TW200913085A - The pick-up equipment of semiconductor wafer and pick-up method - Google Patents

The pick-up equipment of semiconductor wafer and pick-up method Download PDF

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Publication number
TW200913085A
TW200913085A TW97105105A TW97105105A TW200913085A TW 200913085 A TW200913085 A TW 200913085A TW 97105105 A TW97105105 A TW 97105105A TW 97105105 A TW97105105 A TW 97105105A TW 200913085 A TW200913085 A TW 200913085A
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Taiwan
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cover
semiconductor die
stage
semiconductor
picked
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TW97105105A
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Chinese (zh)
Inventor
Yasushi Sato
Okito Umehara
Akio Katsuro
Shinichi Sasaki
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Shinkawa Kk
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Publication of TW200913085A publication Critical patent/TW200913085A/en

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  • Engineering & Computer Science (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Die Bonding (AREA)

Abstract

The pick-up equipment of semiconductor wafer is to restrain the force applied on a semiconductor dice when holding sheet comes off, and is easy to pick up the semiconductor dice. This equipment is consisted of the platform 20 with a tightly adhering surface 22, an opening 41, larger than the picked semiconductor dice 15, installed on the tightly adhering surface 22, a cover 23, whose surface is moved along the tightly adhering surface, to open/close the opening 41. On picking up the semiconductor dice 15, the surface of cover 23 is forced to tightly adhere to a holding sheet 12 in order not to make the semiconductor dice 15 protruded the surface of the cover 23 via the closed opening 41. Under the situation that the picked semiconductor dice 15 is absorbed by a clip 18, the cover 23 is enabled to slide and sequentially open the opening 41. At the opened opening 41, the holding sheets are sequentially absorbed and come off.

Description

200913085 九 法 發明説明: 【發明所屬之技術領域】 本發明係關於半導體晶粒拾取裝置之構造及拾取方 【先前技術】 半導體晶粒係由將6忖或8 „寸大小之晶圓切斷為既定 之尺寸製造而成。切斷時為避免所切斷之半導體晶粒分 散,於背面黏貼黏著性之保持帶,藉由切片鑛等從表面側 切斷晶圓。此時,黏貼於背面之保持帶雖被切入若干深产, 但不被切斷而形成保持各半導體晶粒之狀態。然後㈣切 斷之各半導體晶粒逐-從保持片拾取而送至晶粒接合等下 一製程。 以往從黏著性之保持帶拾取半導體晶粒之方法, 使用上推針之方法⑽如,參照專利讀〗之圖Η)。該方 法係在以筒夾吸引半導體晶 μ 六少仅4* U 攸朝向周圍加拉 之保持片下側藉由上推針上推半導體晶粒之中 加於保持片之拉力從半導體S # 曰 ,體曰Β粒亲J離黏者性之保持片, 以同夾拾取半導體晶粒。 而 但是’該使用上推針之方法在半導體晶粒之 會產生上推使半導體晶粒破裂之問題,故難:’ 近年來之薄型半導體晶粒之拾取。 ❹以使用於 因此,有提案不使用上推 離、拾取之方法。你U 黏者性之保持片分 万法例如,於專利文獻丨 欲拾取之半導體β朽 軚案如下方法··將 載置於具備複數個Μ孔之載台的吸 6 200913085 引孔上,在使筒夾吸附保持該半導體晶粒之狀態下, 引孔為真空’將保持片吸引至各吸引孔内使其變形,在吸 半導體晶粒剝離對應㈣孔之部分的保持片後,藉從 台水平移動或旋轉,將未剝離而殘留之部分的保 導體晶粒剝離(參照專利文獻1之圖1至圖4)。 1/石.於載a200913085 九法发明说明: Technical Field of the Invention The present invention relates to the construction and pick-up of a semiconductor die pick-up device. [Prior Art] A semiconductor die is cut from a 6-inch or 8-inch wafer. It is manufactured in a predetermined size. In order to avoid the dispersion of the cut semiconductor grains during cutting, the adhesive tape is adhered to the back surface, and the wafer is cut from the surface side by slicing or the like. The holding tape is cut into a number of deep productions, but is not cut to form a state in which the respective semiconductor crystal grains are held. Then, the (four) cut semiconductor dies are picked up from the holding sheets and sent to the next process such as die bonding. In the past, the method of picking up the semiconductor die from the adhesive holding tape, using the method of pushing up the needle (10), for example, refer to the patent reading Η). The method is to attract the semiconductor crystal by the collet, and only 4* U 攸The lower side of the holding sheet toward the surrounding pull-up is pushed up by the push-up pin to push the tensile force of the holding piece from the semiconductor S # 曰, the body 曰Β 亲 亲 亲 亲 亲 亲 亲 亲Picking up semiconductor crystal However, 'the method of using the push pin on the semiconductor die will cause the semiconductor die to rupture, so it is difficult: 'In recent years, the thin semiconductor die has been picked up. The proposal does not use the method of pushing and picking up. You can keep the film of the U-stick. For example, the semiconductor beta file that you want to pick up in the patent literature is as follows: · It will be placed on a multi-puppet. The suction of the stage 6 200913085 On the pilot hole, in the state in which the collet is adsorbed and held by the semiconductor die, the via hole is vacuumed, and the holding piece is attracted to each of the suction holes to be deformed, and the semiconductor die is peeled off correspondingly (4) After the holding piece of the hole is partially moved or rotated by the stage, the conductor crystal grains remaining in the portion which has not been peeled off are peeled off (refer to Figs. 1 to 4 of Patent Document 1).

之表面設置較欲拾取之半導體晶粒之寬度狹窄之突出部: =突出部周邊之載台表面設置吸引孔;拾取半導體晶^ 時,於突出部上將欲拾取之半導體晶粒載置為從突出= 出,邊從吸引孔吸引保持片與載台表面間之空氣邊使= 二相對於載台表面水平移動,以從半導體晶粒剝離保 (茶照專利文獻1之圖9至圖1 〇)。 ' (專利文獻1)日本專利第3209736號說明書 【發明内容】 專利文獻1 持帶吸入吸引孔 但因保持帶從半 於剝離吸引孔正 分吸入空氣。因 引剝離,但吸引 剝離,致殘留與 之圖1、圖2)。 留部分之保持片 於半導體晶粒之 所述之方法,雖係使吸引孔為真空而將保 ,以將保持帶從半導體晶粒剝離之方法, 導體晶粒剝離後會覆蓋吸引孔之表面,故 上方之保持片後即不能從吸引孔之周圍邹 此,位於吸引孔正上方之保持片雖能以^ 孔之周圍部分仍不能以吸引孔之真空吸引 半導體晶粒黏貼之狀態(參照專利文獻丄 另方面,使載台移動,以進行該剝離殘 的:離之情形’殘留部分之面積較小時加 力量亦變小,能抑制半導體晶粒之損傷。 7 200913085 但是,若欲減少吸引孔所造成之亲 引孔-致於欲拾取之半導體大 ::心’需要使吸 引孔吸引保持片,於保持片之㈣力 右以大吸 力量加於半導體晶粒。特別因近年來之丰:’時會將大 上述,專利文獻所逑之方法,若=:變形之情形。如 rThe surface of the semiconductor chip is narrower than the width of the semiconductor die to be picked up: = the surface of the stage around the protrusion is provided with a suction hole; when the semiconductor crystal is picked up, the semiconductor die to be picked up is placed on the protrusion Protruding = out, while sucking the air between the holding piece and the surface of the stage from the suction hole, causing the second to move horizontally with respect to the surface of the stage to peel off from the semiconductor die (Fig. 9 to Fig. 1 of the patent document 1) ). [Patent Document 1] Japanese Patent No. 3209736 [Disclosure] Patent Document 1 holds a suction suction hole, but the air is sucked in from the separation suction hole. Because of the peeling, but the attraction is peeled off, the residue is shown in Fig. 1, Fig. 2). The method of retaining a portion of the holding sheet in the semiconductor die, while maintaining the suction hole as a vacuum, to remove the holding tape from the semiconductor die, covers the surface of the attracting hole after the conductor die is peeled off. Therefore, the holding piece on the upper side cannot be pulled from the periphery of the suction hole. The holding piece located directly above the suction hole can not attract the semiconductor die by the vacuum of the suction hole in the vicinity of the hole (refer to the patent literature). On the other hand, the stage is moved to perform the peeling residue: in the case where the area of the residual portion is small, the force is also small, and the damage of the semiconductor crystal grain can be suppressed. 7 200913085 However, if the suction hole is to be reduced The resulting lead hole - the semiconductor to be picked up:: the heart 'need to attract the suction hole to hold the piece, to hold the piece (four) force right to add to the semiconductor die with a large suction force. Especially due to the recent years: 'The time will be greater than the above, the method of the patent document, if =: deformation situation. Such as r

V 抑制加於半導體晶粒之力量,而有==剥離時不能 情形的問題。 ° +導體晶粒損傷之 突出邻月t利文獻1所迷之另一種方法,因藉由僅配置於 广周邊之小吸引孔吸入保持片與載台表面間以 嶋持片,㈣抑制因吸引而加於半導體晶粒之二 =,突出部持續移動,因已從半導體晶粒剝離之伴二 =蓋位於突出部所移動之部分的吸弓丨孔,故突出部之移 =使空氣之吸引量逐漸減少(參照專利文獻i之圖9、圖 _保持片之剝離線長度係以所移動之* 決定’因此剝離保持片所需之力量不會依照心 夕方向之位置變化。又,因突出部側面與保持片之 =之垂直於突出部移動方向的截面積,不會由於突 ,動而邊化,故空氣漏進該間隙之流路戴面積亦不因突 佯=移動而變化。因此’若因突出部之移動使被剥離之 持 丨二孔里、漸減低,使突出部與保 、片間之真空度下降’而使剝離力逐漸降低。結果,於半 8 200913085 導體晶粒之朝向突出部之移動方向 保持片,有不能順利地拾取半導 1產=剝離之 片之剝離力增大雖係可# , '、持片之拉力使保持 接之半導體晶粒之情形,突出“4立1之移動方向有鄰 邛㈢接觸於該半導a 使半導體晶粒損傷,因此存在有 p體曰曰叔而 之情形的問題。 4之移動方向被限制 本發明之目的在於提供: 半導體晶粒之力量好容易Μ夺片之剝離時抑制加於 拾取裝置。里卫月“易拾取半導體晶粒的半導體晶粒 本發明之半導體晶粒拾取穿, 半導體曰m ’置係將黏貼於保持片之 ::拉以同夹吸附保持而拾取,其特徵在於:且借. :二=保持片之黏貼半導體晶粒之面相反側的面緊 導體”立.引開口 ’设置於緊貼面’大於所拾取之半 严^ I叹置於載台使其表面沿緊貼面滑動,且 崎關吸引開口;於拾取半導 梏η ,、/姑π 1 了便盖表面緊貼於保 合取之半導體晶粒不從關閉吸引開口之蓋表面 滑二=筒夹吸附所拾取之半導體晶粒之狀態下,使蓋 ^依序打開吸引開口,使保持片依序吸引於已開啟之 相口 ’而從所拾取之半導體晶粒依㈣離保持片。 ;本月之半導體晶粒拾取裝置,蓋亦可設置於載台, 時其:緊貼面滑動且從緊貼面突出,於拾取半導體晶粒 f :使緊貼於保持片之蓋表面從緊貼面突出邊使蓋滑 亦可於拾取半導體晶粒時,使所拾取之半導體晶 200913085 粒之—端之方向-致於沿蓋之-端之方向,從所拾取之半 導體晶粒之一端側朝向另一端側使蓋滑動而依序打開吸附 開口,從所拾取之半導體晶粒之一端側依序吸引保持片於 所開之吸引開Π,而從戶斤絲之半導體晶粒依序剝離保持 〜不赞明之平 γ 4、ι u邳可與 拾取之半導體晶粒大致同一寬度且從載台内側向外側直 f i. 狀地延伸,蓋係與開口之寬度大致同一寬度之長方形板 盍亦可於載台之内側端面與沿開口延伸方向之側面之間 角部具有缺口,载台亦可於吸引開口周邊之緊貼面具備 引孔;亦可於拾取半導體晶粒時,藉由吸引孔邊吸^所 取之半導體晶粒周邊之保持片邊使蓋滑動;亦可於罢與 引開口之滑動面,設有用以限制空氣從載台外側進入内 之密封機構。 於本發明之半導體晶粒拾取裝置,亦可具備使蓋滑 之滑動機構,含有:驅動部,安裝於與載台之緊貼面2 側之基體部,使設置於載台内部之第i連桿㈣緊貼面i 退之方向驅動;導執,設置於載台内部 1大致平行於緊j 面且朝向吸引開口之延伸方向延伸;滑株 、* 丄 、 月1千,連接有蓋,- 滑動地安裝於導執;及第2連桿,旋轅, 咬仟疋轉自如地安裝於载. 内部’將滑件與第1連桿連接,將第I遠 逆#對緊貼面之; 退方向的動作轉換為滑件沿導軌之方向沾 J的動作;於拾取j 導體晶粒時,藉由以驅動部使第1連樟翱 心件朝向緊貼面進退 使蓋沿緊貼面滑動。 10 200913085 於本發明之半導體晶粒拾取裝置,亦可,使蓋滑動之 滑動機構,係含有:驅動部,安裝於與載台之緊貼面相反 側之基體部,使設置於載台内部之第丨連桿於對緊貼面進 退之方向驅動;活塞,設置於載台内部,對緊貼面進退; 如止器,設置於載台内部,限制活塞對緊貼面之進退方向 的動作;彈簧,將第1連桿與活塞連接於對緊貼面進退之 方向,當活塞抵接於停止器時被壓縮;導執,安裝於活塞, ( 大致平行於緊貼面且朝向吸引開口之延伸方向延伸;滑 件,連接有蓋’可滑動地安裝於導軌;及第2連桿,旋轉 t如地安裝於活塞,將滑件與第〗連桿連接,當活塞抵接 方'、铋止器時,將第丨連桿對緊貼面之進退方向的動作轉換 為滑件沿導軌之方向的動作;於拾取半導體晶粒時,藉由 以驅動部使第1連桿朝向緊貼面進退,使蓋從緊貼面突出 後’沿緊貼面滑動。 於本發明之半導體晶粒拾取裝置,亦可具備使蓋滑動 之滑動制,含有:驅動部,安裝於與載台之緊貼面相反 側之基體部,使設置於載台内部之第i連桿於對緊貼面進 退之方向驅動;導轨,S置於載台内部,朝向吸引開口之 延伸方向延伸,具備向緊貼面傾斜之傾斜面;滑件,連接 有蓋,並滑動自如地安裴於導軌之傾斜面;及第2連桿, 可旋轉地安裝於載台内部,將滑件盥第 \ ,'乐1連桿連接,將第V suppresses the force applied to the semiconductor die, and there is a problem that the case of == peeling is not possible. ° + Another method in which the conductor grain damage is highlighted by the neighboring moon, and the method of sucking the sheet is sucked between the holding piece and the surface of the stage by a small suction hole disposed only at a wide periphery, and (4) suppressing attraction And the second applied to the semiconductor die =, the protruding portion continues to move, because the semiconductor has been peeled off from the semiconductor die = the cover is located in the portion of the suction portion of the protruding portion of the suction hole, so the displacement of the protrusion = the attraction of air The amount is gradually reduced (refer to Fig. 9 of Patent Document i, the length of the peeling line of the holding sheet is determined by the movement *), so the force required to peel off the holding piece does not change according to the position of the direction of the heart. The cross-sectional area of the side surface of the portion and the holding piece perpendicular to the moving direction of the protruding portion is not edged and moved, so that the flow path area through which the air leaks into the gap does not change due to the sudden change/movement. 'If the movement of the protruding portion causes the two holes to be peeled off, and the thickness is gradually reduced, the vacuum between the protruding portion and the film and the sheet is lowered, and the peeling force is gradually lowered. As a result, in the half 8 200913085, the conductor grain Direction of movement toward the protrusion Holding the sheet, there is a possibility that the peeling force of the sheet which cannot be picked up smoothly can be smoothly picked up. Although the pulling force of the sheet can be increased, the pulling force of the sheet is held to keep the semiconductor crystal grain connected, and the moving direction of the "4 vertical 1" is highlighted. There is a problem that the semiconductor (III) is damaged by the contact of the semiconductor (III), so there is a problem that the p-body is unclear. 4 The direction of movement is limited. The object of the present invention is to provide: The power of the semiconductor die is easy. When the peeling of the film is stripped, it is suppressed from being applied to the pick-up device. Li Weiyue "a semiconductor die that picks up the semiconductor die. The semiconductor die of the present invention is picked up, and the semiconductor device is adhered to the holding piece: Picking up with the absorbing and holding of the clip is characterized by: and borrowing: 2 = holding the surface of the opposite side of the semiconductor die adhered to the surface of the conductor tightly "the opening of the opening" is set at the close surface 'greater than the semi-rigid ^ I sighed on the stage so that its surface slides along the close surface, and the Kawasaki attracts the opening; after picking up the semi-conducting 梏η, / π1, the surface of the cover is close to the semiconductor die that is taken care of. The surface of the cover that attracts the opening is slippery In the state of the semiconductor die picked up, the cover is sequentially opened to open the attraction opening, so that the holding piece is sequentially attracted to the opened phase port', and the semiconductor film is removed from the semiconductor wafer according to (4). The semiconductor die pick-up device may be disposed on the stage, and the cover may be slid on the contact surface and protrude from the close surface to pick up the semiconductor die f: the surface of the cover that is in close contact with the retaining piece protrudes from the close surface Sliding the cover can also pick up the semiconductor die so that the direction of the end of the picked semiconductor crystal 200913085 is in the direction of the end of the cover, from one end side of the picked semiconductor die toward the other end side. The cover is slid to sequentially open the adsorption opening, and the holding piece is sequentially sucked from the end side of the picked semiconductor die to open the suction opening, and the semiconductor die from the household wire is sequentially peeled and held~ Unaccounted for The flat γ 4 , ι u 邳 may be substantially the same width as the picked semiconductor die and extend from the inside to the outside of the stage, and the rectangular plate having the width of the cover and the width of the opening may be on the stage. Inner end face and edge opening The corner portion of the extending direction has a notch at the corner, and the stage can also have a guiding hole on the abutting surface around the suction opening; and when the semiconductor die is picked up, the periphery of the semiconductor die taken by the suction hole is sucked The cover is held to slide the cover; and the sliding surface of the opening and the opening is provided, and a sealing mechanism for restricting the entry of air from the outside of the stage is provided. In the semiconductor die pick-up device of the present invention, a sliding mechanism for sliding the cover may be provided, and the driving portion may be attached to the base portion on the side of the contact surface 2 of the stage to provide the i-th connection provided inside the stage. The rod (4) is driven in the direction in which the surface i is retracted; the guide is disposed on the inside of the stage 1 and extends substantially parallel to the j-direction and extends toward the extension of the suction opening; the slide, * 丄, month 1000, connected with a cover, - sliding The ground is mounted on the guide; and the second link is rotated, and the bite is freely attached to the carrier. The internal 'connects the slider to the first link, and the first far reversed #对对面; The movement in the direction is converted into the action of the slider in the direction of the guide rail. When the j-conductor die is picked up, the cover is slid along the contact surface by the drive unit moving forward and backward toward the contact surface. 10 200913085 In the semiconductor die pick-up device of the present invention, the sliding mechanism for sliding the cover may include a driving portion that is attached to a base portion on a side opposite to the contact surface of the stage, and is disposed inside the stage. The third link is driven in the direction of advancing and retreating the pressing surface; the piston is disposed inside the stage and advances and retreats to the pressing surface; and the stopper is disposed inside the stage to restrict the movement of the piston in the advancing and retreating direction of the abutting surface; a spring that connects the first link and the piston to the direction of advancing and retreating to the abutting surface, and is compressed when the piston abuts against the stopper; the guide is mounted to the piston, (extending substantially parallel to the abutting surface and extending toward the suction opening) The direction is extended; the sliding member is connected with a cover slidably mounted on the guide rail; and the second connecting rod is rotated to be mounted on the piston as the ground, and the sliding member is connected with the first connecting rod, and when the piston abuts the square, the stopper When the second link is moved in the direction of the advancement and retreat of the contact surface, the action of the third link is reversed to the direction of the guide rail; when the semiconductor die is picked up, the first link is moved forward and backward by the drive portion. After the cover is protruded from the close surface The semiconductor die pick-up device of the present invention may further include a sliding system for sliding the cover, and includes a driving portion that is attached to the base portion on the side opposite to the contact surface of the stage, and is provided on the stage. The inner i-th link is driven in the direction of advancing and retreating the abutting surface; the guide rail, S is placed inside the stage, extends toward the extending direction of the suction opening, and has an inclined surface inclined toward the abutting surface; the sliding member is connected with the cover, And slidably attached to the inclined surface of the guide rail; and the second link is rotatably mounted inside the stage, and the slider 盥, 'Le 1 link is connected, the first

