TW200848899A - Active matrix substrate, method for producing the same, and flat display - Google Patents

Abstract

Disclosed is an active matrix substrate having excellent transistor characteristics and high reliability, which can be produced by a simple process. Also disclosed is a method for producing such an active matrix substrate. Specifically disclosed is an active matrix substrate comprising a base and a thin film transistor formed on the base and having an amorphous silicon film. In this active matrix substrate, a silicon oxide layer is arranged on the amorphous silicon film, and an organic protective film is arranged on the silicon oxide layer.; Also specifically disclosed is a method for producing such an active matrix substrate, which comprises (1) a step for forming a silicon oxide layer on an amorphous silicon film a by oxidizing the surface of an amorphous silicon film A of a thin film transistor formed on a base, and (2) a step for forming an organic protective film of a radiation-sensitive resin composition on the silicon oxide layer.

Description

[Technical Field] The present invention relates to an active matrix substrate, a method of manufacturing the same, and a flat display device. More specifically, the present invention relates to an active matrix substrate which can be manufactured in a simple operation and which has good transistor characteristics and high reliability, a method of manufacturing the same, and a flat display device. [Prior Art] The so-called active matrix substrate is provided with a pixel electrode through a thin film transistor (TFT) at the intersection of a plurality of gate signal lines and source signal lines which are arranged orthogonally on the substrate. Such a substrate is used in an active matrix type flat display device. In the active matrix type flat display device, each display element is individually controlled by a TFT (switching element), and therefore, crosstalk is less likely to occur than a broken matrix type flat display device, and is suitable for high definition. And large capacity. (FIG. 7 is a schematic diagram of a circuit diagram of a circuit on a conventional active matrix substrate. The intersection of the gate signal line 12 and the source signal line 13 arranged on the substrate is configured as a TFTU of the switching element. The amount of current flowing from the source electrode 16 to the drain electrode 17 is changed in accordance with the voltage applied to the gate electrode 15, and the change is transmitted to the electrode 18 via the contact hole. The active matrix substrate of the Baizhi has mostly On the surface of the TFT array forming the TFT, a passivation film composed of Shixia Nishui Temple is formed by a 贱 法 method, a steam clock method or a CVD method, and the surface is flat 2223 by the interlayer insulating film. 943 8-PF 5 200848899 A configuration in which a germanium electrode connected to a TFT is connected to a hole electrode on the interlayer insulating film, for example, a protective layer (passivation film) and an interlayer insulating film of Patent Document 1 are provided. Active disclosure of a flattened layer matrix substrate composed of the present cyclobutene composed of Si Nx or Si 〇 2. Further, in Patent Document 2, it is formed between the denier electrode and the wiring. Source electrode, source Pole 绫, ... ^ 踝, and the electrode and the 电极 彳 垸 1 1 弟 1 1 1 1 1 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机2, an organic interlayer insulating film, and an active matrix substrate of an organic layer n-edge film which is directly connected to the underlying layer in the channel portion of m. [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei 10-96963 (Patent Document 2) [Problem to be Solved by the Invention] It is considered that the above-described active matrix substrate has practical transistor characteristics and reliability, but in these structures, in the patent literature The active matrix substrate is completed, and the passivation film must be formed in a vacuum. On the other hand, in the active matrix substrate of Patent Document 2, the formation process of the organic interlayer insulating film is required twice, and generally, the manufacturing process The operation becomes cumbersome. It is an object of the present invention to provide an active matrix base that can be manufactured with a simple operation and has good transistor characteristics and high reliability. And a manufacturing method thereof including the plane of the active matrix substrate composed of

2232-9438-PF 6 200848899 Display device. [Hands and Problems for Solving the Problems] The inventors of the present invention have conducted research on the above-mentioned purpose, and as a result, found that after oxidizing the surface of the amorphous non-crystalline ruthenium film formed on the substrate On the other hand, the active matrix substrate formed with the organic protective film thereon has a small leakage current, and the source electrode is linearly activated with respect to the voltage of the gate electrode, and the electricity between the drain electrodes is "and, even if In the high-temperature and high-humidity environment, the long-term placement also makes the threshold voltage required for these transistor characteristics or flowing current hardly change, and according to this opinion, the present invention has been completed. That is, the present invention provides: [1] An active matrix substrate comprising a substrate and an active matrix substrate formed of a thin film transistor having an amorphous ruthenium film formed on the substrate, amorphous The ruthenium film is on the surface of the film, has a ruthenium oxide layer, and on the amorphous ruthenium film, an organic protective film is laminated; [2]: The active matrix substrate as described in the above 矽], the thickness of the tantalum oxide layer is 5 nm [3] The active matrix substrate described in Li [1] or [2], the amorphous ruthenium film system is also subjected to oximation; [4]· as described in [1] to [3] above In any one of the active matrix substrates, the organic protective film is a film composed of a crosslinked product of a cyclic olefin polymer having a polar group; [5] a method for producing an active matrix substrate is as described above [1] The manufacturing method of the active matrix substrate described above has:

2232-9438-PF 7 200848899 (1) oxidizing the surface of the amorphous ruthenium film A formed on the thin film transistor on the substrate to obtain a process of forming the amorphous crystallization film b on the surface; and (2) a process for forming an organic protective film by inducing a radiation-based resin composition on the surface of the amorphous ruthenium film B; [6]: A method for manufacturing an active matrix substrate according to the above [5], Performing at least one selected from the group consisting of contact with ozone water, ultraviolet irradiation in an oxidizing gas atmosphere, heating in an oxidizing gas atmosphere, and exposure to a plasma containing an oxidizing gas. The method of manufacturing the active matrix substrate according to the above [5] or [6], wherein the process (2) is carried out by a wet method; [8] The method for producing an active matrix substrate according to any one of [5] to [7] wherein the inductively radiating resin composition comprises a olefinic polymer having a polar group, a crosslinking agent, Inductive radiation compound and solvent; and [9] a flat The surface display device comprises the active matrix substrate according to any one of the above [1] to [4]. [Effect of the Invention] The active matrix substrate of the present invention has a small leakage current, and linearly activates the source electrode/drain electrode with respect to the voltage of the interpole electrode; and, even at a high temperature and humidity In the environment, it is also left for a long time, so that the transistor characteristics or the threshold voltage of the latter are hardly changed. If the tongue of the substrate is used, a long life, low power consumption, and a high pair are obtained.

2232-943 8-PF 8 200848899 Flat display unit. The manufacture of the active matrix substrate efficiently manufactures a highly active method with a high degree of reliability. The active matrix substrate can be easily operated by the present invention. [Appropriate application method] The active matrix substrate of this month is a non-crystalline stone film formed on the substrate, having a stone oxide layer on the surface of the film, and a layer on the amorphous D film. Organic protective film. 1 is a top view of a monolithic unit of the active matrix substrate of the present invention (top view) and a partial cross-sectional view (bottom view) including a TFT portion on the surface of the substrate i; The gate signal line 2 and the source signal line 3 are arranged orthogonally, and at their intersection, _ is configured. The _ system has a free electrode 5, a source electrode 6, and a drain electrode 7. Oxide is formed on the surface of the amorphous ruthenium film α of the TFT 4 on the substrate to form a tantalum oxide layer, and the oxide film 8 is formed on the same day. An organic protection boat 9 made of an organic polymer is disposed on the oxide film 8 (including the amorphous carbon layer: layer), and the electrode electrode 7 and the halogen element are connected through the contact hole 1 of the organic protective film 9. Electrode η. In addition, in the present embodiment, the number of the individual TFTs is one, but two or more can be formed as needed. The components of the active matrix substrate of the present invention, that is, the exhibit material, the gate signal line, the source signal line, the T F τ, the halogen electrode, etc. are as follows:

Same as the former materials! The conventional active matrix substrate described in or 2 can be formed using the materials described in these publications. 2232-943 8-PF 9 200848899 The active matrix substrate, the amorphous crystal of the TFT, has a smectite layer on its surface, but it is assumed to be hydrophobic when oxidizing the surface of m. Prevents intrusion of moisture into the intrusion between the surface of the amorphous stone membrane and the organic protective film. As a result, it is widely available = a good thermal and thermal resistant active matrix substrate. The thickness of the dream oxide layer is particularly limited. However, from the viewpoint of finding a good crystal characteristic, it is preferably 5 or less, more preferably the following. Dream oxygen = thickness of the layer: the limit is usually lnm. Below 1M, it is not easy to obtain the effect of preventing the intrusion of the moisture of the filling knife. In the present specification, the surface of the TFT is not the surface of the amorphous film of the channel portion of the channel. In addition, the non-crystalline substance of m; the film is made more effective in preventing the intrusion of moisture from invading the surface of the amorphous film and the organic protective film, and it is preferable to carry out Money-based. In the state where the surface of the amorphous 11 film of the TFT is methylated, it is presumed that the hydrophobicity of the surface of the amorphous ruthenium film is further improved, and the effect required by the present invention can be more satisfactorily found. The mercaptoalkyl group which is used for the alkylation of the surface of the amorphous ruthenium film is not particularly limited, and specific examples thereof include an alkyl group, a trimethyl sulfonium group, a triethyl sulfonium group, and a tri-= alkyl group. , butyl dimethyl methacrylate, butyl butyl diphenyl methacrylate, diphenyl decyl alkyl and the like. Among these, trimethylmethacrylate (i.e., preferably trimethylhydrazine alkylation) can be suitably used. In the present specification, the term "methylation of formazan" refers to the use of a methoxyalkyl group.

