TW200908828A - Circuitized substrate with internal resistor, method of making said circuitized substrate, and electrical assembly utilizing said circuitized substrate - Google Patents

Circuitized substrate with internal resistor, method of making said circuitized substrate, and electrical assembly utilizing said circuitized substrate Download PDF

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Publication number
TW200908828A
TW200908828A TW97118394A TW97118394A TW200908828A TW 200908828 A TW200908828 A TW 200908828A TW 97118394 A TW97118394 A TW 97118394A TW 97118394 A TW97118394 A TW 97118394A TW 200908828 A TW200908828 A TW 200908828A
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Taiwan
Prior art keywords
electrical conductor
substrate
layer
circuitized substrate
electrical
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TW97118394A
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Chinese (zh)
Inventor
Rabindra N Das
Michael J Rowlands
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Endicott Interconnect Tech Inc
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Priority claimed from US11/806,685 external-priority patent/US7687724B2/en
Application filed by Endicott Interconnect Tech Inc filed Critical Endicott Interconnect Tech Inc
Publication of TW200908828A publication Critical patent/TW200908828A/en

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Abstract

A circuitized substrate which utilizes at least one internal (embedded) resistor as part thereof, the resistor comprised of a material including resin and a quantity of powders of nano-particle and/or micro-particle sizes. The resistor serves to decrease the capacitance in the formed circuit while only slightly increasing the high frequency resistance, thereby improving circuit performance through the substantial elimination of some discontinuities known to exist in structures like these. An electrical assembly (substrate and at least one electrical component) is also provided.

Description

200908828 九、發明說明: 【發明所屬之技術領域】 本發明係關於在諸如印刷電路板、晶片載體及其類似物 之電路化基板内提供電阻器,且更特定而言係關於實現其 之方法且係關於包括該等内部電阻器作為其部分之產品。 甚至更特定而言,本發明係關於使用具有奈米顆粒或微米 顆粒或兩者之組合作為其部分之粉末材料形成内部電阻器 的該等方法及產品。 在2007年4月6日申請之代理人案號為EI-2-06-013且標題 為"Non-Flaking Capacitor Material, Capacitive Substrate Having An Internal Capacitor Therein Including Said Non-Flaking Capacitor Material And Method Of Making A Capacitor Member For Use In A Capacitive Substrate”的序 列號(S.N.)(_/_,_)中,定義包括熱固性樹脂(例如 環氧樹脂)、高分子量增韌劑(例如苯氧基樹脂)及一定數量 之鐵電陶瓷材料(例如鈦酸鋇)之奈米顆粒的電容器材料, 該電容器材料不包括連續或半連續纖維(例如纖維玻璃)作 為其部分。該材料適合於以層形式定位於第一導體構件上 且經加熱至材料將不具有任何實質性剝落特徵之預定溫 度。第二導體構件可隨後定位於該材料上以形成電容器構 件,其隨後可併入基板中以形成電容性基板。電子組件可 定位於基板上且與内部電容器電容性耦接。 在標題為"Method Of Making A Capacitive Substrate ForBACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to providing resistors in circuitized substrates such as printed circuit boards, wafer carriers, and the like, and more particularly to methods for achieving the same It relates to products including these internal resistors as part of them. Even more particularly, the present invention relates to such methods and products for forming internal resistors using powder materials having nanoparticle or microparticles or a combination of both as part of it. The agent filed on April 6, 2007 is EI-2-06-013 and titled "Non-Flaking Capacitor Material, Capacitive Substrate Having An Internal Capacitor Therein Including Said Non-Flaking Capacitor Material And Method Of Making In the serial number (SN) (_/_, _) of A Capacitor Member For Use In A Capacitive Substrate, the definition includes thermosetting resin (such as epoxy resin), high molecular weight toughening agent (such as phenoxy resin) and certain a capacitor material of a nano-particle of a quantity of ferroelectric ceramic material (eg, barium titanate), the capacitor material not including continuous or semi-continuous fibers (eg, fiberglass) as part of it. The material is suitable for positioning in a layer form first The conductor member is heated to a predetermined temperature at which the material will not have any substantial exfoliation characteristics. A second conductor member can then be positioned over the material to form a capacitor member, which can then be incorporated into the substrate to form a capacitive substrate. The component can be positioned on the substrate and capacitively coupled to the internal capacitor. The title is "Method Of Making A Capa Citive Substrate For

Use As Part Of A Larger Circuitized Substrate, Method of 131317.doc 200908828Use As Part Of A Larger Circuitized Substrate, Method of 131317.doc 200908828

Making Said Circuitized Substrate and Method of MakingMaking Said Circuitized Substrate and Method of Making

An Information Handling System Including Said Circuitized Substrate"且於 2006年 2月13 日申請之 SN n/352,279 中, 疋義種形成電谷性基板之方法,其中將至少一個電容性 介電材料層經絲網或喷墨印刷至導體上且其後進一步處理 基板,包括添加通孔以耦接基板内所選擇之元件從而形成 至夕兩個電谷器作為基板之内部元件。電容性基板可併入 (例如)更大之電路化基板内以形成電子總成。亦提供一種 製造包括該等基板之資訊處理系統的方法。在一個實例 中’將環氧酚搭清漆樹脂及苯氧基樹脂連同鈦酸鋇 (BaTi〇3)粉末及丙二醇單甲基醚乙酸酯及甲基乙基酮一起 混合且球磨三日。此混合複合物之25微米薄膜隨後沈積 於銅基板上且在烘箱中在大約140°C下乾燥三分鐘以移除 殘餘有機溶劑。此後在烘箱中在19CTC下固化兩小時。隨 後使用濺鍍操作在固化薄膜頂上使用通常用於該等濺鍍操 作之遮罩形成第二導電體。 在才示喊為 Method Of Making A Capacitive Substrate Using Photoimageable Dielectric For Use As Part Of A Larger Circuitized Substrate, Method of Making Said Circuitized Substrate and Method of Making An InformationAn Information Handling System Including Said Circuitized Substrate " and in SN n/352,279, filed on Feb. 13, 2006, the method of forming an electric valley substrate, wherein at least one layer of capacitive dielectric material is screened or Inkjet printing onto the conductor and subsequent processing of the substrate further includes adding vias to couple the selected components within the substrate to form the inner cells of the substrate as the substrate. The capacitive substrate can be incorporated into, for example, a larger circuitized substrate to form an electron assembly. A method of fabricating an information processing system including such substrates is also provided. In one example, an epoxy phenol varnish resin and a phenoxy resin were mixed together with barium titanate (BaTi〇3) powder, propylene glycol monomethyl ether acetate and methyl ethyl ketone, and ball milled for three days. The 25 micron film of this mixed composite was then deposited on a copper substrate and dried in an oven at about 140 ° C for three minutes to remove residual organic solvent. Thereafter, it was cured in an oven at 19 CTC for two hours. A second electrical conductor is then formed on top of the cured film using a mask typically used for such sputtering operations using a sputtering operation. Method Of Making A Capacitive Substrate Using Photoimageable Dielectric For Use As Part Of A Larger Circuitized Substrate, Method of Making Said Circuitized Substrate and Method of Making An Information

Handling System Including Said Circuitized Substrate"且亦 於2006年2月13日申請之S.N. 1 1/352,276中,定義一種形成 電容性基板之方法’其中將至少一個電容性介電材料層經 絲網或喷墨印刷至導體上且其後進一步處理基板,包括添 131317.doc 200908828 加通孔以耦接基板内所選擇之元件以形成至少兩個電容器 作為基板之内部元件。可光成像之材料係用以促成所印刷 之電容性介電質的定位。電容性基板可併入(例如)更大之 電路化基板内以形成電子總成。亦提供一種製造包括該等 基板之資訊處理系統的方法。 在2005年10月6曰申請之標題為"Circuitized Substrate With Solder-Coated Microparticle Paste Connections, Multilayered Substrate Assembly, Electrical Assembly And Information Handling System Utilizing Same And Method Of Making Said Substrate"之S.N. 11/244,180中,定義一種 包括用於提供電連接之導電膏的電路化基板。在一實施例 中,該膏劑包括黏合劑組份及至少一種包括微米顆粒之金 屬組份。在另一實施例中,膏劑包括黏合劑及複數個奈米 線。微米顆粒或奈米線之所選擇者包括其上之焊料層。如 同適合於具有該基板作為其部分之電子總成及資訊處理系 統,亦提供一種製造該基板之方法。 在標題為 ’’Method Of Making An Internal CapacitiveHandling System Including Said Circuitized Substrate" and in SN 1 1/352,276, filed on Feb. 13, 2006, the disclosure of which is incorporated herein by reference in its entire entire entire entire entire entire entire entire entire disclosure Printing onto the conductor and thereafter processing the substrate further includes adding a 131317.doc 200908828 via to couple the selected components within the substrate to form at least two capacitors as internal components of the substrate. Photoimageable materials are used to facilitate the positioning of the printed capacitive dielectric. The capacitive substrate can be incorporated into, for example, a larger circuitized substrate to form an electron assembly. A method of making an information processing system including such substrates is also provided. The title of the application is "Circuitized Substrate With Solder-Coated Microparticle Paste Connections, Multilayered Substrate Assembly, Electrical Assembly And Information Handling System Utilizing Same And Method Of Making Said Substrate " SN 11/244, 180 A circuitized substrate comprising a conductive paste for providing an electrical connection. In one embodiment, the paste comprises a binder component and at least one metal component comprising microparticles. In another embodiment, the paste comprises a binder and a plurality of nanowires. The choice of microparticle or nanowire includes the solder layer thereon. A method of fabricating the substrate is also provided as is suitable for an electronic assembly and an information processing system having the substrate as a part thereof. Under the title ’’Method Of Making An Internal Capacitive

Substrate For Use In a Circuitized Substrate And Method Of Making Said Circuitized Substrate1’且於2005年 7月 5日申請 之S.N. 11/172,794中,定義一種形成電容性基板之方法, 其中第一及第二導體係與介電質相對而形成,且此等導體 中之一者與通孔連接電耦接。每一者均充當所得電容器之 電極。基板隨後適合於併入更大之結構内以形成諸如印刷 電路板或晶片載體之電路化基板。額外電容器亦為可能 131317.doc 200908828 的。在此申請中之申請案中所引用之一個實例(實例5)中, 將環氧酚醛清漆樹脂及苯氧基樹脂連同鈦酸鋇(BaTi〇3)粉 末及丙二醇單甲基醚乙酸酯及甲基乙基酮一起混合且球磨 三曰。此混合複合物之2.5微米薄膜沈積於銅基板上且在 烘箱中在大約MOt下乾燥三分鐘以移除殘餘有機溶劑。 此後在洪箱中在190。(:下固化兩小時。隨後使用㈣操作 在固化薄膜頂上使用通常用於該等濺鍍操作之遮罩形成第 二導電體。 在2005年7月5曰申請之標題為”Resist〇r Materiai评汕Substrate For Use In a Circuitized Substrate And Method Of Making Said Circuitized Substrate 1 ' and in SN 11/172,794, filed on Jul. 5, 2005, a method of forming a capacitive substrate is defined, wherein the first and second guiding systems The electrical mass is formed oppositely and one of the conductors is electrically coupled to the via connection. Each acts as an electrode for the resulting capacitor. The substrate is then adapted to be incorporated into a larger structure to form a circuitized substrate such as a printed circuit board or wafer carrier. Additional capacitors are also possible 131317.doc 200908828. In one example (Example 5) cited in the application of this application, an epoxy novolac resin and a phenoxy resin together with barium titanate (BaTi〇3) powder and propylene glycol monomethyl ether acetate and Methyl ethyl ketone was mixed together and ball milled three times. A 2.5 micron film of this hybrid composite was deposited on a copper substrate and dried in an oven at about MOt for three minutes to remove residual organic solvent. After that, it was at 190 in the flood box. (: curing for two hours. Then use the (4) operation to form a second conductor on top of the cured film using the mask normally used for the sputtering operation. The title of the application was “Resist〇r Materiai” on July 5, 2005.汕

Metal Component For Use In Circuitized Substrates, Circuitized Substrate Utilizing Same, Method of Making Said Circuitized Substrate And Information Handling System Utilizing Said Circuhized ―也批"之 s n ll/m,786中,定義一種適用作電路化基板内之内部電阻 器之邓刀的材料’其包括聚合物樹脂及一定數量之包括至 少-種金屬組份及至少—種陶:£組份之混合物的奈米粉 ,。陶竟組份可為鐵電陶竟及/或高表面積陶竞及/或透明 氧化物及/或摻雜亞巍酿豳 斗,心 兑猛S文鹽。或者,該材料將包括聚合物 樹月曰及不米叙末’其中奈米粉末包含至少一種金屬塗佈陶 兗及/或至少-種氧化物塗佈金屬組份。亦提供一種適合 於在其中使用該材料及電阻器之電路化基板及一種製造該 基板之方法。亦提供-種電子總成(基板及至少一個電子 組件)及-種資訊處理系統(例如個人電腦)。Metal Component For Use In Circuitized Substrates, Circuitized Substrate Utilizing Same, Method of Making Said Circuitized Substrate And Information Handling System Utilizing Said Circuhized - also batched "sn ll/m, 786, defines an interior suitable for use as a circuitized substrate The material of the Dengdao knife of the resistor includes a polymer resin and a quantity of nano powder comprising a mixture of at least one metal component and at least one type of ceramic: a component. The Tao Jing component can be a ferroelectric pottery and/or a high surface area pottery and/or a transparent oxide and/or a doped agar. Alternatively, the material will comprise a polymer tree sap and a non-semiconductor' wherein the nanopowder comprises at least one metal coated ceramic and/or at least one oxide coated metal component. A circuitized substrate suitable for use of the material and resistor therein and a method of fabricating the same are also provided. An electronic assembly (substrate and at least one electronic component) and an information processing system (such as a personal computer) are also provided.

在2005年1月10日中請之標題為⑽μ仙㈤W 131317.doc 200908828The title of the request in January 10, 2005 is (10) μ Xian (5) W 131317.doc 200908828

Use In Circuitized Substrates, Circuitized Substrate Utilizing Same, Method of Making Said Circuitized Substrate, And Information Handling System Utilizing Said Circuitized Substrate"之 S.N. ll/〇3i,〇85中,定義一種適用 作電路化基板内之内部電容器之部分的材料,其中該材料 包括聚合物樹腊及一定數量之陶瓷材料奈米粉末,該等粉 末具有大體上在約0.01微米與約〇 90微米之間範圍内之粒 度且該4顆粒之所選擇者的表面積係在每公克約2. 〇至約 20平方公尺的枕圍内。亦提供一種適合於在其中使用該材 料及電谷器之電路化基板及一種製造該基板之方法。亦提 供一種電子總成(基板及至少一個電子組件)及一種資訊處 理系統(例如個人電腦)。 在亦於2005年1月1〇日申請之標題為,,Capacit〇r MateHal With Metal Component For Use In Circuitized Substrates, Circuitized Substrate Utilizing Same, Method Of MakingUse In Circuitized Substrates, Circuitized Substrate Utilizing Same, Method of Making Said Circuitized Substrate, And Information Handling System Utilizing Said Circuitized Substrate" SN ll/〇3i, 〇85, defines a portion suitable for use as an internal capacitor in a circuitized substrate The material, wherein the material comprises a polymer tree wax and a quantity of ceramic material nano-powder having a particle size substantially in the range between about 0.01 microns and about 〇90 microns and the selected one of the 4 particles The surface area is in the range of about 2. 〇 to about 20 square meters per gram of pillow. A circuitized substrate suitable for use of the material and the electric grid device and a method of manufacturing the same are also provided. An electronic assembly (substrate and at least one electronic component) and an information processing system (such as a personal computer) are also provided. The title of the application was also filed on January 1, 2005. Capacit〇r MateHal With Metal Component For Use In Circuitized Substrates, Circuitized Substrate Utilizing Same, Method Of Making

Said Circuitized Substrate, and Information Handling System Utilizing Said Circuitized 之 s n 11/031,G74巾,定義—種適用作電路化基板内之内部電容 器之部分的材料,其包括聚合物樹脂及一定數量之包括至 少一種金屬組份及至少一種鐵電陶究組份之混合物的奈米 粉末,該等鐵電陶瓷組份奈求顆粒具有大體上在約〇.〇1微 米與約〇.9微米之間範圍内的粒度及每公克約2.0至約20平 方公尺範圍内之表面積。亦提供一種適合於在其中使用該 材料及電容器之電路化基板及一種製造該基板之方法。亦 131317.doc •10· 200908828 提供一種電子總成(基板及至少一個電子組件)及一種資訊 處理系統(例如個人電腦)。S.N. 11/〇31,〇74之分割案5.队 11/324,273係申請於2〇〇6年1月 4 日。S.N· 11/031,074現為美 國專利 7,025,607。 在標題為"Electrical Assembly With Internal Memory,Said Circuitized Substrate, and Information Handling System Utilizing Said Circuitized sn 11/031, G74, defined as a material suitable for use as part of an internal capacitor within a circuitized substrate, comprising a polymer resin and a quantity comprising at least one metal a nano powder of a mixture of a component and at least one ferroelectric ceramic component, the ferroelectric ceramic component having a particle size substantially in a range between about 微米1 μm and about 9.9 μm And a surface area in the range of from about 2.0 to about 20 square meters per gram. A circuitized substrate suitable for use of the material and capacitor therein and a method of fabricating the same are also provided. Also 131317.doc •10· 200908828 An electronic assembly (substrate and at least one electronic component) and an information processing system (such as a personal computer) are provided. S.N. 11/〇31, 〇74 division 5. Team 11/324, 273 application on January 4, 2002. S.N. 11/031,074 is currently U.S. Patent 7,025,607. In the title ""Electrical Assembly With Internal Memory,

Circuitized Substrate Having Electrical Components Positioned Thereon, Method Of Making Same, And ( Informatlon Handling System Utilizing Same”且於 2004年 7 月28日申請之S.N. l〇/9〇〇,386中,定義一種包括電路化基 板之電子總成,該電路化基板包含其上具有第一導電圖案 之有機介電材料。介電層及圖案之至少部分形成有機記憶 體裝置之第一基礎部分,其餘部分為形成於圖案部分上之 弟一1合物層及形成於聚合物層上之第二導電電路。若第 二介電層形成於第二導電電路及第一電路圖案上以封閉有 機§己憶體裝置。該裝置經由第二介電層與第一電子組件電 Q 耦接且此第一電子組件與第二電子組件電耦接。如同適合 於使用一或多個該電子總成作為其部分之資訊處理系統, 亦提供一種製造該電子總成之方法。S N 1〇/9〇〇,386現為 美國專利7,045,897。 , 在標題為"Circuitized Substrate With Internal OrganicCircuitized Substrate Having Electrical Components Positioned Thereon, Method Of Making Same, And (Informatlon Handling System Utilizing Same) and SN l〇/9〇〇, 386, filed on July 28, 2004, to define an electronic circuit including a circuitized substrate The circuit board includes an organic dielectric material having a first conductive pattern thereon. At least a portion of the dielectric layer and the pattern form a first base portion of the organic memory device, and the remaining portion is formed on the pattern portion a first conductive layer and a second conductive circuit formed on the polymer layer. If the second dielectric layer is formed on the second conductive circuit and the first circuit pattern to block the organic § memory device, the device is passed through the second The dielectric layer is electrically coupled to the first electronic component and the first electronic component is electrically coupled to the second electronic component. As with an information processing system suitable for using one or more of the electronic assemblies as part thereof, a dielectric processing system is also provided. A method of making the electronic assembly. SN 1〇/9〇〇, 386 is now U.S. Patent 7,045,897. In the title "Circuitized Substrate With Inte Rnal Organic

Memory Device, Method Of Making Same, Electrical Assembly Utilizing Same, and Information Handling System Utilizing Same,,且於 2〇〇4年7 月 28日申請之 sn i〇/9〇〇,385 中,定義一種電路化基板,其包含其上具有導電圖案之至 131317.doc -11 - 200908828 少一層介電材料。該圖案之至少部分係用作有機記憶體裝 置之第一層,該裝置另外包括該圖案上之至少第二介電層 及與下半部對準之第二圖案以便達成若干接觸點以由此形 成該裝置。基板較佳與其他介電電路層狀總成組合以形成 多層基板,其上可定位與内部記憶體裝置耦接以與其組合 運作之分立電子組件(例如邏輯晶片)。如同適合於使用一 或多個該電子總成作為其部分之資訊處理系統,亦提供一 種能夠使用該基板之電子總成。 所有上述申睛案均讓渡給與本發明相同之受讓人。 本申請案為S.N 1 1/172,786之部分連續案,其為申請日 期為2005年1月1〇日之S.N 11/〇31,〇74(現為美國專利 7,025,607)的部分連續案。 【先前技術】 印刷電路板(下文中亦稱為PCB)、晶片載體及其類似物 Μ常在本文中稱為電路化基板)通常以層壓形式Memory Device, Method Of Making Same, Electrical Assembly Utilizing Same, and Information Handling System Utilizing Same, and in a sn i〇/9〇〇, 385 application filed on July 28, 2004, a circuitized substrate is defined. It contains a layer of dielectric material with a conductive pattern on it to 131317.doc -11 - 200908828. At least a portion of the pattern is used as a first layer of an organic memory device, the device additionally including at least a second dielectric layer on the pattern and a second pattern aligned with the lower half to achieve a plurality of contact points The device is formed. The substrate is preferably combined with other dielectric circuit layered assemblies to form a multilayer substrate on which discrete electronic components (e.g., logic wafers) that are coupled to the internal memory device for operation in conjunction therewith. An electronic assembly capable of using the substrate is also provided as an information processing system suitable for using one or more of the electronic assemblies as a part thereof. All of the above claims are assigned to the same assignee as the present invention. This application is a continuation of S.N 1 1/172,786, which is a partial continuation of S.N 11/〇31, 〇 74 (now U.S. Patent 7,025,607) dated January 1, 2005. [Prior Art] Printed circuit boards (hereinafter also referred to as PCBs), wafer carriers, and the like are often referred to herein as circuitized substrates, usually in a laminated form.

