、17b的動作同步 之控制。 以上係藉由實施例來說明本發明，但本發明並不限於 此。 例如’實施例之雷射加工裝置雖是使用成像光學系統 ，但也能採用聚光光學系統。 此外，對熟習此技藝人士而言，可進行各種變更、改 良、組合等乃顯而易知的。 本發明’可適用於雷射加工’例如適用於藉由照射雷 射束來進行之圖案化加工。 【圖式簡單說明】 -12- 200918228 第1圖係顯示第1實施例之雷射加工裝置之槪略圖。 第2圖係顯示第2實施例之雷射加工裝置之槪略圖。 第3 ( A )〜（C )圖係對加工對急& _ _ 象物照射雷射束來進 行圖案化加工之雷射加工裝置之槪略@ 【主要元件符號說明】 1 〇 :雷射光源 U :擴張器 12 :光罩 1 3 :半反射鏡 I4x〜14z:返射鏡 15、 15a、15b:成像透鏡 16、 16a、16b:透鏡移動系統 17a 、 17b :擺動鏡 1 8 :控制裝置 19 :載台 3 〇 :面板 4 0、4 0 a、4 0 b ··脈衝雷射束 5 〇 :雷射光源 5 1 a〜5 1 d :照射光學系統 52 :載台 5 3 :擺動鏡掃描器 6〇 :加工對象物 -13-BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a laser processing apparatus and a laser processing apparatus for irradiating a laser beam with a processing object. [Prior Art] The third (A) to the third (C) drawings are schematic views of a laser processing apparatus that performs processing on the object to be patterned. The laser processing apparatus shown in Fig. 3(A) is provided with a lightning rod, an illumination optical system 5 1 a to 5 1 d, and a stage 5 2 to mount the additive 60 on the stage 52. The stage 52 can move the object to be processed in parallel with each other in the X direction and the Y direction which are orthogonal to each other. The object to be processed 60' is, for example, a flat panel display (FPD) or a panel used in a solar cell process. The surface was formed by forming a transparent (ITO film having a thickness of 〇.2//m) on a glass substrate having a thickness of 〇5 mm to 77 mm. In order to manufacture an FPD or a solar cell, the panel is irradiated from the upper side of the IT0 film to remove the ruthenium film at the irradiation position. Regarding the solar cell, instead of using a panel, a film of a ruthenium film having a thickness of 〇·〗#„!~〇·2//ηι is formed on the polyimide of a thickness as a processing object. Fig. 3(A) In the laser processing apparatus shown, the laser beam emitted from the laser source is divided into four paths, for example, by a laser beam source processed by the illumination optical system, and 60 a 〇Panel plate, for example, the conductive film is removed by laser. Adding 0.1 mm to form 50 shots 5 1 a~ -4 - 200918228 5 Id is irradiated onto the object 60. The illumination optical system 5 1 a to 5 1 d emits a laser beam in a fixed direction. The object to be processed 60 is moved in the X direction and the Y direction, and the incident position of the laser beam on the object 60 can be changed to pattern the ITO film. The laser processing shown in Fig. 3 (A) In the device, the stage 52 must be driven in the X direction and the Y direction, so that there is a disadvantage that the footprint becomes large. Further, since the laser beam is scanned by the driving of the stage 52, there is a disadvantage that the processing speed is slow. For example, when using the laser processing device shown in Figure 3 (A), it is 730 mm long and wide. The 920mm panel is patterned at a processing speed of lm/s. The laser processing apparatus shown in Fig. 3(B) differs from the laser processing apparatus shown in Fig. 3(A) in that The positional relationship of the illumination optical system 5 1 a to 5 1 d is maintained constant, and is moved in the X direction. Since the illumination optical system 5 1 a to 5 1 d can be moved in the X direction, the stage 5 2 can only This is also different when the object to be processed 60 moves in the Y direction. When using the laser processing apparatus shown in Fig. 3(B), compared to the case of using the laser processing apparatus shown in Fig. 3(A) The larger-sized object 60 can be processed. However, since the size is increased, the driving of the stage 52 is slow, for example, a panel having a length of 2100 mm and a width of 2400 mm is patterned at a processing speed of 0 _ 5 m/s. The processing position of the laser processing apparatus shown in Figures 3(A) and (B) is excellent. For example, it can be processed within the error range of ± 1 〇 " m. Figure 3 (C) The laser processing device performs the direction of the laser beam by means of a oscillating mirror sweeping -5-200918228 galvanometer scanner 53 The two-dimensional direction is changed, thereby changing the incident position of the laser beam on the object to be processed 60. The oscillating mirror scanner 53 includes a two-swing oscillating mirror for the X-axis direction scanning oscillating mirror and the Y-axis direction scanning oscillating mirror. When the scanning of the laser beam is performed using the oscillating mirror scanner 53, for example, a processing speed of 1 〇m/s can be easily obtained, but conversely, since the processing position accuracy is proportional to the area of the processing region, it is