TW200844127A - Curable composition, cured film and laminate thereof - Google Patents

Curable composition, cured film and laminate thereof Download PDF

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TW200844127A
TW200844127A TW97105039A TW97105039A TW200844127A TW 200844127 A TW200844127 A TW 200844127A TW 97105039 A TW97105039 A TW 97105039A TW 97105039 A TW97105039 A TW 97105039A TW 200844127 A TW200844127 A TW 200844127A
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group
component
curable composition
polymerizable unsaturated
formula
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TW97105039A
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TWI363764B (en
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Hiroshi Miyao
Yasunobu Suzuki
Shuichi Sugawara
Noriyasu Shinohara
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Jsr Corp
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Abstract

PROBLEM TO BE SOLVED: To provide a curable composition affording a cured film having excellent antistatic properties and further anti-staining properties and wet heat resistance. ; SOLUTION: The curable composition comprises (A) a polymer containing a polymerizable unsaturated group and repeating units represented by formulas (1a) and (1b), (B) a compound represented by formula: LiC<SB>n'</SB>F<SB>2n'+1</SB>X or formula: Li(C<SB>n'</SB>F<SB>2n'+1</SB>Y)<SB>2</SB>N, (C) a compound having >=2 polymerizable unsaturated groups in the molecule other than the component (A) and (D) a photopolymerization initiator.

Description

200844127 九、發明說明 【發明所屬之技術領域】 本發明係關於硬化性組成物、其硬伯 詳細地說,本發明係關於一種可獲得具笔 (防污染性)之硬化膜的硬化性組成物、 am 體0 【先前技術】 近年來,防止塑膠(聚碳酸酯、聚 酯、聚苯乙烯、聚酯、聚烯烴、環氧樹脂 、三乙酸纖維素樹脂、ABS樹脂、AS 樹脂等)、金屬、木材、紙、玻璃、石 面之損傷(擦傷)或防污染用作爲保護塗 膜用被覆材料之硬化性組成物,係要求具 ,且可形成對各種基材之表面不管是硬度 磨耗性、表面光滑性、低捲曲性、密著性 品性及塗膜面的外觀之任一項均優異的硬 各種基材之表面賦予了防污染性,故 膜具有防靜電性。賦予硬化膜防靜電性之 組成物中搭配鋰化合物。 例如,在專利文獻1中,揭示有由 烯酸乙二醇酯、分子中不具有聚乙二醇單 (甲基)丙烯醯氧基之聚合性化合物、雙 亞胺鋰、及光起始劑所成之光硬化性樹脂 膜及層合體。更 優異的防靜電性 其硬化膜及層合 甲基甲基丙烯酸 、三聚氰酸樹脂 脂、降冰片烯系 等之各種基材表 佈材料及防反射 有優異的塗佈性 、耐擦傷性、耐 、透明性、耐藥 化膜。 一般而言,硬化 方法之1,係於 聚二(甲基)丙 位而至少有2個 全氟鏈烷烴硫醯 組成物。 -6- 200844127 此專利中,並無使用含聚醚之聚二甲基矽 醚之全氟院基寡聚物。此外,因使用較多量的 ,硬度可能低。 專利文獻2中,係揭示有含有選自電離輻 樹脂組成物、及全氟烷基磺酸鋰、雙全氟烷基 及過氯酸鋰之1或2種以上之鋰鹽的光學元件 物。 未使用含聚醚之聚二甲基矽氧烷或含聚醚 寡聚物。又,光硬化性單體係使用單官能或二 ,作爲硬塗層有硬度低的可能性。 專利文獻3中,係揭示有將矽酸膠微粒子 化合物之水解生成物進行縮合反應所得之含有 A )、乙烯性不飽和化合物(B )、及特定的 硬化性組成物。 雖使用以矽烷偶合劑修飾之二氧化矽粒子 係使用含有甲基丙烯醯基之矽烷偶合劑,以反 來看,可能無法獲得充分的硬度或耐擦傷性。 再者,用爲DVD等之記錄用光碟用的硬 反射薄膜之情況時,係要求具有指紋拭去性等 又,例如,用於車輛搭載用之電子機器之記錄 情況時,使用中會因爲硬化膜成分流出,或光 障礙,再者可能起火之故,必須要耐濕熱性。 [專利文獻1] 特開2004-331909號公報 氧烷或含聚 二丙烯酸酯 射線硬化型 硫醯亞胺鋰 用樹脂組成 之全氯院基 官能之單體 及有機矽烷 二氧化砂( 鋰化合物之 ,實施例中 應性之觀點 塗層或、防 之防污性。 用光碟等之 碟的讀取有 200844127 [專利文獻2] 特開2005-3 1 282號公報 [專利文獻3] 特開2005-146110號公報 【發明內容】 [發明所欲解決之課題] 本發明係以提供可獲得具有優異的防靜電性、防污性 、耐濕熱性之硬化膜的硬化性組成物爲其目的。 [解決課題的方法] 本發明者等爲達到上述目的而不斷專致於硏究之結果 發現,具有聚合性不飽和基,且搭配具聚醚鏈與聚二甲基 矽氧烷基之化合物、特定的鋰化合物所成之硬化性組成物 係可解決上述課題,本發明遂得以完成。 根據本發明,可提供以下的硬化性組成物、其硬化膜 及層合體。 1 · 一種硬化性組成物,其係含有下述成分(A )〜 (D ): (A )含有聚合性不飽和基、以下述式(i a )所示之 重複單位及以下述式(1 b )所示之重複單位之聚合物、 (B) 以下述式(3a)或(3b)所示之化合物、 (C) 前述成分(A)以外之分子內具有2個以上之 聚合性不飽和基的化合物、 -8- 200844127 (D)光聚合起始劑; [化1] (1a) (1b) *—|-CpH2p〇-J-* ' ch3 · *—-SiO--*200844127 IX. OBJECTS OF THE INVENTION [Technical Field] The present invention relates to a hardenable composition, and in detail, the present invention relates to a curable composition capable of obtaining a cured film having a pen (anti-contamination property) , am body 0 [Prior Art] In recent years, prevent plastic (polycarbonate, polyester, polystyrene, polyester, polyolefin, epoxy resin, cellulose triacetate resin, ABS resin, AS resin, etc.), metal Wood, paper, glass, stone surface damage (scratch) or anti-pollution is used as a hardenable composition for protecting a coating material for a coating film, and is required to form a surface for various substrates, regardless of hardness wearability. The surface of each of the hard various substrates excellent in surface smoothness, low curling property, adhesive property, and appearance of the coating film surface is provided with antifouling property, so that the film has antistatic property. A lithium compound is blended in the composition imparting antistatic properties to the cured film. For example, Patent Document 1 discloses a polyethylene terephthalate, a polymerizable compound having no polyethylene glycol mono(meth)acryloxy group in the molecule, lithium bisimide, and a photoinitiator. A photocurable resin film and a laminate formed. More excellent antistatic properties, such as cured film and laminated various surface cloth materials such as methyl methacrylic acid, cyanuric resin, norbornene, etc., and excellent anti-reflection properties and scratch resistance. Resistance, transparency, and drug-resistant film. In general, the hardening method 1 is in the polydi(methyl)propyl group and has at least 2 perfluoroalkane sulfonium compounds. -6- 200844127 In this patent, there is no use of a perfluorohomogeneous oligomer of polyether-containing polydimethylether ether. In addition, the hardness may be low due to the use of a larger amount. Patent Document 2 discloses an optical element containing a lithium salt selected from the group consisting of an ionizing radiation resin composition and a perfluoroalkylsulfonic acid lithium, a diperfluoroalkyl group, and a lithium perchlorate. Polyether-containing polydimethyl siloxane or polyether-containing oligomer is not used. Further, the photocurable single system is monofunctional or divalent, and has a low hardness as a hard coat layer. In Patent Document 3, A), an ethylenically unsaturated compound (B), and a specific curable composition obtained by subjecting a hydrolyzate of a phthalic acid microparticle compound to a condensation reaction are disclosed. Although cerium oxide particles modified with a decane coupling agent are used, a decane coupling agent containing a methacryl oxime group is used, and in view of the above, sufficient hardness or scratch resistance may not be obtained. In the case of using a hard reflective film for a recording disc such as a DVD, it is required to have fingerprint wiping property, etc., for example, when used for recording of an electronic device for vehicle mounting, it is hardened during use. The membrane component flows out, or the light barrier, and may cause fire, it must be resistant to heat and humidity. [Patent Document 1] Japanese Laid-Open Patent Publication No. 2004-331909, a peroxane-based monomer composed of a resin containing a polydiacrylate ray-curable bismuthimide hydride, and an organic decane dioxide (lithium compound) In the case of the embodiment, the coating or the antifouling property is prevented. The reading of a disc such as a disc is 200844127 [Patent Document 2] JP-A-2005-3 1 282 [Patent Document 3] Special Opening 2005 [Problem to be Solved by the Invention] The present invention has an object of providing a curable composition capable of obtaining a cured film having excellent antistatic properties, antifouling properties, and moist heat resistance. Means for Solving the Problem The present inventors have found that a polymerizable unsaturated group having a polymerizable unsaturated group and a compound having a polyether chain and a polydimethylphosphonyl group, and a specific The curable composition of the lithium compound can solve the above problems, and the present invention can be completed. According to the present invention, the following curable composition, cured film, and laminate can be provided. 1 · A curable composition, The following components (A) to (D) are contained: (A) a polymer having a polymerizable unsaturated group, a repeating unit represented by the following formula (ia), and a repeating unit represented by the following formula (1b) (B) a compound represented by the following formula (3a) or (3b), (C) a compound having two or more polymerizable unsaturated groups in a molecule other than the component (A), -8- 200844127 (D) Photopolymerization initiator; [Chemical 1] (1a) (1b) *-|-CpH2p〇-J-* 'ch3 · *--SiO--*

I L CH3」 [式(la)及(lb)中,p 爲 1〜10。]I L CH3" [In the formulas (la) and (lb), p is 1 to 10. ]

LiCn,F2n’ + iX (3 a)LiCn, F2n' + iX (3 a)

Li(Cn,F2n,+ 1Y)2N (3b) [式(3a)及(3b)中,X表示C02或S03、Y表示CO或 S〇2、n’表示1〜9之整數。] 2. 如上述第1項之硬化性組成物,其中,前述成分 (A)所具有之聚合性不飽和基係(甲基)丙烯醯基。 3. 如上述第1或2項之硬化性組成物,其中,前述 成分(A)更含有胺基甲酸酯基。 4. 如上述第1〜3項中任1項之硬化性組成物,其係 進一步含有下述成分(E): (E )具有聚合性不飽和基,且以選自矽、鋁、鉻、 鈦、鋅、鍺、銦、錫、銻及铈所成群之至少一個元素之氧 化物爲主成分之粒子。 5·如上述第4項之硬化性組成物’其中’前述成分 (E )所具有之聚合性不飽和基係含有以下述式(4 )所示 -9- 200844127 構造之基; [化2] Η “、 —U—C—Ν— ⑷Li (Cn, F2n, + 1Y) 2N (3b) [In the formulae (3a) and (3b), X represents CO 2 or S03, Y represents CO or S 〇 2, and n' represents an integer of 1 to 9. 2. The curable composition according to the above item 1, wherein the component (A) has a polymerizable unsaturated group (meth) acrylonitrile group. 3. The curable composition according to the above item 1 or 2, wherein the component (A) further contains a urethane group. 4. The curable composition according to any one of the above items 1 to 3, further comprising the following component (E): (E) having a polymerizable unsaturated group and selected from the group consisting of ruthenium, aluminum, chromium, A particle containing at least one element of a group of titanium, zinc, bismuth, indium, tin, antimony, and bismuth as a main component. 5. The curable composition according to the above item 4, wherein the polymerizable unsaturated group of the component (E) contains a group having a structure of -9-200844127 represented by the following formula (4); [Chemical 2] Η “, —U—C—Ν—(4)