2232-9438-PF 10 200848899 $The base material of the surface of the ruthenium alkylation object such as the amorphous ruthenium film ==? Array substrate' The organic protective film system is usually formed in the amorphous 2 == mask (4) Oxide layer... Protective film) 接地 Ground-bonded shixi oxide layer and organic, ,). /, without obstructing the discovery of the effects required by the present invention, a film composed of a material of the layer between the surface of the H-crystalline 11 film and the organic protective film. ,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, ; (4): The diterpene polymer has extremely low hygroscopicity, and the dielectric material has a small dependency, so that it can be suitably used. The non-纴曰 surface of the TFT having the ruthenium oxide layer is directly laminated on the surface of the M 矽 矽 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 此种 此种 此种 此种 此种 此种 此种 此种 此种= : The film characteristics of the active moment H ^ obtained by the protective film and the higher reliability are 1*. In the present invention, it is preferable for the organic protection household to sin. ... The film thickness is usually 0·1~ioo “m, 疋··5~5〇”, more preferably 0.5~30"m. The squid is a cyclical hydrocarbon-based polymer having a position: 糸 "The system may have a monomer monomer other than a cyclic olefin monomer::: a full-structure unit of a cyclic-dense hydrocarbon-based polymer The ratio is usually 30% denier 0/. 30~1% by weight, preferably 50 to 10%, more preferably 70 to 100% by weight.

2232-9438-PF 11 200848899 曰 The monoolefin system used in the invention is not particularly limited, but as a specific example thereof, a cyclic olefin monomer (a), which will be described later, (C), ethylene The alicyclic hydrocarbon monomer (4) and the ethyl fluorenyl aromatic hydrocarbon 2 (e) °, in addition to the single system other than the cyclic olefin monomer, are not limited, but as a specific example thereof For example, the chain olefin (f) described later. The ring-shaped flue-cured ear 5ζ of the present invention can be polymerized by any combination and in the form of a mixture. In addition, it can also be hydrogenated by hydrogenation for the ring of the polymer. Become a saturated ring structure. The lamp is weathered as the cyclic olefin monomer of the cyclic olefin monomer (a) il body: listed as having no polar group 2,1] heptyl 2-alkenyl, 5~-ethyl-di-anthracene [2] 2. 1] 5—ethylidene~_if [2 soil one-%[2. 2. 1] heptyl- 2 - dilute hydrocarbon, one ¥ L 2 · 2 · 1 ] 痊 〇 〇 [2· 2. 1] Geng Α — 2 κ Earth olefin, 5- 曱 一 二 」 」 厌 一 一 一 2 olefin, 5 _ _ -2- olefin, Erli " soil a ring [2 · 2 · 1] G - 1⁄4 [4 3. 〇·p's Ί nickname: dicyclopentadiene), tetracycline] ten-:, 7-diene (Vulgar 3, 5, 7, 12, 11 - five suspects · 〇 · 1 , 14 · 〇3,7]15

乂pentaene, tetracyclo[4·4 〇12,5,7,10^Q fine hydrocarbons (commonly known as: four rings twelve..1 · 1 ] ten-3- wide.] twelve dilute hydrocarbons, 8-^ Methyl-tetracyclo[4·4·0·12'5. Twelve-31 hydrocarbons, ethyl: tetracyclic [4.4. -3-thin smoke, 8-B and another four% [4·...2 , 5.", Twelve E and four rings [4. 4 · 〇 12, 5 ι7) 1〇ί, q-olefin, 8-vinyl · 1. 1 ] Twelve _3 % L4 · 4_ 〇. I2,5· I7,1.]12—3 —

2232-943 8-PF 12 200848899 Olefin, 8-propenyl-tetra-cyclo[4·4 ί] 5 • υ· 1 · 17,1〇] 12-3-olefin, pentacyclic [6· 5· 1 I3,6· Ο2,7· 〇9,13ί 丄班# Five~3,1 0 — A fine, % pentene, cyclopentadiene, 1,4 methane ~1 / I. , 4, 4a, 5, 10, 10a-hexahydroxy-en, 8-phenyl-tetra-cyclo[4.4.0]2,5 l7ln inhibit "· .1] 12--3-olefin, tetracyclic [9· 2 .1· 02,1G. 03'8] Fourteen ς, b, 7, 12 —Tetraolefins (also known as 1,4 - A, 1, 4, 4 &, 9 & ~ 铋 | tetrahydroxy~ 9H a seedling), five rings [7. 4· 〇 · I3,6· I1.,13· 〇2,^ + "n five to 4, 11-diolefin, five rings [9· 2. 1· p' 7· 〇 2, ' 〇 u] fifteen ^ 'on' S' two smoke and so on. These cyclic olefin smoke single system can be used in two or more types. The second group of the cyclic olefin monomers may be combined as the second group of the cyclic olefin monomers. The σ group may be a olefin soap having a polar group. The olefin single system having a polar group may be used singly or in combination of two or more. The polar system can be divided into a protonic polar group and a polar earth other than the Ting. Therefore, a single system of a olefinic olefin having a polar octa* 曰 14 group can be a cyclized monomer having a protonic polar group (b) and a polar group other than a polar group (non-quality, body (1) In the present specification, the term "protonic polar group" refers to an atomic group in which a carbon atom directly binds to a hydrogen atom. Here, the carbon atom is

The subfamily is preferably the original of Groups 15 and 16 of the periodic table = the first and second weeks of the periodic table] and the second week = the second child is even preferably an oxygen atom, a gas atom and sulfur. Atom, especially best = 2232-9438-PF 13 200848899 As a specific example of a protic polar group, a carboxyl group (hydroxycarbonyl group), a rhein group, a carboxylic acid group, a polar group having a polar group of an oxygen atom; A polar group having a nitrogen atom such as an amine group, a secondary amino group, a primary amidino group or a secondary sulfhydryl group, and a thio group having a polar group having a sulfur atom or the like. Even among these, it is preferable to have an oxygen atom, and it is more desirable to be Wei. Specific examples of the cyclic olefin monomer (b) having a protic polar group are 5-hydroxycarbonylbicyclo[2·2·1]heptyl-2-dihydrocarbon, 5-methyl-5-peryl Carbonyl one ring [2·2·1]heptyl-2-alkenyl, 5-amino group (fluorenyl-5-hydroxycarbonylbicyclo[2·2·1]heptyl-2-dihydrocarbon, 5-external 6 - an internal dihydroxycarbonylbicyclo[2·2·1]heptyl-2-alkenyl, 8-ylaminotetracyclo[4·4·0·I2,5·in.] dodeca-3-olefin, 8-methyl-8-hydroxycarbonyltetracyclo[4·4·0· I2,5· ι7,ι°]12—3 a woman fe,8—external one 9 one inner two one base [4· 4. 〇· I2,5 I7,10] a cyclic olefin having a carboxyl group such as a 12-1,4-olefin; a 5-(4-hydroxyphenyl)bicyclo[2·2.1]heptyl group 2-Hydrazine, 5-mercapto-5-(4-monophenyl)bicyclo[2·2·1]heptyl-2-alkene, 8-(4-hydroxyphenyl)tetracyclo[4·4· 0· I2'5·厂'10]12- 3_ olefin, 8-indolyl _ 8-(4-hydroxyphenyl)tetracyclo[4. 4· 0· 1'· l'1.] Twelve 3 - olefins, etc. The olefin or the like is preferably a cyclic olefin having a carboxyl group even in these ten. As a specific example of the aprotic polar group, an ester group (collectively referred to as an alkoxy group and an oxetyl group). ), N—substituted aryl imino group, epoxy group, halogen atom, cyano group, weiki carbyl group (an acid anhydride residue of diweiric acid), a minority oxy group, a hydroxy group, a tertiary group, a tertiary acid group Base, halogen atom, acrylonitrile group, and the like.

