200902810 六、發明說明： [優先權之主張] 本申凊案係主張2007年7月3日於韓國智慧財產局所 提出申請之韓國專利申請案第2〇〇7_〇〇66747號之優先 權，於此併入該專利申請案之内容，以供參考。 【發明所屬之技術領域】 本發_關於—種安I於空氣清潔祕之無慶室，更 詳而言之，係關於一種由垂直層流（laminar fl〇w)所引起 之壓力平均分佈在内部空間以使在内部角落發生渦流 (eddieS)之機率降至最低、使氣流被儘可能地抑制以避免 沿著-設有加工件之運輸單元流動以使外界雜質散開之程 度降至取低、及料外絲f滲人加王件而使產品缺失之 空氣清潔系統之無塵室。 【先前技術】 •广杈:且封裝件主要由例如薄膜覆晶封裝(chil： 二1 )型、晶片直接封襄（chip 〇n board，C0B) 里及晶狀寸狀（ehip seale pa _ 這些相機模組封裝型式之制^ •尸H成 似。拖1 乂、十·^ 過程與f知半導體生產線相 似換吕之，則逑的相機模組封裝件係於保持高度清料 境之空氣清潔系統裡進行高精密度製程。私200902810 VI. Invention Description: [Priority claim] This application claims the priority of Korean Patent Application No. 2〇〇7_66747, filed on July 3, 2007 by the Korea Intellectual Property Office. The contents of this patent application are incorporated herein by reference. [Technical field to which the invention pertains] The present invention relates to an airless cleaning chamber, and more specifically, relates to an average pressure distribution caused by vertical laminar flow (laminar fl〇w) The internal space minimizes the chance of eddieS in the inner corners, so that the airflow is suppressed as much as possible to avoid the flow along the transport unit with the workpiece to reduce the extent of external dust scattering. And the clean room of the air cleaning system that the material is infiltrated with the king and the product is missing. [Prior Art] • Wide range: and the package is mainly composed of, for example, a film flip chip package (chil: two 1) type, a chip 〇n board (C0B), and a crystal shape (ehip seale pa _ these The camera module package type is made of ^ corpse H. The drag 1 乂, 10 · ^ process and the F know the semiconductor production line similar to Lu, then the camera module package is kept in a high clear environment air cleaning High-precision process in the system. Private
第1圖係為習知相機模組封裝^縱切面剖視示音 圖。第1圖之相機模組封裝件i包括鏡筒i〇(iens W barrel)、外罩20(_咖）及電路板4〇 ;該鏡筒1〇具有 蓋體13及位於内部之鏡片組L，該蓋體13具有鏡孔13。 94375 4 200902810 該外罩20具有母螺紋（female screw)以螺接該鏡筒10之 公螺紋（male screw);又，該電路板40之一端具有影像感 應器30，且該影像感應器30藉由結合材質固接於該外罩 20底端。 紅外線遽光器2 5設於該外罩2 0内；視窗4 2設於該電路 板40之一端，以使該影像感應器30之感應區顯露於外；又， 連接器45設於該電路板40之另一端，以電性連接顯示裝置 (未圖示）。 、 同時，在製造該相機模組封裝件1之過程中，滲透進入 該封裝件1之外界雜質，例如微塵，將附著於該紅外線濾光 器25或該影像感應器30之感應區上，導致於影像檢測時產 生黑點缺陷（black spot defect)或色塊環形缺陷（color spot defect)，而使該封裝件1之影像產生缺失，甚而需將 整組封裝件1作廢。 因此，該高精密度製程係運作於空氣清潔系統，該空 r 氣清潔系統藉由移除由外部被引進内部之空氣中之灰塵以 K,.. 保持清潔，以使最少量之外界雜質滲入加工件。此處，該 製程包含以覆晶式接合（flip chip bonding)方式將影像感 應器30設置於電路板40之一端、該附和於晶片上之影像感 應器30之打線（wire-bonding)製程、以接合材料（bonding material)接合電路板40與外罩20之底端並固化該接合材 料、組裝鏡片組L至鏡筒10中、將紅外線濾光器25黏附至外 罩20、將鏡筒10鎖附於外罩20、並且在完成對焦後以接合 材料牢固鏡筒10與外罩20。 94375 200902810 習知空氣清潔系統之内部具有複數個無塵室90，且各 該無塵室90具有加工機73，以個別進行不同的高精密度製 程。 如第2(a)、2(b)圖以及第3(a)至3(c)圖所示，無塵室 90係包含：内部設有加工機73之工作室70、及設於該工作 室70之天花板表面上之風扇過遽單元80 (fan fi Iter unit)，以提供乾淨空氣進入加工區。因此，強制地提供無 塵的乾淨空氣以使精密製程得以進行，並形成層流以確保 此種無塵狀態。 該工作室70包含運輸單元72、加工機73及前門76，該 運輸單元72係用以運輸負載加工件朝加工位置之方向移動 或將該加工件定位於加工位置上。該加工機7 3係用以進行 如接合、硬化、部件組裝及檢測加工件等製程。又該前門 76係設於該無塵室90的前側，以滑移開啟及關閉内部之加 工區。 另外，通道74a, 74b係形成於該工作室70之兩側，以 供運輸單元72穿過。此種通道可由架設於負載平台上之執 道所形成，該平台係承載該工作件。 該風扇過濾單元8 0包含藉由轉動以強制提供乾淨空氣 進入該工作室70之空氣供應風扇82、及甩以過濾來自該強 制供應之空氣中之灰塵之濾器81。 因此，移動例如晶圓及相機封裝件1等之加工件至加工 位置，以藉加工機73進行接合、組裝及硬化等製程。同時， 該風扇過濾單元80由上往下提供已過濾之乾淨空氣至該工 6 94375 200902810 作室70内部以確保無塵狀態。這步驟使得各種高精密度製 程可於無外界雜質滲入的情況下運作。 然而，該工作室70中，經由該風扇過濾單元80以供空 氣向下穿過而強制供應之空氣供應面積相對小於該工作至 70之頂面積並且距各側邊之間距不一，因而影響供應效 率，使於該工作室70之頂面全部區域之下方無法有效形成 層流。因此，如第2(b)圖及第3(a)至（c)圖所示，於該工作 室70之頂部角落將產生例如渦流現象之旋渦V。 由於此種旋渦V，外界雜質例如殘存在該運輸單兀72 或加工機73上之灰塵將向上漂浮而無法向外排出’且該些 漂浮之外界雜質將滲入加工件，而提高加工件之不良率 (defect ratio) ° 再者，因各該通道74a，74b形成之徑寬尺寸相對大於 該運輸單元72之縱切面面積，當該風扇過濾單元別強制供 應之層流L直接向下衝擊至該運輸單元72之上表面時，該層 流L將朝該工作室70之兩側流動，且通過貫穿該工作室70 之通道74a，74b而向外排出。 此時，即當該層流L朝運輸單元72流動及通過各該通道 74a，74b向外排出時，外界雜質例如殘存於運輪單元72之 灰塵將向上漂浮，且隨層流L經過位於運輸單元72上之加工 件而附著於加工件上，因而提高加工件之不良率（defect ratio) 0 此外，於該技術中，當操作員開啟設於工作室7〇前側 之前門7 6時’ _將破壞工作室7 0内部之壓力平衡，而使位於 94375 7 200902810 旋渦V區域中之外界雜質移動至該運輸單元72上之加工件。 【發明内容】 鑒於以上所述習知技術之不足，本發明之態樣提供一 種空氣清潔系統之無塵室，由垂直層流所引起之壓力平均 分佈在内部的全部空間，以使在内部角落發生渦流之機率 降至最低，並且使氣流儘最大可能地被抑制以避免沿著一 設有加工件之運輸單元流動，以使外界雜質散開之程度降 至最低，以及防止外界雜質滲入加工件而使產品產生缺陷。 