131317.doc 免需求增加’所以此情況就將來設 為增加可利用之基板表面積(通常 •12- 200908828 亦稱作”有效面積"),已進行將多種功能件(例如電阻器、 電容器及其類似物)包括於單一組件上以安裝於板上的各 種嘗試。在被動裝置處於該組態中時,該等裝置通常共同 及個別地稱作整體式被動裝置或其類似物,意謂該等功能 件整合至單個組件中。因為該外部定位,該等組件仍利用 板”有效面積,,(雖然小於若以單一形式之"有效面積")。 對應於上述限制,已致力於將分立被動組件嵌埋於基板 f 之内0卩0卩刀内,该等組件則稱作嵌埋式被動组件。經設計 I 以布置於基板内(例如在所選擇之層之間)之電容器或電阻 器因此可稱作嵌埋式整體被動組件,或更簡單地,嵌埋式 電阻器或電容器。該電容器因此提供内部電容,而電阻器 提供内部電阻。此内部定位之結果為無需亦將該等裝置外 部地定位於PCB之外表面上,因此節省重要的pcB表面 積。 下文所列之某些文獻,尤其美國專利6,〇21,〇5〇,描述作 〇 為PCB之被動元件之電阻器的内部用途。如在S.N. 11/031,G74(現為美國專利7,G25,6G7)中所述,過去亦已嘗 電路化基板(PCB)内提供内部電容及其他内部導電結 • 構、組件或裝置(-個良好實例為内部半導體晶片),該等 • 中之一些包括使用奈米粉末。以下為各種基板結構之一些 實例,包有如上所述之嵌埋式組件的4皮等基板結構, 包括使用奈米粉末之彼等基板結構及使用_代措施之彼等 反構5亥專文獻之引用並非承認任一者為本發明之先 前技術。 131317.doc •13· 200908828131317.doc No increase in demand' so this situation will be set in the future to increase the available surface area of the substrate (usually • 12-200908828 also known as "effective area"), which has been carried out with a variety of functional components (such as resistors, capacitors and their Analogs) include various attempts to mount on a single component. When the passive device is in the configuration, the devices are commonly referred to collectively and individually as a monolithic passive device or the like, meaning that The functional components are integrated into a single component. Because of this external positioning, the components still utilize the "effective area" of the board, (although less than a single form of "effective area"). Corresponding to the above limitations, it has been proposed to embed discrete passive components in the 0 卩 0 卩 基板 in the substrate f, which are called embedded passive components. Capacitors or resistors designed to be disposed within a substrate (e.g., between selected layers) may therefore be referred to as embedded integral passive components, or more simply embedded resistors or capacitors. This capacitor thus provides internal capacitance while the resistor provides internal resistance. The result of this internal positioning is that the device is externally positioned on the outer surface of the PCB without the need to also save significant pcB surface area. Some of the documents listed below, in particular U.S. Patent No. 6, 〇 21, 〇 5, describe the internal use of resistors as passive components of PCBs. As described in SN 11/031, G74 (now U.S. Patent 7, G25, 6G7), internal capacitors and other internal conductive structures, components or devices have been provided in circuitized substrates (PCBs) in the past (- A good example is an internal semiconductor wafer), some of which include the use of nanopowders. The following are some examples of various substrate structures, including a four-substrate substrate structure of the embedded component as described above, including the substrate structure using the nano powder, and their anti-construction The citation of the present invention is not an admission that any of the prior art. 131317.doc •13· 200908828

在標題為"Polymer Thick-Film Resistive Paste, A Polymer Thick-Film Resistor And A Method And An Apparatus For The Manufacture Thereof”之美國專利申請公 開案2005/0051360 A1中,描述塗覆高搖變度聚合物厚膜 電阻性膏劑以便藉由提供具有以與印刷電路板表面呈1〇至 85之角度傾斜之刀片的塗刷器來製造具有改良容許度之聚 合物厚膜電阻器的調配物、設備及方法。傾斜刀片導致隨 著塗刷器刀片相對於印刷電路板之移動,流體在聚合物厚 膜電阻性膏劑珠粒内之旋轉運動。此旋轉運動增加膏劑在 珠粒内所經歷之剪切應變速率且導致電阻器形狀之空腔在 不包括氣/包之情況下的更有效填充,經歷膏劑之彈性恢復 且不發生膏劑之表面斷裂。 vviui Kesistor 在才示通為"Wiring Board Provided Process F〇r Manufacturing The Same”之美國專利申請公開 案2005/0000728 A1中,描述一種具有電阻器之佈線板, 該板包含具有表面之絕緣基板;形成於該表面上之佈線圖 案,該等佈線圖案包括彼此間隔某一距離之第一及第二電 極’形成於表面上之第一電阻器(水平型I阻器),該第一 電阻器具有分別與第—及第二電極相連接之各別端;該等 佈線圖案另外包括佔據該表面上之第—平面區域的第三電 極’形成於第三電極上之第二電阻器(垂直型電阻器”形 成於第,電阻器上之第四電極;I第二電阻器、第四電極 係位於第—平面區域内之第二平面區域中。 在才示題為"SilVer_C〇ated particles,Meth〇d And a叩她s 131317.doc • 14- 200908828The coating of high rocker polymers is described in U.S. Patent Application Publication No. 2005/0051360 A1, entitled "Polymer Thick-Film Resistive Paste, A Polymer Thick-Film Resistor And A Method And An Apparatus For The Manufacture Thereof. Thick film resistive paste for making a polymer thick film resistor with improved tolerance by providing an applicator having a blade that is inclined at an angle of from 1 to 85 to the surface of the printed circuit board, apparatus and method The tilting blade causes a rotational movement of the fluid within the polymer thick film resistive paste bead as the applicator blade moves relative to the printed circuit board. This rotational motion increases the shear strain rate experienced by the paste within the bead. And the cavity of the shape of the resistor is more effectively filled without the inclusion of gas/package, undergoes elastic recovery of the paste and does not cause surface cracking of the paste. vviui Kesistor is in the "Wiring Board Provided Process F" In the U.S. Patent Application Publication No. 2005/0000728 A1, the entire disclosure of which is incorporated herein by reference. The board includes an insulating substrate having a surface; a wiring pattern formed on the surface, the wiring patterns including first and second electrodes spaced apart from each other by a first resistor formed on the surface (horizontal type I resistor) The first resistor has respective ends connected to the first and second electrodes; the wiring patterns additionally include a third electrode 'occupying a first planar region on the surface formed on the third electrode A second resistor (vertical resistor) is formed on the fourth electrode on the resistor; the second resistor and the fourth electrode are located in a second planar region in the first planar region. "SilVer_C〇ated particles, Meth〇d And a叩 her s 131317.doc • 14- 200908828

Of Manufacture, Silver-Containing Devices Made Therefr〇m"之美國專利申請公開案2〇〇4/〇23 1758 ai中,描 述含銀粉末之用途及用於製造小尺寸及窄尺寸分布之高品 質含銀顆粒的方法及設備。氣霧劑自液體.進料產生且發送 至炼爐’其中氣霧劑中之液滴狀液體汽化以允許形成所需 顆粒,隨後將其收集於顆粒收集器中。氣霧劑產生涉及製 備具有窄液滴尺寸分布、具有對液滴尺寸之緊密控制且具 有適合於商業應用之高液滴負載量的高品質氣霧劑。 在標題為”Resistive Film"之美國專利申請公開案 2003/0 1464 1 8 A1中,描述用於電位計中之電阻薄膜。薄 膜與可移動擦拭器接觸。薄膜包括固化聚合物樹脂及固化 熱固性樹脂。碳黑及石墨之導電顆粒分散於薄膜中。導電 顆粒導致樹脂具有電阻性。碳奈米顆粒亦分散於薄膜中。 奈米顆粒增加電阻薄膜之耐磨性且減少在擦拭器移過薄膜 時之電雜訊。 在標題為"Process For Manufacturing A Substrate 评油 Embedded Capacitor"之美國專利6,967 138中,描述一種製 w 有肷埋式電容器之基板的方法,其中使包括下部電極 襯墊之第一金屬佈線層形成於基板基部上。介電層藉由積 累塗佈程序形成於基板基部上。孔形成於介電層中以暴露 下部電極襯塾’且隨後將介f材料填充於孔中。將介質材 料研磨以具有與介電層共平面之經研磨表面。包括上部電 極襯墊之第二金屬佈線層形成於介電層上,該上部電極襯 墊覆蓋介質材料之經研磨表面且平行於下部電極襯塾以便 131317.doc -15- 200908828 形成嵌埋式電容器。 在標題為’’Nanosized Intermetallic p〇wders"之美國專利 6,746,508中,描述諸如FeA1、Fe3A卜Nu卜 之金屬間合金奈米顆粒之用& ’其顯示多種所關注之結構 性、磁性、催化性、電阻性及電子性以及條形編碼應用。 奈米尺寸化粉末可用於製造具有增強之機械特性的結構部 件、具有增強之磁性飽和的磁性部件、具有增強之催化活The use of silver-containing powders and the high quality silver containing for the manufacture of small and narrow size distributions are described in US Patent Application Publication No. 2, 4/23, 1758 ai, of Manufacture, Silver-Containing Devices, Made There. Particle method and equipment. The aerosol is produced from the liquid. Feed and sent to the furnace' where the droplets of liquid in the aerosol vaporize to allow formation of the desired particles which are subsequently collected in a particle collector. Aerosol production involves the preparation of high quality aerosols having a narrow droplet size distribution, tight control of droplet size, and high droplet loading suitable for commercial applications. A resistive film for use in a potentiometer is described in U.S. Patent Application Publication No. 2003/0 1464 1 8 A1, entitled "Resistive Film". The film is in contact with a movable wiper. The film comprises a cured polymer resin and a cured thermosetting resin. The conductive particles of carbon black and graphite are dispersed in the film. The conductive particles cause the resin to have electrical resistance. The carbon nano particles are also dispersed in the film. The nano particles increase the wear resistance of the resistive film and reduce when the wiper moves over the film. A method of making a substrate having a buried capacitor, wherein the method of including a lower electrode pad is described in US Patent No. 6,967,138, entitled "Process For Manufacturing A Substrate", "Embedded Capacitor". A metal wiring layer is formed on the substrate base. The dielectric layer is formed on the substrate base by an accumulation coating process. A hole is formed in the dielectric layer to expose the lower electrode pad ' and then the dielectric material is filled in the hole. Grinding the dielectric material to have a ground surface coplanar with the dielectric layer. A second metal wiring layer including an upper electrode pad Formed on the dielectric layer, the upper electrode pad covers the ground surface of the dielectric material and is parallel to the lower electrode pad to form an embedded capacitor for 131317.doc -15-200908828. The title is ''Nanosized Intermetallic p〇wders&quot U.S. Patent No. 6,746,508, the disclosure of which is incorporated herein by reference in its entirety in U.S. Pat. Applications Nanosized powders can be used to make structural parts with enhanced mechanical properties, magnetic parts with enhanced magnetic saturation, and enhanced catalytic activity.

性的催化劑材料、具有增強之解析度的厚膜電路元件及諸 如具有增強之磁性之磁性條形編碼的絲網印刷影像。與在 室溫下為非磁性之整體⑽材料相反,_奈米顆粒:室 溫下顯示磁性。 在払題為"Resistive Film',之美國專利 種4用於電位計中之電阻薄膜。薄膜與可移動擦拭器接 ,。薄膜包括固化聚合物樹脂及固化熱固性樹脂。碳黑及 石墨之導電顆粒分散於薄膜中。導電顆粒導致樹脂具有電 阻性。碳奈米顆粒亦分散於薄膜中。奈米顆粒增加電阻薄 膜之财m減少在擦拭器移過薄膜時之電雜訊。在製備 例示性組合物中,藉由以總组合物計將10·20重量%之聚合 物與(Μ0重量%之熱固性樹月旨混合於6〇_8〇重量%之^甲2 料咬嗣中來製借聚合物溶液。將聚合物與導電及夺米顆 粒兩者混合以形成具有精細粒度之膏劑。此時若需要:、則 可添加界面活性劑及流變添加劑以改進電阻性組合物之特 性。監控㈣之粒度範圍及黏度以獲得適合應用於位 應器中之電阻性㈣。球磨機上之研磨時間及研 $ I31317.doc -16· 200908828 疋最終顆粒分布、尺寸及所得流變性。 在2004年3月9日頒布之標題為"Device and Method f0r Interstitial Components in a primed B〇ard,,之美國 專利6’704,2G7中’描述—種包括具有第__及第二表面之第 一層的印刷電路板(pCB),其中上述板裝置(例如Asic晶 片)安裝於其上。PCB包括具有第三及第四表面之第二層。 表面之一者可包括牢固地固持隙間組件之凹槽部分。電連 接PCB層之通孔,,亦與隙間組件之導線耦接。所述隙間組 件包括諸如二極體、電晶體、電阻器、電容器、熱電偶及 其類似物之組件。在呈現之較佳實施例中,隙間組件為具 有與具有約0.014吋厚度之"0402”電阻器(由11〇11111(:〇製造) 類似尺寸的電阻器。 在標題為"Integral Capacitance For Printed Circuit Board Using Dielectric Nanopowders"且於 2003 年 9月 9 日頒布之美 國專利6,616,794中,描述一種產生包括於印刷電路板内之 整體式電容組件的方法,其中水熱製備之奈米粉末允許製 造提供增加之介電常數且易於由微通孔穿透之介電層。在 本專利中所述之方法中,製備水熱製備之奈米粉末及溶劑 之漿液或懸浮液。將諸如聚合物之合適黏結材料與奈米粉 末漿液混合以產生形成為介電層之複合混合物。可藉由層 壓或金屬化製程(諸如氣相沈積或濺鍍)將介電層安置於導 電層上,之後固化,或可將導電層塗覆於經固化之介電層 上。 在才示通為"High Dielectric Constant Nano-Structure 131317.doc 17- 200908828Cathode materials, thick film circuit components with enhanced resolution, and screen printed images such as magnetic strip codes with enhanced magnetic properties. In contrast to the non-magnetic monolithic (10) material at room temperature, the nanoparticles exhibit magnetic properties at room temperature. In U.S. Patent No. 4, entitled "Resistive Film", a resistive film for use in a potentiometer. The film is attached to a movable wiper. The film includes a cured polymer resin and a cured thermosetting resin. Conductive particles of carbon black and graphite are dispersed in the film. The conductive particles cause the resin to be electrically resistive. The carbon nanoparticle is also dispersed in the film. The nanoparticle increases the electrical resistance of the thin film to reduce the electrical noise when the wiper moves across the film. In the preparation of the exemplary composition, by mixing 10·20% by weight of the polymer with the total composition ((0% by weight of the thermosetting tree is mixed with 6〇_8〇% by weight) The polymer solution is prepared by mixing the polymer with the conductive and rice granules to form a paste having a fine particle size. At this time, if necessary, a surfactant and a rheological additive may be added to improve the resistive composition. Characteristics: Monitor the particle size range and viscosity of (4) to obtain the resistivity suitable for use in the positioner (4). Grinding time on the ball mill and research $ I31317.doc -16· 200908828 疋 final particle distribution, size and resulting rheology. U.S. Patent No. 6, '704, 2G7, issued on Mar. 9, 2004, entitled "Device and Method f0r Interstitial Components in a primed B. a first printed circuit board (pCB), wherein the above-described board device (eg, an Asic wafer) is mounted thereon. The PCB includes a second layer having third and fourth surfaces. One of the surfaces may include a securely holding the gap assembly Concave The via is electrically connected to the via layer and is also coupled to the trace of the interstitial component. The interstitial component includes components such as a diode, a transistor, a resistor, a capacitor, a thermocouple, and the like. In a preferred embodiment, the interstitial component is a resistor having a size similar to that of a "0402" resistor having a thickness of about 0.014 Å (manufactured by 11 〇 11111 (manufactured by 〇). In the title "Integral Capacitance For Printed Circuit Board A method of producing a monolithic capacitor assembly included in a printed circuit board is described in U.S. Patent No. 6,616,794, the disclosure of which is incorporated herein by reference. A dielectric layer that is electrically constant and easily penetrated by microvias. In the method described in this patent, a slurry or suspension of hydrothermally prepared nanopowder and solvent is prepared. Suitable bonding materials such as polymers are The nanopowder slurry is mixed to produce a composite mixture formed as a dielectric layer. It can be laminated or metallized (such as vapor deposition or sputtering). Plating) The dielectric layer is placed on the conductive layer and then cured, or the conductive layer can be applied to the cured dielectric layer. "High Dielectric Constant Nano-Structure 131317.doc 17- 200908828