IIII

VV

[式(4)中,U表示ΝΗ、◦(氧原子)或s(硫原子 ),V表示Ο或S。] 6 · —種硬化膜,其係使如上述第1〜5項中任1項之 硬化性組成物硬化而成。 7· —種層合體,其係於基材上具有如上述第6項之 硬化膜。 [發明的效果] 根據本發明,可提供能獲得具有優異的防靜電性、指 紋拭去性及耐濕熱性之硬化膜的硬化性組成物。 [實施發明之最佳形態] 1.硬化性組成物 本發明之硬化性組成物係以含有下述之成分(A )〜 (D )爲特徵。 藉由組合成分(A )與(B )進行搭配,即使成分(B )的搭配量少亦可發揮防靜電性。此係推論爲,使此組成 物硬化之際,因成分(A )偏向於塗膜之空氣側或基材側 界面附近存在,或因成分(A)之聚醚鏈,使成分(B) -10- 200844127 也偏向在界面附近移動存在之故。 本發明之硬化性組成物中,以再含有下述成分(E ) 爲佳。 (E )具有聚合性不飽和基,且以選自矽、鋁、銷、 欽、鋅、鍺、銦、錫、鍊及鈽所成群之至少一個元素之氧 化物爲主成分之粒子(以下稱爲反應性粒子)。 藉由搭配如此之反應性粒子,可進一步提升硬化膜的 耐擦傷性。 以下,就各成分進行說明。 成分(A):含有聚合性不飽和基、式(la)所示之 重複單位及式(1 b )所示之重複單位的聚合物 用於本發明之成分(A ),係含有聚合性不飽和基 、以下述式(la)所示重複單位之聚醚鏈及以下述式(lb )所不重複卓位之聚一'甲基砂氧院鍵的聚合物。 [化3] *—-CpH2pO--* (1a) Γ ch3 ίIn the formula (4), U represents hydrazine, hydrazine (oxygen atom) or s (sulfur atom), and V represents hydrazine or S. And a cured film obtained by curing the curable composition according to any one of items 1 to 5 above. A laminate comprising a cured film as in item 6 above, on a substrate. [Effect of the Invention] According to the present invention, it is possible to provide a curable composition capable of obtaining a cured film having excellent antistatic properties, fingerprint wiping property, and moist heat resistance. [Best Mode for Carrying Out the Invention] 1. Curable Composition The curable composition of the present invention is characterized by containing the following components (A) to (D). By combining the components (A) and (B), the antistatic property can be exhibited even if the amount of the component (B) is small. It is inferred that when the composition is hardened, the component (B) is biased toward the air side of the coating film or near the interface of the substrate side, or the component (B) is caused by the polyether chain of the component (A). 10- 200844127 Also tends to move around the interface. The curable composition of the present invention preferably contains the following component (E). (E) particles having a polymerizable unsaturated group and having an oxide of at least one element selected from the group consisting of ruthenium, aluminum, pin, chin, zinc, ruthenium, indium, tin, a chain, and ruthenium as a main component (below Known as reactive particles). By combining such reactive particles, the scratch resistance of the cured film can be further improved. Hereinafter, each component will be described. Component (A): a polymer containing a polymerizable unsaturated group, a repeating unit represented by the formula (1), and a repeating unit represented by the formula (1b), which is used in the component (A) of the present invention, and contains a polymerizable property. A saturated group, a polyether chain of a repeating unit represented by the following formula (la), and a polymer of a poly-methylsulfate bond which is not repeated by the following formula (lb). [化3] *—CpH2pO--* (1a) Γ ch3 ί

I *一一Si〇--* (1b)I *一一Si〇--* (1b)

I L CH3」 [式(la)中,p爲1〜l〇。] 成分(A)係藉由與下述成分(B)倂用,即使成分 (B )的添加量少,亦可賦予優異的防靜電性。又,成分 (A )因具有聚合性不飽和基,而以聚合與其他成分鍵結 -11 - 200844127 ,故即使在濕熱條件下,也不會發生凝出粉化。 以上述式(1 a )所示重複單位之聚醚鏈(次烴基氧構 造)可爲直鏈狀亦可分支。聚合性不飽和基可具有1個以 上,但具有2個以上更好。聚合性不飽和基可舉例如(甲 基)丙烯醯基、乙烯基,其中以(甲基)丙烯醯基爲佳。 再者,聚合性不飽和基之外,亦可具有胺基甲酸酯。 成分(A)以具有下述式(5)〜(8)所示之構造的 化合物爲佳。本發明中所用之成分(A),可藉由在具有 下述式(5)〜(8)所示之構造的化合物中導入聚合性不 飽和基而製造。 -12- 200844127 [化4] —0~(-CkH2k0-)^· ch3 Si〇4— I 7 m CH3I L CH3" [In the formula (la), p is 1 to l〇. The component (A) is used in combination with the component (B) described below, and even if the amount of the component (B) added is small, excellent antistatic properties can be imparted. Further, since the component (A) has a polymerizable unsaturated group and is polymerized to bond with other components -11 - 200844127, condensed powder does not occur even under moist heat conditions. The polyether chain (sub-hydrocarbyloxy structure) of the repeating unit represented by the above formula (1 a ) may be linear or branched. The polymerizable unsaturated group may have one or more, but more preferably two or more. The polymerizable unsaturated group may, for example, be a (meth)acryl fluorenyl group or a vinyl group, and among them, a (meth) acrylonitrile group is preferred. Further, in addition to the polymerizable unsaturated group, a urethane may also be present. The component (A) is preferably a compound having a structure represented by the following formulas (5) to (8). The component (A) used in the present invention can be produced by introducing a polymerizable unsaturated group into a compound having a structure represented by the following formulas (5) to (8). -12- 200844127 [化4] —0~(-CkH2k0-)^· ch3 Si〇4— I 7 m CH3

(5)(5)

(6) ch3 ICH3-{|i〇^ ch3 ch3 SiO-)- q CH3 I (si〇-)—Si(CH3)3 ' 1 m ch3 (7) R-((6) ch3 ICH3-{|i〇^ ch3 ch3 SiO-)- q CH3 I (si〇-)-Si(CH3)3 ' 1 m ch3 (7) R-(

CkH2k〇- n ch3 fsiO^-Si(CH3)3 \ q (8)CkH2k〇- n ch3 fsiO^-Si(CH3)3 \ q (8)

CH3 I 3 CH3-(si〇-)^ ch3 [式(5)〜(8)中,p爲1〜10; R表示可含有 子、硫原子、或雜原子之碳數1〜20的2價有機基; η分別獨立地爲5〜1,000; q爲1〜100。] 具有式(5 )所示之構造的化合物,其市售品可 SF8427 、 BY16-201 、 SF8428 、 SZ-2162 、 SH3773M ( Corning Toray 製)、KF-8010、KF- 1 002、X-22-4952 22-4272、X-22-6266 (信越 Silicone 製)等。 成分(A )之聚合物,係可藉由例如,使具有上 (5 )〜(8 )所示之任一構造的聚合物、2,4 一甲苯 -13- 氧原 m、 舉出 Dow 、X- 述式 二異 200844127 氰酸酯、二異氰酸異佛爾酮等之異氰酸酯,在二丁基月桂 酸錫存在下進行混合,例如使其於室溫〜40 °C反應數小時 後,添加季戊四醇三丙烯酸酯、丙烯酸羥基乙酯等之含羥 基(甲基)丙烯酸酯,再以例如60°C〜7(TC使其反應數 小時程度而製造。 本發明之組成物中的成分(A ),當除去(F )有機 溶劑之組成物全量爲1〇〇質量%時,其搭配量以0.01〜40 質量%爲佳,0.1〜25質量%更佳,而0.5〜15質量%又 更佳。成分(A )之搭配量若低於〇. 〇 1質量%,恐怕無法 獲得充分的防靜電性,若超過40質量%則恐怕作爲硬化 物時的硬度不足。 成分(B ):式(3a)或(3b)所示之化合物 用於本發明之組成物的成分(B )係以下述式(3 a ) 或(3b )所示之含鋰化合物。CH3 I 3 CH3-(si〇-)^ ch3 [In the formulas (5) to (8), p is 1 to 10; R represents a divalent value of 1 to 20 carbon atoms which may contain a sub, a sulfur atom or a hetero atom. The organic group; η is independently 5 to 1,000; q is 1 to 100. A compound having a structure represented by the formula (5), which is commercially available as SF8427, BY16-201, SF8428, SZ-2162, SH3773M (manufactured by Corning Toray), KF-8010, KF-1002, X-22- 4952 22-4272, X-22-6266 (Shin-Etsu Silkic), etc. The polymer of the component (A) can be, for example, a polymer having any of the structures shown in the above (5) to (8), 2,4-toluene-13-oxogen m, and Dow, X- the above-mentioned diiso 200844127 isocyanate such as cyanate ester or isophorone diisocyanate, and mixed in the presence of tin dibutyl laurate, for example, after reacting at room temperature to 40 ° C for several hours, A hydroxyl group-containing (meth) acrylate such as pentaerythritol triacrylate or hydroxyethyl acrylate is added, and the mixture is produced, for example, at 60 ° C to 7 (TC is allowed to react for several hours. The composition in the composition of the present invention (A) When the total amount of the composition of the (F) organic solvent is removed by 1% by mass, the amount thereof is preferably 0.01 to 40% by mass, more preferably 0.1 to 25% by mass, and more preferably 0.5 to 15% by mass. If the amount of the component (A) is less than 〇. 质量1% by mass, sufficient antistatic properties may not be obtained. If it exceeds 40% by mass, the hardness may be insufficient as a cured product. Component (B): Formula (3a) Or a compound represented by (3b) is used in the component (B) of the composition of the present invention by the following formula (3a) Or a lithium-containing compound represented by (3b).

LiCn,F2n+1X (3a)LiCn, F2n+1X (3a)

Li(Cn,F2n,+ 1 Y)2N (3b) [式(3a)及(3b)中,X表示C02或S03、Y表示CO或 S〇2、n’表示1〜9之整數。] 成分(Β)的具體例可舉出全氟乙酸鋰、全氟丙酸鋰 、全氟丁酸鋰、全氟戊酸鋰、全氟己酸鋰、全氟庚酸鋰、 全氟辛酸鋰、全氟壬酸鋰、全氟癸酸鋰、三氟甲磺酸鋰、 全氟乙磺酸鋰、全氟丙磺酸鋰、全氟丁磺酸鋰、全氟戊磺 酸鋰、全氟己磺酸鋰、全氟庚酸鋰、全氟辛酸鋰、全氟壬 -14- 200844127 酸鋰、鋰雙三氟甲硫醯亞胺、鋰雙全氟甲硫醯亞胺 全氟乙硫醯亞胺、鋰雙全氟丙硫醯亞胺、鋰雙全氟 亞胺、鋰雙全氟戊硫醯亞胺、鋰雙全氟己硫醯亞胺 全氟庚硫醯亞胺、鋰雙全氟辛硫醯亞胺、鋰雙全氟 亞胺、鋰雙三氟甲碳化亞胺、鋰雙全氟乙酸醯亞胺 全氟丙酸醯亞胺、鋰雙全氟丁酸醯亞胺、鋰雙全氟 亞胺、鋰雙全氟己酸醯亞胺、鋰雙全氟庚酸醯亞胺 全氟辛酸醯亞胺、鋰雙全氟壬酸醯亞胺、鋰雙全氟 亞胺等。 又,市售亦有成分(B)與具聚合性不飽和基 物的混合物,可舉例如 SankonolA600-3 0R、A600 PETA-30R、PETA-20R、A4 00-20R(三光化學工業 )等。 本發明之組成物中的成分(B ),當除去(F 溶劑之組成物全量爲1 0 0質量%時,其搭配量以0. 質量%爲佳,更佳爲0.05〜15質量%,而0.1〜1 %又更佳。成分(B)之搭配量若低於0.01質量% 無法獲得充分的靜電衰減性,若超過20質量%, 作爲硬化物時之硬度不足。又,作爲硬化物時擔心 法到達下部(內部)。 (C)前述成分(A)之外的分子內具有2個 合性不飽和基之化合物(多官能聚合性有機化合物 本發明所用之多官能聚合性有機化合物(C ) 用於提高組成物之成膜性。硬化時,成分(A )之 、鋰雙 丁硫醯 、鋰雙 壬硫醯 、鋰雙 戊酸醯 、鋰雙 癸酸醯 之化合 -20R、 (股) )有機 01 〜20 〇質量 ,恐怕 則恐怕 硬化無 以上聚 ) ,適合 聚合性 15- 200844127 不飽和基也一起反應形成聚合物。多官能聚合性有機化合 物(C )只要爲分子內含有2個以上聚合性不飽和基者則 無特別限制,可舉例如(甲基)丙烯酸酯類、乙烯基化合 物類。此等之中,以(甲基)丙烯酸酯類爲佳。 (甲基)丙烯酸酯類可舉出三羥甲基丙三(甲基)丙 烯酸酯、二三羥甲基丙四(甲基)丙烯酸酯、季戊四醇三 (甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、二季 戊四醇五(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯 酸酯、丙三醇三(甲基)丙烯酸酯、參(2-羥乙基)異 氰尿酸酯三(甲基)丙烯酸酯、乙二醇二(甲基)丙烯酸 酯、13 — 丁二醇二(甲基)丙烯酸酯、1,4 一丁二醇二( 甲基)丙烯酸酯、1,6—己二醇二(甲基)丙烯酸酯、新 戊二醇二(甲基)丙烯酸酯、二乙二醇二(甲基)丙烯酸 酯、三乙二醇二(甲基)丙烯酸酯、二丙二醇二(甲基) 丙烯酸酯、雙(2—羥乙基)異氰尿酸酯二(甲基)丙烯 酸酯等羥基含有(甲基)丙烯酸酯類、及對此等羥基之氧 化乙烯或氧化丙烯加成物之聚(甲基)丙烯酸酯類、分子 內具有2個以上(甲基)丙烯醯基之寡聚酯(甲基)丙烯 酸酯類、寡聚醚(甲基)丙烯酸酯類、寡聚胺基甲酸酯( 甲基)丙烯酸酯類、及寡聚環氧(甲基)丙烯酸酯類、下 述式(4 ) 、( 5 )所示之化合物等。此等之中,係以二季 戊四醇六(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯 酸酯、季戊四醇四(甲基)丙烯酸酯、二三羥甲基丙四( 甲基)丙烯酸酯、下述式(9) 、(10)所示之化合物等 -16- 200844127 爲佳。 [化5]Li(Cn, F2n, + 1 Y)2N (3b) [In the formulae (3a) and (3b), X represents CO 2 or S03, Y represents CO or S 〇 2, and n' represents an integer of 1 to 9. Specific examples of the component (Β) include lithium perfluoroacetate, lithium perfluoropropionate, lithium perfluorobutyrate, lithium perfluoropentanoate, lithium perfluorohexanoate, lithium perfluoropentanoate, lithium perfluorooctanoate, and Lithium fluoroantimonate, lithium perfluoroantimonate, lithium trifluoromethanesulfonate, lithium perfluoroethanesulfonate, lithium perfluoropropane sulfonate, lithium perfluorobutanesulfonate, lithium perfluoropentanesulfonate, perfluorohexane Lithium acid, lithium perfluoroheptanoate, lithium perfluorooctanoate, perfluoroindole-14- 200844127 lithium acid, lithium bistrifluoromethyl sulfoximine, lithium bis-perfluoromethyl sulfinimide perfluoro ethionimide, lithium double Fluoropropyl sulfoximine, lithium bis-perfluoroimine, lithium bis-perfluoropentasulfonimide, lithium bis-perfluorohexyl sulfinimide, perfluoroheptanthine, lithium bis-perfluorooctyl sulfinimide, lithium bis-perfluoro Imine, lithium bis-trifluoromethaneimide, lithium bis-perfluoroacetate yttrium imine fluoroindolide, lithium bis-perfluorobutyric acid ylide, lithium bis-perfluoroimine, lithium bis-perfluorohexanoate Lithium bis-perfluoroheptanoate ylide imine perfluorooctanoate, lithium bis-perfluorodecanoate yttrium, lithium bis-perfluoroimine and the like. Further, a mixture of the component (B) and a polymerizable unsaturated group is commercially available, and examples thereof include Sankonol A600-3 0R, A600 PETA-30R, PETA-20R, and A4 00-20R (Sanko Chemical Industry Co., Ltd.). When the component (B) in the composition of the present invention is removed (the total amount of the composition of the F solvent is 100% by mass, the amount thereof is preferably 0. mass%, more preferably 0.05 to 15 mass%, and 0.1 to 1% is more preferable. If the amount of the component (B) is less than 0.01% by mass, sufficient electrostatic attenuation cannot be obtained, and if it exceeds 20% by mass, the hardness as a cured product is insufficient. The method reaches the lower portion (internal). (C) A compound having two hydrophilic unsaturated groups in a molecule other than the above component (A) (polyfunctional polymerizable organic compound) The polyfunctional polymerizable organic compound (C) used in the present invention It is used to improve the film-forming property of the composition. When hardened, the composition (A), lithium dibutyl sulfonium, lithium bismuth sulfonium sulfonium, lithium bismuth valerate, lithium bismuth bismuth ruthenate -20R, (share) ) Organic 01 ~ 20 〇 quality, I am afraid that it will harden without aggregation.) Suitable for polymerization 15-200844127 Unsaturated groups also react together to form a polymer. The polyfunctional polymerizable organic compound (C) is not particularly limited as long as it contains two or more polymerizable unsaturated groups in the molecule, and examples thereof include (meth)acrylates and vinyl compounds. Among these, (meth) acrylates are preferred. Examples of the (meth) acrylate include trimethylolpropane tri(meth)acrylate, ditrimethylolpropane tetra(meth)acrylate, pentaerythritol tri(meth)acrylate, and pentaerythritol tetra(a). Acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, glycerol tri (meth) acrylate, ginseng (2-hydroxyethyl) isocyanurate (Meth) acrylate, ethylene glycol di(meth) acrylate, 13-butanediol di(meth) acrylate, 1,4-butanediol di(meth) acrylate, 1,6- Hexanediol di(meth)acrylate, neopentyl glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, dipropylene glycol II A hydroxyl group such as (meth) acrylate or bis(2-hydroxyethyl)isocyanurate di(meth)acrylate contains a (meth) acrylate, and ethylene oxide or propylene oxide with respect to such a hydroxyl group Poly(meth)acrylates of the product, having two or more molecules in the molecule (methyl Acryl oxime oligoester (meth) acrylates, oligoether (meth) acrylates, oligomeric urethane (meth) acrylates, and oligomeric epoxides (methyl) Acrylates, compounds represented by the following formulas (4) and (5), and the like. Among these, dipentaerythritol hexa(meth) acrylate, dipentaerythritol penta (meth) acrylate, pentaerythritol tetra (meth) acrylate, ditrimethylol propyl tetra (meth) acrylate, The compounds represented by the following formulas (9) and (10) are preferably -16-200844127. [Chemical 5]

