TW200843078A - Chip stacked package structure and applications thereof - Google Patents
Chip stacked package structure and applications thereof Download PDFInfo
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- TW200843078A TW200843078A TW96115393A TW96115393A TW200843078A TW 200843078 A TW200843078 A TW 200843078A TW 96115393 A TW96115393 A TW 96115393A TW 96115393 A TW96115393 A TW 96115393A TW 200843078 A TW200843078 A TW 200843078A
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- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/06—Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
- H01L2224/061—Disposition
- H01L2224/0612—Layout
- H01L2224/0613—Square or rectangular array
- H01L2224/06134—Square or rectangular array covering only portions of the surface to be connected
- H01L2224/06135—Covering only the peripheral area of the surface to be connected, i.e. peripheral arrangements
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- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/06—Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
- H01L2224/061—Disposition
- H01L2224/0612—Layout
- H01L2224/0613—Square or rectangular array
- H01L2224/06134—Square or rectangular array covering only portions of the surface to be connected
- H01L2224/06136—Covering only the central area of the surface to be connected, i.e. central arrangements
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- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32135—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/32145—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
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- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/4824—Connecting between the body and an opposite side of the item with respect to the body
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- H01L2224/732—Location after the connecting process
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- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
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- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
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- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
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Abstract
Description
200843078 九、發明說明: 【發明所屬之技術領域】 本發明是㈣於-種半導體封裝結構,且特別是有關於 一種堆疊封裝結構。 【先前技術】 隨著電子產品功能與應用之需求的急遽増加,封裝技術 亦朝著高密度微小化、單晶片封裝到多晶片封裝、二維尺产 到三維尺度的方向發展。其中系統化封裝技術(s:em二 Package)係一種可整合不同電路功能晶片的較佳方法,利用 表面黏著(Surface Mount Technology; SMT)製程將不同的晶 片堆疊整合於同一基板上,藉以有效縮減封裝面積。具有體 積小、高頻、高速、生產週期短與低成本之優點。 請參照第4圖’帛4圖係根據一習知的晶片堆疊封裝結 構400所繪示的結構剖面圖。晶片堆疊封裝結構4〇〇包括基 板410、第-晶片420、第二晶片43〇以及複數條打線44土〇 和彻。其中第一晶片420固設於基材上,並藉由打線 440與基材41〇電性連接。第二晶片43〇堆疊於第一晶片42〇 上,且藉由打線450與基板410電性連接。 然而,由於疊設於上層的晶片,例如第二晶片43〇,必 須遷就下層晶片(第一晶片42〇)的打線(打線44〇)配置,因此 上層晶片(第二晶片430)尺寸必須小於下層晶片。因此也限制 了晶片堆疊的數量與彈性。又因為上層晶片的尺寸較小,必 須延長打450的配線長度並擴大其線弧,方能使其與基材41〇 200843078 電性連接。當後續進行壓模製程時,該些被延長的打線容易 受到沖移,而出現短路的現象,影響製程良率。 哨參照弟5圖,弟5圖係根據另一種晶片堆疊封裝結構 500所繪示的結構剖面圖。晶片堆疊封裝結構5〇〇包括基板 510、第一晶片520、第二晶片530、複數條打線540和550200843078 IX. Description of the Invention: [Technical Field] The present invention is (iv) a semiconductor package structure, and particularly relates to a stacked package structure. [Prior Art] With the rapid increase in the demand for electronic product functions and applications, packaging technology is also moving toward high-density miniaturization, single-chip packaging to multi-chip packaging, and two-dimensional scale production to three-dimensional scale. The systemized packaging technology (s:em two package) is a preferred method for integrating different circuit function chips, and the surface mount technology (SMT) process is used to integrate different wafer stacks on the same substrate, thereby effectively reducing the number of wafers. Package area. It has the advantages of small volume, high frequency, high speed, short production cycle and low cost. 4 is a cross-sectional view of a structure according to a conventional wafer stack package structure 400. The wafer stack package structure 4 includes a substrate 410, a first wafer 420, a second wafer 43A, and a plurality of wires 44. The first wafer 420 is fixed on the substrate and electrically connected to the substrate 41 by wire bonding 440. The second wafer 43 is stacked on the first wafer 42A and electrically connected to the substrate 410 by the bonding wires 450. However, since the wafer stacked on the upper layer, for example, the second wafer 43A, the wire bonding (wire bonding 44〇) configuration of the lower wafer (first wafer 42A) must be moved, so that the upper wafer (second wafer 430) must be smaller in size than the lower layer. Wafer. This also limits the number and flexibility of the wafer stack. Moreover, because the size of the upper layer wafer is small, it is necessary to extend the wiring length of the 450 and expand the line arc to electrically connect it to the substrate 41〇200843078. When the subsequent molding process is performed, the extended wire is easily subjected to the displacement, and a short circuit occurs, which affects the process yield. The whistle is shown in Figure 5, which is a cross-sectional view of the structure depicted in another wafer stack package structure 500. The wafer stack package structure 5 includes a substrate 510, a first wafer 520, a second wafer 530, and a plurality of wires 540 and 550.