deteriorated. When processing in a large area, it is difficult to perform high-quality processing. For example, when machining a region of 73 mm in length and 92 mm in width, the machining position error is ±20 to 50/z m. In addition, for example, the Y-axis direction scanning oscillating mirror is fixed, and only the X-axis direction scanning oscillating mirror is swung, and the laser beam is linearly scanned in the X-axis direction, even if the laser beam is still in the Y-axis. Swing in the direction. In order to realize laser processing with low cost, high productivity, and excellent stability, the invention of the laser processing method disclosed above is to drive the laser beam by the oscillating mirror to set the incident angle of the object to be processed. Within 30° (for example, refer to Patent Document 1). Further, in order to form a through hole by scanning a laser beam using a plurality of scanning devices, the through hole of the adjacent through hole group is prevented from being integrated, and the invention of the above-described method for manufacturing an adhesive sheet for forming a through hole is used a laser processing apparatus configured in a series of oscillating mirrors, wherein a plurality of scanning columns of a laser beam generated by a plurality of oscillating mirrors are staggered between adjacent scanning columns to prevent the plurality of scanning columns from overlapping each other (for example, referring to a patent) Literature 2). -6 - 200918228 Furthermore, in order to improve the utilization efficiency of the laser beam at the time of final scanning, the invention of the scanning method of the previously disclosed laser beam is to arrange two polygonal mirrors in parallel in such a manner that the opposing faces are shifted from each other. This alternately illuminates the laser beams with two polygon mirrors (for example, refer to Patent Document 3). [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. A laser processing apparatus capable of high speed and high precision processing is provided. In order to provide a laser processing method capable of high-speed and high-precision machining. According to one aspect of the present invention, there is provided a laser processing apparatus comprising: a laser light source for emitting a laser beam; and branching a laser beam emitted from the laser light source into a first optical path and the first a beam splitter of a second optical path having different optical paths, a holding mechanism for holding the object to be moved in the first direction, and a laser beam branched from the beam splitter to the first optical path to be held by the holding mechanism a first optical system into which the object to be processed is incident, and a second optical system in which the laser beam branched from the beam splitter to the second optical path is incident on the object to be held by the holding mechanism; The first optical system includes a first swinging mirror that scans the laser beam in the second direction intersecting the first direction on the object to be processed, and the second optical system includes the laser beam in the object to be processed. a second oscillating mirror that scans in a third direction intersecting the first direction; and the first and second oscillating mirrors of -7-200918228 are arranged such that the third oscillating mirror scans a lightning beam on the object to be processed Fan Wei When the ith direction is parallel to move, the second oscillating mirror superimposes the scanning of the laser beam on the object to be processed; and in the operating state of the ith and second oscillating mirrors, the beam aligning is described 1. The second oscillating mirror respectively enters the laser beam scanned by the first and second oscillating mirrors from the fixed optical path, and directly enters the object to be processed held by the holding mechanism. According to another aspect of the present invention, there is provided a laser processing method comprising the steps of: (a) drawing first and second regions overlapping each other when moving in parallel in the second direction on the object to be processed; In the first first region, the first laser beam is incident in a second direction different from the first direction, and in the second region, the second laser beam is in a third direction different from the first direction. a step of injecting; and (c) a step of moving the object to be attached in the first direction. According to the present invention, it is possible to provide a laser processing apparatus capable of performing high speed and