連桿對緊貼面之進退方向的動作轉換A F得換马滑件沿導軌之方 向的動作;於拾取半導體晶粒時,笋由 猎由以驅動部使第1連 杯朝向緊貼面前進,使蓋邊從緊貼面突 穴35邊沿緊貼面滑 200913085 於本發明之半導體晶粒拾取裳置 軌之傾斜面係:凸# m動機構之導 凸輪面’於緊貼面側面從 開口之延伸方向朝向緊貼面傾斜,·及平;==沿吸引 面,平行於腎站; 連、、男於凸輪 連桿,係具備曲面或滾子,用以沿導軌延伸;第2 與平行面之形狀移動。 緊貼面之凸輪面The movement of the connecting rod to the advancing and retracting direction of the adjoining surface is performed by AF to change the direction of the horse sliding member in the direction of the guide rail; when picking up the semiconductor crystal grain, the bamboo shooter is driven by the driving portion to advance the first connecting cup toward the close surface. The cover edge is slid from the edge of the abutting surface of the abutting hole 35 to the surface of the sliding surface of the semiconductor chip of the present invention. The inclined surface of the semiconductor die pick-up rail of the present invention: the guiding cam surface of the convex body is attached to the side of the abutting surface from the opening The direction of extension is inclined toward the abutting surface, and is flat; == along the suction surface, parallel to the kidney station; and the male and female cam links are provided with curved surfaces or rollers for extending along the guide rail; second and parallel faces The shape moves. Cam surface