2232-943 8-PF 14 200848899 In some cases, it is preferred that the ester group, the N__ substituted quinone imine group, the cyano group and the halogen atom are more preferably an ester group and an N-substituted quinone imine group. Particularly preferred is an n-substituted quinone imine group. The cyclic olefin monomer (c) having an aprotic polar group is specifically exemplified below. 'As a series of cyclic olefins having an ester group, for example, 5 -aceticylbicyclo[2·2.1]heptyl-2-alkene, 5-methoxycarbonylbicyclo[2· 2.u heptyl-2 - olefin, 5-methyl-5-methoxycarbonylbicyclo[2·2.1]heptyl-2-furan, 8-acetate tetracyclo[4. 4. 0· I2,5 I7,1 . 11:3-olefin, 8-methoxycarbonyltetracyclo[4·4·〇· ”'5. l7,1G] 12--3-olefin, 8-ethoxycarbonyltetracyclo[4·4 〇· 12,5· l7,1Q] 12-3 olefin, 8-n-propoxycarbonyltetracyclo[4·4· 〇. l2,5. Γ,10] -12-olefin, 8-isopropoxycarbonyltetracyclo[4·4·〇·l2,5.l7,10] 12-1,3-alkenyl, 8-n-butoxycarbonyltetracyclo[4· 4. 〇. ι2, 5. ι7,1〇121-3 olefin, 8-mercapto-8-decyloxycarbonyltetracyclo [4. 4. 〇. l2'5·l7'1G] 12-3-olefin, δ- Methyl-δ-ethoxycarbonyltetracyclo[4·4·〇·12'5· 17,1°] 12-3-olefin, 8-methyl-8-η-propoxycarbonyltetracyclo [ 4· 4. 〇· I2,5· Γ,1ϋ]12-3-olefin, 8-methyl-8 isopropyloxy> anoyltetracycline [4 4 0 22*5 I7,1.] 十- Mono-olefin, 8-methyl-8-n-butoxycarbonyltetracyclo[4·4·〇·i2,5. 17'1D]12-3-olefin, 8-(2,2,2 Trifluoroethoxycarbonyl)tetracyclo[4.4.0·I'5·Γ'10]12-3 Alkene, Mercapto- ( 2,2,2-difluoroethoxymethyl)tetracyclo[4. 4. 〇· I2,5·I7,1.] XX2-3-olefin.

2232-9438-PF 15 200848899 As a series of cyclic olefins having an N-substituted quinone imine group, for example, n (4 phenyl) (5-original calcined 2,3-dicarboxy quinone imine) or the like can be mentioned. As a series of cyclic olefins having a cyano group, for example, 8-cyanotetracyclo[4·4.〇.1·l7'1G]12-1,3-alkenyl, 8-methyl-8-cyanotetracyclo[4] 4 Π 1 2, 5 1 7, 1 0 Ί 丄 η • ·] 1,4- 3-olefin, 5-cyanobicyclo[2. 2. ηheptyl-2-alkenyl, etc. As a series of cyclic olefins having a halogen atom, for example, 8-chlorotetracyclo[4. 4 · 〇 · I 2 ' Bu 1 12 - 3 - olefin, 8-methyl - 8 - chlorotetrazide (cyclo [4 · 4. ,. 12,5. I7', 12-3 olefin, etc. Further, as an example of the alicyclic hydrocarbon monomer (4) of the B County, vinylcyclopropylene, vinylcyclobutane, vinylcyclopentan can be cited. Vinyl ring-burning of hospitals, women's cyclohexyl hexane, ethylene-cycloheptane, etc.; 3-methyl-b-vinylcyclohexane, 4-methyl-ethethylcyclohexene, one ^2-vinylcyclopropane, 1,1 - 芏奚〇^ 5 - a vinyl-cycloalkane having a substituent such as a 2-methylcyclopropane, etc. I ^= Bu, Examples of the material hydrocarbon monomer (e) in the county of B can be listed as vinyl aromatics such as B, B, and 2, and 2, ethylene, and the like; 3-methylstyrene, 4 ~ P 1 1 Beneficial, 4 - cyclohexyl basic ethylene, 4 - dodecyl styrene, 2 ~ a Jiao, 4 r ^ -tt -T # Λ - base ~ 4 卞 phenyl benzene 4 One (n-butyl butyl) styrene and the like are ancient rain △ Gan Li... A multifunctional vinyl aromatic such as a vinyl aromatic group, such as dodecyl benzene, ρ-diethoxyphenyl, bis(ethylene)methane, etc., as a chain olefin (f) Examples are L 卞 series of ethylene; propylene, 1 - butene, 1 - pentylene, 1 - hexene, 3 - methyl T - 1 - butene, 3-methyl

2232-9438-PF 16 200848899 ~pentene, 4-methyl-j-pentene, oxime~methyl-1 - Pj T ^ hexene, 4,4 dimethyl to j pentene, 3-B 1, 1-hexene, 4, 4 -ene, 4-ethyl-hydrazine-hexene, anthracene - octapeptide 1, keto-1-hexene, 1~ Yue Mi-decene, 1 - dodecene, ! Decene octene, 1 h Hawthorn 1 -tetradecene, 1 - 十丄俨κ octadecene, 1-20 octadecene, skeletal hexanyl, hexadiene: yl... - the number of slaves of methyl-14 4 is 2 to 20 olefins; "hexene, 1'7-octadiene, etc., non-common vehicles, etc. These single systems can be used. ... alone or in combination 2 The polymerization method of the above various monomers can be carried out by a ring-opening polymerization method or a polycondensation method, a hanging method, a metal coordination compound such as a key, a ruthenium, or an iron. For example, it is also possible to separate the monomer from the ring-opening polymer and the ruthenium according to the monomer 2 ^ dihydrate catalyst. For example, under the olefin, the two are combined; Γ the ring-opening copolymer of the monomer (In the case of the following: the open-loop (co)polymer of the puncturing monomer.") The sub-heart 'polymerization catalyst J'. If olefin π, the metal compound in the catalyst. The number of Mohrs in the shape of the early body is 2, 000, 〇〇〇. becomes 1 · 100 ~ jade: Take the female ten 疋 1 · 5 〇〇 ~ 1: η / ΊΓί ππη 1,000 ^ 1 : 500 non , .. , _, just, more ideal is 1: The range of auu,000. The ρ γ 糸 糸 polymer can be added by 前述 by the above-mentioned polymerization. The addition of 氲 is carried out as hydrogen L 』 and a catalyst. Hui you j to use, for example, in the olefin-like users. When the oxygen is added to the (4) 17 compound, the form is the same - the system is used for the main purpose of the use of the month of Ziegler s, ', 'Beiyi coordination compound catalyst, carrier type precious gold

2232-943 8-PF 17 200848899 Is a catalyst, etc. In these oxygens, it is shown that T does not cause a side reaction such as a modified polar radical functional group, and the chlorine can be selectively added in the polyunsaturated unsaturated bond: The noble metal coordination compound & bei is a highly nitrogen-containing heterocyclic axe, ideally an electron catalyst. Further, the ring-shaped substance or the lignin has a coordination number of at least %, more preferably at least 9 G%. 〖The best sheep 疋80 is, ring: hydrocarbon polymer system is not particularly limited, but the ring I (co) polymer of gas I ^ olefin early body and the addition of this 4b ; ring; a ruthenium polymer of an olefin monomer and a vinyl alicyclic hydrocarbon monomer and a chlorine additive thereof; and an addition copolymer of a cyclic thin smoke == comonomer and a hydrogen additive thereof::::= The second embodiment is more preferably an ammonia of the ring-opening (co)polymer of the ring-shaped thinning monomer. The cyclic hydrocarbon-based polymer system may be used alone or in combination of two or more kinds, and different compositions may be used. The cyclic hydrocarbon-based polymer system used in the present invention is preferably one having a number of polar groups included in the ring-based polymer having a polar group, and the polar group may include the same or different The type. Further, the 'polarity group' may be bonded to the cyclic hydrocarbon monomer unit or may be combined with the monomer unit other than the cyclic hydrocarbon monomer to form a cyclic olefin monomer unit.疋,,, ° In the present invention, the cyclic aliphatic polymer-based polymer particularly preferably has a protic polar group. By using a circular flue gas polymerization having a protic polar group

2232-9438-PF 18 200848899 Do not (in the following 'there is a phenomenon called "polymerization of a cyclic olefin containing a protic polar group").) Increasing the inductive radioactive linear structure described later with respect to active radiation The sensitivity or the adhesion of the composition to the substrate is desirable because of & The cyclic olefin-based polymer system containing a protic polar group may be used alone or in combination of two or different compositions. use

As the ring-shaped flue-cured polymer containing a protic polar group in the present invention, it is suitable to have a chemical formula (" as shown in the prior art, and more preferably has a chemical formula (work) The structural unit represented and the structural unit represented by chemical < (π). The structural unit represented by the chemical formula (I) and the structural unit represented by the chemical formula (π) are all cyclic olefins. Body unit. [Chemical Formula 1]

L is a chemical formula (I) y, a ruthenium atom or an X η -R group (X-based organic group, lanthanide 0 or 1 p, 2y, an alkyl group which may have a substituent, an aromatic group which may have a substituent Or Θ Θ polar polar group.) At least one of 'R1 to R4' is one of protonic groups χη - R'· group. m is an integer from 0 to 2. ] [Chemical Formula 2] 2232-9438-PF 19 200848899