Polymer-Ceramic Composite” 且於 2003 年4月3曰頒布之美 國專利6,544,651中,描述一種使用含有金屬乙醯基丙酮酸 鹽(acacs)固化催化劑之聚合物形成之具有高介電常數的聚 合物-陶竟複合物。特定而言,某一百分比之c〇(Hi)可增 加某種環氧化物之介電常數。將高介電聚合物與填充劑、 較佳陶瓷填充劑組合,以形成具有高介電常數之兩相複合 物。顯然發現具有約30至約90體積%陶瓷負載量及高介電 基質聚合物(較佳環氧化物)之複合物具有大於約6〇之介電 常數。本專利中亦提及具有大於約74至約150之介電常數 的複合物。亦提及具有至少25 nF/cm2、較佳至少35 nF/cm2、最佳50 nF/cm2之電容密度的嵌埋式電容器。 在標題為”Method Of Making A ParaUel Capacitor Laminate"且於2003年2月25日頒布之美國專利6,524,352 中,定義一種能夠形成更大電路板或其類似結構之内部部 分以為其提供電容之並聯電容器結構。或者,電容器可用 作互連兩個不同電子組件(例如晶片載體、電路板及甚至 半導體晶片)之互連器,同時仍提供用於該等組件之一或 多者的所需電容位準。電容器包括至少—個内部導電層、 於内部導體相反側上添加之兩個額外導體層及無機介電材 料(較佳為第二導體層外表面上之氧化物層或塗覆於第二 導體層之諸如鈦酸鋇的合適介電材料)。另外,電容器包 括位於無機介電材料頂上之外部導體層’由此形成内部及 所添加導電層與外部導體之間的並聯電容器。 在標題為"Formation of Thin Film Resist〇rs,·且於 2〇〇2 年 131317.doc -18- 200908828 12月31日頒布之美國專利6,5GG,35G中,描述-種形成與導 電材料層電接觸之圖案化電阻材料層的方法。形成三層結 構,其包含金屬導電層、由可藉由化學姓刻劑降解之材料 形成之中間層及具有足夠孔隙率之電阻材料層,以使得中 間層之化學則劑可渗透f阻材料且以化學方式降解中間 層以使得無論於何處以化學方式降解中間層均可自導電層 除去電阻材料。圖案化光阻層形成於電阻材料層上。電阻 材料層暴露於中間層之化學㈣劑以使㈣刻劑渗透多孔 電阻材料層且降解中間層。隨後,無論於何處降解中間 層,均將電阻材料層部分除去。 在標題為"Hybrid Capacitor· And Meth〇d 〇f 他㈣⑽ Therefore"且於2002年9月1〇日頒布之美國專利6,446,3i7 中為述種與積體電路封裝相關聯之混合電容器,其向 晶粒負載提供多個位準之過量、晶片外電容。混合電容器 包括嵌埋於封裝内且與晶片外電容之第二來源電連接之低 電感、平行板電容器。平行板電容器係安置於晶粒下方, 且包括頂部導電層、底部導電層及電隔離頂部與底部層之 薄介f層。晶片外電容之第二來源為一組自對準通孔電容 器及/或-或多個分立電容器及/或額外之平行板電容器。 自對準通孔電容器之每一者係丧埋於封裝内,且具有内部 導體及外部導冑。内料體與頂部或底部^電層電連接, 且外。P導體與S冑電層電連接。分立電容器與自導電層 至封裝表面之接點電連接。在操作期間,低電感平行板電 谷益之導電層中之-者提供接地平自,而另一導電層提供 131317.doc -19- 200908828 電源平面。 題為 Resistors F0r Electr〇nic pack ::月28日頒布之美國專利一中,描述:成於絕緣 之薄層電阻器,該等電阻器可嵌埋於印刷電路板 内。較佳之電阻材料為諸如始之金屬與諸如二氧化石夕或氧 化铭之二電材料的均勻混合物。甚至微量之與金屬混合之 "電材枓顯著增加金屬之電阻。較佳地,藉由燃燒化學氣 相沈積(CCVD)將電阻材料沈積於絕緣基板上。在零價金 屬及介電材料之情況下’藉由CCVD共沈積金屬及介電材 料達成均勻混合物。為形成電阻材料之分立區塊,可钱刻 去,體上任何基於金屬之電阻器材料,包括基於貴金屬之 彼等電阻器材料。因此,電阻材料層可用例如經曝光及顯 影之光阻的圖案化抗触劑來覆蓋,且蚀刻去下伏電阻材料 ^ <暴露部分Q本專利亦描述薄層電阻器之形成,該等薄 層電阻器包括絕緣基板、電阻材料層之分立區塊及與電阻 材料層區塊上之間隔位置電接觸之導電材料,該導電材料 提供電阻材料區塊與電子電路之電連接。絕緣材料、電阻 材料及導電材料之該等結構可藉由選擇性敍刻程序來形 成。 在標題為"Multi-layered Substrate With Built-In CapacitorPolymer-Ceramic Composite, and in U.S. Patent No. 6,544,651, issued to A.S. In particular, a certain percentage of c〇(Hi) increases the dielectric constant of an epoxide. The high dielectric polymer is combined with a filler, preferably a ceramic filler, to form A high dielectric constant two phase composite. It is apparent that a composite having a ceramic loading of from about 30 to about 90 volume percent and a high dielectric matrix polymer (preferably epoxide) has a dielectric constant greater than about 6 Torr. Also referred to in this patent is a composite having a dielectric constant greater than about 74 to about 150. Also mentioned is an inset having a capacitance density of at least 25 nF/cm2, preferably at least 35 nF/cm2, and an optimum 50 nF/cm2. A buried capacitor is defined in U.S. Patent No. 6,524,352, the entire disclosure of which is incorporated herein by its entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire The power supply capacity of the parallel capacitor structure. Alternatively, a capacitor can be used as an interconnect to interconnect two different electronic components, such as a wafer carrier, a circuit board, and even a semiconductor wafer, while still providing the required capacitance level for one or more of such components. The capacitor includes at least one inner conductive layer, two additional conductor layers added on opposite sides of the inner conductor, and an inorganic dielectric material (preferably an oxide layer on the outer surface of the second conductor layer or coated on the second conductor layer) A suitable dielectric material such as barium titanate). In addition, the capacitor includes an outer conductor layer 'on top of the inorganic dielectric material' thereby forming a shunt capacitor between the inner and the added conductive layer and the outer conductor. In U.S. Patent 6,5GG, 35G, entitled "Formation of Thin Film Resist 〇 rs, <RTIgt;</RTI>> A method of electrically contacting a layer of patterned resistive material. Forming a three-layer structure comprising a metal conductive layer, an intermediate layer formed of a material degradable by a chemical surrogate, and a resistive material layer having a sufficient porosity such that the chemical agent of the intermediate layer is permeable to the f-resistance material and The intermediate layer is chemically degraded such that the resistive material can be removed from the conductive layer wherever the intermediate layer is chemically degraded. A patterned photoresist layer is formed on the layer of resistive material. The layer of resistive material is exposed to the chemical (iv) agent of the intermediate layer such that the (iv) engraving agent penetrates the layer of porous resistive material and degrades the intermediate layer. Subsequently, the resistive material layer is partially removed regardless of where the intermediate layer is degraded. In the title of "Hybrid Capacitor· And Meth〇d 〇f (4) (10) (10), and in U.S. Patent No. 6,446, 3i7 issued on September 1, 2002, the hybrid capacitors associated with integrated circuit packages are described. Provides multiple levels of excess, off-chip capacitance to the die load. The hybrid capacitor includes a low inductance, parallel plate capacitor embedded in the package and electrically coupled to a second source of off-chip capacitance. A parallel plate capacitor is disposed beneath the die and includes a top conductive layer, a bottom conductive layer, and a thin dielectric layer of electrically isolated top and bottom layers. The second source of off-chip capacitance is a set of self-aligned via capacitors and/or - or multiple discrete capacitors and/or additional parallel plate capacitors. Each of the self-aligned via capacitors is buried in the package and has an internal conductor and an external via. The inner body is electrically connected to the top or bottom ^ electrical layer, and is external. The P conductor is electrically connected to the S layer. The discrete capacitor is electrically connected to the contact from the conductive layer to the surface of the package. During operation, the low-inductance parallel plate in the conductive layer provides grounding, while the other conductive layer provides the power plane 131317.doc -19- 200908828. The Resistors F0r Electr〇nic pack, described in U.S. Patent No. 1, issued on Nov. 28, describes thin-layer resistors that are insulated and can be embedded in a printed circuit board. The preferred resistive material is a homogeneous mixture of a starting material such as a starting metal and a second electrical material such as cerium oxide or oxidized. Even a small amount of metal mixed with metal significantly increases the resistance of the metal. Preferably, the resistive material is deposited on the insulating substrate by combustion chemical vapor deposition (CCVD). In the case of zero-valent metals and dielectric materials, a homogeneous mixture is achieved by co-depositing metal and dielectric materials by CCVD. To form a discrete block of resistive material, any metal-based resistor material can be engraved, including those based on precious metals. Thus, the resistive material layer can be covered with a patterned anti-contact agent such as an exposed and developed photoresist, and the underlying resistive material is etched. <Exposed portion Q This patent also describes the formation of a thin layer resistor, such thin The layer resistor includes an insulating substrate, discrete blocks of the resistive material layer, and a conductive material in electrical contact with the spaced locations on the resistive material layer block, the conductive material providing electrical connection of the resistive material block to the electronic circuit. The structures of the insulating material, the resistive material, and the conductive material can be formed by a selective characterization process. In the title "Multi-layered Substrate With Built-In Capacitor

Design且於2002年5月28日頒布之美國專利6,395,996中, 描述一種具有内建式電容器之多層基板,該等内建式電容 器係用以使由多層基板之電源平面與接地平面之間的電壓 波動所產生之高頻雜訊去耦。填充於電源平面與接地平面 131317.doc •20· 200908828 之間之通孔中且包括高介電常數的至少—種介電材料係用 以形成内建式電容器。 在標題為&quot;Capacitor Laminate For use In a Printed Circuit Board And As An Inter-connector&quot;且於 2002年4月 9 日頒布之美國專利6,370,012中’描述一種能夠形成更大電 路板或其類似結構之内部部分以為其提供電容之並聯電容 器結構。或者,該電容器可用作互連兩個不同電子組件A multi-layer substrate having a built-in capacitor for voltageing between a power plane and a ground plane of a multilayer substrate is described in U.S. Patent No. 6,395,996, issued toK. Decoupling of high frequency noise generated by fluctuations. At least one dielectric material filled in the via between the power plane and the ground plane 131317.doc •20· 200908828 and including a high dielectric constant is used to form a built-in capacitor. An internal portion capable of forming a larger circuit board or the like is described in U.S. Patent No. 6,370,012, issued to <RTIgt;Capacitor Laminate For Use In a Printed Circuit Board And As An Inter-connector&quot; and issued on April 9, 2002. Part of the parallel capacitor structure for which a capacitor is provided. Alternatively, the capacitor can be used to interconnect two different electronic components

(例如晶片載體、電路板及甚至半導體晶片)之互連器,同 時仍提供用於該等組件之一或多者的所需電容位準。電容 器包括至少一個内部導電層、於内部導體相反側上添加之 兩個額外導體層及無機介電材料(較佳為第二導體層外表 面上之氧化物層或塗覆於第二導體層之諸如鈦酸鋇之合適 介電材料)。另外,電容器包括位於無機介電材料頂上之 外部導體層,由此形成内部及所添加導電層與外部導體之 間的並聯電容器。 在2001年6月5日頒布之標題為&quot;Circuit Chip Package and Fabrication Meth〇d”之美國專利以仏加中,描述一種封 裝晶片之方法,其包括提供互連層之步驟,該互連層包括 具有第一側面及第二側面之絕緣材料、在第二側面之第二 側面金屬化部分上且不在第二側面之第二側面非金屬化部 分上圖案化之初始金屬〖、自第一側面延伸至第二側面金 屬化部分之一者的基板通孔,及自第一側面延伸至第二側 面非金屬化部分之晶片通孔。該方法亦包括將晶片定位於 第二側面上,其中晶片之晶片襯墊與晶片通孔對準,及圖 131317.doc 200908828 案化互連層第一側面之所選擇部分上及通孔中之連接金屬 化以便延伸至第二側面金屬化部分及晶片襯墊。在晶片周 圍模製&quot;基板''或其他介電材料。 在2001年3月27日頒布之標題為” Laminate an(j Method of Manufacture Thereof&quot;之美國專利6,2〇7,595中,描述一種用 於層狀結構中之織物樹脂介電材料及其製造方法。所得結 構適合用於印刷電路板或晶片載體基板中。樹脂可為諸如 當丽在世界範圍内大規模用於”FR4&quot;複合物之環氧樹脂。 基於雙馬來醯亞胺-三嗪(BT)之樹脂材料亦為可接受的, 本專利另外補充更佳地,樹脂為如此項技術中已知之酚系 可硬化樹脂材料,其具有約攝氏145度fC )之玻璃轉移溫 度。 在2000年11月21日頒布之標題為&quot;High Didectric c〇nstantInterconnectors (e.g., wafer carriers, circuit boards, and even semiconductor wafers) while still providing the required capacitance levels for one or more of such components. The capacitor includes at least one inner conductive layer, two additional conductor layers added on opposite sides of the inner conductor, and an inorganic dielectric material (preferably an oxide layer on the outer surface of the second conductor layer or coated on the second conductor layer) A suitable dielectric material such as barium titanate). Additionally, the capacitor includes an outer conductor layer on top of the inorganic dielectric material, thereby forming a shunt capacitor between the inner and the added conductive layer and the outer conductor. A method of packaging a wafer, including a step of providing an interconnect layer, is described in U.S. Patent No. 5, the entire disclosure of which is incorporated herein by reference. Including an insulating material having a first side and a second side, an initial metal patterned on the second side metallized portion of the second side and not on the second side non-metallized portion of the second side, from the first side a substrate via extending to one of the second side metallization portions and a wafer via extending from the first side to the second side non-metallized portion. The method also includes positioning the wafer on the second side, wherein the wafer The wafer liner is aligned with the through-wafer via, and the connection metallization in the selected portion of the first side of the first side of the interconnect layer and the via lining extends to the second side metallization and wafer lining of FIG. 131317.doc 200908828 Pad. Molding &quot;substrate' or other dielectric material around the wafer. Titled on March 27, 2001, "Merminate (J Method of Manufacture There of) US Patent 6, 2 7,595, describes a fabric resin dielectric material for use in a layered structure and a method of manufacturing the same. The resulting structure is suitable for use in a printed circuit board or a wafer carrier substrate. The resin can be used for large scale such as when Lili is used worldwide. "FR4&quot; composite epoxy resin. Resin materials based on bismaleimide-triazine (BT) are also acceptable, and the patent supplements more preferably, the resin is a phenolic system known in the art. A hardenable resin material having a glass transition temperature of about 145 degrees FC. The title issued on November 21, 2000 is &quot;High Didectric c〇nstant

Flexible Polyimide Film And Process Of Preparations&quot;之美國專利 M5〇,456中,描述一種可撓性、高介電常數聚醯亞胺薄 膜’其包含黏附性熱塑性聚醢亞胺薄膜之單一層或具有與 薄膜之一或兩侧黏結之黏附性熱塑性聚醯亞胺薄膜層之多 層聚醯亞胺薄膜,且具有分散於聚醯亞胺層之至少一者中 之4至85重量°/〇之鐵電陶瓷填充劑(諸如鈦酸鋇或經聚醯亞 胺塗佈之鈦酸鋇),且具有4至6〇之介電常數。高介電常數 聚醯亞胺薄膜可用於電子電路及電子組件中,諸如多層印 刷電路、可撓性電路、半導體封裝及内埋式(内部)薄膜電 容器。 在2000年7月4日頒布之標題為&quot;Bridging Method of 131317.doc 200908828A flexible, high dielectric constant polyimide film comprising a single layer of an adhesive thermoplastic polyimide film or having a film and a film of a flexible, high dielectric constant polyimide film, is described in U.S. Patent No. 5,456. a multilayer polyimide film having one or both sides of an adhesive thermoplastic polyimide film layer bonded thereto, and having a ferroelectric ceramic of 4 to 85 weight / 〇 dispersed in at least one of the polyimide layers A filler such as barium titanate or barium titanate coated with polyimide, and having a dielectric constant of 4 to 6 Torr. High dielectric constant Polyimine films are used in electronic circuits and electronic components such as multilayer printed circuits, flexible circuits, semiconductor packages, and embedded (internal) thin film capacitors. The title issued on July 4, 2000 is &quot;Bridging Method of 131317.doc 200908828

Interconnects for Integrated Circuit Packages’1之美國專利 6,084,306中,描述一種積體電路封裝,其具有第一及第二 層;與第一層整合成一體之複數個路由襯墊;分別安置於 第一層之上表面及下表面上之複數個上導管及下導管,上 導管中之一者舆下導管中之一者電連接;安置於第二層上 之複數個襯墊;將襯墊與下導管電連接之通孔及黏附於具 有黏結襯塾之第二層的晶片,該等黏結襯塾中之至少一者 與路由襯墊中之一者電連接。 在才示通為&quot;Individual Embedded Capacitors ForAn integrated circuit package having first and second layers; a plurality of routing pads integrated with the first layer; respectively disposed in the first layer, is described in US Pat. No. 6,084,306. a plurality of upper and lower conduits on the upper surface and the lower surface, one of the upper catheters being electrically connected; one of the plurality of liners disposed on the second layer; the gasket and the lower conduit electrically The through vias are bonded to the wafer having the second layer of bonded backing, and at least one of the bonded backings is electrically coupled to one of the routing pads. In the case of "Individual Embedded Capacitors For"

Laminated Printed Circuit Boards&quot;且於 2000年 5 月 30日頒布 之美國專利6,〇68,782中,描述一種在多層印刷電路板中製 ia·個別肷埋式電谷器之方法。該方法據稱適合於使用標 準印刷電路板製造技術來執行。電容器製造係基於採用第 一可圖案化絕緣體之順次建構技術。在圖案化絕緣體之 後,以高介電常數材料、通常聚合物/陶瓷複合物填充圖 案溝槽。電容值由圖案尺寸、複合物之厚度及介電常數來 定義。電容器電極及其他電路可藉由蝕刻層壓銅、藉由金 屬蒸鍍或藉由沈積導電油墨而形成。 在標題為,,Printed Circuit B〇ards Whh IntegratedLaminated Printed Circuit Boards &quot; and U.S. Patent No. 6, ,68,782, issued May 30, 2000, describes a method of making ia. individual buried-type electric grids in a multilayer printed circuit board. This method is said to be suitable for implementation using standard printed circuit board fabrication techniques. Capacitor fabrication is based on a sequential construction technique using a first patternable insulator. After patterning the insulator, the pattern trench is filled with a high dielectric constant material, typically a polymer/ceramic composite. The capacitance value is defined by the pattern size, the thickness of the composite, and the dielectric constant. Capacitor electrodes and other circuitry can be formed by etching laminated copper, by metal evaporation, or by depositing a conductive ink. In the title, Printed Circuit B〇ards Whh Integrated

Components And Meth〇d 〇f 之美國專利 6,021,05G中’描述—種具有複數個内埋式被動元件之多層 電路板及產生該電路板之方法’丨中被動元件可包括 電阻器、電容器及電感器。該方法包括以下步驟:製造其 八有電路之夕^印刷電路板的個別I,及隨後屏蔽具有 131317.doc •23- 200908828 電阻值;丨電值或磁值之聚合物油墨以形成電阻器、電容 器及電感器。將電路板之每一層固化以乾燥聚合物油墨且 其後將個別層黏結在一起以形成多層板。 在98年11月3日頒布之標題為&quot;Bare Chip Mounting Printed Circuit Board and a Method of ManufacturingIn U.S. Patent No. 6,021,05, the disclosure of which is incorporated herein by reference in its entirety, the entire disclosure of the entire disclosure of the entire disclosure of the entire disclosure of the entire disclosure of the entire disclosure of the entire disclosure of the entire disclosure of the entire disclosure of the entire disclosure of Device. The method comprises the steps of: manufacturing an individual I of a printed circuit board having its circuit, and subsequently shielding a polymer ink having a resistance value of 131317.doc • 23-200908828; a zeta value or a magnetic value to form a resistor, Capacitors and inductors. Each layer of the board is cured to dry the polymer ink and thereafter the individual layers are bonded together to form a multilayer board. The title issued on November 3, 1998 is &quot;Bare Chip Mounting Printed Circuit Board and a Method of Manufacturing

Thereof by Photo-etching”之美國專利 5,831,833 中,描述一 種製造”裸晶”多層印刷電路板之方法,其中將任意數目之 佈線電路導體層及絕緣層交替地堆疊於作為基板之印刷電 路板的一或兩個表面上,且使具有能夠安裝且樹脂包封裸 晶部分之上部開口的凹槽部分形成於印刷電路板之表面 上。在呈現之較佳實施例中,絕緣層之一者係由感光樹脂 製成,且安裝裸晶部分之凹槽部分係藉由光蝕刻由感光樹 月曰製成之絕緣層而形成。 在1995年6月20日頒布之標題為”Electr〇nic AssemMyA method of manufacturing a "bare-crystalline" multilayer printed circuit board in which any number of wiring circuit conductor layers and insulating layers are alternately stacked on a printed circuit board as a substrate, is described in US Pat. No. 5,831,833. One or both surfaces and a recessed portion having an upper portion of the resin-encapsulated bare portion is formed on the surface of the printed circuit board. In the preferred embodiment presented, one of the insulating layers It is made of a photosensitive resin, and the groove portion of the bare portion is formed by photolithography of an insulating layer made of a photosensitive tree. The title issued on June 20, 1995 is "Electr〇nic AssemMy".