以及位於第一晶片52〇和第二晶片53〇之間的虛擬晶片 560。其中第一晶片520疊設於基板51〇上,並藉由打線54〇 使第一銲墊570與基材510電性連接;虛擬晶片56〇疊設於第 一晶片520上;第二晶片則疊設於虛擬晶片56〇上,並藉由打 2 550使第二銲墊·與歸51〇 f性連接。藉自尺寸小於 第:晶片520的虛擬晶片56〇的設置,不僅可在第一晶片似 和第一晶片53G之間’提供足夠的佈線空間與線弧高度,以 53〇)^^4 尺寸。因此第二晶片53〇之尺寸實質等於第一晶片別之尺 然而虛擬晶片的設置,不僅會增加晶片堆疊的厚度,且 徒增製程成本,更限制了裝結構微小化與高密度的趨勢。 因此有需要提供一錄g、套一 種良率向、製程低廉且不會限制封裝 密度的晶片堆疊㈣結構。 【發明内容】 本發明的一目的在提供一 材、第—晶片、圖㈣線路層、封裝結構包括··基 中該基材具有第-表面與相=二日片以及封膠樹脂。其 弟一表面,且第一晶片位於 200843078 f材,第-表面,第一晶片具有第一主動面與相對的第一晶 月第一主動面係面對基材,並與基材以覆晶接合方式電性 連接。圖案化線路層形纽晶背上,並藉由至少_條打線與 基材電性連結。第二晶片位於圖案化線路層上,具有第二主 2面以及配置於第二主動面上的至少一個第二銲墊,其中此 第二銲墊與圖案化線路層電性連接,再經由打線與基材電性 祕。封膠樹脂則填充於基材、第__晶片、圖案化線路層及 弟二晶片之上,最後再於基材的第二表面形成複數個外部端 子’較佳的’該些外部端子例如是錫球,並藉由該些外部端 子以電性連接至其他外部電路。 本發明的又-目的在提供一種晶片堆疊封裝結構的製 ,方法’包括下述步驟:首先提供—基材,其中該基材具有 第-表面與相對的第二表面,於基材之第一表面配置第一晶 片’使第-晶片面對基材的第—主動面與基材以覆晶方式電 性連接。接著,於第一晶片相對於第一主動面的第一晶背上 形成-圖案化線路層’使圖案化線路層包括至少—條導線, 用來與欲堆疊於圖案化線路層上方的第二晶片之至少一個 第二銲墊電性匹配。形成至少—條打線,藉以電性連結圖案 化線路層與基材。再於圖案化線路層上配置第二晶片,並使 第二銲墊電性連接至導線,再經由打線與基材電性連接。使 用封膠體來封裝基材m圖案化線路層及第二晶 片’取後再於基材的第二表面形成複數個外部端子,較佳 的,該些外部端子例如是錫球,並藉由該些外部端子以電性 連接至其他外部電路。 200843078 根據以上所述之實施例,本發明的技術特徵係在覆晶堆 璺的下層晶片之晶背上,形成一個圖案化線路層,使圖案化 線路層的佈線和後續堆疊於其上的上層晶片之銲墊電性匹 配。接著,再將上層晶片覆晶堆疊於圖案化線路層上。藉由 圖案化線路層的佈線,將上層晶片之銲墊的打線位置重新分 配,使其分散至上層晶片的邊緣,再藉由打線使圖案化線路 層與基材電性連接。藉此,解決習知技術中,電性連接上層 晶片與基材之打線配線長度過長以及線弧過大的問題。 因此,藉由本發明所提供的技術優勢,可以解決習知晶 片堆璺封裝結構良率封及封裝密度不高的問題。 【實施方式】 為讓本發明上述和其他目的、特徵、優點與實施例能更 明顯易懂,特提供數種晶片堆疊封裝結構作為較佳實施例來 進一步說明。 清參照第1圖,第1圖係根據本發明的第一較佳實施例 所繪示之晶片堆疊封裝結構! 〇〇的剖面示意圖。 曰曰片堆豐封裝結構1 〇〇包括··基材^ 〇 1第一晶片1 〇2、 圖案化線路層105第二晶片107以及封膠樹脂12〇。 首先提供一基材1〇1,基材101具有第一表面116以及 相對於第-表面116的第二表面117。另外,基材第二表面 具多個外部連接端子U1。在本發明的較佳實施例之中,基 材101係由導線架(Lead Frame)、印刷電路板(printing drcuit Board)或晶粒承載器(Carrier)所構成。而在本實施例之中,基 200843078 材101係一印刷電路板,其材質例如是BT或者是FR4電路 板或者是其讀性電路板。 $者疋刚電路 116 =將第—晶"1 102覆晶接合於基材101之第一表面And a dummy wafer 560 between the first wafer 52A and the second wafer 53A. The first wafer 520 is stacked on the substrate 51, and the first pad 570 is electrically connected to the substrate 510 by wire bonding 54; the dummy wafer 56 is stacked on the first wafer 520; the second wafer is The dummy pad 56 is stacked on the dummy wafer 56, and the second pad is connected to the second pad by the 2 550. By the arrangement of the dummy wafer 56A having a size smaller than that of the wafer 520, it is possible to provide not only a sufficient wiring space and a line arc height between the first wafer and the first wafer 53G, but also a size of 53 〇). Therefore, the size of the second wafer 53 is substantially equal to the size of the first wafer. However, the arrangement of the dummy wafer not only increases the thickness of the wafer stack, but also increases the manufacturing cost, and further limits the trend of miniaturization and high density of the package. Therefore, there is a need to provide a wafer stack (four) structure that records g, sets a yield, and has a low process and does not limit the package density. SUMMARY OF THE INVENTION An object of the present invention is to provide a material, a first wafer, a (4) wiring layer, and a package structure including a first surface and a phase = two-day sheet and a sealant resin. a first surface of the first wafer, and the first wafer is located at the first surface of the substrate, and the first wafer has a first active surface and an opposite first crystal first active surface facing the substrate, and is covered with the substrate. The bonding method is electrically connected. The patterned circuit is layered on the back of the button and electrically connected to the substrate by at least _ lines. The second wafer is located on the patterned circuit layer, and has a second main surface and at least one second soldering surface disposed on the second active surface, wherein the second soldering pad is electrically connected to the patterned circuit layer, and then It is electrically secreted with the substrate. The sealant resin is filled on the substrate, the __ wafer, the patterned circuit layer and the second wafer, and finally a plurality of external terminals are formed on the second surface of the substrate. Preferably, the external terminals are, for example, The solder balls are electrically connected to other external circuits by the external terminals. Still