[式(9)及式(10)中,「Acryl」表示丙烯醯基。] 乙烯基化合物類可舉出二乙烯基苯、乙二醇二乙烯基 醚、二乙二醇二乙烯基醚、三乙二醇二乙烯基醚等。 如此之聚合性有機化合物(C )的市售品,可舉例如 東亞合成(股)製八尺0&gt;11又]^-400、]^-404、]^-408、%-450、M-305、M-309、M-310、M-315、M-320、M-350、 M_3 60、M-208、M-210、M-215、M-220、M-225、M-233 、M-240、M-245、M-260、M-270、M-1100、M- 1 200、M-1210、M-1310、M- 1 600、M-221、M-203、TO-924、TO-1270 、 TO-1231 、 TO-595 、 TO-756 、 TO-1343 、 TO-902 、 TO-904、TO-905、TO-1330、日本化藥(股)製 KAYARAD D-310、D-3 3 0、DPHA、DPCA-20、DPCA-30、 DPCA-60、DPCA-120、DN-0075、DN-2475、SR-295、 SR-355 、 SR-399E 、 SR-494 、 SR-9041 、 SR-368 、 SR-415 、SR-444 、 SR-454 、 SR-492 、 SR-499 、 SR-502 、 SR-9020 -17- 200844127 、SR-9035 、 SR-111 、 SR-212 &gt; SR-213 、 SR-230 、 SR-259 、SR-268、SR-272、SR-344、SR-349、SR-601、SR-602 、SR-610、SR-9003、PET-30、T- 1 420、GPO-3 03、TC-120S、HDDA、NPGDA、TPGDA、PEG400DA、MANDA、 HX-220、HX-620、R-551、R-712、R-167、R-526、R-551 、R-712、R-604、R-684、TMPTA、THE-3 3 0、TP A-3 20、 TPA-3 3 0、KS-HDDA、KS-TPGDA、KS-TMPTA、共榮社 化學(股)製 LIGHT-ACRYLATE PE-4A、DPE-6A、 DTMP-4A 等。 本發明之組成物中的成分(C ),當除去(F )有機 溶劑之組成物全量爲1 〇 〇質量%時,其搭配量爲5〜8 0質 量%。較佳爲10〜80質量%,更佳爲15〜80質量%。若 低於5質量%或超過8 0質量%時,作爲硬化物時恐無法 獲得高硬度者。又,作爲層合體時,硬化膜與基材間的密 著性可能會降低。 此外,若是含有後述之成分(E )之組成物的情況, 成分(C)的搭配量中,不含成分(E)。 (D )光聚合起始劑 聚合起始劑(D )可舉出,藉由輻射線(光)照射 而使其產生活性自由基種之化合物(輻射線(光)聚合起 始劑)。 輻射線(光)聚合起始劑,若爲藉由光照射而分解 產生自由基後開始聚合者並無特別限制,可舉例如苯乙酮 -18- 200844127 、苯乙酮苄基縮酮、1一羥基環己基苯基酮、2,2_二甲氧 基一 1,2一二苯基乙—1一酮、氧雜蒽酮 '芴酮、苯甲醛、 芴、蒽醌、三苯基胺、咔唑、3-甲基苯乙酮、4一氯二苯 甲酮、4,4’ 一二甲氧基二苯甲酮、4,4,—二胺基二苯甲酮 、苯偶因丙基醚、苯偶因乙基醚、苄基二甲基縮酮、1 一 (4 —異丙基苯基)一 2 —羥基—2〜甲基丙一 1—酮、2一 羥基一 2 -甲基一 1 一苯基丙一 1—酮、硫代氧雜蒽酮、二 乙基硫代氧雜蒽酮、2 —異丙基硫代氧雜蒽酮、2 一氯硫代 興雑恩醒、2_甲基—1 一 [4一(甲基硫代)苯基]一 2一嗎 啉代—丙_1_酮、2—节基一 2 —二甲基胺基—丨一(4 一 嗎啉代苯基)一 丁酮一 1,4 一(2-經基乙氧基)苯基一( 2 —羥基一 2 -丙基)酮、2,4,6-三甲基苯醯二苯基氧化 膦、雙一 (2,6—二甲氧基苯醯)一 2,4,4 一三甲基戊基氧 化膦、寡聚(2—羥基一2 —甲基一1 一 (4 一 (1—甲基乙 烯基)苯基)丙酮)等。 輻射線(光)聚合起始劑之市售品可舉例如 Ciba Specialty Chemicals (股)製 IRUGACUR 184、369、651 、500、819、907、784、295 9、CGI 1 700、CGI 1 75 0、 CGI 1 8 5 0、CG24-61、DAROCUR 1116、1173、BASF 社製 LUCIRIN ΤΡΟ、8 893、UCB 社製 UBECRYL P36、 LANBELTY CORPORATION 社製 EZ ACUR - KIP 1 5 0、 KIP65LT、KIP100F、K T 3 7、K T 5 5、K T 0 4 6、ΚΙ P 7 5 / B 等 o 聚合起始劑(D )之搭配量,當除去(F )有機溶劑 -19- 200844127 之組成物全量爲100質量%時,係以搭配〇·〇丨〜20質量 %爲佳,〇·1〜10質量%更佳,0.5〜10質量%又更佳。 若低於〇·〇1質量%,作爲硬化物時之硬度會不足,若超 過2 0質量%,則作爲硬化物時硬化無法到達內部(下層 )° 此外’本發明中,視其必要可使光聚合起始劑與熱聚 合起始劑倂用。 較佳的熱聚合起始劑可舉例如過氧化物、偶氮化合物 ,具體例可舉出苯醯過氧化物、t-丁基-過氧化苯甲酸 酯、偶氮雙異丁腈等。 (E )具有聚合性不飽和基,且以選自矽、鋁、锆、 鈦、鋅、鍺、銦、錫、銻及鈽所成群之至少一個元素之氧 化物爲主成分之粒子 本發明中,視其必要可搭配之成分(E )(以下亦稱 爲「反應性粒子」)係藉由使選自矽、鋁、鍩、鈦、鋅、 鍺、銦、錫、銻及鈽所成群之至少一個元素之氧化物爲主 成分之粒子(Ea ),與分子內具有聚合性不飽和基及水解 性甲矽烷基之有機化合物(Eb )反應而得。 若搭配成分(E),可與成分(A)及(C)所具有之 聚合性不飽和基反應,且藉由聚合,可更加提高所得硬化 膜之硬度,而且,因可減少硬化收縮(彎曲)而較佳。 (1 )以氧化物爲主成分之粒子(Ea) 用於製造反應性粒子(E )之氧化物粒子(Ea ) ’由 -20- 200844127 所得硬化性組成物之硬化膜的無色性觀點來看,其 自矽、鋁、锆、鈦、鋅、鍺、銦、錫、銻及鈽所成 少一個元素之氧化物爲主成分之粒子。 此等之氧化物粒子(Ea )可舉例如二氧化矽、 、氧化鉻、氧化鈦、氧化鋅、氧化鍺、氧化銦、氧 銦錫氧化物(ITO )、氧化銻、氧化鈽等之粒子。 從高硬度之觀點來看,以二氧化矽、氧化鋁、氧化 化銻之粒子爲佳。此等可單獨使用或組合2種以上 尙且,氧化物粒子(Ea)較佳係用爲粉體狀或溶劑 膠。用爲溶劑分散溶膠時,從與其他成分之相溶性 性的觀點來看,其分散媒介以有機溶劑爲佳。如此 溶劑可舉例如甲醇、乙醇、異丙醇、丁醇、辛醇等 ;丙酮、甲基乙基酮、甲基異丁基酮、環己酮等之 乙酸乙酯、乙酸丁酯、乳酸乙酯、r 一丁內酯、丙 甲基醚乙酸酯、丙二醇單乙基醚乙酸酯等之酯類; 單甲基醚、二乙二醇單丁基醚等之醚類;苯、甲苯 苯等之芳香族烴類;二甲基甲醯胺、二甲基乙醯鹿 甲基吡咯烷酮等之醯胺類。其中’以甲醇、異丙醇 、甲基乙基酮、甲基異丁基酮、乙酸乙酯、乙酸丁 苯、二甲苯爲佳。 氧化物粒子(Ea)之數平均粒子徑’以o.ool //m 較佳,更佳爲 〇.〇〇3//m 〜l/zm,而 0.005/zm^ // m特別佳。數平均粒子徑若超過2 // m,作爲硬 之透明性會降低’且作爲硬化膜時的表面狀態有惡 係以選 群之至 氧化鋁 化錫、 其中, 銷及氧 使用。 分散溶 、分散 之有機 之醇類 酮類; 二醇單 乙二醇 、二甲 :、N-、丁醇 酯、甲 μ m〜2 -0.5 化物時 化之傾 -21 - 200844127 向。又,爲了改善粒子的分散性,可添加各種界面活性劑 或胺類。氧化物粒子之數平均粒子徑係以動態散亂進行測 定。 矽氧化物粒子(例如二氧化矽粒子)之市售商品,可 舉例如矽酸膠,可舉出日產化學工業(股)製甲醇二氧化 矽溶膠、IPA-ST、MEK-ST、NBA-ST、XBA-ST、DMAC-ST、ST-UP、ST-OUP、ST-20、ST-40、ST-C、ST-N、ST-0、ST-50、ST-OL等。又,粉體二氧化矽方面可舉出日 本 AER0SIL (股)製 AER0SIL 130、AER0SIL 3 00、 AER0SIL 3 8 0、AEROSIL TT600、AER0SIL 0X50、旭硝 子(股)製 SILDEX H31、H32、H51、H52、H121、H122 、曰本二氧化矽工業(股)製E220A、E220、富士 Fuji Silysia (股)製 SYLYSIA470、日本板硝子(股)製SG 薄片等。 又,氧化鋁之水分散品可舉出有日產化學工業(股) 製氧化鋁溶膠-1 〇 〇、- 2 0 0、- 5 2 0 ;氧化鋁之異丙醇分散品 可舉出有住友大阪CEMENT (股)製AS-150I;氧化鋁之 甲苯分散品可舉出有住友大阪CEMENT (股)製AS-150T :氧化鉻之甲苯分散品可舉出有住友大阪CEMENT (股) 製HXU-1 10JC ;銻酸鋅粉末之水分散品可舉出有日產化 學工業(股)製CELNAX ;氧化鋁、氧化鈦、氧化錫、氧 化銦、氧化鋅等之粉末及溶劑分散品可舉出有C.I·化成( 股)製ΝΑΝΟTEK ;摻雜銻之氧化錫的水分散溶膠可舉出 有石原產業(股)製SN-100D; ΙΤΟ粉末可舉出有三菱 -22- 200844127In the formulae (9) and (10), "Acryl" represents an acrylonitrile group. The vinyl compound may, for example, be divinylbenzene, ethylene glycol divinyl ether, diethylene glycol divinyl ether or triethylene glycol divinyl ether. As a commercial product of such a polymerizable organic compound (C), for example, East Asian Synthetic Co., Ltd. is made up of eight feet 0&gt; 11 and ] ^-400, ]^-404, ]^-408, %-450, M-. 305, M-309, M-310, M-315, M-320, M-350, M_3 60, M-208, M-210, M-215, M-220, M-225, M-233, M -240, M-245, M-260, M-270, M-1100, M-1 200, M-1210, M-1310, M-1 600, M-221, M-203, TO-924, TO -1270, TO-1231, TO-595, TO-756, TO-1343, TO-902, TO-904, TO-905, TO-1330, Nippon Chemical Co., Ltd. KAYARAD D-310, D-3 30, DPHA, DPCA-20, DPCA-30, DPCA-60, DPCA-120, DN-0075, DN-2475, SR-295, SR-355, SR-399E, SR-494, SR-9041, SR -368, SR-415, SR-444, SR-454, SR-492, SR-499, SR-502, SR-9020 -17- 200844127, SR-9035, SR-111, SR-212 &gt; SR- 213, SR-230, SR-259, SR-268, SR-272, SR-344, SR-349, SR-601, SR-602, SR-610, SR-9003, PET-30, T- 1 420 , GPO-3 03, TC-120S, HDDA, NPGDA, TPGDA, PEG400DA, MANDA, HX-220, HX-620, R-551, R-712, R-167, R -526, R-551, R-712, R-604, R-684, TMPTA, THE-3 3 0, TP A-3 20, TPA-3 3 0, KS-HDDA, KS-TPGDA, KS-TMPTA , glory AC Chemicals (shares) LIGHT-ACRYLATE PE-4A, DPE-6A, DTMP-4A and so on. In the component (C) in the composition of the present invention, when the total amount of the composition of the (F) organic solvent is removed, the amount of the component is 5 to 8% by mass. It is preferably 10 to 80% by mass, more preferably 15 to 80% by mass. When it is less than 5% by mass or more than 80% by mass, it is feared that a high hardness may not be obtained as a cured product. Further, when it is a laminate, the adhesion between the cured film and the substrate may be lowered. Further, in the case of a composition containing the component (E) described later, the component (C) does not contain the component (E). (D) Photopolymerization initiator The polymerization initiator (D) is a compound (radiation (light) polymerization initiator) which generates an active radical species by irradiation with radiation (light). The radiation (light) polymerization initiator is not particularly limited as long as it is decomposed by light irradiation to generate a radical, and is, for example, acetophenone-18-200844127, acetophenone benzyl ketal, 1 Monohydroxycyclohexyl phenyl ketone, 2,2-dimethoxy-1,2-diphenylethyl-1-one, xanthone 'fluorenone, benzaldehyde, hydrazine, hydrazine, triphenylamine , carbazole, 3-methylacetophenone, 4-chlorobenzophenone, 4,4'-dimethoxybenzophenone, 4,4,-diaminobenzophenone, benzoin Propyl ether, benzoin ethyl ether, benzyl dimethyl ketal, 1-(4-isopropylphenyl)-2-hydroxy- 2~methylpropan-1-one, 2-hydroxy-2 -methyl-1-phenylpropan-1-one, thioxanthone, diethylthioxanthone, 2-isopropylthioxanthone, 2-chlorothioxanthene Wake up, 2_methyl-1,[4-mono(methylthio)phenyl]-2-isomorpholino-propen-1-one, 2-n-phenyl-2-phenylamino-indole (4-morpholinophenyl)-butanone-1,4-(2-carbylethoxy)phenyl-(2-hydroxy- 2 - Propyl)ketone, 2,4,6-trimethylphenylphosphonium diphenylphosphine oxide, bis(2,6-dimethoxybenzoquinone)-2,4,4-trimethylpentylphosphine oxide Oligomer (2-hydroxy-2-methyl-l-(4-(1-methylvinyl)phenyl)acetone) and the like. Commercial products of the radiation (photo) polymerization initiator may, for example, be IRUGACUR 184, 369, 651, 500, 819, 907, 784, 295 9 , CGI 1 700, CGI 1 75 0 manufactured by Ciba Specialty Chemicals Co., Ltd. CGI 1 8 5 0, CG24-61, DAROCUR 1116, 1173, LUCIRIN BA, 8 893 manufactured by BASF, UBECRYL P36 manufactured by UCB, EZ ACUR - KIP 1 500 from LANBELTY CORPORATION, KIP65LT, KIP100F, KT 3 7, KT 5 5, KT 0 4 6 , ΚΙ P 7 5 / B, etc. o The amount of the polymerization initiator (D), when the total amount of the composition of (F) organic solvent -19-200844127 is 100% by mass, It is preferable to use 〇·〇丨~20% by mass, 〇·1 to 10% by mass, and 0.5 to 10% by mass. If it is less than 质量·〇1% by mass, the hardness as a cured product may be insufficient, and if it exceeds 20% by mass, it may not be able to reach the inside (lower layer) as a cured product. Further, in the present invention, it may be necessary The photopolymerization initiator is used in combination with a thermal polymerization initiator. The preferred thermal polymerization initiator may, for example, be a peroxide or an azo compound, and specific examples thereof include benzoquinone peroxide, t-butyl-peroxybenzoate, azobisisobutyronitrile, and the like. (E) particles having a polymerizable unsaturated group and having an oxide of at least one element selected from the group consisting of ruthenium, aluminum, zirconium, titanium, zinc, bismuth, indium, tin, antimony and bismuth as a main component of the present invention The component (E) (hereinafter also referred to as "reactive particle") which is compatible with it is formed by selecting bismuth, aluminum, bismuth, titanium, zinc, bismuth, indium, tin, antimony and bismuth. The particles (Ea) which are oxides of at least one element of the group are reacted with an organic compound (Eb) having a polymerizable unsaturated group and a hydrolyzable formyl group in the molecule. When the component (E) is blended, it can react with the polymerizable unsaturated groups of the components (A) and (C), and by polymerization, the hardness of the obtained cured film can be further improved, and since the hardening shrinkage can be reduced (bending) ) and better. (1) Particles containing oxide as a main component (Ea) Oxide particles (Ea) for producing reactive particles (E) 'The colorlessness of the cured film of the curable composition obtained from -20-200844127 It is a particle mainly composed of an oxide of one element from bismuth, aluminum, zirconium, titanium, zinc, bismuth, indium, tin, antimony and bismuth. Examples of the oxide particles (Ea) include particles of cerium oxide, chromium oxide, titanium oxide, zinc oxide, cerium oxide, indium oxide, indium tin oxide (ITO), cerium oxide, and cerium oxide. From the viewpoint of high hardness, particles of cerium oxide, aluminum oxide, and cerium oxide are preferred. These may be used singly or in combination of two or more kinds, and the oxide particles (Ea) are preferably used in the form of a powder or a solvent. When it is used as a solvent-dispersed sol, the dispersion medium is preferably an organic solvent from the viewpoint of compatibility with other components. Such a solvent may, for example, be methanol, ethanol, isopropanol, butanol, octanol or the like; acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone or the like ethyl acetate, butyl acetate, lactate B Esters such as ester, r-butyrolactone, propyl methyl ether acetate, propylene glycol monoethyl ether acetate; ethers such as monomethyl ether, diethylene glycol monobutyl ether; benzene, toluene An aromatic hydrocarbon such as benzene; a guanamine such as dimethylformamide or dimethylacetamide methylpyrrolidone. Among them, methanol, isopropanol, methyl ethyl ketone, methyl isobutyl ketone, ethyl acetate, butyl benzene or xylene is preferred. The number average particle diameter ' of the oxide particles (Ea) is preferably from o.ool //m, more preferably 〇.〇〇3//m 〜l/zm, and 0.005/zm^ // m is particularly preferred. If the number average particle diameter exceeds 2 // m, the transparency as hard will be lowered, and the surface state as a cured film may be selected from the group consisting of tin oxide, in which pin and oxygen are used. Disperse-dissolved and dispersed organic alcohol ketones; diol monoethylene glycol, dimethyl:, N-, butanol ester, and a μ m~2 -0.5 compound-timed -21 - 200844127. Further, in order to improve the dispersibility of the particles, various surfactants or amines may be added. The number average particle diameter of the oxide particles was measured by dynamic dispersion. The commercially available product of the cerium oxide particles (for example, cerium oxide particles) may, for example, be a ceric acid gel, and may be a methanol dioxide cerium oxide sol, IPA-ST, MEK-ST or NBA-ST manufactured by Nissan Chemical Industries Co., Ltd. , XBA-ST, DMAC-ST, ST-UP, ST-OUP, ST-20, ST-40, ST-C, ST-N, ST-0, ST-50, ST-OL, etc. Further, examples of the powdered cerium oxide include AER0SIL 130, AER0SIL 3 00, AER0SIL 380, AEROSIL TT600, AER0SIL 0X50, and Asahi Glass (shared) SILDEX H31, H32, H51, H52, H121 manufactured by AER0SIL Co., Ltd., Japan. , H122, E220A, E220 manufactured by Sakamoto Sebacide Industry Co., Ltd., SYLYSIA470 made by Fuji Fuji Silysia Co., Ltd., SG sheet made of Nippon Sheet Glass Co., Ltd., etc. Further, the aqueous dispersion of alumina may be exemplified by Nissan Chemical Industry Co., Ltd. alumina sol-1 〇〇, -200, - 5 2 0; the isopropyl alcohol dispersion of alumina may be Sumitomo Osaka CEMENT (stock) AS-150I; Alumina toluene dispersions can be found in Sumitomo Osaka CEMENT (stock) AS-150T: chrome oxide toluene dispersions can be found in Sumitomo Osaka CEMENT (shares) HXU- 1 10JC; The water-dispersible zinc citrate powder may be CELNAX manufactured by Nissan Chemical Industries Co., Ltd.; powders and solvent dispersions of alumina, titania, tin oxide, indium oxide, zinc oxide, etc. may be cited as CI ·Chemical (share) system TEK; water-dispersed sol of antimony-doped tin oxide can be SN-100D manufactured by Ishihara Industry Co., Ltd.; ΙΤΟ powder can be exemplified by Mitsubishi-22- 200844127

