TW200848487A - Cleaning sheet, transporting member having cleaning function and method for cleaning substrate treating apparatus - Google Patents
Cleaning sheet, transporting member having cleaning function and method for cleaning substrate treating apparatus Download PDFInfo
- Publication number
- TW200848487A TW200848487A TW097104308A TW97104308A TW200848487A TW 200848487 A TW200848487 A TW 200848487A TW 097104308 A TW097104308 A TW 097104308A TW 97104308 A TW97104308 A TW 97104308A TW 200848487 A TW200848487 A TW 200848487A
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- Taiwan
- Prior art keywords
- cleaning
- adhesive
- meth
- layer
- acrylate
- Prior art date
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- 238000004140 cleaning Methods 0.000 title claims abstract description 97
- 238000000034 method Methods 0.000 title claims abstract description 26
- 239000000758 substrate Substances 0.000 title claims description 52
- 239000010410 layer Substances 0.000 claims abstract description 46
- 239000012790 adhesive layer Substances 0.000 claims abstract description 35
- 238000012545 processing Methods 0.000 claims abstract description 22
- 239000000853 adhesive Substances 0.000 claims description 51
- 230000001070 adhesive effect Effects 0.000 claims description 51
- 239000002689 soil Substances 0.000 claims description 2
- 239000004575 stone Substances 0.000 claims description 2
- 150000003891 oxalate salts Chemical class 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 11
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 abstract description 3
- 239000000178 monomer Substances 0.000 description 40
- -1 polyethylene Polymers 0.000 description 40
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 35
- 150000001875 compounds Chemical class 0.000 description 28
- 229920000058 polyacrylate Polymers 0.000 description 22
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 19
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 18
- 239000000203 mixture Substances 0.000 description 18
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 13
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- 125000000524 functional group Chemical group 0.000 description 11
- 229920000642 polymer Polymers 0.000 description 11
- 239000000243 solution Substances 0.000 description 11
- 239000003431 cross linking reagent Substances 0.000 description 10
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 9
- 230000005855 radiation Effects 0.000 description 9
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 8
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 8
- 239000003522 acrylic cement Substances 0.000 description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 8
- 229920001187 thermosetting polymer Polymers 0.000 description 8
- 239000000052 vinegar Substances 0.000 description 8
- 235000021419 vinegar Nutrition 0.000 description 8
- 229920005601 base polymer Polymers 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 238000003860 storage Methods 0.000 description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Natural products CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 5
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- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 5
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 150000002148 esters Chemical class 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 229940059574 pentaerithrityl Drugs 0.000 description 5
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 5
- 229920001223 polyethylene glycol Polymers 0.000 description 5
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- 238000011282 treatment Methods 0.000 description 5
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- 239000002202 Polyethylene glycol Substances 0.000 description 4
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- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000010445 mica Substances 0.000 description 4
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- 238000002360 preparation method Methods 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
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- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 244000028419 Styrax benzoin Species 0.000 description 3
- 235000000126 Styrax benzoin Nutrition 0.000 description 3
- 235000008411 Sumatra benzointree Nutrition 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
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- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 235000019382 gum benzoic Nutrition 0.000 description 3
- 239000003999 initiator Substances 0.000 description 3
- 239000012948 isocyanate Substances 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 230000014759 maintenance of location Effects 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- 238000005510 radiation hardening Methods 0.000 description 3
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- 239000004065 semiconductor Substances 0.000 description 3
- VZXTWGWHSMCWGA-UHFFFAOYSA-N 1,3,5-triazine-2,4-diamine Chemical group NC1=NC=NC(N)=N1 VZXTWGWHSMCWGA-UHFFFAOYSA-N 0.000 description 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical group C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
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- 239000004743 Polypropylene Substances 0.000 description 2
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- 238000007792 addition Methods 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- WYTGDNHDOZPMIW-RCBQFDQVSA-N alstonine Natural products C1=CC2=C3C=CC=CC3=NC2=C2N1C[C@H]1[C@H](C)OC=C(C(=O)OC)[C@H]1C2 WYTGDNHDOZPMIW-RCBQFDQVSA-N 0.000 description 2
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- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
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- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 description 2
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- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 2
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- JWZZKOKVBUJMES-UHFFFAOYSA-N (+-)-Isoprenaline Chemical compound CC(C)NCC(O)C1=CC=C(O)C(O)=C1 JWZZKOKVBUJMES-UHFFFAOYSA-N 0.000 description 1
- PUNXVEAWLAVABA-UHFFFAOYSA-N 1,2,3,4-tetrahydroanthracene;1,2,5,6-tetrahydroanthracene Chemical compound C1=CC=C2C=C(CCCC3)C3=CC2=C1.C1=CCCC2=C1C=C1CCC=CC1=C2 PUNXVEAWLAVABA-UHFFFAOYSA-N 0.000 description 1
- JRDRTVGGZPRSDE-UHFFFAOYSA-N 1,2,5,5-tetramethylcyclohexa-1,3-diene Chemical group CC1=C(C)C=CC(C)(C)C1 JRDRTVGGZPRSDE-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
- B08B1/14—Wipes; Absorbent members, e.g. swabs or sponges
- B08B1/143—Wipes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0028—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by adhesive surfaces
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
- C09J11/04—Non-macromolecular additives inorganic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/38—Pressure-sensitive adhesives [PSA]
- C09J7/381—Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
- C09J7/385—Acrylic polymers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
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- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Cleaning In General (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
200848487 九、發明說明: 【發明所屬之技術領域】 本發明係關於一種清潔片。進而,本發明係關於一種使 用清潔片的具清潔功能之搬送部件,進而關於一種使用該 專之基板處理裝置之清潔方法。詳細而言,可用作半導 體、平板顯示器、印刷基板等製造裝置及檢查裝置等禁忌 ^ 異物之基板處理裝置的清潔片等。 【先前技術】 Ο 半導體、平板顯示器、印刷基板等製造裝置或檢查裝 置、各種基板處理裝置係使各搬送系與基板物理接觸而進 行搬送。此時,若於基板或搬送系上附著有異物,則後續 之基板亦相繼被污染,因此必須定期使裝置停止,進行用 以除去異物之清洗處理。因此,存在生產率降低或需要較 多的勞動力的問題。又,由於清洗時人的介入,亦存在產 生異物附著至其他部位之問題。 為解決該等問題,提出有藉由搬送固著有黏著狀物之基 ί 板而將附著於基板處理裝置内之異物清潔除去的方法(專 利文獻1)。 • 然而’於高溫環境下之基板處理裝置内使用清潔片之情 • 形時’有時存在清潔片自搬送之基板上剝離,搬送變困 難’且不能除去異物等問題。 專利文獻1:日本專利特開平ι〇-154686號公報 【發明内容】 發明所欲解決之問題 128847.doc 200848487 因此,本發明之目的在於:鑒於上述實情,提供一種於 基板處理裝置内,即使於高溫環境下,良好之搬送性以及 對附著於裝置内之異物的捕集性兩者均優異的清潔片進 而提供使用清潔片的具清潔功能之搬送部件、及使用該等 之基板處理裝置之清潔方法。 解決問題之技術手段 本發明者等人為達到上述目的,進行銳意研究之結果, 發現藉由使用下述清潔片,可達到上述㈣,從而完成本 發明。 即,本發明係一種清潔片,其特徵在於:其係於支撐基 材之單面具有清潔層,且於未設置清潔層之側的支撐基材 之單面具有黏著劑層的清潔片,且黏著劑層含有層狀矽酸 鹽。 車乂好的疋於上述清潔片中,黏著劑層相對於黏著劑100 重里份,含有1重量份以上之上述層狀矽酸鹽。 本發明中之具清潔功能之搬送部件較好的是上述清潔片 經由固定用黏著劑層而設置於搬送部件上。 本t明中之基板處理裝置之清潔方法較好的是將上述具 ’月潔功能之搬送部件搬送至基板處理裝置内。 發明之效果 —本發明之清潔片具有含有層狀矽酸鹽之黏著劑層。該黏 著J層藉由使用層狀矽酸鹽,可提高黏著劑層之凝集力, 保持對搬送部件之黏著力。X,即使於高溫加熱處理後, ,、1搬送邛件產生黏膠殘餘,可進行剝離,於此方面有 128847.doc 200848487 效。將具有該黏著劑層之清潔 件,搬送至基板處理穿置内功此之搬送部 攸蜒理裒置内呀使用之情 裝置内維持良好之搬详M j於基板處理 t良好之搬迗性,且可良好地 【實施方式】 1了考之異物。200848487 IX. Description of the invention: [Technical field to which the invention pertains] The present invention relates to a cleaning sheet. Further, the present invention relates to a conveying member having a cleaning function using a cleaning sheet, and further relates to a cleaning method using the substrate processing apparatus. Specifically, it can be used as a cleaning sheet for a substrate processing apparatus, such as a semiconductor device such as a semiconductor device, a flat panel display, or a printed circuit board, and the like. [Prior Art] A manufacturing apparatus such as a semiconductor, a flat panel display, or a printed circuit board, an inspection apparatus, and various substrate processing apparatuses are configured such that each of the transport systems is in physical contact with the substrate and transported. At this time, if foreign matter adheres to the substrate or the transport system, the subsequent substrates are successively contaminated. Therefore, it is necessary to periodically stop the apparatus and perform a cleaning process for removing foreign matter. Therefore, there is a problem that productivity is lowered or a labor force is required. Further, there is a problem that foreign matter adheres to other parts due to human intervention during washing. In order to solve such problems, there has been proposed a method of cleaning and removing foreign matter adhering to a substrate processing apparatus by transporting a substrate to which an adhesive is adhered (Patent Document 1). • However, when the cleaning sheet is used in the substrate processing apparatus in a high-temperature environment, the cleaning sheet may be peeled off from the substrate to be conveyed, and the conveyance may become difficult to remove, and the foreign matter may not be removed. Patent Document 1: Japanese Patent Application Laid-Open No. PCT No. 154686. SUMMARY OF THE INVENTION Problems to be Solved by the Invention 128847.doc 200848487 Therefore, an object of the present invention is to provide a substrate processing apparatus in view of the above-described circumstances, even in In a high-temperature environment, a cleaning sheet excellent in both good transportability and trapping property against foreign matter adhering to the apparatus further provides a cleaning member having a cleaning function using a cleaning sheet, and cleaning using a substrate processing apparatus using the same method. Means for Solving the Problems As a result of intensive studies, the inventors of the present invention have found that the above (4) can be achieved by using the following cleaning sheet, thereby completing the present invention. That is, the present invention is a cleaning sheet characterized in that it is a cleaning sheet having a cleaning layer on one side of a support substrate and an adhesive layer on one side of a support substrate on a side where the cleaning layer is not provided, and The adhesive layer contains a layered silicate. In the above cleaning sheet, the adhesive layer is aliquoted with respect to the adhesive 100, and contains 1 part by weight or more of the above layered silicate. In the conveying member having the cleaning function of the present invention, it is preferable that the cleaning sheet is provided on the conveying member via the fixing adhesive layer. In the cleaning method of the substrate processing apparatus of the present invention, it is preferable to transport the above-described transport member having the 'moon cleaning function' to the substrate processing apparatus. EFFECT OF THE INVENTION The cleaning sheet of the present invention has an adhesive layer containing a layered tantalate. By using the layered niobate, the adhesive layer J can increase the cohesive force of the adhesive layer and maintain the adhesion to the conveying member. X, even after the high-temperature heat treatment, 1, the transfer of the workpiece to produce adhesive residue, can be peeled off, in this regard, 128847.doc 200848487 effect. The cleaning member having the adhesive layer is transported to the substrate for processing and penetrating inside the processing unit, and the device is maintained in a good condition. And can be good [Implementation] 1 test the foreign body.