於本發明之半導體晶粒拾取裝置 下方向驅動嬙μ J具備.载台上 圓保持具對保持片於進退方向移動,·及晶 之保持片便所t取之黏貼有半導體晶粒 平持片固疋的晶圓保持具沿保 體晶粒時,!Α ^ *移動,於拾取半導 持片,辟由= 方向驢動機構使蓋表面緊貼於保 a日日圓保持具水平方向驅動部進 拾取之半導體晶粒從關閉吸引開口之蓋表面仃;出位以免所 裝置於m半導體晶粒拾取方法,係以半導體晶粒拾取 ==貼於保持片之半導體晶粒之方法 粒拾取裝置,係呈 扯曰日 體晶粒之保持片二心· ° ’3有與黏貼有所拾取之半導 貼之緊貼/ 有半導體晶粒之面相反側的面緊 導體=蓋二置於緊貼面,大於所拾取之半 關吸弓丨開口;及:文,其表面沿緊貼面滑動,且開 呈右.&及同夾,吸附保持半導體晶粒;其特徵在於, 丰=位步驟’使蓋表面緊貼於保持片,以使所拾取之 離步:晶π::’閉吸引開口之蓋表面突出;及保持片剝 同夾吸附所拾取之半導體晶粒之狀態下,使 12 200913085 依序打開吸引開口’使保持片依序吸引於已開啟 4口而從所拾取之半導體晶粒依序制離保持片。 明之半導體晶粒拾取方法,亦可半導體晶粒拾 2之盖’係設置於載台,使其沿緊貼面滑動且從緊貼 大,保持片剝離步驟,係邊使蓋表面從緊貝占面突 使之滑動。 W於t發明之半導體晶粒拾取方法,定位步驟,可使所 之"導體晶粒之-端之方向—致於沿蓋之―端之方 2 ’保持片制離步驟,係從所拾取之半導體晶粒之一端側 2另一端側使蓋滑動而依序打開吸附開π,從所拾取之半 t體晶粒之—端側依序吸引保持片於已開啟之吸引開口而 仗所彳°取之半導體晶粒依序剝離保持片。 本發明係於半導體晶粒拾取裝置,可在保持片之剝離 P揮抑制加於半導體⑼之力量並容易拾取 的效果。 【實施方式】 以下’參照圖式說明本發明合適之實施形態。於說明 本發明之半導體晶粒拾取萝 姑a 取凌置之則,先說明晶圓與晶圓保 符具。 如圖 1所示,晶圓 1 1 μ μ > 圓11係於背面黏貼有黏著性保持片 #2’保持片12係安袭於金屬製環13。晶圓η係如上述在 透過保持片12安裝於金屬製環13之狀態下被操作。並且, 圖2所不’晶圓U於切斷步驟從表面側被切片鋸等切 斷成為各半導㈣15。於各半導體晶粒15之間形成切 13 200913085 斷時所產生之切入門险,/ 間隙14。切入間隙M之 體晶粒15達至保持片12之一 /又係從半導 切斷,各半導體日 刀,但保持片12尚 干导體日曰幻5仍受保持片12保持。 娘 如上述,安裝有保持片12與環 如圖3所示,被安裝於晶圓保持具1〇。曰^伴體^且粒15, 具備··具有凸緣部之圓環狀擴張環i 呆持具】。’ 張環!6之凸緣上之環厂堅件17。環厂堅件於擴 環塵件驅動部於播張環16之凸緣進退之=由未圖示之 環16之内徑係大於配置有半導體晶粒15^=。擦張 張壞16具備既定之厚度,凸 :曰:’擴 裝於從保持片離開之太而+山 擴浪衣b之外側’安 茫产丨^ 向之鸲面側而向外側突出。又, 二之保持片側外周為曲面構 / =張“時,能使保持…濟J:待又?安 保持具10係構成為可藉由未圖示 曰曰圓 驅動部沿保持片12之面方向移動。51呆持/、水平方向 固定貼有半導體晶粒15之保持片U於 '、衣之刖係呈大致平面狀態。 圖4 =係f示半導體晶粒拾取裝置1⑼之構成的圖,又 導體持…半導體晶…心 下降至環 0之狀恶。在該狀態下,環壓件17 因擴張環16上’而於與擴張環16之凸緣之間炎住環13。 段差,觸於保持片12的上面與凸緣面之間具有 上部之曲*壓於凸緣面時,保持4 12沿擴張環16 面延伸擴張環16上面與凸緣面之段差之量。因 14 200913085 此,於固定在擴張環]6上之保 朝向周圍之拉力。 、, 產生從保持片中心 又’由於該拉力便伴拄 黏點於保持片】2上之半 更保持Θ 12延伸’故 於m s 導體曰曰叔15間的間隙放大。 、曰函保持具10安裝有用以使晶 面移動的水平方向 ”沿保持片之 丄^ P 2 °水平方向驅動邱79 n 口,猎由設置於内部之馬達與歯 可為例 平方向驅動者,亦_p — 圓保持具】0於水 f 圓保持具10沿導件《馬4錢動源使晶 T丨卞% χγ方向移動者。 μ上部設有用以吸附移動半導體 於曰曰®保持具 18具備用以吸附半導 ’之同夾18。筒夾 等體日日粒15之吸附孔19於 吸附孔連接於真空裳置71。又拉及附面,各 設置載台20,載台20藉由未圓示之載台^呆持具10下側 構對保持…其於上下方向(即進退方向):動方向驅動機 如圖5所不,恭a。Λ曰 , D 八備··圓筒形之框體21,於立 上面具有用以緊貼保持# 12之緊貼面22;基體部24,、: i. 置於與框體21之緊貼面22相反側;及驅動 基體部24,驅動安舯μ 女裝於 之基號部24安Λ未圖之Γ部之連桿機構。載台20 表於未圖不之載台固定部。於载台20之緊 設有開口41,該開口41係從載台2〇内部朝向外 」=狀地延伸,與欲拾取之半導體晶粒15形成大致同 見又,且其長度較所拾取之半導體晶粒15長。於開口 41 :入設有長方形板之蓋23,使其表面形成為與緊…2 致同面’且構成為蓋23能沿開口 41之延伸方向滑動。 又’因蓋23嵌入於開口 41,故與開口 41大致同—寬度, 15 200913085 Γ 且與欲拾取之半導體晶粒15之寬度大致同一寬度。人 蓋23之長度係較欲拾取之半導體晶粒15長。只要開口 係於緊貼面22形成為與欲拾取之半導體晶粒15大致同一 寬度’亦可於内料置段I,於該段差部分設置連通載台 2〇之狹缝。蓋23之側面咖與開口之側面川構成滑動 面。於該蓋23之側面23b與開口之側面仙之間設有密 封構件65,用以限制從開口 41之載台外側向⑽沿滑動 面^之空氣。密封構件65設置於載台Μ之外側,使其 设差盖· 2 3之側面23h傲 '、開口之側面41b間的間隙,且藉 :密封壓…裝於載台20使密封構件65之外側被; 盖。如圖5所示’密封構件65係被設為前端較蓋Μ之底 面朝緊貼面向上突出,♦签 处 田盍23在載台20之外側滑動時, 月匕被盖23壓縮以防止空氣 人載台2。内。密封構件底面與側面^間進 構件65可由例如橡膠等彈性材料構成。 如圖4所示,於葙厶 、载σ 20之内部,設有用以 動之滑動機構。滑動梏捲技山 ^ 葬…… 由以下構件構成:第1連桿26, 错由文t於載台 基體邛24的驅動部25使1對緊 面22於進退方向驄釭· τ a 從八3了冢貼 軀動,L字形之第2連桿29, 框體21之銷28旋6 1 L 、,堯口疋於 Μ之-端,進入第 安裝;銷27,安裝於第2連桿 貼…MM”之==體21 ’平行於緊 地安裝於導執31 .魅 向,β件32,滑動自如 2連桿29之另一端之V入0’安裝於滑件32 ’進入設置於第 之卡合槽29a且使滑件32與第2連桿29 16 200913085 卡合;及鎖33,將蓋23安以滑件 接於真空裝置71,,框體21連 且犯使其内部為真空。 能使第1連桿2ό對緊貼而? ° 只要 、占面22進退動作,任 例如,可組合小形@ 4 ^ 饪何構成均可, 由電磁力使第i連桿26吉蛀^ 弟1連才干26,亦可藉 ❻26直接於上下方向移動。 參照圖4,今aH n , 相滑動機構之動作。藉 弟1連桿26向緊貼 1 2 5使 之卡人# % m 方向珂進時,第1連桿26 之卡26a同樣向緊貼面22上升 才干26 上升後位於卡人描0 、 虽卡合槽26a '卡。才曰26a中之銷27亦與 升。銷27上升眸肚士 μ 槽26a —起上 上幵時裝有銷27之第2連桿 21之銷28為中心^ π 心29以固定於框體 乃Τ〜紋轉,使設置於第 合槽29a朝内# a 唣抨29另—端之卡 朝向裁台20外側(開口 41之 由第2連桿2Q夕上& 伸方向)移動。藉 才干29之卡合槽29a之移動 銷30亦朝仓# △ 、下〇槽29a中之 朝。載台20之外側方向移動 滑件32沿邋畆。, 咁方、在有銷30之 導軌31移動,當銷3〇往載A 滑件32亦^4戟^ 20外側移動時, 丌Ik之沿導軌31朝向载台2〇 貼面22移叙,A 之外側大致平行緊 連桿29之於轅° 5槽心$ U字形之形狀,能吸收第2 -之滑件二產生之卡合槽W的移動方向,及裝有銷 所造成的救^ 的栘動方向之方向差 移動1差。並且,滑件32沿導 面22移動a士未 執31平行於緊貼 勒~ ’透過銷30安裝於滑件32之芸 一起沿導鲇1 i 23與滑件32 等執31平行於緊貼面22朝向載台 打開笔h 、外1則移動’ ^ 。在關閉蓋23時藉由驅動部25 #笸】、击α 往從腎目i t 從弟1連桿26 、面22離開之方向下降,第2連桿29、滑件32朝 17 200913085 向與前述之動作相反的方向動作,蓋 向内側移動”1 ^ 20之外側 如上述,滑動機構因將第丨連桿26 22於進退方^ 動作(向緊貼面 件U對緊貼面 字形之第2連桿29轉換為使滑 型,移動之方向的動作’故能構成為小 匕將/、機構收納於圓筒形狀之框體2ι内部。 々® 4所不’半導體晶粒拾取裝1 100,具備將c 寻匕含於内部之電腦的控制部70,分別連接有 真空奘菩 ^ 運接有驅動部25、 " 、同夹1 8及晶圓保持具水平方向驅動部72 一動部25, 72、筒夾18、真空裝置7 出之指令驅動。又,於圖4, “控制部70所輸 與驅動部25 72、二:係表示連接控制部7。 ,2同夾18、真空裝置71之信 圖不之載台上下方向驅動機構亦連接於控制部川 控制部70之指令進行載台之上下方向驅動。 ’曰 接著’參照圖6至圖10說明藉由半導體晶粒 攸保持片U拾取半導體晶粒15之動作。對' 圖5所說明之部分使用同樣之符號而省略說明。… 如圖6⑷所示,控制部7〇開始定位步驟 :由圖4所示之晶圓保持具水平方向驅動部。’ 、10於水+方向移動至载台20之等待 控制部70,在晶圓保持具i 。並且, 上之既定位U m 載台2〇之等待位置 “之既疋位置後,先停止晶圓保持具1〇 罝 藉由未圖示之載a上下古& 向移動’ △ 口上下方向驅動機構使载台2〇 σ2〇之緊貼面22盥芸2]夕主二跃 上升至載 —23之表面緊貼於保持片12下面。 18 200913085 在…之緊貼面22與蓋23之表面緊貼於保 面後,控制部70停止载台2〇 下 $ —丄 开然後’控制部70, 再度猎由晶圓保持具水平方向 10之水平方〜* 調整日日日圓保持具 1U之水十方向位置吏 丁八The semiconductor die pick-up device of the present invention is driven in the lower direction of the semiconductor chip pick-up device. The upper holder of the stage moves to the holding sheet in the advancing and retracting direction, and the holding piece of the crystal is adhered to the semiconductor die to hold the sheet.疋When the wafer is held along the body of the wafer,! Α ^ *moving, in picking up the semi-conductive piece, the direction of the swaying mechanism is used to make the surface of the cover close to the surface of the cover of the semiconductor device from the closing of the suction opening In order to avoid the device being mounted on the m semiconductor die, the method of picking up the semiconductor die == the method of picking up the semiconductor die of the holding piece, the picking device is to hold the holding piece of the body grain. 3The surface is tightly attached to the opposite side of the surface of the semiconductor die with the semi-conductive tape picked up by the sticker = the cover 2 is placed on the close surface, which is larger than the half-closed suction opening of the pick-up; and: , the surface of the surface slides along the abutting surface, and opens to the right. & and the same clip, adsorbs and holds the semiconductor crystal; characterized in that the step = 'steps' to make the surface of the cover adhere to the holding piece so that the picked-up is away Step: crystal π:: 'closes the surface of the cover of the closed opening; and keeps the strip stripped with the clip to pick up the semiconductor die picked up, so that 12 200913085 sequentially opens the attracting opening' so that the holding piece is sequentially attracted to the opened 4-port and from the semiconductor die picked up Prepared from the holding piece. Ming's semiconductor die picking method can also be used to mount the semiconductor die 2 cover on the stage, so that it slides along the close surface and is close to the large surface, and the film peeling step is maintained, and the cover surface is closed from the tight The face suddenly makes it slide. W in the invention of the semiconductor die picking method, the positioning step, the direction of the "the end of the conductor die - so as to maintain the sheet separation step along the "end 2" side of the cover, from the pick One end side of the semiconductor die 2 and the other end side slide the cover to sequentially open the adsorption opening π, and sequentially suck the holding piece from the end side of the picked-up half-body die to the opened suction opening. The semiconductor crystal grains are sequentially peeled off from the holding sheets. The present invention is applied to a semiconductor die pick-up device which can suppress the force applied to the semiconductor (9) and easily pick up at the peeling of the holding sheet. [Embodiment] Hereinafter, a preferred embodiment of the present invention will be described with reference to the drawings. In the description of the semiconductor die pick-up of the present invention, the wafer and wafer conformer will be described first. As shown in Fig. 1, the wafer 1 1 μ μ > the circle 11 is adhered to the back side with an adhesive holding sheet #2'. The holding sheet 12 is attached to the metal ring 13. The wafer η is operated in a state where the holding sheet 12 is attached to the metal ring 13 as described above. Further, in Fig. 2, the wafer U is cut by the dicing saw or the like from the surface side in the cutting step to become each of the semiconductors (four) 15. Between each semiconductor die 15 is formed a cut-off risk, / gap 14, which is generated when the cut 13 200913085 is broken. The body grains 15 cut into the gap M reach one of the holding sheets 12 and are cut off from the semiconductor, and the semiconductor wafers are held, but the holding sheets 12 are still held by the holding sheets 12. As described above, the holding piece 12 and the ring are attached as shown in Fig. 3, and are mounted on the wafer holder 1''.曰^ Companion body and particle 15, which has an annular expansion ring i with a flange portion. 』 Zhang Huan! The ring factory member 17 on the flange of 6. The ring member is advanced and retracted at the flange of the broadcast ring 16 in the diffuser driving portion = the inner diameter of the ring 16 not shown is larger than the semiconductor die 15 ==. The wiped sheet 16 has a predetermined thickness and is convex: 曰: 'expanded to the side away from the retaining piece and + the side of the mountain-expanded wave b', the 安 茫 丨 向 向 向 向 向 向 向 向 向 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 Further, when the outer circumference of the holding sheet is a curved surface structure = "sheet", it is possible to maintain the surface of the holding sheet 10 by the circular driving portion (not shown). The direction is moved. 51 Hold/, the holding piece U of the semiconductor die 15 is fixed in the horizontal direction, and the lining of the clothing is substantially planar. Fig. 4 is a diagram showing the configuration of the semiconductor die picking device 1 (9). Further, the conductor holds the semiconductor crystal, and the heart drops to the ring 0. In this state, the ring member 17 inflames the ring 13 between the flange of the expansion ring 16 and the flange of the expansion ring 16. When the upper portion of the retaining piece 12 and the flange face have an upper portion of the flange surface, the retaining portion 4 extends along the surface of the expanding ring 16 to extend the difference between the upper surface of the expanding ring 16 and the flange surface. Since 14 200913085 , the tension on the expansion ring is fixed on the expansion ring]6, and is generated from the center of the holding piece and 'because the tension is accompanied by the adhesive point on the holding piece】 2 half of the holding Θ 12 extension 'so the ms conductor 曰The gap between the 15 uncles is enlarged. The 保持 letter holder 10 is installed to move the crystal plane. In the horizontal direction, drive the Qiu 79 n port along the horizontal direction of the holding piece ^ P 2 °, and the motor and the cymbal set by the inside can be driven by the flat direction, also _p - round holder] 0 in water f circle Hold the holder 10 along the guide "Ma 4 money source to make the crystal T丨卞% χ γ direction move. The upper portion of the μ is provided for adsorbing the mobile semiconductor, and the holder 18 is provided with the same clip 18 for adsorbing the semiconductor. The suction hole 19 of the colloidal day and the granule 15 is connected to the vacuum skirt 71 at the adsorption hole. Pulling and attaching the surface, each setting stage 20, the stage 20 is held by the lower side of the stage, the lower side of the holding table 10 is held in the up and down direction (ie, the direction of advance and retreat): the driving direction of the moving machine is as shown in the figure 5 no, Gong A. Λ曰, D 八备·· The cylindrical frame 21 has a tight surface 22 for adhering to the holding surface 12 on the upper surface; the base portion 24,: i. is placed in close contact with the frame 21 The opposite side of the face 22; and the driving base portion 24, drives the link mechanism of the armor portion 24 of the armored portion. The stage 20 is shown in a stage fixing portion not shown. An opening 41 is formed in the stage 20, and the opening 41 extends from the inside of the stage 2 toward the outside, and is substantially the same as the semiconductor die 15 to be picked up, and the length thereof is higher than that picked up. The semiconductor die 15 is long. In the opening 41, a cover 23 having a rectangular plate is formed so that the surface thereof is formed to be in the same direction as the second surface, and the cover 23 is slidable in the extending direction of the opening 41. Further, since the cover 23 is embedded in the opening 41, it is substantially the same width as the opening 41, 15 200913085 且 and has substantially the same width as the width of the semiconductor die 15 to be picked up. The length of the cover 23 is longer than the semiconductor die 15 to be picked up. As long as the opening is formed on the abutting surface 22 so as to be substantially the same width as the semiconductor die 15 to be picked up, it may be disposed in the inner material section I, and a slit that connects the stage 2 is provided in the step portion. The side surface of the lid 23 and the side surface of the opening constitute a sliding surface. A sealing member 65 is provided between the side surface 23b of the cover 23 and the side surface of the opening for restricting the air from the outside of the stage of the opening 41 to the sliding surface of (10). The sealing member 65 is disposed on the outer side of the stage sill so as to set a gap between the side surface 23h of the differential cover 233 and the side surface 41b of the opening, and is attached to the stage 20 to the outside of the sealing member 65 by a sealing pressure. Be covered; As shown in FIG. 5, the 'sealing member 65 is set to have a front end that protrudes toward the bottom surface from the bottom surface of the cover. When the signage field 23 slides on the outer side of the stage 20, the moon is compressed by the cover 23 to prevent air. Man loading station 2. Inside. The bottom surface of the sealing member and the side surface member 65 may be made of an elastic material such as rubber. As shown in Fig. 4, inside the σ and σ 20, a sliding mechanism for moving is provided. The sliding structure is composed of the following members: the first link 26 is offset from the driving portion 25 of the carrier base 24, and the pair of pressing faces 22 are in the advancing and retracting direction 骢釭·τ a from eight 3 冢 躯 躯 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , ,贴...MM"==body 21' is mounted parallel to the guide 31. Charm, β-piece 32, sliding freely 2 the other end of the link 29 V into 0' is mounted on the slider 32' The first engaging groove 29a engages the slider 32 with the second link 29 16 200913085; and the lock 33 connects the cover 23 to the vacuum device 71 by a slider, and the frame 21 is connected and the interior thereof is Vacuum. The first link 2 can be brought into close contact with each other. ° As long as the surface 22 moves forward and backward, for example, it can be combined with a small form of @4^, and it can be composed of electromagnetic force to make the i-th link 26 Brother 1 can only work 26, and can also move directly in the up and down direction by means of ❻26. Referring to Figure 4, the current aH n , the action of the phase sliding mechanism. By the brother 1 link 26 to the close 1 2 5 to make the card # % m direction When entering, the first link 26 The card 26a also rises to the close surface 22, and then rises and is located at the card holder 0, although the engagement groove 26a' is stuck. The pin 27 in the 26a is also raised with the pin 27. The pin 27 rises and the belly μ slot 26a The pin 28 of the second link 21 of the upper upper 幵 fashion has a pin 27 as the center ^ π the heart 29 is fixed to the frame, and is placed in the first groove 29a inward. # a 唣抨29 The card moves toward the outside of the cutting table 20 (the opening of the opening 41 is moved by the second link 2Q & the extension direction). The moving pin 30 of the engaging groove 29a of the lever 29 is also facing the magazine # △ and the lower jaw 29a. The slider 32 is moved along the outer side of the stage 20, and the side is moved by the guide 31 of the pin 30. When the pin 3 is moved outside the carrier A slider 32, 丌Ik along the guide rail 31 is oriented toward the stage 2 〇 veneer 22, and the outer side of A is substantially parallel to the shape of the 连杆° 5 groove center U-shaped, and can absorb the card generated by the second-side slider 2 The direction of movement of the groove W and the direction of the swaying direction of the rescue caused by the pin are shifted by 1 difference. Moreover, the slider 32 moves along the guide surface 22 and is not parallel to the tightness. Pin 30 amps Between the sliders 32, the guides 1 i 23 and the sliders 32 and the like 31 are parallel to the abutment surface 22 to open the pen h toward the stage, and the outer 1 moves '^. When the cover 23 is closed, the drive unit 25 is closed. #笸], αα goes to the kidneys, and the second link 29 and the slider 32 descend in the direction in which the face 22 and the face 22 are separated, and the second link 29 and the slider 32 move in the opposite direction to the above-described operation in the direction of the above-mentioned operation, and the cover is turned inward. The outer side of the movement "1 ^ 20 is as described above, and the sliding mechanism moves the second link 29 close to the face shape to the sliding type by moving the second link 26 22 in the forward and backward directions. In the direction of the movement, it is possible to configure the mechanism to be housed inside the cylindrical casing 2i. 々® 4 does not have a 'semiconductor die pick-up device 1 100, and has a control unit 70 for searching for a computer contained inside c, respectively connected to a vacuum 奘 ^ 运 运 运 运 运 驱动 驱动 驱动 驱动 驱动 驱动 驱动 驱动 驱动 驱动 驱动 驱动 驱动And the wafer holder horizontal direction driving unit 72 is driven by the driving portions 25, 72, the collet 18, and the vacuum device 7. Further, in Fig. 4, "the control unit 70 is connected to the drive unit 2572, the second system is connected to the control unit 7. The second clamp 18 and the vacuum device 71 are connected to the upper and lower direction drive mechanisms. The command of the control unit control unit 70 drives the stage up and down. The operation of picking up the semiconductor die 15 by the semiconductor die 攸 holding sheet U will be described with reference to Figs. 6 to 10 . The same reference numerals will be used for the same parts, and the description will be omitted. As shown in Fig. 6 (4), the control unit 7 starts the positioning step of the wafer holder horizontal direction driving unit shown in Fig. 4. ', 10 moves in the water + direction to the load. The waiting control unit 70 of the stage 20 stops the wafer holder 1 after the wafer holder i is positioned and the position of the waiting position of the U m stage 2 is positioned. The display of the upper and lower ancient & moving to the '△ mouth up and down direction drive mechanism to make the table 2 〇 〇 2 〇 of the close surface 22 盥芸 2] 主 main two jump up to the surface of the carrier 23 close to the holding piece 12 below. 18 200913085 After the surface of the close surface 22 and the cover 23 are in close contact with the surface, the control unit 70 stops the loading of the stage 2, and then the control unit 70, and then hunts the horizontal direction of the wafer holder 10 Horizontal side ~* Adjust the day and day to keep the 1U water ten direction position