another object of the present invention is to provide a wafer stack package structure, the method comprising the steps of: first providing a substrate, wherein the substrate has a first surface and an opposite second surface, the first of the substrates The first wafer is disposed on the surface to electrically connect the first active surface of the first wafer facing the substrate to the substrate in a flip chip manner. Then, a patterned circuit layer is formed on the first crystal back of the first wafer with respect to the first active surface, so that the patterned circuit layer includes at least one wire for the second layer to be stacked above the patterned circuit layer. At least one second pad of the wafer is electrically matched. At least a strip line is formed to electrically connect the patterned wiring layer and the substrate. A second wafer is disposed on the patterned circuit layer, and the second pad is electrically connected to the wire, and then electrically connected to the substrate via the wire. The encapsulant is used to encapsulate the substrate m. The patterned circuit layer and the second wafer are formed, and then a plurality of external terminals are formed on the second surface of the substrate. Preferably, the external terminals are, for example, solder balls. The external terminals are electrically connected to other external circuits. According to the embodiment described above, the technical feature of the present invention is to form a patterned circuit layer on the crystal back of the underlying wafer of the flip chip stack, so that the wiring of the patterned circuit layer and the upper layer stacked thereon are subsequently formed. The pads of the wafer are electrically matched. Then, the upper layer wafer is flip-chip stacked on the patterned circuit layer. By patterning the wiring of the wiring layer, the bonding positions of the pads of the upper wafer are redistributed to be dispersed to the edge of the upper wafer, and the patterned wiring layer is electrically connected to the substrate by wire bonding. Thereby, in the prior art, the problem that the length of the wire bonding wire of the upper layer wafer and the substrate is electrically connected and the wire arc is excessively large is solved. Therefore, the technical advantages provided by the present invention can solve the problem that the conventional wafer stacking structure has a high yield seal and a low package density. [Embodiment] The above and other objects, features, advantages and embodiments of the present invention will become more apparent. Referring to Fig. 1, a first embodiment is a wafer stack package structure according to a first preferred embodiment of the present invention! Schematic diagram of the 〇〇. The cymbal stacking package structure 1 includes a substrate 1 第一 1 , a first wafer 1 , a patterned wiring layer 105 , a second wafer 107 , and a sealant resin 12 . First, a substrate 1 is provided, and the substrate 101 has a first surface 116 and a second surface 117 with respect to the first surface 116. Further, the second surface of the substrate has a plurality of external connection terminals U1. In a preferred embodiment of the invention, the substrate 101 is comprised of a lead frame, a printing drucit board, or a die carrier. In the present embodiment, the base material 200843078 is a printed circuit board made of, for example, a BT or FR4 circuit board or a read circuit board. $ 疋 电路 circuit 116 = the first crystal of the crystal - 1102 is bonded to the first surface of the substrate 101