為達上揭目的及其他目的，本發明之態樣提供一種空 氣清潔系統之無塵室，係包含：工作室，包含：加工機設 於加工區，且該加工區設有用以輸送加工件之運輸單元； 貫穿該工作室相對兩側之通道，以使該運輸單元通過各該 通道；及用以滑移地開啟和關閉該加工區之拉門；風扇過 濾單元，係設於該工作室之頂面上，且強制供應乾淨空氣 進入該工作室以產生垂直的層流，其中該風扇過濾單元具 有對應於該工作室頂面之全部面積之空氣供應面積，且該 工作室包括分別位於該工作室前、後侧之前通風設備及後 通風設備，而該前、後通風設備引導該風扇過濾單元所產 生之層流向相對於該運輸單元的輸送方向的方向排出。 該前、後通風設備的設置位置可分別齊平或低於該運 輸單元。 該前、後通風設備之其中一者可由吸入器所構成，該 吸入器包含當提供電源可產生吸力之吸入扇。 該前、後通風設備均可由吸入器所構成，該吸入器包 8 94375 200902810 含當提供電源可產生吸力之吸入扇。 該前、後通風設備均可由至少一個開口（opening)所構 成，且該開口係以預定尺寸形成於該工作室前、後侧上。 該前、後通風設備均可由具有複數個穿孔（pore)之多 孔平面（porous plate)所構成，該多孔平面以平行於該運 輸單元之方向被排列於該工作室之前側與後侧。 該風扇過濾單元復可包含至少一個濾器及至少一個空 氣供應風扇，該濾器跨設於該工作室頂面之全部區域，且 該空氣供應風扇設於該濾器上方，以強制供應乾淨空氣進 入該工作室。 各該通道之縱切面尺寸可大致相等於該運輸單元承載 該加工件之區域之縱切面面積。 該拉門可設於該工作室中設置有該前通風設備之前側 上、或該工作室中放置有該後通風設備之後側上。 【實施方式】 本發明之範例實施例將參考隨附之圖示以被詳細描 述。 請參閱第4、5、6圖，第4圖係為根據本發明之範例實 施例之空氣清潔系統之無塵室之架構示意圖；第5圖係為根 據本發明之範例實施例之無塵室之層流之流動示意圖；第6 圖係為根據本發明之範例實施例之無塵室之剖面示意圖， 且（a)係為上視示意圖，（b)係為前視示意圖，（c)係為側視 示意圖。 如第6(a)至（c)圖所示，本實施例之無塵室包括工作室 9 94375 200902810 . 110及風扇過濾單元120。該工作室110係設有具有預定尺寸 之加工區，以供於該加工區裡進行相對應之工作。該風扇 - 過濾單元120係提供已過濾之空氣，以保持該工作室110之 内部空間處於無塵狀態。 此工作室110包含上、下表面111，112、前、後侧113, 114及左、右侧115，116 ’以定義預定尺寸的内部空間，該 内部空間供設置加工機117及運輸單元118。在此，該上、 f 下表面HI，H2係分別被定義為平坦的天花板及地板，且 f . 1 該前、後侧113，114及左、右侧115，116係呈垂直地連接 至該上、下表面111，112。 該運輸單元118係由在執道上跑動之驅動台車所構 成，以運輸加工件朝加工機117之方向移動，並運輸該由加 工機117所加工完成之加工件至另一相鄰之工作室以進行 後續的製程。 此外，該工作室110之前侧113設有拉門119，以自由地 ς 開啟和關閉加工區，但本發明並無限制拉門119之設置位 置。該拉門119亦可設置在該工作室11〇之後側Η4。 再者’具有預定尺寸之通道115a，116a被設置以貫穿 該工作室110之左、右側115，116，使運輸加工件之運輸單 元118可自由地通過。 此處，該通道115a，116a具有大致相等於該運輸單元 118之縱切面面積之縱切面尺寸，以確保該承載該加工件之 運輸單元118無阻礙地通過該等通道115a，116a。 也就是說，該運輸單元118與該等通道115a，116a之間 94375 10 200902810 之間距均為最小化，以儘量避免該供應至該工作室110之加 工區的氣流經由該空隙而向外流出。因而抑止層流L免於被 引向該工作室110之兩側，於該工作室110中，該等通道115a 和116a沿著該運輸單元118設置。 該風扇過濾單元120係安裝於該工作室110之定義為天 花板之該頂面111上，以強制供應無外界雜質的乾淨空氣進 入該工作室11 〇，進而產生該層流L。 該風扇過濾單元120包含對應於工作室110之頂面111 全部面積之空氣供應面積，以容許該層流L得以自該工作室 110之該頂面111全部區域被直接引導向下。確保該工作室 11◦之加工區形成平均的壓力分佈。這樣的作法根本地避免 了漩渦的產生，也就是，因不平均的壓力分佈而在工作室 110之内部角落造成氣流的渦流現象。 該風扇過濾單元120包含至少一個濾器122及至少一個 空氣供應風扇124。該濾器122設置於該工作室110之全部頂 平面111上。該空氣供應風扇124設置於該濾器122上方，以 供應無外界雜質的乾淨空氣進入工作室110内。 同時，前通風設備131及後通風設備132分別被設置在 該工作室110之該前側113及該後側114,以導引進入該工作 室110之該層流L由該風扇過濾單元120往該運輸單元118之 兩側流動而排出。 該前通風設備131和該後通風設備132之設置位置大致 上齊平或低於該運輸單元118，以致於該衝擊在運輸單元 118頂面之層流L可以自然地被引導往相對於運輸單元118 11 94375 200902810 之運輸方向之方向。 此外，該前通風設備131和該後通風設備132均可由至 少一個具有預定尺寸之開口分別貫通該工作室110的該前 侧113和該後側114而構成。因此，該沿著該運輸單元Π8 的運輸方向兩側被分割和被導引的氣流L1和L2可以藉由内 部與外部間之壓力差（pressure gap)而被自然地排出。 於本實施例中，該前通風設備131和該後通風設備132 係在平行於運輸單元118之運輸方向上以方形（square)的 形狀被穿孔。但本發明並無限制穿孔之方向。該前通風設 備131和該後通風設備132均可由具有複數個貫穿孔（未圖 示）之多孔平面所構成’該多孔平面以平行於該運輸單元之 方向被排列於該工作室11 〇之前侧與後側。 再者’該前通風設備131和該後通風設備132分別可具 有吸入扇133和134’當供應電源時，吸入扇133, 134將產生 吸力以強制地將該分割之氣流L1，L2分別向外部排出。因 此’該沿著該運輸單元118的運輸方向兩側被分割和導引的 氣流L1和L2可被強制地往該工作室no之外部排出。該吸入 扇133和134係分別設置於吸入器13加與1343上，吸入器 133a與134a係延伸自該前通風設備131和該後通風設備 132 〇 當如上述所架構之無塵室1〇〇中之風扇過濾單元12〇運 作日^，外部空氣被該空氣供應風扇124強制地吸入該工作室 110内並且在通過該濾器122時將外界雜質移除，並接著形 成該層流L並強制地被供應進入該工作室11〇。 12 94375 200902810 該風扇過濾單元120具有對應於工作室11 〇之頂面111 之全部面積之空氣供應面積。因此，該層流L提供該工作室 110的内部空間平均的壓力分佈以及垂直的氣流結構。至 於本實施例中’被供應進入該工作室丨1〇之層流L之平 均壓力分佈根本地避免了在工作室11〇之内部角落發生旋 渦的情形，且避免外界雜質漂浮在工作室n〇之内部角落周 圍。因此，避免外界雜質被滲入該運輪單元118所承載之工 作件而產生缺陷。 ' 隨後，該被均勻地供應進入該工作室110内之全部内部 空間之層流L衝擊至該輪送工作室110内之該加工件之該運 輸單元118上；而接著形成沿著對應於該運輸單元ns之運 輸方向兩側之分割氣流Ll，L2。 如第5圖所示’該等分割氣流LI，L2被自然地導引向該 前通風設備131和該後通風設備132 ,其中該前通風設備131 和該後通風設備132貫穿該工作室110之該前侧113和該後 ( 側114 ;且該等分割氣流Ll·，L2僅以該前通風設備131和該 後通風設備132作為排氣路線（discharging outlet)而被 排出該工作室110。 此外，該等吸入扇133，134分別被安裝於該前通風設 備131和該後通風設備132上’該分割氣流L1，L2得以被強 制地向外排出，以確保該空氣具有較高之排出效率。 亦即，該沿著該運輸單元118的運輪方向雨側被分割的 氣流Ll，L2僅通過該前通風設備131和該後通風設備132向 外排出。係因該等通道115a和116a均具有與承載工作件之 94375 13 200902810 該運輸單元118之縱切面面積大致上相等的切面面積，該等 通道115a，116a貫穿該工作室110的該左、右侧115，116, 並且具有可自由地通過之該運輸單元118。因此使運輸單元 118及通道115a, 116a之間之間距呈最小化，而防止大量層 流L經由此處排出。此外，該前通風設備131和該後通風設 備13 2設置於該工作室110之該前側113和該後侧114上，設 置之位置低於該運輸單元118，以相對於該沿著該運輸單元 118的運輸方向兩側被分割的氣流Ll，L2。 因此，留在該運輸單元118上之該外界雜質不會沿著該 運輸單元118之運輸方向漂浮，而是與該沿著兩侧被分割的 氣流Ll，L2—同通過該前通風設備131和該後通風設備132 向外排出。以使該漂浮之外界雜質較無法滲入該加工件， 進而防止在加工、運輸過程中，該加工件發生缺陷。 