Materials (股)製之製品;氧化铈之水分散液可舉出有多 木化學(股)製NEEDRAL等。 氧化物粒子(Ea )之形狀爲球狀、中空狀、多孔質狀 、棒狀、板狀、纖維狀、或不固定形狀,較佳爲球狀。氧 化物粒子(Ea)之比表面積(使用氮氣之BET比表面積 測定法)較佳爲10〜l〇〇〇m2/g,更佳爲1〇〇〜5 00m2/g。 此等氧化物粒子(Ea )的使用形態係可使用以乾燥狀態之 粉末、或水或是有機溶劑經分散之狀態。例如,上述氧化 物的溶劑分散溶膠係可直接使用該當業界習知之微粒子狀 氧化物粒子的分散液。特別是在硬化物上要求具優異的透 明性之用途中,以氧化物之有機溶劑分散溶膠的利用爲佳 (2 )有機化合物(Eb ) 本發明中所用之有機化合物(E b )係具有聚合性不 飽和基之化合物,較佳爲含有以下述式(4)所示之基之 有機化合物。 [化6] (4) ΗProducts made of Materials; the water dispersion of cerium oxide can be exemplified by NEEDRAL. The oxide particles (Ea) have a spherical shape, a hollow shape, a porous shape, a rod shape, a plate shape, a fibrous shape, or an unfixed shape, and are preferably spherical. The specific surface area of the oxide particles (Ea) (the BET specific surface area measurement method using nitrogen gas) is preferably 10 to 1 m 2 /g, more preferably 1 to 5 00 m 2 /g. The use form of these oxide particles (Ea) can be used in a state in which a powder in a dry state or water or an organic solvent is dispersed. For example, as the solvent-dispersing sol of the above oxide, a dispersion of fine particle-like oxide particles as known in the art can be used as it is. In particular, in applications where excellent transparency is required on a cured product, it is preferred to use an organic solvent-dispersing sol of an oxide. (2) Organic compound (Eb) The organic compound (Eb) used in the present invention has polymerization. The compound of the unsaturated group is preferably an organic compound containing a group represented by the following formula (4). [6] (4) Η