以下參照圖式說明本發明之清潔片。如圖!所示 明之清潔片於支撐基材〗之單 S 番、主吻尻λ 匁硐,糸層2。又,於未設 置β各層2之側的支撐基材〗之 J ^ 4. 卞W /、,固疋用黏著劑層 4。再者’亦可於清潔層2及 分離膜。 考Μ層4之表面設置 又,如圖2所示,本發明之具清潔功能之搬送部件,於 搬送部件5之單面具有固定用黏著制4,於未與搬送部件 連接之側的黏著劑層4之單面設置支樓基材卜進而於支撐 基材1上具有清潔層2。再者’亦可於清潔層2之表面 分離膜。 上述支撐基材1若為可成為清潔片之支撐基材者,則並 無特別限定’例如可列舉聚乙烯、聚丙烯等聚烯烴系樹 脂’聚對苯二甲St乙二S旨等聚酯系樹腊’乙醯基纖維素等 纖維素系樹脂,聚碳酸醋系樹脂、聚醯胺系樹脂、聚醯亞 胺系樹脂、聚碳二醯亞胺系樹脂、氣乙烯系樹脂等之塑膠 片等。 少 支撐基材之厚度通常較好的是10〜300 μη1左右。進而, 30〜200 μηι左右之支撐基材於操作方面較好。再者,清潔 層於光硬化性黏著劑之情形時,選擇使用可透過紫外線/等 光之塑膠片。又,作為基材,亦可視需要使用金屬箔。該 128847.doc 200848487 等基材亦可於其表面實施各種表面處理,例如亦可實施 鉻酉夂處理、臭氧曝露、火焰曝露、高壓電擊曝露、離子化 放射線處理等化學性或物理性處理,利用下塗劑(例如黏 著性物質)之塗層處理。 本發明中之清潔層2,若為具有黏著性者,則並不特別 阳疋/、材貝或構成等,可使用丙烯酸系、橡膠系、聚石夕氧 系等各種材料,其中較好的是丙烯酸系,特別好的是放射 線硬化性或熱硬化性之丙烯酸系黏著劑的硬化物。以下, 對放射線硬化性或熱硬化性之丙烯酸系黏著劑加以說明。 放射線硬化性或熱硬化性丙烯酸系黏著劑,可無特別限 制地使用具有碳-碳雙鍵等放射線硬化性或熱硬化性官能 基且顯不出黏著性者。作為該官能基,較好的是具有(甲 基)丙烯醯基者。所謂(甲基)丙烯醯基,表示丙烯醯基以及/ 或者曱基丙烯醯基。以下,(甲基)亦表示相同之含義。 作為放射線硬化性或熱硬化性之丙烯酸系黏著劑,例如 可例示於以丙烯酸系聚合物為基礎聚合物之感壓性丙烯酸 系黏著劑中,調配有放射線硬化性或熱硬化性單體成分或 券聚物成分作為聚合性不飽和化合物的添加型硬化性黏著 劑。 作為上述丙烯酸系聚合物,例如較好的態樣是使用丙婦 酸烷基酯及/或以丙烯酸烷基酯為主單體之丙烯酸系聚合 物’具體可列舉使用(甲基)丙烯酸烷基酯(例如甲酯、乙 酉旨、丙酯、異丙酯、丁酯、異丁酯、第二丁酯、第三丁 酯、戊酯、異戊酯、己酯、庚酯、辛酯、2-乙基己酯、異 128847.doc 200848487The cleaning sheet of the present invention will be described below with reference to the drawings. As shown in the figure! The cleaning sheet shown on the support substrate is a single S, a main kiss 尻 λ 匁硐, and a 糸 layer 2. Further, the support substrate of the side of each of the layers 2 is not provided with J ^ 4. 卞W /, and the adhesive layer 4 for fixing. Furthermore, it is also possible to clean the layer 2 and the separation membrane. Further, as shown in FIG. 2, the conveying member having the cleaning function of the present invention has a fixing adhesive 4 on one side of the conveying member 5, and an adhesive on the side not connected to the conveying member. The support substrate is provided on one side of the layer 4 and further has a cleaning layer 2 on the support substrate 1. Further, the film can also be separated on the surface of the cleaning layer 2. The support base material 1 is not particularly limited as long as it can be a support base material for a cleaning sheet. For example, a polyolefin resin such as polyethylene or polypropylene, a polyester such as polyethylene terephthalate A cellulose-based resin such as a lyophilized cellulose, a polycarbonate resin, a polyamide resin, a polyimide resin, a polycarbodiimide resin, or a vinyl resin. Film and so on. The thickness of the less-supporting substrate is usually preferably about 10 to 300 μη. Further, the support substrate of about 30 to 200 μm is preferable in terms of handling. Further, when the cleaning layer is used in the case of a photocurable adhesive, a plastic sheet which is permeable to ultraviolet light or the like is used. Further, as the substrate, a metal foil may be used as needed. The substrate such as 128847.doc 200848487 can also be subjected to various surface treatments on the surface thereof, for example, chrome tanning treatment, ozone exposure, flame exposure, high voltage electric shock exposure, ionizing radiation treatment, etc. Coating treatment of a lower coating agent (for example, an adhesive substance). In the cleaning layer 2 of the present invention, if it is adhesive, it is not particularly impotence, material, or composition, and various materials such as acrylic, rubber, and polyoxo can be used. It is an acrylic type, and it is especially preferable that it is hardening of the radiation hardening or thermosetting acrylic adhesive. Hereinafter, a radiation curable or thermosetting acrylic adhesive will be described. The radiation curable or thermosetting acrylic adhesive can be used without any particular limitation, such as a radiation curable or thermosetting functional group having a carbon-carbon double bond and exhibiting no adhesiveness. As the functional group, those having a (meth)acryl fluorenyl group are preferred. The (meth) acrylonitrile group means an acryl fluorenyl group and/or a decyl acryl fluorenyl group. Hereinafter, (methyl) also means the same meaning. The radiation-curable or thermosetting acrylic-based pressure-sensitive adhesive may be, for example, a pressure-sensitive acrylic pressure-sensitive adhesive based on an acrylic polymer as a base polymer, or a radiation curable or thermosetting monomer component or The valence polymer component is an additive type curable adhesive which is a polymerizable unsaturated compound. As the acrylic polymer, for example, an acrylic acid-based alkyl ester and/or an acrylic polymer having an alkyl acrylate as a main monomer is preferably used. Specifically, an alkyl (meth)acrylate is used. Esters (eg methyl ester, ethyl acetate, propyl ester, isopropyl ester, butyl ester, isobutyl ester, second butyl ester, tert-butyl ester, amyl ester, isoamyl ester, hexyl ester, heptyl ester, octyl ester, 2 -ethylhexyl ester, iso 128847.doc 200848487
基酯、十二燒基酯等 18之直鏈狀或分支鏈 技分之丙烯酸系聚合Acrylic polymerization of 18 linear or branched chains of a group of esters, dodecyl esters, etc.
等含羧基單體;馬來酸酐、伊康酸酐等酸酐單體;(甲基) 丙烯酸2-經乙S旨、(甲基)丙烯酸2,丙_、(甲基)丙稀酸心 羥丁酯、(甲基)丙烯酸6-羥己酯、(甲基)丙烯基8_羥辛酯、 (甲基)丙烯酸10-羥癸酯、(甲基)丙烯酸12_羥基十二烷基 酯、(甲基)丙烯酸(4-羥甲基環己基)甲酯等含羥基單體; 苯乙烯磺酸、丙稀磺酸、2·(甲基)丙烯醯胺_2_甲基丙磺 酸、(甲基)丙烯醯胺丙磺酸、(甲基)丙烯酸磺丙基酯、(甲 基)丙烯醯氧基萘磺酸等含磺酸基單體;2_羥乙基丙烯醯基 磷酸酯等含磷酸基單體;(甲基)丙烯酸縮水甘油醋、(甲 基)丙烯醯胺、(甲基)丙烯酸N-羥甲基醯胺、(甲基)丙稀酸 烷基胺基烷基酯(例如甲基丙烯酸二甲胺基乙_、甲基丙 烯酸第三丁胺基乙酯等)、N-乙烯吼咯烧_、丙烯酿基嗎 琳、乙酸乙稀S旨、丙酸乙:fcipg旨、苯乙稀、丙稀猜;(甲基) 丙烯酸環烷基酯(例如環戊酯、環己酯等)等。該等可共聚 合之單體成分,可使用1種或2種以上。上述可共聚合之單 128847.doc 200848487 下,更好 體的使用*,較好的是總單體成分之70重量%以 的40重量%以下。And other carboxyl group-containing monomers; anhydride monomers such as maleic anhydride and itaconic anhydride; (meth)acrylic acid 2- to ethyl acetate, (meth)acrylic acid 2, propyl _, (meth) acrylic acid hydroxybutyrate Ester, 6-hydroxyhexyl (meth)acrylate, (meth)propenyl 8-hydroxyoctyl ester, 10-hydroxydecyl (meth)acrylate, 12-hydroxydodecyl (meth)acrylate, a hydroxyl group-containing monomer such as (meth)acrylic acid (4-hydroxymethylcyclohexyl)methyl ester; styrenesulfonic acid, acrylic acid sulfonic acid, 2·(meth)acrylamide amine-2-methylpropanesulfonic acid, a sulfonic acid group-containing monomer such as (meth)acrylonitrile-propanesulfonic acid, sulfopropyl (meth)acrylate or (meth)acryloxynaphthalenesulfonic acid; 2-hydroxyethylpropenylphosphonate And other phosphate-containing monomers; glycidyl methacrylate, (meth) acrylamide, N-hydroxymethyl decyl (meth) acrylate, alkyl amino alkyl (meth) acrylate Ester (such as dimethylaminoethyl methacrylate, butyl butyl methacrylate, etc.), N-vinyl fluorene _, propylene, ketone, ethyl acetate, propionic acid B: Fcipg, benzene Dilute, propylene guess; (meth) Cycloalkyl acrylate (such as cyclopentyl ester, cyclohexyl ester, etc.) and the like. These monomer components which can be copolymerized may be used alone or in combination of two or more. In the above-mentioned copolymerizable single unit 128847.doc 200848487, it is preferred to use *, preferably 40% by weight or less based on 70% by weight of the total monomer component.