二二晶片102面對基材101的第-主動面103與基材 電性連接。在本實施例之中,第一晶片102另具有血第 -主動請相對的第一晶背104,且第一主動面103具有 複數個第銲塾115,並藉由多個凸塊113,將這些第-銲塾 15 /、基材101電性連接。另外’在將第一晶片逝覆晶接 口於基材ιοί上之後,,更包括使用一底膠將凸塊⑴ 包覆,並藉以將第一主動sl〇3固定於基材ι〇ι第一表面Μ 上0 接著,於第一晶片102的晶背104上形成一圖案化線路 層105並藉由至少一條打線1〇6使圖案化線路層^仍與基 材101電性連結。其中圖案化線路層1〇5係一重佈線路層 (Redistribution-Layer,RDL)。且圖案化線路層1〇5包括複數 條導線,例如導線1〇5&和105b,且每一條導線(例如導線l〇5a) 之一端,係設計用來與即將疊設於圖案化線路層105上的第 二晶片107中的一個第二銲墊109電性匹配,另一端則往第 一晶背104之其他位置延伸,例如往第一晶背1〇4的邊緣延 伸0 然後,將第二晶片107以覆晶接合方式電性連接於圖案 化線路層105。第二晶片107具有第二主動面108以及配置 於第二主動面108上的第二銲墊1〇9,其中每一個第二銲塾 109係藉由鍚球或導電凸塊11〇,與圖案化線路層1〇5的導線 200843078 105a或105b電性連接。在里#杏始办丨々a „ ^ 牧…他戶、苑例之中,圖案化線路層 105可以配合不同晶片的銲墊配置改變配線圖案。 第二晶片1G7的至少-個第二銲墊刚會與圖案化線路 層105的其中一條導線,例如導線1〇化或祕匹配,因此 當具有與第一晶片102相同尺寸的第二晶片107與第一晶片 H)2相互堆疊時,圖案化線路層1()5的導線可以將原來靠近 第二晶片107中心的第二銲塾1〇9重新分配,使其分散至第The second wafer 102 is electrically connected to the substrate by the first active surface 103 facing the substrate 101. In the embodiment, the first wafer 102 further has a blood-first active opposite first crystal back 104, and the first active surface 103 has a plurality of solder pads 115, and by a plurality of bumps 113, These first bead 15 / / substrate 101 are electrically connected. In addition, after the first wafer is overlaid on the substrate ιοί, it further includes coating the bump (1) with a primer, and thereby fixing the first active sl〇3 to the substrate ι〇ι first Surface Μ0 Next, a patterned wiring layer 105 is formed on the crystal back 104 of the first wafer 102, and the patterned wiring layer is still electrically connected to the substrate 101 by at least one bonding wire 1〇6. The patterned circuit layer 1〇5 is a Redistribution-Layer (RDL). And the patterned circuit layer 1〇5 includes a plurality of wires, such as wires 1〇5& and 105b, and one end of each wire (for example, wire l〇5a) is designed to be stacked on the patterned circuit layer 105. One of the second pads 107 of the second wafer 107 is electrically matched, and the other end extends to other positions of the first crystal back 104, for example, to the edge of the first crystal back 1〇4, and then the second The wafer 107 is electrically connected to the patterned wiring layer 105 by flip chip bonding. The second wafer 107 has a second active surface 108 and a second bonding pad 1〇9 disposed on the second active surface 108, wherein each of the second bonding pads 109 is formed by a ball or a conductive bump 11 The wires 200843078 105a or 105b of the circuit layer 1〇5 are electrically connected. In the #杏杏办丨々 a „ ^ 牧 ... in his household, court example, the patterned circuit layer 105 can be used to match the wiring pattern of different wafers to change the wiring pattern. At least one second pad of the second wafer 1G7 Just one of the wires of the patterned wiring layer 105, such as the wire 1, may be fused or secreted, so when the second wafer 107 having the same size as the first wafer 102 and the first wafer H) 2 are stacked on each other, patterning The wire of the circuit layer 1 () 5 can redistribute the second pad 1 〇 9 which is originally close to the center of the second wafer 107 to be dispersed to the
二晶片107的其他位置,例如分散至第二晶^们的邊緣, 再經由打線106使第二銲墊109與基材1〇1電性連結。之後, 使用封膠樹脂12〇來封裝基材1〇1、第一晶片1〇2、圖案化 線路層—105及第二晶片107,使封膠樹脂12〇填充於基材 101、第一晶片102、圖案化線路層1〇5及第二晶片1〇7之間。 最後再於基材的第二表面117形成複數個外部端子ιη,這 些外部端子較佳可以是,例如錫球。藉由這些外部端子Hi, 晶片堆疊封裝結構100可以電性連接至其他外部電路。 明參α第2圖,苐2圖係根據本發明的第二較佳實施例 所繪示之晶片堆疊封裝結構2〇〇的剖面示意圖。 晶片堆疊封裝結構2〇〇包括:基材2〇1 、第一晶片 2〇2 、圖案化線路層2〇5、第二晶片2〇,封膠樹脂22〇。 首先提供一基材201,基材201具有第一表面218以及 相對於第一表面218的第二表面219。在本發明的較佳實施 例之中,基# 201較佳係由導線架、印刷電路板或晶粒承載 器所構成。而在本實施例之中,基材2〇1係一晶粒承載器, 其材質例如是ΒΤ或者是FR4電路板或者是其他軟性電路板。 200843078 接著在基材201上形成一個貫穿開口 217。再將第一晶 片202覆晶接合於基材201之第一表面218,使第一晶片202 面對基材201的第一主動面203與基材201電性連接。在本 實施例中,第一晶片202另具與第一主動面203相對的第一 晶背204,且第一主動面203具有複數個第一銲墊215,而 這些第一銲墊215則藉由複數個凸塊213固著並電性連接於 基材201的第一表面218。另外,在本發明的較佳實施例之 中,晶片堆疊封裝結構200還包括一底膠214將複數個凸塊 213包覆,並藉以將第一晶片202之第一主動面203固定於 基材201的第一表面218。 由於基材201具有一貫穿開口 217,因此其中一部分的 第一主動面203,會藉由基材201的貫穿開口 217暴露出來。 在本發明的較佳實施例之中,更包括在第一主動面203上形 成一個散熱鰭片216,使其並經由該貫穿開口 217向外延伸, 藉此增加晶片堆疊封裝結構200的散熱效果。 然後,於第一晶片202的第一晶背204上形成一圖案化 線路層205,並藉由至少一條打線206與基材201電性連結, 其中圖案化線路層205係一重佈線路層,且圖案化線路層205 包括複數條導線,例如導線205a和205b,且每一條導線(例 如導線205a)之一端,係設計用來與即將疊設於圖案化線路 層205上的第二晶片207其中的一個銲墊209電性匹配,另 一端則往第一晶背204之其他位置延伸,例如往第一晶背204 的邊緣延伸。 再將第二晶片207以覆晶接合方式電性連接於圖案化線 11 200843078 路層205。第二晶片207具有第二主動面208以及配置於第 二主動面208上的第二銲墊209,其中至少一個第二銲墊209 係藉由錫球或導電凸塊210與圖案化線路層205的導線205a 或205b電性連接。在其他實施例之中,圖案化線路層205 可以配合不同晶片的銲墊配置改變配線圖案。之後,使用封 膠樹脂220來封裝基材201、第一晶片202、圖案化線路層 205及第二晶片207,使封膠樹脂220填充於基材201、第一 晶片202、圖案化線路層205及第二晶片207之間。最後再 於基材201的第二表面219形成複數個外部端子211。的, 這些外部端子211較佳可以是,例如錫球。藉由這些外部端 子211,晶片堆疊封裝結構200可以電性連接至其他外部電 路。 由於第二晶片207的至少一個第二銲墊209會與圖案化 線路層205的其中一條導線,例如導線205a或205b電性匹 配,因此當具有與第一晶片202相同尺寸的第二晶片207與 第一晶片202相互堆疊時,圖案化線路層205的導線可以將 原來靠近第二晶片207中心的第二銲墊209重新佈線,使其 分散至第二晶片207的其他位置,例如分散至第二晶片207 的邊緣,再經由打線206使第二銲墊209與基材201電性連 结0 、、、口 請參照第3圖,第3圖係根據本發明的第三較佳實施例 所繪示之晶片堆疊封裝結構300的剖面示意圖。 