—U-C-N— II—U-C-N— II

VV

[式(4)中,U表示ΝΗ、0(氧原子)或S(硫原子 ),V表示0或S。] 其中,又以含有[-0-C( = 0)-NH-]基,且更含有 -23- 200844127 [-0-0( = 3),11-]基及[-3-(:( = 0),11-]基之至少其1者爲佳 。又,此有機化合物(Eb )係以分子內具有矽氫氧基之化 合物或藉由水解而生成矽氫氧基之化合物爲佳。 (i )聚合性不飽和基 有機化合物(Eb )中所含之聚合性不飽和基並無特別 限制,可舉例如丙烯醯基、甲基丙烯醯基、乙烯基、丙烯 基、丁二烯基、苯乙烯基、乙炔基、肉桂醯基、順丁烯二 酸酯基、丙烯醯胺基爲較適之例。 此聚合性不飽和基係藉由活性自由基種進行加成聚合 之構成單位。 (ii)前述式(4)所示之基 有機化合物中所含之以前述式(4 )所示之基[-U-C( = V)-NH-]具體而言有[-0-C( = 0)-NH_]、[_0-C( = S)-NH-] 、[-S-C( = 0)-NH-]、[-NH-C( = 0)-NH-] &gt; [-NH-C( = S)-NH-] 、及[-S-C( = S)-NH-]之6種。此等之基係可單獨使用1種 或組合2種以上使用。其中,從熱安定性之觀點來看,以 與[-0-C( = 0)-NH-]基、[-0-C( = S)-NH-]基及[-S-C( = 0)-NH-]基之至少一個倂用爲佳。 前述式(4)所示之基[-U-C( = V)-NH-],若於分子間 使其產生氫鍵所致之適度的凝聚力而爲硬化物的情況時, 會賦予優異的機械性強度、基材或高折射率層等之與鄰接 層的密著性及耐熱性等之特性。 -24- 200844127 (iii) 藉由砂氫氧基或水解生成砂氫氧基之基 有機化合物(Eb)係以分子內具有矽氫氧基之化合物 或藉由水解生成矽氫氧基之化合物爲佳。如此生成矽氫氧 基之化合物,可舉出於矽原子上鍵結烷氧基、芳氧基、乙 醯氧基、胺基、鹵素原子等化合物,其中較佳爲矽原子上 鍵結烷氧基或芳氧基之化合物,意即,含烷氧基甲矽烷基 之化合物或含芳氧基甲矽烷基之化合物。 矽氫氧基或生成矽氫氧基之化合物的矽氫氧基生成部 位’係藉由縮合反應或水解後發生之縮合反應而與氧化物 粒子(Ea )鍵結之構成單位。 (iv) 較佳樣態 有機化合物(Eb )的較佳具體例,可舉例如下述式( 1 1 )所示之化合物。 [化7] (〇R6)i I |_| |_| R73-j SiH-R8—S—C—N—R9—N—C 一 O—R10— II II v ;k o o 式(1 1 )中,R6、R7係可相同或相異之氫原子或碳 數1〜8之烷基或芳基,可舉例如甲基、乙基、丙基、丁 基、羊基、苯基、二甲苯基等。在此,j係1〜3之整數。 [(R60)jR73_jSi-]所示之基,可舉例如三甲氧基甲矽烷 基、二乙氧基甲砂垸基、二苯氧基甲5夕院基、甲基二甲氧 -25- 200844127 基甲矽烷基、二甲基甲氧基甲矽烷基等。此等基之中,以 三甲氧基甲矽烷基或三乙氧基甲矽烷基等爲佳。 R8係碳數1〜1 2之脂肪族或具有芳香族構造之2價 有機基,亦可含鏈狀、分支狀或環狀之構造。具體例可舉 出甲撐、乙撐、丙撐、丁撐、六甲撐、環己撐、苯撐、苯 撐二甲基、十二甲撐等。 R9係2價有機基,通常分子量爲14至1萬;較佳爲 由分子量76至500之2價有機基中選出。具體例可舉出 六甲撐、八甲撐、十二甲撐等之鏈狀聚烷撐基;環己撐、 伸降冰片烷基等之脂環式或多環式的2價有機基;苯撐、 萘撐、雙苯撐、聚苯撐等之2價芳香族基;及此等之烷基 取代物、芳基取代物。又,此等2價有機基可具有含碳及 氫原子以外之元素的原子團,亦可含有聚醚鍵、聚酯鍵、 聚醯胺鍵、聚碳酸酯鍵。 R1G爲(k+ 1 )價之有機基,較佳係由鏈狀、分支狀或 環狀之飽和烴基、不飽和烴基之中所選出。 Z表示在活性自由基種的存在下,於分子中具有進行 分子間交聯反應之聚合性不飽和基之1價有機基。又,k 較佳爲1〜20之整數,更佳爲1〜1〇之整數,其中特別佳 爲1〜5之整數。 式(1 1 )所示之化合物的具體例,係可舉出下述式( 1 2 )及(1 3 )所示之化合物。 -26- 200844127 [化8][In the formula (4), U represents ΝΗ, 0 (oxygen atom) or S (sulfur atom), and V represents 0 or S. Wherein, it contains [-0-C(=0)-NH-], and further contains -23-200844127 [-0-0(= 3),11-] and [-3-(:( It is preferable that at least one of the groups of the group of the formulas of the group of the compounds of the formula (eb) is preferably a compound having a hydrazine hydroxyl group in the molecule or a compound having a hydrazine hydroxy group by hydrolysis. (i) The polymerizable unsaturated group contained in the polymerizable unsaturated organic compound (Eb) is not particularly limited, and examples thereof include an acryl fluorenyl group, a methacryl fluorenyl group, a vinyl group, a propylene group, and a butadienyl group. The styrene group, the ethynyl group, the cinnamyl group, the maleate group, and the acrylamide group are preferred examples. The polymerizable unsaturated group is a constituent unit of addition polymerization by living radical species. (ii) The group [-UC(=V)-NH-] represented by the above formula (4) contained in the base organic compound represented by the above formula (4) specifically has [-0-C ( = 0)-NH_], [_0-C( = S)-NH-] , [-SC( = 0)-NH-], [-NH-C( = 0)-NH-] &gt; [-NH 6 types of -C(=S)-NH-] and [-SC(=S)-NH-]. These bases may be used alone or in combination of two or more. Among them, thermal stability From the point of view, with [-0-C(=0)-NH-], [-0-C(=S)-NH-], and [-SC(=0)-NH-] At least one of them is preferably used. When the group [-UC(=V)-NH-] represented by the above formula (4) is a hardened substance due to a moderate cohesive force caused by hydrogen bonding between molecules It imparts excellent mechanical strength, adhesion to a neighboring layer such as a substrate or a high refractive index layer, and heat resistance, etc. -24- 200844127 (iii) Formation of sand hydrogen by sand hydroxyl or hydrolysis The oxy group-based organic compound (Eb) is preferably a compound having a hydrazine hydroxyl group in the molecule or a compound which is hydrolyzed to form a hydrazine hydroxy group. The compound which forms a hydrazine hydroxy group can be exemplified by a ruthenium atom. a compound having an alkoxy group, an aryloxy group, an ethoxylated group, an amine group, a halogen atom or the like, wherein a compound having an alkoxy group or an aryloxy group bonded to a fluorene atom is preferred, that is, an alkoxy group-containing group a compound of a decyl group or a compound containing an aryloxycarbyl group. A hydrazine hydroxyl-forming site of a hydrazine-hydroxyl group or a hydrazine-hydroxyl group-forming compound is condensed by a condensation reaction or hydrolysis. The constituent unit of the oxide particle (Ea) is bonded. (iv) A preferred embodiment of the preferred organic compound (Eb) is, for example, a compound represented by the following formula (1 1 ). ] (〇R6)i I |_| |_| R73-j SiH-R8—S—C—N—R9—N—C—O—R10—II II v ;koo (1 1 ), R6, R7 is a hydrogen atom or an alkyl group or an aryl group having 1 to 8 carbon atoms which may be the same or different, and examples thereof include a methyl group, an ethyl group, a propyl group, a butyl group, a sheep group, a phenyl group, and a xylyl group. Here, j is an integer of 1 to 3. The group represented by [(R60)jR73_jSi-] may, for example, be a trimethoxymethyl decyl group, a diethoxymethyl sulfonyl group, a diphenoxymethyl sulfonium group, or a methyl dimethyloxy-25-200844127. Methyl decyl, dimethyl methoxy carboxyalkyl, and the like. Among these groups, a trimethoxycarbenyl group or a triethoxycarbenyl group is preferred. R8 is an aliphatic group having 1 to 12 carbon atoms or a divalent organic group having an aromatic structure, and may have a chain, a branched or a cyclic structure. Specific examples thereof include methyl, ethylene, propylene, butyl, hexamethylene, cyclohexene, phenylene, benzodimethyl, and dodecyl. R9 is a divalent organic group, usually having a molecular weight of from 14 to 10,000; preferably selected from a divalent organic group having a molecular weight of from 76 to 500. Specific examples thereof include a chain polyalkylene group such as hexamethylene, octamethylidene, and dodecylylene; an alicyclic or polycyclic divalent organic group such as cyclohexene or bornereyl; and benzene; a divalent aromatic group such as a phthalocyanine, a bisphenylene or a polyphenylene; and an alkyl substituent or an aryl substituent. Further, these divalent organic groups may have an atomic group containing an element other than carbon and a hydrogen atom, and may also contain a polyether bond, a polyester bond, a polyamine bond, or a polycarbonate bond. R1G is an organic group of (k + 1 ) valence, and is preferably selected from a chain hydrocarbon, a branched or cyclic saturated hydrocarbon group, and an unsaturated hydrocarbon group. Z represents a monovalent organic group having a polymerizable unsaturated group which undergoes an intermolecular crosslinking reaction in the molecule in the presence of a living radical species. Further, k is preferably an integer of 1 to 20, more preferably an integer of 1 to 1 Å, and particularly preferably an integer of 1 to 5. Specific examples of the compound represented by the formula (1 1 ) include compounds represented by the following formulas (1 2 ) and (13). -26- 200844127 [化8]

γ' .Si(OCH3)3 (12) 、Si(OCH3)3 (13) [式(12)及式(13)中,「Acryl」表示丙烯醯基。] 本發明中所用之有機化合物(Eb )的合成’係可 例如特開平9 _ 1 0 0 1 1 1號公報中所記載之方法。較佳 由使氫硫基丙基三甲氧基矽烷與二異氰酸異佛爾酮於 基錫二月桂酸酯存在下混合,在60〜70 °C使其反應 時程度之後,添加季戊四醇三丙烯酸酯,再於60〜 使其反應數小時程度所製造。 (3 )反應性粒子(E )之調製 使具有矽氫氧基或藉由水解而生成矽氫氧基之基 機化合物(Eb )與金屬氧化物粒子(Ea)混合,使其 並使兩者鍵結。所得之反應性粒子(E )中的有機聚 成分即水解性矽烷的水解物及縮合物之比例,通常, 燥粉體於空氣中完全燃燒時的質量減少%之恆量値, 藉由例如於空氣中由室溫至通常800 °C爲止的熱質量γ'.Si(OCH3)3 (12), Si(OCH3)3 (13) [In the formulas (12) and (13), "Acryl" means an acryl fluorenyl group. The synthesis of the organic compound (Eb) used in the present invention is, for example, the method described in JP-A-9-0101. Preferably, the pentaerythritol triacrylate is added by mixing the thiopropylpropyltrimethoxydecane with the isophorone diisocyanate in the presence of the base tin dilaurate and reacting it at 60 to 70 ° C. The ester was produced by further reacting it for 60 hours. (3) Preparation of Reactive Particles (E) A base compound (Eb) having a hydrazine hydroxyl group or a hydrazine hydroxyl group formed by hydrolysis is mixed with metal oxide particles (Ea) to cause both Bonding. The ratio of the hydrolyzate and the condensate of the hydrolyzable decane to the organic poly component in the obtained reactive particle (E), usually, the constant mass % of the mass of the dry powder when it is completely burned in the air, by, for example, air Thermal mass from room temperature to usually 800 °C