性單體之使用f,自黏著特性等方面考慮,較好的是總單 體成分之70重量%以下,更好的是3〇重量%以下。 入:二上述丙烯酸系聚合物為了進行交聯,亦可視需要 =:^性單體等作為共聚合料體成分。作為該多官 -性早體,例如可列舉:己二醇二(甲基)丙婦酸醋、(聚) 乙- K甲基)丙婦酸醋、(聚)丙二醇二(甲基)丙稀酸醋、 :戊:醇_(甲基)丙烯酸酯、季戊四醇二(甲基)丙烯酸 酯、三羥甲基丙烷三(曱基)丙烯酸酯、季戊四醇三(甲基) 丙烯酉夂酉曰、一季戊四醇六(曱基)丙烯酸酯、環氧(甲基)丙 烯酸酉旨、聚醋(甲基)丙稀酸酯、胺基甲酸乙醋(甲基)丙烯 酸醋等。該等多官能性單體可使用i種或2種以上。多官能The use of the monomer is f, and it is preferably 70% by weight or less, more preferably 3% by weight or less, based on the total adhesion of the monomer component. In addition, in order to carry out crosslinking, the above-mentioned acrylic polymer may be a copolymerized monomer component as needed. Examples of the poly-adjuvant-precipitate include hexanediol di(methyl)propyl acetoacetate, (poly)ethyl-K methyl propyl acetoacetate, and (poly) propylene glycol di(methyl) propyl acrylate. Dilute vinegar, pentane: alcohol _ (meth) acrylate, pentaerythritol di (meth) acrylate, trimethylolpropane tri(mercapto) acrylate, pentaerythritol tri(methyl) propylene hydride, Pentaerythritol hexa(indenyl) acrylate, epoxy (meth) acrylate, polyester (meth) acrylate, urethane (meth) acrylate, and the like. These polyfunctional monomers may be used alone or in combination of two or more. Multifunctional
上述丙烯酸系聚合物可藉由使單一單體或2種以上之單 體混合物聚合而獲得。聚合可以溶液聚合、乳化聚合、塊 狀聚合、懸浮聚合等任意方式進行。丙烯酸系聚合物之重 量平均分子量(Mw)較好的是50萬〜15〇萬,更好的是8〇萬 〜120萬。又,重量平均分子量(Mw)與數量平均分子量 (Μη)之分散度(Mw/Mn)較好的是6〜1〇。 重置平均分子量係以GPC法藉由標準聚苯乙烯而換算之 値。使用Tosoh公司製造之HLC-8120GPC作為GPC本體, 管柱溫度為40 C、泵流Ϊ為0.5 ml/min、使用债測器ri之 數據處理係使用預先已知分子量之標準聚苯乙烯之檢量線 (分子量為500〜2060萬之檢量),藉由換算分子量求出分子 128847.doc 200848487 量。 使用管柱:^ rSKSel GMH-H(S)x2 根(Tosoh公司製造) 流動相··四氫呋喃 注入量:100 μ1 樣本濃度:i.0g/1(四氫吱。南溶液) 2放度算出為重量平均分子量與數量平均分子量之比。 數量平均分子量之敎,以與重量平均分子量之測定相同 之方法實施。 月/糸層2中可使用聚合性不飽和化合物,該聚合性 不飽和化合物係可藉由放射線或熱等活性能量源硬化,且 於刀子内具有1個以上不飽和雙鍵之化合物。較好的是使 用作為具有2個以上不飽和雙鍵之化合物的聚合性不飽和 化口物。該成分,適以控制接著力以使於搬送時清潔層與 被清潔部位不較強地接著,且可藉由添加該等而使系狀 黏度降低。 作為上述聚合性不飽和化合物,較好的是非揮發性且重 量平均分子量為10000以下之低分子量體,特別好的是具 有5000以下之分子量以使於硬化時之清潔層的三維網狀化 效率變好。作為如此之聚合性不飽和化合物之具體例,例 如可列舉:苯氧基聚乙二醇(甲基)丙烯酸酯、ε_己内酯(甲 基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、聚丙二醇二 (甲基)丙烯酸酯、1,4-丁二醇二(甲基)丙烯酸酯、四乙二醇 二(甲基)丙烯酸酯、1,6-己二醇(Τ基)丙烯酸酯、三羥甲基 丙烷三(f基)丙烯酸酯、四羥甲基甲烷四(甲基)丙烯酸 128847.doc 12 200848487 =季戊四醇三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯 酸醋、二季戊四醇單經基五(甲基)丙稀酸醋、二季戊四醇 六(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯等(甲基)丙 T與多7L醇之醋化物;胺基甲酸乙@旨(甲基)丙烯酸酿、 裱乳(甲基)丙烯酸酯、寡酯(甲基)丙烯酸酯等可使用該 荨中之1種或2種以上。 上述聚合性不飽和化合物(單體成分、寡聚物成分)之調 配量,相對於丙烯酸系聚合物1〇〇重量份,較好的是3〜1⑽ 重置份,更好的是5〜80重量份,更好的是10〜70重量份, 更好的是10〜60重量份。 又,作為放射線硬化性或熱硬化性丙烯酸系黏著劑,除 上述說明之添加型之外,亦可列舉使用於聚合物支鏈或主 鏈中或者主鏈末端具有碳-碳雙鍵者作為基礎聚合物的内 在型硬化性黏著劑。内在型硬化性黏著劑無須含有作為低 分子成分之寡聚物成分等,或者未大量含有,因此並不經 日守f生產生养聚物成分等於黏著劑中移動之現象,可形成移 定之層結構的黏著劑層。 上述具有碳-碳雙鍵之基礎聚合物,可無特別限制地使 用具有碳-碳雙鍵,且具有黏著性者。作為如此之基礎聚 合物,較好的是以丙烯酸系聚合物為基本骨架者。作為丙 稀酸系聚合物之基本骨架,可列舉上述例示之丙烯酸系聚 合物。 將碳-碳雙鍵導入至上述丙烯酸系聚合物的導入法並無 特別限制。可採用各種方法,碳-碳雙鍵導入至聚合物支 128847.doc -13 - 200848487 鏈中於分子設計上容易。例如可列舉如下之方法:預先使 具有官能基之單體共聚合於丙烯酸系聚合物上之後,使具 有可與該官能基反應之官能基以及碳碳雙鍵之化合物維 持碳·碳雙鍵之放射線硬化性而縮合或加成。 作為該等官能基之組合之例,可列舉叛酸基與環氧基、 竣酸基與氮丙°定基、經基與異氰酸醋基等。該等官能基之 組合中,自反應追蹤之容易性考岸,敕人 ^ 1 ^ 权口適的疋經基與異 乱酸酯基之組合。又,若為藉由 稽田g此基之組合生成上 述具有碳-碳雙鍵之丙稀酸系聚合物之組合,則官能基位 於丙烯酸系聚合物與上述化合物之任一側均可,上述之較 好組合中,較合適的是丙烯酸系聚合物具有羥基,且上^ 化合物具有異氰酸酯基之情形 山 丨月仏於此情形時,作為具有 碳-碳雙鍵之異氰酸酯化合物, 田斤 奶例如可列舉甲基丙烯醯基 異氰酸酯、2_甲基丙烯醯氧基乙美 C暴異虱酸酯、間異丙烯基_ α,α-二甲基苄基異氰酸酯等。又 作為丙稀酸系聚合物, ϋ 可使用將上述例示之含羥基單體 ^ ?工乙基乙炸驗、經 丁基乙烯醚、二乙二醇單乙嫌化 早己席㈣化合物等共聚合者。 上述内在型硬化性黏著劑可星 可d j早獨使用具有上述碳_碳雙 鍵之基礎聚合物(丙烯酸系聚合物 初)亦可於不使特性惡化 之程度内调配上述硬化性單體成八 刀或暴聚物成分。於内在 型硬化性黏著劑之情形時,較好 于的疋含有40重量%以上之 上述具有碳-碳雙鍵之基礎聚合物, 、 更好的是含有50重量% 以上之上述具有碳-碳雙鍵之基礎聚合物。 於上述硬化性丙烯酸系黏著 ⑷中可根據硬化方式含有 128847.doc -14- 200848487 起始劑。於藉由紫外線等使上述硬化性黏著劑硬化之情形 時,含有光聚合引發劑。作為光聚合引發劑,例如可列 舉:4-(2-羥基乙氧基)苯基(2_羥基_2_丙基)酮、心羥基_ , 甲基本乙_、2 -甲基-2-經基苯丙酮、1-經基環己基 苯基酮等醇系化合物;甲氧基苯乙酮、2,2_二甲氧基_ …w ’卞、。,▲_ T签_卜L4_(甲硫 〇The above acrylic polymer can be obtained by polymerizing a single monomer or a mixture of two or more kinds of monomers. The polymerization can be carried out in any manner such as solution polymerization, emulsion polymerization, bulk polymerization, suspension polymerization or the like. The weight average molecular weight (Mw) of the acrylic polymer is preferably from 500,000 to 150,000, more preferably from 80,000 to 1,200,000. Further, the degree of dispersion (Mw/Mn) of the weight average molecular weight (Mw) and the number average molecular weight (?η) is preferably 6 to 1 Torr. The reset average molecular weight is converted by standard GPC by the GPC method. Using the HLC-8120GPC manufactured by Tosoh as the GPC body, the column temperature is 40 C, the pump flow is 0.5 ml/min, and the data processing system using the debt detector ri uses the standard polystyrene of the known molecular weight. The line (having a molecular weight of 500 to 20.6 million) was obtained by converting the molecular weight to obtain the amount of the molecule 128847.doc 200848487. Use the column: ^ rSKSel GMH-H(S)x2 root (manufactured by Tosoh) Mobile phase ·· Tetrahydrofuran injection amount: 100 μ1 Sample concentration: i.0g/1 (tetrahydroanthracene. South solution) 2 The degree of relaxation is calculated as The ratio of the weight average molecular weight to the number average molecular weight. The enthalpy of the number average molecular weight is carried out in the same manner as the measurement of the weight average molecular weight. A polymerizable unsaturated compound which can be cured by an active energy source such as radiation or heat and which has one or more unsaturated double bonds in the knives can be used in the month/tantal layer 2. It is preferred to use a polymerizable unsaturated ester which is a compound having two or more unsaturated double bonds. This component is adapted to control the adhesion so that the cleaning layer and the portion to be cleaned are not strongly adhered to during the conveyance, and the coefficient of the system can be lowered by adding these. The polymerizable unsaturated compound is preferably a low molecular weight body which is nonvolatile and has a weight average molecular weight of 10,000 or less, and particularly preferably has a molecular weight of 5,000 or less so that the three-dimensional networking efficiency of the cleaned layer upon hardening is changed. it is good. Specific examples of such a polymerizable unsaturated compound include phenoxy polyethylene glycol (meth) acrylate, ε_caprolactone (meth) acrylate, and polyethylene glycol bis (methyl). Acrylate, polypropylene glycol di(meth)acrylate, 1,4-butanediol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, 1,6-hexanediol (Τ) Acrylate, trimethylolpropane tris(f) acrylate, tetramethylol methane tetra(meth)acrylic acid 128847.doc 12 200848487 = pentaerythritol tri(meth)acrylate, pentaerythritol tetra(methyl) Acrylic vinegar, dipentaerythritol monoperylpenta(methyl) acrylate vinegar, dipentaerythritol