(π) Κ5~R8 is a combination of 乂5s and 5 s of these two carbon atoms combined with a heterocyclic structure of 3 to 5 members which is less than a hydrazine or a nitrogen atom, and the heterocyclic ring is a milk atom 2 Integer. There are substituents. k is 〇~1 ', μ% is in the formula I), as a binary organic U (tetra) represented by Χ, for example, methylene, vinyl, base, etc., by R, yak as shown The alkyl group of the substituent is usually a carbon number of a linear or branched bond, and as an example thereof, a methyl group, an ethyl group, an n-propyl group, and an isopropyl group: an aromatic group which may have a substituent Usually, the number of carbons is 6 to 10 = aryl fluorenyl group, and examples thereof include a phenyl group, a benzyl group and the like. The substituents of the alkyl group or the substituent group are a group of alkyl groups having a carbon number of i to 4 such as a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an η: butyl group, an isobutyl group or the like; a phenyl group; An aryl group having a carbon number of 6 to 12 such as toluene, a methyl group or a naphthyl group. Only the above-mentioned series of protonic polar groups are shown by the above. In the general formula (JI), R5 to R8 are a three-membered heterocyclic ring structure in which two carbon atoms are bonded in an arbitrary combination, and examples thereof include an epoxy structure. In addition, as the same 5-member heterocyclic structure series, for example, 2 citrate liver structure [-

Construct [-c(=0) — N—c( = 〇)—] and so on. As a series of substituents bonded to the heterocyclic ring 2232-9438-PF 20 200848899, for example, a phenyl group, a naphthyl group, an anthryl group or the like can be mentioned. In a cyclic olefin-based polymer containing a protic polar group, a ratio of a monomer unit having a protic polar group to a monomer unit other than the monomer unit (a monomer unit having a protic polar group / a monomer other than this) Unit): It is usually 10 in weight ratio. /0~10/90, preferably 9〇/1〇~2. /8〇, more ideally the range of 80/20~30/70. An ideal method for producing a cyclic flue-cured polys species containing a protic polar group used in the present invention is a cyclic olefinic monomer (1) having a protic polar group, and hydrogen is added as required. method. Further, 'the procyclic polar group-containing cyclic olefin system used in the present invention: the oral system can also be obtained by a ring-shaped dilute-smoke polymer having no protic polar group. The method of introducing a proton: H: method to obtain a cyclic olefin polymer. At this time, in the case of the polymer before and after the introduction of the protic polar group, hydrogen addition of 0 ^ 2 may be carried out to introduce a protic polar group into the cyclic olefin polymer having no protic polar group. The modifier is usually a compound having a reactive carbon-carbon unsaturated bond and a protic polar group in one molecule. Specific examples of the compound include acrylic acid, methacrylic acid, angelica, I, I, oleic acid, erucic acid, brazil acid, maleic acid, succinic acid, and turmeric. An unsaturated carboxylic acid such as acid, itaconic acid, atropic acid or cinnamic acid; allyl alcohol, methyl vinyl methanol, octadecyl alcohol, dilute propyl alcohol, 1-benyl ethylene-1-ol , 2-propene-1-alcohol, 3-butene-1-alcohol, 3-butene-2-alcohol, 3-methyl-3-butene

2232-9438-PF 21 200848899 曱基一 2 — butyl 1 - ol, methyl - 3 - butyl 1 - alcohol, - alcohol - alcohol thiol - 3 - butene - 2 4 pentene 1 - Resin, 4 - methyl - 4 - pentacene - 1 -alcohol, 2 - hexene - 1 - alcohol and other unsaturated alcohols. The modified reaction system can be carried out in the usual manner, usually in the presence of a radical generating agent. These modifiers may be used alone or in combination of two or more. In the above-described method for producing a cyclic olefin polymer containing a protic polar group, the precursor ' can be used as a protic polar group. That is, a monomer having a protonic polar group can be used instead of the monomer having a protic polar group. Further, as the modifier, a modifier having a precursor thereof may be used instead of the protic polar group. The precursor of the protic polar group is converted into a protic polar group by a chemical reaction such as decomposition or hydrolysis by light or heat. For example, in the case where the protic polar group of the cyclic olefin polymer containing a shell-like polar group is "in the state of the protonic polar group, the S group can be used" and then appropriately converted into a rebel group. Further, the cyclic olefin polymer having no protic polar group can be obtained by a usual method, for example, using the above monomers (a) and (e) to (1). The cyclic dilute hydrocarbon polymer used in the present month has a weight average molecular weight (Mw) of usually 7 to 1,500 ft., preferably 1,500 to 1 〇〇. 〇〇0 is more ideally 2, 000~1〇, the range of 〇〇〇. The molecular weight distribution of the cyclic olefin polymer used in the present day is usually the ratio of the weight average molecular weight/synthesis, τ, and the average molecular weight (Mw/Μη).

2232-9438-PF 22 200848899 Be 4 or less, #杯η ο^ Take & 3 or less, more preferably 2.5 or less. In the ring-shaped olefin-based polymer used in the present invention, it is preferably 50 or less, and more preferably, the moth value of the dilute-based polymer is two in the range; the ring retainability is good. Become ideal. ]]Special 疋 heat-resistant shape: the organic protective film of the invention is preferably formed by, but, and the substrate is good in shape, so that the wind is even after the system Take the crosslink of the cyclically smoky polymer of the organically protected polar group to form /, and the active matrix substrate system of the present month can be as described, for example, before, ten, straight 1 or 2 Knowing the ancient soil "demon", for example, the patent document Baifu method is used for manufacturing, # manufacturing efficiency is good, therefore, the following fine-grained and easy-to-form TFTs formed on the substrate have ()) the surface of oxygen: amorphous in the second: _ body) (d) the process of having a bismuth oxide layer on the surface; and (2) the resin composition in the amorphous (four) heart 膑 膑 β The method of manufacturing the induction radiation plate of the invention. The active matrix substrate of the present invention is a non-crystalline dream film, which is a non-crystalline material before the surface oxidation. Non-crystalline material after surface oxidation is not a gentleman in the TFT of the active matrix substrate of the present invention Q i), lice are, ... can be from about two to a surface of a film of A-type is not particularly limited, but the piece goods to be my Bookbag Help dagger month for easy clip 1L sheet Xi An ancient Yin rate of non-crystalline silicon oxide film of A

2232-9438-PF 23 200848899 The surface of the mouth is taken by the atmosphere of the body of the ozone water _ shot, money pure gas stomach = chemical gas to the oxidizing gas containing the exposure and less exposure One method is carried out. Groups, and extracts as a series of methods for oxidizing eve by contact with ozone water, for example, in the room, on the evening of "A surface (usually ozone concentration ^ / )", the ozone concentration is 5_, The upper limit is 2 〇 or more (usually the upper limit of the contact time is 6.) The method of the surface of the sapphire film A. The burial is contacted by the "/^ 里" to the amorphous crystalline enamel film A. The surface of π S 〇 虱 虱 而 而 氧化 氧化 氧化 Β Β Β Β Β Β Β Β Β Β 龟 龟 龟 龟 龟 龟 龟 龟 龟 龟 龟 龟 龟 龟 龟 龟 龟 龟 龟 龟 龟 龟 龟 龟 龟 龟 龟 龟 龟 龟 龟ΙΙ Φ 钱 钱 四 四 四 四 四 四 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面For the amorphous crystalline stone, about 2G of oxygen (4) is contained as the oxidizing gas above the pottery (usually the intensity =, the irradiation is 6. Seconds to a wavelength of less than or equal to the "bull. The concentration of the rolling gas" The system usually starts from 2% by volume to ι〇〇 = is the oxidation alone Body). Examples of the gas contained in the oxidizing gas-oxidized gas other than the oxidizing gas include gas, atmosphere, chlorine, etc., and an inert gas such as gas or nitrogen. Oxidizing the surface of non-曰a 石石夕膜Α by ultraviolet irradiation to obtain a non-crystalline having a broken oxide layer on the surface

2232-9438-PF 24 200848899

Quality stone film B. The oxidation degree of the pL ^ sheep layer can be oxidized by, for example, wavelength, intensity, irradiation time or oxidizing gas concentrate: the outer line is heated by heating in an oxidizing gas atmosphere. The method of the surface of the film A is, for example, in the case where the oxidizing gas t:: is heated by the heating of the array substrate to heat the amorphous material. The specification, the array substrate, refers to the substrate. The substrate formed by the circuit of the present invention. As the method, it is intended to contain about 20% by volume of oxygen as the oxidizing gas. If the temperature is above 2 〇rc, the amorphous ruthenium film 4 is heated. Points: & 'The concentration of the gas is usually 2. Body axis: 3 2 (that is, a separate oxidizing gas). As a series of gases other than the oxidizing chemical gas, for example, yttrium, ytterbium, and argon =

"The milk body. Hunting is heated to oxidize the amorphous crystalline stone film A, and the surface is paid to the amorphous crystalline stone film B having a stone oxide layer on the surface. The thickness of the layer can be adjusted by adjusting the oxidation property." The gas is controlled by the indifference, twisting, w degree or heating time. 'In the case of exposure to oxygen in the plasma containing the oxidized amorphous non-crystalline second film "face 2"; Maintain plasma in the plasma atmosphere...