u 3之載台内側端面23a —玆A 欲拾取之半導體晶粒15之_端⑸ 致於 粒15之側面一致於宴以夕彳丨 調正使+導體晶 蚁於盍23之側面23b。因 欲拾取之半導體曰钮7 ς 寬度係與 千V體曰曰拉15大致同_寬度,故若使 面23b —致於半導體晶 側 粒15之兩側面…3之雨“ 便能進行半導體晶 Η ,… 側面咖之定位。此時,保持 猎由晶圓保持具10之擴張環16承受拉力又 蓋U位於關閉開口 41之位置,故蓋 拉f又,因 位於接艏-„ 之載口内側端面23a 、 在開口 41之載台内側端面4U的位置,玄# Μ位於初期位置,即,較……的位置,检封構件 仅興孤23之底面同一 面往上突出的位置。 向緊貼 圖6(b)係載台20之緊貼面22盥莫u ::將載置於其上之保…、半導體晶粒二的= 明瞭的圖,6⑻為要區別大致 、又之丰導體日日粒15與蓋23,將蓋 半導體晶粒Η。圖7⑻至圖10(b)亦同盖23圖不為稍大於 如圖6(b)所示,因半導體晶粒Η與蓋 相同,故半導體晶粒〗5 見度大致 ^ 細Da位於愈芸μ > 側端面23a —致的仿罢,. ^ 之載台内 致之位置又側面位於與蓋23之兩側面⑽-置。又’因開口 41與蓋23之滑動 導體晶粒15,故半u 月動方向長度大於半 “體“立15之另-端…位於载置在 19 200913085 蓋23上之位置。在裁台20前 貼及半導體晶粒15之定位結束後,二=…、緊 驟。接耆,控制部70使筒夾18 ①成定位步 曰曰 粒15上,啟動真空…,使吸附面之之半導❸ 將欲拾取之半導辦曰 及附孔19為真空, V體日日粒〗5吸附保持於該位置。 如圖7 $ _ 1 λ 圖1 〇所示,控制部70開始 如圖7所示,# '、、片剝離步驟。 _ μι 制部7〇藉由真空裳置71使載a 20 體21内部為直办 η— Κ戰〇20之框 -、二。因藉由密封手段限 面23b進入,从_ , W工乳〜盍23之側 文可保持良好真空狀態。接著 藉由驅動部25佶笙,± 接者控制部70 〇使弟1連桿%向緊貼 連桿29往载△ 2 一 刖進,使第2 構-中的:二:移動。位於第2連桿29之卡合 連接於鎖心往㈣移動,透過銷Μ 風23則向載台2〇之外側開啟。 如圖7所示,芸2 3、、典叙你+. 從開"…: 蓋23之載台内側端面^ 载口内側端面41a脫離,開口 41 與欲拾取之半導體曰 欠而形成 因P 2n 致同—寬度的開口開部42。 口之框體21 N部藉由真空裝置71成為真空狀離 故開口開部42將徂姓μ ,, 態 、… 將保持片12吸引於其内。又,密封構件65 被蓋23壓縮,夷仕芸 傅什65 土住盍23與開口 41間之間隙 從載台02之外伽&向如士 々此工乳 J向内側、机入。因此,框體21内部 度保持為高。蕻ά中πΚ t 〜具工 猎由此及引,保持片12變形為於進入開口 開部42内部之方向& 向下方凸出。結果,此變形使保持 從半導體晶粒1 5之一# ! ς ^ 15a側開始剝離。保持片1 導體晶粒15之一媸μ /0, & 疋牛 而15a側剝離後,空氣從半導體晶粒15 20 200913085 與保持片1 2間因保持片剝離而產生之的間隙5 }進入,於 保持片U之+導體晶粒15側與真空之開口開部42之内 部側之間產生壓力差,使保持片12更進一步被吸引向真 空狀態之開口開部42内。然後,空氣進入與蓋Μ之載台 :端面23a大致平行之剝離線53,保持片η則從半導 月豆日日粒15之—端15a側剝離至剝離線53。另一方面,因 半導體晶粒15係受筒夾18吸附保持,故其位置不會變化。 41 :::所示,控制部7〇之指令使蓋23進-步往開口 二置方向即载台外側滑動後,蓋23之載台内側端面 越:亦往載台2°之外側移動,開口開部42隨之 開口開;42°二外側越變大。接著,伴隨蓋23之滑動,於 .^ . 持片12依序被吸引,使保持片12被拉 向,、内部而從半導體晶粒15剝離。 23之滑動依序往載台2。之外側移動。之後,V:隨蓋 被剝離之保持片 之後開口開部42 開口開部42内祐疋P使將保持片12吸引於 仍朝向保持片V吏開口開部42被保持片12覆蓋,因蓋23 會停止對保持片^離之::分滑動,故開口開… 於開口開部42而4之吸引’此使保持片12全體依序吸引 如圖9而剝離,不會產生未剝離部分。 步_,1=’_部7()藉由驅動部25使蓋23更進一 ^之另—端=移動至載台内側端面…超過半導體晶粒 亦被吸引向開口二位置。結果,另一端…之保持片12 空氣從另15内而從半導體晶粒15剝離,亦有 b側進入半導體晶粒15與保持片12之間, 21 200913085 使半導體晶粒15完全從保持片12剝離。 接著,蓋23之狡^ 已不再變化,故保持H ^由㈣口開部42之大小 開口開部42,成為π 12覆盍蓋23停止狀態時所形成之 空氣之狀態。”’、從該狀態下之開口開部42周邊吸引 如圖10所示,加ί 晶粒15提升,移動將藉由筒夹18吸附之半導體 體2i與真空襄置”步驟。接著’控制部7〇遮斷框 氣塵。結果保持片12=:而使框體21之内部恢復為大 2藉由朝向周圍之拉力 控制部-藉由驅動部25使第i連桿26下面= 桿、29往載台内側移動,使蓋23成為關閉狀態。在連 成為關閉狀悲後,至此始終被蓋23壓住之宓封構7 由其彈性力返回初期狀態。 之在封構件“藉 如上述,在本實施形態中’因使蓋23從半導體 之一端侧朝向另-端侧滑動,依序”保持片12 :門5 開部42内,以進行保持片12之剝離 門:’ 口 被吸引向開口開部-内之保持片覆蓋,由於二K 42 保持片12尚未剝離之部分滑動,因 乃月向 體依序:開口開…㈣,發揮能 片12王體之剝離的效果。 ’、持 又,早位時間内所剝離之保持片 線Μ之長度乘上每單位時間之蓋23之移之動面旦積係專於制離 之剝離所需之力量小於將半導體晶粒Μ之:持片12 離時所需之力量,故可發揮能減低卩77次制 于月12之剝離時加 22 200913085 於半導體晶粒1 5之力量的效果。 再者,本實施形態,因蓋23之表面係與緊貼面22大 致同一面,故使蓋23滑動時不會碰到鄰接之半導體晶粒 15,能避免蓋23之滑動造成半導體晶粒Μ損傷,故即使 於周圍存在鄰接之半導體晶粒1 5之情形,亦可發揮能容 易拾取半導體晶粒1 5的效果。 又,於本實施形態,雖說明開口 41與蓋23之寬度與 欲拾取之半導體晶粒1 5大致相同,但亦可構成為使開口 4 i 與蓋23之寬度較欲拾取之半導體晶粒15之寬度大。在此 情形,因保持片12亦從半導體晶粒15之側面侧被吸引向 開口開部42内,故能更有效果地進行保持片12往開口開 部42之吸引及從欲拾取之半導體晶粒15之剝離。再者, 本實施形態,雖說明定位為使蓋23之載台内側端面2“ 一 致於欲拾取之半導體晶粒15之一端15a,但只要欲拾取之 :導體晶粒15位於不從蓋23之表面突出的位置,亦可使 盍23之載台内側端面23&之方向與欲拾取之半導體晶粒μ 之一端15a方向為-致,且使欲拾取之半導體晶粒Η之一 端15a定位於較蓋23之载台内側端面23a之開口 41之 伸方向,即亦蓋23之滑動方向。在此情形,在蓋Μ滑動 而形成開口開部42後,欲拾取之半導體晶粒15之―p 與相鄰半導體晶粒之間的保持片12被吸弓丨向.& 内。因此,於半導體晶粒15之一端15a,保持片i2° 2 角度被拉向斜下方向,故能更順利地開始剝離保持片 23 200913085 苑形態,由於 動機構對保持片12僅於進退方 冑由載台上下方向軀 對水平方向(沿保持片12之方向、。進仃上下移動’未具備 水平方向之背隙等,對沿保持^移動機構,故無機構對 良好。並且,因所>取之车道 之方向的位置安定性 U所屯取之+導體晶粒 12之面之方向的定位係藉由晶圓保持且二 保持片 進行,故水平方向之定位時载’/L、水平方向驅動部72 發揮於載台2。之蓋23與黏貼二:;之片…向位置穩定, 定位時減低移位產生的效果。 '片2之+導體晶粒15 又,本實施形態,可藉由控 片12剝離時加於半導體 =滑動速度將保持 …例如,於薄且強度低之半導;:4力量配合半導體晶粒 蓋23之滑動速户缕樨& * _日日粒Μ之情形,可使 離力: 減低單位時間所剝離之量,少剝 離力,或使開口開部42之吸 夕剝 a ^ 力減父,以減低加於半導 一 15之力量並容易剝離保持片。又,於厚且強2 之半導體晶粒之情形,可使罢 、子強度大 單位時間剝離之面積加大,;之滑動速度加快,以使 A 縮紐剝離時間。在此情形,亦 可構成為具備厚度感測器等| 之半導體晶粒〜厚声,手段’以檢測所拾取 、一 Μ將§亥厚度資料輸出至控制部70, 亚根據該厚度檢測手段測得之半導體晶粒15的厚度使, 之滑動速度變化。在此情形 ι 對半導體晶粒15厚度關係圖二動速度亦可根據滑動速度 度關係圖(儲存於控制部7〇内部之記憶 二)決疋。又,若驅動冑25藉由馬達等驅動之情形,控制 ㈣可藉由使馬達之旋轉數變化而使蓋23之滑動速度變 24 200913085 化二若驅動部25藉由電磁力進行第1…之進退動作 ?情形:可使電磁力脈衝變化,藉由變化該脈衝之間隔使 第1 26之進退速度變化’以變化蓋23之滑動速度。 參照圖η,說明本發明之另_實施㈣H 至圖ίο說明之實施形態同樣之部分,使用同樣之符: =。本實施形態’係於蓋23之載台内側端面= 二:之開口 41延伸方向之各側面23b間的角部設有缺 口 61者。如圖⑽所示,藉由該缺口 61,若以蓋 開”為關閉狀態’使载台之緊貼面22 盍二使 緊貼於保持片12,使蓋23之載二 ^ 之表面 拾取之半導體晶粒15之—端⑸口來Γ h 一致於所 内部之缺口孔63位於欲捭取丄3疋位,則貫通框體21 側之各角部正下方 取之半導體晶粒15之—端… 並且,藉由控制部70啓動真空震置 為真空後,即使蓋23_㈣ ^體以内部 ^接觸於開口〇之載台内側端面41a之端面 口孔63吸弓丨位於半導體晶粒 乃會攸缺 "’首先剝離該角之部分。1後,:先:之角的保持 形態同樣,使蓋23朝向開口 4 4與先别所說明之實施 動,從半導體晶粒15之—端15 =,:向之载台外側滑 本實施形態,除先前所:離保…。 因瓦先從半導體 〜之效果外加上, …2虚半導…之角之部分剝離保持片U,於仵 後,佐15之間形成使空氣進入之料"“ ]離保持片12’故能以蓋23之滑動順利地進』 25 200913085 保持片1 2之剝離’發揮較先前所說明之實施形態容易進 4亍保持片1 2之剝離的效果。 又,於本貫施形態說明,設置缺口於蓋23而即使蓋μ 在關閉狀態下亦能進行制離半導體晶粒15之角部分的保 持片12 ’但亦可於開口 41之載台内側端面與側面的角部 分設置向開口 41之外側突出且貫通緊貼面22的孔。藉由 如此構成,即使蓋23係關閉狀態,亦能吸引半導體晶粒15 ( 之角。Ρ而首先從半導體晶粒15之角之部分剝離保持片12 後’依序剝離保持片12。 參照圖12說明本發明之另一實施形態。與參照圖丄至 圖H兄明之實施形態同樣之部分,使用同樣之符號而省 略5兒明。本實施形態,係於導軌23 1 t緊貼面側設置傾斜 之凸輪面271。導軌231之緊貼面側面,具備:沿蓋23之 '月動方向(開口 41之延伸方向)向緊貼面22往斜上方傾斜 ^凸輪面271 ;及連續於該凸輪面271往蓋23之滑動方向 (:平行於緊貼面延伸之平行面272。又,滑件232於與導軌 231接觸之面具備曲面273(接觸凸輪面271而滑動)。又, 於開口 41周邊之緊貼面22設有吸引孔64。 參照圖13、圖14說明本實施形態之動作。於本實施 ^ 蓋23係朝向半導體晶粒15已被拾取,而於保持片 12上未載置半導體晶粒1 5之方向滑動。此時,若位於甚 23之移動範圍内之半導體晶粒1 5已被拾取,蓋23之移動 乾圍外之半導體晶粒15可不必被拾取。如圖13所示,藉 由控制部7〇之指令使驅動部25動作,在第2連桿29向 26 200913085 載台外側移動後’滑件232之曲面273會抵 之凸輪面2”。接著,蓋23進一步滑動後 1 :273沿導軌231之凸輪…緊貼面22逐漸往 方上升。結果’透過銷33安裝於滑件叫之蓋& 二卜側移動打開開口形成開口 „ 42,同時從 載 大出’欲拾取之半導體晶粒15跟隨蓋23之突出從伴持片 :二面:升。另一方面,於鄰接於所拾取之半導體晶粒15 X導體(位於蓋23之滑動方向)下方設有吸引孔64,該 4刀之保持片【2係藉由吸引孔64吸引於緊貼面η。 因密封構件6 5接觸於莫2 3夕产 〜 觸於1 23之底面以遮斷空氣進入框 ,故框體21保持真空狀態,藉由蓋23之滑動打開之 —開部42吸引保持片12而從半導體晶粒Μ剝離。此 …猎由蓋23之上升使半導體晶粒15浮起,因鄰接於開 口“之部分的保持片12藉由吸引孔64固定於緊貼面& 導體晶粒15之一端15a側之保持片12往斜下被拉向 緊貼面22。藉由該往斜下方之拉力與保持片^往開口開 部42内部之吸引’保持片12從半導體晶粒15剝離。接 者’如圖u所示,第2連桿29進一步向載台外移動後, π件232 ^全登上凸輪面271,沿連續於凸輪自⑺之平 行面272,平行於緊貼面22移動。在此情形,因平行面較 :輪面271更靠近緊貼面22,故蓋23在較圖13所示之狀 悲更加從緊貼面22突出後,平行於緊貼面22滑動。並且, 蓋23之載台内側端面23a來至超越半導體晶粒15之另— 端1讣之位置後’剝離另一端15b側之半導體晶粒15,半 27 200913085 導體晶粒1 5則完全從保持片12剝離 22突出並向栽台外 端15a之保持片12 片12之拉力,發揮 本實施形態,因使盍2 3從緊貼面 側滑動,故於剝離半導體晶粒1 5之— 時能使用開口開部42之吸引力與保持 能更容易剝離保持片12之效果。 fThe inner end face 23a of the stage of the u 3 is the end (5) of the semiconductor die 15 to be picked up. The side of the grain 15 is aligned with the side of the granule 15 so that the + conductor crystal ant is on the side 23b of the 盍23. Since the semiconductor button 7 ς width to be picked up is approximately the same as the width of the thousand V body pull 15 , if the face 23b is caused by the rain on both sides of the semiconductor crystal side grain 15 ... 3, the semiconductor crystal can be performed. Η ,... The positioning of the side coffee. At this time, the hunting ring is held by the expansion ring 16 of the wafer holder 10 and the cover U is located at the closing opening 41, so the cover f is again, because the carrier is located at the junction The inner end surface 23a and the position of the inner side end surface 4U of the opening 41 of the opening 41 are located at the initial position, that is, at a position closer to the position where the sealing member protrudes from the same surface as the bottom surface of the singular 23. Fig. 6(b) is a close-fitting surface 22 of the stage 20, which is placed on the surface of the substrate 20, and the semiconductor die 2 is shown in Fig. 6 (8). The day grain 15 and the lid 23 will cover the semiconductor die. 7(8) to 10(b) are also slightly larger than the cover 23, as shown in Fig. 6(b). Since the semiconductor die is the same as the cover, the semiconductor die is substantially fine. μ > The side end face 23a is in the same manner, and the position in the stage is located on both sides (10) of the cover 23. Further, since the conductor die 15 is slid by the opening 41 and the cover 23, the length of the semi-u lunar direction is larger than half. The other end of the body 15 is located at the position of the cover 23 of 19 200913085. After the positioning of the cutting table 20 and the positioning of the semiconductor die 15 are completed, the second=..., the tightening. Then, the control unit 70 causes the collet 18 1 to be positioned on the step 15 to start the vacuum, so that the semi-conducting portion of the adsorption surface is to vacuum the half-guided and attached holes 19 to be picked up, V body day The daily particle 5 adsorption is maintained at this position. As shown in Fig. 7 $ _ 1 λ Fig. 1 ,, the control unit 70 starts the sheet peeling step as shown in Fig. 7 . _ μι 〇 7 〇 真空 真空 真空 真空 真空 真空 真空 真空 真空 真空 真空 真空 真空 真空 真空 真空 真空 真空 真空 真空 真空 真空 真空 真空 真空 真空 真空 真空 真空 真空 真空 真空 真空 真空Since the restriction surface 23b is entered by the sealing means, the side of the _, W-milk-盍23 can maintain a good vacuum state. Then, by the driving unit 25, the ± control unit 70 causes the first link % to move closer to the link 29, and the second to the second is moved. The engagement of the second link 29 is connected to the lock core to move to (4), and the pin wind 23 is opened to the outside of the stage 2〇. As shown in Fig. 7, 芸2 3, 典述你+. From the opening "...: the inner side surface of the cover 23 is detached from the inner end surface 41a of the carrier, and the opening 41 is formed by the semiconductor to be picked up. 2n is the same-width opening 42. The N portion of the frame 21 of the mouth is vacuumed by the vacuum device 71. The opening portion 42 attracts the holding piece 12 to the inside of the opening portion 42. Further, the sealing member 65 is compressed by the cover 23, and the gap between the 盍23 and the opening 41 is immersed from the outside of the stage 02 to the inner side of the yoke. Therefore, the inside of the casing 21 is kept high. The Κ Κ 具 具 具 具 具 具 具 具 具 具 具 保持 保持 保持 保持 保持 保持 保持 保持 保持 保持 保持 保持 保持 保持 保持 保持 保持 保持 保持 保持 保持 保持 保持As a result, this deformation causes the peeling to proceed from the side of one of the semiconductor crystal grains 15 to #! ς ^ 15a. Holding one of the conductor dies 15 of the sheet 1 媸μ /0, & 疋 疋 and the 15a side is peeled off, the air enters from the gap between the semiconductor die 15 20 200913085 and the holding piece 12 due to the peeling of the holding piece 5 } A pressure difference is generated between the + conductor die 15 side of the holding piece U and the inner side of the vacuum opening portion 42, so that the holding piece 12 is further attracted into the opening portion 42 of the vacuum state. Then, the air enters the peeling line 53 substantially parallel to the end surface 23a of the lid, and the holding sheet n is peeled off from the side 15a side of the semi-conductive moon granule 15 to the peeling line 53. On the other hand, since the semiconductor die 15 is adsorbed and held by the collet 18, its position does not change. 41::: The command of the control unit 7〇 causes the cover 23 to slide in the direction of the opening, that is, the outside of the stage, and the inner end surface of the stage of the cover 23 moves to the outside of the stage 2°. The opening portion 42 is then opened; the outer side of 42° becomes larger. Then, with the sliding of the cover 23, the holding pieces 12 are sequentially sucked, and the holding piece 12 is pulled, and the inside is peeled off from the semiconductor die 15. Slide 23 to the stage 2 in sequence. Move outside. After that, V: the opening portion 42 after the cover is peeled off, the opening portion 42 is opened in the opening portion 42 so that the holding piece 12 is attracted to the holding piece V. The opening portion 42 is covered by the holding piece 12, because the cover 23 The sliding of the holding piece is stopped: the opening is opened, so that the opening is opened in the opening portion 42 and the attraction of the opening portion 42 is caused to be peeled off as shown in Fig. 9 in order, and no unpeeled portion is generated. Step_, 1 = '_ portion 7 () by the driving portion 25 to make the cover 23 further into the other end = moving to the inner end surface of the stage ... beyond the semiconductor die is also attracted to the opening two positions. As a result, the other end of the holding piece 12 air is peeled from the other 15 from the semiconductor die 15, and the b side enters between the semiconductor die 15 and the holding piece 12, 21 200913085 makes the semiconductor die 15 completely from the holding piece 12 Stripped. Then, since the 23^ of the cover 23 is no longer changed, the opening portion 42 is opened by the size of the (4) opening portion 42, and the state of the air formed when the π 12 cover lid 23 is stopped is maintained. The suction from the periphery of the opening portion 42 in this state is as shown in Fig. 10, and the film 15 is lifted up, and the semiconductor body 2i and the vacuum are sucked by the collet 18 are moved. Then, the control unit 7 〇 blocks the air dust. As a result, the holding piece 12 =: and the inside of the frame body 21 is restored to the large 2 by the tension control portion toward the periphery - the lower portion of the i-th link 26 is moved to the inside of the stage by the driving portion 25, so that the cover is made 23 