hexa(meth) acrylate, neopentyl glycol di(meth) acrylate, etc. (methyl) propyl T and 7 L of alcohol One or two or more kinds of the above-mentioned hydrazines can be used as the acetate, the methic acid, the (meth) acryl, the bismuth (meth) acrylate, the oligo (meth) acrylate, and the like. The amount of the polymerizable unsaturated compound (monomer component, oligomer component) is preferably from 3 to 1 (10) by weight, more preferably from 5 to 80, based on 1 part by weight of the acrylic polymer. The parts by weight are more preferably 10 to 70 parts by weight, more preferably 10 to 60 parts by weight. Further, as the radiation curable or thermosetting acrylic adhesive, in addition to the above-described additive type, a base of a polymer or a main chain or a carbon-carbon double bond at the end of a main chain may be used as a basis. An intrinsic type of hardenable adhesive for polymers. The intrinsic type curable adhesive does not need to contain an oligomer component as a low molecular component, or is not contained in a large amount, and therefore does not cause a phenomenon in which the polymer component is equal to the movement in the adhesive, and a layer structure can be formed. Adhesive layer. The above-mentioned base polymer having a carbon-carbon double bond can be used without any particular limitation, and has a carbon-carbon double bond and has adhesiveness. As such a base polymer, an acrylic polymer is preferred as a basic skeleton. The basic skeleton of the acrylic polymer is exemplified by the above-exemplified acrylic polymer. The introduction method of introducing the carbon-carbon double bond to the above acrylic polymer is not particularly limited. Various methods can be employed to introduce a carbon-carbon double bond into the polymer branch 128847.doc -13 - 200848487 in the chain for molecular design. For example, a method in which a monomer having a functional group is copolymerized on an acrylic polymer and a compound having a functional group reactive with the functional group and a carbon-carbon double bond is maintained in a carbon-carbon double bond is exemplified. Radiation hardening and condensation or addition. Examples of the combination of the functional groups include an acid group, an epoxy group, a decanoic acid group, a nitrogen-based group, a thiol group, and an isocyanate group. Among the combinations of these functional groups, the easiness of self-reaction tracking is tested, and the combination of 疋 ^ ^ 1 ^ 权 适 疋 与 与 与 与 。 。 。 。 。 。. Further, in the case where a combination of the above-described acrylic acid-based polymer having a carbon-carbon double bond is produced by the combination of the genus and the base, the functional group may be located on either side of the acrylic polymer and the above compound. In a preferred combination, it is preferred that the acrylic polymer has a hydroxyl group and the upper compound has an isocyanate group. In this case, as an isocyanate compound having a carbon-carbon double bond, Examples thereof include methacryl oxime isocyanate, 2-methyl propylene oxy methoxyacetate, isopropyl isodecanoate, m-isopropenyl _ α, α-dimethyl benzyl isocyanate. Further, as the acrylic acid polymer, ϋ, the above-exemplified hydroxyl group-containing monomer ethyl bromide test, butyl vinyl ether, diethylene glycol monoethyl bromide, and the compound (four) compound can be used. Aggregator. The above-mentioned intrinsic type hardening adhesive can be used in the same manner as the base polymer (acrylic polymer) having the above carbon-carbon double bond, and the above hardenable monomer can be blended to the extent that the properties are not deteriorated. Knife or fuss composition. In the case of an intrinsic type hardenable adhesive, it is preferred that the cerium contains 40% by weight or more of the above base polymer having a carbon-carbon double bond, and more preferably 50% by weight or more of the above carbon-carbon. The base polymer of double bonds. In the above-mentioned curable acrylic adhesive (4), a starter can be contained according to the hardening method of 128847.doc -14-200848487. When the curable adhesive is cured by ultraviolet rays or the like, a photopolymerization initiator is contained. Examples of the photopolymerization initiator include 4-(2-hydroxyethoxy)phenyl (2-hydroxy-2-propyl) ketone, cardinyl hydroxyl group, methyl group B-, 2-methyl-2- An alcoholic compound such as phenylacetone or 1-cyclohexyl phenyl ketone; methoxyacetophenone, 2,2-dimethoxy _w'卞. ,▲_T Sign_Bu L4_(Methylsulfide
基)-本基]-2-嗎啉基丙烷_丨等苯乙酮系化合物;安息香乙 鱗、安息香異丙趟、大茴香偶姻甲轉等安息香醚二 物;苯偶酿二甲基縮酮等縮㈣化合物;2_蔡確釀氣等芳 ==系化合物;1-苯叫丙二叫_乙_^ m合物;二苯甲_、苯甲酿基苯甲酸、 ,-甲基-4·甲乳基二苯甲_等二笨甲酮系化合 頓酮、2_甲基料酮一甲基㈣_ :異 =嘲酮、2,4_二氣㈣酮、2,4_二乙基㈣阔、… 異丙基嗟噸酮等噻噸李 , 膦氧化〜膦酸醋:二=;鹵化醯基 於構成黏㈣之㈣料之職量,相對 7:為—量份 劑之種類,例二:::r加外部交聯劑。作為交聯 聚合物,可與其官能基反庫π竣基或經基之丙稀酸系 舉添〜甲燒二異二;=則如可列 鼠酸酯、環氧化合物、 一 ”氰酸酯等之聚異 疋化合物、三聚氰胺系交聯 128847.doc 200848487 劑、脲樹脂、無水化合物、聚胺、含羧基聚合物、各種金 屬鹽、螯合化合物等所謂交聯劑,使其反應之方法。 該等交聯劑(多官能性化合物)之使用量並無特別之限 制,例如相對於上述丙烯酸系聚合物100重量份,較好的 是以20重量份以下調配,更好的是以卜1〇重量份調二該 等交聯劑可使用1種或2種以上。 上述黏著劑中,除上述成分以外,亦可視須要使用先前Acetophenone-based compounds such as 2-phenyl-phenyl-propanyl-propanone; benzoin, benzoin, abirate, fennel, and other benzoin ethers; benzoic dimethyl condensate Ketones and other compounds (4); 2_Caiqi brewing gas and other aromatic == compounds; 1-benzene is called propylene, _B_^ m compound; benzophenone, benzoylbenzoic acid, , -methyl -4·Methyllacyl benzophenone _ et al., bismuth ketone ketone, 2-methyl ketone monomethyl (tetra) _: iso = geronic ketone, 2, 4 dioxin (tetra) ketone, 2, 4 _ Ethyl (tetra) broad, ... isopropyl tyanate and other thioxanthene, phosphine oxide ~ phosphonic acid vinegar: two =; bismuth halide based on the composition of the (4) material of the sticky (four), relative 7: for the type of the amount of the agent , Example 2:::r plus external crosslinker. As a cross-linked polymer, it can be added with a functional group of anti-accumulating thiol or a trans-acidic acrylic acid; = such as a decanoic acid ester, an epoxy compound, or a "cyanate ester" A method of reacting a polyisoprene compound, a melamine-based cross-linking agent, a urea resin, an anhydrous compound, a polyamine, a carboxyl group-containing polymer, various metal salts, a chelate compound, and the like. The amount of the crosslinking agent (polyfunctional compound) to be used is not particularly limited. For example, it is preferably 20 parts by weight or less based on 100 parts by weight of the acrylic polymer, more preferably The amount of the crosslinking agent may be one or two or more kinds of the crosslinking agents. In addition to the above components, the above-mentioned adhesive may be used as needed.