綜土所述，根據本發明之實施例，供應層流進入工作 室之風扇過濾單元具有對應於該工作室之頂面之全部面積 之空氣供應面積。再者，前通風設備及後通風設備被設置 在該工作室的前後兩側，亦即對應於運輸單元之運輸方向 兩側，用以將供應自該風扇過濾單元之該層流排向外部。 因此提供了該工作室之全部内部空間中該層流的平均壓力 分佈，該層流自該工作室的頂面被往下供應。因此，確保 旋渦在該工作室之内部角落之發生機率降至最低。另外， 該層流通過設置在對應於該運輸單元之運輸方向的兩侧之 前、後通風設備而向外排出。因此，當該層流沿著該運輸 單元之兩侧被導引的同時外界雜質漂浮的情形會降至最 14 94375 200902810 低。因此有效降低因外界雜質被引入加工件而導致之產品 不良率，且增進產品之可靠度。 惟以上所述之具體實施例，僅係用以例釋本發明之特 點及功效，而非用以限定本發明之可實施範疇。在未脫離 本發明上揭之精神與技術範疇下，任何運用本發明所揭示 内容而完成之等效改變及修飾，均仍應為下述之申請專利 範圍所涵蓋。 【圖式簡單說明】 第1圖係為習知相機模組封裝件之縱切面剖視示意圖； 第2圖係為習知空氣清潔系統之無塵室之示意圖；其 中^ (a)係為架構不意圖* (b)係為氣流流動不意圖， 第3圖係為習知空氣清潔系統之無塵室之剖視示意 圖；其中，（a)係為上視示意圖，（b)係為前視示意圖，（c) 係為侧視示意圖； 第4圖係為本發明之空氣清潔系統之無塵室之架構示 意圖；. 第5圖係為根據本發明之範例實施例之無塵室之層流 之流動示意圖； 第6圖係為根據本發明之範例實施例之無塵室之剖面 示意圖；其中，（a)係為上視示意圖，（b)係為前視示意圖， (c)係為側視示意圖。 【主要元件符號說明】 1 封裝件 10 鏡筒 13 蓋體 13a 鏡孔 15 94375 200902810 20 外罩 25 紅外線濾光器 30 影像感應器 40 電路板 42 視窗 45 連接器 70 工作室 72 運輸單元 73 加工機 74a 、 74b 通道 76 前門 80 風扇過濾單元 81 滤器 82 空氣1供應風扇 90 無塵室 110 工作室 1 111 上表面 112 下表面 113 前側 114 後側 115 左侧 115a、116a 通道 116 右侧 117 加工機 118 運輸單元 119 拉門 120 風扇過濾單元 122 濾器 124 空氣供應風扇 131 前通風設備 , 132 後通風設備 133 、 134 吸入扇 133a、134a吸入器 L 鏡片組、層流 U、L2 氣流 V 旋渴 16 94375Figure 1 is a cross-sectional view of a conventional camera module package. The camera module package i of FIG. 1 includes a lens barrel i ies (ies W barrel), a cover 20 (_coffee), and a circuit board 4 〇; the lens barrel 1 has a cover 13 and an inner lens group L, The cover 13 has a mirror hole 13. 94375 4 200902810 The cover 20 has a female screw to screw the male screw of the lens barrel 10; further, one end of the circuit board 40 has an image sensor 30, and the image sensor 30 is The bonding material is fixed to the bottom end of the outer cover 20. The infrared ray illuminator 2 5 is disposed in the outer cover 20; the window 42 is disposed at one end of the circuit board 40 to expose the sensing area of the image sensor 30; and the connector 45 is disposed on the circuit board At the other end of the 40, a display device (not shown) is electrically connected. At the same time, in the process of manufacturing the camera module package 1, impurities that penetrate into the outer periphery of the package 1 , such as fine dust, will adhere to the infrared filter 25 or the sensing area of the image sensor 30, resulting in A black spot defect or a color spot defect is generated during image detection, and the image of the package 1 is missing, and even the entire package 1 is discarded. Therefore, the high-precision process operates in an air cleaning system that removes dust from the air introduced into the interior by external K, and keeps it clean so that a minimum amount of foreign matter is infiltrated. Machined parts. Here, the process includes a photo-bonding process in which the image sensor 30 is disposed on one end of the circuit board 40 in a flip chip bonding manner, and the image sensor 30 attached to the wafer is A bonding material bonds the bottom end of the circuit board 40 and the outer cover 20 and cures the bonding material, assembles the lens group L into the lens barrel 10, adheres the infrared filter 25 to the outer cover 20, and locks the lens barrel 10 to The cover 20 and the cover 10 and the cover 20 are secured by a bonding material after the focus is completed. 94375 200902810 The conventional air cleaning system has a plurality of clean rooms 90 inside, and each of the clean rooms 90 has a processing machine 73 for individually performing different high-precision processes. As shown in Figures 2(a) and 2(b) and Figures 3(a) through 3(c), the clean room 90 includes a working chamber 70 having a processing machine 73 therein, and is provided in the work. A fan fi Iter unit on the ceiling surface of the chamber 70 provides clean air into the processing zone. Therefore, it is mandatory to provide clean, clean air so that the precision process can be carried out and a laminar flow is formed to ensure such a dust-free state. The working chamber 70 includes a transport unit 72, a processing