晶片堆疊封裝結構300,括:基材301 、第一晶片302 、 圖案化線路層305第二晶片307以及封膠樹脂320。 12 200843078 首先提供基材301,該基材具有第一表面316以及相對 第一表面316的第二表面319。在本發明的較佳實施例之中, 基材301較佳係由導線架、印刷電路板或晶粒承載器所構 成。而在本實施例之中,基材3〇1係一晶粒承載器,其材質 例如疋BT或者是FR4電路板或者是其他軟性電路板。 接著在基材301上形成一個貫穿開口 317。再將第一晶 片302覆晶接合於基材3〇1的第一表面316,使第一晶片The other positions of the two wafers 107 are, for example, dispersed to the edges of the second crystal, and the second pads 109 are electrically connected to the substrate 1〇1 via the bonding wires 106. Thereafter, the substrate 1〇1, the first wafer 1〇2, the patterned wiring layer 105, and the second wafer 107 are packaged using a sealing resin 12〇, and the sealing resin 12〇 is filled on the substrate 101 and the first wafer. 102. Between the patterned circuit layer 1〇5 and the second wafer 1〇7. Finally, a plurality of external terminals ι are formed on the second surface 117 of the substrate, and the external terminals may preferably be, for example, solder balls. With these external terminals Hi, the wafer stack package structure 100 can be electrically connected to other external circuits. Fig. 2 is a cross-sectional view showing a wafer stack package structure 2'' according to a second preferred embodiment of the present invention. The wafer stack package structure 2 includes a substrate 2〇1, a first wafer 2〇2, a patterned wiring layer 2〇5, a second wafer 2〇, and a sealant resin 22〇. A substrate 201 is first provided having a first surface 218 and a second surface 219 opposite the first surface 218. In a preferred embodiment of the invention, base #201 is preferably constructed of a leadframe, printed circuit board or die carrier. In the present embodiment, the substrate 2〇1 is a die carrier, and the material thereof is, for example, a crucible or an FR4 circuit board or other flexible circuit board. 200843078 Next, a through opening 217 is formed in the substrate 201. The first wafer 202 is then flip-chip bonded to the first surface 218 of the substrate 201, so that the first active surface 203 of the first wafer 202 facing the substrate 201 is electrically connected to the substrate 201. In this embodiment, the first wafer 202 has a first crystal back 204 opposite to the first active surface 203, and the first active surface 203 has a plurality of first pads 215, and the first pads 215 are borrowed. The plurality of bumps 213 are fixed and electrically connected to the first surface 218 of the substrate 201. In addition, in the preferred embodiment of the present invention, the wafer stack package structure 200 further includes a primer 214 for covering the plurality of bumps 213, thereby fixing the first active surface 203 of the first wafer 202 to the substrate. The first surface 218 of 201. Since the substrate 201 has a through opening 217, a portion of the first active surface 203 is exposed through the through opening 217 of the substrate 201. In a preferred embodiment of the present invention, a heat dissipation fin 216 is formed on the first active surface 203 to extend outward through the through opening 217, thereby increasing the heat dissipation effect of the wafer stack package structure 200. . Then, a patterned circuit layer 205 is formed on the first crystal back 204 of the first wafer 202, and is electrically connected to the substrate 201 by at least one wire 206, wherein the patterned circuit layer 205 is a redistributed circuit layer, and The patterned wiring layer 205 includes a plurality of wires, such as wires 205a and 205b, and one end of each wire (e.g., wire 205a) is designed to be used in a second wafer 207 to be stacked on the patterned wiring layer 205. One of the pads 209 is electrically matched, and the other end extends to other locations of the first crystal back 204, for example, to the edge of the first crystal back 204. The second wafer 207 is electrically connected to the patterned layer 11 200843078 via layer 205 in a flip chip bonding manner. The second wafer 207 has a second active surface 208 and a second bonding pad 209 disposed on the second active surface 208. The at least one second bonding pad 209 is formed by solder balls or conductive