high precision processing. A laser processing method capable of high-speed and high-precision processing can be provided. [Embodiment] Table 1 is a schematic view of a laser processing apparatus according to a first embodiment. The laser processing apparatus according to the first embodiment includes: a laser light source 1 〇, an expansion 11, a mask 12, a half mirror 13, a return mirror 14x to 14z, an image transmission 15a, 15b, a lens moving system 16a, 16b, The oscillating mirrors 17a, 17b control the device 18 and the stage 19. The laser beam 10, when receiving the trigger signal from the control device 18, will emit the pulsed laser beam 40. The laser source 1 includes, for example, a Nd:YAG laser oscillator and a nonlinear optical crystal. The pulsed laser beam 40 is, for example, a 2x harmonic of the Nd:YAG laser. The pulse width of the pulsed laser beam 40 is, for example, lOnsec to 30 nsec. The pulsed laser beam 40 passes through a dilator 1 1 (which amplifies the beam path of the incident laser beam) and a reticle 12 (having a light-transmitting region and a light-shielding region for pulsing the laser beam 40 The cross-sectional shape is shaped) and then injected into the half mirror 13. The half mirror 13 divides the pulsed laser beam 40 into pulsed laser beams 40a, 40b. The pulsed laser beam 40a is returned by the return mirror 14x, passes through the imaging lens 15a, is reflected by the oscillating mirror 17a, and is directly incident on the object (panel 30) loaded on the stage 19. The pulsed laser beam 40a is incident on the oscillating mirror 17a from a fixed optical path. The stage 19' holds the panel 30 so as to be movable in the one-dimensional direction (the direction parallel to the Y direction in the figure). The movement of the panel 3 due to the stage 19 is performed in accordance with the control signal of the control unit 18. The oscillating mirror 17a, when receiving the control signal of the control device 18, changes the outgoing direction of the pulsed laser beam 40a to a one-dimensional direction that intersects the moving direction of the panel 30 caused by the stage 19 (in this figure). It is a direction parallel to the γ direction) and is emitted. The panel 30 is a panel to be processed in one process of the solar cell, and is, for example, a rectangle having a length of 1 mm and a width of 1400 mm. The panel 30' is formed by, for example, a transparent electrode film (for example, an ITO film) having a thickness of -9 to 200918228 0_l/zm to 0.2em laminated on a glass substrate having a thickness of 0.5 mm to 0.7 mm. The pulsed laser beam 40, which is reflected by the oscillating mirror 17a, is irradiated onto the ITO film of the face plate 30, whereby the ITO film at the irradiation position is removed. The imaging lens 15a images the shape of the light-transmitting region of the reticle 12 on the IT diaphragm, the change in the outgoing direction of the pulsed laser beam 40a caused by the oscillating mirror 17a, and the panel 30 caused by the stage 19. Moving, the pulsed laser beam 4〇a is moved to an incident position on the ITO film, whereby patterning processing of the ITO film is performed. The processing width of the patterning process in the X-axis direction is, for example, 5 0 // m or less. The lens shifting mechanism 16a holds the imaging lens 15a so as to be movable in the optical axis direction (traveling direction) of the pulsed laser beam 4a. The imaging lens 15a' is displaced in a direction parallel to the optical axis direction of the pulsed laser beam 40a, and even if the incident position of the pulsed laser beam 40a on the panel 30 is changed by the action of the oscillating mirror 17a, it is still constant. The pulsed laser beam 40 of the mask 1 surface is imaged on the ITO film of the panel 30. The displacement of the imaging lens 15a caused by the lens moving mechanism 16a is performed in accordance with the control signal of the control device 18. The pulsed laser beam 40b branched by the half mirror 13 is returned by the retroreflective mirrors 14y and 14z, passes through the imaging lens 15b, is reflected by the oscillating mirror 17b, and is incident on the οτ film of the panel 30, thereby taking the incident position. The ITO film was removed. The imaging lens 15b, the oscillating mirror 17b, and the lens moving mechanism 16b for the pulsed laser beam 40b are the imaging lens 15a, the oscillating mirror 17a, and the lens moving mechanism 16a for the pulsed laser beam 40a. The same effect is applied --10-200918228 The change of the pulsed laser beam caused by the oscillating mirror 17b and the movement of the panel 