machine 73, and a front door 76 for transporting the load processing member toward the processing position or positioning the workpiece at the processing position. The processing machine 7.3 is used for processes such as joining, hardening, component assembly, and inspection of workpieces. Further, the front door 76 is disposed on the front side of the clean room 90 to slide open and close the internal processing area. Further, passages 74a, 74b are formed on both sides of the working chamber 70 for the transport unit 72 to pass through. Such a passage may be formed by an erection on a load platform that carries the work piece. The fan filter unit 80 includes an air supply fan 82 that is rotated to forcibly supply clean air into the working chamber 70, and a filter 81 for filtering dust from the forced supply air. Therefore, the workpieces such as the wafer and the camera package 1 are moved to the processing position to be joined, assembled, and hardened by the processing machine 73. At the same time, the fan filter unit 80 supplies filtered clean air from the top to the bottom of the chamber 70 to ensure a dust-free state. This step allows various high-precision processes to operate without the ingress of foreign matter. However, in the working chamber 70, the air supply area forcibly supplied by the fan filter unit 80 through the downward passage of air is relatively smaller than the top area of the work to 70 and the distance between the sides is different, thereby affecting the supply. The efficiency is such that laminar flow cannot be effectively formed below the entire area of the top surface of the working chamber 70. Therefore, as shown in Fig. 2(b) and Figs. 3(a) to (c), a vortex V such as a vortex phenomenon is generated at the top corner of the working chamber 70. Due to such a vortex V, external impurities such as dust remaining on the transport unit 72 or the processing machine 73 will float upward and cannot be discharged outwardly, and the floating outer boundary impurities will penetrate into the workpiece, thereby improving the defective workpiece. The ratio of the width of the channel 74a, 74b is relatively larger than the area of the longitudinal section of the transport unit 72. When the fan filter unit is forced to supply the laminar flow L, it directly impacts downward. When the upper surface of the transport unit 72 is transported, the laminar flow L will flow toward both sides of the working chamber 70 and will be discharged outward through the passages 74a, 74b of the working chamber 70. At this time, when the laminar flow L flows toward the transport unit 72 and is discharged outward through the respective passages 74a, 74b, external impurities such as dust remaining in the transport unit 72 will float upward, and are transported along with the laminar flow L. The workpiece on the unit 72 is attached to the workpiece, thereby improving the defect ratio of the workpiece. 0 Further, in this technique, when the operator opens the front door 7 6 provided on the front side of the working chamber 7' _ The pressure balance inside the working chamber 70 will be destroyed, and the foreign matter in the vortex V region of the 94375 7 200902810 will be moved to the workpiece on the transport unit 72. SUMMARY OF THE INVENTION In view of the above-mentioned deficiencies of the prior art, the aspect of the present invention provides a clean room of an air cleaning system in which the pressure caused by the vertical laminar flow is evenly distributed over the entire interior space so as to be in the inner corner. The probability of occurrence of eddy currents is minimized, and the airflow is suppressed as much as possible to avoid flow along a transport unit provided with the workpiece, to minimize the extent of external impurity scattering, and to prevent foreign matter from penetrating into the workpiece. Make the product defective. In order to achieve the above objects and