Above Cm (usually the upper limit of output is l00W/cm2), yield = 1. The volume of oxygen is used as the oxidizing gas in the electric device, in which, the non-gentleman's gas is allowed to hold for more than 60 seconds. The condition of the "high-quality" stone film A. Xie's oxidation, Chen Usually starting from 10% by volume to 100% by volume.

2232-943 8-PF 25 The gas series other than oxidizing gases in 200848899 - rare gases. By means of plasma as milk, present, argon, etc., the surface of the non-crystalline enamel film A on the surface and the female yam is obtained, and the thickness of the non-named slab layer of the shixi oxide layer can be oxidized by adjustment. Sex gas: 夕膜? The oxidation is maintained for a while to control. / Chen and plasma output or two; as the aforementioned oxidizing gas series, for example, oxygen (. 2), - rolled carbon ((5), water (h2〇), ozone (five), first class, etc. Emulsified mouse (ν2〇)

The mountain '5, 6, and oxygen (03) have strong oxidation, and the oxidation of carbon dioxide ((5) or -nitrogen oxide (_ etc. is weakened. The method caused by exposure to the plasma) The surface of the oxidized amorphous ruthenium film is particularly suitable as oxygen ((1)) as an oxidizing gas system. The amorphous ruthenium film of the TFT on the substrate is formed on the surface thereof. The oxide layer, however, here, it is also possible to carry out the formylation [process (; [),] for the amorphous ruthenium film.

The mercaptan alkylating agent used for the isomerization of the surface of the amorphous ruthenium film of the TFT formed on the substrate may, for example, be hexamethyldioxane or dimethyldiene. Chlorodecane, triaminane, N-trimethylsulfanylalkylamine, N,0-bis(trimethylmethylalkyl)ethylamine, N-methyl-N-trimethyl矽alkylacetamido, N-methyl-N-trimethylsulfonyltrifluoroacetamidoamine, N-trimethylformamidinyldidecylamine, N-trimethyldecylalkyldiethyl Base amine, N,0-bis(trimethyldecylalkyl)trifluoroacetamido, N-trimethylcarbamimidazole, tetramethyldiazepine, t-butyldidecyl chloride石夕烧, N-曱基-N-(t-butyl dimethyl mercaptoalkyl) trifluoroacetamido, dichloroindenyl tetradecyl 26

2232-943 8-PF 200848899 Dioxane, chloromethyldimethylchlorodecane, bromomethyldimethylchlorodecane, octadecyl triclosan, N,N, (trimethylammonite) U.S. base) urea, N-carbohydrate, N,N-diphenyl urea, n, bismuth-bis(trimethylmethyl sulphate) carbamate, N, bismuth-bis (three Methyl methacrylate (4)) amino male 酉 酉曰 甲基 monomethyl methacrylate trifluoromethane sulfonic acid and the like. Among these, the effect of preventing the intrusion prevention between the surface of the amorphous ruthenium film and the organic protective film and the adhesion improvement effect of the interface between the two are good, and therefore, it can be suitably used. Hexamethyl bismuth amphoteric ammonia. These methicone base-forming agents may be used singly or in combination of two or more kinds. In the method for producing an active matrix substrate of the present invention, a method of subjecting a surface of an amorphous crystal film of a TFT formed on a substrate to a metal alkylation agent to form a surface of the substrate, There are no special restrictions. For example, an array substrate for forming a TFT is introduced from a heating plate to be carried into a formylation treatment chamber including a heating plate, and a pressure is reduced in the processing chamber to introduce a vapor of the X-methylation agent. Pure, heating, so that the array substrate, close to the heating plate, below 5 (rc, uniformly diffuse the vapor of the methyl hydrazine alkylating agent, stop the introduction and venting of the vapor of the methyl hydrazide agent, and contact the substrate with the heating A method for stopping the crystallization of a methadone by replacing the vapor of the formazan alkylating agent by nitrogen after the alkylation reaction of TC at 80 to 9 (the temperature of TC is introduced into the TC). Between the contact of the array substrate and the vapor of the alkylation agent, the concentration of the formazanating agent is preferably 〇15% by volume, if by the foregoing method, The ruthenium alkylation of the entire surface of the array substrate may be carried out by including the surface of the amorphous ruthenium film of the TFT.

2232-943 8-PF 27 200848899 For more than 1 minute. In addition, in addition to the foregoing methods, for example, a container is sealed at room temperature and normal pressure while sealing the array substrate and a small amount of non-crystalline agent for the TFT on the array substrate: The method of smelting base. If the method is used by the master, = 甲石夕化化化. The surface is formed in the process (1)' on the amorphous surface of the amorphous film obtained from the process (1), and the organic resin is formed by the composition of the inductively radiating linear resin. Γη二二:: Linear resin group ; 2: 7: A cyclic olefin having a polar group, a polymeric parent compound, an inductive radiation compound, and a solvent, which are used as a ring-type maternity polymer having a polar group = the structure represented by the chemical formula (1) = ::: Make a single... or by a k-type olefin-based polymer. As a series of ideal examples of the crosslinking agent, there are two double-type A-type epoxy resins, two-year-old F-type silk resin, benzene (tetra) (tetra) epoxy resin, and W-type epoxy which have three or more epoxy groups. A polyfunctional epoxy compound such as a resin, a cyclic aliphatic epoxide, an aliphatic propylene propylene shaft, or a propylene (IV) S polymer. An ideal example series for inductive radiation compounds (a compound that can be chemically reacted by ultraviolet light or electron beam: = ==)

2232-9438-PF 28 200848899 Niobyl-4-oxosulfonate chloride, 1,2-benzoquinonediazide-5-sulfonic acid chloride, etc. Tris(2,5-dimethyl-4-hydroxyphenyl)-3-phenylpropane, 4,4,-[1 -[4-[1-[4-monophenyl]-1-methyl) A photooxygen generator such as an ester compound of a compound having a phenolic hydroxyl group such as phenyl]ethylidene] bisphenol. In addition to the other components conventionally used for the known inductive radiation resin composition, such a composition may contain, for example, colloidal ceria as the inorganic fine particles.

Further, 'as a solvent series, for example, a monoalkylene glycol solvent; a polyalkylene glycol solvent; a monoalkylene glycol alkyl ester solvent; a polyalkylene glycol alkyl ester solvent; a monoalkylene ethylene glycol Alcohol diester solvent; polyalkylene glycol diester solvent.

The above-mentioned inductive radiation resin composition is an example of a positive type, but it may be a negative type. Such a composition can be produced according to a conventional method: In addition, the inductive radiographic tree used in the method of the present invention, and the S1 composition of the product can be considered as an organic protective film. The thickness, the coating method, and the like are appropriately selected. However, it is preferable that the inductive radiation resin composition of 5 to 4% by weight is usually used in a filter having an aperture of ο·1 to 5" After the foreign matter or the like is removed, the coating is performed. The organic protective film is formed by using the above-described inductive radiation resin composition, and it is simple and easy to manufacture, and therefore it is suitable. Therefore, the organic film is the burial, the article +, the table organic partner. The so-called wet method constitutes an organic polymer with money and other exercises to be added.

2232-943 8-PF 29 200848899 A method in which a solvent is dissolved in a solvent to obtain a solution. As the method 2, the solvent is removed and the reaction is carried out. If the method of this method or the film is laminated on the entire surface of the array substrate, then the organic protective film is usually formed into Γ:: the coating method is applied to the inductive radiation resin composition on the 歹j soil plate. Thereafter, the method of heating and drying to remove the solvent is performed. The method for applying the composition of the inductive radiation linear resin to the array substrate is as follows: for example, a spray method, a spin coating method, a knife sharpening method, a rotary coating method, a bar coating method, a coating method, and a coating method. The drying temperature can be matched with the method of each component. Heat dry, 隹m... We can form the type of knife or the proportion of the fit and appropriate:,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, 5 to 90 minutes. The film deposition method described above is carried out by heating and drying to remove the solvent after the radiation-sensitive resin composition is applied to a substrate for forming a B-seat film such as a resin film or a metal film. The B pedestal film is followed by the method of laminating the B pedestal film on the array substrate. The heating and drying conditions can be appropriately selected in accordance with the type or the ratio of the respective components, and the heating temperature is usually 30 to 15 (rc The heating time is usually 5 to 90 minutes. The film lamination can be carried out using a press machine such as a pressure laminator, a press machine, a vacuum laminator, a vacuum press, or a press roll laminator. = on the surface of the amorphous crystalline film "on the surface, the formation of organic protection. This organic protective film is usually here, irradiating active radiation, forming a latent image pattern in «中' and then 'by contacting the developer Make Latent