公知之各種增黏劑、抗老化劑、填充劑、著色劑、鏈轉移 劑、塑化劑等添加劑。 上述黏著劑之製備中使用之溶劑並無特別之限制,通常 使用有機溶劑。作為有機溶劑,可均勻溶解黏著劑组合物 者於製膜時之塗膜穩定性方面良好。作為有機溶劑,例如 :列舉:丁烧、己烧、庚院、甲苯、鄰二甲苯、間二甲 對二甲苯、環己烷、甲醇、乙醇、異丙醇、卜戊醇、 環己醇、2·甲基環己醇、二乙醚、異丙醚、二丁醚、二苯 甲醚、四氫呋喃、丙酮、丁酮、甲基異丁基酮、2_庚酮(甲 基戊基酮)、二異丁基酮、環己酮、甲基環己酮、環戊 剩、乙酸戊醋、乙酸甲醋、乙酸乙醋、乙酸丙醋、乙酸丁 醋、N,N-二甲基甲醯胺(DMF)、n,n_二甲基乙醯胺 (咖岭N_甲基吡咯烷酮、2-甲氧基乙_、2_乙氧基乙 知:2·丁氧基乙醇等。作為上述有機溶劑,較好的是乙酸 :酉曰、甲本、=甲苯等。藉由溶劑,黏著劑組合物通常可 ,備為固體成分濃度為5〜50重量%、較好的是5〜3〇重量 /〇、更好的是1〇〜25重量%之溶液。 128847.doc -16- 200848487 定藉:么述勘著劑形成之清潔層2之厚度,並無特別限 、爷為5〜10〇 μιη左右,較好的是2〇〜6〇 左右。若未 5 _ ’則存在清潔層之黏著劑之形狀追隨性降低, 捕集性降低之+主你 2 士 ^ ^ 、與厂 低之丨月形。另一方,若超過Η)〇 μιη,則存在變得 過厚而難以操作之情形。 Γ Ο 清潔層之形成方法’可將丙烯酸系黏著劑塗佈於支撐基 上,形成黏著劑組合物層。作為該形成方法,可採用各 方法。例如’於黏著劑組合物層之形成中使用連續塗佈 、置之情形時,例如可列舉:連續供給黏著劑組合物(溶 广错由安裝於裝置前端之模具等噴出裝置連續地於薄 土材上擠出為薄層的方法。又,作為形成黏著劑組合物 曰方法於才木用批次方式之情形時,可列舉:於支揮基 材上’將黏著劑組合物(溶液)流延於基材上,以敷料器、 〜棒、刀片塗佈機成形的方法。ϋ此,將薄層化之黏 者劑組合物積層於支撐基材上後,進行加熱,除去溶劑。 /作為上述黏著劑,於放射線硬化性或熱硬化性之丙稀酸 =黏著劑之情形時,將黏著劑塗佈於載體上,加以乾燥 後,進行放射線硬化或熱硬化。 、子支撐基材上製膜之黏著劑組合物層進行放射線照射或 加熱時,為使丙稀酸系黏著劑硬化、抑散聯之氧阻害、 平坦面更加平滑化,黏荖漸丨入 者d、、且〇物層之表面於覆蓋保護膜 之狀態下實施硬化處理。藉此,可抑止㈣㈣黏著劑硬 化時之氧阻害所造成之硬化度、交聯度之降低。 作為保護膜,並無特別限定,例如可列舉聚乙烯、聚丙 128847.doc 17- 200848487 烯、聚對苯二曱酸乙一 一 s曰、乙醯基纖維素、聚碳酸酯、 醢胺、聚碳二醯凸松榮 Λ 觚亞胺#之塑膠薄膜等。 述保屢膜之厚度較好的是通常為10〜100 μιη。於清潔 層之形成中使用放射線硬化性黏著劑之情形時,選擇使用 "透“、外線等光之透明性比較高的塑膠膜。作為保護 膜亦可對面對該黏著劑之表面實施各種剝離處理,亦可 直接使用為通常使用之剝離薄膜。Various additives such as tackifiers, anti-aging agents, fillers, colorants, chain transfer agents, plasticizers, and the like are known. The solvent used in the preparation of the above adhesive is not particularly limited, and an organic solvent is usually used. As the organic solvent, the adhesive composition can be uniformly dissolved, and the film stability at the time of film formation is good. Examples of the organic solvent include: butadiene, hexane, gengyuan, toluene, o-xylene, m-dimethyl-p-xylene, cyclohexane, methanol, ethanol, isopropanol, pentanol, cyclohexanol, 2. methylcyclohexanol, diethyl ether, diisopropyl ether, dibutyl ether, diphenyl ether, tetrahydrofuran, acetone, methyl ethyl ketone, methyl isobutyl ketone, 2 - heptanone (methyl amyl ketone), Diisobutyl ketone, cyclohexanone, methylcyclohexanone, cyclopentane, pentyl acetate, methyl acetate, ethyl acetate, propylene acetate, butyl acetate, N,N-dimethylformamide (DMF), n, n-dimethylacetamide (Kalamine N-methylpyrrolidone, 2-methoxyethyl _, 2 ethoxy ethoxylate: 2 · butoxyethanol, etc. as the above organic The solvent is preferably acetic acid: hydrazine, formazan, = toluene, etc. By the solvent, the adhesive composition is usually prepared to have a solid concentration of 5 to 50% by weight, preferably 5 to 3 Torr. / 〇, more preferably a solution of 1 〇 25% by weight. 128847.doc -16- 200848487 The borrowing: The thickness of the cleaning layer 2 formed by the sizing agent is not particularly limited, the lord is 5 to 10 〇 Ιιη left Preferably, it is about 2 〇 to 6 。. If it is not 5 _ ', the shape followability of the cleaning layer is reduced, and the trapping property is reduced by + 2 士 ^ ^, and the factory is low. On the other hand, if it exceeds Η)〇μιη, it may become too thick to be handled. Γ 形成 Method of forming a cleaning layer The acrylic adhesive can be applied to a support to form an adhesive composition layer. As the formation method, each method can be employed. For example, when continuous coating or setting is used for the formation of the adhesive composition layer, for example, the adhesive composition is continuously supplied (the dissolution device is continuously applied to the thin soil material by a discharge device such as a mold attached to the front end of the device). A method of extruding into a thin layer. Further, as a method of forming an adhesive composition, in the case of a batch method, it is exemplified that: the adhesive composition (solution) is cast on a support substrate. The substrate is formed by an applicator, a rod, or a blade coater. Thereafter, the thinned adhesive composition is laminated on a support substrate, and then heated to remove the solvent. In the case of radiation curable or thermosetting acrylic acid=adhesive, the adhesive is applied to a carrier, dried, and then subjected to radiation hardening or thermal hardening. When the agent composition layer is irradiated with radiation or heated, the acrylic acid-based adhesive is hardened, the oxygen barrier is prevented, and the flat surface is smoothed, and the adhesive layer is gradually dipped, and the surface of the coating layer is Coverage insurance In the state of the film, the hardening treatment is carried out, whereby the curing degree and the degree of crosslinking caused by the oxygen resistance during the curing of the adhesive can be suppressed (4). The protective film is not particularly limited, and examples thereof include polyethylene and polypropylene 128847. .doc 17- 200848487 Polyene, polyethylene terephthalate, acetonitrile, polycarbonate, decylamine, polycarbodiimide, ruthenium, yttrium, etc. The thickness of the protective film is preferably from 10 to 100 μm. When a radiation curable adhesive is used in the formation of the cleaning layer, a plastic film having a relatively high transparency such as "through" or "external" is selected. As the protective film, various peeling treatments may be applied to the surface facing the adhesive, and it may be used as a peeling film which is generally used.
作為保4膜’較好的是使用具有中^線平均粗縫度㈣ 為0.01〜0.3 μπ^表面者,更好的是〇〇2〜〇28 _。具有上 述中心線平均粗糙度(Ra)之表面覆蓋成為上述黏著劑組合 物層之表面側。藉由使用該保護膜,上述中心線平均粗糙 度(Ra)之表面轉印至清潔層之表面,可將中心線平均粗糙 度(Ra)控制為nw _,藉此可兼顧搬送性及異物之捕 集丨生。右上述中心線平均粗糙度(Ra)未達〇〇1 ,則於搬 送丨生方面欠佳。又,若上述中心線平均粗糙度(Ra)超過Ο·] μηι,則於異物捕集性之方面欠佳。 上述α 層較好的是其拉伸彈性模數為〇 98 MPa〜4〇〇 MPa。若拉伸彈性模數超過4〇〇 Mpa,則存在如下之情 ^ β ’糸層表面之接著力低,即使於該清潔層表面形成凹 4亦不此表現出異物捕集功能之方面。又,於未達〇·98 MPa之情形時,存在如下之可能:即使於清潔層表面形成 凹部’於搬送性評價之情形時,表面結構變形而與搬送裝 置内部接著。拉伸彈性模數較好的是1〇 MPa〜3〇〇 Mpa, 更好的是10 MPa〜200 MPa。該等拉伸彈性模數可根據上 128847.doc -18- 200848487 述丙稀酸系黏著劑之組成,例如丙稀酸系聚合物與聚人性 ::和化合物(單體成分、募聚物成分)之調配量等而:宜 設定0 Ο c 又’將上述清潔層使用為清潔片之情形時,於妙晶圓之 鏡面面以寬度10 mm進行貼附,於室溫(23。〇下以拉伸速 度3〇〇 _/分鐘測定的對m9G。剝離接著力較好的是 N/U) mm,更好的是on 〇 _ _。上述= 著力若未達0.05 N/10 mm,則變得不能除去異物,若超過 1.5N/l〇mm,則變得與搬送裝置内部接著。 本發明之固定用黏著劑層4,若為具有黏著性者,則並 不特別限定其材質或構成等’可使用通常制之黏著劑, 例如丙烯酸系或橡膠系等黏著劑,較好的是丙稀酸系黏著 劑。作為固定用黏著劑層,亦可使用雙面膠。上述黏著劑 層’可將清潔片貼附於各種基板或其他膠帶•薄板等搬送 部件上,作為具清潔功能之搬送部件搬送至裝置内,使其 與被清洗部位接觸而進行清潔。 作為上述丙烯酸系勒莫添丨 于、縣者Μ,可使用丙烯酸系聚合物,該 丙婦酸系聚合物係由以賦予黏著力之低玻璃轉移溫度(Tg) 的㈣酸系單體為主單體,賦予黏著力或凝集力之高Tg的 以^體& 3有用於改良交聯性或接著性之官能基的單體 即單乙烯性不飽和單體等而形成。 作為上述主單體,例如可列舉使用(甲基)丙稀酸甲酿、 (甲基)丙稀酸乙醋、(甲基)丙稀酸丁酿、(甲基)丙稀酸異戊 @曰(甲基)丙稀醆正己醋、(甲基)丙烤酸2-乙基己醋、(甲 128847.doc -19- 200848487 基)丙稀酸異辛酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸癸 酯、(曱基)丙烯酸十二烷基酯等烷基之碳數為卜^的丨種 或2種以上為單體成分之丙烯酸系聚合物等。 作為上述共單體,例如可列舉乙酸乙稀酿、丙酸乙稀 酯、乙烯醚、|乙烯、丙烯腈、甲基丙烯腈等含乙烯基化 合物。 作為上述含官能基單體,例如可列舉:丙烯酸、曱基丙 烯酸、伊康酸、馬來酸、富馬酸、巴豆酸等含羧基單體; (甲基)丙烯酸2-羥乙酯、(甲基)丙烯酸2_羥丙酯、(甲基)丙 烯酸4-羥丁酯、N-羥甲基丙烯醯胺、丙烯醇等含羥基單 體;(甲基)丙稀酸二曱胺基乙醋、(甲基)丙稀酸二乙胺基 乙酯、(曱基)丙烯酸二甲胺基丙酯等含三級胺基單體;丙 烯醯胺、曱基丙烯醯胺等含醯胺基單體;N_甲基(甲基)丙 烯醯胺、N-乙基(甲基)丙烯醯胺、N_甲氧基甲二(甲丙 烯醯胺、N_乙氧基甲基(甲基)丙烯醯胺、沭第三丁基(甲 基)丙烯醯胺、N-辛基(甲基)丙烯醯胺等含N_取代醯胺基單 體;曱基丙烯酸縮水甘油酯等含環氧基單體等。該等可共 聚合之單體成分,可使用丨種或2種以上。該等可共聚合2 單體之使用量,較好的是總單體成分之7〇重量%以下,更 好的是40重量%以下。 上述丙烯酸系黏著劑中可適宜含有交聯劑。例如可列 舉:異氰酸酯系交聯劑、環氧交聯劑、氮丙啶系交聯劑、 螯合糸交聯劑等。 交聯劑之使用量並無特別之限制,例如相對於上述丙烯 128847.doc •20- 200848487 酸系聚合物100重量份,較好的是01〜15重量份,更好的 是1〜10重量份。 作為層狀矽酸鹽 辞蒙脫石、矽鎂石 白雲母、纖蛇紋石 狄克石、珍珠陶土 並無特別之限定,例如可列舉皂石、 水輝石、珍珠雲母、滑石、金雲母、 綠泥石、蛭石、高嶺石、綠脆雲母、 葉蠟石、蒙脫石、鋁膨潤石、鐵膨潤 石、四石夕氟雲母、鈉帶雲母、葉蛇紋石、多水高嶺土等。 Ο 上述層狀矽酸鹽可為天然物或合成物之任意者使用該等 之1種或同時使用2種以上均無任何問題。 上述層狀矽酸鹽之平均長度較好的是0〇i〜i〇〇 ,更 好的是0.05〜Η) μΐη,縱橫比較好的是2〇〜5〇〇,更好 50〜200。 < 上述層狀矽酸鹽之使用量並無特別之限定,可適宜決定 使用夏,以肖應黏合體獲得财熱性及脫模⑧果。相對於上 述丙烯酸系聚合物1〇〇重量份,較好的是含有丨重量严以上 之物酸鹽’更好的是10重量份以上,更好的是;0〜40 重篁份。若未達1重量份,則難以表現出耐敎性。再者 雖然較好的是未達_重量份,但並無特別之限I亦可 添加1〇〇重量份以上。根據上述範圍之使用量可實現兼 顧耐熱性之表現與脫模效果⑽離力),因 ^ 量係較理想之態樣。 …正使用 上述黏著劑之製備中使用之溶劑並無特別之限制 使用有機溶劑,可使用形成上述清潔層之黏著劑 使用之溶劑。X’上述黏著劑層之形成方法可使用通常使 128847.doc 21 200848487 用之公知之方法。 上述點著劑層之厚度並無特別限定,通常為H)〜4〇 _乂 右,較好的是15〜30_左右。