Having a Double-sided Leadless Component&quot;之美國專利 5,426,263中,描述一種具有雙側無導線組件及兩個印刷電 路板之電子總成。該組件在兩個相對主要表面上具有複數 個電子終4或概墊。印刷電路板之每一者均具有印刷電路 圖案’該印刷電路圖案具有對應於雙側無導線組件之兩侧 上之電子終端的複數個襯塾。組件一側上之電子終端與第 板上之襯墊連接且無導線組件另一側上之電子終端與第 一板上之襯塾連接。印刷電路板接合在一起以形成多層電 路板’以使得雙側無導線組件内埋或凹陷於其内。該板件 使用焊料與印刷電路板之襯墊連接。 131317.doc -24- 200908828 在1994年i月18曰頒布之標題為,,丁hree dimensi〇nai Memory Card Structure with Internal 此⑽ Chip 她&quot;之 美國專利5,2_92中,描述-種包括植人式半導體晶片之 内邛隹陣列的卡結構。§亥卡結構包括電源芯及複數個晶 片芯。每一晶片芯在電源芯之相對表面上與電源芯接合, 且每一晶片芯包括具有晶片孔之二維陣列的補償器芯。每 曰曰片孔使得半導體晶片之各別一者可植入其甲。另外, 將柔性介電材料安置於除晶片孔底部以外之補償器芯的主 要表面上。柔性介電材料具有低介電常數且具有與半導體 曰曰片及補償益芯之彼等熱膨脹係數相容之熱膨脹係數,以 使得維持與晶片及補償器芯之熱膨脹穩定性。 在標題為&quot;Printed Circuit Board Having AnAn electronic assembly having a double-sided wireless assembly and two printed circuit boards is described in U.S. Patent No. 5,426,263, the entire disclosure of which is incorporated herein. The assembly has a plurality of electronic final 4 or pads on two opposing major surfaces. Each of the printed circuit boards has a printed circuit pattern&apos; having a plurality of linings corresponding to the electronic terminals on either side of the two-sided wireless assembly. The electronic terminals on one side of the assembly are connected to the pads on the first board and the electronic terminals on the other side of the no-wire assembly are connected to the linings on the first board. The printed circuit boards are joined together to form a multilayer circuit board ' such that the double-sided wireless assembly is embedded or recessed therein. The board is soldered to the pad of the printed circuit board. 131317.doc -24- 200908828 The title issued in the first month of January 1994 is: Ding hree dimensi〇nai Memory Card Structure with Internal (10) Chip She &quot; US Patent 5, 2_92, described - including the implant A card structure of an inner array of semiconductor wafers. § Hikka structure includes a power core and a plurality of wafer cores. Each wafer core is bonded to a power core on an opposite surface of the power core, and each wafer core includes a compensator core having a two-dimensional array of wafer apertures. Each of the wafer apertures allows one of the semiconductor wafers to be implanted in the armor. Additionally, a flexible dielectric material is placed over the major surface of the compensator core except the bottom of the wafer aperture. The flexible dielectric material has a low dielectric constant and has a coefficient of thermal expansion that is compatible with the thermal expansion coefficients of the semiconductor wafer and the compensation core to maintain thermal expansion stability with the wafer and the compensator core. In the title &quot;Printed Circuit Board Having An

Decoupling Capacitive Element” 且於 1992 年 11 月 i〇 日頒布 之5,162,977中,描述一種包括高電容功率分布芯之pcB, 其衣造與標準印刷電路板總成技術相容。高電容芯由具有 鬲介電常數之平面元件分隔之接地平面及電源平面組成。 阿μ電常數材料通常為浸潰有黏結材料(諸如負載有鐵電 陶瓷物質之具有高介電常數的環氧樹脂)之玻璃纖維。鐵 電陶瓷物質通常為與環氧黏結材料組合之奈米粉末。根據 本專利,功率分布芯之所得電容足以完全消除對使上 之電容器去耦的需要。然而,在介電層中使用預焙燒及研 磨之陶1奈米粉末對形成通孔(允許pCB之導電層之間電子 L乜的導電孔)造成障礙。預焙燒及研磨之陶瓷奈米粉末 顆粒具有500-20,000奈米(nm)範圍内之典型尺寸。此外, 131317.doc -25- 200908828 此範圍中之顆粒分布通常相當廣泛,此意謂可與5〇〇 nm 粒同時存在10,000 nm顆粒。介電層内不同尺寸顆粒7 布通常對通孔形成造成主要障礙,其中通孔具有極之刀 徑,歸因於更大顆粒之存在,其在該行業中亦稱 孔。與預培燒陶竟奈米粉末相關之另一問題為介電層經典 實質性電壓而不發生橫過層之擊穿的能力。通常,心 PCB内之電容層經受至少_伏特(v)以便有資格作為用: ㈣構造之可#組件。在電容層内,預培燒㈣奈米粉末 中之相對更大陶究顆粒之存在防止使用極薄層,因為鄰近 大顆粒之邊界提供電壓擊穿之路徑。因為如上述方程式所 示,更大平面電容亦可藉由減小介電層之厚度來達成,所 以此更進-步係不當的。厚度因此受其中顆粒 制。 在1992年3月24日頒彳之標題為,,Three-dimensional M_ry Card Structure 職h ㈣咖丨 Dbect ⑶卩她ch_t,之美 國專利5,G99,3G9中,描述—種含有半導體記憶體晶片之嵌 埋式三維陣列的記憶卡結構。該卡結構包括以重疊關係接 合在一起之至少一個記愔栌 己亡'體心及至少—個電源芯。每一圮 憶體芯包含在平面之每一側上具有晶片孔位置之二維陣列 的銅-錄鋼-銅(CIC)導熱體平面。聚四氣乙稀(删)覆蓋除 在晶片孔底部以外之導教辦巫 等熟體千面的主要表面。將記憶體晶 片置於晶片孔中且由絕緣及佈線層覆蓋。每一電源芯包含 至少一個CIC導電體平而 十面及覆盍導電體平面之主要表面的 PTFE。為沿卡結構内部之垂直以及水平平面提供電連接 131317.doc -26- 200908828 路徑及冷卻路徑作準備。 在標題為&quot;Capacitor Laminate For Use In Capacitive Printed Circuit Boards And Methods Of Manufacture&quot;且於 1992年1月7日頒布之美國專利5,〇79,〇69中,描述一種據稱 用以提供安裝於PCB上之裝置之旁路電容性功能的電容器 層壓物,該電容器層壓物係由習知導電層及介電層形成, 由此每一個別外部裝置據稱係由電容器層壓物之成比例部Decoupling Capacitive Element" and 5,162,977 issued November 1, 1992, describes a pcB comprising a high capacitance power distribution core that is compatible with standard printed circuit board assembly technology. The high capacitance core has The dielectric constant of the plane constant of the dielectric constant consists of a ground plane and a power plane. The aμ constant energy material is usually a glass fiber impregnated with a bonding material such as an epoxy resin having a high dielectric constant loaded with a ferroelectric ceramic material. The ferroelectric ceramic material is usually a nano powder combined with an epoxy bonding material. According to this patent, the resulting capacitance of the power distribution core is sufficient to completely eliminate the need to decouple the capacitor. However, the use of the pre-layer in the dielectric layer The calcined and ground ceramic 1 nm powder poses an obstacle to the formation of through holes (electroconductive holes that allow electrons between the conductive layers of pCB). The pre-baked and ground ceramic nano-powder particles have a particle size of 500-20,000 nm (nm). Typical dimensions in the range. In addition, 131317.doc -25- 200908828 The particle distribution in this range is usually quite extensive, which means that it can coexist with 5〇〇nm particles. 10,000 nm particles. Particles of different sizes in the dielectric layer 7 are often the main obstacles to the formation of vias, which have a very large tool radius, which is also known as pores in the industry due to the presence of larger particles. Another problem associated with pre-cooked ceramics is the classic substantial voltage of the dielectric layer without the ability to traverse the layer. Typically, the capacitive layer within the core PCB is subjected to at least _volt (v) to have Qualifications are used as: (4) Construction of the components. In the capacitor layer, the presence of relatively larger ceramic particles in the pre-cooked (four) nano-powder prevents the use of very thin layers, because the voltage near the boundary of the large particles provides voltage breakdown. Path. Because the larger planar capacitance can also be achieved by reducing the thickness of the dielectric layer as shown in the equation above, this is further step-by-step. The thickness is therefore made of particles. In March 24, 1992 The title of the Japanese version is:, Three-dimensional M_ry Card Structure, h (4) Curry Dbect (3) 卩 her ch_t, US Patent 5, G99, 3G9, describes an embedded three-dimensional array containing semiconductor memory chips. Memory card structure The card structure includes at least one memory core and at least one power core bonded together in an overlapping relationship. Each memory core includes a two-dimensional array having wafer hole locations on each side of the plane The copper-recorded steel-copper (CIC) thermal conductor plane. The polytetrafluoroethylene (deleted) covers the main surface of the mature body except the bottom of the wafer hole. The memory wafer is placed on the wafer. The holes are covered by an insulating and wiring layer. Each of the power cores comprises at least one CIC conductor that is flat and ten-sided and covers the major surface of the conductor plane. Provide electrical connections for the vertical and horizontal planes inside the card structure. 131317.doc -26- 200908828 Prepare the path and cooling path. In U.S. Patent No. 5, 〇79, 〇69, issued on Jan. 7, 1992, the entire disclosure of which is incorporated herein by reference. Capacitor laminate of a bypass capacitive function of the device, the capacitor laminate being formed from a conventional conductive layer and a dielectric layer, whereby each individual external device is said to be proportional to the capacitor laminate unit