bumps 210 and the patterned wiring layer 205. The wires 205a or 205b are electrically connected. In other embodiments, the patterned wiring layer 205 can change the wiring pattern in conjunction with the pad configuration of the different wafers. Thereafter, the substrate 201, the first wafer 202, the patterned wiring layer 205, and the second wafer 207 are encapsulated using the encapsulating resin 220, and the encapsulating resin 220 is filled in the substrate 201, the first wafer 202, and the patterned wiring layer 205. And between the second wafer 207. Finally, a plurality of external terminals 211 are formed on the second surface 219 of the substrate 201. These external terminals 211 may preferably be, for example, solder balls. With these external terminals 211, the wafer stack package structure 200 can be electrically connected to other external circuits. Since at least one second pad 209 of the second wafer 207 is electrically matched with one of the wires of the patterned wiring layer 205, such as the wires 205a or 205b, when the second wafer 207 having the same size as the first wafer 202 is When the first wafers 202 are stacked on each other, the wires of the patterned wiring layer 205 can reroute the second pads 209 originally adjacent to the center of the second wafer 207 to be dispersed to other locations of the second wafer 207, for example, to the second. The second pad 209 and the substrate 201 are electrically connected to each other via the wire 206, and the port is electrically connected to the substrate 201. Referring to FIG. 3, the third drawing is drawn according to the third preferred embodiment of the present invention. A cross-sectional view of the wafer stack package structure 300 is shown. The wafer stack package structure 300 includes a substrate 301, a first wafer 302, a patterned wiring layer 305, a second wafer 307, and a sealant resin 320. 12 200843078 A substrate 301 is first provided having a first surface 316 and a second surface 319 opposite the first surface 316. In a preferred embodiment of the invention, substrate 301 is preferably constructed of a leadframe, printed circuit board or die carrier. In the present embodiment, the substrate 3〇1 is a die carrier, such as a 疋BT or FR4 circuit board or other flexible circuit board. A through opening 317 is then formed on the substrate 301. The first wafer 302 is then flip-chip bonded to the first surface 316 of the substrate 3〇1 to make the first wafer.
面對基材301的第一主動面3〇3與基材3〇1電性連接。在本 實施例中,第-晶片302另具有與第_主動面3()3相對的第 :晶背304,且一部分的第一主動面3〇3會藉由基材3〇ι的 貝穿開口 317暴露出來。第—晶片3〇2具有複數個第一鲜塾 315,位於第-主動面則由貫穿開〇爪暴露出來的區域 中。而這些第一鲜㈣5則藉由穿過貫穿開口 317的打線318 與基材301電性連接。 然後,於第一晶片302的第—晶背3〇4上形成一圖案化 線路層305’並藉由至少一條打線3〇6與基材3〇1電性連結。 其中圖案化線路層305係-重佈線路層。且圖案化線路層3〇5 包括複數條導線,例如導線3G5a和·,且每—條導線(例 如導線奶a)之-端係設判來與即㈣設於圖案化線路層 305上的第二晶片307中的-個第二銲墊_電性匹配,另 -端則往第-晶背綱之其他位置延伸,例如往第一晶背3〇4 的邊緣延伸。 再將第二晶 路層305。第二 片307以覆晶接合方式電性連接於圖案化線 3曰曰片307具有第二主動面308以及配置於第 13 200843078 一主動面308上的第二銲墊309,其中至少一個第二銲墊 係藉由錫球或導電凸塊310與圖案化線路層3〇5的導線3〇5a 或3〇5b電性連接。在其他實施例之中,圖案化線路層305 T以配a不同晶片的銲墊配置改變配線圖案。之後,使用封 膠树知320來封裝基材3〇1、第一晶片302、圖案化線路層 305及第一晶片307,使封膠樹脂320填充於基材3〇1、第一 曰曰片302、圖案化線路層305及第二晶片3〇7之間。最後再 於基材301的第二表面319形成複數個外部端子3ΐι,這些 卜。F %子311較仏可以市,例如錫球。藉由這些外部端子 311 b曰片堆璺封裝結構3〇〇可以電性連接至其他外部電路。 由於第二晶片307的至少一個第二銲墊3〇9會與圖案化 線路層305的其中一條導線,例如導線3〇5a或3〇讣電性匹 配,因此當具有與第一晶片3〇2相同尺寸的第二晶片3们與 第一晶片302相互堆疊時,圖案化線路層3〇5的導線可以將 原來靠近第二晶片307中心的第二銲墊3〇9重新佈線,使其 分散至第二晶片307的其他位置,例如分散至第二晶片 的邊緣,再經由打線306使第二銲墊3〇9與基材3〇1電性 結。 藉此不僅縮短用來電性連結上層晶片與基材之間的打 線長度及線弧,更可以配合不同上層晶片之銲墊設計,來改 電圖案化線路層中的佈線,以提高堆疊封裝的製程彈性。由 於無需使用虛擬晶片,更可大幅降低堆疊厚度度及製程成 本’同時提高封裝密度。 根據以上所述之實施例,本發明的技術特徵係在覆晶堆 200843078 疊的下層晶片之晶背上,形成一個圖案化線路層,使圖案化 線路層的佈線和後續堆疊於其上的上層晶片之銲墊匹配。接 著,再將上層晶片覆晶堆疊於圖案化線路層上。藉由圖案化 線路層的佈線,將上層晶片之銲墊的打線位置重新分配,使 其分散至上層晶片的邊緣,再藉由打線使圖案化線路層與基 材電性連接。 & 因此,藉由本發明所提供的技術優勢,可以解決習知晶 片堆疊封裝結構良率封及封裝密度不高的問題。 —雖然本發明已以較佳實施例揭露如上1其並非用以限 定本發明,任何相關技術領域具有通常知識者,在不脫離^ 發明之精神和範_,當可作各種之更動與潤飾,因此本發 明之保護範圍當視後附之中請專利範圍所界定者為準。 