becomes the closed state. After the connection is closed, the enclosure 7 is always pressed by the cover 23 and returned to its initial state by its elastic force. In the sealing member, as described above, in the present embodiment, the lid 23 is sequentially slid from the one end side of the semiconductor toward the other end side, and the sheet 12 is held in the opening portion 42 of the door 5 to carry out the holding sheet 12. The peeling door: 'The mouth is attracted to the opening part of the opening--the cover piece is covered, because the part of the two K 42 retaining piece 12 has not been peeled off, because the moon is in the direction of the body: the opening is open... (4), the play piece 12 king body The effect of peeling. ', hold again, the length of the strip that is stripped in the early time multiplied by the movement of the cover 23 per unit time is less than the force required to peel off the semiconductor. It is the force required to hold the film 12 off, so it can reduce the power of the semiconductor film 15 by reducing the thickness of the film. Further, in the present embodiment, since the surface of the cover 23 is substantially flush with the contact surface 22, the adjacent semiconductor die 15 is not caught when the cover 23 is slid, and the sliding of the cover 23 can be prevented to cause the semiconductor die. Since the damage occurs, even in the case where adjacent semiconductor crystal grains 15 are present in the periphery, the effect of easily picking up the semiconductor crystal grains 15 can be exhibited. Further, in the present embodiment, the width of the opening 41 and the cover 23 is substantially the same as the width of the semiconductor die 15 to be picked up, but the width of the opening 4 i and the cover 23 may be made larger than the width of the cover 23 to be picked up. The width is large. In this case, since the holding piece 12 is also attracted from the side surface side of the semiconductor die 15 into the opening opening portion 42, the suction of the holding piece 12 toward the opening opening portion 42 and the semiconductor crystal to be picked up can be more effectively performed. Peeling of the granules 15. Furthermore, in this embodiment, it is described that the inner end surface 2 of the stage 23 of the cover 23 is "consistent with one end 15a of the semiconductor die 15 to be picked up, but as long as it is to be picked up: the conductor die 15 is located not from the cover 23. The protruding position of the surface may also be such that the direction of the inner end surface 23& of the yoke 23 is opposite to the direction of the one end 15a of the semiconductor die μ to be picked up, and the one end 15a of the semiconductor die to be picked is positioned at The direction in which the opening 41 of the inner side end surface 23a of the cover 23 extends is the sliding direction of the cover 23. In this case, after the cover is slid to form the opening portion 42, the semiconductor die 15 to be picked up The holding piece 12 between the adjacent semiconductor crystal grains is sucked toward the inside of the semiconductor die 15. Therefore, at one end 15a of the semiconductor die 15, the angle of the holding piece i2° 2 is pulled obliquely downward, so that the smoothing can be performed more smoothly Starting to peel off the holding piece 23 200913085, the moving mechanism is only for the advancement and retraction of the holding piece 12 from the up and down direction of the stage to the horizontal direction (in the direction of the holding piece 12, moving up and down) does not have a horizontal back Gap, etc. Therefore, the mechanism is not good, and the position in the direction of the surface of the +-conductor die 12 taken by the positional stability U in the direction of the lane is maintained by the wafer and the two holding pieces are performed. When the positioning in the horizontal direction is carried, the horizontal drive unit 72 is applied to the stage 2. The cover 23 and the adhesive sheet 2 are stable in position, and the effect of displacement is reduced during positioning. In the present embodiment, the conductor die 15 can be applied to the semiconductor when the control piece 12 is peeled off. The sliding speed will be maintained, for example, in a thin and low-intensity semi-conducting; 4 force-matching sliding speed of the semiconductor die cover 23缕樨 缕樨 & * _ day granules, can make the force: reduce the amount of peeling per unit time, less peeling force, or make the opening of the opening 42 to reduce the force of the force to reduce the father, to reduce The strength of the semi-conductive one 15 is easy to peel off the holding piece. Moreover, in the case of the thick and strong semiconductor crystal grain, the area of the peeling and the strength of the large unit time can be increased, and the sliding speed is increased, so that A shrinkage time, in this case, can also be configured to have thickness a semiconductor die ~ thick sound of the detector, etc., means 'to pick up the pick, and to output the thickness data to the control unit 70, the thickness of the semiconductor die 15 measured according to the thickness detecting means The sliding speed changes. In this case, the thickness of the semiconductor die 15 can also be determined according to the sliding speed relationship diagram (memory stored in the control unit 7). In the case of driving the motor or the like, the control (4) can change the sliding speed of the cover 23 by changing the number of rotations of the motor. 24 200913085. If the driving unit 25 performs the first... advance and retreat by the electromagnetic force? The force pulse changes by changing the interval of the pulses to change the advance and retreat speed of the first 26' to change the sliding speed of the cover 23. Referring to Figure η, the same part of the embodiment of the present invention will be described using the same symbol: =. In the present embodiment, the inner end surface of the stage of the cover 23 is replaced by a notch 61 at a corner between each side surface 23b in the direction in which the opening 41 of the opening 41 is extended. As shown in (10), by the notch 61, when the cover is "closed", the contact surface 22 of the stage is brought into close contact with the holding piece 12, so that the surface of the cover 23 is picked up. The end of the semiconductor die 15 is connected to the end of the semiconductor die 15 directly below the corners of the frame 21 side. Further, after the control unit 70 activates the vacuum to be vacuumed, even if the cover 23_(4) body is in contact with the end face opening 63 of the opening inner side end surface 41a of the opening 〇, the suction hole is located at the semiconductor die. " 'First peel the part of the corner. After 1 : first: the angle of the retaining form is the same, so that the cover 23 is directed toward the opening 4 4 and the implementation described above, from the end 15 of the semiconductor die 15 = : The embodiment of the slide on the outside of the stage, except for the previous one: the disintegration... Invar first from the effect of the semiconductor ~, the part of the corner of the ... 2 virtual semi-conducting ... peeled off the holding piece U, after the ,, 佐Between 15, the air entering the material "" is kept away from the holding piece 12' so that the sliding of the cover 23 can be smoothly performed Into "25200913085 holding the release sheet 12 'to play the previously described embodiment the holding piece easily into the right foot 4 of the peeling effect than 12. Further, in the present embodiment, the notch is provided on the cover 23, and the holding piece 12' which can be separated from the corner portion of the semiconductor die 15 can be formed even if the cover μ is in the closed state, but the inner end surface of the stage of the opening 41 can also be provided. The corner portion of the side surface is provided with a hole that protrudes toward the outer side of the opening 41 and penetrates the abutting surface 22. With such a configuration, even if the lid 23 is in the closed state, the semiconductor crystal grains 15 can be attracted (at the same angle. First, the holding sheet 12 is peeled off from the corners of the semiconductor crystal grains 15), and the holding sheets 12 are sequentially peeled off. In the same manner as in the embodiment of the present invention, the same reference numerals will be used, and the same reference numerals are used to omit the description. The present embodiment is provided on the side of the guide rail 23 1 t. The inclined cam surface 271. The side surface of the guide surface 231 of the close surface of the guide rail 231 is provided to be inclined along the 'monthly direction of the cover 23 (the direction in which the opening 41 extends) toward the close surface 22 obliquely upward; the cam surface 271; and continuous to the cam The surface 271 is in the sliding direction of the cover 23 (the parallel surface 272 extending parallel to the abutting surface. Further, the slider 232 has a curved surface 273 (sliding contact with the cam surface 271) on the surface in contact with the guide rail 231. Further, the opening 41 The peripheral contact surface 22 is provided with a suction hole 64. The operation of this embodiment will be described with reference to Figs. 13 and 14. In the present embodiment, the cover 23 is picked up toward the semiconductor die 15 and is not placed on the holding piece 12. The direction of the semiconductor crystal grains 1 5 slides. At this time, The semiconductor die 15 located in the range of movement of 23 is picked up, and the semiconductor die 15 outside the moving periphery of the cover 23 does not have to be picked up. As shown in Fig. 13, the drive is driven by the command of the control unit 7 The portion 25 operates, and after the second link 29 moves to the outside of the stage of the 200913085, the curved surface 273 of the slider 232 will abut against the cam surface 2". Then, the cover 23 is further slid and the cam of the guide 231 is tightened by 1:273. The veneer 22 is gradually raised upwards. As a result, the transmissive pin 33 is attached to the slider called the cover & the second side moves to open the opening to form an opening „42, and at the same time, the semiconductor die 15 to be picked up is followed by the cover 23 The protruding piece is protruded from the supporting piece: two sides: liter. On the other hand, a suction hole 64 is provided below the X-conductor (located in the sliding direction of the cover 23) of the semiconductor die 15 to be picked up, and the holding blade of the 4-blade [2] The suction body 64 is attracted to the contact surface η. Since the sealing member 65 is in contact with the bottom surface of the film 23 to block the air entering the frame, the frame body 21 is kept in a vacuum state by the cover. The sliding opening of the opening portion 42 attracts the holding piece 12 to be peeled off from the semiconductor die. The hunting of the semiconductor die 15 is caused by the rise of the cover 23, and the holding piece 12 adjacent to the opening "is fixed to the holding surface 12 of the close surface & one end 15a side of the conductor die 15 by the suction hole 64. It is pulled obliquely downward toward the abutting surface 22. The pulling force of the holding piece 12 is peeled off from the semiconductor die 15 by the pulling force obliquely downward and the holding piece to the inside of the opening opening portion 42. The connector is as shown in Fig. After the second link 29 is further moved outside the stage, the π member 232 is fully mounted on the cam surface 271, and moves parallel to the contact surface 22 along the parallel surface 272 continuous from the cam (7). In this case, since the parallel faces are closer to the abutting faces 22 than the treads 271, the cover 23 slides parallel to the abutting faces 22 after projecting more closely from the abutting faces 22 than the one shown in Fig. 13. Moreover, the inner side end surface 23a of the cover 23 reaches the position beyond the other end 1 of the semiconductor die 15, and then the semiconductor die 15 on the other end 15b side is peeled off, and the semi-27 200913085 conductor die 15 is completely maintained. When the sheet 12 is peeled off and the tension of the sheet 12 is raised to the outer end 15a of the table, the present embodiment is used, and since the 盍2 3 is slid from the side of the contact surface, the semiconductor wafer 15 can be peeled off. The use of the opening and opening 42 of the opening portion 42 makes it easier to peel off the holding sheet 12. f