若未達1〇_,則存在未: 定而剝落之情形。另一方面,若超過4〇_ 過厚而難以操作之情形。 子在欠侍 車乂好的疋本發明中之黏著劑層4於貼合於搬送部件(例如 玻璃基板)上之狀態下,相對於搬送部件為⑽。、拉伸速 度為咖/^撕⑺小時之加熱後黏著力為^ 寬〇 mm以上。於此情形時,本發明中之清潔片即使於 基板處理裝置内之宾、、w s立 # 直内之同兄下,亦可維持不自基板上剝離 之黏著力,可確保搬送性及優異之異物捕集性。 述·^著^層4 ’較好的是其儲藏彈性模數為〇 他,更好的是G.5〜2 MPa。若儲藏彈性模數超過10 他’則存在於貼合時不能貼合之情形。X,若未達ο」 MPa之h形¥ ’則存在於高溫時自基板上剝落之情形。 上述黏著劑層4’較好的是其剪切保持力為Η。 好的疋5〜1 〇 N。甚前士 τι /里杜山h 右d切保持力超過20 Ν ’則貼合於 時,於作業性上產生問題。又, 极上 .^ 一 畸又右未達1Ν之情形時,則 存在於尚溫時自基板上剝落之情形。 一作為貼附本發明之清潔片之搬送部件5,並無特別限 ^ ^如可列舉·帛導體晶圓、lcd、卿等平板顯示器 :反、其他光碟、磁電阻頭等之基板等。又,搬送部件 ^以對象裝置搬送之基板自身外,亦可列舉模仿該等之 虛设板、玻璃板、鋁板等。 128847.doc -22- 200848487 具清潔功能之搬送部件,較好的使上述清潔片之形狀較 搬达部件之形狀小,且不會自搬送部件端部露出 較搬送部件之形狀大之情料,存在於搬送裝置内;= 板附著於裝置上’掛於搬送系統上,裝置不能正常運轉之 情形。 (1 如上述之具清潔功能之搬送部件之製造方法,並益特別 限定,例如可於基板等搬送部件上貼合清潔片而製造清潔 用搬送部件。於此情形時,可列舉:貼附較搬送部件大之 清潔片後,沿部件形狀切斷清潔片之方加下稱為直接 切割方式)’或者將預先進行有切斷加卫處理為搬送部件 形狀之清潔用標藏片貼合於搬送部件上而製造清潔用搬送 部件之方式(以下稱為預先切割方式)。 實施例 以下 根據實施例對本發明加 定於該等。再者 量平均分子量, 以說明’但本發明並不限 ϋ 合物之分子量之分散度。 <實施例1 > 以下中之”份”表示重量份。Mw表示重 Μη^數量平均分子量,Mw/Mn表示聚 (清潔層用黏著劑溶液之製備) 清為層用黏著劑溶液可遊_ 士、, 可W /合/夜了精由以下之方法製備。首先,製 備由包含丙烯酸2·乙基己_份、丙烯酸甲㈣份、及丙 烯S夂1 0伤之單體混合液所得之基礎聚合物即丙烯系聚合物 (Mw、、勺83萬〜89萬’ Mw/Mn : 7〜9),相對於該丙烯酸系 聚a物1 〇〇伤添加作為聚合性不飽和化合物之聚乙二醇 128847.doc -23- 200848487 細二曱基丙烯酸脂(新中村化學公司製造,商品名:nk Ε⑽4G) 35份、作為交聯劑之聚異氰酸_化合物(日本聚 胺醋工業股份有限公司製造,商品名:COR〇NET L) 3份 以及聚環氧化合物(三菱瓦斯化學公司製造,商品名: Tetrad C) 2份,進*添加光聚合引發劑(Irgac_ 651 :汽 巴精化公司製造)3份,進而使用乙酸乙s旨均勻混合而製備 至》辰度為23重量%。 (固定用黏著劑層用黏著劑溶液之製備) 固疋用黏著劑層用黏著劑溶液可藉由以下之方法製備。 首先,製備由包含丙烯酸正丁酯1〇〇份、丙烯酸5份、及作 為層狀石夕酸鹽之蒙脫石(Kunimine工業公司製造,商品 名· Kumpia G,平均長度:〇」μηι) 1〇份之單體混合液所 付之基礎聚合物即丙浠酸系聚合物(Mw :約q萬〜2〇〇 萬’ Mw/Mn : 50〜70),相對於該丙烯酸系聚合物1〇〇份, 添加作為聚合性不飽和化合物之聚乙二醇2〇〇二曱基丙烯 酸脂(新中村化學公司製造,商品名:NK Ester 4G) 35 伤、+環氧化合物(三菱瓦斯化學公司製造,商品名: Tetrad C) 1份,進而使用乙酸乙酯均勻混合而製備至濃度 為20重量%。 (清潔層之形成) 於寬200 mm、厚75 μπι之支撐基材用聚酯系薄膜之單面 塗佈上述清潔層用黏著劑溶液並使其乾燥,以使乾燥後之 厚度成為35 μπι,於其表面貼合具有中心線平均粗糙度為 〇·1 μηι之表面粗糙度的厚38 μιη之聚烯烴系剝離膜作為保 128847.doc •24- 200848487 護膜。繼而,以1000 mW之累計光量照射中心波長為 365 nm之紫外線使其硬化,形成清潔層。 (清潔片之製作) 於設置上述清潔層之支樓基材的另—單面塗佈上述固定 用黏著劑層用黏著劑溶液並使其乾燥,以使乾燥後之厚度 成為10 μΓΠ,設置固定用黏著劑層,於其表面貼合厚25 _ 之聚烯煙系分離膜。進而,將固定用黏著劑層以5(TC加熱 2 j ^進行老化。藉此,獲得本發明之清潔片。 、 <比較例1 > 於實施例1中製備之固定用黏著劑層用黏著劑溶液中, 不添加層狀矽酸鹽而直接使用,除此以外,以與實施例i 相同之方式進行,製作清潔片。 十實施例以及比較例中獲得之清潔層及固定用黏著劑層 進行下述評價。將結果示於表1。 (拉伸彈性模數) 將清潔層用黏著劑溶液塗佈於寬200 mm、厚50 μη1之經 ’ 聚矽氧脫模處理之PET膜上,進行乾燥、紫外線硬化之 後,自PET臈上剝離,以試料寬1〇、夾盤距離ιι〇 mm、拉伸速度5〇 mm/min進行拉伸試驗,根據測定時之應 力算出拉伸彈性模數。測定以JISK7127為基準。 (匆切保持力) 於被黏合體上貼附包含25 mmx25 mm之支撐基材與固定 用+黏著劑層之膠帶,使用手動輥進行壓接,並使被黏合體 垂直下垂。於上述被黏合體之下端部,以依據JIS Z0237之 128847.doc -25- 200848487 方法’於1 5〇°C之環境下施加荷重9.8 N,測定1小時後之膠 帶偏移(與切保持力,單位:mm)。 (黏著力) 於將包含支揮基材與固定用黏著劑層之寬20 mm之膠帶 貼合於搬送部件(例如、玻璃基板)上之狀態下,測定以300 mm/mm之拉伸速度測定之相對於搬送部件為180。、 15〇°CXl小時之加熱後的黏著力(N/20 mm)。 (儲藏彈性模數)As the film 4, it is preferable to use a film having an average coarse slit degree (four) of 0.01 to 0.3 μπ^, more preferably 〇〇2 to 〇28 _. The surface having the above-mentioned center line average roughness (Ra) covers the surface side of the above-mentioned adhesive composition layer. By using the protective film, the surface of the center line average roughness (Ra) is transferred to the surface of the cleaning layer, and the center line average roughness (Ra) can be controlled to nw _, thereby achieving both transportability and foreign matter. Capture twins. If the average center line roughness (Ra) of the above center line is less than 〇〇1, it is not good for transporting the twins. Moreover, when the center line average roughness (Ra) exceeds Ο·] μηι, it is not preferable in terms of foreign matter collection property. The above α layer preferably has a tensile elastic modulus of 〇 98 MPa to 4 〇〇 MPa. If the tensile modulus of elasticity exceeds 4 〇〇 Mpa, there is a case where the adhesion of the surface of the 糸 layer is low, and even if the concave portion 4 is formed on the surface of the cleaning layer, the aspect of the foreign matter trapping function is not exhibited. Further, when the temperature is less than 98 MPa, there is a possibility that even when the concave portion is formed on the surface of the cleaning layer, the surface structure is deformed and the inside of the conveying device is followed. The tensile modulus of elasticity is preferably from 1 MPa to 3 Å Mpa, more preferably from 10 MPa to 200 MPa. The tensile modulus of elasticity can be determined according to the composition of the acrylic acid adhesive of 128847.doc -18-200848487, for example, acrylic polymer and polytropic:: and compound (monomer component, polymer component) ) The amount of the mixture should be set to 0 Ο c and 'When the above cleaning layer is used as a cleaning sheet, attach it to the mirror surface of the wonderful wafer at a width of 10 mm at room temperature (23. The tensile speed is 3 〇〇 / / minutes measured for m9G. The peeling force is preferably N / U) mm, more preferably on 〇 _ _. If the force is less than 0.05 N/10 mm, the foreign matter cannot be removed. If it exceeds 1.5 N/l 〇 mm, it will follow the inside of the transfer device. In the adhesive layer 4 for fixing of the present invention, if it is adhesive, the material or the constitution thereof is not particularly limited, and an adhesive such as an acrylic or rubber-based adhesive can be used. Acrylic adhesive. As the fixing adhesive layer, a double-sided tape can also be used. The above-mentioned adhesive layer ' can be attached to a transport member such as various substrates or other tapes and sheets, and can be transported as a transport member having a cleaning function to the device to be cleaned by coming into contact with the portion to be cleaned. An acrylic polymer which is mainly composed of a (four) acid monomer having a low glass transition temperature (Tg) for imparting adhesion can be used as the acrylic-based Lemo-added product. The monomer, which is a monomer having a high Tg imparting an adhesive force or a cohesive force, is formed by a monomer having a functional group for improving crosslinkability or adhesion, that is, a monoethylenically unsaturated monomer. Examples of the main monomer include (meth)acrylic acid, (meth)acrylic acid, (meth)acrylic acid, and (methyl)acrylic acid.曰(Methyl) propylene hexamethylene vinegar, (ethyl) propylene succinic acid 2-ethylhexyl vinegar, (A 128847.doc -19- 200848487 base) isooctyl acrylate, isophthalic acid (meth) acrylate An alkyl group having an alkyl group such as an ester, an oxime (meth)acrylate or a dodecyl (mercapto)acrylate, or an acrylic polymer having two or more monomer components. Examples of the above-mentioned co-monomer include vinyl-containing compounds such as ethyl acetate, ethyl propionate, vinyl ether, ethylene, acrylonitrile, and methacrylonitrile. Examples of the functional group-containing monomer include carboxyl group-containing monomers such as acrylic acid, mercaptoacrylic acid, itaconic acid, maleic acid, fumaric acid, and crotonic acid; 2-hydroxyethyl (meth)acrylate; Hydroxy-containing monomer such as 2-hydroxypropyl acrylate, 4-hydroxybutyl (meth) acrylate, N-methylol acrylamide, propylene alcohol, etc.; (meth) acrylate diammonium a tertiary amino group-containing monomer such as vinegar, diethylaminoethyl (meth)acrylate or dimethylaminopropyl (meth) acrylate; a guanamine group such as acrylamide or decyl acrylamide Monomer; N-methyl (meth) acrylamide, N-ethyl (meth) acrylamide, N-methoxymethane (methacrylamide, N-ethoxymethyl (methyl) An N-substituted guanamine-based monomer such as acrylamide, hydrazine tert-butyl (meth) acrylamide, N-octyl (meth) acrylamide or the like; an epoxy group such as glycidyl methacrylate A monomer or the like. These monomer components which can be copolymerized may be used in combination of two or more kinds. The amount of these monomers which can be copolymerized is preferably 7% by weight or less based on the total monomer component. , 40% by weight or less. The acrylic adhesive may suitably contain a crosslinking agent, and