30 caused by the stage 19 are scanned on the ITO film, thereby performing the X-axis direction of the ITO film. The processing width of the patterning process is the same as that in the case of patterning processing in the bundle 40a. For example, by interactively repeating: the step of moving the panel 30 by changing the exit direction 19 of the pulsed laser beams 40a and 40b to change the incident position on the pulsed laser beam 40a, the oscillating motion of the panel 30 is performed. The mirrors 17a, 17b are arranged such that the patterned domains of the pulsed laser beams 40a, 40b of the respective oscillating mirrors are mutually formed at least in parallel movement in the Y direction: two pulses branched by a pulsed laser beam 40 The processing line of the 40B irradiated to the panel 30 exists in the same direct movement of the laser beam incident position in the pattern axis direction in the X-axis direction by the high speed of the laser processing I 1 〇 m/s or more in the first embodiment. It is also possible to use the laser processing apparatus of the first embodiment to divide the pulse mirror 13 into two, and the branched pulse laser beam is independently scanned by the oscillating mirrors 17a and 17b. The reason for making J 17a, 17b is that, for example, when patterning is performed in a row of 50//m, it is required to shorten the exit direction of 40b which can be processed by the oscillating mirrors 17a, 17b when the distance of the focal point of the lens is shortened, and the pulse is applied. Laser beam patterning processing. The steps of illuminating the pulsed laser mirrors 1 7 a and 1 7 b are processed in the panel 30 0 using the stage and 40b. The machinable areas scanned by 17a and 17b overlap. For example, configure the laser beam 40a, : line. The device can be processed, for example. It is also done towards Y precision. The laser beam 40 is separated by the processing width of each of the plurality of oscillating mirrors of the half 40a, 40b, and the focal region of the lens is narrowed. Therefore, -11 - 200918228, for example, when patterning is performed with a processing width of more than 50 " m, only one oscillating mirror can be used for scanning the laser beam. In the present embodiment, the pulsed laser beams 40a, 4ob are scanned in the direction parallel to the X-axis direction by the oscillating mirrors 17a, 17b. However, the scanning directions of the pulsed laser beams 40a, 40b may also be different from each other. Fig. 2 is a schematic view showing the laser processing apparatus of the second embodiment. The difference from the first embodiment is that the imaging lens 15 for imaging the shape of the light-transmitting region of the reticle 1 2 on the panel 30 is disposed on the pulsed laser beam 40 before being branched by the half-lens 13 The light path. Therefore, in the laser processing apparatus of the second embodiment, the optical path lengths of the pulsed laser beams 40a and 40b before being incident on the panel 30 after being branched by the half mirror 13 are equal to each other. The control device 18 performs control for synchronizing the operations of the swing mirrors 17a and 17b so that the swing mirrors 17a and 17b correspond to each other, for example, symmetrically or in the same manner. The present invention has been described above by way of examples, but the invention is not limited thereto. For example, the laser processing apparatus of the embodiment uses an imaging optical system, but a collecting optical system can also be used. Further, it will be apparent to those skilled in the art that various changes, modifications, combinations, and the like can be made. The present invention 'is applicable to laser processing' is applied, for example, to patterning processing by irradiating a laser beam. BRIEF DESCRIPTION OF THE DRAWINGS -12- 200918228 Fig. 1 is a schematic view showing a laser processing apparatus of a first embodiment. Fig. 2 is a schematic view showing the laser processing apparatus of the second embodiment. The 3rd (A) to (C) diagram is a schematic diagram of a laser processing apparatus for processing a laser beam by irradiating a laser beam with an emergency & _ _ _ _ @ [Main component symbol description] 1 〇: laser Light source U: Dilator 12: Photomask 13: Half mirrors I4x to 14z: Retroreflective mirrors 15, 15a, 15b: Imaging lenses 16, 16a, 16b: Lens shifting systems 17a, 17b: Swing mirrors 18: Control devices 19: Stage 3 〇: Panel 4 0, 4 0 a, 4 0 b · Pulsed laser beam 5 〇: Laser source 5 1 a~5 1 d : Illumination optical system 52: Stage 5 3 : Swing mirror Scanner 6〇: Processing object-13-