other objects, an aspect of the present invention provides a clean room of an air cleaning system, comprising: a working chamber, comprising: a processing machine disposed in a processing area, and the processing area is provided with a processing part. a transport unit; a passage extending through opposite sides of the working chamber to pass the transport unit through each of the passages; and a sliding door for slidingly opening and closing the processing area; the fan filter unit is disposed in the studio On the top surface, and forcibly supplying clean air into the working chamber to create a vertical laminar flow, wherein the fan filter unit has an air supply area corresponding to the entire area of the top surface of the working chamber, and the working chamber includes the work The front and rear sides of the chamber are ventilated and the rear ventilating device, and the front and rear venting devices direct the laminar flow generated by the fan filter unit to be discharged in a direction relative to the conveying direction of the transport unit. The front and rear ventilation devices can be positioned flush or below the transport unit, respectively. One of the front and rear venting devices may be comprised of an inhaler that includes a suction fan that provides suction when a power source is provided. The front and rear venting devices can be constructed by an inhaler, which includes a suction fan that provides suction when a power source is supplied. The front and rear ventilating devices may each be formed by at least one opening, and the openings are formed on the front and rear sides of the working chamber in a predetermined size. The front and rear venting means may each be formed by a porous plate having a plurality of pores arranged in a direction parallel to the transport unit on the front side and the rear side of the working chamber. The fan filter unit may further include at least one filter and at least one air supply fan, the filter is disposed across all areas of the top surface of the working chamber, and the air supply fan is disposed above the filter to force supply of clean air into the work. room. The longitudinal section of each of the channels may be approximately equal in size to the longitudinal section of the area in which the transport unit carries the workpiece. The sliding door may be provided on the front side of the working room where the front ventilating device is disposed, or on the rear side of the working ventilating device. [Embodiment] Exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. Please refer to FIG. 4, FIG. 5 and FIG. 4, FIG. 4 is a schematic view showing the structure of a clean room of an air cleaning system according to an exemplary embodiment of the present invention; FIG. 5 is a clean room according to an exemplary embodiment of the present invention. FIG. 6 is a schematic cross-sectional view of a clean room according to an exemplary embodiment of the present invention, and (a) is a schematic top view, (b) is a front view, and (c) is a front view For a side view. As shown in Figures 6(a) to (c), the clean room of the present embodiment includes a working chamber 9 94375 200902810 . 110 and a fan filter unit 120. The working chamber 110 is provided with a processing area having a predetermined size for performing corresponding work in the processing area. The fan-filter unit 120 provides filtered air to maintain the interior of the working chamber 110 in a dust-free state. This working chamber 110 includes upper and lower surfaces 111, 112, front and rear sides 113, 114 and left and right sides 115, 116' to define an internal space of a predetermined size for the processing machine 117 and the transport unit 118. Here, the upper and lower surfaces HI and H2 are respectively defined as flat ceilings and floors, and f. 1 the front and rear sides 113, 114 and the left and right sides 115, 116 are vertically connected to the Upper