分且由來自電容器層壓物之其他部分借入之電容提供電 容’電容器層壓物之電容性功能視裝置之 而定。亦即,所得PCB仍需要利用其上之外部裝置= 此不提供在當今技術中需要且需求之上述PCB外表面積有 效面積節省。 1年5月14日頒布之標題為„Hermetic卩扣匕# integrated Clrcuit chips&quot;之美國專利 5,〇i6,〇85令描述一種 ’、有用於固持半導體晶片之内部凹槽的氣密性封裝。凹槽 為正方形且设定為相對於封裝之矩形外部呈45度。封裝使 用構成封裝之導電平面的陶£層,其中内部開口呈階梯狀 立提仏連接點。其中具有晶片開口之最下層可位於總成外 、提t、較淺之晶片開口凹槽。此當然不同於内部形成之 具有上迷性質的電容或半導體組件,但確實提及用於指定 目的之内部H層作為内部結構之部分。 俜=專利、》開案及引用之同在申請中之申請案的教示 係以引用的方式併入本文中。 ★在某些上述專利中提及之已用於内部導電結構中之 131317.doc -27- 200908828 市售介電粉末已知由適當化學計量之量的鋇、鈣、鈦及其 類似物之氧化物或氧化物前驅體(例如碳酸鹽、氫氧化物 或硝酸鹽)之混合物的高溫、固態反應而產生。在該等煅 燒製程中,反應物經濕式研磨以實現所需最、終混合物。所 传漿液經乾燥且在有時高達攝氏1,300度fC)之高溫下焙燒 以實現所f固g反應。其後,培燒產物經研磨以產生粉 末。雖然由固相反應產生之預焙燒且研磨之介電調配物可 f . 為°午夕電子應用所接受’但是該等調配物具有若干缺點。 首先’研磨步料充當肖染物之來源,其可不利地影響電 學特性。其次,研磨產物可由不規則形狀之破碎聚集體組 成,其通常尺寸太大且具有5〇〇_2〇,〇〇〇 nm之寬粒度分布。 因此,使用該等粉末產生之薄膜限於大於最大顆粒尺寸之 厚度 '第一,使用預焙燒之經研磨陶瓷粉末產生之粉末懸 /予液或複合物必須在分散之後立刻使用,此係歸因於與大 顆粒相關之高沈降速率。顆粒大於2GG nm之鈦酸鋇的穩定 会吉 曰 才目 2¾. X } / 〇 、’、σ曰曰两方晶系且在高溫下歸因於相變而發生介電常數 之大幅增加。因此顯然依賴於使用奈米粉末作為PCB内部 組件或其類似物之部分之有利特徵的PCB製造方法(諸如在 上述專利之所選擇者中所述之彼等方法)具有對於提供就 内Ρ電阻、電容或其他電學特性而言具有最佳功能性能的 pc:有害之各種不當方面。 斤萵最終產品嘗試滿足當今小型化需求(包括利用其 中之π选度圖案之信號線及通孔(定義於下文))時,上述情 況尤其直眘 , /見。如巳知,該等通孔及信號線之極緊密定位可 131317.doc -28- 200908828 導致出現於其中之不連續性,其將不利地影響產品尤其在 尚頻率(其在當今許多產品中亦為需要的)下的成功操作。 該等不連續性亦可為所謂通孔&quot;線腳&quot;之結果,其中來自經 〆等l孔傳遞之同速仏號的能量自通孔末端(稱為&quot;線腳&quot;) '、,彈回&quot;。該等反射及共振可足以造成信號降級,尤其如所 述當信號線及/或通孔彼此非常接近地定位時。因此,該 等不連續性之成功消除為許多當今電路化基板(尤其意欲 使用阿雄、度圖案之通孔及/或信號線來傳遞高速信號之彼 等電路化基板)所極為需要。 本發明尤其㈣於藉由提供内部t阻器材料作為内部電 路結構之部分來大體上消除許多該^連續性。藉由如 此,本發明能夠在電路内之關鍵位置處減小電容及增加高 頻電阻’由此改良系統效能。咸信具有該等特徵以及自本 文中之教示可辨別之其他特徵的本發明將構成此項技術中 之顯著進步。 【發明内容】 因此本毛日月之主要目標為藉由提供具有本文中教示之 有利特徵的電路化基板來增強電路化基板技術。 本發明之另—目標為提供-種可以相對便利之方式且以 相對低之成本實現之製造該電路化基板的方法。 本《明之另-目標為提供—種能夠使用該電路化基板且 因此受益於其若干有利特徵的電子總成。 本發明之另目標為提供_種能夠利用電路化基板作為 一p刀以因此亦爻益於其若干有利特徵的資訊處理系統。 1313l7.doc •29- 200908828 根據本發明之一態樣,提供 為其部分之電路之電路化基板的方法,該方法包含以下步 驟.提供第一介電層,在第一介電層上形成第一導電體, 在第一導電體内形成開口’在開口内定位—定數量之電阻 器材料,大體上在開口内之該一定數量之電阻器材料上形 成第二介電層,在第二介電層上形成第二導電體,及在第 二與第一導電體之間形成電連接,該一定數量之電阻器材 f 料用以大體上減小導電體之間的電容且增加導電體之間之 電連接中的高頻電阻。 根據本發明之另―態樣’提供—種電路化基板,宜包含 介電層,定位於第一介電層上且其令包括開口:第一 ¥电體’開口内一索叙县々予 旦 '内★數量之電阻器材料,大體上定位於該 声:之:之電阻器材料上之第二介電層’定位於第二介電 曰上之第二導電體,及第二與第一導電體之 該-定數量之電阻器材料笛, 體之間的電容且增加第一與第^減小弟—與第二導電 高頻電阻。 與弟-導電體之間之電連接中的 根據本發明之另一態樣, 子總成,該電路化基板包括=介:包二'路化基板之電 層上且其中包括開口之第:立於第-介電 阻器材料,大體上定位料二二開=内—定數量之電 二介電層,定位於篦人 里之電阻器材料上之第 第-導電體層上之第二導電體,及第二-辛电體之間之電連接,該- 大體上減小第—與第《電阻器材料用以 體之間的電容且增加第—盥第 131317.doc •30· 200908828 二導電體之間之電連接中的高頻電阻,且至少-個電子組 件定位於電路化基板上且與其電耦接。 【實施方式】 此為更好地理解本發明以及其另外及其他目標、優點及性 能’結合上述圖式參閱以下揭示内容及隨附申請專利範 圍。在各圖中使用類似圖號以識別該等圖式中之類似: 件。 70 如本文中所用之術語&quot;電路化基板”意謂包括具有至少— 個(且較佳為多個)介電層及至少一個(且較佳為多個^金 導電層的基板。實例包括由諸如纖維玻璃增強之環氧樹脂 (-些在此項技術中稱作&quot;FR_4&quot;介電材料)、聚四氟乙烤^ 氟龍(Teflon))、聚醯亞胺、聚醯胺、氰酸酯樹脂、光可成 像材料及其他類似材料之介電材料製成之結構,其中導電 層各自為包含諸如銅之合適冶金材料的金屬層(例如,電 源、信號及/或接地)’但可包括或包含其他金屬(例如鎳、 鋁等)或其合金。以下本文中將更詳細描述其他實例。如 上所述之該等電路化基板之實例包括印刷電路板(或卡)及 晶片載體。咸信本發明之教示亦適用於所謂&quot;撓性&quot;電路(其 使用諸如聚醯亞胺之介電材料)及使用陶瓷或其他非聚人 物型介電層之彼等電路,後者之一種實例為適合於具有— 或夕個半導體晶片安裝於其上之所謂多層陶瓷(MLC)模 組。 術語&quot;電子總成思s月至少一種如本文中所定義之電路化 基板與至少一種與其電耦接且形成該總成之部分之電子組 131317.doc -31 · 200908828 件的組合。已知該等總成之實例包括晶片载體,其包括半 導體晶片作為電子組件,該晶片通常定位於基板上且與基 板外表面上之佈、線(例純塾)耗接或使用—或多個通孔與 内部導體耦接。或許最熟知之該總成為通常其上具有若干 該等外部電子組件(包括可能之一或多個晶片載體)且與 PCB之内部電路及/或彼此純的習知印刷電路板(PCB)。 如本文中所用之術語&quot;電子組件,,意謂諸如半導體晶片及 其類似物之組件,其適合於定位於該等基板之外部導電表 面上且與基板電耦接以將信號自該組件傳遞至基板中,該 等信號可於基板上傳遞至其他組件(包括亦安裝於基 之彼等組件)以及其他組件(諸如該基板形成其部分之更大 電子系統的彼等組件)。 如本文中所用之術語&quot;資訊處理系統,,將意謂主要經設計 以計算、歸類'處理、傳輸、接收、擷取、產生、轉換、 儲存、顯示、表現、量測叫貞測'記錄、重現、處置或利 用任何形式之資訊、情報或資料用於業務、科學、控制或 其他目的之任何工具或工具之聚集體。實例包括個人電腦 及諸如祠服器、主機等之較大處理器。該等系統通常包括 或夕個PCB、晶片載體等作為其組成部分。例如,通常 使用之PCB包括安裝於其上之複數個各種組件,諸如晶片 載體、電容器、電阻器、模組等。一種該pCB可稱作&quot;主 板,而各種其他板(或卡)可使用合適電連接器安裝於其 上。 約五十 術语微米顆粒&quot;意謂具有約一微米(〗〇〇〇奈米)至 131317.doc -32- 200908828 微米(5_0奈米)之平均尺寸的顆粒。 =中所用之術語”奈米顆粒,,意謂具有約。。_ “)至約一微米(1_奈米)之平均尺寸的顆粒。 (用以形成本文中定義之 右# h ,, n , 卩4的材料應理解為包括具 有微未顆粒及/或”奈米顆粒”作為其部分之粉末。) 。广所用之術語”絲網印刷&quot;意謂包括如當今習知使 用之絲網印刷及模板印刷方法。該 、 如使用_ g # '使猎以例 之絲網或模板。“材科(例如油墨、導電組合物等) 如本文中所用之術語&quot;涵7丨”立^田a „ . 孔,各s月包括行業中亦通常稱為 ,以通常1基板之—個表面至其中預定距離之 口;稱為&quot;内部通孔',者,其為定位於基板内部之通孔或 :口且通常形成於一或多個内層β,隨後將其層壓至其他 層以形成最終結構;及稱為&quot;鑛通孔&quot;者(亦稱為PTHS),其 f常貫穿基板之整個厚度。所有該等各種開口形成穿過基 板之電子路m其上通f包括—或多”電層⑼如鑛 銅該等開η通常使用機械鑽孔或雷射切除而形成。Capacitance is provided by a capacitor borrowed from other portions of the capacitor laminate. The capacitive function of the capacitor laminate depends on the device. That is, the resulting PCB still needs to utilize the external device on it = this does not provide the above-mentioned effective surface area savings of the PCB external surface that is required and required in today's technology. U.S. Patent No. 5, 〇i6, 〇 85, issued on May 14, 1st, which is incorporated herein by reference to the entire disclosure of the disclosure of the disclosure of the disclosure of the disclosure of the disclosure of the disclosure of the disclosure of the utility of the disclosure of the disclosure of the disclosure of the disclosure of the disclosure of the disclosure of the utility of The groove is square and is set at 45 degrees to the outside of the rectangular shape of the package. The package uses a layer of the conductive plane constituting the package, wherein the inner opening is a stepped riser connection point, wherein the lowermost layer of the wafer opening can be Located outside the assembly, t, shallower wafer opening recess. This is of course different from the internally formed capacitive or semiconducting components, but does mention the internal H layer for the specified purpose as part of the internal structure. The teachings of the application in the application, which is incorporated herein by reference, is incorporated herein by reference. Doc -27- 200908828 Commercially available dielectric powders are known to have oxides or oxide precursors (such as carbonates, hydroxides or nitrates) of cerium, calcium, titanium and the like in an appropriate stoichiometric amount. The mixture of salts) is produced by a high temperature, solid state reaction. In the calcination process, the reactants are wet ground to achieve the desired final and final mixture. The slurry is dried and sometimes up to 1,300 degrees FC. Calcined at a high temperature to achieve the f-g reaction. Thereafter, the calcined product is ground to produce a powder. Although the pre-baked and ground dielectric formulation produced by the solid phase reaction can be used. Accepted 'but these formulations have several disadvantages. Firstly, the 'grinding step' acts as a source of smear, which can adversely affect electrical properties. Second, the abrasive product can be composed of irregularly shaped broken aggregates, which are usually too large in size And having a width distribution of 5 〇〇 2 〇, 〇〇〇 nm. Therefore, the film produced using the powders is limited to a thickness greater than the maximum particle size 'first, using a pre-fired ground ceramic powder to produce a powder suspension The liquid or composite must be used immediately after dispersion, due to the high sedimentation rate associated with large particles. The stability of barium titanate with particles larger than 2 GG nm will be met. 3⁄4. X } / 〇, ', σ曰曰 two crystals and a large increase in dielectric constant due to phase transition at high temperatures. Therefore, it is obviously dependent on the use of nanopowder as a PCB internal component or the like. Part of the advantageous features of the PCB manufacturing method, such as those described in the selection of the above patents, have the benefit of providing PC with optimum functional performance in terms of internal resistance, capacitance or other electrical properties: All kinds of improper aspects. The above situation is especially cautious when you try to meet the needs of today's miniaturization (including the use of the signal line and through hole (defined below) of the π-selection pattern). The extremely close positioning of such vias and signal lines can result in discontinuities occurring therein, which will adversely affect the product, especially at still frequencies (which are also required in many of today's products). Successful operation under ). These discontinuities may also be the result of a so-called through-hole &quot;wire foot&quot;, in which the energy of the same velocity nickname transmitted from the l-hole, such as the 〆, is from the end of the through-hole (referred to as &quot;rope&quot;)', Bounce back &quot;. Such reflections and resonances may be sufficient to cause signal degradation, particularly as described when the signal lines and/or vias are positioned in close proximity to one another. Therefore, the successful elimination of such discontinuities is highly desirable for many of today's circuitized substrates, particularly such circuitized substrates that are intended to transmit high speed signals using vias and/or signal lines. The invention in particular (d) substantially eliminates a number of such continuity by providing an internal t-resist material as part of the internal circuit structure. By doing so, the present invention is capable of reducing capacitance and increasing high frequency resistance at critical locations within the circuit&apos; thereby improving system performance. The present invention having such features and other features discernible from the teachings herein will constitute a significant advancement in the art. SUMMARY OF THE INVENTION It is therefore a primary goal of the present invention to enhance circuitized substrate technology by providing a circuitized substrate having the advantageous features taught herein. Another object of the present invention is to provide a method of fabricating the circuitized substrate that can be implemented in a relatively convenient manner and at relatively low cost. The present invention is directed to providing an electronic assembly capable of using the circuitized substrate and thus benefiting from several advantageous features thereof. Another object of the present invention is to provide an information processing system that can utilize a circuitized substrate as a p-knife to thereby also benefit from several advantageous features thereof. 1313l7.doc • 29-200908828 A method of providing a circuitized substrate for a portion of its circuitry, comprising the steps of providing a first dielectric layer and forming a first dielectric layer An electrical conductor, forming an opening in the first conductive body to position a predetermined amount of resistor material, substantially forming a second dielectric layer on the certain amount of resistor material in the opening, in the second dielectric layer Forming a second electrical conductor on the electrical layer and forming an electrical connection between the second electrical conductor and the first electrical conductor, the amount of electrical resistance material being used to substantially reduce capacitance between the electrical conductors and increase electrical conductors The high frequency resistance in the electrical connection. According to another aspect of the present invention, a circuitized substrate is provided, which preferably includes a dielectric layer, is positioned on the first dielectric layer, and includes an opening: a first electric body opening in a Susie County The 'inside ★ number of resistor materials are generally positioned at the sound: the second dielectric layer on the resistor material 'the second conductor positioned on the second dielectric layer, and the second and the second The predetermined amount of resistor material of a conductor, the capacitance between the bodies, and the first and second reductions - and the second conductive high frequency resistance. According to another aspect of the present invention, in an electrical connection between a conductor and a conductor, the sub-assembly includes: a dielectric layer on the second layer of the substrate and including an opening therein: Standing on the first-dielectric resistor material, substantially positioning the material two-two-on=inner-quantity electric two-dielectric layer, and positioning the second electric conductor on the first-conductor layer on the resistor material in the monk And the electrical connection between the second and the symplectic body, which - substantially reduces the capacitance between the first and the "resistor material for the body and increases the first - 盥 131317.doc • 30 · 200908828 two conductive A high frequency resistor in the electrical connection between the bodies, and at least one of the electronic components is positioned on and electrically coupled to the circuitized substrate. [Embodiment] This is a better understanding of the present invention, as well as additional and other objects, advantages and features. Similar figure numbers are used in the figures to identify similar ones in the drawings: 70. The term &quot;circuitized substrate&quot; as used herein is meant to include a substrate having at least one (and preferably a plurality) of dielectric layers and at least one (and preferably a plurality of gold conductive layers). Examples include Epoxy resins such as fiberglass reinforced (some of which are referred to in the art as &quot;FR_4&quot; dielectric materials), polytetrafluoroethylene (Teflon), polythenimine, polyamine, A structure made of a dielectric material of a cyanate resin, a photoimageable material, and other similar materials, wherein the conductive layers are each a metal layer (eg, power, signal, and/or ground) comprising a suitable metallurgical material such as copper. Other metals (e.g., nickel, aluminum, etc.) or alloys thereof may be included or included. Other examples are described in more detail herein below. Examples of such circuitized substrates as described above include printed circuit boards (or cards) and wafer carriers. The teachings of the present invention are also applicable to so-called &quot;flexible&quot; circuits that use dielectric materials such as polyimides, and circuits that use ceramic or other non-poly character dielectric layers, one of which An example is A so-called multilayer ceramic (MLC) module having or having a semiconductor wafer mounted thereon. The term &quot;electronic assembly is at least one circuitized substrate as defined herein and at least one electrically coupled thereto And forming a combination of electronic components 131317.doc-31.200908828 of the assembly. Examples of such assemblies are known to include a wafer carrier that includes a semiconductor wafer as an electronic component, the wafer being typically positioned on a substrate and Interspersed with or used with cloth, wires (such as pure germanium) on the outer surface of the substrate—or multiple vias that are coupled to the inner conductor. Perhaps most well known, this generally has a number of such external electronic components (including possible One or more wafer carriers) and a conventional printed circuit board (PCB) that is pure to the internal circuitry of the PCB and/or pure to each other. As used herein, the term &quot;electronic component,&quot; means, for example, a semiconductor wafer and the like. An assembly adapted to be positioned on an outer conductive surface of the substrate and electrically coupled to the substrate to transfer signals from the component to the substrate, the signals being transferable to the substrate Components (including components that are also mounted to the base) and other components (such as those components of the larger electronic system in which the substrate forms part of it). As used herein, the term &quot;information processing system,&quot; Designed to calculate, classify, 'process, transmit, receive, capture, generate, convert, store, display, perform, measure, detect, record, reproduce, dispose of, or use any form of information, intelligence, or information. An aggregate of any tools or tools for business, scientific, control or other purposes. Examples include personal computers and larger processors such as servers, mainframes, etc. These systems typically include or as a PCB, wafer carrier, etc. A component thereof, for example, a commonly used PCB includes a plurality of various components mounted thereon, such as a wafer carrier, a capacitor, a resistor, a module, and the like. One such pCB can be referred to as a &quot; main board, and various other boards (or cards) can be mounted thereon using suitable electrical connectors. About fifty terms micron particles mean "particles having an average size of about one micron (〗 〖Nano) to 131317.doc -32 - 200908828 micron (5_0 nm). The term "nanoparticles" as used in the meaning of particles having an average size of about one micron (1 - nanometer). (Materials used to form the right #h,, n, 卩4 as defined herein are understood to include powders having micro-unparticles and/or "nanoparticles" as part of them.). The term "screen printing" is used broadly to mean screen printing and stencil printing methods as is conventional in the art. For example, use _g # ' to make a screen or template for hunting. Ink, conductive composition, etc.) As used herein, the term &quot;涵7丨"立田田 。. Holes, each s month, is also commonly referred to in the industry, with a surface of usually 1 substrate to a predetermined distance therein Port; referred to as &quot;internal vias, which are vias or ports that are positioned inside the substrate and are typically formed in one or more inner layers β, which are then laminated to other layers to form the final structure; Also known as &quot;mine through hole&quot; (also known as PTHS), its f often penetrates the entire thickness of the substrate. All of these various openings are formed through an electronic circuit m of the substrate through which f-including or -" electrical layers (9) such as mineral copper are typically formed using mechanical drilling or laser ablation.

Ht ’提供介電材料層1}。層u之介電材料可選自 上文所列之彼等材料’且在—實财以上賴維玻璃增 強之環氧樹脂(&quot;FR4”)材料。在層11頂上為至少一個導電體 13 ’較佳為銅或銅合金。在一實施例中,導體13係由黏結 (例如使用習知PCB處理以實心片材形式層壓)至層li之較 大片材材料形成且隨後經受用於PCB行業中之已知光微影 以最終界定導體之組態。簡言之,在該製程中,光 1313l7.doc -33- 200908828Ht ' provides a layer of dielectric material 1}. The dielectric material of layer u may be selected from the materials listed above and in the oligo-glass reinforced epoxy (&quot;FR4") material. At least one electrical conductor 13 is on top of layer 11. 'Preferably copper or copper alloy. In one embodiment, the conductor 13 is formed by bonding (e.g., laminated in the form of a solid sheet using conventional PCB processing) to a larger sheet material of layer li and subsequently subjected to Known photolithography in the PCB industry to ultimately define the configuration of the conductor. In short, in this process, light 1313l7.doc -33- 200908828

阻經塗覆、圖案化且顯影(在所選擇位置中移除)。隨後將 姓刻劑(例如氯化銅)塗覆於暴露表面且將其中之材料㈣ 去。在圖1中所示之實例中,導體13包括形成(較佳藉由該 I虫刻)於其中之開口 15,但可為任何其他可接受之组離, 包括多個開口以及鄰近之信號線、襯墊等。或者,可:用 習知濺鍍操作形成導體13,其中通常提供種子層,之後在 其上濺鍍至少一個導電層。在該等實施例中,層u可具有 約一密耳至約二十密耳(一密耳為一吋之千分之一厚 度’而導體13可包括約0.2密耳至約2·5密耳之厚度。如由 下文所理解,導體13形成本發明電路之部分。更特定而 舌,其中具有開口 15之導體可描述為”反襯墊&quot;,其意謂信 號傳導構件(例如鍍通孔,如下文更詳細定義)將經開口傳 遞且不與導體直接電接觸。 第二介電層17(圖2)固定於導體13之頂上後的下一步驟 為可選步驟且涉及處理導體13之上表面以增強介電層17與 導體表面之黏附力。為實現此,較佳使暴露之上表面經受 氧化物(或氧化)替代製程。該製程之一個良好實例涉及將 導體暴露於所謂&quot;BondFilm&quot;溶液,該溶液當前在市場上以 此名稱購自Atotech Deutschland GmbH ’其為具有美國辦 公地址為 1750 Overview Drive,R〇ck mu,s〇uth Carolina 之國際公司。BondFilm溶液主要包含三種組份:〇)硫 酸;(2)過氧化氫及(3)銅,以及額外At〇tech DeutschUnd GmbH專屬組份。如所述,該製程亦稱為氧化物替代製 程’意謂其不導致在所處理材料上形成氧化物層。舉例而 131317.doc -34- 200908828 5 ’導體13之上表面在绝总 在焱又BondFilm”製程&quot;後之均方 (RMS)粗糙度(標準量測方 χ Λ)值了為約0.6微米,且峰值為 約1.2至約2.2微米。B〇ndFiim製裎、、牛月/ 表杈^步及在攝氏約20至35产 (°C )之溶液溫度下將導體零、、杳 又 Μ,又,貝於溶液中歷時約5至約12〇秒 鐘之時間段。作為此處理之部分,首先將導體之外表面清 潔及除油’之後進行表面之微_。最後,塗覆薄有機塗 層。在-實例中,該薄有機塗層為苯并三唾且具有約加矣 (AngStr〇m)至約5〇0埃之厚度。該薄塗層在後續處理期間保 留在導體之外表面上。因為直士〇 U马具如此之溥,所以未展示於圖 式中。可用於本發明之替代氧化物冑程的其他實例在行業 中為已知的且認為無需進一步描述。Blocking, patterning, and developing (removed in selected locations). A surname (such as copper chloride) is then applied to the exposed surface and the material (4) is removed. In the example shown in FIG. 1, the conductor 13 includes an opening 15 formed therein (preferably by the I), but may be any other acceptable group, including a plurality of openings and adjacent signal lines. , padding, etc. Alternatively, the conductor 13 may be formed by a conventional sputtering operation in which a seed layer is typically provided, after which at least one conductive layer is sputtered thereon. In such embodiments, layer u can have from about one mil to about twenty mils (one mil is one thousandth of a thickness) and conductor 13 can include from about 0.2 mils to about 2.5 mils. The thickness of the ear. As will be understood hereinafter, the conductor 13 forms part of the circuit of the invention. More specifically, the tongue, wherein the conductor having the opening 15 can be described as a "anti-pad", which means a signal conducting member (eg, plated through) The holes, as defined in more detail below, will pass through the opening and are not in direct electrical contact with the conductor. The next step after the second dielectric layer 17 (Fig. 2) is fixed on top of the conductor 13 is an optional step and involves processing the conductor 13 The upper surface enhances the adhesion of the dielectric layer 17 to the surface of the conductor. To achieve this, it is preferred to subject the exposed upper surface to an oxide (or oxidation) replacement process. A good example of this process involves exposing the conductor to a so-called &quot;;BondFilm&quot; solution, which is currently available on the market under the name Atotech Deutschland GmbH. 'This is an international company with US office address 1750 Overview Drive, R〇ck mu, s〇uth Carolina. BondFilm solution main package Three components: 〇) sulphuric acid; (2) hydrogen peroxide and (3) copper, and additional At〇tech DeutschUnd GmbH exclusive components. As stated, the process is also known as the oxide replacement process' means that it does not cause An oxide layer is formed on the treated material. For example, 131317.doc -34- 200908828 5 'The surface of the conductor 13 is always in the meandering and BondFilm process' after the mean square (RMS) roughness (standard measurement) The value of χ) is about 0.6 microns and the peak is from about 1.2 to about 2.2 microns. B〇ndFiim 裎 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , 12 seconds period. As part of this treatment, the surface of the conductor is first cleaned and degreased, followed by a slight surface _. Finally, a thin organic coating is applied. In an example, the thin organic coating is benzotriene and has a thickness of from about 矣 (AngStr〇m) to about 5,000 angstroms. The thin coating remains on the outer surface of the conductor during subsequent processing. Because the Straight 〇 〇 U horse is so embarrassing, it is not shown in the drawing. Other examples of alternative oxide processes that can be used in the present invention are known in the art and are not considered to be further described.