於上述之本實 雖5兄听滑件232係具備曲面 273(於導軌231之緊貼面側面抵接於凸輪面271且使滑件 232沿凸輪面271移動)’但依凸輪面271之傾斜角度多=, 亦可將接觸於凸輪面271之滾子安裝於滑件232。又夕 又,於本實施形態,雖說明藉由導軌231之設置於緊 貼面側面的凸輪面271與平行面272使蓋23往斜上方突 出後平行於緊貼面22滑動’但導軌231之緊貼面侧面只 要能使蓋23從緊貼面22突出並滑動, 可如圖15所示’於導轨231之緊貼面 任何形狀均可, 側面形成從載台 亦 内 侧沿開口 41延伸之方向向緊貼面上升的斜面。 參照圖16至圖17說明本發明之另一實施形態。與參 ‘、、、圖1至圖15 s兒明之實施形態同樣之部分,使用同樣之 符號而省略說明。 如圖1 6(b)所示’本實施形態係與參照圖*說明之實施 形恶同樣’於載台20之内部設有使蓋23滑動之滑動機構。 滑$機構係由以下構件構成:第1連桿326,藉由安裝於 載台20之基體部24之驅動部25對緊貼面於進退方向 被驅動’活塞3 70 ’滑動自如地安裝於載台之框體21, 對緊貼面22進退;停止器321 a,設置於框體2丨之内部, 28 200913085 /、活塞370之凸緣371卡合,以限制活塞37〇對緊貼面a 之進退方向的動作;彈簧373,於對緊貝占面22進退之方向 連接第^連桿326與活塞37〇;導執331,安裝於活塞37〇, 大致平行於緊貼面22且延料開口 41之延伸方向;滑件 332,連接有蓋23,滑動自如地安裝於導軌331;及第2 連桿329,藉由鎖328旋轉自如地安裝於活塞η。 滑件332盥第! i卓浐μα . 運接 ”弟連# 326,當活塞370抵接於停止器32u 時’將第1連桿3 2 6對^'目i: η。 a. 對緊貼面22之進退方向的動作轉換 為滑件3 3 2沿導勤311 > t * ¥軌 之方向的動作。X,框體21係連 接於圖4所示之真空襄置71,能使内部真空。 弟2連桿329,係藉由設置於-端之銷327進入第! 連桿似之卡合槽326a,且設置於另—端之卡合槽伽 央住料332之銷33G,連接滑件332與第丨連桿326。 於驅動部2 5之内部,安梦右 女裝有用以使滑動機構動作之馬達 ,於馬達381之旋轉軸安農有 觸於設在第i連捍326之細^輪383 ’該凸輪383接 件26之軸326b前端的滾子326c。 圖16(a)係表示緊貼面22 ,m . 141之角部的俯視圖。 如圖l6(a)所示,本實施形態,於 4 1/日丨二1 , 、開 41之載台内側端面 41a ”側面41b之角部設有向 ^ 4丄之外側突出且貫通緊 貼面22之吸引孔364。該 ^ 引孔364即使在蓋23關閉之 狀悲下,亦與框體21之内部連通。 其次’說明本實施形能之私於 #朝&车1 _曰 〜、動作。於本實施形態,蓋23 ¥體曰曰粒15已被拾取而於保持片12上未載置半 導體晶粒15之方向滑動 *彳月12上未載置+ 此時’若位於蓋23之移動範圍 29 200913085 内之半導ns# . 曰曰y、 5已被拾取,蓋23之移動範圍外之半導 體晶粒15可兀v ; 丨心干导 '、破尨取。與先前參照圖ό說明之實施形 態同樣,控制邱7η μ ^ + 4 70開始疋位步驟’調整晶圓保持具1 〇之 水平方向之位置,店掌 、 使| 23之載台内側面23a位於一致於 欲拾取之半導體晶 、 導體晶粒15之側面一…端⑸之位置’並且調整使半 面致於蓋23之侧面23b。接著,定# 步驟結束後,如圖16所 接者-位 於一致於蓋23之载么内側面^日日粒15之—端…位 …側面23,==之位置,側面為-致於蓋 於載置在蓋23上之2 體晶粒15之另—端…位 如二7_至圖18所示,控制部7〇開始保持片剥離步驟。 所不’控制部70藉由圖4所示之真空裝置71你 載台20之框體21内部為真处 " 使 動部25使第litr 32;二接者’控制部7〇,藉由驅 …連杯326向緊貼面22前進。以下 驅動部25驅動滑動機構之動作。 。 浐八"I 17二不,驅動部25之馬達381根據控制部70之 疋轉’女裝於馬達381之軸之凸輪383會旋轉。凸輪 383係楕圓形狀,且凸輪面 兩 軸_前端之裝^1連桿似之 383之凸輪面會使滾子326c朝;上凸輪 罐軸〜…連桿全體向緊 體/升後’藉由彈簧Μ連接於緊貼面22側 :升連桿推上’活塞370全體向緊… 升。活基Μ全體向緊貼面22上升後,安裳於緊貼面22 30 200913085 側之導軌33i亦與活塞37〇—起向緊貼面^上升。導執如 上升後’安裝為沿導軌331之上面滑動之滑件M2亦向緊 貼面22上升。接著,連接於滑件阳之蓋23,與滑件332 之上升同蚪,使其表面從緊貼面22向上方突出。 由於彈簧373具有不因將蓋23從緊貼面22推上之力 量而彎曲之強度,故即使蓋23從緊貼面22被推上,活塞 370與第1連桿326間之距離亦幾乎不會變化。因此,第 !連桿之上升僅使蓋23從緊貼面22突出,而不會滑動。 =表面從緊貼面突出後’蓋23將欲拾取之半導 m日日粒15向上雜。+7* 41 m 另一方面’於開口 41之载台内側端面 4 1 a與側面4 1 b之备立β抓· 士 ·π ;1丨 引孔364’位於欲拾取之半導 ^ 之女而15a附近的保持片12被吸引固定於緊貼 曰 口此藉由盍23之上升,黏貼於欲拾取之半導體 :粒15之保持片12向斜下方被拉向緊貼面22,該斜下方 向之拉力使半導體晶粒1 5之一 之鳊15a與保持片12之間產 生間隙。接著’空氣進入該間隙,上述 與框體21之真允的厭<租刀及工乳 /二的壓力差使保持片12開始從半導體晶粒 —山之—端⑸剝離。保持片12係進人從半導體晶粒μ k 1 5a稍微往滑動方向進人處的剝離線^。 然後’猎由控制部7〇使馬達351更加旋轉,藉由與馬 ^ 一起旋轉之凸輪383使第1連桿326與活塞37〇往緊貼 22方向更加上升後’突出於活塞”。外面之凸緣爪 二面會撞擊設置於框體21之停止器32u。結果活塞37〇 …321“無法對緊貼面22繼續前進,蓋23從緊貼 31 200913085 面22之突出亦停止。 如圖1 8所示,凸輪383進一步旋轉,而使第i連桿326 向緊貼面22推上後,位於不能向緊貼面22移動之活塞37〇 與第1連桿326間的彈簧373藉由馬達381與凸輪383開 始在對緊貼面22之進退方向被壓縮。彈菁⑺被壓縮後, 活塞3 7 0不對緊貼而9 、、 2刖進,而僅使第1連桿326對緊 貼面22前進。因此’活塞37〇之銷328不對緊貼面22上 升:僅位於第1連桿326之卡合槽326a内之第2連桿329 ㈣3Ί緊貼面22之方向上升。結果’第2連桿奶 以銷3 2 8為中心開於絲轴 疋轉。该旋轉動作使第2連桿329另 一端之卡合槽329a向載a 7n + AL , 人 戟口 20之外側移動,固定有位於卡 ^曰%内之鎖33G之滑件332與連接於滑件3 向載台20之外侧移動。 息23 蓋23移動後’蓋23之载台内侧面 台内側面4la離開,開 41之载 曰朴Η 士站 開啟而形成與欲拾取之半導體 日日粒15大致同—寬度的開 (午導體 之内部係藉由真空裝 ;載台2〇之框體 部U吸引保持片12於其内。^為真空㈣,故開口開 口開部42向载台2〇之外倒逐 "23之滑動開 之滑動保持…序吸心開口開:二,伴隨蓋23 被吸入於其内部而從半導體晶粒 ,保持片12 伴隨蓋23之滑動依序往载台 ]離。又’剝離線53 開部42被剝離之保持片—之外側移動。接著,開口 吸引於開口開部4 盍但疋,即使將保持片12 使開口開部42被保持片12覆蓋, 32 200913085 因盍23朝向保持片12尚未剝離之部分滑動,故開 42對保持片12之吸引不會停止,能使保持片12全體依序 吸引於開口開部42而剝離,不產生未剝離部分。 再者,凸輪383旋轉後,藉由凸輪383之旋轉使第i 連桿26更被推上,蓋23則與圖丨4所說明者同樣,蓋Μ 之載台内側面23a滑動至較欲拾取之半導體晶粒1 5之另— 鈿15b靠近載台2〇的外侧,❿半導體晶粒15藉 拾取。 >然後,凸輪383更進一步旋轉後,此次藉由凸輪383 之%轉使第1連桿326之軸326b下降,隨之,蓋23關閉 至载^内伽! * 23a接觸於開〇 41之载台内側面4u的位 置。結果,彈簧373之壓縮力被開放。之後,&輪383更 步旋轉,軸326b下降後,活塞370及第i連桿326、 弟2連桿329 —起下降,蓋23之表面下降至與緊貼面22 之表面大致同一位置而恢復初期位置。 曰本μ施形悲係藉由蓋23之滑動機構將欲拾取之半導體 触粒1 5推上,藉由保持片丨2之向下拉力於欲拾取之半導 體晶&粒15之一端15a產生保持片12剝離之開端後,使蓋 〜π動,以吸引保持片丨2於開口開部42,故可發揮能更 容易地剝離保持片12之效果。 【圖式簡單說明】 圖1係表示黏貼於保持片之晶圓的說明圖。 圖2係表示黏貼於保持片之半導體晶粒的說明圖。 圖3係表示晶圓保持具之構成的說明圖。 33 200913085 圖4係表不本發明實施形態之半導體晶粒拾取裝置之 構成的說明圖。 圖5係表不本發明實施形態之半導體晶粒拾取裝置之 載台的立體圖。 圖6係表示本發明實施形態之半導體晶粒拾取裝置之 蓋開始滑動前之狀態的說明圖。 圖7係表示本發明實施形態之半導體晶粒拾取裝置之 蓋開始滑動後之狀態的說明圖。 圖8係表示本發明實施形態之半導體晶粒拾取裝置之 蓋持續滑動之狀態的說明圖。 圖9係表不本發明實施形態之半導體晶粒拾取裝置之 蓋結束滑動後之狀態的說明圖。 圖10係表示本發明實施形態之半導體晶粒拾取裝置之 同夾拾取半導體晶粒,蓋恢復至關閉位置之狀態的說明 圖。 圖11係表示本發明另一實施形態之半導體晶粒拾取褒 置之構成的說明圖。 圖1 2係表示本發明另一實施形態之半導體晶粒拾取農 置之構成的說明圖。 圖1 3係表示本發明另一實施形態之半導體晶粒拾取裴 置之盘開始滑動後之狀態的說明圖。 圖1 4係表示本發明另一實施形態之半導體晶粒拾取裝 置之盖結束滑動後之狀態的說明圖。 圖1 5係表示本發明另一實施形態之半導體晶粒拾取裝 34 200913085 置之構成的說明圖。 圖1 6係表示本發明另一實施形態之半導體晶粒拾取裝 置之構成的說明圖。 圖1 7係表示本發明另一實施形態之半導體晶粒拾取裝 置之蓋之突出動作的說明圖。 圖1 8係表示本發明另一實施形態之半導體晶粒拾取裝 置之蓋之滑動動作的說明圖。 【主要元件符號說明】 I 0 :晶圓保持具 II ·晶圓 12 :保持片 13 :環 1 4 :切入間隙 1 5 :半導體晶粒 1 5 a : —端 15b :另一端 1 6 :擴張環 1 7 :環壓件 18 :筒夾 1 9 :吸附孔 20 :載台 21 :框體 22 :緊貼面 23a ' 41a :載台内側端面 35 200913085 23 :蓋 23b :侧面 24 :基體部 2 5 :驅動部 26、 326 :第1連桿 26a、29a ' 326a、329a :卡合槽 27、 28、30、33、327、328、330 :銷' 29、329 :第2連桿 31、 231、331 :導軌 32、 232、332 :滑件 41 :開口 4 1 b :侧面 42 :開口開部 51 :間隙 53 :剝離線 61 :缺口 63 :缺口孔 64、364 :吸引孔 65 :密封構件 66 :密封壓件 70 :控制部 71 :真空裝置 7 2 ·晶圓保持具水平方向驅動部 100 :半導體晶粒拾取裝置 36 200913085 271 :凸輪面 272 :平行面 273 :曲面 321a :停止器 326b :轴 326c :滚子 3 70 :活塞 3 7 1 :凸緣 3 73 :彈簧 3 8 1 :馬達 383 :凸輪In the above, although the 5 brother listening slider 232 is provided with a curved surface 273 (the side of the abutting surface of the guide rail 231 abuts against the cam surface 271 and moves the slider 232 along the cam surface 271), but the inclination of the cam surface 271 If the angle is large, the roller contacting the cam surface 271 may be attached to the slider 232. Further, in the present embodiment, it is described that the cover 23 is protruded obliquely upward by the cam surface 271 and the parallel surface 272 provided on the side surface of the contact surface of the guide rail 231, and then slides parallel to the contact surface 22, but the guide rail 231 As long as the cover surface 23 can protrude and slide from the contact surface 22, it can be any shape on the contact surface of the guide rail 231 as shown in FIG. 15, and the side surface is formed to extend from the inside of the stage along the opening 41. The direction is the slope that rises close to the surface. Another embodiment of the present invention will be described with reference to Figs. 16 to 17 . The same reference numerals are used for the same parts as those of the embodiment of the present invention, and the description thereof will be omitted. As shown in Fig. 16 (b), the present embodiment is provided with a sliding mechanism for sliding the cover 23 inside the stage 20, similarly to the embodiment described with reference to Fig. The sliding mechanism is composed of a member in which the first link 326 is slidably attached to the driving surface 25 of the base portion 24 of the stage 20 and is slidably driven in the advancing and retracting direction. The frame 21 of the table advances and retreats to the abutting surface 22; the stopper 321a is disposed inside the frame 2, 28 200913085 /, the flange 371 of the piston 370 is engaged to restrict the piston 37 to the abutting surface a The action of the advancing and retracting direction; the spring 373 connects the second link 326 and the piston 37〇 in the direction of advancing and retreating the tight-fitting surface 22; the guide 331 is mounted on the piston 37〇, substantially parallel to the abutting surface 22 and extending The opening direction of the opening 41; the slider 332 is connected to the cover 23 and slidably attached to the guide rail 331; and the second link 329 is rotatably attached to the piston η by the lock 328. Slide 332 盥 first! i 浐 浐 μ α α 326 弟 弟 # , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , The action is converted into the action of the slider 3 3 2 along the direction of the guide 311 > t * ¥ rail. X, the frame 21 is connected to the vacuum device 71 shown in Fig. 4 to enable the internal vacuum. The rod 329 is inserted into the first connecting rod-like engaging groove 326a by the pin 327 disposed at the end, and is disposed at the pin 33G of the engaging groove gamma living material 332 at the other end, connecting the sliding member 332 and the first The connecting rod 326. Inside the driving portion 25, the motor for operating the sliding mechanism is applied to the rotating shaft of the motor 381, and the axe is attached to the thin wheel 383 provided in the i-th link 326. The roller 326c at the front end of the shaft 326b of the cam 383 connector 26. Fig. 16(a) is a plan view showing a corner portion of the abutting surface 22, m. 141. As shown in Fig. 16 (a), this embodiment At a corner portion of the side surface 41a of the stage inner surface 41a" of the opening 41 of the opening 41, the suction hole 364 which protrudes toward the outer side of the surface of the opening and penetrates the surface 22 is provided. The through hole 364 communicates with the inside of the frame 21 even if the cover 23 is closed. Next, the description of this embodiment can be made in the private direction of #向&车1_曰~, action. In the present embodiment, the cover 23 is detached from the body granule 15 and is slid in the direction in which the semiconductor die 15 is not placed on the holding piece 12 * 彳 12 is not placed + at this time 'If the movement is located at the cover 23 Scope 29 200913085 The semi-conducting ns#. 曰曰y, 5 have been picked up, and the semiconductor die 15 outside the moving range of the cover 23 can be 兀v; Similarly to the embodiment previously described with reference to Fig. ,, the control step 7η μ ^ + 4 70 starts the clamping step 'adjusting the position of the wafer holder 1 水平 in the horizontal direction, and the store side, the inner side 23a of the stage 23 is located Consistent with the semiconductor crystal to be picked up, the position of the side end (5) of the conductor die 15 is adjusted and the half face is adjusted to the side 23b of the cover 23. Then, after the end of the step #, as shown in Fig. 16 - is located in the same side of the cover 23, the inner side of the day, the end of the day, the end of the position, the side 23, the position of ==, the side is the cover The position of the other end of the two-body die 15 placed on the cover 23 is as shown in Fig. 7 to Fig. 18, and the control unit 7〇 starts to hold the sheet peeling step. The control unit 70 does not have the inside of the casing 21 of the stage 20 by the vacuum device 71 shown in FIG. 4, and the actuator 25 makes the first litr 32; the second receiver's control unit 7 Drive... the cup 326 is advanced toward the facing surface 22. The following drive unit 25 drives the operation of the slide mechanism. .