and lower surfaces 111, 112. The transport unit 118 is constituted by a drive trolley running on the road, transporting the workpiece to the processing machine 117, and transporting the processed workpiece processed by the processing machine 117 to another adjacent studio. For subsequent processes. Further, the front side 113 of the working chamber 110 is provided with a sliding door 119 to freely open and close the processing area, but the present invention does not limit the position of the sliding door 119. The sliding door 119 can also be disposed on the side sill 4 behind the working chamber 11 。. Further, the passages 115a, 116a having a predetermined size are disposed to penetrate the left and right sides 115, 116 of the working chamber 110, so that the transport unit 118 for transporting the workpiece can pass freely. Here, the passages 115a, 116a have longitudinal section dimensions substantially equal to the longitudinal section area of the transport unit 118 to ensure that the transport unit 118 carrying the workpiece passes unimpeded through the passages 115a, 116a. That is, the distance between the transport unit 118 and the passages 115a, 116a is minimized to minimize the flow of air supplied to the work area of the working chamber 110 through the gap. The laminar flow L is thus prevented from being directed to the sides of the working chamber 110 where the passages 115a and 116a are disposed along the transport unit 118. The fan filter unit 120 is mounted on the top surface 111 of the working chamber 110 defined as a ceiling to force supply of clean air free of external impurities into the working chamber 11 to generate the laminar flow L. The fan filter unit 120 includes an air supply area corresponding to the entire area of the top surface 111 of the working chamber 110 to allow the laminar flow L to be directed downwardly from the entire area of the top surface 111 of the working chamber 110. Ensure that the processing area of the studio has an average pressure distribution. Such an approach fundamentally avoids the creation of vortices, i.e., eddy currents in the interior corners of the working chamber 110 due to the uneven pressure distribution. The fan filter unit 120 includes at least one filter 122 and at least one air supply fan 124. The filter 122 is disposed on all of the top planes 111 of the working chamber 110. The air supply fan 124 is disposed above the filter 122 to supply clean air free of external impurities into the working chamber 110. At the same time, the front ventilation device 131 and the rear ventilation device 132 are respectively disposed on the front side 113 and the rear side 114 of the working chamber 110 to guide the laminar flow L entering the working chamber 110 from the fan filtering unit 120. Both sides of the transport unit 118 flow and are discharged. The front ventilating device 131 and the rear venting device 132 are disposed substantially flush or below the transport unit 118 such that the laminar flow L of the impact on the top surface of the transport unit 118 can be naturally directed to the transport unit. 118 11 94375 200902810 Direction of transportation. Furthermore, the front ventilating device 131 and the rear venting device 132 may each be constructed by at least one opening having a predetermined size extending through the front side 113 and the rear side 114 of the working chamber 110, respectively. Therefore, the airflows L1 and L2 which are divided and guided along both sides in the transport direction of the transport unit Π8 can be naturally discharged by the pressure gap between the inside and the outside. In the present embodiment, the front ventilating device 131 and the rear venting device 132 are perforated in a square shape in a direction parallel to the transport direction of the transport unit 118. However, the invention does not limit the direction of the perforations. The front ventilating device 131 and the