2232-943 8-PF 30 200848899 The pattern is visualized and patterned. It is possible to easily form a hole pattern as a contact hole by using such a 4-station. The actinic radiation system is not particularly limited as long as it can activate the inductive radiation compound and change the alkali solubility of the inductive radiation resin composition, and examples thereof include ultraviolet rays of a single wavelength such as ultraviolet rays, g rays, or i rays, and KrF excimer thunder. Light rays, ArF excimer laser light, or the like, a particle line such as an electron beam, or the like is a method of selectively irradiating the active radiation to form a pattern to form a latent image pattern, for example, by reducing the projection exposure apparatus. The ultraviolet ray is irradiated through the mask pattern: § ray, 1 ray, KrF excimer laser light, ArF excimer laser, and a particle line by an electron beam or the like. After the irradiation of the active radiation, it is necessary to use 6〇~: extensively for the organic protection (4) mA, for the formation of the irradiation by the active radiation, and to develop the image like a pattern><Image 1: The alkaline solution of the alkaline person can be used as the developing solution. For the σ 氧化 氧化 氧化 尊 尊 尊 尊 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以The aqueous alkaline solution which is a water-repellent solution is a water-soluble organic solvent which can be (iv) a force of ethanol or the like. , and the surfactant of § 1 is suitable. The method of the latent image method is, for example, a method in which the film is contacted with the developer, and the temperature is usually a chopping method, a (four) method, a dipping method, or the like. Development In order to be in this two: shadow time system usually 3 . , seconds. The organic protective film of the wood is formed on the array substrate

2232-943 8-PF 200848899 The development residue on the substrate, the back surface of the substrate, and the end of the substrate is removed as required. Because Jf, i can rinse the array substrate with a rinse solution such as ultrapure water. j 匕 卜 , ^ ^ ^ - - , ί 由于 感应 感应 感应 感应 感应 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 感应 感应 感应 感应 感应 感应 感应 感应 感应 感应 感应 感应 感应 感应 感应 感应 感应 感应 感应 感应 感应 感应 感应 感应 感应 感应After the irradiation, the organic protective film is heated as a heating method, for example, in a heating plate or an oven to heat the array substrate. The heating temperature is usually 100 to 300. . . In the manufacturing method of the active matrix substrate of the present invention, (4), after the organic protective film is formed on the array substrate, the eucalyptus reaction is usually performed on the organic protective film. The method of performing the organic protective film formed on the array substrate to perform the appropriate method can be appropriately selected in accordance with the type of the crosslinking agent to be used. However, it is usually heated by heating. It can be carried out using, for example, a hot plate, an oven, or the like. The heating temperature is preferably 180 to 250 ° r 4 without a 250 C, and the heating time can be appropriately selected in accordance with the organic protection, the thickness of the large j, the use of a machine, and the like. For example, in the state where the heating plate is used, it is preferably 5 to 60 minutes in the state of using the oven, and preferably 30 to 90 minutes in the state of using the oven. The heating system of the broken phase can be used in the inert gas atmosphere of helium, argon, neon, xenon, krypton and xenon. After the hole in the organic (four) film forming material (4), on the organic film, for example by sputtering, ~1 by Indium Tin

Oxide ··Indium Tin Oxide 蚩 A A 风 风 风 A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A

2232-943 8-PF 32 200848899 At this time, an electrode pattern is formed by I 〇 ^ ^ ^ , Μ ώ ^ ^ constituting a halogen electrode. ..., after hunting, the active matrix substrate is obtained by forming an alignment film and performing the required process. The invention relates to a planar display device of the present invention, characterized in that it is composed of an active matrix substrate. The flat and sturdy slab of the present invention is composed of a plate of the moon, and therefore, it is a flat display device which is used for the use of the base and has a low life and low power consumption. The active matrix type liquid crystal display device is set as a specific example series (EL) display device, etc. One-line type organic electroluminescence type II =:: The two-type liquid crystal display device is made by liquid crystal material or film 2 = lived therebetween In the arrangement of the substrate, the substrate is formed by the active matrix substrate of the present invention, and the substrate is mounted on the active matrix substrate (hereinafter referred to as "opposing substrate". The series includes, for example, a color filter substrate, a microlens substrate, and the like. In addition, as a series of variations of the liquid crystal display device composed of the active matrix substrate and the color slab substrate, the color ray material layer is directly disposed on the aligning electrode of the active matrix substrate on the opposite substrate. A liquid crystal display device in which a color filter is provided, or a pixel electrode of an active matrix substrate formed by a conductive color light-emitting sheet material, and a color filter is not provided on the opposite substrate Liquid crystal display device, etc. In Fig. 2, a top view of a certain form of the active matrix type liquid crystal display device obtained by using the active matrix substrate of the present invention is shown.

2232-9438-PF 33 200848899 3, showing its X-Y profile. The active matrix substrate 1 〇 1 of the ^ 画 画 电极 202 202 202 202 202 202 202 202 202 202 202 202 202 202 202 202 202 202 202 202 202 202 202 202 202 202 202 202 202 202 202 202 202 202 202 202 202 Each halogen electrode 202

And the opposing portion of the counter electrode 206 is a pixel. On the periphery of the display region composed of halogen, a sealing material 1Q3 is provided, and an electrode pattern 1〇5 is present in a region between the display region and the sealing member 103. Further, on the color light-receiving substrate 102, a counter electrode 206 is provided on the color light-receiving sheet layer 2B having a black matrix 2, and an alignment film (1) is provided thereon. On the active motor vehicle substrate 101 on the substrate, the inter-pole signal line 2〇3 driving the gate signal as the switching element 01 and the source signal line supplying the source signal to tft2〇i are directly crossed (4) Line settings. In the vicinity of the intersection of the two signal lines, a TFT 2 (U is disposed thereon, and the halogen electrode 202 is disposed through the organic protective film 104 so that a portion thereof overlaps the two signal lines. Further, a contact hole in the organic film 104 ( Not shown), the pixel electrode of the pixel electrode 022 and the TFT 209 is connected. Further, the alignment film 111 is disposed on the organic protective film J 4 in the opposite direction. On the other hand, the gate signal line 203 and the source The pole signal line 204 is formed to extend beyond the frame area, and the signal voltage for driving the TFT 201 can be input to the gate signal line 203 through the input terminal 108 of the terminal area provided outside, and the source signal line 20 0 is input to the source signal line 20 4. Input the signal voltage of the display data. The electrode pattern 1 〇5 is formed on the peripheral region of the organic protective film 丨04, and is further extended to the terminal region, and the signal from the driving circuit is input. The above liquid crystal display device can be A conventional method, for example, is manufactured by the method described in Japanese Patent Laid-Open Publication No. 2000-00-52 No. 5 215. 2232-943 8-PF 34 200848899 (10) Active Matrix Organic EL 11 Display The organic matrix substrate formed on the active matrix substrate of the present invention is formed by arranging the matrix of the quaternary main body and the matrix of the matrix, and the main v1 TFTs are used for driving. At least two organic LL elements of the organic germanium element are particularly limited, and for example, a hole is formed between the electrode serving as the anode and the cathode is formed into the electrode to form a hole in the layer and emit light. The material layer is configured to be between the electric blade wheel and the electron injecting electrode to "m"), to form a structure of the luminescent material layer and the electron transporting layer at the end of the hole injection, or to implant the electrode in the hole. And fundraising

== The structure of the hole transport layer and the luminescent material layer and the electron transport layer (structure). Even in any state of construction, the organic EL element is driven by a so-called hole injected by an electro-injection electrode (anode) and by an electron injection electrode (cathode) layer and a hole (or electron). ^ The combination is further combined with the principle of the light-emitting material 丄 输 输 输 layer and the luminescent material layer to customize the light to start. Fig. 4 is a view showing an example of the structure of the organic unit of the present invention. The organic EL element shown in FIG. 4 is composed of an active matrix substrate [including a halogen electrode as a lower electrode layer (anode)] 301, a light-emitting material layer 302, and an upper electrode layer (the cathode is provided as an outermost layer of the package film 3G4. One of the & display devices = part of the structure ^ as ^ for the magical EL element element, need at least 2, that is, "electric: body = write transistor 'but ' in Figure 4 Construction example, omitting two electron crystals

body. These electromorphic systems are present in the active matrix substrate of the present invention. 2232-943 8-PF 35 200848899 In the active matrix substrate of this ι明, the pixel electrode ^ and the electrode as the anode are connected. In Fig. 5, there is shown an example of the active matrix substrate circuit of the present invention, in which the TFT 4〇2 is written by sequentially applying a force σ to the voltage of the scan electrode 401 connected to the horizontal drive circuit. The electric discharge body is turned on, and the charge amount from the display signal connected to the vertical drive electric data electrode 403 is stored in the capacitor 4〇4 to activate the TFT 405 by the amount of charge stored in the capacitor 404.

