TW200844683A - Positioning apparatus, exposure apparatus, and device manufacturing method - Google Patents

Positioning apparatus, exposure apparatus, and device manufacturing method Download PDF

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Publication number
TW200844683A
TW200844683A TW096138890A TW96138890A TW200844683A TW 200844683 A TW200844683 A TW 200844683A TW 096138890 A TW096138890 A TW 096138890A TW 96138890 A TW96138890 A TW 96138890A TW 200844683 A TW200844683 A TW 200844683A
Authority
TW
Taiwan
Prior art keywords
repulsive force
gantry
stator
thrust
magnets
Prior art date
Application number
TW096138890A
Other languages
English (en)
Chinese (zh)
Inventor
Yugo Shibata
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Publication of TW200844683A publication Critical patent/TW200844683A/zh

Links

Classifications

    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
    • H02K41/031—Synchronous motors; Motors moving step by step; Reluctance motors of the permanent magnet type
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70766—Reaction force control means, e.g. countermass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K16/00—Machines with more than one rotor or stator
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K2201/00—Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
    • H02K2201/18—Machines moving with multiple degrees of freedom
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K7/00—Arrangements for handling mechanical energy structurally associated with dynamo-electric machines, e.g. structural association with mechanical driving motors or auxiliary dynamo-electric machines
    • H02K7/10—Structural association with clutches, brakes, gears, pulleys or mechanical starters
    • H02K7/106—Structural association with clutches, brakes, gears, pulleys or mechanical starters with dynamo-electric brakes
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K7/00—Arrangements for handling mechanical energy structurally associated with dynamo-electric machines, e.g. structural association with mechanical driving motors or auxiliary dynamo-electric machines
    • H02K7/10—Structural association with clutches, brakes, gears, pulleys or mechanical starters
    • H02K7/118—Structural association with clutches, brakes, gears, pulleys or mechanical starters with starting devices
    • H02K7/1185—Structural association with clutches, brakes, gears, pulleys or mechanical starters with starting devices with a mechanical one-way direction control, i.e. with means for reversing the direction of rotation of the rotor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Combustion & Propulsion (AREA)
  • Electromagnetism (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Linear Motors (AREA)
TW096138890A 2006-10-27 2007-10-17 Positioning apparatus, exposure apparatus, and device manufacturing method TW200844683A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006293154A JP5020597B2 (ja) 2006-10-27 2006-10-27 位置決め装置、露光装置、及びデバイス製造方法

Publications (1)

Publication Number Publication Date
TW200844683A true TW200844683A (en) 2008-11-16

Family

ID=39329275

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096138890A TW200844683A (en) 2006-10-27 2007-10-17 Positioning apparatus, exposure apparatus, and device manufacturing method

Country Status (4)

Country Link
US (1) US7804207B2 (https=)
JP (1) JP5020597B2 (https=)
KR (1) KR20080038015A (https=)
TW (1) TW200844683A (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5020597B2 (ja) * 2006-10-27 2012-09-05 キヤノン株式会社 位置決め装置、露光装置、及びデバイス製造方法
US7932646B2 (en) * 2007-01-15 2011-04-26 Canon Kabushiki Kaisha Exposure apparatus with a stage, driving unit,and force applying unit having a separate magnetic shield
KR20130015864A (ko) * 2011-08-05 2013-02-14 삼성전기주식회사 리니어진동장치
US9298106B1 (en) * 2011-09-07 2016-03-29 Kla-Tencor Corporation Wafer stage with reciprocating wafer stage actuation control
US9507276B2 (en) * 2012-10-09 2016-11-29 Koninklijke Philips N.V. Positioning device, control device and control method
CN104049472B (zh) * 2014-06-30 2016-03-30 清华大学 一种电磁弹射启动式掩模台系统

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3614181A (en) * 1970-07-02 1971-10-19 Us Air Force Magnetic bearing for combined radial and thrust loads
US4890023A (en) * 1985-02-19 1989-12-26 Hinds Walter E Linear induction motor systems
JP3363662B2 (ja) * 1994-05-19 2003-01-08 キヤノン株式会社 走査ステージ装置およびこれを用いた露光装置
JP3720593B2 (ja) * 1998-09-09 2005-11-30 キヤノン株式会社 ステージ装置、露光装置および露光方法
US6144118A (en) * 1998-09-18 2000-11-07 General Scanning, Inc. High-speed precision positioning apparatus
JP3849932B2 (ja) * 2002-08-12 2006-11-22 キヤノン株式会社 移動ステージ装置
JP2004172557A (ja) * 2002-11-22 2004-06-17 Canon Inc ステージ装置及びその制御方法
JP2007258356A (ja) * 2006-03-22 2007-10-04 Canon Inc ステージ装置
JP2008010643A (ja) * 2006-06-29 2008-01-17 Canon Inc ステージ装置
JP5020597B2 (ja) * 2006-10-27 2012-09-05 キヤノン株式会社 位置決め装置、露光装置、及びデバイス製造方法
US20080170213A1 (en) * 2007-01-12 2008-07-17 Canon Kabushiki Kaisha Stage apparatus, exposure apparatus, and device manufacturing method
US7932646B2 (en) * 2007-01-15 2011-04-26 Canon Kabushiki Kaisha Exposure apparatus with a stage, driving unit,and force applying unit having a separate magnetic shield

Also Published As

Publication number Publication date
JP2008112757A (ja) 2008-05-15
JP5020597B2 (ja) 2012-09-05
US7804207B2 (en) 2010-09-28
KR20080038015A (ko) 2008-05-02
US20080100149A1 (en) 2008-05-01

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