rear venting device 132 may each be formed by a porous plane having a plurality of through holes (not shown). The porous plane is arranged in front of the working chamber 11 平行 in a direction parallel to the transport unit. With the back side. Further, the front ventilating device 131 and the rear ventilating device 132 may have suction fans 133 and 134', respectively. When the power is supplied, the suction fans 133, 134 will generate suction to forcibly separate the divided airflows L1, L2 to the outside. discharge. Therefore, the airflows L1 and L2 which are divided and guided along both sides of the transport direction of the transport unit 118 can be forcibly discharged to the outside of the studio no. The suction fans 133 and 134 are respectively disposed on the inhaler 13 plus 1343, and the inhalers 133a and 134a extend from the front ventilation device 131 and the rear ventilation device 132 as the clean room 1 constructed as described above. In the fan filter unit 12, the outside air is forcibly sucked into the working chamber 110 by the air supply fan 124 and removes foreign matter when passing through the filter 122, and then forms the laminar flow L and forcibly It is supplied to the studio 11〇. 12 94375 200902810 The fan filter unit 120 has an air supply area corresponding to the entire area of the top surface 111 of the working chamber 11 . Therefore, the laminar flow L provides an average pressure distribution of the internal space of the working chamber 110 and a vertical air flow structure. As for the average pressure distribution of the laminar flow L supplied to the working chamber in the present embodiment, the vortex is prevented from occurring in the inner corner of the working chamber 11 and the external impurities are prevented from floating in the working chamber. Around the inner corner. Therefore, defects are prevented from being infiltrated into the work carried by the transport unit 118 by foreign matter. ' Subsequently, the laminar flow L that is uniformly supplied into the entire internal space of the working chamber 110 is impacted onto the transport unit 118 of the workpiece in the transfer studio 110; and then formed along the corresponding The divided airflows L1, L2 on both sides of the transport direction of the transport unit ns. As shown in FIG. 5, the divided airflows LI, L2 are naturally guided to the front ventilation device 131 and the rear ventilation device 132, wherein the front ventilation device 131 and the rear ventilation device 132 extend through the working chamber 110. The front side 113 and the rear side (side 114; and the divided airflows L1, L2 are discharged to the working chamber 110 only with the front ventilating device 131 and the rear venting device 132 as a discharging outlet. The suction fans 133, 134 are respectively mounted on the front ventilating device 131 and the rear ventilating device 132. The divided airflows L1, L2 are forcibly discharged outward to ensure a high discharge efficiency of the air. That is, the airflows L1, L2 divided along the rain side of the transporting direction of the transport unit 118 are discharged only through the front ventilating device 131 and the rear ventilating device 132. Because the passages 115a and 116a have a section area substantially equal to the longitudinal section area of the transport unit 118 carrying the work piece 94735 13 200902810, the passages 115a, 116a extending through the left and right sides 115, 116 of the working chamber 110, and having free passage The transportation Unit 118. Therefore, the distance between the transport unit 118 and the passages 115a, 116a is minimized, and a large amount of laminar flow L is prevented from being discharged therethrough. Further, the front ventilating device 131 and the rear ventilating device 13 2 are disposed at the work. The front side 113 and the rear side 114 of the chamber 110 are disposed lower than the transport unit 118 to be divided with the airflows L1, L2 that are divided on both sides along the transport direction of the transport unit 118. Therefore, staying at The foreign matter on the transport unit 118 does not float along the transport direction of the transport unit 118, but passes through the airflow L1, L2 divided along both sides, and passes through the front ventilating device 131 and the rear ventilating device. 