The electro-optical crystal) is in the right of the organic EL element, and supplies current to illuminate the organic anal = piece. The lighting state is maintained between the scanning electrodes 401 until the voltage is applied. The above organic EL display device can be produced by a method described in, for example, Japanese Laid-Open Patent Publication No. 2002-333846. [Embodiment] The present invention will be described in more detail below by way of examples, but the present invention is not limited by these examples. Production Example 1 (Production of cyclic anthraquinone-based polymer) 60 parts by weight of 8-carboxytetracyclic [4. 4 · 〇 · ρ, 5 Γ, 1 was used. ] 12-3 olefin, 4 〇 parts by weight of N-phenyl-(5-formaldehyde = quinone-bromoimine), 2.8 parts by weight of 1> 5-hexadiene, 〇〇 5 'weight (1,3-di-m-imidazolidine- 2~) human) 〖dihexylphosphine) benzylidene dichloride and 400 parts by weight of di-branched 7 _ Q Qiu g-alcohol ethyl The base scale was placed in a nitrogen-substituted pressure-resistant glass reactor, and polymerization was carried out for 2 hours under stirring to obtain a polymerization reaction solution containing a ring-opening metathesis polymer. The polymerization conversion ratio was 99.9% or more. Take people t

The weight average molecular weight of the ruthenium compound 1A 2232-9438-PF 36 200848899 is 3, _, and the number average molecular weight is U. Next, as a hydrogen-added catalyst, bis(tricyclohexyl phenyl) ene quinone dihydrate 〇. 1 part by weight, add L 丞 刀 knife to the main reaction solution, to 4Mp: coating force 'dissolved hydrogen for 5 hours' After the hydrogen addition reaction, 1 part by weight of the carbon powder was added to the high-pressure steel to be dropped, and at the same time, hydrogen was dissolved for 3 hours. Next, the solution was taken out and filtered by a fluororesin filter made of a pore-controlled 〇2", and the carbon was separated from the tongue to obtain a hydride containing the ring-opening metathesis polymer 1A. 476 parts by weight of a six-reaction solution. It can be carried out without delay.:: Force: The concentration of the solid component of the hydrogen addition reaction solution containing hydrogenation * 1B: 2 〇 · 6 weight, the yield of hydride 1B is 9 δ ι by weight. Hydride 1B The weight average molecular weight is 4, 43., the number average score is: 2,570, and the molecular weight distribution is h72. The hydrogenation rate is 99.9%. In addition, the weight of the polymer 1A and the hydride 1B s ^ the knife and the average molecular weight are As a solution, a gel gas permeation chromatograph (manufactured by TOSOH Co., Ltd., HLC_802) was used as a solution to obtain a molecular weight.氢化A hydrogenation obtained by concentration by a rotary gasifier. The nitrogen addition reaction of 1Β; the solution of the gluten solution is adjusted to the concentration of the solid component, and the hydride is 1% (the carboxyl group is obtained as the polar group). a solution of a cyclic olefin, ', a complex). After the concentration, the average molecular weight, the number average molecular weight, and the molecular weight distribution in the yield of the hydride, the weight of the hydride did not change. [Example 1] 2232-943 8-PF 37 200848899 1 part by weight of a sulfonated compound 1 solution (solid content concentration: 35 wt%) obtained in Production Example 1 As a crosslinking agent, 25 parts by weight of a polyfunctional epoxy compound having an alicyclic structure [manufactured by Mic Chemical Co., Ltd., EHPE31 50 (product name), molecular weight of about 2, 7 〇〇, epoxy group 15], as induction The radioactive compound - tris(2,5-dimethyl-4-hydroxyphenyl)-3-phenylpropane (1 mol) and 1,2 -naphthyldiazide-5-sulfonic acid chloride ( 25 parts by weight of a condensate of 2·5 moles, as a aging preventive agent (monopentamethyl-4piperidinyl/tridecyl)-" 5 parts by weight, 5 parts by weight of γ-glycidoxypropyltrimethoxydecane as a bonding aid, and an anthrone-based surfactant [Shin-Etsu Chemical Co., Ltd., ΚΡ341 (product name)] 〇.〇5 parts by weight, add 92 parts by weight of diethylene glycol ethyl methyl ether and Ν一 methyl one 2... The mixture is mixed and stirred. The mixture is made into a solution from within the 'knife 4'. The solution is filtered by a filter made of polytetrafluoroethylene with a pore size of 0·45 " m to modulate the induced radiation. Resin composition 1D. A glass substrate (CORNING 1 737, manufactured by CORNING Co., Ltd.) was used to form a film thickness of 200 nm in chromium using a sputtering apparatus, and patterned by light U core to form a gate. Electrode, gate signal line and gate terminal = Next, the gate electrode and the gate wiring are covered by a CVD device, and Lian Ling also forms a tantalum nitride film having a thickness of 45 nm and a thickness of 25 nm. The a_^ layer of the semiconductor layer and the thickness of μ(10) become the n+Si^ of the ohmic contact layer, for the n+Si layer and the layer

2232-9438-PF 38 200848899 Patterned to become an island. Further, on the gate insulating film and the n+Si layer, a film thickness of 2 nm is formed by a sputtering device, and a source electrode, a source signal line, and a drain electrode are formed by photolithography. And the data terminal portion, the unnecessary n + Si layer between the source electrode and the drain electrode is removed to form a rear channel (amorphous ruthenium film). Then, at 231 Å in an ozone water having a concentration of 1 〇 ppm, the substrate was placed on the array substrate for 3 minutes, and a ruthenium oxide layer having a thickness of 3 nm was formed on the surface of the channel portion after the TFT. Next, the array substrate was placed in a hydrazine alkylation treatment including a heating plate until hexamethyldioxane was introduced as a formazan alkylating agent at 5 Torr after degassing the treatment chamber. 〇 After uniformly diffusing helium gas of hexamethyldioxane to the treatment chamber, at 85. Thereafter, the array substrate was heated by heating the plate to carry out the oxime alkylation for a minute. Next, the surface of the amorphous ruthenium film containing I?? was replaced by nitrogen, and the surface of the amorphous ruthenium film containing I?? was cooled to room temperature, and the entire surface was subjected to methylation. An array substrate based on alkylation). The array substrate on which the oxime alkylation was applied to the surface was spin-coated with the inductive radiation resin composition 1D described later, and then pre-baked at 90 C for 2 minutes using a hot plate to form a film thickness of 2.5. #m的树脂膜. In the 'Hei resin film, through the mask of the hole pattern of 3510#nixl〇/zm, the light intensity of 365nm is 5mW/cm2 in the air of 4〇 second, and then the 〇·4 is used. After a development process of 90% by weight of a tetradecyl ammonium hydroxide aqueous solution at 25 ° C for 90 seconds, a residual film rate of 90% was obtained when a pattern of contact holes was formed by rinsing with ultra-pure water for 30 minutes. The above good pattern. Also, use the oven for 230 Ό

2232-943 8-PF 39 200848899 Preheated for 15 minutes (cross-linking treatment). By transferring the array substrate forming the organic protective crucible to the vacuum chamber, == mixed gas (volume ratio -4) is used as the gas, and the earth·Pa 'DC output is 400 W, and the mask is used to carry out the β money clock. And the shape of the deer; the non-crystalline transparent substrate of the IIQ system of conductive sound. The θ electrode ^ contacts the drain electrode, and the active matrix is placed between the source electrode and the drain electrode of the active matrix substrate, and a voltage of 2°V′ is applied to change the voltage applied to the gate electrode to become _2〇. ~ 3 』 0 Bu using a manual detector and a semiconductor parameter analyzer (Agilent company ^) and 'then /; IL moving between the source electrode and the drain electrode. The results are shown in Figure 6. The leakage current is lxl〇, 々m2, and the threshold voltage is 4V. The same measurement is performed after the active matrix substrate is placed in the atmosphere of the lion and 90 s. The leakage current is Μη/. 〆, the threshold voltage is 4V, and there is no change. [Example 2] In addition to the use of a uv ozone generating device [manufactured by Nippon Co., Ltd., m〇deli 44a (commercial ππ name)] to replace the oxidation due to contact with ozone water, in the air of about 20% by volume of oxygen in υ3 With an intensity of 5 W/(10) 2 , for the obtained array substrate, ultraviolet rays of 254 wavelengths were irradiated for 5 minutes, and on the surface of the rear channel portion, a stone oxide layer having a thickness of 3 nm was formed, and propylene was spin-coated on the array substrate. Resin solution [manufactured by JSR Corporation, 〇ptmer (trade name)), in place of the inductive radiation resin composition u,