使用 爲藉 二丁 數小 7 0°C 的有 水解 合物 使乾 係可 分析 -27- 200844127 而求得。 朝氧化物粒子(Ea )鍵結之有機化合物(Eb )的鍵結 量,當反應性粒子(E )(金屬氧化物粒子(E a )及有機 化合物(Eb )之合計)爲100質量%,較佳爲〇·〇1質量 %以上,而更佳爲0.1質量%以上,其中以1質量%以上 特別好。鍵結於金屬氧化物粒子(Ea )之有機化合物(Eb )的鍵結量若低於0.0 1質量%,組成物中之反應性粒子 (E )的分散性不足,所得硬化物的透明性、耐擦傷性會 變得不夠充分。又,反應性粒子(E )製造時,原料中的 金屬氧化物粒子(Ea)之搭配比例較佳爲5〜99質量%, 更佳爲1 0〜9 8質量%。構成反應性粒子(E )之氧化物粒 子(Ea)的含量,較佳爲反應性粒子(E )的65〜95質量 %。 反應性粒子(E )於硬化性組成物中之含量,當除去 (F )有機溶劑使組成物全體爲1〇〇質量,係以5〜85 質量%爲佳。更佳爲10〜80質量%,而10〜75質量%特 別佳。若低於5質量%,作爲硬化物時,將無法得到高硬 度的硬化物,而超過8 5質量%時,則成膜性不足。 此外,反應性粒子(E )之含量意指固形成分,當反 應性粒子(E )以溶劑分散溶膠之形態被使用時,其含量 不包含溶劑的量。 本發明之硬化性組成物中,亦可視需要添加(F )有 機溶劑。 有機溶劑可舉例如甲醇、乙醇、異丙醇、丁醇、辛醇 -28- 200844127 等之醇類;丙酮、甲基乙基酮、甲基異丁基酮、環己酮等 之酮類;乙酸乙酯、乙酸丁酯、乳酸乙酯、r 一丁內酯、 丙二醇單甲基醚乙酸酯、丙二醇單乙基醚乙酸酯等之酯類 ;乙二醇單甲基醚、二乙二醇單丁基醚等之醚類;苯、甲 苯、二甲苯等之芳香族烴類;二甲基甲醯胺、二甲基乙醯 胺、n —甲基吡咯烷酮等之醯胺類等。 (F )有機溶劑 本發明之硬化性樹脂組成物中,以進一步添加有機溶 劑爲佳。藉由添加如此之有機溶劑,係可均一地形成硬化 膜。如此之有機溶劑係可舉出丙酮、甲基異丁基酮、甲基 乙基酮、環己酮、甲基戊基酮等之酮類、乙酸乙酯、乙酸 丁酯、丙二醇單甲基醚乙酸酯等之酯類、丙二醇單甲基醚 、甲醇、乙醇、S e C — 丁醇、t — 丁醇、2 —丙醇、異丙醇 等之醇類、苯、甲苯、氯苯等之芳香族類、己烷、環己烷 等之脂肪族類等,其單獨一種或或組合二種以上。此等之 中,以丙酮、甲基異丁基酮、甲基乙基酮、環己酮、甲基 戊基酮等之酮類、乙酸乙酯、乙酸丁酯、丙二醇單甲基醚 乙酸酯等之酯類、丙二醇單甲基醚、甲醇、乙醇、sec — 丁醇、t 一丁醇、2—丙醇、異丙醇等之醇類爲佳,而更佳 爲甲醇、丙二醇單甲基醚、甲基乙基酮、甲基異丁基酮之 單獨一種或組合二種以上。 關於(F )有機溶劑的添加量並無特別限制,相對於 去除有機溶劑之組成物全量1 0 0質量份而言,較佳爲1 〇 〇 -29- 200844127 〜1〇〇,〇〇〇質量份。此理由在於,添加量若低於100 份,有硬化性組成物的黏度調整困難之情形,另外, 量若超過1〇〇,〇〇〇質量份,則硬化性組成物的保存多 將會降低、或有黏度過低而難以操作的情形。 (G )氟系添加劑 本發明之硬化性組成物中因添加氟系之添加劑, 賦予防污性、指紋拭去性。成分(G )的市售品有 3 5 0SF、F-4 70、F477大曰本油墨化學工業(股)社 。氟系添加劑(G )之搭配量,當去除(F )有機溶 組成物全量爲100質量%時,以搭配0.01〜10質量 佳,0.05〜5質量%更佳,0.1〜3質量%又更佳。若 0·01質量%,無法獲得充分的效果,若超過質量 則作爲硬化物時無法得到足夠的硬度,或硬化達不到 (下層)。 (Η )其他的添加劑 本發明之硬化性組成物中,在無損本發明之效弄 可視必要適當地搭配光增感劑、聚合禁止劑、聚合赶 齊!I '勻塗劑、潤濕性改良劑、界面活性劑、可塑劑、 線吸收劑、抗氧化劑、防靜電劑、無機塡充劑、顔释 料等。 2.硬化膜•層合體 質量 添加 定性 而可 MCF- 製等 劑之 %爲 低於 %, 內部 下, 始助 紫外 、染 -30- 200844127 本發明的硬化膜或層合體係藉由使本發明之硬化性組 成物於基材上硬化而得。 基材可舉例如塑膠(聚碳酸酯、聚甲基丙烯酸酯、聚 苯乙烯、聚酯、聚烯烴、環氧、三聚氰酸、三乙酸纖維素 、ABS、AS、降冰片儲系樹脂寺)、金屬、木材、紙、玻 璃、石板等。此等基材之形狀可爲板狀、薄膜狀或3次元 成形體。 此外,可視需要於基材與硬化膜之間形成介在層。 組成物的塗佈方法係可舉出一般的塗佈方法,例如浸 漬塗佈、噴墨塗佈、流液塗佈、淋液塗佈、輥筒塗佈、旋 轉塗佈、刷毛塗佈等。此等塗佈中之塗膜的厚度,經乾燥 、硬化後通常爲0.1〜400/zm,較佳爲1〜200//m。 爲了調節塗膜的厚度,本發明之組成物係可以上述之 有機溶劑(F )稀釋後使用。例如,用爲防反射膜或被覆 材料時之黏度,通常爲0.1〜5 0,000mPa·秒/25°C,較佳爲 〇.5 〜l〇,〇〇〇mPa·秒 /25°C。 塗佈之後,較佳係於0〜2 0 0 °C使其揮發成分乾燥後 ’可藉由熱及/或輻射線進行硬化處理得到層合體。 藉由熱硬化時,較佳的硬化條件係於2 0〜1 5 0 °C、1 0 秒〜24小時之範圍內施行。藉由輻射線硬化時,係以使 用紫外線或電子線爲佳,而在該情況下,較佳的紫外線照 射光量係〇·〇1〜10j/cm2,較佳爲0.1〜2J/cm2。又,較佳 的電子線照射條件係加速電壓10〜30OkV、電子密度0.02 〜〇.30mA/cm2、電子線照射量爲1〜lOMrad。 -31 - 200844127 硬化時的熱源可使用例如電熱器、紅外線燈、熱風等 〇 又,光或電子線的線源,若是可使組成物在塗佈後短 時間內硬化者,並無特別限制。例如,紅外線的線源可舉 出照射燈、電阻加熱板、雷射等,可視光線的線源可舉出 日光、照射燈、螢光燈、雷射等,紫外線的線源可舉出水 銀照射燈、鹵素燈、雷射等。又,電子線的線源則可舉出 有市售之利用由鎢燈絲產生之熱電子的方式,或利用於金 屬上透過高電壓脈衝產生之冷陰極方式及利用藉由經離子 化之氣態分子與金屬電極之衝突產生之2次電子之2次電 子方式。又,α射線、Θ射線及r射線之線源可舉例如 c〇6()等之核分裂物質,而r射線可利用使加速電子對陽極 衝突之真空管等。此等輻射線係可以單獨1種或2種以上 同時地或間隔固定期間進行照射。 本發明之層合體用爲防反射膜時,使本發明之組成物 硬化所得之硬化膜通常可爲具有防靜電性之硬塗層之層的 功能。作爲防反射膜時,端視其必要而形成高折射率層、 中折射率層、低折射率層等。 【實施方式】 [實施例] 以下,本發明藉由實施例更具體地進行說明,但本發 明並不受限於此等之實施例。此外,以下所述之「份」、 「%」若無特別記載,則分別表示質量份、質量%。 -32- 200844127 製造例1 :具有聚合性不飽和基之有機化合物(Eb )的製 造 乾燥空氣中,對氫硫基丙基三甲氧基矽烷22 1份、二 丁基錫二月桂酸酯1份所成之溶液,以1小時於50 °C將 二異氰酸異佛爾酮222份一邊攪拌邊滴下後,於70 °C加 熱攪拌3小時。於上述溶液中,於3 0 °C下花1小時將新 中村化學製N K酯 A-TMM-3LM-N (由季戊四醇三丙烯酸 酯60質量%與季戊四醇四丙烯酸酯40質量%所組成。當 中,參與反應的只爲具有羥基之季戊四醇三丙烯酸酯) 5 49份滴下後,於60 °C經過10小時的加熱攪拌而獲得含 聚合性不飽和基之有機化合物(Ab )。以FT-IR分析生 成物中的殘存異氰酸酯量,若爲0.1 %以下,則表示反應 幾乎爲定量性地終了。生成物之紅外線吸收光譜,係原料 中氫硫基上特徵之25 5 0cm·1的吸收波峰及原料異氰酸酯 化合物上特徵之226(^1^1的吸收波峰消失,而新觀察到 胺基甲酸酯鍵結及S(C = 0)NH-基上特徵之1 660CHT1的波 峰及丙烯醯氧基上特徵之1 720(:1^1的波峰,其係表示生 成作爲聚合性不飽和基且同時具有丙烯醯氧基與-S(C = 0)NH-、胺基甲酸酯鍵結之經丙嫌醯氧基修飾之院氧 基矽烷。依上述,除了獲得773份前述式(12)或(13 ) 所示之化合物(Eb )之外,有220份與反應無關之季戊四 醇四丙烯酸酯混在其中。 -33- 200844127 製造例2 :反應性粒子分散液的調製 使製造例1中製造之組成物9.35份(含有具聚合性 不飽和基之有機化合物(Eb) 7.28份)、二氧化矽粒子 分散液(Ea)(二氧化矽濃度32%、平均粒徑10nm、日 產化學工業(股)製甲醇二氧化矽溶膠)89.90份、離子 交換水0.12份、及p—羥基苯基單甲基醚0.01份之混合 液,於60°C攪拌4小時後,添加原甲酸甲基酯1.36份, 再於同一溫度加熱攪拌1小時而得反應性粒子之分散液。 將此分散液於鋁製秤量盤秤2 g後,於1 75 °C之加熱板上 乾燥1小時進行秤量,求得固形成分含量37.8%。又,將 分散液於磁性鍋爐秤量2g後,在80 °C的加熱板上預備乾 燥30分,於75 0°C之隔焰爐中經1小時燒成後,從其無 機殘渣求得固形成分中之無機含量爲75.5%。 製造例3 :成分(A )之化合物的製造 對由甲苯二異氰酸酯5 9份及二丁基錫二月桂酸酯1 份所成之溶液,以數個小時滴入含聚醚之聚二甲基矽氧烷 (DOWCORNING TORAY (股)社製 S F 8427 ) 3 60 份, 在室溫攪拌3小時。於上述溶液中,25 t下以1小時將新 中村化學製NK酯 A-TMM-3LM-N (由季戊四醇三丙烯酸 酯60質量%與季戊四醇四丙烯酸酯40質量%所組成。當 中,參與反應的只爲具有羥基之季戊四醇三丙烯酸酯) 173份滴下後,於60 °C經過10小時的加熱攪拌獲得目的 之含聚合性不飽和基的有機化合物(A)。以FT-IR分析 -34- 200844127 生成物中的殘存異氰酸酯量,若爲0.1%以下’則表示反 應幾乎爲定量性地終了。生成物之紅外線吸收光譜,係原 料異氰酸酯化合物上特徵之2260CHT1的吸收波峰消失, 而新觀察到胺基甲酸酯鍵結及 C = ONH-基上特徵之 1 660CIXT1的波峰及丙烯醯氧基上特徵之1 720CIXT1的波峰 ,其係表示生成同時具有作爲聚合性不飽和基的丙烯醯氧 基與-C = ONH-、胺基甲酸酯鍵結之含聚醚之聚二甲基矽氧 烷。依上述,除了獲得5 22份賦予成分(A )聚合性不飽 和基之含聚醚之聚二甲基矽氧烷之外,有69份與反應無 關之季戊四醇四丙烯酸酯混在其中。 實施例1 (1 )硬化性組成物的調製 於遮蔽紫外線之附有攪拌機的容器中,以表1所示之 比例加入各成分,於室溫下攪拌1小時後得到均一的組成 物0 (2 )層合體的製作 使以上述(1 )所作成之組成物,於基材之聚碳酸酯 上藉由旋轉塗佈進行塗佈。之後,室溫下乾燥1分鐘形成 塗膜。接著,在大氣中使用高壓水銀照射燈,以 5 0 0m J/cm2之光照射條件使塗膜經紫外線硬化,製作膜厚 10//m之硬化膜,而得層合體。 -35- 200844127 實施例2〜3、參考例1〜2及比較例1〜4 其他表1中記載之搭配,係與實施例1同樣實施以調 製組成物,並獲得層合體。 評價例 就上述實施例、參考例及比較例所得之層合體,評價 下述特性,其結果列示於表1。 (1)靜電衰減率半衰期(分) 就上述實施例、參考例及比較例所作成之層合體,使 用 Static Honest Meter 、 Honest Meter Analyzer ( SHISHIDO靜電氣(股)社製)施加3kV之電壓,測定所 施加電壓變成一半之1.5kV時的時間(靜電衰減率半衰期 (分))。 (2 )水及油酸接觸角(° ) 水及油酸的接觸角,係使用固液界面解析裝竃 DROP MASTER5 00 (協和界面科學(股)社製)之自動接 觸角接觸角計,於層合體表面作成液滴,就作成5秒後, 分別測定水與層合體、油酸與層合體之界面的角度。水及 油酸的接觸角係與指紋拭去性有密切的關係,水、油酸接 觸角之値愈筒,指紋拭去性愈好。 (3 )指紋拭去性 -36- 200844127 實際上將指紋附著於層合體上,以柔軟的布拭去後’ 目測觀察指紋的痕跡。沒有痕跡爲〇、殘留若干痕跡爲Δ 、無法拭去爲X。 (4 )濕熱試驗下析出物的有無 將層合體置於8 0 °C、8 0 % RH的恆溫恆濕下’經過 1 00小時後,目測以確認油狀析出物的有無。 -37- 200844127 參考例3 1 應 1 0.30 26.06 0.69 0.94 0.56 70.95 0.50 100.00 10.00 90.00 CN Ό 60分鐘以上 ο 〇 壊 參考例2 5.95 1 1 1 18.85 篇 0.96 0.57 73.16 0.51 100.00 10.00 90.00 (N VO 60分鐘以上 〇\ 00 〇 壊 比較例1 1 1 1 1 21.67 1 1.01 0.60 76.72 1 100.00 10.00 90.00 (N VO 60分鐘以上 s 卜 , &lt;1 壊 參考例2 1 1 8.77 1 18.28 1 0.94 0.56 70.95 0.50 100.00 10.00 90.00 (N VO 60分鐘以上 (N 00 f—Η Ό 〇 參考例1 1 8.69 1 0.30 18.10 0.69 0.93 0.55 70.25 0.49 100.00 10.00 90.00 (N Ό m 00 〇 實施例4 5.83 1 1 0.23 20.24 0.52 0.95 0.56 71.67 1 100.00 10.00 90.00 CN m ON CN 〇 壊 實施例3 5.80 1 1 0.30 19.89 0.70 0.94 0.56 71.31 0.50 100.00 10.00 90.00 (N r-H 〇 〇 壊 實施例2 5.80 1 1 0.23 20.14 0.52 0.94 0.56 71.31 0.50 100.00 10.00 90.00 CN Ό 〇 § 〇 裢 實施例1 1.00 1 1 0.23 24.94 0.52 0.94 0.56 71.31 0.50 100.00 10.00 90.00 CN VO (N 〇 〇 壤 組成(質量部) SF8427-TP(SF8427 的丙烯酸酯 改性物) ADDID130 SF8427 PETA-30R中的Li化合物 DPHA PETA-30中的(C)成分 gb 卜 § 反應性粒子(YSX-91S) MCF -350SF 固形成分合計 甲醇 丙二醇單甲醚 固形成分濃度(質量%) 靜電衰減率半衰期(分鐘) 水接觸角0 油酸接觸角0 指紋拭去性 I 2 33 a 2 Μ 盤00 Μ c\ M ?s 成分 1 g g α g 龌^鲣g您 -38- 200844127 此外,表1中記載之各成分如以下所示。 SF8427:含聚醚鏈之聚二甲基矽氧烷、 DOWCORNING TORAY 製 SF8427-TP:於上述SF8427上賦予聚合性者(製造 例3 )丙烯酸改性者?(製品或製造例3 ?) ADDID130 :含聚醚鏈之聚二甲基矽氧烷、wacker C h e m i e社製 PETA-3 OR (季戊四醇三丙烯酸酯與鋰雙三氟甲硫醯 亞胺的混合物、含有3 0質量%鋰化合物、三光化學社製 );PETA-30R*所含之鋰雙三氟甲硫醯亞胺爲成分(B )、季戊四醇三丙烯酸酯爲成分(C)。 DPHA : 6官能丙烯酸酯單體、日本化藥社製 Irg.184·光聚合起始劑、Ciba Specialty Chemicals 社製It can be obtained by using a hydrolyzate with a small number of 70 °C to analyze the dry system -27-200844127. The amount of bonding of the organic compound (Eb) bonded to the oxide particles (Ea) is 100% by mass when the reactive particles (E) (total of the metal oxide particles (E a ) and the organic compound (Eb )) are 100% by mass, It is preferably 1% by mass or more, and more preferably 0.1% by mass or more, and particularly preferably 1% by mass or more. When the amount of bonding of the organic compound (Eb) bonded to the metal oxide particles (Ea) is less than 0.01% by mass, the dispersibility of the reactive particles (E) in the composition is insufficient, and the transparency of the obtained cured product is Scratch resistance will become insufficient. Further, in the production of the reactive particles (E), the ratio of the metal oxide particles (Ea) in the raw material is preferably from 5 to 99% by mass, more preferably from 10 to 98% by mass. The content of the oxide particles (Ea) constituting the reactive particles (E) is preferably 65 to 95% by mass based on the reactive particles (E). The content of the reactive particles (E) in the curable composition is preferably from 5 to 85% by mass based on the total amount of the organic solvent to be removed (F). More preferably, it is 10 to 80% by mass, and 10 to 75% by mass is particularly preferable. When the amount is less than 5% by mass, a cured product having a high hardness cannot be obtained as a cured product, and when it is more than 85 mass%, the film formability is insufficient. Further, the content of the reactive particles (E) means a solid component, and when the reactive particles (E) are used in the form of a solvent-dispersed sol, the content thereof does not include the amount of the solvent. In the curable composition of the present invention, (F) an organic solvent may be added as needed. The organic solvent may, for example, be an alcohol such as methanol, ethanol, isopropanol, butanol or octanol-28-200844127; a ketone such as acetone, methyl ethyl ketone, methyl isobutyl ketone or cyclohexanone; Ethyl acetate, butyl acetate, ethyl lactate, r-butyrolactone, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, etc.; ethylene glycol monomethyl ether, diethyl An ether such as diol monobutyl ether; an aromatic hydrocarbon such as benzene, toluene or xylene; or a guanamine such as dimethylformamide, dimethylacetamide or n-methylpyrrolidone. (F) Organic solvent In the curable resin composition of the present invention, it is preferred to further add an organic solvent. By adding such an organic solvent, a cured film can be uniformly formed. Examples of such an organic solvent include ketones such as acetone, methyl isobutyl ketone, methyl ethyl ketone, cyclohexanone, and methyl amyl ketone, ethyl acetate, butyl acetate, and propylene glycol monomethyl ether. Esters such as acetates, propylene glycol monomethyl ether, methanol, ethanol, S e C-butanol, t-butanol, 2-propanol, isopropanol, alcohols, benzene, toluene, chlorobenzene, etc. The aromatics, aliphatic groups such as hexane and cyclohexane may be used alone or in combination of two or more. Among these, ketones such as acetone, methyl isobutyl ketone, methyl ethyl ketone, cyclohexanone, methyl amyl ketone, ethyl acetate, butyl acetate, propylene glycol monomethyl ether acetate An ester such as an ester, propylene glycol monomethyl ether, methanol, ethanol, sec-butanol, t-butanol, 2-propanol, isopropanol or the like is preferred, and more preferably methanol or propylene glycol monomethyl The ether, methyl ethyl ketone, and methyl isobutyl ketone may be used alone or in combination of two or more. The amount of the (F) organic solvent to be added is not particularly limited, and is preferably 1 〇〇-29 to 200844127 〜1 相对, based on the total amount of the organic solvent-removing composition. Share. The reason is that if the amount of addition is less than 100 parts, the viscosity of the curable composition is difficult to adjust, and if the amount exceeds 1 〇〇 and the amount of 〇〇〇 is part by mass, the storage of the curable composition is lowered. Or there is a situation where the viscosity is too low and it is difficult to operate. (G) Fluorine-based additive The fluorine-based additive is added to the curable composition of the present invention to impart antifouling properties and fingerprint wiping properties. The commercial products of the component (G) are 305 SF, F-4 70, and F477 Otsuka Ink Chemical Industry Co., Ltd. The amount of the fluorine-based additive (G) is preferably 0.01 to 10 by mass, 0.05 to 5% by mass, more preferably 0.1 to 3 mass%, more preferably when the total amount of the organic solvent composition is 100% by mass. . If it is 0. 01% by mass, a sufficient effect cannot be obtained. If it exceeds the mass, sufficient hardness cannot be obtained as a cured product, or hardening cannot be achieved (lower layer). (Η) Other Additives In the curable composition of the present invention, it is necessary to appropriately mix the photosensitizer, the polymerization inhibiting agent, and the polymerization in accordance with the effect of the present invention. I 'leveling agent, wettability improvement Agent, surfactant, plasticizer, wire absorbent, antioxidant, antistatic agent, inorganic chelating agent, emollient and the like. 2. The cured film and the quality of the laminate are qualitatively added, and the % of the MCF-based agent is less than %, and the inside is under the ultraviolet, dyeing -30-200844127. The cured film or laminate system of the present invention is made by the present invention. The curable composition is obtained by hardening on a substrate. The substrate may, for example, be a plastic (polycarbonate, polymethacrylate, polystyrene, polyester, polyolefin, epoxy, cyanuric acid, cellulose triacetate, ABS, AS, norborne film storage resin temple). ), metal, wood, paper, glass, slate, etc. The shape of these substrates may be a plate shape, a film shape or a ternary molded body. Further, a meso layer may be formed between the substrate and the cured film as needed. The coating method of the composition may be a general coating method such as dipping coating, inkjet coating, flow coating, drip coating, roll coating, spin coating, brush coating, or the like. The thickness of the coating film in such coating is usually from 0.1 to 400 / zm, preferably from 1 to 200 / / m after drying and hardening. In order to adjust the thickness of the coating film, the composition of the present invention can be used after being diluted with the above organic solvent (F). For example, when used as an antireflection film or a covering material, the viscosity is usually 0.1 to 50,000 mPa·s / 25 ° C, preferably 〇.5 〜 l 〇, 〇〇〇 mPa · sec / 25 ° C. After the application, the volatile component is preferably dried at 0 to 200 ° C and then cured by heat and/or radiation to obtain a laminate. When the heat is hardened, the preferable curing conditions are carried out in the range of 20 to 150 ° C for 10 seconds to 24 hours. In the case of hardening by radiation, it is preferred to use ultraviolet rays or electron beams. In this case, the amount of ultraviolet light to be irradiated is preferably 1 to 10 j/cm 2 , preferably 0.1 to 2 J/cm 2 . Further, preferred electron beam irradiation conditions are an acceleration voltage of 10 to 30 OkV, an electron density of 0.02 to 30.30 mA/cm2, and an electron beam irradiation amount of 1 to 1 OMrad. -31 - 200844127 The heat source during hardening can be, for example, an electric heater, an infrared lamp, a hot air, or the like. A line source of light or an electron wire is not particularly limited as long as the composition can be hardened in a short time after coating. For example, the source of the infrared light may be an illumination lamp, a resistance heating plate, or a laser. The line source of visible light may be sunlight, an illumination lamp, a fluorescent lamp, or a laser. The source of the ultraviolet light may be mercury. Lights, halogen lights, lasers, etc. Further, the line source of the electron beam may be a commercially available method using a hot electron generated by a tungsten filament, or a cold cathode method in which a high voltage pulse is generated on a metal, and a gaseous molecule by ionization. The second-order electronic method of the second electron generated by the collision with the metal electrode. Further, the line source of the α-ray, the x-ray, and the r-ray may be, for example, a nuclear fission material such as c〇6(), and the r-ray may be a vacuum tube or the like which accelerates the collision of electrons with the anode. These radiation systems may be irradiated by one type or two or more types at the same time or at intervals. When the laminate of the present invention is used as an antireflection film, the cured film obtained by curing the composition of the present invention can generally function as a layer of an antistatic hard coat layer. When it is an antireflection film, a high refractive index layer, a medium refractive index layer, a low refractive index layer, etc. are formed as needed. [Embodiment] [Embodiment] Hereinafter, the present invention will be more specifically described by way of examples, but the present invention is not limited to the embodiments. In addition, the "parts" and "%" described below indicate the parts by mass and mass% unless otherwise specified. -32- 200844127 Production Example 1: Production of Organic Compound (Eb) Having Polymerizable Unsaturated Group In dry air, 22 parts of thiopropylpropyltrimethoxydecane and 1 part of dibutyltin dilaurate were formed. The solution was dropped with 222 parts of isophorone diisocyanate at 50 ° C for 1 hour, and the mixture was stirred under heating at 70 ° C for 3 hours. In the above solution, NK ester A-TMM-3LM-N (manufactured by Xinzhongcun Chemical Co., Ltd., 60% by mass of pentaerythritol triacrylate and 40% by mass of pentaerythritol tetraacrylate) was used for one hour at 30 °C. The reaction was carried out only with 5 49 parts of pentaerythritol triacrylate having a hydroxyl group, and the mixture was heated and stirred at 60 ° C for 10 hours to obtain an organic compound (Ab ) containing a polymerizable unsaturated group. When the amount of residual isocyanate in the FT-IR analysis product was 0.1% or less, the reaction was almost quantitatively terminated. The infrared absorption spectrum of the product is an absorption peak of 25 5 cm·1 on the hydrogen-sulfur group in the raw material and 226 (the absorption peak of the ^1^1 disappeared on the isocyanate compound of the raw material, and the newly observed aminocarboxylic acid is observed. The ester bond and the S (C = 0) NH- group are characterized by a peak of 1 660 CHT1 and a characteristic of 1 720 (: 1 ^ 1 ) on the acryloxy group, which is formed as a polymerizable unsaturated group and simultaneously a oxydecane having a propylene oxime group and a -S(C=0)NH-, urethane-bonded propylene oxime-modified oxime. In addition to the above, 773 parts of the above formula (12) or (13) In addition to the compound (Eb) shown, 220 parts of pentaerythritol tetraacrylate which is not related to the reaction are mixed therein. -33- 200844127 Production Example 2: Preparation of Reactive Particle Dispersion The composition produced in Production Example 1 9.35 parts (containing 7.28 parts of organic compound (Eb) having a polymerizable unsaturated group) and a cerium oxide particle dispersion (Ea) (ceria concentration: 32%, average particle diameter: 10 nm, manufactured by Nissan Chemical Industries Co., Ltd.) 89.90 parts of methanol cerium oxide sol), 0.12 parts of ion-exchanged water, and p-hydroxyphenyl group A mixture of 0.01 parts of methyl ether was stirred at 60 ° C for 4 hours, and then 1.36 parts of methyl orthoformate was added, and the mixture was heated and stirred at the same temperature for 1 hour to obtain a dispersion of reactive particles. After weighing 2 g of the weighing pan, it was dried on a hot plate at 1 75 °C for 1 hour, and the solid content was determined to be 37.8%. Further, after the dispersion was weighed 2 g in a magnetic boiler, the heating plate at 80 °C The resultant was dried for 30 minutes, and after firing in a muffle furnace at 75 ° C for 1 hour, the inorganic content in the solid component was determined to be 75.5% from the inorganic residue. Production Example 3: Compound of the component (A) A solution of 5 parts of toluene diisocyanate and 1 part of dibutyltin dilaurate was prepared, and a polyether-containing polydimethyl methoxy hydride (SF 427 manufactured by DOWCORNING TORAY Co., Ltd.) was dropped over several hours. 3 60 parts, stirred at room temperature for 3 hours. In the above solution, Xinzhongcun Chemical NK ester A-TMM-3LM-N (60% by weight of pentaerythritol triacrylate and pentaerythritol tetraacrylic acid) was added in 1 hour at 25 t. The ester is composed of 40% by mass. Among them, only the quarter with hydroxyl group is involved in the reaction. Tetrahydrin triacrylate) After dropping 173 parts, the objective polymerizable unsaturated group-containing organic compound (A) was obtained by heating and stirring at 60 ° C for 10 hours. The product was analyzed by FT-IR-34-200844127. When the amount of the residual isocyanate is 0.1% or less, the reaction is almost quantitatively terminated. The infrared absorption spectrum of the product is such that the absorption peak of the 2260 CHT1 characteristic of the raw material isocyanate compound disappears, and the urethane bond is newly observed. The peak of the 1 660CIXT1 and the peak of the 1 720CIXT1 characteristic of the acryloxy group on the C = ONH-based group, which means the formation of a propylene methoxy group as a polymerizable unsaturated group and -C = ONH- a urethane-bonded polyether-containing polydimethyloxane. According to the above, in addition to 5 22 parts of polyether-containing polydimethyl siloxane having a polymerizable unsaturated group imparting the component (A), 69 parts of the reaction-free pentaerythritol tetraacrylate were mixed therein. Example 1 (1) The curable composition was prepared by dissolving ultraviolet rays in a container equipped with a stirrer, and the components were added in the proportions shown in Table 1, and stirred at room temperature for 1 hour to obtain a uniform composition 0 (2) Production of Laminated Body The composition obtained in the above (1) was applied by spin coating on the polycarbonate of the substrate. Thereafter, it was dried at room temperature for 1 minute to form a coating film. Next, a high-pressure mercury irradiation lamp was used in the atmosphere, and the coating film was cured by ultraviolet light under a light irradiation condition of 500 mJ/cm2 to prepare a cured film having a film thickness of 10/m, thereby obtaining a laminate. -35- 200844127 Examples 2 to 3, Reference Examples 1 to 2, and Comparative Examples 1 to 4 The collocations described in the other Table 1 were carried out in the same manner as in Example 1 to prepare a composition, and a laminate was obtained. Evaluation Example The following properties were evaluated for the laminates obtained in the above examples, reference examples and comparative examples, and the results are shown in Table 1. (1) Electrostatic decay rate half-life (minutes) The laminates prepared in the above examples, reference examples, and comparative examples were subjected to a voltage of 3 kV using a Static Honest Meter and an Honest Meter Analyzer (manufactured by SHISHIDO Electrostatic Gas Co., Ltd.). The time when the applied voltage becomes half of 1.5 kV (static decay rate half-life (minutes)). (2) Water and oleic acid contact angle (°) The contact angle of water and oleic acid is an automatic contact angle contact angle meter using a solid-liquid interface analysis device DROP MASTER5 00 (Kyowa Interface Science Co., Ltd.) After the surface of the laminate was formed into droplets, the angle between the water and the laminate, and the interface between the oleic acid and the laminate was measured for 5 seconds. The contact angle of water and oleic acid is closely related to the fingerprint wiping property. The water and oleic acid contact angles are recovered, and the fingerprint wiping property is better. (3) Fingerprint wiping off -36- 200844127 Actually, the fingerprint was attached to the laminate, and the fingerprint was traced after being wiped off with a soft cloth. There are no traces of defects, some traces are Δ, and they cannot be wiped out as X. (4) The presence or absence of precipitates under the damp heat test The laminate was placed under constant temperature and humidity of 80 ° C and 80 % RH. After 100 hours, visual inspection was performed to confirm the presence or absence of oily precipitates. -37- 200844127 Reference Example 3 1 should be 1 0.30 26.06 0.69 0.94 0.56 70.95 0.50 100.00 10.00 90.00 CN Ό 60 minutes or more ο Reference example 2 5.95 1 1 1 18.85 piece 0.96 0.57 73.16 0.51 100.00 10.00 90.00 (N VO 60 minutes or more 〇\ 00 〇壊Comparative example 1 1 1 1 1 21.67 1 1.01 0.60 76.72 1 100.00 10.00 90.00 (N VO 60 minutes or more s, &lt;1 壊Reference example 2 1 1 8.77 1 18.28 1 0.94 0.56 70.95 0.50 100.00 10.00 90.00 (N VO 60 minutes or more (N 00 f - Η Ό 〇 Reference Example 1 1 8.69 1 0.30 18.10 0.69 0.93 0.55 70.25 0.49 100.00 10.00 90.00 (N Ό m 00 〇 Example 4 5.83 1 1 0.23 20.24 0.52 0.95 0.56 71.67 1 100.00 10.00 90.00 CN m ON CN 〇壊Example 3 5.80 1 1 0.30 19.89 0.70 0.94 0.56 71.31 0.50 100.00 10.00 90.00 (N rH 〇〇壊Example 2 5.80 1 1 0.23 20.14 0.52 0.94 0.56 71.31 0.50 100.00 10.00 90.00 CN Ό 〇§ 〇裢Example 1 1.00 1 1 0.23 24.94 0.52 0.94 0.56 71.31 0.50 100.00 10.00 90.00 CN VO (N 〇〇 soil composition (mass part) SF8427-TP (acrylate modified product of SF8427) ADDID130 SF8427 PET compound in PETA-30R DPHA PETA-30 (C) component gb § Reactive particles (YSX-91S) MCF-350SF Solid component total methanol propylene glycol monomethyl ether solid component concentration (% by mass) Electrostatic decay Rate half-life (minutes) Water contact angle 0 Oleic acid contact angle 0 Fingerprint wipeability I 2 33 a 2 Μ Disk 00 Μ c\ M ?s Composition 1 gg α g 龌^鲣g you-38- 200844127 In addition, Table 1 The components described in the above are as follows. SF8427: polydimethyl siloxane containing a polyether chain, SF8427-TP manufactured by DOWCORNING TORAY: a polymer modified by the above-mentioned SF8427 (manufacturing example 3). (Product or Production Example 3) ADDID130: polydimethyl siloxane containing a polyether chain, PETA-3 OR (a mixture of pentaerythritol triacrylate and lithium bistrifluoromethaneimine) manufactured by Wacker C hemie. The lithium bistrifluoromethaneimine contained in the PETA-30R* is composed of the component (B) and pentaerythritol triacrylate as the component (C). DPHA: a hexafunctional acrylate monomer, manufactured by Nippon Kayaku Co., Ltd. Irg. 184. Photopolymerization initiator, manufactured by Ciba Specialty Chemicals