浐8"I 17 No, the motor 381 of the drive unit 25 rotates according to the control unit 70. The cam 383 of the shaft of the motor 381 rotates. The cam 383 is in the shape of a circle, and the cam surface of the two sides of the cam surface _ the front end of the ^1 link like 383 cam surface will cause the roller 326c to face; the upper cam can shaft ~ ... the whole link to the tight body / rise after 'borrow It is connected to the side of the abutting surface 22 by a spring :: the rising link is pushed up and the whole of the piston 370 is tightened. After the entire living base is raised toward the close surface 22, the guide rail 33i on the side of the close surface 22 30 200913085 is also raised toward the close surface of the piston 37. When the guide is raised, the slider M2 mounted to slide along the upper surface of the guide rail 331 also rises toward the abutment surface 22. Next, the cover 23 attached to the slider is aligned with the rise of the slider 332, and the surface thereof protrudes upward from the contact surface 22. Since the spring 373 has a strength that is not bent by the force of pushing the cover 23 from the abutting surface 22, even if the cover 23 is pushed up from the abutting surface 22, the distance between the piston 370 and the first link 326 is hardly Will change. Therefore, the rise of the first link only causes the cover 23 to protrude from the abutting surface 22 without slipping. = The surface protrudes from the abutting surface. The cover 23 picks up the half-guided m-day grain 15 to be picked up. +7* 41 m On the other hand, 'the inner side end face 4 1 a of the stage of the opening 41 and the side surface 4 1 b are prepared by the β-grass· π; the 1 丨 pilot hole 364' is located at the female half of the guide The holding piece 12 near 15a is attracted and fixed to the mouthpiece by the rise of the cymbal 23, and is adhered to the semiconductor to be picked up: the holding piece 12 of the granule 15 is pulled obliquely downward toward the affixing surface 22, which is obliquely downward The pulling force in the direction causes a gap between the turns 15a of one of the semiconductor crystal grains 15 and the holding piece 12. Then, the air enters the gap, and the pressure difference between the above-mentioned frame 21 and the renting knife and the working milk/two causes the holding piece 12 to start to peel off from the semiconductor die-mountain end (5). The holding piece 12 is inserted into a peeling line which is slightly in the sliding direction from the semiconductor die μ k 1 5a. Then, the hunting unit 7 further rotates the motor 351, and the first link 326 and the piston 37 are further raised in the direction of the close contact 22 by the cam 383 rotating with the horse, and then protrude from the piston. The two sides of the flange claws collide with the stopper 32u provided in the frame 21. As a result, the pistons 37...321 "cannot continue to advance toward the abutment surface 22, and the projections of the cover 23 from the surface 31 of the 200913085 are also stopped. As shown in FIG. 18, the cam 383 is further rotated, and after the i-th link 326 is pushed up against the abutting surface 22, the spring 373 between the piston 37A and the first link 326 which cannot move toward the abutting surface 22 is located. The motor 381 and the cam 383 are initially compressed in the advancing and retracting direction of the abutting surface 22. After the elastic cyanine (7) is compressed, the piston 370 is prevented from coming into contact with each other, and the first link 326 is advanced to the abutting surface 22. Therefore, the pin 328 of the piston 37 is not lifted against the abutting surface 22: only the second link 329 (4) located in the engaging groove 326a of the first link 326 rises in the direction of the abutting surface 22. As a result, the second link milk was opened on the wire shaft with the pin 3 2 8 as the center. This rotation operation causes the engagement groove 329a at the other end of the second link 329 to move to the outside of the load port 7n + AL and the human mouth 20, and the slider 332 of the lock 33G located inside the card is fixed and connected to the slide. The piece 3 is moved to the outside of the stage 20. After the cover 23 is moved, the inner side surface 4la of the inner side of the stage of the cover 23 is separated, and the opening of the open platform is opened to form the same as the semiconductor day-to-day granule 15 to be picked up - the width of the opening (the afternoon conductor) The inside is vacuum-loaded; the frame portion U of the stage 2 is sucked into the holding piece 12 therein. ^ is a vacuum (4), so the opening opening portion 42 is slid out of the stage 2〇"23 The slide opening is maintained. The order opening is opened. Second, the cover 23 is sucked into the inside of the semiconductor die, and the holding piece 12 is sequentially moved toward the stage with the sliding of the cover 23. Further, the 'peel line 53 is opened. 42. The peeled holding piece is moved to the outside side. Then, the opening is attracted to the opening portion 4, but even if the holding piece 12 is made to cover the opening portion 42 by the holding piece 12, 32 200913085 because the 盍 23 is facing the holding piece 12 yet Since the peeling portion is slid, the suction of the pair of holding pieces 12 does not stop, and the entire holding piece 12 can be sequentially sucked by the opening portion 42 and peeled off, and the unpeeled portion is not generated. The rotation of the cam 383 causes the i-th link 26 to be pushed up, and the cover 23 is As explained in Fig. 4, the inner side surface 23a of the cover slid to the outer side of the semiconductor die 15 to be picked up, and the 钿15b is adjacent to the outer side of the stage 2, and the semiconductor die 15 is picked up. After the cam 383 is further rotated, the shaft 326b of the first link 326 is lowered by the % of the cam 383, and the cover 23 is closed to the carrier. * 23a contacts the opening of the opening 41 The position of the inner side surface 4u. As a result, the compression force of the spring 373 is opened. Thereafter, the & wheel 383 is further rotated, and after the shaft 326b is lowered, the piston 370 and the i-th link 326 and the second link 329 are lowered. The surface of the surface 23 is lowered to substantially the same position as the surface of the abutting surface 22, and the initial position is restored. The smear of the semiconductor is contacted by the sliding mechanism of the cover 23 by the sliding mechanism of the cover 23, by holding the sheet. When the one end 15a of the semiconductor crystal & granule 15 to be picked up is the end of the peeling of the holding piece 12, the cover is moved to the π to move the holding piece 2 to the opening portion 42. The effect of retaining the sheet 12 is more easily peeled off. [Simple description of the drawing] Fig. 1 shows the sticking 2 is an explanatory view showing a semiconductor die adhered to a holding piece. Fig. 3 is an explanatory view showing a configuration of a wafer holder. 33 200913085 FIG. 4 is an embodiment of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 5 is a perspective view showing a stage of a semiconductor die pick-up device according to an embodiment of the present invention. Fig. 6 is a view showing a cover of a semiconductor die pick-up device according to an embodiment of the present invention. (Explanation of the state before the sliding) Fig. 7 is an explanatory view showing a state in which the cover of the semiconductor die pick-up device according to the embodiment of the present invention starts to slide. Fig. 8 is an explanatory view showing a state in which the lid of the semiconductor chip pick-up device of the embodiment of the present invention continues to slide. Fig. 9 is an explanatory view showing a state in which the lid of the semiconductor chip pick-up device of the embodiment of the present invention is finished sliding. Fig. 10 is an explanatory view showing a state in which the semiconductor die is picked up by the semiconductor die pick-up device according to the embodiment of the present invention, and the cover is returned to the closed position. Figure 11 is an explanatory view showing the configuration of a semiconductor die pick-up device according to another embodiment of the present invention. Fig. 1 is an explanatory view showing a configuration of a semiconductor die picking farm according to another embodiment of the present invention. Fig. 1 is an explanatory view showing a state in which the disk of the semiconductor chip pickup device of the other embodiment of the present invention starts to slide. Fig. 14 is an explanatory view showing a state in which the lid of the semiconductor die pick-up device according to another embodiment of the present invention is finished sliding. Fig. 15 is an explanatory view showing a configuration of a semiconductor die attaching device 34 200913085 according to another embodiment of the present invention. Fig. 16 is an explanatory view showing the configuration of a semiconductor die pick-up device according to another embodiment of the present invention. Fig. 1 is an explanatory view showing a protruding operation of a cover of a semiconductor die pick-up device according to another embodiment of the present invention. Fig. 18 is an explanatory view showing a sliding operation of a cover of a semiconductor die pick-up device according to another embodiment of the present invention. [Description of main component symbols] I 0 : Wafer holder II · Wafer 12 : Holding sheet 13 : Ring 1 4 : Cutting gap 1 5 : Semiconductor crystal grain 1 5 a : - End 15b : Other end 1 6 : Expansion ring 1 7 : Ring press 18 : Collet 1 9 : Adsorption hole 20 : Stage 21 : Frame 22 : Adhering surface 23a ' 41a : Carrier inner end surface 35 200913085 23 : Cover 23b : Side 24 : Base portion 2 5 Drive unit 26, 326: first link 26a, 29a' 326a, 329a: engagement groove 27, 28, 30, 33, 327, 328, 330: pin '29, 329: second link 31, 231, 331: guide rails 32, 232, 332: slider 41: opening 4 1 b: side surface 42: opening opening portion 51: gap 53: peeling line 61: notch 63: notch hole 64, 364: suction hole 65: sealing member 66: Sealing press 70: control unit 71: vacuum device 7 2 • wafer holder horizontal direction driving unit 100: semiconductor die picking device 36 200913085 271: cam surface 272: parallel surface 273: curved surface 321a: stopper 326b: shaft 326c : Roller 3 70 : Piston 3 7 1 : Flange 3 73 : Spring 3 8 1 : Motor 383 : Cam