LL

J 第一介電層17現較佳以固體層形式且使用pCB製造中已 知之習知層壓方法來塗覆。層17較佳為光可成像材料,其 若干實例在此項技術中為已知的。一種實例為ASMDF(高 級阻焊劑乾膜)。該組合物可包括約85至約9〇%之固體含 量,該等固體包含約27%之PKHC(苯氧基樹脂)、41%之 Epirez 5 1 83(四漠雙盼A)、23%之Epirez SU-8(八官能基環 氧雙酚A甲醛酚醛清漆樹脂)、54%之UVE 1014光引發劑; 0.07%之乙基紫染料;0.03%之FC 430(3M公司之氟化聚醚 非離子性界面活性劑)及約4%之Aerosil 380(來自上述 Degussa Corporation之非晶形二氧化矽)以提供固體含量。 存在佔總光可成像介電組合物之約11 °/◦至約1 3.5 °/。的溶 劑。此組合物在此項技術中為已知的且認為無需進一步描 131317.doc -35- 200908828 述。如所述,可使用若干光可成像材料,且本發明不限於 上述。本文中教示之介電層通常可為約2密耳至約4密耳 厚,但若需要亦可更厚或更薄。在與導體13之上表面黏結 之後,其經光成像(或光圖案化)且顯影以顯露所需之電路 圖案,在此情況下為與緊靠其下之開口 15相同直徑的至少 一個開口 19(圖3)。開口 19實際上可稍微大於薄(大約〇2密 • 耳)導體(13)之開口 15。形成層17之介電材料可經簾式塗佈 《絲網塗覆’或其可以乾膜形式供應。光可成像材料之最 終0化提供在其上可形成所f電路(例如信號線或概塾)之 勃化介電質基部。如下女所中墓 . 月土 I 3卜又所疋義,此時無需形成該電路, 但更佳在該額外電路之前添加第三介電層(下文定義)。在 一實例中’層17可為兩密耳厚。 在圖4中’將一定數量之電阻器材料21沈積於對準開口 1 5及1 9内’較佳使用絲網印刷(其按照上文提供之定義可 包括模板印刷以及習知絲網印刷)。該材料之若干實例詳 υ 細提供於下文(參見下文之七個實例)。簡言之,該電阻器 包含聚合物樹脂(例如環脂族環氧樹 含-或多種金屬之金屬粉末材料,其每一者中== • 彳顆粒及/或微米尺寸顆粒。在下文實例之第一者中,電 Β器材料2!在樹脂混合物中可僅包㈣㈣,而以二f 例中,僅銅粉可用於樹脂中。在最後五個實例中,銅、石 墨及銀之各種組合包括於樹脂中。實例說明可如何在最炊 形成之電阻器中提供不同電阻的方法。本發明能夠提供具 有約U0毫歐ΟηΩ)至約12〇兆歐_)(用於pcB及晶片載體 131317.doc •36· 200908828 應用中之電阻器的典型電阻值範圍)之電阻示數的電阻 器。應瞭解,本發明能夠提供具有上述範圍以外之電阻示 數的電阻器’且本發明不限於該範圍。亦應瞭解,本發明 不限於僅使賴及銀作為金屬,因為其他亦為可能。在以 下實例中,所用金屬粉末各自具有約0.07微米至約五微米 尺寸之顆粒。此處,本發明亦不限於該等尺寸及面積。 可理解地,電阻器組合物21中之金屬組份之一種目的為 產生包括電阻n材料作為其部分之所形成電路線的電阻。 其亦確保電阻器之改良電學特性(例如減少之介電損耗、 改良之溫度及頻率穩定性等)。金屬組份之另一目的為產 生最終混合物之熱膨脹係數(CTE)以使得混合物之cte更 密切地近似最終(層壓)基板及與其接合之導體的cte。因 此,向混合物中添加金屬組份為本發明之極其重要特徵。 該等更接近CTE值之重要優點為在基板操作期間所得層壓 基板内減小之應力。最顯著地,如上文所解釋,電阻器材 料當如所示定位且因此為電路化基板之内部電路之部分 時,係用以大體上減小一對導電體(導體13為該等導電體 中之一者)之間的電容且增加兩個導電體之間所形成之電 連接中的電阻。下文提供進一步解釋。 顯著地,本文中所用之金屬粉末不經焙燒,且同樣地顯 著地,具有使得能夠有效形成電阻結構(包括當用於如圖4 中所示之介電質中之開口中時)的小尺寸,該等電阻結構 具有使得可形成包括具有上文定義類型之通孔之彼等電路 圖案之高密度電路圖案的小規模。該等通孔可具有極小直 131317.doc -37- 200908828 仕(在實例令,小至一至兩密耳)以由此確保該等小型 化、高密度電路圖案。如所指示,認為該小型化相對於許 多目前電路化基板之設計而言係極其重要的。在實現該電 阻器材料21之印刷中,將絲網或模板(未圖示)定位於層” 上且例如使用塗刷器或刀片迫使材料穿過其中。材料h大 體上填充開口 15及19且因此實體上接觸導體13之各別末 端。在-實施例中,電阻器材料21可以膏狀形式沈積。然 而,亦可能塗覆呈液體狀之材料21,將其經由合適喷嘴 (未圖示)分配以填充開口15及19。具有與其相關之噴嘴之 墨喷式印刷設備之使用可用於此。在分配之後,電阻器材 料21現經”B階段化(B_staged)&quot;(在諸如習知對流烘箱之適春 烘箱中加熱)以將其提高至比分配時更硬化之狀態。在I 實例中,材料21可經加熱至約攝氏19〇度之溫度歷時約兩 小時之時段。如此形成之電阻器材料21之所得金屬顆粒可 因此包括於其上之氧化物塗層或可包括形成如所定義組合 物之部分的聚合物樹脂材料塗層。因而,該等顆粒不形成 經由電阻器材料2 1之單一連續導電路徑。 在圖4中所示之實施例中,開口 15及19兩者均具有約十 六密耳之内徑且總數量約0.09毫克之電阻器材料21沈積於 其中。 ; 在另一實例中,材料21可包括如本文中所定義之聚合物 樹脂及至少一種如上文所定義之金屬組份與至少一種高表 面積陶瓷組份之混合物,該高表面積陶瓷組份之奈米顆粒 具有大體上在約0.01微米至約10微米範圍内之粒度及在每 131317.doc -38- 200908828 公克約1至約1500平方公尺範圍内之表面積。適合用於本 文中之另-電阻器材料為包括如所定義之聚合物樹脂及至 少-種金屬塗佈陶究組份之混合物的材料,該金屬塗佈陶 竞組份之顆粒具有大體上在約〇 〇1微米至約職米範圍内 之粒度。因此該實施例中,應瞭解陶究組份係經金屬組份 塗佈,以產生包括兩種組份之組合結構之顆粒的混合物。 在另-實施例中,電阻器材料可包括本文中定義類型之聚 :物樹脂及如上文所定義之至少一種氧化物塗佈金屬組 份’該氧化物塗佈金屬組份之顆粒較佳具有大體上在約 〇·(Η微米至約10微米範圍内之粒度。用於本文中之另一可 接受電阻器材料包括如本文中所定義之聚合物樹脂及至少 一種金屬組份與至少一種透明氧化物組份之混合物。在該 混合物中’透明氧化物組份之顆粒較佳包括大體上在約 〇·〇!微米至約10微米範圍内之粒度及在每公克約!至約⑽ 平方公尺範圍内之表面積。另外,具有本文中定義之獨特 特性的電阻器材料可包括如本文中所定義之聚合物樹脂及 至少一種金屬組份與至少—種摻雜亞輯鹽組份之混合 物。在該混合物中,摻雜亞㈣鹽組份之奈米顆粒較佳I 有大體上在約0.01微米至約1〇微米範圍内之粒度及:: =約1至約Η)。平方公尺範圍内之表面積。對於其: =少一種金屬崎且該至少-種陶㈣份為鐵 ::::陶究的上述實施例而言,混合物可另外包括碳i 未管組份。該等電阻器可呈聚合物厚膜電阻器或環 物-金屬(金、鋼、銅_錫)塗佈聚合物球體基電阻器之π 131317.doc -39- 200908828 式。濺鍍亦可用於使用物理遮罩來沈積電阻器材料。該等 濺鍍電阻器之一些典型金屬合金包括Nip(鎳磷卜(鎳 鉻)、NiCrAlSi(鎳鉻、鋁、矽)及TaN(氮化钽)。亦可組合 使用濺鍍及印刷電阻器,例如其中一部分電阻器材料經濺 鍍於電阻器材料之已印刷部分的頂上。 在圖5中,第三介電層23係定位於層17及目前經部分固 化之電阻器材料21上,該材料經足夠固化以完全支撐該層 23於其上。層23可為任何上述介電材料,包括如層17之光 可成像材料。在較佳實施例中,層27具有習知&quot;FR4&quot;增強 樹脂材料且使用習知PCB層壓處理來塗覆。在該層壓期 間,製程溫度亦用以最終(完全)固化電阻器材料以。在一 實例中,該溫度範圍可為約18〇t至約38〇。〇。在2〇〇磅/平 方吋(P.s」·)至2500 p.s.i.範圍内之層壓壓力可成功地用作 該層壓之部分°然而應瞭解’材料21可在層23定位之前經The first dielectric layer 17 is now preferably applied in the form of a solid layer and using conventional lamination methods known in the manufacture of pCB. Layer 17 is preferably a photoimageable material, several examples of which are known in the art. An example is ASMDF (Advanced Solder Mask Dry Film). The composition may comprise a solids content of from about 85 to about 9%, the solids comprising about 27% PKHC (phenoxy resin), 41% Epirez 5 1 83 (four deserts A), 23% Epirez SU-8 (octafunctional epoxy bisphenol A formaldehyde novolac resin), 54% UVE 1014 photoinitiator; 0.07% ethyl violet dye; 0.03% FC 430 (3M fluorinated polyether non-woven) An ionic surfactant) and about 4% Aerosil 380 (amorphous cerium oxide from Degussa Corporation described above) to provide a solids content. There is from about 11 ° / ◦ to about 1 3.5 ° / of the total photoimageable dielectric composition. Solvent. This composition is known in the art and is believed to require no further description of 131317.doc-35-200908828. As mentioned, several photoimageable materials can be used, and the invention is not limited to the above. The dielectric layer taught herein can generally be from about 2 mils to about 4 mils thick, but can be thicker or thinner if desired. After bonding to the upper surface of the conductor 13, it is photoimaged (or photopatterned) and developed to reveal the desired circuit pattern, in this case at least one opening 19 of the same diameter as the opening 15 immediately below it. (image 3). The opening 19 may actually be slightly larger than the opening 15 of the thin (about 〇2 mil) conductor (13). The dielectric material forming layer 17 can be supplied by curtain coating "screen coating" or it can be supplied as a dry film. The finalization of the photoimageable material provides a burgeoning dielectric substrate on which the f-circuit (e.g., signal line or profile) can be formed. The following is the tomb of the female. The moon I 3 is no longer necessary, and it is not necessary to form the circuit at this time, but it is better to add a third dielectric layer (defined below) before the additional circuit. In one example, layer 17 can be two mils thick. In Figure 4, 'deposit a certain amount of resistor material 21 in alignment openings 15 and 19' is preferably screen printed (which may include stencil printing as well as conventional screen printing as defined above) . Several examples of this material are detailed below (see seven examples below). Briefly, the resistor comprises a polymeric resin (e.g., a cycloaliphatic epoxy tree containing - or a metal powdered metal material, each of which == • bismuth particles and/or micron sized particles. In the examples below) In the first case, the electric device material 2! can only contain (4) (4) in the resin mixture, and in the case of f, only copper powder can be used in the resin. In the last five examples, various combinations of copper, graphite and silver Included in the resin. Examples illustrate how a different resistance can be provided in the most formed resistor. The present invention can provide from about U0 milliohms Ω Ω) to about 12 mega ohms (for pcB and wafer carrier 131317) .doc •36· 200908828 Resistor of the typical resistance range of the resistor in the application). It will be appreciated that the present invention is capable of providing a resistor having a resistance indication outside the above range' and the invention is not limited to this range. It should also be understood that the invention is not limited to relying solely on silver as a metal, as other possibilities are also possible. In the following examples, the metal powders used each have particles having a size of from about 0.07 microns to about five microns. Here, the invention is also not limited to the same size and area. It will be appreciated that one purpose of the metal component of the resistor composition 21 is to produce a resistor comprising the resistor n material as part of the formed circuit line. It also ensures improved electrical properties of the resistor (eg reduced dielectric loss, improved temperature and frequency stability, etc.). Another purpose of the metal component is to produce a coefficient of thermal expansion (CTE) of the final mixture such that the cte of the mixture more closely approximates the final (laminated) substrate and the cte of the conductor bonded thereto. Therefore, the addition of a metal component to the mixture is an extremely important feature of the present invention. An important advantage of these closer CTE values is the reduced stress in the resulting laminate substrate during substrate operation. Most notably, as explained above, the resistor material, when positioned as shown and thus part of the internal circuitry of the circuitized substrate, is used to substantially reduce a pair of electrical conductors (the conductors 13 are in the electrical conductors) The capacitance between one of the two) increases the resistance in the electrical connection formed between the two electrical conductors. Further explanation is provided below. Significantly, the metal powder used herein is not calcined, and as such, has a small size that enables effective formation of a resistive structure, including when used in an opening in a dielectric as shown in FIG. The resistive structures have a small scale such that high density circuit patterns including their circuit patterns having vias of the type defined above are formed. The vias can have a very small straight shape (in the example order, as small as one to two mils) to thereby ensure such miniaturized, high density circuit patterns. As indicated, this miniaturization is considered to be extremely important relative to the design of many current circuitized substrates. In effecting printing of the resistor material 21, a screen or stencil (not shown) is positioned over the layer and the material is forced through there, for example using a squeegee or blade. The material h substantially fills the openings 15 and 19 and Thus physically contacting the respective ends of the conductors 13. In an embodiment, the resistor material 21 may be deposited in a paste form. However, it is also possible to apply a liquid material 21 through a suitable nozzle (not shown). Dispensing to fill the openings 15 and 19. The use of an ink jet printing apparatus having nozzles associated therewith can be used for this. After dispensing, the resistor material 21 is now "B-staged" (in such as conventional convection) The oven is heated in a spring oven to raise it to a state that is harder than when dispensed. In the example of I, material 21 can be heated to a temperature of about 19 degrees Celsius for a period of about two hours. The resulting metal particles of the resistor material 21 thus formed may thus comprise an oxide coating thereon or may comprise a coating of a polymeric resin material forming part of the composition as defined. Thus, the particles do not form a single continuous conductive path through the resistor material 21. In the embodiment shown in Figure 4, both openings 15 and 19 have an inner diameter of about sixteen mils and a total of about 0.09 milligrams of resistor material 21 is deposited therein. In another example, material 21 can comprise a polymer resin as defined herein and a mixture of at least one metal component as defined above and at least one high surface area ceramic component, the high surface area ceramic component The rice granules have a particle size generally ranging from about 0.01 microns to about 10 microns and a surface area ranging from about 1 to about 1500 square meters per 131317.doc -38 to 200908828 grams. Another suitable resistor material for use herein is a material comprising a mixture of a polymer resin as defined and at least a metal coated ceramic component having particles substantially Particle size in the range of about 1 micron to about working meters. Thus, in this embodiment, it is understood that the ceramic component is coated with a metal component to produce a mixture of particles comprising a combined structure of the two components. In another embodiment, the resistor material may comprise a poly-resin of the type defined herein and at least one oxide-coated metal component as defined above. The oxide-coated metal component particles preferably have Particle size generally in the range of from about Η to about 10 microns. Another acceptable resistor material for use herein includes a polymeric resin as defined herein and at least one metal component and at least one transparent a mixture of oxide components. The particles of the 'transparent oxide component in the mixture preferably comprise a particle size substantially in the range of from about 〇·〇! micron to about 10 micrometers and from about 3,000 to about (10) square gram per gram. In addition, a resistor material having the unique characteristics defined herein may comprise a polymer resin as defined herein and a mixture of at least one metal component and at least one doped sub-salt salt component. In the mixture, the nanoparticle doped with the sub (tetra) salt component preferably has a particle size substantially in the range of from about 0.01 micron to about 1 micron and: : = about 1 to about Η). Surface area in the square meter range. For the above embodiments in which: = one less metal and the at least one (four) part is iron :::: ceramics, the mixture may additionally comprise a carbon i untreated component. The resistors may be of the form of polymer thick film resistors or ring-metal (gold, steel, copper-tin) coated polymer sphere-based resistors π 131317.doc -39- 200908828. Sputtering can also be used to deposit resistor materials using physical masks. Some of the typical metal alloys of these sputter resistors include Nip (nickel chrome), NiCrAlSi (nickel chrome, aluminum, tantalum) and TaN (tantalum nitride). Sputter and printed resistors can also be used in combination. For example, a portion of the resistor material is sputtered on top of the printed portion of the resistor material. In Figure 5, a third dielectric layer 23 is positioned over layer 17 and the currently partially cured resistor material 21, the material The layer 23 is sufficiently cured to fully support the layer 23. The layer 23 can be any of the above dielectric materials, including a photoimageable material such as layer 17. In the preferred embodiment, layer 27 has conventional &quot;FR4&quot; enhancements The resin material is applied using a conventional PCB lamination process. During the lamination, the process temperature is also used to ultimately (fully) cure the resistor material. In one example, the temperature range can be from about 18 〇t to Approximately 38 〇. The lamination pressure in the range of 2 psi (Ps"·) to 2500 psi can be successfully used as part of the lamination. However, it should be understood that the material 21 can be positioned at layer 23. Before

完全固化,例如經加熱至比用於將其提高至如上所述之&quot;B 階段&quot;更高之溫度。本發明因此能適應兩種可能性,增加 本文中疋義之方法的多功能性。在一實例中,層23為四密 耳厚在可旎不使用層17之情況中,層23實際上將充當第 介電層虽如圖4-7中所示使用層23時,層17可稱作中 間)|電層,意謂其係介於初始介電層丨丨與用以覆蓋電阻器 材料之介電層23之間。 另外在圖5令,需要在層23上形成複數個導體29,該等 、見最、’&lt;產物之操作要求而定為信號線或襯塾。導體2 9 在層23上形成電路圖案,其可能為或可能不為與如本文中 131317.doc .40- 200908828 所定義之所形成電阻器相關之電路的部分。此處展示該電 路圖案以說明若需要在製程中之此點添加該電路料能 性。在-實例中,電路係由層麼至層23之銅落形成且隨後 經受如上文使用之習知光微影處理。其他方法當然為可能 的’包括滅鍵,且此處認為無需進一步描述。在此實例 中’每-導體具有約K5密耳之厚度且由銅或銅合金形 成。為便於描述,該等導體在本文中亦可稱為 體。 —守 在圖6中,另—介電層3〇形成於導體29上且形成於層η 之上表面上。層30較佳為上述&quot;FR4&quot;材料,但可為上文引 用之任何介電材料’包括光可成像材料。若為&quot;FR4&quot;材 料,則層30以單層形式沈積且使用習知層壓處理黏結於適 當位置。在-實例中’在2啊/平方叶(psi)至25〇〇 ^ 範圍内之壓力及約18(TC至約灣之溫度可用作該層壓處 理之部分。值得注意地,該等高溫不會不利 材料一實例中,㈣可為四密耳厚。在成功黏結層。 31之後’帛相關於第一導電體13)導電體_成於層 3〇上。較佳在將單-片材之導體(較佳銅或銅合幻沈積^ 層上之後使用習知光微影處理形成導體”。當然應瞭 解,可形成許多該等導體31以及其他導電元件(諸如信號 線或襯墊)’其全部用於形成本發明中此位置之單一層電 路的部分。導體31可為⑽耳厚且如所示位於電阻;材 料21上。 雖然兩個介電層23及30描述為定位於電阻器材料21上, 131317.doc 41 200908828Completely cured, for example, heated to a higher temperature than used to increase it to &quot;B stage&quot; as described above. The invention thus accommodates both possibilities and increases the versatility of the method described herein. In one example, layer 23 is four mils thick in the case where layer 17 is not used, layer 23 will actually serve as the dielectric layer. Although layer 23 is used as shown in Figures 4-7, layer 17 may The term "intermediate" is an electrical layer, meaning that it is between the initial dielectric layer and the dielectric layer 23 used to cover the resistor material. Further, in Fig. 5, a plurality of conductors 29 are required to be formed on the layer 23, and the operation requirements of the products are determined as signal lines or linings. Conductor 2 9 forms a circuit pattern on layer 23 that may or may not be part of the circuitry associated with the resistors formed as defined by 131317.doc.40-200908828 herein. The circuit pattern is shown here to illustrate the need to add this circuit capability at this point in the process. In the example, the circuit is formed from the layer to the copper of layer 23 and is subsequently subjected to conventional photolithography as used above. Other methods are of course possible 'including the dead key, and it is considered here that no further description is needed. In this example the 'per-conductor has a thickness of about K5 mils and is formed of copper or a copper alloy. For ease of description, the conductors may also be referred to herein as bodies. - In Fig. 6, another dielectric layer 3 is formed on the conductor 29 and formed on the upper surface of the layer η. Layer 30 is preferably the &quot;FR4&quot; material described above, but may be any of the dielectric materials referred to above&apos; including photoimageable materials. In the case of &quot;FR4&quot; material, layer 30 is deposited as a single layer and bonded to the proper location using conventional lamination. In the example - the pressure in the range of 2 ah / square leaf (psi) to 25 〇〇 ^ and about 18 (TC to about Bay temperature can be used as part of the lamination process. Notably, these high temperatures In the case of an unfavorable material, (4) may be four mils thick. After successful bonding of the layer 31, '帛 related to the first electrical conductor 13', the electrical conductor is formed on the layer 3〇. It is preferred to form the conductor using conventional photolithographic processing after the conductor of a single sheet (preferably a copper or copper smear layer). It will of course be appreciated that a plurality of such conductors 31 and other conductive elements (such as signals) may be formed. Wire or pad) 'all of which are used to form part of a single layer circuit at this location in the present invention. Conductor 31 can be (10) ear thick and as shown on the resistor; material 21. Although two dielectric layers 23 and 30 Described as being positioned on resistor material 21, 131317.doc 41 200908828