Irg.907·光聚合起始劑、Ciba Specialty Chemicals 社製 反應性粒子:於製造例2製造、搭配量以固形成分量 表示。 MCF-3 5 0SF :含全氟烷基•親水性基·親油性基之寡 聚物、大日本油墨化學工業社製 [產業上利用可能性] 本發明之硬化性組成物,適合用作爲塑膠等之各種基 材表面防止損傷(擦傷)或防污染用的保護塗佈材料及防 -39· 200844127 反射膜用被覆材料。 本發明之硬化膜或層合體,因具有高硬度及耐i ,同時依其組成可形成表面光滑性優異的塗膜(被® 特徵,特別適用於:CD、DVD、MO、高密度DVD density-DVD;HD-DVD )、藍光光碟(Blu-ray disc ) 二代DVD等之記錄用光碟;塑膠光學部品、觸控适 薄膜型液晶元件、塑膠容器、建築內裝材料之地板木 壁面材料、人工大理石等之防損傷(擦傷)或防污努 保護材料;或者作爲薄膜型液晶元件、觸控面版、驾 學部品等之防反射膜等。 傷性 )之 high 等之 版、 料、 用的 膠光 -40-Irg. 907, a photopolymerization initiator, and a reactive particle manufactured by Ciba Specialty Chemicals Co., Ltd., were produced in Production Example 2, and the amount of the compound was expressed as a solid component. MCF-3 5 0SF: an oligomer containing a perfluoroalkyl group, a hydrophilic group, and a lipophilic group, manufactured by Dainippon Ink and Chemicals Co., Ltd. [Industrial Applicability] The curable composition of the present invention is suitable for use as a plastic Protective coating materials for preventing damage (scratching) or anti-contamination of various substrate surfaces, and coating materials for reflective films. The cured film or laminate of the present invention has high hardness and resistance to i, and at the same time, it can form a coating film excellent in surface smoothness (as a feature of the ®, particularly suitable for: CD, DVD, MO, high density DVD density- DVD; HD-DVD), Blu-ray disc, recording disc for second-generation DVD, plastic optical parts, touch-sensitive film type liquid crystal elements, plastic containers, floor wood wall materials for building interior materials, artificial Anti-damage (scratch) or anti-fouling protective material for marble, etc.; or anti-reflection film for thin film type liquid crystal elements, touch panel, driving school parts, etc. Injury) high, etc. version, material, used glue -40-