【圖式簡單說明】 明顯=本發明上述和其他目的、特徵、優點與實施例能更 月顯易Μ,所附圖式之詳細說明如下:The first active surface 3〇3 facing the substrate 301 is electrically connected to the substrate 3〇1. In this embodiment, the first wafer 302 further has a first crystal back 304 opposite to the first active surface 3() 3, and a portion of the first active surface 3〇3 is worn by the substrate 3〇. The opening 317 is exposed. The first wafer 3〇2 has a plurality of first fresh slabs 315, and the first active surface is located in a region exposed through the cleavage jaws. The first fresh (four) 5 is electrically connected to the substrate 301 by a wire 318 passing through the through opening 317. Then, a patterned wiring layer 305' is formed on the first crystal back 3〇4 of the first wafer 302 and electrically connected to the substrate 3〇1 by at least one bonding wire 3〇6. The patterned circuit layer 305 is a redistributed circuit layer. And the patterned circuit layer 3〇5 includes a plurality of wires, such as wires 3G5a and ·, and the end of each wire (for example, wire milk a) is judged and (i) is disposed on the patterned circuit layer 305. The second pads of the two wafers 307 are electrically matched, and the other ends extend to other positions of the first crystal back, for example, to the edges of the first crystal backs 3〇4. The second crystal layer 305 is further disposed. The second sheet 307 is electrically connected to the patterned line 3 by flip chip bonding. The second sheet 307 has a second active surface 308 and a second bonding pad 309 disposed on an active surface 308 of the 13200843078, wherein at least one second The solder pads are electrically connected to the wires 3〇5a or 3〇5b of the patterned circuit layer 3〇5 by solder balls or conductive bumps 310. In other embodiments, the patterned wiring layer 305T changes the wiring pattern with a pad configuration that is a different wafer. Thereafter, the base material 3〇1, the first wafer 302, the patterned circuit layer 305, and the first wafer 307 are packaged using a sealant tree 320, and the sealant resin 320 is filled in the substrate 3〇1, the first wafer. 302, between the patterned circuit layer 305 and the second wafer 3〇7. Finally, a plurality of external terminals 3ΐ, which are formed on the second surface 319 of the substrate 301, are formed. F% sub-311 is more affordable, such as tin balls. These external terminals 311 b can be electrically connected to other external circuits by the chip stack package structure 3 . Since at least one second pad 3〇9 of the second wafer 307 is electrically matched with one of the wires of the patterned wiring layer 305, such as the wires 3〇5a or 3〇讣, when having the same with the first wafer 3〇2 When the second wafers 3 of the same size and the first wafers 302 are stacked on each other, the wires of the patterned wiring layer 3〇5 can reroute the second pads 3〇9 originally close to the center of the second wafer 307 to be dispersed to The other locations of the second wafer 307 are, for example, dispersed to the edges of the second wafer, and the second pads 3〇9 are electrically connected to the substrate 3〇1 via the bonding wires 306. Thereby, not only the wire length and the line arc for electrically connecting the upper layer wafer and the substrate are shortened, but also the pad design of different upper layer wafers can be used to change the wiring in the patterned circuit layer to improve the process of the stacked package. elasticity. By eliminating the need for virtual wafers, stack thickness and process cost can be significantly reduced while increasing package density. According to the embodiments described above, the technical feature of the present invention is to form a patterned circuit layer on the crystal back of the underlying wafer of the overlay wafer stack 200843078, so that the wiring of the patterned circuit layer and the upper layer stacked thereon are subsequently formed. The pads of the wafer are matched. Then, the upper wafer is flip-chip stacked on the patterned wiring layer. By patterning the wiring of the wiring layer, the bonding positions of the pads of the upper wafer are redistributed to be dispersed to the edges of the upper wafer, and the patterned wiring layer is electrically connected to the substrate by wire bonding. & Therefore, with the technical advantages provided by the present invention, the problem of low yield seal and low package density of the conventional wafer stacked package structure can be solved. The present invention has been disclosed in the above preferred embodiments, and is not intended to limit the present invention. Any person skilled in the art can make various changes and refinements without departing from the spirit and scope of the invention. The scope of protection of the present invention is defined by the scope of the patent application. BRIEF DESCRIPTION OF THE DRAWINGS [0009] The above and other objects, features, advantages and embodiments of the present invention will become more apparent. The detailed description of the drawings is as follows:
第1圖係根據本發明的第一較佳者 疊封穿姓播ιηη沾立丨二_ 貝%例所繪不之晶片堆 且了装、、Ό構1 〇〇的剖面示意圖。 第2圖係根據本發明的第二較佳實施例所 唛封裝結構200的剖面示意圖。 曰曰隹 第3圖係根據本發明的第三 叠封裝結構300的剖面示意圖。〜“列所繪示之晶片堆 第4圖係根據一習知的g 田 結構剖面圖。 豐封裂結構400所繪示的 15 200843078 第5圖係根據另一種晶片堆疊封裝結構500所繪示的結 構剖面圖。Fig. 1 is a schematic cross-sectional view showing the first stack of the wafer stack of the first embodiment of the present invention, which is not shown in the example of the first embodiment of the present invention. 2 is a cross-sectional view of a package structure 200 in accordance with a second preferred embodiment of the present invention. Figure 3 is a schematic cross-sectional view of a third stack of package structures 300 in accordance with the present invention. ~ "The wafer stack shown in the column is shown in Figure 4 according to a conventional g-field structure profile. 15 illustrated by the Feng-Fracture Structure 400 2008. 2008.78 Figure 5 is depicted in accordance with another wafer-stack package structure 500 Structural section view.
【主要元件符號說明】 100 :晶片堆疊封裝結構 102 :第一晶片 104 :第一晶背 105a :導線 106 :打線 108 :第二主動面 110 :凸塊 113 :凸塊 115 :第一銲墊 117 :基材第二表面 200 :晶片堆疊封裝結構 202 :第一晶片 204 :第一晶背 205a ··導線 206 :打線 208 :第二主動面 210 :凸塊 213 :凸塊 215 :第一銲墊 217 :貫穿開口 101 :基材 103 ·•第一主動面 105 :圖案化線路層 105b =導線 107 : 第二晶片 109 : 第二銲墊 111 : 外部連接端子 114 : 底膠 116 : 基材第一表面 120 : 封膠樹脂 201 : 基材 203 : 第一主動面 205 : 圖案化線路層 205b •導線 207 : 弟二晶片 209 : 第二銲墊 211 : 外部連接端子 214 : 底膠 216 : 散熱鰭片 218 : 基材第一表面 16 200843078[Main component symbol description] 100: wafer stack package structure 102: first wafer 104: first crystal back 105a: wire 106: wire 108: second active surface 110: bump 113: bump 115: first pad 117 : Substrate second surface 200 : wafer stack package structure 202 : first wafer 204 : first crystal back 205a · wire 206 : wire 208 : second active surface 210 : bump 213 : bump 215 : first pad 217: through opening 101: substrate 103 • first active surface 105: patterned wiring layer 105b = wire 107: second wafer 109: second pad 111: external connection terminal 114: primer 116: substrate first Surface 120: sealant 201: substrate 203: first active surface 205: patterned wiring layer 205b • wire 207: second wafer 209: second pad 211: external connection terminal 214: primer 216: heat sink fin 218 : substrate first surface 16 200843078
219 : 基材之第二表面 220 : 300 : 晶片堆豐封裝結構 301 : 302 : 第一晶片 303 : 304 : 第一晶背 305 : 305a : 導線 305b 306 : 打線 307 : 308 : 第二主動面 309 : 310 : 凸塊 311 ·· 313 : 凸塊 314 : 315 : 第一銲墊 316 : 317 : 貫穿開口 318 : 319 : 基材之第二表面 320 : 400 : 晶片堆疊封裝結構 410 : 420 : 第一晶片 430 : 440 : 打線 450 : 510 : 基板 520 : 530 : 第二晶片 540 : 550 : 打線 560 ·· 570 : 辉塾 580 : 封膠樹脂 基材 第一主動面 圖案化線路層 :導線 第二晶片 第二銲墊 外部連接端子 底膠 基材第一表面 打線 封膠樹脂 基板 第二晶片 打線 第一晶片 打線 虛擬晶片 拜塾 17219: second surface 220 of the substrate: 300: wafer stack package structure 301: 302: first wafer 303: 304: first crystal back 305: 305a: wire 305b 306: wire 307: 308: second active surface 309 : 310 : bump 311 · · 313 : bump 314 : 315 : first pad 316 : 317 : through opening 318 : 319 : second surface of the substrate 320 : 400 : wafer stack package structure 410 : 420 : first Wafer 430: 440: wire 450: 510: substrate 520: 530: second wafer 540: 550: wire 560 · · 570 : 塾 580 : sealing resin substrate first active surface patterned circuit layer: wire second wafer Second solder pad external connection terminal primer substrate first surface wire sealing resin substrate second wafer wire first wafer wire virtual wafer worship 17
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US12/713,333 US20100155929A1 (en) | 2007-04-30 | 2010-02-26 | Chip-Stacked Package Structure |
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