但在本發明之更廣泛態樣中,僅需要定位一個該介電層。 另外’因為層23及30歸因於與層壓處理相關之相對高熱及 麼力而可能沿其對立邊緣”換合”在一起,所以現亦可能將 該等組合層描述為整體層。亦可能在本發明中省略層23且 替代地僅使用層30作為第二介電層(亦即於其上具有本發 明之第二導電體之層)。就此而言,層23可充當”第二”介電 層,其中完全省略形成第二導體之導體29中之一者及層 30(及導體31)。最後,亦如上述,若使用,則介電層17為 亦可稱作中間介電層者,其在形成導體13(其中包括其開 口 15)之後且在定位介電層23之前形成。 圖6之結構現經受鑽孔操作,其中如所示形成至少一個 開口 35。開口 35可使用機械或雷射鑽孔形成,該等技術之 一者係使用Ng-YAG雷射。在一實施例中,開口 3 5可具有 八密耳之直徑且貫穿圖6(且現為圖7)結構之整個厚度。該 開口穿經頂部導體3 1且穿過初始導體丨3内之開口 1 5,由此 不直接接觸導體13之内壁。顯著地,該開口直接穿過(且 因此嚙合)電阻器材料21。在鑽孔之後,較佳使用用於電 鍍PCB通孔之習知電鍍操作使開口之内壁金屬化。用於形 成已知PTH之較佳電鍍方法可用於此處,其中塗 之第-薄層’、繼而塗覆無電極銅薄層且最後塗覆電解銅之 較厚層’導致在開口内壁上形成薄層37(例如約〇5密耳 厚)。如所瞭解,其他冶金及厚度為可能的。該導電材料 因此提供自頂部導體31向下穿過基板至電阻器材料Μ,且 因此至另一導體I3的電子路徑 開口及電鍍導電材料由此 131317.doc -42- 200908828 杯 卜其在圖7實施例中貫穿結構之完整厚度。基 如!路路控因此包括電阻器作為其部分。如所瞭解, 務明戶斤定義之本發明可導致形成若干該等電路,且本 个 早電路及早—電阻器。實際上,若 萬要’本發明對於每個電路可提供一個以上電阻器。 ^之電路路徑(及結構)存在特殊優點,尤其當關注由 於:過電路之信號路徑之不連續性(上述)而產生之效能降 級二如同始終關注如本文中教示之高密度電路圖案的電 路。又#者。在圖7之電路中,存在利用材料(電阻器材料叫 之優點,該材料具右入 、有比其所置換之介電材料(層1 7)較小之 電谷’由此減小導體p2 ·|々Ba 等體13與31之間之電路中的電容。在一實 例中’戶斤得電容(由圖7中之尺寸” c&quot;指示)量測為低至約 〇.〇5微微法拉(picofarad)至約〇22微微法拉。此設計亦減小 :通孔二之開口端(貫穿介電層u之彼端)反射之信號能 量。顯著地’且如由下文實例中所定義之結果所證明,電 阻值經極仔細選擇以便自穿過電路之信號抽取極少能量。 舉例而言,50歐姆阻抗信號線(路徑)不受並行之ι〇〇,〇〇〇歐 姆顯者影響’但因為通孔在下端處開放,所以沿通孔川于 進之不當能量受額外10〇,〇〇〇歐姆強烈影響。因此,該&quot;線 腳(末鈿部分)中之大部分信號能量穿經電阻器材料而非自 開口端&quot;彈回”。因此,藉由添加電阻器材料且使其成為本 發明中之電路之部分可減少效能降級。因此,與無電阻器 之類似結構相比,資料在電路化基板中轉移更快。除使用 所定義之絲網印刷操作以實現其精確沈積以外,藉由使用 131317.doc -43- 200908828 包括奈米顆粒及/或微米顆粒作為其部分之電阻器材料來 增強此電路之電阻值的小心、精確選擇。另外顯著地,在 對於創製本發明之製程不造成顯著額外成本的情況下,可 能產生該等優點…本文中之教示另外理解基板内所 形成之内部(或嵌埋式)電阻器特別能夠在各種電路組合 中’或僅在唯一電路内提供該等電阻。另外應瞭解,本文 中描述且展示之實例並不意欲限制本發明,此係因為存在 多種其他可能性且完全在熟f此項技術者之範嘴内。又, 本發明由此表示此項技術中之顯著進步。 圖8表示上文中所定義結構之實例’由數字化參考之總 成為晶片載體’而由數字47表示之總成為pcB。每一者均 能夠包括-或多個上文定義類型之内部電阻器作為其部 分。該等PCB及晶片載體總成兩者均由本發明之受讓人產 生且出售。在圖8之實施例(總成)中,冑用複數個焊球 51(較佳為習知錫-鉛組合物)將晶片載體牦安裝於”上 且與其電耦接,晶片載體45轉而具有定位於其上且使用第 二複數個焊球53(亦較佳為習知錫,組合物)與載體電輕接 之半導體晶片49。因此,存在圖8中所示之兩個電子總 成’ -者為載體-晶片總成且另—者為咖_载體總成(盆固 有地包括晶片49)。圖8中之結構亦可包括如此項技術中已 知之例如使用導電膏與晶片49熱_且藉由適當間隙界定 ㈣㈣45之Μ面上的散熱片(未圖示利用封閉劑材 料(未圖示)以大體上包覆晶片且若使用該封閉劑材料亦可 能消除對散熱片之需要亦在熟習此項技術者之範疇内。封 131317.doc -44 - 200908828 閉劑材料亦可能圍繞較低複數個焊球51及5 3。甚至另外 地,使用習知導線黏結耦接晶片49在本發明之範疇内,其 中複數個細線(未圖示)在晶片導體位點與下伏基板上之對 應導體襯墊之間m ^使用焊球53,則晶片下側上之該 等互連接觸位點(未圖示)與载體45上之對應襯墊61互連。 類似地,焊球5 1使載體下側上之襯墊63與PCB 47之上表面 之襯墊65互連。該等襯塾通常為銅或銅合金且在技 術中為已知的。 在圖8中所示之特定實例中,上部襯墊61之一或多者可 月b與下部襯墊63之對應者耦接以於其間形成個別電路路 徑。該等電路路徑之—或多者可包括如本文中所教示之電 阻器之一或多者。 匕括本文中所形成類型之電路化基板的電子總成可用於 在此項技術中稱作&quot;資訊處理系統,,(上文定義)者中。該 等系統之热知實例包括個人電腦、主機電腦及電腦伺服In a broader aspect of the invention, however, only one dielectric layer needs to be positioned. In addition, it is now also possible to describe the combined layers as an integral layer because layers 23 and 30 may be "combined" along their opposite edges due to the relatively high heat and force associated with the lamination process. It is also possible to omit layer 23 in the present invention and instead use layer 30 alone as the second dielectric layer (i.e., the layer on which the second conductor of the present invention is present). In this regard, layer 23 can act as a "second" dielectric layer in which one of conductors 29 forming the second conductor and layer 30 (and conductor 31) are omitted altogether. Finally, as also mentioned above, if used, the dielectric layer 17 is also referred to as an intermediate dielectric layer which is formed after the formation of the conductor 13 (including its opening 15) and prior to positioning the dielectric layer 23. The structure of Figure 6 is now subjected to a drilling operation in which at least one opening 35 is formed as shown. The opening 35 can be formed using mechanical or laser drilling, one of which uses an Ng-YAG laser. In one embodiment, the opening 35 may have a diameter of eight mils and the entire thickness of the structure through Figure 6 (and now Figure 7). The opening passes through the top conductor 31 and passes through the opening 15 in the initial conductor turns 3, thereby not directly contacting the inner wall of the conductor 13. Significantly, the opening directly passes through (and thus engages) the resistor material 21. After drilling, the inner wall of the opening is preferably metallized using conventional plating operations for electroplating PCB vias. A preferred electroplating method for forming a known PTH can be used herein where the coating of the first-thin layer, followed by the application of a thin layer of electrodeless copper and finally the thicker layer of electrolytic copper, results in formation on the inner wall of the opening A thin layer 37 (e.g., about 5 mils thick). As noted, other metallurgy and thicknesses are possible. The conductive material is thus provided from the top conductor 31 down through the substrate to the resistor material Μ, and thus to the electron path of the other conductor I3 opening and plating the conductive material thereby 131317.doc -42 - 200908828 cup in Figure 7 The full thickness of the through structure is used in the examples. The base road control therefore includes a resistor as part of it. As will be appreciated, the invention as defined by the invention can result in the formation of a number of such circuits, and this early circuit is early-resistor. In fact, if the present invention is provided, more than one resistor can be provided for each circuit. The circuit path (and structure) has particular advantages, especially when focusing on the performance degradation due to the discontinuity of the signal path of the over-circuit (described above) as a circuit that always focuses on the high-density circuit pattern as taught herein. Also #者. In the circuit of Fig. 7, there is a use of a material (a resistor material has the advantage that the material has a right-handed, lower dielectric valley than the dielectric material (layer 17) it replaces) thereby reducing the conductor p2 ·|々Ba, etc. The capacitance in the circuit between the bodies 13 and 31. In an example, the capacitance of the household (indicated by the size in Figure 7) c&quot; is measured as low as about 〇.〇5 picofarad (picofarad) to about 微22 picofarads. This design also reduces: the signal energy reflected by the open end of the via 2 (the other end of the dielectric layer u). Significantly 'and as defined by the examples below It has been shown that the resistance value is carefully chosen to extract very little energy from the signal passing through the circuit. For example, a 50 ohm impedance signal line (path) is not affected by parallel 〇〇, 〇〇〇 ohms influence 'but because The through hole is open at the lower end, so the improper energy along the through hole is affected by an additional 10 〇, and the 〇〇〇 ohm is strongly affected. Therefore, most of the signal energy in the line foot (the last part) passes through the resistor. Material instead of "opening back" from the open end. Therefore, by adding The addition of a resistor material and making it part of the circuit of the present invention reduces performance degradation. Therefore, data transfer is faster in a circuitized substrate than in a similar structure without a resistor. In addition to operation to achieve accurate deposition, careful and precise selection of the resistance values of this circuit is enhanced by the use of 131317.doc -43-200908828 including nanoparticle and/or microparticles as part of the resistor material. These advantages may arise in the absence of significant additional cost to the process of creating the invention. The teachings herein further understand that internal (or embedded) resistors formed within the substrate are particularly capable of being in various circuit combinations. 'Or such resistance is provided only in a single circuit. It is to be understood that the examples described and illustrated herein are not intended to limit the invention, as there are many other possibilities and are well-known to those skilled in the art. Further, the present invention thus represents a significant advancement in the art. Figure 8 shows an example of the structure defined above 'by digitization The total amount of the test becomes the wafer carrier' and the total number represented by the numeral 47 becomes pcB. Each can include - or a plurality of internal resistors of the above defined type as part of the PCB and the wafer carrier assembly. Produced and sold by the assignee of the present invention. In the embodiment (assembly) of Figure 8, a plurality of solder balls 51 (preferably a conventional tin-lead composition) are used to mount the wafer carrier on and In conjunction with its electrical coupling, the wafer carrier 45 in turn has a semiconductor wafer 49 positioned thereon and electrically coupled to the carrier using a second plurality of solder balls 53 (also preferably known as tin, compositions). The two electron assemblies shown in Figure 8 are the carrier-wafer assembly and the other is the coffee carrier assembly (the basin inherently includes the wafer 49). The structure of FIG. 8 may also include heat sinks as described in the art, such as the use of a conductive paste and wafer 49, and which define (4) (4) 45 by a suitable gap (not shown using a sealant material (not shown)) It is also within the scope of those skilled in the art to substantially coat the wafer and if the use of the sealant material may eliminate the need for heat sinks. The closure material may also surround a lower plurality of closures. Solder balls 51 and 53. Even additionally, it is within the scope of the invention to use conventional wire bond coupling wafers 49 in which a plurality of thin wires (not shown) are corresponding conductor linings on the wafer conductor sites and the underlying substrate. The solder balls 53 are used between the pads, and the interconnect contact sites (not shown) on the underside of the wafer are interconnected with corresponding pads 61 on the carrier 45. Similarly, the solder balls 51 make the carrier The liner 63 on the lower side is interconnected with a liner 65 on the upper surface of the PCB 47. The liners are typically copper or copper alloys and are known in the art. In the particular example shown in Figure 8, One or more of the upper pads 61 may be coupled to the corresponding one of the lower pads 63 Forming individual circuit paths therebetween. One or more of the circuit paths may include one or more of the resistors as taught herein. An electronic assembly including a circuitized substrate of the type formed herein may be used in This technology is called &quot;Information Processing System,&quot; (defined above). Examples of such systems include personal computers, host computers, and computer servos.

器。在該類型之技術中已知之其他類型的f訊處理系統亦 可利用本發明之教示。“包括一或多個如上文所教示之 内部電阻器的如根據本文中之教示形成之電路化基板可以 例如”母板”形式或以一或多個個別pCB形式用於該系統 中。 以下實例提供用以形成根據本發明之各種態樣之電阻器 的電阻H材料及方法之各種組合。該等應理解為僅為實例 且不限制本發明之範_。自該等實例清楚可見,可使用本 文中之教示獲得相對廣泛範圍之電阻值。實例卜5提供基 1313l7.doc -45· 200908828 於微米顆粒之電阻器且實例6及7提供基於奈米顆粒之電阻 器。 實例1 將五十公克(gm)環脂族環氧樹脂(例如,以產品名稱 &quot;ERL-421I&quot;由 Union Carbide Corporation,Danbury, CT銷售 者)與約50 gm六氫-4-甲基鄰苯二甲酸酐及0.4 grn n,N二甲 基苄胺混合。將混合溶液攪拌大約十分鐘以確保均勻混 合。將可購自Degussa Corporation(企業場所位於379 Interpace Parkway,Parsippany,NJ)之 50 gm銀粉添加至 7.5 gm混合溶液且形成為可印刷膏劑。銀粉包括具有約五微米 之平均尺寸的顆粒。隨後將一層該膏劑材料印刷至銅基板 上。隨後將該層在大約攝氏19〇度(t)下固化約兩小時❶固 化電阻器(3吋長及0.003平方吋橫截面積)之電阻經量測為 約1 20毫歐。 將50 gm,,ERL.4211,,環脂族環氧樹脂與約5〇㈣六氮_4_ 甲基鄰苯二甲酸肝及〇.4 gmN,N二甲基节胺混合。將混合 料搜拌約十分鐘以確保均勻混合。㈣㈣粉添加至 .5 gm混合溶液中且形成為可印刷膏劑。鋼粉包 = 顆粒。將一層該膏劑材料印刷至銅基 ^ “將5亥層在大約⑽下固化約兩小時。固化電 阻益(3叶長及〇 〇〇3平方 兆歐叫 …截面積)之電阻經量測為約120 實例3 131317.doc -46- 200908828 將50 gm&quot;ERL-4211&quot;環脂族環氧樹脂與約5〇 gm六氫_4_ 甲基鄰苯二曱酸酐及0.4 gm N,N二甲基苄胺混合。將混合 溶液攪拌約十分鐘以確保均句混合。將38 gm銅及12 §111銀 粉添加至7.5 gm混合溶液中且形成為可印刷膏劑。銅及銀 粉之平均粒度介於約四至約五微米直徑之範圍内。將一層 該膏劑材料印刷至銅基板上。隨後將該層在大約19〇。〇下 fDevice. Other types of f-processing systems known in the art of this type may also utilize the teachings of the present invention. "A circuitized substrate, as formed in accordance with the teachings herein, including one or more internal resistors as taught above, may be used, for example, in the form of a "motherboard" or in the form of one or more individual pCBs. Various combinations of materials and methods of forming a resistor H for forming resistors in accordance with various aspects of the present invention are provided. These are to be understood as merely examples and not limiting the scope of the invention. As is apparent from the examples, The teachings herein achieve a relatively wide range of resistance values. Example 5 provides a resistor for microparticles and 13 and 7 provides resistors based on nanoparticle. Example 1 will be fifty grams ( Gm) cycloaliphatic epoxy resin (for example, under the product name &quot;ERL-421I&quot; sold by Union Carbide Corporation, Danbury, CT) with about 50 gm hexahydro-4-methylphthalic anhydride and 0.4 grn n,N-dimethylbenzylamine is mixed. The mixed solution is stirred for about ten minutes to ensure uniform mixing. It will be available from Degussa Corporation (enterprise location at 379 Interpace Parkway, Parsippany, NJ) 50 Gm silver powder was added to the 7.5 gm mixed solution and formed into a printable paste. The silver powder included particles having an average size of about five microns. A layer of the paste material was then printed onto the copper substrate. The layer was then placed at about 19 degrees Celsius ( t) The electrical resistance of the curing resistor (3 Å long and 0.003 吋 cross-sectional area) after curing for about two hours is measured to be about 1 20 milliohms. 50 gm, ERL.4211, cycloaliphatic epoxy The resin is mixed with about 5 〇 (tetra) hexanitro- 4-methylphthalic acid liver and 〇.4 gmN, N-dimethyl amide. The mixture is mixed for about ten minutes to ensure uniform mixing. (4) (4) Adding powder to .5 The gm is mixed and formed into a printable paste. Steel powder package = granules. A layer of the paste material is printed onto the copper base. "The 5 kel layer is cured at about (10) for about two hours. The resistance of the curing resistor (3 leaf length and 〇〇〇3 square megameter called ... cross-sectional area) is measured to be about 120. Example 3 131317.doc -46- 200908828 50 gm &quot;ERL-4211&quot; cycloaliphatic epoxy The resin was mixed with about 5 g of hexahydro-4-methyl phthalic anhydride and 0.4 gm of N,N-dimethylbenzylamine. The mixed solution was stirred for about ten minutes to ensure uniform mixing. 38 gm of copper and 12 § 111 silver powder were added to the 7.5 gm mixed solution and formed into a printable paste. The average particle size of the copper and silver powder ranges from about four to about five microns in diameter. A layer of the paste material is printed onto the copper substrate. The layer was then placed at approximately 19 Torr. 〇下 f