2232-9438-PF 200848899 The rest are the same as the embodiment! The active matrix substrate was fabricated and evaluated. Immediately after the substrate was fabricated, the leakage current was 2xl{rUA/cm2, and the threshold was converted to 3V. In the atmosphere of the placement, the leakage current after 2 inches is selected as 1 γ 1 η_ 12 a / 2 Ke Electric * system 丄χΐϋ A / cm, the threshold voltage is 2 · 5V. [Example 3] In addition to using a plasma generating device [manufactured by Daiwa Scientific Co., Ltd., γΑρ51〇 (trade name)] to replace the oxidation caused by contact with ozone water, at a large pressure, the plasma output was 30 W/cm 2 , To produce a plasma containing 20% by volume of oxygen, maintaining the array substrate obtained therein for 3 minutes, forming a tantalum oxide layer having a thickness of 2 ηι on the surface of the rear channel portion, and coating the substrate on the array substrate. The active matrix substrate was produced and evaluated in the same manner as in the example except that the polyimide resin solution (manufactured by T〇RAY Co., Ltd., ph〇t〇neece (trade name)) was used instead of the inductive radiation resin composition ID. . Immediately after the substrate was fabricated, the leakage current was 5 xi 〇 13 A/cm 2 and the threshold voltage was 3 V. The leakage current after 2 〇〇 π in an atmosphere of 6 〇 π, 9 〇 % RH is 2x1 〇 -12 A/cm 2 , and the threshold voltage is 2 V. [Comparative Example 1] A process of performing oxidation and mercaptanization on the surface of the channel portion after the TFT formed on the array substrate and transferring to the inductively-radioactive resin composition 1 D on the array substrate The active matrix substrate was produced in the same manner as in Example 1 except that the evaluation was carried out. Immediately after the substrate was fabricated, the leakage current was 2 xi 〇 - MA / cm 2 and the threshold voltage was 2 V. The leakage current after 2 hours in an atmosphere of 6 (rc, 90% RH) is 5x10_8A/cm2, and the threshold voltage is 2V.

2232-943 8-PF 41 200848899 [Comparative Example 2] Except that there is no oxidization on the surface and the core: ( (4), the surface of the channel portion is coated with the smear, and the soil is transferred to the substrate. The process was evaluated in the same manner as in the example, in which the active matrix substrate was produced in the same manner as in Example 2, and the (10) job (product name)] & The vehicle base has a leakage current of 2χΐ〇_6Α/^2 immediately after the substrate is fabricated, and does not start up as an active matrix substrate. [Comparative Example 3] Except that the surface of the channel portion after the TFT formed on the array substrate was not oxidized and mercaptoalkylated and transferred to the substrate on the array substrate, the yttrium-imide resin solution was also applied. The active matrix substrate was produced in the same manner as in Example 3 except that the process of the method and the Photoneece (trade name) was carried out, and the evaluation was performed in the same manner as in the first embodiment. Immediately after the substrate was fabricated, the leakage current was 5x1 (T5A/cm2, and the active matrix substrate was not activated. The results of Examples 1 to 3 and Comparative Examples 1 to 3 are shown in Table 1. 2232-943 8- PF 42 200848899 [Table 1] Example 1 Example 2 Example 3 Comparative Example 1 Comparative Example 2 Comparative Example 3 Whether or not the surface of the rear channel portion is oxidized with or without oxidation and contact with ozone water — — — — UV irradiation in the air — 〇 — — — Exposure to plasma containing oxygen — 〇 — — — The surface of the rear channel is free of oxime alkylation. Trimethyl hydrazine alkylated fluorene — — organic protective film containing a polar group of cyclic olefin polymer crosslinked 〇 — — — — propylene resin — 〇 — — — — polyimine resin — 〇——— — Initial value leakage current (A/cm) lxl 0'13 2x10'13 5x10-13 2xl0-11 2x10-8 2x10-5 Good or bad (V) 4 3 3 2 — — Judging good good — — Leakage current (A/cm2) at 60 ° C, 90% RH, 200 hours 1x10-丨3 lxlO'12 2x10"12 5x10_8 — — Judging good cocoa — — Threshold voltage (V) 4 2.5 2 -2 a — Judging good and good — It is known from Table 1 that the surface of the channel portion is oxidized and enthalpy after forming the array substrate of the TFT on the glass substrate. An active matrix substrate of Example 1 in which an oxime alkylation is formed and an organic protective film which is a crosslinked product of a cyclic olefin polymer having a polar group, and an organic protective film are respectively made into an acrylic resin and a polyimide resin. The active matrix substrates of the second embodiment and the third embodiment have practically good performance even after being left for a long time in a high-temperature and high-humidity environment. On the other hand, it is known that the channel portion is not formed after the array substrate is formed. Surface 43

2232-943 8-PF 200848899 The active matrix substrate of Comparative Example 1 in which an organic protective film is formed by emulsifying and masquerading and forming a protective film by a parent conjugate of a cyclic olefin polymer having a polar group is compared with μ When the active matrix substrate of the example is applied, the performance is relatively poor. In addition, the retort is not subjected to the oxidation of the surface of the channel portion after the array substrate, and the leakage current of each active matrix substrate of the ruthenium examples 2 to 3 of the organic protective film formed by the acryl resin and the polyimide resin. Become bigger. Further, the active matrix substrate systems of Comparative Example 2 and Comparative Example 3 were not activated as the substrate. [Industrial Applicability] As a result of the active matrix substrate of the present invention, a good active matrix type planar device having a long life, a low power consumption, and a high contrast contrast is obtained. Further, according to the method of manufacturing the active matrix substrate of the present invention, the active matrix substrate having the efficiency can be easily operated. % [Simplified Schematic Description] FIGS. 1(a) and 1(b) are schematic views of the first aspect of the substrate of the present invention, and the portion including the TFT portion. Section view (below). 1 Figure 2 is a top view of the singularity of the t-type matrix liquid crystal display device using the active substrate of the present invention. Figure 3 is an active matrix type liquid-graph of Figure 2. X-Y profile of m display device

Fig. 4 is a view showing a typical configuration example of the organic one of the present invention. The organic a-element of the device is not shown. 2232-9438-PF 44 200848899 FIG. 5 is an explanatory diagram of an example of a circuit on the active matrix substrate of the present invention used in an active matrix organic EL display device. Fig. 6 is a graph showing the relationship between the voltage of the gate electrode of the active matrix substrate of Example 1 and Comparative Example 1 and the current between the source electrode and the drain electrode. Fig. 7 is an explanatory view showing an example of a circuit on a conventional active matrix substrate. [Main component symbol description] «~Amorphous enamel film; 1~substrate; 2~gate signal line; 3~source signal line; 4~thin film transistor (TFT); 5~gate electrode; 6~ Source electrode; 7~ ί and electrode; 8~ oxide film; 9~ organic protective film; 1〇~ contact hole; 11-^ halogen electrode; 12- one gate signal line; 13-^ source signal line 14- a thin film transistor (TFT); 15-^ gate electrode; 2232-9438-PF 45 200848899 16~ 17~ 18~101, 102, 103, 104, 105' 108, 110, 111, 201, 202 , 203, 204, 206, 207, 208, 301, 302, 303, 304, 401, 402' source electrode; drain electrode; halogen electrode; - active matrix substrate; '" color filter substrate; Sealing material; / organic protective film, / electrode pattern; ^ input terminal; - liquid crystal layer; - alignment film; ... thin film transistor (TFT); / halogen electrode; / gate signal line; > source signal line; / counter electrode; / color filter layer; / black matrix; / active matrix substrate; / luminescent material layer; / upper electrode layer (cathode); / encapsulation film; Scanning electrode; / Thin film transistor (TFT); 2232-9438-PF 46 200848899 4 0 3~ data electrode; 404~ capacitor; 405~ thin film transistor (TFT); 406~ organic EL element.

47

2232-943 8-PF

Claims (1)

200848899 X. Patent Application Scope 1. A kind of active matrix substrate, including a substrate and a crystal film formed on the mucous membrane of the non-crystalline dream film It is: =: The dream film is on the surface of the film, and it has a layer of ubiquitous layer, which is not a layer of organic film. 2. The thickness of the oxide layer is 5 (10) or less as in the patent application. The giant matrix substrate, wherein, Shi Xi 3 · as in the active matrix substrate of the patent application scope, i, the amorphous ruthenium film system is also subjected to methylation. The sheet, the active matrix base of any of items 1 to 3, and the organic protective film are films composed of a crosslinked substance having a polar group. The invention relates to an active matrix substrate as described in claim 1, which is characterized in that: (1) a thin and thin film electric day formed by oxidation on a substrate The surface of the amorphous non-crystalline enamel film A and the amorphous film of the m-emulsion layer on the surface of the amorphous film b (2) on the surface of the amorphous stone film β, by inductive radiation The process of forming an organic protective film by a resin composition. 6. The manufacturing method of the active matrix substrate according to item 5 of the patent application section, wherein 'by the contact with ozone water, the external line in the oxidizing gas atmosphere At least one of the groups selected by the group consisting of heating in an oxidizing gas atmosphere and exposure to a plasma containing oxygen 2223-943 8-PF 48 , 200848899 chemical gas The active matrix base according to any one of the seven items, wherein the inductively radiating linear resin composition comprises a cyclic olefin polymer having a polar group, a crosslinking agent, and an induction radiation. It consists of a compound and a solvent. A planar display device comprising the active matrix substrate according to any one of claims 1 to 4. 2232-9438-PF 49