132 is discharged outward so that the floating outer boundary impurity is less able to penetrate into the workpiece, thereby preventing the workpiece from being defective during processing and transportation. According to the embodiment of the present invention, the supply layer flow enters according to an embodiment of the present invention. The fan filter unit of the studio has an air supply area corresponding to the entire area of the top surface of the working chamber. Further, the front ventilation device and the rear ventilation device are disposed on the front and rear sides of the working chamber, That is, corresponding to both sides of the transport direction of the transport unit, for discharging the laminar flow supplied from the fan filter unit to the outside. Therefore, the average pressure distribution of the laminar flow in the entire internal space of the working chamber is provided, and the laminar flow is provided. The top surface of the studio is supplied downwards. Therefore, it is ensured that the probability of occurrence of the vortex in the inner corner of the working chamber is minimized. In addition, the laminar flow is passed before the two sides arranged in the transport direction corresponding to the transport unit. The ventilating device is discharged outwards. Therefore, when the laminar flow is guided along both sides of the transport unit, the external foreign matter floats to a maximum of 14 94375 200902810. Therefore, the product defect rate caused by the introduction of external impurities into the workpiece is effectively reduced, and the reliability of the product is improved. The specific embodiments described above are merely illustrative of the features and effects of the invention and are not intended to limit the scope of the invention. Any equivalent changes and modifications made by the present invention will still be covered by the scope of the following claims without departing from the spirit and scope of the invention. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic longitudinal sectional view of a conventional camera module package; FIG. 2 is a schematic view of a clean room of a conventional air cleaning system; wherein (a) is an architecture (b) is a schematic view of a clean room of a conventional air cleaning system; wherein (a) is a top view and (b) is a front view Schematic, (c) is a schematic side view; Figure 4 is a schematic view of the clean room of the air cleaning system of the present invention; Figure 5 is a laminar flow of a clean room according to an exemplary embodiment of the present invention Figure 6 is a schematic cross-sectional view of a clean room according to an exemplary embodiment of the present invention; wherein (a) is a schematic top view, (b) is a front view, and (c) is a side See the schematic. [Main component symbol description] 1 Package 10 Lens barrel 13 Cover 13a Mirror hole 15 94375 200902810 20 Cover 25 Infrared filter 30 Image sensor 40 Circuit board 42 Window 45 Connector 70 Studio 72 Transport unit 73 Processing machine 74a 74b Channel 76 Front door 80 Fan filter unit 81 Filter 82 Air 1 Supply fan 90 Clean room 110 Studio 1 111 Upper surface 112 Lower surface 113 Front side 114 Rear side 115 Left side 115a, 116a Channel 116 Right side 117 Processing machine 118 Transportation Unit 119 Sliding door 120 Fan filter unit 122 Filter 124 Air supply fan 131 Front ventilator, 132 Rear ventilator 133, 134 Suction fan 133a, 134a Inhaler L Lens group, laminar flow U, L2 Airflow V Cyclone 16 94375