Claims (1)

200844127 十、申請專利範圍 1 · 一種硬化性組成物,其係含有下述成分(A )〜( D ): (A )含有聚合性不飽和基、以下述式(1 a )所示之 重複單位及以下述式(1 b )所示之重複單位之聚合物、 (B )以下述式(3 a )或(3 b )所示之化合物、 (C) 前述成分(A)以外之分子內具有2個以上之聚 合性不飽和基的化合物、 (D) 光聚合起始劑; [化1] *—-CpH2pO-一* (1a) 「?H3 1 L CH3」 [式(la)及(lb)中,P 爲 1〜10。] LiCn,F2n,+ 1X (3a) Li(Cn,F2n,+ 1 Y)2N (3b) [式(3a)及(3b)中,X表示C02或S03、Y表示 CO或S02、n,表示1〜9之整數]。 2.如申請專利範圍第1項之硬化性組成物,其中, 前述成分(A )所具有之聚合性不飽和基係(甲基)丙烯 醯基。 3 .如申請專利範圍第1或2項之硬化性組成物,其 中,前述成分(A)更含有胺基甲酸酯基。 -41 - 200844127 4.如申請專利範圍第1〜3項中任1項之硬化性組成 物,其係進一步含有下述成分(E): (E )具有聚合性不飽和基,且以選自矽、鋁、鉻、 鈦、鋅、鍺、銦、錫、銻及鈽所成群之至少一個元素之氧 化物爲主成分之粒子。 5 .如申請專利範圍第4項之硬化性組成物,其中, 前述成分(E)所具有之聚合性不飽和基係含有以下述式 (4 )所示構造之基; [化2] —U—C—N— ⑷ II V [式(4)中,U表示ΝΗ、0(氧原子)或s(硫原子 ),V表示Ο或S]。 6. 一種硬化膜,其係使如申請專利範圍第1〜5項中 任1項之硬化性組成物硬化而成。 7. 一種層合體,其係於基材上具有如申請專利範圍 第6項之硬化膜。 -42- 200844127 七、指定代表圖: (一) 、本案指定代表圖為:無 (二) 、本代表圖之元件代表符號簡單說明:無 八、本案若有化學式時,請揭示最能顯示發明特徵的化學 式:無200844127 X. Patent Application No. 1 A curable composition containing the following components (A) to (D): (A) a repeating unit having a polymerizable unsaturated group represented by the following formula (1a) And a polymer having a repeating unit represented by the following formula (1 b ), (B) a compound represented by the following formula (3 a ) or (3 b ), and (C) having a molecule other than the above component (A); Two or more polymerizable unsaturated group compounds, (D) photopolymerization initiator; [Chemical Formula 1] *--CpH2pO-一* (1a) "?H3 1 L CH3" [Formula (la) and (lb In the case, P is 1 to 10. LiCn, F2n, + 1X (3a) Li(Cn, F2n, + 1 Y)2N (3b) [In the formulas (3a) and (3b), X represents CO 2 or S03, and Y represents CO or S02, n, indicating An integer from 1 to 9]. 2. The curable composition according to the first aspect of the invention, wherein the component (A) has a polymerizable unsaturated group (meth) propylene group. 3. The curable composition according to claim 1 or 2, wherein the component (A) further contains a urethane group. The curable composition according to any one of items 1 to 3, further comprising the following component (E): (E) having a polymerizable unsaturated group and selected from the group consisting of An oxide containing at least one element of a group of strontium, aluminum, chromium, titanium, zinc, bismuth, indium, tin, antimony, and bismuth as a main component. 5. The sclerosing composition of the fourth aspect of the invention, wherein the polymerizable unsaturated group of the component (E) has a group having a structure represented by the following formula (4); [Chem. 2] - U —C—N— (4) II V [In the formula (4), U represents ΝΗ, 0 (oxygen atom) or s (sulfur atom), and V represents Ο or S]. A cured film obtained by curing a curable composition according to any one of claims 1 to 5 of the patent application. A laminate comprising a cured film as claimed in claim 6 on a substrate. -42- 200844127 VII. Designated representative map: (1) The representative representative of the case is: No (2), the representative symbol of the representative figure is a simple description: No. 8. If there is a chemical formula in this case, please reveal the best display invention. Chemical formula of the feature: none
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