固化約兩小時。固化電阻器(3吋長及〇〇〇3平方吋橫截面 積)之電阻經量測為約70兆歐(ΜΩ)。 實例4 將50 gm’ERL-4211&quot;環脂族環氧樹脂與約5〇 六氫-4_ 甲基鄰苯二甲酸酐及〇.4 gm N,N二甲基苄胺混合。將混合 溶液攪拌大約十分鐘以確保均句混合。將5㈣銅及Μ W 銀粉添加至7.5 gm混合溶液中且形成為可印刷膏劑。銅及 銀粉之平均粒度介於約四至約五微米直徑之範圍内。將一 層該f*劑㈣印刷至銅基板上。隨後將該層在大約喊 下固化約兩小時。固化電阻器㈣長及Q⑽平方对橫截面 積)之電阻經量測為約4〇〇毫歐(ΙηΩ)。 將50 gm,,ERL-4211,,環脂族環氧樹月旨與約帥六氣_心 甲基鄰苯二f酸酐及〇·4 gm N,N二甲基节胺混合。將混合 溶液授拌約十分鐘以確保均勻混合。㈣㈣銅錢㈣銀 粉添加至7.5 gm混合溶液令且形成為可印刷膏劑。銅及銀 粉:平均粒度介於約四至約五微米直徑之範圍内。將一層 該膏劑材料印刷至銅基板上。隨後將該層在大約贿下 131317.doc 47· 200908828 固化約兩小時。固化電阻器(3吋長及〇〇〇3平方吋橫截面 積)之電阻經量測為約2 5歐姆⑷)。 實例6 將50 gm ”ERL_4211 ”環脂族環氧樹脂與約5〇 gm六氫_4_ f基鄰苯二甲酸酐及〇·4 gm N,N二甲基苄胺混合。將混合 溶液授拌約十分鐘以確保均勻混合。將可講自組心減,Cured for about two hours. The resistance of the curing resistor (3 Å long and 〇〇〇 3 吋 吋 cross-sectional area) was measured to be about 70 MΩ (ΜΩ). Example 4 50 gm of 'ERL-4211&quot; cycloaliphatic epoxy resin was mixed with about 5 〇 hexahydro-4-methylphthalic anhydride and 〇.4 gm N,N dimethylbenzylamine. The mixed solution was stirred for about ten minutes to ensure uniform mixing. 5 (tetra) copper and Μ W silver powder were added to the 7.5 gm mixed solution and formed into a printable paste. The average particle size of the copper and silver powder ranges from about four to about five microns in diameter. A layer of the f* agent (4) is printed onto the copper substrate. The layer was then cured under about two hours. The resistance of the curing resistor (4) and the Q (10) square to cross-sectional area is measured to be about 4 〇〇 milliohms (ΙηΩ). 50 gm,, ERL-4211, cycloaliphatic epoxy tree was mixed with about six gas _ heart methyl phthalic acid anhydride and 〇 4 gm N, N dimethyl amide. The mixed solution was mixed for about ten minutes to ensure uniform mixing. (4) (4) Copper coins (4) Silver powder is added to a 7.5 gm mixed solution and formed into a printable paste. Copper and silver powder: The average particle size is in the range of from about four to about five microns in diameter. A layer of the paste material is printed onto the copper substrate. The layer was then cured for approximately two hours at approximately 131317.doc 47·200908828. The resistance of the curing resistor (3 吋 long and 〇〇〇 3 吋 吋 cross-sectional area) was measured to be about 25 ohms (4)). Example 6 A 50 gm "ERL_4211" cycloaliphatic epoxy resin was mixed with about 5 〇 gm hexahydro-4_f phthalic anhydride and 〇·4 gm N,N dimethylbenzylamine. The mixed solution was mixed for about ten minutes to ensure uniform mixing. Will be able to talk about self-grouping,

Ward HiU,Massachusetts之4训氟化石墨及可購自 NanoTech,Inc·,North IndustHal j㈣仅 5.4 gm銀奈米粉末(具有〇〇7微米之D9〇粒度)添加至呂瓜 混合溶液中且形成為可印刷膏劑。將一層該膏劑材料印刷 至銅基板上。隨後將該層在大約2〇(rc下固化約兩小時。 固化電阻益(3吁長及〇⑽3平方忖橫截面積)之電阻經量測 為約90歐姆(Q)。 實例7 將50 gm”ERL_42u&quot;環脂族環氧樹脂與約“ gm六氫_4- (J 甲基鄰苯二甲酸酐及G·4㈣n,n二甲基节胺混合。將混合 办液授拌約十分鐘以確保均勻混合。將獨自Alfa A㈣訂 • 之氟化石墨及可購自Cima Nan〇Tech,Inc.之4 gm銀奈 米粉末(具有0.07微米之D9〇粒度)添加至7 5啡混合溶液中 且形成為可印刷膏劑。將一層該膏劑材料印刷至銅基板 上。隨後將該層在大約2〇〇。。下固化約兩小時。固化電阻 器(3 f長及G.GG3平方忖橫戴面積)之電阻經量測為約死 歐(ΜΩ) 〇 下表總結與相同量之聚合物材料組合使用以形成具有類 I31317.doc -48- 200908828 似尺寸之電阻器的一些金屬之實例,且讀取穿越該等電阻 器之所得電阻值。 表-隨銀/銅比率變化之電阻。 金屬 聚合物 電阻器尺寸 電阻 50 gm 銀 7.5 gm 3吋長及0.003平方吋橫截面積 120 ηιΩ 45 gm 銀 + 5 gm Cu 7.5 gm 3吋長及0.003平方吋橫截面積 400 ιηΩ 30 gm 銀 + 20 gm Cu 7.5 gm 3吋長及0.003平方吋橫截面積 25 Ω 12 gm 銀 + 38 gm Cu 7.5 gm 3吋長及0.003平方吋橫截面積 70 ΜΩ 50 gm Cu 7.5 gm 3吋長及0.003平方吋橫截面積 120 ΜΩ f, 因此已展示且描述具有一或多個内部電阻器作為其部分 之電路化基板,該基板可使用許多習知PCB方法形成以由 此降低與其製造相關之成本。本文中產生之基板容易適合 用於電子總成中,其中一或多個諸如半導體晶片之電子組 件可定位於其上且與其耦接。亦已定義電阻器材料之若干 實例,其可定位於兩個鄰近導體之間作為該電路線之部分 以形成該等基板之電路。最顯著地,如由上述實例所示, 本發明提供藉由改變電阻器材料組合物來改變導體之間之 {) 電阻的機會。該寬容度極大地輔助電路設計者滿足變化之 操作要求。 雖然已展示且描述本發明之目前所謂較佳實施例,但熟 習此項技術者將顯而易見,可在不悖離如隨附申請專利範 圍所定義之本發明範疇的情況下進行各種變化及修改。如 本文中所定義之本發明能夠傳輸常規及高速(.頻率)信號, 後者以約十億位元/秒鐘至約一百億位元/秒鐘之速率,同 時大體上防止阻抗破環。其亦能夠使用許多習知PCB方法 131317.doc -49· 200908828 產生以便確保減小成本及促成製造簡易性。或許更顯著 地’本發明能夠確保如關於許多當今設計要求而言視為極 重要的電路圖案小型化。 【圖式簡單說明】 圖1 -7為說明根據本發明之一實施例製造包括至少一個 内部電阻器之電路化基板之基本步驟的大幅放大之側面正 _ 視圖;且 ( 圖8為根據本發明之一實施例之電子總成的呈部分剖面 形式之部分透視圖,該總成適合於使用一或多個本發明之 電路化基板。 【主要元件符號說明】 11 13 15 17 19 21 23 27 29 30 31 35 37 131317.doc 介電材料層 導電體/導體 開口 第二介電層 開口 電阻器材料/電阻器組合物 第三介電層 層 導體 介電層 第二導電體/導體/層 開口 薄層 -50-Ward HiU, Massachusetts 4 fluorinated graphite and available from NanoTech, Inc., North IndustHal j (4) Only 5.4 gm silver nanopowder (with a D9 〇 particle size of 7 μm) is added to the Lugua mixed solution and formed into Printable paste. A layer of the paste material is printed onto the copper substrate. The layer was then cured at about 2 Torr (rc for about two hours. The resistance of the curing resistor (3 yoke and 〇 (10) 3 忖 cross-sectional area) was measured to be about 90 ohms (Q). Example 7 50 gm "ERL_42u&quot; cycloaliphatic epoxy resin is mixed with about "gm hexahydro-4-(J-methylphthalic anhydride and G.4(tetra)n,n-dimethylammonium. Mix the mixed solution for about ten minutes. To ensure uniform mixing. Add fluorinated graphite from Alfa A (4) and 4 gm silver nanopowder (with D9 〇 particle size of 0.07 μm) available from Cima Nan〇Tech, Inc. to the 7 5 morphine solution. Formed as a printable paste. A layer of the paste material is printed onto the copper substrate. The layer is then cured at about 2 Å for about two hours. The curing resistor (3 f long and G.GG3 square 忖 cross-sectional area) The resistance of the ) is measured as approximately dead ohms (ΜΩ). The following table summarizes examples of some metals used in combination with the same amount of polymer material to form resistors of the type I31317.doc -48- 200908828, and read Take the resulting resistance across the resistors. Table - Resistance as a function of silver/copper ratio. Metal polymer resistor size resistance 50 gm silver 7.5 gm 3 inch length and 0.003 square inch cross-sectional area 120 ηιΩ 45 gm silver + 5 gm Cu 7.5 gm 3 inch length and 0.003 square inch cross-sectional area 400 ιηΩ 30 gm silver + 20 Gm Cu 7.5 gm 3吋 length and 0.003 square inch cross-sectional area 25 Ω 12 gm silver + 38 gm Cu 7.5 gm 3吋 length and 0.003 square inch cross-sectional area 70 ΜΩ 50 gm Cu 7.5 gm 3吋 long and 0.003 square 吋 horizontal The cross-sectional area is 120 ΜΩ f, and thus a circuitized substrate having one or more internal resistors as part of it has been shown and described, which can be formed using many conventional PCB methods to thereby reduce the cost associated with its fabrication. The substrate is readily adaptable for use in an electronic assembly in which one or more electronic components, such as semiconductor wafers, can be positioned and coupled thereto. Several examples of resistor materials have also been defined that can be positioned between two adjacent conductors. Between the portions of the circuit line to form the circuits of the substrates. Most notably, as shown by the above examples, the present invention provides for changing the conductor between the conductors by varying the resistor material composition. Opportunity of Resistance. This latitude greatly assists the circuit designer in meeting the changing operational requirements. While the presently described preferred embodiments of the present invention have been shown and described, it will be apparent to those skilled in the art that Various changes and modifications are possible in the context of the scope of the invention as defined by the scope of the invention. The invention as defined herein is capable of transmitting conventional and high speed (.frequency) signals, the latter being in the order of about one billion bits per second to about A rate of 10 billion bits per second while substantially preventing impedance cracking. It can also be produced using many conventional PCB methods 131317.doc -49. 200908828 to ensure cost reduction and ease of manufacture. Perhaps more significantly, the present invention is capable of ensuring miniaturization of circuit patterns that are considered to be extremely important as for many current design requirements. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1-7 is a greatly enlarged side elevational view illustrating the basic steps of fabricating a circuitized substrate including at least one internal resistor in accordance with an embodiment of the present invention; and FIG. 8 is a view of the present invention. A partial perspective view of an electronic assembly of one embodiment in partial cross-section, the assembly being suitable for use with one or more circuitized substrates of the present invention. [Key Symbol Description] 11 13 15 17 19 21 23 27 29 30 31 35 37 131317.doc Dielectric material layer Conductor/conductor opening Second dielectric layer Opening resistor material/Resistor composition Third dielectric layer Conductor Dielectric layer Second conductor/conductor/layer opening thin Layer-50-

通孔 晶片載體 PCB 半導體晶片 焊球 焊球 上部襯墊 下部襯墊 襯墊 尺寸 -51 -Through Hole Wafer Carrier PCB Semiconductor Wafer Solder Ball Solder Ball Upper Liner Lower Liner Pad Size -51 -

Claims (1)

200908828 十、申請專利範圍: 1. 一種電路化基板,其包含: 一第一介電層; 一定位於該第一介電層上之第一導電體,該第一導電 體其中包括一開口; 該第一導電體内之該開口内之一定數量的電阻器材 料;200908828 X. Patent Application Range: 1. A circuitized substrate comprising: a first dielectric layer; a first electrical conductor necessarily located on the first dielectric layer, the first electrical conductor including an opening therein; a certain amount of resistor material within the opening in the first electrical conductor; 一大體上定位於該第一導電體内之該開口内之該一定 數量電阻器材料上的第二介電層; 一定位於該第二介電層上之第二導電體;及 一介於該第二導電體與該第一導電體之間之電連接, 該第一導電體内之該開口内之該一定數量的電阻器材枓 係用以大體上減小該第一導電體與該第二導電體之間的 電容且增加該第一導電體與該第二導電體之間之該電連 接中的高頻電阻。 2·如請求項1之電路化基板,其中該第一介電層包含選自 由纖維玻璃增強環氧樹脂、聚四氟乙烯、聚醯亞胺、聚 醯胺、氰酸酯樹脂、聚苯醚樹脂、光可成像材料及其組 合組成之聚合物材料之群的有機介電材料。 3.如請求項!之電路化基板,其中該第一導電體及該第二 導電體各自包含銅或銅合金材料。 4.如請求们之電路化基板,其另外包括一位於該第 電體上之中間介電;,兮_坌 其中包括一第二:;:導電體其中具有該開&quot; 開口 ’该—定數量之電阻器材料亦定你 131317.doc 200908828 於該中間介電層内之該第二開口内,第二介電層係直接 定位於該中間介電層上且位於該一定數量之電阻器材料 上。 5_如請求項1之電路化基板,其中該一定數量之電阻器材 料包含奈米顆粒。 6·如請求項1之電路化基板,其中該一定數量之電阻器材 料包含微米顆粒。 7. 如請求項1之電路化基板,其中該第二導電體與該第一 導電體之間之該電連接包含一通孔。 8. 如請求項1之電路化基板,其中該一定數量之電阻器材 料包含環氧樹脂材料及其中之一定數量的金屬顆粒。 9. 如請求項8之電路化基板,其中該等金屬顆粒為銅及/或 銀。 10. 如請求項8之電路化基板,其中該等顆粒為奈米顆粒。 11 ·如請求項8之電路化基板,其中該等顆粒為微米顆粒。 12 · —種電子總成,其包含: 一電路化基板,其包括一第一介電層、一定位於該第 一介電層上之第一導電體、該第一導電體其中包括一開 口、該第一導電體内之該開口内之一定數量的電阻器材 料、一定位於該第一導電體内之該開口内之該一定數量 電阻器材料上的第二介電層、一定位於該第二介電層上 之第二導電體及一介於該第二導電體與該第一導電體之 間的電連接,該第一導電體内之該開口内之該一定數量 的電阻器材料係用以大體上減小該第—導電體與該第_ 131317.doc -2 - 200908828 導電體之間的電容且增加該第一導電體與該第二導電體 之間之該電連接中的高頻電阻;及 至少一個定位於該電路化基板上且與其電耦接之電子 組件。 13. 如請求項12之電子總成,其中該至少一個電子組件包含 一半導體晶片且該電路化基板包含一晶片載體基板。 14. 如請求項12之電子總成,其中該電路化基板包含一印刷 電路板。 131317.doca second dielectric layer on the plurality of resistor materials generally positioned within the opening in the first conductive body; a second electrical conductor that is located on the second dielectric layer; Electrical connection between the two electrical conductors and the first electrical conductor, the certain number of electrical resistance devices in the opening of the first electrical conductor to substantially reduce the first electrical conductor and the second electrical conductor The capacitance between the bodies increases the high frequency resistance in the electrical connection between the first electrical conductor and the second electrical conductor. 2. The circuitized substrate of claim 1, wherein the first dielectric layer comprises a fiberglass reinforced epoxy resin, polytetrafluoroethylene, polyimine, polyamine, cyanate resin, polyphenylene ether. An organic dielectric material of a group of polymeric materials consisting of a resin, a photoimageable material, and combinations thereof. 3. The circuitized substrate of claim 3, wherein the first electrical conductor and the second electrical conductor each comprise a copper or copper alloy material. 4. The circuitized substrate of claimant, further comprising an intermediate dielectric on the first electrical body; wherein 兮_坌 includes a second:; the electrical conductor having the opening &quot; opening The number of resistor materials also set you 131317.doc 200908828 in the second opening in the intermediate dielectric layer, the second dielectric layer is directly positioned on the intermediate dielectric layer and located in the certain number of resistor materials on. 5) The circuitized substrate of claim 1, wherein the quantity of electrical resistance material comprises nanoparticle. 6. The circuitized substrate of claim 1 wherein the quantity of electrical resistance material comprises microparticles. 7. The circuitized substrate of claim 1, wherein the electrical connection between the second electrical conductor and the first electrical conductor comprises a through hole. 8. The circuitized substrate of claim 1, wherein the quantity of electrical resistance material comprises an epoxy material and a quantity of metal particles therein. 9. The circuitized substrate of claim 8, wherein the metal particles are copper and/or silver. 10. The circuitized substrate of claim 8, wherein the particles are nanoparticle. 11. The circuitized substrate of claim 8, wherein the particles are microparticles. An electronic assembly comprising: a circuitized substrate comprising a first dielectric layer, a first electrical conductor necessarily located on the first dielectric layer, the first electrical conductor including an opening therein, a certain amount of resistor material in the opening in the first conductive body, a second dielectric layer on the certain amount of resistor material necessarily located in the opening in the first conductive body, necessarily located in the second a second electrical conductor on the dielectric layer and an electrical connection between the second electrical conductor and the first electrical conductor, the certain amount of resistor material in the opening in the first conductive body is used Generally reducing the capacitance between the first electrical conductor and the electrical conductor of the first 131317.doc -2 - 200908828 and increasing the high frequency resistance in the electrical connection between the first electrical conductor and the second electrical conductor And at least one electronic component positioned on the electrical circuit substrate and electrically coupled thereto. 13. The electronic assembly of claim 12, wherein the at least one electronic component comprises a semiconductor wafer and the circuitized substrate comprises a wafer carrier substrate. 14. The electronic assembly of claim 12, wherein the circuitized substrate comprises a printed circuit board. 131317.doc
TW97118394A 2007-06-04 2008-05-19 Circuitized substrate with internal resistor, method of making said circuitized substrate, and electrical assembly utilizing said circuitized substrate TW200908828A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI662562B (en) * 2018-03-16 2019-06-11 新力應用材料有限公司 Resistance material, resistor and method of manufacturing the same
TWI666269B (en) * 2018-03-16 2019-07-21 新力應用材料有限公司 Resistance material, conductive terminal material, resistor and method of manufacturing the same

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5407389B2 (en) * 2009-02-09 2014-02-05 富士通株式会社 Printed wiring board

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI662562B (en) * 2018-03-16 2019-06-11 新力應用材料有限公司 Resistance material, resistor and method of manufacturing the same
TWI666269B (en) * 2018-03-16 2019-07-21 新力應用材料有限公司 Resistance material, conductive terminal material, resistor and method of manufacturing the same

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