Claims (1)

200913085 十、申請專利範圍: 1 · 一種半導體晶粒拾取裝置,係將黏貼於保持片之半 導體晶粒以筒夾吸附保持而拾取,其特徵在於: 具備: 載台’含有與保持片之黏貼半導體晶粒之面相反側的 面緊貼之緊貼面; 及 吸引開口,δ又置於緊貼面,大於所拾取之半導體晶粒; 蓋,設置於載台使:a:表面vl賢目&、'典t 災,、衣甶緊貼面滑動,關閉吸引開 ^取半V體晶粒時,使蓋表面緊貼於保持片以使所 拾取之半導體晶粒不從關閉吸引開口之蓋表面突出,在以 筒夾吸附所拾取之半導髀曰私+也吨 粒之狀態下,使蓋滑動並依序 打開吸引開口,使保持片依序 π久〕丨π匕開啟之吸引開口, 而從所拾取之半導體晶粒依序剝離保持片。 2.如申請專利範圍第1 貝炙牛V體晶粒拾取裝置,並 中, 〃 出 蓋,係設置於載台,使其沿緊貼面滑動且從緊 貼面突 於拾取半導體晶粒時 緊貼面突出邊使蓋滑動。 3 _如申請專利範圍第 中, 邊使緊貼於保持片之蓋表面從 員之半導體晶粒拾取裝置,其 使所拾取 於拾取半導體晶粒時 之半導體晶粒之一端 38 200913085 之方向一致於沿蓋之一她 之知之方向,從所拾取之半導體曰 之一端側朝向另一端側佬某取 等體日日粒 麵側使盍π動而依序打開吸 所拾取之半導艚S私4 ^ Τ间口 仗 手導體日曰粒之一端侧依序吸引保持片於已開啟之 吸引開口,而從所於取夕主道麟日 σ之半涂體日日粒依序剝離保持片 4. 如申請專利範圍第i項至第3項中之任/丰 體晶粒拾取裝置,其中, 具 < 牛¥ 吸引開口係與所拾取之半導體晶粒大致同 載台内側向外側直線狀地延伸, ,又之 蓋係與開口之寬度大致同一寬度之長方形板。 5. 如申請專利範圍第4項之半導體晶粒拾取裝置,1 ψ , 八 蓋係於載台之内側端面與沿開口之延伸方向之側面之 間的角部具有缺口。 6·如申明專利範圍第1項至第3項中之任1項之半導 體晶粒拾取裝置,其中, 載台係於吸引開口周邊之緊貼面具備吸引孔, 於杧取半導體晶粒時,藉由吸引孔邊吸引所拾取之半 導體晶粒周邊的保持片邊使蓋滑動。 7.如申请專利範圍第4項之半導體晶粒拾取裝置,其 於蓋與吸引開口之滑動面設有用以限制空氣從載台外 側進入内側之密封機構。 8·如申請專利範圍第1項或第3項之半導體晶粒拾取 裝置,其 39 200913085 具備使蓋滑動之滑動機構, 滑動機構’係含有: 驅動部,安裝於位在與載台之緊貼面相反侧之基體部, 使設置於載台内部之第丨連桿於對緊貼面進退之方向驅 動; 導軌,設置於載台内部,大致平行於緊貼面且朝向吸 引開口之延伸方向延伸; 滑件,連接有蓋,可滑動地安裝於導軌; 及 苐2連桿’旋轉自如地容 女裝於載σ内部,將滑件與第 連桿連接,將第1連桿斜腎 為 干t緊貼面之進退方向的動作轉換 滑件沿導軌之方向的動作; 、 1連桿朝向 基體部, 之方向驅 於乜取半V體晶粒時,藉由以驅動部使第 緊貼面進退’使蓋沿緊貼面滑動。 項之半導體晶粒拾取 9.如申請專利範圍第2項或第 衣置,其具備使蓋滑動之滑動機構, 滑動機構,係含有: 驅動部’安裝於位在與載台之緊貼面相反々 ^置於載台㈣之第1連桿於對緊貼㈣ W], 活塞’設置於載台内部,對緊貼面進退; 停止器,設置於載台 方向的動作; 弹汽’將第1連桿與活塞連接於對緊貼面進退之方 内部,限制活塞對緊貼面之 進退 向, 200913085 當活塞抵接於停止器時被壓縮; 導軌,安裝於活塞,大致平行於緊貼面且朝向吸弓丨開 口之延伸方向延伸; 汗 滑件’連接有蓋,可滑動地安裝於導執; 及 第2連桿,旋轉自如地安裝於活塞,將滑件與第】連 桿連接,當活塞抵接於停止器時,將f丨連桿對緊貼面之 進退方向的動作轉換為滑件沿導軌之方向的動作; 於拾取半導體晶粒時,藉由以驅動部使第丨連桿朝向 緊貼面進退Μ吏蓋從緊貼面突出後,沿緊貼面滑動。 如申請專利範圍第2項或第3項之半導體晶板拾 取裝置,其具備使蓋滑動之滑動機構, 滑動機構,係含有: 驅動部,安裝於位在與載台之緊貼面相反側之基體部, 使設置於載台内部之第丨連桿於對緊貼面進 動; 冋驅 伸 導軌,設置於載台内部,朝向吸引開 具備向緊貼面傾斜之傾斜面; 之延伸方向延 滑件,連接有蓋 及 滑動自如地安裝於導執之傾斜面; 第 2連才干’可旋轉地安梦於哉 疋料·也文衣於載台内部,將滑件與第 連桿連接,將第1連桿對緊貼而夕、隹 势緊貼面之進退方向的動作轉換為 滑件沿導軌之傾斜面之方向的動作; 於拾取半導體晶粒時,葬由以挺知 猎由以驅動部使第1連桿朝向 41 200913085 緊貼面進出,使蓋邊從緊貼面 u·如申請專利範圍帛10 ^緊貼面滑動。 其中, 、半導體晶粒拾取骏置, 滑動機構之導軌之傾斜面,係. 面從載台内側沿吸引開口之延伸’、.凸輪面,於緊貼面側 平行面,連續於凸輪面,平行 向朝向緊貼面傾斜;及 延伸方向延伸; 、貼面且朝向吸引開口之 第2連桿,係具備曲面_ 侧面之凸輪面與平行面的形狀移動。用以沿導執之緊貼面 12·如申請專利範圍第丨項至 導體晶粒拾取裝置,其具備: 項中之任1項之半 載口上下方向驅動撼播 移動;及 载台對保持片於進退方向 晶圓保持具水平方向驅動 體晶粒之保持W定的晶圓料具;·^取之黏貼有半導 一於拾取半導體晶粒時,藉由載台::片面移動; 盖表面緊貼於保持片, 向驅動機構使 藉由晶圓保持具水卓 取之半導體晶粒從門 °驅動部進行定位,以免所拾 ”從關閉吸引開口之蓋表面突出。 13 · —種半導體晶粒 裝置拾取黏貼於保 :方法’係以半導體晶粒拾取 付月之+導體晶粒之方法, 該半導體晶粒拾取農置,係 有所拾取之半導體载口,含有與黏貼 曰曰粒之保持片之與黏貼有半導俨日衍之 面相反側的面緊貼之螫 另干導體日日粒之 緊貼面卜及引開。,設置於緊貼面, 42 200913085 大於所拾取之半導體晶粒;i,設置於載台使其表面沿緊 貼面滑動’且開關吸引開口 ;及筒夾,吸附保持半導體晶 粒; 其特徵在於,具有·· 定位步驟,使蓋表面緊貼於保持片以使所拾取之半導 體晶粒不從關閉吸引開口之蓋表面突出;及 保持片剝離步驟,在以筒夾吸附所拾取之半導體晶粒 之狀態下,使蓋滑動並依序打開吸引開口,使保持片依序 吸引於已開啟之吸引開口而從所拾取之半導體晶粒依序剝 離保持片。 14.如申請專利範圍第13項之半導體晶粒拾取方法, 其中, 半導體晶粒拾取裝置之蓋,係設置於載台,使其沿緊 貼面滑動且從緊貼面突出, 保持片剝離步驟,係使蓋表面邊從緊貼面突出邊使之 滑動。 15·如申請專利範圍第13項或第14項之半導體晶粒 拾取方法,其中, 定位步驟,係使所拾取之半導體晶粒之一端之方向— 致於沿蓋之一端之方向, 保持片剝離步驟,係從所拾取之半導體晶粒之一端側 朝向另-端側|蓋滑動而依序打開錢開。,從所拾取之 半導體晶粒之—端側依序吸引保持片於已開啟之吸引開口 而從所拾取之半導體晶粒依序剝離保持片。 43200913085 X. Patent application scope: 1 · A semiconductor die pick-up device picks up a semiconductor die adhered to a holding piece by suction and holding of a collet, and is characterized in that: the carrier includes a semiconductor attached to the holding piece The surface on the opposite side of the crystal grain is in close contact with the surface; and the suction opening, δ is placed on the close surface, larger than the semiconductor die picked up; the cover is placed on the stage so that: a: surface vl sage &;, '典典 disaster, the clothing 甶 sliding close to the surface, close the suction open to take the half V body grain, so that the cover surface is close to the holding piece so that the picked semiconductor die does not close the cover of the suction opening The surface is protruded, and the cover is slid and the suction opening is sequentially opened in a state in which the semi-conducted smear and the ton of the granules are picked up by the collet, so that the holding piece is sequentially π 丨 匕 匕 open the suction opening, The holding sheets are sequentially peeled off from the picked semiconductor grains. 2. For example, in the patent application, the 1st yak V body die picking device, and the cover is disposed on the stage so as to slide along the abutting surface and protrude from the close surface to pick up the semiconductor die Slide the cover against the protruding surface. 3 _ as in the scope of the patent application, the semiconductor chip pick-up device that is in close contact with the surface of the cover of the holding sheet, which is aligned with the direction of one end 38 200913085 of the semiconductor die picked up when picking up the semiconductor die In the direction of one of the covers, in the direction of her, from the end side of the semiconductor raft that is picked up to the other end side, the side of the grain surface of the day is taken to make the 盍 move and sequentially open the suctioned semi-guided S private 4 ^ One end side of the 导体 仗 导体 导体 导体 吸引 吸引 吸引 吸引 吸引 吸引 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一 之一The invention relates to any of the above-mentioned inventions, wherein the < 牛¥ attraction opening system and the picked semiconductor die extend substantially linearly with the inside of the stage toward the outside. , and the cover is a rectangular plate having a width equal to the width of the opening. 5. The semiconductor die pick-up device of claim 4, wherein the first cover is provided with a notch at a corner between the inner end surface of the stage and the side surface extending in the direction in which the opening extends. The semiconductor die pick-up device according to any one of the items 1 to 3, wherein the carrier has a suction hole on the contact surface around the suction opening, when the semiconductor die is taken. The cover is slid by attracting the edge of the semiconductor wafer around the picked-up semiconductor die. 7. The semiconductor die pick-up device of claim 4, wherein the sliding surface of the cover and the suction opening is provided with a sealing mechanism for restricting air from entering the inner side from the outer side of the stage. 8. The semiconductor die pick-up device of claim 1 or 3, wherein the 39 200913085 has a sliding mechanism for sliding the cover, and the sliding mechanism includes: a driving portion that is mounted in close proximity to the stage. The base portion on the opposite side of the surface drives the third link provided inside the stage to move in the direction in which the contact surface advances and retreats; the guide rail is disposed inside the stage and extends substantially parallel to the contact surface and extends toward the extension of the suction opening. The sliding member is connected with a cover and slidably mounted on the guide rail; and the 苐2 connecting rod is rotatably accommodated inside the sigma, and the sliding member is connected with the first link, and the first connecting rod is slanted to the kidney. The action of the advancing and retracting direction of the surface is in the direction of the guide rail; and the 1 link is directed toward the base portion, and the direction is driven to pick up the half V body die, and the first pressing surface is advanced by the driving portion 'Slide the cover along the tight side. Semiconductor wafer pick-up 9. According to the second or first garment of the patent application, there is a sliding mechanism for sliding the cover, and the sliding mechanism comprises: the driving portion is mounted in the opposite side to the mounting surface of the stage 々^ placed on the stage (4), the first link is in close contact with (4) W], the piston 'is placed inside the stage, and advances and retreats to the close surface; the stopper is placed in the direction of the stage; 1 The connecting rod and the piston are connected to the inside of the adjoining surface, and the piston is restrained from advancing and retreating, 200913085 is compressed when the piston abuts against the stopper; the guide rail is mounted on the piston, substantially parallel to the abutting surface And extending toward the extending direction of the suction bow opening; the sweat slider is connected with a cover and slidably mounted to the guide; and the second link is rotatably mounted to the piston to connect the slider to the first link. When the piston abuts against the stopper, the action of the f丨 link on the advancing and retracting direction of the abutting surface is converted into the action of the sliding member in the direction of the guide rail; when the semiconductor die is picked up, the third connecting rod is driven by the driving portion Retreat towards the close surface Protrudes from the adherence surface, along the surface of the slide close. A semiconductor wafer pick-up device according to claim 2 or 3, comprising: a sliding mechanism for sliding the cover, the sliding mechanism comprising: a driving portion mounted on a side opposite to the abutting surface of the stage The base portion moves the third link provided inside the stage on the facing surface; the 冋 drive rail is disposed inside the stage, and has an inclined surface that is inclined toward the close surface toward the suction; The sliding member is attached to the inclined surface of the guide with a cover and slidingly slidable; the second connector is rotatably swayed in the inside of the stage, and the slider is connected to the first link, The action of the first link pair in the forward and backward direction of the close contact surface is converted into the action of the slider in the direction of the inclined surface of the guide rail; when picking up the semiconductor die, the funer is driven by the catcher The first link is moved toward and from the facing surface of the 41, 2009, 305, and the cover is slid from the close surface u. Wherein, the semiconductor die pick-up, the inclined surface of the guide rail of the sliding mechanism, the surface extends from the inside of the stage along the suction opening, the cam surface, the parallel surface on the side of the close surface, continuous to the cam surface, parallel The second link that is inclined toward the facing surface and extends in the extending direction; and the second link that faces the suction opening has a shape in which the cam surface and the parallel surface of the curved surface are moved. For adhering to the guide surface 12, as in the scope of the patent application, to the conductor die picking device, which has: a half of the carrier of any one of the items drives the sling movement up and down; and the stage is held The wafer is held in the advance and retreat direction of the wafer holder with the horizontal direction of the driver die. The film is attached with a semi-conductive film. When the semiconductor die is picked up, the carrier is moved by the carrier: the cover is moved; The surface is in close contact with the holding piece, and the driving mechanism is configured to position the semiconductor die by the wafer holding device from the door driving portion so as not to be picked up to protrude from the surface of the cover closing the suction opening. 13 · A semiconductor The die device picks up and adheres to the method: the method of picking up the +-conductor die of the semiconductor die by the semiconductor die, the semiconductor die picking up the semiconductor carrier, which is held by the semiconductor carrier and containing the adhered particles The surface of the film is attached to the opposite side of the surface of the semi-conducting 俨 衍 紧 螫 螫 螫 螫 螫 螫 螫 螫 螫 螫 螫 螫 螫 螫 螫 螫 螫 螫 42 42 42 42 42 42 42 42 42 42 42 42 42 42 42 42 42 42 42 42 42 42 42 42 grain i, disposed on the stage such that the surface slides along the abutting surface and the switch attracts the opening; and the collet absorbs and holds the semiconductor die; and is characterized in that the positioning step is performed so that the cover surface is in close contact with the holding piece so that The semiconductor die picked up does not protrude from the surface of the cover that closes the suction opening; and the film peeling step is performed, and the cover is slid and the suction opening is sequentially opened in a state in which the picked-up semiconductor die is adsorbed by the collet, so that the holding piece is held The semiconductor wafer pick-up method according to claim 13 of the invention, wherein the semiconductor die pick-up device is covered, It is disposed on the stage so as to slide along the abutting surface and protrude from the abutting surface, and maintain the sheet peeling step, so that the surface of the cover protrudes from the abutting surface to slide it. 15·If the patent scope is 13 or The semiconductor chip picking method of item 14, wherein the positioning step is such that the direction of one end of the picked semiconductor die is such that the film is peeled in the direction of one end of the cover The step is to slide the cover from one end side of the semiconductor die to the other end side to open the opening. The suction piece is sequentially attracted from the end side of the picked semiconductor die to the opened attraction. The openings are sequentially peeled off from the semiconductor wafers picked up.
TW97105105A 2007-09-06 2008-02-14 The pick-up equipment of semiconductor wafer and pick-up method TW200913085A (en)

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KR101199298B1 (en) 2008-11-04 2012-11-09 캐논 머시너리 가부시키가이샤 Chip peeling method, semiconductor device manufacturing method and chip peeling apparatus
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KR101350642B1 (en) * 2012-05-22 2014-01-16 세메스 주식회사 Method of ejecting a die from a wafer, die ejecting unit and apparatus of picking up a die
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JP6349496B2 (en) * 2014-02-24 2018-07-04 株式会社新川 Semiconductor die pickup apparatus and pickup method
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JP7135959B2 (en) * 2019-03-22 2022-09-13 株式会社デンソー pickup device
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