examples thereof include an isocyanate crosslinking agent, an epoxy crosslinking agent, an aziridine crosslinking agent, and a chelate crosslinking. The amount of the crosslinking agent to be used is not particularly limited. For example, it is preferably from 01 to 15 parts by weight, more preferably from 1 to 15 parts by weight, based on 100 parts by weight of the above-mentioned propylene 128847.doc • 20 to 200848487 acid polymer. ~10 parts by weight. The layered bismuth sulphate, the sillimanite, the serpentine, the pearlite, and the pearlite are not particularly limited, and examples thereof include saponite, hectorite, pearl mica, and talc. , phlogopite, chlorite, vermiculite, kaolinite, green crispy mica, pyrophyllite, montmorillonite, aluminum bentonite, iron bentonite, four stone fluorite mica, sodium band mica, leaf serpentine, water Kaolin, etc. Ο The above-mentioned layered citrate may be used in any of natural or synthetic materials, or may be used in combination of two or more kinds. The average length of the above-mentioned layered citrate is preferably 0〇i~i〇〇, more preferably 0.05~Η) μΐη, The aspect ratio is preferably 2〇~5〇〇, preferably 50~200. < The amount of the above-mentioned layered citrate is not particularly limited, and it can be appropriately determined to use the summer, and to obtain the heat and the mold release by the conjugate. The amount of the acid salt of the above-mentioned acrylic polymer is preferably more than 10 parts by weight, more preferably 0 to 40 parts by weight, based on 1 part by weight of the above acrylic polymer. If it is less than 1 part by weight, it is difficult to exhibit stagnation resistance. Further, although it is preferably less than _ by weight, there is no particular limitation, and it is also possible to add 1 part by weight or more. According to the usage amount of the above range, both the heat resistance performance and the mold release effect (10) disengagement force can be achieved, and the amount of the system is ideal. The solvent to be used in the preparation of the above-mentioned adhesive is not particularly limited. The organic solvent may be used, and the solvent used for the adhesive for forming the above cleaning layer may be used. The method of forming the above-mentioned adhesive layer of X' can be carried out by a known method generally used in 128847.doc 21 200848487. The thickness of the above-mentioned dot agent layer is not particularly limited, and is usually H) to 4 〇 _ 乂 right, preferably about 15 to 30 Å. If it is less than 1〇, there is a case where it is not: and it is peeled off. On the other hand, if it exceeds 4 〇 _ too thick, it is difficult to operate. In the state in which the adhesive layer 4 of the present invention is bonded to a conveying member (for example, a glass substrate), it is (10) with respect to the conveying member. The stretching speed is 805 mm or more after the heating of the coffee/^ tearing (7) hours. In this case, the cleaning sheet of the present invention can maintain the adhesion without peeling off from the substrate even in the case of the guest in the substrate processing apparatus, and the brothers in the same position, and can ensure the conveyability and the excellent performance. Foreign matter trapping. Preferably, the layer 4' is preferably a storage elastic modulus of 〇, more preferably G. 5 to 2 MPa. If the storage elastic modulus exceeds 10, then there is a case where it cannot be attached at the time of bonding. X, if it does not reach ο" MPa h shape ¥ ', there is a case where it peels off from the substrate at a high temperature. The above adhesive layer 4' preferably has a shear holding force of Η. Good 疋 5~1 〇 N. When the former τι / Ridushan h right d-cut retention force exceeds 20 Ν ‘, it will cause problems in workability. In addition, when there is a case where the distortion and the right side are less than 1 ,, there is a case where it peels off from the substrate at a temperature. The conveying member 5 to which the cleaning sheet of the present invention is attached is not particularly limited as long as it is a flat panel display such as a conductor wafer, lcd or qing, or the like, a substrate such as another optical disk or a magnetoresistive head. Further, the transporting member ^ may be a dummy board, a glass plate, an aluminum plate or the like that mimics the substrate itself that is transported by the target device. 128847.doc -22- 200848487 The conveying member with the cleaning function preferably makes the shape of the cleaning sheet smaller than the shape of the moving member, and does not expose the end portion of the conveying member to be larger than the shape of the conveying member. It exists in the conveying device; = the plate is attached to the device and is hung on the conveying system, and the device cannot operate normally. (1) The manufacturing method of the conveying member having the cleaning function is particularly limited, and for example, a cleaning sheet can be bonded to a conveying member such as a substrate to produce a cleaning conveying member. In this case, a comparison is made. After the cleaning member is transported, the cleaning sheet is cut along the shape of the member, and the cleaning sheet is cut, and the cleaning sheet is cut in the shape of the conveying member. A method of manufacturing a cleaning conveying member on the member (hereinafter referred to as a pre-cut method). EXAMPLES Hereinafter, the present invention will be added to these and the like according to the examples. Further, the average molecular weight is measured to illustrate 'but the present invention is not limited to the degree of dispersion of the molecular weight of the conjugate. <Example 1 > The "parts" in the following represent parts by weight. Mw represents the number average molecular weight of Μ ^, Mw / Mn means poly (preparation of the adhesive solution for the cleaning layer). The layer is prepared by using an adhesive solution, which can be prepared by the following method. . First, a propylene-based polymer (Mw, spoon 830,000 to 89) obtained from a monomer mixture containing 2, ethylhexyl acrylate, methyl (tetra) acrylate, and propylene S 夂 1 0 was prepared. Wan' Mw/Mn: 7 to 9), polyethylene glycol as a polymerizable unsaturated compound was added to the acrylic polyaphthalide 1 128847.doc -23- 200848487 fine dimercapto acrylate (new Manufactured by Nakamura Chemical Co., Ltd., trade name: nk Ε(10)4G) 35 parts, polyisocyanate as a crosslinking agent _ compound (manufactured by Japan Polyamine Vinegar Industry Co., Ltd., trade name: COR〇NET L) 3 parts and polyepoxy 2 parts of a compound (manufactured by Mitsubishi Gas Chemical Co., Ltd., trade name: Tetrad C), 3 additions of a photopolymerization initiator (Irgac_ 651: manufactured by Ciba Specialty Chemicals Co., Ltd.), and further prepared by uniformly mixing with acetic acid The brightness is 23% by weight. (Preparation of Adhesive Solution for Fixing Adhesive Layer) The adhesive solution for the adhesive layer for solid use can be prepared by the following method. First, a montmorillonite (manufactured by Kunimine Industries, Inc., trade name Kumpia G, average length: 〇) μηι) containing 1 part by weight of n-butyl acrylate, 5 parts of acrylic acid, and as a layered sulphate was prepared. The base polymer to be added as a monomer mixture is a propionic acid-based polymer (Mw: about 00 to 2 million 'Mw/Mn: 50 to 70), relative to the acrylic polymer. Ingredients, polyethylene glycol 2 decyl acrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., trade name: NK Ester 4G) as a polymerizable unsaturated compound. 35 Injury, + epoxy compound (Mitsubishi Gas Chemical Co., Ltd.) , Trade name: Tetrad C) 1 part, and further prepared by uniformly mixing with ethyl acetate to a concentration of 20% by weight. (Formation of a cleaning layer) The above-mentioned cleaning layer adhesive solution is applied to one surface of a polyester film having a width of 200 mm and a thickness of 75 μm, and dried to have a thickness of 35 μm after drying. A 38 μm thick polyolefin release film having a surface roughness of 〇·1 μηι with a center line average roughness was applied to the surface as a protective film of 128847.doc •24-200848487. Then, an ultraviolet light having a center wavelength of 365 nm is irradiated with a cumulative light amount of 1000 mW to harden it to form a clean layer. (Production of Cleaning Sheet) The adhesive solution for the fixing adhesive layer is applied to the other side of the base material on which the cleaning layer is provided, and dried to have a thickness of 10 μΓΠ after drying, and is fixed. The adhesive layer was adhered to the surface of the polyolefinized separation membrane having a thickness of 25 Å. Further, the fixing adhesive layer was aged at 5 (TC heating 2 j ^. Thereby, the cleaning sheet of the present invention was obtained. <Comparative Example 1 > The fixing adhesive layer prepared in Example 1 was used. In the same manner as in Example i, a cleaning sheet was prepared in the same manner as in Example i except that the layered ceric acid salt was not used in the adhesive solution. The cleaning layer and the fixing adhesive obtained in the tenth embodiment and the comparative examples were prepared. The following evaluations were carried out on the layers. The results are shown in Table 1. (Tensile elastic modulus) The cleaning layer was applied with an adhesive solution on a PET film having a width of 200 mm and a thickness of 50 μη1. After drying and ultraviolet curing, the film was peeled off from the PET crucible, and the tensile test was performed with a sample width of 1 〇, a chuck distance of ιι〇mm, and a tensile speed of 5 〇 mm/min, and the tensile elastic modulus was calculated from the stress at the time of measurement. The measurement is based on JIS K7127. (Hurry cutting retention) A tape containing a 25 mm x 25 mm support substrate and a fixing + adhesive layer is attached to the bonded body, and crimped using a hand roller and bonded. The body is vertically drooping. The above-mentioned adherend The lower end portion was subjected to a load of 9.8 N in an environment of 1 5 ° C according to the method of 128847.doc -25-200848487 of JIS Z0237, and the tape offset (with the cutting retention force, unit: mm) after 1 hour was measured. (Adhesive force) The measurement was carried out at a tensile speed of 300 mm/mm in a state in which a tape having a width of 20 mm including a support substrate and a fixing adhesive layer was attached to a conveying member (for example, a glass substrate). It is 180° with respect to the conveying member, and the adhesive force (N/20 mm) after heating at 15 ° C for 1 hour. (Storage elastic modulus)
U. 對固定用黏著劑層,使用Rheometric Scientific公司製造 之ARES ’測定於頻率i Hz、升溫速度5。〇/_、試料尺寸 多7·9 mm之平行板之剪切貯蔵弾性模式下,15(TC之儲藏彈 性模數(MPa)。 又,對實施例以及比較例中所得之清潔片進行下述 "ί貝。將結果示於表1。 (搬送性) 、具有晶圓平台之基板處理裝置(裝置名:GR-3000,日 東精機公司製造)内進行搬送,以下述標準進行評價。 Χ:·附著於各部位、平台,搬送裝置停止之情形、。 △:附著於各部位、亚a y 之情形。“位,但不至於造成搬送裝置停止 且搬送裝置亦未停止之情 〇·未附著於各部位、平台 形。 (異物捕集性) 以手動輥將 剝離清潔片之固定用黏著劑層側的分離膜, 128847.doc -26- 200848487 該黏著劑層貼附於8吋之矽晶圓的内面(鏡面面),製作具清 潔功能之搬送用清潔晶圓。繼而,於具有晶圓平台之基板 處理裝置(裝置名:GR-3000,日東精機公司製造,150°C 之條件下)之平台上放置晶圓數次,使模擬異物附著。模 擬異物係晶圓之研磨屑,使尺寸為1.0 μιη以上(上限為600 μιη)者附著於平台上約19000個。將初始之污染狀態評價用 ^ 8吋矽晶圓,於基板處理裝置上使鏡面面朝向下側進行搬 送後,以雷射式異物測定裝置測定鏡面面,測定初始異物 量(8吋晶圓尺寸之面積内),將該具清潔功能之搬送用清潔 晶圓,於基板處理裝置上使清潔面朝向下側實施3次搬 送。以雷射式異物測定裝置(雷射粒子計數器,TENCOR公 司製造,SURFSCAN6200)測定鏡面面之搬送後之異物數 量 ° [表1]U. The fixing adhesive layer was measured at a frequency i Hz and a temperature rising rate of 5 using ARES' manufactured by Rheometric Scientific. 〇/_, in the shear storage mode of parallel plates with a sample size of 7.9 mm, 15 (TC storage elastic modulus (MPa). Further, the cleaning sheets obtained in the examples and the comparative examples were subjected to the following The results are shown in Table 1. (Transportability) The substrate processing apparatus (device name: GR-3000, manufactured by Nitto Seiki Co., Ltd.) having a wafer platform was transported and evaluated according to the following criteria. - When the conveyor is stopped at each part or platform, △: It is attached to each part and the case of Yay. "Position, but it does not cause the conveyance device to stop and the conveyance device does not stop. Each part and the platform shape (foreign material collection property) The separation film on the side of the fixing adhesive layer of the peeling cleaning sheet is peeled off by a hand roller, 128847.doc -26- 200848487 The adhesive layer is attached to the wafer of 8 吋The inner surface (mirror surface) is used to produce a cleaning wafer for cleaning, and is then used in a substrate processing apparatus (device name: GR-3000, manufactured by Nitto Seiki Co., Ltd., 150 ° C) having a wafer platform. Placing wafers on the platform The simulated foreign matter is attached. The grinding debris of the foreign matter wafer is simulated, and the size of 1.0 μm or more (upper limit of 600 μm) is attached to the platform by about 19,000. The initial contamination state is evaluated by using the wafer. After the mirror surface is transported toward the lower side in the substrate processing apparatus, the mirror surface is measured by a laser type foreign matter measuring device, and the amount of initial foreign matter (in the area of the wafer size of 8 Å) is measured, and the cleaning function is used for transport. The wafer was cleaned and the cleaning surface was transferred three times to the lower side in the substrate processing apparatus. The amount of foreign matter after the mirror surface was measured by a laser type foreign matter measuring device (laser particle counter, manufactured by TENCOR, SURFSCAN6200). Table 1]
實施例1 比較例1 拉伸彈性模數(MPa) 70 0.8 儲藏彈性模數(MPa) 1.5 0.01 剪切保持力(mm) 0.1 10 黏著力(N/19 mm) 0.27 0.1 搬送性 〇 X 異物捕集性 〇 X 於使用本發明之清潔片之實施例1中,即使於150°c之高 溫環境下之基板處理裝置内,清潔片亦不剝落,具有優異 之搬送性,進而異物數自當初之約19000個減少至約3500 個,確認可簡便且有效地捕集•除去附著於裝置内之異 128847.doc •27- 200848487Example 1 Comparative Example 1 Tensile modulus of elasticity (MPa) 70 0.8 Storage modulus (MPa) 1.5 0.01 Shear holding force (mm) 0.1 10 Adhesion (N/19 mm) 0.27 0.1 Transporting 〇X Foreign matter catching In the first embodiment of the cleaning apparatus using the cleaning sheet of the present invention, even in the substrate processing apparatus under a high temperature environment of 150 ° C, the cleaning sheet does not peel off, and has excellent transportability, and the number of foreign objects is from the original. Reduced from approximately 19,000 to approximately 3,500, confirming that it can be easily and efficiently captured and removed from the device. 128847.doc •27- 200848487
物。另一方面,於比較例1中’黏著劑層中未含有層狀矽 酸鹽,因此耐熱性差,於搬送中清潔片自基板剝離T 捕集異物。 能 【圖式簡單說明】 圖1係本發明之清潔片的模式圖之一例。 圖2係本發明之具清潔功能之搬送部件 傾^式圖之 【主要元件符號說明】Things. On the other hand, in Comparative Example 1, since the layered bismuth salt was not contained in the adhesive layer, the heat resistance was poor, and the cleaning sheet was peeled from the substrate to collect foreign matter during the conveyance. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is an example of a schematic view of a cleaning sheet of the present invention. 2 is a conveying member with a cleaning function according to the present invention.
1 支撐基材 2 清潔層 3 分離膜 4 固定用黏著劑層 5搬送部件(矽晶圓) 128847.doc •28-1 Supporting substrate 2 Cleaning layer 3 Separation film 4 Adhesive layer for fixing 5 Transfer member (矽 wafer) 128847.doc •28-
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